WO2019206021A1 - 光子晶体、显示面板、光转换器件以及眼镜 - Google Patents
光子晶体、显示面板、光转换器件以及眼镜 Download PDFInfo
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- WO2019206021A1 WO2019206021A1 PCT/CN2019/083278 CN2019083278W WO2019206021A1 WO 2019206021 A1 WO2019206021 A1 WO 2019206021A1 CN 2019083278 W CN2019083278 W CN 2019083278W WO 2019206021 A1 WO2019206021 A1 WO 2019206021A1
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/03—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on ceramics or electro-optical crystals, e.g. exhibiting Pockels effect or Kerr effect
- G02F1/0338—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on ceramics or electro-optical crystals, e.g. exhibiting Pockels effect or Kerr effect structurally associated with a photoconductive layer or having photo-refractive properties
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/002—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials
- G02B1/005—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials made of photonic crystals or photonic band gap materials
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/01—Head-up displays
- G02B27/017—Head mounted
- G02B27/0172—Head mounted characterised by optical features
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/283—Interference filters designed for the ultraviolet
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
- G09F9/33—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements being semiconductor devices, e.g. diodes
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/01—Head-up displays
- G02B27/017—Head mounted
- G02B2027/0178—Eyeglass type
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2202/00—Materials and properties
- G02F2202/32—Photonic crystals
Definitions
- the present disclosure relates to a photonic crystal, a display panel, a light conversion device, and glasses.
- Embodiments of the present disclosure provide a photonic crystal, a display panel, a light conversion device, and glasses.
- At least one embodiment of the present disclosure provides a photonic crystal including a first dielectric layer and a second dielectric layer having different refractive indices, the first dielectric layer and the second dielectric layer being alternately stacked.
- the thickness and refractive index of the first dielectric layer and the thickness and refractive index of the second dielectric layer are configured such that the photonic crystal blocks blue light having a wavelength of 420 nm to 470 nm incident thereto.
- the first dielectric layer has a refractive index n 1 and a thickness h 1
- the second dielectric layer has a refractive index n 2 and a thickness h 2
- the ⁇ 0 is 440 nm to 455 nm.
- the ratio of the refractive index of the first dielectric layer to the refractive index of the second dielectric layer is 1.2 to 1.4.
- the ratio of the refractive index of the first dielectric layer to the refractive index of the second dielectric layer is 1.25 to 1.35.
- both the first dielectric layer and the second dielectric layer are fabricated using optical film preparation techniques.
- the first dielectric layer has a refractive index of 1.8 to 2.0
- the second dielectric layer has a refractive index of 1.3 to 1.5.
- the material of the first dielectric layer includes silicon nitride
- the material of the second dielectric layer includes silicon oxide
- the first dielectric layer has a thickness of 55 nm to 60 nm
- the second dielectric layer has a thickness of 75 to 85 nm.
- the number of the first dielectric layers is the same as the number of the second dielectric layers.
- Another embodiment of the present disclosure provides a light conversion device including a light conversion layer and the above photonic crystal.
- the light conversion layer is configured to transmit a portion of the first color incident light and pass another portion of the first color incident light through the light conversion layer to emit at least one other color light, the wavelength of the first color incident light
- the photonic crystal is disposed on a light exiting side of the light conversion layer, which is smaller than a wavelength of the other color light.
- the light conversion layer includes a quantum dot material or a fluorescent material.
- Another embodiment of the present disclosure provides a display panel including the above photonic crystal, the photonic crystal being located on a light exiting side of the display panel.
- Another embodiment of the present disclosure provides a pair of glasses, including a lens and the above photonic crystal.
- the photonic crystal is stacked on the lens.
