WO2020056722A1 - Structure de source de lumière, module de projection optique, dispositif de détection et appareil - Google Patents

Structure de source de lumière, module de projection optique, dispositif de détection et appareil Download PDF

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Publication number
WO2020056722A1
WO2020056722A1 PCT/CN2018/106944 CN2018106944W WO2020056722A1 WO 2020056722 A1 WO2020056722 A1 WO 2020056722A1 CN 2018106944 W CN2018106944 W CN 2018106944W WO 2020056722 A1 WO2020056722 A1 WO 2020056722A1
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Prior art keywords
light
light emitting
pattern
source structure
emitting
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PCT/CN2018/106944
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English (en)
Chinese (zh)
Inventor
田浦延
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深圳阜时科技有限公司
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Priority to PCT/CN2018/106944 priority Critical patent/WO2020056722A1/fr
Priority to CN201890000302.0U priority patent/CN209803547U/zh
Publication of WO2020056722A1 publication Critical patent/WO2020056722A1/fr

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • G03B21/20—Lamp housings

Definitions

  • the utility model belongs to the field of optical technology, and particularly relates to a light source structure, an optical projection module, a biometric identification device and equipment.
  • An existing three-dimensional (3D) sensing module uses a light source with an irregularly distributed light emitting unit to project an irregularly distributed light spot pattern on the measured target to sense the three-dimensional information of the measured target.
  • 3D sensing it is necessary to compare and analyze the irregular light spot pattern projected on the measured object with the standard irregular light spot pattern projected on the reference plane, and calculate the measured spot where the light spot is located according to the amount of deformation of the corresponding light spot. 3D data of the position of the target.
  • the corresponding method is to divide the irregular light spot pattern into a plurality of search areas according to a preset area and sequentially search and compare. Therefore, the arrangement position of the irregularly distributed light emitting units on the light source is reasonably designed to improve the difference.
  • the uniqueness of the spot distribution in the search area that is, increasing the Hamming distance of the spot distribution in different search areas, has become the key to solving the problem.
  • the light-emitting unit arrangement of the existing light source structure usually needs to increase the light-emitting area area of the light source so that the light-emitting unit has more arrangement possibilities.
  • increasing the area of the light-emitting area of the light source will also increase. Cost, and the large light source structure is not conducive to the miniaturization of the product.
  • the technical problem to be solved by the present utility model is to provide a light source structure, an optical projection module, a biometric identification device and equipment, which can highly integrate flood light and light pattern projection functions, and achieve the beneficial effects of miniaturization and cost reduction.
  • An embodiment of the present invention provides a light source structure for emitting irregularly distributed light spot patterns.
  • the light source structure includes a semiconductor substrate and a plurality of irregularly distributed light emitting units formed on the semiconductor substrate.
  • a patterned light emitting area is defined on the light emitting surface of the semiconductor substrate.
  • the patterned light emitting area is rectangular, and the bottom left corner vertex of the patterned light emitting area is used as the origin.
  • the extension directions of the two right-angled edges that intersect in the lower left corner are the abscissa axis and the ordinate axis, respectively. The position of the light emitting unit is described.
  • the distribution pattern of the light emitting units is selected from a plurality of first light emission obtained by adding or reducing one or more light emitting units or changing a position of the one or more light emitting units in a basic light emitting unit distribution pattern having one hundred light emitting units.
  • the coordinate values of one hundred light-emitting units of the basic light-emitting unit distribution pattern are: P1 (170.55,157.95); P2 (146.25,145.35); P3 (189.45,177.75); P4 (175.95 , 91.35); P5 (202.95, 89.55); P6 (211.95, 193.95); P7 (230.85, 174.15); P8 (125.55, 220.05); P9 (213.75, 40.95); P10 (186.75, 39.15); P11 (10.35, 153.45); P12 (95.85,94.05); P13 (171.45,61.65); P14 (186.75,12.15); P15 (105.75,254.25); P16 (120.15,152.55); P17 (227.25,108.45); P18 (71.55,107.55) ); P19 (343.35, 108.45); P20 (247.05, 68.85); P21 (46.35,
  • the degree of similarity between the first light emitting unit distribution pattern and the basic light emitting unit distribution pattern is equal to or exceeds a preset threshold.
  • the similarity threshold is defined by obtaining a first light-emitting unit pattern after a limited number of graphic transformations that do not change the correlation between the light-emitting units to obtain a first light-emitting unit pattern that is consistent with the orientation of the basic light-emitting unit distribution pattern and has the same size of the light-emitting unit. Two light emitting unit patterns.
  • the similarity value calculated by using the normalized correlation coefficient matching method between the second light emitting unit pattern and the basic light emitting unit distribution pattern is equal to or exceeds a preset threshold of 0.25.
