WO2020199064A1 - Chip package, terminal device, and preparation method - Google Patents

Chip package, terminal device, and preparation method Download PDF

Info

Publication number
WO2020199064A1
WO2020199064A1 PCT/CN2019/080703 CN2019080703W WO2020199064A1 WO 2020199064 A1 WO2020199064 A1 WO 2020199064A1 CN 2019080703 W CN2019080703 W CN 2019080703W WO 2020199064 A1 WO2020199064 A1 WO 2020199064A1
Authority
WO
WIPO (PCT)
Prior art keywords
chip
substrate
insulating layer
metal ring
solder ball
Prior art date
Application number
PCT/CN2019/080703
Other languages
French (fr)
Chinese (zh)
Inventor
罗立德
郭健炜
胡骁
张弛
Original Assignee
华为技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 华为技术有限公司 filed Critical 华为技术有限公司
Priority to CN201980090009.7A priority Critical patent/CN113348551B/en
Priority to PCT/CN2019/080703 priority patent/WO2020199064A1/en
Publication of WO2020199064A1 publication Critical patent/WO2020199064A1/en

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
    • H01L2924/1815Shape
    • H01L2924/1816Exposing the passive side of the semiconductor or solid-state body
    • H01L2924/18161Exposing the passive side of the semiconductor or solid-state body of a flip chip

