WO2022092658A1 - Composition photodurcissable comprenant des particules inorganiques et dispositif d'affichage - Google Patents

Composition photodurcissable comprenant des particules inorganiques et dispositif d'affichage Download PDF

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WO2022092658A1
WO2022092658A1 PCT/KR2021/014470 KR2021014470W WO2022092658A1 WO 2022092658 A1 WO2022092658 A1 WO 2022092658A1 KR 2021014470 W KR2021014470 W KR 2021014470W WO 2022092658 A1 WO2022092658 A1 WO 2022092658A1
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group
formula
photocurable composition
ring
aryl
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PCT/KR2021/014470
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English (en)
Korean (ko)
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이창민
고윤종
배준
김준기
임재현
전서정
문성윤
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덕산네오룩스 주식회사
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Publication of WO2022092658A1 publication Critical patent/WO2022092658A1/fr

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Definitions

  • the present invention relates to a photocurable composition and a display device manufactured using the same.
  • a liquid crystal display device LCD
  • an organic light emitting display device OLED
  • the organic light emitting display device in particular has advantages such as low power consumption, fast response speed, high color reproducibility, high luminance, and wide viewing angle.
  • a polarizing film is used to block the light reflected from the panel due to incident external light.
  • a colored pattern is used as red, green, and blue color filters in a liquid crystal display device, not only in a liquid crystal display but also in an organic light emitting display.
  • the patterns of the above colors are used in the organic light emitting display, it is for the purpose of implementing the color of a white backlight, a black bank of quantum dot patterns for color converting a blue backlight, or for removing a blue backlight leaking from a display having the same structure.
  • a color filter it is various.
  • the coloring patterns used for various purposes in various display devices are required to have high resolution and adhesion to the substrate.
  • One embodiment of the present invention is to provide a highly reliable pixel by realizing a coloring pattern having high resolution and excellent adhesion on a substrate.
  • the present invention is an alkali-soluble resin; reactive unsaturated compounds; photoinitiators; Colorant; Inorganic nanoparticles containing at least one of BaSO 4 and Ba(NO 3 ) 2 ; And it provides a photocuring composition comprising a solvent.
  • the surface of the inorganic nanoparticles is preferably coated or treated with other inorganic and organic materials.
  • the size of the inorganic nanoparticles is preferably 10 to 1,000 nm.
  • the inorganic nanoparticles are preferably included in an amount of 0.1 wt% to 20 wt% based on the total amount of the photocurable composition.
  • the photocurable composition preferably includes a dispersion prepared by pre-mixing a colorant and inorganic nanoparticles with a dispersant, a resin, and a solvent.
  • the alkali-soluble resin includes a repeating unit represented by the following formula (1).
  • R 1 and R 2 are each independently hydrogen; heavy hydrogen; halogen; C 6 ⁇ C 30 Aryl group; O, N, S, Si and P containing at least one heteroatom C 2 ⁇ C 30 A heterocyclic group; C 6 ⁇ C 30 A fused ring group of an aliphatic ring and an aromatic ring; C 1 ⁇ C 20 Alkyl group; C 2 ⁇ C 20 Alkenyl group; C 2 ⁇ C 20 Alkynyl group; C 1 ⁇ C 20 Alkoxy group; C 6 ⁇ C 30 Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C 1 ⁇ C 20 An alkoxycarbonyl group,
  • R 1 and R 2 are each capable of forming a ring with an adjacent group
  • a and b are each independently an integer from 0 to 4,
  • X 1 is a single bond, O, CO, SO 2 , CR'R", SiR'R", Formula (A) or Formula (B),
  • X 2 is a C 6 ⁇ C 30 aryl group; O, N, S, Si and P containing at least one heteroatom C 2 ⁇ C 30 A heterocyclic group; C 6 ⁇ C 30 A fused ring group of an aliphatic ring and an aromatic ring; C 1 ⁇ C 20 Alkyl group; C 2 ⁇ C 20 Alkenyl group; C 2 ⁇ C 20 Alkynyl group; C 1 ⁇ C 20 Alkoxy group; C 6 ⁇ C 30 Aryloxy group; or a combination thereof,
  • R' and R" are each independently hydrogen; deuterium; halogen; C 6 -C 30 Aryl group; O, N, S, Si and P containing at least one heteroatom of C 2 -C 30 Heterocyclic group; C 6 ⁇ C 30 A fused ring group of an aliphatic ring and an aromatic ring; C 1 ⁇ C 20 Alkyl group; C 2 ⁇ C 20 Alkenyl group; C 2 ⁇ C 20 Alkynyl group; C 1 ⁇ C 20 Alkoxy group; C 6 ⁇ C 30 Aryloxy group; Fluorenyl group; Carbonyl group; Ether group; Or C 1 ⁇ C 20 Alkoxycarbonyl group,
  • R' and R" may each form a ring with an adjacent group
  • a 1 and A 2 are each independently Formula (C) or Formula (D),
  • X 3 is O, S, SO 2 or NR',
  • R' is hydrogen; heavy hydrogen; halogen; C 6 ⁇ C 30 Aryl group; O, N, S, Si and P containing at least one heteroatom C 2 ⁇ C 30 A heterocyclic group; C 6 ⁇ C 30 A fused ring group of an aliphatic ring and an aromatic ring; C 1 ⁇ C 20 Alkyl group; C 2 ⁇ C 20 Alkenyl group; C 2 ⁇ C 20 Alkynyl group; C 1 ⁇ C 20 Alkoxy group; C 6 ⁇ C 30 Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C 1 ⁇ C 20 An alkoxycarbonyl group,
  • R 3 to R 6 are each independently hydrogen; heavy hydrogen; halogen; C 6 ⁇ C 30 Aryl group; O, N, S, Si and P containing at least one heteroatom C 2 ⁇ C 30 A heterocyclic group; C 6 ⁇ C 30 A fused ring group of an aliphatic ring and an aromatic ring; C 1 ⁇ C 20 Alkyl group; C 2 ⁇ C 20 Alkenyl group; C 2 ⁇ C 20 Alkynyl group; C 1 ⁇ C 20 Alkoxy group; C 6 ⁇ C 30 Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C 1 ⁇ C 20 An alkoxycarbonyl group,
  • R 3 to R 6 are each capable of forming a ring with an adjacent group
  • c ⁇ f are independently integers from 0 to 4,
  • R 7 to R 10 are each independently hydrogen; heavy hydrogen; halogen; C 6 ⁇ C 30 Aryl group; O, N, S, Si and P containing at least one heteroatom C 2 ⁇ C 30 A heterocyclic group; C 6 ⁇ C 30 A fused ring group of an aliphatic ring and an aromatic ring; C 1 ⁇ C 20 Alkyl group; C 2 ⁇ C 20 Alkenyl group; C 2 ⁇ C 20 Alkynyl group; C 1 ⁇ C 20 Alkoxy group; C 6 ⁇ C 30 Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C 1 ⁇ C 20 An alkoxycarbonyl group,
  • Y 1 and Y 2 are each independently Formula (E) or Formula (F),
  • R 11 to R 15 are each independently hydrogen; heavy hydrogen; halogen; C 6 ⁇ C 30 Aryl group; O, N, S, Si and P containing at least one heteroatom C 2 ⁇ C 30 A heterocyclic group; C 6 ⁇ C 30 A fused ring group of an aliphatic ring and an aromatic ring; C 1 ⁇ C 20 Alkyl group; C 2 ⁇ C 20 Alkenyl group; C 2 ⁇ C 20 Alkynyl group; C 1 ⁇ C 20 Alkoxy group; C 6 ⁇ C 30 Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C 1 ⁇ C 20 An alkoxycarbonyl group,
  • L 1 ⁇ L 3 are each independently a single bond, C 1 ⁇ C 30 alkylene, C 6 ⁇ C 30 arylene or C 2 ⁇ C 30 heterocycle,
  • R 1 to R 15 , R′, R′′, X 1 to X 2 and L 1 to L 3 and the rings formed by bonding adjacent groups to each other are deuterium; halogen; C 1 to C 30 alkyl group Or C 6 ⁇ C 30 A silane group unsubstituted or substituted with an aryl group; siloxane group; boron group; germanium group; cyano group; amino group; nitro group; C 1 ⁇ C 30 alkylthio group; C 1 ⁇ C 30 Alkoxy group; C 6 ⁇ C 30 Arylalkoxy group; C 1 ⁇ C 30 Alkyl group; C 2 ⁇ C 30 Alkenyl group; C 2 ⁇ C 30 Alkynyl group; C 6 ⁇ C 30 Aryl group; Deuterium Substituted C 6 ⁇ C 30 Aryl group; Fluorenyl group; C 2 ⁇ C 30 Heterocyclic group comprising at least one heteroatom selected from the group consisting of O, N, S, Si and
  • the alkali-soluble resin according to the present invention preferably has a weight average molecular weight of 1,000 to 100,000 g/mol.
  • the ratio of Formula (E) to Formula (F) in the polymer chain of the resin including the repeating unit represented by Formula (1) is preferably 2:0 to 1:1.
  • the reactive unsaturated compound is included in an amount of 1 to 40 wt% based on the total amount of the photocurable composition.
  • the said reactive unsaturated compound contains the compound represented by following formula (2).
