WO2019222909A1 - 一种全息光栅光刻系统及其干涉光路自准直的调节方法 - Google Patents

一种全息光栅光刻系统及其干涉光路自准直的调节方法 Download PDF

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WO2019222909A1
WO2019222909A1 PCT/CN2018/087827 CN2018087827W WO2019222909A1 WO 2019222909 A1 WO2019222909 A1 WO 2019222909A1 CN 2018087827 W CN2018087827 W CN 2018087827W WO 2019222909 A1 WO2019222909 A1 WO 2019222909A1
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Prior art keywords
pinhole filter
photodetector
lithography system
volume bragg
collimating lens
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PCT/CN2018/087827
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English (en)
French (fr)
Inventor
邹文龙
李朝明
吴建宏
陈新荣
蔡志坚
刘全
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Suzhou University
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Suzhou University
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Priority to PCT/CN2018/087827 priority Critical patent/WO2019222909A1/zh
Priority to CN201880004942.3A priority patent/CN111065968B/zh
Priority to US16/430,606 priority patent/US10838361B2/en
Publication of WO2019222909A1 publication Critical patent/WO2019222909A1/zh
Anticipated expiration legal-status Critical
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0402—Recording geometries or arrangements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/0005—Adaptation of holography to specific applications
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70158—Diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H1/024—Hologram nature or properties
    • G03H1/0248—Volume holograms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0486—Improving or monitoring the quality of the record, e.g. by compensating distortions, aberrations
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/0005—Adaptation of holography to specific applications
    • G03H2001/0033—Adaptation of holography to specific applications in hologrammetry for measuring or analysing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0402—Recording geometries or arrangements
    • G03H2001/0439—Recording geometries or arrangements for recording Holographic Optical Element [HOE]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0486—Improving or monitoring the quality of the record, e.g. by compensating distortions, aberrations
    • G03H2001/0489—Improving or monitoring the quality of the record, e.g. by compensating distortions, aberrations by using phase stabilized beam
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0486—Improving or monitoring the quality of the record, e.g. by compensating distortions, aberrations
    • G03H2001/0491—Improving or monitoring the quality of the record, e.g. by compensating distortions, aberrations by monitoring the hologram formation, e.g. via a feed-back loop
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2222/00—Light sources or light beam properties
    • G03H2222/10—Spectral composition
    • G03H2222/12—Single or narrow bandwidth source, e.g. laser, light emitting diode [LED]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2223/00—Optical components
    • G03H2223/23—Diffractive element
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2223/00—Optical components
    • G03H2223/24—Reflector; Mirror
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2223/00—Optical components
    • G03H2223/50—Particular location or purpose of optical element
    • G03H2223/52—Filtering the object information

Definitions

  • the invention belongs to the field of information optics and relates to a lithography system and a method for adjusting the optical path self-collimation.
  • Planar parallel equally spaced fringe holographic grating is an important diffractive optical element, which is widely used in spectrometers, optical communications, optical metrology, and high-power laser systems.
  • This type of grating also imposes strict requirements on the parallelism of grating stripes.
  • the poor parallelism of recording light directly affects the wave aberration of the grating. Therefore, the self-collimation of the parallel light of the recording holographic grating is better.
  • the optical device of the collimating optical path is generally collimated by using an aspheric lens or an off-axis parabolic mirror to obtain parallel light.
  • Common holographic optical path collimation detection methods include Moire fringe method and standard reference grating method.
  • Moire fringe method As shown in Figure 2, first use the autocollimation method to return the parallel light to the pinhole filter. According to prior knowledge, the returned spot diameter is about 5mm, and the pinhole is considered to be at the front focus of the lens. According to the traditional holographic exposure and development, the produced grating substrate is rotated 180 degrees and placed in the original light path, and the moire fringe period is adjusted to the order of centimeters, and the moire fringe is observed. If the moire fringe is found to be bowl-shaped, Bending means that the pinhole is out of focus. Adjust the front and back positions of the pinhole until the Moire fringes are horizontal. Record the amount of horizontal adjustment displacement and return to half of the adjustment.
  • Quasi-standard reference grating method Put the standard grating on the bracket with exposure, as shown in Figure 2, first use the auto-collimation method to return the parallel light to the pinhole filter. According to prior knowledge, the diameter of the returned spot is about 5mm, it is considered that the pinhole is located at the front focal point of the lens and produces parallel light. Observe the moire fringes of the standard reference grating, and adjust the moire fringes to the order of centimeters. Focus, adjust the forward and backward positions of the pinhole until the Moire fringes are horizontal.
