WO2020220931A1 - Nano-geometric standard template for calibration and preparation method therefor - Google Patents

Nano-geometric standard template for calibration and preparation method therefor Download PDF

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WO2020220931A1
WO2020220931A1 PCT/CN2020/083221 CN2020083221W WO2020220931A1 WO 2020220931 A1 WO2020220931 A1 WO 2020220931A1 CN 2020083221 W CN2020083221 W CN 2020083221W WO 2020220931 A1 WO2020220931 A1 WO 2020220931A1
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nano
geometric
substrate
electron beam
standard template
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PCT/CN2020/083221
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French (fr)
Chinese (zh)
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王琛英
蒋庄德
林启敬
李磊
刘明
张易军
韩枫
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西安交通大学
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B1/00—Nanostructures formed by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • B82B1/001—Devices without movable or flexible elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • B82B3/0009—Forming specific nanostructures
    • B82B3/0014—Array or network of similar nanostructural elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • B82B3/0085—Testing nanostructures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • B82B3/009—Characterizing nanostructures, i.e. measuring and identifying electrical or mechanical constants
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Definitions

  • the invention belongs to the preparation field of line width and grid standard templates in the field of nanometer testing, and specifically relates to a nano geometric quantity standard template for calibration and a preparation method thereof.
  • the performance of nanodevices is increasingly affected by geometric dimensions. This feature puts forward higher requirements on the characteristics and measurement accuracy of measurement and operation tools in nanotechnology. It is necessary to develop various nanometer prototypes and carry out value traceability and comparison in order to calibrate the nanometer measuring instrument and complete the various nanometer devices. Accurate testing and characterization of geometric parameters can realize the controllable preparation of nano devices and improve the performance of nano devices.
  • the nanometer standard template is an important transfer medium to realize the transfer of nanometer size from the standard device of the national metrology standard department to the actual production and manufacturing.
  • the size of the nano geometric structure on the existing nano standard template is affected by the preparation process and is not accurate enough, which affects the calibration ability of the nano standard template.
  • the present invention provides a calibration nano-geometric standard template and a preparation method thereof.
  • the present invention can realize a nano-geometric structure by controlling the film thickness of the calibration nano-geometric standard template.
  • the length, line width and duty cycle of the modulation are adjusted to obtain a calibration standard template for nano-geometry that meets the requirements of use.
  • the present invention adopts the following technical solutions:
  • a nano-geometric standard template for calibration comprising a substrate, a first thin film and a nano-geometric structure on the substrate.
  • the first thin film is arranged on the surface of the nano-geometric structure.
  • the thickness of the first thin film can be adjusted to the nano-geometric structure.
  • the length, line width and duty cycle are modulated.
  • the nano geometry structure is a nano wire width structure or a nano grid structure.
  • the nano-geometric structure is a structure formed on the surface of the substrate, or a structure formed from the surface of the substrate into the substrate.
  • the first film is an Al 2 O 3 film.
  • Single crystal silicon wafer is used as the substrate.
  • a preparation method of a nano-geometric standard template for calibration includes the following steps:
  • S1 includes the following steps:
  • the electron beam directly writes the corresponding figure of the nano-geometric structure on the electron beam glue layer;
  • S1 includes the following steps:
  • the electron beam directly writes the corresponding figure of the nano-geometric structure on the electron beam glue layer;
  • the second film is grown on the surface of the substrate by electron beam evaporation.
  • the second film is an Au film.
  • an atomic layer deposition method is used to deposit a thin film on the surface of the nano-geometric structure and the substrate at the nano-geometric structure.
  • the substrate has a nano-geometric structure
  • the first thin film is arranged on the surface of the nano-geometric structure.
  • the length and The line width and duty cycle are modulated. Since the thickness of the first film is more controllable than the nano-geometric structure, and the size is more accurate, the nano-geometric standard template for calibration of the present invention passes through the nano-geometric structure.
  • the first thin film is arranged on the surface of the nanometer, which can compensate for the defects of large size deviation and insufficient precision of the nanometer geometric structure when preparing the nanometer geometric structure on the nanometer standard template in the existing preparation process. Since the size of the nano-geometric standard template for calibration of the present invention is precisely controllable, it has good calibration capabilities.
  • the preparation method of the nano-geometric standard template for calibration of the present invention first prepares a nano-geometric structure on a substrate, and then deposits a first thin film with a controllable thickness on the surface of the nano-geometric structure to realize the length and line of the nano-geometric structure.
  • the width and the adjustable duty cycle ensure that the nano-geometry standard template with the nano-geometry structure accurately and controllable is obtained.
  • the invention does not require complicated processing of samples, and therefore has important potential applications in the field of nano grid standard templates, such as integrated circuit manufacturing and testing.
  • FIG. 1 is a flow chart of preparing a nano one-dimensional grid standard template in an embodiment of the present invention
  • FIG. 2 is a flow chart of preparing a standard model of nano two-dimensional grid by coating and stripping processes in an embodiment of the present invention
  • FIG. 3 is an SEM image of the nano two-dimensional grid prepared in the embodiment shown in FIG. 2 of the present invention.
