WO2019213880A1 - Panneau tactile delo, son procédé de fabrication, et dispositif tactile - Google Patents

Panneau tactile delo, son procédé de fabrication, et dispositif tactile Download PDF

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Publication number
WO2019213880A1
WO2019213880A1 PCT/CN2018/086221 CN2018086221W WO2019213880A1 WO 2019213880 A1 WO2019213880 A1 WO 2019213880A1 CN 2018086221 W CN2018086221 W CN 2018086221W WO 2019213880 A1 WO2019213880 A1 WO 2019213880A1
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Prior art keywords
layer
electrode
touch panel
display area
oled touch
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PCT/CN2018/086221
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English (en)
Chinese (zh)
Inventor
林源城
苏伟盛
施文杰
Original Assignee
深圳市柔宇科技有限公司
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Priority to CN201880093841.8A priority Critical patent/CN112449727A/zh
Priority to PCT/CN2018/086221 priority patent/WO2019213880A1/fr
Publication of WO2019213880A1 publication Critical patent/WO2019213880A1/fr

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/40—OLEDs integrated with touch screens
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/805—Electrodes
    • H10K59/8052—Cathodes
    • H10K59/80521—Cathodes characterised by their shape
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
    • H10K77/10—Substrates, e.g. flexible substrates
    • H10K77/111—Flexible substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/123—Connection of the pixel electrodes to the thin film transistors [TFT]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/87—Passivation; Containers; Encapsulations
    • H10K59/873—Encapsulations
    • H10K59/8731—Encapsulations multilayered coatings having a repetitive structure, e.g. having multiple organic-inorganic bilayers

Definitions

  • the present invention relates to the field of touch technologies, and in particular, to an OLED touch panel, an OLED touch panel manufacturing method, and a touch device.
  • touch screens are widely used in mobile phones, digital cameras, media players, navigation systems, gaming devices and displays.
  • the organic light emitting diode display technology has the advantages of self-luminous, wide viewing angle, high contrast, low power consumption, and extremely high reaction speed.
  • the touch layer integration is performed by using an optical adhesive on the display film, but the external display device is thick.
  • the OLED touch panel has a display area and a non-display area
  • the OLED touch panel includes a light emitting layer, a cathode layer and a first electrode
  • the light emitting layer is disposed on the display a cathode layer disposed in the display area and the non-display area
  • the cathode layer is configured to provide a cathode voltage for the light emitting layer
  • the first electrode is disposed in the display area and the non-display a region, in the display region, the first electrode does not overlap with a cathode of the cathode layer
  • a first insulating layer is disposed between the cathode layer and the first electrode in the non-display region
  • the first insulating layer is used for electrically isolating the cathode layer and the first electrode, wherein the first electrode serves as a driving electrode or a sensing electrode of the OLED touch panel.
  • the OLED touch panel of the present invention has a display area and a non-display area, including a light-emitting layer, a cathode layer and a first electrode, the light-emitting layer is disposed in the display area, and the cathode layer is disposed in the display area and the a non-display area, the cathode layer is configured to provide a cathode voltage for the light-emitting layer, the first electrode is disposed in the display area and the non-display area, and in the display area, the first electrode is disposed at a cathode layer, and the first electrode does not overlap with the cathode.
  • a first insulating layer is disposed between the cathode layer and the first electrode, and the first insulating layer is used for an electrical isolation The cathode layer and the first electrode, wherein the first electrode serves as a driving electrode or a sensing electrode of the OLED touch panel.
  • the first electrode is disposed on the cathode layer, and in the non-display area, the cathode layer and the first electrode are stacked, thereby reducing the thickness of the overall OLED touch panel and helping to save non-display The space of the area, thereby achieving a narrow bezel design of the thinner thickness OLED touch panel, while the first insulating layer electrically isolates the cathode layer and the first electrode to prevent interference between the lines.
  • the present invention also provides a touch device including the touch panel as described above.
