WO2021013327A1 - Source d'évaporation, système de dépôt et procédé d'évaporation - Google Patents

Source d'évaporation, système de dépôt et procédé d'évaporation Download PDF

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Publication number
WO2021013327A1
WO2021013327A1 PCT/EP2019/069590 EP2019069590W WO2021013327A1 WO 2021013327 A1 WO2021013327 A1 WO 2021013327A1 EP 2019069590 W EP2019069590 W EP 2019069590W WO 2021013327 A1 WO2021013327 A1 WO 2021013327A1
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WO
WIPO (PCT)
Prior art keywords
crucible
source
feeding passage
evaporation
reservoir
Prior art date
Application number
PCT/EP2019/069590
Other languages
English (en)
Inventor
Annabelle HOFMANN
Matthias Krebs
Original Assignee
Applied Materials, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials, Inc. filed Critical Applied Materials, Inc.
Priority to PCT/EP2019/069590 priority Critical patent/WO2021013327A1/fr
Publication of WO2021013327A1 publication Critical patent/WO2021013327A1/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material

Definitions

  • the present disclosure generally relates to systems, apparatuses and methods for depositing materials, e.g. organic materials, on a substrate.
  • embodiments described herein relate to an evaporation source for evaporating a source material, a deposition system for depositing an evaporated source material on a substrate, and a method of evaporating a source material that is to be deposited on a substrate.
  • Embodiments of the present disclosure particularly relate to an evaporation source for the evaporation of organic materials, e.g. for use in deposition systems for manufacturing devices, particularly devices including organic materials therein.
  • Coated substrates may be used in several applications and in several technical fields.
  • coated substrates may be used in the field of organic light emitting diode (OLED) devices.
  • OLEDs can be used in the manufacture of television screens, computer monitors, mobile phones, other hand-held devices, and the like for displaying information.
  • Organic evaporators are a tool for the production of organic light-emitting diodes (OLEDs).
  • OLEDs are a special type of light-emitting diode in which the emissive layer comprises a thin film of certain organic compounds.
  • OLEDs are used in the manufacture of television screens, computer monitors, mobile phones and other hand-held devices for displaying information. OLEDs can also be used for general space illumination. The range of colors, brightness, and viewing angles possible with OLED displays is greater than that of traditional LCD displays, because OLED pixels directly emit light and do not need a back light. Therefore, the energy consumption of OLED displays is considerably less than that of traditional LCD displays. Further, the fact that OLEDs can be manufactured onto flexible substrates results in further applications.
  • Evaporation sources typically include an evaporation crucible that is configured to evaporate a source material by heating the source material to a temperature at or above the evaporation temperature of the source material.
  • the evaporated material may be guided into a vapor distribution assembly that is configured for directing the evaporated material onto a substrate.
  • the substrate can be supported on a carrier configured to hold the substrate in alignment with a mask.
  • the vapor from the evaporation source is directed toward the substrate through the mask to create a patterned film on the substrate.
  • One or more materials may be deposited onto the substrate through one or more masks to create small pixels that can be addressed individually to create functional devices such as full color displays.
  • an inner volume of the evaporation crucible is heated for evaporating the source material.
  • the source material may be arranged in solid or liquid form inside the evaporation crucible, e.g. as a powder or as a granulate.
  • typical source materials are temperature sensitive, such that there is a risk of material decomposition in the evaporation crucible if the source material is exposed to the high temperatures inside the crucible over an extended time.
  • an evaporation source includes a crucible for evaporating a source material, a material reservoir that is arranged at least partially higher than the crucible for storing the source material, and a material feeding passage extending in a downward direction from the material reservoir to the crucible for gravitationally feeding the source material into the crucible.
  • an evaporation source includes a crucible for evaporating a source material, a material reservoir for storing the source material, and a material feeding passage extending from the material reservoir to the crucible for feeding the source material into the crucible. Further, an iris valve for opening and closing the material feeding passage is provided.
  • the material feeding passage has the shape of a ring slit having a radial dimension that is adjustable by the iris valve.
  • a deposition system for depositing an evaporated source material on a substrate.
  • the deposition system includes a deposition chamber, an evaporation source according to any of the embodiments described herein, and a drive unit for moving the evaporation source in the deposition chamber.
  • an evaporation method includes gravitationally feeding a source material from a material reservoir into a crucible along a downwardly extending material feeding passage, and evaporating the source material in the crucible.
  • Embodiments are also directed at apparatuses for carrying out the disclosed methods and include apparatus parts for performing each described method aspect. These method aspects may be performed by way of hardware components, a computer programmed by appropriate software, by any combination of the two or in any other manner.
  • embodiments according to the disclosure are also directed at methods for operating the described apparatuses and methods for manufacturing the described apparatuses. It includes method aspects for carrying out every function of the apparatus.
