WO2020187093A1 - Circuit substrate, manufacturing method therefor, and micro light-emitting diode display substrate - Google Patents

Circuit substrate, manufacturing method therefor, and micro light-emitting diode display substrate Download PDF

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Publication number
WO2020187093A1
WO2020187093A1 PCT/CN2020/078623 CN2020078623W WO2020187093A1 WO 2020187093 A1 WO2020187093 A1 WO 2020187093A1 CN 2020078623 W CN2020078623 W CN 2020078623W WO 2020187093 A1 WO2020187093 A1 WO 2020187093A1
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Prior art keywords
circuit substrate
transfer area
micro light
base substrate
transfer
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PCT/CN2020/078623
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French (fr)
Chinese (zh)
Inventor
赵承潭
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京东方科技集团股份有限公司
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Publication of WO2020187093A1 publication Critical patent/WO2020187093A1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/15Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components with at least one potential-jump barrier or surface barrier specially adapted for light emission

Definitions

  • the present disclosure relates to the field of display technology, and in particular to a circuit substrate and a manufacturing method thereof, and a micro-light emitting diode display substrate.
  • micro-light-emitting diode During the formation process of the micro-light-emitting diode display substrate, it is necessary to mass transfer the micro-light-emitting diode (Micro LED) to the circuit substrate. At present, the light-emitting uniformity of a large number of Micro LEDs is poor and needs to be improved.
  • circuit substrate including:
  • a base substrate which includes a plurality of transfer regions:
  • a plurality of collimating structures located in the plurality of transfer areas, wherein the collimating structure is used to support the micro light emitting diodes on the transfer area, so that the micro light emitting diodes are in collimation during the transfer process status;
  • a plurality of fixing structures located in the plurality of transfer areas, wherein each fixing structure is configured to fix a corresponding micro light emitting diode in a corresponding transfer area of the fixing structure.
  • the collimating structure includes at least two retaining walls, and the end surfaces of the at least two retaining walls away from the base substrate are located on the same plane.
  • the collimating structure includes multiple retaining walls, and the multiple retaining walls surround a ring structure.
  • the collimating structure includes a retaining wall of a closed ring structure.
  • the end surface of the retaining wall away from the base substrate is parallel to the plane where the base substrate is located.
  • the collimating structure is an elastic structure, and the elastic deformation of the collimating structure when subjected to a force is greater than the plastic deformation.
  • the fixed structure is an elastic structure, and the plastic deformation of the fixed structure when subjected to a force is greater than the elastic deformation.
  • the fixing structure is a light curing glue or a heat curing glue.
  • each fixing structure is located in a space defined by the collimating structure on the transfer area, and the height of the fixing structure before curing from the plane where the base substrate is located is greater than the distance of the collimating structure. The height of the plane where the base substrate is located.
  • the fixing structure of each transfer area is located in the middle of the ring structure formed by a plurality of retaining walls in the transfer area; or the fixing structure of each transfer area is located in the closed area of the transfer area The middle of the retaining wall of the ring structure.
  • the embodiments of the present disclosure provide a micro-light-emitting diode display substrate, including a plurality of micro-light-emitting diodes, and the circuit substrate as described in the first aspect, the plurality of micro-light-emitting diodes and the plurality of The printed areas have a one-to-one correspondence, and each micro-light-emitting diode is attached to the fixing structure on the corresponding transfer area of the circuit substrate.
  • the embodiments of the present disclosure also provide a method for manufacturing a circuit substrate for manufacturing the circuit substrate according to any one of the first aspects, the method including:
  • a collimating structure is formed on each transfer area on the base substrate, and the collimating structure is used to support the micro light emitting diode on the transfer area, so that the micro light emitting diode is in alignment during the transfer process. Straight state.
  • the step of forming a collimation structure on each transfer area on the base substrate includes:
  • a mask is used to expose the polymer film, and the collimation structure is obtained after development.
  • FIG. 1 is a schematic structural diagram of a circuit substrate provided by an embodiment of the disclosure
  • FIG. 2 is a schematic structural diagram of another circuit substrate provided by an embodiment of the disclosure.
  • FIG. 3 is a schematic diagram of an assembly structure of a circuit substrate provided by an embodiment of the disclosure.
  • FIG. 4 is a schematic structural diagram of another circuit substrate provided by an embodiment of the disclosure.
  • FIG. 5 is a schematic structural diagram of another circuit substrate provided by an embodiment of the disclosure.
  • FIG. 6 is a schematic structural diagram of another circuit substrate provided by an embodiment of the disclosure.
  • FIG. 7 is a schematic diagram of another assembly structure of a circuit substrate provided by an embodiment of the disclosure.
  • FIG. 8 is a schematic flowchart of a method for manufacturing a circuit substrate provided by an embodiment of the disclosure.
  • the structure of the micro-light-emitting diode display substrate is a Micro LED array. After the Micro LED structure design is thinned, miniaturized, and arrayed, a large amount is transferred to the circuit substrate, and then a protective layer is generated by physical deposition technology to form a small pitch. Micro LED. While minimizing the size of the display to a great extent, it can also achieve the purpose of individual addressing and individual driving of light for each pixel. Micro LED has the characteristics of not requiring a backlight source and self-luminous. Compared with OLED, Micro LED color is easier and more accurate to debug, and has a simple structure, almost no light consumption, very long service life, high brightness, low power consumption, super Advantages of high resolution and color saturation.
  • Micro LED the micron-level pitch.
  • Each pixel can be controlled by addressing and driven by a single point to emit light.
  • the main technical difficulty of Micro LED is that after the base crystal is finished, the lighted Micro LED crystal film needs to be transported directly to the drive backplane without packaging, that is, mass transfer technology.
  • Micro LEDs During the massive transfer of Micro LEDs, only the illuminated LED crystal epitaxial layer is transferred, and the original substrate is not transferred. The handling thickness is only 3%. At the same time, the size of Micro LEDs is extremely small, requiring more refined operation technology. . During the transfer and curing process of the Micro LED, due to the uneven direction of the transfer operation during the transfer process of the Micro LED, the collimation of the Micro LED is poor, and the uniformity of the Micro LED's luminescence cannot be guaranteed, that is, it can be guaranteed in one circuit. All the Micro LEDs in the substrate have the same luminous intensity and uniform luminous brightness, which affects the display effect of the micro LED display substrate.
  • the present disclosure provides the following embodiments to effectively solve the technical problem of poor collimation during the mass transfer process of Micro LEDs.
  • FIG. 1 is a schematic structural diagram of a circuit substrate provided by an embodiment of the disclosure. As shown in FIGS. 1 and 2, the circuit substrate 100 includes:
  • a base substrate 110 which includes a plurality of transfer regions 111:
  • the circuit substrate 100 mainly includes a base substrate 110, and the base substrate 110 is used to carry Micro LEDs, where the base substrate 110 may be a glass substrate.
  • the base substrate 110 includes a plurality of transfer areas 111. When a large amount of Micro LED is transferred to the base substrate 110, each transfer area 111 is correspondingly provided with a Micro LED.
  • each transfer area 111 is provided with a collimating structure 120, and the collimating structure 120 is in a collimated state, that is, perpendicular to the surface of the base substrate 110.
  • the collimating structure 120 on the transfer area 111 can support the Micro LED 200, so that the Micro LED 200 is in a collimated state, that is, the lower surface of the Micro LED 200 It is parallel to the upper surface of the base substrate 110.
  • the upper and lower surfaces of the collimating structure 120 need to be arranged parallel to the upper surface of the base substrate 110, and the sides of the collimating structure 120 are perpendicular to the base substrate.
