WO2019203320A1 - Composition and article - Google Patents

Composition and article Download PDF

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Publication number
WO2019203320A1
WO2019203320A1 PCT/JP2019/016692 JP2019016692W WO2019203320A1 WO 2019203320 A1 WO2019203320 A1 WO 2019203320A1 JP 2019016692 W JP2019016692 W JP 2019016692W WO 2019203320 A1 WO2019203320 A1 WO 2019203320A1
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WIPO (PCT)
Prior art keywords
group
compound
formula
integer
atom
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PCT/JP2019/016692
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French (fr)
Japanese (ja)
Inventor
伊藤 昌宏
健二 石関
勇佑 冨依
星野 泰輝
弘賢 山本
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Agc株式会社
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Application filed by Agc株式会社 filed Critical Agc株式会社
Priority to KR1020207025144A priority Critical patent/KR20210002456A/en
Priority to JP2020514446A priority patent/JPWO2019203320A1/en
Priority to CN201980026805.4A priority patent/CN111989370A/en
Publication of WO2019203320A1 publication Critical patent/WO2019203320A1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/22Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring
    • C08G65/223Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring containing halogens
    • C08G65/226Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring containing halogens containing fluorine
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/30Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/32Polymers modified by chemical after-treatment
    • C08G65/329Polymers modified by chemical after-treatment with organic compounds
    • C08G65/336Polymers modified by chemical after-treatment with organic compounds containing silicon
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L71/00Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
    • C08L71/02Polyalkylene oxides
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D171/00Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
    • C09D171/02Polyalkylene oxides

Definitions

  • the present invention relates to a composition and an article that can form a surface layer excellent in friction resistance and adhesion.
  • the fluorine-containing compound exhibits high lubricity, water / oil repellency, etc.
  • it is preferably used as a surface treatment agent.
  • the surface treatment agent imparts water and oil repellency to the surface of the base material, it becomes easy to wipe off the dirt on the surface of the base material, and the removability of the dirt is improved.
  • fluorine-containing ether compounds having a poly (oxyperfluoroalkylene) chain in which an ether bond (—O—) is present in the middle of the perfluoroalkylene chain are compounds having excellent flexibility. Excellent dirt removal.
  • the surface treatment agent containing the above-mentioned fluorine-containing ether compound has the ability to prevent water and oil repellency from being lowered even when repeatedly rubbed with a finger (friction resistance) and the ability to easily remove fingerprints attached to the surface by wiping (fingerprint stains) For example, it is used as a surface treatment agent for a member constituting a surface touched by a finger of a touch panel.
  • the fluorine-containing ether compound compounds having a poly (oxyperfluoroalkylene) chain and having a hydrolyzable silyl group at the terminal are widely used.
  • Patent Document 1 shows that a fluorine-containing ale compound having a plurality of hydrolyzable silyl groups is preferable.
  • a peelable protective film may be stuck on the surface layer.
  • the surface treating agent containing a fluorine-containing ether compound having a plurality of hydrolyzable silyl groups described in Patent Document 1 can form a surface layer having excellent friction resistance.
  • the adhesion between the surface layer and the protective film is insufficient, when the protective film is peeled off from the surface layer during storage or transportation of the substrate on which the surface layer is formed, There was a case where trash entered a gap formed between the two.
  • an object of the present invention is to provide a composition and an article that can form a surface layer excellent in friction resistance and adhesion to a protective film.
  • the present invention achieves the above-mentioned object and has the following aspects.
  • [1] Selected from the group consisting of Compound 1 represented by Formula 1 and Compound 2 having a poly (oxyfluoroalkylene) chain containing a repeating unit represented by Formula 21 and a group represented by Formula 22 At least one compound Compound 3 having a poly (oxyperfluoroalkylene) chain containing a repeating unit represented by formula 31 and two or more groups represented by formula 32, and not containing a repeating unit represented by formula 21;
  • a composition comprising: R 11 - (OX) m -Y -Z (R 12) q (R 13) r-q Formula 1
  • R 11 is a fluoroalkyl group.
  • X is a fluoroalkylene group having 1 or more carbon atoms and having 1 or more fluorine atoms.
  • m is an integer of 0-4.
  • Y represents an alkylene group which may have —O—, —C (O) N (R 14 ) — or —C (O) —, a single bond, —O—, —C (O) N (R 14 )-or -C (O)-.
  • the alkylene group that may have —O—, —C (O) N (R 14 ) —, or —C (O) — may have a fluorine atom.
  • the Y is -OCF 2 - when is an alkylene group containing, -OCF 2 in the alkylene group - number of is one.
  • R 14 is a hydrogen atom or an alkyl group.
  • Z is a carbon atom, a silicon atom or a nitrogen atom.
  • R 12 is a hydrogen atom, a hydroxyl group or an alkyl group.
  • R 13 is —L 1 —Si (R 1 ) n1 L 3-n1 .
  • R 1 is a monovalent hydrocarbon group.
  • L is a hydrolyzable group or a hydroxyl group.
  • n1 is an integer of 0-2.
  • L 1 is an alkylene group which may have —O—.
  • X 2 is a fluoroalkylene group having one or more hydrogen atoms.
  • R 2 is a monovalent hydrocarbon group.
  • L 2 is a hydrolyzable group or a hydroxyl group.
  • n2 is an integer of 0-2.
  • X 3 is a perfluoroalkylene group.
  • m3 is an integer of 5 or more.
  • R 3 is a monovalent hydrocarbon group.
  • L 3 is a hydrolyzable group or a hydroxyl group.
  • n3 is an integer of 0-2. [2] The composition according to [1], wherein m in the formula (1) is 0 or 1.
  • [3] The composition according to [1] or [2], wherein the compound 2 is a compound represented by the formula 2.
  • R 21 is an alkyl group which may have a fluorine atom, or —Y 2 —Z 2 (R 22 ) q2 (R 23) r2-q2 .
  • X 2 is a fluoroalkylene group having one or more hydrogen atoms.
  • X 21 is a perfluoroalkylene group.
  • Y 2 is a single bond or a divalent linking group.
  • Z 2 is a carbon atom, a silicon atom or a nitrogen atom.
  • R 22 is a hydrogen atom, a hydroxyl group or an alkyl group.
  • R 23 is —L 21 —Si (R 2 ) n2 L 2 3-n2 .
  • L 21 is an alkylene group which may have —O—.
  • R 2 is a monovalent hydrocarbon group.
  • L 2 is a hydrolyzable group or a hydroxyl group.
  • n2 is an integer of 0-2.
  • m2 is an integer of 2 or more, m20 is an integer of 0 or more, and m2 + m20 is an integer of 5 or more. If Z 2 is a carbon atom or a silicon atom, r2 is 3, q2 is an integer of 0-2.
  • L 3 is a hydrolyzable group or a hydroxyl group.
  • n3 is an integer of 0-2.
  • X 3 is a perfluoroalkylene group.
  • m3 is an integer of 5 or more.
  • Z 3 is a (j + g) -valent linking group.
  • j is an integer of 1 or more.
  • g is an integer of 1 or more.
  • A is a perfluoroalkyl group
  • g is an integer of 2 or more
  • A is —Q [—Si (R 3 ) n3 L 3 3-n3 ] k
  • g + k is an integer of 2 or more. is there.
  • [5] The difference in number average molecular weight between at least one compound selected from the group consisting of the compound 1 and the compound 2 and the compound 3 is 0 to 3,000, [1] to [4]
  • [6] The composition according to any one of [1] to [5], wherein the content of the compound 3 relative to the total content of the compound 1 and the compound 2 is 0.1 to 4 by mass ratio. object.
  • An article comprising a substrate and a surface layer formed from the composition according to any one of [1] to [7] on the substrate.
  • compositions and an article that have a friction resistance and can form a surface layer having excellent adhesion to a substrate and a protective film.
  • the “divalent organopolysiloxane residue” is a group represented by the following formula.
  • R x in the following formula is an alkyl group (preferably having 1 to 10 carbon atoms) or a phenyl group.
  • G1 is an integer of 1 or more, preferably an integer of 1 to 9, and particularly preferably an integer of 1 to 4.
  • the “silphenylene skeleton group” is a group represented by —Si (R y ) 2 PhSi (R y ) 2 — (where Ph is a phenylene group and R y is a monovalent organic group). It is. R y is preferably an alkyl group (preferably having 1 to 10 carbon atoms).
  • the “dialkylsilylene group” is a group represented by —Si (R z ) 2 — (wherein R z is an alkyl group (preferably having 1 to 10 carbon atoms)).
  • “Surface layer” means a layer formed on a substrate.
  • a surface layer may be directly formed on a base material, and may be formed on a base material through the other layer formed on the surface of the base material.
  • “Number average molecular weight (hereinafter also referred to as Mn)” is calculated by determining the number (average value) of oxyfluoroalkylene groups based on terminal groups by 1 H-NMR and 19 F-NMR.
  • the hydrolyzable silyl group means a group that becomes a silanol group represented by Si—OH by a hydrolysis reaction. Silanol groups react between the silanol groups to form Si—O—Si bonds. In addition, it is considered that the silanol group can form a chemical bond (base material—O—Si) by a dehydration condensation reaction with a hydroxyl group (base material—OH) on the surface of the base material.
  • the hydrolyzable silyl group is, for example, —Si (R 1 ) n1 L 3-n1 in Compound 1.
  • the composition of the present invention (hereinafter also referred to as “the present composition”) is composed of Compound 1 represented by Formula 1 and Compound 2 having a poly (oxyfluoroalkylene) chain containing unit 21 and a group 22. And at least one compound selected from the group, and a compound 3 having a poly (oxyperfluoroalkylene) chain containing the unit 31 and two or more groups 32 and not containing the unit 21.
  • the surface layer formed using this composition is excellent in friction resistance. The reason for this is presumed that by using Compound 3 having two or more groups 32, the reaction point between the present composition and the substrate increased, and the adhesion between the surface layer and the substrate was improved. Is done.
  • the surface layer formed using this composition is excellent in adhesiveness with a protective film.
  • the reason for this is thought to be that the number of repeating units (m) of the oxyfluoroalkylene chain represented by (OX) in Compound 1 is as small as 0 to 4, thereby improving the affinity with the adhesive of the protective film. It is done.
  • the compound 2 since the compound 2 has a poly (oxyfluoroalkylene) chain containing the unit 21 having a hydrogen atom, the surface tension is increased as compared with a case where a poly (oxyfluoroalkylene) chain having no hydrogen atom is used. It is thought that it was because.
  • Examples of the protective film include a resin film with an adhesive.
  • Examples of the pressure-sensitive adhesive include acrylic pressure-sensitive adhesives, urethane pressure-sensitive adhesives, and silicone-based pressure-sensitive adhesives, and acrylic pressure-sensitive adhesives are preferable from the viewpoint of easy peeling.
  • Examples of the resin film include a polyvinyl chloride film, a polyethylene film, a polypropylene film, a polycarbonate film, a polyester film, and a polyurethane film. From the viewpoint of easy peeling, a polyvinyl chloride film, a polyethylene film or a polypropylene film is preferred.
  • R 11 is a fluoroalkyl group (an alkyl group having one or more fluorine atoms), and is preferably a perfluoroalkyl group.
  • the number of carbon atoms in the fluoroalkyl group is preferably from 1 to 20, more preferably from 1 to 10, even more preferably from 1 to 6, and particularly preferably from 1 to 3 from the viewpoint of better weather resistance and corrosion resistance of the surface layer.
  • the fluoroalkyl group may be linear, branched or cyclic.
  • X is a fluoroalkylene group having 1 or more carbon atoms and having 1 or more fluorine atoms.
  • the number of carbon atoms of the fluoroalkylene group is 1 or more, preferably 2 or more, more preferably 2 to 6, and particularly preferably 2 to 3 from the viewpoint of better weather resistance and corrosion resistance of the surface layer.
  • the fluoroalkylene group may be linear or branched, but is preferably linear because the effects of the present invention are more excellent.
  • the fluoroalkylene group has one or more fluorine atoms.
  • the number of fluorine atoms in the fluoroalkylene group is preferably 2 to 10 and particularly preferably 2 to 4 in view of better corrosion resistance of the surface layer.
  • the fluoroalkylene group may be a group in which all hydrogen atoms in the fluoroalkylene group are substituted with fluorine atoms (perfluoroalkylene group).
  • (OX) examples include OCHF, OCF 2 , OCHFCF 2 , OCF 2 CF 2 , and OCF (CF 3 ) CF 2 .
  • n is an integer of 0 to 4, and is preferably 0 to 3, more preferably 0 or 1, from the viewpoint of excellent balance between the adhesion of the surface layer to the protective film and the friction resistance of the surface layer.
  • (OX) m is a single bond.
  • the plurality of OXs may be the same or different. That is, (OX) m may be composed of two or more different types of OX. The order of combining two or more types of (OX) is not limited, and they may be arranged randomly, alternately, or in blocks.
  • Y represents an alkylene group which may have —O—, —C (O) N (R 14 ) — or —C (O) —, a single bond, —O—, —C (O) N (R 14 )-or -C (O)-.
  • the alkylene group has —O—, —C (O) N (R 14 ) —, or —C (O) —, these groups are attached to at least one of the carbon-carbon atom and (OX) m- side ends. It is preferable to have.
  • the alkylene group may have a plurality of groups selected from the group consisting of —O—, —C (O) N (R 14 ) —, and —C (O) —.
  • the alkylene group has a plurality of groups selected from the group consisting of —O—, —C (O) N (R 14 ) —, and —C (O) —, the carbon-carbon atom and (OX) m side It is preferable to have these groups at both ends.
  • the alkylene group which may have —O—, —C (O) N (R 14 ) — or —C (O) — preferably has 1 to 10 carbon atoms, particularly preferably 1 to 6.
  • the alkylene group which may have —O—, —C (O) N (R 14 ) — or —C (O) — may have a fluorine atom.
  • R 14 is a hydrogen atom or an alkyl group (preferably having 1 to 10 carbon atoms).
  • Y is -OCF 2 - when is an alkylene group containing, -OCF 2 in the alkylene group - number of is one.
  • an alkylene group represented by —OCF 2 — an alkylene group represented by —OCF 2 CH 2 OCH 2 CH 2 CH 2 —
  • the number of —OCF 2 — is one and satisfies the definition of Y.
  • an alkylene group having two or more —OCF 2 — such as an alkylene group represented by —OCF 2 OCF 2 — and an alkylene group represented by —OCF 2 OCF 2 OCF 2 — Does not meet the definition of Specific examples of the alkylene group which may have —O—, —C (O) N (R 4 ) —, or —C (O) — include —CH 2 CH 2 —, —C (O) NHCH.
  • Z is a carbon atom, a nitrogen atom or a silicon atom.
  • r is 3
  • q is an integer of 0 to 1 (preferably 0).
  • r is 2 and q is 0.
  • R 12 is a hydrogen atom, a hydroxyl group or an alkyl group.
  • the alkyl group preferably has 1 to 5 carbon atoms, more preferably 1 to 3 carbon atoms, and particularly preferably 1 carbon atom.
  • R 13 is —L 1 —Si (R 1 ) n1 L 3-n1 .
  • L 1 is an alkylene group which may have —O—. When the alkylene group has —O—, it is preferable to have —O— between carbon-carbon atoms or at the terminal on the Z side.
  • L 1 preferably has 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms, and particularly preferably 1 to 4 carbon atoms.
  • the plurality of R 13 may be the same or different. From the viewpoint of easy availability of raw materials and ease of production of Compound 1, they are preferably the same.
  • R 1 is a monovalent hydrocarbon group, preferably a monovalent saturated hydrocarbon group.
  • the carbon number of R 1 is preferably 1 to 6, more preferably 1 to 3, and particularly preferably 1 or 2.
  • L is a hydrolyzable group or a hydroxyl group. That is, when L is a hydrolyzable group, the group represented by Si—L is a hydrolyzable silyl group.
  • L include an alkoxy group, a halogen atom, an acyl group, and an isocyanate group (—NCO).
  • alkoxy group an alkoxy group having 1 to 4 carbon atoms is preferable.
  • halogen atom a chlorine atom is preferable.
  • L is preferably an alkoxy group having 1 to 4 carbon atoms or a halogen atom from the viewpoint of easier production of compound 1.
  • L is preferably an alkoxy group having 1 to 4 carbon atoms from the viewpoint of less outgassing at the time of coating and better storage stability of Compound 1, and an ethoxy group when long-term storage stability of Compound 1 is required. Is particularly preferred, and a methoxy group is particularly preferred when the reaction time after coating is short.
  • n1 is an integer of 0-2. n1 is preferably 0 or 1, particularly preferably 0. By the presence of a plurality of L, the adhesion of the surface layer to the substrate becomes stronger. When n1 is 1 or less, a plurality of L present in one molecule may be the same or different. From the viewpoint of easy availability of raw materials and ease of production of Compound 1, they are preferably the same.
  • Specific examples of compound 1 include the following examples 1 to 48.
  • Compound 1 can be produced by a known production method.
  • Compound 1 can be produced by subjecting a compound represented by Formula 1A to a hydrosilylation reaction with HSi (R 1 ) n1 L 3-n1 (wherein R 1 , L and n1 are as defined above). .
  • R 11 , X, m, Y, Z, R 12 , q, and r are as described above, and L 1A is an alkylene group that may have —O—, a single bond, or —O
  • L 1A —CH ⁇ CH 2 is hydrosilylated, it becomes L 1 of Compound 1.
  • Compounds of the formula 1A for example Y is -C (O) NHCH 2 -
  • R 11 in a known manner as a raw material - (OX) m —C (O) OR 1B (R 1B is an alkyl group having 1 to 6 carbon atoms) was obtained, and NH 2 —CH 2 —Z (R 12 ) q (L 1A —CH ⁇ CH 2 ) It can be produced by reacting with rq .
  • Compound 2 has a poly (oxyfluoroalkylene) chain containing units 21.
  • Formula 21 X 2 is a fluoroalkylene group having one or more hydrogen atoms.
  • the carbon number of the fluoroalkylene group is preferably 1-6, and particularly preferably 2-4.
  • the fluoroalkylene group has one or more hydrogen atoms, preferably 1 to 3 in terms of excellent balance between the adhesion of the surface layer to the protective film and the friction resistance of the surface layer, and 1 or 2 Particularly preferred.
  • a fluoroalkylene group has one or more fluorine atoms.
  • the fluoroalkylene group has one or more fluorine atoms, preferably 1 to 11 in terms of excellent balance between the adhesion of the surface layer to the protective film and the friction resistance of the surface layer, preferably 2 to 7 Particularly preferred.
  • X 2 may be linear or branched, and is preferably linear because the surface layer is more excellent in friction resistance.
  • the number m2 of repeating units 21 contained in the poly (oxyfluoroalkylene) chain is preferably an integer of 2 or more, more preferably an integer of 2 to 200, still more preferably an integer of 5 to 150, and an integer of 5 to 100. Particularly preferred is an integer of 10 to 50.
  • the poly (oxyfluoroalkylene) chain may contain only one type of unit 21 or may contain two or more types of units 21.
  • Examples of the two or more types of units 21 include two or more types of units 21 having different carbon numbers, two or more types of units 21 having different numbers of hydrogen atoms, and the presence or absence of side chains or side chains even if the number of carbons is the same. Two or more types of units 21 having different types may be mentioned.
  • the coupling order of the two or more types of units 21 is not limited, and they may be arranged randomly, alternately, or in blocks.
  • the (OX 2 ) m2 possessed by the poly (oxyfluoroalkylene) chain is (OCHF) m21 (OC 2 H ma F (4-ma) ) m22 (OC 3 H mb F (6-mb) ) m23 (OC 4 H mc F (8-mc) ) m24 (OC 5 H md F (10-md)) m25 (OC 6 H me F (12-me)) m26 is preferred.
  • ma is an integer of 1 to 3
  • mb is an integer of 1 to 5
  • mc is an integer of 1 to 7
  • md is an integer of 1 to 9
  • me is an integer of 1 to 11.
  • m21, m22, m23, m24, m25 and m26 are each independently an integer of 0 or more, preferably 100 or less.
  • m21 + m22 + m23 + m24 + m25 + m26 is an integer of 2 or more, more preferably an integer of 2 to 200, more preferably an integer of 5 to 150, still more preferably an integer of 5 to 100, and particularly preferably an integer of 10 to 50.
  • m22 is preferably an integer of 1 or more, and particularly preferably an integer of 2 to 200, from the viewpoint that the solubility of Compound 2 in a non-fluorine organic solvent is more excellent.
  • C 3 H mb F (6-mb) , C 4 H mc F (8-mc) , C 5 H md F (10-md) and C 6 H me F (12-me) are linear It may be a branched chain, and a straight chain is preferable from the viewpoint that the friction resistance of the surface layer is more excellent.
  • m21 (OCHF), m22 (OC 2 H ma F (4-ma) ), m23 (OC 3 H mb F (6-mb) ), m24 (OC 4 H mc F (8-mc) ), m25 (OC 5 H md F (10-md) ), m26 (OC 6 H me F (12-me) ) are not limited in the joining order.
  • a plurality of (OCHF) may be the same or different.
  • m22 is 2 or more, a plurality of (OC 2 H ma F (4-ma) ) may be the same or different.
  • a plurality of (OC 3 H mb F (6-mb) ) may be the same or different.
  • the plurality of (OC 4 H mc F (8-mc) ) may be the same or different.
  • m25 is 2 or more, a plurality of (OC 5 H md F (10-md) ) may be the same or different.
  • m26 is 2 or more, a plurality of (OC 6 H me F (12-me) ) may be the same or different.
  • the following (1) to (4) are preferable as the (OX 2 ) m2 of the poly (oxyfluoroalkylene) chain in that the solubility of the compound 2 in the non-fluorine organic solvent is more excellent.
  • the above (1) corresponds to an embodiment in which m21, m24, m25 and m26 are 0, and m22 + m23 is an integer of 2 or more.
  • the above (2) corresponds to an embodiment in which m21, m23, m25 and m26 are 0, and m22 + m24 is an integer of 2 or more.
  • the above (3) corresponds to an embodiment in which m21, m23, m24 and m26 are 0, and m22 + m25 is an integer of 2 or more.
  • the above (4) corresponds to an embodiment in which m21, m23, m24 and m25 are 0, and m22 + m26 is an integer of 2 or more.
  • the poly (oxyfluoroalkylene) chain may further contain an oxyperfluoroalkylene unit.
  • the poly (oxyfluoroalkylene) chain may include units 23.
  • Formula 23 X 21 is a perfluoroalkylene group.
  • the perfluoroalkylene group preferably has 1 to 6 carbon atoms.
  • the perfluoroalkylene group may be linear or branched, and is preferably linear because the surface layer is more excellent in friction resistance.
  • the poly (oxyfluoroalkylene) chain may contain only one type of unit 23, or may contain two or more types of unit 23.
  • Examples of the two or more types of units 23 include two or more types of units 23 having different carbon numbers, and two or more types of units 23 having the same number of carbons but having different side chains and different types of side chains. .
