WO2021249407A1 - 衍射光学元件的设计方法、衍射光学元件及设计系统 - Google Patents
衍射光学元件的设计方法、衍射光学元件及设计系统 Download PDFInfo
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0012—Optical design, e.g. procedures, algorithms, optimisation routines
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/4205—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/4266—Diffraction theory; Mathematical models
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B2005/1804—Transmission gratings
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1842—Gratings for image generation
Definitions
- the present invention generally relates to the field of optical technology, and more particularly to a design method of a diffractive optical element, a diffractive optical element designed by the method, and a design system.
- the pattern projected by the diffractive optical element has the characteristics of large field of view, complex graphics, fine and clear lines, etc. For example, when making a target image, it is necessary to use a thinner line width, even a single pixel line width, and then convert a flat target image with a complex pattern to a spherical surface, and design diffractive optical elements based on the spherical image. Due to the DOE algorithm characteristics, when the line width of the target map is thin, the coordinate transformation and distortion correction calculation will cause the phenomenon of missing points. If the diffractive optical element designed with a spherical map with some missing points is used, the actual pattern projected The continuity and uniformity are both poor, which affects the practicability and aesthetics of the projected pattern.
- DOE diffractive optical element
- the present invention provides a design method of a diffractive optical element, which is characterized in that it includes:
- S104 Calculate the phase distribution of the diffractive optical element according to the third light field pattern.
- the step S101 includes: drawing the first light field pattern using a line width of one pixel.
- the step S102 includes: calculating according to the working distance and the field of view of the diffractive optical element, and converting the first light field pattern on the target plane into the second light field pattern on the spherical surface. Two light field patterns.
- the step S102 further includes: transforming the first light field pattern on the target plane into the second light field pattern on the spherical surface through coordinate transformation and grayscale compensation.
- the step S103 includes: filling the break points in the middle of the line segments in the second light field pattern on the spherical surface.
- the step S103 includes: filling the break points at the intersection of the multiple line segments in the second light field pattern on the spherical surface.
- the step S103 includes: calculating the gray value of the missing point by the gray value of the adjacent point of the missing point.
- the step S103 includes: performing compensation through drawing software or manually.
- the present invention also provides a diffractive optical element, which is designed by the method described above.
- the present invention also provides a design system for diffractive optical elements, including:
- the phase distribution unit of the diffractive optical element is calculated according to the third light field pattern on the corrected spherical surface.
- a preferred embodiment of the present invention provides a method for designing a diffractive optical element, which includes transforming a plane target image through coordinate transformation to obtain a spherical image, performing breakpoint compensation and correction on the spherical image, and then designing a diffractive optical element based on the corrected spherical image .
- the design method improves the projection quality of the diffractive optical element, and obtains a projection pattern with good continuity and uniformity. It makes possible a large field of view, high precision, clear, uniform, and complex projected patterns, and improves the practicability of the diffractive optical element in engineering applications and the aesthetics of the projected patterns.
- the invention also provides a diffractive optical element designed using the design method and a system for designing the diffractive optical element.
- Figure 1 schematically shows a large field of view pattern projection system using diffractive optical elements
- Figure 2 shows a spherical target map calculated from a planar target map
- Figure 3a shows a plan target diagram according to a preferred embodiment of the present invention
- Figure 3b shows a spherical target image obtained after coordinate transformation of a planar target image according to a preferred embodiment of the present invention
- Figure 3c shows the breakpoints of the large field of view part of the spherical target image transformed according to a preferred embodiment of the present invention
- Figure 4 shows a design method of a diffractive optical element according to a preferred embodiment of the present invention
- Figure 5a shows a plan target diagram according to a preferred embodiment of the present invention
- Figure 5b shows some points and their gray values of a planar target image according to a preferred embodiment of the present invention
- Fig. 6a shows a diagram of a spherical target after coordinate transformation and gray-scale compensation according to a preferred embodiment of the present invention
- Fig. 6b shows some points and their gray values of the transformed spherical target image according to a preferred embodiment of the present invention
- Figure 7a shows a diagram of a spherical target after breakpoint compensation according to a preferred embodiment of the present invention
- Figure 7b shows some points and their gray values of the compensated spherical target image according to a preferred embodiment of the present invention
- Figure 8a shows an uncompensated partial spherical target diagram according to a preferred embodiment of the present invention
- FIG. 8b shows a diffractive optical element designed according to an uncompensated spherical target map according to a preferred embodiment of the present invention, and the target light field effect obtained by simulation;
- Figure 9a shows a partial spherical target diagram after breakpoint compensation according to a preferred embodiment of the present invention
- Fig. 9b shows a diffractive optical element designed according to a spherical target map after breakpoint compensation according to a preferred embodiment of the present invention, and the target light field effect obtained by simulation.