  • the OLED touch panel has a display area and a non-display area.
  • the OLED touch panel preparation method includes:
  • the cathode layer is disposed in the display area and the non-display area, and the cathode layer is configured to provide a cathode voltage for the light emitting layer;
  • first electrode Forming a first electrode on a surface of the first insulating layer away from the cathode layer, the first electrode is disposed in the display area and the non-display area, and in the display area, the first electrode and the The cathode of the cathode layer is not overlapped, and the first insulating layer is used for electrically isolating the cathode layer and the first electrode, wherein the first electrode serves as a driving electrode or a sensing electrode of the OLED touch panel .
  • FIG. 1 is a schematic structural diagram of an OLED touch panel according to Embodiment 1 of the present invention.
  • 1(a) to 1(d) are schematic views showing the structure and shape of a cathode layer in the present invention.
  • FIG. 1(e) is a top plan view of an OLED touch panel according to Embodiment 1 of the present invention.
  • Figure 1 (f) is an enlarged view of a region B in Figure 1 (e).
  • Figure 1 (g) is a schematic view of a laminated structure of Figure 1 (f).
  • Fig. 1(h) is a schematic view showing another laminated structure of Fig. 1(f).
  • FIG. 2 is a schematic structural diagram of an OLED touch panel according to Embodiment 2 of the present invention.
  • FIGS. 2(a) to 2(c) are schematic views showing the arrangement of the first electrode and the second electrode in the present invention.
  • FIG. 3 is a schematic structural diagram of an OLED touch panel according to Embodiment 3 of the present invention.
  • FIG. 4 is a schematic structural diagram of an encapsulation layer of an OLED touch panel according to Embodiment 3 of the present invention.
  • FIG. 5 is a schematic structural diagram of an OLED touch panel according to Embodiment 4 of the present invention.
  • FIG. 6 is a schematic structural diagram of an encapsulation layer of an OLED touch panel according to Embodiment 4 of the present invention.
  • FIG. 7 is a schematic structural diagram of another encapsulation layer of an OLED touch panel according to Embodiment 4 of the present invention.
  • FIG. 8 is a schematic structural diagram of an OLED touch panel according to Embodiment 5 of the present invention.
  • Fig. 9 is a structural schematic view showing the connection of an anode layer and a drain in the fifth embodiment of the present invention.
  • FIG. 10 is a diagram of a method for fabricating an OLED touch panel according to a first embodiment of the present invention.
  • FIG. 11 is a schematic structural diagram corresponding to step S100 of the method for fabricating an OLED touch panel according to Embodiment 1 of the present invention.
  • FIG. 12 is a schematic structural diagram corresponding to step S200 of the method for fabricating an OLED touch panel according to Embodiment 1 of the present invention.
  • FIG. 13 is a schematic structural diagram corresponding to step S300 of the method for fabricating an OLED touch panel according to Embodiment 1 of the present invention.
  • FIG. 14 is a schematic structural diagram corresponding to step S400 of the method for fabricating an OLED touch panel according to Embodiment 1 of the present invention.
  • FIG. 15 is a schematic structural diagram corresponding to step S500 of the method for fabricating an OLED touch panel according to Embodiment 1 of the present invention.
  • FIG. 16 is a schematic structural diagram corresponding to step S600 of the method for fabricating an OLED touch panel according to Embodiment 1 of the present invention.
  • FIG. 17 is a schematic structural diagram corresponding to step S700 of the method for fabricating an OLED touch panel according to Embodiment 1 of the present invention.
  • FIG. 18 is a diagram of a method for fabricating an OLED touch panel according to a second embodiment of the present invention.
  • FIG. 19 is a diagram of a method for fabricating an OLED touch panel according to a third embodiment of the present invention.
  • FIG. 20 is a schematic structural diagram corresponding to step S900 of the method for fabricating an OLED touch panel according to Embodiment 3 of the present invention.
