WO2020042869A1 - 液晶显示面板的聚酰亚胺涂布方法 - Google Patents

液晶显示面板的聚酰亚胺涂布方法 Download PDF

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Publication number
WO2020042869A1
WO2020042869A1 PCT/CN2019/099182 CN2019099182W WO2020042869A1 WO 2020042869 A1 WO2020042869 A1 WO 2020042869A1 CN 2019099182 W CN2019099182 W CN 2019099182W WO 2020042869 A1 WO2020042869 A1 WO 2020042869A1
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Prior art keywords
substrate
polyimide
coating
liquid crystal
crystal display
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French (fr)
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余朋飞
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Wuhan China Star Optoelectronics Technology Co Ltd
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Wuhan China Star Optoelectronics Technology Co Ltd
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
    • G02F1/133723—Polyimide, polyamide-imide

Definitions

  • the present invention relates to a coating method, and more particularly to a polyimide coating method for a liquid crystal display panel.
  • Liquid crystal display (LCD, LiquidCrystalDisplay) has many advantages such as thin body, power saving, no radiation, etc., and has been widely used.
  • Most of the liquid crystal display devices on the existing market are backlight type liquid crystal display devices, which include a liquid crystal display panel and a backlight module.
  • the working principle of a liquid crystal display panel is to place liquid crystal molecules in two parallel substrates, and control whether the liquid crystal molecules change direction by turning on or off the substrate, and refract the light of the backlight module to generate a picture.
  • a liquid crystal display panel is composed of a color filter substrate (CF, ColorFilter), a thin film transistor substrate (TFT, ThinFilmTransistor), a liquid crystal (LC, Liquid Crystal) sandwiched between the color film substrate and the thin film transistor substrate, and a sealant.
  • CF color filter substrate
  • TFT thin film transistor substrate
  • LC liquid crystal
  • Liquid crystal display panels usually coat polyimide (PI, Polyimide) liquid, and a pretilt angle is formed on the polyimide by rubbing or photoetching technology, so as to provide a bearing angle for the liquid crystal molecules.
  • the polyimide coating process in the prior art mainly uses the following methods: uniformly distributing the polyimide liquid on the alignment plate (APR plate), and then passing the polyimide liquid through a roller (Roller) ) Is transferred to the thin film transistor or the color film substrate, and the thin film transistor or the color film substrate moves in the plane at the same time, thereby completing the coating of the polyimide.
  • the transfer device includes a regulating roller, an ink transfer roller, and an APR plate
  • the structure is complicated, the cost is high, and it is easy to wear.
  • Limited by the structure of the APR plate it is difficult to achieve quantitative control of the coating process of the alignment film, there is a deviation in the uniformity of the alignment film, and there is a risk that the PI liquid overflows to the IC area during the transfer process.
  • An object of the present invention is to provide a polyimide coating method for a liquid crystal display panel.
  • a polyimide film is used to selectively coat a polyimide film on a coating area of a substrate, so as to realize a groove of a flat layer while eliminating APR. The process of plate transfer.
  • an embodiment of the present invention provides a polyimide coating method for a liquid crystal display panel.
  • the polyimide coating method includes a preparation step, a coating step, and a light.
  • a polyimide liquid is sprayed by using the nozzles To the substrate so that the polyimide solution is evenly distributed on the substrate to form a polyimide film, wherein the nozzle sprays the polyimide solution to the substrate at a set flow rate.
  • the photoresist coating step a photoresist is coated on the substrate so that the photoresist is evenly distributed on the polyimide film A photoresist layer is formed thereon; in the exposing step, A photomask is placed above the photoresist layer, and an exposure light source is disposed above the photomask, and then the photoresist layer is exposed and developed to form at least one photoresist layer opening, wherein the photoresist The layer opening exposes at least one local polyimide film, the local polyimide film corresponding to the chip region of the substrate; in the cleaning step, the local polyimide film is removed by using a solvent. , Exposing the chip region of the substrate; in the photoresist removal step, removing the photoresist layer remaining after exposure and development to expose the coating region on the coating region of the substrate Polyimide film.
