WO2020108417A1 - Method for adjusting measurement light path of scribe line position of grating ruling engine, and system for same - Google Patents

Method for adjusting measurement light path of scribe line position of grating ruling engine, and system for same Download PDF

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Publication number
WO2020108417A1
WO2020108417A1 PCT/CN2019/120450 CN2019120450W WO2020108417A1 WO 2020108417 A1 WO2020108417 A1 WO 2020108417A1 CN 2019120450 W CN2019120450 W CN 2019120450W WO 2020108417 A1 WO2020108417 A1 WO 2020108417A1
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laser
mirror
laser interferometer
grating
beam splitter
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PCT/CN2019/120450
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French (fr)
Chinese (zh)
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唐玉国
糜小涛
齐向东
于海利
巴音贺希格
张善文
于宏柱
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中国科学院长春光学精密机械与物理研究所
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Publication of WO2020108417A1 publication Critical patent/WO2020108417A1/en

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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • G02B5/1847Manufacturing methods
    • G02B5/1857Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material

Definitions

  • the present application relates to the technical field of the production of diffraction gratings, and in particular, to a method and system for adjusting the optical path of the position of the grating scribing machine.
  • Diffraction grating is an optical element that integrates dispersion, beam splitting, polarization and phase matching. It is widely used in the fields of spectrum analysis, precision measurement, optical communication and information processing.
  • the grating scoring machine is a master machine for manufacturing the grating master.
  • the positioning accuracy of the grating scoring machine will directly determine the quality of the grating.
  • grating scribing machines were almost in purely mechanical scribing.
  • the position of the grating groove was mainly positioned by a transmission system with a screw as the core.
  • the accuracy of the grating depends on the processing and assembly of various parts of the mechanical system To adjust the precision, but for the diffraction grating required by nanometer precision, the mechanical method is limited to improve the quality of the grating.
  • the grating scribing machine has entered a new era, that is, the era of photoelectric control.
  • the accuracy of the grating scribing machine and the quality of the grating are greatly improved.
  • the linear machining accuracy of the indexing guide cannot meet the requirements of the index.
  • the grating will make the grating The wavefront generates a fan-shaped error, which affects the performance of the grating.
  • a double-light path structure In order to eliminate the fan-shaped error caused by the linearity of the indexing guide, a double-light path structure is generally used, but the adjustment steps of the double-light path measurement structure are more complicated. Errors, leading to changes in the grating line density or new sector errors.
  • the main technical problem solved by this application is to provide a method for adjusting the optical path of the reticle position of the grating scribing machine.
  • a method for adjusting the optical path of the position of the scribe line of a grating scoring machine which includes the following steps:
  • Step S1 Install the cross target on the worktable of the grating scoring machine
  • Step S2 Install the laser at the first preset position, adjust the posture of the laser so that the laser emits a light beam on the cross target;
  • Step S3 Install the measuring mirror at the second preset position, and adjust the posture of the measuring mirror until the reflected beam and the incident beam of the measuring mirror coincide;
  • Step S4 Place the beam splitter at a third preset position, adjust the posture of the beam splitter, so that the light beam emitted by the laser irradiates the measuring mirror through the beam splitter;
  • Step S5. Install a folding mirror at a position parallel to the beam splitter, and the light beam emitted by the laser irradiates the measuring mirror through the folding mirror to adjust the posture of the folding mirror;
  • Step S6 Install a laser interferometer A between the beam splitter and the measuring mirror, install a laser interferometer B between the folding mirror and the measuring mirror, the laser interferometer A interferes with the laser Both receivers are installed on the instrument B, and the laser interferometer A and the laser interferometer B both emit two light spots at the receivers connected to each other, and adjust the attitude of the laser interferometer A and the laser interferometer B until the two The two light spots at the receiver are in a coincident position.
  • Step S1 includes step S11 and step S12;
  • Step S11 Connect the base of the cross target to the workbench
  • Step S12 Adjust the adjustment bracket of the cross target through the height adjustment knob, so that the horizontal line of the target of the cross target is adjusted to the set measurement plane.
  • Step S2 includes Step S21 and Step S22;
  • Step S21 slidingly connect the worktable to the indexing guide of the grating scoring machine, slide the worktable to one end of the indexing guide, adjust the attitude of the laser so that the beam emitted by the laser hits the center of the target;
  • Step S22 Slide the worktable to the other end of the indexing guide rail, and observe the position of the beam spot on the target, so that when the worktable runs back and forth at both ends of the indexing guide rail, by adjusting the laser posture, the beam spot is on the target If the position on is unchanged, the laser posture adjustment is completed, and the cross target is removed from the worktable.
  • the technical solution adopted in the embodiment of the present application further includes: in step S3, when the worktable is moved back and forth on both ends of the indexing guide rail, the posture of the measuring mirror is adjusted so that the reflected beam and the incident beam of the measuring mirror coincide, then the The posture adjustment is completed.
  • step S4 the beam splitter is located between the laser and the measuring mirror, the laser emits a light beam, and the posture of the beam splitter is adjusted, when the beam splitter does not affect the reflected beam and incident of the measuring mirror When the beams are coincident, the attitude adjustment of the beam splitter is completed.
  • the technical solution adopted in the embodiment of the present application further includes: in step S5, the laser beam incident on the measuring mirror through the beam splitter is blocked, and the beam is refracted on the folding mirror through the beam splitter and incident on the folding mirror On the measuring mirror, adjust the posture of the folding mirror. When the reflected beam of the measuring mirror coincides with the incident beam, the posture adjustment of the folding mirror is completed.
  • step S6 the laser interferometer A and the laser interferometer B are arranged in parallel, and both the laser interferometer A and the laser interferometer B are equipped with receivers, respectively adjusting the laser interferometer A and the In the posture of laser interferometer B, when the two spots at the receivers of laser interferometer A and laser interferometer B are in the coincident position, the posture adjustment of laser interferometer A and laser interferometer B is completed.
  • an adjustment system for measuring the optical path of the scribe line position of a grating scoring machine which is connected to the grating scoring machine, and includes a cross target, a laser, a measuring mirror, a beam splitter Folding mirror, laser interferometer A and laser interferometer B;
  • the cross target is connected to the workbench of the grating scoring machine, the beam splitter is between the laser and the measuring mirror, the folding mirror is parallel to the beam splitter, the laser interferometer A is between the beam splitter and the measuring mirror, and the laser interferometer B is between the folding mirror and the measuring mirror;
  • the laser uses a dual-frequency laser.
  • the technical solution adopted in the embodiment of the present application further includes: the measuring mirror adopts a plane mirror plated with a 200 nm aluminum film on the surface, and the PV accuracy of the surface profile is less than or equal to ⁇ /8.
