WO2021225009A1 - Gas dissolution device - Google Patents
Gas dissolution device Download PDFInfo
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- WO2021225009A1 WO2021225009A1 PCT/JP2020/031529 JP2020031529W WO2021225009A1 WO 2021225009 A1 WO2021225009 A1 WO 2021225009A1 JP 2020031529 W JP2020031529 W JP 2020031529W WO 2021225009 A1 WO2021225009 A1 WO 2021225009A1
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- WIPO (PCT)
- Prior art keywords
- gas
- liquid
- dissolution tank
- gas dissolution
- introduction pipe
- Prior art date
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- 238000004090 dissolution Methods 0.000 title claims abstract description 94
- 239000007788 liquid Substances 0.000 claims abstract description 85
- 238000005192 partition Methods 0.000 claims abstract description 25
- 239000000203 mixture Substances 0.000 claims abstract description 18
- 230000008018 melting Effects 0.000 claims description 12
- 238000002844 melting Methods 0.000 claims description 12
- 238000011144 upstream manufacturing Methods 0.000 claims description 7
- 238000007599 discharging Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 description 129
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000003570 air Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/20—Jet mixers, i.e. mixers using high-speed fluid streams
- B01F25/25—Mixing by jets impinging against collision plates
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
- B01F23/234—Surface aerating
- B01F23/2341—Surface aerating by cascading, spraying or projecting a liquid into a gaseous atmosphere
- B01F23/23413—Surface aerating by cascading, spraying or projecting a liquid into a gaseous atmosphere using nozzles for projecting the liquid into the gas atmosphere
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/40—Mixing liquids with liquids; Emulsifying
- B01F23/45—Mixing liquids with liquids; Emulsifying using flow mixing
- B01F23/454—Mixing liquids with liquids; Emulsifying using flow mixing by injecting a mixture of liquid and gas
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/50—Circulation mixers, e.g. wherein at least part of the mixture is discharged from and reintroduced into a receptacle
- B01F25/53—Circulation mixers, e.g. wherein at least part of the mixture is discharged from and reintroduced into a receptacle in which the mixture is discharged from and reintroduced into a receptacle through a recirculation tube, into which an additional component is introduced
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F33/00—Other mixers; Mixing plants; Combinations of mixers
- B01F33/50—Movable or transportable mixing devices or plants
- B01F33/502—Vehicle-mounted mixing devices
Definitions
- the present invention has been devised in view of the above problems, and an object of the present invention is to provide a gas dissolution apparatus in which the gas dissolution concentration is likely to increase and the gas dissolution efficiency is likely to increase as compared with the conventional invention.
- a collision portion is formed so as to form an uneven portion on the ceiling portion, and the introduction pipe discharges air. It is desirable that the liquid mixture is installed so as to collide with the collision portion.
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
Abstract
This gas dissolution device is premised to comprise: a gas dissolution tank (1) in which a gas is dissolved into a liquid; a partition plate (17) that partitions the inside of the gas dissolution tank (1) into an upper chamber (22) and a lower chamber (23); an introduction pipe (6) that introduces a gas-liquid mixture into the gas dissolution tank (1) from the outside; and a discharge pipe conduit (3) that discharges a gas-dissolved liquid from the lower chamber (23) of the gas dissolution tank (1), wherein in the introduction pipe (6), an opening of a down-steam end (6a) faces the center of a ceiling part (13) of the gas dissolution tank (1), and a communication path (17a) that communicates with the upper chamber (22) and the lower chamber (23) is formed at a position offset from the center of the partition plate (17).
Description
本発明は、液体に気体を加圧溶解させる気体溶解装置に関する。
The present invention relates to a gas dissolving device that pressurizes and dissolves a gas in a liquid.
この種の装置は、例えば特許文献１に開示されている。特許文献１に開示されている気体溶解装置は、浴槽内で微細気泡を発生させる微細気泡発生装置に含まれる。同文献の気体溶解装置は、液体に気体を溶解させる気体溶解タンク（特許文献１では「気液溶解タンク」と称している。）と、浴槽から気体溶解タンクのポンプまで設けられた吸込管路と、ポンプから気体溶解タンク内まで設けられた導入管（特許文献１では「流入管路」と称している。）と、気体溶解タンクの出口から浴槽まで設けられた吐出管路を備えている。吸込管路の途中には、気体を導入する気体導入部（特許文献１では「気体導入管」と称している。）が設けられている。気液溶解タンクには、液体が所定の高さまで充填され、液体領域と気体領域が形成される。
This type of device is disclosed in, for example, Patent Document 1. The gas melting device disclosed in Patent Document 1 is included in a fine bubble generator that generates fine bubbles in a bathtub. The gas dissolution device of the same document includes a gas dissolution tank (referred to as a "gas-liquid dissolution tank" in Patent Document 1) that dissolves a gas in a liquid, and a suction pipeline provided from a bathtub to a pump of the gas dissolution tank. It is provided with an introduction pipe (referred to as "inflow pipe" in Patent Document 1) provided from the pump to the inside of the gas dissolution tank, and a discharge pipe provided from the outlet of the gas dissolution tank to the bathtub. .. A gas introduction section (referred to as a "gas introduction pipe" in Patent Document 1) for introducing a gas is provided in the middle of the suction pipe. The gas-liquid dissolution tank is filled with a liquid to a predetermined height, and a liquid region and a gas region are formed.