Definitions

  • This application relates to the field of semiconductors, and in particular to a chip package, terminal equipment and manufacturing method.
  • the core idea is to improve the structure of the package substrate.
  • the package substrate chooses a material with a lower thermal expansion coefficient and uses a thicker core material of the package substrate, but this improvement will introduce other effects
  • the thicker core layer material of the package substrate has a negative impact on signal integrity, and on the other hand, the material with a lower thermal expansion coefficient will cause a greater degree of thermal mismatch between the package substrate and the printed circuit board, resulting in solder balls Fatigue life is reduced.
  • the present application provides a chip package, a terminal device, and a manufacturing method to solve the problems of chip package warpage and low board-level reliability in the prior art.
  • the present application provides a chip package that includes a substrate, a chip, and a first metal ring.
  • the chip When specifically installed, the chip is disposed on the surface of the substrate and is electrically connected to the substrate, The first metal ring is arranged on the surface of the substrate facing the chip and surrounds the chip.
  • the first metal ring When specifically arranged, the first metal ring may be a closed ring, and the first metal ring may also have at least A gaped ring.
  • the first metal ring is used to suppress the thermal deformation of the substrate at high temperature, so as to reduce the deformation of the substrate during the package reflow process, thereby effectively reducing the warpage of the package structure and improving the board-level mounting Yield rate.
  • the first metal ring may be arranged symmetrically with respect to the center of the chip.
  • the first metal ring includes, but is not limited to, symmetry about the center of the chip.
  • the chip package further includes a first insulating layer disposed on the surface of the substrate facing the chip, and the chip and the first metal ring are disposed on the Inside the first insulating layer.
  • the first insulating layer just covers the chip and exposes the upper surface for subsequent operations with the chip.
  • the chip package further includes a second metal ring.
  • the second metal ring is arranged on the surface of the first insulating layer away from the substrate and surrounds the chip.
  • the second metal ring may be a closed ring, and the second metal ring may also be a ring with at least one gap.
  • the second metal ring may be arranged symmetrically with respect to the center of the chip.
  • the second metal ring includes, but is not limited to, symmetry about the center of the chip.
  • the chip package further includes a passive device, the passive device is disposed on the surface of the substrate facing the chip, and is connected to the pins of the chip, and the passive device is connected to the chip.
  • the substrate is electrically connected, and the passive device is arranged in the first insulating layer and located between the first metal ring and the chip.
  • the number of the chips is multiple
  • the chip package further includes a third metal ring
  • the third metal ring is disposed on the surface of the substrate facing the chip, and is located on the multiple Between at least two of the chips. In order to further reduce the thermal deformation of the substrate during the packaging process.
  • the chip package further includes solder balls and a second insulating layer, and the second insulating layer is disposed on the back of the substrate.
  • the solder balls are arranged on the part of the substrate facing the surface of the substrate away from the chip and are arranged in the second insulating layer, and the height of the second insulating layer is perpendicular to The direction of the substrate is smaller than the height of the solder ball, and the thermal expansion coefficient of the second insulating layer is greater than the thermal expansion coefficient of the substrate.
  • solder ball stress can be buffered and the soldering can be enhanced.
  • the anti-fatigue properties of the ball during the temperature cycling process thereby the board-level reliability of the chip.
  • the solder ball includes a first solder ball connected to the substrate and a second solder ball embedded on a side of the first solder ball facing away from the substrate.
  • the solder balls are arranged in the second insulating layer, and the height of the second insulating layer is equal to the height of the first solder balls in a direction perpendicular to the substrate.
  • the chip package further includes a solder ball, a metal block, and a second insulating layer.
  • the second insulating layer is disposed on the surface of the substrate facing away from the chip, and the metal block is disposed on the surface of the substrate.
  • the substrate faces away from the surface of the chip and is located in the second insulating layer, the solder balls are fixed on the side of the metal block away from the substrate, and the height of the second insulating layer is perpendicular to the The direction of the substrate is equal to the height of the metal block.
  • the height of the solder ball relative to the substrate can be adjusted conveniently and quickly by arranging a metal block between the solder ball and the substrate.
  • the material of the second insulating layer is resin or molding compound, and can also be other insulating materials with a larger thermal expansion coefficient than the substrate.
  • the application also provides a terminal device, including a chip package and a printed circuit board P(C)(B), the chip package is electrically connected to the P(C)(B), and the chip
  • the package is a chip package as described in any technical solution. Since the warpage deformation of the chip packaging structure is small, and the board-level mounting yield is high, the product yield of the terminal device with the chip packaging is relatively high.
  • the present application also provides a method for preparing a chip package, including: mounting a chip and a first metal ring on one side of a substrate, the first metal ring being disposed on the surface of the substrate facing the chip , And surrounding the chip, the first metal ring is a closed ring or a ring with at least one gap.
  • the first metal ring is mounted on the substrate, and the first metal ring is used to suppress the thermal deformation of the substrate at high temperature; the above-mentioned forming process has fewer steps, more convenient and quick preparation, and the formed chip package is warped The bending deformation is small.
  • the first metal ring is symmetrical about the center of the chip.
  • the manufacturing method of the chip package further includes: forming a first insulating layer on the surface of the substrate facing the chip, and the chip and the first metal ring are arranged in the first insulating layer;
  • a second metal ring is attached to the side of the first insulating layer facing away from the substrate.
  • the second metal ring is a closed ring or a ring with at least one gap and surrounds the chip. Two mounting times further reduce the thermal deformation of the substrate during the packaging process.
  • the second metal ring is symmetrical about the center of the chip.
  • the manufacturing method of the chip package further includes: mounting a passive device on the surface of the substrate facing the chip, and the passive device is arranged in the first insulating layer and located in the first insulating layer. Between the metal ring and the chip.
  • the method for preparing the chip package further includes: before forming the first insulating layer, mounting a third metal ring on the surface of the substrate facing the chip , The third metal ring is located between at least two of the plurality of chips.
  • the method for preparing the chip package further includes: implanting solder balls on the side of the substrate facing away from the chip; forming a second insulating layer on the side of the substrate facing away from the chip; The ball is arranged on the surface of the substrate opposite to the chip and facing the substrate in the second insulating layer.
  • the height of the second insulating layer is smaller than the height of the second insulating layer in the direction perpendicular to the substrate.
  • the height of the solder ball, the thermal expansion coefficient of the second insulating layer is greater than the thermal expansion coefficient of the substrate.
  • the second insulating layer is formed on the side where the solder balls are planted on the substrate, and the thickness of the second insulating layer is limited to be smaller than the height of the solder balls, and the thermal expansion coefficient of the second insulating layer is defined to be greater than that of the substrate during material selection.
  • the thermal expansion coefficient can reduce the thermal mismatch between the substrate and the printed circuit board during the temperature cycle while packaging the solder balls, buffer the solder ball stress, and enhance the fatigue resistance of the solder balls during the temperature cycle; the above forming process There are fewer procedures, more convenient and quick preparation, and the formed chip package has higher board-level reliability.
  • the solder balls can be packaged through different processes.
  • the second substrate is formed on the side facing away from the chip with solder balls.
  • the insulating layer specifically includes: implanting solder balls on the side of the substrate facing away from the chip; forming a second insulating layer on the side of the substrate facing away from the chip. Along a direction perpendicular to the substrate, the second insulating layer The thickness of the layer is less than the height of the solder ball, and the second insulating layer surrounds the solder ball.
  • said forming a second insulating layer on the substrate with solder balls planted on the side facing away from the chip specifically includes: implanting first solder balls on the side of the substrate facing away from the chip; A second insulating layer is formed on the side of the substrate facing away from the chip. Along a direction perpendicular to the substrate, the height of the second insulating layer is greater than the height of the first solder balls; A second insulating layer and a first solder ball. The first solder ball exposes the ball-planting surface, and the ball-planting surface is flush with the surface of the second insulating layer facing away from the substrate; Solder balls.
  • the special-shaped solder balls can be packaged on the substrate more conveniently and quickly through the two-layer solder ball preparation process.
  • the forming a second insulating layer on the substrate on which the solder balls are planted on the side facing away from the chip specifically includes: fixing a metal block on the side of the substrate facing away from the chip; A second insulating layer is formed on the side of the substrate away from the chip. Along the direction perpendicular to the substrate, the height of the second insulating layer is greater than the height of the metal block; the second insulating layer is thinned by a thinning process And a metal block, wherein the metal block exposes a ball-planting surface, and the ball-planting surface is flush with the side of the second insulating layer away from the substrate; and solder balls are implanted on the ball-planting surface.
  • the height of the solder ball relative to the substrate can be adjusted conveniently and quickly by arranging a metal block between the solder ball and the substrate.
  • Fig. 1 is a schematic cross-sectional view of a chip package in the prior art
  • FIG. 2 is a schematic cross-sectional view of the chip package provided by this application.
  • FIG. 3 is a schematic cross-sectional view of another chip package provided by this application.
  • Figures 4(a)-(d) are cross-sectional views of (A)-(A) in Figure 2;
  • Figure 5 is a cross-sectional view of (B)-(B) in Figure 3;
  • FIG. 6 is a schematic cross-sectional view of another chip package provided by this application.
  • Figure 7 is a cross-sectional view (C)-(C) in Figure 6;
  • FIG. 8 is a schematic cross-sectional view of another chip package provided by this application.
  • FIG. 9 is a top view of the chip package in FIG. 8;
  • FIG. 10 is a schematic cross-sectional view of another chip package provided by this application.
  • FIG. 11 is a schematic cross-sectional view of still another chip package provided by this application.
  • FIG. 12 is a flow chart of the manufacturing method of the chip package provided by this application.
  • Figure 13(a)-(e) is a diagram of the manufacturing process of the chip package provided by this application.
  • Figure 14(a)-(d) is another process diagram of the solder ball package in the chip package provided by this application.
  • 15(a)-(d) are diagrams of another manufacturing process of the solder ball package in the chip package provided by this application.
  • the chip package in the prior art is shown in FIG. 1.
  • the chip package 500 is packaged with a plastic molding compound 530
  • the chip 510 located on the upper surface 521 of the substrate 520 is packaged with the plastic molding compound 531
  • the solder balls 540 located on the lower surface 523 of the substrate 520 are packaged with plastic
  • the solder ball 540 is packaged, the lower surface 522 of the substrate 520 is provided with a solder resist layer 524.
  • the plastic encapsulant 532 covers the solder resist layer 524, and an opening 533 is provided to expose the pad 523.
  • the size of the opening 533 is larger than the solder ball. 540 size, so that the molding compound 532 will not directly contact the solder balls 540, thereby enhancing the resistance of the solder balls 540 to moisture and preventing the solder balls from being impacted and falling off.
  • this chip package only directly enhances the protection directly physically. Significantly improve the thermal deformation of the chip package and enhance the board-level reliability.
  • the structure of the chip package and the structure and materials of the solder ball package are changed to improve the problems of chip package warpage and low board-level reliability in the prior art.
  • Electrical connection refers to a way to achieve electrical connection between two components, such as welding, gold wire bonding, etc.
  • the ring has a certain thickness and runs along the arc.
  • the extended geometric figures can be closed or unclosed.
  • this application provides a chip package, as shown in FIGS. 2, 3, 4, and 5.
  • FIG. 3 shows a schematic cross-sectional view of a structure of the chip package
  • FIG. 2 shows the chip package
  • Fig. 4 shows a schematic cross-sectional view of the structure of the first metal ring in the chip package
  • Fig. 5 shows a schematic cross-sectional view of another structure of the first metal ring in the chip package.
  • the chip package includes a substrate 100, and a chip 200 and solder balls 300.
  • the chip 200 and solder balls 300 are located on both sides of the substrate 100.
  • the chip 200 includes but is not limited to wire bond chips and flip chips.
  • the number of chips 200 It can be one or more. As shown in FIG.
  • the number of chips 200 is two, and as shown in FIG. 2, the number of chips 200 is one, and when multiple chips are used, the chips can be of different types. chip.
  • two chips 200 are provided on the substrate 100, and the form of the two chips 200 described above is merely an example.
  • a chip 200 and a first metal ring 400 are provided on one side of the substrate 100.
  • the first metal ring 400 may be a closed ring or a ring with at least one gap.
  • the first metal ring 400 is arranged on the substrate 100 to suppress the thermal deformation of the substrate 100 at high temperatures In order to reduce the amount of deformation of the substrate 100 during the reflow process of the package, the warpage deformation of the chip package can be effectively reduced, thereby improving the board-level mounting yield.
  • the first metal ring 400 may be a ring structure, as shown in FIG. 4(a), the ring structure may be a ring closed structure, as shown in FIG. 4(b), the ring structure may also have a plurality of non-closed It is composed of an arc-shaped structure, and a gap is formed between two arc-shaped structures.
  • the first metal ring 400 includes, but is not limited to, a ring-shaped closed structure and a separated structure with at least one gap.
  • the first metal ring 400 may also have other structural forms.
  • the first metal ring 400 may be a frame-shaped structure arranged outside the chip 200.
  • the ring-shaped structure may be a closed frame-shaped structure.
  • the ring structure can also be composed of multiple non-closed strip structures.
  • the ring structure may also be a broken line structure provided on the substrate 100.
  • the first metal ring 400 may be symmetrical about the center of the chip 200, and the first metal ring 400 includes but is not limited to be symmetrical about the center of the chip 200.
  • the ring structure when there is only one chip 200, the ring structure is arranged around the chip 200, as shown in Figure 5, when there are two chips, the ring structure can be arranged Around the chip 200, and when there are multiple chips, the ring structure may be arranged around the chip 200, as shown in FIG. 6 and FIG. 7, the ring structure may also be arranged between two chips 200, FIG. Shows a schematic cross-sectional view of another structure of the chip package.
  • FIG. 7 shows a schematic cross-sectional view of the structure of the middle ring structure of the chip package.
  • the ring structure is composed of a first metal ring 400 and a third metal ring 450.
  • the metal ring 400 includes an arc structure 410, an arc structure 420, an arc structure 430, and an arc structure 440.
  • the third metal ring 450 is disposed on the surface of the substrate 100 facing the chip 200, and is located on the two chips 200 In between, the arc structure 410, the arc structure 420, the arc structure 440 and the third metal ring 450 cooperate to surround the chip 200 on the left, the arc structure 420, the arc structure 430, the arc structure 440 and the third metal ring
  • the ring 450 cooperates to surround the chip 200 on the right.
  • the first metal ring 400 includes but is not limited to the periphery of the chip 200 and the position between the chips 200.
  • the first metal ring 400 can be specifically set according to the warpage deformation of the chip package, and the warpage deformation of the package structure is relatively high. More first metal rings 400 are arranged in large positions, and a small number of first metal rings 400 are arranged in positions where the warpage deformation of the package structure is small, or even no first metal rings 400 are arranged.
  • Figure 3 shows a schematic cross-sectional view of a structure of the chip package
  • Figure 8 shows a schematic cross-sectional view of another structure of the chip package
  • Figure 9 shows a schematic cross-sectional view of another structure of the chip package.
  • the chip package further includes a first insulating layer 500 and a second metal ring 700.
  • the first insulating layer 500 is used to package the chip 200 and the first metal.
  • the first insulating layer 500 is disposed on the surface of the substrate 100 facing the chip 200, the chip 200 and the first metal ring 400 are disposed inside the first insulating layer 500, the first insulating layer 500 just covers the chip 200, and the chip 200 is exposed Away from the upper surface of the substrate 100 to enable subsequent operations with the chip 200.
  • the material of the first insulating layer 500 can be a plastic molding compound, a resin, or other insulating materials that meet the requirements.
  • the specific material of the first insulating layer 500 is selected according to the actual situation of the chip package.
  • the first insulating layer 500 completely covers the first metal ring 400 and surrounds the periphery of the chip 200, so as to realize the stable packaging of the chip 200.
  • FIG. 3 shows the positional relationship between the first insulating layer 500 and the first metal ring 400.
  • the thickness of the first metal ring 400 is less than the thickness of the first insulating layer 500, so that the first metal ring 400 is completely wrapped in the first insulating layer 500, so as to prevent the arrangement of the first metal ring 400 from affecting other components of the chip package.
  • the setting position and size will cause adverse effects.
  • the first metal ring 400 has the first insulating layer 500 on the side away from the substrate 100 so that the arrangement of the first metal ring 400 will not adversely affect the functions of other components of the chip package.
  • FIG. 8 shows the positional relationship between the first insulating layer 500 and the second metal ring 700.
  • the second metal ring 700 is provided on the side of the first insulating layer 500 away from the substrate 100, and the second metal The ring 700 surrounds the periphery of the chip 200.
  • FIG. 9 shows the positional relationship between the chip 200 and the second metal ring 700.
  • the second metal ring 700 wraps the chip 200.
  • the second metal ring 700 can be a closed ring or a ring with at least one gap, the second metal ring 700 can be a ring structure, the ring structure can be a ring closed structure, or a non-
  • the second metal ring 700 is composed of a plurality of closed arc-shaped structures, and a gap is formed between the two arc-shaped structures.
  • the second metal ring 700 includes but is not limited to a ring-shaped closed structure and a separated structure with at least one gap.
  • the second metal ring 700 may also have other structural forms.
  • the second metal ring 700 may be a frame-shaped structure arranged on the outside of the chip 200, or may be a broken line-shaped structure arranged on the substrate 100.
  • the second metal ring 700 may be symmetrical about the center of the chip 200, and the second metal ring 700 includes but is not limited to being symmetrical about the center of the chip 200.
  • the first metal ring 400 is arranged on the substrate 100 to suppress the thermal deformation of the substrate 100 at high temperatures, thereby reducing the The amount of deformation of the substrate 100 during the reflow process, and the second metal ring 700 disposed on the first insulating layer 500 can further suppress the thermal deformation of the substrate 100 at high temperatures, so as to further reduce the amount of deformation of the substrate 100 during the package reflow process, thereby It can better reduce the warpage of the chip package, thereby improving the board-level mounting yield.
  • the material of the first metal ring 400 and the second metal ring 700 can be the same metal material, such as copper or stainless steel, and the first metal ring 400 and the second metal ring
  • the material of 700 can also choose different metal materials.
  • the first metal ring 400 can choose copper
  • the second metal ring 700 can choose stainless steel.
  • the materials of the first metal ring 400 and the second metal ring 700 include but are not limited to For these two metals, you can also choose other materials that meet your needs.
  • FIG. 8 shows a schematic cross-sectional view of the specific structure of the chip package.
  • At least one passive device 800 connected to the pin of the chip 200 is also provided on the side of the substrate 100 facing the chip 200, and each passive device 800 is connected to the pins of at least one chip 200, the passive device 800 is electrically connected to the substrate 100, and the electrical connection may be gold wire bonding.
  • the passive device 800 is disposed inside the first insulating layer 500, and Located between the first metal ring 400 and the chip 200, as shown in FIG. 8, the number of the chip 200 is two, and the two passive devices 800 are arranged on the outside of the two adjacent chips 200, and are located in the first Between the metal ring 400 and the chip 200.
  • the form of the two chips 200 and the passive device 800 in FIG. 8 is only an example.
  • the passive device 800 has n, n is an integer, and the chip 200 has m, m is an integer, and m ⁇ 1, m ⁇ n.
  • a passive device 800 can only be connected to the pins of one chip 200, and a passive device 800 can also be connected to the pins of multiple chips 200 at the same time.
  • the specific number of passive devices 800 and the corresponding relationship with the chip 200 can be based on The size of the chip 200 and the chip package are determined.
  • the first insulating layer 500 completely wraps the chip 200 and the passive device 800, and the first metal ring 400 is located around the two chips 200.
  • FIG. 9 shows the second metal ring 700 in The position on the substrate 100, the second metal ring 700 is located around two adjacent chips 200, of course, the same as the first metal ring 400, the second metal ring 700 includes but is not limited to the chip 200 and the chip 200 For example, the second metal ring 700 can be specifically set according to the warpage deformation of the chip package.
  • More second metal rings 700 are arranged at the positions where the warpage deformation of the packaging structure is larger, and the A small amount of the second metal ring 700 is arranged at a position with less deformation, even if the second metal ring 700 is not provided, and the first metal ring 400 and the second metal ring 700 may not be arranged oppositely, and may be arranged in a certain area
  • the first metal ring 400 is provided with a second metal ring 700 in another area.
  • the area size of the two can also be determined according to the actual situation of chip packaging.
  • FIGS. 3 and 8 show a packaging form of the solder ball 300.
  • the surface of the substrate 100 away from the chip 200 is provided with the solder ball 300, and the solder ball 300 is packaged by the second insulating layer 600.
  • the solder balls 300 include but are not limited to solder balls.
  • the solder ball 300 is fixed on the side of the substrate 100 facing away from the chip 200, and a second insulating layer 600 is provided on the side of the substrate 100 facing away from the chip 200.
  • the second insulating layer 600 surrounds the solder balls 300.
  • the other part of the solder balls 300 exposes the side of the second insulating layer 600 away from the substrate 100 for connection between the substrate 100 and other substrates or printed circuit boards.
  • the solder balls 300 expose the second insulation
  • the specific height of the side of the layer 600 facing away from the substrate 100 is determined according to the actual situation of the chip package.
  • the thermal expansion coefficient of the second insulating layer 600 is greater than the thermal expansion coefficient of the substrate 100, so that the thermal mismatch between the substrate 100 and the printed circuit board can be reduced during the temperature cycling process, and the substrate 100 and the printed circuit board
  • the heat distribution between the printed circuit boards is relatively uniform, thereby improving the service life of the substrate 100 and the printed circuit board, and the existence of the second insulating layer 600 can also buffer the stress of the solder balls 300 and enhance the fatigue resistance of the solder balls 300 during the temperature cycling process Characteristics, and thus the board-level reliability of the chip 200.
  • the second insulating layer 600 can be a molding compound, a resin, or a thermal expansion coefficient greater than Other insulating materials of the substrate 100, and the specific material of the second insulating layer 600 are selected according to the actual situation of the chip package.
  • FIG. 10 shows another solder ball form of the chip package.
  • the solder ball 300 may be a special-shaped solder that directly contacts the substrate 100. The ball, as shown in FIG.
  • the special-shaped solder ball 300 includes a first solder ball 310 and a second solder ball 320.
  • the cross section of the first solder ball 310 is a curved surface, and the first solder ball The side of 310 away from the substrate 100 is used as a soldering surface for connecting the second solder ball 320.
  • the cross section of the second solder ball 320 is another arc-shaped surface.
  • the second solder ball 320 has a matching surface with the soldering surface of the first solder ball 310. On the end surface, the second solder ball 320 is embedded on the soldering surface of the first solder ball 310.
  • the first solder ball 310 is disposed in the second insulating layer 600, and the height of the second insulating layer 600 is along the The direction perpendicular to the substrate 100 is equal to the height of the first solder ball 310, so that the end surface of the first solder ball 310 away from the substrate 100 is flush with the second insulating layer 600, so that the welding surface of the first solder ball 310 exposes the second insulating layer 60
  • the special-shaped solder ball can be packaged through this two-layer solder ball arrangement, and the solder ball packaging process described above is relatively simple and easy to implement.
  • FIG. 11 shows another solder ball form of the chip package.
  • the solder ball 300 can also be fixed on the substrate 100 through a connector.
  • the solder ball 330 and the substrate 100 are connected by a metal block 900.
  • the side of the substrate 100 away from the chip 200 is provided with a metal block 900.
  • the side of the metal block 900 away from the substrate 100 is used as a soldering surface for connecting the solder balls 330.
  • the cross-section is an arc surface
  • the solder ball 330 has an end surface that matches the welding surface of the metal block 900
  • the solder ball 330 is embedded on the welding surface of the metal block 900.
  • the metal block 900 with a larger size is selected when the distance between the solder ball 330 and the substrate 100 is small.
  • the metal block 900 is arranged in the second insulating layer 600.
  • the height of the insulating layer 600 is equal to the height of the metal block 900 in a direction perpendicular to the substrate 100 so that the end surface of the metal block 900 away from the substrate 100 is flush with the second insulating layer 600.
  • the height of the solder ball 330 relative to the substrate 100 can be adjusted conveniently and quickly by disposing the metal block 900 between the solder ball 330 and the substrate 100.
  • the metal block 900 may be a copper pillar.
  • the diameter of the copper column ranges from 0.2mm-1mm, and the diameter of the copper column is 0.2mm, 0.4mm, 0.6mm, 0.8mm, 1mm.
  • the shape of the metal block 900 includes but is not limited to a cylinder and a rectangular parallelepiped.
  • the material of the metal block 900 includes but is not limited to copper, copper alloy, nickel, stainless steel.
  • the shape and material of the metal block 900 are based on the solder balls 330 and The actual situation of chip packaging is determined.
  • the present application also provides a method for manufacturing a chip package, and the specific process of the method for manufacturing the chip package is as follows:
  • Step 710 Mount the chip 200 and the first metal ring 400 on the substrate 100.
  • the first metal ring 400 is disposed on the surface of the substrate 100 facing the chip 200 and surrounds the chip 200.
  • the first metal ring 400 is a closed ring or has at least A gaped ring.
  • Figure 13(a) is a structure formed by performing step 710.
  • a plurality of chips 200, a first metal ring 400, and other components are mounted on the substrate 100.
  • the passive device 800 connected to the pins of the chip 200 may also include components capable of implementing other functions.
  • the first metal ring 400 is symmetrical about the center of the chip 200.
  • the substrate 100 is mounted on the surface of the chip 200 with a third metal ring 450, and the third metal ring 450 is located in at least two of the multiple chips 200. Between 200 chips.
  • a first insulating layer 500 is formed on the substrate 100, and the first insulating layer 500 completely covers the first metal ring 400 and surrounds the chip 200.
  • Figure 13(b) is the structure formed by performing step 720.
  • the first insulating layer is prepared on the substrate 100 500.
  • the first insulating layer 500 completely covers the first metal ring 400, is arranged around the chip 200 and wraps the chip 200.
  • the preparation method of the first insulating layer 500 includes but not limited to compression injection molding and transfer injection molding, thermal compression bonding, spraying, etc. the way.
  • Performing step 710 can package the chip 200 and the first metal ring 400 on the substrate 100.
  • the first metal ring 400 can suppress the thermal deformation of the substrate 100 at high temperatures, and in order to further reduce the thermal deformation of the substrate 100 during the packaging process, It is also necessary to provide a second metal ring 700 on the first insulating layer 500, as shown in FIG. 13(c).
  • FIG. 13(c) shows another package structure of the chip 200.
  • the first insulating layer 500 is formed. After that, continue to mount the second metal ring 700 on the side of the first insulating layer 500 away from the substrate 100.
  • the thermal deformation of the substrate 100 during the packaging process is further reduced through two mounting processes.
  • Step 720 Implant solder balls 300 on the side of the substrate 100 away from the chip 200, and then form a second insulating layer 600 on the side of the substrate 100 away from the chip 200.
  • the solder balls 300 are disposed on the surface of the substrate 100 facing away from the chip 200 and facing the substrate 100.
  • the part of the second insulating layer 600 is arranged in the second insulating layer 600.
  • the height of the second insulating layer 600 is smaller than the height of the solder balls 300 along the direction perpendicular to the substrate 100.
  • the thermal expansion coefficient of the second insulating layer 600 is greater than that of the substrate 100.
  • the solder balls can be packaged through different processes.
  • step 730 the following three implementation methods can be used:
  • the solder balls used for chip packaging are common spherical solder balls, which are packaged in Figure 13(d)- Figure 13(e), as shown in Figure 13(d), directly on the side of the substrate 100 facing away from the chip 200
  • the solder balls 300 are implanted.
  • the solder balls 300 are fixedly connected to the substrate 100; then, as shown in FIG. 13(e), a second insulating layer 600 is prepared on the substrate 100, and the second insulating layer 600 surrounds the solder balls. 300, and along the direction perpendicular to the substrate 100, the thickness of the second insulating layer 600 is less than the height of the solder balls 300, so that the solder balls 300 expose the second insulating layer 600.
  • the preparation methods of the second insulating layer 600 include but are not limited to pressing Injection molding and transfer injection molding, hot pressing, spraying and other methods.
  • the solder balls used in the chip package are special-shaped solder balls.
  • the first side of the substrate 100 away from the chip 200 is implanted.
  • Solder balls 310 the first solder balls 310 have a spherical structure, and the first solder balls 310 are fixedly connected to the substrate 100; then, as shown in FIG. 14(b), a layer of first solder balls is formed on the side of the substrate 100 away from the chip 200.
  • the second insulating layer 600 covers the first solder balls 310, along the direction perpendicular to the substrate 100, the thickness of the second insulating layer 600 is greater than or equal to the height of the first solder balls 310, the preparation method of the second insulating layer 600 Including but not limited to compression injection molding and transfer injection molding, thermocompression bonding, spraying, etc.; then, as shown in Figure 14 (c), the second insulating layer 600 and the first solder ball 310 are thinned by a thinning process so as to be vertical In the direction of the substrate 100, the thickness of the second insulating layer 600 and the height of the first solder ball 310 are smaller than the original height of the first solder ball 310, the first solder ball 310 exposes the ball-planting surface, and the ball-planting surface and the second insulating layer 600 are away from the substrate One side of 100 is flush, and the thinning process includes but is not limited to grinding, chemical etching, laser etching, etc.;
  • solder balls used in the chip packaging are indirectly connected to the substrate, and through the package shown in Figure 15(a)-15(d), as shown in Figure 15(a), a metal block is fixed on the side of the substrate 100 facing away from the chip 200 900.
  • the size of the metal block 900 is relatively large, and the metal block 900 is fixedly connected under the pad of the substrate 100.
  • the connection process includes but not limited to electroplating, electroless plating and placing pre-forming; then as shown in Figure 15(b)
  • a second insulating layer 600 is formed on the side of the substrate 100 away from the chip 200.
  • the second insulating layer 600 covers the metal block 900.
  • the thickness of the second insulating layer 600 is greater than or equal to that of the metal block 900.
  • the preparation methods of the second insulating layer 600 include but are not limited to compression injection molding and transfer injection molding, hot compression bonding, spraying, etc.; then, as shown in FIG.
  • a thinning process is used to thin the second insulating layer 600 And the metal block 900 so that in the direction perpendicular to the substrate 100, the thickness of the second insulating layer 600 and the height of the metal block 900 are less than the original height of the metal block 900, and the metal block 900 exposes the ball-planting surface, the ball-planting surface and the second insulating layer 600
  • the side facing away from the substrate 100 is flush, and the thinning process includes, but is not limited to, grinding, chemical etching, laser etching, etc.; finally, as shown in FIG. 15(d), a second solder ball 320 is implanted on the ball-planting surface.
  • the first metal ring 400 is mounted on the substrate 100, and the first metal ring 400 is used to suppress the thermal deformation of the substrate 100 at high temperatures; and the solder balls 300 are planted on the substrate 100.
  • the second insulating layer 600 is formed on one side of the second insulating layer, and the thickness of the second insulating layer 600 is defined to be less than the height of the solder balls 300.
  • the thermal expansion coefficient of the second insulating layer 600 is defined to be greater than the thermal expansion coefficient of the substrate 100, so as to package the solder balls.
  • the formed chip package has less warpage and higher board-level reliability.
  • this application also provides a terminal device, including a chip package and a printed circuit board P(C)(B), the chip package is electrically connected to the P(C)(B), and the chip package is either Chip packaging of technical solutions. Since the chip packaging structure is provided with the first metal ring 400, the warpage deformation is small, and the board-level mounting yield is high. Moreover, by limiting the thermal expansion coefficient of the second insulating layer 600 to be greater than the thermal expansion coefficient of the substrate 100, the chip packaging structure After being connected to the printed circuit board P(C)(B), the board-level reliability during the temperature cycle is relatively high. Therefore, the product yield rate of the terminal device with the chip package is relatively high.

