WO2021184435A1 - 触控显示装置及触控显示装置制作方法 - Google Patents

触控显示装置及触控显示装置制作方法 Download PDF

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Publication number
WO2021184435A1
WO2021184435A1 PCT/CN2020/083203 CN2020083203W WO2021184435A1 WO 2021184435 A1 WO2021184435 A1 WO 2021184435A1 CN 2020083203 W CN2020083203 W CN 2020083203W WO 2021184435 A1 WO2021184435 A1 WO 2021184435A1
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Prior art keywords
touch
electrode
touch electrode
display device
light
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Ceased
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PCT/CN2020/083203
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English (en)
French (fr)
Inventor
谢华飞
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Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd
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Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd
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Publication of WO2021184435A1 publication Critical patent/WO2021184435A1/zh
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    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display

Definitions

  • the present application relates to the field of display technology, and in particular to a touch display device and a manufacturing method of the touch display device.
  • the currently emerging touch display device is to attach a component with a touch function to the light-emitting surface of the display screen, and realize the touchable operation of the display device through a touch chip.
  • the production of touch components needs to be completed on a supporting substrate.
  • the supporting substrate will be transferred to the display panel at the same time, resulting in excessive thickness and low integration of the display device, which does not meet the current requirements.
  • the development direction of thin and light display devices is to attach a component with a touch function to the light-emitting surface of the display screen, and realize the touchable operation of the display device through a touch chip.
  • the display panel and the touch component in the touch display device are manufactured separately and are finally bound together.
  • the manufacturing process of the touch component requires the use of a supporting substrate, and the supporting substrate is finally combined with the display along with the touch component.
  • the panel is bonded and bonded, which results in the excessive thickness and low integration of the display device, which is not in line with the current development direction of light and thin display devices.
  • the present application provides a touch display device, including a display panel, and a first touch electrode and a second touch electrode disposed on a light-emitting surface of the display panel;
  • the first touch electrode and the second touch electrode cross each other and are insulated.
  • the first touch electrode and the second touch electrode respectively include a plurality of pieces, and the plurality of the first touch electrodes are arranged in parallel with each other, and the plurality of the first touch electrodes are arranged in parallel with each other.
  • the two touch electrodes are arranged parallel to each other.
  • the first touch electrode is directly disposed on the light-emitting surface of the display panel, the first dielectric layer covers the first touch electrode, and the second touch electrode It is disposed on the first dielectric layer, and the second dielectric layer covers the second touch electrode.
  • the first dielectric layer covers the entire light-emitting surface of the display panel, or the first dielectric layer is disposed along the first touch electrode and covers part of the display The light-emitting surface of the panel.
  • the second dielectric layer covers the entire light-emitting surface of the display panel, or the second dielectric layer is disposed along the second touch electrode and covers a part of the display The light-emitting surface of the panel.
  • the first touch electrode and the second touch electrode are arranged perpendicular to each other.
  • the first touch electrode includes a plurality of first diamond-shaped electrodes and a first linear electrode connected to the adjacent first diamond-shaped electrodes.
  • the second touch electrode includes a plurality of second diamond-shaped electrodes and a second linear electrode connected to the adjacent second diamond-shaped electrodes.
  • the intersection of the first touch electrode and the second touch electrode respectively corresponds to the first linear electrode and the first linear electrode in the first touch electrode.
  • the second linear electrode of the two touch electrodes are the intersection of the first touch electrode and the second touch electrodes.
  • the first touch electrode and the second touch electrode are indium tin oxide electrodes, indium zinc oxide electrodes, or nano silver wire electrodes.
  • the display panel is an organic light emitting diode display panel or a liquid crystal display panel.
  • the display panel includes:
  • the thin film transistor layer is disposed on the base substrate and includes a plurality of thin film transistors arranged in an array;
  • the light-emitting layer is disposed on the thin film transistor layer and includes a plurality of light-emitting diodes, and the light-emitting diodes are electrically connected to the thin film transistor;
  • An encapsulation layer arranged on the light-emitting layer, completely covering the light-emitting surface of the display panel;
  • the side where the encapsulation layer is located constitutes the light-emitting surface of the display panel.
  • the thin film transistor layer further includes a scan line and a data line, the scan line and the data line are electrically connected to the thin film transistor, and the scan line is used to The thin film transistor provides a scan signal, and the data line is used to provide a data signal to the thin film transistor.
  • the light emitting layer further includes a pixel electrode layer electrically connected to the light emitting diode, and the light emitting diode is electrically connected to the thin film transistor through the pixel electrode layer.
  • This application also provides a manufacturing method of a touch display device, including the following steps:
  • a display panel having a light-emitting surface
  • a second dielectric layer covering the second touch electrode is fabricated.
  • the method of manufacturing the first touch electrode includes the following steps:
  • the first conductive layer is patterned by an etching process to form the first touch electrode.
  • the manufactured first touch electrode includes a plurality of first diamond-shaped electrodes and a first linear electrode connected to the adjacent first diamond-shaped electrodes.
  • the method of manufacturing the second touch electrode includes the following steps:
  • the second conductive layer is patterned by an etching process to form the second touch electrode.
  • the manufactured second touch electrode includes a plurality of second diamond-shaped electrodes and a second linear electrode connected to the adjacent second diamond-shaped electrodes.
  • the present application also provides a touch display device, which includes a display panel, and a first touch electrode and a second touch electrode disposed on a light-emitting surface of the display panel, the first touch electrode and the second touch electrode
  • the two touch electrodes cross each other and are arranged insulated;
  • the first touch electrode includes a plurality of first diamond-shaped electrodes and a first linear electrode connected to the adjacent first diamond-shaped electrodes
  • the second touch electrode includes a plurality of second diamond-shaped electrodes and is connected to adjacent ones.
  • the touch display device by directly integrating two layers of touch electrodes with touch functions on its surface, the display device can be touched while achieving the purpose of reducing its thickness and improving its integration;
  • the manufacturing method of the touch display device provided in the present application directly manufactures two layers of touch electrodes with touch functions on the light-emitting surface of the display panel. Compared with the prior art, the manufacturing process of the touch display device is simplified, and The manufactured display device is thinner and more integrated.
  • FIG. 1 is a schematic diagram of a planar structure of a touch display device provided by an embodiment of the present application
  • FIG. 2 is a schematic diagram of a layered structure of an implementation manner of a touch display device provided by an embodiment of the present application
  • FIG. 3 is a schematic diagram of a layered structure of another implementation of a touch display device according to an embodiment of the present application.