  • the graphic transformation that does not change the correlation between the light-emitting units includes translation, rotation, left-right mirroring, up-down mirroring, and 180-degree flip.
  • the light emitting unit is a vertical cavity surface emitting laser.
  • the light source structure further includes one or more flood light emitting areas, the flood light emitting areas are symmetrically distributed around the pattern light emitting area, and the flood light emitting areas emit light for forming light A light beam of a strong uniformly distributed flood light beam, one or more light emitters are formed in each of the flood light emission areas, and the light emitters and light emitting units in the pattern light emission area are formed on the same semiconductor substrate And can be independently controlled light emission.
  • a single light emitter is formed in each of the flood light emitting regions, and the single light emitter may be a single-hole wide-facet vertical cavity surface emitting laser.
  • a plurality of light emitting bodies are formed in each of the flood light emitting areas, and the plurality of light emitting bodies are uniformly arranged in the flood light emitting area at a preset same interval, and the plurality of light emitting areas
  • the body is a vertical cavity surface emitting laser.
  • the flood light emitting area is a box that surrounds the pattern light emitting area in a circle outside the pattern light emitting area, and a minimum distance between the flood light emitting area and the pattern light emitting area.
  • the size of D satisfies the condition Where H is the distance between the light emitting surface of the light source structure and the first optical element arranged sequentially above the light source structure, and ⁇ is the maximum divergence angle of the light beam emitted from the flood light emitting area and the pattern light emitting area.
  • a flood light emitting part which includes a light emitter and a light guide plate formed on a flood light emitting semiconductor substrate, and the light guide plate includes a light entrance surface and a light exit surface.
  • the flood light-emitting semiconductor substrate is disposed corresponding to the light incident surface of the light guide plate.
  • the luminous body emits a light beam toward the light incident surface of the light guide plate. The light beam emitted by the light emitting body enters the light guide plate from the light incident surface and is uniformly mixed from the light emitting surface.
  • a light beam with uniform light intensity is projected, and the semiconductor substrate formed with a plurality of irregularly distributed light-emitting units is disposed at a middle position on a light exit surface of a light guide plate to emit a light beam cluster having a plurality of irregularly distributed sub-beams.
  • the light emitter is a vertical cavity surface emitting laser.
  • An embodiment of the present invention further provides an optical projection module for projecting a predetermined pattern onto a measured target for sensing.
  • the optical projection module includes a light beam modulation element and the light source structure according to the foregoing embodiment.
  • the light beam modulation element modulates the light beam emitted by the light source structure to form a pattern light beam capable of projecting an irregularly distributed light spot pattern on a measured target object.
  • the beam modulation element includes a collimating lens and / or a beam expanding element and a diffractive optical element.
  • the collimating lens and / or the beam-expanding element and the patterning element are disposed on a light exiting light path of the light source structure.
  • the collimating lens and / or the beam-expanding element adjusts the light beam emitted by the light source structure to substantially keep collimation and meet a preset light output aperture requirement.
  • the patterning element rearranges a light beam cluster having a plurality of irregularly distributed sub-beams emitted from the light source structure to form a patterned beam capable of projecting a larger number of irregularly distributed light spot patterns on the measured object.
  • the light beam modulation element includes a diffusing portion and a patterning portion
  • the diffusing portion is disposed corresponding to a flood light emitting area or a flood light emitting portion of a light source structure, and is configured to convert the flood light emitting area or
  • the light beam emitted by the flood light emitting part diffuses to form a flood light beam with uniform light intensity distribution
  • the patterning part is set corresponding to the pattern light emitting area of the light source structure, and is used to set the light field of the light beam emitted from the pattern light emitting area.
  • the rearrangement is performed to form a pattern light beam capable of projecting irregularly distributed light spot patterns on the measured object.
  • the patterned portion and the diffusion portion of the beam modulation element are formed on the same transparent substrate;
  • the diffusion portion and the patterned portion of the beam modulation element are formed on different transparent substrates respectively.
  • the transparent substrate on which the patterned portion is formed is defined as a patterned substrate, and a region corresponding to the diffusion substrate and the patterned portion remains transparent. Light, and the area corresponding to the diffused portion of the patterned substrate remains transparent.
  • the function of the patterning portion is achieved by forming a specific patterned optical texture at a corresponding position on a transparent substrate, and the patterned optical texture is selected from a diffractive optical texture, an optical microlens array, and a grating. One of them and their combination.
  • the optical projection module further includes a light path guiding element, the light path guiding element is disposed between the light source structure and the beam modulation element and corresponds to a light emitting surface of a first emitting portion of the light source structure.
  • the light path guiding element is configured to guide and irradiate the first light beam emitted from the first emitting portion in a divergent shape to the diffusion portion of the light beam modulation element.