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Wire Bonding (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

The present application provides a chip package, a terminal device, and a preparation method. The chip package comprises a substrate, a chip, and a first metal ring. In a specific configuration, the chip is disposed on a surface of the substrate and electrically connected to the substrate. The first metal ring is disposed on a surface of the substrate facing the chip, and surrounds the chip. The first metal ring, in a specific configuration, can be a closed ring, and can also be a ring having at least one opening. The technical solution uses the first metal ring to suppress thermal deformation of the substrate caused by high temperature, so as to reduce substrate deformation during a package reflow process, thereby effectively reducing warpage and deformation of a package structure, and improving PCB-level mounting yields.

Description

一种芯片封装、终端设备及制备方法Chip packaging, terminal equipment and preparation method 技术领域Technical field
本申请涉及半导体领域,尤其涉及一种芯片封装、终端设备及制备方法。This application relates to the field of semiconductors, and in particular to a chip package, terminal equipment and manufacturing method.
背景技术Background technique
随着芯片集成度不断上升,集成了更多功能需求的芯片的尺寸不断增大,使得封装基板的尺寸也随之加大。而由于芯片与封装基板、印刷电路板的热膨胀系数差别较大,这种差别在封装基板尺寸增大后一方面导致芯片封装在回流过程中存在较大的翘曲,严重影响板级贴装的良率,另一方面导致在高低温循的可靠性测试中,可能发生焊球疲劳失效现象,严重降低板级可靠性。这是目前芯片封装所面临的一个重要难题。As the degree of chip integration continues to increase, the size of chips that integrate more functional requirements continues to increase, resulting in an increase in the size of the package substrate. However, due to the large difference in thermal expansion coefficient between the chip and the package substrate and the printed circuit board, this difference will cause large warpage of the chip package during the reflow process after the size of the package substrate increases, which seriously affects the board-level mounting Yield rate, on the other hand, leads to solder ball fatigue failure in the reliability test of high and low temperature cycling, which seriously reduces board-level reliability. This is an important problem currently faced by chip packaging.
目前,为了减少芯片封装的翘曲的核心思路是对封装基板的结构进行改进,封装基板选择较低的热膨胀系数的材料,并且采用较厚的封装基板核心材料,但这种改进会引入其他影响,一方面较厚的封装基板核心层材料对于信号完整性有负面的影响,而另一方面较低热膨胀系数的材料会导致封装基板与印刷电路板发生更大程度的热失配,导致焊球疲劳寿命降低。At present, in order to reduce the warpage of the chip package, the core idea is to improve the structure of the package substrate. The package substrate chooses a material with a lower thermal expansion coefficient and uses a thicker core material of the package substrate, but this improvement will introduce other effects On the one hand, the thicker core layer material of the package substrate has a negative impact on signal integrity, and on the other hand, the material with a lower thermal expansion coefficient will cause a greater degree of thermal mismatch between the package substrate and the printed circuit board, resulting in solder balls Fatigue life is reduced.
发明内容Summary of the invention
本申请提供一种芯片封装、终端设备及制备方法,用以解决现有技术中芯片封装翘曲变形及板级可靠性低的问题。The present application provides a chip package, a terminal device, and a manufacturing method to solve the problems of chip package warpage and low board-level reliability in the prior art.
第一方面,本申请提供了一种芯片封装,该芯片封装包括基板、芯片及第一金属环,在具体设置时,所述芯片设置在所述基板的表面、且与所述基板电连接,该第一金属环设置于所述基板朝向所述芯片的表面,且围绕所述芯片,在具体设置时,所述第一金属环可以为封闭环,所述第一金属环也可以为具有至少一个缺口的环。In a first aspect, the present application provides a chip package that includes a substrate, a chip, and a first metal ring. When specifically installed, the chip is disposed on the surface of the substrate and is electrically connected to the substrate, The first metal ring is arranged on the surface of the substrate facing the chip and surrounds the chip. When specifically arranged, the first metal ring may be a closed ring, and the first metal ring may also have at least A gaped ring.
在上述技术方案中,通过采用第一金属环抑制基板在高温下的热变形,以减少在封装回流过程中基板的变形量,从而能够有效减小封装结构的翘曲变形,提高板级贴装良率。In the above technical solution, the first metal ring is used to suppress the thermal deformation of the substrate at high temperature, so as to reduce the deformation of the substrate during the package reflow process, thereby effectively reducing the warpage of the package structure and improving the board-level mounting Yield rate.
在一个具体的实施方案中,所述第一金属环可以设置成关于所述芯片的中心对称。该第一金属环包括但不局限于关于所述芯片的中心对称。In a specific embodiment, the first metal ring may be arranged symmetrically with respect to the center of the chip. The first metal ring includes, but is not limited to, symmetry about the center of the chip.
在一个具体的实施方案中,该芯片封装还包括第一绝缘层,所述第一绝缘层设置于所述基板朝向所述芯片的表面,所述芯片和所述第一金属环设置在所述第一绝缘层内。该第一绝缘层刚好覆盖芯片,且露出上表面,以便能与芯片后续操作。In a specific embodiment, the chip package further includes a first insulating layer disposed on the surface of the substrate facing the chip, and the chip and the first metal ring are disposed on the Inside the first insulating layer. The first insulating layer just covers the chip and exposes the upper surface for subsequent operations with the chip.
在一个具体的实施方案中,该芯片封装还包括第二金属环,述第二金属环设置在所述第一绝缘层背离所述基板的表面,且围绕所述芯片,在具体设置时,所述第二金属环可以为封闭环,所述第二金属环也可以为具有至少一个缺口的环。通过设置第一绝缘层以及第二金属环能够进一步降低基板在封装过程中的热变形。In a specific embodiment, the chip package further includes a second metal ring. The second metal ring is arranged on the surface of the first insulating layer away from the substrate and surrounds the chip. The second metal ring may be a closed ring, and the second metal ring may also be a ring with at least one gap. By providing the first insulating layer and the second metal ring, the thermal deformation of the substrate during the packaging process can be further reduced.
在一个具体的实施方案中,所述第二金属环可以设置成关于所述芯片的中心对称。该第二金属环包括但不局限于关于所述芯片的中心对称。In a specific embodiment, the second metal ring may be arranged symmetrically with respect to the center of the chip. The second metal ring includes, but is not limited to, symmetry about the center of the chip.
在一个具体的实施方案中,该芯片封装还包括无源器件,所述无源器件设置于所述基板朝向所述芯片的表面,且与所述芯片引脚相连,所述无源器件与所述基板电连接,所述无源器件设置在所述第一绝缘层内、且位于所述第一金属环和所述芯片之间。In a specific embodiment, the chip package further includes a passive device, the passive device is disposed on the surface of the substrate facing the chip, and is connected to the pins of the chip, and the passive device is connected to the chip. The substrate is electrically connected, and the passive device is arranged in the first insulating layer and located between the first metal ring and the chip.
在一个具体的实施方案中,所述芯片的数目为多个,所述芯片封装还包括第三金属环,所述第三金属环设置于所述基板朝向所述芯片的表面,且位于多个所述芯片中至少两个所述芯片之间。以进一步降低基板在封装过程中的热变形。In a specific embodiment, the number of the chips is multiple, the chip package further includes a third metal ring, the third metal ring is disposed on the surface of the substrate facing the chip, and is located on the multiple Between at least two of the chips. In order to further reduce the thermal deformation of the substrate during the packaging process.
在一个具体的实施方案中,为了解决现有技术中芯片封装板级可靠性低的问题,该芯片封装还包括焊球以及第二绝缘层,所述第二绝缘层设置于所述基板背对所述芯片的表面,所述焊球设置在所述基板背对所述芯片的表面且朝向所述基板的部分设置于所述第二绝缘层中,所述第二绝缘层的高度在沿垂直于所述基板的方向小于所述焊球的高度,所述第二绝缘层的热膨胀系数大于所述基板的热膨胀系数。通过采用热膨胀系数大于基板的热膨胀系数的第二绝缘层来封装焊球,不仅能够在温循过程中降低基板和印刷电路板间的热失配,另一方面还能够缓冲焊球应力,增强焊球在温循过程中的抗疲劳特性,从而芯片的板级可靠性。In a specific embodiment, in order to solve the problem of low board-level reliability of the chip package in the prior art, the chip package further includes solder balls and a second insulating layer, and the second insulating layer is disposed on the back of the substrate. On the surface of the chip, the solder balls are arranged on the part of the substrate facing the surface of the substrate away from the chip and are arranged in the second insulating layer, and the height of the second insulating layer is perpendicular to The direction of the substrate is smaller than the height of the solder ball, and the thermal expansion coefficient of the second insulating layer is greater than the thermal expansion coefficient of the substrate. By using a second insulating layer with a thermal expansion coefficient greater than that of the substrate to encapsulate the solder balls, not only can the thermal mismatch between the substrate and the printed circuit board be reduced during the temperature cycle, but on the other hand, the solder ball stress can be buffered and the soldering can be enhanced. The anti-fatigue properties of the ball during the temperature cycling process, thereby the board-level reliability of the chip.
在一个具体的实施方案中,所述焊球包括与所述基板连接的第一焊球以及嵌设在所述第一焊球背离所述基板的一面上的第二焊球,所述第一焊球设置于所述第二绝缘层中,所述第二绝缘层的高度在沿垂直于所述基板的方向等于所述第一焊球的高度。通过两层焊球的布置以较为方便快捷地在基板上封装异形焊球。In a specific embodiment, the solder ball includes a first solder ball connected to the substrate and a second solder ball embedded on a side of the first solder ball facing away from the substrate. The solder balls are arranged in the second insulating layer, and the height of the second insulating layer is equal to the height of the first solder balls in a direction perpendicular to the substrate. Through the arrangement of two layers of solder balls, the special-shaped solder balls can be packaged on the substrate more conveniently and quickly.
在一个具体的实施方案中,该芯片封装还包括焊球、金属块以及第二绝缘层,所述第二绝缘层设置于所述基板背对所述芯片的表面,所述金属块设置于所述基板背离所述芯片的表面且位于所述第二绝缘层中,所述焊球固定在所述金属块背离所述基板的一面上,所述第二绝缘层的高度在沿垂直于所述基板的方向等于所述金属块的高度。通过在焊球和基板之间设置金属块能够方便快捷地调整焊球相对基板的高度。In a specific embodiment, the chip package further includes a solder ball, a metal block, and a second insulating layer. The second insulating layer is disposed on the surface of the substrate facing away from the chip, and the metal block is disposed on the surface of the substrate. The substrate faces away from the surface of the chip and is located in the second insulating layer, the solder balls are fixed on the side of the metal block away from the substrate, and the height of the second insulating layer is perpendicular to the The direction of the substrate is equal to the height of the metal block. The height of the solder ball relative to the substrate can be adjusted conveniently and quickly by arranging a metal block between the solder ball and the substrate.
在一个具体的实施方案中,所述第二绝缘层的材料为树脂或塑封料,还可以为热膨胀系数大于基板的其他绝缘材料。In a specific embodiment, the material of the second insulating layer is resin or molding compound, and can also be other insulating materials with a larger thermal expansion coefficient than the substrate.
第二方面,本申请还提供了一种终端设备,包括芯片封装和印制电路板P(C)(B),所述芯片封装与所述P(C)(B)电连接,所述芯片封装为如任一项技术方案所述的芯片封装。由于芯片封装结构的翘曲变形较小,板级贴装良率较高,因此,具有该芯片封装的终端设备的产品良率较高。In the second aspect, the application also provides a terminal device, including a chip package and a printed circuit board P(C)(B), the chip package is electrically connected to the P(C)(B), and the chip The package is a chip package as described in any technical solution. Since the warpage deformation of the chip packaging structure is small, and the board-level mounting yield is high, the product yield of the terminal device with the chip packaging is relatively high.
第三方面,本申请还提供了一种芯片封装的制备方法,包括:在基板的一面上贴装芯片以及第一金属环,所述第一金属环设置于所述基板朝向所述芯片的表面,且围绕所述芯片,所述第一金属环为封闭环或具有至少一个缺口的环。In a third aspect, the present application also provides a method for preparing a chip package, including: mounting a chip and a first metal ring on one side of a substrate, the first metal ring being disposed on the surface of the substrate facing the chip , And surrounding the chip, the first metal ring is a closed ring or a ring with at least one gap.
在上述技术方案中,通过在基板上贴装第一金属环,第一金属环用于抑制基板在高温下的热变形;上述形成过程工序较少、制备较为方便快捷,所形成的芯片封装翘曲变形较小。In the above technical solution, the first metal ring is mounted on the substrate, and the first metal ring is used to suppress the thermal deformation of the substrate at high temperature; the above-mentioned forming process has fewer steps, more convenient and quick preparation, and the formed chip package is warped The bending deformation is small.
在一个具体的实施方案中,所述第一金属环关于所述芯片的中心对称。In a specific embodiment, the first metal ring is symmetrical about the center of the chip.
在一个具体的实施方案中,该芯片封装的制备方法还包括:在基板朝向芯片的表面形成第一绝缘层,所述芯片和所述第一金属环设置在所述第一绝缘层内;In a specific embodiment, the manufacturing method of the chip package further includes: forming a first insulating layer on the surface of the substrate facing the chip, and the chip and the first metal ring are arranged in the first insulating layer;
在第一绝缘层背离所述基板的一面上贴装第二金属环,所述第二金属环为封闭环或具有至少一个缺口的环,且围绕所述芯片。通过两次贴装进一步降低基板在封装过 程中的热变形。A second metal ring is attached to the side of the first insulating layer facing away from the substrate. The second metal ring is a closed ring or a ring with at least one gap and surrounds the chip. Two mounting times further reduce the thermal deformation of the substrate during the packaging process.
在一个具体的实施方案中,所述第二金属环关于所述芯片的中心对称。In a specific embodiment, the second metal ring is symmetrical about the center of the chip.
在一个具体的实施方案中,该芯片封装的制备方法还包括:在基板朝向芯片的表面贴装无源器件,所述无源器件设置在所述第一绝缘层内、且位于所述第一金属环和所述芯片之间。In a specific embodiment, the manufacturing method of the chip package further includes: mounting a passive device on the surface of the substrate facing the chip, and the passive device is arranged in the first insulating layer and located in the first insulating layer. Between the metal ring and the chip.
在一个具体的实施方案中,在芯片的数目为多个时,该芯片封装的制备方法还包括:在形成第一绝缘层之前,在所述基板朝向所述芯片的表面贴装第三金属环,所述第三金属环位于多个所述芯片中至少两个所述芯片之间。In a specific embodiment, when the number of chips is multiple, the method for preparing the chip package further includes: before forming the first insulating layer, mounting a third metal ring on the surface of the substrate facing the chip , The third metal ring is located between at least two of the plurality of chips.
在一个具体的实施方案中,该芯片封装的制备方法还包括:在所述基板背离芯片的一面上植入焊球;在所述基板背离芯片的一面形成一层第二绝缘层,所述焊球设置在所述基板背对所述芯片的表面且朝向所述基板的部分设置于所述第二绝缘层中,所述第二绝缘层的高度在沿垂直于所述基板的方向小于所述焊球的高度,所述第二绝缘层的热膨胀系数大于所述基板的热膨胀系数。在上述技术方案中,通过在基板上植有焊球的一面形成第二绝缘层,并限定第二绝缘层的厚度小于焊球的高度、在材料选择时限定第二绝缘层的热膨胀系数大于基板的热膨胀系数,以在封装焊球的同时使得在温循过程中降低基板和印刷电路板间的热失配,缓冲焊球应力,增强焊球在温循过程中的抗疲劳特性;上述形成过程工序较少、制备较为方便快捷,所形成的芯片封装板级可靠性较高。In a specific embodiment, the method for preparing the chip package further includes: implanting solder balls on the side of the substrate facing away from the chip; forming a second insulating layer on the side of the substrate facing away from the chip; The ball is arranged on the surface of the substrate opposite to the chip and facing the substrate in the second insulating layer. The height of the second insulating layer is smaller than the height of the second insulating layer in the direction perpendicular to the substrate. The height of the solder ball, the thermal expansion coefficient of the second insulating layer is greater than the thermal expansion coefficient of the substrate. In the above technical solution, the second insulating layer is formed on the side where the solder balls are planted on the substrate, and the thickness of the second insulating layer is limited to be smaller than the height of the solder balls, and the thermal expansion coefficient of the second insulating layer is defined to be greater than that of the substrate during material selection. The thermal expansion coefficient can reduce the thermal mismatch between the substrate and the printed circuit board during the temperature cycle while packaging the solder balls, buffer the solder ball stress, and enhance the fatigue resistance of the solder balls during the temperature cycle; the above forming process There are fewer procedures, more convenient and quick preparation, and the formed chip package has higher board-level reliability.