  • FIG. 4 is a schematic structural diagram of a first touch electrode in a touch display device provided by an embodiment of the present application.
  • FIG. 5 is a schematic structural diagram of a second touch electrode in a touch display device provided by an embodiment of the present application.
  • FIG. 6 is a schematic structural diagram of a combination of a first touch electrode and a second touch electrode in a touch display device provided by an embodiment of the present application;
  • FIG. 7 is a flowchart of a manufacturing method of a touch display device according to an embodiment of the present application.
  • the embodiments of the present application provide a touch display device and a manufacturing method of a touch display device.
  • the surface of the touch display device directly integrates two layers of touch electrodes with touch functions, which can be used in realizing the display device At the same time of touch control, its thickness is reduced and its integration is improved;
  • the manufacturing method of the touch display device is to directly manufacture two layers of touch electrodes with touch function on the light-emitting surface of the display panel, which is compared with the current
  • FIGS. 1 and 2 where FIG. 1 is a schematic diagram of a plan structure of a touch display device provided by an embodiment of the present application, and FIG. 2 is a layered structure of an embodiment of the touch display device provided by an embodiment of the present application Schematic.
  • the touch display device 01 provided by the embodiment of the present application includes a display panel 10, and a first touch electrode 20 and a second touch electrode 40 disposed on a light-emitting surface of the display panel 10. It should be noted that FIG.
  • the touch display device 01 only shows the first touch electrode 20 and the second touch electrode 40 on the touch display device 01, and omits the others in the touch display device 01 Structure to show the relative positional relationship between the first touch electrode 20 and the second touch electrode 40; In the example, it refers to the side where the thin film encapsulation layer 154 of the display panel 10 is located.
  • the display panel 10 may be a liquid crystal display panel or an organic light emitting diode display panel.
  • the display panel 10 is defined as an organic light emitting diode display panel for description.
  • implementations applied to liquid crystal display panels can be obtained according to the content disclosed in this application.
  • the first touch electrode 20 and the second touch electrode 40 cross each other and are insulated from each other. It should be noted that each of the first touch electrode 20 and the second touch electrode 40 includes a plurality of pieces, and the plurality of pieces of the first touch electrode 20 may be arranged in parallel with each other, and the plurality of pieces of the second touch electrode 20 may be arranged in parallel with each other.
  • the touch electrodes 40 may be arranged parallel to each other, so as to form a mesh arrangement on the light-emitting surface of the display panel 10. It should be understood that the mesh structure formed by the first touch electrode 20 and the second touch electrode 40 can ensure that the touch display device 01 accurately locks the control point.
  • the first touch electrode 20 is directly disposed on the light-emitting surface of the display panel 10, and a first dielectric is disposed between the first touch electrode 20 and the second touch electrode 40.
  • Layer 30, the first dielectric layer 30 completely covers the first touch electrode 20.
  • the first dielectric layer 30 may cover the entire light-emitting surface of the display panel 10, or may only cover a part of the light-emitting surface of the display panel 10 along the first touch electrode 20.
  • the first dielectric layer 30 is used to insulate and separate the first touch electrode 20 and the second touch electrode 40.
  • the first dielectric layer 30 may be made of transparent insulating materials such as silicon oxide, silicon nitride, aluminum oxide, hafnium oxide, or organic matter.
  • the second touch electrode 40 is disposed on the first dielectric layer 30.
  • the first dielectric layer 30 is used to connect the first touch electrode 20 to the first dielectric layer 30.
  • the second touch electrodes 40 are insulated and separated. Therefore, the second touch electrodes 40 are disposed on the first dielectric layer 30 at least at the intersection with the first touch electrodes 20.
  • the surface of the second touch electrode 40 covers the second dielectric layer 50 to ensure that the second touch electrode 40 is electrically insulated from the outside.
  • the second dielectric layer 50 may cover the entire light-emitting surface of the display panel 10, or may only cover a part of the light-emitting surface of the display panel 10 along the second touch electrode 40;
  • the second dielectric layer 50 may be made of transparent insulating materials such as silicon oxide, silicon nitride, aluminum oxide, hafnium oxide, or organic matter.
  • first touch electrode 20 and the second touch electrode 40 are respectively electrically connected to the touch chip of the touch display device 01, and the touch chip is used to process The touch information detected by a touch electrode 20 and the second touch electrode 40 further realizes the precise touch function of the touch display device. It should be understood that in this embodiment, by directly disposing two layers of touch electrodes on the light-emitting surface of the display panel, compared with the prior art, the thickness of the entire touch display device is reduced, and the integration level of the display device is improved. .
  • the first touch electrodes 20 and the second touch electrodes 40 are arranged perpendicular to each other, thereby forming a rectangular touch sensing network on the display surface of the display panel 10, which further optimizes the touch control.
  • the first touch electrode 20 and the second touch electrode 40 are made of a transparent conductive material.
  • the material can be indium tin oxide, zinc tin oxide, or nano silver wire. It should be understood that the transparent conductive material, while ensuring the conductivity of the first touch electrode 20 and the second touch electrode 40, reduces its aperture ratio and light transmittance to the touch display device 01. Impact.
  • the first touch electrode 20 includes a plurality of first diamond-shaped electrodes 201 and a first linear electrode 202 connected to the adjacent first diamond-shaped electrodes 201;
  • the second touch electrode 40 includes a plurality of second diamond-shaped electrodes 401 and a second linear electrode 402 connected to the adjacent second diamond-shaped electrodes 401.
  • the intersection A of the first touch electrode 20 and the second touch electrode 40 corresponds to the first linear electrode 202 and the second touch electrode 40 in the first touch electrode 20, respectively.
  • the second linear electrode 402. It should be understood that the above-mentioned structural features and relative position relationship features of the first touch electrode 20 and the second touch electrode 40 are beneficial to realize the first touch electrode 20 and the second touch electrode.
  • the coverage area of 40 on the light-emitting surface of the display panel 10 is maximized, and the touch accuracy of the touch display device 01 is further optimized.
  • the display panel 10 includes a base substrate 11, a thin film transistor layer 13, a light-emitting layer 15 and an encapsulation layer 16.
  • the base substrate 11 may be a hard substrate such as a glass substrate, or a flexible substrate such as a polyimide substrate.
