WO2021042779A1

WO2021042779A1 - Multi-format framing imaging method, apparatus and device, and computer-readable storage medium

Info

Publication number: WO2021042779A1
Application number: PCT/CN2020/093439
Authority: WO
Inventors: 张敬金; 宗方轲; 杨勤劳
Original assignee: 深圳大学
Priority date: 2019-09-02
Filing date: 2020-05-29
Publication date: 2021-03-11
Also published as: CN110531578A; CN110531578B

Abstract

A multi-format framing imaging method, apparatus (200) and device, and a computer-readable storage medium. The method comprises: enabling, by means of a single hole, target light corresponding to the single hole to irradiate a photocathode (220) so as to generate a photoelectron image; sampling the photoelectron image by means of a sampling separator (230) to obtain sampled electron beams corresponding to different positions in the photoelectron image; focusing each sampled electron beam by means of an electro-optical system (240) to obtain a focused electron beam; performing deflection separation on each focused electron beam by means of an electron beam separator (250) to generate a channel electron beam corresponding to each focused electron beam; scanning each channel electron beam by means of a scanning electric field, such that each target electron beam obtained by means of scanning processing and corresponding to each channel electron beam reaches a fluorescent screen (270) and generates a stripe image; and performing image construction according to an image corresponding to the same moment in each stripe image to obtain an original target image corresponding to the moment.

Description

Multi-frame framing imaging method, device, equipment and computer readable storage medium

This disclosure claims the priority of a Chinese patent application filed with the Chinese Patent Office with an application number of 201910821639.9 on September 2, 2019. The entire content of the above application is incorporated into this disclosure by reference.

Technical field

This application relates to the field of image imaging, such as a multi-frame framing imaging method, device, equipment, and computer-readable storage medium.

Background technique

The framing camera based on photoelectric technology is an indispensable framing imaging device in the field of X-ray ultrafast diagnosis. It has two-dimensional spatial resolution and picosecond-level time resolution. It is used in femtosecond laser, plasma radiation and It has important applications in the study of ultrafast phenomena such as nuclear fusion.

X-rays are not suitable for refraction and have very strong penetrability. Generally, splitting methods cannot be used for X-ray framing imaging. Therefore, pinhole arrays (or KB microscopes) and X-ray traveling wave gated framing imaging are mainly used in related technologies. However, this technology is a non-single-view X-ray framing technology. This is because the pinholes in the pinhole array are distributed at a certain interval, resulting in each pinhole corresponding to a different azimuth angle of the measured target, so each There are differences in viewing angles between frames, causing the light emitted from the same point in the observation target to appear in different positions on different frames, so this technology cannot achieve single-view framing imaging of the target.

Summary of the invention

This application provides a multi-frame framing imaging method, device, equipment, and computer-readable storage medium.

This application provides a multi-frame framing imaging method, and the multi-frame framing imaging method includes:

Irradiate the target light corresponding to the single hole to the photocathode through the single hole to generate a photoelectron image corresponding to the single hole;

Sampling the photoelectron image by the sampling separator to obtain sampled electron beams corresponding to different positions in the photoelectron image;

Each sampled electron beam is subjected to focusing processing through an electron optical system to obtain a focused electron beam corresponding to each sampled electron beam;

Each focused electron beam is passed through an electron beam splitter for deflection separation processing to generate a channel electron beam corresponding to each focused electron beam;

Scanning the electron beams of each channel through the scanning electric field, so that each target electron beam corresponding to the electron beam of each channel obtained after the scanning process reaches the phosphor screen and generates a fringe image corresponding to the electron beam of each channel;

Image construction is performed according to the image corresponding to the same time in each fringe image to obtain the original target image corresponding to the time.

The present application also provides a multi-frame framing imaging device. The multi-frame framing imaging device includes a processor and a photocathode, a sampling separator, an electron optical system, and an electron beam that are sequentially arranged in a spatial position and are all on the same axis. Separator, scanning electric field device and fluorescent screen;

The photocathode is configured to receive target light irradiation corresponding to the single hole through the single hole to generate a photoelectron image corresponding to the single hole;

The sampling separator is configured to sample the optoelectronic image to obtain sampled electron beams corresponding to different positions in the optoelectronic image;

The electron optical system is configured to perform focusing processing on each sampled electron beam to obtain a focused electron beam corresponding to each sampled electron beam;

The electron beam splitter is configured to perform deflection separation processing on each focused electron beam to generate a channel electron beam corresponding to each focused electron beam;

The scanning electric field device is configured to perform scanning processing on each channel electron beam to obtain a target electron beam corresponding to each channel electron beam and send it to the phosphor screen;

The phosphor screen is configured to generate fringe images corresponding to the electron beams of each channel;

The processor is configured to perform image construction according to the image corresponding to the same time in each fringe image and obtain the original target image corresponding to the time.