  • the upper surface of 110 is arranged so that the collimating structure 120 is in a collimated state.
  • the collimating structure 120 can support the Micro LED 200 to be in a collimated state.
  • Each transfer area 111 on the base substrate 110 forms a collimation structure 120, thereby ensuring the collimation of the Micro LED 200 arranged on the multiple transfer areas 111, which can ensure the mass transfer of the Micro LED 200 The overall collimation and uniformity.
  • a plurality of transfer areas for fixing Micro LEDs are formed on the base substrate, and a collimation structure is formed in each transfer area.
  • the collimation structure of each transfer area can make the Micro LED on the transfer area in a collimated state, thereby ensuring that the multiple Micro LEDs on the circuit substrate have better collimation and optimization
  • the uniformity of light emission of multiple Micro LEDs and the overall display effect of the micro LED display substrate are improved.
  • the collimating structure 120 includes at least two retaining walls, and the end surfaces of the at least two retaining walls away from the base substrate are located on the same plane. As shown in FIG. 4, the two retaining walls in each transfer area 111 are parallel. As shown in FIG. 6, two retaining walls in each transfer area 111 cross.
  • the collimating structure 120 includes at least two retaining walls 121, and the top ends of the at least two retaining walls 121 are at the same height.
  • the top ends of at least two retaining walls 121 form two supporting points, and the two supporting points are located in a horizontal plane, the horizontal plane is parallel to the upper surface of the base substrate 110, and is used to support the transfer Micro LED 200.
  • the Micro LED 200 is arranged on the top of the at least two retaining walls 121, and the at least two retaining walls 121 support the Micro LED 200 in a collimated state.
  • the collimating structure may include a retaining wall with a closed ring structure.
  • the collimating structure is a retaining wall with a closed ring structure, and the tops of the retaining walls forming the closed ring structure have the same height. In this way, the supporting surface formed by the top of the closed ring structure is more stable, and the supported MicroLED A collimation of 200 is even better.
  • the collimating structure 120 may also be a fully enclosed or semi-closed ring structure enclosed by a plurality of retaining walls 121 with the same height.
  • the collimating structure 120 is located parallel to the base substrate 110.
  • the cross-section on the horizontal plane of may be round, square, cross or other shapes, which is not limited in the present disclosure.
  • the collimating structure 120 may be an elastic structure, and the elastic deformation of the collimating structure 120 when subjected to a force is greater than the plastic deformation.
  • the collimating structure 120 selects an elastic structure, and when the collimating structure 120 is subjected to a force, its elastic deformation is greater than the plastic deformation, that is, its recoverable deformation is greater than the unrecoverable deformation, which can ensure the collimating structure After 120 is stressed, it basically returns to its original state, and when there are some special circumstances, such as poor assembly alignment of the collimating structure 120 or uneven bottom surface of the Micro LED 200, the alignment structure 120 can be plastically adjusted to ensure the overall The collimation of the structure.
  • the Micro LED 200 is transferred and pressed onto the collimation structure 120 of the transfer area 111, and the collimation structure 120 is deformed under the force to buffer the pressing force during the transfer process and avoid the micro LED 200 is damaged.
  • the collimation structure 120 basically restores the original collimation state, supporting the Micro LED 200 in the collimation state.
  • the material for forming the collimating structure 120 may include acrylic and polymer Ploymer materials.
  • the collimating structure 120 is subjected to an external pressing force, 80% to 90% of the Elastic deformation, and 10% to 20% elastic deformation, stable structure, better collimation support effect.
  • the circuit substrate 100 may further include:
  • the fixing structure 130 is arranged on the transfer area 111, and the fixing structure 130 is used to fix the Micro LED 200 in the collimated state on the transfer area 111.
  • a fixing structure 130 is added to the transfer area 111 of the circuit substrate 100. As shown in FIG. 7, after the micro LED 200 is supported by the collimating structure 120 in a collimated state, the fixing structure 130 can be aligned The Micro LED 200 is fixed on the transfer area 111 to increase the stability of the Micro LED 200.
  • the fixing structure 130 is an elastic structure, and the plastic deformation of the fixing structure 130 when subjected to a force is greater than the elastic deformation.
  • the fixing structure 130 is selected as an elastic structure. In this way, in addition to the fixing function, the fixing structure 130 can also provide a certain buffering effect to buffer the force of the Micro LED 200 transferred to the transfer area 111 and protect the Micro LED 200 from damage .
  • the plastic deformation of the fixed structure 130 when subjected to a force is greater than the elastic deformation, and the fixed structure 130 will deform and fix with the fixed state of the Micro LED 200, and the recovery force is small, and the fixed Micro LED 200 is in a collimated state in conjunction with the fixed Micro LED 200.
  • the thickness of the fixing structure is greater than the thickness of the collimating structure, so that the Micro LED device is closely adhered to the base substrate.
  • the fixing structure 130 is a light-curing glue or a heat-curing glue.
  • the height of the photocurable glue before curing from the plane where the base substrate is located is greater than the distance between the collimating structure and the plane where the base substrate is located. height.
  • the height of the cured photo-curing adhesive can be basically the same as the height of the collimating structure, so that the compacted photo-curing adhesive can fully contact the Micro LED 200 , Making the Micro LED 200 fit closely to the transfer area.
  • Light curing adhesives including visible light curing adhesives and ultraviolet (UV) curing adhesives, are one-component and solvent-free.
  • the curing adhesive can be fixed after receiving visible light or ultraviolet radiation.
  • Thermal curing adhesive is a curing adhesive that can be fixed after being heated.
  • the fixing structure 130 can undergo 60%-80% plastic deformation with external force, and can be fixed after receiving ultraviolet radiation.
  • the fixing structure of each transfer area is located in the middle of the ring structure formed by a plurality of retaining walls in the transfer area; or the fixing structure of each transfer area is located in the transfer area.
  • the fixing structure 130 in each transfer area is located in the middle of the area enclosed by the retaining wall 120. In this way, the supporting force received by the Micro LED 200 is uniform, so that a large number of Micro LEDs emit uniform light.
  • the source substrate with the Micro LED 200 is in contact with the base substrate 110 under a specific pressure and pressed.
  • the fixed structure 130 mainly undergoes plastic deformation to fully contact the Micro LED 200
  • the collimating structure 120 mainly undergoes elastic deformation to maintain the alignment of the Micro LED 200.
  • the pressure on the upper substrate is released, and the fixing glue is cured under UV or heating high temperature, which is to complete the process of transferring and fixing the Micro LED 200 to the circuit substrate 100.
  • FIG. 3 provides a micro-light-emitting diode display substrate according to an embodiment of the present disclosure, including a plurality of Micro LED 200 and a circuit substrate, and the plurality of micro-light-emitting diodes correspond to the plurality of transfer regions in a one-to-one correspondence.
  • the circuit substrate may be the circuit substrate 100 provided by any one of the embodiments shown in FIGS. 1 and 2 and FIGS. 4 to 6, and each transfer area 111 of the circuit substrate 100 is fixedly attached with a Micro LED 200.
  • a plurality of transfer areas for fixing the Micro LED are formed on the base substrate of the circuit substrate, and a collimating structure is formed in each transfer area, so that When a huge amount of Micro LED is transferred to the circuit substrate, the collimation structure of each transfer area can make the Micro LED on the transfer area in a collimated state, thereby ensuring the alignment of the multiple Micro LEDs on the circuit substrate It optimizes the luminous uniformity of multiple Micro LEDs and the overall display effect of the micro LED display substrate.
