WO2019233063A1 - Four d'oxydation - Google Patents

Four d'oxydation Download PDF

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Publication number
WO2019233063A1
WO2019233063A1 PCT/CN2018/119549 CN2018119549W WO2019233063A1 WO 2019233063 A1 WO2019233063 A1 WO 2019233063A1 CN 2018119549 W CN2018119549 W CN 2018119549W WO 2019233063 A1 WO2019233063 A1 WO 2019233063A1
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WO
WIPO (PCT)
Prior art keywords
furnace
furnace body
air inlet
pipe
area
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PCT/CN2018/119549
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English (en)
Chinese (zh)
Inventor
陈志兵
李旭刚
刘�东
Original Assignee
北京北方华创微电子装备有限公司
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Publication of WO2019233063A1 publication Critical patent/WO2019233063A1/fr

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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00—Furnaces of a kind not covered by any preceding group
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
    • F27B5/04—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated adapted for treating the charge in vacuum or special atmosphere
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere

Definitions

  • the invention relates to the field of semiconductor manufacturing, and in particular, to an oxidation furnace.
  • SiC material has outstanding advantages such as wide band gap, high saturation drift speed, high thermal conductivity, and high critical breakdown electric field. It belongs to the third generation of semiconductor materials and is suitable for preparing high-power, high-frequency, high-voltage, high-temperature, and radiation-resistant electronic devices. Moreover, SiC material is the only wide band gap semiconductor that can directly oxidize and grow SiO 2 films. The most common method is to use high temperature dry or wet oxygen thermal oxidation methods to grow SiO 2 films, and use thermal oxidation methods to obtain SiO 2 films. And the quality of the interface characteristics is the best.
  • FIG. 1 is a sectional view of a conventional oxidation furnace.
  • the oxidation furnace includes an explosion-proof cover 1, an ignition chamber 2, a heater 3, a hydrogen tube 4, an oxygen tube 5, and a temperature sensor 6.
  • the wet oxygen oxidation process usually uses high-purity hydrogen and oxygen to ignite and synthesize water vapor outside the process chamber.
  • the high-purity hydrogen and oxygen enter the ignition chamber 2 through the hydrogen pipe 4 and the oxygen pipe 5, respectively, and the heater 3 Under the heating, the hydrogen reaches the ignition point and burns to generate water vapor.
  • the water vapor enters the process chamber (not shown in the figure) from the ignition bubble outlet 7.
  • the explosion-proof cover 1 is insulated by water to protect external equipment and components.
  • the temperature sensor 6 is used to monitor the combustion temperature in the ignition chamber 2 to ensure that the hydrogen can be reliably burned when it passes into the fire chamber 2.
  • the ignition chamber 2 needs to be separately set to ignite hydrogen, this way of igniting outside the process chamber needs to occupy a large space of the equipment.
  • the ignition chamber 2 transports water vapor into the process chamber in a gaseous state, which requires higher airtightness and heat insulation of the water vapor transmission pipeline, resulting in higher equipment costs.
  • the heat insulation layer of the high-temperature vacuum reactor ie, the process chamber
  • the water vapor transportation distance is long, and the airflow transportation process is unstable.
  • the present invention aims to solve at least one of the technical problems existing in the prior art, and proposes an oxidation furnace, which can save equipment space, reduce equipment costs, and improve the stability of airflow.
  • an oxidation furnace including:
  • a furnace cavity which includes a process area, a heat insulation area, a combustion area, and a heat insulation area divided in sequence from top to bottom;
  • a process boat which is arranged in the process area and is used for carrying a workpiece to be processed
  • An air inlet pipe for conveying a process gas, and an air outlet of the air inlet pipe is located in the combustion zone, and the air inlet of the air inlet pipe extends from the bottom of the furnace cavity;
  • a heat-insulating structure provided in the heat-insulating area, and the heat-insulating structure forming the heat-insulating area to form an air intake channel for conveying the gas in the combustion area to the process area;
  • a thermal insulation structure is disposed in the thermal insulation area and surrounds the outer periphery of the air intake pipe.
