WO2020012978A1 - Adhesive composition, laminate, and adhesive sheet - Google Patents

Adhesive composition, laminate, and adhesive sheet Download PDF

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Publication number
WO2020012978A1
WO2020012978A1 PCT/JP2019/025722 JP2019025722W WO2020012978A1 WO 2020012978 A1 WO2020012978 A1 WO 2020012978A1 JP 2019025722 W JP2019025722 W JP 2019025722W WO 2020012978 A1 WO2020012978 A1 WO 2020012978A1
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WO
WIPO (PCT)
Prior art keywords
adhesive composition
resin
adhesive
laminate
substrate
Prior art date
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PCT/JP2019/025722
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French (fr)
Japanese (ja)
Inventor
来 佐藤
武史 中村
正嗣 水野
誌朗 正木
Original Assignee
日立化成株式会社
日立化成テクノサービス株式会社
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Application filed by 日立化成株式会社, 日立化成テクノサービス株式会社 filed Critical 日立化成株式会社
Priority to JP2020530103A priority Critical patent/JPWO2020012978A1/en
Publication of WO2020012978A1 publication Critical patent/WO2020012978A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/34Layered products comprising a layer of synthetic resin comprising polyamides
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/38Layered products comprising a layer of synthetic resin comprising epoxy resins
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J179/00Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09J161/00 - C09J177/00
    • C09J179/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/35Heat-activated

Definitions

  • the present disclosure relates to an adhesive composition, a laminate, and an adhesive sheet. More specifically, the present disclosure relates to an adhesive composition used for bonding a resin substrate and a resin substrate or a metal substrate, and particularly has a low dielectric property such as a liquid crystal polymer (hereinafter abbreviated as “LCP”).
  • LCP liquid crystal polymer
  • the present invention relates to an adhesive composition used for bonding to a substrate.
  • FPC flexible printed wiring boards
  • PI polyimide
  • PPS polyphenylene sulfide
  • the base film having low dielectric properties has low polarity
  • the adhesive strength is weak
  • the FPC member such as a cover lay film and a laminated board is used. Fabrication was difficult.
  • epoxy adhesives and acrylic adhesives have a problem that they are not excellent in low dielectric properties and impair the dielectric properties of FPC.
  • Patent Document 1 proposes a modified polyamide adhesive composition into which an olefin skeleton has been introduced in order to enhance the electrical characteristics of FPC.
  • Patent Literature 2 proposes an adhesive using an aromatic olefin oligomer-type modifier and an epoxy resin, and a coverlay for a flexible printed wiring board.
  • Patent Literatures 1 and 2 have a problem that, although they can obtain adhesiveness with a polyimide film, they cannot easily obtain adhesiveness with a base film having low dielectric properties such as LCP. is there. Further, the adhesive compositions described in Patent Documents 1 and 2 have a problem that the dielectric properties are inferior.
  • the present disclosure has been made in view of the problems of the above prior art, and has an adhesive composition having good adhesion to a substrate such as LCP and also having excellent low dielectric properties.
  • An object is to provide a laminate and an adhesive sheet.
  • the present inventors have conducted intensive studies to solve the above-described problems, and contain a specific bismaleimide resin having a structure derived from dimer acid, and an epoxy resin having a further specific structure, and a curing accelerator.
  • the present inventors have found that an adhesive composition containing the compound exhibits excellent low dielectric properties and has high adhesiveness to a resin substrate having low dielectric properties such as LCP, and has completed the present invention.
  • Adhesion containing (A) a bismaleimide resin represented by the following general formula (1), (B) an epoxy resin represented by the following general formula (2), and (C) a curing accelerator.
  • Composition [In the formula (1), R 1 represents a divalent hydrocarbon group derived from dimer acid, Q represents a substituted or unsubstituted aliphatic group having 1 to 100 carbon atoms, a substituted or unsubstituted aromatic group, Alternatively, it represents a substituted or unsubstituted heteroaromatic group, and n represents an integer of 0 to 100.
  • R 2 represents a hydrogen atom or a methyl group
  • n represents an integer of 0 to 30.
  • the content of the component (B) is 10 to 40 parts by mass based on 100 parts by mass of the total of the components (A) and (B).
  • Adhesive composition is 10 to 40 parts by mass based on 100 parts by mass of the total of the components (A) and (B).
  • an adhesive composition having good adhesion to a substrate such as LCP and also having excellent low dielectric properties, and a laminate and an adhesive sheet using the same.
  • the adhesive composition of the present embodiment includes (A) a bismaleimide resin represented by the general formula (1) (hereinafter, also referred to as “component (A)”) and (B) a general formula (2). (Hereinafter, also referred to as “component (B)”) and (C) a curing accelerator (hereinafter, also referred to as “component (C)”). Further, the adhesive composition of the present embodiment may contain (D) an organic solvent (hereinafter, also referred to as “component (D)”).
  • component (D) an organic solvent
  • Bismaleimide resin is a compound represented by the following general formula (1), and is obtained by reacting dimer diamine, which is a diamine derived from dimer acid, with tetracarboxylic dianhydride and maleic anhydride. Obtainable.
  • R 1 represents a divalent hydrocarbon group derived from dimer acid
  • Q represents a substituted or unsubstituted aliphatic group having 1 to 100 carbon atoms, a substituted or unsubstituted aromatic group, or , A substituted or unsubstituted heteroaromatic group
  • n represents an integer of 0 to 100.
  • Q in the formula (1) may be an unsubstituted aromatic group from the viewpoint of obtaining better adhesiveness to a resin base material having low dielectric properties such as LCP and obtaining better low dielectric properties. preferable.
  • n in the formula (1) is an integer of 5 to 30 from the viewpoint of obtaining better adhesiveness to a resin substrate having low dielectric properties such as LCP and obtaining better low dielectric properties. Is preferred.
  • @Dimer diamine is a compound derived from dimer acid, which is a dimer of unsaturated fatty acids such as oleic acid, as described in, for example, JP-A-9-112712.
  • a known dimer diamine can be used without any particular limitation.
  • a compound represented by the following general formula (3) and / or general formula (4) is preferable.
  • the bond shown by a broken line means a carbon-carbon single bond or a carbon-carbon double bond.
  • the formulas (3) and (4) indicate the number of hydrogen atoms bonded to each carbon atom constituting the carbon-carbon double bond by the formula The structure is obtained by subtracting one from the numbers shown in (3) and (4).
  • dimer diamines examples include PRIAMINE 1075 and PRIAMINE 1074 (both manufactured by Croda Japan KK).
  • tetracarboxylic dianhydride examples include pyromellitic anhydride; 1,2,3,4-cyclobutanetetracarboxylic dianhydride; 1,4,5,8-naphthalenetetracarboxylic dianhydride; 4,9,10-perylenetetracarboxylic dianhydride; bicyclo (2.2.2) oct-7-ene-2,3,5,6-tetracarboxylic dianhydride; diethylenetriaminepentaacetic dianhydride; Ethylenediaminetetraacetic acid dianhydride; 3,3 ', 4,4'-benzophenonetetracarboxylic dianhydride; 3,3', 4,4'-biphenyltetracarboxylic dianhydride; 4,4'-oxydiphthalic acid Anhydride; 3,3 ', 4,4'-diphenylsulfonetetracarboxylic dianhydride; 2,2'-bis (3,4-dip
  • the weight average molecular weight of the bismaleimide resin is preferably 3000 to 70000 from the viewpoint of obtaining better adhesiveness to a resin base material having low dielectric properties such as LCP and obtaining better low dielectric properties. It is more preferably from 5,000 to 50,000, even more preferably from 7000 to 30,000.
  • Bismaleimide resin may be a commercially available compound. Specifically, for example, DESIGNERDEMOLECURES Inc. BMI-3000 (synthesized from dimer diamine, pyromellitic dianhydride and maleic anhydride), BMI-1500, BMI-1700, BMI-5000 and the like can be preferably used.
  • the epoxy resin is not particularly limited as long as it is represented by the following general formula (2), and examples thereof include a bisphenol A epoxy resin and a bisphenol F epoxy resin. These can be used alone or in combination of two or more.
  • the epoxy resin (B) it is preferable to use a liquid bisphenol A epoxy resin or a liquid bisphenol F epoxy resin from the viewpoint of compatibility with the (A) bismaleimide resin.
  • R 2 represents a hydrogen atom or a methyl group
  • m represents an integer of 0 to 30.
  • M in the formula (2) is preferably an integer of 0 to 10 from the viewpoint of obtaining better adhesiveness to a resin base material having low dielectric properties such as LCP and obtaining better low dielectric properties. .
  • the content of the epoxy resin (B) is preferably from 10 to 40 parts by mass, more preferably from 10 to 30 parts by mass, where the total amount of the components (A) and (B) is 100 parts by mass. , More preferably from 12 to 25 parts by mass, particularly preferably from 15 to 20 parts by mass.
  • the content of the component (B) is 10 parts by mass or more, excellent adhesive strength to the LCP substrate tends to be easily obtained.
  • the content is 40 parts by mass or less, more excellent low dielectric properties are obtained. Tend to be more likely to be caught.
  • the curing accelerator is not particularly limited, and examples thereof include a phosphine compound, a phosphonium salt compound, an imidazole compound, and an amine compound. These can be used alone or in combination of two or more. Among them, a phosphonium salt compound or an imidazole compound is preferable because it has a particularly excellent function as a catalyst.
  • phosphine compound examples include primary phosphines such as alkyl phosphines such as ethyl phosphine and propyl phosphine and phenyl phosphine; dialkyl phosphines such as dimethyl phosphine and diethyl phosphine; diphenyl phosphine such as diphenyl phosphine; methyl phenyl phosphine; Graded phosphines; trialkyl phosphines such as trimethyl phosphine, triethyl phosphine, tributyl phosphine, trioctyl phosphine, tricyclohexyl phosphine, triphenyl phosphine, alkyl diphenyl phosphine, dialkyl phenyl phosphine, tribenzyl phosphine, tolyl phosphine, tri-p-
  • Examples of the phosphonium salt compound include compounds having tetraphenylphosphonium, alkyltriphenylphosphonium, tetraalkylphosphonium, and the like. Specifically, tetraphenylphosphonium-thiocyanate, tetraphenylphosphonium-tetra-p-methylphenylborate, butyl Triphenylphosphonium-thiocyanate, tetraphenylphosphonium-phthalic acid, tetrabutylphosphonium-1,2-cyclohexyldicarboxylic acid, tetrabutylphosphonium-1,2-cyclohexyldicarboxylic acid, tetrabutylphosphonium-lauric acid and the like Can be
  • imidazole compound examples include 1- (2-cyanoethyl) -2-phenylimidazole, 1,2-dimethylimidazole, 2-ethyl-4-methylimidazole, 2-methylimidazole, 2-ethylimidazole, and 2,4- Dimethylimidazole, 2-undecylimidazole, 2-heptadecylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 1-benzyl-2-methylimidazole, 2-phenyl-4,5-dihydroxymethylimidazole, 2-phenyl-4-methyl-5-hydroxymethylimidazole, 1-vinyl-2-methylimidazole, 1-propyl-2-methylimidazole, 2-isopropylimidazole, 1-cyanomethyl-2-methyl-imidazole, 1-cyano Chill-2-ethyl-4-methylimidazole, 1-cyanoethyl-2-undecyl imidazole,
  • imidazole compounds include 1- (2-cyanoethyl) -2-phenylimidazole, 1,2-dimethylimidazole, 2-methylimidazole, 2-phenylimidazole, 2-undecylimidazole, and 2-ethyl-imidazole. 4-Methylimidazole is preferred.
  • Examples of the amine compound include triethylamine, dimethylbenzylamine, triethylenediamine, tripropylamine, tributylamine, dimethylethanolamine, triethanolamine, 4-aminopyridine, 2-aminopyridine, N, N-dimethyl-4-amino Examples include pyridine, 4-diethylaminopyridine, 2-hydroxypyridine, 2-methoxypyridine, 4-methoxypyridine and the like.
  • the content of the curing accelerator is not particularly limited, but from the viewpoint of further improving the adhesiveness to a substrate such as LCP and the heat resistance of the obtained cured product, the bismaleimide resin of the component (A) is used.
  • the total amount is preferably 0.1 to 5.0 parts by mass, more preferably 1.0 to 3.0 parts by mass, based on 100 parts by mass of the total of the component (B) and the epoxy resin.
  • the adhesive composition of the present embodiment can further contain (D) an organic solvent.
  • the organic solvent used in the present embodiment is not particularly limited as long as it dissolves (A) a bismaleimide resin, (B) an epoxy resin, and (C) a curing accelerator.
  • Specific examples of the organic solvent include aromatic hydrocarbons such as benzene, toluene, xylene and mesitylene; aliphatic hydrocarbons such as hexane, heptane, octane and decane; cyclohexane, cyclohexene, methylcyclohexane and ethylcyclohexane.
  • Alicyclic hydrocarbons such as hexane; halogenated hydrocarbons such as trichloroethylene, dichloroethylene, chlorobenzene, and chloroform; alcohols such as methanol, ethanol, isopropyl alcohol, butanol, pentanol, hexanol, propanediol, and phenol Solvents; ketone solvents such as acetone, methyl isobutyl ketone, methyl ethyl ketone, pentanone, hexanone, cyclohexanone, isophorone and acetophenone; cell solvents such as methyl cellosolve and ethyl cellosolve Ester solvents such as methyl acetate, ethyl acetate, butyl acetate, methyl propionate, and butyl formate; ethylene glycol mono n-butyl ether, ethylene glycol mono iso-butyl ether, ethylene glycol mono
  • Preparation of the adhesive composition of the present embodiment is performed according to a generally employed method.
  • the preparation method include methods such as melt mixing, powder mixing, and solution mixing.
  • an inorganic filler, a release agent, a flame retardant, an ion trapping agent, an antioxidant, an adhesion imparting agent, a low stress agent, a colorant, a coupling, Agents and the like may be blended within a range that does not impair the effects of the present disclosure.
  • the inorganic filler is added for lowering the coefficient of thermal expansion of the adhesive composition and improving the moisture resistance reliability.
  • the inorganic filler include fused silica, crystalline silica, silica such as cristobalite, alumina, silicon nitride, aluminum nitride, boron nitride, titanium oxide, glass fiber, and magnesium oxide.
