WO2022097484A1 - セミアディティブ工法用積層体及びそれを用いたプリント配線板 - Google Patents

セミアディティブ工法用積層体及びそれを用いたプリント配線板 Download PDF

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WO2022097484A1
WO2022097484A1 PCT/JP2021/038872 JP2021038872W WO2022097484A1 WO 2022097484 A1 WO2022097484 A1 WO 2022097484A1 JP 2021038872 W JP2021038872 W JP 2021038872W WO 2022097484 A1 WO2022097484 A1 WO 2022097484A1
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Prior art keywords
layer
silver
group
semi
base material
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PCT/JP2021/038872
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English (en)
French (fr)
Japanese (ja)
Inventor
憲正 深澤
亘 冨士川
昭 村川
潤 白髪
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Dic株式会社
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Priority to JP2022533166A priority Critical patent/JPWO2022097484A1/ja
Publication of WO2022097484A1 publication Critical patent/WO2022097484A1/ja

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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/24—Reinforcing the conductive pattern

Definitions

  • the present invention relates to a planar semi-additive method laminate used for electrically connecting both sides of a base material and a printed wiring board using the same.
  • the printed wiring board is a printed wiring board in which a metal layer of a circuit pattern is formed on the surface of an insulating base material.
  • a metal layer of a circuit pattern is formed on the surface of an insulating base material.
  • an etching resist having a circuit pattern shape is formed on the surface of a copper layer formed on an insulating base material, and the copper layer in a circuit-unnecessary part is etched to obtain the copper wiring.
  • the subtractive method of forming has been widely used.
  • the etching solution may wrap around the lower part of the resist, and as a result of the side etching, the wiring width direction may become narrower. It was a problem. In particular, when regions having different wiring densities coexist, there is a problem that the fine wiring existing in the region having a low wiring density disappears as the etching proceeds. Furthermore, the cross-sectional shape of the wiring obtained by the subtractive method is not rectangular, but has a trapezoidal shape or a triangular shape with a wide hem on the base material side. There was also a problem as a transmission line.
  • a semi-additive method has been proposed as a method for solving these problems and manufacturing a fine wiring circuit.
  • a conductive seed layer is formed on an insulating base material, and a plating resist is formed on a non-circuit forming portion on the seed layer.
  • the resist is peeled off and the seed layer of the non-circuit forming portion is removed to form the fine wiring.
  • the plating is deposited along the shape of the resist, the cross-sectional shape of the wiring can be made rectangular, and the wiring of the desired width can be deposited regardless of the density of the pattern. Since it can be formed, it is suitable for forming fine wiring.
  • a method of forming a conductive seed layer on an insulating base material by electroless copper plating using a palladium catalyst or electroless nickel plating is known.
  • the surface of the substrate is roughened using a strong chemical such as permanganic acid, which is called desmear roughening, in order to ensure the adhesion between the film substrate and the copper-plated film.
  • desmear roughening a strong chemical such as permanganic acid
  • a technique of forming electroless nickel plating on a polyimide film to form a conductive seed is also known.
  • the imide ring of the surface layer is opened to make the film surface hydrophilic, and at the same time, a modified layer in which water permeates is formed, and the modified layer is contained.
  • a palladium catalyst is impregnated into the film and electroless nickel plating is performed to form a nickel seed layer (see, for example, Patent Document 1).
  • the adhesion strength is obtained by forming nickel plating from the modified layer of the outermost polyimide layer, but since the modified layer is in a state where the imide ring is opened, the film surface layer. There was a problem that the structure was physically and chemically weak.
  • Patent Document 2 a method of forming a conductive seed such as nickel or titanium on an insulating base material by a sputtering method is also known (for example).
  • Patent Document 2 a method of forming a conductive seed such as nickel or titanium on an insulating base material by a sputtering method is also known (for example).
  • Patent Document 2 This method can form a seed layer without roughening the surface of the substrate, but it requires the use of expensive vacuum equipment, a large initial investment, and the size and shape of the substrate. The problems were that there were restrictions and that the process was complicated with low productivity.
  • a method for solving the problem of the sputtering method a method of using a coating layer of a conductive ink containing metal particles as a conductive seed layer has been proposed (see, for example, Patent Document 3).
  • the above-mentioned coating is performed by applying a conductive ink in which metal particles having a particle diameter of 1 to 500 nm are dispersed on an insulating base material made of a film or a sheet, and performing a heat treatment.
  • a technique is disclosed in which metal particles in a conductive ink are fixed as a metal layer on an insulating base material to form a conductive seed layer, and further, plating is performed on the conductive seed layer.
  • Patent Document 3 pattern formation by a semi-additive method is proposed, and in an embodiment, a conductive ink in which copper particles are dispersed is applied and heat-treated to form a copper conductive seed layer.
  • a photosensitive resist is formed on the conductive seed layer, exposed and developed, the pattern-forming part is thickened by electrolytic copper plating, the resist is peeled off, and then copper is used. It is described that the conductive seed layer of the above is removed by etching.
  • a thin copper foil or a base material provided with a copper plating film as a conductive seed on an insulating base material is semi-additive. It is used as a base material for construction methods.
  • the conductive seed layer and the conductive layer of the circuit pattern are formed of the same metal as in the combination of the conductive seed layer of copper and the circuit pattern of copper, the conductive seed layer of the non-pattern forming portion is formed. It is known that the conductive layer of the circuit pattern is also etched at the same time when the circuit pattern is removed, so that the circuit pattern becomes thinner and thinner, and the surface roughness of the circuit conductive layer also increases. It was a problem to be solved in manufacturing wiring for high frequency transmission.
  • Non-Patent Documents 1 and 2 a substrate in which a conductive silver particle layer is formed on the surface of an insulating substrate as a substrate for a semi-additive method in a seed layer etching step. Invented a technique for forming a printed wiring board having a smooth circuit layer surface with good design reproducibility without thinning of the circuit pattern or thinning.
  • the technique can form circuits on both sides as well as on one side, but has conductive silver particle layers on both sides of the insulating substrate to connect the circuits on both sides.
  • the holes are adsorbed on the conductive seed layer.
  • the conductive silver particle layer (M1) may be damaged and cannot be used as a plating seed.
  • the conductive seed layer for forming a circuit pattern becomes a copper layer, and as described above, in the seed layer etching step.
  • the thinning of the circuit pattern and the thinning of the circuit pattern become problems.
  • the problem to be solved by the present invention is that it does not require surface roughening with chromium acid or permanganic acid, formation of a surface modification layer with alkali, etc., and high adhesion between the substrate and the conductor circuit without using a vacuum device.
  • a planar semi-additive method laminate for double-sided connection that can form wiring with good properties, less undercut, good design reproducibility, and a good rectangular cross-sectional shape as circuit wiring, and printing using it. It is to provide a wiring board.
  • the present inventors have sequentially laminated a silver particle layer (M1) and a silver-plated layer (M2) on both surfaces of the insulating base material (A), and further.
  • a base material having a through hole connecting both sides of the base material and having a silver plating layer on the surface of the through hole is used, a pattern resist is formed on the silver plating layer (M2), and electrolytic copper plating is performed.
  • electrolytic copper plating is performed.
  • Item 6 The laminate for a semi-additive method according to any one of Items 1 to 3, wherein the silver particles constituting the silver particle layer (M1) are coated with a polymer dispersant.
  • the primer layer (B) is a layer composed of a resin having a reactive functional group [X], and the polymer dispersant is a reactive functional group [Y]. ], And the reactive functional group [X] and the reactive functional group [Y] can form a bond with each other by a reaction.
  • polymer dispersant having the reactive functional group [Y] is at least one selected from the group consisting of polyalkyleneimine and polyalkyleneimine having a polyoxyalkylene structure containing an oxyethylene unit. Laminated body for additive construction method.
  • the reactive functional group [X] is selected from the group consisting of a keto group, an acetoacetyl group, an epoxy group, a carboxyl group, an N-alkyrole group, an isocyanate group, a vinyl group, a (meth) acryloyl group and an allyl group1
  • a printed wiring board manufactured by using the laminate for the semi-additive method according to 9.1 to 8 is provided.
  • FIG. 1 is a schematic view of the laminate for the semi-additive method according to claim 1.
  • FIG. 2 is a schematic view of the laminate for the semi-additive method according to claim 2.
  • FIG. 3 is a schematic view of the laminate for the semi-additive method according to claim 3, which has a primer layer on the silver particle layer of FIG. 1.
  • FIG. 4 is a schematic view of the laminate for the semi-additive method according to claim 3, which has a primer layer on the silver particle layer of FIG. 2.
  • FIG. 5 is a process diagram for manufacturing a laminate for the semi-additive method shown in FIG.
  • FIG. 6 is a process diagram for manufacturing a laminate for the semi-additive method shown in FIG. 2.
  • FIG. 7 is a process diagram of manufacturing a printed wiring board using the laminate for the semi-additive method shown in FIG.
  • FIG. 8 is a process diagram of manufacturing a printed wiring board using the laminate for the semi-additive method shown in FIG. 2.
  • the silver particle layer (M1) and the silver plating layer (M2) are sequentially laminated on both surfaces of the insulating base material (A), and further, the penetration connecting both sides of the base material. It has holes and is characterized by having a silver plating layer on the surface of the through holes.
  • the silver particle layer (M1) and the silver plating layer (M2) are sequentially laminated on both surfaces of the insulating base material (A), and both sides of the base material are connected. It is characterized by having a through hole to be formed, and having a silver plating layer on the surface of the through hole and the silver particle layer (M1).
  • a more preferable embodiment of the method for manufacturing a printed wiring board of the present invention is to have a primer layer (B) between the insulating base material layer (A) and the conductive silver particle layer (M1). It is characterized by.
  • Examples of the material of the insulating base material (A) include polyimide resin, polyamideimide resin, polyamide resin, polyethylene terephthalate resin, polybutylene terephthalate resin, polyethylene naphthalate resin, polycarbonate resin, and acrylonitrile-butadiene-styrene (ABS).
  • Acrylic resin such as resin, polyarylate resin, polyacetal resin, methyl poly (meth) acrylate, polyfluorovinylidene resin, polytetrafluoroethylene resin, polyvinyl chloride resin, polyvinylidene chloride resin, and acrylic resin were graft-copolymerized.
  • Vinyl chloride resin polyvinyl alcohol resin, polyethylene resin, polypropylene resin, urethane resin, cycloolefin resin, polystyrene, liquid crystal polymer (LCP), polyether ether ketone (PEEK) resin, polyphenylene sulfide (PPS), polyphenylene sulfone (PPSU), Examples thereof include cellulose nanofibers, silicon, silicon carbide, gallium nitride, sapphire, ceramics, glass, diamond-like carbon (DLC), alumina and the like.
  • LCP liquid crystal polymer
  • PEEK polyether ether ketone
  • PPS polyphenylene sulfide
  • PPSU polyphenylene sulfone
  • Examples thereof include cellulose nanofibers, silicon, silicon carbide, gallium nitride, sapphire, ceramics, glass, diamond-like carbon (DLC), alumina and the like.
  • thermosetting resin examples include epoxy resin, phenol resin, unsaturated imide resin, cyanate resin, isocyanate resin, benzoxazine resin, oxetane resin, amino resin, unsaturated polyester resin, allyl resin, and dicyclopentadiene resin.
  • examples thereof include silicone resin, triazine resin, and melamine resin.
  • examples of the inorganic filler include silica, alumina, talc, mica, aluminum hydroxide, magnesium hydroxide, calcium carbonate, aluminum borate, and glass borate.
  • the insulating base material (A) any of a flat flexible material, a rigid material, and a rigid flexible material can be used. More specifically, a film, a sheet, or a commercially available material molded into a plate may be used for the insulating base material (A), or the above-mentioned resin solution, melt liquid, or dispersion liquid may be made flat. A molded material may be used. Further, the insulating base material (A) may be a base material having the above-mentioned resin material formed on a conductive material such as metal, and may be placed on a printed wiring board on which a circuit pattern is formed. , A base material obtained by laminating and forming the above-mentioned resin material may be used.
  • the silver particle layer (M1) is under plating when the conductive layer (M3), which is a circuit pattern described later, is formed by a plating step in the method for manufacturing a printed wiring board using the laminate for the semi-additive method of the present invention. It becomes a stratum.
  • the silver particles constituting the silver particle layer (M1) can contain metal particles other than silver as long as the plating step described later can be carried out without any problem. Since the etching removability of the non-circuit forming portion described later can be further improved, 5 parts by mass or less is preferable with respect to 100 parts by mass of silver, and 2 parts by mass or less is more preferable.
