WO2021134936A1 - 预制体的纹织图生成方法、装置、电子设备及存储介质 - Google Patents

预制体的纹织图生成方法、装置、电子设备及存储介质 Download PDF

Info

Publication number
WO2021134936A1
WO2021134936A1 PCT/CN2020/081201 CN2020081201W WO2021134936A1 WO 2021134936 A1 WO2021134936 A1 WO 2021134936A1 CN 2020081201 W CN2020081201 W CN 2020081201W WO 2021134936 A1 WO2021134936 A1 WO 2021134936A1
Authority
WO
WIPO (PCT)
Prior art keywords
yarn
warp
preform
weft
initial
Prior art date
Application number
PCT/CN2020/081201
Other languages
English (en)
French (fr)
Inventor
赵谦
孙方方
周海丽
李超
张立泉
郭洪伟
Original Assignee
南京玻璃纤维研究设计院有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 南京玻璃纤维研究设计院有限公司 filed Critical 南京玻璃纤维研究设计院有限公司
Priority to EP20859669.2A priority Critical patent/EP3872672B1/en
Priority to US17/276,483 priority patent/US11408099B2/en
Publication of WO2021134936A1 publication Critical patent/WO2021134936A1/zh

Links

Images

Classifications

    • D—TEXTILES; PAPER
    • D03—WEAVING
    • D03C—SHEDDING MECHANISMS; PATTERN CARDS OR CHAINS; PUNCHING OF CARDS; DESIGNING PATTERNS
    • D03C19/00—Methods or devices concerned with designing or making patterns, not provided for in other groups of this subclass
    • D03C19/005—Electronic
    • D—TEXTILES; PAPER
    • D03—WEAVING
    • D03D—WOVEN FABRICS; METHODS OF WEAVING; LOOMS
    • D03D13/00—Woven fabrics characterised by the special disposition of the warp or weft threads, e.g. with curved weft threads, with discontinuous warp threads, with diagonal warp or weft
    • D03D13/004—Woven fabrics characterised by the special disposition of the warp or weft threads, e.g. with curved weft threads, with discontinuous warp threads, with diagonal warp or weft with weave pattern being non-standard or providing special effects
    • D—TEXTILES; PAPER
    • D03—WEAVING
    • D03D—WOVEN FABRICS; METHODS OF WEAVING; LOOMS
    • D03D25/00—Woven fabrics not otherwise provided for
    • D03D25/005—Three-dimensional woven fabrics
    • D—TEXTILES; PAPER
    • D03—WEAVING
    • D03D—WOVEN FABRICS; METHODS OF WEAVING; LOOMS
    • D03D41/00—Looms not otherwise provided for, e.g. for weaving chenille yarn; Details peculiar to these looms
    • D03D41/004—Looms for three-dimensional fabrics
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00—Computer-aided design [CAD]
    • G06F30/10—Geometric CAD
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2113/00—Details relating to the application field
    • G06F2113/12—Cloth