  • a buffer layer 12 is provided on the base substrate 11, the thin film transistor layer 13 is provided on the buffer layer 12, and the buffer layer 12 is made of a transparent organic material, for example, polyamide Imines and so on.
  • the thin film transistor layer 13 includes an active layer 131 disposed on the buffer layer 12, a gate insulating layer 132 disposed on the active layer 131, and a gate electrode disposed on the gate insulating layer 132.
  • the source electrode 135 and the drain electrode 136 are electrically connected to the active layer 131.
  • the thin film transistor layer 13 further includes scan lines and data lines, wherein the scan lines are electrically connected to the gate layer 133 for providing scan signals to the gate layer 133, and the data lines It is electrically connected to the source electrode 135 for providing data signals to the source electrode 135. It should be understood that the thin film transistor layer 13 is used to transmit the data line signal provided by the data line to the drain electrode 136 under the control of the scan signal provided by the scan line.
  • a flat layer 14 is provided on the thin film transistor layer 13 to form a flat surface above the thin film transistor layer 13 to facilitate the placement of other components.
  • the flat layer 14 may be made of a transparent organic material.
  • the light-emitting layer 15 is disposed on the flat layer 14.
  • the light-emitting layer 15 includes a pixel electrode layer 151 and a light-emitting diode 152 electrically connected to the pixel electrode layer 151.
  • the pixel electrode layer 151 The light emitting diode 152 is disposed in the encapsulation layer 153 together, and the encapsulation layer 153 is made of a transparent material.
  • the pixel electrode layer 151 is electrically connected to the drain electrode 136 through the via hole on the flat layer 14, and the pixel electrode layer 151 is used to control the light emitting function of the light emitting diode 152.
  • the light-emitting diode 152 has a plurality of light-emitting diodes, and includes a red light-emitting diode that can emit red light, a green light-emitting diode that can emit green light, and a blue light-emitting diode that can emit blue light. It should be understood that the display function of the touch display device 01 is realized by the light-emitting function of the light-emitting diode 152.
  • the thin-film encapsulation layer 16 is disposed on the light-emitting layer 15 to keep the light-emitting layer 15 in a closed state and prevent the erosion of external air and moisture.
  • the thin film encapsulation layer 16 is composed of a stacked structure of an organic layer, an inorganic layer, and an organic layer, wherein the inorganic layer may be made of transparent inorganic materials such as silicon oxide, silicon nitride, aluminum oxide, and hafnium oxide.
  • the organic layer can be made of transparent organic materials such as polytetrafluoroethylene.
  • the first touch electrode 20 is disposed on the thin film encapsulation layer 16. It should be understood that, in the display panel 10, the side where the encapsulation layer 16 is located constitutes the light-emitting surface of the display panel 10. .
  • the thin film transistor layer 13 of the display panel 10 has a top-gate thin film transistor structure.
  • the display panel 10 may also have The structure of the bottom-gate thin film transistor is as follows:
  • the gate layer 133 is disposed on the buffer layer 12, and the gate insulating layer 132 is disposed on the buffer layer 12 and covers the gate layer 133.
  • the active layer 131 is disposed on the gate insulating layer 132, the source electrode 135 and the drain electrode 136 are respectively electrically connected to the active layer 131, and the passivation layer 134 covers the The active layer 131, the source electrode 135 and the drain electrode 136.
  • the thin film transistor layer 13 further includes scan lines and data lines, wherein the scan lines are electrically connected to the gate layer 133 for providing scan signals to the gate layer 133, and the data The wire is electrically connected to the source electrode 135 for providing data signals to the source electrode 135. It should be understood that the thin film transistor layer 13 is used to transmit the data line signal provided by the data line to the drain electrode 136 under the control of the scan signal provided by the scan line.
  • the touch display device provided by the embodiment of the present application includes a first touch electrode and a second touch electrode disposed on the light-emitting surface of the display panel, by directly integrating the touch electrode on the surface of the display panel , while realizing the touch control of the display device, the integration of the touch display device is improved, and the overall thickness of the touch display device is reduced.
  • An embodiment of the present application also provides a manufacturing method of a touch display device.
  • the manufacturing method of the touch display device includes the following steps (refer to FIG. 2):
  • step S101 a display panel 10 is fabricated, and the display panel 10 has a light-emitting surface.
  • the display panel 10 includes a base substrate 11, a thin film transistor layer 13, a light emitting layer 15 and an encapsulation layer 16.
  • the base substrate 11 may be a hard substrate such as a glass substrate, or a flexible substrate such as a polyimide substrate.
  • a buffer layer 12 is fabricated on the base substrate 11, the thin film transistor layer 13 is fabricated on the buffer layer 12, and the buffer layer 12 is made of a transparent organic material, such as polyacrylamide. Imines and so on.
  • the thin film transistor layer 13 includes an active layer 131 disposed on the buffer layer 12, a gate insulating layer 132 disposed on the active layer 131, and a gate electrode disposed on the gate insulating layer 132.
  • the source electrode 135 and the drain electrode 136 are electrically connected to the active layer 131.
  • the thin film transistor layer 13 further includes scan lines and data lines, wherein the scan lines are electrically connected to the gate layer 133 for providing scan signals to the gate layer 133, and the data lines It is electrically connected to the source electrode 135 for providing data signals to the source electrode 135. It should be understood that the thin film transistor layer 13 is used to transmit the data line signal provided by the data line to the drain electrode 136 under the control of the scan signal provided by the scan line.
  • a flat layer 14 is formed on the thin film transistor layer 13 to form a flat surface above the thin film transistor layer 13 to facilitate the arrangement of other components.
  • the flat layer 14 may be made of a transparent organic material.
  • the light-emitting layer 15 is fabricated on the flat layer 14.
  • the light-emitting layer 15 includes a pixel electrode layer 151 and a light-emitting diode 152 electrically connected to the pixel electrode layer 151.
  • the pixel electrode layer 151 The light emitting diode 152 is disposed in the encapsulation layer 153 together, and the encapsulation layer 153 is made of a transparent material.
  • the pixel electrode layer 151 is electrically connected to the drain electrode 136 through the via hole on the flat layer 14, and the pixel electrode layer 151 is used to control the light emitting function of the light emitting diode 152.
  • the light-emitting diode 152 has a plurality of light-emitting diodes, and includes a red light-emitting diode that can emit red light, a green light-emitting diode that can emit green light, and a blue light-emitting diode that can emit blue light. It should be understood that the display function of the touch display device 01 is realized by the light-emitting function of the light-emitting diode 152.
