WO2020107537A1 - 显示面板及其制造方法和显示装置 - Google Patents

显示面板及其制造方法和显示装置 Download PDF

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Publication number
WO2020107537A1
WO2020107537A1 PCT/CN2018/120489 CN2018120489W WO2020107537A1 WO 2020107537 A1 WO2020107537 A1 WO 2020107537A1 CN 2018120489 W CN2018120489 W CN 2018120489W WO 2020107537 A1 WO2020107537 A1 WO 2020107537A1
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sub
light
shielding layer
layer
layers
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English (en)
French (fr)
Inventor
李梦涛
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HKC Co Ltd
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HKC Co Ltd
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Priority to US17/041,422 priority Critical patent/US20210041743A1/en
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters

Definitions

  • the present application relates to the field of display technology, and in particular, to a display panel, a manufacturing method thereof, and a display device.
  • liquid crystal displays have many advantages such as thin body, power saving, no radiation, etc., and have been widely used.
  • Most liquid crystal displays on the market are backlight type liquid crystal displays, which include a liquid crystal panel and a backlight module (Backlight Module).
  • the liquid crystal panel includes a color filter substrate (Color Filter Substrate, CF Substrate, also known as a color filter substrate) and a thin film transistor array substrate (Thin Film Transistor Substrate, TFT Substrate).
  • TFT Substrate Thin Film Transistor Substrate
  • the color filter substrate uses the principle of light filtering to produce a variety of colors from the three primary colors of red, green, and blue to achieve color display of the liquid crystal device.
  • the viewing angle width, brightness, Performance such as resolution plays a key role.
  • the basic structure of the color filter substrate includes a glass substrate, a black matrix, an RGB color resist layer, and a transparent electrode layer.
  • the unevenness on the surface of the color filter substrate causes the liquid crystal to have unevenness and cause color shift, and the contrast is low.
  • the present application provides a display panel, a method of manufacturing the same, and a display device, which ensure that the surface of the color filter substrate is flat and the shading layer is relatively narrow.
  • the present application provides a display panel including a substrate, the substrate including: a color resist layer, including at least three sub-color resist layers with different colors, and the sub-color resist layers are distributed on the substrate at intervals
  • Light shielding layer located between adjacent sub-color resistive layers, including at least two sub-light shielding layers of different colors, the light-shielding layer is formed by stacking the sub-light shielding layers, the material and The material of the color resist layer is the same; the light-shielding layer and the color resist layer have the same thickness.
  • the light-shielding layer includes a first sub-light-shielding layer, a second sub-light-shielding layer, and a third sub-light-shielding layer, and the light-shielding layer is formed by stacking three sub-light-shielding layers.
  • the thickness of the color resist layer is between 1.5 ⁇ m and 3 ⁇ m, and the thickness of the first sub-light blocking layer, the second sub-light blocking layer, and the third sub-light blocking layer is 0.5 ⁇ m to 1 Between microns.
  • the first sub-light-shielding layer, the second sub-light-shielding layer, and the third sub-light-shielding layer respectively correspond to three colors of red, green, and blue.
  • the first sub-light-shielding layer, the second sub-light-shielding layer, and the third sub-light-shielding layer are sequentially stacked and distributed.
  • each sub-color resistive layer is integral with the adjacent sub-light-shielding layers of the same color.
  • the first sub-light-shielding layer, the second sub-light-shielding layer and the third sub-light-shielding layer have the same thickness.
  • the light-shielding layer includes a fourth sub-light-shielding layer and a fifth sub-light-shielding layer, and the light-shielding layer is formed by stacking the fourth sub-light-shielding layer and the fifth sub-light-shielding layer.
  • the fourth sub-light shielding layer and the fifth sub-light shielding layer respectively correspond to two colors of red and blue.
  • the fourth sub-light-shielding layer and the fifth sub-light-shielding layer have the same thickness.
  • the surface of the sub-shading layer is flat.
  • the side of the sub-shading layer adjacent to the sub-color resistive layer is flat.
  • the optical density value of the shading layer is greater than 4.
  • the substrate is a color film substrate.
  • This application also discloses a method for manufacturing a display panel, including:
  • the light shielding layer is disposed between adjacent sub-color resistive layers, and has the same material as the sub-color resistive layer;
  • first sub-light-shielding layer and corresponding sub-color resistive layer Forming a first sub-light-shielding layer and corresponding sub-color resistive layer, a second sub-light-shielding layer and corresponding sub-color resistive layer, a third sub-light-shielding layer and corresponding sub-color resistive layer on the substrate with a photomask;
  • the photomask used includes a first transparent area corresponding to the position of the color resist layer, which is set to expose and develop an excellent resist layer; and a second light transmissive area corresponding to the position of the light shield layer, which is set to expose and develop a light shield layer.