Definitions

  • This application relates to the field of manufacturing technology, in particular to a method, device, electronic device and storage medium for generating a pattern of a preform.
  • Three-dimensional woven structural composite materials are increasingly favored due to their high specific strength, low density and good formability, and have been successfully applied in the fields of aircraft and automotive engineering.
  • net shape manufacturing is usually achieved through the method of adding or subtracting yarns based on the electronic jacquard system.
  • the number of yarn reduction points and the number of yarn reduction layers are irregular.
  • the number of yarn reduction points for aero engine fan blades is as high as Thousands of points.
  • the weave pattern is directly generated based on the structure of the preform, it is necessary to take each interweaving point of the warp and weft rows in the preform as the object, and obtain the number of warp layers at each interweaving point, The number of weft yarn layers and the positional relationship between warp and weft yarns are used to generate the weave pattern at each interweaving point, so as to realize the generation of the weave pattern of the entire preform.
  • the generation efficiency is low.
  • the organizational structure will change to a certain extent. Therefore, it is more difficult to obtain the organizational structure at each interweaving point, and the possibility of obtaining errors is also greater. As a result, the generation of the weave pattern of the preform is more difficult and more accurate. low.
  • the embodiments of the present application provide a method, device, electronic device, and storage medium for generating a weave pattern of a preform, so as to solve the existing method for generating a weave pattern of a preform with increased or decreased yarns.
  • the problem is that the efficiency is low, the generation is difficult, and the accuracy of the final generated pattern is low.
  • the embodiment of the present application provides a method for generating a texture pattern of a preform, which is characterized in that it comprises the following steps: obtaining the initial structure information of the preform to be prepared; the preform to be prepared includes at least one initial primitive tissue ;
  • the initial structure information includes the number of warp rows and the number of weft rows of the preform to be prepared, and the number of warp rows, the number of warp layers, the number of weft rows, the number of weft layers, and the positions of warp and weft of the initial primitive organization of the preform to be prepared Relationship; generate the initial weave map of the preform to be prepared according to the initial structure information; the pixel values of the pixels in the initial weave map include the first pixel value and the second pixel value, when the warp corresponding to the pixel is in the corresponding weft When it is above, the pixel value of the pixel is the first pixel value.
  • the pixel value of the pixel is the second pixel value; obtain the yarn reduction information of the preform to be prepared;
  • the information includes the actual number of warp layers at the interweaving points of each column of warp yarns and each column of weft yarns in the preform to be prepared and the position of the yarn reduction; the initial weave pattern is adjusted according to the yarn reduction information to obtain the weave pattern of the preform to be prepared .
  • the initial texture map of the preform to be prepared is generated, and then Then, according to the actual warp layers at the interweaving points of each row of warp yarns and each row of weft yarns of the preform to be prepared and the yarn reduction information such as the yarn reduction position, the initial weave map can be adjusted based on the yarn reduction information.
  • the preform to be prepared includes at least two initial primitive structures; the initial structure information also includes the intersection of each row of warp yarns and each row of weft yarns of the preform to be prepared Primitive organization type.
  • the step of adjusting the initial weave pattern according to the yarn reduction information to obtain the weave pattern of the preform to be prepared includes: obtaining The actual number of warp layers at the interlacing point of a row of warp yarns to be reduced and a row of weft yarns to be reduced in the preform to be prepared; the interlacing point is determined according to the actual number of warp layers and the positional relationship between the warp yarns and the weft yarns in the initial structure information The actual number of weft yarn layers; the initial weave pattern is adjusted according to the actual number of warp yarn layers, the actual number of weft yarn layers and the yarn reduction position information to obtain the weave pattern of the preform to be prepared.
  • the yarn reduction position information includes warp yarn reduction start position information and weft yarn reduction start position Information
  • the starting position of warp yarn reduction is any layer of warp yarn except the first layer of warp yarn and the last layer of warp yarn
  • the starting position of weft yarn reduction is the first layer of weft yarn or the last layer of weft yarn.
  • the initial weave pattern is adjusted according to the actual number of warp yarn layers, the actual number of weft yarn layers and the yarn reduction position information to obtain the weave pattern of the preform to be prepared
  • the steps of the drawing include: determining the layer of weft to be reduced at the weaving point to be reduced according to the actual number of weft layers, the number of weft layers of the initial primitive organization, and the starting position of the weft yarn reduction; obtaining the initial weave map and the weft yarn layer to be reduced
  • the first row to be subtracted corresponding to the layer and the first column to be subtracted corresponding to each layer of warp yarns in the column to be subtracted, and the pixel values of the pixel points of each first column to be subtracted in the first row to be subtracted are equalized Set to the first pixel value or the second pixel value; determine the warp layer to be reduced at the interlace point to be reduced according to the actual number of warp layers, the number of warp layers of
  • the number of rows occupied by the row of weft yarns to be reduced in the weave pattern is the actual weaving point of the row of weft yarns to be reduced and each warp yarn column to be reduced.
  • the maximum value of the number of weft layers; the step of adjusting the initial weave pattern according to the actual number of warp layers, the actual number of weft layers and the position information of the reduced yarn to obtain the weave pattern of the preform to be prepared also includes:
  • the pixel values of the pixels in the rows corresponding to the column of weft yarns to be reduced that are more than the actual number of weft yarn layers in the column of weft yarns to be reduced are all the first pixel value or the second pixel value.
  • an embodiment of the present application provides a weave pattern generating device for a preform, including: a structure information acquisition module for acquiring initial structure information of the preform to be prepared; the initial structure information includes the information of the preform to be prepared The number of warp rows and weft rows, as well as the number of warp rows, warp layers, weft rows, weft layers, and the positional relationship between warp and weft of the initial primitive weave of the preform to be prepared; the initial weave map generation module is used To generate the initial weave map of the preform to be prepared according to the initial structure information; the pixel values of the pixels in the initial weave map include the first pixel value and the second pixel value, when the warp corresponding to the pixel is above the corresponding weft When the pixel value is the first pixel value, when the warp corresponding to the pixel is below the corresponding weft, the pixel value of the pixel is the second pixel value; the subtraction information acquisition module is used to acquire the preform to be
  • an embodiment of the present application provides an electronic device, including: a memory and a processor, the memory and the processor are communicatively connected to each other, computer instructions are stored in the memory, and the processor By executing the computer instructions, the method for generating the weave pattern of the preform described in the first aspect or any one of the implementations of the first aspect is executed.
  • an embodiment of the present application provides a computer-readable storage medium that stores computer instructions for causing the computer to execute the first aspect or any of the first aspects.
  • FIG. 1 is a method flowchart of a method for generating a pattern of a preform according to an embodiment of the application
  • Figures 2A-2D are respectively a front view, a side view, a front view and a perspective view of a preform to be prepared;
  • Figure 3A-3D is a schematic diagram of the structure of an initial primitive organization
  • 4A-4B are schematic diagrams of another initial primitive organization structure
  • Figures 5A-5B are structural schematic diagrams of another initial primitive organization
  • Figure 6 is a weave diagram of the 6th row of weft yarns in the preform to be prepared in Figures 2A-2D;
  • Fig. 7 is a texture diagram of the preform to be prepared in Fig. 2A-Fig. 2D;
  • FIG. 8 is a flowchart of specific steps of step S104 in FIG. 1;
  • FIG. 9 is a flowchart of specific steps of step S803 in FIG. 8;
  • Fig. 10 is a weave diagram of the interweaving points of the 7th column of warp yarns and the 15th column weft yarns in the preform to be prepared in Figs. 2A-2D;
  • FIG. 11 is a schematic block diagram for generating a pattern of a preform provided by an embodiment of the application.
  • FIG. 12 is a schematic diagram of the hardware structure of an electronic device provided by an embodiment of the application.
  • Fig. 1 shows a flowchart of a method for generating a pattern of a preform according to an embodiment of the present application. As shown in Fig. 1, the method may include the following steps:
  • the preform to be prepared includes at least one initial primitive structure
  • the initial structure information includes the number of warp rows and weft rows of the preform to be prepared, and the number of warp rows of the initial primitive structure of the preform to be prepared , The number of warp yarn layers, the number of weft yarn rows, the number of weft yarn layers and the positional relationship between the warp yarn and the weft yarn.
  • the number of warp rows of the preform to be prepared is the longest point of the preform to be prepared (the above example is used )
  • the line segment AB in Figure 2A is the number of warp rows at the longest point of the preform to be prepared, and the number of weft rows in the preform to be prepared is the widest point of the preform to be prepared (follow the above example, in Figure 2A
  • the line segment CD of is the widest point of the preform to be prepared).
  • the initial primitive structure is the smallest unit used to indicate the positional relationship between the warp and weft yarns in the preform to be prepared, and at the same time, the number of warp layers in the initial primitive structure and The number of weft yarn layers is the number of warp yarn layers and the number of weft yarn layers at the thickest part of the preform to be prepared. Therefore, the number of warp yarn layers at the intersection of each warp yarn row and each weft yarn row in the preform to be prepared is less than or equal to the initial base.
  • the number of warp yarn layers in the meta-organization, the number of weft yarn layers at the interweaving points of each warp yarn row and each weft yarn row in the preform to be prepared are all less than or equal to the number of weft yarn layers in the initial primitive structure.
  • the method for generating the weave pattern of the preform only involves yarn reduction and not yarn increase. However, those skilled in the art should understand that the method in the embodiments of the present application can be deduced in the reverse direction to obtain the corresponding method of yarn increase.
  • the method of preparing the weave pattern of the preform is not be deduced in the reverse direction to obtain the corresponding method of yarn increase.
  • the initial primitive structure is the smallest unit used to express the positional relationship between the warp and weft yarns in the preform to be prepared, it is not required that the primitive structures included in the preform to be prepared are all
  • the complete primitive structure specifically, still take the preform to be prepared shown in Figures 2A-2D as an example.
  • the preform to be prepared has 12 rows of warp yarns and 15 rows of weft yarns.
  • the preform to be prepared The initial primitive structure for preparing the preform may be an initial primitive structure with 4 rows of warp yarns and 4 rows of weft yarns.
  • the preform to be prepared may include only one kind of initial primitive tissue, or it may include two or more kinds of initial primitive tissues.
  • the preform to be prepared may only include as shown in FIG. 3A- Figure 3D shows an initial elementary structure (hereinafter referred to as initial elementary structure 1), in which the solid line represents warp yarns and the oval represents weft yarns.
  • the initial elementary structure 1 includes 4 rows of warp yarns and 4 rows of weft yarns.
  • Each column of warp yarns includes 3 layers, and each column of weft yarns includes 4 layers.
  • FIG. 3A to 3D is the extending direction of the weft yarn row, the Y-axis direction is the extending direction of the warp yarn row, and the Z-axis direction is the warp yarn layer. And the extending direction of the weft yarn layer, Figure 3A shows the structure of the initial elementary structure 1 when the surface of the first row of warp yarns is used as a cross-section, and Figure 3B shows the structure of the initial elementary structure 1 when the surface of the second row of warp yarns is used as the cross-section, Figure 3C shows the structure of the initial primitive structure 1 when the surface of the warp yarns in the third row is used as a cross-section, and Figure 3D shows the structure of the initial primitive structure 1 when the warp yarns of the fourth row are used as the cross-section.
  • the preform to be prepared may include, in addition to the above-mentioned initial primitive organization 1, the initial primitive organization shown in FIGS. 4A-4B (hereinafter referred to as initial primitive organization 2), and the initial primitive organization 2 shown in FIGS. 5A-5B.
  • the initial elementary structure shown below (hereinafter referred to as the initial elementary structure 3), in which the solid line represents the warp yarn, the ellipse represents the weft yarn, and the X-axis direction in Figures 4A-4B and Figure 5A-5B are the weft threads
  • the direction of extension, the Y-axis direction is the extension direction of the warp yarn row, and the Z-axis direction is the extension direction of the warp yarn layer and the weft yarn layer.
  • the initial primitive structure 2 includes 2 rows of warp yarns and 2 rows of weft yarns, and each row of warp yarns includes 3
  • Each row of weft yarns includes 4 layers:
  • Figure 4A shows the structure of the initial primitive weave 2 with the side of the first column warp as the cross section
  • Figure 4B shows the initial primitive weave 2 with the side of the second column warp as the cross-section.
  • the initial primitive structure 3 includes 2 rows of warp yarns, 2 rows of weft yarns, each row of warp yarns includes 3 layers
  • each row of weft yarns includes 4 layers:
  • Figure 5A shows the initial primitive structure 5 with the first row of warp yarns on the side
  • FIG. 5B shows the structure of the initial primitive structure 5 with the side of the second row of warp yarns as the cross-section.
  • each row of warp yarns in the initial elementary structure includes 3 layers of warp yarns, and each row of weft yarns includes 4 layers of weft yarns.
  • each row of warp yarns in the initial elementary structure includes 3 layers of warp yarns, and each row of weft yarns includes 4 layers of weft yarns.
  • the thickest part of the preform to be prepared The number of warp yarn layers is generally greater than 3 layers, and the number of weft yarn layers is generally greater than 4 layers, and based on the regularity of the structure of the initial primitive weaves 1, 2 and 3.
  • S102 Generate an initial texture pattern of the preform to be prepared according to the initial structure information.
  • the pixel value of the pixel in the initial texture image includes the first pixel value and the second pixel value.
  • the pixel value of the pixel is the first pixel value.
  • the pixel value of the pixel point is the second pixel value.
  • the knot information of the preform to be prepared also includes the interweaving of each row of warp yarns and each row of weft yarns of the preform to be prepared The primitive organization type at the point.
  • the preform to be prepared includes three initial primitive tissues 1, 2 and 3, the preform is to be prepared
  • the preform is to be prepared
  • the number of warp rows of the preform to be prepared the number of weft rows, and the intersection of each row of warp yarns (total 12 rows: J1 ⁇ J12) and each row of weft yarns (total 15 rows: W1 ⁇ W15)
  • the primitive organization type can be expressed in the form of Table 1:
  • the method for generating the initial weave pattern can be any existing method that can generate the corresponding weave pattern according to the structural information of the preform to be prepared, and there is no limitation here.
  • the yarn reduction information includes the actual number of warp layers and yarn reduction position information at the interweaving points of each row of warp yarns and each row of weft yarns in the preform to be prepared.
  • the structure of the preform to be prepared is shown in Figure 2A-2D, and the preform to be prepared includes three initial primitive tissues 1, 2 and 3, the structure of the preform to be prepared
  • the number of warp rows of the preform to be prepared (12 rows in total: J1 ⁇ J12), the number of weft rows (15 rows in total: W1 ⁇ W15) and the primitive weave type at the intersection of each row of warp yarn and each row of weft yarn
  • Table 1 the actual number of warp layers at the intersection of each column of warp yarns and each column of weft yarns in the yarn reduction information can be as shown in Table 2:
  • the number of weft yarn layers in the initial primitive structure is related to the number of warp yarn layers, and the number of weft yarn layers and the number of warp yarn layers can be obtained according to the positional relationship between the warp yarns and the weft yarns in various initial primitive groups.