ポンプを駆動させると、気液溶解タンク内で、導入管から気液混合体が吐出される。吐出された気液混合体は、気液溶解タンクの天井部に設けられた衝突部に衝突する。このとき、局所的に高圧部が形成され、当該高圧部において気体の液体に対する溶解が促進される。衝突部に衝突した気液混合体は、気体領域から液体領域に落下し、気液混合体に含まれる気泡が液体領域に入り込む。液体領域に入り込んだ気泡は、液体領域内の流れによって撹拌されながら、液体に溶解し、次第に小さくなる。液体領域内の流れによって撹拌される気泡の一部は液体とともに、気体溶解タンクの排出口から排出される。排出口から排出される気泡の一部および液体は、吐出管路に流れ出る。
When the pump is driven, the gas-liquid mixture is discharged from the introduction pipe in the gas-liquid dissolution tank. The discharged gas-liquid mixture collides with a collision portion provided on the ceiling of the gas-liquid dissolution tank. At this time, a high-pressure portion is locally formed, and dissolution of the gas in the liquid is promoted in the high-pressure portion. The gas-liquid mixture that collides with the collision portion falls from the gas region to the liquid region, and the bubbles contained in the gas-liquid mixture enter the liquid region. The bubbles that have entered the liquid region dissolve in the liquid while being agitated by the flow in the liquid region, and gradually become smaller. Some of the bubbles agitated by the flow in the liquid region are discharged together with the liquid from the discharge port of the gas dissolution tank. Some of the bubbles and liquid discharged from the discharge port flow out into the discharge line.
しかしながら、特許文献１の気体溶解タンクでは、比較的大きな気泡が気体溶解タンクの排出口から多量に流れ出るため、気体溶解濃度が上がり難く、気体溶解効率も上がり難いという問題があった。
However, in the gas dissolution tank of Patent Document 1, since a large amount of relatively large bubbles flow out from the discharge port of the gas dissolution tank, there is a problem that the gas dissolution concentration is difficult to increase and the gas dissolution efficiency is also difficult to increase.
本発明は、上記問題に鑑みて創案されたものであり、従来よりも気体溶解濃度が上がり易く、気体溶解効率も上がり易い気体溶解装置を提供することを目的とする。
The present invention has been devised in view of the above problems, and an object of the present invention is to provide a gas dissolution apparatus in which the gas dissolution concentration is likely to increase and the gas dissolution efficiency is likely to increase as compared with the conventional invention.
本発明の第１の態様に係る気体溶解装置は、内部で液体に気体を溶解させる気体溶解タンクと、前記気体溶解タンクの内部を上室および下室に仕切る仕切板と、気液混合体を外部から前記気体溶解タンク内に導入する導入管と、前記気体溶解タンクの下室から気体溶解液を排出する吐出管路と、を備える。前記導入管は、下流端の開口が前記気体溶解タンクの天井部の中心に向かっている。前記上室と前記下室とを連通する連通路が前記仕切板の中心からずれた位置に形成されている。
The gas dissolving apparatus according to the first aspect of the present invention comprises a gas dissolving tank that dissolves a gas in a liquid inside, a partition plate that divides the inside of the gas dissolving tank into an upper chamber and a lower chamber, and a gas-liquid mixture. It includes an introduction pipe that is introduced into the gas dissolution tank from the outside, and a discharge pipe that discharges the gas dissolution liquid from the lower chamber of the gas dissolution tank. The opening at the downstream end of the introduction pipe faces the center of the ceiling of the gas dissolution tank. A communication passage connecting the upper chamber and the lower chamber is formed at a position deviated from the center of the partition plate.
本発明の第２の態様に係る気体溶解装置は、第１の態様に係る気体溶解装置において、前記天井部に凹凸部を形成するように衝突部が形成され、前記導入管は、吐出する気液混合体が前記衝突部に衝突するように設置されている、ことが望ましい。
In the gas dissolving device according to the second aspect of the present invention, in the gas dissolving device according to the first aspect, a collision portion is formed so as to form an uneven portion on the ceiling portion, and the introduction pipe discharges air. It is desirable that the liquid mixture is installed so as to collide with the collision portion.
本発明の第３の態様に係る気体溶解装置は、第２の態様に係る気体溶解装置において、前記凹凸部は、凸部の下端位置が外側の凸部ほど下方に突出している、ことが望ましい。
In the gas dissolving device according to the third aspect of the present invention, in the gas dissolving device according to the second aspect, it is desirable that the lower end position of the convex portion protrudes downward toward the outer convex portion. ..