  • the nano-geometric standard template for calibration of the present invention includes a substrate 1, a first thin film 5, and a nano-geometric structure 4 on the substrate 1.
  • the first thin film 5 is disposed on the surface of the nano-geometric structure 4 .
  • the nano geometric quantity includes the geometric quantities of step height, length, pitch and line width
  • the nano geometric quantity structure 4 is a nano line width structure or a nano grid structure.
  • the material of the first thin film 5 is any material suitable for ALD technology and can achieve a uniform and controllable layer thickness.
  • the first thin film 5 is an Al 2 O 3 thin film.
  • the substrate 1 adopts an ultra-flat wafer, and the substrate 1 needs to have a flat surface and be etchable, or the substrate 1 can be a substrate capable of electron beam evaporation of the second film. In the embodiment of the present invention, a single crystal silicon wafer is used.
  • the nano-geometric structure 4 is a structure formed on the surface of the substrate 1, as shown in FIG. 1, after the image is developed, a second film 3 is grown on the developed surface, and the electron beam glue is removed by a stripping process , Obtain the nano geometric structure 4, the nano geometric structure 4 obtained by this process is on the surface of the substrate 1, that is, the nano geometric structure 4 is a structure formed on the surface of the substrate 1;
  • the nano geometric structure 4 is a structure formed from the surface of the substrate 1 into the substrate 1, as shown in FIG. 1, after the image is developed, an etching process is used to form an electron beam glue layer on the developed surface. 2 is the masking layer to etch the substrate 1. After the etching is completed, the residual electron beam glue is removed to obtain the nano geometric structure 4, the nano geometric structure 4 obtained by this process is a part of the original substrate 1.
  • the nano geometric structure 4 is the protruding part on the surface of the substrate 1 after etching, that is, the nano geometric structure 4 is a structure formed from the surface of the substrate 1 into the substrate 1.
  • the preparation of the nano-geometric standard template for calibration of the present invention can be carried out by the following method, and the preparation process includes the following steps:
  • S1 is realized through the following process. Specifically, S1 includes the following steps:
  • the electron beam direct write nano geometric structure 4 (in the embodiment shown in FIG. 1, the nano geometric structure 4 is a one-dimensional nanowire width structure) corresponding to the pattern on the electron beam glue layer 2;
  • the remaining electron beam glue is removed to obtain the nano-geometric structure 4, which is the remaining protrusion on the surface of the substrate 1 after the etching.
  • S1 in the method for preparing the nano geometric quantity standard template for calibration of the present invention, can also be realized by the following process. Specifically, S1 includes the following steps:
  • the electron beam direct write nano geometric structure 4 on the electron beam glue layer 2 (in the embodiment shown in Figure 1, the nano geometric structure 4 is a one-dimensional nanowire width structure; as shown in Figure 2 In the embodiment, the nano geometric quantity structure 4 is a figure corresponding to a two-dimensional nano grid structure;
  • the second film 3 is deposited by electron beam on the developed surface.
  • the second film 3 is grown on the surface of the substrate 1 and the top surface of the electron beam glue layer 2 (such as The process route on the left side of Fig. 1 and the process route of Fig. 2), the second film 3 is an Au film vapor deposited by electron beam, and the use of Au film can ensure that the nano-geometric structure of the nano-geometric standard template for calibration of the present invention has a good Stability, so that the nano geometric quantity standard template for calibration of the present invention can meet the use under the atmosphere and special requirements;
  • the nano geometric structure 4 is a structure formed on the surface of the substrate 1 by an Au thin film.
  • atomic layer deposition is used to expose the substrate 1 at the nano geometric structure 4 and the nano geometric structure 4 A thin film is deposited on the surface.
  • the Al 2 O 3 thin film is grown on the surface of the nano one-dimensional or two-dimensional grid using the atomic layer deposition method (ALD).
  • ALD atomic layer deposition method
  • a high-precision, stable performance nanometer one-dimensional or two-dimensional grid standard template can be prepared on the surface of the substrate.
  • the periodicity and adjusting the duty cycle By controlling the periodicity and adjusting the duty cycle, the precise control of nano one-dimensional or two-dimensional grids is realized, which is a supplement to the existing nano one-dimensional or two-dimensional grid standard model and promotes the rapid development of related disciplines and industries.
  • Fig. 3 it is the nano-geometric standard template for calibration prepared in the embodiment shown in Fig. 2 of the present invention. It can be seen from the figure that the horizontal line width A of the grid structure is 85 nanometers, and the vertical line width B is 76 nanometers, the line width is uniform, the structure is neat, and the periodicity is good.
  • the nano standard template prepared by the method of the invention is suitable for the calibration and traceability of micro and nano measuring instruments such as atomic force microscopes, white light interference microscopes and scanning probe microscopes.
  • the invention can realize the rapid and accurate adjustment of the characteristic size of the nano geometric quantity template, and has important potential applications in the field of standard template preparation.