- FIG. 1 is a schematic structural diagram of a photonic crystal according to an embodiment of the present disclosure
- FIG. 2 is a schematic view showing a light path of light irradiated onto the photonic crystal shown in FIG. 1;
- 3a is a schematic structural view of a first dielectric layer formed on a substrate
- Figure 3b is a schematic view showing the structure after forming a second dielectric layer
- Figure 3c is a schematic view showing the structure after forming a photonic crystal
- FIG. 4 is a partial schematic structural view of a display panel according to another embodiment of the present disclosure.
- FIG. 5 is a partial schematic structural diagram of a light conversion device according to another embodiment of the present disclosure.
- the inventor of the present application found that although the general display panel can filter out short-wave blue light, it also filters out a part of non-short-wave blue light visible light while filtering out short-wave blue light, which seriously affects the display brightness of the display panel. .
- the photonic crystal includes a first dielectric layer and a second dielectric layer having different refractive indices, and the first dielectric layer and the second dielectric layer are alternately stacked.
- the photonic crystal is configured to block the passage of blue light having a wavelength of 420 nm to 470 nm incident into the photonic crystal by setting the thickness and refractive index of the first dielectric layer and the thickness and refractive index of the second dielectric layer.
- the photonic crystal proposed by at least one embodiment of the present disclosure is capable of blocking the passage of blue light having a wavelength of 420 nm to 470 nm, that is, when short-wave blue light having a wavelength of 420 nm to 470 nm is irradiated onto the photonic crystal, the short-wave blue light cannot pass through the photonic crystal. .
- the photonic crystal can block blue light having a wavelength of 420 nm to 470 nm, thereby avoiding the damage of the blue light having a wavelength of 420 nm to 470 nm to the human eye, thereby protecting the human eye and realizing The health display; the visible light of the wavelength of 420 nm to 470 nm of the display panel can be normally emitted, and the high transmittance of the photonic crystal also increases the transmittance of visible light of wavelengths other than 420 nm to 470 nm, thereby improving the display of the display panel. brightness.
- FIG. 1 is a schematic structural diagram of a photonic crystal according to an embodiment of the present disclosure.
- the photonic crystal of the embodiment of the present disclosure includes a first dielectric layer 10 and a second dielectric layer 20 having different refractive indices, and the first dielectric layer 10 and the second dielectric layer 20 are alternately stacked, the first medium.
- the thickness and refractive index of layer 10 and the thickness and refractive index of second dielectric layer 20 are configured such that the photonic crystal can block the passage of blue light having a wavelength of 420 nm to 470 nm incident into the photonic crystal.
- Photonic crystals are artificially designed and fabricated crystals with a periodic dielectric structure on the optical scale. When light propagates in a photonic crystal, it interacts with the periodic structure of the photonic crystal, resulting in a band gap, ie, photonic crystals have photons. band.
- the photonic band gap is a frequency region. When light in the photonic band gap is irradiated onto the photonic crystal, the light cannot pass through the photonic crystal, but produces total reflection on the surface of the photonic crystal.
- the forbidden band of a photonic crystal can be calculated in a wavelength range in which the transmittance is less than 0.1%.
- the photonic crystal proposed by the embodiment of the present disclosure is for blocking the passage of blue light having a wavelength of 420 nm to 470 nm. That is to say, when short-wave blue light having a wavelength of 420 nm to 470 nm is irradiated onto the photonic crystal, these short-wave blue light cannot pass through the photonic crystal.
- the photonic crystal provided by the embodiment of the present disclosure is disposed on the light exiting side of the display panel, the short-wave blue light emitted by the display panel from 420 nm to 470 nm is blocked by the photonic crystal (the photonic crystal material has nearly 100 light for the band in the forbidden band).
- the photonic crystal provided by the embodiment of the present disclosure not only does not block visible light of wavelengths other than 420 nm to 470 nm from passing through the photonic crystal, but also has high transmittance characteristics to improve transmittance of visible light at wavelengths other than 420 nm to 470 nm. .
- the display panel including the photonic crystal provided by the embodiment of the present disclosure has higher display brightness than the display panel that generally filters out short-wave blue light.