本発明の第４の態様に係る気体溶解装置は、第１乃至第３の態様に係る気体溶解装置において、前記上室において前記導入管の下流端より低い位置にある部分を前記上室の有効容積とした場合に、前記下室の容積が前記上室の有効容積よりも小さい、ことが望ましい。
In the gas dissolving apparatus according to the fourth aspect of the present invention, in the gas dissolving apparatus according to the first to third aspects, the portion of the upper chamber located lower than the downstream end of the introduction pipe is effective. In terms of volume, it is desirable that the volume of the lower chamber is smaller than the effective volume of the upper chamber.
本発明の第５の態様に係る気体溶解装置は、第１乃至第３の態様に係る気体溶解装置において、前記吐出管路は、前記気体溶解タンクの底面に形成された排出口に接続されており、前記排出口は、上から視て、前記連通路からずれた位置に形成されている、ことが望ましい。
The gas dissolution device according to the fifth aspect of the present invention is the gas dissolution device according to the first to third aspects, in which the discharge pipe line is connected to a discharge port formed on the bottom surface of the gas dissolution tank. Therefore, it is desirable that the discharge port is formed at a position deviated from the communication passage when viewed from above.
本発明の第６の態様に係る気体溶解装置は、第１乃至第４の態様に係る気体溶解装置において、前記導入管は、下流端の開口面積が上流端の開口面積よりも小さい、ことが望ましい。
In the gas dissolving apparatus according to the sixth aspect of the present invention, in the gas dissolving apparatus according to the first to fourth aspects, the introduction pipe has an opening area at the downstream end smaller than the opening area at the upstream end. desirable.
本発明によれば、気体溶解濃度が上がり易く、気体溶解効率も上がり易い気体溶解装置を提供することができる。
According to the present invention, it is possible to provide a gas dissolution device in which the gas dissolution concentration easily increases and the gas dissolution efficiency also easily increases.
以下、本発明の実施の形態に係る気体溶解装置について、図面を参照しつつ説明する。本実施形態に係る気体溶解装置１００は、気体を液体に溶解させるための装置である。気体溶解装置１００は、気体溶解タンク１、吸込管路２、吐出管路３、ポンプ４、気体導入部５、導入管６等で構成されている。本実施形態では、気体として酸素を用い、液体として水を用いる。もちろん、気体として酸素と異なる気体（例えば空気、二酸化炭素、窒素）を用い、液体として水と異なる液体を用いることも可能である。
Hereinafter, the gas dissolving apparatus according to the embodiment of the present invention will be described with reference to the drawings. The gas melting device 100 according to the present embodiment is a device for dissolving a gas in a liquid. The gas dissolution device 100 includes a gas dissolution tank 1, a suction pipe 2, a discharge pipe 3, a pump 4, a gas introduction unit 5, an introduction pipe 6, and the like. In this embodiment, oxygen is used as the gas and water is used as the liquid. Of course, it is also possible to use a gas different from oxygen (for example, air, carbon dioxide, nitrogen) as the gas and a liquid different from water as the liquid.
気体溶解タンク１は、内部で気体を液体に加圧溶解させる。図１に例示する気体溶解タンク１の内部は、比較的大径の略円柱状空間の第１部７と、比較的小径の略円柱状空間の第２部８と、第１部７と第２部８との間に連続的に形成された略円錐台状空間の第３部９で構成されている。第１部７は、底板部１１の上方かつ大径円筒部１２の内側に形成されている。第２部８は、天井部１３の下方かつ小径円筒部１４の内側に形成されている。第３部９は、大径円筒部１２から縮径しつつ小径円筒部１４に接続された錐状筒部１６の内側に形成されている。
The gas dissolution tank 1 internally dissolves the gas in a liquid under pressure. The inside of the gas dissolution tank 1 illustrated in FIG. 1 includes a first part 7 of a substantially cylindrical space having a relatively large diameter, a second part 8 of a substantially columnar space having a relatively small diameter, and a first part 7 and a first part. It is composed of the third part 9 of a substantially conical trapezoidal space formed continuously with the second part 8. The first portion 7 is formed above the bottom plate portion 11 and inside the large-diameter cylindrical portion 12. The second portion 8 is formed below the ceiling portion 13 and inside the small-diameter cylindrical portion 14. The third portion 9 is formed inside the conical cylindrical portion 16 connected to the small diameter cylindrical portion 14 while reducing the diameter from the large diameter cylindrical portion 12.
気体溶解タンク１の内部には、図１に示すように、導入管６、仕切板１７、衝突部１９等が設けられている。
As shown in FIG. 1, an introduction pipe 6, a partition plate 17, a collision portion 19, and the like are provided inside the gas dissolution tank 1.
仕切板１７は、気体溶解タンク１の内部を上室２２および下室２３に仕切っている。本実施形態では、仕切板１７は、第１部７を上下に仕切っている。この仕切板１７には、上室２２と下室２３とを連通する連通路１７ａが形成されている。連通路１７ａは、仕切板１７の中心からずれた位置に１又は複数形成される。
The partition plate 17 partitions the inside of the gas dissolution tank 1 into an upper chamber 22 and a lower chamber 23. In the present embodiment, the partition plate 17 partitions the first part 7 vertically. The partition plate 17 is formed with a communication passage 17a that connects the upper chamber 22 and the lower chamber 23. One or more of the communication passages 17a are formed at positions deviated from the center of the partition plate 17.