  • a cross target includes a base for connecting to the workbench, an adjustment bracket and a target, the adjustment bracket is connected to the base, and the target is connected to the adjustment bracket At the top, the adjustment bracket is provided with a height adjustment knob.
  • the beneficial effect of the present application is: compared with the prior art, the measurement of two positions simultaneously measured by the measuring mirror in the present application is beneficial to reduce the change in the score density caused by the cosine error of the respective optical paths of the dual optical path structure or the new The sector error can minimize the influence of the cosine error on the quality of the grating.
  • This application is easy to implement and effectively improves the positioning accuracy of the scoring machine, thereby improving the performance index of the scoring grating.
  • FIG. 1 is a block diagram of steps of an embodiment of the present application
  • step S1 of the embodiment of the present application is a block diagram of the internal steps of step S1 of the embodiment of the present application.
  • step S2 of the embodiment of the present application.
  • FIG. 4 is a schematic diagram of a connection structure of an adjustment system of a scribe line position measuring optical path of a grating scoring machine of the present application;
  • FIG. 5 is a schematic structural diagram of a cross target of the present application.
  • the present application provides a method for adjusting the optical path of the scribe line position of a grating scoring machine, which includes the following steps:
  • Step S1 Install the cross target 10 on the workbench 8 of the grating scoring machine
  • Step S2 Install the laser 1 at the first preset position, adjust the attitude of the laser 1 so that the laser emits a beam of light on the cross target 10;
  • Step S3 Install the measuring mirror 7 at the second preset position, and adjust the posture of the measuring mirror 7 until the reflected beam of the measuring mirror 7 coincides with the incident beam;
  • Step S4 Place the beam splitter 2 at the third preset position, adjust the posture of the beam splitter 2, so that the light beam emitted by the laser 1 irradiates the measuring mirror 7 through the beam splitter 2;
  • Step S5. Install the folding mirror 3 at a position where the beam splitter 2 is parallel, and the light beam emitted by the laser 1 is irradiated on the measuring mirror 7 through the folding mirror 3 to adjust the posture of the folding mirror 3;
  • Step S6 Install a laser interferometer A (4) between the beam splitter 2 and the measuring mirror 7, and install a laser interferometer B (5) and a laser interferometer A (4) between the folding mirror 3 and the measuring mirror 7. Both the laser interferometer B (5) and the laser interferometer A (4) and the laser interferometer A (4) and the laser interferometer B (5) will emit two spots at the receiver 6 connected to the laser interferometer A ( 4) Perform attitude adjustment with the laser interferometer B (5) until the two light spots at the two receivers 6 are in the coincident position.
  • the third preset position is between the first preset position and the second preset position.
  • the beneficial effect of the present application is: compared with the prior art, the measurement of the two positions by the measuring mirror 7 at the same time in the present application is beneficial to reduce the change or newness of the score density caused by the cosine error of the respective optical paths of the dual optical path structure
  • the fan shape error of this application is easy to implement, which effectively improves the positioning accuracy of the scoring machine, and thus improves the performance index of the scoring grating.
  • step S1 includes step S11 and step S12;
  • Step S11 Connect the base 10-3 of the cross target 10 to the workbench 8;
  • Step S12 Adjust the adjustment bracket 10-2 of the cross target 10 by the height adjustment knob 10-4, so that the horizontal line of the target 10-1 of the cross target 10 is adjusted to the set measurement plane.
  • step S2 includes step S21 and step S22;
  • Step S21 Slide the worktable 8 on the indexing guide of the grating scoring machine, slide the worktable to one end of the indexing guide, adjust the posture of the laser 1 so that the beam emitted by the laser hits the center of the target 10-1;
  • Step S22 Slide the worktable 8 to the other end of the indexing guide rail, and observe the position of the beam spot on the target, so that when the worktable 8 runs back and forth at both ends of the indexing guide rail, by adjusting the attitude of the laser 1, the beam If the position of the light spot on the target remains unchanged, the posture of the laser 1 is adjusted, and the cross target is removed from the worktable.
  • step S3 when the worktable 8 is moved back and forth on both ends of the indexing rail, the posture of the measuring mirror 7 is adjusted so that the reflected beam of the measuring mirror 7 coincides with the incident beam, then the posture adjustment of the measuring mirror is completed .
  • step S4 the beam splitter 2 is located between the laser 1 and the measuring mirror 7, the laser 1 emits a light beam, and adjusts the attitude of the beam splitter 2, when the beam splitter 2 does not affect the reflected beam of the measuring mirror 7 and When the incident light beams coincide, the attitude adjustment of the beam splitter 2 is completed.
  • step S5 the laser beam incident on the measuring mirror 7 through the beam splitter 2 is blocked, and the beam is refracted on the folding mirror 3 through the beam splitter 1 and incident on the folding mirror 3
  • the posture of the folding mirror 3 is adjusted, and when the reflected light beam and the incident light beam of the measuring mirror 7 coincide, the posture adjustment of the folding mirror 3 is completed.
  • step S6 the laser interferometer A (4) and the laser interferometer B (5) are arranged in parallel, and both the laser interferometer A (4) and the laser interferometer B (5) are equipped with the receiver 6, Adjust the posture of laser interferometer A (4) and laser interferometer B (5) respectively, when the two spots at the receiver 6 of laser interferometer A (4) and laser interferometer B (5) are in the coincident position , The attitude adjustment of laser interferometer A (4) and laser interferometer B (5) is completed.
  • the present application also provides an adjustment system for measuring the optical path of the position of the grating scriber, which is connected to the grating scriber and includes a cross target 10, a laser 1, a measuring mirror 7, and a beam splitter Mirror 2, folding mirror 3, laser interferometer A (4) and laser interferometer B (5);
  • the cross target 10 is connected to the workbench 8 of the grating scribing machine, the beam splitter 2 is located in the laser 1 and the measuring mirror 7
  • the laser interferometer A (4) is between the beam splitter 2 and the measuring mirror 7, and the laser interferometer B (5) is between the folding mirror 3 and the measuring mirror 7.
  • laser 1 uses a dual-frequency laser.
  • the measuring mirror 7 uses a plane mirror coated with 200 nm aluminum film and the surface accuracy PV value is less than or equal to ⁇ /8; here the measuring mirror 7 uses only one surface coated with 200 nm aluminum film and the surface accuracy PV value is less than
  • a plane mirror equal to ⁇ /8 if two or more plane mirrors are used, different cosine errors are prone to occur. Therefore, using only one plane mirror can minimize the effect of the cosine error on the grating quality.
  • the laser interferometer A (4) and the laser interferometer B (5) are each equipped with a receiver 6.
  • the cross target 10 includes a base 10-3 for connection to the workbench 8, an adjustment bracket 10-2 and a target 10-1, and the adjustment bracket 10-2 is connected to the base 10-3 and the target 10 -1 is connected to the top of the adjustment bracket 10-2, and the adjustment bracket 10-2 is provided with a height adjustment knob 10-4.
  • This application provides an embodiment, which includes the following steps:
  • the posture adjustment of the beam splitter Place the beam splitter 2 in the design position between the laser 1 and the measuring mirror 7 and adjust the posture of the beam splitter 2 so that it does not affect the reflected beam and the incident beam of the measuring mirror 7.
  • Adjustment of the attitude of the folding mirror 3. Place the beam splitter 2 at the design position, block the laser beam B1 incident on the measurement through the beam splitter 2 to block, and the other laser beam B2 will enter the measurement mirror 7 through the folding mirror 3, adjust The posture of the folding mirror 3 causes the reflected light beam of the measuring mirror 7 to coincide with the incident light beam.

