WO2021230002A1 - Curable composition, thermally conductive material, thermally conductive sheet, device with thermally conductive layer, and compound - Google Patents

Curable composition, thermally conductive material, thermally conductive sheet, device with thermally conductive layer, and compound Download PDF

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Publication number
WO2021230002A1
WO2021230002A1 PCT/JP2021/015744 JP2021015744W WO2021230002A1 WO 2021230002 A1 WO2021230002 A1 WO 2021230002A1 JP 2021015744 W JP2021015744 W JP 2021015744W WO 2021230002 A1 WO2021230002 A1 WO 2021230002A1
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group
substituent
compound
general formula
phenolic hydroxyl
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PCT/JP2021/015744
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French (fr)
Japanese (ja)
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誠一 人見
大介 林
慶太 高橋
輝樹 新居
信 小澤
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富士フイルム株式会社
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Priority to JP2022521782A priority Critical patent/JP7440626B2/en
Publication of WO2021230002A1 publication Critical patent/WO2021230002A1/en

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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D251/00Heterocyclic compounds containing 1,3,5-triazine rings
    • C07D251/02Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • C07D251/12Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D251/26Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with only hetero atoms directly attached to ring carbon atoms
    • C07D251/40Nitrogen atoms
    • C07D251/54Three nitrogen atoms
    • C07D251/70Other substituted melamines
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/62Alcohols or phenols
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K5/00Heat-transfer, heat-exchange or heat-storage materials, e.g. refrigerants; Materials for the production of heat or cold by chemical reactions other than by combustion
    • C09K5/08Materials not undergoing a change of physical state when used
    • C09K5/14Solid materials, e.g. powdery or granular

