WO2022051971A1 - Imaging optical system, imaging device and electronic device - Google Patents

Imaging optical system, imaging device and electronic device Download PDF

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Publication number
WO2022051971A1
WO2022051971A1 PCT/CN2020/114429 CN2020114429W WO2022051971A1 WO 2022051971 A1 WO2022051971 A1 WO 2022051971A1 CN 2020114429 W CN2020114429 W CN 2020114429W WO 2022051971 A1 WO2022051971 A1 WO 2022051971A1
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Prior art keywords
optical system
imaging optical
metalens
following condition
satisfies
Prior art date
Application number
PCT/CN2020/114429
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English (en)
French (fr)
Inventor
Yingqing LIU
Ryotaro Izumi
Takuya Anzawa
Original Assignee
Huawei Technologies Co., Ltd.
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Application filed by Huawei Technologies Co., Ltd. filed Critical Huawei Technologies Co., Ltd.
Priority to PCT/CN2020/114429 priority Critical patent/WO2022051971A1/en
Priority to CN202080103815.6A priority patent/CN115997142A/zh
Publication of WO2022051971A1 publication Critical patent/WO2022051971A1/en

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/002—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/001—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras
    • G02B13/0015—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras characterised by the lens design
    • G02B13/002—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras characterised by the lens design having at least one aspherical surface
    • G02B13/0045—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras characterised by the lens design having at least one aspherical surface having five or more lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/001—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras
    • G02B13/008—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras designed for infrared light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/02—Simple or compound lenses with non-spherical faces
    • G02B3/08—Simple or compound lenses with non-spherical faces with discontinuous faces, e.g. Fresnel lens
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B9/00—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or -
    • G02B9/04—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or - having two components only
    • G02B9/06—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or - having two components only two + components
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B9/00—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or -
    • G02B9/60—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or - having five components only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B9/00—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or -
    • G02B9/62—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or - having six components only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B9/00—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or -
    • G02B9/64—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or - having more than six components
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B2003/0093—Simple or compound lenses characterised by the shape

Definitions

  • the presnt disclosure relates to an imaging optical system, an imaging device and an electronic device such as a mobile terminal like a mobile phone or a smartphone, and a PDA (Personal Digital Assistance) , and in particular, an imaging optical system, an imaging device and an electronic device which use a relatively small and thin imaging element such as a Charge Coupled Device (CCD) sensor or a Complementary Metal Oxide Semiconductor (CMOS) sensor.
  • CMOS Complementary Metal Oxide Semiconductor
  • TTL total track length
  • the large F-number is required to widen the focus range. If the F-number is increased, an amount of light passing through the diaphragm will be decreased. On the other hand, because the number of lenses has been increasing in order to set a high zoom function recently, loss of the light amount passing through many lenses is also increasing. However, when the F-number is increased, the amount of light passing through the diaphragm is further reduced, and the image quality is deteriorated.
  • metasurface has been developed as one of the leading platforms.
  • the metasurface can function as a phase shifter with sub-wavelength intervals that are excellent in controlling the characteristics of light.
  • no specific studies have been made for practical application of the metasurfaces.
  • the present disclosure is directed to provide an imaging optical system, an imaging device and an electronic device which can reduce the total track length while maintaining quality of image.
  • an imaging optical system comprising a plurality of optical elements, wherein the plurality of optical elements comprises:
  • At least one metalens having nanostructure formed on at least one side at least one metalens having nanostructure formed on at least one side
  • a metalens having nanostructure is inserted into three or more lenses without the nanostructure. Therefore, chromatic aberration generated by shortening the total length of the optical system portion can be canceled in visible light by generating chromatic aberration of the metalens in the opposite direction. Since it is possible to correct chromatic aberration, it is possible to secure high optical performance and shorten the total length.
  • the imaging optical system further satisfies the following condition:
  • TTL is a distance from the optical element positioned closest to an object side to an imaging point of the imaging optical system
  • f is a focal length of the entire imaging optical system
  • the wavelength satisfies the following condition:
  • the imaging optical system further satisfies the following condition:
  • the imaging optical system further satisfies the following condition:
  • the imaging optical system further satisfies the following condition:
  • fconv is a focal length of an optical system from the optical element on an image side than the metalens closest to an object side to the optical element closest to the image
  • fmeta is a focal length of the metalens closest to the object
  • focal length is -0.5/C1
  • C1 is a quadratic coefficient of a phase function of the metalens, and the wavelength satisfies the following condition:
  • the above condition is an expression regarding the ratio of the focal length of the metalens and the focal length of the optical system arranged on the image side of the metalens. According to this implementation, it becomes possible to secure high optical performance by satisfying the condition.
  • the imaging optical system further satisfies the following condition:
  • the metalens is arranged in vicinity of a diaphragm of the imaging optical system, and the wavelength satisfies the following condition:
  • the imaging optical system further satisfies the following condition:
  • TTLconv is a distance from an object-side surface of the optical element closest to an image side of the metalens located closest to the object side to an image forming surface
  • fconv is a focal length of an optical system from the optical element on an image side than the metalens closest to an object side to the optical element closest to the image, and the wavelength satisfies the following condition:
  • the above condition is the ratio of the focal length of the optical system arranged on the image side of the metalens and the distance of the optical system arranged on the image side of the metalens. According to this implementation, the total length of the optical system arranged on the image side of the metalens can be shortened. Accordingly, the length of the entire optical system can be shortened.
  • the metalens satisfies the following condition:
  • ndmeta is a refractive index of the nanostructure for a d-line.
  • the above condition is the refractive index of the structure formed on the metalens for the d-line. According to this implementation, it becomes easy to manufacture the metalens by satisfying the condition. Also, it is possible to ensure mass productivity. Further, since the height of the nanostructure can be reduced, the total length can be shortened.
  • the metalens satisfies the following condition:
  • ndmeta is a refractive index of the nanostructure for a d-line.
  • the nanostructure is composed of nanopillars, and the nanopillars satisfy the following condition:
  • h is the height of the nanopillar
  • t is a diameter of the nanopillar, and the wavelength satisfies the following condition:
  • the above condition is a conditional expression regarding the nanopillar structure that constitutes the metalens. Acccording to this implementation, it becomes easy to manufacture the nanopillars by satisfying the conditional expression. Also, it is possible to ensure mass productivity. Further, since the height of the nanostructure can be reduced, the total length can be shortened.