  • FIG. 1 shows a schematic side view of an evaporation source according to embodiments described herein;
  • FIG. 2 shows a schematic top view of the evaporation source of FIG. 1;
  • FIG. 3 shows a schematic side view of an evaporation source according to embodiments described herein;
  • FIG. 4A shows a schematic top view of a valve of the evaporation source of FIG. 3 in an open state;
  • FIG. 4B shows a schematic top view of the valve of the evaporation source of FIG. 3 in a closed state
  • FIG. 5 shows a schematic top view of a deposition system according to embodiments described herein.
  • FIG. 6 shows a flow diagram of a method according to embodiments described herein.
  • An evaporation source includes a crucible with an inner volume for accommodating source material to be evaporated.
  • the inner volume of the crucible can be heated with a heating unit for evaporating the source material that is accommodated in the crucible.
  • the source material can be an organic material or another material, e.g. a metal.
  • the organic material can be placed in the inner volume of the crucible, and the crucible is heated to a temperature at or above the evaporation temperature of the source material.
  • the evaporated source material is guided through a vapor distribution assembly and is directed toward the substrate via one or more vapor outlets. Heating of the crucible to an elevated temperature as well as cooling down the crucible to allow for maintenance and refilling of the crucible can be time consuming. For example, the pressure and the temperature inside the crucible for providing a predetermined evaporation rate may change and stabilize only slowly.
  • Source materials particularly organic source materials and other material compositions are temperature sensitive, such that material decomposition may occur when exposing the source material to elevated temperatures over an extended time inside the crucible.
  • the decomposition temperature may be close to the evaporation temperature of the material, such that there is a considerable risk of material decomposition of the organic material inside the crucible.
  • the risk of material decomposition may already considerably increase when the temperature inside the crucible increases by several degrees, particularly when the source material is exposed to the elevated temperature over an extended time.
  • an evaporation source includes a crucible for evaporating a source material that is to be evaporated, particularly an organic material.
  • a heating unit may be provided for heating the source material provided inside the crucible to a temperature at or above the evaporation temperature of the source material.
  • the evaporation source further includes a material reservoir arranged at least partially higher than the crucible for storing source material that is to be filled into the crucible for evaporation.
  • the material reservoir may store source material that is to be filled into the crucible.
  • the evaporation source further includes a material feeding passage extending, at least in sections, in a downward direction from the material reservoir to the crucible for gravitationally feeding the source material from the material reservoir into the crucible.
  • the material feeding passage is a passage (e.g., a channel or tube section) for the source material extending from the material reservoir to the crucible.
  • the material feeding passage may extend downwardly along the whole extension of the material feeding passage from the material reservoir to the crucible. Since the material feeding passage extends from the material reservoir to the crucible in a downward direction, the source material can be gravitationally fed into the crucible from the reservoir.
  • the source material can move downward into the crucible from the material reservoir through the material feeding passage by the force of gravity, and there may not be any feeding device or metering device for actively feeding or pushing the source material into the crucible. Rather, the movement of the source material into the crucible may happen automatically by gravity, the feeding rate depending on the dimension and/or inclination of the feeding passage.
  • the dimension and/or the shape of the material feeding passage may be adaptable, e.g. by a shutter or valve, for adjusting the feeding rate or for completely opening and/or closing the material feeding passage.
  • the term“higher” as used herein can be understood as“further up in a vertical direction”.
  • a first object being placed higher than a second object has a higher gravitational potential energy than the second object.
  • material that is accommodated in the material reservoir being arranged higher than the crucible has a higher gravitational potential energy than material accommodated in the crucible.
  • At least a part of the inner volume of the material reservoir, particularly the whole material reservoir, is arranged higher than the crucible. Accordingly, material placed in the material reservoir can gravitationally move downward into the inner volume of the crucible via the material feeding passage.
  • the entire material reservoir is placed above the crucible, such that the source material can gravitationally move into the crucible from the material reservoir.
  • the upward direction is indicated by the arrow yi in FIG. 1.
  • the downward direction is indicated by the arrow y2 in FIG. 1.
  • the term“in a downward direction” as used herein can be understood as meaning “toward a lower gravitational level”, i.e. from the material reservoir downward toward the crucible.
  • “In a downward direction” can mean downward in the vertical direction, as is illustrated by arrow y2 in FIG. 1, i.e. essentially perpendicular to a horizontal plane.“In a downward direction” also encompasses any direction having a downward gradient, i.e. downwardly inclined relative to a horizontal direction.
  • a material feeding passage extending in a downward direction may be a passage having a downward gradient, e.g. inclined downward with an inclination angle of 30° or more, particularly 60° or more relative to a horizontal plane, such that the source material can slide or fall downward along the downwardly extending material feeding passage into the inner volume of the crucible.