  • the actual number of weft layers at the interweaving points of each column of warp yarns and each column of weft yarns can be obtained according to the actual number of layers of warp yarns at the corresponding interweaving points.
  • initial elementary structure 1 initial elementary structure 2 and initial elementary structure In the element weave 3, the actual number of layers of weft yarns at the interweaving points of each row of warp yarns and each row of weft yarns is one more layer than the actual number of layers of warp yarns at the corresponding interweaving point.
  • the yarn reduction position information may include warp yarn reduction start position information and weft yarn reduction start position information.
  • the starting position of warp yarn reduction can be any layer of warp yarns in a row of warp yarns.
  • the warp yarn reduction starting position information can be any one except the first layer of warp yarns and the last layer of warp yarns.
  • the layer warp yarn for example, the starting position of the warp yarn reduction may be the second layer warp yarn or the penultimate layer warp yarn.
  • the starting position of warp yarn reduction can also be more than one.
  • both the second layer of warp yarns and the penultimate layer of warp yarns can be used as the starting position of warp yarn reduction.
  • the starting position of the weft yarn reduction can also be any layer of weft yarn in a row of weft yarns.
  • the starting position of the weft yarn reduction can be the first layer of weft yarn or the last layer of weft yarn, which is implemented in this application.
  • the first layer of weft yarn and the last layer of weft yarn can also be used as the starting position of warp yarn reduction.
  • the starting position of each weft yarn reduction is reduced by half. Weft reduction layer (if the weft yarn layer to be reduced is an odd number, the starting position of one of the weft yarn reduction yarns will be reduced by one more layer).
  • the yarn reduction position information also includes warp yarn reduction direction information and weft yarn reduction direction information.
  • the warp yarn reduction direction information can be determined according to the warp yarn reduction start position information, for example, when the warp yarn is reduced When the starting position is the second layer of warp, the warp reduction direction is toward the last layer of warp.
  • the warp reduction starting position is the penultimate layer of warp, the warp reduction direction is toward the first layer of warp;
  • the direction information of the weft yarn reduction can also be determined according to the weft yarn reduction start position information.
  • the weft yarn reduction start position is the first layer of weft
  • the weft yarn reduction direction is toward the last layer of weft.
  • the weft reduction direction is toward the first layer of weft.
  • first layer of warp yarns and the last layer of warp yarns respectively refer to the two outermost warps in a row of warp yarns.
  • first layer of warp yarns is the first layer of warp yarns
  • second The outermost layer of warp yarns is the last layer of warp yarns
  • first layer of weft yarns and the last layer of weft yarns refer to the two outermost layers of weft yarns in a row of weft yarns; here, the first layer and the last layer are both It should not constitute other limitations to the embodiments of the present application.
  • S104 Adjust the initial weave pattern according to the yarn reduction information to obtain the weave pattern of the preform to be prepared.
  • the warp yarn layer A is lifted above all weft yarns or below all weft yarns , That is, the pixel values of a column of pixels corresponding to the warp layer A among all the pixels in the initial weave map corresponding to the interweaving point A are set to the first pixel value or the second pixel value, Specifically, when the warp yarn layer A is close to the first layer of warp yarns in the interweaving point A, the warp yarn layer A can be lifted above all the weft yarns, and accordingly, all the pixels corresponding to the interweaving point A in the initial weave pattern In, the pixel value of a column of pixels corresponding to the warp yarn layer A is set to the first pixel value; when the warp yarn layer A is close to the last layer of warp yarns in the inter
  • the initial pattern Among all the pixels in the weave map corresponding to the interweaving point B, a row of pixels corresponding to the weft yarn layer B is set as the first pixel or the second pixel; at the same time, when the weft yarn column B is interweaving with all the warp yarn columns At the point, the weft layer B is subtracted, that is, the pixel values of all pixels in the row corresponding to the weft layer B in the initial weave map will be set to the first pixel or the second pixel, then Delete the row corresponding to the weft layer B in the initial weave pattern.
  • the starting position of yarn reduction is the first layer of weft, and according to Table 1, it can be seen that the weaving point of the 6th row of weft yarns (W6) and the 1st row of warp yarns to the 12th row of warp yarns (J1 ⁇ J12)
  • the number of warp yarn layers are 0,3,3,4,6,7,7,7,7,6,0,0.
  • the number of weft yarn layers at each weaving point are: 0,4,4,5 ,7,8,8,8,8,7,0,0 (The number of weft yarn layers is one more layer than the number of warp yarn layers, but those skilled in the art should understand that when the number of warp yarn layers is 0, the number of weft yarn layers is also Is 0), and the number of weft layers in the initial primitive structure is 10 layers.
  • the first layer of warp yarn and the second layer of warp yarn in the 6th column of weft yarns are subtracted at all the interweaving points, that is, the 6th column
  • the pixel values of the first layer of warp yarn and the second layer of the weft yarn in the initial weave map are the first pixel value or the second pixel value, and the corresponding row can be deleted.
  • the adjusted 6th column weft yarn position The corresponding weave pattern is shown in Figure 6, where w3 ⁇ w10 refer to the 3rd layer to the 10th layer of the weft yarn in the initial primitive; the weave pattern of the preform to be prepared after adjustment is shown in Figure 7
  • the pixel value of the pixel is the first pixel value in Figures 6 and 7
  • the pixel is black (in order to facilitate the display of the boundary of the pixel, black circles are used in Figures 6 and 7 Dots are shown instead of black color blocks)
  • the pixel value of the pixel is the second pixel value, the pixel is white as an example.
  • the preform to be prepared is generated by first according to the structural information of the preform to be prepared, especially the structure information of the initial primitive organization (the primitive organization when the yarn is not reduced) in the preform to be prepared Then, according to the actual warp layers at the interweaving point of each column of warp yarn and each column of weft yarn and the yarn reduction position and other yarn reduction information obtained from the obtained preform to be prepared, the initial weave map is subtracted based on The adjustment of the yarn information can realize the integrated automatic generation of the weave pattern of the preform to be prepared with a complex structure that needs to be reduced, without the need to separately obtain the weave structure at each interlacing point of the preform to be prepared and generate each in turn.
  • the weave pattern at the interweaving point is combined to form the weave pattern of the entire preform to be prepared.
  • the generation efficiency of the weave pattern is relatively high, and since the weave structure of each interweaving point after yarn reduction will produce certain changes, so , It is more difficult to obtain the organizational structure at each interweaving point, and the possibility of obtaining errors is also greater. Therefore, the method for generating the weave pattern of the preform without obtaining the organizational structure at each interlacing point is less difficult to implement. And the accuracy of the generated weave map is relatively high.
  • step S104 may include the following steps:
  • S801 Obtain the actual number of layers of warp yarns at the to-be-reduced interlacing point of a row of warp yarns to be reduced and a row of weft yarns to be reduced in the preform to be prepared.
  • the preform to be prepared can be The body's yarn reduction information (as shown in Table 2) can obtain the actual number of warp yarn layers at the to-be-reduced interlacing point as 5 layers.
  • S802 Determine the actual number of weft yarn layers at the interweaving point according to the actual number of warp yarn layers and the positional relationship between the warp yarn and the weft yarn in the initial structure information.
  • the number of weft yarns at each interlacing point in the preform to be prepared is one more layer than the number of warp yarns. Therefore, the actual number of weft layers at the interlacing point to be reduced is 6 layers.
  • S803 Adjust the initial weave pattern according to the actual warp yarn layer number, the actual weft yarn layer number and the yarn reduction position information to obtain the weave pattern of the preform to be prepared.
  • the number of reduced yarn layers in the warp row to be reduced can be obtained according to the actual number of warp yarn layers and the number of warp layers in the initial primitive structure, and the number of reduced yarn layers in the warp yarn row to be reduced and the number of reduced
  • the starting position of the warp yarn minus in the yarn position information can be used to obtain the specific warp yarn layer that needs to be subtracted from the number of warp yarn layers to be reduced; according to the actual number of weft yarn layers and the number of weft yarn layers in the initial primitive structure, the weft yarn to be reduced can be obtained
  • the number of yarn reduction layers in the column, and the specific weft yarn layer that needs to be subtracted from the number of weft yarn layers to be reduced can be obtained according to the number of yarn reduction layers in the weft yarn column to be reduced and the start position information of the weft yarn reduction in the yarn reduction position information.
  • the initial weave pattern can be adjusted to obtain the weave map of the preform to be prepared.
  • step S803 may include the following steps:
  • S901 Determine the layer of weft yarn to be reduced at the weaving point to be reduced according to the actual number of weft yarn layers, the number of weft yarn layers of the initial primitive organization, and the starting position of the weft yarn reduction yarn.
  • the warp yarn to be reduced is the 7th column of the warp yarn in the preform to be prepared
  • the weft yarn to be reduced is the weft yarn in the 15th column of the preform to be prepared
  • the actual number of weft yarns is 6 layers (compared to the actual warp yarn layer).
  • the number of weft yarn layers of the initial primitive organization is 10 layers
  • the starting position information of the weft yarn reduction is the first layer of weft yarn. Therefore, the weft yarn layer to be reduced at the interlace point to be reduced is the first ⁇ 4 layers of weft.
  • S902 Obtain the first row to be reduced corresponding to the layer of weft yarn to be reduced and the first row to be reduced corresponding to each layer of warp yarn in the column of warp yarns to be reduced, and compare each row in the first row to be reduced
  • the pixel values of the pixels in the first column to be subtracted are all set to the first pixel value or the second pixel value.
  • the number of rows occupied by the weft yarn column to be reduced in the weave pattern can be set as the number of weft yarn columns to be reduced and the warp yarn columns to be reduced.
  • the maximum value of the actual number of weft yarn layers at the interlacing point, correspondingly, in this step, the rows in the weave pattern corresponding to the row of weft yarns to be reduced are more than the actual number of weft yarn layers in the row of weft yarns to be reduced
  • the pixel values of the pixels are the first pixel value or the second pixel value.
  • the maximum value of the actual number of weft layers at the interweaving point of the 15th row of weft yarns and each row of warp yarns to be reduced (J1 ⁇ J12) is 6, then as shown in Figure 10, the interweaving point to be reduced is in the weave
  • the corresponding pixel points in the figure are 6 rows.
  • the pixel point when the pixel value of the pixel point is also used as the first pixel value in FIG. 10, the pixel point is black. Black dots are used instead of black color blocks for illustration.
  • the pixel value of the pixel point is the second pixel value, the pixel point is white as an example.
  • S903 Determine the warp layer to be reduced at the interlace point to be reduced according to the actual number of warp layers, the number of warp layers of the initial primitive organization, and the starting position of the warp yarn reduction.
  • the warp to be reduced is listed as the 7th column of warp yarns in the preform to be prepared, and the weft to be reduced is listed as the 15th column of weft yarns in the preform to be prepared
  • the actual number of warp layers is 5, and the initial primitive
  • the number of weft yarn layers in the organization is 9 layers
  • the starting position of warp yarn reduction includes the second layer of warp yarn and the penultimate layer of weft yarn.
  • the warp yarn layers are the second layer of warp yarns, the third layer of warp yarns, the seventh layer of warp yarns and the eighth layer of warp yarns.
  • S904 Obtain the second row to be reduced corresponding to the warp yarn layer to be reduced and the second row to be reduced corresponding to each layer of the weft yarn in the weft yarn column to be reduced, and set each of the second row to be reduced
  • the pixel values of the pixels of the second row to be subtracted are all set to the first pixel value or the second pixel value.
  • the pixel values of the second and third columns in Figure 10 are the first pixel value (pixels are black circles). Point), the pixel values of the pixels in the 7th column and the 8th column in FIG. 10 are both the second pixel value (the pixel points are white).
  • FIG. 11 shows a remote block diagram of a device for generating a texture pattern of a preform according to an embodiment of the present application.
  • the device can be used to realize the texture pattern generation of the preform described in Embodiment 1 or any of its optional implementations. method.
  • the device includes: a structure information acquisition module 10, an initial pattern generation module 20, a yarn reduction information acquisition module 30, and a pattern generation module 40. among them,
  • the structure information acquiring module 10 is used to acquire the initial structure information of the preform to be prepared.
  • the initial structure information includes the number of warp rows and weft rows of the preform to be prepared, and the number of warp rows, warp layers, weft rows, and weft layers of the initial primitive structure of the preform to be prepared And the positional relationship between warp and weft.
  • the initial pattern generating module 20 is used to generate the initial pattern of the preform to be prepared according to the initial structure information.
  • the pixel value of the pixel in the initial texture image includes the first pixel value and the second pixel value.
  • the pixel value of the pixel is the first pixel value.
  • the pixel value of the pixel point is the second pixel value.
  • the yarn reduction information acquisition module 30 is used to acquire the yarn reduction information of the preform to be prepared.
  • the yarn reduction information includes the actual number of warp layers and yarn reduction position information at the interweaving points of each row of warp yarns and each row of weft yarns in the preform to be prepared.
  • the pattern generating module 40 is used to adjust the initial pattern according to the yarn reduction information to obtain the pattern of the preform to be prepared.
  • the electronic device may include a processor 1201 and a memory 1202.
  • the processor 1201 and the memory 1202 may be connected by a bus or other means. Connect as an example.
  • the processor 1201 may be a central processing unit (CPU).
  • the processor 1201 may also be other general-purpose processors, digital signal processors (Digital Signal Processor, DSP), Application Specific Integrated Circuit (ASIC), Field-Programmable Gate Array (Field-Programmable Gate Array, FPGA), or Chips such as other programmable logic devices, discrete gates or transistor logic devices, discrete hardware components, or a combination of the above types of chips.
  • DSP Digital Signal Processor
  • ASIC Application Specific Integrated Circuit
  • FPGA Field-Programmable Gate Array
  • Chips such as other programmable logic devices, discrete gates or transistor logic devices, discrete hardware components, or a combination of the above types of chips.
  • the memory 1202 can be used to store non-transitory software programs, non-transitory computer executable programs, and modules, such as the method for generating a texture pattern of a prefabricated body in Embodiment 1 of the present application.
  • the processor 1201 executes various functional applications and data processing of the processor by running non-transitory software programs, instructions, and modules stored in the memory 1202, that is, realizes the method for generating the texture pattern of the prefabricated body in the foregoing method embodiment.
  • the memory 1202 may include a program storage area and a data storage area.
  • the program storage area may store an operating system and an application program required by at least one function; the data storage area may store data created by the processor 1201 and the like.
  • the memory 1202 may include a high-speed random access memory, and may also include a non-transitory memory, such as at least one magnetic disk storage device, a flash memory device, or other non-transitory solid-state storage devices.
  • the memory 1202 may optionally include memories remotely provided with respect to the processor 1201, and these remote memories may be connected to the processor 1201 through a network. Examples of the aforementioned networks include, but are not limited to, the Internet, corporate intranets, local area networks, mobile communication networks, and combinations thereof.
  • the one or more modules are stored in the memory 1202, and when executed by the processor 1201, the method for generating the weave pattern of the preform in the embodiment shown in FIGS. 1 to 9 is executed.
  • the program can be stored in a computer-readable storage medium. During execution, it may include the procedures of the above-mentioned method embodiments.
  • the storage medium can be a magnetic disk, an optical disc, a read-only memory (Read-Only Memory, ROM), a random access memory (RAM), a flash memory (Flash Memory), a hard disk (Hard Disk Drive, abbreviation: HDD) or solid-state drive (Solid-State Drive, SSD), etc.; the storage medium may also include a combination of the foregoing types of memories.