- first and second are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features. Therefore, the features defined with “first” and “second” may explicitly or implicitly include one or more of the features. In the description of the present invention, “multiple” means two or more than two, unless otherwise specifically defined.
- connection should be understood in a broad sense, for example, it can be a fixed connection or a detachable connection.
- Connected or integrally connected It can be mechanically connected, or electrically connected or can communicate with each other; it can be directly connected or indirectly connected through an intermediate medium, it can be the internal communication of two components or the interaction of two components relation.
- the specific meanings of the above-mentioned terms in the present invention can be understood according to specific situations.
- the "on” or “under” of the first feature of the second feature may include the first and second features in direct contact, or may include the first and second features. Not in direct contact but through other features between them.
- “above”, “above” and “above” the second feature of the first feature include the first feature being directly above and obliquely above the second feature, or it only means that the level of the first feature is higher than that of the second feature.
- the “below”, “below” and “below” of the first feature of the second feature include the first feature directly above and obliquely above the second feature, or it simply means that the level of the first feature is smaller than the second feature.
- a large field of view pattern projection system 10 is taken as an example to illustrate the process of pattern projection.
- the large field of view pattern projection system 10 when the light source 11 is driven, a laser beam is emitted and incident on the diffractive optical element 12.
- the diffractive optical element 12 is located downstream of the light path of the light source 11, receives the light beam projected from the light source 11, and modulates the light beam to project a preset pattern.
- the light beam projected by the diffractive optical element 12 is projected onto the target plane 14 to form a plane light field 15 with a large field of view.
- the planar light field 15 is a pattern customized according to engineering and design requirements, such as straight lines, crosshairs, rectangular grids, or other patterns.
- the design of diffractive optical elements is based on the angular spectrum theory, it is necessary to calculate the amplitude and/or phase of the light wave on the angular spectrum, that is, it is necessary to calculate the propagation and superposition of the amplitude and/or phase of the light wave on the spherical surface, so in the design of diffraction
- the spherical target map converted from the flat target map is shown in Figure 2.
- the customized target pattern requires clear and fine lines. Therefore, when drawing a flat target image, you need to use a smaller line width to draw the line of the target image. For example, use one pixel for drawing. In the "plane to spherical" coordinate conversion, the plane target image drawn by a single pixel will be distorted during the conversion into a spherical target image, as shown in Figure 3a, Figure 3b and Figure 3c.
- Figure 3a is an embodiment of a target pattern customized according to engineering and design requirements, in which a flat target map drawn using a single pixel line width
- Figure 3b is a spherical target map obtained after coordinate conversion of the flat target map
- Figure 3c is an enlarged view of a corner far from the center of the field of view in the spherical target image. Since a single-pixel line width is used to draw a flat target image (Figure 3a), after coordinate transformation, Figure 3b is obtained, and the edge area of Figure 3b is distorted.
- the present invention provides a method for designing a more ideal diffractive optical element by correcting the distortion generated during the conversion of a flat target image to a spherical target image.
- a design method 40 of a diffractive optical element including:
- step S101 a first light field pattern on the target plane is obtained. That is, according to the requirements of industrial engineering and artistic design, a plan view of the pre-customized target pattern is drawn, that is, the plan target map (the first light field pattern).