  • the specific implementation process of the micro-light-emitting diode display substrate provided by the embodiments of the present disclosure please refer to the above-mentioned FIGS. 1 and 2, and the specific implementation process of the circuit substrate provided by any of the embodiments shown in FIGS. 4 to 6, which will not be described here. Let me repeat them one by one.
  • FIG. 8 is a schematic flowchart of a manufacturing method of a circuit substrate according to an embodiment of the disclosure.
  • the manufacturing method of the circuit substrate is used for manufacturing the circuit substrate as mentioned in the above-mentioned FIGS. 1 to 7. As shown in Figure 8, the method includes:
  • Step 801 A collimating structure is formed on each transfer area on the base substrate, and the collimating structure is used to support the micro light emitting diode on the transfer area, so that the micro light emitting diode is in the transfer process. In the collimated state.
  • step 801 the step of forming a collimation structure on each transfer area on the base substrate may include:
  • a mask is used to expose the polymer film, and the collimation structure is obtained after development.
  • relevant preparation operations are first applied on the base substrate, such as forming a buffer layer, a waterproof layer, and wiring. Then, a spin coating process is used to spin-coat the polymer solution on the base substrate and dry, remove the solvent, and perform a polymerization reaction to form a polymer film.
  • the polymerization reaction used can be curing at 230 degrees Celsius for 30 minutes .
  • a mask is used to expose the polymer film to form a predetermined pattern, and then a development process is used to retain the exposed area and etch away the non-exposed area to form a collimating structure.
  • the manufacturing method of the circuit substrate provided by the embodiment of the present disclosure is to form a plurality of transfer areas for fixing the Micro LED on the base substrate of the circuit substrate, and to form a collimation structure in each transfer area.
  • the collimation structure of each transfer area can make the Micro LED on the transfer area in a collimated state, thereby ensuring the alignment of the multiple Micro LEDs on the circuit substrate It optimizes the luminous uniformity of multiple Micro LEDs and the overall display effect of the micro LED display substrate.
  • the specific implementation process of the manufacturing method of the circuit substrate provided by the embodiments of the present disclosure please refer to the above-mentioned FIGS. 1 and 2, and the specific implementation process of the circuit substrate provided by any of the embodiments shown in FIGS. 4 to 6, which will not be described here. Let me repeat them one by one.

Abstract

Provided are a circuit substrate, a manufacturing method therefor, and a micro light-emitting diode display substrate. The circuit substrate comprises: a substrate, wherein the substrate comprises a plurality of transfer printing areas: a plurality of collimation structures located in the plurality of transfer printing areas, wherein the collimation structure is used for supporting micro light-emitting diodes on the transfer printing areas, so that the micro light-emitting diodes are in a collimated state during transfer printing; and a plurality of fixing structures located in the plurality of transfer printing areas, wherein each fixing structure is used for fixing the corresponding micro light-emitting diode in the transfer printing area corresponding to the fixing structure.

Description

电路基板及其制作方法和微发光二极管显示基板Circuit substrate and manufacturing method thereof and micro-light emitting diode display substrate
相关申请的交叉引用Cross references to related applications
本申请主张在2019年3月20日在中国提交的中国专利申请No.201910212495.7的优先权,其全部内容通过引用包含于此。This application claims the priority of Chinese Patent Application No. 201910212495.7 filed in China on March 20, 2019, the entire content of which is incorporated herein by reference.
技术领域Technical field
本公开涉及显示技术领域,尤其涉及一种电路基板及其制作方法和微发光二极管显示基板。The present disclosure relates to the field of display technology, and in particular to a circuit substrate and a manufacturing method thereof, and a micro-light emitting diode display substrate.
背景技术Background technique
微发光二极管显示基板在形成过程中,需要将微发光二极管(Micro LED)巨量转移(Mass Transfer)到电路基板上。目前,大量Micro LED的发光均一性差,有待提高。During the formation process of the micro-light-emitting diode display substrate, it is necessary to mass transfer the micro-light-emitting diode (Micro LED) to the circuit substrate. At present, the light-emitting uniformity of a large number of Micro LEDs is poor and needs to be improved.
发明内容Summary of the invention
第一方面,本公开实施例提供了一种电路基板,所述电路基板包括:In a first aspect, embodiments of the present disclosure provide a circuit substrate, the circuit substrate including:
衬底基板,所述衬底基板上包括多个转印区域:A base substrate, which includes a plurality of transfer regions:
位于所述多个转印区域的多个准直结构,其中,所述准直结构用于支撑所述转印区域上的微发光二极管,使得所述微发光二极管在转印过程中处于准直状态;A plurality of collimating structures located in the plurality of transfer areas, wherein the collimating structure is used to support the micro light emitting diodes on the transfer area, so that the micro light emitting diodes are in collimation during the transfer process status;
位于所述多个转印区域的多个固定结构,其中,每个固定结构被配置为固定相应的微发光二极管在所述固定结构对应的转印区域。A plurality of fixing structures located in the plurality of transfer areas, wherein each fixing structure is configured to fix a corresponding micro light emitting diode in a corresponding transfer area of the fixing structure.
可选地,所述准直结构包括至少两个挡墙,所述至少两个挡墙远离所述衬底基板的端面位于同一平面。Optionally, the collimating structure includes at least two retaining walls, and the end surfaces of the at least two retaining walls away from the base substrate are located on the same plane.
可选地,所述准直结构包括多个挡墙,所述多个挡墙围组成环状结构。Optionally, the collimating structure includes multiple retaining walls, and the multiple retaining walls surround a ring structure.
可选地,所述准直结构包括封闭环状结构的挡墙。Optionally, the collimating structure includes a retaining wall of a closed ring structure.
可选地,在每个转印区域中,所述挡墙远离所述衬底基板的端面与所述衬底基板所在的平面平行。Optionally, in each transfer area, the end surface of the retaining wall away from the base substrate is parallel to the plane where the base substrate is located.
可选地,所述准直结构为弹性结构,所述准直结构在受力时的弹性形变大于塑性形变。Optionally, the collimating structure is an elastic structure, and the elastic deformation of the collimating structure when subjected to a force is greater than the plastic deformation.
可选地,所述固定结构为弹性结构,所述固定结构在受力时的塑性形变大于弹性形变。Optionally, the fixed structure is an elastic structure, and the plastic deformation of the fixed structure when subjected to a force is greater than the elastic deformation.
可选地,所述固定结构为光固化胶或者热固化胶。Optionally, the fixing structure is a light curing glue or a heat curing glue.
可选地,每个固定结构位于所述准直结构在所述转印区域上限定的空间中,固化前的固定结构距离所述衬底基板所在的平面的高度大于所述准直结构距离所述衬底基板所在的平面的高度。Optionally, each fixing structure is located in a space defined by the collimating structure on the transfer area, and the height of the fixing structure before curing from the plane where the base substrate is located is greater than the distance of the collimating structure. The height of the plane where the base substrate is located.
可选地,每个转印区域的固定结构位于所述转印区域中的多个挡墙围组成环状结构的中间;或者每个转印区域的固定结构位于所述转印区域中的封闭环状结构的挡墙的中间。Optionally, the fixing structure of each transfer area is located in the middle of the ring structure formed by a plurality of retaining walls in the transfer area; or the fixing structure of each transfer area is located in the closed area of the transfer area The middle of the retaining wall of the ring structure.