  • a silver particle dispersion liquid is applied to both sides of the insulating base material (A).
  • the coating method of the silver particle dispersion liquid is not particularly limited as long as the silver particle layer (M1) can be formed satisfactorily, and various coating methods can be used depending on the shape, size, and rigidity of the insulating base material (A). It may be selected appropriately depending on the degree and the like.
  • Specific coating methods include, for example, a gravure method, an offset method, a flexographic method, a pad printing method, a gravure offset method, a letterpress method, a letterpress inversion method, a screen method, a microcontact method, a reverse method, and an air doctor coater method.
  • the silver particle layer (M1) may be simultaneously formed on both surfaces of the insulating base material (A), or may be formed on one side of the insulating base material (A) and then on the other side. It may be formed.
  • the insulating base material (A) and the primer layer (B) formed on the insulating base material (A) have a circuit pattern formed by improving the coatability of the silver particle dispersion and the plating step described later.
  • surface treatment may be performed before applying the silver particle dispersion liquid.
  • the surface treatment method for the insulating base material (A) is not particularly limited as long as the surface roughness becomes large and the fine pitch pattern formability and the signal transmission loss due to the rough surface do not become a problem, and various methods are used. Should be selected as appropriate. Examples of such a surface treatment method include UV treatment, vapor phase ozone treatment, liquid layer ozone treatment, corona treatment, plasma treatment and the like. These surface treatment methods may be carried out by one kind of method or a combination of two or more kinds of methods.
  • the coating film is dried to volatilize the solvent contained in the silver particle dispersion liquid.
  • the silver particle layer (M1) is formed on the insulating base material (A) or on the primer layer (B).
  • the above-mentioned drying temperature and time may be appropriately selected depending on the heat-resistant temperature of the base material to be used and the type of the solvent used for the metal particle dispersion liquid described later, but the time may be in the range of 20 to 350 ° C. The range of 1 to 200 minutes is preferable. Further, in order to form the silver particle layer (M1) having excellent adhesion on the substrate, the drying temperature is more preferably in the range of 0 to 250 ° C.
  • the insulating base material (A) on which the silver particle layer (M1) is formed or the insulating base material (A) on which the primer layer (B) is formed is, if necessary, after the above-mentioned drying, the silver particles. Further annealing is performed for the purpose of reducing the electrical resistance of the layer and for the purpose of improving the adhesion between the insulating base material (A) or the primer layer (B) and the silver particle layer (M1). May be good.
  • the annealing temperature and time may be appropriately selected according to the heat resistant temperature of the substrate to be used, the required electrical resistance, productivity, etc., and may be performed in the range of 60 to 350 ° C. for 1 minute to 2 weeks. .. Further, in the temperature range of 60 to 180 ° C., the time is preferably 1 minute to 2 weeks, and in the range of 180 to 350 ° C., it is preferably about 1 minute to 5 hours.
  • the above drying may be performed by blowing air, or may not be blown in particular. Further, the drying may be carried out in the atmosphere, under a substitution atmosphere of an inert gas such as nitrogen or argon, under an air flow, or under a vacuum.
  • an inert gas such as nitrogen or argon
  • Drying of the coating film can be performed in a dryer such as a blower or a constant temperature dryer, in addition to natural drying at the coating site.
  • a dryer such as a blower or a constant temperature dryer
  • the roll material is dried by continuously moving the roll material in an installed non-heated or heated space following the coating process.
  • the heating method for drying / firing at this time include a method using an oven, a hot air drying furnace, an infrared drying furnace, laser irradiation, microwaves, light irradiation (flash irradiation device), and the like. These heating methods can be used alone or in combination of two or more.
  • the amount of the metal particle layer (M1) formed on the insulating base material (A) or the primer layer (B) is preferably in the range of 0.01 to 30 g / m 2 , preferably 0.01.
  • the range of ⁇ 10 g / m 2 is more preferable.
  • the range of 0.05 to 5 g / m 2 is more preferable because the formation of the conductive layer (M3) of the circuit pattern by the plating step described later becomes easy and the seed layer removal step by etching described later becomes easy.
  • the amount of the silver particle layer (M1) formed can be confirmed by using a known and commonly used analytical method such as a fluorescent X-ray method, an atomic absorption method, and an ICP method.
  • the silver particle layer (M1) can be formed for the purpose of suppressing reflection of the active light from the silver particle layer (M1), which will be described later.
  • Diimmonium compound, azo compound and other light-absorbing pigments, or dyes may be contained as a light absorber. These pigments and dyes may be appropriately selected according to the wavelength of the active light to be used. Further, these pigments and dyes can be used alone or in combination of two or more. Further, in order to contain these pigments and dyes in the silver particle layer (M1), these pigments and dyes may be blended in the silver particle dispersion liquid described later.
  • the silver particle dispersion liquid used to form the silver particle layer (M1) is one in which silver particles are dispersed in a solvent.
  • the shape of the silver particles is not particularly limited as long as it can form the silver particle layer (M1) satisfactorily, and has various shapes such as spherical, lenticular, polyhedral, flat plate, rod, and wire.
  • Silver particles can be used. These silver particles may be used as one type having a single shape, or may be used in combination with two or more types having different shapes.
  • the average particle diameter is in the range of 1 to 20,000 nm. Further, when a fine circuit pattern is formed, the homogeneity of the silver particle layer (M1) is further improved, and the removability by an etching solution described later can be further improved, so that the average particle diameter is in the range of 1 to 200 nm. Those in the range of 1 to 50 nm are more preferable, and those in the range of 1 to 50 nm are further preferable.
  • the "average particle size" of the nanometer-sized particles is a volume average value measured by a dynamic light scattering method obtained by diluting the metal particles with a good dispersion solvent. "Nanotrack UPA-150" manufactured by Microtrack Co., Ltd. can be used for this measurement.
  • the silver particles have a shape such as a lens shape, a rod shape, or a wire shape
  • those having a minor axis in the range of 1 to 200 nm are preferable, those having a minor axis in the range of 2 to 100 nm are more preferable, and those having a minor diameter in the range of 5 to 50 nm are more preferable. Those in the range of are more preferable.
  • the silver particles preferably contain silver particles as a main component, but the silver particles are described above as long as they do not interfere with the plating step described later or impair the removability of the silver particle layer (M1) described later by the etching solution.
  • a part of silver constituting the silver particles may be replaced with another metal, or a metal component other than silver may be mixed.
  • Examples of the metal to be substituted or mixed include one or more metal elements selected from the group consisting of gold, platinum, palladium, ruthenium, tin, copper, nickel, iron, cobalt, titanium, indium and iridium.
  • the ratio of the metal to be substituted or mixed with respect to the silver particles is preferably 5% by mass or less in the silver particles, and is 2% by mass from the viewpoint of the plating property of the silver particle layer (M1) and the removability by the etching solution. % Or less is more preferable.
  • the silver particle dispersion used to form the silver particle layer (M1) is one in which silver particles are dispersed in various solvents, and the particle size distribution of the silver particles in the dispersion is uniform in a single dispersion. It may be a mixture of particles within the above average particle size range.
  • an aqueous medium or an organic solvent can be used as the solvent used for the dispersion liquid of the silver particles.
  • the aqueous medium include distilled water, ion-exchanged water, pure water, ultrapure water, and a mixture of the water and an organic solvent to be mixed with the water.
  • Examples of the organic solvent to be mixed with water include alcohol solvents such as methanol, ethanol, n-propanol, isopropanol, ethyl carbitol, ethyl cellosolve and butyl cellosolve; ketone solvents such as acetone and methyl ethyl ketone; ethylene glycol, diethylene glycol and propylene.
  • Examples thereof include an alkylene glycol solvent such as glycol; a polyalkylene glycol solvent such as polyethylene glycol, polypropylene glycol and polytetramethylene glycol; and a lactam solvent such as N-methyl-2-pyrrolidone.
  • examples of the organic solvent when the organic solvent is used alone include alcohol compounds, ether compounds, ester compounds, and ketone compounds.
  • Examples of the alcohol solvent or ether solvent include methanol, ethanol, n-propanol, isopropyl alcohol, n-butanol, isobutyl alcohol, sec-butanol, tert-butanol, heptanol, hexanol, octanol, nonanol, decanol, undecanol, and dodecanol.
  • Tridecanol Tetradecanol, Pentadecanol, Stearyl Alcohol, Allyl Alcohol, Cyclohexanol, Terpineol, Tarpineol, Dihydroterpineol, 2-Ethyl-1,3-hexanediol, Ethylene Glycol, Diethylene Glycol, Triethylene Glycol, Polyethylene Glycol, Propylene glycol, dipropylene glycol, 1,2-butanediol, 1,3-butanediol, 1,4-butanediol, 2,3-butanediol, glycerin, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol Monobutyl Ether, Diethylene Glycol Monoethyl Ether, Diethylene Glycol Monomethyl Ether, Diethylene Glycol Monobutyl Ether, Tetraethylene Glycol Monobutyl Ether, Propylene Glycol Monomethyl
  • Examples of the ketone solvent include acetone, cyclohexanone, methyl ethyl ketone and the like.
  • Examples of the ester solvent include ethyl acetate, butyl acetate, 3-methoxybutyl acetate, 3-methoxy-3-methyl-butyl acetate and the like.
  • a hydrocarbon solvent such as toluene, particularly a hydrocarbon solvent having 8 or more carbon atoms can be mentioned.
  • hydrocarbon solvent having 8 or more carbon atoms examples include non-polar solvents such as octane, nonane, decane, dodecane, tridecane, tetradecane, cyclooctane, xylene, mesitylene, ethylbenzene, dodecylbenzene, tetraline, and trimethylbenzenecyclohexane. It can be used in combination with other solvents as needed. Further, a solvent such as mineral spirit or solvent naphtha which is a mixed solvent can be used in combination.
  • non-polar solvents such as octane, nonane, decane, dodecane, tridecane, tetradecane, cyclooctane, xylene, mesitylene, ethylbenzene, dodecylbenzene, tetraline, and trimethylbenzenecyclohexane. It can be used in combination with other solvent
  • the silver particles are stably dispersed, and the silver particle layer is placed on the insulating base material (A) or the primer layer (B) formed on the insulating base material (A) described later.
  • the solvent may be used alone or in combination of two or more.
  • the content of silver particles in the silver particle dispersion is such that the amount of the silver particle layer (M1) formed on the insulating substrate (A) is 0.01 to 30 g by using the various coating methods described above. It may be adjusted appropriately so as to be in the range of / m 2 , and adjusted so as to have a viscosity having optimum coating suitability according to the above-mentioned various coating methods, but in the range of 0.1 to 50% by mass. Is preferable, and the range of 0.5 to 20% by mass is more preferable.
  • the silver particles do not aggregate, fuse, or precipitate in the various solvent media, and the dispersion stability is maintained for a long period of time, and the silver particles are dispersed in the various solvents.
  • a dispersant for causing the reaction a dispersant having a functional group that coordinates with the metal particles is preferable, and for example, a carboxyl group, an amino group, a cyano group, an acetoacetyl group, a phosphorus atom-containing group, a thiol group, a thiosianato group, and a glycinato.
  • Dispersants having a functional group such as a group can be mentioned.
  • the dispersant a commercially available or independently synthesized low molecular weight or high molecular weight dispersant can be used, and the insulating base material to which a solvent for dispersing metal particles or a dispersion liquid of metal particles is applied is applied. It may be appropriately selected according to the purpose such as the type of (A).
  • the adhesion between these two layers becomes good, so that the reaction of the resin used for the primer layer (B) described later. It is preferable to use a compound having a reactive functional group [Y] capable of forming a bond with the sex functional group [X].
  • Examples of the compound having a reactive functional group [Y] include an amino group, an amide group, an alkyrole amide group, a carboxyl group, an anhydrous carboxyl group, a carbonyl group, an acetoacetyl group, an epoxy group, an alicyclic epoxy group and an oxetan ring. , Vinyl group, allyl group, (meth) acryloyl group, (blocked) isocyanate group, (alkoxy) silyl group and the like, silsesquioxane compound and the like.
  • the reactive functional group [Y] is preferably a basic nitrogen atom-containing group because the adhesion between the primer layer (B) and the metal particle layer (M1) can be further improved.
  • Examples of the basic nitrogen atom-containing group include an imino group, a primary amino group, a secondary amino group and the like.