  • an imaging optical system comprising a plurality of optical elements, wherein the plurality of optical elements comprises:
  • At least one metalens having nanostructure formed on at least one side at least one metalens having nanostructure formed on at least one side
  • imaging optical system satisfies the following condition:
  • TTL is a distance from the optical element positioned closest to an object side to an imaging point of the imaging optical system
  • f is a focal length of the entire imaging optical system
  • a metalens having nanostructure is inserted into the conventional optical system. Therefore, chromatic aberration generated by shortening the total length of the optical system portion can be canceled in visible light by generating chromatic aberration of the metalens in the opposite direction. Since it is possible to correct chromatic aberration, it is possible to secure high optical performance and shorten the total length.
  • the imaging optical system further satisfies the following condition:
  • TTL is a distance from the optical element positioned closest to an object side to an imaging point of the imaging optical system
  • f is a focal length of the entire imaging optical system
  • the imaging optical system further satisfies the following condition:
  • the imaging optical system further satisfies the following condition:
  • fconv is a focal length of an optical system from the optical element on an image side than the metalens closest to an object side to the optical element closest to the image
  • fmeta is a focal length of the metalens closest to the object
  • focal length is -0.5/C1
  • C1 is a quadratic coefficient of a phase function of the metalens.
  • the imaging optical system further satisfies the following condition:
  • the metalens is arranged in vicinity of a diaphragm of the imaging optical system.
  • the imaging optical system further satisfies the following condition:
  • TTLconv is a distance from an object-side surface of the optical element closest to an image side of the metalens located closest to the object side to an image forming surface
  • fconv is a focal length of an optical system from the optical element on an image side than the metalens closest to an object side to the optical element closest to the image.
  • the metalens satisfies the following condition:
  • ndmeta is a refractive index of the nanostructure for a d-line.
  • the metalens satisfies the following condition:
  • ndmeta is a refractive index of the nanostructure for a d-line.
  • the nanostructure is composed of nanopillars, and the nanopillars satisfy the following condition:
  • h is the height of the nanopillar
  • t is a diameter of the nanopillar.
  • an imaging optical system used for light whose wavelength satisfies the following condition:
  • the imaging optical system comprising at least one optical element, wherein the at least one optical element comprises:
  • At least one metalens having nanostructure formed on at least one side At least one metalens having nanostructure formed on at least one side.
  • the imaging optical system comprises at least one metalens having nanostructure formed on at least one side. Therefore, chromatic aberration generated by shortening the total length of the optical system portion can be canceled in visible light by generating chromatic aberration of the metalens in the opposite direction. Since it is possible to correct chromatic aberration, it is possible to secure high optical performance and shorten the total length.
  • the imaging optical system comprisesfour or more metalenses, each of the metalenses having nanostructure formed on at least one side.
  • the imaging optical system further satisfies the following condition:
  • TTL is a distance from the optical element positioned closest to an object side to an imaging point of the imaging optical system
  • f is a focal length of the entire imaging optical system
  • the imaging optical system further satisfies the following condition:
  • the metalens satisfies the following condition:
  • ndmeta is a refractive index of the nanostructure for a d-line.
  • the metalens satisfies the following condition:
  • ndmeta is a refractive index of the nanostructure for a d-line.
  • the nanostructure is composed of nanopillars, and the nanopillars satisfy the following condition:
  • h is the height of the nanopillar
  • t is a diameter of the nanopillar.
  • the imaging optical system satisfies the following condition:
  • TTL is a distance from the optical element positioned closest to an object side to an imaging point of the imaging optical system
  • f is a focal length of the entire imaging optical system
  • F-number is F-number of the imaging optical system
  • the imaging optical system satisfies the following condition:
  • the imaging optical system satisfies the following condition:
  • the imaging optical system further satisfies the following condition:
  • fconv is a focal length of an optical system from the optical element on an image side than the metalens closest to an object side to the optical element closest to the image
  • fmeta is a focal length of the metalens closest to the object
  • focal length is -0.5/C1
  • C1 is a quadratic coefficient of a phase function of the metalens, and the wavelength satisfies the following condition:
  • the imaging optical system further satisfies the following condition:
  • the metalens is arranged in vicinity of a diaphragm of the imaging optical system, and the wavelength satisfies the following condition:
  • the imaging optical system further satisfies the following condition:
  • TTLconv is a distance from an object-side surface of the optical element closest to an image side of the metalens located closest to the object side to an image forming surface
  • fconv is a focal length of an optical system from the optical element on an image side than the metalens closest to an object side to the optical element closest to the image
  • the metalens satisfies the following condition:
  • ndmeta is a refractive index of the nanostructure for a d-line.
  • the metalens satisfies the following condition:
  • the nanostructure is composed of nanopillars, and the nanopillars satisfy the following condition:
  • h is the height of the nanopillar
  • t is a diameter of the nanopillar.
  • an imaging optical system comprising a plurality of optical elements, wherein the plurality of optical elements comprises:
  • At least one metalens having nanostructure formed on at least one side at least one metalens having nanostructure formed on at least one side
  • TTL is a distance from the optical element positioned closest to an object side to an imaging point of the imaging optical system
  • f is a focal length of the entire imaging optical system
  • F-number is F-number of the imaging optical system
  • a metalens having nanostructure is inserted into the conventional optical system. Therefore, chromatic aberration generated by shortening the total length of the optical system portion can be canceled in NIR by generating chromatic aberration of the metalens in the opposite direction. Since it is possible to corre ct chromatic aberration, it is possible to secure high optical performance and shorten the total length.
  • the imaging optical system satisfies the following condition:
  • the imaging optical system satisfies the following condition:
  • the imaging optical system further satisfies the following condition:
  • fconv is a focal length of an optical system from the optical element on an image side than the metalens closest to an object side to the optical element closest to the image
  • fmeta is a focal length of the metalens closest to the object
  • focal length is -0.5/C1
  • C1 is a quadratic coefficient of a phase function of the metalens.
  • the imaging optical system further satisfies the following condition:
  • the metalens is arranged in vicinity of a diaphragm of the imaging optical system.
  • the imaging optical system further satisfies the following condition:
  • TTLconv is a distance from an object-side surface of the optical element closest to an image side of the metalens located closest to the object side to an image forming surface
  • fconv is a focal length of an optical system from the optical element on an image side than the metalens closest to an object side to the optical element closest to the image.
  • the metalens satisfies the following condition:
  • ndmeta is a refractive index of the nanostructure for a d-line.
