WO2022179642A2 - Heating assembly, atomizer and electronic atomization device - Google Patents

Heating assembly, atomizer and electronic atomization device Download PDF

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Publication number
WO2022179642A2
WO2022179642A2 PCT/CN2022/092861 CN2022092861W WO2022179642A2 WO 2022179642 A2 WO2022179642 A2 WO 2022179642A2 CN 2022092861 W CN2022092861 W CN 2022092861W WO 2022179642 A2 WO2022179642 A2 WO 2022179642A2
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WO
WIPO (PCT)
Prior art keywords
liquid
base body
hole
heating element
substrate
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PCT/CN2022/092861
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French (fr)
Chinese (zh)
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WO2022179642A3 (en
Inventor
赵月阳
吕铭
张彪
Original Assignee
深圳麦克韦尔科技有限公司
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Application filed by 深圳麦克韦尔科技有限公司 filed Critical 深圳麦克韦尔科技有限公司
Priority to PCT/CN2022/092861 priority Critical patent/WO2022179642A2/en
Priority to CN202211045817.1A priority patent/CN116406859A/en
Publication of WO2022179642A2 publication Critical patent/WO2022179642A2/en
Publication of WO2022179642A3 publication Critical patent/WO2022179642A3/en

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    • AHUMAN NECESSITIES
    • A24TOBACCO; CIGARS; CIGARETTES; SIMULATED SMOKING DEVICES; SMOKERS' REQUISITES
    • A24FSMOKERS' REQUISITES; MATCH BOXES; SIMULATED SMOKING DEVICES
    • A24F40/00Electrically operated smoking devices; Component parts thereof; Manufacture thereof; Maintenance or testing thereof; Charging means specially adapted therefor
    • A24F40/40Constructional details, e.g. connection of cartridges and battery parts
    • A24F40/44Wicks
    • AHUMAN NECESSITIES
    • A24TOBACCO; CIGARS; CIGARETTES; SIMULATED SMOKING DEVICES; SMOKERS' REQUISITES
    • A24FSMOKERS' REQUISITES; MATCH BOXES; SIMULATED SMOKING DEVICES
    • A24F40/00Electrically operated smoking devices; Component parts thereof; Manufacture thereof; Maintenance or testing thereof; Charging means specially adapted therefor
    • A24F40/40Constructional details, e.g. connection of cartridges and battery parts
    • A24F40/46Shape or structure of electric heating means
    • AHUMAN NECESSITIES
    • A24TOBACCO; CIGARS; CIGARETTES; SIMULATED SMOKING DEVICES; SMOKERS' REQUISITES
    • A24FSMOKERS' REQUISITES; MATCH BOXES; SIMULATED SMOKING DEVICES
    • A24F40/00Electrically operated smoking devices; Component parts thereof; Manufacture thereof; Maintenance or testing thereof; Charging means specially adapted therefor
    • A24F40/10Devices using liquid inhalable precursors

Definitions

  • the present application relates to the technical field of atomization, and in particular, to a heating component, an atomizer and an electronic atomization device.
  • the electronic atomization device is composed of a heating element, a battery and a control circuit.
  • the heating element is the core component of the electronic atomization device, and its characteristics determine the atomization effect and use experience of the electronic atomization device.
  • the cotton core heating element is mostly a structure in which a spring-shaped metal heating wire is wound around a cotton rope or a fiber rope.
  • the liquid aerosol generation matrix to be atomized is absorbed by both ends of the cotton rope or fiber rope, and then transferred to the central metal heating wire for heating and atomization. Due to the limited end area of the cotton rope or fiber rope, the adsorption and transmission efficiency of the aerosol-generating matrix is low.
  • cotton rope or fiber rope has poor structural stability, and is prone to dry burning, carbon deposition and burnt smell after multiple thermal cycles.
  • Another existing heating element is a ceramic heating element.
  • Most of the ceramic heating elements form a metal heating film on the surface of the porous ceramic body; the porous ceramic body plays the role of conducting liquid and storing liquid, and the metal heating film realizes the heating and atomization of the liquid aerosol-generating matrix.
  • it is difficult to precisely control the location distribution and dimensional accuracy of micropores for porous ceramics prepared by high temperature sintering.
  • it is necessary to reduce the pore size and porosity, but in order to achieve sufficient liquid supply, it is necessary to increase the pore size and porosity, which are contradictory to each other.
  • the liquid conductivity of the porous ceramic matrix is limited, and a burnt smell will appear under high power conditions.
  • the heating assembly, atomizer and electronic atomization device provided by the present application solve the technical problem of insufficient liquid supply in some areas of the thin heating body in the prior art.
  • the first technical solution provided by the present application is to provide a heating component, which is applied to an electronic atomization device and is used for atomizing aerosol to generate a matrix, including a first matrix and a second matrix;
  • the first base body has a first surface and a second surface that are oppositely arranged, and the first surface is a liquid absorbing surface;
  • the first base body has a plurality of first liquid guide holes, and the first liquid guide holes are used for the air
  • the sol-generating substrate is guided from the first surface to the second surface;
  • the second substrate has a third surface and a fourth surface arranged oppositely, and the fourth surface is an atomizing surface;
  • the second substrate having a plurality of second liquid-guiding holes for guiding the aerosol-generating substrate from the third surface to the fourth surface;
  • the second surface is opposite to the third surface and forms a gap, and the first liquid guide hole and the second liquid guide hole are in fluid communication through the gap;
  • the first substrate also has at least one through-hole In the lower liquid holes of the first surface and the second surface, the diameter of the lower liquid holes is larger than that of the first liquid conducting hole.
  • the projection of the lower liquid hole on the third surface and the projection of the heating element on the third surface are arranged in a staggered manner.
  • the projection of the third liquid-guiding hole on the third surface partially overlaps the projection of the heating element on the third surface.
  • the heating element includes a plurality of mutually parallel extending portions and a connecting portion connecting two adjacent extending portions;
  • the heating component also includes a positive electrode and a negative electrode, and the two ends of the heating element are respectively electrically connected to the positive electrode and the negative electrode; the extension part approaches the negative electrode along the positive electrode. direction extension;
  • the projection of the lower liquid hole on the plane where the heating element is located is located between two adjacent extension parts.
  • the shape of the lower liquid hole is an elongated shape and is parallel to the extending portion.
  • the diameter of the first liquid-conducting hole is 1 ⁇ m-100 ⁇ m; the diameter of the lower liquid-conducting hole is greater than or equal to twice the diameter of the first liquid-conducting hole.
  • the shape of the lower liquid hole is a long strip, and the width of the lower liquid hole is greater than or equal to twice the diameter of the first liquid conducting hole.
  • the shape of the lower liquid hole includes two parallel side edges and a curved edge connecting the two side edges, and the curved edge is convex in a direction away from the inner space of the lower liquid hole.
  • the width of the lower liquid hole refers to the distance between the two sides.
  • the capillary force of the second liquid guide hole is greater than the capillary force of the first liquid guide hole.
  • the second substrate is a dense substrate
  • the second liquid-conducting hole is a through hole penetrating the third surface and the fourth surface.
  • the first substrate is a dense substrate
  • the first liquid-conducting hole is a through hole penetrating through the first surface and the second surface.
  • the material of the first matrix is quartz, glass or dense ceramic
  • the material of the second matrix is quartz, glass or dense ceramic
  • the heating component further includes a spacer; the spacer is disposed between the second surface and the third surface, and is located on the first base body and/or the second base body edge, so that the first base body and the second base body form the gap.
  • first base body and the second base body are arranged in parallel; or, an angle is formed between the first base body and the second base body.
  • the spacer is an independently arranged spacer
  • the spacer is a support column or a support frame fixed on the second surface and/or the third surface;
  • the spacer is a protrusion integrally formed with the first base body and/or the second base body.
  • the second technical solution provided by the present application is to provide an atomizer, which includes a liquid storage chamber and a heating element; the liquid storage chamber is used to store a liquid aerosol generation substrate; the heating element is the heating element described in any one of the above; the heating element is in fluid communication with the liquid storage chamber.
  • the heating element is the heating element described in any one of the above-mentioned heating elements, and the lower liquid hole and the second substrate can dislocate the region where the aerosol-generating substrate generates aerosol.
  • the third technical solution provided by the present application is to provide an electronic atomization device, including an atomizer and a host, the atomizer is the atomizer described in any of the above, and the The host is electrically connected with the heating component.
  • the heating component includes a first base body and a second base body; a surface and a second surface, the first surface is a liquid-absorbing surface; the first substrate has a plurality of first liquid-guiding holes, and the first liquid-guiding holes are used to guide the aerosol-generating substrate from the first surface to the second surface; the third The two substrates have a third surface and a fourth surface arranged oppositely, and the fourth surface is an atomizing surface; the second substrate has a plurality of second liquid-conducting holes, and the second liquid-conducting holes are used for transferring the aerosol-generating substrate from the third surface Guided to the fourth surface; wherein, the second surface is opposite to the third surface and forms a gap, and the first liquid guide hole and the second liquid guide hole are in fluid communication through the gap; The lower liquid hole on the two surfaces, the diameter of the lower liquid hole is larger than that of the first liquid
  • FIG. 1 is a schematic structural diagram of an electronic atomization device provided by an embodiment of the present application.
  • Fig. 2 is the structural representation of the atomizer of the electronic atomization device that Fig. 1 provides;
  • FIG. 3 is a schematic structural diagram of an embodiment of a heating assembly of the atomizer provided in FIG. 2;
  • FIG. 4 is a schematic structural diagram of the heating assembly provided in FIG. 3 viewed from one side of the atomizing surface;
  • FIG. 5 is a schematic structural diagram of the heating assembly provided in FIG. 3 viewed from the liquid-absorbing surface side;
  • FIG. 6 is a schematic cross-sectional structure diagram of the heating assembly provided in FIG. 3 along a first direction;
  • FIG. 7 is a schematic structural diagram of another embodiment of the heating element of the heating assembly provided in FIG. 3;
  • FIG. 8 is a schematic structural diagram of another embodiment of the heating element of the heating assembly provided in FIG. 3;
  • FIG. 9 is a positional relationship diagram of an embodiment of the lower liquid hole of the heating assembly provided in FIG. 3 and the heating element;
  • FIG. 10 is a positional relationship diagram of the lower liquid hole of the heating assembly provided in FIG. 3 and another embodiment of the heating element;
  • FIG. 11 is a schematic structural diagram of another embodiment of the heating assembly of the atomizer provided in FIG. 2;
  • FIG. 12 is a schematic structural diagram of another arrangement of the spacer 125 in the heating assembly provided in FIG. 11 .
  • first”, “second” and “third” in this application are only used for descriptive purposes, and should not be construed as indicating or implying relative importance or implying the number of indicated technical features. Thus, features defined as “first”, “second”, “third” may expressly or implicitly include at least one of said features.
  • "a plurality of” means at least two, such as two, three, etc., unless otherwise expressly and specifically defined. All directional indications (such as up, down, left, right, front, rear%) in the embodiments of the present application are only used to explain the relative positional relationship between components under a certain posture (as shown in the accompanying drawings).
  • FIG. 1 is a schematic structural diagram of an electronic atomization device provided by an embodiment of the present application.
  • an electronic atomization device 100 is provided.
  • the electronic atomization device 100 can be used for atomization of aerosol-generating substrates.
  • the electronic atomizer device 100 includes an atomizer 1 and a host 2 that are electrically connected to each other.
  • the atomizer 1 is used for storing the aerosol-generating substrate and atomizing the aerosol-generating substrate to form an aerosol that can be inhaled by a user.
  • the atomizer 1 can be used in different fields, for example, medical treatment, beauty, leisure smoking and so on.
  • the atomizer 1 can be used in an electronic aerosolization device for atomizing aerosol-generating substrates and generating aerosols for smokers to inhale. example.
  • the specific structure and function of the atomizer 1 can be referred to the specific structure and function of the atomizer 1 involved in the following embodiments, and the same or similar technical effects can be achieved, which will not be repeated here.
  • the host 2 includes a battery (not shown) and a controller (not shown).
  • the battery is used to provide electrical energy for the operation of the atomizer 1 , so that the atomizer 1 can atomize the aerosol-generating substrate to form an aerosol; the controller is used to control the operation of the atomizer 1 .
  • the host 2 also includes other components such as a battery holder, an airflow sensor, and the like.
  • the atomizer 1 and the host 2 may be integrally provided or detachably connected, and may be designed according to specific needs.
  • FIG. 2 is a schematic structural diagram of the atomizer of the electronic atomization device provided in FIG. 1 .
  • the atomizer 1 includes a housing 10 , a heating component 11 , and an atomizing seat 12 .
  • the atomization seat 12 has an installation cavity (not shown in the figure), and the heating element 11 is arranged in the installation cavity; the heating element 11 and the atomization seat 12 are arranged in the casing 10 together.
  • the housing 10 is formed with a mist outlet channel 13 , the inner surface of the housing 10 , the outer surface of the mist outlet channel 13 cooperate with the top surface of the atomization seat 12 to form a liquid storage chamber 14 , and the liquid storage chamber 14 is used to store the liquid aerosol generated. matrix.
  • the heating element 11 is electrically connected with the host 2 to generate aerosol by atomizing the aerosol generating matrix.
  • the atomizing seat 12 includes an upper seat 121 and a lower seat 122, the upper seat 121 cooperates with the lower seat 122 to form an installation cavity; the atomization surface of the heating component 11 cooperates with the cavity wall of the installation cavity to form an atomization cavity 120.
  • the upper seat 121 is provided with a lower liquid channel 1211 ; the lower liquid channel 1211 of the aerosol generating matrix channel in the liquid storage chamber 14 flows into the heating element 11 , that is, the heating element 11 is in fluid communication with the liquid storage chamber 14 .
  • the lower seat 122 is provided with an air inlet channel 15 , the outside air enters the atomizing chamber 120 through the air inlet channel 15 , and the aerosol atomized by the heating component 11 flows to the mist outlet channel 13 , and the user inhales through the port of the mist outlet channel 13 . Aerosol.
  • FIG. 3 is a schematic structural diagram of an embodiment of the heating element of the atomizer provided in FIG. 2
  • FIG. 4 is a schematic structural diagram of the heating element provided in FIG. 3 viewed from the side of the atomizing surface
  • FIG. 5 FIG. 3 is a schematic structural diagram of the heating element provided in FIG. 3 viewed from the liquid absorbing surface side
  • FIG. 6 is a schematic cross-sectional structure diagram of the heating element provided in FIG. 3 along the first direction.
  • the heating element 11 includes a first base body 111 and a second base body 112 .
  • the first base 111 includes a first surface 1111 and a second surface 1112 which are arranged opposite to each other, and the first surface 1111 is a liquid absorbing surface; the first base 111 has a plurality of first liquid guide holes 1113, and the first liquid guide holes 1113 The aerosol-generating substrate is guided from the first surface 1111 to the second surface 1112 , ie, the first liquid guide holes 1113 are used to guide the aerosol-generating substrate from the suction surface to the second surface 1112 .
  • the second base 112 includes a third surface 1121 and a fourth surface 1122 that are oppositely disposed, and the fourth surface 1122 is an atomized surface.