  • the basic nitrogen atom-containing group may be singular or plural in one molecule of the dispersant. By containing a plurality of basic nitrogen atoms in the dispersant, some of the basic nitrogen atom-containing groups contribute to the dispersion stability of the metal particles by interacting with the metal particles, and the remaining basic nitrogen. The atom-containing group contributes to improving the adhesion to the insulating base material (A). Further, when a resin having a reactive functional group [X] is used for the primer layer (B) described later, the basic nitrogen atom-containing group in the dispersant is between the reactive functional group [X]. It is preferable because a bond can be formed with the above, and the adhesion of the conductive layer (M3) of the circuit pattern described later on the insulating base material (A) can be further improved.
  • the dispersant can form a silver particle layer (M1) that exhibits stability, coatability, and good adhesion on the insulating base material (A), the dispersant is a dispersant.
  • the polymer dispersant is preferable, and as the polymer dispersant, polyalkyleneimine such as polyethyleneimine and polypropyleneimine, and a compound in which polyoxyalkylene is added to the polyalkyleneimine are preferable.
  • the compound to which polyoxyalkylene is added to the polyalkyleneimine may be a compound in which polyethyleneimine and polyoxyalkylene are bonded in a linear manner, and the side of the main chain composed of the polyethyleneimine.
  • the chain may be grafted with polyoxyalkylene.
  • the compound in which polyoxyalkylene is added to the polyalkyleneimine include a block copolymer of polyethyleneimine and polyoxyethylene, and ethylene oxide in a part of the imino group present in the main chain of polyethyleneimine.
  • examples thereof include those in which a polyoxyethylene structure is introduced by an addition reaction, and those in which an amino group possessed by polyalkyleneimine, a hydroxyl group possessed by polyoxyethylene glycol, and an epoxy group possessed by an epoxy resin are reacted.
  • Examples of the commercially available product of the polyalkyleneimine include “PAO2006W”, “PAO306”, “PAO318” and “PAO718” of "Epomin (registered trademark) PAO series” manufactured by Nippon Shokubai Co., Ltd.
  • the number average molecular weight of the polyalkyleneimine is preferably in the range of 3,000 to 30,000.
  • the amount of the dispersant required to disperse the silver particles is preferably in the range of 0.01 to 50 parts by mass with respect to 100 parts by mass of the silver particles, and is on the insulating substrate (A).
  • a silver particle layer (M1) showing good adhesion can be formed on the primer layer (B) described later, the range of 0.1 to 10 parts by mass is preferable with respect to 100 parts by mass of the silver particles. Further, since the plating property of the silver particle layer (M1) can be improved, the range of 0.1 to 5 parts by mass is more preferable.
  • the method for producing the dispersion liquid of silver particles is not particularly limited and can be produced by using various methods.
  • silver particles produced by a gas phase method such as an evaporation method in a low vacuum gas can be used as a solvent. It may be dispersed therein, or the silver compound may be reduced in the liquid phase to directly prepare a dispersion of silver particles.
  • the solvent composition of the dispersion liquid at the time of production and the dispersion liquid at the time of coating can be changed as appropriate by exchanging the solvent or adding a solvent.
  • the liquid phase method can be particularly preferably used because of the stability of the dispersion liquid and the simplicity of the manufacturing process.
  • a liquid phase method for example, it can be produced by reducing silver ions in the presence of the polymer dispersant.
  • the dispersion liquid of silver particles may further contain an organic compound such as a surfactant, a leveling agent, a viscosity modifier, a film forming aid, an antifoaming agent, and an antiseptic.
  • an organic compound such as a surfactant, a leveling agent, a viscosity modifier, a film forming aid, an antifoaming agent, and an antiseptic.
  • surfactant examples include nonions such as polyoxyethylene nonylphenyl ether, polyoxyethylene lauryl ether, polyoxyethylene styrylphenyl ether, polyoxyethylene sorbitol tetraoleate, and polyoxyethylene / polyoxypropylene copolymer.
  • fatty acid salts such as sodium oleate, alkyl sulfate ester salts, alkylbenzene sulfonates, alkyl sulfosuccinates, naphthalene sulfonates, polyoxyethylene alkyl sulfates, alkane sulfonate sodium salts, sodium alkyldiphenyl ether sulfonates
  • Anionic surfactants such as salts
  • cationic surfactants such as alkylamine salts, alkyltrimethylammonium salts, and alkyldimethylbenzylammonium salts can be mentioned.
  • leveling agent a general leveling agent can be used, and examples thereof include silicone-based compounds, acetylenediol-based compounds, and fluorine-based compounds.
  • a general thickener can be used as the viscosity modifier.
  • an acrylic polymer that can be thickened by adjusting it to alkaline, a synthetic rubber latex, and a thickening agent by associating molecules can be used.
  • examples thereof include urethane resin, hydroxyethyl cellulose, carboxymethyl cellulose, methyl cellulose, polyvinyl alcohol, water-added castor oil, amido wax, polyethylene oxide, metal soap, and dibenzylidene sorbitol.
  • a general film-forming auxiliary can be used.
  • an anionic surfactant such as dioctyl sulfosuccinate sodium salt, a hydrophobic nonionic surfactant such as sorbitan monooleate, etc. can be used.
  • a general defoaming agent can be used, and examples thereof include silicone-based defoaming agents, nonionic-based surfactants, polyethers, higher alcohols, and polymer-based surfactants.
  • a general preservative can be used, for example, an isothiazoline-based preservative, a triazine-based preservative, an imidazole-based preservative, a pyridine-based preservative, an azole-based preservative, a pyrithione-based preservative, and the like. Can be mentioned.
  • the laminate for the semi-additive method provided with this primer layer is preferable because the adhesion of the conductive layer (M3) to the insulating base material (A) can be further improved.
  • the primer layer (B) is coated with a primer on a part or the entire surface of the insulating base material (A) to remove solvents such as an aqueous medium and an organic solvent contained in the primer. Can be formed.
  • the primer is used for the purpose of improving the adhesion of the conductive layer (M3) to the insulating base material (A), and is a liquid in which various resins described later are dissolved or dispersed in a solvent. It is a composition.
  • the method of applying the primer to the insulating base material (A) is not particularly limited as long as the primer layer (B) can be formed well, and various coating methods can be used for the insulating base material (A). It may be appropriately selected according to the shape, size, degree of flexibility and the like. Specific coating methods include, for example, a gravure method, an offset method, a flexographic method, a pad printing method, a gravure offset method, a letterpress method, a letterpress inversion method, a screen method, a microcontact method, a reverse method, and an air doctor coater method.
  • Blade coater method air knife coater method, squeeze coater method, impregnation coater method, transfer roll coater method, kiss coater method, cast coater method, spray coater method, inkjet method, die coater method, spin coater method, bar coater method, dip coater method. And so on.
  • the method of applying the primer to both surfaces of the film, the sheet, and the plate-shaped insulating base material (A) is not particularly limited as long as the primer layer (B) can be formed well, and the coating illustrated above is exemplified.
  • the construction method may be selected as appropriate.
  • the primer layer (B) may be simultaneously formed on both surfaces of the insulating base material (A), and may be formed on one side of the insulating base material (A) and then on the other side. You may.
  • the insulating base material (A) may be surface-treated before the primer is applied for the purpose of improving the coatability of the primer and improving the adhesion of the conductive layer (M3) to the base material. ..
  • the surface treatment method for the insulating base material (A) the same method as the surface treatment method for forming the silver particle layer (M1) on the insulating base material (A) described above can be used. ..
  • drying using a dryer As a method of applying the primer to the surface of the insulating base material (A) and then removing the solvent contained in the coating layer to form the primer layer (B), for example, drying using a dryer is used.
  • the method of volatilizing the solvent is common.
  • the drying temperature may be set to a temperature within a range in which the solvent can be volatilized and does not adversely affect the insulating base material (A), and may be room temperature drying or heat drying.
  • the specific drying temperature is preferably in the range of 20 to 350 ° C, more preferably in the range of 60 to 300 ° C.
  • the drying time is preferably in the range of 1 to 200 minutes, more preferably in the range of 1 to 60 minutes.
  • the above drying may be performed by blowing air, or may not be blown in particular. Further, the drying may be carried out in the atmosphere, in a substitution atmosphere such as nitrogen or argon, in an air flow, or in a vacuum.
  • a substitution atmosphere such as nitrogen or argon
  • the insulating base material (A) When the insulating base material (A) is a single-leaf film, sheet, or board, it can be naturally dried at the coating site, blown air, or in a dryer such as a constant temperature dryer. When the insulating base material (A) is a roll film or a roll sheet, the roll material is dried by continuously moving the roll material in the installed non-heated or heated space following the coating process. It can be performed.
  • the film thickness of the primer layer (B) may be appropriately selected depending on the specifications and applications of the printed wiring board manufactured using the present invention, but the insulating base material (A) and the metal pattern layer (M2) are used.
  • the range of 10 nm to 30 ⁇ m is preferable, the range of 10 nm to 1 ⁇ m is more preferable, and the range of 10 nm to 500 nm is further preferable, because the adhesion of the material can be further improved.
  • the resin forming the primer layer (B) is a reactive functional group having a reactivity with the reactive functional group [Y].
  • a resin having [X] is preferable.
  • the reactive functional group [X] include an amino group, an amide group, an alkyrole amide group, a keto group, a carboxyl group, an anhydrous carboxyl group, a carbonyl group, an acetoacetyl group, an epoxy group, an alicyclic epoxy group and an oxetane.
  • Examples thereof include a ring, a vinyl group, an allyl group, a (meth) acryloyl group, a (blocked) isocyanate group, and a (alkoxy) silyl group.
  • a silsesquioxane compound can also be used as the compound forming the primer layer (B).
  • the adhesion of the conductive layer (M3) on the insulating substrate (A) can be further improved.
  • the resin forming the primer layer (B) has a keto group, a carboxyl group, a carbonyl group, an acetoacetyl group, an epoxy group, an alicyclic epoxy group, an alkylolamide group, an isocyanate group and vinyl as the reactive functional group [X]. Those having a group, a (meth) acryloyl group, and an allyl group are preferable.
  • Examples of the resin forming the primer layer (B) include a urethane resin, an acrylic resin, a core-shell type composite resin having a urethane resin as a shell and an acrylic resin as a core, an epoxy resin, an imide resin, an amide resin, and a melamine resin. , Phenolic resin, urea formaldehyde resin, blocked isocyanate obtained by reacting polyisocyanate with a blocking agent such as phenol, polyvinyl alcohol, polyvinylpyrrolidone and the like.
  • the core-shell type composite resin having a urethane resin as a shell and an acrylic resin as a core can be obtained, for example, by polymerizing an acrylic monomer in the presence of a urethane resin. Further, these resins can be used alone or in combination of two or more.
  • a resin that produces a reducing compound by heating is preferable because the adhesion of the conductive layer (M3) to the insulating substrate (A) can be further improved.
  • the reducing compound include phenol compounds, aromatic amine compounds, sulfur compounds, phosphoric acid compounds, aldehyde compounds and the like. Among these reducing compounds, phenol compounds and aldehyde compounds are preferable.
  • a reducing compound such as formaldehyde or phenol is produced in the heating and drying step when forming the primer layer (B).
  • the resin that produces a reducing compound by heating include a resin obtained by polymerizing a monomer containing N-alkyrole (meth) acrylamide, and N-alkyrole (meth) acrylamide using a urethane resin as a shell.
  • Core-shell type composite resin with a polymer polymer resin as the core urea-formaldehyde-methanol condensate, urea-melamine-formaldehyde-methanol condensate, poly N-alkoxymethylol (meth) acrylamide, poly (meth)
  • examples thereof include a formaldehyde adduct of acrylamide, a resin that produces formaldehyde by heating a melamine resin, and the like; a resin that produces a phenol compound by heating a phenol resin, a phenol block isocyanate, and the like.
  • a core-shell type composite resin having a urethane resin as a shell and a resin obtained by polymerizing a monomer containing N-alkyrole (meth) acrylamide as a core, a melamine resin, and a phenol Blocked isocyanate is preferred.
  • (meth) acrylamide refers to one or both of “methacrylamide” and “acrylamide”
  • (meth) acrylic acid refers to "methacrylic acid” and "acrylic acid”. Refers to one or both.
  • the resin that produces a reducing compound by heating is obtained by polymerizing a monomer having a functional group that produces a reducing compound by heating by a polymerization method such as radical polymerization, anionic polymerization, or cationic polymerization.
