WO2021097992A1 - 一种基板、液晶显示面板及基板制备方法 - Google Patents

一种基板、液晶显示面板及基板制备方法 Download PDF

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Publication number
WO2021097992A1
WO2021097992A1 PCT/CN2019/126593 CN2019126593W WO2021097992A1 WO 2021097992 A1 WO2021097992 A1 WO 2021097992A1 CN 2019126593 W CN2019126593 W CN 2019126593W WO 2021097992 A1 WO2021097992 A1 WO 2021097992A1
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Prior art keywords
substrate
layer
color resist
liquid crystal
crystal display
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Ceased
Application number
PCT/CN2019/126593
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English (en)
French (fr)
Inventor
闫春秋
邵源
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TCL China Star Optoelectronics Technology Co Ltd
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TCL China Star Optoelectronics Technology Co Ltd
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Priority to US16/626,362 priority Critical patent/US20210333619A1/en
Publication of WO2021097992A1 publication Critical patent/WO2021097992A1/zh
Anticipated expiration legal-status Critical
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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133357—Planarisation layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13398—Spacer materials; Spacer properties

Definitions

  • This application relates to the field of display technology, and in particular to a substrate, a liquid crystal display panel, and a substrate preparation method.
  • LCD(Liquid Crystal Display (liquid crystal display) is currently the most widely used display product on the market. Its production process technology is very mature, the product yield is high, the production cost is relatively low, and the market acceptance is high.
  • Most of the liquid crystal displays on the existing market are backlit liquid crystal display devices, which include a liquid crystal display panel and a backlight module.
  • the liquid crystal display panel consists of a color film substrate, an array substrate, and a liquid crystal sandwiched between the color film substrate and the array substrate.
  • sealing sealant composition wherein the color film substrate mainly includes a color filter layer for forming colored light through a color resist unit, a black matrix for preventing light leakage at the edge of the pixel, and spacers for maintaining the thickness of the cell.
  • a flattening layer is usually prepared to flatten the terrain and reduce the amount of liquid crystal.
  • the production process of the flattening layer in the prior art consumes a lot of cost, and the spacers in the substrate of the liquid crystal display There is a useless electrode layer under the mat, which will cause the product to generate parasitic capacitance that is harmful to the liquid crystal display.
  • a planarization layer is usually prepared to flatten the terrain and reduce the amount of liquid crystal.
  • the production process of the planarization layer consumes a lot of cost, resulting in a large product cost. increase. Therefore, it is necessary to provide a new substrate, liquid crystal display panel and substrate preparation method to improve this defect.
  • the present application provides a substrate, a liquid crystal display panel, and a substrate preparation method, so as to alleviate the technical problem of the large production cost of the planarization layer in the prior art, which leads to a large increase in product cost.
  • an embodiment of the present application provides a substrate, which includes:
  • a color resist layer is disposed on the substrate and includes a patterned black matrix
  • the planarization layer is arranged on the color resist layer and patterned to form a supporting wall.
  • the substrate includes an electrode layer, and the electrode layer is disposed on the planarization layer and located between the supporting walls.
  • the thickness of the electrode layer is smaller than the height of the supporting wall.
  • the material of the electrode layer is one or more combinations of polyethylene dioxythiophene and polystyrene sulfonate.
  • the material of the electrode layer is silver nanowires.
  • the thickness of the electrode layer is any value from 20 nanometers to 500 nanometers.
  • the material of the planarization layer is a hydrophobic material.
  • the color resist layer further includes a color resist, and the color resist is disposed in a gap of the black matrix.
  • the thickness of the region of the planarization layer where the supporting wall is not provided is any value from 0.1 ⁇ m to 2 ⁇ m.
  • the height of the supporting wall is any value in the range of 2 micrometers to 10 micrometers.
  • an embodiment of the present application also provides a liquid crystal display panel, the liquid crystal display panel including:
  • the second substrate is arranged in a box with the first substrate
  • the first substrate includes:
  • a color resist layer is disposed on the substrate and includes a patterned black matrix
  • the planarization layer is arranged on the color resist layer and patterned to form a supporting wall.
  • the substrate includes an electrode layer, and the electrode layer is disposed on the planarization layer and located between the supporting walls.
  • the thickness of the electrode layer is smaller than the height of the supporting wall.
  • the material of the electrode layer is one or more combinations of polyethylene dioxythiophene and polystyrene sulfonate.
