WO2020155320A1 - 显影液浓度测量装置及方法 - Google Patents

显影液浓度测量装置及方法 Download PDF

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Publication number
WO2020155320A1
WO2020155320A1 PCT/CN2019/078088 CN2019078088W WO2020155320A1 WO 2020155320 A1 WO2020155320 A1 WO 2020155320A1 CN 2019078088 W CN2019078088 W CN 2019078088W WO 2020155320 A1 WO2020155320 A1 WO 2020155320A1
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Prior art keywords
concentration
developer
module
measurement
ultrasonic
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PCT/CN2019/078088
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English (en)
French (fr)
Inventor
蔡在秉
李彦泽
陈仲仁
邓强
金明光
汪直超
韦智强
黄家都
何崇嘉
李德全
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Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd
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Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd
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Publication of WO2020155320A1 publication Critical patent/WO2020155320A1/zh
Anticipated expiration legal-status Critical
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N9/00—Investigating density or specific gravity of materials; Analysing materials by determining density or specific gravity
    • G01N9/24—Investigating density or specific gravity of materials; Analysing materials by determining density or specific gravity by observing the transmission of wave or particle radiation through the material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Definitions

  • This application relates to the field of display technology, in particular to a developer concentration measuring device and method.
  • TFT-LCD Thin Film Transistor-Liquid Crystal Display
  • array cell formation
  • module The array process is further divided into three major processes: film formation, photolithography and etching.
  • Exposure and development are the two most critical steps in the photolithography process. Exposure is a photochemical reaction that transfers the pattern on the mask to the photoresist. The development after exposure is to dissolve the photoresist in the photosensitive or non-sensitive part with a developing solution to display the desired pattern. In the development process, in order to obtain products with high resolution, high definition, high stability and high yield, the concentration and composition of the developer must be strictly managed.
  • a developer solution concentration measuring device for measuring the concentration of each component in the developer solution.
  • the developer solution includes photoresist, tetramethylammonium hydroxide, and carbonate.
  • the liquid concentration measuring device includes:
  • the photoresist measurement module is used to receive the developer and measure the concentration of the photoresist in the developer to obtain the concentration a of the photoresist;
  • the pipeline module is used to transport the developer
  • the concentration meter measurement module includes a first ultrasonic concentration meter, and the concentration meter measurement module is used to receive the developer, measure and calculate the developer, to obtain the concentration including the tetramethylammonium hydroxide b1, the data M of the carbonate concentration c1;
  • the auxiliary measurement module includes a second ultrasonic concentration meter, and the auxiliary measurement module is used to receive the developer and measure the developer to obtain the concentration b2 including the tetramethylammonium hydroxide. Carbonate concentration c2 data N;
  • the processing module is used to receive the data M and the data N, compare the data M and the data N, and determine whether the difference between the data M and the data N is within the target range. Describe whether the developer concentration measurement is accurate.
  • the photoresistance measurement module includes:
  • the detector is used to measure the transmittance of the second light after the second light passes through the developer, obtain the absorbance value of the developer, and calculate and obtain the photoresist concentration a of the developer .
  • the photoresist measurement module further includes a display for displaying the transmittance, the absorbance value, and the photoresist concentration a.
  • the concentration meter measurement module further includes a conductivity meter and a thermometer
  • the concentration meter measurement module is used to obtain the overall concentration A1 of the concentration a of the photoresist, the concentration b1 of the tetramethylammonium hydroxide, and the concentration c1 of the carbonate, and then obtain the tetramethyl The concentration of ammonium hydroxide b1 and the concentration of carbonate c1.
  • the second ultrasonic concentration meter is used to obtain the overall concentration A2 of the concentration a of the photoresist, the concentration b2 of the tetramethylammonium hydroxide, and the concentration c2 of the carbonate;
  • the measurement auxiliary module further includes:
  • the comparison unit is used to receive and compare the A1 and the A2, and if the difference between the A1 and the A2 is within a predetermined range, output various measurement value data of the developer concentration.
  • the first ultrasonic densitometer and the second ultrasonic densitometer are connected in parallel, and the first ultrasonic densitometer and the second ultrasonic densitometer are arranged in the same direction.
  • the ultrasonic concentration meter and the second ultrasonic concentration meter perform signal transmission with the processing module through different signal transmission devices.
  • it further includes:
  • the sampling module is used to obtain part of the developer for concentration measurement
  • the vacuum module is used to exhaust the debris in the pipeline module to provide a vacuum environment.
  • the first ultrasonic concentration meter and the second ultrasonic concentration meter are respectively arranged in independent measuring pipes.
  • a method for measuring the concentration of a developer the developer including photoresist, tetramethylammonium hydroxide and carbonate, and the method for measuring the concentration of a developer includes:
  • the sampling module obtains the developer
  • the vacuum module extracts the air in the pipeline module
  • the photoresistance measurement module obtains the concentration a of the photoresist when the developer flows through the photoresistance measurement module;
  • the concentration meter measurement module obtains the concentration b1 including the tetramethylammonium hydroxide and the carbonic acid by the first ultrasonic concentration meter at the first ultrasonic concentration time when the developer flows through the concentration meter measurement module.
