WO2020042333A1 - 一种柔性液晶显示面板及其制造方法 - Google Patents

一种柔性液晶显示面板及其制造方法 Download PDF

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Publication number
WO2020042333A1
WO2020042333A1 PCT/CN2018/113267 CN2018113267W WO2020042333A1 WO 2020042333 A1 WO2020042333 A1 WO 2020042333A1 CN 2018113267 W CN2018113267 W CN 2018113267W WO 2020042333 A1 WO2020042333 A1 WO 2020042333A1
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layer
substrate
liquid crystal
manufacturing
metal
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English (en)
French (fr)
Inventor
项小群
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528—Polarisers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133305—Flexible substrates, e.g. plastics, organic film
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528—Polarisers
    • G02F1/133548—Wire-grid polarisers

Definitions

  • the present invention relates to the field of display technology, and in particular, to a flexible liquid crystal display panel and a manufacturing method thereof.
  • liquid crystal display Liquid Crystal Display, LCD
  • LCD Liquid Crystal Display
  • FIG. 1 is a schematic structural diagram of a conventional flexible liquid crystal display in a planar state.
  • Color film Filter (CF) substrate 110 a thin film transistor (TFT) substrate 120, and a liquid crystal molecular layer 130 and a sealant 140 sandwiched between the color film substrate 110 and the thin film transistor substrate 120.
  • the color filter substrate 110 and the thin film transistor substrate 120 are formed by columnar spacers (Photo Spacer (PS) 150 is supported to maintain the thickness of the liquid crystal molecular layer 130, namely the cell thickness (Cell Gap) and thickness uniformity, to ensure the stability of the screen display.
  • PSD Photo Spacer
  • the liquid crystal display panel in the bent state is subjected to uneven forces throughout the thin film transistor substrate 120, which results in the thin film transistor substrate 120. Different from the height of the columnar spacer 150 between the color filter substrate 110, the liquid crystal in the liquid crystal molecular layer 130 is squeezed and flows, resulting in uneven cell thicknesses across the liquid crystal panel, thereby stressing the polarizers of the components of the liquid crystal display. Bend.
  • An object of the present invention is to provide a flexible liquid crystal display panel and a manufacturing method thereof.
  • a nano-scale metal wire grid is formed by using a vapor-deposited metal wire grid to realize polarization and brightness enhancement functions, without the need for a polarizer, and reducing the number of bending Due to the abnormal polarization, the yield of the flexible liquid crystal display is effectively improved.
  • the present invention provides the following technical solutions:
  • a flexible liquid crystal display panel includes a first substrate, a second substrate, and a liquid crystal layer filled between the first substrate and the second substrate; the first substrate is disposed opposite the second substrate;
  • the first substrate and the second substrate each include a wire grid structure layer and a flexible substrate, a transparent conductive thin film layer, and an alignment film polyimide layer sequentially attached to one side of the wire grid structure layer;
  • the gate structure layer includes a flexible substrate and at least one wire grid layer stacked on one side of the flexible substrate.
  • the wire grid layer includes a plurality of metal grid bars arranged in parallel and disposed on the metal grid bars and the metal grid bars.
  • the transparent insulating flat layer between the metal grids, the projection of the metal grids on the flexible substrate is set at intervals, and the arrangement interval between the metal grids is 80-200 nm.
  • metal grid bars of the first substrate and the metal grid bars of the second substrate are perpendicular to each other.
  • the metal grid is made of one of aluminum, chromium, gold and nickel.
  • a method for manufacturing a flexible liquid crystal display panel includes the following steps S1 to S8:
  • a flexible substrate manufacturing step providing a flexible substrate, and preparing a flexible substrate on the flexible substrate;
  • a step of fabricating a metal grid, fabricating metal grids on the flexible substrate, and the metal grids are arranged in parallel with each other at an interval of 80 to 200 nm;
  • steps S2 to S3 at least once to form at least two wire grid layers.
  • the at least two wire grid layers are arranged, and the projections of the metal grid bars of the at least two wire grid layers on the flexible substrate are formed.
  • two of the substrates are taken as a first substrate and a second substrate, and the first substrate and the second substrate are aligned and aligned, so that the liquid crystal layer is encapsulated in Between the first substrate and the second substrate; wherein the metal grid of the first substrate and the metal grid of the second substrate are perpendicular to each other;
  • a flexible substrate peeling step which peels each of the flexible substrates from the surfaces of the first substrate and the second substrate to obtain a flexible liquid crystal display panel.
  • the method for manufacturing a metal grid on the flexible substrate includes the following steps:
  • An embossing step embossing the photoresist layer to form a plurality of embossed stripes and an embossed layer located between each two adjacent embossed stripes, the embossed stripes being spaced from each other;
  • the step of removing the embossed layer uses a dry ashing method to remove the embossed layer between each adjacent two embossed strips, and expose the metal film layer;
  • the metal film layer is etched by using a dry etching method to obtain parallel arranged metal grid bars.