  • the second base 112 has a plurality of second liquid-guiding holes 1123 for guiding the aerosol-generating substrate from the third surface 1121 to the fourth surface 1122 , that is, the second liquid-guiding holes 1123 are used for The aerosol-generating substrate is directed from the third surface 1121 to the atomizing surface.
  • the second surface 1112 of the first base body 111 is opposite to the third surface 1121 of the second base body 112 and forms a gap 113 (as shown in FIG. 6 ). . It can be understood that the aerosol-generating substrate in the liquid storage chamber 14 flows to the first surface 1111 of the first substrate 111 through the lower liquid channel 1211 , and is guided to the first surface 1111 of the first substrate 111 by the capillary force of the first liquid guide hole 1113 .
  • the two surfaces 1112 enter the gap 113, and are guided from the third surface 1121 of the second substrate 112 to the fourth surface 1122 through the capillary force of the second liquid guide hole 1123; / or flow from the suction surface to the atomization surface under the action of capillary force.
  • the aerosol generating substrate is heated and atomized on the atomizing surface of the heating element 11 to generate an aerosol.
  • the capillary force of the second liquid guide hole 1123 is greater than the capillary force of the first liquid guide hole 1113, so that the aerosol generating substrate can flow from the gap 113 to the atomizing surface.
  • the first base body 111 is provided with at least one lower liquid hole 1114
  • the lower liquid hole 1114 is a through hole passing through the first surface 1111 and the second surface 1112
  • the diameter of the lower liquid hole 1114 is larger than that of the first liquid conducting hole The diameter of the hole 1113.
  • the second substrate 112 may have a local area where the liquid supply is insufficient, and a liquid hole is set in this area corresponding to the first substrate 111 1114, and the diameter of the lower liquid hole 1114 is larger than that of the first liquid guide hole 1113, which improves the liquid supply speed, thereby solving the problem of insufficient liquid supply in the second base 112;
  • the heating element 11 has a limit wet burning power. It should be noted that the lower liquid hole 1114 has no capillary force, or its capillary force is very small, which can be ignored relative to the first liquid guide hole 1113 .
  • a gap 113 is formed between the second surface 1112 of the first base body 111 and the third surface 1121 of the second base body 112 , and the gap 113 passes through the gap 113 . It can be excluded that the air intake of the second liquid guide hole 1123 during the atomization process forms large air bubbles on the third surface 1121 of the second substrate 112, so as to prevent the air bubbles from hindering the liquid supply, thereby avoiding dry burning.
  • the air bubbles in the atomization process can be discharged from the lower liquid hole 1114, further avoiding the formation of large air bubbles on the third surface 1121 of the second base body 112, that is, further Air bubbles are prevented from obstructing the liquid supply.
  • the gap 113 By setting the gap 113 , lateral fluid supplementation can be achieved, and even if the bubbles adhere to the liquid absorbing surface of the first base 111 and cover part of the first liquid guide hole 1113 , the liquid supply of the second base 112 will not be affected.
  • the first base body 111 can be insulated to a certain extent, preventing the heat on the second base body 112 from being conducted to the liquid storage cavity 14, which is beneficial to Guaranteed consistency of taste.
  • the first substrate 111 may be a porous substrate, such as porous ceramics, cotton, quartz sand cores, or materials with foam structures;
  • the first base 111 may also be a dense base, such as quartz, glass, dense ceramic or silicon;
  • the first liquid conducting hole 1113 is a through hole penetrating the first surface 1111 and the second surface 1112 .
  • the material of the first substrate 111 is glass, it can be one of ordinary glass, quartz glass, borosilicate glass, and photosensitive lithium aluminosilicate glass.
  • the second matrix 112 may be a porous matrix, for example, a material of porous ceramic, cotton, quartz sand core, or foam structure; the plurality of micropores in the second matrix 112 itself are the second liquid-conducting holes 1123 .
  • the second base 112 may also be a dense base, such as quartz, glass, dense ceramic or silicon; the second liquid conducting holes 1123 are through holes penetrating the third surface 1121 and the fourth surface 1122 .
  • the material of the second substrate 112 is glass, it can be one of ordinary glass, quartz glass, borosilicate glass, and photosensitive lithium aluminosilicate glass.
  • the materials of the first base body 111 and the second base body 112 may be the same or different.
  • the first substrate 111 and the second substrate 112 can be arbitrarily combined, for example, the first substrate 111 is a porous ceramic, and the second substrate 112 is a dense substrate; for another example, the first substrate 111 is a porous ceramic, and the second substrate 112 is a porous ceramic Ceramic; for another example, the first matrix 111 is a dense matrix, and the second matrix 112 is a porous ceramic; in another example, the first matrix 111 is a dense matrix, and the second matrix 112 is a dense matrix.
  • the first base body 111 and the second base body 112 are both sheet-shaped. It can be understood that the sheet-shaped body is relative to the block-shaped body, and the ratio of the length to the thickness of the sheet-shaped body is larger than the ratio of the length to the thickness of the block-shaped body. .
  • the first base body 111 and the second base body 112 can be flat, curved, cylindrical, etc., and can be designed according to specific needs.
  • the heating component 11 will be described in detail below by taking the first substrate 111 and the second substrate 112 as dense substrates, and the first substrate 111 and the second substrate 112 as a flat plate as an example (as shown in FIG. 3 ).
  • the diameter of the second liquid conducting hole 1123 on the second substrate 112 is 1 ⁇ m-100 ⁇ m.
  • the diameter of the second liquid guide hole 1123 is less than 1 ⁇ m, the liquid supply demand cannot be met, resulting in a decrease in the amount of aerosol; when the diameter of the second liquid guide hole 1123 is greater than 100 ⁇ m, the aerosol-generating matrix easily flows out of the second liquid guide hole 1123 Cause liquid leakage, resulting in a drop in atomization efficiency.
  • the diameter of the second liquid conducting hole 1123 is 20 ⁇ m-60 ⁇ m. It can be understood that, the diameter of the second liquid guide hole 1123 is selected according to actual needs.
  • the thickness of the second base body 112 is 0.1 mm-1 mm.
  • the thickness of the second base 112 is the distance between the third surface 1121 and the fourth surface 1122 .
  • the thickness of the second base body 112 is greater than 1 mm, the liquid supply requirement cannot be met, resulting in a decrease in the amount of aerosol, and the resulting heat loss is large, and the cost of installing the second liquid conducting holes 1123 is high; when the thickness of the second base body 112 is less than 0.1 mm , the strength of the second substrate 112 cannot be guaranteed, which is not conducive to improving the performance of the electronic atomization device.
  • the thickness of the second base body 112 is 0.2mm-0.5mm. It can be understood that the thickness of the second base body 112 is selected according to actual needs.
  • the ratio of the thickness of the second base body 112 to the diameter of the second liquid conducting hole 1123 is 20:1-3:1, so as to improve the liquid supply capacity.
  • the ratio of the thickness of the second substrate 112 to the diameter of the second liquid-conducting hole 1123 is greater than 20:1, the aerosol-generating matrix supplied by the capillary force of the second liquid-conducting hole 1123 cannot meet the atomization requirements, which not only easily leads to Dry burning, and the amount of aerosol generated by a single atomization decreases; when the ratio of the thickness of the second substrate 112 to the diameter of the second liquid-conducting hole 1123 is less than 3:1, the aerosol-generating matrix is easily generated from the second liquid-conducting hole.
  • the flow out of 1123 causes waste, which leads to a decrease in atomization efficiency, which in turn reduces the total amount of aerosol.
  • the ratio of the thickness of the second substrate 112 to the diameter of the second liquid guide hole 1123 is 15:1-5:1.
  • the ratio of the hole center distance between two adjacent second liquid guide holes 1123 to the diameter of the second liquid guide holes 1123 is 3:1-1.5:1, so that the second liquid guide holes 1123 on the second substrate 112 On the premise of satisfying the liquid supply capacity, the strength of the second base 112 is improved as much as possible; optionally, the ratio of the hole center distance between two adjacent second liquid guide holes 1123 to the diameter of the second liquid guide holes 1123 is 3:1-2:1; further optionally, the ratio of the hole center distance between two adjacent second liquid-guiding holes 1123 to the diameter of the second liquid-guiding holes 1123 is 3:1-2.5:1.
  • the diameter of the first liquid conducting hole 1113 on the first substrate 111 is 1 ⁇ m-100 ⁇ m.
  • the pore size of the first liquid guide hole 1113 is less than 1 ⁇ m, the liquid supply demand cannot be met, resulting in a decrease in the amount of aerosol; when the pore size of the first liquid guide hole 1113 is larger than 100 ⁇ m, it is easy to cause liquid leakage, resulting in a decrease in atomization efficiency. It can be understood that the aperture of the first base body 111 is selected according to actual needs.
  • the diameter of the first liquid guide hole 1113 is larger than that of the second liquid guide hole 1123, so that the capillary force of the second liquid guide hole 1123 is greater than the capillary force of the first liquid guide hole 1113, and the aerosol generates a matrix. It can flow from the gap 113 to the atomizing surface of the second base body 112 . Since the first liquid guide hole 1113 also has capillary force, when the port of the mist outlet channel 13 is used downward, it can prevent the liquid from flowing back and prevent the liquid supply from being insufficient.
  • the thickness of the first base body 111 is 0.1 mm-1 mm.
  • the thickness of the first substrate 111 is the distance between the first surface 1111 and the second surface 1112.
  • the thickness of the first base body 111 is smaller than the thickness of the second base body 112 .
  • the lower liquid hole 1114 and the region where the aerosol can be generated in the second substrate 112 are arranged in a staggered position. Since the second substrate 112 is a dense substrate, the heat generated by the heating element 114 is conducted to the second substrate 112 to atomize the aerosol in the second liquid conducting hole 1113 to generate the substrate. Therefore, the area on the second substrate 112 that is closer to the heating element 114 has a high temperature and is sufficient to atomize the aerosol-generating substrate to generate aerosol, which is defined as a high-temperature area; the area on the second substrate 112 that is farther from the heating element 114 The region where the heat conduction may not be sufficient to atomize the aerosol-generating substrate to generate aerosol is defined as the low temperature region.
  • the aerosol-generating matrix located in the second liquid-conducting hole 1113 in the high-temperature region is atomized, external gas may enter the second liquid-conducting hole 1113 to form bubbles, which are arranged on the side of the second matrix 112 close to the liquid storage chamber 14
  • the first base body 111, the first base body 111 can prevent the bubbles entering through the second liquid guide hole 1113 from growing. Therefore, the lower liquid hole 1114 and the region where the plurality of second liquid conducting holes 1113 capable of atomizing the aerosol-generating substrate to generate aerosol are arranged in a staggered position, that is, the lower liquid hole 1114 and the second substrate 112 are capable of generating aerosol.
  • the high temperature area is arranged in a staggered position to ensure the realization of the function of the first base body 111 to prevent the growth of bubbles entering from the second liquid guide hole 1113 during the atomization process.
  • the shapes of the first liquid guide hole 1113 and the lower liquid hole 1114 are both circular holes.
  • the diameter of the lower liquid hole 1114 is greater than or equal to twice the diameter of the first liquid guide hole 1113 .
  • the shape of the first liquid guide hole 1113 is a circular hole
  • the shape of the lower liquid hole 1114 is a strip shape
  • the width of the lower liquid hole 1114 is 90 ⁇ m-110 ⁇ m.
  • the shape of the first liquid guide hole 1113 is a circular hole
  • the shape of the lower liquid hole 1114 is a long strip
  • the width of the lower liquid hole 1114 is greater than or equal to twice the diameter of the first liquid guide hole 1113 .
  • the length of the lower liquid hole 1114 is designed as required, so that the lower liquid hole 1114 can increase the liquid supply speed and is not enough to cause liquid leakage.
  • the shape of the lower liquid hole 1114 is a long strip, that is, the lower liquid hole 1114 includes two parallel sides a and a curved side b connecting the two side sides a, and the curved side b is far from the lower liquid hole 1114.
  • the direction of the inner space is convex (as shown in FIG. 5 ), and the two curved sides b are arranged symmetrically; the width of the lower liquid hole 1114 refers to the distance between the two sides a.
  • the heating assembly 11 further includes a heating element 114 , a positive electrode 116 and a negative electrode 117 , and both ends of the heating element 114 are electrically connected to the positive electrode 116 and the negative electrode 117 respectively.
  • the heating element 114 is disposed on the fourth surface 1122 of the second substrate 112 to generate the aerosol by atomizing the aerosol-generating substrate. Both the positive electrode 116 and the negative electrode 117 are disposed on the fourth surface 1122 of the second base body 112 to facilitate electrical connection with the host 2 .
  • the heating element 114 can be a heating sheet, a heating film, a heating net, etc., and can heat the atomized aerosol to generate a substrate.
  • the heating element 114 may be embedded inside the second base body 112 .
  • at least a portion of the second base body 112 is electrically conductive to serve as the heating element 114 .
  • the heating element 114 is in the shape of a strip; specifically, the heating element 114 is bent multiple times to form a plurality of mutually parallel extension parts 1141, and the heating element 114 also includes a connection part 1142 connecting two adjacent extension parts 1141,
  • the extension portion 1141 extends along the direction in which the positive electrode 116 approaches the negative electrode 117 (as shown in FIG. 4 ).
  • the heating element 114 is a waist-shaped film (as shown in FIG. 7 , which is a schematic structural diagram of another embodiment of the heating element of the heating assembly provided in FIG. 3 ). Compared with the heating element 114 shown in FIG. 4 , the heating element 114 provided in FIG. 7 covers a larger area of the second base 112 .
  • the heating element 114 is a whole film (as shown in FIG. 8 , which is a schematic structural diagram of another embodiment of the heating element of the heating assembly provided in FIG. 3 ). Compared with the heating element 114 shown in FIG. 4 , the heating element 114 provided in FIG. 8 covers a larger area of the second substrate 112 . The heating element 114 provided in FIG. 8 covers the second substrate 114 relative to the heating element 114 shown in FIG. The area of the second base body 112 is larger.
  • the projection of the first base body 111 on the second base body 112 completely covers the heating element 114 to ensure that the liquid supply speed can meet the atomization speed of the heating element 114 and achieve a better atomization effect.
  • the second substrate 112 is provided with a plurality of second liquid guide holes 1123 in an array arrangement.
  • the second substrate 112 is provided with a micro-hole array area 1124 and a blank area 1125 arranged around the micro-hole array area 1124.
  • the micro-hole array area 1124 has a plurality of second liquid conducting holes 1123; the heating element 114 is arranged in the micro-hole array area 1124.
  • the hole array area 1124 is used to heat the atomized aerosol to generate the matrix; the positive electrode 116 and the negative electrode 117 are arranged in the blank area 1125 of the atomization surface (the fourth surface 1122) to ensure that the positive electrode 116 and the negative electrode 117 are electrically connected stability.
  • the microporous array area 1124 in the second substrate 112 is used as an atomization area, covering the heating element 114 and the surrounding area of the heating element 114 , that is, basically covering the area that reaches the temperature of the atomized aerosol generation substrate, making full use of thermal efficiency.