  • An embodiment of the present invention further provides a sensing device for sensing three-dimensional information of a measured object, which includes the optical projection module and the sensing module as described in the above embodiment.
  • the sensing module is configured to sense a preset pattern projected by the optical module on a measured target object and obtain three-dimensional information of the measured target object by analyzing an image of the preset pattern.
  • An embodiment of the present invention further provides a device including the sensing device according to the foregoing embodiment.
  • the device performs a corresponding function according to the three-dimensional information of the detected target object sensed by the sensing device.
  • the light source structure, the optical projection module, the sensing device and the device provided by the embodiments of the present utility model are simulated and screened by a computer to determine that the area between different light emitting unit local areas can be maximized within a small light emitting area.
  • the irrelevance makes the irregularly distributed light spots projected on the measured object more quickly locate the only corresponding light spot on the standard irregularly distributed light spot pattern, thereby improving the efficiency of three-dimensional sensing.
  • FIG. 1 is a top view of a light source structure provided by a first embodiment of the present invention.
  • FIG. 2 is a schematic diagram of coordinate positions of the irregular light-emitting unit described in FIG. 1.
  • FIG 3 is a top view of a light source structure provided by a second embodiment of the present invention.
  • FIG. 4 is a schematic diagram of another structure of the flood light emitting area according to the second embodiment of the present invention.
  • FIG. 5 is a top view of a light source structure provided by a third embodiment of the present invention.
  • FIG. 6 is a cross-sectional view of the light source structure in FIG. 5 taken along line VI-VI.
  • FIG. 7 is a top view of a light source structure provided by a fourth embodiment of the present invention.
  • FIG. 8 is a cross-sectional view of the light source structure in FIG. 7 along the line VIII-VIII.
  • FIG. 9 is a schematic structural diagram of an optical projection module according to a fifth embodiment of the present invention.
  • FIG. 10 is a schematic structural diagram of an optical projection module according to a sixth embodiment of the present invention.
  • FIG. 11 is a schematic structural diagram of an optical projection module according to a seventh embodiment of the present invention.
  • FIG. 12 is a schematic structural diagram of an optical projection module according to an eighth embodiment of the present invention.
  • FIG. 13 is a schematic structural diagram of a sensing device according to a ninth embodiment of the present invention.
  • FIG. 14 is a schematic structural diagram of a device provided by a tenth embodiment of the present invention.
  • the terms “installation”, “connected”, and “connected” should be understood in a broad sense unless otherwise specified or limited. For example, they may be fixed connections or may be connected. Disassembly connection, or integrated connection; it can be mechanical connection, electrical connection or mutual communication; it can be directly connected or indirectly connected through an intermediate medium, it can be the internal communication between two components or between two components Interaction.
  • Disassembly connection, or integrated connection it can be mechanical connection, electrical connection or mutual communication; it can be directly connected or indirectly connected through an intermediate medium, it can be the internal communication between two components or between two components Interaction.
  • the first embodiment of the present invention provides a light source structure 1 for emitting a light beam cluster with a plurality of irregularly distributed sub-beams to form a corresponding irregularly distributed light spot on a measured object.
  • Pattern for sensory recognition The light beam may be a light beam having a specific wavelength according to a sensing principle and an application scenario.
  • the light beam is used to realize face recognition, and may be an infrared or near-infrared wavelength light beam with a wavelength range of 750 nanometers (Nanometer, nm) to 1650 nm.
  • the light source structure 1 includes a semiconductor substrate 10 and a plurality of irregularly distributed light emitting units 12 formed on the semiconductor substrate 10.
  • the light emitting unit 12 is formed on the semiconductor substrate 10 by processes such as photolithography, etching, and / or metal organic chemical vapor deposition.
  • a patterned light emitting region 14 is defined on the light emitting surface of the semiconductor substrate 10.
  • the light emitting units 12 are distributed in the pattern light emitting area 14.
  • the distribution positions of the light-emitting units 12 in the pattern light-emitting area 14 satisfy the conditions of limited light-emitting area area, light-emitting unit aperture, and light-emitting unit spacing, so that the light-emitting units 12 at different positions in the pattern light-emitting area 14 have different positions.
  • the correlation is as high as possible to improve the calculation efficiency of searching and locating the irregularly distributed light spots.
  • the position of the light emitting unit 12 in the pattern light emitting area 14 is determined by setting a screening condition and using a computer to screen a plurality of simulated irregularly distributed light emitting unit 12 position pattern templates.
  • the set screening conditions include:
  • the search block is composed of a plurality of repeatedly stitched irregularly-distributed light-emitting unit 12 position patterns from the original location.
  • the distribution pattern of the light-emitting unit 12 searched by moving the preset search range in the figure is unique under the condition that the preset pixel missing rate is satisfied.