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  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
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Abstract

A nano-geometric standard template for calibration, comprising a substrate (1), a first thin film (5) and a nano-geometric structure (4) on the substrate (1), the first thin film (5) being provided on a surface of the nano-geometric structure (4). Also provided is a preparation method for a nano-geometric standard template for calibration, comprising: first preparing a nano-geometric structure (4) on a substrate (1); then depositing a first thin film (5) on a surface of the nano-geometric structure (4), and modulating the length, the line width and the duty ratio of the nano-geometric structure (4) by means of controlling the thickness of the first thin film (5) so as to obtain a nano-geometric standard template for calibration. The nano-geometric standard template is applicable to the calibration and tracing of micro-nano measurement instruments such as an atomic force microscope, a white light interference microscope and a scanning probe microscope, and the feature size of the nano-geometric standard template can be rapidly and precisely adjusted.

Description

一种校准用纳米几何量标准样板及其制备方法Nano geometric quantity standard template for calibration and preparation method thereof 技术领域Technical field
本发明属于纳米测试领域中线宽和栅格标准样板的制备领域，具体涉及一种校准用纳米几何量标准样板及其制备方法。The invention belongs to the preparation field of line width and grid standard templates in the field of nanometer testing, and specifically relates to a nano geometric quantity standard template for calibration and a preparation method thereof.
背景技术Background technique
随着纳米技术的快速发展，纳米器件性能受几何尺寸的影响越来越显著。这个特点对纳米科技中测量和操作工具的特性和测量准确度提出了更高的要求，需要研制各种纳米样板并进行量值溯源和比对，以便对纳米测量仪器进行校准，完成纳米器件各几何量参数的精确测试表征，实现纳米器件的可控制备和提高纳米器件的性能。作为纳米几何量的物质载体，纳米标准样板是实现纳米尺寸从国家计量标准部门的标准器件传递到实际生产、制造中的重要传递介质。但是现有的纳米标准样板上的纳米几何量结构的尺寸受制备工艺影响而不够精确，影响了纳米标准样板的校准能力。With the rapid development of nanotechnology, the performance of nanodevices is increasingly affected by geometric dimensions. This feature puts forward higher requirements on the characteristics and measurement accuracy of measurement and operation tools in nanotechnology. It is necessary to develop various nanometer prototypes and carry out value traceability and comparison in order to calibrate the nanometer measuring instrument and complete the various nanometer devices. Accurate testing and characterization of geometric parameters can realize the controllable preparation of nano devices and improve the performance of nano devices. As a material carrier of nanometer geometry, the nanometer standard template is an important transfer medium to realize the transfer of nanometer size from the standard device of the national metrology standard department to the actual production and manufacturing. However, the size of the nano geometric structure on the existing nano standard template is affected by the preparation process and is not accurate enough, which affects the calibration ability of the nano standard template.
发明内容Summary of the invention
为解决现有技术中存在的问题，本发明提供了一种校准用纳米几何量标准样板及其制备方法，本发明能够通过控制该校准用纳米几何量标准样板的薄膜厚度来实现纳米几何量结构的长度、线宽以及占空比的调制，获得符合使用要求的校准用纳米几何量标准样板。In order to solve the problems in the prior art, the present invention provides a calibration nano-geometric standard template and a preparation method thereof. The present invention can realize a nano-geometric structure by controlling the film thickness of the calibration nano-geometric standard template. The length, line width and duty cycle of the modulation are adjusted to obtain a calibration standard template for nano-geometry that meets the requirements of use.
为达到上述目的，本发明采用了以下技术方案：To achieve the above objective, the present invention adopts the following technical solutions:
一种校准用纳米几何量标准样板，包括基底、第一薄膜和基底上的纳米几何量结构，第一薄膜设置于纳米几何量结构的表面，通过调整第一薄膜的厚度能够对纳米几何量结构的长度、线宽以及占空比进行调制。A nano-geometric standard template for calibration, comprising a substrate, a first thin film and a nano-geometric structure on the substrate. The first thin film is arranged on the surface of the nano-geometric structure. The thickness of the first thin film can be adjusted to the nano-geometric structure. The length, line width and duty cycle are modulated.
所述纳米几何量结构为纳米线宽结构或者纳米栅格结构。The nano geometry structure is a nano wire width structure or a nano grid structure.
所述纳米几何量结构为在基底表面之上形成的结构，或者为由基底表面向基底内形成的结构。The nano-geometric structure is a structure formed on the surface of the substrate, or a structure formed from the surface of the substrate into the substrate.
第一薄膜为Al 2O 3薄膜。 The first film is an Al 2 O 3 film.
基底采用单晶硅片。Single crystal silicon wafer is used as the substrate.
一种校准用纳米几何量标准样板的制备方法，包括如下步骤：A preparation method of a nano-geometric standard template for calibration includes the following steps:
S1，在基底上制备出纳米几何量结构；S1, prepare a nano geometric structure on the substrate;
S2，在纳米几何量结构的表面沉积预设厚度的第一薄膜，获得校准用纳米几何量标准样板。S2, depositing a first film with a predetermined thickness on the surface of the nano-geometric structure to obtain a nano-geometric standard template for calibration.