  • the repeating number m20 of the unit 23 contained in the poly (oxyfluoroalkylene) chain is an integer of 0 or more, preferably an integer of 0 to 200, more preferably an integer of 0 to 50, and further an integer of 0 to 10
  • An integer of 0 to 2 is preferable, and particularly preferable.
  • the bonding order of the unit 21 and the unit 23 is not limited.
  • the units 21 and 23 may be arranged randomly, alternately, or in blocks.
  • m2 + m20 is an integer of 5 or more, preferably an integer of 5 to 400, more preferably an integer of 5 to 200
  • An integer of 5 to 120 is more preferable, and an integer of 10 to 52 is particularly preferable.
  • Compound 2 has a group 22. —Si (R 2 ) n2 L 2 3-n2 Formula 22
  • the number of the groups 22 contained in the compound 2 is 1 or more, preferably 2 or more, more preferably 2 to 10, more preferably 2 to 5, in terms of more excellent friction resistance of the surface layer. Two or three are particularly preferred.
  • the plurality of groups 22 may be the same or different. From the viewpoint of easy availability of raw materials and ease of production of Compound 2, it is preferable that they are the same.
  • R 2 is a monovalent hydrocarbon group, preferably a monovalent saturated hydrocarbon group.
  • R 2 preferably has 1 to 6 carbon atoms, more preferably 1 to 3, and particularly preferably 1 or 2.
  • L 2 is a hydrolyzable group or a hydroxyl group. That is, when L 2 is a hydrolyzable group, the group represented by Si—L 2 is a hydrolyzable silyl group.
  • L 2 examples include an alkoxy group, a halogen atom, an acyl group, and an isocyanate group (—NCO).
  • alkoxy group an alkoxy group having 1 to 4 carbon atoms is preferable.
  • halogen atom a chlorine atom is preferable.
  • L 2 is preferably an alkoxy group having 1 to 4 carbon atoms or a halogen atom from the viewpoint that the production of compound 2 is easier.
  • L 2 is preferably an alkoxy group having 1 to 4 carbon atoms from the viewpoint of less outgassing at the time of coating and better storage stability of compound 2, and ethoxy when long-term storage stability of compound 2 is required.
  • a group is particularly preferred, and a methoxy group is particularly preferred when the reaction time after coating is short.
  • n2 is an integer of 0-2. n2 is preferably 0 or 1, particularly preferably 0.
  • the presence of a plurality of L 2 makes the adhesion of the surface layer to the substrate stronger.
  • n2 is 1 or less, a plurality of L 2 present in one molecule may be the same or different. From the viewpoint of easy availability of raw materials and ease of production of Compound 2, it is preferable that they are the same.
  • n2 is 2
  • a plurality of R 2 present in one molecule may be the same or different. From the viewpoint of easy availability of raw materials and ease of production of Compound 2, it is preferable that they are the same.
  • the compound 2 is preferably a compound represented by the formula 2 in that it is superior in the adhesion of the surface layer to the protective film of the compound 2 and the friction resistance of the surface layer.
  • R 21 is an alkyl group which may have a fluorine atom, or —Y 2 —Z 2 (R 22 ) q2 (R 23 ) r2-q2 .
  • the definitions of Y 2 , Z 2 , R 1 , R 23 , r2 and q2 are as described later.
  • the number of carbon atoms in the alkyl group which may have a fluorine atom is preferably from 1 to 20, more preferably from 1 to 10, in terms of excellent adhesion of the surface layer to the protective film and friction resistance of the surface layer. 1 to 6 is more preferable, and 1 to 3 is particularly preferable.
  • the alkyl group which may have a fluorine atom may be linear or branched, and is preferably linear because the surface layer is more excellent in friction resistance.
  • the alkyl group which may have a fluorine atom may be a group (perfluoroalkyl group) in which all hydrogen atoms in the alkyl group are substituted with fluorine atoms.
  • alkyl group which may have a fluorine atom examples include CH 3 —, CF 3 —, CF 3 CH 2 —, CF 3 CF 2 —, CF 3 CF 2 CF 2 —, (CF 3 ) 2. CH—, CF 3 CF 2 CF 2 CH 2 CH 2 —, and CF 3 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 —.
  • the group represented by [(OX 2 ) m2 (OX 21 ) m20 ] is a poly (oxyfluoroalkylene) chain.
  • the definitions of X 2 , X 21 , m2 and m20 are as described above.
  • m2 + m20 in Formula 2 is an integer of 5 or more, preferably an integer of 5 to 400, more preferably an integer of 5 to 200, still more preferably an integer of 5 to 120, and particularly preferably an integer of 10 to 52.
  • the bonding order of (OX 2 ) and (OX 21 ) is not limited.
  • (OX 2 ) and (OX 21 ) may be arranged randomly, alternately, or in blocks.
  • the plurality of (OX 2 ) may be the same or different. That is, (OX 2 ) m2 may be composed of two or more types of (OX 2 ) with different X 2 .
  • the order of combining two or more types of (OX 2 ) is not limited, and they may be arranged randomly, alternately, or in blocks.
  • the plurality of (OX 21 ) may be the same or different. That is, (OX 21 ) m20 may be composed of two or more types of (OX 21 ) with different X 21 .
  • the order of combining two or more types of (OX 21 ) is not limited, and they may be arranged randomly, alternately, or in blocks.
  • Y 2 is a single bond or a divalent linking group.
  • the divalent linking group include a divalent hydrocarbon group (a divalent saturated hydrocarbon group, a divalent aromatic hydrocarbon group, an alkenylene group, and an alkynylene group.
  • the hydrogen group may be linear, branched or cyclic and includes, for example, an alkylene group, preferably 1 to 20, more preferably 1 to 10, and particularly preferably 1 to 6.
  • the divalent aromatic hydrocarbon group preferably has 5 to 20 carbon atoms, and examples thereof include a phenylene group, other than that, an alkenylene group having 2 to 20 carbon atoms, and an alkynylene group having 2 to 20 carbon atoms.
  • a divalent heterocyclic group —O—, —S—, —SO 2 —, —N (R 24 ) —, —C (O) —, —Si (R 25 ) 2 -And a group obtained by combining two or more of these.
  • R 24 is a hydrogen atom or an alkyl group (preferably having 1 to 10 carbon atoms).
  • R 25 is an alkyl group (preferably having 1 to 10 carbon atoms) or a phenyl group.
  • Examples of the group in which two or more of these are combined include, for example, —C (O) N (R 24 ) —, —C (O) N (R 24 ) -alkylene group—, —O-alkylene group—, -OC (O)-is mentioned.
  • Y 2 is a single bond, —O—, —C (O) —, —C (O) N (R 24 ) —, —C (O) because compound 2 is easier to synthesize.
  • N (R 24 ) -alkylene group- and -O-alkylene group- are preferred.
  • Z 2 is a carbon atom, a nitrogen atom or a silicon atom.
  • R 22 is a hydrogen atom, a hydroxyl group or an alkyl group.
  • the alkyl group preferably has 1 to 5 carbon atoms, more preferably 1 to 3 carbon atoms, and particularly preferably 1 carbon atom. If q2 is 2, two is R 22 may be different even in the same. From the viewpoint of easy availability of raw materials and ease of production of the compound represented by Formula 2, they are preferably the same as each other.
  • R 23 is —L 21 —Si (R 2 ) n2 L 2 3-n2 .
  • the definitions of R 2 , L 2 and n2 are as described above.
  • L 21 is an alkylene group which may have —O—. When the alkylene group has —O—, it is preferable to have —O— between carbon-carbon atoms or at the terminal on the Z 2 side.
  • L 21 preferably has 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms, and particularly preferably 1 to 4 carbon atoms.
  • r2 is 3, q2 is an integer of 0-2. If Z 2 is a nitrogen atom, r2 is 2, q2 is an integer of 0-1.
  • the plurality of R 23 may be the same or different. From the viewpoint of easy availability of raw materials and ease of production of Compound 2, it is preferable that they are the same.
  • a compound represented by the formula 20 is preferable in that it is superior in the adhesion of the surface layer to the protective film of the compound 2 and the friction resistance of the surface layer.
  • R 21 - [(OCHF) m21 (OC 2 H ma F (4-ma)) m22 (OC 3 H mb F (6-mb)) m23 (OC 4 H mc F (8-mc)) m24 (OC 5 H md F (10-md) ) m25 (OC 6 H me F (12-me)) m26 (OX 21) m20] -Y 2 -Z 2 (R 22) q2 (R 23) r2-q2 formula 20
  • the definition of each group is as described above.
  • compound 2 examples include the following examples 1 to 68.
  • t represents an integer of 1 or more.
  • t is preferably an integer of 50 or less.
  • Compound 2 can be produced by a known production method.
  • the compound represented by Formula 2 which is one embodiment of Compound 2 is the same as the compound represented by Formula 2A in which HSi (R 2 ) n2 L 2 3-n2 (R 2 , L 2 , and n2 are defined above. And the hydrosilylation reaction.
  • R 21A - [(OX 2) m2 (OX 21) m20] -Y 2 -Z 2 (R 22) q2 (L 2A -CH CH 2) r2-q2 formula 2A
  • X 2 , X 21 , Y 2 , Z 2 , R 22 , m2, m20, q2, and r2 are as defined above
  • R 21A is an alkyl group that may have a fluorine atom, or — Y 2 —Z 2 (R 22 ) q2 (L 2A —CH ⁇ CH 2 ) r2-q2 and L 2A is an alkylene group optionally having —O—, a single bond or —O—;
  • L 2A —CH ⁇ CH 2 is hydrosilylated, it becomes L 2 of the compound represented by Formula 2.
  • the compound represented by Formula 2A is R 21A — [(OX 2 ) m2 (OX 21 ) m20 ] by a known method using R 21A —OH as a raw material.
  • —C (O) OR 2B R 2B is an alkyl group having 1 to 6 carbon atoms was obtained, and NH 2 —CH 2 —Z 2 (R 22 ) q2 (L 2A —CH ⁇ CH 2 ) r2-q2 It can be produced by reacting with
  • Compound 3 has a poly (oxyperfluoroalkylene) chain containing a repeating unit represented by Formula 31.
  • X 3 is a perfluoroalkylene group.
  • the number of carbon atoms of the perfluoroalkylene group is preferably 1 to 6 because the water and oil repellency of the surface layer is more excellent.
  • the perfluoroalkylene group may be linear or branched, but is preferably linear because it is more excellent in water and oil repellency of the surface layer.
  • the plurality of OXs 3 may be the same or different.
  • (OX 3 ) m3 is composed of two or more types of OX 3 having different carbon numbers, or two or more types of OX having different side chains or different types of side chains even if the number of carbons is the same. 3 may be comprised.
  • M3 is an integer of 5 or more, preferably an integer of 5 to 200, more preferably an integer of 5 to 150, and particularly preferably an integer of 10 to 100.
  • m3 is 5 or more, the water and oil repellency of the surface layer is more excellent. If m3 is not more than the upper limit of the above range, the friction resistance of the surface layer is more excellent.
  • the bonding order of each OX 3 is not limited.
  • the two types of OX 3 may be arranged randomly, alternately, or in blocks.
  • m31 is an integer of 1 or more
  • m32, m33 and m34 are each an integer of 0 or 1
  • m31 + m32 + m33 + m34 is an integer of 5 to 200
  • m34 pieces of join order OCF 2 CF 2 CF 2 CF 2 is not limited.
  • m36 and m37 are each an integer from 5 to 200
  • m35, m38 and m39 are each an integer from 2 to 99
  • m40 is an integer from 3 to 99.
  • Compound 3 has two or more groups 32. —Si (R 3 ) n3 L 3 3-n3 Formula 32
  • the number of the groups 32 included in the compound 3 is 2 or more, preferably 2 to 10, more preferably 2 to 5, and particularly preferably 2 or 3 in view of excellent friction resistance of the surface layer.
  • the plurality of groups 32 may be the same or different. From the viewpoint of easy availability of raw materials and ease of production of compound 3, it is preferable that they are the same.
  • R 3 is a monovalent hydrocarbon group, preferably a monovalent saturated hydrocarbon group.
  • R 3 preferably has 1 to 6 carbon atoms, more preferably 1 to 3, and particularly preferably 1 or 2.
  • L 3 is a hydrolyzable group or a hydroxyl group. That is, when L 3 is a hydrolyzable group, the group represented by Si—L 3 is a hydrolyzable silyl group.
  • L 3 include an alkoxy group, a halogen atom, an acyl group, and an isocyanate group (—NCO).
  • alkoxy group an alkoxy group having 1 to 4 carbon atoms is preferable.
  • halogen atom a chlorine atom is preferable.
  • L 3 is preferably an alkoxy group having 1 to 4 carbon atoms or a halogen atom from the viewpoint that the production of compound 3 is easier.
  • L 3 is preferably an alkoxy group having 1 to 4 carbon atoms from the viewpoint that the outgassing during coating is small and the storage stability of compound 3 is better, and ethoxy is required when long-term storage stability of compound 3 is required.
  • a group is particularly preferred, and a methoxy group is particularly preferred when the reaction time after coating is short.
  • n3 is an integer of 0-2. n3 is preferably 0 or 1, particularly preferably 0. By the presence of a plurality of L 3 , the adhesion of the surface layer to the substrate becomes stronger. When n3 is 1 or less, the plurality of L 3 present in one molecule may be the same or different. From the viewpoint of easy availability of raw materials and ease of production of compound 3, it is preferable that they are the same. When n3 is 2, a plurality of R 3 present in one molecule may be the same or different. From the viewpoint of easy availability of raw materials and ease of production of compound 3, it is preferable that they are the same.
  • Compound 3 does not contain the unit 21 described above.
  • the phrase “compound 3 does not contain unit 21” means that compound 3 substantially does not contain unit 21.
  • 1 H-NMR (300.4 MHz, solvent: CDCl 3 , standard: TMS)
  • 1 H-NMR (300.4 MHz, solvent: CDCl 3 , standard: TMS)
  • the above H per molecule It means that the total of the number of is 1.0 or less. It is considered that when the compound 3 does not contain the unit 21 and the compound 2 contains the unit 21, the surface tension of the composition is suitably adjusted and the adhesion of the surface layer is improved.
  • the compound 3 is preferably a compound represented by the formula 3 in that the surface layer of the compound 3 is more excellent in water / oil repellency and friction resistance.
  • A is a perfluoroalkyl group or —Q [—Si (R 3 ) n3 L 3 3-n3 ] k .
  • the number of carbon atoms in the perfluoroalkyl group is preferably from 1 to 10, more preferably from 1 to 6, and particularly preferably from 1 to 3 from the viewpoint that the friction resistance of the surface layer is more excellent.
  • the perfluoroalkyl group may be linear or branched. However, j is 1 when A is -Q [-Si (R 3 ) n3 L 3 3-n3 ] k .
  • CF 3 —, CF 3 CF 2 —, CF 3 CF 2 CF 2 —, CF 3 CF 2 CF 2 —, CF 3 CF 2 CF 2 CF 2 —, CF 3 CF 2 CF 2 CF 2 —, CF 3 CF 2 CF 2 CF 2 —, CF 3 CF (CF 3 ) —, and the like can be given.
  • CF 3 —, CF 3 CF 2 —, and CF 3 CF 2 CF 2 — are preferable because the water and oil repellency of the surface layer is more excellent.
  • Q is a (k + 1) -valent linking group.
  • k is an integer of 1 to 10.
  • examples of Q include divalent to eleven valent linking groups.
  • Q may be any group that does not impair the effects of the present invention.
  • an alkylene group that may have an etheric oxygen atom or a divalent organopolysiloxane residue, a carbon atom, a nitrogen atom, or a silicon atom A divalent to octavalent organopolysiloxane residue, and formulas 3-1A, 3-1B, and 3-1A-1 to 3-1A-6 described below, and Si (R 3 ) n3 L 3 3-n3 And a group excluding.
  • R 3 , L 3 , n3, X 3 and m3 are as described above.
  • Z 3 is a (j + g) -valent linking group.
  • Z 3 may be any group that does not impair the effects of the present invention.
  • an alkylene group that may have an etheric oxygen atom or a divalent organopolysiloxane residue, a carbon atom, a nitrogen atom, or a silicon atom A divalent to octavalent organopolysiloxane residue, and formulas 3-1A, 3-1B, and 3-1A-1 to 3-1A-6 described below, and Si (R 3 ) n3 L 3 3-n3 And a group excluding.
  • j is an integer of 1 or more, and is preferably an integer of 1 to 5 from the viewpoint of better water and oil repellency of the surface layer, and 1 is particularly preferable from the viewpoint of easy production of the compound 3.
  • g is an integer of 1 or more.
  • A is a perfluoroalkyl group
  • g is an integer of 2 or more, and an integer of 2 to 4 is preferable, and 2 or 3 is more preferable, and 3 is particularly preferable from the viewpoint of more excellent friction resistance of the surface layer.
  • A is -Q [-Si (R 3 ) n3 L 3 3-n3 ] k
  • g + k is an integer of 2 or more, 2 or 3 is more preferable, and 3 is particularly preferable.
  • Compound 3 is preferably a compound represented by Formula 3-1 from the viewpoint that the water and oil repellency of the surface layer is more excellent.
  • A- (OX 3 ) m3 -Z 31 Formula 3-1 In Formula 3-1, the definitions of A, X 3 and m3 are the same as the definitions of each group in Formula 3.
  • Z 31 is group 3-1A or group 3-1B.
  • -Q a -X 31 (-Q b -Si (R 3 ) n3 L 3 3-n3 ) h (-R 31 ) i
  • Formula 3-1A -Q c - [CH 2 C ( R 32) (- Q d -Si (R 3) n3 L 3 3-n3)] y -R 33
  • Q a is a single bond or a divalent linking group.
  • the divalent linking group include a divalent hydrocarbon group (a divalent saturated hydrocarbon group, a divalent aromatic hydrocarbon group, an alkenylene group, and an alkynylene group.
  • the hydrogen group may be linear, branched or cyclic and includes, for example, an alkylene group, preferably having 1 to 20 carbon atoms, and a divalent aromatic hydrocarbon group having carbon atoms. 5 to 20 is preferable, and examples thereof include a phenylene group, and may be an alkenylene group having 2 to 20 carbon atoms or an alkynylene group having 2 to 20 carbon atoms.
  • R a is an alkyl group (preferably having 1 to 10 carbon atoms) or a phenyl group.
  • R d is a hydrogen atom or an alkyl group (preferably having 1 to 10 carbon atoms).
  • Examples of the group in which two or more of these are combined include, for example, —OC (O) —, —C (O) N (R d ) —, an alkylene group —O-alkylene group, and an alkylene group —OC (O).
  • X 31 is a single bond, an alkylene group, a carbon atom, a nitrogen atom, a silicon atom, or a divalent to octavalent organopolysiloxane residue.
  • the alkylene group may have —O—, a silphenylene skeleton group, a divalent organopolysiloxane residue, or a dialkylsilylene group.
  • the alkylene group may have a plurality of groups selected from the group consisting of —O—, a silphenylene skeleton group, a divalent organopolysiloxane residue, and a dialkylsilylene group.
  • the number of carbon atoms of the alkylene group represented by X 31 is preferably 1-20, and particularly preferably 1-10.
  • Examples of the divalent to octavalent organopolysiloxane residues include divalent organopolysiloxane residues and (w + 1) valent organopolysiloxane residues described below.
  • Q b is a single bond or a divalent linking group. Definition of the divalent linking group are the same as those defined as described in the above-described Q a.
  • R 31 is a hydroxyl group or an alkyl group.
  • the alkyl group preferably has 1 to 5 carbon atoms, more preferably 1 to 3 carbon atoms, and particularly preferably 1 carbon atom.
  • A is -Q [-Si (R 3 ) n3 L 3 3-n3 ] k . If (-Q b -Si that (R 3) n3 L 3 3 -n3) there are two or more, two or more (-Q b -Si (R 3) n3 L 3 3-n3) are identical It may or may not be. When two or more R 31 are present, the two or more (—R 31 ) may be the same or different.
  • Q c is a single bond, an alkylene group, or a group having an etheric oxygen atom between carbon atoms of a C 2 or more alkylene group, and is preferably a single bond from the viewpoint of easy production of a compound.
  • the number of carbon atoms of the alkylene group is preferably 1-10, and particularly preferably 2-6.
  • the number of carbon atoms of the group having an etheric oxygen atom between carbon atoms of the alkylene group having 2 or more carbon atoms is preferably 2 to 10, and particularly preferably 2 to 6.
  • R 32 is a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, and is preferably a hydrogen atom from the viewpoint of easy production of a compound.
  • the alkyl group a methyl group is preferable.
  • Q d is a single bond or an alkylene group.
  • the number of carbon atoms of the alkylene group is preferably 1 to 10, and more preferably 1 to 6.
  • Q d is preferably a single bond or —CH 2 — from the viewpoint of easy production of the compound.
  • R 33 is a hydrogen atom or a halogen atom, and is preferably a hydrogen atom from the viewpoint of easy production of a compound.
  • y is an integer of 1 to 10, and an integer of 1 to 6 is preferable. However, when y is 1, A is -Q [-Si (R 3 ) n3 L 3 3-n3 ] k . Two or more [CH 2 C (R 32 ) (— Q d —Si (R 3 ) n3 L 3 3-n3 )] may be the same or different.
  • the group 3-1A is preferably a group 3-1A-1 to 3-1A-6.
  • X 32 is —O— or —C (O) N (R d ) — (wherein N binds to Q b1 ).
  • R d is as described above.
  • s1 is 0 or 1.
  • Q b1 is an alkylene group.
  • the alkylene group may have —O—, a silphenylene skeleton group, a divalent organopolysiloxane residue, or a dialkylsilylene group.
  • the alkylene group may have a plurality of groups selected from the group consisting of —O—, a silphenylene skeleton group, a divalent organopolysiloxane residue, and a dialkylsilylene group.
  • the alkylene group has —O—, a silphenylene skeleton group, a divalent organopolysiloxane residue or a dialkylsilylene group, it is preferable to have these groups between carbon atoms.
  • the alkylene group represented by Q b1 preferably has 1 to 10 carbon atoms, and particularly preferably 2 to 6 carbon atoms.
  • group 3-1A-1 include the following groups.
  • * represents a bonding position with (OX 3 ) m3 .
  • X 33 is —O—, —NH—, or —C (O) N (R d ) —.
  • R d is as described above.
  • Q a2 represents a single bond, an alkylene group, —C (O) —, or an etheric oxygen atom between carbon atoms of the alkylene group having 2 or more carbon atoms, —C (O) —, —C (O ) A group having O—, —OC (O) — or —NH—.
  • the alkylene group represented by Q a2 preferably has 1 to 10 carbon atoms, and particularly preferably 2 to 6 carbon atoms.
  • the number of carbons in the group having — is preferably 2 to 10, and particularly preferably 2 to 6.
  • the Q a2 from the viewpoint of easily producing the compound, -CH 2 -, - CH 2 CH 2 -, - CH 2 CH 2 CH 2 -, - CH 2 OCH 2 CH 2 -, - CH 2 NHCH 2 CH 2 —, —CH 2 CH 2 OC (O) CH 2 CH 2 —, —C (O) — are preferred (where the right side is bonded to N).