Landscapes

  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Theoretical Computer Science (AREA)
  • Pure & Applied Mathematics (AREA)
  • Mathematical Optimization (AREA)
  • Computer Hardware Design (AREA)
  • Evolutionary Computation (AREA)
  • General Engineering & Computer Science (AREA)
  • Mathematical Analysis (AREA)
  • Computational Mathematics (AREA)
  • Woven Fabrics (AREA)

Abstract

一种预制体的纹织图生成方法、装置、电子设备及存储介质，该方法包括：获取待制备预制体的初始结构信息；根据初始结构信息生成待制备预制体的初始纹织图；初始纹织图中的像素点的像素值包括第一像素值和第二像素值，当像素点对应的经纱在对应的纬纱的上方时，像素点的像素值为第一像素值，当像素点对应的经纱在对应的纬纱下方时，像素点的像素值为第二像素值；获取待制备预制体的减纱信息；减纱信息包括待制备预制体中各列经纱和各列纬纱的交织点处的实际经纱层数以及减纱位置信息；根据减纱信息对初始纹织图进行调整，得到待制备预制体的纹织图。

Description

预制体的纹织图生成方法、装置、电子设备及存储介质 技术领域
本申请涉及制造技术领域，尤其涉及到预制体的纹织图生成方法、装置、电子设备及存储介质。
背景技术
三维机织结构复合材料因其高比强度、低密度及良好成型性等优点受到越来越多的青睐，在飞机和汽车工程等领域已经取得成功应用。目前，对于结构及形面复杂的大变厚度预制体，通常通过基于电子提花系统的增减纱的方法实现净成型制造。但是，由于结构及形面复杂的变厚度预制体中的减纱点一般数量较为庞大，减纱位置及减纱层数无一定规律，例如，航空发动机风扇叶片，其减纱点数量多达上千个点，因此，若直接根据预制体的结构生成纹织图，则需要以预制体中的经纱列和纬纱列的每一个交织点处为对象，逐一获取各个交织点处的经纱层数、纬纱层数以及经纱和纬纱的位置关系，生成各个交织点处的纹织图，从而实现整个预制体的纹织图生成，生成效率较低，且由于每个做了减纱后交织点处的组织结构均会产生一定的改变，因此，获取各个交织点处的组织结构的难度较大，获取出错的可能性也较大，从而，使得预制体的纹织图生成难度较大，准确性较低。
发明内容
有鉴于此，本申请实施例提供了一种预制体的纹织图生成方法、装置、电子设备及存储介质，以解决现有的存在增减纱的预制体的纹织图的生成方法，生成效率较低、生成难度较大，且最终生成的纹织图的准确性较低的问题。
根据第一方面，本申请实施例提供了预制体的纹织图生成方法，其特征在于，包括如下步骤：获取待制备预制体的初始结构信息；待制备预制体包括至少一种初始基元组织；初始结构信息包括待制备预制体的经纱列数和纬纱列数，以及待制备预制体的初始基元组织的经纱列数、经纱层数、纬纱列数、纬纱层数以及经纱和纬纱的位置关系；根据初始结构信息生成待制备预制体的初始纹织图；初始纹织图中的像素点的像素值包括第一像素值和第二像素值，当像素点对应的经纱在对应的纬纱的上方时，像素点的像素值为第一像素值，当像素点对应的经纱在对应的纬纱下方时，像素点的像素值为第二像素值；获取待制备预制体的减纱信息；减纱信息包括待制备预制体中各列经纱和各列纬纱的交织点处的实际经纱层数以及减纱位置信息；根据减纱信息对初始纹织图进行调整，得到待制备预制体的纹织图。
通过首先根据待制备预制体的结构信息，特别是待制备预制体中的初始基元组织(未经过减纱时的基元组织)的结构信息，生成待制备预制体的初始纹织图，然后再根据获取到的待制备预制体的各列经纱和各列纬纱的交织点处的实际经纱层数以及减纱位置等减纱信息，对初始纹织图进行基于减纱信息的调整，能够实现对需要进行减纱的结构较为复杂的待制备预制体的纹织图的整体性自动生成，而无需单独获取待制备预制体各个交织点处的组织结构并依次生成各个交织点处的纹织图，从而组合形成整个待制备预制体的纹织图，纹织图的生成效率较高，而由于每个交织点减纱后的组织结构均会产生一定的改变，因此，获取各个交织点处的组织结构的难度较大，获取出错的可能性也较大，因此，该无需获取各个交织点处的组织结构的预制体的纹织图生成方法的实现难度较低，且生成的纹织图的准确性较高。
结合第一方面，在第一方面第一实施方式中，待制备预制体包括至少两种初始基元组织；初始 结构信息还包括待制备预制体的各列经纱与各列纬纱的交织点处的基元组织类型。
结合第一方面或者第一方面第一实施方式，在第一方面第二实施方式中，根据减纱信息对初始纹织图进行调整，得到待制备预制体的纹织图的步骤，包括：获取待制备预制体中的一待减经纱列和一待减纬纱列的待减交织点处的实际经纱层数；根据实际经纱层数以及初始结构信息中的经纱和纬纱的位置关系确定交织点处的实际纬纱层数；根据实际经纱层数、实际纬纱层数和减纱位置信息对初始纹织图进行调整，得到待制备预制体的纹织图。
结合第一方面或者第一方面第一实施方式或者第一方面第二实施方式，在第一方面第三实施方式中，减纱位置信息包括经纱减纱起始位置信息和纬纱减纱起始位置信息，经纱减纱起始位置为除第一层经纱和最后一层经纱以外的任意一层经纱，纬纱减纱起始位置为第一层纬纱或者最后一层纬纱。
结合第一方面第三实施方式，在第一方面第四实施方式中，根据实际经纱层数、实际纬纱层数和减纱位置信息对初始纹织图进行调整，得到待制备预制体的纹织图的步骤，包括：根据实际纬纱层数、初始基元组织的纬纱层数以及纬纱减纱起始位置信息确定待减交织点处的待减纬纱层；获取初始纹织图中与待减纬纱层相对应的第一待减行以及与待减经纱列中的各层经纱对应的第一待减列，并将第一待减行中的各个第一待减列的像素点的像素值均设置为第一像素值或者第二像素值；根据实际经纱层数、初始基元组织的经纱层数以及经纱减纱起始位置信息确定待减交织点处的待减经纱层；获取初始纹织图中与待减经纱层相对应的第二待减列以及与待减纬纱列中的各层纬纱对应的第二待减行，并将第二待减列中的各个第二待减行的像素点的像素值均设置为第一像素值或者第二像素值。
结合第一方面第四实施方式，在第一方面第五实施方式中，待减纬纱列在纹织图中所占的行数为待减纬纱列与各个待减经纱列的交织点处的实际纬纱层数中的最大值；根据实际经纱层数、实际纬纱层数和减纱位置信息对初始纹织图进行调整，得到待制备预制体的纹织图的步骤，还包括：将纹织图中与待减纬纱列所对应的行中多于待减纬纱列的实际纬纱层数的行的像素点的像素值均为第一像素值或者第二像素值。
根据第二方面，本申请实施例提供了一种预制体的纹织图生成装置，包括：结构信息获取模块，用于获取待制备预制体的初始结构信息；初始结构信息包括待制备预制体的经纱列数和纬纱列数，以及待制备预制体的初始基元组织的经纱列数、经纱层数、纬纱列数、纬纱层数以及经纱和纬纱的位置关系；初始纹织图生成模块，用于根据初始结构信息生成待制备预制体的初始纹织图；初始纹织图中的像素点的像素值包括第一像素值和第二像素值，当像素点对应的经纱在对应的纬纱的上方时，像素点的像素值为第一像素值，当像素点对应的经纱在对应的纬纱下方时，像素点的像素值为第二像素值；减纱信息获取模块，用于获取待制备预制体的减纱信息；减纱信息包括待制备预制体中各列经纱和各列纬纱的交织点处的实际经纱层数以及减纱位置信息；纹织图生成模块，用于根据减纱信息对初始纹织图进行调整，得到待制备预制体的纹织图。
根据第三方面，本申请实施例提供了一种电子设备，包括：存储器和处理器，所述存储器和所述处理器之间互相通信连接，所述存储器中存储有计算机指令，所述处理器通过执行所述计算机指令，从而执行第一方面或者第一方面的任意一种实施方式中所述的预制体的纹织图生成方法。
根据第四方面，本申请实施例提供了一种计算机可读存储介质，所述计算机可读存储介质存储计算机指令，所述计算机指令用于使所述计算机执行第一方面或者第一方面的任意一种实施方式中所述的预制体的纹织图生成方法。
附图说明
为了更清楚地说明本申请具体实施方式或现有技术中的技术方案，下面将对具体实施方式或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图是本申请的一些实施方式，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本申请实施例提供的一种预制体的纹织图生成方法的一种方法流程图；
图2A-图2D分别为一种待制备预制体的主视图、侧视图、前视图和立体图；
图3A-图3D为一种初始基元组织的结构示意图；
图4A-图4B为另一种初始基元组织的结构示意图；
图5A-图5B为另一种初始基元组织的结构示意图；
图6为图2A-图2D中的待制备预制体中的第6列纬纱的纹织图；
图7为图2A-图2D中的待制备预制体的纹织图；
图8为图1中的步骤S104的具体步骤流程图；
图9为图8中的步骤S803的具体步骤流程图；
图10为图2A-图2D中的待制备预制体中的第7列经纱第15列纬纱的交织点的纹织图；
图11为本申请实施例提供的一种预制体的纹织图生成的原理框图；
图12为本申请实施例提供的一种电子设备的硬件结构示意图。
具体实施方式
为使本申请实施例的目的、技术方案和优点更加清楚，下面将结合本申请实施例中的附图，对本申请实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例是本申请一部分实施例，而不是全部的实施例。基于本申请中的实施例，本领域技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本申请保护的范围。
在本申请的描述中，需要说明的是，术语“第一”、“第二”、“第三”仅用于描述目的，而不能理解为指示或暗示相对重要性。
实施例1
图1示出了本申请实施例的预制体的纹织图生成方法的流程图，如图1所示，该方法可以包括如下步骤：
S101：获取待制备预制体的初始结构信息。
在本实施例中，待制备预制体包括至少一种初始基元组织，初始结构信息包括待制备预制体的经纱列数和纬纱列数，以及待制备预制体的初始基元组织的经纱列数、经纱层数、纬纱列数、纬纱层数以及经纱和纬纱的位置关系。
在本申请实施例中，若待制备预制体为如图2A-2D所示的形状不规则的预制体，则待制备预制体的经纱列数为该待制备预制体的最长处(沿用上例，图2A中的线段AB处为该待制备预制体的最长处)的经纱的列数，待制备预制体的纬纱列数为该待制备预制体的最宽处(沿用上例，图2A中的线段CD处为该待制备预制体的最宽处)。
