WO2021117516A1 - Heat treatment apparatus - Google Patents

Heat treatment apparatus Download PDF

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Publication number
WO2021117516A1
WO2021117516A1 PCT/JP2020/044346 JP2020044346W WO2021117516A1 WO 2021117516 A1 WO2021117516 A1 WO 2021117516A1 JP 2020044346 W JP2020044346 W JP 2020044346W WO 2021117516 A1 WO2021117516 A1 WO 2021117516A1
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WO
WIPO (PCT)
Prior art keywords
dew point
heat treatment
metal strip
treatment apparatus
atmosphere
Prior art date
Application number
PCT/JP2020/044346
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French (fr)
Japanese (ja)
Inventor
真人 永田
素史 赤阪
Original Assignee
中外炉工業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 中外炉工業株式会社 filed Critical 中外炉工業株式会社
Priority to CN202080083926.5A priority Critical patent/CN114761585A/en
Publication of WO2021117516A1 publication Critical patent/WO2021117516A1/en

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    • CCHEMISTRY; METALLURGY
    • C21METALLURGY OF IRON
    • C21DMODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D1/00General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
    • C21D1/74Methods of treatment in inert gas, controlled atmosphere, vacuum or pulverulent material
    • CCHEMISTRY; METALLURGY
    • C21METALLURGY OF IRON
    • C21DMODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D1/00General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
    • C21D1/74Methods of treatment in inert gas, controlled atmosphere, vacuum or pulverulent material
    • C21D1/76Adjusting the composition of the atmosphere
    • CCHEMISTRY; METALLURGY
    • C21METALLURGY OF IRON
    • C21DMODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D9/00Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
    • C21D9/52Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor for wires; for strips ; for rods of unlimited length
    • C21D9/54Furnaces for treating strips or wire
    • C21D9/56Continuous furnaces for strip or wire
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/04Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity adapted for treating the charge in vacuum or special atmosphere
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00Forming, maintaining, or circulating atmospheres in heating chambers
    • F27D7/06Forming or maintaining special atmospheres or vacuum within heating chambers

Definitions

  • the present invention relates to a heat treatment apparatus for brightly annealing a metal strip.
  • a heat treatment apparatus in which bright annealing of a metal strip is performed in a reducing atmosphere in order to remove the internal stress of the metal strip generated by cold rolling.
  • Patent Document 1 discloses a so-called horizontal furnace in which a hot-dip galvanizing continuous annealing furnace having a muffle structure in which a low-temperature holding zone is made of a steel plate and a metal strip is conveyed in the horizontal direction.
  • Patent Document 2 discloses a horizontal bright continuous annealing furnace of a metal strip whose inside is lined with refractory bricks.
  • Patent Document 3 discloses a manufacturing facility for a nickel-plated thin steel sheet in which the heat insulating material in the furnace is made of ceramic fiber.
  • Patent Document 1 since the muffle structure of the furnace body is made of steel plate, it is deformed by heating at a high temperature. Especially in the case of a horizontal furnace, since the section where the ceiling is made of steel plate is long, the ceiling hangs down due to its own weight, the shape distortion becomes large, the air flow in the furnace is turbulent, and the temperature distribution in the furnace deteriorates. .. In Patent Document 2, deformation of the refractory brick is unlikely to occur, but since the weight of the refractory brick is large, workability during assembly, maintenance and replacement is inferior, and the weight of the annealing furnace is also heavy. It is necessary to install it in the place where there is.
  • Ceramic fibers are used because the annealing of the steel sheet and the diffusion treatment of nickel plating are performed at about 800 ° C. in a non-reducing atmosphere. Ceramic fibers is excellent in light weight and workability, because they contain SiO 2, in a high temperature reducing atmosphere, occurs the reduction of SiO 2, SiO 2 is changed to Si. Therefore, the ceramic fiber collapses, and it is necessary to frequently maintain and replace the ceramic fiber. When the ceramic fiber collapses, dust is generated and the dust falls onto the metal strip. In particular, in the case of a horizontal furnace, the area of the ceiling becomes large, so that the amount of dust falling increases and the quality of the metal strip deteriorates.
  • an object of the present invention is to provide a heat treatment apparatus for brightly anhydrating a metal strip, which can suppress deterioration of a heat insulating material made of a ceramic fiber containing SiO 2 even in a reducing atmosphere.
  • the heat treatment apparatus according to one aspect of the present invention.
  • a heating band that heats the metal strip A heat insulating material made of ceramic fiber containing SiO 2 and used as an inner wall of the heating zone.
  • a gas supply unit for supplying a reducing gas to the heating zone is provided.
  • the metal strip is maintained so that a dew point is maintained between an upper dew point that allows the metal strip to have brilliance and a lower dew point that prevents reduction of the SiO 2 contained in the insulating material. It is characterized by brightly bleaching in a reducing atmosphere.
  • a heat treatment apparatus for brightly annealing a metal strip in a reducing atmosphere.
  • a furnace body having a heating zone for heating the metal strip and a cooling zone provided on the downstream side of the metal strip in the transport direction with respect to the heating zone.
  • a heat insulating material made of ceramic fiber containing SiO 2 and used as an inner wall of the heating zone.
  • a gas supply unit that supplies reducing gas into the furnace body and
  • a dew point measuring unit that measures the dew point of the atmosphere in the heating zone,
  • a dew point adjusting unit for adjusting the dew point is provided.
  • the upper limit dew point that enables the metal strip to have brilliance and the lower limit dew point that disables the reduction of the SiO 2 contained in the heat insulating material is controlled so that the dew point is maintained between them.
  • the dew point (that is, the water content) of the atmosphere in the heating zone is maintained between the upper limit dew point and the lower limit dew point, so that the water content in the reducing atmosphere maintains the brilliance of the metal strip. It is suitable for preventing the reduction of SiO 2 contained in the heat insulating material. As a result, the metal strip can have a brilliant property, and deterioration of the heat insulating material due to reduction of SiO 2 contained in the heat insulating material can be prevented.
  • FIG. 1 is a schematic cross-sectional view of the heat treatment apparatus 1 according to the first embodiment.
  • the bright tanning furnace (heat treatment device) 1 that continuously brightly blisters the metal strip 3 includes a furnace body 10, gas supply units 9 and 28, a dew point measurement unit 22, and a dew point adjustment unit 24. , 27 and a control unit 20.
  • the bright quenching furnace (heat treatment apparatus) 1 shown in FIG. 1 is a horizontal furnace in which the furnace body extends in the horizontal direction (horizontal direction). In the horizontal furnace, the transport mechanism for transporting the metal strip 3 can be simplified, and the height of the heat treatment apparatus 1 can be suppressed from increasing.
  • the metal strip 3 is horizontally conveyed from left to right in FIG.
  • the metal strip 3 is made of, for example, a stainless steel material containing Cr.
  • the stainless steel material containing Cr is, for example, SUS304 of austenitic stainless steel or SUS430 of ferritic stainless steel.
  • the furnace body 10 is made of a steel box and has a heating zone 12 and a cooling zone 14.
  • the heating zone 12 extends in the lateral direction (horizontal direction) and is provided on the upstream side (inside side of the metal strip 3) in the transport direction of the metal strip 3.
  • the heating zone 12 is heated by the heating unit 16.
  • the heating unit 16 is, for example, an electric heater.
  • the heating zone 12 has a predetermined annealing temperature based on the temperature measured by a temperature measuring unit (not shown) (here, the temperature in the heating step of the heating step and the cooling step in annealing). Control to be.
  • the annealing temperature in the present application refers to the temperature of the atmosphere in the furnace in the heating zone 12.
  • the annealing temperature suitable for bright annealing is in the temperature range of 800 ° C. to 1250 ° C., and the control unit 20 controls the heating unit 16 so that the annealing temperature falls within the temperature range. ..
  • the cooling zone 14 is provided on the downstream side of the metal strip 3 in the transport direction (outside of the metal strip 3). In the cooling zone 14, since it is annealed, it is mainly cooled by allowing it to cool, so that no heating means or heat insulating material 17 is arranged. However, the cooling zone 14 may be provided with some cooling means in some cases.
  • a heat insulating material 17 is attached to the inner surface (inner wall of the furnace) of the furnace wall such as the side wall, the ceiling, and the floor of the furnace body 10.
  • the heat insulating material 17 is made of a ceramic fiber containing SiO 2.
  • the heat insulating material 17 can be configured to hold, for example, a ceramic fiber board or blanket by piercing a large number of rod-shaped studs attached to the furnace wall and pressing them with washer-shaped metal fittings.
  • the heat insulating material 17 is a fiber containing Al 2 O 3 (alumina) and SiO 2 (silica) as main components.
  • the content of Al 2 O 3 is 30 to 60% by mass and the content of SiO 2 is 40. ⁇ 70% by mass of alumina-silica ceramic fiber.
  • the inside of the furnace body 10 of the bright burning blunt furnace 1 is filled with a reducing atmospheric gas.
  • the inlet seal roll 13 and the outlet seal roll 15 are arranged at the inlet opening and the outlet opening of the furnace body 10, respectively.
  • the inlet seal roll 13 and the outlet seal roll 15 prevent the intrusion of outside air into the furnace body 10 by keeping the inside of the furnace body 10 at a pressure slightly higher than the atmospheric pressure.
  • the inlet seal roll 13 has a small amount of water adhering to the surface of the metal strip 3 from the outside air to the inside of the furnace body 10. Brought to.
  • a small amount of atmospheric gas flows out from the furnace in the same manner. Therefore, it is necessary to constantly measure and adjust the dew point (moisture content) of the atmosphere in the heating zone 12.
  • the gas supply unit includes a gas supply device 9 and a second control valve 28, and supplies reducing gas into the furnace body 10 or, in other words, reducing gas to the heating zone 12 via the gas supply pipe 5.
  • the gas supply device 9 is, for example, a gas cylinder.
  • the reducing gas is a gas containing hydrogen gas, for example, a gas in which hydrogen gas and nitrogen gas are mixed at a ratio of 3: 1.
  • the amount of reducing gas supplied is controlled by adjusting the opening degree of the second control valve 28 provided in the gas supply pipe 5.
  • the opening degree of the second control valve 28 is controlled by the control unit 20.
  • the gas supply pipe 5 is arranged on the upstream side of the cooling zone 14, but the supply position of the reducing gas is not particularly limited.
  • the reducing gas supplied from the gas supply pipe 5 diffuses the entire inside of the furnace body 10 including the heating zone 12 as an atmospheric gas, and then goes out of the furnace body 10.
  • the reducing gas supplied from the gas supply device 9 has a low dew point (that is, a low water content), for example, a JIS hydrogen first grade gas having a dew point of ⁇ 70 ° C.
  • a low dew point that is, a low water content
  • the dew point of the atmosphere in the furnace can be adjusted by the dew point adjusting unit 24 including the dehumidifying device 25 and the humidifying device 26, the reducing gas supplied from the gas supply device 9 does not necessarily have a low dew point ( That is, it does not have to have a low water content).
  • a gas containing a larger amount of water than the conventional JIS hydrogen 1st grade for example, a JIS hydrogen 2nd grade having a dew point equivalent to -60 ° C can be used. is there.
  • the dew point measuring unit 22 measures the dew point of the atmosphere (hereinafter, may be referred to as “atmospheric gas”) in the heating zone 12 of the furnace body 10 via the dew point measuring pipe 6.
  • the dew point measuring unit 22 is, for example, a capacitance type dew point meter or a mirror cooling type dew point meter.
  • the dew point measurement data is sent to the control unit 20 and stored in the memory unit of the control unit 20.
  • the dew point measurement pipe 6 is arranged on the downstream side of the heating zone 12, but the dew point measurement position is not particularly limited.
  • the dew point adjusting unit includes a dew point adjusting device 24 and a first adjusting valve 27, and adjusts the dew point of the atmosphere in the heating zone 12.
  • the dew point adjusting device 24 includes at least one of the dehumidifying device 25 and the humidifying device 26.
  • the dew point adjusting device 24 extracts a part of the atmosphere through the inlet pipe 7 arranged on the upstream side in the transport direction of the heating zone 12, adjusts the dew point, that is, the amount of water in the extracted atmosphere, and then transports the heating zone 12. It is returned to the inside of the furnace body 10 through the outlet pipe 8 arranged on the downstream side. By circulating the atmospheric gas between the dew point adjusting device 24 and the furnace body 10, the dew point of the atmosphere in the heating zone 12 is maintained at a predetermined dew point.
  • the dew point adjusting device 24 (that is, the dehumidifying device 25 and the humidifying device 26) is controlled by the control unit 20.
  • the circulation amount of the atmospheric gas is controlled by adjusting the opening degree of the first control valve 27 provided in the inlet pipe 7.
  • the opening degree of the first control valve 27 is controlled by the control unit 20.
  • the dehumidifying device 25 has a function of removing moisture contained in the atmosphere (dehumidifying the atmosphere) and lowering the dew point of the atmosphere.
  • the dehumidifying device 25 has, for example, an adsorption tower and a desorption tower filled with an adsorbent.
  • the adsorbent is synthetic zeolite such as molecular sieve (molecular sieve), natural zeolite, activated carbon, silica gel, alumina, activated alumina and the like.
  • molecular sieve molecular sieve
  • natural zeolite zeolite
  • activated carbon silica gel
  • alumina activated alumina
  • activated alumina activated alumina
  • the humidifying device 26 generates a water-containing gas that is a mixture of water vapor or liquid phase water and an atmosphere, and sends the water-containing gas into the furnace body 10 to add water to the atmosphere (humidification of the atmosphere). It has the function of raising the dew point of the atmosphere.