  • the average particle size and shape of these inorganic fillers can be selected according to the application. Among them, spherical alumina, spherical fused silica, glass fiber and the like are preferable.
  • the release agent is added to improve the releasability from the mold.
  • the release agent include carnauba wax, rice wax, candelilla wax, polyethylene, polyethylene oxide, polypropylene, montanic acid, montanic acid and saturated alcohol, 2- (2-hydroxyethylamino) ethanol, ethylene glycol, and glycerin. All known compounds such as montan wax, stearic acid, stearic acid ester and stearic acid amide, which are ester compounds with the above, can be used.
  • Flame retardants are added to impart flame retardancy. Any known flame retardant can be used and is not particularly limited. Examples of the flame retardant include a phosphazene compound, a silicone compound, zinc-molybdate-supported talc, zinc-molybdate-supported zinc oxide, aluminum hydroxide, magnesium hydroxide, and molybdenum oxide.
  • the ion trapping agent is added in order to capture ionic impurities contained in the liquid adhesive composition and prevent thermal deterioration and moisture absorption deterioration.
  • Any known ion trapping agent can be used and is not particularly limited. Examples of the ion trapping agent include hydrotalcites, bismuth hydroxide compounds, and rare earth oxides.
  • the laminate of the present embodiment is obtained by laminating an adhesive composition on a substrate (a two-layer laminate of a substrate / adhesive layer) or further laminating a substrate (substrate / adhesive layer) / Three-layer laminate of base material).
  • the adhesive layer refers to a layer of the adhesive composition after the adhesive composition of the present embodiment is applied to a substrate and dried.
  • the adhesive composition of the present embodiment can be applied to various substrates and dried according to a conventional method, and further laminated with another substrate to obtain the laminate of the present embodiment.
  • the substrate is not particularly limited as long as the adhesive composition of the present embodiment can be applied and dried to form an adhesive layer.
  • a metal substrate such as a metal plate and a metal foil, and papers.
  • the material of the resin base material examples include polyester resin, polyamide resin, polyimide resin, polyamideimide resin, liquid crystal polymer, polyphenylene sulfide, syndiotactic polystyrene, polyolefin resin, and fluorine resin.
  • the resin substrate is a film-like resin (hereinafter, also referred to as a “substrate film layer”).
  • the metal substrate any conventionally known conductive material that can be used for a circuit board can be used. Examples of the material include various metals such as SUS, copper, aluminum, iron, steel, zinc, and nickel, and respective alloys, plated products, metals treated with other metals such as zinc or chromium compounds, and the like. .
  • the metal substrate is preferably a metal foil, more preferably a copper foil.
  • the thickness of the metal foil is not particularly limited, but is preferably 1 ⁇ m or more, more preferably 3 ⁇ m or more, and further preferably 10 ⁇ m or more. Further, the thickness of the metal foil is preferably 50 ⁇ m or less, more preferably 30 ⁇ m or less, and further preferably 20 ⁇ m or less.
  • the metal foil is usually provided in the form of a roll, but the form of the metal foil used when manufacturing a printed wiring board as described below is not particularly limited.
  • the form of the metal foil used when manufacturing a printed wiring board as described below is not particularly limited.
  • its length is not particularly limited.
  • the width is not particularly limited, but is preferably about 250 to 500 cm.
  • Examples of papers include high quality paper, kraft paper, roll paper, glassine paper and the like. Further, as the composite material, glass epoxy or the like can be exemplified.
  • polyester resin polyamide resin, polyimide resin, polyamideimide resin, liquid crystal polymer, polyphenylene sulfide, syndiotactic polystyrene, polyolefin resin, Fluorine-based resin, SUS steel plate, copper foil, aluminum foil, or glass epoxy is preferred.
  • the adhesive sheet of the present embodiment includes the above-described laminate, and is, for example, a laminate of the above-described laminate and a release substrate via an adhesive composition.
  • base material base material / adhesive layer / base material
  • the release substrate can be released from the adhesive sheet, and the adhesive layer can be transferred to another substrate.
  • the adhesive sheet of the present embodiment can be obtained by applying and drying the adhesive composition of the present embodiment to various laminates according to a conventional method. Also, after drying, when a release substrate is attached to the adhesive layer, it can be wound up without causing set-off to the base material that constitutes the laminate, and excellent operability is achieved, and the adhesive layer is Because it is protected, it has excellent storage properties and is easy to use. Further, if the adhesive composition is applied to the release substrate and dried, and if necessary, another release substrate is attached, the adhesive layer itself can be transferred to another substrate.
  • the release substrate is not particularly limited, for example, a high-quality paper, kraft paper, roll paper, on both sides of paper such as glassine paper, clay, polyethylene, a coating layer of a filler such as polyethylene and polypropylene. And a silicone-based, fluorine-based, or alkyd-based release agent applied on each of the coating layers.
  • various olefin films such as polyethylene, polypropylene, ethylene- ⁇ -olefin copolymer and propylene- ⁇ -olefin copolymer alone, and those obtained by applying the above release agent on a film such as polyethylene terephthalate may also be used.
  • alkyd-based release agents on both sides of high-quality paper and polypropylene for the reason that silicone adversely affects the electrical properties
  • the method for coating the adhesive composition on the substrate is not particularly limited, and examples thereof include a comma coater and a reverse roll coater.
  • an adhesive layer can be provided directly or by a transfer method on a rolled copper foil or a polyimide film which is a constituent material of a printed wiring board.
  • the thickness of the adhesive layer after drying is appropriately changed as necessary, but is preferably in the range of 5 to 200 ⁇ m. If the thickness of the adhesive layer is less than 5 ⁇ m, the adhesive strength may be insufficient. If the thickness is 200 ⁇ m or more, drying may be insufficient and the residual solvent may increase, and there is a problem that blisters may be generated at the time of pressing for manufacturing a printed wiring board.
  • the drying conditions are not particularly limited, but the residual solvent ratio after drying is preferably 1% by mass or less. If it exceeds 1% by mass, there is a problem that the residual solvent foams during the press for producing a printed wiring board, and blisters are easily generated.
  • the printed wiring board according to the present embodiment includes, as constituent elements, a laminate formed from a metal foil forming a conductive circuit and a resin base material.
  • the printed wiring board can be manufactured by a conventionally known method such as a subtractive method using a metal-clad laminate.
  • the printed wiring board according to the present embodiment is a so-called flexible circuit board (FPC) in which a conductive circuit formed of a metal foil is partially or entirely covered with a cover film or screen printing ink as necessary.
  • FPC flexible circuit board
  • TAB tape automated bonding
  • the printed wiring board of the present embodiment can have any laminated configuration that can be adopted as a printed wiring board.
  • a printed wiring board including four layers of a base film layer, a metal foil layer, an adhesive layer, and a cover film layer can be provided.
  • a printed wiring board including five layers of a base film layer, an adhesive layer, a metal foil layer, an adhesive layer, and a cover film layer can be provided.
  • the adhesive composition of the present embodiment can be suitably used for each adhesive layer of a printed wiring board.
  • the adhesive composition when used as an adhesive, the adhesive composition has high adhesiveness not only to conventional polyimide, polyester film, and copper foil constituting a printed wiring board but also to a low-polarity resin base material such as LCP.
  • solder reflow resistance can be obtained, and the adhesive layer itself has excellent low dielectric properties. Therefore, it is suitable as an adhesive composition used for a coverlay film, a laminate, a copper foil with resin, and a bonding sheet.
  • any resin film conventionally used as a base material of the printed wiring board can be used as the base film.
  • the resin of the base film include polyester resin, polyamide resin, polyimide resin, polyamideimide resin, liquid crystal polymer, polyphenylene sulfide, syndiotactic polystyrene, polyolefin-based resin, and fluorine-based resin.
  • the adhesive composition of the present embodiment has excellent adhesiveness even to a low-polar substrate such as a liquid crystal polymer, polyphenylene sulfide, syndiotactic polystyrene, and a polyolefin resin.
  • any conventionally known insulating film as an insulating film for a printed wiring board can be used.
  • any conventionally known insulating film as an insulating film for a printed wiring board can be used.
  • manufactured from various polymers such as polyimide, polyester, polyphenylene sulfide, polyether sulfone, polyether ether ketone, aramid, polycarbonate, polyarylate, polyimide, polyamide imide, liquid crystal polymer, polyphenylene sulfide, syndiotactic polystyrene, and polyolefin resin.
  • the film to be used is usable. More preferably, it is a polyimide film or a liquid crystal polymer film.
  • the compatibility refers to a composition obtained by mixing (A) a bismaleimide resin, (B) an epoxy resin, (C) a curing accelerator, and (D) an organic solvent, and stirring the mixture under the conditions of Example 1 described below. Refers to the state observed visually. If the compatibility is good, it means that there is no precipitate, etc., and it can be applied to the substrate. If the compatibility is poor, there is a precipitate, etc., which makes it difficult to apply it to the substrate. Point to. For those having poor compatibility, other physical properties were not evaluated because it was difficult to form a film. (Evaluation criteria) ⁇ : No precipitate (transparent) ⁇ : No precipitate (turbidity) ⁇ : with precipitate
  • ⁇ Adhesive strength> A resin film from which Purex A31 was peeled off, a glass plate having a thickness of 0.7 mm, and an LCP film having a thickness of 75 ⁇ m (trade name “Vexter”, manufactured by Kuraray Co., Ltd.) laminated with the resin film in the middle Then, thermocompression bonding was performed with a hot press at 200 ° C. and 2 MPa for 1 hour to obtain a laminate in which a glass plate, a cured resin film, and an LCP film were laminated in this order. The adhesive strength was measured by peeling the LCP film of the obtained laminate.
  • the peeling strength was measured at a normal temperature at a tensile speed of 5 mm / s using a 90 ° peeling measuring device (trade name “RHEONER II CREEMETER RE2-3305B” manufactured by Yamaden Corporation). Further, a peeling position (peeling mode) at the time of peeling was observed.
  • the peeling mode means that “substrate destruction” has higher adhesive strength than “interfacial peeling”.
  • the temperature was raised to 80 ° C., and the temperature was maintained for 0.5 hour, and 201.3 parts by mass of dimer diamine (trade name “PRIAMINE 1075”, manufactured by Crowda Japan Co., Ltd.) was added dropwise. After the dropwise addition, 4.3 parts by mass of methanesulfonic acid (manufactured by Wako Pure Chemical Industries, Ltd.) was added. Thereafter, the temperature was raised to 165 ° C., and a dehydration ring-closing reaction was performed at 165 ° C. for 1 hour to remove water and ethanol in the reaction solution to obtain an intermediate polyimide resin.
  • dimer diamine trade name “PRIAMINE 1075”, manufactured by Crowda Japan Co., Ltd.
  • methanesulfonic acid manufactured by Wako Pure Chemical Industries, Ltd.
  • the obtained polyimide resin was cooled to 80 ° C., 27.3 parts by mass of maleic anhydride (manufactured by Fuso Chemical Industry Co., Ltd.) was added, the temperature was raised to 160 ° C., and a dehydration ring closure reaction was performed at 160 ° C. for 2 hours. Then, water in the reaction solution was removed to obtain a bismaleimide resin.
  • maleic anhydride manufactured by Fuso Chemical Industry Co., Ltd.
  • the obtained bismaleimide resin was put into a separating funnel, 1000 parts by mass of pure water was charged, and the separating funnel was shaken and allowed to stand. After standing, the aqueous layer and the organic layer were separated, and then only the organic layer was recovered.
  • the collected organic layer is poured into a 1-L glass container equipped with a cooler, a nitrogen inlet tube, a thermocouple, a stirrer, and a vacuum pump, heated to 88 to 93 ° C., and water is removed. The temperature was raised and the solvent was removed for 1 hour under reduced pressure of 0.1 MPa from atmospheric pressure to obtain a bismaleimide resin (A-1) (weight average molecular weight of 16,000) as the component (A).
  • Example 1 In a 500 ml four-necked flask equipped with a stirrer, 90 parts by mass of the bismaleimide resin (A-1) obtained in Synthesis Example 1 and an epoxy resin (trade name “jER-825”, manufactured by Mitsubishi Chemical Corporation) And 100 parts by mass of toluene, and stirred for 3 hours. To the obtained solution, 2 parts by mass of a curing accelerator (trade name “TBP-3S”, manufactured by Hokuko Chemical Co., Ltd.) was added, and the mixture was further stirred for 0.5 hour to obtain an adhesive composition.
  • Table 1 shows the amounts of the components and the results of evaluation of the physical properties. In Table 1, the amounts of the components (A) to (D) indicate parts by mass.
  • Examples 2 to 12 and Comparative Examples 1 to 12 were performed in the same manner as in Example 1 except that the kind and the amount of the bismaleimide resin, the epoxy resin, or the curing accelerator were changed to the contents shown in Table 1 or Table 2. Thus, 13 adhesive compositions were obtained.
  • Tables 1 and 2 show the amounts of the components and the results of the physical property evaluation. In Tables 1 and 2, the amounts of the components (A) to (D) indicate parts by mass. Details of the components (A) to (D) are as follows. In the component (B), (B-1) to (B-2) are epoxy resins satisfying the general formula (2), and (B-3) to (B-13) do not satisfy the general formula (2). Epoxy resin.
  • Component (A) Bismaleimide resin (A-1) Bismaleimide resin of Synthesis Example 1 (weight average molecular weight 16,000) (A-2) Bismaleimide resin of Synthesis Example 2 (weight average molecular weight 17000)
  • Component (C): curing accelerator (C-1) tetrabutylphosphonium-1,2-cyclohexyldicarboxylic acid (cation type: anion type 1: 1): TBP-3S (manufactured by Hokuko Chemical Co., Ltd.) (C-2) 1- (2-cyanoethyl) -2-phenylimidazole: 2PZCN (manufactured by Shikoku Chemicals Co., Ltd.) (C-3) 1,2-dimethylimidazole: 1,2-DMZ (manufactured by Shikoku Chemicals Co., Ltd.) (C-4) Dimethylbenzylamine: DMBA (Fuji Film Wako Pure Chemical Industries, Ltd.)
  • the adhesive strength “> 2.0 kN / m” indicates the measurement limit of the device. However, even those having an adhesive strength of “> 2.0 kN / m” were at least partially peeled off by pulling by hand or the like, and the breaking mode at that time was evaluated.