针对不同尺寸、形状、位置要求的焊球,可以通过不同的工艺过程来封装焊球,其中一个具体的实施方案中,所述在背离芯片的一面植有焊球的所述基板上形成第二绝缘层,具体包括:在所述基板背离芯片的一面上植入焊球;在所述基板背离芯片的一面形成一层第二绝缘层,沿垂直于所述基板的方向,所述第二绝缘层的厚度小于所述焊球的高度,且所述第二绝缘层围绕所述焊球。通过上述工艺能够封装尺寸、形状及位置要求较低的焊球。For solder balls of different sizes, shapes, and positions, the solder balls can be packaged through different processes. In a specific embodiment, the second substrate is formed on the side facing away from the chip with solder balls. The insulating layer specifically includes: implanting solder balls on the side of the substrate facing away from the chip; forming a second insulating layer on the side of the substrate facing away from the chip. Along a direction perpendicular to the substrate, the second insulating layer The thickness of the layer is less than the height of the solder ball, and the second insulating layer surrounds the solder ball. Through the above process, solder balls with lower size, shape and location requirements can be packaged.
另一个具体的实施方案中,所述在背离芯片的一面植有焊球的所述基板上形成第二绝缘层,具体包括:在所述基板背离芯片的一面上植入第一焊球;在所述基板背离芯片的一面形成一层第二绝缘层,沿垂直于所述基板的方向,所述第二绝缘层的高度大于所述第一焊球的高度;采用减薄工艺减薄所述第二绝缘层及第一焊球,所述第一焊球露出植球面,所述植球面与所述第二绝缘层背离所述基板的一面平齐;在所述植球面上植入第二焊球。通过两层焊球的制备工艺能够较为方便快捷地在基板上封装异形焊球。In another specific embodiment, said forming a second insulating layer on the substrate with solder balls planted on the side facing away from the chip specifically includes: implanting first solder balls on the side of the substrate facing away from the chip; A second insulating layer is formed on the side of the substrate facing away from the chip. Along a direction perpendicular to the substrate, the height of the second insulating layer is greater than the height of the first solder balls; A second insulating layer and a first solder ball. The first solder ball exposes the ball-planting surface, and the ball-planting surface is flush with the surface of the second insulating layer facing away from the substrate; Solder balls. The special-shaped solder balls can be packaged on the substrate more conveniently and quickly through the two-layer solder ball preparation process.
再一个具体的实施方案中,所述在背离芯片的一面植有焊球的所述基板上形成第二绝缘层,具体包括:在所述基板背离芯片的一面上固定设置金属块;在所述基板背离芯片的一面形成一层第二绝缘层,沿垂直于所述基板的方向,所述第二绝缘层的高度大于所述金属块的高度;采用减薄工艺减薄所述第二绝缘层及金属块,所述金属块露出植球面,所述植球面与所述第二绝缘层背离所述基板的一面平齐;在所述植球面上植入焊球。通过在焊球和基板之间设置金属块能够方便快捷地调整焊球相对基板的高度。In still another specific embodiment, the forming a second insulating layer on the substrate on which the solder balls are planted on the side facing away from the chip specifically includes: fixing a metal block on the side of the substrate facing away from the chip; A second insulating layer is formed on the side of the substrate away from the chip. Along the direction perpendicular to the substrate, the height of the second insulating layer is greater than the height of the metal block; the second insulating layer is thinned by a thinning process And a metal block, wherein the metal block exposes a ball-planting surface, and the ball-planting surface is flush with the side of the second insulating layer away from the substrate; and solder balls are implanted on the ball-planting surface. The height of the solder ball relative to the substrate can be adjusted conveniently and quickly by arranging a metal block between the solder ball and the substrate.
附图说明Description of the drawings
图1为现有技术中的芯片封装的剖面示意图;Fig. 1 is a schematic cross-sectional view of a chip package in the prior art;
图2为本申请提供的芯片封装的剖面示意图;2 is a schematic cross-sectional view of the chip package provided by this application;
图3为本申请提供的另一芯片封装的剖面示意图;3 is a schematic cross-sectional view of another chip package provided by this application;
图4(a)-(d)为图2中的(A)-(A)剖视图;Figures 4(a)-(d) are cross-sectional views of (A)-(A) in Figure 2;
图5为图3中的(B)-(B)剖视图;Figure 5 is a cross-sectional view of (B)-(B) in Figure 3;
图6为本申请提供的另一芯片封装的剖面示意图;6 is a schematic cross-sectional view of another chip package provided by this application;
图7为图6中的(C)-(C)剖视图;Figure 7 is a cross-sectional view (C)-(C) in Figure 6;
图8为本申请提供的另一种芯片封装的剖面示意图;8 is a schematic cross-sectional view of another chip package provided by this application;
图9为图8中的芯片封装的俯视图;FIG. 9 is a top view of the chip package in FIG. 8;
图10为本申请提供的又一种芯片封装的剖面示意图;10 is a schematic cross-sectional view of another chip package provided by this application;
图11为本申请提供的再一种芯片封装的剖面示意图;FIG. 11 is a schematic cross-sectional view of still another chip package provided by this application;
图12为本申请提供的芯片封装的的制备方法流程图;FIG. 12 is a flow chart of the manufacturing method of the chip package provided by this application;
图13(a)-(e)为本申请提供的芯片封装的制备过程图;Figure 13(a)-(e) is a diagram of the manufacturing process of the chip package provided by this application;
图14(a)-(d)为本申请提供的芯片封装中焊球封装的另一种制备过程图;Figure 14(a)-(d) is another process diagram of the solder ball package in the chip package provided by this application;
图15(a)-(d)为本申请提供的芯片封装中焊球封装的又一种制备过程图。15(a)-(d) are diagrams of another manufacturing process of the solder ball package in the chip package provided by this application.
具体实施方式detailed description
为了使本申请的目的、技术方案和优点更加清楚,下面将结合附图对本申请作进一步地详细描述。In order to make the purpose, technical solutions, and advantages of the present application clearer, the present application will be further described in detail below with reference to the accompanying drawings.
针对现有技术中芯片封装翘曲变形及板级可靠性较低的问题,现有的芯片封装通过改变封装基板的结构及封装基板的材料,但是这种变化导致对焊球造成不利影响,目前,现有技术中芯片封装如图1所示,芯片封装500采用塑封料530进行封装,位于基板520上表面521的芯片510通过塑封料531封装,位于基板520下表面523的焊球540通过塑封料532封装,在焊球540封装时基板520的下表面522设有阻焊层524,塑封料532覆盖该阻焊层524、并设置开口533以使焊盘523露出,开口533尺寸大于焊球540尺寸,以使得塑封料532不会直接和焊球540接触,从而增强焊球540对湿气的抵挡及防止焊球受到撞击脱落,但是这种芯片封装只是从物理上直接增强保护性,无法显著改善芯片封装的热变形和提升板级可靠性。在本申请实施例中通过改变芯片封装的结构及焊球封装的结构及材料,以改善现有技术中芯片封装翘曲变形及板级可靠性较低的问题。为了便于理解,下面对本申请提到的几个词语进行介绍,电连接是指能够实现两个部件之间电气连接的方式,如焊接、金丝键合等,环是具有一定厚度、沿着弧形状延伸的几何图形,可以封闭也可以不封闭。In view of the problems of chip package warpage and low board-level reliability in the prior art, the existing chip package changes the structure of the package substrate and the material of the package substrate, but this change causes an adverse effect on the solder balls. The chip package in the prior art is shown in FIG. 1. The chip package 500 is packaged with a plastic molding compound 530, the chip 510 located on the upper surface 521 of the substrate 520 is packaged with the plastic molding compound 531, and the solder balls 540 located on the lower surface 523 of the substrate 520 are packaged with plastic When the solder ball 540 is packaged, the lower surface 522 of the substrate 520 is provided with a solder resist layer 524. The plastic encapsulant 532 covers the solder resist layer 524, and an opening 533 is provided to expose the pad 523. The size of the opening 533 is larger than the solder ball. 540 size, so that the molding compound 532 will not directly contact the solder balls 540, thereby enhancing the resistance of the solder balls 540 to moisture and preventing the solder balls from being impacted and falling off. However, this chip package only directly enhances the protection directly physically. Significantly improve the thermal deformation of the chip package and enhance the board-level reliability. In the embodiments of the present application, the structure of the chip package and the structure and materials of the solder ball package are changed to improve the problems of chip package warpage and low board-level reliability in the prior art. In order to facilitate understanding, the following introduces several words mentioned in this application. Electrical connection refers to a way to achieve electrical connection between two components, such as welding, gold wire bonding, etc. The ring has a certain thickness and runs along the arc. The extended geometric figures can be closed or unclosed.
第一方面,本申请提供了一种芯片封装,如图2、图3、图4以及图5所示,图3示出了芯片封装的一种结构的剖面示意图,图2示出了芯片封装的另一种结构的剖面示意图,图4示出了芯片封装的中第一金属环的结构的剖面示意图,图5示出了芯片封装的中第一金属环的另一结构的剖面示意图,该芯片封装包括一个基板100,以及芯片200和焊球300,芯片200和焊球300位于基板100的两侧,该芯片200包括但不限于引线键合芯片和倒装芯片,该芯片200的个数可以为一个或者多个,如图3所示该芯片200的个数为两个,如图2所示该芯片200的个数为一个,并且在采用多个芯片时,芯片可以为不同类型的芯片。本申请提供实施例中,该基板100上设置有两 个芯片200,上述两个芯片200的形式只是仅仅作为一个示例。如图3以及图2所示,基板100的一侧设置有芯片200及第一金属环400,第一金属环400可以为封闭环或具有至少一个缺口的环,在芯片200设置时,芯片200与基板100电连接,并且在基板100上的同一侧还固定了第一金属环400,在封装回流过程中,由于第一金属环400设置在基板100上能够抑制基板100在高温下的热变形,以减少在封装回流过程中基板100的变形量,从而能够有效减小芯片封装的翘曲变形,进而提高板级贴装良率。该第一金属环400可以为环形结构,如图4(a)所示,该环形结构可以为环状封闭结构,如图4(b)所示,该环形结构也可以有非封闭的多个弧形结构组成,两个弧形结构之间形成缺口,该第一金属环400包括但并不局限于环状封闭结构和具有至少一个缺口的分离结构。该第一金属环400还可以为其他结构形式,如第一金属环400可以为设置在芯片200外侧的框型结构,如图4(c)所示,该环形结构可以为封闭框型结构,如图4(d)所示,该环形结构也可以有非封闭的多个条状结构组成。当然,该环形结构还可以为设置在基板100上的折线形结构。在具体设置时,第一金属环400可以关于芯片200的中心对称,该第一金属环400包括但不局限于关于芯片200的中心对称。如图4(a)-图4(d)所示,在只有一个芯片200时,该环形结构设置在芯片200的四周,如图5所示,在具有两个芯片时,该环形结构可以设置在芯片200的四周,而在具有多个芯片时,该环形结构可以设置在芯片200的四周,如图6以及图7所示,该环形结构还可以设置在两个芯片200之间,图6示出了芯片封装的另一种结构的剖面示意图,图7示出了芯片封装的中环形结构的结构的剖面示意图,该环形结构由第一金属环400和第三金属环450组成,第一金属环400包括弧形结构410、弧形结构420、弧形结构430、弧形结构440,在具体设置时,第三金属环450设置于基板100朝向芯片200的表面,且位于两个芯片200之间,弧形结构410、弧形结构420、弧形结构440与第三金属环450配合以围绕左侧的芯片200,弧形结构420、弧形结构430、弧形结构440与第三金属环450配合以围绕右侧的芯片200。当然第一金属环400包括但并不局限于芯片200的四周和芯片200之间的位置,如第一金属环400可以根据芯片封装的翘曲变形情况具体设置,在封装结构的翘曲变形较大的位置较多地布置第一金属环400,而在封装结构的翘曲变形较小的位置布置少量的第一金属环400,甚至是不设置第一金属环400。In the first aspect, this application provides a chip package, as shown in FIGS. 2, 3, 4, and 5. FIG. 3 shows a schematic cross-sectional view of a structure of the chip package, and FIG. 2 shows the chip package. Fig. 4 shows a schematic cross-sectional view of the structure of the first metal ring in the chip package, and Fig. 5 shows a schematic cross-sectional view of another structure of the first metal ring in the chip package. The chip package includes a substrate 100, and a chip 200 and solder balls 300. The chip 200 and solder balls 300 are located on both sides of the substrate 100. The chip 200 includes but is not limited to wire bond chips and flip chips. The number of chips 200 It can be one or more. As shown in FIG. 3, the number of chips 200 is two, and as shown in FIG. 2, the number of chips 200 is one, and when multiple chips are used, the chips can be of different types. chip. In the embodiments provided in the present application, two chips 200 are provided on the substrate 100, and the form of the two chips 200 described above is merely an example. As shown in FIGS. 3 and 2, a chip 200 and a first metal ring 400 are provided on one side of the substrate 100. The first metal ring 400 may be a closed ring or a ring with at least one gap. When the chip 200 is installed, the chip 200 It is electrically connected to the substrate 100, and the first metal ring 400 is fixed on the same side of the substrate 100. During the package reflow process, the first metal ring 400 is arranged on the substrate 100 to suppress the thermal deformation of the substrate 100 at high temperatures In order to reduce the amount of deformation of the substrate 100 during the reflow process of the package, the warpage deformation of the chip package can be effectively reduced, thereby improving the board-level mounting yield. The first metal ring 400 may be a ring structure, as shown in FIG. 4(a), the ring structure may be a ring closed structure, as shown in FIG. 4(b), the ring structure may also have a plurality of non-closed It is composed of an arc-shaped structure, and a gap is formed between two arc-shaped structures. The first metal ring 400 includes, but is not limited to, a ring-shaped closed structure and a separated structure with at least one gap. The first metal ring 400 may also have other structural forms. For example, the first metal ring 400 may be a frame-shaped structure arranged outside the chip 200. As shown in FIG. 4(c), the ring-shaped structure may be a closed frame-shaped structure. As shown in Figure 4(d), the ring structure can also be composed of multiple non-closed strip structures. Of course, the ring structure may also be a broken line structure provided on the substrate 100. In a specific configuration, the first metal ring 400 may be symmetrical about the center of the chip 200, and the first metal ring 400 includes but is not limited to be symmetrical about the center of the chip 200. As shown in Figure 4 (a)-Figure 4 (d), when there is only one chip 200, the ring structure is arranged around the chip 200, as shown in Figure 5, when there are two chips, the ring structure can be arranged Around the chip 200, and when there are multiple chips, the ring structure may be arranged around the chip 200, as shown in FIG. 6 and FIG. 7, the ring structure may also be arranged between two chips 200, FIG. Shows a schematic cross-sectional view of another structure of the chip package. FIG. 7 shows a schematic cross-sectional view of the structure of the middle ring structure of the chip package. The ring structure is composed of a first metal ring 400 and a third metal ring 450. The metal ring 400 includes an arc structure 410, an arc structure 420, an arc structure 430, and an arc structure 440. When specifically arranged, the third metal ring 450 is disposed on the surface of the substrate 100 facing the chip 200, and is located on the two chips 200 In between, the arc structure 410, the arc structure 420, the arc structure 440 and the third metal ring 450 cooperate to surround the chip 200 on the left, the arc structure 420, the arc structure 430, the arc structure 440 and the third metal ring The ring 450 cooperates to surround the chip 200 on the right. Of course, the first metal ring 400 includes but is not limited to the periphery of the chip 200 and the position between the chips 200. For example, the first metal ring 400 can be specifically set according to the warpage deformation of the chip package, and the warpage deformation of the package structure is relatively high. More first metal rings 400 are arranged in large positions, and a small number of first metal rings 400 are arranged in positions where the warpage deformation of the package structure is small, or even no first metal rings 400 are arranged.