Definitions

  • the present invention relates to a curable composition, a heat conductive material, a heat conductive sheet, a device with a heat conductive layer, and a compound.
  • Patent Document 1 describes an epoxy resin composition containing a predetermined epoxy resin, a curing agent, and a filler under predetermined conditions as an epoxy resin composition having excellent handleability in a B stage state and thermal conductivity of a cured product. Things are open to the public.
  • the present inventors examined the epoxy resin composition described in Patent Document 1, and found that there is room for improvement in the thermal conductivity of the obtained cured product.
  • Another object of the present invention is to provide a curable composition capable of providing a heat conductive material having excellent heat conductivity. Another object of the present invention is to provide a heat conductive material, a heat conductive sheet, a device with a heat conductive layer, and a compound for the curable composition.
  • a curable composition comprising a phenol compound, an epoxy compound, a curing accelerator, and an inorganic substance.
  • the phenolic compound satisfies at least one of Requirement 1 and Requirement 2.
  • Requirement 1 A compound represented by the general formula (Y).
  • Requirement 2 A phenol compound having a triazine skeleton and having an aromatic ring group having a phenolic hydroxyl group and a substituent arranged at the ortho position of the phenolic hydroxyl group.
  • my represents an integer of 0 or more.
  • RY1 and RY2 each independently represent an aromatic ring group having a phenolic hydroxyl group and a substituent having 1 to 6 carbon atoms arranged at the ortho position of the phenolic hydroxyl group.
  • LY1 and LY2 independently represent -C ( RY5 ) ( RY6)-or- CO-, respectively.
  • RY3 to RY6 independently represent a hydrogen atom or a substituent.
  • L represents a divalent organic group.
  • E 1 to E 6 independently represent a single bond, -NH-, or -NR-.
  • R represents a substituent.
  • B 1 represents a single bond or a k + 1 valent organic group.
  • B 2 represents a single bond or an l + 1 valent organic group.
  • B 3 represents a single bond or m + 1 valent organic group.
  • B 4 represents a single bond or n + 1 valent organic group.
  • X 1 to X 4 each independently represent an aromatic ring group having a phenolic hydroxyl group.
  • k X 1 , l X 2 , r ⁇ m X 3 , and n X 4 is an ortho of a phenolic hydroxyl group and a phenolic hydroxyl group.
  • r represents an integer of 0 or more.
  • L represents a divalent organic group.
  • R Z represents a hydrogen atom or a substituent. Provided that at least one of R Z which in the general formula (Z1) (3 + r) pieces there is a substituent.
  • R Z which in the general formula (Z1) (3 + r) pieces there is a hydrogen atom.
  • R Z represents a hydrogen atom or a substituent.
  • at least one of the two existing R Zs represents a substituent.
  • the curing accelerator contains a phosphonium salt.
  • r represents an integer of 0 or more.
  • k, l, m, and n each independently represent an integer of 0 or more. However, the total of k, l, r ⁇ m, and n is 2 or more.
  • L represents a divalent organic group.
  • E 1 to E 6 independently represent a single bond, -NH-, or -NR-.
  • R represents a substituent.
  • B 1 represents a single bond or a k + 1 valent organic group.
  • B 2 represents a single bond or an l + 1 valent organic group.
  • B 3 represents a single bond or m + 1 valent organic group.
  • B 4 represents a single bond or n + 1 valent organic group.
  • X 1 to X 4 each independently represent an aromatic ring group having a phenolic hydroxyl group. However, at least one of k X 1 , l X 2 , r ⁇ m X 3 , and n X 4 is an ortho of a phenolic hydroxyl group and a phenolic hydroxyl group.
  • r represents an integer of 0 or more.
  • L represents a divalent organic group.
  • R Z represents a hydrogen atom or a substituent. Provided that at least one of R Z which in the general formula (Z1) (3 + r) pieces there is a substituent. Further, at least one of R Z which in the general formula (Z1) (3 + r) pieces there is a hydrogen atom.
  • R Z represents a hydrogen atom or a substituent. Provided that at least one of the two existing R Z in the general formula (Z2) represents a substituent.
  • a curable composition capable of providing a heat conductive material having excellent heat conductivity. Further, according to the present invention, it is possible to provide a heat conductive material, a heat conductive sheet, a device with a heat conductive layer, and a compound related to the curable composition.
  • the curable composition the heat conductive material, the heat conductive sheet, the device with the heat conductive layer, and the compound of the present invention will be described in detail.
  • the description of the constituent elements described below may be based on the representative embodiments of the present invention, but the present invention is not limited to such embodiments.
  • the numerical range represented by using "-" means a range including the numerical values before and after "-" as the lower limit value and the upper limit value.
  • (meth) acryloyl group means “either one or both of an acryloyl group and a methacryloyl group”.
  • (meth) acrylamide group means “either one or both of an acrylamide group and a methacrylamide group”.
  • the acid anhydride group may be a monovalent group or a divalent group.
  • the acid anhydride group represents a monovalent group, a substitution obtained by removing an arbitrary hydrogen atom from an acid anhydride such as maleic anhydride, phthalic anhydride, pyromellitic anhydride, and trimellitic anhydride.
  • the group is mentioned.
  • the acid anhydride group represents a divalent group, the group represented by * -CO-O-CO- * is intended (* represents a bond position).
  • substituents and the like that do not specify substitution or non-substitution if possible, further substituents (for example, a group of substituents described later) are added to the groups as long as the desired effect is not impaired.
  • Y may be possessed.
  • alkyl group means a substituted or unsubstituted alkyl group (an alkyl group which may have a substituent) as long as the desired effect is not impaired.
  • the type of the substituent, the position of the substituent, and the number of the substituents in the case of "may have a substituent” are not particularly limited. Examples of the number of substituents include one or two or more.
  • substituent examples include a monovalent non-metal atomic group excluding a hydrogen atom, and a group selected from the following substituent group Y is preferable.
  • halogen atom examples include a chlorine atom, a fluorine atom, a bromine atom, and an iodine atom.
  • Substituent group Y Halogen atoms (-F, -Br, -Cl, -I, etc.), hydroxyl groups, amino groups, carboxylic acid groups and their conjugate base groups, anhydrous carboxylic acid groups, cyanate ester groups, unsaturated polymerizable groups, epoxy groups, oxetanyl Group, aziridinyl group, thiol group, isocyanate group, thioisocyanate group, aldehyde group, alkoxy group, allyloxy group, alkylthio group, arylthio group, alkyldithio group, aryldithio group, N-alkylamino group, N, N-dialkylamino Group, N-arylamino group, N, N-diarylamino group, N-alkyl-N-arylamino group, acyloxy group, carbamoyloxy group, N-alkylcarbamoyloxy group, N-ary
  • each of the above-mentioned groups may further have a substituent (for example, one or more groups among the above-mentioned groups), if possible.
  • a substituent for example, one or more groups among the above-mentioned groups
  • an aryl group which may have a substituent is also included as a group selectable from the substituent group Y.
  • the number of carbon atoms of the group is, for example, 1 to 20.
  • the number of atoms other than the hydrogen atom of the group selected from the substituent group Y is, for example, 1 to 30.
  • these substituents may or may not form a ring by bonding with each other or with a group to be substituted, if possible.
  • the alkyl group (or the alkyl group moiety in a group containing an alkyl group as a partial structure, such as an alkoxy group) may be a cyclic alkyl group (cycloalkyl group) and has one or more cyclic structures as a partial structure. It may be an alkyl group.
  • composition The curable composition of the present invention (hereinafter, also simply referred to as “composition”) is a curable composition containing a phenol compound, an epoxy compound, a curing accelerator, and an inorganic substance.
  • the phenolic compound satisfies at least one of Requirement 1 and Requirement 2.
  • Requirement 1 A compound represented by the general formula (Y) described later.
  • Requirement 2 A phenol compound having a triazine skeleton and having an aromatic ring group having a phenolic hydroxyl group and a substituent having 1 to 6 carbon atoms arranged at the ortho position of the phenolic hydroxyl group.
  • the mechanism by which the composition of the present invention solves the problem of the present invention with the above-mentioned constitution is not always clear, but the present inventors speculate as follows.
  • the phenol compound contained in the composition of the present invention (hereinafter, also referred to as “specific phenol compound”) has a phenolic hydroxyl group having a substituent at the ortho position as a phenolic hydroxyl group, and has a predetermined structure. .. Due to these characteristics of the specific phenolic compound, the cured product formed from the composition can have a rigid structure, resulting in faster heat transfer in the cured product, resulting in formation. It is believed that the thermal conductivity of the heat-conducting material is improved.
  • the composition of the present invention has good storage stability after being formed into a semi-cured film, has a high dielectric breakdown voltage of the prepared heat conductive material, and is adhered via the prepared heat conductive material.
  • the peel strength between the materials can also be improved.
  • excellent in the above-mentioned thermal conductivity, the above-mentioned storage stability, the above-mentioned dielectric breakdown voltage, and / or the above-mentioned peel strength is also referred to as an excellent effect of the present invention.
  • the composition of the present invention comprises a phenolic compound.
  • the phenol compound is a specific phenol compound that satisfies at least one of the following requirements 1 and 2.
  • the specific phenol compound may satisfy only the following requirement 1, only the following requirement 2, or both the following requirement 1 and the following requirement 2.
  • Requirement 1 A compound represented by the general formula (Y).
  • Requirement 2 A phenol compound having a triazine skeleton and having an aromatic ring group having a phenolic hydroxyl group and a substituent arranged at the ortho position of the phenolic hydroxyl group.
  • the specific phenol compound satisfying the requirement 1 is a compound represented by the general formula (Y).
  • the plurality of groups represented by the same reference numeral may be the same or different unless otherwise specified. ..
  • my represents an integer of 0 or more. My is preferably an integer of 0 to 10, more preferably an integer of 0 to 1, and even more preferably 1.
  • RY1 and RY2 each independently represent an aromatic ring group having a phenolic hydroxyl group and a substituent having 1 to 6 carbon atoms arranged at the ortho position of the phenolic hydroxyl group. That is, the aromatic ring group represented by R Y1 and R Y2, having a phenolic hydroxyl group is present substituents having 1 to 6 carbon atoms in the ortho position.
  • the "phenolic hydroxyl group having a substituent having 1 to 6 carbon atoms at the ortho position” is a hydroxyl group (phenolic hydroxyl group) directly bonded to an aromatic ring (preferably an aromatic hydrocarbon ring, more preferably a benzene ring).
  • the aromatic ring group may have one or more (for example, 1 to 3) "phenolic hydroxyl groups having a substituent having 1 to 6 carbon atoms at the ortho position" and "1 carbon number at the ortho position". It may or may not have a phenolic hydroxyl group other than the "phenolic hydroxyl group in which the substituents of to 6 are present".
  • the aromatic ring group may be monocyclic or polycyclic, and may have a heteroatom as a ring member atom.
  • the number of ring member atoms of the aromatic ring group is preferably 5 to 15, more preferably 6 to 10, and even more preferably 6.
  • the substituent having 1 to 6 carbon atoms arranged at the ortho position of the phenolic hydroxyl group may be present at at least one of the ortho positions of the phenolic hydroxyl group, and may be present at both of them.
  • the number of carbon atoms in the substituent having 1 to 6 carbon atoms is 1 to 6, preferably 1 to 4, and more preferably 1.
  • the substituent having 1 to 6 carbon atoms is preferably a hydrocarbon group having 1 to 6 carbon atoms, and more preferably an alkyl group having 1 to 6 carbon atoms.
  • the alkyl group may be linear or branched. It is also preferable that the alkyl group is unsubstituted.
  • RY1 and RY2 are independently represented by the general formula (P0). It is preferable that it is a group to be used.
  • RP1 to RP5 each independently represent a hydrogen atom or a substituent. However, one of R P1 ⁇ R P5 is a bond position and one or both of R P1 and R P5 is a substituent of the carbon atoms 1-6.
  • RP1 and RP5 when one is a substituent having 1 to 6 carbon atoms and the other one is other than the substituent having 1 to 6 carbon atoms, the other one is a hydrogen atom. It is also preferable. It is also preferable that any one of RP2 to RP4 is a bonding position. When one or more (for example, 1 to 3) of RP2 to RP4 are substituents, it is also preferable that the substituent is a substituent having 1 to 6 carbon atoms.
  • RY3 represents a hydrogen atom or a substituent.
  • RY3 preferably represents a hydrogen atom or a hydroxyl group.
  • a plurality of RY3s it is preferable that at least one RY3 represents a hydroxyl group, and it is more preferable that all RY3s represent a hydroxyl group.
  • the general formula (Y) and RY4 represent a hydrogen atom or a substituent.
  • the RY4 is preferably a hydrogen atom, an alkyl group, a phenyl group, a halogen atom, a carboxylic acid group, a boronic acid group, an aldehyde group, an alkoxy group, or an alkoxycarbonyl group.
  • the alkyl group may be linear or branched.
  • the alkyl group preferably has 1 to 10 carbon atoms.
  • the alkyl group may or may not have a substituent.
  • the alkyl group portion of the alkoxy group and the alkyl group portion of the alkoxycarbonyl group are the same as those of the alkyl group.
  • the phenyl group may or may not have a substituent.
  • R Y4, relative to the hydroxyl group (R Y3) of the benzene ring group R Y4 are attached may have, preferably attached at the para-position.
  • LY1 and LY2 independently represent -C ( RY5 ) ( RY6)-or- CO-, respectively.
  • RY5 and RY6 each independently represent a hydrogen atom or a substituent.
  • RY5 and RY6 are each independently preferably a hydrogen atom, a hydroxyl group, a phenyl group, a halogen atom, a carboxylic acid group, a boronic acid group, an aldehyde group, an alkyl group, an alkoxy group, or an alkoxycarbonyl group.
  • the alkyl group may be linear or branched.
  • the alkyl group preferably has 1 to 10 carbon atoms.
  • the alkyl group may or may not have a substituent.
  • the alkyl group portion of the alkoxy group and the alkyl group portion of the alkoxycarbonyl group are the same as those of the alkyl group.
  • the phenyl group may or may not have a substituent.
  • L Y1 and L Y2 are each independently, -CH 2 -, - CH ( OH) -, or, -CO- are preferable.
  • the specific phenol compound satisfying Requirement 1 may have a hydroxyl group other than "a phenolic hydroxyl group having a substituent having 1 to 6 carbon atoms at the ortho position". However, the ratio of "phenolic hydroxyl group having a substituent having 1 to 6 carbon atoms at the ortho position" among all the hydroxyl groups of the specific phenol compound satisfying Requirement 1 [(substituent having 1 to 6 carbon atoms at the ortho position).
  • the number of phenolic hydroxyl groups in which is present / the number of total hydroxyl groups of the specific phenol compound) ⁇ 100] is preferably 30 to 100%, more preferably 50 to 100%, still more preferably 65 to 100%.
  • the specific phenol compound satisfying Requirement 2 is a phenol compound having a triazine skeleton and having an aromatic ring group having a phenolic hydroxyl group and a substituent arranged at the ortho position of the phenolic hydroxyl group.
  • a specific phenolic compound satisfying Requirement 2 means having one or more (for example, 1 to 5) triazine ring groups in the compound.
  • the specific phenol compound satisfying Requirement 2 has "an aromatic ring group having a phenolic hydroxyl group and a substituent arranged at the ortho position of the phenolic hydroxyl group".
  • the specific phenol compound satisfying Requirement 2 has an aromatic ring group, and the aromatic ring group has a phenolic hydroxyl group in which a substituent is present at the ortho position.
  • the "phenolic hydroxyl group having a substituent at the ortho position” is a hydroxyl group (phenolic hydroxyl group) directly bonded to an aromatic ring (preferably a benzene ring), and is a position (ortho) adjacent to the hydroxyl group in the aromatic ring.
  • a hydroxyl group in which a substituent (preferably an organic group, more preferably a substituent having 1 to 6 carbon atoms) is present in one or both of the positions).
  • the aromatic ring group may have one or more (for example, 1 to 3) "phenolic hydroxyl groups having a substituent at the ortho position", and "a phenolic hydroxyl group having a substituent at the ortho position". It may or may not have a phenolic hydroxyl group other than.
  • the aromatic ring group may be monocyclic or polycyclic, and may have a heteroatom as a ring member atom.
  • the number of ring member atoms of the aromatic ring group is preferably 5 to 15, more preferably 6 to 10, and even more preferably 6.
  • the substituent arranged at the ortho position of the phenolic hydroxyl group may be present at at least one of the ortho positions of the phenolic hydroxyl group, and may be present at both of them.
  • the substituent arranged at the ortho position of the phenolic hydroxyl group is preferably an organic group, and more preferably a substituent having 1 to 6 carbon atoms.
  • the "substituent having 1 to 6 carbon atoms" is the same as the "substituent having 1 to 6 carbon atoms" described in the description of Requirement 1.
  • the specific phenol compound satisfying Requirement 2 has one aromatic ring group (preferably a group represented by the above general formula (P0)) having a phenolic hydroxyl group and a substituent arranged at the ortho position of the phenolic hydroxyl group. It is preferable to have the above, more preferably 2 or more, further preferably 2 to 12, and particularly preferably 4 to 8.
  • the specific phenol compound satisfying Requirement 2 is preferably a compound represented by the general formula (Z).
  • the specific phenol compound preferably contains a compound represented by the general formula (Z), and the specific phenol compound may be the compound itself represented by the general formula (Z).
  • the content of the compound represented by the general formula (Z) is preferably 10 to 100% by mass, more preferably 25 to 100% by mass, still more preferably 50 to 100% by mass, based on the total mass of the specific phenol compound. ..
  • E 1 to E 6 independently represent a single bond, -NH-, or -NR-.
  • R represents a substituent.
  • the substituent represented by R include a linear or branched alkyl group having 1 to 5 carbon atoms.
  • E 1 to E 6 are preferably -NH- or -NR-, and more preferably -NH-.
  • B 1 represents a single bond or a k + 1 valent organic group.
  • B 2 represents a single bond or an l + 1 valent organic group.
  • B 3 represents a single bond or m + 1 valent organic group.
  • B 4 represents a single bond or n + 1 valent organic group.
  • the values of k, l, m, and n in the above-mentioned k + 1-valent organic group, l + 1-valent organic group, m + 1-valent organic group, and n + 1-valent organic group are specified in the general formula (Z). , K, l, m, and n.
  • r is 2 or more, if the value of m that there are a plurality are different, the value of m in m + 1-valent organic group represented by B 3 indicates the number of X 3 to which the B 3 binds m Is the same as the value of.
  • Examples of the organic group represented by B 1 to B 4 include a group obtained by removing j hydrogen atoms from a hydrocarbon which may have a hetero atom having 1 to 20 carbon atoms.
  • j means k + 1, l + 1, m + 1, or n + 1.
  • the hydrocarbon before removing j hydrogen atoms for example, an aliphatic hydrocarbon having 1 to 20 carbon atoms which may have a substituent and a carbon number which may have a substituent may be used.
  • Examples thereof include one or more hydrocarbons selected from the group consisting of 3 to 20 aliphatic rings and an aromatic ring having 3 to 20 carbon atoms which may have a substituent.
  • the group further consists of -O-, -S-, -CO-, -NR N- (RN is a hydrogen atom or a substituent), and -SO 2-.
  • Hydrocarbons may be a combination of one or more of the selected divalent linking groups.
  • Examples of the aliphatic hydrocarbon having 1 to 20 carbon atoms include methane, ethane, propane, butane, pentane, hexane, and heptane.
  • Examples of the aliphatic ring having 3 to 20 carbon atoms include a cyclohexane ring, a cycloheptane ring, a norbornane ring, and an adamantane ring.
  • Examples of the aromatic ring having 3 to 20 carbon atoms include aromatic hydrocarbons having 6 to 20 carbon atoms and aromatic heterocycles having 3 to 20 carbon atoms.
  • Examples of the aromatic hydrocarbon having 6 to 20 carbon atoms include a benzene ring, a naphthalene ring, an anthracene ring and the like
  • examples of the aromatic heterocyclic ring having 3 to 20 carbon atoms include a furan ring, a pyrrole ring and a thiophene. Examples thereof include a ring, a pyridine ring, a thiazole ring, a carbazole ring, an indole ring, and a benzothiazole ring.
  • k, l, m, and n each independently represent an integer of 0 or more.
  • the total of k, l, r existing m (that is, r ⁇ m) and n is 2 or more, preferably an integer of 2 to 12, and more preferably an integer of 4 to 8.
  • k, l, m, and n are preferably 0 to 5, and more preferably 1 to 2.
  • k is preferably 1 or more (more preferably 1 to 2)
  • l is preferably 1 or more (more preferably 1 to 2)
  • m is 1 or more (more preferably 1 to 2).
  • n is 1 or more (more preferably 1 to 2).
  • B 1 does not have X 1.
  • B 2 does not have X 2.
  • m does not have X 3.
  • n is 0, then B 4 does not have X 4.
  • B 1 is a single bond
  • k is 1.
  • B 2 is a single bond
  • l is 1.
  • B 3 is a single bond
  • m is 1.
  • B 4 is a single bond
  • n is 1.
  • L represents a divalent organic group.
  • the organic group may have, for example, a divalent aromatic ring group which may have a substituent, a divalent aliphatic hydrocarbon group which may have a substituent, and a substituent.
  • divalent aliphatic cyclic group -O -, - S -, - N (R N) - , or -CO-, and, a group combining thereof.
  • R N represents a substituent.
  • the substituents represented by R N e.g., like a linear or branched alkyl group having 1 to 5 carbon atoms.
  • examples of the substituent which the aromatic ring group, the aliphatic hydrocarbon group and the aliphatic ring group may have include a linear or branched alkyl group having 1 to 5 carbon atoms. Can be mentioned.
  • Examples of the aromatic ring group include an aromatic hydrocarbon group having 6 to 20 carbon atoms and an aromatic heterocyclic group having 3 to 20 carbon atoms.
  • Examples of the aromatic hydrocarbon group having 6 to 20 carbon atoms include a monocyclic aromatic ring group such as a benzene ring group; a naphthalene ring group, and a polycyclic aromatic ring group such as an anthracene ring group;
  • Examples of the aromatic heterocyclic group having 3 to 20 carbon atoms include a monocyclic aromatic ring group such as a furan ring group, a pyrrole ring group, a thiophene ring group, a pyridine ring group, and a thiazole ring group; a benzothiazole ring.
  • Examples include a polycyclic aromatic ring group such as a group, a carbazole ring group, and an indole ring group;
  • Examples of the aliphatic hydrocarbon group include an alkylene group having 1 to 12 carbon atoms, and specifically, a methylene group, an ethylene group, a propylene group, a butylene group, a pentylene group, a hexylene group and a methylhexylene group. , And a heptylene group and the like.
  • Examples of the aliphatic ring group include a cyclohexane ring group, a cycloheptane ring group, a norbornane ring group, and an adamantane ring group.
  • An aromatic ring group which may have a substituent an aliphatic hydrocarbon group which may have a substituent, an aliphatic ring group which may have a substituent, or -O-, -S.
  • a group combining-, -NR N- or -CO- not only a divalent linking group consisting of a combination of two or more of these, but also a group of the same type (for example, an aromatic ring group) is connected via a single bond. It may be a divalent linking group in which two or more are combined.
  • both ends of L are carbon atoms from the viewpoint that the heat conductivity of the heat conductive material is more excellent.
  • “- E 3 -C-” is that, and "- C-E 4 -” is preferably.
  • the C (carbon atom) is an atom constituting L.
  • the terminal carbon atom may be part of a cyclic structure.
  • L in the above general formula (P2) may have a divalent aromatic ring group or a substituent which may have a substituent.
  • r is an integer of 0 or more. r is preferably an integer of 0 to 20, and more preferably an integer of 0 to 10.
  • X 1 to X 4 each independently represent an aromatic ring group having a phenolic hydroxyl group.
  • the "aromatic ring group having a phenolic hydroxyl group” may be any aromatic ring group having one or more (for example, 1 to 4) hydroxyl groups (phenolic hydroxyl groups) directly bonded to the aromatic ring.
  • the aromatic ring group may or may not have a substituent other than the hydroxyl group.
  • the aromatic ring group may be monocyclic or polycyclic, and may have a heteroatom as a ring member atom.
  • the number of ring member atoms of the aromatic ring group is preferably 5 to 15, more preferably 6 to 10, and even more preferably 6.
  • At least one of k existing X 1 , l existing X 2 , r ⁇ m existing X 3 and n existing X 4 is phenolic.
  • the value of m in "r ⁇ m” is an average value of m that may exist in a plurality of values.
  • the "aromatic ring groups having phenolic hydroxyl groups” represented by any of X 1 to X 4 existing (k + l + r ⁇ m + n) at least one is "ortho-phenolic hydroxyl group and phenolic hydroxyl group”.
  • aromatic ring group having a substituent arranged at the position Represents an aromatic ring group having a substituent arranged at the position.
  • aromatic ring groups having a phenolic hydroxyl group represented by any of X 1 to X 4 existing (k + l + r ⁇ m + n), "arranged at the ortho position of the phenolic hydroxyl group and the phenolic hydroxyl group”.
  • Ratio of "aromatic ring groups having a substituent" [(number of "aromatic ring groups having a phenolic hydroxyl group and a substituent arranged at the ortho position of the phenolic hydroxyl group” / (k + l + r ⁇ m + n)) X present number) ⁇ 100] of the "aromatic ring group having a phenolic hydroxyl group” represented by any one of the 1 ⁇ X 4 is preferably 30% or more, more preferably 50% or more, more preferably 65% or more. The upper limit is preferably 100% or less, more preferably 90% or less, still more preferably 80% or less.
  • aromatic ring group having a phenolic hydroxyl group and a substituent arranged at the ortho position of the phenolic hydroxyl group is, for example, the "ortho-position of the phenolic hydroxyl group and the phenolic hydroxyl group” described with respect to the description of the general formula (Y).
  • the "aromatic ring group having a substituent having 1 to 6 carbon atoms” arranged in the "substituted group having 1 to 6 carbon atoms” is not particularly limited to a "hydroxyl group (may be a hydroxyl group, preferably a non-hydroxyl group)". The form replaced with is mentioned.
  • the "aromatic ring group having a phenolic hydroxyl group and a substituent arranged at the ortho position of the phenolic hydroxyl group” independently has "1 to 6 carbon atoms arranged at the ortho position of the phenolic hydroxyl group and the phenolic hydroxyl group”. It is preferably an aromatic ring group having a substituent of.
  • the above-mentioned "aromatic ring group having a phenolic hydroxyl group and a substituent having 1 to 6 carbon atoms arranged at the ortho position of the phenolic hydroxyl group” is the "phenolic hydroxyl group and phenolic" described with respect to the above general formula (Y). It is the same as the aromatic ring group having a substituent having 1 to 6 carbon atoms arranged at the ortho position of the hydroxyl group, and is preferably a group represented by the above general formula (P0).
  • aromatic ring other than the "aromatic ring group having a substituent located in the ortho position of the phenolic hydroxyl group and a phenolic hydroxyl group” is, It may or may not have a substituent other than a hydroxyl group (phenolic hydroxyl group).
  • aromatic ring group other than the "aromatic ring group having a phenolic hydroxyl group and a substituent arranged at the ortho position of the phenolic hydroxyl group” include a hydroxyphenyl group.
  • aromatic ring groups having phenolic hydroxyl groups represented by any of X 1 to X 4 , at least one (for example, 1 to 2) is “phenolic hydroxyl group and phenol”. It is also preferable that it is an aromatic ring group other than the "aromatic ring group having a substituent arranged at the ortho position of the sex hydroxyl group".
  • aromatic ring groups having phenolic hydroxyl groups represented by X 1 to X 4 there are also aromatic ring groups other than "aromatic ring groups having a phenolic hydroxyl group and a substituent arranged at the ortho position of the phenolic hydroxyl group”.
  • the symmetry of the compound as a whole is broken, the melting point of the compound is lowered, and the handleability is improved.
  • the exothermic peak detected by measuring the composition with a DSC becomes broad (increase in half-value width or increase in half-value width). Increasing the difference between the exothermic peak temperature and the reaction start temperature).
  • the composition can be cured at a wide temperature and is considered to be preferable.
  • the specific phenol compound satisfying Requirement 2 is preferably a compound represented by the general formula (Z1).
  • the specific phenol compound preferably contains a compound represented by the general formula (Z1), and the specific phenol compound may be the compound itself represented by the general formula (Z1).
  • the content of the compound represented by the general formula (Z1) is preferably 10 to 100% by mass, more preferably 25 to 100% by mass, still more preferably 50 to 100% by mass, based on the total mass of the specific phenol compound. ..
  • r represents an integer of 0 or more. r is preferably an integer of 0 to 20, and more preferably an integer of 0 to 10.
  • L represents a divalent organic group.
  • the divalent organic group represented by L in the general formula (Z1) is, for example, the same as the divalent organic group represented by L in the general formula (Z1).
  • R Z represents a hydrogen atom or a substituent. Substituents represented by R Z, it is preferable, more preferably a hydrocarbon group having 1 to 6 carbon atoms, an alkyl group having 1 to 6 carbon atoms that is a substituent having 1 to 6 carbon atoms Is even more preferable.
  • R Z which in the general formula (Z1) (3 + r) pieces there is a substituent.
  • (3 + r) pieces presence of R Z is the percentage of R Z representing a substituent [(number of number / (3 + r) pieces present R Z of R Z representing a substituent) ⁇ 100] is 30% or more It is preferable, 50% or more is more preferable, and 65% or more is further preferable.
  • the upper limit is preferably 90% or less, more preferably 80% or less.
  • At least one (for example, 1 to 2) of R Z existing in (3 + r) in the general formula (Z1) represents a hydrogen atom.
  • R z is a substituted group
  • R z in the general formula (Z1) in the benzene ring group and OH is bonded the R z (R z is preferably substituted groups), the benzene ring is bonded It is also preferable that it exists in the para position with respect to NH.
  • the specific phenol compound satisfying Requirement 2 is preferably a compound represented by the general formula (Z2).
  • the specific phenol compound preferably contains a compound represented by the general formula (Z2), and the specific phenol compound may be the compound itself represented by the general formula (Z2).
  • the content of the compound represented by the general formula (Z2) is preferably 10 to 100% by mass, more preferably 25 to 100% by mass, still more preferably 50 to 100% by mass, based on the total mass of the specific phenol compound. ..
  • R Z represents a hydrogen atom or a substituent. However, at least one of the two existing R Zs represents a substituent. It is preferred that both of the two existing R Zs represent substituents.
  • Substituents represented by R Z it is preferable, more preferably a hydrocarbon group having 1 to 6 carbon atoms, an alkyl group having 1 to 6 carbon atoms that is a substituent having 1 to 6 carbon atoms Is even more preferable.
  • the alkyl group may be linear or branched. It is also preferable that the alkyl group is unsubstituted.
  • the two Rz in the general formula (Z2) may be the same or different from each other.
  • the specific phenol compound satisfying Requirement 2 may have a hydroxyl group other than "a phenolic hydroxyl group having a substituent (preferably a substituent having 1 to 6 carbon atoms) at the ortho position".
  • the ratio of "phenolic hydroxyl group having a substituent (preferably a substituent having 1 to 6 carbon atoms) at the ortho position" among all the hydroxyl groups of the specific phenol compound satisfying Requirement 2 [(the number of carbon atoms at the ortho position).
  • the number of phenolic hydroxyl groups in which 1 to 6 substituents are present / the number of total hydroxyl groups of the specific phenol compound) ⁇ 100] is preferably 30% or more, more preferably 50% or more, still more preferably 65% or more.
  • the above number is preferably 100% or less, more preferably 90% or less, and even more preferably 80% or less.
  • the molecular weight of the specific phenol compound is preferably 225 to 2000, more preferably 225 to 1000.
  • the hydroxyl group content of the specific phenol compound is preferably 2.0 mmol / g or more, more preferably 4.0 mmol / g or more.
  • the upper limit is preferably 25.0 mmol / g or less, more preferably 10.0 mmol / g or less.
  • the hydroxyl group content is intended to be the number of hydroxyl groups (preferably phenolic hydroxyl groups) possessed by 1 g of the phenol compound.
  • the specific phenol compound may or may not have an active hydrogen-containing group (carboxylic acid group or the like) capable of polymerizing with the epoxy compound.
  • the lower limit of the active hydrogen content (total content of hydrogen atoms in hydroxyl groups, carboxylic acid groups, etc.) of the phenol compound is preferably 2.0 mmol / g or more, and more preferably 4.0 mmol / g or more.
  • the upper limit is preferably 25.0 mmol / g or less, more preferably 10.0 mmol / g or less.
  • the specific phenol compound may be used alone or in combination of two or more.
  • the specific phenol compound is a compound represented by the general formula (Z), and is represented by any of (k + l + r ⁇ m + n) X 1 to X 4 , which is a “aromatic ring group having a phenolic hydroxyl group”.
  • at least one is a compound which is an aromatic ring group other than "an aromatic ring group having a phenolic hydroxyl group and a substituent arranged at the ortho position of the phenolic hydroxyl group" (for example, general).
  • the compound represented by the formula (Z2) is preferably contained in an amount of 10 to 100% by mass, more preferably 25 to 100% by mass, and 50 to 100% by mass based on the total mass of the specific phenol compound. Is more preferable.
  • the composition of the present invention may contain a compound having a group capable of reacting with an epoxy compound described later (also referred to as “other active hydrogen-containing compound”).
  • the other active hydrogen-containing compound may be, for example, a phenol compound other than the specific phenol compound.
  • the mass ratio of the content of the other active hydrogen-containing compound to the content of the specific phenol compound is preferably 0 to 1, more preferably 0 to 0.1, and 0 to 0. 05 is more preferable.
  • the composition of the present invention comprises an epoxy compound.
  • An epoxy compound is a compound having at least one epoxy group (oxylanyl group) in one molecule.
  • the epoxy group is a group obtained by removing one or more hydrogen atoms (preferably one hydrogen atom) from the oxylan ring. If possible, the epoxy group may further have a substituent (a linear or branched alkyl group having 1 to 5 carbon atoms, or the like).
  • the number of epoxy groups contained in the epoxy compound is preferably 2 or more, more preferably 2 to 1000, and even more preferably 2 to 40 in one molecule.
  • the molecular weight of the epoxy compound is preferably 150 or more, more preferably 300 or more.
  • the upper limit of the molecular weight is not limited, and for example, 100,000 or less is preferable, and 10,000 or less is more preferable.
  • the molecular weight is a number average molecular weight.
  • the number average molecular weight and the weight average molecular weight are the weight average molecular weights obtained in terms of polystyrene by gel permeation chromatography (GPC).
  • the epoxy group content of the epoxy compound is preferably 2.0 to 20.0 mmol / g, more preferably 5.0 to 15.0 mmol / g.
  • the epoxy group content is intended to be the number of epoxy groups contained in 1 g of the epoxy compound.
  • the epoxy compound also preferably has an aromatic ring group (preferably an aromatic hydrocarbon ring group).
  • the epoxy compound may or may not exhibit liquid crystallinity. That is, the epoxy compound may be a liquid crystal compound. In other words, it may be a liquid crystal compound having an epoxy group.
  • the epoxy compound (which may be a liquid crystal epoxy compound) include a compound having a rod-like structure at least partially (a rod-like compound) and a compound having a disk-like structure at least partially. Be done.
  • the rod-shaped compound and the disk-shaped compound will be described in detail.
  • Examples of the epoxy compound which is a rod-shaped compound include azomethines, azoxys, cyanobiphenyls, cyanophenyl esters, benzoic acid esters, cyclohexanecarboxylic acid phenyl esters, cyanophenylcyclohexanes, cyano-substituted phenylpyrimidins, and alkoxy-substituted phenyls. Examples thereof include pyrimidines, phenyldioxans, trans, and alkenylcyclohexylbenzonitriles. Not only low molecular weight compounds as described above, but also high molecular weight compounds can be used.
  • the polymer compound is a polymer compound obtained by polymerizing a rod-shaped compound having a low molecular weight reactive group.
  • Preferred rod-shaped compounds include rod-shaped compounds represented by the following general formula (XXI).
  • Q 1 and Q 2 are independent epoxy groups, and L 111 , L 112 , L 113 , and L 114 independently represent a single bond or a divalent linking group, respectively. ..
  • a 111 and A 112 each independently represent a divalent linking group (spacer group) having 1 to 20 carbon atoms.
  • M represents a mesogen group.
  • Epoxy group of Q 1 and Q 2 may be substituted or may not have.
  • L 111 , L 112 , L 113 , and L 114 each independently represent a single bond or a divalent linking group.
  • the divalent linking groups represented by L 111 , L 112 , L 113 , and L 114 are independently -O-, -S-, -CO-, -NR 112- , and -CO-O, respectively.
  • R 112 is an alkyl group or a hydrogen atom having 1 to 7 carbon atoms.
  • L 113 and L 114 are preferably —O— independently of each other.
  • L 111 and L 112 are preferably single bonds independently of each other.
  • a 111 and A 112 each independently represent a divalent linking group having 1 to 20 carbon atoms.
  • the divalent linking group may contain heteroatoms such as non-adjacent oxygen and sulfur atoms.
  • an alkylene group, an alkenylene group, or an alkynylene group having 1 to 12 carbon atoms is preferable.
  • the above-mentioned alkylene group, alkenylene group, or alkynylene group may or may not have an ester group.
  • the divalent linking group is preferably linear, and the divalent linking group may or may not have a substituent.
  • substituents examples include a halogen atom (fluorine atom, chlorine atom, and bromine atom), a cyano group, a methyl group, and an ethyl group.
  • a 111 and A 112 are each independently preferably an alkylene group having 1 to 12 carbon atoms, and more preferably a methylene group.
  • M represents a mesogen group, and examples of the mesogen group include known mesogen groups. Of these, a group represented by the following general formula (XXII) is preferable.
  • W 1 and W 2 independently represent a divalent cyclic alkylene group, a divalent cyclic alkaneylene group, an arylene group, or a divalent heterocyclic group, respectively.
  • L 115 represents a single bond or a divalent linking group.
  • n represents an integer of 1 to 4.
  • W 1 and W 2 examples include 1,4-cyclohexenediyl, 1,4-cyclohexanediyl, 1,4-phenylene, pyrimidine-2,5-diyl, pyridine-2,5-diyl, 1,3. 4-Thiadiazole-2,5-diyl, 1,3,4-oxadiazole-2,5-diyl, naphthalene-2,6-diyl, naphthalene-1,5-diyl, thiophen-2,5-diyl, And pyridazine-3,6-zyl.
  • W 1 and W 2 may each have a substituent.
  • substituents include the groups exemplified in the above-mentioned substituent group Y, and more specifically, a halogen atom (fluorine atom, chlorine atom, bromine atom, and iodine atom), cyano group, and carbon.
  • An alkyl group having a number of 1 to 10 for example, a methyl group, an ethyl group, a propyl group, etc.
  • an alkoxy group having 1 to 10 carbon atoms for example, a methoxy group, an ethoxy group, etc.
  • a group having 1 to 10 carbon atoms for example, formyl group, acetyl group, etc.
  • Acrylic group eg, formyl group, acetyl group, etc.
  • alkoxycarbonyl group having 1 to 10 carbon atoms eg, methoxycarbonyl group, ethoxycarbonyl group, etc.
  • acyloxy group having 1 to 10 carbon atoms eg, ethoxycarbonyl group, etc.
  • W 1 there are a plurality W 1 existing in plural numbers may each be the same or different.
  • L 115 represents a single bond or a divalent linking group.
  • the divalent linking group represented by L 115 include the above-mentioned divalent linking groups represented by L 111 to L 114 , and examples thereof include -CO-O- and -O-CO-. , -CH 2- O-, and -O-CH 2- .
  • the plurality of L 115s may be the same or different from each other.
  • the preferred skeleton of the basic skeleton of the mesogen group represented by the above general formula (XXII) is illustrated below.
  • the above-mentioned mesogen groups may be substituted with a substituent in these skeletons.
  • the biphenyl skeleton is preferable in that the obtained heat conductive material has more excellent heat conductivity.
  • the compound represented by the general formula (XXI) can be synthesized by referring to the method described in JP-A No. 11-513019 (WO97 / 00600).
  • the rod-shaped compound may be a monomer having a mesogen group described in JP-A No. 11-323162 and Japanese Patent No. 4118691.
  • the rod-shaped compound is preferably a compound represented by the general formula (E1).
  • LE1 independently represents a single bond or a divalent linking group. Of these, LE1 is preferably a divalent linking group.
  • the alkylene group may be linear, branched or cyclic, but a linear alkylene group having 1 to 2 carbon atoms is preferable.
  • a plurality of LE1s may be the same or different from each other.
  • L E2 are each independently a single bond, -CO-O-, or, -O-CO- is preferred.
  • the plurality of LE2s may be the same or different
  • LE3 may independently have a single bond or a substituent, respectively, and may have a 5-membered ring or a 6-membered ring aromatic ring group or a 5-membered ring or a 6-membered ring. Represents a non-aromatic ring group of, or a polycyclic group consisting of these rings.
  • L E3 represents a single bond, 1,4-phenylene group, or 1,4-cyclohexene-diyl group are preferable.
  • Substituent having a group represented by L E3 each independently represent an alkyl group, an alkoxy group, a halogen atom, a cyano group, a nitro group, or, preferably an acetyl group, an alkyl group (preferably having a carbon number of 1) Gayori preferable.
  • the substituents may be the same or different.
  • the plurality of LE3s may be the same or different.
  • pe represents an integer of 0 or more. If pe is the integer of 2 or more, there exist a plurality of (-L E3 -L E2 -) may each be the same or different. Among them, pe is preferably 0 to 2, more preferably 0 or 1, and even more preferably 0.
  • LE4 independently represents a substituent.
  • the substituent an alkyl group, an alkoxy group, a halogen atom, a cyano group, a nitro group, or an acetyl group are preferable, and an alkyl group (preferably 1 carbon number) is more preferable.
  • a plurality of LE4s may be the same or different from each other. Further, when le described below is an integer of 2 or more, a plurality of LE4s existing in the same (LE4 ) le may be the same or different.
  • le independently represents an integer of 0 to 4. Among them, le is preferably 0 to 2 independently of each other. A plurality of le may be the same or different from each other.
  • the rod-shaped compound preferably has a biphenyl skeleton in that the obtained heat conductive material has better heat conductivity.
  • the epoxy compound preferably has a biphenyl skeleton, and the epoxy compound in this case is more preferably a rod-shaped compound.
  • the epoxy compound which is a disc-shaped compound, has a disc-shaped structure at least partially.
  • the disc-like structure has at least an alicyclic or aromatic ring.
  • the disk-shaped compound can form a columnar structure by forming a stacking structure by ⁇ - ⁇ interaction between molecules.
  • Angew. Chem. Int. Ed. examples thereof include the triphenylene structure described in 2012, 51, 7990-7793 or JP-A-7-306317, and the tri-substituted benzene structure described in JP-A-2007-2220 and JP-A-2010-244038.
  • a heat conductive material showing high heat conductivity can be obtained.
  • the rod-shaped compound can conduct heat only linearly (one-dimensionally), whereas the disk-shaped compound can conduct heat planarly (two-dimensionally) in the normal direction, so that the heat conduction path is It is thought that the number will increase and the thermal conductivity will improve.
  • the disk-shaped compound preferably has three or more epoxy groups.
  • a cured product of a composition containing a disk-shaped compound having three or more epoxy groups tends to have a high glass transition temperature and high heat resistance.
  • the number of epoxy groups contained in the disk-shaped compound is preferably 8 or less, more preferably 6 or less.
  • disk-shaped compound examples include C.I. Destrade et al. , Mol. Crysr. Liq. Cryst. , Vol. 71, page 111 (1981); Chemical Society of Japan, Quarterly Review of Chemistry, No. 22, Liquid crystal chemistry, Chapter 5, Chapter 10, Section 2 (1994); B. Kohne et al. , Angew. Chem. Soc. Chem. Comm. , Page 1794 (1985); J. Mol. Zhang et al. , J. Am. Chem. Soc. , Vol. In the compounds described in 116, page 2655 (1994), and Japanese Patent No. 4592225, compounds having at least one end (preferably three or more) as an epoxy group can be mentioned.
  • disk-shaped compound examples include Angew. Chem. Int. Ed.
  • the triphenylene structure described in 2012, 51, 7990-7793, and JP-A-7-306317, and the trisubstituted benzene structure described in JP-A-2007-2220 and JP-A-2010-240383 are terminal.
  • examples thereof include compounds having at least one (preferably three or more) epoxy groups.
  • a compound represented by any of the following formulas (D1) to (D16) is preferable from the viewpoint of better thermal conductivity of the heat conductive material.
  • equations (D1) to (D15) will be described, and then the equation (D16) will be described.
  • "-LQ” represents “-L-Q”
  • QL- represents "QL-”.
  • L represents a divalent linking group.
  • L is independently an alkylene group, an alkaneylene group, an arylene group, -CO-, -NH-, -O-, -S-, and a combination thereof. It is preferable that the group is selected from the group consisting of alkylene group, alkenylene group, arylene group, and two or more groups selected from the group consisting of -CO-, -NH-, -O-, and -S-. More preferably, it is a combined group.
  • the alkylene group preferably has 1 to 12 carbon atoms.
  • the number of carbon atoms of the alkenylene group is preferably 2 to 12.
  • the arylene group preferably has 10 or less carbon atoms.
  • the alkylene group, alkenylene group, and arylene group may have a substituent (preferably an alkyl group, a halogen atom, a cyano, an alkoxy group, an acyloxy group, etc.).
  • L is shown below.
  • the bond on the left side binds to the central structure of the compound represented by any of the formulas (D1) to (D15) (hereinafter, also simply referred to as "central ring"), and the bond on the right side is Q.
  • AL means an alkylene group or an alkenylene group
  • AR means an arylene group.
  • Q independently represents a hydrogen atom or a substituent.
  • substituents include the groups exemplified in the above-mentioned substituent group Y. More specifically, as the substituent, the above-mentioned reactive functional group, halogen atom, isocyanate group, cyano group, unsaturated polymerizable group, epoxy group, oxetanyl group, aziridinyl group, thioisocyanate group, aldehyde group, and Examples include sulfo groups.
  • Q is a group other than the epoxy group, it is preferable that Q is stable with respect to the epoxy group.
  • one or more (preferably two or more) Qs represent an epoxy group. Above all, from the viewpoint of better thermal conductivity of the heat conductive material, it is preferable that all Qs represent epoxy groups.
  • the compounds represented by the formulas (D1) to (D15) preferably do not have -NH- from the viewpoint of the stability of the epoxy group.
  • the compound represented by the formula (D4) is preferable from the viewpoint of more excellent thermal conductivity of the heat conductive material.
  • the central ring of the disc-shaped compound is preferably a triphenylene ring.
  • the compound represented by the formula (XI) is preferable from the viewpoint of more excellent thermal conductivity of the heat conductive material.
  • R 11 , R 12 , R 13 , R 14 , R 15 , and R 16 are independently * -X 11- L 11- P 11 or * -X 12- L, respectively.
  • * represents the bonding position with the triphenylene ring.
  • R 11, R 12, R 13 , R 14, R 15 and, among the R 16, two or more may, * - X 11 is -L 11 -P 11, 3 or more is * -X 11 -L 11 is preferably -P 11.
  • R 11 and R 12 from the viewpoint of better thermal conductivity of the heat conductive material, one or more of R 11 and R 12 , one or more of R 13 and R 14 , and any one of R 15 and R 16.
  • the number is * -X 11- L 11- P 11. It is more preferable that R 11 , R 12 , R 13 , R 14 , R 15 , and R 16 are all * -X 11- L 11- P 11. In addition, it is more preferred that R 11 , R 12 , R 13 , R 14 , R 15 and R 16 are all the same.
  • X 11 is independently single-bonded, -O-, -CO-, -NH-, -O-CO-, -O-CO-O-, -O-CO-NH-, -O-CO-.
  • X 11 independently have -O-, -O-CO-, -O-CO-O-, -O-CO-NH-, -CO-O-, -CO-NH-, and -NH.
  • -CO- or -NH-CO-O- is preferable, and -O-, -O-CO-, -CO-O-, -O-CO-NH-, or -CO-NH- is more preferable.
  • -O-CO- or -CO-O- is even more preferred.
  • L 11 independently represents a single bond or a divalent linking group.
  • divalent linking groups include -O-, -O-CO-, -CO-O-, -S-, -NH-, and alkylene groups (preferably 1 to 10 carbon atoms, 1 to 8 carbon atoms). Is more preferable, 1 to 7 is more preferable), an arylene group (the number of carbon atoms is preferably 6 to 20, more preferably 6 to 14, and even more preferably 6 to 10), or a group consisting of a combination thereof. Can be mentioned.
  • Examples of the alkylene group include a methylene group, an ethylene group, a propylene group, a butylene group, a pentylene group, a hexylene group, and a heptylene group.
  • Examples of the arylene group include a 1,4-phenylene group, a 1,3-phenylene group, a 1,4-naphthylene group, a 1,5-naphthylene group, and an anthrasenylene group, and a 1,4-phenylene group is preferable. ..
  • the alkylene group and the arylene group may each have a substituent.
  • the number of substituents is preferably 1 to 3, more preferably 1.
  • the substitution position of the substituent is not particularly limited.
  • As the substituent a halogen atom or an alkyl group having 1 to 3 carbon atoms is preferable, and a methyl group is more preferable. It is also preferable that the alkylene group and the arylene group are unsubstituted. Of these, the alkylene group is preferably unsubstituted.
  • Examples of ⁇ X 11 ⁇ L 11 ⁇ include L101 to L143, which are examples of L described above.
  • P 11 represents an epoxy group.
  • the epoxy group may or may not have a substituent.
  • X 12 is the same as X 11 , and the preferred conditions are also the same.
  • L 12 is the same as L 11 , and the preferred conditions are also the same.
  • Examples of ⁇ X 12 ⁇ L 12 ⁇ include L101 to L143, which are examples of L described above.
  • Y 12 is a hydrogen atom, a linear, branched or cyclic alkyl group having 1 to 20 carbon atoms, or a linear, branched or cyclic alkyl group having 1 to 20 carbon atoms.
  • one or more methylene groups are substituted with -O-, -S-, -NH-, -N (CH 3 )-, -CO-, -O-CO-, or -CO-O-.
  • One Y 12 is a linear, branched or cyclic alkyl group having 1 to 20 carbon atoms, or a linear, branched or cyclic alkyl group having 1 to 20 carbon atoms.
  • one or more hydrogen atoms contained in Y 12 may be substituted with a halogen atom.
  • the compound represented by the formula (XI) conforms to the methods described in JP-A-7-306317, JP-A-7-281028, JP-A-2005-156822, and JP-A-2006-301614. Can be synthesized.
  • the compound represented by the formula (D16) is also preferable as the disk-shaped compound.
  • R 17X, R 18X, and, R 19X are each independently, * represents - (Z 21X -X 212X) n21X -L 21X -Q - X 211X. * Represents the position of connection with the central ring.
  • X 211X and X 212X are independently single-bonded, -O-, -CO-, -NH-, -O-CO-, -O-CO-O-, -O-CO-NH-, -O.
  • Z 21X independently represents a 5-membered or 6-membered aromatic ring group or a 5-membered or 6-membered non-aromatic ring group.
  • L 21X represents a single bond or a divalent linking group.
  • Q is synonymous with Q in the formulas (D1) to (D15), and the preferred conditions are also the same.
  • At least one (preferably all) Q among the plurality of Qs present represents an epoxy group.
  • n21X represents an integer of 0 to 3.
  • a plurality of (Z 21X- X 212X ) may be the same or different.
  • the compound represented by the formula (D16) preferably does not have -NH- from the viewpoint of the stability of the epoxy group.
  • the compound represented by the formula (D16) As the compound represented by the formula (D16), the compound represented by the formula (XII) is preferable.
  • -CH is preferable for A 2 , A 3 and A 4.
  • the central ring of the disk-shaped compound is a benzene ring.
  • R 17, R 18, and, R 19 are each independently, * - X 211 - (Z 21 -X 212) n21 -L 21 -P 21, or, * - X 221 - (Z 22 -X 222) representing the n22 -Y 22. * Represents the position of connection with the central ring.
  • R 17, R 18 and two or more of R 19 is, * - X 211 - a (Z 21 -X 212) n21 -L 21 -P 21.
  • R 17, R 18, and all R 19 has, * - X 211 - and even a (Z 21 -X 212) n21 -L 21 -P 21 preferable.
  • X 211 , X 212 , X 221 and X 222 are independently single-bonded, -O-, -CO-, -NH-, -O-CO-, -O-CO-O-, -O, respectively.
  • -CO-NH-, -O-CO-S-, -CO-O-, -CO-NH-, -CO-S-, -NH-CO-, -NH-CO-O-, -NH-CO Represents -NH-, -NH-CO-S-, -S-, -S-CO-, -S-CO-O-, -S-CO-NH-, or -S-CO-S-.
  • single bonds, —O—, —CO—O—, or —O—CO— are preferable, respectively.
  • Z 21 and Z 22 independently represent a 5-membered or 6-membered aromatic ring group or a 5-membered or 6-membered non-aromatic ring group, for example, a 1,4-phenylene group. , 1,3-Phenylene group, and aromatic heterocyclic group.
  • the aromatic ring group and the non-aromatic ring group may have a substituent.
  • the number of substituents is preferably 1 or 2, more preferably 1.
  • the substitution position of the substituent is not particularly limited.
  • As the substituent a halogen atom or a methyl group is preferable. It is also preferable that the aromatic ring group and the non-aromatic ring group are unsubstituted.
  • aromatic heterocyclic group examples include the following aromatic heterocyclic groups.
  • * represents a site that binds to X 211 or X 221.
  • ** represents a site that binds to X 212 or X 222.
  • a 41 and A 42 each independently represent a methine group or a nitrogen atom.
  • X 4 represents an oxygen atom, a sulfur atom or an imino group. It is preferable that at least one of A 41 and A 42 is a nitrogen atom, and it is more preferable that both are nitrogen atoms. Further, X 4 is preferably an oxygen atom.
  • n21 and n22 which will be described later, are two or more, a plurality of (Z 21- X 212 ) and (Z 22- X 222 ) may be the same or different from each other.
  • L 21 independently represents a single bond or a divalent linking group, and is synonymous with L 11 in the above formula (XI).
  • Examples of L 21 include -O-, -O-CO-, -CO-O-, -S-, -NH-, and an alkylene group (the number of carbon atoms is preferably 1 to 10 and more preferably 1 to 8). ⁇ 7 is more preferable), an arylene group (the number of carbon atoms is preferably 6 to 20, more preferably 6 to 14, and even more preferably 6 to 10), or a group composed of a combination thereof is preferable.
  • n22 is 1 or more, -X 212 -L 21 - Examples of are examples of L in the above formula (D1) ⁇ (D15) L101 ⁇ L143 and the like as well.
  • P 21 represents an epoxy group.
  • the epoxy group may or may not have a substituent.
  • Y 22 is independently a hydrogen atom, a linear, branched or cyclic alkyl group having 1 to 20 carbon atoms, or a linear, branched or cyclically charged group having 1 to 20 carbon atoms.
  • one or more methylene groups are -O-, -S-, -NH-, -N (CH 3 )-, -CO-, -O-CO-, or -CO-.
  • represents radicals substituted by O- has the same meaning as Y 12 in the general formula (XI), preferred ranges are also the same.
  • N21 and n22 each independently represent an integer of 0 to 3, and from the viewpoint of better thermal conductivity, an integer of 1 to 3 is preferable, and an integer of 2 to 3 is more preferable.
  • Preferred examples of the disk-shaped compound include the following compounds.
  • R represents ⁇ X 212 ⁇ L 21 ⁇ P 21 .
  • the compound represented by the formula (XII) can be synthesized according to the methods described in JP-A-2010-244038, JP-A-2006-76992, and JP-A-2007-2220.
  • the disk-shaped compound is preferably a compound having a hydrogen-bonding functional group from the viewpoint of reducing the electron density, strengthening the stacking, and facilitating the formation of a columnar aggregate.
  • Hydrogen-bonding functional groups include -O-CO-NH-, -CO-NH-, -NH-CO-, -NH-CO-O-, -NH-CO-NH-, and -NH-CO-S. -Or-S-CO-NH- and the like can be mentioned.
  • epoxy compounds examples of other epoxy compounds other than the above-mentioned epoxy compounds include epoxy compounds represented by the general formula (DN).
  • nDN represents an integer of 0 or more, preferably 0 to 5, and more preferably 1.
  • RDN represents a single bond or a divalent linking group.
  • the divalent linking group includes -O-, -O-CO-, -CO-O-, -S-, an alkylene group (preferably 1 to 10 carbon atoms), and an arylene group (the carbon number is preferably 1 to 10). 6 to 20 is preferable), or a group composed of a combination thereof is preferable, an alkylene group is more preferable, and a methylene group is further preferable.
  • Examples of other polyfunctional epoxy compounds include epoxy compounds represented by the general formula (E1). (V-) 4- UC (-W) U (E1)
  • C represents a carbon atom.
  • U represents an integer of 3 or 4.
  • "U” in “4-U” indicating the number of V and "U” indicating the number of W show the same value. That is, the general formula (E1) is "VC (-W) 3 " or "C (-W) 4 ".
  • V represents a substituent having no hydrogen atom or epoxy group.
  • the above-mentioned substituent having no epoxy group is a substituent other than the epoxy group and does not contain an epoxy group as a part of the substituent.
  • the substituent having no epoxy group include a group selected from the substituent group Y, excluding an epoxy group and a group containing an epoxy group as a part.
  • the substituent having no epoxy group is preferably an alkyl group, and more preferably a linear or branched alkyl group.
  • the alkyl group preferably has 1 to 5 carbon atoms.
  • W represents an epoxy-containing group.
  • the epoxy-containing group is a group that is the epoxy group itself, or a monovalent group that contains an epoxy group as a part.
  • the monovalent group containing the epoxy group as a part is a group having one or more (preferably 1 to 8) epoxy groups in the whole group.
  • the monovalent group containing the epoxy group as a part is preferably a group represented by "-(divalent hydrocarbon group) M1- (-O-2-valent hydrocarbon group-) M2-epoxy group".
  • M1 represents 0 or 1.
  • M2 represents an integer of 1 or more (preferably 1 to 10).
  • the divalent hydrocarbon group may or may not have a substituent, and the divalent hydrocarbon group may further have an epoxy-containing group as a substituent.
  • the divalent hydrocarbon groups that may be present in a plurality thereof may be the same or different from each other.
  • a plurality of Ws existing in the general formula (E1) may be the same or different from each other.
  • Examples of other epoxy compounds include compounds in which the epoxy group is fused. Examples of such a compound include 3,4: 8,9-diepoxybicyclo [4.3.0] nonane and the like.
  • epoxy compounds include, for example, bisphenol A type epoxy compounds, bisphenol F type epoxy compounds, bisphenol S type epoxy compounds, and bisphenol AD type epoxy compounds, which are glycidyl ethers such as bisphenol A, F, S, and AD. Etc .; hydrogenated bisphenol A type epoxy compound, hydrogenated bisphenol AD type epoxy compound, etc .; phenol novolac type glycidyl ether (phenol novolak type epoxy compound), cresol novolak type glycidyl ether (cresol novolak type epoxy compound), bisphenol A Novolak type glycidyl ether, etc .; Dicyclopentadiene type glycidyl ether (dicyclopentadiene type epoxy compound); Dihydroxypentadiene type glycidyl ether (dihydroxypentadiene type epoxy compound); Polyhydroxybenzene type glycidyl ether (polyhydroxybenzene type) Epoxy compound); benzenepolycarboxylic acid type gly
  • a compound in which one or more of the glycidyl ether group and / or the glycidyl ester group in each of the above compounds is replaced with a diglycidylamino group or a diglycidylaminoalkylene group (diglycidylaminomethylene group, etc.) is used as the epoxy compound. You may.
  • Each of the above compounds may have a substituent.
  • the aromatic ring group, cycloalkane ring group, and / or alkylene group contained in each of the above compounds is other than the glycidyl ether group, the glycidyl ester group, the diglycidyl amino group, and / or the diglycidyl aminoalkylene group. It may have a substituent of.
  • the epoxy compound to be used in consideration of each performance to be realized in the composition. For example, when the epoxy compound has an aromatic ring group (benzene ring or the like), the heat conductivity of the heat conductive material is more excellent. When an epoxy compound having a flexible structure or excellent moldability is used, the storage stability of the semi-cured sheet formed from the composition is more excellent. Examples of such an epoxy compound include a bisphenol F type epoxy compound, an epoxy compound represented by the general formula (E1), and an epoxy compound having a diglycidylamino group. When the epoxy compound has liquidity, the thermal conductivity and / or peel strength of the heat conductive material formed from the composition is more excellent. Further, when the epoxy compound is an epoxy compound represented by the general formula (DN), the thermal conductivity and / or peel strength of the heat conductive material formed from the composition is more excellent.
  • the epoxy compound may be used alone or in combination of two or more.
  • two or more kinds of epoxy compounds it is easy to adjust the balance of the performance of the composition.
  • a bisphenol F type epoxy compound and a phenoxy resin when used, when a bisphenol F type epoxy compound and a phenol novolac type epoxy compound are used, and when a polyhydroxybenzene type epoxy compound and a phenol novolac type epoxy compound are used. In such cases, the balance of performance of the composition becomes better.
  • the ratio of the number of epoxy groups contained in the epoxy compound to the number of phenolic hydroxyl groups contained in the total phenol compound in the composition is 40/60 to 60/40. Preferably, 45/55 to 55/45 is more preferable. That is, the ratio of the content of the total phenol compound to the epoxy compound in the composition is preferably such that the above-mentioned "number of epoxy groups / number of phenolic hydroxyl groups" is within the above range.
  • the total phenol compound referred to here is intended to be both a specific phenol compound and other phenol compounds.
  • the equivalent ratio (may be active hydrogen derived from a phenolic hydroxyl group or active hydrogen of another active hydrogen-containing compound) between the epoxy group of the epoxy compound and the active hydrogen (may be active hydrogen derived from a phenolic hydroxyl group).
  • the number of epoxy groups / number of active hydrogens is preferably 30/70 to 70/30, more preferably 40/60 to 60/40, and even more preferably 45/55 to 55/45.
  • the total content of the epoxy compound and the total phenol compound in the composition is preferably 5 to 90% by mass, more preferably 10 to 50% by mass, and 15 to 40% by mass with respect to the total solid content of the composition. % Is more preferable.
  • the total solid content is intended as a component forming a heat conductive material and does not contain a solvent.
  • the component forming the heat conductive material referred to here may be a component whose chemical structure changes by reacting (polymerizing) when forming the heat conductive material. Further, if it is a component forming a heat conductive material, even if its property is liquid, it is regarded as a solid content.
  • the composition of the present invention contains a curing accelerator.
  • the curing accelerator include trisorthotrilphosphine, triphenylphosphine, boron trifluoride amine complex, and the compounds described in paragraph 0052 of JP2012-67225A.
  • TPP-K tetraphenylphosphonium tetraphenylborate
  • TPP-MK tetraphenylphosphonium tetra-p-tolylborate
  • TPP-LA tetra-n-butylphosphonium laurate
  • bis (tetra-n-butylphosphonium) ) Pyromeritate and onium salt-based curing accelerators such as quaternary phosphonium-based compounds (phosphonium salts) such as bis (naphthalen-2,3-dioxy) phenylsilicate adduct of tetraphenylphosphonium can also be mentioned.
  • 2-methylimidazole (trade name; 2MZ), 2-undecylimidazole (trade name; C11-Z), 2-heptadecylimidazole (trade name; C17Z), 1,2-dimethylimidazole (trade name).
  • the compound described in paragraph 0052 of JP-A-2004-43405 can also be mentioned.
  • the phosphorus-based curing accelerator to which triphenylborane is added to triarylphosphine include the compounds described in paragraph 0024 of JP-A-2014-5382.
  • the curing accelerator preferably contains a compound containing a phosphorus atom, and more preferably contains a phosphonium salt.
  • the curing accelerator may be a compound containing a phosphorus atom or a phosphonium salt itself.
  • the content of the compound containing a phosphorus atom or the phosphonium salt is preferably 10 to 100% by mass, more preferably 50 to 100% by mass, still more preferably 80 to 100% by mass, based on the total mass of the curing accelerator.
  • the curing accelerator may be used alone or in combination of two or more.
  • the content of the curing accelerator is preferably 0.002% by mass or more, more preferably 0.02% by mass or more, still more preferably 0.07% by mass or more, based on the total solid content of the composition.
  • the content of the curing accelerator is preferably 5% by mass or less, more preferably 2% by mass or less, still more preferably 1% by mass or less, based on the total solid content of the composition.
  • the content of the curing accelerator is preferably 0.01% by mass or more, more preferably 0.10% by mass or more, still more preferably 0.55% by mass or more, based on the total epoxy compound.
  • the content of the curing accelerator is preferably 40% by mass or less, more preferably 12% by mass or less, further preferably 10% by mass or less, and particularly preferably 5% by mass or less, based on the total epoxy compound.
  • the composition of the present invention contains an inorganic substance.
  • the inorganic substance any inorganic substance conventionally used for the inorganic filler of the heat conductive material may be used.
  • the inorganic substance preferably contains an inorganic nitride or an inorganic oxide, and more preferably at least an inorganic nitride, because the heat conductive material is more excellent in thermal conductivity and insulating property.
  • the shape of the inorganic substance is not particularly limited, and may be in the form of particles, a film, or a plate.
  • Examples of the shape of the particulate inorganic substance include rice granules, spherical shape, cube shape, spindle shape, scaly shape, agglomerated shape, and indefinite shape.
  • the inorganic oxide examples include zirconium oxide (ZrO 2 ), titanium oxide (TIO 2 ), silicon oxide (SiO 2 ), aluminum oxide (Al 2 O 3 ), iron oxide (Fe 2 O 3 , FeO, Fe 3). O 4 ), copper oxide (CuO, Cu 2 O), zinc oxide (ZnO), yttrium oxide (Y 2 O 3 ), niobium oxide (Nb 2 O 5 ), molybdenum oxide (MoO 3 ), indium oxide (In 2).
  • ZrO 2 zirconium oxide
  • TiO 2 titanium oxide
  • silicon oxide SiO 2
  • aluminum oxide Al 2 O 3
  • iron oxide Fe 2 O 3 , FeO, Fe 3
  • O 4 copper oxide (CuO, Cu 2 O), zinc oxide (ZnO), yttrium oxide (Y 2 O 3 ), niobium oxide (Nb 2 O 5 ), molybdenum oxide (MoO 3 ), indium oxide (In 2).
  • the inorganic oxide is preferably titanium oxide, aluminum oxide, or zinc oxide, and more preferably aluminum oxide.
  • the inorganic oxide may be an oxide produced by oxidizing a metal prepared as a non-oxide in an environment or the like.
  • inorganic nitride examples include boron nitride (BN), carbon nitride (C 3 N 4 ), silicon nitride (Si 3 N 4 ), gallium nitride (GaN), indium nitride (InN), and aluminum nitride (AlN).
  • BN boron nitride
  • C 3 N 4 carbon nitride
  • Si 3 N 4 silicon nitride
  • GaN gallium nitride
  • InN indium nitride
  • AlN aluminum nitride
  • the inorganic nitride preferably contains an aluminum atom, a boron atom, or a silicon atom, more preferably aluminum nitride, boron nitride, or silicon nitride, and even more preferably aluminum nitride or boron nitride. It is particularly preferable to contain boron nitride.
  • the size of the inorganic substance is not particularly limited, but the average particle size of the inorganic substance is preferably 500 ⁇ m or less, more preferably 300 ⁇ m or less, still more preferably 200 ⁇ m or less, in that the dispersibility of the inorganic substance is more excellent.
  • the lower limit is not particularly limited, but in terms of handleability, 10 nm or more is preferable, and 100 nm or more is more preferable.
  • the average particle size of the inorganic substance the catalog value is adopted when a commercially available product is used. If there is no catalog value, as the method for measuring the average particle size, 100 inorganic substances are randomly selected, the particle size (major axis) of each inorganic substance is measured, and the arithmetic is performed. Calculate on average.
  • the inorganic substance preferably contains at least one of an inorganic nitride and an inorganic oxide, and more preferably contains at least an inorganic nitride. It may contain both inorganic nitrides and inorganic oxides.
  • the inorganic nitride preferably contains at least one of boron nitride and aluminum nitride, more preferably at least boron nitride, and even more preferably at least agglomerated boron nitride having an average particle size of 20 ⁇ m or more. ..
  • the content of the inorganic nitride (preferably boron nitride and / or aluminum nitride) in the inorganic substance is preferably 10 to 100% by mass, more preferably 40 to 100% by mass, and 80 to 100% by mass with respect to the total mass of the inorganic substance. % Is more preferable.
  • the inorganic oxide aluminum oxide is preferable.
  • the composition is an inorganic substance (preferably an inorganic nitride or an inorganic oxide, more preferably an inorganic nitride) having an average particle size of 20 ⁇ m or more (preferably 30 ⁇ m or more). , More preferably, boron nitride, particularly preferably aggregated boron nitride).
  • the inorganic material contained in the composition (preferably an inorganic nitride or an inorganic oxide, more preferably an inorganic nitride, further preferably boron nitride and / or aluminum nitride) has a substantially average particle size of 20 ⁇ m or more (preferably 30 ⁇ m). It is also preferable that only the inorganic substances of the above) are used.
  • the fact that the inorganic substances are substantially only inorganic substances having an average particle size of 20 ⁇ m or more means that the content of the inorganic substances having an average particle size of 20 ⁇ m or more is more than 99% by mass with respect to the total mass of the inorganic substances.
  • the inorganic substance preferably has an inorganic substance having a different average particle size, for example, both an inorganic substance X having an average particle size of 20 ⁇ m or more and an inorganic substance Y having an average particle size of less than 20 ⁇ m. It is also preferable to include it.
  • the average particle size of the inorganic substance X is preferably 20 to 300 ⁇ m, more preferably 30 to 200 ⁇ m.
  • the average particle size of the inorganic substance Y is preferably 1 nm or more and less than 20 ⁇ m, and more preferably 10 nm or more and 15 ⁇ m or less.
  • the inorganic substance X is preferably an inorganic nitride or an inorganic oxide, more preferably an inorganic nitride, further preferably boron nitride, and particularly preferably agglutinating boron nitride.
  • the inorganic substance Y is preferably an inorganic nitride or an inorganic oxide, more preferably boron nitride or aluminum oxide.
  • the inorganic substance X and the inorganic substance Y one kind may be used alone, or two or more kinds may be used.
  • the mass ratio of the content of the inorganic substance X to the content of the inorganic substance Y is preferably 50/50 to 99/1, and 60/40 to 95/5. Is more preferable.
  • Inorganic substances may be surface-treated.
  • the surface treatment is intended to be a treatment different from the surface modification using a surface modifier described later.
  • a functional group is introduced on the surface of the inorganic substance, and the inorganic substance easily interacts with a phenol compound, an epoxy compound, and / or a surface modifier described later, and is formed as a heat conductive material. It is considered that the thermal conductivity and peel strength of the compound are further improved.
  • the surface treatment includes, for example, plasma treatment (vacuum plasma treatment, atmospheric pressure plasma treatment, aqua plasma treatment, etc.), ultraviolet irradiation treatment, corona treatment, electron beam irradiation treatment, ozone treatment, firing treatment, flame treatment, and Oxidizing agent treatment and the like can be mentioned.
  • the oxidizing agent treatment may be carried out under acidic conditions or basic conditions (pH 12 or higher, etc.).
  • the content of the inorganic substance in the composition is 10% by mass or more, preferably 40% by mass or more, more preferably 50% by mass or more, still more preferably 60% by mass or more, based on the total solid content of the composition.
  • the upper limit is less than 100% by mass, preferably 95% by mass or less.
  • the composition of the present invention may further contain a surface modifier as a component different from the above-mentioned components.
  • the surface modifier is a component that surface-modifies the above-mentioned inorganic substances.
  • surface modification means a state in which an organic substance is adsorbed on at least a part of the surface of the inorganic substance.
  • the form of adsorption is not particularly limited, and may be in a bonded state. That is, the surface modification also includes a state in which an organic group obtained by desorption of a part of an organic substance is bonded to the surface of the inorganic substance.
  • the bond may be any bond such as a covalent bond, a coordination bond, an ionic bond, a hydrogen bond, a van der Waals bond, and a metal bond.
  • the surface modification may be made to form a monolayer on at least a part of the surface.
  • the monolayer is a monolayer formed by chemisorption of organic molecules and is known as Self-Assembled MonoLayer (SAM).
  • SAM Self-Assembled MonoLayer
  • the surface modification may be only a part of the surface of an inorganic substance, or may be the whole.
  • the term "surface-modified inorganic substance” means an inorganic substance that has been surface-modified with a surface modifier, that is, a substance in which an organic substance is adsorbed on the surface of the inorganic substance. That is, in the composition of the present invention, the inorganic substance may constitute a surface-modified inorganic substance (preferably a surface-modified inorganic nitride and / or a surface-modified inorganic oxide) in combination with the surface modifier.
  • a conventionally known surface modifier such as a carboxylic acid such as a long-chain alkyl fatty acid, an organic phosphonic acid, an organic phosphoric acid ester, and an organic silane molecule (silane coupling agent) can be used.
  • a carboxylic acid such as a long-chain alkyl fatty acid, an organic phosphonic acid, an organic phosphoric acid ester, and an organic silane molecule (silane coupling agent)
  • silane coupling agent organic silane molecule
  • the silane coupling agent is, for example, a compound having a hydrolyzable group directly bonded to a Si atom.
  • the hydrolyzable group include an alkoxy group (preferably 1 to 10 carbon atoms) and a halogen atom such as a chlorine atom.
  • the number of hydrolyzable groups directly bonded to the Si atom of the silane coupling agent is preferably 1 or more, more preferably 2 or more, still more preferably 3 or more. There is no upper limit to the above number, for example, 10,000. It is also preferable that the silane coupling agent has a reactive group.
  • the reactive group examples include an epoxy group, an oxetanyl group, a vinyl group, a (meth) krill group, a styryl group, an amino group, an isocyanate group, a mercapto group, and an acid anhydride group.
  • the number of reactive groups contained in the silane coupling agent is preferably 1 or more, more preferably 2 or more, and even more preferably 3 or more. There is no upper limit to the above number, for example, 10,000.
  • silane coupling agent examples include 3-aminopropyltriethoxysilane, 3- (2-aminoethyl) aminopropyltriethoxysilane, 3-aminopropyltrimethoxysilane, and 3- (2-aminoethyl) aminopropyltri.
  • examples thereof include methoxysilane, N-phenyl-3-aminopropyltrimethoxysilane, 3-mercaptotriethoxysilane, and 3-ureidopropyltriethoxysilane.
  • the surface modifier may be used alone or in combination of two or more.
  • the content of the surface modifier is preferably 0.005 to 5% by mass, more preferably 0.05 to 3% by mass, based on the total solid content of the composition.
  • the content of the surface modifier is preferably 0.01 to 10% by mass, more preferably 0.10 to 5% by mass, based on the total inorganic substances.
  • the composition of the present invention may contain an ion catching agent.
  • the ionic catcher adsorbs ionic impurities in the composition or in the heat conductive material formed with the composition. This makes it possible to maintain good insulation reliability of the heat conductive material even when the heat conductive material absorbs moisture in the composition.
  • the ion scavenger a known one can be used without particular limitation.
  • the ion trapping agent include a cation adsorbent that captures cations by ion exchange, an anion adsorbent that captures anions by ion exchange, and both cations and anions that are captured by ion exchange. Examples thereof include an inorganic ion adsorbent such as an ion catcher; a triazinethiol compound; a triazineamine compound; and a bisphenol-based reducing agent.
  • the inorganic ion adsorbent includes one or more oxides, oxide hydrates, and hydroxides selected from the group consisting of antimony, bismuth, zirconium, titanium, tin, magnesium, and aluminum. Can be mentioned. Among them, two or more kinds of oxides, oxidative hydrates, or hydroxides selected from the group consisting of bismuth, zirconium, magnesium, and aluminum are preferable, and a three-component system of magnesium, aluminum, and zirconium is preferable. Hydrotalsite, which is a two-component oxide hydrate of oxide, bismuth and zirconium, and a hydroxide containing magnesium and aluminum, is more preferable, and hydrotalcite is even more preferable.
  • Examples of the triazine thiol compound include 2-dibutylamino-4,6-dimercapto-s-triazine.
  • Examples of the bisphenol-based reducing agent include 2,2'-methylenebis- (4-ethyl-6-t-butylphenol) and 4,4'-butylidenebis- (6-t-butyl-3-methylphenol). Can be mentioned.
  • the content of the ion-supplementing agent is, for example, 0.01 to 10% by mass with respect to the total solid content of the composition.
  • the ion catching agent may be used alone or in combination of two or more.
  • the composition may further contain a solvent.
  • the type of solvent is not particularly limited, and it is preferably an organic solvent.
  • the organic solvent include cyclopentanone, cyclohexanone, ethyl acetate, methyl ethyl ketone, dichloromethane, tetrahydrofuran and the like.
  • the content of the solvent is preferably an amount having a solid content concentration of the composition of 20 to 90% by mass, more preferably 30 to 80% by mass, and more preferably 50 to 80% by mass. Is more preferable.
  • the content of the solvent is preferably 5 to 80% by mass, more preferably 15 to 70% by mass, still more preferably 20 to 50% by mass, based on the total mass of the composition.
  • the temperature at which an exothermic peak is detected may be 130 ° C. or higher. It is preferably 140 ° C. or higher, more preferably 150 ° C. or higher.
  • the upper limit of the temperature is not particularly limited, but is preferably 240 ° C. or lower, for example.
  • the semi-cured sheet used for measuring the exothermic peak is a semi-cured film (semi-cured film) formed by the composition.
  • the semi-cured sheet is a sheet obtained by putting the composition in a so-called B stage state.
  • the semi-cured sheet is specifically defined as follows. First of all, the uncured composition was prepared using a DSC (differential scanning calorimeter, DSC320 / 6200 manufactured by Seiko Instruments Inc., etc.) from 25 ° C to 240 ° C under the heating conditions of 10 ° C / min. Observe the reaction behavior below. This is referred to as measurement 1. If the composition to be measured contains a solvent, the solvent in the composition is removed in advance under reduced pressure before measurement 1. Next, a sheet formed from the same composition and to be judged whether it is a semi-cured sheet or not (judgment target sheet) is similarly subjected to DSC from 25 ° C. to 240 ° C. at 10 ° C./.
  • DSC differential scanning calorimeter, DSC320 / 6200 manufactured by Seiko Instruments Inc., etc.
  • the reaction behavior under the warming condition of the minute This is referred to as measurement 2.
  • the total area of the exothermic peak detected in the measurement 1 is taken as 100%, and the ratio of the total area of the exothermic peak detected in the measurement 2 is obtained as N%.
  • (100-N)% is set as the reaction rate of the judgment target sheet and the reaction rate is 1% or more and 50% or less, it is judged that the judgment target sheet used for the measurement 2 is a semi-cured sheet.
  • the method for forming the semi-cured sheet will be described later in detail in the method for curing the composition.
  • the heat generation peak temperature at the substantial heat generation peak existing on the lowest temperature side is defined as the heat generation peak temperature of the semi-cured sheet.
  • substantially heat generation peak means a heat generation peak that occupies an area of 10% or more with respect to the total area (100%) of the heat generation peak of the semi-cured sheet existing between 25 ° C. and 240 ° C. do.
  • the exothermic peak detected when the uncured sheet formed by using the composition is measured by DSC is broad.
  • the uncured sheet is, for example, a sheet obtained by removing the solvent when the composition contains a solvent, and is a so-called A-stage sheet (film).
  • the exothermic peak is broad means that the half width of the exothermic peak is large and / or the difference between the temperature of the exothermic peak and the reaction start temperature is large.
  • the method for producing the composition is not particularly limited, and a known method can be adopted.
  • the above-mentioned various components can be mixed and produced.
  • various components may be mixed all at once or sequentially.
  • the method of mixing the components is not particularly limited, and a known method can be used.
  • the mixing device used for mixing is preferably a liquid disperser, for example, a stirrer such as a rotating revolution mixer, a high-speed rotary shear type stirrer, a colloid mill, a roll mill, a high-pressure injection disperser, an ultrasonic disperser, a bead mill, etc. And a homogenizer can be mentioned.
  • the mixing device may be used alone or in combination of two or more. Degassing may be performed before, after, and / or at the same time as mixing.
  • the composition of the present invention is preferably a composition for forming a heat conductive material.
  • the composition of the present invention is cured to obtain a heat conductive material.
  • the curing method of the composition is not particularly limited, but a thermosetting reaction is preferable.
  • the heating temperature during the thermosetting reaction is not particularly limited. For example, it may be appropriately selected in the range of 50 to 250 ° C. Further, when the thermosetting reaction is carried out, heat treatments having different temperatures may be carried out a plurality of times.
  • the curing treatment is preferably performed on a film-like or sheet-like composition. Specifically, for example, the composition may be applied to form a film and a curing reaction may be carried out.
  • the composition When performing the curing treatment, it is preferable to apply the composition on the substrate to form a coating film and then cure. At this time, a different base material may be brought into contact with the coating film formed on the base material, and then the curing treatment may be performed. The cured product (heat conductive material) obtained after curing may or may not be separated from one or both of the substrates. Further, when the curing treatment is performed, the composition may be applied on different substrates to form coating films, and the curing treatment may be performed in a state where the obtained coating films are in contact with each other. The cured product (heat conductive material) obtained after curing may or may not be separated from one or both of the substrates.
  • the curing treatment may be completed when the composition is in a semi-cured state. Further, after the composition is made into a semi-hardened state, a further curing treatment may be carried out to complete the curing.
  • the curing treatment also referred to as "semi-hardening treatment” for bringing the composition into a semi-hardening state and the curing treatment (also referred to as "main curing treatment") for completely curing are divided into separate steps. You may go.
  • a composition is applied onto a substrate to form a coating film, and then the coating film on the substrate is heated without pressure to form a semi-cured heat conductive material (“semi-cured”). It may be a "cured film” or a "semi-cured sheet"), or the coating film on the substrate may be heated or the like to form a semi-cured film while being pressed together.
  • the press working may be carried out before or after the above heating or the like, or may be carried out during the press working.
  • press working is performed in the semi-hardened treatment, it may be easy to adjust the film thickness of the obtained semi-hardened film and / or reduce the amount of voids in the semi-hardened film.
  • the semi-hardening treatment may be performed in a state where the coating films formed on different substrates are laminated, or the semi-hardening treatment may be performed without laminating the coating films.
  • the semi-hardening treatment may be carried out in a state where the coating film formed from the composition is further in contact with a material other than the coating film.
  • the obtained semi-cured film may be used as it is as a heat conductive material, or may be used as a completely cured heat conductive material after the semi-hardened film is further subjected to the main curing treatment.
  • the semi-hardened film may be heated as it is without pressure, or may be heated after being pressed or while being pressed.
  • the main curing treatment may be performed in a state where the separate semi-hardened films are laminated, or the main curing treatment may be performed without laminating the semi-hardened films.
  • the main curing treatment may be carried out in a state where the semi-hardened film is arranged so as to be in contact with the device or the like to be used. It is also preferable that the device and the heat conductive material of the present invention are adhered to each other by this curing treatment.
  • the press used for the press processing there are no restrictions on the press used for the press processing that may be performed during the semi-hardening treatment and / or the curing treatment in the main curing treatment, and for example, a flat plate press may be used or a roll press may be used. good.
  • a roll press for example, a substrate with a coating film obtained by forming a coating film on the substrate is sandwiched between a pair of rolls in which two rolls face each other, and the above pair of rolls is used. It is preferable to apply pressure in the film thickness direction of the coated substrate while rotating the substrate to pass the coated substrate.
  • the base material may be present on only one side of the coating film, or the base material may be present on both sides of the coating film.
  • the base material with a coating film may be passed through the roll press only once or may be passed a plurality of times.
  • the semi-hardening treatment and / or the curing treatment in the main curing treatment or the like only one of the treatment by the flat plate press and the treatment by the roll press may be carried out, or both may be carried out.
  • the shape of the heat conductive material is not particularly limited, and can be molded into various shapes depending on the application.
  • a typical shape of the molded heat conductive material is, for example, a sheet shape. That is, the heat conductive material obtained by using the composition of the present invention is preferably a heat conductive sheet. Further, the thermal conductivity of the heat conductive material obtained by using the composition of the present invention is preferably isotropic rather than anisotropic.
  • the heat conductive material is preferably insulating (electrically insulating).
  • the composition of the present invention is preferably a thermally conductive insulating composition.
  • the volume resistivity of the heat conductive material at 23 ° C. and 65% relative humidity is preferably 10 10 ⁇ ⁇ cm or more, more preferably 10 12 ⁇ ⁇ cm or more, and even more preferably 10 14 ⁇ ⁇ cm or more.
  • the upper limit is not particularly limited, but is usually 10 18 ⁇ ⁇ cm or less.
  • the heat conductive material obtained by using the composition of the present invention can be used as a heat radiating material such as a heat radiating sheet, and can be used for heat radiating applications of various devices. More specifically, a device with a heat conductive layer can be produced by arranging a heat conductive layer containing the heat conductive material of the present invention on the device, and heat generated from the device can be efficiently dissipated by the heat conductive layer.
  • the heat conductive layer may be a heat conductive layer including a heat conductive multilayer sheet described later. Since the heat conductive material obtained by using the composition of the present invention has sufficient heat conductivity and high heat resistance, it is used for various electric devices such as personal computers, general home appliances, and automobiles.
  • the heat conductive material obtained by using the composition of the present invention has sufficient heat conductivity even in a semi-cured state, it reaches light for photocuring such as gaps between members of various devices. It can also be used as a heat radiating material to be placed in areas where it is difficult to make it. In addition, since it has excellent adhesiveness, it can also be used as an adhesive having thermal conductivity.
  • the heat conductive material obtained by using the composition of the present invention may be used in combination with other members other than the members formed from the present composition.
  • the sheet-shaped heat conductive material may be combined with another sheet-shaped support of the layer formed from the present composition.
  • the sheet-shaped support include a plastic film, a metal film, or a glass plate.
  • the material of the plastic film include polyester such as polyethylene terephthalate (PET), polycarbonate, acrylic resin, epoxy resin, polyurethane, polyamide, polyolefin, cellulose derivative, and silicone.
  • the metal film include a copper film.
  • the film thickness of the sheet-shaped heat conductive material (heat conductive sheet) is preferably 100 to 300 ⁇ m, more preferably 150 to 250 ⁇ m.
  • an adhesive layer and / or an adhesive layer may be combined with the heat conductive material (preferably a heat conductive sheet).
  • the heat conductive material preferably a heat conductive sheet.
  • an object such as a device to which heat should be transferred through such an adhesive layer and / or an adhesive layer
  • a stronger bond between the heat conductive material and the object is performed.
  • the heat conductive multilayer sheet a heat conductive multilayer sheet having a heat conductive sheet and an adhesive layer or an adhesive layer provided on one side or both sides of the heat conductive sheet may be produced. ..
  • one of the adhesive layer and the pressure-sensitive adhesive layer may be provided on one side or both sides of the heat conductive sheet, respectively, or both may be provided.
  • An adhesive layer may be provided on one surface of the heat conductive sheet, and an adhesive layer may be provided on the other surface. Further, the adhesive layer and / or the adhesive layer may be partially provided on one side or both sides of the heat conductive sheet, or may be provided on the entire surface.
  • the heat conductive material such as the heat conductive sheet may be in a semi-cured state (semi-cured film), and the heat conductive sheet in the heat conductive multilayer sheet may be in a semi-cured state. ..
  • the adhesive layer in the heat conductive multilayer sheet may be in a cured state, a semi-cured state, or an uncured state.
  • the present invention also relates to compounds.
  • the compound of the present invention is a compound suitable for producing the composition of the present invention.
  • One form of the compound of the present invention is the compound represented by the above-mentioned general formula (Z), and the content thereof is as described above.
  • another form of the compound of the present invention is a compound represented by the above-mentioned general formula (Z1), and the content thereof is as described above.
  • another form of the compound of the present invention is a compound represented by the above-mentioned general formula (Z2), and the content thereof is as described above.
  • ⁇ Phenol compound> The phenolic compounds used in Examples and Comparative Examples are shown below.
  • the compounds A-1 to A-9 are specific phenol compounds.
  • X-1 to X-4 are phenol compounds other than the specific phenol compound.
  • X-4 Catechol resorcinol novolak resin synthesized according to the method described in paragraphs [0215] to [0219] of International Publication No. 2017/14513.
  • A-2 which is a phenol compound, was synthesized according to the following scheme.
  • 5-Amino-o-cresol (117 g, 0.95 mol) was added little by little to the place where the mixed solution of cyanuric chloride (87.6 g, 0.475 mol) and 2-butanone (620 ml) was ice-cooled. Then, an aqueous solution prepared by dissolving sodium acetate trihydrate (135.8 g, 0.998 mol) in water (193 ml) was added to the above mixed solution. The mixed solution is stirred at 45 ° C. for 2 hours, cooled to room temperature, and an aqueous solution prepared by dissolving sodium carbonate (80.6 g, 0.76 mol) in water (700 ml) is added dropwise to the mixed solution and stirred for 30 minutes. bottom.
  • the obtained organic phase was distilled off with an evaporator and dissolved in 2-propanol (195 ml).
  • the obtained solution was added dropwise to water (2.25 L), stirred for 2 hours, and then the precipitated crystals were collected by filtration and dried to obtain A-4.
  • A-5 which is a phenol compound, was synthesized by the same method as the method for synthesizing A-4, except that m-tridine used in the above-mentioned method for synthesizing A-4 was changed to m-phenylenediamine.
  • 5-Amino-o-cresol (20.7 g, 0.168 mol) was added little by little to an ice-cooled mixture of cyanuric chloride (15.5 g, 0.083 mol) and 2-butanone (75 ml). bottom. Then, an aqueous solution prepared by dissolving sodium acetate trihydrate (22.8 g, 0.168 mol) in water (32 ml) was added to the above mixed solution. After stirring the above mixed solution at 40 ° C. for 2 hours, m-aminophenol (10.1 g, 0.092 mol) was added, and the mixture was stirred at 80 ° C. for 2 hours.
  • the mixed solution was cooled to room temperature, and an aqueous solution prepared by dissolving sodium carbonate (21.3 g, 0.20 mol) in water (134 ml) was added dropwise to the mixed solution and stirred for 30 minutes. After allowing the above mixed solution to stand still to remove the aqueous phase, the organic phase was filtered through cerite, and 34 ml of ethanol was added. Water (435 ml) was added dropwise to the obtained organic phase while stirring, and the mixture was stirred for 2 hours, and then the precipitated crystals were collected by filtration and dried to obtain A-8.
  • the phenol compound A- 9 was synthesized.
  • Epoxy compound> The epoxy compounds used in Examples and Comparative Examples are shown below.
  • B-8, B-9, and B-11 are all compounds having a number average molecular weight of 300 or more.
  • B-5, B-6, and B-7 are epoxy compounds exhibiting liquid crystallinity.
  • ⁇ Inorganic matter> The inorganic substances used in Examples and Comparative Examples are shown below.
  • C-1 Tris-orthotrilphosphine-C-2: Triphenylphosphine-C-3: 2PHZ-PW (2-phenyl-4,5-dihydroxymethylimidazole)
  • C-4 TPP-MK (Tetraphenylphosphonium Tetra-p-Trillbolate)
  • C-5 TBP-LA (Tetra-n-Butylphosphonium Laurate)
  • C-6 Bis (tetra-n-butylphosphonium) pyromeritate
  • KBM-573 N-phenyl-3-aminopropyltrimethoxysilane, manufactured by Shinetsu Silicone Co., Ltd. was used as a surface modifier.
  • a mixture was prepared by blending the epoxy compound and the phenol compound of the combination shown in Table 1 below in an equivalent amount (the amount in which the number of epoxy groups of the epoxy compound and the number of hydroxyl groups of the phenol compound are equal). After mixing the above mixture, solvent, surface modifier to be used if desired, and curing accelerator in this order, an inorganic substance was added. The obtained mixture was treated with a rotation / revolution mixer (Awatori Rentaro ARE-310, manufactured by THINKY) for 5 minutes to obtain a composition (curable composition) of each Example or Comparative Example.
  • the amount of the solvent added was set so that the solid content concentration of the composition was 50 to 80% by mass.
  • the solid content concentration of the composition was adjusted for each composition within the above range so that the viscosities of the compositions were about the same.
  • the total content of the epoxy compound and the phenol compound (content of the above mixture) in the composition is the amount shown in the "total amount (mass%)" column in Table 1 with respect to the total solid content of the composition. I tried to become.
  • the amounts of the curing accelerator, the surface modifier, the inorganic nitride, and the inorganic oxide in the composition are the amounts shown as "(mass%)" in Table 1 with respect to the total solid content of the composition, respectively. I did it.
  • ⁇ Making a heat conductive sheet> The obtained semi-cured sheet was covered with a release-treated PET film and heat-pressed under air (hot plate temperature 180 ° C., pressure 20 MPa for 5 minutes). Then, it was heat-treated at 180 ° C. for 90 minutes under normal pressure to obtain a resin sheet. The PET films on both sides of the resin sheet were peeled off to obtain a heat conductive sheet (heat conductive material) having an average thickness of 120 ⁇ m.
  • the thermal conductivity of the obtained heat conductive sheet was measured by the following method. (1) Using “LFA467” manufactured by NETZSCH, the thermal diffusivity in the thickness direction of the heat conductive sheet was measured by a laser flash method. (2) The specific gravity of the heat conductive sheet was measured by the Archimedes method (using the “solid specific gravity measurement kit") using the balance "XS204" manufactured by METTLER TOLEDO. (3) Using “DSC320 / 6200” manufactured by Seiko Instruments Inc., the specific heat of the heat conductive sheet at 25 ° C. was determined under the heating condition of 10 ° C./min. (4) The obtained thermal diffusivity was multiplied by the specific gravity and the specific heat to calculate the thermal conductivity of the heat conductive sheet.
  • the measured thermal conductivity was classified according to the following criteria, and the thermal conductivity was evaluated.
  • a semi-cured sheet was prepared in the same manner as shown in the above evaluation of thermal conductivity. Using "DSC320 / 6200" manufactured by Seiko Instruments Inc., the reaction behavior was measured under the temperature rise condition of 10 ° C./min of the obtained semi-cured sheet, and the exothermic peak was measured by the method described in the specification. The temperature was measured. The measured exothermic peak temperature was classified according to the following criteria and evaluated. In each composition, the exothermic peak temperature was 220 ° C. or lower. A: 150 ° C or higher B: 140 ° C or higher and lower than 150 ° C C: 130 ° C or higher and lower than 140 ° C D: less than 130 ° C
  • the breakdown voltage (withstand voltage) of the heat conductive sheet produced in the same manner as shown in the above evaluation of thermal conductivity at 23 ° C. and 65% relative humidity was measured by a withstand voltage tester (Kikusui Denshi Kogyo Co., Ltd.). ) was used for measurement.
  • the measured dielectric breakdown voltage (withstand voltage) was converted into the dielectric breakdown voltage (withstand voltage) when the thickness of the heat conductive sheet was 200 ⁇ m.
  • the converted breakdown voltage (withstand voltage) was classified according to the following criteria and evaluated. A: 10 kV or more B: 8 kV or more and less than 10 kV C: less than 8 kV
  • a semi-cured sheet (semi-cured sheet with PET film) was produced in the same manner as shown in the above evaluation of thermal conductivity.
  • the polyester film is peeled off from the semi-cured sheet with PET film, and the obtained semi-cured sheet is cut into strips of 20 mm ⁇ 60 mm, and the electrolytic copper foil (20 mm ⁇ 100 mm, thickness: 35 ⁇ m) and the aluminum plate (30 mm) which are the adherends are cut out. It was sandwiched between ⁇ 60 mm, thickness: 1 mm).
  • the obtained laminate was heat-pressed under air (hot plate temperature 180 ° C., pressure 20 MPa for 5 minutes, then hot plate temperature 180 ° C., normal pressure for 90 minutes) to obtain a heat conductive sheet.
  • An aluminum base substrate with a copper foil integrated with the adherend was obtained.
  • the copper foil peel strength of the obtained sample was measured by using a digital force gauge (ZTS-200N, manufactured by Imada Co., Ltd.) and a 90-degree peeling test jig (P90-200N-BB, manufactured by Imada Co., Ltd.) to JIS C 6481. It was measured according to the method for measuring the peeling strength in the normal state described in 1.
  • the peeling of the copper foil in the peel strength test was performed at an angle of 90 ° with respect to the aluminum base substrate with the copper foil at a peeling rate of 50 mm / min.
  • peel strength peel strength
  • a semi-cured sheet was prepared in the same manner as shown in the above evaluation of thermal conductivity, and then allowed to stand at room temperature (25 ° C.) for 1 day (24 hours).
  • the semi-cured sheet after standing was cut into strips of 5 cm ⁇ 10 cm to prepare a sample for a bending test.
  • the obtained sample was subjected to a bending test using a cylindrical mandrel testing machine (manufactured by Cortec Co., Ltd.) according to the method described in JIS K 5600-5-1.
  • the diameter of the mandrel at the time of fracture was classified according to the following criteria, and the handleability (preservability over time) was evaluated.
  • Example 77 contains the epoxy compound B-3 / B-9 in a 50/50 (mass ratio).
  • the obtained heat conductive material when the phenol compound having my of 1 in the general formula (Y) is used as the phenol compound satisfying the requirement 1, or when the phenol compound satisfying the requirement 2 is used, the obtained heat conductive material It was confirmed that the thermal conductivity and / or peel strength was better (see comparison of the results of the examples using B-2 as the epoxy compound, etc.).
  • the thermal conductivity of the heat conductive material is more excellent (comparing the examples using A-3 as the phenol compound, the epoxy compound having an aromatic ring group is used. When used, thermal conductivity is rated A).

