WO2021000131A1 - Hot press molded glass and processing method therefor - Google Patents

Abstract

Disclosed in the present application are a hot press molded glass and a processing method therefor. The hot press molded glass comprises a matrix and a diffractive microstructure formed in the matrix. The diffractive microstructure comprises a plurality of parallel spaced linear scores and slits between adjacent scores. The line width of the linear scores is larger than or equal to 150 nm, and the depth of the slits is 0.9-1.2 times of the line width. The processing method provided in the present application comprises: increasing the temperature to a mold pressing temperature, performing mold closing, pressurizing on a glass substrate and maintaining the temperature, cooling to a mold opening temperature, and opening the mold, so as to obtain a hot press molded glass. The hot press molded glass and the processing method of the present application accurately produce a designed size, reduce the requirements for equipment, and satisfy the requirements of practical industrial applications.

Description

Hot press forming glass and its processing method Technical field

The embodiments of the present application relate to diffractive micro-optical components, and in particular, to a hot press formed glass and a processing method thereof.

Background technique

At present, there are four main manufacturing methods for optical micro-nano structures used in diffractive micro-optical components, including maskless direct writing technology, traditional overprinting methods, gray-scale masking methods and nanoimprinting methods.

Maskless direct writing technology mainly includes laser direct writing, electron beam direct writing and ion beam direct writing. It is more suitable for making single-piece multi-phase or simple continuous contour devices, and the manufactured devices have higher diffraction efficiency. But its biggest problem is that it cannot accurately control the contour depth and the contour deformation of the etching pattern, and the required equipment is relatively expensive. Among them, electron beam direct writing with relatively high resolution also has problems in actual processing such as long exposure time, which increases the production cost and efficiency of the device, and the exposure of complex contour devices is difficult to accurately control due to the influence of the proximity effect.

The traditional engraving method has many processing links, long period, and difficult to control the alignment accuracy, which affects the further improvement of the production accuracy and diffraction efficiency of diffractive micro-optical components. However, if the current integrated chip manufacturing process is used for over-engraving, the manufacturing accuracy can reach below 50nm. However, this process equipment is very expensive and banned for sale in China, and the equipment technology is in a blocked state.

Therefore, it is necessary to provide a new method of manufacturing diffractive micro-optical components.

technical problem

In the related art, the optical micro-nano structure manufacturing method of diffractive micro-optical components has many processing links, long period, and difficult to control the alignment accuracy, which affects the further improvement of the manufacturing precision and diffraction efficiency of diffractive micro-optical components. It is necessary to provide a new Diffractive optical components and their processing methods.

Technical solutions

In order to achieve the above objective, the present application provides a hot-pressed glass comprising a matrix and a diffractive microstructure formed on the matrix. The diffractive microstructure includes a plurality of lines arranged in parallel and spaced apart and located adjacent to the carved glass. The slit between the traces, the line width of the line pattern is greater than or equal to 150 nm.

Preferably, the depth of the slit is 0.9-1.2 times the line width.

This application provides a method for processing hot press forming glass, including the following steps:

S1: Provide a first mold and a second mold arranged at a distance from the first mold, and heat the first mold and the second mold to a first temperature T1;

S2: providing a grating template and a glass sample, placing the glass sample on the grating template, and fixing the grating template to the first mold so that the glass sample faces the second mold;

S3: heating the first mold and the second mold to a molding temperature T2;

S4: After the temperature reaches the molding temperature T2, apply a first pressure N1 to the second mold to press the first mold at a stable pressing speed V1. Keep pressure under N2.

S5: Cool the second mold to the mold opening temperature T3, and after reaching the mold opening temperature T3, open the mold at a demolding speed V2, and the glass sample printed with the target structure will fall off the grating template and the second mold; where T2 =2T1.

Preferably, the molding temperature T2 in step S3 is 450-600°C.

Preferably, the first pressure N1 in step S4 is 5000-15000N.

Preferably, the pressing speed V1 in step S4 is 100 N/s to 500 N/s.

Preferably, the holding pressure N2 in step S4 is 3000-12000N.

Preferably, the pressure holding time in step S4 is 100 to 300 s.

Preferably, the cooling rate for cooling the second mold in step S5 is 10° C./s-50° C./s.

Preferably, the demolding temperature T3 in step S5 is 400-500°C.