  • the measurement auxiliary module obtains the concentration b2 of the tetramethylammonium hydroxide including the concentration b2 of the tetramethylammonium hydroxide by the second ultrasonic concentration meter at the second ultrasonic concentration time when the developer flows through the measurement auxiliary module.
  • the first ultrasonic densitometer and the second ultrasonic densitometer are connected in parallel, and the first ultrasonic densitometer and the second ultrasonic densitometer are arranged in the same direction.
  • the ultrasonic concentration meter and the second ultrasonic concentration meter perform signal transmission with the processing module through different signal transmission devices.
  • the photoresistance measurement module includes a light source, a lens, an interference filter, and a detector.
  • the concentration meter measurement module includes a first ultrasonic concentration meter, a conductivity meter and a thermometer.
  • the measurement auxiliary module includes a second ultrasonic densitometer and a comparison unit.
  • a developer concentration measuring device for measuring the concentration of each component in the developer.
  • the developer includes photoresist, tetramethylammonium hydroxide, and carbonate.
  • the photoresist measurement module is used to receive the developer and measure the concentration of the photoresist in the developer to obtain the concentration a of the photoresist;
  • the pipeline module is used to transport the developer
  • the concentration meter measurement module includes a first ultrasonic concentration meter, and the concentration meter measurement module is used to receive the developer, measure and calculate the developer, to obtain the concentration including the tetramethylammonium hydroxide b1, the data M of the carbonate concentration c1;
  • the auxiliary measurement module includes a second ultrasonic concentration meter, and the auxiliary measurement module is used to receive the developer and measure the developer to obtain the concentration b2 including the tetramethylammonium hydroxide. Carbonate concentration c2 data N;
  • the processing module is used to receive the data M and the data N, compare the data M and the data N, and determine whether the difference between the data M and the data N is within the target range. State whether the developer concentration measurement is accurate;
  • the developing solution flows through the measuring pipe after passing through the press, and the developing solution flows through the photoresistance measurement module, the concentration meter measurement module and the measurement auxiliary module through the measurement pipe.
  • the photoresistance measurement module includes:
  • the detector is used to measure the transmittance of the second light after the second light passes through the developer, obtain the absorbance value of the developer, and calculate and obtain the photoresist concentration a of the developer .
  • the photoresist measurement module further includes a display for displaying the transmittance, the absorbance value, and the photoresist concentration a.
  • the concentration meter measurement module further includes a conductivity meter and a thermometer
  • the concentration meter measurement module is used to obtain the overall concentration A1 of the concentration a of the photoresist, the concentration b1 of the tetramethylammonium hydroxide, and the concentration c1 of the carbonate, and then obtain the tetramethyl The concentration of ammonium hydroxide b1 and the concentration of carbonate c1.
  • the second ultrasonic concentration meter is used to obtain the overall concentration A2 of the concentration a of the photoresist, the concentration b2 of the tetramethylammonium hydroxide, and the concentration c2 of the carbonate;
  • the measurement auxiliary module further includes:
  • the comparison unit is used to receive and compare the A1 and the A2, and if the difference between the A1 and the A2 is within a predetermined range, output various measurement value data of the developer concentration.
  • the first ultrasonic densitometer and the second ultrasonic densitometer are connected in parallel, and the first ultrasonic densitometer and the second ultrasonic densitometer are arranged in the same direction.
  • the ultrasonic concentration meter and the second ultrasonic concentration meter perform signal transmission with the processing module through different signal transmission devices.
  • it further includes:
  • the sampling module is used to obtain part of the developer for concentration measurement
  • the vacuum module is used to exhaust the debris in the pipeline module to provide a vacuum environment.
  • a set of ultrasonic concentration meters are added to the developer concentration measuring device to measure the developer, and the two sets of measurement data are compared to further improve the accuracy of the developer concentration measuring device in measuring the carbonate concentration.
  • FIG. 1 is a schematic structural diagram of a developer concentration measuring device provided by an embodiment of the application.
  • the present application provides a developer concentration measuring device and method to solve the problem of inaccurate measurement of the concentration of each component in the developer when there are bubbles in the developer concentration measuring device.
  • FIG. 1 is a schematic structural diagram of a developer concentration measuring device provided by an embodiment of the application.
  • the present application provides a developer concentration measuring device 100 for measuring the concentration of each component in the developer.
  • the developer includes photoresist, tetramethylammonium hydroxide, and carbonate.
  • the concentration of carbonate is one of the important indicators of the developer's developing ability.
  • the measured value of the carbonate concentration decreases, it means that the developing ability of the developer becomes stronger. This application focuses on improving the measurement accuracy of the carbonate concentration in the developer.
  • the developer concentration measurement device 100 includes: a photoresistance measurement module 11, a pipeline module 18, a concentration meter measurement module 13, a measurement auxiliary module 12 and a processing module 14.
  • the photoresist measurement module 11 is used to receive the developer and measure the concentration of the photoresist in the developer to obtain the concentration a of the photoresist.
  • the photoresistance measurement module 11 includes a light source, a lens, an interference filter, and a detector.
  • the light source is used to provide the first light.
  • the first light is ultraviolet light.
  • the lens and the interference filter are used to obtain a second light having a predetermined wavelength.
  • the wavelength of the second light may be between 285 nanometers and 295 nanometers.