Abstract

The present invention provides a curable composition capable of giving thermally conductive materials having excellent thermal conductivity. Also provided are a thermally conductive material, a thermally conductive sheet, a device with a thermally conductive layer, and a compound, which each relate to the curable composition. This curable composition comprises a phenol compound, an epoxy compound, a curing accelerator, and an inorganic substance, wherein the phenol compound is a specific phenol compound satisfying requirement 1 and/or requirement 2 and the content of the inorganic substance exceeds 10 mass% based on all the solid components. Requirement 1: To be a compound represented by general formula (Y). Requirement 2: To be a phenol compound having a triazine skeleton and having an aromatic ring group that includes a phenolic hydroxyl group and a substituent arranged in an ortho position to the phenolic hydroxyl group.

Description

硬化性組成物、熱伝導材料、熱伝導シート、熱伝導層付きデバイス、化合物Curable compositions, heat conductive materials, heat conductive sheets, devices with heat conductive layers, compounds
 本発明は、硬化性組成物、熱伝導材料、熱伝導シート、熱伝導層付きデバイス、及び、化合物に関する。 The present invention relates to a curable composition, a heat conductive material, a heat conductive sheet, a device with a heat conductive layer, and a compound.
 パーソナルコンピュータ、一般家電、及び自動車等の様々な電気機器に用いられているパワー半導体デバイスは、近年、小型化が急速に進んでいる。小型化に伴い高密度化されたパワー半導体デバイスから発生する熱の制御が困難になっている。
 このような問題に対応するため、パワー半導体デバイスからの放熱を促進する熱伝導材料が用いられている。
 例えば、特許文献1には、Bステージ状態でのハンドリング性及び硬化物の熱伝導性に優れるエポキシ樹脂組成物として、所定のエポキシ樹脂と硬化剤とフィラーとを所定の条件で含有するエポキシ樹脂組成物が公開されている。
In recent years, power semiconductor devices used in various electric devices such as personal computers, general household appliances, and automobiles have been rapidly miniaturized. With the miniaturization, it is difficult to control the heat generated from the power semiconductor device whose density has been increased.
In order to deal with such a problem, a heat conductive material that promotes heat dissipation from a power semiconductor device is used.
For example, Patent Document 1 describes an epoxy resin composition containing a predetermined epoxy resin, a curing agent, and a filler under predetermined conditions as an epoxy resin composition having excellent handleability in a B stage state and thermal conductivity of a cured product. Things are open to the public.
国際公開第2017/145413号International Publication No. 2017/145413
 本発明者らは、特許文献1に記載されたエポキシ樹脂組成物について検討したところ、得られる硬化物の熱伝導性について改善の余地があることを知見した。 The present inventors examined the epoxy resin composition described in Patent Document 1, and found that there is room for improvement in the thermal conductivity of the obtained cured product.
 そこで、本発明は、熱伝導性に優れた熱伝導材料を与え得る硬化性組成物を提供することを課題とする。
 また、本発明は、上記硬化性組成物に関する熱伝導材料、熱伝導シート、熱伝導層付きデバイス、及び、化合物を提供することをも課題とする。
Therefore, it is an object of the present invention to provide a curable composition capable of providing a heat conductive material having excellent heat conductivity.
Another object of the present invention is to provide a heat conductive material, a heat conductive sheet, a device with a heat conductive layer, and a compound for the curable composition.
 本発明者らは、上記課題を解決すべく鋭意検討した結果、以下の構成により上記課題が解決できることを見出した。 As a result of diligent studies to solve the above problems, the present inventors have found that the above problems can be solved by the following configuration.
 〔1〕
 フェノール化合物、エポキシ化合物、硬化促進剤、及び、無機物を含む、硬化性組成物であって、
 上記フェノール化合物が、要件1及び要件2の少なくとも一方を満たし、
 上記無機物の含有量が、全固形分に対して、10質量%超である、硬化性組成物。
 要件1:一般式(Y)で表される化合物である。
 要件2:トリアジン骨格を有し、かつ、フェノール性水酸基とフェノール性水酸基のオルト位に配置された置換基とを有する芳香環基を有するフェノール化合物である。
Figure JPOXMLDOC01-appb-C000008

 一般式(Y)中、myは0以上の整数を表す。
 RY1及びRY2は、それぞれ独立に、フェノール性水酸基とフェノール性水酸基のオルト位に配置された炭素数1~6の置換基とを有する芳香環基を表す。
 LY1及びLY2は、それぞれ独立に、-C(RY5)(RY6)-、又は、-CO-を表す。
 RY3~RY6は、それぞれ独立に、水素原子又は置換基を表す。
 〔2〕
 上記硬化性組成物を用いて形成される半硬化シートを示差走査熱量計で測定した場合に、発熱ピークが検出される温度が、140℃以上となる、〔1〕に記載の硬化性組成物。
 〔3〕
 上記エポキシ化合物の分子量が、300以上である、〔1〕又は〔2〕に記載の硬化性組成物。
 〔4〕
 上記無機物が、平均粒径が20μm以上である凝集状窒化ホウ素を含む、〔1〕~〔3〕のいずれかに記載の硬化性組成物。
 〔5〕
 上記フェノール化合物が、一般式(Z)で表される化合物を含む、〔1〕~〔4〕のいずれかに記載の硬化性組成物。
Figure JPOXMLDOC01-appb-C000009

 一般式(Z)中、rは0以上の整数を表す。
 k、l、m、及び、nは、それぞれ独立に、0以上の整数を表す。
 ただし、k、l、r×m、及び、nの合計は2以上である。
 Lは、2価の有機基を表す。
 E~Eは、それぞれ独立に、単結合、-NH-、又は、-NR-を表す。Rは、置換基を表す。
 Bは、単結合又はk+1価の有機基を表す。
 Bは、単結合又はl+1価の有機基を表す。
 Bは、単結合又はm+1価の有機基を表す。
 Bは、単結合又はn+1価の有機基を表す。
 X~X4は、それぞれ独立に、フェノール性水酸基を有する芳香環基を表す。
 ただし、k個存在するX、l個存在するX、r×m個存在するX、及び、n個存在するXのうちの少なくとも1個は、フェノール性水酸基とフェノール性水酸基のオルト位に配置された置換基とを有する芳香環基を表す。
 〔6〕
 上記フェノール化合物が、一般式(Z1)で表される化合物を含む、〔1〕~〔5〕のいずれかに記載の硬化性組成物。
Figure JPOXMLDOC01-appb-C000010

 一般式(Z1)中、rは0以上の整数を表す。
 Lは、2価の有機基を表す。
 Rは、水素原子又は置換基を表す。
 ただし、一般式(Z1)中に(3+r)個存在するRの少なくとも1個は置換基を表す。
また、一般式(Z1)中に(3+r)個存在するRの少なくとも1個は水素原子を表す。
 〔7〕
 上記フェノール化合物が、一般式(Z2)で表される化合物を含む、〔1〕~〔6〕のいずれかに記載の硬化性組成物。
Figure JPOXMLDOC01-appb-C000011

 一般式(Z2)中、Rは、水素原子又は置換基を表す。
 ただし、2個存在するRの少なくとも一方は置換基を表す。
 〔8〕
 上記硬化促進剤が、リン原子を含む化合物を含む、〔1〕~〔7〕のいずれかに記載の硬化性組成物。
 〔9〕
 上記硬化促進剤が、ホスホニウム塩を含む、〔1〕~〔8〕のいずれかに記載の硬化性組成物。
 〔10〕
 〔1〕~〔9〕のいずれかに記載の硬化性組成物を硬化して得られる、熱伝導材料。
 〔11〕
 〔10〕に記載の熱伝導材料からなる、熱伝導シート。
 〔12〕
 デバイスと、上記デバイス上に配置された〔11〕に記載の熱伝導シートを含む熱伝導層とを有する、熱伝導層付きデバイス。
 〔13〕
 一般式(Z)で表される、化合物。
Figure JPOXMLDOC01-appb-C000012

 一般式(Z)中、rは0以上の整数を表す。
 k、l、m、及び、nは、それぞれ独立に、0以上の整数を表す。
 ただし、k、l、r×m、及び、nの合計は2以上である。
 Lは、2価の有機基を表す。
 E~Eは、それぞれ独立に、単結合、-NH-、又は、-NR-を表す。Rは、置換基を表す。
 Bは、単結合又はk+1価の有機基を表す。
 Bは、単結合又はl+1価の有機基を表す。
 Bは、単結合又はm+1価の有機基を表す。
 Bは、単結合又はn+1価の有機基を表す。
 X~X4は、それぞれ独立に、フェノール性水酸基を有する芳香環基を表す。
 ただし、k個存在するX、l個存在するX、r×m個存在するX、及び、n個存在するXのうちの少なくとも1個は、フェノール性水酸基とフェノール性水酸基のオルト位に配置された置換基とを有する芳香環基を表す。
 〔14〕
 一般式(Z1)で表される、〔13〕に記載の化合物。
Figure JPOXMLDOC01-appb-C000013

 一般式(Z1)中、rは0以上の整数を表す。
 Lは、2価の有機基を表す。
 Rは、水素原子又は置換基を表す。
 ただし、一般式(Z1)中に(3+r)個存在するRの少なくとも1個は置換基を表す。
また、一般式(Z1)中に(3+r)個存在するRの少なくとも1個は水素原子を表す。
 〔15〕
 一般式(Z2)で表される、〔13〕又は〔14〕に記載の化合物。
Figure JPOXMLDOC01-appb-C000014

 一般式(Z2)中、Rは、水素原子又は置換基を表す。
 ただし、一般式(Z2)中に2個存在するRの少なくとも一方は置換基を表す。
[1]
A curable composition comprising a phenol compound, an epoxy compound, a curing accelerator, and an inorganic substance.
The phenolic compound satisfies at least one of Requirement 1 and Requirement 2.
A curable composition in which the content of the inorganic substance is more than 10% by mass with respect to the total solid content.
Requirement 1: A compound represented by the general formula (Y).
Requirement 2: A phenol compound having a triazine skeleton and having an aromatic ring group having a phenolic hydroxyl group and a substituent arranged at the ortho position of the phenolic hydroxyl group.
Figure JPOXMLDOC01-appb-C000008

In the general formula (Y), my represents an integer of 0 or more.
RY1 and RY2 each independently represent an aromatic ring group having a phenolic hydroxyl group and a substituent having 1 to 6 carbon atoms arranged at the ortho position of the phenolic hydroxyl group.
LY1 and LY2 independently represent -C ( RY5 ) ( RY6)-or- CO-, respectively.
RY3 to RY6 independently represent a hydrogen atom or a substituent.
[2]
The curable composition according to [1], wherein the temperature at which the exothermic peak is detected is 140 ° C. or higher when the semi-curable sheet formed by using the curable composition is measured by a differential scanning calorimeter. ..
[3]
The curable composition according to [1] or [2], wherein the epoxy compound has a molecular weight of 300 or more.
[4]
The curable composition according to any one of [1] to [3], wherein the inorganic substance contains aggregated boron nitride having an average particle size of 20 μm or more.
[5]
The curable composition according to any one of [1] to [4], wherein the phenol compound contains a compound represented by the general formula (Z).
Figure JPOXMLDOC01-appb-C000009

In the general formula (Z), r represents an integer of 0 or more.
k, l, m, and n each independently represent an integer of 0 or more.
However, the total of k, l, r × m, and n is 2 or more.
L represents a divalent organic group.
E 1 to E 6 independently represent a single bond, -NH-, or -NR-. R represents a substituent.
B 1 represents a single bond or a k + 1 valent organic group.
B 2 represents a single bond or an l + 1 valent organic group.
B 3 represents a single bond or m + 1 valent organic group.
B 4 represents a single bond or n + 1 valent organic group.
X 1 to X 4 each independently represent an aromatic ring group having a phenolic hydroxyl group.
However, at least one of k X 1 , l X 2 , r × m X 3 , and n X 4 is an ortho of a phenolic hydroxyl group and a phenolic hydroxyl group. Represents an aromatic ring group having a substituent arranged at the position.
[6]
The curable composition according to any one of [1] to [5], wherein the phenol compound contains a compound represented by the general formula (Z1).
Figure JPOXMLDOC01-appb-C000010

In the general formula (Z1), r represents an integer of 0 or more.
L represents a divalent organic group.
R Z represents a hydrogen atom or a substituent.
Provided that at least one of R Z which in the general formula (Z1) (3 + r) pieces there is a substituent.
Further, at least one of R Z which in the general formula (Z1) (3 + r) pieces there is a hydrogen atom.
[7]
The curable composition according to any one of [1] to [6], wherein the phenol compound contains a compound represented by the general formula (Z2).
Figure JPOXMLDOC01-appb-C000011

In the general formula (Z2), R Z represents a hydrogen atom or a substituent.
However, at least one of the two existing R Zs represents a substituent.
[8]
The curable composition according to any one of [1] to [7], wherein the curing accelerator contains a compound containing a phosphorus atom.
[9]
The curable composition according to any one of [1] to [8], wherein the curing accelerator contains a phosphonium salt.
[10]
A heat conductive material obtained by curing the curable composition according to any one of [1] to [9].
[11]
A heat conductive sheet made of the heat conductive material according to [10].
[12]
A device with a heat conductive layer having a device and a heat conductive layer including the heat conductive sheet according to [11] arranged on the device.
[13]
A compound represented by the general formula (Z).
Figure JPOXMLDOC01-appb-C000012

In the general formula (Z), r represents an integer of 0 or more.
k, l, m, and n each independently represent an integer of 0 or more.
However, the total of k, l, r × m, and n is 2 or more.
L represents a divalent organic group.
E 1 to E 6 independently represent a single bond, -NH-, or -NR-. R represents a substituent.
B 1 represents a single bond or a k + 1 valent organic group.
B 2 represents a single bond or an l + 1 valent organic group.
B 3 represents a single bond or m + 1 valent organic group.
B 4 represents a single bond or n + 1 valent organic group.
X 1 to X 4 each independently represent an aromatic ring group having a phenolic hydroxyl group.
However, at least one of k X 1 , l X 2 , r × m X 3 , and n X 4 is an ortho of a phenolic hydroxyl group and a phenolic hydroxyl group. Represents an aromatic ring group having a substituent arranged at the position.
[14]
The compound according to [13], which is represented by the general formula (Z1).
Figure JPOXMLDOC01-appb-C000013

In the general formula (Z1), r represents an integer of 0 or more.
L represents a divalent organic group.
R Z represents a hydrogen atom or a substituent.
Provided that at least one of R Z which in the general formula (Z1) (3 + r) pieces there is a substituent.
Further, at least one of R Z which in the general formula (Z1) (3 + r) pieces there is a hydrogen atom.
[15]
The compound according to [13] or [14], which is represented by the general formula (Z2).
Figure JPOXMLDOC01-appb-C000014

