WO2021249609A1 - Structure en relief rétroréfléchissante dans un revêtement de gaufrage - Google Patents

Structure en relief rétroréfléchissante dans un revêtement de gaufrage Download PDF

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Publication number
WO2021249609A1
WO2021249609A1 PCT/EP2020/025271 EP2020025271W WO2021249609A1 WO 2021249609 A1 WO2021249609 A1 WO 2021249609A1 EP 2020025271 W EP2020025271 W EP 2020025271W WO 2021249609 A1 WO2021249609 A1 WO 2021249609A1
Authority
WO
WIPO (PCT)
Prior art keywords
embossing
lacquer
elevations
depressions
angle
Prior art date
Application number
PCT/EP2020/025271
Other languages
German (de)
English (en)
Inventor
Kai Herrmann SCHERER
Michael Rahm
Maik Rudolf Johann Scherer
Original Assignee
Giesecke+Devrient Currency Technology Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Giesecke+Devrient Currency Technology Gmbh filed Critical Giesecke+Devrient Currency Technology Gmbh
Priority to CN202080101342.6A priority Critical patent/CN115666961A/zh
Priority to PCT/EP2020/025271 priority patent/WO2021249609A1/fr
Publication of WO2021249609A1 publication Critical patent/WO2021249609A1/fr

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/324—Reliefs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/405—Marking
    • B42D25/425—Marking by deformation, e.g. embossing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44B—MACHINES, APPARATUS OR TOOLS FOR ARTISTIC WORK, e.g. FOR SCULPTURING, GUILLOCHING, CARVING, BRANDING, INLAYING
    • B44B5/00—Machines or apparatus for embossing decorations or marks, e.g. embossing coins
    • B44B5/02—Dies; Accessories
    • B44B5/026—Dies
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/12—Reflex reflectors
    • G02B5/122—Reflex reflectors cube corner, trihedral or triple reflector type
    • G02B5/124—Reflex reflectors cube corner, trihedral or triple reflector type plural reflecting elements forming part of a unitary plate or sheet
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/04—Printing plates or foils; Materials therefor metallic
    • B41N1/06—Printing plates or foils; Materials therefor metallic for relief printing or intaglio printing

