WO2020213442A1 - Photopolymerizable composition, coating film containing said photopolymerizable composition, and curing method therefor - Google Patents

Photopolymerizable composition, coating film containing said photopolymerizable composition, and curing method therefor Download PDF

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WO2020213442A1
WO2020213442A1 PCT/JP2020/015441 JP2020015441W WO2020213442A1 WO 2020213442 A1 WO2020213442 A1 WO 2020213442A1 JP 2020015441 W JP2020015441 W JP 2020015441W WO 2020213442 A1 WO2020213442 A1 WO 2020213442A1
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bis
anthracene
group
photopolymerizable composition
compound
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PCT/JP2020/015441
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French (fr)
Japanese (ja)
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井内啓太
檜森俊一
山田暁彦
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川崎化成工業株式会社
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Priority to KR1020217028771A priority Critical patent/KR20210154963A/en
Publication of WO2020213442A1 publication Critical patent/WO2020213442A1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10Esters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/44Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/04Oxygen-containing compounds
    • C08K5/10Esters; Ether-esters
    • C08K5/12Esters; Ether-esters of cyclic polycarboxylic acids
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere

Definitions

  • the present invention relates to a photopolymerizable composition, a coating film containing the photopolymerizable composition, and a curing method thereof, and particularly contains a photopolymerizable composition and the photopolymerizable composition which are cured by ultraviolet rays in a long wavelength range.
  • the coating film to be polymerized and the curing method thereof.
  • Polymerizable compositions are used in various industrial fields, and among them, photopolymerizable compositions are excellent in terms of speed of curing, durability of chemical bonds formed, economic efficiency, etc., and are applicable. It is widely used in various applications such as coating materials, adhesives, sealing materials, adhesives, paints, inks, resists, dental materials, lenses, and molding materials.
  • a photopolymerizable composition is widely used as a resist material used for etching or plating.
  • the photopolymerizable composition is laminated on a circuit-forming substrate such as a copper substrate, irradiated with energy rays such as ultraviolet rays to cure a predetermined portion of the photopolymerizable composition, and then the photopolymerizable composition.
  • a resist pattern is formed on the substrate by removing the uncured portion of the substrate.
  • the photopolymerizable composition usually comprises a polymerizable compound and a photopolymerization initiator.
  • the photopolymerization initiator When the photopolymerization initiator is irradiated with energy rays such as ultraviolet rays, the photopolymerization initiator absorbs energy and becomes an excited state, and the photopolymerization initiator in the excited state is decomposed to polymerize radicals and the like.
  • a starting seed is generated, and the polymerizable compound starts polymerization by the starting seed and is cured.
  • the photopolymerizable composition contains a pigment or the like, there is a problem that the transmittance of the irradiated light becomes low, the light reaching the photopolymerization initiator is reduced, and the light cannot be sufficiently cured, and the sensitivity is high.
  • the photopolymerizable composition of the above is required.
  • the LED light source an LED light source that irradiates light having a long wavelength such as 385 nm, 395 nm, or 405 nm is used, and the photopolymerization initiator currently used is such.
  • photopolymerization sensitizers such as dialkoxyanthracene and thioxanthone (Patent Documents 1 to 4).
  • the photopolymerizable composition often contains a colorant such as a pigment, a filler, a light stabilizer, an ultraviolet absorber, etc., and a sufficient amount of light energy is used. In many cases, it is not possible to supply the photopolymerization initiator, and in that sense, a highly active photopolymerization sensitizer is required.
  • dialkoxyanthracene and thioxanthone have a problem that they are easily colored in the photopolymerization reaction and the cured coating film turns yellow. Further, during the curing of the coating film or during the storage of the cured product, the photopolymerization sensitizer migrates to the surface of the cured coating film or the like, causing problems such as powder blowing.
  • the photopolymerizable composition when used as a resist or the like, it is required that the photopolymerizable composition has high activity and at the same time, the cured product obtained by polymerization and curing has excellent heat resistance. This is indispensable for preventing contamination of the curing device due to volatilization of VOCs (volatile organic compounds) such as residual monomers when heated as post-curing, or for ensuring long-term stability of the final cured product. ..
  • VOCs volatile organic compounds
  • the present invention cures at a sufficient speed even in a situation where a light source having a low energy level such as an LED light source or irradiation energy is partially shielded, and migration It is an object of the present invention to provide a photopolymerizable composition which does not have the above-mentioned problems and has high heat resistance of the cured product.
  • the photopolymerizable composition contained as a sensitizer is cured at a sufficient speed even in a situation where a light source having a low energy level such as an LED light source or an irradiation energy is partially shielded, and VOC such as residual monomers is produced.
  • a light source having a low energy level such as an LED light source or an irradiation energy is partially shielded
  • VOC such as residual monomers
  • the first invention is a photopolymerizable composition containing at least the following components (A) to (C), and the 5% weight loss temperature of the cured product is 200 ° C. or higher. It exists in a photopolymerizable composition characterized by.
  • A A 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group represented by the following general formula (1)
  • B An ethylenically unsaturated group-containing polymerizable compound.
  • C Photopolymerization initiator.
  • A represents an alkylene group having 1 to 20 carbon atoms, and the alkylene group may be branched by an alkyl group.
  • R represents an alkyl group having 1 to 20 carbon atoms, and the alkyl group may be branched by an alkyl group, may be a cycloalkyl group or a cycloalkylalkyl group, may be substituted with a hydroxy group, and may be carbon. Some of the atoms may be replaced by oxygen atoms (except when forming peroxides).
  • X and Y may be the same or different, and represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, or a halogen atom.
  • the second invention is characterized in that, in (A), A is a 9,10-bis (alkoxycarbonylmethyleneoxy) anthracene compound having an ester group, wherein A in the general formula (1) is a methylene group. It exists in the photopolymerizable composition according to claim 1.
  • the third invention resides in a photopolymerizable composition, which further comprises (D) an alkali-soluble polymerizable compound in the photopolymerizable composition according to the first or second invention.
  • the fourth invention resides in the photopolymerizable composition according to the third invention, wherein the alkali-soluble polymerizable compound (D) is a compound having a hydroxyl group.
  • the fifth invention resides in the photopolymerizable composition according to the third or fourth invention, wherein the alkali-soluble polymerizable compound (D) is a compound having a carboxyl group.
  • the sixth invention resides in the photopolymerizable composition according to the third invention, wherein the alkali-soluble polymerizable compound (D) is an alkali-soluble resin.
  • the seventh invention resides in a photopolymerizable composition, which comprises further containing (E) a pigment in the photopolymerizable composition according to any one of the first to sixth inventions.
  • the (C) photopolymerization initiator is a biimidazole-based photopolymerization initiator, an alkylphenone-based photopolymerization initiator, a triazine-based photopolymerization initiator, an acylphosphine oxide-based photopolymerization initiator, and an oxime-based light.
  • the photopolymerizable composition according to any one of the first to seventh inventions, which comprises at least one photopolymerization initiator selected from the group consisting of polymerization initiators.
  • the ninth invention exists in the photopolymerizable composition according to any one of the first to seventh inventions, wherein the (C) photopolymerization initiator is a biimidazole-based photopolymerization initiator.
  • a tenth invention exists in the photopolymerizable composition according to any one of the first to seventh inventions, wherein the photopolymerization initiator (C) is an oxime ester-based photopolymerization initiator.
  • the eleventh invention is characterized by having a photopolymerizable coating film containing the photopolymerizable composition according to any one of the first to tenth inventions on a support. It resides in the membrane composition.
  • the twelfth invention is a cured product obtained by curing the photopolymerizable composition according to any one of the first to tenth inventions by light irradiation, and the 5% weight loss temperature thereof is 200 ° C. or higher. It exists in the cured product, which is characterized by the fact that.
  • the thirteenth invention is a photopolymerizable composition, which comprises irradiating the photopolymerizable composition according to any one of the first to tenth inventions with light in a wavelength range of 300 nm to 500 nm. It depends on the curing method of.
  • the fourteenth invention is a photopolymerizable composition in which the irradiation source of the light to be irradiated according to the thirteenth invention is an ultraviolet LED or a semiconductor laser having a center wavelength of 365 nm, 375 nm, 385 nm, 395 nm, and 405 nm. It depends on the curing method.
  • the 5% thermal weight reduction temperature refers to a cured product obtained by polymerizing and curing a photopolymerizable composition by light irradiation, starting heating at 50 ° C. in a nitrogen atmosphere, and 20 at 1-minute intervals. This is the temperature at which the weight is reduced by 5% by weight of the initial weight when the heating temperature is increased by ° C.
  • the weight of the cured product can be measured with a thermogravimetric measuring device.
  • the speed is sufficient even in a light source having a low energy level such as an LED light source or in a situation where the irradiation energy is partially shielded.
  • the cured product obtained is free from problems of powder blowing and migration, and the amount of VOC such as residual monomers is small, so that the 5% weight loss temperature of the cured product is 200 ° C. or higher.
  • Example 1 solid line
  • Comparative Example 1 dotted line
  • the 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group used in the present invention is a compound of the following general formula (1).
  • A represents an alkylene group having 1 to 20 carbon atoms, and the alkylene group may be branched by an alkyl group.
  • R represents an alkyl group having 1 to 20 carbon atoms, and the alkyl group may be branched by an alkyl group, may be a cycloalkyl group or a cycloalkylalkyl group, may be substituted with a hydroxy group, and may be carbon. Some of the atoms may be replaced by oxygen atoms (except when forming peroxides).
  • X and Y may be the same or different, and represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, or a halogen atom.
  • examples of the alkylene group having 1 to 20 carbon atoms represented by A include a methylene group, an ethylene group, a propylene group, a butylene group, a pentylene group, a hexylene group, a heptylene group, an octylene group and a nonylene group.
  • Examples thereof include a decylene group, an undecylene group, a dodecylene group, a tridecylene group, a tetradecylene group, a pentadecylene group, a hexadecylene group, a heptadecylene group, an octadecylene group, a nonadesilene group, an icosilene group, and the alkylene group may be branched by an alkyl group. ..
  • the alkyl group having 1 to 8 carbon atoms represented by X or Y includes a methyl group, an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group and an i-butyl group.
  • examples of the halogen atom include fluorine atom, chlorine atom, bromine atom or iodine. Atomic can be mentioned.
  • the alkyl groups having 1 to 20 carbon atoms represented by R include methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, i-butyl group and t.
  • n-pentyl group i-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, 2-ethylhexyl group, n-nonyl group, n-decyl group, n-undecyl group, n -Dodecyl group, n-tridecyl group, n-tetradecyl group, n-pentadecyl group, n-hexadecyl group, n-heptadecyl group, n-octadecyl group, n-nonadecil group, n-icosyl group and the like can be mentioned.
  • Examples of those in which the group is substituted with a hydroxy group include 2-hydroxyethyl group, 2-hydroxypropyl group, 3-hydroxypropyl group, 2-hydroxybutyl group, 3-hydroxybutyl group and 4-hydroxybutyl group.
  • cycloalkyl group examples include cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, cycloheptyl group, cyclooctyl group, norbornyl group, adamantyl group, 4-n-dodecylcyclohexyl group, decahydronaphthyl group, hydroxycyclohexyl group and the like.
  • Cycloalkylalkyl groups include cyclopropylmethyl group, cyclobutylmethyl group, cyclopentylmethyl group, cyclohexylmethyl group, cycloheptylmethyl group, cyclooctylmethyl group, cyclononylmethyl group, cyclodecylmethyl group, 2 -Cyclobutylethyl group, 2-cyclopentylethyl group, 2-cyclohexylethyl group, 2-cycloheptylethyl group, 2-cyclooctylethyl group, 2-cyclononylethyl group, 2-cyclodecylethyl group, 3-cyclobutyl Propyl group, 3-cyclopentylpropyl group, 3-cyclohexylpropyl group, 3-cycloheptylpropyl group, 3-cyclooctylpropyl group, 3-cyclononylpropyl group, 3-cyclodecylpropyl group,
  • 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group represented by the general formula (1) of the present invention include, for example, 9,10-bis (methoxycarbonylmethyleneoxy) anthracene.
  • 9,10-bis (methoxycarbonylpentyleneoxy) anthracene 9,10-bis (ethoxycarbonylpentyleneoxy) anthracene, 9,10-bis (isopropoxycarbonylpentyleneoxy) anthracene, 9,10- Bis (tert-butoxycarbonylpentyleneoxy) anthracene, 9,10-bis (n-butoxycarbonylpentyleneoxy) anthracene, 9,10-bis (methoxycarbonylhexyleneoxy) anthracene, 9,10-bis (ethoxycarbonyl) Hexyleneoxy) anthracene, 9,10-bis (isopropoxycarbonylhexyleneoxy) anthracene, 9,10-bis (tert-butoxycarbonylhexyleneoxy) anthracene, 9,10-bis (n-butoxycarbonylhexyleneoxy) ) Anthracene, 9,10-bis (methoxycarbonylpenty
  • alkyl groups in which X and / or Y are alkyl groups include, for example, 2-ethyl-9,10-bis (methoxycarbonylmethyleneoxy) anthracene and 2-ethyl-9,10-bis (ethoxycarbonylmethyleneoxy).
  • Anthracene 2-ethyl-9,10-bis (n-propoxycarbonylmethyleneoxy) anthracene, 2-ethyl-9,10-bis (isopropoxycarbonylmethyleneoxy) anthracene, 2-ethyl-9,10-bis (tert) -Butoxycarbonylmethyleneoxy) anthracene, 2-ethyl-9,10-bis (n-butoxycarbonylmethyleneoxy) anthracene, 2-ethyl-9,10-bis (n-pentyloxycarbonylmethyleneoxy) anthracene, 2-ethyl -9,10-bis (methoxycarbonylpropyleneoxy) anthracene, 2-ethyl-9,10-bis (ethoxycarbonylpropyleneoxy) anthracene, 2-ethyl-9,10-bis (isopropoxycarbonylpropyleneoxy) anthracene, 2 -Ethyl-9,10-bis (tert-but
  • 2-amyl-9,10-bis (methoxycarbonylmethyleneoxy) anthracene
  • 2-amyl-9,10-bis (ethoxycarbonylmethyleneoxy) anthracene
  • 2-amyl-9,10-bis (n-).
  • halogen atoms in which X and / or Y are halogen atoms include, for example, 2-chloro-9,10-bis (methoxycarbonylmethyleneoxy) anthracene and 2-chloro-9,10-bis (ethoxycarbonylmethyleneoxy).
  • Anthracene 2-chloro-9,10-bis (n-propoxycarbonylmethyleneoxy) anthracene, 2-chloro-9,10-bis (isopropoxycarbonylmethyleneoxy) anthracene, 2-chloro-9,10-bis (tert) -Butoxycarbonylmethyleneoxy) anthracene, 2-chloro-9,10-bis (n-butoxycarbonylmethyleneoxy) anthracene, 2-chloro-9,10-bis (methoxycarbonylpropyleneoxy) anthracene, 2-chloro-9, 10-Bis (ethoxycarbonylpropyleneoxy) anthracene, 2-chloro-9,10-bis (isopropoxycarbonylpropyleneoxy) anthracene, 2-chloro-9,10-bis (tert-butoxycarbonylpropyleneoxy) anthracene, 2- Chloro-9,10-bis (n-butoxycarbonylpropyleneoxy) anthracene
  • 9,10-bis (methoxycarbonylmethyleneoxy) anthracene, 9,10-bis (ethoxycarbonylmethyleneoxy) anthracene, and 9,10-bis (n-propoxycarbonyl) are considered to be easy to manufacture.
  • R in the general formula (1) is an alkyl group having 1 to 20 carbon atoms containing no oxygen atom.
  • a in the general formula (1) is preferably a methylene group having 1 carbon atom.
  • an alkyl group having 3 or more carbon atoms in R is preferable, and 9,10-bis (isopropoxycarbonylmethyleneoxy) anthracene (1-3), 9,10- Bis (n-pentyloxycarbonylmethyleneoxy) anthracene (1-11) and 9,10-bis (cyclohexyloxycarbonylmethyleneoxy) anthracene (1-12) are particularly preferred.
  • the 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound can be obtained, for example, by reacting the 9,10-dihydroxyanthracene compound with an ester compound such as a bromoacetic acid ester in the presence of a basic compound.
  • the 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group represented by the general formula (1) of the present invention is the 9,10-dihydroxyanthracene compound represented by the general formula (2) as follows. It can be obtained by reacting with the corresponding ester compound represented by the general formula (3) in the presence or absence of the basic compound according to the reaction formula-1.
  • A represents an alkylene group having 1 to 20 carbon atoms, and the alkylene group may be branched by an alkyl group.
  • R represents an alkyl group having 1 to 20 carbon atoms, and the alkyl group may be branched by an alkyl group, may be a cycloalkyl group or a cycloalkylalkyl group, may be substituted with a hydroxy group, and may be carbon. Some of the atoms may be replaced by oxygen atoms (except when forming peroxides).
  • X and Y may be the same or different, and represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, or a halogen atom.
  • Z represents a chlorine atom, a bromine atom or an iodine atom.
  • the 9,10-dihydroxyanthracene compound represented by the general formula (2) used as a raw material is obtained by reducing the corresponding 9,10-anthraquinone compound.
  • 9,10-dihydroxyanthracene compound used as a raw material in the reaction include 9,10-dihydroxyanthracene, 2-methyl-9,10-dihydroxyanthracene, and 2-ethyl-9,10-dihydroxyanthracene. , 2-t-pentyl-9,10-dihydroxyanthracene, 2,6-dimethyl-9,10-dihydroxyanthracene, 2-chloro-9,10-dihydroxyanthracene, 2-bromo-9,10-dihydroxyanthracene, etc. Can be mentioned.
  • the hydroxyl group may be used in a form protected by a known protecting group.
  • 9,10-dihydroxyanthracene as an industrial method, 1,4,4a, 9a-tetrahydroanthraquinone, which is a Diels-Alder reaction product of 1,4-naphthoquinone and 1,3-butadiene, or By reducing 9,10-anthraquinone with an alkali metal salt of 1,4-dihydro 9,10-dihydroxyanthracene, which is the isomer thereof, 9,10-dihydroxyanthracene can be obtained more easily.
  • 1,4,4a, 9a-tetrahydroanthraquinone obtained by the reaction of 1,4-naphthoquinone and 1,3-butadiene is placed in an aqueous medium in the presence of an alkaline compound such as an alkali metal hydroxide.
  • an alkaline compound such as an alkali metal hydroxide.
  • An aqueous solution of an alkali metal salt of 9,10-dihydroxyanthracene can be obtained by reacting with, 10-anthraquinone.
  • 9,10-dihydroxyanthracene Precipitation of 9,10-dihydroxyanthracene can be obtained by acidifying an aqueous solution of an alkali metal salt of 9,10-dihydroxyanthracene obtained in the reaction in the absence of oxygen. By purifying this precipitate, 9,10-dihydroxyanthracene can be obtained.
  • a 9,10-dihydroxyanthracene compound having a substituent can be obtained in the same manner.
  • ester compound represented by the general formula (3) as a raw material in Reaction Formula-1 include methyl chloroacetate, ethyl chloroacetate (3-12), n-propyl chloroacetate, isopropyl chloroacetate, and chloro N-butyl acetate (3-5), tert-butyl chloroacetate, pentyl chloroacetate, hexyl chloroacetate, heptyl chloroacetate, octyl chloroacetate, 2-ethylhexyl chloroacetate, nonyl chloroacetate, dodecyl chloroacetate, nonadesyl chloroacetate, Icosyl chloroacetate, cyclohexyl chloroacetate, cyclohexylmethylchloroacetic acid, methyl 2-chloropropionate, methyl 3-chloropropionate, methyl 2-chloropropionate, methyl 3-chloropropionate, ethyl 2-chlor
  • a chloro compound and a bromo compound are preferable in terms of reactivity, and a compound having the following structural formula is particularly preferable.
  • the amount of the ester compound represented by the general formula (3) in Reaction Scheme-1 is preferably 2.0 mol times or more and less than 10.0 mol times with respect to the 9,10-dihydroxyanthracene compound. Preferably, it is 2.2 mol times or more and less than 5.0 mol times. If it is less than 2.0 mol times, the reaction will not be completed, and if it is 10.0 mol times or more, a side reaction will occur and the yield and purity will decrease, which is not preferable.
  • ester compound represented by the general formula (3) a commercially available product may be purchased, or a compound synthesized with the corresponding carboxylic acid and alcohol may be used.
  • the ester compound represented by the general formula (3) when a compound synthesized with the corresponding carboxylic acid and alcohol is used as the ester compound represented by the general formula (3), the ester compound is synthesized in advance in the system, and the general formula (2) is used therein. By adding the 9,10-dihydroxyanthracene compound represented by)), the reaction can be carried out efficiently.
  • Examples of the basic compound used in Reaction Formula-1 include sodium hydroxide, potassium hydroxide, sodium hydride, potassium hydride, lithium hexamethyldisilazide, lithium diisopropylamide, triethylamine, tributylamine, and trihexylamine.
  • Examples thereof include dimethylamine, diethylamine, dipropylamine, dibutylamine, cyclohexylamine, dimethylaniline, pyridine, 4,4-dimethylaminopyridine, piperidine, ⁇ -picolin, rutidin and the like.
  • the amount of the basic compound added is preferably 2.0 mol times or more and less than 10.0 mol times, more preferably 2.2 mol times or more, 5.0 times or more with respect to the 9,10-dihydroxyanthracene compound. It is less than a molar number. If it is less than 2.0 mol times, the reaction will not be completed, and if it is 10.0 mol times or more, a side reaction will occur and the yield and purity will decrease, which is not preferable.
  • the reaction is carried out in a solvent or without a solvent.
  • the solvent used is not particularly limited as long as it does not react with the ester compound to be used.
  • aromatic solvents such as toluene, xylene and ethylbenzene, ether solvents such as tetrahydrofuran and 1,4-dioxane, acetone, methyl ethyl ketone, etc.
  • Ketone solvents such as methylisobutylketone, amide solvents such as dimethylacetamide and dimethylformamide
  • carbon halide solvents such as methylene chloride, ethylene dichloride and chlorobenzene
  • alcohol solvents such as methanol, ethanol and 1-propanol are used. ..
  • phase transfer catalyst examples include tetramethylammonium bromide, tetraethylammonium bromide, tetrapropylammonium bromide, tetrabutylammonium bromide, trioctylmethylammonium bromide, trioctylethylammonium bromide, trioctylpropylammonium bromide, and trioctylbutylammonium bromide.
  • Benzyldimethyloctadecylammonium bromide tetramethylammonium chloride, tetraethylammonium chloride, tetrapropylammonium chloride, tetrafbutylammonium chloride, trioctylmethylammonium chloride, trioctylethylammonium chloride, trioctylpropylammonium chloride, trioctylbutylammonium chloride , Benzyldimethyloctadecylammonium chloride and the like.
  • the amount of the phase transfer catalyst added is preferably 0.01 mol times or more and less than 1.0 mol times, more preferably 0.05 mol times or more, 0.5 with respect to the 9,10-dihydroxyanthracene compound. It is less than a molar number. If it is less than 0.01 mol times, the reaction rate is slow, and if it is 1.0 mol times or more, the purity of the product is lowered, which is not preferable.
  • the reaction temperature of the reaction is usually 0 ° C. or higher and 200 ° C. or lower, preferably 10 ° C. or higher and 100 ° C. or lower. If it is less than 0 ° C., the reaction time is too long, and if it is heated above 100 ° C., impurities increase and the purity of the target compound decreases, both of which are not preferable.
  • the reaction time in the reaction varies depending on the reaction temperature, but is usually about 1 to 20 hours. More preferably, it is 2 to 10 hours.
  • unreacted raw materials / solvent and catalyst are removed by a method such as washing, distillation under reduced pressure, filtration, etc., individually or in combination, if necessary.
  • a method such as washing, distillation under reduced pressure, filtration, etc., individually or in combination, if necessary.
  • the product is a solid, crystals will precipitate during the reaction, so solid-liquid separation will be performed by filtration, and if necessary, recrystallized from a poor solvent such as alcohol or hexane.
  • it can be dried up as it is to obtain crystals.
  • the product is a liquid, it can be dried up as it is, and if necessary, purified by distillation or the like to obtain a 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group.
  • the photopolymerizable composition of the present invention is a photopolymerizable composition containing at least the following components (A) to (C), and the 5% weight loss temperature of the cured product is 200 ° C. or higher. It is a photopolymerizable composition characterized by.
  • A A 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group represented by the general formula (1)
  • B An ethylenically unsaturated group-containing polymerizable compound.
  • C Photopolymerization initiator.
  • the 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group represented by the general formula (1) of the present invention is excited by light of a specific wavelength, and the excitation energy is received by the photopolymerization initiator. Acts as a photopolymerization sensitizer to pass. Due to this effect, photopolymerization can be efficiently initiated even with long-wavelength light in which the activity of the photopolymerization initiator is not sufficient.
  • the photopolymerization sensitizer and the photopolymerization initiator can be mixed with the photopolymerization compound to form a photopolymerizable composition.
  • the photopolymerizable composition can be easily photocured by irradiation with light having a long wavelength such as ultraviolet LED light having a center wavelength of 405 nm.
  • the 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group represented by the general formula (1) of the present invention has an ester group via an alkylene group in its structure. It has a high affinity with the photopolymerizable composition and its cured product, and has a feature that the degree of migration or blooming in the photopolymerizable composition and its cured product is extremely low.
  • R is a cycloalkyl group or a cycloalkylalkyl group
  • the solubility in various monomers is improved, so that it can be dissolved in various monomers at a high concentration, and the range of application is widened. have.
  • the case of a cyclohexyl group has high solubility.
  • ester group in the 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group represented by the general formula (1) of the present invention is bonded to the anthracene ring via the alkylene group A. Therefore, there is a feature that the absorption wavelength of ultraviolet rays is on the longer wavelength side as compared with the compound which does not mediate A. Therefore, it can be effectively used even when the sensitizing effect is weak in the compound not mediated by A.
  • A is a methylene group having 1 carbon atom, and A is 2 carbon atoms.
  • A is a methylene group having 1 carbon atom, and A is 2 carbon atoms.
  • the above 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound it is characterized in its high sensitizing ability in radical polymerization. This effect is generally alleviated by the addition of an oxygen atom at the 9th and 10th positions of the anthracene compound, which inhibits radical polymerization, but has an ester group represented by the general formula (1) of the present invention9.
  • 10-Bis (alkoxycarbonylalkyleneoxy) anthracene compounds in which A is a methylene group are thought to come from the steric positional relationship between the anthracene ring and the ester group, but in particular, the inhibition is weakened and radical polymerization is increased. It seems to have high activity as a sensitizer.
  • the photopolymerization rate of the photopolymerizable composition can be increased. It is considered that it is significantly promoted, and as a result, the thermally decomposable substance in the cured product is reduced, and the 5% weight loss temperature of the cured product is increased as compared with the photopolymerization composition containing no photopolymerization sensitizer of the present invention. Be done. Then, it is considered that the effect reduces the volatile components and improves the heat resistance of the cured product.
  • the 5% weight loss temperature of the cured product is 200 ° C. or higher.
  • a resist material used for etching or the like is assumed to be used as an alkali-soluble polymerizable compound.
  • a cured portion and an uncured portion are formed by patterned light irradiation, and the uncured alkali is used.
  • soluble polymerizable compounds will be removed.
  • unreacted monomers remain in the cured portion and the cured portion is partially removed by alkaline cleaning.
  • the 5% weight loss temperature of the cured product is 200 ° C. or higher.
  • a 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group of the present invention is used as a photopolymerization sensitizer. By using it, a cured coating film that can withstand patterning can be formed.
  • the pigment when the pigment is contained in the photopolymerizable composition, a part of the light irradiated by the pigment is absorbed, so that the photopolymerization of the photopolymerizable composition often does not proceed sufficiently.
  • a black pigment when a black pigment is added, the effect is remarkable.
  • a sufficient curing rate can be maintained by using the 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group of the present invention as a photopolymerization sensitizer. , A cured film can be formed.
  • photopolymerization initiator used in the present invention examples include a benzylmethyl ketal-based polymerization initiator, an ⁇ -hydroxyalkylphenone-based polymerization initiator, an oxime ester-based polymerization initiator, an ⁇ -aminoacetophenone-based polymerization initiator, and an acylphosphine oxide-based polymerization initiator.
  • An initiator, a biimidazole-based polymerization initiator, a triazine-based polymerization initiator, a thioxanthone-based polymerization initiator, and the like can be used.
  • the 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group represented by the general formula (1) of the present invention is a benzylmethyl ketal-based polymerization initiator, an ⁇ -hydroxyalkylphenone-based polymerization initiator, or bi. It has an excellent photopolymerization sensitizing effect on radical polymerization initiators such as imidazole-based polymerization initiators that do not absorb at long wavelengths. Further, even in a polymerization reaction using a polymerization initiator such as an acylphosphine oxide having absorption in a long wavelength region, it has an effect of increasing the polymerization rate or an effect of improving the physical properties of the obtained polymer. ..
  • benzylmethyl ketal polymerization initiator examples include 2,2-dimethoxy-1,2-diphenylethane-1-one (trade name "Irgacure 651” manufactured by BASF) and the like, and ⁇ - As a hydroxyalkylphenone-based radical polymerization initiator, 2-hydroxy-2-methyl-1-phenylpropan-1-one (trade name "Darocure 1173" manufactured by BASF), 1-hydroxycyclohexylphenyl ketone (Product name "Irgacure 184" manufactured by BASF), 1- [4- (2-hydroxyethoxy) -phenyl] -2-hydroxy-2-methyl-1-propane-1-one (product) Name "Irgacure 2959” manufactured by BASF), 2-Hydroxy-1- ⁇ 4- [4- (2-hydroxy-2-methylpropionyl) -benzyl] phenyl ⁇ -2-methyl-1- On (trade name "Irgacure 127” manufactured by BASF
  • 2,2-dimethoxy-1,2-diphenylethane-1-one (trade name "Irgacure 651” manufactured by BASF), which is a benzylmethyl ketal polymerization initiator, ⁇ -hydroxyalkylphenone.
  • 2-Hydroxy-2-methyl-1-phenylpropan-1-one (trade name "DaroCure 1173” manufactured by BAS), 1-hydroxycyclohexylphenylketone (trade name), which is a system radical polymerization initiator.
  • "Irgacure 184" manufactured by BASF) is preferable.
  • acetophenone, 2-hydroxy-2-phenylacetophenone, 2-ethoxy-2-phenylacetophenone, 2-methoxy-2-phenylacetophenone, 2-isopropoxy-2-phenylacetophenone, 2-isopropoxy-2-phenylacetophenone, which are acetophenone-based polymerization initiators, Isobutoxy-2-phenylacetophenone, benzyl-based polymerization initiator benzyl, 4,4'-dimethoxybenzyl, anthraquinone-based polymerization initiator 2-ethylanthraquinone, 2-tert-butylanthraquinone, 2-phenoxyantraquinone, 2- (Phenylthio) anthraquinone, 2- (hydroxyethylthio) anthraquinone and the like can also be used.
  • biimidazole-based polymerization initiator examples include 2- (o-chlorophenyl) -4,5-diphenylimidazole dimer, 2- (o-chlorophenyl) -4,5-di (methoxyphenyl) imidazole dimer, and 2 -(O-fluorophenyl) -4,5-diphenylimidazole dimer, 2- (o-methoxyphenyl) -4,5-diphenylimidazole dimer, 2- (p-methoxyphenyl) -4,5- Examples thereof include 2,4,5-triarylimidazole dimers such as diphenylimidazole dimer.
  • 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane-1-one (trade name "Irgacure 907", BASF, Inc.)
  • 2-Benzyl-2- (dimethylamino) -4'-morpholinobtyrophenone (trade name "Irgacure 369" manufactured by B.S.F.)
  • 2-dimethylamino-2- (4-methylbenzyl) ) -1- (4-morpholino-4-yl-phenyl) butane-1-one (trade name "Irgacure 379" manufactured by BASF Co., Ltd.) and the like.
  • Acylphosphine oxide-based polymerization initiators include 2,4,6-trimethylbenzoyl-diphenylphosphine oxide (trade name "Irgacure TPO” manufactured by BASF), bis (2,4,6-trimethylbenzoyl). Examples thereof include phenylphosphine oxide (trade name "Irgacure 819” manufactured by BASF Co., Ltd.).
  • 1,2-octanedione 1- [4- (phenylthio) phenyl]-, 2- ( occasionally-benzoyloxime) (trade name "Irgacure OXE01" BASF)
  • Etanone 1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazole-3-yl]-
  • 1- (nov-acetyloxime) trade name "Irgacure OXE02" B.A.
  • Triazine-based polymerization initiators include 2- (3,4-methylenedioxyphenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine and 2- (4-methoxyphenyl) -4,6. -Bis (trichloromethyl) -1,3,5-triazine and the like can be mentioned.
  • Examples of the thioxanthone-based polymerization initiator include 2,4-diethylthioxanthone and 2-isopropylthioxanthone.
  • Onium salt-based aggregation initiator benzylmethyl ketal-based polymerization initiator, ⁇ -hydroxyalkylphenone-based polymerization initiator, oxime ester-based photopolymerization initiator, ⁇ -aminoacetophenone-based photopolymerization initiator that can be used in the present invention.
  • Acylphosphine oxide-based photopolymerization initiator, biimidazole-based polymerization initiator, triazine-based polymerization initiator, and thioxanthone-based polymerization initiator can be used alone, but a plurality of types can be combined according to the intended use. It can also be used.
  • biimidazole-based photopolymerization initiators alkylphenone-based photopolymerization initiators, triazine-based photopolymerization initiators, acylphosphine oxide-based photopolymerization initiators, and oxime-based photopolymerization initiators are preferable. ..
  • the biimidazole-based photopolymerization initiator and the oxime ester-based photopolymerization initiator are particularly preferable in terms of the high effect and activity of the photopolymerization sensitizer of the present invention.
  • the amount of the photopolymerization sensitizer containing the 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group represented by the general formula (1) of the present invention for the photopolymerization initiator is not particularly limited. However, it is usually in the range of 5% by weight or more and 100% by weight or less, preferably 10% by weight or more and 50% by weight or less with respect to the photopolymerization initiator. If the amount of the photopolymerization sensitizer used is less than 5% by weight, it takes too much time to photopolymerize the polymerizable compound, while if it is used in excess of 100% by weight, the effect commensurate with the addition cannot be obtained. ..
  • the photopolymerization sensitizer containing a 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group represented by the general formula (1) of the present invention can also be directly added to the polymerizable compound.
  • a photopolymerization initiator composition by blending it with a photopolymerization initiator in advance, and then add it to the polymerizable compound.
  • the photopolymerization initiator composition of the present invention is a photopolymerization sensitizer containing at least a 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group represented by the general formula (1). It is a composition containing a photopolymerization initiator.
  • (B) Ethylene unsaturated group-containing polymerizable compound for example, an organic compound having a double bond such as styrene, vinyl acetate, acrylonitrile, methacrylonitrile, acrylamide, acrylic acid ester, and methacrylic acid ester can be used.
  • an organic compound having a double bond such as styrene, vinyl acetate, acrylonitrile, methacrylonitrile, acrylamide, acrylic acid ester, and methacrylic acid ester
  • acrylic acid ester and methacrylic acid ester (hereinafter, both are collectively referred to as (meth) acrylic acid ester) are preferable from the viewpoint of film forming ability and the like.
  • Examples of the (meth) acrylate ester include methyl acrylate, butyl acrylate, cyclohexyl acrylate, -2-ethylhexyl acrylate, -2-hydroxyethyl acrylate, isobornyl acrylate, methyl methacrylate, butyl methacrylate, and methacrylic acid.
  • the photopolymerizable composition of the present invention can contain an alkali-soluble polymerizable compound.
  • an alkali-soluble polymerizable compound a compound having a hydroxyl group and / or a carboxyl group and an ethylenically unsaturated bond group can be preferably used.
  • Examples of the compound having a hydroxyl group and an ethylenically unsaturated bond group include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, and 2-hydroxybutyl (meth).
  • Examples of the compound having a carboxyl group and an ethylenically unsaturated bond group include acrylic acid, methacrylic acid, 2-acryloyloxyethyl succinate, crotonic acid, isocrotonic acid, tiglic acid, 3-methylcrotonic acid and 2-methyl.
  • Examples thereof include -2-pentenoic acid, ⁇ -hydroxyacrylic acid, ⁇ -chloroacrylic acid and cinnamic acid.
  • maleic acid, fumaric acid, itaconic acid, citraconic acid, mesaconic acid and the like can be mentioned.
  • monosuccinate (2-acryloyloxyethyl), monosuccinate (2-methacryloyloxyethyl), mono-phthalate (2-acryloyloxyethyl), mono-phthalate (2-methacryloyloxyethyl) and the like can be mentioned.
  • ⁇ -carboxypolycaprolactone monoacrylate, ⁇ -carboxypolycaprolactone monomethacrylate and the like can be mentioned.
  • the alkali-soluble polymerizable compound may be not only a monomer but also an oligomerized compound or an alkali-soluble resin.
  • the alkali-soluble resin those generally used for negative resists can be used, as long as they are soluble in an aqueous alkali solution, and are not particularly limited.
  • a carboxyl group-containing resin obtained by copolymerizing an unsaturated carboxylic acid such as (meth) acrylic acid with an unsaturated group-containing compound such as styrene, ⁇ -methylstyrene, lower alkyl (meth) acrylate, and isobutylene.
  • (Meta) acrylate of bifunctional epoxy resin such as hydrogenated bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, bixylenol type epoxy resin, biphenol type epoxy resin or its partial acid anhydride modified product ,
  • a compound having one hydroxyl group and one or more (meth) acryloyl groups in a molecule such as a carboxyl group-containing urethane resin or a hydroxyalkyl (meth) acrylate by a double addition reaction of a carboxyl group-containing dialcohol compound and a diol compound is added.
  • alkali-soluble resins include Dianal NR series (manufactured by Mitsubishi Rayon), Viscort R-264, KS resist 106 (manufactured by Osaka Organic Chemical Industry Co., Ltd.), Ebeclyl3800 (manufactured by Daicel UCB), and Acrycure RD- Examples thereof include F8 (manufactured by Nippon Catalyst Co., Ltd.) and Foret ZAH-110 (manufactured by Soken Kagaku Co., Ltd.).
  • (E) Pigment As the pigment, either an inorganic pigment or an organic pigment can be used.
  • carbon black (CI pigment black 7) such as furnace black, lamp black, acetylene black, and channel black, iron oxide, and titanium oxide can be used.
  • organic pigments include azo pigments such as insoluble azo pigments, condensed azo pigments, azolakes and chelate azo pigments, phthalocyanine pigments, perylene and perinone pigments, anthraquinone pigments, quinacridone pigments, dioxane pigments, thioindigo pigments, isoindolinone pigments and quinophthalone pigments.
  • Polycyclic pigments for example, basic dye type chelate, acidic dye type chelate, etc.
  • dyeing lake basic dye type lake, acidic dye type lake
  • nitro pigment nitroso pigment
  • aniline black daylight Fluorescent pigments
  • the dye is not particularly limited, and acid dyes, direct dyes, reactive dyes, and basic dyes can be used.
  • One type of dye may be used alone, or two or more types may be used in combination.
  • the dispersant for dispersing the pigment is not particularly limited, and examples thereof include a pigment dispersion such as a polymer dispersant.
  • a pigment dispersion such as a polymer dispersant.
  • Specific examples thereof include polyoxyalkylene polyalkylene polyamines, vinyl polymers and copolymers, acrylic polymers and copolymers, polyesters, polyamides, polyimides, polyurethanes, amino polymers, silicon-containing polymers, sulfur-containing polymers, fluorine-containing polymers, and epoxies.
  • resins containing one or more of the main components include resins containing one or more of the main components.
  • the photopolymerizable composition of the present invention may contain a binder polymer such as an acrylic resin, a styrene resin or an epoxy resin.
  • the amount of the photopolymerization initiator composition used is in the range of 0.005% by weight or more and 10% by weight or less, preferably 0.025% by weight, based on the photopolymerizable composition.
  • the above is 5% by weight or less. If it is less than 0.005% by weight, it takes time to photopolymerize the photopolymerizable composition, while if it is added in excess of 10% by weight, the hardness of the cured product obtained by photopolymerization decreases and it is cured. It is not preferable because it deteriorates the physical properties of the object.
  • the photopolymerizable composition of the present invention contains a diluent, an organic or inorganic filler, a leveling agent, a surfactant, a defoaming agent, and a thickener, as long as the effects of the present invention are not impaired. , Flame retardants, surface modifiers, penetration promoters, moisturizers, fixers, fungicides, preservatives, antioxidants, UV absorbers, chelating agents, pH adjusters, stabilizers, lubricants, plasticizers, etc. Various resin additives may be blended.
  • a cured product can be obtained by irradiating the photopolymerizable composition of the present invention with light and polymerizing the composition.
  • the photopolymerizable composition can be molded into a film and photocured, or can be molded into a lump and photocured.
  • the liquid photopolymerizable composition is applied to a substrate such as a polyester film using a bar coater or the like so as to have a film thickness of 5 to 300 microns.
  • a thinner film thickness or a thicker film thickness by a spin coating method or a screen printing method.
  • the cured product is obtained by irradiating the coating film composed of the photopolymerizable composition thus prepared with energy rays (ultraviolet rays) containing a wavelength range of 300 nm to 500 nm at an intensity of about 1 to 1000 mW / cm 2 .
  • energy rays ultraviolet rays
  • the light sources used are high-pressure mercury lamps, ultra-high pressure mercury lamps, metal halide lamps, xenon lamps, gallium-doped lamps, black lights, 405 nm ultraviolet LEDs, 395 nm ultraviolet LEDs, 385 nm ultraviolet LEDs, 365 nm ultraviolet LEDs, semiconductor lasers, blue LEDs, and white. Examples include LEDs, D-valves manufactured by Fusion, and V-valves.
  • natural light such as sunlight.
  • it is characterized by having a sensitizing effect even with light having a wavelength range of a long wavelength range such as 365 nm to 405 nm, such as a 405 nm ultraviolet LED, a 395 nm ultraviolet LED, a 385 nm ultraviolet LED, a 375 nm ultraviolet LED, and a 365 nm ultraviolet LED.
  • An ultraviolet LED or a semiconductor laser having a central wavelength of 365 nm, 375 nm, 385 nm, 395 nm, and 405 nm is preferable as the irradiation source.
  • a cured product can be obtained by irradiating the photopolymerizable composition of the present invention with light to polymerize it, but since it is rapidly cured by light irradiation, a coating agent can be obtained from the viewpoint of quick curing and low VOC. It can be applied to paints, printing inks, photosensitive printing plates, adhesives, various photoresists, and the like. Further, the cured product of the present invention can suppress the weight loss of the cured product even when so-called post-baking is performed for the purpose of enhancing the adhesion to the substrate.
  • the temperature when the weight of the cured product before heating is reduced by 5% is 200 ° C. or higher, preferably 230 ° C. or higher, more preferably. Is 250 ° C. or higher.
  • Photo-curing measuring device As a method for determining photocuring, a Photo-Rheometer MCR102 manufactured by Anton Pearl Co., Ltd. was used to measure the complex viscosity. It can be confirmed that the complex viscosity increases as the photocuring reaction proceeds.
  • IR Infrared
  • NMR Nuclear Magnetic Resonance Device
  • Example 1 50 parts by weight of FA-310M (manufactured by Hitachi Chemical Co., Ltd.) and 50 parts by weight of FA-321M as an ethylenically unsaturated group-containing polymerizable compound, and 10 parts by weight of hydroxyethyl methacrylate (HEMA) as an alkali-soluble photopolymerizable compound are mixed. Then, 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetraphenyl-1,2'-biimidazole (HABI) (manufactured by Tokyo Kasei Co., Ltd.) was used as a photopolymerization initiator.
  • HEMA hydroxyethyl methacrylate
  • LCV Leuco Crystal Violet
  • ECP-A 9,10-bis (alkoxycarbonylmethyleneoxy) anthracene synthesized in the same manner as in Example 2 of raw material synthesis was added.
  • a photopolymerizable composition was obtained by adding 0.0 parts by weight.
  • Example 1 910-bis (isopropoxycarbonylmethyleneoxy) anthracene (ECP-A) was not added, and the procedure was the same as in Example 1. As a result, the 5% weight loss temperature of the obtained cured product was measured and found to be 118 ° C. The results are shown in Table 1. The TG graph is shown in FIG. 1 (dotted line).
  • Example 2 50 parts by weight of FA-310M (manufactured by Hitachi Chemical Co., Ltd.) and 50 parts by weight of FA-321M as an ethylenically unsaturated group-containing polymerizable compound, and 10 parts by weight of hydroxyethyl methacrylate (HEMA) as an alkali-soluble photopolymerizable compound are mixed. Then, 0.5 part by weight of Irgacure OXE03 (manufactured by BASF) was added as a photopolymerization initiator.
  • HEMA hydroxyethyl methacrylate
  • Example 2 910-bis (ethoxycarbonylmethyleneoxy) anthracene (ECM-A) was not added, and the procedure was the same as in Example 2. As a result, the 5% weight loss temperature of the obtained cured product was measured and found to be 143 ° C. The results are shown in Table 2.
  • Example 3 50 parts by weight of FA-310M (manufactured by Hitachi Chemical Co., Ltd.) and 50 parts by weight of FA-321M as an ethylenically unsaturated group-containing polymerizable compound, and follet ZAH-110 (manufactured by Soken Kagaku Co., Ltd., acid value:) which is an alkali-soluble resin.
  • 100 mgKOH / g, weight average molecular weight: about 15,000, components: methacrylic ester copolymer, solvent 1-methoxy-2-propyl acetate) 10 parts by weight were mixed and 2,2'-bis as a photopolymerization initiator.
  • Example 3 910-bis (propoxycarbonylmethyleneoxy) anthracene (ECP-A) was not added, and the procedure was the same as in Example 1. As a result, the 5% weight loss temperature of the obtained cured product was measured and found to be 178 ° C. The results are shown in Table 3.
  • Example 4 A propylene glycol monomethyl ether acetate solution containing 50 parts by weight of FA-310M (manufactured by Hitachi Chemical Co., Ltd.) and 50 parts by weight of FA-321M as an ethylenically unsaturated group-containing polymerizable compound and 20% by weight of carbon black as a pigment was prepared. 1.2 parts were added. To this, 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetraphenyl-1,2'-biimidazole (HABI) (manufactured by Tokyo Kasei Co., Ltd.) was added as a photopolymerization initiator.
  • HABI 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetraphenyl-1,2'-biimidazole
  • LCV Leuco Crystal Violet
  • ECM-A 9,10-bis (ethoxycarbonylmethyleneoxy) anthracene synthesized in the same manner as in Example 1 of Raw Material Synthesis as a 9,10-bis (alkoxycarbonylmethyleneoxy) anthracene compound having an ester group is 0.
  • a photopolymerizable composition was obtained by adding 6 parts by weight. This was dropped onto quartz glass on a rheometer, sandwiched between parallel plates having a thickness of 100 ⁇ m and a diameter of 10 mm, and the photopolymerizable composition unnecessary for viscosity measurement was wiped off.
  • the UV-LED was irradiated with light having a wavelength of 405 nm. At this time, the time when the complex viscosity reached 30,000 Pa ⁇ s was 980 seconds. The results are shown in Table 4.
  • Example 4 It was carried out as in Example 4 except that 9,10-bis (ethoxycarbonylmethyleneoxy) anthracene (ECM-A) was not added in Example 4. As a result, the time when the complex viscosity reached 30,000 Pa ⁇ s was 1810 seconds. The results are shown in Table 4.
  • Example 5 The procedure was carried out as in Example 4 except that no pigment was added and 9,10-bis (ethoxycarbonylmethyleneoxy) anthracene (ECM-A) was not added in Example 4. As a result, the time when the complex viscosity reached 30,000 Pa ⁇ s was 1170 seconds. The results are shown in Table 4.
  • Comparing Example 1 and Comparative Example 1 curing obtained by polymerizing and curing a photopolymerizable composition containing a methacrylate having a hydroxy group as an alkali-soluble photopolymerizable compound and a biimidazole-based photopolymerization initiator by light irradiation.
  • a photopolymerizable composition containing a methacrylate having a hydroxy group as an alkali-soluble photopolymerizable compound and a biimidazole-based photopolymerization initiator by light irradiation.
  • the 9,10-bis (alkoxycarbonylmethyleneoxy) anthracene compound having an ester group of the present invention was not added, the 5% polymerization reduction temperature was 118 ° C., which was extremely low, and there were many VOC components. It is suggested that it is the remaining cured product.
  • Example 2 a photopolymerizable composition containing a methacrylate having a hydroxy group as an alkali-soluble photopolymerizable compound and an oxime ester-based photopolymerization initiator was polymerized and cured by light irradiation. Even in the obtained cured product, when the 9,10-bis (alkoxycarbonylmethyleneoxy) anthracene compound having an ester group of the present invention was not added, the 5% polymerization reduction temperature was 143 ° C. It is suggested that the product is a cured product in which a large amount of the VOC component remains.
  • the 5% polymerization reduction temperature is 202 ° C. and 200 ° C. or higher, and the cured product has a small VOC component. It is suggested that.
  • Example 3 when an alkali-soluble resin is used as the alkali-soluble photopolymerizable compound, a photopolymerizable composition containing a biimidazole-based photopolymerization initiator is irradiated with light.
  • the 5% polymerization reduction temperature is 178 ° C., which is extremely high. It is suggested that it is a cured product that is low and has a large amount of VOC components remaining.
  • Comparative Example 4 and Comparative Example 5 when Comparative Example 4 and Comparative Example 5 are compared, when carbon black, which is a black pigment, is added, when light is irradiated, a part of the light irradiated in the photopolymerizable composition is due to the black pigment. It can be seen that the time for the complex viscosity of the polymerizable composition to reach 30,000 Pa ⁇ S is increasing because the amount of light absorbed and reaching the photopolymerization initiator is reduced, that is, the polymerization rate is slowed down.
  • the evaluation result of migration resistance will be described.
  • the photopolymerizable composition containing the photopolymerizable sensitizer is formed into a thin film. Create a product coated on an object, cover it with a polyethylene film, store it at a constant temperature (26 ° C) for a certain period of time, then peel off the polyethylene film and check whether the photopolymerization sensitizer has transferred to the polyethylene film. , The migration resistance was judged.
  • the peeled polyethylene film is dried after washing the surface composition with acetone, the UV spectrum of the polyethylene film is measured, and the migration resistance is measured by examining the increase in absorption intensity due to the photopolymerization sensitizer. did.
  • An ultraviolet-visible spectrophotometer manufactured by Shimadzu Corporation, model: UV2600 was used for the measurement.
  • the obtained absorbance was converted into the absorbance value of 9,10-dibutoxyanthracene.
  • the absorbance of the compound of the present invention and 9,10-dibutoxyanthracene at 260 nm was measured with an ultraviolet / visible spectrophotometer, the molar extinction coefficient of each was calculated from the absorbance value and the molar concentration, and the ratio was calculated.
  • the absorbance value and the molar concentration were measured with an ultraviolet / visible spectrophotometer.
  • a low-density polyethylene film (thickness: 30 microns) was covered on the obtained coating material to prepare one that was stored in a dark place for one day and one that was stored for seven days, and after each storage, the covered polyethylene film was applied. After peeling, washing the polyethylene film with acetone and drying, the UV spectrum of the polyethylene film was measured and the absorbance at 260 nm was measured, but the absorption due to 9,10-bis (ethoxycarbonylmethoxy) anthracene was one day. It was 0.014 after storage and 0.015 after storage for 7 days.
  • Example 1 The test was carried out in the same manner as in Example 1 for evaluation of migration resistance except that 9,10-dibutoxyanthracene, which is a known photoradical sensitizer, was used instead of 9,10-bis (ethoxycarbonylmethoxy) anthracene.
  • 9,10-dibutoxyanthracene which is a known photoradical sensitizer
  • 9,10-bis (ethoxycarbonylmethoxy) anthracene As a result of measuring the absorbance at 260 nm of the polyethylene film washed with acetone, the absorbance of the obtained 9,10-dibutoxyanthracene was 1.661 after storage for one day and 1.741 after seven days.
  • Table 5 summarizes the results of migration resistance evaluation Examples 1 and 2 and migration resistance evaluation Comparative Example 1.
  • the photoradical polymerizable composition containing a 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group represented by the general formula (1) is a photoradical polymerization initiator having a remarkable effect of oxygen inhibition. Even when used, it is an industrially very useful photoradical polymerizable composition that reduces oxygen inhibition on the surface of the coating film and can be cured without problems even in the presence of oxygen.

