WO2020113620A1 - Method for manufacturing oled touch control display module - Google Patents

Method for manufacturing oled touch control display module Download PDF

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Publication number
WO2020113620A1
WO2020113620A1 PCT/CN2018/120330 CN2018120330W WO2020113620A1 WO 2020113620 A1 WO2020113620 A1 WO 2020113620A1 CN 2018120330 W CN2018120330 W CN 2018120330W WO 2020113620 A1 WO2020113620 A1 WO 2020113620A1
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Prior art keywords
oled
display panel
display module
touch electrode
manufacturing
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PCT/CN2018/120330
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French (fr)
Chinese (zh)
Inventor
李志成
Original Assignee
信利光电股份有限公司
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Publication of WO2020113620A1 publication Critical patent/WO2020113620A1/en

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    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412Digitisers structurally integrated in a display
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/40OLEDs integrated with touch screens
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

Definitions

  • the present invention relates to the field of display technology, and in particular to a method for manufacturing an OLED touch display module.
  • OLED display technology is widely used because it has the advantages of all-solid-state active light emission, good temperature characteristics, low power consumption, fast response, flexible folding, ultra-thin and so on. 5
  • OLED touch display modules integrate touch function, most of them adopt the method of attaching another layer of touch screen sensor between the OLED display panel and the cover plate.
  • this increases the weight and thickness of electronic products, which cannot meet the increasingly thin and thin electronic product design requirements.
  • ON CELL that is, a scheme for plating a touch layer directly on the packaging cover or substrate of the OLED display panel.
  • the existing ON CELL process is complicated and the production efficiency is low. Summary of the invention
  • the technical problem to be solved by the present invention is to provide a method for manufacturing an OLED touch display module, simplify the manufacturing process, and improve production efficiency.
  • the present invention provides a method for manufacturing an OLED touch display module, including the following steps:
  • Step 1 Provide the packaged OLED display panel
  • Step 2 forming a touch electrode layer on the OLED display panel by a magnetron sputtering coating system
  • Step 3 The touch electrode layer is etched to form a touch electrode pattern.
  • the step 2 includes:
  • Step 2.1 Remove the incidental gas on the OLED display panel and the substrate holder through the film feed cavity and/or buffer cavity of the magnetron sputtering coating system;
  • Step 2.2 forming a touch control circuit on the OLED display panel by a coating cavity of a magnetron sputtering coating system Polar layer.
  • the vacuum degree of the film feed cavity and/or buffer cavity is controlled to match the vacuum degree of the inner cavity of the OLED display panel.
  • the vacuum degree of the film feed cavity and/or buffer cavity is less than or equal to 5.0E-2Pa.
  • the vacuum degree of the inner cavity of the OLED display panel is -25KPa-35 KPa.
  • the specific operation of the step 2.2 is: in the coating chamber of the magnetron sputtering coating system, the target material is sputtered to the OLED by means of vacuum magnetron sputtering A touch electrode layer is formed on the display panel, wherein the heating temperature of the coating cavity is lower than 25°C, and the temperature of the target position during the coating process is lower than 80°C.
  • the step 3 includes:
  • Step 3.1 Coating photoresist on the touch electrode layer.
  • Step 3.2 Expose and develop the photoresist to form a photoresist electrode pattern
  • Step 3.3 Use the etching solution to etch the touch electrode layer to form a touch electrode pattern.
  • the OLED display panel includes a plurality of sub-display panels; after step 3, the method further includes:
  • Step 4 Cutting the plated OLED display panel to form a plurality of semi-finished OLED touch display modules
  • Step 5 Separately remove the photoresist covering the touch electrode pattern on each semi-finished OLED touch display module to form an OLED touch display module.
  • the touch electrode layer is formed on the side of the OLED substrate facing away from the cover plate of the OLED package.
  • step 1 and step 2 further includes: sealing the edge of the OLED display panel.
  • the present invention provides an OLED touch display module manufacturing method by making the OLE package completed D.
  • the touch electrode layer is plated on the display panel and etched to form the touch electrode pattern, which can effectively avoid the need to protect the formed touch electrode pattern from complex acid, alkali, and scratch protection when making the 0 LED functional layer. , Thereby effectively simplifying the process steps and difficulty, and improving production efficiency.
  • the vacuum degree of the film feeding cavity and/or the buffer cavity to match the vacuum degree of the inner cavity of the OLED display panel, it is effectively ensured that the OLED display panel will not cause product rupture due to excessive pressure difference between the inside and outside of the box, and at the same time Realize the effect of removing gas and ensure that the product is not easy to break, and ensure the quality of the product;
  • the temperature of the coating cavity it is ensured that the OLED display panel can not be damaged by high temperature during the formation of the touch electrode layer, and the product quality and Yield rate;
  • the use of oxalic acid etching solution can effectively ensure the formation of touch electrode patterns.
  • FIG. 1 is a flowchart of a method for manufacturing an OLH) touch display module provided by the present invention.
  • Embodiment One shows a method for manufacturing an OLED touch display module provided by the present invention, which includes the following steps: Step 1: Provide an OLED display panel with packaging completed; Step 2: Splash by magnetron An injection coating system forms a touch electrode layer on the OLED display panel; Step 3: Etching the touch electrode layer to form a touch electrode pattern.
  • the process can be effectively simplified and the production efficiency can be improved.
  • the existing method for manufacturing the OLED functional layer after making the touch electrode pattern on the substrate it can effectively avoid the complex acid resistance, alkali resistance and resistance to the already formed touch electrode pattern when manufacturing the OLED functional layer Scratches and other protections, which effectively simplifies the process steps and difficulties, and improves production efficiency.
  • the touch electrode layer is formed on the side of the OLED substrate facing away from the cover plate of the OLE D package, in this embodiment, the light exit side of the OLED display panel It is the side of the OLED substrate, that is, the touch electrode layer is plated on the light emitting side of the OLED display panel.
  • step 1 and step 2 further includes: sealing the edge of the OLED display panel.
  • the edge of the OLED display panel is sealed by using UV glue to seal the edge positions of the OLED substrate and the OLED package cover in the OLED display panel.
  • the step 1 may include: step 1.1, making an OLED substrate and an OL ED package cover plate; step 1.2, encapsulating the OLED substrate and the OLED package cover plate to form an OLED display panel.
  • fabricating the OLED substrate may include: forming an anode trace on the substrate, and then sequentially fabricating a pixel isolation grid, an isolation pillar, an organic layer, and a cathode trace; specifically, the anode trace may include ITO Traces and auxiliary metal traces; specifically, a pixel isolation grid may be formed by coating a positive photoresist, and then exposing and developing the positive photoresist.