Definitions

  • the invention relates to an embossing tool for producing a flat retroreflector which has a retroreflective corner cube relief structure formed in a curable embossing lacquer, in particular a UV lacquer, and which retroreflects electromagnetic radiation incident from an incidence side.
  • the embossing tool has a number n of adjacent depressions and / or elevations on one side, each of the n depressions and / or elevations being formed from three flat surfaces arranged at a specific angle ( ⁇ ') to one another.
  • the invention also relates to a method for producing such an embossing tool.
  • a retroreflective structure reflects incident electromagnetic radiation, for example light, largely independently of the direction of incidence and the orientation of the reflector in the direction from which the radiation is incident. This is known as retroreflection. In the case of plane mirrors, on the other hand, the reflection depends on the mirror orientation, which is perpendicular to the viewer only in exceptional cases.
  • Flat retroreflectors have a large number of individual retroreflectors lying next to one another. Retroreflective foils are a common realization of flat retroreflectors. They are used in a variety of ways, especially in traffic engineering, but also in security technology, for example in accordance with US 2014/0226212 A1 as security elements for authenticating documents of value, such as banknotes, debit or ID cards.
  • retroreflectors are widespread: Embedded, high-refractive-index microspheres which are mirrored on the underside, as described, for example, in US Pat. No. 4,763,985 and US 2009/0300953 A1.
  • the optical principle is based on so-called Lüneburg lenses, which reflect the incident light in the direction of the beam source.
  • the other variant, in the field of which the invention is arranged, is based on relief structures made up of plane surfaces, so-called corner cube structures, which have the shape of cube corners.
  • FIG. 1 schematically shows the relief structure of a flat retroreflector with the optical path of the retroreflection in a side view.
  • the retroreflector is constructed as a film composite, which comprises a carrier film 1 and a layer 2 made of an embossing lacquer, with a reflection structure 3 being molded into the layer 2.
  • the reflection structure 3 consists of plane surfaces which are arranged at an angle of 90 ° to one another, so that incident radiation is deflected several times and ultimately retroreflected.
  • 1b illustrates in a top view the path of retroreflection as it occurs in the case of triangular surfaces of a cube-corner mirror, from the juxtaposition of which the retroreflective relief structure for the flat retroreflector can be built up.
  • 1c and 1d show suitable cube corner surfaces for the relief structure in a top view or perspective.
  • Retroreflective sheeting for KLZ license plates and street signs is usually produced using the hot stamping process.
  • the structures of an embossing tool are converted into a thermoplastic almost true to shape.
  • the production of an embossing tool with corner cube structures by means of rotating styluses is known, for example, from WO 2018/151959 A1, WO 2018/151960 A1 or WO 2018/151964 A1.
  • Corner cube structures for a retroreflective film are, due to their depth of usually 15 ⁇ m to 80 ⁇ m, demanding in terms of embossing.
  • embossing in a curable embossing lacquer for example a UV lacquer, which cures after exposure to electromagnetic radiation in the ultraviolet (UV) wavelength range
  • a very flowable UV varnish required.
  • this UV varnish experiences a relatively high volume shrinkage during its curing, which is not isotropic, but is more pronounced in the vertical direction to the surface of the film than in the horizontal direction, since the UV varnish on the film does not change shape and form is firmly anchored.
  • This "anisotropic" shrinkage leads to a flattening of the corner cube structures and an enlargement of the corner cube angle (depending on the paint viscosity, chemical composition, substrate, temperature ).
  • Corner cube structures in which the angle between the respective planar surfaces is no longer 90 °, but deviates from 90 ° by more than +/- 0.5 °, almost completely lose their retroreflective properties.
  • the invention is therefore based on the object of developing a generic embossing tool for corner cube structures in such a way that the disadvantages of the prior art are eliminated.
  • the object of the invention is therefore to produce retroreflective sheeting with corner cube structures in embossed lacquer, in particular in UV lacquer. This object is achieved by the features of the independent claims. Further developments of the invention are the subject of the dependent claims.
  • the invention thus provides an embossing tool which retains or compensates for the shrinkage of the lacquer in that the embossed structures are made to be exaggerated.
  • the embossing tool itself therefore shows no retroreflective properties.
  • the embossing tool according to the invention is bent to form a cylinder or a cylinder segment and adjoining edges of the cylinder or an adjacent cylinder segment are welded to one another with an electromagnetic beam, for example a laser beam, to form an embossing cylinder can be. Because if a laser beam hits the non-retroreflective structures of the embossing tool, it is fundamentally not reflected back to the laser.
  • a curable embossing lacquer in the context of this invention is an embossing lacquer which is applied in the plastically deformable state to a substrate as a carrier and in which an embossing structure is molded with an embossing tool.
  • an embossing tool is, for example, an embossing die or an embossing cylinder.
  • the embossing lacquer is then cured, for example by means of UV radiation or thermal radiation, so that the embossing lacquer can no longer be plastically deformed and the embossing structures can no longer be changed.
  • Radically or cationically curing lacquers are used as radiation-curing embossing lacquers, which can be used on a large number of substrates such as PET, PVC, PE, PP, PMMA or PC.
  • An adhesive intermediate layer can be used for stable anchoring of the UV lacquer on the substrate.
  • the embossing tool according to the invention has a number n of adjoining depressions.
  • the number n of adjacent elevations in the curable embossing lacquer, which is shaped with this embossing tool, corresponds in its geometry and dimensions to the corresponding recesses in the embossing tool before the embossing lacquer has hardened.
  • the elevations in the embossing lacquer no longer correspond in terms of their geometry and their dimensions to the corresponding depressions in the embossing tool. Rather, the elevations flatten out due to the shrinkage during hardening, so that the angle between three flat surfaces, which are respectively arranged with respect to one another, increases.
  • the elevations flatten out due to the shrinkage during curing by the specific value X in such a way that the angle between three flat surfaces arranged with respect to one another is 90 ° and the elevations show retroreflective properties.
  • the value of X, by which the certain angle ( ⁇ ') is smaller than 90 °, and by which the embossing lacquer flattens out during curing, depends on the curable embossing lacquer used, the substrate to which the embossing lacquer is applied, and the curing conditions and is different for different curable embossing lacquers.