  • the thin-film encapsulation layer 16 is disposed on the light-emitting layer 15 to keep the light-emitting layer 15 in a closed state and prevent the erosion of external air and moisture.
  • the thin film encapsulation layer 16 is composed of a stacked structure of an organic layer, an inorganic layer, and an organic layer, wherein the inorganic layer may be made of transparent inorganic materials such as silicon oxide, silicon nitride, aluminum oxide, and hafnium oxide.
  • the organic layer can be made of transparent organic materials such as polytetrafluoroethylene.
  • the side where the encapsulation layer 16 is located constitutes the light-emitting surface of the display panel 10.
  • Step S102 fabricating a first touch electrode 20 on the light-emitting surface of the display panel 10.
  • the method of manufacturing the first touch electrode 20 includes the following steps:
  • a first conductive layer is formed on the light-emitting surface of the display panel 10 by evaporation or sputtering.
  • the material of the first conductive layer may be indium tin oxide, zinc tin oxide, or metallic silver.
  • an etching process is used to pattern the first conductive layer to form the first touch electrode 20, wherein the etching process may be a dry etching process or a wet etching process or both Combine.
  • the fabricated first touch electrode 20 includes a plurality of first diamond-shaped electrodes 201 and a first linear electrode 202 connected to adjacent first diamond-shaped electrodes 201.
  • Step S103 fabricating a first dielectric layer 30 covering the first touch electrode 20.
  • the method for manufacturing the first dielectric layer 30 may be an evaporation method or a chemical vapor deposition method.
  • the first dielectric layer 30 may cover the entire light-emitting surface of the display panel 10, or may only be along the
  • the first touch electrode 20 covers a part of the light-emitting surface of the display panel 10.
  • the first dielectric layer 30 may be made of transparent insulating materials such as silicon oxide, silicon nitride, aluminum oxide, hafnium oxide, or organic matter.
  • Step S104 fabricate second touch electrodes 40 arranged crosswise with the first touch electrodes 20 on the first dielectric layer 30.
  • the method of manufacturing the second touch electrode 40 includes the following steps:
  • a second conductive layer is formed on the first dielectric layer 30 by evaporation or sputtering.
  • the material of the second conductive layer may be indium tin oxide, zinc tin oxide, or metallic silver.
  • an etching process is used to pattern the second conductive layer to form the second touch electrode 40, wherein the etching process may be a dry etching process or a wet etching process or both Combine.
  • the fabricated second touch electrode 40 includes a plurality of second diamond-shaped electrodes 401 and a second linear electrode 402 connected to the adjacent second diamond-shaped electrodes 401.
  • intersection A of the first touch electrode 20 and the second touch electrode 40 corresponds to the first linear electrode 202 in the first touch electrode 20, respectively.