  • the metalens satisfies the following condition:
  • the nanostructure is composed of nanopillars, and the nanopillars satisfy the following condition:
  • h is the height of the nanopillar
  • t is a diameter of the nanopillar.
  • an imaging optical system used for light whose wavelength satisfies the following condition:
  • the imaging optical system comprising at least one optical element, wherein the at least one optical element comprises:
  • At least one metalens having nanostructure formed on at least one side At least one metalens having nanostructure formed on at least one side.
  • the imaging optical system comprises at least one metalens having nanostructure formed on at least one side. Therefore, chromatic aberration generated by shortening the total length of the optical system portion can be canceled in NIR by generating chromatic aberration of the metalens in the opposite direction. Since it is possible to correct chromatic aberration, it is possible to secure high optical performance and shorten the total length.
  • the imaging optical system comprises four or more metalenses, each of the metalenses having nanostructure formed on at least one side.
  • the imaging optical system satisfies the following condition:
  • TTL is a distance from the optical element positioned closest to an object side to an imaging point of the imaging optical system
  • f is a focal length of the entire imaging optical system
  • F-number is F-number of the imaging optical system.
  • the imaging optical system satisfies the following condition:
  • the metalens satisfies the following condition:
  • ndmeta is a refractive index of the nanostructure for a d-line.
  • the metalens satisfies the following condition:
  • the nanostructure is composed of nanopillars, and the nanopillars satisfy the following condition:
  • h is the height of the nanopillar
  • t is a diameter of the nanopillar.
  • an imaging device comprising:
  • an optical device including the above-described imaging optical system
  • an imaging sensor for generating data based on light transmitted through the optical device.
  • an electronic device comprising an imaging device, the imaging device comprising:
  • an optical device including the above-described imaging optical system
  • an imaging sensor for generating data based on light transmitted through the optical device.
  • FIG. 1 is a diagram showing a configuration of an optical system according to an embodiment.
  • FIG. 2 is a perspective view of one nanopillar according to an embodiment.
  • FIG. 3 is a diagram for describing a method of manufacturing a metalens.
  • FIG. 4a is a table of specifications for e-line according to Example 1.
  • FIG. 4b is a table of effective focal distances according to Example 1.
  • FIG. 4c is a table of information on surfaces according to Example 1.
  • FIG. 4d is a table of aspherical coefficients according to Example 1.
  • FIG. 4e is a diagram showing a configuration of an imaging optical system according to Example 1.
  • FIG. 4f is a diagram showing chromatic aberration according to Example 1.
  • FIG. 4g is a table of information on metasurface according to Example 1.
  • FIG. 4h is (a) a plane view, (b) a side view and (c) a perspective view of a metalens according to Example 1.
  • FIG. 4i is a relationship between a target phase and a distance from a center of a metalens according to Example 1.
  • FIG. 4j is a diagram showing a relationship between a radius of an upper surface and a phase in one nanopillar according to Example 1.
  • FIG. 4k is a result of simulating a phase of light transmitted through a nanopillar according to Example 1.
  • FIG. 4l is a result of simulating transmission of light transmitted through a nanopillar according to Example 1.
  • FIG. 4m is a result of simulating a relationship between a distance from a center of a nanopillar and a radius of the nanopillar according to Example 1.
  • FIG. 4n is a result of simulating change in a phase of light transmitted through the metalens according to Example 1.
  • FIG. 5a is a table of specifications for e-line according to Example 2.
  • FIG. 5b is a table of effective focal distances according to Example 2.
  • FIG. 5c is a table of information on surfaces according to Example 2.
  • FIG. 5d is a table of aspherical coefficients according to Example 2.
  • FIG. 5e is a diagram showing a configuration of an imaging optical system according to Example 2.
  • FIG. 5f is a diagram showing chromatic aberration according to Example 2.
  • FIG. 5g is a table of information on metasurface according to Example 2.
  • FIG. 5h is (a) a plane view, (b) a side view and (c) a perspective view of a metalens according to Example 2.
  • FIG. 5i is a relationship between a target phase and a distance from a center of a metalens according to Example 2.
  • FIG. 5j is a diagram showing a relationship between a radius of an upper surface and a phase in one nanopillar according to Example 2.
  • FIG. 5k is a result of simulating a phase of light transmitted through a metalens according to Example 2.
  • FIG. 5l is a result of simulating transmission of light transmitted through a metalens according to Example 2.
  • FIG. 5m is a result of simulating a relationship between a distance from a center of a metalens and a radius of the metalens according to Example 2.
  • FIG. 5n is a result of simulating change in a phase of light transmitted through the metalens according to Example 2.
  • FIG. 6a is a table of specifications for e-line according to Example 3.
  • FIG. 6b is a table of effective focal distances according to Example 3.
  • FIG. 6c is a table of information on surfaces according to Example 3.
  • FIG. 6d is a table of aspherical coefficients according to Example 3.
  • FIG. 6e is a diagram showing a configuration of an imaging optical system according to Example 3.
  • FIG. 6f is a diagram showing chromatic aberration according to Example 3.
  • FIG. 6g is a table of information on metasurface according to Example 3.
  • FIG. 6h is (a) a plane view, (b) a side view and (c) a perspective view of a metalens according to Example 3.
  • FIG. 6i is a relationship between a target phase and a distance from a center of a metalens according to Example 3.
  • FIG. 6j is a diagram showing a relationship between a radius of an upper surface and a phase in one nanopillar according to Example 3.
  • FIG. 6k is a result of simulating a phase of light transmitted through a metalens according to Example 3.
  • FIG. 6l is a result of simulating transmission of light transmitted through a metalens according to Example 3.
  • FIG. 6m is a result of simulating a relationship between a distance from a center of a metalens and a radius of the metalens according to Example 3.
  • FIG. 6n is a result of simulating change in a phase of light transmitted through the metalens according to Example 3.
  • FIG. 7a is a table of specifications for e-line according to Example 4.
  • FIG. 7b is a table of effective focal distances according to Example 4.
  • FIG. 7c is a table of information on surfaces according to Example 4.
  • FIG. 7d is a table of aspherical coefficients according to Example 4.
  • FIG. 7e is a diagram showing a configuration of an imaging optical system according to Example 4.
  • FIG. 7f is a diagram showing chromatic aberration according to Example 4.
  • FIG. 7g is a table of information on metasurface according to Example 4.
  • FIG. 7h is (a) a plane view, (b) a side view and (c) a perspective view of a metalens according to Example 4.