  • the preset search range is a range covered by moving the preset distance in the same direction, for example, along the line connecting the center points of the position patterns of the light emitting units 12 adjacent to the irregular distribution.
  • the preset distance is less than or equal to the distance between the central points of the position patterns of the randomly distributed light-emitting unit 12 adjacent to each other.
  • the preset area of the search block may be a pixel unit on a sensor that images the irregularly distributed light spot pattern projected by the irregularly distributed light emitting unit 12, for example, the search block may be The size of 30 pixel units multiplied by 30 pixel units.
  • the search block arbitrarily designated according to a preset area traverses the irregularly distributed light emitting unit 12 position pattern in units of the pixel unit. To obtain a plurality of distribution patterns of the light-emitting units 12 with a predetermined area size.
  • the patterns are compared one by one to get the corresponding Hamming distance.
  • the excluded range is a range covered by a distance that the search block itself moves one light emitting unit 12 in various directions.
  • the Hamming distance is a parameter expressing the degree of similarity between the distribution patterns of the two light-emitting units 12.
  • a position of one light emitting unit 12 is increased by a Hamming distance value, that is, one of the light emitting unit 12 distribution patterns changes the number of light emitting units 12 corresponding to the Hamming distance value.
  • a Hamming distance value that is, one of the light emitting unit 12 distribution patterns changes the number of light emitting units 12 corresponding to the Hamming distance value.
  • Position another distribution pattern of the light-emitting units 12 can be obtained.
  • Each of the candidate positions of the irregularly distributed light-emitting unit 12 positions is compared with the respective minimum Hamming distance obtained after the above search and comparison, and the irregularly-distributed light-emitting unit 12 position pattern corresponding to the maximum value is selected optimally.
  • the distribution density of the light-emitting units 12 selected as described above also needs to satisfy the minimum distance between adjacent light-emitting units 12 that can be produced by the manufacturing process.
  • the value range of the position coordinates of each irregularly distributed light emitting unit 12 in the pattern light emitting area 14 can be determined.
  • the pattern light emitting region 14 is rectangular.
  • the number of the light-emitting units 12 is, for example, one hundred.
  • the lower left vertex of the patterned light emitting region 14 is now the origin O, and the extension directions of the two right-angled sides that intersect at the lower left corner are the abscissa axis X and the ordinate axis Y, respectively, and the length unit is micrometer ( ⁇ m).
  • the range of the coordinate values of the center point of one hundred light-emitting units 12 is as follows: P1 ([165.84,175.26], [153.24,162.66]); P2 ([141.54,150.96], [140.64,150.06]); P3 ([184.74 , 194.16], [173.04,182.46]); P4 ([171.24,180.66], [86.64,96.06]); P5 ([198.24,207.66], [84.84,94.26]); P6 ([207.24,216.66], [ 189.24,198.66]); P7 ([226.14,235.56], [169.44,178.86]); P8 ([120.84,130.26], [215.34,224.76]); P9 ([209.04,218.46], [36.24,45.66]) ; P10 ([182.04,191.46], [34.44,43.86]); P11 ([5.64,15.06
  • the coordinate values of the center points of the one hundred light-emitting units 12 are: P1 (170.55,157.95); P2 (146.25,145.35); P3 (189.45,177.75); P4 (175.95,91.35); P5 (202.95 , 89.55); P6 (211.95, 193.95); P7 (230.85, 174.15); P8 (125.55, 220.05); P9 (213.75, 40.95); P10 (186.75, 39.15); P11 (10.35, 153.45); P12 (95.85, 94.05); P13 (171.45,61.65); P14 (186.75,12.15); P15 (105.75,254.25); P16 (120.15,152.55); P17 (227.25,108.45); P18 (71.55,107.55); P19 (343.35,108.45) ); P20 (247.05, 68.85); P21 (46.35, 119.25); P22 (65) ⁇
  • the light emitting unit 12 may be a semiconductor laser.
  • the light emitting unit 12 is a vertical cavity surface emitting laser (Vertical Cavity Surface Emitting Laser, VCSEL).
  • the arrangement position of the irregular light-emitting units 12 on the light source structure 1 can be maximized within a small light-emitting area within a small light-emitting area after being determined and simulated by a computer according to the above screening principles.
  • the irrelevance makes the irregularly distributed light spots projected on the measured object more quickly locate the only corresponding light spot on the standard irregularly distributed light spot pattern, thereby improving the efficiency of three-dimensional sensing.
  • the one hundred irregularly arranged light-emitting units that determine coordinate positions in the above-mentioned pattern light-emitting area can also be used as a basic light-emitting unit distribution pattern, and added to the pattern light-emitting area. Either reduce one or more light emitting units, or change the position of one or more light emitting units to form a plurality of different first light emitting unit distribution patterns of the light source structure.