  • 21 is a method of fabricating an OLED touch panel according to Embodiment 4 of the present invention.
  • FIG. 22 is a schematic structural diagram corresponding to step S910 of the method for fabricating an OLED touch panel according to Embodiment 4 of the present invention.
  • FIG. 23 is a schematic structural diagram of a touch device according to a preferred embodiment of the present invention.
  • FIG. 1 is a schematic structural diagram of an OLED touch panel according to Embodiment 1 of the present invention.
  • the OLED touch panel 10 has a display area A1 and a non-display area A2.
  • the OLED touch panel 10 includes a light emitting layer 100, a cathode layer 200, and a first electrode 310.
  • the cathode layer 200 is disposed in the display area A1 and the non-display area A2, and the cathode layer 200 is configured to provide a cathode voltage for the light emitting layer 100, the first electrode 310 Provided in the display area A1 and the non-display area A2, the first electrode 310 and the cathode 210 of the cathode layer 200 do not overlap in the display area A1, in the non-display area A2, A first insulating layer 400 is disposed between the cathode layer 200 and the first electrode 310, and the first insulating layer 400 is configured to electrically isolate the cathode layer 200 and the first electrode 310, wherein the first An electrode 310 serves as a driving electrode or a sensing electrode of the OLED touch panel 10 .
  • the first electrode 310 corresponds to a gap after the patterning process of the cathode 210, the cathode 210 covers the pixel point setting, and the first electrode 310 avoids the pixel point. Settings.
  • FIG. 1(a), FIG. 1(b), FIG. 1(c) and FIG. 1(d) are schematic diagrams showing the structure and shape of the cathode layer in the present invention.
  • the shape of the cathode layer 200 may be a patterned block shape, a diamond shape, a straight strip shape or a curved strip shape, or may be other shapes.
  • the cathode layer 200 may be made of a low-resistance material such as copper (Cu), molybdenum (MO), or aluminum (AL). And in an embodiment, the cathode layer 200 may be made of a mixture of copper (Cu) and molybdenum (MO).
  • the cathode layer 200 is made of a low-resistance material, which helps to reduce heat generation and prevent signal interference, and can improve touch precision.
  • the first electrode 310 can be made of magnesium (Mg), silver (Ag), copper (Cu), molybdenum (MO) or aluminum (AL).
  • the first electrode 310 may be made of a mixture of magnesium (Mg) and silver (Ag) or a mixture of copper (Cu) and molybdenum (MO).
  • the display area A1 is generally used to display information such as images or characters.
  • the display area A1 includes a pixel area and a non-pixel area, and the pixel area is an area covered with pixel points, and a general pixel includes an area of a red pixel (R), a green pixel (G) or a blue pixel (B), and a non-pixel area It is an area that avoids pixels.
  • the cathode layer 200 includes a plurality of cathodes distributed in a matrix, and the cathode 210 covers pixel points of the display area A1.
  • the pixel is the light emitting region of the light emitting layer 100.
  • the first electrode 310 avoids a pixel point setting of the display area A1.
  • the first electrode 310 has a strip structure.
  • the first insulating layer 400 may be silicon nitride or aluminum oxide or the like.
  • FIG. 1(e) is a top view of an OLED touch panel according to Embodiment 1 of the present invention.
  • Figure 1 (f) is an enlarged view of a region B in Figure 1 (e).
  • Figure 1 (g) is a schematic view of a laminated structure of Figure 1 (f).
  • the non-display area A2 all the first electrodes 310 are stacked, and a first insulating layer 400 is disposed between the first electrode 310 and the cathode layer 200.
  • a second insulating layer 410 is disposed between the two adjacent first electrodes 310, and the first insulating layer 400 is configured to form electrical isolation between the first electrode 310 and the cathode layer 200.
  • the two insulating layers 410 are used to electrically isolate two adjacent first electrodes 310. Since all of the first electrodes 310 are stacked, it contributes to the narrow bezel design of the OLED touch panel 10.