Abstract

[Problem] To provide a coating composition wherein a photoradical composition using a photoradical polymerization initiator that is markedly affected by oxygen inhibition can be cured without problems even in the presence of oxygen through a reduction in oxygen inhibition on the coating surface. [Solution] A photoradical polymerizable composition characterized by containing at least a radical polymerizable compound, a photoradical polymerization initiator, and a 9,10-bis(alkoxycarbonylalkyleneoxy)anthracene compound having an ester group and represented by general formula (1). (In general formula (1), A represents a C1-20 alkylene group that may be branched by an alkyl group, and R represents a C1-20 alkyl group.)

Description

光重合性組成物及び該光重合性組成物を含有する塗膜並びにその硬化方法Photopolymerizable composition, coating film containing the photopolymerizable composition, and curing method thereof
本発明は、光重合性組成物及び該光重合性組成物を含有する塗膜並びにその硬化方法に関し、特に長波長域の紫外線で硬化する光重合性組成物及び該光重合性組成物を含有する塗膜並びにその硬化方法に関する。 The present invention relates to a photopolymerizable composition, a coating film containing the photopolymerizable composition, and a curing method thereof, and particularly contains a photopolymerizable composition and the photopolymerizable composition which are cured by ultraviolet rays in a long wavelength range. The coating film to be polymerized and the curing method thereof.
重合性組成物は様々な産業分野で利用されており、中でも光重合性組成物は、その硬化速度の速さ、形成される化学結合の耐久性、経済性などの点で優れており適用範囲が広く、コーティング材、接着剤、封止材、粘着剤、塗料、インク、レジスト、歯科材料、レンズ、成型材料等の各種用途で用いられている。 Polymerizable compositions are used in various industrial fields, and among them, photopolymerizable compositions are excellent in terms of speed of curing, durability of chemical bonds formed, economic efficiency, etc., and are applicable. It is widely used in various applications such as coating materials, adhesives, sealing materials, adhesives, paints, inks, resists, dental materials, lenses, and molding materials.
特に、プリント配線板の製造技術において、エッチングやメッキ処理に用いられるレジスト材料として、光重合性組成物が広く用いられている。該用途では、光重合性組成物を銅基板等の回路形成用基板上に積層し、紫外線などのエネルギー線を照射し、所定部分の光重合性組成物を硬化せしめ、次いで光重合性組成物の硬化されていない部分を除去することにより基板上にレジストパターンを形成させている。近年、液晶や有機ELディスプレイ、タッチパネル等の表示装置や照明装置において、光重合性組成物を使用するフォトリソグラフィーによって、任意の場所に任意の形状のパターン化された硬化塗膜を形成する工程を用いる場合が多くみられる。そして、そのような用途では、微細なパターンを高速で形成することが求められている。 In particular, in the manufacturing technique of a printed wiring board, a photopolymerizable composition is widely used as a resist material used for etching or plating. In this application, the photopolymerizable composition is laminated on a circuit-forming substrate such as a copper substrate, irradiated with energy rays such as ultraviolet rays to cure a predetermined portion of the photopolymerizable composition, and then the photopolymerizable composition. A resist pattern is formed on the substrate by removing the uncured portion of the substrate. In recent years, in display devices such as liquid crystals, organic EL displays, touch panels, and lighting devices, a process of forming a patterned cured coating film having an arbitrary shape at an arbitrary location by photolithography using a photopolymerizable composition has been performed. It is often used. And in such an application, it is required to form a fine pattern at high speed.
光重合性組成物は、通常、重合性化合物と光重合開始剤よりなる。この光重合開始剤に紫外線などのエネルギー線が照射されることにより、光重合開始剤がエネルギーを吸収して励起状態となり、該励起状態の光重合開始剤が分解等して、ラジカルなどの重合開始種を発生し、該開始種により重合性化合物が重合を開始し、硬化することとなる。 The photopolymerizable composition usually comprises a polymerizable compound and a photopolymerization initiator. When the photopolymerization initiator is irradiated with energy rays such as ultraviolet rays, the photopolymerization initiator absorbs energy and becomes an excited state, and the photopolymerization initiator in the excited state is decomposed to polymerize radicals and the like. A starting seed is generated, and the polymerizable compound starts polymerization by the starting seed and is cured.
一方、パターンを形成するときに用いられるエネルギー線としては、従来、高圧水銀ランプが用いられていたがその消費エネルギーが大きい等の問題から、ランニングコストが安く、自然環境への影響を小さいLED光源を用いた硬化装置が用いられるようになってきている。しかし、このLED光源は、高圧水銀ランプとは異なり、単一波長の光を照射するため照射エネルギーが弱いという問題もある。そこで、高感度の光重合性組成物が求められている。更に、光重合性組成物中に顔料などが含まれる場合は、照射された光の透過率が低くなり、光重合開始剤に届く光が少なくなり、十分に硬化できないという問題もあり、高感度の光重合性組成物が求められている。 On the other hand, as the energy ray used when forming the pattern, a high-pressure mercury lamp has been conventionally used, but due to problems such as high energy consumption, the running cost is low and the influence on the natural environment is small. A curing device using a light source has come to be used. However, unlike the high-pressure mercury lamp, this LED light source has a problem that the irradiation energy is weak because it irradiates light of a single wavelength. Therefore, a highly sensitive photopolymerizable composition is required. Further, when the photopolymerizable composition contains a pigment or the like, there is a problem that the transmittance of the irradiated light becomes low, the light reaching the photopolymerization initiator is reduced, and the light cannot be sufficiently cured, and the sensitivity is high. The photopolymerizable composition of the above is required.
更に、LED光源としては、その中心波長が、385nm、395nm、405nmというような長波長の光を照射するLED光源が用いられているが、現在用いられている光重合開始剤は、このような長波長域に十分な吸収を持つ化合物が少なく、ジアルコキシアントラセンやチオキサントンというような光重合増感剤が活性化するために用いられている(特許文献1~4)。更にまた、近年の液晶や有機EL用途では、光重合性組成物中に顔料などの着色剤や充填剤あるいは光安定剤や紫外線吸収剤などが含まれていることが多く、十分な光エネルギー量を光重合開始剤に供給することができない場合が多く、その意味でも、高活性な光重合増感剤が求められている。 Further, as the LED light source, an LED light source that irradiates light having a long wavelength such as 385 nm, 395 nm, or 405 nm is used, and the photopolymerization initiator currently used is such. There are few compounds that have sufficient absorption in the long wavelength region, and they are used to activate photopolymerization sensitizers such as dialkoxyanthracene and thioxanthone (Patent Documents 1 to 4). Furthermore, in recent years, in liquid crystal and organic EL applications, the photopolymerizable composition often contains a colorant such as a pigment, a filler, a light stabilizer, an ultraviolet absorber, etc., and a sufficient amount of light energy is used. In many cases, it is not possible to supply the photopolymerization initiator, and in that sense, a highly active photopolymerization sensitizer is required.
しかし、現在用いられているジアルコキシアントラセンやチオキサントンは、光重合反応において着色しやすく、硬化塗膜が黄色に変色するという問題がある。更に、塗膜の硬化時あるいは硬化物の保存中において、光重合増感剤が硬化塗膜表面等にマイグレーションし、粉吹き等の問題が生じていた。 However, the currently used dialkoxyanthracene and thioxanthone have a problem that they are easily colored in the photopolymerization reaction and the cured coating film turns yellow. Further, during the curing of the coating film or during the storage of the cured product, the photopolymerization sensitizer migrates to the surface of the cured coating film or the like, causing problems such as powder blowing.
更に、レジストなどとして用いる場合には、高活性な光重合性組成物であると同時に、その重合硬化した硬化物が、耐熱性に優れていることが求められている。これは後硬化として加温した際に残存モノマーなどのVOC(揮発性有機化合物)が揮発することによる硬化装置を汚染の防止、または最終硬化物の長期安定性の確保に必要不可欠なものである。その耐熱性の指標として、硬化物が熱にさらされた時、重量減少を起こす温度が高いことが求められている(例えば、特許文献5)。 Further, when used as a resist or the like, it is required that the photopolymerizable composition has high activity and at the same time, the cured product obtained by polymerization and curing has excellent heat resistance. This is indispensable for preventing contamination of the curing device due to volatilization of VOCs (volatile organic compounds) such as residual monomers when heated as post-curing, or for ensuring long-term stability of the final cured product. .. As an index of the heat resistance, it is required that the temperature at which the cured product causes weight loss is high when the cured product is exposed to heat (for example, Patent Document 5).
また、環境汚染の防止としても、最終硬化物の残存モノマーなどのVOCの量が少なく、加温した際に揮発するVOCが低減された最終硬化物が、社会的にも強く望まれている。 Further, in order to prevent environmental pollution, there is a strong social demand for a final cured product in which the amount of VOC such as residual monomers of the final cured product is small and the VOC that volatilizes when heated is reduced.
特開平06-059380号公報Japanese Unexamined Patent Publication No. 06-059380 特開平11-279212号公報Japanese Unexamined Patent Publication No. 11-279212 特開平11-140110号公報Japanese Unexamined Patent Publication No. 11-140110 特開2001-106648号公報Japanese Unexamined Patent Publication No. 2001-106648 特許5672403号公報Japanese Patent No. 5672403
本発明は上記のような従来技術の問題点に鑑みて、LED光源のようなエネルギーレベルの低い光源や照射エネルギーが一部遮蔽されたような状況でも十分な速度で硬化が進行し、且つマイグレーションの問題がなく、かつその硬化物の耐熱性の高い光重合性組成物を提供することを目的とするものである。 In view of the above-mentioned problems of the prior art, the present invention cures at a sufficient speed even in a situation where a light source having a low energy level such as an LED light source or irradiation energy is partially shielded, and migration It is an object of the present invention to provide a photopolymerizable composition which does not have the above-mentioned problems and has high heat resistance of the cured product.
本発明者らは、かかる状況に鑑み、これらの欠点を排除した技術を提供すべく鋭意検討した結果、本発明のエステル基を有する9,10-ビス(アルコキシカルボニルアルキレンオキシ)アントラセン化合物を光重合増感剤として含有する光重合性組成物が、LED光源のようなエネルギーレベルの低い光源や照射エネルギーが一部遮蔽されたような状況でも十分な速度で硬化が進行し、残存モノマーなどのVOCの量が少なく、長期安定性の良い硬化物が得られることを見出し、本発明を完成するに至ったものである。 In view of this situation, the present inventors have diligently studied to provide a technique that eliminates these drawbacks, and as a result, photopolymerized the 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having the ester group of the present invention. The photopolymerizable composition contained as a sensitizer is cured at a sufficient speed even in a situation where a light source having a low energy level such as an LED light source or an irradiation energy is partially shielded, and VOC such as residual monomers is produced. We have found that a cured product having a small amount of light and good long-term stability can be obtained, and have completed the present invention.
まず初めに、第一の発明は、少なくとも、下記の(A)~(C)成分を含有する光重合性組成物であって、その硬化物の5%重量減少温度が200℃以上であることを特徴とする、光重合性組成物に存する。
(A)下記一般式(1)で表されるエステル基を有する9,10-ビス(アルコキシカルボニルアルキレンオキシ)アントラセン化合物
(B)エチレン性不飽和基含有重合性化合物。
(C)光重合開始剤。
First of all, the first invention is a photopolymerizable composition containing at least the following components (A) to (C), and the 5% weight loss temperature of the cured product is 200 ° C. or higher. It exists in a photopolymerizable composition characterized by.
(A) A 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group represented by the following general formula (1) (B) An ethylenically unsaturated group-containing polymerizable compound.
(C) Photopolymerization initiator.
Figure JPOXMLDOC01-appb-C000002
Figure JPOXMLDOC01-appb-C000002
一般式(1)において、Aは炭素数1から20のアルキレン基を表し、該アルキレン基はアルキル基によって分岐していてもよい。Rは炭素数1から20のアルキル基を表し、該アルキル基は、アルキル基によって分岐していてもよく、シクロアルキル基でもシクロアルキルアルキル基でもよく、ヒドロキシ基で置換されていてもよく、炭素原子の一部が酸素原子によって置き換わっていてもよい(但し、過酸化物を形成する場合は除く)。X、Yは同一であっても異なってもよく、水素原子、炭素数1から8のアルキル基又はハロゲン原子を表す。 In the general formula (1), A represents an alkylene group having 1 to 20 carbon atoms, and the alkylene group may be branched by an alkyl group. R represents an alkyl group having 1 to 20 carbon atoms, and the alkyl group may be branched by an alkyl group, may be a cycloalkyl group or a cycloalkylalkyl group, may be substituted with a hydroxy group, and may be carbon. Some of the atoms may be replaced by oxygen atoms (except when forming peroxides). X and Y may be the same or different, and represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, or a halogen atom.
第二の発明は、(A)において、上記一般式(1)におけるAがメチレン基である、エステル基を有する9,10-ビス(アルコキシカルボニルメチレンオキシ)アントラセン化合物であることを特徴とする、請求項1に記載の光重合性組成物に存する。 The second invention is characterized in that, in (A), A is a 9,10-bis (alkoxycarbonylmethyleneoxy) anthracene compound having an ester group, wherein A in the general formula (1) is a methylene group. It exists in the photopolymerizable composition according to claim 1.
第三の発明は、第一又は二の発明に記載の光重合性組成物に、更に(D)アルカリ可溶性重合性化合物を含有することを特徴とする、光重合性組成物に存する。 The third invention resides in a photopolymerizable composition, which further comprises (D) an alkali-soluble polymerizable compound in the photopolymerizable composition according to the first or second invention.
第四の発明は、(D)アルカリ可溶性重合性化合物が水酸基を有する化合物である、第三の発明に記載の光重合性組成物に存する。 The fourth invention resides in the photopolymerizable composition according to the third invention, wherein the alkali-soluble polymerizable compound (D) is a compound having a hydroxyl group.
第五の発明は、(D)アルカリ可溶性重合性化合物がカルボキシル基を有する化合物である、第三又は第四の発明に記載の光重合性組成物に存する。 The fifth invention resides in the photopolymerizable composition according to the third or fourth invention, wherein the alkali-soluble polymerizable compound (D) is a compound having a carboxyl group.
第六の発明は、(D)アルカリ可溶性重合性化合物がアルカリ可溶性樹脂である、第三の発明に記載の光重合性組成物に存する。 The sixth invention resides in the photopolymerizable composition according to the third invention, wherein the alkali-soluble polymerizable compound (D) is an alkali-soluble resin.
第七の発明は、第一乃至第六の発明のいずれかひとつに記載の光重合性組成物にさらに(E)顔料を含有することを特徴とする、光重合性組成物に存する。 The seventh invention resides in a photopolymerizable composition, which comprises further containing (E) a pigment in the photopolymerizable composition according to any one of the first to sixth inventions.
第八の発明は、(C)光重合開始剤が、ビイミダゾール系光重合開始剤、アルキルフェノン系光重合開始剤、トリアジン系光重合開始剤、アシルホスフィンオキサイド系光重合開始剤およびオキシム系光重合開始剤からなる群より選ばれる少なくとも1種の光重合開始剤を含有することを特徴とする、第一乃至第七の発明のいずれかひとつに記載の光重合性組成物に存する。 In the eighth invention, the (C) photopolymerization initiator is a biimidazole-based photopolymerization initiator, an alkylphenone-based photopolymerization initiator, a triazine-based photopolymerization initiator, an acylphosphine oxide-based photopolymerization initiator, and an oxime-based light. The photopolymerizable composition according to any one of the first to seventh inventions, which comprises at least one photopolymerization initiator selected from the group consisting of polymerization initiators.
第九の発明は、(C)光重合開始剤が、ビイミダゾール系光重合開始剤である、第一乃至第七の発明のいずれかひとつに記載の光重合性組成物に存する。 The ninth invention exists in the photopolymerizable composition according to any one of the first to seventh inventions, wherein the (C) photopolymerization initiator is a biimidazole-based photopolymerization initiator.
第十の発明は、(C)光重合開始剤が、オキシムエステル系光重合開始剤である、第一乃至第七の発明のいずれかひとつに記載の光重合性組成物に存する。 A tenth invention exists in the photopolymerizable composition according to any one of the first to seventh inventions, wherein the photopolymerization initiator (C) is an oxime ester-based photopolymerization initiator.
第十一の発明は、支持体上に、第一乃至第十の発明のいずれかひとつに記載の光重合性組成物を含む光重合性塗膜を有することを特徴とする、光重合性塗膜組成物に存する。 The eleventh invention is characterized by having a photopolymerizable coating film containing the photopolymerizable composition according to any one of the first to tenth inventions on a support. It resides in the membrane composition.
第十二の発明は、第一乃至第十の発明のいずれかひとつに記載の光重合性組成物を光照射により硬化させた硬化物であり、その5%重量減少温度が200℃以上であることを特徴とする、硬化物に存する。 The twelfth invention is a cured product obtained by curing the photopolymerizable composition according to any one of the first to tenth inventions by light irradiation, and the 5% weight loss temperature thereof is 200 ° C. or higher. It exists in the cured product, which is characterized by the fact that.
第十三の発明は、第一乃至第十の発明のいずれかひとつに記載の光重合性組成物に、300nm~500nmの波長範囲の光を照射することを特徴とする、光重合性組成物の硬化方法に存する。 The thirteenth invention is a photopolymerizable composition, which comprises irradiating the photopolymerizable composition according to any one of the first to tenth inventions with light in a wavelength range of 300 nm to 500 nm. It depends on the curing method of.
第十四の発明は、第十三の発明に記載の照射する光の照射源が、中心波長が365nm、375nm、385nm、395nm、405nmの紫外線LED又は半導体レーザである、光重合性組成物の硬化方法に存する。 The fourteenth invention is a photopolymerizable composition in which the irradiation source of the light to be irradiated according to the thirteenth invention is an ultraviolet LED or a semiconductor laser having a center wavelength of 365 nm, 375 nm, 385 nm, 395 nm, and 405 nm. It depends on the curing method.
本発明の記載において、5%熱重量減少温度とは、光重合性組成物を光照射により重合硬化させた硬化物を、窒素雰囲気下において50℃から加熱を開始して、1分間隔で20℃ずつ加熱温度を上げた場合に、初期重量の5重量%だけ重量が減少したときの温度である。なお、硬化物の重量は、熱重量測定装置で測定することができる。 In the description of the present invention, the 5% thermal weight reduction temperature refers to a cured product obtained by polymerizing and curing a photopolymerizable composition by light irradiation, starting heating at 50 ° C. in a nitrogen atmosphere, and 20 at 1-minute intervals. This is the temperature at which the weight is reduced by 5% by weight of the initial weight when the heating temperature is increased by ° C. The weight of the cured product can be measured with a thermogravimetric measuring device.
本発明の光重合性組成物及び該光重合性組成物を含有する塗膜を用いれば、LED光源のようなエネルギーレベルの低い光源や照射エネルギーが一部遮蔽されたような状況でも十分な速度で硬化が進行し、且つ得られる硬化物は粉吹きやマイグレーションの問題がなく、残存モノマーなどのVOCの量が少ない為にその硬化物の5%重量減少温度が200℃以上となる。 By using the photopolymerizable composition of the present invention and the coating film containing the photopolymerizable composition, the speed is sufficient even in a light source having a low energy level such as an LED light source or in a situation where the irradiation energy is partially shielded. The cured product obtained is free from problems of powder blowing and migration, and the amount of VOC such as residual monomers is small, so that the 5% weight loss temperature of the cured product is 200 ° C. or higher.
本発明の目的、特徴及び利点は、以下の詳細な説明によって、より明白となる。 The objects, features and advantages of the present invention will become more apparent with the following detailed description.
本発明の実施例1(実線)、比較例1(点線)における硬化物の加熱時の重量減少曲線を表したグラフ。縦軸は加熱前の硬化物に対する重量%を示し、横軸は加熱温度を示す。The graph which showed the weight loss curve at the time of heating of the cured product in Example 1 (solid line) and Comparative Example 1 (dotted line) of this invention. The vertical axis shows the weight% of the cured product before heating, and the horizontal axis shows the heating temperature.
(エステル基を有する9,10-ビス(アルコキシカルボニルアルキレンオキシ)アントラセン化合物)
まず初めに、本発明に用いるエステル基を有する9,10-ビス(アルコキシカルボニルアルキレンオキシ)アントラセン化合物について説明する。本発明に用いるエステル基を有する9,10-ビス(アルコキシカルボニルアルキレンオキシ)アントラセン化合物は、下記一般式(1)の化合物である。
(9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group)
First, a 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group used in the present invention will be described. The 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group used in the present invention is a compound of the following general formula (1).
Figure JPOXMLDOC01-appb-C000003
 