  • a holographic grating lithography system is used for making holographic gratings with parallel equally spaced stripes.
  • the holographic grating lithography system includes a coherent light source, a beam splitter, a first reflector, and a second reflector.
  • the light emitted by the coherent light source is divided into a transmitted light path and a reflected light path after passing through the beam splitter; a first reflector, a first pinhole filter, and a first collimating lens are sequentially placed along the reflected light path along the light propagation direction; the transmitted light path is sequentially Place a second reflector, a second pinhole filter, and a second collimating lens; the light after the reflected light path passes through the first collimating lens is used as the first exposure beam, and the light after the transmission light path passes through the second collimating lens is used as the second The exposure beam; the first pinhole filter is placed at the object focus of the first collimator lens; the second pinhole filter is placed at the object focus of the second collimator lens;
  • the front is close to the end of the coherent light source, and the light propagation direction is rear; the first volume Bragg grating is placed behind the first collimating lens, the aperture of the first volume Bragg grating is smaller than that of the first collimating lens, and the first exposure beam
  • the incident angle to the first volume Bragg grating is equal to the Bragg angle of the first volume Bragg grating.
  • the first photodetector is placed on the -1 order transmission diffracted light path after the first exposure beam is incident on the first volume Bragg grating; Measure the diffraction efficiency of its -1 order transmitted diffraction light;
  • a second volume Bragg grating is placed behind the second collimating lens, the aperture of the second volume Bragg grating is smaller than the aperture of the second collimating lens, and the incident angle of the second exposure beam to the second volume Bragg grating is equal to the second volume The Bragg angle of the Bragg grating.
  • the second electrical detector is placed on the -1 order transmission diffraction light path after the second exposure beam is incident on the second volume Bragg grating; it is used to measure the diffraction efficiency of the -1 order transmission diffraction light.
  • a preferred scheme is also provided: a first diaphragm is provided between the first reflector and the first pinhole filter; and a second reflector and the second pinhole filter are provided A second diaphragm is also provided.
  • the collimating lens can be a plano-convex aspheric collimating lens, which can correct spherical aberration and obtain high-quality parallel light.
  • the first pinhole filter is installed on the first PZT translation stage, and the second pinhole filter is installed on the second PZT translation stage; the test value of the first photodetector is fed back to the corresponding first PZT translation stage in real time.
  • the first PZT translation stage drives the first pinhole filter to move along the optical axis direction to the position where the test value of the first photodetector is at the maximum;
  • the test value of the second photodetector is fed back to the corresponding second PZT translation stage in real time.
  • the second PZT translation stage drives the second pinhole filter to move along the optical axis to The position where the test value of the second photodetector is at the maximum.
  • the maximum reading of the photodetector described in the above solution should be understood as the maximum value of the diffraction efficiency of the volume Bragg grating-1 order transmission diffraction light when the photodetector actually moves back and forth along the optical axis.
  • the -1 order diffraction efficiency of the volume Bragg grating is the largest; Once the angle of the incident light deviates by a small amount from the Bragg angle, the -1 order diffraction efficiency of the volume Bragg decreases rapidly. When the deviation angle exceeds a certain range ( ⁇ 0.01 °), the diffraction efficiency is reduced to half of the peak of the diffraction efficiency; when the beam When the light is parallel light, the -1st-order diffraction efficiency of the volume Bragg grating reaches a peak value, and the reading value of the i-th photodetector is the maximum; when the first exposure beam is divergent or convergent, most of the incident light will deviate from the volume Bragg.
  • a certain range ⁇ 0.01 °
  • the volume Bragg grating and the electric detector are removed, and the first exposure beam and the second exposure beam interfere with each other to produce a parallel equal interval.
  • Interference fringes can be obtained by performing photolithography on the holographic recording dry plate to be exposed with the interference fringes to obtain parallel equally spaced holographic gratings.
  • a holographic grating lithography system based on the above-mentioned holographic grating lithography system is a method for adjusting interference optical path self-collimation.
  • the first pinhole filter is moved back and forth along the optical axis, and the reading of the photodetector is observed in real time.