  • the detector is used to measure the transmittance of the second light after the second light passes through the developer solution to obtain the absorbance value of the developer solution, and then calculate and obtain the concentration of the photoresist of the developer solution a.
  • the photoresist measurement can directly measure the concentration a of the photoresist of the developer.
  • the photoresist measurement module 11 further includes a display for displaying the transmittance, the absorbance value, and the photoresist concentration a.
  • the photoresistance measurement module 11 includes an amplifier arranged between the detector and the display to improve the accuracy of the concentration measurement result of the photoresistor.
  • the pipeline module 18 is used to transport the developer solution and connect the photoresistance measurement module 11, the densitometer measurement module 13 and the measurement auxiliary module 12.
  • the concentration meter measurement module 13 includes a first ultrasonic concentration meter.
  • the densitometer measurement module 13 is used to receive the developer, measure and calculate the developer to obtain data including the concentration b1 of the tetramethylammonium hydroxide and the concentration c1 of the carbonate radical M.
  • the first ultrasonic densitometer is placed vertically away from gravity. When the developer is measured, the developer flows from bottom to top to discharge the gas in the first ultrasonic concentration meter. Avoid gas sticking to the ultrasonic densitometer, affecting the measurement of the concentration of the developer.
  • the concentration meter measuring module 13 can measure the overall concentration A of the photoresist, the tetramethylammonium hydroxide and the carbonate radical, and obtain the tetramethylhydrogen The concentration of ammonium oxide b1.
  • the carbonate concentration c1 is obtained by the addition and subtraction algorithm.
  • the concentration meter measurement module 13 further includes a conductivity meter and a thermometer.
  • the concentration meter measurement module 13 obtains the overall concentration A1 of the concentration a of the photoresist, the concentration b1 of the tetramethylammonium hydroxide, and the concentration c1 of the carbonate radical, and then obtains the tetramethylhydroxide The concentration of ammonium b1 and the concentration of carbonate c1.
  • the developer concentration control system has the ability to compensate for the decrease in B value caused by the adhesion of bubbles to the ultrasonic densitometer, but if the amount of bubbles adhered to the ultrasonic densitometer changes, the measured value will be Change, which in turn causes the accuracy of the measured value of the ultrasonic concentration meter to be unable to be confirmed.
  • the measurement auxiliary module 12 includes a second ultrasonic concentration meter, and the measurement auxiliary module 12 is used to receive the developer and measure the developer to obtain the concentration b2 including the tetramethylammonium hydroxide , The data N of the carbonate concentration c2.
  • the second ultrasonic concentration meter is used to obtain the overall concentration A2 of the concentration a of the photoresist, the concentration b2 of the tetramethylammonium hydroxide, and the concentration c2 of the carbonate.
  • the measurement auxiliary module 12 further includes:
  • the comparison unit is configured to receive and compare the A1 and the A2, and if the difference between the A1 and the A2 is within a predetermined range, output various measurement value data of the developer concentration.
  • the processing module 14 receives the data M and the data N, compares the data M with the data N, and determines whether the difference between the data M and the data N is within the target range. Whether the developer concentration measurement is accurate. Among them, the most important thing is to compare the concentration c1 and the concentration c2.
  • the first ultrasonic densitometer and the second ultrasonic densitometer are connected in parallel, and the first ultrasonic densitometer and the second ultrasonic densitometer are arranged in the same direction.
  • the ultrasonic concentration meter and the second ultrasonic concentration meter perform signal transmission with the processing module 14 through different signal transmission devices.
  • the developer concentration measuring device 100 further includes a sampling module 17 and a vacuum module 16.
  • the sampling module 17 is used to obtain part of the developer for concentration measurement.
  • the vacuum module 16 is used to discharge impurities in the pipeline module 18 to provide a vacuum environment.
  • a press 15 is provided behind the vacuum module 16 to provide power for the flow of the developer.
  • the first ultrasonic concentration meter and the second ultrasonic concentration meter are respectively arranged in mutually independent measuring pipes.
  • the measuring pipe connected to the measuring auxiliary module 12 is arranged at a position after the developing solution flows through the press.
  • a pipe is provided for installing the second ultrasonic concentration meter, and finally the measuring pipe is connected with the storage bin of the developer.
  • a method for measuring the concentration of a developer the developer including photoresist, tetramethylammonium hydroxide and carbonate, and the method for measuring the concentration of a developer includes:
  • the sampling module obtains the developer
  • the vacuum module extracts the air in the pipeline module
  • the photoresistance measurement module obtains the concentration a of the photoresist when the developer flows through the photoresistance measurement module;
  • the concentration meter measurement module obtains the concentration b1 including the tetramethylammonium hydroxide and the carbonic acid by the first ultrasonic concentration meter at the first ultrasonic concentration time when the developer flows through the concentration meter measurement module.
  • the measurement auxiliary module obtains the concentration b2 of the tetramethylammonium hydroxide including the concentration b2 of the tetramethylammonium hydroxide by the second ultrasonic concentration meter at the second ultrasonic concentration time when the developer flows through the measurement auxiliary module.
  • the processing module receives the data M and the data N, compares the data M with the data N, and determines the developer according to whether the difference between the data M and the data N is within a target range Whether the concentration measurement is accurate.