  • the humidifying device 26 uses, for example, a bubbling type that allows the atmosphere to pass through the water stored in the container, a spray nozzle type that injects water vapor into a mist with respect to the atmosphere, and a hollow fiber membrane having high water vapor permeability. It is a membrane exchange type.
  • the control unit 20 is electrically connected to the dew point measurement unit 22, the dew point adjustment device 24, the first control valve 27, the second control valve 28, and the heating unit 16.
  • the control unit 20 can be configured by using a computer including a calculation unit such as a CPU (Central Processing Unit) and a memory unit such as a RAM (Random Access Memory) and a ROM (Read Only Memory).
  • the control unit 20 controls the gas supply units 9, 28 and the dew point adjustment units 24, 27 based on the dew point measured by the dew point measurement unit 22. That is, the control unit 20 controls the supply amount of the reducing gas supplied from the gas supply device 9 by controlling the opening degree of the second control valve 28. Further, the control unit 20 controls the circulation amount of the atmospheric gas by the dew point adjusting device 24 by controlling the opening degree of the first control valve 27. This makes it possible to automate bright annealing (heat treatment).
  • the control unit 20 controls the dehumidifying device 25 or the humidifying device 26 in the dew point adjusting device 24 to operate.
  • the control unit 20 controls the dehumidifying device 25 to operate, the moisture contained in the atmosphere is removed, so that the dew point of the atmosphere, that is, the amount of moisture is reduced.
  • the control unit 20 controls the humidifying device 26 to operate, the dew point of the atmosphere, that is, the amount of water increases, due to the increase in the amount of water contained in the atmosphere. This makes it possible to automate bright annealing (heat treatment).
  • the water content in the atmosphere is increased by using hydrogen gas having a high dew point as a reducing gas. It is possible to raise the dew point of the atmosphere.
  • the control unit 20 controls the second control valve 28 based on the dew point of the atmosphere measured by the dew point measuring unit 22 to control the reducing gas supplied by the gas supply device 9.
  • the dew point of the atmosphere in the furnace body 10 including the heating zone 12 can be adjusted.
  • This makes it possible to automate bright annealing (heat treatment).
  • hydrogen gas having an extremely low dew point or hydrogen gas having a high dew point is used as the reducing gas supplied from the gas supply device 9 according to the amount of water brought into the furnace body 10 from the outside air.
  • the gas supply device 9 and the second control valve 28 act as the dew point adjustment device 24a.
  • the dew point adjusting device 24a can be configured by a simple configuration.
  • FIG. 2 is a diagram schematically explaining the relationship between the temperature and the dew point of the atmosphere.
  • the horizontal axis represents the annealing temperature in the heating zone 12 and the equilibrium temperature of oxidation-reduction of SiO 2
  • the vertical axis represents the dew point of the atmosphere in the heating zone 12.
  • A is a straight line indicating a dew point at ⁇ 30 ° C.
  • S is an equilibrium curve of oxidation-reduction of SiO 2. If the dew point is higher than the equilibrium curve S, SiO 2 is oxidized, and if the dew point is lower than the equilibrium curve S, SiO 2 is reduced.
  • intersections of the straight line A with the annealing temperatures of 800 ° C. and 1250 ° C. are a and b, respectively, and the intersections of the equilibrium curve S with the equilibrium temperatures of 800 ° C. and 1250 ° C. are c and d, respectively. These temperatures and intersections correspond to, for example, annealing of stainless steel.
  • the dew point of the atmosphere corresponds to the amount of water contained in the atmosphere. For example, if the dew point is -30 ° C, the water content is about 338 (g / m 3 ), if the dew point is -35 ° C, the water content is about 203 (g / m 3 ), and if the dew point is -40 ° C, the water content is about 119 (g / m 3).
  • the straight line A in FIG. 2 indicates the maximum dew point that suppresses the formation of the oxide film on the metal strip 3.
  • the intersection point a is the maximum dew point at 800 ° C.
  • the intersection b is the maximum dew point at 1250 ° C.
  • the upper limit dew point of the atmosphere When commercializing a brilliant stainless steel metal strip 3, it is suitable to adjust the upper limit dew point of the atmosphere to -30 ° C or less.
  • the upper limit dew point of the atmosphere In order to obtain the metal strip 3 having a higher degree of brilliance in the stainless steel material, the upper limit dew point of the atmosphere may be adjusted to ⁇ 45 ° C. or lower. In order to obtain the metal strip 3 having a higher degree of brilliance, the upper limit dew point of the atmosphere may be adjusted to ⁇ 65 ° C. (straight line X in the figure) or less. Therefore, in the stainless steel material, the upper limit dew point that enables the metal strip 3 to have brilliance is set in the range of ⁇ 30 ° C. to ⁇ 65 ° C., depending on the degree of brilliance of the metal strip 3 to be brilliantly annealed. Will be done. According to this configuration, a metal strip 3 having a desired brilliance can be obtained.
  • a heat insulating material 17 made of ceramic fiber is arranged on the inner surface of the furnace wall (inner wall of the furnace).
  • the bricks expand and contract when the temperature inside the furnace is raised or lowered. Therefore, there is a problem that dust is generated and the quality of the metal strip 3 is deteriorated.
  • the horizontal bright quenching furnace 1 of the present application by using a ceramic fiber containing SiO 2 as the heat insulating material 17, it is possible to suppress the generation of dust and obtain a high quality metal strip 3.
  • the reduction resistance of SiO 2 contained in the ceramic fiber is lower than that of Al 2 O 3 (alumina), and when the ceramic fiber is used in a highly reducing atmosphere, the reduction of SiO 2 causes the ceramic fiber to deteriorate. It is thought that it becomes brittle and dust is generated.
  • the inventors of the present application have made the oxidation-reduction property (thermodynamic property) of SiO 2 so that the heat insulating material 17 made of ceramic fiber containing SiO 2 can be used even in a highly reducing atmosphere. I paid attention to.
  • the region above the equilibrium curve S is the region where SiO 2 maintains an oxidized state
  • the region below the equilibrium curve S is SiO. This is the region where 2 is reduced.
  • the dew point at the intersection c where the oxidation-reduction equilibrium curve S of SiO 2 intersects the equilibrium temperature 800 ° C. is about ⁇ 95 ° C.
  • the dew point at the intersection d where the equilibrium temperature 1250 ° C. intersects is about ⁇ 60 ° C. ..
  • the dew point is a lower limit dew point that disables reduction of SiO 2 contained in the heat insulating material 17 at an equilibrium temperature of 800 ° C. to 1250 ° C. suitable for bright annealing of a stainless steel material, for example. Therefore, when the annealing temperature of the heating zone 12 is in the range of 800 ° C.
  • the control unit 20 can prevent the SiO 2 from being reduced by controlling the dew point of the atmosphere so as not to fall below the equilibrium curve S. .. As a result, it is possible to prevent dust from being generated due to deterioration of the heat insulating material 17 made of ceramic fiber, and to obtain a high-quality metal strip 3.
  • the dew point of the atmosphere is within the region surrounded by the intersections a, b, d and c in FIG.
  • the control unit 20 controls the dew point adjusting units 24 and 27 so as to be maintained.
  • the metal strip 3 can have a brilliant property, and deterioration of the heat insulating material 17 due to reduction of SiO 2 contained in the heat insulating material 17 can be prevented.
  • FIG. 5 is a schematic cross-sectional view of the heat treatment apparatus 1 according to the second embodiment.
  • the bright bleaching furnace (heat treatment apparatus) 1 includes a furnace body 10, a gas supply unit 9, a dew point measuring unit 22, and dew point adjusting units 24, 27a, 28a. Be prepared.
  • the bright annealing furnace (heat treatment apparatus) 1 according to the second embodiment omits a control unit 20 such as a computer. There is. Therefore, the operator who operates the brilliant quenching furnace (heat treatment apparatus) 1 substitutes for the control unit 20.
  • the operator can manually control at least one of the second control valve (dew point adjustment unit) 28a and the first control valve (dew point adjustment unit) 27a based on the dew point measured by the dew point measurement unit 22. That is, the operator can visually acquire the dew point measured by the dew point measuring unit 22 through a monitor or the like. Further, the operator can control the supply amount of the reducing gas supplied from the gas supply device 9 by manually controlling the second control valve (dew point adjusting unit) 28a based on the measured dew point. Further, the operator can control the circulation amount of the atmospheric gas by the dew point adjusting device 24 by controlling the first adjusting valve (dew point adjusting unit) 27a based on the measured dew point.
  • the dehumidifying device 25 in the dew point adjusting device 24 controls the dehumidifying device 25 in the dew point adjusting device 24 to operate, the moisture contained in the atmosphere is removed, and the dew point of the atmosphere, that is, the amount of moisture is reduced. Further, when the operator controls the humidifying device 26 in the dew point adjusting device 24 to operate, the moisture contained in the atmosphere increases, so that the dew point of the atmosphere, that is, the amount of moisture increases.
  • the dew point (that is, the amount of water) of the atmosphere in the heating zone 12 is maintained between the upper limit dew point and the lower limit dew point, so that the amount of water in the reducing atmosphere maintains the brilliance of the metal strip 3 and insulates it. It becomes appropriate for preventing reduction of SiO 2 contained in the material 17.
  • the metal strip 3 can have a brilliant property, and deterioration of the heat insulating material 17 due to reduction of SiO 2 contained in the heat insulating material 17 can be prevented.
  • the dew point adjusting device 24 (dehumidifying device 25 and humidifying device 26) is further omitted in addition to the control unit 20, and the gas supply device 9 and the second adjusting valve (dew point adjusting unit) 28a are dew point. It can also be an adjusting device 24a. As a result, the dew point adjusting device 24a can be easily configured.
  • the operator can control the dew point adjusting device 24a based on the dew point of the atmosphere measured by the dew point measuring unit 22. That is, the operator can visually acquire the dew point measured by the dew point measuring unit 22 through a monitor or the like. Further, the operator can control the flow rate of the reducing gas supplied by the gas supply device 9 by manually controlling the second control valve (dew point adjusting unit) 28a based on the measured dew point.
  • the dew point (that is, the amount of water) of the atmosphere in the heating zone 12 is maintained between the upper limit dew point and the lower limit dew point, so that the amount of water in the reducing atmosphere maintains the brilliance of the metal strip 3 and insulates it. It becomes appropriate for preventing reduction of SiO 2 contained in the material 17.
  • the metal strip 3 can have a brilliant property, and deterioration of the heat insulating material 17 due to reduction of SiO 2 contained in the heat insulating material 17 can be prevented.
  • the manual control in the second embodiment does not need to be continuously performed by the operator, and the operator monitors the dew point occasionally or periodically, and if there is no abnormality, the operator particularly controls the dew point. Including the case where is not performed.
  • the operator acquires the dew point measured by the dew point measuring unit 22, and maintains the dew point between the upper limit dew point and the lower limit dew point based on the dew point measured by the dew point measuring unit 22.
  • At least one of the dew point adjusting units 27a and 28a can be controlled so as to drip.
  • the bright burning blunting furnace (heat treatment device) 1 can also be a vertical furnace in which the furnace body 10 extends in the vertical direction (vertical direction).
  • an inlet seal band may be provided on the upstream side of the heating zone 12 in the transport direction, and the inlet seal roll 13 may be arranged on the inlet seal band.
  • An outlet seal band may be provided on the downstream side of the cooling band 14 in the transport direction, and the outlet seal roll 15 may be arranged on the outlet seal band.
  • the heating zone 12 may be composed of an entrance seal zone, pre-tropical and even-tropical (neither shown) or the like.
  • the cooling zone 14 may be composed of an outlet seal zone, a quenching zone, a slow cooling zone (none of which are shown), or the like.
  • the bright bleaching furnace 1 shown in FIG. 1 is provided with both the dehumidifying device 25 and the humidifying device 26, but it is also possible to have a configuration in which either the dehumidifying device 25 or the humidifying device 26 is provided.
  • FIG. 3 shows an equilibrium curve C of oxidation-reduction of Cr 2 O 3 (chromium oxide) in which the Cr component in the stainless steel material is oxidized.
  • the upper limit dew point is set to ⁇ 30 ° C., but it is also possible to prevent the oxidation of the stainless steel material by controlling the dew point of the atmosphere so as not to exceed the oxidation-reduction equilibrium curve C of Cr 2 O 3. Conceivable. Therefore, in the case of the stainless steel material, the control unit 20 controls the dew point adjusting units 24 and 24a so that the dew point of the atmosphere is maintained in the region surrounded by the intersections e, f, d and c in FIG. May be good.
  • the metal strip 3 that is brightly annealed in a reducing atmosphere can be used for various metal materials such as pure metals such as nickel, titanium and copper, low expansion alloys, magnetic alloys, heat-resistant alloys and corrosion-resistant alloys, in addition to the above-mentioned stainless steel materials. Is also applicable.
  • the heat treatment apparatus 1 is A heating zone 12 for heating the metal strip 3 and A heat insulating material 17 made of ceramic fiber containing SiO 2 and used as an inner wall of the heating zone 12 and
  • the heating zone 12 is provided with gas supply units 9, 28, 28a for supplying reducing gas.