This application also provides a multi-frame framing imaging device, including a memory and a processor, the memory is used to store a computer program, and the processor runs the computer program to make the multi-frame framing imaging device execute the above-mentioned multi-frame framing imaging method.

The present application also provides a computer-readable storage medium. The computer storage medium stores a computer program. When the computer program is executed by a processor, the above-mentioned multi-frame framing imaging method is realized.

Description of the drawings

The following will briefly introduce the drawings that need to be used in the embodiments. In each figure, similar components are numbered similarly.

FIG. 1 is a schematic flowchart of a multi-frame framing imaging method in an embodiment;

Fig. 2 is a schematic flowchart of a method for generating a channel electron beam in an embodiment;

3 is a schematic flowchart of a multi-frame framing imaging method in another embodiment;

4 is a schematic flowchart of a multi-frame framing imaging method in another embodiment;

Figure 5 is a structural block diagram of a multi-frame framing imaging device in an embodiment;

Fig. 6 is a schematic structural diagram of an electron beam splitter in an embodiment;

Fig. 7 is a structural block diagram of a multi-frame framing imaging device in another embodiment;

Fig. 8 is a schematic structural diagram of a sampling separator in an embodiment.

detailed description

The following describes the technical solutions in the embodiments of the present application clearly and completely with reference to the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments.

The components of the embodiments of the present application generally described and shown in the drawings herein may be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiments of the application provided in the accompanying drawings is not intended to limit the scope of the claimed application, but merely represents selected embodiments of the application.

Hereinafter, various embodiments of the present disclosure will be described more fully. The present disclosure may have various embodiments, and adjustments and changes may be made therein.

Hereinafter, the terms "including", "having" and their cognates that can be used in various embodiments of the present application are only intended to represent specific features, numbers, steps, operations, elements, components, or combinations of the foregoing items, And should not be understood as first excluding the existence of one or more other features, numbers, steps, operations, elements, components or combinations of the foregoing items or adding one or more features, numbers, steps, operations, elements, components Or the possibility of a combination of the foregoing.

In addition, the terms "first", "second", "third", etc. are only used for distinguishing description, and cannot be understood as indicating or implying relative importance.

Unless otherwise defined, all terms (including technical terms and scientific terms) used herein have the same meanings as commonly understood by those of ordinary skill in the art to which various embodiments of the present application belong. The terms (such as those defined in commonly used dictionaries) will be interpreted as having the same meaning as the contextual meaning in the relevant technical field and will not be interpreted as having idealized or overly formal meanings, Unless clearly defined in the various embodiments of the present application.

Fig. 1 is a schematic flowchart of a multi-frame framing imaging method in an embodiment, and the multi-frame framing imaging method includes:

In step S110, the corresponding target light is irradiated to the photocathode through a single hole to generate a corresponding photoelectron image.

In one embodiment, light is used to illuminate the target scene, and then the echo light signal reflected by the target scene is incident through a single hole and irradiated to the photocathode, thereby generating a corresponding two-dimensional photoelectron image, wherein the timing of the obtained two-dimensional photoelectron image is the same as The timing of the corresponding incident light signal of the incident photocathode is the same.

In step S120, the two-dimensional photoelectron image is sampled by the sampling separator to obtain sampled electron beams corresponding to different positions in the photoelectron image.

In one embodiment, after the corresponding two-dimensional photoelectron image is generated by the photocathode, the two-dimensional photoelectron image is further sampled and separated by a sampling separator, and the two-dimensional photoelectron image is divided into a plurality of photoelectron beams at different positions to obtain Sampled electron beams corresponding to different positions in the two-dimensional photoelectron image.

In one embodiment, the sampling separator uses a sampling slit array device.

In step S130, each sampled electron beam is subjected to focusing processing through the electron optical system to obtain respective focused electron beams.

In one embodiment, after obtaining each of the above-mentioned sampled electron beams, there may be a problem that the electron beams are relatively scattered. Therefore, for each sampled electron beam, the electron optical system needs to be focused separately to obtain the corresponding focused electron beam.