  • the second linear electrode 402 in the second touch electrode 40 is a straight line intersection A of the first touch electrode 20 and the second touch electrode 40.
  • Step S105 fabricating a second dielectric layer 50 covering the second touch electrode 40.
  • the method for manufacturing the second dielectric layer 50 may be an evaporation method or a chemical vapor deposition method.
  • the second dielectric layer 50 may cover the entire light-emitting surface of the display panel 10, or it may only be along
  • the second touch electrode 40 covers a part of the light-emitting surface of the display panel 10.
  • the second dielectric layer 50 may be made of transparent insulating materials such as silicon oxide, silicon nitride, aluminum oxide, hafnium oxide, or organic matter.
  • the manufacturing method of the touch display device provided by the embodiment of the present application directly manufactures two layers of touch electrodes on the light-emitting surface of the display panel, which simplifies the manufacturing process of the touch display device compared with the prior art.
  • the manufactured display device is lighter and thinner and has a higher degree of integration.

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Abstract

一种触控显示装置(01)及触控显示装置(01)的制作方法，触控显示装置(01)包括显示面板(10)，以及设置于显示面板(10)出光面上的第一触控电极(20)和第二触控电极(40)；第一触控电极(20)和第二触控电极(40)彼此交叉且绝缘设置；触控显示装置(01)的制作方法包括在一显示面板(10)的出光面上直接制作两层彼此交叉绝缘的触控电极的步骤，有利于简化工艺，减薄显示装置厚度。

Description

触控显示装置及触控显示装置制作方法
本申请要求于2020年03月20日提交中国专利局、申请号为202010203668.1、发明名称为“触控显示装置及触控显示装置制作方法”的中国专利申请的优先权，其全部内容通过引用结合在本申请中。
技术领域
本申请涉及显示技术领域，尤其涉及一种触控显示装置及触控显示装置制作方法。
 背景技术
随着显示装置制造技术的发展，在显示屏的表面制作功能化的组件，以实现显示装置的多种辅助显示与操控功能已经成为主流，而触控显示技术正是如此。
目前出现的触控显示装置是将具有触控功能的组件贴合在显示屏的出光面上，并通过触控芯片实现显示装置的可触控操作。在此类显示装置的制作过程中，需要分别单独制作显示面板和触控组件，然后再将二者贴合并绑定在一起。触控组件的制作需要在一个支撑基板上完成，最后与显示面板进行贴合绑定时，该支撑基板会同时转移至显示面板上，造成显示装置的厚度过大、集成度低下，不符合目前显示装置轻薄化的发展方向。
 技术问题
现有技术中，触控显示装置中的显示面板和触控组件是分别制作，并最终绑定在一起，触控组件的制作过程需要使用支撑基板，该支撑基板最终随触控组件一起与显示面板贴合绑定，由此导致显示装置的厚度过大、集成度低下，不符合目前显示装置轻薄化的发展方向。
 技术解决方案
为了解决上述技术问题，本申请提供的解决方案如下：
本申请提供一种触控显示装置，包括显示面板，以及设置于所述显示面板出光面上的第一触控电极和第二触控电极；
所述第一触控电极和所述第二触控电极彼此交叉且绝缘设置。
在本申请的触控显示装置中，所述第一触控电极和所述第二触控电极分别包括多条，多条所述第一触控电极之间彼此平行设置，多条所述第二触控电极之间彼此平行设置。
在本申请的触控显示装置中，所述第一触控电极直接设置于所述显示面板的出光面上，第一介电层覆盖所述第一触控电极，所述第二触控电极设置于所述第一介电层上，第二介电层覆盖所述第二触控电极。
在本申请的触控显示装置中，所述第一介电层覆盖所述显示面板的整个出光面，或所述第一介电层沿所述第一触控电极设置并覆盖部分所述显示面板的出光面。
在本申请的触控显示装置中，所述第二介电层覆盖所述显示面板的整个出光面，或所述第二介电层沿所述第二触控电极设置并覆盖部分所述显示面板的出光面。
在本申请的触控显示装置中，所述第一触控电极与所述第二触控电极彼此垂直设置。
在本申请的触控显示装置中，所述第一触控电极包括多个第一菱形电极以及连接相邻所述第一菱形电极的第一线形电极。
在本申请的触控显示装置中，所述第二触控电极包括多个第二菱形电极以及连接相邻所述第二菱形电极的第二线形电极。
在本申请的触控显示装置中，所述第一触控电极与所述第二触控电极彼此交叉处分别对应所述第一触控电极中的所述第一线形电极和所述第二触控电极中的所述第二线形电极。
在本申请的触控显示装置中，所述第一触控电极和所述第二触控电极是氧化铟锡电极、氧化铟锌电极或纳米银线电极。
在本申请的触控显示装置中，所述显示面板是有机发光二极管显示面板或液晶显示面板。
在本申请的触控显示装置中，所述显示面板包括：
衬底基板；
薄膜晶体管层，设置于所述衬底基板上，包括阵列排布的多个薄膜晶体管；
发光层，设置于所述薄膜晶体管层上，包括多个发光二极管，所述发光二极管与所述薄膜晶体管电性连接；
封装层，设置于所述发光层上，完全覆盖所述显示面板的所述出光面；
在所述显示面板中，所述封装层所在的一面构成所述显示面板的所述出光面。
在本申请的触控显示装置中，所述薄膜晶体管层还包括扫描线和数据线，所述扫描线和所述数据线分别与所述薄膜晶体管电性连接，所述扫描线用于向所述薄膜晶体管提供扫描信号，所述数据线用于向所述薄膜晶体管提供数据信号。
在本申请的触控显示装置中，所述发光层还包括与所述发光二极管电性连接的像素电极层，所述发光二极管通过所述像素电极层与所述薄膜晶体管电性连接。
本申请还提供一种触控显示装置的制作方法，包括以下步骤：