  • the first ultrasonic densitometer and the second ultrasonic densitometer are connected in parallel, and the arrangement directions of the first ultrasonic densitometer and the second ultrasonic densitometer are the same, and the first ultrasonic densitometer and The second ultrasonic concentration meter transmits signals through different signal transmission devices and the processing module 14.
  • This application measures the developer by adding a set of ultrasonic concentration meters to the developer concentration measurement device, and compares the two sets of measurement data, thereby improving the accuracy of the developer concentration measurement device for measuring carbonate concentration.

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Abstract

一种显影液浓度测量装置（100）及方法。所述显影液浓度测量装置（100）包括：光阻测量模块（11）、管道模块（18）、浓度计测量模块（13）、处理模块（14）以及测量辅助模块（12）。所述浓度计测量模块（13）用以获得数据M。所述测量辅助模块（12）用以获得数据N。所述处理模块（14）根据所述数据M与所述数据N的差值判定所述显影液浓度测量是否准确。

Description

显影液浓度测量装置及方法 技术领域
本申请涉及显示技术领域，特别涉及一种显影液浓度测量装置及方法。
 背景技术
薄膜晶体管液晶显示器（Thin Film Transistor-Liquid Crystal Display，简称TFT-LCD）在生产中大体分为阵列、成盒、模组三大工序。而在阵列工序中又分为成膜、光刻和刻蚀三大工艺。曝光和显影是光刻工艺中最为关键的两步。曝光是将掩膜板上的图案转写到光刻胶上的光化学反应。曝光后的显影就是将感光或不感光部分的光刻胶采用显影液溶除，从而显示所需要的图形。在显影过程中，为获得高分辨率、高清晰度、高稳定性和高良率的产品，必须严格地管理显影液的浓度和成分。
因此，目前亟需一种显影液浓度测量装置及方法以解决上述问题。
 技术问题
当显影液浓度测量装置内存在气泡时，显影液内各成分浓度测量不准的问题。
 技术解决方案
为实现上述目的，本申请提供的技术方案如下：
根据本申请的一个方面，提供了一种显影液浓度测量装置，用以进行显影液中各成分浓度的测量，所述显影液包括光阻、四甲基氢氧化铵以及碳酸根，所述显影液浓度测量装置包括：
光阻测量模块，用以接收所述显影液，并对所述显影液进行光阻的浓度的测量，以获得所述光阻的浓度a；
管道模块，用以输送所述显影液；
浓度计测量模块，包括第一超声波浓度计，所述浓度计测量模块用以接收所述显影液，并对所述显影液进行测量和计算，以获得包括所述四甲基氢氧化铵的浓度b1、所述碳酸根的浓度c1的数据M；
测量辅助模块，包括第二超声波浓度计，所述测量辅助模块用以接收所述显影液，并对所述显影液进行测量，以获得包括所述四甲基氢氧化铵的浓度b2、所述碳酸根的浓度c2的数据N；
处理模块，用以接收所述数据M和数据N，并将所述数据M与所述数据N进行对比，以及根据所述数据M与所述数据N的差值是否处在目标范围内判定所述显影液浓度测量是否准确。
根据本申请一实施例，所述光阻测量模块包括：
光源，用以提供第一光线；
镜头和干涉滤光器，用以获得具有预定波长的第二光线；
检出器，用以在第二光线穿过所述显影液后，测量所述第二光线的透过率，获得所述显影液的吸光度值，计算获取所述显影液的光阻的浓度a。
根据本申请一实施例，所述光阻测量模块还包括用以将所述透过率、所述吸光度值以及所述光阻浓度a显示的显示器。
根据本申请一实施例，所述浓度计测量模块还包括导电率计和温度计；
其中，所述浓度计测量模块用以获取所述光阻的浓度a、所述四甲基氢氧化铵的浓度b1以及所述碳酸根的浓度c1的整体浓度A1，进而获取所述四甲基氢氧化铵的浓度b1和所述碳酸根的浓度c1。
根据本申请一实施例，所述第二超声波浓度计，用于获取所述光阻的浓度a、所述四甲基氢氧化铵的浓度b2以及所述碳酸根的浓度c2的整体浓度A2；