  • s2 is 0 or 1 (provided that 0 when Q a2 is a single bond). From the viewpoint of easy production of the compound, 0 is preferable.
  • Q b2 is an alkylene group or a group having a divalent organopolysiloxane residue, an etheric oxygen atom or —NH— between the carbon atoms of the alkylene group having 2 or more carbon atoms.
  • the alkylene group represented by Q b2 preferably has 1 to 10 carbon atoms, and particularly preferably 2 to 6 carbon atoms.
  • the number of carbon atoms of the group having a divalent organopolysiloxane residue, an etheric oxygen atom or —NH— between the carbon atoms of the alkylene group having 2 or more carbon atoms represented by Q b2 is 2 to 10 2 to 6 are particularly preferable.
  • Q b2 is preferably —CH 2 CH 2 CH 2 — or —CH 2 CH 2 OCH 2 CH 2 CH 2 — (provided that the right side is bonded to Si) from the viewpoint of easy production of the compound.
  • Two [—Q b2 —Si (R 3 ) n3 L 3 3-n3 ] may be the same or different.
  • group 3-1A-2 include the following groups.
  • * represents a bonding position with (OX 3 ) m3 .
  • Q a3 is a single bond, an alkylene group, or a group having an etheric oxygen atom between carbon atoms of the alkylene group having 2 or more carbon atoms, and is preferably a single bond from the viewpoint of easy production of a compound.
  • the alkylene group represented by Q a3 preferably has 1 to 10 carbon atoms, and particularly preferably 2 to 6 carbon atoms.
  • the carbon number of the group having an etheric oxygen atom between carbon atoms of the alkylene group having 2 or more carbon atoms represented by Qa3 is preferably 2 to 10, and particularly preferably 2 to 6.
  • G is a carbon atom or a silicon atom.
  • R g is a hydroxyl group or an alkyl group.
  • the number of carbon atoms of the alkyl group represented by R g is preferably 1 to 4.
  • G (R g ) is C (OH) or Si (R ga ) (provided that R ga is an alkyl group.
  • the alkyl group preferably has 1 to 10 carbon atoms; Group is particularly preferred.).
  • Q b3 is an alkylene group or a group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms of a C 2 or more alkylene group.
  • the alkylene group represented by Q b3 preferably has 1 to 10 carbon atoms, and particularly preferably 2 to 6 carbon atoms.
  • the number of carbon atoms of the group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms of the alkylene group having 2 or more carbon atoms represented by Qb3 is preferably 2 to 10. 6 is particularly preferred.
  • the Q b3, from the viewpoint of easily producing the compound -CH 2 CH 2 -, - CH 2 CH 2 CH 2 -, - CH 2 CH 2 CH 2 CH 2 CH 2 CH 2 CH 2 - is preferred.
  • Two [—Q b3 —Si (R 3 ) n3 L 3 3-n3 ] may be the same or different.
  • group 3-1A-3 include the following groups.
  • * represents a bonding position with (OX 3 ) m3 .
  • R d in Formula 3-1A-4 is as described above.
  • s4 is 0 or 1.
  • Q a4 is a single bond, an alkylene group, or a group having an etheric oxygen atom between carbon atoms of the alkylene group having 2 or more carbon atoms.
  • the alkylene group represented by Q a4 preferably has 1 to 10 carbon atoms, and particularly preferably 2 to 6 carbon atoms.
  • the number of carbon atoms of the group having an etheric oxygen atom between carbon atoms of the alkylene group having 2 or more carbon atoms represented by Qa4 is preferably 2 to 6, and particularly preferably 2 to 6.
  • t4 is 0 or 1 (provided that 0 when Q a4 is a single bond).
  • -Q a4- (O) t4- is a single bond, -CH 2 O-, -CH 2 OCH 2- , -CH 2 OCH 2 CH 2 when s4 is 0 because it is easy to produce a compound.
  • O—, —CH 2 OCH 2 CH 2 OCH 2 —, —CH 2 OCH 2 CH 2 CH 2 CH 2 OCH 2 — are preferred (where the left side is bonded to (R f O) m ), and s4 is 1.
  • a single bond, —CH 2 —, —CH 2 CH 2 — is preferable.
  • Q b4 is an alkylene group, and the alkylene group is —O—, —C (O) N (R d ) — (wherein R d is as defined above), a silphenylene skeleton group, a divalent group It may have an organopolysiloxane residue or a dialkylsilylene group.
  • the alkylene group has —O— or a silphenylene skeleton group, it is preferable to have an —O— or silphenylene skeleton group between carbon atoms.
  • the alkylene group has —C (O) N (R d ) —, a dialkylsilylene group or a divalent organopolysiloxane residue, the terminal on the side bonded to the carbon atom-carbon atom or (O) u4 side It is preferable to have these groups.
  • the alkylene group represented by Q b4 preferably has 1 to 10 carbon atoms, and particularly preferably 2 to 6 carbon atoms.
  • u4 is 0 or 1.
  • — (O) u4 —Q b4 — since it is easy to produce a compound, —CH 2 CH 2 —, —CH 2 CH 2 CH 2 —, —CH 2 OCH 2 CH 2 CH 2 —, —CH 2 OCH 2 CH 2 CH 2 CH 2 CH 2 CH 2 —, —OCH 2 CH 2 CH 2 —, —OSi (CH 3 ) 2 CH 2 CH 2 CH 2 —, —OSi (CH 3 ) 2 OSi (CH 3 ) 2 CH 2 CH 2 CH 2 —, —CH 2 CH 2 CH 2 Si (CH 3 ) 2 PhSi (CH 3 ) 2 CH 2 CH 2 — are preferred (however, the right side is bonded to Si).
  • Three [— (O) u4 -Q b4 —Si (R 3 ) n3 L 3 3-n3 ] may be the same or different.
  • group 3-1A-4 include the following groups.
  • * represents a bonding position with (OX 3 ) m3 .
  • Q a5 is an alkylene group or a group having an etheric oxygen atom between carbon atoms of the alkylene group having 2 or more carbon atoms.
  • the alkylene group represented by Q a5 preferably has 1 to 10 carbon atoms, and particularly preferably 2 to 6 carbon atoms.
  • the number of carbon atoms of the group having an etheric oxygen atom between carbon atoms of the alkylene group having 2 or more carbon atoms represented by Q a5 is preferably 2 to 10, and particularly preferably 2 to 6.
  • the Q a5 from the viewpoint of easily producing the compound, -CH 2 OCH 2 CH 2 CH 2 -, - CH 2 OCH 2 CH 2 OCH 2 CH 2 CH 2 -, - CH 2 CH 2 -, - CH 2 CH 2 CH 2 — is preferred (where the right side is bonded to Si).
  • Q b5 is an alkylene group or a group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms of an alkylene group having 2 or more carbon atoms.
  • the alkylene group represented by Qb5 preferably has 1 to 10 carbon atoms, and particularly preferably 2 to 6 carbon atoms.
  • the number of carbon atoms of the group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms of the alkylene group having 2 or more carbon atoms represented by Qb5 is preferably 2 to 10. 6 is particularly preferred.
  • Q b5 is preferably —CH 2 CH 2 CH 2 — or —CH 2 CH 2 OCH 2 CH 2 CH 2 — from the viewpoint of easy production of the compound (where the right side is Si (R 3 ) n3 L 3 3 Bind to n3 ).
  • the three [—Q b5 —Si (R 3 ) n3 L 3 3-n3 ] may be the same or different.
  • group 2-1-5 include the following groups.
  • * represents a bonding position with (OX 3 ) m3 .
  • R d in Formula 3-1A-6 is as described above.
  • v is 0 or 1.
  • Q a6 is an alkylene group or a group having an etheric oxygen atom between carbon atoms of a C 2 or more alkylene group.
  • the alkylene group represented by Q a6 preferably has 1 to 10 carbon atoms, and particularly preferably 2 to 6 carbon atoms.
  • the carbon number of the group having an etheric oxygen atom between carbon atoms of the alkylene group having 2 or more carbon atoms represented by Qa6 is preferably 2 to 10, and particularly preferably 2 to 6.
  • the Q a6 from the viewpoint of easily producing the compound, -CH 2 OCH 2 CH 2 CH 2 -, - CH 2 OCH 2 CH 2 OCH 2 CH 2 CH 2 -, - CH 2 CH 2 -, - CH 2 CH 2 CH 2 - is preferred (but the right side is attached to Z a.).
  • Z a is an organopolysiloxane residue of (w + 1) valence.
  • w is an integer of 2 to 7.
  • Examples of the (w + 1) -valent organopolysiloxane residue include the following groups. However, R a in the following formula is as described above.
  • Q b6 is an alkylene group or a group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms of a C 2 or more alkylene group.
  • the alkylene group represented by Qb6 preferably has 1 to 10 carbon atoms, and particularly preferably 2 to 6 carbon atoms.
  • the number of carbon atoms of the group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms of the alkylene group having 2 or more carbon atoms represented by Qb6 is preferably 2 to 10. 6 is particularly preferred.
  • the Q b6, from the viewpoint of easily producing the compound -CH 2 CH 2 -, - CH 2 CH 2 CH 2 - is preferred.
  • the w [—Q b6 —Si (R 3 ) n3 L 3 3-n3 ] may be the same or different.
  • Compounds 1 to 3 may be used alone or in combination of two or more.
  • the content of compound 3 relative to the total content of compound 1 and compound 2 is a mass ratio in that the balance between the adhesion of the surface layer to the protective film and the friction resistance of the surface layer is excellent.
  • 0.1 to 10 is preferable, 0.1 to 4 is more preferable, 0.1 to 1.5 is more preferable, and 0.25 to 0.67 is particularly preferable.
  • the said mass ratio is calculated noting that it corresponds to only one of the compound 1 or the compound 2.
  • the composition may contain a liquid medium.
  • the liquid medium include water and organic solvents.
  • the organic solvent include fluorinated organic solvents and non-fluorinated organic solvents. Two or more organic solvents may be used in combination.
  • fluorinated organic solvent examples include fluorinated alkanes, fluorinated aromatic compounds, fluoroalkyl ethers, fluorinated alkylamines, and fluoroalcohols.
  • the fluorinated alkane is preferably a compound having 4 to 8 carbon atoms.
  • C 6 F 13 H AC-2000: product name, manufactured by AGC
  • C 6 F 13 C 2 H 5 AC-6000: product name
  • Manufactured by AGC Manufactured by AGC
  • C 2 F 5 CHFCHFCF 3 Billertrel: product name, manufactured by DuPont.
  • fluorinated aromatic compound examples include hexafluorobenzene, trifluoromethylbenzene, perfluorotoluene, 1,3-bis (trifluoromethyl) benzene, and 1,4-bis (trifluoromethyl) benzene.
  • the fluoroalkyl ether is preferably a compound having 4 to 12 carbon atoms.
  • CF 3 CH 2 OCF 2 CF 2 H (AE-3000: product name, manufactured by AGC), C 4 F 9 OCH 3 (Novec-7100: Product name, manufactured by 3M), C 4 F 9 OC 2 H 5 (Novec-7200: product name, manufactured by 3M), C 2 F 5 CF (OCH 3 ) C 3 F 7 (Novec-7300: product name, 3M).
  • Specific examples of the fluorinated alkylamine include perfluorotripropylamine and perfluorotributylamine.
  • fluoroalcohol include 2,2,3,3-tetrafluoropropanol, 2,2,2-trifluoroethanol, and hexafluoroisopropanol.
  • non-fluorine-based organic solvent a compound consisting only of a hydrogen atom and a carbon atom and a compound consisting only of a hydrogen atom, a carbon atom and an oxygen atom are preferable.
  • a hydrocarbon-based organic solvent a ketone-based organic solvent , Ether-based organic solvents, ester-based organic solvents, and alcohol-based organic solvents.
  • the hydrocarbon organic solvent include hexane, heptane, and cyclohexane.
  • Specific examples of the ketone organic solvent include acetone, methyl ethyl ketone, and methyl isobutyl ketone.
  • ether organic solvent examples include diethyl ether, tetrahydrofuran, and tetraethylene glycol dimethyl ether.
  • ester organic solvent examples include ethyl acetate and butyl acetate.
  • alcohol organic solvent examples include isopropyl alcohol.
  • the content of the liquid medium is preferably 70 to 99.99% by mass, particularly preferably 80 to 99.9% by mass, based on the total mass of the present composition.
  • the content of Compound 1 is preferably 0.002 to 27.3% by mass, and preferably 0.06 to 16% with respect to the total mass of the composition. 0.0 mass% is particularly preferable.
  • the content of compound 2 is preferably 0.002 to 27.3% by mass, and preferably 0.06 to 16% with respect to the total mass of the composition. 0.0 mass% is particularly preferable.
  • the content of the compound 3 is preferably 0.001 to 24.0% by mass, particularly 0.02 to 8.0% by mass, based on the total mass of the composition. preferable.
  • This composition may contain components other than the above.
  • other components include by-products produced in the production steps of Compound 1 to Compound 3, inevitable compounds in production such as unreacted raw materials.
  • additives such as an acid catalyst and a basic catalyst which accelerate
  • the acid catalyst include hydrochloric acid, nitric acid, acetic acid, sulfuric acid, phosphoric acid, sulfonic acid, methanesulfonic acid, and p-toluenesulfonic acid.
  • Specific examples of the basic catalyst include sodium hydroxide, potassium hydroxide, and ammonia.
  • the content of the other components is preferably 0 to 10% by mass, more preferably 0 to 5% by mass, and particularly preferably 0 to 1% by mass with respect to the total amount of the compounds 1 to 3.
  • the article of the present invention has a base material and a surface layer formed from the composition on the base material. It is preferable that the protective film is stuck on the surface of the surface layer.
  • the surface layer includes at least one compound selected from the group consisting of Compound 1 and Compound 2, and a compound obtained by subjecting Compound 3 to hydrolysis and condensation reactions.
  • the film thickness of the surface layer is preferably 1 to 100 nm, and particularly preferably 1 to 50 nm. The thickness of the surface layer was determined by obtaining an interference pattern of reflected X-rays by an X-ray reflectivity method using an X-ray diffractometer for thin film analysis (ATX-G: product name, manufactured by Rigaku). It can be calculated from the vibration period.
  • the substrate is not particularly limited as long as it is required to impart water and oil repellency.
  • Specific examples of the base material include metals, resins, glass, sapphire, ceramics, stones, and composite materials thereof.
  • the glass may be chemically strengthened.
  • the substrate may be ground-treated with the compound described in paragraphs 0089 to 0095 of International Publication No. 2011/016458, SiO 2 or the like.
  • the article can be manufactured, for example, by the following method. -The method of processing the surface of a base material by the dry-coating method using this composition, and obtaining the said article
  • compounds 1 to 3 may be hydrolyzed in advance using an acid catalyst, a basic catalyst or the like, and a composition containing the hydrolyzed compound and a liquid medium may be used.
  • the difference in Mn between the compound 3 and at least one compound selected from the group consisting of the compound 1 and the compound 2 contained in the composition is small (preferably the difference in Mn is 0 to 3,000, Particularly preferably, a dry layer is obtained in that a surface layer in which at least one compound selected from the group consisting of Compound 1 and Compound 2 and Compound 3 are uniformly distributed with a difference in Mn of 0 to 2,000) is obtained. It is preferable to form the surface layer using a coating method.
  • the M difference between the compound 3 and at least one compound selected from the group consisting of the compound 1 and the compound 2 contained in the composition is large (preferably the difference in Mn is 2,000 As described above, wet is particularly preferable in that a surface layer in which at least one compound selected from the group consisting of Compound 1 and Compound 2 and Compound 3 are uniformly distributed can be obtained. It is preferable to form the surface layer using a coating method.
  • the dry coating method include a vacuum deposition method, a CVD method, and a sputtering method.
  • vacuum deposition is preferable from the viewpoint of suppressing the decomposition of the compounds 1 to 3 and the simplicity of the apparatus.
  • a pellet-like substance obtained by impregnating the present composition with a porous metal such as iron or steel may be used.
  • the wet coating method include spin coating method, wipe coating method, spray coating method, squeegee coating method, dip coating method, die coating method, ink jet method, flow coating method, roll coating method, casting method, Langmuir-Blodget Method and gravure coating method.
  • Examples 6 to 9, 11 to 16, and 18 to 19 are examples, and examples 5, 10, 17, and 20 are comparative examples.
  • the compounding quantity of each component shows a mass reference
  • ⁇ Evaluation methods (Measurement method of water contact angle) The contact angle (water contact angle) of about 2 ⁇ L of distilled water placed on the surface of the surface layer was measured using a contact angle measuring device (DM-500: product name, manufactured by Kyowa Interface Science Co., Ltd.). Measurements were made at five different locations on the surface of the surface layer, and the average value was calculated. The 2 ⁇ method was used to calculate the contact angle.
  • the contact angle is preferably 100 degrees or more.
  • Adhesion test method An acrylic adhesive layer of a polyvinyl chloride film having an acrylic adhesive layer (Elep Masking N-380: product name, manufactured by Nitto Denko Corporation, tape width 50 mm) is attached to the surface layer, and JIS K 6854-1: 1999 ( In accordance with ISO 8510-1: 1990), the polyvinyl chloride film was peeled off at a peeling rate of 100 mm / min at room temperature (23 ° C.) using a 90-degree peel tester (manufactured by Nisshin Kagaku). The 90 degree peeling force was measured. The greater the peel force, the better the adhesion.
  • the peeling force is preferably 250 mN / 50 mm or more, and more preferably 370 mN / 50 mm or more.
  • Example 1 Compound 2-A was synthesized by the following procedure. (Example 1-1) According to the method described in Example 6-1 of International Publication No. 2013/121984, Compound X1 was obtained. Compound X1: CH 3 — (OCF 2 CFHOCF 2 CF 2 CF 2 CH 2 ) n —OH, average value of the number of repeating units n: 14
  • Example 1-2 In a 50 mL eggplant flask, 8.0 g of compound X1 obtained in Example 1-1, 0.34 g of allyl bromide, 0.08 g of tetrabutylammonium bromide, and 0.60 g of 48 mass% aqueous potassium hydroxide solution were placed. The mixture was stirred at 80 ° C. for 5 hours. The mixture was cooled to room temperature (23 ° C.), charged with 10 g of AC-6000 (product name, manufactured by AGC), and washed twice with water. The resulting crude liquid was purified by silica gel column chromatography (developing solvent: AC-6000) to obtain 7.9 g (yield 98%) of compound X2.
  • AC-6000 product name, manufactured by AGC
  • Example 1-3 In a 10 mL glass sample bottle, 6.0 g of the compound X2 obtained in Example 1-2, xylene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content) : 0.02 g of 2 mass%), 1.01 g of HSi (OCH 3 ) 3 , 0.02 g of aniline, 1.0 g of 1,3-bis (trifluoromethyl) benzene (manufactured by Tokyo Chemical Industry Co., Ltd.) And the mixture was stirred at 40 ° C. for 8 hours.
  • Example 2 Compound 3-A was synthesized by the following procedure. (Example 2-1) According to the method described in Examples 11-1 to 11-3 of International Publication No. 2013/121984, Compound Y1 was obtained. Compound Y1: CF 3 — (OCF 2 CF 2 OCF 2 CF 2 CF 2 CF 2 ) n —OCF 2 CF 2 —OCF 2 CF 2 CF 2 CF 2 —OC (O) CF (CF 3 ) OCF 2 CF 2 CF 3 , Average value of n: 13, Mn: 5,050.
  • Example 2-2 In a 50 mL three-necked flask, 9.0 g of compound Y1 and 0.45 g of NH 2 CH 2 C (CH 2 CH ⁇ CH 2 ) 3 were placed, and the mixture was stirred at room temperature (23 ° C.) for 12 hours. The reaction crude liquid was developed on silica gel column chromatography to fractionate 9.4 g (yield 99%) of compound Y2.
  • Example 2-3 In a 100 mL tetrafluoroethylene-perfluoro (alkoxy vinyl ether) copolymer eggplant flask, 5.0 g of compound Y2 and a xylene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (Platinum content: 2% by mass) 0.03 g, trimethoxysilane 0.36 g, aniline 0.01 g and 1,3-bis (trifluoromethyl) benzene 2.0 g were added, and the mixture was allowed to cool to room temperature ( At 23 ° C.) for 8 hours.
  • Platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex Platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex
  • Example 3 Compound 3-B was synthesized by the following procedure. (Example 3-1) In a 50 mL three-necked flask, 10.1 g of the compound Y1 obtained in Example 2-1, 0.97 g of diallylamine, and 10 g of 1,3-bis (trifluoromethyl) benzene were placed, and the mixture was cooled to room temperature (23 ) For 8 hours. The reaction crude liquid was concentrated with an evaporator to obtain 9.8 g of a crude product. The crude product was developed on silica gel column chromatography to fractionate 9.5 g (yield 99%) of compound Y3.
  • Example 3-2 In a 100 mL tetrafluoroethylene-perfluoro (alkoxy vinyl ether) copolymer eggplant flask, 5.0 g of compound Y3 and a xylene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (Platinum content: 2% by mass) 0.03 g, trimethoxysilane 0.36 g, aniline 0.01 g and 1,3-bis (trifluoromethyl) benzene 2.0 g were added, and the mixture was allowed to cool to room temperature ( At 23 ° C.) for 8 hours.
  • Platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex Platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex
  • Example 4 Compound 1-A is trimethoxy (1H, 1H, 2H, 2H-tridecafluoro-n-octyl) silane (CF 3- (CF 2 ) 5 (CH 2 ) 2 -Si (OCH 3 ) manufactured by Tokyo Chemical Industry Co., Ltd. ) 3 ) was used.
  • Examples 5 to 20 The compounds 1-A, 2-A, 3-A and 3-B obtained in Examples 1 to 4 were mixed in the proportions shown in Tables 1 and 2, and Examples 6 to 9, 11 to 16 and 18 to 19 compositions were obtained.
  • a composition (0.5 g) shown in Table 1 was placed as a vapor deposition source on a molybdenum boat in a vacuum vapor deposition apparatus (VTR-350M: product name, ULVAC Kiko Co., Ltd.).
  • the substrate was placed in a vacuum deposition apparatus, and the inside of the vacuum deposition apparatus was evacuated to a pressure of 5 ⁇ 10 ⁇ 3 Pa or less (absolute pressure).
  • the boat in which each of the above-described compositions was placed was heated to 300 ° C., and each of the compositions shown in Table 1 was vacuum-deposited on a substrate to form a deposited film having a thickness of 10 nm.
  • the base material on which the deposited film was formed was heated (post treatment) at a temperature of 200 ° C. for 30 minutes to form a surface layer having a thickness of 10 nm, and an evaluation sample was obtained.
  • composition of the present invention can be used for various applications that are required to impart water and oil repellency.