- step S102 the first light field pattern on the target plane is converted into a second light field pattern on the spherical surface. That is, coordinate conversion is performed, and a spherical target image (second light field pattern) is calculated according to the first light field pattern, the working distance of the diffractive optical element, and/or the field of view angle.
- step S103 the missing points of the second light field pattern on the spherical surface are compensated to compensate for the missing points and/or break points, and the gray value is matched, so as to obtain the corrected third light field pattern.
- step S104 the phase distribution of the diffractive optical element is calculated according to the third light field pattern. That is, according to the corrected spherical target map (third light field pattern), the phase distribution of the micro-nano structure unit of the diffractive optical element is designed, thereby improving the quality of the projected pattern of the diffractive optical element.
- the design method 40 is described in detail with reference to FIGS. 5a-9b.
- a line width of one pixel is used to draw the first light field pattern, so as to obtain a clear and fine target pattern.
- FIG. 5a is a first light field pattern drawn using a line width of one pixel
- FIG. 5b is an enlarged schematic diagram of some points in the first light field pattern and the gray value of each point.
- step S102 calculation is performed according to the first light field pattern, the working distance of the diffractive optical element, and/or the field of view angle to obtain the second light field pattern.
- the pixels will be compressed when the large field of view area of the flat target image is converted into the spherical target image, which results in the uniform intensity of the original light field (gray scale).
- the plane target image with the same value will be converted into a spherical target image with uneven light field intensity (inconsistent gray value). Therefore, when the coordinate conversion from the plane to the spherical surface is performed, the gray value needs to be calculated and converted accordingly.
- step S103 the missing points of the second light field pattern on the spherical surface are compensated and the gray value is matched to obtain the corrected third light field pattern, for example, Including one or more of the following treatments:
- Fig. 7a shows the modified third light field pattern
- Fig. 7b shows an enlarged view of some points in the third light field pattern and their gray values.
- point 701 is the breakpoint in the middle of the line segment (corresponding to the missing point 601 in Figure 6b)
- point 702 is the breakpoint at the intersection of the two line segments (corresponding to the missing point 602 in Figure 6b).
- 701 and point 702 are filled, and the gray value of point 701 and point 702 is calculated by using the gray value of the adjacent point of point 701 and point 702.
- the gray value of the filled dot can be obtained by rounding the average value of the gray value of the adjacent two ends of the dot.
- the third light field pattern in FIG. 7a becomes continuous and smooth.
- the breakpoint compensation can be done by drawing software or manually.
- the line width of the pattern is required to be one pixel, the pattern is 10*10 squares, and the size of each square is 8cm*8cm.
- the working distance of the diffractive optical element is 100cm, the projected field of view is 40°*40°, and the wavelength of the light source is 650nm.
- DOE diffractive optical element
- a single pixel is used to draw a grid shape on a plane, that is, a plane target map, as shown in Figure 5a.
- the spherical target image is calculated, as shown in Figure 6a.
- a diffractive optical element DOE is designed, and the diffractive optical element can produce a better projection effect.
- Figure 8a shows the uncompensated part of the spherical target map
- Figure 8b is the target light field effect obtained by the DOE simulation designed using the spherical target map. It can be seen that there are multiple breakpoints in the middle of the enlarged line. The line quality is poor.
- Figure 9a is a partial spherical target map after compensation and correction
- Figure 9b is a DOE designed using the corrected spherical target map, and the target light field effect obtained by simulation. It can be seen that the number of broken points in the middle of the line after magnification is reduced Significantly reduced, the overall line quality is higher.
- the present invention also provides a diffractive optical element designed by the method described above.
- the present invention also provides a diffractive optical element design system, including:
- the phase distribution unit of the diffractive optical element is calculated according to the third light field pattern on the corrected spherical surface.