  • the adhesive composition (Example) containing the bismaleimide resin, the epoxy resin, and the curing accelerator of the present disclosure shows high adhesive strength with LCP.
  • the adhesive composition (Example) of the present disclosure has low dielectric constant and dielectric loss tangent, and is excellent in low dielectric properties.
  • the mechanism by which the adhesive composition exhibited high adhesive strength with LCP is related to the compatibility between the bismaleimide resin and the epoxy resin.
  • the compatibility between the bismaleimide resin and the epoxy resin is good, the maleimide group and the epoxy group are uniformly copolymerized, and the hydroxy group is dispersed, so that the LCP and the hydroxy group can interact with each other to exhibit high adhesive strength. thinking.
  • the compatibility between the bismaleimide resin and the epoxy resin is poor, the bismaleimide resin and the epoxy resin react with each other, causing microphase separation, and the hydroxy groups do not disperse and interact with each other. It is thought that the adhesive strength will be low because of the inability to interact with.

Abstract

An adhesive composition containing (A) a bismaleimide resin represented by general formula (1), (B) an epoxy resin represented by general formula (2), and (C) a curing accelerator. [In formula (1), R1 represents a divalent hydrocarbon group derived from a dimer acid, Q represents a substituted or unsubstituted C1-100 aliphatic group, a substituted or unsubstituted aromatic group, or a substituted or unsubstituted heteroaromatic group, and n represents an integer of 0-100.] [In formula (2), R2 represents a hydrogen atom or a methyl group, and m represents an integer of 0-30.]

Description

接着剤組成物、積層体及び接着シートAdhesive composition, laminate and adhesive sheet
 本開示は、接着剤組成物、積層体及び接着シートに関する。より詳しくは、本開示は、樹脂基材と樹脂基材又は金属基材との接着に用いられる接着剤組成物に関し、特に液晶ポリマー(以下、「LCP」と略す)等の低誘電特性を有する基材との接着に用いられる接着剤組成物に関する。 The present disclosure relates to an adhesive composition, a laminate, and an adhesive sheet. More specifically, the present disclosure relates to an adhesive composition used for bonding a resin substrate and a resin substrate or a metal substrate, and particularly has a low dielectric property such as a liquid crystal polymer (hereinafter abbreviated as “LCP”). The present invention relates to an adhesive composition used for bonding to a substrate.
 近年、プリント配線板における伝送信号の高速化に伴い、信号の高周波化が進んでいる。これに伴い、フレキシブルプリント配線板(以下、「FPC」と略す)には、高周波領域での低誘電特性(低誘電率、低誘電正接)の要求が高まっている。このような要求に対して、FPCに用いられる基材フィルムとして、従来のポリイミド(PI)、ポリエチレンテレフタレートフィルムに代えて、低誘電特性を有するLCP、シンジオタクチックポリスチレン(SPS)、ポリフェニレンスルフィド(PPS)等の基材フィルムが提案されている。 In recent years, with the increase in the speed of transmission signals in printed wiring boards, the frequency of signals has been increasing. Along with this, there is an increasing demand for flexible printed wiring boards (hereinafter abbreviated as “FPC”) to have low dielectric properties (low dielectric constant and low dielectric loss tangent) in a high frequency range. In response to such demands, as a base film used for FPC, instead of conventional polyimide (PI) and polyethylene terephthalate films, LCP having low dielectric properties, syndiotactic polystyrene (SPS), polyphenylene sulfide (PPS) ) Has been proposed.
 しかしながら、低誘電特性を有する基材フィルムは、低極性のため、従来のエポキシ系接着剤又はアクリル系接着剤を用いた場合、接着力が弱く、カバーレイフィルム及び積層板等のFPC用部材の作製が困難であった。また、エポキシ系接着剤及びアクリル系接着剤は、低誘電特性に優れず、FPCの誘電特性を損なうという問題がある。 However, since the base film having low dielectric properties has low polarity, when a conventional epoxy-based adhesive or acrylic-based adhesive is used, the adhesive strength is weak, and the FPC member such as a cover lay film and a laminated board is used. Fabrication was difficult. Further, epoxy adhesives and acrylic adhesives have a problem that they are not excellent in low dielectric properties and impair the dielectric properties of FPC.
 一方、ポリオレフィン樹脂は、低誘電特性を有することが知られている。そこで、ポリオレフィン樹脂を用いたFPC用接着剤組成物が提案されている。例えば、特許文献1では、FPCの電気特性を高めるために、オレフィン骨格を導入した変性ポリアミド接着剤組成物が提案されている。また、特許文献2では、芳香族オレフィンオリゴマー型改質剤とエポキシ樹脂を用いた接着剤及びフレキシブルプリント配線板用カバーレイが提案されている。 On the other hand, polyolefin resins are known to have low dielectric properties. Thus, an FPC adhesive composition using a polyolefin resin has been proposed. For example, Patent Document 1 proposes a modified polyamide adhesive composition into which an olefin skeleton has been introduced in order to enhance the electrical characteristics of FPC. Patent Literature 2 proposes an adhesive using an aromatic olefin oligomer-type modifier and an epoxy resin, and a coverlay for a flexible printed wiring board.
特開2007-284515号公報JP 2007-284515 A 特開2007-63306号公報JP 2007-63306 A
 しかしながら、特許文献1及び2に記載された接着剤組成物は、ポリイミドフィルムとの接着性は得られるものの、LCP等の低誘電特性を有する基材フィルムとの接着性が得られ難いという問題がある。また、特許文献1及び2に記載された接着剤組成物は、誘電特性が劣るという問題がある。 However, the adhesive compositions described in Patent Literatures 1 and 2 have a problem that, although they can obtain adhesiveness with a polyimide film, they cannot easily obtain adhesiveness with a base film having low dielectric properties such as LCP. is there. Further, the adhesive compositions described in Patent Documents 1 and 2 have a problem that the dielectric properties are inferior.
 また、LCP基材を用いる場合は、接着剤を用いずにLCPを溶融させ、銅箔と貼り合せて2層基板を作製する方法がある。しかしながらこの方法は、高温で貼り合せる装置又は機台が必要であったり、加工時にシワが入りやすく、歩留まりが低下したりするという問題がある。 In the case where an LCP base material is used, there is a method in which the LCP is melted without using an adhesive and bonded to a copper foil to produce a two-layer substrate. However, this method has a problem that a device or a base for bonding at a high temperature is required, and wrinkles are easily formed at the time of processing, and the yield is reduced.
 本開示は、上記従来技術の有する課題に鑑みてなされたものであり、LCP等の基材と良好な接着性を有し、且つ低誘電特性にも優れた接着剤組成物、それを用いた積層体及び接着シートを提供することを目的とする。 The present disclosure has been made in view of the problems of the above prior art, and has an adhesive composition having good adhesion to a substrate such as LCP and also having excellent low dielectric properties. An object is to provide a laminate and an adhesive sheet.
 本発明者等は、上記課題を解決するために鋭意検討した結果、ダイマー酸に由来する構造を有する特定のビスマレイミド樹脂を含有し、さらに特定の構造を持ったエポキシ樹脂と、硬化促進剤とを含有する接着剤組成物が、優れた低誘電特性を発現するとともに、LCP等の低誘電特性を有する樹脂基材と高い接着性を有することを見出し、本発明を完成するに至った。 The present inventors have conducted intensive studies to solve the above-described problems, and contain a specific bismaleimide resin having a structure derived from dimer acid, and an epoxy resin having a further specific structure, and a curing accelerator. The present inventors have found that an adhesive composition containing the compound exhibits excellent low dielectric properties and has high adhesiveness to a resin substrate having low dielectric properties such as LCP, and has completed the present invention.
 すなわち、本開示は、以下の発明を提供する。
[1](A)下記一般式(1)で表されるビスマレイミド樹脂と、(B)下記一般式(2)で表されるエポキシ樹脂と、(C)硬化促進剤と、を含有する接着剤組成物。
Figure JPOXMLDOC01-appb-C000003
[式(1)中、Rはダイマー酸に由来する2価の炭化水素基を示し、Qは置換又は非置換の炭素数1~100の脂肪族基、置換又は非置換の芳香族基、或いは、置換又は非置換のヘテロ芳香族基を示し、nは0~100の整数を示す。]
Figure JPOXMLDOC01-appb-C000004
[式(2)中、Rは水素原子又はメチル基を示し、nは0~30の整数を示す。]
[2]上記(C)成分が、ホスフィン化合物、ホスホニウム塩化合物、イミダゾール化合物及びアミン化合物からなる群より選択される少なくとも1種を含有する、上記[1]に記載の接着剤組成物。
[3]上記(B)成分の含有量が、上記(A)成分及び上記(B)成分の総量を100質量部として10~40質量部である、上記[1]又は[2]に記載の接着剤組成物。
[4]上記(C)成分の含有量が、上記(A)成分及び(B)成分の総量100質量部に対して0.1~5.0質量部である、上記[1]~[3]のいずれかに記載の接着剤組成物。
[5]樹脂基材と、樹脂基材又は金属基材との接着に用いられる、上記[1]~[4]のいずれかに記載の接着剤組成物。
[6]基材と、該基材上に上記[1]~[5]のいずれかに記載の接着剤組成物を用いて形成された接着剤層と、を備える積層体。
[7]上記[1]~[5]のいずれかに記載の接着剤組成物によって接着された、樹脂基材と、樹脂基材又は金属基材とを備える積層体。
[8]上記[6]又は[7]に記載の積層体を備える接着シート。
That is, the present disclosure provides the following inventions.
[1] Adhesion containing (A) a bismaleimide resin represented by the following general formula (1), (B) an epoxy resin represented by the following general formula (2), and (C) a curing accelerator. Composition.
Figure JPOXMLDOC01-appb-C000003
[In the formula (1), R 1 represents a divalent hydrocarbon group derived from dimer acid, Q represents a substituted or unsubstituted aliphatic group having 1 to 100 carbon atoms, a substituted or unsubstituted aromatic group, Alternatively, it represents a substituted or unsubstituted heteroaromatic group, and n represents an integer of 0 to 100. ]
Figure JPOXMLDOC01-appb-C000004
[In the formula (2), R 2 represents a hydrogen atom or a methyl group, and n represents an integer of 0 to 30. ]
[2] The adhesive composition according to [1], wherein the component (C) contains at least one selected from the group consisting of a phosphine compound, a phosphonium salt compound, an imidazole compound, and an amine compound.
[3] The above-mentioned [1] or [2], wherein the content of the component (B) is 10 to 40 parts by mass based on 100 parts by mass of the total of the components (A) and (B). Adhesive composition.
[4] The above-mentioned [1] to [3], wherein the content of the component (C) is 0.1 to 5.0 parts by mass based on 100 parts by mass of the total of the components (A) and (B). ] The adhesive composition according to any one of the above.
[5] The adhesive composition according to any one of [1] to [4], which is used for bonding a resin substrate to a resin substrate or a metal substrate.
[6] A laminate comprising a base material and an adhesive layer formed on the base material using the adhesive composition according to any one of [1] to [5].
[7] A laminate comprising a resin substrate and a resin or metal substrate bonded by the adhesive composition according to any one of the above [1] to [5].
[8] An adhesive sheet comprising the laminate according to [6] or [7].
 本開示によれば、LCP等の基材と良好な接着性を有し、且つ低誘電特性にも優れた接着剤組成物、それを用いた積層体及び接着シートを提供することができる。 According to the present disclosure, it is possible to provide an adhesive composition having good adhesion to a substrate such as LCP and also having excellent low dielectric properties, and a laminate and an adhesive sheet using the same.
 以下、本開示をその好適な実施形態に即して詳細に説明する。 Hereinafter, the present disclosure will be described in detail in accordance with preferred embodiments.
[接着剤組成物]
 本実施形態の接着剤組成物は、(A)一般式(1)で表されるビスマレイミド樹脂(以下、「(A)成分」ともいう)と、(B)一般式(2)で表されるエポキシ樹脂(以下、「(B)成分」ともいう)と、(C)硬化促進剤(以下、「(C)成分」ともいう)と、を含有する。また、本実施形態の接着剤組成物は、(D)有機溶剤(以下、「(D)成分」ともいう)を含有していてもよい。
[Adhesive composition]
The adhesive composition of the present embodiment includes (A) a bismaleimide resin represented by the general formula (1) (hereinafter, also referred to as “component (A)”) and (B) a general formula (2). (Hereinafter, also referred to as “component (B)”) and (C) a curing accelerator (hereinafter, also referred to as “component (C)”). Further, the adhesive composition of the present embodiment may contain (D) an organic solvent (hereinafter, also referred to as “component (D)”).
<(A)成分:ビスマレイミド樹脂>
 (A)ビスマレイミド樹脂は、下記一般式(1)で表される化合物であり、ダイマー酸から誘導されたジアミンであるダイマージアミンとテトラカルボン酸二無水物とマレイン酸無水物とを反応させて得ることができる。
<(A) component: bismaleimide resin>
(A) Bismaleimide resin is a compound represented by the following general formula (1), and is obtained by reacting dimer diamine, which is a diamine derived from dimer acid, with tetracarboxylic dianhydride and maleic anhydride. Obtainable.
Figure JPOXMLDOC01-appb-C000005
 式(1)中、Rはダイマー酸に由来する2価の炭化水素基を示し、Qは置換又は非置換の炭素数1~100の脂肪族基、置換又は非置換の芳香族基、或いは、置換又は非置換のヘテロ芳香族基を示し、nは0~100の整数を示す。式(1)中のQは、LCP等の低誘電特性を有する樹脂基材に対するより優れた接着性、及び、より優れた低誘電特性を得る観点から、非置換の芳香族基であることが好ましい。また、式(1)中のnは、LCP等の低誘電特性を有する樹脂基材に対するより優れた接着性、及び、より優れた低誘電特性を得る観点から、5~30の整数であることが好ましい。
Figure JPOXMLDOC01-appb-C000005
In the formula (1), R 1 represents a divalent hydrocarbon group derived from dimer acid, and Q represents a substituted or unsubstituted aliphatic group having 1 to 100 carbon atoms, a substituted or unsubstituted aromatic group, or , A substituted or unsubstituted heteroaromatic group, and n represents an integer of 0 to 100. Q in the formula (1) may be an unsubstituted aromatic group from the viewpoint of obtaining better adhesiveness to a resin base material having low dielectric properties such as LCP and obtaining better low dielectric properties. preferable. Further, n in the formula (1) is an integer of 5 to 30 from the viewpoint of obtaining better adhesiveness to a resin substrate having low dielectric properties such as LCP and obtaining better low dielectric properties. Is preferred.