  • Examples of the monomer having a functional group that produces a reducing compound by heating include N-alkyrole vinyl monomer, and specific examples thereof include N-methylol (meth) acrylamide and N-methoxymethyl (N-methoxymethyl). Meta) acrylamide, N-ethoxymethyl (meth) acrylamide, N-propoxymethyl (meth) acrylamide, N-isopropoxymethyl (meth) acrylamide, Nn-butoxymethyl (meth) acrylamide, N-isobutoxymethyl (meth) ) Acrylamide, N-pentoxymethyl (meth) acrylamide, N-ethanol (meth) acrylamide, N-propanol (meth) acrylamide and the like.
  • a monomer having a functional group that produces a reducing compound by heating when producing a resin that produces a reducing compound by heating, a monomer having a functional group that produces a reducing compound by heating, and various other types such as (meth) acrylic acid alkyl ester are used.
  • the monomers can also be copolymerized.
  • a uretdione bond is formed by self-reacting between the isocyanate groups, or the isocyanate group and the functional group of other components are used.
  • the bond formed at this time may be formed before the metal particle dispersion liquid is applied, or is not formed before the metal particle dispersion liquid is applied, and the metal particle dispersion liquid is not formed. May be formed by heating after coating.
  • Examples of the blocked isocyanate include those having a functional group formed by blocking the isocyanate group with a blocking agent.
  • the blocked isocyanate is preferably one having the functional group in the range of 350 to 600 g / mol per 1 mol of the blocked isocyanate.
  • the functional group preferably has 1 to 10 in one molecule of the blocked isocyanate, and more preferably 2 to 5.
  • the number average molecular weight of the blocked isocyanate is preferably in the range of 1,500 to 5,000, more preferably in the range of 1,500 to 3,000, from the viewpoint of improving adhesion.
  • the blocked isocyanate one having an aromatic ring is preferable from the viewpoint of further improving the adhesion.
  • the aromatic ring include a phenyl group and a naphthyl group.
  • the blocked isocyanate can be produced by reacting a part or all of the isocyanate groups of the isocyanate compound with the blocking agent.
  • Examples of the isocyanate compound as a raw material of the blocked isocyanate include 4,4'-diphenylmethane diisocyanate, 2,4'-diphenylmethane diisocyanate, carbodiimide-modified diphenylmethane diisocyanate, crude diphenylmethane diisocyanate, phenylenediocyanate, tolylene diisocyanate, naphthalenedi isocyanate and the like.
  • Polyisocyanate compound having an aromatic ring an aliphatic polyisocyanate compound such as hexamethylene diisocyanate, lysine diisocyanate, cyclohexanediisocyanate, isophorone diisocyanate, dicyclohexylmethane diisocyanate, xylylene diisocyanate, tetramethylxylylene diisocyanate, or polyisocyanate having an alicyclic structure.
  • Examples include compounds.
  • those burette form, isocyanurate form, adduct form and the like of the said polyisocyanate compound are also mentioned.
  • examples of the isocyanate compound include those obtained by reacting the polyisocyanate compound exemplified above with a compound having a hydroxyl group or an amino group.
  • polyisocyanate compound having an aromatic ring When introducing an aromatic ring into the blocked isocyanate, it is preferable to use a polyisocyanate compound having an aromatic ring.
  • polyisocyanate compounds having an aromatic ring 4,4'-diphenylmethane diisocyanate, tolylene diisocyanate, isocyanurate of 4,4'-diphenylmethane diisocyanate, and isocyanurate of tolylene diisocyanate are preferable.
  • Examples of the blocking agent used for producing the blocked isocyanate include phenol compounds such as phenol and cresol; lactam compounds such as ⁇ -caprolactam, ⁇ -valerolactam and ⁇ -butyrolactam; Oxime compounds such as methyl ethyl keto oxime, methyl isobutyl keto oxime, cyclohexanone oxime; 2-hydroxypyridine, butyl cellosolve, propylene glycol monomethyl ether, benzyl alcohol, methanol, ethanol, n-butanol, isobutanol, dimethyl malonate, diethyl malonate, acet Methyl acetate, ethyl acetoacetate, acetylacetone, butyl mercaptan, dodecyl mercaptan, acetoanilide, acetate amide, succinate imide, maleate imide, imidazole, 2-methyl imidazole, urea, thiour
  • a blocking agent capable of dissociating to generate an isocyanate group by heating in the range of 70 to 200 ° C. is preferable, and a block capable of producing an isocyanate group dissociating by heating in the range of 110 to 180 ° C. is preferable.
  • Agents are more preferred. Specifically, a phenol compound, a lactam compound, and an oxime compound are preferable, and a phenol compound is more preferable because it becomes a reducing compound when the blocking agent is desorbed by heating.
  • Examples of the method for producing the blocked isocyanate include a method of mixing and reacting the isocyanate compound produced in advance with the blocking agent, a method of mixing and reacting the blocking agent with a raw material used for producing the isocyanate compound, and the like. Can be mentioned.
  • the blocked isocyanate produces an isocyanate compound having an isocyanate group at the terminal by reacting the polyisocyanate compound with a compound having a hydroxyl group or an amino group, and then the isocyanate compound and the block. It can be produced by mixing and reacting with an agent.
  • the content ratio of the blocked isocyanate obtained by the above method in the resin forming the primer layer (B) is preferably in the range of 50 to 100% by mass, more preferably in the range of 70 to 100% by mass.
  • the melamine resin examples include mono or polymethylol melamine in which 1 to 6 mol of formaldehyde is added to 1 mol of melamine; (poly) methylol melamine such as trimethoxymethylol melamine, tributoxymethylol melamine, and hexamethoxymethylol melamine. Ethereate (arbitrary degree of etherification); urea-melamine-formaldehyde-methanol condensate and the like.
  • a method of adding a reducing compound to the resin can also be mentioned.
  • the reducing compound to be added include phenol-based antioxidants, aromatic amine-based antioxidants, sulfur-based antioxidants, phosphoric acid-based antioxidants, vitamin C, vitamin E, and ethylenediamine tetraacetic acid. Examples thereof include sodium, sulfite, hypophosphoric acid, hypophosphite, hydrazine, formaldehyde, sodium hydride, dimethylamine borane, phenol and the like.
  • the method of adding a reducing compound to a resin may result in deterioration of electrical properties due to the residual low molecular weight component or ionic compound. Therefore, a resin that produces a reducing compound by heating. Is more preferable.
  • a resin containing a compound having an aminotriazine ring can be mentioned.
  • the compound having an aminotriazine ring may be a compound having a low molecular weight or a resin having a higher molecular weight.
  • various additives having an aminotriazine ring can be used.
  • Commercially available products include 2,4-diamino-6-vinyl-s-triazine (“VT” manufactured by Shikoku Kasei Co., Ltd.), “VD-3” and “VD-4” manufactured by Shikoku Kasei Co., Ltd. (with aminotriazine ring).
  • VT 2,4-diamino-6-vinyl-s-triazine
  • VD-3 and “VD-4” manufactured by Shikoku Kasei Co., Ltd. (with aminotriazine ring).
  • VD-5" manufactured by Shikoku Kasei Co., Ltd.
  • compound having an aminotriazine ring and an ethoxysilyl group and the like can be mentioned.
  • These can be used by adding one kind or two or more kinds to the resin forming the primer layer (B) as an additive.
  • the amount of the low molecular weight compound having an aminotriazine ring is preferably 0.1 parts by mass or more and 50 parts by mass or less, and more preferably 0.5 parts by mass or more and 10 parts by mass or less with respect to 100 parts by mass of the resin. ..
  • a resin in which an aminotriazine ring is introduced by a covalent bond in the polymer chain of the resin can also be preferably used.
  • Specific examples thereof include aminotriazine-modified novolak resins.
  • the aminotriazine-modified novolak resin is a novolak resin in which an aminotriazine ring structure and a phenol structure are bonded via a methylene group.
  • the aminotriazine-modified novolak resin contains, for example, an aminotriazine compound such as melamine, benzoguanamine, and acetoguanamine, a phenol compound such as phenol, cresol, butylphenol, bisphenol A, phenylphenol, naphthol, and resorcin, and formaldehyde as an alkylamine.
  • the aminotriazine-modified novolak resin preferably has substantially no methylol group. Further, the aminotriazine-modified novolak resin may contain a molecule in which only the aminotriazine structure generated as a by-product during its production is methylene-bonded, a molecule in which only the phenol structure is methylene-bonded, and the like. Further, a small amount of unreacted raw material may be contained.
  • phenol structure examples include phenol residues, cresol residues, butylphenol residues, bisphenol A residues, phenylphenol residues, naphthol residues, resorcin residues and the like.
  • residue here means a structure in which at least one hydrogen atom bonded to the carbon of the aromatic ring is removed.
  • phenol it means a hydroxyphenyl group.
  • triazine structure examples include structures derived from aminotriazine compounds such as melamine, benzoguanamine, and acetoguanamine.
  • the phenol structure and the triazine structure can be used alone or in combination of two or more. Further, since the adhesion can be further improved, a phenol residue is preferable as the phenol structure, and a melamine-derived structure is preferable as the triazine structure.
  • the hydroxyl value of the aminotriazine-modified novolak resin is preferably 50 mgKOH / g or more and 200 mgKOH / g or less, more preferably 80 mgKOH / g or more and 180 mgKOH / g or less, and 100 mgKOH / g or more and 150 mgKOH / g because the adhesion can be further improved. It is more preferably g or less.
  • the aminotriazine-modified novolak resin can be used alone or in combination of two or more.
  • an aminotriazine-modified novolak resin is used as the compound having an aminotriazine ring, it is preferable to use an epoxy resin in combination.
  • the epoxy resin examples include bisphenol A type epoxy resin, bisphenol F type epoxy resin, biphenyl type epoxy resin, cresol novolac type epoxy resin, phenol novolac type epoxy resin, bisphenol A novolak type epoxy resin, alcohol ether type epoxy resin, and tetrabrom. It has a structure derived from a bisphenol A type epoxy resin, a naphthalene type epoxy resin, a phosphorus-containing epoxy compound having a structure derived from a 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide derivative, and a structure derived from a dicyclopentadiene derivative. Examples thereof include epoxies of fats and oils such as epoxy resin and epoxidized soybean oil. These epoxy resins can be used alone or in combination of two or more.
  • epoxy resins bisphenol A type epoxy resin, bisphenol F type epoxy resin, biphenyl type epoxy resin, cresol novolac type epoxy resin, phenol novolac type epoxy resin, and bisphenol A novolak type epoxy resin are selected because the adhesion can be further improved. It is preferable, and in particular, a bisphenol A type epoxy resin is preferable.
  • the epoxy equivalent of the epoxy resin is preferably 100 g / equivalent or more and 300 g / equivalent or less, more preferably 120 g / equivalent or more and 250 g / equivalent or less, and 150 g / equivalent or more and 200 g / equivalent or less because the adhesiveness can be further improved. More preferred.
  • the primer layer (B) is a layer containing an aminotriazine-modified novolak resin and an epoxy resin
  • the adhesion can be further improved. Therefore, the phenolic hydroxyl group (x) in the aminotriazine-modified novolak resin and the epoxy resin are contained.
  • the molar ratio [(x) / (y)] with the epoxy group (y) is preferably 0.1 or more and 5 or less, more preferably 0.2 or more and 3 or less, and further preferably 0.3 or more and 2 or less.
  • a primer resin composition containing the compound having an aminotriazine ring or an epoxy resin is used.
  • the primer resin composition used for forming the primer layer (B) containing the aminotriazine-modified novolak resin and the epoxy resin may contain, for example, a urethane resin, an acrylic resin, a blocked isocyanate resin, or a melamine resin, if necessary.
  • Other resins such as phenol resin may be blended. These other resins may be used alone or in combination of two or more.
  • the primer used to form the primer layer (B) preferably contains 1 to 70% by mass of the resin in the primer from the viewpoint of coatability and film forming property, and contains 1 to 20% by mass. The one is more preferable.
  • examples of the solvent that can be used for the primer include various organic solvents and aqueous media.
  • examples of the organic solvent include toluene, ethyl acetate, methyl ethyl ketone, cyclohexanone and the like
  • examples of the aqueous medium include water, an organic solvent miscible with water, and a mixture thereof.
  • organic solvent to be mixed with water examples include alcohol solvents such as methanol, ethanol, n-propanol, isopropanol, ethyl carbitol, ethyl cellosolve and butyl cellosolve; ketone solvents such as acetone and methyl ethyl ketone; ethylene glycol, diethylene glycol and propylene.
