WO2020053981A1 - Work processing sheet and method of manufacturing processed work - Google Patents

Work processing sheet and method of manufacturing processed work Download PDF

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Publication number
WO2020053981A1
WO2020053981A1 PCT/JP2018/033766 JP2018033766W WO2020053981A1 WO 2020053981 A1 WO2020053981 A1 WO 2020053981A1 JP 2018033766 W JP2018033766 W JP 2018033766W WO 2020053981 A1 WO2020053981 A1 WO 2020053981A1
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WO
WIPO (PCT)
Prior art keywords
work
sensitive adhesive
pressure
processing sheet
active energy
Prior art date
Application number
PCT/JP2018/033766
Other languages
French (fr)
Japanese (ja)
Inventor
孝文 小笠原
美紗季 坂本
尚哉 佐伯
Original Assignee
リンテック株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by リンテック株式会社 filed Critical リンテック株式会社
Priority to CN201880094852.8A priority Critical patent/CN112335022A/en
Priority to PCT/JP2018/033766 priority patent/WO2020053981A1/en
Priority to JP2020546595A priority patent/JP7200260B2/en
Priority to KR1020217000674A priority patent/KR102511369B1/en
Priority to TW108101472A priority patent/TWI809031B/en
Publication of WO2020053981A1 publication Critical patent/WO2020053981A1/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836Wafer tapes, e.g. grinding or dicing support tapes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68327Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68381Details of chemical or physical process used for separating the auxiliary support from a device or wafer
    • H01L2221/68386Separation by peeling

Definitions

  • the present invention relates to a work processing sheet that can be suitably used for dicing, and a method of manufacturing a processed work using the work processing sheet.
  • semiconductor wafers such as silicon and gallium arsenide and various packages (hereinafter, these may be collectively referred to as “objects to be cut”) are manufactured in a large diameter state, and these are manufactured in small element pieces (hereinafter, referred to as “elements”). After being cut (diced) and separated (picked up) individually, the chip is transferred to the next step, a mounting step. At this time, an object to be cut such as a semiconductor wafer is subjected to dicing, washing, drying, expanding, pickup, and mounting steps in a state of being adhered to a work processing sheet having a base material and an adhesive layer. You.
  • the dicing blade, the object to be cut and the sheet for processing the work are heated by frictional heat generated between the rotating dicing blade and the object to be cut and the sheet for processing the work. Further, in the dicing step, cut pieces may be generated from the workpiece or the work processing sheet, and may adhere to the chip.
  • running water is supplied to the cut portion to cool the dicing blade and the like, and to remove generated cuttings from the chip.
  • Patent Document 1 discloses that the contact angle of pure water on the surface of the pressure-sensitive adhesive layer opposite to the substrate before irradiation with pure water is 82 ° to 114 ° in order to promote the removal of cutting pieces by such running water.
  • a work processing sheet is disclosed which has a contact angle with methylene iodide of 44 ° to 64 ° and a peak value of a probe tack test of 294 to 578 kPa in an adhesive layer before irradiation with ultraviolet rays. .
  • the present invention has been made in view of such a situation, and the pressure-sensitive adhesive derived from the pressure-sensitive adhesive layer attached to the processed work can be satisfactorily removed by running water, and the processed work can be removed. It is an object of the present invention to provide a work processing sheet that can be satisfactorily separated, and a method of manufacturing a processed work using the work processing sheet.
  • the present invention is a work processing sheet including a base material and an adhesive layer laminated on one surface side of the base material, wherein the adhesive layer has an active layer.
  • An energy ray-curable pressure-sensitive adhesive, the water contact angle of the surface of the pressure-sensitive adhesive layer opposite to the substrate is more than 80 °, and the adhesive force of the work processing sheet to the silicon wafer is reduced.
  • 5000 mN / 25 mm or less a non-woven fabric impregnated with methyl ethyl ketone is laminated on the surface of the pressure-sensitive adhesive layer opposite to the substrate, and left standing for 15 minutes in an environment of 23 ° C. and 50% relative humidity. After that, the surface was wiped off with the nonwoven fabric, and allowed to stand for 1 hour in an environment of 23 ° C. and a relative humidity of 50%. ° or less That provides a work processing sheet (invention 1).
  • the water contact angle of the surface of the pressure-sensitive adhesive layer opposite to the substrate (hereinafter, may be referred to as a “pressure-sensitive surface”) before the wiping described above is in the above range.
  • the adhesive surface has an appropriate hydrophobicity, and the work after processing can be easily separated satisfactorily.
  • the adhesive force of the work processing sheet to the silicon wafer is within the above range, and the water contact angle after wiping is within the above range, so that the adhesive force of the adhesive adhered to the processed work is water.
  • the pressure-sensitive adhesive adhered to the work after processing can be satisfactorily removed by running water.
  • the active energy ray-curable adhesive is preferably an adhesive formed from an adhesive composition containing an active energy ray-polymerizable branched polymer (Invention 2).
  • the pressure-sensitive adhesive composition is obtained by reacting an acrylic copolymer having a functional group-containing monomer unit with an unsaturated group-containing compound having a functional group bonded to the functional group.
  • the acrylic copolymer contains methyl acrylate, 2-methoxyethyl (meth) acrylate, and (meth) as monomer units constituting the polymer.
  • the present invention provides a laminating step of laminating a surface of the pressure-sensitive adhesive layer of the work processing sheet (Invention 1 to 4) opposite to the base material with a work; Processing the work on the sheet, a processing step of obtaining a processed work laminated on the work processing sheet, and irradiating the adhesive layer with active energy rays, the adhesive layer Curing, and an irradiation step of reducing the adhesion of the work processing sheet to the processed work, and a separation step of separating the processed work from the work processing sheet after active energy ray irradiation.
  • the present invention provides a method for producing a processed workpiece characterized by the following (Invention 5).
  • the work processing sheet according to the present invention can remove the pressure-sensitive adhesive derived from the pressure-sensitive adhesive layer attached to the processed work well by running water, and can satisfactorily separate the processed work. . Further, according to the method for manufacturing a processed work according to the present invention, it is possible to efficiently manufacture a processed work.
  • the work processing sheet according to the present embodiment includes a base material and an adhesive layer laminated on one side of the base material.
  • the water contact angle of the surface (adhesive surface) of the pressure-sensitive adhesive layer opposite to the substrate is greater than 80 °.
  • the adhesive surface has appropriate hydrophobicity, and an excessive increase in the adhesive force to the workpiece after processing the workpiece processing sheet is suppressed. This makes it possible to satisfactorily separate the processed work from the work processing sheet.
  • a silicon wafer is used as a workpiece, there are many relatively hydrophilic groups on the surface of the silicon wafer, and an adhesive surface having a moderate hydrophobicity comes into contact with this surface. Thereby, the work after processing can be easily separated.
  • the details of the method for measuring the water contact angle described above are as described in Test Examples described later.
  • the water contact angle of the adhesive surface after performing wiping with a rag containing methyl ethyl ketone is also specified, but without referring to such wiping, ⁇
  • the phrase shall mean the water contact angle measured without performing the wiping described above.
  • the pressure-sensitive adhesive layer in the present embodiment is composed of an active energy ray-curable pressure-sensitive adhesive, but the water contact angle in the present specification is any of before and after the wiping described above. In the case of, the water contact angle measured without irradiating the work processing sheet with active energy rays is also used.
  • the water contact angle is 80 ° or less, the adhesive surface has relatively high hydrophilicity, and the adhesive force to the workpiece after processing the workpiece processing sheet becomes excessively high. In this case, an excessive force is required when the work after processing is separated from the work processing sheet, and there is a possibility that a problem such as breakage of the work after processing may occur.
  • the water contact angle is preferably equal to or greater than 85 °, and particularly preferably equal to or greater than 90 °.
  • the water contact angle is preferably 120 ° or less, particularly preferably 110 ° or less.
  • the adhesive surface is prevented from having excessive hydrophobicity, and the work processing sheet easily exerts good adhesive force on the work. This has the effect that the work before or after processing is unintentionally peeled off from the work processing sheet when the work is processed or when the work or the processed work is transported in a stacked state on the work processing sheet. Is suppressed.
  • a nonwoven fabric containing methyl ethyl ketone is laminated on the adhesive surface, and left standing for 15 minutes in an environment of 23 ° C. and a relative humidity of 50%.
  • the water contact angle measured on the adhesive surface dried by wiping the surface and allowing to stand for 1 hour in an environment of 23 ° C. and 50% relative humidity is 50 ° or more and 80 ° or less. Since the water contact angle after wiping the surface of the adhesive surface as described above is within the above range, the adhesive derived from the adhesive layer adhered to the work after processing can be favorably removed by running water. Becomes
  • the reason that the water contact angle after wiping the adhesive surface is 50 ° or more and 80 ° or less, and the reason why the adhesive adhered to the processed work can be easily removed by running water is limited thereto.
  • the following can be considered.
  • a predetermined component on the surface of the adhesive surface is removed, or the adhesive constituting the adhesive layer by a predetermined thickness is removed from the surface.
  • the part that originally constituted the inside of the pressure-sensitive adhesive layer is exposed on the surface.
  • the water contact angle of the exposed surface is 50 ° or more and 80 ° or less.
  • the pressure-sensitive adhesive adheres to the work after processing.
  • the surface that comes into contact with the surface of the pressure-sensitive adhesive layer is more stochastically the surface that forms the inside of the pressure-sensitive adhesive layer than the surface that forms the surface of the pressure-sensitive adhesive layer. That is, in most cases, a surface having a water contact angle of 50 ° or more and 80 ° or less comes into contact with the processed work in the adhesive adhered to the processed work. And, since the surface having such a water contact angle shows a suitable affinity for water, by using flowing water, the above-mentioned pressure-sensitive adhesive is favorably removed from the processed work. Becomes possible.
  • the pressure-sensitive adhesive layer will exhibit an excessive affinity for water, and it will not be possible to suppress water intrusion. Occasionally, chip fly or chip breakage occurs.
  • the pressure-sensitive adhesive as a cut piece does not have an appropriate affinity for water, and the pressure-sensitive adhesive adhered to the processed workpiece is sufficiently removed by running water. It will be difficult to do.
  • the water contact angle after the wiping described above is preferably 55 ° or more, and particularly preferably 60 ° or more.
  • the water contact angle after the wiping described above is preferably 75 ° or less, particularly preferably 70 ° or less.
  • the details of the method of measuring the water contact angle after the wiping described above are as described in Test Examples described later.
  • the adhesive force of the work processing sheet to the silicon wafer is 5000 mN / 25 mm or less.
  • the adhesive strength refers to the adhesive strength in a state where the work processing sheet is not irradiated with the active energy ray and the pressure-sensitive adhesive layer is not cured.
  • the "adhesive force" described without mentioning the presence or absence of the irradiation of the active energy ray, the work processing sheet was not irradiated with the active energy ray, the pressure-sensitive adhesive layer Refers to the adhesive strength in a state where no curing has occurred. The details of the method for measuring the adhesive force of the work processing sheet to the silicon wafer are as described in Test Examples described later.
  • the adhesive force of the work processing sheet to the silicon wafer is 5000 mN / 25 mm or less, the adhesive force of the adhesive adhered as a cutting piece to the work after processing does not become excessively high.
  • the agent can be easily removed by running water.
  • the adhesive force of the work processing sheet to the silicon wafer exceeds 5000 mN / 25 mm, the adhesive is firmly adhered to the work after processing as a cutting piece, and even if running water is used, the adhesive is not sufficiently applied. It is difficult to remove the ash.
  • the adhesive force of the work processing sheet to the silicon wafer is preferably 4500 mN / 25 mm or less, and particularly preferably 3000 mN / 25 mm or less.
  • the adhesive force of the work processing sheet to the silicon wafer is preferably 1000 mN / 25 mm or more, particularly preferably 1200 mN / 25 mm or more, and further preferably 1500 mN / 25 mm or more.
  • the adhesive force of the work processing sheet to the silicon wafer is 1000 mN / 25 mm or more, the work to be processed can be satisfactorily held on the work processing sheet.
  • the peeling of the work before or after the processing can be favorably suppressed.
  • the work after processing is a chip, it is possible to favorably suppress the chip from scattering from the work processing sheet.
  • the work processing sheet has an adhesive force to the silicon wafer of 65 mN / 25 mm or less after irradiating the work processing sheet with the active energy ray.
  • the adhesive force is 65 mN / 25 mm or less, it is easier to separate the processed work from the work processing sheet by irradiating the work processing sheet with active energy rays after the work processing is completed. Become.
  • the base material exhibits a desired function in a process of using the work processing sheet, and preferably cures the pressure-sensitive adhesive layer.
  • the pressure-sensitive adhesive layer There is no particular limitation as long as it exhibits good permeability to active energy rays irradiated for the purpose.
  • the base material is preferably a resin film mainly composed of a resin material, and specific examples thereof include an ethylene-vinyl acetate copolymer film; an ethylene- (meth) acrylic acid copolymer film, Ethylene copolymer films such as ethylene-methyl (meth) acrylate copolymer film and other ethylene- (meth) acrylate copolymer films; polyethylene film, polypropylene film, polybutene film, polybutadiene film, polymethylpentene Polyolefin films such as films, ethylene-norbornene copolymer films and norbornene resin films; polyvinyl chloride films such as polyvinyl chloride films and vinyl chloride copolymer films; polyethylene terephthalate films, polybutylene tele (Meth) acrylic acid ester copolymer film; polyurethane film; polyimide film; polystyrene films; polycarbonate films; tallate film, polyester films such as polyethylene na
  • the polyethylene film examples include a low density polyethylene (LDPE) film, a linear low density polyethylene (LLDPE) film, a high density polyethylene (HDPE) film, and the like. Further, modified films such as crosslinked films and ionomer films are also used.
  • the substrate may be a laminated film in which a plurality of the above-described films are laminated. In this laminated film, the materials constituting each layer may be the same or different. As the substrate, among the above films, it is preferable to use an ethylene-methyl methacrylate copolymer film from the viewpoint of excellent flexibility.
  • (meth) acrylic acid in this specification means both acrylic acid and methacrylic acid. The same applies to other similar terms.
  • the base material may contain various additives such as a flame retardant, a plasticizer, an antistatic agent, a lubricant, an antioxidant, a colorant, an infrared absorber, an ultraviolet absorber, and an ion scavenger.
  • a flame retardant such as a flame retardant, a plasticizer, an antistatic agent, a lubricant, an antioxidant, a colorant, an infrared absorber, an ultraviolet absorber, and an ion scavenger.
  • the content of these additives is not particularly limited, but is preferably in a range where the base material exhibits a desired function.
  • the surface of the base material on which the pressure-sensitive adhesive layer is laminated may be subjected to a surface treatment such as a primer treatment, a corona treatment, and a plasma treatment in order to increase the adhesion to the pressure-sensitive adhesive layer.
  • a surface treatment such as a primer treatment, a corona treatment, and a plasma treatment in order to increase the adhesion to the pressure-sensitive adhesive layer.
  • the thickness of the base material can be appropriately set according to the method in which the work processing sheet is used, but is usually preferably 20 ⁇ m or more, and particularly preferably 25 ⁇ m or more. In addition, the thickness is usually preferably 450 ⁇ m or less, and particularly preferably 300 ⁇ m or less.
  • the pressure-sensitive adhesive layer is formed of an active energy ray-curable pressure-sensitive adhesive, and can achieve the above-mentioned pressure-sensitive adhesive strength. There is no particular limitation as long as a water contact angle before and after wiping can be achieved.
  • the pressure-sensitive adhesive layer is formed of an active energy ray-curable pressure-sensitive adhesive, the processed work and the pressure-sensitive adhesive surface adhered to the pressure-sensitive adhesive surface of the pressure-sensitive adhesive layer.
  • the pressure-sensitive adhesive layer is cured by irradiating active energy rays to reduce the adhesive force of the work sheet to the work after processing. This facilitates separation of the pressure-sensitive adhesive surface of the pressure-sensitive adhesive layer from the processed work.
  • the pressure-sensitive adhesive layer in the present embodiment may be formed from a pressure-sensitive adhesive composition containing a polymer having an active energy ray-curable property, or may be an active energy ray non-curable polymer (active energy ray-curable property). (Polymer having no active polymer) and a monomer and / or oligomer having at least one active energy ray-curable group.
  • the pressure-sensitive adhesive layer in this embodiment is formed from a pressure-sensitive adhesive composition containing a polymer having active energy ray curability will be described below.
  • the active energy ray-curable polymer is a (meth) acrylate (co) polymer (A) (hereinafter, referred to as a (meth) acrylate) having a functional group (active energy ray-curable group) having an active energy ray-curable side chain introduced therein.
  • Active energy ray-curable polymer (A) comprises an acrylic copolymer (a1) having a functional group-containing monomer unit and an unsaturated group-containing compound (a2) having a functional group bonded to the functional group. It is preferably obtained by reacting.
  • the acrylic copolymer (a1) may be, as a monomer unit constituting the polymer, a monomer for adjusting the hydrophilicity of the acrylic copolymer (a1) (hereinafter, may be referred to as a “hydrophilicity adjusting monomer”). ), And specific examples thereof include methyl acrylate, 2-methoxyethyl (meth) acrylate, ethyl carbitol (meth) acrylate (ethoxyethoxyethyl (meth) acrylate) and (meth). ) It is preferable to include at least one selected from methoxyethylene glycol acrylate.
  • the acrylic copolymer (a1) includes, as monomer units constituting the polymer, methyl acrylate, 2-methoxyethyl acrylate and methoxy acrylate among the above-mentioned monomers. It is preferable to include at least one kind of ethylene glycol.
  • the content of methyl acrylate is preferably at least 10% by mass, particularly preferably at least 20% by mass. , And more preferably 30% by mass or more. Further, the content of methyl acrylate is preferably 85% by mass or less. With these contents, in the formed pressure-sensitive adhesive layer, the water contact angle and the adhesive force before and after the wiping described above can be easily adjusted respectively in the above-described ranges.
  • the content (% by mass) of methyl acrylate described above means the content based on all the monomers constituting the acrylic copolymer (a1). Further, the content (% by mass) of the other monomers described below means the content based on all the monomers constituting the acrylic copolymer (a1).
  • the acrylic copolymer (a1) contains 2-methoxyethyl acrylate as a monomer unit constituting the polymer
  • the content of 2-methoxyethyl acrylate is preferably 10% by mass or more, In particular, it is preferably at least 20% by mass, and more preferably at least 30% by mass.
  • the content of 2-methoxyethyl acrylate is preferably 85% by mass or less, particularly preferably 80% by mass or less, and further preferably 70% by mass or less.
  • the acrylic copolymer (a1) contains both methyl acrylate and 2-methoxyethyl acrylate as monomer units constituting the polymer, the content of methyl acrylate and 2-methoxyethyl acrylate is reduced.
  • the total value is preferably 10% by mass or more, particularly preferably 30% by mass or more, and further preferably 50% by mass or more. Further, the total value is preferably 90% by mass or less, particularly preferably 85% by mass or less. When the total value is within these ranges, it is easy to adjust the water contact angle and the adhesive force before and after the wiping described above in the above-described ranges, respectively, in the formed pressure-sensitive adhesive layer.
  • the acrylic copolymer (a1) contains methoxyethylene glycol acrylate as a monomer unit constituting the polymer
  • the content of methoxyethylene glycol acrylate is preferably 10% by mass or more, and particularly preferably 30% by mass or more. It is preferable that the amount is at least mass%.
  • the content of methoxyethylene glycol acrylate is preferably 85% by mass or less, particularly preferably 80% by mass or less.
  • the acrylic copolymer (a1) preferably contains a structural unit derived from a functional group-containing monomer and a structural unit derived from a (meth) acrylate monomer or a derivative thereof, in addition to the hydrophilicity-adjusting monomer described above. .
  • the functional group-containing monomer as a constituent unit of the acrylic copolymer (a1) has a polymerizable double bond and a functional group such as a hydroxy group, a carboxy group, an amino group, a substituted amino group, and an epoxy group in a molecule. And among them, it is preferable to contain at least one of a hydroxy group-containing monomer, an amino group-containing monomer and a substituted amino group-containing monomer.
  • hydroxy group-containing monomer examples include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, Examples thereof include 3-hydroxybutyl (meth) acrylate and 4-hydroxybutyl (meth) acrylate, which may be used alone or in combination of two or more.
  • amino group-containing monomer or substituted amino group-containing monomer examples include aminoethyl (meth) acrylate, n-butylaminoethyl (meth) acrylate, and the like. These may be used alone or in combination of two or more.
  • the carboxy group-containing monomer examples include acrylic acid, methacrylic acid, crotonic acid, maleic acid, itaconic acid, ethylenically unsaturated carboxylic acids such as citraconic acid, and these may be used alone or Two or more kinds may be used in combination.
  • the acrylic copolymer (a1) preferably does not contain a carboxy group-containing monomer. When the acrylic copolymer (a1) does not contain a carboxy group-containing monomer, the adjustment of the water contact angle becomes easier.
  • the acrylic copolymer (a1) preferably contains 1% by mass or more, more preferably 5% by mass or more, and further preferably 10% by mass or more of a structural unit derived from the functional group-containing monomer. Is preferred. Further, the acrylic copolymer (a1) preferably contains the structural unit derived from the functional group-containing monomer in an amount of 35% by mass or less, particularly preferably 30% by mass or less.