  • the similarity is evaluated by adding or reducing one or more light-emitting units or changing the position of one or more light-emitting units in the basic light-emitting unit distribution pattern without changing the light-emitting units for a limited number of times.
  • the second correlation pattern is transformed to obtain a second light-emitting unit pattern with the same orientation of the basic light-emitting unit distribution pattern and the same size of the light-emitting units.
  • the graphic transformation includes, but is not limited to, translation, rotation, left-right mirroring, up-down mirroring, 180-degree flipping, and the like.
  • a similarity calculation is performed on the second light-emitting unit pattern and the basic light-emitting unit distribution pattern by using a normalized correlation coefficient matching method.
  • the similarity between the first pattern and the basic light-emitting unit distribution pattern can be determined.
  • a similarity value of 1 corresponds to the case where the two patterns are completely the same, and a similarity value of 0 corresponds to a case where the two patterns are completely different.
  • the degree of similarity between the corresponding first light emitting unit distribution pattern and the basic light emitting unit distribution pattern may enable a light source structure using the first light emitting unit distribution pattern.
  • the preset threshold of the similarity value is a similarity value of 0.25 calculated by using a normalized correlation coefficient matching method.
  • the second embodiment of the present invention provides a light source structure 2 that is basically the same as the light source structure 1 in the first embodiment.
  • the light source structure 2 further includes one or more general light sources.
  • the flood light emitting regions 21 are symmetrically distributed around the pattern light emitting regions 24.
  • Each of the flood light emitting regions 21 includes one or more light emitting bodies 26.
  • the light emitting body 26 in the flood light emitting area 21 and the light emitting unit 22 in the pattern light emitting area 24 are formed on the same semiconductor substrate 20 and can be independently controlled to emit light.
  • the flood light emitting area 21 is used to emit a flood light beam with uniform light intensity distribution.
  • the flood light beam is projected onto the measured target to sense a flood image of the measured target.
  • the flood light beam may be used to sense whether the measured target is a human face.
  • a single light emitting body 26 may be formed in each of the flood light emitting areas 21.
  • the single light emitter 26 may be a single-hole wide-area VCSEL.
  • the single-hole wide-area VCSEL has only one light-emitting hole, but has a large light-emitting aperture, which is dozens of times that of a general VCSEL.
  • the luminous effect of the single-hole wide-area VCSEL is equivalent to a surface light source with uniform luminous intensity.
  • the shape of the light emitting surface of the single-hole wide-area VCSEL may be a regular shape, such as a rectangle, or may be other irregular shapes.
  • the flood light emitting areas 21 are respectively disposed at the corners of the pattern light emitting area 24.
  • the shape of the flood light emitting area 21 is a right-angled frame strip shape that surrounds the corners of the pattern light emitting area 24 from the outside.
  • the shape of the light emitting surface of the single-hole wide-area VCSEL may also be the shape of the corresponding right-angled frame.
  • a plurality of light emitting bodies may be formed in each of the flood light emitting areas.
  • the plurality of light emitting bodies are uniformly arranged in the flood light emitting area according to a preset same interval.
  • the plurality of light emitters may be a VCSEL.
  • the light beam with uniform light intensity emitted from the flood light emitting area 21 is diffused and mixed by optical elements disposed on the light path of the light source structure 2 to form a flood light beam covering the entire emission angle.
  • the third embodiment of the present invention provides a light source structure 3, which is basically the same as the light source structure 1 in the first embodiment.
  • the difference lies in the flood light emitting area.
  • 31 is a frame-shaped area surrounding the patterned light emitting area 34 around the patterned light emitting area 34.
  • the size of the minimum distance D between the flood light emission area 31 and the pattern light emission area 34 should ensure that the light beam emitted from the pattern light emission area 34 and the light beam emitted from the flood light emission area 32 reach and are arranged above the light source structure 3.
  • the first optical elements 33 arranged in sequence do not meet each other before.
  • the divergence angles of the light beams emitted by the light emitting body 36 in the flood light emitting area 31 and the light emitting unit 32 in the pattern light emitting area 34 cannot be exactly the same, but will Within the divergence angle range. Because the divergence angle of the light beams emitted by the light-emitting body 36 and the light-emitting unit 32 is larger, the distance between the light source structure 3 and the first optical element 33 arranged in order above remains the same in order to satisfy the light emission with flood light. If the light beams emitted from the area 31 do not intersect, it is required that the distance D between the pattern light emitting area 34 and the flood light emitting area 31 is greater.
  • the maximum divergence angle of the light beams emitted from the pattern light emitting area 34 and the flood light emitting area 31 is ⁇ .