制作一显示面板，所述显示面板具有一出光面；
在所述显示面板的出光面上制作第一触控电极；
制作覆盖所述第一触控电极的第一介电层；
在所述第一介电层上制作与所述第一触控电极交叉排布的第二触控电极；
制作覆盖所述第二触控电极的第二介电层。
在本申请的触控显示装置的制作方法中，制作所述第一触控电极的方法包括以下步骤：
采用蒸镀或溅射的方法在所述显示面板的出光面上形成第一导电层；
采用刻蚀工艺对所述第一导电层图案化处理，形成所述第一触控电极。
在本申请的触控显示装置的制作方法中，制作形成的所述第一触控电极包括多个第一菱形电极以及连接相邻所述第一菱形电极的第一线形电极。
在本申请的触控显示装置的制作方法中，制作所述第二触控电极的方法包括以下步骤：
采用蒸镀或溅射的方法在所述第一介电层上形成第二导电层；
采用刻蚀工艺对所述第二导电层图案化处理，形成所述第二触控电极。
在本申请的触控显示装置的制作方法中，制作形成的所述第二触控电极包括多个第二菱形电极以及连接相邻所述第二菱形电极的第二线形电极。
本申请还提供一种触控显示装置，其包括显示面板，以及设置于所述显示面板出光面上的第一触控电极和第二触控电极，所述第一触控电极和所述第二触控电极彼此交叉且绝缘设置；
所述第一触控电极包括多个第一菱形电极以及连接相邻所述第一菱形电极的第一线形电极，所述第二触控电极包括多个第二菱形电极以及连接相邻所述第二菱形电极的第二线形电极，所述第一触控电极与所述第二触控电极彼此交叉处分别对应所述第一触控电极中的所述第一线形电极和所述第二触控电极中的所述第二线形电极。
 有益效果
本申请提供的触控显示装置，通过在其表面直接集成具有触控功能的两层触控电极，在实现显示装置的可触控化的同时，达到降低其厚度，提高其集成度的目的；本申请提供的触控显示装置的制作方法，将具有触控功能的两层触控电极直接制作于显示面板的出光面上，相比于现有技术，简化了触控显示装置制作工艺，并且制成的显示装置更加轻薄、集成度更高。
 附图说明
为了更清楚地说明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单介绍，显而易见地，下面描述中的附图仅仅是申请的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1是本申请实施例提供的触控显示装置的平面结构示意图；
图2是本申请实施例提供的触控显示装置的一种实施方式的层状结构示意图；
图3是本申请实施例提供的触控显示装置的另一种实施方式的层状结构示意图；
图4是本申请实施例提供的触控显示装置中的第一触控电极的结构示意图；
图5是本申请实施例提供的触控显示装置中的第二触控电极的结构示意图；
图6是本申请实施例提供的触控显示装置中的第一触控电极和第二触控电极组合的结构示意图；
图7是本申请实施例提供的触控显示装置制作方法的流程图。
 本发明的实施方式
以下各实施例的说明是参考附加的图示，用以例示本申请可用以实施的特定实施例。本申请所提到的方向用语，例如[上]、[下]、[前]、[后]、[左]、[右]、[内]、[外]、[侧面]等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本申请，而非用以限制本申请。在图中，结构相似的单元是用以相同标号表示。
本申请实施例提供了一种触控显示装置及一种触控显示装置的制作方法，所述触控显示装置的表面直接集成具有触控功能的两层触控电极，在实现显示装置的可触控化的同时，降低其厚度，提高其集成度；所述触控显示装置的制作方法，将具有触控功能的两层触控电极直接制作于显示面板的出光面上，相比于现有技术，简化了触控显示装置制作工艺，并且制成的显示装置更加轻薄、集成度更高。
如图1和图2所示，其中图1是本申请实施例提供的触控显示装置的平面结构示意图，图2是本申请实施例提供的触控显示装置的一种实施方式的层状结构示意图。本申请实施例提供的触控显示装置01包括显示面板10，以及设置于所述显示面板10出光面上的第一触控电极20和第二触控电极40。需要说明的是，图1仅示出了所述触控显示装置01上的所述第一触控电极20和所述第二触控电极40，而省略所述触控显示装置01中的其它结构，以示明所述第一触控电极20和所述第二触控电极40的相对位置关系；所述显示面板10的出光面指其发挥显示功能时对外显示画面的一面，在本实施例中指所述显示面板10的薄膜封装层154所述在的一面。
需要说明的是，所述显示面板10可以是液晶显示面板或有机发光二极管显示面板，在本实施例中，将所述显示面板10定义为有机发光二极管显示面板进行说明，本领域技术人员在不经过创造性劳动的基础上，依照本申请公开的内容可以得到应用于液晶显示面板的实施方式。
所述第一触控电极20和所述第二触控电极40彼此交叉且绝缘设置。需要说明的是，所述第一触控电极20和所述第二触控电极40分别包括多条，多条所述第一触控电极20之间可以彼此平行设置，多条所述第二触控电极40之间可以彼此平行设置，从而在所述显示面板10的出光面上形成网状排布。应当理解的是，所述第一触控电极20和所述第二触控电极40形成的网状结构可以确保所述触控显示装置01准确锁定操控点。
可选地，所述第一触控电极20直接设置于所述显示面板10的出光面上，所述第一触控电极20与所述第二触控电极40之间设置有第一介电层30，所述第一介电层30完全覆盖所述第一触控电极20。可选地，所述第一介电层30可以覆盖所述显示面板10的整个出光面，也可以仅沿所述第一触控电极20覆盖所述显示面板10的出光面的一部分。所述第一介电层30用于将所述第一触控电极20与所述第二触控电极40绝缘隔开。可选地，所述第一介电层30可以由氧化硅、氮化硅、氧化铝、氧化铪或有机物等透明绝缘材料制成。
可选地，所述第二触控电极40设置于所述第一介电层30上，需要说明的是，所述第一介电层30用于将所述第一触控电极20与所述第二触控电极40绝缘隔开，因此，所述第二触控电极40至少在与所述第一触控电极20的交汇处设置于所述第一介电层30上。所述第二触控电极40的表面覆盖第二介电层50，以保证所述第二触控电极40与外界的电性绝缘。可选地，所述第二介电层50可以覆盖所述显示面板10的整个出光面，也可以仅沿所述第二触控电极40覆盖所述显示面板10的出光面的一部分；所述第二介电层50可以由氧化硅、氮化硅、氧化铝、氧化铪或有机物等透明绝缘材料制成。
需要说明的是，所述第一触控电极20和所述第二触控电极40分别电性连接所述触控显示装置01的触控芯片，所述触控芯片用于处理由所述第一触控电极20和所述第二触控电极40探测的触控信息，进而实现所述触控所述触控显示装置的精确触控功能。应当理解的是，本实施例通过将两层触控电极直接设置于显示面板的出光面上，相比于现有技术，减小了整个触控显示装置的厚度，提高了显示装置的集成度。
可选地，所述第一触控电极20与所述第二触控电极40彼此垂直设置，从而在所述显示面板10的显示面上形成矩形触控感应网络，进一步优化了所述触控显示装置01的触控感应精度。
可选地，所述第一触控电极20和所述第二触控电极40由透明导电材料制作而成，例如其制作材料可以是氧化铟锡、氧化锌锡、或纳米银线等。应当理解的是，该透明导电材料在保证所述第一触控电极20和所述第二触控电极40导电的同时，减小其对所述触控显示装置01的开口率和透光性的影响。