  • the dew point is maintained between the upper limit dew point that allows the metal strip 3 to have brilliance and the lower limit dew point that disables the reduction of the SiO 2 contained in the heat insulating material 17.
  • the metal strip 3 is brightly annealed in a reducing atmosphere.
  • the dew point (that is, the water content) of the atmosphere in the heating zone 12 is maintained between the upper limit dew point and the lower limit dew point, so that the water content in the reducing atmosphere is the brilliance of the metal strip 3. It becomes suitable for maintenance and prevention of reduction of SiO 2 contained in the heat insulating material 17. As a result, the metal strip 3 can have a brilliant property, and deterioration of the heat insulating material 17 due to reduction of SiO 2 contained in the heat insulating material 17 can be prevented.
  • the heat treatment apparatus 1 is A heat treatment apparatus 1 for brightly annealing a metal strip 3 in a reducing atmosphere.
  • a furnace body 10 having a heating zone 12 for heating the metal strip 3 and a cooling zone 14 provided on the downstream side of the metal strip 3 in the transport direction with respect to the heating zone 12.
  • a heat insulating material 17 made of ceramic fiber containing SiO 2 and used as an inner wall of the heating zone 12 and Gas supply units 9, 28, 28a for supplying reducing gas into the furnace body 10 and
  • a dew point measuring unit 22 for measuring the dew point of the atmosphere in the heating zone 12 and
  • a dew point adjusting unit 24, 24a, 27, 27a, 28, 28a for adjusting the dew point is provided.
  • the upper limit dew point that enables the metal strip 3 to have brilliance and the lower limit that disables the reduction of the SiO 2 contained in the heat insulating material 17 The dew point adjusting units 24, 24a, 27, 27a, 28, 28a are controlled so that the dew point is maintained between the dew point and the dew point.
  • the dew point (that is, the water content) of the atmosphere in the heating zone 12 is maintained between the upper limit dew point and the lower limit dew point, so that the water content in the reducing atmosphere is the brilliance of the metal strip 3. It becomes suitable for maintenance and prevention of reduction of SiO 2 contained in the heat insulating material 17. As a result, the metal strip 3 can have a brilliant property, and deterioration of the heat insulating material 17 due to reduction of SiO 2 contained in the heat insulating material 17 can be prevented.
  • control of the dew point adjusting units 24, 27, 28 is performed by the control unit 20.
  • the upper limit dew point is ⁇ 30 ° C.
  • a metal strip 3 having a brilliant property can be obtained.
  • the upper limit dew point is set in the range of ⁇ 30 ° C. to ⁇ 65 ° C., depending on the degree of brightness of the metal strip 3 to be brightly annealed.
  • the metal strip 3 having the desired brilliance can be obtained.
  • the dew point adjusting unit 24 includes at least one of a dehumidifying device 25 and a humidifying device 26.
  • the dew point of the atmosphere in the heating zone 12 can be appropriately adjusted according to the dew point of the reducing gas supplied by the gas supply units 9, 28, 28a and the dew point of the target atmosphere.
  • the gas supply units 9, 28, 28a include a gas supply device 9 and a control valve 28, 28a for adjusting the flow rate of the reducing gas supplied by the gas supply device 9, and the gas supply device 9 and the gas supply unit 9, 28, 28a are provided.
  • the control valves 28, 28a act as the dew point adjustment portions 24, 24a.
  • the dew point adjusting devices 24 and 24a can be configured by a simple configuration.
  • the heat treatment apparatus 1 is a horizontal furnace in which the furnace body 10 extends in the lateral direction.
  • the transport mechanism for transporting the metal strip 3 can be simplified, and the height of the heat treatment apparatus 1 can be suppressed from increasing. Further, since the collapse of the ceramic fiber and the generation of dust can be prevented, the lightweight ceramic fiber heat insulating material 17 can be used even in a horizontal furnace having a large ceiling area.
  • the metal strip 3 is made of a stainless steel material containing Cr.
  • the formation of the oxide film on the metal strip 3 is suppressed, and the metal strip 3 can have a brilliant property.
  • the temperature range of the heating zone 12 is 800 ° C. to 1250 ° C.
  • the metal strip 3 can be heated at a temperature suitable for bright annealing.
  • the reducing gas includes hydrogen gas.
  • the metal strip 3 can be reduced and brilliantly annealed.

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Abstract

Provided is a heat treatment apparatus which makes it possible to prevent the deterioration of a heat insulation material made from a ceramic fiber containing SiO2 even in a reductive atmosphere and can be used for the bright annealing of a metal strip. The heat treatment apparatus 1 is provided with a heating zone 12 in which a metal strip 3 is heated, a heat insulation material 17 which is used as an in-furnace wall of the heating zone 12 and is made from a ceramic fiber containing SiO2, and gas supply units 9, 28, 28a which supply a reducing gas to the heating zone 12, wherein the metal strip 3 is bright-annealed in a reductive atmosphere in such a manner that a dew point can be kept between an upper limit dew point at which the metal strip 3 can have photoluminescence and a lower limit dew point at which SiO2 contained in the heat insulation material 17 cannot be reduced.

Description

熱処理装置Heat treatment equipment
 この発明は、金属ストリップを光輝焼鈍するための熱処理装置に関する。 The present invention relates to a heat treatment apparatus for brightly annealing a metal strip.
 冷間圧延で生じた金属ストリップの内部応力を除去するために、金属ストリップの光輝焼鈍を還元雰囲気中で行う熱処理装置が知られている。 A heat treatment apparatus is known in which bright annealing of a metal strip is performed in a reducing atmosphere in order to remove the internal stress of the metal strip generated by cold rolling.
 特許文献1は、低温保持帯が鋼板からなるマッフル構造を有する溶融メッキ用連続焼鈍炉であり、金属ストリップが水平方向に搬送されるいわゆる横型炉を開示する。特許文献2は、炉内が耐火レンガで内張りされた金属ストリップの横型光輝連続焼鈍炉を開示する。特許文献3は、炉内の断熱材がセラミックファイバーで構成されたニッケルメッキ薄鋼板の製造設備を開示する。 Patent Document 1 discloses a so-called horizontal furnace in which a hot-dip galvanizing continuous annealing furnace having a muffle structure in which a low-temperature holding zone is made of a steel plate and a metal strip is conveyed in the horizontal direction. Patent Document 2 discloses a horizontal bright continuous annealing furnace of a metal strip whose inside is lined with refractory bricks. Patent Document 3 discloses a manufacturing facility for a nickel-plated thin steel sheet in which the heat insulating material in the furnace is made of ceramic fiber.
実公平03-1472号公報Jitsufuku No. 03-1472 Gazette 特許4268281号公報Japanese Patent No. 4268281 特開2003-201595号公報Japanese Unexamined Patent Publication No. 2003-201595
 特許文献1では、炉体のマッフル構造が鋼板からなるため、高温での加熱によって変形が生じる。特に横型炉の場合、天井が鋼板で製作されている区間が長いため、自重によって天井が垂れ下がり、形状的なゆがみが大きくなり、炉内の気流に乱れが生じて炉内の温度分布が悪くなる。特許文献2では、耐火レンガの変形は起こりにくいが、耐火レンガの重量が大きいため、組立や保守や交換のときの作業性が劣り、焼鈍炉の重量も重くなるので、焼鈍炉を耐荷重性のある場所に設置する必要がある。 In Patent Document 1, since the muffle structure of the furnace body is made of steel plate, it is deformed by heating at a high temperature. Especially in the case of a horizontal furnace, since the section where the ceiling is made of steel plate is long, the ceiling hangs down due to its own weight, the shape distortion becomes large, the air flow in the furnace is turbulent, and the temperature distribution in the furnace deteriorates. .. In Patent Document 2, deformation of the refractory brick is unlikely to occur, but since the weight of the refractory brick is large, workability during assembly, maintenance and replacement is inferior, and the weight of the annealing furnace is also heavy. It is necessary to install it in the place where there is.
 特許文献3では、約800℃で鋼板の焼鈍とニッケルメッキの拡散処理とを非還元雰囲気中で行うので、セラミックファイバーが使用されている。セラミックファイバーは、軽量であり作業性に優れているが、SiOを含むため、高温の還元雰囲気中では、SiOの還元が起こり、SiOがSiに変化する。そのため、セラミックファイバーの崩壊が起こり、セラミックファイバーの保守や交換を頻繁に行う必要がある。セラミックファイバーが崩壊するときには、粉塵が発生し、粉塵が金属ストリップの上に落下する。特に、横型炉の場合、天井の面積が大きくなるため、粉塵の落下量が多くなり、金属ストリップの品質が低下する。 In Patent Document 3, ceramic fibers are used because the annealing of the steel sheet and the diffusion treatment of nickel plating are performed at about 800 ° C. in a non-reducing atmosphere. Ceramic fibers is excellent in light weight and workability, because they contain SiO 2, in a high temperature reducing atmosphere, occurs the reduction of SiO 2, SiO 2 is changed to Si. Therefore, the ceramic fiber collapses, and it is necessary to frequently maintain and replace the ceramic fiber. When the ceramic fiber collapses, dust is generated and the dust falls onto the metal strip. In particular, in the case of a horizontal furnace, the area of the ceiling becomes large, so that the amount of dust falling increases and the quality of the metal strip deteriorates.
 そこで、この発明の課題は、還元雰囲気中でも、SiOを含むセラミックファイバー製の断熱材の劣化を抑制できる、金属ストリップを光輝焼鈍するための熱処理装置を提供することにある。 Therefore, an object of the present invention is to provide a heat treatment apparatus for brightly anhydrating a metal strip, which can suppress deterioration of a heat insulating material made of a ceramic fiber containing SiO 2 even in a reducing atmosphere.
 上記課題を解決するため、この発明の一態様に係る熱処理装置は、
 金属ストリップを加熱する加熱帯と、
 前記加熱帯の炉内壁として使用されて、SiOを含むセラミックファイバー製である断熱材と、
 前記加熱帯に還元性ガスを供給するガス供給部とを備え、
 前記金属ストリップが光輝性を有することを可能にする上限露点と、前記断熱材に含まれる前記SiOの還元を不可にする下限露点との間で、露点が保たれるように、前記金属ストリップを還元雰囲気中で光輝焼鈍することを特徴とする。
In order to solve the above problems, the heat treatment apparatus according to one aspect of the present invention is provided.
A heating band that heats the metal strip,
A heat insulating material made of ceramic fiber containing SiO 2 and used as an inner wall of the heating zone.
A gas supply unit for supplying a reducing gas to the heating zone is provided.
The metal strip is maintained so that a dew point is maintained between an upper dew point that allows the metal strip to have brilliance and a lower dew point that prevents reduction of the SiO 2 contained in the insulating material. It is characterized by brightly bleaching in a reducing atmosphere.
 上記課題を解決するため、この発明の一態様に係る熱処理装置は、
 金属ストリップを還元雰囲気中で光輝焼鈍するための熱処理装置であって、前記熱処理装置は、
 前記金属ストリップを加熱する加熱帯と、前記加熱帯に対して前記金属ストリップの搬送方向下流側に設けられる冷却帯とを有する炉体と、
 前記加熱帯の炉内壁として使用されて、SiOを含むセラミックファイバー製である断熱材と、
 前記炉体内に還元性ガスを供給するガス供給部と、
 前記加熱帯における雰囲気の露点を測定する露点測定部と、
 前記露点を調整する露点調整部とを備え、
 前記露点測定部で測定された前記露点に基づいて、前記金属ストリップが光輝性を有することを可能にする上限露点と、前記断熱材に含まれる前記SiOの還元を不可にする下限露点との間で、前記露点が保たれるように、前記露点調整部が制御されることを特徴とする。
In order to solve the above problems, the heat treatment apparatus according to one aspect of the present invention is provided.
A heat treatment apparatus for brightly annealing a metal strip in a reducing atmosphere.
A furnace body having a heating zone for heating the metal strip and a cooling zone provided on the downstream side of the metal strip in the transport direction with respect to the heating zone.
A heat insulating material made of ceramic fiber containing SiO 2 and used as an inner wall of the heating zone.
A gas supply unit that supplies reducing gas into the furnace body and
A dew point measuring unit that measures the dew point of the atmosphere in the heating zone,
A dew point adjusting unit for adjusting the dew point is provided.
Based on the dew point measured by the dew point measuring unit, the upper limit dew point that enables the metal strip to have brilliance and the lower limit dew point that disables the reduction of the SiO 2 contained in the heat insulating material. The dew point adjusting unit is controlled so that the dew point is maintained between them.
 炉内の雰囲気における水分が少ないほど、金属ストリップ表面の酸化が抑制されるため金属ストリップの光輝性には有利であるが、炉内壁の断熱材として軽量なセラミックファイバーを用いようとすると、断熱材に含まれるSiOを還元させる方向に働くため断熱材には不利である。そこで、本願の発明者らは、光輝性維持とSiOの還元防止とを両立させることができる適正範囲の露点(すなわち水分量)が存在することに着目して、この発明に至った。 The less water in the atmosphere inside the furnace, the more the oxidation of the surface of the metal strip is suppressed, which is advantageous for the brilliance of the metal strip. It is disadvantageous for a heat insulating material because it works in the direction of reducing SiO 2 contained in. Therefore, the inventors of the present application have arrived at the present invention by paying attention to the existence of a dew point (that is, a water content) in an appropriate range capable of achieving both maintenance of brilliance and prevention of reduction of SiO 2.