  • coats for display input devices such as touch panels; surface protective coats made of transparent glass or transparent plastic parts, antifouling coats for kitchens; water-repellent moisture-proof coats and antifouling coats for electronic devices, heat exchangers, batteries, etc.
  • Antifouling coating for toiletries coating on a member that requires liquid repellency while conducting; water-repellent / water-proof / sliding coat for heat exchanger; surface friction coating for vibrating screens and cylinders, etc.
  • More specific examples of use include a front protective plate of a display, an antireflection plate, a polarizing plate, an antiglare plate, or an antireflection coating on the surface thereof, a touch panel of a device such as a mobile phone or a portable information terminal. Coats for various devices with display input devices that operate on the screen with human fingers or palms such as sheets and touch panel displays, surface protection coats such as eyeglass lenses, decorations around water such as toilets, baths, washrooms, kitchens, etc.
  • Coating for building materials waterproof coating for wiring boards, water repellent / waterproof / sliding coat for heat exchangers, water repellent coat for solar cells, waterproof / water repellent coat for printed wiring boards, waterproof for electronic equipment casings and electronic components

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Abstract

Provided are a composition with which it is possible to form a surface layer having excellent friction resistance and adhesiveness with respect to a protective film, and an article. A composition containing: at least one compound selected from the group consisting of compounds 1 represented by R11-(OX)m-Y-Z(R12)q(R13)r-q, and compounds 2 that have -Si(R2)n2L2 3-n2 and a poly(oxyfluoroalkylene) chain including a unit represented by (OX2); and a compound 3 that has a poly(oxyfluoroalkylene) chain including a unit represented by (OX3)m3, has two or more -Si(R3)n3L3 3-n3, and is free of repeating units represented by formula 21. R11 is a fluoroalkyl group, X is an alkylene group having a fluorine atom, m is 0-4, Y is a single bond or a divalent linking group, X2 is a fluoroalkylene group having a hydrogen atom, X3 is a perfluoroalkylene group, m3 is 5 or higher, and -Z(R12)q(R13)r-q, -Si(R2)n2L2 3-n2, and -Si(R3)n3L3 3-n3 are groups having a hydrolyzable group.

Description

組成物および物品Compositions and articles
 本発明は、耐摩擦性、密着性に優れた表面層を形成できる組成物および物品に関する。 The present invention relates to a composition and an article that can form a surface layer excellent in friction resistance and adhesion.
 含フッ素化合物は、高い潤滑性、撥水撥油性等を示すため、表面処理剤に好適に用いられる。表面処理剤によって基材の表面に撥水撥油性を付与すると、基材の表面の汚れを拭き取りやすくなり、汚れの除去性が向上する。上記含フッ素化合物の中でも、ペルフルオロアルキレン鎖の途中にエーテル結合(-O-)が存在するポリ(オキシペルフルオロアルキレン)鎖を有する含フッ素エーテル化合物は、柔軟性に優れる化合物であり、特に油脂等の汚れの除去性に優れる。 Since the fluorine-containing compound exhibits high lubricity, water / oil repellency, etc., it is preferably used as a surface treatment agent. When the surface treatment agent imparts water and oil repellency to the surface of the base material, it becomes easy to wipe off the dirt on the surface of the base material, and the removability of the dirt is improved. Among the above-mentioned fluorine-containing compounds, fluorine-containing ether compounds having a poly (oxyperfluoroalkylene) chain in which an ether bond (—O—) is present in the middle of the perfluoroalkylene chain are compounds having excellent flexibility. Excellent dirt removal.
 上記含フッ素エーテル化合物を含む表面処理剤は、指で繰り返し摩擦されても撥水撥油性が低下しにくい性能(耐摩擦性)および拭き取りによって表面に付着した指紋を容易に除去できる性能(指紋汚れ除去性)が長時間維持されるのが求められる用途、たとえば、タッチパネルの指で触れる面を構成する部材の表面処理剤として用いられる。
 上記含フッ素エーテル化合物としては、ポリ(オキシペルフルオロアルキレン)鎖を有し、末端に加水分解性シリル基を有する化合物が広く用いられている。このような化合物の中でも、特許文献1には、加水分解性シリル基を複数有する含フッ素エール化合物が好ましいことが示されている。
The surface treatment agent containing the above-mentioned fluorine-containing ether compound has the ability to prevent water and oil repellency from being lowered even when repeatedly rubbed with a finger (friction resistance) and the ability to easily remove fingerprints attached to the surface by wiping (fingerprint stains) For example, it is used as a surface treatment agent for a member constituting a surface touched by a finger of a touch panel.
As the fluorine-containing ether compound, compounds having a poly (oxyperfluoroalkylene) chain and having a hydrolyzable silyl group at the terminal are widely used. Among such compounds, Patent Document 1 shows that a fluorine-containing ale compound having a plurality of hydrolyzable silyl groups is preferable.
日本特開2016-037541号公報Japanese Unexamined Patent Publication No. 2016-037541
 上記表面処理剤を用いて基材上に表面層を形成した後、表面層が形成された基材を次工程で使用するまでの間、表面層が形成された基材を保護するために、剥離可能な保護フィルムを表面層上に貼着する場合がある。
 ここで、特許文献1に記載の加水分解性シリル基を複数有する含フッ素エーテル化合物を含む表面処理剤は、耐摩擦性に優れた表面層を形成できる。しかしながら、表面層と保護フィルムとの密着性が不充分であるため、表面層が形成された基材の保存時や運搬時に、保護フィルムが表面層から剥離する場合や、保護フィルムと表面層との間に生じた隙間にゴミが入り込む場合があった。
In order to protect the substrate on which the surface layer is formed, after forming the surface layer on the substrate using the surface treatment agent, until the substrate on which the surface layer is formed is used in the next step, A peelable protective film may be stuck on the surface layer.
Here, the surface treating agent containing a fluorine-containing ether compound having a plurality of hydrolyzable silyl groups described in Patent Document 1 can form a surface layer having excellent friction resistance. However, since the adhesion between the surface layer and the protective film is insufficient, when the protective film is peeled off from the surface layer during storage or transportation of the substrate on which the surface layer is formed, There was a case where trash entered a gap formed between the two.
 本発明は、上記課題に鑑みて、耐摩擦性および保護フィルムとの密着性に優れた表面層を形成できる組成物および物品の提供を目的とする。 In view of the above problems, an object of the present invention is to provide a composition and an article that can form a surface layer excellent in friction resistance and adhesion to a protective film.
 本発明は、上記目的を達成するものであり、下記の態様を有するものである。
[1]式1で表される化合物1、および、式21で表される繰り返し単位を含むポリ(オキシフルオロアルキレン)鎖と式22で表される基とを有する化合物2からなる群より選択される少なくとも1種の化合物と、
 式31で表される繰り返し単位を含むポリ(オキシペルフルオロアルキレン)鎖と、2個以上の式32で表される基とを有し、式21で表される繰り返し単位を含まない化合物3と、を含む、組成物。
  R11-(OX)-Y-Z(R12(R13r-q  式1
 ただし、式1中、
 R11は、フルオロアルキル基である。
 Xは、1個以上のフッ素原子を有する炭素数1以上のフルオロアルキレン基である。
 mは、0~4の整数である。
 Yは、-O-、-C(O)N(R14)-もしくは-C(O)-を有していてもよいアルキレン基、単結合、-O-、-C(O)N(R14)-または-C(O)-である。上記-O-、-C(O)N(R14)-または-C(O)-を有していてもよいアルキレン基は、フッ素原子を有していてもよい。ただし、上記Yが-OCF-を含むアルキレン基である場合、上記アルキレン基中の-OCF-の数は1個である。
 R14は、水素原子またはアルキル基である。
 Zは、炭素原子、ケイ素原子または窒素原子である。
 R12は、水素原子、水酸基またはアルキル基である。
 R13は、-L-Si(Rn13-n1である。Rは、1価の炭化水素基である。Lは、加水分解性基または水酸基である。n1は、0~2の整数である。Lは、-O-を有していてもよいアルキレン基である。
 Zが炭素原子またはケイ素原子の場合、rは3であり、qは0~1の整数である。Zが窒素原子の場合、rは2であり、qは0である。
  (OX)  式21
  -Si(Rn2 3-n2  式22
 ただし、式21および式22中、
 Xは、1個以上の水素原子を有するフルオロアルキレン基である。
 Rは、1価の炭化水素基である。
 Lは、加水分解性基または水酸基である。
 n2は、0~2の整数である。
  (OXm3  式31
  -Si(Rn3 3-n3  式32
 ただし、式31および式32中、
 Xは、ペルフルオロアルキレン基である。
 m3は、5以上の整数である。
 Rは、1価の炭化水素基である。
 Lは、加水分解性基または水酸基である。n3は、0~2の整数である。
[2]上記式(1)におけるmが0または1である、[1]に記載の組成物。
[3]上記化合物2が式2で表される化合物である、[1]または[2]に記載の組成物。
  R21-[(OXm2(OX21m20]-Y-Z(R22q2(R23r2-q2  式2
 ただし、式2中、
 R21は、フッ素原子を有していてもよいアルキル基、または、-Y-Z(R22q2(R23r2-q2である。
 Xは、1個以上の水素原子を有するフルオロアルキレン基である。
 X21は、ペルフルオロアルキレン基である。
 Yは、単結合または2価の連結基である。
 Zは、炭素原子、ケイ素原子または窒素原子である。
 R22は、水素原子、水酸基またはアルキル基である。
 R23は、-L21-Si(Rn2 3-n2である。L21は、-O-を有していてもよいアルキレン基である。Rは、1価の炭化水素基である。Lは、加水分解性基または水酸基である。n2は、0~2の整数である。
 m2は2以上の整数であり、m20は0以上の整数であり、m2+m20は5以上の整数である。
 Zが炭素原子またはケイ素原子の場合、r2は3であり、q2は0~2の整数である。Zが窒素原子の場合、r2は2であり、q2は0~1の整数である。
[4]上記化合物3が式3で表される化合物である、[1]~[3]のいずれかに記載の組成物。
 [A-(OXm3-][-Si(Rn3 3-n3  式3
 ただし、式中、
 Aは、ペルフルオロアルキル基または-Q[-Si(Rn3 3-n3である。
 Qは、(k+1)価の連結基である。
 kは1~10の整数である。
 Rは、1価の炭化水素基である。
 Lは、加水分解性基または水酸基である。n3は、0~2の整数である。
 Xは、ペルフルオロアルキレン基である。
 m3は、5以上の整数である。
 Zは、(j+g)価の連結基である。
 jは、1以上の整数である。
 gは、1以上の整数である。ただし、Aがペルフルオロアルキル基の場合、gは、2以上の整数であり、Aが-Q[-Si(Rn3 3-n3の場合、g+kは、2以上の整数である。
[5]前記化合物1および化合物2からなる群より選択される少なくとも1種の化合物と、化合物3と、の数平均分子量の差が0~3,000である、[1]~[4]のいずれかに記載の組成物。
[6]上記化合物1および上記化合物2の含有量の合計に対する、上記化合物3の含有量が、質量比で0.1~4である、[1]~[5]のいずれかに記載の組成物。
[7]フッ素系有機溶媒、非フッ素系有機溶媒、または水を含む液状媒体を含む、[1]~[6]のいずれかに記載の組成物。
[8]基材と、上記基材上に、[1]~[7]のいずれかに記載の組成物から形成されてなる表面層と、を有することを特徴とする物品。
[9]前記組成物からドライコーティング法により形成されてなる、[8]に記載の物品。
[10]前記基材が、金属、樹脂、ガラス、サファイア、セラミック、石、または、これらの複合材料である、[8]または[9]に記載の物品。
[11]前記表面層の膜厚が、1~100nmである、[8]~[10]のいずれかに記載の物品。
[12]前記表面層の表面に保護フィルムが貼着されている、[8]~[11]のいずれかに記載の物品。
The present invention achieves the above-mentioned object and has the following aspects.
[1] Selected from the group consisting of Compound 1 represented by Formula 1 and Compound 2 having a poly (oxyfluoroalkylene) chain containing a repeating unit represented by Formula 21 and a group represented by Formula 22 At least one compound
Compound 3 having a poly (oxyperfluoroalkylene) chain containing a repeating unit represented by formula 31 and two or more groups represented by formula 32, and not containing a repeating unit represented by formula 21; A composition comprising:
R 11 - (OX) m -Y -Z (R 12) q (R 13) r-q Formula 1
However, in Formula 1,
R 11 is a fluoroalkyl group.
X is a fluoroalkylene group having 1 or more carbon atoms and having 1 or more fluorine atoms.
m is an integer of 0-4.
Y represents an alkylene group which may have —O—, —C (O) N (R 14 ) — or —C (O) —, a single bond, —O—, —C (O) N (R 14 )-or -C (O)-. The alkylene group that may have —O—, —C (O) N (R 14 ) —, or —C (O) — may have a fluorine atom. However, the Y is -OCF 2 - when is an alkylene group containing, -OCF 2 in the alkylene group - number of is one.
R 14 is a hydrogen atom or an alkyl group.
Z is a carbon atom, a silicon atom or a nitrogen atom.
R 12 is a hydrogen atom, a hydroxyl group or an alkyl group.
R 13 is —L 1 —Si (R 1 ) n1 L 3-n1 . R 1 is a monovalent hydrocarbon group. L is a hydrolyzable group or a hydroxyl group. n1 is an integer of 0-2. L 1 is an alkylene group which may have —O—.
When Z is a carbon atom or a silicon atom, r is 3 and q is an integer of 0 to 1. When Z is a nitrogen atom, r is 2 and q is 0.
(OX 2 ) Formula 21
—Si (R 2 ) n2 L 2 3-n2 Formula 22
However, in Formula 21 and Formula 22,
X 2 is a fluoroalkylene group having one or more hydrogen atoms.
R 2 is a monovalent hydrocarbon group.
L 2 is a hydrolyzable group or a hydroxyl group.
n2 is an integer of 0-2.
(OX 3 ) m3 formula 31
—Si (R 3 ) n3 L 3 3-n3 Formula 32
However, in Formula 31 and Formula 32,
X 3 is a perfluoroalkylene group.
m3 is an integer of 5 or more.
R 3 is a monovalent hydrocarbon group.
L 3 is a hydrolyzable group or a hydroxyl group. n3 is an integer of 0-2.
[2] The composition according to [1], wherein m in the formula (1) is 0 or 1.
[3] The composition according to [1] or [2], wherein the compound 2 is a compound represented by the formula 2.
R 21 - [(OX 2) m2 (OX 21) m20] -Y 2 -Z 2 (R 22) q2 (R 23) r2-q2 formula 2
However, in Formula 2,
R 21 is an alkyl group which may have a fluorine atom, or —Y 2 —Z 2 (R 22 ) q2 (R 23 ) r2-q2 .
X 2 is a fluoroalkylene group having one or more hydrogen atoms.
X 21 is a perfluoroalkylene group.
Y 2 is a single bond or a divalent linking group.
Z 2 is a carbon atom, a silicon atom or a nitrogen atom.
R 22 is a hydrogen atom, a hydroxyl group or an alkyl group.
R 23 is —L 21 —Si (R 2 ) n2 L 2 3-n2 . L 21 is an alkylene group which may have —O—. R 2 is a monovalent hydrocarbon group. L 2 is a hydrolyzable group or a hydroxyl group. n2 is an integer of 0-2.
m2 is an integer of 2 or more, m20 is an integer of 0 or more, and m2 + m20 is an integer of 5 or more.
If Z 2 is a carbon atom or a silicon atom, r2 is 3, q2 is an integer of 0-2. If Z 2 is a nitrogen atom, r2 is 2, q2 is an integer of 0-1.
[4] The composition according to any one of [1] to [3], wherein the compound 3 is a compound represented by formula 3.
[A- (OX 3 ) m3 −] j Z 3 [—Si (R 3 ) n3 L 3 3-n3 ] g Formula 3
However, in the formula:
A is a perfluoroalkyl group or —Q [—Si (R 3 ) n3 L 3 3-n3 ] k .
Q is a (k + 1) -valent linking group.
k is an integer of 1 to 10.
R 3 is a monovalent hydrocarbon group.
L 3 is a hydrolyzable group or a hydroxyl group. n3 is an integer of 0-2.
X 3 is a perfluoroalkylene group.
m3 is an integer of 5 or more.
Z 3 is a (j + g) -valent linking group.
j is an integer of 1 or more.
g is an integer of 1 or more. However, when A is a perfluoroalkyl group, g is an integer of 2 or more, and when A is —Q [—Si (R 3 ) n3 L 3 3-n3 ] k , g + k is an integer of 2 or more. is there.
[5] The difference in number average molecular weight between at least one compound selected from the group consisting of the compound 1 and the compound 2 and the compound 3 is 0 to 3,000, [1] to [4] A composition according to any one of the above.
[6] The composition according to any one of [1] to [5], wherein the content of the compound 3 relative to the total content of the compound 1 and the compound 2 is 0.1 to 4 by mass ratio. object.
[7] The composition according to any one of [1] to [6], comprising a fluorinated organic solvent, a non-fluorinated organic solvent, or a liquid medium containing water.
[8] An article comprising a substrate and a surface layer formed from the composition according to any one of [1] to [7] on the substrate.
[9] The article according to [8], which is formed from the composition by a dry coating method.
[10] The article according to [8] or [9], wherein the substrate is metal, resin, glass, sapphire, ceramic, stone, or a composite material thereof.
[11] The article according to any one of [8] to [10], wherein the film thickness of the surface layer is 1 to 100 nm.
[12] The article according to any one of [8] to [11], wherein a protective film is adhered to the surface of the surface layer.
 本発明によれば、耐摩擦性を有し、基材や、保護フィルムとの密着性に優れた表面層を形成できる組成物、および物品を提供できる。 According to the present invention, it is possible to provide a composition and an article that have a friction resistance and can form a surface layer having excellent adhesion to a substrate and a protective film.
 本明細書における用語の意味及び記載の仕方は下記のとおりである。
 「式21で表される繰り返し単位」を単位21と記す。他の式で表される繰り返し単位もこれに準じて記す。
 「式22で表される基」を基22と記す。他の式で表される基もこれに準じて記す。
 「アルキレン基がA基を有していてもよい」という場合、アルキレン基は、アルキレン基中の炭素-炭素原子間にA基を有していてもよいし、アルキレン基-A基-のように末端にA基を有していてもよい。
The meanings of terms in this specification and how to describe them are as follows.
“Repeating unit represented by Formula 21” will be referred to as unit 21. Repeating units represented by other formulas are also described accordingly.
The “group represented by the formula 22” is referred to as a group 22. Groups represented by other formulas are also described in the same manner.
When "an alkylene group may have an A group" is mentioned, the alkylene group may have an A group between carbon-carbon atoms in the alkylene group, or an alkylene group-A group- May have an A group at its terminal.
 「2価のオルガノポリシロキサン残基」とは、下式で表される基である。下式におけるRは、アルキル基(好ましくは炭素数1~10)、または、フェニル基である。また、g1は、1以上の整数であり、1~9の整数が好ましく、1~4の整数が特に好ましい。 The “divalent organopolysiloxane residue” is a group represented by the following formula. R x in the following formula is an alkyl group (preferably having 1 to 10 carbon atoms) or a phenyl group. G1 is an integer of 1 or more, preferably an integer of 1 to 9, and particularly preferably an integer of 1 to 4.
Figure JPOXMLDOC01-appb-C000001
Figure JPOXMLDOC01-appb-C000001
 「シルフェニレン骨格基」とは、-Si(RPhSi(R-(ただし、Phはフェニレン基であり、Rは1価の有機基である。)で表される基である。Rとしては、アルキル基(好ましくは炭素数1~10)が好ましい。
 「ジアルキルシリレン基」は、-Si(R-(ただし、Rはアルキル基(好ましくは炭素数1~10)である。)で表される基である。
 「表面層」とは、基材上に形成される層を意味する。なお、表面層は、基材上に直接形成されてもよいし、基材の表面に形成された他の層を介して基材上に形成されてもよい。
 「数平均分子量(以下、Mnともいう。)」は、H-NMRおよび19F-NMRによって、末端基を基準にしてオキシフルオロアルキレン基の数(平均値)を求めることによって算出される。
The “silphenylene skeleton group” is a group represented by —Si (R y ) 2 PhSi (R y ) 2 — (where Ph is a phenylene group and R y is a monovalent organic group). It is. R y is preferably an alkyl group (preferably having 1 to 10 carbon atoms).
The “dialkylsilylene group” is a group represented by —Si (R z ) 2 — (wherein R z is an alkyl group (preferably having 1 to 10 carbon atoms)).
“Surface layer” means a layer formed on a substrate. In addition, a surface layer may be directly formed on a base material, and may be formed on a base material through the other layer formed on the surface of the base material.
“Number average molecular weight (hereinafter also referred to as Mn)” is calculated by determining the number (average value) of oxyfluoroalkylene groups based on terminal groups by 1 H-NMR and 19 F-NMR.
 加水分解性シリル基は、加水分解反応によりSi-OHで表されるシラノール基となる基を意味する。シラノール基は、シラノール基間で反応してSi-O-Si結合を形成する。また、シラノール基は、基材の表面の水酸基(基材-OH)と脱水縮合反応して、化学結合(基材-O-Si)を形成できると考えられる。加水分解性シリル基は、たとえば化合物1における-Si(Rn13-n1である。 The hydrolyzable silyl group means a group that becomes a silanol group represented by Si—OH by a hydrolysis reaction. Silanol groups react between the silanol groups to form Si—O—Si bonds. In addition, it is considered that the silanol group can form a chemical bond (base material—O—Si) by a dehydration condensation reaction with a hydroxyl group (base material—OH) on the surface of the base material. The hydrolyzable silyl group is, for example, —Si (R 1 ) n1 L 3-n1 in Compound 1.
〔組成物〕
 本発明の組成物(以下、「本組成物」ともいう。)は、式1で表される化合物1、および、単位21を含むポリ(オキシフルオロアルキレン)鎖と基22とを有する化合物2からなる群より選択される少なくとも1種の化合物と、単位31を含むポリ(オキシペルフルオロアルキレン)鎖と2個以上の基32とを有し、単位21を含まない化合物3と、を含む。
 本組成物を用いて形成される表面層は、耐摩擦性に優れる。この理由としては、基32を2個以上有する化合物3を用いることで、本組成物と基材との反応点が増加して、表面層と基材との密着性が良好になったためと推測される。
〔Composition〕
The composition of the present invention (hereinafter also referred to as “the present composition”) is composed of Compound 1 represented by Formula 1 and Compound 2 having a poly (oxyfluoroalkylene) chain containing unit 21 and a group 22. And at least one compound selected from the group, and a compound 3 having a poly (oxyperfluoroalkylene) chain containing the unit 31 and two or more groups 32 and not containing the unit 21.
The surface layer formed using this composition is excellent in friction resistance. The reason for this is presumed that by using Compound 3 having two or more groups 32, the reaction point between the present composition and the substrate increased, and the adhesion between the surface layer and the substrate was improved. Is done.