  • alcohol solvents such as methanol, ethanol, n-propanol, isopropanol, ethyl carbitol, ethyl cellosolve and butyl cellosolve
  • ketone solvents such as acetone and methyl ethyl ketone
  • ethylene glycol diethylene glycol and propylene.
  • alkylene glycol solvent such as glycol
  • a polyalkylene glycol solvent such as polyethylene glycol, polypropylene glycol and polytetramethylene glycol
  • lactam solvent such as N-methyl-2-pyrrol
  • the resin forming the primer layer (B) may have a functional group that contributes to the crosslinking reaction, such as an alkoxysilyl group, a silanol group, a hydroxyl group, or an amino group, if necessary.
  • the crosslinked structure formed by utilizing these functional groups may have already formed the crosslinked structure before the step of forming the silver particle layer (M1) in the subsequent step, or the silver particle layer (M1).
  • the crosslinked structure may be formed after the step of forming the above.
  • the crosslinked structure may be formed on the primer layer (B) before forming the conductive layer (M3) of the circuit pattern.
  • a crosslinked structure may be formed in the primer layer (B) by, for example, aging after forming the conductive layer (M3) of the circuit pattern.
  • a known substance such as a cross-linking agent, a pH adjuster, a film forming aid, a leveling agent, a thickener, a water repellent agent, and an antifoaming agent is appropriately added to the primer layer (B). May be used.
  • the cross-linking agent examples include a metal chelate compound, a polyamine compound, an aziridine compound, a metal salt compound, an isocyanate compound and the like, and a thermal cross-linking agent that reacts at a relatively low temperature of about 25 to 100 ° C. to form a cross-linking structure.
  • thermal cross-linking agents such as melamine-based compounds, epoxy-based compounds, oxazoline compounds, carbodiimide compounds, and blocked isocyanate compounds that react at a relatively high temperature of 100 ° C. or higher to form a cross-linking structure, and various photocross-linking agents.
  • the aminotriazine-modified novolak resin and the epoxy resin are used as the primer layer (B), it is preferable to use a polyvalent carboxylic acid as the cross-linking agent in the primer resin composition.
  • the polyvalent carboxylic acid include trimellitic anhydride, pyromellitic anhydride, maleic anhydride, succinic acid and the like. These cross-linking agents may be used alone or in combination of two or more. Further, among these cross-linking agents, trimellitic anhydride is preferable because the adhesion can be further improved.
  • the amount of the cross-linking agent used varies depending on the type, from the viewpoint of improving the adhesion of the conductive layer (M3) on the substrate, 0.01 to 0.01 to 100 parts by mass of the resin contained in the primer.
  • the range of 60 parts by mass is preferable, the range of 0.1 to 10 parts by mass is more preferable, and the range of 0.1 to 5 parts by mass is further preferable.
  • the cross-linked structure may already be formed before the step of forming the silver particle layer (M1) in the subsequent step, and the cross-linking may be performed after the step of forming the silver particle layer (M1).
  • the structure may be formed.
  • the crosslinked structure may be formed after the step of forming the silver particle layer (M1), the crosslinked structure may be formed on the primer layer (B) before the conductive layer (M3) is formed. After forming (M3), a crosslinked structure may be formed in the primer layer (B) by, for example, aging.
  • the method of forming the silver particle layer (M1) on the primer layer (B) is the same as the method of forming the silver particle layer (M1) on the insulating base material (A). be.
  • the primer layer (B) like the insulating base material (A), improves the coatability of the silver particle dispersion liquid and adheres the conductive layer (M3) of the circuit pattern described later to the base material.
  • a surface treatment may be performed before applying the silver particle dispersion liquid.
  • the laminate for the semi-additive method of the present invention has through holes connecting both sides of the base material of the insulating base material (A), and has a silver plating layer on the surface of the through holes, as will be described later.
  • a through hole is formed in the insulating base material (A), and electroless silver plating is formed on the surface of the through hole.
  • the silver particles A plating catalyst is also applied to the surface of the layer (M1) to reduce the adhesion of the conductive layer (M3) of the circuit pattern formed on the silver particle layer (M1), or to reduce the adhesion of the non-circuit pattern portion in the subsequent process. There is a concern that the removability of the silver particle layer (M1) will be reduced.
  • the laminate for the semi-additive method of the present invention it is preferable to provide a cover layer on the silver particle layer (M1) to prevent the plating catalyst from adhering to the silver particle layer (M1) before forming the through holes.
  • the cover layer used for the purpose of preventing the plating catalyst from adhering on the silver particle layer (M1) is formed before the formation of through holes, and is removed after the plating catalyst is applied and before the electroless silver plating step. Is preferable.
  • a copper layer (M2) can be formed on the conductive silver particle layer (M1) and used.
  • the layer thickness of the copper layer (M2) laminated on the conductive silver particle layer is preferably 0.1 ⁇ m to 2 ⁇ m, and more preferably 0.5 ⁇ m to 1.5 ⁇ m.
  • Examples of the treatment by the above copper plating method include electroless copper plating using the silver particle layer (M1) as a plating catalyst, electrolytic copper plating, and a combination of electrolytic copper plating and electrolytic copper plating.
  • electrolytic plating When electrolytic plating is used, the plating precipitation rate can be increased, which is advantageous because the production efficiency is high.
  • the copper plating method for forming the copper layer (M2) on the silver particle layer (M1) is not particularly limited, and may be a non-electrolytic copper plating method, an electrolytic copper plating method, a non-electrolytic copper plating and an electrolytic copper plating. In any of the combinations, a known and commonly used copper plating method can be preferably used.
  • the surface of the silver particle layer (M1) may be surface-treated, if necessary.
  • the surface treatment includes cleaning treatment with an acidic or alkaline cleaning liquid, corona treatment, plasma treatment, UV treatment, vapor phase ozone treatment, and liquid under the condition that the surface of the silver particle layer (M1) and the formed resist pattern are not damaged. Examples include phase ozone treatment and treatment with a surface treatment agent. These surface treatments can be performed by one method or by using two or more methods in combination.
  • the cover layer used for the purpose of preventing the plating catalyst from adhering to the silver particle layer (M1) used in the laminate for the semi-additive method of the present invention is also preferably a peelable cover layer (RC).
  • RC peelable cover layer
  • various commercially available resin films can be used, but polyethylene, polypropylene, and polyethylene terephthalate films can be preferably used.
  • peelable cover layer one having a silicone layer for improving the peelability on a film such as polyethylene, polypropylene, or polyethylene terephthalate may be used.
  • the film thickness of the peelable cover layer (RC) used for producing the laminate for the semi-additive method of the present invention is the handleability of the film, the protection of the silver particle layer (M1), and the substrate. From the viewpoint of ease of forming a through hole, the thickness is preferably 10 to 100 ⁇ m, more preferably 15 to 70 ⁇ m.
  • the peelable cover layer (RC) can be laminated on the silver particle layer (M1) after the silver particle layer (M1) is coated.
  • the silver particle layer (M1) when coated with a roll coater, it can be laminated by winding the peelable cover layer (RC) together at the time of winding.
  • an alkali-soluble resin may also be used.
  • the alkali-soluble resin is not particularly limited as long as it can be developed with an alkaline developer, and known and commonly used ones can be used.
  • an amidimide resin or an alkali such as a carboxyl group or a phenolic hydroxyl group can be used.
  • examples thereof include resins having a soluble functional group.
  • a resin solution may be coated on the silver particle layer (M1) to form a film, or a pre-filmed resin may be used.
  • the silver particle layer (M1) can be coated with a roll coater in the same manner as described above, and the peelable cover layer (RC) can be wound together at the time of winding for laminating. can.
  • the silver particle layer (M1) and the copper layer (M2) are sequentially laminated on both surfaces of the insulating base material (A). Further, a step of forming through holes penetrating both sides in a laminate provided with a copper layer (M2) of 0.1 ⁇ m to 2 ⁇ m 1. Electrolytic plating is performed on the surface of the base material having the through holes and the through holes. Step 2, the copper layer (M2) is etched to expose the conductive silver particle layer (M1), and the through-hole surface and the silver particle layer are exposed by electrolytic plating. It goes through a step 4 of forming a copper or nickel layer on (M1), and a step 5 of replacing the copper or nickel formed on the through-hole surface and the silver particle layer (M1) with silver. ..
  • a silver particle layer (M1) and a copper layer (M2) are sequentially formed on both surfaces of the insulating base material (A).
  • Step 1 of forming through holes penetrating both sides in a laminated body that is laminated and further provided with a peelable cover layer (RC), for electrolysis-free plating on the substrate having the through holes and the surface of the through holes.
  • Step 2 the peelable cover layer (RC) is peeled off to expose the conductive silver particle layer (M1), step 3, through-hole surface and the silver particles are exposed by electrolytic plating. It goes through a step 4 of forming a copper or nickel layer on the layer (M1), and a step 5 of replacing the copper or nickel formed on the through-hole surface and the silver particle layer (M1) with silver. be.
  • step 1 of manufacturing the laminate for the semi-additive method of the present invention the silver particle layer (M1) and the cover layer are sequentially laminated or insulating on both surfaces of the insulating base material (A).
  • This is a step of forming through holes penetrating both sides in a laminated body in which a primer layer (B) is further laminated between a base material (A) and a silver particle layer (M1).
  • step 1 as a method for forming the through hole in the laminated body, a known and commonly used method may be appropriately selected. For example, drilling, laser processing, drilling of a copper layer by laser processing, and an oxidizing agent. , Processing method combining chemical etching of insulating base material using alkaline chemicals, acidic chemicals, etc., hole pattern etching of copper foil using resist, and insulating group using oxidizing agents, alkaline chemicals, acidic chemicals, etc. Examples include a processing method that combines chemical etching of the material.
  • the hole diameter (diameter) formed by the drilling process is preferably in the range of 0.01 to 1 mm, more preferably in the range of 0.02 to 0.5 mm, and even more preferably in the range of 0.03 to 0.1 mm. ..
  • Desmia methods include, for example, dry treatment such as plasma treatment and reverse sputtering treatment, cleaning treatment with an aqueous solution of an oxidizing agent such as potassium permanganate, cleaning treatment with an aqueous solution of alkali or acid, and wet treatment such as cleaning treatment with an organic solvent. And so on.
  • the step 2 of the method for manufacturing the laminate for the semi-additive method of the present invention is a step of applying a catalyst for electroless plating on the surface of the laminate having through holes formed in the step 1.
  • step 4 of the method for manufacturing a laminate for the semi-additive method of the present invention electroless copper plating or electroless nickel plating is performed as a method for forming a copper or nickel layer on the surface of the through hole.
  • electroless copper and electroless nickel plating methods can be used, and an electroless plating method using a palladium catalyst can be particularly preferably used.
  • step 2 of the method for manufacturing a printed wiring board of the present invention various known and commonly used methods can be used as a method for applying a palladium catalyst on a substrate. For example, a sensitizing-activator method can be used. Alternatively, the catalyst-accelerator method may be used.
  • step 3 of the method of manufacturing the laminate for the semi-additive method of the present invention the plating seed layer for removing the cover layer and forming the conductive layer (M3) of the circuit pattern for manufacturing the printed wiring board is formed.
  • This is a step of exposing the conductive silver particle layer (M1).
  • step 3 the copper layer (M2) is etched to remove the catalyst applied on the copper layer (M2), and the copper layer (M2) is conductive.
  • the silver particle layer (M1) is exposed.
  • step 3 the chemical used for etching and removing the copper layer (M2) having a thickness of 0.1 ⁇ m to 2 ⁇ m laminated on the conductive silver particle layer (M1) efficiently etches the copper layer (M2).
  • the lower silver particle layer (M1) is not damaged, there is no particular limitation, and a known and commonly used copper micro-etching solution and soft-etching solution can be used.
  • the etching solution for the copper layer (M2) an aqueous solution of persulfate such as ammonium persulfate, sodium persulfate, potassium persulfate, or a sulfuric acid / hydrogen peroxide aqueous solution can be used.
  • the concentration of the aqueous solution of persulfate or the aqueous solution of sulfuric acid / hydrogen peroxide is adjusted according to the thickness of the copper layer (M2) of the laminate for the semi-additive method used for manufacturing the printed wiring board, the design of the manufacturing equipment, and the like. It may be selected as appropriate, but in the process to be used, it is preferable to set the etching rate of the copper layer to be smaller than 2 ⁇ m / min, and efficient removal of the copper layer (M2) and conductive silver as an underlayer are performed. From the viewpoint of preventing damage to the particle layer (M1), 0.1 ⁇ m / min. ⁇ 1.5 ⁇ m / min. It is more preferable to set the etching rate to be the same as that of the above.