  • FIG. 7i is a relationship between a target phase and a distance from a center of the metalens according to Example 4.
  • FIG. 7j is a diagram showing a relationship between a radius of a top surface and a phase in one nanopillar according to Example 4.
  • FIG. 7k is a result of simulating a relationship between a distance from a center of a metalens and a radius of the metalens according to Example 4.
  • FIG. 8a is a table of specifications for e-line according to Example 5.
  • FIG. 8b is a table of effective focal distances according to Example 5.
  • FIG. 8c is a table of information on surfaces according to Example 5.
  • FIG. 8d is a diagram showing a configuration of an imaging optical system according to Example 5.
  • FIG. 8e is a diagram showing chromatic aberration according to Example 5.
  • FIG. 8f is a table of information on metasurface according to Example 5.
  • FIG. 8g is (a) a plane view, (b) a side view and (c) a perspective view of a metalens according to Example 5.
  • FIG. 8h shows a relationship between a target phase of light transmitted through the first metalens and a distance from the center of the first metalens according to Example 5.
  • FIG. 8i is a diagram showing a relationship between a radius of the upper surface and the phase of one nanopillar according to Example 5.
  • FIG. 8j shows a result of simulating a relationship between a distance from the center and a radius of the first metalens according to Example 5.
  • FIG. 8k is (a) a plane view, (b) a side view and (c) a perspective view of the second metalens according to Example 5.
  • FIG. 8l shows a relationship between a target phase of light transmitted through the second metalens and a distance from the center of the second metalens according to Example 5.
  • FIG. 8m shows the result of simulating a relationship between a distance from the center and a radius of the second metalens according to Example 5.
  • FIG. 8n is (a) a plane view, (b) a side view and (c) a perspective view of the third metalens according to Example 5.
  • FIG. 8o shows a relationship between a target phase of light transmitted through the third metalens and a distance from the center of the third metalens according to Example 5.
  • FIG. 8p shows the result of simulating a relationship between a distance from the center and a radius of the third metalens according to Example 5.
  • FIG. 8q is (a) a plane view, (b) a side view and (c) a perspective view of the fourth metalens according to Example 5.
  • FIG. 8r shows a relationship between a target phase of light transmitted through the fourth metalens and a distance from the center of the fourth metalens according to Example 5.
  • FIG. 8s shows the result of simulating a relationship between a distance from the center and a radius of the fourth metalens according to Example 5.
  • FIG. 8t is (a) a plane view, (b) a side view and (c) a perspective view of the fifth metalens according to Example 5.
  • FIG. 8u shows a relationship between a target phase of light transmitted through the fifth metalens and a distance from the center of the fifth metalens according to Example 5.
  • FIG. 8v shows the result of simulating a relationship between a distance from the center and a radius of the fifth metalens according to Example 5.
  • FIG. 8w is (a) a plane view, (b) a side view and (c) a perspective view of the sixth metalens.
  • FIG. 8x shows a relationship between a target phase of light transmitted through the sixth metalens and a distance from the center of the sixth metalens according to Example 5.
  • FIG. 8y is a result of simulating a relationship between a distance from a center of a metalens and a radius of the metalens according to Example 5.
  • FIG. 9a is a table of specifications for e-line according to Example 6.
  • FIG. 9b is a table of effective focal distances according to Example 6.
  • FIG. 9c is a table of information on surfaces according to Example 6.
  • FIG. 9d is a diagram showing a configuration of an imaging optical system according to Example 6.
  • FIG. 9e is a diagram showing chromatic aberration according to Example 6.
  • FIG. 9f is a table of information on metasurface according to Example 6.
  • FIG. 9g is (a) a plane view, (b) a side view and (c) a perspective view of a metalens according to Example 6.
  • FIG. 9h shows a relationship between a target phase of light transmitted through the first metalens and a distance from the center of the first metalens according to Example 6.
  • FIG. 9i is a diagram showing a relationship between a radius of the upper surface and the phase of one nanopillar according to Example 6.
  • FIG. 9j is a result of simulating a phase of light transmitted through a nanopillar according to Example 6.
  • FIG. 9k is a result of simulating transmission of light transmitted through a nanopillar according to Example 6.
  • FIG. 9l shows a result of simulating a relationship between a distance from the center and a radius of the first metalens according to Example 6.
  • FIG. 9m shows a relationship between a target phase of light transmitted through the second metalens and a distance from the center of the second metalens according to Example 6.
  • FIG. 9n shows a result of simulating a relationship between a distance from the center and a radius of the second metalens according to Example 6.
  • FIG. 10a is a table of specifications for e-line according to Example 7.
  • FIG. 10b is a table of effective focal distances according to Example 7.
  • FIG. 10c is a table of information on surfaces according to Example 7.
  • FIG. 10d is a table of aspherical coefficients according to Example 7.
  • FIG. 10e is a diagram showing a configuration of an imaging optical system according to Example 7.
  • FIG. 10f is a diagram showing chromatic aberration according to Example 7.
  • FIG. 10g is a table of information on metasurface according to Example 7.
  • FIG. 10h is (a) a plane view, (b) a side view and (c) a perspective view of a metalens according to Example 7.
  • FIG. 10i shows a relationship between a target phase of light transmitted through the first metalens and a distance from the center of the first metalens according to Example 7.
  • FIG. 10j is a diagram showing a relationship between a radius of the upper surface and the phase of one nanopillar according to Example 7.
  • FIG. 10k shows a result of simulating a relationship between a distance from the center and a radius of the first metalens according to Example 7.
  • FIG. 10l shows a relationship between a target phase of light transmitted through the second metalens and a distance from the center of the second metalens according to Example 7.
  • FIG. 10m shows a result of simulating a relationship between a distance from the center and a radius of the second metalens according to Example 7.
  • smartphone lenses are adopting more lenses for supporting desired requirements such as better resolution, larger pixel size, etc. Accordingly, the TTL inevitability is getting larger than before and it is very hard to shorter down the size.
  • a metasurface is an artificial surface which has optical characteristics that are not found in nature.
  • a metasurface which functions as a lens is referred to as a metalens.
  • the metalens is made of nano-structured sub-wavelength arrays of various shapes, and it is possible to form a flat lens.
  • the metalens is an artificial composite material with nanostructure.
  • the metalens may have a negative refractive index.
  • the metalens could be made very thin because it is nanostructure and the height of the nanostructure is usually sub wavelength level. Also, the metalens could change the wavefront phase, thus it could be used in the optical system to reduce the TTL of the lens system.