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  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
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Abstract

A method for adjusting a measurement light path of a scribe line position of a grating ruling engine, and a system for the same, pertaining to the technical field of diffraction grating manufacturing. The method comprises: installing a crosshair target element (10) on a work platform (8) of the grating ruling engine; installing a laser (1), the laser (1) emitting a beam on the crosshair target element (10), and adjusting an orientation of the laser (1); installing a measurement mirror (7), and adjusting an orientation of the measurement mirror (7); installing a beam splitter (2) between the laser (1) and the measurement mirror (7), a light beam emitted by the laser (1) being transmitted through the beam splitter (2) and irradiating the measurement mirror (7), and adjusting an orientation of the beam splitter (2); installing a deflection mirror (3) at a position parallel to the beam splitter (2), a light beam emitted by the laser (1) irradiating the measurement mirror (7) via the deflection mirror (3), and adjusting an orientation of the deflection mirror (3); and installing a laser interferometer A (4) between the beam splitter (2) and the measurement mirror (7), installing a laser interferometer B (5) between the deflection mirror (3) and the measurement mirror (7), and adjusting orientations of the laser interferometer A (4) and the laser interferometer B (5).

Description

一种光栅刻划机刻线位置测量光路的调整方法及其系统Method and system for adjusting optical path of grating line scribing machine position measurement 技术领域Technical field
本申请涉及衍射光栅制作技术领域,特别涉及一种光栅刻划机刻线位置测量光路的调整方法及其系统。The present application relates to the technical field of the production of diffraction gratings, and in particular, to a method and system for adjusting the optical path of the position of the grating scribing machine.
背景技术Background technique
衍射光栅是一种集色散性、分束、偏振和相位匹配为一身的光学元件,广泛应用于光谱分析、精密测量、光通讯和信息处理等领域。Diffraction grating is an optical element that integrates dispersion, beam splitting, polarization and phase matching. It is widely used in the fields of spectrum analysis, precision measurement, optical communication and information processing.
光栅刻划机是制作刻划光栅母板的母机,光栅刻划机的定位精度将直接决定刻划光栅的质量。在1947年以前,光栅刻划机几乎都处于纯机械刻划方式,光栅刻槽的位置主要是通过丝杠为核心的传动系统来定位的,光栅的精度取决于机械系统各零部件的加工和装调精度,但是对于纳米级精度要求的衍射光栅而言,机械方法对光栅质量的提高是有限的。The grating scoring machine is a master machine for manufacturing the grating master. The positioning accuracy of the grating scoring machine will directly determine the quality of the grating. Before 1947, grating scribing machines were almost in purely mechanical scribing. The position of the grating groove was mainly positioned by a transmission system with a screw as the core. The accuracy of the grating depends on the processing and assembly of various parts of the mechanical system To adjust the precision, but for the diffraction grating required by nanometer precision, the mechanical method is limited to improve the quality of the grating.
随着纳米精度的测量和控制技术的发展,光栅刻划机迈入了一个崭新的时代即光电控制时代,光栅刻划机的精度和刻划光栅的质量均得到了极大的提升。对于光栅刻划宽度大于300mm的大面积刻划光栅而言,由于分度导轨的直线性的机械加工精度不能满足指标要求,载有光栅毛坯的工作台在分度导轨运行时,将会使得光栅波前产生扇形误差,从而影响光栅的性能,为了消除分度导轨的直线性带来的扇形误差,一般采用的是双光路结构,但是双光路测量结构调整步骤比较复杂,调整不当将会产生余弦误差,导致光栅刻线密度的变化或产生新的扇形误差。With the development of nano-precision measurement and control technology, the grating scribing machine has entered a new era, that is, the era of photoelectric control. The accuracy of the grating scribing machine and the quality of the grating are greatly improved. For a large-area scoring grating with a grating scoring width greater than 300mm, the linear machining accuracy of the indexing guide cannot meet the requirements of the index. When the table with the grating blank is running on the indexing guide, the grating will make the grating The wavefront generates a fan-shaped error, which affects the performance of the grating. In order to eliminate the fan-shaped error caused by the linearity of the indexing guide, a double-light path structure is generally used, but the adjustment steps of the double-light path measurement structure are more complicated. Errors, leading to changes in the grating line density or new sector errors.
发明内容Summary of the invention
本申请主要解决的技术问题是提供一种光栅刻划机刻线位置测量光路的调整方法,通过分别调整激光器、测量镜、分束镜、折转镜、激光干涉仪A和激光干涉仪B的姿态,消除分度导轨的直线性带来的扇形误差的同时最小化余弦误差对光栅质量的影响;还提供一种光栅刻划机刻线位置测量光路的调整系统。The main technical problem solved by this application is to provide a method for adjusting the optical path of the reticle position of the grating scribing machine. By adjusting the laser, measuring mirror, beam splitter, folding mirror, laser interferometer A and laser interferometer B Attitude, it eliminates the sector error caused by the linearity of the indexing guide and minimizes the effect of the cosine error on the quality of the grating; it also provides an adjustment system for the position measurement optical path of the grating scribing machine.
为了解决上述问题,本申请提供了如下技术方案:In order to solve the above problems, this application provides the following technical solutions:
一种光栅刻划机刻线位置测量光路的调整方法,其中,包括如下步骤:A method for adjusting the optical path of the position of the scribe line of a grating scoring machine, which includes the following steps:
步骤S1、将十字靶安装在光栅刻划机的工作台上;Step S1: Install the cross target on the worktable of the grating scoring machine;
步骤S2、将激光器安装于第一预设位置,调整所述激光器的姿态使所述激光器发射光束射在所述十字靶上;Step S2: Install the laser at the first preset position, adjust the posture of the laser so that the laser emits a light beam on the cross target;
步骤S3、将测量镜安装于第二预设位置,调整所述测量镜的姿态,直至所述测量镜的反射光束和入射光束重合;Step S3: Install the measuring mirror at the second preset position, and adjust the posture of the measuring mirror until the reflected beam and the incident beam of the measuring mirror coincide;
步骤S4、将分束镜放置于第三预设位置,调整所述分束镜的姿态,使所述激光器发射的光束透过所述分束镜照射在所述测量镜上;Step S4: Place the beam splitter at a third preset position, adjust the posture of the beam splitter, so that the light beam emitted by the laser irradiates the measuring mirror through the beam splitter;
步骤S5、在分束镜平行的位置上安装折转镜,激光器发射的光束透过折转镜照射在测量镜上而对折转镜的姿态进行调整;Step S5. Install a folding mirror at a position parallel to the beam splitter, and the light beam emitted by the laser irradiates the measuring mirror through the folding mirror to adjust the posture of the folding mirror;
步骤S6、在所述分束镜与所述测量镜之间安装激光干涉仪A,在所述折转镜与所述测量镜之间安装激光干涉仪B,所述激光干涉仪A和激光干涉仪B均安装有接收器,所述激光干涉仪A和激光干涉仪B均会在各自连接的接收器处发出两光斑,对激光干涉仪A和激光干涉仪B进行姿态调整,直至两个所述接收器处的两光斑处于重合状态位置。Step S6: Install a laser interferometer A between the beam splitter and the measuring mirror, install a laser interferometer B between the folding mirror and the measuring mirror, the laser interferometer A interferes with the laser Both receivers are installed on the instrument B, and the laser interferometer A and the laser interferometer B both emit two light spots at the receivers connected to each other, and adjust the attitude of the laser interferometer A and the laser interferometer B until the two The two light spots at the receiver are in a coincident position.