  • FIG. 1(h) is another schematic diagram of the laminated structure of FIG. 1(f).
  • a first insulating layer 400 is disposed between the first electrode 310 and the cathode layer 200, and two adjacent first electrodes 310 are spaced apart from each other.
  • Cathode 210 Since the first electrode 310 and the cathode layer 200 are stacked, it helps to realize a narrow bezel design of the OLED touch panel.
  • the insulating layer 400 can be disposed only in the non-display area A2, and the insulating layer 400 is not disposed in the display area A1. That is to say, the insulating layer 400 has a hollow frame shape at this time.
  • the insulating layer 400 of such a structure is advantageous in reducing the thickness of the display area A1.
  • the OLED touch panel of the present invention has a display area and a non-display area, including a light-emitting layer, a cathode layer and a first electrode, the light-emitting layer is disposed in the display area, and the cathode layer is disposed in the display area and the a non-display area, the cathode layer is for providing a cathode voltage for the light-emitting layer, the first electrode is disposed in the display area and the non-display area, in the non-display area, the cathode layer and A first insulating layer is disposed between the first electrodes, the first insulating layer is configured to electrically isolate the cathode layer and the first electrode, wherein the first electrode serves as the OLED touch panel Drive electrode or sensing electrode. Since the cathode layer and the first electrode are stacked in a non-display area, which helps save space in the non-display area, the technical solution of the invention contributes to the narrow bezel design of the OLED touch
  • FIG. 2 is a schematic structural diagram of an OLED touch panel according to Embodiment 2 of the present invention.
  • the OLED touch panel 10 further includes a second electrode 320 disposed in the display area A1.
  • the OLED touch panel 10 further includes a second electrode 320 disposed in the display area A1.
  • the second electrode 320 is disposed on a side of the first electrode 310 away from the cathode layer 200, and a projection of the second electrode 320 on the cathode layer 200 and the first electrode 310 are in the The projections on the cathode layer 200 are arranged to intersect each other.
  • the second electrode 320 is a sensing electrode; when the first electrode 310 is the OLED When the sensing electrode of the touch panel 10 is used, the second electrode 320 is a driving electrode.
  • the second electrode 320 avoids the pixel point setting of the display area A1.
  • FIG. 2(a), FIG. 2(b) and FIG. 2(c), FIG. 2(a) to FIG. 2(c) are the arrangement of the first electrode and the second electrode in the present invention. Schematic.
  • the second electrode 320 and the projection of the first electrode 310 on the cathode layer 200 intersect to form a touch electrode.
  • the cross structure is formed to facilitate connection and form a touch layer.
  • FIG. 3 is a schematic structural diagram of an OLED touch panel according to Embodiment 3 of the present invention.
  • the OLED touch panel 10 further includes an encapsulation layer 500 disposed on the first electrode 310 and the OLED touch panel 10 in the third embodiment.
  • the second electrodes 320 are electrically isolated from the first electrode 310 and the second electrode 320.
  • the encapsulation layer 500 includes a first inorganic layer 510, an organic layer 520, and a second inorganic layer 530, which are sequentially stacked, the first inorganic layer 510 covering the first electrode. 310.
  • the second electrode 320 is disposed on a side of the second inorganic layer 530 away from the organic layer 520. Please refer to FIG. 4.
  • FIG. 5 is a schematic structural diagram of an OLED touch panel according to Embodiment 4 of the present invention.
  • the fourth embodiment has the same structure as the second embodiment, except that in the fourth embodiment, the OLED touch panel further includes an encapsulation layer 500, and the second electrode 320 is disposed in the encapsulation layer 500.
  • the first encapsulation layer 510 is formed first, then the second electrode 320 is formed, and then the second encapsulation layer 520 is formed.