  • the metasurface may be configured to adjust chromatic aberration by designing the nanostructure thereon. Therefore, it can be canceled by generating chromatic aberration of the metalens in the opposite direction. As such, the chromatic aberration could be eliminated by combining the conventional lens and metalens.
  • FIG. 1 is a diagram showing an exemplary configuration of an optical system according to an embodiment of the present disclosure.
  • the optical system 1 is used for a camera function of a mobile terminal such as a mobile phone and a smartphone, and other electronic device such as a PDA.
  • the optical system 1 includes multiple optical elements.
  • the optical elements may include, in order from the object side(O) , the first lens 102 having a positive refractive power, the second lens 104 composed of a metalens, the third lens 108 having a negative refractive power, and the fourth lens 110 having a positive refractive power.
  • the first lens 102 and the fourth lens 110 are convex lenses
  • the third lens 108 is a concave lens.
  • Each of the first lens 102, the third lens 108, and the fourth lens 110 may be composed of a plurality of lenses.
  • the first lens 102, the third lens 108, and the fourth lens 110 may be composed of materials such as glass and plastic.
  • the second lens 104 functions like a Diffractive Optical Element (DOE) that can change light into various patterns and shapes by utilizing the diffraction phenomenon of the light.
  • DOE Diffractive Optical Element
  • the second lens 104 is formed in a flat plate shape and includes a metasurface 106 on the object side surface.
  • the metasurface 106 has a nanostructure.
  • the nanostructure may be formed by forming fine irregularities on the surface of the second lens 104 to give a predetermined optical path difference (optical phase shift) to an adjacent region.
  • the nanostructure of metasurface 106 may be composed of nanopillars.
  • the diffraction efficiency of the metasurface depends on an incident angle. If the incident angle of the light beam with respect to the diffractive surface is large, the diffraction efficiency is significantly reduced. Therefore, it is desirable to arrange the metalens on the object side as much as possible.
  • the second lens 104 including the metasurface 106 is located at the second position from the object side among the plurality of lenses. However, it may be located at the first position from the object side.
  • FIG. 1 is a perspective view of a nanopillar according to the present embodiment.
  • a nanopillar 202 is formed on a substrare 204.
  • the substrate 204 corresponds to the second lens 104 which may be composed of SiO 2 . Also, Al 2 O 3 would be possible and other material.
  • the nanopillar 202 may be composed of the material selected from the group of Si, TiO 2 , GaN, and Ln materials, where Ln represents a rare earth element and is selected from Er, Gd, Nd, Ho, Tm, Yb.
  • the nanopillar 202 may be made of any other suitable material.
  • other suitable dielectric materials include those having a light transmittance over the visible spectrum of at least about 40%.
  • dielectric materials can be selected from oxides (such as an oxide of aluminum (e.g., AI 2 O 3 ) ) , nitrides (such as nitrides of silicon (e.g., Si 3 N 4 ) ) , sulfides and pure elements.
  • oxides such as an oxide of aluminum (e.g., AI 2 O 3 )
  • nitrides such as nitrides of silicon (e.g., Si 3 N 4 )
  • sulfides and pure elements can be selected from oxides (such as an oxide of aluminum (e.g., AI 2 O 3 ) ) , nitrides (such as nitrides of silicon (e.g., Si 3 N 4 ) ) , sulfides and pure elements.
  • the nanopilllar 202 has columnar construction. However, it may have a shape of an elliptical column, a triangular prism, a square pillar, and so on.
  • the nanopillar 202 can be designed as 10 to 1000 nm in diameter. Also, the height of the nanopillar 202 can be designed as 100 to 2000 nm.
  • the second lens 104 may be made of SiO 2 .
  • the metasurface 106 comprises SiN.
  • a metalens includes a plurality of nanostructures disposed on the substrate.
  • the nanostructure cause an optical phase shift that varies depending on the position of the individual nanopillar on the substrate.
  • the optical phase shift of the nanostructure defines a phase profile of the metalens.
  • the optical phase shift can be varied by, for example, changing the diameter of the nanopillars, the height of the nanopillar, the period of the nanostructure, etc.
  • FIG. 4h is (a) a plane view, (b) a side view and (c) a perspective view of a metalens according to an embodiment.
  • the nanostructure which constitutes the metasurface may be formed periodically on the second lens 104.
  • the nanostructure may be concentrically formed as shown in FIG. 4h.
  • the metasurface can be fabricated in the same manner as fabrication of semi-conductors.
  • the metalens may be manufactured by a step (a) of preparing a substrate 201 which is a material of the second lens 104, a step (b) of applying a resist 202 on the surface of the substrate 201, and a step (c) of patterning the resist 202. It also includes a step (d) of depositing the nanopillars 204, and a step (e) of removing the resist 202.
  • a part of the resist 202 may be removed to expose a part of the surface of the substrate 201 to define an opening of the resist 202.
  • a conformal coating is formed on the resist 202 and the exposed portions of the substrate surface within the openings, such as by Atomic Layer Deposition (ALD) .
  • ALD Atomic Layer Deposition
  • metasurface containing the nanostructure may be formed by conformal coating.
  • the method may further include a step (d’) of exposing the resist by removing the top of the conformal coating, for example by etching the conformal coating.
  • EBL Electron Beam Lithography
  • DUV Deep Ultra-Violet
  • etching the resist 202 to expose the substrate 201.
  • patterning of the resist 202 is performed on the resist 202.
  • the nanoimprinting and DUV lithography are better for mass production.
  • EBL is appropriate for the purpose of test in laboratories.
  • an imaging optical system comprises a plurality of optical elements, in which the plurality of optical elements comprises:
  • At least one metalens having nanostructure formed on at least one side at least one metalens having nanostructure formed on at least one side
  • a metalens having nanostructure is inserted into three or more lenses without the nanostructure. Therefore, chromatic aberration generated by shortening the total length of the optical system portion can be canceled by generating chromatic aberration of the metalens in the opposite direction. Since it is possible to correct chromatic aberration, it is possible to secure high optical performance and shorten the total length.