  • the present application also discloses a display device including a display panel and a driving circuit for driving the display panel.
  • the display panel includes a substrate, and the substrate includes: a color resist layer including at least three sub-color resist layers with different colors , The sub-color resistive layers are distributed on the substrate at intervals; the light-shielding layer is located between the adjacent sub-color resistive layers, and includes a first sub-light-shielding layer, a second sub-light-shielding layer, and a third sub-light-shielding layer.
  • the light-shielding layer is formed by stacking three sub-light-shielding layers, the first sub-light-shielding layer, the second sub-light-shielding layer, and the third sub-light-shielding layer have the same thickness.
  • the material of the color resist layer is the same; wherein, the light-shielding layer and the color resist layer have the same thickness.
  • the light-shielding layer includes a first sub-light-shielding layer, a second sub-light-shielding layer, and a third sub-light-shielding layer, and the light-shielding layer is formed by stacking three sub-light-shielding layers.
  • each sub-color resistive layer is integral with the adjacent sub-light-shielding layers of the same color.
  • the first sub-light-shielding layer, the second sub-light-shielding layer and the third sub-light-shielding layer have the same thickness.
  • the light-shielding layer includes at least two sub-light-shielding layers with different colors, and the material of the sub-light-shielding layer is the same as that of the sub-color resistive layer. Since the color resistive layer can only transmit light of the same color, the light-shielding layer cannot transmit light.
  • the black matrix will be made wider, squeezing the colored resist layer to make it convex, resulting in uneven liquid crystal color shift
  • the same material as the color resist layer is used as the light shielding layer, and the thickness of the light shielding layer and the color resist layer is the same, so that the liquid crystal will not cause uneven color shift.
  • FIG. 1 is a schematic cross-sectional view of a substrate with a black matrix as a light-shielding layer
  • FIG. 2 is a schematic diagram of a manufacturing process of a display panel with a black matrix shading layer
  • FIG. 3 is a schematic cross-sectional view of a substrate having a two-layer sub-light-shielding layer according to an embodiment of the present application;
  • FIG. 4 is a schematic cross-sectional view of a substrate having a three-layer sub-light-shielding layer according to an embodiment of the present application;
  • FIG. 5 is a schematic diagram of a manufacturing process of a display panel in which a light-shielding layer is a three-layer sub-light-shielding layer according to an embodiment of the present application;
  • FIG. 6 is a schematic diagram of a cross-sectional view of a manufacturing process of a display panel in which a light-shielding layer is a three-layer sub-light-shielding layer according to an embodiment of the present application;
  • FIG. 7 is a schematic diagram of a reticle of a display panel according to an embodiment of the present application.
  • FIG. 8 is a simple schematic diagram of a display device according to an embodiment of the present application.
  • the features defined as “first” and “second” may explicitly or implicitly include one or more features.
  • the meaning of “plurality” is two or more.
  • the term “comprising” and any variations thereof are intended to cover non-exclusive inclusions.
  • connection should be understood in a broad sense, for example, it can be fixed connection or detachable Connected, or connected integrally; either mechanically or electrically; directly connected, or indirectly connected through an intermediary, or internally connected between two components.
  • installation should be understood in a broad sense, for example, it can be fixed connection or detachable Connected, or connected integrally; either mechanically or electrically; directly connected, or indirectly connected through an intermediary, or internally connected between two components.
  • the color filter substrate first produces the black matrix 18 and then the color resist layer 11.
  • the color resist layer 11 and the black matrix 18 overlap to a certain extent. Horns, such that the unevenness of the liquid crystal due to the unevenness of the surface of the color filter substrate causes color shift, the contrast is low, and the black matrix 18 cannot be thinned because the color resist layer 11 needs to overlap the black matrix 18, and the aperture ratio Lower.
  • an embodiment of the present application discloses a display panel 26.
  • the display panel 26 includes a substrate 10, wherein the substrate 10 is a color filter substrate, and the color filter substrate includes: a color resist layer 11, including at least three types Sub-color resist layers 19 with different colors, and the sub-color resist layers 19 are distributed on the color filter substrate at intervals; the light-shielding layer 12, located between adjacent sub-color resist layers 19, includes at least two sub-light-shielding layers with different colors, and the light-shielding layer 12 is formed by stacking sub-shading layers, the material of the sub-shading layer is the same as the material of the sub-color resisting layer 19; the thickness of the shading layer 12 and the color resisting layer 11 are the same.