  • Z 1 to Z 4 each independently have a structure of Formula (G);
  • the remaining Z 1 to Z 4 are each independently hydrogen, deuterium, halogen, a methyl group, an ethyl group; methyl hydroxy group; C 6 ⁇ C 30 Aryl group; O, N, S, Si and P containing at least one heteroatom C 2 ⁇ C 30 A heterocyclic group; C 6 ⁇ C 30 A fused ring group of an aliphatic ring and an aromatic ring; C 1 ⁇ C 20 Alkyl group; C 2 ⁇ C 20 Alkenyl group; C 2 ⁇ C 20 Alkynyl group; C 1 ⁇ C 20 Alkoxy group; C 6 ⁇ C 30 Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C 1 ⁇ C 20 An alkoxycarbonyl group,
  • t is an integer from 1 to 20,
  • L 4 is a single bond, C 1 ⁇ C 30 alkylene, C 6 ⁇ C 30 arylene or C 2 ⁇ C 30 heterocycle,
  • Y 3 is the following formula (H) or formula (I),
  • R 21 is hydrogen, deuterium, halogen, a methyl group, or an ethyl group; methyl hydroxy group; C 6 ⁇ C 30 Aryl group; O, N, S, Si and P containing at least one heteroatom C 2 ⁇ C 30 A heterocyclic group; C 6 ⁇ C 30 A fused ring group of an aliphatic ring and an aromatic ring; C 1 ⁇ C 20 Alkyl group; C 2 ⁇ C 20 Alkenyl group; C 2 ⁇ C 20 Alkynyl group; C 1 ⁇ C 20 Alkoxy group; C 6 ⁇ C 30 Aryloxy group; fluorenyl group; carbonyl group; ether group; Or a C 1 ⁇ C 20 alkoxycarbonyl group.
  • the photoinitiator is preferably included in an amount of 0.01 to 10% by weight based on the total amount of the photocurable composition.
  • the photoinitiator more preferably includes a compound represented by the following formula (3).
  • u 1 ⁇ u 3 are each independently 0 or an integer of 1,
  • L 5 and L 8 are the following formula (J),
  • L 6 , L 7 and L 9 are each independently a C 6 ⁇ C 30 aryl group; O, N, S, Si and P containing at least one heteroatom C 2 ⁇ C 30 A heterocyclic group; C 6 ⁇ C 30 A fused ring group of an aliphatic ring and an aromatic ring; C 3 ⁇ C 30 An aliphatic group C 1 ⁇ C 20 Alkyl group; C 2 ⁇ C 20 Alkenyl group; C 2 ⁇ C 20 Alkynyl group; C 1 ⁇ C 20 Alkoxy group; C 6 ⁇ C 30 Aryloxy group; fluorenyl group; carbonyl group; ether group; C 1 ⁇ C 20 Alkoxycarbonyl; C 1 ⁇ C 30 Alkylene or C 6 ⁇ C 30 Arylene,
  • R 31 is hydrogen, deuterium, halogen, a methyl group, or an ethyl group; methyl hydroxy group; C 6 ⁇ C 30 Aryl group; O, N, S, Si and P containing at least one heteroatom C 2 ⁇ C 30 A heterocyclic group; C 6 ⁇ C 30 A fused ring group of an aliphatic ring and an aromatic ring; C 1 ⁇ C 20 Alkyl group; C 2 ⁇ C 20 Alkenyl group; C 2 ⁇ C 20 Alkynyl group; C 1 ⁇ C 20 Alkoxy group; C 6 ⁇ C 30 Aryloxy group; fluorenyl group; carbonyl group; ether group; Or a C 1 ⁇ C 20 alkoxycarbonyl group.
  • L 6 , L 7 and L 9 in Formula (3) are each independently one of the following Formulas (K) to (N).
  • A is hydrogen; O; S; silane group; siloxane group; boron group; germanium group; cyano group; nitro group; nitrile group; C 1 ⁇ C 30 Alkyl group, C 6 ⁇ C 30 Aryl group or C 2 ⁇ C 30 A substituted or unsubstituted amino group with a heterocyclic group; C 1 ⁇ C 30 Alkylthio group; C 1 ⁇ C 30 Alkyl group; C 1 ⁇ C 30 Alkoxy group; C 6 ⁇ C 30 Arylalkoxy group; C 2 ⁇ C 30 Alkenyl group; C 2 ⁇ C 30 Alkynyl group; C 6 ⁇ C 30 Aryl group; C 6 ⁇ C 30 Aryl group substituted with deuterium; fluorenyl group; O, N, S, Si and P containing at least one heteroatom selected from the group consisting of C 2 ⁇ C 30 A heterocyclic group; C 3 ⁇ C 30 of an aliphatic ring; C 7 ⁇ C 30 Arylal
  • R 32 to R 34 are each independently hydrogen; heavy hydrogen; halogen; C 6 ⁇ C 30 Aryl group; O, N, S, Si and P containing at least one heteroatom C 2 ⁇ C 30 A heterocyclic group; C 6 ⁇ C 30 A fused ring group of an aliphatic ring and an aromatic ring; C 1 ⁇ C 20 Alkyl group; C 2 ⁇ C 20 Alkenyl group; C 2 ⁇ C 20 Alkynyl group; C 1 ⁇ C 20 Alkoxy group; C 6 ⁇ C 30 Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C 1 ⁇ C 20 An alkoxycarbonyl group,
  • T is S, O or Se.
  • the colorant is preferably included in an amount of 5 to 40% by weight based on the total amount of the photocurable composition.
  • the colorant preferably includes at least one of an inorganic dye, an organic dye, an inorganic pigment, and an organic pigment.
  • the display device preferably includes a first electrode formed on a substrate, a second electrode provided to face the first electrode, and a pattern or film formed of the photocurable composition according to claim 1 . .
  • the pattern is a color part or a color separation part.
  • the electronic device according to the present invention preferably includes the display device according to the present invention and a control unit for driving the display device.
  • the photocurable composition according to an embodiment of the present invention can increase the sensitivity by scattering the light incident by the inorganic nanoparticles in the photocurable composition when forming a pattern using light, thereby forming a pattern with excellent resolution. This can be used to provide a highly reliable display device.
  • FIG. 1 schematically illustrates a display device according to an exemplary embodiment of the present invention.
  • 2 to 5 are diagrams illustrating the measurement of adhesion of patterns prepared according to Examples and Comparative Examples of the present invention.
  • the present invention is an alkali-soluble resin; reactive unsaturated compounds; photoinitiators; Colorant; Inorganic nanoparticles containing at least one of BaSO 4 and Ba(NO 3 ) 2 ; And it provides a photocuring composition comprising a solvent.
  • a component such as a layer, membrane, region, plate, etc.
  • temporal precedence relationship such as “after”, “after”, “after”, “before”, etc.
  • a flow precedence relationship when a flow precedence relationship is described, it may include a case where it is not continuous unless “immediately” or "directly” is used.
  • the numerical values or corresponding information may be caused by various factors (eg process factors, internal or external shock, noise, etc.) It may be interpreted as including a possible error range.
  • halo or halogen includes fluorine (F), chlorine (Cl), bromine (Br), and iodine (I), unless otherwise specified.
  • alkyl or "alkyl group” as used in this application, unless otherwise specified, has 1 to 60 carbons linked by a single bond, straight chain alkyl group, branched chain alkyl group, cycloalkyl (alicyclic) group, alkyl-substituted means a radical of saturated aliphatic functional groups including cycloalkyl groups and cycloalkyl-substituted alkyl groups.
  • haloalkyl group or “halogenalkyl group” refers to an alkyl group substituted with halogen unless otherwise specified.
  • alkenyl or “alkynyl” as used in this application, unless otherwise specified, has a double bond or a triple bond, respectively, includes a straight or branched chain group, and has 2 to 60 carbon atoms, but is limited thereto it is not going to be
  • cycloalkyl refers to an alkyl forming a ring having 3 to 60 carbon atoms, unless otherwise specified, and is not limited thereto.
  • alkoxy group or “alkyloxy group” refers to an alkyl group to which an oxygen radical is bonded, and has 1 to 60 carbon atoms unless otherwise specified, but is not limited thereto.
  • alkenoxyl group refers to an alkenyl group to which an oxygen radical is attached, and unless otherwise specified, 2 to 60 has a carbon number of, but is not limited thereto.
  • aryl group and arylene group used in the present application have 6 to 60 carbon atoms, respectively, unless otherwise specified, but are not limited thereto.
  • the aryl group or the arylene group includes a single ring type, a ring aggregate, a fused multiple ring-based compound, and the like.
  • the aryl group may include a phenyl group, a monovalent functional group of biphenyl, a monovalent functional group of naphthalene, a fluorenyl group, and a substituted fluorenyl group
  • the arylene group may include a fluorenylene group, a substituted fluorenylene group. may include a group.
  • ring assemblies refers to two or more ring systems (single or fused ring systems) directly connected to each other through a single bond or a double bond, and between such rings It means that the number of direct links is one less than the total number of ring systems in the compound. In a ring aggregate, the same or different ring systems may be directly linked to each other through single or double bonds.
  • the aryl group in the present application includes a ring aggregate, the aryl group includes biphenyl and terphenyl in which a single aromatic benzene ring is connected by a single bond.
  • the aryl group includes compounds in which an aromatic single ring and a fused aromatic ring system are connected by a single bond, for example, a compound in which a benzene ring, which is an aromatic single ring, and a fluorene, a fused aromatic ring system, are connected by a single bond are also included. do.
  • fused multiple ring system refers to a fused ring type that shares at least two atoms, and includes a fused ring system of two or more hydrocarbons and at least one heteroatom. and a form in which at least one heterocyclic system is fused.