  • the polyimide film uniformly distributed on the substrate is modified by a doctor blade, so that the polyimide on the substrate is modified.
  • One surface of the amine film is even and flat.
  • the photoresist layer is formed by a dynamic spraying method, a brush method, a spin coating method, or a dipping method.
  • the exposure light source in the exposing step, is an ion beam or a high-pressure mercury lamp.
  • the solvent is N-methylpyrrolidone (NMP), Y-butyrolactone (GBL), butyl carbonate (BC), or a mixed solvent thereof.
  • the substrate in the preparing step, is a thin film transistor substrate or a color film substrate.
  • the photoresist layer in the photoresist removal step, is wet-etched by using at least one organic solvent to remove the photoresist layer remaining after exposure and development.
  • the organic solvent includes isomethyl ether propylene glycol, propylene glycol isopropyl ether ether, or ethanolamine.
  • an embodiment of the present invention provides a polyimide coating method for a liquid crystal display panel.
  • the polyimide coating method includes a preparation step, a coating step, and a light.
  • a polyimide solution is sprayed onto the substrate by using the nozzle, so that the polyimide solution is evenly distributed on the substrate to form a polyimide film.
  • a photoresist is coated on the substrate, so that the photoresist is evenly distributed on the polyimide film to form a photoresist layer;
  • a photomask is placed above the photoresist layer, an exposure light source is set above the photomask, and then the photoresist layer is exposed and developed to form at least one photoresist layer opening.
  • the photoresist layer is exposed to at least one local polyimide Film, the local polyimide film corresponds to the chip region of the substrate; in the cleaning step, the solvent is used to remove the local polyimide film, so that the chip region of the substrate Exposure; in the photoresist removal step, removing the photoresist layer remaining after exposure and development to expose the polyimide film on the coating area of the substrate.
  • the nozzles are closely and evenly arranged in a whole row, so that the arrangement length of the nozzles is equal to the width of the substrate.
  • the nozzle sprays the polyimide liquid onto the substrate at a set flow rate, and simultaneously moves the substrate.
  • the polyimide film uniformly distributed on the substrate is modified by a doctor blade, so that the polyimide on the substrate is modified.
  • One surface of the amine film is even and flat.
  • the photoresist layer is formed by a dynamic spraying method, a brush method, a spin coating method, or a dipping method.
  • the exposure light source in the exposing step, is an ion beam or a high-pressure mercury lamp.
  • the solvent is N-methylpyrrolidone (NMP), Y-butyrolactone (GBL), butyl carbonate (BC), or a mixed solvent thereof.
  • the substrate in the preparing step, is a thin film transistor substrate or a color film substrate.
  • the photoresist layer in the photoresist removal step, is wet-etched by using at least one organic solvent to remove the photoresist layer remaining after exposure and development.
  • the organic solvent includes isomethyl ether propylene glycol, propylene glycol isopropyl ether ether, or ethanolamine.
  • the beneficial effect of the present invention is that the polyimide coating method of the liquid crystal display panel of the present invention selectively applies the polyimide film to the coating area of the substrate in an exposure manner to achieve flatness.
  • Layer (PLN) grooves while avoiding the APR plate transfer process, thereby avoiding the occurrence of indium tin oxide (ITO) residues, and reducing the risk of PI liquid spilling to the IC area during the APR plate transfer process.
  • FIG. 1 is a flowchart of a preferred embodiment of a polyimide coating method for a liquid crystal display panel of the present invention.
  • FIG. 2 is a schematic diagram of a preparation step of a preferred embodiment of a polyimide coating method for a liquid crystal display panel of the present invention.
  • FIG. 3 is a schematic diagram of a polyimide coating method of a liquid crystal display panel according to a preferred embodiment of the present invention in a coating step.
  • FIG. 4 is a schematic diagram of a photoresist coating step in a preferred embodiment of a polyimide coating method of a liquid crystal display panel of the present invention.