 また、本組成物を用いて形成される表面層は、保護フィルムとの密着性に優れる。この理由としては、化合物1における(OX)で表されるオキシフルオロアルキレン鎖の繰り返し単位数(m)が0~4と少ないことで、保護フィルムが有する粘着剤との親和性が向上したためと考えられる。また、化合物2が水素原子を有する単位21を含むポリ(オキシフルオロアルキレン)鎖を有することで、水素原子を有しないポリ(オキシフルオロアルキレン)鎖を用いた場合と比較して、表面張力が増大したためと考えられる。 Moreover, the surface layer formed using this composition is excellent in adhesiveness with a protective film. The reason for this is thought to be that the number of repeating units (m) of the oxyfluoroalkylene chain represented by (OX) in Compound 1 is as small as 0 to 4, thereby improving the affinity with the adhesive of the protective film. It is done. In addition, since the compound 2 has a poly (oxyfluoroalkylene) chain containing the unit 21 having a hydrogen atom, the surface tension is increased as compared with a case where a poly (oxyfluoroalkylene) chain having no hydrogen atom is used. It is thought that it was because.
 保護フィルムとしては、粘着剤付き樹脂フィルムが挙げられる。粘着剤としては、アクリル系粘着剤、ウレタン系粘着剤またはシリコーン系粘着剤が挙げられ、剥離しやすい観点からアクリル系粘着剤が好ましい。樹脂フィルムとしては、ポリ塩化ビニルフィルム、ポリエチレンフィルム、ポリプロピレンフィルム、ポリカーボネートフィルム、ポリエステルフィルムまたはポリウレタンフィルムが挙げられる。剥離しやすい観点からポリ塩化ビニルフィルム、ポリエチレンフィルムまたはポリプロピレンフィルムが好ましい。 Examples of the protective film include a resin film with an adhesive. Examples of the pressure-sensitive adhesive include acrylic pressure-sensitive adhesives, urethane pressure-sensitive adhesives, and silicone-based pressure-sensitive adhesives, and acrylic pressure-sensitive adhesives are preferable from the viewpoint of easy peeling. Examples of the resin film include a polyvinyl chloride film, a polyethylene film, a polypropylene film, a polycarbonate film, a polyester film, and a polyurethane film. From the viewpoint of easy peeling, a polyvinyl chloride film, a polyethylene film or a polypropylene film is preferred.
(化合物1)
 化合物1は、式1で表される。
 R11-(OX)-Y-Z(R12(R13r-q  式1
 R11は、フルオロアルキル基(1個以上のフッ素原子を有するアルキル基)であり、ペルフルオロアルキル基であることが好ましい。
 フルオロアルキル基中の炭素数は、表面層の耐候性および耐食性がより優れる点から、1~20が好ましく、1~10がより好ましく、1~6がさらに好ましく、1~3が特に好ましい。フルオロアルキル基は、直鎖状、分岐鎖状および環状のいずれでもよい。
(Compound 1)
Compound 1 is represented by Formula 1.
R 11 - (OX) m -Y -Z (R 12) q (R 13) r-q Formula 1
R 11 is a fluoroalkyl group (an alkyl group having one or more fluorine atoms), and is preferably a perfluoroalkyl group.
The number of carbon atoms in the fluoroalkyl group is preferably from 1 to 20, more preferably from 1 to 10, even more preferably from 1 to 6, and particularly preferably from 1 to 3 from the viewpoint of better weather resistance and corrosion resistance of the surface layer. The fluoroalkyl group may be linear, branched or cyclic.
 Xは、1個以上のフッ素原子を有する炭素数1以上のフルオロアルキレン基である。
 フルオロアルキレン基の炭素数は、1以上であり、表面層の耐候性および耐食性がより優れる点から、2以上が好ましく、2~6がより好ましく、2~3が特に好ましい。
 フルオロアルキレン基は、直鎖状であっても分岐鎖状であってもよいが、本発明の効果がより優れる点から、直鎖状が好ましい。
 フルオロアルキレン基は、フッ素原子を1個以上有する。フルオロアルキレン基のフッ素原子の数は、表面層の耐食性がより優れる点から、2~10個が好ましく、2~4個が特に好ましい。
 フルオロアルキレン基は、フルオロアルキレン基中の全ての水素原子がフッ素原子に置換された基(ペルフルオロアルキレン基)であってもよい。
X is a fluoroalkylene group having 1 or more carbon atoms and having 1 or more fluorine atoms.
The number of carbon atoms of the fluoroalkylene group is 1 or more, preferably 2 or more, more preferably 2 to 6, and particularly preferably 2 to 3 from the viewpoint of better weather resistance and corrosion resistance of the surface layer.
The fluoroalkylene group may be linear or branched, but is preferably linear because the effects of the present invention are more excellent.
The fluoroalkylene group has one or more fluorine atoms. The number of fluorine atoms in the fluoroalkylene group is preferably 2 to 10 and particularly preferably 2 to 4 in view of better corrosion resistance of the surface layer.
The fluoroalkylene group may be a group in which all hydrogen atoms in the fluoroalkylene group are substituted with fluorine atoms (perfluoroalkylene group).
 (OX)の具体例としては、OCHF、OCF、OCHFCF、OCFCF、OCF(CF)CFが挙げられる。 Specific examples of (OX) include OCHF, OCF 2 , OCHFCF 2 , OCF 2 CF 2 , and OCF (CF 3 ) CF 2 .
 mは、0~4の整数であり、保護フィルムに対する表面層の密着性と表面層の耐摩擦性とのバランスに優れる点で、0~3が好ましく、0または1がより好ましい。
 mが0の場合、(OX)は単結合である。
m is an integer of 0 to 4, and is preferably 0 to 3, more preferably 0 or 1, from the viewpoint of excellent balance between the adhesion of the surface layer to the protective film and the friction resistance of the surface layer.
When m is 0, (OX) m is a single bond.
 なお、mが2以上の場合、複数のOXは同一であっても異なっていてもよい。つまり、(OX)は、異なる2種以上のOXから構成されていてもよい。2種以上の(OX)の結合順序は限定されず、ランダム、交互、ブロックに配置されてもよい。 When m is 2 or more, the plurality of OXs may be the same or different. That is, (OX) m may be composed of two or more different types of OX. The order of combining two or more types of (OX) is not limited, and they may be arranged randomly, alternately, or in blocks.
 Yは、-O-、-C(O)N(R14)-もしくは-C(O)-を有していてもよいアルキレン基、単結合、-O-、-C(O)N(R14)-または-C(O)-である。
 アルキレン基が-O-、-C(O)N(R14)-または-C(O)-を有する場合、炭素-炭素原子間および(OX)側の末端の少なくとも一方にこれらの基を有することが好ましい。
 アルキレン基は、-O-、-C(O)N(R14)-および-C(O)-からなる群から選択される基を複数有していてもよい。アルキレン基が-O-、-C(O)N(R14)-および-C(O)-からなる群から選択される基を複数有する場合、炭素-炭素原子間および(OX)側の末端の両方にこれらの基を有することが好ましい。
 -O-、-C(O)N(R14)-または-C(O)-を有していてもよいアルキレン基の炭素数は、1~10が好ましく、1~6が特に好ましい。
 -O-、-C(O)N(R14)-または-C(O)-を有していてもよいアルキレン基は、フッ素原子を有していてもよい。つまり、アルキレン基中の水素原子が、フッ素原子で置換されていてもよい。
 R14は、水素原子またはアルキル基(好ましくは炭素数1~10)である。
 ここで、Yが-OCF-を含むアルキレン基である場合、上記アルキレン基中の-OCF-の数は1個である。たとえば、-OCF-で表されるアルキレン基、-OCFCHOCHCHCH-で表されるアルキレン基および-OCFC(O)NHCH-で表されるアルキレン基はいずれも、-OCF-の数が1個であり、Yの定義を満たす。これに対して、-OCFOCF-で表されるアルキレン基および-OCFOCFOCF-で表されるアルキレン基等、-OCF-の数が2個以上のアルキレン基は、Yの定義を満たさない。
 -O-、-C(O)N(R)-または-C(O)-を有していてもよいアルキレン基の具体例としては、-CHCH-、-C(O)NHCH-、-C(O)N(CH)CH-、-OCFC(O)NHCH-、-OCH-、-OCF-、-CHOCHCHCH-、OCFCHOCHCHCH-、-CHCHOCHCHCH-が挙げられる。
Y represents an alkylene group which may have —O—, —C (O) N (R 14 ) — or —C (O) —, a single bond, —O—, —C (O) N (R 14 )-or -C (O)-.
When the alkylene group has —O—, —C (O) N (R 14 ) —, or —C (O) —, these groups are attached to at least one of the carbon-carbon atom and (OX) m- side ends. It is preferable to have.
The alkylene group may have a plurality of groups selected from the group consisting of —O—, —C (O) N (R 14 ) —, and —C (O) —. When the alkylene group has a plurality of groups selected from the group consisting of —O—, —C (O) N (R 14 ) —, and —C (O) —, the carbon-carbon atom and (OX) m side It is preferable to have these groups at both ends.
The alkylene group which may have —O—, —C (O) N (R 14 ) — or —C (O) — preferably has 1 to 10 carbon atoms, particularly preferably 1 to 6.
The alkylene group which may have —O—, —C (O) N (R 14 ) — or —C (O) — may have a fluorine atom. That is, the hydrogen atom in the alkylene group may be substituted with a fluorine atom.
R 14 is a hydrogen atom or an alkyl group (preferably having 1 to 10 carbon atoms).
Here, Y is -OCF 2 - when is an alkylene group containing, -OCF 2 in the alkylene group - number of is one. For example, an alkylene group represented by —OCF 2 —, an alkylene group represented by —OCF 2 CH 2 OCH 2 CH 2 CH 2 —, and an alkylene group represented by —OCF 2 C (O) NHCH 2 — However, the number of —OCF 2 — is one and satisfies the definition of Y. On the other hand, an alkylene group having two or more —OCF 2 — such as an alkylene group represented by —OCF 2 OCF 2 — and an alkylene group represented by —OCF 2 OCF 2 OCF 2 — Does not meet the definition of
Specific examples of the alkylene group which may have —O—, —C (O) N (R 4 ) —, or —C (O) — include —CH 2 CH 2 —, —C (O) NHCH. 2 —, —C (O) N (CH 3 ) CH 2 —, —OCF 2 C (O) NHCH 2 —, —OCH 2 —, —OCF 2 —, —CH 2 OCH 2 CH 2 CH 2 —, OCF 2 CH 2 OCH 2 CH 2 CH 2 —, —CH 2 CH 2 OCH 2 CH 2 CH 2 —.
 Zは、炭素原子、窒素原子またはケイ素原子である。
 Zが炭素原子またはケイ素原子の場合、rは3であり、qは0~1の整数(好ましくは0)である。Zが窒素原子の場合、rは2であり、qは0である。
Z is a carbon atom, a nitrogen atom or a silicon atom.
When Z is a carbon atom or a silicon atom, r is 3, and q is an integer of 0 to 1 (preferably 0). When Z is a nitrogen atom, r is 2 and q is 0.
 R12は、水素原子、水酸基またはアルキル基である。
 アルキル基の炭素数は、1~5が好ましく、1~3がより好ましく、1が特に好ましい。
R 12 is a hydrogen atom, a hydroxyl group or an alkyl group.
The alkyl group preferably has 1 to 5 carbon atoms, more preferably 1 to 3 carbon atoms, and particularly preferably 1 carbon atom.
 R13は、-L-Si(Rn13-n1である。
 Lは、-O-を有していてもよいアルキレン基である。
 アルキレン基が-O-を有する場合、炭素-炭素原子間またはZ側の末端に-O-を有することが好ましい。
 Lの炭素数は、1~10が好ましく、1~6がより好ましく、1~4が特に好ましい。
 R13が1分子中に複数ある場合、複数あるR13は、同じであっても異なっていてもよい。原料の入手容易性や化合物1の製造容易性の点からは、互いに同じであることが好ましい。
R 13 is —L 1 —Si (R 1 ) n1 L 3-n1 .
L 1 is an alkylene group which may have —O—.
When the alkylene group has —O—, it is preferable to have —O— between carbon-carbon atoms or at the terminal on the Z side.
L 1 preferably has 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms, and particularly preferably 1 to 4 carbon atoms.
When there are a plurality of R 13 in one molecule, the plurality of R 13 may be the same or different. From the viewpoint of easy availability of raw materials and ease of production of Compound 1, they are preferably the same.
 Rは、1価の炭化水素基であり、1価の飽和炭化水素基が好ましい。Rの炭素数は、1~6が好ましく、1~3がより好ましく、1または2が特に好ましい。 R 1 is a monovalent hydrocarbon group, preferably a monovalent saturated hydrocarbon group. The carbon number of R 1 is preferably 1 to 6, more preferably 1 to 3, and particularly preferably 1 or 2.
 Lは、加水分解性基または水酸基である。すなわち、Lが加水分解性基である場合、Si-Lで表される基は加水分解性シリル基である。 L is a hydrolyzable group or a hydroxyl group. That is, when L is a hydrolyzable group, the group represented by Si—L is a hydrolyzable silyl group.
 Lの具体例としては、アルコキシ基、ハロゲン原子、アシル基、イソシアナート基(-NCO)が挙げられる。アルコキシ基としては、炭素数1~4のアルコキシ基が好ましい。ハロゲン原子としては、塩素原子が好ましい。
 Lとしては、化合物1の製造がより容易である点から、炭素数1~4のアルコキシ基またはハロゲン原子が好ましい。Lとしては、塗布時のアウトガスが少なく、化合物1の保存安定性がより優れる点から、炭素数1~4のアルコキシ基が好ましく、化合物1の長期の保存安定性が必要な場合にはエトキシ基が特に好ましく、塗布後の反応時間を短時間とする場合にはメトキシ基が特に好ましい。
Specific examples of L include an alkoxy group, a halogen atom, an acyl group, and an isocyanate group (—NCO). As the alkoxy group, an alkoxy group having 1 to 4 carbon atoms is preferable. As the halogen atom, a chlorine atom is preferable.
L is preferably an alkoxy group having 1 to 4 carbon atoms or a halogen atom from the viewpoint of easier production of compound 1. L is preferably an alkoxy group having 1 to 4 carbon atoms from the viewpoint of less outgassing at the time of coating and better storage stability of Compound 1, and an ethoxy group when long-term storage stability of Compound 1 is required. Is particularly preferred, and a methoxy group is particularly preferred when the reaction time after coating is short.
 n1は、0~2の整数である。
 n1は、0または1が好ましく、0が特に好ましい。Lが複数存在することによって、表面層の基材への密着性がより強固になる。
 n1が1以下である場合、1分子中に存在する複数のLは同じであっても異なっていてもよい。原料の入手容易性や化合物1の製造容易性の点からは、互いに同じであることが好ましい。
n1 is an integer of 0-2.
n1 is preferably 0 or 1, particularly preferably 0. By the presence of a plurality of L, the adhesion of the surface layer to the substrate becomes stronger.
When n1 is 1 or less, a plurality of L present in one molecule may be the same or different. From the viewpoint of easy availability of raw materials and ease of production of Compound 1, they are preferably the same.
 化合物1の具体例としては、以下の例示1~48が挙げられる。 Specific examples of compound 1 include the following examples 1 to 48.
Figure JPOXMLDOC01-appb-C000002
Figure JPOXMLDOC01-appb-C000002
Figure JPOXMLDOC01-appb-C000003
Figure JPOXMLDOC01-appb-C000003
 化合物1は、公知の製造方法によって製造できる。たとえば、化合物1は、式1Aで表される化合物をHSi(Rn13-n1(R、L、n1の定義は上述の通りである。)とヒドロシリル化反応させることによって製造できる。
  R11-(OX)-Y-Z(R12(L1A-CH=CHr-q  式1A
 式中、R11、X、m、Y、Z、R12、q、rの定義は上述の通りであり、L1Aは-O-を有していてもよいアルキレン基、単結合または-O-であり、L1A-CH=CHがヒドロシリル化されると化合物1のLになる。式1Aで表される化合物は、たとえばYが-C(O)NHCH-の場合、R11-OH(R11の定義は上述の通りである。)を原料として公知の方法でR11-(OX)-C(O)OR1B(R1Bは炭素数1~6のアルキル基。)を得て、NH-CH-Z(R12(L1A-CH=CHr-qと反応させて製造できる。
Compound 1 can be produced by a known production method. For example, Compound 1 can be produced by subjecting a compound represented by Formula 1A to a hydrosilylation reaction with HSi (R 1 ) n1 L 3-n1 (wherein R 1 , L and n1 are as defined above). .
R 11 — (OX) m —YZ (R 12 ) q (L 1A —CH═CH 2 ) rq Formula 1A
In the formula, the definitions of R 11 , X, m, Y, Z, R 12 , q, and r are as described above, and L 1A is an alkylene group that may have —O—, a single bond, or —O When L 1A —CH═CH 2 is hydrosilylated, it becomes L 1 of Compound 1. Compounds of the formula 1A, for example Y is -C (O) NHCH 2 - For, R 11 -OH (. The definition of R 11 are as described above) R 11 in a known manner as a raw material - (OX) m —C (O) OR 1B (R 1B is an alkyl group having 1 to 6 carbon atoms) was obtained, and NH 2 —CH 2 —Z (R 12 ) q (L 1A —CH═CH 2 ) It can be produced by reacting with rq .
(化合物2)
 化合物2は、単位21を含むポリ(オキシフルオロアルキレン)鎖を有する。
 (OX)  式21
 Xは、1個以上の水素原子を有するフルオロアルキレン基である。
 フルオロアルキレン基の炭素数は、1~6が好ましく、2~4が特に好ましい。
 フルオロアルキレン基が有する水素原子は、1個以上であり、保護フィルムに対する表面層の密着性と表面層の耐摩擦性とのバランスに優れる点で、1~3個が好ましく、1または2個が特に好ましい。
(Compound 2)
Compound 2 has a poly (oxyfluoroalkylene) chain containing units 21.
(OX 2 ) Formula 21
X 2 is a fluoroalkylene group having one or more hydrogen atoms.
The carbon number of the fluoroalkylene group is preferably 1-6, and particularly preferably 2-4.
The fluoroalkylene group has one or more hydrogen atoms, preferably 1 to 3 in terms of excellent balance between the adhesion of the surface layer to the protective film and the friction resistance of the surface layer, and 1 or 2 Particularly preferred.
 フルオロアルキレン基は、1個以上のフッ素原子を有する。フルオロアルキレン基が有するフッ素原子は、1個以上であり、保護フィルムに対する表面層の密着性と表面層の耐摩擦性とのバランスに優れる点で、1~11個が好ましく、2~7個が特に好ましい。
 Xは、直鎖状であっても分岐鎖状であってもよく、表面層の耐摩擦性がより優れる点から直鎖状が好ましい。
A fluoroalkylene group has one or more fluorine atoms. The fluoroalkylene group has one or more fluorine atoms, preferably 1 to 11 in terms of excellent balance between the adhesion of the surface layer to the protective film and the friction resistance of the surface layer, preferably 2 to 7 Particularly preferred.
X 2 may be linear or branched, and is preferably linear because the surface layer is more excellent in friction resistance.
 単位21の具体例としては、OCHF、-OCFCHF-、-OCHFCF-、-OCFCH-、-OCHCF-、-OCFCFCHF-、-OCHFCFCF-、-OCFCFCH-、-OCHCFCF-、-OCFCFCFCH-、-OCHCFCFCF-、-OCFCFCFCFCH-、-OCHCFCFCFCF-、-OCFCFCFCFCFCH-、-OCHCFCFCFCFCF-が挙げられる。 Specific examples of the unit 21, OCHF, -OCF 2 CHF - , - OCHFCF 2 -, - OCF 2 CH 2 -, - OCH 2 CF 2 -, - OCF 2 CF 2 CHF -, - OCHFCF 2 CF 2 -, -OCF 2 CF 2 CH 2 -, - OCH 2 CF 2 CF 2 -, - OCF 2 CF 2 CF 2 CH 2 -, - OCH 2 CF 2 CF 2 CF 2 -, - OCF 2 CF 2 CF 2 CF 2 CH 2 —, —OCH 2 CF 2 CF 2 CF 2 CF 2 —, —OCF 2 CF 2 CF 2 CF 2 CF 2 CH 2 —, and —OCH 2 CF 2 CF 2 CF 2 CF 2 CF 2 —.
 ポリ(オキシフルオロアルキレン)鎖中に含まれる単位21の繰り返し数m2は、2以上の整数が好ましく、2~200の整数がより好ましく、5~150の整数がさらに好ましく、5~100の整数が特に好ましく、10~50の整数が最も好ましい。 The number m2 of repeating units 21 contained in the poly (oxyfluoroalkylene) chain is preferably an integer of 2 or more, more preferably an integer of 2 to 200, still more preferably an integer of 5 to 150, and an integer of 5 to 100. Particularly preferred is an integer of 10 to 50.
 ポリ(オキシフルオロアルキレン)鎖は、1種のみの単位21を含んでいてもよく、2種以上の単位21を含んでいてもよい。
 2種以上の単位21としては、たとえば、炭素数の異なる2種以上の単位21、水素原子の数が異なる2種以上の単位21、炭素数が同じであっても側鎖の有無や側鎖の種類が異なる2種以上の単位21が挙げられる。
 2種以上の単位21の結合順序は限定されず、ランダム、交互、ブロックに配置されてもよい。
The poly (oxyfluoroalkylene) chain may contain only one type of unit 21 or may contain two or more types of units 21.
Examples of the two or more types of units 21 include two or more types of units 21 having different carbon numbers, two or more types of units 21 having different numbers of hydrogen atoms, and the presence or absence of side chains or side chains even if the number of carbons is the same. Two or more types of units 21 having different types may be mentioned.
The coupling order of the two or more types of units 21 is not limited, and they may be arranged randomly, alternately, or in blocks.
 ポリ(オキシフルオロアルキレン)鎖が有する(OXm2としては、(OCHF)m21(OCma(4-ma)m22(OCmb(6-mb)m23(OCmc(8-mc)m24(OCmd(10-md)m25(OCme(12-me)m26が好ましい。
 maは1~3の整数であり、mbは1~5の整数であり、mcは1~7の整数であり、mdは1~9の整数であり、meは1~11の整数である。
 m21、m22、m23、m24、m25およびm26は、それぞれ独立に、0以上の整数であり、100以下が好ましい。
 m21+m22+m23+m24+m25+m26は2以上の整数であり、2~200の整数がより好ましく、5~150の整数がより好ましく、5~100の整数がさらに好ましく、10~50の整数が特に好ましい。
 なかでも、化合物2の非フッ素系有機溶媒に対する溶解性がより優れる点で、m22は1以上の整数が好ましく、2~200の整数が特に好ましい。
 また、Cmb(6-mb)、Cmc(8-mc)、Cmd(10-md)およびCme(12-me)は、直鎖状であっても分岐鎖状であってもよく、表面層の耐摩擦性がより優れる点から直鎖状が好ましい。
The (OX 2 ) m2 possessed by the poly (oxyfluoroalkylene) chain is (OCHF) m21 (OC 2 H ma F (4-ma) ) m22 (OC 3 H mb F (6-mb) ) m23 (OC 4 H mc F (8-mc) ) m24 (OC 5 H md F (10-md)) m25 (OC 6 H me F (12-me)) m26 is preferred.
ma is an integer of 1 to 3, mb is an integer of 1 to 5, mc is an integer of 1 to 7, md is an integer of 1 to 9, and me is an integer of 1 to 11.
m21, m22, m23, m24, m25 and m26 are each independently an integer of 0 or more, preferably 100 or less.
m21 + m22 + m23 + m24 + m25 + m26 is an integer of 2 or more, more preferably an integer of 2 to 200, more preferably an integer of 5 to 150, still more preferably an integer of 5 to 100, and particularly preferably an integer of 10 to 50.