 ダイマージアミンは、例えば、特開平9-12712号公報に記載されているように、オレイン酸等の不飽和脂肪酸の二量体であるダイマー酸から誘導される化合物である。本実施形態では、公知のダイマージアミンを特に制限なく使用できるが、例えば下記一般式(3)及び/又は一般式(4)で表されるものが好ましい。 @Dimer diamine is a compound derived from dimer acid, which is a dimer of unsaturated fatty acids such as oleic acid, as described in, for example, JP-A-9-112712. In the present embodiment, a known dimer diamine can be used without any particular limitation. For example, a compound represented by the following general formula (3) and / or general formula (4) is preferable.
Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000007
 式(3)及び(4)中、p、q、r及びsはそれぞれ、p+q=6~17、r+s=8~19となるように選ばれる1以上の整数を示し、1~12の整数であってもよい。また、式(3)及び(4)中、破線で示した結合は、炭素-炭素単結合又は炭素-炭素二重結合を意味する。但し、破線で示した結合が炭素-炭素二重結合である場合、式(3)及び(4)は、炭素-炭素二重結合を構成する各炭素原子に結合する水素原子の数を、式(3)及び(4)に示した数から1つ減じた構造となる。 In the formulas (3) and (4), p, q, r and s each represent one or more integers selected so that p + q = 6 to 17 and r + s = 8 to 19, and are integers of 1 to 12 There may be. In the formulas (3) and (4), the bond shown by a broken line means a carbon-carbon single bond or a carbon-carbon double bond. However, when the bond shown by the broken line is a carbon-carbon double bond, the formulas (3) and (4) indicate the number of hydrogen atoms bonded to each carbon atom constituting the carbon-carbon double bond by the formula The structure is obtained by subtracting one from the numbers shown in (3) and (4).
 ダイマージアミンとしては、得られるビスマレイミド樹脂の有機溶剤溶解性、及び、当該ビスマレイミド樹脂を接着剤組成物の材料に用いた場合の接着剤組成物の耐熱性、耐熱接着性、低粘度等の観点から、上記一般式(4)で表されるものが好ましく、特に下記式(4-1)で表される化合物が好ましい。
Figure JPOXMLDOC01-appb-C000008
As dimer diamine, the solubility of the resulting bismaleimide resin in an organic solvent, and the heat resistance of the adhesive composition when the bismaleimide resin is used as a material for the adhesive composition, heat-resistant adhesion, low viscosity, etc. From the viewpoint, those represented by the above formula (4) are preferred, and compounds represented by the following formula (4-1) are particularly preferred.
Figure JPOXMLDOC01-appb-C000008
 ダイマージアミンの市販品としては、例えば、PRIAMINE1075、PRIAMINE1074(いずれもクローダジャパン株式会社製)等が挙げられる。 市 販 Examples of commercially available dimer diamines include PRIAMINE 1075 and PRIAMINE 1074 (both manufactured by Croda Japan KK).
 テトラカルボン酸二無水物としては、例えば、無水ピロメリット酸;1,2,3,4-シクロブタンテトラカルボン酸二無水物;1,4,5,8-ナフタレンテトラカルボン酸二無水物;3,4,9,10-ペリレンテトラカルボン酸二無水物;ビシクロ(2.2.2)オクト-7-エン-2,3,5,6-テトラカルボン酸二無水物;ジエチレントリアミンペンタ酢酸二無水物;エチレンジアミン四酢酸二無水物;3,3’,4,4’-ベンゾフェノンテトラカルボン酸二無水物;3,3’,4,4’-ビフェニルテトラカルボン酸二無水物;4,4’-オキシジフタル酸無水物;3,3’,4,4’-ジフェニルスルホンテトラカルボン酸二無水物;2,2’-ビス(3,4-ジカルボキシフェニル)ヘキサフルオロプロパン二無水物;4,4’-ビスフェノールA ジフタル酸無水物;5-(2,5-ジオキシテトラヒドロ)-3-メチル-3-シクロヘキセン-1,2-ジカルボン無水物;エチレングリコールビス(トリメリット酸無水物);ヒドロキノンジフタル酸無水物;アリルナディック酸無水物(allyl nadic anhydride);2-オクテン-1-イルコハク酸無水物;1,2,3,6-テトラヒドロフタル酸無水物;3,4,5,6-テトラヒドロフタル酸無水物等が挙げられる。なかでも、耐熱性の観点から無水ピロメリット酸が好ましい。これらは1種単独で又は2種以上を組み合わせて用いることができる。 Examples of the tetracarboxylic dianhydride include pyromellitic anhydride; 1,2,3,4-cyclobutanetetracarboxylic dianhydride; 1,4,5,8-naphthalenetetracarboxylic dianhydride; 4,9,10-perylenetetracarboxylic dianhydride; bicyclo (2.2.2) oct-7-ene-2,3,5,6-tetracarboxylic dianhydride; diethylenetriaminepentaacetic dianhydride; Ethylenediaminetetraacetic acid dianhydride; 3,3 ', 4,4'-benzophenonetetracarboxylic dianhydride; 3,3', 4,4'-biphenyltetracarboxylic dianhydride; 4,4'-oxydiphthalic acid Anhydride; 3,3 ', 4,4'-diphenylsulfonetetracarboxylic dianhydride; 2,2'-bis (3,4-dicarboxyphenyl) hexafluoropropane dianhydride 4,4'-bisphenol A diphthalic anhydride; 5- (2,5-dioxytetrahydro) -3-methyl-3-cyclohexene-1,2-dicarboxylic anhydride; ethylene glycol bis (trimellitic anhydride) Hydroquinone diphthalic anhydride; allyl nadic anhydride; 2-octen-1-yl succinic anhydride; 1,2,3,6-tetrahydrophthalic anhydride; 3,4,5 , 6-tetrahydrophthalic anhydride. Above all, pyromellitic anhydride is preferred from the viewpoint of heat resistance. These can be used alone or in combination of two or more.
 (A)ビスマレイミド樹脂の重量平均分子量は、LCP等の低誘電特性を有する樹脂基材に対するより優れた接着性、及び、より優れた低誘電特性を得る観点から、3000~70000であることが好ましく、5000~50000であることがより好ましく、7000~30000であることが更に好ましい。 (A) The weight average molecular weight of the bismaleimide resin is preferably 3000 to 70000 from the viewpoint of obtaining better adhesiveness to a resin base material having low dielectric properties such as LCP and obtaining better low dielectric properties. It is more preferably from 5,000 to 50,000, even more preferably from 7000 to 30,000.
 (A)ビスマレイミド樹脂は、市販の化合物を用いることもでき、具体的には例えば、DESIGNER MOLECURES Inc.製のBMI-3000(ダイマージアミン、ピロメリット酸二無水物及びマレイン酸無水物より合成)、BMI-1500、BMI-1700、BMI-5000等を好適に用いることができる。 (A) Bismaleimide resin may be a commercially available compound. Specifically, for example, DESIGNERDEMOLECURES Inc. BMI-3000 (synthesized from dimer diamine, pyromellitic dianhydride and maleic anhydride), BMI-1500, BMI-1700, BMI-5000 and the like can be preferably used.
<(B)成分:エポキシ樹脂>
 (B)エポキシ樹脂は、下記一般式(2)で表されるものであれば、特に限定されないが、例えばビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂等が挙げられる。これらは1種単独で又は2種以上を組み合わせて用いることができる。(B)エポキシ樹脂としては、(A)ビスマレイミド樹脂との相溶性の観点から、液状のビスフェノールA型エポキシ樹脂又は液状のビスフェノールF型エポキシ樹脂を用いることが好ましい。
Figure JPOXMLDOC01-appb-C000009
 式(2)中、Rは水素原子又はメチル基を示し、mは0~30の整数を示す。式(2)中のmは、LCP等の低誘電特性を有する樹脂基材に対するより優れた接着性、及び、より優れた低誘電特性を得る観点から、0~10の整数であることが好ましい。
<(B) component: epoxy resin>
(B) The epoxy resin is not particularly limited as long as it is represented by the following general formula (2), and examples thereof include a bisphenol A epoxy resin and a bisphenol F epoxy resin. These can be used alone or in combination of two or more. As the epoxy resin (B), it is preferable to use a liquid bisphenol A epoxy resin or a liquid bisphenol F epoxy resin from the viewpoint of compatibility with the (A) bismaleimide resin.
Figure JPOXMLDOC01-appb-C000009
In the formula (2), R 2 represents a hydrogen atom or a methyl group, and m represents an integer of 0 to 30. M in the formula (2) is preferably an integer of 0 to 10 from the viewpoint of obtaining better adhesiveness to a resin base material having low dielectric properties such as LCP and obtaining better low dielectric properties. .
 (B)エポキシ樹脂の含有量としては、(A)成分及び(B)成分の総量を100質量部として、10~40質量部であることが好ましく、10~30質量部であることがより好ましく、12~25質量部であることがさらに好ましく、15~20質量部であることが特に好ましい。(B)成分の含有量が10質量部以上であると、LCP基材とのより優れた接着強度が得られ易い傾向があり、40質量部以下であると、より優れた低誘電特性が得られ易い傾向がある。 The content of the epoxy resin (B) is preferably from 10 to 40 parts by mass, more preferably from 10 to 30 parts by mass, where the total amount of the components (A) and (B) is 100 parts by mass. , More preferably from 12 to 25 parts by mass, particularly preferably from 15 to 20 parts by mass. When the content of the component (B) is 10 parts by mass or more, excellent adhesive strength to the LCP substrate tends to be easily obtained. When the content is 40 parts by mass or less, more excellent low dielectric properties are obtained. Tend to be more likely to be caught.
<(C)成分:硬化促進剤>
 (C)硬化促進剤は、特に限定されないが、例えば、ホスフィン化合物、ホスホニウム塩化合物、イミダゾール化合物及びアミン化合物等が挙げられる。これらは1種単独で又は2種以上を組み合わせて用いることができる。なかでもホスホニウム塩化合物又はイミダゾール化合物が、特に優れた触媒としての機能を有するものであることから好ましい。
<(C) component: curing accelerator>
(C) The curing accelerator is not particularly limited, and examples thereof include a phosphine compound, a phosphonium salt compound, an imidazole compound, and an amine compound. These can be used alone or in combination of two or more. Among them, a phosphonium salt compound or an imidazole compound is preferable because it has a particularly excellent function as a catalyst.
 ホスフィン化合物としては、例えば、エチルホスフィン、プロピルホスフィンのようなアルキルホスフィン、フェニルホスフィン等の1級ホスフィン;ジメチルホスフィン、ジエチルホスフィンのようなジアルキルホスフィン、ジフェニルホスフィン、メチルフェニルホスフィン、エチルフェニルホスフィン等の2級ホスフィン;トリメチルホスフィン、トリエチルホスフィン、トリブチルホスフィン、トリオクチルホスフィンのようなトリアルキルホスフィン、トリシクロヘキシルホスフィン、トリフェニルホスフィン、アルキルジフェニルホスフィン、ジアルキルフェニルホスフィン、トリベンジルホスフィン、トリトリルホスフィン、トリ-p-スチリルホスフィン、トリス(2,6-ジメトキシフェニル)ホスフィン、トリ-4-メチルフェニルホスフィン、トリ-4-メトキシフェニルホスフィン、トリ-2-シアノエチルホスフィン等の3級ホスフィンなどが挙げられる。なかでも、3級ホスフィンが好ましく使用される。これらは1種単独で又は2種以上を組み合わせて用いることができる。 Examples of the phosphine compound include primary phosphines such as alkyl phosphines such as ethyl phosphine and propyl phosphine and phenyl phosphine; dialkyl phosphines such as dimethyl phosphine and diethyl phosphine; diphenyl phosphine such as diphenyl phosphine; methyl phenyl phosphine; Graded phosphines; trialkyl phosphines such as trimethyl phosphine, triethyl phosphine, tributyl phosphine, trioctyl phosphine, tricyclohexyl phosphine, triphenyl phosphine, alkyl diphenyl phosphine, dialkyl phenyl phosphine, tribenzyl phosphine, tolyl phosphine, tri-p- Styrylphosphine, tris (2,6-dimethoxyphenyl) phosphine, tri-4- Chill triphenylphosphine, tri-4-methoxyphenyl phosphine, such as tertiary phosphines such as tri-2-cyanoethyl phosphine. Of these, tertiary phosphines are preferably used. These can be used alone or in combination of two or more.