S1包括如下步骤：S1 includes the following steps:
S1.1，在基底上匀电子束胶，烘干形成电子束胶层；S1.1, homogenize the electron beam glue on the substrate and dry to form an electron beam glue layer;
S1.2，根据设计要求在电子束胶层上电子束直写纳米几何量结构对应的图形；S1.2, according to the design requirements, the electron beam directly writes the corresponding figure of the nano-geometric structure on the electron beam glue layer;
S1.3，通过显影将纳米几何量结构对应的图形转移到电子束胶层；S1.3, transfer the pattern corresponding to the nano-geometric structure to the electron beam glue layer by developing;
S1.4，在显影后的表面采用刻蚀工艺以电子束胶层为掩蔽层刻蚀基底；S1.4, using an etching process on the developed surface to etch the substrate with the electron beam glue layer as a masking layer;
S1.5，刻蚀完成后去除残余的电子束胶，得到纳米几何量结构。S1.5, after the etching is completed, the residual electron beam glue is removed to obtain a nano-geometric structure.
S1包括如下步骤：S1 includes the following steps:
S1.1，在基底上匀电子束胶，烘干形成电子束胶层；S1.1, homogenize the electron beam glue on the substrate and dry to form an electron beam glue layer;
S1.2，根据设计要求在电子束胶层上电子束直写纳米几何量结构对应的图形；S1.2, according to the design requirements, the electron beam directly writes the corresponding figure of the nano-geometric structure on the electron beam glue layer;
S1.3，通过显影将纳米几何量结构对应的图形转移到电子束胶层；S1.3, transfer the pattern corresponding to the nano-geometric structure to the electron beam glue layer by developing;
S1.4，在显影后基底的表面生长第二薄膜；S1.4, growing a second film on the surface of the substrate after development;
S1.5，采用剥离工艺去除电子束胶，得到纳米几何量结构。S1.5, using a stripping process to remove the electron beam glue to obtain a nano geometric structure.
S1.4中，采用电子束蒸镀在基底的表面生长第二薄膜。In S1.4, the second film is grown on the surface of the substrate by electron beam evaporation.
所述第二薄膜为Au薄膜。The second film is an Au film.
S2中，采用原子层沉积的方法在纳米几何量结构以及纳米几何量结构处的基底表面沉积 薄膜。In S2, an atomic layer deposition method is used to deposit a thin film on the surface of the nano-geometric structure and the substrate at the nano-geometric structure.
本发明具有如下有益效果：The present invention has the following beneficial effects:
本发明的校准用纳米几何量标准样板中，基底上具有纳米几何量结构，第一薄膜设置于纳米几何量结构的表面，通过控制第一薄膜的厚度就能够实现对纳米几何量结构的长度、线宽以及占空比进行调制，由于第一薄膜的厚度相比于纳米几何量结构的尺寸可控性高，尺寸更加精确，因此本发明的校准用纳米几何量标准样板通过在纳米几何量结构的表面设置第一薄膜，能够弥补现有制备工艺在制备纳米标准样板上的纳米几何量结构时，纳米几何量结构的尺寸偏差较大，不够精确的缺陷。由于本发明的校准用纳米几何量标准样板尺寸精确可控，因此具有良好的校准能力。In the nano-geometric standard template for calibration of the present invention, the substrate has a nano-geometric structure, and the first thin film is arranged on the surface of the nano-geometric structure. By controlling the thickness of the first thin film, the length and The line width and duty cycle are modulated. Since the thickness of the first film is more controllable than the nano-geometric structure, and the size is more accurate, the nano-geometric standard template for calibration of the present invention passes through the nano-geometric structure. The first thin film is arranged on the surface of the nanometer, which can compensate for the defects of large size deviation and insufficient precision of the nanometer geometric structure when preparing the nanometer geometric structure on the nanometer standard template in the existing preparation process. Since the size of the nano-geometric standard template for calibration of the present invention is precisely controllable, it has good calibration capabilities.
本发明校准用纳米几何量标准样板的制备方法首先在基底上制备出纳米几何量结构，然后在纳米几何量结构的表面沉积厚度可控的第一薄膜，实现了纳米几何量结构的长度、线宽以及占空比的可调，确保得到纳米几何量结构精确可控的纳米几何量标准样板。本发明无需对样品进行复杂的处理，因此在纳米栅格标准样板领域具有重要的潜在应用，如集成电路制造和检测。The preparation method of the nano-geometric standard template for calibration of the present invention first prepares a nano-geometric structure on a substrate, and then deposits a first thin film with a controllable thickness on the surface of the nano-geometric structure to realize the length and line of the nano-geometric structure. The width and the adjustable duty cycle ensure that the nano-geometry standard template with the nano-geometry structure accurately and controllable is obtained. The invention does not require complicated processing of samples, and therefore has important potential applications in the field of nano grid standard templates, such as integrated circuit manufacturing and testing.