  • the term“source material” or“material to be evaporated” relates to the material that is to be evaporated in the crucible and deposited on a substrate, particularly an organic material.
  • the source material before evaporation can be in a solid or liquid state, e.g. in the form of a powder or granulate. After evaporation in the crucible, the evaporated source material may be in a gaseous state or vapor state.
  • the term “evaporated source material” or“evaporated material” as used herein relates to the source material after being heated and evaporated in the crucible, i.e. to material that has undergone a change of aggregate state in the crucible.“Evaporated material” may particularly be in a gaseous state.
  • FIG. 1 schematically shows an evaporation source 100 according to embodiments described herein.
  • the evaporation source 100 includes a crucible 120.
  • the crucible 120 may include a heating unit 122 for providing heat to the crucible, in particular for heating up the inner volume of the crucible, e.g. to a temperature at or above the evaporation temperature of the source material, particularly to a temperature of 200°C or more, particularly 300°C or more.
  • Source material placed in the crucible 120 can be heated up and evaporated by the heating unit 122.
  • the heating unit 122 can include, e.g., a resistive heater or an inductive heater.
  • the heating unit 122 can be arranged in thermal contact with a wall of the crucible 120.
  • the heating unit 122 may include one or more conductors that surround the crucible for resistively heating the crucible.
  • the heating unit 122 may be configured to provide a temperature sufficient to evaporate the source material placed inside the crucible.
  • the evaporation source 100 may include a distribution pipe 130 in fluid communication with the crucible 120, the distribution pipe 130 being configured for directing the evaporated source material toward a substrate.
  • the evaporation source may include a vapor conduit 128 for extracting the evaporated source material from the crucible. The evaporated source material may be guided from the crucible 120 to the distribution pipe 130 through the vapor conduit 128.
  • the distribution pipe 130 may include one or more vapor outlets or nozzles 132 for directing the evaporated source material towards the substrate.
  • the evaporation source may include at least one heating unit 126 for heating the vapor conduit 128.
  • the at least one heating unit 126 may at least partially surround the vapor conduit 128.
  • the at least one heating unit 126 may include one or more resistive heaters or inductive heaters.
  • condensation of the evaporated source material at a wall surface of the vapor conduit 128 can be reduced or prevented.
  • a heating unit for heating an inner volume of the distribution pipe 130 may be provided.
  • the distribution pipe may be heated to prevent evaporated source material from condensing at a wall surface of the distribution pipe.
  • the distribution pipe may include a heat shield. The heat shield may prevent heat radiation from the distribution pipe.
  • the evaporation source 100 includes a material reservoir 110.
  • Source material can be stored in the material reservoir 110. From the material reservoir 110, the source material may be fed into an inner volume of the crucible 120 along a material feeding passage 115. The source material may be fed into the crucible at a specific feeding rate, as is described further below. The source material may be transferred to the crucible from the material reservoir at a predetermined rate and/or at predetermined intervals.
  • the material reservoir 110 is arranged higher than the crucible 120, such that source material stored in the material reservoir can be gravitationally fed from the material reservoir into the crucible through the material feeding passage 115 that extends downwardly from the material reservoir to the crucible.
  • No feeding device for actively feeding the source material into the crucible may be needed in some embodiments. Rather, the source material can be fed into the crucible purely by gravity.
  • an active feeding device may additionally be provided.
  • the material reservoir 110 which may be provided at a temperature well below the evaporation temperature, and only a small portion of the source material is gravitationally fed into the crucible, which may be provided at a temperature at or above the evaporation temperature, the risk of material degradation can be considerably decreased.
  • the source material may remain inside the crucible in a solid state only for a short time period at an elevated temperature, reducing the risk of material degradation.
  • the crucible can quickly and easily be refilled with an appropriate amount of source material by gravitational feeding, as may be suitable for providing a predetermined evaporation rate. No complex active feeding devices or metering devices may be provided in some embodiments.
  • the material reservoir can be maintained at a temperature well below the evaporation temperature, facilitating the refilling of the material reservoir with source material and reducing the risk of material degradation.
  • the material reservoir 110 may taper in a downward direction towards the material feeding passage 115.
  • the material reservoir may be funnel-shaped.
  • the material feeding passage may extend from the material reservoir 110 to the crucible 120.
  • the material feeding passage 115 connects the material reservoir 110 and the crucible 120 and may provide a gravitational feeding path for the source material.
  • the terms“tapering” or“funnel-shaped” with regard to the material reservoir may be understood as a reduction in a cross-sectional dimension of the material reservoir in the downward direction.
  • the material reservoir may essentially have the shape of a cone or funnel which tapers toward the material feeding passage.
  • the dimension of the material reservoir may change gradually and/or continuously in the downward direction.