  • the fused multiple ring system may be an aromatic ring, a heteroaromatic ring, an aliphatic ring, or a combination of these rings.
  • an aryl group it may be a naphthalenyl group, a phenanthrenyl group, a fluorenyl group, etc., but is not limited thereto.
  • spiro compound as used in the present application has a 'spiro union', and the spiro linkage means a connection formed by sharing only one atom in two rings. At this time, the atoms shared by the two rings are called 'spiro atoms', and they are respectively 'monospiro-', 'dispiro-', 'trispiro-', depending on the number of spiro atoms in a compound. ' It's called a compound.
  • fluorenyl group As used herein, the terms “fluorenyl group”, “fluorenylene group”, and “fluorentriyl group” are, unless otherwise specified, in the following structures, R, R', R” and R'” are all hydrogen. It refers to a monovalent, divalent or trivalent functional group, and “substituted fluorenyl group”, “substituted fluorenylene group” or “substituted fluorentriyl group” is a substituent R, R', R", R' "means that at least one of " is a substituent other than hydrogen, and includes cases in which R and R' are bonded to each other to form a spiro compound together with the carbon to which they are bonded.
  • the fluorenyl group, the fluorenylene group, and the fluorentriyl group may all be referred to as fluorene groups regardless of valences such as monovalent, divalent, trivalent, and the like.
  • R, R', R" and R'" are each independently an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, 2 to It may be a heterocyclic group having 30 carbon atoms, for example, the aryl group may be phenyl, biphenyl, naphthalene, anthracene or phenanthrene, and the heterocyclic group may be pyrrole, furan, thiophene, pyrazole, imidazole, triazole, pyridine, pyrimidine, pyridazine, pyrazine, triazine, indole, benzofuran, quinazoline or quinoxaline.
  • the aryl group may be phenyl, biphenyl, naphthalene, anthracene or phenanthrene
  • the heterocyclic group may be pyrrole, furan, thi
  • the substituted fluorenyl group and the fluorenylene group are monovalent to 9,9-dimethylfluorene, 9,9-diphenylfluorene and 9,9'-spirobi[9H-fluorene], respectively. It may be a functional group or a divalent functional group.
  • heterocyclic group used in this application includes not only aromatic rings such as “heteroaryl group” or “heteroarylene group” but also non-aromatic rings, and unless otherwise specified, each carbon number including at least one heteroatom It means a ring of 2 to 60, but is not limited thereto.
  • heteroatom refers to N, O, S, P or Si unless otherwise specified, and the heterocyclic group is a monocyclic group including a heteroatom, a ring aggregate, a fused multiple ring system, a spy means a compound or the like.
  • ring includes monocyclic and polycyclic rings, and includes hydrocarbon rings as well as heterocycles including at least one heteroatom, and includes aromatic and non-aromatic rings.
  • polycyclic includes ring assemblies such as biphenyl, terphenyl, etc., fused multiple ring systems and spiro compounds, and includes aromatic as well as non-aromatic, hydrocarbon Rings include, of course, heterocycles containing at least one heteroatom.
  • aliphatic ring group used in this application means a cyclic hydrocarbon other than an aromatic hydrocarbon, and includes a monocyclic type, a ring aggregate, a fused multiple ring system, a spiro compound, etc., and unless otherwise specified, the number of carbon atoms It means a ring of 3 to 60, but is not limited thereto. For example, even when benzene, which is an aromatic ring, and cyclohexane, which is a non-aromatic ring, are fused, it corresponds to an aliphatic ring.
  • an arylalkoxy group means an alkoxy group substituted with an aryl group
  • an alkoxycarbonyl group means a carbonyl group substituted with an alkoxy group
  • an arylcarbonylalkenyl group means an alkenyl group substituted with an arylcarbonyl group, where The arylcarbonyl group is a carbonyl group substituted with an aryl group.
  • substitution means deuterium, halogen, amino group, nitrile group, nitro group, C 1 ⁇ C 20 alkyl group, C 1 ⁇ C 20 Alkoxy group, C 1 ⁇ C 20 Alkylamine group, C 1 ⁇ C 20 Alkylthiophene group, C 6 ⁇ C 20 Arylthiophene group, C 2 ⁇ C 20 Alkenyl group, C 2 ⁇ C 20 alkynyl group, C 3 ⁇ C 20 cycloalkyl group, C 6 ⁇ C 20 aryl group, C 6 ⁇ C 20 aryl group substituted with deuterium, C 8 ⁇ C 20 arylalkenyl group, silane group, boron A group, a germanium group, and O, N, S, Si and P containing at least one heteroatom selected from the group consisting of C 2 ⁇ C 20 It means substituted with one or
  • the 'functional group name' corresponding to the aryl group, arylene group, heterocyclic group, etc. exemplified as examples of each symbol and its substituents may be described as 'the name of the functional group reflecting the valence', but it is described as 'the name of the parent compound' You may.
  • 'phenanthrene' a type of aryl group, the monovalent 'group' is 'phenanthryl (group)', and the divalent group is 'phenanthrylene (group)', etc. It can be described, but it can also be described as 'phenanthrene', which is the name of the parent compound, regardless of the valence.
  • pyrimidine regardless of the valence, it is described as 'pyrimidine', or if it is monovalent, it is pyrimidinyl (group), and if it is divalent, the 'group of the valence, such as pyrimidinylene (group), etc. It can also be written in the name of '. Accordingly, in the present application, when the type of the substituent is described as the name of the parent compound, it may mean an n-valent 'group' formed by the detachment of a hydrogen atom bonding to a carbon atom and/or a hetero atom of the parent compound.
  • the substituent R 1 means that it does not exist, that is, when a is 0, it means that all hydrogens are bonded to the carbons forming the benzene ring, and in this case, the display of hydrogen bonded to carbon It can be omitted and the chemical formula or compound can be described.
  • R 1 when a is an integer of 1, one substituent R 1 is bonded to any one carbon of the carbons forming the benzene ring, and when a is an integer of 2 or 3, it may be bonded as follows, for example, a is 4 to 6 Even if it is an integer of , it is bonded to the carbon of the benzene ring in a similar manner, and when a is an integer of 2 or more, R 1 may be the same as or different from each other.
  • forming a ring means that adjacent groups combine with each other to form a single ring or fused multiple rings, and the single ring and the formed fused multiple rings are at least one hydrocarbon ring as well as a hydrocarbon ring. It includes heterocycles containing heteroatoms, and may include aromatic and non-aromatic rings.
  • the number in 'number-condensed ring' indicates the number of rings to be condensed.
  • a form in which three rings are condensed with each other, such as anthracene, phenanthrene, benzoquinazoline, etc. may be expressed as a 3-condensed ring.
  • bridged bicyclic compound refers to a compound in which two rings share three or more atoms to form a ring, unless otherwise specified.
  • the shared atom may include carbon or a hetero atom.
  • the organic electric device may mean a component(s) between the anode and the cathode, or may refer to an organic light emitting diode including the anode and the cathode, and the component(s) positioned therebetween.
  • the display device in the present application may mean an organic electric device, an organic light emitting diode, and a panel including the same, or an electronic device including a panel and a circuit.
  • the electronic device includes a lighting device, a solar cell, a portable or mobile terminal (eg, a smart phone, tablet, PDA, electronic dictionary, PMP, etc.), a navigation terminal, a game machine, various TVs, various computer monitors, etc. It may include all, but is not limited thereto, and may be any type of device as long as it includes the component(s).
  • the photocurable composition according to an embodiment of the present invention includes an alkali-soluble resin; reactive unsaturated compounds; photoinitiators; Colorant; Inorganic nanoparticles containing at least one of BaSO 4 and Ba(NO 3 ) 2 ; and solvents.
  • the alkali-soluble resin includes a repeating unit represented by the following formula (1).