  • FIG. 5 is a schematic diagram of an exposure step of a preferred embodiment of a polyimide coating method of a liquid crystal display panel of the present invention.
  • FIG. 6 is a schematic diagram of a cleaning step of a preferred embodiment of a polyimide coating method for a liquid crystal display panel of the present invention.
  • FIG. 7 is a schematic diagram of a photoresist removal step in a preferred embodiment of a polyimide coating method for a liquid crystal display panel of the present invention.
  • FIG. 1 is a flowchart of a preferred embodiment of a polyimide coating method for a liquid crystal display panel of the present invention.
  • the polyimide coating method of the liquid crystal display panel includes a setting step S201, a coating step S202, a photoresist coating step S203, an exposure step S204, a cleaning step S205, and a photoresist removal step S206.
  • the present invention will explain in detail the relationship between the above components of each embodiment and its operation principle.
  • a plurality of nozzles (not shown) and a substrate 2 are provided.
  • the substrate 2 has at least one coating area 21 and at least one chip area 22.
  • the nozzles are closely and evenly arranged in a whole row, so that the length of the nozzles is equal to the width of the substrate 2.
  • the substrate 2 is a thin film transistor substrate or a color film Substrate.
  • a polyimide solution is sprayed on the substrate 2 by using the nozzle, so that the polyimide solution is uniformly distributed on the substrate.
  • a polyimide film 3 is formed on the substrate 2.
  • the nozzle sprays the polyimide liquid onto the substrate 2 at a set flow rate, and simultaneously moves the substrate 2.
  • the polyimide film 3 evenly distributed on the substrate 2 is modified by a scraper (not shown) to make one surface of the polyimide film 3 on the substrate 2 uniform. smooth.
  • a photoresist is coated on the substrate 2 so that the photoresist is uniformly distributed on the polyimide film. 3 to form a photoresist layer 4; in this embodiment, the photoresist layer 4 is formed by a dynamic spraying method, a brush method, a spin coating method, or a dipping method.
  • a photomask (not shown) is placed above the photoresist layer 4, and an exposure light source is disposed above the photomask. Then, the photoresist layer 4 is exposed and developed to form at least one photoresist layer opening 41, wherein the photoresist layer opening 41 exposes at least one local polyimide film 31, and the local polyimide film 31 corresponds to The chip region 22 of the substrate 2 (see FIG. 2).
  • the exposure light source is an ion beam or a high-pressure mercury lamp.
  • the local polyimide film 31 (see FIG. 5) is removed by using a solvent, so that the chip region 22 of the substrate 2 is exposed. come out.
  • the photoresist layer 4 (see FIG. 6) remaining after exposure and development is removed to expose the coating on the substrate 2.
  • the polyimide film 3 on the region 21 (see FIG. 2).
  • the solvent is N-methylpyrrolidone (NMP), Y-butyrolactone (GBL), butyl carbonate (BC), or a mixed solvent thereof.
  • the photoresist layer 4 is removed by wet etching the photoresist layer 3 with at least one organic solvent to remove the photoresist layer 4 remaining after exposure and development, wherein the organic solvent contains Methyl ether propylene glycol, propylene glycol isomethyl ether ester or ethanolamine.
  • the polyimide coating method of the liquid crystal display panel of the present invention selectively applies the polyimide film 3 to the coating area 21 of the substrate 2 in an exposure manner to achieve flatness.
  • Layer (PLN) grooves while avoiding the APR plate transfer process, thereby avoiding the occurrence of indium tin oxide (ITO) residues, and reducing the risk of PI liquid spilling to the IC area during the APR plate transfer process.