  • the thickness of the metal gate bar is 50-300 nm, and the width is 20-300 nm.
  • the transparent insulating flat layer completely covers the metal grid.
  • the transparent insulating flat layer is a single-layer or multi-layer structure of silicon nitride (SiNx) or silicon oxide (SiOx).
  • the method of the imprinting step is nano-imprinting.
  • the flexible substrate is made of one of polyimide and polyethylene terephthalate.
  • the invention has the advantages that the polarizer is eliminated, the risk of abnormal polarization caused by repeated bending of the panel is reduced, the display quality of the flexible liquid crystal display can be effectively improved, and the yield of the flexible liquid crystal display can be effectively improved; meanwhile, the flexibility of the flexible liquid crystal display panel is greatly reduced.
  • the thickness reduces the difference between the propagation paths caused by the excessively long propagation paths under completely different curvature radii of the light; in addition, the production process is simple and easy to operate, it is easy to realize industrial production, and the process cost is saved.
  • FIG. 1 is a schematic structural diagram of a conventional liquid crystal panel in a planar state
  • FIG. 2 is a schematic structural diagram of a conventional liquid crystal panel in a bent state
  • FIG. 3 is a schematic structural diagram of a flexible liquid crystal display panel according to an embodiment of the present invention.
  • FIG. 4 is a flowchart of a method for manufacturing a flexible liquid crystal display panel according to the present invention.
  • FIG. 5 is a flow chart of fabricating a wire grid structure layer according to an embodiment of the present invention.
  • FIG. 6 is a schematic structural diagram of a single-layer wire grid structure layer before etching a metal film layer according to an embodiment of the present invention
  • FIG. 7 is a schematic structural diagram of a single-layer wire grid structure layer after etching a metal film layer according to an embodiment of the present invention.
  • FIG. 8 is a schematic structural diagram of a single-layer wire grid structure layer of an unpeeled flexible substrate according to an embodiment of the present invention.
  • Metal film layer 14. Photoresistive layer 121. Metal fences,
  • a transparent insulating flat layer 122.
  • a transparent insulating flat layer 122.
  • an embodiment of the present invention provides a flexible liquid crystal display panel including a first substrate 1, a second substrate 2, and a liquid crystal layer 3.
  • the liquid crystal layer 3 is located between the first substrate 1 and the second substrate 2.
  • the first substrate 1 and the second substrate 2 are opposite to each other.
  • the substrate includes a gate structure layer
  • the wire grid structure layer 10 includes at least one wire gate layer 12
  • the wire gate layer 12 includes a plurality of metal gate bars 121 and a transparent insulating flat layer 122.
  • the first substrate 1 and the second substrate 2 include a wire grid structure layer 10 and a flexible substrate 20, a transparent conductive film layer 30, and an alignment film polyimide layer 40 that are sequentially attached to one side of the wire grid structure layer 10;
  • the wire grid structure layer 10 includes a flexible substrate 11 and at least one wire grid layer 12 laminated on one side of the flexible substrate 11;
  • the wire grid layer 12 includes a plurality of metal grid bars 121 arranged in parallel and disposed on the metal grid bars.
  • the transparent insulating flat layer 122 on the 121 and between the metal grids 121, the projection interval of the metal grids 121 on the flexible substrate 11 is set, and the arrangement interval between the metal grids is 80-200 nm.
  • the metal grid 121 of the first substrate 1 and the metal grid 121 of the second substrate 2 are perpendicular to each other; the thickness of the metal grid 121 is 50-300 nm, and the width is 20-300 nm.
  • the cross section of the metal grid may be rectangular or various other conventional shapes.
  • the metal grid 121 of the first substrate 1 and the metal grid 121 of the second substrate 2 of the present invention can be used for high-contrast polarization applications, and can almost completely reflect light of an electric field vector component that vibrates in parallel with the wire grid structure layer 10, so that Almost all light rays perpendicular to the electric field vector component of the wire grid structure layer 10 are transmitted.
  • the arrangement direction of the wire grid structure layer 10 of the first substrate 1 and the second substrate 2 needs to be determined according to specific polarization requirements.
  • the metal grid 121 of the first substrate 1 and the second grid 2 The polarization directions of the metal grids 121 are preferably perpendicular to each other.
  • the metal grid 121 is made of one of aluminum, chromium, gold, and nickel.
  • the wire grid structure layer 10 provides a downward polarization function, and at the same time, polarized light having a polarization direction parallel to the metal line is reflected, and is re-calculated into the light guide layer for recycling, thereby improving backlight utilization efficiency. Therefore, compared to a conventional flexible liquid crystal panel with an upper polarizer and a lower polarizer, in this embodiment, the wire grid structure layer 10 can realize a polarizing function by only providing a separate metal grid 121.
  • the flexible liquid crystal panel as a whole The realization of a thinner structure.
  • the material of the flexible substrate 20 includes one or more of polyethylene, polypropylene, polystyrene, polylactic acid, polyethylene terephthalate, and polyimide.