  • the size of the area around the micropore array area 1124 of the second substrate 112 in this application is larger than the diameter of the second liquid-conducting hole 1123, so it can be called the blank area 1125; that is, the blank area in this application 1125 is an area where the second liquid guide hole 1123 can be formed but no second liquid guide hole 1123 is formed, and is not a region around the microwell array area 1124 where the second liquid guide hole 1123 cannot be formed.
  • the distance between the second liquid guide hole 1123 closest to the edge of the second base 112 and the edge of the second base 112 is greater than the diameter of the second liquid guide hole 1123, and it is considered that the micro-hole array area 1124 There is a blank area 1125 on the circumference of .
  • the first substrate 111 is provided with a microwell array area 1116 and a blank area 1117 arranged around the microwell array area 1116 , and the microwell array area 1116 has a plurality of first liquid conducting holes 1113 .
  • the projection of the micropore array area 1116 of the first substrate 111 on the second substrate 112 completely covers the micropore array area 1124 of the second substrate 112, so that the liquid supply speed can meet the atomization speed of the heating element 114. .
  • FIG. 9 is a positional relationship diagram of an embodiment of the lower liquid hole and the heating element of the heating assembly provided in FIG. 3 .
  • the projection of the lower liquid hole 1114 on the third surface 1121 of the second substrate 112 is staggered from the projection of the heating element 114 on the third surface 1121 .
  • the heating element 114 may be the heating element 114 shown in FIG. 4 , FIG. 7 , and FIG. 8 .
  • FIG. 9 illustrates the heating element 114 shown in FIG. 4 as an example.
  • the heating element 114 includes three mutually parallel extending portions 1141 and two connecting portions 1142 connecting two adjacent extending portions 1141 .
  • the first base body 111 is provided with two lower liquid holes 1114 .
  • Two lower liquid holes 1114 and three extending portions 1141 are alternately arranged.
  • the projection of the lower liquid hole 1114 on the plane where the heating element 114 is located is located between two adjacent extension parts 1141 .
  • the lower liquid hole 1114 is in the shape of a long strip and is arranged parallel to the extension portion 1141 .
  • FIG. 10 is a positional relationship diagram of the lower liquid hole of the heating assembly provided in FIG. 3 and the heating element according to another embodiment.
  • the projection of the lower liquid hole 1114 on the third surface 1121 of the second substrate 112 partially overlaps the projection of the heating element 114 on the third surface 1121 .
  • the heating element 114 may be the heating element 114 shown in FIG. 4 , FIG. 7 , and FIG. 8 .
  • FIG. 10 illustrates the heating element 114 shown in FIG. 4 as an example.
  • the edge of the first base body 111 has a liquid inlet 1115 . It can be understood that the gap 113 communicates with the liquid storage cavity 14 through the liquid inlet 1115 and the first liquid guide hole 1113 .
  • liquid inlets 1115 are provided.
  • the heating assembly 11 further includes a fixing member 115 , and the fixing member 115 has a liquid inlet hole 1151 .
  • the fixing member 115 has a sealing function, and the material of the fixing member 115 is silicone or fluorine rubber.
  • the edge of the first base 111 is spaced from the hole wall of the liquid inlet hole 1151 to form a liquid inlet 1115, and the second base 112 spans the entire liquid inlet 1151; for example, two opposite lengths of the first base 111
  • the sides are spaced apart from the hole wall of the liquid inlet hole 1151 to form two symmetrically arranged liquid inlet ports 1115 (as shown in FIG. 5 ).
  • the edge of the first base body 111 is provided with a through hole (not shown) to form a liquid inlet 1115 , and the second base body 112 spans the entire liquid inlet hole 1151 .
  • the projection of the first base body 111 on the atomizing surface completely covers the heating element 114 , and the liquid inlet 1115 and the heating element 114 are arranged in a staggered position.
  • the liquid inlet hole 1151 is in fluid communication with the liquid storage chamber 14 through the lower liquid channel 1211 .
  • the first base body 111 and/or the second base body 112 are embedded in the liquid inlet hole 1151 , that is, the fixing member 115 is used to fix the periphery of the first base body 111 and/or the second base body 112 .
  • the fixing member 115 covers the periphery of the second base body 112 , the fixing member 115 does not cover the heating element 114 , and the liquid inlet hole 1151 can completely expose the heating element 114 .
  • the hole wall of the liquid inlet hole 1151 has an annular installation groove (not shown), and the edges of the first base body 111 and/or the second base body 112 are embedded in the annular installation groove, and the first base body 111 and the second base body 112 are embedded in the annular installation groove.
  • the two base bodies 112 form a gap 113 .
  • the first base body 111 and the second base body 112 may be arranged parallel to each other to form a gap 113 ; it may also be a non-parallel setting between the first base body 111 and the second base body 112 to form a gap 113 , specifically, the first base body 111 An included angle is formed with the second base body 112 .
  • FIG. 11 is a schematic structural diagram of another embodiment of the heating component of the atomizer provided in FIG. 2 .
  • the heating assembly 11 provided in FIG. 11 is basically the same in structure as the heating assembly 11 provided in FIG. 3 , the difference is that in the heating assembly 11 provided in FIG. , a gap 113 is formed between the first base 111 and the second base 112 through the annular mounting groove; while the spacer 118 in the heating assembly 11 provided in FIG. 11 forms a gap 113 between the first base 111 and the second base 112 .
  • the heating element 11 further includes a spacer 118, the spacer 118 is arranged between the second surface 1112 and the third surface 1121, and is located at the edge of the first base 111 and/or the second base 112, so that the first base 111 and the second base 111
  • the base body 112 forms a gap 113 .
  • the spacer 118 may be disposed along the circumference of the first base body 111 and/or the second base body 112 , that is, the spacer 118 is an annular structure, so as to avoid leakage of the aerosol-generating matrix in the gap 113 .
  • the spacers 118 may also be multiple and spaced along the circumferential direction of the first base body 111 and the second base body 112 , and seal the circumferential direction of the first base body 111 and the second base body 112 by a sealing member (not shown).
  • first base body 111 and the second base body 112 are arranged in parallel (as shown in FIG. 11 ).
  • the spacer 118 is an independently provided spacer, the spacer is detachably connected to the first base body 111 and the second base body 112 , and the spacer is an annular structure.
  • the specific operations are: forming a first liquid guide hole 1113 on the first base body 111, forming a second liquid guide hole 1123 on the second base body 112, and then disposing a gasket between the first base body 111 and the second base body 112, Specifically, the spacer is disposed between the blank area 1117 of the first base body 111 and the blank area 1125 of the second base body 112 .
  • the spacer 118 can be a silicone frame or a plastic frame.
  • the spacer 118 is a support column or a support frame fixed on the second surface 1112 of the first base body 111 and/or the third surface 1121 of the second base body 112 , and the support column or support frame is clamped or welded. It is fixed on the second surface 1112 of the first base body 111 and/or the third surface 1121 of the second base body 112 .
  • the specific operation is: forming a first liquid guide hole 1113 on the first base body 111, forming a second liquid guide hole 1123 on the second base body 112, and then welding or clamping to make the support column or support frame and the first liquid guide hole 1123.
  • a base body 111 and a second base body 112 are integrated.
  • the first base 111 and the second base 112 are glass plates, glass frit is coated on the edge of the first base 111 , and after the second base 112 is covered, the glass frit is sintered into glass with a laser to connect the support posts or supports The frame is fixed to the first base body 111 and the second base body 112 .
  • the spacer 118 is a protrusion integrally formed with the first base body 111 and/or the second base body 112 . If the spacer 118 is a protrusion integrally formed with the first base body 111 , the first liquid guide hole 1113 is formed on the first base body 111 , the second liquid guide hole 1123 is formed on the second base body 112 , and then the second base body 112 is formed. Overlap on the protrusion to form a gap 113 .
  • the spacer 118 is a protrusion integrally formed with the second base body 112
  • the first liquid guide hole 1113 is formed on the first base body 111
  • the second liquid guide hole 1123 is formed on the second base body 112
  • the first base body 111 is formed. Overlap on the protrusion to form a gap 113 .
  • grooves are formed by etching on the second surface 1112 of the first base body 111 , the sidewalls of the grooves serve as spacers 118 , and the first liquid guide holes 1113 are formed on the bottom wall of the grooves; the third surface 1121 of the second base body 112
  • the third surface 1121 of the second base 112 overlaps the end surface of the side wall of the groove of the second surface 1212 , that is, the third surface 1121 of the second base 112 is in contact with the second surface 1112 of the first base 111 , the third surface 1121 cooperates with the groove to form a gap 113 . If the bottom surface of the groove is interpreted as the second surface 1112 , the sidewall of the groove can be interpreted as the protrusion of the second surface 1112 .
  • FIG. 12 is a schematic structural diagram of FIG. 11 providing another arrangement of the spacers in the heating element.
  • an included angle is formed between the first base body 111 and the second base body 112 , and the included angle is an acute angle, for example, the included angle is 15 degrees to 30 degrees.
  • the angle formed between the first base body 111 and the second base body 112 may be that the spacer 118 is located at the edge of one end of the first base body 111 and the second base body 112 , and the edge of the other end of the first base body 111 and the second base body 112 Direct abutment; two spacers 118 may also be located at the edges of both ends of the first base body 111 and the second base body 112 and have different heights.

Abstract

Disclosed are a heating assembly, an atomizer and an electronic atomization device. The heating assembly comprises a first base body and a second base body, wherein the first base body has a first surface and a second surface arranged opposite each other, the first surface being a liquid suction surface; the first base body is provided with a plurality of first liquid guide holes for guiding an aerosol generating matrix from the first surface to the second surface; the second base body has a third surface and a fourth surface arranged opposite each other, the fourth surface being an atomization surface; the second base body is provided with a plurality of second liquid guide holes for guiding the aerosol generating matrix from the third surface to the fourth surface; the second surface and the third surface face each other and have a clearance formed therebetween, and the first liquid guide holes are in fluid communication with the second liquid guide holes by means of the clearance; and the first base body is further provided with at least one liquid discharge hole that penetrates the first surface and the second surface, with the diameter of the liquid discharge hole being greater than that of the first liquid guide holes. Sufficient liquid supply in a local region is ensured by means of providing the liquid discharge hole.

Description

发热组件、雾化器及电子雾化装置Heating components, atomizers and electronic atomization devices 技术领域technical field
本申请涉及雾化技术领域,尤其涉及一种发热组件、雾化器及电子雾化装置。The present application relates to the technical field of atomization, and in particular, to a heating component, an atomizer and an electronic atomization device.
背景技术Background technique
电子雾化装置由发热体、电池和控制电路等部分组成,发热体作为电子雾化装置的核心元件,其特性决定了电子雾化装置的雾化效果和使用体验。The electronic atomization device is composed of a heating element, a battery and a control circuit. The heating element is the core component of the electronic atomization device, and its characteristics determine the atomization effect and use experience of the electronic atomization device.
现有的发热体一种是棉芯发热体。棉芯发热体大多为弹簧状的金属发热丝缠绕棉绳或纤维绳的结构。待雾化的液态气溶胶生成基质被棉绳或纤维绳的两端吸取,然后传输至中心金属发热丝处加热雾化。由于棉绳或纤维绳的端部面积有限,导致气溶胶生成基质吸附、传输效率较低。另外,棉绳或纤维绳结构稳定性差,多次热循环后易出现干烧、积碳和焦糊味等现象。One of the existing heating elements is a cotton core heating element. The cotton core heating element is mostly a structure in which a spring-shaped metal heating wire is wound around a cotton rope or a fiber rope. The liquid aerosol generation matrix to be atomized is absorbed by both ends of the cotton rope or fiber rope, and then transferred to the central metal heating wire for heating and atomization. Due to the limited end area of the cotton rope or fiber rope, the adsorption and transmission efficiency of the aerosol-generating matrix is low. In addition, cotton rope or fiber rope has poor structural stability, and is prone to dry burning, carbon deposition and burnt smell after multiple thermal cycles.
现有的发热体另一种是陶瓷发热体。陶瓷发热体大多为在多孔陶瓷体表面形成金属发热膜;多孔陶瓷体起到导液、储液的作用,金属发热膜实现液态气溶胶生成基质的加热雾化。然而,由高温烧结制备的多孔陶瓷难以精确控制微孔的位置分布和尺寸精度。为了降低漏液风险,需要减小孔径、孔隙率,但为了实现充足的供液,需要增大孔径、孔隙率,二者相互矛盾。目前,在满足低漏液风险的孔径、孔隙率条件下,多孔陶瓷基体导液能力受限,在高功率条件下会出现焦糊味。Another existing heating element is a ceramic heating element. Most of the ceramic heating elements form a metal heating film on the surface of the porous ceramic body; the porous ceramic body plays the role of conducting liquid and storing liquid, and the metal heating film realizes the heating and atomization of the liquid aerosol-generating matrix. However, it is difficult to precisely control the location distribution and dimensional accuracy of micropores for porous ceramics prepared by high temperature sintering. In order to reduce the risk of liquid leakage, it is necessary to reduce the pore size and porosity, but in order to achieve sufficient liquid supply, it is necessary to increase the pore size and porosity, which are contradictory to each other. At present, under the conditions of pore size and porosity that meet the low risk of liquid leakage, the liquid conductivity of the porous ceramic matrix is limited, and a burnt smell will appear under high power conditions.
随着技术的进步,用户对电子雾化装置的雾化效果的要求越来越高,为了满足用户的需求,提供一种薄的发热体以提高供液能力,但这种薄的发热体会出现部分区域供液不充足,造成积垢。With the advancement of technology, users have higher and higher requirements for the atomization effect of electronic atomization devices. In order to meet the needs of users, a thin heating body is provided to improve the liquid supply capacity, but this thin heating body appears Insufficient liquid supply in some areas, causing fouling.
发明内容SUMMARY OF THE INVENTION
本申请提供的发热组件、雾化器及电子雾化装置,解决现有技术中薄的发热体部分区域供液不充足的技术问题。The heating assembly, atomizer and electronic atomization device provided by the present application solve the technical problem of insufficient liquid supply in some areas of the thin heating body in the prior art.
为了解决上述技术问题,本申请提供的第一个技术方案为:提供一种发热组件,应用于电子雾化装置,用于雾化气溶胶生成基质,包括第一基体和第二基体;所述第一基体具有相 对设置的第一表面和第二表面,所述第一表面为吸液面;所述第一基体具有多个第一导液孔,所述第一导液孔用于将气溶胶生成基质从所述第一表面导引至所述第二表面;所述第二基体具有相对设置的第三表面和第四表面,所述第四表面为雾化面;所述第二基体具有多个第二导液孔,所述第二导液孔用于将所述气溶胶生成基质从所述第三表面导引至所述第四表面;In order to solve the above-mentioned technical problems, the first technical solution provided by the present application is to provide a heating component, which is applied to an electronic atomization device and is used for atomizing aerosol to generate a matrix, including a first matrix and a second matrix; the The first base body has a first surface and a second surface that are oppositely arranged, and the first surface is a liquid absorbing surface; the first base body has a plurality of first liquid guide holes, and the first liquid guide holes are used for the air The sol-generating substrate is guided from the first surface to the second surface; the second substrate has a third surface and a fourth surface arranged oppositely, and the fourth surface is an atomizing surface; the second substrate having a plurality of second liquid-guiding holes for guiding the aerosol-generating substrate from the third surface to the fourth surface;
其中,所述第二表面与所述第三表面相对且形成间隙,所述第一导液孔与所述第二导液孔通过所述间隙流体连通;所述第一基体还具有至少一个贯穿所述第一表面和所述第二表面的下液孔,所述下液孔的孔径大于所述第一导液孔的孔径。Wherein, the second surface is opposite to the third surface and forms a gap, and the first liquid guide hole and the second liquid guide hole are in fluid communication through the gap; the first substrate also has at least one through-hole In the lower liquid holes of the first surface and the second surface, the diameter of the lower liquid holes is larger than that of the first liquid conducting hole.
