WO2021200967A1 - Composite and heat dissipation member - Google Patents

Composite and heat dissipation member Download PDF

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Publication number
WO2021200967A1
WO2021200967A1 PCT/JP2021/013572 JP2021013572W WO2021200967A1 WO 2021200967 A1 WO2021200967 A1 WO 2021200967A1 JP 2021013572 W JP2021013572 W JP 2021013572W WO 2021200967 A1 WO2021200967 A1 WO 2021200967A1
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sintered body
nitride sintered
boron nitride
complex
composite
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PCT/JP2021/013572
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French (fr)
Japanese (ja)
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紗緒梨 井之上
翔二 岩切
賢久 上島
亮 吉松
竜士 古賀
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デンカ株式会社
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Priority to JP2022512550A priority Critical patent/JPWO2021200967A1/ja
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    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/515Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
    • C04B35/58Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
    • C04B35/583Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on boron nitride
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81Coating or impregnation
    • C04B41/82Coating or impregnation with organic materials
    • C04B41/83Macromolecular compounds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/373Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon

Definitions

  • This disclosure relates to a complex and a heat radiating member.
  • thermal interface materials that have electrical insulation properties for electronic components or printed wiring boards. It has been used to attach it to a heat sink.
  • a composite heat dissipation member composed of a resin and ceramics such as boron nitride is used.
  • Patent Document 1 proposes a technique for reducing the anisotropy of thermal conductivity while having excellent thermal conductivity by setting the degree of orientation and the graphitization index within a predetermined range.
  • the present disclosure provides a complex having excellent adhesiveness to other members. Further, in the present disclosure, by providing the above-mentioned composite, a heat radiating member having sufficiently high reliability is provided.
  • the present disclosure is a composite containing a nitride sintered body having a porous structure and a semi-cured product of a thermosetting resin composition impregnated in the nitride sintered body, and is applied in the thickness direction at 5 MPa.
  • a composite having a thickness change rate of 2% or more when pressed. Such a complex is deformed at a predetermined thickness change rate when, for example, it is sandwiched between a pair of opposing members and pressurized.
  • the composite has a nitride sintered body having a porous structure, and the nitride sintered body is impregnated with a semi-cured product of a thermosetting resin composition.
  • the complex When this complex is sandwiched between a pair of opposing members and pressed to join, the complex is deformed at a predetermined rate of change in thickness. When deformed, the resin component contained in the complex exudes. By the action of the exuded resin component, the complex can be firmly adhered to other members. Therefore, it has excellent adhesiveness.
  • the thickness change rate of the complex may be 35% or less. By having such a thickness change rate, the shape can be maintained to some extent even if pressure is applied when adhering to other members. Therefore, for example, the dimensional accuracy of the electronic component can be improved.
  • the porosity of the boron nitride sintered body contained in the above complex may be 40 to 75% by volume. Thereby, the impregnation amount of the semi-cured product of the thermosetting resin composition can be sufficiently increased while maintaining the strength and thermal conductivity of the boron nitride sintered body. Such a complex can achieve both excellent insulation and adhesiveness at a high level.
  • the porosity is the total volume ratio of the pores filled with the resin and the pores not filled with the resin.
  • the bulk density of the boron nitride sintered body contained in the complex may be 600 to 1400 kg / m 3 .
  • the impregnation amount of the semi-cured product of the thermosetting resin composition can be sufficiently increased while maintaining the strength and thermal conductivity of the boron nitride sintered body.
  • Such a complex can achieve both excellent insulation and adhesiveness at a high level.
  • the orientation index of the boron nitride sintered body contained in the above complex may be 20 or less. Thereby, the anisotropy of thermal conductivity can be sufficiently reduced.
  • the present disclosure provides a heat radiating member having the above-mentioned complex in one aspect. Since this heat radiating member has the above-mentioned composite, it has excellent adhesiveness.
  • FIG. 1 is a perspective view of a complex in one embodiment.
  • the sheet-like composite 10 contains a nitride sintered body 20 having a porous structure and a semi-cured product of a thermosetting resin composition impregnated in the nitride sintered body 20.
  • the nitride sintered body 20 contains boron nitride particles and pores formed by sintering primary boron nitride particles.
  • the thickness change rate when pressurized at 5 MPa in the thickness direction may be 2% or more, or 5% or more.
  • the thickness change rate may be 35% or less, or 20% or less.
  • An example of the thickness change rate is 2 to 35%.
  • the thickness change rate can be measured at a measurement temperature of 200 ° C. using a precision universal testing machine (trade name: Autograph AG-X) manufactured by Shimadzu Corporation. If the main surfaces 10a and 10b of the complex 10 have irregularities or protrusions that affect the measurement of the thickness change rate, the main surfaces 10a and 10b are processed to remove the irregularities. These processes may be performed using, for example, a machining center (trade name: Dualvertical 635 eco) operated by MORI SEIKI.
  • the thickness t of the complex 10 may be less than 2 mm, less than 1 mm, and less than 0.5 mm. From the viewpoint of maintaining a certain level of strength, the thickness t of the complex 10 may be 0.1 mm or more, or 0.2 mm or more. An example of the thickness of the complex 10 is 0.1 mm or more and less than 2 mm.
  • the areas of the main surfaces 10a and 10b of the complex 10 may be 25 mm 2 or more, 100 mm 2 or more, 500 mm 2 or more, 800 mm 2 or more, 1000 mm 2 or more, respectively. May be.
  • the thickness t of the nitride sintered body 20 may be less than 2 mm, less than 1 mm, or less than 0.5 mm. From the viewpoint of ease of molding, the thickness of the nitride sintered body 20 may be 0.1 mm or more, or 0.2 mm or more.
  • the main surface 20a of the nitride sintered body 20, the area of the 20b, may be at 25 mm 2 or more, may be at 100 mm 2 or more, may be at 500 mm 2 or more, may be at 800 mm 2 or more, 1000 mm 2 It may be the above.
  • the average pore diameter of the pores contained in the nitride sintered body 20 may be less than 10 ⁇ m.
  • the average pore size of the pores is determined based on the pore size distribution when pressure is applied while increasing the pressure from 0.5 psia to 60,000 psia using a mercury porosimeter.
  • the horizontal axis is the pore diameter and the vertical axis is the cumulative pore volume
  • the pore diameter when the cumulative pore volume reaches 50% of the total pore volume is the average pore diameter.
  • the mercury porosimeter one manufactured by Shimadzu Corporation can be used.
  • the porosity of the nitride sintered body 20, that is, the volume ratio of the pores in the nitride sintered body 20 may be 40 to 75% by volume or 45 to 70% by volume. If the porosity becomes too large, the strength and thermal conductivity of the nitride sintered body tend to decrease. On the other hand, if the porosity becomes too small, the content of the semi-cured product of the thermosetting resin composition when the composite is produced tends to decrease.
  • the bulk density [B (kg / m 3 )] was calculated from the volume and mass of the nitride sintered body 20, and the bulk density and the theoretical density of boron nitride [2280 (kg / m 3 )] were used. Therefore, it can be obtained by the following formula (2).
  • Porosity (% by volume) [1- (B / 2280)] x 100 (2)
  • the bulk density B may be 600 to 1400 kg / m 3 or 800 to 1200 kg / m 3 . If the bulk density B becomes too small, the strength of the nitride sintered body 20 tends to decrease. On the other hand, if the bulk density B becomes too large, the impregnation amount of the semi-cured product of the thermosetting resin composition tends to decrease, and the insulating property of the composite tends to decrease.
  • the thermal conductivity of the nitride sintered body 20 may be 10 W / (m ⁇ K) or more, 15 W / (m ⁇ K) or more, and 20 W / (m ⁇ K) or more. , 25 W / (m ⁇ K) or more.
  • the thermal conductivity (H) can be calculated by the following formula (3).
  • the thermal conductivity (H) may be 70 W / (m ⁇ K) or less, 60 W / (m ⁇ K) or less, and 50 W / (m ⁇ K) or less.
  • H A ⁇ B ⁇ C (3)
  • H is the thermal conductivity (W / (m ⁇ K))
  • A is the thermal diffusivity (m 2 / sec)
  • B is the bulk density (kg / m 3 )
  • C is the specific heat capacity. (J / (kg ⁇ K)) is shown.
  • the thermal diffusivity A can be measured by a laser flash method.
  • the bulk density B can be obtained from the volume and mass of the nitride sintered body 20.
  • the specific heat capacity C can be measured using a differential scanning calorimeter.
  • the nitride sintered body 20 may be a boron nitride sintered body.
  • the boron nitride sintered body may contain components other than boron nitride.
  • the content of boron nitride in the boron nitride sintered body may be 90% by mass or more, 95% by mass or more, and 98% by mass or more.
  • the nitride sintered body 20 has a sheet shape (thin plate shape). Since the sheet-shaped nitride sintered body 20 has a small thickness t 0 , the resin composition can be smoothly impregnated. As a result, the pores of the nitride sintered body are sufficiently filled with the semi-cured product, and a composite having excellent insulating properties can be obtained.
  • the orientation index of the boron nitride crystal in the boron nitride sintered body may be 20 or less, 18 or less, and 15 or less. Thereby, the anisotropy of thermal conductivity can be sufficiently reduced. Therefore, in the case of a sheet like a boron nitride sintered body, the thermal conductivity along the thickness direction can be sufficiently increased.
  • the thermal conductivity (H) along the thickness direction of the boron nitride sintered body is preferably the above-mentioned value.
  • the orientation index of the boron nitride sintered body may be 0.5 or more, 3 or more, or 5 or more.
  • the orientation index in the present disclosure is an index for quantifying the degree of orientation of boron nitride crystals.
  • the orientation index can be calculated by the peak intensity ratio [I (002) / I (100)] of the (002) plane and the (100) plane of boron nitride measured by an X-ray diffractometer.
  • the shape of the nitride sintered body is not limited to the shape shown in FIG. 1, and may be, for example, a disk-shaped sheet or a C-shaped sheet in which the main surfaces 20a and 20b are curved.
  • the thickness change rate can be measured by processing into a sheet as shown in FIG.
  • the block-shaped nitride sintered body may be cut and / or polished to be processed into a sheet shape as shown in FIG.
  • material loss will occur. Therefore, if a sheet-shaped nitride sintered body is produced using the sheet-shaped molded body, material loss can be reduced. Thereby, the yield of the nitride sintered body and the composite can be improved.
  • the block-shaped nitride sintered body is a polyhedron, for example, all sides have a suitable length, and the block-shaped nitride sintered body has a larger thickness than the sheet-shaped nitride sintered body. That is, the block shape means a shape that can be divided into a plurality of sheet shapes (thin plate shapes) by cutting.
  • the composite according to one embodiment is a composite of a nitride sintered body and a semi-cured product of a thermosetting resin composition, and is at least a part of the pores of the above-mentioned nitride sintered body and the nitride sintered body. It has a semi-cured product of a thermosetting resin composition filled in.
  • the thermosetting resin composition include epoxy resin, silicone resin, cyanate resin, silicone rubber, acrylic resin, phenol resin, melamine resin, urea resin, bismaleimide resin unsaturated polyester, fluororesin, polyimide, polyamideimide, and the like.
  • the thermosetting resin composition may contain an epoxy resin from the viewpoint of improving heat resistance and adhesive strength to the circuit.
  • the resin may contain a silicone resin from the viewpoint of improving heat resistance, flexibility, and adhesion to a heat sink or the like.
  • the semi-cured product of the thermosetting resin composition is also referred to as a B stage state.
  • the content of the boron nitride particles in the complex may be 25 to 65% by volume or 39 to 48% by volume based on the total volume of the complex.
  • the content of the semi-cured product of the thermosetting resin composition in the complex may be 35 to 75% by volume or 52 to 61% by volume based on the total volume of the complex.
  • a composite containing boron nitride particles and a semi-cured product of a thermosetting resin composition at such a ratio can achieve both high adhesiveness and high thermal conductivity at a high level.
  • the content of the resin containing the semi-cured product in the complex may be 10 to 70% by mass, 10 to 60% by mass, or 20 to 60% by mass based on the total mass of the complex. It may be 20 to 55% by mass, and may be 25 to 55% by mass.
  • a complex containing a resin in such a ratio can achieve both high adhesiveness and thermal conductivity at a high level.
  • the content of the resin in the complex can be determined by heating the complex to decompose and remove the resin, and calculating the mass of the resin from the mass difference before and after heating.
  • the filling rate of the resin containing the semi-cured product in the complex may be 80% by volume or more, 90% by volume or more, or 92% by volume or more.
  • the resin filling rate is the volume ratio of the pores filled with the resin (semi-cured product + cured product) among all the pores in the boron nitride sintered body.
  • the porosity in the complex may be 20% by volume or less, 10% by volume or less, 8% by volume or less, 6% by volume or less, and 5% by volume or less. It may be 4% by volume or less. As a result, both high adhesiveness and high insulation can be achieved at a sufficiently high level.
  • the complex may further contain other components in addition to the nitride sintered body and the semi-cured product of the thermosetting resin composition filled in the pores thereof.
  • other components include a curing agent, an inorganic filler, a silane coupling agent, a defoaming agent, a surface conditioner, a wet dispersant and the like.
  • the inorganic filler may contain one or more selected from the group consisting of aluminum oxide, silicon oxide, zinc oxide, silicon nitride, aluminum nitride and aluminum hydroxide. Thereby, the thermal conductivity of the complex can be further improved.
  • the semi-cured product may contain a completely cured product (C stage). The cured product and the semi-cured product may be collectively referred to as a resin.
  • the composite may be in the form of a sheet (thin plate shape) as shown in FIG. 1, similarly to the nitride sintered body. Since the sheet-shaped complex 10 has a small thickness, it can be suitably used as a heat radiating member for electronic devices and the like. Moreover, the resin composition is sufficiently impregnated.