  • the value X for a specific curable embossing lacquer in combination with the substrate to be used is not known, the value X must be determined through preliminary tests.
  • elevations are molded in the embossing lacquer with an experimental embossing tool which has depressions with a first angle ⁇ 'and, after the embossing lacquer has hardened, the angle ⁇ of the resulting flanks of the elevations is measured. The difference between the measured angle ⁇ and 90 ° gives the correction value by which the angle ⁇ 'must be corrected in the following pass. If necessary, this process is repeated until the angle ⁇ is equal to 90 °.
  • the specific value X usually has a value of less than or equal to 3.5 °, preferably from 0.3 ° to 3.5 °, so that the specific angle ( ⁇ ') is greater than or equal to 86 .5 °, preferably 86.5 ° to 89.7 °.
  • Embossing lacquers known from the prior art are, for example, UV-curable hybrid polymers for micro-optical systems from the company "micro resist technology GmbH" of the Ormocer type.
  • the embossing lacquer "OrmoComp®” or “In- kOrmo” has a relative volume shrinkage of 5% to 7%
  • OrmoStamp® from 4% to 6%
  • OrmoCore and
  • OrmoClad from 2% to 5%
  • OrmoClear® from 3% to 5%
  • OrmoClear®10 of ⁇ 2%
  • OrmoClear®30 of ⁇ 2%.
  • X is therefore the value by which the embossing lacquer shrinks after curing, usually by 0.3 ° to 3.5 °.
  • the design of the embossing tool is determined depending on the structure of the retroreflective film, in particular whether the viewer is looking through the UV varnish at the cube-corner structures or through the layer that is complementary to the UV varnish.
  • the tool will have depressions in the form of cube corners, the opening angles of which are modified according to the invention with regard to the anticipated paint shrinkage.
  • the embossing tool has elevations in the form of modified cube corners, which leave corresponding depressions in the UV varnish.
  • the invention also relates to a method for producing an embossing tool according to the invention.
  • the embossing tool here consists of a substrate, depressions being made in one side of the substrate with a stylus, the stylus having an angle of 70.52 ° -X at its tip.
  • Such styluses consist, for example, of diamond, solid carbide, HSS-Co, SiC, TiC, tungsten or TiCN.
  • corresponding embossing tools are manufactured using diamond cutting.
  • a diamond stylus with an angle at the tip of 70.52 ° is used to create a grid of parallel furrows in the substrate of an embossing tool.
  • the substrate of the embossing tool preferably consists of brass (an alloy of copper and zinc), copper, nickel, nickel phosphorus, nickel vanadium, nickel silver (an alloy of nickel, copper and zinc) or cobalt.
  • Softer substrates are also often used are used, on the surface of which a hard coating is deposited, e.g. Cr, CrN, Ti, TiN, carbides, W, DLC (diamond like carbon).
  • a correspondingly more pointed diamond stylus with an angle at the tip of 70.52 ° -X is used.
  • the advantages of the invention are explained on the basis of the following exemplary embodiments and the supplementary figures.
  • the exemplary embodiments represent preferred embodiments to which, however, the invention is not intended to be restricted in any way.
  • the representations in the figures are highly schematic for better understanding and do not reflect the real conditions.
  • the proportions shown in the figures do not correspond to the real-world conditions and are used exclusively to improve the appearance vividness.
  • the embodiments described in the following exemplary embodiments are reduced to the essential core information for better understanding. In the practical implementation, much more complex patterns or images can be used.
  • FIG. 1 shows a planar retroreflector known from the prior art and in this case in FIG. 1a the retroreflector in side view, in FIG 1d suitable cube corner surfaces for the relief structure in plan or perspective,
  • FIG. 2 shows a first exemplary embodiment of a retroreflector manufactured with an embossing tool according to the invention in a side view
  • FIG. 3 shows a first exemplary embodiment of an embossing tool according to the invention in a side view
  • FIG. 4 shows a curable embossing lacquer embossed with the embossing tool from FIG. 3 and in this case in FIG. 4a before the curing of the embossing lacquer and in FIG. 4b after the curing of the embossing lacquer,
  • FIG. 5 shows a second exemplary embodiment of a retroreflector manufactured with an embossing tool according to the invention in a side view
  • 6 shows a second exemplary embodiment of an embossing tool according to the invention in a side view
  • FIG. 7 shows a curable embossing lacquer embossed with the embossing tool from FIG. 6 and in this case in FIG. 7 a before the curing of the embossing lacquer and in FIG. 7 b after the curing of the embossing lacquer.
  • FIG. 2 shows schematically a first exemplary embodiment of a retroreflector produced with an embossing tool according to the invention in a side view for viewing from above, i.e. on the top of the embossing lacquer 2 according to FIG. 1a.
  • the embossing lacquer 2 is shown in dashed lines before it has hardened, and with a solid line after it has hardened.
  • the flanks 3 'of the embossed structures have the angle ⁇ ' to one another in their "valley".
  • FIG. 3 shows a schematic side view of a first exemplary embodiment of an embossing tool 4, in one side of which two depressions 5 are made.
  • the depressions 5 have flanks which are aligned at an angle ⁇ 'to one another.
  • 4 shows a curable embossing lacquer 2 embossed with this embossing tool 4.
  • Fig. 5 shows schematically a second embodiment of a retroreflector manufactured with an embossing tool according to the invention in side view for viewing from below, ie through the embossing lacquer 2 through to the opposite side of the embossing lacquer 2.
  • the substrate 6 and the embossing lacquer 2 must in this case be transparent so that they allow incident light to pass through with almost no attenuation and almost no scattering. In this case, incident light rays are not reflected directly on the reflective upper side of the embossing lacquer as in FIG. 1 a or FIG. 2 or FIG. 4b, but only after passing through the transparent substrate 6 and the transparent embossing lacquer 2.
  • the reflective surface is in both The cases are the same, but the opposite side of this surface is reflective.
  • the embossing lacquer 2 is shown with broken lines before it has hardened, and with a solid line after it has hardened.
  • the flanks 3 ′ of the embossed structures Before hardening, the flanks 3 ′ of the embossed structures have the angle ⁇ ′ to one another at their apex.
  • FIGS. 2 to 7 show a schematic side view of a second exemplary embodiment of an embossing tool 4, on one side of which three elevations 8 are applied.
  • the elevations 8 have flanks which are aligned at an angle ⁇ 'to one another.
  • 7 shows a curable embossing lacquer 2 which is embossed with this embossing tool.
  • the representations in FIGS. 2 to 7 are not true to scale.
  • the depth of the depressions 5 or the height of the elevations 8 of the respective embossing tool 4 or 7 and the height of the elevations before the curing of the embossing lacquer 2 are shown greatly exaggerated for better clarity.
  • the angle ⁇ ' is also made more acute than in
  • the angle ⁇ is shown almost true to scale as a 90 ° angle.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Credit Cards Or The Like (AREA)