Figure JPOXMLDOC01-appb-C000003
 
一般式(1)において、Aは炭素数1から20のアルキレン基を表し、該アルキレン基はアルキル基によって分岐していてもよい。Rは炭素数1から20のアルキル基を表し、該アルキル基は、アルキル基によって分岐していてもよく、シクロアルキル基でもシクロアルキルアルキル基でもよく、ヒドロキシ基で置換されていてもよく、炭素原子の一部が酸素原子によって置き換わっていてもよい(但し、過酸化物を形成する場合は除く)。X、Yは同一であっても異なってもよく、水素原子、炭素数1から8のアルキル基又はハロゲン原子を表す。 In the general formula (1), A represents an alkylene group having 1 to 20 carbon atoms, and the alkylene group may be branched by an alkyl group. R represents an alkyl group having 1 to 20 carbon atoms, and the alkyl group may be branched by an alkyl group, may be a cycloalkyl group or a cycloalkylalkyl group, may be substituted with a hydroxy group, and may be carbon. Some of the atoms may be replaced by oxygen atoms (except when forming peroxides). X and Y may be the same or different, and represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, or a halogen atom.
一般式(1)において、Aで表される炭素数1から20のアルキレン基としては、メチレン基、エチレン基、プロピレン基、ブチレン基、ペンチレン基、ヘキシレン基、ヘプチレン基、オクチレン基、ノニレン基、デシレン基、ウンデシレン基、ドデシレン基、トリデシレン基、テトラデシレン基、ペンタデシレン基、ヘキサデシレン基、ヘプタデシレン基、オクタデシレン基、ノナデシレン基、イコシレン基等が挙げられ、該アルキレン基はアルキル基によって分岐していてもよい。 In the general formula (1), examples of the alkylene group having 1 to 20 carbon atoms represented by A include a methylene group, an ethylene group, a propylene group, a butylene group, a pentylene group, a hexylene group, a heptylene group, an octylene group and a nonylene group. Examples thereof include a decylene group, an undecylene group, a dodecylene group, a tridecylene group, a tetradecylene group, a pentadecylene group, a hexadecylene group, a heptadecylene group, an octadecylene group, a nonadesilene group, an icosilene group, and the alkylene group may be branched by an alkyl group. ..
一般式(1)において、X又はYで表される炭素数1から8のアルキル基としては、メチル基、エチル基、n-プロピル基、i-プロピル基、n-ブチル基、i-ブチル基、n-ペンチル基、i-ペンチル基、n-ヘキシル基、n-ヘプチル基、n-オクチル基又は2-エチルヘキシル基等が挙げられ、ハロゲン原子としては、フッ素原子、塩素原子、臭素原子又はヨウ素原子が挙げられる。 In the general formula (1), the alkyl group having 1 to 8 carbon atoms represented by X or Y includes a methyl group, an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group and an i-butyl group. , N-Pentyl group, i-Pentyl group, n-Hexyl group, n-Heptyl group, n-octyl group, 2-ethylhexyl group and the like, and examples of the halogen atom include fluorine atom, chlorine atom, bromine atom or iodine. Atomic can be mentioned.
一般式(1)において、Rで表される炭素数1から20のアルキル基としては、メチル基、エチル基、n-プロピル基、i-プロピル基、n-ブチル基、i-ブチル基、t-ブチル基、n-ペンチル基、i-ペンチル基、n-ヘキシル基、n-ヘプチル基、n-オクチル基、2-エチルヘキシル基、n-ノニル基、n-デシル基、n-ウンデシル基、n-ドデシル基、n-トリデシル基、n-テトラデシル基、n-ペンタデシル基、n-ヘキサデシル基、n-ヘプタデシル基、n-オクタデシル基、n-ノナデシル基又はn-イコシル基等が挙げられ、該アルキル基がヒドロキシ基で置換されていているものとしては、2-ヒドロキシエチル基、2-ヒドロキシプロピル基、3-ヒドロキシプロピル基、2-ヒドロキシブチル基、3-ヒドロキシブチル基、4-ヒドロキシブチル基、5-ヒドロキシペンチル基、6-ヒドロキシヘキシル基、7-ヒドロキシヘプチル基、8-ヒドロキシオクチル基、6-ヒドロキシ-2-エチルヘキシル基、9-ヒドロキシノニル基、10-ヒドロキシデシル基、11-ヒドロキシウンデシル基、12-ヒドロキシドデシル基、2-ヒドロキシ-3-メトキシプロピル基、2-ヒドロキシ-3-エトキシプロピル基、2-ヒドロキシ-3-プロポキシプロピル基、2-ヒドロキシ-3-ブトキシプロピル基、2-ヒドロキシ-3-ペンチルオキシプロピル基、2-ヒドロキシ-3-ヘキシルオキシプロピル基、2-ヒドロキシ-3-オクチルオキシプロピル基、2-ヒドロキシ-3-(2-エチルヘキシルオキシ)プロピル基、2,3-ジヒドロキシプロピル基、2-ヒドロキシ-3-アリルオキシプロピル基、2-ヒドロキシ-3-メタリルオキシプロピル基等が挙げられる。シクロアルキル基としては、シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基、シクロヘプチル基、シクロオクチル基、ノルボルニル基、アダマンチル基、4-n-ドデシルシクロヘキシル基、デカヒドロナフチル基、ヒドロキシシクロヘキシル基等が挙げられ、シクロアルキルアルキル基としては、シクロプロピルメチル基、シクロブチルメチル基、シクロペンチルメチル基、シクロヘキシルメチル基、シクロヘプチルメチル基、シクロオクチルメチル基、シクロノニルメチル基、シクロデシルメチル基、2-シクロブチルエチル基、2-シクロペンチルエチル基、2-シクロヘキシルエチル基、2-シクロヘプチルエチル基、2-シクロオクチルエチル基、2-シクロノニルエチル基、2-シクロデシルエチル基、3-シクロブチルプロピル基、3-シクロペンチルプロピル基、3-シクロヘキシルプロピル基、3-シクロヘプチルプロピル基、3-シクロオクチルプロピル基、3-シクロノニルプロピル基、3-シクロデシルプロピル基、4-シクロブチルブチル基、4-シクロペンチルブチル基、4-シクロヘキシルブチル基、4-シクロヘプチルブチル基、4-シクロオクチルブチル基、4-シクロノニルブチル基、4-シクロデシルブチル基、3-3-アダマンチルプロピル基、デカハイドロナフチルプロピル基等が挙げられる。 In the general formula (1), the alkyl groups having 1 to 20 carbon atoms represented by R include methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, i-butyl group and t. -Butyl group, n-pentyl group, i-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, 2-ethylhexyl group, n-nonyl group, n-decyl group, n-undecyl group, n -Dodecyl group, n-tridecyl group, n-tetradecyl group, n-pentadecyl group, n-hexadecyl group, n-heptadecyl group, n-octadecyl group, n-nonadecil group, n-icosyl group and the like can be mentioned. Examples of those in which the group is substituted with a hydroxy group include 2-hydroxyethyl group, 2-hydroxypropyl group, 3-hydroxypropyl group, 2-hydroxybutyl group, 3-hydroxybutyl group and 4-hydroxybutyl group. 5-Hydroxypentyl group, 6-hydroxyhexyl group, 7-hydroxyheptyl group, 8-hydroxyoctyl group, 6-hydroxy-2-ethylhexyl group, 9-hydroxynonyl group, 10-hydroxydecyl group, 11-hydroxyundecyl group. Group, 12-hydroxydodecyl group, 2-hydroxy-3-methoxypropyl group, 2-hydroxy-3-ethoxypropyl group, 2-hydroxy-3-propoxypropyl group, 2-hydroxy-3-butoxypropyl group, 2- Hydroxy-3-pentyloxypropyl group, 2-hydroxy-3-hexyloxypropyl group, 2-hydroxy-3-octyloxypropyl group, 2-hydroxy-3- (2-ethylhexyloxy) propyl group, 2,3- Examples thereof include a dihydroxypropyl group, a 2-hydroxy-3-allyloxypropyl group, and a 2-hydroxy-3-metharyloxypropyl group. Examples of the cycloalkyl group include cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, cycloheptyl group, cyclooctyl group, norbornyl group, adamantyl group, 4-n-dodecylcyclohexyl group, decahydronaphthyl group, hydroxycyclohexyl group and the like. Cycloalkylalkyl groups include cyclopropylmethyl group, cyclobutylmethyl group, cyclopentylmethyl group, cyclohexylmethyl group, cycloheptylmethyl group, cyclooctylmethyl group, cyclononylmethyl group, cyclodecylmethyl group, 2 -Cyclobutylethyl group, 2-cyclopentylethyl group, 2-cyclohexylethyl group, 2-cycloheptylethyl group, 2-cyclooctylethyl group, 2-cyclononylethyl group, 2-cyclodecylethyl group, 3-cyclobutyl Propyl group, 3-cyclopentylpropyl group, 3-cyclohexylpropyl group, 3-cycloheptylpropyl group, 3-cyclooctylpropyl group, 3-cyclononylpropyl group, 3-cyclodecylpropyl group, 4-cyclobutylbutyl group, 4-Cyclopentylbutyl group, 4-cyclohexylbutyl group, 4-cycloheptylbutyl group, 4-cyclooctylbutyl group, 4-cyclononylbutyl group, 4-cyclodecylbutyl group, 3-3-adamantylpropyl group, decahydro Examples include a naphthylpropyl group.
本発明の一般式(1)で表されるエステル基を有する9,10-ビス(アルコキシカルボニルアルキレンオキシ)アントラセン化合物の具体例としては、例えば、9,10-ビス(メトキシカルボニルメチレンオキシ)アントラセン、9,10-ビス(エトキシカルボニルメチレンオキシ)アントラセン、9,10-ビス(n-プロポキシカルボニルメチレンオキシ)アントラセン、9,10-ビス(イソプロポキシカルボニルメチレンオキシ)アントラセン、9,10-ビス(tert-ブトキシカルボニルメチレンオキシ)アントラセン、9,10-ビス(n-ブトキシカルボニルメチレンオキシ)アントラセン、9,10-ビス(n-ペンチルオキシカルボニルメチレンオキシ)アントラセン、9,10-ビス(メトキシカルボニルプロピレンオキシ)アントラセン、9,10-ビス(エトキシカルボニルプロピレンオキシ)アントラセン、9,10-ビス(イソプロポキシカルボニルプロピレンオキシ)アントラセン、9,10-ビス(tert-ブトキシカルボニルプロピレンオキシ)アントラセン、9,10-ビス(n-ブトキシカルボニルプロピレンオキシ)アントラセン、9,10-ビス(メトキシカルボニルメチルメチレンオキシ)アントラセン、9,10-ビス(エトキシカルボニルメチルメチレンオキシ)アントラセン、9,10-ビス(エトキシカルボニルエチルメチレンオキシ)アントラセン、9,10-ビス(イソプロポキシカルボニルメチルメチレンオキシ)アントラセン、9,10-ビス(tert-ブトキシカルボニルメチルメチレンオキシ)アントラセン、9,10-ビス(n-ブトキシカルボニルメチルメチレンオキシ)アントラセン、9,10-ビス(メトキシカルボニルブチレンオキシ)アントラセン、9,10-ビス(エトキシカルボニルブチレンオキシ)アントラセン、9,10-ビス(イソプロポキシカルボニルブチレンオキシ)アントラセン、9,10-ビス(tert-ブトキシカルボニルブチレンオキシ)アントラセン、9,10-ビス(n-ブトキシカルボニルブチレンオキシ)アントラセン、9,10-ビス(2-ヒドロキシエトキシカルボニルメチレンオキシ)アントラセン、9,10-ビス(シクロヘキシルオキシカルボニルメチレンオキシ)アントラセン、9,10-ビス(シクロヘキシルメチルオキシカルボニルメチレンオキシ)アントラセン、9,10-ビス(ノルボルニルオキシカルボニルメチレンオキシ)アントラセン等が挙げられる。 Specific examples of the 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group represented by the general formula (1) of the present invention include, for example, 9,10-bis (methoxycarbonylmethyleneoxy) anthracene. 9,10-bis (ethoxycarbonylmethyleneoxy) anthracene, 9,10-bis (n-propoxycarbonylmethyleneoxy) anthracene, 9,10-bis (isopropoxycarbonylmethyleneoxy) anthracene, 9,10-bis (tert-) Butoxycarbonylmethyleneoxy) anthracene, 9,10-bis (n-butoxycarbonylmethyleneoxy) anthracene, 9,10-bis (n-pentyloxycarbonylmethyleneoxy) anthracene, 9,10-bis (methoxycarbonylpropyleneoxy) anthracene , 9,10-bis (ethoxycarbonylpropyleneoxy) anthracene, 9,10-bis (isopropoxycarbonylpropyleneoxy) anthracene, 9,10-bis (tert-butoxycarbonylpropyleneoxy) anthracene, 9,10-bis (n) -Butoxycarbonylpropyleneoxy) anthracene, 9,10-bis (methoxycarbonylmethylmethyleneoxy) anthracene, 9,10-bis (ethoxycarbonylmethylmethyleneoxy) anthracene, 9,10-bis (ethoxycarbonylethylmethyleneoxy) anthracene, 9,10-bis (isopropoxycarbonylmethylmethyleneoxy) anthracene, 9,10-bis (tert-butoxycarbonylmethylmethyleneoxy) anthracene, 9,10-bis (n-butoxycarbonylmethylmethyleneoxy) anthracene, 9,10 -Bis (methoxycarbonylbutyleneoxy) anthracene, 9,10-bis (ethoxycarbonylbutyleneoxy) anthracene, 9,10-bis (isopropoxycarbonylbutyleneoxy) anthracene, 9,10-bis (tert-butoxycarbonylbutyleneoxy) Anthracene, 9,10-bis (n-butoxycarbonylbutyleneoxy) anthracene, 9,10-bis (2-hydroxyethoxycarbonylmethyleneoxy) anthracene, 9,10-bis (cyclohexyloxycarbonylmethyleneoxy) anthracene, 9,10 -Bis (cyclohexylmethyloxycarbonylmethyleneoxy) anthracene, 9, Examples thereof include 10-bis (norbornyloxycarbonylmethyleneoxy) anthracene.
更に、例えば9,10-ビス(メトキシカルボニルペンチレンオキシ)アントラセン、9,10-ビス(エトキシカルボニルペンチレンオキシ)アントラセン、9,10-ビス(イソプロポキシカルボニルペンチレンオキシ)アントラセン、9,10-ビス(tert-ブトキシカルボニルペンチレンオキシ)アントラセン、9,10-ビス(n-ブトキシカルボニルペンチレンオキシ)アントラセン、9,10-ビス(メトキシカルボニルヘキシレンオキシ)アントラセン、9,10-ビス(エトキシカルボニルヘキシレンオキシ)アントラセン、9,10-ビス(イソプロポキシカルボニルヘキシレンオキシ)アントラセン、9,10-ビス(tert-ブトキシカルボニルヘキシレンオキシ)アントラセン、9,10-ビス(n-ブトキシカルボニルヘキシレンオキシ)アントラセン、9,10-ビス(メトキシカルボニルヘプチレンオキシ)アントラセン、9,10-ビス(エトキシカルボニルヘプチレンオキシ)アントラセン、9,10-ビス(イソプロポキシカルボニルヘプチレンオキシ)アントラセン、9,10-ビス(tert-ブトキシカルボニルヘプチレンオキシ)アントラセン、9,10-ビス(n-ブトキシカルボニルヘプチレンオキシ)アントラセン、9,10-ビス(メトキシカルボニルオクチレンオキシ)アントラセン、9,10-ビス(エトキシカルボニルオクチレンオキシ)アントラセン、9,10-ビス(イソプロポキシカルボニルオクチレンオキシ)アントラセン、9,10-ビス(tert-ブトキシカルボニルオクチレンオキシ)アントラセン、9,10-ビス(n-ブトキシカルボニルオクチレンオキシ)アントラセン、9,10-ビス(メトキシカルボニルノニレンオキシ)アントラセン、9,10-ビス(エトキシカルボニルノニレンオキシ)アントラセン、9,10-ビス(イソプロポキシカルボニルノニレンオキシ)アントラセン、9,10-ビス(tert-ブトキシカルボニルノニレンオキシ)アントラセン、9,10-ビス(n-ブトキシカルボニルノニレンオキシ)アントラセン、9,10-ビス(メトキシカルボニルデシレンオキシ)アントラセン、9,10-ビス(エトキシカルボニルデシレンオキシ)アントラセン、9,10-ビス(イソプロポキシカルボニルデシレンオキシ)アントラセン、9,10-ビス(tert-ブトキシカルボニルデシレンオキシ)アントラセン、9,10-ビス(n-ブトキシカルボニルデシレンオキシ)アントラセン、9,10-ビス(メトキシカルボニルウンデシレンオキシ)アントラセン、9,10-ビス(エトキシカルボニルウンデシレンオキシ)アントラセン、9,10-ビス(イソプロポキシカルボニルウンデシレンオキシ)アントラセン、9,10-ビス(tert-ブトキシカルボニルウンデシレンオキシ)アントラセン、9,10-ビス(n-ブトキシカルボニルウンデシレンオキシ)アントラセン、9,10-ビス(メトキシカルボニルドデシレンオキシ)アントラセン、9,10-ビス(エトキシカルボニルドデシレンオキシ)アントラセン、9,10-ビス(イソプロポキシカルボニルドデシレンオキシ)アントラセン、9,10-ビス(tert-ブトキシカルボニルドデシレンオキシ)アントラセン、9,10-ビス(n-ブトキシカルボニルドデシレンオキシ)アントラセン、9,10-ビス(メトキシカルボニルトリデシレンオキシ)アントラセン、9,10-ビス(エトキシカルボニルトリデシレンオキシ)アントラセン、9,10-ビス(イソプロポキシカルボニルトリデシレンオキシ)アントラセン、9,10-ビス(tert-ブトキシカルボニルトリデシレンオキシ)アントラセン、9,10-ビス(n-ブトキシカルボニルトリデシレンオキシ)アントラセン、9,10-ビス(メトキシカルボニルテトラデシレンオキシ)アントラセン、9,10-ビス(エトキシカルボニルテトラデシレンオキシ)アントラセン、9,10-ビス(イソプロポキシカルボニルテトラデシレンオキシ)アントラセン、9,10-ビス(tert-ブトキシカルボニルテトラデシレンオキシ)アントラセン、9,10-ビス(n-ブトキシカルボニルテトラデシレンオキシ)アントラセン、9,10-ビス(メトキシカルボニルペンタデシレンオキシ)アントラセン、9,10-ビス(エトキシカルボニルペンタデシレンオキシ)アントラセン、9,10-ビス(イソプロポキシカルボニルペンタデシレンオキシ)アントラセン、9,10-ビス(tert-ブトキシカルボニルペンタデシレンオキシ)アントラセン、9,10-ビス(n-ブトキシカルボニルペンタデシレンオキシ)アントラセン、9,10-ビス(メトキシカルボニルヘキサデシレンオキシ)アントラセン、9,10-ビス(エトキシカルボニルヘキサデシレンオキシ)アントラセン、9,10-ビス(イソプロポキシカルボニルヘキサデシレンオキシ)アントラセン、9,10-ビス(tert-ブトキシカルボニルヘキサデシレンオキシ)アントラセン、9,10-ビス(n-ブトキシカルボニルヘキサデシレンオキシ)アントラセン、9,10-ビス(メトキシカルボニルヘプタデシレンオキシ)アントラセン、9,10-ビス(エトキシカルボニルヘプタデシレンオキシ)アントラセン、9,10-ビス(イソプロポキシカルボニルヘプタデシレンオキシ)アントラセン、9,10-ビス(tert-ブトキシカルボニルヘプタデシレンオキシ)アントラセン、9,10-ビス(n-ブトキシカルボニルヘプタデシレンオキシ)アントラセン、9,10-ビス(メトキシカルボニルオクタデシレンオキシ)アントラセン、9,10-ビス(エトキシカルボニルオクタデシレンオキシ)アントラセン、9,10-ビス(イソプロポキシカルボニルオクタデシレンオキシ)アントラセン、9,10-ビス(tert-ブトキシカルボニルオクタデシレンオキシ)アントラセン、9,10-ビス(n-ブトキシカルボニルオクタデシレンオキシ)アントラセン、9,10-ビス(メトキシカルボニルノナデシレンオキシ)アントラセン、9,10-ビス(エトキシカルボニルノナデシレンオキシ)アントラセン、9,10-ビス(イソプロポキシカルボニルノナデシレンオキシ)アントラセン、9,10-ビス(tert-ブトキシカルボニルノナデシレンオキシ)アントラセン、9,10-ビス(n-ブトキシカルボニルノナデシレンオキシ)アントラセン、9,10-ビス(メトキシカルボニルイコシレンオキシ)アントラセン、9,10-ビス(エトキシカルボニルイコシレンオキシ)アントラセン、9,10-ビス(イソプロポキシカルボニルイコシレンオキシ)アントラセン、9,10-ビス(tert-ブトキシカルボニルイコシレンオキシ)アントラセン、9,10-ビス(n-ブトキシカルボニルイコシレンオキシ)アントラセン等が挙げられる。 Further, for example, 9,10-bis (methoxycarbonylpentyleneoxy) anthracene, 9,10-bis (ethoxycarbonylpentyleneoxy) anthracene, 9,10-bis (isopropoxycarbonylpentyleneoxy) anthracene, 9,10- Bis (tert-butoxycarbonylpentyleneoxy) anthracene, 9,10-bis (n-butoxycarbonylpentyleneoxy) anthracene, 9,10-bis (methoxycarbonylhexyleneoxy) anthracene, 9,10-bis (ethoxycarbonyl) Hexyleneoxy) anthracene, 9,10-bis (isopropoxycarbonylhexyleneoxy) anthracene, 9,10-bis (tert-butoxycarbonylhexyleneoxy) anthracene, 9,10-bis (n-butoxycarbonylhexyleneoxy) ) Anthracene, 9,10-bis (methoxycarbonylheptyleneoxy) anthracene, 9,10-bis (ethoxycarbonylheptyleneoxy) anthracene, 9,10-bis (isopropoxycarbonylheptyleneoxy) anthracene, 9 , 10-bis (tert-butoxycarbonylheptyleneoxy) anthracene, 9,10-bis (n-butoxycarbonylheptyleneoxy) anthracene, 9,10-bis (methoxycarbonyloctyleneoxy) anthracene, 9,10 -Bis (ethoxycarbonyloctyleneoxy) anthracene, 9,10-bis (isopropoxycarbonyloctyleneoxy) anthracene, 9,10-bis (tert-butoxycarbonyloctyleneoxy) anthracene, 9,10-bis (n-) Butoxycarbonyloctyleneoxy) anthracene, 9,10-bis (methoxycarbonylnonyleneoxy) anthracene, 9,10-bis (ethoxycarbonylnonyleneoxy) anthracene, 9,10-bis (isopropoxycarbonylnonyleneoxy) anthracene , 9,10-bis (tert-butoxycarbonylnonyleneoxy) anthracene, 9,10-bis (n-butoxycarbonylnonyleneoxy) anthracene, 9,10-bis (methoxycarbonyldecyleneoxy) anthracene, 9,10 -Bis (ethoxycarbonyldecyleneoxy) anthracene, 9,10-bis (isopropoxycarbonyldecyleneoxy) anthracene, 9,10-bis (tert-butoxycarbonyldecile) Noxy) anthracene, 9,10-bis (n-butoxycarbonyldecyleneoxy) anthracene, 9,10-bis (methoxycarbonylundesyleneoxy) anthracene, 9,10-bis (ethoxycarbonylundesyleneoxy) anthracene, 9,10- Bis (isopropoxycarbonylundesyleneoxy) anthracene, 9,10-bis (tert-butoxycarbonylundesyleneoxy) anthracene, 9,10-bis (n-butoxycarbonylundesyleneoxy) anthracene, 9,10-bis (methoxycarbonyldodede) Silenoxy) anthracene, 9,10-bis (ethoxycarbonyldodecyleneoxy) anthracene, 9,10-bis (isopropoxycarbonyldodecyleneoxy) anthracene, 9,10-bis (tert-butoxycarbonyldodecyleneoxy) ) Anthracene, 9,10-bis (n-butoxycarbonyldodecyleneoxy) anthracene, 9,10-bis (methoxycarbonyltridecyleneoxy) anthracene, 9,10-bis (ethoxycarbonyltridecyleneoxy) anthracene, 9, 10-bis (isopropoxycarbonyltridecyleneoxy) anthracene, 9,10-bis (tert-butoxycarbonyltridecyleneoxy) anthracene, 9,10-bis (n-butoxycarbonyltridecyleneoxy) anthracene, 9,10-bis (Methoxycarbonyltetradecyleneoxy) anthracene, 9,10-bis (ethoxycarbonyltetradecyleneoxy) anthracene, 9,10-bis (isopropoxycarbonyltetradecyleneoxy) anthracene, 9,10-bis (tert-butoxy) Carbonyltetradecyleneoxy) anthracene, 9,10-bis (n-butoxycarbonyltetradecyleneoxy) anthracene, 9,10-bis (methoxycarbonylpentadecyleneoxy) anthracene, 9,10-bis (ethoxycarbonylpentade) Silenoxy) anthracene, 9,10-bis (isopropoxycarbonylpentadecyleneoxy) anthracene, 9,10-bis (tert-butoxycarbonylpentadesileneoxy) anthracene, 9,10-bis (n-butoxycarbonylpentade) Silenoxy) anthracene, 9,10-bis (methoxycarbonylhexadecyleneoxy) anthracene, 9,10-bis (ethoxycal) Bonylhexadecyleneoxy) anthracene, 9,10-bis (isopropoxycarbonylhexadecileneoxy) anthracene, 9,10-bis (tert-butoxycarbonylhexadecyleneoxy) anthracene, 9,10-bis (n-butoxy) Carbonylhexadecyleneoxy) anthracene, 9,10-bis (methoxycarbonylheptadecyleneoxy) anthracene, 9,10-bis (ethoxycarbonylheptadecyleneoxy) anthracene, 9,10-bis (isopropoxycarbonylheptadecylene) Oxy) anthracene, 9,10-bis (tert-butoxycarbonylheptadecyleneoxy) anthracene, 9,10-bis (n-butoxycarbonylheptadecyleneoxy) anthracene, 9,10-bis (methoxycarbonyloctadecyleneoxy) ) Anthracene, 9,10-bis (ethoxycarbonyloctadecyleneoxy) anthracene, 9,10-bis (isopropoxycarbonyloctadecileneoxy) anthracene, 9,10-bis (tert-butoxycarbonyloctadecileneoxy) anthracene , 9,10-bis (n-butoxycarbonyloctadecileneoxy) anthracene, 9,10-bis (methoxycarbonylnonadecileneoxy) anthracene, 9,10-bis (ethoxycarbonylnonadecileneoxy) anthracene, 9, 10-bis (isopropoxycarbonylnonadecileneoxy) anthracene, 9,10-bis (tert-butoxycarbonylnonadecileneoxy) anthracene, 9,10-bis (n-butoxycarbonylnonadecileneoxy) anthracene, 9, 10-bis (methoxycarbonyl icosileneoxy) anthracene, 9,10-bis (ethoxycarbonyl icosileneoxy) anthracene, 9,10-bis (isopropoxycarbonyl icosileneoxy) anthracene, 9,10-bis (tert-butoxy) Examples thereof include carbonyl icosileneoxy) anthracene and 9,10-bis (n-butoxycarbonyl icosileneoxy) anthracene.
また、X及び/又はYがアルキル基の具体例としては、例えば、2-エチル-9,10-ビス(メトキシカルボニルメチレンオキシ)アントラセン、2-エチル-9,10-ビス(エトキシカルボニルメチレンオキシ)アントラセン、2-エチル-9,10-ビス(n-プロポキシカルボニルメチレンオキシ)アントラセン、2-エチル-9,10-ビス(イソプロポキシカルボニルメチレンオキシ)アントラセン、2-エチル-9,10-ビス(tert-ブトキシカルボニルメチレンオキシ)アントラセン、2-エチル-9,10-ビス(n-ブトキシカルボニルメチレンオキシ)アントラセン、2-エチル-9,10-ビス(n-ペンチルオキシカルボニルメチレンオキシ)アントラセン、2-エチル-9,10-ビス(メトキシカルボニルプロピレンオキシ)アントラセン、2-エチル-9,10-ビス(エトキシカルボニルプロピレンオキシ)アントラセン、2-エチル-9,10-ビス(イソプロポキシカルボニルプロピレンオキシ)アントラセン、2-エチル-9,10-ビス(tert-ブトキシカルボニルプロピレンオキシ)アントラセン、2-エチル-9,10-ビス(n-ブトキシカルボニルプロピレンオキシ)アントラセン、2-エチル-9,10-ビス(メトキシカルボニルメチルメチレンオキシ)アントラセン、2-エチル-9,10-ビス(エトキシカルボニルメチルメチレンオキシ)アントラセン、2-エチル-9,10-ビス(エトキシカルボニルエチルメチレンオキシ)アントラセン、2-エチル-9,10-ビス(イソプロポキシカルボニルメチルメチレンオキシ)アントラセン、2-エチル-9,10-ビス(tert-ブトキシカルボニルメチルメチレンオキシ)アントラセン、2-エチル-9,10-ビス(n-ブトキシカルボニルメチルメチレンオキシ)アントラセン、2-エチル-9,10-ビス(メトキシカルボニルブチレンオキシ)アントラセン、2-エチル-9,10-ビス(エトキシカルボニルブチレンオキシ)アントラセン、2-エチル-9,10-ビス(イソプロポキシカルボニルブチレンオキシ)アントラセン、2-エチル-9,10-ビス(tert-ブトキシカルボニルブチレンオキシ)アントラセン、2-エチル-9,10-ビス(n-ブトキシカルボニルブチレンオキシ)アントラセン、2-エチル-9,10-ビス(メトキシカルボニルオクチレンオキシ)アントラセン、2-エチル-9,10-ビス(エトキシカルボニルオクチレンオキシ)アントラセン、2-エチル-9,10-ビス(イソプロポキシカルボニルオクチレンオキシ)アントラセン、2-エチル-9,10-ビス(tert-ブトキシカルボニルオクチレンオキシ)アントラセン、2-エチル-9,10-ビス(n-ブトキシカルボニルオクチレンオキシ)アントラセン、2-エチル-9,10-ビス(メトキシカルボニルヘキサデシレンオキシ)アントラセン、2-エチル-9,10-ビス(エトキシカルボニルヘキサデシレンオキシ)アントラセン、2-エチル-9,10-ビス(イソプロポキシカルボニルヘキサデシレンオキシ)アントラセン、2-エチル-9,10-ビス(tert-ブトキシカルボニルヘキサデシレンオキシ)アントラセン、2-エチル-9,10-ビス(n-ブトキシカルボニルヘキサデシレンオキシ)アントラセン、2-エチル-9,10-ビス(メトキシカルボニルイコシレンオキシ)アントラセン、2-エチル-9,10-ビス(エトキシカルボニルイコシレンオキシ)アントラセン、2-エチル-9,10-ビス(イソプロポキシカルボニルイコシレンオキシ)アントラセン、2-エチル-9,10-ビス(tert-ブトキシカルボニルイコシレンオキシ)アントラセン、2-エチル-9,10-ビス(n-ブトキシカルボニルイコシレンオキシ)アントラセン、2-エチル-9,10-ビス(2-ヒドロキシエトキシカルボニルメチレンオキシ)アントラセン、2-エチル-9,10-ビス(シクロヘキシルオキシカルボニルメチレンオキシ)アントラセン、2-エチル-9,10-ビス(シクロヘキシルメチルオキシカルボニルメチレンオキシ)アントラセン、2-エチル-9,10-ビス(ノルボルニルオキシカルボニルメチレンオキシ)アントラセン等が挙げられる。 Specific examples of alkyl groups in which X and / or Y are alkyl groups include, for example, 2-ethyl-9,10-bis (methoxycarbonylmethyleneoxy) anthracene and 2-ethyl-9,10-bis (ethoxycarbonylmethyleneoxy). Anthracene, 2-ethyl-9,10-bis (n-propoxycarbonylmethyleneoxy) anthracene, 2-ethyl-9,10-bis (isopropoxycarbonylmethyleneoxy) anthracene, 2-ethyl-9,10-bis (tert) -Butoxycarbonylmethyleneoxy) anthracene, 2-ethyl-9,10-bis (n-butoxycarbonylmethyleneoxy) anthracene, 2-ethyl-9,10-bis (n-pentyloxycarbonylmethyleneoxy) anthracene, 2-ethyl -9,10-bis (methoxycarbonylpropyleneoxy) anthracene, 2-ethyl-9,10-bis (ethoxycarbonylpropyleneoxy) anthracene, 2-ethyl-9,10-bis (isopropoxycarbonylpropyleneoxy) anthracene, 2 -Ethyl-9,10-bis (tert-butoxycarbonylpropyleneoxy) anthracene, 2-ethyl-9,10-bis (n-butoxycarbonylpropyleneoxy) anthracene, 2-ethyl-9,10-bis (methoxycarbonylmethyl) Methyleneoxy) anthracene, 2-ethyl-9,10-bis (ethoxycarbonylmethylmethyleneoxy) anthracene, 2-ethyl-9,10-bis (ethoxycarbonylethylmethyleneoxy) anthracene, 2-ethyl-9,10-bis (Isopropoxycarbonylmethylmethyleneoxy) anthracene, 2-ethyl-9,10-bis (tert-butoxycarbonylmethylmethyleneoxy) anthracene, 2-ethyl-9,10-bis (n-butoxycarbonylmethylmethyleneoxy) anthracene, 2-Ethyl-9,10-bis (methoxycarbonylbutyleneoxy) anthracene, 2-ethyl-9,10-bis (ethoxycarbonylbutyleneoxy) anthracene, 2-ethyl-9,10-bis (isopropoxycarbonylbutyleneoxy) Anthracene, 2-ethyl-9,10-bis (tert-butoxycarbonylbutyleneoxy) anthracene, 2-ethyl-9,10-bis (n-butoxycarbonylbutyleneoxy) anthracene, 2-ethyl-9,10-bis ( Methoxycarbonyl octi Renoxy) anthracene, 2-ethyl-9,10-bis (ethoxycarbonyloctyleneoxy) anthracene, 2-ethyl-9,10-bis (isopropoxycarbonyloctyleneoxy) anthracene, 2-ethyl-9,10-bis (Tert-Butoxycarbonyloctyleneoxy) anthracene, 2-ethyl-9,10-bis (n-butoxycarbonyloctyleneoxy) anthracene, 2-ethyl-9,10-bis (methoxycarbonylhexadecyleneoxy) anthracene, 2-Ethyl-9,10-bis (ethoxycarbonylhexadecyleneoxy) anthracene, 2-ethyl-9,10-bis (isopropoxycarbonylhexadecyleneoxy) anthracene, 2-ethyl-9,10-bis (tert) -Butoxycarbonylhexadecyleneoxy) anthracene, 2-ethyl-9,10-bis (n-butoxycarbonylhexadecyleneoxy) anthracene, 2-ethyl-9,10-bis (methoxycarbonylicosileneoxy) anthracene, 2 -Ethyl-9,10-bis (ethoxycarbonyl icosileneoxy) anthracene, 2-ethyl-9,10-bis (isopropoxycarbonyl icosileneoxy) anthracene, 2-ethyl-9,10-bis (tert-butoxycarbonyl) Icosyleneoxy) anthracene, 2-ethyl-9,10-bis (n-butoxycarbonyl icosileneoxy) anthracene, 2-ethyl-9,10-bis (2-hydroxyethoxycarbonylmethyleneoxy) anthracene, 2-ethyl- 9,10-bis (cyclohexyloxycarbonylmethyleneoxy) anthracene, 2-ethyl-9,10-bis (cyclohexylmethyloxycarbonylmethyleneoxy) anthracene, 2-ethyl-9,10-bis (norbornyloxycarbonylmethyleneoxy) ) Anthracen and the like.
更に、例えば、2-アミル-9,10-ビス(メトキシカルボニルメチレンオキシ)アントラセン、2-アミル-9,10-ビス(エトキシカルボニルメチレンオキシ)アントラセン、2-アミル-9,10-ビス(n-プロポキシカルボニルメチレンオキシ)アントラセン、2-アミル-9,10-ビス(イソプロポキシカルボニルメチレンオキシ)アントラセン、2-アミル-9,10-ビス(tert-ブトキシカルボニルメチレンオキシ)アントラセン、2-アミル-9,10-ビス(n-ブトキシカルボニルメチレンオキシ)アントラセン、2-アミル-9,10-ビス(n-ペンチルオキシカルボニルメチレンオキシ)アントラセン、2-アミル-9,10-ビス(メトキシカルボニルプロピレンオキシ)アントラセン、2-アミル-9,10-ビス(エトキシカルボニルプロピレンオキシ)アントラセン、2-アミル-9,10-ビス(イソプロポキシカルボニルプロピレンオキシ)アントラセン、2-アミル-9,10-ビス(tert-ブトキシカルボニルプロピレンオキシ)アントラセン、2-アミル-9,10-ビス(n-ブトキシカルボニルプロピレンオキシ)アントラセン、2-アミル-9,10-ビス(メトキシカルボニルメチルメチレンオキシ)アントラセン、2-アミル-9,10-ビス(エトキシカルボニルメチルメチレンオキシ)アントラセン、2-アミル-9,10-ビス(エトキシカルボニルエチルメチレンオキシ)アントラセン、2-アミル-9,10-ビス(イソプロポキシカルボニルメチルメチレンオキシ)アントラセン、2-アミル-9,10-ビス(tert-ブトキシカルボニルメチルメチレンオキシ)アントラセン、2-アミル-9,10-ビス(n-ブトキシカルボニルメチルメチレンオキシ)アントラセン、2-アミル-9,10-ビス(メトキシカルボニルブチレンオキシ)アントラセン、2-アミル-9,10-ビス(エトキシカルボニルブチレンオキシ)アントラセン、2-アミル-9,10-ビス(イソプロポキシカルボニルブチレンオキシ)アントラセン、2-アミル-9,10-ビス(tert-ブトキシカルボニルブチレンオキシ)アントラセン、2-アミル-9,10-ビス(n-ブトキシカルボニルブチレンオキシ)アントラセン、2-アミル-9,10-ビス(2-ヒドロキシエトキシカルボニルメチレンオキシ)アントラセン、2-アミル-9,10-ビス(シクロヘキシルオキシカルボニルメチレンオキシ)アントラセン、2-アミル-9,10-ビス(シクロヘキシルメチルオキシカルボニルメチレンオキシ)アントラセン、2-アミル-9,10-ビス(ノルボルニルオキシカルボニルメチレンオキシ)アントラセン等が挙げられる。 Further, for example, 2-amyl-9,10-bis (methoxycarbonylmethyleneoxy) anthracene, 2-amyl-9,10-bis (ethoxycarbonylmethyleneoxy) anthracene, 2-amyl-9,10-bis (n-). Propoxycarbonylmethyleneoxy) anthracene, 2-amyl-9,10-bis (isopropoxycarbonylmethyleneoxy) anthracene, 2-amyl-9,10-bis (tert-butoxycarbonylmethyleneoxy) anthracene, 2-amyl-9, 10-bis (n-butoxycarbonylmethyleneoxy) anthracene, 2-amyl-9,10-bis (n-pentyloxycarbonylmethyleneoxy) anthracene, 2-amyl-9,10-bis (methoxycarbonylpropyleneoxy) anthracene, 2-Amil-9,10-bis (ethoxycarbonylpropyleneoxy) anthracene, 2-amyl-9,10-bis (isopropoxycarbonylpropyleneoxy) anthracene, 2-amyl-9,10-bis (tert-butoxycarbonylpropylene) Oxy) anthracene, 2-amyl-9,10-bis (n-butoxycarbonylpropyleneoxy) anthracene, 2-amyl-9,10-bis (methoxycarbonylmethylmethyleneoxy) anthracene, 2-amyl-9,10-bis (Ethoxycarbonylmethylmethyleneoxy) anthracene, 2-amyl-9,10-bis (ethoxycarbonylethylmethyleneoxy) anthracene, 2-amyl-9,10-bis (isopropoxycarbonylmethylmethyleneoxy) anthracene, 2-amyl- 9,10-bis (tert-butoxycarbonylmethylmethyleneoxy) anthracene, 2-amyl-9,10-bis (n-butoxycarbonylmethylmethyleneoxy) anthracene, 2-amyl-9,10-bis (methoxycarbonylbutyleneoxy) ) Anthracene, 2-amyl-9,10-bis (ethoxycarbonylbutyleneoxy) anthracene, 2-amyl-9,10-bis (isopropoxycarbonylbutyleneoxy) anthracene, 2-amyl-9,10-bis (tert-) Butoxycarbonylbutyleneoxy) anthracene, 2-amyl-9,10-bis (n-butoxycarbonylbutyleneoxy) anthracene, 2-amyl-9,10-bis (2-hydroxyethoxycarbonylmethyleneoxy) anthracene, 2-a Mill-9,10-bis (cyclohexyloxycarbonylmethyleneoxy) anthracene, 2-amyl-9,10-bis (cyclohexylmethyloxycarbonylmethyleneoxy) anthracene, 2-amyl-9,10-bis (norbornyloxycarbonyl) Methyleneoxy) anthracene and the like.
また、X及び/又はYがハロゲン原子の具体例としては、例えば、2-クロロ-9,10-ビス(メトキシカルボニルメチレンオキシ)アントラセン、2-クロロ-9,10-ビス(エトキシカルボニルメチレンオキシ)アントラセン、2-クロロ-9,10-ビス(n-プロポキシカルボニルメチレンオキシ)アントラセン、2-クロロ-9,10-ビス(イソプロポキシカルボニルメチレンオキシ)アントラセン、2-クロロ-9,10-ビス(tert-ブトキシカルボニルメチレンオキシ)アントラセン、2-クロロ-9,10-ビス(n-ブトキシカルボニルメチレンオキシ)アントラセン、2-クロロ-9,10-ビス(メトキシカルボニルプロピレンオキシ)アントラセン、2-クロロ-9,10-ビス(エトキシカルボニルプロピレンオキシ)アントラセン、2-クロロ-9,10-ビス(イソプロポキシカルボニルプロピレンオキシ)アントラセン、2-クロロ-9,10-ビス(tert-ブトキシカルボニルプロピレンオキシ)アントラセン、2-クロロ-9,10-ビス(n-ブトキシカルボニルプロピレンオキシ)アントラセン、2-クロロ-9,10-ビス(n-ペンチルオキシカルボニルメチレンオキシ)アントラセン、2-クロロ-9,10-ビス(メトキシカルボニルメチルメチレンオキシ)アントラセン、2-クロロ-9,10-ビス(エトキシカルボニルメチルメチレンオキシ)アントラセン、2-クロロ-9,10-ビス(エトキシカルボニルエチルメチレンオキシ)アントラセン、2-クロロ-9,10-ビス(イソプロポキシカルボニルメチルメチレンオキシ)アントラセン、2-クロロ-9,10-ビス(tert-ブトキシカルボニルメチルメチレンオキシ)アントラセン、2-クロロ-9,10-ビス(n-ブトキシカルボニルメチルメチレンオキシ)アントラセン、2-クロロ-9,10-ビス(メトキシカルボニルブチレンオキシ)アントラセン、2-クロロ-9,10-ビス(エトキシカルボニルブチレンオキシ)アントラセン、2-クロロ-9,10-ビス(イソプロポキシカルボニルブチレンオキシ)アントラセン、2-クロロ-9,10-ビス(tert-ブトキシカルボニルブチレンオキシ)アントラセン、2-クロロ-9,10-ビス(n-ブトキシカルボニルブチレンオキシ)アントラセン、2-クロロ-9,10-ビス(メトキシカルボニルオクチレンオキシ)アントラセン、2-クロロ-9,10-ビス(エトキシカルボニルオクチレンオキシ)アントラセン、2-クロロ-9,10-ビス(イソプロポキシカルボニルオクチレンオキシ)アントラセン、2-クロロ-9,10-ビス(tert-ブトキシカルボニルオクチレンオキシ)アントラセン、2-クロロ-9,10-ビス(n-ブトキシカルボニルオクチレンオキシ)アントラセン、2-クロロ-9,10-ビス(メトキシカルボニルヘキサデシレンオキシ)アントラセン、2-クロロ-9,10-ビス(エトキシカルボニルヘキサデシレンオキシ)アントラセン、2-クロロ-9,10-ビス(イソプロポキシカルボニルヘキサデシレンオキシ)アントラセン、2-クロロ-9,10-ビス(tert-ブトキシカルボニルヘキサデシレンオキシ)アントラセン、2-クロロ-9,10-ビス(n-ブトキシカルボニルヘキサデシレンオキシ)アントラセン、2-クロロ-9,10-ビス(メトキシカルボニルイコシレンオキシ)アントラセン、2-クロロ-9,10-ビス(エトキシカルボニルイコシレンオキシ)アントラセン、2-クロロ-9,10-ビス(イソプロポキシカルボニルイコシレンオキシ)アントラセン、2-クロロ-9,10-ビス(tert-ブトキシカルボニルイコシレンオキシ)アントラセン、2-クロロ-9,10-ビス(n-ブトキシカルボニルイコシレンオキシ)アントラセン、2-クロロ-9,10-ビス(2-ヒドロキシエトキシカルボニルメチレンオキシ)アントラセン、2-クロロ-9,10-ビス(シクロヘキシルオキシカルボニルメチレンオキシ)アントラセン、2-クロロ-9,10-ビス(シクロヘキシルメチルオキシカルボニルメチレンオキシ)アントラセン、2-クロロ-9,10-ビス(ノルボルニルオキシカルボニルメチレンオキシ)アントラセン等が挙げられる。 Specific examples of halogen atoms in which X and / or Y are halogen atoms include, for example, 2-chloro-9,10-bis (methoxycarbonylmethyleneoxy) anthracene and 2-chloro-9,10-bis (ethoxycarbonylmethyleneoxy). Anthracene, 2-chloro-9,10-bis (n-propoxycarbonylmethyleneoxy) anthracene, 2-chloro-9,10-bis (isopropoxycarbonylmethyleneoxy) anthracene, 2-chloro-9,10-bis (tert) -Butoxycarbonylmethyleneoxy) anthracene, 2-chloro-9,10-bis (n-butoxycarbonylmethyleneoxy) anthracene, 2-chloro-9,10-bis (methoxycarbonylpropyleneoxy) anthracene, 2-chloro-9, 10-Bis (ethoxycarbonylpropyleneoxy) anthracene, 2-chloro-9,10-bis (isopropoxycarbonylpropyleneoxy) anthracene, 2-chloro-9,10-bis (tert-butoxycarbonylpropyleneoxy) anthracene, 2- Chloro-9,10-bis (n-butoxycarbonylpropyleneoxy) anthracene, 2-chloro-9,10-bis (n-pentyloxycarbonylmethyleneoxy) anthracene, 2-chloro-9,10-bis (methoxycarbonylmethyl) Methyleneoxy) anthracene, 2-chloro-9,10-bis (ethoxycarbonylmethylmethyleneoxy) anthracene, 2-chloro-9,10-bis (ethoxycarbonylethylmethyleneoxy) anthracene, 2-chloro-9,10-bis (Isopropoxycarbonylmethylmethyleneoxy) anthracene, 2-chloro-9,10-bis (tert-butoxycarbonylmethylmethyleneoxy) anthracene, 2-chloro-9,10-bis (n-butoxycarbonylmethylmethyleneoxy) anthracene, 2-Chloro-9,10-bis (methoxycarbonylbutyleneoxy) anthracene, 2-chloro-9,10-bis (ethoxycarbonylbutyleneoxy) anthracene, 2-chloro-9,10-bis (isopropoxycarbonylbutyleneoxy) Anthracene, 2-chloro-9,10-bis (tert-butoxycarbonylbutyleneoxy) anthracene, 2-chloro-9,10-bis (n-butoxycarbonylbutyleneoxy) anthracene, 2-chloro-9,10-bis ( Methylcarbonylok Tyreneoxy) anthracene, 2-chloro-9,10-bis (ethoxycarbonyloctyleneoxy) anthracene, 2-chloro-9,10-bis (isopropoxycarbonyloctyleneoxy) anthracene, 2-chloro-9,10-bis (Tert-Butyloxycarbonyloctyleneoxy) anthracene, 2-chloro-9,10-bis (n-butoxycarbonyloctyleneoxy) anthracene, 2-chloro-9,10-bis (methoxycarbonylhexadecyleneoxy) anthracene, 2-Chloro-9,10-bis (ethoxycarbonylhexadecyleneoxy) anthracene, 2-chloro-9,10-bis (isopropoxycarbonylhexadecyleneoxy) anthracene, 2-chloro-9,10-bis (tert) -Butoxycarbonylhexadecyleneoxy) anthracene, 2-chloro-9,10-bis (n-butoxycarbonylhexadecyleneoxy) anthracene, 2-chloro-9,10-bis (methoxycarbonylicocileneoxy) anthracene, 2 -Chloro-9,10-bis (ethoxycarbonyl icosileneoxy) anthracene, 2-chloro-9,10-bis (isopropoxycarbonyl icosileneoxy) anthracene, 2-chloro-9,10-bis (tert-butoxycarbonyl) Icosyleneoxy) anthracene, 2-chloro-9,10-bis (n-butoxycarbonyl icosileneoxy) anthracene, 2-chloro-9,10-bis (2-hydroxyethoxycarbonylmethyleneoxy) anthracene, 2-chloro- 9,10-bis (cyclohexyloxycarbonylmethyleneoxy) anthracene, 2-chloro-9,10-bis (cyclohexylmethyloxycarbonylmethyleneoxy) anthracene, 2-chloro-9,10-bis (norbornyloxycarbonylmethyleneoxy) ) Anthracen and the like.
上記挙げた具体例の中でも、製造しやすさから、9,10-ビス(メトキシカルボニルメチレンオキシ)アントラセン、9,10-ビス(エトキシカルボニルメチレンオキシ)アントラセン、9,10-ビス(n-プロポキシカルボニルメチレンオキシ)アントラセン、9,10-ビス(イソプロポキシカルボニルメチレンオキシ)アントラセン、9,10-ビス(tert-ブトキシカルボニルメチレンオキシ)アントラセン、9,10-ビス(n-ブトキシカルボニルメチレンオキシ)アントラセン、9,10-ビス(n-ペンチルオキシカルボニルメチレンオキシ)アントラセン、9,10-ビス(シクロヘキシルオキシカルボニルメチレンオキシ)アントラセン、9,10-ビス(メトキシカルボニルプロピレンオキシ)アントラセン、9,10-ビス(エトキシカルボニルプロピレンオキシ)アントラセン、9,10-ビス(イソプロポキシカルボニルプロピレンオキシ)アントラセン、9,10-ビス(tert-ブトキシカルボニルプロピレンオキシ)アントラセン、9,10-ビス(n-ブトキシカルボニルプロピレンオキシ)アントラセン、9,10-ビス(メトキシカルボニルメチルメチレンオキシ)アントラセン、9,10-ビス(エトキシカルボニルメチルメチレンオキシ)アントラセン、9,10-ビス(エトキシカルボニルエチルメチレンオキシ)アントラセン、9,10-ビス(イソプロポキシカルボニルメチルメチレンオキシ)アントラセン、9,10-ビス(tert-ブトキシカルボニルメチルメチレンオキシ)アントラセン、9,10-ビス(n-ブトキシカルボニルメチルメチレンオキシ)アントラセン、9,10-ビス(メトキシカルボニルブチレンオキシ)アントラセン、9,10-ビス(エトキシカルボニルブチレンオキシ)アントラセン、9,10-ビス(イソプロポキシカルボニルブチレンオキシ)アントラセン、9,10-ビス(tert-ブトキシカルボニルブチレンオキシ)アントラセン、9,10-ビス(n-ブトキシカルボニルブチレンオキシ)アントラセン、9,10-ビス(2-ヒドロキシエトキシカルボニルメチレンオキシ)アントラセン、2-エチル-9,10-ビス(メトキシカルボニルメチレンオキシ)アントラセン、2-エチル-9,10-ビス(エトキシカルボニルメチレンオキシ)アントラセン、2-エチル-9,10-ビス(n-プロポキシカルボニルメチレンオキシ)アントラセン、2-エチル-9,10-ビス(イソプロポキシカルボニルメチレンオキシ)アントラセン、2-エチル-9,10-ビス(tert-ブトキシカルボニルメチレンオキシ)アントラセン、2-エチル-9,10-ビス(n-ブトキシカルボニルメチレンオキシ)アントラセン、2-エチル-9,10-ビス(メトキシカルボニルプロピレンオキシ)アントラセン、2-エチル-9,10-ビス(エトキシカルボニルプロピレンオキシ)アントラセン、2-エチル-9,10-ビス(イソプロポキシカルボニルプロピレンオキシ)アントラセン、2-エチル-9,10-ビス(tert-ブトキシカルボニルプロピレンオキシ)アントラセン、2-エチル-9,10-ビス(n-ブトキシカルボニルプロピレンオキシ)アントラセン、2-エチル-9,10-ビス(メトキシカルボニルメチルメチレンオキシ)アントラセン、2-エチル-9,10-ビス(エトキシカルボニルメチルメチレンオキシ)アントラセン、2-エチル-9,10-ビス(エトキシカルボニルエチルメチレンオキシ)アントラセン、2-エチル-9,10-ビス(イソプロポキシカルボニルメチルメチレンオキシ)アントラセン、2-エチル-9,10-ビス(tert-ブトキシカルボニルメチルメチレンオキシ)アントラセン、2-エチル-9,10-ビス(n-ブトキシカルボニルメチルメチレンオキシ)アントラセン、2-エチル-9,10-ビス(2-ヒドロキシエトキシカルボニルメチレンオキシ)アントラセンが好ましく、下記構造式に挙げた9,10-ビス(メトキシカルボニルメチレンオキシ)アントラセン(1-1)、9,10-ビス(エトキシカルボニルメチレンオキシ)アントラセン(1-2)、9,10-ビス(n-プロポキシカルボニルメチレンオキシ)アントラセン(1-10)、9,10-ビス(イソプロポキシカルボニルメチレンオキシ)アントラセン(1-3)、9,10-ビス(tert-ブトキシカルボニルメチレンオキシ)アントラセン(1-4)、9,10-ビス(n-ブトキシカルボニルメチレンオキシ)アントラセン(1-5)、9,10-ビス(n-ペンチルオキシカルボニルメチレンオキシ)アントラセン(1-11)、9,10-ビス(メトキシカルボニルメチルメチレンオキシ)アントラセン(1-6)、9,10-ビス(エトキシカルボニルプロピレンオキシ)アントラセン(1-7)、9,10-ビス(エトキシカルボニルブチレンオキシ)アントラセン(1-8)、2-エチル-9,10-ビス(イソプロポキシカルボニルメチレンオキシ)アントラセン(1-9)、9,10-ビス(シクロヘキシルオキシカルボニルメチレンオキシ)アントラセン(1-12)が特に好ましい。 Among the specific examples given above, 9,10-bis (methoxycarbonylmethyleneoxy) anthracene, 9,10-bis (ethoxycarbonylmethyleneoxy) anthracene, and 9,10-bis (n-propoxycarbonyl) are considered to be easy to manufacture. Methyleneoxy) anthracene, 9,10-bis (isopropoxycarbonylmethyleneoxy) anthracene, 9,10-bis (tert-butoxycarbonylmethyleneoxy) anthracene, 9,10-bis (n-butoxycarbonylmethyleneoxy) anthracene, 9 , 10-bis (n-pentyloxycarbonylmethyleneoxy) anthracene, 9,10-bis (cyclohexyloxycarbonylmethyleneoxy) anthracene, 9,10-bis (methoxycarbonylpropyleneoxy) anthracene, 9,10-bis (ethoxycarbonyl) Propropyleneoxy) anthracene, 9,10-bis (isopropoxycarbonylpropyleneoxy) anthracene, 9,10-bis (tert-butoxycarbonylpropyleneoxy) anthracene, 9,10-bis (n-butoxycarbonylpropyleneoxy) anthracene, 9 , 10-bis (methoxycarbonylmethylmethyleneoxy) anthracene, 9,10-bis (ethoxycarbonylmethylmethyleneoxy) anthracene, 9,10-bis (ethoxycarbonylethylmethyleneoxy) anthracene, 9,10-bis (isopropoxycarbonyl) Methylmethyleneoxy) anthracene, 9,10-bis (tert-butoxycarbonylmethylmethyleneoxy) anthracene, 9,10-bis (n-butoxycarbonylmethylmethyleneoxy) anthracene, 9,10-bis (methoxycarbonylbutyleneoxy) anthracene , 9,10-bis (ethoxycarbonylbutyleneoxy) anthracene, 9,10-bis (isopropoxycarbonylbutyleneoxy) anthracene, 9,10-bis (tert-butoxycarbonylbutyleneoxy) anthracene, 9,10-bis (n) -Butoxycarbonylbutyleneoxy) anthracene, 9,10-bis (2-hydroxyethoxycarbonylmethyleneoxy) anthracene, 2-ethyl-9,10-bis (methoxycarbonylmethyleneoxy) anthracene, 2-ethyl-9,10-bis (Ethoxycarbonylmethyleneoxy) anthracene, 2-ethyl-9,10-bis (n-pro) Poxycarbonylmethyleneoxy) anthracene, 2-ethyl-9,10-bis (isopropoxycarbonylmethyleneoxy) anthracene, 2-ethyl-9,10-bis (tert-butoxycarbonylmethyleneoxy) anthracene, 2-ethyl-9, 10-Bis (n-butoxycarbonylmethyleneoxy) anthracene, 2-ethyl-9,10-bis (methoxycarbonylpropyleneoxy) anthracene, 2-ethyl-9,10-bis (ethoxycarbonylpropyleneoxy) anthracene, 2-ethyl -9,10-bis (isopropoxycarbonylpropyleneoxy) anthracene, 2-ethyl-9,10-bis (tert-butoxycarbonylpropyleneoxy) anthracene, 2-ethyl-9,10-bis (n-butoxycarbonylpropyleneoxy) ) Anthracene, 2-ethyl-9,10-bis (methoxycarbonylmethylmethyleneoxy) anthracene, 2-ethyl-9,10-bis (ethoxycarbonylmethylmethyleneoxy) anthracene, 2-ethyl-9,10-bis (ethoxy) Carbonylethylmethyleneoxy) anthracene, 2-ethyl-9,10-bis (isopropoxycarbonylmethylmethyleneoxy) anthracene, 2-ethyl-9,10-bis (tert-butoxycarbonylmethylmethyleneoxy) anthracene, 2-ethyl- 9,10-bis (n-butoxycarbonylmethylmethyleneoxy) anthracene and 2-ethyl-9,10-bis (2-hydroxyethoxycarbonylmethyleneoxy) anthracene are preferable, and 9,10-bis (2-hydroxyethoxycarbonylmethyleneoxy) anthracene listed in the following structural formula is preferable. Methoxycarbonylmethyleneoxy) anthracene (1-1), 9,10-bis (ethoxycarbonylmethyleneoxy) anthracene (1-2), 9,10-bis (n-propoxycarbonylmethyleneoxy) anthracene (1-10), 9,10-Bis (isopropoxycarbonylmethyleneoxy) anthracene (1-3), 9,10-bis (tert-butoxycarbonylmethyleneoxy) anthracene (1-4), 9,10-bis (n-butoxycarbonylmethylene) Oxy) anthracene (1-5), 9,10-bis (n-pentyloxycarbonylmethyleneoxy) anthracene (1-11), 9,10-bis (methoxycarbonylmethylmethyleneoxy) anthracene (1-6), 9 , 10-bis (ethoxycal Bonylpropyleneoxy) anthracene (1-7), 9,10-bis (ethoxycarbonylbutyleneoxy) anthracene (1-8), 2-ethyl-9,10-bis (isopropoxycarbonylmethyleneoxy) anthracene (1-9) ), 9,10-Bis (cyclohexyloxycarbonylmethyleneoxy) anthracene (1-12) is particularly preferred.
製造しやすさ、原料の入手しやすさ、取り扱いしやすさを総合的に判断すると、一般式(1)におけるRが酸素原子を含まない炭素数1から20のアルキル基であることが好ましい。また、一般式(1)におけるAは炭素数1のメチレン基であることが好ましい。マイグレーション性、疎水性など種々の物性から勘案して、Rの炭素数が3以上のアルキル基が好ましく、9,10-ビス(イソプロポキシカルボニルメチレンオキシ)アントラセン(1-3)、9,10-ビス(n-ペンチルオキシカルボニルメチレンオキシ)アントラセン(1-11)、9,10-ビス(シクロヘキシルオキシカルボニルメチレンオキシ)アントラセン(1-12)が特に好ましい。 Judging from the ease of manufacture, the availability of raw materials, and the ease of handling, it is preferable that R in the general formula (1) is an alkyl group having 1 to 20 carbon atoms containing no oxygen atom. Further, A in the general formula (1) is preferably a methylene group having 1 carbon atom. Considering various physical properties such as migration and hydrophobicity, an alkyl group having 3 or more carbon atoms in R is preferable, and 9,10-bis (isopropoxycarbonylmethyleneoxy) anthracene (1-3), 9,10- Bis (n-pentyloxycarbonylmethyleneoxy) anthracene (1-11) and 9,10-bis (cyclohexyloxycarbonylmethyleneoxy) anthracene (1-12) are particularly preferred.
Figure JPOXMLDOC01-appb-C000004
 