- a preferred embodiment of the present invention provides a method for designing a diffractive optical element, which includes transforming a plane target image through coordinate transformation to obtain a spherical target image, performing breakpoint compensation and correction on the spherical target image, and then designing it based on the corrected spherical target image Diffractive optical element.
- the design method improves the projection quality of the diffractive optical element, and obtains a projection pattern with good continuity and uniformity. It makes possible a large field of view, high precision, clear, uniform, and complex projection pattern, and improves the practicality of the diffractive optical element in engineering applications and the aesthetics of the projection pattern.
- the invention also provides a diffractive optical element designed using the design method and a system for designing the diffractive optical element.
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Abstract
本发明提供了一种衍射光学元件的设计方法,其特征在于,包括:S101:获得目标平面上的第一光场图案;S102:将所述目标平面上的第一光场图案转换为球面上的第二光场图案;S103:对所述球面上的第二光场图案的缺失点进行补偿,并匹配灰度值,从而得到修正后的第三光场图案;和S104:根据所述第三光场图案,计算得到所述衍射光学元件的相位分布。该设计方法改善了衍射光学元件的投射质量。
Description
本发明大致涉及光学技术领域,尤其涉及一种衍射光学元件的设计方法,用该方法设计的衍射光学元件,以及设计系统。
在一些应用场景下,需要衍射光学元件(DOE)投射出的图案具有:大视场、图形复杂、线条精细清晰等特点。例如,在制作目标图时,需要使用较细的线宽,甚至是单像素线宽,再将具有复杂图案的平面目标图转换到球面,根据球面图设计衍射光学元件。由于DOE的算法特性,在目标图线宽较细时,进行坐标变换和畸变矫正运算会出现丢点的现象,如果使用部分点缺失的球面图设计出来的衍射光学元件,实际投射出来的图案的连续性和均匀性都较差,影响了投射图案的实用性和美观度。
背景技术部分的内容仅仅是公开人所知晓的技术,并不当然代表本领域的现有技术。
发明内容
有鉴于现有技术的至少一个缺陷,本发明提供一种衍射光学元件的设计方法,其特征在于,包括:
S101:获得目标平面上的第一光场图案;
S102:将所述目标平面上的第一光场图案转换为球面上的第二光场图案;
S103:对所述球面上的第二光场图案的缺失点进行补偿,并匹配灰度值,从而得到修正后的第三光场图案;和
S104:根据所述第三光场图案,计算得到所述衍射光学元件的相位分布。