所述测量辅助模块还包括：
对比单元，用以接收并对比所述A1和所述A2，若所述A1和所述A2的差值在预定范围内，则输出所述显影液浓度的各项测量值数据。
根据本申请一实施例，所述第一超声波浓度计和所述第二超声波浓度计并联，且所述第一超声波浓度计和所述第二超声波浓度计的排布方向相同，所述第一超声波浓度计和所述第二超声波浓度计通过不同的信号传输设备与所述处理模块进行信号输送。
根据本申请一实施例，还包括：
取样模块，用以获取部分所述显影液以供浓度测量；
真空模块，用以将所述管道模块内的杂物排出，以提供真空环境。
根据本申请一实施例，所述第一超声波浓度计和所述第二超声波浓度计分别设置在相互独立的测量管道中。
根据本申请的另一个方面，还提供了一种显影液浓度测量方法，所述显影液包括光阻、四甲基氢氧化铵以及碳酸根，所述显影液浓度测量方法包括：
S10、取样模块获取所述显影液；
S20、真空模块抽取管道模块内的空气；
S30、光阻测量模块在所述显影液流经所述光阻测量模块时获得所述光阻的浓度a；
S40、浓度计测量模块在所述显影液流经所述浓度计测量模块的第一超声波浓度计时通过所述第一超声波浓度计获得包括所述四甲基氢氧化铵的浓度b1、所述碳酸根的浓度c1的数据M；
S50、测量辅助模块在所述显影液流经所述测量辅助模块的第二超声波浓度计时通过所述第二超声波浓度计获得包括所述四甲基氢氧化铵的浓度b2、所述碳酸根的浓度c2的数据N；
根据本申请一实施例，所述第一超声波浓度计和所述第二超声波浓度计并联，且所述第一超声波浓度计和所述第二超声波浓度计的排布方向相同，所述第一超声波浓度计和所述第二超声波浓度计通过不同的信号传输设备与所述处理模块进行信号输送。
根据本申请一实施例，所述光阻测量模块包括光源、镜头、干涉滤光器和检出器。
根据本申请一实施例，所述浓度计测量模块包括第一超声波浓度计、导电率计和温度计。
根据本申请一实施例，所述测量辅助模块包括第二超声波浓度计和对比单元。
根据本申请的又一个方面，还提供了一种显影液浓度测量装置，用以进行显影液中各成分浓度的测量，所述显影液包括光阻、四甲基氢氧化铵以及碳酸根，其包括：
光阻测量模块，用以接收所述显影液，并对所述显影液进行光阻的浓度的测量，以获得所述光阻的浓度a；
管道模块，用以输送所述显影液；
浓度计测量模块，包括第一超声波浓度计，所述浓度计测量模块用以接收所述显影液，并对所述显影液进行测量和计算，以获得包括所述四甲基氢氧化铵的浓度b1、所述碳酸根的浓度c1的数据M；
测量辅助模块，包括第二超声波浓度计，所述测量辅助模块用以接收所述显影液，并对所述显影液进行测量，以获得包括所述四甲基氢氧化铵的浓度b2、所述碳酸根的浓度c2的数据N；
处理模块，用以接收所述数据M和数据N，并将所述数据M与所述数据N进行对比，以及根据所述数据M与所述数据N的差值是否处在目标范围内判定所述显影液浓度测量是否准确；
压力机，用以为所述显影液的流动提供动力；
其中，所述显影液通过所述压力机后流经测量管道，所述显影液通过所述测量管道流经所述光阻测量模块、所述浓度计测量模块以及所述测量辅助模块。
根据本申请一实施例，所述光阻测量模块包括：
光源，用以提供第一光线；
镜头和干涉滤光器，用以获得具有预定波长的第二光线；
检出器，用以在第二光线穿过所述显影液后，测量所述第二光线的透过率，获得所述显影液的吸光度值，计算获取所述显影液的光阻的浓度a。
根据本申请一实施例，所述光阻测量模块还包括用以将所述透过率、所述吸光度值以及所述光阻浓度a显示的显示器。
根据本申请一实施例，所述浓度计测量模块还包括导电率计和温度计；
其中，所述浓度计测量模块用以获取所述光阻的浓度a、所述四甲基氢氧化铵的浓度b1以及所述碳酸根的浓度c1的整体浓度A1，进而获取所述四甲基氢氧化铵的浓度b1和所述碳酸根的浓度c1。
根据本申请一实施例，所述第二超声波浓度计用于获取所述光阻的浓度a、所述四甲基氢氧化铵的浓度b2以及所述碳酸根的浓度c2的整体浓度A2；
所述测量辅助模块还包括：
对比单元，用以接收并对比所述A1和所述A2，若所述A1和所述A2的差值在预定范围内，则输出所述显影液浓度的各项测量值数据。
根据本申请一实施例，所述第一超声波浓度计和所述第二超声波浓度计并联，且所述第一超声波浓度计和所述第二超声波浓度计的排布方向相同，所述第一超声波浓度计和所述第二超声波浓度计通过不同的信号传输设备与所述处理模块进行信号输送。
根据本申请一实施例，还包括：
取样模块，用以获取部分所述显影液以供浓度测量；
真空模块，用以将所述管道模块内的杂物排出，以提供真空环境。
 有益效果
本申请通过在显影液浓度测量装置增设一组超声波浓度计对显影液进行测量，通过两组测量数据的对比，进而提升显影液浓度测量装置对碳酸根浓度测量的准确度。
 附图说明
为了更清楚地说明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单介绍，显而易见地，下面描述中的附图仅仅是发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本申请一实施例提供的一种显影液浓度测量装置的结构示意图。