在一实施方式中,还包括发热元件,所述发热元件用于雾化所述气溶胶生成基质;所述发热元件设于所述第四表面或埋设于所述第二基体内部,或所述第二基体的至少部分导电以作为所述发热元件。In one embodiment, also comprise a heating element, and the heating element is used for atomizing the aerosol to generate the matrix; the heating element is arranged on the fourth surface or is embedded in the second matrix, or the At least part of the second base body is electrically conductive to serve as the heating element.
在一实施方式中,所述下液孔在所述第三表面的投影与所述发热元件在所述第三表面的投影错位设置。In one embodiment, the projection of the lower liquid hole on the third surface and the projection of the heating element on the third surface are arranged in a staggered manner.
在一实施方式中,所述第三导液孔在所述第三表面的投影与所述发热元件在所述第三表面的投影部分重叠。In one embodiment, the projection of the third liquid-guiding hole on the third surface partially overlaps the projection of the heating element on the third surface.
在一实施方式中,所述发热元件包括多个相互平行的延伸部和连接相邻两个所述延伸部的连接部;In one embodiment, the heating element includes a plurality of mutually parallel extending portions and a connecting portion connecting two adjacent extending portions;
所述发热组件还包括正电极和负电极,所述发热元件的两端分别与所述正电极和所述负电极电连接;所述延伸部沿着所述正电极向所述负电极靠近的方向延伸;The heating component also includes a positive electrode and a negative electrode, and the two ends of the heating element are respectively electrically connected to the positive electrode and the negative electrode; the extension part approaches the negative electrode along the positive electrode. direction extension;
所述下液孔在所述发热元件所在平面的投影位于相邻的两个所述延伸部之间。The projection of the lower liquid hole on the plane where the heating element is located is located between two adjacent extension parts.
在一实施方式中,所述下液孔的形状为长条形,且与所述延伸部平行。In one embodiment, the shape of the lower liquid hole is an elongated shape and is parallel to the extending portion.
在一实施方式中,所述第一导液孔的孔径为1μm-100μm;所述下液孔的孔径大于等于两倍所述第一导液孔的孔径。In one embodiment, the diameter of the first liquid-conducting hole is 1 μm-100 μm; the diameter of the lower liquid-conducting hole is greater than or equal to twice the diameter of the first liquid-conducting hole.
在一实施方式中,所述下液孔的形状为长条形,所述下液孔的宽度大于等于两倍所述第一导液孔的孔径。In one embodiment, the shape of the lower liquid hole is a long strip, and the width of the lower liquid hole is greater than or equal to twice the diameter of the first liquid conducting hole.
在一实施方式中,所述下液孔的形状包括两条平行的侧边以及连接两条所述侧边的曲边,所述曲边向远离所述下液孔的内部空间的方向凸起;所述下液孔的宽度指的是两条所述侧边之间的距离。In one embodiment, the shape of the lower liquid hole includes two parallel side edges and a curved edge connecting the two side edges, and the curved edge is convex in a direction away from the inner space of the lower liquid hole. ; The width of the lower liquid hole refers to the distance between the two sides.
在一实施方式中,所述第二导液孔的毛细作用力大于所述第一导液孔的毛细作用力。In one embodiment, the capillary force of the second liquid guide hole is greater than the capillary force of the first liquid guide hole.
在一实施方式中,所述第二基体为致密基体,所述第二导液孔为贯穿所述第三表面和所述第四表面的直通孔。In one embodiment, the second substrate is a dense substrate, and the second liquid-conducting hole is a through hole penetrating the third surface and the fourth surface.
在一实施方式中,所述第一基体为致密基体,所述第一导液孔为贯穿所述第一表面和所述第二表面的直通孔。In one embodiment, the first substrate is a dense substrate, and the first liquid-conducting hole is a through hole penetrating through the first surface and the second surface.
在一实施方式中,所述第一基体的材料为石英、玻璃或致密陶瓷;所述第二基体的材料为石英、玻璃或致密陶瓷。In one embodiment, the material of the first matrix is quartz, glass or dense ceramic; the material of the second matrix is quartz, glass or dense ceramic.
在一实施方式中,所述发热组件还包括间隔件;所述间隔件设置于所述第二表面和所述第三表面之间,且位于所述第一基体和/或所述第二基体边缘,以使所述第一基体与所述第二基体形成所述间隙。In one embodiment, the heating component further includes a spacer; the spacer is disposed between the second surface and the third surface, and is located on the first base body and/or the second base body edge, so that the first base body and the second base body form the gap.
在一实施方式中,所述第一基体与所述第二基体平行设置;或,所述第一基体与所述第二基体之间形成夹角。In one embodiment, the first base body and the second base body are arranged in parallel; or, an angle is formed between the first base body and the second base body.
在一实施方式中,所述间隔件为独立设置的垫片;In one embodiment, the spacer is an independently arranged spacer;
或,所述间隔件为固定在所述第二表面和/或所述第三表面的支撑柱或支撑框;Or, the spacer is a support column or a support frame fixed on the second surface and/or the third surface;
或,所述间隔件为与所述第一基体和/或所述第二基体一体成型的凸起。Or, the spacer is a protrusion integrally formed with the first base body and/or the second base body.
为了解决上述技术问题,本申请提供的第二个技术方案为:提供一种雾化器,包括储液腔和发热组件;所述储液腔用于存储液态气溶胶生成基质;所述发热组件为上述任意一项所述的发热组件;所述发热组件与所述储液腔流体连通。In order to solve the above technical problems, the second technical solution provided by the present application is to provide an atomizer, which includes a liquid storage chamber and a heating element; the liquid storage chamber is used to store a liquid aerosol generation substrate; the heating element is the heating element described in any one of the above; the heating element is in fluid communication with the liquid storage chamber.
在一实施方式中,发热组件为上述任一项所述的发热组件,所述下液孔与所述第二基体能够将所述气溶胶生成基质生成气溶胶的区域错位设置。In one embodiment, the heating element is the heating element described in any one of the above-mentioned heating elements, and the lower liquid hole and the second substrate can dislocate the region where the aerosol-generating substrate generates aerosol.
为了解决上述技术问题,本申请提供的第三个技术方案为:提供一种电子雾化装置,包括雾化器和主机,所述雾化器为上述任一项所述的雾化器,所述主机与所述发热组件电连接。In order to solve the above technical problems, the third technical solution provided by the present application is to provide an electronic atomization device, including an atomizer and a host, the atomizer is the atomizer described in any of the above, and the The host is electrically connected with the heating component.
本申请的有益效果:区别于现有技术,本申请公开了一种发热组件、雾化器及电子雾化装置,发热组件包括第一基体和第二基体;第一基体具有相对设置的第一表面和第二表面,第一表面为吸液面;第一基体具有多个第一导液孔,第一导液孔用于将气溶胶生成基质从第一表面导引至第二表面;第二基体具有相对设置的第三表面和第四表面,第四表面为雾化面;第二基体具有多个第二导液孔,第二导液孔用于将气溶胶生成基质从第三表面导引至第四表面;其中,第二表面与第三表面相对且形成间隙,第一导液孔与第二导液孔通过间隙流体连通;第一基体还具有至少一个贯穿第一表面和第二表面的下液孔,下液孔的孔径大于第一导液孔的孔径,通过设置下液孔,保证局部区域的充足供液。Beneficial effects of the present application: Different from the prior art, the present application discloses a heating component, an atomizer and an electronic atomization device. The heating component includes a first base body and a second base body; a surface and a second surface, the first surface is a liquid-absorbing surface; the first substrate has a plurality of first liquid-guiding holes, and the first liquid-guiding holes are used to guide the aerosol-generating substrate from the first surface to the second surface; the third The two substrates have a third surface and a fourth surface arranged oppositely, and the fourth surface is an atomizing surface; the second substrate has a plurality of second liquid-conducting holes, and the second liquid-conducting holes are used for transferring the aerosol-generating substrate from the third surface Guided to the fourth surface; wherein, the second surface is opposite to the third surface and forms a gap, and the first liquid guide hole and the second liquid guide hole are in fluid communication through the gap; The lower liquid hole on the two surfaces, the diameter of the lower liquid hole is larger than that of the first liquid conducting hole, and the lower liquid hole is arranged to ensure sufficient liquid supply in the local area.
附图说明Description of drawings
为了更清楚地说明本申请实施例中的技术方案,下面将对实施例描述中所需要使用的附 图作简单地介绍,显而易见地,下面描述中的附图仅仅是本申请的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其它的附图。In order to illustrate the technical solutions in the embodiments of the present application more clearly, the following briefly introduces the drawings that are used in the description of the embodiments. Obviously, the drawings in the following description are only some embodiments of the present application. For those of ordinary skill in the art, other drawings can also be obtained from these drawings without any creative effort.
图1是本申请实施例提供的电子雾化装置的结构示意图;1 is a schematic structural diagram of an electronic atomization device provided by an embodiment of the present application;
图2是图1提供的电子雾化装置的雾化器的结构示意图;Fig. 2 is the structural representation of the atomizer of the electronic atomization device that Fig. 1 provides;
图3是图2提供的雾化器的发热组件一实施例的结构示意图;3 is a schematic structural diagram of an embodiment of a heating assembly of the atomizer provided in FIG. 2;
图4是图3提供的发热组件从雾化面一侧观看的结构示意图;FIG. 4 is a schematic structural diagram of the heating assembly provided in FIG. 3 viewed from one side of the atomizing surface;
图5是图3提供的发热组件从吸液面一侧观看的结构示意图;FIG. 5 is a schematic structural diagram of the heating assembly provided in FIG. 3 viewed from the liquid-absorbing surface side;
图6是图3提供的发热组件沿第一方向的截面结构示意图;6 is a schematic cross-sectional structure diagram of the heating assembly provided in FIG. 3 along a first direction;
图7是图3提供的发热组件的发热元件另一实施方式的结构示意图;7 is a schematic structural diagram of another embodiment of the heating element of the heating assembly provided in FIG. 3;
图8是图3提供的发热组件的发热元件又一实施方式的结构示意图;8 is a schematic structural diagram of another embodiment of the heating element of the heating assembly provided in FIG. 3;
图9是图3提供的发热组件的下液孔与发热元件一实施方式的位置关系图;9 is a positional relationship diagram of an embodiment of the lower liquid hole of the heating assembly provided in FIG. 3 and the heating element;
图10是图3提供的发热组件的下液孔与发热元件另一实施方式的位置关系图;10 is a positional relationship diagram of the lower liquid hole of the heating assembly provided in FIG. 3 and another embodiment of the heating element;
图11是图2提供的雾化器的发热组件另一实施方式的结构示意图;11 is a schematic structural diagram of another embodiment of the heating assembly of the atomizer provided in FIG. 2;
图12是图11提供发热组件中间隔件125另一设置方式的结构示意图。FIG. 12 is a schematic structural diagram of another arrangement of the spacer 125 in the heating assembly provided in FIG. 11 .
具体实施方式Detailed ways
下面将结合本申请实施例中的附图,对本申请实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅是本申请的一部分实施例,而不是全部的实施例。基于本申请中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本申请保护的范围。The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, but not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present application.
以下描述中,为了说明而不是为了限定,提出了诸如特定系统结构、接口、技术之类的具体细节,以便透彻理解本申请。In the following description, for purposes of illustration and not limitation, specific details such as specific system structures, interfaces, techniques, etc. are set forth in order to provide a thorough understanding of the present application.
本申请中的术语“第一”、“第二”、“第三”仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”、“第三”的特征可以明示或者隐含地包括至少一个所述特征。本申请的描述中,“多个”的含义是至少两个,例如两个,三个等,除非另有明确具体的限定。本申请实施例中所有方向性指示(诸如上、下、左、右、前、后……)仅用于解释在某一特定姿态(如附图所示)下各部件之间的相对位置关系、运动情况等,如果所述特定姿态发生改变时,则所述方向性指示也相应地随之改变。本申请实施例中的术语“包括”和“具有”以及它们任何变形,意图在于覆盖不排他的包含。例如包含了一系列步骤或单元的过程、方法、系统、产品或设备没有限定于已列出的 步骤或单元,而是可选地还包括没有列出的步骤或单元,或可选地还包括对于这些过程、方法、产品或设备固有的其它步骤或组件。The terms "first", "second" and "third" in this application are only used for descriptive purposes, and should not be construed as indicating or implying relative importance or implying the number of indicated technical features. Thus, features defined as "first", "second", "third" may expressly or implicitly include at least one of said features. In the description of the present application, "a plurality of" means at least two, such as two, three, etc., unless otherwise expressly and specifically defined. All directional indications (such as up, down, left, right, front, rear...) in the embodiments of the present application are only used to explain the relative positional relationship between components under a certain posture (as shown in the accompanying drawings). , motion situation, etc., if the specific posture changes, the directional indication also changes accordingly. The terms "comprising" and "having" and any variations thereof in the embodiments of the present application are intended to cover non-exclusive inclusion. For example, a process, method, system, product or device comprising a series of steps or units is not limited to the listed steps or units, but optionally also includes unlisted steps or units, or optionally also includes Other steps or components inherent to these processes, methods, products or devices.
在本文中提及“实施例”意味着,结合实施例描述的特定特征、结构或特性可以包含在本申请的至少一个实施例中。在说明书中的各个位置出现所述短语并不一定均是指相同的实施例,也不是与其它实施例互斥的独立的或备选的实施例。本领域技术人员显式地和隐式地理解的是,本文所描述的实施例可以与其它实施例相结合。Reference herein to an "embodiment" means that a particular feature, structure, or characteristic described in connection with the embodiment can be included in at least one embodiment of the present application. The appearances of the phrases in various places in the specification are not necessarily all referring to the same embodiment, nor are they separate or alternative embodiments that are mutually exclusive with other embodiments. It is explicitly and implicitly understood by those skilled in the art that the embodiments described herein may be combined with other embodiments.
下面结合附图和实施例对本申请进行详细的说明。The present application will be described in detail below with reference to the accompanying drawings and embodiments.
请参阅图1,图1是本申请实施例提供的电子雾化装置的结构示意图。Please refer to FIG. 1 , which is a schematic structural diagram of an electronic atomization device provided by an embodiment of the present application.
在本实施例中,提供一种电子雾化装置100。该电子雾化装置100可用于气溶胶生成基质的雾化。电子雾化装置100包括相互电连接的雾化器1和主机2。In this embodiment, an electronic atomization device 100 is provided. The electronic atomization device 100 can be used for atomization of aerosol-generating substrates. The electronic atomizer device 100 includes an atomizer 1 and a host 2 that are electrically connected to each other.