Among these, m22 is preferably an integer of 1 or more, and particularly preferably an integer of 2 to 200, from the viewpoint that the solubility of Compound 2 in a non-fluorine organic solvent is more excellent.
C 3 H mb F (6-mb) , C 4 H mc F (8-mc) , C 5 H md F (10-md) and C 6 H me F (12-me) are linear It may be a branched chain, and a straight chain is preferable from the viewpoint that the friction resistance of the surface layer is more excellent.
 なお、m21個の(OCHF)、m22個の(OCma(4-ma))、m23個の(OCmb(6-mb))、m24個の(OCmc(8-mc))、m25個の(OCmd(10-md))、m26個の(OCme(12-me))の結合順序は限定されない。
 m21が2以上の場合、複数の(OCHF)は同一であっても異なっていてもよい。
 m22が2以上の場合、複数の(OCma(4-ma))は同一であっても異なっていてもよい。
 m23が2以上の場合、複数の(OCmb(6-mb))は同一であっても異なっていてもよい。
 m24が2以上の場合、複数の(OCmc(8-mc))は同一であっても異なっていてもよい。
 m25が2以上の場合、複数の(OCmd(10-md))は同一であっても異なっていてもよい。
 m26が2以上の場合、複数の(OCme(12-me))は同一であっても異なっていてもよい。
It should be noted that m21 (OCHF), m22 (OC 2 H ma F (4-ma) ), m23 (OC 3 H mb F (6-mb) ), m24 (OC 4 H mc F (8-mc) ), m25 (OC 5 H md F (10-md) ), m26 (OC 6 H me F (12-me) ) are not limited in the joining order.
When m21 is 2 or more, a plurality of (OCHF) may be the same or different.
When m22 is 2 or more, a plurality of (OC 2 H ma F (4-ma) ) may be the same or different.
When m23 is 2 or more, a plurality of (OC 3 H mb F (6-mb) ) may be the same or different.
When m24 is 2 or more, the plurality of (OC 4 H mc F (8-mc) ) may be the same or different.
When m25 is 2 or more, a plurality of (OC 5 H md F (10-md) ) may be the same or different.
When m26 is 2 or more, a plurality of (OC 6 H me F (12-me) ) may be the same or different.
 なかでも、化合物2の非フッ素系有機溶媒に対する溶解性がより優れる点で、ポリ(オキシフルオロアルキレン)鎖が有する(OXm2としては、以下の(1)~(4)が好ましい。
(1)(OCma(4-ma)m22(OCmb(6-mb)m23
(2)(OCma(4-ma)m22(OCmc(8-mc)m24
(3)(OCma(4-ma)m22(OCmd(10-md)m25
(4)(OCma(4-ma)m22(OCme(12-me)m26
 上記(1)は、m21、m24、m25およびm26が0の態様に該当し、m22+m23は2以上の整数である。上記(2)は、m21、m23、m25およびm26が0の態様に該当し、m22+m24は2以上の整数である。上記(3)は、m21、m23、m24およびm26が0の態様に該当し、m22+m25は2以上の整数である。上記(4)は、m21、m23、m24およびm25が0の態様に該当し、m22+m26は2以上の整数である。
Among these, the following (1) to (4) are preferable as the (OX 2 ) m2 of the poly (oxyfluoroalkylene) chain in that the solubility of the compound 2 in the non-fluorine organic solvent is more excellent.
(1) (OC 2 H ma F (4-ma) ) m22 (OC 3 H mb F (6-mb) ) m23
(2) (OC 2 H ma F (4-ma) ) m22 (OC 4 H mc F (8-mc) ) m24
(3) (OC 2 H ma F (4-ma) ) m22 (OC 5 H md F (10-md) ) m25
(4) (OC 2 H ma F (4-ma) ) m22 (OC 6 H me F (12-me) ) m26
The above (1) corresponds to an embodiment in which m21, m24, m25 and m26 are 0, and m22 + m23 is an integer of 2 or more. The above (2) corresponds to an embodiment in which m21, m23, m25 and m26 are 0, and m22 + m24 is an integer of 2 or more. The above (3) corresponds to an embodiment in which m21, m23, m24 and m26 are 0, and m22 + m25 is an integer of 2 or more. The above (4) corresponds to an embodiment in which m21, m23, m24 and m25 are 0, and m22 + m26 is an integer of 2 or more.
 ポリ(オキシフルオロアルキレン)鎖は、単位21以外に、さらにオキシペルフルオロアルキレン単位を含んでいてもよい。
 具体的には、ポリ(オキシフルオロアルキレン)鎖は、単位23を含んでいてもよい。
 (OX21)  式23
 X21は、ペルフルオロアルキレン基である。ペルフルオロアルキレン基の炭素数は、1~6が好ましい。
In addition to the unit 21, the poly (oxyfluoroalkylene) chain may further contain an oxyperfluoroalkylene unit.
Specifically, the poly (oxyfluoroalkylene) chain may include units 23.
(OX 21 ) Formula 23
X 21 is a perfluoroalkylene group. The perfluoroalkylene group preferably has 1 to 6 carbon atoms.
 ペルフルオロアルキレン基は、直鎖状であっても分岐鎖状であってもよく、表面層の耐摩擦性がより優れる点から直鎖状が好ましい。 The perfluoroalkylene group may be linear or branched, and is preferably linear because the surface layer is more excellent in friction resistance.
 ポリ(オキシフルオロアルキレン)鎖は、1種のみの単位23を含んでいてもよく、2種以上の単位23を含んでいてもよい。
 2種以上の単位23としては、たとえば、炭素数の異なる2種以上の単位23、炭素数が同じであっても側鎖の有無や側鎖の種類が異なる2種以上の単位23が挙げられる。
The poly (oxyfluoroalkylene) chain may contain only one type of unit 23, or may contain two or more types of unit 23.
Examples of the two or more types of units 23 include two or more types of units 23 having different carbon numbers, and two or more types of units 23 having the same number of carbons but having different side chains and different types of side chains. .
 単位23の具体例としては、-OCF-、-OCFCF-、-OCFCFCF-、-OCF(CF)CF-、-OCFCFCFCF-、-OCF(CF)CFCF-、-OCFCFCFCFCF-、-OCFCFCFCFCFCF-が挙げられる。 Specific examples of the unit 23, -OCF 2 -, - OCF 2 CF 2 -, - OCF 2 CF 2 CF 2 -, - OCF (CF 3) CF 2 -, - OCF 2 CF 2 CF 2 CF 2 -, —OCF (CF 3 ) CF 2 CF 2 —, —OCF 2 CF 2 CF 2 CF 2 CF 2 —, —OCF 2 CF 2 CF 2 CF 2 CF 2 CF 2 — may be mentioned.
 ポリ(オキシフルオロアルキレン)鎖中に含まれる単位23の繰り返し数m20は、0以上の整数であり、0~200の整数が好ましく、0~50の整数がより好ましく、0~10の整数がさらに好ましく、0~2の整数が特に好ましい。 The repeating number m20 of the unit 23 contained in the poly (oxyfluoroalkylene) chain is an integer of 0 or more, preferably an integer of 0 to 200, more preferably an integer of 0 to 50, and further an integer of 0 to 10 An integer of 0 to 2 is preferable, and particularly preferable.
 ポリ(オキシフルオロアルキレン)鎖が、単位21および単位23を含む場合、単位21と単位23との結合順序は限定されない。たとえば、単位21と単位23とは、ランダム、交互、ブロックに配置されてもよい。
 ポリ(オキシフルオロアルキレン)鎖が、単位21のm2個と単位23のm20個を含む場合、m2+m20は、5以上の整数であり、5~400の整数が好ましく、5~200の整数がより好ましく、5~120の整数がさらに好ましく、10~52の整数が特に好ましい。
When the poly (oxyfluoroalkylene) chain includes the unit 21 and the unit 23, the bonding order of the unit 21 and the unit 23 is not limited. For example, the units 21 and 23 may be arranged randomly, alternately, or in blocks.
When the poly (oxyfluoroalkylene) chain contains m2 units 21 and m20 units 23, m2 + m20 is an integer of 5 or more, preferably an integer of 5 to 400, more preferably an integer of 5 to 200 An integer of 5 to 120 is more preferable, and an integer of 10 to 52 is particularly preferable.
 化合物2は、基22を有する。
 -Si(Rn2 3-n2  式22
 化合物2が有する基22の数は、1個以上であり、表面層の耐摩擦性がより優れる点で、2個以上が好ましく、2~10個がより好ましく、2~5個がさらに好ましく、2または3個が特に好ましい。
 基22が1分子中に複数ある場合、複数ある基22は、同じであっても異なっていてもよい。原料の入手容易性や化合物2の製造容易性の点からは、互いに同じであることが好ましい。
Compound 2 has a group 22.
—Si (R 2 ) n2 L 2 3-n2 Formula 22
The number of the groups 22 contained in the compound 2 is 1 or more, preferably 2 or more, more preferably 2 to 10, more preferably 2 to 5, in terms of more excellent friction resistance of the surface layer. Two or three are particularly preferred.
When there are a plurality of groups 22 in one molecule, the plurality of groups 22 may be the same or different. From the viewpoint of easy availability of raw materials and ease of production of Compound 2, it is preferable that they are the same.
 Rは、1価の炭化水素基であり、1価の飽和炭化水素基が好ましい。Rの炭素数は、1~6が好ましく、1~3がより好ましく、1または2が特に好ましい。
 Lは、加水分解性基または水酸基である。すなわち、Lが加水分解性基である場合、Si-Lで表される基は加水分解性シリル基である。
R 2 is a monovalent hydrocarbon group, preferably a monovalent saturated hydrocarbon group. R 2 preferably has 1 to 6 carbon atoms, more preferably 1 to 3, and particularly preferably 1 or 2.
L 2 is a hydrolyzable group or a hydroxyl group. That is, when L 2 is a hydrolyzable group, the group represented by Si—L 2 is a hydrolyzable silyl group.
 Lの具体例としては、アルコキシ基、ハロゲン原子、アシル基、イソシアナート基(-NCO)が挙げられる。アルコキシ基としては、炭素数1~4のアルコキシ基が好ましい。ハロゲン原子としては、塩素原子が好ましい。
 Lとしては、化合物2の製造がより容易である点から、炭素数1~4のアルコキシ基またはハロゲン原子が好ましい。Lとしては、塗布時のアウトガスが少なく、化合物2の保存安定性がより優れる点から、炭素数1~4のアルコキシ基が好ましく、化合物2の長期の保存安定性が必要な場合にはエトキシ基が特に好ましく、塗布後の反応時間を短時間とする場合にはメトキシ基が特に好ましい。
Specific examples of L 2 include an alkoxy group, a halogen atom, an acyl group, and an isocyanate group (—NCO). As the alkoxy group, an alkoxy group having 1 to 4 carbon atoms is preferable. As the halogen atom, a chlorine atom is preferable.
L 2 is preferably an alkoxy group having 1 to 4 carbon atoms or a halogen atom from the viewpoint that the production of compound 2 is easier. L 2 is preferably an alkoxy group having 1 to 4 carbon atoms from the viewpoint of less outgassing at the time of coating and better storage stability of compound 2, and ethoxy when long-term storage stability of compound 2 is required. A group is particularly preferred, and a methoxy group is particularly preferred when the reaction time after coating is short.
 n2は、0~2の整数である。
 n2は、0または1が好ましく、0が特に好ましい。Lが複数存在することによって、表面層の基材への密着性がより強固になる。
 n2が1以下である場合、1分子中に存在する複数のLは同じであっても異なっていてもよい。原料の入手容易性や化合物2の製造容易性の点からは、互いに同じであることが好ましい。n2が2である場合、1分子中に存在する複数のRは同じであっても異なっていてもよい。原料の入手容易性や化合物2の製造容易性の点からは、互いに同じであることが好ましい。
n2 is an integer of 0-2.
n2 is preferably 0 or 1, particularly preferably 0. The presence of a plurality of L 2 makes the adhesion of the surface layer to the substrate stronger.
When n2 is 1 or less, a plurality of L 2 present in one molecule may be the same or different. From the viewpoint of easy availability of raw materials and ease of production of Compound 2, it is preferable that they are the same. When n2 is 2, a plurality of R 2 present in one molecule may be the same or different. From the viewpoint of easy availability of raw materials and ease of production of Compound 2, it is preferable that they are the same.
 なお、化合物1および化合物2の両方に該当する化合物は、化合物1または化合物2の一方のみに該当するとして取り扱う。 Note that a compound corresponding to both compound 1 and compound 2 is treated as corresponding to only one of compound 1 or compound 2.
 化合物2としては、化合物2の保護フィルムに対する表面層の密着性および表面層の耐摩擦性により優れる点で、式2で表される化合物が好ましい。
 R21-[(OXm2(OX21m20]-Y-Z(R22q2(R23r2-q2  式2
The compound 2 is preferably a compound represented by the formula 2 in that it is superior in the adhesion of the surface layer to the protective film of the compound 2 and the friction resistance of the surface layer.
R 21 - [(OX 2) m2 (OX 21) m20] -Y 2 -Z 2 (R 22) q2 (R 23) r2-q2 formula 2
 R21は、フッ素原子を有していてもよいアルキル基、または、-Y-Z(R22q2(R23r2-q2である。なお、Y、Z、R、R23、r2およびq2の定義は、後述する通りである。
 フッ素原子を有していてもよいアルキル基中の炭素数は、保護フィルムに対する表面層の密着性および表面層の耐摩擦性により優れる点で、1~20が好ましく、1~10がより好ましく、1~6がさらに好ましく、1~3が特に好ましい。
 フッ素原子を有していてもよいアルキル基は、直鎖状であっても分岐鎖状であってもよく、表面層の耐摩擦性がより優れる点から直鎖状が好ましい。
 フッ素原子を有していてもよいアルキル基は、アルキル基中の全ての水素原子がフッ素原子に置換された基(ペルフルオロアルキル基)であってもよい。
R 21 is an alkyl group which may have a fluorine atom, or —Y 2 —Z 2 (R 22 ) q2 (R 23 ) r2-q2 . The definitions of Y 2 , Z 2 , R 1 , R 23 , r2 and q2 are as described later.
The number of carbon atoms in the alkyl group which may have a fluorine atom is preferably from 1 to 20, more preferably from 1 to 10, in terms of excellent adhesion of the surface layer to the protective film and friction resistance of the surface layer. 1 to 6 is more preferable, and 1 to 3 is particularly preferable.
The alkyl group which may have a fluorine atom may be linear or branched, and is preferably linear because the surface layer is more excellent in friction resistance.
The alkyl group which may have a fluorine atom may be a group (perfluoroalkyl group) in which all hydrogen atoms in the alkyl group are substituted with fluorine atoms.
 フッ素原子を有していてもよいアルキル基の具体例としては、CH-、CF-、CFCH-、CFCF-、CFCFCF-、(CFCH-、CFCFCFCFCHCH-、CFCFCFCFCFCFCHCH-が挙げられる。 Specific examples of the alkyl group which may have a fluorine atom include CH 3 —, CF 3 —, CF 3 CH 2 —, CF 3 CF 2 —, CF 3 CF 2 CF 2 —, (CF 3 ) 2. CH—, CF 3 CF 2 CF 2 CF 2 CH 2 CH 2 —, and CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 —.
 [(OXm2(OX21m20]で表される基は、ポリ(オキシフルオロアルキレン)鎖である。
 X、X21、m2およびm20の定義は、上述した通りである。ただし、式2におけるm2+m20は、5以上の整数であり、5~400の整数が好ましく、5~200の整数がより好ましく、5~120の整数がさらに好ましく、10~52の整数が特に好ましい。
 [(OXm2(OX21m20]において、(OX)と(OX21)との結合順序は限定されない。たとえば、(OX)と(OX21)とは、ランダム、交互、ブロックに配置されてもよい。
 また、複数の(OX)は、同一であっても異なっていてもよい。つまり、(OXm2は、Xが異なる2種以上の(OX)から構成されていてもよい。2種以上の(OX)の結合順序は限定されず、ランダム、交互、ブロックに配置されてもよい。
 さらに、m20が2以上の場合、複数の(OX21)は、同一であっても異なっていてもよい。つまり、(OX21m20は、X21が異なる2種以上の(OX21)から構成されていてもよい。2種以上の(OX21)の結合順序は限定されず、ランダム、交互、ブロックに配置されてもよい。
The group represented by [(OX 2 ) m2 (OX 21 ) m20 ] is a poly (oxyfluoroalkylene) chain.
The definitions of X 2 , X 21 , m2 and m20 are as described above. However, m2 + m20 in Formula 2 is an integer of 5 or more, preferably an integer of 5 to 400, more preferably an integer of 5 to 200, still more preferably an integer of 5 to 120, and particularly preferably an integer of 10 to 52.
In [(OX 2 ) m2 (OX 21 ) m20 ], the bonding order of (OX 2 ) and (OX 21 ) is not limited. For example, (OX 2 ) and (OX 21 ) may be arranged randomly, alternately, or in blocks.
The plurality of (OX 2 ) may be the same or different. That is, (OX 2 ) m2 may be composed of two or more types of (OX 2 ) with different X 2 . The order of combining two or more types of (OX 2 ) is not limited, and they may be arranged randomly, alternately, or in blocks.
Furthermore, when m20 is 2 or more, the plurality of (OX 21 ) may be the same or different. That is, (OX 21 ) m20 may be composed of two or more types of (OX 21 ) with different X 21 . The order of combining two or more types of (OX 21 ) is not limited, and they may be arranged randomly, alternately, or in blocks.
 [(OXm2(OX21m20]で表される基としては、[(OCHF)m21(OCma(4-ma)m22(OCmb(6-mb)m23(OCmc(8-mc)m24(OCmd(10-md)m25(OCme(12-me)m26(OX21m20]が好ましい。
 m21、m22、m23、m24、m25、m26、ma、mb、mc、mdおよびmeの定義は、上述した通りである。
As the group represented by [(OX 2 ) m2 (OX 21 ) m20 ], [(OCHF) m21 (OC 2 H ma F (4-ma) ) m22 (OC 3 H mb F (6-mb) ) m23 (OC 4 H mc F ( 8-mc)) m24 (OC 5 H md F (10-md)) m25 (OC 6 H me F (12-me)) m26 (OX 21) m20] are preferred.
The definitions of m21, m22, m23, m24, m25, m26, ma, mb, mc, md, and me are as described above.
 Yは、単結合または2価の連結基である。
 2価の連結基としては、たとえば、2価の炭化水素基(2価の飽和炭化水素基、2価の芳香族炭化水素基、アルケニレン基、アルキニレン基であってもよい。2価の飽和炭化水素基は、直鎖状、分岐鎖状または環状であってもよく、たとえば、アルキレン基が挙げられる。炭素数は1~20が好ましく、1~10がより好ましく、1~6が特に好ましい。また、2価の芳香族炭化水素基は、炭素数5~20が好ましく、たとえば、フェニレン基が挙げられる。それ以外にも、炭素数2~20のアルケニレン基、炭素数2~20のアルキニレン基であってもよい。)、2価の複素環基、-O-、-S-、-SO-、-N(R24)-、-C(O)-、-Si(R25-およびこれらを2種以上組み合わせた基が挙げられる。R24は、水素原子またはアルキル基(好ましくは炭素数1~10)である。R25は、アルキル基(好ましくは炭素数1~10)またはフェニル基である。
 なお、上記これらを2種以上組み合わせた基としては、たとえば、-C(O)N(R24)-、-C(O)N(R24)-アルキレン基-、-O-アルキレン基-、-OC(O)-が挙げられる。
Y 2 is a single bond or a divalent linking group.
Examples of the divalent linking group include a divalent hydrocarbon group (a divalent saturated hydrocarbon group, a divalent aromatic hydrocarbon group, an alkenylene group, and an alkynylene group. A divalent saturated carbonization group. The hydrogen group may be linear, branched or cyclic and includes, for example, an alkylene group, preferably 1 to 20, more preferably 1 to 10, and particularly preferably 1 to 6. In addition, the divalent aromatic hydrocarbon group preferably has 5 to 20 carbon atoms, and examples thereof include a phenylene group, other than that, an alkenylene group having 2 to 20 carbon atoms, and an alkynylene group having 2 to 20 carbon atoms. A divalent heterocyclic group, —O—, —S—, —SO 2 —, —N (R 24 ) —, —C (O) —, —Si (R 25 ) 2 -And a group obtained by combining two or more of these. R 24 is a hydrogen atom or an alkyl group (preferably having 1 to 10 carbon atoms). R 25 is an alkyl group (preferably having 1 to 10 carbon atoms) or a phenyl group.
Examples of the group in which two or more of these are combined include, for example, —C (O) N (R 24 ) —, —C (O) N (R 24 ) -alkylene group—, —O-alkylene group—, -OC (O)-is mentioned.
 なかでも、化合物2の合成がより容易である点から、Yは、単結合、-O-、-C(O)-、-C(O)N(R24)-、-C(O)N(R24)-アルキレン基-、-O-アルキレン基-が好ましい。 Among these, Y 2 is a single bond, —O—, —C (O) —, —C (O) N (R 24 ) —, —C (O) because compound 2 is easier to synthesize. N (R 24 ) -alkylene group- and -O-alkylene group- are preferred.
 Zは、炭素原子、窒素原子またはケイ素原子である。 Z 2 is a carbon atom, a nitrogen atom or a silicon atom.
 R22は、水素原子、水酸基またはアルキル基である。
 アルキル基の炭素数は、1~5が好ましく、1~3がより好ましく、1が特に好ましい。
 q2が2の場合、2個あるR22は、同じであっても異なっていてもよい。原料の入手容易性や式2で表される化合物の製造容易性の点からは、互いに同じであることが好ましい。
R 22 is a hydrogen atom, a hydroxyl group or an alkyl group.
The alkyl group preferably has 1 to 5 carbon atoms, more preferably 1 to 3 carbon atoms, and particularly preferably 1 carbon atom.
If q2 is 2, two is R 22 may be different even in the same. From the viewpoint of easy availability of raw materials and ease of production of the compound represented by Formula 2, they are preferably the same as each other.