  • the color resist layer 11 can only transmit light of the same color
  • the light shielding layer 12 includes at least two sub-light shielding layers of different colors
  • the material of the sub-light shielding layer is the same as the material of the sub-color resisting layer 19, such that the light shielding layer 12 cannot transmit light, so as to achieve the effect of the black matrix 18
  • the material of the general shading layer 12 is the black matrix 18, in order to prevent light leakage, the black matrix 18 will be made wider. Protrusion, resulting in uneven liquid crystal color shift, and this application uses the same material as the color resist layer 11 for the light shielding layer 12, and the light shielding layer 12 and the color resist layer 11 have the same thickness, so as not to cause uneven liquid crystal Color cast.
  • the light-shielding layer 12 includes a first sub-light-shielding layer 13, a second sub-light-shielding layer 14, and a third sub-light-shielding layer 15.
  • the light-shielding layer 12 is formed by stacking three sub-light-shielding layers.
  • the thickness of the color resist layer 11 is between 1.5 ⁇ m and 3 ⁇ m, and the thickness of the first sub-light blocking layer 13, the second sub-light blocking layer 14 and the third sub-light blocking layer 15 is between 0.5 ⁇ m and 1 ⁇ m.
  • the shading layer 12 is formed by stacking three sub-shading layers, generally speaking, two sub-shading layers can be stacked to achieve the shading effect.
  • the shading layer 12 formed by stacking three sub-shading layers is equivalent to More layer filtering effect is added, so that light is more difficult to transmit; there are generally three kinds of sub-color group layer 19, three kinds of sub-color group layer 19 are made into three different sub-shading layers, and a shading layer formed by stacking three kinds of sub-shading layers 12 can achieve the best shading effect, so even if the number of sub shading layers is increased, it will not bring better shading effect.
  • the color resist layer 19 includes a first sub-color resist layer 20, a second sub-color resist layer 21, and a third sub-color resist layer 22, respectively corresponding to three colors of red, green, and blue;
  • the first sub-light-shielding layer 13, the second sub-light-shielding layer 14, and the third sub-light-shielding layer 15 are stacked and distributed in sequence.
  • the process sequence of the color resist layer 19 is generally made according to the order of the three colors of red, green and blue, so the stacking order of the sub-shading layers is set to be consistent with the process order of the color resist layer.
  • the color resist layer 19 and the light-shielding layer 12 reduce process steps and improve efficiency.
  • each sub-color resistive layer 19 is integral with the adjacent sub-light-shielding layers of the same color.
  • each sub-color resistive layer 19 and the adjacent sub-light shielding layer of the same color are a whole, two sub-light shielding layers can be processed when the color resist layer 11 is processed, which reduces the manufacturing process and saves costs.
  • the first sub-light-shielding layer 13, the second sub-light-shielding layer 14 and the third sub-light-shielding layer 15 have the same thickness.
  • each sub-shading layer is equivalent to one-third of the thickness of the photoresist layer, which is better controlled during exposure and development and easier to process.
  • the light shielding layer 12 includes a fourth sub-light shielding layer 16 and a fifth sub-light shielding layer 17, and the light shielding layer 12 is formed by stacking the fourth sub-light shielding layer 16 and the fifth sub-light shielding layer 17.
  • the color resist layer 19 needs to form three sub-color resist layers through three masks, if the sub-light-shielding layer is formed simultaneously in the photo mask process corresponding to the sub-color resist layer 19, the corresponding photo mask needs to be re-made. Since this technical solution has only two sub-light-shielding layers, as long as the photomasks of the corresponding two sub-color resistive layers 19 are modified, the photomasks corresponding to the third seed color-resistive layer 19 do not need to be changed, saving costs.
  • the fourth sub-light shielding layer 16 and the fifth sub-light shielding layer 17 respectively correspond to two colors of red and blue.
  • the red and blue colors have longer wavelengths, and the fourth sub-shielding layer 16 and the fifth sub-shielding layer 17 are made into red and blue colors, respectively, and the light of other colors is difficult to pass, and the effect of shading is better .
  • the fourth sub-light shielding layer 16 and the fifth sub-light shielding layer 17 have the same thickness.
  • the thicknesses of the fourth sub-light-shielding layer 16 and the fifth sub-light-shielding layer 17 are the same, which is beneficial to maintain uniformity and facilitate processing.
  • the surface of the sub-shading layer is flat.
  • the height of the stacked sub-light-shielding layer is closer to the height of the color resist layer 11, so that the surface of the substrate 10 is flatter, the liquid crystal distributed thereon is more uniform, and the deviation is smaller.