继续参考图3、图8以及图9所示,图3示出了芯片封装的一种结构的剖面示意图,图8示出了芯片封装的另一种结构的剖面示意图,图9示出了芯片在基板上的位置,为了进一步降低基板100在封装过程中的热变形,该芯片封装还包括第一绝缘层500以及第二金属环700,第一绝缘层500用于封装芯片200和第一金属环400,第一绝缘层500设置于基板100朝向芯片200的表面,芯片200和第一金属环400设置在第一绝缘层500内部,该第一绝缘层500刚好覆盖芯片200,且芯片200露出背离基板100的上表面,以便能与芯片200后续操作,在具体设置第一绝缘层500时,第一绝缘层500的材料可以为塑封料,树脂,还可以为其他满足需求的绝缘材料,而第一绝缘层500具体材料的选择根据芯片封装的实际情况进行选择。而在具体设置时,该第一绝缘层500完全覆盖第一金属环400、且围绕芯片200的四周,以实现芯片200的稳定封装。继续参考图3,图3示出了第一绝缘层500和第一金属环400之间的位置关系,在具体设置第一绝缘层500和第一金属环400时,沿垂直于基板100的方向, 第一金属环400的厚度小于第一绝缘层500的厚度,以使得第一金属环400完全包裹在第一绝缘层500内,从而避免第一金属环400的设置对芯片封装的其他部件的设置位置、尺寸造成不利影响。同时第一金属环400背离基板100的一侧上具有第一绝缘层500使得第一金属环400的设置不会对芯片封装的其他部件的功能造成不利影响。Continuing to refer to Figures 3, 8 and 9, Figure 3 shows a schematic cross-sectional view of a structure of the chip package, Figure 8 shows a schematic cross-sectional view of another structure of the chip package, and Figure 9 shows a schematic cross-sectional view of another structure of the chip package. At the position on the substrate, in order to further reduce the thermal deformation of the substrate 100 during the packaging process, the chip package further includes a first insulating layer 500 and a second metal ring 700. The first insulating layer 500 is used to package the chip 200 and the first metal. Ring 400, the first insulating layer 500 is disposed on the surface of the substrate 100 facing the chip 200, the chip 200 and the first metal ring 400 are disposed inside the first insulating layer 500, the first insulating layer 500 just covers the chip 200, and the chip 200 is exposed Away from the upper surface of the substrate 100 to enable subsequent operations with the chip 200. When the first insulating layer 500 is specifically provided, the material of the first insulating layer 500 can be a plastic molding compound, a resin, or other insulating materials that meet the requirements. The specific material of the first insulating layer 500 is selected according to the actual situation of the chip package. In the specific configuration, the first insulating layer 500 completely covers the first metal ring 400 and surrounds the periphery of the chip 200, so as to realize the stable packaging of the chip 200. Continuing to refer to FIG. 3, FIG. 3 shows the positional relationship between the first insulating layer 500 and the first metal ring 400. When the first insulating layer 500 and the first metal ring 400 are specifically arranged, along the direction perpendicular to the substrate 100 The thickness of the first metal ring 400 is less than the thickness of the first insulating layer 500, so that the first metal ring 400 is completely wrapped in the first insulating layer 500, so as to prevent the arrangement of the first metal ring 400 from affecting other components of the chip package. The setting position and size will cause adverse effects. At the same time, the first metal ring 400 has the first insulating layer 500 on the side away from the substrate 100 so that the arrangement of the first metal ring 400 will not adversely affect the functions of other components of the chip package.
继续参考图8,图8示出了第一绝缘层500和第二金属环700之间的位置关系,第一绝缘层500背离基板100的一面上设置有第二金属环700,且第二金属环700围绕芯片200的四周,一并参考图9,图9示出了芯片200和第二金属环700的位置关系,第二金属环700将芯片200包裹起来。与第一金属环400类似,第二金属环700可以为封闭环或具有至少一个缺口的环,该第二金属环700可以为环形结构,该环形结构可以为环状封闭结构,也可以有非封闭的多个弧形结构组成,两个弧形结构之间形成缺口,该第二金属环700包括但并不局限于环状封闭结构和具有至少一个缺口的分离结构。该第二金属环700还可以为其他结构形式,如第二金属环700可以为设置在芯片200外侧的框型结构,也可以为设置在基板100上的折线形结构。在具体设置时,第二金属环700可以关于芯片200的中心对称,该第二金属环700包括但不局限于关于芯片200的中心对称。以保证基板100变形的均匀性,进而提高芯片封装结构的稳定性,在封装回流过程中,由于第一金属环400设置在基板100上能够抑制基板100在高温下的热变形,以减少在封装回流过程中基板100的变形量,而第二金属环700设置在第一绝缘层500上能够进一步抑制基板100在高温下的热变形,以进一步减少在封装回流过程中基板100的变形量,从而能够更好地减小芯片封装的翘曲变形,进而提高板级贴装良率。在具体设置第一金属环400和第二金属环700时,第一金属环400和第二金属环700的材料可以选择同一金属材料,如铜或不锈钢,第一金属环400和第二金属环700的材料还可以选择不同的金属材料,如第一金属环400可以选择铜,而第二金属环700可以选择不锈钢,当然第一金属环400和第二金属环700的材料包括但并不局限于这两种金属,还可以选择满足需求的其他材料。Continuing to refer to FIG. 8, FIG. 8 shows the positional relationship between the first insulating layer 500 and the second metal ring 700. The second metal ring 700 is provided on the side of the first insulating layer 500 away from the substrate 100, and the second metal The ring 700 surrounds the periphery of the chip 200. Refer to FIG. 9 together. FIG. 9 shows the positional relationship between the chip 200 and the second metal ring 700. The second metal ring 700 wraps the chip 200. Similar to the first metal ring 400, the second metal ring 700 can be a closed ring or a ring with at least one gap, the second metal ring 700 can be a ring structure, the ring structure can be a ring closed structure, or a non- The second metal ring 700 is composed of a plurality of closed arc-shaped structures, and a gap is formed between the two arc-shaped structures. The second metal ring 700 includes but is not limited to a ring-shaped closed structure and a separated structure with at least one gap. The second metal ring 700 may also have other structural forms. For example, the second metal ring 700 may be a frame-shaped structure arranged on the outside of the chip 200, or may be a broken line-shaped structure arranged on the substrate 100. In specific settings, the second metal ring 700 may be symmetrical about the center of the chip 200, and the second metal ring 700 includes but is not limited to being symmetrical about the center of the chip 200. In order to ensure the uniformity of the deformation of the substrate 100, thereby improving the stability of the chip packaging structure, during the reflow process of the package, the first metal ring 400 is arranged on the substrate 100 to suppress the thermal deformation of the substrate 100 at high temperatures, thereby reducing the The amount of deformation of the substrate 100 during the reflow process, and the second metal ring 700 disposed on the first insulating layer 500 can further suppress the thermal deformation of the substrate 100 at high temperatures, so as to further reduce the amount of deformation of the substrate 100 during the package reflow process, thereby It can better reduce the warpage of the chip package, thereby improving the board-level mounting yield. When the first metal ring 400 and the second metal ring 700 are specifically set, the material of the first metal ring 400 and the second metal ring 700 can be the same metal material, such as copper or stainless steel, and the first metal ring 400 and the second metal ring The material of 700 can also choose different metal materials. For example, the first metal ring 400 can choose copper, and the second metal ring 700 can choose stainless steel. Of course, the materials of the first metal ring 400 and the second metal ring 700 include but are not limited to For these two metals, you can also choose other materials that meet your needs.
继续参考图8,图8示出了芯片封装的具体结构的剖面示意图,在基板100朝向芯片200的一面上还设置了与芯片200引脚相连的至少一个无源器件800,每一无源器件800与至少一个芯片200的引脚相连,无源器件800与基板100电连接,该电连接可以为金丝键合,在具体设置时,无源器件800设置在第一绝缘层500内部,并且位于第一金属环400和芯片200之间,如图8所示,该芯片200的个数为两个,两个无源器件800设置在相邻的两个芯片200的外侧,并且位于第一金属环400和芯片200之间。当然图8中两个芯片200以及无源器件800的形式只是仅仅作为一个示例。在具体设置芯片200和无源器件800时,无源器件800具有n个,n为整数,芯片200具有m个,m为整数,且m≥1,m≥n。一个无源器件800可以仅与一个芯片200的引脚相连,一个无源器件800也可以同时与多个芯片200的引脚相连,无源器件800的具体数目及与芯片200的对应关系可以根据芯片200及芯片封装的尺寸进行确定。继续参考图8,第一绝缘层500完全包裹芯片200和无源器件800,第一金属环400位于两个芯片200的四周,一并参考图9,图9示出了第二金属环700在基板100上的位置,第二金属环700位于相邻的两个芯片200的四周,当然与第一金属环400一样,第二金属环700包括但并不局限于芯片200的四周和芯片200之间的位置,如第二金属环700可以根据芯片封装的翘曲变形情况具体设置,在封装结构的翘曲变形较 大的位置较多地布置第二金属环700,而在封装结构的翘曲变形较小的位置布置少量的第二金属环700,甚至是不设置第二金属环700,并且第一金属环400和第二金属环700也可以并不相对设置,可以在某一区域内设置第一金属环400,在另一区域内设置第二金属环700,第一金属环400和第二金属环700相对设置时二者的面积大小也可以根据芯片封装的实际情况确定。Continuing to refer to FIG. 8, FIG. 8 shows a schematic cross-sectional view of the specific structure of the chip package. At least one passive device 800 connected to the pin of the chip 200 is also provided on the side of the substrate 100 facing the chip 200, and each passive device 800 is connected to the pins of at least one chip 200, the passive device 800 is electrically connected to the substrate 100, and the electrical connection may be gold wire bonding. In the specific configuration, the passive device 800 is disposed inside the first insulating layer 500, and Located between the first metal ring 400 and the chip 200, as shown in FIG. 8, the number of the chip 200 is two, and the two passive devices 800 are arranged on the outside of the two adjacent chips 200, and are located in the first Between the metal ring 400 and the chip 200. Of course, the form of the two chips 200 and the passive device 800 in FIG. 8 is only an example. When specifically setting the chip 200 and the passive device 800, the passive device 800 has n, n is an integer, and the chip 200 has m, m is an integer, and m≥1, m≥n. A passive device 800 can only be connected to the pins of one chip 200, and a passive device 800 can also be connected to the pins of multiple chips 200 at the same time. The specific number of passive devices 800 and the corresponding relationship with the chip 200 can be based on The size of the chip 200 and the chip package are determined. Continuing to refer to FIG. 8, the first insulating layer 500 completely wraps the chip 200 and the passive device 800, and the first metal ring 400 is located around the two chips 200. Refer to FIG. 9 together. FIG. 9 shows the second metal ring 700 in The position on the substrate 100, the second metal ring 700 is located around two adjacent chips 200, of course, the same as the first metal ring 400, the second metal ring 700 includes but is not limited to the chip 200 and the chip 200 For example, the second metal ring 700 can be specifically set according to the warpage deformation of the chip package. More second metal rings 700 are arranged at the positions where the warpage deformation of the packaging structure is larger, and the A small amount of the second metal ring 700 is arranged at a position with less deformation, even if the second metal ring 700 is not provided, and the first metal ring 400 and the second metal ring 700 may not be arranged oppositely, and may be arranged in a certain area The first metal ring 400 is provided with a second metal ring 700 in another area. When the first metal ring 400 and the second metal ring 700 are arranged oppositely, the area size of the two can also be determined according to the actual situation of chip packaging.
继续参考图3以及图8,图3以及图8示出了焊球300的一种封装形式,基板100背离芯片200的表面设置有焊球300,焊球300通过第二绝缘层600封装。在焊球300设置时,焊球300包括但不限于焊锡球。焊球300固定在基板100背离芯片200的一面上,并且在基板100背离芯片200的一面设置第二绝缘层600,第二绝缘层600围绕焊球300,焊球300朝向基板100的一部分被第二绝缘层600包裹,焊球300的另一部分露出第二绝缘层600背离基板100的一面,以用于该基板100与其他基板或是印刷电路板的连接,其中,焊球300露出第二绝缘层600背离基板100的一面的具体高度根据芯片封装的实际情况确定。在具体设置第二绝缘层600时,第二绝缘层600的热膨胀系数大于基板100的热膨胀系数,以使得在温循过程中能够降低基板100和印刷电路板间的热失配,进而基板100和印刷电路板间的热量分布较为均匀,从而提高基板100和印刷电路板的使用寿命,并且第二绝缘层600的存在还能够缓冲焊球300应力,增强焊球300在温循过程中的抗疲劳特性,从而芯片200的板级可靠性。在具体选择第二绝缘层600的材料时,只需限定第二绝缘层600的热膨胀系数大于基板100的热膨胀系数即可,第二绝缘层600可以为塑封料,树脂,还可以为热膨胀系数大于基板100的其他绝缘材料,而第二绝缘层600具体材料的选择根据芯片封装的实际情况进行选择。Continuing to refer to FIGS. 3 and 8, FIGS. 3 and 8 show a packaging form of the solder ball 300. The surface of the substrate 100 away from the chip 200 is provided with the solder ball 300, and the solder ball 300 is packaged by the second insulating layer 600. When the solder balls 300 are arranged, the solder balls 300 include but are not limited to solder balls. The solder ball 300 is fixed on the side of the substrate 100 facing away from the chip 200, and a second insulating layer 600 is provided on the side of the substrate 100 facing away from the chip 200. The second insulating layer 600 surrounds the solder balls 300. Wrapped by two insulating layers 600, the other part of the solder balls 300 exposes the side of the second insulating layer 600 away from the substrate 100 for connection between the substrate 100 and other substrates or printed circuit boards. The solder balls 300 expose the second insulation The specific height of the side of the layer 600 facing away from the substrate 100 is determined according to the actual situation of the chip package. When the second insulating layer 600 is specifically provided, the thermal expansion coefficient of the second insulating layer 600 is greater than the thermal expansion coefficient of the substrate 100, so that the thermal mismatch between the substrate 100 and the printed circuit board can be reduced during the temperature cycling process, and the substrate 100 and the printed circuit board The heat distribution between the printed circuit boards is relatively uniform, thereby improving the service life of the substrate 100 and the printed circuit board, and the existence of the second insulating layer 600 can also buffer the stress of the solder balls 300 and enhance the fatigue resistance of the solder balls 300 during the temperature cycling process Characteristics, and thus the board-level reliability of the chip 200. When specifically selecting the material of the second insulating layer 600, it is only necessary to limit the thermal expansion coefficient of the second insulating layer 600 to be greater than the thermal expansion coefficient of the substrate 100. The second insulating layer 600 can be a molding compound, a resin, or a thermal expansion coefficient greater than Other insulating materials of the substrate 100, and the specific material of the second insulating layer 600 are selected according to the actual situation of the chip package.
如图3以及图8所示,图3以及图8示出了芯片封装的一种焊球形式,芯片封装采用的焊球为常见的圆球形焊球,焊球直径尺寸范围为0.2mm-1mm,焊球直径为0.2mm、0.4mm、0.6mm、0.8mm、1mm。当然焊球的形状包括但不局限于圆球形焊球,一并参考图10,图10示出了芯片封装的另一种焊球形式,焊球300可以为与基板100直接相接触的异形焊球,如图10所示,在设置焊球300时,异形的焊球300包括第一焊球310和第二焊球320,第一焊球310的横截面为弧形面,第一焊球310背离基板100的一面作为焊接面用于连接第二焊球320,第二焊球320的横截面为另一弧形面,第二焊球320具有与第一焊球310的焊接面相匹配的端面,第二焊球320嵌设在第一焊球310的焊接面上,在封装焊球300时,第一焊球310设置在第二绝缘层600内,第二绝缘层600的高度在沿垂直于基板100的方向等于第一焊球310的高度,使得第一焊球310背离基板100的端面与第二绝缘层600平齐,使得第一焊球310的焊接面露出第二绝缘层60,以便于第二焊球320在第一焊球310上的固定连接,通过这种两层焊球的布置方式能够封装异形焊球,并且上述焊球封装过程较为简单,易于实现。As shown in Figure 3 and Figure 8, Figure 3 and Figure 8 show a form of solder ball for chip packaging. The solder balls used for chip packaging are common spherical solder balls, and the diameter of the solder balls ranges from 0.2mm-1mm. , The diameter of the solder ball is 0.2mm, 0.4mm, 0.6mm, 0.8mm, 1mm. Of course, the shape of the solder balls includes but is not limited to spherical solder balls. Refer to FIG. 10 together. FIG. 10 shows another solder ball form of the chip package. The solder ball 300 may be a special-shaped solder that directly contacts the substrate 100. The ball, as shown in FIG. 10, when the solder ball 300 is set, the special-shaped solder ball 300 includes a first solder ball 310 and a second solder ball 320. The cross section of the first solder ball 310 is a curved surface, and the first solder ball The side of 310 away from the substrate 100 is used as a soldering surface for connecting the second solder ball 320. The cross section of the second solder ball 320 is another arc-shaped surface. The second solder ball 320 has a matching surface with the soldering surface of the first solder ball 310. On the end surface, the second solder ball 320 is embedded on the soldering surface of the first solder ball 310. When the solder ball 300 is packaged, the first solder ball 310 is disposed in the second insulating layer 600, and the height of the second insulating layer 600 is along the The direction perpendicular to the substrate 100 is equal to the height of the first solder ball 310, so that the end surface of the first solder ball 310 away from the substrate 100 is flush with the second insulating layer 600, so that the welding surface of the first solder ball 310 exposes the second insulating layer 60 In order to facilitate the fixed connection of the second solder ball 320 on the first solder ball 310, the special-shaped solder ball can be packaged through this two-layer solder ball arrangement, and the solder ball packaging process described above is relatively simple and easy to implement.