第二方面,本公开实施例提供了一种微发光二极管显示基板,包括多个微发光二极管,以及如第一方面中所述的电路基板,所述多个微发光二极管与所述多个转印区域一一对应,每个微发光二极管被贴合于所述电路基板的对应转印区域上的固定结构。In a second aspect, the embodiments of the present disclosure provide a micro-light-emitting diode display substrate, including a plurality of micro-light-emitting diodes, and the circuit substrate as described in the first aspect, the plurality of micro-light-emitting diodes and the plurality of The printed areas have a one-to-one correspondence, and each micro-light-emitting diode is attached to the fixing structure on the corresponding transfer area of the circuit substrate.
第三方面,本公开实施例还提供了一种电路基板的制作方法,用于制作如第一方面中任一项所述的电路基板,所述方法包括:In a third aspect, the embodiments of the present disclosure also provide a method for manufacturing a circuit substrate for manufacturing the circuit substrate according to any one of the first aspects, the method including:
在衬底基板上的每个转印区域上均形成准直结构,所述准直结构用于支撑所述转印区域上的微发光二极管,使得所述微发光二极管在转印过程中处于准直状态。A collimating structure is formed on each transfer area on the base substrate, and the collimating structure is used to support the micro light emitting diode on the transfer area, so that the micro light emitting diode is in alignment during the transfer process. Straight state.
可选地,所述在衬底基板上的每个转印区域上均形成准直结构的步骤,包括:Optionally, the step of forming a collimation structure on each transfer area on the base substrate includes:
在所述衬底基板上旋涂聚合物溶液并烘干,形成聚合物薄膜;Spin-coating a polymer solution on the base substrate and drying to form a polymer film;
采用掩膜板对所述聚合物薄膜进行曝光,显影后得到所述准直结构。A mask is used to expose the polymer film, and the collimation structure is obtained after development.
附图说明Description of the drawings
为了更清楚地说明本公开实施例的技术方案,下面将对本公开实施例描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本公开的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳 动性的前提下,还可以根据这些附图获得其他的附图。In order to explain the technical solutions of the embodiments of the present disclosure more clearly, the following will briefly introduce the accompanying drawings used in the description of the embodiments of the present disclosure. Obviously, the drawings in the following description are only some embodiments of the present disclosure. For those of ordinary skill in the art, other drawings can be obtained based on these drawings without creative labor.
图1为本公开实施例提供的一种电路基板的结构示意图;FIG. 1 is a schematic structural diagram of a circuit substrate provided by an embodiment of the disclosure;
图2为本公开实施例提供的另一种电路基板的结构示意图;2 is a schematic structural diagram of another circuit substrate provided by an embodiment of the disclosure;
图3为本公开实施例提供的电路基板的一种装配结构示意图;3 is a schematic diagram of an assembly structure of a circuit substrate provided by an embodiment of the disclosure;
图4为本公开实施例提供的另一种电路基板的结构示意图;4 is a schematic structural diagram of another circuit substrate provided by an embodiment of the disclosure;
图5为本公开实施例提供的另一种电路基板的结构示意图;5 is a schematic structural diagram of another circuit substrate provided by an embodiment of the disclosure;
图6为本公开实施例提供的另一种电路基板的结构示意图;6 is a schematic structural diagram of another circuit substrate provided by an embodiment of the disclosure;
图7为本公开实施例提供的电路基板的另一种装配结构示意图;7 is a schematic diagram of another assembly structure of a circuit substrate provided by an embodiment of the disclosure;
图8为本公开实施例提供的一种电路基板的制作方法的流程示意图。FIG. 8 is a schematic flowchart of a method for manufacturing a circuit substrate provided by an embodiment of the disclosure.
具体实施方式detailed description
下面将结合本公开实施例中的附图,对本公开实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例是本公开一部分实施例,而不是全部的实施例。基于本公开中的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本公开保护的范围。The technical solutions in the embodiments of the present disclosure will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present disclosure. Obviously, the described embodiments are part of the embodiments of the present disclosure, rather than all of the embodiments. Based on the embodiments in the present disclosure, all other embodiments obtained by those of ordinary skill in the art without creative work shall fall within the protection scope of the present disclosure.
Micro LED巨量转移过程中,由于转移操作过程中的指向不均匀,Micro LED固定在电路基板上的准直度较差,导致多个Micro LED的发光均一性较差,造成微发光二极管显示基板的整体显示效果较差。During the mass transfer of Micro LEDs, due to the uneven orientation during the transfer operation, the alignment of the Micro LEDs fixed on the circuit substrate is poor, resulting in poor light-emitting uniformity of multiple Micro LEDs, resulting in a micro LED display substrate The overall display effect is poor.
微发光二极管显示基板的结构是Micro LED阵列,是将Micro LED结构设计进行薄膜化、微小化及阵列化后,巨量转移到电路基板上,再利用物理沉积技术生成保护层,形成微小间距的Micro LED。在极大程度微小化显示器体积的同时,还能够实现每个像素单独定址、单独驱动发光的目的。Micro LED具备无需背光源、能够自发光的特性,与OLED相比,Micro LED色彩更容易准确的调试,且结构简易,几乎无光耗,使用寿命非常长,具备高亮度、低功耗、超高解析度与色彩饱和度等优点。而上述优点主要依赖于Micro LED最大的特点,即微米等级的间距,每一像素点pixel都能定址控制及单点驱动发光。Micro LED主要的技术难点是在垒晶结束后,需要将已点亮的Micro LED晶体薄膜无需封装直接搬运到驱动背板上,即巨量转移技术。The structure of the micro-light-emitting diode display substrate is a Micro LED array. After the Micro LED structure design is thinned, miniaturized, and arrayed, a large amount is transferred to the circuit substrate, and then a protective layer is generated by physical deposition technology to form a small pitch. Micro LED. While minimizing the size of the display to a great extent, it can also achieve the purpose of individual addressing and individual driving of light for each pixel. Micro LED has the characteristics of not requiring a backlight source and self-luminous. Compared with OLED, Micro LED color is easier and more accurate to debug, and has a simple structure, almost no light consumption, very long service life, high brightness, low power consumption, super Advantages of high resolution and color saturation. The above advantages mainly depend on the biggest feature of Micro LED, that is, the micron-level pitch. Each pixel can be controlled by addressing and driven by a single point to emit light. The main technical difficulty of Micro LED is that after the base crystal is finished, the lighted Micro LED crystal film needs to be transported directly to the drive backplane without packaging, that is, mass transfer technology.
Micro LED的巨量转移过程中,转移的仅仅是已经点亮的LED晶体外延 层,并不转移原生基底,搬运厚度仅有3%,同时Micro LED的尺寸极小,需要更加精细化的操作技术。Micro LED的转移和固化过程中,由于Micro LED转移过程中,转移操作的指向方向不均匀,导致Micro LED的准直度较差,也就无法保证Micro LED的发光均一性,即保证在一个电路基板中全部的Micro LED发光强度相同,发光亮度的均匀,影响微发光二极管显示基板的显示效果。During the massive transfer of Micro LEDs, only the illuminated LED crystal epitaxial layer is transferred, and the original substrate is not transferred. The handling thickness is only 3%. At the same time, the size of Micro LEDs is extremely small, requiring more refined operation technology. . During the transfer and curing process of the Micro LED, due to the uneven direction of the transfer operation during the transfer process of the Micro LED, the collimation of the Micro LED is poor, and the uniformity of the Micro LED's luminescence cannot be guaranteed, that is, it can be guaranteed in one circuit. All the Micro LEDs in the substrate have the same luminous intensity and uniform luminous brightness, which affects the display effect of the micro LED display substrate.