Preferably, the demolding speed V2 in step S5 is 200N/s~500N/s.

Beneficial effect

Compared with the related art, the processing method of the hot press formed glass does not require subsequent etching treatment on the workpiece, and does not require exposure and development, so the design size can be accurately produced. In addition, the optical stability of glass is much higher than that of general transparent resin or photoresist. There is no concern about short service life under sunlight environment, and the relative refractive index of glass is higher among current transparent materials. This application can accurately produce the design size, reduce the requirements on the equipment, and meet the actual industrial application requirements.

Description of the drawings

In order to more clearly describe the technical solutions in the embodiments of the present application, the following will briefly introduce the drawings needed in the description of the embodiments. Obviously, the drawings in the following description are only some embodiments of the present application. For those of ordinary skill in the art, without creative work, other drawings can be obtained based on these drawings, among which:

Figure 1 is a schematic side view of a hot press forming glass processing equipment according to this application;

Figure 2 is a partial structure diagram of the electroforming sub-template of the present application;

3 is a schematic diagram of a processing structure for processing the glass substrate;

Fig. 4 is a flow chart of the processing method of hot press forming glass according to this application;

Figure 5 is an electron micrograph of the hot-press-formed glass in this application.

The best mode of the invention

The technical solutions in the embodiments of the present application will be described clearly and completely in conjunction with the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in this application, all other embodiments obtained by those of ordinary skill in the art without creative work fall within the protection scope of this application.

Please refer to FIG. 1. FIG. 1 is a schematic side view of a hot press forming glass processing equipment 10 of this application. The processing equipment 10 includes a first machine table 11, a second machine table 13, a first mold 15, a second mold 17 and an electroforming sub-template 19. The first machine 11 and the second machine 13 are relatively spaced apart, and the first machine 11 and the second machine 13 are relatively movable to adjust the distance between them. The first mold 15 is fixed on the side surface of the first machine table 11 adjacent to the second machine table 13, and the second mold 17 is fixed on the second machine table 13 adjacent to the first machine table 11 side surface, the first mold 15 and the second mold 17 are relatively spaced apart. The electroforming sub-template 19 is superimposed on the side surface of the second mold 17 away from the second machine table 13 and is spaced apart from the first mold 15.

Please refer to FIG. 2, which is a structural diagram of the electroforming sub-template 19 of the present application. The electroforming sub-template 19 is copied on the surface of the substrate through an electroforming process to form a precise, fine, complex and special shape mold that is difficult to be processed by other methods. The electroforming sub-template 19 includes an electroforming base 191, columnar protrusions 193 and columnar grooves 195. The columnar protrusions 193 and the columnar grooves 195 are formed on one side surface of the electroforming base 191, and the columnar protrusions 193 and the columnar grooves 195 are evenly spaced.

Please refer to FIGS. 3 and 4 in combination. FIG. 3 is a schematic diagram of a processing structure for processing the glass substrate 20, and FIG. 4 is a flowchart of a processing method for hot press forming glass according to this application. In this embodiment, the electroforming sub-template 19 is a grating template 19, and the processing method specifically includes:

S1: Provide a first mold 15 and a second mold 17 spaced apart from the first mold 15, and heat the first mold 15 and the second mold 17 to a first temperature T1.

S2: Provide a grating template 19 and a glass sample 20, place the glass sample 20 on the grating template 19, and fix the grating template 19 on the first mold 15 so that the glass sample 20 faces the first mold. Two mold 17.

S3: The first mold 15 and the second mold 17 are heated to a molding temperature T2. Among them, the molding temperature T2 is 450-600°C, preferably the glass transition temperature Tg.

S4: After the temperature reaches the molding temperature T2, apply a first pressure N1 to the second mold 17 to press the first mold 15 at a stable pressing speed V1, and after the first mold is pressed Keep the pressure at the packing pressure N2. Among them, the first pressure N1 is 5000~15000N, preferably 12000N; the pressing speed V1 is 100N/s~500N/s, preferably 300N/s; the holding pressure N2 is 3000~12000N, preferably 10000N; the holding time It is 100~300s, preferably 240s.