Figure JPOXMLDOC01-appb-C000004
 
(一般式(1)で表されるアントセラン化合物の製造法)
上記9,10-ビス(アルコキシカルボニルアルキレンオキシ)アントラセン化合物は、例えば、9,10-ジヒドロキシアントラセン化合物を、塩基性化合物存在下ブロモ酢酸エステルなどのエステル化合物と反応させることにより得ることができる。
(Method for producing an antoceran compound represented by the general formula (1))
The 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound can be obtained, for example, by reacting the 9,10-dihydroxyanthracene compound with an ester compound such as a bromoacetic acid ester in the presence of a basic compound.
本発明の一般式(1)で表されるエステル基を有する9,10-ビス(アルコキシカルボニルアルキレンオキシ)アントラセン化合物は、一般式(2)で表される9,10-ジヒドロキシアントラセン化合物を下記の反応式-1に従い、塩基性化合物存在下、あるいは非存在下で対応する一般式(3)で表されるエステル化合物と反応させることにより得ることができる。 The 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group represented by the general formula (1) of the present invention is the 9,10-dihydroxyanthracene compound represented by the general formula (2) as follows. It can be obtained by reacting with the corresponding ester compound represented by the general formula (3) in the presence or absence of the basic compound according to the reaction formula-1.
Figure JPOXMLDOC01-appb-C000005
 