 ホスホニウム塩化合物としては、テトラフェニルホスホニウム、アルキルトリフェニルホスホニウム、テトラアルキルホスホニウム等を有する化合物が挙げられ、具体的には、テトラフェニルホスホニウム-チオシアネート、テトラフェニルホスホニウム-テトラ-p-メチルフェニルボレート、ブチルトリフェニルホスホニウム-チオシアネート、テトラフェニルホスホニウム-フタル酸、テトラブチルホスホニウム-1,2-シクロへキシルジカルボン酸、テトラブチルホスホニウム-1,2-シクロへキシルジカルボン酸、テトラブチルホスホニウム-ラウリン酸等が挙げられる。 Examples of the phosphonium salt compound include compounds having tetraphenylphosphonium, alkyltriphenylphosphonium, tetraalkylphosphonium, and the like. Specifically, tetraphenylphosphonium-thiocyanate, tetraphenylphosphonium-tetra-p-methylphenylborate, butyl Triphenylphosphonium-thiocyanate, tetraphenylphosphonium-phthalic acid, tetrabutylphosphonium-1,2-cyclohexyldicarboxylic acid, tetrabutylphosphonium-1,2-cyclohexyldicarboxylic acid, tetrabutylphosphonium-lauric acid and the like Can be
 イミダゾール化合物としては、例えば、1-(2-シアノエチル)-2-フェニルイミダゾール、1,2-ジメチルイミダゾール、2-エチル-4-メチルイミダゾール、2-メチルイミダゾール、2-エチルイミダゾール、2,4-ジメチルイミダゾール、2-ウンデシルイミダゾール、2-ヘプタデシルイミダゾール、2-フェニルイミダゾール、2-フェニル-4-メチルイミダゾール、1-ベンジル-2-メチルイミダゾール、2-フェニル-4,5-ジヒドロキシメチルイミダゾール、2-フェニル-4-メチル-5-ヒドロキシメチルイミダゾール、1-ビニル-2-メチルイミダゾール、1-プロピル-2-メチルイミダゾール、2-イソプロピルイミダゾール、1-シアノメチル-2-メチル-イミダゾール、1-シアノエチル-2-エチル-4-メチルイミダゾール、1-シアノエチル-2-ウンデシルイミダゾール、1-シアノエチル-2-フェニルイミダゾール等が挙げられる。これらの中でも、イミダゾール化合物としては、1-(2-シアノエチル)-2-フェニルイミダゾール、1,2-ジメチルイミダゾール、2-メチルイミダゾール、2-フェニルイミダゾール、2-ウンデシルイミダゾール、及び2-エチル-4-メチルイミダゾールが好ましい。これらの化合物を用いることにより、(A)ビスマレイミド樹脂の反応がより促進され、更にLCP等の低誘電特性を有する樹脂基材に対するより高い接着性が得られ易い。 Examples of the imidazole compound include 1- (2-cyanoethyl) -2-phenylimidazole, 1,2-dimethylimidazole, 2-ethyl-4-methylimidazole, 2-methylimidazole, 2-ethylimidazole, and 2,4- Dimethylimidazole, 2-undecylimidazole, 2-heptadecylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 1-benzyl-2-methylimidazole, 2-phenyl-4,5-dihydroxymethylimidazole, 2-phenyl-4-methyl-5-hydroxymethylimidazole, 1-vinyl-2-methylimidazole, 1-propyl-2-methylimidazole, 2-isopropylimidazole, 1-cyanomethyl-2-methyl-imidazole, 1-cyano Chill-2-ethyl-4-methylimidazole, 1-cyanoethyl-2-undecyl imidazole, 1-cyanoethyl-2-phenylimidazole, and the like. Among them, imidazole compounds include 1- (2-cyanoethyl) -2-phenylimidazole, 1,2-dimethylimidazole, 2-methylimidazole, 2-phenylimidazole, 2-undecylimidazole, and 2-ethyl-imidazole. 4-Methylimidazole is preferred. By using these compounds, the reaction of the (A) bismaleimide resin is further promoted, and higher adhesiveness to a resin substrate having low dielectric properties such as LCP is easily obtained.
 アミン化合物としては、例えば、トリエチルアミン、ジメチルベンジルアミン、トリエチレンジアミン、トリプロピルアミン、トリブチルアミン、ジメチルエタノールアミン、トリエタノールアミン、4-アミノピリジン、2-アミノピリジン、N,N-ジメチル-4-アミノピリジン、4-ジエチルアミノピリジン、2-ヒドロキシピリジン、2-メトキシピリジン、4-メトキシピリジン等が挙げられる。 Examples of the amine compound include triethylamine, dimethylbenzylamine, triethylenediamine, tripropylamine, tributylamine, dimethylethanolamine, triethanolamine, 4-aminopyridine, 2-aminopyridine, N, N-dimethyl-4-amino Examples include pyridine, 4-diethylaminopyridine, 2-hydroxypyridine, 2-methoxypyridine, 4-methoxypyridine and the like.
 (C)硬化促進剤の含有量は、特に限定されないが、LCP等の基材との接着性、及び、得られる硬化物の耐熱性をより向上する観点から、(A)成分のビスマレイミド樹脂と(B)成分のエポキシ樹脂との総量100質量部に対して、0.1~5.0質量部であることが好ましく、1.0~3.0質量部であることがより好ましい。 (C) The content of the curing accelerator is not particularly limited, but from the viewpoint of further improving the adhesiveness to a substrate such as LCP and the heat resistance of the obtained cured product, the bismaleimide resin of the component (A) is used. The total amount is preferably 0.1 to 5.0 parts by mass, more preferably 1.0 to 3.0 parts by mass, based on 100 parts by mass of the total of the component (B) and the epoxy resin.
<(D)成分:有機溶剤>
 本実施形態の接着剤組成物は、さらに(D)有機溶剤を含有することができる。本実施形態で用いる有機溶剤は、(A)ビスマレイミド樹脂、(B)エポキシ樹脂、及び(C)硬化促進剤を溶解させるものであれば、特に限定されない。(D)有機溶剤として具体的には、例えば、ベンゼン、トルエン、キシレン、メシチレン等の芳香族炭化水素;ヘキサン、ヘプタン、オクタン、デカン等の脂肪族系炭化水素;シクロヘキサン、シクロヘキセン、メチルシクロヘキサン、エチルシクロへキサン等の脂環族炭化水素;トリクロルエチレン、ジクロルエチレン、クロルベンゼン、クロロホルム等のハロゲン化炭化水素;メタノール、エタノール、イソプロピルアルコール、ブタノール、ペンタノール、ヘキサノール、プロパンジオール、フェノール等のアルコール系溶剤;アセトン、メチルイソブチルケトン、メチルエチルケトン、ペンタノン、ヘキサノン、シクロヘキサノン、イソホロン、アセトフェノン等のケトン系溶剤;メチルセルソルブ、エチルセルソルブ等のセルソルブ類;酢酸メチル、酢酸エチル、酢酸ブチル、プロピオン酸メチル、ギ酸ブチル等のエステル系溶剤;エチレングリコールモノn-ブチルエーテル、エチレングリコールモノiso-ブチルエーテル、エチレングリコールモノtert-ブチルエーテル、ジエチレングリコールモノn-ブチルエーテル、ジエチレングリコールモノiso-ブチルエーテル、トリエチレングリコールモノn-ブチルエーテル、テトラエチレングリコールモノn-ブチルエーテ等のグリコールエーテル系溶剤などを使用することができる。これらは1種単独で又は2種以上を組み合わせて用いることができる。好ましい態様としては、芳香族炭化水素であり、なかでもトルエン又はキシレンを用いることが好ましい。
<(D) component: organic solvent>
The adhesive composition of the present embodiment can further contain (D) an organic solvent. The organic solvent used in the present embodiment is not particularly limited as long as it dissolves (A) a bismaleimide resin, (B) an epoxy resin, and (C) a curing accelerator. (D) Specific examples of the organic solvent include aromatic hydrocarbons such as benzene, toluene, xylene and mesitylene; aliphatic hydrocarbons such as hexane, heptane, octane and decane; cyclohexane, cyclohexene, methylcyclohexane and ethylcyclohexane. Alicyclic hydrocarbons such as hexane; halogenated hydrocarbons such as trichloroethylene, dichloroethylene, chlorobenzene, and chloroform; alcohols such as methanol, ethanol, isopropyl alcohol, butanol, pentanol, hexanol, propanediol, and phenol Solvents; ketone solvents such as acetone, methyl isobutyl ketone, methyl ethyl ketone, pentanone, hexanone, cyclohexanone, isophorone and acetophenone; cell solvents such as methyl cellosolve and ethyl cellosolve Ester solvents such as methyl acetate, ethyl acetate, butyl acetate, methyl propionate, and butyl formate; ethylene glycol mono n-butyl ether, ethylene glycol mono iso-butyl ether, ethylene glycol mono tert-butyl ether, diethylene glycol mono n-butyl ether; Glycol ether solvents such as diethylene glycol mono iso-butyl ether, triethylene glycol mono n-butyl ether, and tetraethylene glycol mono n-butyl ether can be used. These can be used alone or in combination of two or more. A preferred embodiment is an aromatic hydrocarbon, and among them, toluene or xylene is preferably used.
 本実施形態の接着剤組成物の調製は、一般的に採用されている方法に準じて実施される。調製方法としては例えば、溶融混合、粉体混合、溶液混合等の方法が挙げられる。また、この際には、本実施形態の必須成分以外の、例えば、無機充填材、離型剤、難燃剤、イオントラップ剤、酸化防止剤、接着付与剤、低応力剤、着色剤、カップリング剤等を、本開示の効果を損なわない範囲において配合してもよい。 接着 Preparation of the adhesive composition of the present embodiment is performed according to a generally employed method. Examples of the preparation method include methods such as melt mixing, powder mixing, and solution mixing. In this case, other than the essential components of the present embodiment, for example, an inorganic filler, a release agent, a flame retardant, an ion trapping agent, an antioxidant, an adhesion imparting agent, a low stress agent, a colorant, a coupling, Agents and the like may be blended within a range that does not impair the effects of the present disclosure.
<無機充填材>
 無機充填材は、接着剤組成物の熱膨張率低下及び耐湿信頼性向上のために添加される。
該無機充填材としては、例えば、溶融シリカ、結晶性シリカ、クリストバライト等のシリカ類、アルミナ、窒化珪素、窒化アルミニウム、ボロンナイトライド、酸化チタン、ガラス繊維、酸化マグネシウムなどが挙げられる。これらの無機充填材の平均粒径及び形状は、用途に応じて選択することができる。なかでも球状アルミナ、球状溶融シリカ、ガラス繊維等が好ましい。
<Inorganic filler>
The inorganic filler is added for lowering the coefficient of thermal expansion of the adhesive composition and improving the moisture resistance reliability.
Examples of the inorganic filler include fused silica, crystalline silica, silica such as cristobalite, alumina, silicon nitride, aluminum nitride, boron nitride, titanium oxide, glass fiber, and magnesium oxide. The average particle size and shape of these inorganic fillers can be selected according to the application. Among them, spherical alumina, spherical fused silica, glass fiber and the like are preferable.
<離型剤>
 離型剤は、金型からの離型性を向上させるために添加される。該離型剤としては、例えば、カルナバワックス、ライスワックス、キャンデリラワックス、ポリエチレン、酸化ポリエチレン、ポリプロピレン、モンタン酸、モンタン酸と飽和アルコール、2-(2-ヒドロキシエチルアミノ)エタノール、エチレングリコール、グリセリン等とのエステル化合物であるモンタンワックス、ステアリン酸、ステアリン酸エステル、ステアリン酸アミドなど、公知のものを全て使用することができる。
<Release agent>
The release agent is added to improve the releasability from the mold. Examples of the release agent include carnauba wax, rice wax, candelilla wax, polyethylene, polyethylene oxide, polypropylene, montanic acid, montanic acid and saturated alcohol, 2- (2-hydroxyethylamino) ethanol, ethylene glycol, and glycerin. All known compounds such as montan wax, stearic acid, stearic acid ester and stearic acid amide, which are ester compounds with the above, can be used.
<難燃剤>
 難燃剤は、難燃性を付与するために添加される。該難燃剤は公知のものを全て使用することができ、特に制限されない。該難燃剤としては、例えば、ホスファゼン化合物、シリコーン化合物、モリブデン酸亜鉛担持タルク、モリブデン酸亜鉛担持酸化亜鉛、水酸化アルミニウム、水酸化マグネシウム、酸化モリブデン等が挙げられる。
<Flame retardant>
Flame retardants are added to impart flame retardancy. Any known flame retardant can be used and is not particularly limited. Examples of the flame retardant include a phosphazene compound, a silicone compound, zinc-molybdate-supported talc, zinc-molybdate-supported zinc oxide, aluminum hydroxide, magnesium hydroxide, and molybdenum oxide.
<イオントラップ剤>
 イオントラップ剤は、液状の接着剤組成物中に含まれるイオン不純物を捕捉し、熱劣化及び吸湿劣化を防ぐために添加される。イオントラップ剤は公知のものを全て使用することができ、特に制限されない。イオントラップ剤としては、例えば、ハイドロタルサイト類、水酸化ビスマス化合物、希土類酸化物等が挙げられる。
<Ion trap agent>
The ion trapping agent is added in order to capture ionic impurities contained in the liquid adhesive composition and prevent thermal deterioration and moisture absorption deterioration. Any known ion trapping agent can be used and is not particularly limited. Examples of the ion trapping agent include hydrotalcites, bismuth hydroxide compounds, and rare earth oxides.
[積層体]
 本実施形態の積層体は、基材に接着剤組成物を積層したもの(基材/接着剤層の2層積層体)、又は、さらに基材を貼り合わせたもの(基材/接着剤層/基材の3層積層体)である。ここで、接着剤層とは、本実施形態の接着剤組成物を基材に塗布し、乾燥させた後の接着剤組成物の層をいう。本実施形態の接着剤組成物を、常法に従い、各種基材に塗布、乾燥すること、及びさらに他の基材を積層することにより、本実施形態の積層体を得ることができる。
[Laminate]
The laminate of the present embodiment is obtained by laminating an adhesive composition on a substrate (a two-layer laminate of a substrate / adhesive layer) or further laminating a substrate (substrate / adhesive layer) / Three-layer laminate of base material). Here, the adhesive layer refers to a layer of the adhesive composition after the adhesive composition of the present embodiment is applied to a substrate and dried. The adhesive composition of the present embodiment can be applied to various substrates and dried according to a conventional method, and further laminated with another substrate to obtain the laminate of the present embodiment.
<基材>
 本実施形態において基材とは、本実施形態の接着剤組成物を塗布、乾燥し、接着剤層を形成できるものであれば特に限定されるものではないが、フィルム状樹脂等の樹脂基材、金属板及び金属箔等の金属基材、紙類などを挙げることができる。
<Substrate>
In the present embodiment, the substrate is not particularly limited as long as the adhesive composition of the present embodiment can be applied and dried to form an adhesive layer. , A metal substrate such as a metal plate and a metal foil, and papers.
 樹脂基材の材質としては、ポリエステル樹脂、ポリアミド樹脂、ポリイミド樹脂、ポリアミドイミド樹脂、液晶ポリマー、ポリフェニレンスルフィド、シンジオタクチックポリスチレン、ポリオレフィン系樹脂、及びフッ素系樹脂等を例示することができる。樹脂基材として好ましくは、フィルム状樹脂(以下、「基材フィルム層」ともいう)である。 材質 Examples of the material of the resin base material include polyester resin, polyamide resin, polyimide resin, polyamideimide resin, liquid crystal polymer, polyphenylene sulfide, syndiotactic polystyrene, polyolefin resin, and fluorine resin. Preferably, the resin substrate is a film-like resin (hereinafter, also referred to as a “substrate film layer”).