In the general formula (Z2), R Z represents a hydrogen atom or a substituent.
Provided that at least one of the two existing R Z in the general formula (Z2) represents a substituent.
 本発明によれば、熱伝導性に優れた熱伝導材料を与え得る硬化性組成物を提供できる。
 また、本発明によれば、上記硬化性組成物に関する熱伝導材料、熱伝導シート、熱伝導層付きデバイス、及び、化合物を提供できる。
According to the present invention, it is possible to provide a curable composition capable of providing a heat conductive material having excellent heat conductivity.
Further, according to the present invention, it is possible to provide a heat conductive material, a heat conductive sheet, a device with a heat conductive layer, and a compound related to the curable composition.
 以下、本発明の硬化性組成物、熱伝導材料、熱伝導シート、熱伝導層付きデバイス、及び、化合物について詳細に説明する。
 以下に記載する構成要件の説明は、本発明の代表的な実施態様に基づいてなされる場合があるが、本発明はそのような実施態様に制限されない。
 なお、本明細書において、「~」を用いて表される数値範囲は、「~」の前後に記載される数値を下限値及び上限値として含む範囲を意味する。
Hereinafter, the curable composition, the heat conductive material, the heat conductive sheet, the device with the heat conductive layer, and the compound of the present invention will be described in detail.
The description of the constituent elements described below may be based on the representative embodiments of the present invention, but the present invention is not limited to such embodiments.
In the present specification, the numerical range represented by using "-" means a range including the numerical values before and after "-" as the lower limit value and the upper limit value.
 また、本明細書において、「(メタ)アクリロイル基」との記載は、「アクリロイル基及びメタクリロイル基のいずれか一方又は双方」の意味を表す。また、「(メタ)アクリルアミド基」との記載は、「アクリルアミド基及びメタクリルアミド基のいずれか一方又は双方」の意味を表す。 Further, in the present specification, the description of "(meth) acryloyl group" means "either one or both of an acryloyl group and a methacryloyl group". Further, the description of "(meth) acrylamide group" means "either one or both of an acrylamide group and a methacrylamide group".
 本明細書において、酸無水物基は、1価の基であってもよく、2価の基であってもよい。なお、酸無水物基が1価の基を表す場合、無水マレイン酸、無水フタル酸、無水ピロメリット酸、及び、無水トリメリット酸等の酸無水物から任意の水素原子を除いて得られる置換基が挙げられる。また、酸無水物基が2価の基を表す場合、*-CO-O-CO-*で表される基を意図する(*は結合位置を表す)。 In the present specification, the acid anhydride group may be a monovalent group or a divalent group. When the acid anhydride group represents a monovalent group, a substitution obtained by removing an arbitrary hydrogen atom from an acid anhydride such as maleic anhydride, phthalic anhydride, pyromellitic anhydride, and trimellitic anhydride. The group is mentioned. When the acid anhydride group represents a divalent group, the group represented by * -CO-O-CO- * is intended (* represents a bond position).
 なお、本明細書において、置換又は無置換を明記していない置換基等については、可能な場合、目的とする効果を損なわない範囲で、その基に更に置換基(例えば、後述する置換基群Y)を有していてもよい。例えば、「アルキル基」という表記は、目的とする効果を損なわない範囲で、置換又は無置換のアルキル基(置換基を有してもよいアルキル基)を意味する。
 また、本明細書において、「置換基を有していてもよい」という場合の置換基の種類、置換基の位置、及び置換基の数は特に制限されない。置換基の数としては、例えば、1個、又は、2個以上が挙げられる。置換基としては、例えば、水素原子を除く1価の非金属原子団が挙げられ、以下の置換基群Yから選択される基が好ましい。
 本明細書において、ハロゲン原子としては、例えば、塩素原子、フッ素原子、臭素原子、及び、ヨウ素原子が挙げられる。
In the present specification, for substituents and the like that do not specify substitution or non-substitution, if possible, further substituents (for example, a group of substituents described later) are added to the groups as long as the desired effect is not impaired. Y) may be possessed. For example, the notation "alkyl group" means a substituted or unsubstituted alkyl group (an alkyl group which may have a substituent) as long as the desired effect is not impaired.
Further, in the present specification, the type of the substituent, the position of the substituent, and the number of the substituents in the case of "may have a substituent" are not particularly limited. Examples of the number of substituents include one or two or more. Examples of the substituent include a monovalent non-metal atomic group excluding a hydrogen atom, and a group selected from the following substituent group Y is preferable.
In the present specification, examples of the halogen atom include a chlorine atom, a fluorine atom, a bromine atom, and an iodine atom.
 置換基群Y:
 ハロゲン原子(-F、-Br、-Cl、-I等)、水酸基、アミノ基、カルボン酸基及びその共役塩基基、無水カルボン酸基、シアネートエステル基、不飽和重合性基、エポキシ基、オキセタニル基、アジリジニル基、チオール基、イソシアネート基、チオイソシアネート基、アルデヒド基、アルコキシ基、アリーロキシ基、アルキルチオ基、アリールチオ基、アルキルジチオ基、アリールジチオ基、N-アルキルアミノ基、N,N-ジアルキルアミノ基、N-アリールアミノ基、N,N-ジアリールアミノ基、N-アルキル-N-アリールアミノ基、アシルオキシ基、カルバモイルオキシ基、N-アルキルカルバモイルオキシ基、N-アリールカルバモイルオキシ基、N,N-ジアルキルカルバモイルオキシ基、N,N-ジアリールカルバモイルオキシ基、N-アルキル-N-アリールカルバモイルオキシ基、アルキルスルホキシ基、アリールスルホキシ基、アシルチオ基、アシルアミノ基、N-アルキルアシルアミノ基、N-アリールアシルアミノ基、ウレイド基、N’-アルキルウレイド基、N’,N’-ジアルキルウレイド基、N’-アリールウレイド基、N’,N’-ジアリールウレイド基、N’-アルキル-N’-アリールウレイド基、N-アルキルウレイド基、N-アリールウレイド基、N’-アルキル-N-アルキルウレイド基、N’-アルキル-N-アリールウレイド基、N’,N’-ジアルキル-N-アルキルウレイド基、N’,N’-ジアルキル-N-アリールウレイド基、N’-アリール-N-アルキルウレイド基、N’-アリール-N-アリールウレイド基、N’,N’-ジアリール-N-アルキルウレイド基、N’,N’-ジアリール-N-アリールウレイド基、N’-アルキル-N’-アリール-N-アルキルウレイド基、N’-アルキル-N’-アリール-N-アリールウレイド基、アルコキシカルボニルアミノ基、アリーロキシカルボニルアミノ基、N-アルキル-N-アルコキシカルボニルアミノ基、N-アルキル-N-アリーロキシカルボニルアミノ基、N-アリール-N-アルコキシカルボニルアミノ基、N-アリール-N-アリーロキシカルボニルアミノ基、ホルミル基、アシル基、アルコキシカルボニル基、アリーロキシカルボニル基、カルバモイル基、N-アルキルカルバモイル基、N,N-ジアルキルカルバモイル基、N-アリールカルバモイル基、N,N-ジアリールカルバモイル基、N-アルキル-N-アリールカルバモイル基、アルキルスルフィニル基、アリールスルフィニル基、アルキルスルホニル基、アリールスルホニル基、スルホ基(-SOH)及びその共役塩基基、アルコキシスルホニル基、アリーロキシスルホニル基、スルフィナモイル基、N-アルキルスルフィナモイル基、N,N-ジアルキルスルフィナモイル基、N-アリールスルフィナモイル基、N,N-ジアリールスルフィナモイル基、N-アルキル-N-アリールスルフィナモイル基、スルファモイル基、N-アルキルスルファモイル基、N,N-ジアルキルスルファモイル基、N-アリールスルファモイル基、N,N-ジアリールスルファモイル基、N-アルキル-N-アリールスルファモイル基、N-アシルスルファモイル基及びその共役塩基基、N-アルキルスルホニルスルファモイル基(-SONHSO(alkyl))及びその共役塩基基、N-アリールスルホニルスルファモイル基(-SONHSO(aryl))及びその共役塩基基、N-アルキルスルホニルカルバモイル基(-CONHSO(alkyl))及びその共役塩基基、N-アリールスルホニルカルバモイル基(-CONHSO(aryl))及びその共役塩基基、アルコキシシリル基(-Si(Oalkyl))、アリーロキシシリル基(-Si(Oaryl))、ヒドロキシシリル基(-Si(OH))及びその共役塩基基、ホスホノ基(-PO)及びその共役塩基基、ジアルキルホスホノ基(-PO(alkyl))、ジアリールホスホノ基(-PO(aryl))、アルキルアリールホスホノ基(-PO(alkyl)(aryl))、モノアルキルホスホノ基(-POH(alkyl))及びその共役塩基基、モノアリールホスホノ基(-POH(aryl))及びその共役塩基基、ホスホノオキシ基(-OPO)及びその共役塩基基、ジアルキルホスホノオキシ基(-OPO(alkyl))、ジアリールホスホノオキシ基(-OPO(aryl))、アルキルアリールホスホノオキシ基(-OPO(alkyl)(aryl))、モノアルキルホスホノオキシ基(-OPOH(alkyl))及びその共役塩基基、モノアリールホスホノオキシ基(-OPOH(aryl))及びその共役塩基基、シアノ基、ニトロ基、アリール基、アルケニル基、アルキニル基、及びアルキル基。また、上述の各基は、可能な場合、更に置換基(例えば、上述の各基のうちの1以上の基)を有してもよい。例えば、置換基を有してもよいアリール基も、置換基群Yから選択可能な基として含まれる。
 置換基群Yから選択される基が炭素原子を有する場合、上記基が有する炭素数としては、例えば、1~20である。
 置換基群Yから選択される基が有する水素原子以外の原子の数としては、例えば、1~30である。
 また、これらの置換基は、可能であるならば置換基同士、又は置換している基と結合して環を形成してもよいし、していなくてもよい。例えば、アルキル基(又は、アルコキシ基のように、アルキル基を部分構造として含む基におけるアルキル基部分)は、環状のアルキル基(シクロアルキル基)でもよく、部分構造として1以上の環状構造を有するアルキル基でもよい。
Substituent group Y:
Halogen atoms (-F, -Br, -Cl, -I, etc.), hydroxyl groups, amino groups, carboxylic acid groups and their conjugate base groups, anhydrous carboxylic acid groups, cyanate ester groups, unsaturated polymerizable groups, epoxy groups, oxetanyl Group, aziridinyl group, thiol group, isocyanate group, thioisocyanate group, aldehyde group, alkoxy group, allyloxy group, alkylthio group, arylthio group, alkyldithio group, aryldithio group, N-alkylamino group, N, N-dialkylamino Group, N-arylamino group, N, N-diarylamino group, N-alkyl-N-arylamino group, acyloxy group, carbamoyloxy group, N-alkylcarbamoyloxy group, N-arylcarbamoyloxy group, N, N -Dialkylcarbamoyloxy group, N, N-diarylcarbamoyloxy group, N-alkyl-N-arylcarbamoyloxy group, alkylsulfoxy group, arylsulfoxi group, acylthio group, acylamino group, N-alkylacylamino group, N -Arylacylamino group, ureido group, N'-alkyl ureido group, N', N'-dialkyl ureido group, N'-aryl ureido group, N', N'-diaryl ureido group, N'-alkyl-N' -Allyl ureido group, N-alkyl ureido group, N-aryl ureido group, N'-alkyl-N-alkyl ureido group, N'-alkyl-N-aryl ureido group, N', N'-dialkyl-N-alkyl Ureid group, N', N'-dialkyl-N-aryl ureido group, N'-aryl-N-alkyl ureido group, N'-aryl-N-aryl ureido group, N', N'-diaryl-N-alkyl Ureid group, N', N'-diaryl-N-aryl ureido group, N'-alkyl-N'-aryl-N-alkyl ureido group, N'-alkyl-N'-aryl-N-aryl ureido group, alkoxy Carbonylamino group, allyloxycarbonylamino group, N-alkyl-N-alkoxycarbonylamino group, N-alkyl-N-allyloxycarbonylamino group, N-aryl-N-alkoxycarbonylamino group, N-aryl-N- Allyloxycarbonylamino group, formyl group, acyl group, alkoxycarbonyl group, allyloxycarbonyl group, carbamoyl group, N-alkylcarbamoyl group, N, N-dialkylcarbamoyl group, N-arylcarbamoyl group, N, N-diaryl Carbamoyl group, N- alkyl -N- arylcarbamoyl group, an alkylsulfinyl group, an arylsulfinyl group, an alkylsulfonyl group, an arylsulfonyl group, a sulfo group (-SO 3 H) and its conjugated base group, alkoxy sulfonyl group, aryloxy sulfonyl Group, sulfinamoyl group, N-alkylsulfinamoyl group, N, N-dialkylsulfinamoyl group, N-arylsulfinamoyl group, N, N-diarylsulfinamoyl group, N-alkyl-N-arylsulfina Moil group, sulfamoyl group, N-alkyl sulfamoyl group, N, N-dialkyl sulfamoyl group, N-aryl sulfamoyl group, N, N-diaryl sulfamoyl group, N-alkyl-N-arylsul Famoyl group, N-acylsulfamoyl group and its conjugated base group, N-alkylsulfonylsulfamoyl group (-SO 2 NHSO 2 (alkyl)) and its conjugated base group, N-arylsulfonylsulfamoyl group ( -SO 2 NHSO 2 (aryl)) and its conjugated bases, N-alkylsulfonylcarbamoyl groups (-CONHSO 2 (alkyl)) and its conjugated bases, N-arylsulfonylcarbamoyl groups (-CONHSO 2 (aryl)) and Its conjugated base group, alkoxysilyl group (-Si (Oalkyl) 3 ), aryloxysilyl group (-Si (Oaryl) 3 ), hydroxysilyl group (-Si (OH) 3 ) and its conjugated base group, phosphono group ( -PO 3 H 2 ) and its conjugate base group, dialkylphosphono group (-PO 3 (alkyl) 2 ), diarylphosphono group (-PO 3 (aryl) 2 ), alkylarylphosphono group (-PO 3 (-PO 3) Alkyl)), monoalkylphosphono groups (-PO 3 H (alkyl)) and their conjugated base groups, monoarylphosphono groups (-PO 3 H (aryl)) and their conjugated base groups, phosphonooxy groups ( -OPO 3 H 2 ) and its conjugate base group, dialkylphosphonooxy group (-OPO 3 (alkyl) 2 ), diarylphosphonooxy group (-OPO 3 (aryl) 2 ), alkylarylphosphonooxy group (- OPO 3 (alkyl) (aryl)), monoalkylphosphonooxy group (-OPO 3 H (alkyl)) and its conjugate base group, monoarylphospho Nookishi group (-OPO 3 H (aryl)) and its conjugated base group, a cyano group, a nitro group, an aryl group, an alkenyl group, an alkynyl group and an alkyl group. Further, each of the above-mentioned groups may further have a substituent (for example, one or more groups among the above-mentioned groups), if possible. For example, an aryl group which may have a substituent is also included as a group selectable from the substituent group Y.
When the group selected from the substituent group Y has a carbon atom, the number of carbon atoms of the group is, for example, 1 to 20.
The number of atoms other than the hydrogen atom of the group selected from the substituent group Y is, for example, 1 to 30.
Further, these substituents may or may not form a ring by bonding with each other or with a group to be substituted, if possible. For example, the alkyl group (or the alkyl group moiety in a group containing an alkyl group as a partial structure, such as an alkoxy group) may be a cyclic alkyl group (cycloalkyl group) and has one or more cyclic structures as a partial structure. It may be an alkyl group.
[組成物]
 本発明の硬化性組成物(以下、単に「組成物」ともいう)は、フェノール化合物、エポキシ化合物、硬化促進剤、及び、無機物を含む、硬化性組成物であって、
 上記フェノール化合物が、要件1及び要件2の少なくとも一方を満たし、
 上記無機物の含有量が、全固形分に対して、10質量%超である、硬化性組成物。
 要件1:後述する一般式(Y)で表される化合物である。
 要件2:トリアジン骨格を有し、かつ、フェノール性水酸基とフェノール性水酸基のオルト位に配置された炭素数1~6の置換基とを有する芳香環基を有するフェノール化合物である。
[Composition]
The curable composition of the present invention (hereinafter, also simply referred to as “composition”) is a curable composition containing a phenol compound, an epoxy compound, a curing accelerator, and an inorganic substance.
The phenolic compound satisfies at least one of Requirement 1 and Requirement 2.
A curable composition in which the content of the inorganic substance is more than 10% by mass with respect to the total solid content.
Requirement 1: A compound represented by the general formula (Y) described later.
Requirement 2: A phenol compound having a triazine skeleton and having an aromatic ring group having a phenolic hydroxyl group and a substituent having 1 to 6 carbon atoms arranged at the ortho position of the phenolic hydroxyl group.
 本発明の組成物が、上記のような構成で本発明の課題が解決されるメカニズムは必ずしも明らかではないが、本発明者らは以下のように推測している。
 本発明の組成物が含有するフェノール化合物(以下、「特定フェノール化合物」ともいう)は、フェノール性水酸基として、オルト位に置換基が存在するフェノール性水酸基を有し、かつ、所定の構造を有する。特定フェノール化合物がこのような特徴を有することにより、組成物から形成された硬化物は、剛直な構造を有することができ、硬化物中での熱の移動がより迅速になり、その結果、形成される熱伝導材料の熱伝導性が改善したと考えられている。
 また、本発明の組成物は、半硬化膜にした後の保存安定性も良好であり、作製した熱伝導材料の絶縁破壊電圧も高く良好であり、作製した熱伝導材料を介して接着された材料同士のピール強度も良好にできる。
 以下、上記熱伝導性、上記保存安定性、上記絶縁破壊電圧、及び/又は、上記ピール強度に優れることを、本発明の効果が優れるともいう。
The mechanism by which the composition of the present invention solves the problem of the present invention with the above-mentioned constitution is not always clear, but the present inventors speculate as follows.
The phenol compound contained in the composition of the present invention (hereinafter, also referred to as “specific phenol compound”) has a phenolic hydroxyl group having a substituent at the ortho position as a phenolic hydroxyl group, and has a predetermined structure. .. Due to these characteristics of the specific phenolic compound, the cured product formed from the composition can have a rigid structure, resulting in faster heat transfer in the cured product, resulting in formation. It is believed that the thermal conductivity of the heat-conducting material is improved.
In addition, the composition of the present invention has good storage stability after being formed into a semi-cured film, has a high dielectric breakdown voltage of the prepared heat conductive material, and is adhered via the prepared heat conductive material. The peel strength between the materials can also be improved.
Hereinafter, excellent in the above-mentioned thermal conductivity, the above-mentioned storage stability, the above-mentioned dielectric breakdown voltage, and / or the above-mentioned peel strength is also referred to as an excellent effect of the present invention.
 以下、組成物に含まれる成分について詳述する。 Hereinafter, the components contained in the composition will be described in detail.
〔フェノール化合物〕
 本発明の組成物はフェノール化合物を含む。
 上記フェノール化合物は、下記要件1及び要件2の少なくとも一方を満たす特定フェノール化合物である。
 特定フェノール化合物は、下記要件1のみを満たしてもよいし、下記要件2のみを満たしてもよいし、下記要件1と下記要件2との両方を満たしてもよい。
 要件1:一般式(Y)で表される化合物である。
 要件2:トリアジン骨格を有し、かつ、フェノール性水酸基とフェノール性水酸基のオルト位に配置された置換基とを有する芳香環基を有するフェノール化合物である。
[Phenol compound]
The composition of the present invention comprises a phenolic compound.
The phenol compound is a specific phenol compound that satisfies at least one of the following requirements 1 and 2.
The specific phenol compound may satisfy only the following requirement 1, only the following requirement 2, or both the following requirement 1 and the following requirement 2.
Requirement 1: A compound represented by the general formula (Y).
Requirement 2: A phenol compound having a triazine skeleton and having an aromatic ring group having a phenolic hydroxyl group and a substituent arranged at the ortho position of the phenolic hydroxyl group.
<要件1>
 要件1を満たす特定フェノール化合物は、一般式(Y)で表される化合物である。
<Requirement 1>
The specific phenol compound satisfying the requirement 1 is a compound represented by the general formula (Y).
Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-C000015
 上記一般式(Y)中、同一の符号で表される基が複数存在する場合、特段の断りがない限り、複数存在する同一の符号で表される基は、それぞれ同一でも異なっていてもよい。 When a plurality of groups represented by the same reference numeral exist in the above general formula (Y), the plurality of groups represented by the same reference numeral may be the same or different unless otherwise specified. ..
 一般式(Y)中、myは0以上の整数を表す。
 myは、0~10の整数が好ましく、0~1の整数がより好ましく、1が更に好ましい。
In the general formula (Y), my represents an integer of 0 or more.
My is preferably an integer of 0 to 10, more preferably an integer of 0 to 1, and even more preferably 1.
 一般式(Y)中、RY1及びRY2は、それぞれ独立に、フェノール性水酸基とフェノール性水酸基のオルト位に配置された炭素数1~6の置換基とを有する芳香環基を表す。
 つまり、RY1及びRY2で表される上記芳香環基は、オルト位に炭素数1~6の置換基が存在するフェノール性水酸基を有する。
 「オルト位に炭素数1~6の置換基が存在するフェノール性水酸基」とは、芳香環(好ましくは芳香族炭化水素環、より好ましくはベンゼン環)に直接結合する水酸基(フェノール性水酸基)であって、上記芳香環における上記水酸基と隣接する位置(オルト位)の一方又は両方に炭素数1~6の置換基が存在している水酸基のことをいう。
 上記芳香環基は、「オルト位に炭素数1~6の置換基が存在するフェノール性水酸基」を1個以上(例えば1~3個)有していればよく、「オルト位に炭素数1~6の置換基が存在するフェノール性水酸基」以外のフェノール性水酸基を有していても有していなくてもよい。
 上記芳香環基は、単環でも多環でもよく、環員原子としてヘテロ原子を有していてもよい。
 上記芳香環基の環員原子の数は5~15が好ましく、6~10がより好ましく、6が更に好ましい。
 フェノール性水酸基のオルト位に配置された炭素数1~6の置換基は、フェノール性水酸基のオルト位の少なくとも一方に存在していればよく、両方に存在していてもよい。
 炭素数1~6の置換基における炭素数は、1~6であり、1~4が好ましく、1がより好ましい。
 炭素数1~6の置換基は、炭素数1~6の炭化水素基であることが好ましく、炭素数1~6のアルキル基であることがより好ましい。
 上記アルキル基は、直鎖状でも分岐鎖状でもよい。上記アルキル基は無置換であることも好ましい。
In the general formula (Y), RY1 and RY2 each independently represent an aromatic ring group having a phenolic hydroxyl group and a substituent having 1 to 6 carbon atoms arranged at the ortho position of the phenolic hydroxyl group.
That is, the aromatic ring group represented by R Y1 and R Y2, having a phenolic hydroxyl group is present substituents having 1 to 6 carbon atoms in the ortho position.
The "phenolic hydroxyl group having a substituent having 1 to 6 carbon atoms at the ortho position" is a hydroxyl group (phenolic hydroxyl group) directly bonded to an aromatic ring (preferably an aromatic hydrocarbon ring, more preferably a benzene ring). It refers to a hydroxyl group in which a substituent having 1 to 6 carbon atoms is present in one or both of the positions (ortho positions) adjacent to the hydroxyl group in the aromatic ring.
The aromatic ring group may have one or more (for example, 1 to 3) "phenolic hydroxyl groups having a substituent having 1 to 6 carbon atoms at the ortho position" and "1 carbon number at the ortho position". It may or may not have a phenolic hydroxyl group other than the "phenolic hydroxyl group in which the substituents of to 6 are present".
The aromatic ring group may be monocyclic or polycyclic, and may have a heteroatom as a ring member atom.
The number of ring member atoms of the aromatic ring group is preferably 5 to 15, more preferably 6 to 10, and even more preferably 6.
The substituent having 1 to 6 carbon atoms arranged at the ortho position of the phenolic hydroxyl group may be present at at least one of the ortho positions of the phenolic hydroxyl group, and may be present at both of them.
The number of carbon atoms in the substituent having 1 to 6 carbon atoms is 1 to 6, preferably 1 to 4, and more preferably 1.
The substituent having 1 to 6 carbon atoms is preferably a hydrocarbon group having 1 to 6 carbon atoms, and more preferably an alkyl group having 1 to 6 carbon atoms.
The alkyl group may be linear or branched. It is also preferable that the alkyl group is unsubstituted.
 RY1及びRY2(つまり、フェノール性水酸基とフェノール性水酸基のオルト位に配置された炭素数1~6の置換基とを有する芳香環基)は、それぞれ独立に、一般式(P0)で表される基であることが好ましい。 RY1 and RY2 (that is, an aromatic ring group having a phenolic hydroxyl group and a substituent having 1 to 6 carbon atoms arranged at the ortho position of the phenolic hydroxyl group) are independently represented by the general formula (P0). It is preferable that it is a group to be used.
Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000016
 一般式(P0)中、RP1~RP5は、それぞれ独立に、水素原子又は置換基を表す。
 ただし、RP1~RP5のうちの1つは結合位置であり、かつ、RP1及びRP5の一方又は両方は上記炭素数1~6の置換基である。
In the general formula (P0), RP1 to RP5 each independently represent a hydrogen atom or a substituent.
However, one of R P1 ~ R P5 is a bond position and one or both of R P1 and R P5 is a substituent of the carbon atoms 1-6.
 RP1及びRP5において、一方が上記炭素数1~6の置換基であり、かつ、他の一方が上記炭素数1~6の置換基以外である場合、上記他の一方は水素原子であることも好ましい。
 RP2~RP4のうちのいずれかが、結合位置であることも好ましい。
 RP2~RP4のうち1個以上(例えば1~3個)が置換基である場合、上記置換基は上記炭素数1~6の置換基であることも好ましい。
In RP1 and RP5 , when one is a substituent having 1 to 6 carbon atoms and the other one is other than the substituent having 1 to 6 carbon atoms, the other one is a hydrogen atom. It is also preferable.
It is also preferable that any one of RP2 to RP4 is a bonding position.
When one or more (for example, 1 to 3) of RP2 to RP4 are substituents, it is also preferable that the substituent is a substituent having 1 to 6 carbon atoms.
 一般式(Y)中、RY3は、水素原子又は置換基を表す。
 RY3は、水素原子又は水酸基を表すことが好ましい。
 RY3が複数存在する場合、少なくとも1つのRY3が水酸基を表すのが好ましく、全てのRY3が水酸基を表すのがより好ましい。
In the general formula (Y), RY3 represents a hydrogen atom or a substituent.
RY3 preferably represents a hydrogen atom or a hydroxyl group.
When a plurality of RY3s are present, it is preferable that at least one RY3 represents a hydroxyl group, and it is more preferable that all RY3s represent a hydroxyl group.
 一般式(Y)、RY4は、水素原子又は置換基を表す。
 RY4は、水素原子、アルキル基、フェニル基、ハロゲン原子、カルボン酸基、ボロン酸基、アルデヒド基、アルコキシ基、又は、アルコキシカルボニル基が好ましい。
 上記アルキル基は、直鎖状でも分岐鎖状でもよい。上記アルキル基の炭素数は、1~10が好ましい。上記アルキル基は、置換基を有していても有していなくてもよい。
 上記アルコキシ基におけるアルキル基部分、及び、上記アルコキシカルボニル基におけるアルキル基部分は、上記アルキル基と同様である。
 上記フェニル基は、置換基を有していても有していなくてもよい。
 RY4は、RY4が結合するベンゼン環基が有し得る水酸基(RY3)に対して、パラ位に結合するのが好ましい。
The general formula (Y) and RY4 represent a hydrogen atom or a substituent.
The RY4 is preferably a hydrogen atom, an alkyl group, a phenyl group, a halogen atom, a carboxylic acid group, a boronic acid group, an aldehyde group, an alkoxy group, or an alkoxycarbonyl group.
The alkyl group may be linear or branched. The alkyl group preferably has 1 to 10 carbon atoms. The alkyl group may or may not have a substituent.
The alkyl group portion of the alkoxy group and the alkyl group portion of the alkoxycarbonyl group are the same as those of the alkyl group.
The phenyl group may or may not have a substituent.
R Y4, relative to the hydroxyl group (R Y3) of the benzene ring group R Y4 are attached may have, preferably attached at the para-position.
 一般式(Y)中、LY1及びLY2は、それぞれ独立に、-C(RY5)(RY6)-、又は、-CO-を表す。
 RY5及びRY6は、それぞれ独立に、水素原子又は置換基を表す。
 RY5及びRY6は、それぞれ独立に、水素原子、水酸基、フェニル基、ハロゲン原子、カルボン酸基、ボロン酸基、アルデヒド基、アルキル基、アルコキシ基、又は、アルコキシカルボニル基が好ましい。
 上記アルキル基は、直鎖状でも分岐鎖状でもよい。上記アルキル基の炭素数は、1~10が好ましい。上記アルキル基は、置換基を有していても有していなくてもよい。
 上記アルコキシ基におけるアルキル基部分、及び、上記アルコキシカルボニル基におけるアルキル基部分は、上記アルキル基と同様である。
 上記フェニル基は、置換基を有していても有していなくてもよく、例えば、置換基を有する場合は1~3つの水酸基を有してもよい。
 LY1及びLY2は、それぞれ独立に、-CH-、-CH(OH)-、又は、-CO-が好ましい。
In the general formula (Y), LY1 and LY2 independently represent -C ( RY5 ) ( RY6)-or- CO-, respectively.
RY5 and RY6 each independently represent a hydrogen atom or a substituent.
RY5 and RY6 are each independently preferably a hydrogen atom, a hydroxyl group, a phenyl group, a halogen atom, a carboxylic acid group, a boronic acid group, an aldehyde group, an alkyl group, an alkoxy group, or an alkoxycarbonyl group.
The alkyl group may be linear or branched. The alkyl group preferably has 1 to 10 carbon atoms. The alkyl group may or may not have a substituent.
The alkyl group portion of the alkoxy group and the alkyl group portion of the alkoxycarbonyl group are the same as those of the alkyl group.
The phenyl group may or may not have a substituent. For example, when it has a substituent, it may have 1 to 3 hydroxyl groups.
L Y1 and L Y2 are each independently, -CH 2 -, - CH ( OH) -, or, -CO- are preferable.
 要件1を満たす特定フェノール化合物は、「オルト位に炭素数1~6の置換基が存在するフェノール性水酸基」以外の水酸基を有していてもよい。ただし、要件1を満たす特定フェノール化合物が有する全水酸基のうち、「オルト位に炭素数1~6の置換基が存在するフェノール性水酸基」の割合〔(オルト位に炭素数1~6の置換基が存在するフェノール性水酸基の個数/特定フェノール化合物が有する全水酸基の個数)×100〕は、30~100%が好ましく、50~100%がより好ましく、65~100%が更に好ましい。 The specific phenol compound satisfying Requirement 1 may have a hydroxyl group other than "a phenolic hydroxyl group having a substituent having 1 to 6 carbon atoms at the ortho position". However, the ratio of "phenolic hydroxyl group having a substituent having 1 to 6 carbon atoms at the ortho position" among all the hydroxyl groups of the specific phenol compound satisfying Requirement 1 [(substituent having 1 to 6 carbon atoms at the ortho position). The number of phenolic hydroxyl groups in which is present / the number of total hydroxyl groups of the specific phenol compound) × 100] is preferably 30 to 100%, more preferably 50 to 100%, still more preferably 65 to 100%.
<要件2>
 要件2を満たす特定フェノール化合物は、トリアジン骨格を有し、かつ、フェノール性水酸基とフェノール性水酸基のオルト位に配置された置換基とを有する芳香環基を有するフェノール化合物である。
 要件2を満たす特定フェノール化合物が「トリアジン骨格を有する」とは、化合物中に1個以上(例えば1~5個)のトリアジン環基を有することを意味する。
<Requirement 2>
The specific phenol compound satisfying Requirement 2 is a phenol compound having a triazine skeleton and having an aromatic ring group having a phenolic hydroxyl group and a substituent arranged at the ortho position of the phenolic hydroxyl group.
By "having a triazine skeleton", a specific phenolic compound satisfying Requirement 2 means having one or more (for example, 1 to 5) triazine ring groups in the compound.
 要件2を満たす特定フェノール化合物は「フェノール性水酸基とフェノール性水酸基のオルト位に配置された置換基とを有する芳香環基」を有する。
 言い換えると、要件2を満たす特定フェノール化合物は、芳香環基を有し、上記芳香環基は、オルト位に置換基が存在するフェノール性水酸基を有する。
 「オルト位に置換基が存在するフェノール性水酸基」とは、芳香環(好ましくはベンゼン環)に直接結合する水酸基(フェノール性水酸基)であって、上記芳香環における上記水酸基と隣接する位置(オルト位)の一方又は両方に置換基(好ましくは有機基、より好ましくは炭素数1~6の置換基)が存在している水酸基のことをいう。
 上記芳香環基は、「オルト位に置換基が存在するフェノール性水酸基」を1個以上(例えば1~3個)有していればよく、「オルト位に置換基が存在するフェノール性水酸基」以外のフェノール性水酸基を有していても有していなくてもよい。
 上記芳香環基は、単環でも多環でもよく、環員原子としてヘテロ原子を有していてもよい。
 上記芳香環基の環員原子の数は5~15が好ましく、6~10がより好ましく、6が更に好ましい。
 フェノール性水酸基のオルト位に配置された置換基は、フェノール性水酸基のオルト位の少なくとも一方に存在していればよく、両方に存在していてもよい。
 フェノール性水酸基のオルト位に配置された置換基は有機基が好ましく、炭素数1~6の置換基がより好ましい。
 「炭素数1~6の置換基」については、要件1に関する説明中で述べた「炭素数1~6の置換基」と同様である。
 要件2を満たす特定フェノール化合物は、フェノール性水酸基とフェノール性水酸基のオルト位に配置された置換基とを有する芳香環基(好ましくは上述の一般式(P0)で表される基)を1個以上有することが好ましく、2個以上有することがより好ましく、2~12個有することが更に好ましく、4~8個有することが特に好ましい。
The specific phenol compound satisfying Requirement 2 has "an aromatic ring group having a phenolic hydroxyl group and a substituent arranged at the ortho position of the phenolic hydroxyl group".
In other words, the specific phenol compound satisfying Requirement 2 has an aromatic ring group, and the aromatic ring group has a phenolic hydroxyl group in which a substituent is present at the ortho position.
The "phenolic hydroxyl group having a substituent at the ortho position" is a hydroxyl group (phenolic hydroxyl group) directly bonded to an aromatic ring (preferably a benzene ring), and is a position (ortho) adjacent to the hydroxyl group in the aromatic ring. A hydroxyl group in which a substituent (preferably an organic group, more preferably a substituent having 1 to 6 carbon atoms) is present in one or both of the positions).
The aromatic ring group may have one or more (for example, 1 to 3) "phenolic hydroxyl groups having a substituent at the ortho position", and "a phenolic hydroxyl group having a substituent at the ortho position". It may or may not have a phenolic hydroxyl group other than.
The aromatic ring group may be monocyclic or polycyclic, and may have a heteroatom as a ring member atom.
The number of ring member atoms of the aromatic ring group is preferably 5 to 15, more preferably 6 to 10, and even more preferably 6.
The substituent arranged at the ortho position of the phenolic hydroxyl group may be present at at least one of the ortho positions of the phenolic hydroxyl group, and may be present at both of them.
The substituent arranged at the ortho position of the phenolic hydroxyl group is preferably an organic group, and more preferably a substituent having 1 to 6 carbon atoms.
The "substituent having 1 to 6 carbon atoms" is the same as the "substituent having 1 to 6 carbon atoms" described in the description of Requirement 1.
The specific phenol compound satisfying Requirement 2 has one aromatic ring group (preferably a group represented by the above general formula (P0)) having a phenolic hydroxyl group and a substituent arranged at the ortho position of the phenolic hydroxyl group. It is preferable to have the above, more preferably 2 or more, further preferably 2 to 12, and particularly preferably 4 to 8.
 要件2を満たす特定フェノール化合物は、一般式(Z)で表される化合物であることが好ましい。特定フェノール化合物は、一般式(Z)で表される化合物を含むことが好ましく、特定フェノール化合物が一般式(Z)で表される化合物そのものであってもよい。一般式(Z)で表される化合物の含有量は、特定フェノール化合物の全質量に対して、10~100質量%が好ましく、25~100質量%がより好ましく、50~100質量%が更に好ましい。 The specific phenol compound satisfying Requirement 2 is preferably a compound represented by the general formula (Z). The specific phenol compound preferably contains a compound represented by the general formula (Z), and the specific phenol compound may be the compound itself represented by the general formula (Z). The content of the compound represented by the general formula (Z) is preferably 10 to 100% by mass, more preferably 25 to 100% by mass, still more preferably 50 to 100% by mass, based on the total mass of the specific phenol compound. ..
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000017
 上記一般式(Z)中、同一の符号で表される基が複数存在する場合、特段の断りがない限り、複数存在する同一の符号で表される基は、それぞれ同一でも異なっていてもよい。 In the above general formula (Z), when a plurality of groups represented by the same reference numeral exist, the plurality of groups represented by the same reference numeral may be the same or different unless otherwise specified. ..
 一般式(Z)中、E~Eは、それぞれ独立に、単結合、-NH-、又は、-NR-を表す。
 Rは、置換基を表す。Rの表す置換基としては、例えば、炭素数1~5の直鎖状又は分岐鎖状のアルキル基が挙げられる。
 E~Eは、それぞれ独立に、-NH-、又は、-NR-が好ましく、-NH-がより好ましい。
In the general formula (Z), E 1 to E 6 independently represent a single bond, -NH-, or -NR-.
R represents a substituent. Examples of the substituent represented by R include a linear or branched alkyl group having 1 to 5 carbon atoms.
Independently, E 1 to E 6 are preferably -NH- or -NR-, and more preferably -NH-.
 一般式(Z)中、Bは、単結合又はk+1価の有機基を表す。
 Bは、単結合又はl+1価の有機基を表す。
 Bは、単結合又はm+1価の有機基を表す。
 Bは、単結合又はn+1価の有機基を表す。
 上記k+1価の有機基、l+1価の有機基、m+1価の有機基、及び、n+1価の有機基におけるk、l、m、及び、nの値は、一般式(Z)中に明示される、k、l、m、及び、nの値と一致する。
 なお、rが2以上であって、複数存在するmの値が異なる場合、Bで表されるm+1価の有機基におけるmの値は、そのBが結合するXの数を示すmの値と同一である。
In the general formula (Z), B 1 represents a single bond or a k + 1 valent organic group.
B 2 represents a single bond or an l + 1 valent organic group.
B 3 represents a single bond or m + 1 valent organic group.
B 4 represents a single bond or n + 1 valent organic group.
The values of k, l, m, and n in the above-mentioned k + 1-valent organic group, l + 1-valent organic group, m + 1-valent organic group, and n + 1-valent organic group are specified in the general formula (Z). , K, l, m, and n.
Incidentally, there is r is 2 or more, if the value of m that there are a plurality are different, the value of m in m + 1-valent organic group represented by B 3 indicates the number of X 3 to which the B 3 binds m Is the same as the value of.
 B~Bが表す有機基としては、例えば、炭素数1~20のヘテロ原子を有していてもよい炭化水素からj個の水素原子を除いた基などが挙げられる。なお、j個とは、k+1個、l+1個、m+1個、又は、n+1個のことをいう。
 ここで、j個の水素原子を除く前の炭化水素としては、例えば、置換基を有していてもよい炭素数1~20の脂肪族炭化水素、置換基を有していてもよい炭素数3~20の脂肪族環、及び、置換基を有していてもよい炭素数3~20の芳香環からなる群から選択される1以上の炭化水素が挙げられる。また、上記1以上の炭化水素に対して、更に、-O-、-S-、-CO-、-NR-(RNは水素原子又は置換基)、及び、-SO-からなる群から選択される2価の連結基の1以上を組み合わせてなる炭化水素でもよい。
 炭素数1~20の脂肪族炭化水素としては、例えば、メタン、エタン、プロパン、ブタン、ペンタン、ヘキサン、及び、ヘプタンなどが挙げられる。
 炭素数3~20の脂肪族環としては、例えば、シクロヘキサン環、シクロヘプタン環、ノルボルナン環、及び、アダマンタン環などが挙げられる。
 炭素数3~20の芳香環としては、例えば、炭素数6~20の芳香族炭化水素、及び、炭素数3~20の芳香族複素環などが挙げられる。
 炭素数6~20の芳香族炭化水素としては、例えば、ベンゼン環、ナフタレン環、アントラセン環などが挙げられ、炭素数3~20の芳香族複素環としては、例えば、フラン環、ピロール環、チオフェン環、ピリジン環、チアゾール環、カルバゾール環、インドール環、及び、ベンゾチアゾール環などが挙げられる。
Examples of the organic group represented by B 1 to B 4 include a group obtained by removing j hydrogen atoms from a hydrocarbon which may have a hetero atom having 1 to 20 carbon atoms. In addition, j means k + 1, l + 1, m + 1, or n + 1.
Here, as the hydrocarbon before removing j hydrogen atoms, for example, an aliphatic hydrocarbon having 1 to 20 carbon atoms which may have a substituent and a carbon number which may have a substituent may be used. Examples thereof include one or more hydrocarbons selected from the group consisting of 3 to 20 aliphatic rings and an aromatic ring having 3 to 20 carbon atoms which may have a substituent. Further, for the above 1 or more hydrocarbons, the group further consists of -O-, -S-, -CO-, -NR N- (RN is a hydrogen atom or a substituent), and -SO 2-. Hydrocarbons may be a combination of one or more of the selected divalent linking groups.
Examples of the aliphatic hydrocarbon having 1 to 20 carbon atoms include methane, ethane, propane, butane, pentane, hexane, and heptane.
Examples of the aliphatic ring having 3 to 20 carbon atoms include a cyclohexane ring, a cycloheptane ring, a norbornane ring, and an adamantane ring.
Examples of the aromatic ring having 3 to 20 carbon atoms include aromatic hydrocarbons having 6 to 20 carbon atoms and aromatic heterocycles having 3 to 20 carbon atoms.
Examples of the aromatic hydrocarbon having 6 to 20 carbon atoms include a benzene ring, a naphthalene ring, an anthracene ring and the like, and examples of the aromatic heterocyclic ring having 3 to 20 carbon atoms include a furan ring, a pyrrole ring and a thiophene. Examples thereof include a ring, a pyridine ring, a thiazole ring, a carbazole ring, an indole ring, and a benzothiazole ring.
 一般式(Z)中、k、l、m、及び、nは、それぞれ独立に、0以上の整数を表す。ただし、k、l、r個存在するm(つまりr×m)、及び、nの合計は2以上であり、2~12の整数であることが好ましく、4~8の整数であることがより好ましい。
 k、l、m、及び、nは、それぞれ独立に、0~5が好ましく、1~2がより好ましい。
 例えば、kが1以上(より好ましくは1~2)であるのが好ましく、lが1以上(より好ましくは1~2)であるのが好ましく、mが1以上(より好ましくは1~2)であるのが好ましく、nが1以上(より好ましくは1~2)であるのが好ましい。
 なお、kが0の場合、BはXを有さない。lが0の場合、BはXを有さない。mが0の場合、BはXを有さない。nが0の場合、BはXを有さない。
 また、Bが単結合の場合、kは1である。Bが単結合の場合、lは1である。Bが単結合の場合、mは1である。Bが単結合の場合、nは1である。
In the general formula (Z), k, l, m, and n each independently represent an integer of 0 or more. However, the total of k, l, r existing m (that is, r × m) and n is 2 or more, preferably an integer of 2 to 12, and more preferably an integer of 4 to 8. preferable.
Independently, k, l, m, and n are preferably 0 to 5, and more preferably 1 to 2.
For example, k is preferably 1 or more (more preferably 1 to 2), l is preferably 1 or more (more preferably 1 to 2), and m is 1 or more (more preferably 1 to 2). It is preferable that n is 1 or more (more preferably 1 to 2).
When k is 0, B 1 does not have X 1. When l is 0, B 2 does not have X 2. If m is 0, then B 3 does not have X 3. If n is 0, then B 4 does not have X 4.
Further, when B 1 is a single bond, k is 1. When B 2 is a single bond, l is 1. When B 3 is a single bond, m is 1. When B 4 is a single bond, n is 1.
 Lは、2価の有機基を表す。
 有機基としては、例えば、置換基を有していてもよい2価の芳香環基、置換基を有していてもよい2価の脂肪族炭化水素基、置換基を有していてもよい2価の脂肪族環基、-O-、-S-、-N(R)-又は-CO-、及び、これらを組み合わせた基が挙げられる。
 Rは、置換基を表す。Rの表す置換基としては、例えば、炭素数1~5の直鎖状又は分岐鎖状のアルキル基などが挙げられる。
 また、芳香環基、脂肪族炭化水素基、及び、脂肪族環基が有していてもよい置換基としては、例えば、炭素数1~5の直鎖状又は分岐鎖状のアルキル基などが挙げられる。
L represents a divalent organic group.
The organic group may have, for example, a divalent aromatic ring group which may have a substituent, a divalent aliphatic hydrocarbon group which may have a substituent, and a substituent. divalent aliphatic cyclic group, -O -, - S -, - N (R N) - , or -CO-, and, a group combining thereof.
R N represents a substituent. The substituents represented by R N, e.g., like a linear or branched alkyl group having 1 to 5 carbon atoms.
Further, examples of the substituent which the aromatic ring group, the aliphatic hydrocarbon group and the aliphatic ring group may have include a linear or branched alkyl group having 1 to 5 carbon atoms. Can be mentioned.
 芳香環基としては、例えば、炭素数6~20の芳香族炭化水素基、及び、炭素数3~20の芳香族複素環基などが挙げられる。
 炭素数6~20の芳香族炭化水素基としては、例えば、ベンゼン環基などの単環式芳香環基;ナフタレン環基、及び、アントラセン環基などの多環式芳香環基;などが挙げられ、炭素数3~20の芳香族複素環基としては、例えば、フラン環基、ピロール環基、チオフェン環基、ピリジン環基、及び、チアゾール環基などの単環式芳香環基;ベンゾチアゾール環基、カルバゾール環基、及び、インドール環基などの多環式芳香環基;などが挙げられる。
Examples of the aromatic ring group include an aromatic hydrocarbon group having 6 to 20 carbon atoms and an aromatic heterocyclic group having 3 to 20 carbon atoms.
Examples of the aromatic hydrocarbon group having 6 to 20 carbon atoms include a monocyclic aromatic ring group such as a benzene ring group; a naphthalene ring group, and a polycyclic aromatic ring group such as an anthracene ring group; Examples of the aromatic heterocyclic group having 3 to 20 carbon atoms include a monocyclic aromatic ring group such as a furan ring group, a pyrrole ring group, a thiophene ring group, a pyridine ring group, and a thiazole ring group; a benzothiazole ring. Examples include a polycyclic aromatic ring group such as a group, a carbazole ring group, and an indole ring group;
 脂肪族炭化水素基としては、例えば、炭素数1~12のアルキレン基などが挙げられ、具体的には、メチレン基、エチレン基、プロピレン基、ブチレン基、ペンチレン基、ヘキシレン基、メチルヘキシレン基、及び、へプチレン基などが挙げられる。 Examples of the aliphatic hydrocarbon group include an alkylene group having 1 to 12 carbon atoms, and specifically, a methylene group, an ethylene group, a propylene group, a butylene group, a pentylene group, a hexylene group and a methylhexylene group. , And a heptylene group and the like.
 脂肪族環基としては、例えば、シクロヘキサン環基、シクロヘプタン環基、ノルボルナン環基、及び、アダマンタン環基などが挙げられる。 Examples of the aliphatic ring group include a cyclohexane ring group, a cycloheptane ring group, a norbornane ring group, and an adamantane ring group.
 置換基を有していてもよい芳香環基、置換基を有していてもよい脂肪族炭化水素基、置換基を有していてもよい脂肪族環基、又は、-O-、-S-、-NR-若しくは-CO-を組み合わせた基としては、これらの2つ以上の組み合わせからなる2価の連結基だけでなく、同種の基(例えば、芳香環基)を単結合を介して2つ以上組み合わせた2価の連結基であってもよい。 An aromatic ring group which may have a substituent, an aliphatic hydrocarbon group which may have a substituent, an aliphatic ring group which may have a substituent, or -O-, -S. As a group combining-, -NR N- or -CO-, not only a divalent linking group consisting of a combination of two or more of these, but also a group of the same type (for example, an aromatic ring group) is connected via a single bond. It may be a divalent linking group in which two or more are combined.
 本発明においては、熱伝導材料の熱伝導性がより優れる点から、Lの両末端が炭素原子であることが好ましい。具体的には、「-E-C-」であること、かつ、「-C-E-」であることが好ましい。なお、上記C(炭素原子)は、Lを構成する原子である。末端の炭素原子は環状構造の一部でもよい。
 また、本発明においては、熱伝導材料の熱伝導性がより優れる点から、上記一般式(P2)中のLが、置換基を有していてもよい2価の芳香環基、置換基を有していてもよい2価の脂肪族環基、及び、炭素数2以上の分岐を有していてもよいアルキレン基からなる群から選択される少なくとも1種を有する2価の有機基であることが好ましく、熱伝導性がより優れるとの理由から置換基を有していてもよい2価の芳香環基を有する2価の有機基がより好ましい。
In the present invention, it is preferable that both ends of L are carbon atoms from the viewpoint that the heat conductivity of the heat conductive material is more excellent. Specifically, "- E 3 -C-" is that, and "- C-E 4 -" is preferably. The C (carbon atom) is an atom constituting L. The terminal carbon atom may be part of a cyclic structure.
Further, in the present invention, from the viewpoint that the thermal conductivity of the heat conductive material is more excellent, L in the above general formula (P2) may have a divalent aromatic ring group or a substituent which may have a substituent. It is a divalent organic group having at least one selected from the group consisting of a divalent aliphatic ring group which may have and an alkylene group which may have a branch having 2 or more carbon atoms. It is preferable, and a divalent organic group having a divalent aromatic ring group which may have a substituent may be more preferable because the thermal conductivity is more excellent.
 一般式(Z)中、rは0以上の整数である。
 rは0~20の整数であることが好ましく、0~10の整数であることがより好ましい。
In the general formula (Z), r is an integer of 0 or more.
r is preferably an integer of 0 to 20, and more preferably an integer of 0 to 10.
 一般式(Z)中、X~Xは、それぞれ独立に、フェノール性水酸基を有する芳香環基を表す。
 「フェノール性水酸基を有する芳香環基」は、芳香環に直接結合する水酸基(フェノール性水酸基)を1個以上(例えば1~4個)有する芳香環基であればよい。上記芳香環基は上記水酸基以外の置換基を有しててもよく、有していなくてもよい。上記芳香環基は、単環でも多環でもよく、環員原子としてヘテロ原子を有していてもよい。上記芳香環基の環員原子の数は5~15が好ましく、6~10がより好ましく、6が更に好ましい。
In the general formula (Z), X 1 to X 4 each independently represent an aromatic ring group having a phenolic hydroxyl group.
The "aromatic ring group having a phenolic hydroxyl group" may be any aromatic ring group having one or more (for example, 1 to 4) hydroxyl groups (phenolic hydroxyl groups) directly bonded to the aromatic ring. The aromatic ring group may or may not have a substituent other than the hydroxyl group. The aromatic ring group may be monocyclic or polycyclic, and may have a heteroatom as a ring member atom. The number of ring member atoms of the aromatic ring group is preferably 5 to 15, more preferably 6 to 10, and even more preferably 6.
 ただし、一般式(Z)中、k個存在するX、l個存在するX、r×m個存在するX、及び、n個存在するXのうちの少なくとも1個は、フェノール性水酸基とフェノール性水酸基のオルト位に配置された置換基とを有する芳香環基を表す。なお、「r×m」におけるmの値は、複数存在し得るmの平均値である。
 言い換えると、(k+l+r×m+n)個存在するX~Xのいずれかで表される「フェノール性水酸基を有する芳香環基」のうち、少なくとも1個が「フェノール性水酸基とフェノール性水酸基のオルト位に配置された置換基とを有する芳香環基」を表す。
 なかでも、(k+l+r×m+n)個存在するX~Xのいずれかで表される「フェノール性水酸基を有する芳香環基」のうち、「フェノール性水酸基とフェノール性水酸基のオルト位に配置された置換基とを有する芳香環基」の割合〔(「フェノール性水酸基とフェノール性水酸基のオルト位に配置された置換基とを有する芳香環基」の個数/(k+l+r×m+n)個存在するX~Xのいずれかで表される「フェノール性水酸基を有する芳香環基」の個数)×100〕は、30%以上が好ましく、50%以上がより好ましく、65%以上が更に好ましい。上限は100%以下が好ましく、90%以下がより好ましく、80%以下が更に好ましい。
 上記「フェノール性水酸基とフェノール性水酸基のオルト位に配置された置換基とを有する芳香環基」は、例えば、一般式(Y)の説明に関して述べた「フェノール性水酸基とフェノール性水酸基のオルト位に配置された炭素数1~6の置換基とを有する芳香環基」において、「炭素数1~6の置換基」が特に制限のない「置換基(水酸基でもよく、水酸基以外が好ましい)」に置き換わった形態が挙げられる。
However, in the general formula (Z), at least one of k existing X 1 , l existing X 2 , r × m existing X 3 and n existing X 4 is phenolic. Represents an aromatic ring group having a hydroxyl group and a substituent arranged at the ortho position of the phenolic hydroxyl group. The value of m in "r × m" is an average value of m that may exist in a plurality of values.
In other words, of the "aromatic ring groups having phenolic hydroxyl groups" represented by any of X 1 to X 4 existing (k + l + r × m + n), at least one is "ortho-phenolic hydroxyl group and phenolic hydroxyl group". Represents an aromatic ring group having a substituent arranged at the position.
Among the "aromatic ring groups having a phenolic hydroxyl group" represented by any of X 1 to X 4 existing (k + l + r × m + n), "arranged at the ortho position of the phenolic hydroxyl group and the phenolic hydroxyl group". Ratio of "aromatic ring groups having a substituent" [(number of "aromatic ring groups having a phenolic hydroxyl group and a substituent arranged at the ortho position of the phenolic hydroxyl group" / (k + l + r × m + n)) X present number) × 100] of the "aromatic ring group having a phenolic hydroxyl group" represented by any one of the 1 ~ X 4 is preferably 30% or more, more preferably 50% or more, more preferably 65% or more. The upper limit is preferably 100% or less, more preferably 90% or less, still more preferably 80% or less.
The above-mentioned "aromatic ring group having a phenolic hydroxyl group and a substituent arranged at the ortho position of the phenolic hydroxyl group" is, for example, the "ortho-position of the phenolic hydroxyl group and the phenolic hydroxyl group" described with respect to the description of the general formula (Y). In the "aromatic ring group having a substituent having 1 to 6 carbon atoms" arranged in, the "substituted group having 1 to 6 carbon atoms" is not particularly limited to a "hydroxyl group (may be a hydroxyl group, preferably a non-hydroxyl group)". The form replaced with is mentioned.
 「フェノール性水酸基とフェノール性水酸基のオルト位に配置された置換基とを有する芳香環基」は、それぞれ独立に、「フェノール性水酸基とフェノール性水酸基のオルト位に配置された炭素数1~6の置換基とを有する芳香環基」であることが好ましい。
 上記「フェノール性水酸基とフェノール性水酸基のオルト位に配置された炭素数1~6の置換基とを有する芳香環基」は、上述の一般式(Y)に関して説明した「フェノール性水酸基とフェノール性水酸基のオルト位に配置された炭素数1~6の置換基とを有する芳香環基」と同様であり、上述の一般式(P0)で表される基であることが好ましい。
The "aromatic ring group having a phenolic hydroxyl group and a substituent arranged at the ortho position of the phenolic hydroxyl group" independently has "1 to 6 carbon atoms arranged at the ortho position of the phenolic hydroxyl group and the phenolic hydroxyl group". It is preferably an aromatic ring group having a substituent of.
The above-mentioned "aromatic ring group having a phenolic hydroxyl group and a substituent having 1 to 6 carbon atoms arranged at the ortho position of the phenolic hydroxyl group" is the "phenolic hydroxyl group and phenolic" described with respect to the above general formula (Y). It is the same as the aromatic ring group having a substituent having 1 to 6 carbon atoms arranged at the ortho position of the hydroxyl group, and is preferably a group represented by the above general formula (P0).
 X~Xで表されるフェノール性水酸基を有する芳香環基において、「フェノール性水酸基とフェノール性水酸基のオルト位に配置された置換基とを有する芳香環基」以外の芳香環基は、水酸基(フェノール性水酸基)以外の置換基を有してもよく有してなくてもよい。
 「フェノール性水酸基とフェノール性水酸基のオルト位に配置された置換基とを有する芳香環基」以外の芳香環基は、例えば、ヒドロキシフェニル基が挙げられる。
 (k+l+r×m+n)個存在するX~Xのいずれかで表される「フェノール性水酸基を有する芳香環基」のうち、少なくとも1個(例えば1~2個)が「フェノール性水酸基とフェノール性水酸基のオルト位に配置された置換基とを有する芳香環基」以外の芳香環基であることも好ましい。
 X~X4で表されるフェノール性水酸基を有する芳香環基において、「フェノール性水酸基とフェノール性水酸基のオルト位に配置された置換基とを有する芳香環基」以外の芳香環基も存在していることで、化合物全体としての対称性が崩れ、化合物の融点が低下し、取り扱い性が向上する。また、このような形態の化合物をエポキシ化合物と組み合わせて組成物とした場合、組成物をDSC(示差走査熱量計)で測定して検出される発熱ピークがブロード化(半値幅の増大、又は、発熱ピークの温度と反応開始温度の差の増大)する。このようなブロード化が生じると、組成物を幅広い温度で硬化させることができ、好ましいと考えられている。
In the aromatic ring group having a phenolic hydroxyl group represented by X 1 ~ X 4, aromatic ring other than the "aromatic ring group having a substituent located in the ortho position of the phenolic hydroxyl group and a phenolic hydroxyl group" is, It may or may not have a substituent other than a hydroxyl group (phenolic hydroxyl group).
Examples of the aromatic ring group other than the "aromatic ring group having a phenolic hydroxyl group and a substituent arranged at the ortho position of the phenolic hydroxyl group" include a hydroxyphenyl group.
Of the (k + l + r × m + n) “aromatic ring groups having phenolic hydroxyl groups” represented by any of X 1 to X 4 , at least one (for example, 1 to 2) is “phenolic hydroxyl group and phenol”. It is also preferable that it is an aromatic ring group other than the "aromatic ring group having a substituent arranged at the ortho position of the sex hydroxyl group".
Among the aromatic ring groups having phenolic hydroxyl groups represented by X 1 to X 4 , there are also aromatic ring groups other than "aromatic ring groups having a phenolic hydroxyl group and a substituent arranged at the ortho position of the phenolic hydroxyl group". As a result, the symmetry of the compound as a whole is broken, the melting point of the compound is lowered, and the handleability is improved. Further, when a compound having such a form is combined with an epoxy compound to form a composition, the exothermic peak detected by measuring the composition with a DSC (differential scanning calorimetry) becomes broad (increase in half-value width or increase in half-value width). Increasing the difference between the exothermic peak temperature and the reaction start temperature). When such broadening occurs, the composition can be cured at a wide temperature and is considered to be preferable.
 要件2を満たす特定フェノール化合物は、一般式(Z1)で表される化合物であることも好ましい。特定フェノール化合物は、一般式(Z1)で表される化合物を含むことが好ましく、特定フェノール化合物が一般式(Z1)で表される化合物そのものであってもよい。一般式(Z1)で表される化合物の含有量は、特定フェノール化合物の全質量に対して、10~100質量%が好ましく、25~100質量%がより好ましく、50~100質量%が更に好ましい。 The specific phenol compound satisfying Requirement 2 is preferably a compound represented by the general formula (Z1). The specific phenol compound preferably contains a compound represented by the general formula (Z1), and the specific phenol compound may be the compound itself represented by the general formula (Z1). The content of the compound represented by the general formula (Z1) is preferably 10 to 100% by mass, more preferably 25 to 100% by mass, still more preferably 50 to 100% by mass, based on the total mass of the specific phenol compound. ..
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000018
 一般式(Z1)中、rは0以上の整数を表す。rは0~20の整数であることが好ましく、0~10の整数であることがより好ましい。
 Lは、2価の有機基を表す。一般式(Z1)におけるLで表される2価の有機基は、例えば、一般式(Z1)におけるLで表される2価の有機基と同様である。
 Rは、水素原子又は置換基を表す。
 Rで表される置換基は、炭素数1~6の置換基であることが好ましく、炭素数1~6の炭化水素基であることがより好ましく、炭素数1~6のアルキル基であることが更に好ましい。
 ただし、一般式(Z1)中に(3+r)個存在するRの少なくとも1個は置換基を表す。(3+r)個存在するRのうち、置換基を表すRの割合〔(置換基を表すRの個数/(3+r)個存在するRの個数)×100〕は、30%以上が好ましく、50%以上がより好ましく、65%以上が更に好ましい。上限は90%以下が好ましく、80%以下がより好ましい。
 一般式(Z1)中に(3+r)個存在するRの少なくとも1個(例えば1~2個)は水素原子を表す。
 一般式(Z1)中におけるR(好ましくは置換基であるR)及びOHが結合したベンゼン環基において、上記R(好ましくは置換基であるR)は、上記ベンゼン環基が結合するNHに対するパラ位に存在していることも好ましい。
In the general formula (Z1), r represents an integer of 0 or more. r is preferably an integer of 0 to 20, and more preferably an integer of 0 to 10.
L represents a divalent organic group. The divalent organic group represented by L in the general formula (Z1) is, for example, the same as the divalent organic group represented by L in the general formula (Z1).
R Z represents a hydrogen atom or a substituent.
Substituents represented by R Z, it is preferable, more preferably a hydrocarbon group having 1 to 6 carbon atoms, an alkyl group having 1 to 6 carbon atoms that is a substituent having 1 to 6 carbon atoms Is even more preferable.
Provided that at least one of R Z which in the general formula (Z1) (3 + r) pieces there is a substituent. (3 + r) pieces presence of R Z is the percentage of R Z representing a substituent [(number of number / (3 + r) pieces present R Z of R Z representing a substituent) × 100] is 30% or more It is preferable, 50% or more is more preferable, and 65% or more is further preferable. The upper limit is preferably 90% or less, more preferably 80% or less.
At least one (for example, 1 to 2) of R Z existing in (3 + r) in the general formula (Z1) represents a hydrogen atom.
(Preferably R z is a substituted group) R z in the general formula (Z1) in the benzene ring group and OH is bonded, the R z (R z is preferably substituted groups), the benzene ring is bonded It is also preferable that it exists in the para position with respect to NH.