  • the manufacturing of the OLED package cover plate may include the following steps: cleaning and drying the package cover plate substrate; applying UV sealant on the package cover plate substrate; coating the area enclosed by the UV frame glue on the package cover plate substrate
  • the cloth desiccant forms the OLED package cover.
  • the OLED display panel may be a PMOLED display panel, and of course it may also be an AMOLED display panel, which is not limited in the present invention.
  • the step 2 includes: Step 2.1: by magnetron sputtering coating system Entering the film cavity and/or buffer cavity to remove incidental gas on the OLED display panel and the substrate holder; Step 2.2: Form a touch electrode layer on the OLED display panel through a coating cavity of a magnetron sputtering coating system. That is, before the OLE D display panel is fed into the coating cavity to form the touch electrode layer, the film cavity and/or the buffer cavity are firstly passed to remove the water vapor, nitrogen and other impurities, so as to effectively avoid the influence of the impurities and sputtering The deposited touch electrode layer forms too many defects, which seriously affects the optical and electrical properties and guarantees product quality.
  • the vacuum degree of the film advancement cavity and/or the buffer cavity is controlled to match the vacuum degree of the inner cavity of the OL ED display panel, due to entering the film advancement cavity and the buffer cavity Of the OLED display panel has been packaged, and the packaged OLED display panel forms a certain inner cavity, so that the vacuum degree of the film insertion cavity and the buffer cavity matches the inner cavity vacuum of the OLED display panel, which can effectively ensure the OLED display panel No product rupture will occur due to excessive pressure difference between the inside and outside of the box to ensure product quality; specifically, it may be controlled that the vacuum degree of the film feed chamber and/or buffer chamber is less than or equal to 5.0E-2Pa, that is, in the film feed chamber and /Or the vacuum degree of the buffer cavity is not greater than 5.0E-2Pa, which can effectively ensure that the OLED display panel is not easily broken; preferably, the vacuum degree of the film feeding cavity and/or the buffer cavity can be maintained at 5.0E-2Pa, Effectively balance the effect of removing
  • the vacuum degree of the internal cavity of the OLED display panel is -25KPa ⁇ -35KPa, that is, it is lower than 1 atmospheric pressure, and the actual pressure is 75KPa ⁇ 65KPa.
  • This matching of vacuum degree can effectively ensure that the OLED display panel will not be cracked or deformed, and at the same time, it can effectively achieve the purpose of removing impurities.
  • the specific operation of the step 2.2 is: in the coating chamber of the magnetron sputtering coating system, the target material is sputtered onto the OLED display panel by vacuum magnetron sputtering to form a touch
  • the heating temperature of the coating chamber is lower than 25°C
  • the temperature of the target position during the coating process is lower than 80°C.
  • the other process parameters of the coating chamber may be a vacuum degree of 0.4-0.5 Pa, a flow rate of argon gas of 300-600 sccm, a flow rate of oxygen gas of 3-4 sccm, and the rake material is
  • the ITO rake material can effectively ensure the formation of the touch electrode layer.
  • the step 3 includes: Step 3.1: coating a photoresist on the touch electrode layer; specifically, the material of the photoresist is a positive photoresist with a thickness of 1-2um
  • the pre-baking temperature is 90-100°C.
  • Step 3.2 Expose and develop the photoresist to form a photoresist electrode pattern; specifically, a wavelength of ultraviolet light for exposure It is a mixed wavelength band of 365nm, 405nm and 436nm, the developer material for development is TMAH (2.38%-wt), and the post-baking temperature is 100 ⁇ 110°C;
  • Step 3.3 Use an etching solution to the touch electrode layer Etching to form a touch electrode pattern.
  • the material of the etching solution is oxalic acid
  • the temperature is 40-45 degrees
  • the time is 180-300S.
  • the etching time may be performed according to the thickness of the specific touch electrode layer. Adjustment. In this way, since the low-temperature manufacturing process is used to manufacture the touch electrode layer in this embodiment, the etching solution using the oxalic acid material can effectively ensure the etching effect and the formation of the touch electrode pattern.
  • the manufacturing method of the OLED touch display module provided in this embodiment, by making the packaged OLE D display panel by plating a touch electrode layer and etching to form a touch electrode pattern, can effectively avoid making 0 LED In the functional layer, it is necessary to protect the formed touch electrode patterns with complex acid resistance, alkali resistance, scratch resistance, etc., thereby effectively simplifying the process steps and difficulties, and improving production efficiency.
  • the vacuum degree of the film feeding cavity and/or the buffer cavity to match the vacuum degree of the inner cavity of the OLED display panel, it is effectively ensured that the OLED display panel will not cause product rupture due to excessive pressure difference between the inside and outside of the box, and at the same time
  • the temperature of the coating cavity it is ensured that the OLED display panel can not be damaged by high temperature during the formation of the touch electrode layer, ensuring product quality and Yield rate;
  • an etching solution of oxalic acid material By using an etching solution of oxalic acid material, the formation of touch electrode patterns can be effectively ensured.
  • the principle of this embodiment is the same as the previous embodiment, and the steps are similar.
  • the OLED display panel includes multiple sub-display panels; after step 3, the method further includes: Step 4: The OLED display panel after plating the touch electrode pattern is cut to form a plurality of semi-finished OLED touch display modules; Step 5: Removal of the photolithography covering the touch electrode patterns on each semi-finished OLED touch display module Glue to form an OLED touch display module.
  • the packaged OLED display panel provided in this embodiment is a large board, so that the touch electrode patterns are simultaneously formed on the large board and then cut, then multiple OLED touch display modules can be realized at the same time. Production, effectively improve production efficiency.
  • the photoresist covering the touch electrode pattern is not removed temporarily, but is cut in step 4 to form a plurality of OLED touch display models
  • the photoresist on the semi-finished products of each OLED touch display module is removed in step 5, which can effectively ensure that the touch electrode pattern has light during the cutting process
  • the protection of the resist is not easy to be damaged, which effectively guarantees the product quality and yield.

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
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Abstract

A method for manufacturing an OLED touch control display module, the method comprising the following steps: step 1: providing a packaged OLED display panel; step 2: forming a touch control electrode layer on the OLED display panel by means of a magnetron-sputtering film-plating system; and step 3: etching the touch control electrode layer to form a touch control electrode pattern. According to the method for manufacturing an OLED touch control display module, the touch control electrode layer is plated on the packaged OLED display panel and is etched to form the touch control electrode pattern; complex protection such as acid resistance, alkali resistance and scratch resistance having to be performed on the formed touch control electrode pattern can be effectively avoided when an OLED functional layer is manufactured, so the process steps and difficulty are effectively simplified, and production efficiency is improved.