  • fix the first pinhole filter and keep the constant distance between the first pinhole filter and the first collimator lens move the second pinhole filter back and forth along the optical axis, and observe the photoelectric in real time
  • the reading of the detector when the reading of the photodetector is the largest, fix the second pinhole filter and keep the distance between the second pinhole filter and the second collimator lens constant.
  • the first pinhole filter is installed on the first PZT translation stage, and the second pinhole filter is installed on the second PZT translation stage;
  • the test value of the first photodetector is fed back to the corresponding first real-time PZT translation stage, when the test value of the first photodetector changes, the first PZT translation stage drives the first pinhole filter to move along the optical axis direction to the maximum position of the test value of the first photodetector;
  • the second photoelectric The test value of the detector is fed back to the corresponding second PZT translation stage in real time.
  • the second PZT translation stage drives the second pinhole filter to move to the second photoelectric direction along the optical axis. The position where the test value of the detector is the largest.
  • FIG. 1 is a schematic diagram of a lithography system for making parallel equally-spaced fringe holographic gratings
  • FIG. 2 is a schematic diagram of rough adjustment of an auto-collimation optical path
  • FIG. 3 is a schematic diagram of fine adjustment of an auto-collimation optical path
  • 1 is a coherent light source
  • 2 is a beam splitter
  • 3 is a first mirror
  • 4 is a second mirror
  • 5 is a first diaphragm
  • 6 is a second diaphragm
  • 7 is a first pinhole filter.
  • 8 is a second pinhole filter
  • 9 is a first collimating lens
  • 10 is a second collimating lens
  • 11 is a holographic recording dry plate to be exposed
  • 12 is a flat mirror
  • 13 is a first volume Bragg grating
  • 14 Is a first photodetector
  • 15 is a second photodetector
  • 16 is a second volume Bragg grating.
  • Embodiment 1 A holographic grating lithography system, as shown in FIG. 1: A holographic grating lithography system, as shown in FIG. 1: The holographic grating lithography system is used to make parallel holographic gratings with uniformly spaced stripes.
  • the holographic grating lithography system includes a coherent light source 1, a beam splitter 2, a first reflector 3, a second reflector 4, a first pinhole filter 7, a second pinhole filter 8, and a first collimating lens. 9.
  • the light emitted by the coherent light source is divided into a transmitted light path and a reflected light path after passing through the beam splitter; a first reflector, a first pinhole filter, and a first collimating lens are sequentially placed along the reflected light path along the light propagation direction; the transmitted light path is sequentially Place a second reflector, a second pinhole filter, and a second collimating lens; the light after the reflected light path passes through the first collimating lens is used as the first exposure beam, and the light after the transmission light path passes through the second collimating lens is used as the second The exposure beam; the first pinhole filter is placed at the object focus of the first collimator lens; the second pinhole filter is placed at the object focus of the second collimator lens;
  • the front is close to the end of the coherent light source, and the light propagation direction is rear; the first volume Bragg grating is placed behind the first collimating lens, the aperture of the first volume Bragg grating is smaller than that of the first collimating lens, and the first exposure beam
  • the incident angle to the first volume Bragg grating is equal to the Bragg angle of the first volume Bragg grating.
  • the first photodetector is placed on the -1 order transmission diffracted light path after the first exposure beam is incident on the first volume Bragg grating; Measure the diffraction efficiency of its -1 order transmitted diffraction light;
  • a second volume Bragg grating is placed behind the second collimating lens, the aperture of the second volume Bragg grating is smaller than the aperture of the second collimating lens, and the incident angle of the second exposure beam to the second volume Bragg grating is equal to the second volume The Bragg angle of the Bragg grating.
  • the second electrical detector is placed on the -1 order transmission diffraction light path after the second exposure beam is incident on the second volume Bragg grating; it is used to measure the diffraction efficiency of the -1 order transmission diffraction light.
  • Coarse self-collimating beam adjustment Insert the plane mirror 12 in the direction of the first optical axis after the first collimating lens. As shown in Figure 2, adjust the position of the first pinhole filter along the optical axis so that the first exposure beam is flat. The light reflected by the reflector passes through the first pinhole filter;
  • the position of the second pinhole filter is adjusted along the optical axis, so that the second exposure beam is reflected by the plane mirror and the beam passes through the second pinhole filter.