  • the intake pipe includes a hydrogen pipe and an oxygen pipe sleeved on the outer periphery of the hydrogen pipe, wherein the hydrogen pipe and the oxygen pipe are respectively used to transport hydrogen and oxygen, so that the hydrogen and Part of the oxygen reacts in the combustion zone to generate water vapor to provide a wet oxygen stream to the process zone.
  • the air outlet of the oxygen pipe is lower than the air outlet of the hydrogen pipe.
  • a stopper is provided at the upper end of the hydrogen tube, the stopper is dome-shaped, and a center of the stopper is provided with a first through hole, and an upper end of the first through hole is used as the outlet. Mouth
  • a diameter of the first through hole is smaller than an inner diameter of the hydrogen tube.
  • the intake pipe further includes a thermocouple protection tube disposed inside the oxygen pipe, and an upper end of the thermocouple protection tube is closed and is located in the combustion zone.
  • the lower end extends from the bottom of the furnace cavity; and, a thermocouple is provided in the thermocouple protective tube, and a detection end of the thermocouple is in contact with an upper end of the thermocouple protective tube for detecting the combustion Zone temperature.
  • the thermal insulation structure includes a plurality of first thermal insulation plates spaced apart in a vertical direction, and an annular channel is formed between an outer peripheral wall of the plurality of first thermal insulation plates and an inner peripheral wall of the furnace cavity. ;
  • a center hole is provided in the center of each of the first heat insulation plates, and the annular channel and the center hole are used as the air inlet channel.
  • the heat insulation structure includes a plurality of second heat insulation plates spaced apart in a vertical direction, and a heat insulation cavity provided in the heat insulation area and located below the second heat insulation plate at the lowest level;
  • the heat preservation cavity is filled with a heat preservation medium.
  • the oxidation furnace further includes: an inner layer hose and an outer layer hose sleeved on the outer periphery of the inner layer hose, wherein,
  • the air outlet of the inner hose is sealedly connected to the air inlet of the air inlet pipe, and the air inlet of the inner hose is used to connect with an air source;
  • a vacuum space is formed between the outer hose and the inner hose.
  • the furnace cavity is composed of an inner furnace body, and an outer furnace body is sleeved on the outer periphery of the inner furnace body;
  • the bottom of the outer furnace body has an opening through which the inner furnace body can rise or fall relative to the outer furnace body.
  • the oxidation furnace further includes: a first flange, the first flange is disposed at a lower end of the inner furnace body;
  • a second through hole is provided in the first flange, and an air inlet of the air inlet pipe extends out through the second through hole; a space is provided between the air inlet pipe and the second through hole
  • the first sealing ring is used to seal the gap between the two.
  • the oxidation furnace further includes: a second flange, the second flange is disposed at a lower end of the outer furnace body, and the second flange is located in the outer furnace body in the outer furnace body When it is in the body, it is in sealing butt joint with the first flange.
  • the inner furnace body has an upper end opening
  • the second flange is provided with an exhaust port communicating with the outside;
  • the exhaust port, the gap, and the upper end opening constitute an exhaust passage communicating with the inside of the inner furnace body.
  • the oxidation furnace provided by the present invention adopts an ignition structure in the furnace, that is, the process area and the combustion area are both located in the furnace cavity, thereby saving equipment space.
  • the heat insulation structure is used to block the high temperature radiation in the process area, and the heat insulation structure can also form an air intake channel in the heat insulation area for the gas in the combustion area to pass through and flow into the process area, thereby achieving the Water vapor transmission eliminates the need for water vapor transmission pipelines, thereby reducing equipment costs.
  • the water vapor transmission distance in the furnace is relatively short, and it is easy to form a stable airflow, which can improve the airflow stability in the process area.
  • Figure 1 is a sectional view of a conventional oxidation furnace
  • FIG. 2 is a cross-sectional view of an oxidizing furnace according to an embodiment of the present invention.
  • FIG. 3 is an enlarged view of an area I in FIG. 2; FIG.
  • FIG. 4 is an enlarged view of a region II in FIG. 2;