 要件2を満たす特定フェノール化合物は、一般式(Z2)で表される化合物であることも好ましい。特定フェノール化合物は、一般式(Z2)で表される化合物を含むことが好ましく、特定フェノール化合物が一般式(Z2)で表される化合物そのものであってもよい。一般式(Z2)で表される化合物の含有量は、特定フェノール化合物の全質量に対して、10~100質量%が好ましく、25~100質量%がより好ましく、50~100質量%が更に好ましい。 The specific phenol compound satisfying Requirement 2 is preferably a compound represented by the general formula (Z2). The specific phenol compound preferably contains a compound represented by the general formula (Z2), and the specific phenol compound may be the compound itself represented by the general formula (Z2). The content of the compound represented by the general formula (Z2) is preferably 10 to 100% by mass, more preferably 25 to 100% by mass, still more preferably 50 to 100% by mass, based on the total mass of the specific phenol compound. ..
Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000019
 一般式(Z2)中、Rは、水素原子又は置換基を表す。
 ただし、2個存在するRの少なくとも一方は置換基を表す。2個存在するRの両方が置換基を表すことが好ましい。
 Rで表される置換基は、炭素数1~6の置換基であることが好ましく、炭素数1~6の炭化水素基であることがより好ましく、炭素数1~6のアルキル基であることが更に好ましい。
 上記アルキル基は、直鎖状でも分岐鎖状でもよい。上記アルキル基は無置換であることも好ましい。
 一般式(Z2)中の2個のRは、それぞれ同一でも異なっていてもよい。
In the general formula (Z2), R Z represents a hydrogen atom or a substituent.
However, at least one of the two existing R Zs represents a substituent. It is preferred that both of the two existing R Zs represent substituents.
Substituents represented by R Z, it is preferable, more preferably a hydrocarbon group having 1 to 6 carbon atoms, an alkyl group having 1 to 6 carbon atoms that is a substituent having 1 to 6 carbon atoms Is even more preferable.
The alkyl group may be linear or branched. It is also preferable that the alkyl group is unsubstituted.
The two Rz in the general formula (Z2) may be the same or different from each other.
 要件2を満たす特定フェノール化合物は、「オルト位に置換基(好ましくは炭素数1~6の置換基)が存在するフェノール性水酸基」以外の水酸基を有していてもよい。ただし、要件2を満たす特定フェノール化合物が有する全水酸基のうち、「オルト位に置換基(好ましくは炭素数1~6の置換基)が存在するフェノール性水酸基」の割合〔(オルト位に炭素数1~6の置換基が存在するフェノール性水酸基の個数/特定フェノール化合物が有する全水酸基の個数)×100〕は、30%以上が好ましく、50%以上がより好ましく、65%以上が更に好ましい。上記数は100%以下が好ましく、90%以下がよりこのましく、80%以下が更に好ましい。 The specific phenol compound satisfying Requirement 2 may have a hydroxyl group other than "a phenolic hydroxyl group having a substituent (preferably a substituent having 1 to 6 carbon atoms) at the ortho position". However, the ratio of "phenolic hydroxyl group having a substituent (preferably a substituent having 1 to 6 carbon atoms) at the ortho position" among all the hydroxyl groups of the specific phenol compound satisfying Requirement 2 [(the number of carbon atoms at the ortho position). The number of phenolic hydroxyl groups in which 1 to 6 substituents are present / the number of total hydroxyl groups of the specific phenol compound) × 100] is preferably 30% or more, more preferably 50% or more, still more preferably 65% or more. The above number is preferably 100% or less, more preferably 90% or less, and even more preferably 80% or less.
 特定フェノール化合物の分子量は、225~2000が好ましく、225~1000がより好ましい。 The molecular weight of the specific phenol compound is preferably 225 to 2000, more preferably 225 to 1000.
 特定フェノール化合物の水酸基含有量は、2.0mmol/g以上が好ましく、4.0mmol/g以上がより好ましい。上限値は、25.0mmol/g以下が好ましく、10.0mmol/g以下がより好ましい。
 なお、上記水酸基含有量は、フェノール化合物1gが有する、水酸基(好ましくはフェノール性水酸基)の数を意図する。
 また、特定フェノール化合物は、水酸基以外にも、エポキシ化合物と重合反応できる活性水素含有基(カルボン酸基等)を有していてもよいし、有していなくてもよい。フェノール化合物の活性水素の含有量(水酸基及びカルボン酸基等における水素原子の合計含有量)の下限値は、2.0mmol/g以上が好ましく、4.0mmol/g以上がより好ましい。上限値は、25.0mmol/g以下が好ましく、10.0mmol/g以下がより好ましい。
The hydroxyl group content of the specific phenol compound is preferably 2.0 mmol / g or more, more preferably 4.0 mmol / g or more. The upper limit is preferably 25.0 mmol / g or less, more preferably 10.0 mmol / g or less.
The hydroxyl group content is intended to be the number of hydroxyl groups (preferably phenolic hydroxyl groups) possessed by 1 g of the phenol compound.
In addition to the hydroxyl group, the specific phenol compound may or may not have an active hydrogen-containing group (carboxylic acid group or the like) capable of polymerizing with the epoxy compound. The lower limit of the active hydrogen content (total content of hydrogen atoms in hydroxyl groups, carboxylic acid groups, etc.) of the phenol compound is preferably 2.0 mmol / g or more, and more preferably 4.0 mmol / g or more. The upper limit is preferably 25.0 mmol / g or less, more preferably 10.0 mmol / g or less.
 特定フェノール化合物は、1種単独で使用してもよく、2種以上を使用してもよい。
 中でも、特定フェノール化合物は、一般式(Z)で表される化合物であって、(k+l+r×m+n)個存在するX~Xのいずれかで表される「フェノール性水酸基を有する芳香環基」のうち、少なくとも1個(例えば1~2個)が「フェノール性水酸基とフェノール性水酸基のオルト位に配置された置換基とを有する芳香環基」以外の芳香環基である化合物(例えば一般式(Z2)で表される化合物)を、特定フェノール化合物の全質量に対して、10~100質量%含むことが好ましく、25~100質量%含むことがより好ましく、50~100質量%含むことが更に好ましい。
 なお、本発明の組成物は、特定フェノール化合物以外にも、後述のエポキシ化合物と反応可能な基を有する化合物(「その他の活性水素含有化合物」ともいう)を含んでもよい。
 その他の活性水素含有化合物としては、例えば、特定フェノール化合物以外のフェノール化合物であってもよい。
 ただし、本発明の組成物において、特定フェノール化合物の含有量に対する、その他の活性水素含有化合物の含有量の質量比は、0~1が好ましく、0~0.1がより好ましく、0~0.05が更に好ましい。
The specific phenol compound may be used alone or in combination of two or more.
Among them, the specific phenol compound is a compound represented by the general formula (Z), and is represented by any of (k + l + r × m + n) X 1 to X 4 , which is a “aromatic ring group having a phenolic hydroxyl group”. Of the above, at least one (for example, 1 to 2) is a compound which is an aromatic ring group other than "an aromatic ring group having a phenolic hydroxyl group and a substituent arranged at the ortho position of the phenolic hydroxyl group" (for example, general). The compound represented by the formula (Z2) is preferably contained in an amount of 10 to 100% by mass, more preferably 25 to 100% by mass, and 50 to 100% by mass based on the total mass of the specific phenol compound. Is more preferable.
In addition to the specific phenol compound, the composition of the present invention may contain a compound having a group capable of reacting with an epoxy compound described later (also referred to as “other active hydrogen-containing compound”).
The other active hydrogen-containing compound may be, for example, a phenol compound other than the specific phenol compound.
However, in the composition of the present invention, the mass ratio of the content of the other active hydrogen-containing compound to the content of the specific phenol compound is preferably 0 to 1, more preferably 0 to 0.1, and 0 to 0. 05 is more preferable.
〔エポキシ化合物〕
 本発明の組成物はエポキシ化合物を含む。
 エポキシ化合物は、1分子中に、少なくとも1つのエポキシ基(オキシラニル基)を有する化合物である。
 上記エポキシ基は、オキシラン環から1以上の水素原子(好ましくは1の水素原子)を除いてなる基である。上記エポキシ基は、可能な場合、更に置換基(直鎖状又は分岐鎖状の炭素数1~5のアルキル基等)を有していてもよい。
[Epoxy compound]
The composition of the present invention comprises an epoxy compound.
An epoxy compound is a compound having at least one epoxy group (oxylanyl group) in one molecule.
The epoxy group is a group obtained by removing one or more hydrogen atoms (preferably one hydrogen atom) from the oxylan ring. If possible, the epoxy group may further have a substituent (a linear or branched alkyl group having 1 to 5 carbon atoms, or the like).
 エポキシ化合物が有するエポキシ基の数は、1分子中、2以上が好ましく、2~1000がより好ましく、2~40が更に好ましい。 The number of epoxy groups contained in the epoxy compound is preferably 2 or more, more preferably 2 to 1000, and even more preferably 2 to 40 in one molecule.
 エポキシ化合物の分子量は、150以上が好ましく、300以上がより好ましい。上記分子量の上限に制限はなく、例えば100000以下が好ましく、10000以下がより好ましい。
 なお、上記分子量に分子量分布がある場合、上記分子量は数平均分子量である。
 本明細書において、数平均分子量及び重量平均分子量は、ゲルパーミエーションクロマトグラフィ(GPC)によるポリスチレン換算で求めた重量平均分子量である。
The molecular weight of the epoxy compound is preferably 150 or more, more preferably 300 or more. The upper limit of the molecular weight is not limited, and for example, 100,000 or less is preferable, and 10,000 or less is more preferable.
When the molecular weight has a molecular weight distribution, the molecular weight is a number average molecular weight.
In the present specification, the number average molecular weight and the weight average molecular weight are the weight average molecular weights obtained in terms of polystyrene by gel permeation chromatography (GPC).
 エポキシ化合物のエポキシ基含有量は、2.0~20.0mmol/gが好ましく、5.0~15.0mmol/gがより好ましい。
 なお、上記エポキシ基含有量は、エポキシ化合物1gが有する、エポキシ基の数を意図する。
 エポキシ化合物は、芳香環基(好ましくは芳香族炭化水素環基)を有するのも好ましい。
The epoxy group content of the epoxy compound is preferably 2.0 to 20.0 mmol / g, more preferably 5.0 to 15.0 mmol / g.
The epoxy group content is intended to be the number of epoxy groups contained in 1 g of the epoxy compound.
The epoxy compound also preferably has an aromatic ring group (preferably an aromatic hydrocarbon ring group).
 エポキシ化合物は、液晶性を示してもよく示さなくてもよい。
 つまり、エポキシ化合物は、液晶化合物であってよい。言い換えれば、エポキシ基を有する液晶化合物であってもよい。
 エポキシ化合物(液晶性のエポキシ化合物であってもよい)としては、例えば、少なくとも部分的に棒状構造を含む化合物(棒状化合物)、及び、少なくとも部分的に円盤状構造を含む化合物円盤状化合物が挙げられる。
 以下、棒状化合物及び円盤状化合物について詳述する。
The epoxy compound may or may not exhibit liquid crystallinity.
That is, the epoxy compound may be a liquid crystal compound. In other words, it may be a liquid crystal compound having an epoxy group.
Examples of the epoxy compound (which may be a liquid crystal epoxy compound) include a compound having a rod-like structure at least partially (a rod-like compound) and a compound having a disk-like structure at least partially. Be done.
Hereinafter, the rod-shaped compound and the disk-shaped compound will be described in detail.
(棒状化合物)
 棒状化合物であるエポキシ化合物としては、アゾメチン類、アゾキシ類、シアノビフェニル類、シアノフェニルエステル類、安息香酸エステル類、シクロヘキサンカルボン酸フェニルエステル類、シアノフェニルシクロヘキサン類、シアノ置換フェニルピリミジン類、アルコキシ置換フェニルピリミジン類、フェニルジオキサン類、トラン類、及び、アルケニルシクロヘキシルベンゾニトリル類が挙げられる。以上のような低分子化合物だけではなく、高分子化合物も使用できる。上記高分子化合物は、低分子の反応性基を有する棒状化合物が重合した高分子化合物である。
 好ましい棒状化合物としては、下記一般式(XXI)で表される棒状化合物が挙げられる。
 一般式(XXI):Q-L111-A111-L113-M-L114-A112-L112-Q
(Stick compound)
Examples of the epoxy compound which is a rod-shaped compound include azomethines, azoxys, cyanobiphenyls, cyanophenyl esters, benzoic acid esters, cyclohexanecarboxylic acid phenyl esters, cyanophenylcyclohexanes, cyano-substituted phenylpyrimidins, and alkoxy-substituted phenyls. Examples thereof include pyrimidines, phenyldioxans, trans, and alkenylcyclohexylbenzonitriles. Not only low molecular weight compounds as described above, but also high molecular weight compounds can be used. The polymer compound is a polymer compound obtained by polymerizing a rod-shaped compound having a low molecular weight reactive group.
Preferred rod-shaped compounds include rod-shaped compounds represented by the following general formula (XXI).
Formula (XXI): Q 1 -L 111 -A 111 -L 113 -M-L 114 -A 112 -L 112 -Q 2
 一般式(XXI)中、Q及びQはそれぞれ独立に、エポキシ基であり、L111、L112、L113、及び、L114はそれぞれ独立に、単結合又は2価の連結基を表す。A111及びA112はそれぞれ独立に、炭素数1~20の2価の連結基(スペーサ基)を表す。Mはメソゲン基を表す。
 Q及びQのエポキシ基は、置換基を有していてもよいし、有していなくてもよい。
In the general formula (XXI), Q 1 and Q 2 are independent epoxy groups, and L 111 , L 112 , L 113 , and L 114 independently represent a single bond or a divalent linking group, respectively. .. A 111 and A 112 each independently represent a divalent linking group (spacer group) having 1 to 20 carbon atoms. M represents a mesogen group.
Epoxy group of Q 1 and Q 2 may be substituted or may not have.
 一般式(XXI)中、L111、L112、L113、及び、L114はそれぞれ独立に、単結合又は2価の連結基を表す。
 L111、L112、L113、及び、L114で表される2価の連結基としては、それぞれ独立に、-O-、-S-、-CO-、-NR112-、-CO-O-、-O-CO-O-、-CO-NR112-、-NR112-CO-、-O-CO-、-CH-O-、-O-CH-、-O-CO-NR112-、-NR112-CO-O-、及び、-NR112-CO-NR112-からなる群から選ばれる2価の連結基であるのが好ましい。上記R112は炭素数1~7のアルキル基又は水素原子である。
 中でも、L113及びL114は、それぞれ独立に、-O-が好ましい。
 L111及びL112は、それぞれ独立に、単結合が好ましい。
In the general formula (XXI), L 111 , L 112 , L 113 , and L 114 each independently represent a single bond or a divalent linking group.
The divalent linking groups represented by L 111 , L 112 , L 113 , and L 114 are independently -O-, -S-, -CO-, -NR 112- , and -CO-O, respectively. -, -O-CO-O-, -CO -NR 112- , -NR 112 -CO-, -O-CO-, -CH 2 -O-, -O-CH 2-, -O-CO-NR 112 -, - NR 112 -CO- O-, and, -NR 112 -CO-NR 112 - is preferably a divalent linking group selected from the group consisting of. The above R 112 is an alkyl group or a hydrogen atom having 1 to 7 carbon atoms.
Among them, L 113 and L 114 are preferably —O— independently of each other.
L 111 and L 112 are preferably single bonds independently of each other.
 一般式(XXI)中、A111及びA112は、それぞれ独立に、炭素数1~20の2価の連結基を表す。
 2価の連結基は、隣接していない酸素原子及び硫黄原子等のヘテロ原子を含んでいてもよい。中でも、炭素数1~12の、アルキレン基、アルケニレン基、又は、アルキニレン基が好ましい。上記、アルキレン基、アルケニレン基、又は、アルキニレン基がエステル基を有していてもよいし、有していなくてもよい。
 2価の連結基は直鎖状であるのが好ましく、また、上記2価の連結基は置換基を有していてもよいし、有していなくてもよい。置換基としては、例えば、ハロゲン原子(フッ素原子、塩素原子、及び、臭素原子)、シアノ基、メチル基、及び、エチル基が挙げられる。
 中でも、A111及びA112は、それぞれ独立に、炭素数1~12のアルキレン基が好ましく、メチレン基がより好ましい。
In the general formula (XXI), A 111 and A 112 each independently represent a divalent linking group having 1 to 20 carbon atoms.
The divalent linking group may contain heteroatoms such as non-adjacent oxygen and sulfur atoms. Of these, an alkylene group, an alkenylene group, or an alkynylene group having 1 to 12 carbon atoms is preferable. The above-mentioned alkylene group, alkenylene group, or alkynylene group may or may not have an ester group.
The divalent linking group is preferably linear, and the divalent linking group may or may not have a substituent. Examples of the substituent include a halogen atom (fluorine atom, chlorine atom, and bromine atom), a cyano group, a methyl group, and an ethyl group.
Among them, A 111 and A 112 are each independently preferably an alkylene group having 1 to 12 carbon atoms, and more preferably a methylene group.
 一般式(XXI)中、Mはメソゲン基を表し、上記メソゲン基としては、公知のメソゲン基が挙げられる。中でも、下記一般式(XXII)で表される基が好ましい。
 一般式(XXII):-(W-L115-W
In the general formula (XXI), M represents a mesogen group, and examples of the mesogen group include known mesogen groups. Of these, a group represented by the following general formula (XXII) is preferable.
General formula (XXII):-(W 1- L 115 ) n- W 2-
 一般式(XXII)式中、W及びWは、それぞれ独立に、2価の環状アルキレン基、2価の環状アルケニレン基、アリーレン基、又は、2価のヘテロ環基を表す。L115は、単結合又は2価の連結基を表す。nは、1~4の整数を表す。 In the general formula (XXII), W 1 and W 2 independently represent a divalent cyclic alkylene group, a divalent cyclic alkaneylene group, an arylene group, or a divalent heterocyclic group, respectively. L 115 represents a single bond or a divalent linking group. n represents an integer of 1 to 4.
 W及びWとしては、例えば、1,4-シクロヘキセンジイル、1,4-シクロヘキサンジイル、1,4-フェニレン、ピリミジン-2,5-ジイル、ピリジン-2,5-ジイル、1,3,4-チアジアゾール-2,5-ジイル、1,3,4-オキサジアゾール-2,5-ジイル、ナフタレン-2,6-ジイル、ナフタレン-1,5-ジイル、チオフェン-2,5-ジイル、及び、ピリダジン-3,6-ジイルが挙げられる。1,4-シクロヘキサンジイルの場合、トランス体及びシス体の構造異性体のどちらの異性体であってもよく、任意の割合の混合物でもよい。中でも、トランス体が好ましい。
 W及びWは、それぞれ置換基を有していてもよい。置換基としては、例えば、上述した置換基群Yで例示された基が挙げられ、より具体的には、ハロゲン原子(フッ素原子、塩素原子、臭素原子、及び、ヨウ素原子)、シアノ基、炭素数1~10のアルキル基(例えば、メチル基、エチル基、及び、プロピル基等)、炭素数1~10のアルコキシ基(例えば、メトキシ基、及び、エトキシ基等)、炭素数1~10のアシル基(例えば、ホルミル基、及び、アセチル基等)、炭素数1~10のアルコキシカルボニル基(例えば、メトキシカルボニル基、及び、エトキシカルボニル基等)、炭素数1~10のアシルオキシ基(例えば、アセチルオキシ基、及び、プロピオニルオキシ基等)、ニトロ基、トリフルオロメチル基、及び、ジフルオロメチル基等が挙げられる。
 Wが複数存在する場合、複数存在するWは、それぞれ同一でも異なっていてもよい。
Examples of W 1 and W 2 include 1,4-cyclohexenediyl, 1,4-cyclohexanediyl, 1,4-phenylene, pyrimidine-2,5-diyl, pyridine-2,5-diyl, 1,3. 4-Thiadiazole-2,5-diyl, 1,3,4-oxadiazole-2,5-diyl, naphthalene-2,6-diyl, naphthalene-1,5-diyl, thiophen-2,5-diyl, And pyridazine-3,6-zyl. In the case of 1,4-cyclohexanediyl, it may be either a trans isomer or a cis structural isomer, or a mixture in any proportion. Of these, the transformer body is preferable.
W 1 and W 2 may each have a substituent. Examples of the substituent include the groups exemplified in the above-mentioned substituent group Y, and more specifically, a halogen atom (fluorine atom, chlorine atom, bromine atom, and iodine atom), cyano group, and carbon. An alkyl group having a number of 1 to 10 (for example, a methyl group, an ethyl group, a propyl group, etc.), an alkoxy group having 1 to 10 carbon atoms (for example, a methoxy group, an ethoxy group, etc.), and a group having 1 to 10 carbon atoms. Acrylic group (eg, formyl group, acetyl group, etc.), alkoxycarbonyl group having 1 to 10 carbon atoms (eg, methoxycarbonyl group, ethoxycarbonyl group, etc.), acyloxy group having 1 to 10 carbon atoms (eg, ethoxycarbonyl group, etc.). Acetyloxy group, propionyloxy group, etc.), nitro group, trifluoromethyl group, difluoromethyl group and the like can be mentioned.
If W 1 there are a plurality, W 1 existing in plural numbers may each be the same or different.
 一般式(XXII)式中、L115は、単結合又は2価の連結基を表す。L115で表される2価の連結基としては、上述したL111~L114で表される2価の連結基の具体例が挙げられ、例えば、-CO-O-、-O-CO-、-CH-O-、及び、-O-CH-が挙げられる。
 L115が複数存在する場合、複数存在するL115は、それぞれ同一でも異なっていてもよい。
In the general formula (XXII), L 115 represents a single bond or a divalent linking group. Specific examples of the divalent linking group represented by L 115 include the above-mentioned divalent linking groups represented by L 111 to L 114 , and examples thereof include -CO-O- and -O-CO-. , -CH 2- O-, and -O-CH 2- .
When a plurality of L 115s are present, the plurality of L 115s may be the same or different from each other.
 上記一般式(XXII)で表されるメソゲン基の基本骨格で好ましい骨格を、以下に例示する。上記メソゲン基は、これらの骨格に置換基が置換していてもよい。 The preferred skeleton of the basic skeleton of the mesogen group represented by the above general formula (XXII) is illustrated below. The above-mentioned mesogen groups may be substituted with a substituent in these skeletons.
Figure JPOXMLDOC01-appb-C000020
Figure JPOXMLDOC01-appb-C000020
Figure JPOXMLDOC01-appb-C000021
Figure JPOXMLDOC01-appb-C000021
 上記骨格の中でも、得られる熱伝導材料の熱伝導性がより優れる点でビフェニル骨格が好ましい。
 なお、一般式(XXI)で表される化合物は、特表平11-513019号公報(WO97/00600)に記載の方法を参照して合成できる。
 棒状化合物は、特開平11-323162号公報及び特許4118691号に記載のメソゲン基を有するモノマーであってもよい。
Among the above skeletons, the biphenyl skeleton is preferable in that the obtained heat conductive material has more excellent heat conductivity.
The compound represented by the general formula (XXI) can be synthesized by referring to the method described in JP-A No. 11-513019 (WO97 / 00600).
The rod-shaped compound may be a monomer having a mesogen group described in JP-A No. 11-323162 and Japanese Patent No. 4118691.
 また、一般式(XXI)で表される化合物において、「Q-L111-」及び「-L112-Q」の一方又は両方が、ジグリシジルアミノ基に置き換わった化合物も好ましい。 Further, the compound represented by the general formula (XXI), "Q 1 -L 111 -" one or both of and "-L 112 -Q 2" is, compounds replaced the diglycidyl amino group are also preferred.
 中でも、棒状化合物は、一般式(E1)で表される化合物であるのが好ましい。 Among them, the rod-shaped compound is preferably a compound represented by the general formula (E1).
Figure JPOXMLDOC01-appb-C000022
Figure JPOXMLDOC01-appb-C000022
 一般式(E1)中、LE1は、それぞれ独立に、単結合又は2価の連結基を表す。
 中でも、LE1は、2価の連結基が好ましい。
 2価の連結基は、-O-、-S-、-CO-、-NH-、-CH=CH-、-C≡C-、-CH=N-、-N=CH-、-N=N-、置換意を有していてもよいアルキレン基、又は、これらの2以上の組み合わせからなる基が好ましく、-O-アルキレン基-又は-アルキレン基-O-がより好ましい。
 なお上記アルキレン基は、直鎖状、分岐鎖状、及び、環状のいずれでもよいが、炭素数1~2の直鎖状アルキレン基が好ましい。
 複数存在するLE1は、それぞれ同一でも異なっていてもよい。
In the general formula (E1), LE1 independently represents a single bond or a divalent linking group.
Of these, LE1 is preferably a divalent linking group.
The divalent linking groups are -O-, -S-, -CO-, -NH-, -CH = CH-, -C≡C-, -CH = N-, -N = CH-, -N = N-, an alkylene group which may have a substitution intention, or a group consisting of two or more of these is preferable, and -O-alkylene group- or -alkylene group-O- is more preferable.
The alkylene group may be linear, branched or cyclic, but a linear alkylene group having 1 to 2 carbon atoms is preferable.
A plurality of LE1s may be the same or different from each other.
 一般式(E1)中、LE2は、それぞれ独立に、単結合、-CH=CH-、-CO-O-、-O-CO-、-C(-CH)=CH-、-CH=C(-CH)-、-CH=N-、-N=CH-、-N=N-、-C≡C-、-N=N(-O)-、-N(-O)=N-、-CH=N(-O)-、-N(-O)=CH-、-CH=CH-CO-、-CO-CH=CH-、-CH=C(-CN)-、又は、-C(-CN)=CH-を表す。
 中でも、LE2は、それぞれ独立に、単結合、-CO-O-、又は、-O-CO-が好ましい。
 LE2が複数存在する場合、複数存在するLE2は、それぞれ同一でも異なっていてもよい。
In the general formula (E1), LE2 are independently single-bonded, -CH = CH-, -CO-O-, -O-CO-, -C (-CH 3 ) = CH-, -CH =. C (-CH 3 )-, -CH = N-, -N = CH-, -N = N-, -C≡C-, -N = N + (-O - )-, -N + (-O" -) = N -, - CH = N + (-O -) -, - N + (-O -) = CH -, - CH = CH-CO -, - CO-CH = CH -, - CH = C It represents (-CN)-or-C (-CN) = CH-.
Among them, L E2 are each independently a single bond, -CO-O-, or, -O-CO- is preferred.
When there are a plurality of LE2s , the plurality of LE2s may be the same or different.
 一般式(E1)中、LE3は、それぞれ独立に、単結合、又は、置換基を有していてもよい、5員環若しくは6員環の芳香族環基又は5員環若しくは6員環の非芳香族環基、又は、これらの環からなる多環基を表す。
 LE3で表される芳香族環基及び非芳香族環基の例としては、置換基を有していてもよい、1,4-シクロヘキサンジイル基、1,4-シクロヘキセンジイル基、1,4-フェニレン基、ピリミジン-2,5-ジイル基、ピリジン-2,5-ジイル基、1,3,4-チアジアゾール-2,5-ジイル基、1,3,4-オキサジアゾール-2,5-ジイル基、ナフタレン-2,6-ジイル基、ナフタレン-1,5-ジイル基、チオフェン-2,5-ジイル基、及び、ピリダジン-3,6-ジイル基が挙げられる。1,4-シクロヘキサンジイル基の場合、トランス体及びシス体の構造異性体のどちらの異性体であってもよく、任意の割合の混合物でもよい。中でも、トランス体であるのが好ましい。
 中でも、LE3は、単結合、1,4-フェニレン基、又は、1,4-シクロヘキセンジイル基が好ましい。
 LE3で表される基が有する置換基は、それぞれ独立に、アルキル基、アルコキシ基、ハロゲン原子、シアノ基、ニトロ基、又は、アセチル基が好ましく、アルキル基(好ましくは炭素数1)がより好ましい。
 なお、置換基が複数存在する場合、置換基は、それぞれ同一でも異なっていてもよい。
 LE3が複数存在する場合、複数存在するLE3は、それぞれ同一でも異なっていてもよい。
In the general formula (E1), LE3 may independently have a single bond or a substituent, respectively, and may have a 5-membered ring or a 6-membered ring aromatic ring group or a 5-membered ring or a 6-membered ring. Represents a non-aromatic ring group of, or a polycyclic group consisting of these rings.
Examples of aromatic ring groups and non-aromatic ring group represented by L E3, which may have a substituent, 1,4-cyclohexane-diyl group, 1,4-cyclohexene-diyl group, 1,4 -Phenylene group, pyrimidin-2,5-diyl group, pyridine-2,5-diyl group, 1,3,4-thiadiazol-2,5-diyl group, 1,3,4-oxadiazol-2,5 Examples thereof include a diyl group, a naphthalene-2,6-diyl group, a naphthalene-1,5-diyl group, a thiophene-2,5-diyl group, and a pyridazine-3,6-diyl group. In the case of a 1,4-cyclohexanediyl group, it may be either a trans isomer or a cis structural isomer, or a mixture in any proportion. Above all, a transformer body is preferable.
Among them, L E3 represents a single bond, 1,4-phenylene group, or 1,4-cyclohexene-diyl group are preferable.
Substituent having a group represented by L E3 each independently represent an alkyl group, an alkoxy group, a halogen atom, a cyano group, a nitro group, or, preferably an acetyl group, an alkyl group (preferably having a carbon number of 1) Gayori preferable.
When a plurality of substituents are present, the substituents may be the same or different.
When there are a plurality of LE3s , the plurality of LE3s may be the same or different.
 一般式(E1)中、peは、0以上の整数を表す。
 peが2以上の整数である場合、複数存在する(-LE3-LE2-)は、それぞれ同一でも異なっていてもよい。
 中でも、peは、0~2が好ましく、0又は1がより好ましく、0が更に好ましい。
In the general formula (E1), pe represents an integer of 0 or more.
If pe is the integer of 2 or more, there exist a plurality of (-L E3 -L E2 -) may each be the same or different.
Among them, pe is preferably 0 to 2, more preferably 0 or 1, and even more preferably 0.
 一般式(E1)中、LE4は、それぞれ独立に、置換基を表す。
 置換基は、それぞれ独立に、アルキル基、アルコキシ基、ハロゲン原子、シアノ基、ニトロ基、又は、アセチル基が好ましく、アルキル基(好ましくは炭素数1)がより好ましい。
 複数存在するLE4は、それぞれ同一でも異なっていてもよい。また、次に説明するleが2以上の整数である場合、同一の(LE4le中に複数存在するLE4も、それぞれ同一でも異なっていてもよい。
In the general formula (E1), LE4 independently represents a substituent.
As the substituent, an alkyl group, an alkoxy group, a halogen atom, a cyano group, a nitro group, or an acetyl group are preferable, and an alkyl group (preferably 1 carbon number) is more preferable.
A plurality of LE4s may be the same or different from each other. Further, when le described below is an integer of 2 or more, a plurality of LE4s existing in the same (LE4 ) le may be the same or different.
 一般式(E1)中、leは、それぞれ独立に、0~4の整数を表す。
 中でも、leは、それぞれ独立に、0~2が好ましい。
 複数存在するleは、それぞれ同一でも異なっていてもよい。
In the general formula (E1), le independently represents an integer of 0 to 4.
Among them, le is preferably 0 to 2 independently of each other.
A plurality of le may be the same or different from each other.
 また、一般式(E1)で表される化合物において、2個存在する「エポキシ基-LE1-」の一方又は両方が、ジグリシジルアミノアルキレン基(好ましくはジグリシジルアミノメチレン基)に置き換わった化合物も好ましい。 Further, the compound represented by the general formula (E1), 2 pieces present "epoxy group -L E1 -" compound one or both of the diglycidyl aminoalkylene group (preferably diglycidyl aminomethylene group) was replaced with Is also preferable.
 棒状化合物は、得られる熱伝導材料の熱伝導性がより優れる点でビフェニル骨格を有するのが好ましい。
 言い換えると、エポキシ化合物は、ビフェニル骨格を有するのが好ましく、この場合のエポキシ化合物は棒状化合物であるのがより好ましい。
The rod-shaped compound preferably has a biphenyl skeleton in that the obtained heat conductive material has better heat conductivity.
In other words, the epoxy compound preferably has a biphenyl skeleton, and the epoxy compound in this case is more preferably a rod-shaped compound.
(円盤状化合物)
 円盤状化合物であるエポキシ化合物は、少なくとも部分的に円盤状構造を有する。
 円盤状構造は、少なくとも、脂環又は芳香族環を有する。特に、円盤状構造が、芳香族環を有する場合、円盤状化合物は、分子間のπ-π相互作用によるスタッキング構造の形成により柱状構造を形成しうる。
 円盤状構造として、具体的には、Angew.Chem.Int. Ed. 2012, 51, 7990-7993又は特開平7-306317号公報に記載のトリフェニレン構造、並びに、特開2007-2220号公報及び特開2010-244038号公報に記載の3置換ベンゼン構造等が挙げられる。
(Disc-shaped compound)
The epoxy compound, which is a disc-shaped compound, has a disc-shaped structure at least partially.
The disc-like structure has at least an alicyclic or aromatic ring. In particular, when the disk-shaped structure has an aromatic ring, the disk-shaped compound can form a columnar structure by forming a stacking structure by π-π interaction between molecules.
As a disk-shaped structure, specifically, Angew. Chem. Int. Ed. Examples thereof include the triphenylene structure described in 2012, 51, 7990-7793 or JP-A-7-306317, and the tri-substituted benzene structure described in JP-A-2007-2220 and JP-A-2010-244038.
 エポキシ化合物として円盤状化合物を用いれば、高い熱伝導性を示す熱伝導材料が得られる。その理由としては、棒状化合物が直線的(一次元的)にしか熱伝導できないのに対して、円盤状化合物は法線方向に平面的(二次元的)に熱伝導できるため、熱伝導パスが増え、熱伝導率が向上する、と考えられる。 If a disk-shaped compound is used as the epoxy compound, a heat conductive material showing high heat conductivity can be obtained. The reason is that the rod-shaped compound can conduct heat only linearly (one-dimensionally), whereas the disk-shaped compound can conduct heat planarly (two-dimensionally) in the normal direction, so that the heat conduction path is It is thought that the number will increase and the thermal conductivity will improve.
 上記円盤状化合物は、エポキシ基を3つ以上有するのが好ましい。3つ以上のエポキシ基を有する円盤状化合物を含む組成物の硬化物はガラス転移温度が高く、耐熱性が高い傾向がある。
 円盤状化合物が有するエポキシ基の数は、8以下が好ましく、6以下より好ましい。
The disk-shaped compound preferably has three or more epoxy groups. A cured product of a composition containing a disk-shaped compound having three or more epoxy groups tends to have a high glass transition temperature and high heat resistance.
The number of epoxy groups contained in the disk-shaped compound is preferably 8 or less, more preferably 6 or less.
 円盤状化合物の具体例としては、C. Destrade et al., Mol. Crysr. Liq. Cryst., vol. 71, page 111 (1981) ;日本化学会編、季刊化学総説、No.22、液晶の化学、第5章、第10章第2節(1994);B. Kohne et al., Angew. Chem. Soc. Chem. Comm., page 1794 (1985);J. Zhang et al., J. Am. Chem. Soc., vol. 116, page 2655 (1994)、及び特許第4592225号に記載されている化合物等において末端の少なくとも1つ(好ましくは3つ以上)をエポキシ基とした化合物が挙げられる。
 円盤状化合物としては、Angew.Chem.Int. Ed. 2012, 51, 7990-7993、及び特開平7-306317号公報に記載のトリフェニレン構造、並びに特開2007-2220号公報、及び、特開2010-244038号公報に記載の3置換ベンゼン構造において末端の少なくとも1つ(好ましくは3つ以上)をエポキシ基とした化合物等が挙げられる。
Specific examples of the disk-shaped compound include C.I. Destrade et al. , Mol. Crysr. Liq. Cryst. , Vol. 71, page 111 (1981); Chemical Society of Japan, Quarterly Review of Chemistry, No. 22, Liquid crystal chemistry, Chapter 5, Chapter 10, Section 2 (1994); B. Kohne et al. , Angew. Chem. Soc. Chem. Comm. , Page 1794 (1985); J. Mol. Zhang et al. , J. Am. Chem. Soc. , Vol. In the compounds described in 116, page 2655 (1994), and Japanese Patent No. 4592225, compounds having at least one end (preferably three or more) as an epoxy group can be mentioned.
Examples of the disk-shaped compound include Angew. Chem. Int. Ed. The triphenylene structure described in 2012, 51, 7990-7793, and JP-A-7-306317, and the trisubstituted benzene structure described in JP-A-2007-2220 and JP-A-2010-240383 are terminal. Examples thereof include compounds having at least one (preferably three or more) epoxy groups.
 円盤状化合物としては、熱伝導材料の熱伝導性がより優れる観点から、以下に示す式(D1)~(D16)のいずれかで表される化合物が好ましい。
 まず、式(D1)~(D15)について説明し、その後、式(D16)について説明する。
 なお、以下の式中、「-LQ」は「-L-Q」を表し、「QL-」は「Q-L-」を表す。
As the disk-shaped compound, a compound represented by any of the following formulas (D1) to (D16) is preferable from the viewpoint of better thermal conductivity of the heat conductive material.
First, the equations (D1) to (D15) will be described, and then the equation (D16) will be described.
In the following formula, "-LQ" represents "-L-Q" and "QL-" represents "QL-".
Figure JPOXMLDOC01-appb-C000023
Figure JPOXMLDOC01-appb-C000023
Figure JPOXMLDOC01-appb-C000024
Figure JPOXMLDOC01-appb-C000024
Figure JPOXMLDOC01-appb-C000025
Figure JPOXMLDOC01-appb-C000025
Figure JPOXMLDOC01-appb-C000026
Figure JPOXMLDOC01-appb-C000026
 式(D1)~(D15)中、Lは2価の連結基を表す。
 熱伝導材料の熱伝導性がより優れる観点から、Lは、それぞれ独立に、アルキレン基、アルケニレン基、アリーレン基、-CO-、-NH-、-O-、-S-、及び、これらの組み合わせからなる群から選ばれる基であるのが好ましく、アルキレン基、アルケニレン基、アリーレン基、-CO-、-NH-、-O-、及び、-S-からなる群から選ばれる基を2個以上組み合わせた基であるのがより好ましい。
 上記アルキレン基の炭素数は、1~12が好ましい。上記アルケニレン基の炭素数は、2~12が好ましい。上記アリーレン基の炭素数は、10以下が好ましい。
 アルキレン基、アルケニレン基、及び、アリーレン基は、置換基(好ましくは、アルキル基、ハロゲン原子、シアノ、アルコキシ基、及び、アシルオキシ基等)を有していてもよい。
In the formulas (D1) to (D15), L represents a divalent linking group.
From the viewpoint of better thermal conductivity of the heat conductive material, L is independently an alkylene group, an alkaneylene group, an arylene group, -CO-, -NH-, -O-, -S-, and a combination thereof. It is preferable that the group is selected from the group consisting of alkylene group, alkenylene group, arylene group, and two or more groups selected from the group consisting of -CO-, -NH-, -O-, and -S-. More preferably, it is a combined group.
The alkylene group preferably has 1 to 12 carbon atoms. The number of carbon atoms of the alkenylene group is preferably 2 to 12. The arylene group preferably has 10 or less carbon atoms.
The alkylene group, alkenylene group, and arylene group may have a substituent (preferably an alkyl group, a halogen atom, a cyano, an alkoxy group, an acyloxy group, etc.).
 Lの例を以下に示す。以下の例では、左側の結合手が式(D1)~(D15)のいずれかで表される化合物の中心構造(以下、単に「中心環」ともいう)に結合し、右側の結合手がQに結合する。
 ALはアルキレン基又はアルケニレン基を意味し、ARはアリーレン基を意味する。
An example of L is shown below. In the following example, the bond on the left side binds to the central structure of the compound represented by any of the formulas (D1) to (D15) (hereinafter, also simply referred to as "central ring"), and the bond on the right side is Q. Combine to.
AL means an alkylene group or an alkenylene group, and AR means an arylene group.
L101:-AL-CO-O-AL-
L102:-AL-CO-O-AL-O-
L103:-AL-CO-O-AL-O-AL-
L104:-AL-CO-O-AL-O-CO-
L105:-CO-AR-O-AL-
L106:-CO-AR-O-AL-O-
L107:-CO-AR-O-AL-O-CO-
L108:-CO-NH-AL-
L109:-NH-AL-O-
L110:-NH-AL-O-CO-
L111:-O-AL-
L112:-O-AL-O-
L113:-O-AL-O-CO-
L101: -AL-CO-O-AL-
L102: -AL-CO-O-AL-O-
L103: -AL-CO-O-AL-O-AL-
L104: -AL-CO-O-AL-O-CO-
L105: -CO-AR-O-AL-
L106: -CO-AR-O-AL-O-
L107: -CO-AR-O-AL-O-CO-
L108: -CO-NH-AL-
L109: -NH-AL-O-
L110: -NH-AL-O-CO-
L111: -O-AL-
L112: -O-AL-O-
L113: -O-AL-O-CO-
L114:-O-AL-O-CO-NH-AL-
L115:-O-AL-S-AL-
L116:-O-CO-AL-AR-O-AL-O-CO-
L117:-O-CO-AR-O-AL-CO-
L118:-O-CO-AR-O-AL-O-CO-
L119:-O-CO-AR-O-AL-O-AL-O-CO-
L120:-O-CO-AR-O-AL-O-AL-O-AL-O-CO-
L121:-S-AL-
L122:-S-AL-O-
L123:-S-AL-O-CO-
L124:-S-AL-S-AL-
L125:-S-AR-AL-
L126:-O-CO-AL-
L127:-O-CO-AL-O-
L128:-O-CO-AR-O-AL-
L129:-O-CO-
L130:-O-CO-AR-O-AL-O-CO-AL-S-AR-
L131:-O-CO-AL-S-AR-
L132:-O-CO-AR-O-AL-O-CO-AL-S-AL-
L133:-O-CO-AL-S-AR-
L134:-O-AL-S-AR-
L135:-AL-CO-O-AL-O-CO-AL-S-AR-
L136:-AL-CO-O-AL-O-CO-AL-S-AL-
L137:-O-AL-O-AR-
L138:-O-AL-O-CO-AR-
L139:-O-AL-NH-AR-
L140:-O-CO-AL-O-AR-
L141:-O-CO-AR-O-AL-O-AR-
L142:-AL-CO-O-AR-
L143:-AL-CO-O-AL-O-AR-
L114: -O-AL-O-CO-NH-AL-
L115: -O-AL-S-AL-
L116: -O-CO-AL-AR-O-AL-O-CO-
L117: -O-CO-AR-O-AL-CO-
L118: -O-CO-AR-O-AL-O-CO-
L119: -O-CO-AR-O-AL-O-AL-O-CO-
L120: -O-CO-AR-O-AL-O-AL-O-AL-O-CO-
L121: -S-AL-
L122: -S-AL-O-
L123: -S-AL-O-CO-
L124: -S-AL-S-AL-
L125: -S-AR-AL-
L126: -O-CO-AL-
L127: -O-CO-AL-O-
L128: -O-CO-AR-O-AL-
L129: -O-CO-
L130: -O-CO-AR-O-AL-O-CO-AL-S-AR-
L131: -O-CO-AL-S-AR-
L132: -O-CO-AR-O-AL-O-CO-AL-S-AL-
L133: -O-CO-AL-S-AR-
L134: -O-AL-S-AR-
L135: -AL-CO-O-AL-O-CO-AL-S-AR-
L136: -AL-CO-O-AL-O-CO-AL-S-AL-
L137: -O-AL-O-AR-
L138: -O-AL-O-CO-AR-
L139: -O-AL-NH-AR-
L140: -O-CO-AL-O-AR-
L141: -O-CO-AR-O-AL-O-AR-
L142: -AL-CO-O-AR-
L143: -AL-CO-O-AL-O-AR-
 式(D1)~(D15)中、Qは、それぞれ独立に、水素原子又は置換基を表す。
 置換基としては、上述した置換基群Yで例示される基が挙げられる。より具体的には、置換基としては、上記反応性官能基、ハロゲン原子、イソシアネート基、シアノ基、不飽和重合性基、エポキシ基、オキセタニル基、アジリジニル基、チオイソシアネート基、アルデヒド基、及び、スルホ基が挙げられる。
 ただし、Qがエポキシ基以外の基である場合、Qはエポキシ基に対して安定であるのが好ましい。
 なお、式(D1)~(D15)中、1つ以上(好ましくは2つ以上)のQは、エポキシ基を表す。中でも、熱伝導材料の熱伝導性がより優れる観点から、すべてのQがエポキシ基を表すのが好ましい。
 なお、式(D1)~(D15)で表される化合物は、エポキシ基の安定性の点からは、-NH-を有さないのが好ましい。
In the formulas (D1) to (D15), Q independently represents a hydrogen atom or a substituent.
Examples of the substituent include the groups exemplified in the above-mentioned substituent group Y. More specifically, as the substituent, the above-mentioned reactive functional group, halogen atom, isocyanate group, cyano group, unsaturated polymerizable group, epoxy group, oxetanyl group, aziridinyl group, thioisocyanate group, aldehyde group, and Examples include sulfo groups.
However, when Q is a group other than the epoxy group, it is preferable that Q is stable with respect to the epoxy group.
In the formulas (D1) to (D15), one or more (preferably two or more) Qs represent an epoxy group. Above all, from the viewpoint of better thermal conductivity of the heat conductive material, it is preferable that all Qs represent epoxy groups.
The compounds represented by the formulas (D1) to (D15) preferably do not have -NH- from the viewpoint of the stability of the epoxy group.
 式(D1)~(D15)で表される化合物の中でも、熱伝導材料の熱伝導性がより優れる観点から、式(D4)で表される化合物が好ましい。言い換えると、円盤状化合物の中心環はトリフェニレン環であるのが好ましい。
 式(D4)で表される化合物としては、熱伝導材料の熱伝導性がより優れる観点から、式(XI)で表される化合物が好ましい。
Among the compounds represented by the formulas (D1) to (D15), the compound represented by the formula (D4) is preferable from the viewpoint of more excellent thermal conductivity of the heat conductive material. In other words, the central ring of the disc-shaped compound is preferably a triphenylene ring.
As the compound represented by the formula (D4), the compound represented by the formula (XI) is preferable from the viewpoint of more excellent thermal conductivity of the heat conductive material.
Figure JPOXMLDOC01-appb-C000027
Figure JPOXMLDOC01-appb-C000027
 式(XI)中、R11、R12、R13、R14、R15、及び、R16は、それぞれ独立に、*-X11-L11-P11、又は、*-X12-L12-Y12を表す。
 なお、*はトリフェニレン環との結合位置を表す。
 R11、R12、R13、R14、R15、及び、R16のうち、2個以上は、*-X11-L11-P11であり、3個以上が*-X11-L11-P11であるのが好ましい。
 中でも、熱伝導材料の熱伝導性がより優れる観点から、R11及びR12のいずれか1個以上、R13及びR14のいずれか1個以上、並びに、R15及びR16のいずれか1個以上が、*-X11-L11-P11であるのが好ましい。
 R11、R12、R13、R14、R15、及び、R16が、全て、*-X11-L11-P11であるのがより好ましい。加えて、R11、R12、R13、R14、R15、及び、R16が、全て同一であるのが更に好ましい。
In formula (XI), R 11 , R 12 , R 13 , R 14 , R 15 , and R 16 are independently * -X 11- L 11- P 11 or * -X 12- L, respectively. 12- Y Represents 12.
Note that * represents the bonding position with the triphenylene ring.
R 11, R 12, R 13 , R 14, R 15 and, among the R 16, two or more may, * - X 11 is -L 11 -P 11, 3 or more is * -X 11 -L 11 is preferably -P 11.
Among them, from the viewpoint of better thermal conductivity of the heat conductive material, one or more of R 11 and R 12 , one or more of R 13 and R 14 , and any one of R 15 and R 16. It is preferable that the number is * -X 11- L 11- P 11.
It is more preferable that R 11 , R 12 , R 13 , R 14 , R 15 , and R 16 are all * -X 11- L 11- P 11. In addition, it is more preferred that R 11 , R 12 , R 13 , R 14 , R 15 and R 16 are all the same.
 X11は、それぞれ独立に、単結合、-O-、-CO-、-NH-、-O-CO-、-O-CO-O-、-O-CO-NH-、-O-CO-S-、-CO-O-、-CO-NH-、-CO-S-、-NH-CO-、-NH-CO-O-、-NH-CO-NH-、-NH-CO-S-、-S-、-S-CO-、-S-CO-O-、-S-CO-NH-、又は、-S-CO-S-を表す。
 中でも、X11は、それぞれ独立に、-O-、-O-CO-、-O-CO-O-、-O-CO-NH-、-CO-O-、-CO-NH-、-NH-CO-、又は、-NH-CO-O-が好ましく、-O-、-O-CO-、-CO-O-、-O-CO-NH-、又は、-CO-NH-がより好ましく、-O-CO-又は-CO-O-が更に好ましい。
X 11 is independently single-bonded, -O-, -CO-, -NH-, -O-CO-, -O-CO-O-, -O-CO-NH-, -O-CO-. S-, -CO-O-, -CO-NH-, -CO-S-, -NH-CO-, -NH-CO-O-, -NH-CO-NH-, -NH-CO-S- , -S-, -S-CO-, -S-CO-O-, -S-CO-NH-, or -S-CO-S-.
Among them, X 11 independently have -O-, -O-CO-, -O-CO-O-, -O-CO-NH-, -CO-O-, -CO-NH-, and -NH. -CO- or -NH-CO-O- is preferable, and -O-, -O-CO-, -CO-O-, -O-CO-NH-, or -CO-NH- is more preferable. , -O-CO- or -CO-O- is even more preferred.
 L11は、それぞれ独立に、単結合又は2価の連結基を表す。
 2価の連結基の例としては、-O-、-O-CO-、-CO-O-、-S-、-NH-、アルキレン基(炭素数は、1~10が好ましく、1~8がより好ましく、1~7が更に好ましい。)、アリーレン基(炭素数は、6~20が好ましく、6~14がより好ましく、6~10が更に好ましい。)、又は、これらの組み合わせからなる基が挙げられる。
 上記アルキレン基としては、メチレン基、エチレン基、プロピレン基、ブチレン基、ペンチレン基、ヘキシレン基、及び、ヘプチレン基が挙げられる。
 上記アリーレン基としては、1,4-フェニレン基、1,3-フェニレン基、1,4-ナフチレン基、1,5-ナフチレン基、及び、アントラセニレン基が挙げられ、1,4-フェニレン基が好ましい。
L 11 independently represents a single bond or a divalent linking group.
Examples of divalent linking groups include -O-, -O-CO-, -CO-O-, -S-, -NH-, and alkylene groups (preferably 1 to 10 carbon atoms, 1 to 8 carbon atoms). Is more preferable, 1 to 7 is more preferable), an arylene group (the number of carbon atoms is preferably 6 to 20, more preferably 6 to 14, and even more preferably 6 to 10), or a group consisting of a combination thereof. Can be mentioned.
Examples of the alkylene group include a methylene group, an ethylene group, a propylene group, a butylene group, a pentylene group, a hexylene group, and a heptylene group.
Examples of the arylene group include a 1,4-phenylene group, a 1,3-phenylene group, a 1,4-naphthylene group, a 1,5-naphthylene group, and an anthrasenylene group, and a 1,4-phenylene group is preferable. ..
 上記アルキレン基及び上記アリーレン基はそれぞれ置換基を有していてもよい。置換基の数は、1~3が好ましく、1がより好ましい。置換基の置換位置は特に制限されない。置換基としては、ハロゲン原子又は炭素数1~3のアルキル基が好ましく、メチル基がより好ましい。
 上記アルキレン基及び上記アリーレン基は無置換であるのも好ましい。中でも、アルキレン基は無置換であるのが好ましい。
The alkylene group and the arylene group may each have a substituent. The number of substituents is preferably 1 to 3, more preferably 1. The substitution position of the substituent is not particularly limited. As the substituent, a halogen atom or an alkyl group having 1 to 3 carbon atoms is preferable, and a methyl group is more preferable.
It is also preferable that the alkylene group and the arylene group are unsubstituted. Of these, the alkylene group is preferably unsubstituted.
 -X11-L11-の例として、上述のLの例であるL101~L143が挙げられる。 Examples of −X 11 − L 11 − include L101 to L143, which are examples of L described above.
 P11は、エポキシ基を表す。上記エポキシ基は置換基を有していてもよく、有していなくてもよい。 P 11 represents an epoxy group. The epoxy group may or may not have a substituent.
 X12は、X11と同様であり、好適な条件も同様である。
 L12は、L11と同様であり、好適な条件も同様である。
 -X12-L12-の例として、上述のLの例であるL101~L143が挙げられる。
X 12 is the same as X 11 , and the preferred conditions are also the same.
L 12 is the same as L 11 , and the preferred conditions are also the same.
Examples of −X 12 − L 12 − include L101 to L143, which are examples of L described above.
 Y12は、水素原子、炭素数1~20の直鎖状、分岐鎖状、若しくは、環状のアルキル基、又は、炭素数1~20の直鎖状、分岐鎖状、若しくは、環状のアルキル基において1個又は2個以上のメチレン基が-O-、-S-、-NH-、-N(CH)-、-CO-、-O-CO-、又は-CO-O-で置換された基を表す。
 Y12が、炭素数1~20の直鎖状、分岐鎖状、若しくは、環状のアルキル基、又は、炭素数1~20の直鎖状、分岐鎖状、若しくは、環状のアルキル基において1個又は2個以上のメチレン基が-O-、-S-、-NH-、-N(CH)-、-CO-、-O-CO-、又は-CO-O-で置換された基の場合、Y12に含まれる水素原子の1個以上がハロゲン原子で置換されていてもよい。
Y 12 is a hydrogen atom, a linear, branched or cyclic alkyl group having 1 to 20 carbon atoms, or a linear, branched or cyclic alkyl group having 1 to 20 carbon atoms. In, one or more methylene groups are substituted with -O-, -S-, -NH-, -N (CH 3 )-, -CO-, -O-CO-, or -CO-O-. Represents a group.
One Y 12 is a linear, branched or cyclic alkyl group having 1 to 20 carbon atoms, or a linear, branched or cyclic alkyl group having 1 to 20 carbon atoms. Or a group in which two or more methylene groups are substituted with -O-, -S-, -NH-, -N (CH 3 )-, -CO-, -O-CO-, or -CO-O-. In this case, one or more hydrogen atoms contained in Y 12 may be substituted with a halogen atom.
 式(XI)で表される化合物の具体例については、特開平7-281028号公報の段落番号0028~0036、特開平7-306317号公報、特開2005-156822号公報の段落番号0016~0018、特開2006-301614号公報の段落番号0067~0072、及び、液晶便覧(平成12年丸善株式会社発刊)330頁~333頁に記載の化合物において、末端の少なくとも1つ(好ましくは3つ以上)をエポキシ基とした化合物が挙げられる。 For specific examples of the compound represented by the formula (XI), paragraph numbers 0028 to 0036 of JP-A-7-281028, paragraph numbers 0016 to 0018 of JP-A-7-306317 and JP-A-2005-156822 are provided. , JP-A-2006-301614, paragraph numbers 0067 to 0072, and LCD Handbook (published by Maruzen Co., Ltd., 2000), pages 330 to 333, at least one at the end (preferably three or more). ) As an epoxy group.
 式(XI)で表される化合物は、特開平7-306317号公報、特開平7-281028号公報、特開2005-156822号公報、及び、特開2006-301614号公報に記載の方法に準じて合成できる。 The compound represented by the formula (XI) conforms to the methods described in JP-A-7-306317, JP-A-7-281028, JP-A-2005-156822, and JP-A-2006-301614. Can be synthesized.
 また、熱伝導材料の熱伝導性がより優れる観点から、円盤状化合物として、式(D16)で表される化合物も好ましい。 Further, from the viewpoint of better thermal conductivity of the heat conductive material, the compound represented by the formula (D16) is also preferable as the disk-shaped compound.
Figure JPOXMLDOC01-appb-C000028
Figure JPOXMLDOC01-appb-C000028
 式(D16)中、A2X、A3X、及び、A4Xは、それぞれ独立に、-CH=又は-N=を表す。中でも、A2X、A3X、及び、A4Xは、それぞれ独立に、-CH=が好ましい。
 R17X、R18X、及び、R19Xは、それぞれ独立に、*-X211X-(Z21X-X212Xn21X-L21X-Qを表す。*は、中心環との結合位置を表す。
 X211X及びX212Xは、それぞれ独立に、単結合、-O-、-CO-、-NH-、-O-CO-、-O-CO-O-、-O-CO-NH-、-O-CO-S-、-CO-O-、-CO-NH-、-CO-S-、-NH-CO-、-NH-CO-O-、-NH-CO-NH-、-NH-CO-S-、-S-、-S-CO-、-S-CO-O-、-S-CO-NH-、又は、-S-CO-S-を表す。
 Z21Xは、それぞれ独立に、5員環若しくは6員環の芳香族環基、又は、5員環若しくは6員環の非芳香族環基を表す。
 L21Xは、単結合又は2価の連結基を表す。
 Qは、式(D1)~(D15)におけるQと同義であり、好ましい条件も同様である。式(D16)中、複数存在するQのうち、少なくとも1つ(好ましくは全部)のQは、エポキシ基を表す。
 n21Xは、0~3の整数を表す。n21Xが2以上の場合、複数存在する(Z21X-X212X)は、同一でも異なっていてもよい。
 ただし、式(D16)で表される化合物は、エポキシ基の安定性の点からは、-NH-を有さないのが好ましい。
In formula (D16), A 2X , A 3X , and A 4X each independently represent −CH = or −N =. Among them, -CH = is preferable for A 2X , A 3X , and A 4X independently.
R 17X, R 18X, and, R 19X are each independently, * represents - (Z 21X -X 212X) n21X -L 21X -Q - X 211X. * Represents the position of connection with the central ring.
X 211X and X 212X are independently single-bonded, -O-, -CO-, -NH-, -O-CO-, -O-CO-O-, -O-CO-NH-, -O. -CO-S-, -CO-O-, -CO-NH-, -CO-S-, -NH-CO-, -NH-CO-O-, -NH-CO-NH-, -NH-CO Represents —S—, —S—, —S—CO—, —S—CO—O—, —S—CO—NH—, or —S—CO—S—.
Z 21X independently represents a 5-membered or 6-membered aromatic ring group or a 5-membered or 6-membered non-aromatic ring group.
L 21X represents a single bond or a divalent linking group.
Q is synonymous with Q in the formulas (D1) to (D15), and the preferred conditions are also the same. In the formula (D16), at least one (preferably all) Q among the plurality of Qs present represents an epoxy group.
n21X represents an integer of 0 to 3. When n21X is 2 or more, a plurality of (Z 21X- X 212X ) may be the same or different.
However, the compound represented by the formula (D16) preferably does not have -NH- from the viewpoint of the stability of the epoxy group.
 式(D16)で表される化合物としては、式(XII)で表される化合物が好ましい。 As the compound represented by the formula (D16), the compound represented by the formula (XII) is preferable.
Figure JPOXMLDOC01-appb-C000029
Figure JPOXMLDOC01-appb-C000029
 式(XII)中、A、A、及び、Aは、それぞれ独立に、-CH=又は-N=を表す。中でも、A、A、及び、Aは、-CH=が好ましい。言い換えると、円盤状化合物の中心環はベンゼン環であるのも好ましい。 In formula (XII), A 2 , A 3 , and A 4 independently represent -CH = or -N =, respectively. Among them, -CH = is preferable for A 2 , A 3 and A 4. In other words, it is also preferable that the central ring of the disk-shaped compound is a benzene ring.
 R17、R18、及び、R19は、それぞれ独立に、*-X211-(Z21-X212n21-L21-P21、又は、*-X221-(Z22-X222n22-Y22を表す。*は中心環との結合位置を表す。
 R17、R18、及び、R19のうち2個以上は、*-X211-(Z21-X212n21-L21-P21である。熱伝導材料の熱伝導性がより優れる観点から、R17、R18、及び、R19は全てが、*-X211-(Z21-X212n21-L21-P21であるのが好ましい。
 加えて、R17、R18、及び、R19が、全て同一であるのが好ましい。
R 17, R 18, and, R 19 are each independently, * - X 211 - (Z 21 -X 212) n21 -L 21 -P 21, or, * - X 221 - (Z 22 -X 222) representing the n22 -Y 22. * Represents the position of connection with the central ring.
R 17, R 18 and two or more of R 19 is, * - X 211 - a (Z 21 -X 212) n21 -L 21 -P 21. From the viewpoint of thermal conductivity of the thermally conductive material is more excellent, R 17, R 18, and all R 19 has, * - X 211 - and even a (Z 21 -X 212) n21 -L 21 -P 21 preferable.
In addition, it is preferable that R 17 , R 18 , and R 19 are all the same.
 X211、X212、X221、及び、X222は、それぞれ独立に、単結合、-O-、-CO-、-NH-、-O-CO-、-O-CO-O-、-O-CO-NH-、-O-CO-S-、-CO-O-、-CO-NH-、-CO-S-、-NH-CO-、-NH-CO-O-、-NH-CO-NH-、-NH-CO-S-、-S-、-S-CO-、-S-CO-O-、-S-CO-NH-、又は、-S-CO-S-を表す。
 中でも、X211、X212、X221、及び、X222としては、それぞれ独立に、単結合、-O-、-CO-O-、又は、-O-CO-が好ましい。
X 211 , X 212 , X 221 and X 222 are independently single-bonded, -O-, -CO-, -NH-, -O-CO-, -O-CO-O-, -O, respectively. -CO-NH-, -O-CO-S-, -CO-O-, -CO-NH-, -CO-S-, -NH-CO-, -NH-CO-O-, -NH-CO Represents -NH-, -NH-CO-S-, -S-, -S-CO-, -S-CO-O-, -S-CO-NH-, or -S-CO-S-.
Among them, as X 211 , X 212 , X 221 and X 222 , single bonds, —O—, —CO—O—, or —O—CO— are preferable, respectively.
 Z21及びZ22は、それぞれ独立に、5員環若しくは6員環の芳香族環基、又は、5員環若しくは6員環の非芳香族環基を表し、例えば、1,4-フェニレン基、1,3-フェニレン基、及び、芳香族複素環基が挙げられる。 Z 21 and Z 22 independently represent a 5-membered or 6-membered aromatic ring group or a 5-membered or 6-membered non-aromatic ring group, for example, a 1,4-phenylene group. , 1,3-Phenylene group, and aromatic heterocyclic group.
 上記芳香族環基及び上記非芳香族環基は、置換基を有していてもよい。置換基の数は1又は2が好ましく、1がより好ましい。置換基の置換位置は、特に制限されない。置換基としては、ハロゲン原子又はメチル基が好ましい。上記芳香族環基及び上記非芳香族環基は無置換であるのも好ましい。 The aromatic ring group and the non-aromatic ring group may have a substituent. The number of substituents is preferably 1 or 2, more preferably 1. The substitution position of the substituent is not particularly limited. As the substituent, a halogen atom or a methyl group is preferable. It is also preferable that the aromatic ring group and the non-aromatic ring group are unsubstituted.
 芳香族複素環基としては、例えば、以下の芳香族複素環基が挙げられる。
Figure JPOXMLDOC01-appb-C000030
Examples of the aromatic heterocyclic group include the following aromatic heterocyclic groups.
Figure JPOXMLDOC01-appb-C000030
 式中、*はX211又はX221に結合する部位を表す。**はX212又はX222に結合する部位を表す。A41及びA42は、それぞれ独立に、メチン基又は窒素原子を表す。Xは、酸素原子、硫黄原子、又は、イミノ基を表す。
 A41及びA42は、少なくとも一方が窒素原子であるのが好ましく、両方が窒素原子であるのがより好ましい。また、Xは、酸素原子であるのが好ましい。
In the formula, * represents a site that binds to X 211 or X 221. ** represents a site that binds to X 212 or X 222. A 41 and A 42 each independently represent a methine group or a nitrogen atom. X 4 represents an oxygen atom, a sulfur atom or an imino group.
It is preferable that at least one of A 41 and A 42 is a nitrogen atom, and it is more preferable that both are nitrogen atoms. Further, X 4 is preferably an oxygen atom.
 後述するn21及びn22が2以上の場合、複数存在する(Z21-X212)及び(Z22-X222)は、それぞれ同一でも異なっていてもよい。 When n21 and n22, which will be described later, are two or more, a plurality of (Z 21- X 212 ) and (Z 22- X 222 ) may be the same or different from each other.
 L21は、それぞれ独立に、単結合又は2価の連結基を表し、上述した式(XI)におけるL11と同義である。L21としては、-O-、-O-CO-、-CO-O-、-S-、-NH-、アルキレン基(炭素数は、1~10が好ましく、1~8がより好ましく、1~7が更に好ましい。)、アリーレン基(炭素数は、6~20が好ましく、6~14がより好ましく、6~10が更に好ましい。)、又は、これらの組み合わせからなる基が好ましい。 L 21 independently represents a single bond or a divalent linking group, and is synonymous with L 11 in the above formula (XI). Examples of L 21 include -O-, -O-CO-, -CO-O-, -S-, -NH-, and an alkylene group (the number of carbon atoms is preferably 1 to 10 and more preferably 1 to 8). ~ 7 is more preferable), an arylene group (the number of carbon atoms is preferably 6 to 20, more preferably 6 to 14, and even more preferably 6 to 10), or a group composed of a combination thereof is preferable.
 後述するn22が1以上の場合において、-X212-L21-の例としては、上述の式(D1)~(D15)におけるLの例であるL101~L143が同様に挙げられる。 In the case described later n22 is 1 or more, -X 212 -L 21 - Examples of are examples of L in the above formula (D1) ~ (D15) L101 ~ L143 and the like as well.
 P21は、エポキシ基を表す。上記エポキシ基は置換基を有していてもよく、有していなくてもよい。 P 21 represents an epoxy group. The epoxy group may or may not have a substituent.
 Y22は、それぞれ独立に、水素原子、炭素数1~20の直鎖状、分岐鎖状、若しくは、環状のアルキル基、又は、炭素数1~20の直鎖状、分岐鎖状、若しくは、環状のアルキル基において1個又は2個以上のメチレン基が-O-、-S-、-NH-、-N(CH)-、-CO-、-O-CO-、又は、-CO-O-で置換された基を表し、一般式(XI)におけるY12と同義であり、好ましい範囲も同様である。 Y 22 is independently a hydrogen atom, a linear, branched or cyclic alkyl group having 1 to 20 carbon atoms, or a linear, branched or cyclically charged group having 1 to 20 carbon atoms. In the cyclic alkyl group, one or more methylene groups are -O-, -S-, -NH-, -N (CH 3 )-, -CO-, -O-CO-, or -CO-. represents radicals substituted by O-, has the same meaning as Y 12 in the general formula (XI), preferred ranges are also the same.
 n21及びn22はそれぞれ独立に、0~3の整数を表し、熱伝導性がより優れる観点から、1~3の整数が好ましく、2~3がより好ましい。 N21 and n22 each independently represent an integer of 0 to 3, and from the viewpoint of better thermal conductivity, an integer of 1 to 3 is preferable, and an integer of 2 to 3 is more preferable.
 円盤状化合物の好ましい例としては、以下の化合物が挙げられる。 Preferred examples of the disk-shaped compound include the following compounds.
Figure JPOXMLDOC01-appb-C000031
Figure JPOXMLDOC01-appb-C000031
Figure JPOXMLDOC01-appb-C000032
Figure JPOXMLDOC01-appb-C000032
Figure JPOXMLDOC01-appb-C000033