  • the flexible substrate 20 has a light guiding function in addition to the functions of the flexible substrate 4 described above, and can be considered as a light guiding plate.
  • the flexible substrate 20 of the present invention has good light guiding properties and extremely excellent light guiding properties. It has high reflectivity and does not absorb light. It has the properties of a traditional light guide plate and can replace the traditional light guide plate of a liquid crystal display panel.
  • the flexible substrate may be a conventional flexible material, but is not specifically limited.
  • the flexible liquid crystal display panel provided by the embodiment of the present invention adopts a flexible substrate 20 having a good light guiding function, and adds a metal wire grid to achieve polarized light and brightening functions, which greatly reduces the thickness of the flexible liquid crystal display panel and reduces light completely.
  • the difference between the propagation paths caused by the excessively long propagation paths under different curvature radii effectively improves the brightness and color deviation problem caused by the display panel during the bending process.
  • a new method for manufacturing a flexible liquid crystal display panel includes the following steps S1 to S8.
  • a flexible substrate manufacturing step providing a flexible substrate, and preparing a flexible substrate on the flexible substrate;
  • a step of fabricating a metal grid, fabricating metal grids on the flexible substrate, and the metal grids are arranged in parallel with each other at an interval of 80 to 200 nm;
  • steps S2 to S3 at least once to form at least two wire grid layers.
  • the at least two wire grid layers are arranged, and the projections of the metal grid bars of the at least two wire grid layers on the flexible substrate are formed.
  • two of the substrates are taken as a first substrate and a second substrate, and the first substrate and the second substrate are aligned and aligned, so that the liquid crystal layer is encapsulated in Between the first substrate and the second substrate; wherein the metal grid of the first substrate and the metal grid of the second substrate are perpendicular to each other;
  • a flexible substrate peeling step which peels each of the flexible substrates from the surfaces of the first substrate and the second substrate to obtain a flexible liquid crystal display panel.
  • a single-layer wire grid structure layer 10 is prepared on the flexible substrate 4.
  • the metal film layer 13 is patterned to form the wire grid structure layer 10; the nano grid imprint technology, X-ray lithography technology or photolithography process is used to prepare the wire grid structure layer 10.
  • the selection and design of a mold for nano-imprinting are performed, and the wire grid structure layer 10 is prepared by using a nano-imprint technology.
  • the wire grid structure layer 10 includes metal wires arranged in parallel, and an arrangement interval between the metal wires may be 80-200 nm.
  • the thickness of the metal gate bar is 50-300 nm, and the width is 20-300 nm.
  • a transparent insulating flat layer 122 is prepared on the wire grid structure layer 10 by coating, plasma enhanced chemical vapor deposition, or magnetron sputtering.
  • the layer 122 may be a single layer or a multi-layer structure of silicon nitride (SiNx) or silicon oxide (SiOx); the transparent insulating layer 122 may be used as a flattening protection layer, so as to ensure high light transmittance, and the material is not limited.
  • a transparent conductive thin film layer 30 is further prepared on the transparent insulating flat layer 122.
  • the transparent conductive thin film layer 30 is prepared by a conventional process, which is not specifically limited in the present invention.
  • the multilayer wire grid structure layer simply repeats multiple single-layer wire grid structure layers. Steps S2 to S3 need to be repeated at least once to form at least two wire grid layers. It is not necessary to repeat steps S2 to only include a single wire grid structure layer. S3.
  • the step of preparing an alignment film polyimide layer 40 on the transparent conductive film layer 30 in step S5 includes: separately evaporating the aromatic tetracarboxylic dianhydride and the diamine monomer to form a monomer vapor and mixing them. And depositing the mixed vapor on the transparent conductive film layer 30; and then performing the imidization treatment on the dianhydride and diamine monomer deposited on the transparent conductive film layer 30 to obtain an alignment film polyimide layer 40.
  • the evaporation temperature of the aromatic tetracarboxylic dianhydride monomer is 150 ° C to 180 ° C
  • the evaporation temperature of the diamine monomer is It is 60 ° C to 160 ° C.
  • the imidization treatment can be performed in an infrared radiation oven. The treatment process is heated from room temperature to 320-385 ° C under the protection of nitrogen at a rate of 0.5 to 3 ° C / min, and maintained for 1 to 3 hours; then naturally cooled to At room temperature, an alignment film polyimide layer 40 was obtained.
  • a method for manufacturing a metal grid on the flexible substrate includes the following steps S201 to S205.
  • An embossing step embossing the photoresist layer to form a plurality of embossed stripes and an embossed layer located between each two adjacent embossed stripes, the embossed stripes being spaced from each other;
  • the step of removing the embossed layer uses a dry ashing method to remove the embossed layer between each adjacent two embossed strips, and expose the metal film layer;
  • the metal film layer is etched by using a dry etching method to obtain parallel arranged metal grid bars.
  • step S203 the method of the imprinting step is nano-imprinting.