  • the adjacent side surfaces of the sub-shading layer and the sub-color resistive layer are flat.
  • the optical density value (OD) of the light shielding layer 12 is greater than 4.
  • the size of the optical density value usually indicates the effect of shading.
  • the larger the optical density value the better the shading effect.
  • the smaller the optical density value the higher the light transmittance, which is likely to cause light leakage and affect the display quality; generally In other words, only when the optical density value of the light shielding layer 12 is greater than 4, can sufficient shielding properties be provided to shield the metal circuit corresponding to the position of the light shielding layer 12.
  • the present application uses a semi-transparent mask to form a color resist layer (approximately 1.5-3um) with a normal film thickness and a sub-light-shielding layer (approximately 0.5-1um) with a thinner area after exposure.
  • a display panel 26 is also disclosed.
  • the display panel 26 includes a substrate 10, and the substrate 10 includes a color resist layer 11 including at least three different colors
  • a sub-color resist layer 19, the sub-color resist layers 19 are distributed on the substrate 10 at intervals;
  • the sub-light-shielding layer 15 and the light-shielding layer 12 are formed by stacking three sub-light-shielding layers.
  • the first sub-light-shielding layer 13, the second sub-light-shielding layer 14 and the third sub-light-shielding layer 15 have the same thickness.
  • the material is the same; the shading layer 12 and the color resist layer 11 have the same thickness.
  • a manufacturing method of a display panel 26 including: forming a color resist layer 11 on the substrate 10 and shading the same thickness as the color resist layer 11 Layer 12; the light shielding layer 12 is disposed between adjacent sub-color resistive layers 19, and the same material as the sub-color resistive layer 19; forming a first sub-light-shielding layer 13 and corresponding sub-color resisters on the substrate 10 with a photomask Layer 19, the second sub-light-shielding layer 14 and the corresponding sub-color resist layer 19, the third sub-light-shielding layer 15 and the corresponding sub-color resist layer 19; the mask used includes a first transparent region 23, corresponding to the position of the color resist layer 11 , The excellent resist layer 11 is exposed and developed; the second light-transmitting area 24 corresponds to the position of the light shielding layer 12, and the light shielding layer 12 is exposed and developed.