  • ITO indium tin oxide

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Liquid Crystal (AREA)

Abstract

本发明公开一种液晶显示面板的聚酰亚胺涂布方法，包括一备置步骤、一涂布步骤、一光阻涂布步骤、一曝光步骤、一清洗步骤及一光阻去除步骤。利用聚酰亚胺薄膜选择性地涂布在一基板的涂布区，用以实现平坦层的沟槽，同时免除APR板转印的工序。

Description

液晶显示面板的聚酰亚胺涂布方法 技术领域
本发明是有关于一种涂布方法，特别是有关于一种液晶显示面板的聚酰亚胺涂布方法。
 背景技术
液晶显示装置(LCD,LiquidCrystalDisplay)具有机身薄、省电、无辐射等众多优点，得到了广泛的应用。现有市场上的液晶显示装置大部分为背光型液晶显示装置，其包括液晶显示面板及背光模组(backlightmodule)。液晶显示面板的工作原理是在两片平行的基板当中放置液晶分子，通过基板通电与否来控制液晶分子改变方向，将背光模组的光线折射出来产生画面。
通常液晶显示面板由彩膜基板(CF，ColorFilter)、薄膜晶体管基板(TFT，ThinFilmTransistor)、夹于彩膜基板与薄膜晶体管基板之间的液晶(LC，LiquidCrystal)及密封胶框(Sealant)组成。液晶显示面板通常会在薄膜晶体管基板及彩膜基板上涂布聚酰亚胺(PI, Polyimide)液，并在聚酰亚胺上通过摩擦(Rubbing)或光蚀刻技术形成预倾角，从而给液晶分子提供一个承载的角度。
现有技术中的聚酰亚胺涂布工艺主要通过以下方式：将聚酰亚胺液均匀地分布在配向版(APR版)上，然后通过配向版把聚酰亚胺液通过辊筒(Roller)转印到薄膜晶体管或者彩膜基板上，同时薄膜晶体管或者彩膜基板于平面内移动移动，进而完成聚酰亚胺的涂布。
然而，由于转印装置包含调节辊、传墨辊以及APR版，结构复杂、成本高且易于磨损。受限于APR版的结构，使得取向膜的涂布过程难以实现定量控制，取向膜的均匀性存在偏差，而且在转印过程中，存在有PI液外溢到IC区的风险。
 技术问题
本发明的目的在于提供一种液晶显示面板的聚酰亚胺涂布方法，利用聚酰亚胺薄膜选择性地涂布在基板的涂布区，用以实现平坦层的沟槽，同时免除APR板转印的工序。
 技术解决方案
为达成本发明的前述目的，本发明一实施例提供一种液晶显示面板的聚酰亚胺涂布方法，所述聚酰亚胺涂布方法包括一备置步骤、一涂布步骤、一光阻涂布步骤、一曝光步骤、一清洗步骤及一光阻去除步骤；在所述备置步骤中，提供多个喷嘴及一基板，其中所述基板具有至少一涂布区及至少一芯片区，其中所述喷嘴紧密平齐的排列成一整排，并使所述喷嘴的排列长度与所述基板的宽度相等；在所述涂布步骤中，利用所述喷嘴将一聚酰亚胺液喷涂至所述基板上，使得所述聚酰亚胺液均布于所述基板上而形成一聚酰亚胺薄膜，其中所述喷嘴按照一设定流量将所述聚酰亚胺液喷涂至所述基板上，并同时移动所述基板；在所述光阻涂布步骤中，将一光刻胶涂布在所述基板上，使得所述光刻胶均布于所述聚酰亚胺薄膜上而形成一光阻层；在所述曝光步骤中，将一光罩放置于所述光阻层的上方，并且将一曝光光源设置在所述光罩上方，接着对所述光阻层进行曝光显影而形成至少一光阻层开口，其中所述光阻层开口曝露至少一局部聚酰亚胺薄膜，所述局部聚酰亚胺薄膜对应所述基板的所述芯片区；在所述清洗步骤中，利用一溶剂将所述局部聚酰亚胺薄膜去除，使所述基板的所述芯片区曝露；在所述光阻去除步骤中，将曝光显影之后剩余的所述光阻层去除，以曝露位于所述基板的所述涂布区上的所述聚酰亚胺薄膜。