In step S140, each focused electron beam is subjected to deflection separation processing through an electron beam splitter to generate respective corresponding channel electron beams.

In one embodiment, for each focused electron beam, before being deflected by the subsequent scanning electric field, it is also necessary to perform deflection separation processing by an electron beam splitter. This is because before each focused electron beam enters the deflection electric field, If the distance between them is too small, it is easy to cause overlap of imaging on the subsequent fluorescent screen. Therefore, each focused electron beam is passed through an electron beam splitter for deflection separation processing to generate respective channel electron beams.

In step S150, the electron beams of each channel are respectively subjected to scanning processing through the scanning electric field, so that each corresponding target electron beam obtained after the scanning processing reaches the phosphor screen and generates a corresponding fringe image.

In an embodiment, after obtaining the electron beams of each channel, it is also necessary to scan the electron beams of each channel through the scanning electric field respectively to generate the corresponding target electron beams and reach the phosphor screen, so that the electron beams of each channel The time sequence information contained in each is converted into spatial information.

In one embodiment, the voltage applied to the scanning electric field is a ramp voltage.

In step S160, image construction is performed according to the image corresponding to the same moment in each fringe image to obtain the corresponding original target image.

In one embodiment, each channel electron beam corresponds to a set of fringe images on the phosphor screen, and there are fringe images at different moments on the phosphor screen. At this time, the processor performs processing by extracting the images corresponding to the same moment in each fringe image. Image construction can get the corresponding original target image.

In one embodiment, the above-mentioned original target image is usually a two-dimensional target image.

In the above-mentioned multi-frame framing imaging method, the corresponding target light is irradiated to the photocathode through a single hole to generate a corresponding photoelectron image, and the photoelectron image is sampled by a sampling separator to obtain sampled electron beams corresponding to different positions in the photoelectron image , Each sampled electron beam is focused through an electron optical system to obtain its corresponding focused electron beam, and each focused electron beam is passed through an electron beam splitter for deflection and separation processing to generate respective corresponding channel electron beams. The electron beams of each channel are respectively scanned through the scanning electric field, so that each corresponding target electron beam obtained after the scanning process reaches the phosphor screen and generates a corresponding fringe image, which is performed according to the corresponding image at the same time in each fringe image Image construction to obtain the corresponding original target image, which can achieve single-view multi-frame framing imaging and image construction to obtain the corresponding original target image, which overcomes related technologies such as pinhole array (or KB microscope) and X-ray line The technical defects of wave-gated framing imaging technology.

In one embodiment, the electron beam splitter includes a collimating slit array device and a multi-channel deflection splitter. As shown in FIG. 2, step S140 includes:

Step S142, passing each focused electron beam through each collimating slit in the collimating slit array device to perform filtering and collimating processing on each focused electron beam on the Fourier image plane to generate respective corresponding collimation Electron beam.

In one embodiment, the electron beam splitter includes a collimating slit array device and a multi-channel deflection separator. The collimating slit array device is usually provided with a plurality of collimating slits, and each focused electron beam passes through the respective corresponding The collimation slit can filter and collimate each focused electron beam on the Fourier image plane to generate corresponding collimated electron beams. Each electron beam is more concentrated and collimated, which is the subsequent processing The process lays the foundation.

In one embodiment, the number of collimating slits in the collimating slit array device is the same as the number of corresponding sampling slits in the sampling separator, and the collimating slits in the collimating slit array device are separated from the sampling The sampling slits in the device have a one-to-one correspondence in the spatial position to ensure that each sampled electron beam can be further processed through the respective corresponding collimation slits after focusing processing.

In step S144, each collimated electron beam is deflected and separated by a multi-channel deflection separator to increase the distance between adjacent collimated electron beams and generate respective corresponding channel electron beams.

In one embodiment, the multi-channel deflection separator is provided with multiple deflection separation channels, which can initially increase the distance between adjacent collimated electron beams and generate corresponding channel electron beams, thereby eliminating the electron beams in each channel. The mutual influence between to achieve multi-frame framing imaging.

In one embodiment, the distance between each collimation slit can be set to be equal. Similarly, the distance between each deflection separation channel is also set equal, and each deflection separation channel is opposite to the corresponding collimation slit. Correspondingly, the time range corresponding to each collimated electron beam generated is the same, and the timing information between the electron beams of each channel will not cross, which is beneficial to the subsequent reconstruction of the target image, otherwise it is easy to cause the loss of the image timing information.