  • the imaging optical system further satisfies the following condition:
  • TTL is a distance from the optical element positioned closest to an object side to an imaging point of the imaging optical system
  • f is a focal length of the entire imaging optical system
  • the wavelength satisfies the following condition:
  • the imaging optical system further satisfies the following condition:
  • the imaging optical system further satisfies the following condition:
  • the imaging optical system further satisfies the following condition:
  • fconv is a focal length of an optical system from the optical element on an image side than the metalens closest to an object side to the optical element closest to the image (the final lens)
  • fmeta is a focal length of the metalens closest to the object
  • focal length is -0.5/C1
  • C1 is a quadratic coefficient of a phase function of the metalens, and the wavelength satisfies the following condition:
  • the imaging optical system further satisfies the following condition:
  • the metalens is arranged in vicinity of a diaphragm of the imaging optical system, and the wavelength satisfies the following condition:
  • the imaging optical system further satisfies the following condition:
  • TTLconv is a distance from an object-side surface of the optical element closest to an image side of the metalens located closest to the object side to an image forming surface
  • fconv is a focal length of an optical system from the optical element on an image side than the metalens closest to an object side to the optical element closest to the image, and the wavelength satisfies the following condition:
  • the metalens satisfies the following condition:
  • ndmeta is a refractive index of the nanostructure for a d-line.
  • the metalens satisfies the following condition:
  • ndmeta is a refractive index of the nanostructure for a d-line.
  • the nanostructure is composed of nanopillars, and the nanopillars satisfy the following condition:
  • h is the height of the nanopillar
  • t is a diameter of the nanopillar, and the wavelength satisfies the following condition:
  • an imaging optical system comprises a plurality of optical elements, in which the plurality of optical elements comprises:
  • At least one metalens having nanostructure formed on at least one side at least one metalens having nanostructure formed on at least one side
  • imaging optical system satisfies the following condition:
  • TTL is a distance from the optical element positioned closest to an object side to an imaging point of the imaging optical system
  • f is a focal length of the entire imaging optical system
  • the imaging optical system further satisfies the following condition:
  • TTL is a distance from the optical element positioned closest to an object side to an imaging point of the imaging optical system
  • f is a focal length of the entire imaging optical system
  • the imaging optical system further satisfies the following condition:
  • the imaging optical system further satisfies the following condition:
  • fconv is a focal length of an optical system from the optical element on an image side than the metalens closest to an object side to the optical element closest to the image
  • fmeta is a focal length of the metalens closest to the object
  • focal length is -0.5/C1
  • C1 is a quadratic coefficient of a phase function of the metalens.
  • the imaging optical system further satisfies the following condition:
  • the metalens is arranged in vicinity of a diaphragm of the imaging optical system.
  • the imaging optical system further satisfies the following condition:
  • TTLconv is a distance from an object-side surface of the optical element closest to an image side of the metalens located closest to the object side to an image forming surface
  • fconv is a focal length of an optical system from the optical element on an image side than the metalens closest to an object side to the optical element closest to the image.
  • the metalens satisfies the following condition:
  • ndmeta is a refractive index of the nanostructure for a d-line.
  • the metalens satisfies the following condition:
  • ndmeta is a refractive index of the nanostructure for a d-line.
  • the nanostructure is composed of nanopillars, and the nanopillars satisfy the following condition:
  • h is the height of the nanopillar
  • t is a diameter of the nanopillar.
  • an imaging optical system is used for light whose wavelength satisfies the following condition:
  • the imaging optical system comprises at least one optical element, in which the at least one optical element consists only of:
  • At least one metalens having nanostructure formed on at least one side At least one metalens having nanostructure formed on at least one side.
  • the imaging optical system consists only of four or more metalenses, each of the metalenses having nanostructure formed on at least one side.
  • the imaging optical system further satisfies the following condition:
  • TTL is a distance from the optical element positioned closest to an object side to an imaging point of the imaging optical system
  • f is a focal length of the entire imaging optical system
  • the imaging optical system further satisfies the following condition:
  • the metalens satisfies the following condition:
  • ndmeta is a refractive index of the nanostructure for a d-line.
  • the metalens satisfies the following condition:
  • ndmeta is a refractive index of the nanostructure for a d-line.
  • the nanostructure is composed of nanopillars, and the nanopillars satisfy the following condition:
  • h is the height of the nanopillar
  • t is a diameter of the nanopillar.
  • the imaging optical system satisfies the following condition:
  • TTL is a distance from the optical element positioned closest to an object side to an imaging point of the imaging optical system
  • f is a focal length of the entire imaging optical system
  • F-number is F-number of the imaging optical system
  • the imaging optical system satisfies the following condition:
  • the imaging optical system satisfies the following condition:
  • the imaging optical system further satisfies the following condition:
  • fconv is a focal length of an optical system arranged from the optical element on an image side than the metalens closest to an object side to the optical element closest to the image
  • fmeta is a focal length of the metalens closest to the object
  • focal length is -0.5/C1
  • C1 is a quadratic coefficient of a phase function of the metalens, and the wavelength satisfies the following condition:
  • the imaging optical system further satisfies the following condition:
  • the metalens is arranged in vicinity of a diaphragm of the imaging optical system, and the wavelength satisfies the following condition:
  • the imaging optical system further satisfies the following condition:
  • TTLconv is a distance from an object-side surface of the optical element closest to an image side of the metalens located closest to the object side to an image forming surface
  • fconv is a focal length of an optical system arranged from the optical element on an image side than the metalens closest to an object side to the optical element closest to the image, and
  • the metalens satisfies the following condition:
  • ndmeta is a refractive index of the nanostructure for a d-line.
  • the metalens satisfies the following condition:
  • the nanostructure is composed of nanopillars, and the nanopillars satisfy the following condition:
  • h is the height of the nanopillar
  • t is a diameter of the nanopillar.
  • an imaging optical system comprises a plurality of optical element, in which the plurality of optical elements comprises:
  • At least one metalens having nanostructure formed on at least one side at least one metalens having nanostructure formed on at least one side
  • TTL is a distance from the optical element positioned closest to an object side to an imaging point of the imaging optical system
  • f is a focal length of the entire imaging optical system
  • F-number is F-number of the imaging optical system
  • the imaging optical system satisfies the following condition:
  • the imaging optical system satisfies the following condition:
  • the imaging optical system further satisfies the following condition:
  • fconv is a focal length of an optical system from the optical element on an image side than the metalens closest to an object side to the optical element closest to the image
  • fmeta is a focal length of the metalens closest to the object
  • focal length is -0.5/C1
  • C1 is a quadratic coefficient of a phase function of the metalens.
  • the imaging optical system further satisfies the following condition:
  • the metalens is arranged in vicinity of a diaphragm of the imaging optical system.
