WO2020187690A1 - Dispositif de mesure ou d'inspection et procédé pour mesurer ou inspecter une surface - Google Patents

Dispositif de mesure ou d'inspection et procédé pour mesurer ou inspecter une surface Download PDF

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Publication number
WO2020187690A1
WO2020187690A1 PCT/EP2020/056667 EP2020056667W WO2020187690A1 WO 2020187690 A1 WO2020187690 A1 WO 2020187690A1 EP 2020056667 W EP2020056667 W EP 2020056667W WO 2020187690 A1 WO2020187690 A1 WO 2020187690A1
Authority
WO
WIPO (PCT)
Prior art keywords
measuring
component
inspection device
inspected
measured
Prior art date
Application number
PCT/EP2020/056667
Other languages
German (de)
English (en)
Inventor
Hubert Holderer
Marcus OEHL
Florian Schapper
Original Assignee
Carl Zeiss Smt Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss Smt Gmbh filed Critical Carl Zeiss Smt Gmbh
Priority to JP2021556661A priority Critical patent/JP7548931B2/ja
Priority to KR1020217033500A priority patent/KR20210139394A/ko
Publication of WO2020187690A1 publication Critical patent/WO2020187690A1/fr

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants

Definitions

  • the invention relates to a measuring or inspection device, in particular a mask inspection device, comprising: an object to be measured or inspected, an objective for measuring or inspecting a surface of the object, and a purging device for feeding a purging gas flow into a space between the surface of the subject and the lens.
  • a method for inspecting or measuring an object, in particular a mask comprising:
  • Lithographic masks for example for the EUV wavelength range, are generally used with objectives for the UV and for the visible wavelength range. These lenses can have a wide variety of optical Be designed designs (refractive, reflective, catadioptric).
  • a feature e.g. in the form of particles
  • the actual size of the feature is measured (for example a line width or the like).
  • Such lenses can be used, among other things, for the measurement or inspection of surfaces that are not protected.
  • the objects to be inspected or measured here can also consist of metallic materials, e.g. Silicon, copper, aluminum. Some of these materials, such as copper, are very sensitive to certain impurities, such as sulfur.
  • a purging gas flow can be introduced into a space between the object or between the surface of the object and the objective.
  • the flushing gas is usually an inert gas, for example nitrogen, or a
  • the purge gas stream itself contains impurities, for example small amounts of sulfur atoms.
  • the lens itself can also be a source of
  • the object of the invention is to provide a measuring or inspection device, in particular a mask inspection device, and a method for measuring or inspecting an object, in which the deposition of impurities on the surface of the object during the measurement or inspection is avoided as completely as possible becomes.
  • a measuring or inspection device of the type mentioned which has (at least) one component that has a surface that is formed from the same material as the surface of the object to be measured or inspected, and in which the Flushing device is designed to guide the flushing gas flow along the surface of the component before it is introduced into the space.
  • the purge gas flow is guided along at least one component which is made of the same material as the surface of the object to be measured or inspected.
  • the surface of the component is used to collect contaminants that are contained in the purge gas flow and that could otherwise get into the space between the objective and the object and be on the surface of the object, typically on the surface of a mirror, a mask, ... deposit.
  • the purge gas flow is brought into contact with the surface; it is therefore not absolutely necessary that the flushing gas flow is essentially parallel to the surface of the component rather, the flushing gas flow can also impinge on the component essentially perpendicular to the surface.
  • the surface of the component which is formed from the same material as the surface of the object, has the largest possible area.
  • a surface which is made of the same material as the surface of the object to be measured or inspected is used in the sense of this
  • the material on the respective surfaces has the same chemical composition, i.e. that both surfaces are formed from Cu, Si, SiC or Al, for example.
  • the material of the surface of the component is understood to mean that material that is present before the surface absorbs impurities, for example in the form of sulfur.
  • the surface of the component can extend over an entire side of the component, for example over its entire front side or its entire rear side, but it is also possible that the surface only covers a partial area of a respective side of the component.
  • the component is in particular releasably attached to the objective.
  • the component is fastened to the lens, in particular a detachable fastening, for example via a screw connection, a snap connection or the like, has proven to be advantageous in order to be able to replace the component if necessary.
  • This may be necessary, for example, if the surface of the component has absorbed so much impurities that the surface no longer absorbs any further impurities and has thus lost its function of collecting impurities.
  • An exchange of the component can also take place or be necessary when measuring objects or are to be inspected whose surfaces consist of different
  • the component forms a plate-shaped flow guide element which is attached between a last object-side optical element of the objective and the object.
  • Flow guide element can, for example, in the form of a circular or
  • the flow guide element typically has a small thickness of less than approx. 3 mm, typically: approx.
  • the flow guide element can also have a comparatively large diameter of, for example, approximately 60 mm or more.
  • the purge gas flow is typically at the front of the flow directing element, i. on the side of the facing the last object-side optical element
  • annular gap preferably with a gap width of less than 0.2 mm, in particular less than 0.1 mm, is formed between the flow guide element and the last object-side optical element. Since the length of the gap in the radial direction, which in
  • the flow guide element has a
  • the flow guiding element is usually formed from a material that is not transparent to the radiation that is used for measuring or inspecting the object.
  • the opening in the flow guide element thus also serves to
  • the measuring or inspection device additionally comprises a further, in particular ring-shaped component which has at least one inlet opening for feeding the purge gas flow into an annular space which at least partially surrounds the last optical element on the object side.
  • the flushing device generally has a flushing gas reservoir from which the flushing gas is taken and via one or more
  • Feed lines is fed to the lens.
  • the flushing gas flow is fed to the annular space via one or more typically radially extending inlet openings in the annular component. From the annular space, the flushing gas flow can ideally enter the gap over the entire circular outer circumference of the last object-side optical element, so that a substantially homogeneous flushing gas flow is generated in the radial direction in the gap.
  • the flushing gas flow that enters the gap through the opening in the plate-shaped flow guide element has a preferred direction, ie does not flow homogeneously towards the center of the opening, since otherwise it flows in the center of the opening or towards a stagnation point is formed on the surface of the object to be measured or inspected, at which the flow velocity of the purge gas flow is practically zero.