一并参考图11,图11示出了芯片封装的又一种焊球形式,焊球300也可以通过连接件固定在基板100上,如图11所示,在设置焊球330时,焊球330和基板100之间通过金属块900相连接,基板100背离芯片200的侧面上设有金属块900,金属块900背离基板100的一面作为焊接面用于连接焊球330,焊球330的横截面为弧形面,焊球330具有与金属块900的焊接面相匹配的端面,焊球330嵌设在金属块900的焊接面上,在焊球330与基板100之间的距离较大时选择尺寸较大的金属块900, 在焊球330与基板100之间的距离较小时选择尺寸较小的金属块900,在封装焊球330时金属块900设置在第二绝缘层600内,第二绝缘层600的高度在沿垂直于基板100的方向等于金属块900的高度,使得金属块900背离基板100的端面与第二绝缘层600平齐。通过在焊球330和基板100之间设置金属块900能够方便快捷地调整焊球330相对基板100的高度。在具体设置金属块900时,金属块900可以为铜柱。铜柱直径尺寸范围为0.2mm-1mm,铜柱直径为0.2mm、0.4mm、0.6mm、0.8mm、1mm。该金属块900的形状包括但并不局限于圆柱形和长方体,该金属块900的材料包括但并不局限于铜,铜合金,镍,不锈钢,金属块900的形状及材料根据焊球330以及芯片封装的实际情况确定。Also refer to FIG. 11, which shows another solder ball form of the chip package. The solder ball 300 can also be fixed on the substrate 100 through a connector. As shown in FIG. 11, when the solder ball 330 is set, the solder ball 330 and the substrate 100 are connected by a metal block 900. The side of the substrate 100 away from the chip 200 is provided with a metal block 900. The side of the metal block 900 away from the substrate 100 is used as a soldering surface for connecting the solder balls 330. The cross-section is an arc surface, the solder ball 330 has an end surface that matches the welding surface of the metal block 900, and the solder ball 330 is embedded on the welding surface of the metal block 900. It is selected when the distance between the solder ball 330 and the substrate 100 is large The metal block 900 with a larger size is selected when the distance between the solder ball 330 and the substrate 100 is small. When the solder ball 330 is packaged, the metal block 900 is arranged in the second insulating layer 600. The height of the insulating layer 600 is equal to the height of the metal block 900 in a direction perpendicular to the substrate 100 so that the end surface of the metal block 900 away from the substrate 100 is flush with the second insulating layer 600. The height of the solder ball 330 relative to the substrate 100 can be adjusted conveniently and quickly by disposing the metal block 900 between the solder ball 330 and the substrate 100. When the metal block 900 is specifically provided, the metal block 900 may be a copper pillar. The diameter of the copper column ranges from 0.2mm-1mm, and the diameter of the copper column is 0.2mm, 0.4mm, 0.6mm, 0.8mm, 1mm. The shape of the metal block 900 includes but is not limited to a cylinder and a rectangular parallelepiped. The material of the metal block 900 includes but is not limited to copper, copper alloy, nickel, stainless steel. The shape and material of the metal block 900 are based on the solder balls 330 and The actual situation of chip packaging is determined.
如图12所示,第二方面,本申请还提供了一种芯片封装的制备方法,该芯片封装的制备方法的具体流程如下:As shown in FIG. 12, in the second aspect, the present application also provides a method for manufacturing a chip package, and the specific process of the method for manufacturing the chip package is as follows:
步骤710:在基板100上贴装有芯片200、第一金属环400,第一金属环400设置于基板100朝向芯片200的表面,且围绕芯片200,第一金属环400为封闭环或具有至少一个缺口的环。Step 710: Mount the chip 200 and the first metal ring 400 on the substrate 100. The first metal ring 400 is disposed on the surface of the substrate 100 facing the chip 200 and surrounds the chip 200. The first metal ring 400 is a closed ring or has at least A gaped ring.
如图13(a)所示,图13(a)为执行步骤为710形成的结构体,在基板100清洁后在基板100上贴装多个芯片200、第一金属环400以及其他元器件,如与芯片200引脚相连的无源器件800,还可以包括能够实现其他功能的元器件。在具体设置时,第一金属环400关于芯片200的中心对称。而在芯片200的数目为多个时,为了进一步减小基板100的形变,基板100朝向芯片200的表面贴装第三金属环450,该第三金属环450位于多个芯片200中至少两个芯片200之间。As shown in Figure 13(a), Figure 13(a) is a structure formed by performing step 710. After the substrate 100 is cleaned, a plurality of chips 200, a first metal ring 400, and other components are mounted on the substrate 100. For example, the passive device 800 connected to the pins of the chip 200 may also include components capable of implementing other functions. In specific settings, the first metal ring 400 is symmetrical about the center of the chip 200. When the number of chips 200 is multiple, in order to further reduce the deformation of the substrate 100, the substrate 100 is mounted on the surface of the chip 200 with a third metal ring 450, and the third metal ring 450 is located in at least two of the multiple chips 200. Between 200 chips.
在执行步骤710之后为了封装芯片200和第一金属环400还需要进行如下操作:在基板100上形成第一绝缘层500,第一绝缘层500完全覆盖第一金属环400,且包围芯片200。After performing step 710, in order to package the chip 200 and the first metal ring 400, the following operations need to be performed: a first insulating layer 500 is formed on the substrate 100, and the first insulating layer 500 completely covers the first metal ring 400 and surrounds the chip 200.
如图13(b)所示,图13(b)为执行步骤为720形成的结构体,完成芯片200、第一金属环400以及其他元器件的贴装后在基板100上制备第一绝缘层500,第一绝缘层500完全覆盖第一金属环400,围绕芯片200设置并且包裹住芯片200,第一绝缘层500的制备方法包括但不限于压合注塑和转移注塑,热压合,喷涂等方式。As shown in Figure 13(b), Figure 13(b) is the structure formed by performing step 720. After the chip 200, the first metal ring 400 and other components are mounted, the first insulating layer is prepared on the substrate 100 500. The first insulating layer 500 completely covers the first metal ring 400, is arranged around the chip 200 and wraps the chip 200. The preparation method of the first insulating layer 500 includes but not limited to compression injection molding and transfer injection molding, thermal compression bonding, spraying, etc. the way.
执行步骤710能够将芯片200以及第一金属环400封装在基板100上,通过第一金属环400能够抑制基板100在高温下的热变形,而为了进一步降低基板100在封装过程中的热变形,还需要在第一绝缘层500上设置第二金属环700,如图13(c)所示,图13(c)示出了芯片200的另一种封装结构体,在形成第一绝缘层500后,继续在第一绝缘层500背离基板100的一面上贴装第二金属环700。通过两次贴装进一步降低基板100在封装过程中的热变形。Performing step 710 can package the chip 200 and the first metal ring 400 on the substrate 100. The first metal ring 400 can suppress the thermal deformation of the substrate 100 at high temperatures, and in order to further reduce the thermal deformation of the substrate 100 during the packaging process, It is also necessary to provide a second metal ring 700 on the first insulating layer 500, as shown in FIG. 13(c). FIG. 13(c) shows another package structure of the chip 200. The first insulating layer 500 is formed. After that, continue to mount the second metal ring 700 on the side of the first insulating layer 500 away from the substrate 100. The thermal deformation of the substrate 100 during the packaging process is further reduced through two mounting processes.
步骤720:在基板100背离芯片200的一面植入焊球300,然后在基板100背离芯片200的一面形成第二绝缘层600,焊球300设置在基板100背对芯片200的表面且朝向基板100的部分设置于第二绝缘层600中,第二绝缘层600的高度在沿垂直于基板100的方向小于焊球300的高度,第二绝缘层600的热膨胀系数大于基板100的热膨胀系数。Step 720: Implant solder balls 300 on the side of the substrate 100 away from the chip 200, and then form a second insulating layer 600 on the side of the substrate 100 away from the chip 200. The solder balls 300 are disposed on the surface of the substrate 100 facing away from the chip 200 and facing the substrate 100. The part of the second insulating layer 600 is arranged in the second insulating layer 600. The height of the second insulating layer 600 is smaller than the height of the solder balls 300 along the direction perpendicular to the substrate 100. The thermal expansion coefficient of the second insulating layer 600 is greater than that of the substrate 100.
针对不同尺寸、形状、位置要求的焊球,可以通过不同的工艺过程来封装焊球,执行步骤730时,可以有以下三种实现方式:For solder balls of different sizes, shapes, and positions, the solder balls can be packaged through different processes. When step 730 is performed, the following three implementation methods can be used:
方式一,芯片封装采用的焊球为常见的圆球形焊球,通过图13(d)-图13(e)封装,如图13(d)所示,直接在基板100背离芯片200的一面上植入焊球300,此时,焊球300与基板100固定相连;然后,如图13(e)所示,在基板100上制备一层第二绝缘层600,第二绝缘层600围绕焊球300,并且沿垂直于基板100的方向,第二绝缘层600的厚度小于焊球300的高度,使得焊球300露出第二绝缘层600,第二绝缘层600的制备方法包括但不限于压合注塑和转移注塑,热压合,喷涂等方式。通过上述工艺能够封装尺寸、形状及位置要求较低的焊球。Method one, the solder balls used for chip packaging are common spherical solder balls, which are packaged in Figure 13(d)-Figure 13(e), as shown in Figure 13(d), directly on the side of the substrate 100 facing away from the chip 200 The solder balls 300 are implanted. At this time, the solder balls 300 are fixedly connected to the substrate 100; then, as shown in FIG. 13(e), a second insulating layer 600 is prepared on the substrate 100, and the second insulating layer 600 surrounds the solder balls. 300, and along the direction perpendicular to the substrate 100, the thickness of the second insulating layer 600 is less than the height of the solder balls 300, so that the solder balls 300 expose the second insulating layer 600. The preparation methods of the second insulating layer 600 include but are not limited to pressing Injection molding and transfer injection molding, hot pressing, spraying and other methods. Through the above process, solder balls with lower size, shape and location requirements can be packaged.
方式二,芯片封装采用的焊球为异形焊球,通过图14(a)-图14(d)封装,如图14(a)所示,在基板100背离芯片200的一面上植入第一焊球310,此时,第一焊球310为圆球形结构,第一焊球310与基板100固定相连;然后如图14(b)所示,在基板100背离芯片200的一面形成一层第二绝缘层600,第二绝缘层600覆盖第一焊球310,沿垂直于基板100的方向,第二绝缘层600的厚度大于等于第一焊球310的高度,第二绝缘层600的制备方法包括但不限于压合注塑和转移注塑,热压合,喷涂等方式;接着如图14(c)所示,采用减薄工艺减薄第二绝缘层600及第一焊球310以使得沿垂直于基板100的方向,第二绝缘层600的厚度以及第一焊球310的高度小于第一焊球310的原始高度,第一焊球310露出植球面,植球面与第二绝缘层600背离基板100的一面平齐,减薄工艺包括但不限于研磨,化学刻蚀,激光刻蚀等;最后如图14(d)所示,在植球面上植入第二焊球320。通过两层焊球的制备工艺能够较为方便快捷地在基板100上封装异形的焊球300。In the second method, the solder balls used in the chip package are special-shaped solder balls. Through the package shown in Fig. 14(a)-14(d), as shown in Fig. 14(a), the first side of the substrate 100 away from the chip 200 is implanted. Solder balls 310. At this time, the first solder balls 310 have a spherical structure, and the first solder balls 310 are fixedly connected to the substrate 100; then, as shown in FIG. 14(b), a layer of first solder balls is formed on the side of the substrate 100 away from the chip 200. Two insulating layers 600, the second insulating layer 600 covers the first solder balls 310, along the direction perpendicular to the substrate 100, the thickness of the second insulating layer 600 is greater than or equal to the height of the first solder balls 310, the preparation method of the second insulating layer 600 Including but not limited to compression injection molding and transfer injection molding, thermocompression bonding, spraying, etc.; then, as shown in Figure 14 (c), the second insulating layer 600 and the first solder ball 310 are thinned by a thinning process so as to be vertical In the direction of the substrate 100, the thickness of the second insulating layer 600 and the height of the first solder ball 310 are smaller than the original height of the first solder ball 310, the first solder ball 310 exposes the ball-planting surface, and the ball-planting surface and the second insulating layer 600 are away from the substrate One side of 100 is flush, and the thinning process includes but is not limited to grinding, chemical etching, laser etching, etc.; finally, as shown in FIG. 14(d), a second solder ball 320 is implanted on the surface of the ball. Through the two-layer solder ball preparation process, the special-shaped solder ball 300 can be packaged on the substrate 100 more conveniently and quickly.
方式三,芯片封装采用的焊球与基板间接连接,通过图15(a)-图15(d)封装,如图15(a)所示,在基板100背离芯片200的一面上固定设置金属块900,此时,金属块900的尺寸较大,金属块900与基板100的焊盘下方固定相连,该连接工艺包括但不限于电镀,化学镀和放置预成型;然后如图15(b)所示,在基板100背离芯片200的一面形成一层第二绝缘层600,第二绝缘层600覆盖金属块900,沿垂直于基板100的方向,第二绝缘层600的厚度大于等于金属块900的高度,第二绝缘层600的制备方法包括但不限于压合注塑和转移注塑,热压合,喷涂等方式;接着如图15(c)所示,采用减薄工艺减薄第二绝缘层600及金属块900以使得沿垂直于基板100的方向,第二绝缘层600的厚度以及金属块900的高度小于金属块900的原始高度,金属块900露出植球面,植球面与第二绝缘层600背离基板100的一面平齐,减薄工艺包括但不限于研磨,化学刻蚀,激光刻蚀等;最后如图15(d)所示,在植球面上植入第二焊球320。通过在焊球和基板100之间设置金属块900能够方便快捷地调整焊球相对基板100的高度。Method three, the solder balls used in the chip packaging are indirectly connected to the substrate, and through the package shown in Figure 15(a)-15(d), as shown in Figure 15(a), a metal block is fixed on the side of the substrate 100 facing away from the chip 200 900. At this time, the size of the metal block 900 is relatively large, and the metal block 900 is fixedly connected under the pad of the substrate 100. The connection process includes but not limited to electroplating, electroless plating and placing pre-forming; then as shown in Figure 15(b) As shown, a second insulating layer 600 is formed on the side of the substrate 100 away from the chip 200. The second insulating layer 600 covers the metal block 900. Along the direction perpendicular to the substrate 100, the thickness of the second insulating layer 600 is greater than or equal to that of the metal block 900. Height, the preparation methods of the second insulating layer 600 include but are not limited to compression injection molding and transfer injection molding, hot compression bonding, spraying, etc.; then, as shown in FIG. 15(c), a thinning process is used to thin the second insulating layer 600 And the metal block 900 so that in the direction perpendicular to the substrate 100, the thickness of the second insulating layer 600 and the height of the metal block 900 are less than the original height of the metal block 900, and the metal block 900 exposes the ball-planting surface, the ball-planting surface and the second insulating layer 600 The side facing away from the substrate 100 is flush, and the thinning process includes, but is not limited to, grinding, chemical etching, laser etching, etc.; finally, as shown in FIG. 15(d), a second solder ball 320 is implanted on the ball-planting surface. By providing the metal block 900 between the solder ball and the substrate 100, the height of the solder ball relative to the substrate 100 can be adjusted conveniently and quickly.
在上述芯片封装的制备方法中,通过在基板100上贴装第一金属环400,第一金属环400用于抑制基板100在高温下的热变形;而通过在基板100上植有焊球300的一面形成第二绝缘层600,并限定第二绝缘层600的厚度小于焊球300的高度、在材料选择时限定第二绝缘层600的热膨胀系数大于基板100的热膨胀系数,以在封装焊球300的同时使得在温循过程中降低基板100和印刷电路板间的热失配,缓冲焊球300应力,增强焊球300在温循过程中的抗疲劳特性;上述形成过程工序较少、制备较为方便快捷,所形成的芯片封装翘曲变形较小及板级可靠性较高。In the method for manufacturing the chip package described above, the first metal ring 400 is mounted on the substrate 100, and the first metal ring 400 is used to suppress the thermal deformation of the substrate 100 at high temperatures; and the solder balls 300 are planted on the substrate 100. The second insulating layer 600 is formed on one side of the second insulating layer, and the thickness of the second insulating layer 600 is defined to be less than the height of the solder balls 300. When the material is selected, the thermal expansion coefficient of the second insulating layer 600 is defined to be greater than the thermal expansion coefficient of the substrate 100, so as to package the solder balls. 300 at the same time reduces the thermal mismatch between the substrate 100 and the printed circuit board during the temperature cycle, buffers the stress of the solder ball 300, and enhances the fatigue resistance of the solder ball 300 during the temperature cycle; the above-mentioned formation process has fewer steps and preparation It is more convenient and fast, the formed chip package has less warpage and higher board-level reliability.
第三方面,本申请还提供了一种终端设备,包括芯片封装和印制电路板P(C)(B), 芯片封装与P(C)(B)电连接,芯片封装为如任一项技术方案的芯片封装。由于芯片封装结构通过设置第一金属环400使得翘曲变形较小,板级贴装良率较高,并且,通过限定第二绝缘层600的热膨胀系数大于基板100的热膨胀系数,使得芯片封装结构与印制电路板P(C)(B)连接后在温循过程中的板级可靠性较高,因此,具有该芯片封装的终端设备的产品良率较高。In the third aspect, this application also provides a terminal device, including a chip package and a printed circuit board P(C)(B), the chip package is electrically connected to the P(C)(B), and the chip package is either Chip packaging of technical solutions. Since the chip packaging structure is provided with the first metal ring 400, the warpage deformation is small, and the board-level mounting yield is high. Moreover, by limiting the thermal expansion coefficient of the second insulating layer 600 to be greater than the thermal expansion coefficient of the substrate 100, the chip packaging structure After being connected to the printed circuit board P(C)(B), the board-level reliability during the temperature cycle is relatively high. Therefore, the product yield rate of the terminal device with the chip package is relatively high.