  • the thickness of the electrode layer is any value from 20 nanometers to 500 nanometers.
  • the material of the planarization layer is a hydrophobic material.
  • the color resist layer further includes a color resist, and the color resist is disposed in a gap of the black matrix.
  • the thickness of the region of the planarization layer where the supporting wall is not provided is any value from 0.1 ⁇ m to 2 ⁇ m.
  • the height of the supporting wall is any value in the range of 2 micrometers to 10 micrometers.
  • embodiments of the present application also provide a method for preparing a substrate, and the method for preparing includes:
  • the color resist layer including a patterned black matrix
  • the planarization layer is patterned to form a supporting wall.
  • the present application provides a substrate, a liquid crystal display panel, and a method for preparing a substrate.
  • the substrate uses a supporting wall material instead of the original planarization layer material.
  • the supporting wall can simultaneously perform the functions of planarization and support. The production cost of the planarization layer is reduced, the production process is also optimized, and the production efficiency is improved.
  • FIG. 1 is a schematic diagram of the structure of a substrate provided by an embodiment of the application.
  • FIG. 2 is a schematic diagram of another structure of a substrate provided by an embodiment of the application.
  • FIG. 3 is a flowchart of a method for preparing a substrate provided by an embodiment of the application.
  • 4a to 4d are flow charts of the preparation process of the substrate provided by the embodiments of the application.
  • FIG. 5 is a flowchart of a method for preparing a substrate with another structure provided by an embodiment of the application.
  • 6a to 6d are flow charts of the preparation process of a substrate with another structure provided by an embodiment of the application.
  • the present application provides a substrate, a liquid crystal display panel, and a substrate preparation method.
  • a substrate a liquid crystal display panel
  • a substrate preparation method a substrate preparation method.
  • COA(Color Filter on Array) technology is a technology in which the color filter layer is prepared on an array substrate.
  • the black matrix, spacers, and color filter film are all designed on the side of the array substrate, which can not only avoid the error of the alignment accuracy in the alignment process, or the curved display technology due to the panel.
  • the prior art will cover an organic planarization layer on the color resist layer of the COA type array substrate, and then form the organic planarization layer. Including spacers and black matrix.
  • the production process of the planarization layer consumes a lot of cost, and there are useless electrode layers under the supporting wall in the substrate of the liquid crystal display, which will cause the product to generate parasitic capacitance that is harmful to the liquid crystal display.
  • the technical solution adopted in this application is to provide a substrate that replaces the original planarization layer material with the material of the supporting wall, and forms the electrode layer after patterning the supporting wall, thereby reducing the flatness.
  • FIG. 1 is a schematic structural diagram of a substrate provided by an embodiment of the present application. From the figure, each component of the present application and the relative positional relationship of each component can be seen intuitively.
  • the substrate 10 includes a substrate 11; a color resist layer 12, the color resist layer 12 is disposed on the substrate 11, and includes a patterned black matrix; a planarization layer 13, the A planarization layer 13 is disposed on the color resist layer 12 and patterned to form a supporting wall; and an electrode layer 14 is disposed on the planarization layer 13 and located on the supporting wall. between.
  • the material of the electrode layer 14 is one or more combinations of polyethylene dioxythiophene and polystyrene sulfonate or silver nanowires, and the material of the planarization layer 13 is hydrophobic. material.
  • the thickness of the area where the supporting wall is not provided in the planarization layer 13 is any value from 0.1 micrometer to 2 micrometers, and is higher than the height of the black matrix.
  • the height is any value from 2 micrometers to 10 micrometers
  • the thickness of the electrode layer 14 is less than the height of the supporting wall
  • the thickness of the electrode layer 14 is any value from 20 nanometers to 500 nanometers.
  • the material of the electrode layer 14 is one or more combinations of polyethylene dioxythiophene and polystyrene sulfonate or silver nanowires, the material is a water-based conductive paste, and the flat
  • the material of the planarization layer 13 is a hydrophobic material, and the hydrophobic material exhibits a large contact angle when contacting with the solution, so the formation of the supporting wall area of the electrode layer in the planarization layer can be avoided.
  • FIG. 2 is another schematic diagram of the structure of the substrate provided by the embodiment of the present application. From the figure, each component of the present application and the relative positional relationship of each component can be seen intuitively.