  • the composite 10 contains the above-mentioned nitride sintered body and a semi-cured product of a thermosetting resin composition.
  • the complex 10 is sandwiched between a pair of opposing members and pressed to join, the complex 10 is deformed at a predetermined thickness change rate.
  • the resin component impregnated in the complex exudes.
  • the complex 10 can be firmly adhered to other members by the action of the exuded resin component. Therefore, the complex 10 is excellent in adhesiveness to other members. Therefore, the complex 10 has sufficiently high reliability.
  • Such a complex 10 can be suitably used as a heat radiating member.
  • the shape of the heat radiating member may be the same as that of the complex 10 shown in FIG. 1, or may be different.
  • the production method of this example includes a sintering step of sintering boron nitride powder to obtain a block-shaped boron nitride sintered body.
  • the raw material powder include amorphous boron nitride powder having an average particle size of 0.5 to 10 ⁇ m and hexagonal boron nitride powder having an average particle size of 3.0 to 40 ⁇ m. These powders may be mixed using a Henschel mixer or the like, or may be mixed in a slurry form in water or an ethanol solution using a disparizer.
  • a slurry containing such boron nitride powder may be spheroidized by a spray dryer or the like, molded, and then sintered to obtain a boron nitride sintered body.
  • a mold may be used for molding, or a cold isotropic pressing (CIP) method may be used.
  • the average particle size of each of the above-mentioned boron nitride powders is a particle size of 50% of the cumulative value of the cumulative particle size distribution in the particle size distribution measurement by the laser diffraction light scattering method.
  • the particle size distribution measuring machine include "MT3300EX" (manufactured by Nikkiso Co., Ltd.).
  • water is used as a solvent
  • hexametaphosphate is used as a dispersant
  • a homogenizer is used for 30 seconds to carry out a dispersion treatment with an output of 20 W.
  • 1.33 is used for the refractive index of water
  • 1.80 is used for the refractive index of the boron nitride powder.
  • the measurement time per measurement is 30 seconds.
  • a sintering aid When sintering the boron nitride powder, a sintering aid may be used.
  • the sintering aid may be, for example, an oxide of a rare earth element such as itria oxide, alumina oxide and magnesium oxide, a carbonate of an alkali metal such as lithium carbonate and sodium carbonate, and boric acid.
  • the amount of the sintering aid added may be, for example, 1.5 to 25 parts by mass with respect to 100 parts by mass of the total of the boron nitride powder and the sintering aid. , 3.0 to 22 parts by mass.
  • the sintering temperature in the sintering step may be, for example, 1600 ° C. or higher, or 1700 ° C. or higher.
  • the sintering temperature may be, for example, 2200 ° C. or lower, 2100 ° C. or lower, or 2000 ° C. or lower.
  • the sintering time may be, for example, 1 hour or more, or 30 hours or less.
  • the atmosphere at the time of sintering may be, for example, an atmosphere of an inert gas such as nitrogen, helium, and argon.
  • a batch type furnace, a continuous type furnace, or the like can be used.
  • the batch type furnace include a high frequency furnace, a muffle furnace, a tube furnace, an atmosphere furnace, and the like.
  • the continuous furnace include a rotary kiln, a screw conveyor furnace, a tunnel furnace, a belt furnace, a pusher furnace, a koto-shaped continuous furnace, and the like. In this way, a block-shaped boron nitride sintered body can be obtained.
  • the method for producing the complex of this example includes an impregnation step and a cutting step of impregnating a block-shaped (for example, a bulk body having a thickness of more than 2 mm) boron nitride sintered body with a resin composition.
  • the thermosetting resin composition may contain a main agent, a curing agent and a solvent from the viewpoint of improving fluidity and handleability.
  • an inorganic filler, a silane coupling agent, a defoaming agent, a surface conditioner, a wet dispersant and the like may be contained.
  • thermosetting resin composition one that becomes the semi-cured product mentioned in the above description of the complex by the semi-curing reaction can be used.
  • solvent include aliphatic alcohols such as ethanol and isopropanol, 2-methoxyethanol, 1-methoxyethanol, 2-ethoxyethanol, 1-ethoxy-2-propanol, 2-butoxyethanol and 2- (2-methoxyethoxy).
  • Ether alcohols such as ethanol, 2- (2-ethoxyethoxy) ethanol, 2- (2-butoxyethoxy) ethanol, glycol ethers such as ethylene glycol monomethyl ether and ethylene glycol monobutyl ether, acetone, methyl ethyl ketone, methyl isobutyl ketone, diisobutyl
  • ketones such as ketones and hydrocarbons such as toluene and xylene. One of these may be contained alone, or two or more thereof may be contained in combination.
  • Impregnation is performed by adhering a thermosetting resin composition to a boron nitride sintered body.
  • the boron nitride sintered body may be immersed in a thermosetting resin composition. It may be carried out under atmospheric pressure, pressurization, or depressurization conditions in the immersed state.
  • a thermosetting resin composition can be applied to the boron nitride sintered body to impregnate it. In this way, the pores of the boron nitride sintered body can be filled with the resin.
  • the impregnation step may be performed in an impregnation device provided with a closed container.
  • the pressure in the impregnating device may be increased to be higher than the atmospheric pressure and impregnated under pressurized conditions.
  • the depressurization condition and the pressurization condition may be repeated a plurality of times.
  • the impregnation step may be performed while heating.
  • thermosetting resin composition impregnated in the pores of the boron nitride sintered body becomes a semi-cured product after semi-curing proceeds or the solvent volatilizes.
  • a composite having a boron nitride sintered body and a semi-cured product filled in its pores is obtained. It is not necessary that all the pores are filled with the semi-cured product, and some of the pores may not be filled with the semi-cured product.
  • Boron nitride sintered bodies and complexes may contain both closed and open pores.
  • the impregnation step there may be a curing step of curing the thermosetting resin composition filled in the pores.
  • the curing step for example, the composite filled with the thermosetting resin is taken out from the impregnation device, heated and / or irradiated with light depending on the type of the resin composition (or the curing agent added as needed). Semi-cures the resin.
  • the impregnation step may be performed by combining impregnation under reduced pressure conditions and impregnation under pressurized conditions.
  • the pressure in the impregnation device when the impregnation step is carried out under reduced pressure conditions may be, for example, 1000 Pa or less, 500 Pa or less, 100 Pa or less, 50 Pa or less, or 30 Pa or less.
  • the pressure in the impregnation device may be, for example, 1 MPa or more, 3 MPa or more, 10 MPa or more, or 30 MPa or more.
  • the solution containing the thermosetting resin composition may be heated.
  • the viscosity of the solution can be adjusted and the impregnation of the thermosetting resin composition can be promoted.
  • the viscosity of the solution containing the thermosetting resin composition at the time of impregnation may be, for example, 500 mPa ⁇ s or less.
  • the thermosetting resin composition can be sufficiently impregnated into the boron nitride sintered body.
  • the nitride sintered body is kept immersed in a solution containing a thermosetting resin composition for a predetermined time.
  • the predetermined time may be, for example, 5 hours or more, or 10 hours or more.
  • thermosetting resin composition filled in the pores.
  • the curing step for example, the composite filled with the thermosetting resin composition is taken out from the impregnation device and heated according to the type of the thermosetting resin composition (or the curing agent added as needed). And / or light irradiation causes the thermosetting resin composition to be semi-cured.
  • "Semi-hardening" also referred to as B stage
  • B stage means that it can be further hardened by a subsequent hardening treatment. Utilizing the fact that it is in a semi-cured state, it may be temporarily pressure-bonded to an adherend such as a metal substrate and then heated to adhere to the adherend.
  • thermosetting resin composition By further curing the semi-cured product, it can be in a "completely cured" (also referred to as C stage) state. Whether or not the thermosetting resin composition is in a semi-cured state can be confirmed by, for example, a differential scanning calorimeter.
  • the obtained resin impregnated body is cut using, for example, a wire saw.
  • the wire saw may be, for example, a multi-cut wire saw or the like. ) Can be cut and prepared. In this way, a sheet-like complex can be obtained.
  • Nitride sintered bodies other than the boron nitride sintered body can be produced by a known method.
  • a boron nitride sintered body may be obtained by hot pressing in which molding and sintering are performed at the same time.
  • Example 1 ⁇ Preparation of Boron Nitride Sintered Body> Hexagonal boron nitride powder (oxygen content 0.8% by mass, boron nitride purity 99.0% by mass) having an average particle size of 8.0 ⁇ m is 40.0% by mass, and the average particle size is 13.0 ⁇ m. A certain hexagonal boron nitride powder (oxygen content: 0.3% by mass, boron nitride purity: 99.0% by mass) is measured so as to be 60.0% by mass, and these are mixed to prepare a raw material powder. bottom.
  • a sintering aid was prepared by blending powdered boric acid and calcium carbonate. In the preparation, 60 parts by mass of calcium carbonate was added to 100 parts by mass of boric acid. 14 parts by mass of a sintering aid and 10 parts by mass of a binder (polyvinyl alcohol (“Gosenol”, manufactured by Nippon Synthetic Chemical Industry Co., Ltd.)) were blended with respect to 100 parts by mass of the raw material powder. The obtained compound was heated and stirred at 50 ° C. until it was dissolved, and then spheroidized at a drying temperature of 230 ° C. using a spray dryer. In this way, a spheroidized mixed powder was prepared. A rotary atomizer was used as the spheroidizing device of the spray dryer.
  • the above mixed powder was filled in a cold isotropic pressure (CIP) device (manufactured by Kobe Steel, Ltd., trade name: ADW800) and compressed at a pressure of 30 MPa to prepare a molded product.
  • CIP cold isotropic pressure
  • the produced molded product was sintered by holding it at 2000 ° C. for 10 hours using a batch type high frequency furnace (manufactured by Fuji Dempa Kogyo Co., Ltd., trade name: FTH-300-1H).
  • FTH-300-1H a batch type high frequency furnace
  • the firing was carried out by adjusting the inside of the furnace under a nitrogen atmosphere while flowing nitrogen into the furnace in a standard state so that the flow rate was 10 L / min.
  • H is the thermal conductivity (W / (m ⁇ K))
  • A is the thermal diffusivity (m 2 / sec)
  • B is the bulk density (kg / m 3 )
  • C is the specific heat capacity. (J / (kg ⁇ K)) is shown.
  • a xenon flash analyzer manufactured by NETZSCH, trade name: LFA447NanoFlash was used as the measuring device.
  • the bulk density B was calculated from the volume and mass of the boron nitride sintered body.
  • the specific heat capacity C was measured using a differential scanning calorimeter (manufactured by Rigaku Co., Ltd., device name: ThermoPlusEvo DSC8230).
  • the results of thermal conductivity H and bulk density B are shown in Table 1.
  • the orientation index [I (002) / I (100)] of the boron nitride sintered body was determined using an X-ray diffractometer (manufactured by Rigaku Co., Ltd., trade name: ULTIMA-IV).
  • the measurement sample (boron nitride sintered body) set in the sample holder of the X-ray diffractometer was irradiated with X-rays to perform baseline correction. Then, the peak intensity ratio of the (002) plane and the (100) plane of boron nitride was calculated. This was defined as the orientation index [I (002) / I (100)].
  • the results are as shown in Table 1.
  • Epoxy resin manufactured by Mitsubishi Chemical Co., Ltd., trade name: Epicoat 807
  • curing agent manufactured by Nippon Synthetic Chemical Industry Co., Ltd., trade name: Acmex H-84B
  • the boron nitride sintered body was immersed in the thermosetting resin composition containing the above, and the boron nitride sintered body was impregnated with the thermosetting resin composition. After impregnation, the thermosetting resin composition was semi-cured by heating at a temperature of 150 ° C.
  • Resin filling rate in the composite ((composite bulk density-boron nitride sintered bulk density) / (complex theoretical density-boron nitride sintered bulk density)) x 100. ⁇ ⁇ (6)
  • Theoretical density of composite true density of boron nitride sintered body + true density of resin x (1-bulk density of boron nitride sintered body / true density of boron nitride sintered body) ... (7)
  • the bulk density of the boron nitride sintered body conforms to the measurement method of density and specific gravity by geometric measurement of JIS Z 8807: 2012, and is a sheet-shaped (rectangular) boron nitride sintered body (composite). It was obtained from the volume calculated from the length of each side (measured by a caliper) and the mass measured by an electronic balance (see item 9 of JIS Z 8807: 2012).
  • the true density of the boron nitride sintered body and the resin conforms to the method of measuring the density and specific gravity by the gas substitution method of JIS Z 8807: 2012, and the volume of the boron nitride sintered body and the resin measured using a dry automatic densitometer. (Refer to equations (14) to (17) in paragraph 11 of JIS Z 8807: 2012).
  • the resin content in the complex sheet is as shown in Table 2.
  • the content (% by mass) of this resin is the mass ratio of the semi-cured product to the entire complex.
  • the content of the semi-cured product was calculated by calculating the mass of the semi-cured product from the mass difference between the boron nitride sintered body and the composite, and dividing the mass of the semi-cured product by the mass of the composite.
  • the cohesive fracture portion is the area of the portion of the adhesive surface of the composite that has been adhered to the copper foil and that the composite has broken.
  • Example 2 Boron nitride firing was performed in the same procedure as in Example 1 except that when the molded product was produced, the mixed powder was compressed at a pressure of 35 MPa with a cold isotropic pressure (CIP) device to obtain the molded product. Bounds and complexes were made. Each measurement of the boron nitride sintered body and the composite was carried out in the same manner as in Example 1. The results are as shown in Tables 1 and 2.
  • Example 3 Boron nitride sintered body and composite were obtained by the same procedure as in Example 1 except that the molded product was obtained by compressing it with a cold isotropic pressure (CIP) device at a pressure of 90 MPa when producing the molded product. The body was made. Each measurement of the boron nitride sintered body and the composite was carried out in the same manner as in Example 1. The results are as shown in Tables 1 and 2.