在本发明的一实施例中，在所述涂布步骤中，通过一刮刀对均布于所述基板上所述聚酰亚胺薄膜进行修型，使所述基板上的所述聚酰亚胺薄膜的一表面均匀平整。
在本发明的一实施例中，在所述光阻涂布步骤中，所述光阻层是通过动态喷洒法、刷法、旋涂法或浸泡法而形成。
在本发明的一实施例中，在所述曝光步骤中，所述曝光光源为一离子束或一高压汞灯。
在本发明的一实施例中，在所述清洗步骤中，所述溶剂为N-甲基吡咯烷酮(NMP)、Y-丁内酯(GBL)、碳酸丁酯(BC)、或其混合溶剂。
在本发明的一实施例中，在所述备置步骤中，所述基板为一薄膜晶体管基板或一彩膜基板。
在本发明的一实施例中，在所述光阻去除步骤中，采用至少一种有机溶剂对所述光阻层进行湿法刻蚀，以去除曝光显影之后剩余的所述光阻层。
在本发明的一实施例中，所述有机溶剂包含异甲基醚丙二醇、乙酸丙二醇异甲基醚酯或乙醇胺。
为达成本发明的前述目的，本发明一实施例提供一种液晶显示面板的聚酰亚胺涂布方法，所述聚酰亚胺涂布方法包括一备置步骤、一涂布步骤、一光阻涂布步骤、一曝光步骤、一清洗步骤及一光阻去除步骤；在所述备置步骤中，提供多个喷嘴及一基板，其中所述基板具有至少一涂布区及至少一芯片区；在所述涂布步骤中，利用所述喷嘴将一聚酰亚胺液喷涂至所述基板上，使得所述聚酰亚胺液均布于所述基板上而形成一聚酰亚胺薄膜；在所述光阻涂布步骤中，将一光刻胶涂布在所述基板上，使得所述光刻胶均布于所述聚酰亚胺薄膜上而形成一光阻层；在所述曝光步骤中，将一光罩放置于所述光阻层的上方，并且将一曝光光源设置在所述光罩上方，接着对所述光阻层进行曝光显影而形成至少一光阻层开口，其中所述光阻层开口曝露至少一局部聚酰亚胺薄膜，所述局部聚酰亚胺薄膜对应所述基板的所述芯片区；在所述清洗步骤中，利用一溶剂将所述局部聚酰亚胺薄膜去除，使所述基板的所述芯片区曝露；在所述光阻去除步骤中，将曝光显影之后剩余的所述光阻层去除，以曝露位于所述基板的所述涂布区上的所述聚酰亚胺薄膜。
在本发明的一实施例中，在所述备置步骤中，所述喷嘴紧密平齐的排列成一整排，使所述喷嘴的排列长度与所述基板的宽度相等。
在本发明的一实施例中，在所述涂布步骤中，所述喷嘴按照一设定流量将所述聚酰亚胺液喷涂至所述基板上，并同时移动所述基板。
在本发明的一实施例中，在所述涂布步骤中，通过一刮刀对均布于所述基板上所述聚酰亚胺薄膜进行修型，使所述基板上的所述聚酰亚胺薄膜的一表面均匀平整。
在本发明的一实施例中，在所述光阻涂布步骤中，所述光阻层是通过动态喷洒法、刷法、旋涂法或浸泡法而形成。
在本发明的一实施例中，在所述曝光步骤中，所述曝光光源为一离子束或一高压汞灯。
在本发明的一实施例中，在所述清洗步骤中，所述溶剂为N-甲基吡咯烷酮(NMP)、Y-丁内酯(GBL)、碳酸丁酯(BC)、或其混合溶剂。
在本发明的一实施例中，在所述备置步骤中，所述基板为一薄膜晶体管基板或一彩膜基板。
在本发明的一实施例中，在所述光阻去除步骤中，采用至少一种有机溶剂对所述光阻层进行湿法刻蚀，以去除曝光显影之后剩余的所述光阻层。
在本发明的一实施例中，所述有机溶剂包含异甲基醚丙二醇、乙酸丙二醇异甲基醚酯或乙醇胺。
 有益效果