下室２３の容積は、上室２２の容積よりも小さい。また、上室２２において導入管６の下流端６ａより低い位置にある部分を上室２２の有効容積とした場合、下室２３の容積が上室２２の有効容積よりも小さい。また、仕切板１７によって上下に仕切られた第１部７は、仕切板１７より下の部分の容積の方が、仕切板１７より上の部分の容積よりも小さい。また、図１に示すように、下室２３の液体領域は、上室２２の液体領域よりも小さい。
The volume of the lower chamber 23 is smaller than the volume of the upper chamber 22. Further, when the portion of the upper chamber 22 located lower than the downstream end 6a of the introduction pipe 6 is used as the effective volume of the upper chamber 22, the volume of the lower chamber 23 is smaller than the effective volume of the upper chamber 22. Further, the volume of the portion below the partition plate 17 of the first portion 7 partitioned vertically by the partition plate 17 is smaller than the volume of the portion above the partition plate 17. Further, as shown in FIG. 1, the liquid region of the lower chamber 23 is smaller than the liquid region of the upper chamber 22.
導入管６は、気液混合体を外部から気体溶解タンク１内に導入するために設けられている。導入管６は、吸込管路２の下流端部にポンプ４を介して接続されている。本実施形態では、導入管６は、気体溶解タンク１の中心線に沿って設けられ、その下流端６ａの開口が気体溶解タンク１の天井部１３の中心に向かっている。また、導入管６は、気体溶解タンク１の底部（底板部１１）の中心と、仕切板１７の中心とを貫通している。なお、導入管６からの気液混合体の吐出流速を高めるために、図１に示すように、導入管６は、下流端６ａの開口面積が上流端６ｂ（図４参照）の開口面積よりも小さくなっていることが望ましい。
The introduction pipe 6 is provided for introducing the gas-liquid mixture into the gas dissolution tank 1 from the outside. The introduction pipe 6 is connected to the downstream end of the suction pipe 2 via a pump 4. In the present embodiment, the introduction pipe 6 is provided along the center line of the gas dissolution tank 1, and the opening of the downstream end 6a thereof faces the center of the ceiling portion 13 of the gas dissolution tank 1. Further, the introduction pipe 6 penetrates the center of the bottom portion (bottom plate portion 11) of the gas dissolution tank 1 and the center of the partition plate 17. In order to increase the discharge flow velocity of the gas-liquid mixture from the introduction pipe 6, as shown in FIG. 1, the opening area of the downstream end 6a of the introduction pipe 6 is larger than the opening area of the upstream end 6b (see FIG. 4). Is also desirable to be small.
衝突部１９は、天井部１３に凹凸部を形成するように形成されている。衝突部１９が天井部１３に形成する凹凸部は、凸部の下端位置が外側の凸部ほど下方に突出するように形成されている。本実施形態では、衝突部１９は、同心円状に配置された複数の第１円筒部材１９ａ～第３円筒部材１９ｃで構成されている。図１に示す例では、第１円筒部材１９ａ～第３円筒部材１９ｃの下端位置は、外側の円筒部材ほど下方にある。なお、天井部１３において衝突部１９が形成されている範囲の面積（図２に示す例では、第３円筒部材１９ｃの外径Ｄの内側の面積）は、気体溶解タンク１内の液面２０の面積よりも小さい。このようにすることで、衝突部１９に衝突した液体は、気体溶解タンク１の径方向に拡散しながら落下し、液体と気体との接触面積が増加することで気体溶解効率が向上する。
The collision portion 19 is formed so as to form an uneven portion on the ceiling portion 13. The uneven portion formed by the collision portion 19 on the ceiling portion 13 is formed so that the lower end position of the convex portion protrudes downward toward the outer convex portion. In the present embodiment, the collision portion 19 is composed of a plurality of first cylindrical members 19a to third cylindrical members 19c arranged concentrically. In the example shown in FIG. 1, the lower end positions of the first cylindrical member 19a to the third cylindrical member 19c are lower toward the outer cylindrical member. The area of the ceiling portion 13 in which the collision portion 19 is formed (in the example shown in FIG. 2, the area inside the outer diameter D of the third cylindrical member 19c) is the liquid level 20 in the gas dissolution tank 1. Is smaller than the area of. By doing so, the liquid colliding with the collision portion 19 falls while diffusing in the radial direction of the gas dissolution tank 1, and the contact area between the liquid and the gas increases, so that the gas dissolution efficiency is improved.
吸込管路２は、上流端部が液体の吸込口となる。本実施形態では、吸込管路２の上流端部は、図４に示すように、容器２６内に貯留された液体２７内に没入されている。
The upstream end of the suction pipe 2 serves as a liquid suction port. In the present embodiment, the upstream end of the suction pipe 2 is immersed in the liquid 27 stored in the container 26 as shown in FIG.