 この発明によれば、加熱帯での雰囲気の露点(すなわち水分量)が、上限露点および下限露点の間で保たれることにより、還元雰囲気中での水分量が、金属ストリップの光輝性維持および断熱材に含まれるSiOの還元防止に対して適切になる。その結果、金属ストリップが光輝性を有することができるとともに、断熱材に含まれるSiOの還元による断熱材の劣化を防止できる。 According to the present invention, the dew point (that is, the water content) of the atmosphere in the heating zone is maintained between the upper limit dew point and the lower limit dew point, so that the water content in the reducing atmosphere maintains the brilliance of the metal strip. It is suitable for preventing the reduction of SiO 2 contained in the heat insulating material. As a result, the metal strip can have a brilliant property, and deterioration of the heat insulating material due to reduction of SiO 2 contained in the heat insulating material can be prevented.
第1実施形態に係る熱処理装置の模式的断面図である。It is a schematic cross-sectional view of the heat treatment apparatus which concerns on 1st Embodiment. 温度と雰囲気の露点との関係を模式的に説明する図である。It is a figure which schematically explains the relationship between the temperature and the dew point of an atmosphere. 温度と雰囲気の露点との関係を模式的に説明する図である。It is a figure which schematically explains the relationship between the temperature and the dew point of an atmosphere. 第1実施形態の他の態様に係る熱処理装置の模式的断面図である。It is a schematic cross-sectional view of the heat treatment apparatus which concerns on another aspect of 1st Embodiment. 第2実施形態に係る熱処理装置の模式的断面図である。It is a schematic cross-sectional view of the heat treatment apparatus which concerns on 2nd Embodiment. 第2実施形態の他の態様に係る熱処理装置の模式的断面図である。It is a schematic cross-sectional view of the heat treatment apparatus which concerns on another aspect of 2nd Embodiment.
 以下、図面を参照しながら、この発明に係る熱処理装置1の実施の形態を説明する。 Hereinafter, embodiments of the heat treatment apparatus 1 according to the present invention will be described with reference to the drawings.
 〔第1実施形態〕
 図1を参照しながら、第1実施形態に係る熱処理装置1を説明する。図1は、第1実施形態に係る熱処理装置1の模式的断面図である。
[First Embodiment]
The heat treatment apparatus 1 according to the first embodiment will be described with reference to FIG. FIG. 1 is a schematic cross-sectional view of the heat treatment apparatus 1 according to the first embodiment.
 図1に示すように、金属ストリップ3を連続的に光輝焼鈍する光輝焼鈍炉(熱処理装置)1は、炉体10と、ガス供給部9,28と、露点測定部22と、露点調整部24,27と、制御部20とを備える。図1に示した光輝焼鈍炉(熱処理装置)1は、炉体が横方向(水平方向)に延在する横型炉である。横型炉は、金属ストリップ3を搬送する搬送機構を簡易にでき、熱処理装置1の高さが高くなることを抑制できる。 As shown in FIG. 1, the bright tanning furnace (heat treatment device) 1 that continuously brightly blisters the metal strip 3 includes a furnace body 10, gas supply units 9 and 28, a dew point measurement unit 22, and a dew point adjustment unit 24. , 27 and a control unit 20. The bright quenching furnace (heat treatment apparatus) 1 shown in FIG. 1 is a horizontal furnace in which the furnace body extends in the horizontal direction (horizontal direction). In the horizontal furnace, the transport mechanism for transporting the metal strip 3 can be simplified, and the height of the heat treatment apparatus 1 can be suppressed from increasing.
 金属ストリップ3は、図1において、左から右に水平に搬送される。金属ストリップ3は、例えば、Crを含むステンレス材からなる。Crを含むステンレス材は、例えば、オーステナイト系ステンレスのSUS304やフェライト系のステンレスのSUS430である。 The metal strip 3 is horizontally conveyed from left to right in FIG. The metal strip 3 is made of, for example, a stainless steel material containing Cr. The stainless steel material containing Cr is, for example, SUS304 of austenitic stainless steel or SUS430 of ferritic stainless steel.
 炉体10は、鋼製の箱体からなり、加熱帯12と冷却帯14とを有する。加熱帯12は、横方向(水平方向)に延在して、金属ストリップ3の搬送方向上流側(金属ストリップ3の入側)に設けられる。加熱帯12は、加熱部16によって加熱される。加熱部16は、例えば、電熱ヒーターである。制御部20は、図示しない温度測定部によって測定された温度に基づいて、加熱帯12が所定の焼鈍温度(ここでは、焼鈍における加熱工程および冷却工程のうちの加熱工程での温度をいう。)になるように制御する。本願での焼鈍温度は、加熱帯12における炉内雰囲気温度を指している。例えば一般的なステンレス材では、光輝焼鈍に適した焼鈍温度は、800℃から1250℃の温度範囲であり、制御部20は、焼鈍温度が前記温度範囲内に収まるように加熱部16を制御する。 The furnace body 10 is made of a steel box and has a heating zone 12 and a cooling zone 14. The heating zone 12 extends in the lateral direction (horizontal direction) and is provided on the upstream side (inside side of the metal strip 3) in the transport direction of the metal strip 3. The heating zone 12 is heated by the heating unit 16. The heating unit 16 is, for example, an electric heater. In the control unit 20, the heating zone 12 has a predetermined annealing temperature based on the temperature measured by a temperature measuring unit (not shown) (here, the temperature in the heating step of the heating step and the cooling step in annealing). Control to be. The annealing temperature in the present application refers to the temperature of the atmosphere in the furnace in the heating zone 12. For example, in a general stainless steel material, the annealing temperature suitable for bright annealing is in the temperature range of 800 ° C. to 1250 ° C., and the control unit 20 controls the heating unit 16 so that the annealing temperature falls within the temperature range. ..
 冷却帯14は、金属ストリップ3の搬送方向下流側(金属ストリップ3の出側)に設けられる。冷却帯14では、焼鈍であるが故に主に放冷で冷却するため、加熱手段や断熱材17が配設されない。しかしながら、冷却帯14は、場合によっては何らかの冷却手段を備えることもできる。 The cooling zone 14 is provided on the downstream side of the metal strip 3 in the transport direction (outside of the metal strip 3). In the cooling zone 14, since it is annealed, it is mainly cooled by allowing it to cool, so that no heating means or heat insulating material 17 is arranged. However, the cooling zone 14 may be provided with some cooling means in some cases.
 炉体10の側壁や天井部や床部といった炉壁の内面(炉内壁)には、断熱材17が取り付けられている。断熱材17は、SiOを含むセラミックファイバー製である。断熱材17は、例えば、セラミックファイバー製のボードやブランケットを、炉壁に取り付けられた多数の棒状のスタッドに突き刺してワッシャー状の金具で押さえることによって保持する構成にすることができる。断熱材17は、Al(アルミナ)及びSiO(シリカ)を主成分とする繊維であり、例えば、Alの含有量が30~60質量%及びSiOの含有量が40~70質量%のアルミナ-シリカ質のセラミックファイバーである。 A heat insulating material 17 is attached to the inner surface (inner wall of the furnace) of the furnace wall such as the side wall, the ceiling, and the floor of the furnace body 10. The heat insulating material 17 is made of a ceramic fiber containing SiO 2. The heat insulating material 17 can be configured to hold, for example, a ceramic fiber board or blanket by piercing a large number of rod-shaped studs attached to the furnace wall and pressing them with washer-shaped metal fittings. The heat insulating material 17 is a fiber containing Al 2 O 3 (alumina) and SiO 2 (silica) as main components. For example, the content of Al 2 O 3 is 30 to 60% by mass and the content of SiO 2 is 40. ~ 70% by mass of alumina-silica ceramic fiber.
 光輝焼鈍炉1の炉体10の内部は、還元性の雰囲気ガスで満たされる。入口シールロール13および出口シールロール15が、炉体10の入口開口および出口開口のそれぞれに配設されている。入口シールロール13および出口シールロール15は、炉体10の内部を大気圧よりもわずかに高圧に保つことによって、炉体10内への外気の侵入を防止する。しかしながら、入口シールロール13および出口シールロール15で金属ストリップ3を挟んでいても、入口シールロール13では、微量の水分が、金属ストリップ3の表面に付着した状態で、外気から炉体10の内部に持ち込まれる。また、出口シールロール15では、同様の形態で、微量の雰囲気ガスが炉内から流出する。そのため、加熱帯12での雰囲気の露点(水分量)の測定および調整を常時行うことが必要となる。 The inside of the furnace body 10 of the bright burning blunt furnace 1 is filled with a reducing atmospheric gas. The inlet seal roll 13 and the outlet seal roll 15 are arranged at the inlet opening and the outlet opening of the furnace body 10, respectively. The inlet seal roll 13 and the outlet seal roll 15 prevent the intrusion of outside air into the furnace body 10 by keeping the inside of the furnace body 10 at a pressure slightly higher than the atmospheric pressure. However, even if the metal strip 3 is sandwiched between the inlet seal roll 13 and the outlet seal roll 15, the inlet seal roll 13 has a small amount of water adhering to the surface of the metal strip 3 from the outside air to the inside of the furnace body 10. Brought to. Further, in the outlet seal roll 15, a small amount of atmospheric gas flows out from the furnace in the same manner. Therefore, it is necessary to constantly measure and adjust the dew point (moisture content) of the atmosphere in the heating zone 12.
 ガス供給部は、ガス供給装置9および第2調節弁28を備え、ガス供給配管5を介して、還元性ガスを炉体10内に、言い換えると還元性ガスを加熱帯12に供給する。ガス供給装置9は、例えば、ガスボンベである。還元性ガスは、水素ガスを含むガスであり、例えば、水素ガスおよび窒素ガスが3:1で混合されたガスである。ガス供給配管5に設けられた第2調節弁28の開度を調整することにより、還元性ガスの供給量が制御される。第2調節弁28の開度は、制御部20によって制御される。還元性ガスの供給により、入口シールロール13および出口シールロール15から漏洩した分が補充される。なお、図1に示した光輝焼鈍炉1では、ガス供給配管5を、冷却帯14の上流側に配置する構成としているが、還元性ガスの供給位置は特に限定されない。ガス供給配管5から供給された還元性ガスは、雰囲気ガスとして、加熱帯12を含む炉体10内の全体を拡散したあと、炉体10の外に出て行く。 The gas supply unit includes a gas supply device 9 and a second control valve 28, and supplies reducing gas into the furnace body 10 or, in other words, reducing gas to the heating zone 12 via the gas supply pipe 5. The gas supply device 9 is, for example, a gas cylinder. The reducing gas is a gas containing hydrogen gas, for example, a gas in which hydrogen gas and nitrogen gas are mixed at a ratio of 3: 1. The amount of reducing gas supplied is controlled by adjusting the opening degree of the second control valve 28 provided in the gas supply pipe 5. The opening degree of the second control valve 28 is controlled by the control unit 20. By supplying the reducing gas, the amount leaked from the inlet seal roll 13 and the outlet seal roll 15 is replenished. In the bright quenching furnace 1 shown in FIG. 1, the gas supply pipe 5 is arranged on the upstream side of the cooling zone 14, but the supply position of the reducing gas is not particularly limited. The reducing gas supplied from the gas supply pipe 5 diffuses the entire inside of the furnace body 10 including the heating zone 12 as an atmospheric gas, and then goes out of the furnace body 10.
 従来、ガス供給装置9から供給される還元性ガスは、低露点(すなわち低水分量)のもの、例えば、JIS水素1級で露点が-70℃のものであった。しかしながら、本願では、除湿装置25や加湿装置26を備える露点調整部24によって、炉内の雰囲気の露点が調整可能であるので、ガス供給装置9から供給される還元性ガスは、必ずしも低露点(すなわち低水分量)である必要はない。すなわち、ガス供給装置9から供給される還元性ガスとして、従来のJIS水素1級よりも多くの水分量を含むもの、例えば、JIS水素2級で露点が-60℃相当のものも使用可能である。 Conventionally, the reducing gas supplied from the gas supply device 9 has a low dew point (that is, a low water content), for example, a JIS hydrogen first grade gas having a dew point of −70 ° C. However, in the present application, since the dew point of the atmosphere in the furnace can be adjusted by the dew point adjusting unit 24 including the dehumidifying device 25 and the humidifying device 26, the reducing gas supplied from the gas supply device 9 does not necessarily have a low dew point ( That is, it does not have to have a low water content). That is, as the reducing gas supplied from the gas supply device 9, a gas containing a larger amount of water than the conventional JIS hydrogen 1st grade, for example, a JIS hydrogen 2nd grade having a dew point equivalent to -60 ° C can be used. is there.
 露点測定部22は、露点測定配管6を介して、炉体10の加熱帯12における雰囲気(以下、「雰囲気ガス」ということがある。)の露点を測定する。露点測定部22は、例えば、静電容量式露点計や鏡面冷却式露点計である。露点の測定データは、制御部20に送られて、制御部20のメモリ部に保存される。なお、図1に示した光輝焼鈍炉1では、露点測定配管6を、加熱帯12の下流側に配置する構成としているが、露点の測定位置は特に限定されない。 The dew point measuring unit 22 measures the dew point of the atmosphere (hereinafter, may be referred to as “atmospheric gas”) in the heating zone 12 of the furnace body 10 via the dew point measuring pipe 6. The dew point measuring unit 22 is, for example, a capacitance type dew point meter or a mirror cooling type dew point meter. The dew point measurement data is sent to the control unit 20 and stored in the memory unit of the control unit 20. In the bright quenching furnace 1 shown in FIG. 1, the dew point measurement pipe 6 is arranged on the downstream side of the heating zone 12, but the dew point measurement position is not particularly limited.