  • R 1 and R 2 are each independently hydrogen; heavy hydrogen; halogen; C 6 ⁇ C 30 Aryl group; O, N, S, Si and P containing at least one heteroatom C 2 ⁇ C 30 A heterocyclic group; C 6 ⁇ C 30 A fused ring group of an aliphatic ring and an aromatic ring; C 1 ⁇ C 20 Alkyl group; C 2 ⁇ C 20 Alkenyl group; C 2 ⁇ C 20 Alkynyl group; C 1 ⁇ C 20 Alkoxy group; C 6 ⁇ C 30 Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C 1 ⁇ C 20 An alkoxycarbonyl group,
  • R 1 and R 2 are each capable of forming a ring with an adjacent group
  • a and b are each independently an integer from 0 to 4,
  • X 1 is a single bond, O, CO, SO 2 , CR′R′′, SiR′R′′, Formula (A) or Formula (B); preferably formula (A) or formula (B); More preferably, it is the formula (A),
  • X 2 is a C 6 ⁇ C 30 aryl group; O, N, S, Si and P containing at least one heteroatom C 2 ⁇ C 30 A heterocyclic group; C 6 ⁇ C 30 A fused ring group of an aliphatic ring and an aromatic ring; C 1 ⁇ C 20 Alkyl group; C 2 ⁇ C 20 Alkenyl group; C 2 ⁇ C 20 Alkynyl group; C 1 ⁇ C 20 Alkoxy group; C 6 ⁇ C 30 Aryloxy group; or a combination thereof,
  • R' and R" are each independently hydrogen; deuterium; halogen; C 6 -C 30 Aryl group; O, N, S, Si and P containing at least one heteroatom of C 2 -C 30 Heterocyclic group; C 6 ⁇ C 30 A fused ring group of an aliphatic ring and an aromatic ring; C 1 ⁇ C 20 Alkyl group; C 2 ⁇ C 20 Alkenyl group; C 2 ⁇ C 20 Alkynyl group; C 1 ⁇ C 20 Alkoxy group; C 6 ⁇ C 30 Aryloxy group; Fluorenyl group; Carbonyl group; Ether group; Or C 1 ⁇ C 20 Alkoxycarbonyl group,
  • R' and R" are each capable of forming a ring with an adjacent group
  • a 1 and A 2 are each independently Formula (C) or Formula (D),
  • X 3 is O, S, SO 2 or NR',
  • R' is hydrogen; heavy hydrogen; halogen; C 6 ⁇ C 30 Aryl group; O, N, S, Si and P containing at least one heteroatom C 2 ⁇ C 30 A heterocyclic group; C 6 ⁇ C 30 A fused ring group of an aliphatic ring and an aromatic ring; C 1 ⁇ C 20 Alkyl group; C 2 ⁇ C 20 Alkenyl group; C 2 ⁇ C 20 Alkynyl group; C 1 ⁇ C 20 Alkoxy group; C 6 ⁇ C 30 Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C 1 ⁇ C 20 An alkoxycarbonyl group,
  • R 3 to R 6 are each independently hydrogen; heavy hydrogen; halogen; C 6 ⁇ C 30 Aryl group; O, N, S, Si and P containing at least one heteroatom C 2 ⁇ C 30 A heterocyclic group; C 6 ⁇ C 30 A fused ring group of an aliphatic ring and an aromatic ring; C 1 ⁇ C 20 Alkyl group; C 2 ⁇ C 20 Alkenyl group; C 2 ⁇ C 20 Alkynyl group; C 1 ⁇ C 20 Alkoxy group; C 6 ⁇ C 30 Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C 1 ⁇ C 20 An alkoxycarbonyl group,
  • R 3 to R 6 are each capable of forming a ring with an adjacent group
  • c ⁇ f are integers from 0 to 4 independently of each other.
  • R 7 to R 10 are each independently hydrogen; heavy hydrogen; halogen; C 6 ⁇ C 30 Aryl group; O, N, S, Si and P containing at least one heteroatom C 2 ⁇ C 30 A heterocyclic group; C 6 ⁇ C 30 A fused ring group of an aliphatic ring and an aromatic ring; C 1 ⁇ C 20 Alkyl group; C 2 ⁇ C 20 Alkenyl group; C 2 ⁇ C 20 Alkynyl group; C 1 ⁇ C 20 Alkoxy group; C 6 ⁇ C 30 Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C 1 ⁇ C 20 An alkoxycarbonyl group,
  • Y 1 and Y 2 are each independently Formula (E) or Formula (F).
  • R 11 to R 15 are each independently hydrogen; heavy hydrogen; halogen; C 6 ⁇ C 30 Aryl group; O, N, S, Si and P containing at least one heteroatom C 2 ⁇ C 30 A heterocyclic group; C 6 ⁇ C 30 A fused ring group of an aliphatic ring and an aromatic ring; C 1 ⁇ C 20 Alkyl group; C 2 ⁇ C 20 Alkenyl group; C 2 ⁇ C 20 Alkynyl group; C 1 ⁇ C 20 Alkoxy group; C 6 ⁇ C 30 Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C 1 ⁇ C 20 An alkoxycarbonyl group,
  • L 1 ⁇ L 3 are each independently a single bond, C 1 ⁇ C 30 alkylene, C 6 ⁇ C 30 arylene, or C 2 ⁇ C 30 heterocycle,
  • R 1 to R 15 , R′, R′′, X 1 to X 2 and L 1 to L 3 and the rings formed by bonding adjacent groups to each other are deuterium; halogen; C 1 to C 30 alkyl group Or C 6 ⁇ C 30 A silane group unsubstituted or substituted with an aryl group; siloxane group; boron group; germanium group; cyano group; amino group; nitro group; C 1 ⁇ C 30 alkylthio group; C 1 ⁇ C 30 Alkoxy group; C 6 ⁇ C 30 Arylalkoxy group; C 1 ⁇ C 30 Alkyl group; C 2 ⁇ C 30 Alkenyl group; C 2 ⁇ C 30 Alkynyl group; C 6 ⁇ C 30 Aryl group; Deuterium Substituted C 6 ⁇ C 30 Aryl group; Fluorenyl group; C 2 ⁇ C 30 Heterocyclic group comprising at least one heteroatom selected from the group consisting of O, N, S, Si and
  • R 1 to R 15 , R′, R′′ and X 1 to X 2 are an aryl group, preferably a C 6 to C 30 aryl group, more preferably a C 6 to C 18 aryl group, such as phenyl , biphenyl, naphthyl, terphenyl, and the like.
  • a heterocyclic group Preferably a C 2 ⁇ C 30 heterocyclic group, more preferably a C 2 ⁇ C 18 heterocyclic group, such as dibenzofuran, dibenzothiophene, naphthobenzothiophene, naphthobenzofuran, etc. .
  • R 1 to R 15 , R′, R′′ and X 1 to X 2 are fluorenyl groups, preferably 9,9-dimethyl-9H-fluorene, 9,9-diphenyl-9H-flu orenyl group, 9,9'-spirobifluorene, and the like.
  • L 1 to L 3 is an arylene group, it may be preferably a C 6 to C 30 arylene group, more preferably a C 6 to C 18 arylene group, such as phenyl, biphenyl, naphthyl, terphenyl, and the like. there is.
  • R 1 to R 15 , R′ and R′′ are an alkyl group, it may be preferably a C 1 to C 10 alkyl group, for example, methyl, t-butyl, or the like.
  • R 1 to R 15 , R′ and R′′ are an alkoxyl group, preferably a C 1 to C 20 alkoxyl group, more preferably a C 1 to C 10 alkoxyl group, such as methoxy, t-part Toxic, etc. may be used.
  • the R 1 to R 15 , R′, R′′, X 1 to X 2 and L 1 A ring formed by bonding to each other is a C 6 to C 60 aromatic ring group; fluorenyl group; O, N, A C 2 ⁇ C 60 heterocyclic group comprising at least one heteroatom of S, Si and P; or a C 3 ⁇ C 60 aliphatic ring group, for example, adjacent groups are bonded to each other to form an aromatic ring
  • a C 6 ⁇ C 20 aromatic ring more preferably a C 6 ⁇ C 14 aromatic ring, such as benzene, naphthalene, phenanthrene, etc. may be formed.
  • the ratio of Formula (E) to Formula (F) in the polymer chain of the resin including the repeating unit represented by Formula (1) is preferably 2:0 to 1:1, most preferably 1.5:0.5 am.
  • the ratio of the formula (F) is higher than the ratio of the formula (E), a residue may be generated due to the too high adhesion, the amount of outgas generated may also be significantly increased, and the ratio of the formula (E) to the formula (F) is 1.5 : When it is 0.5, the resolution of the pattern is the best and the amount of outgas can be satisfied.
  • the weight average molecular weight of the resin of the present invention may be 1,000 to 100,000 g/mol, preferably 1,000 to 50,000 g/mol, and more preferably 1,000 to 30,000 g/mol.
  • the pattern can be well formed without a residue when the pattern layer is manufactured, there is no loss of film thickness during development, and a good pattern can be obtained.
  • the resin may be included in an amount of 1 to 30% by weight, more preferably 3 to 20% by weight, based on the total amount of the photocurable composition.
  • excellent sensitivity, developability, and adhesion (adhesion) can be obtained.
  • the photocurable composition may further include an acrylic resin in addition to the resin.
  • the acrylic resin is a copolymer of a first ethylenically unsaturated monomer and a second ethylenically unsaturated monomer copolymerizable therewith, and may be a resin including one or more acrylic repeating units.
  • the acrylic resin may be a copolymer of ethylenically unsaturated monomers including 2 to 10 types of acrylates and methacrylates, and may have a weight average molecular weight of 5,000 to 30,000 g/mol.
  • the photocurable composition according to an embodiment of the present invention may include a reactive unsaturated compound having a structure as shown in Formula (2) below.
  • Z 1 to Z 4 each independently have a structure of Formula (G);
  • the remaining Z 1 to Z 4 are each independently hydrogen, deuterium, halogen, a methyl group, an ethyl group; methyl hydroxy group; C 6 ⁇ C 30 Aryl group; O, N, S, Si and P containing at least one heteroatom C 2 ⁇ C 30 A heterocyclic group; C 6 ⁇ C 30 A fused ring group of an aliphatic ring and an aromatic ring; C 1 ⁇ C 20 Alkyl group; C 2 ⁇ C 20 Alkenyl group; C 2 ⁇ C 20 Alkynyl group; C 1 ⁇ C 20 Alkoxy group; C 6 ⁇ C 30 Aryloxy group; fluorenyl group; carbonyl group; ether group; Or a C 1 ⁇ C 20 alkoxycarbonyl group.
  • t is an integer from 1 to 20,
  • L 4 is a single bond, C 1 ⁇ C 30 alkylene, C 6 ⁇ C 30 arylene or C 2 ⁇ C 30 heterocycle,
  • Y 3 is the following formula (H) or formula (I).