  • the first encapsulation layer 510 is located at the first electrode 310 and the second between the electrodes 320, the first electrode 310 and the second electrode 320 are electrically isolated, and the second encapsulation layer 520 covers the second electrode 320 to protect the second electrode 320 while reducing the thickness of the entire panel.
  • the encapsulation layer 500 includes a first inorganic layer 510, an organic layer 520, and a second inorganic layer 530, and the second electrode 320 is disposed on the first inorganic layer. Between 510 and the organic layer 520, please refer to FIG. 6.
  • the first inorganic layer 510 is formed first, then the second electrode 320 is formed on the surface of the first inorganic layer 510, and then the second electrode 320 is covered to form the organic layer 520. Then, the organic layer 520 is covered to form the second inorganic layer 530. In this way, the first inorganic layer 510 can electrically isolate the first electrode 310 and the second electrode 320, and the organic layer 520 and the second inorganic layer 530 can protect the second electrode 320.
  • the encapsulation layer 500 includes a first inorganic layer 510, an organic layer 520, and a second inorganic layer 530, and the second electrode 320 is disposed on the organic layer 520 and the Please refer to FIG. 7 between the second inorganic layers 530.
  • the first inorganic layer 510 is formed first, then the first inorganic layer 510 is covered to form the organic layer 520, and then the second electrode 320 is formed on the surface of the organic layer 520 away from the first inorganic layer 510, and then the second electrode 320 is formed.
  • the second inorganic layer 530 such that the first inorganic layer 510 and the organic layer 520 can electrically isolate the first electrode 310 and the second electrode 320, and the second inorganic layer 530 can protect the second electrode 320.
  • FIG. 8 is a schematic structural diagram of an OLED touch panel according to Embodiment 5 of the present invention.
  • the OLED touch panel 10 further includes a flexible substrate 600, a thin film transistor layer 700, and an anode layer 800.
  • the thin film transistor layer is substantially the same as the first embodiment. 700, the anode layer 800, the light emitting layer 100, the cathode layer 200, and the first electrode 310 are disposed on one side of the flexible substrate 600, the thin film transistor layer 700, the anode layer 800, The light emitting layer 100 is sequentially stacked on the display area A1, and the thin film transistor layer 700 is disposed adjacent to the flexible substrate 600 compared to the anode layer 800.
  • the thin film transistor layer 700 includes a plurality of layers distributed in a matrix. a thin transistor comprising a drain 711 (see FIG. 9), the anode layer 800 comprising a plurality of anodes 810 distributed in a matrix, the anode 810 and the drain 711 being electrically connected for receiving an anode The voltage, the anode voltage, and the cathode voltage cooperate to cause the light emitting layer 100 to emit light.
  • the anode receives the anode voltage, generates a cavity
  • the cathode receives the cathode voltage, generates electrons
  • holes and electrons are transported into the light-emitting layer 100, and are combined in the light-emitting layer 100 to cause the light-emitting layer 100 to emit light.
  • FIG. 9 is a schematic structural diagram of an anode layer and a drain connection according to Embodiment 5 of the present invention.
  • a thin film transistor layer 700 is formed on the surface of the flexible substrate 600.
  • the thin film transistor layer 700 includes a plurality of thin film transistors distributed in a matrix.
  • the thin film transistor layer 700 further includes a channel layer 1000, a first isolation layer 1100, a gate 712, and a first Two isolation layers 1200 and a source 713.
  • the channel layer 1000 is disposed on the flexible substrate 600, the first isolation layer 1100 covers the channel layer 1000, the gate 712 is disposed on the first isolation layer 1100, and the gate The pole 712 is disposed corresponding to the channel layer 1000, and the second isolation layer 1200 covers the gate 712.
  • the source 713 and the drain 711 are both disposed on the second isolation layer 1200, and the source 713 and the drain 711 are spaced apart from each other, and the source 713 is opened in the
  • the via holes on the first isolation layer 1100 and the second isolation layer 1200 are electrically connected to one end of the channel layer 1000, and the drain 711 is opened through the first insulation 1100 and the second isolation layer A via hole on 1200 is electrically connected to the other end of the channel layer 1000.