  • the dry etching (Dry Etch), referred to as dry etching, uses plasma as an etching gas, and the plasma reacts with the exposed film layer to etch it away.
  • Plasma etching has the characteristics of anisotropy, and it is easy to control the cross-sectional morphology formed after etching; however, the bombardment of the film by high-energy plasma will cause damage.
  • the flexible substrate is made of one of polyimide and polyethylene terephthalate.
  • FIG. 6 it is a schematic diagram of the structure of the single-layer wire grid structure layer 10 before the metal film layer 13 is etched according to an embodiment of the present invention. 13. Photoresist layer 14.
  • FIG. 7 it is a schematic structural diagram of the single-layer wire grid structure layer 10 after the metal film layer 13 is etched according to an embodiment of the present invention.
  • the stacked structure is, from bottom to top: flexible substrate 4, flexible substrate 11, and metal grid strip 121.
  • FIG. 8 it is a schematic structural diagram of a single-layer wire grid structure layer 10 of an unpeeled flexible substrate 4 according to an embodiment of the present invention.
  • the stacked structure from the bottom to the top is: a flexible substrate 4, a flexible substrate 11, and a metal grid 121.
  • each wire grid structure simply repeats multiple single-layer wire grid structure layers and repeats steps S2 to S3 at least once to form at least two wire grid layers, the at least two wire grid stack layers Provided, each wire grid structure includes a plurality of metal grid bars and a transparent insulating flat layer provided on the metal grid bars and between the metal grid bars, and the metal grid bars of the at least two wire grid structures are arranged at The projection on the flexible substrate is set at intervals.
  • the manufacturing method of the flexible liquid crystal display panel of the invention has the advantages that the manufacturing process is simple and easy to operate, it is easy to realize industrialized production, and the process cost is saved.
  • the present invention uses a metal wire grid instead of a traditional polarizer, and uses a mutually perpendicular metal line on the first substrate to implement the polarizing function, eliminating the original upper polarizer and lower polarizer and reducing the panel.