由此,本公开提供了下述实施例,有效解决Micro LED巨量转移过程中的准直度较差的技术问题。Therefore, the present disclosure provides the following embodiments to effectively solve the technical problem of poor collimation during the mass transfer process of Micro LEDs.
参见图1,图1为本公开实施例提供的一种电路基板的结构示意图。如图1和图2所示,所述电路基板100包括:Referring to FIG. 1, FIG. 1 is a schematic structural diagram of a circuit substrate provided by an embodiment of the disclosure. As shown in FIGS. 1 and 2, the circuit substrate 100 includes:
衬底基板110,所述衬底基板110上包括多个转印区域111:A base substrate 110, which includes a plurality of transfer regions 111:
形成于所述多个转印区域111的多个准直结构120,每个所述准直结构120用于支撑所述转印区域111上的微发光二极管,使得微发光二极管在转印过程中处于准直状态。A plurality of collimating structures 120 formed on the plurality of transfer areas 111, each of the collimating structures 120 is used to support the micro light emitting diode on the transfer area 111, so that the micro light emitting diode is in the transfer process In a collimated state.
本公开实施例中,电路基板100主要包括衬底基板110,衬底基板110用于承载Micro LED,其中,所述衬底基板110可以为玻璃基板。所述衬底基板110上包括多个转印区域111,在将Micro LED巨量转移到衬底基板110上时,每个转印区域111对应设置一个Micro LED。In the embodiments of the present disclosure, the circuit substrate 100 mainly includes a base substrate 110, and the base substrate 110 is used to carry Micro LEDs, where the base substrate 110 may be a glass substrate. The base substrate 110 includes a plurality of transfer areas 111. When a large amount of Micro LED is transferred to the base substrate 110, each transfer area 111 is correspondingly provided with a Micro LED.
具体的,如图2所示,每个转印区域111均设置有准直结构120,所述准直结构120为以准直状态,即垂直于所述衬底基板110的表面。如图3所示,在将Micro LED 200设置于转印区域111时,转印区域111上的准直结构120能够支撑Micro LED 200,使得Micro LED 200处于准直状态,即Micro LED200的下表面与衬底基板110的上表面平行。Specifically, as shown in FIG. 2, each transfer area 111 is provided with a collimating structure 120, and the collimating structure 120 is in a collimated state, that is, perpendicular to the surface of the base substrate 110. As shown in Figure 3, when the Micro LED 200 is placed in the transfer area 111, the collimating structure 120 on the transfer area 111 can support the Micro LED 200, so that the Micro LED 200 is in a collimated state, that is, the lower surface of the Micro LED 200 It is parallel to the upper surface of the base substrate 110.
在衬底基板110上设置准直结构120时,需要将准直结构120的上下表面平行于所述衬底基板110的上表面设置,且将准直结构120的侧面垂直于所述衬底基板110的上表面设置,以使得准直结构120处于准直状态。这样,再通过准直结构120将Micro LED 200固定到衬底基板110上时,准直结构120即可支撑Micro LED 200也处于准直状态。衬底基板110上的每个转印区域111均形成准直结构120,由此来保证多个转印区域111上设置的Micro  LED 200的准直度,即可保证巨量转移的Micro LED 200整体的准直度和均一性。When disposing the collimating structure 120 on the base substrate 110, the upper and lower surfaces of the collimating structure 120 need to be arranged parallel to the upper surface of the base substrate 110, and the sides of the collimating structure 120 are perpendicular to the base substrate. The upper surface of 110 is arranged so that the collimating structure 120 is in a collimated state. In this way, when the Micro LED 200 is fixed to the base substrate 110 through the collimating structure 120, the collimating structure 120 can support the Micro LED 200 to be in a collimated state. Each transfer area 111 on the base substrate 110 forms a collimation structure 120, thereby ensuring the collimation of the Micro LED 200 arranged on the multiple transfer areas 111, which can ensure the mass transfer of the Micro LED 200 The overall collimation and uniformity.
上述本公开实施例提供的电路基板,通过在衬底基板上形成多个用于固定Micro LED的转印区域,并且在每个转印区域均形成准直结构,这样,在将Micro LED巨量转移到电路基板上时,每个转印区域的准直结构能够使得该转印区域上的Micro LED处于准直状态,进而保证该电路基板上的多个Micro LED的准直度较好,优化了多个Micro LED的发光均一性和微发光二极管显示基板的整体显示效果。In the circuit substrate provided by the above-mentioned embodiments of the present disclosure, a plurality of transfer areas for fixing Micro LEDs are formed on the base substrate, and a collimation structure is formed in each transfer area. In this way, a large number of Micro LEDs When transferred to the circuit substrate, the collimation structure of each transfer area can make the Micro LED on the transfer area in a collimated state, thereby ensuring that the multiple Micro LEDs on the circuit substrate have better collimation and optimization The uniformity of light emission of multiple Micro LEDs and the overall display effect of the micro LED display substrate are improved.
在一些可选的实施例中,所述准直结构120包括至少两个挡墙,所述至少两个挡墙远离所述衬底基板的端面位于同一平面。如图4所示,每个转印区域111中的两个挡墙平行。如图6所示,每个转印区域111中的两个挡墙交叉。In some optional embodiments, the collimating structure 120 includes at least two retaining walls, and the end surfaces of the at least two retaining walls away from the base substrate are located on the same plane. As shown in FIG. 4, the two retaining walls in each transfer area 111 are parallel. As shown in FIG. 6, two retaining walls in each transfer area 111 cross.
本实施方式中,准直结构120包括至少两个挡墙121,该至少两个挡墙121的顶端处于同一高度。这样,至少两个挡墙121的顶端形成两个支撑点,该两个支撑点位于一水平面内,该水平面与衬底基板110的上表面平行,用于支撑转印的Micro LED 200。将Micro LED 200设置于该至少两个挡墙121的顶端,该至少两个挡墙121支撑Micro LED 200处于准直状态。In this embodiment, the collimating structure 120 includes at least two retaining walls 121, and the top ends of the at least two retaining walls 121 are at the same height. In this way, the top ends of at least two retaining walls 121 form two supporting points, and the two supporting points are located in a horizontal plane, the horizontal plane is parallel to the upper surface of the base substrate 110, and is used to support the transfer Micro LED 200. The Micro LED 200 is arranged on the top of the at least two retaining walls 121, and the at least two retaining walls 121 support the Micro LED 200 in a collimated state.
在一些可选的实施例中,如图5所示,所述准直结构可以包括封闭环状结构的挡墙。In some optional embodiments, as shown in FIG. 5, the collimating structure may include a retaining wall with a closed ring structure.
本实施方式中,准直结构为封闭环状结构的挡墙,形成封闭环状结构的挡墙的顶端高度相同,这样,封闭环状结构的顶端形成的支撑面更稳定,所支撑的Micro LED 200的准直度也就更好。在一些可选的实施例中,准直结构120也可以为多个高度相同的挡墙121围合而成的全封闭或者半封闭环状结构,准直结构120在平行于衬底基板110所在的水平面上的横截面可以为圆形、方形、十字形或者其他形状,本公开不作限定。In this embodiment, the collimating structure is a retaining wall with a closed ring structure, and the tops of the retaining walls forming the closed ring structure have the same height. In this way, the supporting surface formed by the top of the closed ring structure is more stable, and the supported MicroLED A collimation of 200 is even better. In some optional embodiments, the collimating structure 120 may also be a fully enclosed or semi-closed ring structure enclosed by a plurality of retaining walls 121 with the same height. The collimating structure 120 is located parallel to the base substrate 110. The cross-section on the horizontal plane of may be round, square, cross or other shapes, which is not limited in the present disclosure.