  • R 21 is hydrogen, deuterium, halogen, a methyl group, or an ethyl group; methyl hydroxy group; C 6 ⁇ C 30 Aryl group; O, N, S, Si and P containing at least one heteroatom C 2 ⁇ C 30 A heterocyclic group; C 6 ⁇ C 30 A fused ring group of an aliphatic ring and an aromatic ring; C 1 ⁇ C 20 Alkyl group; C 2 ⁇ C 20 Alkenyl group; C 2 ⁇ C 20 Alkynyl group; C 1 ⁇ C 20 Alkoxy group; C 6 ⁇ C 30 Aryloxy group; fluorenyl group; carbonyl group; ether group; Or a C 1 ⁇ C 20 alkoxycarbonyl group.
  • the multi-acrylic compound having the structure as in Formula (2) may be used alone or in combination of two or more.
  • Examples thereof include polyfunctional esters of (meth)acrylic acid having at least two ethylenically unsaturated double bonds.
  • (meth)acrylic acid may refer to methacrylic acid, acrylic acid, or a mixture of methacrylic acid and acrylic acid.
  • the reactive unsaturated compound has the ethylenically unsaturated double bond, it is possible to form a pattern excellent in heat resistance, light resistance and chemical resistance by causing sufficient polymerization during exposure to light in the pattern forming process.
  • the reactive unsaturated compound examples include ethylene glycol diacrylate, ethylene glycol dimethacrylate, diethylene glycol diacrylate, triethylene glycol diacrylate, triethylene glycol dimethacrylate, and 1,6-hexanediol.
  • bifunctional ester of (meth)acrylic acid examples include Aronix M-210, M-240, M-6200 of Toagosei Chemical Co., Ltd., and KAYARAD HDDA, HX- of Nihon Kayaku Co., Ltd. 220, R-604, etc., and V-260, V-312, V-335 HP of Osaka Yuki Chemical High School Co., Ltd. are mentioned.
  • the reactive unsaturated compound may be used after treatment with an acid anhydride in order to provide better developability than .
  • the reactive unsaturated compound may be included in an amount of 1 to 40 wt%, preferably 1 to 20 wt%, based on the total amount of the photocurable composition. When the reactive unsaturated compound is included within the above range, curing occurs sufficiently during exposure in the pattern forming process, and thus reliability is excellent, heat resistance, light resistance and chemical resistance of the pattern are excellent, and resolution and adhesion are also excellent.
  • the photoinitiator is a photoinitiator having a maximum molar absorption coefficient in the region of 320 to 380 nm of 10,000 (L/mol ⁇ cm) or more and a loss of 5% by weight occurs at 200° C. or less.
  • the maximum molar extinction coefficient in the region of 320 to 380 nm may be calculated by the beer-Lambert Law.
  • weight loss was measured by raising the temperature to 300 °C at a rate of 5 °C per minute in a nitrogen atmosphere using TGA.
  • the photocurable composition according to an embodiment of the present invention includes a photoinitiator having a structure as shown in Formula (3) below.
  • u 1 ⁇ u 3 are each independently 0 or an integer of 1,
  • L 5 and L 8 are the following formula (J),
  • L 6 , L 7 and L 9 are each independently a C 6 ⁇ C 30 aryl group; O, N, S, Si and P containing at least one heteroatom C 2 ⁇ C 30 A heterocyclic group; C 6 ⁇ C 30 A fused ring group of an aliphatic ring and an aromatic ring; C 3 ⁇ C 30 An aliphatic group C 1 ⁇ C 20 Alkyl group; C 2 ⁇ C 20 Alkenyl group; C 2 ⁇ C 20 Alkynyl group; C 1 ⁇ C 20 Alkoxy group; C 6 ⁇ C 30 Aryloxy group; fluorenyl group; carbonyl group; ether group; C 1 ⁇ C 20 Alkoxycarbonyl; C 1 ⁇ C 30 Alkylene or C 6 ⁇ C 30 Arylene.
  • R 31 is hydrogen, deuterium, halogen, a methyl group, or an ethyl group; methyl hydroxy group; C 6 ⁇ C 30 Aryl group; O, N, S, Si and P containing at least one heteroatom C 2 ⁇ C 30 A heterocyclic group; C 6 ⁇ C 30 A fused ring group of an aliphatic ring and an aromatic ring; C 1 ⁇ C 20 Alkyl group; C 2 ⁇ C 20 Alkenyl group; C 2 ⁇ C 20 Alkynyl group; C 1 ⁇ C 20 Alkoxy group; C 6 ⁇ C 30 Aryloxy group; fluorenyl group; carbonyl group; ether group; Or a C 1 ⁇ C 20 alkoxycarbonyl group.
  • L 6 , L 7 and L 9 of Formula (3) are each independently one of the following Formulas (K) to (N).
  • A is hydrogen; O; S; silane group; siloxane group; boron group; germanium group; cyano group; nitro group; nitrile group; C 1 ⁇ C 30 Alkyl group, C 6 ⁇ C 30 Aryl group or C 2 ⁇ C 30 A substituted or unsubstituted amino group with a heterocyclic group; C 1 ⁇ C 30 Alkylthio group; C 1 ⁇ C 30 Alkyl group; C 1 ⁇ C 30 Alkoxy group; C 6 ⁇ C 30 Arylalkoxy group; C 2 ⁇ C 30 Alkenyl group; C 2 ⁇ C 30 Alkynyl group; C 6 ⁇ C 30 Aryl group; C 6 ⁇ C 30 Aryl group substituted with deuterium; fluorenyl group; O, N, S, Si and P containing at least one heteroatom selected from the group consisting of C 2 ⁇ C 30 A heterocyclic group; C 3 ⁇ C 30 of an aliphatic ring; C 7 ⁇ C 30 Arylal
  • R 32 to R 34 are each independently hydrogen; heavy hydrogen; halogen; C 6 ⁇ C 30 Aryl group; O, N, S, Si and P containing at least one heteroatom C 2 ⁇ C 30 A heterocyclic group; C 6 ⁇ C 30 A fused ring group of an aliphatic ring and an aromatic ring; C 1 ⁇ C 20 Alkyl group; C 2 ⁇ C 20 Alkenyl group; C 2 ⁇ C 20 Alkynyl group; C 1 ⁇ C 20 Alkoxy group; C 6 ⁇ C 30 Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C 1 ⁇ C 20 An alkoxycarbonyl group,
  • T is S, O or Se.
  • the oxime ester-based compound of Formula (3) may be used alone or in a mixture of two or more.
  • the initiator that can be mixed with the oxime ester-based compound is an initiator used in the photocuring composition, for example, an acetophenone-based compound, a benzophenone-based compound, a thioxanthone-based compound, a benzoin-based compound, a triazine-based compound, etc. can be used
  • acetophenone-based compound examples include 2,2'-diethoxy acetophenone, 2,2'-dibutoxy acetophenone, 2-hydroxy-2-methylpropiophenone, p-t-butyltrichloroacetophenone, p-t-Butyldichloro acetophenone, 4-chloro acetophenone, 2,2'-dichloro-4-phenoxy acetophenone, 2-methyl-1- (4- (methylthio) phenyl) -2-morpholinopropane- 1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one, and the like.
  • benzophenone-based compound examples include benzophenone, benzoyl benzoic acid, methyl benzoyl benzoate, 4-phenyl benzophenone, hydroxy benzophenone, acrylated benzophenone, 4,4'-bis(dimethyl amino)benzophenone, 4,4 '-bis(diethylamino)benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone, etc. are mentioned.
  • thioxanthone-based compound examples include thioxanthone, 2-chlorothioxanthone, 2-methylthioxanthone, isopropyl thioxanthone, 2,4-diethyl thioxanthone, 2,4-diiso and propyl thioxanthone and 2-chlorothioxanthone.
  • benzoin-based compound examples include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, and benzyldimethyl ketal.
  • triazine-based compound examples include 2,4,6-trichloro-s-triazine, 2-phenyl 4,6-bis(trichloromethyl)-s-triazine, 2-(3', 4'- Dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-triazine; 2-biphenyl 4,6-bis(trichloromethyl)-s-triazine, bis(trichloromethyl)-6-styryl-s-triazine, 2-(naphtho1-yl)-4,6 -bis(trichloromethyl)
  • a carbazole-based compound As the initiator, a carbazole-based compound, a diketone-based compound, a sulfonium borate-based compound, a diazo-based compound, an imidazole-based compound, or a biimidazole-based compound may be used in addition to the above compound.
  • a peroxide-based compound, an azobis-based compound, or the like may be used as a radical polymerization initiator.
  • peroxide compound examples include ketone peroxides such as methyl ethyl ketone peroxide, methyl isobutyl ketone peroxide, cyclohexanone peroxide, methylcyclohexanone peroxide, and acetylacetone peroxide; diacyl peroxides such as isobutyryl peroxide, 2,4-dichlorobenzoyl peroxide, o-methylbenzoyl peroxide, and bis-3,5,5-trimethylhexanoyl peroxide; hydroperoxides such as 2,4,4,-trimethylpentyl-2-hydroperoxide, diisopropylbenzenehydroperoxide, cumene hydroperoxide, and t-butylhydroperoxide; Dicumyl peroxide, 2,5-dimethyl-2,5-di(t-butylperoxy)hexane, 1,3-bis(t-butyloxyisopropyl)
  • azobis-based compound examples include 1,1'-azobiscyclohexane-1-carbonitrile, 2,2'-azobis(2,4-dimethylvaleronitrile), 2,2,-azobis( methylisobutyrate), 2,2′-azobis(4-methoxy-2,4-dimethylvaleronitrile), ⁇ , ⁇ ′-azobis(isobutylnitrile) and 4,4′-azobis(4 -Cyanovaleic acid) and the like.