- the first dielectric layer 10 and the second dielectric layer 20 are alternately stacked in the first direction X, and the number of the first dielectric layers 10 is the same as the number of the second dielectric layers 20, first
- the direction is the overlapping direction of the first dielectric layer 10 and the second dielectric layer 20.
- the refractive index of the photonic crystal of the embodiment of the present disclosure in the first direction X has a periodic variation, and the periodic variation of the refractive index produces a band gap structure of light.
- the photonic crystal of the embodiment of the present disclosure is a one-dimensional photonic crystal, and the band gap of the photonic crystal appears in the first direction X. Light with a frequency in the band gap cannot pass through the photonic crystal from the first direction and is uniform in the other two directions.
- FIG. 2 includes a schematic diagram of a ray path of blue light having a wavelength ⁇ of 420 nm to 470 nm irradiated onto the photonic crystal shown in FIG.
- the first partial incident light 101 is blue light having a wavelength ⁇ of 420 nm to 470 nm
- the second partial incident light 103 is light having a wavelength other than 420 nm to 470 nm.
- the first portion of the incident light 101 and the second portion of the incident light 103 are incident on the surface of the photonic crystal, the first portion of the incident light 101 does not exit from the photonic crystal, that is, the short-wave blue light does not pass through the photonic crystal but is totally reflected by the photonic crystal.
- the second portion of the incident light 103 that is, light having a wavelength ⁇ of 420 nm to 470 nm, can normally pass through the photonic crystal and continue to propagate in the original direction.
- the number of periods of the photonic crystal shown in FIGS. 1 and 2 is 3. It is easily understood that, in a specific implementation, the number of periods of the photonic crystal is not limited to three, and the number of periods of the photonic crystal can be set as needed.
- the product of the distance traveled by light in the medium and the refractive index of the medium is the optical path of the medium.
- the wavelength corresponding to the intermediate point of the forbidden band of the photonic crystal is the photonic band gap center wavelength, which can reflect the relative position of the forbidden band.
- the refractive index of the medium on both sides of the film layer is larger or smaller than the refractive index of the film layer
- the phase difference in the reflected beams of the film layer is equal to ⁇ (the optical path difference is equal to ⁇ 0 /2, only In the first two beams, the additional optical path difference ⁇ 0 /2 should be added, so that the total optical path difference is ⁇ 0 ), and the reflected light of this wavelength obtains the strongest reflection.
- n 1 is the refractive index of the first dielectric layer 10
- n 2 is the refractive index of the second dielectric layer 20
- h 1 is the thickness of the first dielectric layer
- h 2 is the thickness of the second dielectric layer 20
- ⁇ 0 is the photon.
- the photonic band gap of the photonic crystal in order to make the photonic band gap of the photonic crystal be in the range of 420 nm to 470 nm, and the center wavelength ⁇ 0 may be 440 nm to 455 nm, in the embodiment of the present disclosure, the photonic band gap of the photonic crystal is It is a wavelength range centered on ⁇ 0 . Since the most energetic band in the short-wave blue light is located in the range of 440 nm to 455 nm, the photonic band gap of the photonic crystal of the embodiment of the present disclosure ranges from 420 nm to 470 nm to include the most energetic blue wavelength. Therefore, the photonic crystal in the embodiment of the present disclosure can block the blue light having high energy in the 420 nm to 470 nm to pass through, and the blue light having high energy in the short-wave blue light is prevented from injuring the human eye.
- the ratio n 1 /n 2 of the refractive index of the first dielectric layer 10 to the refractive index of the second dielectric layer 20 may be 1.2 to 1.4, whereby the wavelength range included in the photonic band gap is approximately 420 nm to 470 nm.
- the ratio n 1 /n 2 of the refractive index of the first dielectric layer 10 to the refractive index of the second dielectric layer 20 may be 1.25 to 1.35, so that the wavelength range included in the photonic band gap is closer to 420 nm to 470 nm, thereby The probability of blocking the light of the photonic crystal from 420 nm to 470 nm is lowered, and the brightness of the display panel including the above photonic crystal can be improved.