  • the risk of abnormal polarization caused by repeated bending can effectively improve the display quality of flexible liquid crystal displays and effectively improve the yield of flexible liquid crystal displays; greatly reduce the thickness of flexible liquid crystal display panels and reduce the excessively long propagation paths of light with completely different curvature radii The difference between the propagation paths caused; the manufacturing process of the liquid crystal display panel is simplified, the manufacturing process is simple and easy to operate, it is easy to realize industrial production, and the process cost is saved.

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  • Nonlinear Science (AREA)
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Abstract

本发明涉及一种柔性液晶显示面板及其制造方法。柔性液晶显示面板包括第一基板，第二基板和液晶层；第一基板与第二基板相对设置且包括线栅结构层，线栅结构层包括至少一线栅层，线栅层包括多个金属栅条和透明绝缘平坦层。柔性液晶显示面板制造方法包括步骤：柔性衬底制作，金属栅条制作步骤，线栅层制作，透明导电薄膜层制作，配向膜聚酰亚胺层制作，成盒和柔性基板剥离。本发明通过使用金属线栅代替传统的偏光片，可减少由于多次弯折造成偏光异常，有效提高柔性液晶显示器良率。

Description

一种柔性液晶显示面板及其制造方法 技术领域
本发明涉及显示技术领域，尤其涉及一种柔性液晶显示面板及其制造方法。
 背景技术
伴随着液晶显示技术飞跃发展，液晶显示器（Liquid Crystal Display，LCD）也将从直板式向柔性方向发展。
如图1所示为一现有柔性液晶显示器在平面状态下的结构示意图。其由彩膜(Color Filter，CF) 基板110、薄膜晶体管（Thin Film Transistor，TFT）基板120、及夹于彩膜基板110与薄膜晶体管基板120之间的液晶分子层130与密封框胶（Sealant）140所组成。由于液晶分子层130内的液晶材料为液体，具有流动性，彩膜基板110与薄膜晶体管基板120由分布于两基板之间的柱状间隔物（Photo Spacer，PS）150支撑，以维持液晶分子层130的厚度即盒厚（Cell Gap）及厚度均匀性，保证画面显示的稳定性。如图2所示，由于液晶面板所使用的液晶材料为液体，具有流动性，当液晶显示面板进行弯曲时，由于弯曲状态下的液晶显示面板各处受力不均，从而导致薄膜晶体管基板120与彩膜基板110之间柱状间隔物150的高度不同，使液晶分子层130内的液晶受到挤压而流动，导致液晶面板各处盒厚不均，从而使液晶显示器的组成部件偏光片受力弯折。
目前柔性液晶显示器使用过程中需要满足高达数百万弯折，多次弯折必然对目前使用的偏光片黏附品质及偏光片本身偏光性质产生改变，影响LCD正常显示。因此，亟需提出一种新的技术方案，以解决上述问题。
 技术问题
本发明的目的在于提供一种柔性液晶显示面板及其制造方法，通过使用蒸镀金属线栅的方式形成纳米级金属线栅以实现偏光与增亮功能，无需偏光片，可减少由于多次弯折造成偏光异常，有效提高柔性液晶显示器良率。
 技术解决方案
为了实现上述目的，本发明提供以下技术方案：
一种柔性液晶显示面板，包括第一基板，第二基板和填充于所述第一基板和所述第二基板之间的液晶层；所述第一基板与所述第二基板相对设置；所述第一基板与所述第二基板均包括线栅结构层和依次贴附在所述线栅结构层一侧的柔性衬底，透明导电薄膜层和配向膜聚酰亚胺层；所述线栅结构层包括一柔性基底和叠层设置于所述柔性基底一侧的至少一线栅层；所述线栅层包括多个平行排布的金属栅条和设置于所述金属栅条上及所述金属栅条之间的透明绝缘平坦层，所述金属栅条在所述柔性基底上的投影为间隔设置，所述金属栅条之间的排布间隔为80～200nm。
进一步的，所述第一基板的金属栅条与所述第二基板的金属栅条相互垂直。
进一步的，所述金属栅条由铝、铬、金和镍中的一种制成。
一种柔性液晶显示面板的制造方法，包括如下步骤S1～S8：
S1、柔性基底制作步骤，提供一柔性基板，在所述柔性基板上制备一柔性基底；
S2、金属栅条制作步骤，在所述柔性基底上制作金属栅条，所述金属栅条相互平行排布且排布间隔为80～200nm；