根据本发明的一个方面,其中所述步骤S101包括:使用一个像素的线宽绘制所述第一光场图案。
根据本发明的一个方面,其中所述步骤S102包括:根据所述衍射光学元件的工作距离和视场角进行计算,将所述目标平面上的第一光场图案转换为所述球面上的第二光场图案。
根据本发明的一个方面,其中所述步骤S102还包括:通过坐标变换和灰度补偿将所述目标平面上的第一光场图案转换为所述球面上的第二光场图案。
根据本发明的一个方面,其中所述步骤S103包括:对所述球面上的第二光场图案中的线段中间的断点进行填充。
根据本发明的一个方面,其中所述步骤S103包括:对所述球面上的第二光场图案中的多条线段相交处的断点进行填充。
根据本发明的一个方面,其中所述步骤S103包括:通过所述缺失点的相邻点的灰度值计算所述缺失点的灰度值。
根据本发明的一个方面,其中所述步骤S103包括:通过绘图软件或人工的方式进行补偿。
本发明还提供一种衍射光学元件,通过如上所述的方法设计。
本发明还提供一种衍射光学元件的设计系统,包括:
生成目标平面上的第一光场图案的单元;
将所述目标平面上的第一光场图案转换为球面上的第二光场图案的单元;
对所述球面上的第二光场图案的缺失点进行补偿并匹配灰度值、从而得到修正后的球面上的第三光场图案的单元;和
根据所述修正后的球面上的第三光场图案计算得到所述衍射光学元件的相位分布的单元。
本发明的优选实施例提供了一种衍射光学元件的设计方法,包括将平面目标图经过坐标变换得到球面图,对球面图进行断点补偿、修正,再根据修正后的球面图设计衍射光学元件。该设计方法改善了衍射光学元件的投射质量,得到连续性和均匀性都较好的投射图案。使得大视场、高精度、清晰、 均匀、复杂的投射图案成为了可能,提高了衍射光学元件在工程应用中的实用性及其投射图案的美观度。本发明还提供一种使用该设计方法设计的衍射光学元件,以及设计衍射光学元件的系统。
附图用来提供对本发明的进一步理解,并且构成说明书的一部分,与本发明的实施例一起用于解释本发明,并不构成对本发明的限制。在附图中:
图1示意性地示出了应用衍射光学元件的大视场图案投射系统;
图2示出了根据平面目标图计算得到的球面目标图;
图3a示出了根据本发明的一个优选实施例的平面目标图;
图3b示出了根据本发明的一个优选实施例将平面目标图进行坐标变换后得到的球面目标图;
图3c示出了根据本发明的一个优选实施例变换后的球面目标图的大视场角部分的断点情况;
图4示出了根据本发明的一个优选实施例的衍射光学元件的设计方法;
图5a示出了根据本发明的一个优选实施例的平面目标图;
图5b示出了根据本发明的一个优选实施例的平面目标图的部分点及其灰度值;
图6a示出了根据本发明的一个优选实施例的经过坐标变换、灰度补偿后的球面目标图;
图6b示出了根据本发明的一个优先实施例的变换后的球面目标图的部分点及其灰度值;
图7a示出了根据本发明的一个优选实施例的经过断点补偿后的球面目标图;
图7b示出了根据本发明的一个优选实施例的补偿后的球面目标图的部分点及其灰度值;
图8a示出了根据本发明的一个优选实施例的未补偿的部分球面目标图;
图8b示出了根据本发明的一个优选实施例的根据未补偿的球面目标图设计的衍射光学元件,并仿真得出的目标光场效果;
图9a示出了根据本发明的一个优选实施例的进行断点补偿后的部分球面目标图;
图9b示出了根据本发明的一个优选实施例的根据断点补偿后的球面目标图设计的衍射光学元件,并仿真得出的目标光场效果。
在下文中,仅简单地描述了某些示例性实施例。正如本领域技术人员可认识到的那样,在不脱离本发明的精神或范围的情况下,可通过各种不同方式修改所描述的实施例。因此,附图和描述被认为本质上是示例性的而非限制性的。