  • a display device 25 including the above-mentioned display panel 26 and a driving circuit 27 that drives the display panel 26.
  • the technical solution of the present application can be widely used in various display panels, such as TN type display panel (full name Twisted Nematic, namely twisted nematic panel), IPS type display panel (In-Plane Switching, plane switching), VA type display
  • TN type display panel full name Twisted Nematic, namely twisted nematic panel
  • IPS type display panel In-Plane Switching, plane switching
  • the panel Multi-domain Vertica Alignment, multi-quadrant vertical alignment technology
  • OLED display panel for short organic light emitting display panel

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Abstract

一种显示面板（26）及其制造方法和显示装置（25），显示面板（26）包括基板（10），基板（10）包括：色阻层（11），包括至少三种颜色不同的子色阻层（20，21，22），子色阻层（20，21，22）间隔分布在基板（10）上；遮光层（12），位于相邻子色阻层（20，21，22）之间，包括至少两种颜色不同的子遮光层（13，14，15），遮光层（12）由子遮光层（13，14，15）堆叠而成，子遮光层（13，14，15）材质与子色阻层（20，21，22）材质相同；遮光层（12）与色阻层（11）厚度相同。

Description

显示面板及其制造方法和显示装置
本申请要求于2018年11月26日提交中国专利局，申请号为CN201811412612.6，申请名称为“一种显示面板及其制造方法”的中国专利申请的优先权，其全部内容通过引用结合在本申请中。
技术领域
本申请涉及显示技术领域，尤其涉及一种显示面板及其制造方法和显示装置。
背景技术
这里的陈述仅提供与本申请有关的背景信息，而不必然地构成现有技术。
随着科技的发展和进步，液晶显示器具有机身薄、省电、无辐射等众多优点，得到了广泛的应用。市场上的液晶显示器大部分为背光型液晶显示器，其包括液晶面板及背光模组(Backlight Mod-ule)。液晶面板包括彩膜基板(Color Filter Substrate，CF Substrate，也称彩色滤光片基板)和薄膜晶体管阵列基板(Thin Film Transistor Substrate，TFTSubstrate)，上述基板的相对内侧存在透明电极，两片基板之间夹一层液晶分子(Liquid Crystal，LC)。彩膜基板作为液晶面板的重要组成部分，利用滤光的原理由红、绿、蓝三原色混合产生各种各样的色彩，实现液晶器件的彩色显示，同时也对显示面板的视角宽度、亮度、分辨率等性能起关键作用，彩膜基板的基本结构包括玻璃基板、黑矩阵、RGB色阻层和透明电极层。
彩膜基板表面的凹凸导致液晶存在不均匀而产生色偏，对比度较低。
技术解决方案
本申请提供一种显示面板及其制造方法和显示装置，保证彩膜基板表面平坦且遮光层较窄。
为实现上述目的，本申请提供了一种显示面板，包括基板，所述基板包括：色阻层，包括至少三种颜色不同的子色阻层，所述子色阻层间隔分布在所述基板上；遮光层，位 于相邻所述子色阻层之间，包括至少两种颜色不同的子遮光层，所述遮光层由所述子遮光层堆叠而成，所述子遮光层材质与所述子色阻层材质相同；所述遮光层与所述色阻层厚度相同。
可选的，所述遮光层包括第一子遮光层、第二子遮光层和第三子遮光层，所述遮光层是由三个所述子遮光层堆叠而成。
可选的，所述色阻层的厚度在1.5微米到3微米之间，所述第一子遮光层、所述第二子遮光层和所述第三子遮光层的厚度在0.5微米到1微米之间。