  • Examples of the (meth) acrylic acid ester monomer constituting the acrylic copolymer (a1) include, in addition to (meth) acrylic acid alkyl esters having an alkyl group having 1 to 20 carbon atoms, for example, an alicyclic compound in the molecule.
  • a monomer having a structure is preferably used.
  • alkyl (meth) acrylate alkyl (meth) acrylates having an alkyl group having 1 to 18 carbon atoms, such as methyl methacrylate, ethyl (meth) acrylate, propyl (meth) acrylate, N-butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate and the like are preferably used. These may be used alone or in combination of two or more.
  • Examples of the alicyclic structure-containing monomer include cyclohexyl (meth) acrylate, dicyclopentanyl (meth) acrylate, adamantyl (meth) acrylate, isobornyl (meth) acrylate, and dicyclopentenyl (meth) acrylate. And dicyclopentenyloxyethyl (meth) acrylate are preferably used. These may be used alone or in combination of two or more.
  • the acrylic copolymer (a1) preferably contains 50% by mass or more, and particularly preferably 60% by mass or more, of a structural unit derived from a (meth) acrylate monomer or a derivative thereof. Further, the content is preferably 70% by mass or more. Further, the acrylic copolymer (a1) preferably contains 99% by mass or less, and particularly preferably 95% by mass or less, of a structural unit derived from a (meth) acrylate monomer or a derivative thereof. Preferably, the content is more preferably 90% by mass or less.
  • the acrylic copolymer (a1) can preferably be obtained by copolymerizing the above-mentioned hydrophilicity-adjusting monomer, a functional group-containing monomer, and a (meth) acrylic acid ester monomer or a derivative thereof by an ordinary method.
  • dimethylacrylamide, vinyl formate, vinyl acetate, styrene and the like may be copolymerized.
  • an active energy ray-curable polymer ( A) is obtained.
  • the functional group of the unsaturated group-containing compound (a2) can be appropriately selected according to the type of the functional group of the functional group-containing monomer unit of the acrylic copolymer (a1).
  • the functional group of the acrylic copolymer (a1) is a hydroxy group, an amino group or a substituted amino group
  • the functional group of the unsaturated group-containing compound (a2) is preferably an isocyanate group or an epoxy group.
  • the functional group of the copolymer (a1) is an epoxy group
  • the functional group of the unsaturated group-containing compound (a2) is preferably an amino group, a carboxy group, or an aziridinyl group.
  • the unsaturated group-containing compound (a2) contains at least one, preferably 1 to 6, more preferably 1 to 4, active energy ray-polymerizable carbon-carbon double bonds per molecule.
  • an unsaturated group-containing compound (a2) include, for example, 2-methacryloyloxyethyl isocyanate, meth-isopropenyl- ⁇ , ⁇ -dimethylbenzyl isocyanate, methacryloyl isocyanate, allyl isocyanate, 1,1- ( Bisacryloyloxymethyl) ethyl isocyanate; acryloyl monoisocyanate compound obtained by reacting a diisocyanate compound or polyisocyanate compound with hydroxyethyl (meth) acrylate; a diisocyanate compound or polyisocyanate compound, a polyol compound, and (meth) acrylic Acryloyl monoisocyanate compound obtained by reaction with hydroxyethyl acrylate;
  • the unsaturated group-containing compound (a2) is preferably at least 50 mol%, particularly preferably at least 60 mol%, more preferably at least 50 mol%, based on the number of moles of the functional group-containing monomer of the acrylic copolymer (a1). It is used in a proportion of 70 mol% or more.
  • the unsaturated group-containing compound (a2) is preferably at most 95 mol%, particularly preferably at most 93 mol%, based on the number of moles of the functional group-containing monomer of the acrylic copolymer (a1). Preferably, it is used in a proportion of 90 mol% or less.
  • the reaction between the acrylic copolymer (a1) and the unsaturated group-containing compound (a2) the reaction between the functional group of the acrylic copolymer (a1) and the functional group of the unsaturated group-containing compound (a2) is performed.
  • the reaction temperature, pressure, solvent, time, presence or absence of catalyst, and type of catalyst can be appropriately selected.
  • the functional group present in the acrylic copolymer (a1) reacts with the functional group in the unsaturated group-containing compound (a2), and the unsaturated group in the acrylic copolymer (a1)
  • the active energy ray-curable polymer (A) which is introduced into the side chain is obtained.
  • the weight average molecular weight (Mw) of the active energy ray-curable polymer (A) thus obtained is preferably at least 10,000, particularly preferably at least 150,000, and more preferably at least 200,000. Preferably it is. Further, the weight average molecular weight (Mw) is preferably 1.5 million or less, particularly preferably 1,000,000 or less.
  • the weight average molecular weight (Mw) in the present specification is a value in terms of standard polystyrene measured by gel permeation chromatography (GPC).
  • the pressure-sensitive adhesive composition according to the present embodiment contains a polymer having an active energy ray-curable property such as an active energy ray-curable polymer (A), the pressure-sensitive adhesive composition has an active energy ray-curable property. (B) may further be contained.
  • active energy ray-curable monomer and / or oligomer (B) for example, an ester of a polyhydric alcohol and (meth) acrylic acid can be used.
  • Examples of such an active energy ray-curable monomer and / or oligomer (B) include monofunctional acrylates such as cyclohexyl (meth) acrylate and isobornyl (meth) acrylate; trimethylolpropane tri (meth) acrylate; Pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, polyethylene Polyfunctional acrylates such as glycol di (meth) acrylate, dimethylol tricyclodecane di (meth) acrylate, polyester oligo (meth) acrylate, polyurethane oligo ( Data) acrylate, and the like.
  • monofunctional acrylates such as
  • the active energy ray-curable monomer and / or oligomer (B) When an active energy ray-curable monomer and / or oligomer (B) is blended together with the active energy ray-curable polymer (A), the active energy ray-curable monomer and / or oligomer (B ) Is preferably more than 0 parts by mass, particularly preferably 60 parts by mass or more, based on 100 parts by mass of the active energy ray-curable polymer (A). Further, the content is preferably 250 parts by mass or less, and particularly preferably 200 parts by mass or less, based on 100 parts by mass of the active energy ray-curable polymer (A).
  • the pressure-sensitive adhesive composition according to the present embodiment preferably contains a photopolymerization initiator (C).
  • C photopolymerization initiator
  • photopolymerization initiator (C) examples include benzophenone, acetophenone, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzoin benzoic acid, methyl benzoin benzoate, benzoin dimethyl ketal, 2,4-diethylthioxanthone, 1-hydroxycyclohexyl phenyl ketone, benzyl diphenyl sulfide, tetramethyl thiuram monosulfide, azobisisobutyronitrile, benzyl, dibenzyl, diacetyl, ⁇ -chloranthraquinone, (2,4 6-trimethylbenzyldiphenyl) phosphine oxide, 2-benzothiazole-N, N-diethyldithiocarbamate, oligo ⁇ 2-hydroxy-2-me Le-1- [4
  • the content of the photopolymerization initiator (C) in the pressure-sensitive adhesive composition is determined based on the amount of the active energy ray-curable polymer (A) (when the active energy ray-curable monomer and / or oligomer (B) is blended, It is preferably 0.1 part by mass or more based on 100 parts by mass of the active energy ray-curable polymer (A) and the active energy ray-curable monomer and / or oligomer (B) (100 parts by mass in total). In particular, it is preferably at least 0.5 part by mass.
  • the content of the active energy ray-curable polymer (A) (when the active energy ray-curable monomer and / or oligomer (B) is blended, the active energy ray-curable polymer (A) The amount is preferably 10 parts by mass or less, particularly preferably 6 parts by mass or less, based on 100 parts by mass of the active energy ray-curable monomer and / or oligomer (B) (100 parts by mass in total).
  • the pressure-sensitive adhesive composition of the present embodiment preferably contains an additive (D) for adjusting the water contact angle on the surface of the pressure-sensitive adhesive layer.
  • additives include an active energy ray-polymerizable branched polymer, a branched polymer, and an epoxy resin.
  • the water contact angle on the surface of the pressure-sensitive adhesive layer is adjusted to the above-described range. From the viewpoint of easiness, it is preferable to use an active energy ray-polymerizable branched polymer.
  • the active energy ray polymerizable branched polymer is a kind of active energy ray polymerizable compound, and means a polymer having an active energy ray polymerizable group and a branched structure. Since the pressure-sensitive adhesive layer in this embodiment is formed from the pressure-sensitive adhesive composition containing the active energy ray-polymerizable branched polymer, the water contact angle on the surface of the pressure-sensitive adhesive layer (the water contact angle before wiping described above). ) Is more than 80 °, and the water contact angle after the wiping is set to 50 ° or more and 80 ° or less. The reason for this is not limited thereto, but may be as follows.
  • the active energy ray-polymerizable branched polymer tends to be unevenly distributed on the surface side in the pressure-sensitive adhesive layer. Therefore, in the formed pressure-sensitive adhesive layer, the closer to the surface as compared to the inside, the more the content of the active energy ray-polymerizable branched polymer is present.
  • the active energy ray polymerizable branched polymer itself is a component having a high tendency to be hydrophobic
  • the surface of the pressure-sensitive adhesive layer in which the active energy ray polymerizable branched polymer is more present has a water contact of more than 80 °.
  • the corner can be easily achieved.
  • a water contact angle of 50 ° or more and 80 ° or less can be easily achieved. As described above, it is easy to achieve different water contact angles before and after wiping.
  • the pressure-sensitive adhesive layer in the present embodiment is formed from the pressure-sensitive adhesive composition containing the active energy ray-polymerizable branched polymer, the surface of the pressure-sensitive adhesive layer becomes relatively hydrophobic, Thereby, the adhesive force of the work processing sheet to the silicon wafer can be easily adjusted to the above-described range, and the processed work can be easily separated from the work processing sheet. Further, since the active energy ray polymerizable branched polymer has an active energy ray polymerizable group, when the work processing sheet is irradiated with the active energy ray, the active energy ray polymerizable branched polymer is not active or active.
  • a polymerization reaction can occur between the energy beam polymerizable branched polymer and the component having an active energy beam curable group, thereby suppressing migration of the active energy beam polymerizable branched polymer to a work after processing.
  • the pressure-sensitive adhesive layer after the irradiation with the active energy rays becomes more hardened, and it becomes easy to effectively separate the processed work from the work processing sheet.
  • the active energy ray polymerizable branched polymer has a specific structure (for example, the degree of the branched structure, the active energy contained in one molecule) as long as the polymer has an active energy ray polymerizable group and a branched structure.
  • the number of linear polymerizable groups is not particularly limited.
  • a method for obtaining such an active energy ray polymerizable branched polymer for example, a monomer having two or more radical polymerizable double bonds in a molecule, an active hydrogen group and one radical polymerizable double bond are used.
  • a branched structure which is obtained by polymerizing a monomer having the following formula in the molecule and a monomer having one radical polymerizable double bond in the molecule, reacts with an active hydrogen group to form a bond It can be obtained by reacting a compound having a possible functional group and at least one radically polymerizable double bond in the molecule.
  • the above-mentioned three types of monomers may be (meth) acrylic acid esters or (meth) acrylic acid, respectively.
  • the active energy ray-polymerizable branched polymer is an acrylic polymer.
  • the weight average molecular weight of the active energy ray-polymerizable branched polymer is preferably 1,000 or more, and particularly preferably 3,000 or more. Further, the weight average molecular weight is preferably 100,000 or less, and particularly preferably 30,000 or less. When the weight average molecular weight is in the above-described range, the water contact angle on the surface of the pressure-sensitive adhesive layer can be easily adjusted to the above-described range.
  • the content of the additive (D) in the pressure-sensitive adhesive composition is 100 parts by mass of the active energy ray-curable polymer (A) (when the active energy ray-curable monomer and / or oligomer (B) is blended).
  • the total amount of the active energy ray-curable polymer (A) and the active energy ray-curable monomer and / or oligomer (B) is 100 parts by mass), and is preferably 0.05 part by mass or more. It is preferably at least 0.1 part by mass.
  • the content is 100 parts by mass of the active energy ray-curable polymer (A) (when the active energy ray-curable monomer and / or oligomer (B) is blended, the active energy ray-curable polymer (A) (A) and 100 parts by mass of the active energy ray-curable monomer and / or oligomer (B)), preferably 1 part by mass or less, particularly preferably 0.5 part by mass or less.
  • the content of the additive (D) is in the above-described range, the water contact angle on the surface of the pressure-sensitive adhesive layer can be easily adjusted to the above-described range.
  • the pressure-sensitive adhesive composition according to the present embodiment may optionally contain other components in addition to the components described above.
  • Other components include, for example, an active energy ray non-curable polymer component or oligomer component (E), a crosslinking agent (F), and the like.
  • Examples of the active energy ray non-curable polymer component or oligomer component (E) include polyacrylates, polyesters, polyurethanes, polycarbonates, polyolefins, etc., and polymers or polymers having a weight average molecular weight (Mw) of 3,000 to 2,500,000. Oligomers are preferred.
  • Mw weight average molecular weight
  • Oligomers are preferred.
  • the amount of the component (E) is not particularly limited, and is appropriately determined within a range of more than 0 parts by mass and 50 parts by mass or less based on 100 parts by mass of the active energy ray-curable polymer (A).
  • a polyfunctional compound having reactivity with a functional group of the active energy ray-curable polymer (A) or the like can be used.
  • examples of such polyfunctional compounds include isocyanate compounds, epoxy compounds, amine compounds, melamine compounds, aziridine compounds, hydrazine compounds, aldehyde compounds, oxazoline compounds, metal alkoxide compounds, metal chelate compounds, metal salts, ammonium salts, Reactive phenol resins and the like can be mentioned.
  • the compounding amount of the crosslinking agent (F) is preferably at least 0.01 part by mass, more preferably at least 3 parts by mass, based on 100 parts by mass of the active energy ray-curable polymer (A). Further, the compounding amount of the crosslinking agent (F) is preferably 20 parts by mass or less, particularly preferably 17 parts by mass or less based on 100 parts by mass of the active energy ray-curable polymer (A).
  • the pressure-sensitive adhesive layer in the present embodiment is formed from a pressure-sensitive adhesive composition containing an active energy ray non-curable polymer component and a monomer and / or oligomer having at least one or more active energy ray-curable groups.
  • a description will be given of a case in which the information is obtained.
  • the active energy ray non-curable polymer component for example, the same component as the above-mentioned acrylic copolymer (a1) can be used.
  • the same as the above-mentioned component (B) can be selected.
  • the compounding ratio of the active energy ray non-curable polymer component and the monomer and / or oligomer having at least one active energy ray curable group is at least 1 with respect to 100 parts by mass of the active energy ray non-curable polymer component.
  • the amount of the monomer and / or oligomer having two or more active energy ray-curable groups is preferably 1 part by mass or more, and particularly preferably 60 parts by mass or more.
  • the mixing ratio is preferably 200 parts by mass or less of a monomer and / or oligomer having at least one or more active energy ray-curable groups, based on 100 parts by mass of the active energy ray non-curable polymer component.
  • the amount is preferably 160 parts by mass or less.
  • the photopolymerization initiator (C), the additive (D), and the crosslinking agent (F) can be appropriately compounded.
  • the thickness of the pressure-sensitive adhesive layer is preferably 1 ⁇ m or more, and more preferably 5 ⁇ m or more. Further, the thickness is preferably 50 ⁇ m or less, and more preferably 40 ⁇ m or less. When the thickness of the pressure-sensitive adhesive layer is within the above range, the above-mentioned pressure-sensitive adhesive strength can be easily achieved.
  • a release sheet may be laminated on the surface for the purpose of protecting the adhesive surface of the adhesive layer until the adhesive surface is attached to the work.
  • the configuration of the release sheet is arbitrary, and examples thereof include those obtained by subjecting a plastic film to a release treatment with a release agent or the like.
  • Specific examples of the plastic film include polyester films such as polyethylene terephthalate, polybutylene terephthalate, and polyethylene naphthalate, and polyolefin films such as polypropylene and polyethylene.
  • a silicone-based, fluorine-based, long-chain alkyl-based or the like can be used, and among these, a silicone-based one that is inexpensive and provides stable performance is preferable.
  • the thickness of the release sheet is not particularly limited, but is usually 20 ⁇ m or more and 250 ⁇ m or less.
  • the adhesive layer may be laminated on the adhesive surface of the adhesive layer.
  • the work processing sheet according to the present embodiment can be used as a dicing die bonding sheet by providing the adhesive layer as described above.
  • a work is attached to a surface of the adhesive layer opposite to the pressure-sensitive adhesive layer, and the adhesive layer diced together with the work is laminated, so that the individualized adhesive layers are laminated. Chips can be obtained. The chip can be easily fixed to an object on which the chip is mounted by the separated adhesive layer.
  • Examples of the material constituting the above-mentioned adhesive layer include a material containing a thermoplastic resin and a low-molecular-weight thermosetting adhesive component, and a material containing a B-stage (semi-cured) thermosetting adhesive component. Preferably, it is used.
  • a protective film forming layer may be laminated on the adhesive surface of the adhesive layer.
  • the work processing sheet according to the present embodiment can be used as a protective film forming and dicing sheet.
  • a work is adhered to the surface of the protective film forming layer opposite to the pressure-sensitive adhesive layer, and the protective film forming layer is diced together with the work to form an individualized protective film.
  • a chip having stacked layers can be obtained.
  • the protective film forming layer is preferably made of an uncured curable adhesive.
  • the work processing sheet according to the embodiment of the present application satisfies the water contact angle and the adhesive force before and after the wiping described above.
  • the adhesive layer or the protective film forming layer is laminated on the adhesive layer.
  • the pressure-sensitive adhesive layer before these layers are laminated may satisfy the water contact angle and the adhesive force before and after the wiping described above.
  • Method for manufacturing work processing sheet is not particularly limited, and preferably, the work processing sheet according to the present embodiment has a pressure-sensitive adhesive layer laminated on one side of a base material. It is manufactured by doing.
  • ⁇ ⁇ Lamination of the pressure-sensitive adhesive layer on one side of the substrate can be performed by a known method. For example, it is preferable to transfer the pressure-sensitive adhesive layer formed on the release sheet to one side of the substrate.
  • a pressure-sensitive adhesive composition constituting the pressure-sensitive adhesive layer and, if desired, a coating liquid further containing a solvent or a dispersion medium are prepared, and a release-treated surface of a release sheet (hereinafter sometimes referred to as a “release surface”). )), A coating film is formed thereon by applying the coating liquid using a die coater, a curtain coater, a spray coater, a slit coater, a knife coater, or the like, and the coated film is dried to form an adhesive layer.
  • the properties of the coating liquid are not particularly limited as long as coating can be performed, and the coating liquid may contain a component for forming the pressure-sensitive adhesive layer as a solute or may contain a component as a dispersoid.
  • the release sheet in this laminate may be peeled off as a process material, or may be used to protect the adhesive surface of the pressure-sensitive adhesive layer until the work processing sheet is attached to the work.
  • the coating liquid for forming the pressure-sensitive adhesive layer contains a cross-linking agent
  • a cross-linking agent by changing the above-mentioned drying conditions (temperature, time, etc.), or by separately providing a heat treatment,
  • the cross-linking reaction between the active energy ray-curable polymer (A) or the active energy ray non-curable polymer and the cross-linking agent may be advanced to form a cross-linked structure with a desired density in the pressure-sensitive adhesive layer.
  • the obtained work processing sheet is placed in an environment of, for example, 23 ° C. and 50% relative humidity for several days. Curing such as standing still may be performed.
  • the pressure-sensitive adhesive layer may be directly formed on the substrate.
  • the coating liquid for forming the pressure-sensitive adhesive layer described above is applied to one side of the substrate to form a coating film, and the coating film is dried to form the pressure-sensitive adhesive layer.
  • the work processing sheet according to the present embodiment can be used for processing a work. That is, after attaching the adhesive surface of the work processing sheet according to the present embodiment to the work, the work can be processed on the work processing sheet. Depending on the processing, the work processing sheet according to the present embodiment can be used as a back grinding sheet, a dicing sheet, an expanded sheet, a pickup sheet, or the like.
  • the work include a semiconductor member such as a semiconductor wafer and a semiconductor package, and a glass member such as a glass plate.
  • the work processing sheet according to the present embodiment includes the above-described adhesive layer
  • the work processing sheet can be used as a dicing die bonding sheet.
  • the work processing sheet according to the present embodiment includes the above-described protective film forming layer
  • the work processing sheet can be used as a protective film formation and dicing sheet.
  • the adhesive force of the work processing sheet to the silicon wafer is in the above-described range, and the water contact angle after wiping is in the above-described range. Even if the constituent adhesive adheres to the work after processing, the adhesive can be satisfactorily removed by running water. Further, when the water contact angle on the adhesive surface before the wiping described above is in the above-described range, the work after processing can be easily separated well. Therefore, the work processing sheet according to the present embodiment is preferably used for processing in which running water is used, and is particularly preferably used for dicing involving supplying running water to a cut portion. is there. That is, the work processing sheet according to the present embodiment is preferably used as a dicing sheet.
  • the work processing sheet according to the present embodiment is used as a dicing sheet
  • general conditions can be used as dicing conditions and running water supply conditions.
  • the supply conditions of running water it is preferable to use pure water or the like as water to be used.
  • the supply amount of water is preferably 0.5 L / min or more, particularly preferably 1 L / min or more. Further, the supply amount of water is preferably 2.5 L / min or less, particularly preferably 2 L / min or less.
  • the temperature of the water is not particularly limited, and is preferably, for example, about room temperature.