  • FIG. 5 is a schematic view of an air flow path of an oxidation furnace according to an embodiment of the present invention.
  • the oxidation furnace provided by the embodiment of the present invention includes a furnace cavity 8, a process boat 9, an air inlet pipe, a heat insulation structure 10 and a heat insulation structure 14.
  • the furnace cavity 8 includes a process area A, a heat insulation area B, a combustion area C, and a heat insulation area D, which are sequentially divided from top to bottom.
  • the process boat 9 is disposed in the process area A and is used to carry the workpiece to be processed.
  • the workpiece to be processed is a SiC wafer.
  • the craft boat 9 includes a bracket, and the bracket is provided with fixing grooves (not shown in the figure) arranged at intervals in the vertical direction, and each fixing groove is used to carry a workpiece to be processed.
  • fixing grooves not shown in the figure
  • the air inlet pipe is used to convey the process gas, and the air outlet of the air inlet pipe is located in the combustion zone C, and the air inlet of the air inlet pipe extends out from the bottom of the furnace cavity.
  • the oxidation furnace is used to perform a wet oxygen oxidation process, and the process is performed by a method of synthesizing water vapor with high-purity hydrogen and oxygen ignition.
  • the intake pipe includes a hydrogen pipe 11 and an oxygen pipe 12 sleeved on the outer periphery of the hydrogen pipe 11, wherein the hydrogen pipe 11 is used for transporting hydrogen; the oxygen pipe 12 is used for transporting oxygen; the hydrogen entering the combustion zone C and part of the oxygen
  • the reaction generates water vapor to provide a wet oxygen stream to process zone A, that is, an oxygen gas stream containing water vapor.
  • the hydrogen tube 11 and the oxygen tube 12 are both quartz tubes, preferably high-purity quartz tubes, to improve high-temperature resistance.
  • the heat insulation structure 10 is disposed in the heat insulation area B and is used to block high temperature radiation in the process area A.
  • the heat-insulating structure 10 forms an air-intake passage in the heat-shielding zone B for the gas in the combustion zone C to flow into the process zone A after passing through.
  • the heat-insulating structure 14 is arranged in the heat-preserving area and surrounds the outer periphery of the above-mentioned air intake pipe, and is used for the functions of heat preservation and heat insulation.
  • the process of forming a wet oxygen flow is specifically: hydrogen and oxygen meet in the combustion zone C, and react to generate water vapor.
  • An oxygen gas flow containing water vapor (that is, a wet oxygen flow) is formed in the insulation zone B through the insulation structure 10
  • the air inlet channel enters the process area A.
  • the ambient temperature in the furnace cavity 8 has a temperature gradient in the vertical direction, that is, the temperature gradually decreases from top to bottom.
  • the ambient temperature in the furnace cavity 8 is gradually heated above the ignition point, that is, the process gas reaches the combustion zone C It is preheated before, which can increase heating efficiency.
  • an appropriate vertical distance between the combustion zone C and the furnace cavity 8 can be designed, so as to achieve the aforementioned preheating effect.
  • the oxidation furnace provided by the embodiment of the present invention adopts an in-furnace ignition structure, that is, the process area A and the combustion area C are both located in the furnace cavity 8, thereby saving equipment space.
  • the thermal insulation structure 10 is used to block high-temperature radiation in the process area A, and the heat insulation structure 10 can also form an air intake channel in the heat insulation area B for the gas in the combustion area C to pass and flow into the process area A Therefore, the water vapor transmission in the furnace is realized, and the water vapor transmission pipeline is omitted, thereby reducing the equipment cost.
  • the water vapor transmission distance in the furnace is relatively short, and it is easy to form a stable airflow, thereby improving the airflow stability in the process area A.
  • the upper end of the hydrogen pipe 11 is provided with a blocking portion 111, which is dome-shaped, and a center of the blocking portion 111 is provided with a first through hole 112, the first through hole
  • the upper end of 112 is used as an air outlet of the hydrogen pipe 11.
  • the diameter of the first through hole 112 is smaller than the inner diameter of the hydrogen tube 11. Since the diameter of the first through hole 112 as the gas outlet of the hydrogen pipe 11 is much smaller than the diameter of the gas outlet 121 of the oxygen pipe 12, this can make the amount of hydrogen entering the combustion zone C much smaller than the amount of oxygen, which is beneficial to the hydrogen combustion.