  • the photoinitiator may be used together with a photosensitizer that causes a chemical reaction by absorbing light to enter an excited state and then transferring the energy.
  • a photosensitizer that causes a chemical reaction by absorbing light to enter an excited state and then transferring the energy.
  • the photosensitizer include tetraethylene glycol bis-3-mercaptopropionate, pentaerythritol tetrakis-3-mercaptopropionate, dipentaerythritol tetrakis-3-mercaptopropionate, and the like. can be heard
  • the maximum molar absorption coefficient in the 320 to 380 nm region of the photoinitiator is preferably 10,000 (L/mol ⁇ cm) or more, more preferably 5,000 to 40,000 (L/mol ⁇ cm).
  • the maximum molar extinction coefficient in the region of 320 to 380 nm of the photoinitiator is 5,000 to 40,000 (L/mol ⁇ cm)
  • the temperature of the photoinitiator to lose 5% by weight is preferably 200° C. or less, and more preferably 150 to 200° C.
  • the 5 wt% reduction temperature of the photoinitiator is 150 to 200 ° C, there is an advantage of showing a low outgas in the finally formed pattern, when it is less than 150 ° C, there is a problem in storage stability, and when it is 200 ° C or more, low reliability due to high outgas There is a visible problem.
  • the photoinitiator may be included in an amount of 0.01 to 10% by weight, for example 0.1 to 5% by weight, based on the total amount of the photocurable composition.
  • the photoinitiator is included within the above range, curing occurs sufficiently during exposure in the pattern formation process to obtain excellent reliability, and the pattern has excellent heat resistance, light resistance and chemical resistance, and excellent resolution and adhesion, and A decrease in transmittance can be prevented.
  • pigments such as pigments and dyes may be used independently or together, and both organic pigments and inorganic pigments may be used as the pigments.
  • the pigment includes a red pigment, a green pigment, a blue pigment, a yellow pigment, and a black pigment.
  • the pigments may be used alone or in combination of two or more, and the examples are not limited thereto.
  • red pigment examples include C.I. Red pigment 254, C.I. Red pigment 255, C.I. Red pigment 264, C.I. Red pigment 270, C.I. Red pigment 272, C.I. Red pigment 177, C.I. Red pigment 89 etc. are mentioned.
  • green pigment examples include C.I. Green pigment 36, C.I. and halogen-substituted copper phthalocyanine pigments such as green pigment 7 and the like.
  • blue pigment examples include C.I. Blue pigment 15:6, C.I. Blue pigment 15, C.I. Blue pigment 15:1, C.I. Blue pigment 15:2, C.I. Blue pigment 15:3, C.I. Blue pigment 15:4, C.I. Blue pigment 15:5, C.I. and copper phthalocyanine pigments such as blue pigment 16.
  • yellow pigment examples include C.I. isoindoline pigments such as yellow pigment 139, C.I. quinophthalone-based pigments such as yellow pigment 138, C.I. Nickel complex pigments, such as yellow pigment 150, etc. are mentioned.
  • black pigment examples include benzofuranone black, lactam black, aniline black, perylene black, titanium black, carbon black, and the like.
  • a dispersant may be used together to disperse the pigment in the photocurable composition.
  • the pigment may be used by surface treatment in advance with a dispersant, or a dispersant may be added together with the pigment when the photocurable composition is prepared.
  • a dispersant a nonionic dispersant, an anionic dispersant, a cationic dispersant, etc. may be used.
  • dispersant examples include polyalkylene glycol and its esters, polyoxyalkylene, polyalcohol ester alkylene oxide adduct, alcohol alkylene oxide adduct, sulfonic acid ester, sulfonic acid salt, carboxylic acid ester, carboxylic acid salts, alkylamide alkylene oxide adducts, alkyl amines, and the like, and these may be used alone or in combination of two or more.
  • Examples of commercially available products of the dispersant include BYK's DISPERBYK-101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161, DISPERBYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-165, DISPERBYK -166, DISPERBYK-170, DISPERBYK-171, DISPERBYK-182, DISPERBYK-2000, DISPERBYK-2001 and BASF's EFKA-47, EFKA-47EA, EFKA-48, EFKA-49, EFKA-100, EFKA-400, EFKA-450 and Zeneka's Solsperse 5000, Solsperse 12000, Solsperse 13240, Solsperse 13940, Solsperse 17000, Solsperse 20000, Solsperse 24000GR, Solsper
  • the dispersant may be included in an amount of 0.1 to 15% by weight based on the total amount of the photocurable composition.
  • the dispersant is included within the above range, the dispersibility of the photocurable composition is excellent, and thus, stability, developability, and patternability are excellent in manufacturing the light blocking layer.
  • the pigment may be used after pre-treatment using a water-soluble inorganic salt and a wetting agent.
  • the primary particle size of the pigment can be refined.
  • the pretreatment may be performed by kneading the pigment with a water-soluble inorganic salt and a wetting agent, and filtering and washing the pigment obtained in the kneading step.
  • the kneading may be performed at a temperature of 40° C. to 100° C., and the filtration and washing may be performed by filtration after washing the inorganic salt with water or the like.
  • water-soluble inorganic salt examples include, but are not limited to, sodium chloride and potassium chloride.
  • the wetting agent serves as a medium through which the pigment and the water-soluble inorganic salt are uniformly mixed and the pigment can be easily pulverized, for example, ethylene glycol monoethyl ether, propylene glycol monomethyl ether, diethylene glycol monomethyl ether, etc. alkylene glycol monoalkyl ethers; and alcohols such as ethanol, isopropanol, butanol, hexanol, cyclohexanol, ethylene glycol, diethylene glycol, polyethylene glycol, glycerin polyethylene glycol, and the like, and these may be used alone or in combination of two or more.
  • the pigment that has undergone the kneading step may have an average particle diameter of 20 nm to 110 nm.
  • the average particle diameter of the pigment is within the above range, it is possible to effectively form a fine pattern while having excellent heat resistance and light resistance.
  • C.I. As a solvent dye, C.I. yellow dyes such as solvent yellow 4, 14, 15, 16, 21, 23, 24, 38, 56, 62, 63, 68, 79, 82, 93, 94, 98, 99, 151, 162, 163; C.I. red dyes such as solvent red 8, 45, 49, 89, 111, 122, 125, 130, 132, 146, 179; C.I. orange dyes such as solvent orange 2, 7, 11, 15, 26, 41, 45, 56, 62; C.I. blue dyes such as solvent blue 5, 35, 36, 37, 44, 59, 67, and 70; C.I. violet dyes such as solvent violet 8, 9, 13, 14, 36, 37, 47, 49; C.I. Green dyes, such as solvent green 1, 3, 4, 5, 7, 28, 29, 32, 33, 34, 35, etc. are mentioned.
  • C.I. yellow dyes such as solvent yellow 4, 14, 15, 16, 21, 23, 24, 38, 56, 62, 63, 68, 79, 82,
  • C.I. Among solvent dyes, C.I. Solvent Yellow 14, 16, 21, 56, 151, 79, 93; C.I. Solvent Red 8, 49, 89, 111, 122, 132, 146, 179; C.I. Solvent Orange 41, 45, 62; C.I. Solvent Blue 35, 36, 44, 45, 70; C.I. Solvent Violet 13 is preferred.
  • C.I. Solvent Yellow 21, 79; C.I. Solvent Red 8, 122, 132; C.I. Solvent orange 45 and 62 are more preferable.
  • C.I. As an acid dye, C.I. Acid Yellow 1, 3, 7, 9, 11, 17, 23, 25, 29, 34, 36, 38, 40, 42, 54, 65, 72, 73, 76, 79, 98, 99, 111, 112, 113, 114, 116, 119, 123, 128, 134, 135, 138, 139, 140, 144, 150, 155, 157, 160, 161, 163, 168, 169, 172, 177, 178, 179, 184, 190, 193, 196, 197, 199, 202, 203, 204, 205, 207, 212, 214, 220, 221, 228, 230, 232, 235, 238, 240, 242, 243, 251, etc.
  • C.I. Acid Yellow 42 which has excellent solubility in organic solvents among the acid dyes; C.I. Acid Red 92; C.I. Acid Blue 80, 90; C.I. Acid Violet 66; C.I. Acid Green 27 is preferred.
  • C.I. Direct Yellow 2 33, 34, 35, 38, 39, 43, 47, 50, 54, 58, 68, 69, 70, 71, 86, 93, 94, 95, 98, yellow dyes such as 102, 108, 109, 129, 136, 138 and 141; C.I.
  • Green dyes such as C.I. direct green 25, 27, 31, 32, 34, 37, 63, 65, 66, 67, 68, 69, 72, 77, 79, 82, etc. are mentioned.
  • C.I. As the modant dye, yellow dyes such as C.I. modant yellow 5, 8, 10, 16, 20, 26, 30, 31, 33, 42, 43, 45, 56, 61, 62, 65; C.I. modant red 1, 2, 3, 4, 9, 11, 12, 14, 17, 18, 19, 22, 23, 24, 25, 26, 30, 32, 33, 36, 37, 38, 39, red dyes such as 41, 43, 45, 46, 48, 53, 56, 63, 71, 74, 85, 86, 88, 90, 94, 95; C.I. Modant Orange 3, 4, 5, 8, 12, 13, 14, 20, 21, 23, 24, 28, 29, 32, 34, 35, 36, 37, 42, 43, 47, 48, etc. orange dyes; C.I.