  • the further component is on its the annular space
  • Flow guiding elements can also have other components of the lens, along which the purge gas flow is guided, surfaces that are formed from the same material as the surface to be measured or inspected, in particular if they are detachable on the lens, for example on a housing of the lens , are attached. This is typically the case with the further annular component, on which the plate-shaped
  • Flow guiding element is usually attached or fastened.
  • the flow guide element can in particular be permanently connected to the ring-shaped component. In this case it is typically the other
  • the annular space has at least one other
  • Inlet opening for feeding a portion of the purge gas stream into a
  • Flow guide element and the object to be measured or inspected no more than 2.0 mm For the measurement or inspection of the Surfaces of objects, for example in the form of masks or mirrors, usually require small working distances, since the objectives used for this purpose should have a comparatively large object-side numerical aperture.
  • the last optical element on the object side forms a lens.
  • Lenses with different optical designs have different openings on the object side. It is important that the necessary optically free diameter is not covered by the component.
  • the component and / or the further component has / have a surface in the form of a coating that is formed from the same material as the surface of the object to be measured or inspected.
  • the coating is applied to a respective surface of a base body of the component, which is generally formed from a different material than the surface of the object to be measured or inspected.
  • the coating is applied with the help of
  • a coating is particularly useful in the event that the material of the coating is not suitable for producing the entire component from this material, for example because it does not have suitable mechanical properties has, e.g. if the material is a semiconductor such as silicon.
  • the component and / or the further component is / are formed from the same material as the surface of the object to be measured or inspected.
  • the entire component or - in the case of multi-part components at least one component of the component which has the surface - is formed from the same material as the surface to be measured or inspected, so that the Applying a coating can be dispensed with.
  • the material on the surface of the object is a metallic material, for example copper, since this is
  • the component typically has sufficient mechanical stability for manufacturing the component, for example in the form of a plate-shaped flow guide element.
  • the material of the surface of the object to be measured or inspected is selected from the group comprising:
  • Metals especially copper, semiconductors, especially silicon, silicon carbide or aluminum.
  • the object can be measured or inspected on the uncoated object.
  • the material on the surface of the object can in this case match the material from which the entire object is formed. In the event that the object has several
  • the material on the surface of the object corresponds to the material of the top layer of the object.
  • the material on the surface matches the material of the top layer of the coating.
  • the invention also relates to a method of the type mentioned at the outset, in which the flushing gas stream is guided along a surface of a component, which is made of the same material as the surface of the object to be measured or inspected, before it is introduced into the space.
  • the purge gas flow can be post-cleaned in this way, in that contaminants are collected on the surface of the component that would otherwise be deposited on the surface of the object.
  • the method comprises: releasably attaching the component to the objective before measuring or inspecting the surface of the object.
  • a respective component with a surface made of the same material can be selected from a group of several components that each have different materials on the surface on which the Purge gas flow is passed along.
  • a lens that was used for the measurement or inspection of copper objects is no longer used for the measurement or inspection.
  • the component can also be exchanged if the capacity to absorb or absorb impurities on the surface is exceeded.
  • inspection device with an objective for inspecting an object in the form of a mask, the surface to be inspected of which is arranged in an object plane of the objective, and 2 shows a detailed representation of the lens with a plate-shaped one
  • Flow guiding element which has a surface which is formed from the same material as the surface to be inspected, as well as having a flushing device which guides a flushing gas flow along the surface of the flow guiding element.
  • an inspection device 1 for inspecting an object 2 in the form of a mask is shown schematically.
  • the object 2 more precisely a surface 2a of the object 2 to be inspected, is arranged in an object plane 3 of a catadioptric objective 4.
  • the objective 4 has an optical assembly 5 which is arranged adjacent to the object plane 3.
  • the objective 4 has several mirrors 5a, b and several lenses 6, 7, 8 for imaging the surface 2a to be inspected.
  • Individual lenses 6, 7, 8 and / or mirrors 5a, b of the objective 4 can be symmetrical to the
  • Central axis 13 of the lens 4 can be arranged. It should be noted that the number of lenses and mirrors of the lens 4 does not affect the
  • the number shown is limited. More or fewer lenses and / or mirrors can also be provided.
  • the mirrors 5a, b are usually curved on their front side for beam shaping.
  • the mirrors 5a, b can be dispensed with, i.e. the lens 4 can be refractive
  • the mask inspection device 1 has further refractive and / or transmissive optical elements which are arranged in the beam path in front of the objective 4 and are shown in FIG.
  • the objective 4 shown in FIG. 1 is for operation with broadband UV radiation at less than 400 nm, less than 300 nm or possibly less than 200 nm.
  • Broadband UV radiation is understood to mean that it covers a wavelength range of typically several nanometers, possibly several dozen nanometers.
  • FIG. 2 shows, very schematically, a detail of the objective 4 from FIG. 1 with one of the lenses 8 as the optical element, which forms the last object-side optical element of the objective 4 and is arranged opposite the surface 2a of the object 2.
  • the inspection device 1 also has a
  • Flushing device 15 which is shown very schematically in FIG.
  • the flushing device 15 serves to supply a flushing gas stream 16 into an intermediate space 17 between the objective 4 and the object to be inspected
  • the flushing device 15 has a flushing gas reservoir (not shown) from which a flushing gas, for example in the form of nitrogen, can be taken.
  • a flushing gas for example in the form of nitrogen.
  • Purge gas stream 16 is supplied to objective 4 from purge device 15 via supply lines not shown in the figure.
  • a component in the form of a plate-shaped flow guide element 18 is attached to the objective 4.
  • Flow guiding element 18 is attached to a further, annular component 19, which has a plurality of radially extending inlet openings 20
  • the further component 19 is detachable with the lens 4, more precisely with an im
  • Essentially cylindrical housing 21 of the lens 4 connected, for example via a screw connection or the like.
  • the flow guide element 18 and the annular component 19 can be released together (non-destructively) from the objective 4.
  • the flow guide element 18 serves as a closing element of the objective 4, ie as a separation of the objective 4 from the surroundings.