Description

说明书 发明名称:一种 OLED触控显示模组的制作方法 技术领域 Specification Name of the invention: a method for manufacturing an OLED touch display module Technical Field
[0001] 本发明涉及了显示技术领域, 特别是涉及了 OLED触控显示模组的制作方法。 [0001] The present invention relates to the field of display technology, and in particular to a method for manufacturing an OLED touch display module.
背景技术 Background technique
[0002] OLED显示技术因具备全固态主动发光、 温度特性好、 功耗较小、 响应快、 可 弯曲折叠、 超轻薄等优点, 而得到广泛应用。 5见有的 OLED触控显示模组在集成 触摸功能时, 多数都是采用在 OLED显示面板和盖板之间另外貼附一层触摸屏感 应器的方式。 但是这样增加了电子产品的重量和厚度, 不能满足日趋轻薄化的 电子产品设计需求。 现也有提出了 ON CELL的技术方案, 即直接在 OLED显示面 板的封装盖板或者基板上镀制触控层的方案, 但是现有的 ON CELL工艺复杂, 生产效率低。 发明概述 [0002] OLED display technology is widely used because it has the advantages of all-solid-state active light emission, good temperature characteristics, low power consumption, fast response, flexible folding, ultra-thin and so on. 5 When some OLED touch display modules integrate touch function, most of them adopt the method of attaching another layer of touch screen sensor between the OLED display panel and the cover plate. However, this increases the weight and thickness of electronic products, which cannot meet the increasingly thin and thin electronic product design requirements. There are also technical solutions for ON CELL, that is, a scheme for plating a touch layer directly on the packaging cover or substrate of the OLED display panel. However, the existing ON CELL process is complicated and the production efficiency is low. Summary of the invention
技术问题 technical problem
问题的解决方案 Solution to the problem
技术解决方案 Technical solution
[0003] 本发明所要解决的技术问题是能够提供一种 OLED触控显示模组的制作方法, 简化制作工艺, 提高生产效率。 [0003] The technical problem to be solved by the present invention is to provide a method for manufacturing an OLED touch display module, simplify the manufacturing process, and improve production efficiency.
[0004] 为解决上述技术问题, 本发明提供了一种 OLED触控显示模组的制作方法, 包 括以下步骤: [0004] To solve the above technical problems, the present invention provides a method for manufacturing an OLED touch display module, including the following steps:
[0005] 步骤 1 : 提供封装完成的 OLED显示面板; [0005] Step 1: Provide the packaged OLED display panel;
[0006] 步骤 2: 通过磁控溅射镀膜系统在所述 OLED显示面板上形成触控电极层; [0006] Step 2: forming a touch electrode layer on the OLED display panel by a magnetron sputtering coating system;
[0007] 步骤 3: 对所述触控电极层进行蚀刻形成触控电极图案。 [0007] Step 3: The touch electrode layer is etched to form a touch electrode pattern.
[0008] 作为本发明的一种优选方案, 所述步骤 2包括: [0008] As a preferred solution of the present invention, the step 2 includes:
[0009] 步骤 2.1 : 通过磁控溅射镀膜系统的进片腔和 /或缓冲腔去除 OLED显示面板和基 片架上的附带杂气; [0009] Step 2.1: Remove the incidental gas on the OLED display panel and the substrate holder through the film feed cavity and/or buffer cavity of the magnetron sputtering coating system;
[0010] 步骤 2.2: 通过磁控溅射镀膜系统的镀膜腔在所述 OLED显示面板上形成触控电 极层。 [0010] Step 2.2: forming a touch control circuit on the OLED display panel by a coating cavity of a magnetron sputtering coating system Polar layer.
[0011] 作为本发明的一种优选方案, 在所述步骤 2.1中, 所述进片腔和 /或缓冲腔的真 空度控制为与所述 OLED显示面板的内腔真空度匹配。 [0011] As a preferred solution of the present invention, in the step 2.1, the vacuum degree of the film feed cavity and/or buffer cavity is controlled to match the vacuum degree of the inner cavity of the OLED display panel.
[0012] 作为本发明的一种优选方案, 所述进片腔和 /或缓冲腔的真空度小于或等于 5.0E -2Pa。 [0012] As a preferred solution of the present invention, the vacuum degree of the film feed cavity and/or buffer cavity is less than or equal to 5.0E-2Pa.
[0013] 作为本发明的一种优选方案, 所述 OLED显示面板的内腔真空度为 -25KPa— 35 KPa。 [0013] As a preferred solution of the present invention, the vacuum degree of the inner cavity of the OLED display panel is -25KPa-35 KPa.
[0014] 作为本发明的一种优选方案, 所述步骤 2.2的具体操作为: 在磁控溅射镀膜系统 的镀膜腔中, 通过真空磁控溅射的方式将靶材溅射至所述 OLED显示面板上形成 触控电极层, 其中, 所述镀膜腔的加热温度为低于 25°C, 镀膜过程靶位的温度为 低于 80°C。 [0014] As a preferred solution of the present invention, the specific operation of the step 2.2 is: in the coating chamber of the magnetron sputtering coating system, the target material is sputtered to the OLED by means of vacuum magnetron sputtering A touch electrode layer is formed on the display panel, wherein the heating temperature of the coating cavity is lower than 25°C, and the temperature of the target position during the coating process is lower than 80°C.
[0015] 作为本发明的一种优选方案, 所述步骤 3包括: [0015] As a preferred solution of the present invention, the step 3 includes:
[0016] 步骤 3.1 : 在所述触控电极层上涂布光刻胶。 [0016] Step 3.1: Coating photoresist on the touch electrode layer.
[0017] 步骤 3.2: 对所述光刻胶进行曝光显影形成光刻电极图案; [0017] Step 3.2: Expose and develop the photoresist to form a photoresist electrode pattern;
[0018] 步骤 3.3: 使用刻蚀液对所述触控电极层进行蚀刻, 形成触控电极图案。 [0018] Step 3.3: Use the etching solution to etch the touch electrode layer to form a touch electrode pattern.