  • the peelable cover layer (RC) When a peelable cover layer (RC) is used as the cover layer, the peelable cover layer (RC) may be peeled off mechanically in step 3, and various commercially available peeling devices may be used. good. Further, when an alkali-soluble resin is used as the peelable cover layer (RC), it can be peeled off by immersing it in an alkaline solution. As the alkaline solution used for peeling and the peeling conditions, a stripping solution for pattern resist, which will be described later, can be appropriately used.
  • step 4 of the method for producing a laminate for the semi-additive method of the present invention electroless copper plating is performed using a plating catalyst applied on the surface of the through hole of the base material through steps 2 and 3.
  • it is a step of performing electroless nickel plating to form a copper layer or a nickel layer on the surface of the through hole.
  • the copper layer or nickel layer formed on the surface of the through hole is efficiently and surely replaced with the copper layer or nickel layer to the silver layer in step 5, and the replaced silver.
  • the layer thickness is preferably 0.1 ⁇ m to 1 ⁇ m.
  • the silver particle layer (M1) exposed in the step 3 functions as an electroless plating catalyst, and the silver particle layer (M1) is also electroless. Copper plating or electroless nickel plating may precipitate, but the copper layer or nickel layer formed on the silver particle layer (M1) is also replaced with the silver layer by the replacement silver plating in step 5.
  • substitution silver plating in step 5 carried out in the present invention a known and conventional plating method may be used, and a commercially available electroless substitution silver plating process can be preferably used.
  • a pattern resist of a circuit pattern is formed on the conductive silver particle layer (M1).
  • the pattern resist of the circuit pattern is obtained in the step 5. It may be formed on the substituted silver plating layer formed on the silver particle layer (M1).
  • the surface of the silver particle layer (M1) or the substituted silver plating layer is subjected to an acidic or alkaline cleaning solution for the purpose of improving the adhesion with the resist layer before forming the resist.
  • Surface treatments such as cleaning treatment, corona treatment, plasma treatment, UV treatment, gas phase ozone treatment, liquid phase ozone treatment, and treatment with a surface treatment agent may be performed. These surface treatments can be performed by one method or by using two or more methods in combination.
  • a method described in JP-A-7-258870 a method of treatment using a rust preventive agent composed of a triazole-based compound, a silane coupling agent and an organic acid, JP-A.
  • a method of treating with a surface treatment agent containing a compound, or the like can be used.
  • a photomask is passed through a photosensitive resist or an active exposure machine is used. Expose the pattern with light. The exposure amount may be appropriately set as needed. A pattern resist is formed by removing the latent image formed on the photosensitive resist by exposure using a developing solution.
  • the developer examples include a dilute alkaline aqueous solution such as 0.3 to 2% by mass of sodium carbonate and potassium carbonate.
  • a surfactant, a defoaming agent, a small amount of an organic solvent, or the like may be added to the dilute alkaline aqueous solution in order to accelerate development.
  • the substrate exposed above is immersed in a developing solution or developed by spraying the developing solution onto a resist, and by this development, a pattern resist from which the pattern forming portion is removed can be formed. ..
  • the resist residue such as may be removed.
  • the photosensitive resist used in the present invention a commercially available resist ink, liquid resist, or dry film resist can be used, and the resolution of the target pattern, the type of the exposure machine used, and the chemical solution used in the plating treatment in the subsequent step can be used. It may be appropriately selected depending on the type, pH and the like.
  • Examples of commercially available resist inks include “plating resist MA-830” and “etching resist X-87” manufactured by Taiyo Ink Mfg. Co., Ltd .; etching resist and plating resist manufactured by NAZDAR Co., Ltd .; “etching” manufactured by Mutual Chemical Industry Co., Ltd. Examples include the “resist PLAS FINE PER” series and the “plating resist PLAS FINE PPR” series. Examples of the electrodeposition resist include “Eagle series” and “Pepper series” manufactured by Dow Chemical Company.
  • a dry film for the semi-additive method may be used.
  • Commercially available dry films used for this purpose include, for example, "ALFO LDF500” and "NIT2700” manufactured by Nikko Materials Co., Ltd., “Sunfort UFG-258” manufactured by Asahi Kasei Corporation, and “RD” manufactured by Hitachi Kasei Co., Ltd. Series (RD-2015, 1225) “,” RY series (RY-5319, 5325) “,” PlateMaster series (PM200, 300) “manufactured by DuPont, and the like can be used.
  • the conductive silver particle layer (M1) or the conductive silver is used in order to form a circuit pattern on the base material.
  • the substituted silver plating layer formed on the particle layer (M1) is used as a cathode electrode for electrolytic copper plating, and as described above, on the silver particle layer (M1) exposed by development or the substituted silver plating layer.
  • the surface of the plating layer may be surface-treated.
  • the surface treatment includes a cleaning treatment with an acidic or alkaline cleaning liquid and a corona treatment under the condition that the surface of the silver particle layer (M1) or the conductive silver particle layer (M1) and the formed resist pattern are not damaged. , Plasma treatment, UV treatment, vapor phase ozone treatment, liquid phase ozone treatment, treatment with a surface treatment agent and the like. These surface treatments can be performed by one method or by using two or more methods in combination.
  • the voids between the silver particles form copper forming the conductive layer (M3). It is preferably filled with.
  • the presence of copper causes the silver particle layer (M1) in the pattern forming region existing under the conductive layer (M3) to be removed by the etching solution used in the subsequent step. It is suppressed.
  • the silver particle layer (M1) in the non-pattern-forming region can be efficiently removed by the etching solution because copper does not exist between the silver particles and the etching solution easily penetrates into the voids. By such a mechanism, the undercut of the lower part of the conductive layer can be suppressed.
  • annealing is performed after plating for the purpose of stress relaxation and improvement of adhesion of the plating film. You may. Annealing may be performed before the etching step described later, after the etching step, or before and after the etching.
  • the annealing temperature may be appropriately selected in the temperature range of 40 to 300 ° C. depending on the heat resistance of the substrate to be used and the purpose of use, but is preferably in the range of 40 to 250 ° C. for the purpose of suppressing oxidative deterioration of the plating film.
  • the range of 40 to 200 ° C. is more preferable.
  • the annealing time is preferably 10 minutes to 10 days in the temperature range of 40 to 200 ° C., and 5 minutes to 10 hours in the case of a temperature exceeding 200 ° C. Further, when annealing the plating film, a rust preventive may be appropriately applied to the surface of the plating film.
  • the pattern resist formed by using the photosensitive resist is peeled off. Then, the silver particle layer (M1) in the non-pattern forming portion, or the silver particle layer (M1) and the substituted silver plating layer in the non-pattern forming portion are removed by the etching solution.
  • the pattern resist may be peeled off under the recommended conditions described in the catalog, specifications, etc. of the photosensitive resist used.
  • the resist stripping solution used for stripping the pattern resist a commercially available resist stripping solution or a 1.5 to 3% by mass aqueous solution of sodium hydroxide or potassium hydroxide set at 45 to 60 ° C. may be used. can.
  • the resist can be peeled off by immersing the substrate on which the conductive layer (M3) of the circuit pattern is formed in a stripping solution or by spraying the stripping solution with a spray or the like.
  • the etching solution used for removing the silver particle layer (M1) of the non-pattern forming portion and the substituted silver plating layer only the silver particle layer (M1) and the substituted silver plating layer are selectively etched.
  • the copper forming the conductive layer (M3) is preferably non-etched. Examples of such an etching solution include a mixture of a carboxylic acid and hydrogen peroxide.
  • carboxylic acid examples include acetic acid, formic acid, propionic acid, butyric acid, valeric acid, caproic acid, enanthic acid, capric acid, pelargonic acid, capric acid, lauric acid, myristic acid, palmitic acid, margalic acid and stearic acid.
  • Oleic acid Oleic acid, linoleic acid, linolenic acid, arachidonic acid, eikosapentaenoic acid, docosahexaenoic acid, oxalic acid, malonic acid, succinic acid, benzoic acid, salicylic acid, phthalic acid, isophthalic acid, terephthalic acid, gallic acid, melitonic acid, coconut skin
  • carboxylic acids can be used alone or in combination of two or more. Among these carboxylic acids, it is preferable to mainly use acetic acid because it is easy to manufacture and handle as an etching solution.
  • percarboxylic acid peroxycarboxylic acid
  • M1 silver constituting the silver particle layer
  • M3 dissolution of the copper constituting the conductive layer
  • the mixing ratio of the mixture of the carboxylic acid and hydrogen peroxide is preferably in the range of 2 to 100 mol of hydrogen peroxide with respect to 1 mol of the carboxylic acid because the dissolution of the conductive layer (M3) of copper can be suppressed.
  • Hydrogen peroxide in the range of 2 to 50 mol is more preferable.
  • the mixture of the carboxylic acid and hydrogen peroxide is preferably an aqueous solution diluted with water. Further, the content ratio of the mixture of the carboxylic acid and hydrogen peroxide in the aqueous solution is preferably in the range of 2 to 65% by mass and preferably in the range of 2 to 30% by mass because the influence of the temperature rise of the etching solution can be suppressed. Is more preferable.
  • water used for the above dilution it is preferable to use water from which ionic substances and impurities such as ion-exchanged water, pure water, and ultrapure water have been removed.
  • a protective agent for protecting the conductive layer (M3) of copper and suppressing dissolution may be further added to the etching solution.
  • the protective agent it is preferable to use an azole compound.
  • azole compound examples include imidazole, pyrazole, triazole, tetrazole, oxozole, thiazole, selenazole, oxadiazole, thiadiazole, oxatriazole, and thiatriazole.
  • azole compound examples include, for example, 2-methylbenzimidazole, aminotriazole, 1,2,3-benzotriazole, 4-aminobenzotriazole, 1-bisaminomethylbenzotriazole, aminotetrazole, phenyltetrazole, 2 -Phenylthiazole, benzothiazole and the like can be mentioned. These azole compounds may be used alone or in combination of two or more.
  • the concentration of the azole compound in the etching solution is preferably in the range of 0.001 to 2% by mass, more preferably in the range of 0.01 to 0.2% by mass.
  • the dissolution of the conductive layer (M3) of copper can be suppressed in the etching solution, it is preferable to add polyalkylene glycol as a protective agent.
  • polyalkylene glycol examples include water-soluble polymers such as polyethylene glycol, polypropylene glycol, and polyoxyethylene polyoxypropylene block copolymer. Among these, polyethylene glycol is preferable.
  • the number average molecular weight of the polyalkylene glycol is preferably in the range of 200 to 20,000.
  • the concentration of the polyalkylene glycol in the etching solution is preferably in the range of 0.001 to 2% by mass, more preferably in the range of 0.01 to 1% by mass.
  • Additives such as sodium salt, potassium salt and ammonium salt of organic acid may be added to the etching solution as necessary in order to suppress fluctuations in pH.
  • the silver particle layer (M1) and the substituted silver plating layer in the non-pattern forming portion are removed by forming the conductive layer (M3) and then using the photosensitive resist.
  • the substrate from which the pattern resist has been peeled off can be immersed in the etching solution, or the etching solution can be sprayed onto the substrate by spraying or the like.
  • the etching solution is prepared. It may be supplied to the etching apparatus, or each component of the etching solution may be individually supplied to the etching apparatus, and the respective components may be mixed in the apparatus to prepare a predetermined composition.
  • the etching solution is preferably used in a temperature range of 10 to 35 ° C., and particularly when an etching solution containing hydrogen peroxide is used, decomposition of hydrogen peroxide can be suppressed, so that the temperature range is 30 ° C. or lower. It is preferable to use in.
  • the silver particle layer (M1) is removed with the etching solution, further cleaning operations are performed in addition to washing with water for the purpose of preventing the silver component dissolved in the etching solution from adhering to and remaining on the printed wiring board. You may go.
  • a cleaning solution that dissolves silver oxide, silver sulfide, and silver chloride, but hardly dissolves silver.
  • Examples of the thiosulfate include ammonium thiosulfate, sodium thiosulfate, potassium thiosulfate and the like.
  • Examples of the tris (3-hydroxyalkyl) phosphine include tris (3-hydroxymethyl) phosphine, tris (3-hydroxyethyl) phosphine, and tris (3-hydroxypropyl) phosphine. These thiosulfates or tris (3-hydroxyalkyl) phosphines can be used alone or in combination of two or more.