Figure JPOXMLDOC01-appb-I000034
Figure JPOXMLDOC01-appb-I000035
Figure JPOXMLDOC01-appb-C000033

Figure JPOXMLDOC01-appb-I000034
Figure JPOXMLDOC01-appb-I000035
Figure JPOXMLDOC01-appb-C000036
Figure JPOXMLDOC01-appb-I000037
Figure JPOXMLDOC01-appb-I000038
Figure JPOXMLDOC01-appb-C000036
Figure JPOXMLDOC01-appb-I000037
Figure JPOXMLDOC01-appb-I000038
Figure JPOXMLDOC01-appb-C000039
Figure JPOXMLDOC01-appb-I000040
Figure JPOXMLDOC01-appb-I000041
Figure JPOXMLDOC01-appb-C000039
Figure JPOXMLDOC01-appb-I000040
Figure JPOXMLDOC01-appb-I000041
Figure JPOXMLDOC01-appb-C000042

Figure JPOXMLDOC01-appb-I000043

Figure JPOXMLDOC01-appb-I000044
Figure JPOXMLDOC01-appb-C000042

Figure JPOXMLDOC01-appb-I000043

Figure JPOXMLDOC01-appb-I000044
 なお、下記構造式中、Rは、-X212-L21-P21を表す。 In the following structural formula, R represents −X 212 −L 21 −P 21 .
Figure JPOXMLDOC01-appb-C000045
Figure JPOXMLDOC01-appb-C000045
 式(XII)で表される化合物の詳細、及び具体例については、特開2010-244038号公報の段落0013~0077に記載の化合物において、末端の少なくとも1つ(好ましくは3つ以上)をエポキシ基とした化合物を参照でき、その内容は本明細書に組み込まれる。 For details and specific examples of the compound represented by the formula (XII), in the compounds described in paragraphs 0013 to 0077 of JP-A-2010-244033, at least one (preferably three or more) ends are epoxy. References can be made to the compound on which it is based, the contents of which are incorporated herein by reference.
 式(XII)で表される化合物は、特開2010-244038号公報、特開2006-76992号公報、及び、特開2007-2220号公報に記載の方法に準じて合成できる。 The compound represented by the formula (XII) can be synthesized according to the methods described in JP-A-2010-244038, JP-A-2006-76992, and JP-A-2007-2220.
 なお、電子密度を減らしてスタッキングを強くし、カラム状集合体を形成しやすくなるという観点から、円盤状化合物は水素結合性官能基を有する化合物であるのも好ましい。水素結合性官能基としては、-O-CO-NH-、-CO-NH-、-NH-CO-、-NH-CO-O-、-NH-CO-NH-、-NH-CO-S-、又は、-S-CO-NH-等が挙げられる。 The disk-shaped compound is preferably a compound having a hydrogen-bonding functional group from the viewpoint of reducing the electron density, strengthening the stacking, and facilitating the formation of a columnar aggregate. Hydrogen-bonding functional groups include -O-CO-NH-, -CO-NH-, -NH-CO-, -NH-CO-O-, -NH-CO-NH-, and -NH-CO-S. -Or-S-CO-NH- and the like can be mentioned.
(その他のエポキシ化合物)
 上述のエポキシ化合物以外の、その他のエポキシ化合物としては、例えば、一般式(DN)で表されるエポキシ化合物が挙げられる。
(Other epoxy compounds)
Examples of other epoxy compounds other than the above-mentioned epoxy compounds include epoxy compounds represented by the general formula (DN).
Figure JPOXMLDOC01-appb-C000046
Figure JPOXMLDOC01-appb-C000046
 一般式(DN)中、nDNは、0以上の整数を表し、0~5が好ましく、1がより好ましい。
 RDNは、単結合又は2価の連結基を表す。2価の連結基としては、-O-、-O-CO-、-CO-O-、-S-、アルキレン基(炭素数は、1~10が好ましい。)、アリーレン基(炭素数は、6~20が好ましい。)、又は、これらの組み合わせからなる基が好ましく、アルキレン基がより好ましく、メチレン基が更に好ましい。
In the general formula (DN), nDN represents an integer of 0 or more, preferably 0 to 5, and more preferably 1.
RDN represents a single bond or a divalent linking group. The divalent linking group includes -O-, -O-CO-, -CO-O-, -S-, an alkylene group (preferably 1 to 10 carbon atoms), and an arylene group (the carbon number is preferably 1 to 10). 6 to 20 is preferable), or a group composed of a combination thereof is preferable, an alkylene group is more preferable, and a methylene group is further preferable.
 その他の多官能エポキシ化合物としては、一般式(E1)で表されるエポキシ化合物も挙げられる。
 (V-)4-UC(-W)    (E1)
Examples of other polyfunctional epoxy compounds include epoxy compounds represented by the general formula (E1).
(V-) 4- UC (-W) U (E1)
 一般式(E1)中、Cは、炭素原子を表す。 In the general formula (E1), C represents a carbon atom.
 一般式(E1)中、Uは、3又は4の整数を表す。
 一般式(E1)中において、Vの数を示す「4-U」中の「U」と、Wの数を示す「U」とは同じ値を示す。つまり、一般式(E1)は、「V-C(-W)」又は「C(-W)」である。
In the general formula (E1), U represents an integer of 3 or 4.
In the general formula (E1), "U" in "4-U" indicating the number of V and "U" indicating the number of W show the same value. That is, the general formula (E1) is "VC (-W) 3 " or "C (-W) 4 ".
 一般式(E1)中、Vは、水素原子又はエポキシ基を有さない置換基を表す。
 上記エポキシ基を有さない置換基は、エポキシ基以外の置換基であり、かつ、置換基の一部分としてもエポキシ基を含むことがない置換基である。
 上記エポキシ基を有さない置換基としては、例えば、置換基群Yから選択される基であって、エポキシ基及びエポキシ基を一部分に含む基を除いた基が挙げられる。
 上記エポキシ基を有さない置換基は、アルキル基が好ましく、直鎖状又は分岐鎖状のアルキル基がより好ましい。上記アルキル基は、炭素数1~5が好ましい。
In the general formula (E1), V represents a substituent having no hydrogen atom or epoxy group.
The above-mentioned substituent having no epoxy group is a substituent other than the epoxy group and does not contain an epoxy group as a part of the substituent.
Examples of the substituent having no epoxy group include a group selected from the substituent group Y, excluding an epoxy group and a group containing an epoxy group as a part.
The substituent having no epoxy group is preferably an alkyl group, and more preferably a linear or branched alkyl group. The alkyl group preferably has 1 to 5 carbon atoms.
 一般式(E1)中、Wは、エポキシ含有基を表す。
 エポキシ含有基は、エポキシ基そのものである基、又は、エポキシ基を一部分に含む一価の基である。
 上記エポキシ基を一部分に含む一価の基は、基全体の中にエポキシ基を1個以上(好ましくは1~8個)有する基である。
 上記エポキシ基を一部分に含む一価の基は、「-(2価の炭化水素基)M1-(-O-2価の炭化水素基-)M2-エポキシ基」で表される基が好ましい。上記基において、M1は、0又は1を表す。M2は、1以上(好ましくは1~10)の整数を表す。上記基における2価の炭化水素基としては、例えば、アルキレン基(好ましくは炭素数1~6)、アルケニレン基(-CH=CH-等。好ましくは炭素数2~6)、アルキニレン基(-C≡C-等。好ましくは炭素数2~6)、アリーレン基(フェニレン基等。好ましくは炭素数6~15)、及び、これらを組み合わせた基が挙げられる。上記2価の炭化水素基は置換基を有していても有していなくてもよく、上記2価の炭化水素基が置換基として更にエポキシ含有基を有してもよい。複数存在してもよい上記2価の炭化水素基は、それぞれ同一でも異なっていてもよい。
 一般式(E1)中に複数存在するWは、それぞれ同一でも異なっていてもよい。
In the general formula (E1), W represents an epoxy-containing group.
The epoxy-containing group is a group that is the epoxy group itself, or a monovalent group that contains an epoxy group as a part.
The monovalent group containing the epoxy group as a part is a group having one or more (preferably 1 to 8) epoxy groups in the whole group.
The monovalent group containing the epoxy group as a part is preferably a group represented by "-(divalent hydrocarbon group) M1- (-O-2-valent hydrocarbon group-) M2-epoxy group". In the above group, M1 represents 0 or 1. M2 represents an integer of 1 or more (preferably 1 to 10). Examples of the divalent hydrocarbon group in the above group include an alkylene group (preferably 1 to 6 carbon atoms), an alkenylene group (-CH = CH-, etc., preferably 2 to 6 carbon atoms) and an alkynylene group (-C). ≡C-etc., preferably 2 to 6 carbon atoms), an arylene group (such as a phenylene group, preferably 6 to 15 carbon atoms), and a group combining these. The divalent hydrocarbon group may or may not have a substituent, and the divalent hydrocarbon group may further have an epoxy-containing group as a substituent. The divalent hydrocarbon groups that may be present in a plurality thereof may be the same or different from each other.
A plurality of Ws existing in the general formula (E1) may be the same or different from each other.
 その他のエポキシ化合物としては、エポキシ基が、縮環している化合物も挙げられる。このような化合物としては、例えば、3,4:8,9-ジエポキシビシクロ[4.3.0]ノナン等が挙げられる。 Examples of other epoxy compounds include compounds in which the epoxy group is fused. Examples of such a compound include 3,4: 8,9-diepoxybicyclo [4.3.0] nonane and the like.
 その他のエポキシ化合物としては、他にも、例えば、ビスフェノールA、F、S、AD等のグリシジルエーテルであるビスフェノールA型エポキシ化合物、ビスフェノールF型エポキシ化合物、ビスフェノールS型エポキシ化合物、ビスフェノールAD型エポキシ化合物等;水素添加したビスフェノールA型エポキシ化合物、水素添加したビスフェノールAD型エポキシ化合物等;フェノールノボラック型のグリシジルエーテル(フェノールノボラック型エポキシ化合物)、クレゾールノボラック型のグリシジルエーテル(クレゾールノボラック型エポキシ化合物)、ビスフェノールAノボラック型のグリシジルエーテル等;ジシクロペンタジエン型のグリシジルエーテル(ジシクロペンタジエン型エポキシ化合物);ジヒドロキシペンタジエン型のグリシジルエーテル(ジヒドロキシペンタジエン型エポキシ化合物);ポリヒドロキシベンゼン型のグリシジルエーテル(ポリヒドロキシベンゼン型エポキシ化合物);ベンゼンポリカルボン酸型のグリシジルエステル(ベンゼンポリカルボン酸型エポキシ化合物);トリスフェノールメタン型エポキシ化合物;及び、フェノキシ樹脂等が挙げられる。上述の各化合物におけるグリシジルエーテル基及び/又はグリシジルエステル基の1個又は2個以上が、ジグリシジルアミノ基又はジグリシジルアミノアルキレン基(ジグリシジルアミノメチレン基等)に置き換わった化合物をエポキシ化合物として使用してもよい。
 上述の各化合物は、置換基を有していてもよい。例えば、上述の各化合物に含まれる芳香環基、シクロアルカン環基、及び/又は、アルキレン基などが、グリシジルエーテル基、グリシジルエステル基、ジグリシジルアミノ基、及び/又は、ジグリシジルアミノアルキレン基以外の置換基を有していてもよい。
Other epoxy compounds include, for example, bisphenol A type epoxy compounds, bisphenol F type epoxy compounds, bisphenol S type epoxy compounds, and bisphenol AD type epoxy compounds, which are glycidyl ethers such as bisphenol A, F, S, and AD. Etc .; hydrogenated bisphenol A type epoxy compound, hydrogenated bisphenol AD type epoxy compound, etc .; phenol novolac type glycidyl ether (phenol novolak type epoxy compound), cresol novolak type glycidyl ether (cresol novolak type epoxy compound), bisphenol A Novolak type glycidyl ether, etc .; Dicyclopentadiene type glycidyl ether (dicyclopentadiene type epoxy compound); Dihydroxypentadiene type glycidyl ether (dihydroxypentadiene type epoxy compound); Polyhydroxybenzene type glycidyl ether (polyhydroxybenzene type) Epoxy compound); benzenepolycarboxylic acid type glycidyl ester (benzenepolycarboxylic acid type epoxy compound); trisphenol methane type epoxy compound; and phenoxy resin. A compound in which one or more of the glycidyl ether group and / or the glycidyl ester group in each of the above compounds is replaced with a diglycidylamino group or a diglycidylaminoalkylene group (diglycidylaminomethylene group, etc.) is used as the epoxy compound. You may.
Each of the above compounds may have a substituent. For example, the aromatic ring group, cycloalkane ring group, and / or alkylene group contained in each of the above compounds is other than the glycidyl ether group, the glycidyl ester group, the diglycidyl amino group, and / or the diglycidyl aminoalkylene group. It may have a substituent of.
 組成物において実現されるべき各性能を考慮して使用するエポキシ化合物を決定するのが好ましい。
 例えば、エポキシ化合物が芳香環基(ベンゼン環等)を有する場合、熱伝導材料の熱伝導性がより優れる。
 柔軟な構造であるか成形性に優れるエポキシ化合物を使用する場合、組成物から形成される半硬化シートの保存安定性がより優れる。このようなエポキシ化合物としては、ビスフェノールF型エポキシ化合物、一般式(E1)で表されるエポキシ化合物、及び、ジグリシジルアミノ基を有するエポキシ化合物が挙げられる。
 エポキシ化合物が液晶性を有する場合、組成物から形成される熱伝導材料の熱伝導率及び/又はピール強度がより優れる。
 また、エポキシ化合物が、一般式(DN)で表されるエポキシ化合物である場合、組成物から形成される熱伝導材料の熱伝導率及び/又はピール強度がより優れる。
It is preferable to determine the epoxy compound to be used in consideration of each performance to be realized in the composition.
For example, when the epoxy compound has an aromatic ring group (benzene ring or the like), the heat conductivity of the heat conductive material is more excellent.
When an epoxy compound having a flexible structure or excellent moldability is used, the storage stability of the semi-cured sheet formed from the composition is more excellent. Examples of such an epoxy compound include a bisphenol F type epoxy compound, an epoxy compound represented by the general formula (E1), and an epoxy compound having a diglycidylamino group.
When the epoxy compound has liquidity, the thermal conductivity and / or peel strength of the heat conductive material formed from the composition is more excellent.
Further, when the epoxy compound is an epoxy compound represented by the general formula (DN), the thermal conductivity and / or peel strength of the heat conductive material formed from the composition is more excellent.
 エポキシ化合物は、1種単独で使用してもよく、2種以上を使用してもよい。
 2種以上のエポキシ化合物を使用することで、組成物の性能のバランスを調整しやすい。
 例えば、ビスフェノールF型エポキシ化合物とフェノキシ樹脂とを使用する場合、ビスフェノールF型エポキシ化合物とフェノールノボラック型エポキシ化合物とを使用する場合、及び、ポリヒドロキシベンゼン型エポキシ化合物とフェノールノボラック型エポキシ化合物とを使用する場合等に、組成物の性能のバランスがより良好になる。
The epoxy compound may be used alone or in combination of two or more.
By using two or more kinds of epoxy compounds, it is easy to adjust the balance of the performance of the composition.
For example, when a bisphenol F type epoxy compound and a phenoxy resin are used, when a bisphenol F type epoxy compound and a phenol novolac type epoxy compound are used, and when a polyhydroxybenzene type epoxy compound and a phenol novolac type epoxy compound are used. In such cases, the balance of performance of the composition becomes better.
 組成物において全フェノール化合物に含まれるフェノール性水酸基の数に対する、エポキシ化合物に含まれるエポキシ基の数との比(エポキシ基の数/フェノール性水酸基の数)は、40/60~60/40が好ましく、45/55~55/45がより好ましい。
 つまり、組成物中の、全フェノール化合物とエポキシ化合物との含有量の比は、上記「エポキシ基の数/フェノール性水酸基の数」が上記範囲内になるような比であるのが好ましい。
 なお、ここでいう全フェノール化合物とは、特定フェノール化合物及びその他のフェノール化合物の両方を意図する。
The ratio of the number of epoxy groups contained in the epoxy compound to the number of phenolic hydroxyl groups contained in the total phenol compound in the composition (number of epoxy groups / number of phenolic hydroxyl groups) is 40/60 to 60/40. Preferably, 45/55 to 55/45 is more preferable.
That is, the ratio of the content of the total phenol compound to the epoxy compound in the composition is preferably such that the above-mentioned "number of epoxy groups / number of phenolic hydroxyl groups" is within the above range.
The total phenol compound referred to here is intended to be both a specific phenol compound and other phenol compounds.
 また、組成物において、エポキシ化合物のエポキシ基と、活性水素(フェノール性水酸基に由来する活性水素であってもよく、その他の活性水素含有化合物の活性水素であってもよい)との当量比(エポキシ基の数/活性水素の数)は、30/70~70/30が好ましく、40/60~60/40がより好ましく、45/55~55/45が更に好ましい。 Further, in the composition, the equivalent ratio (may be active hydrogen derived from a phenolic hydroxyl group or active hydrogen of another active hydrogen-containing compound) between the epoxy group of the epoxy compound and the active hydrogen (may be active hydrogen derived from a phenolic hydroxyl group). The number of epoxy groups / number of active hydrogens) is preferably 30/70 to 70/30, more preferably 40/60 to 60/40, and even more preferably 45/55 to 55/45.
 また、組成物中、エポキシ化合物と全フェノール化合物との合計含有量は、組成物の全固形分に対して、5~90質量%が好ましく、10~50質量%がより好ましく、15~40質量%が更に好ましい。
 なお、全固形分とは、熱伝導材料を形成する成分を意図し、溶媒は含まれない。ここでいう、熱伝導材料を形成する成分は、熱伝導材料を形成する際に反応(重合)して化学構造が変化する成分でもよい。また、熱伝導材料を形成する成分であれば、その性状が液体状であっても、固形分とみなす。
The total content of the epoxy compound and the total phenol compound in the composition is preferably 5 to 90% by mass, more preferably 10 to 50% by mass, and 15 to 40% by mass with respect to the total solid content of the composition. % Is more preferable.
The total solid content is intended as a component forming a heat conductive material and does not contain a solvent. The component forming the heat conductive material referred to here may be a component whose chemical structure changes by reacting (polymerizing) when forming the heat conductive material. Further, if it is a component forming a heat conductive material, even if its property is liquid, it is regarded as a solid content.
〔硬化促進剤〕
 本発明の組成物は、硬化促進剤を含む。
 硬化促進剤としては、例えば、トリスオルトトリルホスフィン、トリフェニルホスフィン、三フッ化ホウ素アミン錯体、及び、特開2012-67225号公報の段落0052に記載の化合物が挙げられる。また、テトラフェニルホスホニウムテトラフェニルボレート(TPP-K)、テトラフェニルホスホニウムテトラ-p-トリルボラート(TPP-MK)、テトラ-n-ブチルホスホニウムラウレート(TBP-LA)、ビス(テトラ-n-ブチルホスホニウム)ピロメリテート、及び、テトラフェニルホスホニウムのビス(ナフタレン-2,3-ジオキシ)フェニルシリケート付加物のような四級ホスホニウム系化合物(ホスホニウム塩)等のオニウム塩系硬化促進剤も挙げられる。
 その他にも、2-メチルイミダゾール(商品名;2MZ)、2-ウンデシルイミダゾール(商品名;C11-Z)、2-ヘプタデシルイミダゾール(商品名;C17Z)、1,2-ジメチルイミダゾール(商品名;1.2DMZ)、2-エチル-4-メチルイミダゾール(商品名;2E4MZ)、2-フェニルイミダゾール(商品名;2PZ)、2-フェニル-4-メチルイミダゾール(商品名;2P4MZ)、1-ベンジル-2-メチルイミダゾール(商品名;1B2MZ)、1-ベンジル-2-フェニルイミダゾール(商品名;1B2PZ)、1-シアノエチル-2-メチルイミダゾール(商品名;2MZ-CN)、1-シアノエチル-2-ウンデシルイミダゾール(商品名;C11Z-CN)、1-シアノエチル-2-フェニルイミダゾリウムトリメリテイト(商品名;2PZCNS-PW)、2,4-ジアミノ-6-[2’-メチルイミダゾリル-(1’)]-エチル-s-トリアジン(商品名;2MZ-A)、2,4-ジアミノ-6-[2’-ウンデシルイミダゾリル-(1’)]-エチル-s-トリアジン(商品名;C11Z-A)、2,4-ジアミノ-6-[2’-エチル-4’-メチルイミダゾリル-(1’)]-エチル-s-トリアジン(商品名;2E4MZ-A)、2,4-ジアミノ-6-[2’-メチルイミダゾリル-(1’)]-エチル-s-トリアジンイソシアヌル酸付加物(商品名;2MA-OK)、2-フェニル-4,5-ジヒドロキシメチルイミダゾール(商品名;2PHZ-PW)、2-フェニル-4-メチル-5-ヒドロキシメチルイミダゾール(商品名;2P4MHZ-PW)、1-シアノエチル-2-フェニルイミダゾール(商品名;2PZ-CN)、2,4-ジアミノ-6-[2’-メチルイミダゾリル-(1’)]-エチル-s-トリアジン(商品名;2MZA-PW)、及び、2,4-ジアミノ-6-[2’-メチルイミダゾリル-(1’)]-エチル-s-トリアジンイソシアヌル酸付加物(商品名;2MAOK-PW)などのイミダゾール系硬化促進剤等が挙げられる(いずれも四国化成工業(株)製)。更に、トリアリールホスフィン系の硬化促進剤として特開2004-43405号公報の段落0052に記載の化合物も挙げられる。トリアリールホスフィンにトリフェニルボランが付加したリン系硬化促進剤として、特開2014-5382の段落0024に記載の化合物も挙げられる。
 中でも、硬化促進剤は、リン原子を含む化合物を含むことが好ましく、ホスホニウム塩を含むことがより好ましい。硬化促進剤は、リン原子を含む化合物又はホスホニウム塩そのものであってもよい。リン原子を含む化合物又はホスホニウム塩の含有量は、硬化促進剤の全質量に対して、10~100質量%が好ましく、50~100質量%がより好ましく、80~100質量%が更に好ましい。
 硬化促進剤は、1種単独で使用してもよく2種以上使用してもよい。
 硬化促進剤の含有量は、組成物の全固形分に対して、0.002質量%以上が好ましく、0.02質量%以上がより好ましく、0.07質量%以上が更に好ましい。硬化促進剤の含有量は、組成物の全固形分に対して、5質量%以下が好ましく、2質量%以下がより好ましく、1質量%以下が更に好ましい。
硬化促進剤の含有量は、全エポキシ化合物に対して、0.01質量%以上が好ましく、0.10質量%以上がより好ましく、0.55質量%以上が更に好ましい。硬化促進剤の含有量は、全エポキシ化合物に対して、40質量%以下が好ましく、12質量%以下がより好ましく、10質量%以下が更に好ましく、5質量%以下が特に好ましい。
[Hardening accelerator]
The composition of the present invention contains a curing accelerator.
Examples of the curing accelerator include trisorthotrilphosphine, triphenylphosphine, boron trifluoride amine complex, and the compounds described in paragraph 0052 of JP2012-67225A. In addition, tetraphenylphosphonium tetraphenylborate (TPP-K), tetraphenylphosphonium tetra-p-tolylborate (TPP-MK), tetra-n-butylphosphonium laurate (TBP-LA), bis (tetra-n-butylphosphonium) ) Pyromeritate and onium salt-based curing accelerators such as quaternary phosphonium-based compounds (phosphonium salts) such as bis (naphthalen-2,3-dioxy) phenylsilicate adduct of tetraphenylphosphonium can also be mentioned.
In addition, 2-methylimidazole (trade name; 2MZ), 2-undecylimidazole (trade name; C11-Z), 2-heptadecylimidazole (trade name; C17Z), 1,2-dimethylimidazole (trade name). 1.2DMZ), 2-ethyl-4-methylimidazole (trade name; 2E4MZ), 2-phenylimidazole (trade name; 2PZ), 2-phenyl-4-methylimidazole (trade name; 2P4MZ), 1-benzyl -2-Methylimidazole (trade name; 1B2MZ), 1-benzyl-2-phenylimidazole (trade name; 1B2PZ), 1-cyanoethyl-2-methylimidazole (trade name; 2MZ-CN), 1-cyanoethyl-2- Undecylimidazole (trade name; C11Z-CN), 1-cyanoethyl-2-phenylimidazolium trimellitate (trade name: 2PZCNS-PW), 2,4-diamino-6- [2'-methylimidazolyl- (1'')]-Ethyl-s-triazine (trade name; 2MZ-A), 2,4-diamino-6- [2'-undecylimidazolyl- (1')]-ethyl-s-triazine (trade name; C11Z) -A), 2,4-diamino-6- [2'-ethyl-4'-methylimidazolyl- (1')]-ethyl-s-triazine (trade name; 2E4MZ-A), 2,4-diamino- 6- [2'-methylimidazolyl- (1')]-ethyl-s-triazine isocyanuric acid adduct (trade name; 2MA-OK), 2-phenyl-4,5-dihydroxymethylimidazole (trade name; 2PHZ-) PW), 2-phenyl-4-methyl-5-hydroxymethylimidazole (trade name; 2P4MHZ-PW), 1-cyanoethyl-2-phenylimidazole (trade name; 2PZ-CN), 2,4-diamino-6- [2'-Methylimidazolyl- (1')]-ethyl-s-triazine (trade name; 2MZA-PW) and 2,4-diamino-6- [2'-methylimidazolyl- (1')]- Examples thereof include imidazole-based curing accelerators such as ethyl-s-triazine isocyanuric acid adduct (trade name; 2MAOK-PW) (all manufactured by Shikoku Kasei Kogyo Co., Ltd.). Further, as a triarylphosphine-based curing accelerator, the compound described in paragraph 0052 of JP-A-2004-43405 can also be mentioned. Examples of the phosphorus-based curing accelerator to which triphenylborane is added to triarylphosphine include the compounds described in paragraph 0024 of JP-A-2014-5382.
Among them, the curing accelerator preferably contains a compound containing a phosphorus atom, and more preferably contains a phosphonium salt. The curing accelerator may be a compound containing a phosphorus atom or a phosphonium salt itself. The content of the compound containing a phosphorus atom or the phosphonium salt is preferably 10 to 100% by mass, more preferably 50 to 100% by mass, still more preferably 80 to 100% by mass, based on the total mass of the curing accelerator.
The curing accelerator may be used alone or in combination of two or more.
The content of the curing accelerator is preferably 0.002% by mass or more, more preferably 0.02% by mass or more, still more preferably 0.07% by mass or more, based on the total solid content of the composition. The content of the curing accelerator is preferably 5% by mass or less, more preferably 2% by mass or less, still more preferably 1% by mass or less, based on the total solid content of the composition.
The content of the curing accelerator is preferably 0.01% by mass or more, more preferably 0.10% by mass or more, still more preferably 0.55% by mass or more, based on the total epoxy compound. The content of the curing accelerator is preferably 40% by mass or less, more preferably 12% by mass or less, further preferably 10% by mass or less, and particularly preferably 5% by mass or less, based on the total epoxy compound.
〔無機物〕
 本発明の組成物は、無機物を含む。
 無機物としては、従来から熱伝導材料の無機フィラーに用いられているいずれの無機物を用いてもよい。無機物としては、熱伝導材料の熱伝導性及び絶縁性がより優れる点から、無機窒化物又は無機酸化物を含むのが好ましく、少なくとも無機窒化物を含むのがより好ましい。
[Inorganic substances]
The composition of the present invention contains an inorganic substance.
As the inorganic substance, any inorganic substance conventionally used for the inorganic filler of the heat conductive material may be used. The inorganic substance preferably contains an inorganic nitride or an inorganic oxide, and more preferably at least an inorganic nitride, because the heat conductive material is more excellent in thermal conductivity and insulating property.
 無機物の形状は特に制限されず、粒子状であってもよく、フィルム状であってもよく、又は板状であってもよい。粒子状無機物の形状は、米粒状、球形状、立方体状、紡錘形状、鱗片状、凝集状、及び、不定形状が挙げられる。 The shape of the inorganic substance is not particularly limited, and may be in the form of particles, a film, or a plate. Examples of the shape of the particulate inorganic substance include rice granules, spherical shape, cube shape, spindle shape, scaly shape, agglomerated shape, and indefinite shape.
 無機酸化物としては、例えば、酸化ジルコニウム(ZrO)、酸化チタン(TiO)、酸化ケイ素(SiO)、酸化アルミニウム(Al)、酸化鉄(Fe、FeO、Fe)、酸化銅(CuO、CuO)、酸化亜鉛(ZnO)、酸化イットリウム(Y)、酸化ニオブ(Nb)、酸化モリブデン(MoO)、酸化インジウム(In、InO)、酸化スズ(SnO)、酸化タンタル(Ta)、酸化タングステン(WO、W)、酸化鉛(PbO、PbO)、酸化ビスマス(Bi)、酸化セリウム(CeO、Ce)、酸化アンチモン(Sb、Sb)、酸化ゲルマニウム(GeO、GeO)、酸化ランタン(La)、及び、酸化ルテニウム(RuO)等が挙げられる。
 上記の無機酸化物は、1種のみを使用していてもよいし、2種以上を使用していてもよい。
 無機酸化物は、酸化チタン、酸化アルミニウム、又は酸化亜鉛が好ましく、酸化アルミニウムがより好ましい。
 無機酸化物は、非酸化物として用意された金属が、環境下等で酸化して生じている酸化物であってもよい。
Examples of the inorganic oxide include zirconium oxide (ZrO 2 ), titanium oxide (TIO 2 ), silicon oxide (SiO 2 ), aluminum oxide (Al 2 O 3 ), iron oxide (Fe 2 O 3 , FeO, Fe 3). O 4 ), copper oxide (CuO, Cu 2 O), zinc oxide (ZnO), yttrium oxide (Y 2 O 3 ), niobium oxide (Nb 2 O 5 ), molybdenum oxide (MoO 3 ), indium oxide (In 2). O 3 , In 2 O), tin oxide (SnO 2 ), tantalum oxide (Ta 2 O 5 ), tungsten oxide (WO 3 , W 2 O 5 ), lead oxide (PbO, PbO 2 ), bismuth oxide (Bi 2) O 3 ), cerium oxide (CeO 2 , Ce 2 O 3 ), antimony oxide (Sb 2 O 3 , Sb 2 O 5 ), germanium oxide (GeO 2 , GeO), lanthanum oxide (La 2 O 3 ), and Examples thereof include ruthenium oxide (RuO 2).
As the above-mentioned inorganic oxide, only one kind may be used, or two or more kinds may be used.
The inorganic oxide is preferably titanium oxide, aluminum oxide, or zinc oxide, and more preferably aluminum oxide.
The inorganic oxide may be an oxide produced by oxidizing a metal prepared as a non-oxide in an environment or the like.
 無機窒化物としては、例えば、窒化ホウ素(BN)、窒化炭素(C)、窒化ケイ素(Si)、窒化ガリウム(GaN)、窒化インジウム(InN)、窒化アルミニウム(AlN)、窒化クロム(CrN)、窒化銅(CuN)、窒化鉄(FeN)、窒化鉄(FeN)、窒化ランタン(LaN)、窒化リチウム(LiN)、窒化マグネシウム(Mg)、窒化モリブデン(MoN)、窒化ニオブ(NbN)、窒化タンタル(TaN)、窒化チタン(TiN)、窒化タングステン(WN)、窒化タングステン(WN)、窒化イットリウム(YN)、及び、窒化ジルコニウム(ZrN)等が挙げられる。
 上記の無機窒化物は、1種のみを使用していてもよいし、2種以上を使用していてもよい。
 無機窒化物は、アルミニウム原子、ホウ素原子、又は、珪素原子を含むのが好ましく、窒化アルミニウム、窒化ホウ素、又は、窒化珪素を含むのがより好ましく、窒化アルミニウム又は窒化ホウ素を含むのが更に好ましく、窒化ホウ素を含むのが特に好ましい。
Examples of the inorganic nitride include boron nitride (BN), carbon nitride (C 3 N 4 ), silicon nitride (Si 3 N 4 ), gallium nitride (GaN), indium nitride (InN), and aluminum nitride (AlN). Chromium Nitride (Cr 2 N), Copper Nitride (Cu 3 N), Iron Nitride (Fe 4 N), Iron Nitride (Fe 3 N), Lantern Nitride (La N), Lithium Nitride (Li 3 N), Magnesium Nitride (Mg) 3 N 2 ), Molybdenum Nitride (Mo 2 N), Niob Nitride (NbN), Tantal Nitride (TaN), Titanium Nitride (TiN), Tungsten Nitride (W 2 N), Tungsten Nitride (WN 2 ), Yttrium Nitride (YN) ), Zirconium nitride (ZrN) and the like.
As the above-mentioned inorganic nitride, only one kind may be used, or two or more kinds may be used.
The inorganic nitride preferably contains an aluminum atom, a boron atom, or a silicon atom, more preferably aluminum nitride, boron nitride, or silicon nitride, and even more preferably aluminum nitride or boron nitride. It is particularly preferable to contain boron nitride.
 無機物の大きさは特に制限されないが、無機物の分散性がより優れる点で、無機物の平均粒径は500μm以下が好ましく、300μm以下がより好ましく、200μm以下が更に好ましい。下限は特に制限されないが、取り扱い性の点で、10nm以上が好ましく、100nm以上がより好ましい。
 無機物の平均粒径としては、市販品を用いる場合、カタログ値を採用する。カタログ値が無い場合、上記平均粒径の測定方法としては、電子顕微鏡を用いて、100個の無機物を無作為に選択して、それぞれの無機物の粒径(長径)を測定し、それらを算術平均して求める。
The size of the inorganic substance is not particularly limited, but the average particle size of the inorganic substance is preferably 500 μm or less, more preferably 300 μm or less, still more preferably 200 μm or less, in that the dispersibility of the inorganic substance is more excellent. The lower limit is not particularly limited, but in terms of handleability, 10 nm or more is preferable, and 100 nm or more is more preferable.
As the average particle size of the inorganic substance, the catalog value is adopted when a commercially available product is used. If there is no catalog value, as the method for measuring the average particle size, 100 inorganic substances are randomly selected, the particle size (major axis) of each inorganic substance is measured, and the arithmetic is performed. Calculate on average.
 無機物は、1種のみを使用していてもよいし、2種以上を使用してもよい。
 無機物は、無機窒化物及び無機酸化物の少なくとも一方を含むのが好ましく、無機窒化物を少なくとも含むのがより好ましい。無機窒化物と無機酸化物との両方を含んでもよい。
 上記無機窒化物としては、窒化ホウ素及び窒化アルミニウムの少なくとも一方を含むのが好ましく、窒化ホウ素を少なくとも含むのがより好ましく、平均粒径が20μm以上である凝集状窒化ホウ素を少なくとも含むのが更に好ましい。
 無機物中における無機窒化物(好ましくは窒化ホウ素及び/又は窒化アルミニウム)の含有量は、無機物の全質量に対して10~100質量%が好ましく、40~100質量%がより好ましく、80~100質量%が更に好ましい。
 上記無機酸化物としては、酸化アルミニウムが好ましい。
As the inorganic substance, only one kind may be used, or two or more kinds may be used.
The inorganic substance preferably contains at least one of an inorganic nitride and an inorganic oxide, and more preferably contains at least an inorganic nitride. It may contain both inorganic nitrides and inorganic oxides.
The inorganic nitride preferably contains at least one of boron nitride and aluminum nitride, more preferably at least boron nitride, and even more preferably at least agglomerated boron nitride having an average particle size of 20 μm or more. ..
The content of the inorganic nitride (preferably boron nitride and / or aluminum nitride) in the inorganic substance is preferably 10 to 100% by mass, more preferably 40 to 100% by mass, and 80 to 100% by mass with respect to the total mass of the inorganic substance. % Is more preferable.
As the inorganic oxide, aluminum oxide is preferable.
 熱伝導材料の熱伝導性がより優れる点で、組成物は、平均粒径が20μm以上(好ましくは、30μm以上)の無機物(好ましくは、無機窒化物又は無機酸化物、より好ましくは無機窒化物、更に好ましくは窒化ホウ素、特に好ましくは凝集状窒化ホウ素)を少なくとも含むのが好ましい。 In that the heat conductive material is more excellent in heat conductivity, the composition is an inorganic substance (preferably an inorganic nitride or an inorganic oxide, more preferably an inorganic nitride) having an average particle size of 20 μm or more (preferably 30 μm or more). , More preferably, boron nitride, particularly preferably aggregated boron nitride).
 組成物が含む無機物(好ましくは無機窒化物又は無機酸化物、より好ましくは無機窒化物、更に好ましくは窒化ホウ素及び/又は窒化アルミニウム)は、実質的に平均粒径が20μm以上(好ましくは、30μm以上)の無機物のみであるのも好ましい。無機物が、実質的に平均粒径が20μm以上の無機物のみであるとは、無機物の全質量に対して、平均粒径が20μm以上の無機物の含有量が99質量%超であることを言う。 The inorganic material contained in the composition (preferably an inorganic nitride or an inorganic oxide, more preferably an inorganic nitride, further preferably boron nitride and / or aluminum nitride) has a substantially average particle size of 20 μm or more (preferably 30 μm). It is also preferable that only the inorganic substances of the above) are used. The fact that the inorganic substances are substantially only inorganic substances having an average particle size of 20 μm or more means that the content of the inorganic substances having an average particle size of 20 μm or more is more than 99% by mass with respect to the total mass of the inorganic substances.
 また、無機物は、平均粒径が異なる無機物をそれぞれ有するのも好ましく、例えば、平均粒径が20μm以上の無機物である無機物Xと、平均粒径が20μm未満の無機物である無機物Yとの両方を含むのも好ましい。
 上記無機物Xの平均粒径は、20~300μmが好ましく、30~200μmがより好ましい。上記無機物Yの平均粒径は、1nm以上20μm未満が好ましく、10nm以上15μm以下がより好ましい。
 無機物Xは、無機窒化物又は無機酸化物が好ましく、無機窒化物がより好ましく、窒化ホウ素が更に好ましく、凝集状窒化ホウ素が特に好ましい。
 無機物Yは、無機窒化物又は無機酸化物が好ましく、窒化ホウ素又は酸化アルミニウムがより好ましい。
 無機物X及び無機物Yは、それぞれ、1種単独で使用してもよく、2種以上を使用してもよい。
 無機物中、無機物Xの含有量と無機物Yの含有量との質量比(無機物Xの含有量/無機物Yの含有量)は、50/50~99/1が好ましく、60/40~95/5が更に好ましい。
Further, the inorganic substance preferably has an inorganic substance having a different average particle size, for example, both an inorganic substance X having an average particle size of 20 μm or more and an inorganic substance Y having an average particle size of less than 20 μm. It is also preferable to include it.
The average particle size of the inorganic substance X is preferably 20 to 300 μm, more preferably 30 to 200 μm. The average particle size of the inorganic substance Y is preferably 1 nm or more and less than 20 μm, and more preferably 10 nm or more and 15 μm or less.
The inorganic substance X is preferably an inorganic nitride or an inorganic oxide, more preferably an inorganic nitride, further preferably boron nitride, and particularly preferably agglutinating boron nitride.
The inorganic substance Y is preferably an inorganic nitride or an inorganic oxide, more preferably boron nitride or aluminum oxide.
As the inorganic substance X and the inorganic substance Y, one kind may be used alone, or two or more kinds may be used.
The mass ratio of the content of the inorganic substance X to the content of the inorganic substance Y (content of the inorganic substance X / content of the inorganic substance Y) is preferably 50/50 to 99/1, and 60/40 to 95/5. Is more preferable.
 無機物(特に窒化ホウ素)は、表面処理されていてもよい。なお表面処理とは、後述する表面修飾剤を用いた表面修飾とは異なる処理を意図する。
 このような処理を行うことで、無機物の表面に官能基が導入され、無機物がフェノール化合物、エポキシ化合物、及び/又は、後述の表面修飾剤等と相互作用しやすくなり、形成される熱伝導材料の熱伝導性及びピール強度などがより改善すると考えられている。
 表面処理としては、例えば、プラズマ処理(真空プラズマ処理、大気圧プラズマ処理、及び、アクアプラズマ処理等)、紫外線照射処理、コロナ処理、電子線照射処理、オゾン処理、焼成処理、火炎処理、及び、酸化剤処理等が挙げられる。上記酸化剤処理としては、酸性条件で行ってもよいし塩基性条件(pH12以上等)で行ってもよい。
Inorganic substances (particularly boron nitride) may be surface-treated. The surface treatment is intended to be a treatment different from the surface modification using a surface modifier described later.
By performing such a treatment, a functional group is introduced on the surface of the inorganic substance, and the inorganic substance easily interacts with a phenol compound, an epoxy compound, and / or a surface modifier described later, and is formed as a heat conductive material. It is considered that the thermal conductivity and peel strength of the compound are further improved.
The surface treatment includes, for example, plasma treatment (vacuum plasma treatment, atmospheric pressure plasma treatment, aqua plasma treatment, etc.), ultraviolet irradiation treatment, corona treatment, electron beam irradiation treatment, ozone treatment, firing treatment, flame treatment, and Oxidizing agent treatment and the like can be mentioned. The oxidizing agent treatment may be carried out under acidic conditions or basic conditions (pH 12 or higher, etc.).
 組成物中における無機物の含有量は、組成物の全固形分に対して、10質量%以上であり、40質量%以上が好ましく、50質量%以上がより好ましく、60質量%以上が更に好ましい。上限は100質量%未満であり、95質量%以下が好ましい。 The content of the inorganic substance in the composition is 10% by mass or more, preferably 40% by mass or more, more preferably 50% by mass or more, still more preferably 60% by mass or more, based on the total solid content of the composition. The upper limit is less than 100% by mass, preferably 95% by mass or less.
〔表面修飾剤〕
 本発明の組成物は、上述の成分とは異なる成分として、更に表面修飾剤を含んでいてもよい。
 表面修飾剤は、上述の無機物を表面修飾する成分である。
 本明細書において、「表面修飾」とは無機物の表面の少なくとも一部に有機物が吸着している状態を意味する。吸着の形態は特に限定されず、結合している状態であればよい。すなわち、表面修飾は、有機物の一部が脱離して得られる有機基が無機物表面に結合している状態も含む。結合は、共有結合、配位結合、イオン結合、水素結合、ファンデルワールス結合、及び、金属結合等、いずれの結合であってもよい。表面修飾は、表面の少なくとも一部に単分子膜を形成するようになされていてもよい。単分子膜は、有機分子の化学吸着によって形成される単層膜であり、Self-AssembledMonoLayer(SAM)として知られている。なお、本明細書において、表面修飾は、無機物の表面の一部のみであっても、全体であってもよい。本明細書において、「表面修飾無機物」は、表面修飾剤により表面修飾されている無機物、すなわち無機物の表面に有機物が吸着している物質を意味する。
 つまり、本発明の組成物において、無機物は、表面修飾剤と共同して、表面修飾無機物(好ましくは表面修飾無機窒化物及び/又は表面修飾無機酸化物)を構成していてもよい。
[Surface modifier]
The composition of the present invention may further contain a surface modifier as a component different from the above-mentioned components.
The surface modifier is a component that surface-modifies the above-mentioned inorganic substances.
As used herein, "surface modification" means a state in which an organic substance is adsorbed on at least a part of the surface of the inorganic substance. The form of adsorption is not particularly limited, and may be in a bonded state. That is, the surface modification also includes a state in which an organic group obtained by desorption of a part of an organic substance is bonded to the surface of the inorganic substance. The bond may be any bond such as a covalent bond, a coordination bond, an ionic bond, a hydrogen bond, a van der Waals bond, and a metal bond. The surface modification may be made to form a monolayer on at least a part of the surface. The monolayer is a monolayer formed by chemisorption of organic molecules and is known as Self-Assembled MonoLayer (SAM). In addition, in this specification, the surface modification may be only a part of the surface of an inorganic substance, or may be the whole. As used herein, the term "surface-modified inorganic substance" means an inorganic substance that has been surface-modified with a surface modifier, that is, a substance in which an organic substance is adsorbed on the surface of the inorganic substance.
That is, in the composition of the present invention, the inorganic substance may constitute a surface-modified inorganic substance (preferably a surface-modified inorganic nitride and / or a surface-modified inorganic oxide) in combination with the surface modifier.
 表面修飾剤としては、長鎖アルキル脂肪酸等のカルボン酸、有機ホスホン酸、有機リン酸エステル、有機シラン分子(シランカップリング剤)等従来公知の表面修飾剤を使用できる。その他、例えば、特開2009-502529号公報、特開2001-192500号公報、特許4694929号に記載の表面修飾剤を利用してもよい。 As the surface modifier, a conventionally known surface modifier such as a carboxylic acid such as a long-chain alkyl fatty acid, an organic phosphonic acid, an organic phosphoric acid ester, and an organic silane molecule (silane coupling agent) can be used. In addition, for example, the surface modifiers described in JP-A-2009-502529, JP-A-2001-192500, and Japanese Patent No. 4694929 may be used.
 上記シランカップリング剤は、例えば、Si原子に直接結合した加水分解性基を有する化合物である。
 上記加水分解性基としては、アルコキシ基(好ましくは炭素数1~10)、及び、塩素原子等のハロゲン原子が挙げられる。
 シランカップリング剤が有する、Si原子に直接結合した加水分解性基の数は、1以上が好ましく、2以上がより好ましく、3以上が更により好ましい。上記数に上限はなく、例えば、10000である。
 シランカップリング剤は、反応性基を有することも好ましい。
 上記反応性基の具体例としては、エポキシ基、オキセタニル基、ビニル基、(メタ)クリル基、スチリル基、アミノ基、イソシアネート基、メルカプト基、及び、酸無水物基が挙げられる。
 シランカップリング剤が有する、反応性基の数は、1以上が好ましく、2以上がより好ましく、3以上が更により好ましい。上記数に上限はなく、例えば、10000である。
 シランカップリング剤としては、例えば、3-アミノプロピルトリエトキシシラン、3-(2-アミノエチル)アミノプロピルトリエトキシシラン、3-アミノプロピルトリメトキシシラン、3-(2-アミノエチル)アミノプロピルトリメトキシシラン、N-フェニル-3-アミノプロピルトリメトキシシラン、3-メルカプトトリエトキシシラン、及び、3-ウレイドプロピルトリエトキシシランが挙げられる。
The silane coupling agent is, for example, a compound having a hydrolyzable group directly bonded to a Si atom.
Examples of the hydrolyzable group include an alkoxy group (preferably 1 to 10 carbon atoms) and a halogen atom such as a chlorine atom.
The number of hydrolyzable groups directly bonded to the Si atom of the silane coupling agent is preferably 1 or more, more preferably 2 or more, still more preferably 3 or more. There is no upper limit to the above number, for example, 10,000.
It is also preferable that the silane coupling agent has a reactive group.
Specific examples of the reactive group include an epoxy group, an oxetanyl group, a vinyl group, a (meth) krill group, a styryl group, an amino group, an isocyanate group, a mercapto group, and an acid anhydride group.
The number of reactive groups contained in the silane coupling agent is preferably 1 or more, more preferably 2 or more, and even more preferably 3 or more. There is no upper limit to the above number, for example, 10,000.
Examples of the silane coupling agent include 3-aminopropyltriethoxysilane, 3- (2-aminoethyl) aminopropyltriethoxysilane, 3-aminopropyltrimethoxysilane, and 3- (2-aminoethyl) aminopropyltri. Examples thereof include methoxysilane, N-phenyl-3-aminopropyltrimethoxysilane, 3-mercaptotriethoxysilane, and 3-ureidopropyltriethoxysilane.
 表面修飾剤は、1種単独で使用してもよく2種以上使用してもよい。
 組成物が表面修飾剤を含む場合、表面修飾剤の含有量は、組成物の全固形分に対して、0.005~5質量%が好ましく、0.05~3質量%がより好ましい。
 組成物が表面修飾剤を含む場合、表面修飾剤の含有量は、全無機物に対して、0.01~10質量%が好ましく、0.10~5質量%がより好ましい。
The surface modifier may be used alone or in combination of two or more.
When the composition contains a surface modifier, the content of the surface modifier is preferably 0.005 to 5% by mass, more preferably 0.05 to 3% by mass, based on the total solid content of the composition.
When the composition contains a surface modifier, the content of the surface modifier is preferably 0.01 to 10% by mass, more preferably 0.10 to 5% by mass, based on the total inorganic substances.
〔イオン補足剤〕
 本発明の組成物は、イオン補足剤を含んでいてもよい。
 イオン補足剤は、組成物中又は組成物を用いて形成される熱伝導材料中においてイオン性の不純物を吸着する。これにより、組成物中又熱伝導材料が吸湿した場合でも、熱伝導材料の絶縁信頼性を良好に維持できる。
 イオン捕捉剤としては、特に制限されず公知のものを使用できる。イオン捕捉剤としては、例えば、イオン交換により陽イオンを捕捉する陽イオン吸着剤、イオン交換により陰イオンを捕捉する陰イオン吸着剤、及び、イオン交換により陽イオンと陰イオンの両方を捕捉する両イオン補足剤などの無機イオン吸着剤;トリアジンチオール化合物;トリアジンアミン化合物;並びに、ビスフェノール系還元剤が挙げられる。
[Aeon supplement]
The composition of the present invention may contain an ion catching agent.
The ionic catcher adsorbs ionic impurities in the composition or in the heat conductive material formed with the composition. This makes it possible to maintain good insulation reliability of the heat conductive material even when the heat conductive material absorbs moisture in the composition.
As the ion scavenger, a known one can be used without particular limitation. Examples of the ion trapping agent include a cation adsorbent that captures cations by ion exchange, an anion adsorbent that captures anions by ion exchange, and both cations and anions that are captured by ion exchange. Examples thereof include an inorganic ion adsorbent such as an ion catcher; a triazinethiol compound; a triazineamine compound; and a bisphenol-based reducing agent.
 無機イオン吸着剤としては、アンチモン、ビスマス、ジルコニウム、チタン、スズ、マグネシウム、及び、アルミニウムからなる群から選択される1種又は2種以上の、酸化物、酸化水和物、及び、水酸化物が挙げられる。
 中でも、ビスマス、ジルコニウム、マグネシウム、及び、アルミニウムからなる群から選択される2種以上の、酸化物、酸化水和物、又は、水酸化物が好ましく、マグネシウム、アルミニウム、及び、ジルコニウムの3成分系酸化物、ビスマス及びジルコニウムの2成分系酸化水和物、並びに、マグネシウム及びアルミニウムを含む水酸化物であるハイドロタルサイトがより好ましく、ハイドロタルサイトが更に好ましい。
The inorganic ion adsorbent includes one or more oxides, oxide hydrates, and hydroxides selected from the group consisting of antimony, bismuth, zirconium, titanium, tin, magnesium, and aluminum. Can be mentioned.
Among them, two or more kinds of oxides, oxidative hydrates, or hydroxides selected from the group consisting of bismuth, zirconium, magnesium, and aluminum are preferable, and a three-component system of magnesium, aluminum, and zirconium is preferable. Hydrotalsite, which is a two-component oxide hydrate of oxide, bismuth and zirconium, and a hydroxide containing magnesium and aluminum, is more preferable, and hydrotalcite is even more preferable.
 トリアジンチオール化合物としては、例えば、2-ジブチルアミノ-4,6-ジメルカプト-s-トリアジンが挙げられる。
 ビスフェノール系還元剤としては、例えば、2,2’-メチレンビス-(4-エチル-6-t-ブチルフェノール)、及び、4,4’-ブチリデンビス-(6-t-ブチル-3-メチルフェノール)が挙げられる。
Examples of the triazine thiol compound include 2-dibutylamino-4,6-dimercapto-s-triazine.
Examples of the bisphenol-based reducing agent include 2,2'-methylenebis- (4-ethyl-6-t-butylphenol) and 4,4'-butylidenebis- (6-t-butyl-3-methylphenol). Can be mentioned.
 イオン補足剤は市販品を用いてもよく、例えば、DHF-4A、DHT-4A、DHT-4A-2、DHT-4C、キョーワード500、KW-2000、及び、KW-2100(商品名、協和化学社製);IXE-100、IXE-500、IXE-600、IXE-700F、IXE-800、IXE-6107、IXEPLAS-A1、IXEPLAS-A2、及び、IXEPLAS-B1(商品名、東亞合成社製);ジスネットDB(商品名、三協製薬社製);VD-3、及び、VD-5(商品名、四国化成社製);並びに、ヨシノックスBB(商品名、吉富製薬社製)が挙げられる。 Commercially available products may be used as the ion supplement, for example, DHF-4A, DHT-4A, DHT-4A-2, DHT-4C, Kyoward 500, KW-2000, and KW-2100 (trade name, Kyowa). IXE-100, IXE-500, IXE-600, IXE-700F, IXE-800, IXE-6107, IXEPLAS-A1, IXEPLAS-A2, and IXEPLAS-B1 (trade name, manufactured by Toagosei Co., Ltd.) ); Gisnet DB (trade name, manufactured by Sankyo Pharmaceutical Co., Ltd.); VD-3 and VD-5 (trade name, manufactured by Shikoku Kasei Co., Ltd.); and Yoshinox BB (trade name, manufactured by Yoshitomi Pharmaceutical Co., Ltd.). ..
 組成物がイオン補足剤を含む場合、イオン補足剤の含有量は、組成物の全固形分に対して、例えば、0.01~10質量%である。
 イオン補足剤は、1種単独で使用してもよく2種以上使用してもよい。
When the composition contains an ion-supplementing agent, the content of the ion-supplementing agent is, for example, 0.01 to 10% by mass with respect to the total solid content of the composition.
The ion catching agent may be used alone or in combination of two or more.
〔溶媒〕
 組成物は、更に、溶媒を含んでいてもよい。
 溶媒の種類は特に制限されず、有機溶媒であるのが好ましい。有機溶媒としては、例えば、シクロペンタノン、シクロヘキサノン、酢酸エチル、メチルエチルケトン、ジクロロメタン、及び、テトラヒドロフラン等が挙げられる。
 組成物が溶媒を含む場合、溶媒の含有量は、組成物の固形分濃度を、20~90質量%とする量が好ましく、30~80質量%とする量がより好ましく、50~80質量%とする量が更に好ましい。
 溶媒の含有量は、組成物の全質量に対して、5~80質量%が好ましく、15~70質量%がより好ましく、20~50質量%が更に好ましい。
〔solvent〕
The composition may further contain a solvent.
The type of solvent is not particularly limited, and it is preferably an organic solvent. Examples of the organic solvent include cyclopentanone, cyclohexanone, ethyl acetate, methyl ethyl ketone, dichloromethane, tetrahydrofuran and the like.
When the composition contains a solvent, the content of the solvent is preferably an amount having a solid content concentration of the composition of 20 to 90% by mass, more preferably 30 to 80% by mass, and more preferably 50 to 80% by mass. Is more preferable.
The content of the solvent is preferably 5 to 80% by mass, more preferably 15 to 70% by mass, still more preferably 20 to 50% by mass, based on the total mass of the composition.
〔発熱ピーク〕
 本発明の組成物は、組成物を用いて形成される半硬化シートを示差走査熱量計で測定した場合に、発熱ピークが検出される温度(発熱ピーク温度)が、130℃以上になることが好ましく、140℃以上になることがより好ましく、150℃以上になることが更に好ましい。上記温度の上限は特に制限されないが、例えば、240℃以下が好ましい。
 上記発熱ピークの測定に用いられる半硬化シートとは、組成物によって形成された半硬化状態の膜(半硬化膜)である。上記半硬化シートは、組成物を、いわゆるBステージ状態にして得られるシートである。
[Fever peak]
In the composition of the present invention, when a semi-cured sheet formed using the composition is measured by a differential scanning calorimeter, the temperature at which an exothermic peak is detected (exothermic peak temperature) may be 130 ° C. or higher. It is preferably 140 ° C. or higher, more preferably 150 ° C. or higher. The upper limit of the temperature is not particularly limited, but is preferably 240 ° C. or lower, for example.
The semi-cured sheet used for measuring the exothermic peak is a semi-cured film (semi-cured film) formed by the composition. The semi-cured sheet is a sheet obtained by putting the composition in a so-called B stage state.
 上記半硬化シートは具体的には以下のように定義される。
 ずなわち、まず、未硬化の組成物をDSC(示差走査熱量計、セイコーインスツル社製のDSC320/6200等)を用いて、25℃から240℃まで、10℃/分の昇温条件の下で反応挙動を観測する。これを測定1とする。なお、測定対象の組成物が溶媒を含む場合は、事前に、減圧下で組成物中の溶媒を除去してから測定1を実施する。
 次に、同じ組成物から形成されたシートであって、半硬化シートであるか否かの判断対象となるシート(判断対象シート)を、DSCで同様に25℃から240℃まで、10℃/分の昇温条件の下で反応挙動を観測する。これを測定2とする。
 その後、測定1で検出された発熱ピークの全面積を100%として、測定2で検出された発熱ピークの全面積の割合をN%として求める。(100-N)%を判断対象シートの反応率として、上記反応率が1%以上50%以下である場合、測定2に用いられた判断対象シートは半硬化シートであると判断する。
 半硬化シートの形成する方法については、後段で組成物の硬化方法を詳述する中で説明する。
The semi-cured sheet is specifically defined as follows.
First of all, the uncured composition was prepared using a DSC (differential scanning calorimeter, DSC320 / 6200 manufactured by Seiko Instruments Inc., etc.) from 25 ° C to 240 ° C under the heating conditions of 10 ° C / min. Observe the reaction behavior below. This is referred to as measurement 1. If the composition to be measured contains a solvent, the solvent in the composition is removed in advance under reduced pressure before measurement 1.
Next, a sheet formed from the same composition and to be judged whether it is a semi-cured sheet or not (judgment target sheet) is similarly subjected to DSC from 25 ° C. to 240 ° C. at 10 ° C./. Observe the reaction behavior under the warming condition of the minute. This is referred to as measurement 2.
Then, the total area of the exothermic peak detected in the measurement 1 is taken as 100%, and the ratio of the total area of the exothermic peak detected in the measurement 2 is obtained as N%. When (100-N)% is set as the reaction rate of the judgment target sheet and the reaction rate is 1% or more and 50% or less, it is judged that the judgment target sheet used for the measurement 2 is a semi-cured sheet.
The method for forming the semi-cured sheet will be described later in detail in the method for curing the composition.
 また、半硬化シートに発熱ピークが複数存在する場合、もっとも低温側に存在する実質的な発熱ピークにおける発熱ピーク温度を、半硬化シートの発熱ピーク温度とする。
 上記「実質的な発熱ピーク」とは、25℃から240℃までの間に存在する半硬化シートの発熱ピークの全面積(100%)に対して、10%以上の面積を占める発熱ピークを意味する。
When a plurality of heat generation peaks are present on the semi-cured sheet, the heat generation peak temperature at the substantial heat generation peak existing on the lowest temperature side is defined as the heat generation peak temperature of the semi-cured sheet.
The above-mentioned "substantial heat generation peak" means a heat generation peak that occupies an area of 10% or more with respect to the total area (100%) of the heat generation peak of the semi-cured sheet existing between 25 ° C. and 240 ° C. do.
 本発明の組成物は、組成物を用いて形成される未硬化のシートをDSCで測定した場合に検出される、発熱ピークがブロードであることも好ましい。
 上記未硬化のシートとは、例えば、組成物が溶媒を含む場合において、溶媒を除去して得られるシートであり、いわゆるAステージ状態のシート(膜)である。