  • Example 4 Boron nitride sintered body and composite were obtained by the same procedure as in Example 1 except that the molded product was obtained by compressing it with a cold isotropic pressure (CIP) device at a pressure of 10 MPa when producing the molded product. The body was made. Each measurement of the boron nitride sintered body and the composite was carried out in the same manner as in Example 1. The results are as shown in Tables 1 and 2.
  • Example 5 Amorphous boron nitride powder (oxygen content: 1.8% by mass, boron nitride purity: 97.2% by mass) having an average particle size of 0.8 ⁇ m is 40.0% by mass, and an average particle size is 13.0 ⁇ m.
  • Hexagonal boron nitride powder (oxygen content: 0.3% by mass, boron nitride purity: 99.0% by mass) was measured so as to be 60.0% by mass, and blended to prepare a raw material powder. ..
  • a boron nitride sintered body and a complex were prepared in the same procedure as in Example 1 except that this raw material powder was used. Each measurement of the boron nitride sintered body and the composite was carried out in the same manner as in Example 1. The results are as shown in Tables 1 and 2.
  • Example 6 The boron nitride sintered body and the composite were prepared in the same procedure as in Example 1 except that the method for producing the molded product was changed from cold isotropic pressure (CIP) to mold molding (molding pressure: 50 MPa). Made. Each measurement of the boron nitride sintered body and the composite was carried out in the same manner as in Example 1. The results are as shown in Tables 1 and 2.
  • Example 7 The boron nitride sintered body and the composite were prepared in the same procedure as in Example 1 except that the method for producing the molded product was changed from cold isotropic pressure (CIP) to mold molding (molding pressure: 15 MPa). Made. Each measurement of the boron nitride sintered body and the composite was carried out in the same manner as in Example 1. The results are as shown in Tables 1 and 2.
  • Example 8 No spheroidizing treatment was performed with a spray dryer, and a mixed powder was prepared by stirring the raw material powder and the sintering aid using a Henschel mixer, which was used in a cold isotropic pressurizer.
  • a boron nitride sintered body and a composite were prepared in the same procedure as in Example 1 except that the molded product was produced.
  • Each measurement of the boron nitride sintered body and the composite was carried out in the same manner as in Example 1. The results are as shown in Tables 1 and 2.
  • Example 9 A boron nitride sintered body and a composite were prepared in the same procedure as in Example 8 except that the molded product was produced by mold molding (molding pressure: 30 MPa) instead of the cold isotropic pressurizing device. Each measurement of the boron nitride sintered body and the composite was carried out in the same manner as in Example 1. The results are as shown in Tables 1 and 2.
  • Hexagonal boron nitride powder (oxygen content: 0.3% by mass, boron nitride purity: 99.1% by mass) having an average particle size of 18.0 ⁇ m is 40.0% by mass, and the average particle size is 13.
  • Hexagonal boron nitride powder (oxygen content: 0.3% by mass, boron nitride purity: 99.0% by mass), which is 0 ⁇ m, is measured so as to be 60.0% by mass, and these are mixed and used as a raw material.
  • a powder was prepared.
  • a boron nitride sintered body and a complex were prepared in the same procedure as in Example 1 except that this raw material powder was used.
  • Each measurement of the boron nitride sintered body and the composite was carried out in the same manner as in Example 1. The results are as shown in Tables 1 and 2.
  • Example 2 Boron nitride sintered body and composite were obtained by the same procedure as in Example 1 except that the molded product was obtained by compressing it with a cold isotropic pressure (CIP) device at a pressure of 150 MPa when producing the molded product. The body was made. Each measurement of the boron nitride sintered body and the composite was carried out in the same manner as in Example 1. The results are as shown in Tables 1 and 2.

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Abstract

Provided is a composite containing: a nitride sintered body having a porous structure; and a semi-cured product of a thermosetting resin composition impregnated in the nitride sintered body, wherein the composite has a thickness change rate of at least 2% when pressed under 5 MPa in the thickness direction. Provided is a heat dissipation member having said composite.

Description

複合体、及び放熱部材Complex and heat dissipation member
 本開示は、複合体、及び放熱部材に関する。 This disclosure relates to a complex and a heat radiating member.
 パワーデバイス、トランジスタ、サイリスタ、CPU等の部品においては、使用時に発生する熱を効率的に放熱することが求められる。このような要請から、従来、電子部品を実装するプリント配線板の絶縁層の高熱伝導化を図ったり、電子部品又はプリント配線板を、電気絶縁性を有する熱インターフェース材(Thermal Interface Materials)を介してヒートシンクに取り付けたりすることが行われてきた。このような絶縁層及び熱インターフェース材には、樹脂と窒化ホウ素等のセラミックスとで構成される複合体(放熱部材)が用いられる。 In parts such as power devices, transistors, thyristors, and CPUs, it is required to efficiently dissipate the heat generated during use. In response to such demands, conventional methods have been used to increase the thermal conductivity of the insulating layer of printed wiring boards on which electronic components are mounted, or to use thermal interface materials (Thermal Interface Materials) that have electrical insulation properties for electronic components or printed wiring boards. It has been used to attach it to a heat sink. For such an insulating layer and a thermal interface material, a composite (heat dissipation member) composed of a resin and ceramics such as boron nitride is used.
 このような複合体として、多孔性のセラミックス成形体に樹脂を含浸させた複合体を用いることが検討されている。窒化ホウ素は、潤滑性、高熱伝導性、及び絶縁性等を有していることから、窒化ホウ素を含むセラミックスを放熱部材に用いることが検討されている。特許文献1では、配向度及び黒鉛化指数を所定の範囲にして、熱伝導率に優れつつ熱伝導率の異方性を低減する技術が提案されている。 As such a complex, it is being studied to use a composite in which a porous ceramic molded body is impregnated with a resin. Since boron nitride has lubricity, high thermal conductivity, insulating properties, etc., it is being studied to use ceramics containing boron nitride as a heat radiating member. Patent Document 1 proposes a technique for reducing the anisotropy of thermal conductivity while having excellent thermal conductivity by setting the degree of orientation and the graphitization index within a predetermined range.
特開2014-162697号公報Japanese Unexamined Patent Publication No. 2014-162679
 近年の電子デバイスは高集積化が進んでいる。これに伴って、電子デバイスを構成する各種部品は、高い位置精度で搭載されることが求められる。このような観点から、各種部品は、他の部品との接着性に優れることが求められている。 In recent years, electronic devices have become highly integrated. Along with this, various parts constituting the electronic device are required to be mounted with high position accuracy. From this point of view, various parts are required to have excellent adhesiveness to other parts.
 そこで、本開示は、他部材との接着性に優れる複合体を提供する。また、本開示では、上述の複合体を備えることによって、十分に高い信頼性を有する放熱部材を提供する。 Therefore, the present disclosure provides a complex having excellent adhesiveness to other members. Further, in the present disclosure, by providing the above-mentioned composite, a heat radiating member having sufficiently high reliability is provided.
 本開示は、多孔質構造を有する窒化物焼結体と、窒化物焼結体に含浸された熱硬化性樹脂組成物の半硬化物とを含む複合体であって、5MPaで厚み方向に加圧したときの厚み変化率が2%以上である、複合体を提供する。このような複合体は、例えば、対向する一対の部材間に挟んで加圧されると所定の厚み変化率で変形する。ここで、上記複合体は、多孔質構造を有する窒化物焼結体を有し、この窒化物焼結体に熱硬化性樹脂組成物の半硬化物が含浸されている。この複合体を対向する一対の部材間に挟んで加圧して接合すると、複合体が所定の厚み変化率で変形する。変形すると複合体に含まれていた樹脂成分が染み出す。染み出した樹脂成分の作用によって、複合体を他部材に強固に接着することができる。このため接着性に優れる。 The present disclosure is a composite containing a nitride sintered body having a porous structure and a semi-cured product of a thermosetting resin composition impregnated in the nitride sintered body, and is applied in the thickness direction at 5 MPa. Provided is a composite having a thickness change rate of 2% or more when pressed. Such a complex is deformed at a predetermined thickness change rate when, for example, it is sandwiched between a pair of opposing members and pressurized. Here, the composite has a nitride sintered body having a porous structure, and the nitride sintered body is impregnated with a semi-cured product of a thermosetting resin composition. When this complex is sandwiched between a pair of opposing members and pressed to join, the complex is deformed at a predetermined rate of change in thickness. When deformed, the resin component contained in the complex exudes. By the action of the exuded resin component, the complex can be firmly adhered to other members. Therefore, it has excellent adhesiveness.
 上記複合体の厚み変化率は、35%以下であってよい。このような厚み変化率を有することによって、他部材との接着の際に加圧されても形状をある程度保持することができる。このため、例えば電子部品の寸法精度を向上することができる。 The thickness change rate of the complex may be 35% or less. By having such a thickness change rate, the shape can be maintained to some extent even if pressure is applied when adhering to other members. Therefore, for example, the dimensional accuracy of the electronic component can be improved.
 上記複合体に含まれる窒化ホウ素焼結体の気孔率は40~75体積%であってよい。これによって、窒化ホウ素焼結体の強度と熱伝導率を維持しつつ、熱硬化性樹脂組成物の半硬化物の含浸量を十分に大きくすることができる。このような複合体は、優れた絶縁性と接着性を高い水準で両立できる。なお、上記気孔率は、樹脂が充填されている気孔と樹脂が充填されていない気孔の合計の体積比率である。 The porosity of the boron nitride sintered body contained in the above complex may be 40 to 75% by volume. Thereby, the impregnation amount of the semi-cured product of the thermosetting resin composition can be sufficiently increased while maintaining the strength and thermal conductivity of the boron nitride sintered body. Such a complex can achieve both excellent insulation and adhesiveness at a high level. The porosity is the total volume ratio of the pores filled with the resin and the pores not filled with the resin.
 上記複合体に含まれる窒化ホウ素焼結体のかさ密度は600~1400kg/mであってよい。これによって、窒化ホウ素焼結体の強度と熱伝導率を維持しつつ、熱硬化性樹脂組成物の半硬化物の含浸量を十分に大きくすることができる。このような複合体は、優れた絶縁性と接着性を高い水準で両立できる。 The bulk density of the boron nitride sintered body contained in the complex may be 600 to 1400 kg / m 3 . Thereby, the impregnation amount of the semi-cured product of the thermosetting resin composition can be sufficiently increased while maintaining the strength and thermal conductivity of the boron nitride sintered body. Such a complex can achieve both excellent insulation and adhesiveness at a high level.
 上記複合体に含まれる窒化ホウ素焼結体の配向性指数は20以下であってよい。これによって、熱伝導率の異方性を十分に低減することができる。 The orientation index of the boron nitride sintered body contained in the above complex may be 20 or less. Thereby, the anisotropy of thermal conductivity can be sufficiently reduced.
 本開示は、一つの側面において、上述の複合体を有する放熱部材を提供する。この放熱部材は上述の複合体を有することから、接着性に優れる。 The present disclosure provides a heat radiating member having the above-mentioned complex in one aspect. Since this heat radiating member has the above-mentioned composite, it has excellent adhesiveness.
 本開示によれば、他部材との接着性に優れる複合体を提供することができる。また、本開示では、上述の複合体を備えることによって、十分に高い信頼性を有する放熱部材を提供することができる。 According to the present disclosure, it is possible to provide a complex having excellent adhesiveness to other members. Further, in the present disclosure, by providing the above-mentioned composite, it is possible to provide a heat radiating member having sufficiently high reliability.
複合体の一実施形態を示す斜視図である。It is a perspective view which shows one Embodiment of a complex.
 以下、場合により図面を参照して、本開示の実施形態を説明する。ただし、以下の実施形態は、本開示を説明するための例示であり、本開示を以下の内容に限定する趣旨ではない。 Hereinafter, embodiments of the present disclosure will be described with reference to the drawings in some cases. However, the following embodiments are examples for explaining the present disclosure, and are not intended to limit the present disclosure to the following contents.
 図1は、一実施形態に複合体の斜視図である。シート状の複合体10は、多孔質構造を有する窒化物焼結体20と、窒化物焼結体20に含浸された熱硬化性樹脂組成物の半硬化物とを含む。窒化物焼結体20は、窒化ホウ素の一次粒子同士が焼結して構成される窒化ホウ素粒子と気孔とを含有する。複合体10の接着性を一層向上する観点から5MPaで厚み方向に加圧したときの、厚み変化率は、2%以上であってよく、5%以上であってもよい。一方、複合体10の過度の変形を抑制して、複合体10の形状を維持する観点から、厚み変化率は、35%以下であってよく、20%以下であってもよい。厚み変化率の一例は、2~35%である。 FIG. 1 is a perspective view of a complex in one embodiment. The sheet-like composite 10 contains a nitride sintered body 20 having a porous structure and a semi-cured product of a thermosetting resin composition impregnated in the nitride sintered body 20. The nitride sintered body 20 contains boron nitride particles and pores formed by sintering primary boron nitride particles. From the viewpoint of further improving the adhesiveness of the complex 10, the thickness change rate when pressurized at 5 MPa in the thickness direction may be 2% or more, or 5% or more. On the other hand, from the viewpoint of suppressing excessive deformation of the complex 10 and maintaining the shape of the complex 10, the thickness change rate may be 35% or less, or 20% or less. An example of the thickness change rate is 2 to 35%.
 本開示における厚み変化率は、複合体10を加圧する前の厚みtに対する、厚み方向に5MPaで厚み方向に沿って加圧したときの厚みt1の比率(%)として求められる。すなわち、厚み変化率は下記式(1)によって求められる。
 厚み変化率(%)=(t1/t)×100    (1)
The thickness change rate in the present disclosure is determined as the ratio (%) of the thickness t1 when the composite 10 is pressed along the thickness direction at 5 MPa in the thickness direction with respect to the thickness t before the pressure is applied. That is, the thickness change rate is calculated by the following formula (1).