  • the imaging optical system further satisfies the following condition:
  • TTLconv is a distance from an object-side surface of the optical element closest to an image side of the metalens located closest to the object side to an image forming surface
  • fconv is a focal length of an optical system from the optical element on an image side than the metalens closest to an object side to the optical element closest to the image.
  • the metalens satisfies the following condition:
  • ndmeta is a refractive index of the nanostructure for a d-line.
  • the metalens satisfies the following condition:
  • the nanostructure is composed of nanopillars, and the nanopillars satisfy the following condition:
  • h is the height of the nanopillar
  • t is a diameter of the nanopillar.
  • an imaging optical system is used for light whose wavelength satisfies the following condition:
  • the imaging optical system comprises at least one optical element, in which the at least one optical element consists only of:
  • At least one metalens having nanostructure formed on at least one side At least one metalens having nanostructure formed on at least one side.
  • the imaging optical system consists only of four or more metalenses, each of the metalenses having nanostructure formed on at least one side.
  • the imaging optical system satisfies the following condition:
  • TTL is a distance from the optical element positioned closest to an object side to an imaging point of the imaging optical system
  • f is a focal length of the entire imaging optical system
  • F-number is F-number of the imaging optical system.
  • the imaging optical system satisfies the following condition:
  • the metalens satisfies the following condition:
  • ndmeta is a refractive index of the nanostructure for a d-line.
  • the metalens satisfies the following condition:
  • the nanostructure is composed of nanopillars, and the nanopillars satisfy the following condition:
  • h is the height of the nanopillar
  • t is a diameter of the nanopillar.
  • an imaging device comprises:
  • an optical device including the above-described imaging optical system
  • an imaging sensor for generating data based on light transmitted through the optical device.
  • an electronic device comprises an imaging device.
  • the imaging device comprises:
  • an optical device including the above-described imaging optical system
  • an imaging sensor for generating data based on light transmitted through the optical device.
  • such electronic device can be used for optical application such as a camera module, an Augmented Reality (AR) device, a Virtual Reality (VR) device, a hologram device, or a light field camera.
  • AR Augmented Reality
  • VR Virtual Reality
  • hologram hologram
  • light field camera a light field camera
  • the TOF sensor emits near infrared (NIR) light and receives light reflected from an object through optical elements. Phase differences between the emitted light and the received light are then digitized and output to a TOF controller. The TOF controller calculates the distance of each pixel from the phase difference data. In this way, a 3D image can be captured.
  • NIR near infrared
  • the TOF controller calculates the distance of each pixel from the phase difference data.
  • an electronic device can reduce the total track length while maintaining quality of the 3D image.
  • each nanostructure is formed on one side of each metalens.
  • an optical filter such as an IR cut filter or a low pass filter is located on the rightmost side.
  • the imaging optical system includes a metalens placed on the first from the object side, and seven lenses not having the nanostructure.
  • the material is made of SiN.
  • SiN is used as just one example, and other materials could be used.
  • FIG. 4a is a table of specifications for e-line (light with wavelength of 546.1 nm) .
  • FIG. 4b is a table of effective focal distances (EFL) .
  • FIG. 4c is a table of information on surfaces.
  • FIG. 4d is a table of aspherical coefficients.
  • FIG. 4e is a diagram showing a configuration of the imaging optical system.
  • FIG. 4f is a diagram showing chromatic aberration.
  • phase function ⁇ of the metasurface is represented as follows:
  • FIG. 4g is a table of the coefficients for the metasurface.
  • Table 1 shows specifications for nanopillars used for the metasurface (hereinafter referred to as “meta nanopillars” ) .
  • a material for the meta nanopillars is SiN whose refractive index is 1.9178.
  • FIG. 4h illustrates outward appearances of the metalens according to Example 1.
  • (a) is a top view of the metalens
  • (b) is a sideview of the metalens
  • (c) is a perspective view of a metalens.
  • the nanopillars according to this example are formed concentrically.
  • FIG. 4i shows a relationship between a target phase (0 to 2 ⁇ ) of light transmitted through the metalens at a distance (position) from the center O of the metalens.
  • the target phase is desired phase distribution of the metasurface which works for the lens system.
  • a desired phase shift can be designed by appropriately setting the radius at each position of the nanopillar.
  • the desired phase distribution from the lens system is determined. Then, the relationship between the phase distribution and the nanopillar's radius is found. Accordingly, it is possible to choose the nanopillar's radius for a certain postion in the metalens.
  • FIG. 4j is a diagram showing the relationship between the radius of the upper surface ( "r” in FIG. 2) and the phase (0 to 2 ⁇ ) of one nanopillar. Usually, the phase should cover 2 ⁇ area. As shown in FIG. 4j, the phase value increases with increasing radius of the upper surface of the nanopillar.
  • FIG. 4k is a gradation of the result of simulating the phase (- ⁇ to ⁇ ) of light transmitted through the nanopillar at a position specified by the radius ( “r” in FIG. 2) and height ( “z” in FIG. 2) of the upper surface of one nanopillar.
  • the phase value is indicated with gradation.
  • the height is constant, the phase increases as the radius increases.
  • FIG. 4l shows the result of simulating transmission (%) of light transmitted through the nanopillar at the position specified by the radius of the upper surface (50 to 130 nm) and height (1000 to 1500 nm) of one nanopillar.
  • the transmission is indicated with gradation.
  • the nanopillar has high transmission value.
  • the transmission changes correspondingly.
  • FIG. 4m shows the result of simulating the relationship between the distance (position) from the center O and the radius of the metalens according to one example.
  • the relationship between the position in the metalens and the corresponding nanopillar’s radius can be used for choosing nanopillar for metalens position.
  • FIG. 4n shows a result of simulating change (0 to 2 ⁇ ) in the phase of light transmitted through the metalens according to the present example.
  • the horizontal axis and the vertical axis correspond to the x coordinate and the y coordinate of FIG. 4h, respectively.
  • change in the phase is indicated with gradation.
  • the imaging optical system includes a metalens placed on the first from the object side, and seven lenses not having the nanostructure.
  • a diaphragm is placed on a surface S2 of the fifth lens (conv L4) from the object side.
  • Table 2 shows specifications for the meta nanopillars.
  • a material for the meta nanopillars is S 3 iN 4 . Its refractive index is 2.0531.
  • FIGS. 5a to 5g shows tables of information on the imaging optical system according to Example 2. Because FIGS. 5a to 5n correspond to FIGS. 4a to 4n, respectively, detailed descriptions on the figures are omitted.
  • the imaging optical system includes a metalens placed on the second from the object side, and seven lenses not having the nanostructure.