在本申请实施中，需要说明的是，初始基元组织是用以表示待制备预制体中的经纱和纬纱之间的位置关系的最小单元，同时，该初始基元组织中的经纱层数和纬纱层数均是待制备预制体的最厚处的经纱层数和纬纱层数，因而，待制备预制体中各个经纱列和各个纬纱列的交织点处的经纱层数均小于或者等于初始基元组织中的经纱层数，待制备预制体中各个经纱列和各个纬纱列的交织点处 的纬纱层数均小于或者等于初始基元组织中的纬纱层数，因此，本申请实施例中的预制体的纹织图生成方法仅涉及减纱而未涉及增纱，但是，本领域技术人员应当理解，可以通过对本申请实施例中的方法进行反向推导，得到相应的通过增纱的方式生成待制备预制体的纹织图的方法。
此外，需要说明的是，虽然初始基元组织是用以表示待制备预制体中的经纱和纬纱之间的位置关系的最小单元，但是并不要求待制备预制体中包括的基元组织均为完整的基元组织，具体地，仍以图2A-图2D所示的待制备预制体为例，该待制备预制体的经纱列数为12列，纬纱列数为15列，但是，该待制备预制体的初始基元组织可以为经纱列数为4列，纬纱列数为4列的初始基元组织。
在本申请实施例中，该待制备预制体可以仅包括一种初始基元组织，也可以包括两种以及两种以上的初始基元组织，具体地，该待制备预制体可以仅包括如图3A-图3D所示的一种初始基元组织(下文简称为初始基元组织1)，其中，实线表示经纱，椭圆表示纬纱，该初始基元组织1包括4列经纱，4列纬纱，每列经纱包括3层，每列纬纱包括4层，具体地，图3A-图3D中的X轴方向为纬纱列的延伸方向，Y轴方向为经纱列的延伸方向，Z轴方向为经纱层和纬纱层的延伸方向，图3A示出了初始基元组织1以第1列经纱所在面为截面时的结构，图3B示出了初始基元组织1以第2列经纱所在面为截面时的结构，图3C示出了初始基元组织1以第3列经纱所在面为截面时的结构，图3D示出了初始基元组织1以第4列经纱所在面为截面时的结构。
或者，该待制备预制体除了包括上述初始基元组织1外，还可以包括图4A-图4B所示的初始基元组织(下文简称为初始基元组织2)，以及图5A-图5B所示的初始基元组织(下文简称为初始基元组织3)，其中，实线表示经纱，椭圆表示纬纱，且图4A-图4B以及图5A-图5B中的X轴方向均为纬纱列的延伸方向，Y轴方向均为经纱列的延伸方向，Z轴方向均为经纱层和纬纱层的延伸方向，具体地，初始基元组织2包括2列经纱，2列纬纱，每列经纱包括3层，每列纬纱包括4层：图4A示出了初始基元组织2以第1列经纱所在面为截面时的结构，图4B示出了初始基元组织2以第2列经纱所在面为截面时的结构；初始基元组织3包括2列经纱，2列纬纱，每列经纱包括3层，每列纬纱包括4层：图5A示出了初始基元组织5以第1列经纱所在面为截面时的结构，图5B示出了初始基元组织5以第2列经纱所在面为截面时的结构。
需要说明的是，由于上述初始基元组织1、2和3均为结构规则的纹织结构，因此，均以能够表示初始基元组织1、2和3的结构的最少层数进行示出，也即，均以初始基元结构中的每列经纱包括3层经纱，每列纬纱包括4层纬纱进行示出，但是，本领域技术人员应该能够理解，待制备预制体中的最厚处的经纱层数一般均大于3层，纬纱层数一般也均大于4层，且基于上述初始基元组织1、2和3的结构的规则性，因此，当初始基元组织中的经纱层数和纬纱层数均为更多层(例如，每列经纱包括9层，每列纬纱包括10层)时，初始基元组织的具体结构均可以根据图3A-图3D、图4A-图4B以及图5A-图5B中所示的结构扩充得到，在此不再赘述。
S102：根据初始结构信息生成待制备预制体的初始纹织图。
在本申请实施例中，初始纹织图中的像素点的像素值包括第一像素值和第二像素值，当像素点对应的经纱在对应的纬纱的上方时，像素点的像素值为第一像素值，当像素点对应的经纱在对应的纬纱下方时，像素点的像素值为第二像素值。
在本申请实施例中，需要说明的是，若待制备预制体包括多种初始基元组织，则待制备预制体的结信息中还包括待制备预制体的各列经纱与各列纬纱的交织点处的基元组织类型。具体地，沿用上例，若待制备预制体的结构如图2A-图2D所示，且该待制备预制体中包括初始基元组织1、2和3三种初始基元组织，则待制备预制体的结信息中的待制备预制体的经纱列数，纬纱列数和各列经 纱(共12列：J1～J12)与各列纬纱(共15列：W1～W15)的交织点处的基元组织类型可以通过表1的形式来表示：
  J1 J2 J3 J4 J5 J6 J7 J8 J9 J10 J11 J12
W1 2 2 2 2 2 2 2 2 1 1 1 1
W2 2 2 2 2 2 2 2 1 1 1 1 1
W3 2 2 2 2 2 2 2 1 1 1 1 1
W4   2 2 2 2 2 2 1 1 1 1  
W5   2 2 2 2 2 2 1 1 1    
W6   2 2 2 2 2 1 1 1 1    
W7     2 2 2 2 1 1 1 1    
W8     2 2 2 2 3 1 1      
W9     2 2 2 3 3 3 1      
W10     2 2 2 3 3 3 3      
W11     2 2 3 3 3 3 3      
W12     2 3 3 3 3 3 3      
W13     3 3 3 3 3 3 3 3    
W14     3 3 3 3 3 3 3 3    
W15     3 3 3 3 3 3 3 3    
表1
在本申请实施例中，初始纹织图的生成方式可以为现有任意一种能够根据待制备预制体的结构信息生成对应的纹织图的方式，在此不做任何限制。
S103：获取待制备预制体的减纱信息。
在本申请实施例中，减纱信息包括待制备预制体中各列经纱和各列纬纱的交织点处的实际经纱层数以及减纱位置信息。
沿用上例，若待制备预制体的结构如图2A-图2D所示，且该待制备预制体中包括初始基元组织1、2和3三种初始基元组织，待制备预制体的结信息中的待制备预制体的经纱列数(共12列：J1～J12)，纬纱列数(共15列：W1～W15)和各列经纱与各列纬纱的交织点处的基元组织类型如表1所示，则减纱信息中的各列经纱和各列纬纱的交织点处的实际经纱层数可以如表2所示：
  J1 J2 J3 J4 J5 J6 J7 J8 J9 J10 J11 J12
W1 2 3 3 5 6 8 9 9 8 7 5 3
W2 2 3 3 5 6 8 8 9 8 7 5 3
W3 2 3 3 5 6 7 8 8 8 7 5 3
W4   3 3 5 6 7 8 8 7 6 5  
W5   3 3 5 6 7 8 7 7 6    
W6   3 3 4 6 7 7 7 7 6    
W7     3 4 6 6 7 7 6 5    
W8     3 4 5 6 7 6 6      
W9     3 4 5 6 6 6 5      
W10     3 4 5 6 6 6 5      
W11     3 4 5 6 6 5 5      
W12     3 4 5 5 5 5 4      
W13     3 4 5 5 5 5 4 3    
W14     3 4 4 5 5 4 4 3    
W15     3 4 4 5 4 4 3 3    
表2
在本申请实施例中，初始基元组织中的纬纱层数与经纱层数相关，且纬纱层数与经纱层数可以根据各种初始基元组中经纱和纬纱之间的位置关系得到，因此，各列经纱和各列纬纱的交织点处的实际纬纱层数可以根据对应的交织点处的实际经纱层数得到，具体地，在上述初始基元组织1，初始基元组织2以及初始基元组织3中，各列经纱和各列纬纱的交织点处的实际纬纱层数均比对应的交织点处的实际经纱层数多1层。
在本申请实施例中，减纱位置信息可以包括经纱减纱起始位置信息和纬纱减纱起始位置信息。
在本申请实施例中，经纱减纱起始位置可以为一列经纱中的任意一层经纱，具体地，经纱减纱起始位置信息可以为除第一层经纱和最后一层经纱以外的任意一层经纱，例如，经纱减纱起始位置可以为第二层经纱或者倒数第二层经纱。在本申请实施例中，经纱减纱起始位置还可以为一个以上，例如，为了实现对称减纱，可以将第二层经纱以及倒数第二层经纱均作为经纱减纱起始位置，进行经纱减纱时，每个经纱减纱起始位置均减去一半的待减经纱层(若待减经纱层为奇数，则其中一个经纱减纱起始位置多减一层)。
在本申请实施例中，纬纱减纱起始位置也可以为一列纬纱中的任意一层纬纱，具体地，纬纱减纱起始位置可以为第一层纬纱或者最后一层纬纱，在本申请实施例中，为了实现对称减纱，同样可以将第一层纬纱和最后一层纬纱均作为经纱减纱起始位置，进行纬纱减纱时，每个纬纱减纱起始位置均减去一半的待减纬层(若待减纬纱层为奇数，则其中一个纬纱减纱起始位置多减一层)。
在本申请实施例中，减纱位置信息还包括经纱减纱方向信息和纬纱减纱方向信息，具体地，经纱减纱方向信息可以根据经纱减纱起始位置信息确定，例如，当经纱减纱起始位置为第二层经纱时，则经纱减纱方向为朝向最后一层经纱，当经纱减纱起始位置为倒数第二层经纱时，则经纱减纱方向为朝向第一层经纱；具体地，纬纱减纱方向信息同样可以根据纬纱减纱起始位置信息确定，当纬纱减纱起始位置为第一层纬纱时，则纬纱减纱方向为朝向最后一层纬纱，当纬纱减纱起始位置为最后一层纬纱时，则纬纱减纱方向为朝向第一层纬纱。
需要说明的是，上述第一层经纱和最后一层经纱分别是指一列经纱中两层位于最外侧的经纱，当其中一层位于最外侧的经纱为第一层经纱时，则相应地，另一层位于最外侧的经纱为最后一层经纱；同样地，第一层纬纱和最后一层纬纱分别是指一列纬纱中两层位于最外侧的纬纱；此处的第一层和最后一层均不应构成对本申请实施例的其他限制。
S104：根据减纱信息对初始纹织图进行调整，得到待制备预制体的纹织图。
在本申请实施例中，当在某一交织点处(假设为交织点A)减去一层经纱(假设为经纱层A)时，则将经纱层A提到所有纬纱上方或者所有纬纱的下方，也即，将初始纹织图中与该交织点A对应的所有像素点中，与经纱层A相对应的一列像素点的像素值均设置为第一像素点值或者第二像素点值，具体地，当经纱层A靠近交织点A中的第一层经纱时，则可以将经纱层A提到所有纬纱上方， 相应地，将初始纹织图中与该交织点A对应的所有像素点中，与经纱层A相对应的一列像素点的像素值均设置为第一像素点值；当经纱层A靠近交织点A中的最后一层经纱时，则可以将经纱层A提到所有纬纱下方，相应地，将初始纹织图中与该交织点A对应的所有像素点中，与经纱层A相对应的一列像素点的像素值均设置为第二像素点值。