  • Fine-tuning the self-collimating beam As shown in Figure 3, move the first pinhole filter back and forth along the optical axis to observe the reading of the first body photodetector in real time; when the reading of the first body photodetector is the largest, Fixing the first pinhole filter and keeping a constant distance between the first pinhole filter and the first collimating lens;
  • a preferred solution is that a first diaphragm 5 is further provided between the first reflecting mirror 3 and the first pinhole filter 7; and a second diaphragm 6 is provided between the second reflecting mirror 4 and the second pinhole filter 8.
  • the stray light is further filtered by 6 the first diaphragm 5 and the second diaphragm 6.
  • Embodiment 2 A holographic grating lithography system, based on Embodiment 1, respectively installing a first pinhole filter on a first PZT translation stage and a second pinhole filter on a second PZT translation stage; The test value of the first photodetector is fed back to the corresponding first PZT translation stage in real time. When the test value of the first photodetector changes, the first PZT translation stage drives the first pinhole filter to move along the optical axis to The maximum position of the test value of the first photodetector;
  • the test value of the second photodetector is fed back to the corresponding second PZT translation stage in real time.
  • the second PZT translation stage drives the second pinhole filter to move along the optical axis to The position where the test value of the second photodetector is at the maximum.
  • Embodiment 3 A method for adjusting interference optical path self-collimation of a holographic grating lithography system, using the holographic grating lithography system described in Example 1, moving a first pinhole filter back and forth along an optical axis, and real-time observation of photoelectricity The reading of the detector; when the reading of the photodetector is the largest, fix the first pinhole filter and keep the constant distance between the first pinhole filter and the first collimating lens;