Figure JPOXMLDOC01-appb-C000005
 
反応式-1において、Aは炭素数1から20のアルキレン基を表し、該アルキレン基はアルキル基によって分岐していてもよい。Rは炭素数1から20のアルキル基を表し、該アルキル基は、アルキル基によって分岐していてもよく、シクロアルキル基でもシクロアルキルアルキル基でもよく、ヒドロキシ基で置換されていてもよく、炭素原子の一部が酸素原子によって置き換わっていてもよい(但し、過酸化物を形成する場合は除く)。X、Yは同一であっても異なってもよく、水素原子、炭素数1から8のアルキル基又はハロゲン原子を表す。Zは塩素原子、臭素原子又はヨウ素原子を表す。 In Reaction Scheme-1, A represents an alkylene group having 1 to 20 carbon atoms, and the alkylene group may be branched by an alkyl group. R represents an alkyl group having 1 to 20 carbon atoms, and the alkyl group may be branched by an alkyl group, may be a cycloalkyl group or a cycloalkylalkyl group, may be substituted with a hydroxy group, and may be carbon. Some of the atoms may be replaced by oxygen atoms (except when forming peroxides). X and Y may be the same or different, and represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, or a halogen atom. Z represents a chlorine atom, a bromine atom or an iodine atom.
反応式-1において、原料として用いられる一般式(2)で表される9,10-ジヒドロキシアントラセン化合物は、対応する9,10-アントラキノン化合物を還元して得られる。 In the reaction formula-1, the 9,10-dihydroxyanthracene compound represented by the general formula (2) used as a raw material is obtained by reducing the corresponding 9,10-anthraquinone compound.
当該反応において、原料となる9,10-ジヒドロキシアントラセン化合物の具体的な例としては、9,10-ジヒドロキシアントラセン、2-メチル-9,10-ジヒドロキシアントラセン、2-エチル-9,10-ジヒドロキシアントラセン、2-t-ペンチル-9,10-ジヒドロキシアントラセン、2,6-ジメチル-9,10-ジヒドロキシアントラセン、2-クロロ-9,10-ジヒドロキシアントラセン、2-ブロモ-9,10-ジヒドロキシアントラセン等が挙げられる。 Specific examples of the 9,10-dihydroxyanthracene compound used as a raw material in the reaction include 9,10-dihydroxyanthracene, 2-methyl-9,10-dihydroxyanthracene, and 2-ethyl-9,10-dihydroxyanthracene. , 2-t-pentyl-9,10-dihydroxyanthracene, 2,6-dimethyl-9,10-dihydroxyanthracene, 2-chloro-9,10-dihydroxyanthracene, 2-bromo-9,10-dihydroxyanthracene, etc. Can be mentioned.
当該9,10-ジヒドロキシアントラセン化合物は、酸素に対して不安定なため、ヒドロキシル基を公知の保護基によって保護された形で用いてもよい。 Since the 9,10-dihydroxyanthracene compound is unstable to oxygen, the hydroxyl group may be used in a form protected by a known protecting group.
また、9,10-ジヒドロキシアントラセンの場合は、工業的な方法として、1,4-ナフトキノンと1,3-ブタジエンとのディールス・アルダー反応生成物である1,4,4a,9a-テトラヒドロアントラキノン又はその異性体である1,4-ジヒドロ9,10-ジヒドロキシアントラセンのアルカリ金属塩を用いて9,10-アントラキノンを還元することにより、より簡便に9,10-ジヒドロキシアントラセンを得ることができる。すなわち、1,4-ナフトキノンと1,3-ブタジエンとの反応により得られる1,4,4a,9a-テトラヒドロアントラキノンを、水性媒体中、アルカリ金属水酸化物のようなアルカリ性化合物の存在下に9,10-アントラキノンと反応させることにより9,10-ジヒドロキシアントラセンのアルカリ金属塩の水溶液を得ることができる。 In the case of 9,10-dihydroxyanthracene, as an industrial method, 1,4,4a, 9a-tetrahydroanthraquinone, which is a Diels-Alder reaction product of 1,4-naphthoquinone and 1,3-butadiene, or By reducing 9,10-anthraquinone with an alkali metal salt of 1,4-dihydro 9,10-dihydroxyanthracene, which is the isomer thereof, 9,10-dihydroxyanthracene can be obtained more easily. That is, 1,4,4a, 9a-tetrahydroanthraquinone obtained by the reaction of 1,4-naphthoquinone and 1,3-butadiene is placed in an aqueous medium in the presence of an alkaline compound such as an alkali metal hydroxide. An aqueous solution of an alkali metal salt of 9,10-dihydroxyanthracene can be obtained by reacting with, 10-anthraquinone.
当該反応で得られた9,10-ジヒドロキシアントラセンのアルカリ金属塩の水溶液を酸素不存在下に酸性化することにより、9,10-ジヒドロキシアントラセンの沈殿を得ることができる。この沈殿を精製することにより、9,10-ジヒドロキシアントラセンを得ることができる。置換基を有する9,10-ジヒドロキシアントラセン化合物も同様にして得ることができる。 Precipitation of 9,10-dihydroxyanthracene can be obtained by acidifying an aqueous solution of an alkali metal salt of 9,10-dihydroxyanthracene obtained in the reaction in the absence of oxygen. By purifying this precipitate, 9,10-dihydroxyanthracene can be obtained. A 9,10-dihydroxyanthracene compound having a substituent can be obtained in the same manner.
反応式-1において、原料となる一般式(3)で表されるエステル化合物の具体例としては、クロロ酢酸メチル、クロロ酢酸エチル(3-12)、クロロ酢酸n-プロピル、クロロ酢酸イソプロピル、クロロ酢酸n-ブチル(3-5)、クロロ酢酸tert-ブチル、クロロ酢酸ペンチル、クロロ酢酸ヘキシル、クロロ酢酸ヘプチル、クロロ酢酸オクチル、クロロ酢酸2-エチルヘキシル、クロロ酢酸ノニル、クロロ酢酸ドデシル、クロロ酢酸ノナデシル、クロロ酢酸イコシル、クロロ酢酸シクロヘキシル、クロロ酢酸シクロヘキシルメチル、2-クロロプロピオン酸メチル、3-クロロプロピオン酸メチル、2-クロロプロピオン酸メチル、3-クロロプロピオン酸メチル、2-クロロプロピオン酸エチル、3-クロロプロピオン酸エチル、2-クロロプロピオン酸n-プロピル、3-クロロプロピオン酸n-プロピル、2-クロロプロピオン酸イソプロピル、3-クロロプロピオン酸イソプロピル、2-クロロプロピオン酸n-ブチル、3-クロロプロピオン酸n-ブチル、2-クロロプロピオン酸tert-ブチル、3-クロロプロピオン酸tert-ブチル、2-クロロプロピオン酸ペンチル、3-クロロプロピオン酸ペンチル、2-クロロプロピオン酸ヘキシル、3-クロロプロピオン酸ヘキシル、2-クロロプロピオン酸ヘプチル、3-クロロプロピオン酸ヘプチル、2-クロロプロピオン酸オクチル、3-クロロプロピオン酸オクチル、2-クロロプロピオン酸2-エチルヘキシル、3-クロロプロピオン酸2―エチルヘキシル、2-クロロプロピオン酸ノニル、3-クロロプロピオン酸ノニル、2-クロロプロピオン酸ドデシル、3-クロロプロピオン酸ドデシル、2-クロロプロピオン酸ノナデシル、3-クロロプロピオン酸ノナデシル、2-クロロプロピオン酸イコシル、3-クロロプロピオン酸イコシル、2-クロロ酪酸メチル、3-クロロ酪酸メチル、4-クロロ酪酸メチル、2-クロロ酪酸エチル、3-クロロ酪酸エチル、4-クロロ酪酸エチル、2-クロロ酪酸n-プロピル、3-クロロ酪酸n-プロピル、4-クロロ酪酸n-プロピル、2-クロロ酪酸イソプロピル、3-クロロ酪酸イソプロピル、4-クロロ酪酸イソプロピル、2-クロロ酪酸n-ブチル、3-クロロ酪酸n-ブチル、4-クロロ酪酸n-ブチル、2-クロロ酪酸tert-ブチル、3-クロロ酪酸tert-ブチル、4-クロロ酪酸tert-ブチル、2-クロロ酪酸ペンチル、3-クロロ酪酸ペンチル、4-クロロ酪酸ペンチル、2-クロロ酪酸ヘキシル、3-クロロ酪酸ヘキシル、4-クロロ酪酸ヘキシル、2-クロロ酪酸ヘプチル、3-クロロ酪酸ヘプチル、4-クロロ酪酸ヘプチル、2-クロロ酪酸オクチル、3-クロロ酪酸オクチル、4-クロロ酪酸オクチル、2-クロロ酪酸2-エチルヘキシル、3-クロロ酪酸2-エチルヘキシル、4-クロロ酪酸2-エチルヘキシル、2-クロロ酪酸ノニル、3-クロロ酪酸ノニル、4-クロロ酪酸ノニル、2-クロロ酪酸ドデシル、3-クロロ酪酸ドデシル、4-クロロ酪酸ドデシル、2-クロロ酪酸ノナデシル、3-クロロ酪酸ノナデシル、4-クロロ酪酸ノナデシル、2-クロロ酪酸イコシル、3-クロロ酪酸イコシル、4-クロロ酪酸イコシル、2-クロロ吉草酸メチル、3-クロロ吉草酸メチル、4-クロロ吉草酸メチル、5-クロロ吉草酸メチル、2-クロロ吉草酸エチル、3-クロロ吉草酸エチル、4-クロロ吉草酸エチル、5-クロロ吉草酸エチル、2-クロロ吉草酸n-プロピル、3-クロロ吉草酸n-プロピル、4-クロロ吉草酸n-プロピル、5-クロロ吉草酸n-プロピル、2-クロロ吉草酸イソプロピル、3-クロロ吉草酸イソプロピル、4-クロロ吉草酸イソプロピル、5-クロロ吉草酸イソプロピル、2-クロロ吉草酸n-ブチル、3-クロロ吉草酸n-ブチル、4-クロロ吉草酸n-ブチル、5-クロロ吉草酸n-ブチル、2-クロロ吉草酸tert-ブチル、3-クロロ吉草酸tert-ブチル、4-クロロ吉草酸tert-ブチル、5-クロロ吉草酸tert-ブチル、2-クロロ吉草酸ペンチル、3-クロロ吉草酸ペンチル、4-クロロ吉草酸ペンチル、5-クロロ吉草酸ペンチル、2-クロロ吉草酸ヘキシル、3-クロロ吉草酸ヘキシル、4-クロロ吉草酸ヘキシル、5-クロロ吉草酸ヘキシル、2-クロロ吉草酸ヘプチル、3-クロロ吉草酸ヘプチル、4-クロロ吉草酸ヘプチル、5-クロロ吉草酸ヘプチル、2-クロロ吉草酸オクチル、3-クロロ吉草酸オクチル、4-クロロ吉草酸オクチル、5-クロロ吉草酸オクチル、2-クロロ吉草酸2-エチルヘキシル、3-クロロ吉草酸2-エチルヘキシル、4-クロロ吉草酸2-エチルヘキシル、5-クロロ吉草酸2-エチルヘキシル、2-クロロ吉草酸ノニル、3-クロロ吉草ノニル酸、4-クロロ吉草酸ノニル、5-クロロ吉草酸ノニル、2-クロロ吉草酸ドデシル、3-クロロ吉草酸ドデシル、4-クロロ吉草酸ドデシル、5-クロロ吉草酸ドデシル、2-クロロ吉草酸ノナデシル、3-クロロ吉草酸ノナデシル、4-クロロ吉草酸ノナデシル、5-クロロ吉草酸ノナデシル、2-クロロ吉草酸イコシル、3-クロロ吉草酸イコシル、4-クロロ吉草酸イコシル、5-クロロ吉草酸イコシル等が挙げられる。 Specific examples of the ester compound represented by the general formula (3) as a raw material in Reaction Formula-1 include methyl chloroacetate, ethyl chloroacetate (3-12), n-propyl chloroacetate, isopropyl chloroacetate, and chloro N-butyl acetate (3-5), tert-butyl chloroacetate, pentyl chloroacetate, hexyl chloroacetate, heptyl chloroacetate, octyl chloroacetate, 2-ethylhexyl chloroacetate, nonyl chloroacetate, dodecyl chloroacetate, nonadesyl chloroacetate, Icosyl chloroacetate, cyclohexyl chloroacetate, cyclohexylmethylchloroacetic acid, methyl 2-chloropropionate, methyl 3-chloropropionate, methyl 2-chloropropionate, methyl 3-chloropropionate, ethyl 2-chloropropionate, 3- Ethyl chloropropionate, n-propyl 2-chloropropionate, n-propyl 3-chloropropionate, isopropyl 2-chloropropionate, isopropyl 3-chloropropionate, n-butyl 2-chloropropionate, 3-chloropropion N-butyl acid, tert-butyl 2-chloropropionate, tert-butyl 3-chloropropionate, pentyl 2-chloropropionate, pentyl 3-chloropropionate, hexyl 2-chloropropionate, hexyl 3-chloropropionate , 2-Chloropropionate heptyl, 3-chloropropionate heptyl, 2-chloropropionate octyl, 3-chloropropionate octyl, 2-chloropropionate 2-ethylhexyl, 3-chloropropionate 2-ethylhexyl, 2-chloro Nonyl propionate, Nonyl 3-chloropropionate, Dodecyl 2-chloropropionate, Dodecyl 3-chloropropionate, Nonadesyl 2-chloropropionate, Nonadesyl 3-chloropropionate, Icosyl 2-chloropropionate, 3-Chloropropion Icosyl acid, methyl 2-chlorobutyrate, methyl 3-chlorobutyrate, methyl 4-chlorobutyrate, ethyl 2-chlorobutyrate, ethyl 3-chlorobutyrate, ethyl 4-chlorobutyrate, n-propyl 2-chlorobutyrate, 3-chloro N-propyl butyrate, n-propyl 4-chlorobutyrate, isopropyl 2-chlorobutyrate, isopropyl 3-chlorobutyrate, isopropyl 4-chlorobutyrate, n-butyl 2-chlorobutyrate, n-butyl 3-chlorobutyrate, 4-chloro N-Butyl butyrate, tert-butyl 2-chlorobutyrate, tert-butyl 3-chlorobutyrate, 4 -Tert-Butyl chlorobutyrate, pentyl 2-chlorobutyrate, pentyl 3-chlorobutyrate, pentyl 4-chlorobutyrate, hexyl 2-chlorobutyrate, hexyl 3-chlorobutyrate, hexyl 4-chlorobutyrate, heptyl 2-chlorobutyrate, 3 -Heptyl chlorobutyrate, heptyl 4-chlorobutyrate, octyl 2-chlorobutyrate, octyl 3-chlorobutyrate, octyl 4-chlorobutyrate, 2-ethylhexyl 2-chlorobutyrate, 2-ethylhexyl 3-chlorobutyrate, 2-chlorobutyric acid 2 -Ethylhexyl, nonyl 2-chlorobutyrate, nonyl 3-chlorobutyrate, nonyl 4-chlorobutyrate, dodecyl 2-chlorobutyrate, dodecyl 3-chlorobutyrate, dodecyl 4-chlorobutyrate, nonadecil 2-chlorobutyrate, nonadecil 3-chlorobutyrate , 4-Chlorobutyrate nonadesyl, 2-chlorobutyrate icosyl, 3-chlorobutyrate icosyl, 4-chlorobutyrate icosyl, 2-chlorovalerate methyl, 3-chlorovalerate methyl, 4-chlorovalerate methyl, 5-chlorovalerate Methyl herate, ethyl 2-chlorovalerate, ethyl 3-chlorovalerate, ethyl 4-chlorovalerate, ethyl 5-chlorovalerate, n-propyl 2-chlorovalerate, n-propyl 3-chlorovalerate, 4 -N-propyl chlorovalerate, n-propyl 5-chlorovalerate, isopropyl 2-chlorovalerate, isopropyl 3-chlorovalerate, isopropyl 4-chlorovalerate, isopropyl 5-chlorovalerate, 2-chlorovaleric acid n-Butyl, n-butyl 3-chlorovalerate, n-butyl 4-chlorovalerate, n-butyl 5-chlorovalerate, tert-butyl 2-chlorovalerate, tert-butyl 3-chlorovalerate, 4 -Tert-butyl chlorovalerate, tert-butyl 5-chlorovalerate, pentyl 2-chlorovalerate, pentyl 3-chlorovalerate, pentyl 4-chlorovalerate, pentyl 5-chlorovalerate, 2-chlorovaleric acid Hexil, 3-chlorovalerate hexyl, 4-chlorovalerate hexyl, 5-chlorovalerate hexyl, 2-chlorovalerate heptyl, 3-chlorovalerate heptyl, 4-chlorovalerate heptyl, 5-chlorovalerate heptyl , 2-chlorovalerate octyl, 3-chlorovalerate octyl, 4-chlorovalerate octyl, 5-chlorovalerate octyl, 2-chlorovalerate 2-ethylhexyl, 3-chlorovalerate 2-ethylhexyl, 4-chloro 2-Ethylhexyl valerate, 2-ethylhexyl 5-chlorovalerate, nonyl 2-chlorovalerate, 3-chlorovaleric acid, 4- Nonyl chlorovalerate, nonyl 5-chlorovalerate, dodecyl 2-chlorovalerate, dodecyl 3-chlorovalerate, dodecyl 4-chlorovalerate, dodecyl 5-chlorovalerate, nonadecil 2-chlorovalerate, 3-chloro Examples thereof include nonadesyl valerate, nonadesyl 4-chlorovalerate, nonadesyl 5-chlorovalerate, icosyl 2-chlorovalerate, icosyl 3-chlorovalerate, icosyl 4-chlorovalerate, and icosyl 5-chlorovalerate.
更に、ブロモ酢酸メチル(3-1)、ブロモ酢酸エチル(3-4)、ブロモ酢酸n-プロピル(3-9)、ブロモ酢酸イソプロピル(3-2)、ブロモ酢酸n-ブチル、ブロモ酢酸tert-ブチル(3-3)、ブロモ酢酸ペンチル(3-10)、ブロモ酢酸ヘキシル、ブロモ酢酸ヘプチル、ブロモ酢酸オクチル、ブロモ酢酸2-エチルヘキシル、ブロモ酢酸ノニル、ブロモ酢酸ドデシル、ブロモ酢酸ノナデシル、ブロモ酢酸イコシル、ブロモ酢酸シクロヘキシル(3-11)、ブロモ酢酸シクロヘキシルメチル、2-ブロモプロピオン酸メチル(3-6)、3-ブロモプロピオン酸メチル、2-ブロモプロピオン酸エチル、3-ブロモプロピオン酸エチル、2-ブロモプロピオン酸n-プロピル、3-ブロモプロピオン酸n-プロピル、2-ブロモプロピオン酸イソプロピル、3-ブロモプロピオン酸イソプロピル、2-ブロモプロピオン酸n-ブチル、3-ブロモプロピオン酸n-ブチル、2-ブロモプロピオン酸tert-ブチル、3-ブロモプロピオン酸tert-ブチル、2-ブロモプロピオン酸ペンチル、3-ブロモプロピオン酸ペンチル、2-ブロモプロピオン酸ヘキシル、3-ブロモプロピオン酸ヘキシル、2-ブロモプロピオン酸ヘプチル、3-ブロモプロピオン酸ヘプチル、2-ブロモプロピオン酸オクチル、3-ブロモプロピオン酸オクチル、2-ブロモプロピオン酸2―エチルヘキシル、3-ブロモプロピオン酸2-エチルヘキシル、2-ブロモプロピオン酸ノニル、3-ブロモプロピオン酸ノニル、2-ブロモプロピオン酸ドデシル、3-ブロモプロピオン酸ドデシル、2-ブロモプロピオン酸ノナデシル、3-ブロモプロピオン酸ノナデシル、2-ブロモプロピオン酸イコシル、3-ブロモプロピオン酸イコシル、2-ブロモ酪酸メチル、3-ブロモ酪酸メチル、4-ブロモ酪酸メチル、2-ブロモ酪酸エチル、3-ブロモ酪酸エチル、4-ブロモ酪酸エチル(3-7)、2-ブロモ酪酸n-プロピル、3-ブロモ酪酸n-プロピル、4-ブロモ酪酸n-プロピル、2-ブロモ酪酸イソプロピル、3-ブロモ酪酸イソプロピル、4-ブロモ酪酸イソプロピル、2-ブロモ酪酸n-ブチル、3-ブロモ酪酸n-ブチル、4-ブロモ酪酸n-ブチル、2-ブロモ酪酸tert-ブチル、3-ブロモ酪酸tert-ブチル、4-ブロモ酪酸tert-ブチル、2-ブロモ酪酸ペンチル、3-ブロモ酪酸ペンチル、4-ブロモ酪酸ペンチル、2-ブロモ酪酸ヘキシル、3-ブロモ酪酸ヘキシル、4-ブロモ酪酸ヘキシル、2-ブロモ酪酸ヘプチル、3-ブロモ酪酸ヘプチル、4-ブロモ酪酸ヘプチル、2-ブロモ酪酸オクチル、3-ブロモ酪酸オクチル、4-ブロモ酪酸オクチル、2-ブロモ酪酸2-エチルヘキシル、3-ブロモ酪酸2-エチルヘキシル、4-ブロモ酪酸2-エチルヘキシル、2-ブロモ酪酸ノニル、3-ブロモ酪酸ノニル、4-ブロモ酪酸ノニル、2-ブロモ酪酸ドデシル、3-ブロモ酪酸ドデシル、4-ブロモ酪酸ドデシル、2-ブロモ酪酸ノナデシル、3-ブロモ酪酸ノナデシル、4-ブロモ酪酸ノナデシル、2-ブロモ酪酸イコシル、3-ブロモ酪酸イコシル、4-ブロモ酪酸イコシル、2-ブロモ吉草酸メチル、3-ブロモ吉草酸メチル、4-ブロモ吉草酸メチル、5-ブロモ吉草酸メチル、2-ブロモ吉草酸エチル、3-ブロモ吉草酸エチル、4-ブロモ吉草酸エチル(3-8)、5-ブロモ吉草酸エチル、2-ブロモ吉草酸n-プロピル、3-ブロモ吉草酸n-プロピル、4-ブロモ吉草酸n-プロピル、5-ブロモ吉草酸n-プロピル、2-ブロモ吉草酸イソプロピル、3-ブロモ吉草酸イソプロピル、4-ブロモ吉草酸イソプロピル、5-ブロモ吉草酸イソプロピル、2-ブロモ吉草酸n-ブチル、3-ブロモ吉草酸n-ブチル、4-ブロモ吉草酸n-ブチル、5-ブロモ吉草酸n-ブチル、2-ブロモ吉草酸tert-ブチル、3-ブロモ吉草酸tert-ブチル、4-ブロモ吉草酸tert-ブチル、5-ブロモ吉草酸tert-ブチル、2-ブロモ吉草酸ペンチル、3-ブロモ吉草酸ペンチル、4-ブロモ吉草酸ペンチル、5-ブロモ吉草酸ペンチル、2-ブロモ吉草酸ヘキシル、3-ブロモ吉草酸ヘキシル、4-ブロモ吉草酸ヘキシル、5-ブロモ吉草酸ヘキシル、2-ブロモ吉草酸ヘプチル、3-ブロモ吉草酸ヘプチル、4-ブロモ吉草酸ヘプチル、5-ブロモ吉草酸ヘプチル、2-ブロモ吉草酸オクチル、3-ブロモ吉草酸オクチル、4-ブロモ吉草酸オクチル、5-ブロモ吉草酸オクチル、2-ブロモ吉草酸2-エチルヘキシル、3-ブロモ吉草酸2―エチルヘキシル、4-ブロモ吉草酸2-エチルヘキシル、5-ブロモ吉草酸2-エチルヘキシル、2-ブロモ吉草酸ノニル、3-ブロモ吉草ノニル酸、4-ブロモ吉草酸ノニル、5-ブロモ吉草酸ノニル、2-ブロモ吉草酸ドデシル、3-ブロモ吉草酸ドデシル、4-ブロモ吉草酸ドデシル、5-ブロモ吉草酸ドデシル、2-ブロモ吉草酸ノナデシル、3-ブロモ吉草酸ノナデシル、4-ブロモ吉草酸ノナデシル、5-ブロモ吉草酸ノナデシル、2-ブロモ吉草酸イコシル、3-ブロモ吉草酸イコシル、4-ブロモ吉草酸イコシル、5-ブロモ吉草酸イコシル、ブロモ酢酸-2-ヒドロキシエチル、2-ブロモプロピオン酸-2-ヒドロキシエチル、3-ブロモ酪酸-2-ヒドロキシエチル、4-ブロモ吉草酸-2-ヒドロキシエチル等が挙げられる。 Furthermore, methyl bromoacetate (3-1), ethyl bromoacetate (3-4), n-propyl bromoacetate (3-9), isopropyl bromoacetate (3-2), n-butyl bromoacetate, tert-bromoacetate. Butyl (3-3), pentyl bromoacetate (3-10), hexyl bromoacetate, heptyl bromoacetate, octyl bromoacetate, 2-ethylhexyl bromoacetate, nonyl bromoacetate, dodecyl bromoacetate, nonadesyl bromoacetate, icosyl bromoacetate, Cyclohexyl bromoacetate (3-11), cyclohexylmethyl bromoacetate, methyl 2-bromopropionate (3-6), methyl 3-bromopropionate, ethyl 2-bromopropionate, ethyl 3-bromopropionate, 2-bromo N-propyl propionate, n-propyl 3-bromopropionate, isopropyl 2-bromopropionate, isopropyl 3-bromopropionate, n-butyl 2-bromopropionate, n-butyl 3-bromopropionate, 2-bromo Tert-butyl propionate, tert-butyl 3-bromopropionate, pentyl 2-bromopropionate, pentyl 3-bromopropionate, hexyl 2-bromopropionate, hexyl 3-bromopropionate, heptyl 2-bromopropionate, Heptyl 3-bromopropionate, octyl 2-bromopropionate, octyl 3-bromopropionate, 2-ethylhexyl 2-bromopropionate, 2-ethylhexyl 3-bromopropionate, nonyl 2-bromopropionate, 3-bromopropion Nonyl acid acid, dodecyl 2-bromopropionate, dodecyl 3-bromopropionate, nonadecil 2-bromopropionate, nonadecil 3-bromopropionate, icosyl 2-bromopropionate, icosyl 3-bromopropionate, methyl 2-bromobutyrate , Methyl 3-bromobutyrate, methyl 4-bromobutyrate, ethyl 2-bromobutyrate, ethyl 3-bromobutyrate, ethyl 4-bromobutyrate (3-7), n-propyl 2-bromobutyrate, n-bromobutyrate Propyl, n-propyl 4-bromobutyrate, isopropyl 2-bromobutyrate, isopropyl 3-bromobutyrate, isopropyl 4-bromobutyrate, n-butyl 2-bromobutyrate, n-butyl 3-bromobutyrate, n-bromobutyrate Butyl, tert-butyl 2-bromobutyrate, tert-butyl 3-bromobutyrate, tert-butyl 4-bromobutyrate, pentyl 2-bromobutyrate, 3-bromodairy Pentyl acid, pentyl 4-bromobutyrate, hexyl 2-bromobutyrate, hexyl 3-bromobutyrate, hexyl 4-bromobutyrate, heptyl 2-bromobutyrate, heptyl 3-bromobutyrate, heptyl 4-bromobutyrate, octyl 2-bromobutyrate , 3-bromobutyrate octyl, 4-bromobutyrate octyl, 2-bromobutyrate 2-ethylhexyl, 3-bromobutyrate 2-ethylhexyl, 4-bromobutyrate 2-ethylhexyl, 2-bromobutyrate nonyl, 3-bromobutyrate nonyl, 4 -Nonyl bromobutyrate, dodecyl 2-bromobutyrate, dodecyl 3-bromobutyrate, dodecyl 4-bromobutyrate, nonadesyl 2-bromobutyrate, nonadesyl 3-bromobutyrate, nonadesyl 4-bromobutyrate, icosyl 2-bromobutyrate, 3-bromo Icosyl butyrate, Icosyl 4-bromobutyrate, methyl 2-bromovalerate, methyl 3-bromovalerate, methyl 4-bromovalerate, methyl 5-bromovalerate, ethyl 2-bromovalerate, ethyl 3-bromovalerate , 4-Bromovalerate ethyl (3-8), 5-bromovalerate ethyl, 2-bromovalerate n-propyl, 3-bromovalerate n-propyl, 4-bromovalerate n-propyl, 5-bromo N-propyl valerate, isopropyl 2-bromovalerate, isopropyl 3-bromovalerate, isopropyl 4-bromovalerate, isopropyl 5-bromovalerate, n-butyl 2-bromovalerate, n-bromovalerate 3-bromovalerate Butyl, n-butyl 4-bromovalerate, n-butyl 5-bromovalerate, tert-butyl 2-bromovalerate, tert-butyl 3-bromovalerate, tert-butyl 4-bromovalerate, 5-bromo Tert-butyl valerate, pentyl 2-bromovalerate, pentyl 3-bromovalerate, pentyl 4-bromovalerate, pentyl 5-bromovalerate, hexyl 2-bromovalerate, hexyl 3-bromovalerate, 4- Hexyl bromovalerate, hexyl 5-bromovalerate, heptyl 2-bromovalerate, heptyl 3-bromovalerate, heptyl 4-bromovalerate, heptyl 5-bromovalerate, octyl 2-bromovalerate, 3-bromo Octyl valerate, octyl 4-bromovalerate, octyl 5-bromovalerate, 2-ethylhexyl 2-bromovaleric acid, 2-ethylhexyl 3-bromovaleric acid, 2-ethylhexyl 4-bromovalerate, 5-bromovaleric acid 2-Ethylhexyl, 2-bromovalerate nonyl, 3-bromovaleric acid, 4-bromovalerate nonyl, 5-bromovalerate nonyl, 2-bromovaleric Dodecyl herbate, dodecyl 3-bromovalerate, dodecyl 4-bromovalerate, dodecyl 5-bromovalerate, nonadecil 2-bromovalerate, nonadecil 3-bromovalerate, nonadecil 4-bromovalerate, 5-bromovaleric acid Nonadesyl, 2-bromovalerate icosyl, 3-bromovalerate icosyl, 4-bromovalerate icosyl, 5-bromovalerate icosyl, bromoacetate-2-hydroxyethyl, 2-bromopropionate-2-hydroxyethyl, 3 -2-Hydroxyethyl-bromobutyric acid, -2-hydroxyethyl 4-bromovaleric acid and the like can be mentioned.
そして更に、ヨード酢酸メチル、ヨード酢酸エチル、ヨード酢酸n-プロピル、ヨード酢酸イソプロピル、ヨード酢酸n-ブチル、ヨード酢酸tert-ブチル、ヨード酢酸ペンチル、ヨード酢酸ヘキシル、ヨード酢酸ヘプチル、ヨード酢酸オクチル、ヨード酢酸2-エチルヘキシル、ヨード酢酸ノニル、ヨード酢酸ドデシル、ヨード酢酸ノナデシル、ヨード酢酸イコシル、2-ヨードプロピオン酸メチル、3-ヨードプロピオン酸メチル、2-ヨードプロピオン酸エチル、3-ヨードプロピオン酸エチル、2-ヨードプロピオン酸n-プロピル、3-ヨードプロピオン酸n-プロピル、2-ヨードプロピオン酸イソプロピル、3-ヨードプロピオン酸イソプロピル、2-ヨードプロピオン酸n-ブチル、3-ヨードプロピオン酸n-ブチル、2-ヨードプロピオン酸tert-ブチル、3-ヨードプロピオン酸tert-ブチル、2-ヨードプロピオン酸ペンチル、3-ヨードプロピオン酸ペンチル、2-ヨードプロピオン酸ヘキシル、3-ヨードプロピオン酸ヘキシル、2-ヨードプロピオン酸ヘプチル、3-ヨードプロピオン酸ヘプチル、2-ヨードプロピオン酸オクチル、3-ヨードプロピオン酸オクチル、2-ヨードプロピオン酸2-エチルヘキシル、3-ヨードプロピオン酸2-エチルヘキシル、2-ヨードプロピオン酸ノニル、3-ヨードプロピオン酸ノニル、2-ヨードプロピオン酸ドデシル、3-ヨードプロピオン酸ドデシル、2-ヨードプロピオン酸ノナデシル、3-ヨードプロピオン酸ノナデシル、2-ヨードプロピオン酸イコシル、3-ヨードプロピオン酸イコシル、2-ヨード酪酸メチル、3-ヨード酪酸メチル、4-ヨード酪酸メチル、2-ヨード酪酸エチル、3-ヨード酪酸エチル、4-ヨード酪酸エチル、2-ヨード酪酸n-プロピル、3-ヨード酪酸n-プロピル、4-ヨード酪酸n-プロピル、2-ヨード酪酸イソプロピル、3-ヨード酪酸イソプロピル、4-ヨード酪酸イソプロピル、2-ヨード酪酸n-ブチル、3-ヨード酪酸n-ブチル、4-ヨード酪酸n-ブチル、2-ヨード酪酸tert-ブチル、3-ヨード酪酸tert-ブチル、4-ヨード酪酸tert-ブチル、2-ヨード酪酸ペンチル、3-ヨード酪酸ペンチル、4-ヨード酪酸ペンチル、2-ヨード酪酸ヘキシル、3-ヨード酪酸ヘキシル、4-ヨード酪酸ヘキシル、2-ヨード酪酸ヘプチル、3-ヨード酪酸ヘプチル、4-ヨード酪酸ヘプチル、2-ヨード酪酸オクチル、3-ヨード酪酸オクチル、4-ヨード酪酸オクチル、2-ヨード酪酸2-エチルヘキシル、3-ヨード酪酸2-エチルヘキシル、4-ヨード酪酸2-エチルヘキシル、2-ヨード酪酸ノニル、3-ヨード酪酸ノニル、4-ヨード酪酸ノニル、2-ヨード酪酸ドデシル、3-ヨード酪酸ドデシル、4-ヨード酪酸ドデシル、2-ヨード酪酸ノナデシル、3-ヨード酪酸ノナデシル、4-ヨード酪酸ノナデシル、2-ヨード酪酸イコシル、3-ヨード酪酸イコシル、4-ヨード酪酸イコシル、2-ヨード吉草酸メチル、3-ヨード吉草酸メチル、4-ヨード吉草酸メチル、5-ヨード吉草酸メチル、2-ヨード吉草酸エチル、3-ヨード吉草酸エチル、4-ヨード吉草酸エチル、5-ヨード吉草酸エチル、2-ヨード吉草酸n-プロピル、3-ヨード吉草酸n-プロピル、4-ヨード吉草酸n-プロピル、5-ヨード吉草酸n-プロピル、2-ヨード吉草酸イソプロピル、3-ヨード吉草酸イソプロピル、4-ヨード吉草酸イソプロピル、5-ヨード吉草酸イソプロピル、2-ヨード吉草酸n-ブチル、3-ヨード吉草酸n-ブチル、4-ヨード吉草酸n-ブチル、5-ヨード吉草酸n-ブチル、2-ヨード吉草酸tert-ブチル、3-ヨード吉草酸tert-ブチル、4-ヨード吉草酸tert-ブチル、5-ヨード吉草酸tert-ブチル、2-ヨード吉草酸ペンチル、3-ヨード吉草酸ペンチル、4-ヨード吉草酸ペンチル、5-ヨード吉草酸ペンチル、2-ヨード吉草酸ヘキシル、3-ヨード吉草酸ヘキシル、4-ヨード吉草酸ヘキシル、5-ヨード吉草酸ヘキシル、2-ヨード吉草酸ヘプチル、3-ヨード吉草酸ヘプチル、4-ヨード吉草酸ヘプチル、5-ヨード吉草酸ヘプチル、2-ヨード吉草酸オクチル、3-ヨード吉草酸オクチル、4-ヨード吉草酸オクチル、5-ヨード吉草酸オクチル、2-ヨード吉草酸2-エチルヘキシル、3-ヨード吉草酸2-エチルヘキシル、4-ヨード吉草酸2-エチルヘキシル、5-ヨード吉草酸2-エチルヘキシル、2-ヨード吉草酸ノニル、3-ヨード吉草ノニル酸、4-ヨード吉草酸ノニル、5-ヨード吉草酸ノニル、2-ヨード吉草酸ドデシル、3-ヨード吉草酸ドデシル、4-ヨード吉草酸ドデシル、5-ヨード吉草酸ドデシル、2-ヨード吉草酸ノナデシル、3-ヨード吉草酸ノナデシル、4-ヨード吉草酸ノナデシル、5-ヨード吉草酸ノナデシル、2-ヨード吉草酸イコシル、3-ヨード吉草酸イコシル、4-ヨード吉草酸イコシル、5-ヨード吉草酸イコシル等が挙げられる。 Furthermore, methyl iodoacetate, ethyl iodoacetate, n-propyl iodoacetate, isopropyl iodoacetate, n-butyl iodoacetate, tert-butyl iodoacetate, pentyl iodoacetate, hexyl iodoacetate, heptyl iodoacetate, octyl iodoacetate, iodine 2-Ethylhexyl acetate, nonyl iodoacetate, dodecyl iodoacetate, nonadesyl iodoacetate, icosyl iodoacetate, methyl 2-iodopropionate, methyl 3-iodopropionate, ethyl 2-iodopropionate, ethyl 3-iodopropionate, 2 -N-propyl iodopropionate, n-propyl 3-iodopropionate, isopropyl 2-iodopropionate, isopropyl 3-iodopropionate, n-butyl 2-iodopropionate, n-butyl 3-iodopropionate, 2 -Tert-butyl iodopropionate, tert-butyl 3-iodopropionate, pentyl 2-iodopropionate, pentyl 3-iodopropionate, hexyl 2-iodopropionate, hexyl 3-iodopropionate, 2-iodopropionic acid Heptyl, heptyl 3-iodopropionate, octyl 2-iodopropionate, octyl 3-iodopropionate, 2-ethylhexyl 2-iodopropionate, 2-ethylhexyl 3-iodopropionate, nonyl 2-iodopropionate, 3- Nonyl iodopropionate, dodecyl 2-iodopropionate, dodecyl 3-iodopropionate, nonadecil 2-iodopropionate, nonadecil 3-iodopropionate, icosyl 2-iodopropionate, icosyl 3-iodopropionate, 2-iodo Methyl butyrate, 3-iodobutyrate, 4-iodobutyrate, 2-iodobutyrate, 3-iodobutyrate, 4-iodobutyrate, 2-iodobutyrate n-propyl, 3-iodobutyrate n-propyl, 4 -N-propyl iodobutate, isopropyl 2-iodobutyrate, isopropyl 3-iodobutyrate, isopropyl 4-iodobutyrate, n-butyl 2-iodobutyrate, n-butyl 3-iodobutyrate, n-butyl 4-iodobutyrate, 2 -Iodobutyrate tert-butyl, 3-iodobutyrate tert-butyl, 4-iodobutyrate tert-butyl, 2-iodobutyrate pentyl, 3-iodobutyrate pentyl, 4-iodobutyrate pentyl, 2-iodobutyrate hexyl, 3-iodo Hexyl butyrate, 4-iodobutyrate hexyl, 2-iodobutyrate heptyl, 3-iodobutyric acid Heptyl, 4-iodobutyrate heptyl, 2-iodobutyrate octyl, 3-iodobutyrate octyl, 4-iodobutyrate octyl, 2-iodobutyrate 2-ethylhexyl, 3-iodobutyrate 2-ethylhexyl, 4-iodobutyrate 2-ethylhexyl, 2-Idobutyrate nonyl, 3-iodobutyrate nonyl, 4-iodobutyrate nonyl, 2-iodobutyrate dodecyl, 3-iodobutyrate dodecyl, 4-iodobutyrate dodecyl, 2-iodobutyrate nonadecil, 3-iodobutyrate nonadecil, 4- Nonadesyl iodobutyrate, icosyl 2-iodobutyrate, icosyl 3-iodobutyrate, icosyl 4-iodobutyrate, methyl 2-iodovalerate, methyl 3-iodovalerate, methyl 4-iodovalerate, 5-methyliodovalerate, 2-Idovalerate ethyl, 3-iodovalerate ethyl, 4-iodovalerate ethyl, 5-iodovalerate ethyl, 2-iodovalerate n-propyl, 3-iodovalerate n-propyl, 4-iodovalerate N-propyl valerate, n-propyl 5-iodovalerate, isopropyl 2-iodovalerate, isopropyl 3-iodovalerate, isopropyl 4-iodovalerate, isopropyl 5-iodovalerate, n-butyl 2-iodovalerate , 3-iodovalerate n-butyl, 4-iodovalerate n-butyl, 5-iodovalerate n-butyl, 2-iodovalerate tert-butyl, 3-iodovalerate tert-butyl, 4-iodovalerate Tert-butyl herate, tert-butyl 5-iodovalerate, pentyl 2-iodovalerate, 3-iodovalerate pentyl, 4-iodovalerate pentyl, 5-iodovalerate pentyl, 2-iodovalerate hexyl, 3 -Hexyl iodovalerate, 4-hexyl iodovalerate, 5-hexyl iodovalerate, 2-heptyl valerate, 3-heptyl valerate, 4-heptyl valerate, 5-heptyl valerate, 2- Octyl iodovalerate, octyl 3-iodovalerate, octyl 4-iodovalerate, octyl 5-iodovalerate, 2-ethylhexyl 2-iodovalerate, 2-ethylhexyl 3-iodovalerate, 2-iodovalerate 2 -Ethylhexyl, 5-iodovalerate 2-ethylhexyl, 2-iodovalerate nonyl, 3-iodovalerate, 4-iodovalerate nonyl, 5-iodovalerate nonyl, 2-iodovalerate dodecyl, 3- Dodecyl iodovalerate, 4-dodecyl iodovalerate, 5-dodecyl iodovalerate, 2-nonadecil iodovalerate, 3-nonadecil iodovalerate, 4-yo Examples thereof include do-valerate nonadesyl, 5-iodovalerate nonadesyl, 2-iodovalerate icosyl, 3-iodovalerate icosyl, 4-iodovalerate icosyl, 5-iodovalerate icosyl and the like.
上記挙げた具体例の中でも、クロロ化合物とブロモ化合物が反応性の点で好ましく、特に、下記構造式の化合物等が好ましい。 Among the specific examples mentioned above, a chloro compound and a bromo compound are preferable in terms of reactivity, and a compound having the following structural formula is particularly preferable.
Figure JPOXMLDOC01-appb-C000006
 