在本申请实施例中，当在某一交织点处(假设为交织点B)中的一列纬纱(假设为纬纱列B)中减去一层纬纱(假设为纬纱层B)时，将初始纹织图中与该交织点B对应的所有像素点中，与纬纱层B相对应的一行像素点设置为第一像素点或者第二像素点；同时，当在纬纱列B与所有经纱列的交织点处，纬纱层B都被减去，也即初始纹织图中与纬纱层B相对应的行的所有像素点的像素值均将被设置为第一像素点或者第二像素点，则可以将初始纹织图中与纬纱层B相对应的行删除。沿用上例，若纱减纱起始位置为第一层纬纱，且根据表1可知，第6列纬纱(W6)与第1列经纱～第12列经纱(J1～J12)的交织点处的经纱层数分别为0,3,3,4,6,7,7,7,7,6,0,0，相应地，各个交织点处的纬纱层数分别为：0,4,4,5,7,8,8,8,8,7,0,0(纬纱层数比经纱层数多一层，但是本领域的技术人员应当可以理解，当经纱层数为0时，纬纱层数也为0)，而初始基元组织中的纬纱层数为10层，因此，第6列纬纱中的第1层经纱和第2层经纱在所有交织点处均被减去，也即第6列纬纱中的第1层经纱和第2层在初始纹织图中所对应的行的像素值均为第一像素值或者第二像素值，对应的行可以删除，调整后的第6列纬纱所对应的纹织图如图6所示，其中的w3～w10是指初始基元中的第3层纬纱～第10层纬纱；调整后得到的待制备预制体的纹织图如图7所示，在本申请实施例中，图6和图7中以像素点的像素值为第一像素值时，像素点为黑色(为了方便显示像素点的边界，图6和图7中均使用黑色圆点代替黑色色块进行示出)，像素点的像素值为第二像素值时，像素点为白色为例进行示出。
在本申请实施例中，通过首先根据待制备预制体的结构信息，特别是待制备预制体中的初始基元组织(未经过减纱时的基元组织)的结构信息，生成待制备预制体的初始纹织图，然后再根据获取到的待制备预制体的各列经纱和各列纬纱的交织点处的实际经纱层数以及减纱位置等减纱信息，对初始纹织图进行基于减纱信息的调整，能够实现对需要进行减纱的结构较为复杂的待制备预制体的纹织图的整体性自动生成，而无需单独获取待制备预制体各个交织点处的组织结构并依次生成各个交织点处的纹织图，从而组合形成整个待制备预制体的纹织图，纹织图的生成效率较高，而由于每个交织点减纱后的组织结构均会产生一定的改变，因此，获取各个交织点处的组织结构的难度较大，获取出错的可能性也较大，因此，该无需获取各个交织点处的组织结构的预制体的纹织图生成方法的实现难度较低，且生成的纹织图的准确性较高。
作为本申请实施例的一种可选实施方式，如图8所示，步骤S104可以包括如下步骤：
S801：获取待制备预制体中的一待减经纱列和一待减纬纱列的待减交织点处的实际经纱层数。
在本申请实施例中，沿用上例，若待减经纱列为待制备预制体中的第7列经纱，待减纬纱列为待制备预制体中的第15列纬纱，则可以根据待制备预制体的减纱信息(如表2所示)可以获取到该待减交织点处的实际经纱层数为5层。
S802：根据实际经纱层数以及初始结构信息中的经纱和纬纱的位置关系确定交织点处的实际纬纱层数。
在本申请实施例中，沿用上例，根据待制备预制体的初始结构信息中的经纱和纬纱的位置关系可知，待制备预制体中各个交织点处的纬纱层数比经纱层数多一层，因此，可以得到待减交织点处的实际纬纱层数为6层。
S803：根据实际经纱层数、实际纬纱层数和减纱位置信息对初始纹织图进行调整，得到待制备预制体的纹织图。
在本申请实施例中，根据实际经纱层数和初始基元组织中的经纱层数即可得到待减经纱列中的减纱层数，而根据待减经纱列中的减纱层数以及减纱位置信息中的经纱减纱起始位置信息即可得到待减经纱层数中需要减去的具体经纱层；根据实际纬纱层数和初始基元组织中的纬纱层数即可得到待减纬纱列中的减纱层数，而根据待减纬纱列中的减纱层数以及减纱位置信息中的纬纱减纱起始位置信息即可得到待减纬纱层数中需要减去的具体纬纱层；根据待减经纱层数中需要减去的具体经纱层以及待减纬纱层数中需要减去的具体纬纱层对初始纹织图进行调整，即可得到待制备预制体的纹织图。
作为本申请实施例的一种可选实施方式，如图9所示，步骤S803可以包括如下步骤：
S901：根据实际纬纱层数、初始基元组织的纬纱层数以及纬纱减纱起始位置信息确定待减交织点处的待减纬纱层。
沿用上例，若待减经纱列为待制备预制体中的第7列经纱，待减纬纱列为待制备预制体中的第15列纬纱，则实际纬纱层数为6层(比实际经纱层数5层多一层)，而初始基元组织的纬纱层数为10层，且纬纱减纱起始位置信息为第一层纬纱，因此，待减交织点处的待减纬纱层为第1～4层纬纱。
S902：获取初始纹织图中与待减纬纱层相对应的第一待减行以及与待减经纱列中的各层经纱对应的第一待减列，并将第一待减行中的各个第一待减列的像素点的像素值均设置为第一像素值或者第二像素值。
沿用上例，将第7列经纱第15列纬纱在初始纹织图中的像素点中，第1行～第4行像素点的像素值设置为第一像素值或者第二像素值。
在本申请实施例中，为了简化最终生成的待制备预制体的纹织图，可以将待减纬纱列在纹织图中所占的行数设置为待减纬纱列与各个待减经纱列的交织点处的实际纬纱层数中的最大值，则相应的，在该步骤中，将纹织图中与待减纬纱列所对应的行中多于待减纬纱列的实际纬纱层数的行的像素点的像素值均为第一像素值或者第二像素值。
沿用上例，第15列纬纱与各个待减经纱列(J1～J12)的交织点处的实际纬纱层数中的最大值为6，则如图10所示，待减交织点处在纹织图中对应的像素点为6行，在本申请实施例中，图10中同样以像素点的像素值为第一像素值时，像素点为黑色(为了方便显示像素点的边界，图10中均使用黑色圆点代替黑色色块进行示出)，像素点的像素值为第二像素值时，像素点为白色为例进行示出。
S903：根据实际经纱层数、初始基元组织的经纱层数以及经纱减纱起始位置信息确定待减交织点处的待减经纱层。
沿用上例，若待减经纱列为待制备预制体中的第7列经纱，待减纬纱列为待制备预制体中的第15列纬纱，则实际经纱层数为5层，而初始基元组织的纬纱层数为9层，且经纱减纱起始位置包括第二层经纱和倒数第二层纬纱两个经纱减纱起始位置进行对称减纱，因此，待减交织点处的待减经纱层为第2层经纱，第3层经纱，第7层经纱以及第8层经纱。
S904：获取初始纹织图中与待减经纱层相对应的第二待减列以及与待减纬纱列中的各层纬纱对应的第二待减行，并将第二待减列中的各个第二待减行的像素点的像素值均设置为第一像素值或者第二像素值。
沿用上例，将第2层经纱，第3层经纱提到所有纬纱上方，因此，图10中的第2列和第3列像素点的像素值均为第一像素值(像素点为黑色圆点)，图10中的第7列和第8列像素点的像素值均 为第二像素值(像素点为白色)。
实施例2
图11示出了本申请实施例的一种预制体的纹织图生成装置的远离框图，该装置可以用于实现实施例1或者其任意可选实施方式所述的预制体的纹织图生成方法。如图11所示，该装置包括：结构信息获取模块10、初始纹织图生成模块20，减纱信息获取模块30和纹织图生成模块40。其中，
结构信息获取模块10用于获取待制备预制体的初始结构信息。在本申请实施例中，初始结构信息包括待制备预制体的经纱列数和纬纱列数，以及待制备预制体的初始基元组织的经纱列数、经纱层数、纬纱列数、纬纱层数以及经纱和纬纱的位置关系。
初始纹织图生成模块20用于根据初始结构信息生成待制备预制体的初始纹织图。在本申请实施例中，初始纹织图中的像素点的像素值包括第一像素值和第二像素值，当像素点对应的经纱在对应的纬纱的上方时，像素点的像素值为第一像素值，当像素点对应的经纱在对应的纬纱下方时，像素点的像素值为第二像素值。
减纱信息获取模块30用于获取待制备预制体的减纱信息。在本申请实施例中，减纱信息包括待制备预制体中各列经纱和各列纬纱的交织点处的实际经纱层数以及减纱位置信息。
纹织图生成模块40用于根据减纱信息对初始纹织图进行调整，得到待制备预制体的纹织图。
在本申请实施例中，通过执行上述模块对应的程序或者指令，能够实现对需要进行减纱的结构较为复杂的待制备预制体的纹织图的整体性自动生成，且无需获取各个交织点处的组织结构，实现难度较低，生成的纹织图的准确性较高。
实施例3
本申请实施例提供了一种电子设备，如图12所示，该电子设备可以包括处理器1201和存储器1202，其中处理器1201和存储器1202可以通过总线或者其他方式连接，图12中以通过总线连接为例。
处理器1201可以为中央处理器(Central Processing Unit，CPU)。处理器1201还可以为其他通用处理器、数字信号处理器(Digital Signal Processor，DSP)、专用集成电路(Application Specific Integrated Circuit，ASIC)、现场可编程门阵列(Field-Programmable Gate Array，FPGA)或者其他可编程逻辑器件、分立门或者晶体管逻辑器件、分立硬件组件等芯片，或者上述各类芯片的组合。
存储器1202作为一种非暂态计算机可读存储介质，可用于存储非暂态软件程序、非暂态计算机可执行程序以及模块，如本申请实施例1中的预制体的纹织图生成方法对应的程序指令/模块。处理器1201通过运行存储在存储器1202中的非暂态软件程序、指令以及模块，从而执行处理器的各种功能应用以及数据处理，即实现上述方法实施例中预制体的纹织图生成方法。
存储器1202可以包括存储程序区和存储数据区，其中，存储程序区可存储操作系统、至少一个功能所需要的应用程序；存储数据区可存储处理器1201所创建的数据等。此外，存储器1202可以包括高速随机存取存储器，还可以包括非暂态存储器，例如至少一个磁盘存储器件、闪存器件、或其他非暂态固态存储器件。在一些实施例中，存储器1202可选包括相对于处理器1201远程设置的存储器，这些远程存储器可以通过网络连接至处理器1201。上述网络的实例包括但不限于互联网、企业内部网、局域网、移动通信网及其组合。
所述一个或者多个模块存储在所述存储器1202中，当被所述处理器1201执行时，执行如图1-图9所示实施例中的预制体的纹织图生成方法。
上述电子设备具体细节可以对应参阅图1至图9所示的实施例中对应的相关描述和效果进行理 解，此处不再赘述。
本领域技术人员可以理解，实现上述实施例方法中的全部或部分流程，是可以通过计算机程序来指令相关的硬件来完成，所述的程序可存储于一计算机可读取存储介质中，该程序在执行时，可包括如上述各方法的实施例的流程。其中，所述存储介质可为磁碟、光盘、只读存储记忆体(Read-Only Memory，ROM)、随机存储记忆体(Random Access Memory，RAM)、快闪存储器(Flash Memory)、硬盘(Hard Disk Drive，缩写：HDD)或固态硬盘(Solid-State Drive，SSD)等；所述存储介质还可以包括上述种类的存储器的组合。
显然，上述实施例仅仅是为清楚地说明所作的举例，而并非对实施方式的限定。对于所属领域的普通技术人员来说，在上述说明的基础上还可以做出其它不同形式的变化或变动。这里无需也无法对所有的实施方式予以穷举。而由此所引伸出的显而易见的变化或变动仍处于本申请创造的保护范围之中。