  • the substrate 20 includes a substrate 21; a color resist layer 22, the color resist layer 22 is arranged on the substrate 21, including a patterned black matrix and a gap arranged in the black matrix
  • the flattening layer 23, the flattening layer 23 is disposed on the color resisting layer 22, and is patterned to form a supporting wall; and the electrode layer 24, the electrode layer 24 is disposed on the flattening
  • the layer 23 is located between the supporting walls.
  • the material of the electrode layer 24 is one or more combinations of polyethylene dioxythiophene and polystyrene sulfonate or silver nanowires, and the material of the planarization layer 23 is hydrophobic. material.
  • the thickness of the area where the support wall is not provided on the planarization layer 23 is any value from 0.1 ⁇ m to 2 ⁇ m, and the height of the support wall is any value from 2 ⁇ m to 10 ⁇ m.
  • the material of the electrode layer 24 is one or more combinations of polyethylene dioxythiophene and polystyrene sulfonate or silver nanowires, the material is a water-based conductive paste, and the flat
  • the material of the planarization layer 23 is a hydrophobic material, and the hydrophobic material exhibits a large contact angle when contacting with the solution, so the formation of the electrode layer in the supporting wall area of the planarization layer can be avoided.
  • An embodiment of the present application also provides a liquid crystal display panel, the liquid crystal display panel includes a first substrate and a second substrate, the first substrate and the second substrate are arranged in a cell, and the first substrate is the above-mentioned implementation
  • the substrate according to any one of the first or second embodiment in addition, further includes a liquid crystal layer filled between the first substrate and the second substrate.
  • the substrate in this embodiment uses the material of the supporting wall to replace the original material of the planarization layer, and the electrode layer is formed after the supporting wall is patterned, thereby reducing the level of the planarization layer in the prior art.
  • the use of a hydrophobic support wall and the solution will show a large contact angle, so that there will be no useless electrode layer under the support wall, so as to avoid the product harmful to the liquid crystal display. The problem of parasitic capacitance arises.
  • FIG. 3 is a flowchart of a method for preparing a substrate provided by an embodiment of the present application. The method includes the following steps:
  • the height of the part of the planarization layer that is not provided with the retaining wall is greater than the height of the black matrix, and the material of the planarization layer is a hydrophobic material, which can ensure that the region where the retaining wall is provided in the subsequent steps There is no electrode layer, so as to avoid the problem of the product generating parasitic capacitance harmful to the liquid crystal display panel.
  • a half tone mask (Half Tone Method) is used to pattern the planarization layer.
  • the exposure mode of the halftone mask utilizes the partial light transmittance of the grating, and the amount of light passing through is set according to the height difference of the required planarization layer, so that the photoresist can be incompletely exposed.
  • the traditional two exposure procedures are combined into one, which saves one exposure procedure, shortens the production cycle, improves production efficiency, and reduces production costs at the same time.
  • step S305 inkjet printing or slit coating is used instead of the method of vapor deposition of the electrode layer in the prior art to form the electrode layer between the supporting walls, so as to speed up the production time and reduce the production cost, and make The coating of the electrode layer is more uniform.
  • Figures 4a to 4d are flow charts of the preparation process of the substrate provided by the embodiments of the application.
  • a substrate 401 is provided.
  • the material of the substrate 401 is an inorganic substance such as polyimide or glass, and then a color is formed on the substrate 401.
  • a resist layer 402, the color resist layer 402 includes a patterned black matrix, and then a planarization layer 403 is formed on the color resist layer 402.
  • the material of the planarization layer 403 is a hydrophobic material, and the planarization layer 403 is patterned to form a supporting wall.
  • an electrode layer 404 is formed on the planarization layer 403, and the electrode layer 404 is located between the supporting wall.
  • FIG. 5 is a flowchart of a method for preparing a substrate with another structure provided by an embodiment of the present application. The method includes the following steps:
  • S504 Perform a patterning process on the planarization layer to form a supporting wall
  • S505 An electrode layer is formed on the planarization layer, and the electrode layer is located between the supporting walls.
  • the material of the planarization layer is a hydrophobic material, and the hydrophobic material can ensure that there will be no electrode layer in the area where the supporting wall is set in the subsequent steps, thereby avoiding the problem of parasitic capacitance that is harmful to the liquid crystal display panel. .
  • a half tone mask (Half Tone Method) is used to pattern the planarization layer.