- the refractive index of the first dielectric layer 10 is greater than the refractive index of the second dielectric layer 20, the refractive index n 1 of the first dielectric layer 10 is 1.8 to 2.0, and the refractive index n 2 of the second dielectric layer 20 is 1.3 to 1.5.
- Embodiments of the present disclosure are not limited to the refractive index of the first dielectric layer being greater than the refractive index of the second dielectric layer, and the refractive index ranges of the two may be interchanged.
- the material of the first dielectric layer 10 may include silicon nitride, and the material of the second dielectric layer 20 may include silicon oxide.
- the embodiment is not limited thereto, and may be other materials that satisfy the above refractive index.
- the refractive index n 1 of the first dielectric layer 10 may be 1.931
- the thickness h 1 of the first dielectric layer 10 may be 55 nm to 60 nm, and the thickness h 2 of the second dielectric layer 20 may be 75 to 85 nm.
- the thickness h 1 of the first dielectric layer 10 may be 58 nm, and the thickness h 2 of the second dielectric layer 20 may be 79 nm.
- ⁇ 0 447 nm, that is, the photonic crystal provided by the embodiment of the present disclosure
- the center wavelength of the band in which the photonic band gap is located is 447 nm.
- Figures 3a to 3c are schematic views of processes for preparing the photonic crystal of Figure 1.
- a photonic crystal can be fabricated on a substrate using an optical film preparation technique.
- the optical film preparation technique can strictly control the film thickness of the first dielectric layer and the second dielectric layer, and the thickness of the film can be up to the nanometer level.
- Optical film preparation technology can be used to prepare photonic crystals with wavelengths in the visible light range to ensure the photonic band gap accuracy of photonic crystals.
- Optical film preparation techniques include physical vapor deposition and chemical liquid deposition.
- embodiments of the present disclosure may employ photo vapor deposition to prepare photonic crystals.
- FIG. 3a is a schematic view of a structure after a first dielectric layer is formed on a substrate.
- the surface of the substrate 30 may be an optical film preparation technique using a first dielectric layer 10 is formed, the thickness of the first dielectric layer 10 is h 1.
- FIG. 3b is a schematic structural view after forming a second dielectric layer
- FIG. 3c is a schematic structural view after forming a photonic crystal.
- the first dielectric layer 10 and the second dielectric layer 20 are alternately formed periodically in order to prepare a photonic crystal as shown in Fig. 3c.
- the substrate 30 may be peeled off or the substrate 30 may not be peeled off, and the barrier properties of the photonic crystal to blue light having a wavelength of 420 nm to 470 nm are not affected.
- the refractive index of the substrate 30 is smaller than the refractive index of the first dielectric layer.
- the material of the substrate 30 is a glass substrate, and a transparent material such as polydimethylsiloxane (PDMS) or polymethyl methacrylate (PMMA) may be used to prevent the substrate 30 from affecting the light transmittance.
- a transparent material such as polydimethylsiloxane (PDMS) or polymethyl methacrylate (PMMA) may be used to prevent the substrate 30 from affecting the light transmittance.
- the substrate of the substrate is not limited thereto, and may be selected according to actual needs.
- both the first dielectric layer 10 and the second dielectric layer 20 are formed using a surface deposition process in optical film fabrication techniques.
- the first dielectric layer is not limited to be formed on the substrate, or the second dielectric layer may be formed on the substrate, and then the first medium is formed on the second dielectric layer.
- FIG. 4 is a partial schematic structural diagram of a display panel according to another embodiment of the present disclosure.
- the display panel includes a display substrate 40 and the photonic crystals provided in the above embodiments.
- the display substrate 40 may be an array substrate of the OLED display panel or a color filter substrate of the liquid crystal display panel, which is not limited in the embodiment of the present disclosure.