可选地，如图4至图6所示，所述第一触控电极20包括多个第一菱形电极201以及连接相邻所述第一菱形电极201的第一线形电极202；所述第二触控电极40包括多个第二菱形电极401以及连接相邻所述第二菱形电极401的第二线形电极402。所述第一触控电极20与所述第二触控电极40彼此交叉处A分别对应所述第一触控电极20中的所述第一线形电极202和所述第二触控电极40中的所述第二线形电极402。应当理解的是，所述第一触控电极20和所述第二触控电极40的上述结构特征和相对位置关系特征有利于实现所述第一触控电极20与所述第二触控电极40在所述显示面板10的出光面上的覆盖面积最大化，进一步优化所述触控显示装置01的触控精度。
继续参考图1和图2所示，所述显示面板10包括衬底基板11、薄膜晶体管层13、发光层15以及封装层16。所述衬底基板11可以是玻璃基板等硬质基板，也可以是聚酰亚胺基板等柔性基板。可选地，所述衬底基板11上设置有缓冲层12，所述薄膜晶体管层13设置于所述缓冲层12上，所述缓冲层12由透明有机材料制作而成，例如可以是聚酰亚胺等。
所述薄膜晶体管层13包括设置于所述缓冲层12上的有源层131、设置于所述有源层131上的栅极绝缘层132、设置于所述栅极绝缘层132上的栅极层133、设置于所述缓冲层12上并覆盖所述有源层131、所述栅极绝缘层132和所述栅极层133的钝化层134、以及设置于所述钝化层134上并与所述有源层131电性连通的源极135和漏极136。进一步地，所述薄膜晶体管层13还包括扫描线和数据线，其中所述扫描线与所述栅极层133电性连接，用于向所述栅极层133提供扫描信号，所述数据线与所述源极135电性连接，用于向所述源极135提供数据信号。应当理解的是，所述薄膜晶体管层13用于在所述扫描线提供的扫描信号的控制下，将所述数据线提供的数据线信号传递至所述漏极136。
可选地，所述薄膜晶体管层13上设置有平坦层14，以在所述薄膜晶体管层13上方形成平整表面，便于其他元件的设置。所述平坦层14可以由透明有机材料制作而成。
可选地，所述发光层15设置于所述平坦层14上，所述发光层15包括像素电极层151以及与所述像素电极层151电性连接的发光二极管152，所述像素电极层151和所述发光二极管152共同设置于封装胶层153中，所述封装胶层153由透明材料制作而成。
所述像素电极层151通过所述平坦层14上的过孔与所述漏极136电性连接，所述像素电极层151用于控制所述发光二极管152的发光功能。可选地，所述发光二极管152具有多个，并且包含可发射红光的红色发光二极管、可发射绿光的绿色发光二极管和可发射蓝光的蓝色发光二极管。应当理解的是，所述触控显示装置01的显示功能正是通过所述发光二极管152的发光功能实现的。
所述薄膜封装层16设置于所述发光层15上，用于保持所述发光层15处于封闭状态，防止外界空气和水分的侵蚀。可选地，所述薄膜封装层16是由有机层、无机层和有机层的堆叠结构构成，其中所述无机层可以由氧化硅、氮化硅、氧化铝、氧化铪等透明无机材料制成，所述有机层可以由聚四氟乙烯等透明有机材料制成。
所述第一触控电极20设置于所述薄膜封装层16上，应当理解的是，在所述显示面板10中，所述封装层16所在的一面构成所述显示面板10的所述出光面。
需要说明的是，在上述实施例中，所述显示面板10的所述薄膜晶体管层13具有顶栅型的薄膜晶体管结构，在本申请的另一实施例中，所述显示面板10还可以具有底栅型的薄膜晶体管结构，具体如下：
如图3所示，需要说明的是，图3所示的触控显示装置与图2所述的触控显示装置的差异仅存在于所述薄膜晶体管层13的结构上的差异。
在图3所示的触控显示装置中，所述栅极层133设置于所述缓冲层12上，所述栅极绝缘层132设置于所述缓冲层12上并覆盖所述栅极层133，所述有源层131设置于所述栅极绝缘层132上，所述源极135和所述漏极136分别与所述有源层131电性连接，所述钝化层134覆盖所述有源层131、所述源极135和所述漏极136。可选地，所述薄膜晶体管层13还包括扫描线和数据线，其中所述扫描线与所述栅极层133电性连接，用于向所述栅极层133提供扫描信号，所述数据线与所述源极135电性连接，用于向所述源极135提供数据信号。应当理解的是，所述薄膜晶体管层13用于在所述扫描线提供的扫描信号的控制下，将所述数据线提供的数据线信号传递至所述漏极136。
综上所述，本申请实施例提供的触控显示装置，包括设置于显示面板出光面上的第一触控电极和第二触控电极，通过将触控电极直接集成于所述显示面板表面，在实现显示装置的可触控化的同时，提升了触控显示装置的集成度，降低了其整体厚度。
本申请实施例还提供一种触控显示装置的制作方法，如图7所示，所述触控显示装置的制作方法包括以下步骤（参考图2所示）：
步骤S101、制作一显示面板10，所述显示面板10具有一出光面。
具体地，所述显示面板10包括衬底基板11、薄膜晶体管层13、发光层15以及封装层16。所述衬底基板11可以是玻璃基板等硬质基板，也可以是聚酰亚胺基板等柔性基板。可选地，所述衬底基板11上制作有缓冲层12，所述薄膜晶体管层13制作于所述缓冲层12上，所述缓冲层12由透明有机材料制作而成，例如可以是聚酰亚胺等。
所述薄膜晶体管层13包括设置于所述缓冲层12上的有源层131、设置于所述有源层131上的栅极绝缘层132、设置于所述栅极绝缘层132上的栅极层133、设置于所述缓冲层12上并覆盖所述有源层131、所述栅极绝缘层132和所述栅极层133的钝化层134、以及设置于所述钝化层134上并与所述有源层131电性连通的源极135和漏极136。进一步地，所述薄膜晶体管层13还包括扫描线和数据线，其中所述扫描线与所述栅极层133电性连接，用于向所述栅极层133提供扫描信号，所述数据线与所述源极135电性连接，用于向所述源极135提供数据信号。应当理解的是，所述薄膜晶体管层13用于在所述扫描线提供的扫描信号的控制下，将所述数据线提供的数据线信号传递至所述漏极136。
可选地，所述薄膜晶体管层13上制作有平坦层14，以在所述薄膜晶体管层13上方形成平整表面，便于其他元件的设置。所述平坦层14可以由透明有机材料制作而成。
可选地，所述发光层15制作于所述平坦层14上，所述发光层15包括像素电极层151以及与所述像素电极层151电性连接的发光二极管152，所述像素电极层151和所述发光二极管152共同设置于封装胶层153中，所述封装胶层153由透明材料制作而成。
所述像素电极层151通过所述平坦层14上的过孔与所述漏极136电性连接，所述像素电极层151用于控制所述发光二极管152的发光功能。可选地，所述发光二极管152具有多个，并且包含可发射红光的红色发光二极管、可发射绿光的绿色发光二极管和可发射蓝光的蓝色发光二极管。应当理解的是，所述触控显示装置01的显示功能正是通过所述发光二极管152的发光功能实现的。
所述薄膜封装层16设置于所述发光层15上，用于保持所述发光层15处于封闭状态，防止外界空气和水分的侵蚀。可选地，所述薄膜封装层16是由有机层、无机层和有机层的堆叠结构构成，其中所述无机层可以由氧化硅、氮化硅、氧化铝、氧化铪等透明无机材料制成，所述有机层可以由聚四氟乙烯等透明有机材料制成。
应当理解的是，在所述显示面板10中，所述封装层16所在的一面构成所述显示面板10的所述出光面。
步骤S102、在所述显示面板10的出光面上制作第一触控电极20。
具体地，制作所述第一触控电极20的方法包括以下步骤：
首先，采用蒸镀或溅射的方法在所述显示面板10的出光面上形成第一导电层，所述第一导电层的材料可以是氧化铟锡、氧化锌锡或金属银等。