[0019] 作为本发明的一种优选方案, 所述 OLED显示面板包括多个子显示面板; 所述 步骤 3之后还包括: [0019] As a preferred solution of the present invention, the OLED display panel includes a plurality of sub-display panels; after step 3, the method further includes:
[0020] 步骤 4: 将镀制完成触控电极图案后的 OLED显示面板切割形成多个 OLED触控 显示模组半成品; [0020] Step 4: Cutting the plated OLED display panel to form a plurality of semi-finished OLED touch display modules;
[0021] 步骤 5: 分别去除每个 OLED触控显示模组半成品上覆盖于触控电极图案上的光 刻胶, 形成 OLED触控显示模组。 [0021] Step 5: Separately remove the photoresist covering the touch electrode pattern on each semi-finished OLED touch display module to form an OLED touch display module.
[0022] 作为本发明的一种优选方案, 所述触控电极层形成于所述 OLED基板背向所述 OLED封装盖板一侧。 [0022] As a preferred solution of the present invention, the touch electrode layer is formed on the side of the OLED substrate facing away from the cover plate of the OLED package.
[0023] 作为本发明的一种优选方案, 所述步骤 1与步骤 2之间还包括: 将所述 OLED显 示面板的边缘密封。 [0023] As a preferred solution of the present invention, between step 1 and step 2 further includes: sealing the edge of the OLED display panel.
发明的有益效果 Beneficial effects of invention
有益效果 Beneficial effect
[0024] 本发明提供的一种 OLED触控显示模组的制作方法通过使得在封装完成的 OLE D显示面板上镀制触控电极层并蚀刻形成触控电极图案, 能够有效避免在制作 0 LED功能层时需要对已经形成的触控电极图案进行复杂的耐酸、 耐碱和耐划伤等 保护, 从而有效简化了工艺步骤和难度, 提高了生产效率。 此外, 通过使得进 片腔和 /或缓冲腔的真空度控制为与所述OLED显示面板的内腔真空度匹配, 有效 保证了OLED显示面板不会因为盒内外压力差过大出现产品破裂, 同时实现去除 杂气的效果和保证产品不易破裂的效果, 保证产品质量; 通过控制镀膜腔的温 度, 保证了OLED显示面板能够在形成触控电极层的过程中不会受到高温破坏, 保证产品质量和良品率; 通过使用草酸材料的刻蚀液能够有效保证触控电极图 案的形成。 [0024] The present invention provides an OLED touch display module manufacturing method by making the OLE package completed D. The touch electrode layer is plated on the display panel and etched to form the touch electrode pattern, which can effectively avoid the need to protect the formed touch electrode pattern from complex acid, alkali, and scratch protection when making the 0 LED functional layer. , Thereby effectively simplifying the process steps and difficulty, and improving production efficiency. In addition, by controlling the vacuum degree of the film feeding cavity and/or the buffer cavity to match the vacuum degree of the inner cavity of the OLED display panel, it is effectively ensured that the OLED display panel will not cause product rupture due to excessive pressure difference between the inside and outside of the box, and at the same time Realize the effect of removing gas and ensure that the product is not easy to break, and ensure the quality of the product; by controlling the temperature of the coating cavity, it is ensured that the OLED display panel can not be damaged by high temperature during the formation of the touch electrode layer, and the product quality and Yield rate; The use of oxalic acid etching solution can effectively ensure the formation of touch electrode patterns.
对附图的简要说明 Brief description of the drawings
附图说明 BRIEF DESCRIPTION
[0025] 图 1为本发明提供的一种OLH)触控显示模组的制作方法的流程图。 [0025] FIG. 1 is a flowchart of a method for manufacturing an OLH) touch display module provided by the present invention.
发明实施例 Invention Example
本发明的实施方式 Embodiments of the invention
[0026] 为使本发明的目的, 技术方案和优点更加清楚, 下面结合附图对本发明实施方 式作进一步详细说明。 显然, 所描述的实施例是本发明的一部分实施例, 而不 是全部的实施例。 基于所描述的本发明的实施例, 本领域普通技术人员在无需 创造性劳动的前提下所获得的所有其他实施例, 都属于本发明保护的范围。 [0026] In order to make the technical solutions and advantages of the present invention clearer, the following describes the embodiments of the present invention in further detail with reference to the accompanying drawings. Obviously, the described embodiments are part of the embodiments of the present invention, but not all the embodiments. Based on the described embodiments of the present invention, all other embodiments obtained by a person of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.
[0027] 除非另外定义, 本发明使用的技术术语或者科学术语应当为本发明所属领域内 具有一般技能的人士所理解的通常意义。 本发明中使用的“第一”、 “第二”以及类 似的词语并不表示任何顺序、 数量或者重要性, 而只是用来区分不同的组成部 分。 在本发明的描述中, 需要理解的是, 若有术语“上”、 “下”、 “左”、 “右”等指 示的方位或位置关系为基于附图所示的方位或位置关系, 仅是为了便于描述本 发明和简化描述, 而不是指示或暗示所指的装置或元件必须具有特定的方位、 以特定的方位构造和操作, 因此附图中描述位置关系的用语仅用于示例性说明 , 不能理解为对本专利的限制, 对于本领域的普通技术人员而言, 可以根据具 体情况理解上述术语的具体含义。 [0027] Unless otherwise defined, the technical terms or scientific terms used in the present invention shall have the usual meanings understood by persons of ordinary skill in the field to which the present invention belongs. The terms "first", "second" and similar words used in the present invention do not indicate any order, quantity or importance, but are only used to distinguish different components. In the description of the present invention, it should be understood that if the terms "upper", "lower", "left", "right", etc. indicate the orientation or positional relationship is based on the orientation or positional relationship shown in the drawings, only In order to facilitate the description of the present invention and simplify the description, it does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, so the terms used to describe the positional relationship in the drawings are for illustrative purposes only. It should not be understood as a limitation to this patent. For those of ordinary skill in the art, the specific meaning of the above terms can be understood according to specific circumstances.
[0028] 实施例一 [0029] 如图 1所示, 其表示了本发明提供的一种 OLED触控显示模组的制作方法, 包括 以下步骤: 步骤 1 : 提供封装完成的 OLED显示面板; 步骤 2: 通过磁控溅射镀膜 系统在所述 OLED显示面板上形成触控电极层; 步骤 3: 对所述触控电极层进行 蚀刻形成触控电极图案。 Embodiment One [0029] As shown in FIG. 1, it shows a method for manufacturing an OLED touch display module provided by the present invention, which includes the following steps: Step 1: Provide an OLED display panel with packaging completed; Step 2: Splash by magnetron An injection coating system forms a touch electrode layer on the OLED display panel; Step 3: Etching the touch electrode layer to form a touch electrode pattern.