  • the exposure mode of the halftone mask utilizes the partial light transmittance of the grating, and the amount of light passing through is set according to the height difference of the required planarization layer, so that the photoresist can be incompletely exposed.
  • the traditional two exposure procedures are combined into one, which saves one exposure procedure, shortens the production cycle, improves production efficiency, and reduces production costs at the same time.
  • step S505 inkjet printing or slit coating is used instead of the method of vapor deposition of the electrode layer in the prior art to form the electrode layer between the supporting walls, so as to speed up the production time and reduce the production cost, and make The coating of the electrode layer is more uniform.
  • Figures 6a to 6d are flow charts of the preparation process of a substrate with another structure provided by an embodiment of the application.
  • a substrate 601 is provided.
  • the material of the substrate 601 is an inorganic substance such as polyimide or glass, and then the substrate A color resist layer 602 is formed on the bottom 601.
  • the color resist layer 602 includes a patterned black matrix and a color resist arranged in the gaps of the black matrix.
  • a planarization layer 603 is formed on the color resist layer 602.
  • the material of the planarization layer 603 is a hydrophobic material, and the planarization layer 603 is patterned to form a supporting wall.
  • an electrode layer 604 is formed on the planarization layer 603, and the electrode layer 604 is located on the planarization layer 603. Between the supporting and retaining walls.
  • the preparation method of the substrate in this embodiment uses the material of the supporting wall instead of the original material of the planarization layer, and the electrode layer is formed after the supporting wall is patterned, thereby reducing