Claims (21)

  1. 一种芯片封装,其特征在于,包括基板、芯片以及第一金属环,所述芯片设置在所述基板的表面、且与所述基板电连接,所述第一金属环设置于所述基板朝向所述芯片的表面,且围绕所述芯片,所述第一金属环为封闭环或具有至少一个缺口的环。A chip package, characterized by comprising a substrate, a chip and a first metal ring, the chip is arranged on the surface of the substrate and electrically connected to the substrate, the first metal ring is arranged on the substrate facing the On the surface of the chip and surrounding the chip, the first metal ring is a closed ring or a ring with at least one gap.
  2. 如权利要求1所述的芯片封装,其特征在于,所述第一金属环关于所述芯片的中心对称。The chip package of claim 1, wherein the first metal ring is symmetrical about the center of the chip.
  3. 如权利要求1或2所述的芯片封装,其特征在于,所述芯片封装还包括第一绝缘层,所述第一绝缘层设置于所述基板朝向所述芯片的表面,所述芯片和所述第一金属环设置在所述第一绝缘层内。The chip package of claim 1 or 2, wherein the chip package further comprises a first insulating layer, and the first insulating layer is disposed on the surface of the substrate facing the chip, and the chip and the The first metal ring is arranged in the first insulating layer.
  4. 如权利要求1至3任一项所述的芯片封装,其特征在于,所述芯片封装还包括第二金属环,所述第二金属环设置在所述第一绝缘层背离所述基板的表面,且围绕所述芯片,所述第二金属环为封闭环或具有至少一个缺口的环。The chip package according to any one of claims 1 to 3, wherein the chip package further comprises a second metal ring, and the second metal ring is disposed on a surface of the first insulating layer facing away from the substrate , And surrounding the chip, the second metal ring is a closed ring or a ring with at least one gap.
  5. 如权利要求4所述的芯片封装,其特征在于,所述第二金属环关于所述芯片的中心对称。5. The chip package of claim 4, wherein the second metal ring is symmetrical about the center of the chip.
  6. 如权利要求1-5任一项所述的芯片封装,其特征在于,还包括无源器件,所述无源器件设置于所述基板朝向所述芯片的表面,且与所述芯片引脚相连,所述无源器件与所述基板电连接,所述无源器件设置在所述第一绝缘层内、且位于所述第一金属环和所述芯片之间。The chip package according to any one of claims 1 to 5, further comprising a passive device, the passive device is arranged on the surface of the substrate facing the chip and connected to the chip pins The passive device is electrically connected to the substrate, and the passive device is arranged in the first insulating layer and between the first metal ring and the chip.
  7. 如权利要求1-6任一项所述的芯片封装,其特征在于,所述芯片的数目为多个,所述芯片封装还包括第三金属环,所述第三金属环设置于所述基板朝向所述芯片的表面,且位于多个所述芯片中至少两个所述芯片之间。The chip package according to any one of claims 1-6, wherein the number of the chips is multiple, the chip package further comprises a third metal ring, and the third metal ring is disposed on the substrate It faces the surface of the chip and is located between at least two of the chips.
  8. 如权利要求1-7任一项所述的芯片封装,其特征在于,还包括焊球以及第二绝缘层,所述第二绝缘层设置于所述基板背对所述芯片的表面,所述焊球设置在所述基板背对所述芯片的表面且朝向所述基板的部分设置于所述第二绝缘层中,所述第二绝缘层的高度在沿垂直于所述基板的方向小于所述焊球的高度,所述第二绝缘层的热膨胀系数大于所述基板的热膨胀系数。7. The chip package of any one of claims 1-7, further comprising a solder ball and a second insulating layer, the second insulating layer being disposed on the surface of the substrate facing away from the chip, the The solder balls are arranged on the surface of the substrate facing the chip and are arranged in the second insulating layer. The height of the second insulating layer is smaller than that of the substrate in the direction perpendicular to the substrate. For the height of the solder ball, the thermal expansion coefficient of the second insulating layer is greater than the thermal expansion coefficient of the substrate.
  9. 如权利要求8任一项所述的芯片封装,其特征在于,所述焊球包括与所述基板连接的第一焊球以及嵌设在所述第一焊球背离所述基板的一面上的第二焊球,所述第一焊球设置于所述第二绝缘层中,所述第二绝缘层的高度在沿垂直于所述基板的方向等于所述第一焊球的高度。The chip package according to any one of claims 8, wherein the solder ball comprises a first solder ball connected to the substrate, and a first solder ball embedded on a side of the first solder ball facing away from the substrate. The second solder ball, the first solder ball is arranged in the second insulating layer, and the height of the second insulating layer is equal to the height of the first solder ball in a direction perpendicular to the substrate.
  10. 如权利要求1-9任一项所述的芯片封装,其特征在于,还包括焊球、金属块以及第二绝缘层,所述第二绝缘层设置于所述基板背对所述芯片的表面,所述金属块设置于所述基板背离所述芯片的表面且位于所述第二绝缘层中,所述焊球固定在所述金属块背离所述基板的一面上,所述第二绝缘层的高度在沿垂直于所述基板的方向等于所述金属块的高度。The chip package according to any one of claims 1-9, further comprising a solder ball, a metal block, and a second insulating layer, the second insulating layer being disposed on the surface of the substrate facing away from the chip , The metal block is disposed on the surface of the substrate away from the chip and located in the second insulating layer, the solder ball is fixed on the surface of the metal block away from the substrate, and the second insulating layer The height of is equal to the height of the metal block in the direction perpendicular to the substrate.
  11. 如权利要求8-10任一项所述的芯片封装,其特征在于,所述第二绝缘层的材料为树脂或塑封料。10. The chip package according to any one of claims 8-10, wherein the material of the second insulating layer is resin or molding compound.
  12. 一种终端设备,其特征在于,包括芯片封装和印制电路板P(C)(B),所述芯片封装与所述P(C)(B)电连接,所述芯片封装为如权利要求1-11任一项所述 的芯片封装。A terminal equipment, characterized by comprising a chip package and a printed circuit board P(C)(B), the chip package is electrically connected to the P(C)(B), and the chip package is as claimed The chip package described in any one of 1-11.
  13. 一种芯片封装的制备方法,其特征在于,包括:A method for manufacturing a chip package, characterized in that it comprises:
    在基板的一面上贴装芯片以及第一金属环,所述第一金属环设置于所述基板朝向所述芯片的表面,且围绕所述芯片,所述第一金属环为封闭环或具有至少一个缺口的环。A chip and a first metal ring are mounted on one side of the substrate. The first metal ring is disposed on the surface of the substrate facing the chip and surrounds the chip. The first metal ring is a closed ring or has at least A gaped ring.
  14. 如权利要求13所述的制备方法,其特征在于,所述第一金属环关于所述芯片的中心对称。The manufacturing method according to claim 13, wherein the first metal ring is symmetrical about the center of the chip.
  15. 如权利要求13所述的制备方法,其特征在于,还包括:The preparation method of claim 13, further comprising:
    在基板朝向芯片的表面形成第一绝缘层,所述芯片和所述第一金属环设置在所述第一绝缘层内;Forming a first insulating layer on the surface of the substrate facing the chip, and the chip and the first metal ring are arranged in the first insulating layer;
    在第一绝缘层背离所述基板的一面上贴装第二金属环,所述第二金属环为封闭环或具有至少一个缺口的环,且围绕所述芯片。A second metal ring is attached to the side of the first insulating layer facing away from the substrate. The second metal ring is a closed ring or a ring with at least one gap and surrounds the chip.
  16. 如权利要求15所述的制备方法,其特征在于,所述第二金属环关于所述芯片的中心对称。The manufacturing method of claim 15, wherein the second metal ring is symmetrical about the center of the chip.
  17. 如权利要求15所述的制备方法,其特征在于,还包括:在基板朝向芯片的表面贴装无源器件,所述无源器件设置在所述第一绝缘层内、且位于所述第一金属环和所述芯片之间。The manufacturing method according to claim 15, further comprising: mounting a passive device on the surface of the substrate facing the chip, the passive device being arranged in the first insulating layer and located in the first insulating layer. Between the metal ring and the chip.
  18. 如权利要求15所述的制备方法,其特征在于,在芯片的数目为多个时,还包括:在形成第一绝缘层之前,在所述基板朝向所述芯片的表面贴装第三金属环,所述第三金属环位于多个所述芯片中至少两个所述芯片之间。The manufacturing method according to claim 15, wherein when the number of chips is multiple, it further comprises: before forming the first insulating layer, mounting a third metal ring on the surface of the substrate facing the chip , The third metal ring is located between at least two of the plurality of chips.
  19. 如权利要求13-18任一项所述的制备方法,其特征在于,还包括:The preparation method according to any one of claims 13-18, further comprising:
    在所述基板背离芯片的一面上植入焊球;Implanting solder balls on the side of the substrate facing away from the chip;
    在所述基板背离芯片的一面形成一层第二绝缘层,所述焊球设置在所述基板背对所述芯片的表面且朝向所述基板的部分设置于所述第二绝缘层中,所述第二绝缘层的高度在沿垂直于所述基板的方向小于所述焊球的高度,所述第二绝缘层的热膨胀系数大于所述基板的热膨胀系数。A second insulating layer is formed on the side of the substrate facing away from the chip, and the solder balls are arranged on the surface of the substrate facing away from the chip and are arranged in the second insulating layer. The height of the second insulating layer is smaller than the height of the solder balls in a direction perpendicular to the substrate, and the thermal expansion coefficient of the second insulating layer is greater than the thermal expansion coefficient of the substrate.
  20. 如权利要求19所述的制备方法,其特征在于,在所述焊球包括与所述基板连接的第一焊球以及嵌设在所述第一焊球背离所述基板的一面上的第二焊球时,具体包括:The manufacturing method of claim 19, wherein the solder ball comprises a first solder ball connected to the substrate and a second solder ball embedded on a side of the first solder ball facing away from the substrate. When soldering balls, specifically include:
    在所述基板背离芯片的一面上植入第一焊球;Implanting a first solder ball on the side of the substrate facing away from the chip;
    在所述基板背离芯片的一面形成一层第二绝缘层,沿垂直于所述基板的方向,所述第二绝缘层的高度大于所述第一焊球的高度;Forming a second insulating layer on the side of the substrate away from the chip, and in a direction perpendicular to the substrate, the height of the second insulating layer is greater than the height of the first solder balls;
    采用减薄工艺减薄所述第二绝缘层及第一焊球,所述第一焊球露出植球面,所述植球面与所述第二绝缘层背离所述基板的一面平齐;Using a thinning process to thin the second insulating layer and the first solder ball, the first solder ball exposes the ball-planting surface, and the ball-planting surface is flush with the side of the second insulating layer away from the substrate;
    在所述植球面上植入第二焊球。A second solder ball is implanted on the implanted ball surface.
  21. 如权利要求13-18任一项所述的制备方法,其特征在于,还包括:The preparation method according to any one of claims 13-18, further comprising:
    在所述基板背离芯片的一面上固定设置金属块;A metal block is fixedly arranged on the side of the substrate facing away from the chip;
    在所述基板背离芯片的一面形成一层第二绝缘层,沿垂直于所述基板的方向,所述第二绝缘层的高度大于所述金属块的高度;Forming a second insulating layer on the side of the substrate away from the chip, and in a direction perpendicular to the substrate, the height of the second insulating layer is greater than the height of the metal block;
    采用减薄工艺减薄所述第二绝缘层及金属块,所述金属块露出植球面,所述植球 面与所述第二绝缘层背离所述基板的一面平齐;Using a thinning process to thin the second insulating layer and the metal block, where the metal block exposes the ball-planting surface, and the ball-planting surface is flush with the surface of the second insulating layer facing away from the substrate;
    在所述植球面上植入焊球。A solder ball is implanted on the implanted ball surface.
PCT/CN2019/080703 2019-03-30 2019-03-30 Chip package, terminal device, and preparation method WO2020199064A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN201980090009.7A CN113348551B (en) 2019-03-30 2019-03-30 Chip packaging, terminal equipment and preparation method
PCT/CN2019/080703 WO2020199064A1 (en) 2019-03-30 2019-03-30 Chip package, terminal device, and preparation method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/CN2019/080703 WO2020199064A1 (en) 2019-03-30 2019-03-30 Chip package, terminal device, and preparation method