附图说明Description of the drawings
图1为本发明实施例中纳米一维栅格标准样板制备流程图；FIG. 1 is a flow chart of preparing a nano one-dimensional grid standard template in an embodiment of the present invention;
图2为本发明实施例中利用镀膜与剥离工艺制备纳米二维栅格标准样板流程图；FIG. 2 is a flow chart of preparing a standard model of nano two-dimensional grid by coating and stripping processes in an embodiment of the present invention;
图3为本发明图2所示实施例制备得到的纳米二维栅格SEM图。FIG. 3 is an SEM image of the nano two-dimensional grid prepared in the embodiment shown in FIG. 2 of the present invention.
图中，1-基底，2-电子束胶层，3-第二薄膜，4-纳米几何量结构，5-第一薄膜。In the figure, 1-substrate, 2-electron beam glue layer, 3-second thin film, 4-nanometer geometric structure, 5-first thin film.
具体实施方式Detailed ways
下面结合附图和实施例对本发明作进一步说明。The present invention will be further described below with reference to the drawings and embodiments.
参照图1和图2，本发明的校准用纳米几何量标准样板，包括基底1、第一薄膜5和基底1上的纳米几何量结构4，第一薄膜5设置于纳米几何量结构4的表面。1 and 2, the nano-geometric standard template for calibration of the present invention includes a substrate 1, a first thin film 5, and a nano-geometric structure 4 on the substrate 1. The first thin film 5 is disposed on the surface of the nano-geometric structure 4 .
本发明中，纳米几何量包括台阶高度、长度、节距和线宽这些几何量，纳米几何量结构4为纳米线宽结构或者纳米栅格结构。第一薄膜5的材质为适用于用ALD技术，能够实现层厚均匀可控材料的均可，本发明实施例中第一薄膜5采用Al 2O 3薄膜。基底1采用超平片，基底1需要表面平整以及可刻蚀，或着基底1为可电子束蒸镀第二薄膜的基底即可，本发明实施例中采用单晶硅片。 In the present invention, the nano geometric quantity includes the geometric quantities of step height, length, pitch and line width, and the nano geometric quantity structure 4 is a nano line width structure or a nano grid structure. The material of the first thin film 5 is any material suitable for ALD technology and can achieve a uniform and controllable layer thickness. In the embodiment of the present invention, the first thin film 5 is an Al 2 O 3 thin film. The substrate 1 adopts an ultra-flat wafer, and the substrate 1 needs to have a flat surface and be etchable, or the substrate 1 can be a substrate capable of electron beam evaporation of the second film. In the embodiment of the present invention, a single crystal silicon wafer is used.
本发明中，所述纳米几何量结构4为在基底1表面之上形成的结构，如图1所示，显影图像后，在显影后的表面生长第二薄膜3，采用剥离工艺去除电子束胶，得到纳米几何量结构4，通过该过程得到的纳米几何量结构4处于基底1的表面，即该纳米几何量结构4为在基底1表面之上形成的结构；In the present invention, the nano-geometric structure 4 is a structure formed on the surface of the substrate 1, as shown in FIG. 1, after the image is developed, a second film 3 is grown on the developed surface, and the electron beam glue is removed by a stripping process , Obtain the nano geometric structure 4, the nano geometric structure 4 obtained by this process is on the surface of the substrate 1, that is, the nano geometric structure 4 is a structure formed on the surface of the substrate 1;
或者，本发明中，所述纳米几何量结构4为由基底1表面向基底1内形成的结构，如图1所示，显影图像后，在显影后的表面采用刻蚀工艺以电子束胶层2为掩蔽层刻蚀基底1，刻蚀完成后去除残余的电子束胶，得到纳米几何量结构4，通过该过程得到的纳米几何量结构4为原基底1上的一部分，该纳米几何量结构4为刻蚀后基底1表面上凸出的部分，即该纳米几何量结构4为由基底1表面向基底1内形成的结构。Alternatively, in the present invention, the nano geometric structure 4 is a structure formed from the surface of the substrate 1 into the substrate 1, as shown in FIG. 1, after the image is developed, an etching process is used to form an electron beam glue layer on the developed surface. 2 is the masking layer to etch the substrate 1. After the etching is completed, the residual electron beam glue is removed to obtain the nano geometric structure 4, the nano geometric structure 4 obtained by this process is a part of the original substrate 1. The nano geometric structure 4 is the protruding part on the surface of the substrate 1 after etching, that is, the nano geometric structure 4 is a structure formed from the surface of the substrate 1 into the substrate 1.
制备本发明的校准用纳米几何量标准样板，可通过以下方法进行，制备过程包括如下步骤：The preparation of the nano-geometric standard template for calibration of the present invention can be carried out by the following method, and the preparation process includes the following steps:
S1，在基底1上制备出纳米几何量结构4；S1, preparing a nano-geometric structure 4 on the substrate 1;
S2，在纳米几何量结构4的表面沉积预设厚度的第一薄膜5，获得校准用纳米几何量标准样板。S2, depositing a first film 5 with a predetermined thickness on the surface of the nano geometric structure 4 to obtain a nano geometric standard template for calibration.