  • the method for manufacturing a processed work includes a laminating step of laminating the surface of the pressure-sensitive adhesive layer of the work processing sheet opposite to the base material and the work, Processing the work on the work sheet to obtain a processed work laminated on the work processing sheet, and irradiating the adhesive layer with active energy rays to cure the adhesive layer An irradiation step of reducing the adhesive force of the work processing sheet to the processed work, and a separation step of separating the processed work from the work processing sheet after irradiation with the active energy ray.
  • the work processing sheet used in the method of manufacturing a processed work according to the present embodiment even when the pressure-sensitive adhesive constituting the pressure-sensitive adhesive layer adheres to the work after processing, satisfactorily removes the pressure-sensitive adhesive by flowing water. It can be removed and easily separates the processed work. Therefore, according to the method for manufacturing a processed work of the present embodiment, it is possible to efficiently manufacture the processed work.
  • the laminating of the work and the work processing sheet in the laminating step can be performed by a conventionally known method. In the case of performing the work dicing in the subsequent processing step, it is preferable to bond a ring frame to a region on the pressure-sensitive adhesive layer side of the work processing sheet on the outer peripheral side of the region where the work is bonded. .
  • the work to be used may be a desired work according to the processed work to be manufactured, and as a specific example, the above-described work can be used.
  • processing Step desired processing can be performed on the work, and for example, back grinding, dicing, and the like can be performed. These processes can be performed by a conventionally known method.
  • the processing in the present embodiment is preferably dicing, and particularly preferably blade dicing using a rotating blade.
  • the irradiation condition of the active energy ray is not limited as long as the adhesive force of the work processing sheet to the processed work can be reduced to a desired degree. It can be carried out.
  • the type of active energy rays used include ionizing radiation, that is, X-rays, ultraviolet rays, and electron beams. Of these, ultraviolet rays, which are relatively easy to introduce irradiation equipment, are preferable.
  • separation is performed by a method according to the type of processing and the obtained processed work. For example, when dicing is performed as processing, and when the chips obtained by singulating the work are obtained by the dicing, the obtained chips are individually separated from the work processing sheet using a conventionally known pickup device. Pick up. Further, in order to facilitate the pickup, the work processing sheet may be expanded to separate the processed works from each other.
  • steps other than the above-described steps may be provided.
  • a transporting step of transporting the laminated body of the obtained work and the work processing sheet to a predetermined position a storage step of storing the laminated body for a predetermined period, or the like may be provided.
  • a mounting step or the like for mounting the obtained processed work on a predetermined base or the like may be provided.
  • another layer may be provided between the substrate and the pressure-sensitive adhesive layer or on the surface of the substrate opposite to the pressure-sensitive adhesive layer.
  • Example 1 (1) Preparation of pressure-sensitive adhesive composition
  • the polymer was reacted with 21.4 g (corresponding to 80 mol% based on the number of moles of 2-hydroxyethyl acrylate) of methacryloyloxyethyl isocyanate (MOI) per 100 g of the acrylic copolymer.
  • MOI methacryloyloxyethyl isocyanate
  • the weight average molecular weight (Mw) of the active energy ray-curable polymer was measured by a method described later and found to be 600,000.
  • step (3) Production of work processing sheet A surface of the pressure-sensitive adhesive layer formed in step (2) opposite to the release sheet, and an 80- ⁇ m-thick ethylene-methacrylic acid copolymer (EMAA) film as a base material To obtain a workpiece processing sheet.
  • EMA ethylene-methacrylic acid copolymer
  • weight average molecular weight is a weight average molecular weight in terms of standard polystyrene measured (GPC measurement) using gel permeation chromatography (GPC).
  • Examples 2 to 7 and Comparative Examples 1 to 3 A work processing sheet was manufactured in the same manner as in Example 1, except that the composition of the acrylic copolymer, the content of the crosslinking agent, and the content of the additive were changed as shown in Table 1.
  • the release sheet was peeled off from the work processing sheets produced in Examples and Comparative Examples, exposing the pressure-sensitive adhesive layer.
  • a non-woven fabric manufactured by Asahi Kasei Corporation, product name “Bencott”, size: 250 mm ⁇ 210 mm
  • the adhesive layer is exposed while 15 mL of methyl ethyl ketone is contained. It was laminated on the surface and allowed to stand for 15 minutes in an environment of 23 ° C. and 50% relative humidity.
  • the exposed surface of the pressure-sensitive adhesive layer was wiped off with the folded nonwoven fabric as described above, and allowed to stand for 1 hour in the same environment as above to dry the exposed surface.
  • the water contact angle was measured on the surface of the pressure-sensitive adhesive layer on which the wiping treatment was performed, on the side opposite to the substrate under the same conditions as described above. The results are shown in Table 1 as water contact angles after wiping.
  • the work processing sheet was peeled off from the silicon wafer at a peeling speed of 300 mm / min and a peeling angle of 180 °, and the adhesiveness to the silicon wafer was obtained by a 180 ° peeling method according to JIS Z0237: 2009.
  • the force (mN / 25 mm) was measured.
  • Table 1 The results are shown in Table 1 as the adhesive strength before ultraviolet irradiation (before UV).
  • Test Example 4 Evaluation of separability Dicing was performed in the same manner as in Test Example 3 using the work processing sheets manufactured in Examples and Comparative Examples. After completion of dicing, the surface on the work processing sheet side is irradiated with ultraviolet rays (UV) using an ultraviolet irradiation apparatus (manufactured by Lintec, product name "RAD-2000”) (illuminance: 230 mW / cm 2 , light intensity: 190 mJ / cm 2 ) to cure the pressure-sensitive adhesive layer. Thereafter, all the obtained chips were picked up from the work processing sheet.
  • UV ultraviolet rays
  • the pressure-sensitive adhesive could be satisfactorily removed by running water, and the work after processing could be separated well.
  • the work processing sheet of the present invention can be suitably used for dicing.

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Adhesive Tapes (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Dicing (AREA)
  • Perforating, Stamping-Out Or Severing By Means Other Than Cutting (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Packaging For Recording Disks (AREA)

Abstract

A work processing sheet provided with a base material and an adhesive agent layer, wherein: the adhesive agent layer is composed of an active energy ray-curable adhesive agent; the water contact angle on a surface of the adhesive agent layer on the side opposite to the base material is more than 80°; the adhesive force of the work processing sheet with respect to a silicon wafer is not more than 5000 mN/25 mm; and, when a non-woven cloth soaked with methyl ethyl ketone is placed over the surface of the adhesive agent layer on the side opposite to the base material, and, after being left to stand in an environment of 23°C with a relative humidity of 50% for 15 minutes, the surface is wiped with the non-woven cloth and dried by being left to stand in an environment of 23°C with a relative humidity of 50% for one hour, the water contact angle measured on the surface is not less than 50° and not more than 80°. With the work processing sheet, it is possible to well remove, with running water, adhesive agent deriving from the adhesive agent layer that has become attached to the work after processing, and to well separate the work after processing.

Description

ワーク加工用シートおよび加工済みワークの製造方法Work processing sheet and method of manufacturing processed work
 本発明は、ダイシングに好適に使用することができるワーク加工用シート、および当該ワーク加工用シートを用いた加工済みワークの製造方法に関するものである。 The present invention relates to a work processing sheet that can be suitably used for dicing, and a method of manufacturing a processed work using the work processing sheet.
 シリコン、ガリウムヒ素などの半導体ウエハおよび各種パッケージ類(以下、これらをまとめて「被切断物」と記載することがある。)は、大径の状態で製造され、これらは素子小片(以下、「チップ」と記載することがある。)に切断(ダイシング)されるとともに個々に分離(ピックアップ)された後に、次の工程であるマウント工程に移される。この際、半導体ウエハ等の被切断物は、基材および粘着剤層を備えるワーク加工用シートに貼着された状態で、ダイシング、洗浄、乾燥、エキスパンディング、ピックアップおよびマウンティングの各工程に付される。 Semiconductor wafers such as silicon and gallium arsenide and various packages (hereinafter, these may be collectively referred to as “objects to be cut”) are manufactured in a large diameter state, and these are manufactured in small element pieces (hereinafter, referred to as “elements”). After being cut (diced) and separated (picked up) individually, the chip is transferred to the next step, a mounting step. At this time, an object to be cut such as a semiconductor wafer is subjected to dicing, washing, drying, expanding, pickup, and mounting steps in a state of being adhered to a work processing sheet having a base material and an adhesive layer. You.
 上述したダイシング工程では、回転するダイシングブレードと、被切断物やワーク加工用シートとの間で生じる摩擦熱により、ダイシングブレード、被切断物およびワーク加工用シートが加熱される。また、ダイシング工程では、被切断物やワーク加工用シートから切削片が生じ、それがチップに付着することがある。 In the above-mentioned dicing step, the dicing blade, the object to be cut and the sheet for processing the work are heated by frictional heat generated between the rotating dicing blade and the object to be cut and the sheet for processing the work. Further, in the dicing step, cut pieces may be generated from the workpiece or the work processing sheet, and may adhere to the chip.
 そのため、ダイシング工程を行う際には、通常、切断部分に対して流水を供給して、ダイシングブレード等を冷却するとともに、生じた切削片をチップから除去することが行われる。 Therefore, when performing the dicing step, usually, running water is supplied to the cut portion to cool the dicing blade and the like, and to remove generated cuttings from the chip.
 特許文献1には、このような流水による切削片の除去を促進する目的で、紫外線照射前の粘着剤層における基材と反対側の面の、純水に対する接触角が82°~114°であり、且つ、ヨウ化メチレンに対する接触角が44°~64°であるとともに、紫外線照射前の粘着剤層における、プローブタック試験のピーク値が294~578kPaであるワーク加工用シートが開示されている。 Patent Document 1 discloses that the contact angle of pure water on the surface of the pressure-sensitive adhesive layer opposite to the substrate before irradiation with pure water is 82 ° to 114 ° in order to promote the removal of cutting pieces by such running water. A work processing sheet is disclosed which has a contact angle with methylene iodide of 44 ° to 64 ° and a peak value of a probe tack test of 294 to 578 kPa in an adhesive layer before irradiation with ultraviolet rays. .
特許第5019657号Patent No. 5019657
 しかしながら、特許文献1に開示されるような従来のワーク加工用シートを使用してダイシング工程を行う場合、ワーク加工用シートの粘着剤層に由来する粘着剤を、加工後のワークから十分に除去することができなかった。 However, when the dicing process is performed using a conventional work processing sheet as disclosed in Patent Document 1, the pressure-sensitive adhesive derived from the pressure-sensitive adhesive layer of the work processing sheet is sufficiently removed from the processed work. I couldn't.
 また、一般的に、ピックアップ工程においてチップをワーク加工用シートから分離する際には、過度な力を要することなく分離することができ、それによりチップの破損等の不具合が生じないことが求められる。 Generally, when a chip is separated from a work processing sheet in a pick-up process, it is required that the chip can be separated without requiring excessive force, so that defects such as breakage of the chip do not occur. .
 本発明は、このような実状に鑑みてなされたものであり、加工後のワークに付着した粘着剤層に由来する粘着剤を、流水によって良好に除去することができるとともに、加工後のワークを良好に分離することが可能なワーク加工用シート、および当該ワーク加工用シートを用いた加工済みワークの製造方法を提供することを目的とする。 The present invention has been made in view of such a situation, and the pressure-sensitive adhesive derived from the pressure-sensitive adhesive layer attached to the processed work can be satisfactorily removed by running water, and the processed work can be removed. It is an object of the present invention to provide a work processing sheet that can be satisfactorily separated, and a method of manufacturing a processed work using the work processing sheet.
 上記目的を達成するために、第1に本発明は、基材と、前記基材における片面側に積層された粘着剤層とを備えるワーク加工用シートであって、前記粘着剤層が、活性エネルギー線硬化性粘着剤から構成されており、前記粘着剤層における前記基材とは反対側の面の水接触角が、80°超であり、前記ワーク加工用シートのシリコンウエハに対する粘着力が、5000mN/25mm以下であり、前記粘着剤層における前記基材とは反対側の面上に、メチルエチルケトンを含ませた不織布を積層し、23℃、相対湿度50%の環境下で15分間静置した後、上記不織布にて前記面を拭き取り、23℃、相対湿度50%の環境下で1時間静置することで乾燥させた前記面にて測定される水接触角が、50°以上、80°以下であることを特徴とするワーク加工用シートを提供する(発明1)。 In order to achieve the above object, first, the present invention is a work processing sheet including a base material and an adhesive layer laminated on one surface side of the base material, wherein the adhesive layer has an active layer. An energy ray-curable pressure-sensitive adhesive, the water contact angle of the surface of the pressure-sensitive adhesive layer opposite to the substrate is more than 80 °, and the adhesive force of the work processing sheet to the silicon wafer is reduced. 5000 mN / 25 mm or less, a non-woven fabric impregnated with methyl ethyl ketone is laminated on the surface of the pressure-sensitive adhesive layer opposite to the substrate, and left standing for 15 minutes in an environment of 23 ° C. and 50% relative humidity. After that, the surface was wiped off with the nonwoven fabric, and allowed to stand for 1 hour in an environment of 23 ° C. and a relative humidity of 50%. ° or less That provides a work processing sheet (invention 1).
 上記発明(発明1)に係るワーク加工用シートでは、粘着剤層における基材とは反対側の面(以下「粘着面」という場合がある。)の上述した拭き取り前における水接触角が上記範囲であることにより、粘着面が適度な疎水性を有するものとなり、加工後のワークを良好に分離し易いものとなる。また、ワーク加工用シートのシリコンウエハに対する粘着力が上記範囲であるとともに、上述した拭き取り後における水接触角が上記範囲であることにより、加工後のワークに付着した粘着剤の粘着力が水との接触によって適度に低減するものとなり、加工後のワークに付着した粘着剤を流水によって良好に除去することが可能となる。 In the work processing sheet according to the above invention (Invention 1), the water contact angle of the surface of the pressure-sensitive adhesive layer opposite to the substrate (hereinafter, may be referred to as a “pressure-sensitive surface”) before the wiping described above is in the above range. By virtue of this, the adhesive surface has an appropriate hydrophobicity, and the work after processing can be easily separated satisfactorily. Further, the adhesive force of the work processing sheet to the silicon wafer is within the above range, and the water contact angle after wiping is within the above range, so that the adhesive force of the adhesive adhered to the processed work is water. , And the pressure-sensitive adhesive adhered to the work after processing can be satisfactorily removed by running water.
 上記発明(発明1)において、前記活性エネルギー線硬化性粘着剤は、活性エネルギー線重合性分岐重合体を含有する粘着剤組成物から形成された粘着剤であることが好ましい(発明2)。 In the above invention (Invention 1), the active energy ray-curable adhesive is preferably an adhesive formed from an adhesive composition containing an active energy ray-polymerizable branched polymer (Invention 2).
 上記発明(発明1,2)において、前記粘着剤組成物は、官能基含有モノマー単位を有するアクリル系共重合体と、前記官能基に結合する官能基を有する不飽和基含有化合物とを反応させて得られる活性エネルギー線硬化性重合体を含有するものであり、前記アクリル系共重合体は、重合体を構成するモノマー単位として、アクリル酸メチル、(メタ)アクリル酸2-メトキシエチル、(メタ)アクリル酸エチルカルビトールおよび(メタ)アクリル酸メトキシエチレングリコールから選択される少なくとも1種を含むことが好ましい(発明3)。 In the above inventions (Inventions 1 and 2), the pressure-sensitive adhesive composition is obtained by reacting an acrylic copolymer having a functional group-containing monomer unit with an unsaturated group-containing compound having a functional group bonded to the functional group. The acrylic copolymer contains methyl acrylate, 2-methoxyethyl (meth) acrylate, and (meth) as monomer units constituting the polymer. ) It is preferable to include at least one selected from ethyl carbitol acrylate and methoxyethylene glycol (meth) acrylate (Invention 3).
 上記発明(発明1~3)においては、ダイシングシートであることが好ましい(発明4)。 に お い て In the above inventions (Inventions 1 to 3), a dicing sheet is preferable (Invention 4).
 第2に本発明は、前記ワーク加工用シート(発明1~4)の前記粘着剤層における前記基材とは反対側の面と、ワークとを貼合する貼合工程と、前記ワーク加工用シート上にて前記ワークを加工することで、前記ワーク加工用シート上に積層された加工済みワークを得る加工工程と、前記粘着剤層に対して活性エネルギー線を照射して、前記粘着剤層を硬化させ、前記加工済みワークに対する前記ワーク加工用シートの粘着力を低下させる照射工程と、活性エネルギー線照射後の前記ワーク加工用シートから、前記加工済みワークを分離する分離工程とを備えることを特徴とする加工済みワークの製造方法を提供する(発明5)。 Secondly, the present invention provides a laminating step of laminating a surface of the pressure-sensitive adhesive layer of the work processing sheet (Invention 1 to 4) opposite to the base material with a work; Processing the work on the sheet, a processing step of obtaining a processed work laminated on the work processing sheet, and irradiating the adhesive layer with active energy rays, the adhesive layer Curing, and an irradiation step of reducing the adhesion of the work processing sheet to the processed work, and a separation step of separating the processed work from the work processing sheet after active energy ray irradiation. The present invention provides a method for producing a processed workpiece characterized by the following (Invention 5).
 本発明に係るワーク加工用シートは、加工後のワークに付着した粘着剤層に由来する粘着剤を、流水によって良好に除去することができるとともに、加工後のワークを良好に分離することができる。また、本発明に係る加工済みワークの製造方法によれば、加工済みワークを効率的に製造することが可能となる。 The work processing sheet according to the present invention can remove the pressure-sensitive adhesive derived from the pressure-sensitive adhesive layer attached to the processed work well by running water, and can satisfactorily separate the processed work. . Further, according to the method for manufacturing a processed work according to the present invention, it is possible to efficiently manufacture a processed work.
 以下、本発明の実施形態について説明する。
〔ワーク加工用シート〕
 本実施形態に係るワーク加工用シートは、基材と、基材における片面側に積層された粘着剤層とを備える。
Hereinafter, embodiments of the present invention will be described.
[Work processing sheet]
The work processing sheet according to the present embodiment includes a base material and an adhesive layer laminated on one side of the base material.
1.ワーク加工用シートの物性
 本実施形態に係るワーク加工用シートでは、粘着剤層における基材とは反対側の面(粘着面)の水接触角が、80°超である。この水接触角が上記範囲であることで、粘着面が適度な疎水性を有するものとなり、ワーク加工用シートの加工後のワークに対する粘着力が過度に高くなることが抑止される。これにより、ワーク加工用シートから加工後のワークを良好に分離することが可能となる。特に、ワークとしてシリコンウエハを使用する場合、シリコンウエハの表面には比較的親水性の基が多く存在しており、この面に対して、適度な疎水性を有する粘着面が接するものとなることにより、加工後のワークを容易に分離し易いものなる。なお、上述した水接触角の測定方法の詳細は、後述する試験例に記載する通りである。
1. Physical Properties of Work Processing Sheet In the work processing sheet according to the present embodiment, the water contact angle of the surface (adhesive surface) of the pressure-sensitive adhesive layer opposite to the substrate is greater than 80 °. When the water contact angle is in the above range, the adhesive surface has appropriate hydrophobicity, and an excessive increase in the adhesive force to the workpiece after processing the workpiece processing sheet is suppressed. This makes it possible to satisfactorily separate the processed work from the work processing sheet. In particular, when a silicon wafer is used as a workpiece, there are many relatively hydrophilic groups on the surface of the silicon wafer, and an adhesive surface having a moderate hydrophobicity comes into contact with this surface. Thereby, the work after processing can be easily separated. The details of the method for measuring the water contact angle described above are as described in Test Examples described later.
 なお、本明細書では、後述するように、メチルエチルケトンを含ませたウエスによる拭き取りを行った後における粘着面の水接触角についても規定されているが、このような拭き取りに関して言及されることなく「水接触角」という語句が使用されている場合、当該語句は、上述した拭き取りを行うことなく測定された水接触角を意味するものとする。また、本実施形態における粘着剤層は活性エネルギー線硬化性粘着剤から構成されたものであるが、本明細書における水接触角は、上述した拭き取りを行う前および当該拭き取りを行った後のいずれの場合についても、ワーク加工用シートに対して活性エネルギー線を照射することなく測定された水接触角をいうものとする。 In this specification, as described later, the water contact angle of the adhesive surface after performing wiping with a rag containing methyl ethyl ketone is also specified, but without referring to such wiping, `` When the phrase "water contact angle" is used, the phrase shall mean the water contact angle measured without performing the wiping described above. Further, the pressure-sensitive adhesive layer in the present embodiment is composed of an active energy ray-curable pressure-sensitive adhesive, but the water contact angle in the present specification is any of before and after the wiping described above. In the case of, the water contact angle measured without irradiating the work processing sheet with active energy rays is also used.
 上述した水接触角が80°以下であると、粘着面が比較的高い親水性を有するものとなり、ワーク加工用シートの加工後のワークに対する粘着力が過度に高いものとなる。この場合、ワーク加工用シートから加工後のワークを引き離す際に過度な力を要するものとなり、加工後のワークの破損といった不具合が生じる可能性がある。この観点から、上記水接触角は、85°以上であることが好ましく、特に90°以上であることが好ましい。 と When the water contact angle is 80 ° or less, the adhesive surface has relatively high hydrophilicity, and the adhesive force to the workpiece after processing the workpiece processing sheet becomes excessively high. In this case, an excessive force is required when the work after processing is separated from the work processing sheet, and there is a possibility that a problem such as breakage of the work after processing may occur. In this respect, the water contact angle is preferably equal to or greater than 85 °, and particularly preferably equal to or greater than 90 °.