  • the distance between the light emitting surface of the light source structure 3 and the first optical element 33 arranged in sequence above it is H, according to the trigonometric function, the minimum distance D between the patterned light emitting area 34 and the flooded light emitting area 31 in the critical case where the light beam emitted from the patterned light emitting area 34 and the beam emitted from the flooded light emitting area 31 just intersect.
  • the pattern light The minimum distance D between the light-emitting area 34 and the flood light-emitting area 31 should satisfy When the above conditions are satisfied, the light beams emitted from the pattern light emitting area 34 and the flood light emitting area 31 do not converge with each other before reaching the first optical element 33 provided above the light source structure 3, so there is no need to
  • the light emitting area 34 or the flood light emitting area 31 is further provided with another element for adjusting the direction of the light beam.
  • the light emitting units 32 are irregularly distributed in the pattern light emitting area 34 of the semiconductor substrate 30.
  • the luminous bodies 36 are uniformly arranged in the flood light emitting area 31 at the same preset interval.
  • a fourth embodiment of the present invention provides a light source structure 4 for emitting a light beam to a measured target for sensing identification.
  • the light beam may be a light beam having a specific wavelength according to a sensing principle and an application scenario.
  • the light beam is used to realize face recognition, and may be an infrared or near-infrared wavelength light beam with a wavelength range of 750 nanometers (Nanometer, nm) to 1650 nm.
  • the light source structure 4 includes a flood light emitting portion 40 and a pattern light emitting portion 42.
  • the light beam emitted by the flood light emitting portion 40 is used to form a flood light beam with uniform light intensity distribution.
  • the flood light beam is projected onto the measured target to identify whether the measured target is a specific object that conforms to a preset characteristic.
  • the flood light beam may be used to identify whether the measured target is a human face.
  • the light beam emitted by the patterned light emitting portion 42 is used to form a patterned light beam capable of projecting a predetermined pattern on the measured object.
  • the preset pattern is used to sense three-dimensional information on a surface of the measured target object.
  • the flood light emitting portion 40 includes a light emitter 400 and a light guide plate 402 formed on a flood light emitting semiconductor substrate 401.
  • the light guide plate 402 includes a light entrance surface 4020 and a light exit surface 4022.
  • the light guide plate 402 has a substantially rectangular parallelepiped shape, and the light incident surface 4020 is perpendicular to the light exit surface 4022.
  • the luminous body 400 is disposed corresponding to the light incident surface 4020 of the light guide plate 402 so that the light beam emitted by the luminous body 400 enters the light guide plate 402 from the light incident surface 4020 and is uniformly mixed. .
  • the pattern light emitting portion 42 is disposed at a middle position of the light emitting surface 4022 of the light guide plate 402.
  • the patterned light emitting section 42 includes a semiconductor substrate 421 as described in the first embodiment, and a plurality of light emitting units 420 formed on the semiconductor substrate 421.
  • the light emitting units 420 are irregularly arranged on the semiconductor substrate 421 according to the same distribution law as in the first embodiment.
  • DOE diffractive Optical Element
  • the light-emitting body 400 and the light-emitting unit 420 may be a semiconductor laser, for example, a VCSEL.
  • the difference is that because the positions of the light-emitting body 400 and the light-emitting unit 420 are different, they need to be formed on different flood light-emitting semiconductor substrates 401 and 421 respectively.
  • the shape of the flood light emitting semiconductor substrate 401 corresponds to the shape of the light incident surface 4020.
  • a fifth embodiment of the present invention provides an optical projection module 5 for projecting a specific light beam onto a target to be detected for recognition.
  • the optical projection module 5 includes a light beam modulation element 51 and the light source structure 1 in the first embodiment.
  • the beam modulation element 51 includes, but is not limited to, a collimating lens 510 and / or a beam expanding element and a patterning element 512.
  • the collimating lens 510 and / or the beam-expanding element and the patterning element 512 are disposed on a light-emitting light path of the light source structure 1.
  • the collimating lens 510 and / or the beam-expanding element adjust the light beam emitted by the light source structure 1 so that it is substantially kept collimated and meets a preset light output aperture requirement.
  • the patterning element 512 rearranges a light beam cluster having a plurality of irregularly distributed sub-beams emitted from the light source structure 1 to form a pattern capable of projecting a larger number of irregularly distributed light spot patterns on the measured target object. beam.
  • the patterning element 512 includes, but is not limited to, a DOE, a microlens array, a grating, and the like.
  • the patterning element 512 is a DOE, and the DOE copies a plurality of beam clusters with a plurality of irregularly distributed sub-beams emitted from the light source structure 1 and expands them within a preset extended angle range. Form a pattern light beam capable of projecting a larger number of irregularly distributed light spot patterns on the measured target.
  • a sixth embodiment of the present invention provides an optical projection module 6 for projecting a specific light beam onto a measured target for sensing and identification.
  • the optical projection module 6 includes a beam modulation element 61 and the light source structure 2 in the second to fourth embodiments.