 また、発熱ピークがブロードであるとは、発熱ピークの半値幅が大きいこと、及び/又は、発熱ピークの温度と反応開始温度の差が大きいことをいう。
 組成物がこのような特徴を有していると、組成物の硬化及び組成物を用いた接着が、幅広い温度域で可能となり、様々な効果条件を適用可能になる点で好ましい。
In the composition of the present invention, it is also preferable that the exothermic peak detected when the uncured sheet formed by using the composition is measured by DSC is broad.
The uncured sheet is, for example, a sheet obtained by removing the solvent when the composition contains a solvent, and is a so-called A-stage sheet (film).
Further, the exothermic peak is broad means that the half width of the exothermic peak is large and / or the difference between the temperature of the exothermic peak and the reaction start temperature is large.
When the composition has such characteristics, it is preferable in that curing of the composition and adhesion using the composition become possible in a wide temperature range, and various effect conditions can be applied.
〔組成物の製造方法〕
 組成物の製造方法は特に制限されず、公知の方法を採用でき、例えば、上述した各種成分を混合して製造できる。混合する際には、各種成分を一括で混合しても、順次混合してもよい。
 成分を混合する方法に特に制限はなく、公知の方法を使用できる。混合に使用する混合装置は、液中分散機が好ましく、例えば、自転公転ミキサー、高速回転せん断型撹拌機等の撹拌機、コロイドミル、ロールミル、高圧噴射式分散機、超音波分散機、ビーズミル、及び、ホモジナイザーが挙げられる。混合装置は1種単独で使用してもよく、2種以上使用してもよい。混合の前後に、及び/又は、同時に、脱気処理を行ってもよい。
[Method for producing composition]
The method for producing the composition is not particularly limited, and a known method can be adopted. For example, the above-mentioned various components can be mixed and produced. When mixing, various components may be mixed all at once or sequentially.
The method of mixing the components is not particularly limited, and a known method can be used. The mixing device used for mixing is preferably a liquid disperser, for example, a stirrer such as a rotating revolution mixer, a high-speed rotary shear type stirrer, a colloid mill, a roll mill, a high-pressure injection disperser, an ultrasonic disperser, a bead mill, etc. And a homogenizer can be mentioned. The mixing device may be used alone or in combination of two or more. Degassing may be performed before, after, and / or at the same time as mixing.
〔組成物の硬化方法〕
 本発明の組成物は熱伝導材料形成用組成物であるのが好ましい。
 本発明の組成物を硬化処理して熱伝導材料が得られる。
 組成物の硬化方法は、特に制限されないが、熱硬化反応が好ましい。
 熱硬化反応の際の加熱温度は特に制限されない。例えば、50~250℃の範囲で適宜選択すればよい。また、熱硬化反応を行う際には、温度の異なる加熱処理を複数回にわたって実施してもよい。
 硬化処理は、フィルム状又はシート状とした組成物について行うのが好ましい。具体的には、例えば、組成物を塗布成膜し硬化反応を行えばよい。
 硬化処理を行う際は、基材上に組成物を塗布して塗膜を形成してから硬化させるのが好ましい。この際、基材上に形成した塗膜に、更に異なる基材を接触させてから硬化処理を行ってもよい。硬化後に得られた硬化物(熱伝導材料)は、基材の一方又は両方と分離してもよいし分離しなくてもよい。
 また、硬化処理を行う際に、別々の基材上に組成物を塗布して、それぞれ塗膜を形成し、得られた塗膜同士を接触させた状態で硬化処理を行ってもよい。硬化後に得られた硬化物(熱伝導材料)は、基材の一方又は両方と分離してもよいし分離しなくてもよい。
[Curing method of composition]
The composition of the present invention is preferably a composition for forming a heat conductive material.
The composition of the present invention is cured to obtain a heat conductive material.
The curing method of the composition is not particularly limited, but a thermosetting reaction is preferable.
The heating temperature during the thermosetting reaction is not particularly limited. For example, it may be appropriately selected in the range of 50 to 250 ° C. Further, when the thermosetting reaction is carried out, heat treatments having different temperatures may be carried out a plurality of times.
The curing treatment is preferably performed on a film-like or sheet-like composition. Specifically, for example, the composition may be applied to form a film and a curing reaction may be carried out.
When performing the curing treatment, it is preferable to apply the composition on the substrate to form a coating film and then cure. At this time, a different base material may be brought into contact with the coating film formed on the base material, and then the curing treatment may be performed. The cured product (heat conductive material) obtained after curing may or may not be separated from one or both of the substrates.
Further, when the curing treatment is performed, the composition may be applied on different substrates to form coating films, and the curing treatment may be performed in a state where the obtained coating films are in contact with each other. The cured product (heat conductive material) obtained after curing may or may not be separated from one or both of the substrates.
 硬化処理は、組成物を半硬化状態にした時点で終了してもよい。また、組成物を半硬化状態にした後、更に硬化処理を実施して、硬化を完全にしてもよい。
 組成物を半硬化状態にするための硬化処理(「半硬化処理」ともいう)と、硬化を完全にするための硬化処理(「本硬化処理」ともいう)とを、別々の工程に分けて行ってもよい。
The curing treatment may be completed when the composition is in a semi-cured state. Further, after the composition is made into a semi-hardened state, a further curing treatment may be carried out to complete the curing.
The curing treatment (also referred to as "semi-hardening treatment") for bringing the composition into a semi-hardening state and the curing treatment (also referred to as "main curing treatment") for completely curing are divided into separate steps. You may go.
 例えば、半硬化処理では、基材上に組成物を塗布して塗膜を形成した後、そのまま無加圧で基材上の塗膜を加熱等して半硬化状態の熱伝導材料(「半硬化膜」又は「半硬化シート」ともいう)としてもよいし、プレス加工を併用しながら基材上の塗膜を加熱等して半硬化膜としてもよい。プレス加工をする場合、プレス加工は、上記加熱等の、前後に実施されてもよいし、最中に実施されてもよい。半硬化処理においてプレス加工を実施すると、得られる半硬化膜の膜厚の調整、及び/又は、半硬化膜中のボイド量の低減をしやすい場合がある。
 半硬化処理において、別々の基材上に形成した塗膜同士を積層させた状態で半硬化処理を行ってもよいし、塗膜同士を積層させずに半硬化処理を行ってもよい。半硬化処理は、組成物から形成された塗膜と、更に、上記塗膜以外の材料とを接触させた状態で実施してもよい。
For example, in the semi-curing treatment, a composition is applied onto a substrate to form a coating film, and then the coating film on the substrate is heated without pressure to form a semi-cured heat conductive material (“semi-cured”). It may be a "cured film" or a "semi-cured sheet"), or the coating film on the substrate may be heated or the like to form a semi-cured film while being pressed together. In the case of press working, the press working may be carried out before or after the above heating or the like, or may be carried out during the press working. When press working is performed in the semi-hardened treatment, it may be easy to adjust the film thickness of the obtained semi-hardened film and / or reduce the amount of voids in the semi-hardened film.
In the semi-hardening treatment, the semi-hardening treatment may be performed in a state where the coating films formed on different substrates are laminated, or the semi-hardening treatment may be performed without laminating the coating films. The semi-hardening treatment may be carried out in a state where the coating film formed from the composition is further in contact with a material other than the coating film.
 得られた、半硬化膜を、そのまま熱伝導材料として使用してもよいし、半硬化膜に更に本硬化処理を施してから完全に硬化した熱伝導材料として使用してもよい。
 本硬化処理においては、半硬化膜を、そのまま無加圧で加熱等してもよいし、プレス加工を行ってから、又は、行いながら加熱等してもよい。この際、本硬化処理において、別々の半硬化膜同士を積層させた状態で本硬化処理を行ってもよいし、半硬化膜同士を積層させずに本硬化処理を行ってもよい。
 また、本硬化処理は、半硬化膜を、使用されるデバイス等に接触するように配置した状態で実施してもよい。本硬化処理によって、デバイスと本発明の熱伝導材料とが接着するのも好ましい。
The obtained semi-cured film may be used as it is as a heat conductive material, or may be used as a completely cured heat conductive material after the semi-hardened film is further subjected to the main curing treatment.
In the main curing treatment, the semi-hardened film may be heated as it is without pressure, or may be heated after being pressed or while being pressed. At this time, in the main curing treatment, the main curing treatment may be performed in a state where the separate semi-hardened films are laminated, or the main curing treatment may be performed without laminating the semi-hardened films.
Further, the main curing treatment may be carried out in a state where the semi-hardened film is arranged so as to be in contact with the device or the like to be used. It is also preferable that the device and the heat conductive material of the present invention are adhered to each other by this curing treatment.
 半硬化処理及び/又は本硬化処理等における硬化処理の際に実施してもよいプレス加工に使用するプレスに制限はなく、例えば、平板プレスを使用してもよいしロールプレスを使用してもよい。
 ロールプレスを使用する場合は、例えば、基材上に塗膜を形成して得た塗膜付き基材を、2本のロールが対向する1対のロールに挟持し、上記1対のロールを回転させて上記塗膜付き基材を通過させながら、上記塗膜付き基材の膜厚方向に圧力を付加するのが好ましい。上記塗膜付き基材は、塗膜の片面にのみ基材が存在していてもよいし、塗膜の両面に基材が存在していてもよい。上記塗膜付き基材は、ロールプレスに1回だけ通過させてもよいし複数回通過させてもよい。
 半硬化処理及び/又は本硬化処理等における硬化処理の際に、平板プレスによる処理とロールプレスによる処理とは一方のみを実施してもよいし両方を実施してもよい。
There are no restrictions on the press used for the press processing that may be performed during the semi-hardening treatment and / or the curing treatment in the main curing treatment, and for example, a flat plate press may be used or a roll press may be used. good.
When a roll press is used, for example, a substrate with a coating film obtained by forming a coating film on the substrate is sandwiched between a pair of rolls in which two rolls face each other, and the above pair of rolls is used. It is preferable to apply pressure in the film thickness direction of the coated substrate while rotating the substrate to pass the coated substrate. In the above-mentioned base material with a coating film, the base material may be present on only one side of the coating film, or the base material may be present on both sides of the coating film. The base material with a coating film may be passed through the roll press only once or may be passed a plurality of times.
In the semi-hardening treatment and / or the curing treatment in the main curing treatment or the like, only one of the treatment by the flat plate press and the treatment by the roll press may be carried out, or both may be carried out.
 硬化反応を含む熱伝導材料の作製については、「高熱伝導性コンポジット材料」(シーエムシー出版、竹澤由高著)も参照できる。 For the production of heat conductive materials including curing reaction, refer to "High heat conductive composite material" (CMC Publishing, by Yutaka Takezawa).
 熱伝導材料の形状に特に制限はなく、用途に応じて様々な形状に成形できる。成形された熱伝導材料の典型的な形状としては、例えば、シート状が挙げられる。
 つまり、本発明の組成物を用いて得られる熱伝導材料は、熱伝導シートであるのも好ましい。
 また、本発明の組成物を用いて得られる熱伝導材料の熱伝導性は異方的ではなく等方的であるのが好ましい。
The shape of the heat conductive material is not particularly limited, and can be molded into various shapes depending on the application. A typical shape of the molded heat conductive material is, for example, a sheet shape.
That is, the heat conductive material obtained by using the composition of the present invention is preferably a heat conductive sheet.
Further, the thermal conductivity of the heat conductive material obtained by using the composition of the present invention is preferably isotropic rather than anisotropic.
 熱伝導材料は、絶縁性(電気絶縁性)であるのが好ましい。言い換えると、本発明の組成物は、熱伝導性絶縁組成物であるのが好ましい。
 例えば、熱伝導材料の23℃相対湿度65%における体積抵抗率は、1010Ω・cm以上が好ましく、1012Ω・cm以上がより好ましく、1014Ω・cm以上が更に好ましい。上限は特に制限されないが、通常1018Ω・cm以下である。
The heat conductive material is preferably insulating (electrically insulating). In other words, the composition of the present invention is preferably a thermally conductive insulating composition.
For example, the volume resistivity of the heat conductive material at 23 ° C. and 65% relative humidity is preferably 10 10 Ω · cm or more, more preferably 10 12 Ω · cm or more, and even more preferably 10 14 Ω · cm or more. The upper limit is not particularly limited, but is usually 10 18 Ω · cm or less.
〔熱伝導材料の用途〕
 本発明の組成物を用いて得られる熱伝導材料は放熱シート等の放熱材として使用でき、各種デバイスの放熱用途に使用できる。より具体的には、デバイス上に本発明の熱伝導材料を含む熱伝導層を配置して熱伝導層付きデバイスを作製して、デバイスからの発熱を効率的に熱伝導層で放熱できる。上記熱伝導層は、後述する熱伝導性多層シート含む熱伝導層であってもよい。
 本発明の組成物を用いて得られる熱伝導材料は十分な熱伝導性を有するとともに、高い耐熱性を有しているため、パーソナルコンピュータ、一般家電、及び、自動車等の様々な電気機器に用いられているパワー半導体デバイスの放熱用途に適している。
 更に、本発明の組成物を用いて得られる熱伝導材料は、半硬化状態であっても十分な熱伝導性を有するため、各種装置の部材の隙間等の、光硬化のための光を到達させるのが困難な部位に配置する放熱材としても使用できる。また、接着性にも優れるため、熱伝導性を有する接着剤としての使用も可能である。
[Use of heat conductive materials]
The heat conductive material obtained by using the composition of the present invention can be used as a heat radiating material such as a heat radiating sheet, and can be used for heat radiating applications of various devices. More specifically, a device with a heat conductive layer can be produced by arranging a heat conductive layer containing the heat conductive material of the present invention on the device, and heat generated from the device can be efficiently dissipated by the heat conductive layer. The heat conductive layer may be a heat conductive layer including a heat conductive multilayer sheet described later.
Since the heat conductive material obtained by using the composition of the present invention has sufficient heat conductivity and high heat resistance, it is used for various electric devices such as personal computers, general home appliances, and automobiles. Suitable for heat dissipation of power semiconductor devices.
Further, since the heat conductive material obtained by using the composition of the present invention has sufficient heat conductivity even in a semi-cured state, it reaches light for photocuring such as gaps between members of various devices. It can also be used as a heat radiating material to be placed in areas where it is difficult to make it. In addition, since it has excellent adhesiveness, it can also be used as an adhesive having thermal conductivity.
 本発明の組成物を用いて得られる熱伝導材料は、本組成物から形成される部材以外の、他の部材と組み合わせて使用されてもよい。
 例えば、シート状の熱伝導材料(熱伝導シート)は、本組成物から形成された層の他の、シート状の支持体と組み合わせられていてもよい。
 シート状の支持体としては、例えば、プラスチックフィルム、金属フィルム、又は、ガラス板が挙げられる。プラスチックフィルムの材料としては、例えば、ポリエチレンテレフタレート(PET)等のポリエステル、ポリカーボネート、アクリル樹脂、エポキシ樹脂、ポリウレタン、ポリアミド、ポリオレフィン、セルロース誘導体、及び、シリコーンが挙げられる。金属フィルムとしては、例えば、銅フィルムが挙げられる。
 シート状の熱伝導材料(熱伝導シート)の膜厚は、100~300μmが好ましく、150~250μmがより好ましい。
The heat conductive material obtained by using the composition of the present invention may be used in combination with other members other than the members formed from the present composition.
For example, the sheet-shaped heat conductive material (heat conductive sheet) may be combined with another sheet-shaped support of the layer formed from the present composition.
Examples of the sheet-shaped support include a plastic film, a metal film, or a glass plate. Examples of the material of the plastic film include polyester such as polyethylene terephthalate (PET), polycarbonate, acrylic resin, epoxy resin, polyurethane, polyamide, polyolefin, cellulose derivative, and silicone. Examples of the metal film include a copper film.
The film thickness of the sheet-shaped heat conductive material (heat conductive sheet) is preferably 100 to 300 μm, more preferably 150 to 250 μm.
 また、熱伝導材料(好ましくは熱伝導シート)に対して、接着剤層及び/又は粘着剤層を組み合わせてもよい。
 このような接着剤層及び/又は粘着剤層を介して、熱伝導材料をデバイスのような熱を移動させるべき対象物と接合することで、熱伝導材料と対象物との、より強固な接合を実現できる。
 例えば、熱伝導性多層シートとして、熱伝導シートと、上記熱伝導シートの片面又は両面に設けられた、接着剤層又は粘着剤層と、を有する、熱伝導性多層シートを作製してもよい。
 なお、上記熱伝導シートの片面又は両面には、それぞれ接着剤層及び粘着剤層の一方が設けられていてもよく、両方が設けられていてもよい。上記熱伝導シートの一面に接着剤層が設けられていて、他の面に粘着剤層が設けられていてもよい。また、上記熱伝導シートの片面又は両面には、接着剤層及び/又は粘着剤層が部分的に設けられていてもよく、全面的に設けられていてもよい。
 なお、上述の通り、本発明において熱伝導シート等の熱伝導材料は半硬化状態(半硬化膜)であってもよく、熱伝導性多層シートにおける熱伝導シートが半硬化状態であってもよい。熱伝導性多層シートにおける接着剤層は硬化していてもよく半硬化状態であってもよく未硬化状態であってもよい。
Further, an adhesive layer and / or an adhesive layer may be combined with the heat conductive material (preferably a heat conductive sheet).
By bonding the heat conductive material to an object such as a device to which heat should be transferred through such an adhesive layer and / or an adhesive layer, a stronger bond between the heat conductive material and the object is performed. Can be realized.
For example, as the heat conductive multilayer sheet, a heat conductive multilayer sheet having a heat conductive sheet and an adhesive layer or an adhesive layer provided on one side or both sides of the heat conductive sheet may be produced. ..
In addition, one of the adhesive layer and the pressure-sensitive adhesive layer may be provided on one side or both sides of the heat conductive sheet, respectively, or both may be provided. An adhesive layer may be provided on one surface of the heat conductive sheet, and an adhesive layer may be provided on the other surface. Further, the adhesive layer and / or the adhesive layer may be partially provided on one side or both sides of the heat conductive sheet, or may be provided on the entire surface.
As described above, in the present invention, the heat conductive material such as the heat conductive sheet may be in a semi-cured state (semi-cured film), and the heat conductive sheet in the heat conductive multilayer sheet may be in a semi-cured state. .. The adhesive layer in the heat conductive multilayer sheet may be in a cured state, a semi-cured state, or an uncured state.
[化合物]
 本発明は化合物にも関する。
 本発明の化合物は、本発明の組成物を作製するのに適した化合物である。
 本発明の化合物の一形態は、上述の一般式(Z)で表される化合物であり、その内容は上述の通りである。
 また本発明の化合物の別の一形態は、上述の一般式(Z1)で表される化合物であり、その内容は上述の通りである。
 また本発明の化合物の別の一形態は、上述の一般式(Z2)で表される化合物であり、その内容は上述の通りである。
[Compound]
The present invention also relates to compounds.
The compound of the present invention is a compound suitable for producing the composition of the present invention.
One form of the compound of the present invention is the compound represented by the above-mentioned general formula (Z), and the content thereof is as described above.
Further, another form of the compound of the present invention is a compound represented by the above-mentioned general formula (Z1), and the content thereof is as described above.
Further, another form of the compound of the present invention is a compound represented by the above-mentioned general formula (Z2), and the content thereof is as described above.
 以下に実施例に基づいて本発明を更に詳細に説明する。以下の実施例に示す材料、使用量、割合、処理内容、及び、処理手順等は、本発明の趣旨を逸脱しない限り適宜変更できる。したがって、本発明の範囲は以下に示す実施例により限定的に解釈されるべきではない。 The present invention will be described in more detail below based on examples. The materials, amounts, ratios, treatment contents, treatment procedures, etc. shown in the following examples can be appropriately changed as long as they do not deviate from the gist of the present invention. Therefore, the scope of the invention should not be construed as limiting by the examples shown below.
[組成物の調製及び評価]
〔各種成分〕
 以下に、実施例及び比較例で使用した各種成分を示す。
[Preparation and evaluation of composition]
[Various ingredients]
The various components used in Examples and Comparative Examples are shown below.
<フェノール化合物>
 以下に、実施例及び比較例で使用したフェノール化合物を示す。
 なお、化合物A-1~A-9が特定フェノール化合物である。X-1~X-4は、特定フェノール化合物以外のフェノール化合物である。
<Phenol compound>
The phenolic compounds used in Examples and Comparative Examples are shown below.
The compounds A-1 to A-9 are specific phenol compounds. X-1 to X-4 are phenol compounds other than the specific phenol compound.
Figure JPOXMLDOC01-appb-C000047
Figure JPOXMLDOC01-appb-C000047
Figure JPOXMLDOC01-appb-C000048
Figure JPOXMLDOC01-appb-C000048
Figure JPOXMLDOC01-appb-C000049
Figure JPOXMLDOC01-appb-C000049
・X-4:国際公開第2017/14513の段落[0215]~[0219]に記載の方法に基づいて合成された、カテコールレゾルシノールノボラック樹脂 X-4: Catechol resorcinol novolak resin synthesized according to the method described in paragraphs [0215] to [0219] of International Publication No. 2017/14513.
(A-2の合成方法)
 フェノール化合物であるA-2は、下記スキームに従って合成した。
(A-2 synthesis method)
A-2, which is a phenol compound, was synthesized according to the following scheme.
Figure JPOXMLDOC01-appb-C000050
Figure JPOXMLDOC01-appb-C000050
 塩化シアヌル(74.7g,0.41mol)と2-ブタノン(400ml)を混合した混合液を氷冷したところに、5-アミノ-o-クレゾール(154.6g,1.26mol)を少量ずつ添加した。その後、上記混合液に、酢酸ナトリウム三水和物(110.2g,0.81mol)を水(165ml)に溶解させた水溶液を添加した。上記混合液を80℃で2時間攪拌した後、室温まで冷却し、上記混合液に炭酸ナトリウム(103g,0.97mol)を水(596ml)に溶解させた水溶液を滴下して30分間攪拌した。上記混合液を静置して水相を除去した後、有機相をセライトろ過して、150mlのエタノールを添加した。得られた有機相に、攪拌しながら水(1.91L)を滴下し、2時間攪拌した後、析出した結晶をろ取し、乾燥することで、A-2を得た。 5-Amino-o-cresol (154.6 g, 1.26 mol) was added little by little to an ice-cooled mixture of cyanuric chloride (74.7 g, 0.41 mol) and 2-butanone (400 ml). bottom. Then, an aqueous solution prepared by dissolving sodium acetate trihydrate (110.2 g, 0.81 mol) in water (165 ml) was added to the above mixed solution. The mixed solution was stirred at 80 ° C. for 2 hours, cooled to room temperature, and an aqueous solution prepared by dissolving sodium carbonate (103 g, 0.97 mol) in water (596 ml) was added dropwise to the mixed solution and stirred for 30 minutes. After allowing the above mixed solution to stand still to remove the aqueous phase, the organic phase was filtered through cerite, and 150 ml of ethanol was added. Water (1.91 L) was added dropwise to the obtained organic phase while stirring, and the mixture was stirred for 2 hours, and then the precipitated crystals were collected by filtration and dried to obtain A-2.
(A-3の合成方法)
 上述のA-2の合成方法で使用した5-アミノ-o-クレゾールを4-アミノ-2,6ジメチルフェノールに変更した以外は、A-2の合成方法と同様の手法で、フェノール化合物であるA-3を合成した。
(Synthesis method of A-3)
It is a phenol compound by the same method as the method for synthesizing A-2, except that the 5-amino-o-cresol used in the above-mentioned method for synthesizing A-2 is changed to 4-amino-2,6 dimethylphenol. A-3 was synthesized.
(A-4の合成方法)
 フェノール化合物であるA-4は、下記スキームに従って合成した。
(A-4 synthesis method)
The phenolic compound A-4 was synthesized according to the following scheme.
Figure JPOXMLDOC01-appb-C000051
Figure JPOXMLDOC01-appb-C000051
 塩化シアヌル(87.6g,0.475mol)と2-ブタノン(620ml)を混合した混合液を氷冷したところに、5-アミノ-o-クレゾール(117g,0.95mol)を少量ずつ添加した。その後、上記混合液に、酢酸ナトリウム三水和物(135.8g,0.998mol)を水(193ml)に溶解させた水溶液を添加した。上記混合液を45℃で2時間攪拌した後、室温まで冷却し、上記混合液に炭酸ナトリウム(80.6g,0.76mol)を水(700ml)に溶解させた水溶液を滴下して30分間攪拌した。上記混合液を静置して水相を除去した後、有機相をセライトろ過して、210mlのエタノールを添加した。得られた有機相に、攪拌しながら水(1.75L)を滴下し、2時間攪拌した後、析出した結晶をろ取し、乾燥することで、A-4の中間体を得た。 5-Amino-o-cresol (117 g, 0.95 mol) was added little by little to the place where the mixed solution of cyanuric chloride (87.6 g, 0.475 mol) and 2-butanone (620 ml) was ice-cooled. Then, an aqueous solution prepared by dissolving sodium acetate trihydrate (135.8 g, 0.998 mol) in water (193 ml) was added to the above mixed solution. The mixed solution is stirred at 45 ° C. for 2 hours, cooled to room temperature, and an aqueous solution prepared by dissolving sodium carbonate (80.6 g, 0.76 mol) in water (700 ml) is added dropwise to the mixed solution and stirred for 30 minutes. bottom. After allowing the above mixed solution to stand still to remove the aqueous phase, the organic phase was filtered through cerite, and 210 ml of ethanol was added. Water (1.75 L) was added dropwise to the obtained organic phase while stirring, and the mixture was stirred for 2 hours, and then the precipitated crystals were collected by filtration and dried to obtain an intermediate of A-4.
 A-4の中間体(125.5g,0.35mol)と2-ブタノン(410ml)を混合した混合液に、m-トリジン(37.3g,0.175mol)を添加した。上記混合液に、水(170ml)を添加し、80℃で2時間攪拌した後、室温まで冷却した。上記混合液に、炭酸ナトリウム(29.8g,0.28mol)を水(620ml)に溶解させた水溶液を滴下して30分間攪拌した。上記混合液を静置して水相を除去した後、有機相をセライト濾過した。得られた有機相をエバポレーターで溶媒留去し、2-プロパノール(195ml)に溶解させた。得られた溶液を水(2.25L)に滴下し、2時間攪拌した後、析出した結晶をろ取し、乾燥することでA-4を得た。 M-trizine (37.3 g, 0.175 mol) was added to a mixed solution of A-4 intermediate (125.5 g, 0.35 mol) and 2-butanone (410 ml). Water (170 ml) was added to the above mixed solution, and the mixture was stirred at 80 ° C. for 2 hours and then cooled to room temperature. An aqueous solution prepared by dissolving sodium carbonate (29.8 g, 0.28 mol) in water (620 ml) was added dropwise to the above mixed solution, and the mixture was stirred for 30 minutes. The above mixed solution was allowed to stand to remove the aqueous phase, and then the organic phase was filtered through cerite. The obtained organic phase was distilled off with an evaporator and dissolved in 2-propanol (195 ml). The obtained solution was added dropwise to water (2.25 L), stirred for 2 hours, and then the precipitated crystals were collected by filtration and dried to obtain A-4.
(A-5の合成方法)
 上述のA-4の合成方法で使用したm-トリジンをm-フェニレンジアミンに変更した以外は、A-4の合成方法と同様の手法で、フェノール化合物であるA-5を合成した。
(A-5 synthesis method)
A-5, which is a phenol compound, was synthesized by the same method as the method for synthesizing A-4, except that m-tridine used in the above-mentioned method for synthesizing A-4 was changed to m-phenylenediamine.
(A-8の合成方法)
 フェノール化合物であるA-8は、下記スキームに従って合成した。
(A-8 synthesis method)
The phenolic compound A-8 was synthesized according to the following scheme.
Figure JPOXMLDOC01-appb-C000052
Figure JPOXMLDOC01-appb-C000052
 塩化シアヌル(15.5g,0.083mol)と2-ブタノン(75ml)を混合した混合液を氷冷したところに、5-アミノ-o-クレゾール(20.7g,0.168mol)を少量ずつ添加した。その後、上記混合液に、酢酸ナトリウム三水和物(22.8g,0.168mol)を水(32ml)に溶解させた水溶液を添加した。上記混合液を40℃で2時間攪拌した後、m-アミノフェノール(10.1g,0.092mol)を添加し、80℃で2時間攪拌した。上記混合液を室温まで冷却し、上記混合液に炭酸ナトリウム(21.3g,0.20mol)を水(134ml)に溶解させた水溶液を滴下して30分間攪拌した。上記混合液を静置して水相を除去した後、有機相をセライトろ過して、34mlのエタノールを添加した。得られた有機相に、攪拌しながら水(435ml)を滴下し、2時間攪拌した後、析出した結晶をろ取し、乾燥することで、A-8を得た。 5-Amino-o-cresol (20.7 g, 0.168 mol) was added little by little to an ice-cooled mixture of cyanuric chloride (15.5 g, 0.083 mol) and 2-butanone (75 ml). bottom. Then, an aqueous solution prepared by dissolving sodium acetate trihydrate (22.8 g, 0.168 mol) in water (32 ml) was added to the above mixed solution. After stirring the above mixed solution at 40 ° C. for 2 hours, m-aminophenol (10.1 g, 0.092 mol) was added, and the mixture was stirred at 80 ° C. for 2 hours. The mixed solution was cooled to room temperature, and an aqueous solution prepared by dissolving sodium carbonate (21.3 g, 0.20 mol) in water (134 ml) was added dropwise to the mixed solution and stirred for 30 minutes. After allowing the above mixed solution to stand still to remove the aqueous phase, the organic phase was filtered through cerite, and 34 ml of ethanol was added. Water (435 ml) was added dropwise to the obtained organic phase while stirring, and the mixture was stirred for 2 hours, and then the precipitated crystals were collected by filtration and dried to obtain A-8.
(A-9の合成方法)
 フェノール化合物であるA-9は、下記スキームに従って合成した。
(A-9 synthesis method)
The phenolic compound A-9 was synthesized according to the following scheme.
Figure JPOXMLDOC01-appb-C000053
Figure JPOXMLDOC01-appb-C000053
 上述のA-8の合成方法で使用した5-アミノ-o-クレゾールとm-アミノフェノールの使用順序を入れ替えた以外は、A-8の合成方法と同様の手法で、フェノール化合物であるA-9を合成した。 The phenol compound A- 9 was synthesized.
<エポキシ化合物>
 以下に、実施例及び比較例で使用したエポキシ化合物を示す。
 B-8、B-9、及び、B-11は、いずれも数平均分子量300以上の化合物である。
 なお、B-5、B-6、及び、B-7は、液晶性を示すエポキシ化合物である。
<Epoxy compound>
The epoxy compounds used in Examples and Comparative Examples are shown below.
B-8, B-9, and B-11 are all compounds having a number average molecular weight of 300 or more.
B-5, B-6, and B-7 are epoxy compounds exhibiting liquid crystallinity.
Figure JPOXMLDOC01-appb-C000054
Figure JPOXMLDOC01-appb-C000054
Figure JPOXMLDOC01-appb-C000055
Figure JPOXMLDOC01-appb-C000055
Figure JPOXMLDOC01-appb-C000056
Figure JPOXMLDOC01-appb-C000056
<無機物>
 以下に、実施例及び比較例で使用した無機物を示す。
・HP-40:凝集状窒化ホウ素、平均粒径:40μm、水島合金鉄社製
・SGPS:凝集状窒化ホウ素、平均粒径12μm、デンカ社製
・SP-3:鱗片状窒化ホウ素、平均粒径:4μm、デンカ社製
・AA-3:酸化アルミニウム、平均粒径:3μm、住友化学社製
・AA-04:酸化アルミニウム、平均粒径:0.4μm、住友化学社製
<Inorganic matter>
The inorganic substances used in Examples and Comparative Examples are shown below.
・ HP-40: Aggregate boron nitride, average particle size: 40 μm, manufactured by Mizushima Ferroalloy Co., Ltd. ・ SGPS: Aggregate boron nitride, average particle size 12 μm, manufactured by Denka Co., Ltd. ・ SP-3: scaly boron nitride, average particle size : 4 μm, manufactured by Denka AA-3: aluminum oxide, average particle size: 3 μm, manufactured by Sumitomo Chemical Co., Ltd. AA-04: aluminum oxide, average particle size: 0.4 μm, manufactured by Sumitomo Chemical Co., Ltd.
<硬化促進剤>
・C-1:トリスオルトトリルホスフィン
・C-2:トリフェニルホスフィン
・C-3:2PHZ-PW(2-フェニル-4,5-ジヒドロキシメチルイミダゾール)
・C-4:TPP-MK(テトラフェニルホスホニウムテトラ-p-トリルボラート)
・C-5:TBP-LA(テトラ-n-ブチルホスホニウムラウレート)
・C-6:ビス(テトラ-n-ブチルホスホニウム)ピロメリテート
<Hardening accelerator>
-C-1: Tris-orthotrilphosphine-C-2: Triphenylphosphine-C-3: 2PHZ-PW (2-phenyl-4,5-dihydroxymethylimidazole)
C-4: TPP-MK (Tetraphenylphosphonium Tetra-p-Trillbolate)
C-5: TBP-LA (Tetra-n-Butylphosphonium Laurate)
C-6: Bis (tetra-n-butylphosphonium) pyromeritate
<溶媒>
 溶媒として、シクロペンタノンを使用した。
<Solvent>
Cyclopentanone was used as the solvent.
<表面修飾剤>
 表面修飾剤として、KBM-573(N-フェニル-3-アミノプロピルトリメトキシシラン、信越シリコーン社製)を使用した。
<Surface modifier>
KBM-573 (N-phenyl-3-aminopropyltrimethoxysilane, manufactured by Shinetsu Silicone Co., Ltd.) was used as a surface modifier.
〔組成物の調製〕
 下記表1に示す組み合わせのエポキシ化合物とフェノール化合物とを、当量(エポキシ化合物のエポキシ基の数と、フェノール化合物の水酸基の数とが等しくなる量)で配合した混合体を調製した。
 上記混合体、溶媒、所望に応じて使用する表面修飾剤、及び、硬化促進剤の順で混合した後、無機物を添加した。得られた混合物を自転公転ミキサー(THINKY社製、あわとり練太郎ARE-310)で5分間処理して、各実施例又は比較例の組成物(硬化性組成物)を得た。
[Preparation of composition]
A mixture was prepared by blending the epoxy compound and the phenol compound of the combination shown in Table 1 below in an equivalent amount (the amount in which the number of epoxy groups of the epoxy compound and the number of hydroxyl groups of the phenol compound are equal).
After mixing the above mixture, solvent, surface modifier to be used if desired, and curing accelerator in this order, an inorganic substance was added. The obtained mixture was treated with a rotation / revolution mixer (Awatori Rentaro ARE-310, manufactured by THINKY) for 5 minutes to obtain a composition (curable composition) of each Example or Comparative Example.
 ここで、溶媒の添加量は、組成物の固形分濃度が50~80質量%になる量とした。
 なお、組成物の固形分濃度は、組成物の粘度がそれぞれ同程度になるように、上記範囲内で組成物ごとに調整した。
 組成物中、エポキシ化合物とフェノール化合物との合計含有量(上記混合体の含有量)は、組成物の全固形分に対して、表1中の「合計量(質量%)」欄に示す量になるようにした。
 組成物中、硬化促進剤、表面修飾剤、無機窒化物、無機酸化物の量は、それぞれ、組成物の全固形分に対して、表1中の「(質量%)」として示す量になるようにした。
Here, the amount of the solvent added was set so that the solid content concentration of the composition was 50 to 80% by mass.
The solid content concentration of the composition was adjusted for each composition within the above range so that the viscosities of the compositions were about the same.
The total content of the epoxy compound and the phenol compound (content of the above mixture) in the composition is the amount shown in the "total amount (mass%)" column in Table 1 with respect to the total solid content of the composition. I tried to become.
The amounts of the curing accelerator, the surface modifier, the inorganic nitride, and the inorganic oxide in the composition are the amounts shown as "(mass%)" in Table 1 with respect to the total solid content of the composition, respectively. I did it.
[評価]
〔熱伝導率の評価〕
<半硬化シート(半硬化膜)の作製>
 マイクロメーター付きアプリケーターを用いて、離型処理したPETフィルム(PET756501リンテック社製、膜厚75μm)の離型面上に、調製した組成物を均一に塗布し、120℃で4分間乾燥して半硬化シート(半硬化膜)を作製した。
 上記半硬化シートについて、明細書中に記載の方法で反応率を確認したところ、いずれの組成物を用いて作製した半硬化シートの反応率も、1%以上50%以下であることが確認された。
[evaluation]
[Evaluation of thermal conductivity]
<Preparation of semi-cured sheet (semi-cured film)>
Using an applicator with a micrometer, the prepared composition was uniformly applied on the mold release surface of the release-treated PET film (PET756501 Lintec, film thickness 75 μm), dried at 120 ° C. for 4 minutes, and half. A cured sheet (semi-cured film) was prepared.
When the reaction rate of the semi-cured sheet was confirmed by the method described in the specification, it was confirmed that the reaction rate of the semi-cured sheet prepared using any of the compositions was 1% or more and 50% or less. rice field.
<熱伝導シートの作製>
 得られた半硬化シートに離型処理したPETフィルムを被せ、空気下で熱プレス(熱板温度180℃、圧力20MPaで5分間処理)した。その後、常圧下で180℃で90分加熱処理して樹脂シートを得た。樹脂シートの両面にあるPETフィルムを剥がし、平均膜厚120μmの熱伝導性シート(熱伝導材料)を得た。
<Making a heat conductive sheet>
The obtained semi-cured sheet was covered with a release-treated PET film and heat-pressed under air (hot plate temperature 180 ° C., pressure 20 MPa for 5 minutes). Then, it was heat-treated at 180 ° C. for 90 minutes under normal pressure to obtain a resin sheet. The PET films on both sides of the resin sheet were peeled off to obtain a heat conductive sheet (heat conductive material) having an average thickness of 120 μm.
<評価方法>
 得られた熱伝導シートについて、以下の方法で熱伝導率を測定した。
(1)NETZSCH社製の「LFA467」を用いて、レーザーフラッシュ法で熱伝導性シートの厚み方向の熱拡散率を測定した。
(2)メトラー・トレド社製の天秤「XS204」を用いて、熱伝導性シートの比重をアルキメデス法(「固体比重測定キット」使用)で測定した。
(3)セイコーインスツル社製の「DSC320/6200」を用い、10℃/分の昇温条件の下、25℃における熱伝導性シートの比熱を求めた。
(4)得られた熱拡散率に比重及び比熱を乗じて、熱伝導性シートの熱伝導率を算出した。
<Evaluation method>
The thermal conductivity of the obtained heat conductive sheet was measured by the following method.
(1) Using "LFA467" manufactured by NETZSCH, the thermal diffusivity in the thickness direction of the heat conductive sheet was measured by a laser flash method.
(2) The specific gravity of the heat conductive sheet was measured by the Archimedes method (using the "solid specific gravity measurement kit") using the balance "XS204" manufactured by METTLER TOLEDO.
(3) Using "DSC320 / 6200" manufactured by Seiko Instruments Inc., the specific heat of the heat conductive sheet at 25 ° C. was determined under the heating condition of 10 ° C./min.
(4) The obtained thermal diffusivity was multiplied by the specific gravity and the specific heat to calculate the thermal conductivity of the heat conductive sheet.
 測定された熱伝導率を下記基準に照らして区分し、熱伝導性を評価した。
A:15W/m・K以上
B:13W/m・K以上15W/m・K未満
C:13W/m・K未満
The measured thermal conductivity was classified according to the following criteria, and the thermal conductivity was evaluated.
A: 15W / m ・ K or more B: 13W / m ・ K or more and less than 15W / m ・ K C: 13W / m ・ K or less
〔発熱ピーク温度の測定〕
 上記熱伝導率の評価において示したのと同様にして半硬化シートを作製した。
 セイコーインスツル社製の「DSC320/6200」を用いて、得られた半硬化シートの10℃/分の昇温条件の下で反応挙動を測定し、明細書中に記載の方法で、発熱ピーク温度を測定した。
 測定された、発熱ピーク温度を、下記基準に照らして区分し、を評価した。
 なお、いずれの組成物でも、発熱ピーク温度は220℃以下に存在した。
A:150℃以上
B:140℃以上150℃未満
C:130℃以上140℃未満
D:130℃未満
[Measurement of exothermic peak temperature]
A semi-cured sheet was prepared in the same manner as shown in the above evaluation of thermal conductivity.
Using "DSC320 / 6200" manufactured by Seiko Instruments Inc., the reaction behavior was measured under the temperature rise condition of 10 ° C./min of the obtained semi-cured sheet, and the exothermic peak was measured by the method described in the specification. The temperature was measured.
The measured exothermic peak temperature was classified according to the following criteria and evaluated.
In each composition, the exothermic peak temperature was 220 ° C. or lower.
A: 150 ° C or higher B: 140 ° C or higher and lower than 150 ° C C: 130 ° C or higher and lower than 140 ° C D: less than 130 ° C
〔絶縁破壊電圧(耐電圧)の評価〕
 上記熱伝導率の評価において示したのと同様にして作製した熱伝導性シートの、23℃相対湿度65%における絶縁破壊電圧(耐電圧)を、耐電圧試験機(菊水電子工業(株)製)を用いて測定した。
[Evaluation of dielectric breakdown voltage (withstand voltage)]
The breakdown voltage (withstand voltage) of the heat conductive sheet produced in the same manner as shown in the above evaluation of thermal conductivity at 23 ° C. and 65% relative humidity was measured by a withstand voltage tester (Kikusui Denshi Kogyo Co., Ltd.). ) Was used for measurement.
 測定された絶縁破壊電圧(耐電圧)を熱伝導性シートの膜厚が200μmである場合の絶縁破壊電圧(耐電圧)に換算した。換算された絶縁破壊電圧(耐電圧)を、下記基準に照らして区分し、を評価した。
A:10kV以上
B:8kV以上10kV未満
C:8kV未満
The measured dielectric breakdown voltage (withstand voltage) was converted into the dielectric breakdown voltage (withstand voltage) when the thickness of the heat conductive sheet was 200 μm. The converted breakdown voltage (withstand voltage) was classified according to the following criteria and evaluated.
A: 10 kV or more B: 8 kV or more and less than 10 kV C: less than 8 kV
〔ピール強度の評価〕
 上記熱伝導率の評価において示したのと同様にして半硬化シート(PETフィルム付き半硬化シート)を作製した。
 PETフィルム付き半硬化シートからポリエステルフィルムを剥がし、得られた半硬化シートを20mm×60mmの短冊状に切り出し、被着体である電解銅箔(20mm×100mm、厚み:35μm)とアルミニウム板(30mm×60mm、厚み:1mm)の間に挟んだ。得られた積層体を、空気下で熱プレス処理(熱板温度180℃、圧力20MPaで5分間処理した後、熱板温度180℃、常圧下で90分間処理)することにより、熱伝導シートと被着体とが一体化した銅箔付きアルミベース基板を得た。
 得られたサンプルの銅箔ピール強度を、デジタルフォースゲージ(ZTS-200N、株式会社イマダ製)と90度剥離試験治具(P90-200N-BB、株式会社イマダ製)を用いて、JIS C 6481に記載の常態での引きはがし強さの測定方法に従って測定した。ピール強度試験における銅箔の剥離は、銅箔付きアルミベース基板に対して90°の角度で、50mm/分の剥離速度で実施した。
[Evaluation of peel strength]
A semi-cured sheet (semi-cured sheet with PET film) was produced in the same manner as shown in the above evaluation of thermal conductivity.
The polyester film is peeled off from the semi-cured sheet with PET film, and the obtained semi-cured sheet is cut into strips of 20 mm × 60 mm, and the electrolytic copper foil (20 mm × 100 mm, thickness: 35 μm) and the aluminum plate (30 mm) which are the adherends are cut out. It was sandwiched between × 60 mm, thickness: 1 mm). The obtained laminate was heat-pressed under air (hot plate temperature 180 ° C., pressure 20 MPa for 5 minutes, then hot plate temperature 180 ° C., normal pressure for 90 minutes) to obtain a heat conductive sheet. An aluminum base substrate with a copper foil integrated with the adherend was obtained.
The copper foil peel strength of the obtained sample was measured by using a digital force gauge (ZTS-200N, manufactured by Imada Co., Ltd.) and a 90-degree peeling test jig (P90-200N-BB, manufactured by Imada Co., Ltd.) to JIS C 6481. It was measured according to the method for measuring the peeling strength in the normal state described in 1. The peeling of the copper foil in the peel strength test was performed at an angle of 90 ° with respect to the aluminum base substrate with the copper foil at a peeling rate of 50 mm / min.
 測定された引きはがし強さ(ピール強度)を下記基準に照らして区分し、評価した。
A:5N/cm以上
B:4N/cm以上5N/cm未満
C:4N/cm未満
The measured peel strength (peeling strength) was classified and evaluated according to the following criteria.
A: 5N / cm or more B: 4N / cm or more and less than 5N / cm C: less than 4N / cm
〔ハンドリング性(経時保存性)の評価〕
 上記熱伝導率の評価において示したのと同様にして半硬化シートを作製し、その後1日(24時間)、室温(25℃)で静置した。
 静置後の半硬化シートを、5cm×10cmの短冊状に切り出し、折り曲げ試験用のサンプルを作製した。得られたサンプルについて、円筒形マンドレル試験機(コーテック株式会社製)を用いて、JIS K 5600-5-1に記載の方法に従って、折り曲げ試験を行った。それぞれの直径が32mm、25mm、及び、20mmである円筒形マンドレルを使用し、サンプルが破断又は破損したときの折り曲げ試験に使用したマンドレルの直径から、下記の評価基準に基づいて作製1日後の半硬化シートのハンドリング性を評価した。
 サンプルが破断したときに使用したマンドレルの直径が短いほど、半硬化シートの経時保存性がより優れる。
 なお、作製直後の半硬化シートで折り曲げ試験をした場合は、いずれの半硬化シートも直径25mmのマンドレルを使用しても破損しなかった。
[Evaluation of handleability (preservation over time)]
A semi-cured sheet was prepared in the same manner as shown in the above evaluation of thermal conductivity, and then allowed to stand at room temperature (25 ° C.) for 1 day (24 hours).
The semi-cured sheet after standing was cut into strips of 5 cm × 10 cm to prepare a sample for a bending test. The obtained sample was subjected to a bending test using a cylindrical mandrel testing machine (manufactured by Cortec Co., Ltd.) according to the method described in JIS K 5600-5-1. Using cylindrical mandrel with diameters of 32 mm, 25 mm, and 20 mm, respectively, from the diameter of the mandrel used for the bending test when the sample was broken or broken, half a day after preparation based on the following evaluation criteria. The handleability of the cured sheet was evaluated.
The shorter the diameter of the mandrel used when the sample broke, the better the shelf life of the semi-cured sheet.
When the bending test was performed on the semi-cured sheet immediately after production, none of the semi-cured sheets was damaged even when a mandrel having a diameter of 25 mm was used.
 破断時のマンドレルの直径を下記基準に照らして区分し、ハンドリング性(経時保存性)を評価した。
A:20mmで破損がない
B:25mmで破損せず、20mmで破損
C:25mmで破損
The diameter of the mandrel at the time of fracture was classified according to the following criteria, and the handleability (preservability over time) was evaluated.
A: No damage at 20 mm B: No damage at 25 mm, damage at 20 mm C: Damage at 25 mm
[結果]
 以下、表1を示す。
 なお、一つのマス内に二種以上の同種成分が比の値ともに記載されている場合、それらの同種成分を記載された比(質量比)で使用されていることを示す。例えば、実施例77は、エポキシ化合物であるB-3/B-9を、50/50(質量比)で含んでいる。
[result]
Table 1 is shown below.
In addition, when two or more kinds of the same kind of components are described together with the value of the ratio in one mass, it indicates that those the same kind of components are used in the described ratio (mass ratio). For example, Example 77 contains the epoxy compound B-3 / B-9 in a 50/50 (mass ratio).
Figure JPOXMLDOC01-appb-T000057
Figure JPOXMLDOC01-appb-T000057
Figure JPOXMLDOC01-appb-T000058
Figure JPOXMLDOC01-appb-T000058
Figure JPOXMLDOC01-appb-T000059
Figure JPOXMLDOC01-appb-T000059
Figure JPOXMLDOC01-appb-T000060
Figure JPOXMLDOC01-appb-T000060
 表に示す結果より、本発明の組成物を使用すれば本発明の効果を実現できることが確認された。 From the results shown in the table, it was confirmed that the effect of the present invention can be realized by using the composition of the present invention.
 また、フェノール化合物として、要件1を満たすフェノール化合物として一般式(Y)におけるmyが1であるフェノール化合物を使用するか、又は、要件2を満たすフェノール化合物を使用する場合、得られる熱伝導材料の熱伝導性及び/又はピール強度がより優れることが確認された(エポキシ化合物としてB-2を使用する実施例の結果の比較等を参照)。 Further, as the phenol compound, when the phenol compound having my of 1 in the general formula (Y) is used as the phenol compound satisfying the requirement 1, or when the phenol compound satisfying the requirement 2 is used, the obtained heat conductive material It was confirmed that the thermal conductivity and / or peel strength was better (see comparison of the results of the examples using B-2 as the epoxy compound, etc.).
 エポキシ化合物として、液晶性を示すエポキシ化合物、又は、一般式(DN)で表されるエポキシ化合物を使用する場合、得られる熱伝導材料の熱伝導性及び/又はピール強度がより優れることが確認された(エポキシ化合物としてB-4、B-6、B-7、又は、B-8を使用する実施例の結果等を参照)。 When an epoxy compound exhibiting liquid liquidity or an epoxy compound represented by the general formula (DN) is used as the epoxy compound, it has been confirmed that the obtained heat conductive material has more excellent heat conductivity and / or peel strength. (See the results of examples in which B-4, B-6, B-7, or B-8 is used as the epoxy compound).
 柔軟な構造であるか成形性に優れるエポキシ化合物として、ビスフェノールF型エポキシ化合物、一般式(E1)で表されるエポキシ化合物、又は、ジグリシジルアミノ基を有するエポキシ化合物を使用する場合、組成物から形成される半硬化シートの保存安定性がより優れることが確認された(エポキシ化合物としてB-3、B-10、B-13、B-14、又は、B-15を使用する実施例の結果等を参照)。 When a bisphenol F type epoxy compound, an epoxy compound represented by the general formula (E1), or an epoxy compound having a diglycidylamino group is used as the epoxy compound having a flexible structure or excellent moldability, the composition is used. It was confirmed that the semi-cured sheet formed had better storage stability (results of Examples using B-3, B-10, B-13, B-14, or B-15 as the epoxy compound). Etc.).
 エポキシ化合物が芳香環基を有する場合、熱伝導材料の熱伝導性がより優れることが確認された(フェノール化合物としてA-3を使用する実施例同士を比較すると、芳香環基を有するエポキシ化合物を使用している場合は、いずれも熱伝導性がA評価である)。 It was confirmed that when the epoxy compound has an aromatic ring group, the thermal conductivity of the heat conductive material is more excellent (comparing the examples using A-3 as the phenol compound, the epoxy compound having an aromatic ring group is used. When used, thermal conductivity is rated A).
 また、ビスフェノールF型エポキシ化合物とフェノキシ樹脂とを使用する場合、ビスフェノールF型エポキシ化合物とフェノールノボラック型エポキシ化合物とを使用する場合、ポリヒドロキシベンゼン型エポキシ化合物とフェノールノボラック型エポキシ化合物とを使用する場合、本発明の効果をよりバランスよく実現できることが確認された(実施例77~80の結果等を参照)。 When a bisphenol F type epoxy compound and a phenoxy resin are used, when a bisphenol F type epoxy compound and a phenol novolac type epoxy compound are used, and when a polyhydroxybenzene type epoxy compound and a phenol novolac type epoxy compound are used. It was confirmed that the effects of the present invention can be realized in a more balanced manner (see the results of Examples 77 to 80, etc.).
 フェノール化合物として、一般式(Z2)で表される化合物を使用した場合、組成物から形成される半硬化シートの保存安定性がより優れ、熱伝導性等の成績もより良好になることが確認された(フェノール化合物としてA-8又はA-9を使用する実施例の結果等を参照)。
 これは、要件2を満たすフェノール化合物が、「フェノール性水酸基とフェノール性水酸基のオルト位に配置された置換基とを有する芳香環基」と、それ以外の「フェノール性水酸基を有する芳香環基」との両方を有することによって、化合物の対称性が崩れて融点が低下し、その結果、硬化時における良好な熱伝導性等を維持しながら半硬化時における柔軟性が導入されたためと考えられる。
It was confirmed that when a compound represented by the general formula (Z2) was used as the phenol compound, the storage stability of the semi-cured sheet formed from the composition was better, and the results such as thermal conductivity were also better. (See the results of examples using A-8 or A-9 as the phenolic compound, etc.).
This is because the phenol compound satisfying the requirement 2 is "an aromatic ring group having a phenolic hydroxyl group and a substituent arranged at the ortho position of the phenolic hydroxyl group" and another "aromatic ring group having a phenolic hydroxyl group". It is considered that by having both of the above, the symmetry of the compound is broken and the melting point is lowered, and as a result, the flexibility at the time of semi-curing is introduced while maintaining the good thermal conductivity at the time of curing.
 硬化促進剤の含有量が、組成物の全固形分に対して0.07質量%以上である場合、得られる熱伝導材料の熱伝導性及び/又は耐電圧がより優れることが確認された(実施例97と103の結果の比較等を参照)。これは、硬化促進剤の含有量が十分に存在することで、硬化反応の反応率が良好になったためと考えられる。
 硬化促進剤の含有量が、組成物の全固形分に対して2質量%以下である場合、本発明の効果がより優れることが確認された(実施例111と112の結果の比較等を参照)。これは、硬化促進剤の含有量が一定量以下であることで、硬化促進剤自体が不純物として熱伝導材料の諸性能を阻害する要因になることを回避できたためと考えられる。
It was confirmed that when the content of the curing accelerator was 0.07% by mass or more with respect to the total solid content of the composition, the heat conductivity and / or withstand voltage of the obtained heat conductive material was more excellent ( See comparison of results of Examples 97 and 103, etc.). It is considered that this is because the reaction rate of the curing reaction was improved due to the sufficient content of the curing accelerator.
It was confirmed that the effect of the present invention was more excellent when the content of the curing accelerator was 2% by mass or less based on the total solid content of the composition (see comparison of the results of Examples 111 and 112, etc.). ). It is considered that this is because the content of the curing accelerator is not more than a certain amount, so that the curing accelerator itself can be prevented from becoming a factor that impairs various performances of the heat conductive material as an impurity.