本申请实施例采取的技术方案还包括:步骤S1包括步骤S11和步骤S12;The technical solution adopted in the embodiment of the present application further includes: Step S1 includes step S11 and step S12;
步骤S11、将十字靶的底座连接在工作台上;Step S11: Connect the base of the cross target to the workbench;
步骤S12、通过高度调解旋钮调解十字靶的调整支架,使十字靶的靶标的水平线调整到设定的测量平面上。Step S12: Adjust the adjustment bracket of the cross target through the height adjustment knob, so that the horizontal line of the target of the cross target is adjusted to the set measurement plane.
本申请实施例采取的技术方案还包括:步骤S2包括步骤S21和步骤S22;The technical solution adopted in the embodiment of the present application further includes: Step S2 includes Step S21 and Step S22;
步骤S21、将工作台滑动连接在光栅刻划机的分度导轨上,将工作台滑动到分度导轨的一端,调整激光器的姿态使激光器发射的光束射在靶标的中心;Step S21, slidingly connect the worktable to the indexing guide of the grating scoring machine, slide the worktable to one end of the indexing guide, adjust the attitude of the laser so that the beam emitted by the laser hits the center of the target;
步骤S22、将工作台滑动到分度导轨的另一端,观察光束的光斑在靶标上的位置,使得工作台来回运行于分度导轨的两端时,通过调整激光器的姿态,光束的光斑在靶标上的位置不变,则激光器的姿态调整完毕,将十字靶从工作台上移走。Step S22: Slide the worktable to the other end of the indexing guide rail, and observe the position of the beam spot on the target, so that when the worktable runs back and forth at both ends of the indexing guide rail, by adjusting the laser posture, the beam spot is on the target If the position on is unchanged, the laser posture adjustment is completed, and the cross target is removed from the worktable.
本申请实施例采取的技术方案还包括:在步骤S3中,使工作台来回运行于分度导轨的两端时,调整测量镜的姿态使得测量镜的反射光束和入射光束重合,则测量镜的姿态调整完毕。The technical solution adopted in the embodiment of the present application further includes: in step S3, when the worktable is moved back and forth on both ends of the indexing guide rail, the posture of the measuring mirror is adjusted so that the reflected beam and the incident beam of the measuring mirror coincide, then the The posture adjustment is completed.
本申请实施例采取的技术方案还包括:在步骤S4中,分束镜处于激光器和测量镜之间,激光器发射光束,调整分束镜的姿态,当分束镜不影响测量镜的反射光束和入射光束重合的状态时,则分束镜的姿态调整完毕。The technical solution adopted in the embodiment of the present application further includes: In step S4, the beam splitter is located between the laser and the measuring mirror, the laser emits a light beam, and the posture of the beam splitter is adjusted, when the beam splitter does not affect the reflected beam and incident of the measuring mirror When the beams are coincident, the attitude adjustment of the beam splitter is completed.
本申请实施例采取的技术方案还包括:在步骤S5中,将激光器通过分束镜入射到测量镜上的光束进行遮挡,光束通过分束镜折射到折转镜上,通过折转镜入射到测量镜上,调整折转镜的姿态,当使得测量镜的反射光束和入射光束重合时,则折转镜的姿态调整完毕。The technical solution adopted in the embodiment of the present application further includes: in step S5, the laser beam incident on the measuring mirror through the beam splitter is blocked, and the beam is refracted on the folding mirror through the beam splitter and incident on the folding mirror On the measuring mirror, adjust the posture of the folding mirror. When the reflected beam of the measuring mirror coincides with the incident beam, the posture adjustment of the folding mirror is completed.
本申请实施例采取的技术方案还包括:在步骤S6中,激光干涉仪A和激光干涉仪B平行设置,激光干涉仪A和激光干涉仪B均安装有接收器,分别调整激光干涉仪A和激光干涉仪B的姿态,当激光干涉仪A和激光干涉仪B的接收器处的两光斑均处于重合状态位置时,则激光干涉仪A和激光干涉仪B 的姿态调整完毕。The technical solution adopted in the embodiment of the present application further includes: In step S6, the laser interferometer A and the laser interferometer B are arranged in parallel, and both the laser interferometer A and the laser interferometer B are equipped with receivers, respectively adjusting the laser interferometer A and the In the posture of laser interferometer B, when the two spots at the receivers of laser interferometer A and laser interferometer B are in the coincident position, the posture adjustment of laser interferometer A and laser interferometer B is completed.
本申请实施例采取的又一技术方案为:一种光栅刻划机刻线位置测量光路的调整系统,其连接在光栅刻划机上,其中,包括十字靶、激光器、测量镜、分束镜、折转镜、激光干涉仪A和激光干涉仪B;十字靶连接在光栅刻划机的工作台上,分束镜处于激光器和测量镜之间,折转镜与分束镜平行,激光干涉仪A处于分束镜与测量镜之间,激光干涉仪B处于折转镜与测量镜之间;激光器采用双频激光器。Another technical solution adopted by the embodiments of the present application is as follows: an adjustment system for measuring the optical path of the scribe line position of a grating scoring machine, which is connected to the grating scoring machine, and includes a cross target, a laser, a measuring mirror, a beam splitter Folding mirror, laser interferometer A and laser interferometer B; the cross target is connected to the workbench of the grating scoring machine, the beam splitter is between the laser and the measuring mirror, the folding mirror is parallel to the beam splitter, the laser interferometer A is between the beam splitter and the measuring mirror, and the laser interferometer B is between the folding mirror and the measuring mirror; the laser uses a dual-frequency laser.
本申请实施例采取的技术方案还包括:测量镜采用一块表面镀制200nm铝膜且面型精度PV值小于或等于λ/8的平面镜。The technical solution adopted in the embodiment of the present application further includes: the measuring mirror adopts a plane mirror plated with a 200 nm aluminum film on the surface, and the PV accuracy of the surface profile is less than or equal to λ/8.
本申请实施例采取的技术方案还包括:十字靶包括用于连接在工作台上的底座、调整支架和靶标,所述调整支架连接在所述底座上,所述靶标连接在所述调整支架的顶端,所述调整支架上设置有高度调解旋钮。The technical solution adopted in the embodiment of the present application further includes: a cross target includes a base for connecting to the workbench, an adjustment bracket and a target, the adjustment bracket is connected to the base, and the target is connected to the adjustment bracket At the top, the adjustment bracket is provided with a height adjustment knob.
本申请的有益效果是:与现有技术相比,本申请通过测量镜同时测量两路位置的测量,有利于减小双光路结构的各自光路的余弦误差导致的刻线密度的变化或新的扇形误差,可以最小化余弦误差对光栅质量的影响,本申请易于实现,有效地提高了刻划机的定位精度,进而提高了刻划光栅的性能指标。The beneficial effect of the present application is: compared with the prior art, the measurement of two positions simultaneously measured by the measuring mirror in the present application is beneficial to reduce the change in the score density caused by the cosine error of the respective optical paths of the dual optical path structure or the new The sector error can minimize the influence of the cosine error on the quality of the grating. This application is easy to implement and effectively improves the positioning accuracy of the scoring machine, thereby improving the performance index of the scoring grating.
附图说明BRIEF DESCRIPTION
图1是本申请实施例的步骤框图;FIG. 1 is a block diagram of steps of an embodiment of the present application;