如图1所示，作为本发明优选的实施方案，本发明的制备校准用纳米几何量标准样板的方法中，S1通过如下过程实现，具体的，S1包括如下步骤：As shown in Fig. 1, as a preferred embodiment of the present invention, in the method for preparing a nano-geometric standard template for calibration of the present invention, S1 is realized through the following process. Specifically, S1 includes the following steps:
S1.1，在基底1上采用旋涂的方式匀电子束胶，烘干形成电子束胶层2；S1.1, spin coating is used to homogenize the electron beam glue on the substrate 1, and the electron beam glue layer 2 is formed by drying;
S1.2，根据设计要求在电子束胶层2上电子束直写纳米几何量结构4(图1所示实施例中， 纳米几何量结构4为一维的纳米线宽结构)对应的图形；S1.2, according to the design requirements, the electron beam direct write nano geometric structure 4 (in the embodiment shown in FIG. 1, the nano geometric structure 4 is a one-dimensional nanowire width structure) corresponding to the pattern on the electron beam glue layer 2;
S1.3，通过显影将纳米几何量结构4对应的图形转移到电子束胶层2，显影后完成纳米几何量结构4对应图形的转移；S1.3: Transfer the pattern corresponding to the nano geometric structure 4 to the electron beam glue layer 2 through development, and complete the transfer of the pattern corresponding to the nano geometric structure 4 after development;
S1.4，在显影后的表面采用刻蚀工艺以电子束胶层2为掩蔽层刻蚀基底1；S1.4, using an etching process on the developed surface to etch the substrate 1 using the electron beam glue layer 2 as a masking layer;
S1.5，刻蚀完成后去除残余的电子束胶，得到纳米几何量结构4，该纳米几何量结构4为刻蚀后基底1表面上剩余的凸出部分。S1.5. After the etching is completed, the remaining electron beam glue is removed to obtain the nano-geometric structure 4, which is the remaining protrusion on the surface of the substrate 1 after the etching.
如图1和图2所示，作为本发明优选的实施方案，本发明的制备校准用纳米几何量标准样板的方法中，S1还可通过以下过程实现，具体的，S1包括如下步骤：As shown in Fig. 1 and Fig. 2, as a preferred embodiment of the present invention, in the method for preparing the nano geometric quantity standard template for calibration of the present invention, S1 can also be realized by the following process. Specifically, S1 includes the following steps:
S1.1，在基底1上匀电子束胶，烘干形成电子束胶层2；S1.1, homogenizing the electron beam glue on the substrate 1, and drying to form the electron beam glue layer 2;
S1.2，根据设计要求在电子束胶层2上电子束直写纳米几何量结构4(图1所示实施例中，纳米几何量结构4为一维的纳米线宽结构；图2所示实施例中，纳米几何量结构4为二维的纳米栅格结构)对应的图形；S1.2, according to the design requirements, the electron beam direct write nano geometric structure 4 on the electron beam glue layer 2 (in the embodiment shown in Figure 1, the nano geometric structure 4 is a one-dimensional nanowire width structure; as shown in Figure 2 In the embodiment, the nano geometric quantity structure 4 is a figure corresponding to a two-dimensional nano grid structure;
S1.3，将纳米几何量结构4对应的图形转移到电子束胶层2，显影后完成纳米几何量结构4对应图形的转移；S1.3: Transfer the pattern corresponding to the nano geometric structure 4 to the electron beam glue layer 2, and complete the transfer of the pattern corresponding to the nano geometric structure 4 after development;
S1.4，在显影后的表面电子束蒸镀第二薄膜3，在电子束蒸镀第二薄膜3时，第二薄膜3生长于基底1的表面以及电子束胶层2的顶面(如图1左侧工艺路线以及图2的工艺路线)，第二薄膜3为采用电子束蒸镀的Au薄膜，采用Au薄膜能够保证本发明校准用纳米几何量标准样板的纳米几何量结构具有良好的稳定性，使本发明校准用纳米几何量标准样板能够满足在大气以及特殊要求下的使用；S1.4. The second film 3 is deposited by electron beam on the developed surface. When the second film 3 is deposited by electron beam, the second film 3 is grown on the surface of the substrate 1 and the top surface of the electron beam glue layer 2 (such as The process route on the left side of Fig. 1 and the process route of Fig. 2), the second film 3 is an Au film vapor deposited by electron beam, and the use of Au film can ensure that the nano-geometric structure of the nano-geometric standard template for calibration of the present invention has a good Stability, so that the nano geometric quantity standard template for calibration of the present invention can meet the use under the atmosphere and special requirements;
S1.5，采用剥离工艺去除电子束胶，去除电子束胶时一并将其电子束胶顶部的第二薄膜3去除，而基底1上的第二薄膜3保留，基底1上的第二薄膜3则作为纳米几何量结构4，如图1和图2所示，该纳米几何量结构4为Au薄膜在基底1表面之上形成的结构。S1.5, use a peeling process to remove the electron beam glue. When removing the electron beam glue, remove the second film 3 on the top of the electron beam glue, while the second film 3 on the substrate 1 remains, and the second film on the substrate 1 3 is the nano geometric structure 4, as shown in FIG. 1 and FIG. 2, the nano geometric structure 4 is a structure formed on the surface of the substrate 1 by an Au thin film.