本发明的有益效果为：本发明液晶显示面板的聚酰亚胺涂布方法以曝光的方式将所述聚酰亚胺薄膜选择性地涂布在所述基板的涂布区，用以实现平坦层(PLN)的沟槽，同时免除APR板转印的工序，从而避免出现铟锡氧化物(ITO)残留，以及降低在APR版转印的制程中PI液外溢到IC区域等风险。
 附图说明
为了更清楚地说明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单介绍，显而易见地，下面描述中的附图仅仅是发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1是本发明液晶显示面板的聚酰亚胺涂布方法的一优选实施例的一流程图。
图2是本发明液晶显示面板的聚酰亚胺涂布方法的一优选实施例在备置步骤的一示意图。
图3是本发明液晶显示面板的聚酰亚胺涂布方法的一优选实施例在涂布步骤的一示意图。
图4是本发明液晶显示面板的聚酰亚胺涂布方法的一优选实施例在光阻涂布步骤的一示意图。
图5是本发明液晶显示面板的聚酰亚胺涂布方法的一优选实施例在曝光步骤的一示意图。
图6是本发明液晶显示面板的聚酰亚胺涂布方法的一优选实施例在清洗步骤的一示意图。
图7是本发明液晶显示面板的聚酰亚胺涂布方法的一优选实施例在光阻去除步骤的一示意图。
 本发明的实施方式
以上对本发明实施例提供的液晶显示组件进行了详细介绍，本文中应用了具体个例对本发明的原理及实施方式进行了阐述，以上实施例的说明只是用于帮助理解本发明。同时，对于本领域的技术人员，依据本发明的思想，在具体实施方式及应用范围上均会有改变之处，综上所述，本说明书内容不应理解为对本发明的限制。以下各实施例的说明是参考附加的图示，用以例示本发明可用以实施的特定实施例。本发明所提到的方向用语，例如[上]、[下]、[前]、[后]、[左]、[右]、[内]、[外]、[侧面]等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本发明，而非用以限制本发明。在图中，结构相似的单元是用以相同标号表示。
请参照图1所示，为本发明液晶显示面板的聚酰亚胺涂布方法的一优选实施例的一流程图。所述液晶显示面板的聚酰亚胺涂布方法包括一备置步骤S201、一涂布步骤S202、一光阻涂布步骤S203、一曝光步骤S204、一清洗步骤S205及一光阻去除步骤S206，本发明将于下文详细说明各实施例上述各组件的关系及其运作原理。
请参照图1及2所示，在所述备置步骤S201中，提供多个喷嘴(未绘示)以及一基板2，其中所述基板2具有至少一涂布区21及至少一芯片区22；在本实施例中，所述喷嘴紧密平齐的排列成一整排，使所述喷嘴的排列长度与所述基板2的宽度相等，另外，所述基板2为一薄膜晶体管基板或一彩膜基板。
请参照图1及3所示，在所述涂布步骤S202中，利用所述喷嘴将一聚酰亚胺液喷涂至所述基板2上，使得所述聚酰亚胺液均布于所述基板2上而形成一聚酰亚胺薄膜3。在本实施例中，所述喷嘴是按照一设定流量将所述聚酰亚胺液喷涂至所述基板2上，并同时移动所述基板2。另外，通过一刮刀(未绘示)对均布于所述基板2上所述聚酰亚胺薄膜3进行修型，使所述基板2上的所述聚酰亚胺薄膜3的一表面均匀平整。
请参照图1及4所示，在所述光阻涂布步骤S203中，将一光刻胶涂布在所述基板2上，使得所述光刻胶均布于所述聚酰亚胺薄膜3上而形成一光阻层4；在本实施例中，所述光阻层4是通过动态喷洒法、刷法、旋涂法或浸泡法而形成。