Abstract

L'invention se rapporte à une matrice de gaufrage destinée à la fabrication d'un rétroréflecteur plat, qui présente une structure en relief de cube de coin rétroréfléchissante formée dans un revêtement de gaufrage durcissable, en particulier un revêtement UV, et qui rétroréfléchit un rayonnement électromagnétique incident depuis un côté d'incidence. La matrice de gaufrage présente un nombre n de creux et/ou d'élévations mutuellement adjacents sur un côté, chacun des n creux et/ou n élévations étant formé à partir de trois faces agencées selon un certain angle (α') les unes par rapport aux autres. L'invention se rapporte également à un procédé permettant de produire une matrice de gaufrage de ce type. Selon l'invention, l'angle (α') est inférieure à 90° par une certaine valeur X, à savoir, α' = 90° - X, de telle sorte que le nombre n d'élévations et/ou de creux mutuellement adjacents moulés dans le revêtement de gaufrage par la matrice de gaufrage se composent chacun de trois faces agencées selon un angle de 90° les unes par rapport aux autres après que le revêtement de gaufrage durcissable a durci. Des élévations de la matrice de gaufrage correspondent à des creux dans le revêtement de gaufrage et des creux dans la matrice de gaufrage correspondent à des élévations du revêtement de gaufrage.
PCT/EP2020/025271 2020-06-09 2020-06-09 Structure en relief rétroréfléchissante dans un revêtement de gaufrage WO2021249609A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN202080101342.6A CN115666961A (zh) 2020-06-09 2020-06-09 压印漆中的逆反射的凸纹结构
PCT/EP2020/025271 WO2021249609A1 (fr) 2020-06-09 2020-06-09 Structure en relief rétroréfléchissante dans un revêtement de gaufrage