然后，采用刻蚀工艺对所述第一导电层图案化处理，形成所述第一触控电极20，其中所述刻蚀工艺可以是干法刻蚀工艺或湿法刻蚀工艺或二者的结合。
可选地，参考图4所示，制作形成的所述第一触控电极20包括多个第一菱形电极201以及连接相邻所述第一菱形电极201的第一线形电极202。
步骤S103、制作覆盖所述第一触控电极20的第一介电层30。
具体地，制作所述第一介电层30的方法可以是蒸镀法或化学气相沉积法，所述第一介电层30可以覆盖所述显示面板10的整个出光面，也可以仅沿所述第一触控电极20覆盖所述显示面板10的出光面的一部分。可选地，所述第一介电层30可以由氧化硅、氮化硅、氧化铝、氧化铪或有机物等透明绝缘材料制成。
步骤S104、在所述第一介电层30上制作与所述第一触控电极20交叉排布的第二触控电极40。
具体地，制作所述第二触控电极40的方法包括以下步骤：
首先，采用蒸镀或溅射的方法在所述第一介电层30上形成第二导电层，所述第二导电层的材料可以是氧化铟锡、氧化锌锡或金属银等
然后，采用刻蚀工艺对所述第二导电层图案化处理，形成所述第二触控电极40，其中所述刻蚀工艺可以是干法刻蚀工艺或湿法刻蚀工艺或二者的结合。
可选地，参考图5所示，制作形成的所述第二触控电极40包括多个第二菱形电极401以及连接相邻所述第二菱形电极401的第二线形电极402。
进一步地，参考图6所示，所述第一触控电极20与所述第二触控电极40彼此交叉处A分别对应所述第一触控电极20中的所述第一线形电极202和所述第二触控电极40中的所述第二线形电极402。
步骤S105、制作覆盖所述第二触控电极40的第二介电层50。
具体地，制作所述第二介电层50的方法可以是蒸镀法或化学气相沉积法，所述第二介电层50可以覆盖所述显示面板10的整个出光面，也可以仅沿所述第二触控电极40覆盖所述显示面板10的出光面的一部分。可选地，所述第二介电层50可以由氧化硅、氮化硅、氧化铝、氧化铪或有机物等透明绝缘材料制成。
综上所述，本申请实施例提供的触控显示装置的制作方法，直接在显示面板的出光面上制作两层触控电极，相比于现有技术，简化了触控显示装置制作工艺，并且制成的显示装置更加轻薄、集成度更高。
需要说明的是，虽然本申请以具体实施例揭露如上，但上述实施例并非用以限制本申请，本领域的普通技术人员，在不脱离本申请的精神和范围内，均可作各种更动与润饰，因此本申请的保护范围以权利要求界定的范围为准。

Claims (20)

  1. 一种触控显示装置，其包括显示面板，以及设置于所述显示面板出光面上的第一触控电极和第二触控电极；
    所述第一触控电极和所述第二触控电极彼此交叉且绝缘设置。
  2. 根据权利要求1所述的触控显示装置，其中，所述第一触控电极和所述第二触控电极分别包括多条，多条所述第一触控电极之间彼此平行设置，多条所述第二触控电极之间彼此平行设置。
  3. 根据权利要求1所述的触控显示装置，其中，所述第一触控电极直接设置于所述显示面板的出光面上，第一介电层覆盖所述第一触控电极，所述第二触控电极设置于所述第一介电层上，第二介电层覆盖所述第二触控电极。
  4. 根据权利要求3所述的触控显示装置，其中，所述第一介电层覆盖所述显示面板的整个出光面，或所述第一介电层沿所述第一触控电极设置并覆盖部分所述显示面板的出光面。
  5. 根据权利要求3所述的触控显示装置，其中，所述第二介电层覆盖所述显示面板的整个出光面，或所述第二介电层沿所述第二触控电极设置并覆盖部分所述显示面板的出光面。
  6. 根据权利要求1所述的触控显示装置，其中，所述第一触控电极与所述第二触控电极彼此垂直设置。
  7. 根据权利要求1所述的触控显示装置，其中，所述第一触控电极包括多个第一菱形电极以及连接相邻所述第一菱形电极的第一线形电极。
  8. 根据权利要求7所述的触控显示装置，其中，所述第二触控电极包括多个第二菱形电极以及连接相邻所述第二菱形电极的第二线形电极。
  9. 根据权利要求8所述的触控显示装置，其中，所述第一触控电极与所述第二触控电极彼此交叉处分别对应所述第一触控电极中的所述第一线形电极和所述第二触控电极中的所述第二线形电极。
  10. 根据权利要求1所述的触控显示装置，其中，所述第一触控电极和所述第二触控电极是氧化铟锡电极、氧化铟锌电极或纳米银线电极。
  11. 根据权利要求1所述的触控显示装置，其中，所述显示面板是有机发光二极管显示面板或液晶显示面板。
  12. 根据权利要求1所述的触控显示装置，其中，所述显示面板包括：
    衬底基板；
    薄膜晶体管层，设置于所述衬底基板上，包括阵列排布的多个薄膜晶体管；
    发光层，设置于所述薄膜晶体管层上，包括多个发光二极管，所述发光二极管与所述薄膜晶体管电性连接；
    封装层，设置于所述发光层上，完全覆盖所述显示面板的所述出光面；
    在所述显示面板中，所述封装层所在的一面构成所述显示面板的所述出光面。
  13. 根据权利要求12所述的触控显示装置，其中，所述薄膜晶体管层还包括扫描线和数据线，所述扫描线和所述数据线分别与所述薄膜晶体管电性连接，所述扫描线用于向所述薄膜晶体管提供扫描信号，所述数据线用于向所述薄膜晶体管提供数据信号。
  14. 根据权利要求12所述的触控显示装置，其中，所述发光层还包括与所述发光二极管电性连接的像素电极层，所述发光二极管通过所述像素电极层与所述薄膜晶体管电性连接。
  15. 一种触控显示装置的制作方法，其包括以下步骤：
    制作一显示面板，所述显示面板具有一出光面；
    在所述显示面板的出光面上制作第一触控电极；
    制作覆盖所述第一触控电极的第一介电层；
    在所述第一介电层上制作与所述第一触控电极交叉排布的第二触控电极；
    制作覆盖所述第二触控电极的第二介电层。
  16. 根据权利要求15所述的触控显示装置的制作方法，其中，制作所述第一触控电极的方法包括以下步骤：
    采用蒸镀或溅射的方法在所述显示面板的出光面上形成第一导电层；
    采用刻蚀工艺对所述第一导电层图案化处理，形成所述第一触控电极。
  17. 根据权利要求16所述的触控显示装置的制作方法，其中，制作形成的所述第一触控电极包括多个第一菱形电极以及连接相邻所述第一菱形电极的第一线形电极。
  18. 根据权利要求15所述的触控显示装置的制作方法，其中，制作所述第二触控电极的方法包括以下步骤：
    采用蒸镀或溅射的方法在所述第一介电层上形成第二导电层；
    采用刻蚀工艺对所述第二导电层图案化处理，形成所述第二触控电极。
  19. 根据权利要求18所述的触控显示装置的制作方法，其中，制作形成的所述第二触控电极包括多个第二菱形电极以及连接相邻所述第二菱形电极的第二线形电极。
  20. 一种触控显示装置，其包括显示面板，以及设置于所述显示面板出光面上的第一触控电极和第二触控电极，所述第一触控电极和所述第二触控电极彼此交叉且绝缘设置；
    所述第一触控电极包括多个第一菱形电极以及连接相邻所述第一菱形电极的第一线形电极，所述第二触控电极包括多个第二菱形电极以及连接相邻所述第二菱形电极的第二线形电极，所述第一触控电极与所述第二触控电极彼此交叉处分别对应所述第一触控电极中的所述第一线形电极和所述第二触控电极中的所述第二线形电极。
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