 露点調整部は、露点調整装置24および第1調節弁27を備え、加熱帯12における雰囲気の露点を調整する。露点調整装置24は、除湿装置25および加湿装置26の少なくとも一方を備える。これにより、ガス供給部9,28によって供給される還元性ガスの露点と、目標とする雰囲気の露点とに応じて、加熱帯12における雰囲気の露点を適宜に調整できる。 The dew point adjusting unit includes a dew point adjusting device 24 and a first adjusting valve 27, and adjusts the dew point of the atmosphere in the heating zone 12. The dew point adjusting device 24 includes at least one of the dehumidifying device 25 and the humidifying device 26. As a result, the dew point of the atmosphere in the heating zone 12 can be appropriately adjusted according to the dew point of the reducing gas supplied by the gas supply units 9 and 28 and the dew point of the target atmosphere.
 露点調整装置24は、加熱帯12の搬送方向上流側に配設された入側配管7を通じて雰囲気の一部を抜き出し、抜き出した雰囲気の露点すなわち水分量を調整した後、加熱帯12の搬送方向下流側に配設された出側配管8を通じて炉体10内に戻す。雰囲気ガスが露点調整装置24および炉体10の間を循環することによって、加熱帯12における雰囲気の露点が、所定の露点に保たれる。 The dew point adjusting device 24 extracts a part of the atmosphere through the inlet pipe 7 arranged on the upstream side in the transport direction of the heating zone 12, adjusts the dew point, that is, the amount of water in the extracted atmosphere, and then transports the heating zone 12. It is returned to the inside of the furnace body 10 through the outlet pipe 8 arranged on the downstream side. By circulating the atmospheric gas between the dew point adjusting device 24 and the furnace body 10, the dew point of the atmosphere in the heating zone 12 is maintained at a predetermined dew point.
 露点調整装置24(すなわち除湿装置25および加湿装置26)は、制御部20によって制御される。入側配管7に設けられた第1調節弁27の開度を調整することにより、雰囲気ガスの循環量が制御される。第1調節弁27の開度は、制御部20によって制御される。 The dew point adjusting device 24 (that is, the dehumidifying device 25 and the humidifying device 26) is controlled by the control unit 20. The circulation amount of the atmospheric gas is controlled by adjusting the opening degree of the first control valve 27 provided in the inlet pipe 7. The opening degree of the first control valve 27 is controlled by the control unit 20.
 除湿装置25は、雰囲気中に含まれる水分の除去(雰囲気の除湿)を行い、雰囲気の露点を低下させる働きを有する。除湿装置25は、例えば、吸着剤が充填された吸着塔および脱離塔を有する。吸着剤は、モレキュラーシーブ(分子ふるい)などの合成ゼオライト、天然ゼオライト、活性炭、シリカゲル、アルミナ、活性アルミナなどである。吸着剤を用いた除湿は、除湿後の雰囲気の露点を容易に所定の露点に制御できるとともに、得られる雰囲気が極めて清浄である。 The dehumidifying device 25 has a function of removing moisture contained in the atmosphere (dehumidifying the atmosphere) and lowering the dew point of the atmosphere. The dehumidifying device 25 has, for example, an adsorption tower and a desorption tower filled with an adsorbent. The adsorbent is synthetic zeolite such as molecular sieve (molecular sieve), natural zeolite, activated carbon, silica gel, alumina, activated alumina and the like. In dehumidification using an adsorbent, the dew point of the atmosphere after dehumidification can be easily controlled to a predetermined dew point, and the obtained atmosphere is extremely clean.
 加湿装置26は、水蒸気または液相の水と、雰囲気とを混合した水分含有ガスを生成し、当該水分含有ガスを炉体10内に送り込むことによって、雰囲気への水分の付加(雰囲気の加湿)を行い、雰囲気の露点を上昇させる働きを有する。加湿装置26は、例えば、雰囲気を容器に貯留された水の中を通過させるバブリング式、雰囲気に対して水蒸気を霧状に噴射するスプレーノズル式、高い水蒸気透過性を有する中空糸膜を利用した膜交換式などである。
 制御部20は、露点測定部22と、露点調整装置24と、第1調節弁27と、第2調節弁28と、加熱部16とに電気的に接続されている。制御部20は、CPU(Central Processing Unit)などの演算部、RAM(Random Access Memory)およびROM(Read Only Memory)などのメモリ部を含むコンピュータなどを用いて構成することができる。
The humidifying device 26 generates a water-containing gas that is a mixture of water vapor or liquid phase water and an atmosphere, and sends the water-containing gas into the furnace body 10 to add water to the atmosphere (humidification of the atmosphere). It has the function of raising the dew point of the atmosphere. The humidifying device 26 uses, for example, a bubbling type that allows the atmosphere to pass through the water stored in the container, a spray nozzle type that injects water vapor into a mist with respect to the atmosphere, and a hollow fiber membrane having high water vapor permeability. It is a membrane exchange type.
The control unit 20 is electrically connected to the dew point measurement unit 22, the dew point adjustment device 24, the first control valve 27, the second control valve 28, and the heating unit 16. The control unit 20 can be configured by using a computer including a calculation unit such as a CPU (Central Processing Unit) and a memory unit such as a RAM (Random Access Memory) and a ROM (Read Only Memory).
 制御部20は、露点測定部22で測定された露点に基づいて、ガス供給部9,28と露点調整部24,27とを制御する。すなわち、制御部20は、第2調節弁28の開度を制御することによって、ガス供給装置9から供給される還元性ガスの供給量を制御する。また、制御部20は、第1調節弁27の開度を制御することによって、露点調整装置24による雰囲気ガスの循環量を制御する。これにより、光輝焼鈍(熱処理)の自動化が可能になる。 The control unit 20 controls the gas supply units 9, 28 and the dew point adjustment units 24, 27 based on the dew point measured by the dew point measurement unit 22. That is, the control unit 20 controls the supply amount of the reducing gas supplied from the gas supply device 9 by controlling the opening degree of the second control valve 28. Further, the control unit 20 controls the circulation amount of the atmospheric gas by the dew point adjusting device 24 by controlling the opening degree of the first control valve 27. This makes it possible to automate bright annealing (heat treatment).
 制御部20は、露点調整装置24における除湿装置25または加湿装置26が作動するように制御する。制御部20は、除湿装置25が作動するように制御すると、雰囲気中に含まれる水分が除去されることによって、雰囲気の露点すなわち水分量が低下する。制御部20は、加湿装置26が作動するように制御すると、雰囲気中に含まれる水分が増加することによって、雰囲気の露点すなわち水分量が上昇する。これにより、光輝焼鈍(熱処理)の自動化が可能になる。 The control unit 20 controls the dehumidifying device 25 or the humidifying device 26 in the dew point adjusting device 24 to operate. When the control unit 20 controls the dehumidifying device 25 to operate, the moisture contained in the atmosphere is removed, so that the dew point of the atmosphere, that is, the amount of moisture is reduced. When the control unit 20 controls the humidifying device 26 to operate, the dew point of the atmosphere, that is, the amount of water increases, due to the increase in the amount of water contained in the atmosphere. This makes it possible to automate bright annealing (heat treatment).
 〔第1実施形態の他の態様〕
 前述のように、入口シールロール13によって金属ストリップ3を挟むシール構成にしていても、微量の水分が、金属ストリップ3の表面に付着した状態で、外気から炉体10の内部に持ち込まれるため、雰囲気の露点(水分量)が上昇していく。そこで、露点が極めて低い水素ガスを還元性ガスとして用いることにより、雰囲気中に含まれる水分を希釈して、雰囲気の露点を下げることができる。また、露点が極めて低い水素ガスを還元性ガスとして用いても、第2調節弁28によって還元性ガスの流量を減らすことによって、雰囲気の露点を上げることができる。さらに、何らかの手段によって、微量の水分が外気から炉体10の内部に持ち込まれることを防止できたとき、露点が高めの水素ガスを還元性ガスとして用いることにより、雰囲気中に含まれる水分を増加させて、雰囲気の露点を上げることができる。
[Other Aspects of First Embodiment]
As described above, even if the metal strip 3 is sandwiched by the inlet seal roll 13, a small amount of water is brought into the furnace body 10 from the outside air in a state of being attached to the surface of the metal strip 3. The dew point (moisture content) of the atmosphere rises. Therefore, by using hydrogen gas having an extremely low dew point as the reducing gas, the water content in the atmosphere can be diluted to lower the dew point in the atmosphere. Further, even if hydrogen gas having an extremely low dew point is used as the reducing gas, the dew point of the atmosphere can be raised by reducing the flow rate of the reducing gas by the second control valve 28. Further, when a small amount of water can be prevented from being brought into the furnace body 10 from the outside air by some means, the water content in the atmosphere is increased by using hydrogen gas having a high dew point as a reducing gas. It is possible to raise the dew point of the atmosphere.
 したがって、図1に示した除湿装置25や加湿装置26を用いることなく、加熱帯12における雰囲気の露点を調整することが可能になる。すなわち、図4に示すように、制御部20は、露点測定部22で測定した雰囲気の露点に基づいて、第2調節弁28を制御して、ガス供給装置9によって供給される還元性ガスの流量を調節することによって、加熱帯12を含む炉体10における雰囲気の露点を調整できる。これにより、光輝焼鈍(熱処理)の自動化が可能になる。ここで、外気から炉体10の内部に持ち込まれる水分量に応じて、露点が極めて低い水素ガスまたは露点が高めの水素ガスが、ガス供給装置9から供給される還元性ガスとして用いられる。このように、ガス供給装置9および第2調節弁28は、露点調整装置24aとして働く。これにより、簡易な構成によって露点調整装置24aを構成できる。 Therefore, it is possible to adjust the dew point of the atmosphere in the heating zone 12 without using the dehumidifying device 25 and the humidifying device 26 shown in FIG. That is, as shown in FIG. 4, the control unit 20 controls the second control valve 28 based on the dew point of the atmosphere measured by the dew point measuring unit 22 to control the reducing gas supplied by the gas supply device 9. By adjusting the flow rate, the dew point of the atmosphere in the furnace body 10 including the heating zone 12 can be adjusted. This makes it possible to automate bright annealing (heat treatment). Here, hydrogen gas having an extremely low dew point or hydrogen gas having a high dew point is used as the reducing gas supplied from the gas supply device 9 according to the amount of water brought into the furnace body 10 from the outside air. In this way, the gas supply device 9 and the second control valve 28 act as the dew point adjustment device 24a. Thereby, the dew point adjusting device 24a can be configured by a simple configuration.
 〔雰囲気の露点の制御〕
 上述したように、炉体10の加熱帯12における雰囲気中の水分が少ないほど、金属ストリップ3の表面の酸化が抑制されるため金属ストリップ3の光輝性には有利であるが、断熱材17に含まれるSiOを還元させる方向に働くため断熱材17には不利である。そこで、本願の発明者らは、光輝性維持とSiOの還元防止とを両立させることができる適正範囲の露点(すなわち水分量)が存在することに着目して、この発明に至った。
[Control of dew point of atmosphere]
As described above, the smaller the amount of water in the atmosphere in the heating zone 12 of the furnace body 10, the more the oxidation of the surface of the metal strip 3 is suppressed, which is advantageous for the brilliance of the metal strip 3, but the heat insulating material 17 It is disadvantageous to the heat insulating material 17 because it works in the direction of reducing the contained SiO 2. Therefore, the inventors of the present application have arrived at the present invention by paying attention to the existence of a dew point (that is, a water content) in an appropriate range capable of achieving both maintenance of brilliance and prevention of reduction of SiO 2.
 図2を参照しながら、加熱帯12における雰囲気の露点の制御を説明する。図2は、温度と雰囲気の露点との関係を模式的に説明する図である。図2において、横軸が加熱帯12における焼鈍温度およびSiOの酸化-還元の平衡温度を示し、縦軸が加熱帯12における雰囲気の露点を示す。図2において、Aは-30℃の露点を示す直線であり、SはSiOの酸化-還元の平衡曲線を示す。平衡曲線Sよりも露点が高いとSiOが酸化され、平衡曲線Sよりも露点が低いとSiOが還元される。そして、直線Aが焼鈍温度800℃および1250℃と交わる交点が、それぞれaおよびbであり、平衡曲線Sが平衡温度800℃および1250℃と交わる交点が、それぞれcおよびdである。これらの温度および交点は、例えば、ステンレス材の焼鈍に対応している。 Controlling the dew point of the atmosphere in the heating zone 12 will be described with reference to FIG. FIG. 2 is a diagram schematically explaining the relationship between the temperature and the dew point of the atmosphere. In FIG. 2, the horizontal axis represents the annealing temperature in the heating zone 12 and the equilibrium temperature of oxidation-reduction of SiO 2 , and the vertical axis represents the dew point of the atmosphere in the heating zone 12. In FIG. 2, A is a straight line indicating a dew point at −30 ° C., and S is an equilibrium curve of oxidation-reduction of SiO 2. If the dew point is higher than the equilibrium curve S, SiO 2 is oxidized, and if the dew point is lower than the equilibrium curve S, SiO 2 is reduced. The intersections of the straight line A with the annealing temperatures of 800 ° C. and 1250 ° C. are a and b, respectively, and the intersections of the equilibrium curve S with the equilibrium temperatures of 800 ° C. and 1250 ° C. are c and d, respectively. These temperatures and intersections correspond to, for example, annealing of stainless steel.
