WO2020157154A3 - Metallisierte mikrostrukturen in glasträgern - Google Patents

Metallisierte mikrostrukturen in glasträgern Download PDF

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Publication number
WO2020157154A3
WO2020157154A3 PCT/EP2020/052197 EP2020052197W WO2020157154A3 WO 2020157154 A3 WO2020157154 A3 WO 2020157154A3 EP 2020052197 W EP2020052197 W EP 2020052197W WO 2020157154 A3 WO2020157154 A3 WO 2020157154A3
Authority
WO
WIPO (PCT)
Prior art keywords
microstructures
glass slides
glass
glass slide
outs
Prior art date
Application number
PCT/EP2020/052197
Other languages
English (en)
French (fr)
Other versions
WO2020157154A2 (de
Inventor
Robin Krüger
Bernd Rösener
Oktavia Ostermann
Malte Schulz-Ruhtenberg
Original Assignee
Lpkf Laser & Electronics Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lpkf Laser & Electronics Ag filed Critical Lpkf Laser & Electronics Ag
Publication of WO2020157154A2 publication Critical patent/WO2020157154A2/de
Publication of WO2020157154A3 publication Critical patent/WO2020157154A3/de

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/107—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by filling grooves in the support with conductive material
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
    • C03C23/0025—Other surface treatment of glass not in the form of fibres or filaments by irradiation by a laser beam
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42—Plated through-holes or plated via connections
    • H05K3/425—Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern
    • H05K3/426—Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern initial plating of through-holes in substrates without metal
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/03—Use of materials for the substrate
    • H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0703—Plating
    • H05K2203/0723—Electroplating, e.g. finish plating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
    • H05K3/0029—Etching of the substrate by chemical or physical means by laser ablation of inorganic insulating material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/04—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching
    • H05K3/046—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/24—Reinforcing the conductive pattern
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/24—Reinforcing the conductive pattern
    • H05K3/245—Reinforcing conductive patterns made by printing techniques or by other techniques for applying conductive pastes, inks or powders; Reinforcing other conductive patterns by such techniques
    • H05K3/246—Reinforcing conductive paste, ink or powder patterns by other methods, e.g. by plating

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • Surface Treatment Of Glass (AREA)
  • Laser Beam Processing (AREA)
  • Micromachines (AREA)

Abstract

Die Erfindung betrifft ein Verfahren zur Herstellung von Metallbahnen in Mikrostrukturen, die in einem Glasträger ausgebildet sind,durch ortsspezifische Metallisierung von Mikrostrukturen, die in einem Glasträger ausgebildet sind. Die Mikrostrukturen sind in dem Glasträger ausgebildete Ausnehmungen, die insbesondere durch Einstrahlen von Laserimpulsen an den Stellen, an denen Ausnehmungen erzeugt werden sollen, und anschließendes Ätzen der Glasträger erzeugt sind. Das Verfahren hat den Vorteil, in Glasträgern ausgebildete Mikrostrukturen selektiv zu metallisieren, so dass die Glasträger nur in Mikrostrukturen Metall aufweisen, insbesondere ohne einen Schritt des Abtragens von Metall vom Glasträger.
PCT/EP2020/052197 2019-02-01 2020-01-29 Metallisierte Mikrostrukturen in Glasträgern WO2020157154A2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102019201348.1A DE102019201348A1 (de) 2019-02-01 2019-02-01 Metallisierte Mikrostrukturen in Glasträgern
DE102019201348.1 2019-02-01

Publications (2)

Publication Number Publication Date
WO2020157154A2 WO2020157154A2 (de) 2020-08-06
WO2020157154A3 true WO2020157154A3 (de) 2020-11-05

Family

ID=69528774

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2020/052197 WO2020157154A2 (de) 2019-02-01 2020-01-29 Metallisierte Mikrostrukturen in Glasträgern

Country Status (2)

Country Link
DE (1) DE102019201348A1 (de)
WO (1) WO2020157154A2 (de)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0643153A1 (de) * 1993-09-09 1995-03-15 KRONE Aktiengesellschaft Verfahren zur Herstellung von strukturierten Metallisierungen auf Oberflächen
JP2001251039A (ja) * 2000-03-07 2001-09-14 Seiko Epson Corp ガラス基板およびその製造方法ならびに半導体装置
US20060121199A1 (en) * 2004-12-08 2006-06-08 Industrial Technology Research Institute Method of forming a metal thin film in a micro hole by ink-jet printing
US20070220744A1 (en) * 2005-03-22 2007-09-27 Cluster Technology Co., Ltd. Wiring Circuit Board Producing Method and Wiring Circuit Board
US20090308645A1 (en) * 2008-06-17 2009-12-17 Samsung Electro-Mechanics Co., Ltd. Printed circuit board and manufacturing method thereof
US20150060402A1 (en) * 2013-08-29 2015-03-05 Corning Incorporated Methods for forming vias in glass substrates

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7183650B2 (en) * 2001-07-12 2007-02-27 Renesas Technology Corp. Wiring glass substrate for connecting a semiconductor chip to a printed wiring substrate and a semiconductor module having the wiring glass substrate
US6591496B2 (en) * 2001-08-28 2003-07-15 3M Innovative Properties Company Method for making embedded electrical traces
KR100864152B1 (ko) * 2007-04-02 2008-10-16 주식회사 엘지화학 전도성 패턴이 흑화처리된 전자파 차폐 유리 및 그제조방법
DE102015117558A1 (de) 2015-10-15 2017-04-20 Lpkf Laser & Electronics Ag Verfahren zum Herstellen von strukturierten Beschichtungen auf einem Formteil und Vorrichtung zur Durchführung des Verfahrens
US20180305563A1 (en) * 2017-04-19 2018-10-25 Electronics And Telecommunications Research Institute Liquid metal mixture and method of forming a conductive pattern using the same

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0643153A1 (de) * 1993-09-09 1995-03-15 KRONE Aktiengesellschaft Verfahren zur Herstellung von strukturierten Metallisierungen auf Oberflächen
JP2001251039A (ja) * 2000-03-07 2001-09-14 Seiko Epson Corp ガラス基板およびその製造方法ならびに半導体装置
US20060121199A1 (en) * 2004-12-08 2006-06-08 Industrial Technology Research Institute Method of forming a metal thin film in a micro hole by ink-jet printing
US20070220744A1 (en) * 2005-03-22 2007-09-27 Cluster Technology Co., Ltd. Wiring Circuit Board Producing Method and Wiring Circuit Board
US20090308645A1 (en) * 2008-06-17 2009-12-17 Samsung Electro-Mechanics Co., Ltd. Printed circuit board and manufacturing method thereof
US20150060402A1 (en) * 2013-08-29 2015-03-05 Corning Incorporated Methods for forming vias in glass substrates

Also Published As

Publication number Publication date
DE102019201348A1 (de) 2020-08-06
WO2020157154A2 (de) 2020-08-06

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