 また、上記水接触角は、120°以下であることが好ましく、特に110°以下であることが好ましい。上記水接触角が120°以下であることで、粘着面が過度な疎水性を有するものとなることが回避され、ワーク加工用シートがワークに対して良好な粘着力を発揮し易くなる。これにより、ワークの加工時やワーク加工用シート上にワークまたは加工後のワークを積層した状態で搬送する時などにおいて、加工前または後のワークが意図せずワーク加工用シートから剥がれることが効果的に抑制される。 The water contact angle is preferably 120 ° or less, particularly preferably 110 ° or less. When the water contact angle is 120 ° or less, the adhesive surface is prevented from having excessive hydrophobicity, and the work processing sheet easily exerts good adhesive force on the work. This has the effect that the work before or after processing is unintentionally peeled off from the work processing sheet when the work is processed or when the work or the processed work is transported in a stacked state on the work processing sheet. Is suppressed.
 本実施形態に係るワーク加工用シートでは、粘着面上に、メチルエチルケトンを含ませた不織布を積層し、23℃、相対湿度50%の環境下で15分間静置した後、上記不織布にて上記粘着面を拭き取り、23℃、相対湿度50%の環境下で1時間静置することで乾燥させた上記粘着面にて測定される水接触角が、50°以上、80°以下である。上述のように粘着面の表面を拭き取った後における水接触角が上述の範囲であることで、加工後のワークに付着した粘着剤層由来の粘着剤を、流水によって良好に除去することが可能となる。 In the sheet for processing a work according to the present embodiment, a nonwoven fabric containing methyl ethyl ketone is laminated on the adhesive surface, and left standing for 15 minutes in an environment of 23 ° C. and a relative humidity of 50%. The water contact angle measured on the adhesive surface dried by wiping the surface and allowing to stand for 1 hour in an environment of 23 ° C. and 50% relative humidity is 50 ° or more and 80 ° or less. Since the water contact angle after wiping the surface of the adhesive surface as described above is within the above range, the adhesive derived from the adhesive layer adhered to the work after processing can be favorably removed by running water. Becomes
 上述の通り、粘着面の拭き取り後における水接触角が50°以上、80°以下であることにより、加工後のワークに付着した粘着剤を流水によって除去が容易となる理由としては、それに限定されるものではないものの、次のことが考えられる。上述した拭き取りを行うと、粘着面の表面における所定の成分が除去されるか、あるいは、当該表面から所定の厚さの分だけ粘着剤層を構成する粘着剤が除去されるものと考えられる。これにより、本来であれば粘着剤層の内部を構成していた部分が表面に露出することとなる。そして、本実施形態に係るワーク加工用シートでは、この露出した面の水接触角が50°以上、80°以下となっている。一方、ワーク加工用シート上においてワークを加工し、これに伴って粘着剤層を構成する粘着剤が切削片として加工後のワークに付着した場合、その付着した粘着剤における、加工後のワークと接する面は、確率的に、粘着剤層の表面を構成していた面よりも、粘着剤層の内部を構成していた面となることの方が多い。すなわち、加工後のワークに付着した粘着剤では、殆どの場合、水接触角が50°以上、80°以下である面が加工後のワークに接するものとなる。そして、このような水接触角を有する面は、水に対して適度な親和性を示すものであるため、流水を使用することにより、上述した粘着剤を加工後のワークから良好に除去することが可能となる。 As described above, the reason that the water contact angle after wiping the adhesive surface is 50 ° or more and 80 ° or less, and the reason why the adhesive adhered to the processed work can be easily removed by running water is limited thereto. Although not necessarily, the following can be considered. By performing the wiping described above, it is considered that a predetermined component on the surface of the adhesive surface is removed, or the adhesive constituting the adhesive layer by a predetermined thickness is removed from the surface. As a result, the part that originally constituted the inside of the pressure-sensitive adhesive layer is exposed on the surface. In the work processing sheet according to the present embodiment, the water contact angle of the exposed surface is 50 ° or more and 80 ° or less. On the other hand, when the work is processed on the work processing sheet, and the pressure-sensitive adhesive constituting the pressure-sensitive adhesive layer adheres to the work after processing as a cutting piece, the pressure-sensitive adhesive adheres to the work after processing. The surface that comes into contact with the surface of the pressure-sensitive adhesive layer is more stochastically the surface that forms the inside of the pressure-sensitive adhesive layer than the surface that forms the surface of the pressure-sensitive adhesive layer. That is, in most cases, a surface having a water contact angle of 50 ° or more and 80 ° or less comes into contact with the processed work in the adhesive adhered to the processed work. And, since the surface having such a water contact angle shows a suitable affinity for water, by using flowing water, the above-mentioned pressure-sensitive adhesive is favorably removed from the processed work. Becomes possible.
 上述したような拭き取り後における水接触角が、50°未満であると、粘着剤層が水に対して過度に親和性を示すものとなり、水の浸入を抑制することができず、それによってダイシング時にチップ飛びやチップ欠けが生じる。また、上記水接触角が80°を超えると、切削片としての粘着剤が、水に対して適度な親和性を有しないものとなり、加工後のワークに付着した粘着剤を流水によって十分に除去することが困難となる。 If the water contact angle after wiping as described above is less than 50 °, the pressure-sensitive adhesive layer will exhibit an excessive affinity for water, and it will not be possible to suppress water intrusion. Occasionally, chip fly or chip breakage occurs. When the water contact angle exceeds 80 °, the pressure-sensitive adhesive as a cut piece does not have an appropriate affinity for water, and the pressure-sensitive adhesive adhered to the processed workpiece is sufficiently removed by running water. It will be difficult to do.
 以上の観点から、上述した拭き取り後における水接触角は、55°以上であることが好ましく、特に60°以上であることが好ましい。また、上述した拭き取り後における水接触角は、75°以下であることが好ましく、特に70°以下であることが好ましい。なお、上述した拭き取り後における水接触角の測定方法の詳細は、後述する試験例に記載する通りである。 From the viewpoints described above, the water contact angle after the wiping described above is preferably 55 ° or more, and particularly preferably 60 ° or more. The water contact angle after the wiping described above is preferably 75 ° or less, particularly preferably 70 ° or less. The details of the method of measuring the water contact angle after the wiping described above are as described in Test Examples described later.
 本実施形態に係るワーク加工用シートでは、ワーク加工用シートのシリコンウエハに対する粘着力が、5000mN/25mm以下である。ここにおける粘着力は、ワーク加工用シートに対して活性エネルギー線を照射しておらず、粘着剤層の硬化が生じていない状態における粘着力をいうものとする。また、本明細書全体において、活性エネルギー線の照射の有無について言及することなく記述された「粘着力」についても、ワーク加工用シートに対して活性エネルギー線を照射しておらず、粘着剤層の硬化が生じていない状態における粘着力をいうものとする。ワーク加工用シートのシリコンウエハに対する粘着力の測定方法の詳細は、後述する試験例に記載する通りである。 で は In the work processing sheet according to the present embodiment, the adhesive force of the work processing sheet to the silicon wafer is 5000 mN / 25 mm or less. Here, the adhesive strength refers to the adhesive strength in a state where the work processing sheet is not irradiated with the active energy ray and the pressure-sensitive adhesive layer is not cured. In addition, throughout the present specification, the "adhesive force" described without mentioning the presence or absence of the irradiation of the active energy ray, the work processing sheet was not irradiated with the active energy ray, the pressure-sensitive adhesive layer Refers to the adhesive strength in a state where no curing has occurred. The details of the method for measuring the adhesive force of the work processing sheet to the silicon wafer are as described in Test Examples described later.
 ワーク加工用シートのシリコンウエハに対する粘着力が5000mN/25mm以下であることで、加工後のワークに切削片として付着した粘着剤の粘着力が、過度に高いものとならず、これにより、当該粘着剤を流水によって容易に除去することが可能となる。一方、ワーク加工用シートのシリコンウエハに対する粘着力が5000mN/25mm超えると、切削片として粘着剤が加工後のワークに対して強固に付着してしまい、流水を使用したとしても当該粘着剤を十分に除去することが困難となってしまう。この観点から、ワーク加工用シートのシリコンウエハに対する粘着力は、4500mN/25mm以下であることが好ましく、特に3000mN/25mm以下であることが好ましい。 When the adhesive force of the work processing sheet to the silicon wafer is 5000 mN / 25 mm or less, the adhesive force of the adhesive adhered as a cutting piece to the work after processing does not become excessively high. The agent can be easily removed by running water. On the other hand, when the adhesive force of the work processing sheet to the silicon wafer exceeds 5000 mN / 25 mm, the adhesive is firmly adhered to the work after processing as a cutting piece, and even if running water is used, the adhesive is not sufficiently applied. It is difficult to remove the ash. From this viewpoint, the adhesive force of the work processing sheet to the silicon wafer is preferably 4500 mN / 25 mm or less, and particularly preferably 3000 mN / 25 mm or less.
 また、ワーク加工用シートのシリコンウエハに対する粘着力は、1000mN/25mm以上であることが好ましく、特に1200mN/25mm以上であることが好ましく、さらには1500mN/25mm以上であることが好ましい。ワーク加工用シートのシリコンウエハに対する粘着力が、1000mN/25mm以上であることで、加工の対象となるワークをワーク加工用シート上に良好に保持することが可能となり、加工時や、ワークまたは加工後のワークをワーク加工用シート上に積層した状態で搬送する時などにおける、加工前または後のワークの剥がれを良好に抑制することができる。特に、加工後のワークがチップである場合には、当該チップがワーク加工用シートから飛散することを良好に抑制することができる。 粘着 Further, the adhesive force of the work processing sheet to the silicon wafer is preferably 1000 mN / 25 mm or more, particularly preferably 1200 mN / 25 mm or more, and further preferably 1500 mN / 25 mm or more. When the adhesive force of the work processing sheet to the silicon wafer is 1000 mN / 25 mm or more, the work to be processed can be satisfactorily held on the work processing sheet. When the subsequent work is conveyed in a state of being stacked on the work processing sheet, the peeling of the work before or after the processing can be favorably suppressed. In particular, when the work after processing is a chip, it is possible to favorably suppress the chip from scattering from the work processing sheet.
 なお、本実施形態に係るワーク加工用シートでは、ワーク加工用シートに対して活性エネルギー線を照射した後におけるワーク加工用シートのシリコンウエハに対する粘着力が、65mN/25mm以下であることが好ましい。当該粘着力が65mN/25mm以下であることで、ワークの加工が完了した後に、ワーク加工用シートに対する活性エネルギー線の照射により、加工後のワークをワーク加工用シートから分離することがより容易となる。 In the work processing sheet according to the present embodiment, it is preferable that the work processing sheet has an adhesive force to the silicon wafer of 65 mN / 25 mm or less after irradiating the work processing sheet with the active energy ray. When the adhesive force is 65 mN / 25 mm or less, it is easier to separate the processed work from the work processing sheet by irradiating the work processing sheet with active energy rays after the work processing is completed. Become.
2.ワーク加工用シートの構成部材
(1)基材
 本実施形態に係るワーク加工用シートにおいて、基材は、ワーク加工用シートの使用工程における所望の機能を発揮し、好ましくは、粘着剤層の硬化のために照射される活性エネルギー線に対して良好な透過性を発揮するものである限り、特に限定されない。
2. Components of Work Processing Sheet (1) Substrate In the work processing sheet according to the present embodiment, the base material exhibits a desired function in a process of using the work processing sheet, and preferably cures the pressure-sensitive adhesive layer. There is no particular limitation as long as it exhibits good permeability to active energy rays irradiated for the purpose.
 例えば、基材は、樹脂系の材料を主材とする樹脂フィルムであることが好ましく、その具体例としては、エチレン-酢酸ビニル共重合体フィルム;エチレン-(メタ)アクリル酸共重合体フィルム、エチレン-(メタ)アクリル酸メチル共重合体フィルム、その他のエチレン-(メタ)アクリル酸エステル共重合体フィルム等のエチレン系共重合フィルム;ポリエチレンフィルム、ポリプロピレンフィルム、ポリブテンフィルム、ポリブタジエンフィルム、ポリメチルペンテンフィルム、エチレン-ノルボルネン共重合体フィルム、ノルボルネン樹脂フィルム等のポリオレフィン系フィルム;ポリ塩化ビニルフィルム、塩化ビニル共重合体フィルム等のポリ塩化ビニル系フィルム;ポリエチレンテレフタレートフィルム、ポリブチレンテレフタレートフィルム、ポリエチレンナフタレート等のポリエステル系フィルム;(メタ)アクリル酸エステル共重合体フィルム;ポリウレタンフィルム;ポリイミドフィルム;ポリスチレンフィルム;ポリカーボネートフィルム;フッ素樹脂フィルムなどが挙げられる。ポリエチレンフィルムの例としては、低密度ポリエチレン(LDPE)フィルム、直鎖低密度ポリエチレン(LLDPE)フィルム、高密度ポリエチレン(HDPE)フィルム等が挙げられる。また、これらの架橋フィルム、アイオノマーフィルムといった変性フィルムも用いられる。また、基材は、上述したフィルムが複数積層されてなる積層フィルムであってもよい。この積層フィルムにおいて、各層を構成する材料は同種であってもよく、異種であってもよい。基材としては、上記フィルムの中でも、柔軟性に優れるという観点から、エチレン-メタクリル酸メチル共重合体フィルムを使用することが好ましい。なお、本明細書における「(メタ)アクリル酸」は、アクリル酸およびメタクリル酸の両方を意味する。他の類似用語についても同様である。 For example, the base material is preferably a resin film mainly composed of a resin material, and specific examples thereof include an ethylene-vinyl acetate copolymer film; an ethylene- (meth) acrylic acid copolymer film, Ethylene copolymer films such as ethylene-methyl (meth) acrylate copolymer film and other ethylene- (meth) acrylate copolymer films; polyethylene film, polypropylene film, polybutene film, polybutadiene film, polymethylpentene Polyolefin films such as films, ethylene-norbornene copolymer films and norbornene resin films; polyvinyl chloride films such as polyvinyl chloride films and vinyl chloride copolymer films; polyethylene terephthalate films, polybutylene tele (Meth) acrylic acid ester copolymer film; polyurethane film; polyimide film; polystyrene films; polycarbonate films; tallate film, polyester films such as polyethylene naphthalate and a fluorine resin film. Examples of the polyethylene film include a low density polyethylene (LDPE) film, a linear low density polyethylene (LLDPE) film, a high density polyethylene (HDPE) film, and the like. Further, modified films such as crosslinked films and ionomer films are also used. Further, the substrate may be a laminated film in which a plurality of the above-described films are laminated. In this laminated film, the materials constituting each layer may be the same or different. As the substrate, among the above films, it is preferable to use an ethylene-methyl methacrylate copolymer film from the viewpoint of excellent flexibility. In addition, "(meth) acrylic acid" in this specification means both acrylic acid and methacrylic acid. The same applies to other similar terms.
 基材は、難燃剤、可塑剤、帯電防止剤、滑剤、酸化防止剤、着色剤、赤外線吸収剤、紫外線吸収剤、イオン捕捉剤等の各種添加剤を含んでいてもよい。これらの添加剤の含有量としては、特に限定されないものの、基材が所望の機能を発揮する範囲とすることが好ましい。 The base material may contain various additives such as a flame retardant, a plasticizer, an antistatic agent, a lubricant, an antioxidant, a colorant, an infrared absorber, an ultraviolet absorber, and an ion scavenger. The content of these additives is not particularly limited, but is preferably in a range where the base material exhibits a desired function.
 基材の粘着剤層が積層される面には、粘着剤層との密着性を高めるために、プライマー処理、コロナ処理、プラズマ処理等の表面処理が施されてもよい。 (4) The surface of the base material on which the pressure-sensitive adhesive layer is laminated may be subjected to a surface treatment such as a primer treatment, a corona treatment, and a plasma treatment in order to increase the adhesion to the pressure-sensitive adhesive layer.
 基材の厚さは、ワーク加工用シートが使用される方法に応じて適宜設定できるものの、通常、20μm以上であることが好ましく、特に25μm以上であることが好ましい。また、当該厚さは、通常、450μm以下であることが好ましく、特に300μm以下であることが好ましい。 (4) The thickness of the base material can be appropriately set according to the method in which the work processing sheet is used, but is usually preferably 20 μm or more, and particularly preferably 25 μm or more. In addition, the thickness is usually preferably 450 μm or less, and particularly preferably 300 μm or less.
(2)粘着剤層
 本実施形態に係るワーク加工用シートにおいて、粘着剤層は、活性エネルギー線硬化性粘着剤から構成されるとともに、前述した粘着力を達成することができ、さらに、前述した拭き取りの前および後における水接触角を達成できるものであれば、特に限定されない。
(2) Pressure-sensitive adhesive layer In the sheet for processing a work according to the present embodiment, the pressure-sensitive adhesive layer is formed of an active energy ray-curable pressure-sensitive adhesive, and can achieve the above-mentioned pressure-sensitive adhesive strength. There is no particular limitation as long as a water contact angle before and after wiping can be achieved.
 本実施形態に係るワーク加工用シートでは、粘着剤層が活性エネルギー線硬化性粘着剤から構成されていることで、粘着剤層の粘着面に貼着された加工後のワークと当該粘着面とを分離する際に、活性エネルギー線照射により粘着剤層を硬化させて、ワーク加工用シートの加工後のワークに対する粘着力を低下させることができる。これにより、粘着剤層の粘着面と加工後のワークとの分離が容易となる。 In the work processing sheet according to the present embodiment, since the pressure-sensitive adhesive layer is formed of an active energy ray-curable pressure-sensitive adhesive, the processed work and the pressure-sensitive adhesive surface adhered to the pressure-sensitive adhesive surface of the pressure-sensitive adhesive layer. When separating the sheet, the pressure-sensitive adhesive layer is cured by irradiating active energy rays to reduce the adhesive force of the work sheet to the work after processing. This facilitates separation of the pressure-sensitive adhesive surface of the pressure-sensitive adhesive layer from the processed work.
 本実施形態における粘着剤層は、活性エネルギー線硬化性を有するポリマーを含有する粘着剤組成物から形成されたものであってもよいし、活性エネルギー線非硬化性ポリマー(活性エネルギー線硬化性を有しないポリマー)と少なくとも1つ以上の活性エネルギー線硬化性基を有するモノマーおよび/またはオリゴマーとを含有する粘着剤組成物から形成されたものであってもよい。 The pressure-sensitive adhesive layer in the present embodiment may be formed from a pressure-sensitive adhesive composition containing a polymer having an active energy ray-curable property, or may be an active energy ray non-curable polymer (active energy ray-curable property). (Polymer having no active polymer) and a monomer and / or oligomer having at least one active energy ray-curable group.
 最初に、本実施形態における粘着剤層が、活性エネルギー線硬化性を有するポリマーを含有する粘着剤組成物から形成されたものである場合について、以下説明する。 First, the case where the pressure-sensitive adhesive layer in this embodiment is formed from a pressure-sensitive adhesive composition containing a polymer having active energy ray curability will be described below.
 活性エネルギー線硬化性を有するポリマーは、側鎖に活性エネルギー線硬化性を有する官能基(活性エネルギー線硬化性基)が導入された(メタ)アクリル酸エステル(共)重合体(A)(以下「活性エネルギー線硬化性重合体(A)」という場合がある。)であることが好ましい。この活性エネルギー線硬化性重合体(A)は、官能基含有モノマー単位を有するアクリル系共重合体(a1)と、その官能基に結合する官能基を有する不飽和基含有化合物(a2)とを反応させて得られるものであることが好ましい。 The active energy ray-curable polymer is a (meth) acrylate (co) polymer (A) (hereinafter, referred to as a (meth) acrylate) having a functional group (active energy ray-curable group) having an active energy ray-curable side chain introduced therein. "Active energy ray-curable polymer (A)"). This active energy ray-curable polymer (A) comprises an acrylic copolymer (a1) having a functional group-containing monomer unit and an unsaturated group-containing compound (a2) having a functional group bonded to the functional group. It is preferably obtained by reacting.
 アクリル系共重合体(a1)は、重合体を構成するモノマー単位として、アクリル系共重合体(a1)の親水性を調整するためのモノマー(以下では、「親水性調整モノマー」という場合がある。)を含むことが好ましく、特に、その具体例として、アクリル酸メチル、(メタ)アクリル酸2-メトキシエチル、(メタ)アクリル酸エチルカルビトール((メタ)アクリル酸エトキシエトキシエチル)および(メタ)アクリル酸メトキシエチレングリコールから選択される少なくとも1種を含むことが好ましい。これらのモノマーは、アクリル系共重合体(a1)の親水性を向上させることができ、これにより、形成される粘着剤層において、前述した拭き取り前後における水接触角および粘着力をそれぞれ前述した範囲に調整し易くなる。このような効果を得やすいという観点から、アクリル系共重合体(a1)は、重合体を構成するモノマー単位として、上述したモノマーの中でも、アクリル酸メチル、アクリル酸2-メトキシエチルおよびアクリル酸メトキシエチレングリコールの少なくとも1種を含むことが好ましい。 The acrylic copolymer (a1) may be, as a monomer unit constituting the polymer, a monomer for adjusting the hydrophilicity of the acrylic copolymer (a1) (hereinafter, may be referred to as a “hydrophilicity adjusting monomer”). ), And specific examples thereof include methyl acrylate, 2-methoxyethyl (meth) acrylate, ethyl carbitol (meth) acrylate (ethoxyethoxyethyl (meth) acrylate) and (meth). ) It is preferable to include at least one selected from methoxyethylene glycol acrylate. These monomers can improve the hydrophilicity of the acrylic copolymer (a1), whereby the water contact angle and the adhesive strength before and after the wiping described above in the formed pressure-sensitive adhesive layer are in the ranges described above, respectively. It becomes easy to adjust. From the viewpoint that such an effect can be easily obtained, the acrylic copolymer (a1) includes, as monomer units constituting the polymer, methyl acrylate, 2-methoxyethyl acrylate and methoxy acrylate among the above-mentioned monomers. It is preferable to include at least one kind of ethylene glycol.