在本发明的描述中,需要理解的是,术语"中心"、"纵向"、"横向"、"长度"、"宽度"、"厚度"、"上"、"下"、"前"、"后"、"左"、"右"、"竖直"、"水平"、"顶"、"底"、"内"、"外"、"顺时针"、"逆时针"等指示的方位或位置关系为基于附图所示的方位或位置关系,仅是为了便于描述本发明和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本发明的限制。此外,术语"第一"、"第二"仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有"第一"、"第二"的特征可以明示或者隐含地包括一个或者更多个所述特征。在本发明的描述中,"多个"的含义是两个或两个以上,除非另有明确具体的限定。
在本发明的描述中,需要说明的是,除非另有明确的规定和限定,术语"安装"、"相连"、"连接"应做广义理解,例如,可以是固定连接,也可以是可拆卸连接,或一体地连接:可以是机械连接,也可以是电连接或可以相互通讯;可以是直接相连,也可以通过中间媒介间接相连,可以是两个元件内部的连通或两个元件的相互作用关系。对于本领域的普通技术人员而言,可以根据 具体情况理解上述术语在本发明中的具体含义。
在本发明中,除非另有明确的规定和限定,第一特征在第二特征之"上"或之"下"可以包括第一和第二特征直接接触,也可以包括第一和第二特征不是直接接触而是通过它们之间的另外的特征接触。而且,第一特征在第二特征"之上"、"上方"和"上面"包括第一特征在第二特征正上方和斜上方,或仅仅表示第一特征水平高度高于第二特征。第一特征在第二特征"之下"、"下方"和"下面"包括第一特征在第二特征正上方和斜上方,或仅仅表示第一特征水平高度小于第二特征。
下文的公开提供了许多不同的实施方式或例子用来实现本发明的不同结构。为了简化本发明的公开,下文中对特定例子的部件和设置进行描述。当然,它们仅仅为示例,并且目的不在于限制本发明。此外,本发明可以在不同例子中重复参考数字和/或参考字母,这种重复是为了简化和清楚的目的,其本身不指示所讨论各种实施方式和/或设置之间的关系。此外,本发明提供了的各种特定的工艺和材料的例子,但是本领域普通技术人员可以意识到其他工艺的应用和/或其他材料的使用。
以下结合附图对本发明的实施例进行说明,应当理解,此处所描述的实施例仅用于说明和解释本发明,并不用于限定本发明。
如图1所示,以大视场图案投射系统10为例说明图案投射的过程。大视场图案投射系统10中,光源11被驱动时发射出激光束,入射到衍射光学元件12上。衍射光学元件12位于光源11的光路下游,接收光源11投射出的光束,并经过调制后投射出预设图案。衍射光学元件12投射出的光束投射到目标平面14上,形成大视场平面光场15。以工具类衍射光学元件为例,平面光场15为根据工程、设计所需定制的图案,例如直线、十字线、矩形网格或者其他图案。
由于衍射光学元件的设计是基于角谱理论的,需要在角谱上进行光波振幅和/或相位的计算,即需要在球面上计算光波的振幅和/或相位的传播及叠 加,因此在设计衍射光学元件时,需要将投射在目标平面上的预定平面光场图案,即平面目标图,转换成相应的球面光场图案,即球面目标图,然后基于该球面目标图以及光源参数、投射工作距离和/或视场角等参数进行衍射光学元件的相位分布计算。由平面目标图转换成的球面目标图,如图2所示。
然而,在一些应用场景下,定制的目标图案要求线条清晰、精细,因此在绘制平面目标图时,需要使用较小的线宽来绘制目标图的线条,例如使用一个像素进行绘制,在进行上述“平面到球面”的坐标转换中,单像素绘制的平面目标图在转换成球面目标图的过程中会发生畸变,如图3a、图3b和图3c所示。
图3a为根据工程、设计所需定制的目标图案的一个实施例,其中使用单像素线宽绘制出的平面目标图,图3b为将该平面目标图进行坐标转换后所得到的球面目标图,图3c为球面目标图中远离视场中心的一角的放大图。由于使用单像素线宽绘制平面目标图(图3a),经坐标变换后,得到图3b,图3b的边缘区域存在畸变。如图3a、图3b所示,越是接近视场中心的部分,图3b和图3a中相对应的部分越近似,畸变越小;越是远离视场中心的部分,图3b和图3a中相对应的部分差异越大,畸变越大,可能出现断点、丢点的情况。