可选的，所述第一子遮光层、所述第二子遮光层和所述第三子遮光层分别对应红绿蓝三种颜色。
可选的，所述第一子遮光层、所述第二子遮光层和所述第三子遮光层依次堆叠分布。
可选的，每个子色阻层与相邻同颜色的所述子遮光层为一个整体。
可选的，所述第一子遮光层、所述第二子遮光层和所述第三子遮光层厚度相同。
可选的，所述遮光层包括第四子遮光层和第五子遮光层，所述遮光层由所述第四子遮光层和所述第五子遮光层堆叠而成。
可选的，所述第四子遮光层和所述第五子遮光层分别对应红蓝两种颜色。
可选的，所述第四子遮光层和所述第五子遮光层的厚度相同。
可选的，所述子遮光层的表面平整。
可选的，所述子遮光层与所述子色阻层相邻的侧面平整。
可选的，所述遮光层的光密度值大于4。
可选的，所述基板为彩膜基板。
本申请还公开了一种显示面板的制造方法，包括：
在所述基板上形成色阻层以及与色阻层厚度相同的遮光层；
将所述遮光层设置在相邻子色阻层之间，且与子色阻层的材料相同；
用光罩在基板上形成第一子遮光层和对应的子色阻层，第二子遮光层和对应的子色阻层，第三子遮光层和对应的子色阻层；
采用的光罩包括第一透明区，对应所述色阻层位置，被设置为曝光显影出色阻层； 第二透光区，对应所述遮光层位置，被设置为曝光显影出遮光层。
本申请还公开了一种显示装置，包括显示面板以及驱动所述显示面板的驱动电路，所述显示面板包括基板，所述基板包括：色阻层，包括至少三种颜色不同的子色阻层，所述子色阻层间隔分布在所述基板上；遮光层，位于相邻所述子色阻层之间，包括第一子遮光层、第二子遮光层和第三子遮光层，所述遮光层是由三个所述子遮光层堆叠而成，所述第一子遮光层、所述第二子遮光层和所述第三子遮光层厚度相同，所述子遮光层材质与所述子色阻层材质相同；其中，所述遮光层与所述色阻层厚度相同。
可选的，所述遮光层包括第一子遮光层、第二子遮光层和第三子遮光层，所述遮光层是由三个所述子遮光层堆叠而成。
可选的，每个子色阻层与相邻同颜色的所述子遮光层为一个整体。
可选的，所述第一子遮光层、所述第二子遮光层和所述第三子遮光层厚度相同。
本申请中遮光层至少包括两个颜色不同的子遮光层，且子遮光层材质与子色阻层材质相同，由于色阻层只能透过同样颜色的光，这样遮光层就不能使光透过，从而达到黑矩阵的效果；另外由于一般遮光层的材料为黑矩阵，为了防止漏光黑矩阵会做的比较宽，挤压着色阻层使其产生凸起，从而造成液晶不均匀产生色偏，而本申请采用与色阻层相同的材料为遮光层，且遮光层与色阻层厚度相同，这样就不会使液晶不均匀产生色偏。
附图说明
所包括的附图用来提供对本申请实施例的的理解，其构成了说明书的一部分，进行例示本申请的实施方式，并与文字描述一起来阐释本申请的原理。显而易见地，下面描述中的附图仅仅是本申请的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动性的前提下，还可以根据这些附图获得其他的附图。在附图中：
图1是一种遮光层为黑矩阵的基板截面示意图；
图2是一种遮光层为黑矩阵的显示面板制造流程的示意图；
图3是本申请实施例一种遮光层为两层子遮光层的基板截面示意图；
图4是本申请实施例一种遮光层为三层子遮光层的基板截面示意图；
图5是本申请实施例一种遮光层为三层子遮光层的显示面板制造流程的示意图；
图6是本申请实施例一种遮光层为三层子遮光层的显示面板制造流程截面的示意图；
图7是本申请实施例一种显示面板光罩的示意图；
图8是本申请实施例一种显示装置的简单示意图。
具体实施方式
这里所公开的具体结构和功能细节仅仅是代表性的，并且是进行描述本申请的示例性实施例的目的。但是本申请可以通过许多替换形式来具体实现，并且不应当被解释成仅仅受限于这里所阐述的实施例。
在本申请的描述中，需要理解的是，术语“中心”、“横向”、“上”、“下”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本申请和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请的限制。此外，术语“第一”、“第二”仅描述目的，而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此，限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个特征。在本申请的描述中，除非另有说明，“多个”的含义是两个或两个以上。另外，术语“包括”及其任何变形，意图在于覆盖不排他的包含。
在本申请的描述中，需要说明的是，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或一体地连接；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通。对于本领域的普通技术人员而言，可以具体情况理解上述术语在本申请中的具体含义。
这里所使用的术语仅仅是为了描述具体实施例而不意图限制示例性实施例。除非上下文明确地另有所指，否则这里所使用的单数形式“一个”、“一项”还意图包括复数。还应当理解的是，这里所使用的术语“包括”和/或“包含”规定所陈述的特征、整数、 步骤、操作、单元和/或组件的存在，而不排除存在或添加一个或更多其他特征、整数、步骤、操作、单元、组件和/或其组合。