  • modant blue 1, 2, 3, 7, 8, 9, 12, 13, 15, 16, 19, 20, 21, 22, 23, 24, 26, 30, 31, 32, 39, 40, 41, blue dyes such as 43, 44, 48, 49, 53, 61, 74, 77, 83, 84; purple dyes such as C.I. modant violet 1, 2, 4, 5, 7, 14, 22, 24, 30, 31, 32, 37, 40, 41, 44, 45, 47, 48, 53, 58; Green dyes, such as C.I. modant green 1, 3, 4, 5, 10, 15, 19, 26, 29, 33, 34, 35, 41, 43, 53, etc. are mentioned.
  • each of the dyes may be used alone or in combination of two or more.
  • the pigment and dye may be included in an amount of 5 to 40% by weight, more specifically 8 to 30% by weight, based on the total amount of the photocurable composition.
  • the pigment When the pigment is included within the above range, it has an absorbance of 0.5/ ⁇ m or more at a wavelength of 550 nm, and has excellent curability and adhesion of the pattern.
  • the photocurable composition according to an embodiment of the present invention includes inorganic nanoparticles, and the inorganic nanoparticles are included in an amount of 20 wt% or less (excluding solvent) based on the total amount of the photocurable composition.
  • the inorganic nanoparticles may be included in an amount of 0.1 wt% to 20 wt% based on the total amount of the photocurable composition.
  • the photoinitiator may be further activated by scattering the light incident on the inorganic nanoparticles in the exposure step during the photolithography process.
  • the photoinitiator further activated by the inorganic nanoparticles increases the resolution and curing degree of the pattern, and also reduces the amount of unreacted photoinitiator in the photocurable composition, thereby reducing the amount of outgas generated by the unreacted initiator.
  • the inorganic nanoparticles When included in an amount of less than 0.1% by weight based on the total amount of the photocurable composition, the effect of scattering incident light during the exposure process to further activate the photoinitiator does not occur, and the inorganic nanoparticles do not contain the total amount of the photocurable composition When included in an amount of 20% by weight or more, the viscosity of the photocurable composition increases and dispersion stability is lowered, which may be undesirable because of a problem in that the storage period of the photocurable composition is shortened.
  • the inorganic nanoparticles may have an average particle diameter of 10 to 1000 nm, and preferably have an average particle diameter of 15 to 500 nm. When the average particle diameter of the inorganic nanoparticles is included in the range of 15 to 500 nm, the effect of effectively scattering light during exposure to increase the sensitivity is preferable.
  • the inorganic nanoparticles may include a compound formed by a combination of a cation and an anion.
  • the cation may be one of Mg, Ba, Zr, and Ti, but is not limited thereto.
  • the anion may be one of sulfate and nitrate, but is not limited thereto.
  • the inorganic nanoparticles may include one or more selected from TiO 2 , BaSO 3 , BaSO 4 , Ba(NO 3 ) 2 , ZrO 2 , and BaTiO 3 , and among them, BaSO 4 or Ba(NO 3 ) 2 . It is preferable to do
  • the inorganic nanoparticles may have a structure of a core and a shell, and may be alloyed with each other.
  • the surface of the inorganic nanoparticles may be treated with an inorganic material or an organic material to be dissolved or dispersed in an organic solvent.
  • the inorganic nanoparticles may be mixed with the colorant, dispersant, resin and organic solvent to prepare a dispersion, and the photocurable composition of the present invention may include the dispersion.
  • the solvent materials having compatibility with the alkali-soluble resin, the reactive unsaturated compound, the colorant, and the photoinitiator but not reacting may be used.
  • the solvent examples include alcohols such as methanol and ethanol; ethers such as dichloroethyl ether, n-butyl ether, diisoamyl ether, methylphenyl ether, and tetrahydrofuran; glycol ethers such as ethylene glycol monomethyl ether and ethylene glycol monoethyl ether; cellosolve acetates such as methyl cellosolve acetate, ethyl cellosolve acetate, and diethyl cellosolve acetate; carbitols such as methylethyl carbitol, diethyl carbitol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, and diethylene glycol diethyl ether; propylene glycol alkyl ether acetates such as propylene glycol methyl ether acetate and propy
  • glycol ethers such as ethylene glycol monoethyl ether; ethylene glycol alkyl ether acetates such as ethyl cellosolve acetate; esters such as ethyl 2-hydroxypropionate; carbitols such as diethylene glycol monomethyl ether; Propylene glycol alkyl ether acetates such as propylene glycol methyl ether acetate and propylene glycol propyl ether acetate can be used.
  • the solvent may be included as a balance based on the total amount of the photocurable composition, and specifically may be included in an amount of 50 to 90% by weight. When the solvent is included within the above range, since the photocurable composition has an appropriate viscosity, processability is excellent in manufacturing the pattern layer.
  • another embodiment of the present invention may provide a display device.
  • a display device includes a first electrode 4 formed on a substrate 1 and a second electrode installed opposite to the first electrode ( 7) and a display device comprising a pattern or film formed of the photocurable composition according to the present invention, wherein the pattern or film is a photocurable polymer comprising a structural unit represented by Formula (1) as an essential component formed into a composition.
  • the photocurable composition is the same as the photocurable composition according to the above-described embodiments of the present invention, it will be omitted.
  • the display device may include an organic light emitting device and a color filter, and a color filter may be formed on the organic light emitting device by using the photocurable composition of the present invention.
  • the organic light emitting device may be divided into a red organic light emitting device, a green organic light emitting device, a blue organic light emitting device, an orange organic light emitting device, and a white organic light emitting device by the pixel separation unit 5 .
  • a first electrode, an organic layer 6 and a second electrode may be sequentially stacked, and a sealing layer 8 including organic and inorganic materials is formed on the second electrode to protect from moisture and oxygen. can be blocked
  • the color filter may be positioned on the sealing layer and include a color part 10 aligned in a vertical direction with the organic light emitting device and a color separation part 11 separating the color part.
  • the photocurable composition of the present invention is included in the color part or the color separation part to narrow the wavelength range of light emitted from the organic light emitting device to improve color purity, and to block light incident from the outside of the organic light emitting device for outdoor visibility can improve
  • the photocurable composition of the present invention may include a red pigment or a red dye to form a red color part vertically aligned with the red organic light emitting diode.
  • the photocurable composition of the present invention may include a green pigment or a green dye to form a green color part vertically aligned with the green organic light emitting diode.
  • the photocurable composition of the present invention may include a blue pigment or a blue dye to form a blue color part vertically aligned with the blue organic light emitting diode.
  • the photocurable composition of the present invention may include a black pigment or a black dye to form a color separation unit vertically aligned with the pixel separation unit.
  • the color part or the color separation part of the color filter is formed using the photocurable composition of the present invention, it has a low outgassing amount and can form a pattern of a fine size, so that a color filter with high resolution can be manufactured.
  • the display device may include a TFT layer 3 including a TFT (Thin Film Transistor: 2) between the substrate 1 and the first electrode 4, and includes a flattening layer 12 on the TFT layer. can do. Between the sealing layer 8 and the color filter, such as a TSP (Touch Screen Panel: 9) layer, various functional layers that allow the display device to be touched and manipulated may be included.
  • TFT Thin Film Transistor
  • TSP Touch Screen Panel: 9
  • the photocurable composition of the present invention may be patterned on the TSP layer to form a color filter.
  • the composition of the present invention may be patterned on the TSP layer to form a color part or a color separation part, and may be included in both the color part and the curlie separation part at the same time.
  • Synthesis Example 16 (Polymer 2-1) Synthesis Example 17 (Polymer 2-2) Synthesis Example 18 (Polymer 2-3) Synthesis Example 19 (Polymer 2-4) Synthesis example 20 (Polymer 2-5) Synthesis example 21 (Polymer 2-6) Synthesis Example 22 (Polymer 2-7) polymer backbone Polymer 1-1 Polymer 1-2 Polymer 1-3 Polymer 1-4 Polymer 1-5 Polymer 1-6 Polymer 1-7 silane group compound 3-7 compound 3-7 compound 3-7 compound 3-7 compound 3-7 compound 3-7 compound 3-7 weight average Molecular Weight 4,880 g/mol 4,250 g/mol 4,680 g/mol 4,430 g/mol 4,140 g/mol 5,270 g/mol 3,320 g/mol
  • Synthesis example 23 (Polymer 3-1) Synthesis example 24 (Polymer 3-2) Synthesis example 25 (Polymer 3-3) Synthesis example 26 (Polymer 3-4) Synthesis example 27 (Polymer 3-5) Synthesis example 28 (Polymer 3-6) Synthesis example 29 (Polymer 3-7) polymer backbone Polymer 1-1 Polymer 1-2 Polymer 1-3 Polymer 1-4 Polymer 1-5 Polymer 1-6 Polymer 1-7 silane group compound 3-1 compound 3-1 compound 3-1 compound 3-1 compound 3-1 compound 3-1 compound 3-1 weight average Molecular Weight 4,900 g/mol 4,280 g/mol 4,690 g/mol 4,470 g/mol 4,160 g/mol 5,290 g/mol 3,360 g/mol
  • Synthesis example 30 (Polymer 4-1) Synthesis example 31 (Polymer 4-2) Synthesis example 32 (Polymer 4-3) Synthesis example 33 (Polymer 4-4) Synthesis example 34 (Polymer 4-5) Synthesis example 35 (Polymer 4-6) Synthesis example 36 (Polymer 4-7) polymer backbone Polymer 1-1 Polymer 1-2 Polymer 1-3 Polymer 1-4 Polymer 1-5 Polymer 1-6 Polymer 1-7 silane group compound 3-4 compound 3-4 compound 3-4 compound 3-4 compound 3-4 compound 3-4 compound 3-4 compound 3-4 weight average Molecular Weight 4,900 g/mol 4,290 g/mol 4,690 g/mol 4,480 g/mol 4,180 g/mol 5,290 g/mol 3,380 g/mol
  • Irgaphor Red BT-CF red pigment/BASF 15g
  • Disperbyk 163 8.5g
  • BYK Disperbyk 163 8.5g
  • a dispersion was prepared in the same manner as in Preparation Example 1, except that 0.5 g of Ba(NO 3 ) 2 inorganic nanoparticles prepared in Synthesis Example 39 was additionally added.