如果使用存在畸变(丢点、断点)的球面目标图进行衍射光学元件(DOE)设计,则设计出来的衍射光学元件,其实际投射出的图案会存在更为严重的畸变,连续性和均匀性都较差。因此,本发明提供一种通过修正平面目标图向球面目标图转换过程中产生的畸变,来设计更加理想的衍射光学元件的方法。如图4所示,根据本发明的一个优选实施例,本发明提供一种衍射光学元件的设计方法40,包括:
在步骤S101中,获得目标平面上的第一光场图案。即根据工业工程、艺术设计所需,绘制预先定制的目标图案的平面图,即平面目标图(第一光场图案)。
在步骤S102中,将所述目标平面上的第一光场图案转换为球面上的第二 光场图案。即进行坐标转换,根据第一光场图案、衍射光学元件的工作距离和/或视场角,计算得出球面目标图(第二光场图案)。
在步骤S103中,对所述球面上的第二光场图案的缺失点进行补偿,弥补丢点和/或断点,并匹配灰度值,从而得到修正后的第三光场图案。
在步骤S104中,根据所述第三光场图案,计算得到所述衍射光学元件的相位分布。即根据修正后的球面目标图(第三光场图案),设计衍射光学元件的微纳结构单元的相位分布,从而改善了衍射光学元件的投射图案质量。
参考图5a-图9b详细描述设计方法40。
根据本发明的一个优选实施例,在步骤S101中,使用一个像素的线宽绘制第一光场图案,从而得到清晰、精细的目标图案。如图5a、图5b所示,图5a为使用一个像素的线宽绘制的第一光场图案,图5b为第一光场图案中的部分点的放大示意图及各点灰度值。
根据本发明的一个优选实施例,在步骤S102中,根据第一光场图案、衍射光学元件的工作距离和/或视场角进行计算,得到第二光场图案。另外,在从第一光场图案向第二光场图案转换过程中,由于平面目标图的大视场角区域转换成球面目标图时像素会被压缩,从而导致原本光场强度均匀(灰度值一致)的平面目标图会转换成光场强度不均匀(灰度值不一致)的球面目标图,因此在进行从平面到球面的坐标转换时还需要对的灰度值进行相应的计算转换,以获得第二光场图案中各个点的灰度值。虽然以上提及的是光场强度均匀的预定目标光场的情况,但本领域技术人员可以显而易见地知道,在光场强度不均匀的预定目标光场的情况下,也需要对灰度值进行相应的计算转换。如图6a、图6b所示,图6a示出了经过坐标变换、灰度转换后得到的第二光场图案,图6b示出了第二光场图案中的部分点的放大图及其灰度值,其中可以看出,平面目标图图转换为球面目标图后,灰度变得不均匀,并且出现了断点、丢点,使得线型图案变得不连续,如图6b所示,点601、点602为缺失点。
根据本发明的一个优选实施例,在步骤S103中,对所述球面上的第二光 场图案的缺失点进行补偿,并匹配灰度值,从而得到修正后的第三光场图案,例如可包括以下处理中的一个或多个:
(1)对所述球面上的第二光场图案中的线段中间的断点进行填充,例如对图6b中的点601进行填充;
(2)对所述球面上的第二光场图案中的多条线段相交处的断点进行填充,例如对图6b中的点602进行填充。
(3)通过所述缺失点的相邻点的灰度值计算所述缺失点的灰度值。
如图7a、图7b所示,其中图7a示出了修正后的第三光场图案,图7b示出了第三光场图案中的部分点的放大图及其灰度值。在图7b中,点701为线段中间的断点(对应于图6b中的缺失点601),点702为两条线段相交处的断点(对应于图6b中的缺失点602),对点701、点702进行填充,并利用点701、点702相邻的点的灰度值计算点701、点702的灰度值。填充点的灰度值可以通过相邻的两端的点的灰度值的平均值取整来得到。经过修正后,图7a中的第三光场图案变得连续平滑。
根据本发明的一个优选实施例,断点补偿可以通过绘图软件或人工的方式完成。
根据本发明的一个优选实施例,如图5a所示的平面目标图,要求图案的线宽为一个像素,该图案为10*10个方格,每个方格的尺寸为8cm*8cm。衍射光学元件的工作距离为100cm,投射视场范围为40°*40°,光源的波长为650nm。在设计衍射光学元件(DOE)时,利用单像素绘制出平面上的网格形状,即平面目标图,如图5a所示。通过坐标变换和灰度补偿的方式,计算得到球面目标图,如图6a所示。针对缺失的点,用绘图软件或手动逐点补偿,再根据坐标变换后的相邻点的灰度补偿相应的灰度像素值,如图7a所示。根据修正后的球面目标图,设计得到衍射光学元件DOE,该衍射光学元件可以产生较好的投射效果。