  • the concentration when using an aqueous solution containing a thiosulfate may be appropriately set depending on the process time, the characteristics of the cleaning device to be used, etc., but is preferably in the range of 0.1 to 40% by mass, and during cleaning efficiency and continuous use. From the viewpoint of the stability of the chemical solution, the range of 1 to 30% by mass is more preferable.
  • the concentration of the aqueous solution containing tris (3-hydroxyalkyl) phosphine may be appropriately set depending on the process time, the characteristics of the cleaning device used, and the like, but is in the range of 0.1 to 50% by mass. Preferably, the range of 1 to 40% by mass is more preferable from the viewpoint of cleaning efficiency and stability of the chemical solution during continuous use.
  • Examples of the mercaptocarboxylic acid include thioglycolic acid, 2-mercaptopropionic acid, 3-mercaptopropionic acid, thioapple acid, cysteine, N-acetylcysteine and the like.
  • Examples of the salt of the mercaptocarboxylic acid include alkali metal salts, ammonium salts, amine salts and the like.
  • the concentration is preferably in the range of 0.1 to 20% by mass, and from the viewpoint of cleaning efficiency and process cost when processing a large amount, 0.5 to 15% by mass.
  • the range of is more preferable.
  • Examples of the method for performing the above cleaning operation include a method of immersing a printed wiring board obtained by etching and removing the silver particle layer (M1) of the non-pattern forming portion in the cleaning chemical solution, and spraying the printed wiring board.
  • a method of spraying a cleaning chemical solution with or the like can be mentioned.
  • the temperature of the cleaning chemical solution can be used at room temperature (25 ° C.), but since the cleaning process can be performed stably without being affected by the outside air temperature, the temperature may be set to 30 ° C. for use.
  • the step of removing the silver particle layer (M1) of the non-pattern forming portion with an etching solution and the cleaning operation can be repeated as necessary.
  • the silver particle layer (M1) and the substituted silver plating layer of the non-pattern forming portion were removed with the etching solution as described above.
  • a further cleaning operation may be performed as necessary.
  • an alkaline permanganate solution in which potassium permanganate or sodium permanganate is dissolved in an aqueous solution of potassium hydroxide or sodium hydroxide can be used.
  • Cleaning using the alkaline permanganate solution is a method of immersing the printed wiring board obtained by the above method in an alkaline permanganate solution set at 20 to 60 ° C., or the printed wiring board is alkaline by spraying or the like. Examples thereof include a method of spraying a permanganate solution.
  • the printed wiring board is treated with a water-soluble organic solvent having an alcoholic hydroxyl group before cleaning for the purpose of improving the wettability of the alkaline permanganate solution to the surface of the substrate and improving the cleaning efficiency. You may go.
  • the organic solvent include methyl alcohol, ethyl alcohol, n-propyl alcohol, isopropyl alcohol and the like. These organic solvents may be used alone or in combination of two or more.
  • the concentration of the alkaline permanganate solution may be appropriately selected as needed, but potassium permanganate or permanganate is added to 100 parts by mass of 0.1 to 10% by mass of potassium hydroxide or sodium hydroxide aqueous solution. It is preferable that 0.1 to 10 parts by mass of sodium is dissolved, and from the viewpoint of cleaning efficiency, potassium permanganate or sodium permanganate is added to 100 parts by mass of 1 to 6% by mass of potassium hydroxide or sodium hydroxide aqueous solution. Is more preferably dissolved in 1 to 6 parts by mass.
  • the washed printed wiring board When cleaning with the above alkaline permanganic acid solution, it is preferable to treat the washed printed wiring board with a solution having a neutralizing / reducing action after cleaning with the alkaline permanganic acid solution.
  • the liquid having a neutralizing / reducing action include an aqueous solution containing 0.5 to 15% by mass of dilute sulfuric acid or an organic acid.
  • the organic acid include formic acid, acetic acid, oxalic acid, citric acid, ascorbic acid, and methionine.
  • the cleaning with the alkaline permanganic acid solution may be performed after the cleaning for the purpose of preventing the silver component dissolved in the etching solution from adhering to and remaining on the printed wiring board, or may be performed in the etching solution. In order to prevent the dissolved silver component from adhering to and remaining on the printed wiring board, instead of cleaning, only cleaning with an alkaline permanganic acid solution may be performed.
  • the coverlay film is laminated on the circuit pattern, the solder resist layer is formed, and the circuit pattern is finalized, if necessary.
  • the surface treatment nickel / gold plating, nickel / palladium / gold plating, and palladium / gold plating may be applied.
  • the laminate for the semi-additive method of the present invention By using the laminate for the semi-additive method of the present invention described above, it is possible to smooth the rectangular cross-sectional shape with high adhesion on various smooth substrates, good design reproducibility, and good smoothness without using a vacuum device. It is possible to manufacture a double-sided connected substrate having a surface circuit pattern. Therefore, by using the laminate for the semi-additive method of the present invention, it is possible to provide a high-density, high-performance printed wiring board board and a printed wiring board of various shapes and sizes at low cost and satisfactorily. , Highly industrially usable in the field of printed wiring boards.
  • the laminated body not only the printed wiring board but also various members having a metal layer patterned on the surface of the base material on a plane, for example, a connector, an electromagnetic wave shield, an antenna such as RFID, a film capacitor, etc. can be used. Can be manufactured.
  • Polyester polyol (polyolpolyol obtained by reacting 1,4-cyclohexanedimethanol, neopentylglycol, and adipic acid in a nitrogen-substituted container equipped with a thermometer, a nitrogen gas introduction tube, and a stirrer) 100 By mass, 17.6 parts by mass of 2,2-dimethylolpropionic acid, 21.7 parts by mass of 1,4-cyclohexanedimethanol, 106.2 parts by mass of dicyclohexylmethane-4,4'-diisocyanate, and 178 parts by mass of methylethylketone. By reacting in the mixed solvent of the above, a urethane prepolymer solution having an isocyanate group at the terminal was obtained.
  • a monomer mixture consisting of 60 parts by mass of methyl methacrylate, 30 parts by mass of n-butyl acrylate and 10 parts by mass of Nn-butoxymethylacrylamide, and 20 parts by mass of a 0.5% by mass ammonium persulfate aqueous solution were added.
  • the parts were dropped from a separate dropping funnel over 120 minutes while keeping the temperature inside the reaction vessel at 80 ° C.
  • aqueous dispersion of a resin composition for a primer layer which is a core-shell type composite resin having the urethane resin as a shell layer and an acrylic resin made of methyl methacrylate or the like as a core layer, was obtained. ..
  • a primer composition (B-6) was obtained by diluting and mixing so that the non-volatile content was 2% by mass.
  • a vinyl monomer mixture consisting of 47.0 parts by mass of methyl methacrylate, 5.0 parts by mass of glycidyl methacrylate, 45.0 parts by mass of n-butyl acrylate, and 3.0 parts by mass of methacrylic acid in a reaction vessel under stirring.
  • a part of the monomer pre-emulsion obtained by mixing 4 parts by mass of a surfactant (“Aqualon KH-1025” manufactured by Daiichi Kogyo Seiyaku Co., Ltd .: 25% by mass of the active ingredient) and 15 parts by mass of deionized water. 5 parts by mass) was added, and then 0.1 part by mass of potassium persulfate was added, and the mixture was polymerized in 60 minutes while keeping the temperature inside the reaction vessel at 70 ° C.
  • the remaining monomer preemulsion 114 parts by mass
  • 30 parts by mass of an aqueous solution of potassium persulfate (1.0% by mass of the active ingredient) were separately added dropwise. Dropped over 180 minutes using a funnel. After completion of the dropping, the mixture was stirred at the same temperature for 60 minutes.
  • Preparation Example 1 Preparation of silver particle dispersion
  • a dispersion containing the agent was prepared.
  • ion-exchanged water, ethanol and a surfactant were added to the obtained dispersion to prepare a 5% by mass silver particle dispersion.
  • a copper etching solution was prepared by mixing 37.5 g / L of sulfuric acid and 13.5 g / L of hydrogen peroxide with ion-exchanged water.
  • the electroless silver plating baths of Preparation Examples (3) to (5) were prepared based on Japanese Patent Application Laid-Open No. 2000-309875.
  • Preparation Example 5 Preparation of electroless silver plating bath (3)] Silver oxide 1 g / l (as silver), p-toluenesulfonic acid 30 g / l, tartaric acid 50 g / l 2,2'-(Ethylenedithio) dietanthiol 45 g / l, thiourea 20 g / l, ⁇ -naphthol polyethoxylate (EO15) 5 g / l, pH 6.5 (adjusted with NaOH), bath temperature 70 ° C.
  • Silver oxide 1 g / l (as silver), p-toluenesulfonic acid 30 g / l, tartaric acid 50 g / l 2,2'-(Ethylenedithio) dietanthiol 45 g / l, thiourea 20 g / l, ⁇ -naphthol polyethoxylate (EO15
  • Step 1 The silver particle dispersion obtained in Preparation Example 1 is placed on the surface of a polyimide film (“Kapton 100EN-C” manufactured by Toray DuPont Co., Ltd .; thickness 25 ⁇ m), which is an insulating base material, on a desktop compact coater (RK print). Using a "K printing prober” manufactured by Coat Instrument Co., Ltd., the silver particle layer after drying was coated to be 0.5 g / m 2 . Then, it was dried at 160 ° C. for 5 minutes using a hot air dryer.
  • a polyimide film (“Kapton 100EN-C” manufactured by Toray DuPont Co., Ltd .; thickness 25 ⁇ m)
  • RK print desktop compact coater
  • the silver particle layer after drying was coated to be 0.5 g / m 2 . Then, it was dried at 160 ° C. for 5 minutes using a hot air dryer.
  • the film was turned over, and the silver particle dispersion obtained in Preparation Example 1 was coated in the same manner as above so that the silver particle layer was 0.5 g / m 2 , and the temperature was 160 ° C. using a hot air dryer. A silver particle layer was formed on both surfaces of the polyimide film by drying in. The film substrate thus obtained was fired at 250 ° C. for 5 minutes, and the continuity of the silver particle layer was confirmed with a tester.
  • the polyimide film having conductive silver particle layers on both surfaces obtained above is fixed to a frame made of polyethylene, and is used in an electroless copper plating solution (“Circuposit 6550” manufactured by Roam & Haas Electronic Materials Co., Ltd.). Was immersed in 35 ° C. for 10 minutes to form electroless copper plating films (M2; thickness 0.2 ⁇ m) on both surfaces. Then, a through hole having a diameter of 100 ⁇ m was formed by using a drill.
  • an electroless copper plating solution (“Circuposit 6550” manufactured by Roam & Haas Electronic Materials Co., Ltd.).
  • Step 2 Palladium catalyst addition to through holes
  • a predip solution for electroless plating (“OPC-SAL-M”, manufactured by Okuno Pharmaceutical Industry Co., Ltd.) was diluted with water to a ratio of 260 g / L and maintained at 25 ° C. The film having through holes formed therein was immersed in this liquid for 1 minute.
  • Pre-dilution liquid OPC-SAL-M, manufactured by Okuno Pharmaceutical Industry Co., Ltd.
  • Sn-Pd colloidal catalyst liquid OPC-90 catalystist, manufactured by Okuno Pharmaceutical Industry Co., Ltd.
  • OPC-SAL-M Sn-Pd colloidal catalyst liquid
  • OPC-90 catalystist manufactured by Okuno Pharmaceutical Industry Co., Ltd.
  • the activation solution (“OPC-505 Accelerator A”, manufactured by Okuno Pharmaceutical Industry Co., Ltd.) and the activation solution (“OPC-505 Accelerator B”, manufactured by Okuno Pharmaceutical Industry Co., Ltd.) were 100 mL / L, respectively. It was mixed and diluted with water to 8 mL / L and kept at 30 ° C. After immersing the object to be plated after the step of applying the catalyst compound for 5 minutes, washing with running water was performed for 2 minutes to apply the palladium catalyst to the inner wall of the through hole and the surfaces of both coppers.
  • Step 3 Copper was removed from the film obtained above using the sulfuric acid / hydrogen peroxide-based copper etching solution prepared in Preparation Example 2, and the conductive silver particle layer (M1) was exposed.
  • Step 4 Electroless copper plating
  • the film substrate thus obtained was immersed in an electroless copper plating solution (“Circuposit 6550” manufactured by Roam & Haas Electronic Materials Co., Ltd.) at 35 ° C. for 25 minutes, and the inner wall of the through hole and the through hole were immersed.