- the photonic crystal is located on the light exiting side of the display panel such that light emitted from the display panel passes through the photonic crystal and enters the human eye.
- the display panel Since the photonic crystal can selectively block the passage of blue light having a wavelength of 420 nm to 470 nm, the display panel displays the blue light of the above-mentioned wavelength band in the image light, and can effectively filter the short-wave blue light harmful to the human eye, thereby achieving the purpose of protecting the human eye.
- the display panel proposed by the embodiment of the present disclosure may be any product or component having a display function, such as a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, and the like.
- the photonic crystal is disposed on the light-emitting side of the display panel, that is, the photonic crystal may be disposed on the light-emitting side of the backlight of the display panel, and the photonic crystal may also be disposed on the light-emitting side of the display surface of the display panel, as long as The position where the photonic crystal is disposed can be used to block the short-wave blue light of the display panel from entering the human eye, and all fall within the protection range of the embodiments of the present disclosure.
- the display panel of the embodiment of the present disclosure can block the blue light having a wavelength of 420 nm to 470 nm by disposing the photonic crystal on the light exiting side, thereby avoiding the damage of the blue light having a wavelength of 420 nm to 470 nm to the human eye, and protecting the human eye.
- the health display At the same time, visible light of a wavelength other than 420 nm to 470 nm of the display panel can be normally emitted, and the high transmittance of the photonic crystal also increases the transmittance of visible light having a wavelength other than 420 nm to 470 nm, thereby improving the display brightness of the display panel.
- FIG. 5 is a partial schematic structural diagram of a light conversion device according to another embodiment of the present disclosure.
- the light conversion device may include a light conversion layer 100 and a photonic crystal 1 located on the light exit side of the light conversion layer 100.
- the light conversion layer 100 is configured to transmit a portion of the first color incident light and pass another portion of the first color incident light through the light conversion layer 100 to emit at least one other color light, the first color incident light having a wavelength smaller than the other color lights. The wavelength.
- blue light of 420 nm to 470 nm is reflected back to the light conversion layer for reuse.
- the light conversion layer 100 includes a quantum dot material or a fluorescent material.
- the first color light is blue light
- the other color lights include red light and green light.
- the quantum dot material may be a mixed quantum dot material
- the mixed quantum dot material includes a mixed green quantum dot material and a red quantum dot material to cause incident light (blue light) incident on the light conversion layer 100 to pass through the light conversion layer 100 and emit red. Light and green light.
- the first color light is blue light
- the other color lights include yellow light.
- the first color incident light excites the quantum dot material to emit yellow light, and the blue light and the yellow light mix to form white light.
- the light conversion device may be a part of the backlight module, a color film substrate, a part of the illumination source, or a part of the display device, which is not limited in the embodiment of the present disclosure.
- the light conversion device provided by the embodiment of the present disclosure may include the display panel shown in FIG. 4, the side of the display panel including the photonic crystal includes a light conversion layer, and FIG. 5 only schematically shows the light conversion layer and the photonic crystal. .
- the photonic crystal 1 blocks the passage of blue light having a wavelength ⁇ of 420 nm to 470 nm
- the light ⁇ of the light conversion layer 100 (for example, a photoluminescence quantum dot structure) has a wavelength ⁇ of 420 nm to 470 nm.
- Almost all of the reflected light crystals 1 are reflected, and the reflected blue light can be reused to excite the light conversion layer 100 to emit light, improving the luminous efficiency of, for example, a photoluminescent quantum dot structure.
- the photoluminescence quantum dot structure may be a quantum dot film or a quantum dot color film.
- a photoluminescent quantum dot structure can be excited by blue light to emit light of other colors.
- the quantum dot material is a photoluminescence quantum dot material such as CdSe, CdTe, or graphene.
- the luminescence peak of the blue quantum dot ranges from 440 to 460 nm; the luminescence peak of the green quantum dot ranges from 510 to 540 nm, and the luminescence peak of the red quantum dot ranges from 630 to 670 nm.