Claims (9)

  1. 一种预制体的纹织图生成方法，其特征在于，包括如下步骤：
    获取待制备预制体的初始结构信息；所述待制备预制体包括至少一种初始基元组织；所述初始结构信息包括所述待制备预制体的经纱列数和纬纱列数，以及所述待制备预制体的初始基元组织的经纱列数、经纱层数、纬纱列数、纬纱层数以及经纱和纬纱的位置关系；
    根据所述初始结构信息生成所述待制备预制体的初始纹织图；所述初始纹织图中的像素点的像素值包括第一像素值和第二像素值，当所述像素点对应的经纱在对应的纬纱的上方时，所述像素点的像素值为第一像素值，当所述像素点对应的经纱在对应的纬纱下方时，所述像素点的像素值为第二像素值；
    获取所述待制备预制体的减纱信息；所述减纱信息包括所述待制备预制体中各列经纱和各列纬纱的交织点处的实际经纱层数以及减纱位置信息；
    根据所述减纱信息对所述初始纹织图进行调整，得到所述待制备预制体的纹织图。
  2. 根据权利要求1所述的预制体的纹织图生成方法，其特征在于，所述待制备预制体包括至少两种初始基元组织；所述初始结构信息还包括所述待制备预制体的各列经纱与各列纬纱的交织点处的基元组织类型。
  3. 根据权利要求1或2所述的预制体的纹织图生成方法，其特征在于，所述根据所述减纱信息对所述初始纹织图进行调整，得到所述待制备预制体的纹织图的步骤，包括：
    获取所述待制备预制体中的一待减经纱列和一待减纬纱列的待减交织点处的实际经纱层数；
    根据所述实际经纱层数以及所述初始结构信息中的所述经纱和纬纱的位置关系确定所述交织点处的实际纬纱层数；
    根据所述实际经纱层数、所述实际纬纱层数和所述减纱位置信息对所述初始纹织图进行调整，得到所述待制备预制体的纹织图。
  4. 根据权利要求1-3任一项所述的预制体的纹织图生成方法，其特征在于，所述减纱位置信息包括经纱减纱起始位置信息和纬纱减纱起始位置信息，所述经纱减纱起始位置为除第一层经纱和最后一层经纱以外的任意一层经纱，所述纬纱减纱起始位置为第一层纬纱或者最后一层纬纱。
  5. 根据权利要求4所述的预制体的纹织图生成方法，其特征在于，所述根据所述实际经纱层数、所述实际纬纱层数和所述减纱位置信息对所述初始纹织图进行调整，得到所述待制备预制体的纹织图的步骤，包括：
    根据所述实际纬纱层数、所述初始基元组织的纬纱层数以及所述纬纱减纱起始位置信息确定所述待减交织点处的待减纬纱层；
    获取所述初始纹织图中与所述待减纬纱层相对应的第一待减行以及与所述待减经纱列中的各层经纱对应的第一待减列，并将所述第一待减行中的各个所述第一待减列的像素点的像素值均设置为所述第一像素值或者所述第二像素值；
    根据所述实际经纱层数、所述初始基元组织的经纱层数以及所述经纱减纱起始位置信息确定所述待减交织点处的待减经纱层；
    获取所述初始纹织图中与所述待减经纱层相对应的第二待减列以及与所述待减纬纱列中的各层纬纱对应的第二待减行，并将所述第二待减列中的各个所述第二待减行的像素点的像素值均设置为 所述第一像素值或者所述第二像素值。
  6. 根据权利要求5所述的预制体的纹织图生成，其特征在于，所述待减纬纱列在所述纹织图中所占的行数为所述待减纬纱列与各个待减经纱列的交织点处的实际纬纱层数中的最大值；所述根据所述实际经纱层数、所述实际纬纱层数和所述减纱位置信息对所述初始纹织图进行调整，得到所述待制备预制体的纹织图的步骤，还包括：
    将所述纹织图中与所述待减纬纱列所对应的行中多于所述待减纬纱列的实际纬纱层数的行的像素点的像素值均为第一像素值或者第二像素值。
  7. 一种预制体的纹织图生成装置，其特征在于，包括：
    结构信息获取模块，用于获取待制备预制体的初始结构信息；所述初始结构信息包括所述待制备预制体的经纱列数和纬纱列数，以及所述待制备预制体的初始基元组织的经纱列数、经纱层数、纬纱列数、纬纱层数以及经纱和纬纱的位置关系；
    初始纹织图生成模块，用于根据所述初始结构信息生成所述待制备预制体的初始纹织图；所述初始纹织图中的像素点的像素值包括第一像素值和第二像素值，当所述像素点对应的经纱在对应的纬纱的上方时，所述像素点的像素值为第一像素值，当所述像素点对应的经纱在对应的纬纱下方时，所述像素点的像素值为第二像素值；
    减纱信息获取模块，用于获取所述待制备预制体的减纱信息；所述减纱信息包括所述待制备预制体中各列经纱和各列纬纱的交织点处的实际经纱层数以及减纱位置信息；
    纹织图生成模块，用于根据所述减纱信息对所述初始纹织图进行调整，得到所述待制备预制体的纹织图。
  8. 一种电子设备，其特征在于，包括：
    存储器和处理器，所述存储器和所述处理器之间互相通信连接，所述存储器中存储有计算机指令，所述处理器通过执行所述计算机指令，从而执行权利要求1-6任一项所述的预制体的纹织图生成方法。
  9. 一种计算机可读存储介质，其特征在于，所述计算机可读存储介质存储有计算机指令，所述计算机指令用于使所述计算机执行权利要求1-6任一项所述的预制体的纹织图生成方法。
PCT/CN2020/081201 2019-12-31 2020-03-25 预制体的纹织图生成方法、装置、电子设备及存储介质 WO2021134936A1 (zh)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP20859669.2A EP3872672B1 (en) 2019-12-31 2020-03-25 Method and apparatus for generating jacquard weave pattern of preform, electronic device, and storage medium
US17/276,483 US11408099B2 (en) 2019-12-31 2020-03-25 Method and device for generating jacquard pattern of preform, electronic device and storage medium