  • An anode layer 800 is formed on a surface of the drain 711, the anode layer 800 including a plurality of anodes 810 distributed in a matrix, the anode 810 and the drain 711 being electrically connected for receiving an anode voltage, the anode voltage and The cathode voltage is matched to cause the light emitting layer 100 to emit light.
  • the OLED touch panel of the present invention has a display area and a non-display area, including a light-emitting layer, a cathode layer and a first electrode, the light-emitting layer is disposed in the display area, and the cathode layer is disposed in the display area and the a non-display area, the cathode layer is configured to provide a cathode voltage for the light-emitting layer, the first electrode is disposed in the display area and the non-display area, and in the display area, the first electrode is disposed at a cathode layer, and the first electrode does not overlap with the cathode.
  • a first insulating layer is disposed between the cathode layer and the first electrode, and the first insulating layer is used for an electrical isolation The cathode layer and the first electrode, wherein the first electrode serves as a driving electrode or a sensing electrode of the OLED touch panel.
  • the first electrode is disposed on the cathode layer, and in the non-display area, the cathode layer and the first electrode are stacked, thereby reducing the thickness of the overall OLED touch panel and helping to save non-display The space of the area, thereby achieving a narrow bezel design of the thinner OLED touch panel, while the first insulating layer electrically isolates the cathode layer and the first electrode to prevent interference between the lines.
  • FIG. 10 is a diagram of a method for fabricating an OLED touch panel according to Embodiment 1 of the present invention.
  • the OLED touch panel has a display area and a non-display area.
  • the OLED touch panel preparation method includes, but is not limited to, steps S100, S200, S300, S400, S500, S600, and S700, with respect to steps S100, S200, S300, and S400.
  • S500, S600, and S700 are as follows.
  • a flexible substrate 600 is provided, see FIG.
  • the flexible substrate 600 is made of a polyimide film (PI) or a polyester film and a copper foil.
  • PI polyimide film
  • Polyimide has been widely used due to its high temperature soldering, high strength, high modulus, and flame retardant properties.
  • Polyimide as a polymer material has outstanding thermal stability, good radiation and chemical stability and excellent mechanical properties.
  • the method for detecting whether the flexible substrate 600 meets the quality standard may be infrared detection, and the flexible substrate 600 is detected by using an infrared detector, and the detected data is received. If the detected data has a local position, If the data is obviously small, it can be considered that there is a crack or a void in the area. It is considered that the flexible substrate does not meet the quality standard. Therefore, it is necessary to consider replacing the flexible substrate to ensure the quality of the prepared touch panel.
  • the flexible substrate 600 is provided for sampling inspection.
  • the flexible substrate 600 is sampled.
  • the sampling method of the flexible substrate 600 may be: extracting a preset number of the flexible substrates 600 in a preset period, measuring a preset number of the flexible substrates 600, and determining a size of the preset number of flexible substrates 600. Whether it is within the allowed value range. If the size of the flexible substrate 600 is within the allowable value range, the next step is performed. If the size of the flexible substrate 600 exceeds the allowable value range, the preparation parameters and the like of the preparation tool to the flexible substrate 600 are adjusted to obtain the qualified flexible substrate 600.
  • S200 forming a thin film transistor layer 700 covering the flexible substrate 600, wherein the thin film transistor layer 700 includes a drain 711, please refer to FIG.
  • a thin film transistor layer 700 is formed on a surface of the flexible substrate 600.
  • the thin film transistor layer 700 includes a plurality of thin transistors distributed in a matrix.
  • the thin film transistor layer 700 further includes a channel layer 1000, a first isolation layer 1100, and a gate. 712, second isolation layer 1200 and source 713.