下面参考附图和可选的实施例对本申请作说明。
如图1至图2所示，显示面板26的遮光层12为黑矩阵18时，彩膜基板先制作黑矩阵18再制作色阻层11，色阻层11会与黑矩阵18有一定重叠产生牛角，这样由于彩膜基板表面的凹凸导致液晶存在不均匀而产生色偏，对比度较低，且因为色阻层11需与黑矩阵18重叠部分导致黑矩阵18无法做到细线化，开口率较低。
如图3至图4所示，本申请实施例公布了一种显示面板26，显示面板26包括基板10，其中基板10为彩膜基板，彩膜基板包括：色阻层11，包括至少三种颜色不同的子色阻层19，子色阻层19间隔分布在彩膜基板上；遮光层12，位于相邻子色阻层19之间，包括至少两种颜色不同的子遮光层，遮光层12由子遮光层堆叠而成，子遮光层材质与子色阻层19材质相同；遮光层12与色阻层11厚度相同。
本方案中，由于色阻层11只能透过同样颜色的光，而遮光层12至少包括两个颜色不同的子遮光层，且子遮光层材质与子色阻层19材质相同，这样遮光层12就不能使光透过，从而达到黑矩阵18的效果；另外由于一般遮光层12的材料为黑矩阵18，为了防止漏光黑矩阵18会做的比较宽，挤压着色阻层11使其产生凸起，从而造成液晶不均匀产生色偏，而本申请采用与色阻层11相同的材料为遮光层12，且遮光层12与色阻层11厚度相同，这样就不会使液晶不均匀产生色偏。
在一实施例中，遮光层12包括第一子遮光层13、第二子遮光层14和第三子遮光层15，遮光层12是由三个子遮光层堆叠而成。
其中，色阻层11的厚度在1.5微米到3微米之间，第一子遮光层13、第二子遮光层14和第三子遮光层15的厚度在0.5微米到1微米之间。
本方案中，由于遮光层12是由三个子遮光层堆叠而成，一般而言两个子遮光层堆叠起来就能达到遮光的效果，现在采用三个子遮光层堆叠而成的遮光层12，相当于多加了层滤光效果，这样光更加不易透过；子色组层19一般有三种，将三种子色组层19制作成三种不同的子遮光层，由三种子遮光层堆叠形成的遮光层12能达到最好的遮光效 果，这样即使增加了子遮光层的层数也不能带来更好的遮光效果。
在一实施例中，色阻层19包括第一子色阻层20、第二子色阻层21和第三子色阻层22，分别对应红、绿、蓝三种颜色；
其中，第一子遮光层13、第二子遮光层14和第三子遮光层15依次堆叠分布。
本方案中，色阻层19的制程顺序一般是按照红绿蓝三种颜色的先后顺序来制作的，所以将子遮光层的堆叠顺序设置为与色阻层的制程顺序保持一致，这样同时制作色阻层19和遮光层12，减少制程步骤，提高效率。
在一实施例中，每个子色阻层19与相邻同颜色的子遮光层为一个整体。
本方案中，由于每个子色阻层19与相邻同颜色的子遮光层为一个整体，在加工色阻层11时就能加工两层子遮光层，减少制作工序，节省成本。
在一实施例中，第一子遮光层13、第二子遮光层14和第三子遮光层15厚度相同。
本方案中，由于三个子遮光层的厚度相同，每一个子遮光层都相当于光阻层厚度的三分之一，在曝光显影时比较好控制，加工比较轻松。
在一实施例中，遮光层12包括第四子遮光层16和第五子遮光层17，遮光层12由第四子遮光层16和第五子遮光层17堆叠而成。
本方案中，由于色阻层19需要通过三道光罩分别形成三种子色阻层，如果在对应子色阻层19的光罩制程中同步形成子遮光层，则需要重新制作相应的光罩。本技术方案由于只有两层的子遮光层，因此，只要改动对应的两种子色阻层19的光罩，而第三种子色阻层19对应的光罩则不需要变电，节省成本。
在一实施例中，第四子遮光层16和第五子遮光层17分别对应红蓝两种颜色。
本方案中，红蓝两种颜色的波长较长，将第四子遮光层16和第五子遮光层17分别做成红蓝两种颜色，其它颜色的光线很难通过，遮光的效果比较好。
在一实施例中，第四子遮光层16和第五子遮光层17的厚度相同。本方案中，将第四子遮光层16和第五子遮光层17的厚度做到相同，有利于保持均一性，方便加工。
在一实施例中，子遮光层的表面平整。
本方案中，由于子遮光层表面平整，子遮光层堆叠后的高度与色阻层11高度更加 接近，使基板10表面更平整，分布在其上的液晶更均匀，产生的偏差更小。
在一实施例中，子遮光层与子色阻层相邻侧面平整。
本方案中，由于子遮光层与子色阻层相连侧面平整，子遮光层侧面与子色阻层19侧面彼此接触间隙较小，不会使光源穿过，产生漏光。
在一实施例中，遮光层12的光密度值(optical density；OD)大于4。
本方案中，光密度值的大小通常表示遮光的效果，光密度值越大，遮光效果越好，光密度值越小，会使光透过率变高，容易造成漏光，影响显示品质；一般而言只有当遮光层12的光密度值大于4，方可提供足够的遮蔽性以遮蔽与遮光层12位置对应的金属线路。
在一实施例中，本申请是利用半透明光罩，曝光后形成正常膜厚区域即色阻层(约1.5-3um)和较薄的区域即子遮光层(约0.5-1um)。
如图3至图4所示，作为本申请的另一实施例，还公开了一种显示面板26，显示面板26包括基板10，基板10包括：色阻层11，包括至少三种颜色不同的子色阻层19，子色阻层19间隔分布在基板10上；遮光层12，位于相邻子色阻层19之间，包括第一子遮光层13、第二子遮光层14和第三子遮光层15，遮光层12是由三个子遮光层堆叠而成，第一子遮光层13、第二子遮光层14和第三子遮光层15厚度相同，子遮光层材质与子色阻层19材质相同；遮光层12与色阻层11厚度相同。