在一些可选的实施例中,所述准直结构120可以为弹性结构,所述准直结构120在受力时的弹性形变大于塑性形变。In some optional embodiments, the collimating structure 120 may be an elastic structure, and the elastic deformation of the collimating structure 120 when subjected to a force is greater than the plastic deformation.
本实施方式中,准直结构120选择弹性结构,且准直结构120在受力时,其所产生的弹性形变大于塑性形变,也就是其可恢复形变大于不可恢复形变, 既能保证准直结构120受力后基本恢复原状,又能在出现某些特殊情况,例如准直结构120的装配准直度差或者Micro LED 200的底面不平整时,对准直结构120进行塑性微调,以保证整体结构的准直度。In this embodiment, the collimating structure 120 selects an elastic structure, and when the collimating structure 120 is subjected to a force, its elastic deformation is greater than the plastic deformation, that is, its recoverable deformation is greater than the unrecoverable deformation, which can ensure the collimating structure After 120 is stressed, it basically returns to its original state, and when there are some special circumstances, such as poor assembly alignment of the collimating structure 120 or uneven bottom surface of the Micro LED 200, the alignment structure 120 can be plastically adjusted to ensure the overall The collimation of the structure.
这样,在Micro LED 200转移操作过程中,将Micro LED 200转移按压到转印区域111的准直结构120上,准直结构120受力发生形变,以缓冲转移过程中的按压作用力,避免Micro LED 200损坏。随着弹性势能完全释放,准直结构120基本恢复原来的准直状态,支撑Micro LED 200处于准直状态。In this way, during the transfer operation of the Micro LED 200, the Micro LED 200 is transferred and pressed onto the collimation structure 120 of the transfer area 111, and the collimation structure 120 is deformed under the force to buffer the pressing force during the transfer process and avoid the micro LED 200 is damaged. As the elastic potential energy is completely released, the collimation structure 120 basically restores the original collimation state, supporting the Micro LED 200 in the collimation state.
在一些可选的实施例中,准直结构120的形成材料可以包括丙烯酸和高分子聚合物Ploymer材料,所形成的准直结构120在受到外界挤压力时,能够发生80%至90%的弹性形变,以及10%至20%的弹性形变,结构稳定,准直支撑的效果更好。In some optional embodiments, the material for forming the collimating structure 120 may include acrylic and polymer Ploymer materials. When the collimating structure 120 is subjected to an external pressing force, 80% to 90% of the Elastic deformation, and 10% to 20% elastic deformation, stable structure, better collimation support effect.
在一些可选的实施例中,,如图6所示,所述电路基板100还可以包括:In some optional embodiments, as shown in FIG. 6, the circuit substrate 100 may further include:
固定结构130,所述固定结构130设置于所述转印区域111上,所述固定结构130用于将准直状态的Micro LED 200固定在所述转印区域111。The fixing structure 130 is arranged on the transfer area 111, and the fixing structure 130 is used to fix the Micro LED 200 in the collimated state on the transfer area 111.
本实施方式中,电路基板100的转印区域111增设固定结构130,如图7所示,在由准直结构120将Micro LED 200支撑为准直状态后,固定结构130即可将准直状态的Micro LED 200固定在转印区域111,以增加Micro LED200的稳定性。In this embodiment, a fixing structure 130 is added to the transfer area 111 of the circuit substrate 100. As shown in FIG. 7, after the micro LED 200 is supported by the collimating structure 120 in a collimated state, the fixing structure 130 can be aligned The Micro LED 200 is fixed on the transfer area 111 to increase the stability of the Micro LED 200.
在一些可选的实施例中,所述固定结构130为弹性结构,所述固定结构130在受力时的塑性形变大于弹性形变。In some optional embodiments, the fixing structure 130 is an elastic structure, and the plastic deformation of the fixing structure 130 when subjected to a force is greater than the elastic deformation.
固定结构130选为弹性结构,这样,固定结构130除了提供固定作用外,还能提供一定的缓冲作用,以缓冲Micro LED 200转移到转印区域111上的作用力,保护Micro LED 200不会损坏。固定结构130在受力时的塑性形变大于弹性形变,固定结构130会随着Micro LED 200的固定状态进行形变并固定,恢复力度较小,配合固定Micro LED 200处于准直状态。可选地,固定结构的厚度大于准直结构的厚度,以使得Micro LED器件紧密地粘贴于衬底基板上。The fixing structure 130 is selected as an elastic structure. In this way, in addition to the fixing function, the fixing structure 130 can also provide a certain buffering effect to buffer the force of the Micro LED 200 transferred to the transfer area 111 and protect the Micro LED 200 from damage . The plastic deformation of the fixed structure 130 when subjected to a force is greater than the elastic deformation, and the fixed structure 130 will deform and fix with the fixed state of the Micro LED 200, and the recovery force is small, and the fixed Micro LED 200 is in a collimated state in conjunction with the fixed Micro LED 200. Optionally, the thickness of the fixing structure is greater than the thickness of the collimating structure, so that the Micro LED device is closely adhered to the base substrate.
在一些可选的实施例中,所述固定结构130为光固化胶或者热固化胶。In some optional embodiments, the fixing structure 130 is a light-curing glue or a heat-curing glue.
在一些可选的实施例中,在每个转印区域中,固化前的光固化胶距离所 述衬底基板所在的平面的高度大于所述准直结构距离所述衬底基板所在的平面的高度。当Micro LED 200因受力贴合于转印区域时,固化后的光固化胶的高度可与所述准直结构的高度基本相同,这样,压实的光固化胶可与Micro LED 200充分接触,使得Micro LED 200紧密贴合于转印区域。In some optional embodiments, in each transfer area, the height of the photocurable glue before curing from the plane where the base substrate is located is greater than the distance between the collimating structure and the plane where the base substrate is located. height. When the Micro LED 200 is attached to the transfer area due to force, the height of the cured photo-curing adhesive can be basically the same as the height of the collimating structure, so that the compacted photo-curing adhesive can fully contact the Micro LED 200 , Making the Micro LED 200 fit closely to the transfer area.
光固化胶,包括可见光固化胶和紫外(UV)固化胶,是一种单组份,不含溶剂,固化胶在接收可见光或者紫外线照射后即可固定。热固化胶是受热后即可固定的固化胶。Light curing adhesives, including visible light curing adhesives and ultraviolet (UV) curing adhesives, are one-component and solvent-free. The curing adhesive can be fixed after receiving visible light or ultraviolet radiation. Thermal curing adhesive is a curing adhesive that can be fixed after being heated.
在一些可选的实施例中,固定结构130可以采用UV固化树脂掺杂聚酯类化合物,比如:邻苯二甲酸酯类,或邻苯二甲酸盐类/酞酸酯的化合物,=例如邻苯二甲酸二辛酯(Dioctyl Phthalate,简称二辛酯DOP)、苯二甲酸酯类(Phthalate Esters,简称PAEs)等。在受到压力时,固定结构130可以随外力发生60%~80%的塑性变形,在接收紫外线照射后即可固定。In some optional embodiments, the fixing structure 130 may be doped with a UV curable resin with polyester compounds, such as phthalates, or phthalates/phthalates, = for example, ortho Dioctyl phthalate (Dioctyl Phthalate, DOP for short), Phthalate Esters (PAEs for short), etc. When under pressure, the fixing structure 130 can undergo 60%-80% plastic deformation with external force, and can be fixed after receiving ultraviolet radiation.