Thickness change rate (%) = (t1 / t) x 100 (1)
 厚み変化率は、測定温度200℃で、株式会社島津製作所製の精密万能試験機(商品名:オートグラフAG-X)を用いて測定することができる。複合体10の主面10a,10bに、厚み変化率の測定に影響を及ぼす程度の凹凸又は突起物がある場合は、主面10a,10bを加工して凹凸を除去する。これらの加工は、例えば、MORI SEIKI社制のマシニングセンター(商品名:Duravertaical 635 eco)を用いて行ってもよい。 The thickness change rate can be measured at a measurement temperature of 200 ° C. using a precision universal testing machine (trade name: Autograph AG-X) manufactured by Shimadzu Corporation. If the main surfaces 10a and 10b of the complex 10 have irregularities or protrusions that affect the measurement of the thickness change rate, the main surfaces 10a and 10b are processed to remove the irregularities. These processes may be performed using, for example, a machining center (trade name: Dualvertical 635 eco) operated by MORI SEIKI.
 複合体10の厚みtは、2mm未満であってよく、1mm未満であってよく、0.5mm未満であってもよい。ある程度の強度を維持する観点から、複合体10の厚みtは、0.1mm以上であってよく、0.2mm以上であってもよい。複合体10の厚みの一例は、0.1mm以上且つ2mm未満である。複合体10の主面10a,10bの面積は、それぞれ、25mm以上であってよく、100mm以上であってよく、500mm以上であってよく、800mm以上であってよく、1000mm以上であってもよい。 The thickness t of the complex 10 may be less than 2 mm, less than 1 mm, and less than 0.5 mm. From the viewpoint of maintaining a certain level of strength, the thickness t of the complex 10 may be 0.1 mm or more, or 0.2 mm or more. An example of the thickness of the complex 10 is 0.1 mm or more and less than 2 mm. The areas of the main surfaces 10a and 10b of the complex 10 may be 25 mm 2 or more, 100 mm 2 or more, 500 mm 2 or more, 800 mm 2 or more, 1000 mm 2 or more, respectively. May be.
 窒化物焼結体20の厚みtは、2mm未満であってよく、1mm未満であってよく、0.5mm未満であってもよい。成形体作製の容易性の観点から、窒化物焼結体20の厚みは、0.1mm以上であってよく、0.2mm以上であってもよい。窒化物焼結体20の主面20a,20bの面積は、25mm以上であってよく、100mm以上であってよく、500mm以上であってよく、800mm以上であってよく、1000mm以上であってもよい。 The thickness t of the nitride sintered body 20 may be less than 2 mm, less than 1 mm, or less than 0.5 mm. From the viewpoint of ease of molding, the thickness of the nitride sintered body 20 may be 0.1 mm or more, or 0.2 mm or more. The main surface 20a of the nitride sintered body 20, the area of the 20b, may be at 25 mm 2 or more, may be at 100 mm 2 or more, may be at 500 mm 2 or more, may be at 800 mm 2 or more, 1000 mm 2 It may be the above.
 窒化物焼結体20に含まれる気孔の平均細孔径は10μm未満であってよい。気孔のサイズを小さくすることによって、窒化ホウ素粒子の一次粒子同士の接触面積を十分に大きくすることができる。したがって、気孔率を高くしても、強度を維持することができる。 The average pore diameter of the pores contained in the nitride sintered body 20 may be less than 10 μm. By reducing the size of the pores, the contact area between the primary particles of the boron nitride particles can be sufficiently increased. Therefore, the strength can be maintained even if the porosity is increased.
 気孔の平均細孔径は、水銀ポロシメーターを用い、0.5psiaから60,000psiaまで圧力を増やしながら加圧したときの細孔径分布に基づいて求められる。横軸を細孔径、縦軸を累積細孔容積としたときに、累積細孔容積が全細孔容積の50%に達するときの細孔径が平均細孔径である。水銀ポロシメーターとしては、株式会社島津製作所製のものを用いることができる。 The average pore size of the pores is determined based on the pore size distribution when pressure is applied while increasing the pressure from 0.5 psia to 60,000 psia using a mercury porosimeter. When the horizontal axis is the pore diameter and the vertical axis is the cumulative pore volume, the pore diameter when the cumulative pore volume reaches 50% of the total pore volume is the average pore diameter. As the mercury porosimeter, one manufactured by Shimadzu Corporation can be used.
 窒化物焼結体20の気孔率、すなわち、窒化物焼結体20における気孔の体積比率は、40~75体積%であってよく、45~70体積%であってよい。気孔率が大きくなり過ぎると窒化物焼結体の強度及び熱伝導率が低下する傾向にある。一方、気孔率が小さくなり過ぎると複合体を製造したときの熱硬化性樹脂組成物の半硬化物の含有量が減少する傾向にある。 The porosity of the nitride sintered body 20, that is, the volume ratio of the pores in the nitride sintered body 20 may be 40 to 75% by volume or 45 to 70% by volume. If the porosity becomes too large, the strength and thermal conductivity of the nitride sintered body tend to decrease. On the other hand, if the porosity becomes too small, the content of the semi-cured product of the thermosetting resin composition when the composite is produced tends to decrease.
 気孔率は、窒化物焼結体20の体積及び質量から、かさ密度[B(kg/m)]を算出し、このかさ密度と窒化ホウ素の理論密度[2280(kg/m)]とから、下記式(2)によって求めることができる。なお、複合体に含まれる窒化物焼結体の気孔率を測定する場合には、複合体に含まれる熱硬化性樹脂組成物の半硬化物を燃焼させて除去することで測定することができる。
  気孔率(体積%)=[1-(B/2280)]×100   (2)
For the pore ratio, the bulk density [B (kg / m 3 )] was calculated from the volume and mass of the nitride sintered body 20, and the bulk density and the theoretical density of boron nitride [2280 (kg / m 3 )] were used. Therefore, it can be obtained by the following formula (2). When measuring the porosity of the nitride sintered body contained in the composite, it can be measured by burning and removing the semi-cured product of the thermosetting resin composition contained in the composite. ..
Porosity (% by volume) = [1- (B / 2280)] x 100 (2)
 かさ密度Bは、600~1400kg/mであってよく、800~1200kg/mであってもよい。かさ密度Bが小さくなり過ぎると窒化物焼結体20の強度が低下する傾向にある。一方、かさ密度Bが大きくなり過ぎると熱硬化性樹脂組成物の半硬化物の含浸量が減少して複合体の絶縁性が低下する傾向にある。 The bulk density B may be 600 to 1400 kg / m 3 or 800 to 1200 kg / m 3 . If the bulk density B becomes too small, the strength of the nitride sintered body 20 tends to decrease. On the other hand, if the bulk density B becomes too large, the impregnation amount of the semi-cured product of the thermosetting resin composition tends to decrease, and the insulating property of the composite tends to decrease.
 窒化物焼結体20の熱伝導率は、10W/(m・K)以上であってよく、15W/(m・K)以上であってよく、20W/(m・K)以上であってよく、25W/(m・K)以上であってもよい。熱伝導率が高い窒化物焼結体20を用いることによって、放熱性能に十分に優れる放熱部材を得ることができる。熱伝導率(H)は、以下の計算式(3)で求めることができる。熱伝導率(H)は70W/(m・K)以下であってよく、60W/(m・K)以下であってよく、50W/(m・K)以下であってよい。
   H=A×B×C   (3)
The thermal conductivity of the nitride sintered body 20 may be 10 W / (m · K) or more, 15 W / (m · K) or more, and 20 W / (m · K) or more. , 25 W / (m · K) or more. By using the nitride sintered body 20 having a high thermal conductivity, it is possible to obtain a heat radiating member having sufficiently excellent heat radiating performance. The thermal conductivity (H) can be calculated by the following formula (3). The thermal conductivity (H) may be 70 W / (m · K) or less, 60 W / (m · K) or less, and 50 W / (m · K) or less.
H = A × B × C (3)
 式(3)中、Hは熱伝導率(W/(m・K))、Aは熱拡散率(m/sec)、Bはかさ密度(kg/m)、及び、Cは比熱容量(J/(kg・K))を示す。熱拡散率Aは、レーザーフラッシュ法によって測定することができる。かさ密度Bは、窒化物焼結体20の体積及び質量から求めることができる。比熱容量Cは、示差走査熱量計を用いて測定することができる。 In formula (3), H is the thermal conductivity (W / (m · K)), A is the thermal diffusivity (m 2 / sec), B is the bulk density (kg / m 3 ), and C is the specific heat capacity. (J / (kg · K)) is shown. The thermal diffusivity A can be measured by a laser flash method. The bulk density B can be obtained from the volume and mass of the nitride sintered body 20. The specific heat capacity C can be measured using a differential scanning calorimeter.
 窒化物焼結体20は、窒化ホウ素焼結体であってよい。窒化ホウ素焼結体は、窒化ホウ素以外の成分を含んでいてもよい。窒化ホウ素焼結体における窒化ホウ素の含有量は、90質量%以上であってよく、95質量%以上であってよく、98質量%以上であってよい。 The nitride sintered body 20 may be a boron nitride sintered body. The boron nitride sintered body may contain components other than boron nitride. The content of boron nitride in the boron nitride sintered body may be 90% by mass or more, 95% by mass or more, and 98% by mass or more.
 窒化物焼結体20は、シート状(薄板形状)を有する。シート状の窒化物焼結体20は、厚みtが小さいため、樹脂組成物の含浸を円滑に行うことができる。これによって、窒化物焼結体の気孔に半硬化物が十分に充填され、絶縁性に優れる複合体を得ることができる。 The nitride sintered body 20 has a sheet shape (thin plate shape). Since the sheet-shaped nitride sintered body 20 has a small thickness t 0 , the resin composition can be smoothly impregnated. As a result, the pores of the nitride sintered body are sufficiently filled with the semi-cured product, and a composite having excellent insulating properties can be obtained.
 窒化ホウ素焼結体における窒化ホウ素結晶の配向性指数は、20以下であってよく、18以下であってよく、15以下であってよい。これによって、熱伝導性の異方性を十分に低減することができる。したがって、窒化ホウ素焼結体のようにシート状の場合、厚み方向に沿う熱伝導率を十分に高くすることができる。窒化ホウ素焼結体の厚み方向に沿う熱伝導率(H)が上述の値であることが好ましい。窒化ホウ素焼結体の配向性指数は、0.5以上であってもよいし、3以上であってもよいし、5以上であってもよい。本開示における配向性指数は、窒化ホウ素結晶の配向度を定量化するための指標である。配向性指数は、X線回折装置で測定される窒化ホウ素の(002)面と(100)面のピーク強度比[I(002)/I(100)]で算出することができる。 The orientation index of the boron nitride crystal in the boron nitride sintered body may be 20 or less, 18 or less, and 15 or less. Thereby, the anisotropy of thermal conductivity can be sufficiently reduced. Therefore, in the case of a sheet like a boron nitride sintered body, the thermal conductivity along the thickness direction can be sufficiently increased. The thermal conductivity (H) along the thickness direction of the boron nitride sintered body is preferably the above-mentioned value. The orientation index of the boron nitride sintered body may be 0.5 or more, 3 or more, or 5 or more. The orientation index in the present disclosure is an index for quantifying the degree of orientation of boron nitride crystals. The orientation index can be calculated by the peak intensity ratio [I (002) / I (100)] of the (002) plane and the (100) plane of boron nitride measured by an X-ray diffractometer.
 窒化物焼結体の形状は図1の形状に限定されず、例えば、円盤型のシート状であってもよいし、主面20a,20bが湾曲したC型のシート状であってもよい。この場合、図1のようなシート状に加工して厚み変化率を測定することができる。また、ブロック状の窒化物焼結体を切断及び/又は研磨して、図1のようなシート状に加工してもよい。ただし、切断等の加工を行うと、材料ロスが発生する。このため、シート状の成形体を用いてシート状の窒化物焼結体を作製すれば材料ロスを低減することができる。これによって、窒化物焼結体及び複合体の歩留まりを向上することができる。なお、ブロック状の窒化物焼結体は、例えば、多面体であるときに、全ての辺が相応の長さを有しており、シート状の窒化物焼結体よりも大きな厚みを有する。すなわち、ブロック状とは、切断することで複数のシート状(薄板状)のものに分割できるような形状をいう。 The shape of the nitride sintered body is not limited to the shape shown in FIG. 1, and may be, for example, a disk-shaped sheet or a C-shaped sheet in which the main surfaces 20a and 20b are curved. In this case, the thickness change rate can be measured by processing into a sheet as shown in FIG. Further, the block-shaped nitride sintered body may be cut and / or polished to be processed into a sheet shape as shown in FIG. However, if processing such as cutting is performed, material loss will occur. Therefore, if a sheet-shaped nitride sintered body is produced using the sheet-shaped molded body, material loss can be reduced. Thereby, the yield of the nitride sintered body and the composite can be improved. When the block-shaped nitride sintered body is a polyhedron, for example, all sides have a suitable length, and the block-shaped nitride sintered body has a larger thickness than the sheet-shaped nitride sintered body. That is, the block shape means a shape that can be divided into a plurality of sheet shapes (thin plate shapes) by cutting.