其中,雾化器1用于存储气溶胶生成基质并雾化气溶胶生成基质以形成可供用户吸食的气溶胶。该雾化器1具体可用于不同的领域,比如,医疗、美容、休闲吸食等。在一具体实施例中,该雾化器1可用于电子气溶胶化装置,用于雾化气溶胶生成基质并产生气溶胶,以供抽吸者抽吸,以下实施例均以此休闲吸食为例。Wherein, the atomizer 1 is used for storing the aerosol-generating substrate and atomizing the aerosol-generating substrate to form an aerosol that can be inhaled by a user. The atomizer 1 can be used in different fields, for example, medical treatment, beauty, leisure smoking and so on. In a specific embodiment, the atomizer 1 can be used in an electronic aerosolization device for atomizing aerosol-generating substrates and generating aerosols for smokers to inhale. example.
雾化器1的具体结构与功能可参见以下实施例所涉及的雾化器1的具体结构与功能,且可实现相同或相似的技术效果,在此不再赘述。The specific structure and function of the atomizer 1 can be referred to the specific structure and function of the atomizer 1 involved in the following embodiments, and the same or similar technical effects can be achieved, which will not be repeated here.
主机2包括电池(图未示)和控制器(图未示)。电池用于为雾化器1的工作提供电能,以使得雾化器1能够雾化气溶胶生成基质形成气溶胶;控制器用于控制雾化器1工作。主机2还包括电池支架、气流传感器等其他元件。The host 2 includes a battery (not shown) and a controller (not shown). The battery is used to provide electrical energy for the operation of the atomizer 1 , so that the atomizer 1 can atomize the aerosol-generating substrate to form an aerosol; the controller is used to control the operation of the atomizer 1 . The host 2 also includes other components such as a battery holder, an airflow sensor, and the like.
雾化器1与主机2可以是一体设置,也可以是可拆卸连接,可以根据具体需要进行设计。The atomizer 1 and the host 2 may be integrally provided or detachably connected, and may be designed according to specific needs.
请参阅图2,图2是图1提供的电子雾化装置的雾化器的结构示意图。Please refer to FIG. 2 , which is a schematic structural diagram of the atomizer of the electronic atomization device provided in FIG. 1 .
雾化器1包括壳体10、发热组件11、雾化座12。雾化座12具有安装腔(图未标),发热组件11设于该安装腔内;发热组件11同雾化座12一起设于壳体10内。壳体10形成有出雾通道13,壳体10的内表面、出雾通道13的外表面与雾化座12的顶面配合形成储液腔14,储液腔14用于存储液态气溶胶生成基质。其中,发热组件11与主机2电连接,以雾化气溶胶生成基质生成气溶胶。The atomizer 1 includes a housing 10 , a heating component 11 , and an atomizing seat 12 . The atomization seat 12 has an installation cavity (not shown in the figure), and the heating element 11 is arranged in the installation cavity; the heating element 11 and the atomization seat 12 are arranged in the casing 10 together. The housing 10 is formed with a mist outlet channel 13 , the inner surface of the housing 10 , the outer surface of the mist outlet channel 13 cooperate with the top surface of the atomization seat 12 to form a liquid storage chamber 14 , and the liquid storage chamber 14 is used to store the liquid aerosol generated. matrix. Wherein, the heating element 11 is electrically connected with the host 2 to generate aerosol by atomizing the aerosol generating matrix.
雾化座12包括上座121和下座122,上座121与下座122配合形成安装腔;发热组件11的雾化面与安装腔的腔壁配合形成雾化腔120。上座121上设有下液通道1211;储液腔14内的气溶胶生成基质通道下液通道1211流入发热组件11,即,发热组件11与储液腔14流体连通。下座122上设有进气通道15,外界气体经进气通道15进入雾化腔120,携带发 热组件11雾化好的气溶胶流至出雾通道13,用户通过出雾通道13的端口吸食气溶胶。The atomizing seat 12 includes an upper seat 121 and a lower seat 122, the upper seat 121 cooperates with the lower seat 122 to form an installation cavity; the atomization surface of the heating component 11 cooperates with the cavity wall of the installation cavity to form an atomization cavity 120. The upper seat 121 is provided with a lower liquid channel 1211 ; the lower liquid channel 1211 of the aerosol generating matrix channel in the liquid storage chamber 14 flows into the heating element 11 , that is, the heating element 11 is in fluid communication with the liquid storage chamber 14 . The lower seat 122 is provided with an air inlet channel 15 , the outside air enters the atomizing chamber 120 through the air inlet channel 15 , and the aerosol atomized by the heating component 11 flows to the mist outlet channel 13 , and the user inhales through the port of the mist outlet channel 13 . Aerosol.
请参阅图3至图6,图3是图2提供的雾化器的发热组件一实施例的结构示意图,图4是图3提供的发热组件从雾化面一侧观看的结构示意图,图5是图3提供的发热组件从吸液面一侧观看的结构示意图,图6是图3提供的发热组件沿第一方向的截面结构示意图。Please refer to FIGS. 3 to 6 , FIG. 3 is a schematic structural diagram of an embodiment of the heating element of the atomizer provided in FIG. 2 , FIG. 4 is a schematic structural diagram of the heating element provided in FIG. 3 viewed from the side of the atomizing surface, and FIG. 5 FIG. 3 is a schematic structural diagram of the heating element provided in FIG. 3 viewed from the liquid absorbing surface side, and FIG. 6 is a schematic cross-sectional structure diagram of the heating element provided in FIG. 3 along the first direction.
发热组件11包括第一基体111和第二基体112。The heating element 11 includes a first base body 111 and a second base body 112 .
第一基体111包括相对设置的第一表面1111和第二表面1112,第一表面1111为吸液面;第一基体111具有多个第一导液孔1113,第一导液孔1113用于将气溶胶生成基质从第一表面1111导引至第二表面1112,即,第一导液孔1113用于将气溶胶生成基质从吸液面导引至第二表面1112。The first base 111 includes a first surface 1111 and a second surface 1112 which are arranged opposite to each other, and the first surface 1111 is a liquid absorbing surface; the first base 111 has a plurality of first liquid guide holes 1113, and the first liquid guide holes 1113 The aerosol-generating substrate is guided from the first surface 1111 to the second surface 1112 , ie, the first liquid guide holes 1113 are used to guide the aerosol-generating substrate from the suction surface to the second surface 1112 .
第二基体112包括相对设置的第三表面1121和第四表面1122,第四表面1122为雾化面。第二基体112具有多个第二导液孔1123,第二导液孔1123用于将气溶胶生成基质从第三表面1121导引至第四表面1122,即,第二导液孔1123用于将气溶胶生成基质从第三表面1121导引至雾化面。The second base 112 includes a third surface 1121 and a fourth surface 1122 that are oppositely disposed, and the fourth surface 1122 is an atomized surface. The second base 112 has a plurality of second liquid-guiding holes 1123 for guiding the aerosol-generating substrate from the third surface 1121 to the fourth surface 1122 , that is, the second liquid-guiding holes 1123 are used for The aerosol-generating substrate is directed from the third surface 1121 to the atomizing surface.
第一基体111的第二表面1112与第二基体112的第三表面1121相对且形成间隙113(如图6所示),第一导液孔1113与第二导液孔1123通过间隙113流体连通。可以理解,储液腔14内的气溶胶生成基质通过下液通道1211流至第一基体111的第一表面1111,通过第一导液孔1113的毛细作用力导引至第一基体111的第二表面1112,进而进入间隙113,再经第二导液孔1123的毛细作用力从第二基体112的第三表面1121导引至第四表面1122;也就是说,气溶胶生成基质在重力和/或毛细作用力的作用下从吸液面流至雾化面。气溶胶生成基质在发热组件11的雾化面加热雾化生成气溶胶。其中,第二导液孔1123的毛细作用力大于第一导液孔1113的毛细作用力,以使气溶胶生成基质能够从间隙113流至雾化面。The second surface 1112 of the first base body 111 is opposite to the third surface 1121 of the second base body 112 and forms a gap 113 (as shown in FIG. 6 ). . It can be understood that the aerosol-generating substrate in the liquid storage chamber 14 flows to the first surface 1111 of the first substrate 111 through the lower liquid channel 1211 , and is guided to the first surface 1111 of the first substrate 111 by the capillary force of the first liquid guide hole 1113 . The two surfaces 1112 enter the gap 113, and are guided from the third surface 1121 of the second substrate 112 to the fourth surface 1122 through the capillary force of the second liquid guide hole 1123; / or flow from the suction surface to the atomization surface under the action of capillary force. The aerosol generating substrate is heated and atomized on the atomizing surface of the heating element 11 to generate an aerosol. The capillary force of the second liquid guide hole 1123 is greater than the capillary force of the first liquid guide hole 1113, so that the aerosol generating substrate can flow from the gap 113 to the atomizing surface.
在本实施例中,第一基体111上设有至少一个下液孔1114,下液孔1114为贯穿第一表面1111和第二表面1112的通孔,下液孔1114的孔径大于第一导液孔1113的孔径。可以理解,由于气溶胶生成基质在第二基体112的雾化面雾化生成气溶胶,第二基体112可能存在局部供液不足的区域,在该区域对应于第一基体111处设下液孔1114,且下液孔1114的孔径大于第一导液孔1113的孔径,提高了供液速度,从而解决了第二基体112局部供液不足的问题;同时,通过设置下液孔1114,利于提升发热组件11极限湿烧功率。需要说明的是,下液孔1114不具有毛细作用力,或其毛细作用力很小,相对于第一导液孔1113,可以忽略。In this embodiment, the first base body 111 is provided with at least one lower liquid hole 1114, the lower liquid hole 1114 is a through hole passing through the first surface 1111 and the second surface 1112, and the diameter of the lower liquid hole 1114 is larger than that of the first liquid conducting hole The diameter of the hole 1113. It can be understood that, since the aerosol-generating substrate is atomized to generate aerosols on the atomizing surface of the second substrate 112 , the second substrate 112 may have a local area where the liquid supply is insufficient, and a liquid hole is set in this area corresponding to the first substrate 111 1114, and the diameter of the lower liquid hole 1114 is larger than that of the first liquid guide hole 1113, which improves the liquid supply speed, thereby solving the problem of insufficient liquid supply in the second base 112; The heating element 11 has a limit wet burning power. It should be noted that the lower liquid hole 1114 has no capillary force, or its capillary force is very small, which can be ignored relative to the first liquid guide hole 1113 .
并且,通过在第二基体112靠近储液腔14的一侧设置第一基体111,第一基体111的第二表面1112与第二基体112的第三表面1121之间形成间隙113,通过间隙113可以排除 第二导液孔1123在雾化过程中的进气在第二基体112的第三表面1121形成较大的气泡,防止气泡阻碍供液,进而避免了干烧。通过在第一基体111上设置下液孔1114,使得雾化过程中的气泡可以从下液孔1114排出,进一步避免了在第二基体112的第三表面1121形成较大的气泡,即,进一步防止了气泡阻碍供液。通过设置间隙113,可以实现横向补液,即使气泡粘附在第一基体111的吸液面上,覆盖了部分第一导液孔1113,也不影响第二基体112的供液。另外,通过在第二基体112靠近储液腔14的一侧设置第一基体111,第一基体111可以在一定程度上隔热,防止第二基体112上的热量传导至储液腔14,利于保证口感的一致性。In addition, by disposing the first base body 111 on the side of the second base body 112 close to the liquid storage chamber 14 , a gap 113 is formed between the second surface 1112 of the first base body 111 and the third surface 1121 of the second base body 112 , and the gap 113 passes through the gap 113 . It can be excluded that the air intake of the second liquid guide hole 1123 during the atomization process forms large air bubbles on the third surface 1121 of the second substrate 112, so as to prevent the air bubbles from hindering the liquid supply, thereby avoiding dry burning. By disposing the lower liquid hole 1114 on the first base body 111, the air bubbles in the atomization process can be discharged from the lower liquid hole 1114, further avoiding the formation of large air bubbles on the third surface 1121 of the second base body 112, that is, further Air bubbles are prevented from obstructing the liquid supply. By setting the gap 113 , lateral fluid supplementation can be achieved, and even if the bubbles adhere to the liquid absorbing surface of the first base 111 and cover part of the first liquid guide hole 1113 , the liquid supply of the second base 112 will not be affected. In addition, by disposing the first base body 111 on the side of the second base body 112 close to the liquid storage cavity 14, the first base body 111 can be insulated to a certain extent, preventing the heat on the second base body 112 from being conducted to the liquid storage cavity 14, which is beneficial to Guaranteed consistency of taste.
具体地,第一基体111可以是多孔基体,例如,多孔陶瓷、棉、石英砂芯、泡沫结构的材料;第一基体111本身具有的多个微孔为第一导液孔1113。第一基体111也可以是致密基体,例如,石英、玻璃、致密陶瓷或硅;第一导液孔1113为贯穿第一表面1111和第二表面1112的直通孔。当第一基体111的材质为玻璃时,可以为普通玻璃、石英玻璃、硼硅玻璃、光敏铝硅酸锂玻璃中的一种。Specifically, the first substrate 111 may be a porous substrate, such as porous ceramics, cotton, quartz sand cores, or materials with foam structures; The first base 111 may also be a dense base, such as quartz, glass, dense ceramic or silicon; the first liquid conducting hole 1113 is a through hole penetrating the first surface 1111 and the second surface 1112 . When the material of the first substrate 111 is glass, it can be one of ordinary glass, quartz glass, borosilicate glass, and photosensitive lithium aluminosilicate glass.
第二基体112可以是多孔基体,例如,多孔陶瓷、棉、石英砂芯、泡沫结构的材料;第二基体112本身具有的多个微孔为第二导液孔1123。第二基体112也可以是致密基体,例如,石英、玻璃、致密陶瓷或硅;第二导液孔1123为贯穿第三表面1121和第四表面1122的直通孔。当第二基体112的材质为玻璃时,可以为普通玻璃、石英玻璃、硼硅玻璃、光敏铝硅酸锂玻璃中的一种。The second matrix 112 may be a porous matrix, for example, a material of porous ceramic, cotton, quartz sand core, or foam structure; the plurality of micropores in the second matrix 112 itself are the second liquid-conducting holes 1123 . The second base 112 may also be a dense base, such as quartz, glass, dense ceramic or silicon; the second liquid conducting holes 1123 are through holes penetrating the third surface 1121 and the fourth surface 1122 . When the material of the second substrate 112 is glass, it can be one of ordinary glass, quartz glass, borosilicate glass, and photosensitive lithium aluminosilicate glass.
第一基体111和第二基体112的材料可以相同,也可以不同。第一基体111和第二基体112之间可以任意组合,例如,第一基体111为多孔陶瓷,第二基体112为致密基体;再例如,第一基体111为多孔陶瓷,第二基体112为多孔陶瓷;再例如,第一基体111为致密基体,第二基体112为多孔陶瓷;再例如,第一基体111为致密基体,第二基体112为致密基体。The materials of the first base body 111 and the second base body 112 may be the same or different. The first substrate 111 and the second substrate 112 can be arbitrarily combined, for example, the first substrate 111 is a porous ceramic, and the second substrate 112 is a dense substrate; for another example, the first substrate 111 is a porous ceramic, and the second substrate 112 is a porous ceramic Ceramic; for another example, the first matrix 111 is a dense matrix, and the second matrix 112 is a porous ceramic; in another example, the first matrix 111 is a dense matrix, and the second matrix 112 is a dense matrix.