 本发明的实施方式
以下各实施例的说明是参考附加的图示，用以例示本申请可用以实施的特定实施例。本申请所提到的方向用语，例如[上]、[下]、[前]、[后]、[左]、[右]、[内]、[外]、[侧面]等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本申请，而非用以限制本申请。在图中，结构相似的单元是用以相同标号表示。
本申请提供了一种显影液浓度测量装置及方法，以解决当显影液浓度测量装置内存在气泡时，显影液内各成分浓度测量不准的问题。
请参阅图1，图1为本申请一实施例提供的一种显影液浓度测量装置的结构示意图。
本申请提供了一种显影液浓度测量装置100，用以进行显影液中各成分浓度的测量，所述显影液包括光阻、四甲基氢氧化铵以及碳酸根。
在一种实施例中，在显影液浓度控制系统中，碳酸根的浓度是所述显影液显影能力的重要指标之一。当碳酸根浓度的测量值降低，意味着显影液的显影能力变强，本申请侧重提升显影液中碳酸根浓度的测量精度。
在一种实施例中，所述显影液浓度测量装置100包括：光阻测量模块11、管道模块18、浓度计测量模块13、测量辅助模块12以及处理模块14。
所述光阻测量模块11用以接收显影液，并对所述显影液进行光阻的浓度的测量，以获得所述光阻的浓度a。
在一种实施例中，所述光阻测量模块11包括：光源、镜头、干涉滤光器以及检出器。
所述光源用以提供第一光线。
在一种实施例中，所述第一光线为紫外光。
所述镜头和所述干涉滤光器用以获得具有预定波长的第二光线。
在一种实施例中，所述第二光线的波长可以为285纳米至295纳米之间。
所述检出器用以在第二光线穿过所述显影液后，测量所述第二光线的透过率，获得所述显影液的吸光度值，进而计算获取所述显影液的光阻的浓度a。
在一种实施例中，所述光阻测量可直接测出所述显影液的所述光阻的浓度a。
在一种实施例中，所述光阻测量模块11还包括用以将所述透过率、所述吸光度值以及所述光阻浓度a显示的显示器。
在一种实施例中，所述光阻测量模块11包括设置在所述检出器和所述显示器之间的增幅器，用以提升光阻的浓度测量结果的准确性。
所述管道模块18用以输送所述显影液，并将所述光阻测量模块11、所述浓度计测量模块13以及所述测量辅助模块12连通。
所述浓度计测量模块13包括第一超声波浓度计。所述浓度计测量模块13用以接收所述显影液，并对所述显影液进行测量和计算，以获得包括所述四甲基氢氧化铵的浓度b1、所述碳酸根的浓度c1的数据M。
在一种实施例中，所述第一超声波浓度计背离重力竖直放置。对显影液进行测量时，所述显影液从下往上流过，以排出所述第一超声波浓度计内的气体。避免气体粘附在超声波浓度计上，影响显影液各浓度的测量。
在一种实施例中，所述浓度计测量模块13可测出所述光阻、所述四甲基氢氧化铵以及所述碳酸根的整体浓度A，并通过计算获得所述四甲基氢氧化铵的浓度b1。所述四甲基氢氧化和所述碳酸根的整体浓度B。进而通过加减算法得到所述碳酸根的浓度c1。
但是当第一超声波浓度计内存在气泡时，会导致B值突降。由于碳酸根的浓度需要通过B值减去光阻的浓度a得到，所述碳酸根的浓度也会突降。但实际的碳酸根浓度c并不一定降低，碳酸根浓度c在低点时，会导致显影液浓度控制系统不会去补液来降低碳酸根浓度，结果使实际的碳酸根浓度过高或者超规，进而出现“碳酸根测量值突降，显影液的显影能力反而变弱”这种现象。因此，本申请引入所述测量辅助模块12以解决上述问题。
在一种实施例中，所述浓度计测量模块13还包括导电率计和温度计。
其中，浓度计测量模块13以获取所述光阻的浓度a、所述四甲基氢氧化铵的浓度b1以及所述碳酸根的浓度c1的整体浓度A1，进而得到所述四甲基氢氧化铵的浓度b1和所述碳酸根的浓度c1。
在一种实施例中，显影液浓度控制系统具有对所述超声波浓度计粘附气泡导致的B值降低进行补值的能力，但如果所述超声波浓度计粘附气泡量发生变化，测量值会变化，进而导致超声波浓度计的测量值的准确性无法确认。
所述测量辅助模块12包括第二超声波浓度计，所述测量辅助模块12用以接收所述显影液，并对所述显影液进行测量，以获得包括所述四甲基氢氧化铵的浓度b2、所述碳酸根的浓度c2的数据N。
在一种实施例中，所述第二超声波浓度计，用于获取所述光阻的浓度a、所述四甲基氢氧化铵的浓度b2以及所述碳酸根的浓度c2的整体浓度A2。
所述测量辅助模块12还包括：
对比单元，用于接收并对比所述A1和所述A2，若所述A1和所述A2的差值在预定范围内，则输出所述显影液浓度的各项测量值数据。
所述处理模块14，接收所述数据M和数据N，将所述数据M与所述数据N进行对比，根据所述数据M与所述数据N的差值是否处在目标范围内判定所述显影液浓度测量是否准确。其中，最主要的是进行所述浓度c1和所述浓度c2的对比。
在一种实施例中，所述第一超声波浓度计和所述第二超声波浓度计并联，且所述第一超声波浓度计和所述第二超声波浓度计的排布方向相同，所述第一超声波浓度计和所述第二超声波浓度计通过不同的信号传输设备与所述处理模块14进行信号输送。