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201911402831.0A CN111177810B (zh) 2019-12-31 2019-12-31 预制体的纹织图生成方法、装置、电子设备及存储介质
CN201911402831.0 2019-12-31

Publications (1)

Publication Number Publication Date
WO2021134936A1 true WO2021134936A1 (zh) 2021-07-08

Family

ID=70654197

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2020/081201 WO2021134936A1 (zh) 2019-12-31 2020-03-25 预制体的纹织图生成方法、装置、电子设备及存储介质

Country Status (4)

Country Link
US (1) US11408099B2 (zh)
EP (1) EP3872672B1 (zh)
CN (1) CN111177810B (zh)
WO (1) WO2021134936A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111177809B (zh) * 2019-12-31 2021-09-21 南京玻璃纤维研究设计院有限公司 一种纹织图生成方法、装置、电子设备及可读存储介质
CN112347661B (zh) * 2020-11-26 2024-05-03 南京玻璃纤维研究设计院有限公司 织物纹路优化方法、装置及电子设备

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102517759A (zh) * 2011-12-29 2012-06-27 山东岱银纺织集团股份有限公司 同幅异厚三维机织物的织造方法
CN106777646A (zh) * 2016-12-09 2017-05-31 浙江理工大学 一种织物的三维立体纹样设计方法
CN108717727A (zh) * 2018-05-29 2018-10-30 南京航空航天大学 一种三维编织复合材料预制体结构的识别与建模方法
FR3062659B1 (fr) * 2017-02-03 2019-03-22 Safran Aircraft Engines Appel de preforme dans un metier a tisser du type jacquard

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7072733B2 (en) * 2002-01-22 2006-07-04 Milliken & Company Interactive system and method for design, customization and manufacture of decorative textile substrates
US20060180041A1 (en) * 2005-02-15 2006-08-17 Hiroshi Kadota Warp printer, weaving machine and weaving method
CN101503838B (zh) * 2008-11-26 2010-09-29 中材科技股份有限公司 2.5维整体编织多通管织物的编织方法
FR2939153B1 (fr) * 2008-11-28 2011-12-09 Snecma Propulsion Solide Realisation d'une structure fibreuse a epaisseur evolutive par tissage 3d
CN102523366B (zh) * 2011-12-13 2014-07-09 上海工程技术大学 一种织物编织样式自动分析系统及方法
WO2013112712A1 (en) * 2012-01-24 2013-08-01 Nike International Ltd. Multiple layer weaving
CN103952837A (zh) * 2014-05-19 2014-07-30 烟台宋和科技股份有限公司 一体化成型织物的织造方法及采用该方法织造的织物
FR3032462B1 (fr) * 2015-02-10 2017-03-10 Aircelle Sa Procede de fabrication d’une preforme de fibres de renfort tissee comprenant une section evolutive
HK1201671A2 (zh) * 2015-04-21 2015-09-04 藝能國際發展有限公司 產生三維針織紙樣的方法和系統
DE102015109785A1 (de) * 2015-06-18 2016-12-22 Groz-Beckert Kg Zweidimensionales Gewebe und Verfahren zu dessen Herstellung
US11471736B2 (en) * 2016-03-04 2022-10-18 Bauer Hockey, Llc 3D braiding materials and 3D braiding methods for sporting implements
KR102349124B1 (ko) * 2017-06-06 2022-01-10 에이에스엠엘 네델란즈 비.브이. 측정 방법 및 장치
CN109972271B (zh) * 2019-03-27 2023-03-14 南京玻璃纤维研究设计院有限公司 一种变厚度预制体、一种复合部件以及一种变厚度预制体的减纱方法
CN111177809B (zh) * 2019-12-31 2021-09-21 南京玻璃纤维研究设计院有限公司 一种纹织图生成方法、装置、电子设备及可读存储介质
US20210342495A1 (en) * 2020-04-29 2021-11-04 Galatea Inc. Garment Creation System, Method and Apparatus

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102517759A (zh) * 2011-12-29 2012-06-27 山东岱银纺织集团股份有限公司 同幅异厚三维机织物的织造方法
CN106777646A (zh) * 2016-12-09 2017-05-31 浙江理工大学 一种织物的三维立体纹样设计方法
FR3062659B1 (fr) * 2017-02-03 2019-03-22 Safran Aircraft Engines Appel de preforme dans un metier a tisser du type jacquard
CN108717727A (zh) * 2018-05-29 2018-10-30 南京航空航天大学 一种三维编织复合材料预制体结构的识别与建模方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP3872672A4 *

Also Published As

Publication number Publication date
EP3872672B1 (en) 2023-06-07
US11408099B2 (en) 2022-08-09
EP3872672A1 (en) 2021-09-01
CN111177810A (zh) 2020-05-19
CN111177810B (zh) 2021-11-09
EP3872672A4 (en) 2021-11-10
US20220106715A1 (en) 2022-04-07

Similar Documents

Publication Publication Date Title
WO2021134936A1 (zh) 预制体的纹织图生成方法、装置、电子设备及存储介质
KR101351236B1 (ko) 테셀레이션 시간이 테셀레이션의 양에 따라 선형적으로 증가하는 테셀레이터
JP7421585B2 (ja) 光線バンドルの光線に対する差分データを決定する方法及びグラフィックス処理ユニット
CN108717727B (zh) 一种三维编织复合材料预制体结构的识别与建模方法
DE102016103874A1 (de) Systeme und Verfahren zur weichen Schattierung in 3D-Rendering
US9305397B2 (en) Vertex order in a tessellation unit
WO2021134937A1 (zh) 一种纹织图生成方法、装置、电子设备及可读存储介质
TWI439961B (zh) Conversion algorithm for voids generated after converting 2D images
CN100468464C (zh) 一种基于逆Loop细分的渐进网格生成方法
JP2007233560A (ja) メッシュモデル生成方法
Cabaret et al. Distanceless label propagation: an efficient direct connected component labeling algorithm for GPUs
CN108389154B (zh) Gpu中一种用于并行绘制的裁剪区域分割技术的实现方法
CN109754449B (zh) 一种二维网格图形的三角化确定方法
JP5806169B2 (ja) 設計データ生成装置、その生成方法及びプログラム
CN112347661A (zh) 织物纹路优化方法、装置及电子设备
CN107481314B (zh) 一种基于kd树的阴影体优化方法
JP3690501B2 (ja) ３次元モデル化方法
CN114339448B (zh) 光束视频特效的制作方法、装置、计算机设备及存储介质
KR101953985B1 (ko) 다공성 구조 자동 설계 방법
KR102218860B1 (ko) 비정렬 격자 데이터의 렌더링을 위한 gpu 기반 레이 캐스팅 시스템 및 방법
KR100796735B1 (ko) 볼륨 광선 투사법을 위한 데이터 구조를 생성하는 방법
WO2021237785A1 (zh) 一种大地图烘焙切割方法及恢复方法
CN117252978A (zh) 折叠渲染优化方法、装置、计算机设备及存储介质
CN107491593B (zh) 一种用于生物支架面曝光快速成形的数字掩膜生成方法
CN116563494A (zh) 三维数值模型构建方法、装置、存储介质和程序产品

Legal Events

Date Code Title Description
ENP Entry into the national phase

Ref document number: 2020859669

Country of ref document: EP

Effective date: 20210315

NENP Non-entry into the national phase

Ref country code: DE