第一基体111和第二基体112均为片状,可以理解,片状是相对于块状体来说的,片状的长度与厚度的比值相对于块状体的长度与厚度的比值要大。第一基体111、第二基体112可以为平板状、弧状、筒状等,具体根据需要进行设计,雾化器1的其他结构与第一基体111、第二基体112的形状配合设置。The first base body 111 and the second base body 112 are both sheet-shaped. It can be understood that the sheet-shaped body is relative to the block-shaped body, and the ratio of the length to the thickness of the sheet-shaped body is larger than the ratio of the length to the thickness of the block-shaped body. . The first base body 111 and the second base body 112 can be flat, curved, cylindrical, etc., and can be designed according to specific needs.
下面以第一基体111和第二基体112均为致密基体,第一基体111和第二基体112均为平板状为例(如图3所示)对发热组件11进行详细介绍。The heating component 11 will be described in detail below by taking the first substrate 111 and the second substrate 112 as dense substrates, and the first substrate 111 and the second substrate 112 as a flat plate as an example (as shown in FIG. 3 ).
第二基体112上第二导液孔1123的孔径为1μm-100μm。第二导液孔1123的孔径小于 1μm时,无法满足供液需求,导致气溶胶量下降;第二导液孔1123的孔径大于100μm时,气溶胶生成基质容易从第二导液孔1123内流出造成漏液,导致雾化效率下降。可选的,第二导液孔1123的孔径为20μm-60μm。可以理解的是,第二导液孔1123的孔径根据实际需要进行选择。The diameter of the second liquid conducting hole 1123 on the second substrate 112 is 1 μm-100 μm. When the diameter of the second liquid guide hole 1123 is less than 1 μm, the liquid supply demand cannot be met, resulting in a decrease in the amount of aerosol; when the diameter of the second liquid guide hole 1123 is greater than 100 μm, the aerosol-generating matrix easily flows out of the second liquid guide hole 1123 Cause liquid leakage, resulting in a drop in atomization efficiency. Optionally, the diameter of the second liquid conducting hole 1123 is 20 μm-60 μm. It can be understood that, the diameter of the second liquid guide hole 1123 is selected according to actual needs.
第二基体112的厚度为0.1mm-1mm。其中,第二基体112的厚度为第三表面1121与第四表面1122之间的距离。第二基体112的厚度大于1mm时,无法满足供液需求,导致气溶胶量下降,且造成的热损失多,设置第二导液孔1123的成本高;第二基体112的厚度小于0.1mm时,无法保证第二基体112的强度,不利于提高电子雾化装置的性能。可选的,第二基体112的厚度为0.2mm-0.5mm。可以理解的是,第二基体112的厚度根据实际需要进行选择。The thickness of the second base body 112 is 0.1 mm-1 mm. The thickness of the second base 112 is the distance between the third surface 1121 and the fourth surface 1122 . When the thickness of the second base body 112 is greater than 1 mm, the liquid supply requirement cannot be met, resulting in a decrease in the amount of aerosol, and the resulting heat loss is large, and the cost of installing the second liquid conducting holes 1123 is high; when the thickness of the second base body 112 is less than 0.1 mm , the strength of the second substrate 112 cannot be guaranteed, which is not conducive to improving the performance of the electronic atomization device. Optionally, the thickness of the second base body 112 is 0.2mm-0.5mm. It can be understood that the thickness of the second base body 112 is selected according to actual needs.
第二基体112的厚度与第二导液孔1123孔径的比例为20:1-3:1,以提升供液能力。当第二基体112的厚度与第二导液孔1123的孔径的比例大于20:1时,通过第二导液孔1123的毛细作用力供给的气溶胶生成基质难以满足雾化需求,不仅容易导致干烧,且单次雾化产生的气溶胶量下降;当第二基体112的厚度与第二导液孔1123的孔径的比例小于3:1时,气溶胶生成基质容易从第二导液孔1123内流出造成浪费,导致雾化效率下降,进而使得总气溶胶量降低。可选的,第二基体112厚度与第二导液孔1123孔径的比例为15:1-5:1。The ratio of the thickness of the second base body 112 to the diameter of the second liquid conducting hole 1123 is 20:1-3:1, so as to improve the liquid supply capacity. When the ratio of the thickness of the second substrate 112 to the diameter of the second liquid-conducting hole 1123 is greater than 20:1, the aerosol-generating matrix supplied by the capillary force of the second liquid-conducting hole 1123 cannot meet the atomization requirements, which not only easily leads to Dry burning, and the amount of aerosol generated by a single atomization decreases; when the ratio of the thickness of the second substrate 112 to the diameter of the second liquid-conducting hole 1123 is less than 3:1, the aerosol-generating matrix is easily generated from the second liquid-conducting hole. The flow out of 1123 causes waste, which leads to a decrease in atomization efficiency, which in turn reduces the total amount of aerosol. Optionally, the ratio of the thickness of the second substrate 112 to the diameter of the second liquid guide hole 1123 is 15:1-5:1.
相邻两个第二导液孔1123之间的孔中心距与第二导液孔1123的孔径的比例为3:1-1.5:1,以使第二基体112上的第二导液孔1123在满足供液能力的前提下,尽可能提升第二基体112的强度;可选的,相邻两个第二导液孔1123之间的孔中心距与第二导液孔1123的孔径的比例为3:1-2:1;进一步可选的,相邻两个第二导液孔1123之间的孔中心距与第二导液孔1123的孔径的比例为3:1-2.5:1。The ratio of the hole center distance between two adjacent second liquid guide holes 1123 to the diameter of the second liquid guide holes 1123 is 3:1-1.5:1, so that the second liquid guide holes 1123 on the second substrate 112 On the premise of satisfying the liquid supply capacity, the strength of the second base 112 is improved as much as possible; optionally, the ratio of the hole center distance between two adjacent second liquid guide holes 1123 to the diameter of the second liquid guide holes 1123 is 3:1-2:1; further optionally, the ratio of the hole center distance between two adjacent second liquid-guiding holes 1123 to the diameter of the second liquid-guiding holes 1123 is 3:1-2.5:1.
第一基体111上第一导液孔1113的孔径为1μm-100μm。第一导液孔1113的孔径小于1μm时,无法满足供液需求,导致气溶胶量下降;第一导液孔1113的孔径大于100μm时,易造成漏液,导致雾化效率下降。可以理解的是,第一基体111的孔径根据实际需要进行选择。The diameter of the first liquid conducting hole 1113 on the first substrate 111 is 1 μm-100 μm. When the pore size of the first liquid guide hole 1113 is less than 1 μm, the liquid supply demand cannot be met, resulting in a decrease in the amount of aerosol; when the pore size of the first liquid guide hole 1113 is larger than 100 μm, it is easy to cause liquid leakage, resulting in a decrease in atomization efficiency. It can be understood that the aperture of the first base body 111 is selected according to actual needs.
可选的,第一导液孔1113的孔径大于第二导液孔1123的孔径,以使第二导液孔1123的毛细作用力大于第一导液孔1113的毛细作用力,气溶胶生成基质能够从间隙113流至第二基体112的雾化面。由于第一导液孔1113也具有毛细作用力,出雾通道13的端口朝下使用时,可以防止液体回流,防止供液不足。Optionally, the diameter of the first liquid guide hole 1113 is larger than that of the second liquid guide hole 1123, so that the capillary force of the second liquid guide hole 1123 is greater than the capillary force of the first liquid guide hole 1113, and the aerosol generates a matrix. It can flow from the gap 113 to the atomizing surface of the second base body 112 . Since the first liquid guide hole 1113 also has capillary force, when the port of the mist outlet channel 13 is used downward, it can prevent the liquid from flowing back and prevent the liquid supply from being insufficient.
第一基体111的厚度为0.1mm-1mm。其中,第一基体111的厚度为第一表面1111与第 二表面1112之间的距离。可选的,第一基体111的厚度小于第二基体112的厚度。The thickness of the first base body 111 is 0.1 mm-1 mm. The thickness of the first substrate 111 is the distance between the first surface 1111 and the second surface 1112. Optionally, the thickness of the first base body 111 is smaller than the thickness of the second base body 112 .
具体地,下液孔1114与第二基体112能够生成气溶胶的区域错位设置。由于第二基体112为致密基体,发热元件114产生的热量传导至第二基体112上以雾化第二导液孔1113内的气溶胶生成基质。因此,第二基体112上距发热元件114较近的区域,温度较高且足以能够将气溶胶生成基质雾化生成气溶胶,定义为高温区域;第二基体112上距发热元件114较远的区域,可能传导的热量不足以将气溶胶生成基质雾化生成气溶胶,定义为低温区域。由于位于高温区域第二导液孔1113内的气溶胶生成基质被雾化后,可能会有外界气体进入第二导液孔1113形成气泡,在第二基体112靠近储液腔14的一侧设置第一基体111,第一基体111可以防止经第二导液孔1113进入的气泡长大。因此,将下液孔1114与能够将气溶胶生成基质雾化生成气溶胶的多个第二导液孔1113所在的区域错位设置,即,下液孔1114与第二基体112能够生成气溶胶的高温区域错位设置,以保证第一基体111防止雾化过程中从第二导液孔1113进入的气泡长大的功能的实现。Specifically, the lower liquid hole 1114 and the region where the aerosol can be generated in the second substrate 112 are arranged in a staggered position. Since the second substrate 112 is a dense substrate, the heat generated by the heating element 114 is conducted to the second substrate 112 to atomize the aerosol in the second liquid conducting hole 1113 to generate the substrate. Therefore, the area on the second substrate 112 that is closer to the heating element 114 has a high temperature and is sufficient to atomize the aerosol-generating substrate to generate aerosol, which is defined as a high-temperature area; the area on the second substrate 112 that is farther from the heating element 114 The region where the heat conduction may not be sufficient to atomize the aerosol-generating substrate to generate aerosol is defined as the low temperature region. Since the aerosol-generating matrix located in the second liquid-conducting hole 1113 in the high-temperature region is atomized, external gas may enter the second liquid-conducting hole 1113 to form bubbles, which are arranged on the side of the second matrix 112 close to the liquid storage chamber 14 The first base body 111, the first base body 111 can prevent the bubbles entering through the second liquid guide hole 1113 from growing. Therefore, the lower liquid hole 1114 and the region where the plurality of second liquid conducting holes 1113 capable of atomizing the aerosol-generating substrate to generate aerosol are arranged in a staggered position, that is, the lower liquid hole 1114 and the second substrate 112 are capable of generating aerosol. The high temperature area is arranged in a staggered position to ensure the realization of the function of the first base body 111 to prevent the growth of bubbles entering from the second liquid guide hole 1113 during the atomization process.
可选的,第一导液孔1113和下液孔1114的形状均为圆形孔。下液孔1114的孔径大于等于两倍第一导液孔1113的孔径。Optionally, the shapes of the first liquid guide hole 1113 and the lower liquid hole 1114 are both circular holes. The diameter of the lower liquid hole 1114 is greater than or equal to twice the diameter of the first liquid guide hole 1113 .
可选的,第一导液孔1113的形状为圆形孔,下液孔1114的形状为长条形,下液孔1114的宽度为90μm-110μm。Optionally, the shape of the first liquid guide hole 1113 is a circular hole, the shape of the lower liquid hole 1114 is a strip shape, and the width of the lower liquid hole 1114 is 90 μm-110 μm.
可选的,第一导液孔1113的形状为圆形孔,下液孔1114的形状为长条形,下液孔1114的宽度大于等于两倍第一导液孔1113的孔径。下液孔1114的长度根据需要进行设计,使得下液孔1114能够提高供液速度且不足以造成漏液即可。Optionally, the shape of the first liquid guide hole 1113 is a circular hole, the shape of the lower liquid hole 1114 is a long strip, and the width of the lower liquid hole 1114 is greater than or equal to twice the diameter of the first liquid guide hole 1113 . The length of the lower liquid hole 1114 is designed as required, so that the lower liquid hole 1114 can increase the liquid supply speed and is not enough to cause liquid leakage.
示例性的,下液孔1114的形状为长条形,即,下液孔1114包括两条平行的侧边a以及连接两条侧边a的曲边b,曲边b向远离下液孔1114的内部空间的方向凸起(如图5所示),两个曲边b对称设置;下液孔1114的宽度指的是两条侧边a之间的距离。Exemplarily, the shape of the lower liquid hole 1114 is a long strip, that is, the lower liquid hole 1114 includes two parallel sides a and a curved side b connecting the two side sides a, and the curved side b is far from the lower liquid hole 1114. The direction of the inner space is convex (as shown in FIG. 5 ), and the two curved sides b are arranged symmetrically; the width of the lower liquid hole 1114 refers to the distance between the two sides a.
参见图4,发热组件11还包括发热元件114、正电极116和负电极117,发热元件114的两端分别与正电极116、负电极117电连接。发热元件114设于第二基体112的第四表面1122,以雾化气溶胶生成基质生成气溶胶。正电极116和负电极117均设置于第二基体112的第四表面1122上,以便于与主机2电连接。发热元件114可以是发热片、发热膜、发热网等,能够加热雾化气溶胶生成基质即可。在另一实施方式中,发热元件114可以埋设于第二基体112的内部。在又一实施例中,第二基体112的至少部分导电以作为发热元件114。Referring to FIG. 4 , the heating assembly 11 further includes a heating element 114 , a positive electrode 116 and a negative electrode 117 , and both ends of the heating element 114 are electrically connected to the positive electrode 116 and the negative electrode 117 respectively. The heating element 114 is disposed on the fourth surface 1122 of the second substrate 112 to generate the aerosol by atomizing the aerosol-generating substrate. Both the positive electrode 116 and the negative electrode 117 are disposed on the fourth surface 1122 of the second base body 112 to facilitate electrical connection with the host 2 . The heating element 114 can be a heating sheet, a heating film, a heating net, etc., and can heat the atomized aerosol to generate a substrate. In another embodiment, the heating element 114 may be embedded inside the second base body 112 . In yet another embodiment, at least a portion of the second base body 112 is electrically conductive to serve as the heating element 114 .
可选的,发热元件114为条状;具体地,发热元件114多次弯折形成多个相互平行的延伸部1141,发热元件114还包括连接相邻的两个延伸部1141的连接部1142,延伸部1141 沿着正电极116向负电极117靠近的方向延伸(如图4所示)。Optionally, the heating element 114 is in the shape of a strip; specifically, the heating element 114 is bent multiple times to form a plurality of mutually parallel extension parts 1141, and the heating element 114 also includes a connection part 1142 connecting two adjacent extension parts 1141, The extension portion 1141 extends along the direction in which the positive electrode 116 approaches the negative electrode 117 (as shown in FIG. 4 ).
可选的,发热元件114为腰形膜(如图7所示,图7是图3提供的发热组件的发热元件另一实施方式的结构示意图)。图7提供的发热元件114相对于图4中所示的发热元件114,覆盖第二基体112的面积更大。Optionally, the heating element 114 is a waist-shaped film (as shown in FIG. 7 , which is a schematic structural diagram of another embodiment of the heating element of the heating assembly provided in FIG. 3 ). Compared with the heating element 114 shown in FIG. 4 , the heating element 114 provided in FIG. 7 covers a larger area of the second base 112 .