 R23は、-L21-Si(Rn2 3-n2である。
 R、Lおよびn2の定義は、上述した通りである。
 L21は、-O-を有していてもよいアルキレン基である。
 アルキレン基が-O-を有する場合、炭素-炭素原子間またはZ側の末端に-O-を有することが好ましい。
 L21の炭素数は1~10が好ましく、1~6がより好ましく、1~4が特に好ましい。
R 23 is —L 21 —Si (R 2 ) n2 L 2 3-n2 .
The definitions of R 2 , L 2 and n2 are as described above.
L 21 is an alkylene group which may have —O—.
When the alkylene group has —O—, it is preferable to have —O— between carbon-carbon atoms or at the terminal on the Z 2 side.
L 21 preferably has 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms, and particularly preferably 1 to 4 carbon atoms.
 Zが炭素原子またはケイ素原子の場合、r2は3であり、q2は0~2の整数である。Zが窒素原子の場合、r2は2であり、q2は0~1の整数である。
 R23が1分子中に複数ある場合、複数あるR23は、同じであっても異なっていてもよい。原料の入手容易性や化合物2の製造容易性の点からは、互いに同じであることが好ましい。
If Z 2 is a carbon atom or a silicon atom, r2 is 3, q2 is an integer of 0-2. If Z 2 is a nitrogen atom, r2 is 2, q2 is an integer of 0-1.
When there are a plurality of R 23 in one molecule, the plurality of R 23 may be the same or different. From the viewpoint of easy availability of raw materials and ease of production of Compound 2, it is preferable that they are the same.
 化合物2としては、化合物2の保護フィルムに対する表面層の密着性および表面層の耐摩擦性により優れる点で、式20で表される化合物が好ましい。
 R21-[(OCHF)m21(OCma(4-ma)m22(OCmb(6-mb)m23(OCmc(8-mc)m24(OCmd(10-md)m25(OCme(12-me)m26(OX21m20]-Y-Z(R22q2(R23r2-q2  式20
 各基の定義は、上述した通りである。
As the compound 2, a compound represented by the formula 20 is preferable in that it is superior in the adhesion of the surface layer to the protective film of the compound 2 and the friction resistance of the surface layer.
R 21 - [(OCHF) m21 (OC 2 H ma F (4-ma)) m22 (OC 3 H mb F (6-mb)) m23 (OC 4 H mc F (8-mc)) m24 (OC 5 H md F (10-md) ) m25 (OC 6 H me F (12-me)) m26 (OX 21) m20] -Y 2 -Z 2 (R 22) q2 (R 23) r2-q2 formula 20
The definition of each group is as described above.
 化合物2の具体例としては、以下の例示1~68が挙げられる。以下の表中、tは1以上の整数を表す。tは50以下の整数が好ましい。 Specific examples of compound 2 include the following examples 1 to 68. In the following table, t represents an integer of 1 or more. t is preferably an integer of 50 or less.
Figure JPOXMLDOC01-appb-C000004
Figure JPOXMLDOC01-appb-C000004
Figure JPOXMLDOC01-appb-C000005
Figure JPOXMLDOC01-appb-C000005
Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000008
 化合物2は、公知の製造方法によって製造できる。たとえば、化合物2の一態様である式2で表される化合物は、式2Aで表される化合物をHSi(Rn2 3-n2(R、L、n2の定義は上述の通りである。)とヒドロシリル化反応させることによって、製造できる。
 R21A-[(OXm2(OX21m20]-Y-Z(R22q2(L2A-CH=CHr2-q2  式2A
 式中、X、X21、Y、Z、R22、m2、m20、q2、r2の定義は上述の通りであり、R21Aはフッ素原子を有してもよいアルキル基、または-Y-Z(R22q2(L2A-CH=CHr2-q2であり、L2Aは-O-を有していてもよいアルキレン基、単結合または-O-であり、L2A-CH=CHがヒドロシリル化されると式2で表される化合物のLになる。式2Aで表される化合物は、たとえばYが-C(O)NHCH-の場合、R21A-OHを原料として公知の方法でR21A-[(OXm2(OX21m20]-C(O)OR2B(R2Bは炭素数1~6のアルキル基。)を得て、NH-CH-Z(R22q2(L2A-CH=CHr2-q2と反応させて製造できる。
Compound 2 can be produced by a known production method. For example, the compound represented by Formula 2 which is one embodiment of Compound 2 is the same as the compound represented by Formula 2A in which HSi (R 2 ) n2 L 2 3-n2 (R 2 , L 2 , and n2 are defined above. And the hydrosilylation reaction.
R 21A - [(OX 2) m2 (OX 21) m20] -Y 2 -Z 2 (R 22) q2 (L 2A -CH = CH 2) r2-q2 formula 2A
In the formula, X 2 , X 21 , Y 2 , Z 2 , R 22 , m2, m20, q2, and r2 are as defined above, and R 21A is an alkyl group that may have a fluorine atom, or — Y 2 —Z 2 (R 22 ) q2 (L 2A —CH═CH 2 ) r2-q2 and L 2A is an alkylene group optionally having —O—, a single bond or —O—; When L 2A —CH═CH 2 is hydrosilylated, it becomes L 2 of the compound represented by Formula 2. For example, when Y 2 is —C (O) NHCH 2 —, the compound represented by Formula 2A is R 21A — [(OX 2 ) m2 (OX 21 ) m20 ] by a known method using R 21A —OH as a raw material. —C (O) OR 2B (R 2B is an alkyl group having 1 to 6 carbon atoms) was obtained, and NH 2 —CH 2 —Z 2 (R 22 ) q2 (L 2A —CH═CH 2 ) r2-q2 It can be produced by reacting with
(化合物3)
 化合物3は、式31で表される繰り返し単位を含むポリ(オキシペルフルオロアルキレン)鎖を有する。
 (OXm3  式31
 Xは、ペルフルオロアルキレン基である。
 ペルフルオロアルキレン基の炭素数は、表面層の撥水撥油性がより優れる点から、1~6が好ましい。
 ペルフルオロアルキレン基は、直鎖状であっても分岐鎖状であってもよいが、表面層の撥水撥油性により優れる点から、直鎖状が好ましい。
 なお、複数のOXは、同一であっても異なっていてもよい。つまり、(OXm3は、炭素数の異なる2種以上のOXから構成されていても、炭素数が同じであっても側鎖の有無や側鎖の種類が異なる2種以上のOXから構成されていてもよい。
(Compound 3)
Compound 3 has a poly (oxyperfluoroalkylene) chain containing a repeating unit represented by Formula 31.
(OX 3 ) m3 formula 31
X 3 is a perfluoroalkylene group.
The number of carbon atoms of the perfluoroalkylene group is preferably 1 to 6 because the water and oil repellency of the surface layer is more excellent.
The perfluoroalkylene group may be linear or branched, but is preferably linear because it is more excellent in water and oil repellency of the surface layer.
The plurality of OXs 3 may be the same or different. That is, (OX 3 ) m3 is composed of two or more types of OX 3 having different carbon numbers, or two or more types of OX having different side chains or different types of side chains even if the number of carbons is the same. 3 may be comprised.
 m3は、5以上の整数であり、5~200の整数が好ましく、5~150の整数がより好ましく、10~100の整数が特に好ましい。m3が5以上であれば、表面層の撥水撥油性がより優れる。m3が上記範囲の上限値以下であれば、表面層の耐摩擦性がより優れる。 M3 is an integer of 5 or more, preferably an integer of 5 to 200, more preferably an integer of 5 to 150, and particularly preferably an integer of 10 to 100. When m3 is 5 or more, the water and oil repellency of the surface layer is more excellent. If m3 is not more than the upper limit of the above range, the friction resistance of the surface layer is more excellent.
 (OXm3において、炭素数の異なる2種以上のOXが存在する場合、各OXの結合順序は限定されない。たとえば、2種のOXが存在する場合、2種のOXがランダム、交互、ブロックに配置されてもよい。
 (OXm3としては、表面層の撥水撥油性がより優れる点から、{(OCFm31(OCFCFm32(OCFCFCFm33(OCFCFCFCFm34}、(OCFCFm36、(OCFCFCFm37、(OCFCF-OCFCFCFCFm35(OCFCF)、(OCF-OCFCFCFCFCFm38(OCF)、(OCFCF-OCFCFCFCFCFCFm39(OCFCF)、または、(OCFCF-OCFCFCFCFm40(OCFCF)(OCFCFCF)が好ましく、{(OCFm31(OCFCFm32(OCFCFCFm33(OCFCFCFCFm34}、(OCFCF-OCFCFCFCFm35(OCFCF)、(OCF-OCFCFCFCFCFm38(OCF)、(OCFCF-OCFCFCFCFCFCFm39(OCFCF)、または、(OCFCF-OCFCFCFCFm40(OCFCF)(OCFCFCF)がより好ましく、{(OCFm31(OCFCFm32}、{(OCFm31(OCFCFCFm33}、または、(OCFCF-OCFCFCFCFm40(OCFCF)(OCFCFCF)が特に好ましい。
 ただし、m31は、1以上の整数であり、m32、m33およびm34は、それぞれ0または1以上の整数であり、m31+m32+m33+m34は5~200の整数であり、m31個のOCF、m32個のOCFCF、m33個のOCFCFCF、m34個のOCFCFCFCFの結合順序は限定されない。m36およびm37は、それぞれ5~200の整数であり、m35、m38およびm39は、2~99の整数であり、m40は、3~99の整数である。
 また{(OCFm31(OCFCFm32(OCFCFCFm33(OCFCFCFCFm34}において、m33およびm34が0の場合、m32/m31は、表面層の耐摩擦性がさらに優れる点から、0.1~10が好ましく、0.2~5.0がより好ましく、0.2~2.0がさらに好ましく、0.2~1.5が特に好ましく、0.2~0.85が最も好ましい。
(OX 3 ) In m3 , when two or more types of OX 3 having different carbon numbers exist, the bonding order of each OX 3 is not limited. For example, when two types of OX 3 exist, the two types of OX 3 may be arranged randomly, alternately, or in blocks.
(OX 3) The m3, from the viewpoint of water and oil repellency of the surface layer is more excellent, {(OCF 2) m31 ( OCF 2 CF 2) m32 (OCF 2 CF 2 CF 2) m33 (OCF 2 CF 2 CF 2 CF 2) m34}, (OCF 2 CF 2) m36, (OCF 2 CF 2 CF 2) m37, (OCF 2 CF 2 -OCF 2 CF 2 CF 2 CF 2) m35 (OCF 2 CF 2), (OCF 2 —OCF 2 CF 2 CF 2 CF 2 CF 2 ) m38 (OCF 2 ), (OCF 2 CF 2 —OCF 2 CF 2 CF 2 CF 2 CF 2 CF 2 ) m39 (OCF 2 CF 2 ), or (OCF 2) CF 2 —OCF 2 CF 2 CF 2 CF 2 ) m40 (OCF 2 CF 2 ) (OCF 2 CF 2 CF 2 ) is preferred, and {(OCF 2 ) M31 (OCF 2 CF 2) m32 (OCF 2 CF 2 CF 2) m33 (OCF 2 CF 2 CF 2 CF 2) m34}, (OCF 2 CF 2 -OCF 2 CF 2 CF 2 CF 2) m35 (OCF 2 CF 2 ), (OCF 2 —OCF 2 CF 2 CF 2 CF 2 CF 2 ) m38 (OCF 2 ), (OCF 2 CF 2 —OCF 2 CF 2 CF 2 CF 2 CF 2 CF 2 ) m39 (OCF 2 CF 2 ) Or (OCF 2 CF 2 -OCF 2 CF 2 CF 2 CF 2 ) m40 (OCF 2 CF 2 ) (OCF 2 CF 2 CF 2 ) is more preferable, and {(OCF 2 ) m31 (OCF 2 CF 2 ) m32 }, {(OCF 2 ) m31 (OCF 2 CF 2 CF 2 ) m33 }, or (OCF 2 CF 2 —OCF 2) CF 2 CF 2 CF 2) m40 (OCF 2 CF 2) (OCF 2 CF 2 CF 2) is particularly preferred.
Here, m31 is an integer of 1 or more, m32, m33 and m34 are each an integer of 0 or 1 and m31 + m32 + m33 + m34 is an integer of 5 to 200, m31 OCF 2 , m32 OCF 2 CF 2, m33 amino OCF 2 CF 2 CF 2, m34 pieces of join order OCF 2 CF 2 CF 2 CF 2 is not limited. m36 and m37 are each an integer from 5 to 200, m35, m38 and m39 are each an integer from 2 to 99, and m40 is an integer from 3 to 99.
In addition {(OCF 2) m31 (OCF 2 CF 2) m32 (OCF 2 CF 2 CF 2) m33 (OCF 2 CF 2 CF 2 CF 2) m34}, when m33 and m34 is 0, m32 / m31 is From the viewpoint that the friction resistance of the surface layer is further excellent, 0.1 to 10 is preferable, 0.2 to 5.0 is more preferable, 0.2 to 2.0 is more preferable, and 0.2 to 1.5 is preferable Particularly preferred is 0.2 to 0.85.
 化合物3は、基32を2個以上有する。
 -Si(Rn3 3-n3  式32
Compound 3 has two or more groups 32.
—Si (R 3 ) n3 L 3 3-n3 Formula 32
 化合物3が有する基32の数は、2個以上であり、表面層の耐摩擦性が優れる点で、2~10個が好ましく、2~5個がより好ましく、2または3個が特に好ましい。
 基32が1分子中に複数ある場合、複数ある基32は、同じであっても異なっていてもよい。原料の入手容易性や化合物3の製造容易性の点からは、互いに同じであることが好ましい。
The number of the groups 32 included in the compound 3 is 2 or more, preferably 2 to 10, more preferably 2 to 5, and particularly preferably 2 or 3 in view of excellent friction resistance of the surface layer.
When there are a plurality of groups 32 in one molecule, the plurality of groups 32 may be the same or different. From the viewpoint of easy availability of raw materials and ease of production of compound 3, it is preferable that they are the same.
 Rは、1価の炭化水素基であり、1価の飽和炭化水素基が好ましい。Rの炭素数は、1~6が好ましく、1~3がより好ましく、1または2が特に好ましい。 R 3 is a monovalent hydrocarbon group, preferably a monovalent saturated hydrocarbon group. R 3 preferably has 1 to 6 carbon atoms, more preferably 1 to 3, and particularly preferably 1 or 2.
 Lは、加水分解性基または水酸基である。すなわち、Lが加水分解性基である場合、Si-Lで表される基は加水分解性シリル基である。 L 3 is a hydrolyzable group or a hydroxyl group. That is, when L 3 is a hydrolyzable group, the group represented by Si—L 3 is a hydrolyzable silyl group.
 Lの具体例としては、アルコキシ基、ハロゲン原子、アシル基、イソシアナート基(-NCO)が挙げられる。アルコキシ基としては、炭素数1~4のアルコキシ基が好ましい。ハロゲン原子としては、塩素原子が好ましい。
 Lとしては、化合物3の製造がより容易である点から、炭素数1~4のアルコキシ基またはハロゲン原子が好ましい。Lとしては、塗布時のアウトガスが少なく、化合物3の保存安定性がより優れる点から、炭素数1~4のアルコキシ基が好ましく、化合物3の長期の保存安定性が必要な場合にはエトキシ基が特に好ましく、塗布後の反応時間を短時間とする場合にはメトキシ基が特に好ましい。
Specific examples of L 3 include an alkoxy group, a halogen atom, an acyl group, and an isocyanate group (—NCO). As the alkoxy group, an alkoxy group having 1 to 4 carbon atoms is preferable. As the halogen atom, a chlorine atom is preferable.
L 3 is preferably an alkoxy group having 1 to 4 carbon atoms or a halogen atom from the viewpoint that the production of compound 3 is easier. L 3 is preferably an alkoxy group having 1 to 4 carbon atoms from the viewpoint that the outgassing during coating is small and the storage stability of compound 3 is better, and ethoxy is required when long-term storage stability of compound 3 is required. A group is particularly preferred, and a methoxy group is particularly preferred when the reaction time after coating is short.
 n3は、0~2の整数である。
 n3は、0または1が好ましく、0が特に好ましい。Lが複数存在することによって、表面層の基材への密着性がより強固になる。
 n3が1以下である場合、1分子中に存在する複数のLは同じであっても異なっていてもよい。原料の入手容易性や化合物3の製造容易性の点からは、互いに同じであることが好ましい。n3が2である場合、1分子中に存在する複数のRは同じであっても異なっていてもよい。原料の入手容易性や化合物3の製造容易性の点からは、互いに同じであることが好ましい。
n3 is an integer of 0-2.
n3 is preferably 0 or 1, particularly preferably 0. By the presence of a plurality of L 3 , the adhesion of the surface layer to the substrate becomes stronger.
When n3 is 1 or less, the plurality of L 3 present in one molecule may be the same or different. From the viewpoint of easy availability of raw materials and ease of production of compound 3, it is preferable that they are the same. When n3 is 2, a plurality of R 3 present in one molecule may be the same or different. From the viewpoint of easy availability of raw materials and ease of production of compound 3, it is preferable that they are the same.
 化合物3は、上述した単位21を含まない。化合物3が単位21を含まないとは、化合物3が実質的に単位21を含まないことを意味し、具体的には、H-NMR(300.4MHz、溶媒:CDCl、基準:TMS)により化合物3を分析して得られる化学シフト値δについて、δ=5.0~6.5ppmにおいて観測される全てのシグナルをH(プロトン)の個数に換算した場合に、1分子あたりの上記Hの個数の合計が1.0個以下であることを意味する。化合物3が単位21を含まず、化合物2が単位21を含むことにより、本組成物の表面張力が好適に調整され、本表面層の密着性が向上すると考えられる。 Compound 3 does not contain the unit 21 described above. The phrase “compound 3 does not contain unit 21” means that compound 3 substantially does not contain unit 21. Specifically, 1 H-NMR (300.4 MHz, solvent: CDCl 3 , standard: TMS) For the chemical shift value δ obtained by analyzing compound 3 by the above, when all signals observed at δ = 5.0 to 6.5 ppm are converted to the number of H (protons), the above H per molecule It means that the total of the number of is 1.0 or less. It is considered that when the compound 3 does not contain the unit 21 and the compound 2 contains the unit 21, the surface tension of the composition is suitably adjusted and the adhesion of the surface layer is improved.
 化合物3としては、化合物3の表面層の撥水撥油性および耐摩擦性により優れる点で、式3で表される化合物が好ましい。
 [A-(OXm3-][-Si(Rn3 3-n3  式3
The compound 3 is preferably a compound represented by the formula 3 in that the surface layer of the compound 3 is more excellent in water / oil repellency and friction resistance.
[A- (OX 3 ) m3 −] j Z 3 [—Si (R 3 ) n3 L 3 3-n3 ] g Formula 3
 Aは、ペルフルオロアルキル基または-Q[-Si(Rn3 3-n3である。
 ペルフルオロアルキル基中の炭素数は、表面層の耐摩擦性がより優れる点から、1~10が好ましく、1~6がより好ましく、1~3が特に好ましい。
 ペルフルオロアルキル基は、直鎖状であってもよく、分岐鎖状であってもよい。
 ただし、Aが-Q[-Si(Rn3 3-n3である場合、jは1である。
A is a perfluoroalkyl group or —Q [—Si (R 3 ) n3 L 3 3-n3 ] k .
The number of carbon atoms in the perfluoroalkyl group is preferably from 1 to 10, more preferably from 1 to 6, and particularly preferably from 1 to 3 from the viewpoint that the friction resistance of the surface layer is more excellent.
The perfluoroalkyl group may be linear or branched.
However, j is 1 when A is -Q [-Si (R 3 ) n3 L 3 3-n3 ] k .
 ペルフルオロアルキル基としては、CF-、CFCF-、CFCFCF-、CFCFCFCF-、CFCFCFCFCF-、CFCFCFCFCFCF-、CFCF(CF)-等が挙げられる。
 ペルフルオロアルキル基としては、表面層の撥水撥油性がより優れる点から、CF-、CFCF-、CFCFCF-が好ましい。
As perfluoroalkyl groups, CF 3 —, CF 3 CF 2 —, CF 3 CF 2 CF 2 —, CF 3 CF 2 CF 2 CF 2 —, CF 3 CF 2 CF 2 CF 2 CF 2 —, CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 —, CF 3 CF (CF 3 ) —, and the like can be given.
As the perfluoroalkyl group, CF 3 —, CF 3 CF 2 —, and CF 3 CF 2 CF 2 — are preferable because the water and oil repellency of the surface layer is more excellent.
 Qは、(k+1)価の連結基である。後述するように、kは1~10の整数である。よって、Qとしては、2~11価の連結基が挙げられる。
 Qとしては、本発明の効果を損なわない基であればよく、たとえば、エーテル性酸素原子または2価のオルガノポリシロキサン残基を有していてもよいアルキレン基、炭素原子、窒素原子、ケイ素原子、2~8価のオルガノポリシロキサン残基、および、後述する式3-1A、式3-1B、式3-1A-1~3-1A-6からSi(Rn3 3-n3を除いた基が挙げられる。
Q is a (k + 1) -valent linking group. As will be described later, k is an integer of 1 to 10. Accordingly, examples of Q include divalent to eleven valent linking groups.
Q may be any group that does not impair the effects of the present invention. For example, an alkylene group that may have an etheric oxygen atom or a divalent organopolysiloxane residue, a carbon atom, a nitrogen atom, or a silicon atom A divalent to octavalent organopolysiloxane residue, and formulas 3-1A, 3-1B, and 3-1A-1 to 3-1A-6 described below, and Si (R 3 ) n3 L 3 3-n3 And a group excluding.
 R、L、n3、Xおよびm3の定義は、上述の通りである。 The definitions of R 3 , L 3 , n3, X 3 and m3 are as described above.
 Zは、(j+g)価の連結基である。
 Zは、本発明の効果を損なわない基であればよく、たとえば、エーテル性酸素原子または2価のオルガノポリシロキサン残基を有していてもよいアルキレン基、炭素原子、窒素原子、ケイ素原子、2~8価のオルガノポリシロキサン残基、および、後述する式3-1A、式3-1B、式3-1A-1~3-1A-6からSi(Rn3 3-n3を除いた基が挙げられる。
Z 3 is a (j + g) -valent linking group.
Z 3 may be any group that does not impair the effects of the present invention. For example, an alkylene group that may have an etheric oxygen atom or a divalent organopolysiloxane residue, a carbon atom, a nitrogen atom, or a silicon atom A divalent to octavalent organopolysiloxane residue, and formulas 3-1A, 3-1B, and 3-1A-1 to 3-1A-6 described below, and Si (R 3 ) n3 L 3 3-n3 And a group excluding.
 jは、1以上の整数であり、表面層の撥水撥油性がより優れる点から、1~5の整数が好ましく、化合物3を製造しやすい点から、1が特に好ましい。
 gは、1以上の整数である。ただし、Aがペルフルオロアルキル基の場合、gは、2以上の整数であり、表面層の耐摩擦性がより優れる点から、2~4の整数が好ましく、2または3がより好ましく、3が特に好ましい。Aが-Q[-Si(Rn3 3-n3の場合には、g+kは、2以上の整数であり、2または3がより好ましく、3が特に好ましい。
j is an integer of 1 or more, and is preferably an integer of 1 to 5 from the viewpoint of better water and oil repellency of the surface layer, and 1 is particularly preferable from the viewpoint of easy production of the compound 3.
g is an integer of 1 or more. However, when A is a perfluoroalkyl group, g is an integer of 2 or more, and an integer of 2 to 4 is preferable, and 2 or 3 is more preferable, and 3 is particularly preferable from the viewpoint of more excellent friction resistance of the surface layer. preferable. When A is -Q [-Si (R 3 ) n3 L 3 3-n3 ] k , g + k is an integer of 2 or more, 2 or 3 is more preferable, and 3 is particularly preferable.