  • the technical effect brought by the use of the technical solution of the present invention is that using the volume Bragg grating-1 order transmission diffraction efficiency as a criterion for judging parallel light can accurately determine the distance between the pinhole filter and the collimating lens, and accurately The small hole of the pinhole filter is placed on the object-side focal point of the collimator lens to achieve the collimation of the interference light path.
  • this method helps to realize the real-time monitoring of the parallelism of the exposure beam.
  • the locking of parallel light improves the shooting quality of holographic gratings with parallel equally spaced stripes.

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  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
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  • Diffracting Gratings Or Hologram Optical Elements (AREA)
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Abstract

公开了一种全息光栅光刻系统及其干涉光路自准直的调节方法，属于信息光学领域，为解决制作平行等间距条纹全息光栅时曝光光束平行度差的技术问题。全息光栅光刻系统中，在准直透镜（9,10）的后方放置体布拉格光栅（13,16），曝光光束入射至体布拉格光栅（13,16）的入射角等于所述体布拉格光栅（13,16）的布拉格角，在曝光光束入射至体布拉格光栅（13,16）后的-1级透射衍射光路上放置光电探测器（14,15）。全息光栅光刻系统干涉光路自准直的调节方法包括沿着光轴前后移动针孔滤波器（7,8），实时观察光电探测器（14,15）的读数，当光电探测器（14,15）的读数最大时，固定针孔滤波器（7,8）并且保持第一针孔滤波器（7）与第一准直透镜（9）间距恒定。利用体布拉格光栅来检测自准直光的平行度，代替传统的莫尔条纹调节方法，操作简单，具有很强的实用价值。

Description

一种全息光栅光刻系统及其干涉光路自准直的调节方法 技术领域
本发明属于信息光学领域，涉及一种光刻系统及其光路自准直的调节方法。
背景技术
平面平行等间距条纹全息光栅是一种重要的衍射光学元件，广泛应用于光谱仪、光通信、光学计量、强激光系统等。该类光栅对光栅条纹的平行性也提出了苛刻的要求，记录光的平行性差，直接影响到光栅的波像差。因此，记录全息光栅的平行光的自准直性要好。准直光路的光学器件一般用非球面透镜或离轴抛物面镜来自准直，获得平行光。常见的全息光路准直性检测方法有莫尔条纹法和标准参考光栅法。莫尔条纹法：如附图2所示，先用自准直法，将平行光再返回针孔滤波器，根据先验知识，返回的光斑直径约5mm，认为针孔位于透镜的前焦点上，产生平行光；按照传统的全息曝光和显影，将制作的光栅基板旋转180度置于原光路中，调节莫尔条纹周期到厘米量级，观察莫尔条纹，若发现莫尔条纹呈碗状弯曲，则说明针孔离焦，调节针孔的前后位置，直至莫尔条纹成水平状态，记录水平调节的位移量，然后返回调节量的一半，此时针孔位于准直透镜的前焦面上，该方法需要制作检测光栅，容易受到环境的影响，时效性差。准标参考光栅法：将标准光栅置于带曝光支架上，如附图2所示，先用自准直法，将平行光再返回针孔滤波器，根据先验知识，返回的光斑直径约5mm，认为针孔位于透镜的前焦点上，产生平行光，观察标准参考光栅的莫尔条纹，调节莫尔条纹周期到厘米量级，若发现莫尔条纹呈碗状弯曲，则说明针孔离焦，调节针孔的前后位置，直至莫尔条纹成水平状态，此时说明针孔位于准直透镜的前焦面上，该方法需要标准参考光栅，标准光栅制作十分复杂，需要用干涉仪反复检测，直至制备出低像差的标准光栅。