 アクリル系共重合体(a1)が重合体を構成するモノマー単位としてアクリル酸メチルを含む場合、アクリル酸メチルの含有量は、10質量%以上であることが好ましく、特に20質量%以上であることが好ましく、さらには30質量%以上であることが好ましい。また、アクリル酸メチルの含有量は、85質量%以下であることが好ましい。これらの含有量であることで、形成される粘着剤層において、前述した拭き取り前後における水接触角および粘着力をそれぞれ前述した範囲により調整し易くなる。なお、本明細書において、上述したアクリル酸メチルの含有量(質量%)は、アクリル系共重合体(a1)を構成する全モノマーに対する含有量を意味する。また、後述するその他のモノマーの含有量(質量%)についても、アクリル系共重合体(a1)を構成する全モノマーに対する含有量を意味するものとする。 When the acrylic copolymer (a1) contains methyl acrylate as a monomer unit constituting the polymer, the content of methyl acrylate is preferably at least 10% by mass, particularly preferably at least 20% by mass. , And more preferably 30% by mass or more. Further, the content of methyl acrylate is preferably 85% by mass or less. With these contents, in the formed pressure-sensitive adhesive layer, the water contact angle and the adhesive force before and after the wiping described above can be easily adjusted respectively in the above-described ranges. In the present specification, the content (% by mass) of methyl acrylate described above means the content based on all the monomers constituting the acrylic copolymer (a1). Further, the content (% by mass) of the other monomers described below means the content based on all the monomers constituting the acrylic copolymer (a1).
 また、アクリル系共重合体(a1)が重合体を構成するモノマー単位としてアクリル酸2-メトキシエチルを含む場合、アクリル酸2-メトキシエチルの含有量は、10質量%以上であることが好ましく、特に20質量%以上であることが好ましく、さらには30質量%以上であることが好ましい。また、アクリル酸2-メトキシエチルの含有量は、85質量%以下であることが好ましく、特に80質量%以下であることが好ましく、さらには70質量%以下であることが好ましい。これらの含有量であることで、形成される粘着剤層において、前述した拭き取り前後における水接触角および粘着力をそれぞれ前述した範囲により調整し易くなる。 Further, when the acrylic copolymer (a1) contains 2-methoxyethyl acrylate as a monomer unit constituting the polymer, the content of 2-methoxyethyl acrylate is preferably 10% by mass or more, In particular, it is preferably at least 20% by mass, and more preferably at least 30% by mass. Further, the content of 2-methoxyethyl acrylate is preferably 85% by mass or less, particularly preferably 80% by mass or less, and further preferably 70% by mass or less. With these contents, in the formed pressure-sensitive adhesive layer, the water contact angle and the adhesive force before and after the wiping described above can be easily adjusted respectively in the above-described ranges.
 また、アクリル系共重合体(a1)が重合体を構成するモノマー単位として、アクリル酸メチルおよびアクリル酸2-メトキシエチルの両方を含む場合、アクリル酸メチルおよびアクリル酸2-メトキシエチルの含有量の合計値は、10質量%以上であることが好ましく、特に30質量%以上であることが好ましく、さらには50質量%以上であることが好ましい。また、上記合計値は、90質量%以下であることが好ましく、特に85質量%以下であることが好ましい。上記合計値がこれらの範囲であることで、形成される粘着剤層において、前述した拭き取り前後における水接触角および粘着力をそれぞれ前述した範囲により調整し易くなる。 When the acrylic copolymer (a1) contains both methyl acrylate and 2-methoxyethyl acrylate as monomer units constituting the polymer, the content of methyl acrylate and 2-methoxyethyl acrylate is reduced. The total value is preferably 10% by mass or more, particularly preferably 30% by mass or more, and further preferably 50% by mass or more. Further, the total value is preferably 90% by mass or less, particularly preferably 85% by mass or less. When the total value is within these ranges, it is easy to adjust the water contact angle and the adhesive force before and after the wiping described above in the above-described ranges, respectively, in the formed pressure-sensitive adhesive layer.
 さらに、アクリル系共重合体(a1)が重合体を構成するモノマー単位としてアクリル酸メトキシエチレングリコールを含む場合、アクリル酸メトキシエチレングリコールの含有量は、10質量%以上であることが好ましく、特に30質量%以上であることが好ましい。また、アクリル酸メトキシエチレングリコールの含有量は、85質量%以下であることが好ましく、特に80質量%以下であることが好ましい。これらの含有量であることで、形成される粘着剤層において、前述した拭き取り前後における水接触角および粘着力をそれぞれ前述した範囲により調整し易くなる。 Further, when the acrylic copolymer (a1) contains methoxyethylene glycol acrylate as a monomer unit constituting the polymer, the content of methoxyethylene glycol acrylate is preferably 10% by mass or more, and particularly preferably 30% by mass or more. It is preferable that the amount is at least mass%. Further, the content of methoxyethylene glycol acrylate is preferably 85% by mass or less, particularly preferably 80% by mass or less. With these contents, in the formed pressure-sensitive adhesive layer, the water contact angle and the adhesive force before and after the wiping described above can be easily adjusted respectively in the above-described ranges.
 アクリル系共重合体(a1)は、上述した親水性調整モノマー以外に、官能基含有モノマーから導かれる構成単位、および(メタ)アクリル酸エステルモノマーまたはその誘導体から導かれる構成単位を含むことが好ましい。 The acrylic copolymer (a1) preferably contains a structural unit derived from a functional group-containing monomer and a structural unit derived from a (meth) acrylate monomer or a derivative thereof, in addition to the hydrophilicity-adjusting monomer described above. .
 アクリル系共重合体(a1)の構成単位としての官能基含有モノマーは、重合性の二重結合と、ヒドロキシ基、カルボキシ基、アミノ基、置換アミノ基、エポキシ基等の官能基とを分子内に有するモノマーが挙げられ、これらの中でも、ヒドロキシ基含有モノマー、アミノ基含有モノマーおよび置換アミノ基含有モノマーの少なくとも1種を含有することが好ましい。 The functional group-containing monomer as a constituent unit of the acrylic copolymer (a1) has a polymerizable double bond and a functional group such as a hydroxy group, a carboxy group, an amino group, a substituted amino group, and an epoxy group in a molecule. And among them, it is preferable to contain at least one of a hydroxy group-containing monomer, an amino group-containing monomer and a substituted amino group-containing monomer.
 上記ヒドロキシ基含有モノマーとしては、例えば、(メタ)アクリル酸2-ヒドロキシエチル、(メタ)アクリル酸2-ヒドロキシプロピル、(メタ)アクリル酸3-ヒドロキシプロピル、(メタ)アクリル酸2-ヒドロキシブチル、(メタ)アクリル酸3-ヒドロキシブチル、(メタ)アクリル酸4-ヒドロキシブチル等が挙げられ、これらは単独でまたは2種以上を組み合わせて用いられる。 Examples of the hydroxy group-containing monomer include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, Examples thereof include 3-hydroxybutyl (meth) acrylate and 4-hydroxybutyl (meth) acrylate, which may be used alone or in combination of two or more.
 上記アミノ基含有モノマーまたは置換アミノ基含有モノマーとしては、例えば、(メタ)アクリル酸アミノエチル、(メタ)アクリル酸n-ブチルアミノエチル等が挙げられる。これらは単独で用いてもよいし、2種以上を組み合わせて用いてもよい。 {Examples of the amino group-containing monomer or substituted amino group-containing monomer include aminoethyl (meth) acrylate, n-butylaminoethyl (meth) acrylate, and the like. These may be used alone or in combination of two or more.
 なお、カルボキシ基含有モノマーの例としては、アクリル酸、メタクリル酸、クロトン酸、マレイン酸、イタコン酸、シトラコン酸等のエチレン性不飽和カルボン酸が挙げられ、これらは単独で用いてもよいし、2種以上を組み合わせて用いてもよい。しかしながら、アクリル系共重合体(a1)は、カルボキシ基含有モノマーを含まないことが好ましい。アクリル系共重合体(a1)がカルボキシ基含有モノマーを含まないことにより、水接触角の調整がより容易となる。 Examples of the carboxy group-containing monomer include acrylic acid, methacrylic acid, crotonic acid, maleic acid, itaconic acid, ethylenically unsaturated carboxylic acids such as citraconic acid, and these may be used alone or Two or more kinds may be used in combination. However, the acrylic copolymer (a1) preferably does not contain a carboxy group-containing monomer. When the acrylic copolymer (a1) does not contain a carboxy group-containing monomer, the adjustment of the water contact angle becomes easier.
 アクリル系共重合体(a1)は、上記官能基含有モノマーから導かれる構成単位を、1質量%以上含有することが好ましく、特に5質量%以上含有することが好ましく、さらには10質量%以上含有することが好ましい。また、アクリル系共重合体(a1)は、上記官能基含有モノマーから導かれる構成単位を、35質量%以下で含有することが好ましく、特に30質量%以下で含有することが好ましい。 The acrylic copolymer (a1) preferably contains 1% by mass or more, more preferably 5% by mass or more, and further preferably 10% by mass or more of a structural unit derived from the functional group-containing monomer. Is preferred. Further, the acrylic copolymer (a1) preferably contains the structural unit derived from the functional group-containing monomer in an amount of 35% by mass or less, particularly preferably 30% by mass or less.
 アクリル系共重合体(a1)を構成する(メタ)アクリル酸エステルモノマーとしては、アルキル基の炭素数が1~20である(メタ)アクリル酸アルキルエステルの他、例えば、分子内に脂環式構造を有するモノマー(脂環式構造含有モノマー)が好ましく用いられる。 Examples of the (meth) acrylic acid ester monomer constituting the acrylic copolymer (a1) include, in addition to (meth) acrylic acid alkyl esters having an alkyl group having 1 to 20 carbon atoms, for example, an alicyclic compound in the molecule. A monomer having a structure (an alicyclic structure-containing monomer) is preferably used.
 (メタ)アクリル酸アルキルエステルとしては、特にアルキル基の炭素数が1~18である(メタ)アクリル酸アルキルエステル、例えば、メタクリル酸メチル、(メタ)アクリル酸エチル、(メタ)アクリル酸プロピル、(メタ)アクリル酸n-ブチル、(メタ)アクリル酸2-エチルヘキシル等が好ましく用いられる。これらは、1種を単独で用いてもよいし、2種以上を組み合わせて用いてもよい。 As the alkyl (meth) acrylate, alkyl (meth) acrylates having an alkyl group having 1 to 18 carbon atoms, such as methyl methacrylate, ethyl (meth) acrylate, propyl (meth) acrylate, N-butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate and the like are preferably used. These may be used alone or in combination of two or more.
 脂環式構造含有モノマーとしては、例えば、(メタ)アクリル酸シクロヘキシル、(メタ)アクリル酸ジシクロペンタニル、(メタ)アクリル酸アダマンチル、(メタ)アクリル酸イソボルニル、(メタ)アクリル酸ジシクロペンテニル、(メタ)アクリル酸ジシクロペンテニルオキシエチル等が好ましく用いられる。これらは、1種を単独で用いてもよいし、2種以上を組み合わせて用いてもよい。 Examples of the alicyclic structure-containing monomer include cyclohexyl (meth) acrylate, dicyclopentanyl (meth) acrylate, adamantyl (meth) acrylate, isobornyl (meth) acrylate, and dicyclopentenyl (meth) acrylate. And dicyclopentenyloxyethyl (meth) acrylate are preferably used. These may be used alone or in combination of two or more.
 さらに、アクリル系共重合体(a1)は、(メタ)アクリル酸エステルモノマーまたはその誘導体から導かれる構成単位を、50質量%以上含有することが好ましく、特に60質量%以上含有することが好ましく、さらには70質量%以上含有することが好ましい。また、アクリル系共重合体(a1)は、(メタ)アクリル酸エステルモノマーまたはその誘導体から導かれる構成単位を、99質量%以下で含有することが好ましく、特に95質量%以下で含有することが好ましく、さらには90質量%以下で含有することが好ましい。 Further, the acrylic copolymer (a1) preferably contains 50% by mass or more, and particularly preferably 60% by mass or more, of a structural unit derived from a (meth) acrylate monomer or a derivative thereof. Further, the content is preferably 70% by mass or more. Further, the acrylic copolymer (a1) preferably contains 99% by mass or less, and particularly preferably 95% by mass or less, of a structural unit derived from a (meth) acrylate monomer or a derivative thereof. Preferably, the content is more preferably 90% by mass or less.
 アクリル系共重合体(a1)は、好ましくは、上述した親水性調整モノマーと、官能基含有モノマーと、(メタ)アクリル酸エステルモノマーまたはその誘導体とを常法で共重合することで得ることができるが、これらモノマーの他にもジメチルアクリルアミド、蟻酸ビニル、酢酸ビニル、スチレン等が共重合されてもよい。 The acrylic copolymer (a1) can preferably be obtained by copolymerizing the above-mentioned hydrophilicity-adjusting monomer, a functional group-containing monomer, and a (meth) acrylic acid ester monomer or a derivative thereof by an ordinary method. However, in addition to these monomers, dimethylacrylamide, vinyl formate, vinyl acetate, styrene and the like may be copolymerized.
 上記官能基含有モノマー単位を有するアクリル系共重合体(a1)を、その官能基に結合する官能基を有する不飽和基含有化合物(a2)と反応させることにより、活性エネルギー線硬化性重合体(A)が得られる。 By reacting the acrylic copolymer (a1) having the functional group-containing monomer unit with the unsaturated group-containing compound (a2) having a functional group bonded to the functional group, an active energy ray-curable polymer ( A) is obtained.
 不飽和基含有化合物(a2)が有する官能基は、アクリル系共重合体(a1)が有する官能基含有モノマー単位の官能基の種類に応じて、適宜選択することができる。例えば、アクリル系共重合体(a1)が有する官能基がヒドロキシ基、アミノ基または置換アミノ基の場合、不飽和基含有化合物(a2)が有する官能基としてはイソシアネート基またはエポキシ基が好ましく、アクリル系共重合体(a1)が有する官能基がエポキシ基の場合、不飽和基含有化合物(a2)が有する官能基としてはアミノ基、カルボキシ基またはアジリジニル基が好ましい。 The functional group of the unsaturated group-containing compound (a2) can be appropriately selected according to the type of the functional group of the functional group-containing monomer unit of the acrylic copolymer (a1). For example, when the functional group of the acrylic copolymer (a1) is a hydroxy group, an amino group or a substituted amino group, the functional group of the unsaturated group-containing compound (a2) is preferably an isocyanate group or an epoxy group. When the functional group of the copolymer (a1) is an epoxy group, the functional group of the unsaturated group-containing compound (a2) is preferably an amino group, a carboxy group, or an aziridinyl group.
 また上記不飽和基含有化合物(a2)には、活性エネルギー線重合性の炭素-炭素二重結合が、1分子中に少なくとも1個、好ましくは1~6個、さらに好ましくは1~4個含まれている。このような不飽和基含有化合物(a2)の具体例としては、例えば、2-メタクリロイルオキシエチルイソシアネート、メタ-イソプロペニル-α,α-ジメチルベンジルイソシアネート、メタクリロイルイソシアネート、アリルイソシアネート、1,1-(ビスアクリロイルオキシメチル)エチルイソシアネート;ジイソシアネート化合物またはポリイソシアネート化合物と、(メタ)アクリル酸ヒドロキシエチルとの反応により得られるアクリロイルモノイソシアネート化合物;ジイソシアネート化合物またはポリイソシアネート化合物と、ポリオール化合物と、(メタ)アクリル酸ヒドロキシエチルとの反応により得られるアクリロイルモノイソシアネート化合物;(メタ)アクリル酸グリシジル;(メタ)アクリル酸、(メタ)アクリル酸2-(1-アジリジニル)エチル、2-ビニル-2-オキサゾリン、2-イソプロペニル-2-オキサゾリン等が挙げられる。 Further, the unsaturated group-containing compound (a2) contains at least one, preferably 1 to 6, more preferably 1 to 4, active energy ray-polymerizable carbon-carbon double bonds per molecule. Have been. Specific examples of such an unsaturated group-containing compound (a2) include, for example, 2-methacryloyloxyethyl isocyanate, meth-isopropenyl-α, α-dimethylbenzyl isocyanate, methacryloyl isocyanate, allyl isocyanate, 1,1- ( Bisacryloyloxymethyl) ethyl isocyanate; acryloyl monoisocyanate compound obtained by reacting a diisocyanate compound or polyisocyanate compound with hydroxyethyl (meth) acrylate; a diisocyanate compound or polyisocyanate compound, a polyol compound, and (meth) acrylic Acryloyl monoisocyanate compound obtained by reaction with hydroxyethyl acrylate; glycidyl (meth) acrylate; (meth) acrylic acid, (meth) acrylic acid 2- (1-aziridinyl) ethyl luate, 2-vinyl-2-oxazoline, 2-isopropenyl-2-oxazoline and the like.
 上記不飽和基含有化合物(a2)は、上記アクリル系共重合体(a1)の官能基含有モノマーのモル数に対して、好ましくは50モル%以上、特に好ましくは60モル%以上、さらに好ましくは70モル%以上の割合で用いられる。また、上記不飽和基含有化合物(a2)は、上記アクリル系共重合体(a1)の官能基含有モノマーのモル数に対して、好ましくは95モル%以下、特に好ましくは93モル%以下、さらに好ましくは90モル%以下の割合で用いられる。 The unsaturated group-containing compound (a2) is preferably at least 50 mol%, particularly preferably at least 60 mol%, more preferably at least 50 mol%, based on the number of moles of the functional group-containing monomer of the acrylic copolymer (a1). It is used in a proportion of 70 mol% or more. The unsaturated group-containing compound (a2) is preferably at most 95 mol%, particularly preferably at most 93 mol%, based on the number of moles of the functional group-containing monomer of the acrylic copolymer (a1). Preferably, it is used in a proportion of 90 mol% or less.
 アクリル系共重合体(a1)と不飽和基含有化合物(a2)との反応においては、アクリル系共重合体(a1)が有する官能基と不飽和基含有化合物(a2)が有する官能基との組合せに応じて、反応の温度、圧力、溶媒、時間、触媒の有無、触媒の種類を適宜選択することができる。これにより、アクリル系共重合体(a1)中に存在する官能基と、不飽和基含有化合物(a2)中の官能基とが反応し、不飽和基がアクリル系共重合体(a1)中の側鎖に導入され、活性エネルギー線硬化性重合体(A)が得られる。 In the reaction between the acrylic copolymer (a1) and the unsaturated group-containing compound (a2), the reaction between the functional group of the acrylic copolymer (a1) and the functional group of the unsaturated group-containing compound (a2) is performed. Depending on the combination, the reaction temperature, pressure, solvent, time, presence or absence of catalyst, and type of catalyst can be appropriately selected. Thereby, the functional group present in the acrylic copolymer (a1) reacts with the functional group in the unsaturated group-containing compound (a2), and the unsaturated group in the acrylic copolymer (a1) The active energy ray-curable polymer (A) which is introduced into the side chain is obtained.
 このようにして得られる活性エネルギー線硬化性重合体(A)の重量平均分子量(Mw)は、1万以上であるのが好ましく、特に15万以上であるのが好ましく、さらには20万以上であるのが好ましい。また、当該重量平均分子量(Mw)は、150万以下であるのが好ましく、特に100万以下であるのが好ましい。なお、本明細書における重量平均分子量(Mw)は、ゲルパーミエーションクロマトグラフィー法(GPC法)により測定した標準ポリスチレン換算の値である。 The weight average molecular weight (Mw) of the active energy ray-curable polymer (A) thus obtained is preferably at least 10,000, particularly preferably at least 150,000, and more preferably at least 200,000. Preferably it is. Further, the weight average molecular weight (Mw) is preferably 1.5 million or less, particularly preferably 1,000,000 or less. The weight average molecular weight (Mw) in the present specification is a value in terms of standard polystyrene measured by gel permeation chromatography (GPC).
 本実施形態における粘着剤組成物が、活性エネルギー線硬化性重合体(A)といった活性エネルギー線硬化性を有するポリマーを含有する場合であっても、当該粘着剤組成物は、活性エネルギー線硬化性のモノマーおよび/またはオリゴマー(B)をさらに含有してもよい。 Even when the pressure-sensitive adhesive composition according to the present embodiment contains a polymer having an active energy ray-curable property such as an active energy ray-curable polymer (A), the pressure-sensitive adhesive composition has an active energy ray-curable property. (B) may further be contained.