如图1、图2和图3所示，作为本发明优选的实施方案，S2中，采用原子层沉积的方法(ALD)在纳米几何量结构4以及纳米几何量结构4处的基底1裸露的表面沉积薄膜。As shown in Figure 1, Figure 2 and Figure 3, as a preferred embodiment of the present invention, in S2, atomic layer deposition (ALD) is used to expose the substrate 1 at the nano geometric structure 4 and the nano geometric structure 4 A thin film is deposited on the surface.
本发明中，采用原子层沉积方法(ALD)在纳米一维或二维栅格表面生长Al 2O 3薄膜。通过控制生长参数，实现薄膜厚度可控，保证占空比的调整，制备出满足周期性要求，占空比可调的纳米一维或二维栅格标准样板。 In the present invention, the Al 2 O 3 thin film is grown on the surface of the nano one-dimensional or two-dimensional grid using the atomic layer deposition method (ALD). By controlling the growth parameters, the film thickness is controllable, the duty cycle is ensured, and the nano one-dimensional or two-dimensional grid standard template that meets the periodic requirements and the duty cycle is adjustable is prepared.
通过本发明的制备方法，能够在基底表面制备高精度、性能稳定的纳米一维或二维栅格标准样板。通过控制周期性以及调节占空比，实现纳米一维或二维栅格的精确控制，是对现有纳米一维或二维栅格标准样板的补充，推动相关学科与产业的快速发展。Through the preparation method of the present invention, a high-precision, stable performance nanometer one-dimensional or two-dimensional grid standard template can be prepared on the surface of the substrate. By controlling the periodicity and adjusting the duty cycle, the precise control of nano one-dimensional or two-dimensional grids is realized, which is a supplement to the existing nano one-dimensional or two-dimensional grid standard model and promotes the rapid development of related disciplines and industries.
如图3所示，为本发明图2所示实施例制备得到的校准用纳米几何量标准样板，从图中可以看到，栅格结构水平方向线宽A为85纳米，竖直方向线宽B为76纳米，线宽均匀，结构整齐，周期性好。As shown in Fig. 3, it is the nano-geometric standard template for calibration prepared in the embodiment shown in Fig. 2 of the present invention. It can be seen from the figure that the horizontal line width A of the grid structure is 85 nanometers, and the vertical line width B is 76 nanometers, the line width is uniform, the structure is neat, and the periodicity is good.
本发明方法制备的纳米标准样板适用于原子力显微镜、白光干涉显微镜和扫描探针显微镜等微纳米测量仪器的校准以及溯源。本发明可以实现纳米几何量样板特征尺寸快速精确可调，在标准样板制备领域具有重要的潜在应用。The nano standard template prepared by the method of the invention is suitable for the calibration and traceability of micro and nano measuring instruments such as atomic force microscopes, white light interference microscopes and scanning probe microscopes. The invention can realize the rapid and accurate adjustment of the characteristic size of the nano geometric quantity template, and has important potential applications in the field of standard template preparation.
以上所述，仅为本发明的一种具体实施方式，但本发明的保护范围并不局限于此，任何熟悉本技术领域的技术人员在本发明所披露的技术范围内，根据本发明的技术方案及其发明构思加以等同替换或改变，都应涵盖在本发明的保护范围之内。The above is only a specific implementation of the present invention, but the protection scope of the present invention is not limited to this. Anyone familiar with the technical field within the technical scope disclosed in the present invention, according to the technology of the present invention Equivalent replacements or changes to the scheme and its inventive concept should all fall within the protection scope of the present invention.

Claims (10)

  1. 一种校准用纳米几何量标准样板，其特征在于，包括基底(1)、第一薄膜(5)和基底(1)上的纳米几何量结构(4)，第一薄膜(5)设置于纳米几何量结构(4)的表面，通过调整第一薄膜(5)的厚度能够对纳米几何量结构的长度、线宽以及占空比进行调制。A nano-geometric standard template for calibration, which is characterized in that it comprises a substrate (1), a first thin film (5) and a nano-geometric structure (4) on the substrate (1). The first thin film (5) is arranged on the nanometer On the surface of the geometric structure (4), the length, line width and duty ratio of the nano geometric structure can be modulated by adjusting the thickness of the first thin film (5).
  2. 根据权利要求1所述的一种校准用纳米几何量标准样板，其特征在于，所述纳米几何量结构(4)为纳米线宽结构或者纳米栅格结构。The nano-geometry standard template for calibration according to claim 1, wherein the nano-geometry structure (4) is a nano-wire width structure or a nano-grid structure.