 一実施形態に係る複合体は、窒化物焼結体と熱硬化性樹脂組成物の半硬化物の複合体であり、上述の窒化物焼結体と窒化物焼結体の気孔の少なくとも一部に充填された熱硬化性樹脂組成物の半硬化物とを有する。熱硬化性樹脂組成物としては、例えば、エポキシ樹脂、シリコーン樹脂、シアネート樹脂、シリコーンゴム、アクリル樹脂、フェノール樹脂、メラミン樹脂、ユリア樹脂、ビスマレイミド樹脂不飽和ポリエステル、フッ素樹脂、ポリイミド、ポリアミドイミド、ポリエーテルイミド、ポリブチレンテレフタレート、ポリエチレンテレフタレート、ポリフェニレンエーテル、ポリフェニレンサルファイド、全芳香族ポリエステル、ポリスルホン、液晶ポリマー、ポリエーテルスルホン、ポリカーボネート、マレイミド樹脂、マレイミド変性樹脂、ABS(アクリロニトリル-ブタジエン-スチレン)樹脂、AAS(アクリロニトリル-アクリルゴム・スチレン)樹脂、AES(アクリロニトリル・エチレン・プロピレン・ジエンゴム-スチレン)樹脂、ポリグリコール酸樹脂、ポリフタルアミド、ポリアセタール等を用いることができる。これらのうちの1種を単独で含んでもよいし、2種以上を組み合わせて含んでもよい。 The composite according to one embodiment is a composite of a nitride sintered body and a semi-cured product of a thermosetting resin composition, and is at least a part of the pores of the above-mentioned nitride sintered body and the nitride sintered body. It has a semi-cured product of a thermosetting resin composition filled in. Examples of the thermosetting resin composition include epoxy resin, silicone resin, cyanate resin, silicone rubber, acrylic resin, phenol resin, melamine resin, urea resin, bismaleimide resin unsaturated polyester, fluororesin, polyimide, polyamideimide, and the like. Polyetherimide, Polybutylene terephthalate, Polyethylene terephthalate, Polyphenylene ether, Polyphenylene sulfide, Total aromatic polyester, Polysulfone, Liquid crystal polymer, Polyethersulfone, Polycarbonate, Maleimide resin, Maleimide-modified resin, ABS (Acrylonitrile-butadiene-styrene) resin, AAS (acrylonitrile-acrylic rubber / styrene) resin, AES (acrylonitrile / ethylene / propylene / diene rubber-styrene) resin, polyglycolic acid resin, polyphthalamide, polyacetal and the like can be used. One of these may be contained alone, or two or more thereof may be contained in combination.
 複合体がプリント配線板の絶縁層に用いられる場合、耐熱性及び回路への接着強度向上の観点から、熱硬化性樹脂組成物はエポキシ樹脂を含んでよい。複合体が熱インターフェース材に用いられる場合、耐熱性、柔軟性及びヒートシンク等への密着性向上の観点から、樹脂はシリコーン樹脂を含んでよい。熱硬化性樹脂組成物の半硬化物は、Bステージ状態ともいわれる。 When the composite is used for the insulating layer of the printed wiring board, the thermosetting resin composition may contain an epoxy resin from the viewpoint of improving heat resistance and adhesive strength to the circuit. When the composite is used as a thermal interface material, the resin may contain a silicone resin from the viewpoint of improving heat resistance, flexibility, and adhesion to a heat sink or the like. The semi-cured product of the thermosetting resin composition is also referred to as a B stage state.
 複合体における窒化ホウ素粒子の含有量は、複合体の全体積を基準として、25~65体積%であってよく、39~48体積%であってもよい。複合体における熱硬化性樹脂組成物の半硬化物の含有量は、複合体の全体積を基準として、35~75体積%であってよく、52~61体積%であってもよい。このような割合で窒化ホウ素粒子及び熱硬化性樹脂組成物の半硬化物を含む複合体は、高い接着性と熱伝導率を高水準で両立することができる。 The content of the boron nitride particles in the complex may be 25 to 65% by volume or 39 to 48% by volume based on the total volume of the complex. The content of the semi-cured product of the thermosetting resin composition in the complex may be 35 to 75% by volume or 52 to 61% by volume based on the total volume of the complex. A composite containing boron nitride particles and a semi-cured product of a thermosetting resin composition at such a ratio can achieve both high adhesiveness and high thermal conductivity at a high level.
 複合体における半硬化物を含む樹脂の含有量は、複合体の全質量を基準として、10~70質量%であってよく、10~60質量%であってよく、20~60質量%であってよく、20~55質量%であってよく25~55質量%であってよい。このような割合で樹脂を含む複合体は、高い接着性と熱伝導率を高水準で両立することができる。複合体における樹脂の含有量は、複合体を加熱して樹脂を分解して除去し、加熱前後の質量差から樹脂の質量を算出することによって求めることができる。 The content of the resin containing the semi-cured product in the complex may be 10 to 70% by mass, 10 to 60% by mass, or 20 to 60% by mass based on the total mass of the complex. It may be 20 to 55% by mass, and may be 25 to 55% by mass. A complex containing a resin in such a ratio can achieve both high adhesiveness and thermal conductivity at a high level. The content of the resin in the complex can be determined by heating the complex to decompose and remove the resin, and calculating the mass of the resin from the mass difference before and after heating.
 複合体における半硬化物を含む樹脂の充填率は、80体積%以上であってよく、90体積%以上であってよく、92体積%以上であってもよい。樹脂の充填率は、窒化ホウ素焼結体における全ての気孔のうち、樹脂(半硬化物+硬化物)が充填されている気孔の体積比率である。 The filling rate of the resin containing the semi-cured product in the complex may be 80% by volume or more, 90% by volume or more, or 92% by volume or more. The resin filling rate is the volume ratio of the pores filled with the resin (semi-cured product + cured product) among all the pores in the boron nitride sintered body.
 複合体における気孔率は、20体積%以下であってよく、10体積%以下であってよく、8体積%以下であってよく、6体積%以下であってよく、5体積%以下であってよく、4体積%以下であってよい。これによって高い接着性と高い絶縁性を十分に高い水準で両立することができる。 The porosity in the complex may be 20% by volume or less, 10% by volume or less, 8% by volume or less, 6% by volume or less, and 5% by volume or less. It may be 4% by volume or less. As a result, both high adhesiveness and high insulation can be achieved at a sufficiently high level.
 複合体は、窒化物焼結体及びその気孔中に充填された熱硬化性樹脂組成物の半硬化物に加えて、その他の成分をさらに含有してもよい。その他の成分としては、硬化剤、無機フィラー、シランカップリング剤、消泡剤、表面調整剤、湿潤分散剤等が挙げられる。無機フィラーは、酸化アルミニウム、酸化ケイ素、酸化亜鉛、窒化ケイ素、窒化アルミニウム及び水酸化アルミニウムからなる群より選ばれる1種又は2種以上を含んでよい。これによって、複合体の熱伝導性を一層向上することができる。また、半硬化物が完全に硬化した硬化物(Cステージ)を含んでいてもよい。硬化物と半硬化物を、樹脂と総称する場合もある。 The complex may further contain other components in addition to the nitride sintered body and the semi-cured product of the thermosetting resin composition filled in the pores thereof. Examples of other components include a curing agent, an inorganic filler, a silane coupling agent, a defoaming agent, a surface conditioner, a wet dispersant and the like. The inorganic filler may contain one or more selected from the group consisting of aluminum oxide, silicon oxide, zinc oxide, silicon nitride, aluminum nitride and aluminum hydroxide. Thereby, the thermal conductivity of the complex can be further improved. Further, the semi-cured product may contain a completely cured product (C stage). The cured product and the semi-cured product may be collectively referred to as a resin.
 複合体は、窒化物焼結体と同様に、図1に示すようなシート状(薄板形状)であってよい。シート状の複合体10は、厚みが小さいため、電子デバイス等の放熱部材として好適に用いることができる。また、樹脂組成物が十分に含浸されている。 The composite may be in the form of a sheet (thin plate shape) as shown in FIG. 1, similarly to the nitride sintered body. Since the sheet-shaped complex 10 has a small thickness, it can be suitably used as a heat radiating member for electronic devices and the like. Moreover, the resin composition is sufficiently impregnated.
 複合体10は、上述の窒化物焼結体と熱硬化性樹脂組成物の半硬化物とを含む。この複合体10を対向する一対の部材間に挟んで押圧して接合すると、複合体10は所定の厚み変化率で変形する。変形すると複合体に含浸されていた樹脂成分が染み出す。染み出した樹脂成分の作用によって、複合体10を他部材に強固に接着することができる。したがって、この複合体10は、他部材との接着性に優れる。したがって、複合体10は十分に高い信頼性を有する。このような複合体10は、放熱部材として好適に用いることができる。放熱部材の形状は、図1に示す複合体10と同じ形状であってよく、異なっていてもよい。 The composite 10 contains the above-mentioned nitride sintered body and a semi-cured product of a thermosetting resin composition. When the complex 10 is sandwiched between a pair of opposing members and pressed to join, the complex 10 is deformed at a predetermined thickness change rate. When deformed, the resin component impregnated in the complex exudes. The complex 10 can be firmly adhered to other members by the action of the exuded resin component. Therefore, the complex 10 is excellent in adhesiveness to other members. Therefore, the complex 10 has sufficiently high reliability. Such a complex 10 can be suitably used as a heat radiating member. The shape of the heat radiating member may be the same as that of the complex 10 shown in FIG. 1, or may be different.
 窒化物焼結体として窒化ホウ素焼結体を備える複合体及び放熱部材の製造方法の例を以下に説明する。なお、以下の製造方法には、上述の窒化ホウ素焼結体、複合体及び放熱部材の説明内容が適用される。 An example of a method for manufacturing a complex and a heat radiating member including a boron nitride sintered body as a nitride sintered body will be described below. The above description of the boron nitride sintered body, the complex, and the heat radiating member is applied to the following manufacturing method.
<窒化ホウ素焼結体の製造方法>
 本例の製造方法は、窒化ホウ素粉末を焼結して、ブロック状の窒化ホウ素焼結体を得る焼結工程を有する。原料粉末としては、例えば、平均粒径が0.5~10μmであるアモルファス窒化ホウ素粉末、及び、平均粒径が3.0~40μmである六方晶窒化ホウ素粉末が挙げられる。これらの粉末を、ヘンシェルミキサー等を用いて混合してもよいし、ディスパライザーを用いて水又はエタノール溶液中、スラリー状にして混合してもよい。このような窒化ホウ素粉末を含むスラリーを、噴霧乾燥機等で球状化処理し、成形した後に焼結して、窒化ホウ素焼結体を得てもよい。成形には、金型を用いてもよく、冷間等方加圧(cold isostatic pressing:CIP)法を用いてもよい。
<Manufacturing method of boron nitride sintered body>
The production method of this example includes a sintering step of sintering boron nitride powder to obtain a block-shaped boron nitride sintered body. Examples of the raw material powder include amorphous boron nitride powder having an average particle size of 0.5 to 10 μm and hexagonal boron nitride powder having an average particle size of 3.0 to 40 μm. These powders may be mixed using a Henschel mixer or the like, or may be mixed in a slurry form in water or an ethanol solution using a disparizer. A slurry containing such boron nitride powder may be spheroidized by a spray dryer or the like, molded, and then sintered to obtain a boron nitride sintered body. A mold may be used for molding, or a cold isotropic pressing (CIP) method may be used.
 上述のそれぞれの窒化ホウ素粉末の平均粒径は、レーザー回折光散乱法による粒度分布測定における、累積粒度分布の累積値50%の粒径である。粒度分布測定機としては、例えば「MT3300EX」(日機装社製)が挙げられる。測定に際し、溶媒には水、分散剤としてはヘキサメタリン酸を用い、前処理として、30秒間、ホモジナイザーを用いて20Wの出力をかけて分散処理させる。水の屈折率には1.33、窒化ホウ素粉末の屈折率については1.80を用いる。一回当たりの測定時間は30秒間である。 The average particle size of each of the above-mentioned boron nitride powders is a particle size of 50% of the cumulative value of the cumulative particle size distribution in the particle size distribution measurement by the laser diffraction light scattering method. Examples of the particle size distribution measuring machine include "MT3300EX" (manufactured by Nikkiso Co., Ltd.). At the time of measurement, water is used as a solvent, hexametaphosphate is used as a dispersant, and as a pretreatment, a homogenizer is used for 30 seconds to carry out a dispersion treatment with an output of 20 W. 1.33 is used for the refractive index of water, and 1.80 is used for the refractive index of the boron nitride powder. The measurement time per measurement is 30 seconds.
 窒化ホウ素粉末の焼結の際には、焼結助剤を用いてもよい。焼結助剤は、例えば、酸化イットリア、酸化アルミナ及び酸化マグネシウム等の希土類元素の酸化物、炭酸リチウム及び炭酸ナトリウム等のアルカリ金属の炭酸塩、並びにホウ酸等であってよい。焼結助剤を配合する場合、焼結助剤の添加量は、例えば、窒化ホウ素粉末及び焼結助剤の合計100質量部に対して、例えば、1.5~25質量部であってよく、3.0~22質量部であってもよい。焼結助剤の添加量を上記範囲内とすることで、高い気孔率を有し、上述の厚み変化率を有する窒化ホウ素焼結体を円滑に得ることができる。 When sintering the boron nitride powder, a sintering aid may be used. The sintering aid may be, for example, an oxide of a rare earth element such as itria oxide, alumina oxide and magnesium oxide, a carbonate of an alkali metal such as lithium carbonate and sodium carbonate, and boric acid. When the sintering aid is blended, the amount of the sintering aid added may be, for example, 1.5 to 25 parts by mass with respect to 100 parts by mass of the total of the boron nitride powder and the sintering aid. , 3.0 to 22 parts by mass. By setting the amount of the sintering aid added within the above range, a boron nitride sintered body having a high porosity and the above-mentioned thickness change rate can be smoothly obtained.
 焼結工程の焼結温度は、例えば、1600℃以上であってよく、1700℃以上であってもよい。焼結温度は、例えば、2200℃以下であってよく、2100℃以下であってよく、2000℃以下であってもよい。焼結時間は、例えば、1時間以上であってよく、30時間以下であってもよい。焼結時の雰囲気は、例えば、窒素、ヘリウム、及びアルゴン等の不活性ガス雰囲気下であってよい。 The sintering temperature in the sintering step may be, for example, 1600 ° C. or higher, or 1700 ° C. or higher. The sintering temperature may be, for example, 2200 ° C. or lower, 2100 ° C. or lower, or 2000 ° C. or lower. The sintering time may be, for example, 1 hour or more, or 30 hours or less. The atmosphere at the time of sintering may be, for example, an atmosphere of an inert gas such as nitrogen, helium, and argon.