Figure JPOXMLDOC01-appb-C000006
 
反応式-1において一般式(3)で表されるエステル化合物の使用量としては、9,10-ジヒドロキシアントラセン化合物に対して、好ましくは2.0モル倍以上、10.0モル倍未満、より好ましくは、2.2モル倍以上、5.0モル倍未満である。2.0モル倍未満であると、反応が完結せず、また、10.0モル倍以上だと副反応が起こり収率及び純度が低下するので好ましくない。 The amount of the ester compound represented by the general formula (3) in Reaction Scheme-1 is preferably 2.0 mol times or more and less than 10.0 mol times with respect to the 9,10-dihydroxyanthracene compound. Preferably, it is 2.2 mol times or more and less than 5.0 mol times. If it is less than 2.0 mol times, the reaction will not be completed, and if it is 10.0 mol times or more, a side reaction will occur and the yield and purity will decrease, which is not preferable.
反応式-1において、一般式(3)で表されるエステル化合物は市販品を購入してもよく、対応するカルボン酸とアルコールで合成したものを使用してもよい。 In the reaction formula-1, as the ester compound represented by the general formula (3), a commercially available product may be purchased, or a compound synthesized with the corresponding carboxylic acid and alcohol may be used.
反応式-1において、一般式(3)で表されるエステル化合物として対応するカルボン酸とアルコールで合成したものを使用する場合は、系内であらかじめエステル化合物を合成し、そこに一般式(2)で表される9,10-ジヒドロキシアントラセン化合物を投入することで、効率よく反応を行うことができる。 In the reaction formula-1, when a compound synthesized with the corresponding carboxylic acid and alcohol is used as the ester compound represented by the general formula (3), the ester compound is synthesized in advance in the system, and the general formula (2) is used therein. By adding the 9,10-dihydroxyanthracene compound represented by)), the reaction can be carried out efficiently.
反応式-1において使用される塩基性化合物としては、水酸化ナトリウム、水酸化カリウム、水素化ナトリウム、水素化カリウム、リチウムヘキサメチルジシラジド、リチウムジイソプロピルアミド、トリエチルアミン、トリブチルアミン、トリヘキシルアミン、ジメチルアミン、ジエチルアミン、ジプロピルアミン、ジブチルアミン、シクロヘキシルアミン、ジメチルアニリン、ピリジン、4,4-ジメチルアミノピリジン、ピペリジン、γ-ピコリン、ルチジン等が挙げられる。 Examples of the basic compound used in Reaction Formula-1 include sodium hydroxide, potassium hydroxide, sodium hydride, potassium hydride, lithium hexamethyldisilazide, lithium diisopropylamide, triethylamine, tributylamine, and trihexylamine. Examples thereof include dimethylamine, diethylamine, dipropylamine, dibutylamine, cyclohexylamine, dimethylaniline, pyridine, 4,4-dimethylaminopyridine, piperidine, γ-picolin, rutidin and the like.
塩基性化合物の添加量としては、9,10-ジヒドロキシアントラセン化合物に対して、好ましくは2.0モル倍以上、10.0モル倍未満、より好ましくは、2.2モル倍以上、5.0モル倍未満である。2.0モル倍未満であると、反応が完結せず、また、10.0モル倍以上だと副反応が起こり収率及び純度が低下するので好ましくない。 The amount of the basic compound added is preferably 2.0 mol times or more and less than 10.0 mol times, more preferably 2.2 mol times or more, 5.0 times or more with respect to the 9,10-dihydroxyanthracene compound. It is less than a molar number. If it is less than 2.0 mol times, the reaction will not be completed, and if it is 10.0 mol times or more, a side reaction will occur and the yield and purity will decrease, which is not preferable.
当該反応は溶媒中もしくは無溶媒で行う。用いられる溶媒としては使用するエステル化合物と反応しなければ特に種類を選ばず、例えば、トルエン、キシレン、エチルベンゼン等の芳香族溶媒、テトラヒドロフラン、1,4-ジオキサン等のエーテル系溶媒、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン系溶媒、ジメチルアセトアミド、ジメチルホルムアミド等のアミド系溶媒、塩化メチレン、二塩化エチレン、クロロベンゼン等のハロゲン化炭素系溶媒、メタノール、エタノール、1-プロパノール等のアルコール溶媒が用いられる。 The reaction is carried out in a solvent or without a solvent. The solvent used is not particularly limited as long as it does not react with the ester compound to be used. For example, aromatic solvents such as toluene, xylene and ethylbenzene, ether solvents such as tetrahydrofuran and 1,4-dioxane, acetone, methyl ethyl ketone, etc. Ketone solvents such as methylisobutylketone, amide solvents such as dimethylacetamide and dimethylformamide, carbon halide solvents such as methylene chloride, ethylene dichloride and chlorobenzene, and alcohol solvents such as methanol, ethanol and 1-propanol are used. ..
無機塩基の水溶液中に9,10-ジヒドロキシアントラセン化合物を溶解させ、エステルと反応させる場合は、相間移動触媒の使用が有効である。相間移動触媒としては、例えば、テトラメチルアンモニウムブロマイド、テトラエチルアンモニウムブロマイド、テトラプロピルアンモニウムブロマイド、テトラブチルアンモニウムブロマイド、トリオクチルメチルアンモニウムブロマイド、トリオクチルエチルアンモニウムブロマイド、トリオクチルプロピルアンモニウムブロマイド、トリオクチルブチルアンモニウムブロマイド、ベンジルジメチルオクタデシルアンモニウムブロマイド、テトラメチルアンモニウムクロライド、テトラエチルアンモニウムクロライド、テトラプロピルアンモニウムクロライド、テトラフブチルアンモニウムクロライド、トリオクチルメチルアンモニウムクロライド、トリオクチルエチルアンモニウムクロライド、トリオクチルプロピルアンモニウムクロライド、トリオクチルブチルアンモニウムクロライド、ベンジルジメチルオクタデシルアンモニウムクロライド等が挙げられる。 When the 9,10-dihydroxyanthracene compound is dissolved in an aqueous solution of an inorganic base and reacted with an ester, it is effective to use a phase transfer catalyst. Examples of the phase transfer catalyst include tetramethylammonium bromide, tetraethylammonium bromide, tetrapropylammonium bromide, tetrabutylammonium bromide, trioctylmethylammonium bromide, trioctylethylammonium bromide, trioctylpropylammonium bromide, and trioctylbutylammonium bromide. , Benzyldimethyloctadecylammonium bromide, tetramethylammonium chloride, tetraethylammonium chloride, tetrapropylammonium chloride, tetrafbutylammonium chloride, trioctylmethylammonium chloride, trioctylethylammonium chloride, trioctylpropylammonium chloride, trioctylbutylammonium chloride , Benzyldimethyloctadecylammonium chloride and the like.
相間移動触媒の添加量としては、9,10-ジヒドロキシアントラセン化合物に対して、好ましくは 0.01モル倍以上、1.0モル倍未満、より好ましくは、0.05モル倍以上、0.5モル倍未満である。0.01モル倍未満であると、反応速度が遅く、また、1.0モル倍以上だと生成物の純度が低下するので好ましくない。 The amount of the phase transfer catalyst added is preferably 0.01 mol times or more and less than 1.0 mol times, more preferably 0.05 mol times or more, 0.5 with respect to the 9,10-dihydroxyanthracene compound. It is less than a molar number. If it is less than 0.01 mol times, the reaction rate is slow, and if it is 1.0 mol times or more, the purity of the product is lowered, which is not preferable.
当該反応の反応温度は、通常0℃以上、200℃以下、好ましくは10℃以上、100℃以下である。0℃未満だと、反応時間がかかりすぎ、100℃を超えて加熱すると、不純物が多くなり目的化合物の純度が低下し、共に好ましくない。 The reaction temperature of the reaction is usually 0 ° C. or higher and 200 ° C. or lower, preferably 10 ° C. or higher and 100 ° C. or lower. If it is less than 0 ° C., the reaction time is too long, and if it is heated above 100 ° C., impurities increase and the purity of the target compound decreases, both of which are not preferable.
当該反応における反応時間は、反応温度によって異なるが、通常1時間から20時間程度である。より好ましくは2時間から10時間である。 The reaction time in the reaction varies depending on the reaction temperature, but is usually about 1 to 20 hours. More preferably, it is 2 to 10 hours.
反応終了後、必要に応じて未反応原料・溶媒及び触媒を洗浄・減圧留去・濾過等の操作を単独あるいは複数組み合わせる方法で除去する。生成物が固体の場合は反応途中に結晶が析出するので、濾過によって固液分離を行い、必要に応じてアルコールやヘキサン等の貧溶媒から再結晶させる。あるいはそのままドライアップして結晶を得ることができる。生成物が液体の場合は、そのままドライアップし、必要に応じて蒸留等の精製を行ってエステル基を有する9,10-ビス(アルコキシカルボニルアルキレンオキシ)アントラセン化合物を得ることができる。 After completion of the reaction, unreacted raw materials / solvent and catalyst are removed by a method such as washing, distillation under reduced pressure, filtration, etc., individually or in combination, if necessary. If the product is a solid, crystals will precipitate during the reaction, so solid-liquid separation will be performed by filtration, and if necessary, recrystallized from a poor solvent such as alcohol or hexane. Alternatively, it can be dried up as it is to obtain crystals. When the product is a liquid, it can be dried up as it is, and if necessary, purified by distillation or the like to obtain a 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group.
(光重合性組成物)
本発明の光重合性組成物は、少なくとも、下記の(A)~(C)成分を含有する光重合性組成物であって、その硬化物の5%重量減少温度が200℃以上であることを特徴とする、光重合性組成物である。
(A)一般式(1)で表されるエステル基を有する9,10-ビス(アルコキシカルボニルアルキレンオキシ)アントラセン化合物
(B)エチレン性不飽和基含有重合性化合物。
(C)光重合開始剤。
(Photopolymerizable composition)
The photopolymerizable composition of the present invention is a photopolymerizable composition containing at least the following components (A) to (C), and the 5% weight loss temperature of the cured product is 200 ° C. or higher. It is a photopolymerizable composition characterized by.
(A) A 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group represented by the general formula (1) (B) An ethylenically unsaturated group-containing polymerizable compound.
(C) Photopolymerization initiator.
((A)エステル基を有する9,10-ビス(アルコキシカルボニルアルキレンオキシ)アントラセン化合物)
本発明の一般式(1)で表されるエステル基を有する9,10-ビス(アルコキシカルボニルアルキレンオキシ)アントラセン化合物は、特定の波長の光により励起され、その励起エネルギーを光重合開始剤に受け渡す光重合増感剤として作用する。その効果により、光重合開始剤の活性が十分でない長波長の光によっても、光重合を効率よく開始することが可能となる。当該光重合増感剤と光重合開始剤は光重合化合物と混合して光重合性組成物とすることができる。当該光重合性組成物は、例えば中心波長が405nmの紫外LED光というような長波長の光の照射によっても、容易に光硬化させることができる。
((A) 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group)
The 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group represented by the general formula (1) of the present invention is excited by light of a specific wavelength, and the excitation energy is received by the photopolymerization initiator. Acts as a photopolymerization sensitizer to pass. Due to this effect, photopolymerization can be efficiently initiated even with long-wavelength light in which the activity of the photopolymerization initiator is not sufficient. The photopolymerization sensitizer and the photopolymerization initiator can be mixed with the photopolymerization compound to form a photopolymerizable composition. The photopolymerizable composition can be easily photocured by irradiation with light having a long wavelength such as ultraviolet LED light having a center wavelength of 405 nm.
本発明の一般式(1)で表されるエステル基を有する9,10-ビス(アルコキシカルボニルアルキレンオキシ)アントラセン化合物は、その構造の中にアルキレン基を介したエステル基を有しているため、光重合性組成物やその硬化物との親和性が高く、光重合性組成物やその硬化物中においてマイグレーションあるいはブルーミングの程度がきわめて低いという特徴を有する。また、一般式(1)において、Rがシクロアルキル基、シクロアルキルアルキル基の場合は種々のモノマーに対する溶解度が向上するため、種々のモノマーに高濃度で溶解可能であり、適用範囲が広がるという利点を持っている。特に、シクロヘキシル基である場合が溶解性が高い。 The 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group represented by the general formula (1) of the present invention has an ester group via an alkylene group in its structure. It has a high affinity with the photopolymerizable composition and its cured product, and has a feature that the degree of migration or blooming in the photopolymerizable composition and its cured product is extremely low. Further, in the general formula (1), when R is a cycloalkyl group or a cycloalkylalkyl group, the solubility in various monomers is improved, so that it can be dissolved in various monomers at a high concentration, and the range of application is widened. have. In particular, the case of a cyclohexyl group has high solubility.
また、本発明の一般式(1)で表されるエステル基を有する9,10-ビス(アルコキシカルボニルアルキレンオキシ)アントラセン化合物におけるエステル基は、アルキレン基であるAを介してアントラセン環に結合しているため、Aを介さない化合物に比べ、紫外線の吸収波長がより長波長側にあるという特徴がある。そのため、Aを介さない化合物において増感作用が弱い場合においても有効に用いることができる。 Further, the ester group in the 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group represented by the general formula (1) of the present invention is bonded to the anthracene ring via the alkylene group A. Therefore, there is a feature that the absorption wavelength of ultraviolet rays is on the longer wavelength side as compared with the compound which does not mediate A. Therefore, it can be effectively used even when the sensitizing effect is weak in the compound not mediated by A.
更に、本発明の一般式(1)で表されるエステル基を有する9,10-ビス(アルコキシカルボニルアルキレンオキシ)アントラセン化合物におけるAが炭素数1のメチレン基である化合物は、Aが炭素数2以上の9,10-ビス(アルコキシカルボニルアルキレンオキシ)アントラセン化合物に比べ、ラジカル重合において、その増感能が高いという特徴がある。この効果は、一般にアントラセン化合物はラジカル重合阻害があり、その阻害は9,10位に酸素原子がつくことにより緩和されるが、本発明の一般式(1)で表されるエステル基を有する9,10-ビス(アルコキシカルボニルアルキレンオキシ)アントラセン化合物においてAがメチレン基の化合物は、アントラセン環とエステル基の立体的な位置関係から来ると思われるが、特に、その阻害が弱くなり、ラジカル重合増感剤としての活性が高いものと思われる。 Further, in the 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group represented by the general formula (1) of the present invention, A is a methylene group having 1 carbon atom, and A is 2 carbon atoms. Compared with the above 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound, it is characterized in its high sensitizing ability in radical polymerization. This effect is generally alleviated by the addition of an oxygen atom at the 9th and 10th positions of the anthracene compound, which inhibits radical polymerization, but has an ester group represented by the general formula (1) of the present invention9. , 10-Bis (alkoxycarbonylalkyleneoxy) anthracene compounds in which A is a methylene group are thought to come from the steric positional relationship between the anthracene ring and the ester group, but in particular, the inhibition is weakened and radical polymerization is increased. It seems to have high activity as a sensitizer.
本発明の一般式(1)で表されるエステル基を有する9,10-ビス(アルコキシカルボニルアルキレンオキシ)アントラセン化合物を光重合増感剤として用いることにより、光重合性組成物の光重合速度が著しく促進され、その結果、硬化物中の熱分解性物質が減少し、本発明の光重合増感剤を含有しない光重合組成物に比べ、その硬化物の5%重量減少温度が上昇すると考えられる。そして、その効果により、揮発成分が減少し、硬化物の耐熱性が向上するものと思われる。 By using a 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group represented by the general formula (1) of the present invention as a photopolymerization sensitizer, the photopolymerization rate of the photopolymerizable composition can be increased. It is considered that it is significantly promoted, and as a result, the thermally decomposable substance in the cured product is reduced, and the 5% weight loss temperature of the cured product is increased as compared with the photopolymerization composition containing no photopolymerization sensitizer of the present invention. Be done. Then, it is considered that the effect reduces the volatile components and improves the heat resistance of the cured product.
特に、後述するアルカリ可溶性重合性化合物が光重合性組成物に含まれる場合は、その硬化物の5%重量減少温度が200℃以上となることが重要である。アルカリ可溶性重合性化合物を用いる用途としては、エッチングなどの用いられるレジスト材料が想定されるが、その場合、パターン化した光照射により、硬化する部分と未硬化の部分を形成し、未硬化のアルカリ可溶性重合性化合物を除去することが想定される。その場合、その硬化物の5%重量減少温度が低い硬化物では、硬化部分にも未反応のモノマーが残存し硬化部分も一部アルカリ洗浄により除去されてしまうことから、硬化と未硬化の境界が不鮮明となり、予定していた形状のパターンが形成されないこととなる場合がある。よって、その硬化物の5%重量減少温度が200℃以上となることが重要となる。特に、LED光のような照射エネルギーの低い単一波長の光を用いて硬化する場合、本発明のエステル基を有する9,10-ビス(アルコキシカルボニルアルキレンオキシ)アントラセン化合物を光重合増感剤として用いることにより、パターニングに耐える硬化塗膜を形成することができる。 In particular, when an alkali-soluble polymerizable compound described later is contained in the photopolymerizable composition, it is important that the 5% weight loss temperature of the cured product is 200 ° C. or higher. A resist material used for etching or the like is assumed to be used as an alkali-soluble polymerizable compound. In that case, a cured portion and an uncured portion are formed by patterned light irradiation, and the uncured alkali is used. It is envisioned that soluble polymerizable compounds will be removed. In that case, in the cured product having a low 5% weight loss temperature of the cured product, unreacted monomers remain in the cured portion and the cured portion is partially removed by alkaline cleaning. May become unclear and the pattern of the expected shape may not be formed. Therefore, it is important that the 5% weight loss temperature of the cured product is 200 ° C. or higher. In particular, when curing is performed using light of a single wavelength having low irradiation energy such as LED light, a 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group of the present invention is used as a photopolymerization sensitizer. By using it, a cured coating film that can withstand patterning can be formed.
また、顔料が光重合性組成物に含まれる場合、顔料が照射された光の一部を吸収するため、光重合性組成物の光重合が十分に進行しないことが多い。特に、黒色顔料を添加した場合は、その影響が顕著である。そのような照射光が弱くなった状態でも、本発明のエステル基を有する9,10-ビス(アルコキシカルボニルアルキレンオキシ)アントラセン化合物を光重合増感剤として用いることにより、十分な硬化速度を維持でき、硬化膜を形成することができる。 Further, when the pigment is contained in the photopolymerizable composition, a part of the light irradiated by the pigment is absorbed, so that the photopolymerization of the photopolymerizable composition often does not proceed sufficiently. In particular, when a black pigment is added, the effect is remarkable. Even in such a state where the irradiation light is weakened, a sufficient curing rate can be maintained by using the 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group of the present invention as a photopolymerization sensitizer. , A cured film can be formed.
((C)光重合開始剤)
本発明で用いる光重合開始剤としては、ベンジルメチルケタール系重合開始剤、α-ヒドロキシアルキルフェノン系重合開始剤、オキシムエステル系重合開始剤、α-アミノアセトフェノン系重合開始剤、アシルホスフィンオキサイド系重合開始剤、ビイミダゾール系重合開始剤、トリアジン系重合開始剤、チオキサントン系重合開始剤等を用いることができる。
((C) Photopolymerization Initiator)
Examples of the photopolymerization initiator used in the present invention include a benzylmethyl ketal-based polymerization initiator, an α-hydroxyalkylphenone-based polymerization initiator, an oxime ester-based polymerization initiator, an α-aminoacetophenone-based polymerization initiator, and an acylphosphine oxide-based polymerization initiator. An initiator, a biimidazole-based polymerization initiator, a triazine-based polymerization initiator, a thioxanthone-based polymerization initiator, and the like can be used.
本発明の一般式(1)で表されるエステル基を有する9,10-ビス(アルコキシカルボニルアルキレンオキシ)アントラセン化合物は、ベンジルメチルケタール系重合開始剤、α-ヒドロキシアルキルフェノン系重合開始剤、ビイミダゾール系重合開始剤等の長波長に吸収を持たないラジカル重合開始剤に対して優れた光重合増感効果を有している。更に、長波長域に吸収を持つアシルホスフィンオキサイド系等の重合開始剤を用いた重合反応においても、その重合速度を増加する効果、あるいは得られる重合物の物性を改善する効果を有している。 The 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group represented by the general formula (1) of the present invention is a benzylmethyl ketal-based polymerization initiator, an α-hydroxyalkylphenone-based polymerization initiator, or bi. It has an excellent photopolymerization sensitizing effect on radical polymerization initiators such as imidazole-based polymerization initiators that do not absorb at long wavelengths. Further, even in a polymerization reaction using a polymerization initiator such as an acylphosphine oxide having absorption in a long wavelength region, it has an effect of increasing the polymerization rate or an effect of improving the physical properties of the obtained polymer. ..
ベンジルメチルケタール系重合開始剤としては、2,2-ジメトキシ-1,2-ジフェニルエタン-1-オン(商品名「イルガキュア651」ビー・エー・エス・エフ社製)等が挙げられ、α-ヒドロキシアルキルフェノン系ラジカル重合開始剤としては2-ヒドロキシ-2-メチル-1-フェニルプロパン-1-オン(商品名「ダロキュア1173」ビー・エー・エス・エフ社製)、1-ヒドロキシシクロヘキシルフェニルケトン(商品名「イルガキュア184」ビー・エー・エス・エフ社製)、1-[4-(2-ヒドロキシエトキシ)-フェニル]-2-ヒドロキシ-2-メチル-1-プロパン-1-オン(商品名「イルガキュア2959」ビー・エー・エス・エフ社製)、2-ヒドロキシ-1-{4-[4-(2-ヒドロキシ-2-メチルプロピオニル)-ベンジル]フェニル}-2-メチル-1-オン(商品名「イルガキュア127」ビー・エー・エス・エフ社製)が挙げられる。 Examples of the benzylmethyl ketal polymerization initiator include 2,2-dimethoxy-1,2-diphenylethane-1-one (trade name "Irgacure 651" manufactured by BASF) and the like, and α- As a hydroxyalkylphenone-based radical polymerization initiator, 2-hydroxy-2-methyl-1-phenylpropan-1-one (trade name "Darocure 1173" manufactured by BASF), 1-hydroxycyclohexylphenyl ketone (Product name "Irgacure 184" manufactured by BASF), 1- [4- (2-hydroxyethoxy) -phenyl] -2-hydroxy-2-methyl-1-propane-1-one (product) Name "Irgacure 2959" manufactured by BASF), 2-Hydroxy-1- {4- [4- (2-hydroxy-2-methylpropionyl) -benzyl] phenyl} -2-methyl-1- On (trade name "Irgacure 127" manufactured by BASF) can be mentioned.
特に、ベンジルメチルケタール系重合開始剤である2,2-ジメトキシ-1,2-ジフェニルエタン-1-オン(商品名「イルガキュア651」ビー・エー・エス・エフ社製)、α-ヒドロキシアルキルフェノン系ラジカル重合開始剤である2-ヒドロキシ-2-メチル-1-フェニルプロパン-1-オン(商品名「ダロキュア1173」ビー・エー・エス・エフ社製)、1-ヒドロキシシクロヘキシルフェニルケトン(商品名「イルガキュア184」ビー・エー・エス・エフ社製)が好ましい。 In particular, 2,2-dimethoxy-1,2-diphenylethane-1-one (trade name "Irgacure 651" manufactured by BASF), which is a benzylmethyl ketal polymerization initiator, α-hydroxyalkylphenone. 2-Hydroxy-2-methyl-1-phenylpropan-1-one (trade name "DaroCure 1173" manufactured by BAS), 1-hydroxycyclohexylphenylketone (trade name), which is a system radical polymerization initiator. "Irgacure 184" manufactured by BASF) is preferable.
また、アセトフェノン系重合開始剤であるアセトフェノン、2-ヒドロキシ-2-フェニルアセトフェノン、2-エトキシ-2-フェニルアセトフェノン、2-メトキシ-2-フェニルアセトフェノン、2-イソプロポキシ-2-フェニルアセトフェノン、2-イソブトキシ-2-フェニルアセトフェノン、ベンジル系重合開始剤であるベンジル、4,4’-ジメトキシベンジル、アントラキノン系重合開始剤である2-エチルアントラキノン、2-tert-ブチルアントラキノン、2-フェノキシアントラキノン、2-(フェニルチオ)アントラキノン、2-(ヒドロキシエチルチオ)アントラキノン等も用いることができる。 In addition, acetophenone, 2-hydroxy-2-phenylacetophenone, 2-ethoxy-2-phenylacetophenone, 2-methoxy-2-phenylacetophenone, 2-isopropoxy-2-phenylacetophenone, 2-isopropoxy-2-phenylacetophenone, which are acetophenone-based polymerization initiators, Isobutoxy-2-phenylacetophenone, benzyl-based polymerization initiator benzyl, 4,4'-dimethoxybenzyl, anthraquinone-based polymerization initiator 2-ethylanthraquinone, 2-tert-butylanthraquinone, 2-phenoxyantraquinone, 2- (Phenylthio) anthraquinone, 2- (hydroxyethylthio) anthraquinone and the like can also be used.
ビイミダゾール系重合開始剤としては、2-(o-クロロフェニル)-4,5-ジフェニルイミダゾール二量体、2-(o-クロロフェニル)-4,5-ジ(メトキシフェニル)イミダゾール二量体、2-(o-フルオロフェニル)-4,5-ジフェニルイミダゾール二量体、2-(o-メトキシフェニル)-4,5-ジフェニルイミダゾール二量体、2-(p-メトキシフェニル)-4,5-ジフェニルイミダゾール二量体等の2,4,5-トリアリールイミダゾール二量体等が挙げられる。 Examples of the biimidazole-based polymerization initiator include 2- (o-chlorophenyl) -4,5-diphenylimidazole dimer, 2- (o-chlorophenyl) -4,5-di (methoxyphenyl) imidazole dimer, and 2 -(O-fluorophenyl) -4,5-diphenylimidazole dimer, 2- (o-methoxyphenyl) -4,5-diphenylimidazole dimer, 2- (p-methoxyphenyl) -4,5- Examples thereof include 2,4,5-triarylimidazole dimers such as diphenylimidazole dimer.
α-アミノアセトフェノン系重合開始剤としては、2-メチル-1-[4-(メチルチオ)フェニル]-2-モルフォリノプロパン-1-オン(商品名「イルガキュア907」ビー・エー・エス・エフ社製)、2-ベンジル-2-(ジメチルアミノ)-4’-モルフォリノブチロフェノン(商品名「イルガキュア369」ビー・エー・エス・エフ社製)、2-ジメチルアミノ-2-(4-メチルベンジル)-1-(4-モルフォリノ-4-イル-フェニル)ブタンー1-オン(商品名「イルガキュア379」ビー・エー・エス・エフ社製)等が挙げられる。 As an α-aminoacetophenone-based polymerization initiator, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane-1-one (trade name "Irgacure 907", BASF, Inc.) , 2-Benzyl-2- (dimethylamino) -4'-morpholinobtyrophenone (trade name "Irgacure 369" manufactured by B.S.F.), 2-dimethylamino-2- (4-methylbenzyl) ) -1- (4-morpholino-4-yl-phenyl) butane-1-one (trade name "Irgacure 379" manufactured by BASF Co., Ltd.) and the like.
アシルホスフィンオキサイド系重合開始剤としては2,4,6-トリメチルベンゾイル-ジフェニルホスフィンオキサイド(商品名「イルガキュアTPO」ビー・エー・エス・エフ社製)、ビス(2,4,6-トリメチルベンゾイル)フェニルホスフィンオキサイド(商品名「イルガキュア819」ビー・エー・エス・エフ社製)等が挙げられる。 Acylphosphine oxide-based polymerization initiators include 2,4,6-trimethylbenzoyl-diphenylphosphine oxide (trade name "Irgacure TPO" manufactured by BASF), bis (2,4,6-trimethylbenzoyl). Examples thereof include phenylphosphine oxide (trade name "Irgacure 819" manufactured by BASF Co., Ltd.).
オキシムエステル系重合開始剤としては1,2-オクタンジオン、1-[4-(フェニルチオ)フェニル]-、2-(о-ベンゾイルオキシム)(商品名「イルガキュアOXE01」ビー・エー・エス・エフ社製)、エタノン、1-[9-エチル-6-(2-メチルベンゾイル)-9H-カルバゾール-3-イル]-、1-(о-アセチルオキシム)(商品名「イルガキュアOXE02」ビー・エー・エス・エフ社製)、[8-[[(アセチルオキシ)イミノ][2-(2,2,3,3-テトラフルオロプロポキシ)フェニル]メチル]-11-(2-エチルヘキシル)-11H-ベンゾ[a]カルバゾール-5-イル]-,(2,4,6-トリメチルフェニル)(商品名「イルガキュアOXE03」ビー・エー・エス・エフ社製)等が挙げられる。 As an oxime ester-based polymerization initiator, 1,2-octanedione, 1- [4- (phenylthio) phenyl]-, 2- (о-benzoyloxime) (trade name "Irgacure OXE01" BASF) , Etanone, 1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazole-3-yl]-, 1- (о-acetyloxime) (trade name "Irgacure OXE02" B.A. S.F.), [8-[[(Acetyloxy) imino] [2- (2,2,3,3-tetrafluoropropoxy) phenyl] methyl] -11- (2-ethylhexyl) -11H-benzo [A] Carbazole-5-yl]-, (2,4,6-trimethylphenyl) (trade name "Irgacure OXE03" manufactured by BASF) and the like can be mentioned.
トリアジン系重合開始剤としては2-(3,4-メチレンジオキシフェニル)-4,6-ビス(トリクロロメチル)-1,3,5-トリアジン、2-(4-メトキシフェニル)-4,6-ビス(トリクロロメチル)-1,3,5-トリアジン等が挙げられる。 Triazine-based polymerization initiators include 2- (3,4-methylenedioxyphenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine and 2- (4-methoxyphenyl) -4,6. -Bis (trichloromethyl) -1,3,5-triazine and the like can be mentioned.
チオキサントン系重合開始剤としては、2,4-ジエチルチオキサントン、2-イソプロピルチオキサントン等が挙げられる。 Examples of the thioxanthone-based polymerization initiator include 2,4-diethylthioxanthone and 2-isopropylthioxanthone.
本発明で用いることができる、オニウム塩系集合開始剤、ベンジルメチルケタール系重合開始剤、α-ヒドロキシアルキルフェノン系重合開始剤、オキシムエステル系光重合開始剤、α-アミノアセトフェノン系光重合開始剤、アシルホスフィンオキサイド系光重合開始剤、ビイミダゾール系重合開始剤、トリアジン系重合開始剤、チオキサントン系重合開始剤は、それぞれ単独で用いることもできるが、用途等に合わせて、複数種類を合わせて用いることもできる。 Onium salt-based aggregation initiator, benzylmethyl ketal-based polymerization initiator, α-hydroxyalkylphenone-based polymerization initiator, oxime ester-based photopolymerization initiator, α-aminoacetophenone-based photopolymerization initiator that can be used in the present invention. , Acylphosphine oxide-based photopolymerization initiator, biimidazole-based polymerization initiator, triazine-based polymerization initiator, and thioxanthone-based polymerization initiator can be used alone, but a plurality of types can be combined according to the intended use. It can also be used.
上記挙げた光重合開始剤の中でも、ビイミダゾール系光重合開始剤、アルキルフェノン系光重合開始剤、トリアジン系光重合開始剤、アシルホスフィンオキサイド系光重合開始剤およびオキシム系光重合開始剤が好ましい。 Among the above-mentioned photopolymerization initiators, biimidazole-based photopolymerization initiators, alkylphenone-based photopolymerization initiators, triazine-based photopolymerization initiators, acylphosphine oxide-based photopolymerization initiators, and oxime-based photopolymerization initiators are preferable. ..
そして、本発明の光重合増感剤の効果が高く、活性という点で、ビイミダゾール系光重合開始剤、オキシムエステル系光重合開始剤が特に好ましい。 The biimidazole-based photopolymerization initiator and the oxime ester-based photopolymerization initiator are particularly preferable in terms of the high effect and activity of the photopolymerization sensitizer of the present invention.
本発明の一般式(1)で表されるエステル基を有する9,10-ビス(アルコキシカルボニルアルキレンオキシ)アントラセン化合物を含有する光重合増感剤の光重合開始剤に対する使用量は、特に限定されないが、光重合開始剤に対して通常5重量%以上、100重量%以下の範囲、好ましくは10重量%以上、50重量%以下の範囲である。光重合増感剤の使用量が5重量%未満では重合性化合物を光重合させるのに時間がかかりすぎてしまい、一方、100重量%を超えて使用しても添加に見合う効果は得られない。 The amount of the photopolymerization sensitizer containing the 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group represented by the general formula (1) of the present invention for the photopolymerization initiator is not particularly limited. However, it is usually in the range of 5% by weight or more and 100% by weight or less, preferably 10% by weight or more and 50% by weight or less with respect to the photopolymerization initiator. If the amount of the photopolymerization sensitizer used is less than 5% by weight, it takes too much time to photopolymerize the polymerizable compound, while if it is used in excess of 100% by weight, the effect commensurate with the addition cannot be obtained. ..
(光重合開始剤組成物)
本発明の一般式(1)で表されるエステル基を有する9,10-ビス(アルコキシカルボニルアルキレンオキシ)アントラセン化合物を含有する光重合増感剤は、直接、重合性化合物に添加することもできるが、あらかじめ光重合開始剤と配合することにより光重合開始剤組成物を調製した後、重合性化合物に添加することもできる。すなわち、本発明の光重合開始剤組成物は、少なくとも、一般式(1)で表されるエステル基を有する9,10-ビス(アルコキシカルボニルアルキレンオキシ)アントラセン化合物を含有する光重合増感剤と光重合開始剤を含有する組成物である。
(Photopolymerization Initiator Composition)
The photopolymerization sensitizer containing a 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group represented by the general formula (1) of the present invention can also be directly added to the polymerizable compound. However, it is also possible to prepare a photopolymerization initiator composition by blending it with a photopolymerization initiator in advance, and then add it to the polymerizable compound. That is, the photopolymerization initiator composition of the present invention is a photopolymerization sensitizer containing at least a 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group represented by the general formula (1). It is a composition containing a photopolymerization initiator.
((B)エチレン性不飽和基含有重合性化合物)
エチレン性不飽和基含有重合性化合物としては、例えば、スチレン、酢酸ビニル、アクリロニトリル、メタクリロニトリル、アクリルアミド、アクリル酸エステル、メタクリル酸エステル等の二重結合を有する有機化合物を用いることができる。これらのラジカル重合性化合物のうち、フィルム形成能等の面から、アクリル酸エステルやメタクリル酸エステル(以下、両者をあわせて(メタ)アクリル酸エステルという)が好ましい。(メタ)アクリル酸エステルとしては、アクリル酸メチル、アクリル酸ブチル、アクリル酸シクロヘキシル、アクリル酸-2-エチルヘキシル、アクリル酸-2-ヒドロキシエチル、アクリル酸イソボルニル、メタクリル酸メチル、メタクリル酸ブチル、メタクリル酸シクロヘキシル、フェノキシエチルメタクリレート、ノニルフェノキシ-ポリプロピレングリコールアクリレート、1,2,2,6,6-ペンタメチルピペリジルメタクリレート、テトラエチレングリコールジアクリレート、トリメチロールプロパントリアクリレート、ペンタエリスリトールトリアクリレート、トリシクロ[5,2,1,02,6]デカンジメタノールジアクリレート、ポリプロピレングリコールジメタクリレート、エチレンオキシド(EO)変性ビスフェノールAジアクリレート、EO変性ビスフェノールAジメタクリレート、プロピレンオキシ度(PO)変性ビスフェノールAジアクリレート、PO変性ビスフェノールAジメタクリレート、EO変性ネオペンチルグリコールジアクリレート、EO変性ネオペンチルグリコールジメタクリレート、EO変性グリセロールトリアクリレート、エピクロルヒドリン(ECH)変性ジアクリレート、ECH変性ジメタクリレート、ECH変性エチレングリコールジアクリレート、ECH変性エチレングリコールジメタクリレート、ECH変性プロピレングリコールジアクリレート、ECH変性プロピレングリコールジメタクリレート、ECH変性フタル酸ジアクリレート、ECH変性フタル酸ジメタクリレートPO変性グリセロールトリアクリレート、ECH変性グリセロールトリアクリレート、EO変性グリセロールトリメタクリレート、PO変性グリセロールトリメタクリレート、ECH変性グリセロールトリメタクリレート、EO変性トリメチロールプロパントリアクリレート、PO変性トリメチロールプロパントリアクリレート、イソボニルメタクリレート、エポキシアクリレート、ウレタンアクリレート、ポリエステルアクリレート、ポリブタジエンアクリレート、ポリオールアクリレート、ポリエーテルアクリレート、シリコーン樹脂アクリレート、イミドアクリレート等が挙げられる。これらの重合性化合物は、一種でも二種以上の混合物であっても良い。
((B) Ethylene unsaturated group-containing polymerizable compound)
As the ethylenically unsaturated group-containing polymerizable compound, for example, an organic compound having a double bond such as styrene, vinyl acetate, acrylonitrile, methacrylonitrile, acrylamide, acrylic acid ester, and methacrylic acid ester can be used. Among these radically polymerizable compounds, acrylic acid ester and methacrylic acid ester (hereinafter, both are collectively referred to as (meth) acrylic acid ester) are preferable from the viewpoint of film forming ability and the like. Examples of the (meth) acrylate ester include methyl acrylate, butyl acrylate, cyclohexyl acrylate, -2-ethylhexyl acrylate, -2-hydroxyethyl acrylate, isobornyl acrylate, methyl methacrylate, butyl methacrylate, and methacrylic acid. Cyclohexyl, phenoxyethyl methacrylate, nonylphenoxy-polypropylene glycol acrylate, 1,2,2,6,6-pentamethylpiperidyl methacrylate, tetraethylene glycol diacrylate, trimethylpropantriacrylate, pentaerythritol triacrylate, tricyclo [5,2] , 1,02,6] Decanedimethanol diacrylate, polypropylene glycol dimethacrylate, ethylene oxide (EO) modified bisphenol A diacrylate, EO modified bisphenol A dimethacrylate, propylene oxy degree (PO) modified bisphenol A diacrylate, PO modified bisphenol A dimethacrylate, EO-modified neopentyl glycol diacrylate, EO-modified neopentyl glycol dimethacrylate, EO-modified glycerol triacrylate, epichlorohydrin (ECH) -modified diacrylate, ECH-modified dimethacrylate, ECH-modified ethylene glycol diacrylate, ECH-modified ethylene glycol Dimethacrylate, ECH-modified propylene glycol diacrylate, ECH-modified propylene glycol dimethacrylate, ECH-modified phthalic acid diacrylate, ECH-modified phthalic acid dimethacrylate PO-modified glycerol triacrylate, ECH-modified glycerol triacrylate, EO-modified glycerol trimethacrylate, PO-modified Gglycerol trimethacrylate, ECH-modified glycerol trimethacrylate, EO-modified trimethylolpropane triacrylate, PO-modified trimethylolpropanetriacrylate, isobonyl methacrylate, epoxy acrylate, urethane acrylate, polyester acrylate, polybutadiene acrylate, polyol acrylate, polyether acrylate, silicone. Examples thereof include resin acrylates and imide acrylates. These polymerizable compounds may be one kind or a mixture of two or more kinds.
((D)アルカリ可溶性重合性化合物)
本発明の光重合性組成物には、アルカリ可溶性重合性化合物を含有することができる。アルカリ可溶性重合性化合物としては、水酸基及び/又はカルボキシル基とエチレン性不飽和結合基とを有する化合物を好ましく用いることができる。エポキシ化合物のように反応中に水酸基を発生する基とチレン性不飽和結合基とを有する化合物でもよい。
((D) Alkali-soluble polymerizable compound)
The photopolymerizable composition of the present invention can contain an alkali-soluble polymerizable compound. As the alkali-soluble polymerizable compound, a compound having a hydroxyl group and / or a carboxyl group and an ethylenically unsaturated bond group can be preferably used. A compound having a group that generates a hydroxyl group during the reaction and a thyrene unsaturated bond group, such as an epoxy compound, may also be used.
水酸基とエチレン性不飽和結合基とを有する化合物としては、例えば、2-ヒドロキシエチル(メタ)アクリレート、2-ヒドロキシプロピル(メタ)アクリレート、3-ヒドロキシプロピル(メタ)アクリレート、2-ヒドロキシブチル(メタ)アクリレート、3-ヒドロキシブチル(メタ)アクリレート、4-ヒドロキシブチル(メタ)アクリレート、2-ヒドロキシ-3-フェノキシプロピルアクリレート、2-アクリロイロキシエチル-2-ヒドロキシエチル-フタル酸、グリセロールモノ(メタ)アクリレート、ジヒドロキシアクリレート、グリセロール(メタ)アクリレート、ペンタエリスリトールモノ(メタ)アクリレート、ジペンタエリスリトールモノ(メタ)アクリレートなどが挙げられる。更に、2-ヒドロキシ3-アクリロイロキシプロピルメタクリレート、ペンタエリスリトールジ(メタ)アクリレート、ジペンタエリスリトールジ(メタ)アクリレート、ペンタエリスリトールジアクリレート、イソシアヌル酸EO変性ジアクリレート、ペンタエリスリトールトリ(メタ)アクリレート、ジペンタエリスリトールトリ(メタ)アクリレート、ジペンタエリスリトールテトラ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレート等が挙げられる。反応によって水酸基を生じるグリシジル(メタ)アクリレートなども挙げられるが、これらに限定されるものではない。 Examples of the compound having a hydroxyl group and an ethylenically unsaturated bond group include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, and 2-hydroxybutyl (meth). ) Acrylate, 3-hydroxybutyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-acryloyloxyethyl-2-hydroxyethyl-phthalic acid, glycerol mono (meth) ) Acrylate, dihydroxy acrylate, glycerol (meth) acrylate, pentaerythritol mono (meth) acrylate, dipentaerythritol mono (meth) acrylate and the like can be mentioned. Further, 2-hydroxy3-acryloyloxypropyl methacrylate, pentaerythritol di (meth) acrylate, dipentaerythritol di (meth) acrylate, pentaerythritol diacrylate, isocyanuric acid EO-modified diacrylate, pentaerythritol tri (meth) acrylate, Examples thereof include dipentaerythritol tri (meth) acrylate, dipentaerythritol tetra (meth) acrylate, and dipentaerythritol penta (meth) acrylate. Examples thereof include, but are not limited to, glycidyl (meth) acrylate that produces a hydroxyl group by the reaction.
カルボキシル基とエチレン性不飽和結合基とを有する化合物としては、例えば、アクリル酸、メタクリル酸、2-アクリロイルオキシエチルサクシネート、クロトン酸、イソクロトン酸、チグリン酸、3-メチルクロトン酸、2-メチル-2-ペンテン酸、α-ヒドロキシアクリル酸、α-クロロアクリル酸、桂皮酸などが挙げられる。更に、例えば、マレイン酸、フマル酸、イタコン酸、シトラコン酸、メサコン酸などが挙げられる。また、コハク酸モノ(2-アクリロイルオキシエチル)、コハク酸モノ(2-メタクリロイルオキシエチル)、フタル酸モノ(2-アクリロイルオキシエチル)、フタル酸モノ(2-メタクリロイルオキシエチル)などが挙げられる。更には、例えば、ω-カルボキシポリカプロラクトンモノアクリレート、ω-カルボキシポリカプロラクトンモノメタクリレートなども挙げられる。 Examples of the compound having a carboxyl group and an ethylenically unsaturated bond group include acrylic acid, methacrylic acid, 2-acryloyloxyethyl succinate, crotonic acid, isocrotonic acid, tiglic acid, 3-methylcrotonic acid and 2-methyl. Examples thereof include -2-pentenoic acid, α-hydroxyacrylic acid, α-chloroacrylic acid and cinnamic acid. Further, for example, maleic acid, fumaric acid, itaconic acid, citraconic acid, mesaconic acid and the like can be mentioned. In addition, monosuccinate (2-acryloyloxyethyl), monosuccinate (2-methacryloyloxyethyl), mono-phthalate (2-acryloyloxyethyl), mono-phthalate (2-methacryloyloxyethyl) and the like can be mentioned. Further, for example, ω-carboxypolycaprolactone monoacrylate, ω-carboxypolycaprolactone monomethacrylate and the like can be mentioned.
アルカリ可溶性重合性化合物として、単量体だけではなく、オリゴマー化した化合物、アルカリ可溶性樹脂でもよい。アルカリ可溶性樹脂としては、ネガ型レジストに一般的に用いられるものを用いることができ、アルカリ水溶液に可溶性を有するものであればよく、特に限定されない。例えば、メチル(メタ)アクリレート、エチル(メタ)アクリレート、n-プロピル(メタ)アクリレート、イソプロピル(メタ)アクリレート、n-ブチル(メタ)アクリレート、sec-ブチル(メタ)アクリレート、イソブチル(メタ)アクリレート、tert-ブチル(メタ)アクリレート、n-ペンチル(メタ)アクリレート、n-ヘキシル(メタ)アクリレート、2-エチルヘキシル(メタ)アクリレート、n-オクチル(メタ)アクリレート、n-デシル(メタ)アクリレート、ベンジル(メタ)アクリレート、スチレン、γ-メチルスチレン、N-ビニル-2-ピロリドン、グリシジル(メタ)アクリレート等の中から選ばれる1種以上と、(メタ)アクリル酸、イタコン酸、クロトン酸、マレイン酸、フマル酸、ビニル酢酸、これらの無水物の中から選ばれる1種以上とからなるコポリマーを例示することができ、上記のコポリマーにグリシジル基又は水酸基を有するエチレン性不飽和化合物を付加させたポリマー等も例示できる。また、例えば、(メタ)アクリル酸などの不飽和カルボン酸と、スチレン、α-メチルスチレン、低級アルキル(メタ)アクリレート、イソブチレンなどの不飽和基含有化合物との共重合により得られるカルボキシル基含有樹脂、脂肪族ジイソシアネート、分岐脂肪族ジイソシアネート、脂環式ジイソシアネート、芳香族ジイソシアネートなどのジイソシアネートと、ジメチロールプロピオン酸、ジメチロールブタン酸などのカルボキシル基含有ジアルコール化合物およびポリカーボネート系ポリオール、ポリエーテル系ポリオール、ポリエステル系ポリオール、ポリオレフィン系ポリオール、アクリル系ポリオール、ビスフェノールA系アルキレンオキシド付加体ジオール、フェノール性ヒドロキシル基およびアルコール性ヒドロキシル基を有する化合物などのジオール化合物の重付加反応によるカルボキシル基含有ウレタン樹脂、脂肪族ジイソシアネート、分岐脂肪族ジイソシアネート、脂環式ジイソシアネート、芳香族ジイソシアネートなどのジイソシアネート化合物と、ポリカーボネート系ポリオール、ポリエーテル系ポリオール、ポリエステル系ポリオール、ポリオレフィン系ポリオール、アクリル系ポリオール、ビスフェノールA系アルキレンオキシド付加体ジオール、フェノール性ヒドロキシル基およびアルコール性ヒドロキシル基を有する化合物などのジオール化合物の重付加反応によるウレタン樹脂の末端に酸無水物を反応させてなる末端カルボキシル基含有ウレタン樹脂、ジイソシアネートと、ビスフェノールA型エポキシ樹脂、水添ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビスフェノールS型エポキシ樹脂、ビキシレノール型エポキシ樹脂、ビフェノール型エポキシ樹脂などの2官能エポキシ樹脂の(メタ)アクリレートもしくはその部分酸無水物変性物、カルボキシル基含有ジアルコール化合物およびジオール化合物の重付加反応によるカルボキシル基含有ウレタン樹脂、ヒドロキシアルキル(メタ)アクリレートなどの分子中に1つの水酸基と1つ以上の(メタ)アクリロイル基を有する化合物を加え、末端(メタ)アクリル化したカルボキシル基含有ウレタン樹脂などが挙げられる。アルカリ可溶性樹脂の市販品としては、ダイヤナールNRシリーズ(三菱レイヨン社製)、ビスコートR-264、KSレジスト106(大阪有機化学工業社製)、Ebecryl3800(ダイセルユーシービー社製)、アクリキュアーRD-F8(日本触媒社製)、フォレットZAH―110(綜研化学社製)などが挙げられる。 The alkali-soluble polymerizable compound may be not only a monomer but also an oligomerized compound or an alkali-soluble resin. As the alkali-soluble resin, those generally used for negative resists can be used, as long as they are soluble in an aqueous alkali solution, and are not particularly limited. For example, methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, n-butyl (meth) acrylate, sec-butyl (meth) acrylate, isobutyl (meth) acrylate, tert-butyl (meth) acrylate, n-pentyl (meth) acrylate, n-hexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, n-octyl (meth) acrylate, n-decyl (meth) acrylate, benzyl ( One or more selected from meta) acrylate, styrene, γ-methylstyrene, N-vinyl-2-pyrrolidone, glycidyl (meth) acrylate, etc., and (meth) acrylic acid, itaconic acid, crotonic acid, maleic acid, Examples thereof include a copolymer composed of fumaric acid, vinyl acetic acid, and one or more selected from these anhydrides, such as a polymer obtained by adding an ethylenically unsaturated compound having a glycidyl group or a hydroxyl group to the above copolymer. Can also be exemplified. Further, for example, a carboxyl group-containing resin obtained by copolymerizing an unsaturated carboxylic acid such as (meth) acrylic acid with an unsaturated group-containing compound such as styrene, α-methylstyrene, lower alkyl (meth) acrylate, and isobutylene. , Alious diisocyanates, branched aliphatic diisocyanates, alicyclic diisocyanates, aromatic diisocyanates and other diisocyanates, carboxyl group-containing dialcohol compounds such as dimethylolpropionic acid and dimethylolbutanoic acid, polycarbonate-based polyols, polyether-based polyols, Carboxylic group-containing urethane resin by double addition reaction of diol compounds such as polyester-based polyol, polyolefin-based polyol, acrylic-based polyol, bisphenol A-based alkylene oxide adduct diol, compound having phenolic hydroxyl group and alcoholic hydroxyl group, aliphatic Diisocyanate compounds such as diisocyanate, branched aliphatic diisocyanate, alicyclic diisocyanate, aromatic diisocyanate, polycarbonate-based polyol, polyether-based polyol, polyester-based polyol, polyolefin-based polyol, acrylic polyol, bisphenol A-based alkylene oxide adduct diol , A terminal carboxyl group-containing urethane resin obtained by reacting an acid anhydride at the end of a urethane resin by a double addition reaction of a diol compound such as a compound having a phenolic hydroxyl group and an alcoholic hydroxyl group, diisocyanate, and a bisphenol A type epoxy resin. , (Meta) acrylate of bifunctional epoxy resin such as hydrogenated bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, bixylenol type epoxy resin, biphenol type epoxy resin or its partial acid anhydride modified product , A compound having one hydroxyl group and one or more (meth) acryloyl groups in a molecule such as a carboxyl group-containing urethane resin or a hydroxyalkyl (meth) acrylate by a double addition reaction of a carboxyl group-containing dialcohol compound and a diol compound is added. , End (meth) acrylicized carboxyl group-containing urethane resin and the like. Commercially available alkali-soluble resins include Dianal NR series (manufactured by Mitsubishi Rayon), Viscort R-264, KS resist 106 (manufactured by Osaka Organic Chemical Industry Co., Ltd.), Ebeclyl3800 (manufactured by Daicel UCB), and Acrycure RD- Examples thereof include F8 (manufactured by Nippon Catalyst Co., Ltd.) and Foret ZAH-110 (manufactured by Soken Kagaku Co., Ltd.).