[0030] 这样, 由于是先将 OLED显示面板封装完成再将触控电极层直接镀制于封装完 成后的 OLED显示面板上, 从而能够有效简化工艺, 提高生产效率。 相对于现有 的在基板上制作触控电极图案后再翻转进行 OLED功能层的制作方法, 能够有效 避免制作 OLED功能层时需要对已经形成的触控电极图案进行复杂的耐酸、 耐碱 和耐划伤等保护, 从而有效简化了工艺步骤和难度, 提高了生产效率。 [0030] In this way, since the OLED display panel is packaged first and then the touch electrode layer is directly plated on the OLED display panel after the package is completed, the process can be effectively simplified and the production efficiency can be improved. Compared with the existing method for manufacturing the OLED functional layer after making the touch electrode pattern on the substrate, it can effectively avoid the complex acid resistance, alkali resistance and resistance to the already formed touch electrode pattern when manufacturing the OLED functional layer Scratches and other protections, which effectively simplifies the process steps and difficulties, and improves production efficiency.
[0031] 具体地, 在本实施例中, 所述触控电极层形成于所述 OLED基板背向所述 OLE D封装盖板一侧, 在本实施例中, 所述 OLED显示面板的出光侧为 OLED基板一 侧, 即触控电极层镀制于 OLED显示面板的出光侧。 所述步骤 1与步骤 2之间还包 括: 将所述 OLED显示面板的边缘密封。 优选地, 所述将所述 OLED显示面板的 边缘密封为使用 UV胶将 OLED显示面板中的 OLED基板和 OLED封装盖板的边缘 位置密封。 这样能够有效避免在后续步骤中, 触控电极层或触控电极图案的形 成过程中对 OLED显示面板进行清洗、 或者曝光显影蚀刻时有液体渗进造成 OLE D显示面板的外围线路造成腐蚀影响产品质量的问题。 [0031] Specifically, in this embodiment, the touch electrode layer is formed on the side of the OLED substrate facing away from the cover plate of the OLE D package, in this embodiment, the light exit side of the OLED display panel It is the side of the OLED substrate, that is, the touch electrode layer is plated on the light emitting side of the OLED display panel. Between step 1 and step 2 further includes: sealing the edge of the OLED display panel. Preferably, the edge of the OLED display panel is sealed by using UV glue to seal the edge positions of the OLED substrate and the OLED package cover in the OLED display panel. In this way, it is possible to effectively prevent the OLED display panel from being cleaned during the formation of the touch electrode layer or the touch electrode pattern in the subsequent steps, or liquid infiltration during exposure, development, etching, etc., causing corrosion of the peripheral circuit of the OLE D display panel and affecting the product The problem of quality.
[0032] 具体地, 在本实施例中, 所述步骤 1可以包括: 步骤 1.1、 制作 OLED基板和 OL ED封装盖板; 步骤 1.2、 将 OLED基板和 OLED封装盖板封装形成 OLED显示面板 。 具体地, 所述步骤 1.1中, 制作 OLED基板可以包括: 在基板上形成阳极走线, 继而依次制作像素隔离网格、 隔离柱、 有机层和阴极走线; 具体地, 阳极走线 可以包括 ITO走线和辅助金属走线; 具体地, 可以通过涂布正性光刻胶, 继而通 过对所述正性光刻胶进行曝光和显影形成像素隔离网格。 制作 OLED封装盖板可 以包括以下步骤: 清洁并烘干封装盖板基板; 在所述封装盖板基板上涂布 UV框 胶; 在所述封装盖板基板上 UV框胶围成的区域内涂布干燥剂形成 OLED封装盖 板。 需要说明的是, 所述 OLED显示面板可以是 PMOLED显示面板, 当然也可以 是 AMOLED显示面板, 本发明并不以此为限。 [0032] Specifically, in this embodiment, the step 1 may include: step 1.1, making an OLED substrate and an OL ED package cover plate; step 1.2, encapsulating the OLED substrate and the OLED package cover plate to form an OLED display panel. Specifically, in the step 1.1, fabricating the OLED substrate may include: forming an anode trace on the substrate, and then sequentially fabricating a pixel isolation grid, an isolation pillar, an organic layer, and a cathode trace; specifically, the anode trace may include ITO Traces and auxiliary metal traces; specifically, a pixel isolation grid may be formed by coating a positive photoresist, and then exposing and developing the positive photoresist. The manufacturing of the OLED package cover plate may include the following steps: cleaning and drying the package cover plate substrate; applying UV sealant on the package cover plate substrate; coating the area enclosed by the UV frame glue on the package cover plate substrate The cloth desiccant forms the OLED package cover. It should be noted that the OLED display panel may be a PMOLED display panel, and of course it may also be an AMOLED display panel, which is not limited in the present invention.
[0033] 具体地, 在本实施例中, 所述步骤 2包括: 步骤 2.1 : 通过磁控溅射镀膜系统的 进片腔和 /或缓冲腔去除 OLED显示面板和基片架上的附带杂气; 步骤 2.2: 通过 磁控溅射镀膜系统的镀膜腔在所述 OLED显示面板上形成触控电极层。 即在 OLE D显示面板送进镀膜腔形成触控电极层之间先通过进片腔和 /或缓冲腔, 进行水 汽、 氮气等杂气的去除, 从而可以有效避免受杂气的影响, 溅射沉积的触控电 极层形成过多的缺陷, 严重影响光学和电学性能, 保证产品质量。 [0033] Specifically, in this embodiment, the step 2 includes: Step 2.1: by magnetron sputtering coating system Entering the film cavity and/or buffer cavity to remove incidental gas on the OLED display panel and the substrate holder; Step 2.2: Form a touch electrode layer on the OLED display panel through a coating cavity of a magnetron sputtering coating system. That is, before the OLE D display panel is fed into the coating cavity to form the touch electrode layer, the film cavity and/or the buffer cavity are firstly passed to remove the water vapor, nitrogen and other impurities, so as to effectively avoid the influence of the impurities and sputtering The deposited touch electrode layer forms too many defects, which seriously affects the optical and electrical properties and guarantees product quality.