发明内容
为解决制作平行等间距条纹全息光栅时曝光光束平行度差的技术问题，本发明技术方案如下：
一种全息光栅光刻系统，所述的全息光栅光刻系统用于制作平行等间距条纹的全息光栅；该全息光栅光刻系统包括相干光源、分束器、第一反射镜，第二反射镜，第一针孔滤波器，第二针孔滤波器，第一准直透镜，第二准直透镜；第一体布拉格光栅、第二体布拉格光栅、第一光电探测器、第二光电探测器；
相干光源发出的光经过分束器后被分成透射光路和反射光路；沿着光传播方向反射光路上依次放置第一反射镜、第一针孔滤波器、第一准直透镜；透射光路上依次放置第二反射镜、第二针孔滤波器、第二准直透镜；反射光路经过第一准直透镜后的光作为第一曝光光束，透 射光路经过第二准直透镜后的光作为第二曝光光束；第一针孔滤波器放置于第一准直透镜的物方焦点处；第二针孔滤波器放置于第二准直透镜的物方焦点处；
以靠近相干光源端为前，光传播方向为后；第一准直透镜的后方放置第一体布拉格光栅，所述的第一体布拉格光栅口径小于第一准直透镜口径，且第一曝光光束入射至第一体布拉格光栅的入射角等于第一体布拉格光栅的布拉格角，第一光电探测器放置在第一曝光光束入射至第一体布拉格光栅后的-1级透射衍射光路上；用于测量其-1级透射衍光的衍射效率；
第二准直透镜的后方放置第二体布拉格光栅，所述的第二体布拉格光栅口径小于第二准直透镜口径，且第二曝光光束入射至第二体布拉格光栅的入射角等于第二体布拉格光栅的布拉格角，第二电探测器放置在第二曝光光束入射至第二体布拉格光栅后的-1级透射衍射光路上；用于测量其-1级透射衍光的衍射效率。
为了便于控制全息光栅的周期，优选方案：所述的第一曝光光束与第二曝光光束关于待曝光全息记录干版法线方向对称排布，并且满足2dsinθ＝λ，其中d为待制作全息光栅的周期，λ为相干光源波长，θ为第一曝光光束与第二曝光光束夹角的一半。
为了过滤光路中杂散光，获得更干净的干涉条纹优选方案：第一反射镜与第一针孔滤波器之间还设置有第一光阑；第二反射镜与第二针孔滤波器之间还设置有第二光阑。
所述的准直透镜可以选用平凸非球面准直透镜，可以矫正球差，获得高质量平行光。
第一针孔滤波器安装在第一PZT平移台上，第二针孔滤波器安装在第二PZT平移台上；第一光电探测器的测试数值实时反馈至对应的第一PZT平移台，当第一光电探测器的测试数值发生变化时，第一PZT平移台驱动第一针孔滤波器沿光轴方向移动至第一光电探测器的测试数值最大位置处；
第二光电探测器的测试数值实时反馈至对应的第二PZT平移台，当第二光电探测器的测试数值发生变化时，第二PZT平移台驱动第二针孔滤波器沿光轴方向移动至第二光电探测器的测试数值最大位置处。
上述方案中所述的光电探测器的读数最大时应理解为针孔滤波器沿着光轴来回移动时，光电探测器实际探测到体布拉格光栅-1级透射衍射光衍射效率的最大值。
上述技术方案用于调整干涉光路自准直的原理为：当第一曝光光束的光轴与体布拉格光栅的外法线的夹角满足2d 0θ bsin＝λ c时，其中d 0为体布拉格光栅的光栅周期，θ b为入射光与体布拉格光栅外法线的夹角(即体布拉格光栅的布拉格角)，λ c为入射光的波长，体布拉格光栅的-1级衍射效率最大；入射光的角度一旦偏离布拉格角一个微小量，体布拉格的-1级衍射效率即迅速下降，当偏离角度超出一定范围时(±0.01°)，衍射效率就降低为衍射效率峰值的 一半；当光束为平行光时，体布拉格光栅的-1级衍射效率达到峰值，此时第i光电探测器的读数最大值；当第一曝光光束是发散光或者会聚光时，大部分入射光将偏离体布拉格光栅的布拉格角，-1级衍射光衍射效率急剧下降；具体调节方法是：将第一针孔滤波器沿着光轴前后扫描，实时观察光电探测器的读数，当发现光电探测器的读数达到最大值时，立即停止扫描，此时第一针孔滤波器准确的放置在了第一准直透镜的物方焦点上，第一曝光光束被准直为平行光；按照同样方法第二曝光光束也被准直为平行光，自准直光束调节完毕；调整完毕后移除体布拉格光栅与电探测器，第一曝光光束与第二曝光光束干涉产生平行等间距干涉条纹，用该干涉条纹对待曝光全息记录干版进行光刻即可获得平行等间距条纹的全息光栅。
基于上述一种全息光栅光刻系统的一种全息光栅光刻系统干涉光路自准直的调节方法，将第一针孔滤波器沿着光轴前后移动，实时观察光电探测器的读数；当光电探测器的读数最大时，固定第一针孔滤波器并且保持第一针孔滤波器与第一准直透镜间距恒定；将第二针孔滤波器沿着光轴前后移动，实时观察所述光电探测器的读数；当光电探测器的读数最大时，固定第二针孔滤波器并且保持第二针孔滤波器与第二准直透镜间距恒定。