 金属基材としては、回路基板に使用可能な任意の従来公知の導電性材料が使用可能である。素材としては、SUS、銅、アルミニウム、鉄、スチール、亜鉛、ニッケル等の各種金属、及びそれぞれの合金、めっき品、亜鉛又はクロム化合物等の他の金属で処理した金属などを例示することができる。金属基材として好ましくは金属箔であり、より好ましくは銅箔である。金属箔の厚さについては特に限定はないが、好ましくは1μm以上であり、より好ましくは3μm以上であり、さらに好ましくは10μm以上である。また、金属箔の厚さは、好ましくは50μm以下であり、より好ましくは30μm以下であり、さらに好ましくは20μm以下である。厚さが薄すぎる場合には、回路の充分な電気的性能が得られにくい場合があり、一方、厚さが厚すぎる場合には回路作製時の加工能率等が低下する場合がある。金属箔は、通常、ロール状の形態で提供されているが、後述するようなプリント配線板を製造する際に使用される金属箔の形態は特に限定されない。リボン状の形態の金属箔を用いる場合、その長さは特に限定されない。また、その幅も特に限定されないが、250~500cm程度であることが好ましい。 As the metal substrate, any conventionally known conductive material that can be used for a circuit board can be used. Examples of the material include various metals such as SUS, copper, aluminum, iron, steel, zinc, and nickel, and respective alloys, plated products, metals treated with other metals such as zinc or chromium compounds, and the like. . The metal substrate is preferably a metal foil, more preferably a copper foil. The thickness of the metal foil is not particularly limited, but is preferably 1 μm or more, more preferably 3 μm or more, and further preferably 10 μm or more. Further, the thickness of the metal foil is preferably 50 μm or less, more preferably 30 μm or less, and further preferably 20 μm or less. If the thickness is too small, it may be difficult to obtain sufficient electrical performance of the circuit, while if the thickness is too large, the processing efficiency or the like during circuit fabrication may be reduced. The metal foil is usually provided in the form of a roll, but the form of the metal foil used when manufacturing a printed wiring board as described below is not particularly limited. When a ribbon-shaped metal foil is used, its length is not particularly limited. The width is not particularly limited, but is preferably about 250 to 500 cm.
 紙類としては、上質紙、クラフト紙、ロール紙、グラシン紙等を例示することができる。また、複合素材として、ガラスエポキシ等を例示することができる。 Examples of papers include high quality paper, kraft paper, roll paper, glassine paper and the like. Further, as the composite material, glass epoxy or the like can be exemplified.
 接着剤組成物との接着力、耐久性の観点から、基材の材質としては、ポリエステル樹脂、ポリアミド樹脂、ポリイミド樹脂、ポリアミドイミド樹脂、液晶ポリマー、ポリフェニレンスルフィド、シンジオタクチックポリスチレン、ポリオレフィン系樹脂、フッ素系樹脂、SUS鋼板、銅箔、アルミ箔、又はガラスエポキシが好ましい。 From the viewpoint of the adhesive force with the adhesive composition and durability, as the material of the base material, polyester resin, polyamide resin, polyimide resin, polyamideimide resin, liquid crystal polymer, polyphenylene sulfide, syndiotactic polystyrene, polyolefin resin, Fluorine-based resin, SUS steel plate, copper foil, aluminum foil, or glass epoxy is preferred.
<接着シート>
 本実施形態の接着シートは、上述した積層体を備えるものであり、例えば、上記積層体と離型基材とを接着剤組成物を介して積層したものである。具体的な構成態様としては、積層体(基材/接着剤層)/離型基材、積層体(基材/接着剤層/基材)/接着剤層/離型基材、又は離型基材/接着剤層/積層体(基材/接着剤層/基材)/接着剤層/離型基材などが挙げられる。離型基材を積層することで接着シートを構成する接着剤層の保護層として機能する。また、離型基材を使用することで、接着シートから離型基材を離型して、さらに別の基材に接着剤層を転写することができる。
<Adhesive sheet>
The adhesive sheet of the present embodiment includes the above-described laminate, and is, for example, a laminate of the above-described laminate and a release substrate via an adhesive composition. As a specific configuration mode, a laminate (substrate / adhesive layer) / release mold, laminate (substrate / adhesive layer / substrate) / adhesive layer / release mold, or release Base material / adhesive layer / laminated body (base material / adhesive layer / base material) / adhesive layer / release base material. By laminating the release base material, it functions as a protective layer of the adhesive layer constituting the adhesive sheet. Further, by using the release substrate, the release substrate can be released from the adhesive sheet, and the adhesive layer can be transferred to another substrate.
 本実施形態の接着シートは、本実施形態の接着剤組成物を、常法に従い、各種積層体に塗布、乾燥することにより得ることができる。また、乾燥後、接着剤層に離型基材を貼付けると、積層体を構成する基材への裏移りを起こすことなく巻き取りが可能になり、操業性に優れるとともに、接着剤層が保護されることから保存性に優れ、使用も容易となる。
また、離型基材に接着剤組成物を塗布、乾燥後、必要に応じて別の離型基材を貼付すれば、接着剤層そのものを他の基材に転写することも可能になる。
The adhesive sheet of the present embodiment can be obtained by applying and drying the adhesive composition of the present embodiment to various laminates according to a conventional method. Also, after drying, when a release substrate is attached to the adhesive layer, it can be wound up without causing set-off to the base material that constitutes the laminate, and excellent operability is achieved, and the adhesive layer is Because it is protected, it has excellent storage properties and is easy to use.
Further, if the adhesive composition is applied to the release substrate and dried, and if necessary, another release substrate is attached, the adhesive layer itself can be transferred to another substrate.
<離型基材>
 離型基材としては、特に限定されるものではないが、例えば、上質紙、クラフト紙、ロール紙、グラシン紙等の紙の両面に、クレー、ポリエチレン、ポリプロピレン等の目止剤の塗布層を設け、さらにその各塗布層の上にシリコーン系、フッ素系、アルキド系の離型剤が塗布されたものが挙げられる。また、ポリエチレン、ポリプロピレン、エチレン-α-オレフィン共重合体、プロピレン-α-オレフィン共重合体等の各種オレフィンフィルム単独、及びポリエチレンテレフタレート等のフィルム上に上記離型剤を塗布したものも挙げられる。離型基材と接着剤層との離型力、シリコーンが電気特性に悪影響を与える等の理由から、上質紙の両面にポリプロピレン目止処理しその上にアルキド系離型剤を用いたもの、又はポリエチレンテレフタレート上にアルキド系離型剤を用いたものが好ましい。
<Release substrate>
The release substrate is not particularly limited, for example, a high-quality paper, kraft paper, roll paper, on both sides of paper such as glassine paper, clay, polyethylene, a coating layer of a filler such as polyethylene and polypropylene. And a silicone-based, fluorine-based, or alkyd-based release agent applied on each of the coating layers. In addition, various olefin films such as polyethylene, polypropylene, ethylene-α-olefin copolymer and propylene-α-olefin copolymer alone, and those obtained by applying the above release agent on a film such as polyethylene terephthalate may also be used. The release force between the release substrate and the adhesive layer, the use of alkyd-based release agents on both sides of high-quality paper and polypropylene for the reason that silicone adversely affects the electrical properties, Alternatively, it is preferable to use an alkyd release agent on polyethylene terephthalate.
 なお、本実施形態において接着剤組成物を基材上にコーティングする方法としては、特に限定されないが、コンマコーター、リバースロールコーター等が挙げられる。もしくは、必要に応じて、プリント配線板の構成材料である圧延銅箔、又はポリイミドフィルムに直接もしくは転写法で接着剤層を設けることもできる。乾燥後の接着剤層の厚さは、必要に応じて、適宜変更されるが、好ましくは5~200μmの範囲である。接着剤層の厚さが5μm未満では、接着強度が不十分となる場合がある。厚さが200μm以上では乾燥が不十分で残留溶剤が多くなる場合があり、プリント配線板製造のプレス時にフクレを生じるおそれがあるという問題点が挙げられる。乾燥条件は特に限定されないが、乾燥後の残留溶剤率は1質量%以下が好ましい。1質量%超では、プリント配線板製造のプレス時に残留溶剤が発泡して、フクレを生じ易いという問題点が挙げられる。 In the present embodiment, the method for coating the adhesive composition on the substrate is not particularly limited, and examples thereof include a comma coater and a reverse roll coater. Alternatively, if necessary, an adhesive layer can be provided directly or by a transfer method on a rolled copper foil or a polyimide film which is a constituent material of a printed wiring board. The thickness of the adhesive layer after drying is appropriately changed as necessary, but is preferably in the range of 5 to 200 μm. If the thickness of the adhesive layer is less than 5 μm, the adhesive strength may be insufficient. If the thickness is 200 μm or more, drying may be insufficient and the residual solvent may increase, and there is a problem that blisters may be generated at the time of pressing for manufacturing a printed wiring board. The drying conditions are not particularly limited, but the residual solvent ratio after drying is preferably 1% by mass or less. If it exceeds 1% by mass, there is a problem that the residual solvent foams during the press for producing a printed wiring board, and blisters are easily generated.
<プリント配線板>
 本実施形態におけるプリント配線板は、導体回路を形成する金属箔と樹脂基材とから形成された積層体を構成要素として含むものである。プリント配線板は、例えば、金属張積層体を用いてサブトラクティブ法等の従来公知の方法により製造することができる。本実施形態におけるプリント配線板は、必要に応じて金属箔によって形成された導体回路を、部分的、或いは全面的にカバーフィルム又はスクリーン印刷インキ等を用いて被覆した、いわゆるフレキシブル回路板(FPC)、フラットケーブル、テープオートメーティッドボンディング(TAB)用の回路板などを総称している。
<Printed wiring board>
The printed wiring board according to the present embodiment includes, as constituent elements, a laminate formed from a metal foil forming a conductive circuit and a resin base material. The printed wiring board can be manufactured by a conventionally known method such as a subtractive method using a metal-clad laminate. The printed wiring board according to the present embodiment is a so-called flexible circuit board (FPC) in which a conductive circuit formed of a metal foil is partially or entirely covered with a cover film or screen printing ink as necessary. , Flat cables, circuit boards for tape automated bonding (TAB), and the like.
 本実施形態のプリント配線板は、プリント配線板として採用され得る任意の積層構成とすることができる。例えば、基材フィルム層、金属箔層、接着剤層、及びカバーフィルム層の4層から構成されるプリント配線板とすることができる。また例えば、基材フィルム層、接着剤層、金属箔層、接着剤層、及びカバーフィルム層の5層から構成されるプリント配線板とすることができる。 プ リ ン ト The printed wiring board of the present embodiment can have any laminated configuration that can be adopted as a printed wiring board. For example, a printed wiring board including four layers of a base film layer, a metal foil layer, an adhesive layer, and a cover film layer can be provided. Further, for example, a printed wiring board including five layers of a base film layer, an adhesive layer, a metal foil layer, an adhesive layer, and a cover film layer can be provided.
 さらに、必要に応じて、上記のプリント配線板を2つもしくは3つ以上積層した構成とすることもできる。 {Circle around (2)} If necessary, two or three or more of the above printed wiring boards may be laminated.
 本実施形態の接着剤組成物は、プリント配線板の各接着剤層に好適に使用することが可能である。特に本実施形態の接着剤組成物を接着剤として使用すると、プリント配線板を構成する従来のポリイミド、ポリエステルフィルム、銅箔だけでなく、LCP等の低極性の樹脂基材と高い接着性を有し、耐はんだリフロー性を得ることができ、接着剤層自身が低誘電特性に優れる。そのため、カバーレイフィルム、積層板、樹脂付き銅箔及びボンディングシートに用いる接着剤組成物として好適である。 接着 The adhesive composition of the present embodiment can be suitably used for each adhesive layer of a printed wiring board. In particular, when the adhesive composition of the present embodiment is used as an adhesive, the adhesive composition has high adhesiveness not only to conventional polyimide, polyester film, and copper foil constituting a printed wiring board but also to a low-polarity resin base material such as LCP. In addition, solder reflow resistance can be obtained, and the adhesive layer itself has excellent low dielectric properties. Therefore, it is suitable as an adhesive composition used for a coverlay film, a laminate, a copper foil with resin, and a bonding sheet.
 本実施形態のプリント配線板において、基材フィルムとしては、従来からプリント配線板の基材として使用されている任意の樹脂フィルムが使用可能である。基材フィルムの樹脂としては、ポリエステル樹脂、ポリアミド樹脂、ポリイミド樹脂、ポリアミドイミド樹脂、液晶ポリマー、ポリフェニレンスルフィド、シンジオタクチックポリスチレン、ポリオレフィン系樹脂、及びフッ素系樹脂等を例示することができる。本実施形態の接着剤組成物は、特に、液晶ポリマー、ポリフェニレンスルフィド、シンジオタクチックポリスチレン、ポリオレフィン系樹脂等の低極性基材に対しても、優れた接着性を有する。 プ リ ン ト In the printed wiring board of the present embodiment, as the base film, any resin film conventionally used as a base material of the printed wiring board can be used. Examples of the resin of the base film include polyester resin, polyamide resin, polyimide resin, polyamideimide resin, liquid crystal polymer, polyphenylene sulfide, syndiotactic polystyrene, polyolefin-based resin, and fluorine-based resin. The adhesive composition of the present embodiment has excellent adhesiveness even to a low-polar substrate such as a liquid crystal polymer, polyphenylene sulfide, syndiotactic polystyrene, and a polyolefin resin.
<カバーフィルム>
 カバーフィルムとしては、プリント配線板用の絶縁フィルムとして従来公知の任意の絶縁フィルムが使用可能である。例えば、ポリイミド、ポリエステル、ポリフェニレンスルフィド、ポリエーテルスルホン、ポリエーテルエーテルケトン、アラミド、ポリカーボネート、ポリアリレート、ポリイミド、ポリアミドイミド、液晶ポリマー、ポリフェニレンスルフィド、シンジオタクチックポリスチレン、ポリオレフィン系樹脂等の各種ポリマーから製造されるフィルムが使用可能である。より好ましくは、ポリイミドフィルム又は液晶ポリマーフィルムである。
<Cover film>
As the cover film, any conventionally known insulating film as an insulating film for a printed wiring board can be used. For example, manufactured from various polymers such as polyimide, polyester, polyphenylene sulfide, polyether sulfone, polyether ether ketone, aramid, polycarbonate, polyarylate, polyimide, polyamide imide, liquid crystal polymer, polyphenylene sulfide, syndiotactic polystyrene, and polyolefin resin. The film to be used is usable. More preferably, it is a polyimide film or a liquid crystal polymer film.