[0034] 具体地, 在所述步骤 2.1中, 所述进片腔和 /或缓冲腔的真空度控制为与所述 OL ED显示面板的内腔真空度匹配, 由于进入进片腔和缓冲腔的 OLED显示面板已 经封装完成, 封装完成的 OLED显示面板形成一定的内腔, 从而使得进片腔和缓 冲腔的真空度与所述 OLED显示面板的内腔真空度匹配可以有效保证了 OLED显 示面板不会因为盒内外压力差过大出现产品破裂, 保证产品质量; 具体地, 可 以是控制所述进片腔和 /或缓冲腔的真空度小于或等于 5.0E-2Pa, 即在进片腔和 / 或缓冲腔的真空度不大于 5.0E-2Pa的情况下可以有效保证 OLED显示面板不易破 裂; 优选地, 可以使所述进片腔和 /或缓冲腔的真空度保持为 5.0E-2Pa, 有效兼 顾去除杂气的效果和保证产品不易破裂的效果。 优选地, 所述 OLED显示面板的 内腔真空度为 -25KPa~-35KPa, 即其低于 1个大气压强, 实际压强为 75KPa~65KP a。 这种真空度的匹配能够有效保证 OLED显示面板不会出现破裂或者变形等情 况, 同时能够有效实现去除杂气的目的。 [0034] Specifically, in the step 2.1, the vacuum degree of the film advancement cavity and/or the buffer cavity is controlled to match the vacuum degree of the inner cavity of the OL ED display panel, due to entering the film advancement cavity and the buffer cavity Of the OLED display panel has been packaged, and the packaged OLED display panel forms a certain inner cavity, so that the vacuum degree of the film insertion cavity and the buffer cavity matches the inner cavity vacuum of the OLED display panel, which can effectively ensure the OLED display panel No product rupture will occur due to excessive pressure difference between the inside and outside of the box to ensure product quality; specifically, it may be controlled that the vacuum degree of the film feed chamber and/or buffer chamber is less than or equal to 5.0E-2Pa, that is, in the film feed chamber and /Or the vacuum degree of the buffer cavity is not greater than 5.0E-2Pa, which can effectively ensure that the OLED display panel is not easily broken; preferably, the vacuum degree of the film feeding cavity and/or the buffer cavity can be maintained at 5.0E-2Pa, Effectively balance the effect of removing impurities and the effect of ensuring that the product is not easily broken. Preferably, the vacuum degree of the internal cavity of the OLED display panel is -25KPa~-35KPa, that is, it is lower than 1 atmospheric pressure, and the actual pressure is 75KPa~65KPa. This matching of vacuum degree can effectively ensure that the OLED display panel will not be cracked or deformed, and at the same time, it can effectively achieve the purpose of removing impurities.
[0035] 具体地, 所述步骤 2.2的具体操作为: 在磁控溅射镀膜系统的镀膜腔中, 通过真 空磁控溅射的方式将靶材溅射至所述 OLED显示面板上形成触控电极层, 其中, 所述镀膜腔的加热温度为低于 25°C, 镀膜过程靶位的温度为低于 80°C。 这样, 一 方面保证了触控电极层的形成, 另一方面能够有效保证 OLED显示面板能够在形 成触控电极层的过程中不会受到高温破坏, 保证产品质量和良品率。 具体地, 在本实施例中, 镀膜腔的其他工艺参数可以为真空度为 0.4~0.5Pa, 通入氩气流 量为 300~600sccm, 通入的氧气流量为 3~4sccm, 所述耙材为 ITO耙材, 能够有效 保证触控电极层的形成。 [0035] Specifically, the specific operation of the step 2.2 is: in the coating chamber of the magnetron sputtering coating system, the target material is sputtered onto the OLED display panel by vacuum magnetron sputtering to form a touch For the electrode layer, the heating temperature of the coating chamber is lower than 25°C, and the temperature of the target position during the coating process is lower than 80°C. In this way, on the one hand, the formation of the touch electrode layer is ensured, and on the other hand, it can effectively ensure that the OLED display panel can not be damaged by high temperature during the process of forming the touch electrode layer, thereby ensuring product quality and yield. Specifically, in this embodiment, the other process parameters of the coating chamber may be a vacuum degree of 0.4-0.5 Pa, a flow rate of argon gas of 300-600 sccm, a flow rate of oxygen gas of 3-4 sccm, and the rake material is The ITO rake material can effectively ensure the formation of the touch electrode layer.
[0036] 具体地, 所述步骤 3包括: 步骤 3.1 : 在所述触控电极层上涂布光刻胶; 具体地 , 所述光刻胶的材料为正性光阻, 厚度为 l-2um, 预烘烤温度为 90-100°C。 步骤 3 .2: 对所述光刻胶进行曝光显影形成光刻电极图案; 具体地, 曝光用紫外光波长 为 365nm、 405nm和 436nm的混合波段, 显影用显影液材料为 TMAH(2.38%-wt), 后烘烤温度为 100~110°C; 步骤 3.3: 使用刻蚀液对所述触控电极层进行蚀刻, 形 成触控电极图案, 具体地, 所述刻蚀液的材料为草酸, 温度为 40-45度, 时间为 1 80-300S , 当然, 蚀刻时间可以根据具体触控电极层的形成厚度进行调整。 这样 , 由于在本实施例中使用低温制程实现了触控电极层的制作, 因此使用草酸材 料的刻蚀液能够有效保证蚀刻效果, 保证触控电极图案的形成。 [0036] Specifically, the step 3 includes: Step 3.1: coating a photoresist on the touch electrode layer; specifically, the material of the photoresist is a positive photoresist with a thickness of 1-2um The pre-baking temperature is 90-100°C. Step 3.2: Expose and develop the photoresist to form a photoresist electrode pattern; specifically, a wavelength of ultraviolet light for exposure It is a mixed wavelength band of 365nm, 405nm and 436nm, the developer material for development is TMAH (2.38%-wt), and the post-baking temperature is 100~110°C; Step 3.3: Use an etching solution to the touch electrode layer Etching to form a touch electrode pattern. Specifically, the material of the etching solution is oxalic acid, the temperature is 40-45 degrees, and the time is 180-300S. Of course, the etching time may be performed according to the thickness of the specific touch electrode layer. Adjustment. In this way, since the low-temperature manufacturing process is used to manufacture the touch electrode layer in this embodiment, the etching solution using the oxalic acid material can effectively ensure the etching effect and the formation of the touch electrode pattern.