图2是本申请实施例的步骤S1的内部步骤框图;2 is a block diagram of the internal steps of step S1 of the embodiment of the present application;
图3是本申请实施例的步骤S2的内部步骤框图;3 is a block diagram of the internal steps of step S2 of the embodiment of the present application;
图4为本申请的光栅刻划机刻线位置测量光路的调整系统的连接结构示意图;FIG. 4 is a schematic diagram of a connection structure of an adjustment system of a scribe line position measuring optical path of a grating scoring machine of the present application;
图5为本申请的十字靶的结构示意图。5 is a schematic structural diagram of a cross target of the present application.
附图标记:1-激光器,2-分束镜,3-折转镜,4-激光干涉仪A,5-激光干涉仪B,6-接收器,7-测量镜,8-工作台,9-光栅毛坯,10-十字靶,10-1-靶标,10-2-调整支架,10-3-底座,10-4-高度调解旋钮。Reference signs: 1-laser, 2-beam splitter, 3-fold mirror, 4-laser interferometer A, 5-laser interferometer B, 6-receiver, 7-measuring mirror, 8-workbench, 9 -Grating blank, 10-cross target, 10-1-target, 10-2-adjustment bracket, 10-3-base, 10-4-height adjustment knob.
具体实施方式detailed description
现有技术中,双光路测量结构调整步骤比较复杂,调整不当将会产生余弦误差,导致光栅刻线密度的变化或产生新的扇形误差。In the prior art, the adjustment steps of the dual-optical path measurement structure are relatively complicated. Improper adjustments will produce cosine errors, resulting in changes in grating line density or new sector errors.
如图1至图3所示,本申请提供一种光栅刻划机刻线位置测量光路的调整方法,包括如下步骤:As shown in FIG. 1 to FIG. 3, the present application provides a method for adjusting the optical path of the scribe line position of a grating scoring machine, which includes the following steps:
步骤S1、将十字靶10安装在光栅刻划机的工作台8上;Step S1: Install the cross target 10 on the workbench 8 of the grating scoring machine;
步骤S2、将激光器1安装于第一预设位置,调整激光器1的姿态使激光器发射光束射在十字靶10上;Step S2: Install the laser 1 at the first preset position, adjust the attitude of the laser 1 so that the laser emits a beam of light on the cross target 10;
步骤S3、将测量镜7安装于第二预设位置,调整测量镜7的姿态,直至测量镜7的反射光束和入射光束重合;Step S3: Install the measuring mirror 7 at the second preset position, and adjust the posture of the measuring mirror 7 until the reflected beam of the measuring mirror 7 coincides with the incident beam;
步骤S4、将分束镜2放置于第三预设位置,调整分束镜2的姿态,使激光器1发射的光束透过分束镜2照射在测量镜7上;Step S4: Place the beam splitter 2 at the third preset position, adjust the posture of the beam splitter 2, so that the light beam emitted by the laser 1 irradiates the measuring mirror 7 through the beam splitter 2;
步骤S5、在分束镜2平行的位置上安装折转镜3,激光器1发射的光束透过折转镜3照射在测量镜7上而对折转镜3的姿态进行调整;Step S5. Install the folding mirror 3 at a position where the beam splitter 2 is parallel, and the light beam emitted by the laser 1 is irradiated on the measuring mirror 7 through the folding mirror 3 to adjust the posture of the folding mirror 3;
步骤S6、在分束镜2与测量镜7之间安装激光干涉仪A(4),在折转镜3与测量镜7之间安装激光干涉仪B(5),激光干涉仪A(4)和激光干涉仪B(5)均安装有接收器6,激光干涉仪A(4)和激光干涉仪B(5)均会在各自连接的接收器6处发出两光斑,对激光干涉仪A(4)和激光干涉仪B(5)进行姿态调整,直至两个接收器6处的两光斑处于重合状态位置。Step S6. Install a laser interferometer A (4) between the beam splitter 2 and the measuring mirror 7, and install a laser interferometer B (5) and a laser interferometer A (4) between the folding mirror 3 and the measuring mirror 7. Both the laser interferometer B (5) and the laser interferometer A (4) and the laser interferometer A (4) and the laser interferometer B (5) will emit two spots at the receiver 6 connected to the laser interferometer A ( 4) Perform attitude adjustment with the laser interferometer B (5) until the two light spots at the two receivers 6 are in the coincident position.
第三预设位置处于第一预设位置和第二预设位置之间。The third preset position is between the first preset position and the second preset position.
本申请的有益效果是:与现有技术相比,本申请通过测量镜7同时测量两路位置的测量,有利于减小双光路结构的各自光路的余弦误差导致的刻线密度的变化或新的扇形误差,本申请易于实现,有效地提高了刻划机的定位精度,进而提高了刻划光栅的性能指标。The beneficial effect of the present application is: compared with the prior art, the measurement of the two positions by the measuring mirror 7 at the same time in the present application is beneficial to reduce the change or newness of the score density caused by the cosine error of the respective optical paths of the dual optical path structure The fan shape error of this application is easy to implement, which effectively improves the positioning accuracy of the scoring machine, and thus improves the performance index of the scoring grating.
其中,步骤S1包括步骤S11和步骤S12;Wherein, step S1 includes step S11 and step S12;
步骤S11、将十字靶10的底座10-3连接在工作台8上;Step S11: Connect the base 10-3 of the cross target 10 to the workbench 8;
步骤S12、通过高度调解旋钮10-4调解十字靶10的调整支架10-2,使十字靶10的靶标10-1的水平线调整到设定的测量平面上。Step S12: Adjust the adjustment bracket 10-2 of the cross target 10 by the height adjustment knob 10-4, so that the horizontal line of the target 10-1 of the cross target 10 is adjusted to the set measurement plane.
进一步,步骤S2包括步骤S21和步骤S22;Further, step S2 includes step S21 and step S22;
步骤S21、将工作台8滑动连接在光栅刻划机的分度导轨上,将工作台滑动到分度导轨的一端,调整激光器1的姿态使激光器发射的光束射在靶标10-1的中心;Step S21: Slide the worktable 8 on the indexing guide of the grating scoring machine, slide the worktable to one end of the indexing guide, adjust the posture of the laser 1 so that the beam emitted by the laser hits the center of the target 10-1;
步骤S22、将工作台8滑动到分度导轨的另一端,观察光束的光斑在靶标上的位置,使得工作台8来回运行于分度导轨的两端时,通过调整激光器1的姿态,光束的光斑在靶标上的位置不变,则激光器1的姿态调整完毕,将十字靶从工作台上移走。Step S22: Slide the worktable 8 to the other end of the indexing guide rail, and observe the position of the beam spot on the target, so that when the worktable 8 runs back and forth at both ends of the indexing guide rail, by adjusting the attitude of the laser 1, the beam If the position of the light spot on the target remains unchanged, the posture of the laser 1 is adjusted, and the cross target is removed from the worktable.
在本申请中,在步骤S3中,使工作台8来回运行于分度导轨的两端时,调整测量镜7的姿态使得测量镜7的反射光束和入射光束重合,则测量镜的姿态调整完毕。In the present application, in step S3, when the worktable 8 is moved back and forth on both ends of the indexing rail, the posture of the measuring mirror 7 is adjusted so that the reflected beam of the measuring mirror 7 coincides with the incident beam, then the posture adjustment of the measuring mirror is completed .
在本申请中,在步骤S4中,分束镜2处于激光器1和测量镜7之间,激光器1发射光束,调整分束镜2的姿态,当分束镜2不影响测量镜7的反射光束和入射光束重合的状态时,则分束镜2的姿态调整完毕。In the present application, in step S4, the beam splitter 2 is located between the laser 1 and the measuring mirror 7, the laser 1 emits a light beam, and adjusts the attitude of the beam splitter 2, when the beam splitter 2 does not affect the reflected beam of the measuring mirror 7 and When the incident light beams coincide, the attitude adjustment of the beam splitter 2 is completed.
在本申请中,在步骤S5中,将激光器1通过分束镜2入射到测量镜7上的光束进行遮挡,光束通过分束镜1折射到折转镜3上,通过折转镜3入射到测量镜7上,调整折转镜3的姿态,当使得测量镜7的反射光束和入射光束重合时,则折转镜3的姿态调整完毕。In this application, in step S5, the laser beam incident on the measuring mirror 7 through the beam splitter 2 is blocked, and the beam is refracted on the folding mirror 3 through the beam splitter 1 and incident on the folding mirror 3 On the measuring mirror 7, the posture of the folding mirror 3 is adjusted, and when the reflected light beam and the incident light beam of the measuring mirror 7 coincide, the posture adjustment of the folding mirror 3 is completed.