ポンプ４は、吸込管路２の下流端部と導入管６の上流端部との間に設けられている。よって、ポンプ４が駆動すると、容器２６内に貯留された液体が吸込管路２に吸い込まれ、導入管６を通じて気体溶解タンク１内に圧送される。なお、気体溶解タンク１内は、ポンプ４が駆動すると、加圧されるようになっている。
The pump 4 is provided between the downstream end of the suction pipe 2 and the upstream end of the introduction pipe 6. Therefore, when the pump 4 is driven, the liquid stored in the container 26 is sucked into the suction pipe line 2 and pumped into the gas dissolution tank 1 through the introduction pipe 6. The inside of the gas dissolution tank 1 is pressurized when the pump 4 is driven.
気体導入部５は、導入管６の途中に設けられている。この気体導入部５は、圧縮気体供給源２８から供給される圧縮気体を導入管６内を流れる液体に混入させる。なお、圧縮気体供給源２８から供給される圧縮気体は、当然に、吸込管路２の圧力よりも高い圧力で供給される。
The gas introduction unit 5 is provided in the middle of the introduction pipe 6. The gas introduction unit 5 mixes the compressed gas supplied from the compressed gas supply source 28 with the liquid flowing in the introduction pipe 6. The compressed gas supplied from the compressed gas supply source 28 is naturally supplied at a pressure higher than the pressure of the suction pipe 2.
吐出管路３は、その上流端部が、気体溶解タンク１の底面１ａに形成された排出口２９に接続されている。他方、吐出管路３の下流端部は、容器２６内に配置されており、その下流端部から容器２６に溶存気体濃度が高まった液体が吐出される。
The upstream end of the discharge pipe line 3 is connected to a discharge port 29 formed on the bottom surface 1a of the gas dissolution tank 1. On the other hand, the downstream end portion of the discharge pipe line 3 is arranged in the container 26, and the liquid having an increased dissolved gas concentration is discharged from the downstream end portion into the container 26.
本実施形態では、図３に示すように、気体溶解タンク１は、気体溶解タンク支持体３１に支持される。同図に例示する気体溶解タンク支持体３１は、気体溶解タンク１を支持するとともに気体溶解タンク１を覆う筐体部３３を備えている。詳細には、気体溶解タンク支持体３１は、筐体部３３と筐体部３３内に固設された支持台部３４とを備え、支持台部３４に気体溶解タンク１の底板部１１がボルト等にて固定されている。また、筐体部３３の天板３３ａに気体溶解タンク１の天井部１３がボルト等にて固定されている。導入管６および吐出管路３を形成する配管は、支持台部３４から下方に所定寸法だけ延出した後、互いに異なる側方に延出し、筐体部３３を貫通して外部に出ている。図３に示す例では、気体溶解タンク支持体３１は、底部に設けられたキャスタ３２によって移動可能になっている。
In the present embodiment, as shown in FIG. 3, the gas dissolution tank 1 is supported by the gas dissolution tank support 31. The gas dissolution tank support 31 illustrated in the figure includes a housing portion 33 that supports the gas dissolution tank 1 and covers the gas dissolution tank 1. Specifically, the gas dissolution tank support 31 includes a housing portion 33 and a support base portion 34 fixed in the housing portion 33, and the bottom plate portion 11 of the gas dissolution tank 1 is bolted to the support base portion 34. It is fixed by etc. Further, the ceiling portion 13 of the gas dissolution tank 1 is fixed to the top plate 33a of the housing portion 33 with bolts or the like. The pipes forming the introduction pipe 6 and the discharge pipe line 3 extend downward from the support base portion 34 by a predetermined dimension, then extend to different sides from each other, and penetrate the housing portion 33 to the outside. .. In the example shown in FIG. 3, the gas dissolution tank support 31 is movable by a caster 32 provided at the bottom.
以上の如く構成された気体溶解装置１００において、ポンプ４を駆動させると、容器２６から吸込管路２に液体が吸い込まれ、気体導入部５において導入管６を流れる液体に気体が混入され気液混合体となる。そして、気液混合体は、導入管６の下流端６ａから気体溶解タンク１内で吐出される。
When the pump 4 is driven in the gas melting device 100 configured as described above, the liquid is sucked from the container 26 into the suction pipe line 2, and the gas is mixed with the liquid flowing through the introduction pipe 6 in the gas introduction part 5 to form a gas or liquid. It becomes a mixture. Then, the gas-liquid mixture is discharged from the downstream end 6a of the introduction pipe 6 in the gas dissolution tank 1.