可选的,发热元件114为整面膜(如图8所示,图8是图3提供的发热组件的发热元件又一实施方式的结构示意图)。图8提供的发热元件114相对于图4中所示的发热元件114,覆盖第二基体112的面积更大,图8提供的发热元件114相对于图7中所示的发热元件114,覆盖第二基体112的面积更大。Optionally, the heating element 114 is a whole film (as shown in FIG. 8 , which is a schematic structural diagram of another embodiment of the heating element of the heating assembly provided in FIG. 3 ). Compared with the heating element 114 shown in FIG. 4 , the heating element 114 provided in FIG. 8 covers a larger area of the second substrate 112 . The heating element 114 provided in FIG. 8 covers the second substrate 114 relative to the heating element 114 shown in FIG. The area of the second base body 112 is larger.
第一基体111在第二基体112上的投影完全覆盖发热元件114,以保证供液速度能够满足发热元件114的雾化速度,实现较好的雾化效果。The projection of the first base body 111 on the second base body 112 completely covers the heating element 114 to ensure that the liquid supply speed can meet the atomization speed of the heating element 114 and achieve a better atomization effect.
继续参见图4,本实施方式中,仅在第二基体112的部分表面以阵列排布的方式设置多个第二导液孔1123。具体地,第二基体112设有微孔阵列区1124和围绕微孔阵列区1124一周设置的留白区1125,微孔阵列区1124具有多个第二导液孔1123;发热元件114设置于微孔阵列区1124,以加热雾化气溶胶生成基质;正电极116和负电极117设置于雾化面(第四表面1122)的留白区1125,以保证正电极116和负电极117电连接的稳定性。Continuing to refer to FIG. 4 , in this embodiment, only a part of the surface of the second substrate 112 is provided with a plurality of second liquid guide holes 1123 in an array arrangement. Specifically, the second substrate 112 is provided with a micro-hole array area 1124 and a blank area 1125 arranged around the micro-hole array area 1124. The micro-hole array area 1124 has a plurality of second liquid conducting holes 1123; the heating element 114 is arranged in the micro-hole array area 1124. The hole array area 1124 is used to heat the atomized aerosol to generate the matrix; the positive electrode 116 and the negative electrode 117 are arranged in the blank area 1125 of the atomization surface (the fourth surface 1122) to ensure that the positive electrode 116 and the negative electrode 117 are electrically connected stability.
通过在第二基体112上设有微孔阵列区1124和围绕微孔阵列区1124一周设置的留白区1125,可以理解,留白区1125上并未设置第二导液孔1123,减少了第二基体112上第二导液孔1123的数量,以此提高第二基体112的强度,降低在第二基体112上设置第二导液孔1123的生产成本。第二基体112中的微孔阵列区1124作为雾化区,覆盖发热元件114及发热元件114周边区域,也就是基本覆盖达到雾化气溶胶生成基质温度的区域,充分利用了热效率。By providing a microwell array area 1124 and a blank area 1125 around the microwell array area 1124 on the second substrate 112, it can be understood that the second liquid guide hole 1123 is not provided on the blank area 1125, which reduces the number of The number of the second liquid guide holes 1123 on the two base bodies 112 increases the strength of the second base body 112 and reduces the production cost of disposing the second liquid guide holes 1123 on the second base body 112 . The microporous array area 1124 in the second substrate 112 is used as an atomization area, covering the heating element 114 and the surrounding area of the heating element 114 , that is, basically covering the area that reaches the temperature of the atomized aerosol generation substrate, making full use of thermal efficiency.
可以理解,本申请中的第二基体112的微孔阵列区1124周边的区域的尺寸大于第二导液孔1123的孔径,才能称之为留白区1125;即,本申请中的留白区1125是可以形成第二导液孔1123而没有形成第二导液孔1123的区域,而非微孔阵列区1124周边的无法形成第二导液孔1123的区域。在一个实施例中,距离第二基体112的边线最近的第二导液孔1123与第二基体112的边线之间的间距大于第二导液孔1123的孔径,才认为在微孔阵列区1124的周向上设有留白区1125。It can be understood that the size of the area around the micropore array area 1124 of the second substrate 112 in this application is larger than the diameter of the second liquid-conducting hole 1123, so it can be called the blank area 1125; that is, the blank area in this application 1125 is an area where the second liquid guide hole 1123 can be formed but no second liquid guide hole 1123 is formed, and is not a region around the microwell array area 1124 where the second liquid guide hole 1123 cannot be formed. In one embodiment, the distance between the second liquid guide hole 1123 closest to the edge of the second base 112 and the edge of the second base 112 is greater than the diameter of the second liquid guide hole 1123, and it is considered that the micro-hole array area 1124 There is a blank area 1125 on the circumference of .
第一基体111上是整个表面均设置有第一导液孔1113还是仅在部分表面设置第一导液孔1113可以根据需要进行设计。可选的,参见图5,第一基体111设有微孔阵列区1116和围绕微孔阵列区1116一周设置的留白区1117,微孔阵列区1116具有多个第一导液孔1113。Whether the entire surface of the first base body 111 is provided with the first liquid guide holes 1113 or only a part of the surface with the first liquid guide holes 1113 can be designed as required. Optionally, referring to FIG. 5 , the first substrate 111 is provided with a microwell array area 1116 and a blank area 1117 arranged around the microwell array area 1116 , and the microwell array area 1116 has a plurality of first liquid conducting holes 1113 .
可选的,第一基体111的微孔阵列区1116在第二基体112上的投影将第二基体112的微孔阵列区1124完全覆盖,以使供液速度能够满足发热元件114的雾化速度。Optionally, the projection of the micropore array area 1116 of the first substrate 111 on the second substrate 112 completely covers the micropore array area 1124 of the second substrate 112, so that the liquid supply speed can meet the atomization speed of the heating element 114. .
请参阅图9,图9是图3提供的发热组件的下液孔与发热元件一实施方式的位置关系图。Please refer to FIG. 9 . FIG. 9 is a positional relationship diagram of an embodiment of the lower liquid hole and the heating element of the heating assembly provided in FIG. 3 .
在一实施方式中,下液孔1114在第二基体112的第三表面1121的投影与发热元件114在第三表面1121的投影错位设置。发热元件114可以为图4、图7、图8中所示的发热元件114。图9以图4所示的发热元件114为例示意。In one embodiment, the projection of the lower liquid hole 1114 on the third surface 1121 of the second substrate 112 is staggered from the projection of the heating element 114 on the third surface 1121 . The heating element 114 may be the heating element 114 shown in FIG. 4 , FIG. 7 , and FIG. 8 . FIG. 9 illustrates the heating element 114 shown in FIG. 4 as an example.
示例性,发热元件114包括三个相互平行的延伸部1141和两个连接相邻的两个延伸部1141的连接部1142。第一基体111上设有两个下液孔1114。两个下液孔1114与三个延伸部1141交替设置。下液孔1114在发热元件114所在平面的投影位于相邻的两个延伸部1141之间。Exemplarily, the heating element 114 includes three mutually parallel extending portions 1141 and two connecting portions 1142 connecting two adjacent extending portions 1141 . The first base body 111 is provided with two lower liquid holes 1114 . Two lower liquid holes 1114 and three extending portions 1141 are alternately arranged. The projection of the lower liquid hole 1114 on the plane where the heating element 114 is located is located between two adjacent extension parts 1141 .
可选的,下液孔1114的形状为长条形,且与延伸部1141平行设置。Optionally, the lower liquid hole 1114 is in the shape of a long strip and is arranged parallel to the extension portion 1141 .
请参阅图10,图10是图3提供的发热组件的下液孔与发热元件另一实施方式的位置关系图。Please refer to FIG. 10 . FIG. 10 is a positional relationship diagram of the lower liquid hole of the heating assembly provided in FIG. 3 and the heating element according to another embodiment.
在另一实施方式中,下液孔1114在第二基体112的第三表面1121的投影与发热元件114在第三表面1121的投影部分重叠。发热元件114可以为图4、图7、图8中所示的发热元件114。图10以图4所示的发热元件114为例示意。In another embodiment, the projection of the lower liquid hole 1114 on the third surface 1121 of the second substrate 112 partially overlaps the projection of the heating element 114 on the third surface 1121 . The heating element 114 may be the heating element 114 shown in FIG. 4 , FIG. 7 , and FIG. 8 . FIG. 10 illustrates the heating element 114 shown in FIG. 4 as an example.
继续参见图6,第一基体111的边缘具有进液口1115。可以理解,间隙113通过进液口1115、第一导液孔1113与储液腔14连通。Continuing to refer to FIG. 6 , the edge of the first base body 111 has a liquid inlet 1115 . It can be understood that the gap 113 communicates with the liquid storage cavity 14 through the liquid inlet 1115 and the first liquid guide hole 1113 .
可选的,在第一基体111相对的的两边缘均设有进液口1115。Optionally, two opposite edges of the first base body 111 are provided with liquid inlets 1115 .
发热组件11还包括固定件115,固定件115具有进液孔1151。The heating assembly 11 further includes a fixing member 115 , and the fixing member 115 has a liquid inlet hole 1151 .
可选的,固定件115具有密封功能,固定件115的材料为硅胶或氟橡胶。Optionally, the fixing member 115 has a sealing function, and the material of the fixing member 115 is silicone or fluorine rubber.
可选的,第一基体111至少部分边缘与进液孔1151的孔壁间隔设置形成进液口1115,第二基体112横跨整个进液孔1151;例如,第一基体111相对的两条长边分别与进液孔1151的孔壁间隔设置形成两个对称设置的进液口1115(如图5所示)。Optionally, at least part of the edge of the first base 111 is spaced from the hole wall of the liquid inlet hole 1151 to form a liquid inlet 1115, and the second base 112 spans the entire liquid inlet 1151; for example, two opposite lengths of the first base 111 The sides are spaced apart from the hole wall of the liquid inlet hole 1151 to form two symmetrically arranged liquid inlet ports 1115 (as shown in FIG. 5 ).
可选的,第一基体111的边缘设置有通孔(图未示)形成进液口1115,第二基体112横跨整个进液孔1151。Optionally, the edge of the first base body 111 is provided with a through hole (not shown) to form a liquid inlet 1115 , and the second base body 112 spans the entire liquid inlet hole 1151 .
第一基体111在雾化面上的投影完全覆盖发热元件114,进液口1115与发热元件114错位设置。通过在第一基体111上设置进液口1115,不仅可以通过进液口1115对间隙113进行补液,还可以通过进液口1115排除气泡,避免气泡进入储液腔14对供液的影响,进而避免干烧现象。The projection of the first base body 111 on the atomizing surface completely covers the heating element 114 , and the liquid inlet 1115 and the heating element 114 are arranged in a staggered position. By arranging the liquid inlet 1115 on the first base 111, not only can the gap 113 be filled with liquid through the liquid inlet 1115, but also air bubbles can be eliminated through the liquid inlet 1115, so as to avoid the influence of the air bubbles entering the liquid storage chamber 14 on the liquid supply, and further Avoid dry burning.
进液孔1151通过下液通道1211与储液腔14流体连通。第一基体111和/或第二基体112嵌设于进液孔1151中,即,固定件115用于固定第一基体111和/或第二基体112的周边。当固定件115包覆第二基体112的周边时,固定件115并未遮挡发热元件114,进液孔1151能够使发热元件114完全暴露。可选的,进液孔1151的孔壁具有环形安装槽(未图示),第一基体111和/或第二基体112的边缘嵌设在环形安装槽中,且使第一基体111和第二基体112形成间隙113。可以理解,可以是第一基体111和第二基体112相互平行间隔设置形成间隙113;也可以是第一基体111与第二基体112之间非平行设置形成间隙113,具体地,第一基体111与第二基体112之间形成夹角。The liquid inlet hole 1151 is in fluid communication with the liquid storage chamber 14 through the lower liquid channel 1211 . The first base body 111 and/or the second base body 112 are embedded in the liquid inlet hole 1151 , that is, the fixing member 115 is used to fix the periphery of the first base body 111 and/or the second base body 112 . When the fixing member 115 covers the periphery of the second base body 112 , the fixing member 115 does not cover the heating element 114 , and the liquid inlet hole 1151 can completely expose the heating element 114 . Optionally, the hole wall of the liquid inlet hole 1151 has an annular installation groove (not shown), and the edges of the first base body 111 and/or the second base body 112 are embedded in the annular installation groove, and the first base body 111 and the second base body 112 are embedded in the annular installation groove. The two base bodies 112 form a gap 113 . It can be understood that the first base body 111 and the second base body 112 may be arranged parallel to each other to form a gap 113 ; it may also be a non-parallel setting between the first base body 111 and the second base body 112 to form a gap 113 , specifically, the first base body 111 An included angle is formed with the second base body 112 .
请参阅图11,图11是图2提供的雾化器的发热组件另一实施方式的结构示意图。Please refer to FIG. 11 . FIG. 11 is a schematic structural diagram of another embodiment of the heating component of the atomizer provided in FIG. 2 .
图11提供的发热组件11与图3提供的发热组件11结构基本相同,不同之处在于:图3提供的发热组件11中通过在固定件115的进液孔1151的孔壁上设环形安装槽,通过环形安装槽使第一基体111和第二基体112之间形成间隙113;而图11提供的发热组件11中通过间隔件118使第一基体111和第二基体112之间形成间隙113。The heating assembly 11 provided in FIG. 11 is basically the same in structure as the heating assembly 11 provided in FIG. 3 , the difference is that in the heating assembly 11 provided in FIG. , a gap 113 is formed between the first base 111 and the second base 112 through the annular mounting groove; while the spacer 118 in the heating assembly 11 provided in FIG. 11 forms a gap 113 between the first base 111 and the second base 112 .
发热组件11还包括间隔件118,间隔件118设于第二表面1112和第三表面1121之间,且位于第一基体111和/或第二基体112边缘,以使第一基体111与第二基体112形成间隙113。间隔件118可以沿着第一基体111和/或第二基体112的周向设置,即间隔件118为环状结构,以避免间隙113中的气溶胶生成基质漏出。间隔件118也可以为多个且沿着第一基体111和第二基体112的周向间隔设置,通过密封件(图未示)密封第一基体111和第二基体112的周向。The heating element 11 further includes a spacer 118, the spacer 118 is arranged between the second surface 1112 and the third surface 1121, and is located at the edge of the first base 111 and/or the second base 112, so that the first base 111 and the second base 111 The base body 112 forms a gap 113 . The spacer 118 may be disposed along the circumference of the first base body 111 and/or the second base body 112 , that is, the spacer 118 is an annular structure, so as to avoid leakage of the aerosol-generating matrix in the gap 113 . The spacers 118 may also be multiple and spaced along the circumferential direction of the first base body 111 and the second base body 112 , and seal the circumferential direction of the first base body 111 and the second base body 112 by a sealing member (not shown).
在一实施方式中,第一基体111和第二基体112平行设置(如图11所示)。In one embodiment, the first base body 111 and the second base body 112 are arranged in parallel (as shown in FIG. 11 ).