In an embodiment, the voltage applied to the above-mentioned multi-channel deflection separator is usually a corresponding DC voltage.

In an embodiment, before step S130, the method further includes:

In step S170, each sampled electron beam is passed through an acceleration unit for acceleration processing.

In one embodiment, in order to obtain a higher brightness gain for subsequent images, an acceleration grid is generally used to pass each sampled electron beam through an acceleration unit for acceleration processing.

In one embodiment, step S170 may be located before step S120, as shown in FIG. 3; it may also be located after step S120, as shown in FIG. 4.

In one embodiment, the multi-channel deflection separator is provided with a plurality of pairs of DC electrode plates, and the center axis of each pair of DC electrode plates is the same as the center axis of the corresponding collimating slit to form a corresponding deflection separation channel. Step S144 includes :

Each collimated electron beam is deflected and separated through its corresponding deflection separation channel to increase the distance between adjacent collimated electron beams and generate respective corresponding channel electron beams.

In one embodiment, the multi-channel deflection separator is provided with a plurality of pairs of DC electrode plates, and the center axis of each pair of DC electrode plates is the same as the center axis of the corresponding collimating slit to form a corresponding deflection separation channel. In this way, Each collimated electron beam is deflected and separated through its corresponding deflection separation channel, thereby increasing the distance between adjacent collimated electron beams and generating respective corresponding channel electron beams.

In addition, as shown in FIG. 5, a multi-frame framing imaging device 200 is also provided. The multi-frame framing imaging device 200 includes a processor 210 and photocathodes 220, which are arranged sequentially in spatial position and are all on the same axis. Sampling separator 230, electron optical system 240, electron beam separator 250, scanning electric field device 260 and phosphor screen 270;

The photocathode 220 is configured to receive corresponding target light irradiation to generate a corresponding photoelectron image;

The sampling separator 230 is configured to sample the optoelectronic image to obtain sampled electron beams corresponding to different positions in the optoelectronic image;

The electron optical system 240 is configured to perform focusing processing on each sampled electron beam to obtain the corresponding focused electron beam;

The electron beam splitter 250 is configured to separately perform deflection and separation processing on each focused electron beam to generate respective channel electron beams;

The scanning electric field device 260 is configured to scan the electron beams of each channel separately to obtain the corresponding target electron beams and send them to the phosphor screen;

The phosphor screen 270 is configured to generate a corresponding fringe image;

The processor 210 is configured to construct an image according to the image corresponding to the same moment in each fringe image and obtain the corresponding original target image.

In one embodiment, as shown in FIG. 6, the electron beam splitter 250 includes a collimating slit array device 252 and a multi-channel deflection splitter 254;

The collimating slit array device 252 is configured to filter and collimate each focused electron beam on the Fourier image plane to generate a corresponding collimated electron beam;

The multi-channel deflection separator 254 is configured to deflect and separate each collimated electron beam to increase the distance between adjacent collimated electron beams, and to generate respective corresponding channel electron beams.

In one embodiment, as shown in FIG. 7, the multi-frame framing imaging device 300 is further provided with an acceleration unit 280, and the acceleration unit 280 is disposed between the photocathode 220 and the sampling separator 230;

The acceleration unit 280 is configured to perform acceleration processing on each sampled electron beam separately.

In an embodiment, the acceleration unit 280 may be provided between the sampling separator 230 and the electron optical system 240.

In one embodiment, referring to FIG. 6, the multi-channel deflection separator 254 is provided with a plurality of pairs of DC electrode plates, and the center axis of each pair of DC electrode plates is the same as the center axis of the corresponding collimating slit to form a corresponding deflection separation. aisle.

In one embodiment, the center axis of each collimating slit is the same as the center axis of each pair of DC electrode plates to form a corresponding deflection separation channel.

In one embodiment, as shown in FIG. 8, the sampling separator 230 uses a sampling slit array device, and the number of collimating slits in the collimating slit array device is the same as the number of sampling slits in the sampling separator, and the number of collimating slits in the collimating slit array device is the same. The collimation slits in the straight slit array device and the sampling slits in the sampling separator correspond to each other in a one-to-one spatial position.