 以下、実施例及び比較例に基づいて本開示をより具体的に説明するが、本開示は以下の実施例に限定されるものではない。 Hereinafter, the present disclosure will be described more specifically based on examples and comparative examples, but the present disclosure is not limited to the following examples.
[物性評価方法]
<重量平均分子量(Mw)>
 重量平均分子量(Mw)は、GPC(ゲルパーミエーションクロマトグラフィー)により測定した。テトラヒドロフラン(THF)にビスマレイミド樹脂を濃度3質量%となるように溶解させたサンプルを、30℃に加温されたカラム(GL-R420(株式会社日立ハイテクフィールディング製)×1本、GL-R430(株式会社日立ハイテクフィールディング製)×1本、GL-R440(株式会社日立ハイテクフィールディング製)×1本)に50μL注入し、展開溶媒としてTHFを用い、流速1.6mL/minの条件で測定を行った。なお、検出器には、L-3350 RI検出器(株式会社日立製作所製)を用い、溶出時間から標準ポリスチレン(東ソー株式会社製)を用いて作製した分子量/溶出時間曲線により重量平均分子量(Mw)を換算した。
[Physical property evaluation method]
<Weight average molecular weight (Mw)>
The weight average molecular weight (Mw) was measured by GPC (gel permeation chromatography). A column prepared by dissolving a bismaleimide resin in tetrahydrofuran (THF) at a concentration of 3% by mass was heated to 30 ° C. (GL-R420 (manufactured by Hitachi High-Tech Fielding Co., Ltd.) × 1, GL-R430). Inject 50 μL into (× 1 bottle of Hitachi High-Tech Fielding Co., Ltd.) and 1 × GL-R440 (× 1 bottle of Hitachi High-Tech Fielding Co., Ltd.), measure at 1.6 mL / min flow rate using THF as a developing solvent. went. In addition, an L-3350 RI detector (manufactured by Hitachi, Ltd.) was used as the detector, and a weight average molecular weight (Mw) was obtained from a molecular weight / elution time curve prepared using standard polystyrene (manufactured by Tosoh Corporation) based on the elution time. ) Was converted.
<相溶性>
 相溶性とは、(A)ビスマレイミド樹脂、(B)エポキシ樹脂、(C)硬化促進剤、及び(D)有機溶剤を配合し、後述する実施例1の条件で攪拌した後の配合物を目視で観察した状態を指す。相溶性が良好な場合、析出物等がなく、基材への塗布等が可能であることを指し、相溶性が悪い場合、析出物等があり、基材への塗布等が困難となることを指す。相溶性が悪いものについては、フィルム化が困難であることから、他の物性評価を行わなかった。
(評価基準)
○:析出物無し(透明)
△:析出物無し(濁り有り)
×:析出物有り
<Compatibility>
The compatibility refers to a composition obtained by mixing (A) a bismaleimide resin, (B) an epoxy resin, (C) a curing accelerator, and (D) an organic solvent, and stirring the mixture under the conditions of Example 1 described below. Refers to the state observed visually. If the compatibility is good, it means that there is no precipitate, etc., and it can be applied to the substrate.If the compatibility is poor, there is a precipitate, etc., which makes it difficult to apply it to the substrate. Point to. For those having poor compatibility, other physical properties were not evaluated because it was difficult to form a film.
(Evaluation criteria)
○: No precipitate (transparent)
△: No precipitate (turbidity)
×: with precipitate
<樹脂フィルムの作製>
 後述する実施例及び比較例で得られた接着剤組成物を、アプリケータを用いて、ピューレックス(登録商標)A31(ポリエステルフィルム、帝人デュポン株式会社製、商品名)の上に乾燥後の厚さが65μmとなるように塗布し、オーブンを用いて130℃、10分間の乾燥処理を行い、樹脂フィルムを作製した。
<Preparation of resin film>
The adhesive composition obtained in Examples and Comparative Examples described below was dried on a Purex (registered trademark) A31 (polyester film, manufactured by Teijin Dupont Co., Ltd., trade name) using an applicator. Was applied to a thickness of 65 μm, and dried at 130 ° C. for 10 minutes using an oven to produce a resin film.
<接着強度>
 ピューレックスA31を剥離した樹脂フィルムと、厚さ0.7mmのガラス板と、厚さ75μmのLCPフィルム(株式会社クラレ製、商品名「ベクスター」)とを、樹脂フィルムが真ん中になるように積層し、熱プレスにて200℃、2MPa、1時間の条件で熱圧着し、ガラス板、樹脂フィルムの硬化物、LCPフィルムがこの順に積層されてなる積層体を得た。得られた積層体のLCPフィルムを剥離することで接着強度を測定した。剥離強度は、90°剥離測定機(株式会社山電製、商品名「RHEONER II CREEP METER RE2-3305B」)を用いて、常温で引張速度5mm/sで測定した。また、剥離時の剥離位置(剥離モード)を観察した。剥離モードは、「界面剥離」よりも「基材破壊」の方が、接着強度が高いことを意味する。
<Adhesive strength>
A resin film from which Purex A31 was peeled off, a glass plate having a thickness of 0.7 mm, and an LCP film having a thickness of 75 μm (trade name “Vexter”, manufactured by Kuraray Co., Ltd.) laminated with the resin film in the middle Then, thermocompression bonding was performed with a hot press at 200 ° C. and 2 MPa for 1 hour to obtain a laminate in which a glass plate, a cured resin film, and an LCP film were laminated in this order. The adhesive strength was measured by peeling the LCP film of the obtained laminate. The peeling strength was measured at a normal temperature at a tensile speed of 5 mm / s using a 90 ° peeling measuring device (trade name “RHEONER II CREEMETER RE2-3305B” manufactured by Yamaden Corporation). Further, a peeling position (peeling mode) at the time of peeling was observed. The peeling mode means that “substrate destruction” has higher adhesive strength than “interfacial peeling”.
<誘電率及び誘電正接>
 ピューレックスA31を剥離した樹脂フィルムと、2枚の銅箔(商品名「F2WS-18」、古河電工株式会社製)とを、銅箔の粗化面が樹脂フィルムと対面するように積層し、熱プレスにて200℃、2MPa、1時間の条件で熱圧着し、銅箔、樹脂フィルムの硬化物、銅箔がこの順に積層されてなる銅箔積層体を得た。得られた銅箔積層体の両面の銅箔をエッチングにより除去し、130℃で30分乾燥させた後、5cm×5cmの試験片を作製し、誘電率測定機(アジレント・テクノロジー社製、商品名「E4980A プレシジョンLCRメータ」)にて周波数1MHzでの誘電率及び誘電正接を測定した。
<Dielectric constant and dielectric loss tangent>
The resin film from which Purex A31 was peeled off and two copper foils (trade name “F2WS-18”, manufactured by Furukawa Electric Co., Ltd.) were laminated so that the roughened surface of the copper foil faced the resin film, Thermocompression bonding was performed by a hot press at 200 ° C. and 2 MPa for 1 hour to obtain a copper foil laminate in which a copper foil, a cured resin film, and a copper foil were laminated in this order. The copper foil on both sides of the obtained copper foil laminate was removed by etching, dried at 130 ° C. for 30 minutes, and then a test piece of 5 cm × 5 cm was prepared. The dielectric constant and the dielectric loss tangent at a frequency of 1 MHz were measured under the name "E4980A Precision LCR Meter").
[ビスマレイミド樹脂の合成]
<合成例1>
 冷却器、窒素導入管、熱伝対、攪拌機を備えた1Lのフラスコ容器に、ピロメリット酸二無水物(株式会社ダイセル製)60.8質量部、メシチレン(東洋合成工業株式会社製)400.4質量部、及びエタノール(和光純薬工業株式会社製)90.7質量部を投入した。投入後、80℃に昇温し、0.5時間保温し、ダイマージアミン(商品名「PRIAMINE1075」、クローダジャパン株式会社製)201.3質量部を滴下した。滴下後、メタンスルホン酸(和光純薬工業株式会社製)4.3質量部を加えた。その後165℃に昇温し、165℃で1時間脱水閉環反応を行い、反応液中の水とエタノールを除去し、中間体のポリイミド樹脂を得た。続いて、得られたポリイミド樹脂を80℃に冷却し、無水マレイン酸(扶桑化学工業株式会社製)27.3質量部を加え、160℃に昇温し、160℃で2時間脱水閉環反応を行い、反応液中の水を除去し、ビスマレイミド樹脂を得た。
[Synthesis of bismaleimide resin]
<Synthesis example 1>
60.8 parts by mass of pyromellitic dianhydride (manufactured by Daicel Co., Ltd.) and mesitylene (manufactured by Toyo Gosei Kogyo Co., Ltd.) were placed in a 1 L flask container equipped with a condenser, a nitrogen inlet tube, a thermocouple, and a stirrer. 4 parts by mass and 90.7 parts by mass of ethanol (manufactured by Wako Pure Chemical Industries, Ltd.) were added. After the introduction, the temperature was raised to 80 ° C., and the temperature was maintained for 0.5 hour, and 201.3 parts by mass of dimer diamine (trade name “PRIAMINE 1075”, manufactured by Crowda Japan Co., Ltd.) was added dropwise. After the dropwise addition, 4.3 parts by mass of methanesulfonic acid (manufactured by Wako Pure Chemical Industries, Ltd.) was added. Thereafter, the temperature was raised to 165 ° C., and a dehydration ring-closing reaction was performed at 165 ° C. for 1 hour to remove water and ethanol in the reaction solution to obtain an intermediate polyimide resin. Subsequently, the obtained polyimide resin was cooled to 80 ° C., 27.3 parts by mass of maleic anhydride (manufactured by Fuso Chemical Industry Co., Ltd.) was added, the temperature was raised to 160 ° C., and a dehydration ring closure reaction was performed at 160 ° C. for 2 hours. Then, water in the reaction solution was removed to obtain a bismaleimide resin.
 得られたビスマレイミド樹脂を分液ロートに入れ、純水1000質量部を投入し、分液ロートを振り混ぜ、静置させた。静置後、水層と有機層が分離した後、有機層のみを回収した。回収した有機層を冷却器、窒素導入管、熱伝対、攪拌機、真空ポンプを備えた1Lのガラス製容器に投入し、88~93℃に昇温し、水を除去した後、150℃に昇温し、大気圧から0.1MPa減圧した状態で1時間溶剤を除去し、(A)成分のビスマレイミド樹脂(A-1)(重量平均分子量16000)を得た。 (4) The obtained bismaleimide resin was put into a separating funnel, 1000 parts by mass of pure water was charged, and the separating funnel was shaken and allowed to stand. After standing, the aqueous layer and the organic layer were separated, and then only the organic layer was recovered. The collected organic layer is poured into a 1-L glass container equipped with a cooler, a nitrogen inlet tube, a thermocouple, a stirrer, and a vacuum pump, heated to 88 to 93 ° C., and water is removed. The temperature was raised and the solvent was removed for 1 hour under reduced pressure of 0.1 MPa from atmospheric pressure to obtain a bismaleimide resin (A-1) (weight average molecular weight of 16,000) as the component (A).
<合成例2>
 テトラカルボン酸二無水物として、ピロメリット酸二無水物の代わりに4,4’-オキシジフタル酸無水物を86.4質量部用いたこと以外は、合成例1と同様にして、(A)成分のビスマレイミド樹脂(A-2)(重量平均分子量17000)を得た。
<Synthesis Example 2>
Component (A) was prepared in the same manner as in Synthesis Example 1, except that 8,4 parts by mass of 4,4′-oxydiphthalic anhydride was used instead of pyromellitic dianhydride as the tetracarboxylic dianhydride. Was obtained (weight average molecular weight 17000).
[実施例1]
 撹拌機を備えた500mlの四つ口フラスコに、合成例1で得られたビスマレイミド樹脂(A-1)を90質量部、エポキシ樹脂(商品名「jER-825」、三菱ケミカル株式会社製)を10質量部、トルエンを100質量部仕込み、3時間撹拌した。得られた溶液に、硬化促進剤(商品名「TBP-3S」、北興化学株式会社製)を2質量部配合し、さらに0.5時間攪拌して、接着剤組成物を得た。各成分の配合量、及び、物性評価結果を表1に示す。なお、表1において、(A)~(D)成分の量は質量部を示す。
[Example 1]
In a 500 ml four-necked flask equipped with a stirrer, 90 parts by mass of the bismaleimide resin (A-1) obtained in Synthesis Example 1 and an epoxy resin (trade name “jER-825”, manufactured by Mitsubishi Chemical Corporation) And 100 parts by mass of toluene, and stirred for 3 hours. To the obtained solution, 2 parts by mass of a curing accelerator (trade name “TBP-3S”, manufactured by Hokuko Chemical Co., Ltd.) was added, and the mixture was further stirred for 0.5 hour to obtain an adhesive composition. Table 1 shows the amounts of the components and the results of evaluation of the physical properties. In Table 1, the amounts of the components (A) to (D) indicate parts by mass.
[実施例2~12、比較例1~13]
 ビスマレイミド樹脂、エポキシ樹脂、又は硬化促進剤の種類及び配合量を、表1又は表2に示す内容に変更したこと以外は実施例1と同様にして、実施例2~12、比較例1~13の接着剤組成物を得た。各成分の配合量、及び、物性評価結果を表1及び表2に示す。なお、表1及び表2において、(A)~(D)成分の量は質量部を示す。また、(A)~(D)成分の詳細は以下の通りである。(B)成分において、(B-1)~(B-2)は一般式(2)を満たすエポキシ樹脂であり、(B-3)~(B-13)は一般式(2)を満たさないエポキシ樹脂である。
[Examples 2 to 12, Comparative Examples 1 to 13]
Examples 2 to 12 and Comparative Examples 1 to 12 were performed in the same manner as in Example 1 except that the kind and the amount of the bismaleimide resin, the epoxy resin, or the curing accelerator were changed to the contents shown in Table 1 or Table 2. Thus, 13 adhesive compositions were obtained. Tables 1 and 2 show the amounts of the components and the results of the physical property evaluation. In Tables 1 and 2, the amounts of the components (A) to (D) indicate parts by mass. Details of the components (A) to (D) are as follows. In the component (B), (B-1) to (B-2) are epoxy resins satisfying the general formula (2), and (B-3) to (B-13) do not satisfy the general formula (2). Epoxy resin.