  • the beam modulation element 61 includes a diffusion portion 610 and a patterning portion 612.
  • the diffusing portion 610 is provided corresponding to the flood light emitting area 21 of the light source structure 1, and is configured to diffuse the light beam emitted by the light emitting body 26 in the flood light emitting area 21 to form a flood light beam with uniform light intensity distribution.
  • the patterning portion 612 is provided corresponding to the patterned light emitting region 24 of the light source structure 1 and is configured to form a light beam emitted from the light emitting unit 22 in the patterned light emitting region 24 into a pattern capable of projecting a predetermined pattern on the measured object.
  • the light beam is used for sensing three-dimensional information of the measured target.
  • the patterned portion 612 corresponds to the patterned light emitting region 24 of the light source structure 1 and is disposed at an intermediate position of the beam modulation element 61.
  • the diffusion portion 610 corresponds to the flood light emitting region 21 of the light source structure 1, and is disposed symmetrically around the periphery of the patterning portion 612.
  • the functions of the patterning portion 612 and the diffusion portion 610 are realized by forming specific optical lines at corresponding positions on the transparent substrate 613.
  • the patterned portion 112 and the diffusion portion 111 of the beam modulation element 110 are disposed on the same transparent substrate 613. That is, a patterned optical pattern 6120 for rearranging a light field is formed at the middle position of the transparent substrate 613 as the patterned portion 612.
  • the transparent substrate 613 forms a diffusing optical pattern 6100 having a light diffusing effect as the diffusing part 610 at a position corresponding to the light emitting structure 21 of the light source structure 1 at the periphery of the patterned optical pattern 6120.
  • a seventh embodiment of the present invention provides an optical projection module 7, which is basically the same as the optical projection module 6 in the sixth embodiment. The difference is that the optical projection module 7 is also Includes a light path guide member 76.
  • the light path guiding element 76 is disposed between the light source structure 1 and the light beam modulation element 71, and at a position corresponding to the light emitting surface of the light emitting area 21 of the light source structure 1.
  • the light path guiding element 76 is configured to guide the light beam emitted from the light emitting body 26 in the diffused light emitting region 21 in a divergent manner and irradiate the diffusion portion 710 on the light beam modulation element 71.
  • the arrangement of the light path guiding element 76 is to avoid that in the technical solution in which the flood light emitting region 21 and the pattern light emitting region 24 of the light source structure 1 are relatively close, a part of the light beam emitted from the flood light emitting region 21 is subjected to beam modulation.
  • the patterned portion 712 of the element 71 forms a diffracted light beam with uneven intensity, thereby affecting the uniformity of the flood light beam.
  • the light path guiding element 76 includes, but is not limited to, a prism, a microlens, and a grating.
  • the setting area of the light path guiding element 76 is consistent with the flood light emitting area 21 of the light source structure 1.
  • an eighth embodiment of the present invention provides an optical projection module 8, which is basically the same as the optical projection module 6 in the sixth embodiment.
  • the difference lies in the diffusion of the beam modulation element 81.
  • the portion 810 and the patterned portion 812 are formed on different transparent substrates, respectively.
  • the transparent substrate on which the patterned portion 812 is formed is defined as a patterned substrate 8123.
  • a patterned optical pattern 8120 for rearranging the light field of the light beam is formed on the patterned substrate 8123 at a position corresponding to the patterned light-emitting region 24 of the light source structure 1.
  • the patterned optical pattern 8120 is formed at a middle position of the patterned substrate 8123.
  • the transparent substrate on which the diffusion portion 810 is formed is defined as a diffusion substrate 8103.
  • a diffusion optical pattern 8100 is formed on the diffusion substrate 8103 at a position corresponding to the flood light emitting region 21 of the light source structure 1 to play a role of light diffusion.
  • the area corresponding to the patterned optical lines 8120 on the diffusion substrate 8103 and the patterned substrate 8123 remains transparent, and the area corresponding to the diffused optical lines 8100 on the patterned substrate 8123 and the diffused substrate 8103 remains transparent, which is defined as a light transmitting area 8102.
  • the light source structure 1 corresponding to the flood light emitting area 21 surrounding the pattern light emitting area 24 is provided, and the diffusion substrate 8103 is located on the periphery of the light transmitting area 8102 with the light source structure 1 flood light emitting area 21.
  • the diffusion optical lines 8100 are formed at corresponding positions.
  • the patterned substrate 8123 and the diffusion substrate 8103 may be stacked on each other, or may be separately disposed at different positions on the optical path along the projection optical path of the optical projection module 8. It can be understood that it is only necessary to ensure that the positions of the corresponding optical lines on the diffusion substrate 8103 and the patterned substrate 8123 are aligned with each other, and there is no special requirement on the arrangement order of the diffusion substrate 8103 and the patterned substrate 8123 along the projection optical path.