  • the purge gas flow 16 supplied by the purging device 15 via the inlet opening 20 in the annular component 19 first enters an annular space 22 which forms the last object-side optical element 8 of the objective 4 in a ring shape, but not over the entire height of the last object-side optical element
  • Elements 8 surrounds. Starting from the annular space 22, the purge gas flow 16 enters an annular gap 23 which is formed between the rear side 8b of the last object-side optical element 8 of the objective 4 and a surface 18a of the plate-shaped flow guide element 18, which is the rear side 8b of the last optical element 8 of the lens 4 is facing.
  • annular gap 23 has an essentially constant gap width B of typically less than approximately 0.2 mm.
  • the purge gas flow 16 enters the gap 17 from the gap 23 via a central opening 24 formed on the plate-shaped flow guide element 18.
  • the central opening 24 in the flow guide element 18 has a slightly larger diameter than the optically free diameter of the last object-side optical element 8, so that the UV radiation that is to hit the surface 2a of the object 2 is not shaded by the flow guide element 18 .
  • the annular space 22 typically has a greater height than the annular gap 23, the height of the annular space 22, for example, in the
  • a further inlet opening 26 is formed between the mount 25 and the last object-side optical element 8, via which a portion 16a of the
  • Purge gas stream 16 is branched off and fed to the interior 27 of the lens 4 in order to purge it. It goes without saying, however, that the rinsing of the objective 4 does not necessarily have to take place with the aid of the branched-off purge gas flow 16a shown in FIG. 2, but that other purge gas flows can be used for this purpose if necessary.
  • Flow guide element 18, more precisely between one of the object 2 facing rear side 18b of flow guide element 18, and the surface to be inspected 2a on the front side of object 2 is comparatively small and is usually not more than about 2.0 mm.
  • the distance A corresponds to the width of the intermediate space 17 to which the purge gas stream 16 is fed via the central opening 24 of the flow guide element 18. In the example shown in FIG. 2, the purge gas stream 16 does not occur completely
  • Such a preferred direction can be generated, for example, by the rear side 8a of the last
  • object-side optical element 8 and / or the front of the
  • plate-shaped flow guiding element 18 are appropriately structured. By generating a preferred direction of the flushing gas flow 16, it should be prevented that a stagnation point of the flushing gas flow 16 is formed in the area of the opening 24.
  • the purge gas flow 16 is intended to ensure that the surface 2a of the object 2 remains free from contamination.
  • the purge gas stream 16 itself can contain impurities, for example small amounts of sulfur. These impurities can, for example, in the
  • Feed lines of the flushing device 15 or in the lens 4 are released, e.g. when stray light strikes metallic mounts of the lens 4 which contain small amounts of sulfur.
  • the purging gas stream 16 is introduced into the intermediate space 17 via the opening 24 of the flow guide element 18, the purging gas stream 16 is therefore cleaned up by being at the front of the plate-shaped
  • the surface 18a on the front side of the flow guiding element 18 is formed as a coating which consists of the same material as the surface 2a of the object 2, i.e. the surface 18a of the
  • Flow guide element 18 serves as a collector ("getter") for the Impurities. In this way, the same contaminants are deposited on the surface 18a of the flow guide element 18 as on the
  • the object 2 is a mask which contains copper, and the surface 18a or the coating on the front side of the plate-shaped flow guide element 18 is also formed from copper.
  • the object 2 can be a mirror, for example a copper mirror, or a substrate for a mirror, which is formed from copper, for example.
  • the gap 23 between the last object-side optical element 8 and the plate-shaped flow guide element 18 on the one hand has a comparatively small gap width B and on the other hand the last object-side optical element 8 has a comparatively large radius of e.g. approx. 30 mm or more (roughly corresponding to the length of the gap 23 in the radial direction from the annular space 22 to the central axis 13), the probability is very high that each individual sulfur atom will at some point strike the copper surface 18a of the plate-shaped flow guide element 18 and stick to it. The sulfur is thus captured by the copper material on the surface 18a of the plate-shaped flow guide element 18 before it can reach the copper surface 2a of the object 2.
  • the entire plate-shaped flow guide element 18 - or possibly parts thereof, in particular on its front side - can be formed from the same material as the surface 2a of the object 2.
  • the plate-shaped flow guide element 18 can be designed as a copper plate.
  • the flow guide element 18 has a conical section in the region of the gap 23 which is adapted to the curvature of the lens 8. It goes without saying that in the case of a last optical element which has a flat rear side 8b, the conical section of the flow guide element 18 can be omitted.
  • the plate-shaped flow guide element 18 can be replaced by detaching it from the lens 4 and against another plate-shaped one
  • Flow guide element 18 is replaced, which has not yet absorbed sulfur.
  • the further annular component 19 in particular can be detached from the objective 4.
  • the plate-shaped flow guide element 18 shown in FIG. 2 with the copper surface 18a can also be exchanged for a flow guide element 18 made of a different material if a different type of object 2 or an object 2 with a different material on its surface 2a by means of the Inspection device 1 is to be inspected.
  • the plate-shaped flow guide element 18 can be provided on its front side with a silicon surface 18a or with a coating of silicon in order to remove impurities in the form of atoms or molecules
  • an objective 4 which is used for inspection or
  • Aluminum or from semiconductors, for example from Si, SiC, ... one
  • a plate-shaped flow guide element 18 with a copper surface 18a is therefore typically only attached to the objective 4 when it is certain that the objective 4 is only used for inspection or Measurement of a copper object 2, but not for inspection or
  • Flow guiding element 18 is detachably attached to lens 4.
  • other components of the objective 4 can also be provided with a surface made of a material which corresponds to the material of the surface 2a of the object 2.
  • the annular component 19 to which the plate-shaped flow guide element 18 is attached can have the same material as the surface 2a of the object 2 on its surface 19a facing the annular space 22 and / or on the inside 19b of the inlet opening 26. This is favorable since the annular component 19 is also detachably attached to the objective 4. It goes without saying, however, that components that are permanently connected to the lens 4 can also have surfaces, if necessary, along which the purge gas stream 16 flows and which are used to collect
  • Impurities can be used.
  • the inspection device 1 or the lens 4 does not necessarily have to have the optical design shown in FIG. 1, but that it can be designed in a different way, if necessary.
  • the inspection device 1 can also be used to inspect other objects that are used in the semiconductor industry, for example lenses, mirrors, for example EUV mirrors, or the like.
  • the object 2 can also be measured with the aid of a suitably designed measuring device. With such a measurement, geometric features of the object 2 such as line widths,... Can be determined or measured.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Optical Measuring Cells (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