気体溶解タンク１内では、液体と気体の接触面積や気体溶解タンク１内の圧力に応じて液体に対する気体の溶解が進行する。気体溶解タンク１の上室２２内では、気体領域と液体領域が形成されており、導入管６の下流端６ａから吐出した気液混合体は、先ず、衝突部１９に衝突することで、局部的な高圧部を形成して当該部において効率的に気体（気泡）が液体に溶解される。その後、衝突部１９に衝突した気液混合体は、気体領域を通過して液体領域に到達する。気液混合体が気体領域を落下する際、液体と気体との接触面積が大きくなるため、ここでも液体に対する気体の溶解が促進される。
In the gas dissolution tank 1, the dissolution of the gas in the liquid proceeds according to the contact area between the liquid and the gas and the pressure in the gas dissolution tank 1. A gas region and a liquid region are formed in the upper chamber 22 of the gas dissolution tank 1, and the gas-liquid mixture discharged from the downstream end 6a of the introduction pipe 6 first collides with the collision portion 19 to cause a local region. A high-pressure portion is formed, and the gas (bubble) is efficiently dissolved in the liquid in the portion. After that, the gas-liquid mixture that has collided with the collision portion 19 passes through the gas region and reaches the liquid region. When the gas-liquid mixture falls in the gas region, the contact area between the liquid and the gas becomes large, so that the dissolution of the gas in the liquid is promoted here as well.
その後、気液混合体が液体領域に到達した後は、気液混合体に含まれる気泡が、液体領域内の流れ（図１において矢印に沿った方向の流れ）に乗って撹拌され、次第に小さくなりながら、液体に溶解される。上室２２の液体は、仕切板１７に形成された連通路１７ａを通じて下室２３に移動する。連通路１７ａは、仕切板１７の中心からずれた位置に形成されているため、連通路１７ａが仕切板１７の中心や仕切板１７の外周部に設けられている場合と比較して、上室２２にある気泡は、下室２３に移動し難くなっている。このため、気泡の多くは上室２２に留まり易くなっており、気泡の多くは上室２２において消滅するまで液体に溶解するか、又はナノサイズの気泡になるまで液体に溶解する。
Then, after the gas-liquid mixture reaches the liquid region, the bubbles contained in the gas-liquid mixture are agitated along the flow in the liquid region (flow in the direction along the arrow in FIG. 1) and gradually become smaller. As it becomes, it dissolves in the liquid. The liquid in the upper chamber 22 moves to the lower chamber 23 through the communication passage 17a formed in the partition plate 17. Since the connecting passage 17a is formed at a position deviated from the center of the partition plate 17, the upper chamber is compared with the case where the connecting passage 17a is provided at the center of the partition plate 17 or the outer peripheral portion of the partition plate 17. The air bubbles in 22 are difficult to move to the lower chamber 23. For this reason, most of the bubbles tend to stay in the upper chamber 22, and most of the bubbles dissolve in the liquid until they disappear in the upper chamber 22, or they dissolve in the liquid until they become nano-sized bubbles.
また、気泡の一部が連通路１７ａを通過して上室２２から下室２３に移動しても、上から視て、排出口２９が連通路１７ａからずれた位置に形成されていることから、移動した気泡の殆どは、直ちに排出口２９から排出されずに、下室２３内で液体の流れに乗って撹拌されながら液体に溶解する機会が再び与えられる。
Further, even if a part of the air bubbles passes through the communication passage 17a and moves from the upper chamber 22 to the lower chamber 23, the discharge port 29 is formed at a position deviated from the communication passage 17a when viewed from above. Most of the transferred bubbles are not immediately discharged from the discharge port 29, but are given the opportunity to dissolve in the liquid again while being agitated by the flow of the liquid in the lower chamber 23.
このようにして、液体に溶解せずに排出口２９から排出される気泡は、極めて少なくなり、吐出管路３から容器２６に供給される気体溶解液は、気体溶解濃度が高いものとなる。また、吐出管路３から外に排出される気体の量を少なくすることができるので、気体溶解効率も高いものとなる。
In this way, the number of bubbles discharged from the discharge port 29 without being dissolved in the liquid is extremely small, and the gas dissolution liquid supplied from the discharge pipe line 3 to the container 26 has a high gas dissolution concentration. Further, since the amount of gas discharged to the outside from the discharge pipe line 3 can be reduced, the gas dissolution efficiency is also high.
以上の説明から明らかなように、本実施形態に係る気体溶解装置１００によれば、気体溶解タンク１内に連通路１７ａが形成された仕切板１７が設けられているため、液体領域内の気泡が排出口２９から排出され難くく、その分、気体溶解タンク１内に留まって液体に溶解する気体の量が多くなる。このことから、本実施形態に係る気体溶解装置１００は、従来例に係る気体溶解装置よりも気体溶解濃度が上がり易く、気体溶解効率も上がり易い。
As is clear from the above description, according to the gas dissolution apparatus 100 according to the present embodiment, since the partition plate 17 in which the communication passage 17a is formed is provided in the gas dissolution tank 1, air bubbles in the liquid region are provided. Is difficult to be discharged from the discharge port 29, and the amount of gas that stays in the gas dissolution tank 1 and dissolves in the liquid increases accordingly. For this reason, the gas dissolution device 100 according to the present embodiment tends to have a higher gas dissolution concentration and a higher gas dissolution efficiency than the gas dissolution device according to the conventional example.