 雰囲気の露点は、雰囲気中に含まれる水分の水分量に対応している。例えば、露点が-30℃なら水分量が約338(g/m)、露点が-35℃なら水分量が約203(g/m)、露点が-40℃なら水分量が約119(g/m)、露点が-45℃なら水分量が約68(g/m)、露点が-50℃なら水分量が約38(g/m)、露点が-55℃なら水分量が約21(g/m)、露点が-60℃なら水分量が約11(g/m)、露点が-65℃なら水分量が約5.6(g/m)、露点が-70℃なら水分量が約2.7(g/m)である。したがって、雰囲気の露点が低くなるに従って、雰囲気中に含まれる水分の水分量が少なくなる。 The dew point of the atmosphere corresponds to the amount of water contained in the atmosphere. For example, if the dew point is -30 ° C, the water content is about 338 (g / m 3 ), if the dew point is -35 ° C, the water content is about 203 (g / m 3 ), and if the dew point is -40 ° C, the water content is about 119 (g / m 3). g / m 3), moisture content of about 68 if a dew point of -45 ℃ (g / m 3) , moisture content of about 38 if a dew point of -50 ℃ (g / m 3) , the water content if a dew point of -55 ° C. Is about 21 (g / m 3 ), if the dew point is -60 ° C, the water content is about 11 (g / m 3 ), if the dew point is -65 ° C, the water content is about 5.6 (g / m 3 ), and the dew point is about 5.6 (g / m 3). At −70 ° C., the water content is about 2.7 (g / m 3 ). Therefore, as the dew point of the atmosphere becomes lower, the amount of water contained in the atmosphere decreases.
 金属ストリップ3の表面が酸化されると、金属ストリップ3の表面には、酸化皮膜が形成される。金属ストリップ3が、Crを含むステンレス材である場合、CrおよびFeが酸素と化合した酸化皮膜が形成される。金属ストリップ3の表面酸化の抑制には、雰囲気の露点ができるだけ低いこと、すなわち雰囲気中に含まれる水分の水分量ができるだけ少ないことが望ましいと言われてきた。 When the surface of the metal strip 3 is oxidized, an oxide film is formed on the surface of the metal strip 3. When the metal strip 3 is a stainless steel material containing Cr, an oxide film in which Cr and Fe are combined with oxygen is formed. In order to suppress surface oxidation of the metal strip 3, it has been said that it is desirable that the dew point of the atmosphere is as low as possible, that is, the amount of water contained in the atmosphere is as small as possible.
 しかしながら、実際の熱処理工程では、金属ストリップ3の表面に形成される酸化皮膜の厚みが、或る厚みよりも薄くなると、金属ストリップ3の光輝性に及ぼす影響が少なくなることが解っている。よって、雰囲気の上限露点を-30℃以下にすることによって、金属ストリップ3における酸化皮膜の形成が抑制されて、金属ストリップ3が或る程度以上の光輝性を有し、製品上の問題はほとんど無い。図2における直線Aは、金属ストリップ3における酸化皮膜の形成を抑制する最上限の露点を示している。そして、交点aは800℃での最上限の露点であり、交点bは1250℃での最上限の露点である。 However, in the actual heat treatment step, it is known that when the thickness of the oxide film formed on the surface of the metal strip 3 is thinner than a certain thickness, the influence on the brilliance of the metal strip 3 is reduced. Therefore, by setting the upper dew point of the atmosphere to −30 ° C. or lower, the formation of an oxide film on the metal strip 3 is suppressed, the metal strip 3 has a certain degree of brilliance or more, and there are almost no problems in the product. There is no. The straight line A in FIG. 2 indicates the maximum dew point that suppresses the formation of the oxide film on the metal strip 3. The intersection point a is the maximum dew point at 800 ° C., and the intersection b is the maximum dew point at 1250 ° C.
 光輝性を有するステンレス材の金属ストリップ3を商品化する場合には、雰囲気の上限露点を-30℃以下に調整するのが適している。ステンレス材において、光輝性の度合いがより高い金属ストリップ3を得るためには、雰囲気の上限露点を-45℃以下に調整すればよい。光輝性の度合いがさらに高い金属ストリップ3を得るためには、雰囲気の上限露点を-65℃(図中の直線X)以下に調整すればよい。したがって、ステンレス材において、光輝焼鈍される金属ストリップ3の光輝性の度合いに応じて、金属ストリップ3が光輝性を有することを可能にする上限露点は、-30℃から-65℃の範囲に設定される。当該構成によれば、所望とする光輝性を有する金属ストリップ3を得ることができる。 When commercializing a brilliant stainless steel metal strip 3, it is suitable to adjust the upper limit dew point of the atmosphere to -30 ° C or less. In order to obtain the metal strip 3 having a higher degree of brilliance in the stainless steel material, the upper limit dew point of the atmosphere may be adjusted to −45 ° C. or lower. In order to obtain the metal strip 3 having a higher degree of brilliance, the upper limit dew point of the atmosphere may be adjusted to −65 ° C. (straight line X in the figure) or less. Therefore, in the stainless steel material, the upper limit dew point that enables the metal strip 3 to have brilliance is set in the range of −30 ° C. to −65 ° C., depending on the degree of brilliance of the metal strip 3 to be brilliantly annealed. Will be done. According to this configuration, a metal strip 3 having a desired brilliance can be obtained.
 炉壁の内面(炉内壁)には、セラミックファイバー製の断熱材17が配設される。従来、横型の光輝焼鈍炉1において、Al(アルミナ)を高純度で含有する高純度アルミナ質のレンガをアーチ積み構造で用いると、炉内温度を昇降するときのレンガの膨張・収縮によって、粉塵が発生して、金属ストリップ3の品質が低下するという問題がある。 A heat insulating material 17 made of ceramic fiber is arranged on the inner surface of the furnace wall (inner wall of the furnace). Conventionally, when high-purity alumina-based bricks containing Al 2 O 3 (alumina) with high purity are used in an arch-stacked structure in a horizontal bright annealing furnace 1, the bricks expand and contract when the temperature inside the furnace is raised or lowered. Therefore, there is a problem that dust is generated and the quality of the metal strip 3 is deteriorated.
 本願の横型の光輝焼鈍炉1では、断熱材17としてSiOを含むセラミックファイバー製を用いることによって、粉塵の発生を抑制して、高品質の金属ストリップ3を得ることを可能にする。しかしながら、セラミックファイバーに含まれるSiOの耐還元性は、Al(アルミナ)よりも低く、高還元性の雰囲気中でセラミックファイバーを使用すると、SiOの還元によってセラミックファイバーが劣化して脆くなり、粉塵が発生すると考えられる。 In the horizontal bright quenching furnace 1 of the present application, by using a ceramic fiber containing SiO 2 as the heat insulating material 17, it is possible to suppress the generation of dust and obtain a high quality metal strip 3. However, the reduction resistance of SiO 2 contained in the ceramic fiber is lower than that of Al 2 O 3 (alumina), and when the ceramic fiber is used in a highly reducing atmosphere, the reduction of SiO 2 causes the ceramic fiber to deteriorate. It is thought that it becomes brittle and dust is generated.
 本発明では、SiOを含むセラミックファイバー製の断熱材17が、高還元性の雰囲気中でも使用可能となるように、本願の発明者らは、SiOの酸化-還元特性(熱力学的特性)に着目した。図2に示すように、SiOの酸化-還元の平衡曲線Sを境にして、平衡曲線Sよりも上側が、SiOが酸化状態を保つ領域であり、平衡曲線Sよりも下側が、SiOが還元される領域である。 In the present invention, the inventors of the present application have made the oxidation-reduction property (thermodynamic property) of SiO 2 so that the heat insulating material 17 made of ceramic fiber containing SiO 2 can be used even in a highly reducing atmosphere. I paid attention to. As shown in FIG. 2, with the equilibrium curve S of oxidation-reduction of SiO 2 as a boundary, the region above the equilibrium curve S is the region where SiO 2 maintains an oxidized state, and the region below the equilibrium curve S is SiO. This is the region where 2 is reduced.
 SiOの酸化-還元の平衡曲線Sが平衡温度800℃と交わる交点cでの露点は、約-95℃であり、平衡温度1250℃と交わる交点dでの露点は、約-60℃である。当該露点は、例えばステンレス材の光輝焼鈍に適した800℃から1250℃の平衡温度において、断熱材17に含まれるSiOの還元を不可にする下限露点である。したがって、加熱帯12の焼鈍温度が800℃から1250℃の範囲であるとき、制御部20は、雰囲気の露点が平衡曲線Sを下回らないように制御することによって、SiOを還元させないようにできる。これにより、セラミックファイバー製の断熱材17の劣化で粉塵が発生することを防止して、高品質の金属ストリップ3を得ることができる。 The dew point at the intersection c where the oxidation-reduction equilibrium curve S of SiO 2 intersects the equilibrium temperature 800 ° C. is about −95 ° C., and the dew point at the intersection d where the equilibrium temperature 1250 ° C. intersects is about −60 ° C. .. The dew point is a lower limit dew point that disables reduction of SiO 2 contained in the heat insulating material 17 at an equilibrium temperature of 800 ° C. to 1250 ° C. suitable for bright annealing of a stainless steel material, for example. Therefore, when the annealing temperature of the heating zone 12 is in the range of 800 ° C. to 1250 ° C., the control unit 20 can prevent the SiO 2 from being reduced by controlling the dew point of the atmosphere so as not to fall below the equilibrium curve S. .. As a result, it is possible to prevent dust from being generated due to deterioration of the heat insulating material 17 made of ceramic fiber, and to obtain a high-quality metal strip 3.
 加熱帯12の焼鈍温度が800℃から1250℃の場合(例えば、金属ストリップ3がステンレス材の場合)、雰囲気の露点が、図2において交点a、b、dおよびcで囲まれた領域内に保たれるように、制御部20は露点調整部24,27を制御する。これにより、金属ストリップ3が光輝性を有することができるとともに、断熱材17に含まれるSiOの還元による断熱材17の劣化を防止できる。 When the annealing temperature of the heating zone 12 is 800 ° C. to 1250 ° C. (for example, when the metal strip 3 is made of stainless steel), the dew point of the atmosphere is within the region surrounded by the intersections a, b, d and c in FIG. The control unit 20 controls the dew point adjusting units 24 and 27 so as to be maintained. As a result, the metal strip 3 can have a brilliant property, and deterioration of the heat insulating material 17 due to reduction of SiO 2 contained in the heat insulating material 17 can be prevented.
 〔第2実施形態〕
 図5を参照しながら、第2実施形態に係る熱処理装置1を説明する。図5は、第2実施形態に係る熱処理装置1の模式的断面図である。
[Second Embodiment]
The heat treatment apparatus 1 according to the second embodiment will be described with reference to FIG. FIG. 5 is a schematic cross-sectional view of the heat treatment apparatus 1 according to the second embodiment.
 図5に示すように、第2実施形態に係る光輝焼鈍炉(熱処理装置)1は、炉体10と、ガス供給部9と、露点測定部22と、露点調整部24,27a,28aとを備える。図1に示す第1実施形態に係る光輝焼鈍炉(熱処理装置)1との比較で、第2実施形態に係る光輝焼鈍炉(熱処理装置)1は、例えばコンピュータなどの制御部20が省略されている。したがって、光輝焼鈍炉(熱処理装置)1の操作を行う操作者が、制御部20の代わりとなる。 As shown in FIG. 5, the bright bleaching furnace (heat treatment apparatus) 1 according to the second embodiment includes a furnace body 10, a gas supply unit 9, a dew point measuring unit 22, and dew point adjusting units 24, 27a, 28a. Be prepared. In comparison with the bright annealing furnace (heat treatment apparatus) 1 according to the first embodiment shown in FIG. 1, the bright annealing furnace (heat treatment apparatus) 1 according to the second embodiment omits a control unit 20 such as a computer. There is. Therefore, the operator who operates the brilliant quenching furnace (heat treatment apparatus) 1 substitutes for the control unit 20.
 操作者は、露点測定部22で測定された露点に基づいて、第2調節弁(露点調整部)28aおよび第1調節弁(露点調整部)27aの少なくとも一方を手動で制御できる。すなわち、操作者は、露点測定部22で測定された露点をモニターなどを介して目視によって取得することができる。また、操作者は、測定された露点に基づいて、第2調節弁(露点調整部)28aを手動で制御することによって、ガス供給装置9から供給される還元性ガスの供給量を制御できる。また、操作者は、測定された露点に基づいて、第1調節弁(露点調整部)27aを制御することによって、露点調整装置24による雰囲気ガスの循環量を制御できる。 The operator can manually control at least one of the second control valve (dew point adjustment unit) 28a and the first control valve (dew point adjustment unit) 27a based on the dew point measured by the dew point measurement unit 22. That is, the operator can visually acquire the dew point measured by the dew point measuring unit 22 through a monitor or the like. Further, the operator can control the supply amount of the reducing gas supplied from the gas supply device 9 by manually controlling the second control valve (dew point adjusting unit) 28a based on the measured dew point. Further, the operator can control the circulation amount of the atmospheric gas by the dew point adjusting device 24 by controlling the first adjusting valve (dew point adjusting unit) 27a based on the measured dew point.