  • the problem of harmful parasitic capacitance of the display arises.

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  • Physics & Mathematics (AREA)
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Abstract

一种基板（10）、液晶显示面板及基板制备方法，基板（10）包括衬底（11）；色阻层（12），色阻层（12）设置于衬底（11）上，包括图案化设置的黑色矩阵；以及平坦化层（13），平坦化层（13）设置于色阻层（12）上，并图案化形成支撑挡墙。

Description

一种基板、液晶显示面板及基板制备方法
本申请要求于2019年11月18日提交中国专利局、申请号为201911129707.1、申请名称为“一种基板、液晶显示面板及基板制备方法”的中国专利申请的优先权，其全部内容通过引用结合在本申请中。
技术领域
本申请涉及显示技术领域，尤其涉及一种基板、液晶显示面板及基板制备方法。
 背景技术
LCD(Liquid Crystal Display,液晶显示器)是目前市场上应用最为广泛的显示产品，其生产工艺技术十分成熟，产品良率高，生产成本相对较低，市场接受度高。现有市场上的液晶显示器大部分为背光型液晶显示装置，其包括液晶显示面板及背光模组，通常液晶显示面板由彩膜基板、阵列基板、夹于彩膜基板与阵列基板之间的液晶及密封框胶组成，其中，彩膜基板主要包括用于通过色阻单元形成有色光的彩色滤光层、用于防止像素边缘漏光的黑色矩阵、以及用于维持盒厚的隔垫物。
在液晶显示器的基板中，通常会制备一层平坦化层，以平坦地形并减少液晶用量，但是，现有技术中平坦化层的制作流程耗费的成本较大，并且液晶显示器的基板中的隔垫物下方存在无用的电极层，会导致产品产生对液晶显示器有害的寄生电容。
综上所述，现有技术的基板，在制造过程中，通常会制备一层平坦化层，以平坦地形并减少液晶用量，由于平坦化层的制作流程耗费的成本较大，导致产品成本大大增加。故，有必要提供一种新的基板、液晶显示面板及基板制备方法来改善这一缺陷。
 技术问题
本申请提供了一种基板、液晶显示面板及基板制备方法，以缓解现有技术存在的平坦化层制作成本较大，导致产品成本大大增加的技术问题。
 技术解决方案
为了解决上述问题，本申请实施例提供了一种基板，该基板包括：
衬底；
色阻层，所述色阻层设置于所述衬底上，包括图案化设置的黑色矩阵；以及
平坦化层，所述平坦化层设置于所述色阻层上，并图案化形成支撑挡墙。
根据本申请一优选实施例，所述基板包括电极层，所述电极层设置于所述平坦化层上，且位于所述支撑挡墙之间。
根据本申请一优选实施例，所述电极层的厚度小于所述支撑挡墙的高度。
根据本申请一优选实施例，所述电极层的材料为聚乙撑二氧噻吩和聚苯乙烯磺酸盐的一种或多种组合。
根据本申请一优选实施例，所述电极层的材料为银纳米线。
根据本申请一优选实施例，所述电极层的厚度为20纳米至500纳米中的任一数值。
根据本申请一优选实施例，所述平坦化层的材料为疏水性材料。
根据本申请一优选实施例，所述色阻层还包括彩色色阻，所述彩色色阻设置于所述黑色矩阵的缝隙。
根据本申请一优选实施例，所述平坦化层未设置所述支撑挡墙的区域厚度为0.1微米至2微米中的任一数值。
根据本申请一优选实施例，所述支撑挡墙的高度为2微米至10微米中的任一数值。
为了解决上述问题，本申请实施例还提供了一种液晶显示面板，该液晶显示面板包括：
第一基板；
第二基板，与所述第一基板对盒设置；
液晶层，填充在所述第一基板与所述第二基板之间；
其中，所述第一基板包括：
衬底；
色阻层，所述色阻层设置于所述衬底上，包括图案化设置的黑色矩阵；以及
平坦化层，所述平坦化层设置于所述色阻层上，并图案化形成支撑挡墙。
根据本申请一优选实施例，所述基板包括电极层，所述电极层设置于所述平坦化层上，且位于所述支撑挡墙之间。
根据本申请一优选实施例，所述电极层的厚度小于所述支撑挡墙的高度。
根据本申请一优选实施例，所述电极层的材料为聚乙撑二氧噻吩和聚苯乙烯磺酸盐的一种或多种组合。
根据本申请一优选实施例，所述电极层的厚度为20纳米至500纳米中的任一数值。
根据本申请一优选实施例，所述平坦化层的材料为疏水性材料。
根据本申请一优选实施例，所述色阻层还包括彩色色阻，所述彩色色阻设置于所述黑色矩阵的缝隙。
根据本申请一优选实施例，所述平坦化层未设置所述支撑挡墙的区域厚度为0.1微米至2微米中的任一数值。