  • a ninth embodiment of the present invention provides a sensing device 9 for sensing spatial information of a measured target object.
  • the spatial information includes, but is not limited to, three-dimensional information on the surface of the measured target, position information of the measured target in space, size information of the measured target, and other three-dimensional stereo information related to the measured target.
  • the sensed spatial information of the measured target can be used to identify the measured target or construct a three-dimensional model of the measured target.
  • the sensing device 9 includes the optical projection module 5 and the sensing module 90 provided in the fifth to eighth embodiments.
  • the optical projection module 5 is used for projecting a specific light beam onto a measured target for sensing and identification.
  • the sensing module 90 is configured to sense a specific image projected by the optical projection module 5 on the measured target object and obtain relevant spatial information of the measured target object by analyzing the specific image.
  • the sensing device 9 is a 3D face recognition device that senses three-dimensional information on the surface of the detected target object and recognizes the identity of the detected target object accordingly.
  • the specific light beam includes a flood light beam having a uniform intensity and / or a pattern light beam capable of projecting a predetermined pattern on a measured target object.
  • the sensing module 90 recognizes whether the approaching target object is a face according to an image formed on the target object by the sensed flood light beam.
  • the sensing module 90 analyzes the three-dimensional information on the surface of the measured target according to the shape change of the preset pattern projected by the sensed pattern beam on the measured target, and faces the measured target accordingly. Department identification.
  • a tenth embodiment of the present invention provides a device 100 such as a mobile phone, a notebook computer, a tablet computer, a touch interactive screen, a door, a vehicle, a robot, an automatic numerically controlled machine tool, and the like.
  • the device 100 includes at least one sensing device 9 provided in the ninth embodiment described above.
  • the device 100 is configured to perform a corresponding function according to a sensing result of the sensing device 9.
  • the corresponding functions include, but are not limited to, any of unlocking, paying, launching a preset application, avoiding obstacles, recognizing the user's facial expressions, and using deep learning technology to determine the user's mood and health after identifying the user's identity. Or more.
  • the sensing device 9 is a 3D face recognition device that senses three-dimensional information on the surface of the detected target object and recognizes the identity of the detected target object accordingly.
  • the device 100 is an electronic terminal, such as a mobile phone, a notebook computer, a tablet computer, a touch interactive screen, a door, a vehicle, a security check, an entry-exit device, etc., which are equipped with the 3D face recognition device.
  • the light source structure 1, the optical projection module 5, the sensing device 9, and the device 100 provided by the present invention can be simulated and screened in accordance with the above-mentioned screening principles through a computer to determine the light emitting area.
  • a computer to determine the light emitting area.

Abstract

La présente invention concerne une structure de source de lumière (1), un module de projection optique (5) comprenant la structure de source de lumière (1), un dispositif de détection (9) et un appareil (100). La source de lumière (1) sert à émettre des motifs de points de lumière distribués de manière irrégulière. La structure de source de lumière (1) comprend des substrats semi-conducteurs (10, 20, 30) et de multiples unités électroluminescentes distribuées de manière irrégulière (12, 22, 32) formées sur les substrats semi-conducteurs (10, 20, 30). Des régions émettrices de lumière à motifs (14, 24, 34) sont définies sur des surfaces électroluminescentes des substrats semi-conducteurs (10, 20, 30). Les régions émettrices de lumière à motifs (14, 24, 34) sont rectangulaires. Un sommet d'un coin inférieur gauche de chacune des régions émettrices de lumière à motifs (14, 24, 34) sert d'origine (O) et des directions d'extension de deux côtés à angle droit se croisant dans le coin inférieur gauche servent d'axe d'abscisse (X) et d'axe d'ordonnées (Y), respectivement, les coordonnées étant en microns. Les multiples unités électroluminescentes (12, 22 32) sont distribuées dans les régions émettrices de lumière à motifs (14, 24, 34).
PCT/CN2018/106944 2018-09-21 2018-09-21 Structure de source de lumière, module de projection optique, dispositif de détection et appareil WO2020056722A1 (fr)

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CN201890000302.0U CN209803547U (zh) 2018-09-21 2018-09-21 一种光源结构、光学投影模组、感测装置及设备

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CN110941132B (zh) * 2018-09-21 2022-07-26 深圳阜时科技有限公司 一种光源结构、光学投影模组、感测装置及设备
WO2022241781A1 (fr) * 2021-05-21 2022-11-24 深圳市汇顶科技股份有限公司 Appareil émetteur pour détection de profondeur de temps de vol et dispositif électronique

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US20130044187A1 (en) * 2011-08-18 2013-02-21 Sick Ag 3d camera and method of monitoring a spatial zone
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