 また、露点調整装置24における除湿装置25が作動するように操作者が制御することによって、雰囲気中に含まれる水分が除去されて、雰囲気の露点すなわち水分量が低下する。また、露点調整装置24における加湿装置26が作動するように操作者が制御することによって、雰囲気中に含まれる水分が増加することによって、雰囲気の露点すなわち水分量が上昇する。 Further, by controlling the dehumidifying device 25 in the dew point adjusting device 24 to operate, the moisture contained in the atmosphere is removed, and the dew point of the atmosphere, that is, the amount of moisture is reduced. Further, when the operator controls the humidifying device 26 in the dew point adjusting device 24 to operate, the moisture contained in the atmosphere increases, so that the dew point of the atmosphere, that is, the amount of moisture increases.
 これにより、加熱帯12での雰囲気の露点(すなわち水分量)が、上限露点および下限露点の間で保たれることにより、還元雰囲気中での水分量が、金属ストリップ3の光輝性維持および断熱材17に含まれるSiOの還元防止に対して適切になる。その結果、金属ストリップ3が光輝性を有することができるとともに、断熱材17に含まれるSiOの還元による断熱材17の劣化を防止できる。 As a result, the dew point (that is, the amount of water) of the atmosphere in the heating zone 12 is maintained between the upper limit dew point and the lower limit dew point, so that the amount of water in the reducing atmosphere maintains the brilliance of the metal strip 3 and insulates it. It becomes appropriate for preventing reduction of SiO 2 contained in the material 17. As a result, the metal strip 3 can have a brilliant property, and deterioration of the heat insulating material 17 due to reduction of SiO 2 contained in the heat insulating material 17 can be prevented.
 〔第2実施形態の他の態様〕
 図6に示すように、制御部20に加えてさらに露点調整装置24(除湿装置25および加湿装置26)が省略されており、ガス供給装置9および第2調節弁(露点調整部)28aを露点調整装置24aとすることもできる。これにより、露点調整装置24aを簡易に構成できる。操作者は、露点測定部22で測定した雰囲気の露点に基づいて、露点調整装置24aを制御できる。すなわち、操作者は、露点測定部22で測定された露点をモニターなどを介して目視によって取得することができる。また、操作者は、測定された露点に基づいて、第2調節弁(露点調整部)28aを手動で制御することによって、ガス供給装置9によって供給される還元性ガスの流量を制御できる。
[Other aspects of the second embodiment]
As shown in FIG. 6, the dew point adjusting device 24 (dehumidifying device 25 and humidifying device 26) is further omitted in addition to the control unit 20, and the gas supply device 9 and the second adjusting valve (dew point adjusting unit) 28a are dew point. It can also be an adjusting device 24a. As a result, the dew point adjusting device 24a can be easily configured. The operator can control the dew point adjusting device 24a based on the dew point of the atmosphere measured by the dew point measuring unit 22. That is, the operator can visually acquire the dew point measured by the dew point measuring unit 22 through a monitor or the like. Further, the operator can control the flow rate of the reducing gas supplied by the gas supply device 9 by manually controlling the second control valve (dew point adjusting unit) 28a based on the measured dew point.
 これにより、加熱帯12での雰囲気の露点(すなわち水分量)が、上限露点および下限露点の間で保たれることにより、還元雰囲気中での水分量が、金属ストリップ3の光輝性維持および断熱材17に含まれるSiOの還元防止に対して適切になる。その結果、金属ストリップ3が光輝性を有することができるとともに、断熱材17に含まれるSiOの還元による断熱材17の劣化を防止できる。 As a result, the dew point (that is, the amount of water) of the atmosphere in the heating zone 12 is maintained between the upper limit dew point and the lower limit dew point, so that the amount of water in the reducing atmosphere maintains the brilliance of the metal strip 3 and insulates it. It becomes appropriate for preventing reduction of SiO 2 contained in the material 17. As a result, the metal strip 3 can have a brilliant property, and deterioration of the heat insulating material 17 due to reduction of SiO 2 contained in the heat insulating material 17 can be prevented.
 なお、第2実施形態における手動での制御は、操作者が常時に連続して行う必要はなく、操作者がときどきまたは定期的に露点の監視を行い、異常が無ければ、操作者が特に制御を行わない場合も含む。 The manual control in the second embodiment does not need to be continuously performed by the operator, and the operator monitors the dew point occasionally or periodically, and if there is no abnormality, the operator particularly controls the dew point. Including the case where is not performed.
 この発明の具体的な実施の形態や数値について説明したが、この発明は、上記実施形態や数値に限定されるものではなく、この発明の範囲内で種々変更して実施することができる。 Although specific embodiments and numerical values of the present invention have been described, the present invention is not limited to the above embodiments and numerical values, and can be variously modified and implemented within the scope of the present invention.
 操作者は、制御部20の代わりとして、露点測定部22で測定された露点の取得、および、露点測定部22で測定された露点に基づいて、上限露点と下限露点との間で露点が保たれるように露点調整部27a,28aの制御、の少なくとも一方を行うことができる。 Instead of the control unit 20, the operator acquires the dew point measured by the dew point measuring unit 22, and maintains the dew point between the upper limit dew point and the lower limit dew point based on the dew point measured by the dew point measuring unit 22. At least one of the dew point adjusting units 27a and 28a can be controlled so as to drip.
 光輝焼鈍炉(熱処理装置)1は、炉体10が縦方向(垂直方向)に延在する縦型炉にすることもできる。 The bright burning blunting furnace (heat treatment device) 1 can also be a vertical furnace in which the furnace body 10 extends in the vertical direction (vertical direction).
 光輝焼鈍炉(熱処理装置)1において、加熱帯12の搬送方向上流側に入口シール帯を設けて、入口シールロール13を入口シール帯に配設することもできる。冷却帯14の搬送方向下流側に出口シール帯を設けて、出口シールロール15を出口シール帯に配設することもできる。加熱帯12は、入口シール帯、予熱帯および均熱帯(いずれも図示せず)などで構成されてもよい。冷却帯14は、出口シール帯、急冷帯および徐冷帯(いずれも図示せず)などで構成されてもよい。 In the bright bleaching furnace (heat treatment apparatus) 1, an inlet seal band may be provided on the upstream side of the heating zone 12 in the transport direction, and the inlet seal roll 13 may be arranged on the inlet seal band. An outlet seal band may be provided on the downstream side of the cooling band 14 in the transport direction, and the outlet seal roll 15 may be arranged on the outlet seal band. The heating zone 12 may be composed of an entrance seal zone, pre-tropical and even-tropical (neither shown) or the like. The cooling zone 14 may be composed of an outlet seal zone, a quenching zone, a slow cooling zone (none of which are shown), or the like.
 図1に示した光輝焼鈍炉1では、除湿装置25および加湿装置26の両方を備えているが、除湿装置25および加湿装置26のいずれか一方を備える構成にすることもできる。 The bright bleaching furnace 1 shown in FIG. 1 is provided with both the dehumidifying device 25 and the humidifying device 26, but it is also possible to have a configuration in which either the dehumidifying device 25 or the humidifying device 26 is provided.
 図3では、ステンレス材におけるCr成分が酸化したCr(酸化クロム)の酸化-還元の平衡曲線Cを示している。上記実施形態では、上限露点を-30℃として説明したが、雰囲気の露点がCrの酸化-還元の平衡曲線Cを上回らないように制御することによって、ステンレス材の酸化が防止できるとも考えられる。したがって、ステンレス材の場合、雰囲気の露点が、図3における交点e、f、dおよびcで囲まれた領域内に保たれるように、制御部20は露点調整部24,24aを制御してもよい。 FIG. 3 shows an equilibrium curve C of oxidation-reduction of Cr 2 O 3 (chromium oxide) in which the Cr component in the stainless steel material is oxidized. In the above embodiment, the upper limit dew point is set to −30 ° C., but it is also possible to prevent the oxidation of the stainless steel material by controlling the dew point of the atmosphere so as not to exceed the oxidation-reduction equilibrium curve C of Cr 2 O 3. Conceivable. Therefore, in the case of the stainless steel material, the control unit 20 controls the dew point adjusting units 24 and 24a so that the dew point of the atmosphere is maintained in the region surrounded by the intersections e, f, d and c in FIG. May be good.
 還元雰囲気中で光輝焼鈍される金属ストリップ3は、上述したステンレス材以外にも、ニッケルやチタンや銅のような純金属、低膨張合金、磁性合金、耐熱合金あるいは耐蝕合金などの各種金属材料にも適用可能である。 The metal strip 3 that is brightly annealed in a reducing atmosphere can be used for various metal materials such as pure metals such as nickel, titanium and copper, low expansion alloys, magnetic alloys, heat-resistant alloys and corrosion-resistant alloys, in addition to the above-mentioned stainless steel materials. Is also applicable.
 この発明および実施形態をまとめると、次のようになる。 The present invention and embodiments can be summarized as follows.
 この発明の一態様に係る熱処理装置1は、
 金属ストリップ3を加熱する加熱帯12と、
 前記加熱帯12の炉内壁として使用されて、SiOを含むセラミックファイバー製である断熱材17と、
 前記加熱帯12に還元性ガスを供給するガス供給部9,28,28aとを備え、
 前記金属ストリップ3が光輝性を有することを可能にする上限露点と、前記断熱材17に含まれる前記SiOの還元を不可にする下限露点との間で、露点が保たれるように、前記金属ストリップ3を還元雰囲気中で光輝焼鈍することを特徴とする。
The heat treatment apparatus 1 according to one aspect of the present invention is
A heating zone 12 for heating the metal strip 3 and
A heat insulating material 17 made of ceramic fiber containing SiO 2 and used as an inner wall of the heating zone 12 and
The heating zone 12 is provided with gas supply units 9, 28, 28a for supplying reducing gas.
The dew point is maintained between the upper limit dew point that allows the metal strip 3 to have brilliance and the lower limit dew point that disables the reduction of the SiO 2 contained in the heat insulating material 17. The metal strip 3 is brightly annealed in a reducing atmosphere.
 上記構成によれば、加熱帯12での雰囲気の露点(すなわち水分量)が、上限露点および下限露点の間で保たれることにより、還元雰囲気中での水分量が、金属ストリップ3の光輝性維持および断熱材17に含まれるSiOの還元防止に対して適切になる。その結果、金属ストリップ3が光輝性を有することができるとともに、断熱材17に含まれるSiOの還元による断熱材17の劣化を防止できる。 According to the above configuration, the dew point (that is, the water content) of the atmosphere in the heating zone 12 is maintained between the upper limit dew point and the lower limit dew point, so that the water content in the reducing atmosphere is the brilliance of the metal strip 3. It becomes suitable for maintenance and prevention of reduction of SiO 2 contained in the heat insulating material 17. As a result, the metal strip 3 can have a brilliant property, and deterioration of the heat insulating material 17 due to reduction of SiO 2 contained in the heat insulating material 17 can be prevented.
 この発明の一態様に係る熱処理装置1は、
 金属ストリップ3を還元雰囲気中で光輝焼鈍するための熱処理装置1であって、前記熱処理装置1は、
 前記金属ストリップ3を加熱する加熱帯12と、前記加熱帯12に対して前記金属ストリップ3の搬送方向下流側に設けられる冷却帯14とを有する炉体10と、
 前記加熱帯12の炉内壁として使用されて、SiOを含むセラミックファイバー製である断熱材17と、
 前記炉体10内に還元性ガスを供給するガス供給部9,28,28aと、
 前記加熱帯12における雰囲気の露点を測定する露点測定部22と、
 前記露点を調整する露点調整部24,24a,27,27a,28,28aとを備え、
 前記露点測定部22で測定された前記露点に基づいて、前記金属ストリップ3が光輝性を有することを可能にする上限露点と、前記断熱材17に含まれる前記SiOの還元を不可にする下限露点との間で、前記露点が保たれるように、前記露点調整部24,24a,27,27a,28,28aが制御されることを特徴とする。
The heat treatment apparatus 1 according to one aspect of the present invention is
A heat treatment apparatus 1 for brightly annealing a metal strip 3 in a reducing atmosphere.
A furnace body 10 having a heating zone 12 for heating the metal strip 3 and a cooling zone 14 provided on the downstream side of the metal strip 3 in the transport direction with respect to the heating zone 12.
A heat insulating material 17 made of ceramic fiber containing SiO 2 and used as an inner wall of the heating zone 12 and
Gas supply units 9, 28, 28a for supplying reducing gas into the furnace body 10 and
A dew point measuring unit 22 for measuring the dew point of the atmosphere in the heating zone 12 and
A dew point adjusting unit 24, 24a, 27, 27a, 28, 28a for adjusting the dew point is provided.
Based on the dew point measured by the dew point measuring unit 22, the upper limit dew point that enables the metal strip 3 to have brilliance and the lower limit that disables the reduction of the SiO 2 contained in the heat insulating material 17 The dew point adjusting units 24, 24a, 27, 27a, 28, 28a are controlled so that the dew point is maintained between the dew point and the dew point.
 上記構成によれば、加熱帯12での雰囲気の露点(すなわち水分量)が、上限露点および下限露点の間で保たれることにより、還元雰囲気中での水分量が、金属ストリップ3の光輝性維持および断熱材17に含まれるSiOの還元防止に対して適切になる。その結果、金属ストリップ3が光輝性を有することができるとともに、断熱材17に含まれるSiOの還元による断熱材17の劣化を防止できる。 According to the above configuration, the dew point (that is, the water content) of the atmosphere in the heating zone 12 is maintained between the upper limit dew point and the lower limit dew point, so that the water content in the reducing atmosphere is the brilliance of the metal strip 3. It becomes suitable for maintenance and prevention of reduction of SiO 2 contained in the heat insulating material 17. As a result, the metal strip 3 can have a brilliant property, and deterioration of the heat insulating material 17 due to reduction of SiO 2 contained in the heat insulating material 17 can be prevented.