- blue quantum dots are excited to emit blue light, green quantum dots are excited to emit green light, and red quantum dots are excited to emit red light.
- the light conversion device may further include a light source 200 disposed on a side opposite to the light exiting side of the light conversion layer 100 (ie, the light incident side), and the light emitted from the light source 200 is used to excite the light conversion layer 100 to emit light, and the light conversion layer 100 emits
- the blue light having a wavelength ⁇ of 420 nm to 470 nm in the light is almost completely reflected into the light conversion layer 100 when the photonic crystal 1 is encountered, and the light conversion layer 100 is again excited to emit light, thereby improving luminous efficiency.
- the light conversion device is a photoluminescence quantum dot structure device QLED.
- Another embodiment of the present disclosure proposes a pair of glasses on which the photonic crystal of the above embodiment is disposed, so that the glasses can prevent blue light having a wavelength of 420 nm to 470 nm from being incident on the human eye to cause damage to the human eye.
- installation In the description of the embodiments of the present disclosure, it should be noted that the terms “installation”, “connected”, and “connected” are to be understood broadly, and may be, for example, a fixed connection or a Removable connection, or integral connection; may be mechanical connection or electrical connection; may be directly connected, or may be indirectly connected through an intermediate medium, and may be internal communication between the two elements.
- the specific meanings of the above terms in the present disclosure can be understood in the specific circumstances by those skilled in the art.
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Abstract
Description
Claims (13)
- 一种光子晶体,包括具有不同折射率的第一介质层和第二介质层,所述第一介质层和所述第二介质层交替层叠设置,其中,所述第一介质层的厚度和折射率以及所述第二介质层的厚度和折射率被配置为使所述光子晶体阻挡入射到其中的波长为420nm~470nm的蓝光通过。
- 根据权利要求1所述的光子晶体,其中,所述第一介质层的折射率为n 1,厚度为h 1,所述第二介质层的折射率为n 2,厚度为h 2,n 1*h 1=n 2*h 2=λ 0/4,所述λ 0为440nm~455nm。
- 根据权利要求1或2所述的光子晶体,其中,所述第一介质层的折射率与所述第二介质层的折射率的比值为1.2~1.4。
- 根据权利要求3所述的光子晶体,其中,所述第一介质层的折射率与所述第二介质层的折射率的比值为1.25~1.35。
- 根据权利要求1-4任一项所述的光子晶体,其中,所述第一介质层和所述第二介质层均采用光学薄膜制备技术制作。
- 根据权利要求1-5任一项所述的光子晶体,其中,所述第一介质层的折射率为1.8~2.0,所述第二介质层的折射率为1.3~1.5。
- 根据权利要求6所述的光子晶体,其中,所述第一介质层的材质包括氮化硅,所述第二介质层的材质包括氧化硅。
- 根据权利要求6或7所述的光子晶体,其中,所述第一介质层的厚度为55nm~60nm,所述第二介质层的厚度为75~85nm。
- 根据权利要求1-8任一项所述的光子晶体,其中,所述第一介质层的数量与所述第二介质层的数量相同。
- 一种光转换器件,包括光转换层以及权利要求1-9中任一项所述的光子晶体,所述光转换层被配置为透过一部分第一颜色入射光,且使另一部分第一颜色入射光通过所述光转换层后出射至少一种其他颜色光,所述第一颜色入射光的波长小于所述其他颜色光的波长,所述光子晶体设置在所述光转换层的出光侧。
- 根据权利要求10所述的光转换器件,其中,所述光转换层包括量子点材料或者荧光材料。
- 一种显示面板,包括权利要求1-9任一项所述的光子晶体,所述光子晶体位于所述显示面板的出光侧。
- 一种眼镜,包括镜片以及权利要求1-9任一项所述的光子晶体,其中,所述光子晶体叠设在所述镜片上。
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CN109491145B (zh) * | 2019-01-02 | 2023-09-22 | 合肥京东方显示光源有限公司 | 显示装置、显示系统和显示方法 |