 焼結には、例えば、バッチ式炉及び連続式炉等を用いることができる。バッチ式炉としては、例えば、高周波炉、マッフル炉、管状炉、及び雰囲気炉等を挙げることができる。連続式炉としては、例えば、ロータリーキルン、スクリューコンベア炉、トンネル炉、ベルト炉、プッシャー炉、及び琴形連続炉等を挙げることができる。このようにして、ブロック状の窒化ホウ素焼結体を得ることができる。 For sintering, for example, a batch type furnace, a continuous type furnace, or the like can be used. Examples of the batch type furnace include a high frequency furnace, a muffle furnace, a tube furnace, an atmosphere furnace, and the like. Examples of the continuous furnace include a rotary kiln, a screw conveyor furnace, a tunnel furnace, a belt furnace, a pusher furnace, a koto-shaped continuous furnace, and the like. In this way, a block-shaped boron nitride sintered body can be obtained.
<複合体の製造方法>
 本例の複合体の製造方法は、ブロック状(例えば、厚みが2mm超のバルク体である。)の窒化ホウ素焼結体に樹脂組成物を含浸させる含浸工程と切断工程とを有する。熱硬化性樹脂組成物は、流動性及び取り扱い性向上の観点から、主剤、硬化剤及び溶剤を含有してもよい。また、これらの他に、無機フィラー、シランカップリング剤、消泡剤、表面調整剤、湿潤分散剤等を含有してもよい。
<Manufacturing method of complex>
The method for producing the complex of this example includes an impregnation step and a cutting step of impregnating a block-shaped (for example, a bulk body having a thickness of more than 2 mm) boron nitride sintered body with a resin composition. The thermosetting resin composition may contain a main agent, a curing agent and a solvent from the viewpoint of improving fluidity and handleability. In addition to these, an inorganic filler, a silane coupling agent, a defoaming agent, a surface conditioner, a wet dispersant and the like may be contained.
 熱硬化性樹脂組成物としては、半硬化反応によって上述の複合体の説明で挙げた半硬化物となるものを用いることができる。溶剤としては、例えば、エタノール、イソプロパノール等の脂肪族アルコール、2-メトキシエタノール、1-メトキシエタノール、2-エトキシエタノール、1-エトキシ-2-プロパノール、2-ブトキシエタノール、2-(2-メトキシエトキシ)エタノール、2-(2-エトキシエトキシ)エタノール、2-(2-ブトキシエトキシ)エタノール等のエーテルアルコール、エチレングリコールモノメチルエーテル、エチレングリコールモノブチルエーテル等のグリコールエーテル、アセトン、メチルエチルケトン、メチルイソブチルケトン、ジイソブチルケトン等のケトン、トルエン、キシレン等の炭化水素が挙げられる。これらのうちの1種を単独で含んでもよいし、2種以上を組み合わせて含んでもよい。 As the thermosetting resin composition, one that becomes the semi-cured product mentioned in the above description of the complex by the semi-curing reaction can be used. Examples of the solvent include aliphatic alcohols such as ethanol and isopropanol, 2-methoxyethanol, 1-methoxyethanol, 2-ethoxyethanol, 1-ethoxy-2-propanol, 2-butoxyethanol and 2- (2-methoxyethoxy). ) Ether alcohols such as ethanol, 2- (2-ethoxyethoxy) ethanol, 2- (2-butoxyethoxy) ethanol, glycol ethers such as ethylene glycol monomethyl ether and ethylene glycol monobutyl ether, acetone, methyl ethyl ketone, methyl isobutyl ketone, diisobutyl Examples thereof include ketones such as ketones and hydrocarbons such as toluene and xylene. One of these may be contained alone, or two or more thereof may be contained in combination.
 含浸は、窒化ホウ素焼結体に熱硬化性樹脂組成物を付着させて行う。例えば、窒化ホウ素焼結体を熱硬化性樹脂組成物に浸漬して行ってよい。浸漬した状態で、大気圧、又は加圧、減圧条件として行ってもよい。また例えば、厚みが2mm以下のシート状である窒化ホウ素焼結体の場合、窒化ホウ素焼結体に熱硬化性樹脂組成物を塗布して含浸させることもできる。このようにして、窒化ホウ素焼結体の気孔に樹脂を充填することができる。 Impregnation is performed by adhering a thermosetting resin composition to a boron nitride sintered body. For example, the boron nitride sintered body may be immersed in a thermosetting resin composition. It may be carried out under atmospheric pressure, pressurization, or depressurization conditions in the immersed state. Further, for example, in the case of a sheet-like boron nitride sintered body having a thickness of 2 mm or less, a thermosetting resin composition can be applied to the boron nitride sintered body to impregnate it. In this way, the pores of the boron nitride sintered body can be filled with the resin.
 含浸工程は、密閉容器を備える含浸装置内を用いて行ってもよい。一例として、含浸装置内で減圧条件にて含浸を行った後、含浸装置内の圧力を上げて大気圧よりも高くして加圧条件で含浸を行ってもよい。このように減圧条件と加圧条件の両方を行うことによって、窒化ホウ素焼結体の気孔に熱硬化性樹脂を十分に充填することができる。減圧条件と加圧条件とを複数回繰り返し行ってもよい。含浸工程は、加温しながら行ってもよい。窒化ホウ素焼結体の気孔に含浸した熱硬化性樹脂組成物は、半硬化が進行したり、溶剤が揮発したりした後、半硬化物となる。このようにして、窒化ホウ素焼結体とその気孔に充填された半硬化物とを有する複合体が得られる。気孔の全てに半硬化物が充填されている必要はなく、一部の気孔には半硬化物が充填されていなくてもよい。窒化ホウ素焼結体及び複合体は、閉気孔と開気孔の両方を含んでいてよい。 The impregnation step may be performed in an impregnation device provided with a closed container. As an example, after impregnating in the impregnating device under reduced pressure conditions, the pressure in the impregnating device may be increased to be higher than the atmospheric pressure and impregnated under pressurized conditions. By performing both the reduced pressure condition and the pressurized condition in this way, the pores of the boron nitride sintered body can be sufficiently filled with the thermosetting resin. The depressurization condition and the pressurization condition may be repeated a plurality of times. The impregnation step may be performed while heating. The thermosetting resin composition impregnated in the pores of the boron nitride sintered body becomes a semi-cured product after semi-curing proceeds or the solvent volatilizes. In this way, a composite having a boron nitride sintered body and a semi-cured product filled in its pores is obtained. It is not necessary that all the pores are filled with the semi-cured product, and some of the pores may not be filled with the semi-cured product. Boron nitride sintered bodies and complexes may contain both closed and open pores.
 含浸工程の後に、気孔内に充填された熱硬化性樹脂組成物を硬化させる硬化工程を有していてもよい。硬化工程では、例えば、含浸装置から熱硬化性樹脂が充填された複合体を取り出し、樹脂組成物(又は必要に応じて添加される硬化剤)の種類に応じて、加熱、及び/又は光照射により、樹脂を半硬化させる。 After the impregnation step, there may be a curing step of curing the thermosetting resin composition filled in the pores. In the curing step, for example, the composite filled with the thermosetting resin is taken out from the impregnation device, heated and / or irradiated with light depending on the type of the resin composition (or the curing agent added as needed). Semi-cures the resin.
 含浸工程は、減圧条件下での含浸と、加圧条件下での含浸とを組み合わせて行ってもよい。減圧条件下で含浸工程を実施する場合における含浸装置内の圧力は、例えば、1000Pa以下、500Pa以下、100Pa以下、50Pa以下、又は30Pa以下であってよい。加圧条件下で含浸工程を実施する場合における含浸装置内の圧力は、例えば、1MPa以上、3MPa以上、10MPa以上、又は30MPa以上であってよい。 The impregnation step may be performed by combining impregnation under reduced pressure conditions and impregnation under pressurized conditions. The pressure in the impregnation device when the impregnation step is carried out under reduced pressure conditions may be, for example, 1000 Pa or less, 500 Pa or less, 100 Pa or less, 50 Pa or less, or 30 Pa or less. When the impregnation step is performed under pressurized conditions, the pressure in the impregnation device may be, for example, 1 MPa or more, 3 MPa or more, 10 MPa or more, or 30 MPa or more.
 含浸工程において、熱硬化性樹脂組成物を含む溶液を加熱してもよい。上記溶液を下記の温度範囲で加熱することによって、溶液の粘度が調整され熱硬化性樹脂組成物の含浸を促進することができる。含浸させる際の熱硬化性樹脂組成物を含む溶液の粘度は、例えば、500mPa・s以下であってよい。このような粘度を有する溶液を用いることによって、熱硬化性樹脂組成物を窒化ホウ素焼結体に十分に含浸させることができる。 In the impregnation step, the solution containing the thermosetting resin composition may be heated. By heating the solution in the following temperature range, the viscosity of the solution can be adjusted and the impregnation of the thermosetting resin composition can be promoted. The viscosity of the solution containing the thermosetting resin composition at the time of impregnation may be, for example, 500 mPa · s or less. By using a solution having such a viscosity, the thermosetting resin composition can be sufficiently impregnated into the boron nitride sintered body.
 含浸工程では、熱硬化性樹脂組成物を含む溶液に窒化物焼結体を浸漬した状態で所定の時間保持する。当該所定の時間は、例えば、5時間以上であってよく、10時間以上であってもよい。 In the impregnation step, the nitride sintered body is kept immersed in a solution containing a thermosetting resin composition for a predetermined time. The predetermined time may be, for example, 5 hours or more, or 10 hours or more.
 含浸工程の後に、気孔内に充填された熱硬化性樹脂組成物を半硬化させる硬化工程を有する。硬化工程では、例えば、含浸装置から熱硬化性樹脂組成物が充填された複合体を取り出し、熱硬化性樹脂組成物(又は必要に応じて添加される硬化剤)の種類に応じて、加熱、及び/又は光照射により、熱硬化性樹脂組成物を半硬化させる。「半硬化」(Bステージともいう)とは、その後の硬化処理によって、更に硬化させることができるものをいう。半硬化の状態であることを利用し金属基板等の被着体へ仮圧着して、その後加熱することによって被着体と接着してもよい。半硬化物にさらに硬化処理を施すことで「完全硬化」(Cステージともいう)の状態となり得る。熱硬化性樹脂組成物が半硬化の状態にあるか否かは、例えば、示差走査熱量計によって確認することができる。 After the impregnation step, there is a curing step of semi-curing the thermosetting resin composition filled in the pores. In the curing step, for example, the composite filled with the thermosetting resin composition is taken out from the impregnation device and heated according to the type of the thermosetting resin composition (or the curing agent added as needed). And / or light irradiation causes the thermosetting resin composition to be semi-cured. "Semi-hardening" (also referred to as B stage) means that it can be further hardened by a subsequent hardening treatment. Utilizing the fact that it is in a semi-cured state, it may be temporarily pressure-bonded to an adherend such as a metal substrate and then heated to adhere to the adherend. By further curing the semi-cured product, it can be in a "completely cured" (also referred to as C stage) state. Whether or not the thermosetting resin composition is in a semi-cured state can be confirmed by, for example, a differential scanning calorimeter.
 切断工程では、得られた樹脂含浸体を、例えばワイヤーソーを用いて切断する。ワイヤーソーは、例えば、マルチカットワイヤーソー等であってよい。)で切断して調製することができる。このようにして、シート状の複合体を得ることができる。 In the cutting step, the obtained resin impregnated body is cut using, for example, a wire saw. The wire saw may be, for example, a multi-cut wire saw or the like. ) Can be cut and prepared. In this way, a sheet-like complex can be obtained.
 窒化ホウ素焼結体及び複合体の製造方法の例を説明したが、これらの製造方法は上述の例に限定されない。窒化ホウ素焼結体以外の窒化物焼結体は公知の方法で製造することができる。 Although examples of methods for producing boron nitride sintered bodies and composites have been described, these production methods are not limited to the above examples. Nitride sintered bodies other than the boron nitride sintered body can be produced by a known method.
 以上のとおり、幾つかの実施形態を説明したが、本開示は上記実施形態に何ら限定されるものではない。例えば、焼結工程では、成形と焼結を同時に行うホットプレスによって窒化ホウ素焼結体を得てもよい。 As described above, some embodiments have been described, but the present disclosure is not limited to the above embodiments. For example, in the sintering step, a boron nitride sintered body may be obtained by hot pressing in which molding and sintering are performed at the same time.
 実施例及び比較例を参照して本開示の内容をより詳細に説明するが、本開示は下記の実施例に限定されるものではない。 The contents of the present disclosure will be described in more detail with reference to Examples and Comparative Examples, but the present disclosure is not limited to the following Examples.
(実施例1)
<窒化ホウ素焼結体の作製>
 平均粒径が8.0μmである六方晶窒化ホウ素粉末(酸素含有量0.8質量%、窒化ホウ素純度99.0質量%)が40.0質量%、及び、平均粒径が13.0μmである六方晶窒化ホウ素粉末(酸素含有量:0.3質量%、窒化ホウ素純度:99.0質量%)が60.0質量%となるようにそれぞれ測り取り、これらを配合して原料粉末を調製した。
(Example 1)
<Preparation of Boron Nitride Sintered Body>
Hexagonal boron nitride powder (oxygen content 0.8% by mass, boron nitride purity 99.0% by mass) having an average particle size of 8.0 μm is 40.0% by mass, and the average particle size is 13.0 μm. A certain hexagonal boron nitride powder (oxygen content: 0.3% by mass, boron nitride purity: 99.0% by mass) is measured so as to be 60.0% by mass, and these are mixed to prepare a raw material powder. bottom.