在本申请中,在步骤S6中,激光干涉仪A(4)和激光干涉仪B(5)平行设置,激光干涉仪A(4)和激光干涉仪B(5)均安装有接收器6,分别调整激光干涉仪A(4)和激光干涉仪B(5)的姿态,当激光干涉仪A(4)和激光干涉仪B(5)的接收器6处的两光斑均处于重合状态位置时,则激光干涉仪A(4)和激光干涉仪B(5)的姿态调整完毕。In this application, in step S6, the laser interferometer A (4) and the laser interferometer B (5) are arranged in parallel, and both the laser interferometer A (4) and the laser interferometer B (5) are equipped with the receiver 6, Adjust the posture of laser interferometer A (4) and laser interferometer B (5) respectively, when the two spots at the receiver 6 of laser interferometer A (4) and laser interferometer B (5) are in the coincident position , The attitude adjustment of laser interferometer A (4) and laser interferometer B (5) is completed.
如图4和图5所示,本申请还提供一种光栅刻划机刻线位置测量光路的调整系统,其连接在光栅刻划机上,包括十字靶10、激光器1、测量镜7、分束镜2、折转镜3、激光干涉仪A(4)和激光干涉仪B(5);十字靶10连接在光栅刻划机的工作台8上,分束镜2处于激光器1和测量镜7之间,折转镜3与分束镜2平行,激光干涉仪A(4)处于分束镜2与测量镜7之间,激光干涉仪B(5)处于折转镜3与测量镜7之间;激光器1采用双频激光器。As shown in FIG. 4 and FIG. 5, the present application also provides an adjustment system for measuring the optical path of the position of the grating scriber, which is connected to the grating scriber and includes a cross target 10, a laser 1, a measuring mirror 7, and a beam splitter Mirror 2, folding mirror 3, laser interferometer A (4) and laser interferometer B (5); the cross target 10 is connected to the workbench 8 of the grating scribing machine, the beam splitter 2 is located in the laser 1 and the measuring mirror 7 Between the folding mirror 3 and the beam splitter 2, the laser interferometer A (4) is between the beam splitter 2 and the measuring mirror 7, and the laser interferometer B (5) is between the folding mirror 3 and the measuring mirror 7. Between; laser 1 uses a dual-frequency laser.
进一步,,测量镜7采用一块表面镀制200nm铝膜且面型精度PV值小于或等于λ/8的平面镜;此处测量镜7只采用一块表面镀制200nm铝膜且面型精度PV值小于或等于λ/8的平面镜,因如果采用两块或者两者以上的平面镜,容易出现不同的余弦误差,因此,只采用一块平面镜,可以最小化余弦误差对光栅质量的影响。Further, the measuring mirror 7 uses a plane mirror coated with 200 nm aluminum film and the surface accuracy PV value is less than or equal to λ/8; here the measuring mirror 7 uses only one surface coated with 200 nm aluminum film and the surface accuracy PV value is less than For a plane mirror equal to λ/8, if two or more plane mirrors are used, different cosine errors are prone to occur. Therefore, using only one plane mirror can minimize the effect of the cosine error on the grating quality.
如图4所示,在本申请中,激光干涉仪A(4)和激光干涉仪B(5)均安装有接收器6。As shown in FIG. 4, in this application, the laser interferometer A (4) and the laser interferometer B (5) are each equipped with a receiver 6.
如图5所示,十字靶10包括用于连接在工作台8上的底座10-3、调整支 架10-2和靶标10-1,调整支架10-2连接在底座10-3上,靶标10-1连接在调整支架10-2的顶端,调整支架10-2上设置有高度调解旋钮10-4。As shown in FIG. 5, the cross target 10 includes a base 10-3 for connection to the workbench 8, an adjustment bracket 10-2 and a target 10-1, and the adjustment bracket 10-2 is connected to the base 10-3 and the target 10 -1 is connected to the top of the adjustment bracket 10-2, and the adjustment bracket 10-2 is provided with a height adjustment knob 10-4.
本申请提供一个实施例,该实施例包括如下步骤:This application provides an embodiment, which includes the following steps:
一、激光器1姿态的调整。1. Adjustment of laser 1 attitude.
①、将十字靶10放置于光栅刻划机工作台设计位置处,然后通过高度调解旋钮10-4调整十字靶10的调整支架10-2,使得靶标10-1中的水平线位于设计的测量平面内;① Place the cross target 10 at the design position of the grating scribing machine table, and then adjust the adjustment bracket 10-2 of the cross target 10 by the height adjustment knob 10-4, so that the horizontal line in the target 10-1 is located in the designed measurement plane Inside;
②、将激光器1安装于设计位置处,将工作台8置于分度导轨的一端,调整激光器1的姿态,使得激光光束入射在十字靶10的中心,然后使工作台8运行到分度导轨的另一端,观察激光光斑在十字靶10上的位置,通过调整激光器1的姿态,使得工作台8来回运行于分度导轨最大行程的两端时,激光光斑在十字靶10上的位置不变,则激光器1姿态调整完毕。② Install the laser 1 at the design position, place the table 8 at one end of the index rail, adjust the attitude of the laser 1 so that the laser beam is incident on the center of the cross target 10, and then run the table 8 to the index rail At the other end, observe the position of the laser spot on the cross target 10, and adjust the posture of the laser 1 so that when the table 8 runs back and forth at both ends of the maximum travel of the index rail, the position of the laser spot on the cross target 10 does not change , The attitude adjustment of laser 1 is completed.
二、测量镜7姿态的调整。将测量镜7放置于设计位置处,使工作台8来回运行于分度导轨最大行程的两端时,调整测量镜7的姿态使得测量镜7反射的光束和入射光束重合。2. Adjustment of the attitude of the measuring mirror 7. When the measuring mirror 7 is placed at the design position and the worktable 8 is moved back and forth at both ends of the maximum stroke of the indexing rail, the posture of the measuring mirror 7 is adjusted so that the light beam reflected by the measuring mirror 7 coincides with the incident light beam.
三、分束镜2姿态的调整。将分束镜2置于激光器1和测量镜7之间的设计位置,调整分束镜2的姿态,使其不影响测量镜7反射光束和入射光束。3. The posture adjustment of the beam splitter 2. Place the beam splitter 2 in the design position between the laser 1 and the measuring mirror 7 and adjust the posture of the beam splitter 2 so that it does not affect the reflected beam and the incident beam of the measuring mirror 7.
四、折转镜3姿态的调整。将分束镜2置于设计位置处,将激光器1通过分束镜2入射到测量上的激光光束B1进行遮挡,另一束激光光束B2将通过折转镜3入射到测量镜7上,调整折转镜3的姿态使得测量镜7反射光束和入射光束重合。4. Adjustment of the attitude of the folding mirror 3. Place the beam splitter 2 at the design position, block the laser beam B1 incident on the measurement through the beam splitter 2 to block, and the other laser beam B2 will enter the measurement mirror 7 through the folding mirror 3, adjust The posture of the folding mirror 3 causes the reflected light beam of the measuring mirror 7 to coincide with the incident light beam.
五、激光干涉仪A(4)和激光干涉仪B(5)姿态的调整。将激光干涉仪A(4)和激光干涉仪B(5)分别放置于光路设计位置,调整其姿态,直到激 光干涉仪A(4)和激光干涉仪B(5)安装的接收器处的两光斑处于最佳重合状态位置,则两个激光干涉仪调整完毕。5. The posture adjustment of laser interferometer A (4) and laser interferometer B (5). Place the laser interferometer A (4) and laser interferometer B (5) in the design position of the optical path, adjust their posture until the laser interferometer A (4) and laser interferometer B (5) are installed at the receiver When the light spot is in the best position, the two laser interferometers are adjusted.
以上所述仅为本申请的实施方式,并非因此限制本申请的专利范围,凡是利用本申请说明书及附图内容所作的等效结构或等效流程变换,或直接或间接运用在其他相关的技术领域,均同理包括在本申请的专利保护范围内。The above are only the embodiments of the present application, and therefore do not limit the patent scope of the present application. Any equivalent structure or equivalent process transformation made by the description and drawings of this application, or directly or indirectly used in other related technologies In the field, the same reason is included in the scope of patent protection of this application.