  3. 根据权利要求1所述的一种校准用纳米几何量标准样板，其特征在于，所述纳米几何量结构(4)为在基底(1)表面之上形成的结构，或者为由基底(1)表面向基底(1)内形成的结构。The nano-geometric standard template for calibration according to claim 1, wherein the nano-geometric structure (4) is a structure formed on the surface of a substrate (1) or is composed of a substrate (1) The structure formed on the surface of the substrate (1).
  4. 根据权利要求1所述的一种校准用纳米几何量标准样板，其特征在于，第一薄膜(5)为Al 2O 3薄膜；基底(1)采用单晶硅片。 The nano-geometric standard template for calibration according to claim 1, wherein the first film (5) is an Al 2 O 3 film; and the substrate (1) is a single crystal silicon wafer.
  5. 一种校准用纳米几何量标准样板的制备方法，其特征在于，包括如下步骤：A method for preparing a nano-geometric standard template for calibration, which is characterized in that it comprises the following steps:
    S1，在基底(1)上制备出纳米几何量结构(4)；S1, preparing a nano-geometric structure (4) on the substrate (1);
    S2，在纳米几何量结构(4)的表面沉积预设厚度的第一薄膜(5)，获得校准用纳米几何量标准样板。S2, depositing a first film (5) with a preset thickness on the surface of the nano geometric structure (4) to obtain a nano geometric standard template for calibration.
  6. 根据权利要求5所述的一种校准用纳米几何量标准样板的制备方法，其特征在于，S1包括如下步骤：The method for preparing a nano-geometric standard template for calibration according to claim 5, wherein S1 comprises the following steps:
    S1.1，在基底(1)上匀电子束胶，烘干形成电子束胶层(2)；S1.1, homogenizing the electron beam glue on the substrate (1) and drying to form the electron beam glue layer (2);
    S1.2，根据设计要求在电子束胶层(2)上电子束直写纳米几何量结构(4)对应的图形；S1.2, according to the design requirements, write the corresponding figure of the nano geometric quantity structure (4) on the electron beam glue layer (2) directly;
    S1.3，通过显影将纳米几何量结构(4)对应的图形转移到电子束胶层(2)；S1.3: Transfer the pattern corresponding to the nano-geometric structure (4) to the electron beam glue layer (2) by developing;
    S1.4，在显影后的表面采用刻蚀工艺以电子束胶层(2)为掩蔽层刻蚀基底(1)；S1.4, using an etching process on the developed surface to etch the substrate (1) using the electron beam glue layer (2) as a masking layer;
    S1.5，刻蚀完成后去除残余的电子束胶，得到纳米几何量结构(4)。S1.5, after the etching is completed, the residual electron beam glue is removed to obtain a nano-geometric structure (4).
  7. 根据权利要求5所述的一种校准用纳米几何量标准样板的制备方法，其特征在于，S1 包括如下步骤：The method for preparing a nano-geometric standard template for calibration according to claim 5, wherein S1 comprises the following steps:
    S1.1，在基底(1)上匀电子束胶，烘干形成电子束胶层(2)；S1.1, homogenizing the electron beam glue on the substrate (1) and drying to form the electron beam glue layer (2);
    S1.2，根据设计要求在电子束胶层(2)上电子束直写纳米几何量结构对应的图形；S1.2, according to the design requirements, write the corresponding figure of the nano-geometric structure on the electron beam glue layer (2);
    S1.3，通过显影将纳米几何量结构(4)对应的图形转移到电子束胶层(2)；S1.3: Transfer the pattern corresponding to the nano-geometric structure (4) to the electron beam glue layer (2) by developing;
    S1.4，在显影后基底(1)的表面生长第二薄膜(3)；S1.4, growing a second film (3) on the surface of the substrate (1) after development;
    S1.5，采用剥离工艺去除电子束胶，得到纳米几何量结构(4)。S1.5, using a stripping process to remove the electron beam glue to obtain a nano geometric structure (4).
  8. 根据权利要求7所述的一种校准用纳米几何量标准样板的制备方法，其特征在于，S1.4中，采用电子束蒸镀在基底(1)的表面生长第二薄膜(3)。The method for preparing a nano-geometric standard template for calibration according to claim 7, characterized in that in S1.4, the second film (3) is grown on the surface of the substrate (1) by electron beam evaporation.
  9. 根据权利要求7所述的一种校准用纳米几何量标准样板的制备方法，第二薄膜(3)为Au薄膜。According to a method for preparing a nano-geometric standard template for calibration according to claim 7, the second film (3) is an Au film.
  10. 根据权利要求5所述的一种校准用纳米几何量标准样板的制备方法，其特征在于，S2中，采用原子层沉积的方法在纳米几何量结构(4)以及纳米几何量结构(4)处的基底(1)表面沉积薄膜。The method for preparing a nano-geometric standard template for calibration according to claim 5, characterized in that, in S2, an atomic layer deposition method is used in the nano-geometric structure (4) and the nano-geometric structure (4). A thin film is deposited on the surface of the substrate (1).
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