 粉末状のホウ酸と炭酸カルシウムを配合して焼結助剤を調製した。調製にあたっては、100質量部のホウ酸に対して、炭酸カルシウムを60質量部配合した。原料粉末100質量部に対して焼結助剤を14質量部、バインダ(ポリビニルアルコール(「ゴーセノール」、日本合成化学工業株式会社製))を10質量部配合した。得られた配合物を溶解するまで50℃で加熱撹拌した後、噴霧乾燥機にて乾燥温度230℃で球状化処理を行った。このようにして、球状化処理された混合粉末を調製した。なお、噴霧乾燥機の球状化装置としては、回転式アトマイザーを使用した。 A sintering aid was prepared by blending powdered boric acid and calcium carbonate. In the preparation, 60 parts by mass of calcium carbonate was added to 100 parts by mass of boric acid. 14 parts by mass of a sintering aid and 10 parts by mass of a binder (polyvinyl alcohol (“Gosenol”, manufactured by Nippon Synthetic Chemical Industry Co., Ltd.)) were blended with respect to 100 parts by mass of the raw material powder. The obtained compound was heated and stirred at 50 ° C. until it was dissolved, and then spheroidized at a drying temperature of 230 ° C. using a spray dryer. In this way, a spheroidized mixed powder was prepared. A rotary atomizer was used as the spheroidizing device of the spray dryer.
 上記混合粉末を、冷間等方加圧(CIP)装置(株式会社神戸製鋼所製、商品名:ADW800)に充填し、30MPaの圧力で圧縮し成形体を作製した。作製した成形体を、バッチ式高周波炉(富士電波工業株式会社製、商品名:FTH-300-1H)を用いて2000℃で10時間保持して焼結した。これによって、ブロック状の窒化物焼結体を得た。なお、焼成は、炉内に窒素を標準状態で流量が10L/分となるように流しながら、炉内を窒素雰囲気下に調整して行った。 The above mixed powder was filled in a cold isotropic pressure (CIP) device (manufactured by Kobe Steel, Ltd., trade name: ADW800) and compressed at a pressure of 30 MPa to prepare a molded product. The produced molded product was sintered by holding it at 2000 ° C. for 10 hours using a batch type high frequency furnace (manufactured by Fuji Dempa Kogyo Co., Ltd., trade name: FTH-300-1H). As a result, a block-shaped nitride sintered body was obtained. The firing was carried out by adjusting the inside of the furnace under a nitrogen atmosphere while flowing nitrogen into the furnace in a standard state so that the flow rate was 10 L / min.
<熱伝導率の測定>
 窒化ホウ素焼結体の厚さ方向の熱伝導率(H)を、以下の計算式(4)で求めた。
   H=A×B×C   (4)
<Measurement of thermal conductivity>
The thermal conductivity (H) of the boron nitride sintered body in the thickness direction was calculated by the following formula (4).
H = A × B × C (4)
 式(4)中、Hは熱伝導率(W/(m・K))、Aは熱拡散率(m/sec)、Bはかさ密度(kg/m)、及び、Cは比熱容量(J/(kg・K))を示す。熱拡散率Aは、窒化ホウ素焼結体を、縦×横×厚み=10mm×10mm×5mmのサイズに加工した試料を用い、レーザーフラッシュ法によって測定した。測定装置はキセノンフラッシュアナライザ(NETZSCH社製、商品名:LFA447NanoFlash)を用いた。 In formula (4), H is the thermal conductivity (W / (m · K)), A is the thermal diffusivity (m 2 / sec), B is the bulk density (kg / m 3 ), and C is the specific heat capacity. (J / (kg · K)) is shown. The thermal diffusivity A was measured by a laser flash method using a sample obtained by processing a boron nitride sintered body into a size of length × width × thickness = 10 mm × 10 mm × 5 mm. A xenon flash analyzer (manufactured by NETZSCH, trade name: LFA447NanoFlash) was used as the measuring device.
 かさ密度Bは窒化ホウ素焼結体の体積及び質量から算出した。比熱容量Cは、示差走査熱量計(株式会社リガク製、装置名:ThermoPlusEvo DSC8230)を用いて測定した。熱伝導率H及びかさ密度Bの結果を表1に示す。 The bulk density B was calculated from the volume and mass of the boron nitride sintered body. The specific heat capacity C was measured using a differential scanning calorimeter (manufactured by Rigaku Co., Ltd., device name: ThermoPlusEvo DSC8230). The results of thermal conductivity H and bulk density B are shown in Table 1.
<気孔率の測定>
 得られた窒化ホウ素焼結体の体積及び質量を測定し、当該体積及び質量からかさ密度B(kg/m)を算出した。このかさ密度と窒化ホウ素の理論密度(2280kg/m)とから、以下の計算式(5)によって気孔率を求めた。結果は表1に示すとおりであった。
  気孔率(体積%)=[1-(D/2280)]×100   (5)
<Measurement of porosity>
The volume and mass of the obtained boron nitride sintered body were measured, and the bulk density B (kg / m 3 ) was calculated from the volume and mass. From this bulk density and the theoretical density of boron nitride (2280 kg / m 3 ), the porosity was calculated by the following formula (5). The results are as shown in Table 1.
Porosity (% by volume) = [1- (D / 2280)] x 100 (5)
<配向性指数の測定>
 X線回折装置(株式会社リガク製、商品名:ULTIMA-IV)を用いて、窒化ホウ素焼結体の配向性指数[I(002)/I(100)]を求めた。X線回折装置の試料ホルダーにセットした測定試料(窒化ホウ素焼結体)にX線を照射して、ベースライン補正を行った。その後、窒化ホウ素の(002)面と(100)面のピーク強度比を算出した。これを配向性指数[I(002)/I(100)]とした。結果は、表1に示すとおりであった。
<Measurement of orientation index>
The orientation index [I (002) / I (100)] of the boron nitride sintered body was determined using an X-ray diffractometer (manufactured by Rigaku Co., Ltd., trade name: ULTIMA-IV). The measurement sample (boron nitride sintered body) set in the sample holder of the X-ray diffractometer was irradiated with X-rays to perform baseline correction. Then, the peak intensity ratio of the (002) plane and the (100) plane of boron nitride was calculated. This was defined as the orientation index [I (002) / I (100)]. The results are as shown in Table 1.
<複合体の作製>
 圧力が0.03kPaに制御された含浸装置内において、エポキシ樹脂(三菱ケミカル株式会社製、商品名:エピコート807)と硬化剤(日本合成化学工業株式会社製、商品名:アクメックスH-84B)を含む熱硬化性樹脂組成物中に、窒化ホウ素焼結体を浸漬し、窒化ホウ素焼結体に熱硬化性樹脂組成物を含浸させた。含浸後、大気圧下、温度150℃で60分間加熱して熱硬化性樹脂組成物を半硬化させ、室温(25℃)になるまで冷却し複合体を作製した。複合体の表面部分を構成する半硬化物層を切断して除去し、その後、マルチカットワイヤーソーで複合体を切断して厚さ0.4mmの複合体シートを得た。複合体シートにおける樹脂(半硬化物)の充填率は、表2に示すとおり94.0体積%であった。この含有量は、以下の手順で求めた。
<Preparation of complex>
Epoxy resin (manufactured by Mitsubishi Chemical Co., Ltd., trade name: Epicoat 807) and curing agent (manufactured by Nippon Synthetic Chemical Industry Co., Ltd., trade name: Acmex H-84B) in an impregnation device whose pressure is controlled to 0.03 kPa. The boron nitride sintered body was immersed in the thermosetting resin composition containing the above, and the boron nitride sintered body was impregnated with the thermosetting resin composition. After impregnation, the thermosetting resin composition was semi-cured by heating at a temperature of 150 ° C. for 60 minutes under atmospheric pressure, and cooled to room temperature (25 ° C.) to prepare a complex. The semi-cured product layer constituting the surface portion of the complex was cut and removed, and then the complex was cut with a multi-cut wire saw to obtain a complex sheet having a thickness of 0.4 mm. The filling rate of the resin (semi-cured product) in the complex sheet was 94.0% by volume as shown in Table 2. This content was determined by the following procedure.
<樹脂(半硬化物)の充填率>
 複合体における樹脂の充填率は、複合体を作製する前と後のかさ密度と理論密度から下記式(6)によって求めた。
<Plastic (semi-cured) filling rate>
The filling rate of the resin in the complex was determined by the following formula (6) from the bulk density and the theoretical density before and after the complex was produced.
 複合体における樹脂の充填率(体積%)=((複合体のかさ密度-窒化ホウ素焼結体のかさ密度)/(複合体の理論密度-窒化ホウ素焼結体のかさ密度))×100 ・・・(6) Resin filling rate in the composite (volume%) = ((composite bulk density-boron nitride sintered bulk density) / (complex theoretical density-boron nitride sintered bulk density)) x 100.・ ・ (6)
 複合体の理論密度は下記式(7)より求めた。
 複合体の理論密度=窒化ホウ素焼結体の真密度+樹脂の真密度×(1-窒化ホウ素焼結体のかさ密度/窒化ホウ素焼結体の真密度) ・・・(7)
The theoretical density of the complex was calculated from the following equation (7).
Theoretical density of composite = true density of boron nitride sintered body + true density of resin x (1-bulk density of boron nitride sintered body / true density of boron nitride sintered body) ... (7)
 窒化ホウ素焼結体(複合体)のかさ密度は、JIS Z 8807:2012の幾何学的測定による密度及び比重の測定方法に準拠し、シート状(直方体)の窒化ホウ素焼結体(複合体)の各辺の長さ(ノギスにより測定)から計算した体積と、電子天秤により測定した質量から求めた(JIS Z 8807:2012の9項参照)。窒化ホウ素焼結体及び樹脂の真密度は、JIS Z 8807:2012の気体置換法による密度及び比重の測定方法に準拠し、乾式自動密度計を用いて測定した窒化ホウ素焼結体及び樹脂の体積と質量から求めた(JIS Z 8807:2012の11項の式(14)~(17)参照) The bulk density of the boron nitride sintered body (composite) conforms to the measurement method of density and specific gravity by geometric measurement of JIS Z 8807: 2012, and is a sheet-shaped (rectangular) boron nitride sintered body (composite). It was obtained from the volume calculated from the length of each side (measured by a caliper) and the mass measured by an electronic balance (see item 9 of JIS Z 8807: 2012). The true density of the boron nitride sintered body and the resin conforms to the method of measuring the density and specific gravity by the gas substitution method of JIS Z 8807: 2012, and the volume of the boron nitride sintered body and the resin measured using a dry automatic densitometer. (Refer to equations (14) to (17) in paragraph 11 of JIS Z 8807: 2012).
<樹脂(半硬化物)の含有量>
 複合体シートにおける樹脂の含有量は、表2に示すとおりであった。この樹脂の含有量(質量%)は、複合体全体に対する半硬化物の質量比率である。半硬化物の含有量は、窒化ホウ素焼結体と複合体の質量差から半硬化物の質量を算出し、この半硬化物の質量を複合体の質量で除することによって算出した。
<Content of resin (semi-cured product)>
The resin content in the complex sheet is as shown in Table 2. The content (% by mass) of this resin is the mass ratio of the semi-cured product to the entire complex. The content of the semi-cured product was calculated by calculating the mass of the semi-cured product from the mass difference between the boron nitride sintered body and the composite, and dividing the mass of the semi-cured product by the mass of the composite.
<複合体の気孔率>
 上述のとおり求めた窒化ホウ素焼結体の気孔率と、複合体における樹脂の充填率とから、以下の式(8)によって複合体の気孔率を算出した。結果は表2に示すとおりであった。
  複合体の気孔率(体積%)=窒化ホウ素焼結体の気孔率(体積%)-(窒化ホウ素焼結体の気孔率(体積%)×樹脂の充填率(体積%)×100) ・・・(8)
<Porosity of complex>
From the porosity of the boron nitride sintered body obtained as described above and the filling rate of the resin in the composite, the porosity of the composite was calculated by the following formula (8). The results are shown in Table 2.
Porosity of composite (volume%) = Porosity of boron nitride sintered body (volume%)-(Porosity of boron nitride sintered body (volume%) x resin filling rate (volume%) x 100) ...・ (8)
<厚み変化率>
 株式会社島津製作所製の精密万能試験機(商品名:オートグラフAG-X)を用いて、200℃における厚み変化率を測定した。複合体シートを加工して四角柱形状(縦×横×厚み=10mm×10mm×4mm)の測定用試料を作製した。上述の測定装置を用いて、圧縮速度1mm/min、ロードセル100kN(加圧圧力:5MPa)、200℃の条件で測定を行った。上記式(1)で厚み変化率を求めた。結果は表2に示すとおりであった。
<Thickness change rate>
The thickness change rate at 200 ° C. was measured using a precision universal testing machine (trade name: Autograph AG-X) manufactured by Shimadzu Corporation. The complex sheet was processed to prepare a measurement sample having a square pillar shape (length x width x thickness = 10 mm x 10 mm x 4 mm). The measurement was performed using the above-mentioned measuring device under the conditions of a compression rate of 1 mm / min, a load cell of 100 kN (pressurizing pressure: 5 MPa), and 200 ° C. The thickness change rate was calculated by the above formula (1). The results are shown in Table 2.
<接着性の評価>
 シート状の銅箔(縦×横×厚み=100mm×20mm×0.035mm)と、平板状の銅板(縦×横×厚み=100mm×20mm×1mm)との間に、上述のシート状の複合体シート(縦×横×厚み=40mm×20mm×0.4mm)を配置した。このようにして、銅箔、複合体及び銅板をこの順に備える積層体を得た。当該積層体を200℃及び5MPaの条件下で5分間加熱及び加圧した後、200℃及び大気圧の条件下で2時間加熱処理した。
<Evaluation of adhesiveness>
The above-mentioned sheet-like composite between a sheet-shaped copper foil (length x width x thickness = 100 mm x 20 mm x 0.035 mm) and a flat plate-shaped copper plate (length x width x thickness = 100 mm x 20 mm x 1 mm). A body sheet (length x width x thickness = 40 mm x 20 mm x 0.4 mm) was arranged. In this way, a laminate having a copper foil, a composite, and a copper plate in this order was obtained. The laminate was heated and pressurized under the conditions of 200 ° C. and 5 MPa for 5 minutes, and then heat-treated under the conditions of 200 ° C. and atmospheric pressure for 2 hours.