  • the channel layer 1000 is disposed on the flexible substrate 600, the first isolation layer 1100 covers the channel layer 1000, the gate 712 is disposed on the first isolation layer 1100, and the gate
  • the pole 712 is disposed corresponding to the channel layer 1000, and the second isolation layer 1200 covers the gate 712.
  • the source 713 and the drain 711 are both disposed on the second isolation layer 1200, and the source 713 and the drain 711 are spaced apart from each other, and the source 713 is opened in the
  • the via holes on the first isolation layer 1100 and the second isolation layer 1200 are electrically connected to one end of the channel layer 1000, and the drain 711 is opened through the first insulation 1100 and the second isolation layer A via hole on 1200 is electrically connected to the other end of the channel layer 1000.
  • the anode layer 800 is disposed on a surface of the drain 711, and the anode layer 800 includes a plurality of anodes 810 distributed in a matrix, and the anode 810 and the drain 711 are electrically connected.
  • the manner in which the anode layer 800 and the drain 711 are electrically connected may be a direct surface bonding method or a bridge connection manner.
  • the material of the anode layer 800 may be, but is limited to, a transparent conductive material such as indium tin oxide.
  • an entire layer of transparent conductive material covering the thin film transistor layer 700 is formed first, and then the entire transparent conductive material is patterned to form an anode layer 800 electrically connected to the drain 711.
  • a first isolation layer 1100 is defined between the drain 711 and the anode layer 800.
  • a via hole is formed in the first isolation layer 1100, and the anode layer 800 is electrically connected to the drain layer 711 through the through hole. connection.
  • the light emitting layer 100 is an organic light emitting layer.
  • S500 forming a cathode layer 200 covering the light emitting layer 100.
  • the cathode layer 200 is disposed in the display area A1 and the non-display area A2, and the cathode layer 200 is used to provide a cathode voltage for the light emitting layer 100. See Figure 15.
  • the cathode layer 200 includes a plurality of cathodes 210 distributed in a matrix, the cathodes 210 covering pixel points of the display area A1.
  • S700 forming a first electrode 310 on a surface of the first insulating layer 400 away from the cathode layer 200, the first electrode 310 being disposed in the display area A1 and the non-display area A2, in the display area A1, the first electrode 310 does not overlap with the cathode 210 of the cathode layer 200, and the first insulating layer 400 is used for electrically isolating the cathode layer 200 and the first electrode 310, wherein the first electrode An electrode 310 serves as a driving electrode or a sensing electrode of the OLED touch panel 10, as shown in FIG.
  • the first electrode 310 corresponds to a gap after the cathode 210 is patterned, the cathode 210 covers the pixel point, and the first electrode 310 avoids The pixel points are set.
  • FIG. 18 is a method for fabricating an OLED touch panel according to Embodiment 2 of the present invention.
  • the OLED touch panel manufacturing method further includes steps S800 and S810 in addition to the steps S100, S200, S300, S400, S500, S600, and S700.
  • the detailed descriptions of the steps S800 and S810 are as follows. .
  • S800 forming, in the non-display area A2, a second insulating layer 410 disposed between two adjacent first electrodes 310, wherein the second insulating layer 410 is used for electrically isolating two adjacent ones.
  • the first electrode 310 The first electrode 310.
  • the second electrode 320 avoids the pixel point setting of the display area A1.
  • FIG. 19 is a method for fabricating an OLED touch panel according to Embodiment 3 of the present invention.
  • the method for fabricating the OLED touch panel includes the steps S100, S200, S300, S400, S500, S600, S700, and S800.
  • the method for preparing the OLED touch panel further includes the step S900, and the detailed description about the step S900 is as follows.
  • S900 forming an encapsulation layer 500 disposed between the first electrode 310 and the second electrode 320.
  • the encapsulation layer 500 is used to electrically isolate the first electrode 310 and the second electrode 320.
  • Figure 20 forming an encapsulation layer 500 disposed between the first electrode 310 and the second electrode 320.