S5: Cool the second mold 17 to the mold opening temperature T3. After reaching the mold opening temperature T3, the mold is opened at the demolding speed V2, and the glass sample 20 printed with the target structure will be removed from the grating template 19 and the second mold 17 Falling off; where T2=2T1. Specifically, the cooling rate for cooling the second mold 17 is 10°C/s-50°C/s, preferably 30°C/s; the demolding temperature T3 is 400-500°C, preferably the transition temperature Tg of the glass sample; The demolding speed V2 is 200N/s to 500N/s, preferably 300N/s.

Wherein, in step S2, the grating template 19 is obtained by nanoimprinting a master template by electroplating. The master template is obtained by electron beam direct writing or laser direct writing.

Please refer to FIG. 5. FIG. 5 is an electron microscope picture of the hot-pressed glass 50 provided by this application. The hot pressing glass 50 includes a base 51 and a diffractive microstructure 53 formed on the base. The hot pressed glass 50 is formed by hot pressing using an electroforming replica template 19. The diffractive microstructure 53 includes a plurality of lines 531 arranged at intervals in parallel and slits 533 located between adjacent notches. As shown in the picture, the width between adjacent slits 533 is 147 nm and 148 nm, the spacing between adjacent lines 531 is 101 nm, and the adjacent line and slit are 351 nm. The line width of the line pattern 531 is greater than or equal to 150 nm, and the depth of the slit is 0.9-1.2 times the line width.

Compared with the related art, the processing method of the hot press formed glass 50 does not require subsequent etching treatment on the workpiece, and does not require exposure and development, so the design size can be accurately produced. In addition, the optical stability of glass is much higher than that of general transparent resin or photoresist. There is no concern about the short service life under sunlight environment, and the relative refractive index of glass is higher among current transparent materials. The present application can accurately produce the hot press-formed glass 50 of the designed size, which reduces the requirements on equipment and meets actual industrial application requirements.

The above are only the implementation manners of this application. It should be pointed out here that for those of ordinary skill in the art, improvements can be made without departing from the creative concept of this application, but these all belong to this application. The scope of protection.

Embodiments of the invention

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Industrial applicability

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Sequence Listing Free Content

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Claims (10)

1. A hot press forming glass, comprising a base and a diffractive microstructure formed on the base, wherein the diffractive microstructure includes a plurality of lines arranged in parallel and spaced apart and a narrow gap between the adjacent scores. Seam, the line width of the line pattern is greater than or equal to 150 nm.
2. The hot press forming glass according to claim 1, wherein the depth of the slit is 0.9-1.2 times the line width.
3. A method for processing hot-pressed glass, which is characterized in that it comprises the following steps:

   S1: Provide a first mold and a second mold arranged at a distance from the first mold, and heat the first mold and the second mold to a first temperature T1;

   S2: providing a grating template and a glass sample, placing the glass sample on the grating template, and fixing the grating template to the first mold so that the glass sample faces the second mold;

   S3: heating the first mold and the second mold to a molding temperature T2;

   S4: After the temperature reaches the molding temperature T2, apply a first pressure N1 to the second mold to press the first mold at a stable pressing speed V1. Keep pressure under N2;

   S5: Cool the second mold to the mold opening temperature T3, and after reaching the mold opening temperature T3, open the mold at a demolding speed V2, and the glass sample printed with the target structure will fall off the grating template and the second mold;

   Where T2=2T1.
4. The method for processing hot press formed glass according to claim 3, wherein the molding temperature T2 in step S3 is 450-600°C.
5. 4. The method for processing hot press formed glass according to claim 3, characterized in that the first pressure N1 in step S4 is 5000-15000N.
6. The method for processing hot press formed glass according to claim 3, wherein the pressing speed V1 in step S4 is 100 N/s to 500 N/s.
7. The method for processing hot press formed glass according to claim 3, wherein the holding pressure N2 in step S4 is 3000-12000N.
8. The method for processing hot press formed glass according to claim 3, wherein the holding time in step S4 is 100-300 s.
9. The method for processing hot press formed glass according to claim 3, wherein the cooling rate for cooling the second mold in step S5 is 10° C./s-50° C./s.
10. The method for processing hot press formed glass according to claim 3, wherein the demolding temperature T3 in step S5 is 400-500°C.

    [Claim 11] The method for processing hot press formed glass according to claim 3, characterized in that the demolding speed V2 in step S5 is 200N/s~500N/s.