在一种实施例中，所述显影液浓度测量装置100还包括取样模块17和真空模块16。
所述取样模块17用以获取部分所述显影液以供浓度测量。
所述真空模块16用以将所述管道模块18内的杂物排出，以提供真空环境。
在一种实施例中，所述真空模块16的后设置有压力机15，用于为所述显影液的流动提供动力。
在一种实施例中，所述第一超声波浓度计和所述第二超声波浓度计分别设置在相互独立的测量管道中。
在一种实施例中，连接所述测量辅助模块12的测量管道设置在所述显影液流经所述压力机后的位置。设置一条管道用于安装所述第二超声波浓度计，最后所述测量管道与显影液的存储仓连通。
根据本申请的另一个发明，还提供了一种显影液浓度测量方法，所述显影液包括光阻、四甲基氢氧化铵以及碳酸根，所述显影液浓度测量方法包括：
S10、取样模块获取显影液；
S20、真空模块抽取管道模块内的空气；
S30、光阻测量模块在所述显影液流经所述光阻测量模块时获得所述光阻的浓度a；
S40、浓度计测量模块在所述显影液流经所述浓度计测量模块的第一超声波浓度计时通过所述第一超声波浓度计获得包括所述四甲基氢氧化铵的浓度b1、所述碳酸根的浓度c1的数据M；
S50、测量辅助模块在所述显影液流经所述测量辅助模块的第二超声波浓度计时通过所述第二超声波浓度计获得包括所述四甲基氢氧化铵的浓度b2、所述碳酸根的浓度c2的数据N；
S60、处理模块接收所述数据M和数据N，将所述数据M与所述数据N进行对比，根据所述数据M与所述数据N的差值是否处在目标范围内判定所述显影液浓度测量是否准确。
在一种实施例中，所述第一超声波浓度计和第二超声波浓度计并联，且所述第一超声波浓度计和第二超声波浓度计的排布方向相同，所述第一超声波浓度计和第二超声波浓度计通过不同的信号传输设备与所述处理模块14进而信号输送。
有益效果：本申请通过在显影液浓度测量装置增设一组超声波浓度计对显影液进行测量，通过两组测量数据的对比，进而提升显影液浓度测量装置对碳酸根浓度测量的准确度。
综上所述，虽然本申请已以优选实施例揭露如上，但上述优选实施例并非用以限制本申请，本领域的普通技术人员，在不脱离本申请的精神和范围内，均可作各种更动与润饰，因此本申请的保护范围以权利要求界定的范围为准。

Claims (20)

  1. 一种显影液浓度测量装置，用以进行显影液中各成分浓度的测量，所述显影液包括光阻、四甲基氢氧化铵以及碳酸根，其包括：
    光阻测量模块，用以接收所述显影液，并对所述显影液进行光阻的浓度的测量，以获得所述光阻的浓度a；
    管道模块，用以输送所述显影液；
    浓度计测量模块，包括第一超声波浓度计，所述浓度计测量模块用以接收所述显影液，并对所述显影液进行测量和计算，以获得包括所述四甲基氢氧化铵的浓度b1、所述碳酸根的浓度c1的数据M；
    测量辅助模块，包括第二超声波浓度计，所述测量辅助模块用以接收所述显影液，并对所述显影液进行测量，以获得包括所述四甲基氢氧化铵的浓度b2、所述碳酸根的浓度c2的数据N；
    处理模块，用以接收所述数据M和数据N，并将所述数据M与所述数据N进行对比，以及根据所述数据M与所述数据N的差值是否处在目标范围内判定所述显影液浓度测量是否准确。
  2. 根据权利要求1所述的显影液浓度测量装置，其中，所述光阻测量模块包括：
    光源，用以提供第一光线；
    镜头和干涉滤光器，用以获得具有预定波长的第二光线；
    检出器，用以在第二光线穿过所述显影液后，测量所述第二光线的透过率，获得所述显影液的吸光度值，计算获取所述显影液的光阻的浓度a。
  3. 根据权利要求2所述的显影液浓度测量装置，其中，所述光阻测量模块还包括用以将所述透过率、所述吸光度值以及所述光阻浓度a显示的显示器。
  4. 根据权利要求1所述的显影液浓度测量装置，其中，所述浓度计测量模块还包括导电率计和温度计；
    其中，所述浓度计测量模块用以获取所述光阻的浓度a、所述四甲基氢氧化铵的浓度b1以及所述碳酸根的浓度c1的整体浓度A1，进而获取所述四甲基氢氧化铵的浓度b1和所述碳酸根的浓度c1。
  5. 根据权利要求4所述的显影液浓度测量装置，其中，所述第二超声波浓度计用于获取所述光阻的浓度a、所述四甲基氢氧化铵的浓度b2以及所述碳酸根的浓度c2的整体浓度A2；
    所述测量辅助模块还包括：
    对比单元，用以接收并对比所述A1和所述A2，若所述A1和所述A2的差值在预定范围内，则输出所述显影液浓度的各项测量值数据。
  6. 根据权利要求1所述的显影液浓度测量装置，其中，所述第一超声波浓度计和所述第二超声波浓度计并联，且所述第一超声波浓度计和所述第二超声波浓度计的排布方向相同，所述第一超声波浓度计和所述第二超声波浓度计通过不同的信号传输设备与所述处理模块进行信号输送。
  7. 根据权利要求1所述的显影液浓度测量装置，其中，还包括：
    取样模块，用以获取部分所述显影液以供浓度测量；