  • the encapsulation layer 500 includes a first inorganic layer 510, an organic layer 520, and a second inorganic layer 530, which are sequentially stacked, the first inorganic layer 510 covering the first electrode. 310.
  • the second electrode 320 is disposed on a side of the second inorganic layer 530 away from the organic layer 520.
  • FIG. 21 is a method for fabricating an OLED touch panel according to Embodiment 4 of the present invention.
  • the OLED touch panel manufacturing method further includes the step S910, and the detailed description about the step S910 is as follows, in addition to the steps S100, S200, S300, S400, S500, S600, S700, and S800.
  • S910 forming an encapsulation layer 500, wherein the second electrode 320 is disposed in the encapsulation layer 500, please refer to FIG. 22.
  • the encapsulation layer 500 includes a first inorganic layer 510, an organic layer 520, and a second inorganic layer 530, and the second electrode 320 is disposed on the first inorganic layer. Between 510 and the organic layer 520; or the second electrode 320 is disposed between the organic layer 520 and the second inorganic layer 530.
  • FIG. 23 is a schematic structural diagram of a touch device according to a preferred embodiment of the present invention.
  • the touch device 1 includes an OLED touch panel 10 .
  • OLED touch panel 10 please refer to the previous description of the OLED touch panel 10 , and details are not described herein again.
  • the touch device 1 can be, but is not limited to, a flexible e-book, a flexible smart phone (such as an Android mobile phone, an iOS mobile phone, a Windows Phone mobile phone, etc.), a flexible tablet computer, a flexible handheld computer, a flexible notebook computer, and a mobile Internet device (MID). , Mobile Internet Devices) or wearable devices.
  • MID mobile Internet device

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

L'invention concerne un panneau tactile DELO. Un panneau tactile DELO (10) a une zone d'affichage (A1) et une zone de non-affichage (A2). Le panneau tactile DELO comprend une couche électroluminescente (100), une couche de cathode (200) et une première électrode (310), la couche électroluminescente étant disposée dans la zone d'affichage, la couche de cathode étant disposée dans la zone d'affichage et la zone de non-affichage, la couche de cathode étant utilisée pour fournir une tension de cathode à la couche électroluminescente, et la première électrode étant disposée dans la zone d'affichage et la zone de non-affichage. Dans la zone d'affichage, la première électrode et la cathode de la couche de cathode ne se chevauchent pas, et dans la zone de non-affichage, une première couche isolante (400) est disposée entre la couche de cathode et la première électrode, la première couche isolante étant utilisée pour isoler électriquement la couche de cathode et la première électrode, la première électrode étant utilisée en tant qu'électrode d'attaque ou qu'électrode de détection du panneau tactile DELO. Cette solution technique contribue à la conception du cadre frontal étroit de panneaux tactiles DELO.
PCT/CN2018/086221 2018-05-09 2018-05-09 Panneau tactile delo, son procédé de fabrication, et dispositif tactile WO2019213880A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN201880093841.8A CN112449727A (zh) 2018-05-09 2018-05-09 Oled触控面板、制备方法及触控装置
PCT/CN2018/086221 WO2019213880A1 (fr) 2018-05-09 2018-05-09 Panneau tactile delo, son procédé de fabrication, et dispositif tactile

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/CN2018/086221 WO2019213880A1 (fr) 2018-05-09 2018-05-09 Panneau tactile delo, son procédé de fabrication, et dispositif tactile

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WO2019213880A1 true WO2019213880A1 (fr) 2019-11-14

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CN114115571A (zh) * 2020-08-26 2022-03-01 深圳市柔宇科技股份有限公司 触控显示面板及电子设备

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CN111930264A (zh) * 2020-09-15 2020-11-13 武汉华星光电半导体显示技术有限公司 一种触控显示面板和触控显示装置
CN111930264B (zh) * 2020-09-15 2023-12-01 武汉华星光电半导体显示技术有限公司 一种触控显示面板和触控显示装置

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