  • the baffle portion 111 of the hydrogen tube 11 dome-shaped, the smoothness of the air flow in the combustion zone C can be improved, which is beneficial to forming a stable wet oxygen flow.
  • the air outlet 121 of the oxygen pipe 12 is lower than the air outlet of the hydrogen pipe 11, that is, the first through hole 112. In this way, oxygen can enter combustion zone C before hydrogen, and an oxygen atmosphere can be formed, which is beneficial to the combustion of hydrogen.
  • the intake pipe further includes a thermocouple protection tube 13 disposed inside the oxygen pipe 12, as shown in FIG. 3, the upper end of the thermocouple protection tube 13 is closed and located in the combustion zone C.
  • the thermocouple The lower end of the protective tube 13 extends from the bottom of the furnace cavity 7; and, a thermocouple 15 is provided in the thermocouple protective tube 13, and the detection end of the thermocouple 15 is in contact with the upper end of the thermocouple protective tube 13 for detecting the combustion zone C temperature.
  • the detection end of the thermocouple protection tube 13 is lower than the air outlet of the hydrogen tube 11. Since the combustion zone C may have a temperature gradient in the vertical direction, that is, the temperature gradually increases from bottom to top. In this case, because the position of the detection end of the thermocouple protection tube 13 is low, the temperature at the position of the gas outlet of the hydrogen tube 11 must be higher than the temperature of the position of the detection end of the thermocouple protection tube 13, As long as the temperature at the position of the combustion zone C where the detection end is located can meet the requirements, the temperature of the gas outlet of the hydrogen tube 11 must meet the requirements.
  • the heat insulation structure 10 includes a plurality of first heat insulation plates 101 spaced apart in a vertical direction. Since two adjacent first heat insulation plates 101 are spaced apart from each other, heat insulation is performed. The effect is better.
  • the first heat insulation plate 101 is made of quartz material.
  • a vertical distance between two adjacent first heat insulation plates 101 ranges from 2-3 mm. Within this range, the thermal insulation effect is better.
  • annular channel 103 is formed between the outer peripheral wall of the plurality of first heat insulation plates 101 and the inner peripheral wall of the furnace cavity 8 to convey the gas in the combustion zone C to the process zone A.
  • a center hole 102 is provided in the center of each first heat insulation plate 101, and the center holes 102 of the plurality of first heat insulation plates 101 collectively form a central passage, which is also used to transport the gas in the combustion zone C to the process. Area A.
  • both the above-mentioned annular channel 103 and the center hole 102 are used as the above-mentioned intake channel, so that the wet oxygen flow (mainly H 2 O + O 2 ) in the combustion zone C can be simultaneously passed from the above-mentioned annular channel 103 and the center hole.
  • 102 flows into the surrounding area and the central area of the process area A, respectively, so as to increase the air flow into the process area A, and at the same time to improve the uniformity of the air flow distribution in the process area A, thereby improving the process uniformity.
  • the hydrogen pipe 11 and the oxygen pipe 12 respectively deliver hydrogen (H 2 ) and oxygen (O 2 ) to the combustion zone C, and the hydrogen entering the combustion zone C and part of the oxygen react to generate water vapor (H 2 O ), That is, a wet oxygen stream (mainly H 2 O + O 2) is formed.
  • the wet oxygen stream flows into the surrounding area and the central area of the process area A from the annular channel 103 and the central hole 102, respectively.
  • the heat insulation structure 14 includes a plurality of second heat insulation plates 141 spaced apart in the vertical direction, and a heat insulation cavity 142 disposed in the heat insulation area D and located below the second heat insulation plate 141 at the lowest level.
  • the thermal insulation cavity 142 is filled with a thermal insulation medium.
  • the furnace cavity 8 is composed of an inner furnace body 81, and an outer furnace body 82 is sleeved on the outer periphery of the inner furnace body 81; and, the bottom of the outer furnace body 82 has an opening, and the inner furnace body 81 can pass through the The opening is raised or lowered relative to the outer furnace body 82.
  • the inner furnace body 81 can be moved out of the outer furnace body 82 as a whole by lowering the inner furnace body 81.