  • the material reservoir may have a greater diameter at the upper end 114 and a narrower diameter at a lower end 116, i.e. at the end connecting to the material feeding passage 115.
  • the cross-sectional area of the material reservoir in a horizontal sectional plane
  • the material reservoir tapering in the downward direction towards the material feeding passage facilitates a flow of the source material towards the crucible.
  • the material reservoir may be shaped such that a powder-like or granulate-like source material placed at an arbitrary position inside the material reservoir will slide downward into the material feeding passage by gravity.
  • the material reservoir may provide a considerable space for storing source material due to the large-diameter upper portion, while the source material is reliably guided toward the small-diameter material feeding passage, allowing an accurate material feeding and feeding rate adjustment through the material feeding passage.
  • the weight of upper source material layers in the material reservoir reliably presses lower source material layers into the material feeding passage, ensuring an appropriate feeding rate. Accordingly, a proper feeding of source material into the crucible can be ensured.
  • the evaporation source 100 further includes a vapor conduit 128 for extracting the evaporated source material from the crucible 120, particularly for guiding the evaporated source material from the crucible into the distribution pipe 130.
  • the material reservoir 110 may be arranged adjacent to the vapor conduit 128 that guides the evaporated source material out of the crucible.
  • the material reservoir 110 is arranged laterally with respect to the vapor conduit 128 on top of the crucible 120.
  • the material reservoir may partially or entirely surround the vapor conduit 128.
  • An embodiment in which the vapor conduit is surrounded by the material reservoir is depicted in FIG. 3.
  • the material reservoir 110 may include a temperature control unit 112.
  • the temperature control unit 112 may be configured for maintaining the material reservoir at a predetermined temperature, which may be well below the evaporation temperature of the source material. A degradation of the source material stored in the material reservoir can be reduced or prevented.
  • the temperature control unit 112 may be configured to retain an inner volume of the material reservoir at a temperature below the evaporation temperature of the source material, i.e. at a temperature below the crucible temperature.
  • the temperature control unit 112 may be configured to retain the inner volume of the material reservoir at a temperature suitable for material storage, e.g. at a temperature below 100°C.
  • the temperature provided by the temperature control unit 112 may be 40°C or more, particularly 60°C or more, in order to expel water from the source material or prevent any water absorption of the source material.
  • the evaporation source of embodiments described herein includes the material feeding passage 115.
  • the material feeding passage 115 extends in a downward direction from the material reservoir 110 to the crucible 120 and is configured for gravitationally feeding the source material into the crucible.
  • the material feeding passage 115 may allow a transfer of the source material from the material reservoir to the crucible 120.
  • the material feeding passage may extend from the lower end 116 of the material reservoir toward the crucible.
  • the lower end 116 of the material reservoir may have a smooth transition to the material feeding passage, e.g. having a corresponding dimension.
  • the material feeding passage 115 may be shaped to ensure a gravitational flow of the source material from the material reservoir into the crucible.
  • the material feeding passage may extend at least partially around the vapor conduit 128.
  • the material feeding passage may be arranged adjacent to the vapor conduit 128.
  • the material feeding passage 115 may be provided as an opening between the lower end 116 of the material reservoir and the crucible, e.g. a round or circular opening, for example having a diameter of 2 cm or more and/or 10 cm or less.
  • the material feeding passage 115 may include a shutter or valve 118 for opening and closing the material feeding passage.
  • the shutter or valve 118 can be switched between an open position in which the material feeding passage 115 is open and a closed position in which the material feeding passage is closed.
  • the shutter or valve 118 may optionally be configured to partially open the material feeding passage for adjusting the feeding rate of the source material through the material feeding passage. Accordingly, an opening and/or closing state of the shutter or valve 118 can be adjusted for providing an appropriate feeding rate of the source material from the material reservoir into the crucible, e.g.
  • the evaporation source may include an actuator for opening and/or closing the shutter or valve 118, e.g. for switching between an open state and a closed state of the material feeding passage, or for adjusting an opening width of the material feeding passage.
  • the actuator may be driven mechanically, electrically, pneumatically, hydraulically, manually or by any combination thereof.
  • FIG. 2 shows a schematic top view of the evaporation source 100 of FIG. 1.
  • the material reservoir 110 may be arranged adjacent to the vapor conduit 128.
  • the material feeding passage 115 may be provided as an opening, e.g. as a round opening, at the bottom end of the material reservoir.
  • a shutter or valve for opening and closing the material feeding passage may be provided.
  • the material reservoir 110 may be arranged at least partially higher than the crucible 120.
  • the material reservoir being arranged above the crucible in a vertical direction allows for gravitationally feeding of the source material into the crucible.
  • gravitationally feeding as used herein may be understood as a transfer of source material by gravitation forces. No active feeding mechanism may be provided in some embodiments.