CN109634047A (zh) * | 2019-01-28 | 2019-04-16 | 前海申升科技(深圳)有限公司 | 一种护眼高清光子晶体影像膜 |
CN109752777B (zh) * | 2019-03-07 | 2021-05-04 | 京东方科技集团股份有限公司 | 光子晶体膜、液晶显示模组和显示装置 |
CN109785748B (zh) * | 2019-03-21 | 2021-05-14 | 京东方科技集团股份有限公司 | 一种显示面板及显示装置 |
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Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030186139A1 (en) * | 2002-03-26 | 2003-10-02 | Fuji Photo Film Co., Ltd. | Optical functional element and method of producing the same |
CN101479649A (zh) * | 2006-03-17 | 2009-07-08 | St协作有限公司 | 具有增强的可见光法拉第旋转的磁光光子晶体多层结构 |
US20090272964A1 (en) * | 2008-05-02 | 2009-11-05 | Epistar Corporation | Light-emitting device and method for manufacturing the same |
US20100091224A1 (en) * | 2008-10-10 | 2010-04-15 | Samsung Electronics Co., Ltd. | Photonic crystal optical filter, reflective color filter, display apparatus using the reflective color filter, and method of manufacturing the reflective color filter |
CN104865732A (zh) * | 2015-05-28 | 2015-08-26 | 京东方科技集团股份有限公司 | 彩膜基板及其制造方法、显示装置 |
US20160062178A1 (en) * | 2014-09-03 | 2016-03-03 | Samsung Display Co., Ltd. | Display device having a color conversion layer |
CN108594345A (zh) * | 2018-04-26 | 2018-09-28 | 京东方科技集团股份有限公司 | 一种光子晶体、qled装置、显示面板、眼镜 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7854505B2 (en) * | 2006-03-15 | 2010-12-21 | The Board Of Trustees Of The University Of Illinois | Passive and active photonic crystal structures and devices |
FR3039659B1 (fr) * | 2015-07-28 | 2018-08-17 | Essilor International | Lentille ophtalmique et procede de fabrication associe |
CN106206967A (zh) * | 2016-08-10 | 2016-12-07 | 京东方科技集团股份有限公司 | 量子点发光器件及其制备方法、显示装置 |
US11217617B2 (en) * | 2017-06-21 | 2022-01-04 | Sony Semiconductor Solutions Corporation | Imaging element and solid-state imaging device |
-
2018
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- 2019-04-18 US US16/605,974 patent/US11520174B2/en active Active
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Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030186139A1 (en) * | 2002-03-26 | 2003-10-02 | Fuji Photo Film Co., Ltd. | Optical functional element and method of producing the same |
CN101479649A (zh) * | 2006-03-17 | 2009-07-08 | St协作有限公司 | 具有增强的可见光法拉第旋转的磁光光子晶体多层结构 |
US20090272964A1 (en) * | 2008-05-02 | 2009-11-05 | Epistar Corporation | Light-emitting device and method for manufacturing the same |
US20100091224A1 (en) * | 2008-10-10 | 2010-04-15 | Samsung Electronics Co., Ltd. | Photonic crystal optical filter, reflective color filter, display apparatus using the reflective color filter, and method of manufacturing the reflective color filter |
US20160062178A1 (en) * | 2014-09-03 | 2016-03-03 | Samsung Display Co., Ltd. | Display device having a color conversion layer |
CN104865732A (zh) * | 2015-05-28 | 2015-08-26 | 京东方科技集团股份有限公司 | 彩膜基板及其制造方法、显示装置 |
CN108594345A (zh) * | 2018-04-26 | 2018-09-28 | 京东方科技集团股份有限公司 | 一种光子晶体、qled装置、显示面板、眼镜 |
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