S3、线栅层制作步骤，在所述金属栅条上覆盖一层透明绝缘平坦层，所述金属栅条和所述透明绝缘平坦层构成线栅层；
S4、重复步骤S2～S3至少一次，从而形成至少两个线栅层，所述至少两个线栅层叠层设置，所述至少两个线栅层的金属栅条在所述柔性基底上的投影为间隔设置；
S5、透明导电薄膜层制作步骤，在所述线栅层上制作透明导电薄膜层；
S6、配向膜聚酰亚胺层制作步骤，在所述透明导电薄膜层上制作配向膜聚酰亚胺层，获得基板；
S7、成盒步骤，取两个所述基板作为一第一基板和一第二基板，将所述第一基板与所述第二基板对位组立进行贴合，使所述液晶层封装于第一基板与第二基板之间；其中，所述第一基板的金属栅条与所述第二基板的金属栅条相互垂直；
S8、柔性基板剥离步骤，将每一所述柔性基板从所述第一基板和所述第二基板的表面剥离，获得柔性液晶显示面板。
进一步的，在所述柔性基底上制作金属栅条的方法包括如下步骤：
S201、金属膜层制作步骤，在所述柔性基底上通过蒸镀金属形成金属膜层；
S202、光阻层制作步骤，在所述金属膜层上涂布光阻，形成光阻层；
S203、压印步骤，对所述光阻层进行压印处理以形成多个压印条和位于每相邻两个压印条之间的压印层，所述压印条彼此间隔；
S204、压印层清除步骤，利用干法灰化的方法将每相邻两个压印条之间的压印层去除，将金属膜层裸露出来；
S205、线栅层制作步骤，利用干法刻蚀的方法刻蚀所述金属膜层得到平行排布的金属栅条。
进一步的，所述金属栅条的厚度为50～300nm，宽度为20～300nm。
进一步的，所述透明绝缘平坦层完全覆盖所述金属栅条。
进一步的，所述透明绝缘平坦层为氮化硅(SiNx)或氧化硅(SiOx)的单层或多层结构。
进一步的，所述压印步骤的方法为纳米压印。
进一步的，所述柔性基底由聚酰亚胺和聚对苯二甲酸乙二酯中的一种制成。
 有益效果
本发明的优点在于，免去偏光片，降低了面板多次弯折造成偏光异常风险，能够有效提升柔性液晶显示器显示品质，并有效提高柔性液晶显示器良率；同时大大缩小了柔性液晶显示面板的厚度，减少光线完全不同曲率半径下的过长的传播路径所引起的传播路径间的差异；另外制作工艺简单易操作，易实现产业化生产，节省了工艺成本。
 附图说明
为了更清楚地说明本发明实施例中的技术方案，下面将对实施例描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施例，对于本领域技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为现有液晶面板在平面状态下的结构示意图；
图2为现有液晶面板在弯曲状态下的结构示意图；
图3为本发明的实施例的柔性液晶显示面板的结构示意图；
图4为本发明的柔性液晶显示面板的制造方法的流程图；
图5是本发明一实施例的线栅结构层的制作流程图；
图6为本发明的实施例的单层线栅结构层刻蚀金属膜层前的结构示意图；
图7为本发明的实施例的单层线栅结构层刻蚀金属膜层后的结构示意图；
图8为本发明的实施例的未剥离柔性基板的单层线栅结构层的结构示意图。
其中：
110、彩膜基板，       120、薄膜晶体管基板， 130、液晶分子层，
140、密封框胶，       150、柱状间隔物，     1、第一基板，
2、第二基板，         3、液晶层，           4、柔性基板；
10、线栅结构层，      20、柔性衬底，        30、透明导电薄膜层，
40、配向膜聚酰亚胺层，11、柔性基底，        12、线栅层，
13、金属膜层，        14、光阻层，          121、金属栅条，
122、透明绝缘平坦层。
 本发明的实施方式
以下，结合具体实施方式对本发明的技术进行详细描述。
如图3所示，本发明实施例提供了一种柔性液晶显示面板，包括第一基板1、第二基板2和液晶层3，液晶层3位于第一基板1和第二基板2之间，其中第一基板1与第二基板2相对设置，基板包括栅结构层，线栅结构层10包括至少一线栅层12，线栅层12包括多个金属栅条121和透明绝缘平坦层122。
第一基板1与第二基板2包括线栅结构层10和依次贴附在所述线栅结构层10一侧的柔性衬底20、透明导电薄膜层30、配向膜聚酰亚胺层40；线栅结构层10包括一柔性基底11、叠层设置于柔性基底11一侧的至少一线栅层12；线栅层12包括多个平行排布的金属栅条121和设置于所述金属栅条121上及所述金属栅条121之间的透明绝缘平坦层122，所述金属栅条121在所述柔性基底11上的投影间隔设置，金属栅条之间的排布间隔为80～200nm。
本实施例中，第一基板1的金属栅条121与第二基板2的金属栅条121相互垂直；金属栅条121的厚度为50～300nm，宽度为20～300nm。金属栅条的横截面可以为矩形或其他各种常规形状。本发明第一基板1的金属栅条121与第二基板2的金属栅条121可用于高对比度偏振的应用，能够几乎全部反射与线栅结构层10平行振动的电场矢量分量的光，而使垂直于线栅结构层10的电场矢量分量的光线几乎全部透过。
本实施例中，第一基板1与第二基板2的线栅结构层10的排列方向需要依据具体的偏振需求决定，所述第一基板1的金属栅条121与所述第二基板2的金属栅条121的偏振方向优选互相垂直。
本实施例中，金属栅条121由铝、铬、金和镍中的一种制成。线栅结构层10提供下偏功能，同时偏振方向平行于所述金属线的偏振光被反射，并重新计入导光层中进行循环利用，提升背光利用效率。因此，相比于具有上偏振光片、下偏振光片的传统柔性液晶面板，本实施例中线栅结构层10仅设置单独的金属栅条121就能实现偏光功能，所述柔性液晶面板整体上的实现了更轻薄的结构。