 活性エネルギー線硬化性のモノマーおよび/またはオリゴマー(B)としては、例えば、多価アルコールと(メタ)アクリル酸とのエステル等を使用することができる。 As the active energy ray-curable monomer and / or oligomer (B), for example, an ester of a polyhydric alcohol and (meth) acrylic acid can be used.
 かかる活性エネルギー線硬化性のモノマーおよび/またはオリゴマー(B)としては、例えば、シクロヘキシル(メタ)アクリレート、イソボルニル(メタ)アクリレート等の単官能性アクリル酸エステル類、トリメチロールプロパントリ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、ペンタエリスリトールテトラ(メタ)アクリレート、ジペンタエリスリトールヘキサ(メタ)アクリレート、1,4-ブタンジオールジ(メタ)アクリレート、1,6-ヘキサンジオールジ(メタ)アクリレート、ポリエチレングリコールジ(メタ)アクリレート、ジメチロールトリシクロデカンジ(メタ)アクリレート等の多官能性アクリル酸エステル類、ポリエステルオリゴ(メタ)アクリレート、ポリウレタンオリゴ(メタ)アクリレート等が挙げられる。 Examples of such an active energy ray-curable monomer and / or oligomer (B) include monofunctional acrylates such as cyclohexyl (meth) acrylate and isobornyl (meth) acrylate; trimethylolpropane tri (meth) acrylate; Pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, polyethylene Polyfunctional acrylates such as glycol di (meth) acrylate, dimethylol tricyclodecane di (meth) acrylate, polyester oligo (meth) acrylate, polyurethane oligo ( Data) acrylate, and the like.
 活性エネルギー線硬化性重合体(A)とともに、活性エネルギー線硬化性のモノマーおよび/またはオリゴマー(B)を配合する場合、粘着剤組成物中における活性エネルギー線硬化性のモノマーおよび/またはオリゴマー(B)の含有量は、活性エネルギー線硬化性重合体(A)100質量部に対して、0質量部超であることが好ましく、特に60質量部以上であることが好ましい。また、当該含有量は、活性エネルギー線硬化性重合体(A)100質量部に対して、250質量部以下であることが好ましく、特に200質量部以下であることが好ましい。 When an active energy ray-curable monomer and / or oligomer (B) is blended together with the active energy ray-curable polymer (A), the active energy ray-curable monomer and / or oligomer (B ) Is preferably more than 0 parts by mass, particularly preferably 60 parts by mass or more, based on 100 parts by mass of the active energy ray-curable polymer (A). Further, the content is preferably 250 parts by mass or less, and particularly preferably 200 parts by mass or less, based on 100 parts by mass of the active energy ray-curable polymer (A).
 ここで、活性エネルギー線硬化性粘着剤を硬化させるための活性エネルギー線として紫外線を用いる場合には、本実施形態における粘着剤組成物が、光重合開始剤(C)を含有することが好ましい。この光重合開始剤(C)の使用により、重合硬化時間および光線照射量を少なくすることができる。 Here, when ultraviolet rays are used as active energy rays for curing the active energy ray-curable pressure-sensitive adhesive, the pressure-sensitive adhesive composition according to the present embodiment preferably contains a photopolymerization initiator (C). By using the photopolymerization initiator (C), the polymerization curing time and the amount of light irradiation can be reduced.
 光重合開始剤(C)としては、具体的には、ベンゾフェノン、アセトフェノン、ベンゾイン、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインイソプロピルエーテル、ベンゾインイソブチルエーテル、ベンゾイン安息香酸、ベンゾイン安息香酸メチル、ベンゾインジメチルケタール、2,4-ジエチルチオキサンソン、1-ヒドロキシシクロヘキシルフェニルケトン、ベンジルジフェニルサルファイド、テトラメチルチウラムモノサルファイド、アゾビスイソブチロニトリル、ベンジル、ジベンジル、ジアセチル、β-クロールアンスラキノン、(2,4,6-トリメチルベンジルジフェニル)フォスフィンオキサイド、2-ベンゾチアゾール-N,N-ジエチルジチオカルバメート、オリゴ{2-ヒドロキシ-2-メチル-1-[4-(1-プロペニル)フェニル]プロパノン}、2,2-ジメトキシ-1,2-ジフェニルエタン-1-オンなどが挙げられる。これらは単独で用いてもよいし、2種以上を併用してもよい。 Specific examples of the photopolymerization initiator (C) include benzophenone, acetophenone, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzoin benzoic acid, methyl benzoin benzoate, benzoin dimethyl ketal, 2,4-diethylthioxanthone, 1-hydroxycyclohexyl phenyl ketone, benzyl diphenyl sulfide, tetramethyl thiuram monosulfide, azobisisobutyronitrile, benzyl, dibenzyl, diacetyl, β-chloranthraquinone, (2,4 6-trimethylbenzyldiphenyl) phosphine oxide, 2-benzothiazole-N, N-diethyldithiocarbamate, oligo {2-hydroxy-2-me Le-1- [4- (1-propenyl) phenyl] propanone}, and 2,2-dimethoxy-1,2-and the like. These may be used alone or in combination of two or more.
 粘着剤組成物中における光重合開始剤(C)の含有量は、活性エネルギー線硬化性重合体(A)(活性エネルギー線硬化性のモノマーおよび/またはオリゴマー(B)を配合する場合には、活性エネルギー線硬化性重合体(A)および活性エネルギー線硬化性のモノマーおよび/またはオリゴマー(B)の合計量100質量部)100質量部に対して、0.1質量部以上であることが好ましく、特に0.5質量部以上であることが好ましい。また、当該含有量は、活性エネルギー線硬化性重合体(A)(活性エネルギー線硬化性のモノマーおよび/またはオリゴマー(B)を配合する場合には、活性エネルギー線硬化性重合体(A)および活性エネルギー線硬化性のモノマーおよび/またはオリゴマー(B)の合計量100質量部)100質量部に対して、10質量部以下であることが好ましく、特に6質量部以下であることが好ましい。 The content of the photopolymerization initiator (C) in the pressure-sensitive adhesive composition is determined based on the amount of the active energy ray-curable polymer (A) (when the active energy ray-curable monomer and / or oligomer (B) is blended, It is preferably 0.1 part by mass or more based on 100 parts by mass of the active energy ray-curable polymer (A) and the active energy ray-curable monomer and / or oligomer (B) (100 parts by mass in total). In particular, it is preferably at least 0.5 part by mass. In addition, the content of the active energy ray-curable polymer (A) (when the active energy ray-curable monomer and / or oligomer (B) is blended, the active energy ray-curable polymer (A) The amount is preferably 10 parts by mass or less, particularly preferably 6 parts by mass or less, based on 100 parts by mass of the active energy ray-curable monomer and / or oligomer (B) (100 parts by mass in total).
 本実施形態における粘着剤組成物は、粘着剤層の表面における水接触角を調整するための添加剤(D)を含有することが好ましい。このような添加剤の例としては、活性エネルギー線重合性分岐重合体、分岐重合体、エポキシ樹脂等が挙げられ、これらの中でも、粘着剤層の表面における水接触角を前述した範囲に調整し易いという観点から、活性エネルギー線重合性分岐重合体を使用することが好ましい。 粘着 The pressure-sensitive adhesive composition of the present embodiment preferably contains an additive (D) for adjusting the water contact angle on the surface of the pressure-sensitive adhesive layer. Examples of such additives include an active energy ray-polymerizable branched polymer, a branched polymer, and an epoxy resin. Among them, the water contact angle on the surface of the pressure-sensitive adhesive layer is adjusted to the above-described range. From the viewpoint of easiness, it is preferable to use an active energy ray-polymerizable branched polymer.
 活性エネルギー線重合性分岐重合体とは、活性エネルギー線重合性化合物の一種であって、活性エネルギー線重合性基および分岐構造を有する重合体を意味する。本実施形態における粘着剤層が、活性エネルギー線重合性分岐重合体を含有する粘着剤組成物から形成されていることで、粘着剤層の表面における水接触角(前述した拭き取り前における水接触角)を80°超とすること、および前述した拭き取り後における水接触角を50°以上、80°以下とすることの両立が容易となる。この理由としては、それに限定されないものの、次のことが考えられる。活性エネルギー線重合性分岐重合体を含有する粘着剤組成物を用いて粘着剤層を形成する際、活性エネルギー線重合性分岐重合体は、粘着剤層中の表面側に偏在し易い。そのため、形成された粘着剤層では、内部と比較して表面に近い部分ほど、活性エネルギー線重合性分岐重合体の含有量が多く存在するものとなる。ここで、活性エネルギー線重合性分岐重合体自体は、疎水性の傾向が高い成分であるため、活性エネルギー線重合性分岐重合体がより多く存在する粘着剤層の表面では80°超という水接触角を達成し易いものとなる。その一方で、前述した拭き取りによって表面に存在する活性エネルギー線重合性分岐重合体が除去された後においては、50°以上、80°以下という水接触角を達成し易いものとなる。以上により、前述した拭き取り前後において異なる水接触角を両立することが容易となる。 The active energy ray polymerizable branched polymer is a kind of active energy ray polymerizable compound, and means a polymer having an active energy ray polymerizable group and a branched structure. Since the pressure-sensitive adhesive layer in this embodiment is formed from the pressure-sensitive adhesive composition containing the active energy ray-polymerizable branched polymer, the water contact angle on the surface of the pressure-sensitive adhesive layer (the water contact angle before wiping described above). ) Is more than 80 °, and the water contact angle after the wiping is set to 50 ° or more and 80 ° or less. The reason for this is not limited thereto, but may be as follows. When forming a pressure-sensitive adhesive layer using a pressure-sensitive adhesive composition containing an active energy ray-polymerizable branched polymer, the active energy ray-polymerizable branched polymer tends to be unevenly distributed on the surface side in the pressure-sensitive adhesive layer. Therefore, in the formed pressure-sensitive adhesive layer, the closer to the surface as compared to the inside, the more the content of the active energy ray-polymerizable branched polymer is present. Here, since the active energy ray polymerizable branched polymer itself is a component having a high tendency to be hydrophobic, the surface of the pressure-sensitive adhesive layer in which the active energy ray polymerizable branched polymer is more present has a water contact of more than 80 °. The corner can be easily achieved. On the other hand, after the active energy ray-polymerizable branched polymer present on the surface is removed by the above-described wiping, a water contact angle of 50 ° or more and 80 ° or less can be easily achieved. As described above, it is easy to achieve different water contact angles before and after wiping.
 また、本実施形態における粘着剤層が、活性エネルギー線重合性分岐重合体を含有する粘着剤組成物から形成されていることで、粘着剤層の表面が比較的疎水性を有するものとなり、これにより、ワーク加工用シートのシリコンウエハに対する粘着力を前述した範囲に調整し易くなり、加工後のワークをワーク加工用シートから分離し易くなる。さらに、活性エネルギー線重合性分岐重合体は活性エネルギー線重合性基を有することから、ワーク加工用シートに対して活性エネルギー線を照射した際には、活性エネルギー線重合性分岐重合体同士または活性エネルギー線重合性分岐重合体と活性エネルギー線硬化性基を有する成分との間で重合反応することができ、これにより、活性エネルギー線重合性分岐重合体が加工後のワークに移行することが抑制されるとともに、活性エネルギー線照射後の粘着剤層がより硬化するものとなり、加工後のワークのワーク加工用シートからの分離を効果的に行い易くなる。 Further, since the pressure-sensitive adhesive layer in the present embodiment is formed from the pressure-sensitive adhesive composition containing the active energy ray-polymerizable branched polymer, the surface of the pressure-sensitive adhesive layer becomes relatively hydrophobic, Thereby, the adhesive force of the work processing sheet to the silicon wafer can be easily adjusted to the above-described range, and the processed work can be easily separated from the work processing sheet. Further, since the active energy ray polymerizable branched polymer has an active energy ray polymerizable group, when the work processing sheet is irradiated with the active energy ray, the active energy ray polymerizable branched polymer is not active or active. A polymerization reaction can occur between the energy beam polymerizable branched polymer and the component having an active energy beam curable group, thereby suppressing migration of the active energy beam polymerizable branched polymer to a work after processing. At the same time, the pressure-sensitive adhesive layer after the irradiation with the active energy rays becomes more hardened, and it becomes easy to effectively separate the processed work from the work processing sheet.
 活性エネルギー線重合性分岐重合体は、上述した通り、活性エネルギー線重合性基および分岐構造を有する重合体である限り、具体的な構造(例えば、分岐構造の程度、一分子中に有する活性エネルギー線重合性基の数)は特に限定されない。このような活性エネルギー線重合性分岐重合体を得る方法としては、例えば、2個以上のラジカル重合性二重結合を分子内に有するモノマーと、活性水素基および1個のラジカル重合性二重結合を分子内に有するモノマーと、1個のラジカル重合性二重結合を分子内に有するモノマーとを重合させることにより得られる、分岐構造を有する重合体と、活性水素基と反応して結合を形成可能な官能基および少なくとも1個のラジカル重合性二重結合を分子内に有する化合物を反応させることにより得ることができる。上述した3種のモノマーは、それぞれ(メタ)アクリル酸エステルや(メタ)アクリル酸であってもよく、この場合、活性エネルギー線重合性分岐重合体はアクリル系重合体となる。 As described above, the active energy ray polymerizable branched polymer has a specific structure (for example, the degree of the branched structure, the active energy contained in one molecule) as long as the polymer has an active energy ray polymerizable group and a branched structure. The number of linear polymerizable groups) is not particularly limited. As a method for obtaining such an active energy ray polymerizable branched polymer, for example, a monomer having two or more radical polymerizable double bonds in a molecule, an active hydrogen group and one radical polymerizable double bond are used. Having a branched structure, which is obtained by polymerizing a monomer having the following formula in the molecule and a monomer having one radical polymerizable double bond in the molecule, reacts with an active hydrogen group to form a bond It can be obtained by reacting a compound having a possible functional group and at least one radically polymerizable double bond in the molecule. The above-mentioned three types of monomers may be (meth) acrylic acid esters or (meth) acrylic acid, respectively. In this case, the active energy ray-polymerizable branched polymer is an acrylic polymer.
 活性エネルギー線重合性分岐重合体の重量平均分子量は、1000以上であることが好ましく、特に3000以上であることが好ましい。また、当該重量平均分子量は、100000以下であることが好ましく、特に30000以下であることが好ましい。重量平均分子量が上述した範囲であることで、粘着剤層の表面における水接触角を前述した範囲に調整し易いものとなる。 重量 The weight average molecular weight of the active energy ray-polymerizable branched polymer is preferably 1,000 or more, and particularly preferably 3,000 or more. Further, the weight average molecular weight is preferably 100,000 or less, and particularly preferably 30,000 or less. When the weight average molecular weight is in the above-described range, the water contact angle on the surface of the pressure-sensitive adhesive layer can be easily adjusted to the above-described range.
 粘着剤組成物中における添加剤(D)の含有量は、活性エネルギー線硬化性重合体(A)100質量部(活性エネルギー線硬化性のモノマーおよび/またはオリゴマー(B)を配合する場合には、活性エネルギー線硬化性重合体(A)および活性エネルギー線硬化性のモノマーおよび/またはオリゴマー(B)の合計量100質量部)に対して、0.05質量部以上であることが好ましく、特に0.1質量部以上であることが好ましい。また、当該含有量は、活性エネルギー線硬化性重合体(A)100質量部(活性エネルギー線硬化性のモノマーおよび/またはオリゴマー(B)を配合する場合には、活性エネルギー線硬化性重合体(A)および活性エネルギー線硬化性のモノマーおよび/またはオリゴマー(B)の合計量100質量部)に対して、1質量部以下であることが好ましく、特に0.5質量部以下であることが好ましい。添加剤(D)の含有量が上述した範囲であることで、粘着剤層の表面における水接触角を前述した範囲に調整し易いものとなる。 The content of the additive (D) in the pressure-sensitive adhesive composition is 100 parts by mass of the active energy ray-curable polymer (A) (when the active energy ray-curable monomer and / or oligomer (B) is blended). , The total amount of the active energy ray-curable polymer (A) and the active energy ray-curable monomer and / or oligomer (B) is 100 parts by mass), and is preferably 0.05 part by mass or more. It is preferably at least 0.1 part by mass. Further, the content is 100 parts by mass of the active energy ray-curable polymer (A) (when the active energy ray-curable monomer and / or oligomer (B) is blended, the active energy ray-curable polymer (A) (A) and 100 parts by mass of the active energy ray-curable monomer and / or oligomer (B)), preferably 1 part by mass or less, particularly preferably 0.5 part by mass or less. . When the content of the additive (D) is in the above-described range, the water contact angle on the surface of the pressure-sensitive adhesive layer can be easily adjusted to the above-described range.
 本実施形態における粘着剤組成物は、以上説明した成分に加えて、適宜他の成分を配合してもよい。他の成分としては、例えば、活性エネルギー線非硬化性ポリマー成分またはオリゴマー成分(E)、架橋剤(F)等が挙げられる。 粘着 The pressure-sensitive adhesive composition according to the present embodiment may optionally contain other components in addition to the components described above. Other components include, for example, an active energy ray non-curable polymer component or oligomer component (E), a crosslinking agent (F), and the like.
 活性エネルギー線非硬化性ポリマー成分またはオリゴマー成分(E)としては、例えば、ポリアクリル酸エステル、ポリエステル、ポリウレタン、ポリカーボネート、ポリオレフィン等が挙げられ、重量平均分子量(Mw)が3000~250万のポリマーまたはオリゴマーが好ましい。当該成分(E)を活性エネルギー線硬化性粘着剤に配合することにより、硬化前における粘着性および剥離性、硬化後の強度、他の層との接着性、保存安定性などを改善し得る。当該成分(E)の配合量は特に限定されず、活性エネルギー線硬化性重合体(A)100質量部に対して0質量部超、50質量部以下の範囲で適宜決定される。 Examples of the active energy ray non-curable polymer component or oligomer component (E) include polyacrylates, polyesters, polyurethanes, polycarbonates, polyolefins, etc., and polymers or polymers having a weight average molecular weight (Mw) of 3,000 to 2,500,000. Oligomers are preferred. By blending the component (E) with the active energy ray-curable pressure-sensitive adhesive, the tackiness and peelability before curing, the strength after curing, the adhesion to other layers, the storage stability, and the like can be improved. The amount of the component (E) is not particularly limited, and is appropriately determined within a range of more than 0 parts by mass and 50 parts by mass or less based on 100 parts by mass of the active energy ray-curable polymer (A).
 架橋剤(F)としては、活性エネルギー線硬化性重合体(A)等が有する官能基との反応性を有する多官能性化合物を用いることができる。このような多官能性化合物の例としては、イソシアネート化合物、エポキシ化合物、アミン化合物、メラミン化合物、アジリジン化合物、ヒドラジン化合物、アルデヒド化合物、オキサゾリン化合物、金属アルコキシド化合物、金属キレート化合物、金属塩、アンモニウム塩、反応性フェノール樹脂等を挙げることができる。 多 As the crosslinking agent (F), a polyfunctional compound having reactivity with a functional group of the active energy ray-curable polymer (A) or the like can be used. Examples of such polyfunctional compounds include isocyanate compounds, epoxy compounds, amine compounds, melamine compounds, aziridine compounds, hydrazine compounds, aldehyde compounds, oxazoline compounds, metal alkoxide compounds, metal chelate compounds, metal salts, ammonium salts, Reactive phenol resins and the like can be mentioned.
 架橋剤(F)の配合量は、活性エネルギー線硬化性重合体(A)100質量部に対して、0.01質量部以上であることが好ましく、特に3質量部以上であることが好ましい。また、架橋剤(F)の配合量は、活性エネルギー線硬化性重合体(A)100質量部に対して、20質量部以下であることが好ましく、特に17質量部以下であることが好ましい。 配合 The compounding amount of the crosslinking agent (F) is preferably at least 0.01 part by mass, more preferably at least 3 parts by mass, based on 100 parts by mass of the active energy ray-curable polymer (A). Further, the compounding amount of the crosslinking agent (F) is preferably 20 parts by mass or less, particularly preferably 17 parts by mass or less based on 100 parts by mass of the active energy ray-curable polymer (A).
 次に、本実施形態における粘着剤層が、活性エネルギー線非硬化性ポリマー成分と少なくとも1つ以上の活性エネルギー線硬化性基を有するモノマーおよび/またはオリゴマーとを含有する粘着剤組成物から形成されたものである場合について、以下説明する。 Next, the pressure-sensitive adhesive layer in the present embodiment is formed from a pressure-sensitive adhesive composition containing an active energy ray non-curable polymer component and a monomer and / or oligomer having at least one or more active energy ray-curable groups. In the following, a description will be given of a case in which the information is obtained.
 活性エネルギー線非硬化性ポリマー成分としては、例えば、前述したアクリル系共重合体(a1)と同様の成分が使用できる。 As the active energy ray non-curable polymer component, for example, the same component as the above-mentioned acrylic copolymer (a1) can be used.