Claims (15)

  1.  フェノール化合物、エポキシ化合物、硬化促進剤、及び、無機物を含む、硬化性組成物であって、
     前記フェノール化合物が、要件1及び要件2の少なくとも一方を満たし、
     前記無機物の含有量が、全固形分に対して、10質量%超である、硬化性組成物。
     要件1:一般式(Y)で表される化合物である。
     要件2:トリアジン骨格を有し、かつ、フェノール性水酸基と前記フェノール性水酸基のオルト位に配置された置換基とを有する芳香環基を有するフェノール化合物である。
    Figure JPOXMLDOC01-appb-C000001

     一般式(Y)中、myは0以上の整数を表す。
     RY1及びRY2は、それぞれ独立に、フェノール性水酸基と前記フェノール性水酸基のオルト位に配置された炭素数1~6の置換基とを有する芳香環基を表す。
     LY1及びLY2は、それぞれ独立に、-C(RY5)(RY6)-、又は、-CO-を表す。
     RY3~RY6は、それぞれ独立に、水素原子又は置換基を表す。
    A curable composition comprising a phenol compound, an epoxy compound, a curing accelerator, and an inorganic substance.
    The phenolic compound satisfies at least one of Requirement 1 and Requirement 2.
    A curable composition in which the content of the inorganic substance is more than 10% by mass with respect to the total solid content.
    Requirement 1: A compound represented by the general formula (Y).
    Requirement 2: A phenol compound having a triazine skeleton and having an aromatic ring group having a phenolic hydroxyl group and a substituent arranged at the ortho position of the phenolic hydroxyl group.
    Figure JPOXMLDOC01-appb-C000001

    In the general formula (Y), my represents an integer of 0 or more.
    RY1 and RY2 each independently represent an aromatic ring group having a phenolic hydroxyl group and a substituent having 1 to 6 carbon atoms arranged at the ortho position of the phenolic hydroxyl group.
    LY1 and LY2 independently represent -C ( RY5 ) ( RY6)-or- CO-, respectively.
    RY3 to RY6 independently represent a hydrogen atom or a substituent.
  2.  前記硬化性組成物を用いて形成される半硬化シートを示差走査熱量計で測定した場合に、発熱ピークが検出される温度が、140℃以上となる、請求項1に記載の硬化性組成物。 The curable composition according to claim 1, wherein the temperature at which the exothermic peak is detected is 140 ° C. or higher when the semi-curable sheet formed by using the curable composition is measured by a differential scanning calorimeter. ..
  3.  前記エポキシ化合物の分子量が、300以上である、請求項1又は2に記載の硬化性組成物。 The curable composition according to claim 1 or 2, wherein the epoxy compound has a molecular weight of 300 or more.
  4.  前記無機物が、平均粒径が20μm以上である凝集状窒化ホウ素を含む、請求項1~3のいずれか1項に記載の硬化性組成物。 The curable composition according to any one of claims 1 to 3, wherein the inorganic substance contains aggregated boron nitride having an average particle size of 20 μm or more.
  5.  前記フェノール化合物が、一般式(Z)で表される化合物を含む、請求項1~4のいずれか1項に記載の硬化性組成物。
    Figure JPOXMLDOC01-appb-C000002

     一般式(Z)中、rは0以上の整数を表す。
     k、l、m、及び、nは、それぞれ独立に、0以上の整数を表す。
     ただし、k、l、r×m、及び、nの合計は2以上である。
     Lは、2価の有機基を表す。
     E~Eは、それぞれ独立に、単結合、-NH-、又は、-NR-を表す。Rは、置換基を表す。
     Bは、単結合又はk+1価の有機基を表す。
     Bは、単結合又はl+1価の有機基を表す。
     Bは、単結合又はm+1価の有機基を表す。
     Bは、単結合又はn+1価の有機基を表す。
     X~X4は、それぞれ独立に、フェノール性水酸基を有する芳香環基を表す。
     ただし、k個存在するX、l個存在するX、r×m個存在するX、及び、n個存在するXのうちの少なくとも1個は、フェノール性水酸基と前記フェノール性水酸基のオルト位に配置された置換基とを有する芳香環基を表す。
    The curable composition according to any one of claims 1 to 4, wherein the phenol compound contains a compound represented by the general formula (Z).
    Figure JPOXMLDOC01-appb-C000002

    In the general formula (Z), r represents an integer of 0 or more.
    k, l, m, and n each independently represent an integer of 0 or more.
    However, the total of k, l, r × m, and n is 2 or more.
    L represents a divalent organic group.
    E 1 to E 6 independently represent a single bond, -NH-, or -NR-. R represents a substituent.
    B 1 represents a single bond or a k + 1 valent organic group.
    B 2 represents a single bond or an l + 1 valent organic group.
    B 3 represents a single bond or m + 1 valent organic group.
    B 4 represents a single bond or n + 1 valent organic group.
    X 1 to X 4 each independently represent an aromatic ring group having a phenolic hydroxyl group.
    However, at least one of k X 1 , l X 2 , r × m X 3 , and n X 4 is a phenolic hydroxyl group and the phenolic hydroxyl group. Represents an aromatic ring group having a substituent arranged at the ortho position.
  6.  前記フェノール化合物が、一般式(Z1)で表される化合物を含む、請求項1~5のいずれか1項に記載の硬化性組成物。
    Figure JPOXMLDOC01-appb-C000003

     一般式(Z1)中、rは0以上の整数を表す。
     Lは、2価の有機基を表す。
     Rは、水素原子又は置換基を表す。
     ただし、一般式(Z1)中に(3+r)個存在するRの少なくとも1個は置換基を表す。
     また、一般式(Z1)中に(3+r)個存在するRの少なくとも1個は水素原子を表す。
    The curable composition according to any one of claims 1 to 5, wherein the phenol compound contains a compound represented by the general formula (Z1).
    Figure JPOXMLDOC01-appb-C000003

    In the general formula (Z1), r represents an integer of 0 or more.
    L represents a divalent organic group.
    R Z represents a hydrogen atom or a substituent.
    Provided that at least one of R Z which in the general formula (Z1) (3 + r) pieces there is a substituent.
    Further, at least one of R Z which in the general formula (Z1) (3 + r) pieces there is a hydrogen atom.
  7.  前記フェノール化合物が、一般式(Z2)で表される化合物を含む、請求項1~6のいずれか1項に記載の硬化性組成物。
    Figure JPOXMLDOC01-appb-C000004

     一般式(Z2)中、Rは、水素原子又は置換基を表す。
     ただし、一般式(Z2)中に2個存在するRの少なくとも一方は置換基を表す。
    The curable composition according to any one of claims 1 to 6, wherein the phenol compound contains a compound represented by the general formula (Z2).
    Figure JPOXMLDOC01-appb-C000004

    In the general formula (Z2), R Z represents a hydrogen atom or a substituent.
    Provided that at least one of the two existing R Z in the general formula (Z2) represents a substituent.
  8.  前記硬化促進剤が、リン原子を含む化合物を含む、請求項1~7のいずれか1項に記載の硬化性組成物。 The curable composition according to any one of claims 1 to 7, wherein the curing accelerator contains a compound containing a phosphorus atom.
  9.  前記硬化促進剤が、ホスホニウム塩を含む、請求項1~8のいずれか1項に記載の硬化性組成物。 The curable composition according to any one of claims 1 to 8, wherein the curing accelerator contains a phosphonium salt.
  10.  請求項1~9のいずれか1項に記載の硬化性組成物を硬化して得られる、熱伝導材料。 A heat conductive material obtained by curing the curable composition according to any one of claims 1 to 9.
  11.  請求項10に記載の熱伝導材料からなる、熱伝導シート。 A heat conductive sheet made of the heat conductive material according to claim 10.
  12.  デバイスと、前記デバイス上に配置された請求項11に記載の熱伝導シートを含む熱伝導層とを有する、熱伝導層付きデバイス。 A device with a heat conductive layer having a device and a heat conductive layer including the heat conductive sheet according to claim 11 arranged on the device.
  13.  一般式(Z)で表される、化合物。
    Figure JPOXMLDOC01-appb-C000005

     一般式(Z)中、rは0以上の整数を表す。
     k、l、m、及び、nは、それぞれ独立に、0以上の整数を表す。
     ただし、k、l、r×m、及び、nの合計は2以上である。
     Lは、2価の有機基を表す。
     E~Eは、それぞれ独立に、単結合、-NH-、又は、-NR-を表す。Rは、置換基を表す。
     Bは、単結合又はk+1価の有機基を表す。
     Bは、単結合又はl+1価の有機基を表す。
     Bは、単結合又はm+1価の有機基を表す。
     Bは、単結合又はn+1価の有機基を表す。
     X~X4は、それぞれ独立に、フェノール性水酸基を有する芳香環基を表す。
     ただし、k個存在するX、l個存在するX、r×m個存在するX、及び、n個存在するXのうちの少なくとも1個は、フェノール性水酸基と前記フェノール性水酸基のオルト位に配置された置換基とを有する芳香環基を表す。
    A compound represented by the general formula (Z).
    Figure JPOXMLDOC01-appb-C000005

    In the general formula (Z), r represents an integer of 0 or more.
    k, l, m, and n each independently represent an integer of 0 or more.
    However, the total of k, l, r × m, and n is 2 or more.
    L represents a divalent organic group.
    E 1 to E 6 independently represent a single bond, -NH-, or -NR-. R represents a substituent.
    B 1 represents a single bond or a k + 1 valent organic group.
    B 2 represents a single bond or an l + 1 valent organic group.
    B 3 represents a single bond or m + 1 valent organic group.
    B 4 represents a single bond or n + 1 valent organic group.
    X 1 to X 4 each independently represent an aromatic ring group having a phenolic hydroxyl group.
    However, at least one of k X 1 , l X 2 , r × m X 3 , and n X 4 is a phenolic hydroxyl group and the phenolic hydroxyl group. Represents an aromatic ring group having a substituent arranged at the ortho position.
  14.  一般式(Z1)で表される、請求項13に記載の化合物。
    Figure JPOXMLDOC01-appb-C000006

     一般式(Z1)中、rは0以上の整数を表す。
     Lは、2価の有機基を表す。
     Rは、水素原子又は置換基を表す。
     ただし、一般式(Z1)中に(3+r)個存在するRの少なくとも1個は置換基を表す。
     また、一般式(Z1)中に(3+r)個存在するRの少なくとも1個は水素原子を表す。
    The compound according to claim 13, which is represented by the general formula (Z1).
    Figure JPOXMLDOC01-appb-C000006

    In the general formula (Z1), r represents an integer of 0 or more.
    L represents a divalent organic group.
    R Z represents a hydrogen atom or a substituent.
    Provided that at least one of R Z which in the general formula (Z1) (3 + r) pieces there is a substituent.
    Further, at least one of R Z which in the general formula (Z1) (3 + r) pieces there is a hydrogen atom.
  15.  一般式(Z2)で表される、請求項13又は14に記載の化合物。
    Figure JPOXMLDOC01-appb-C000007

     一般式(Z2)中、Rは、水素原子又は置換基を表す。
     ただし、一般式(Z2)中に2個存在するRの少なくとも一方は置換基を表す。
    The compound according to claim 13 or 14, represented by the general formula (Z2).
    Figure JPOXMLDOC01-appb-C000007

    In the general formula (Z2), R Z represents a hydrogen atom or a substituent.
    Provided that at least one of the two existing R Z in the general formula (Z2) represents a substituent.
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Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09227432A (en) * 1996-02-23 1997-09-02 Honshu Chem Ind Co Ltd New tetrakisphenol compound
JP2003502412A (en) * 1999-06-23 2003-01-21 パーカー ヒューズ インスティテュート Melamine derivatives as potent anticancer agents
JP2010095645A (en) * 2008-10-17 2010-04-30 Hitachi Chem Co Ltd Epoxy resin composition having low coefficient of thermal expansion
JP2010254951A (en) * 2009-03-31 2010-11-11 Hitachi Chem Co Ltd Liquid resin composition for electronic part, and electronic part device
JP2011500751A (en) * 2007-10-25 2011-01-06 ロレアル S-triazine derivatives containing at least two specific silaneaminobenzoate or silaneaminobenzamide groups; photoprotective cosmetic compositions containing these derivatives; use of said S-triazine derivatives
WO2019017053A1 (en) * 2017-07-19 2019-01-24 京セラ株式会社 Resin composition for sealing sheet, sealing sheet and semiconductor device
WO2019054707A1 (en) * 2017-09-13 2019-03-21 주식회사 트리엘 Novel triazine derivative and photosensitive composition comprising same
WO2019203292A1 (en) * 2018-04-20 2019-10-24 三菱瓦斯化学株式会社 Thermal curing composition, prepreg, laminate, metal-foil-clad laminate, printed circuit board, and multi-layer printed circuit board
WO2019240079A1 (en) * 2018-06-12 2019-12-19 日立化成株式会社 Curable resin composition and electronic component device

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09227432A (en) * 1996-02-23 1997-09-02 Honshu Chem Ind Co Ltd New tetrakisphenol compound
JP2003502412A (en) * 1999-06-23 2003-01-21 パーカー ヒューズ インスティテュート Melamine derivatives as potent anticancer agents
JP2011500751A (en) * 2007-10-25 2011-01-06 ロレアル S-triazine derivatives containing at least two specific silaneaminobenzoate or silaneaminobenzamide groups; photoprotective cosmetic compositions containing these derivatives; use of said S-triazine derivatives
JP2010095645A (en) * 2008-10-17 2010-04-30 Hitachi Chem Co Ltd Epoxy resin composition having low coefficient of thermal expansion
JP2010254951A (en) * 2009-03-31 2010-11-11 Hitachi Chem Co Ltd Liquid resin composition for electronic part, and electronic part device
WO2019017053A1 (en) * 2017-07-19 2019-01-24 京セラ株式会社 Resin composition for sealing sheet, sealing sheet and semiconductor device
WO2019054707A1 (en) * 2017-09-13 2019-03-21 주식회사 트리엘 Novel triazine derivative and photosensitive composition comprising same
WO2019203292A1 (en) * 2018-04-20 2019-10-24 三菱瓦斯化学株式会社 Thermal curing composition, prepreg, laminate, metal-foil-clad laminate, printed circuit board, and multi-layer printed circuit board
WO2019240079A1 (en) * 2018-06-12 2019-12-19 日立化成株式会社 Curable resin composition and electronic component device

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