本实施例中，柔性衬底20的材质包括聚乙烯、聚丙烯、聚苯乙烯、聚乳酸、聚对苯二甲酸乙二醇酯和聚酰亚胺中的一种或多种。通过采用柔性衬底20可以有效改善显示面板的柔韧性，相比于传统的硬质基板(如玻璃基板) ，可以防止碎屏风险问题。同时，本发明实施例中柔性衬底20除了上述的柔性基板4功能外，还具有导光功能，及可以认为是一个导光板，本发明的柔性衬底20具有良好的导光性并具有极高反射率且不吸光，具备传统导光板的性质，可以替代传统液晶显示面板的导光板。本实施例中，柔性衬底可为常规柔性材料，但不做具体限制。
本发明实施例提供的柔性液晶显示面板，通过采用具有良好导光功能的柔性衬底20，并增加金属线栅以实现偏光与增亮功能，大大缩小了柔性液晶显示面板的厚度，减少光线完全不同曲率半径下的过长的传播路径所引起的传播路径间的差异，有效改善了显示面板在弯曲过程中导致的亮色度偏差问题。
如图4所示，在本发明的一优选实施例中，提供一种新的柔性液晶显示面板的制备方法，包括如下步骤S1～S8。
S1、柔性基底制作步骤，提供一柔性基板，在所述柔性基板上制备一柔性基底；
S2、金属栅条制作步骤，在所述柔性基底上制作金属栅条，所述金属栅条相互平行排布且排布间隔为80～200nm；
S3、线栅层制作步骤，在所述金属栅条上覆盖一层透明绝缘平坦层，所述金属栅条和所述透明绝缘平坦层构成线栅层；
S4、重复步骤S2～S3至少一次，从而形成至少两个线栅层，所述至少两个线栅层叠层设置，所述至少两个线栅层的金属栅条在所述柔性基底上的投影为间隔设置；
S5、透明导电薄膜层制作步骤，在所述线栅层上制作透明导电薄膜层；
S6、配向膜聚酰亚胺层制作步骤，在所述透明导电薄膜层上制作配向膜聚酰亚胺层，获得基板；
S7、成盒步骤，取两个所述基板作为一第一基板和一第二基板，将所述第一基板与所述第二基板对位组立进行贴合，使所述液晶层封装于第一基板与第二基板之间；其中，所述第一基板的金属栅条与所述第二基板的金属栅条相互垂直；
S8、柔性基板剥离步骤，将每一所述柔性基板从所述第一基板和所述第二基板的表面剥离，获得柔性液晶显示面板。
本发明实施例中，步骤S1~S3中，在柔性基板4上制备单层线栅结构层10，通过在柔性基板4上先形成一柔性基底11，柔性基底11上再形成金属膜层13，并图案化金属膜层13形成线栅结构层10；采用纳米压印技术、X射线光刻技术或光刻工艺制备线栅结构层10。如根据实际的线栅结构层10的结构进行纳米压印所用模具的选用和设计，采用纳米压印技术制备线栅结构层10。所述线栅结构层10包括平行排布的金属线，所述金属线之间的排布间隔可以为80～200nm。
本发明实施例中，步骤S2中，金属栅条的厚度为50～300nm，宽度为20～300nm。
本发明实施例中，步骤S3中，采用涂布、等离子增强化学气相沉积法或磁控溅射法制备在先在所述线栅结构层10上制备透明绝缘平坦层122，所述透明绝缘平坦层122可以为氮化硅(SiNx)或氧化硅(SiOx)的单层或多层结构；透明绝缘层122可做平坦化保护层，保证光的透过率高即可，材料不作限制。在透明绝缘平坦层122上进一步制备透明导电薄膜层30，所述透明导电薄膜层30为的常规工艺制备，本发明不做特殊限定。
多层线栅结构层为简单重复多个单层线栅结构层，还需重复步骤S2～S3至少一次，从而形成至少两个线栅层；仅含单层线栅结构层无需重复步骤S2～S3。
本发明实施例中，步骤S5中在透明导电薄膜层30上制作配向膜聚酰亚胺层40的步骤包括：分别将芳香族四羧酸二酐和二胺单体蒸发形成单体蒸汽后混合，并将混合蒸汽沉积于所述透明导电薄膜层30上；然后将所述透明导电薄膜层30上沉积的二酐与二胺单体进行亚胺化处理，即得到配向膜聚酰亚胺层40。其中，所述芳香族四羧酸二酐和二胺单体蒸发过程中，所述芳香族四羧酸二酐单体的蒸发温度为150℃～180℃，所述二胺单体的蒸发温度为60℃～160℃。所述亚胺化处理可以在红外辐射烘箱内进行，处理过程采用在氮气的保护下以0.5～3℃/min的速率从室温加热至320～385℃后，保持1～3h；然后自然冷却至室温，得到配向膜聚酰亚胺层40。
如图5所示，在本发明的一优选实施例中，提供一种在所述柔性基底上制作金属栅条的方法，包括如下步骤S201～S205。
S201、金属膜层制作步骤，在所述柔性基底上通过蒸镀金属形成金属膜层；
S202、光阻层制作步骤，在所述金属膜层上涂布光阻，形成光阻层；
S203、压印步骤，对所述光阻层进行压印处理以形成多个压印条和位于每相邻两个压印条之间的压印层，所述压印条彼此间隔；
S204、压印层清除步骤，利用干法灰化的方法将每相邻两个压印条之间的压印层去除，将金属膜层裸露出来；
S205、线栅层制作步骤，利用干法刻蚀的方法刻蚀金属膜层得到平行排布的金属栅条。
本发明实施例中，步骤S203中，所述压印步骤的方法为纳米压印。
本发明实施例中，步骤S205中，所述干法刻蚀（Dry Etch），简称干刻，是利用等离子体作为刻蚀气体，等离子体与暴露在外的膜层进行反应而将其刻蚀掉。等离子体刻蚀有各向异性的特点，容易控制刻蚀后形成的截面形态；但高能等离子体对膜的轰击会造成伤害。
本发明实施例中，柔性基底由聚酰亚胺和聚对苯二甲酸乙二酯中的一种制成。
如图6所示，为本发明的实施例的单层线栅结构层10刻蚀金属膜层13前的结构示意图，层叠结构从下至上依次为：柔性基板4、柔性基底11、金属膜层13、光阻层14。