  • the inner furnace body 81 is raised until the entire inner furnace body 81 is moved into the outer furnace body 82.
  • the outer furnace body 82 can also be raised or lowered according to specific needs.
  • the inner furnace body 81 may be lifted and lowered simultaneously with the outer furnace body 82, or may be fixed while the outer furnace body 82 is lifted.
  • the oxidizing furnace further includes an inner hose 19 and an outer hose 18 sleeved on the outer periphery of the inner hose 19, wherein the air outlet of the inner hose 19 and the inlet
  • the air inlets of the gas pipelines are hermetically connected.
  • a metal surface seal joint (VCR joint) 17 can be used to achieve a sealed connection between the inner hose 19 and the air inlet.
  • the air inlet of the inner hose 19 is used to connect with an air source (not shown in the figure), and the process gas enters the air inlet pipeline through the inner hose 19.
  • a vacuum space is formed between the outer tube 18 and the inner tube 19. In this way, the leakage of the process gas can be monitored at the vacuum space, so that it can play a safety protection role.
  • the outer hose 18 may be installed on the pipeline by using a butt welding flange 16 and the installation position is above the sealed connection between the inner hose 19 and the air inlet to accommodate the connection therein.
  • the intake pipe can be allowed to rise and fall synchronously with the inner furnace body 81.
  • bellows can also be used instead of hoses.
  • the oxidizing furnace further includes a first flange 23 provided at the lower end of the inner furnace body 81. Specifically, the first flange 23 closes the lower end opening of the inner furnace body 81.
  • a second through hole is provided in the first flange 23, and the air inlet of the air inlet pipe extends out through the second through hole; a first seal ring is provided between the air inlet pipe and the second through hole, It is used to seal the gap between the two, so as to ensure that the interior of the inner furnace body 81 is maintained in a vacuum state.
  • the upper diameter of the second through hole is adapted to the outer diameter of the oxygen pipe 12, and a sealing ring 20 is provided between the oxygen pipe 12 and the upper portion of the second through hole, for Seal the gap between the two.
  • the air inlet of the hydrogen pipe 11 is lower than the air inlet of the oxygen pipe 12, and the lower diameter of the second through hole is adapted to the outer diameter of the hydrogen pipe 11 and is between the hydrogen pipe 11 and the lower portion of the second through hole
  • a sealing ring 21 is provided for sealing the gap between the two.
  • the seal ring 20 and the seal ring 21 are both the above-mentioned first seal ring, and the first seal ring is preferably made of a high-temperature resistant material such as fluorine rubber.
  • the oxidizing furnace further includes a second flange 84 disposed at the lower end of the outer furnace body 82, and when the second flange 84 is located in the outer furnace body 82 in the inner furnace body 81, and The first flange 23 is hermetically docked.
  • the inner furnace body 81 has an upper end opening.
  • a gap 83 is provided between the outer peripheral wall of the inner furnace body 81 and the inner peripheral wall of the outer furnace body 82.
  • An exhaust port 841 is provided in the second flange 84 to communicate with the outside.
  • the exhaust port 841, the gap 83, and the upper end opening of the inner furnace body 81 constitute an exhaust passage communicating with the inside of the inner furnace body 81.
  • This exhaust passage is used to exhaust the gas in the process area A. It is easy to understand that the upper end of the inner furnace body 81 is slightly lower than the top of the outer furnace body 82 so that the upper end opening of the inner furnace body 81 can communicate with the gap 83.
  • the oxidation furnace provided by the present invention adopts an in-furnace ignition structure, that is, the process area and the combustion area are both located in the furnace cavity, thereby saving equipment space.
  • the heat insulation structure is used to block the high temperature radiation in the process area, and the heat insulation structure can also form an air intake channel in the heat insulation area for the gas in the combustion area to pass through and flow into the process area, thereby achieving the Water vapor transmission eliminates the need for water vapor transmission pipelines, thereby reducing equipment costs.
  • the water vapor transport distance in the furnace is relatively short, and it is easy to form a stable airflow, which can improve the airflow stability in the process area.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)