L'invention concerne un dispositif de mesure ou d'inspection, en particulier un dispositif de masque et d'inspection, comprenant : un objet (2) à mesurer ou à inspecter, un objectif (4) destiné à mesurer ou à inspecter une surface (2a) de l'objet (2), ainsi qu'un dispositif de rinçage (15) destiné à acheminer un flux de gaz de rinçage (16) dans un espace intermédiaire (17) situé entre la surface (2a) de l'objet (2) et l'objectif (4). Le dispositif de mesure (1) comprend un élément (18) qui présente une surface (18a) réalisée dans le même matériau que la surface (2a) de l'objet à mesurer ou à inspecter. Le dispositif de rinçage (15) est conçu de sorte à guider le flux de gaz de rinçage (16) le long de la surface (18a) de l'élément (18) avant de l'introduire dans l'espace intermédiaire (17).
PCT/EP2020/056667 2019-03-21 2020-03-12 Dispositif de mesure ou d'inspection et procédé pour mesurer ou inspecter une surface WO2020187690A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2021556661A JP7548931B2 (ja) 2019-03-21 2020-03-12 測定又は検査装置及び表面を測定又は検査する方法
KR1020217033500A KR20210139394A (ko) 2019-03-21 2020-03-12 측정 또는 검사 디바이스, 및 표면을 측정 또는 검사하는 방법