根据本申请一优选实施例，所述支撑挡墙的高度为2微米至10微米中的任一数值。
为了解决上述问题，本申请实施例还提供了一种基板的制备方法，该制备方法包括：
提供衬底；
在所述衬底上形成色阻层，所述色阻层包括图案化设置的黑色矩阵；
在所述色阻层上形成平坦化层；
对所述平坦化层进行图案化处理，形成支撑挡墙。
 有益效果
本申请提供一种基板、液晶显示面板及基板制备方法，所述基板用支撑挡墙的材料代替原有平坦化层的材料，所述支撑挡墙可同时起到平坦化和支撑的作用，不仅降低了平坦化层的制作成本，还优化了生产制程，提高生产效率。
 附图说明
图1为本申请实施例提供的基板的结构示意图。
图2为本申请实施例提供的基板的另一结构示意图。
图3为本申请实施例提供的基板的制备方法流程图。
图4a至4d为本申请实施例提供的基板的制备工艺流程图。
图5为本申请实施例提供的另一种结构的基板的制备方法流程图。
图6a至6d为本申请实施例提供的另一种结构的基板的制备工艺流程图。
本申请的实施方式
本申请提供一种基板、液晶显示面板及基板制备方法，为使本申请的目的、技术方案及效果更加清楚、明确，以下参照附图并举实施例对本申请进一步详细说明。应当理解，此处所描述的具体实施例仅用以解释本申请，并不用于限定本申请。
本申请所提到的方向用语，例如[上]、[下]、[左]、[右]、[前] 、[后] 、[内] 、[外] 、[侧]等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明和理解本申请，而非用以限制本申请。术语“第一”、“第二”等仅用于描述目的，而不能理解为指示或是暗示其相对重要性或者隐含指明所指示的技术特征的数量。由此，限定有“第一”、“第二”等的特征可以明示或者隐含地包括一个或者更多个该特征。
COA(Color Filter on Array)技术是将彩色滤光层制备在阵列基板上的技术。与传统的液晶显示技术比较，将黑色矩阵、隔垫物、及彩色滤光膜全部设计在阵列基板侧，这样不仅可以避免对组制程中由于对组精度的误差，或者曲面显示技术中由于面板弯曲造成的平移带来的露光；更重要的是节省一道材料及制程，缩短生产时间(tact time)，降低了产品成本。
与此同时,为了解决改善COA型阵列基板的地形平坦性，现有技术还会在COA型阵列基板的色阻层上覆盖一层有机平坦化层，然后再在所述有机平坦化层上形成包括隔垫物、及黑色矩阵。
在现有技术的基板中，平坦化层的制作流程耗费的成本较大，并且液晶显示器的基板中的支撑挡墙下方存在无用的电极层，会导致产品产生对液晶显示器有害的寄生电容。为了解决上述技术问题，本申请采用的技术方案是提供一种基板，用支撑挡墙的材料代替原有平坦化层的材料，并在图案化形成支撑挡墙后形成电极层，从而降低了平坦化层的制作成本，并使支撑挡墙下方不会存在无用的电极层。下面结合附图对本申请进行详细介绍。
实施例一
请参阅图1，图1是本申请实施例提供的基板的结构示意图，从图中可以很直观的看到本申请的各组成部分，以及各组成部分的相对位置关系。如图1所示，所述基板10包括衬底11；色阻层12，所述色阻层12设置于所述衬底11上，包括图案化设置的黑色矩阵；平坦化层13，所述平坦化层13设置于所述色阻层12上，并图案化形成支撑挡墙；以及电极层14，所述电极层14设置于所述平坦化层13上，且位于所述支撑挡墙之间。
在上述实施例中，所述电极层14的材料为聚乙撑二氧噻吩和聚苯乙烯磺酸盐的一种或多种组合或银纳米线，所述平坦化层13的材料为疏水性材料。
在上述实施例中，所述平坦化层13未设置所述支撑挡墙的区域厚度为0.1微米至2微米中的任一数值，且高于所述黑色矩阵的高度，所述支撑挡墙的高度为2微米至10微米中的任一数值，所述电极层14的厚度小于所述支撑挡墙的高度，且所述电极层14的厚度为20纳米至500纳米中的任一数值。
具体地，所述电极层14的材料为聚乙撑二氧噻吩和聚苯乙烯磺酸盐的一种或多种组合或银纳米线，该材料是一种水系导电浆料，而所述平坦化层13的材料为疏水性材料，该疏水性材料与溶液接触会表现出很大的接触角，故可以避免电极层在平坦化层中的支撑挡墙区形成。
实施例二
请参阅图2，图2是本申请实施例提供的基板的另一结构示意图，从图中可以很直观的看到本申请的各组成部分，以及各组成部分的相对位置关系。如图2所示，所述基板20包括衬底21；色阻层22，所述色阻层22设置于所述衬底21上，包括图案化设置的黑色矩阵和设置于所述黑色矩阵缝隙的彩色色阻；平坦化层23，所述平坦化层23设置于所述色阻层22上，并图案化形成支撑挡墙；以及电极层24，所述电极层24设置于所述平坦化层23上，且位于所述支撑挡墙之间。