Claims (10)

  1. 一种光栅刻划机刻线位置测量光路的调整方法,其特征在于,包括:A method for adjusting the optical path of the position of the scribe line of a grating scoring machine is characterized in that it includes:
    步骤S1、将十字靶安装在光栅刻划机的工作台上;Step S1: Install the cross target on the worktable of the grating scoring machine;
    步骤S2、将激光器安装于第一预设位置,调整所述激光器的姿态使所述激光器发射光束射在所述十字靶上;Step S2: Install the laser at the first preset position, adjust the posture of the laser so that the laser emits a light beam on the cross target;
    步骤S3、将测量镜安装于第二预设位置,调整所述测量镜的姿态,直至所述测量镜的反射光束和入射光束重合;Step S3: Install the measuring mirror at the second preset position, and adjust the posture of the measuring mirror until the reflected beam and the incident beam of the measuring mirror coincide;
    步骤S4、将分束镜放置于第三预设位置,调整所述分束镜的姿态,使所述激光器发射的光束透过所述分束镜照射在所述测量镜上;Step S4: Place the beam splitter at a third preset position, adjust the posture of the beam splitter, so that the light beam emitted by the laser irradiates the measuring mirror through the beam splitter;
    步骤S5、在分束镜平行的位置上安装折转镜,激光器发射的光束透过折转镜照射在测量镜上而对折转镜的姿态进行调整;Step S5. Install a folding mirror at a position parallel to the beam splitter, and the light beam emitted by the laser irradiates the measuring mirror through the folding mirror to adjust the posture of the folding mirror;
    步骤S6、在所述分束镜与所述测量镜之间安装激光干涉仪A,在所述折转镜与所述测量镜之间安装激光干涉仪B,所述激光干涉仪A和激光干涉仪B均安装有接收器,所述激光干涉仪A和激光干涉仪B均会在各自连接的接收器处发出两光斑,对激光干涉仪A和激光干涉仪B进行姿态调整,直至两个所述接收器处的两光斑处于重合状态位置。Step S6: Install a laser interferometer A between the beam splitter and the measuring mirror, install a laser interferometer B between the folding mirror and the measuring mirror, the laser interferometer A interferes with the laser Both receivers are installed on the instrument B, and the laser interferometer A and the laser interferometer B both emit two light spots at the receivers connected to each other, and adjust the attitude of the laser interferometer A and the laser interferometer B until the two The two light spots at the receiver are in a coincident position.
  2. 根据权利要求1所述的一种光栅刻划机刻线位置测量光路的调整方法,其特征在于,步骤S1包括步骤S11和步骤S12;The method for adjusting the optical path of the reticle position measurement of the grating scriber according to claim 1, wherein step S1 includes step S11 and step S12;
    步骤S11、将所述十字靶的底座连接在所述工作台上;Step S11: Connect the base of the cross target to the workbench;
    步骤S12、通过高度调解旋钮调解所述十字靶的调整支架,使所述十字靶的靶标的水平线调整到设定的测量平面上。Step S12: Adjust the adjustment bracket of the cross target by using a height adjustment knob to adjust the horizontal line of the target of the cross target to the set measurement plane.
  3. 根据权利要求2所述的一种光栅刻划机刻线位置测量光路的调整方法, 其特征在于,步骤S2包括步骤S21和步骤S22;The method for adjusting the optical path of the reticle position measurement of the grating scriber according to claim 2, characterized in that step S2 includes step S21 and step S22;
    步骤S21、将所述工作台滑动连接在所述光栅刻划机的分度导轨上,将所述工作台滑动到所述分度导轨的一端,调整所述激光器的姿态使所述激光器发射的光束射在靶标的中心;Step S21: Slidingly connect the worktable to the indexing guide of the grating scoring machine, slide the worktable to one end of the indexing guide, adjust the posture of the laser so that the laser emits The beam hits the center of the target;
    步骤S22、将所述工作台滑动到所述分度导轨的另一端,观察光束的光斑在所述靶标上的位置,使得所述工作台来回运行于所述分度导轨的两端时,通过调整所述激光器的姿态,光束的光斑在所述靶标上的位置不变,则所述激光器的姿态调整完毕,将十字靶从工作台上移走。Step S22: Slide the worktable to the other end of the indexing guide rail, and observe the position of the beam spot on the target, so that when the worktable runs back and forth at both ends of the indexing guide rail, pass Adjust the posture of the laser, the position of the beam spot on the target remains unchanged, then the posture of the laser is adjusted, and the cross target is removed from the worktable.
  4. 根据权利要求3所述的一种光栅刻划机刻线位置测量光路的调整方法,其特征在于,在步骤S3中,使所述工作台来回运行于所述分度导轨的两端时,调整所述测量镜的姿态使得所述测量镜的反射光束和入射光束重合,则所述测量镜的姿态调整完毕。The method for adjusting the position measurement optical path of the reticle of a grating scoring machine according to claim 3, characterized in that, in step S3, when the table is moved back and forth on both ends of the indexing guide rail, the adjustment is performed The posture of the measuring mirror is such that the reflected beam and the incident beam of the measuring mirror coincide, and the posture of the measuring mirror is adjusted.
  5. 根据权利要求4所述的一种光栅刻划机刻线位置测量光路的调整方法,其特征在于,在步骤S4中,所述分束镜处于所述激光器和所述测量镜之间,所述激光器发射光束,调整所述分束镜的姿态,当所述分束镜不影响所述测量镜的反射光束和入射光束重合的状态时,则所述分束镜的姿态调整完毕。The method for adjusting the optical path of the reticle position of the grating scriber according to claim 4, characterized in that, in step S4, the beam splitter is located between the laser and the measuring mirror, The laser emits a light beam and adjusts the posture of the beam splitter. When the beam splitter does not affect the state where the reflected beam and the incident beam of the measuring mirror coincide, the posture adjustment of the beam splitter is completed.
  6. 根据权利要求5所述的一种光栅刻划机刻线位置测量光路的调整方法,其特征在于,在步骤S5中,将所述激光器通过所述分束镜入射到所述测量镜上的光束进行遮挡,光束通过所述分束镜折射到所述折转镜上,通过所述折转镜入射到所述测量镜上,调整所述折转镜的姿态,当使得所述测量镜的反射光束和入射光束重合时,则所述折转镜的姿态调整完毕。The method for adjusting the optical path of the reticle position of the grating scriber according to claim 5, characterized in that, in step S5, the light beam incident on the measuring mirror by the laser through the beam splitter When blocking, the light beam is refracted to the folding mirror through the beam splitter, and then enters the measuring mirror through the folding mirror, adjusts the posture of the folding mirror, when the reflection of the measuring mirror is caused When the light beam and the incident light beam coincide, the posture adjustment of the folding mirror is completed.
  7. 根据权利要求6所述的一种光栅刻划机刻线位置测量光路的调整方法,其特征在于,在步骤S6中,所述激光干涉仪A和激光干涉仪B平行设置,所述激光干涉仪A和激光干涉仪B均安装有所述接收器,分别调整所述激光干涉仪A和激光干涉仪B的姿态,当所述激光干涉仪A和激光干涉仪B的接收器处 的两光斑均处于重合状态位置时,则激光干涉仪A和激光干涉仪B的姿态调整完毕。The method for adjusting the optical path of the reticle position of the grating scriber according to claim 6, characterized in that in step S6, the laser interferometer A and the laser interferometer B are arranged in parallel, and the laser interferometer Both A and laser interferometer B are equipped with the receiver, and the postures of the laser interferometer A and the laser interferometer B are adjusted respectively. When the receivers of the laser interferometer A and the laser interferometer B both have two spots When the position is in the coincident state, the posture adjustment of the laser interferometer A and the laser interferometer B is completed.
  8. 一种光栅刻划机刻线位置测量光路的调整系统,其连接在光栅刻划机上,其特征在于,包括十字靶、激光器、测量镜、分束镜、折转镜、激光干涉仪A和激光干涉仪B;所述十字靶连接在所述光栅刻划机的工作台上,所述分束镜处于所述激光器和所述测量镜之间,所述折转镜与所述分束镜平行,所述激光干涉仪A处于所述分束镜与所述测量镜之间,所述激光干涉仪B处于所述折转镜与所述测量镜之间;所述激光器采用双频激光器。An adjusting system for measuring the optical path of the reticle position of a grating scoring machine, which is connected to the grating scoring machine and is characterized by including a cross target, a laser, a measuring mirror, a beam splitter, a folding mirror, a laser interferometer A and a laser Interferometer B; the cross target is connected to the worktable of the grating scoring machine, the beam splitter is located between the laser and the measuring mirror, the folding mirror is parallel to the beam splitter , The laser interferometer A is between the beam splitter and the measuring mirror, and the laser interferometer B is between the folding mirror and the measuring mirror; the laser is a dual-frequency laser.
  9. 根据权利要求8所述的一种光栅刻划机刻线位置测量光路的调整系统,其特征在于,所述测量镜采用一块表面镀制200nm铝膜且面型精度PV值小于或等于λ/8的平面镜。An adjustment system for measuring the optical path of the reticle position of a grating scoring machine according to claim 8, characterized in that the measuring mirror adopts a surface coated with 200nm aluminum film and the surface accuracy PV value is less than or equal to λ/8 Plane mirror.
  10. 根据权利要求8所述的一种光栅刻划机刻线位置测量光路的调整系统,其特征在于,所述十字靶包括用于连接在所述工作台上的底座、调整支架和靶标,所述调整支架连接在所述底座上,所述靶标连接在所述调整支架的顶端,所述调整支架上设置有高度调解旋钮。An adjustment system for a reticle position measurement optical path of a grating scoring machine according to claim 8, wherein the cross target includes a base, an adjustment bracket and a target for connecting to the worktable, the The adjustment bracket is connected to the base, the target is connected to the top of the adjustment bracket, and the adjustment bracket is provided with a height adjustment knob.
PCT/CN2019/120450 2018-11-26 2019-11-23 Method for adjusting measurement light path of scribe line position of grating ruling engine, and system for same WO2020108417A1 (en)