优选技术方案是：第一针孔滤波器安装在第一PZT平移台上，第二针孔滤波器安装在第二PZT平移台上；第一光电探测器的测试数值实时反馈至对应的第一PZT平移台，当第一光电探测器的测试数值发生变化时，第一PZT平移台驱动第一针孔滤波器沿光轴方向移动至第一光电探测器的测试数值最大位置处；第二光电探测器的测试数值实时反馈至对应的第二PZT平移台，当第二光电探测器的测试数值发生变化时，第二PZT平移台驱动第二针孔滤波器沿光轴方向移动至第二光电探测器的测试数值最大位置处。
附图说明
图1为制作平行等间距条纹全息光栅的光刻系统示意图；
图2为自准直光路粗调示意图；
图3为自准直光路精调示意图；
其中：1为相干光源，2为分束器，3为第一反射镜，4为第二反射镜，5为第一光阑，6为第二光阑，7为第一针孔滤光波器，8为第二针孔滤波器，9为第一准直透镜，10为第二准直透镜，11为待曝光全息记录干版，12为平面反射镜，13为第一体布拉格光栅，14为第一光电探测器，15为第二光电探测器，16为第二体布拉格光栅。
具体实施方式
下面结合附图及实施例对本发明作进一步描述：
实施例一：一种全息光栅光刻系统，如图1所示：一种全息光栅光刻系统，如图1所 示：所述的全息光栅光刻系统用于制作平行等间距条纹的全息光栅；该全息光栅光刻系统包括相干光源1、分束器2、第一反射镜3，第二反射镜4，第一针孔滤波器7，第二针孔滤波器8，第一准直透镜9，第二准直透镜10；第一体布拉格光栅13、第二体布拉格光栅16、第一光电探测器14、第二光电探测器15；
相干光源发出的光经过分束器后被分成透射光路和反射光路；沿着光传播方向反射光路上依次放置第一反射镜、第一针孔滤波器、第一准直透镜；透射光路上依次放置第二反射镜、第二针孔滤波器、第二准直透镜；反射光路经过第一准直透镜后的光作为第一曝光光束，透射光路经过第二准直透镜后的光作为第二曝光光束；第一针孔滤波器放置于第一准直透镜的物方焦点处；第二针孔滤波器放置于第二准直透镜的物方焦点处；
其特征在于：
以靠近相干光源端为前，光传播方向为后；第一准直透镜的后方放置第一体布拉格光栅，所述的第一体布拉格光栅口径小于第一准直透镜口径，且第一曝光光束入射至第一体布拉格光栅的入射角等于第一体布拉格光栅的布拉格角，第一光电探测器放置在第一曝光光束入射至第一体布拉格光栅后的-1级透射衍射光路上；用于测量其-1级透射衍光的衍射效率；
第二准直透镜的后方放置第二体布拉格光栅，所述的第二体布拉格光栅口径小于第二准直透镜口径，且第二曝光光束入射至第二体布拉格光栅的入射角等于第二体布拉格光栅的布拉格角，第二电探测器放置在第二曝光光束入射至第二体布拉格光栅后的-1级透射衍射光路上；用于测量其-1级透射衍光的衍射效率。
自准直调节步骤如下：
自准直光束粗调：先在第一准直透镜后垂直光轴方向插入平面反射镜12，如图2所示，沿光轴调整第一针孔滤波器位置，使第一曝光光束被平面反射镜反射回光束通过第一针孔滤波器；
将所述的平面反射镜垂直光轴方向插入第一准直透镜后，沿光轴调整第二针孔滤波器位置，使第二曝光光束被平面反射镜反射回光束通过第二针孔滤波器；
自准直光束细调：如图3所示，将第一针孔滤波器沿着光轴前后移动，实时观察第一体光电探测器的读数；当第一体光电探测器的读数最大时，固定第一针孔滤波器并且保持第一针孔滤波器与第一准直透镜间距恒定；
将第二针孔滤波器沿着光轴前后移动，实时观察所述第二光电探测器的读数；当第二光电探测器的读数最大时，固定第二针孔滤波器并且保持第二针孔滤波器与第二准直透镜间距恒。
优选方案为：第一反射镜3与第一针孔滤波器7之间还设置第一光阑5；第二反射镜4与第二针孔滤波器8之间设置第二光阑6。通过6第一光阑5和第二光阑6进一步过滤杂散光。
实施例二：一种全息光栅光刻系统，在实施例一基础上分别将第一针孔滤波器安装在第一PZT平移台上，第二针孔滤波器安装在第二PZT平移台上；第一光电探测器的测试数值实时反馈至对应的第一PZT平移台，当第一光电探测器的测试数值发生变化时，第一PZT平移台驱动第一针孔滤波器沿光轴方向移动至第一光电探测器的测试数值最大位置处；
第二光电探测器的测试数值实时反馈至对应的第二PZT平移台，当第二光电探测器的测试数值发生变化时，第二PZT平移台驱动第二针孔滤波器沿光轴方向移动至第二光电探测器的测试数值最大位置处。
实施例三：一种全息光栅光刻系统干涉光路自准直的调节方法，使用实施例一所述的全息光栅光刻系统，将第一针孔滤波器沿着光轴前后移动，实时观察光电探测器的读数；当光电探测器的读数最大时，固定第一针孔滤波器并且保持第一针孔滤波器与第一准直透镜间距恒定；
将第二针孔滤波器沿着光轴前后移动，实时观察所述光电探测器的读数；当光电探测器的读数最大时，固定第二针孔滤波器并且保持第二针孔滤波器与第二准直透镜间距恒定。