 少なくとも1つ以上の活性エネルギー線硬化性基を有するモノマーおよび/またはオリゴマーとしては、前述の成分(B)と同じものが選択できる。活性エネルギー線非硬化性ポリマー成分と少なくとも1つ以上の活性エネルギー線硬化性基を有するモノマーおよび/またはオリゴマーとの配合比は、活性エネルギー線非硬化性ポリマー成分100質量部に対して、少なくとも1つ以上の活性エネルギー線硬化性基を有するモノマーおよび/またはオリゴマー1質量部以上であるのが好ましく、特に60質量部以上であるのが好ましい。また、当該配合比は、活性エネルギー線非硬化性ポリマー成分100質量部に対して、少なくとも1つ以上の活性エネルギー線硬化性基を有するモノマーおよび/またはオリゴマー200質量部以下であるのが好ましく、特に160質量部以下であるのが好ましい。 モ ノ マ ー As the monomer and / or oligomer having at least one or more active energy ray-curable groups, the same as the above-mentioned component (B) can be selected. The compounding ratio of the active energy ray non-curable polymer component and the monomer and / or oligomer having at least one active energy ray curable group is at least 1 with respect to 100 parts by mass of the active energy ray non-curable polymer component. The amount of the monomer and / or oligomer having two or more active energy ray-curable groups is preferably 1 part by mass or more, and particularly preferably 60 parts by mass or more. Further, the mixing ratio is preferably 200 parts by mass or less of a monomer and / or oligomer having at least one or more active energy ray-curable groups, based on 100 parts by mass of the active energy ray non-curable polymer component. In particular, the amount is preferably 160 parts by mass or less.
 この場合においても、上記と同様に、光重合開始剤(C)、添加剤(D)や架橋剤(F)を適宜配合することができる。 に お い て Also in this case, similarly to the above, the photopolymerization initiator (C), the additive (D), and the crosslinking agent (F) can be appropriately compounded.
 粘着剤層の厚さは、1μm以上であることが好ましく、さらには5μm以上であることが好ましい。また、当該厚さは、50μm以下であることが好ましく、さらには40μm以下であることが好ましい。粘着剤層の厚さが上記範囲であることで、前述した粘着力を達成し易くなる。 は The thickness of the pressure-sensitive adhesive layer is preferably 1 μm or more, and more preferably 5 μm or more. Further, the thickness is preferably 50 μm or less, and more preferably 40 μm or less. When the thickness of the pressure-sensitive adhesive layer is within the above range, the above-mentioned pressure-sensitive adhesive strength can be easily achieved.
(3)剥離シート
 本実施形態に係るワーク加工用シートでは、粘着剤層における粘着面をワークに貼付するまでの間、当該面を保護する目的で、当該面に剥離シートが積層されていてもよい。剥離シートの構成は任意であり、プラスチックフィルムを剥離剤等により剥離処理したものが例示される。プラスチックフィルムの具体例としては、ポリエチレンテレフタレート、ポリブチレンテレフタレート、ポリエチレンナフタレート等のポリエステルフィルム、およびポリプロピレンやポリエチレン等のポリオレフィンフィルムが挙げられる。剥離剤としては、シリコーン系、フッ素系、長鎖アルキル系等を用いることができ、これらの中で、安価で安定した性能が得られるシリコーン系が好ましい。剥離シートの厚さについては特に制限はないが、通常20μm以上、250μm以下である。
(3) Release Sheet In the work processing sheet according to the present embodiment, a release sheet may be laminated on the surface for the purpose of protecting the adhesive surface of the adhesive layer until the adhesive surface is attached to the work. Good. The configuration of the release sheet is arbitrary, and examples thereof include those obtained by subjecting a plastic film to a release treatment with a release agent or the like. Specific examples of the plastic film include polyester films such as polyethylene terephthalate, polybutylene terephthalate, and polyethylene naphthalate, and polyolefin films such as polypropylene and polyethylene. As the release agent, a silicone-based, fluorine-based, long-chain alkyl-based or the like can be used, and among these, a silicone-based one that is inexpensive and provides stable performance is preferable. The thickness of the release sheet is not particularly limited, but is usually 20 μm or more and 250 μm or less.
(4)その他の部材
 本実施形態に係るワーク加工用シートでは、粘着剤層における粘着面に接着剤層が積層されていてもよい。この場合、本実施形態に係るワーク加工用シートは、上述のように接着剤層を備えることで、ダイシング・ダイボンディングシートとして使用することができる。このようなワーク加工用シートでは、接着剤層における粘着剤層とは反対側の面にワークを貼付し、当該ワークとともに接着剤層をダイシングすることで、個片化された接着剤層が積層されたチップを得ることができる。当該チップは、この個片化された接着剤層によって、当該チップが搭載される対象に対して容易に固定することが可能となる。上述した接着剤層を構成する材料としては、熱可塑性樹脂と低分子量の熱硬化性接着成分とを含有するものや、Bステージ(半硬化状)の熱硬化型接着成分を含有するもの等を用いることが好ましい。
(4) Other members In the work processing sheet according to the present embodiment, the adhesive layer may be laminated on the adhesive surface of the adhesive layer. In this case, the work processing sheet according to the present embodiment can be used as a dicing die bonding sheet by providing the adhesive layer as described above. In such a work processing sheet, a work is attached to a surface of the adhesive layer opposite to the pressure-sensitive adhesive layer, and the adhesive layer diced together with the work is laminated, so that the individualized adhesive layers are laminated. Chips can be obtained. The chip can be easily fixed to an object on which the chip is mounted by the separated adhesive layer. Examples of the material constituting the above-mentioned adhesive layer include a material containing a thermoplastic resin and a low-molecular-weight thermosetting adhesive component, and a material containing a B-stage (semi-cured) thermosetting adhesive component. Preferably, it is used.
 また、本実施形態に係るワーク加工用シートでは、粘着剤層における粘着面に保護膜形成層が積層されていてもよい。この場合、本実施形態に係るワーク加工用シートは、保護膜形成兼ダイシング用シートとして使用することができる。このようなワーク加工用シートでは、保護膜形成層における粘着剤層とは反対側の面にワークを貼付し、当該ワークとともに保護膜形成層をダイシングすることで、個片化された保護膜形成層が積層されたチップを得ることができる。当該ワークとしては、片面に回路が形成されたものが使用されることが好ましく、この場合、通常、当該回路が形成された面とは反対側の面に保護膜形成層が積層される。個片化された保護膜形成層は、所定のタイミングで硬化させることで、十分な耐久性を有する保護膜をチップに形成することができる。保護膜形成層は、未硬化の硬化性接着剤からなることが好ましい。 ワ ー ク In the work processing sheet according to the present embodiment, a protective film forming layer may be laminated on the adhesive surface of the adhesive layer. In this case, the work processing sheet according to the present embodiment can be used as a protective film forming and dicing sheet. In such a work processing sheet, a work is adhered to the surface of the protective film forming layer opposite to the pressure-sensitive adhesive layer, and the protective film forming layer is diced together with the work to form an individualized protective film. A chip having stacked layers can be obtained. As the work, it is preferable to use a work in which a circuit is formed on one side, and in this case, a protective film forming layer is usually laminated on a surface opposite to the surface on which the circuit is formed. By hardening the individualized protective film forming layer at a predetermined timing, a protective film having sufficient durability can be formed on the chip. The protective film forming layer is preferably made of an uncured curable adhesive.
 なお、本願実施形態に係るワーク加工用シートは、前述した拭き取り前後における水接触角および粘着力を満たすものであるが、粘着剤層に対して上述した接着剤層または保護膜形成層が積層される場合には、これらの層が積層される前の粘着剤層について、前述した拭き取り前後における水接触角および粘着力を満たすものとなればよい。 The work processing sheet according to the embodiment of the present application satisfies the water contact angle and the adhesive force before and after the wiping described above. However, the adhesive layer or the protective film forming layer is laminated on the adhesive layer. In this case, the pressure-sensitive adhesive layer before these layers are laminated may satisfy the water contact angle and the adhesive force before and after the wiping described above.
3.ワーク加工用シートの製造方法
 本実施形態に係るワーク加工用シートの製造方法は特に限定されず、好ましくは、本実施形態に係るワーク加工用シートは、基材の片面側に粘着剤層を積層することにより製造される。
3. Method for manufacturing work processing sheet The method for manufacturing the work processing sheet according to the present embodiment is not particularly limited, and preferably, the work processing sheet according to the present embodiment has a pressure-sensitive adhesive layer laminated on one side of a base material. It is manufactured by doing.
 基材の片面側への粘着剤層の積層は、公知の方法により行うことができる。例えば、剥離シート上において形成した粘着剤層を、基材の片面側に転写することが好ましい。この場合、粘着剤層を構成する粘着剤組成物、および所望によりさらに溶媒または分散媒を含有する塗工液を調製し、剥離シートの剥離処理された面(以下「剥離面」という場合がある。)上に、ダイコーター、カーテンコーター、スプレーコーター、スリットコーター、ナイフコーター等によりその塗工液を塗布して塗膜を形成し、当該塗膜を乾燥させることにより、粘着剤層を形成することができる。塗工液は、塗布を行うことが可能であればその性状は特に限定されず、粘着剤層を形成するための成分を溶質として含有する場合もあれば、分散質として含有する場合もある。この積層体における剥離シートは工程材料として剥離してもよいし、ワーク加工用シートをワークに貼付するまでの間、粘着剤層の粘着面を保護するために用いてもよい。 積 層 Lamination of the pressure-sensitive adhesive layer on one side of the substrate can be performed by a known method. For example, it is preferable to transfer the pressure-sensitive adhesive layer formed on the release sheet to one side of the substrate. In this case, a pressure-sensitive adhesive composition constituting the pressure-sensitive adhesive layer and, if desired, a coating liquid further containing a solvent or a dispersion medium are prepared, and a release-treated surface of a release sheet (hereinafter sometimes referred to as a “release surface”). )), A coating film is formed thereon by applying the coating liquid using a die coater, a curtain coater, a spray coater, a slit coater, a knife coater, or the like, and the coated film is dried to form an adhesive layer. be able to. The properties of the coating liquid are not particularly limited as long as coating can be performed, and the coating liquid may contain a component for forming the pressure-sensitive adhesive layer as a solute or may contain a component as a dispersoid. The release sheet in this laminate may be peeled off as a process material, or may be used to protect the adhesive surface of the pressure-sensitive adhesive layer until the work processing sheet is attached to the work.
 粘着剤層を形成するための塗工液が架橋剤を含有する場合には、上記の乾燥の条件(温度、時間など)を変えることにより、または加熱処理を別途設けることにより、塗膜内の活性エネルギー線硬化性重合体(A)または活性エネルギー線非硬化性ポリマーと架橋剤との架橋反応を進行させ、粘着剤層内に所望の存在密度で架橋構造を形成させればよい。この架橋反応を十分に進行させるために、上記の方法などによって基材に粘着剤層を積層させた後、得られたワーク加工用シートを、例えば23℃、相対湿度50%の環境に数日間静置するといった養生を行ってもよい。 When the coating liquid for forming the pressure-sensitive adhesive layer contains a cross-linking agent, by changing the above-mentioned drying conditions (temperature, time, etc.), or by separately providing a heat treatment, The cross-linking reaction between the active energy ray-curable polymer (A) or the active energy ray non-curable polymer and the cross-linking agent may be advanced to form a cross-linked structure with a desired density in the pressure-sensitive adhesive layer. In order to allow this crosslinking reaction to proceed sufficiently, after the pressure-sensitive adhesive layer is laminated on the substrate by the above method or the like, the obtained work processing sheet is placed in an environment of, for example, 23 ° C. and 50% relative humidity for several days. Curing such as standing still may be performed.
 上述のように剥離シート上で形成した粘着剤層を基材の片面側に転写する代わりに、基材上で直接粘着剤層を形成してもよい。この場合、前述した粘着剤層を形成するための塗工液を基材の片面側に塗布して塗膜を形成し、当該塗膜を乾燥させることにより、粘着剤層を形成する。 代 わ り Instead of transferring the pressure-sensitive adhesive layer formed on the release sheet to one side of the substrate as described above, the pressure-sensitive adhesive layer may be directly formed on the substrate. In this case, the coating liquid for forming the pressure-sensitive adhesive layer described above is applied to one side of the substrate to form a coating film, and the coating film is dried to form the pressure-sensitive adhesive layer.
4.ワーク加工用シートの使用方法
 本実施形態に係るワーク加工用シートは、ワークの加工のために使用することができる。すなわち、本実施形態に係るワーク加工用シートの粘着面をワークに貼付した後、ワーク加工用シート上にてワークの加工を行うことができる。当該加工に応じて、本実施形態に係るワーク加工用シートは、バックグラインドシート、ダイシングシート、エキスパンドシート、ピックアップシート等として使用することができる。ここで、ワークの例としては、半導体ウエハ、半導体パッケージ等の半導体部材、ガラス板等のガラス部材が挙げられる。
4. Method of Using Work Processing Sheet The work processing sheet according to the present embodiment can be used for processing a work. That is, after attaching the adhesive surface of the work processing sheet according to the present embodiment to the work, the work can be processed on the work processing sheet. Depending on the processing, the work processing sheet according to the present embodiment can be used as a back grinding sheet, a dicing sheet, an expanded sheet, a pickup sheet, or the like. Here, examples of the work include a semiconductor member such as a semiconductor wafer and a semiconductor package, and a glass member such as a glass plate.
 また、本実施形態に係るワーク加工用シートが、前述した接着剤層を備える場合には、当該ワーク加工用シートは、ダイシング・ダイボンディングシートとして使用することができる。さらに、本実施形態に係るワーク加工用シートが、前述した保護膜形成層を備える場合には、当該ワーク加工用シートは、保護膜形成兼ダイシング用シートとして使用することができる。 In addition, when the work processing sheet according to the present embodiment includes the above-described adhesive layer, the work processing sheet can be used as a dicing die bonding sheet. Further, when the work processing sheet according to the present embodiment includes the above-described protective film forming layer, the work processing sheet can be used as a protective film formation and dicing sheet.
 本実施形態に係るワーク加工用シートでは、ワーク加工用シートのシリコンウエハに対する粘着力が前述した範囲であるとともに、前述した拭き取り後における水接触角が前述した範囲であることにより、粘着剤層を構成する粘着剤が加工後のワークに付着した場合であっても、流水により当該粘着剤を良好に除去することができる。さらに、粘着面における前述した拭き取り前における水接触角が前述した範囲であることにより、加工後のワークを良好に分離し易いものとなる。そのため、本実施形態に係るワーク加工用シートは、流水が使用される加工に使用することが好適であり、特に、切断部分に対して流水を供給することを伴うダイシングに使用することが好適である。すなわち、本実施形態に係るワーク加工用シートは、ダイシングシートとして使用することが好適である。 In the work processing sheet according to this embodiment, the adhesive force of the work processing sheet to the silicon wafer is in the above-described range, and the water contact angle after wiping is in the above-described range. Even if the constituent adhesive adheres to the work after processing, the adhesive can be satisfactorily removed by running water. Further, when the water contact angle on the adhesive surface before the wiping described above is in the above-described range, the work after processing can be easily separated well. Therefore, the work processing sheet according to the present embodiment is preferably used for processing in which running water is used, and is particularly preferably used for dicing involving supplying running water to a cut portion. is there. That is, the work processing sheet according to the present embodiment is preferably used as a dicing sheet.
 本実施形態に係るワーク加工用シートをダイシングシートとして使用する場合、ダイシングの条件および流水の供給条件としては、一般的な条件を使用することができる。特に流水の供給条件に関して、使用される水としては、純水等を使用することが好ましい。水の供給量としては、0.5L/min以上であることが好ましく、特に1L/min以上であることが好ましい。また、水の供給量としては、2.5L/min以下であることが好ましく、特に2L/min以下であることが好ましい。なお、水の温度は特に限定されず、例えば室温程度とすることが好ましい。 When the work processing sheet according to the present embodiment is used as a dicing sheet, general conditions can be used as dicing conditions and running water supply conditions. In particular, regarding the supply conditions of running water, it is preferable to use pure water or the like as water to be used. The supply amount of water is preferably 0.5 L / min or more, particularly preferably 1 L / min or more. Further, the supply amount of water is preferably 2.5 L / min or less, particularly preferably 2 L / min or less. The temperature of the water is not particularly limited, and is preferably, for example, about room temperature.
〔加工済みワークの製造方法〕
 本発明の一実施形態に係る加工済みワークの製造方法は、前述したワーク加工用シートの粘着剤層における基材とは反対側の面と、ワークとを貼合する貼合工程と、ワーク加工用シート上にてワークを加工することで、ワーク加工用シート上に積層された加工済みワークを得る加工工程と、粘着剤層に対して活性エネルギー線を照射して、粘着剤層を硬化させ、加工済みワークに対するワーク加工用シートの粘着力を低下させる照射工程と、活性エネルギー線照射後のワーク加工用シートから、加工済みワークを分離する分離工程とを備える。
[Production method of processed work]
The method for manufacturing a processed work according to one embodiment of the present invention includes a laminating step of laminating the surface of the pressure-sensitive adhesive layer of the work processing sheet opposite to the base material and the work, Processing the work on the work sheet to obtain a processed work laminated on the work processing sheet, and irradiating the adhesive layer with active energy rays to cure the adhesive layer An irradiation step of reducing the adhesive force of the work processing sheet to the processed work, and a separation step of separating the processed work from the work processing sheet after irradiation with the active energy ray.
 本実施形態の加工済みワークの製造方法に使用されるワーク加工用シートは、粘着剤層を構成する粘着剤が加工後のワークに付着した場合であっても、流水により当該粘着剤を良好に除去することができるとともに、加工済みワークを良好に分離し易いものである。そのため、本実施形態の加工済みワークの製造方法によれば、効率的に加工済みワークを製造することが可能となる。 The work processing sheet used in the method of manufacturing a processed work according to the present embodiment, even when the pressure-sensitive adhesive constituting the pressure-sensitive adhesive layer adheres to the work after processing, satisfactorily removes the pressure-sensitive adhesive by flowing water. It can be removed and easily separates the processed work. Therefore, according to the method for manufacturing a processed work of the present embodiment, it is possible to efficiently manufacture the processed work.
 以下、本実施形態の加工済みワークの製造方法における各工程について説明する。 Hereinafter, each step in the method for manufacturing a processed work of the present embodiment will be described.
(1)貼合工程
 貼合工程におけるワークとワーク加工用シートとの貼合は、従来公知の手法により行うことができる。なお、続く加工工程においてワークのダイシングを行う場合には、ワーク加工用シートの粘着剤層側の面における、ワークを貼合する領域の外周側の領域に、リングフレームを貼合することが好ましい。また、使用するワークは、製造しようとする加工済みワークに応じた所望のものであってよく、具体例としては、前述したものを使用することができる。
(1) Laminating Step The laminating of the work and the work processing sheet in the laminating step can be performed by a conventionally known method. In the case of performing the work dicing in the subsequent processing step, it is preferable to bond a ring frame to a region on the pressure-sensitive adhesive layer side of the work processing sheet on the outer peripheral side of the region where the work is bonded. . The work to be used may be a desired work according to the processed work to be manufactured, and as a specific example, the above-described work can be used.
(2)加工工程
 加工工程においては、ワークに対して所望の加工を行うことができ、例えばバックグラインド、ダイシング等を行うことができる。これらの加工は、従来公知の手法により行うことができる。
(2) Processing Step In the processing step, desired processing can be performed on the work, and for example, back grinding, dicing, and the like can be performed. These processes can be performed by a conventionally known method.
 なお、上記加工として、回転するブレードを用いたブレードダイシングを行う場合、一般的に、ワークとともに、ワーク加工用シートにおける粘着剤層の一部が切断されるものとなる。その際、粘着剤層を構成する粘着剤がブレードによって巻き上げられ、加工済みワークに付着することがある。しかしながら、本実施形態の加工済みワークの製造方法に使用されるワーク加工用シートでは、前述した通り、付着した粘着剤を流水により良好に除去することができる。この観点から、本実施形態における加工は、ダイシングであることが好適であり、特に回転するブレードを用いたブレードダイシングであることが好適である。 When blade dicing using a rotating blade is performed as the above processing, generally, a part of the pressure-sensitive adhesive layer of the work processing sheet is cut together with the work. At that time, the pressure-sensitive adhesive constituting the pressure-sensitive adhesive layer may be wound up by the blade and adhere to the processed work. However, in the work processing sheet used in the method of manufacturing a processed work according to the present embodiment, as described above, the adhered adhesive can be removed satisfactorily by running water. From this viewpoint, the processing in the present embodiment is preferably dicing, and particularly preferably blade dicing using a rotating blade.
(3)照射工程
 照射工程では、加工済みワークに対するワーク加工用シートの粘着力を所望の程度低下させることができる限り、活性エネルギー線の照射の条件は限定されず、従来公知の手法に基づいて行うことができる。使用する活性エネルギー線の種類としては、例えば、電離放射線、すなわち、X線、紫外線、電子線などが挙げられ、中でも、比較的照射設備の導入の容易な紫外線が好ましい。
(3) Irradiation Step In the irradiation step, the irradiation condition of the active energy ray is not limited as long as the adhesive force of the work processing sheet to the processed work can be reduced to a desired degree. It can be carried out. Examples of the type of active energy rays used include ionizing radiation, that is, X-rays, ultraviolet rays, and electron beams. Of these, ultraviolet rays, which are relatively easy to introduce irradiation equipment, are preferable.
(4)分離工程
 分離工程では、加工の種類や得られた加工済みワークに応じた方法により、分離を行う。例えば、加工としてダイシングを行い、当該ダイシングによって、ワークが個片化されてなるチップが得られた場合には、従来公知のピックアップ装置を用いて、得られたチップを個々にワーク加工用シートからピックアップする。また、当該ピックアップを容易にするために、ワーク加工用シートをエキスパンドして、加工済みワーク同士を離間させてもよい。
(4) Separation Step In the separation step, separation is performed by a method according to the type of processing and the obtained processed work. For example, when dicing is performed as processing, and when the chips obtained by singulating the work are obtained by the dicing, the obtained chips are individually separated from the work processing sheet using a conventionally known pickup device. Pick up. Further, in order to facilitate the pickup, the work processing sheet may be expanded to separate the processed works from each other.