如图7所示，为本发明的实施例的单层线栅结构层10刻蚀金属膜层13后的结构示意图，层叠结构从下至上依次为：柔性基板4、柔性基底11、金属栅条121、光阻层14。
如图8所示，为本发明的实施例的未剥离柔性基板4的单层线栅结构层10的结构示意图，层叠结构从下至上依次为：柔性基板4、柔性基底11、金属栅条121、透明绝缘平坦层122。
值得注意的是，多层线栅结构层仅为简单重复多个单层线栅结构层，重复步骤S2～S3至少一次，从而形成至少两个线栅层，所述至少两个线栅层叠层设置，每个线栅结构包括多个金属栅条和设置于所述金属栅条上和所述金属栅条之间的透明绝缘平坦层，所述至少两个线栅结构的金属栅条在所述柔性基底上的投影为间隔设置。
本发明的柔性液晶显示面板的制造方法优点在于，制作工艺简单易操作，易实现产业化生产，节省了工艺成本。
综上所述，本发明通过使用金属线栅代替传统的偏光片，并在第一基板上利用相互垂直的金属线实现偏光功能，省去了原本的上偏光片与下偏光片，降低了面板多次弯折造成偏光异常风险，能够有效提升柔性液晶显示器显示品质，并有效提高柔性液晶显示器良率；大大缩小了柔性液晶显示面板的厚度，减少光线完全不同曲率半径下的过长的传播路径所引起的传播路径间的差异；简化了液晶显示面板的制程，制作工艺简单易操作，易实现产业化生产，节省了工艺成本。
以上所述仅是本发明的优选实施方式，应当指出，对于本技术领域的普通技术人员，在不脱离本发明原理的前提下，还可以做出若干改进和润饰，这些改进和润饰也应视为本发明的保护范围。

Claims (10)

  1. 一种柔性液晶显示面板，其中，包括第一基板，第二基板和填充于所述第一基板和所述第二基板之间的液晶层；
    所述第一基板与所述第二基板相对设置；
    所述第一基板与所述第二基板均包括线栅结构层和依次贴附在所述线栅结构层一侧的柔性衬底，透明导电薄膜层和配向膜聚酰亚胺层；
    所述线栅结构层包括一柔性基底和叠层设置于所述柔性基底一侧的至少一线栅层；
    所述线栅层包括多个平行排布的金属栅条和设置于所述金属栅条上及所述金属栅条之间的透明绝缘平坦层，所述金属栅条在所述柔性基底上的投影为间隔设置，所述金属栅条之间的排布间隔为80～200nm。
  2. 如权利要求1所述的柔性液晶显示面板，其中，所述第一基板的金属栅条与所述第二基板的金属栅条相互垂直。
  3. 根据权利要求1所述的柔性液晶显示面板，其中，所述金属栅条由铝、铬、金和镍中的一种制成。
  4. 一种柔性液晶显示面板的制造方法，其中，包括以下步骤：
    S1、柔性基底制作步骤，提供一柔性基板，在所述柔性基板上制备一柔性基底；
    S2、金属栅条制作步骤，在所述柔性基底上制作金属栅条，所述金属栅条相互平行排布且排布间隔为80～200nm；
    S3、线栅层制作步骤，在所述金属栅条上覆盖一层透明绝缘平坦层，所述金属栅条和所述透明绝缘平坦层构成线栅层；
    S4、重复步骤S2～S3至少一次，从而形成至少两个线栅层，所述至少两个线栅层叠层设置，所述至少两个线栅层的金属栅条在所述柔性基底上的投影为间隔设置；
    S5、透明导电薄膜层制作步骤，在所述线栅层上制作透明导电薄膜层；
    S6、配向膜聚酰亚胺层制作步骤，在所述透明导电薄膜层上制作配向膜聚酰亚胺层，获得基板；
    S7、成盒步骤，取两个所述基板作为一第一基板和一第二基板，将所述第一基板与所述第二基板相对设置进行贴合，使所述液晶层封装于第一基板与第二基板之间；其中，所述第一基板的金属栅条与所述第二基板的金属栅条相互垂直；
    S8、柔性基板剥离步骤，将每一所述柔性基板从所述第一基板和所述第二基板的表面剥离，获得柔性液晶显示面板。
  5. 根据权利要求4所述的一种柔性液晶显示面板的制造方法，其中，在所述柔性基底上制作金属栅条的步骤包括：
    S201、金属膜层制作步骤，在所述柔性基底上通过蒸镀金属形成金属膜层；
    S202、光阻层制作步骤，在所述金属膜层上涂布光阻，形成光阻层；
    S203、压印步骤，对所述光阻层进行压印处理以形成多个压印条和位于每相邻两个压印条之间的压印层，所述压印条彼此间隔；
    S204、压印层清除步骤，利用干法灰化的方法将每相邻两个压印条之间的压印层去除，将金属膜层裸露出来；
    S205、线栅层制作步骤，利用干法刻蚀的方法刻蚀所述金属膜层得到平行排布的金属栅条。
  6. 根据权利要求4所述的一种柔性液晶显示面板的制造方法，其中，所述金属栅条的厚度为50～300nm，宽度为20～300nm。
  7. 根据权利要求5的柔性液晶显示面板的制造方法，其中，所述透明绝缘平坦层完全覆盖所述金属栅条。
  8. 根据权利要求5的柔性液晶显示面板的制造方法，其中，所述透明绝缘平坦层为氮化硅(SiNx)或氧化硅(SiOx)的单层或多层结构。
  9. 根据权利要求5所述的柔性液晶显示面板的制造方法，其中，所述压印步骤的方法为纳米压印。
  10. 根据权利要求5所述的柔性液晶显示面板的制造方法，其中，所述柔性基底由聚酰亚胺和聚对苯二甲酸乙二酯中的一种制成。
PCT/CN2018/113267 2018-08-31 2018-11-01 一种柔性液晶显示面板及其制造方法 Ceased WO2020042333A1 (zh)

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