[0037] 本实施例提供的 OLED触控显示模组的制作方法, 通过使得在封装完成的 OLE D显示面板上镀制触控电极层并蚀刻形成触控电极图案, 能够有效避免在制作 0 LED功能层时需要对已经形成的触控电极图案进行复杂的耐酸、 耐碱和耐划伤等 保护, 从而有效简化了工艺步骤和难度, 提高了生产效率。 此外, 通过使得进 片腔和 /或缓冲腔的真空度控制为与所述 OLED显示面板的内腔真空度匹配, 有效 保证了 OLED显示面板不会因为盒内外压力差过大出现产品破裂, 同时实现去除 杂气的效果和保证产品不易破裂的效果, 保证产品质量; 通过控制镀膜腔的温 度, 保证了 OLED显示面板能够在形成触控电极层的过程中不会受到高温破坏, 保证产品质量和良品率; 通过使用草酸材料的刻蚀液能够有效保证触控电极图 案的形成。 [0037] The manufacturing method of the OLED touch display module provided in this embodiment, by making the packaged OLE D display panel by plating a touch electrode layer and etching to form a touch electrode pattern, can effectively avoid making 0 LED In the functional layer, it is necessary to protect the formed touch electrode patterns with complex acid resistance, alkali resistance, scratch resistance, etc., thereby effectively simplifying the process steps and difficulties, and improving production efficiency. In addition, by controlling the vacuum degree of the film feeding cavity and/or the buffer cavity to match the vacuum degree of the inner cavity of the OLED display panel, it is effectively ensured that the OLED display panel will not cause product rupture due to excessive pressure difference between the inside and outside of the box, and at the same time To achieve the effect of removing gas and to ensure that the product is not easy to break, to ensure product quality; by controlling the temperature of the coating cavity, it is ensured that the OLED display panel can not be damaged by high temperature during the formation of the touch electrode layer, ensuring product quality and Yield rate; By using an etching solution of oxalic acid material, the formation of touch electrode patterns can be effectively ensured.
[0038] 实施例二 Embodiment 2
[0039] 本实施例与前一实施例原理相同, 步骤类似, 其区别仅在于, 在本实施例中, 所述 OLED显示面板包括多个子显示面板; 所述步骤 3之后还包括: 步骤 4: 将镀 制完成触控电极图案后的 OLED显示面板切割形成多个 OLED触控显示模组半成 品; 步骤 5: 分别去除每个 OLED触控显示模组半成品上覆盖于触控电极图案上 的光刻胶, 形成 OLED触控显示模组。 [0039] The principle of this embodiment is the same as the previous embodiment, and the steps are similar. The only difference is that, in this embodiment, the OLED display panel includes multiple sub-display panels; after step 3, the method further includes: Step 4: The OLED display panel after plating the touch electrode pattern is cut to form a plurality of semi-finished OLED touch display modules; Step 5: Removal of the photolithography covering the touch electrode patterns on each semi-finished OLED touch display module Glue to form an OLED touch display module.
[0040] 这样, 在本实施例中提供的封装完成的 OLED显示面板为大板, 从而在大板上 同时形成触控电极图案后进行切割, 就可以同时实现多个 OLED触控显示模组的 制作, 有效提高生产效率。 而且, 在本实施例中, 在步骤 3中蚀刻形成触控电极 图案后, 覆盖于触控电极图案的光刻胶暂不去除, 而是在步骤 4中进行切割形成 多个 OLED触控显示模组半成品后, 在步骤 5中分别对每个 OLED触控显示模组半 成品上的光刻胶进行去除, 这样可以有效保证触控电极图案在切割过程中有光 刻胶的保护, 不易受到损坏, 有效保证了产品质量和良品率。 [0040] In this way, the packaged OLED display panel provided in this embodiment is a large board, so that the touch electrode patterns are simultaneously formed on the large board and then cut, then multiple OLED touch display modules can be realized at the same time. Production, effectively improve production efficiency. Moreover, in this embodiment, after the touch electrode pattern is etched in step 3, the photoresist covering the touch electrode pattern is not removed temporarily, but is cut in step 4 to form a plurality of OLED touch display models After the semi-finished products are assembled, the photoresist on the semi-finished products of each OLED touch display module is removed in step 5, which can effectively ensure that the touch electrode pattern has light during the cutting process The protection of the resist is not easy to be damaged, which effectively guarantees the product quality and yield.
[0041] 以上所述实施例仅表达了本发明的实施方式, 其描述较为具体和详细, 但并不 能因此而理解为对本发明专利范围的限制, 但凡采用等同替换或等效变换的形 式所获得的技术方案, 均应落在本发明的保护范围之内。 [0041] The above-mentioned examples only express the implementation of the present invention, the description is more specific and detailed, but it should not be construed as a limitation of the patent scope of the present invention, which is obtained in the form of equivalent replacement or equivalent transformation All technical solutions should fall within the protection scope of the present invention.

Claims

权利要求书 Claims
[权利要求 1] 一种 OLED触控显示模组的制作方法, 其特征在于, 包括以下步骤: 步骤 1 : 提供封装完成的 OLED显示面板; [Claim 1] A method for manufacturing an OLED touch display module, comprising the following steps: Step 1: Provide an OLED display panel with complete packaging;
步骤 2: 通过磁控溅射镀膜系统在所述 OLED显示面板上形成触控电 极层; Step 2: forming a touch electrode layer on the OLED display panel by a magnetron sputtering coating system;
步骤 3: 对所述触控电极层进行蚀刻形成触控电极图案。 Step 3: Etching the touch electrode layer to form a touch electrode pattern.
[权利要求 2] 根据权利要求 1所述的 OLED触控显示模组的制作方法, 其特征在于 , 所述步骤 2包括: [Claim 2] The method for manufacturing an OLED touch display module according to claim 1, wherein the step 2 includes:
步骤 2.1 : 通过磁控溅射镀膜系统的进片腔和 /或缓冲腔去除 OLED显 示面板和基片架上的附带杂气; Step 2.1: Remove the incidental gas from the OLED display panel and the substrate holder through the entrance cavity and/or buffer cavity of the magnetron sputtering coating system;
步骤 2.2: 通过磁控溅射镀膜系统的镀膜腔在所述 OLED显示面板上形 成触控电极层。 Step 2.2: A touch electrode layer is formed on the OLED display panel through the coating cavity of the magnetron sputtering coating system.
[权利要求 3] 根据权利要求 2所述的所述 OLED触控显示模组的制作方法, 其特征 在于, 在所述步骤 2.1中, 所述进片腔和 /或缓冲腔的真空度控制为与 所述 OLED显示面板的内腔真空度匹配。 [Claim 3] The method for manufacturing the OLED touch display module according to claim 2, wherein in the step 2.1, the vacuum degree of the film feed cavity and/or buffer cavity is controlled as Match the vacuum degree of the inner cavity of the OLED display panel.