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102019203880.8 2019-03-21
DE102019203880.8A DE102019203880A1 (de) 2019-03-21 2019-03-21 Mess- oder Inspektionsvorrichtung und Verfahren zum Vermessen oder zum Inspizieren einer Oberfläche

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WO2020187690A1 true WO2020187690A1 (fr) 2020-09-24

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JP (1) JP7548931B2 (fr)
KR (1) KR20210139394A (fr)
DE (1) DE102019203880A1 (fr)
WO (1) WO2020187690A1 (fr)

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Publication number Priority date Publication date Assignee Title
DE102021205985A1 (de) 2021-06-11 2022-12-15 Carl Zeiss Smt Gmbh Optische Anordnung für die EUV-Lithographie und Verfahren zum Regenerieren eines gasbindenden Bauteils

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DE102004008080A1 (de) * 2004-02-19 2005-09-08 Carl Zeiss Smt Ag System zur Reinigung von Spülgasen
DE102017202244A1 (de) * 2017-02-13 2018-01-11 Carl Zeiss Smt Gmbh Optische Baugruppe und optische Anordnung damit

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JP2001118783A (ja) * 1999-10-21 2001-04-27 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
JP2005175324A (ja) 2003-12-12 2005-06-30 Nikon Corp マスク汚染防止方法、マスク汚染防止装置及び露光装置
US7145641B2 (en) * 2003-12-31 2006-12-05 Asml Netherlands, B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
JP2010139593A (ja) 2008-12-10 2010-06-24 Lasertec Corp Ｅｕｖマスク検査装置
DE102018202324B4 (de) * 2018-02-15 2019-03-14 Carl Zeiss Smt Gmbh Optische Anordnung mit einer Gasspüleinrichtung zum Schutz der optischen Anordnung vor Kontaminationen und Verfahren zur Herstellung derselben

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Publication number Priority date Publication date Assignee Title
DE102004008080A1 (de) * 2004-02-19 2005-09-08 Carl Zeiss Smt Ag System zur Reinigung von Spülgasen
DE102017202244A1 (de) * 2017-02-13 2018-01-11 Carl Zeiss Smt Gmbh Optische Baugruppe und optische Anordnung damit

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Title
DISCLOSED ANONYMOUSLY: "Lithography contamination issues", RESEARCH DISCLOSURE, KENNETH MASON PUBLICATIONS, HAMPSHIRE, UK, GB, vol. 508, no. 85, 1 August 2006 (2006-08-01), pages 1087, XP007136548, ISSN: 0374-4353 *

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KR20210139394A (ko) 2021-11-22
DE102019203880A1 (de) 2020-09-24
JP2022526757A (ja) 2022-05-26
JP7548931B2 (ja) 2024-09-10

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