  • Photocurable composition solutions were prepared with the composition shown in Table 5 below.
  • Example 12 Red pigment dispersion of Preparation Example 1 30 30 - - - - - - - - - - - - - - Red pigment dispersion of Preparation Example 2 - - 30.2 30.2 30.2 30.2 30.2 30.2 30.2 30.2 30.2 30.2 30.2 BaSO 4 Inorganic Nanoparticles 0.2 - - - - - - - - - - - - Ba(NO 3 ) 2 inorganic nanoparticles - 0.2 - - - - - - - -
  • Photocurable composition solutions were prepared with the composition shown in Table 6 below.
  • a method of manufacturing a pattern using the composition solution according to Tables 5 and 6 is as follows (photolithography step).
  • the above-mentioned red photocurable composition was applied to a washed 10cm*10cm ITO/Ag substrate to a thickness of 1.5 ⁇ m using a spin coater, and then heated at 100° C. for 1 minute to remove the solvent to form a coating film.
  • a mask of a predetermined shape was interposed, and then actinic rays of 190 nm to 500 nm were irradiated.
  • the exposure machine was MA-6, and the exposure amount was 100 mJ/cm 2 .
  • the image pattern obtained by the above process is post-baking in an oven at 230°C for 30 minutes.
  • the outgas generation amount of the patterns obtained through the photolithography step and the maximum resolution (minimum size pattern on the substrate) of the pattern formed on the substrate were measured, and are shown in Tables 7 and 8.
  • Example 1 Minimum pattern size on substrate ( ⁇ m) 2.8 2.5 3.4 3.5 3.5 3.4 3.6 2.1 2.3 2.2 2.2 2.3 Outgassing (ppm) 4.2 3.9 2.2 2.5 2.6 2.1 2.6 3.7 4.0 4.1 4.2 4.1
  • the minimum size pattern on the substrate tends to be small. It is determined that, when a binder resin substituted with a silane group is used, the adhesion with the substrate is improved, so that the resolution of the final pattern after the PR process is improved, but the amount of outgas generated is also increased.
  • Comparative Examples 2 to 7 of Table 8 also showed a similar tendency to Examples 1 to 12.
  • Comparative Examples 2, 3, 6 and 7 using Polymers 2-6 and 2-7 substituted with a silane substituent Comparative Examples 4 and 5 using Polymers 1-6 and 1-7 in which a silane substituent is not substituted Therefore, it was confirmed that the size of the minimum size pattern on the substrate was reduced, the resolution was improved, and the amount of outgas generated was increased.
  • the polymer A backbone is formed by polymerizing one type of monomer, and has a relatively linear form compared to Polymers 1-1 to 1-5 and Polymers 2-1 to 2-5 depending on the structure of the monomer.
  • the polymer main chain is polymerized with three types of monomers having different structures to form Polymers 1-6, 1 It has a relatively reticulated structure compared to -7, 2-6 and 2-7.
  • Polymers 1-1 to 1-5 and Polymers 2-1 to 2-5 are more suitable for a photolithography process because they effectively bind intermolecularly with surrounding compounds due to their structural characteristics, and thus Examples 1 to 12 are Comparative Examples It is determined that the resolution is higher than that of 2 to 7 during the developing process, and the amount of outgas generated is low.
  • Comparative Example 8 of Table 8 when an acrylic binder (SR-6100) was used as the binder resin, it was confirmed that the resolution and outgas characteristics were significantly lowered compared to Examples 1 to 12 and Comparative Examples 1 to 7 there is.
  • SR-6100 acrylic binder
  • the inorganic nanoparticles scatter the incident light during the exposure step of the photolithography process for forming the pattern to further activate the photoinitiator.
  • the photoinitiator more activated by the inorganic nanoparticles increases the resolution and curing degree of the pattern, and also the amount of unreacted photoinitiator in the photocurable composition decreases, so it is determined that the amount of outgas generated by the unreacted initiator is also reduced.
  • Example 2 and Example 8 of Table 5 in the case of the photocurable composition of Example 8, inorganic nanoparticles were added to the pigment dispersion and dispersed in advance, and then the pigment dispersion was added to the photocurable composition,
  • the photocurable composition of Example 2 was prepared by adding inorganic nanoparticles to the photocurable composition without dispersing in advance. Comparing the minimum pattern sizes of Example 2 and Example 8 through Table 7, Example 8, in which inorganic nanoparticles were dispersed in a pigment dispersion and added to the photocurable composition, had a minimum pattern size on the substrate compared to Example 2 It is small and the resolution is improved.
  • circular patterns having diameters of 3, 4, 5, 6 and 7 ⁇ m are formed by using a mask capable of forming 100 circular patterns for each diameter size, and then the formed circular pattern is formed.
  • the minimum diameter of the pattern was measured, and how many circular patterns of the minimum diameter were formed out of 100 were confirmed through an optical microscope (Nikon Corporation) to evaluate the adhesion.
  • Example 2 Example 8, and Comparative Example 1 of Table 9, Polymer 2-1 was used as the resin, and there was a difference in whether inorganic nanoparticles were included.
  • a pattern was formed using a photocurable composition containing inorganic nanoparticles, and a circular pattern having a diameter of 3 ⁇ m or more was formed, and 100 circular patterns of 3 ⁇ m were all formed.
  • Comparative Example 1 a pattern was formed using a photocurable composition not containing inorganic nanoparticles, and a circular pattern having a diameter of 6 ⁇ m or more was formed, and four circular patterns of 6 ⁇ m were formed. Therefore, when the pattern is formed using the photocurable composition containing the inorganic nanoparticles, it can be confirmed that the adhesion is very excellent.
  • the composition and ratio were the same as that of the photocurable composition of Example 8, except that Polymer 2-6 was used as a resin, but the diameter was A circular pattern of 4 ⁇ m or larger was formed, and 37 circular patterns of 4 ⁇ m were formed. Therefore, even in the case of the patterns of the photocurable composition including the same inorganic nanoparticles, it was confirmed that the pattern of the photocurable composition using the alkali-soluble resin of the present invention had excellent adhesion.
  • TFT layer 4 1st electrode

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Abstract

Une composition photodurcissable selon un mode de réalisation de la présente invention est caractérisée en ce que des nanoparticules inorganiques dans la composition photodurcissable peuvent diffuser une lumière incidente pour augmenter la sensibilité pendant la formation de motif à l'aide de lumière, ce qui permet de former un motif ayant une excellente résolution. De plus, un dispositif d'affichage hautement fiable peut être fourni à l'aide de la composition photodurcissable.
PCT/KR2021/014470 2020-10-28 2021-10-18 Composition photodurcissable comprenant des particules inorganiques et dispositif d'affichage WO2022092658A1 (fr)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012168521A (ja) * 2011-02-11 2012-09-06 Xerox Corp ベルト式印刷システム用の色重ね見当合わせ
WO2017203979A1 (fr) * 2016-05-27 2017-11-30 富士フイルム株式会社 Composition durcissable, film durci, filtre de couleur, film de blocage de lumière, élément d'imagerie à l'état solide, dispositif d'affichage d'image, et procédé de production de film durci
KR20190015966A (ko) * 2017-08-07 2019-02-15 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 이를 포함하는 표시장치
KR20190042922A (ko) * 2017-10-17 2019-04-25 덕산네오룩스 주식회사 부착력 또는 접착성이 향상된 감광성 수지 조성물 및 그것들을 사용한 광 차단 층
KR20200064274A (ko) * 2018-11-28 2020-06-08 (주)덕산테코피아 감광성 수지 조성물, 필름 및 전자장치

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012168521A (ja) * 2011-02-11 2012-09-06 Xerox Corp ベルト式印刷システム用の色重ね見当合わせ
WO2017203979A1 (fr) * 2016-05-27 2017-11-30 富士フイルム株式会社 Composition durcissable, film durci, filtre de couleur, film de blocage de lumière, élément d'imagerie à l'état solide, dispositif d'affichage d'image, et procédé de production de film durci
KR20190015966A (ko) * 2017-08-07 2019-02-15 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 이를 포함하는 표시장치
KR20190042922A (ko) * 2017-10-17 2019-04-25 덕산네오룩스 주식회사 부착력 또는 접착성이 향상된 감광성 수지 조성물 및 그것들을 사용한 광 차단 층
KR20200064274A (ko) * 2018-11-28 2020-06-08 (주)덕산테코피아 감광성 수지 조성물, 필름 및 전자장치

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