图8a示出了未补偿的部分球面目标图,图8b为利用该球面目标图设计出的DOE仿真得到的目标光场效果,其中可以看到,放大后的线条中间存在 多处断点,整体线条质量较差。图9a为补偿修正后的部分球面目标图,图9b为利用该修正后的球面目标图设计出的DOE,仿真得到的目标光场效果,其中可以看到,放大后线条中间断点的数量被大幅减少,整体线条质量较高。
根据本发明的一个优选实施例,本发明还提供一种衍射光学元件,通过以上所述的方法设计。
根据本发明的一个优选实施例,本发明还提供一种衍射光学元件的设计系统,包括:
生成目标平面上的第一光场图案的单元;
将所述目标平面上的第一光场图案转换为球面上的第二光场图案的单元;
对所述球面上的第二光场图案的缺失点进行补偿并匹配灰度值、从而得到修正后的球面上的第三光场图案的单元;和
根据所述修正后的球面上的第三光场图案计算得到所述衍射光学元件的相位分布的单元。
本发明的优选实施例提供了一种衍射光学元件的设计方法,包括将平面目标图经过坐标变换得到球面目标图,对球面目标图进行断点补偿、修正,再根据修正后的球面目标图设计衍射光学元件。该设计方法改善了衍射光学元件的投射质量,得到连续性和均匀性都较好的投射图案。使得大视场、高精度、清晰、均匀、复杂的投射图案成为了可能,提高了衍射光学元件在工程应用中的实用性及其投射图案的美观度。本发明还提供一种使用该设计方法设计的衍射光学元件,以及设计衍射光学元件的系统。
最后应说明的是:以上所述仅为本发明的优选实施例而已,并不用于限制本发明,尽管参照前述实施例对本发明进行了详细的说明,对于本领域的技术人员来说,其依然可以对前述各实施例所记载的技术方案进行修改,或者对其中部分技术特征进行等同替换。凡在本发明的精神和原则之内,所作 的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。
Claims (10)
- 一种衍射光学元件的设计方法,其特征在于,包括:S101:获得目标平面上的第一光场图案;S102:将所述目标平面上的第一光场图案转换为球面上的第二光场图案;S103:对所述球面上的第二光场图案的缺失点进行补偿,并匹配灰度值,从而得到修正后的第三光场图案;和S104:根据所述第三光场图案,计算得到所述衍射光学元件的相位分布。
- 如权利要求1所述的方法,其中所述步骤S101包括:使用一个像素的线宽绘制所述第一光场图案。
- 如权利要求1或2所述的方法,其中所述步骤S102包括:根据所述衍射光学元件的工作距离和视场角进行计算,将所述目标平面上的第一光场图案转换为所述球面上的第二光场图案。
- 如权利要求1或2所述的方法,其中所述步骤S102还包括:通过坐标变换和灰度补偿将所述目标平面上的第一光场图案转换为所述球面上的第二光场图案。
- 如权利要求1或2所述的方法,其中所述步骤S103包括:对所述球面上的第二光场图案中的线段中间的断点进行填充。
- 如权利要求1或2所述的方法,其中所述步骤S103包括:对所述球面上的第二光场图案中的多条线段相交处的断点进行填充。
- 如权利要求1或2所述的方法,其中所述步骤S103包括:通过所述缺失点的相邻点的灰度值计算所述缺失点的灰度值。
- 如权利要求1或2所述的方法,其中所述步骤S103包括:通过绘图软件或人工的方式进行补偿。
- 一种衍射光学元件,通过如权利要求1-8中任一项所述的方法设计。
- 一种衍射光学元件的设计系统,包括:生成目标平面上的第一光场图案的单元;将所述目标平面上的第一光场图案转换为球面上的第二光场图案的单元;对所述球面上的第二光场图案的缺失点进行补偿并匹配灰度值、从而得到修正后的球面上的第三光场图案的单元;和根据所述修正后的球面上的第三光场图案计算得到所述衍射光学元件的相位分布的单元。
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