    真空模块，用以将所述管道模块内的杂物排出，以提供真空环境。
  8. 根据权利要求1所述的显影液浓度测量装置，其中，所述第一超声波浓度计和所述第二超声波浓度计分别设置在相互独立的测量管道中。
  9. 一种显影液浓度测量方法，其中，所述显影液包括光阻、四甲基氢氧化铵以及碳酸根，所述显影液浓度测量方法包括：
    S10、取样模块获取所述显影液；
    S20、真空模块抽取管道模块内的空气；
    S30、光阻测量模块在所述显影液流经所述光阻测量模块时获得所述光阻的浓度a；
    S40、浓度计测量模块在所述显影液流经所述浓度计测量模块的第一超声波浓度计时通过所述第一超声波浓度计获得包括所述四甲基氢氧化铵的浓度b1、所述碳酸根的浓度c1的数据M；
    S50、测量辅助模块在所述显影液流经所述测量辅助模块的第二超声波浓度计时通过所述第二超声波浓度计获得包括所述四甲基氢氧化铵的浓度b2、所述碳酸根的浓度c2的数据N；
    S60、处理模块接收所述数据M和数据N，将所述数据M与所述数据N进行对比，根据所述数据M与所述数据N的差值是否处在目标范围内判定所述显影液浓度测量是否准确。
  10. 根据权利要求9所述的显影液浓度测量方法，其中，所述第一超声波浓度计和所述第二超声波浓度计并联，且所述第一超声波浓度计和所述第二超声波浓度计的排布方向相同，所述第一超声波浓度计和所述第二超声波浓度计通过不同的信号传输设备与所述处理模块进行信号输送。
  11. 根据权利要求9所述的显影液浓度测量方法，其中，所述光阻测量模块包括光源、镜头、干涉滤光器和检出器。
  12. 根据权利要求9所述的显影液浓度测量方法，其中，所述浓度计测量模块包括第一超声波浓度计、导电率计和温度计。
  13. 根据权利要求9所述的显影液浓度测量方法，其中，所述测量辅助模块包括第二超声波浓度计和对比单元。
  14. 一种显影液浓度测量装置，用以进行显影液中各成分浓度的测量，所述显影液包括光阻、四甲基氢氧化铵以及碳酸根，其包括：
    光阻测量模块，用以接收所述显影液，并对所述显影液进行光阻的浓度的测量，以获得所述光阻的浓度a；
    管道模块，用以输送所述显影液；
    浓度计测量模块，包括第一超声波浓度计，所述浓度计测量模块用以接收所述显影液，并对所述显影液进行测量和计算，以获得包括所述四甲基氢氧化铵的浓度b1、所述碳酸根的浓度c1的数据M；
    测量辅助模块，包括第二超声波浓度计，所述测量辅助模块用以接收所述显影液，并对所述显影液进行测量，以获得包括所述四甲基氢氧化铵的浓度b2、所述碳酸根的浓度c2的数据N；
    处理模块，用以接收所述数据M和数据N，并将所述数据M与所述数据N进行对比，以及根据所述数据M与所述数据N的差值是否处在目标范围内判定所述显影液浓度测量是否准确；
    压力机，用以为所述显影液的流动提供动力；
    其中，所述显影液通过所述压力机后流经测量管道，所述显影液通过所述测量管道流经所述光阻测量模块、所述浓度计测量模块以及所述测量辅助模块。
  15. 根据权利要求14所述的显影液浓度测量装置，其中，所述光阻测量模块包括：
    光源，用以提供第一光线；
    镜头和干涉滤光器，用以获得具有预定波长的第二光线；
    检出器，用以在第二光线穿过所述显影液后，测量所述第二光线的透过率，获得所述显影液的吸光度值，计算获取所述显影液的光阻的浓度a。
  16. 根据权利要求15所述的显影液浓度测量装置，其中，所述光阻测量模块还包括用以将所述透过率、所述吸光度值以及所述光阻浓度a显示的显示器。
  17. 根据权利要求14所述的显影液浓度测量装置，其中，所述浓度计测量模块还包括导电率计和温度计；
    其中，所述浓度计测量模块用以获取所述光阻的浓度a、所述四甲基氢氧化铵的浓度b1以及所述碳酸根的浓度c1的整体浓度A1，进而获取所述四甲基氢氧化铵的浓度b1和所述碳酸根的浓度c1。
  18. 根据权利要求17所述的显影液浓度测量装置，其中，所述第二超声波浓度计用于获取所述光阻的浓度a、所述四甲基氢氧化铵的浓度b2以及所述碳酸根的浓度c2的整体浓度A2；
    所述测量辅助模块还包括：
    对比单元，用以接收并对比所述A1和所述A2，若所述A1和所述A2的差值在预定范围内，则输出所述显影液浓度的各项测量值数据。
  19. 根据权利要求14所述的显影液浓度测量装置，其中，所述第一超声波浓度计和所述第二超声波浓度计并联，且所述第一超声波浓度计和所述第二超声波浓度计的排布方向相同，所述第一超声波浓度计和所述第二超声波浓度计通过不同的信号传输设备与所述处理模块进行信号输送。
  20. 根据权利要求14所述的显影液浓度测量装置，其中，还包括：
    取样模块，用以获取部分所述显影液以供浓度测量；
    真空模块，用以将所述管道模块内的杂物排出，以提供真空环境。
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