(A)成分:ビスマレイミド樹脂
(A-1)合成例1のビスマレイミド樹脂(重量平均分子量16000)
(A-2)合成例2のビスマレイミド樹脂(重量平均分子量17000)
Component (A): Bismaleimide resin (A-1) Bismaleimide resin of Synthesis Example 1 (weight average molecular weight 16,000)
(A-2) Bismaleimide resin of Synthesis Example 2 (weight average molecular weight 17000)
(B)成分:エポキシ樹脂
(B-1)ビスフェノールA型エポキシ樹脂:jER-825(三菱ケミカル株式会社製)
(B-2)ビスフェノールF型エポキシ樹脂:YDF-8170C(新日鉄住金化学株式会社製)
(B-3)4,4’-メチレンビス(N,N-ジグリシジルアニリン)(東京化成工業株式会社製)(以下、「MBDGA」と略す)
(B-4)ナフタレン骨格変性多官能型エポキシ樹脂:HP-5000(DIC株式会社製)
(B-5)ナフタレン型エポキシ樹脂:HP-6000(DIC株式会社製)
(B-6)クレゾールノボラック型エポキシ樹脂:N-670(DIC株式会社製)
(B-7)ビフェニルノボラック型エポキシ樹脂:NC-3000H(日本化薬株式会社製)
(B-8)ビスフェノール型柔軟性エポキシ樹脂:EXA-4850-150(DIC株式会社製)
(B-9)ナフタレン型エポキシ樹脂:HP-4710(DIC株式会社製)
(B-10)ナフタレン型エポキシ樹脂:NC-7000L(日本化薬株式会社製)
(B-11)ビスフェノールS型エポキシ樹脂:EXA-1514(DIC株式会社製)(B-12)o-クレゾールノボラック型エポキシ樹脂:YDCN-700-10(新日鉄住金化学株式会社製)
(B-13)トリフェノールメタン型エポキシ樹脂:HPPN-501H(日本化薬株式会社製)
Component (B): epoxy resin (B-1) bisphenol A type epoxy resin: jER-825 (manufactured by Mitsubishi Chemical Corporation)
(B-2) Bisphenol F type epoxy resin: YDF-8170C (manufactured by Nippon Steel & Sumikin Chemical Co., Ltd.)
(B-3) 4,4′-methylenebis (N, N-diglycidylaniline) (manufactured by Tokyo Chemical Industry Co., Ltd.) (hereinafter abbreviated as “MBDGA”)
(B-4) Naphthalene skeleton modified polyfunctional epoxy resin: HP-5000 (manufactured by DIC Corporation)
(B-5) Naphthalene type epoxy resin: HP-6000 (manufactured by DIC Corporation)
(B-6) Cresol novolak type epoxy resin: N-670 (manufactured by DIC Corporation)
(B-7) Biphenyl novolak epoxy resin: NC-3000H (manufactured by Nippon Kayaku Co., Ltd.)
(B-8) Bisphenol-type flexible epoxy resin: EXA-4850-150 (manufactured by DIC Corporation)
(B-9) Naphthalene type epoxy resin: HP-4710 (manufactured by DIC Corporation)
(B-10) Naphthalene type epoxy resin: NC-7000L (manufactured by Nippon Kayaku Co., Ltd.)
(B-11) Bisphenol S type epoxy resin: EXA-1514 (manufactured by DIC Corporation) (B-12) o-cresol novolak type epoxy resin: YDCN-700-10 (manufactured by Nippon Steel & Sumikin Chemical Co., Ltd.)
(B-13) Triphenolmethane epoxy resin: HPPN-501H (manufactured by Nippon Kayaku Co., Ltd.)
(C)成分:硬化促進剤
(C-1)テトラブチルホスホニウム-1,2-シクロへキシルジカルボン酸(カチオン種:アニオン種=1:1):TBP-3S(北興化学株式会社製)
(C-2)1-(2-シアノエチル)-2-フェニルイミダゾール:2PZCN(四国化成株式会社製)
(C-3)1,2-ジメチルイミダゾール:1,2-DMZ(四国化成株式会社製)
(C-4)ジメチルベンジルアミン:DMBA(富士フィルム和光純薬株式会社製)
Component (C): curing accelerator (C-1) tetrabutylphosphonium-1,2-cyclohexyldicarboxylic acid (cation type: anion type = 1: 1): TBP-3S (manufactured by Hokuko Chemical Co., Ltd.)
(C-2) 1- (2-cyanoethyl) -2-phenylimidazole: 2PZCN (manufactured by Shikoku Chemicals Co., Ltd.)
(C-3) 1,2-dimethylimidazole: 1,2-DMZ (manufactured by Shikoku Chemicals Co., Ltd.)
(C-4) Dimethylbenzylamine: DMBA (Fuji Film Wako Pure Chemical Industries, Ltd.)
Figure JPOXMLDOC01-appb-T000010
Figure JPOXMLDOC01-appb-T000010
Figure JPOXMLDOC01-appb-T000011
Figure JPOXMLDOC01-appb-T000011
 表1及び表2において、接着強度「>2.0kN/m」は装置の測定限界を示す。但し、接着強度が「>2.0kN/m」であったものについても、手で引っ張ること等により少なくとも一部を剥離させ、その時の破壊モードを評価した。 に お い て In Tables 1 and 2, the adhesive strength “> 2.0 kN / m” indicates the measurement limit of the device. However, even those having an adhesive strength of “> 2.0 kN / m” were at least partially peeled off by pulling by hand or the like, and the breaking mode at that time was evaluated.
 表1及び表2に示した結果から明らかなように、本開示のビスマレイミド樹脂とエポキシ樹脂と硬化促進剤とを含有する接着剤組成物(実施例)は、LCPと高い接着強度を示すことが確認された。さらに、本開示の接着剤組成物(実施例)は、誘電率及び誘電正接も低く、低誘電特性に優れていることが確認された。 As is clear from the results shown in Tables 1 and 2, the adhesive composition (Example) containing the bismaleimide resin, the epoxy resin, and the curing accelerator of the present disclosure shows high adhesive strength with LCP. Was confirmed. Furthermore, it was confirmed that the adhesive composition (Example) of the present disclosure has low dielectric constant and dielectric loss tangent, and is excellent in low dielectric properties.
 本開示で接着剤組成物がLCPと高い接着強度を示したメカニズムとしては、ビスマレイミド樹脂とエポキシ樹脂の相溶性が関係していると考えている。ビスマレイミド樹脂とエポキシ樹脂の相溶性が良い場合、マレイミド基とエポキシ基が均一に共重合し、ヒドロキシ基が分散することでLCPとヒドロキシ基が相互作用して高い接着強度を示すことができると考えている。反対にビスマレイミド樹脂とエポキシ樹脂の相溶性が悪い場合、ビスマレイミド樹脂とエポキシ樹脂が各々反応し、ミクロ相分離を起こし、ヒドロキシ基が分散せずにヒドロキシ基同士で相互作用してしまい、LCPと相互作用できないため接着強度が低くなると考えている。 で In the present disclosure, it is believed that the mechanism by which the adhesive composition exhibited high adhesive strength with LCP is related to the compatibility between the bismaleimide resin and the epoxy resin. When the compatibility between the bismaleimide resin and the epoxy resin is good, the maleimide group and the epoxy group are uniformly copolymerized, and the hydroxy group is dispersed, so that the LCP and the hydroxy group can interact with each other to exhibit high adhesive strength. thinking. On the other hand, if the compatibility between the bismaleimide resin and the epoxy resin is poor, the bismaleimide resin and the epoxy resin react with each other, causing microphase separation, and the hydroxy groups do not disperse and interact with each other. It is thought that the adhesive strength will be low because of the inability to interact with.
 本開示により、従来のポリイミドより優れた低誘電特性を有するLCP等の低極性樹脂基材と高い接着性を有し、さらに低誘電特性に優れる接着剤組成物、これを用いて接着した積層体及び接着性シートを得ることができる。上記特性により、本開示の接着剤組成物は、フレキシブルプリント配線板用途、特に高周波領域での低誘電特性(低誘電率、低誘電正接)が求められるFPC用途において有用である。 According to the present disclosure, an adhesive composition having high adhesiveness to a low-polar resin base material such as LCP having low dielectric properties superior to conventional polyimide, and further excellent in low dielectric properties, and a laminate bonded using the same And an adhesive sheet. Due to the above characteristics, the adhesive composition of the present disclosure is useful in flexible printed wiring board applications, particularly in FPC applications that require low dielectric properties (low dielectric constant and low dielectric loss tangent) in a high frequency range.

Claims (8)

  1.  (A)下記一般式(1)で表されるビスマレイミド樹脂と、(B)下記一般式(2)で表されるエポキシ樹脂と、(C)硬化促進剤と、を含有する接着剤組成物。
    Figure JPOXMLDOC01-appb-C000001
    [式(1)中、Rはダイマー酸に由来する2価の炭化水素基を示し、Qは置換又は非置換の炭素数1~100の脂肪族基、置換又は非置換の芳香族基、或いは、置換又は非置換のヘテロ芳香族基を示し、nは0~100の整数を示す。]
    Figure JPOXMLDOC01-appb-C000002
    [式(2)中、Rは水素原子又はメチル基を示し、mは0~30の整数を示す。]
    (A) An adhesive composition containing a bismaleimide resin represented by the following general formula (1), (B) an epoxy resin represented by the following general formula (2), and (C) a curing accelerator. .
    Figure JPOXMLDOC01-appb-C000001
    [In the formula (1), R 1 represents a divalent hydrocarbon group derived from dimer acid, Q represents a substituted or unsubstituted aliphatic group having 1 to 100 carbon atoms, a substituted or unsubstituted aromatic group, Alternatively, it represents a substituted or unsubstituted heteroaromatic group, and n represents an integer of 0 to 100. ]
    Figure JPOXMLDOC01-appb-C000002
    [In the formula (2), R 2 represents a hydrogen atom or a methyl group, and m represents an integer of 0 to 30. ]
  2.  前記(C)成分が、ホスフィン化合物、ホスホニウム塩化合物、イミダゾール化合物及びアミン化合物からなる群より選択される少なくとも1種を含有する、請求項1に記載の接着剤組成物。 The adhesive composition according to claim 1, wherein the component (C) contains at least one selected from the group consisting of a phosphine compound, a phosphonium salt compound, an imidazole compound, and an amine compound.
  3.  前記(B)成分の含有量が、前記(A)成分及び前記(B)成分の総量を100質量部として10~40質量部である、請求項1又は2に記載の接着剤組成物。 (3) The adhesive composition according to (1) or (2), wherein the content of the component (B) is 10 to 40 parts by mass based on 100 parts by mass of the total of the components (A) and (B).
  4.  前記(C)成分の含有量が、前記(A)成分及び(B)成分の総量100質量部に対して0.1~5.0質量部である、請求項1~3のいずれか一項に記載の接着剤組成物。 The content according to any one of claims 1 to 3, wherein the content of the component (C) is 0.1 to 5.0 parts by mass based on 100 parts by mass of the total of the components (A) and (B). The adhesive composition according to item 1.
  5.  樹脂基材と、樹脂基材又は金属基材との接着に用いられる、請求項1~4のいずれか一項に記載の接着剤組成物。 (5) The adhesive composition according to any one of (1) to (4), which is used for bonding a resin substrate and a resin substrate or a metal substrate.
  6.  基材と、該基材上に請求項1~5のいずれか一項に記載の接着剤組成物を用いて形成された接着剤層と、を備える積層体。 A laminate comprising a base material and an adhesive layer formed on the base material using the adhesive composition according to any one of claims 1 to 5.
  7.  請求項1~5のいずれか一項に記載の接着剤組成物によって接着された、樹脂基材と、樹脂基材又は金属基材とを備える積層体。 A laminate comprising a resin substrate and a resin or metal substrate bonded by the adhesive composition according to any one of claims 1 to 5.
  8.  請求項6又は7に記載の積層体を備える接着シート。 接着 An adhesive sheet comprising the laminate according to claim 6.
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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013199645A (en) * 2012-02-24 2013-10-03 Arakawa Chem Ind Co Ltd Polyimide-based adhesive composition, cured product, adhesive sheet, laminate, and flexible printed board
JP2016041797A (en) * 2014-08-19 2016-03-31 京セラケミカル株式会社 Resin composition for adhesive, adhesive sheet, coverlay film and flexible wiring board
JP2016196549A (en) * 2015-04-03 2016-11-24 住友ベークライト株式会社 Resin composition for printed wiring board, prepreg, resin substrate, metal clad laminated board, printed wiring board, and semiconductor device
WO2017027482A1 (en) * 2015-08-08 2017-02-16 Designer Molecules, Inc. Anionic curable compositions
JP2017119361A (en) * 2014-12-26 2017-07-06 荒川化学工業株式会社 Copper foil with resin, copper-clad laminate, printed wiring board and multilayer wiring board
JP2019065075A (en) * 2017-09-28 2019-04-25 日立化成株式会社 Thermosetting resin composition and fiber-reinforced prepreg

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013199645A (en) * 2012-02-24 2013-10-03 Arakawa Chem Ind Co Ltd Polyimide-based adhesive composition, cured product, adhesive sheet, laminate, and flexible printed board
JP2016041797A (en) * 2014-08-19 2016-03-31 京セラケミカル株式会社 Resin composition for adhesive, adhesive sheet, coverlay film and flexible wiring board
JP2017119361A (en) * 2014-12-26 2017-07-06 荒川化学工業株式会社 Copper foil with resin, copper-clad laminate, printed wiring board and multilayer wiring board
JP2016196549A (en) * 2015-04-03 2016-11-24 住友ベークライト株式会社 Resin composition for printed wiring board, prepreg, resin substrate, metal clad laminated board, printed wiring board, and semiconductor device
WO2017027482A1 (en) * 2015-08-08 2017-02-16 Designer Molecules, Inc. Anionic curable compositions
JP2019065075A (en) * 2017-09-28 2019-04-25 日立化成株式会社 Thermosetting resin composition and fiber-reinforced prepreg

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