 また、一実施形態の熱処理装置1では、
 前記露点調整部24,27,28の制御は、制御部20によって行われる。
Further, in the heat treatment apparatus 1 of the embodiment,
The control of the dew point adjusting units 24, 27, 28 is performed by the control unit 20.
 上記実施形態によれば、光輝焼鈍(熱処理)の自動化が可能になる。 According to the above embodiment, it is possible to automate the bright annealing (heat treatment).
 また、一実施形態の熱処理装置1では、
 前記上限露点は、-30℃である。
Further, in the heat treatment apparatus 1 of the embodiment,
The upper limit dew point is −30 ° C.
 上記実施形態によれば、光輝性を有する金属ストリップ3を得ることができる。 According to the above embodiment, a metal strip 3 having a brilliant property can be obtained.
 また、一実施形態の熱処理装置1では、
 光輝焼鈍される前記金属ストリップ3の光輝性の度合いに応じて、前記上限露点は、-30℃から-65℃の範囲で設定される。
Further, in the heat treatment apparatus 1 of the embodiment,
The upper limit dew point is set in the range of −30 ° C. to −65 ° C., depending on the degree of brightness of the metal strip 3 to be brightly annealed.
 上記実施形態によれば、所望とする光輝性を有する金属ストリップ3を得ることができる。 According to the above embodiment, the metal strip 3 having the desired brilliance can be obtained.
 また、一実施形態の熱処理装置1では、
 前記露点調整部24は、除湿装置25および加湿装置26の少なくとも一方を備える。
Further, in the heat treatment apparatus 1 of the embodiment,
The dew point adjusting unit 24 includes at least one of a dehumidifying device 25 and a humidifying device 26.
 上記実施形態によれば、ガス供給部9,28,28aによって供給される還元性ガスの露点と、目標とする雰囲気の露点とに応じて、加熱帯12における雰囲気の露点を適宜に調整できる。 According to the above embodiment, the dew point of the atmosphere in the heating zone 12 can be appropriately adjusted according to the dew point of the reducing gas supplied by the gas supply units 9, 28, 28a and the dew point of the target atmosphere.
 また、一実施形態の熱処理装置1では、
 前記ガス供給部9,28,28aは、ガス供給装置9と、前記ガス供給装置9によって供給される前記還元性ガスの流量を調節する調節弁28,28aとを備え、前記ガス供給装置9および前記調節弁28,28aが前記露点調整部24,24aとして働く。
Further, in the heat treatment apparatus 1 of the embodiment,
The gas supply units 9, 28, 28a include a gas supply device 9 and a control valve 28, 28a for adjusting the flow rate of the reducing gas supplied by the gas supply device 9, and the gas supply device 9 and the gas supply unit 9, 28, 28a are provided. The control valves 28, 28a act as the dew point adjustment portions 24, 24a.
 上記実施形態によれば、簡易な構成によって露点調整装置24,24aを構成できる。 According to the above embodiment, the dew point adjusting devices 24 and 24a can be configured by a simple configuration.
 また、一実施形態の熱処理装置1では、
 前記熱処理装置1は、前記炉体10が横方向に延在する横型炉である。
Further, in the heat treatment apparatus 1 of the embodiment,
The heat treatment apparatus 1 is a horizontal furnace in which the furnace body 10 extends in the lateral direction.
 上記実施形態によれば、金属ストリップ3を搬送する搬送機構を簡易にでき、熱処理装置1の高さが高くなることを抑制できる。また、セラミックファイバーの崩壊および粉塵の発生を防止できるので、天井の面積が大きくなる横型炉においても、軽量なセラミックファイバー製の断熱材17を用いることができる。 According to the above embodiment, the transport mechanism for transporting the metal strip 3 can be simplified, and the height of the heat treatment apparatus 1 can be suppressed from increasing. Further, since the collapse of the ceramic fiber and the generation of dust can be prevented, the lightweight ceramic fiber heat insulating material 17 can be used even in a horizontal furnace having a large ceiling area.
 また、一実施形態の熱処理装置1では、
 前記金属ストリップ3は、Crを含むステンレス材からなる。
Further, in the heat treatment apparatus 1 of the embodiment,
The metal strip 3 is made of a stainless steel material containing Cr.
 上記実施形態によれば、金属ストリップ3における酸化皮膜の形成が抑制されて、金属ストリップ3が光輝性を有することができる。 According to the above embodiment, the formation of the oxide film on the metal strip 3 is suppressed, and the metal strip 3 can have a brilliant property.
 また、一実施形態の熱処理装置1では、
 前記加熱帯12の温度範囲が、800℃から1250℃である。
Further, in the heat treatment apparatus 1 of the embodiment,
The temperature range of the heating zone 12 is 800 ° C. to 1250 ° C.
 上記実施形態によれば、金属ストリップ3を光輝焼鈍に適した温度で加熱できる。 According to the above embodiment, the metal strip 3 can be heated at a temperature suitable for bright annealing.
 また、一実施形態の熱処理装置1では、
 前記還元性ガスは、水素ガスを含む。
Further, in the heat treatment apparatus 1 of the embodiment,
The reducing gas includes hydrogen gas.
 上記実施形態によれば、金属ストリップ3を還元して光輝焼鈍させることができる。 According to the above embodiment, the metal strip 3 can be reduced and brilliantly annealed.
  1…光輝焼鈍炉(熱処理装置)
  3…金属ストリップ
  5…ガス供給配管
  6…露点測定配管
  7…入側配管
  8…出側配管
  9…ガス供給装置(ガス供給部、露点調整部)
 10…炉体
 12…加熱帯
 13…入口シールロール
 14…冷却帯
 15…出口シールロール
 16…加熱部
 17…断熱材
 20…制御部
 22…露点測定部
 24…露点調整装置(露点調整部)
24a…露点調整装置(露点調整部)
 25…除湿装置
 26…加湿装置
 27…第1調節弁(露点調整部)
27a…第1調節弁(露点調整部)
 28…第2調節弁(ガス供給部、露点調整部)
28a…第2調節弁(ガス供給部、露点調整部)
  A…-30℃の露点を示す直線
  C…Crの酸化-還元の平衡曲線
  S…SiOの酸化-還元の平衡曲線
1 ... Bright baking furnace (heat treatment equipment)
3 ... Metal strip 5 ... Gas supply pipe 6 ... Dew point measurement pipe 7 ... Enter side pipe 8 ... Outer side pipe 9 ... Gas supply device (gas supply part, dew point adjustment part)
10 ... Furnace 12 ... Heating zone 13 ... Inlet seal roll 14 ... Cooling zone 15 ... Outlet seal roll 16 ... Heating unit 17 ... Insulation material 20 ... Control unit 22 ... Dew point measurement unit 24 ... Dew point adjustment device (Dew point adjustment unit)
24a ... Dew point adjusting device (dew point adjusting unit)
25 ... Dehumidifier 26 ... Humidifier 27 ... First control valve (dew point adjustment unit)
27a ... 1st control valve (dew point adjustment part)
28 ... Second control valve (gas supply unit, dew point adjustment unit)
28a ... Second control valve (gas supply unit, dew point adjustment unit)
A ... Straight line showing the dew point at -30 ° C C ... Oxidation-reduction equilibrium curve of Cr 2 O 3 S ... Oxidation-reduction equilibrium curve of SiO 2

Claims (11)

  1.  金属ストリップを加熱する加熱帯と、
     前記加熱帯の炉内壁として使用されて、SiOを含むセラミックファイバー製である断熱材と、
     前記加熱帯に還元性ガスを供給するガス供給部とを備え、
     前記金属ストリップが光輝性を有することを可能にする上限露点と、前記断熱材に含まれる前記SiOの還元を不可にする下限露点との間で、露点が保たれるように、前記金属ストリップを還元雰囲気中で光輝焼鈍することを特徴とする、熱処理装置。
    A heating band that heats the metal strip,
    A heat insulating material made of ceramic fiber containing SiO 2 and used as an inner wall of the heating zone.
    A gas supply unit for supplying a reducing gas to the heating zone is provided.
    The metal strip is maintained so that a dew point is maintained between an upper dew point that allows the metal strip to have brilliance and a lower dew point that prevents reduction of the SiO 2 contained in the heat insulating material. A heat treatment apparatus characterized by brightly bleaching in a reducing atmosphere.
  2.  金属ストリップを還元雰囲気中で光輝焼鈍するための熱処理装置であって、前記熱処理装置は、
     前記金属ストリップを加熱する加熱帯と、前記加熱帯に対して前記金属ストリップの搬送方向下流側に設けられる冷却帯とを有する炉体と、
     前記加熱帯の炉内壁として使用されて、SiOを含むセラミックファイバー製である断熱材と、
     前記炉体内に還元性ガスを供給するガス供給部と、
     前記加熱帯における雰囲気の露点を測定する露点測定部と、
     前記露点を調整する露点調整部とを備え、
     前記露点測定部で測定された前記露点に基づいて、前記金属ストリップが光輝性を有することを可能にする上限露点と、前記断熱材に含まれる前記SiOの還元を不可にする下限露点との間で、前記露点が保たれるように、前記露点調整部が制御されることを特徴とする、熱処理装置。
    A heat treatment apparatus for brightly annealing a metal strip in a reducing atmosphere.
    A furnace body having a heating zone for heating the metal strip and a cooling zone provided on the downstream side of the metal strip in the transport direction with respect to the heating zone.
    A heat insulating material made of ceramic fiber containing SiO 2 and used as an inner wall of the heating zone.
    A gas supply unit that supplies reducing gas into the furnace body and
    A dew point measuring unit that measures the dew point of the atmosphere in the heating zone,
    A dew point adjusting unit for adjusting the dew point is provided.
    Based on the dew point measured by the dew point measuring unit, the upper limit dew point that enables the metal strip to have brilliance and the lower limit dew point that disables the reduction of the SiO 2 contained in the heat insulating material. A heat treatment apparatus, characterized in that the dew point adjusting unit is controlled so that the dew point is maintained between them.
  3.  前記露点調整部の制御は、制御部によって行われることを特徴とする、請求項2に記載の熱処理装置。 The heat treatment apparatus according to claim 2, wherein the control of the dew point adjusting unit is performed by the control unit.
  4.  前記上限露点は、-30℃であることを特徴とする、請求項1から請求項3のいずれか1項に記載の熱処理装置。 The heat treatment apparatus according to any one of claims 1 to 3, wherein the upper limit dew point is −30 ° C.
  5.  光輝焼鈍される前記金属ストリップの光輝性の度合いに応じて、前記上限露点は、-30℃から-65℃の範囲で設定されることを特徴とする、請求項1から請求項3のいずれか1項に記載の熱処理装置。 Any of claims 1 to 3, wherein the upper limit dew point is set in the range of −30 ° C. to −65 ° C. depending on the degree of brightness of the metal strip to be brightly annealed. The heat treatment apparatus according to item 1.
  6.  前記露点調整部は、除湿装置および加湿装置の少なくとも一方を備えることを特徴とする、請求項2から請求項5のいずれか1項に記載の熱処理装置。 The heat treatment apparatus according to any one of claims 2 to 5, wherein the dew point adjusting unit includes at least one of a dehumidifying device and a humidifying device.
  7.  前記ガス供給部は、ガス供給装置と、前記ガス供給装置によって供給される前記還元性ガスの流量を調節する調節弁とを備え、前記ガス供給装置および前記調節弁が前記露点調整部として働くことを特徴とする、請求項2から請求項5のいずれか1項に記載の熱処理装置。 The gas supply unit includes a gas supply device and a control valve for adjusting the flow rate of the reducing gas supplied by the gas supply device, and the gas supply device and the control valve act as the dew point adjustment unit. The heat treatment apparatus according to any one of claims 2 to 5, wherein the heat treatment apparatus is characterized.
  8.  前記熱処理装置は、前記炉体が横方向に延在する横型炉であることを特徴とする、請求項2から請求項7のいずれか1項に記載の熱処理装置。 The heat treatment apparatus according to any one of claims 2 to 7, wherein the heat treatment apparatus is a horizontal type furnace in which the furnace body extends in the lateral direction.
  9.  前記金属ストリップは、Crを含むステンレス材からなることを特徴とする、請求項1から請求項8のいずれか1項に記載の熱処理装置。 The heat treatment apparatus according to any one of claims 1 to 8, wherein the metal strip is made of a stainless steel material containing Cr.
  10.  前記加熱帯の温度範囲が、800℃から1250℃であることを特徴とする、請求項1から請求項9のいずれか1項に記載の熱処理装置。 The heat treatment apparatus according to any one of claims 1 to 9, wherein the temperature range of the heating zone is 800 ° C. to 1250 ° C.
  11.  前記還元性ガスは、水素ガスを含むことを特徴とする、請求項1から請求項10のいずれか1項に記載の熱処理装置。 The heat treatment apparatus according to any one of claims 1 to 10, wherein the reducing gas contains hydrogen gas.
PCT/JP2020/044346 2019-12-09 2020-11-27 Heat treatment apparatus WO2021117516A1 (en)

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