  • Table 3 shows specifications for the meta nanopillars.
  • a material for the meta nanopillars is GaN whose refractive index is 2.4164.
  • FIGS. 6a to 6g shows tables of information on the imaging optical system according to Example 3.
  • FIGS. 6a to 6n correspond to FIGS. 4a to 4n, respectively.
  • the imaging optical system includes a metalens placed on the first from the object side, and five lenses not having the nanostructure.
  • a diaphragm is placed on a surface S1 of the fourth lens (conv L3) from the object side.
  • Table 4 shows specifications for the meta nanopillars.
  • a material for the meta nanopillars is TiO 2 whose refractive index is 2.652.
  • FIGS. 7a to 7g shows tables of information on the imaging optical system according to Example 4.
  • FIGS. 7a to 7k correspond to FIGS. 4a to 4j and FIG. 4m, respectively.
  • the imaging optical system includes six metalenses.
  • each of the six metalenses is referred to as the first to sixth metalens from the object side (the left side) .
  • FIGS. 8a to 8c and 8f show tables of information on the imaging optical system according to Example 5 in which all lenses are metalenses.
  • FIG. 8a is a table of specifications for e-line.
  • FIG. 8b is a table of effective focal distances.
  • FIG. 8c is a table of information on surfaces.
  • FIG. 8d is a diagram showing a configuration of the imaging optical system.
  • FIG. 8e is a diagram showing chromatic aberration.
  • FIG. 8f is a table of information on metasurface.
  • FIGS. 8g (a) to (c) illustrate outward appearances of the first metalens.
  • FIG. 8h shows a relationship between a target phase of light transmitted through the first metalens at a position from the center of the first metalens.
  • FIG. 8i is a diagram showing the relationship between the radius of the upper surface and the phase of one nanopillar of the first metalens.
  • FIG. 8j shows the result of simulating the relationship between the position from the center and the radius of the first metalens.
  • FIGS. 8k (a) to (c) illustrate outward appearances of the second metalens.
  • FIG. 8l shows a relationship between a target phase of light transmitted through the second metalens at a position from the center of the second metalens.
  • FIG. 8m shows the result of simulating the relationship between the position from the center and the radius of the second metalens.
  • FIGS. 8n (a) to (c) illustrate outward appearances of the third metalens.
  • FIG. 8o shows a relationship between a target phase of light transmitted through the third metalens at a position from the center of the third metalens.
  • FIG. 8p shows the result of simulating the relationship between the position from the center and the radius of the third metalens.
  • FIGS. 8q (a) to (c) illustrate outward appearances of the fourth metalens.
  • FIG. 8r shows a relationship between a target phase of light transmitted through the fourth metalens at a position from the center of the fourth metalens.
  • FIG. 8s shows the result of simulating the relationship between the position from the center and the radius of the fourth metalens.
  • FIGS. 8t (a) to (c) illustrate outward appearances of the fifth metalens.
  • FIG. 8u shows a relationship between a target phase of light transmitted through the fifth metalens at a position from the center of the fifth metalens.
  • FIG. 8v shows the result of simulating the relationship between the position from the center and the radius of the fifth metalens.
  • FIGS. 8w (a) to (c) illustrate outward appearances of the sixth metalens.
  • FIG. 8x shows a relationship between a target phase of light transmitted through the sixth metalens at a position from the center of the sixth metalens.
  • FIG. 8y is a result of simulating a relationship between a distance from a center of a metalens and a radius of the sixth metalens.
  • the imaging optical system includes two metalenses.
  • each of the two metalenses is referred to as the first to second metalens from theobject side (the left side) .
  • FIGS. 9a to 9c and 9f show tables of information on the imaging optical system in which both two lenses are metalenses.
  • FIG. 9a is a table of specifications for e-line.
  • FIG. 9b is a table of effective focal distances.
  • FIG. 9c is a table of information on surfaces.
  • FIG. 9d is a diagram showing a configuration of the imaging optical system.
  • FIG. 9e is a diagram showing chromatic aberration.
  • FIG. 9f is a table of information on metasurface.
  • FIGS. 9g (a) to (c) illustrate outward appearances of the first metalens.
  • FIG. 9h shows a relationship between a target phase of light transmitted through the first metalens at a position from the center of the first metalens.
  • FIG. 9i is a diagram showing the relationship between the radius of the upper surface and the phase of one nanopillar of the first metalens.
  • FIG. 9j is a result of simulating a phase of light transmitted through a nanopillar.
  • FIG. 9k is a result of simulating transmission of light transmitted through a nanopillar.
  • FIG. 9l shows the result of simulating the relationship between the position from the center and the radius of the first metalens.
  • FIG. 9m shows a relationship between a target phase of light transmitted through the second metalens at a position from the center of the second metalens.
  • FIG. 9n shows the result of simulating the relationship between the position from the center and the radius of the second metalens.
  • the imaging optical system includes two metalenses and three conventional lenses.
  • each of the two metalenses is referred to as the first to second metalens from the object side (the left side) .
  • FIGS. 10a to 10d and 10g show tables of information on the imaging optical system in which both two lenses are metalenses.
  • FIG. 10a is a table of specifications for e-line.
  • FIG. 10b is a table of effective focal distances.
  • FIG. 10c is a table of information on surfaces.
  • FIG. 10d is a table of aspherical coefficients.
  • FIG. 8e is a diagram showing a configuration of the imaging optical system.
  • FIG. 8f is a diagram showing chromatic aberration.
  • FIG. 8g is a table of information on metasurface.
  • FIGS. 10h (a) to (c) illustrate outward appearances of the first metalens.
  • FIG. 10i shows a relationship between a target phase of light transmitted through the first metalens at a position from the center of the first metalens.
  • FIG. 10j is a diagram showing the relationship between the radius of the upper surface and the phase of one nanopillar of the first metalens.
  • FIG. 10k shows the result of simulating the relationship between the position from the center and the radius of the first metalens.
  • FIG. 10l shows a relationship between a target phase of light transmitted through the second metalens at a position from the center of the second metalens.
  • FIG. 10m shows the result of simulating the relationship between the position from the center and the radius of the second metalens.
  • Table 5-1 and Table 5-2 show a correspondence between the conditional expressions and examples.
  • the wavelength of the incident light is set to 546.1nm.
  • the wavelength of the incident light is set to 940nm.
  • the imaging optical system according to the above examples can reduce the total track length while maintaining high performance.

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