  • evaporation rate relates to the amount of source material that is evaporated in a given time period in the crucible and propagates into the distribution pipe.
  • the shutter or valve 118 can be opened or closed to either allow or block a gravitational movement of source material into the crucible 120.
  • the amount of source material that is filled into the crucible can be controlled by opening or closing the shutter or valve 118.
  • the shutter can be opened and closed in intervals for a predetermined time for re-filling a predetermined amount of source material into the crucible.
  • feeding rate as used herein may be understood as relating to the amount of source material per time unit that is fed from the material reservoir into the crucible through the material feeding passage.
  • the feeding rate may be dependent on the opening state of the shutter or valve 118.
  • the material feeding passage 115 can be opened partially by the shutter or valve 118 for controlling the feeding rate.
  • an opening width of the material feeding passage 115 can be adjusted by the shutter or valve 118.
  • Partially opening the material feeding passage may adjust the feeding rate of source material into the crucible.
  • the amount of source material inside the crucible can be kept essentially constant by providing an essentially constant feeding rate, or the amount of source material inside the crucible can be varied as may be appropriate for a specific deposition process.
  • the amount of source material inside the crucible can be adjusted by adjusting the feeding rate of the source material.
  • An efficient evaporation process can be provided, and the risk of material degradation inside the crucible can be reduced.
  • a defined amount of source material can be filled into the crucible for ensuring a high evaporation rate while reducing material degradation.
  • the source material can be stored at suitable conditions, e.g. at a suitable storing temperature. Thus, source material can be saved and costs can be reduced.
  • the material feeding passage can be closed when pausing or stopping the evaporation process, such that a loss of source material by evaporation and/or decomposition during idle times of the deposition systems can be reduced.
  • the evaporation process is more flexible and adaptable to different process approaches, since the evaporation rate can simply be adjusted by adjusting the feeding rate.
  • FIG. 3 shows a schematic side view of an evaporation source 300 according to embodiments described herein.
  • the evaporation source 300 may include any of the features of the evaporation source 100 of figures 1 and 2, such that reference can be made to the above explanations, which are not repeated here.
  • the evaporation source 300 includes a crucible 320 for evaporating a source material and a vapor conduit 328 for guiding the evaporated source material from the crucible into a distribution pipe 330.
  • the distribution pipe 330 may have one or more vapor outlets or nozzles 332 for directing the evaporated source material toward a substrate.
  • the evaporation source 300 further includes a material reservoir 310 for storing the source material, wherein the material reservoir 310 is arranged at least partially above the crucible 320.
  • a material feeding passage 315 extends from the material reservoir 310 to the crucible 320 for gravitationally feeding the source material from the material reservoir 310 into the crucible 320.
  • the material reservoir 310 may optionally have the shape of a cone or funnel with a lower end that is connected to the material feeding passage 315.
  • the material reservoir 310 of the evaporation source 300 extends around the vapor conduit 328.
  • the material reservoir 310 may have the shape of a funnel that extends around the vapor conduit 328. A uniform feeding of source material into the crucible can be ensured.
  • the vapor conduit 328 may extend through a center area of the funnel-shaped material reservoir in an upward direction for guiding the evaporated source material out of the crucible, e.g. into the distribution pipe 330 (see dashed arrows in FIG. 3).
  • the material reservoir 310 may be arranged such that the source material that is stored in the material reservoir 310 can be gravitationally fed through the material feeding passage 315 into an inner volume of the crucible 320.
  • a heating unit 322 for heating the inner volume of the crucible to a temperature at or above the evaporation temperature may be provided.
  • the material reservoir 310 may extend in a downward direction towards the material feeding passage 315.
  • the material feeding passage 315 may connect the material reservoir 310 with the crucible 320.
  • a shutter or valve 318 may be provided for opening and/or closing the material feeding passage 315. Evaporated source material can flow from the crucible 320 via the vapor conduit 328, e.g., towards the distribution pipe 330, as is described with respect to FIG.1.
  • the evaporation source 300 may include a shutter or valve 318 for opening and/or closing the material feeding passage 315.
  • the shutter or valve 318 may include an iris valve.
  • the iris valve or iris diaphragm valve may include an actuator for opening and/or closing the material feeding passage.
  • the actuator may be driven mechanically, electrically, pneumatically, hydraulically, manually or by any combination thereof.
  • the material feeding passage 315 may be annularly shaped.
  • the material feeding passage 315 may be a ring slit extending from the material reservoir to the crucible, particularly between an outer wall of the vapor conduit 328 and an inner reservoir wall that surrounds the vapor conduit 328.
  • the annularly shaped material feeding passage may surround the vapor conduit 328.
  • the material feeding passage may be a ring slit surrounding the vapor conduit 328 and connecting the lower end of the material reservoir with the crucible, the crucible being provided as a heatable receptacle below the vapor conduit.