可选的,间隔件118为独立设置的垫片,垫片与第一基体111、第二基体112为可拆卸连接,垫片为环状结构。具体操作为:在第一基体111上形成第一导液孔1113,在第二基体112上形成第二导液孔1123,然后将垫片设置于第一基体111与第二基体112之间,具体地,垫片设置于第一基体111的留白区1117与第二基体112的留白区1125之间。例如,间隔件118可以为硅胶框或塑胶框。Optionally, the spacer 118 is an independently provided spacer, the spacer is detachably connected to the first base body 111 and the second base body 112 , and the spacer is an annular structure. The specific operations are: forming a first liquid guide hole 1113 on the first base body 111, forming a second liquid guide hole 1123 on the second base body 112, and then disposing a gasket between the first base body 111 and the second base body 112, Specifically, the spacer is disposed between the blank area 1117 of the first base body 111 and the blank area 1125 of the second base body 112 . For example, the spacer 118 can be a silicone frame or a plastic frame.
可选的,间隔件118为固定在第一基体111的第二表面1112和/或第二基体112的第三表面1121的支撑柱或支撑框,支撑柱或支撑框通过卡固或焊接的方式固定于第一基体111的第二表面1112和/或第二基体112第三表面1121。具体操作为:在第一基体111上形成第一导液孔1113,在第二基体112上形成第二导液孔1123,然后将通过焊接或卡固的方式,使支撑柱或支撑框与第一基体111、第二基体112成一体。例如,第一基体111和第二基体 112为玻璃板,在第一基体111边缘涂敷玻璃粉,其后在盖上第二基体112后用激光将玻璃粉烧结为玻璃以将支撑柱或支撑框与第一基体111、第二基体112固定。Optionally, the spacer 118 is a support column or a support frame fixed on the second surface 1112 of the first base body 111 and/or the third surface 1121 of the second base body 112 , and the support column or support frame is clamped or welded. It is fixed on the second surface 1112 of the first base body 111 and/or the third surface 1121 of the second base body 112 . The specific operation is: forming a first liquid guide hole 1113 on the first base body 111, forming a second liquid guide hole 1123 on the second base body 112, and then welding or clamping to make the support column or support frame and the first liquid guide hole 1123. A base body 111 and a second base body 112 are integrated. For example, the first base 111 and the second base 112 are glass plates, glass frit is coated on the edge of the first base 111 , and after the second base 112 is covered, the glass frit is sintered into glass with a laser to connect the support posts or supports The frame is fixed to the first base body 111 and the second base body 112 .
可选的,间隔件118为与第一基体111和/或第二基体112一体成型的凸起。若间隔件118为与第一基体111一体成型的凸起,在第一基体111上形成第一导液孔1113,在第二基体112上形成第二导液孔1123,然后将第二基体112搭接于凸起上以形成间隙113。若间隔件118为与第二基体112一体成型的凸起,在第一基体111上形成第一导液孔1113,在第二基体112上形成第二导液孔1123,然后将第一基体111搭接于凸起上以形成间隙113。例如,在第一基体111的第二表面1112蚀刻形成凹槽,凹槽的侧壁作为间隔件118,第一导液孔1113形成于凹槽的底壁;第二基体112的第三表面1121为平面,第二基体112的第三表面1121搭接于第二表面1212的凹槽的侧壁端面上,即第二基体112的第三表面1121与第一基体111的第二表面1112贴合,第三表面1121与凹槽配合形成间隙113。如果将凹槽的底面解释为第二表面1112,则凹槽的侧壁可以解释为第二表面1112的凸起。Optionally, the spacer 118 is a protrusion integrally formed with the first base body 111 and/or the second base body 112 . If the spacer 118 is a protrusion integrally formed with the first base body 111 , the first liquid guide hole 1113 is formed on the first base body 111 , the second liquid guide hole 1123 is formed on the second base body 112 , and then the second base body 112 is formed. Overlap on the protrusion to form a gap 113 . If the spacer 118 is a protrusion integrally formed with the second base body 112 , the first liquid guide hole 1113 is formed on the first base body 111 , the second liquid guide hole 1123 is formed on the second base body 112 , and then the first base body 111 is formed. Overlap on the protrusion to form a gap 113 . For example, grooves are formed by etching on the second surface 1112 of the first base body 111 , the sidewalls of the grooves serve as spacers 118 , and the first liquid guide holes 1113 are formed on the bottom wall of the grooves; the third surface 1121 of the second base body 112 The third surface 1121 of the second base 112 overlaps the end surface of the side wall of the groove of the second surface 1212 , that is, the third surface 1121 of the second base 112 is in contact with the second surface 1112 of the first base 111 , the third surface 1121 cooperates with the groove to form a gap 113 . If the bottom surface of the groove is interpreted as the second surface 1112 , the sidewall of the groove can be interpreted as the protrusion of the second surface 1112 .
请参阅图12,图12是图11提供发热组件中间隔件另一设置方式的结构示意图。在另一实施方式中,第一基体111和第二基体112之间形成夹角,夹角为锐角,例如夹角为15度-30度。可以理解,第一基体111和第二基体112之间形成夹角,可以是间隔件118位于第一基体111和第二基体112一端的边缘,第一基体111和第二基体112另一端的边缘直接抵接;也可以是两个间隔件118分别位于第一基体111和第二基体112的两端的边缘且高度不同。Please refer to FIG. 12 . FIG. 12 is a schematic structural diagram of FIG. 11 providing another arrangement of the spacers in the heating element. In another embodiment, an included angle is formed between the first base body 111 and the second base body 112 , and the included angle is an acute angle, for example, the included angle is 15 degrees to 30 degrees. It can be understood that the angle formed between the first base body 111 and the second base body 112 may be that the spacer 118 is located at the edge of one end of the first base body 111 and the second base body 112 , and the edge of the other end of the first base body 111 and the second base body 112 Direct abutment; two spacers 118 may also be located at the edges of both ends of the first base body 111 and the second base body 112 and have different heights.
以上仅为本申请的实施方式,并非因此限制本申请的专利范围,凡是利用本申请说明书及附图内容所作的等效结构或等效流程变换,或直接或间接运用在其他相关的技术领域,均同理包括在本申请的专利保护范围内。The above are only the embodiments of the present application, and are not intended to limit the scope of the patent of the present application. Any equivalent structure or equivalent process transformation made by using the contents of the description and drawings of the present application, or directly or indirectly applied in other related technical fields, All are similarly included in the scope of patent protection of the present application.

Claims (19)

  1. 一种发热组件,应用于电子雾化装置,用于雾化气溶胶生成基质,其中,包括:A heating component, applied to an electronic atomization device, used for atomizing aerosol generation substrate, comprising:
    第一基体,具有相对设置的第一表面和第二表面,所述第一表面为吸液面;所述第一基体具有多个第一导液孔,所述第一导液孔用于将气溶胶生成基质从所述第一表面导引至所述第二表面;The first base has a first surface and a second surface arranged oppositely, the first surface is a liquid absorption surface; the first base has a plurality of first liquid guide holes, and the first liquid guide holes are used to an aerosol-generating substrate is directed from the first surface to the second surface;
    第二基体,具有相对设置的第三表面和第四表面,所述第四表面为雾化面;所述第二基体具有多个第二导液孔,所述第二导液孔用于将所述气溶胶生成基质从所述第三表面导引至所述第四表面;The second substrate has a third surface and a fourth surface arranged opposite to each other, and the fourth surface is an atomization surface; the second substrate has a plurality of second liquid-conducting holes, and the second liquid-conducting holes are used to the aerosol-generating substrate is directed from the third surface to the fourth surface;
    其中,所述第二表面与所述第三表面相对且形成间隙,所述第一导液孔与所述第二导液孔通过所述间隙流体连通;所述第一基体还具有至少一个贯穿所述第一表面和所述第二表面的下液孔,所述下液孔的孔径大于所述第一导液孔的孔径。Wherein, the second surface is opposite to the third surface and forms a gap, and the first liquid guide hole and the second liquid guide hole are in fluid communication through the gap; the first substrate also has at least one through-hole In the lower liquid holes of the first surface and the second surface, the diameter of the lower liquid holes is larger than that of the first liquid conducting hole.
  2. 根据权利要求1所述的发热组件,其中,还包括发热元件,所述发热元件用于雾化所述气溶胶生成基质;所述发热元件设于所述第四表面或埋设于所述第二基体内部,或所述第二基体的至少部分导电以作为所述发热元件。The heating assembly according to claim 1, further comprising a heating element for atomizing the aerosol generating substrate; the heating element is arranged on the fourth surface or embedded in the second surface The inside of the base body, or at least part of the second base body, is electrically conductive to serve as the heating element.
  3. 根据权利要求2所述的发热组件,其中,所述下液孔在所述第三表面的投影与所述发热元件在所述第三表面的投影错位设置。The heating assembly according to claim 2, wherein the projection of the lower liquid hole on the third surface and the projection of the heating element on the third surface are arranged in a dislocation.
  4. 根据权利要求2所述的发热组件,其中,所述下液孔在所述第三表面的投影与所述发热元件在所述第三表面的投影部分重叠。The heating assembly according to claim 2, wherein the projection of the lower liquid hole on the third surface partially overlaps the projection of the heating element on the third surface.
  5. 根据权利要求3所述的发热组件,其中,所述发热元件包括多个相互平行的延伸部和连接相邻两个所述延伸部的连接部;The heating assembly according to claim 3, wherein the heating element comprises a plurality of mutually parallel extending portions and a connecting portion connecting two adjacent extending portions;
    所述发热组件还包括正电极和负电极,所述发热元件的两端分别与所述正电极和所述负电极电连接;所述延伸部沿着所述正电极向所述负电极靠近的方向延伸;The heating component also includes a positive electrode and a negative electrode, and the two ends of the heating element are respectively electrically connected to the positive electrode and the negative electrode; the extension part approaches the negative electrode along the positive electrode. direction extension;
    所述下液孔在所述发热元件所在平面的投影位于相邻的两个所述延伸部之间。The projection of the lower liquid hole on the plane where the heating element is located is located between two adjacent extension parts.
  6. 根据权利要求5所述的发热组件,其中,所述下液孔的形状为长条形,且与所述延伸部平行。The heating element according to claim 5, wherein the lower liquid hole is in the shape of an elongated strip and is parallel to the extending portion.
  7. 根据权利要求1所述的发热组件,其中,所述第一导液孔的孔径为1μm-100μm;所述下液孔的孔径大于等于两倍所述第一导液孔的孔径。The heating element according to claim 1, wherein the diameter of the first liquid-conducting hole is 1 μm-100 μm; the diameter of the lower liquid-conducting hole is greater than or equal to twice the diameter of the first liquid-conducting hole.
  8. 根据权利要求1所述的发热组件,其中,所述下液孔的形状为长条形,所述下液孔的宽度大于等于两倍所述第一导液孔的孔径。The heating element according to claim 1, wherein the shape of the lower liquid hole is a long strip, and the width of the lower liquid hole is greater than or equal to twice the diameter of the first liquid conducting hole.
  9. 根据权利要求8所述的发热组件,其中,所述下液孔的形状包括两条平行的侧边以及连接两条所述侧边的曲边,所述曲边向远离所述下液孔的内部空间的方向凸起;所述下液孔的宽度指的是两条所述侧边之间的距离。The heating element according to claim 8, wherein the shape of the lower liquid hole comprises two parallel side edges and a curved edge connecting the two side edges, and the curved edge is directed away from the lower liquid hole. The direction of the inner space is convex; the width of the lower liquid hole refers to the distance between the two sides.
  10. 根据权利要求1所述的发热组件,其中,所述第二导液孔的毛细作用力大于所述第一导液孔的毛细作用力。The heating element according to claim 1, wherein the capillary force of the second liquid guide hole is greater than the capillary force of the first liquid guide hole.
  11. 根据权利要求1所述的发热组件,其中,所述第二基体为致密基体,所述第二导液孔为贯穿所述第三表面和所述第四表面的直通孔。The heating element according to claim 1, wherein the second substrate is a dense substrate, and the second liquid conducting hole is a through hole penetrating through the third surface and the fourth surface.
  12. 根据权利要求11所述的发热组件,其中,所述第一基体为致密基体,所述第一导液孔为贯穿所述第一表面和所述第二表面的直通孔。The heating element according to claim 11, wherein the first base body is a dense base body, and the first liquid conducting hole is a through hole passing through the first surface and the second surface.
  13. 根据权利要求12所述的发热组件,其中,所述第一基体的材料为石英、玻璃或致密陶瓷;所述第二基体的材料为石英、玻璃或致密陶瓷。The heating component according to claim 12, wherein the material of the first base body is quartz, glass or dense ceramics; the material of the second base body is quartz, glass or dense ceramics.
  14. 根据权利要求1所述的发热组件,其中,所述发热组件还包括间隔件;所述间隔件设置于所述第二表面和所述第三表面之间,且位于所述第一基体和/或所述第二基体边缘,以使所述第一基体与所述第二基体形成所述间隙。The heat-generating component according to claim 1, wherein the heat-generating component further comprises a spacer; the spacer is disposed between the second surface and the third surface, and is located on the first base and/or or the edge of the second base body, so that the first base body and the second base body form the gap.
  15. 根据权利要求14所述的发热组件,其中,所述第一基体与所述第二基体平行设置;或,所述第一基体与所述第二基体之间形成夹角。The heating element according to claim 14, wherein the first base body and the second base body are arranged in parallel; or, an angle is formed between the first base body and the second base body.
  16. 根据权利要求14所述的发热组件,其中,所述间隔件为独立设置的垫片;The heating assembly according to claim 14, wherein the spacer is an independently arranged gasket;
    或,所述间隔件为固定在所述第二表面和/或所述第三表面的支撑柱或支撑框;Or, the spacer is a support column or a support frame fixed on the second surface and/or the third surface;
    或,所述间隔件为与所述第一基体和/或所述第二基体一体成型的凸起。Or, the spacer is a protrusion integrally formed with the first base body and/or the second base body.
  17. 一种雾化器,其中,包括:An atomizer comprising:
    储液腔,用于存储液态气溶胶生成基质;a liquid storage chamber for storing the liquid aerosol-generating substrate;
    发热组件,所述发热组件为权利要求1-16任意一项所述的发热组件;所述发热组件与所述储液腔流体连通。A heating component, the heating component is the heating component according to any one of claims 1-16; the heating component is in fluid communication with the liquid storage chamber.
  18. 根据权利要求17所述的雾化器,其中,所述发热组件为权利要求11-13任一项所述的发热组件,所述下液孔与所述第二基体能够将所述气溶胶生成基质雾化生成气溶胶的区域错位设置。The atomizer according to claim 17, wherein the heating component is the heating component according to any one of claims 11-13, and the lower liquid hole and the second substrate can generate the aerosol Regionally dislocated settings for aerosol-generated aerosols from matrix nebulization.
  19. 一种电子雾化装置,其中,包括雾化器和主机,所述雾化器为权利要求17或权利要求18所述的雾化器,所述主机与所述发热组件电连接。An electronic atomization device, comprising an atomizer and a main unit, the atomizer is the atomizer of claim 17 or claim 18, and the main unit is electrically connected to the heating component.
PCT/CN2022/092861 2021-12-30 2022-05-13 Heating assembly, atomizer and electronic atomization device WO2022179642A2 (en)

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