在一些可选的实施例中,每个转印区域的固定结构位于所述转印区域中的多个挡墙围组成环状结构的中间;或者每个转印区域的固定结构位于所述转印区域中的封闭环状结构的挡墙的中间。如图6和7所示,每个转印区域中的固定结构130位于挡墙120所围成的区域中间。这样,Micro LED 200所受的支撑力均匀,使得大量Micro LED发光均匀。In some optional embodiments, the fixing structure of each transfer area is located in the middle of the ring structure formed by a plurality of retaining walls in the transfer area; or the fixing structure of each transfer area is located in the transfer area. The middle of the retaining wall of the closed ring structure in the printed area. As shown in FIGS. 6 and 7, the fixing structure 130 in each transfer area is located in the middle of the area enclosed by the retaining wall 120. In this way, the supporting force received by the Micro LED 200 is uniform, so that a large number of Micro LEDs emit uniform light.
上述本实施方式提供的电路基板100在转移贴合Micro LED 200的工艺过程中,将带有Micro LED 200的源基板在特定的压力下与衬底基板110接触,并且压合。在这个过程,固定结构130主要发生塑性变形与Micro LED200充分接触,而准直结构120则主要发生弹性变形,保持Micro LED 200的准直。然后将上基板压力撤销,固定胶在UV或加热高温下固化,即为完成将Micro LED 200转移固定到电路基板100的过程。During the process of transferring and attaching the Micro LED 200 to the circuit substrate 100 provided in this embodiment, the source substrate with the Micro LED 200 is in contact with the base substrate 110 under a specific pressure and pressed. In this process, the fixed structure 130 mainly undergoes plastic deformation to fully contact the Micro LED 200, while the collimating structure 120 mainly undergoes elastic deformation to maintain the alignment of the Micro LED 200. Then, the pressure on the upper substrate is released, and the fixing glue is cured under UV or heating high temperature, which is to complete the process of transferring and fixing the Micro LED 200 to the circuit substrate 100.
参见图3,图3为本公开实施例提供了一种微发光二极管显示基板,包括多个Micro LED 200,以及电路基板,所述多个微发光二极管与所述多个转印区域一一对应。所述电路基板可以为上述图1和图2,以及图4至图6所示的任一实施例提供的电路基板100,所述电路基板100的每个转印区域111上固定贴合一个Micro LED 200。Referring to FIG. 3, FIG. 3 provides a micro-light-emitting diode display substrate according to an embodiment of the present disclosure, including a plurality of Micro LED 200 and a circuit substrate, and the plurality of micro-light-emitting diodes correspond to the plurality of transfer regions in a one-to-one correspondence. . The circuit substrate may be the circuit substrate 100 provided by any one of the embodiments shown in FIGS. 1 and 2 and FIGS. 4 to 6, and each transfer area 111 of the circuit substrate 100 is fixedly attached with a Micro LED 200.
本公开实施例提供的微发光二极管显示基板,通过在电路基板的衬底基 板上形成多个用于固定Micro LED的转印区域,并且在每个转印区域均形成准直结构,这样,在将Micro LED巨量转移到电路基板上时,每个转印区域的准直结构能够使得该转印区域上的Micro LED处于准直状态,进而保证该电路基板上的多个Micro LED的准直度较好,优化了多个Micro LED的发光均一性和微发光二极管显示基板的整体显示效果。本公开实施例提供的微发光二极管显示基板的具体实施过程,可以参见上述图1和图2,以及图4至图6所示的任一实施例提供的电路基板的具体实施过程,在此不再一一赘述。In the micro-light-emitting diode display substrate provided by the embodiments of the present disclosure, a plurality of transfer areas for fixing the Micro LED are formed on the base substrate of the circuit substrate, and a collimating structure is formed in each transfer area, so that When a huge amount of Micro LED is transferred to the circuit substrate, the collimation structure of each transfer area can make the Micro LED on the transfer area in a collimated state, thereby ensuring the alignment of the multiple Micro LEDs on the circuit substrate It optimizes the luminous uniformity of multiple Micro LEDs and the overall display effect of the micro LED display substrate. For the specific implementation process of the micro-light-emitting diode display substrate provided by the embodiments of the present disclosure, please refer to the above-mentioned FIGS. 1 and 2, and the specific implementation process of the circuit substrate provided by any of the embodiments shown in FIGS. 4 to 6, which will not be described here. Let me repeat them one by one.
参见图8,图8为本公开实施例提供的一种电路基板的制作方法的流程示意图。所述电路基板的制作方法用于制作如上述图1至图7中所涉及的电路基板。如图8所示,所述方法包括:Referring to FIG. 8, FIG. 8 is a schematic flowchart of a manufacturing method of a circuit substrate according to an embodiment of the disclosure. The manufacturing method of the circuit substrate is used for manufacturing the circuit substrate as mentioned in the above-mentioned FIGS. 1 to 7. As shown in Figure 8, the method includes:
步骤801、在衬底基板上的每个转印区域上均形成准直结构,所述准直结构用于支撑所述转印区域上的微发光二极管,使得所述微发光二极管在转印过程中处于准直状态。Step 801: A collimating structure is formed on each transfer area on the base substrate, and the collimating structure is used to support the micro light emitting diode on the transfer area, so that the micro light emitting diode is in the transfer process. In the collimated state.
可选地,步骤801所述的,在衬底基板上的每个转印区域上均形成准直结构的步骤,可以包括:Optionally, in step 801, the step of forming a collimation structure on each transfer area on the base substrate may include:
在所述衬底基板上旋涂聚合物溶液并烘干,形成聚合物薄膜;Spin-coating a polymer solution on the base substrate and drying to form a polymer film;
采用掩膜板对所述聚合物薄膜进行曝光,显影后得到所述准直结构。A mask is used to expose the polymer film, and the collimation structure is obtained after development.
本实施例中,在形成电路基板时,首先在衬底基板上施加相关准备操作,例如形成Buffer层、防水层、布线等。接着采用旋涂工艺,在所述衬底基板上旋涂聚合物溶液并烘干,去除溶剂,进行聚合反应以形成聚合物膜层,所采用的聚合反应可以为在230摄氏度环境下固化30分钟。然后采用掩膜板对聚合物薄膜进行曝光,形成预定图案,然后采用显影工艺,使曝光区保留,非曝光区刻蚀掉,即可形成准直结构。In this embodiment, when the circuit substrate is formed, relevant preparation operations are first applied on the base substrate, such as forming a buffer layer, a waterproof layer, and wiring. Then, a spin coating process is used to spin-coat the polymer solution on the base substrate and dry, remove the solvent, and perform a polymerization reaction to form a polymer film. The polymerization reaction used can be curing at 230 degrees Celsius for 30 minutes . Then, a mask is used to expose the polymer film to form a predetermined pattern, and then a development process is used to retain the exposed area and etch away the non-exposed area to form a collimating structure.