  • the iris valve may be configured to adjust a gap width of the annularly shaped material feeding passage.
  • the iris valve may be arranged such that, in a closed state, the iris valve surrounds the vapor conduit and closes the annularly shaped material feeding passage. In the closed state, the material feeding passage may be completely blocked by a diaphragm of the iris valve. Thus, the material flow through the material feeding passage towards the crucible can be prevented. In an open state, the diaphragm of the iris valve may unblock the material feeding passage, such that the source material can gravitationally move through the material feeding passage at a feeding rate depending on a gap with of the annularly shaped material feeding passage.
  • the diaphragm of the iris valve may include a plurality of blades, e.g. five, seven, nine or more blades, as is depicted in more detail in figures 4A and 4B.
  • the blades may be shaped such that an essentially round and radially adjustable valve opening can be provided.
  • the iris valve can be opened partially for adjusting a gap width of the material feeding passage.
  • the material feeding passage may be a ring slit with a radial dimension that can be adjusted by the iris valve, particularly by synchronously moving a plurality of blades of the iris valve.
  • the opening state of the iris valve may define the feeding rate of the source material through the material feeding passage.
  • FIGS. 4 A and 4B show schematic views of the valve of the evaporation source 300 of FIG. 3, the valve being configured as an iris valve 418.
  • FIG. 4A shows a view of the iris valve 418 in an open state.
  • FIG. 4B shows a view of the iris valve 418 in a closed state.
  • FIG. 4A shows the iris valve 418 in an open state in which the material feeding passage 315 is open.
  • a diaphragm of the iris valve 419 that includes a plurality of blades 442 is in a retracted state, such that the iris valve provides a large-diameter opening (see dashed arrow in FIG. 4A).
  • FIG. 4B shows the iris valve 418 in a closed state in which the material feeding passage 315 is closed, such that no source material can move through the material feeding passage 315.
  • the plurality of blades of the diaphragm has moved radially inward, such that the iris valve provides a small-diameter opening (see dashed arrow in FIG.
  • an iris valve allows for an easy and quick switching between an open state and a closed state. Further, an iris valve allows for a quick and accurate adjustment of an opening width of the material feeding passage.
  • an evaporation source including a crucible and a material reservoir.
  • the evaporation source includes an iris valve 418 for opening and closing a material feeding passage 315 that extends between the material reservoir and the crucible. Opening and closing the material feeding passage with an iris valve is beneficial because an iris valve allows for an easy and accurate adjustment of an opening width and for a quick switching between an open state and a closed state.
  • a vapor conduit 328 may extend through a center of the iris valve 418, the vapor conduit 328 being configured for guiding evaporated source material out of the crucible.
  • the material feeding passage 315 may be annularly shaped or may have the shape of a ring slit surrounding the vapor conduit 328 that extends through a center of the iris valve.
  • the radial dimension of the annularly shaped material feeding passage (designated as“R” in FIG. 4A) can be adjusted by the iris valve, particularly by synchronously moving a plurality of blades 442 of the iris valve.
  • the vapor conduit 328 may extend through the center of the iris valve 428, e.g. in an essentially vertical direction. Accordingly, evaporated source material can be extracted from the crucible 320 through an inner area 429 of the vapor conduit 328 extending through the material reservoir for being deposited on the substrate.
  • the plurality of blades 442 of the iris valve is retracted such as to unblock the annularly shaped material feeding passage 315.
  • the plurality of blades 442 of the iris valve 428 are pushed toward a center of the iris valve, i.e. toward the vapor conduit 328, such that the annularly shaped material feeding passage 315 is blocked.
  • Intermediate states between the open state of FIG. 4A and the closed state of FIG. 4B are possible for an adjustment of the feeding rate.
  • a material tracking is adjustable with the valve.
  • the amount of source material fed through the material feeding passage and/or the amount of source material that is currently located inside the crucible can be monitored, and the opening state of the iris valve 428 can be adjusted accordingly.
  • the material feeding passage can be partially or entirely opened for a predetermined period, in order to refill source material into the crucible.
  • the evaporation rate can be adjusted via a feeding rate adjustment through the iris valve.
  • an opening state of the iris valve can be continuously adjusted in order to adjust the evaporation rate.
  • FIG. 5 shows a deposition system 500 for depositing an evaporated source material on a substrate according to embodiments described herein.
  • the deposition system 500 includes a deposition chamber 570, particularly a vacuum deposition chamber.
  • the deposition system 500 includes a deposition assembly 200 including an evaporation source 100, 300 according to any of the embodiments described herein and a drive unit 564 for moving the evaporation source in the deposition chamber.
  • the deposition assembly 200 may include more than one evaporation sources according to any of the embodiments described herein, e.g. two or three evaporation sources.