Publications (1)

Publication Number Publication Date
WO2020199064A1 true WO2020199064A1 (en) 2020-10-08

Family

ID=72664399

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2019/080703 WO2020199064A1 (en) 2019-03-30 2019-03-30 Chip package, terminal device, and preparation method

Country Status (2)

Country Link
CN (1) CN113348551B (en)
WO (1) WO2020199064A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113990815A (en) * 2021-10-28 2022-01-28 西安微电子技术研究所 Silicon-based micro-module plastic package structure and preparation method thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN202633285U (en) * 2012-05-17 2012-12-26 日月光半导体股份有限公司 Lower packaging body structure of package on package
CN103219322A (en) * 2012-01-23 2013-07-24 台湾积体电路制造股份有限公司 Three dimensional integrated circuit having a resistance measurment structure and method of use
CN108376674A (en) * 2018-05-04 2018-08-07 扬州扬杰电子科技股份有限公司 A kind of anti-layered warping structure of VDMOS power devices plastic packaging

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100368025B1 (en) * 2000-09-26 2003-01-15 삼성전자 주식회사 Ciruict board having center-directional package land types and ball grid array package using the circuit board
US20130001740A1 (en) * 2011-06-30 2013-01-03 Stmicroelectronics Pte Ltd. Heat spreader for thermally enhanced flip-chip ball grid array package
US9831195B1 (en) * 2016-10-28 2017-11-28 Advanced Semiconductor Engineering, Inc. Semiconductor package structure and method of manufacturing the same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103219322A (en) * 2012-01-23 2013-07-24 台湾积体电路制造股份有限公司 Three dimensional integrated circuit having a resistance measurment structure and method of use
CN202633285U (en) * 2012-05-17 2012-12-26 日月光半导体股份有限公司 Lower packaging body structure of package on package
CN108376674A (en) * 2018-05-04 2018-08-07 扬州扬杰电子科技股份有限公司 A kind of anti-layered warping structure of VDMOS power devices plastic packaging

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113990815A (en) * 2021-10-28 2022-01-28 西安微电子技术研究所 Silicon-based micro-module plastic package structure and preparation method thereof

Also Published As

Publication number Publication date
CN113348551A (en) 2021-09-03
CN113348551B (en) 2023-12-29

Similar Documents

Publication Publication Date Title
US10297582B2 (en) BVA interposer
US11600582B2 (en) Semiconductor device with redistribution layers formed utilizing dummy substrates
US6828661B2 (en) Lead frame and a resin-sealed semiconductor device exhibiting improved resin balance, and a method for manufacturing the same
US5594275A (en) J-leaded semiconductor package having a plurality of stacked ball grid array packages
US20030228774A1 (en) Elastomeric electrical connector
US20070013038A1 (en) Semiconductor package having pre-plated leads and method of manufacturing the same
US6577000B2 (en) Premold type semiconductor package
TWM563659U (en) Chip on film package structure
US6841884B2 (en) Semiconductor device
US11646248B2 (en) Semiconductor device having a lead flank and method of manufacturing a semiconductor device having a lead flank
KR100521279B1 (en) Stack Chip Package
US7709941B2 (en) Resin-sealed semiconductor device and method of manufacturing the same
KR19980079837A (en) Semiconductor devices
US20090039509A1 (en) Semiconductor device and method of manufacturing the same
US6403460B1 (en) Method of making a semiconductor chip assembly
US7045893B1 (en) Semiconductor package and method for manufacturing the same
WO2020199064A1 (en) Chip package, terminal device, and preparation method
US20020003308A1 (en) Semiconductor chip package and method for fabricating the same
KR100843705B1 (en) Semiconductor chip package having metal bump and methods of fabricating the same
US20070210426A1 (en) Gold-bumped interposer for vertically integrated semiconductor system
US6436734B1 (en) Method of making a support circuit for a semiconductor chip assembly
US6551861B1 (en) Method of making a semiconductor chip assembly by joining the chip to a support circuit with an adhesive
KR100496841B1 (en) Elastomeric electrical connector
TWI387067B (en) Substrateless chip package and fabricating method
JP4042539B2 (en) CSP connection method

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 19922998

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 19922998

Country of ref document: EP

Kind code of ref document: A1