如图5至图7所示，作为本申请的另一实施例，公开了一种显示面板26的制造方法，包括：在基板10上形成色阻层11以及与色阻层11厚度相同的遮光层12；将遮光层12设置在相邻子色阻层19之间，且与子色阻层19的材料相同；用光罩在基板10上形成第一子遮光层13和对应的子色阻层19，第二子遮光层14和对应的子色阻层19，第三子遮光层15和对应的子色阻层19；采用的光罩包括第一透明区23，对应色阻层11位置，曝光显影出色阻层11；第二透光区24，对应遮光层12位置，曝光显影出遮光层12。
作为本申请的另一实施例，如图3至图8所示，公开了一种显示装置25，包括上述的显示面板26以及驱动显示面板26的驱动电路27。
本申请的技术方案可以广泛使用在各种显示面板，如TN型显示面板(全称为Twisted Nematic，即扭曲向列型面板)、IPS型显示面板(In-Plane Switching，平面转换)、VA型显示面板(Multi-domain Vertica Alignment，多象限垂直配向技术)，当然，也可以是其他类型的显示面板，如有机发光显示面板(organic light emitting diode，简称OLED显示面板)，均可适用上述方案。
以上内容是结合具体的可选实施方式对本申请所作的详细说明，不能认定本申请的具体实施只局限于这些说明。对于本申请所属技术领域的普通技术人员来说，在不脱离本申请构思的前提下，还可以做出若干简单推演或替换，都应当视为属于本申请的保护范围。

Claims (19)

  1. 一种显示面板，包括基板，所述基板包括：
    色阻层，包括至少三种颜色不同的子色阻层，所述子色阻层间隔分布在所述基板上；
    遮光层，位于相邻的所述子色阻层之间，包括至少两种颜色不同的子遮光层，所述遮光层由所述子遮光层堆叠而成，所述子遮光层材质与所述子色阻层材质相同；
    其中，所述遮光层与所述色阻层厚度相同。
  2. 如权利要求1所述的一种显示面板，其中，所述遮光层包括第一子遮光层、第二子遮光层和第三子遮光层，所述遮光层是由三个所述子遮光层堆叠而成。
  3. 如权利要求2所述的一种显示面板，其中，所述色阻层的厚度在1.5微米到3微米之间，所述第一子遮光层、所述第二子遮光层和所述第三子遮光层的厚度在0.5微米到1微米之间。
  4. 如权利要求2所述的一种显示面板，其中，所述第一子遮光层、所述第二子遮光层和所述第三子遮光层分别对应红绿蓝三种颜色。
  5. 如权利要求4所述的一种显示面板，其中，所述第一子遮光层、所述第二子遮光层和所述第三子遮光层依次堆叠分布。
  6. 如权利要求2所述的一种显示面板，其中，每个所述子色阻层与相邻同颜色的所述子遮光层为一个整体。
  7. 如权利要求2所述的一种显示面板，其中，所述第一子遮光层、所述第二子遮光层和所述第三子遮光层厚度相同。
  8. 如权利要求1所述的一种显示面板，其中，所述遮光层包括第四子遮光层和第五子遮光层，所述遮光层由所述第四子遮光层和所述第五子遮光层堆叠而成。
  9. 如权利要求8所述的一种显示面板，其中，所述第四子遮光层和所述第五子遮光层分别对应红蓝两种颜色。
  10. 如权利要求8所述的一种显示面板，其中，所述第四子遮光层和所述第五子遮光层的厚度相同。
  11. 如权利要求1所述的一种显示面板，其中，所述子遮光层的表面平整。
  12. 如权利要求1所述的一种显示面板，其中，所述子遮光层与所述子色阻层相邻的侧面平整。
  13. 如权利要求1所述的一种显示面板，其中，所述遮光层的光密度值大于4。
  14. 如权利要求1所述的一种显示面板，其中，所述基板为彩膜基板。
  15. 一种显示面板的制造方法，包括步骤：
    在基板上形成色阻层以及与所述色阻层厚度相同的遮光层；
    将所述遮光层设置在相邻子色阻层之间，且与所述子色阻层的材料相同；
    用光罩在所述基板上形成第一子遮光层和对应的子色阻层，第二子遮光层和对应的子色阻层，第三子遮光层和对应的子色阻层；
    采用的光罩包括第一透明区，对应所述色阻层位置，被设置为曝光显影出所述色阻层；第二透光区，对应所述遮光层位置，被设置为曝光显影出所述遮光层。
  16. 一种显示装置，包括显示面板以及驱动所述显示面板的驱动电路，所述显示面板包括基板，所述基板包括：
    色阻层，包括至少三种颜色不同的子色阻层，所述子色阻层间隔分布在所述基板上；
    遮光层，位于相邻所述子色阻层之间，包括至少两种颜色不同的子遮光层，所述遮光层由所述子遮光层堆叠而成，所述子遮光层材质与所述子色阻层材质相同；
    其中，所述遮光层与所述色阻层厚度相同。
  17. 如权利要求16所述的一种显示装置，其中，所述遮光层包括第一子遮光层、第二子遮光层和第三子遮光层，所述遮光层是由三个所述子遮光层堆叠而成。
  18. 如权利要求16所述的一种显示装置，其中，每个所述子色阻层与相邻同颜色的所述子遮光层为一个整体。
  19. 如权利要求16所述的一种显示装置，其中，所述第一子遮光层、所述第二子遮光层和所述第三子遮光层厚度相同。
PCT/CN2018/120489 2018-11-26 2018-12-12 显示面板及其制造方法和显示装置 Ceased WO2020107537A1 (zh)

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