((E)顔料)
顔料としては、無機顔料及び有機顔料のいずれも使用することができる。無機顔料としては、ファーネスブラック、ランプブラック、アセチレンブラック、チャネルブラック等のカーボンブラック(C.I.ピグメントブラック7)類、酸化鉄、酸化チタンを使用することができる。 有機顔料としては、不溶性アゾ顔料、縮合アゾ顔料、アゾレーキ、キレートアゾ顔料等のアゾ顔料、フタロシアニン顔料、ペリレン及びペリノン顔料、アントラキノン顔料、キナクリドン顔料、ジオキサン顔料、チオインジゴ顔料、イソインドリノン顔料、キノフタロン顔料等の多環式顔料、染料キレート(例えば、塩基性染料型キレート、酸性染料型キレート等)、染色レーキ(塩基性染料型レーキ、酸性染料型レーキ)、ニトロ顔料、ニトロソ顔料、アニリンブラック、昼光蛍光顔料が挙げられる。これらの顔料は1種単独で用いてもよく、2種以上を併用してもよい。
((E) Pigment)
As the pigment, either an inorganic pigment or an organic pigment can be used. As the inorganic pigment, carbon black (CI pigment black 7) such as furnace black, lamp black, acetylene black, and channel black, iron oxide, and titanium oxide can be used. Examples of organic pigments include azo pigments such as insoluble azo pigments, condensed azo pigments, azolakes and chelate azo pigments, phthalocyanine pigments, perylene and perinone pigments, anthraquinone pigments, quinacridone pigments, dioxane pigments, thioindigo pigments, isoindolinone pigments and quinophthalone pigments. Polycyclic pigments, dye chelate (for example, basic dye type chelate, acidic dye type chelate, etc.), dyeing lake (basic dye type lake, acidic dye type lake), nitro pigment, nitroso pigment, aniline black, daylight Fluorescent pigments can be mentioned. These pigments may be used alone or in combination of two or more.
染料としては、特に限定されることなく、酸性染料、直接染料、反応性染料、及び塩基性染料が使用可能である。染料は1種単独で用いてもよく、2種以上を併用してもよい。また、顔料と染料を併用してもよい。 The dye is not particularly limited, and acid dyes, direct dyes, reactive dyes, and basic dyes can be used. One type of dye may be used alone, or two or more types may be used in combination. Moreover, you may use a pigment and a dye together.
顔料を分散させる分散剤としては、特に限定されないが、例えば、高分子分散剤などの顔料分散液が挙げられる。その具体例として、ポリオキシアルキレンポリアルキレンポリアミン、ビニル系ポリマー及びコポリマー、アクリル系ポリマー及びコポリマー、ポリエステル、ポリアミド、ポリイミド、ポリウレタン、アミノ系ポリマー、含珪素ポリマー、含硫黄ポリマー、含フッ素ポリマー、及びエポキシ樹脂のうち一種以上を主成分とするものが挙げられる。 The dispersant for dispersing the pigment is not particularly limited, and examples thereof include a pigment dispersion such as a polymer dispersant. Specific examples thereof include polyoxyalkylene polyalkylene polyamines, vinyl polymers and copolymers, acrylic polymers and copolymers, polyesters, polyamides, polyimides, polyurethanes, amino polymers, silicon-containing polymers, sulfur-containing polymers, fluorine-containing polymers, and epoxies. Examples thereof include resins containing one or more of the main components.
更に、本発明の光重合性組成物には、アクリル樹脂、スチレン樹脂、エポキシ樹脂などのバインダーポリマーが含まれていてもよい。 Further, the photopolymerizable composition of the present invention may contain a binder polymer such as an acrylic resin, a styrene resin or an epoxy resin.
本発明の光重合性組成物において、光重合開始剤組成物の使用量は、光重合性組成物に対して0.005重量%以上、10重量%以下の範囲、好ましくは0.025重量%以上、5重量%以下である。0.005重量%未満だと光重合性組成物を光重合させるのに時間がかかってしまい、一方、10重量%を超えて添加すると光重合させて得られる硬化物の硬度が低下し、硬化物の物性を悪化させるため好ましくない。 In the photopolymerizable composition of the present invention, the amount of the photopolymerization initiator composition used is in the range of 0.005% by weight or more and 10% by weight or less, preferably 0.025% by weight, based on the photopolymerizable composition. The above is 5% by weight or less. If it is less than 0.005% by weight, it takes time to photopolymerize the photopolymerizable composition, while if it is added in excess of 10% by weight, the hardness of the cured product obtained by photopolymerization decreases and it is cured. It is not preferable because it deteriorates the physical properties of the object.
なお、本発明の光重合性組成物は、本発明の効果を損なわない範囲において、上記以外に、希釈剤、有機又は無機の充填剤、レベリング剤、界面活性剤、消泡剤、増粘剤、難燃剤、表面改質剤、浸透促進剤、保湿剤、定着剤、防黴剤、防腐剤、酸化防止剤、紫外線吸収剤、キレート剤、pH調整剤、安定剤、滑剤、可塑剤等の各種樹脂添加剤を配合してもよい。 In addition to the above, the photopolymerizable composition of the present invention contains a diluent, an organic or inorganic filler, a leveling agent, a surfactant, a defoaming agent, and a thickener, as long as the effects of the present invention are not impaired. , Flame retardants, surface modifiers, penetration promoters, moisturizers, fixers, fungicides, preservatives, antioxidants, UV absorbers, chelating agents, pH adjusters, stabilizers, lubricants, plasticizers, etc. Various resin additives may be blended.
(重合方法)
本発明の光重合性組成物に光を照射して重合することにより、硬化物を得ることができる。光重合性組成物に光を照射し重合させ光硬化させる場合、当該光重合性組成物をフィルム状に成形して光硬化させることもできるし、塊状に成形して光硬化させることもできる。フィルム状に成形して光硬化させる場合は、液状の当該光重合性組成物を例えばポリエステルフィルムなどの基材にバーコーターなどを用いて膜厚5~300ミクロンになるように塗布する。一方、スピンコーティング法やスクリーン印刷法により、さらに薄い膜厚あるいは厚い膜厚にして塗布することもできる。
(Polymerization method)
A cured product can be obtained by irradiating the photopolymerizable composition of the present invention with light and polymerizing the composition. When the photopolymerizable composition is irradiated with light to be polymerized and photocured, the photopolymerizable composition can be molded into a film and photocured, or can be molded into a lump and photocured. When it is molded into a film and photocured, the liquid photopolymerizable composition is applied to a substrate such as a polyester film using a bar coater or the like so as to have a film thickness of 5 to 300 microns. On the other hand, it is also possible to apply a thinner film thickness or a thicker film thickness by a spin coating method or a screen printing method.
このようにして調製した光重合性組成物からなる塗膜に、300nmから500nmの波長範囲を含むエネルギー線(紫外線)を1~1000mW/cm程度の強さで光照射することにより、硬化物を得ることができる。用いる光源としては、高圧水銀ランプ、超高圧水銀ランプ、メタルハライドランプ、キセノンランプ、ガリウムドープドランプ、ブラックライト、405nm紫外線LED、395nm紫外線LED、385nm紫外線LED、365nm紫外線LED、半導体レーザ、青色LED、白色LED、フュージョン社製のDバルブ、Vバルブ等が挙げられる。また、太陽光等の自然光を使用することもできる。特に、405nm紫外線LED、395nm紫外線LED、385nm紫外線LED、375nm紫外線LED、365nm紫外線LEDのような波長が365nm~405nmというような長波長域の波長範囲を含む光でも増感作用を有することが特徴であり、中心波長が365nm、375nm、385nm、395nm、405nmの紫外LED又は半導体レーザが照射源として好ましい。 The cured product is obtained by irradiating the coating film composed of the photopolymerizable composition thus prepared with energy rays (ultraviolet rays) containing a wavelength range of 300 nm to 500 nm at an intensity of about 1 to 1000 mW / cm 2 . Can be obtained. The light sources used are high-pressure mercury lamps, ultra-high pressure mercury lamps, metal halide lamps, xenon lamps, gallium-doped lamps, black lights, 405 nm ultraviolet LEDs, 395 nm ultraviolet LEDs, 385 nm ultraviolet LEDs, 365 nm ultraviolet LEDs, semiconductor lasers, blue LEDs, and white. Examples include LEDs, D-valves manufactured by Fusion, and V-valves. It is also possible to use natural light such as sunlight. In particular, it is characterized by having a sensitizing effect even with light having a wavelength range of a long wavelength range such as 365 nm to 405 nm, such as a 405 nm ultraviolet LED, a 395 nm ultraviolet LED, a 385 nm ultraviolet LED, a 375 nm ultraviolet LED, and a 365 nm ultraviolet LED. An ultraviolet LED or a semiconductor laser having a central wavelength of 365 nm, 375 nm, 385 nm, 395 nm, and 405 nm is preferable as the irradiation source.
(5%重量減少温度)
本発明の光重合性組成物に光を照射して重合することにより、硬化物を得ることができるが、光照射により速やかに硬化するため、速硬化性や低VOC等の観点から、コーティング剤や塗料、印刷インキ、感光性印刷版、接着剤、各種フォトレジスト等の用途に適用することができる。さらに、本発明の硬化物は、基材との密着性を高めること等を目的に、いわゆるポストベークが行われる場合でも、当該硬化物の重量減少を抑制することができる。本発明の硬化物を加熱処理した場合、加熱前の当該硬化物の重量が5%減少した時の温度(5%重量減少温度)は、200℃以上であり、好ましくは230℃以上、より好ましくは250℃以上である。
(5% weight loss temperature)
A cured product can be obtained by irradiating the photopolymerizable composition of the present invention with light to polymerize it, but since it is rapidly cured by light irradiation, a coating agent can be obtained from the viewpoint of quick curing and low VOC. It can be applied to paints, printing inks, photosensitive printing plates, adhesives, various photoresists, and the like. Further, the cured product of the present invention can suppress the weight loss of the cured product even when so-called post-baking is performed for the purpose of enhancing the adhesion to the substrate. When the cured product of the present invention is heat-treated, the temperature when the weight of the cured product before heating is reduced by 5% (5% weight reduction temperature) is 200 ° C. or higher, preferably 230 ° C. or higher, more preferably. Is 250 ° C. or higher.
表中の下記の略号はそれぞれ、記載のとおりのものを意味する。
FA-310M:フェノキシエチルメタクリレート 
FA-321M:EO変性ビスフェノールAジメタクリレート
The following abbreviations in the table mean as described.
FA-310M: Phenoxyethyl methacrylate
FA-321M: EO-modified bisphenol A dimethacrylate
(5%重量減少温度測定機器)
重量減少温度の測定には、日立製作所社製のTG/DTA7200を用いた。サンプル容器には直径5mmのアルミ製オープンサンプルパンを用いた。
(5% weight loss temperature measuring device)
A TG / DTA7200 manufactured by Hitachi, Ltd. was used for measuring the weight loss temperature. An aluminum open sample pan having a diameter of 5 mm was used as the sample container.
(5%重量減少温度測定)
硬化物を重量既知のサンプルパンに載せて硬化物の重量を測定する。その後、サンプルパンをTG/DTAにセットし、50℃から500℃まで20℃/分の速度で昇温しながら重量変化を測定した。
(5% weight loss temperature measurement)
Place the cured product on a sample pan of known weight and weigh the cured product. Then, the sample pan was set in TG / DTA, and the weight change was measured while raising the temperature from 50 ° C. to 500 ° C. at a rate of 20 ° C./min.
(光硬化測定機器)
光硬化の判定方法としては、アントンパール社製のPhoto-Rheometer MCR102を用いて、複素粘度を測定した。光硬化反応が進むに伴い複素粘度の増加を確認することができる。
(Photo-curing measuring device)
As a method for determining photocuring, a Photo-Rheometer MCR102 manufactured by Anton Pearl Co., Ltd. was used to measure the complex viscosity. It can be confirmed that the complex viscosity increases as the photocuring reaction proceeds.
(光硬化測定方法)
Photo-Rheometerで、光重合性組成物の複素粘度の推移を測定し、該粘度上昇速度から硬化速度を測定した。
測定条件:
 測定冶具:パラレルプレート(φ10mm)
厚み:100μm
振り角:5.0%一定
周波数:10Hz一定
温度:30℃一定
測定雰囲気 :空気雰囲気
UV照射器:アイテックシステム社製LLBK-UV(照射波長:405nm)
照射強度:200 mW/cm
照射開始時間:30秒後
硬化時間:光照射開始から複素粘度が30,000 Pa・sに達した時間(秒)を硬化時間とした。
(Photo-curing measurement method)
The transition of the complex viscosity of the photopolymerizable composition was measured with a Photo-Rheometer, and the curing rate was measured from the viscosity increase rate.
Measurement condition:
Measuring jig: Parallel plate (φ10 mm)
Thickness: 100 μm
Swing angle: 5.0% Constant frequency: 10 Hz Constant temperature: 30 ° C Constant Measurement atmosphere: Air atmosphere UV irradiator: LLBK-UV manufactured by Aitec System (irradiation wavelength: 405 nm)
Irradiation intensity: 200 mW / cm 2
Irradiation start time: 30 seconds later Curing time: The time (seconds) when the complex viscosity reached 30,000 Pa · s from the start of light irradiation was defined as the curing time.
以下、本発明を実施例に基づいて詳細に説明するが、例示を目的として提示をしたものである。すなわち、以下の実施例は、網羅的であったり、記載した形態そのままに本発明を制限したりすることを意図したものではない。よって、本発明は、その趣旨を超えない限り、以下の記載例に限定されるものではない。また、特記しない限り、すべての部および百分率は重量基準である。 Hereinafter, the present invention will be described in detail based on examples, but the present invention has been presented for the purpose of illustration. That is, the following examples are not intended to be exhaustive or to limit the invention as it is described. Therefore, the present invention is not limited to the following description examples as long as the gist is not exceeded. Unless otherwise noted, all parts and percentages are weight-based.
本発明の化合物の同定は下記の機器を用いて行った。
赤外線(IR)分光光度計:Thermo社製、型式is50 FT-IR
核磁気共鳴装置(NMR):日本電子社製、型式ECS-400
The compound of the present invention was identified using the following equipment.
Infrared (IR) spectrophotometer: manufactured by Thermo, model is50 FT-IR
Nuclear Magnetic Resonance Device (NMR): JEOL Ltd., Model ECS-400
(原料合成実施例1)9,10-ビス(エトキシカルボニルメチレンオキシ)アントラセン(ECM-A)(1-2)の合成
攪拌機、温度計付きの100mlの四つ口フラスコに、窒素雰囲気下で、溶媒のメチルイソブチルケトンを15g、触媒のテトラブチルアンモニウムブロマイドの50%水溶液を0.8g(1.2ミリモル)、ブロモ酢酸エチルを10.4g(62.5ミリモル)加えた。反応系の温度を20~25℃に保ちながら9,10-ジヒドロキシアントラセンのジナトリウム塩の17wt%水溶液29.1g(アントラキノンとして24ミリモル)を1時間以上かけて、滴下した。滴下終了後、さらに1時間撹拌した。その後、吸引濾過により、収量5.0g(粗収率55mol%)の薄黄色の結晶を得た。
(Ingredient Synthesis Example 1) A synthesis stirrer of 9,10-bis (ethoxycarbonylmethyleneoxy) anthracene (ECM-A) (1-2) and a 100 ml four-necked flask equipped with a thermometer under a nitrogen atmosphere. 15 g of methyl isobutyl ketone as a solvent, 0.8 g (1.2 mmol) of a 50% aqueous solution of tetrabutylammonium bromide as a catalyst, and 10.4 g (62.5 mmol) of ethyl bromoacetate were added. While maintaining the temperature of the reaction system at 20 to 25 ° C., 29.1 g (24 mmol as anthraquinone) of a 17 wt% aqueous solution of the disodium salt of 9,10-dihydroxyanthracene was added dropwise over 1 hour. After completion of the dropping, the mixture was further stirred for 1 hour. Then, by suction filtration, pale yellow crystals having a yield of 5.0 g (crude yield 55 mol%) were obtained.
(1)融点:93-94℃
(2)IR(cm-1):1754,1742,1382,1367,1241,1212,1168,1087,1034,1004,936,809,768,720,691,669,585.
(3)H-NMR(400MHz,CDCl):δ=1.370(t,J=14Hz,6H),4.376(k,J=21.6Hz,4H),4.777(s,4H),7.261-7.540(m,4H).
(1) Melting point: 93-94 ° C
(2) IR (cm -1 ): 174,1742,1382,1367,1241,1212,1168,1087,1034,1004,936,809,768,720,691,669,585.
(3) 1 1 H-NMR (400 MHz, CDCl 3 ): δ = 1.370 (t, J = 14 Hz, 6H), 4.376 (k, J = 21.6 Hz, 4H), 4.777 (s, 4H), 7.261-7.540 (m, 4H).
(原料合成実施例2)9,10-ビス(イソプロポキシカルボニルメチレンオキシ)アントラセン(1-3)の合成
攪拌機、温度計付きの100mlの四つ口フラスコに、窒素雰囲気下で、溶媒のメチルイソブチルケトンを15g、触媒のテトラブチルアンモニウムブロマイドの50%水溶液を0.8g(1.2ミリモル)、ブロモ酢酸イソプロピルを11.3g(62.5ミリモル)加えた。反応系の温度を20~25℃に保ちながら9,10-ジヒドロキシアントラセンのジナトリウム塩の17wt%水溶液29.1g(アントラキノンとして24ミリモル)を1時間以上かけて、滴下した。滴下終了後、さらに1時間撹拌した。その後、吸引濾過により、収量5.9g(粗収率60mol%)の薄黄色の結晶を得た。
(Ingredient Synthesis Example 2) Synthesis of 9,10-bis (isopropoxycarbonylmethyleneoxy) anthracene (1-3) In a 100 ml four-necked flask equipped with a stirrer and a thermometer, methyl isobutyl solvent is used in a nitrogen atmosphere. 15 g of ketone, 0.8 g (1.2 mmol) of a 50% aqueous solution of tetrabutylammonium bromide as a catalyst, and 11.3 g (62.5 mmol) of isopropyl bromoacetate were added. While maintaining the temperature of the reaction system at 20 to 25 ° C., 29.1 g (24 mmol as anthraquinone) of a 17 wt% aqueous solution of the disodium salt of 9,10-dihydroxyanthracene was added dropwise over 1 hour. After completion of the dropping, the mixture was further stirred for 1 hour. Then, by suction filtration, pale yellow crystals with a yield of 5.9 g (crude yield 60 mol%) were obtained.
(1)融点:109-110℃
(2)IR(cm-1):1744,1360,1210,1163,1086,1018,1004,776,768,671.
(3)H-NMR(400MHz,CDCl):δ=1.347(d,J=6.4Hz,12H),4.743(s,4H),5.246-5.277(m,2H),7.504-7.529(m,4H),8.356-8.398(m,4H).
(1) Melting point: 109-110 ° C
(2) IR (cm -1 ): 1744, 1360, 1210, 1163, 1086, 1018, 1004, 776, 768, 671.
(3) 1 1 H-NMR (400 MHz, CDCl 3 ): δ = 1.347 (d, J = 6.4 Hz, 12H), 4.743 (s, 4H), 5.246-5.277 (m, 2H), 7.504-7.529 (m, 4H), 8.356-8.398 (m, 4H).
(実施例1)
エチレン性不飽和基含有重合性化合物としてFA-310M(日立化成社製)50重量部及びFA-321Mを50重量部、さらにアルカリ可溶性光重合性化合物としてヒドロキシエチルメタクリレート(HEMA)10重量部を混合し、光重合開始剤として2,2’-ビス(2-クロロフェニル)-4,4’,5,5’-テトラフェニル-1,2’-ビイミダゾール(HABI)(東京化成社製)を2重量部と水素供与体としてロイコクリスタルバイオレット(LCV)(和光純薬社製)を0.17重量部加えた。さらにエステル基を有する9,10-ビス(アルコキシカルボニルメチレンオキシ)アントラセン化合物として原料合成実施例2と同様にして合成した9,10-ビス(イソプロポキシカルボニルメチレンオキシ)アントラセン(ECP-A)を1.0重量部加えて光重合性組成物を得た。これにアイテックシステム社製のUV-LED(型番:LLBK1-BA-15×20UV405,中心波長:405nm)を用いて、100mW/cmの照度で5分間の光照射を2回行い、硬化物を得た。得られた硬化物の5%重量減少温度を測定した結果、267℃であった。その結果を表1に示した。また、TGのグラフを図1(実線)に示した。
(Example 1)
50 parts by weight of FA-310M (manufactured by Hitachi Chemical Co., Ltd.) and 50 parts by weight of FA-321M as an ethylenically unsaturated group-containing polymerizable compound, and 10 parts by weight of hydroxyethyl methacrylate (HEMA) as an alkali-soluble photopolymerizable compound are mixed. Then, 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetraphenyl-1,2'-biimidazole (HABI) (manufactured by Tokyo Kasei Co., Ltd.) was used as a photopolymerization initiator. 0.17 parts by weight of Leuco Crystal Violet (LCV) (manufactured by Wako Pure Chemical Industries, Ltd.) was added as a hydrogen donor. Further, as a 9,10-bis (alkoxycarbonylmethyleneoxy) anthracene compound having an ester group, 9,10-bis (isopropoxycarbonylmethyleneoxy) anthracene (ECP-A) synthesized in the same manner as in Example 2 of raw material synthesis was added. A photopolymerizable composition was obtained by adding 0.0 parts by weight. Using a UV-LED (model number: LLBK1-BA-15 × 20UV405, center wavelength: 405 nm) manufactured by Aitec System Co., Ltd., light irradiation for 5 minutes was performed twice at an illuminance of 100 mW / cm 2 to prepare a cured product. Obtained. As a result of measuring the 5% weight loss temperature of the obtained cured product, it was 267 ° C. The results are shown in Table 1. Moreover, the graph of TG is shown in FIG. 1 (solid line).
(比較例1)
実施例1において、9,10-ビス(イソプロポキシカルボニルメチレンオキシ)アントラセン(ECP-A)を添加しなかった他は、実施例1の通りに実施した。その結果、得られた硬化物の5%重量減少温度を測定した結果、118℃であった。その結果を表1に示した。また、TGのグラフを図1(点線)に示した。
(Comparative Example 1)
In Example 1, 9,10-bis (isopropoxycarbonylmethyleneoxy) anthracene (ECP-A) was not added, and the procedure was the same as in Example 1. As a result, the 5% weight loss temperature of the obtained cured product was measured and found to be 118 ° C. The results are shown in Table 1. The TG graph is shown in FIG. 1 (dotted line).
Figure JPOXMLDOC01-appb-T000007
Figure JPOXMLDOC01-appb-T000007
(実施例2)
エチレン性不飽和基含有重合性化合物としてFA-310M(日立化成社製)50重量部及びFA-321Mを50重量部、さらにアルカリ可溶性光重合性化合物としてヒドロキシエチルメタクリレート(HEMA)10重量部を混合し、光重合開始剤としてイルガキュアOXE03(ビー・エー・エス・エフ社製)を0.5重量部加えた。さらにエステル基を有する9,10-ビス(アルコキシカルボニルメチレンオキシ)アントラセン化合物として原料合成実施例1と同様にして合成した9,10-ビス(エトキシカルボニルメチレンオキシ)アントラセン(ECM-A)を1.0重量部加えて光重合性組成物を得た。これにアイテックシステム社製のUV-LED(型番:LLBK1-BA-15×20UV405,中心波長:405nm)を用いて、100mW/cmの照度で5分間の光照射を2回行い、硬化物を得た。得られた硬化物の5%重量減少温度を測定した結果、202℃であった。その結果を表2に示した。
(Example 2)
50 parts by weight of FA-310M (manufactured by Hitachi Chemical Co., Ltd.) and 50 parts by weight of FA-321M as an ethylenically unsaturated group-containing polymerizable compound, and 10 parts by weight of hydroxyethyl methacrylate (HEMA) as an alkali-soluble photopolymerizable compound are mixed. Then, 0.5 part by weight of Irgacure OXE03 (manufactured by BASF) was added as a photopolymerization initiator. Further, 9,10-bis (ethoxycarbonylmethyleneoxy) anthracene (ECM-A) synthesized in the same manner as in Example 1 of Raw Material Synthesis as a 9,10-bis (alkoxycarbonylmethyleneoxy) anthracene compound having an ester group was used. 0 parts by weight was added to obtain a photopolymerizable composition. Using a UV-LED (model number: LLBK1-BA-15 × 20UV405, center wavelength: 405 nm) manufactured by Aitec System Co., Ltd., light irradiation for 5 minutes was performed twice at an illuminance of 100 mW / cm 2 to prepare a cured product. Obtained. As a result of measuring the 5% weight loss temperature of the obtained cured product, it was 202 ° C. The results are shown in Table 2.
(比較例2)
実施例2において、9,10-ビス(エトキシカルボニルメチレンオキシ)アントラセン(ECM-A)を添加しなかった他は、実施例2の通りに実施した。その結果、得られた硬化物の5%重量減少温度を測定した結果、143℃であった。その結果を表2に示した。
(Comparative Example 2)
In Example 2, 9,10-bis (ethoxycarbonylmethyleneoxy) anthracene (ECM-A) was not added, and the procedure was the same as in Example 2. As a result, the 5% weight loss temperature of the obtained cured product was measured and found to be 143 ° C. The results are shown in Table 2.
Figure JPOXMLDOC01-appb-T000008
Figure JPOXMLDOC01-appb-T000008
(実施例3)
エチレン性不飽和基含有重合性化合物としてFA-310M(日立化成社製)50重量部及びFA-321Mを50重量部、さらにアルカリ可溶性樹脂であるフォレットZAH-110(綜研化学社製、酸価:100mgKOH/g、重量平均分子量:約15,000、成分:メタクリル酸エステル共重合物,溶剤1-メトキシ-2-プロピルアセテート)10重量部を混合し、光重合開始剤として2,2’-ビス(2-クロロフェニル)-4,4’,5,5’-テトラフェニル-1,2’-ビイミダゾール(HABI)(東京化成社製)を2重量部と水素供与体としてロイコクリスタルバイオレット(LCV)(和光純薬社製)を0.17重量部加えた。さらにエステル基を有する9,10-ビス(アルコキシカルボニルメチレンオキシ)アントラセン化合物として原料合成実施例2と同様にして合成した9,10-ビス(プロポキシカルボニルメチレンオキシ)アントラセン(ECP-A)を1.0重量部加えて光重合性組成物を得た。これにアイテックシステム社製のUV-LED(型番:LLBK1-BA-15×20UV405,中心波長:405nm)を用いて、100mW/cmの照度で5分間の光照射を2回行い、硬化物を得た。得られた硬化物の5%重量減少温度を測定した結果、236℃であった。その結果を表3に示した。
(Example 3)
50 parts by weight of FA-310M (manufactured by Hitachi Chemical Co., Ltd.) and 50 parts by weight of FA-321M as an ethylenically unsaturated group-containing polymerizable compound, and follet ZAH-110 (manufactured by Soken Kagaku Co., Ltd., acid value:) which is an alkali-soluble resin. 100 mgKOH / g, weight average molecular weight: about 15,000, components: methacrylic ester copolymer, solvent 1-methoxy-2-propyl acetate) 10 parts by weight were mixed and 2,2'-bis as a photopolymerization initiator. (2-Chlorophenyl) -4,4', 5,5'-tetraphenyl-1,2'-biimidazole (HABI) (manufactured by Tokyo Kasei Co., Ltd.) in 2 parts by weight and leucocrystal violet (LCV) as a hydrogen donor (Manufactured by Wako Pure Chemical Industries, Ltd.) was added in an amount of 0.17 parts by weight. Further, 9,10-bis (propoxycarbonylmethyleneoxy) anthracene (ECP-A) synthesized in the same manner as in Example 2 of Raw Material Synthesis as a 9,10-bis (alkoxycarbonylmethyleneoxy) anthracene compound having an ester group was prepared as 1. 0 parts by weight was added to obtain a photopolymerizable composition. Using a UV-LED (model number: LLBK1-BA-15 × 20UV405, center wavelength: 405 nm) manufactured by Aitec System Co., Ltd., light irradiation for 5 minutes was performed twice at an illuminance of 100 mW / cm 2 to prepare a cured product. Obtained. As a result of measuring the 5% weight loss temperature of the obtained cured product, it was 236 ° C. The results are shown in Table 3.
(比較例3)
実施例3において、9,10-ビス(プロポキシカルボニルメチレンオキシ)アントラセン(ECP-A)を添加しなかった他は、実施例1の通りに実施した。その結果、得られた硬化物の5%重量減少温度を測定した結果、178℃であった。その結果を表3に示した。
(Comparative Example 3)
In Example 3, 9,10-bis (propoxycarbonylmethyleneoxy) anthracene (ECP-A) was not added, and the procedure was the same as in Example 1. As a result, the 5% weight loss temperature of the obtained cured product was measured and found to be 178 ° C. The results are shown in Table 3.
Figure JPOXMLDOC01-appb-T000009
Figure JPOXMLDOC01-appb-T000009
(実施例4)
エチレン性不飽和基含有重合性化合物としてFA-310M(日立化成社製)50重量部及びFA-321M50重量部を混合し、さらに顔料としてカーボンブラックが20重量%含有したプロピレングリコールモノメチルエーテルアセテート溶液を1.2部添加した。これに光重合開始剤として2,2’-ビス(2-クロロフェニル)-4,4’,5,5’-テトラフェニル-1,2’-ビイミダゾール(HABI)(東京化成社製)を2重量部と水素供与体としてロイコクリスタルバイオレット(LCV)(和光純薬社製)を0.17重量部加えた。さらに、エステル基を有する9,10-ビス(アルコキシカルボニルメチレンオキシ)アントラセン化合物として原料合成実施例1と同様にして合成した9,10-ビス(エトキシカルボニルメチレンオキシ)アントラセン(ECM-A)を0.6重量部加えて光重合性組成物を得た。これをレオメーター上の石英ガラスの上に滴下し、厚さ100μmでφ10mmのパラレルプレートにて挟み込み、粘度測定に不要な光重合性組成物は拭き取った。光重合性組成物の粘度測定開始から30秒後にUV-LEDの波長405nmの光を照射した。この時複素粘度が30,000Pa・sに達した時間は980秒であった。その結果を表4に示した。
(Example 4)
A propylene glycol monomethyl ether acetate solution containing 50 parts by weight of FA-310M (manufactured by Hitachi Chemical Co., Ltd.) and 50 parts by weight of FA-321M as an ethylenically unsaturated group-containing polymerizable compound and 20% by weight of carbon black as a pigment was prepared. 1.2 parts were added. To this, 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetraphenyl-1,2'-biimidazole (HABI) (manufactured by Tokyo Kasei Co., Ltd.) was added as a photopolymerization initiator. 0.17 parts by weight of Leuco Crystal Violet (LCV) (manufactured by Wako Pure Chemical Industries, Ltd.) was added as a hydrogen donor. Further, 9,10-bis (ethoxycarbonylmethyleneoxy) anthracene (ECM-A) synthesized in the same manner as in Example 1 of Raw Material Synthesis as a 9,10-bis (alkoxycarbonylmethyleneoxy) anthracene compound having an ester group is 0. A photopolymerizable composition was obtained by adding 6 parts by weight. This was dropped onto quartz glass on a rheometer, sandwiched between parallel plates having a thickness of 100 μm and a diameter of 10 mm, and the photopolymerizable composition unnecessary for viscosity measurement was wiped off. Thirty seconds after the start of the viscosity measurement of the photopolymerizable composition, the UV-LED was irradiated with light having a wavelength of 405 nm. At this time, the time when the complex viscosity reached 30,000 Pa · s was 980 seconds. The results are shown in Table 4.
(比較例4)
実施例4において9,10-ビス(エトキシカルボニルメチレンオキシ)アントラセン(ECM-A)を添加しなかった他は、実施例4の通りに実施した。その結果、複素粘度が30,000Pa・sに達した時間は1810秒であった。その結果を表4に示した。
(Comparative Example 4)
It was carried out as in Example 4 except that 9,10-bis (ethoxycarbonylmethyleneoxy) anthracene (ECM-A) was not added in Example 4. As a result, the time when the complex viscosity reached 30,000 Pa · s was 1810 seconds. The results are shown in Table 4.
(比較例5)
実施例4において顔料を添加せず、かつ9,10-ビス(エトキシカルボニルメチレンオキシ)アントラセン(ECM-A)を添加しなかった他は、実施例4の通りに実施した。その結果、複素粘度が30,000Pa・sに達した時間は1170秒であった。その結果を表4に示した。
(Comparative Example 5)
The procedure was carried out as in Example 4 except that no pigment was added and 9,10-bis (ethoxycarbonylmethyleneoxy) anthracene (ECM-A) was not added in Example 4. As a result, the time when the complex viscosity reached 30,000 Pa · s was 1170 seconds. The results are shown in Table 4.
Figure JPOXMLDOC01-appb-T000010
Figure JPOXMLDOC01-appb-T000010
実施例1と比較例1を比較すると、アルカリ可溶性光重合性化合物としてヒドロキシ基を持つメタクリレートとビイミダゾール系光重合開始剤を含有する光重合性組成物を光照射により重合硬化させて得られる硬化物は、本発明のエステル基を有する9,10-ビス(アルコキシカルボニルメチレンオキシ)アントラセン化合物を添加しなかった場合には、5%重合減少温度が118℃となり極めて低く、多量のVOC成分が多く残っている硬化物であることが示唆される。一方、本発明のエステル基を有する9,10-ビス(アルコキシカルボニルメチレンオキシ)アントラセン化合物を添加した場合には5%重合減少温度が267℃となり、VOC成分が少ない硬化物であることが示唆されている。実施例1と比較例1の硬化物の加熱時の重量減少曲線を図1に示したが、この図からも本発明のエステル基を有する9,10-ビス(アルコキシカルボニルメチレンオキシ)アントラセン化合物を添加した場合に重量減少を起こす温度が極めて高いことがわかる。 Comparing Example 1 and Comparative Example 1, curing obtained by polymerizing and curing a photopolymerizable composition containing a methacrylate having a hydroxy group as an alkali-soluble photopolymerizable compound and a biimidazole-based photopolymerization initiator by light irradiation. When the 9,10-bis (alkoxycarbonylmethyleneoxy) anthracene compound having an ester group of the present invention was not added, the 5% polymerization reduction temperature was 118 ° C., which was extremely low, and there were many VOC components. It is suggested that it is the remaining cured product. On the other hand, when the 9,10-bis (alkoxycarbonylmethyleneoxy) anthracene compound having an ester group of the present invention was added, the 5% polymerization reduction temperature was 267 ° C., suggesting that the cured product had a small VOC component. ing. The weight loss curves of the cured products of Example 1 and Comparative Example 1 during heating are shown in FIG. 1, and the 9,10-bis (alkoxycarbonylmethyleneoxy) anthracene compound having the ester group of the present invention is also shown in this figure. It can be seen that the temperature at which weight loss occurs when added is extremely high.
また、実施例2と比較例2を比較することにより、アルカリ可溶性光重合性化合物としてヒドロキシ基を持つメタクリレートとオキシムエステル系光重合開始剤を含有する光重合性組成物を光照射により重合硬化させて得られる硬化物においても、本発明のエステル基を有する9,10-ビス(アルコキシカルボニルメチレンオキシ)アントラセン化合物を添加しなかった場合には、5%重合減少温度が143℃となり極めて低く、多量のVOC成分が多く残っている硬化物であることが示唆される。一方、本発明のエステル基を有する9,10-ビス(アルコキシカルボニルメチレンオキシ)アントラセン化合物を添加した場合には5%重合減少温度が202℃と200℃以上となり、VOC成分が少ない硬化物であることが示唆されている。 Further, by comparing Example 2 and Comparative Example 2, a photopolymerizable composition containing a methacrylate having a hydroxy group as an alkali-soluble photopolymerizable compound and an oxime ester-based photopolymerization initiator was polymerized and cured by light irradiation. Even in the obtained cured product, when the 9,10-bis (alkoxycarbonylmethyleneoxy) anthracene compound having an ester group of the present invention was not added, the 5% polymerization reduction temperature was 143 ° C. It is suggested that the product is a cured product in which a large amount of the VOC component remains. On the other hand, when the 9,10-bis (alkoxycarbonylmethyleneoxy) anthracene compound having an ester group of the present invention is added, the 5% polymerization reduction temperature is 202 ° C. and 200 ° C. or higher, and the cured product has a small VOC component. It is suggested that.
更に、実施例3と比較例3を比較することにより、アルカリ可溶性光重合性化合物としてアルカリ可溶性樹脂を用いた場合で、ビイミダゾール系光重合開始剤を含有する光重合性組成物を光照射により重合硬化させて得られる硬化物においても、本発明のエステル基を有する9,10-ビス(アルコキシカルボニルメチレンオキシ)アントラセン化合物を添加しなかった場合には、5%重合減少温度が178℃となり極めて低く、多量のVOC成分が多く残っている硬化物であることが示唆される。一方、本発明のエステル基を有する9,10-ビス(アルコキシカルボニルメチレンオキシ)アントラセン化合物を添加した場合には5%重合減少温度が236℃ととなり、VOC成分が少ない硬化物であることが示唆されている。 Further, by comparing Example 3 and Comparative Example 3, when an alkali-soluble resin is used as the alkali-soluble photopolymerizable compound, a photopolymerizable composition containing a biimidazole-based photopolymerization initiator is irradiated with light. Even in the cured product obtained by polymerization curing, when the 9,10-bis (alkoxycarbonylmethyleneoxy) anthracene compound having an ester group of the present invention is not added, the 5% polymerization reduction temperature is 178 ° C., which is extremely high. It is suggested that it is a cured product that is low and has a large amount of VOC components remaining. On the other hand, when the 9,10-bis (alkoxycarbonylmethyleneoxy) anthracene compound having an ester group of the present invention was added, the 5% polymerization reduction temperature was 236 ° C., suggesting that the cured product had a small VOC component. Has been done.
更にまた、比較例4と比較例5を比較すると、黒色顔料であるカーボンブラックを添加した場合には、光を照射した場合、光重合性組成物中で照射した光の一部が黒色顔料により吸収され光重合開始剤に届く光量が減少する為に重合性組成物の複素粘度が30,000Pa・Sに達する時間が増加しており、すなわち重合速度が遅くなっていることがわかる。このような条件においても、本発明のエステル基を有する9,10-ビス(アルコキシカルボニルメチレンオキシ)アントラセン化合物として9,10-ビス(エトキシカルボニルメチレンオキシ)アントラセン(ECM-A)を添加することで、減少した光量でもエネルギーを効率よく開始剤に伝播させることが可能となるためと考えられるが、重合性組成物の複素粘度が30,000Pa・Sに達する時間が極端に早くなっており、顔料を含まない場合よりも早くなっており、重合速度の大幅な改善が見られる。 Furthermore, when Comparative Example 4 and Comparative Example 5 are compared, when carbon black, which is a black pigment, is added, when light is irradiated, a part of the light irradiated in the photopolymerizable composition is due to the black pigment. It can be seen that the time for the complex viscosity of the polymerizable composition to reach 30,000 Pa · S is increasing because the amount of light absorbed and reaching the photopolymerization initiator is reduced, that is, the polymerization rate is slowed down. Even under such conditions, by adding 9,10-bis (ethoxycarbonylmethyleneoxy) anthracene (ECM-A) as the 9,10-bis (alkoxycarbonylmethyleneoxy) anthracene compound having an ester group of the present invention. This is thought to be because energy can be efficiently propagated to the initiator even with a reduced amount of light, but the time it takes for the complex viscosity of the polymerizable composition to reach 30,000 Pa · S is extremely fast, and the pigment It is faster than when it does not contain, and a significant improvement in the polymerization rate can be seen.
次に、耐マイグレーション性の評価結果について記載する。
(組成物の耐マイグレーション性の判定)
本発明の光重合性組成物に含まれる光重合増感剤がフィルム等に移行(マイグレーション)するかどうかを判定する方法としては、光重合増感剤を含む光重合性組成物を薄いフィルム状物に塗布したものを作成し、その上にポリエチレンフィルムを被せて一定温度(26℃)で一定期間保管し、その後ポリエチレンフィルムを剥がし、光重合増感剤がポリエチレンフィルムに移行しているかを調べ、耐マイグレーション性を判定した。剥がしたポリエチレンフィルムは、アセトンで表面の組成物を洗った後乾燥し、当該ポリエチレンフィルムのUVスペクトルを測定し、光重合増感剤に起因する吸収強度の増大を調べることにより耐マイグレーション性を測定した。なお、当該測定には、紫外・可視分光光度計(島津製作所製、型式:UV2600)を用いた。比較例の化合物である9,10-ジブトキシアントラセンと量的な比較するために、得られた吸光度を9,10-ジブトキシアントラセンの吸光度の値に換算した。換算に当たっては、紫外・可視分光光度計により本発明の化合物及び9,10-ジブトキシアントラセンの260nmにおける吸光度を測定し、その吸光度の値とモル濃度からそれぞれのモル吸光係数を計算し、その比をもちいて換算した。
Next, the evaluation result of migration resistance will be described.
(Judgment of migration resistance of composition)
As a method for determining whether or not the photopolymerizable sensitizer contained in the photopolymerizable composition of the present invention migrates to a film or the like, the photopolymerizable composition containing the photopolymerizable sensitizer is formed into a thin film. Create a product coated on an object, cover it with a polyethylene film, store it at a constant temperature (26 ° C) for a certain period of time, then peel off the polyethylene film and check whether the photopolymerization sensitizer has transferred to the polyethylene film. , The migration resistance was judged. The peeled polyethylene film is dried after washing the surface composition with acetone, the UV spectrum of the polyethylene film is measured, and the migration resistance is measured by examining the increase in absorption intensity due to the photopolymerization sensitizer. did. An ultraviolet-visible spectrophotometer (manufactured by Shimadzu Corporation, model: UV2600) was used for the measurement. For quantitative comparison with the compound of the comparative example, 9,10-dibutoxyanthracene, the obtained absorbance was converted into the absorbance value of 9,10-dibutoxyanthracene. For conversion, the absorbance of the compound of the present invention and 9,10-dibutoxyanthracene at 260 nm was measured with an ultraviolet / visible spectrophotometer, the molar extinction coefficient of each was calculated from the absorbance value and the molar concentration, and the ratio was calculated. Was converted using.
(9,10-ビス(アルコキシカルボニルアルキレンオキシ)アントラセン化合物を含有する組成物の耐マイグレーション性の評価実施例)
(耐マイグレーション性評価実施例1)
光ラジカル重合性化合物として、トリメチロールプロパントリアクリレート100部、光ラジカル重合増感剤として、原料合成実施例1と同様の方法で合成した9,10-ビス(エトキシカルボニルメトキシ)アントラセン1部を混合し、調製した組成物をポリエステルフィルム上で膜厚が12ミクロンになるようにバーコーターを用いて塗布した。次いで、得られた塗布物上に低密度ポリエチレンフィルム(膜厚30ミクロン)を被せて、暗所で一日間保管したものと七日間保管したものを調製し、それぞれ保管後、被せたポリエチレンフィルムを剥がし、ポリエチレンフィルムをアセトンで洗い、乾燥した後、当該ポリエチレンフィルムのUVスペクトルを測定し、260nmの吸光度を測定したが、9,10-ビス(エトキシカルボニルメトキシ)アントラセンに起因する吸収は、一日保管後0.014、七日保管後0.015であった。
(Example of evaluation of migration resistance of a composition containing a 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound)
(Migration resistance evaluation Example 1)
As a photoradical polymerizable compound, 100 parts of trimethylolpropane triacrylate and as a photoradical polymerization sensitizer, 1 part of 9,10-bis (ethoxycarbonylmethoxy) anthracene synthesized by the same method as in Example 1 of raw material synthesis are mixed. Then, the prepared composition was applied on a polyester film using a bar coater so as to have a film thickness of 12 microns. Next, a low-density polyethylene film (thickness: 30 microns) was covered on the obtained coating material to prepare one that was stored in a dark place for one day and one that was stored for seven days, and after each storage, the covered polyethylene film was applied. After peeling, washing the polyethylene film with acetone and drying, the UV spectrum of the polyethylene film was measured and the absorbance at 260 nm was measured, but the absorption due to 9,10-bis (ethoxycarbonylmethoxy) anthracene was one day. It was 0.014 after storage and 0.015 after storage for 7 days.
(耐マイグレーション性評価実施例2)
9,10-ビス(エトキシカルボニルメトキシ)アントラセンの代わりに原料合成実施例2と同様の方法で合成した9,10-ビス(イソプロポキシカルボニルメチレンオキシ)アントラセンを使用すること以外は耐マイグレーション性評価実施例1と同様に調製して試験した。アセトン洗いしたポリエチレンフィルムの260nmの吸光度を測定したが、9,10-ビス(エトキシカルボニルブチレンオキシ)アントラセンに起因する吸収は、一日保管後0.024、七日保管後0.022であった。 
(Migration resistance evaluation Example 2)
Migration resistance evaluation was carried out except that 9,10-bis (isopropoxycarbonylmethyleneoxy) anthracene synthesized by the same method as in Example 2 of raw material synthesis was used instead of 9,10-bis (ethoxycarbonylmethoxy) anthracene. It was prepared and tested in the same manner as in Example 1. The absorbance at 260 nm of the polyethylene film washed with acetone was measured, and the absorption due to 9,10-bis (ethoxycarbonylbutyleneoxy) anthracene was 0.024 after storage for one day and 0.022 after storage for seven days. ..
(耐マイグレーション性評価比較例1)
9,10-ビス(エトキシカルボニルメトキシ)アントラセンの代わりに公知の光ラジカル増感剤である9,10-ジブトキシアントラセンを使用すること以外は耐マイグレーション性評価実施例1と同様にして試験した。アセトン洗いしたポリエチレンフィルムの260nmの吸光度を測定した結果、得られた9,10-ジブトキシアントラセンの吸光度は、一日保管後1.661、七日後1.741であった。
(Migration resistance evaluation comparative example 1)
The test was carried out in the same manner as in Example 1 for evaluation of migration resistance except that 9,10-dibutoxyanthracene, which is a known photoradical sensitizer, was used instead of 9,10-bis (ethoxycarbonylmethoxy) anthracene. As a result of measuring the absorbance at 260 nm of the polyethylene film washed with acetone, the absorbance of the obtained 9,10-dibutoxyanthracene was 1.661 after storage for one day and 1.741 after seven days.
耐マイグレーション性評価実施例1、2と耐マイグレーション性評価比較例1の結果を表5にまとめた。 Table 5 summarizes the results of migration resistance evaluation Examples 1 and 2 and migration resistance evaluation Comparative Example 1.
Figure JPOXMLDOC01-appb-T000011
Figure JPOXMLDOC01-appb-T000011
耐マイグレーション性評価実施例1、2と耐マイグレーション性評価比較例1を比較することにより明らかなように、光ラジカル重合性組成物中において、公知の光重合増感剤である9,10-ジブトキシアントラセンは該光ラジカル重合性組成物の上に被せたフィルムにかなりの程度移行しているのに対して、本願の光重合増感剤である9,10-ビス(アルコキシカルボニルアルキレンオキシ)アントラセン化合物は、いずれの場合もその移行程度は極めて低く、耐マイグレーション性に優れているといえる。 As is clear from comparing Migration Resistance Evaluation Examples 1 and 2 with Migration Resistance Evaluation Comparative Example 1, 9,10-di, which is a known photopolymerization sensitizer in a photoradical polymerizable composition. Butoxyanthracene is transferred to a film overlaid on the photoradical polymerizable composition to a considerable extent, whereas the photopolymerization sensitizer of the present application, 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene. In each case, the degree of migration of the compound is extremely low, and it can be said that the compound has excellent migration resistance.
一般式(1)で表されるエステル基を有する9,10-ビス(アルコキシカルボニルアルキレンオキシ)アントラセン化合物を含有する光ラジカル重合性組成物は、酸素阻害の影響が顕著な光ラジカル重合開始剤を用いた場合でも、塗膜表面での酸素阻害を低減し、酸素存在下でも問題なく硬化できるという産業上非常に有用な光ラジカル重合性組成物である。