(5)その他
 本実施形態の加工済みワークの製造方法では、上述した工程以外の工程を設けてもよい。例えば、貼合工程の後に、得られたワークとワーク加工用シートとの積層体を所定の位置に搬送する搬送工程や、当該積層体を所定の期間保管する保管工程等を設けてもよい。また、分離工程の後に、得られた加工済みワークを、所定の基盤等にマウントするマウント工程等を設けてもよい。
(5) Others In the method for manufacturing a processed work of the present embodiment, steps other than the above-described steps may be provided. For example, after the laminating step, a transporting step of transporting the laminated body of the obtained work and the work processing sheet to a predetermined position, a storage step of storing the laminated body for a predetermined period, or the like may be provided. After the separation step, a mounting step or the like for mounting the obtained processed work on a predetermined base or the like may be provided.
 以上説明した実施形態は、本発明の理解を容易にするために記載されたものであって、本発明を限定するために記載されたものではない。したがって、上記実施形態に開示された各要素は、本発明の技術的範囲に属する全ての設計変更や均等物をも含む趣旨である。 The embodiments described above are described to facilitate understanding of the present invention, but not to limit the present invention. Therefore, each element disclosed in the above embodiment is intended to include all design changes and equivalents belonging to the technical scope of the present invention.
 例えば、基材と粘着剤層との間、または基材における粘着剤層とは反対側の面には、その他の層が設けられてもよい。 For example, another layer may be provided between the substrate and the pressure-sensitive adhesive layer or on the surface of the substrate opposite to the pressure-sensitive adhesive layer.
 以下、実施例等により本発明をさらに具体的に説明するが、本発明の範囲はこれらの実施例等に限定されるものではない。 Hereinafter, the present invention will be described more specifically with reference to Examples and the like, but the scope of the present invention is not limited to these Examples and the like.
〔実施例1〕
(1)粘着剤組成物の調製
 アクリル酸メチル40質量部と、アクリル酸2-メトキシエチル40質量部と、アクリル酸2-ヒドロキシエチル20質量部とを共重合させて得られたアクリル系共重合体と、当該アクリル系共重合体100gに対して21.4g(アクリル酸2-ヒドロキシエチルのモル数に対して80モル%に相当する。)のメタクリロイルオキシエチルイソシアネート(MOI)とを反応させて、活性エネルギー線硬化性重合体を得た。この活性エネルギー線硬化性重合体の重量平均分子量(Mw)を後述する方法で測定したところ、60万であった。
[Example 1]
(1) Preparation of pressure-sensitive adhesive composition Acrylic copolymer obtained by copolymerizing 40 parts by mass of methyl acrylate, 40 parts by mass of 2-methoxyethyl acrylate, and 20 parts by mass of 2-hydroxyethyl acrylate The polymer was reacted with 21.4 g (corresponding to 80 mol% based on the number of moles of 2-hydroxyethyl acrylate) of methacryloyloxyethyl isocyanate (MOI) per 100 g of the acrylic copolymer. Thus, an active energy ray-curable polymer was obtained. The weight average molecular weight (Mw) of the active energy ray-curable polymer was measured by a method described later and found to be 600,000.
 得られた活性エネルギー線硬化性重合体100質量部(固形分換算,以下同じ)と、光重合開始剤としての1-ヒドロキシシクロヘキシルフェニルケトン(BASF社製,製品名「イルガキュア184」)3質量部と、架橋剤としてのトルエンジイソシアネート(東ソー社製,製品名「コロネートL」)4.97質量部と、添加剤としての活性エネルギー線重合性分岐重合体(日産化学工業社製,製品名「OD-007」,重量平均分子量:14000)0.18質量部とを溶媒中で混合し、粘着剤組成物を得た。 100 parts by mass of the obtained active energy ray-curable polymer (in terms of solid content, the same applies hereinafter) and 3 parts by mass of 1-hydroxycyclohexyl phenyl ketone (manufactured by BASF, product name "Irgacure 184") as a photopolymerization initiator 4.97 parts by mass of toluene diisocyanate (product name "Coronate L" manufactured by Tosoh Corporation) as a crosslinking agent, and an active energy ray-polymerizable branched polymer (product name "OD" manufactured by Nissan Chemical Industries, Ltd.) as an additive -007 ", weight average molecular weight: 14000) and 0.18 parts by mass in a solvent to obtain a pressure-sensitive adhesive composition.
(2)粘着剤層の形成
 厚さ38μmのポリエチレンテレフタレートフィルムの片面にシリコーン系の剥離剤層が形成されてなる剥離シート(リンテック社製,製品名「SP-PET381031」)の剥離面に対して、上記粘着剤組成物を塗布し、加熱により乾燥させた後、23℃、50%RHの条件下で7日間養生することにより、剥離シート上に厚さ5μmの粘着剤層を形成した。
(2) Formation of pressure-sensitive adhesive layer For the release surface of a release sheet (manufactured by Lintec, product name "SP-PET381031") in which a silicone-based release agent layer is formed on one side of a 38 μm-thick polyethylene terephthalate film After applying the above-mentioned pressure-sensitive adhesive composition and drying it by heating, it was cured at 23 ° C. and 50% RH for 7 days to form a pressure-sensitive adhesive layer having a thickness of 5 μm on the release sheet.
(3)ワーク加工用シートの作製
 上記工程(2)で形成した粘着剤層の剥離シートとは反対側の面と、基材としての厚さ80μmのエチレン-メタクリル酸共重合体(EMAA)フィルムの片面とを貼り合わせることで、ワーク加工用シートを得た。
(3) Production of work processing sheet A surface of the pressure-sensitive adhesive layer formed in step (2) opposite to the release sheet, and an 80-μm-thick ethylene-methacrylic acid copolymer (EMAA) film as a base material To obtain a workpiece processing sheet.
 ここで、前述した重量平均分子量(Mw)は、ゲルパーミエーションクロマトグラフィー(GPC)を用いて測定(GPC測定)した標準ポリスチレン換算の重量平均分子量である。 Here, the above-mentioned weight average molecular weight (Mw) is a weight average molecular weight in terms of standard polystyrene measured (GPC measurement) using gel permeation chromatography (GPC).
〔実施例2~7および比較例1~3〕
 アクリル系共重合体の組成、架橋剤の含有量および添加剤の含有量を表1に示すように変更する以外、実施例1と同様にしてワーク加工用シートを製造した。
[Examples 2 to 7 and Comparative Examples 1 to 3]
A work processing sheet was manufactured in the same manner as in Example 1, except that the composition of the acrylic copolymer, the content of the crosslinking agent, and the content of the additive were changed as shown in Table 1.
〔試験例1〕(水接触角の測定)
 実施例および比較例で製造したワーク加工用シートから剥離シートを剥離し、露出した粘着剤層の露出面における水接触角(°)を、全自動式接触角測定計(協和界面科学社製,製品名「DM-701」)を使用して以下の条件で測定した。その結果を、拭き取り前の水接触角として表1に示す。
 ・精製水の液滴量:2μl
 ・測定時間:滴下3秒後
 ・画像解析法:θ/2法
[Test Example 1] (Measurement of water contact angle)
The release sheet was peeled off from the work processing sheets manufactured in Examples and Comparative Examples, and the water contact angle (°) on the exposed surface of the exposed pressure-sensitive adhesive layer was measured using a fully automatic contact angle measurement meter (manufactured by Kyowa Interface Science Co., Ltd.). It was measured under the following conditions using a product name “DM-701”). The results are shown in Table 1 as water contact angles before wiping.
-Purified water droplet volume: 2 µl
・ Measurement time: 3 seconds after dropping ・ Image analysis method: θ / 2 method
 さらに、実施例および比較例で製造したワーク加工用シートから剥離シートを剥離し、粘着剤層を露出させた。続いて、不織布(旭化成社製,製品名「ベンコット」,サイズ:250mm×210mm)を62.5mm×52.5mmのサイズに折りたたむとともに、メチルエチルケトン15mLを含ませた状態で、上記粘着剤層の露出面に積層し、23℃、相対湿度50%の環境下で15分間静置した。静置後、上述の通り折りたたんだ不織布によって、粘着剤層の露出面を拭き取り、上記と同様の環境下にて1時間静置して、当該露出面を乾燥させた。このような拭き取り処理を行った粘着剤層における基材とは反対側の面について、上記と同様の条件にて水接触角を測定した。その結果を、拭き取り後の水接触角として表1に示す。 Furthermore, the release sheet was peeled off from the work processing sheets produced in Examples and Comparative Examples, exposing the pressure-sensitive adhesive layer. Subsequently, a non-woven fabric (manufactured by Asahi Kasei Corporation, product name “Bencott”, size: 250 mm × 210 mm) is folded to a size of 62.5 mm × 52.5 mm, and the adhesive layer is exposed while 15 mL of methyl ethyl ketone is contained. It was laminated on the surface and allowed to stand for 15 minutes in an environment of 23 ° C. and 50% relative humidity. After standing, the exposed surface of the pressure-sensitive adhesive layer was wiped off with the folded nonwoven fabric as described above, and allowed to stand for 1 hour in the same environment as above to dry the exposed surface. The water contact angle was measured on the surface of the pressure-sensitive adhesive layer on which the wiping treatment was performed, on the side opposite to the substrate under the same conditions as described above. The results are shown in Table 1 as water contact angles after wiping.
〔試験例2〕(粘着力の測定)
 実施例および比較例で製造したワーク加工用シートから剥離シートを剥離し、露出した粘着剤層の露出面を鏡面加工した6インチシリコンウエハの鏡面に重ね合わせ、2kgのローラーを1往復させることにより荷重をかけて貼合し、20分放置することで、粘着力測定用サンプルを得た。
[Test Example 2] (Measurement of adhesive strength)
By peeling the release sheet from the work processing sheet manufactured in each of Examples and Comparative Examples, the exposed surface of the exposed pressure-sensitive adhesive layer is superimposed on the mirror surface of a mirror-finished 6-inch silicon wafer, and a 2 kg roller is reciprocated once. The sample was adhered under a load and left for 20 minutes to obtain a sample for measuring adhesive strength.
 当該粘着力測定用サンプルについて、シリコンウエハから、剥離速度300mm/min、剥離角度180°にてワーク加工用シートを剥離し、JIS Z0237:2009に準じた180°引き剥がし法により、シリコンウエハに対する粘着力(mN/25mm)を測定した。その結果を、紫外線照射前(UV前)の粘着力として表1に示す。 With respect to the sample for measuring adhesive strength, the work processing sheet was peeled off from the silicon wafer at a peeling speed of 300 mm / min and a peeling angle of 180 °, and the adhesiveness to the silicon wafer was obtained by a 180 ° peeling method according to JIS Z0237: 2009. The force (mN / 25 mm) was measured. The results are shown in Table 1 as the adhesive strength before ultraviolet irradiation (before UV).
〔試験例3〕(粘着剤の除去性の評価)
 実施例および比較例で製造したワーク加工用シートから剥離シートを剥離し、露出した粘着剤層の露出面に、テープマウンター(リンテック社製,製品名「Adwill RAD2500m/12」)を用いて、#2000研磨した6インチシリコンウエハ(厚さ:150μm)の研磨面を貼付した。続いて、ダイシング装置(ディスコ社製,製品名「DFD-6361」)を用いて、以下のダイシング条件で切断部に流水を供給しながら6インチシリコンウエハ側から切断するダイシングを行った。
[Test Example 3] (Evaluation of adhesive removeability)
The release sheet was peeled off from the work processing sheet manufactured in each of Examples and Comparative Examples, and a tape mounter (manufactured by Lintec, product name “Adwill RAD 2500m / 12”) was used on the exposed surface of the exposed pressure-sensitive adhesive layer. A polished surface of a 2,000-polished 6-inch silicon wafer (thickness: 150 μm) was attached. Subsequently, using a dicing apparatus (manufactured by Disco, product name "DFD-6361"), dicing was performed to cut from the 6-inch silicon wafer side while supplying running water to the cutting section under the following dicing conditions.
<ダイシング条件>
 ・ダイシング装置:ディスコ社製 DFD-6361
 ・ブレード   :ディスコ社製 NBC-2H 2050 27HECC
 ・ブレード幅  :0.025~0.030mm
 ・刃先出し量  :0.640~0.760mm
 ・ブレード回転数:50000rpm
 ・切削速度   :20mm/sec
 ・切り込み深さ :ワーク加工用シートにおける粘着剤層側の面から15μm
 ・流水供給量  :1.0L/min
 ・流水温度   :室温
 ・カットサイズ :10mm×10mm
<Dicing conditions>
・ Dicing device: DFD-6361 manufactured by Disco Corporation
・ Blade: NBC-2H 2050 27HECC manufactured by Disco Corporation
・ Blade width: 0.025 to 0.030 mm
・ Cutting edge: 0.640 to 0.760 mm
-Blade rotation speed: 50,000 rpm
・ Cutting speed: 20mm / sec
・ Cut depth: 15 μm from the surface of the work processing sheet on the side of the adhesive layer
・ Flowing water supply: 1.0 L / min
-Running water temperature: room temperature-Cut size: 10 mm x 10 mm
 上記ダイシングにより得られたチップを、ワーク加工用シートから20個分離し、それらに粘着剤が付着しているかどうかを目視にて確認した。そして、以下の基準に基づいて、粘着剤の除去性を評価した。結果を表1に示す。
 〇:粘着剤が付着しているチップが0個であった。
 ×:粘着剤が付着しているチップが1個以上であった。
Twenty chips obtained by the dicing were separated from the work processing sheet, and it was visually confirmed whether or not an adhesive was attached to them. Then, the removability of the pressure-sensitive adhesive was evaluated based on the following criteria. Table 1 shows the results.
〇: No chip to which the adhesive was attached.
X: One or more chips to which the adhesive was adhered.
〔試験例4〕(分離性の評価)
 実施例および比較例で製造したワーク加工用シートを用いて、試験例3と同様にダイシングを行った。ダイシングの完了後、ワーク加工用シート側の面に、紫外線照射装置(リンテック社製,製品名「RAD-2000」)を用いて紫外線(UV)を照射し(照度:230mW/cm,光量:190mJ/cm)、粘着剤層を硬化させた。その後、得られた全てのチップをワーク加工用シートからピックアップした。このとき、ワーク加工用シートにおけるガラスチップが貼付された面とは反対側の面から、ニードルによる突き上げを行った(ニードル数:4本,突き上げ速度:50mm/秒,突き上げ高さ:0.5mm)。このときのピックアップの状況に基づいて、以下の基準より、チップをワーク加工用シートから分離する際の分離性を評価した。結果を表1に示す。
 〇:何の問題もなくピックアップできた。
 ×:チップの分離ができないか、チップの破損が生じたことにより、良好にピックアップできなかった。
[Test Example 4] (Evaluation of separability)
Dicing was performed in the same manner as in Test Example 3 using the work processing sheets manufactured in Examples and Comparative Examples. After completion of dicing, the surface on the work processing sheet side is irradiated with ultraviolet rays (UV) using an ultraviolet irradiation apparatus (manufactured by Lintec, product name "RAD-2000") (illuminance: 230 mW / cm 2 , light intensity: 190 mJ / cm 2 ) to cure the pressure-sensitive adhesive layer. Thereafter, all the obtained chips were picked up from the work processing sheet. At this time, a needle was pushed up from the surface of the work processing sheet opposite to the surface to which the glass chip was attached (the number of needles: 4, the pushing speed: 50 mm / sec, the pushing height: 0.5 mm). ). Based on the condition of the pickup at this time, the separability when separating the chip from the work processing sheet was evaluated based on the following criteria. Table 1 shows the results.
〇: I was able to pick up without any problem.
X: The chip could not be picked up properly because the chip could not be separated or the chip was damaged.
 なお、表1に記載の略号等の詳細は以下の通りである。
 BA:アクリル酸ブチル
 MMA:メタクリル酸メチル
 MA:アクリル酸メチル
 2MEA:アクリル酸2-メトキシエチル
 AA:アクリル酸
 HEA:アクリル酸2-ヒドロキシエチル
The details of the abbreviations and the like described in Table 1 are as follows.
BA: butyl acrylate MMA: methyl methacrylate MA: methyl acrylate 2MEA: 2-methoxyethyl acrylate AA: acrylate HEA: 2-hydroxyethyl acrylate
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
 表1から分かるように、実施例で得られたワーク加工用シートによれば、流水によって粘着剤を良好に除去することが可能であるとともに、加工後のワークを良好に分離することができた。 As can be seen from Table 1, according to the work processing sheet obtained in the example, the pressure-sensitive adhesive could be satisfactorily removed by running water, and the work after processing could be separated well. .
 本発明のワーク加工用シートは、ダイシングに好適に使用することができる。 ワ ー ク The work processing sheet of the present invention can be suitably used for dicing.

Claims (5)

  1.  基材と、前記基材における片面側に積層された粘着剤層とを備えるワーク加工用シートであって、
     前記粘着剤層が、活性エネルギー線硬化性粘着剤から構成されており、
     前記粘着剤層における前記基材とは反対側の面の水接触角が、80°超であり、
     前記ワーク加工用シートのシリコンウエハに対する粘着力が、5000mN/25mm以下であり、
     前記粘着剤層における前記基材とは反対側の面上に、メチルエチルケトンを含ませた不織布を積層し、23℃、相対湿度50%の環境下で15分間静置した後、前記不織布にて前記面を拭き取り、23℃、相対湿度50%の環境下で1時間静置することで乾燥させた前記面にて測定される水接触角が、50°以上、80°以下である
    ことを特徴とするワーク加工用シート。
    A work processing sheet comprising a base material and an adhesive layer laminated on one side of the base material,
    The pressure-sensitive adhesive layer is composed of an active energy ray-curable pressure-sensitive adhesive,
    The water contact angle of the surface of the pressure-sensitive adhesive layer opposite to the substrate is more than 80 °,
    The work processing sheet has an adhesive force to a silicon wafer of 5000 mN / 25 mm or less;
    On the surface of the pressure-sensitive adhesive layer opposite to the substrate, a non-woven fabric containing methyl ethyl ketone was laminated, and allowed to stand at 23 ° C. and a relative humidity of 50% for 15 minutes. The water contact angle measured on the surface that has been dried by wiping the surface and allowed to stand for 1 hour in an environment of 23 ° C. and 50% relative humidity is 50 ° or more and 80 ° or less. Work processing sheet.
  2.  前記活性エネルギー線硬化性粘着剤は、活性エネルギー線重合性分岐重合体を含有する粘着剤組成物から形成された粘着剤であることを特徴とする請求項1に記載のワーク加工用シート。 The work processing sheet according to claim 1, wherein the active energy ray-curable pressure-sensitive adhesive is a pressure-sensitive adhesive formed from a pressure-sensitive adhesive composition containing an active energy ray-polymerizable branched polymer.
  3.  前記粘着剤組成物は、官能基含有モノマー単位を有するアクリル系共重合体と、前記官能基に結合する官能基を有する不飽和基含有化合物とを反応させて得られる活性エネルギー線硬化性重合体を含有するものであり、
     前記アクリル系共重合体は、重合体を構成するモノマー単位として、アクリル酸メチル、(メタ)アクリル酸2-メトキシエチル、(メタ)アクリル酸エチルカルビトールおよび(メタ)アクリル酸メトキシエチレングリコールから選択される少なくとも1種を含む
    ことを特徴とする請求項1または2に記載のワーク加工用シート。
    The pressure-sensitive adhesive composition is an active energy ray-curable polymer obtained by reacting an acrylic copolymer having a functional group-containing monomer unit with an unsaturated group-containing compound having a functional group bonded to the functional group. Which contains
    The acrylic copolymer is selected from methyl acrylate, 2-methoxyethyl (meth) acrylate, ethyl carbitol (meth) acrylate and methoxyethylene glycol (meth) acrylate as monomer units constituting the polymer. The work processing sheet according to claim 1, further comprising at least one of the following.
  4.  ダイシングシートであることを特徴とする請求項1~3のいずれか一項に記載のワーク加工用シート。 The work processing sheet according to any one of claims 1 to 3, wherein the sheet is a dicing sheet.
  5.  請求項1~4のいずれか一項に記載のワーク加工用シートの前記粘着剤層における前記基材とは反対側の面と、ワークとを貼合する貼合工程と、
     前記ワーク加工用シート上にて前記ワークを加工することで、前記ワーク加工用シート上に積層された加工済みワークを得る加工工程と、
     前記粘着剤層に対して活性エネルギー線を照射して、前記粘着剤層を硬化させ、前記加工済みワークに対する前記ワーク加工用シートの粘着力を低下させる照射工程と、
     活性エネルギー線照射後の前記ワーク加工用シートから、前記加工済みワークを分離する分離工程と
    を備えることを特徴とする加工済みワークの製造方法。
    A laminating step of laminating a surface of the pressure-sensitive adhesive layer of the work processing sheet according to any one of claims 1 to 4 opposite to the base material, and a work.
    A processing step of obtaining a processed work laminated on the work processing sheet by processing the work on the work processing sheet,
    Irradiating the pressure-sensitive adhesive layer with active energy rays, curing the pressure-sensitive adhesive layer, an irradiation step of reducing the adhesion of the work processing sheet to the processed work,
    A separating step of separating the processed work from the work processing sheet after the active energy ray irradiation.
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