また、本実施形態に係る気体溶解装置１００によれば、下室２３の容積が上室２２の有効容積より小さくなっている。このため、上室２２の液体領域を下室２３の液体領域よりも容量を大きく確保することができる。気体溶解タンク１内にできるだけ気泡を滞留させ、排出口２９から排出されないようにするには、比較的気泡の多い上室２２の液体領域を比較的気泡の少ない下室２３よりも大きくすることが望ましい。本実施形態では、上室２２の液体領域を下室２３の液体領域よりも容量を大きく確保しているため、更に、気体溶解濃度が上がり易く、気体溶解効率も上がり易いものとなっている。
Further, according to the gas dissolving device 100 according to the present embodiment, the volume of the lower chamber 23 is smaller than the effective volume of the upper chamber 22. Therefore, the capacity of the liquid region of the upper chamber 22 can be secured larger than that of the liquid region of the lower chamber 23. In order to retain air bubbles in the gas dissolution tank 1 as much as possible and prevent them from being discharged from the discharge port 29, the liquid region of the upper chamber 22 having a relatively large number of air bubbles may be made larger than that of the lower chamber 23 having a relatively small number of air bubbles. desirable. In the present embodiment, since the liquid region of the upper chamber 22 has a larger capacity than the liquid region of the lower chamber 23, the gas dissolution concentration is likely to increase, and the gas dissolution efficiency is also likely to increase.
＜他の実施形態＞
既述した実施形態では、衝突部１９は、同心円状に配置された複数の円筒部材１９ａ～１９ｃで構成されたものであったが、変形例として、図５に示すように、同心円上に形成配置された各２枚の半径の異なる湾曲板１９Ａａ～１９Ａｃで構成されていてもよい。この湾曲板１９Ａａ～１９Ａｃの下端も、外側の湾曲板ほど下方に延出している。また、衝突部１９は、上記２つの例に限定されず、天井部１３の下面に凹凸部を形成するものであれば様々な形態を採用することが可能である。 <Other embodiments>
In the above-described embodiment, thecollision portion 19 is composed of a plurality of cylindrical members 19a to 19c arranged concentrically, but as a modified example, the collision portion 19 is formed on the concentric circles as shown in FIG. It may be composed of two arranged curved plates 19Aa to 19Ac having different radii. The lower ends of the curved plates 19Aa to 19Ac also extend downward toward the outer curved plate. Further, the collision portion 19 is not limited to the above two examples, and various forms can be adopted as long as the uneven portion is formed on the lower surface of the ceiling portion 13.
既述した実施形態では、衝突部１９は、同心円状に配置された複数の円筒部材１９ａ～１９ｃで構成されたものであったが、変形例として、図５に示すように、同心円上に形成配置された各２枚の半径の異なる湾曲板１９Ａａ～１９Ａｃで構成されていてもよい。この湾曲板１９Ａａ～１９Ａｃの下端も、外側の湾曲板ほど下方に延出している。また、衝突部１９は、上記２つの例に限定されず、天井部１３の下面に凹凸部を形成するものであれば様々な形態を採用することが可能である。 <Other embodiments>
In the above-described embodiment, the
既述した実施形態では、導入管６は気体溶解タンク１の底板部１１の中心と、仕切板１７の中心とを貫通し、気体溶解タンク１の中心線に沿って設けられているが、導入管６の設置形態はこれに限定されない。例えば、特許文献１の第５図のように、外部から気体溶解タンクの側部を横方向に貫通して内部に挿入され、気体溶解タンクの中心で上方に屈曲して中心線に沿う形態の導入管であってもよい。
In the above-described embodiment, the introduction pipe 6 penetrates the center of the bottom plate portion 11 of the gas dissolution tank 1 and the center of the partition plate 17 and is provided along the center line of the gas dissolution tank 1. The installation form of the pipe 6 is not limited to this. For example, as shown in FIG. 5 of Patent Document 1, a form in which the side portion of the gas dissolution tank is laterally penetrated from the outside and inserted into the inside, and the gas dissolution tank is bent upward at the center and along the center line. It may be an introduction pipe.
なお、本発明は、その精神や主旨または主要な特徴から逸脱することなく、他のいろいろな形で実施することができる。そのため、上述の実施形態はあらゆる点で単なる例示にすぎず、限定的に解釈してはならない。
It should be noted that the present invention can be implemented in various other forms without departing from its spirit, gist or main features. Therefore, the above embodiments are merely exemplary in all respects and should not be construed in a limited way.
本発明は、例えば、液体に気体を加圧溶解させる気体溶解装置に適用することができる。
The present invention can be applied to, for example, a gas dissolving device that pressurizes and dissolves a gas in a liquid.