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2020/025271 WO2021249609A1 (fr) 2020-06-09 2020-06-09 Structure en relief rétroréfléchissante dans un revêtement de gaufrage

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WO2021249609A1 true WO2021249609A1 (fr) 2021-12-16

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Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4763985A (en) 1986-08-01 1988-08-16 Minnesota Mining And Manufacturing Company Retroreflective sheet with enhanced brightness
US5656360A (en) 1996-02-16 1997-08-12 Minnesota Mining And Manufacturing Company Article with holographic and retroreflective features
EP1149317B1 (fr) * 1999-01-21 2007-06-06 Reflexite Corporation Construction prismatique a surfaces decouvertes, retroreflechissante, et durable
DE60125484T2 (de) * 2000-04-10 2007-06-21 Nippon Carbide Kogyo K.K. Retroreflektierende folie mit gedruckter schicht
US20090300953A1 (en) 2005-12-21 2009-12-10 Frisch Ruediger T Semi-transparent retroreflective sheet and use thereof to make a backlit license plate
US20140226212A1 (en) 2011-08-02 2014-08-14 De La Rue International Limited Security devices
WO2018151960A1 (fr) 2017-02-14 2018-08-23 3M Innovative Properties Company Éléments de coin de cube non orthogonaux et réseaux de ceux-ci fabriqués par fraisage combiné
EP3418066A1 (fr) * 2017-06-21 2018-12-26 Giesecke+Devrient Currency Technology GmbH Procédé de fabrication d'un outil d'estampage pour structures détectables de manière tactile

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7156527B2 (en) * 2003-03-06 2007-01-02 3M Innovative Properties Company Lamina comprising cube corner elements and retroreflective sheeting
DE102014018890A1 (de) * 2014-12-17 2016-06-23 Giesecke & Devrient Gmbh Sicherheitselement, Verfahren zum Herstellen desselben und mit dem Sicherheitselement ausgestatteter Datenträger
DE102015116715A1 (de) * 2015-10-01 2017-04-06 Erich Utsch Ag Retroreflektierendes Schild und Herstellungsverfahren hierzu

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4763985A (en) 1986-08-01 1988-08-16 Minnesota Mining And Manufacturing Company Retroreflective sheet with enhanced brightness
US5656360A (en) 1996-02-16 1997-08-12 Minnesota Mining And Manufacturing Company Article with holographic and retroreflective features
EP1149317B1 (fr) * 1999-01-21 2007-06-06 Reflexite Corporation Construction prismatique a surfaces decouvertes, retroreflechissante, et durable
DE60125484T2 (de) * 2000-04-10 2007-06-21 Nippon Carbide Kogyo K.K. Retroreflektierende folie mit gedruckter schicht
US20090300953A1 (en) 2005-12-21 2009-12-10 Frisch Ruediger T Semi-transparent retroreflective sheet and use thereof to make a backlit license plate
US20140226212A1 (en) 2011-08-02 2014-08-14 De La Rue International Limited Security devices
WO2018151960A1 (fr) 2017-02-14 2018-08-23 3M Innovative Properties Company Éléments de coin de cube non orthogonaux et réseaux de ceux-ci fabriqués par fraisage combiné
WO2018151964A1 (fr) 2017-02-14 2018-08-23 3M Innovative Properties Company Articles de sécurité comprenant des groupes de microstructures réalisées par fraisage combiné
WO2018151959A1 (fr) 2017-02-14 2018-08-23 3M Innovative Properties Company Procédés de fraisage en bout destinés à la fabrication de microstructures, en particulier d'éléments coins de cube et articles comprenant de telles microstructures
EP3418066A1 (fr) * 2017-06-21 2018-12-26 Giesecke+Devrient Currency Technology GmbH Procédé de fabrication d'un outil d'estampage pour structures détectables de manière tactile

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