在上述实施例中，所述电极层24的材料为聚乙撑二氧噻吩和聚苯乙烯磺酸盐的一种或多种组合或银纳米线，所述平坦化层23的材料为疏水性材料。
在上述实施例中，所述平坦化层23未设置所述支撑挡墙的区域厚度为0.1微米至2微米中的任一数值，所述支撑挡墙的高度为2微米至10微米中的任一数值，所述电极层24的厚度小于所述支撑挡墙的高度，且所述电极层14的厚度为20纳米至500纳米中的任一数值。
具体地，所述电极层24的材料为聚乙撑二氧噻吩和聚苯乙烯磺酸盐的一种或多种组合或银纳米线，该材料是一种水系导电浆料，而所述平坦化层23的材料为疏水性材料，该疏水性材料与溶液接触会表现出很大的接触角，故可以避免电极层在平坦化层中的支撑挡墙区形成。
本申请实施例还提供一种液晶显示面板，所述液晶显示面板包括第一基板与第二基板，所述第一基板与所述第二基板对盒设置，且所述第一基板为上述实施例一或实施例二中任一项所述的基板，除此之外还包括填充在所述第一基板与所述第二基板之间的液晶层。
区别于现有技术，本实施例中的基板用支撑挡墙的材料代替原有平坦化层的材料，并在图案化形成支撑挡墙后形成电极层，从而降低了现有技术中平坦化层的制作成本，并利用具有疏水性的支撑挡墙与溶液接触会表现出很大的接触角这一特点，使支撑挡墙下方不会存在无用的电极层，从而避免产品产生对液晶显示器有害的寄生电容的问题出现。
请参阅图3，图3是本申请实施例提供的基板的制备方法流程图，所述方法包括如下步骤：
S301：提供衬底；
S302：在所述衬底上形成色阻层，所述色阻层包括图案化设置的黑色矩阵；
S303：在所述色阻层上形成平坦化层；
S304：对所述平坦化层进行图案化处理，形成支撑挡墙；
S305：在所述平坦化层上形成电极层，所述电极层位于所述支撑挡墙之间。
其中，所述平坦化层未设置支撑挡墙部分的高度大于所述黑色矩阵的高度，且所述平坦化层的材料为疏水性材料，该疏水性材料可以保证后续步骤在设置挡墙的区域不会存在电极层，从而避免产品产生对液晶显示面板有害的寄生电容的问题出现。
具体地，在步骤S304中采用半色调掩膜（Half Tone Method）的方式对所述平坦化层进行图案化处理。半色调掩膜的曝光方式利用光栅的部分透光性，按所需平坦化层的高度差来设置光线通过的多少，可以将光阻不完全曝光。这种方式将传统的两道曝光工序合并为一个，节省了一道曝光工序，缩短了生产周期，提高了生产效率，同时降低了生产成本。
进一步的，因为喷墨打印方式所用到的设备简单便于操作，且制备成本低制造过程简单；同时，狭缝涂布方式涂膜均匀性高、可适用的涂料粘度范围广以及涂布速度快，所以在步骤S305中用喷墨打印或狭缝涂布的方式代替现有技术中蒸镀电极层的方式来形成支撑挡墙间的电极层，以加快工艺制作的时间并降低制备成本，并使电极层的涂布更加均匀。
图4a~4d为本申请实施例提供的基板的制备工艺流程图，首先提供一衬底401，所述衬底401材料为聚酰亚胺或玻璃等无机物，然后在衬底401上形成色阻层402，该色阻层402包括图案化设置的黑色矩阵，接下来在色阻层402上形成平坦化层403，所述平坦化层403的材料为疏水性材料，并对该平坦化层403进行图案化处理，形成支撑挡墙，最后，在所述平坦化层403上形成电极层404，所述电极层404位于所述支撑挡墙之间。
请参阅图5，图5是本申请实施例提供的另一种结构的基板的制备方法流程图，所述方法包括如下步骤：
S501：提供衬底；
S502：在所述衬底上形成色阻层，所述色阻层包括图案化设置的黑色矩阵和设置于所述黑色矩阵缝隙的彩色色阻；
S503：在所述色阻层上形成平坦化层；
S504：对所述平坦化层进行图案化处理，形成支撑挡墙；
S505：在所述平坦化层上形成电极层，所述电极层位于所述支撑挡墙之间。
其中，所述平坦化层的材料为疏水性材料，该疏水性材料可以保证后续步骤在设置支撑挡墙的区域不会存在电极层，从而避免产品产生对液晶显示面板有害的寄生电容的问题出现。
具体地，在步骤S504中采用半色调掩膜（Half Tone Method）的方式对所述平坦化层进行图案化处理。半色调掩膜的曝光方式利用光栅的部分透光性，按所需平坦化层的高度差来设置光线通过的多少，可以将光阻不完全曝光。这种方式将传统的两道曝光工序合并为一个，节省了一道曝光工序，缩短了生产周期，提高了生产效率，同时降低了生产成本。
进一步的，因为喷墨打印方式所用到的设备简单便于操作，且制备成本低制造过程简单；同时，狭缝涂布方式涂膜均匀性高、可适用的涂料粘度范围广以及涂布速度快，所以在步骤S505中用喷墨打印或狭缝涂布的方式代替现有技术中蒸镀电极层的方式来形成支撑挡墙间的电极层，以加快工艺制作的时间并降低制备成本，并使电极层的涂布更加均匀。