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Publication number Priority date Publication date Assignee Title
CN109407192A (en) * 2018-11-26 2019-03-01 中国科学院长春光学精密机械与物理研究所 A kind of method of adjustment and its system of optical grating graduating machine scribe line position optical path

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0683404A1 (en) * 1994-04-08 1995-11-22 Enea Ente Per Le Nuove Tecnologie, L'energia E L'ambiente Method and apparatus for producing diffraction gratings by machine forming in a fast operation cycle
EP2466346A1 (en) * 2010-12-20 2012-06-20 Canon Kabushiki Kaisha Manufacturing method of diffraction grating in CdTe or CdZnTe
CN102540783A (en) * 2010-12-31 2012-07-04 上海微电子装备有限公司 Automatic calibration device and method for abbe cosine error of interferometer
CN104678889A (en) * 2014-12-25 2015-06-03 中国科学院长春光学精密机械与物理研究所 Laser interference control method for grating mechanical ruling engine
CN109407192A (en) * 2018-11-26 2019-03-01 中国科学院长春光学精密机械与物理研究所 A kind of method of adjustment and its system of optical grating graduating machine scribe line position optical path

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0683404A1 (en) * 1994-04-08 1995-11-22 Enea Ente Per Le Nuove Tecnologie, L'energia E L'ambiente Method and apparatus for producing diffraction gratings by machine forming in a fast operation cycle
EP2466346A1 (en) * 2010-12-20 2012-06-20 Canon Kabushiki Kaisha Manufacturing method of diffraction grating in CdTe or CdZnTe
CN102540783A (en) * 2010-12-31 2012-07-04 上海微电子装备有限公司 Automatic calibration device and method for abbe cosine error of interferometer
CN104678889A (en) * 2014-12-25 2015-06-03 中国科学院长春光学精密机械与物理研究所 Laser interference control method for grating mechanical ruling engine
CN109407192A (en) * 2018-11-26 2019-03-01 中国科学院长春光学精密机械与物理研究所 A kind of method of adjustment and its system of optical grating graduating machine scribe line position optical path

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
MI, XIAOTAO: "Controller Design of Microposition System in the Large Diffraction Grating Ruling Engine and Research on Correction Diffraction Wavefront", CHINESE DOCTORAL DISSERTATIONS FULL-TEXT DATABASE, ENGINEERING SCIENCE & TECHNOLOGY II, no. year 2018, 10, 15 October 2018 (2018-10-15), DOI: 20200213165444X *

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