[权利要求 4] 根据权利要求 3所述的 OLED触控显示模组的制作方法, 其特征在于 , 所述进片腔和 /或缓冲腔的真空度小于或等于 5.0E-2Pa。 [Claim 4] The method for manufacturing the OLED touch display module according to claim 3, wherein the vacuum degree of the film feed cavity and/or buffer cavity is less than or equal to 5.0E-2Pa.
[权利要求 5] 根据权利要求 3所述的 OLED触控显示模组的制作方法, 其特征在于 , 所述 OLED显示面板的内腔真空度为 -25KPa~-35KPa。 [Claim 5] The method for manufacturing the OLED touch display module according to claim 3, wherein the vacuum degree of the inner cavity of the OLED display panel is -25KPa~-35KPa.
[权利要求 6] 根据权利要求 2所述的 OLED触控显示模组的制作方法, 其特征在于 , 所述步骤 2.2的具体操作为: 在磁控溅射镀膜系统的镀膜腔中, 通 过真空磁控溅射的方式将靶材溅射至所述 OLED显示面板上形成触控 电极层, 其中, 所述镀膜腔的加热温度为低于 25°C, 镀膜过程靶位的 温度为低于 80°C。 [Claim 6] The method for manufacturing the OLED touch display module according to claim 2, characterized in that the specific operation of step 2.2 is: in the coating chamber of the magnetron sputtering coating system, through vacuum magnetic The target material is sputtered onto the OLED display panel by a controlled sputtering method to form a touch electrode layer, wherein the heating temperature of the coating chamber is lower than 25°C, and the target temperature during the coating process is lower than 80° C.
[权利要求 7] 根据权利要求 1所述的 OLED触控显示模组的制作方法, 其特征在于 , 所述步骤 3包括: [Claim 7] The method for manufacturing the OLED touch display module according to claim 1, wherein the step 3 includes:
步骤 3.1 : 在所述触控电极层上涂布光刻胶; Step 3.1: Coating photoresist on the touch electrode layer;
步骤 3.2: 对所述光刻胶进行曝光显影形成光刻电极图案; 步骤 3.3: 使用刻蚀液对所述触控电极层进行蚀刻, 形成触控电极图 案。 Step 3.2: Expose and develop the photoresist to form a photoresist electrode pattern; Step 3.3: Use the etching solution to etch the touch electrode layer to form a touch electrode pattern.
[权利要求 8] 根据权利要求 1所述的 OLED触控显示模组的制作方法, 其特征在于 , 所述 OLED显示面板包括多个子显示面板; 所述步骤 3之后还包括 步骤 4: 将镀制完成触控电极图案后的 OLED显示面板切割形成多个 0 LED触控显示模组半成品; [Claim 8] The method for manufacturing an OLED touch display module according to claim 1, wherein the OLED display panel includes a plurality of sub-display panels; after the step 3, the method further includes a step 4: plating After finishing the touch electrode pattern, the OLED display panel is cut to form multiple semi-finished products of 0 LED touch display modules;
步骤 5: 分别去除每个 OLED触控显示模组半成品上覆盖于触控电极 图案上的光刻胶, 形成 OLED触控显示模组。 Step 5: Separately remove the photoresist covering the touch electrode pattern on each semi-finished OLED touch display module to form an OLED touch display module.
[权利要求 9] 根据权利要求 1所述的 OLED触控显示模组的制作方法, 其特征在于 , 所述触控电极层形成于所述 OLED基板背向所述 OLED封装盖板一 侧。 [Claim 9] The method for manufacturing an OLED touch display module according to claim 1, wherein the touch electrode layer is formed on a side of the OLED substrate facing away from the OLED package cover.
[权利要求 10] 根据权利要求 1所述的 OLED触控显示模组的制作方法, 其特征在于 , 所述步骤 1与步骤 2之间还包括: 将所述 OLED显示面板的边缘密封 [Claim 10] The method for manufacturing the OLED touch display module according to claim 1, characterized in that between step 1 and step 2 further comprises: sealing the edge of the OLED display panel
PCT/CN2018/120330 2018-12-06 2018-12-11 Method for manufacturing oled touch control display module WO2020113620A1 (en)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20180219181A1 (en) * 2014-08-31 2018-08-02 Lg Display Co., Ltd. Display Device with Micro Cover Layer and Manufacturing Method for the Same
CN108695441A (en) * 2017-04-05 2018-10-23 上海和辉光电有限公司 A kind of OLED display
CN108832028A (en) * 2018-06-11 2018-11-16 武汉华星光电半导体显示技术有限公司 A kind of preparation method and OLED display panel, display device of OLED display panel
CN108829287A (en) * 2018-06-21 2018-11-16 武汉华星光电半导体显示技术有限公司 Display panel and display device
CN108920012A (en) * 2018-08-01 2018-11-30 京东方科技集团股份有限公司 A kind of touch-control display panel, display device and preparation method thereof

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9673014B2 (en) * 2012-07-13 2017-06-06 Samsung Display Co., Ltd. Method of manufacturing display panel
CN105867668B (en) * 2015-01-23 2020-08-04 深圳莱宝高科技股份有限公司 Thin film processing method and touch panel manufacturing method
CN105810690B (en) * 2016-04-01 2020-05-08 京东方科技集团股份有限公司 Display substrate, manufacturing method thereof and display device
CN105948520A (en) * 2016-05-23 2016-09-21 信利光电股份有限公司 3D (three-dimensional) glass cover plate and method for manufacturing same
CN106569641A (en) * 2016-11-15 2017-04-19 惠州市宝明精工有限公司 Manufacturing method for ultrathin display touch integrated capacitive touch screen
CN206970710U (en) * 2017-06-28 2018-02-06 武汉科瑞达真空科技有限公司 A kind of vacuum system to display screen module continuous magnetron sputtering plated film

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20180219181A1 (en) * 2014-08-31 2018-08-02 Lg Display Co., Ltd. Display Device with Micro Cover Layer and Manufacturing Method for the Same
CN108695441A (en) * 2017-04-05 2018-10-23 上海和辉光电有限公司 A kind of OLED display
CN108832028A (en) * 2018-06-11 2018-11-16 武汉华星光电半导体显示技术有限公司 A kind of preparation method and OLED display panel, display device of OLED display panel
CN108829287A (en) * 2018-06-21 2018-11-16 武汉华星光电半导体显示技术有限公司 Display panel and display device
CN108920012A (en) * 2018-08-01 2018-11-30 京东方科技集团股份有限公司 A kind of touch-control display panel, display device and preparation method thereof

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