图6a~6d为本申请实施例提供的另一种结构的基板的制备工艺流程图，首先提供一衬底601，所述衬底601材料为聚酰亚胺或玻璃等无机物，然后在衬底601上形成色阻层602，该色阻层602包括图案化设置的黑色矩阵和设置于所述黑色矩阵缝隙的彩色色阻，接下来在色阻层602上形成平坦化层603，所述平坦化层603的材料为疏水性材料，并对该平坦化层603进行图案化处理，形成支撑挡墙，最后，在所述平坦化层603上形成电极层604，所述电极层604位于所述支撑挡墙之间。
区别于现有技术，本实施例中的基板的制备方法用支撑挡墙的材料代替原有平坦化层的材料，并在图案化形成支撑挡墙后形成电极层，从而降低了现有技术中平坦化层的制作成本，并利用具有疏水性的支撑挡墙与溶液接触会表现出很大的接触角这一特点，使支撑挡墙下方不会存在无用的电极层，从而避免产品产生对液晶显示器有害的寄生电容的问题出现。
综上所述，虽然本申请已以优选实施例揭露如上，但上述优选实施例并非用以限制本申请，本领域的普通技术人员，在不脱离本申请的精神和范围内，均可作各种更动与润饰，因此本申请的保护范围以权利要求界定的范围为准。

Claims (20)

  1. 一种基板，其包括：
    衬底；
    色阻层，所述色阻层设置于所述衬底上，包括图案化设置的黑色矩阵；以及
    平坦化层，所述平坦化层设置于所述色阻层上，并图案化形成支撑挡墙。
  2. 如权利要求1所述的基板，其中，所述基板包括电极层，所述电极层设置于所述平坦化层上，且位于所述支撑挡墙之间。
  3. 如权利要求2所述的基板，其中，所述电极层的厚度小于所述支撑挡墙的高度。
  4. 如权利要求2所述的基板，其中，所述电极层的材料为聚乙撑二氧噻吩和聚苯乙烯磺酸盐的一种或多种组合。
  5. 如权利要求2所述的基板，其中，所述电极层的材料为银纳米线。
  6. 如权利要求4所述的基板，其中，所述电极层的厚度为20纳米至500纳米中的任一数值。
  7. 如权利要求4所述的基板，其中，所述平坦化层的材料为疏水性材料。
  8. 如权利要求1所述的基板，其中，所述色阻层还包括彩色色阻，所述彩色色阻设置于所述黑色矩阵的缝隙。
  9. 如权利要求1所述的基板，其中，所述平坦化层未设置所述支撑挡墙的区域厚度为0.1微米至2微米中的任一数值。
  10. 如权利要求9所述的基板，其中，所述支撑挡墙的高度为2微米至10微米中的任一数值。
  11. 一种液晶显示面板，其包括：
    第一基板；
    第二基板，与所述第一基板对盒设置；
    液晶层，填充在所述第一基板与所述第二基板之间；
    其中，所述第一基板包括：
    衬底；
    色阻层，所述色阻层设置于所述衬底上，包括图案化设置的黑色矩阵；以及
    平坦化层，所述平坦化层设置于所述色阻层上，并图案化形成支撑挡墙。
  12. 如权利要求11所述的液晶显示面板，其中，所述基板包括电极层，所述电极层设置于所述平坦化层上，且位于所述支撑挡墙之间。
  13. 如权利要求12所述的液晶显示面板，其中，所述电极层的厚度小于所述支撑挡墙的高度。
  14. 如权利要求12所述的液晶显示面板，其中，所述电极层的材料为聚乙撑二氧噻吩和聚苯乙烯磺酸盐的一种或多种组合。
  15. 如权利要求14所述的液晶显示面板，其中，所述电极层的厚度为20纳米至500纳米中的任一数值。
  16. 如权利要求14所述的液晶显示面板，其中，所述平坦化层的材料为疏水性材料。
  17. 如权利要求11所述的液晶显示面板，其中，所述色阻层还包括彩色色阻，所述彩色色阻设置于所述黑色矩阵的缝隙。
  18. 如权利要求11所述的液晶显示面板，其中，所述平坦化层未设置所述支撑挡墙的区域厚度为0.1微米至2微米中的任一数值。
  19. 如权利要求11所述的液晶显示面板，其中，所述支撑挡墙的高度为2微米至10微米中的任一数值。
  20. 一种基板制备方法，其包括：
    提供衬底；
    在所述衬底上形成色阻层，所述色阻层包括图案化设置的黑色矩阵；
    在所述色阻层上形成平坦化层；
    对所述平坦化层进行图案化处理，形成支撑挡墙。
PCT/CN2019/126593 2019-11-18 2019-12-19 一种基板、液晶显示面板及基板制备方法 Ceased WO2021097992A1 (zh)

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