  • Embodiments described herein particularly relate to the deposition of organic materials, e.g. for OLED display manufacturing on large area substrates.
  • large area substrates or carriers supporting one or more substrates may have a size of 0.5 m 2 or more, particularly 1 m 2 or more.
  • the deposition apparatus may be adapted for processing large area substrates, such as substrates of GEN 5, which corresponds to about 1.4 m 2 substrates (1.1 m x 1.3 m), GEN 7.5, which corresponds to about 4.29 m 2 substrates (1.95 m x 2.2 m), GEN 8.5, which corresponds to about 5.7 m 2 substrates (2.2 m x 2.5 m), or even GEN 10, which corresponds to about 8.7 m 2 substrates (2.85 m x 3.05 m). Even larger generations such as GEN 11 and GEN 12 and corresponding substrate areas can similarly be implemented.
  • substrates of GEN 5 which corresponds to about 1.4 m 2 substrates (1.1 m x 1.3 m)
  • GEN 7.5 which corresponds to about 4.29 m 2 substrates (1.95 m x 2.2 m)
  • GEN 8.5 which corresponds to about 5.7 m 2 substrates (2.2 m x 2.5 m)
  • GEN 10 which corresponds to about 8.7
  • half sizes of the above mentioned substrate generations can be coated by evaporation of an apparatus for evaporating material.
  • the half sizes of the substrate generation may result from some processes running on a full substrate size, and subsequent processes running on half of a substrate previously processed.
  • the substrate thickness can be from 0.1 mm to 1.8 mm, and a holding arrangement for the substrate can be adapted for such substrate thicknesses.
  • the substrate thickness can be about 0.9 mm or below, such as 0.5 mm or 0.3 mm, and the holding arrangements are adapted for such substrate thicknesses.
  • the substrate may be made of a material suitable for material deposition.
  • the substrate may be made of a material selected from the group consisting of glass (for instance soda-lime glass, borosilicate glass etc.), metal, polymer, ceramic, compound materials, carbon fiber materials or any other material or combination of materials which can be coated by a deposition process.
  • the substrate may be a semiconductor wafer in some embodiments.
  • the evaporated source material is deposited in a predetermined pattern on the substrate, e.g. by using a mask such as a fine metal mask (FMM) having a plurality of openings. A plurality of pixels may be deposited on the substrate.
  • FMM fine metal mask
  • Other examples of evaporated source materials include one or more of the following: ITO, NPD, Alq3, Quinacridone, and metals such as silver or magnesium.
  • the deposition chamber may be a vacuum deposition chamber.
  • a“vacuum deposition chamber” can be understood as a chamber configured for vacuum deposition.
  • the term“vacuum”, as used herein, can be understood in the sense of a technical vacuum having a vacuum pressure of less than, for example, 10 mbar.
  • the pressure in a vacuum chamber as described herein may be between 10 5 mbar and about 10 8 mbar, more typically between 10 5 mbar and 10 7 mbar, and even more typically between about 10 6 mbar and about 10 7 mbar.
  • the drive unit 564 may be configured for a translational movement of the deposition assembly 200, e.g. past the substrate 10.
  • the deposition chamber 570 may have gate valves 565 via which the vacuum deposition chamber can be connected to an adjacent routing module or an adjacent service module.
  • the routing module is configured to transport a substrate to a further vacuum deposition chamber for further processing
  • the service module is configured for maintenance of the deposition source.
  • the gate valves allow for a vacuum seal to an adjacent vacuum chamber, e.g. of the adjacent routing module or the adjacent service module, and can be opened and closed for moving a substrate and/or a mask into or out of the vacuum deposition chamber.
  • a substrate may be processed in the deposition chamber.
  • two substrates e.g. a first substrate and a second substrate, can be supported on respective transportation tracks within the deposition chamber 570.
  • two tracks for providing masks 563 thereon can be provided.
  • the tracks for transportation of a substrate carrier and/or a mask carrier may be provided with a further transportation apparatus for contactless transportation of the carriers.
  • depositing the material on the substrates may include masking the substrates by respective masks, e.g. by an edge exclusion mask or by a shadow mask.
  • the masks e.g. a first mask corresponding to a first substrate and a second mask corresponding to a second substrate, are provided in a mask frame to hold the respective mask in a predetermined position.
  • the drive unit 564 may define a direction of the translational movement of the deposition assembly 200.
  • a mask 563 e.g. a first mask for masking the first substrate and second mask for masking the second substrate.
  • the masks can extend essentially parallel to the direction of the translational movement of the deposition assembly 200.
  • the substrates at the opposing sides of the deposition source can also extend essentially parallel to the direction of the translational movement.