 
The photoradical polymerizable composition containing a 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group represented by the general formula (1) is a photoradical polymerization initiator having a remarkable effect of oxygen inhibition. Even when used, it is an industrially very useful photoradical polymerizable composition that reduces oxygen inhibition on the surface of the coating film and can be cured without problems even in the presence of oxygen.

Claims (14)

  1.  少なくとも、下記の(A)~(C)成分を含有する光重合性組成物であって、その硬化物の5%重量減少温度が200℃以上であることを特徴とする、光重合性組成物。
    (A)下記一般式(1)で表されるエステル基を有する9,10-ビス(アルコキシカルボニルアルキレンオキシ)アントラセン化合物
    (B)エチレン性不飽和基含有重合性化合物。
    (C)光重合開始剤。
    Figure JPOXMLDOC01-appb-C000001
     
    (一般式(1)において、Aは炭素数1から20のアルキレン基を表し、該アルキレン基はアルキル基によって分岐していてもよい。Rは炭素数1から20のアルキル基を表し、該アルキル基は、アルキル基によって分岐していてもよく、シクロアルキル基でもシクロアルキルアルキル基でもよく、ヒドロキシ基で置換されていてもよく、炭素原子の一部が酸素原子によって置き換わっていてもよい(但し、過酸化物を形成する場合は除く)。X、Yは同一であっても異なってもよく、水素原子、炭素数1から8のアルキル基又はハロゲン原子を表す)
    A photopolymerizable composition containing at least the following components (A) to (C), wherein the cured product has a 5% weight loss temperature of 200 ° C. or higher. ..
    (A) A 9,10-bis (alkoxycarbonylalkyleneoxy) anthracene compound having an ester group represented by the following general formula (1) (B) An ethylenically unsaturated group-containing polymerizable compound.
    (C) Photopolymerization initiator.
    Figure JPOXMLDOC01-appb-C000001

    (In the general formula (1), A represents an alkylene group having 1 to 20 carbon atoms, and the alkylene group may be branched by an alkyl group. R represents an alkyl group having 1 to 20 carbon atoms, and the alkyl The group may be branched by an alkyl group, may be a cycloalkyl group or a cycloalkylalkyl group, may be substituted with a hydroxy group, and a part of carbon atoms may be replaced by an oxygen atom (provided that the group is replaced by an oxygen atom). (Except when forming a peroxide). X and Y may be the same or different, and represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms or a halogen atom).
  2. (A)において、一般式(1)におけるAがメチレン基である、エステル基を有する9,10-ビス(アルコキシカルボニルメチレンオキシ)アントラセン化合物であることを特徴とする、請求項1に記載の光重合性組成物。 The light according to claim 1, wherein in (A), A in the general formula (1) is a 9,10-bis (alkoxycarbonylmethyleneoxy) anthracene compound having an ester group, which is a methylene group. Polymerizable composition.
  3. 請求項1又は2に記載の光重合性組成物に、更に(D)アルカリ可溶性重合性化合物を含有することを特徴とする、光重合性組成物。 A photopolymerizable composition according to claim 1 or 2, wherein the photopolymerizable composition further contains (D) an alkali-soluble polymerizable compound.
  4. (D)アルカリ可溶性重合性化合物が水酸基を有する化合物である、請求項3に記載の光重合性組成物。 (D) The photopolymerizable composition according to claim 3, wherein the alkali-soluble polymerizable compound is a compound having a hydroxyl group.
  5. (D)アルカリ可溶性重合性化合物がカルボキシル基を有する化合物である、請求項3又は請求項4に記載の光重合性組成物。 (D) The photopolymerizable composition according to claim 3 or 4, wherein the alkali-soluble polymerizable compound is a compound having a carboxyl group.
  6. (D)アルカリ可溶性重合性化合物がアルカリ可溶性樹脂である、請求項3に記載の光重合性組成物。 (D) The photopolymerizable composition according to claim 3, wherein the alkali-soluble polymerizable compound is an alkali-soluble resin.
  7. 請求項1乃至請求項6のいずれか一項に記載の光重合性組成物にさらに(E)顔料を含有することを特徴とする、光重合性組成物。 A photopolymerizable composition according to any one of claims 1 to 6, further comprising a pigment (E) in the photopolymerizable composition.
  8.  (C)光重合開始剤が、ビイミダゾール系光重合開始剤、アルキルフェノン系光重合開始剤、トリアジン系光重合開始剤、アシルホスフィンオキサイド系光重合開始剤およびオキシム系光重合開始剤からなる群より選ばれる少なくとも1種の光重合開始剤を含有することを特徴とする、請求項1乃至請求項7のいずれか一項に記載の光重合性組成物。 (C) A group in which the photopolymerization initiator comprises a biimidazole-based photopolymerization initiator, an alkylphenone-based photopolymerization initiator, a triazine-based photopolymerization initiator, an acylphosphine oxide-based photopolymerization initiator, and an oxime-based photopolymerization initiator. The photopolymerizable composition according to any one of claims 1 to 7, characterized in that it contains at least one photopolymerization initiator selected from the above.
  9. (C)光重合開始剤が、ビイミダゾール系光重合開始剤である、請求項1乃至請求項7のいずれか一項に記載の光重合性組成物。 (C) The photopolymerizable composition according to any one of claims 1 to 7, wherein the photopolymerization initiator is a biimidazole-based photopolymerization initiator.
  10. (C)光重合開始剤がオキシムエステル系光重合開始剤である、請求項1乃至請求項7のいずれか一項に記載の光重合性組成物。 (C) The photopolymerizable composition according to any one of claims 1 to 7, wherein the photopolymerization initiator is an oxime ester-based photopolymerization initiator.
  11. 支持体上に、請求項1乃至請求項10のいずれか一項に記載の光重合性組成物を含む光重合性塗膜を有することを特徴とする、光重合性塗膜組成物。 A photopolymerizable coating film composition comprising a photopolymerizable coating film containing the photopolymerizable composition according to any one of claims 1 to 10 on a support.
  12. 請求項1乃至請求項10のいずれか一項に記載の光重合性組成物を光照射により硬化させた硬化物であり、その5%重量減少温度が200℃以上であることを特徴とする、硬化物。 A cured product obtained by curing the photopolymerizable composition according to any one of claims 1 to 10 by light irradiation, wherein the 5% weight loss temperature is 200 ° C. or higher. Hardened product.
  13. 請求項1乃至請求項10のいずれか一項に記載の光重合性組成物に、300nm~500nmの波長範囲の光を照射することを特徴とする、光重合性組成物の硬化方法。 A method for curing a photopolymerizable composition, which comprises irradiating the photopolymerizable composition according to any one of claims 1 to 10 with light in a wavelength range of 300 nm to 500 nm.
  14. 請求項13に記載の照射する光の照射源が、中心波長が365nm、375nm、385nm、395nm、405nmの紫外線LED又は半導体レーザである、光重合性組成物の硬化方法。
     
     

     
    The method for curing a photopolymerizable composition according to claim 13, wherein the irradiation source of the light to be irradiated is an ultraviolet LED or a semiconductor laser having a center wavelength of 365 nm, 375 nm, 385 nm, 395 nm, and 405 nm.



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