请参照图1及5所示，在所述曝光步骤S204中，将一光罩(未绘示)放置于所述光阻层4的上方，并且将一曝光光源设置在所述光罩上方，接着对所述光阻层4进行曝光显影而形成至少一光阻层开口41，其中所述光阻层开口41曝露至少一局部聚酰亚胺薄膜31，所述局部聚酰亚胺薄膜31对应所述基板2的所述芯片区22(见图2)。在本实施例中，所述曝光光源为一离子束或一高压汞灯。
请参照图1及6所示，在所述清洗步骤S205中，利用一溶剂将所述局部聚酰亚胺薄膜31(见图5)去除，进而使所述基板2的所述芯片区22曝露出来。
请参照图1及7所示，在所述光阻去除步骤S206中，将曝光显影之后剩余的所述光阻层4(见图6)去除，以曝露位于所述基板2的所述涂布区21(见图2)上的所述聚酰亚胺薄膜3。在本实施例中，所述溶剂为N-甲基吡咯烷酮(NMP)、Y-丁内酯(GBL)、碳酸丁酯(BC)、或其混合溶剂。另外，去除所述光阻层4是采用至少一种有机溶剂对所述光阻层3进行湿法刻蚀，以去除曝光显影之后剩余的所述光阻层4，其中所述有机溶剂包含异甲基醚丙二醇、乙酸丙二醇异甲基醚酯或乙醇胺。
如上所述，本发明液晶显示面板的聚酰亚胺涂布方法以曝光的方式将所述聚酰亚胺薄膜3选择性地涂布在所述基板2的涂布区21，用以实现平坦层(PLN)的沟槽，同时免除APR板转印的工序，从而避免出现铟锡氧化物(ITO)残留，以及降低在APR版转印的制程中PI液外溢到IC区域等风险。
本发明已由上述相关实施例加以描述，然而上述实施例仅为实施本发明的范例。必需指出的是，已公开的实施例并未限制本发明的范围。相反地，包含于权利要求书的精神及范围的修改及均等设置均包括于本发明的范围内。

Claims (18)

  1. 一种液晶显示面板的聚酰亚胺涂布方法，其包括步骤：
    一备置步骤，提供多个喷嘴及一基板，其中所述基板具有至少一涂布区及至少一芯片区，其中所述喷嘴紧密平齐的排列成一整排，使所述喷嘴的排列长度与所述基板的宽度相等；
    一涂布步骤，利用所述喷嘴将一聚酰亚胺液喷涂至所述基板上，使得所述聚酰亚胺液均布于所述基板上而形成一聚酰亚胺薄膜，其中所述喷嘴按照一设定流量将所述聚酰亚胺液喷涂至所述基板上，并同时移动所述基板；
    一光阻涂布步骤，将一光刻胶涂布在所述基板上，使得所述光刻胶均布于所述聚酰亚胺薄膜上而形成一光阻层；
    一曝光步骤，将一光罩放置于所述光阻层的上方，并且将一曝光光源设置在所述光罩上方，接着对所述光阻层进行曝光显影而形成至少一光阻层开口，其中所述光阻层开口曝露至少一局部聚酰亚胺薄膜，所述局部聚酰亚胺薄膜对应所述基板的所述芯片区；
    一清洗步骤，利用一溶剂将所述局部聚酰亚胺薄膜去除，使所述基板的所述芯片区曝露；及
    一光阻去除步骤，将曝光显影之后剩余的所述光阻层去除，以曝露位于所述基板的所述涂布区上的所述聚酰亚胺薄膜。
  2. 如权利要求1所述的液晶显示面板的聚酰亚胺涂布方法，其中在所述涂布步骤中，通过一刮刀对均布于所述基板上所述聚酰亚胺薄膜进行修型，使所述基板上的所述聚酰亚胺薄膜的一表面均匀平整。
  3. 如权利要求1所述的液晶显示面板的聚酰亚胺涂布方法，其中在所述光阻涂布步骤中，所述光阻层是通过动态喷洒法、刷法、旋涂法或浸泡法而形成。
  4. 如权利要求1所述的液晶显示面板的聚酰亚胺涂布方法，其中在所述曝光步骤中，所述曝光光源为一离子束或一高压汞灯。