Abstract

Four d'oxydation, comprenant : une cavité (8) de four, la cavité (8) de four comprenant une zone de traitement (A), une zone d'isolation thermique (B), une zone de combustion (C) et une zone de conservation de chaleur (D) de haut en bas ; une nacelle de traitement (9) disposée dans la zone de traitement (A) et utilisée pour supporter une pièce à traiter ; une conduite d'entrée de gaz pour transférer un gaz de traitement, une sortie de gaz (121) de la conduite d'entrée de gaz étant située dans la zone de combustion (C), et une entrée de gaz de la conduite d'entrée de gaz s'étendant à l'extérieur depuis le fond de la cavité (8) de four ; une structure d'isolation thermique (10) disposée dans la zone d'isolation thermique (B), la structure d'isolation thermique (10) permettant à la zone d'isolation thermique (B) de former un canal d'entrée de gaz de façon à transférer le gaz dans la zone de combustion (C) vers la zone de traitement (A) ; et une structure de conservation de chaleur (14) disposée dans la zone de conservation de chaleur (D) et entourant la périphérie extérieure de la conduite d'entrée de gaz. Le four d'oxydation peut économiser de l'espace d'équipement, réduire le coût de l'équipement, et améliorer également la stabilité de l'écoulement d'air.
PCT/CN2018/119549 2018-06-08 2018-12-06 Four d'oxydation WO2019233063A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201810589310.XA CN110579105B (zh) 2018-06-08 2018-06-08 氧化炉
CN201810589310.X 2018-06-08

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WO2019233063A1 true WO2019233063A1 (fr) 2019-12-12

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Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111520999B (zh) * 2020-04-14 2022-02-22 北京北方华创微电子装备有限公司 一种立式炉设备

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EP0588479A1 (fr) * 1992-07-31 1994-03-23 Cvd Incorporated Carbure de silicium hautement polissable et à haute conductivité thermique, procédé de préparation et application
CN1470800A (zh) * 2003-06-30 2004-01-28 北京广播学院 提高热氧化均匀度的方法及氧化炉系统
CN201081534Y (zh) * 2007-06-22 2008-07-02 中芯国际集成电路制造(上海)有限公司 一种可避免因抽风不畅而宕机的氧化炉
CN105470168A (zh) * 2015-11-20 2016-04-06 中国电子科技集团公司第四十八研究所 用于高温氧化炉的氢氧合成装置及系统
WO2018048300A2 (fr) * 2016-09-06 2018-03-15 Ac Analytical Controls B.V. Procédé de détection de soufre par chimiluminescence et four

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JPH0369120A (ja) * 1989-08-08 1991-03-25 Nec Yamagata Ltd 高圧酸化炉
JPH10294308A (ja) * 1997-04-21 1998-11-04 Kokusai Electric Co Ltd ウェット酸化炉用の外部燃焼装置
US6884295B2 (en) * 2000-05-29 2005-04-26 Tokyo Electron Limited Method of forming oxynitride film or the like and system for carrying out the same

Patent Citations (5)

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Publication number Priority date Publication date Assignee Title
EP0588479A1 (fr) * 1992-07-31 1994-03-23 Cvd Incorporated Carbure de silicium hautement polissable et à haute conductivité thermique, procédé de préparation et application
CN1470800A (zh) * 2003-06-30 2004-01-28 北京广播学院 提高热氧化均匀度的方法及氧化炉系统
CN201081534Y (zh) * 2007-06-22 2008-07-02 中芯国际集成电路制造(上海)有限公司 一种可避免因抽风不畅而宕机的氧化炉
CN105470168A (zh) * 2015-11-20 2016-04-06 中国电子科技集团公司第四十八研究所 用于高温氧化炉的氢氧合成装置及系统
WO2018048300A2 (fr) * 2016-09-06 2018-03-15 Ac Analytical Controls B.V. Procédé de détection de soufre par chimiluminescence et four

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TW202001173A (zh) 2020-01-01
CN110579105A (zh) 2019-12-17
TWI727233B (zh) 2021-05-11

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