  • the evaporated source material provided by the evaporation source 100 can be directed by one or more outlets of the distribution pipe toward the substrate 10. Accordingly, as described herein, the distribution pipe is configured for providing evaporated material, particularly plumes of evaporated organic material, from the distribution pipe to the substrate 10.
  • FIG. 6 shows a flow diagram of a method according to embodiments described herein.
  • the evaporation method 600 includes, in box 610, gravitationally feeding a source material from a material reservoir into a crucible along a downwardly extending material feeding passage.
  • the source material may be fed from the material reservoir into the crucible (purely) by gravitational forces in some embodiments, i.e. without an active feeding device. In other embodiments, an active feeding device may be additionally provided.
  • the source material may pass through the material feeding passage.
  • the material feeding passage may include a shutter or valve for opening and/or closing the material feeding passage, such that a movement of the source material towards the crucible can be allowed and/or blocked.
  • the source material may be stored in the material reservoir.
  • the evaporation method further includes, in box 620, evaporating the source material in the crucible.
  • the source material may be heated inside the crucible to a temperature at or above the evaporation temperature of the source material. In other words, the source material may be heated until the source material may change an aggregate state from a solid or liquid state to a gaseous state.
  • the evaporated source material may be led out of the crucible. For example, the evaporated source material may be led through a vapor conduit into a distribution pipe for being distributed toward a substrate. The vapor conduit and the distribution pipe may be heated.
  • the method may include adjusting a feeding rate of the source material by partially or completely opening or closing the material feeding passage.
  • the material feeding passage may be partially or completely closed with a shutter or valve, e.g. with an iris valve.
  • the feeding rate may be set according to the amount of material inside the crucible.
  • the feeding rate may be dependent on the intended evaporation rate.
  • the source material can be gravitationally fed in a continuous manner into the crucible.
  • the feeding rate may be set such that, over an extended period, the source material is transferred from the material reservoir into the crucible at a predetermined feeding rate.
  • the shutter or valve may be partially opened, and optionally, the opening state of the shutter or valve can be adjusted continuously or in intervals.
  • the material feeding passage may be opened and closed in intervals for transferring source material into the crucible.
  • the shutter or valve may be closed until a predetermined amount of source material inside the crucible has been evaporated, and the shutter of valve can then be (e.g., completely) opened for a predetermined time for refilling a predetermined amount of source material into the crucible. The shutter or valve may then be closed again.
  • the material feeding passage is partially or completely opened or closed via an iris valve.
  • the material feeding passage and/or the material reservoir is annularly shaped and extends around a vapor conduit.
  • An iris valve may be used for opening or closing the annularly shaped material feeding passage.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

Des modes de réalisation de la présente invention concernent une source d'évaporation (100) comprenant un creuset (120) pour l'évaporation d'un matériau source, un réservoir de matériau (110) disposé au moins partiellement plus haut que le creuset (120) pour stocker le matériau source, et un passage d'alimentation en matériau (115) s'étendant dans une direction vers le bas à partir du réservoir de matériau (110), en direction du creuset, pour introduire par gravité le matériau source dans le creuset.
PCT/EP2019/069590 2019-07-19 2019-07-19 Source d'évaporation, système de dépôt et procédé d'évaporation WO2021013327A1 (fr)

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PCT/EP2019/069590 WO2021013327A1 (fr) 2019-07-19 2019-07-19 Source d'évaporation, système de dépôt et procédé d'évaporation

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5195651A (en) * 1991-06-26 1993-03-23 The United States Of America As Represented By The United States Department Of Energy Ball feeder for replenishing evaporator feed
CN2848871Y (zh) * 2005-05-03 2006-12-20 杨林 生产彩虹膜或纸的高真空电镀设备
US20170346044A1 (en) * 2016-05-27 2017-11-30 Applied Materials, Inc. Evaporation source for organic material, deposition apparatus for depositing organic materials in a vacuum chamber having an evaporation source for organic material, and method for evaporating organic material
US20190185990A1 (en) * 2016-07-27 2019-06-20 Boe Technology Group Co., Ltd. Evaporator, evaporation coating apparatus and evaporation coating method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5195651A (en) * 1991-06-26 1993-03-23 The United States Of America As Represented By The United States Department Of Energy Ball feeder for replenishing evaporator feed
CN2848871Y (zh) * 2005-05-03 2006-12-20 杨林 生产彩虹膜或纸的高真空电镀设备
US20170346044A1 (en) * 2016-05-27 2017-11-30 Applied Materials, Inc. Evaporation source for organic material, deposition apparatus for depositing organic materials in a vacuum chamber having an evaporation source for organic material, and method for evaporating organic material
US20190185990A1 (en) * 2016-07-27 2019-06-20 Boe Technology Group Co., Ltd. Evaporator, evaporation coating apparatus and evaporation coating method

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