本发明技术方案的使用带来的技术效果是：使用体布拉格光栅-1级透射衍射效率作为平行光的判断标准可以较为精确的确定针孔滤波器与准直透镜之间的距离，准确的将针孔滤波器的小孔放置在准直透镜的物方焦点上，从而实现干涉光路的准直；此外该方法有助于实现对曝光光束平行性的实时监控，配合PZT平移台还可以实现对平行光的锁定，从而提高了平行等间距条纹的全息光栅的拍摄质量。
本技术方案未详细说明部分属于本领域公知技术。

Claims (8)

  1. 一种全息光栅光刻系统，所述的全息光栅光刻系统用于制作平行等间距条纹的全息光栅；该全息光栅光刻系统包括相干光源、分束器、第一反射镜，第二反射镜，第一针孔滤波器，第二针孔滤波器，第一准直透镜，第二准直透镜；第一体布拉格光栅、第二体布拉格光栅、第一光电探测器、第二光电探测器；
    相干光源发出的光经过分束器后被分成透射光路和反射光路；沿着光传播方向反射光路上依次放置第一反射镜、第一针孔滤波器、第一准直透镜；透射光路上依次放置第二反射镜、第二针孔滤波器、第二准直透镜；反射光路经过第一准直透镜后的光作为第一曝光光束，透射光路经过第二准直透镜后的光作为第二曝光光束；第一针孔滤波器放置于第一准直透镜的物方焦点处；第二针孔滤波器放置于第二准直透镜的物方焦点处；
    其特征在于：
    以靠近相干光源端为前，光传播方向为后；第一准直透镜的后方放置第一体布拉格光栅，所述的第一体布拉格光栅口径小于第一准直透镜口径，且第一曝光光束入射至第一体布拉格光栅的入射角等于第一体布拉格光栅的布拉格角，第一光电探测器放置在第一曝光光束入射至第一体布拉格光栅后的-1级透射衍射光路上；用于测量其-1级透射衍光的衍射效率；
    第二准直透镜的后方放置第二体布拉格光栅，所述的第二体布拉格光栅口径小于第二准直透镜口径，且第二曝光光束入射至第二体布拉格光栅的入射角等于第二体布拉格光栅的布拉格角，第二电探测器放置在第二曝光光束入射至第二体布拉格光栅后的-1级透射衍射光路上；用于测量其-1级透射衍光的衍射效率。
  2. 根据权利要求1所述的一种全息光栅光刻系统，其特征在于：所述的第一准直透镜与第二准直透镜为平凸非球面准直透镜。
  3. 根据权利要求1所述的一种全息光栅光刻系统，其特征在于：所述的第一曝光光束与第二曝光光束关于待曝光全息记录干版法线方向对称排布，并且满足2dsinθ＝λ，其中d为待制作全息光栅的周期，λ为相干光源波长，θ为第一曝光光束与第二曝光光束夹角的一半。
  4. 根据权利要求1所述的一种全息光栅光刻系统，其特征在于：第一反射镜与第一针孔滤波器之间还设置有第一光阑；第二反射镜与第二针孔滤波器之间还设置有第二光阑。
  5. 根据权利要求1-4之一所述的一种全息光栅光刻系统，其特征在于：
    第一针孔滤波器安装在第一PZT平移台上，第二针孔滤波器安装在第二PZT平移台上；第一光电探测器的测试数值实时反馈至对应的第一PZT平移台，当第一光电探测器的测试数值发生变化时，第一PZT平移台驱动第一针孔滤波器沿光轴方向移动至第一光电探测器的测试数值最大位置处；
    第二光电探测器的测试数值实时反馈至对应的第二PZT平移台，当第二光电探测器的测试数值发生变化时，第二PZT平移台驱动第二针孔滤波器沿光轴方向移动至第二光电探测器的测试数值最大位置处。
  6. 一种全息光栅光刻系统干涉光路自准直的调节方法，其特征在于：所述的全息光栅光刻系统为权利要求1-4之一所述的一种全息光栅光刻系统；
    将第一针孔滤波器沿着光轴前后移动，实时观察光电探测器的读数；当光电探测器的读数最大时，固定第一针孔滤波器并且保持第一针孔滤波器与第一准直透镜间距恒定；
    将第二针孔滤波器沿着光轴前后移动，实时观察所述光电探测器的读数；当光电探测器的读数最大时，固定第二针孔滤波器并且保持第二针孔滤波器与第二准直透镜间距恒定。
  7. 根据权利要求6所述的全息光栅光刻系统干涉光路自准直的调节方法，其特征在于：使用一块平面反射镜辅助装调，辅助装调完成后再用体布拉格光栅进行装调；
    所述的平面反射镜辅助装调步骤为：
    先在第一准直透镜后垂直光轴方向插入平面反射镜，沿光轴调整第一针孔滤波器位置，使第一曝光光束被平面反射镜反射回光束通过第一针孔滤波器；
    将所述的平面反射镜垂直光轴方向插入第一准直透镜后，沿光轴调整第二针孔滤波器位置，使第二曝光光束被平面反射镜反射回光束通过第二针孔滤波器。
  8. 一种全息光栅光刻系统干涉光路自准直的调节方法，其特征在于：所述的全息光栅光刻系统为权利要求5所述的全息光栅光刻系统；
    将第一针孔滤波器沿着光轴前后移动，实时观察光电探测器的读数；当光电探测器的读数最大时，固定第一针孔滤波器并且保持第一针孔滤波器与第一准直透镜间距恒定；
    将第二针孔滤波器沿着光轴前后移动，实时观察所述光电探测器的读数；当光电探测器的读数最大时，固定第二针孔滤波器并且保持第二针孔滤波器与第二准直透镜间距恒定。
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