 上述の処理を施したのち、JIS K 6854-1:1999「接着剤-はく離接着強さ試験方法」に準拠して、複合体から銅箔を剥離する90°はく離試験を行った。この試験では、20℃における複合体のピール強度を、万能試験機(株式会社エーアンドディ製、商品名:RTG-1310)を用いて求めた。試験速度:50mm/min、ロードセル:5kN、測定温度:室温(20℃)の条件で測定を行って、凝集破壊部分の面積を測定した。測定結果から、以下の基準で接着性を評価した。結果を表2に示す。なお、凝集破壊部分とは、銅箔に接着していた複合体の接着面のうち、複合体が破壊した部分の面積である。
  A:接着面全体に対する凝集破壊部分の面積比率が80%以上
  B:接着面全体に対する凝集破壊部分の面積比率が70%以上80%未満
  C:接着面全体に対する凝集破壊部分の面積比率が20%以上70%未満
After the above treatment, a 90 ° peeling test was performed to peel the copper foil from the composite in accordance with JIS K 6854-1: 1999 “Adhesive-Peeling Adhesive Strength Test Method”. In this test, the peel strength of the complex at 20 ° C. was determined using a universal testing machine (manufactured by A & D Co., Ltd., trade name: RTG-1310). The measurement was carried out under the conditions of a test speed: 50 mm / min, a load cell: 5 kN, and a measurement temperature: room temperature (20 ° C.), and the area of the agglomerated fracture portion was measured. From the measurement results, the adhesiveness was evaluated according to the following criteria. The results are shown in Table 2. The cohesive fracture portion is the area of the portion of the adhesive surface of the composite that has been adhered to the copper foil and that the composite has broken.
A: Area ratio of agglomerated fractured portion to the entire adhesive surface is 80% or more B: Area ratio of agglomerated fractured portion to the entire adhesive surface is 70% or more and less than 80% C: Area ratio of agglomerated fractured portion to the entire adhesive surface is 20% More than 70%
(実施例2)
 成形体を作製する際に、冷間等方加圧(CIP)装置にて35MPaの圧力で混合粉末を圧縮して成形体を得たこと以外は、実施例1と同じ手順で、窒化ホウ素焼結体及び複合体を作製した。窒化ホウ素焼結体及び複合体の各測定を、実施例1と同様にして行った。結果は表1及び表2に示すとおりであった。
(Example 2)
Boron nitride firing was performed in the same procedure as in Example 1 except that when the molded product was produced, the mixed powder was compressed at a pressure of 35 MPa with a cold isotropic pressure (CIP) device to obtain the molded product. Bounds and complexes were made. Each measurement of the boron nitride sintered body and the composite was carried out in the same manner as in Example 1. The results are as shown in Tables 1 and 2.
(実施例3)
 成形体を作製する際に、冷間等方加圧(CIP)装置にて90MPaの圧力で圧縮し成形体を得たこと以外は、実施例1と同じ手順で、窒化ホウ素焼結体及び複合体を作製した。窒化ホウ素焼結体及び複合体の各測定を、実施例1と同様にして行った。結果は表1及び表2に示すとおりであった。
(Example 3)
Boron nitride sintered body and composite were obtained by the same procedure as in Example 1 except that the molded product was obtained by compressing it with a cold isotropic pressure (CIP) device at a pressure of 90 MPa when producing the molded product. The body was made. Each measurement of the boron nitride sintered body and the composite was carried out in the same manner as in Example 1. The results are as shown in Tables 1 and 2.
(実施例4)
 成形体を作製する際に、冷間等方加圧(CIP)装置にて10MPaの圧力で圧縮し成形体を得たこと以外は、実施例1と同じ手順で、窒化ホウ素焼結体及び複合体を作製した。窒化ホウ素焼結体及び複合体の各測定を、実施例1と同様にして行った。結果は表1及び表2に示すとおりであった。
(Example 4)
Boron nitride sintered body and composite were obtained by the same procedure as in Example 1 except that the molded product was obtained by compressing it with a cold isotropic pressure (CIP) device at a pressure of 10 MPa when producing the molded product. The body was made. Each measurement of the boron nitride sintered body and the composite was carried out in the same manner as in Example 1. The results are as shown in Tables 1 and 2.
(実施例5)
 平均粒径が0.8μmであるアモルファス窒化ホウ素粉末(酸素含有量:1.8質量%、窒化ホウ素純度:97.2質量%)が40.0質量%、及び、平均粒径が13.0μmである六方晶窒化ホウ素粉末(酸素含有量:0.3質量%、窒化ホウ素純度:99.0質量%)が60.0質量%となるようにそれぞれ測り取り、配合して原料粉末を調製した。この原料粉末を用いたこと以外は、実施例1と同じ手順で、窒化ホウ素焼結体及び複合体を作製した。窒化ホウ素焼結体及び複合体の各測定を、実施例1と同様にして行った。結果は表1及び表2に示すとおりであった。
(Example 5)
Amorphous boron nitride powder (oxygen content: 1.8% by mass, boron nitride purity: 97.2% by mass) having an average particle size of 0.8 μm is 40.0% by mass, and an average particle size is 13.0 μm. Hexagonal boron nitride powder (oxygen content: 0.3% by mass, boron nitride purity: 99.0% by mass) was measured so as to be 60.0% by mass, and blended to prepare a raw material powder. .. A boron nitride sintered body and a complex were prepared in the same procedure as in Example 1 except that this raw material powder was used. Each measurement of the boron nitride sintered body and the composite was carried out in the same manner as in Example 1. The results are as shown in Tables 1 and 2.
(実施例6)
 成形体の作製方法を、冷間等方加圧(CIP)から金型成形(成形圧力:50MPa)に変更したこと以外は、実施例1と同じ手順で、窒化ホウ素焼結体及び複合体を作製した。窒化ホウ素焼結体及び複合体の各測定を、実施例1と同様にして行った。結果は表1及び表2に示すとおりであった。
(Example 6)
The boron nitride sintered body and the composite were prepared in the same procedure as in Example 1 except that the method for producing the molded product was changed from cold isotropic pressure (CIP) to mold molding (molding pressure: 50 MPa). Made. Each measurement of the boron nitride sintered body and the composite was carried out in the same manner as in Example 1. The results are as shown in Tables 1 and 2.
(実施例7)
 成形体の作製方法を、冷間等方加圧(CIP)から金型成形(成形圧力:15MPa)に変更したこと以外は、実施例1と同じ手順で、窒化ホウ素焼結体及び複合体を作製した。窒化ホウ素焼結体及び複合体の各測定を、実施例1と同様にして行った。結果は表1及び表2に示すとおりであった。
(Example 7)
The boron nitride sintered body and the composite were prepared in the same procedure as in Example 1 except that the method for producing the molded product was changed from cold isotropic pressure (CIP) to mold molding (molding pressure: 15 MPa). Made. Each measurement of the boron nitride sintered body and the composite was carried out in the same manner as in Example 1. The results are as shown in Tables 1 and 2.
(実施例8)
 噴霧乾燥機による球状化処理を行わなかったこと、及び、ヘンシェルミキサーを用いて、原料粉末と焼結助剤を撹拌して混合粉末を調製し、これを用いて冷間等方加圧装置で成形体を作製したこと以外は、実施例1と同じ手順で、窒化ホウ素焼結体及び複合体を作製した。窒化ホウ素焼結体及び複合体の各測定を、実施例1と同様にして行った。結果は表1及び表2に示すとおりであった。
(Example 8)
No spheroidizing treatment was performed with a spray dryer, and a mixed powder was prepared by stirring the raw material powder and the sintering aid using a Henschel mixer, which was used in a cold isotropic pressurizer. A boron nitride sintered body and a composite were prepared in the same procedure as in Example 1 except that the molded product was produced. Each measurement of the boron nitride sintered body and the composite was carried out in the same manner as in Example 1. The results are as shown in Tables 1 and 2.
(実施例9)
 冷間等方加圧装置に代えて、金型成形(成形圧力:30MPa)で成形体を作製したこと以外は、実施例8と同じ手順で、窒化ホウ素焼結体及び複合体を作製した。窒化ホウ素焼結体及び複合体の各測定を、実施例1と同様にして行った。結果は表1及び表2に示すとおりであった。
(Example 9)
A boron nitride sintered body and a composite were prepared in the same procedure as in Example 8 except that the molded product was produced by mold molding (molding pressure: 30 MPa) instead of the cold isotropic pressurizing device. Each measurement of the boron nitride sintered body and the composite was carried out in the same manner as in Example 1. The results are as shown in Tables 1 and 2.
(比較例1)
 平均粒径が18.0μmである六方晶窒化ホウ素粉末(酸素含有量:0.3質量%、窒化ホウ素純度:99.1質量%)が40.0質量%、及び、平均粒径が13.0μmである六方晶窒化ホウ素粉末(酸素含有量:0.3質量%、窒化ホウ素純度:99.0質量%)、が60.0質量%となるようにそれぞれ測り取り、これらを配合して原料粉末を調製した。この原料粉末を用いたこと以外は、実施例1と同じ手順で、窒化ホウ素焼結体及び複合体を作製した。窒化ホウ素焼結体及び複合体の各測定を、実施例1と同様にして行った。結果は表1及び表2に示すとおりであった。
(Comparative Example 1)
Hexagonal boron nitride powder (oxygen content: 0.3% by mass, boron nitride purity: 99.1% by mass) having an average particle size of 18.0 μm is 40.0% by mass, and the average particle size is 13. Hexagonal boron nitride powder (oxygen content: 0.3% by mass, boron nitride purity: 99.0% by mass), which is 0 μm, is measured so as to be 60.0% by mass, and these are mixed and used as a raw material. A powder was prepared. A boron nitride sintered body and a complex were prepared in the same procedure as in Example 1 except that this raw material powder was used. Each measurement of the boron nitride sintered body and the composite was carried out in the same manner as in Example 1. The results are as shown in Tables 1 and 2.
(比較例2)
 成形体を作製する際に、冷間等方加圧(CIP)装置にて150MPaの圧力で圧縮し成形体を得たこと以外は、実施例1と同じ手順で、窒化ホウ素焼結体及び複合体を作製した。窒化ホウ素焼結体及び複合体の各測定を、実施例1と同様にして行った。結果は表1及び表2に示すとおりであった。
(Comparative Example 2)
Boron nitride sintered body and composite were obtained by the same procedure as in Example 1 except that the molded product was obtained by compressing it with a cold isotropic pressure (CIP) device at a pressure of 150 MPa when producing the molded product. The body was made. Each measurement of the boron nitride sintered body and the composite was carried out in the same manner as in Example 1. The results are as shown in Tables 1 and 2.
(比較例3)
 焼結助剤の調製に際し、ホウ酸100質量部に対して炭酸カルシウムを57質量部配合して焼結助剤を調製したこと、及び、原料粉末100質量部に対して焼結助剤を1.0質量部配合したこと以外は、実施例1と同じ手順で、窒化ホウ素焼結体及び複合体を作製した。窒化ホウ素焼結体及び複合体の各測定を、実施例1と同様にして行った。結果は表1及び表2に示すとおりであった。
(Comparative Example 3)
When preparing the sintering aid, 57 parts by mass of calcium carbonate was mixed with 100 parts by mass of boric acid to prepare the sintering aid, and 1 part of the sintering aid was added to 100 parts by mass of the raw material powder. A boron nitride sintered body and a composite were prepared in the same procedure as in Example 1 except that 0.0 parts by mass was blended. Each measurement of the boron nitride sintered body and the composite was carried out in the same manner as in Example 1. The results are as shown in Tables 1 and 2.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002
 10…複合体(放熱部材)、20…窒化物焼結体。 10 ... complex (heat dissipation member), 20 ... nitride sintered body.

Claims (6)

  1.  多孔質構造を有する窒化物焼結体と、前記窒化物焼結体に含浸された熱硬化性樹脂組成物の半硬化物とを含む複合体であって、5MPaで厚み方向に加圧したときの厚み変化率が2%以上である、複合体。 A composite containing a nitride sintered body having a porous structure and a semi-cured product of a thermosetting resin composition impregnated in the nitride sintered body, when pressurized at 5 MPa in the thickness direction. A complex having a thickness change rate of 2% or more.
  2.  前記厚み変化率が、35%以下である、請求項1に記載の複合体。 The complex according to claim 1, wherein the thickness change rate is 35% or less.
  3.  前記窒化物焼結体の気孔率が40~75体積%である、請求項1又は2に記載の複合体。 The complex according to claim 1 or 2, wherein the nitride sintered body has a porosity of 40 to 75% by volume.
  4.  前記窒化物焼結体のかさ密度が600~1400kg/mである、請求項1~3のいずれか一項に記載の複合体。 The complex according to any one of claims 1 to 3, wherein the nitride sintered body has a bulk density of 600 to 1400 kg / m 3.
  5.  前記窒化物焼結体の配向性指数が20以下である、請求項1~4のいずれか一項に記載の複合体。 The complex according to any one of claims 1 to 4, wherein the orientation index of the nitride sintered body is 20 or less.
  6.  請求項1~5のいずれか一項に記載の複合体を有する放熱部材。 A heat radiating member having the complex according to any one of claims 1 to 5.
PCT/JP2021/013572 2020-03-31 2021-03-30 Composite and heat dissipation member WO2021200967A1 (en)

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