１ 気体溶解タンク
３ 吐出管路
６ 導入管
６ａ 導入管の下流端
１３ 天井部
１７ 仕切板
１７ａ 連通路
２２ 上室
２３ 下室
２７ 液体
２９ 排出口
１００ 気体溶解装置
1Gas dissolution tank 3 Discharge pipeline 6 Introductory pipe 6a Downstream end of introduction pipe 13 Ceiling 17 Partition plate 17a Continuous passage 22 Upper chamber 23 Lower chamber 27 Liquid 29 Dissolution device 100 Gas dissolution device
３ 吐出管路
６ 導入管
６ａ 導入管の下流端
１３ 天井部
１７ 仕切板
１７ａ 連通路
２２ 上室
２３ 下室
２７ 液体
２９ 排出口
１００ 気体溶解装置
1
Claims (6)
- 内部で液体に気体を溶解させる気体溶解タンクと、
前記気体溶解タンクの内部を上室および下室に仕切る仕切板と、
気液混合体を外部から前記気体溶解タンク内に導入する導入管と、
前記気体溶解タンクの前記下室から気体溶解液を排出する吐出管路と、
を備える気体溶解装置であって、
前記導入管は、下流端の開口が前記気体溶解タンクの天井部の中心に向かっており、
前記上室と前記下室とを連通する連通路が前記仕切板の中心からずれた位置に形成されている、
気体溶解装置。 A gas dissolution tank that dissolves gas in a liquid inside,
A partition plate that divides the inside of the gas dissolution tank into an upper chamber and a lower chamber,
An introduction pipe that introduces the gas-liquid mixture from the outside into the gas dissolution tank,
A discharge pipe for discharging the gas dissolution liquid from the lower chamber of the gas dissolution tank, and
It is a gas melting device equipped with
The introduction pipe has an opening at the downstream end toward the center of the ceiling of the gas dissolution tank.
A communication passage connecting the upper chamber and the lower chamber is formed at a position deviated from the center of the partition plate.
Gas melting device. - 請求項１に記載の気体溶解装置において、
前記天井部に凹凸部を形成するように衝突部が形成され、
前記導入管は、吐出する気液混合体が前記衝突部に衝突するように設置されている、
気体溶解装置。 In the gas melting apparatus according to claim 1,
A collision portion is formed so as to form an uneven portion on the ceiling portion.
The introduction pipe is installed so that the gas-liquid mixture to be discharged collides with the collision portion.
Gas melting device. - 請求項２に記載の気体溶解装置において、
前記凹凸部は、凸部の下端位置が外側の凸部ほど下方に突出している、気体溶解装置。 In the gas melting apparatus according to claim 2,
The uneven portion is a gas dissolving device in which the lower end position of the convex portion protrudes downward toward the outer convex portion. - 請求項１～３の何れか１項に記載の気体溶解装置において、
前記上室において前記導入管の下流端より低い位置にある部分を前記上室の有効容積とした場合に、前記下室の容積が前記上室の有効容積よりも小さい、
気体溶解装置。 In the gas dissolving apparatus according to any one of claims 1 to 3.
When the portion of the upper chamber lower than the downstream end of the introduction pipe is defined as the effective volume of the upper chamber, the volume of the lower chamber is smaller than the effective volume of the upper chamber.
Gas melting device. - 請求項１～３の何れか１項に記載の気体溶解装置において、
前記吐出管路は、前記気体溶解タンクの底面に形成された排出口に接続されており、
前記排出口は、上から視て、前記連通路からずれた位置に形成されている、
気体溶解装置。 In the gas dissolving apparatus according to any one of claims 1 to 3.
The discharge pipe is connected to a discharge port formed on the bottom surface of the gas dissolution tank.
The discharge port is formed at a position deviated from the communication passage when viewed from above.
Gas melting device. - 請求項１～４の何れか１項に記載の気体溶解装置において、
前記導入管は、下流端の開口面積が上流端の開口面積よりも小さい、気体溶解装置。
In the gas dissolving apparatus according to any one of claims 1 to 4.
The introduction pipe is a gas dissolving device in which the opening area at the downstream end is smaller than the opening area at the upstream end.
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| CN202080100457.3A CN115605285A (en) | 2020-05-08 | 2020-08-20 | Gas dissolving device |
| EP20934639.4A EP4147770A4 (en) | 2020-05-08 | 2020-08-20 | Gas dissolution device |
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| JP2006180829A (en) * | 2004-12-28 | 2006-07-13 | Seiwa Pro:Kk | Apparatus for receiving fish or shellfish |
| JP2007075749A (en) * | 2005-09-15 | 2007-03-29 | Matsue Doken Kk | Gas-liquid dissolving apparatus |
| JP2009112909A (en) * | 2007-11-02 | 2009-05-28 | Sanso Electric Co Ltd | Gas-liquid dissolving tank in apparatus for generating microbubble |
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| KR101088145B1 (en) * | 2010-10-06 | 2011-12-02 | 이추림 | Apparatus for generating micro bubbles |
| KR20120036605A (en) * | 2010-10-08 | 2012-04-18 | (주)참플러스 | Apparatus for generating micro bubbles |
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| JP2006180829A (en) * | 2004-12-28 | 2006-07-13 | Seiwa Pro:Kk | Apparatus for receiving fish or shellfish |
| JP2007075749A (en) * | 2005-09-15 | 2007-03-29 | Matsue Doken Kk | Gas-liquid dissolving apparatus |
| JP2009112909A (en) * | 2007-11-02 | 2009-05-28 | Sanso Electric Co Ltd | Gas-liquid dissolving tank in apparatus for generating microbubble |
| JP4759553B2 (en) | 2007-11-02 | 2011-08-31 | 三相電機株式会社 | Gas-liquid dissolution tank in microbubble generator |
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