本公开实施例提供的电路基板的制作方法,通过在电路基板的衬底基板上形成多个用于固定Micro LED的转印区域,并且在每个转印区域均形成准直结构,这样,在将Micro LED巨量转移到电路基板上时,每个转印区域的准直结构能够使得该转印区域上的Micro LED处于准直状态,进而保证该电路基板上的多个Micro LED的准直度较好,优化了多个Micro LED的发光均一性和微发光二极管显示基板的整体显示效果。本公开实施例提供的电路基 板的制作方法的具体实施过程,可以参见上述图1和图2,以及图4至图6所示的任一实施例提供的电路基板的具体实施过程,在此不再一一赘述。The manufacturing method of the circuit substrate provided by the embodiment of the present disclosure is to form a plurality of transfer areas for fixing the Micro LED on the base substrate of the circuit substrate, and to form a collimation structure in each transfer area. When a huge amount of Micro LED is transferred to the circuit substrate, the collimation structure of each transfer area can make the Micro LED on the transfer area in a collimated state, thereby ensuring the alignment of the multiple Micro LEDs on the circuit substrate It optimizes the luminous uniformity of multiple Micro LEDs and the overall display effect of the micro LED display substrate. For the specific implementation process of the manufacturing method of the circuit substrate provided by the embodiments of the present disclosure, please refer to the above-mentioned FIGS. 1 and 2, and the specific implementation process of the circuit substrate provided by any of the embodiments shown in FIGS. 4 to 6, which will not be described here. Let me repeat them one by one.
以上所述,仅为本公开的具体实施方式,但本公开的保护范围并不局限于此,任何熟悉本技术领域的技术人员在本公开揭露的技术范围内,可轻易想到变化或替换,都应涵盖在本公开的保护范围之内。因此,本公开的保护范围应以权利要求的保护范围为准。The above are only specific implementations of the present disclosure, but the protection scope of the present disclosure is not limited thereto. Any person skilled in the art can easily think of changes or substitutions within the technical scope disclosed in the present disclosure. It should be covered within the protection scope of the present disclosure. Therefore, the protection scope of the present disclosure should be subject to the protection scope of the claims.

Claims (13)

  1. 一种电路基板,包括:A circuit substrate, including:
    衬底基板,其中,所述衬底基板包括多个转印区域:The base substrate, wherein the base substrate includes a plurality of transfer regions:
    位于所述多个转印区域的多个准直结构,其中,所述准直结构被配置为支撑所述转印区域上的微发光二极管,并使得所述微发光二极管在转印过程中处于准直状态;A plurality of collimation structures located in the plurality of transfer areas, wherein the collimation structure is configured to support the micro light emitting diodes on the transfer area, and make the micro light emitting diodes in the transfer process Collimation state
    位于所述多个转印区域的多个固定结构,其中,每个固定结构被配置为固定相应的微发光二极管在所述固定结构对应的转印区域。A plurality of fixing structures located in the plurality of transfer areas, wherein each fixing structure is configured to fix a corresponding micro light emitting diode in a corresponding transfer area of the fixing structure.
  2. 根据权利要求1所述的电路基板,其中,所述准直结构包括至少两个挡墙,所述至少两个挡墙远离所述衬底基板的端面位于同一平面。The circuit substrate according to claim 1, wherein the collimating structure comprises at least two retaining walls, and the end surfaces of the at least two retaining walls away from the base substrate are located on the same plane.
  3. 根据权利要求1所述的电路基板,其中,所述准直结构包括多个挡墙,所述多个挡墙围组成环状结构。The circuit substrate according to claim 1, wherein the collimating structure comprises a plurality of retaining walls, and the plurality of retaining walls form a ring structure.
  4. 根据权利要求1所述的电路基板,其中,所述准直结构包括封闭环状结构的挡墙。The circuit substrate according to claim 1, wherein the collimating structure comprises a retaining wall of a closed ring structure.
  5. 根据权利要求2至4中任一项所述的电路基板,其中,在每个转印区域中,所述挡墙远离所述衬底基板的端面与所述衬底基板所在的平面平行。4. The circuit substrate according to any one of claims 2 to 4, wherein, in each transfer area, the end surface of the barrier wall away from the base substrate is parallel to the plane where the base substrate is located.
  6. 根据权利要求1所述的电路基板,其中,所述准直结构为弹性结构,所述准直结构在受力时的弹性形变大于塑性形变。4. The circuit substrate of claim 1, wherein the collimating structure is an elastic structure, and the elastic deformation of the collimating structure is greater than the plastic deformation when subjected to a force.
  7. 根据权利要求1所述的电路基板,其中,所述固定结构为弹性结构,所述固定结构在受力时的塑性形变大于弹性形变。3. The circuit substrate according to claim 1, wherein the fixing structure is an elastic structure, and the plastic deformation of the fixing structure when subjected to a force is greater than the elastic deformation.
  8. 根据权利要求7所述的电路基板,其中,所述固定结构为光固化胶或者热固化胶。8. The circuit substrate according to claim 7, wherein the fixing structure is a photocurable adhesive or a thermal curing adhesive.
  9. 根据权利要求8所述的电路基板,其中,每个固定结构位于所述准直结构在相应的转印区域上限定的空间中,在每个转印区域中,固化前的固定结构距离所述衬底基板所在的平面的高度大于所述准直结构距离所述衬底基板所在的平面的高度。The circuit substrate according to claim 8, wherein each fixing structure is located in a space defined by the collimating structure on the corresponding transfer area, and in each transfer area, the fixed structure before curing is at a distance from the The height of the plane where the base substrate is located is greater than the height of the collimating structure from the plane where the base substrate is located.
  10. 根据权利要求3或4所述的电路基板,其中,每个转印区域的固定结构位于所述转印区域中的多个挡墙围组成的环状结构的中间;或者The circuit substrate according to claim 3 or 4, wherein the fixing structure of each transfer area is located in the middle of a ring structure formed by a plurality of retaining walls in the transfer area; or
    每个转印区域的固定结构位于所述转印区域中的封闭环状结构的挡墙的中间。The fixing structure of each transfer area is located in the middle of the retaining wall of the closed ring structure in the transfer area.
  11. 一种微发光二极管显示基板,包括多个微发光二极管,以及如权利要求1至10中任一项所述的电路基板,A micro light emitting diode display substrate, comprising a plurality of micro light emitting diodes, and the circuit substrate according to any one of claims 1 to 10,
    其中,所述多个微发光二极管与所述多个转印区域一一对应,每个微发光二极管被贴合于所述电路基板的对应转印区域上的固定结构。Wherein, the plurality of micro light-emitting diodes correspond to the plurality of transfer areas one-to-one, and each micro light-emitting diode is attached to a fixing structure on the corresponding transfer area of the circuit substrate.
  12. 一种电路基板的制作方法,用于制作如权利要求1至10中任一项所述的电路基板,其中,所述方法包括:A method for manufacturing a circuit substrate for manufacturing the circuit substrate according to any one of claims 1 to 10, wherein the method comprises:
    在所述衬底基板上的每个转印区域上均形成准直结构,所述准直结构用于支撑所述转印区域上的微发光二极管,使得所述微发光二极管在转印过程中处于准直状态。A collimating structure is formed on each transfer area on the base substrate, and the collimating structure is used to support the micro light emitting diode on the transfer area, so that the micro light emitting diode is in the transfer process In a collimated state.
  13. 根据权利要求12所述的方法,其中,所述在衬底基板上的每个转印区域上均形成准直结构的步骤,包括:The method according to claim 12, wherein the step of forming a collimating structure on each transfer area on the base substrate comprises:
    在所述衬底基板上旋涂聚合物溶液并烘干,形成聚合物薄膜;Spin-coating a polymer solution on the base substrate and drying to form a polymer film;
    采用掩膜板对所述聚合物薄膜进行曝光,显影后得到所述准直结构。A mask is used to expose the polymer film, and the collimation structure is obtained after development.
PCT/CN2020/078623 2019-03-20 2020-03-10 Circuit substrate, manufacturing method therefor, and micro light-emitting diode display substrate WO2020187093A1 (en)

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