In addition, this application also provides a multi-frame framing imaging device, including a memory and a processor, the memory is used to store a computer program, and the processor runs the computer program to make the multi-frame framing imaging device execute the above-mentioned multi-frame framing imaging method .

The present application also provides a computer-readable storage medium, and the computer storage medium stores a computer program used by the above-mentioned multi-frame framing imaging device.

In the several embodiments provided in this application, it should be understood that the disclosed device and method may also be implemented in other ways. The device embodiments described above are merely schematic. For example, the flowcharts and structural diagrams in the accompanying drawings show the possible implementation architecture and functions of the devices, methods, and computer program products according to multiple embodiments of the present application. And operation. In this regard, each block in the flowchart or block diagram may represent a module, program segment, or part of the code, and the module, program segment, or part of the code contains one or more functions for realizing the specified logic function. Executable instructions. It should also be noted that, in alternative implementations, the functions marked in the block may also occur in a different order from the order marked in the drawings. For example, two consecutive blocks can actually be executed in parallel, or they can sometimes be executed in the reverse order, depending on the functions involved. It should also be noted that each block in the structure diagram and/or flowchart, and the combination of the blocks in the structure diagram and/or flowchart, can be used as a dedicated hardware-based system that performs specified functions or actions. , Or can be realized by a combination of dedicated hardware and computer instructions.

In addition, each functional module or unit in each embodiment of the present application may be integrated together to form an independent part, or each module may exist alone, or two or more modules may be integrated to form an independent part. section.

If the function is implemented in the form of a software function module and sold or used as an independent product, it can be stored in a computer readable storage medium. Based on this understanding, the technical solution of the present application essentially or the part that contributes to the related technology or the part of the technical solution can be embodied in the form of a software product, and the computer software product is stored in a storage medium, including several The instructions are used to make a computer device (which may be a smart phone, a personal computer, a server, or a network device, etc.) execute all or part of the steps of the method described in each embodiment of the present application. The aforementioned storage media include: U disk, mobile hard disk, read-only memory (ROM, Read-Only Memory), random access memory (RAM, Random Access Memory), magnetic disks or optical disks and other media that can store program codes. .

The above-mentioned multi-frame framing imaging method, device, equipment and computer-readable storage medium irradiate the corresponding target light to the photocathode through a single hole to generate the corresponding optoelectronic image, and sample the optoelectronic image through the sampling separator to obtain the photoelectron image For the sampled electron beams corresponding to different positions in the image, each sampled electron beam is focused through the electron optical system to obtain its corresponding focused electron beam, and each focused electron beam is deflection separated by an electron beam splitter. , Generate the corresponding channel electron beams, scan each channel electron beam separately through the scanning electric field, so that each corresponding target electron beam obtained after the scanning process reaches the phosphor screen and generates the corresponding fringe image. Image construction is performed on the image corresponding to the same moment in the fringe image to obtain the corresponding original target image, which can achieve single-view multi-frame framing imaging and can perform image construction to obtain the corresponding original two-dimensional target image, which overcomes related technologies such as The pinhole array (or KB microscope) with X-ray traveling wave gated framing imaging technology cannot realize the technical defect of multi-frame framing imaging with a single angle of view.

Claims

A multi-frame framing imaging method, the multi-frame framing imaging method includes:

Irradiating the target light corresponding to the single hole to the photocathode through the single hole to generate a photoelectron image corresponding to the single hole;

Sampling the optoelectronic image by a sampling separator to obtain sampled electron beams corresponding to different positions in the optoelectronic image;

Performing focusing processing on each of the sampled electron beams through an electron optical system to obtain a focused electron beam corresponding to each of the sampled electron beams;

Each of the focused electron beams is subjected to deflection separation processing through an electron beam splitter to generate a channel electron beam corresponding to each of the focused electron beams;

The electron beams of each channel are respectively subjected to scanning processing through a scanning electric field, so that each target electron beam corresponding to each channel electron beam obtained after the scanning process reaches the phosphor screen and generates a signal corresponding to each of the electron beams. The fringe image corresponding to the channel electron beam;

Image construction is performed according to the image corresponding to the same moment in each of the fringe images to obtain the original target image corresponding to the moment.
The multi-frame framing imaging method according to claim 1, wherein the electron beam splitter comprises a collimating slit array device and a multi-channel deflection splitter;

The step of passing each of the focused electron beams through an electron beam splitter to perform deflection separation processing to generate a channel electron beam corresponding to each of the focused electron beams includes:

Each of the focused electron beams is passed through each of the collimating slits in the collimating slit array device to perform filtering and collimation processing on each of the focused electron beams on the Fourier image plane to generate Collimated electron beams corresponding to the focused electron beams;

Each of the collimated electron beams is deflected and separated by the multi-channel deflection separator to increase the distance between the adjacent collimated electron beams and generate a channel corresponding to each of the collimated electron beams Electron beam.
The multi-frame framing imaging method according to claim 1, before the step of performing focusing processing on each of the sampled electron beams through an electron optical system to obtain a focused electron beam corresponding to each of the sampled electron beams , The multi-frame framing imaging method further includes:

Each of the sampled electron beams is subjected to acceleration processing through an acceleration unit respectively.
The multi-frame framing imaging method according to claim 2, wherein the multi-channel deflection separator is provided with a plurality of pairs of direct current electrode plates, and the central axis of each pair of the direct current electrode plates is aligned with the corresponding collimating narrow The central axes of the slits are the same to form a deflection separation channel;

Said making each of the collimated electron beams pass through the multi-channel deflection separator for deflection separation so as to increase the distance between the adjacent collimated electron beams and generate corresponding to each of the collimated electron beams The steps of the channel electron beam include:

Make each collimated electron beam pass through the deflection separation channel corresponding to each collimated electron beam for deflection separation to increase the distance between adjacent collimated electron beams and generate The channel electron beam corresponding to the collimated electron beam.
A multi-frame framing imaging device. The multi-frame framing imaging device includes a processor, a photocathode, a sampling separator, an electron optical system, and an electron beam separator that are sequentially arranged in a spatial position and are all on the same axis , Scanning electric field device and fluorescent screen;

The photocathode is configured to receive target light irradiation corresponding to the single hole through a single hole to generate a photoelectron image corresponding to the single hole;

The sampling separator is configured to sample the optoelectronic image to obtain sampled electron beams corresponding to different positions in the optoelectronic image;

The electron optical system is configured to perform focusing processing on each of the sampled electron beams to obtain a focused electron beam corresponding to each of the sampled electron beams;

The electron beam splitter is configured to perform deflection separation processing on each of the focused electron beams to generate channel electron beams corresponding to each of the focused electron beams;

The scanning electric field device is configured to perform scanning processing on each of the channel electron beams to obtain a target electron beam corresponding to each of the channel electron beams and send it to the phosphor screen;

The phosphor screen is configured to generate a fringe image corresponding to each of the channel electron beams;

The processor is configured to perform image construction according to the image corresponding to the same time in each of the fringe images, and obtain the original target image corresponding to the time.
The multi-frame framing imaging device according to claim 5, wherein the electron beam splitter comprises a collimating slit array device and a multi-channel deflection splitter;

The collimating slit array device is configured to allow each of the focused electron beams to pass through each collimating slit in the collimating slit array device to focus each of the focused electron beams on the Fourier image plane. Filtering and collimating the electron beams to generate collimated electron beams corresponding to each of the focused electron beams;

The multi-channel deflection separator is configured to deflection and separate each of the collimated electron beams to increase the distance between the adjacent collimated electron beams, and to generate corresponding to each of the collimated electron beams. Channel electron beam.
The multi-frame framing imaging device according to claim 5, wherein the multi-frame framing imaging device is further provided with an acceleration unit, the acceleration unit being arranged between the photocathode and the sampling separator;

The acceleration unit is configured to perform acceleration processing on each of the sampled electron beams respectively.
The multi-frame framing imaging device according to claim 6, wherein the multi-channel deflection separator is provided with a plurality of pairs of direct current electrode plates, and the central axis of each pair of the direct current electrode plates is aligned with the corresponding collimating narrow The central axes of the slits are the same to form a deflection separation channel.
The multi-frame framing imaging device according to claim 6, wherein the sampling separator comprises a collimating sampling slit array device, and the number of collimating slits in the collimating slit array device is separated from the sampling The number of sampling slits in the device is the same.
A multi-frame framing imaging device includes a memory and a processor, the memory is used to store a computer program, and the processor runs the computer program to make the multi-frame framing imaging device execute claims 1 to 4 Any one of the multi-frame framing imaging method.
A computer-readable storage medium, the computer storage medium stores a computer program, and when the computer program is executed by a processor, the multi-frame framing imaging method according to any one of claims 1 to 4 is realized.