  • An electroless copper plating layer (thickness 0.5 ⁇ m) was formed on the conductive silver particle layers (M1) on both surfaces.
  • Step 5 Electroless substituted silver plating
  • the electroless silver plating solution prepared in Preparation Example 3 was set at 40 ° C., and the film prepared above was immersed for 3 minutes while shaking to form on the inner wall of the through hole and the silver particle layer (M1).
  • the copper plating layer By substituting the copper plating layer with the silver plating layer (M3), A conductive silver particle layer (M1) and a silver-plated layer (M2) are sequentially laminated on both surfaces of the insulating base material (A), and further have through holes for connecting both sides of the base material.
  • step 4 of step 1 electroless nickel plating using a hypophosphite reducing agent was carried out instead of electroless copper plating.
  • Electroless nickel plating is performed by immersing the electroless nickel plating solution ("ICP Nicolon GM (NP)" manufactured by Okuno Pharmaceutical Co., Ltd.) set at 80 ° C. for 1.5 minutes on the inner wall of the through hole. A plating layer (thickness 0.2 ⁇ m) was formed.
  • ICP Nicolon GM (NP) manufactured by Okuno Pharmaceutical Co., Ltd.
  • the film thus obtained was treated for 10 minutes by a substitution silver plating process ("Dyne Silver EL” manufactured by Daiwa Kasei Co., Ltd.) set at 25 ° C., and the nickel plating layer formed on the inner wall of the through hole was formed into a silver plating layer.
  • a substitution silver plating process (“Dyne Silver EL” manufactured by Daiwa Kasei Co., Ltd.) set at 25 ° C.
  • the nickel plating layer formed on the inner wall of the through hole was formed into a silver plating layer.
  • the conductive silver particle layer (M1) is provided on both surfaces of the insulating base material (A), and further, through holes connecting both sides of the base material are provided and penetrated.
  • a laminate for a semi-additive method characterized by having a silver-plated layer on the surface of the pores, was produced.
  • Examples 3 and 4 The silver particle layers were formed on both surfaces of the polyimide film in the same manner as in Example 1 except that the silver particle layer after drying was changed from 0.5 g / m 2 to 0.8 g / m 2 . It was fired at 250 ° C. for 5 minutes, and the continuity of the silver particle layer was confirmed with a tester. A polyimide film having conductive silver particle layers on both surfaces thus obtained was fixed to a copper frame, the surface of the silver particle layer was placed on a cathode, and copper sulfate was used with phosphorus-containing copper as an anode.
  • the current density is 2A.
  • a silver particle layer (M1) and a copper layer (M2) having a thickness of 1 ⁇ m are formed on both surfaces of the polyimide film which is the insulating base material (A).
  • Example 5 On the surface of a polyimide film (“Capton 100EN-C” manufactured by Toray DuPont Co., Ltd., thickness 25 ⁇ m), the primer (B-1) obtained in Production Example 1 was applied to a desktop compact coater (RK Print Coat Instrument Co., Ltd.). The film was coated to a thickness of 120 nm after drying using a “K printing prober”), and then dried at 80 ° C. for 5 minutes using a hot air dryer. Further, the film was turned inside out. In the same manner as above, the primer (B-1) obtained in Production Example 1 was coated so that the thickness after drying was 120 nm, and dried at 80 ° C. for 5 minutes using a hot air dryer. Primer layers were formed on both surfaces of the polyimide film.
  • a desktop compact coater RK Print Coat Instrument Co., Ltd.
  • the insulating base material (A) has the same insulating properties as in Examples 1 to 4, except that the polyimide film is changed to a polyimide having primer layers formed on both surfaces of the polyimide film obtained above.
  • a laminate having a primer (B-1) layer and a conductive silver particle layer (M1) on both surfaces of the base material (A) and further having a copper layer is prepared, and through holes penetrating both sides thereof. From step 1 onward, steps 2 to 5 were carried out in the same manner as in Examples 1 to 4, respectively, to prepare a laminate for the semi-additive method.
  • Step 1 of Examples 1 to 8 instead of forming a copper layer on the silver particle layer (M1), a 38 ⁇ m thick polyester removable adhesive tape (Panac Co., Ltd.) is used as a peelable cover layer (RC).
  • the conductive silver particle layer (M1) and the peeling cover are placed on both surfaces of the insulating base material (A) in the same manner as in Examples 1 to 3, except that Panaprotect HP / CT) is laminated. It had a layer (RC) and was further drilled to form through holes through both sides.
  • a palladium catalyst was applied to the inner wall of the through hole and the surface of the peelable cover film (RC).
  • step 3 of Examples 1 to 8 conductive silver particles are removed by peeling off the peelable cover film (RC) instead of removing copper by using a sulfuric acid / hydrogen peroxide-based copper etching solution. The layer (M1) was exposed.
  • steps 4 and 5 were carried out in the same manner as in Examples 1 to 8, respectively, to prepare a laminate for the semi-additive method.
  • Examples 17 to 32 Semi-additive by carrying out steps 1 to 5 in the same manner as in Examples 1 to 16 except that the through hole having a diameter of 100 ⁇ m using a drill was changed to the through hole having a diameter of 70 ⁇ m using a laser. A laminate for the construction method was produced.
  • Examples 33 to 36 In Examples 5 and 7, the thickness of the electroless copper plating layer formed on the conductive silver particle layers (M1) on both surfaces in step 4 was increased from 0.5 ⁇ m to 0.7 ⁇ m (Examples 33 and 34). Steps 1 to 7 in the same manner as in Examples 5 and 7, except that the particles were changed to 1 ⁇ m (Examples 35 and 36) and the substituted silver plating baths were changed to the plating baths of Preparation Examples 4 and 5, respectively. By carrying out step 5, a laminate for the semi-additive method was produced.
  • Examples 37 to 53 Type of insulating base material, type of primer used for primer layer and its drying conditions, amount of silver in silver particle layer, cover layer type of silver particle layer, through hole formation method, replacement plating type by silver plating, replacement plating film thickness , Steps 1 to 5 were carried out in the same manner as in Example 1 except that the substituted silver plating solution type was changed to that shown in Table 1 or 2, to prepare a laminate for the semi-additive method. ..
  • Examples 54 to 107 In step 1 of Examples 1 to 53, each is carried out except that the formation position of the through hole (through hole) is the connection position to the back surface solid GND at the transmission characteristic evaluation terminal of the microstrip line having a wiring length of 100 mm and an impedance of 50 ⁇ .
  • steps 1 to 5 By carrying out steps 1 to 5 in the same manner as in Examples 1 to 53, a laminate for the semi-additive method was formed.
  • Step 6 A dry film resist (“Fotech RD-1225” manufactured by Hitachi Chemical Co., Ltd .; a resist film) is placed on the silver-plated layer (M2) or the silver particle layer (M1) on the silver particle layer (M1) thus obtained. 25 ⁇ m in thickness) was crimped at 100 ° C. using a roll laminator, and then a microstrip line pattern with a wiring length of 100 mm and an impedance of 50 ⁇ was applied onto the resist using a direct exposure digital imaging device (“Nuvogo1000R” manufactured by Orbotec). And, the terminal pad pattern of the through hole portion connected to the GND for the measurement probe was exposed.
  • a direct exposure digital imaging device (“Nuvogo1000R” manufactured by Orbotec”.
  • the microstrip line pattern and the probe terminal pad portion were removed on the silver plating layer (M2) or the silver particle layer (M1) by developing with a 1 mass% sodium carbonate aqueous solution. Was formed, and the silver plating layer (M2) or the silver particle layer (M1) on the polyimide film was exposed.
  • Step 7 the surface of the silver plating layer (M2) or the silver particle layer (M1) of the base material on which the pattern resist is formed is placed on the cathode, and the electrolytic plating solution (copper sulfate) containing copper sulfate is used as the anode and the phosphorus-containing copper is used as the anode.
  • a circuit pattern layer (M4) having a thickness of 18 ⁇ m was formed by electrolytic copper plating on the microstrip pattern from which the resist was removed and the probe terminal pad portion.
  • a film having a metal pattern made of copper was formed at 50 ° C.
  • the pattern resist was peeled off by immersing it in a 3% by mass sodium hydroxide aqueous solution set in 1.
  • Step 8 Next, by immersing the film obtained above in the silver etching agent obtained in Preparation Example 3 at 25 ° C. for 30 seconds, a silver plating layer (M2) other than the circuit pattern and a silver particle layer ( M1) was removed to obtain a printed wiring board.
  • the cross-sectional shape of the circuit forming part (microstrip line and proben terminal part) of the produced printed wiring board shows a rectangular shape with no decrease in wiring height and wiring width and no undercut. It was a circuit pattern layer with a smooth surface.
  • the surface of the copper foil to which carbon was attached was removed by an etching treatment using the sulfuric acid / hydrogen peroxide aqueous solution prepared in Preparation Example 2 on both surfaces of the insulating base material (A).
  • a base material having a copper foil and further having through holes connecting both sides of an insulating base material, and having a through hole surface whose conductivity was ensured by carbon was obtained.
  • the copper foil has a thickness of 18 ⁇ m on the copper foil plating base layer.
  • a conductor circuit layer of a microstrip line and a probe terminal pad pattern was formed.
  • the conductive layer (M3) of the microstrip line was etched and the film thickness was about 3 ⁇ m. As it became thinner, the wiring width decreased by about 6 ⁇ m, and the cross-sectional shape became "trapezoidal" because it could not hold a rectangle. Further, the surface of the conductive layer of copper was roughened by etching to reduce the smoothness.
  • the electrolytic copper-plated polyimide film (“Capton 100EN-C” manufactured by Toray DuPont Co., Ltd .; thickness 25 ⁇ m) was used.
  • a 18 ⁇ m thick microstrip line made of copper and a conductor circuit layer of a probe terminal pad pattern were formed.
  • the conductive layer (M3) of the microstrip line was etched and the film thickness was about 1 ⁇ m. As it became thinner, the wiring width decreased by about 2 ⁇ m or more, and the cross-sectional shape became "trapezoidal" because it could not hold a rectangle. Further, the surface of the conductive layer of copper was roughened by etching to reduce the smoothness. Further, in the region other than the conductive layer (M3) pattern, only the copper layer was removed, and the nickel / chromium layer remained without being removed.
  • Step 1 Insulating base material 2: Silver particle layer 3b: Cover layer (copper layer or peelable cover layer) 5: Through hole (through hole) 5: Electroless plating catalyst 6: Electroless copper plating layer or electroless nickel plating layer 7: Substituted silver plating layer 8: Pattern resist 9: Conductive layer (electrolytic copper plating layer) (A) Laminated body (b) Step 1: Through hole (through hole) formation (c) Step 2: Electroless silver plating catalyst application (d) Step 3: Exposure of conductive silver particle layer (e) Step 4: Electroless copper plating on the surface of the through hole and the surface of the silver particle layer, or electroless nickel plating (f) Step 5: Substitution silver plating of the copper plating layer or nickel plating layer (g) Semi-additive method-like laminate) (H) Manufacturing step 1: Pattern resist formation (i) Manufacturing step 2: Conductive layer formation by electrolytic copper plating (j) Manufacturing step 3: Pattern resist peeling (k) Manufacturing step 4: Silver seed removal

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
PCT/JP2021/038872 2020-11-05 2021-10-21 セミアディティブ工法用積層体及びそれを用いたプリント配線板 WO2022097484A1 (ja)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003332735A (ja) * 2002-05-14 2003-11-21 Fujitsu Ltd 配線基板およびその製造方法ならびに導体張板
JP2013222908A (ja) * 2012-04-19 2013-10-28 Achilles Corp 両面回路基板の製造方法、および両面回路基板
WO2020003879A1 (ja) * 2018-06-26 2020-01-02 Dic株式会社 金属パターンを有する成形体の製造方法
WO2020003880A1 (ja) * 2018-06-26 2020-01-02 Dic株式会社 プリント配線板用積層体及びそれを用いたプリント配線板

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003332735A (ja) * 2002-05-14 2003-11-21 Fujitsu Ltd 配線基板およびその製造方法ならびに導体張板
JP2013222908A (ja) * 2012-04-19 2013-10-28 Achilles Corp 両面回路基板の製造方法、および両面回路基板
WO2020003879A1 (ja) * 2018-06-26 2020-01-02 Dic株式会社 金属パターンを有する成形体の製造方法
WO2020003880A1 (ja) * 2018-06-26 2020-01-02 Dic株式会社 プリント配線板用積層体及びそれを用いたプリント配線板

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