  5. 如权利要求1所述的液晶显示面板的聚酰亚胺涂布方法，其中在所述清洗步骤中，所述溶剂为N-甲基吡咯烷酮、Y-丁内酯、碳酸丁酯、或其混合溶剂。
  6. 如权利要求1所述的液晶显示面板的聚酰亚胺涂布方法，其中在所述备置步骤中，所述基板为一薄膜晶体管基板或一彩膜基板。
  7. 如权利要求1所述的液晶显示面板的聚酰亚胺涂布方法，其中在所述光阻去除步骤中，采用至少一种有机溶剂对所述光阻层进行湿法刻蚀，以去除曝光显影之后剩余的所述光阻层。
  8. 如权利要求7所述的液晶显示面板的聚酰亚胺涂布方法，其中所述有机溶剂包含异甲基醚丙二醇、乙酸丙二醇异甲基醚酯或乙醇胺。
  9. 一种液晶显示面板的聚酰亚胺涂布方法，其包括步骤：
    一备置步骤，提供多个喷嘴及一基板，其中所述基板具有至少一涂布区及至少一芯片区；
    一涂布步骤，利用所述喷嘴将一聚酰亚胺液喷涂至所述基板上，使得所述聚酰亚胺液均布于所述基板上而形成一聚酰亚胺薄膜；
    一光阻涂布步骤，将一光刻胶涂布在所述基板上，使得所述光刻胶均布于所述聚酰亚胺薄膜上而形成一光阻层；
    一曝光步骤，将一光罩放置于所述光阻层的上方，并且将一曝光光源设置在所述光罩上方，接着对所述光阻层进行曝光显影而形成至少一光阻层开口，其中所述光阻层开口曝露至少一局部聚酰亚胺薄膜，所述局部聚酰亚胺薄膜对应所述基板的所述芯片区；
    一清洗步骤，利用一溶剂将所述局部聚酰亚胺薄膜去除，使所述基板的所述芯片区曝露；及
    一光阻去除步骤，将曝光显影之后剩余的所述光阻层去除，以曝露位于所述基板的所述涂布区上的所述聚酰亚胺薄膜。
  10. 如权利要求9所述的液晶显示面板的聚酰亚胺涂布方法，其中在所述备置步骤中，所述喷嘴紧密平齐的排列成一整排，使所述喷嘴的排列长度与所述基板的宽度相等。
  11. 如权利要求9所述的液晶显示面板的聚酰亚胺涂布方法，其中在所述涂布步骤中，所述喷嘴按照一设定流量将所述聚酰亚胺液喷涂至所述基板上，并同时移动所述基板。
  12. 如权利要求11所述的液晶显示面板的聚酰亚胺涂布方法，其中在所述涂布步骤中，通过一刮刀对均布于所述基板上所述聚酰亚胺薄膜进行修型，使所述基板上的所述聚酰亚胺薄膜的一表面均匀平整。
  13. 如权利要求9所述的液晶显示面板的聚酰亚胺涂布方法，其中在所述光阻涂布步骤中，所述光阻层是通过动态喷洒法、刷法、旋涂法或浸泡法而形成。
  14. 如权利要求9所述的液晶显示面板的聚酰亚胺涂布方法，其中在所述曝光步骤中，所述曝光光源为一离子束或一高压汞灯。
  15. 如权利要求9所述的液晶显示面板的聚酰亚胺涂布方法，其中在所述清洗步骤中，所述溶剂为N-甲基吡咯烷酮、Y-丁内酯、碳酸丁酯、或其混合溶剂。
  16. 如权利要求9所述的液晶显示面板的聚酰亚胺涂布方法，其中在所述备置步骤中，所述基板为一薄膜晶体管基板或一彩膜基板。
  17. 如权利要求9所述的液晶显示面板的聚酰亚胺涂布方法，其中在所述光阻去除步骤中，采用至少一种有机溶剂对所述光阻层进行湿法刻蚀，以去除曝光显影之后剩余的所述光阻层。
  18. 如权利要求17所述的液晶显示面板的聚酰亚胺涂布方法，其中所述有机溶剂包含异甲基醚丙二醇、乙酸丙二醇异甲基醚酯或乙醇胺。
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