 化合物3は、表面層の撥水撥油性がより優れる点から、式3-1で表される化合物が好ましい。
 A-(OXm3-Z31  式3-1
 式3-1中、A、Xおよびm3の定義は、式3中の各基の定義と同義である。
Compound 3 is preferably a compound represented by Formula 3-1 from the viewpoint that the water and oil repellency of the surface layer is more excellent.
A- (OX 3 ) m3 -Z 31 Formula 3-1
In Formula 3-1, the definitions of A, X 3 and m3 are the same as the definitions of each group in Formula 3.
 Z31は、基3-1Aまたは基3-1Bである。
 -Q-X31(-Q-Si(Rn3 3-n3(-R31  式3-1A
 -Q-[CHC(R32)(-Q-Si(Rn3 3-n3)]-R33  式3-1B
Z 31 is group 3-1A or group 3-1B.
-Q a -X 31 (-Q b -Si (R 3 ) n3 L 3 3-n3 ) h (-R 31 ) i Formula 3-1A
-Q c - [CH 2 C ( R 32) (- Q d -Si (R 3) n3 L 3 3-n3)] y -R 33 Formula 3-1B
 Qは、単結合または2価の連結基である。
 2価の連結基としては、たとえば、2価の炭化水素基(2価の飽和炭化水素基、2価の芳香族炭化水素基、アルケニレン基、アルキニレン基であってもよい。2価の飽和炭化水素基は、直鎖状、分岐鎖状または環状であってもよく、たとえば、アルキレン基が挙げられる。炭素数は1~20が好ましい。また、2価の芳香族炭化水素基は、炭素数5~20が好ましく、たとえば、フェニレン基が挙げられる。それ以外にも、炭素数2~20のアルケニレン基、炭素数2~20のアルキニレン基であってもよい。)、2価の複素環基、-O-、-S-、-SO-、-N(R)-、-C(O)-、-Si(R-および、これらを2種以上組み合わせた基が挙げられる。ここで、Rは、アルキル基(好ましくは炭素数1~10)、または、フェニル基である。Rは、水素原子またはアルキル基(好ましくは炭素数1~10)である。
 なお、上記これらを2種以上組み合わせた基としては、たとえば、-OC(O)-、-C(O)N(R)-、アルキレン基-O-アルキレン基、アルキレン基-OC(O)-アルキレン基、アルキレン基-Si(R-フェニレン基-Si(Rが挙げられる。
Q a is a single bond or a divalent linking group.
Examples of the divalent linking group include a divalent hydrocarbon group (a divalent saturated hydrocarbon group, a divalent aromatic hydrocarbon group, an alkenylene group, and an alkynylene group. A divalent saturated carbonization group. The hydrogen group may be linear, branched or cyclic and includes, for example, an alkylene group, preferably having 1 to 20 carbon atoms, and a divalent aromatic hydrocarbon group having carbon atoms. 5 to 20 is preferable, and examples thereof include a phenylene group, and may be an alkenylene group having 2 to 20 carbon atoms or an alkynylene group having 2 to 20 carbon atoms. , —O—, —S—, —SO 2 —, —N (R d ) —, —C (O) —, —Si (R a ) 2 —, and groups in which two or more of these are combined. . Here, R a is an alkyl group (preferably having 1 to 10 carbon atoms) or a phenyl group. R d is a hydrogen atom or an alkyl group (preferably having 1 to 10 carbon atoms).
Examples of the group in which two or more of these are combined include, for example, —OC (O) —, —C (O) N (R d ) —, an alkylene group —O-alkylene group, and an alkylene group —OC (O). -Alkylene group, alkylene group-Si (R a ) 2 -phenylene group-Si (R a ) 2
 X31は、単結合、アルキレン基、炭素原子、窒素原子、ケイ素原子または2~8価のオルガノポリシロキサン残基である。
 なお、上記アルキレン基は、-O-、シルフェニレン骨格基、2価のオルガノポリシロキサン残基またはジアルキルシリレン基を有していてもよい。アルキレン基は、-O-、シルフェニレン骨格基、2価のオルガノポリシロキサン残基およびジアルキルシリレン基からなる群から選択される基を複数有していてもよい。
 X31で表されるアルキレン基の炭素数は、1~20が好ましく、1~10が特に好ましい。
 2~8価のオルガノポリシロキサン残基としては、2価のオルガノポリシロキサン残基、および、後述する(w+1)価のオルガノポリシロキサン残基が挙げられる。
X 31 is a single bond, an alkylene group, a carbon atom, a nitrogen atom, a silicon atom, or a divalent to octavalent organopolysiloxane residue.
The alkylene group may have —O—, a silphenylene skeleton group, a divalent organopolysiloxane residue, or a dialkylsilylene group. The alkylene group may have a plurality of groups selected from the group consisting of —O—, a silphenylene skeleton group, a divalent organopolysiloxane residue, and a dialkylsilylene group.
The number of carbon atoms of the alkylene group represented by X 31 is preferably 1-20, and particularly preferably 1-10.
Examples of the divalent to octavalent organopolysiloxane residues include divalent organopolysiloxane residues and (w + 1) valent organopolysiloxane residues described below.
 Qは、単結合または2価の連結基である。
 2価の連結基の定義は、上述したQで説明した定義と同義である。
Q b is a single bond or a divalent linking group.
Definition of the divalent linking group are the same as those defined as described in the above-described Q a.
 R31は、水酸基またはアルキル基である。
 アルキル基の炭素数は、1~5が好ましく、1~3がより好ましく、1が特に好ましい。
R 31 is a hydroxyl group or an alkyl group.
The alkyl group preferably has 1 to 5 carbon atoms, more preferably 1 to 3 carbon atoms, and particularly preferably 1 carbon atom.
 X31が単結合またはアルキレン基の場合、hは1、iは0であり、
 X31が窒素原子の場合、hは1または2の整数であり、iは0または1の整数であり、h+i=2を満たし、
 X31が炭素原子またはケイ素原子の場合、hは1~3の整数であり、iは0~2の整数であり、h+i=3を満たし、
 X31が2~8価のオルガノポリシロキサン残基の場合、hは1~7の整数であり、iは0~6の整数であり、h+i=1~7を満たす。
 ただし、hが1の場合、Aは-Q[-Si(Rn3 3-n3である。
 (-Q-Si(Rn3 3-n3)が2個以上ある場合は、2個以上の(-Q-Si(Rn3 3-n3)は、同一であっても異なっていてもよい。R31が2個以上ある場合は、2個以上の(-R31)は、同一であっても異なっていてもよい。
When X 31 is a single bond or an alkylene group, h is 1, i is 0,
When X 31 is a nitrogen atom, h is an integer of 1 or 2, i is an integer of 0 or 1, and satisfies h + i = 2,
When X 31 is a carbon atom or a silicon atom, h is an integer of 1 to 3, i is an integer of 0 to 2, and satisfies h + i = 3,
When X 31 is a divalent to octavalent organopolysiloxane residue, h is an integer of 1 to 7, i is an integer of 0 to 6, and h + i = 1 to 7 is satisfied.
However, when h is 1, A is -Q [-Si (R 3 ) n3 L 3 3-n3 ] k .
If (-Q b -Si that (R 3) n3 L 3 3 -n3) there are two or more, two or more (-Q b -Si (R 3) n3 L 3 3-n3) are identical It may or may not be. When two or more R 31 are present, the two or more (—R 31 ) may be the same or different.
 Qは、単結合、アルキレン基、または、炭素数2以上のアルキレン基の炭素原子-炭素原子間にエーテル性酸素原子を有する基であり、化合物を製造しやすい点から、単結合が好ましい。
 アルキレン基の炭素数は、1~10が好ましく、2~6が特に好ましい。
 炭素数2以上のアルキレン基の炭素原子-炭素原子間にエーテル性酸素原子を有する基の炭素数は、2~10が好ましく、2~6が特に好ましい。
Q c is a single bond, an alkylene group, or a group having an etheric oxygen atom between carbon atoms of a C 2 or more alkylene group, and is preferably a single bond from the viewpoint of easy production of a compound.
The number of carbon atoms of the alkylene group is preferably 1-10, and particularly preferably 2-6.
The number of carbon atoms of the group having an etheric oxygen atom between carbon atoms of the alkylene group having 2 or more carbon atoms is preferably 2 to 10, and particularly preferably 2 to 6.
 R32は、水素原子または炭素数1~10のアルキル基であり、化合物を製造しやすい点から、水素原子が好ましい。
 アルキル基としては、メチル基が好ましい。
R 32 is a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, and is preferably a hydrogen atom from the viewpoint of easy production of a compound.
As the alkyl group, a methyl group is preferable.
 Qは、単結合またはアルキレン基である。アルキレン基の炭素数は、1~10が好ましく、1~6が特に好ましい。化合物を製造しやすい点から、Qは、単結合または-CH-が好ましい。 Q d is a single bond or an alkylene group. The number of carbon atoms of the alkylene group is preferably 1 to 10, and more preferably 1 to 6. Q d is preferably a single bond or —CH 2 — from the viewpoint of easy production of the compound.
 R33は、水素原子またはハロゲン原子であり、化合物を製造しやすい点から、水素原子が好ましい。 R 33 is a hydrogen atom or a halogen atom, and is preferably a hydrogen atom from the viewpoint of easy production of a compound.
 yは、1~10の整数であり、1~6の整数が好ましい。ただし、yが1の場合、Aは-Q[-Si(Rn3 3-n3である。
 2個以上の[CHC(R32)(-Q-Si(Rn3 3-n3)]は、同一であっても異なっていてもよい。
y is an integer of 1 to 10, and an integer of 1 to 6 is preferable. However, when y is 1, A is -Q [-Si (R 3 ) n3 L 3 3-n3 ] k .
Two or more [CH 2 C (R 32 ) (— Q d —Si (R 3 ) n3 L 3 3-n3 )] may be the same or different.
 基3-1Aとしては、基3-1A-1~3-1A-6が好ましい。
 -(X32s1-Qb1-SiR3-n  式3-1A-1
 -(X33s2-Qa2-N[-Qb2-Si(Rn3 3-n3  式3-1A-2
 -Qa3-G(R)[-Qb3-Si(Rn3 3-n3  式3-1A-3
 -[C(O)N(R)]s4-Qa4-(O)t4-C[-(O)u4-Qb4-Si(Rn3 3-n3  式3-1A-4
 -Qa5-Si[-Qb5-Si(Rn3 3-n3  式3-1A-5
 -[C(O)N(R)]-Qa6-Z[-Qb6-Si(Rn3 3-n3  式3-1A-6
 ただし、基3-1Aが基3-1A-1である場合、式3-1におけるAは、-Q[-Si(Rn3 3-n3である。
 なお、式3-1A-1~3-1A-6中、R、L、および、n3の定義は、上述した通りである。
The group 3-1A is preferably a group 3-1A-1 to 3-1A-6.
-(X 32 ) s1 -Q b1 -SiR n L 3-n Formula 3-1A-1
-(X 33 ) s2 -Q a2 -N [-Q b2 -Si (R 3 ) n3 L 3 3-n3 ] 2 Formula 3-1A-2
-Q a3 -G (R g ) [-Q b3 -Si (R 3 ) n3 L 3 3-n3 ] Formula 2 3-1A-3
-[C (O) N (R d )] s4 -Q a4- (O) t4 -C [-(O) u4 -Q b4 -Si (R 3 ) n3 L 3 3-n3 ] 3 Formula 3-1A -4
-Q a5 -Si [-Q b5 -Si (R 3 ) n3 L 3 3-n3 ] 3 Formula 3-1A-5
-[C (O) N (R d )] v -Q a6 -Z a [-Q b6 -Si (R 3 ) n3 L 3 3-n3 ] w Formula 3-1A-6
However, when the group 3-1A is the group 3-1A-1, A in the formula 3-1 is —Q [—Si (R 3 ) n3 L 3 3-n3 ] k .
In formulas 3-1A-1 to 3-1A-6, the definitions of R 3 , L 3 , and n3 are as described above.
 X32は、-O-、または、-C(O)N(R)-である(ただし、式中のNはQb1に結合する)。
 Rの定義は、上述した通りである。
 s1は、0または1である。
X 32 is —O— or —C (O) N (R d ) — (wherein N binds to Q b1 ).
The definition of R d is as described above.
s1 is 0 or 1.
 Qb1は、アルキレン基である。なお、アルキレン基は、-O-、シルフェニレン骨格基、2価のオルガノポリシロキサン残基またはジアルキルシリレン基を有していてもよい。アルキレン基は、-O-、シルフェニレン骨格基、2価のオルガノポリシロキサン残基およびジアルキルシリレン基からなる群から選択される基を複数有していてもよい。
 なお、アルキレン基が-O-、シルフェニレン骨格基、2価のオルガノポリシロキサン残基またはジアルキルシリレン基を有する場合、炭素原子-炭素原子間にこれらの基を有することが好ましい。
Q b1 is an alkylene group. The alkylene group may have —O—, a silphenylene skeleton group, a divalent organopolysiloxane residue, or a dialkylsilylene group. The alkylene group may have a plurality of groups selected from the group consisting of —O—, a silphenylene skeleton group, a divalent organopolysiloxane residue, and a dialkylsilylene group.
In addition, when the alkylene group has —O—, a silphenylene skeleton group, a divalent organopolysiloxane residue or a dialkylsilylene group, it is preferable to have these groups between carbon atoms.
 Qb1で表されるアルキレン基の炭素数は、1~10が好ましく、2~6が特に好ましい。 The alkylene group represented by Q b1 preferably has 1 to 10 carbon atoms, and particularly preferably 2 to 6 carbon atoms.
 Qb1としては、s1が0の場合は、-CHOCHCHCH-、-CHOCHCHOCHCHCH-、-CHCH-、-CHCHCH-、-CHOCHCHCHSi(CHOSi(CHCHCH-が好ましい。(X32s1が-O-の場合は、-CHCHCH-、-CHCHOCHCHCH-が好ましい。(X32s1が-C(O)N(R)-の場合は、炭素数2~6のアルキレン基が好ましい(ただし、式中のNはQb1に結合する)。Qb1がこれらの基であると化合物が製造しやすい。 As Q b1 , when s1 is 0, —CH 2 OCH 2 CH 2 CH 2 —, —CH 2 OCH 2 CH 2 OCH 2 CH 2 CH 2 —, —CH 2 CH 2 —, —CH 2 CH 2 CH 2 —, —CH 2 OCH 2 CH 2 CH 2 Si (CH 3 ) 2 OSi (CH 3 ) 2 CH 2 CH 2 — are preferred. When (X 32 ) s1 is —O—, —CH 2 CH 2 CH 2 — and —CH 2 CH 2 OCH 2 CH 2 CH 2 — are preferred. When (X 32 ) s1 is —C (O) N (R d ) —, an alkylene group having 2 to 6 carbon atoms is preferred (wherein N in the formula binds to Q b1 ). A compound is easy to manufacture when Qb1 is these groups.
 基3-1A-1の具体例としては、以下の基が挙げられる。下記式中、*は、(OXm3との結合位置を表す。 Specific examples of the group 3-1A-1 include the following groups. In the following formula, * represents a bonding position with (OX 3 ) m3 .
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000009
 X33は、-O-、-NH-、または、-C(O)N(R)-である。
 Rの定義は、上述した通りである。
X 33 is —O—, —NH—, or —C (O) N (R d ) —.
The definition of R d is as described above.
 Qa2は、単結合、アルキレン基、-C(O)-、または、炭素数2以上のアルキレン基の炭素原子-炭素原子間にエーテル性酸素原子、-C(O)-、-C(O)O-、-OC(O)-もしくは-NH-を有する基である。
 Qa2で表されるアルキレン基の炭素数は、1~10が好ましく、2~6が特に好ましい。
 Qa2で表される炭素数2以上のアルキレン基の炭素原子-炭素原子間にエーテル性酸素原子、-C(O)-、-C(O)O-、-OC(O)-または-NH-を有する基の炭素数は、2~10が好ましく、2~6が特に好ましい。
Q a2 represents a single bond, an alkylene group, —C (O) —, or an etheric oxygen atom between carbon atoms of the alkylene group having 2 or more carbon atoms, —C (O) —, —C (O ) A group having O—, —OC (O) — or —NH—.
The alkylene group represented by Q a2 preferably has 1 to 10 carbon atoms, and particularly preferably 2 to 6 carbon atoms.
An etheric oxygen atom, —C (O) —, —C (O) O—, —OC (O) — or —NH between carbon atoms of the alkylene group having 2 or more carbon atoms represented by Q a2 The number of carbons in the group having — is preferably 2 to 10, and particularly preferably 2 to 6.
 Qa2としては、化合物を製造しやすい点から、-CH-、-CHCH-、-CHCHCH-、-CHOCHCH-、-CHNHCHCH-、-CHCHOC(O)CHCH-、-C(O)-が好ましい(ただし、右側がNに結合する。)。 The Q a2, from the viewpoint of easily producing the compound, -CH 2 -, - CH 2 CH 2 -, - CH 2 CH 2 CH 2 -, - CH 2 OCH 2 CH 2 -, - CH 2 NHCH 2 CH 2 —, —CH 2 CH 2 OC (O) CH 2 CH 2 —, —C (O) — are preferred (where the right side is bonded to N).
 s2は、0または1(ただし、Qa2が単結合の場合は0である。)である。化合物を製造しやすい点から、0が好ましい。 s2 is 0 or 1 (provided that 0 when Q a2 is a single bond). From the viewpoint of easy production of the compound, 0 is preferable.
 Qb2は、アルキレン基、または、炭素数2以上のアルキレン基の炭素原子-炭素原子間に、2価のオルガノポリシロキサン残基、エーテル性酸素原子もしくは-NH-を有する基である。
 Qb2で表されるアルキレン基の炭素数は、1~10が好ましく、2~6が特に好ましい。
 Qb2で表される炭素数2以上のアルキレン基の炭素原子-炭素原子間に、2価のオルガノポリシロキサン残基、エーテル性酸素原子または-NH-を有する基の炭素数は、2~10が好ましく、2~6が特に好ましい。
Q b2 is an alkylene group or a group having a divalent organopolysiloxane residue, an etheric oxygen atom or —NH— between the carbon atoms of the alkylene group having 2 or more carbon atoms.
The alkylene group represented by Q b2 preferably has 1 to 10 carbon atoms, and particularly preferably 2 to 6 carbon atoms.
The number of carbon atoms of the group having a divalent organopolysiloxane residue, an etheric oxygen atom or —NH— between the carbon atoms of the alkylene group having 2 or more carbon atoms represented by Q b2 is 2 to 10 2 to 6 are particularly preferable.
 Qb2としては、化合物を製造しやすい点から、-CHCHCH-、-CHCHOCHCHCH-が好ましい(ただし、右側がSiに結合する。)。 Q b2 is preferably —CH 2 CH 2 CH 2 — or —CH 2 CH 2 OCH 2 CH 2 CH 2 — (provided that the right side is bonded to Si) from the viewpoint of easy production of the compound.
 2個の[-Qb2-Si(Rn3 3-n3]は、同一であっても異なっていてもよい。 Two [—Q b2 —Si (R 3 ) n3 L 3 3-n3 ] may be the same or different.
 基3-1A-2の具体例としては、以下の基が挙げられる。下記式中、*は、(OXm3との結合位置を表す。 Specific examples of the group 3-1A-2 include the following groups. In the following formula, * represents a bonding position with (OX 3 ) m3 .
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000010
 Qa3は、単結合、アルキレン基、または、炭素数2以上のアルキレン基の炭素原子-炭素原子間にエーテル性酸素原子を有する基であり、化合物を製造しやすい点から、単結合が好ましい。
 Qa3で表されるアルキレン基の炭素数は、1~10が好ましく、2~6が特に好ましい。
 Qa3で表される炭素数2以上のアルキレン基の炭素原子-炭素原子間にエーテル性酸素原子を有する基の炭素数は、2~10が好ましく、2~6が特に好ましい。
Q a3 is a single bond, an alkylene group, or a group having an etheric oxygen atom between carbon atoms of the alkylene group having 2 or more carbon atoms, and is preferably a single bond from the viewpoint of easy production of a compound.
The alkylene group represented by Q a3 preferably has 1 to 10 carbon atoms, and particularly preferably 2 to 6 carbon atoms.
The carbon number of the group having an etheric oxygen atom between carbon atoms of the alkylene group having 2 or more carbon atoms represented by Qa3 is preferably 2 to 10, and particularly preferably 2 to 6.
 Gは、炭素原子またはケイ素原子である。
 Rは、水酸基またはアルキル基である。Rで表されるアルキル基の炭素数は、1~4が好ましい。
 G(R)としては、化合物を製造しやすい点から、C(OH)またはSi(Rga)(ただし、Rgaはアルキル基である。アルキル基の炭素数は1~10が好ましく、メチル基が特に好ましい。)が好ましい。
G is a carbon atom or a silicon atom.
R g is a hydroxyl group or an alkyl group. The number of carbon atoms of the alkyl group represented by R g is preferably 1 to 4.
G (R g ) is C (OH) or Si (R ga ) (provided that R ga is an alkyl group. The alkyl group preferably has 1 to 10 carbon atoms; Group is particularly preferred.).
 Qb3は、アルキレン基、または、炭素数2以上のアルキレン基の炭素原子-炭素原子間にエーテル性酸素原子もしくは2価のオルガノポリシロキサン残基を有する基である。
 Qb3で表されるアルキレン基の炭素数は、1~10が好ましく、2~6が特に好ましい。
 Qb3で表される炭素数2以上のアルキレン基の炭素原子-炭素原子間にエーテル性酸素原子または2価のオルガノポリシロキサン残基を有する基の炭素数は、2~10が好ましく、2~6が特に好ましい。
 Qb3としては、化合物を製造しやすい点から、-CHCH-、-CHCHCH-、-CHCHCHCHCHCHCHCH-が好ましい。
Q b3 is an alkylene group or a group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms of a C 2 or more alkylene group.
The alkylene group represented by Q b3 preferably has 1 to 10 carbon atoms, and particularly preferably 2 to 6 carbon atoms.
The number of carbon atoms of the group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms of the alkylene group having 2 or more carbon atoms represented by Qb3 is preferably 2 to 10. 6 is particularly preferred.
The Q b3, from the viewpoint of easily producing the compound, -CH 2 CH 2 -, - CH 2 CH 2 CH 2 -, - CH 2 CH 2 CH 2 CH 2 CH 2 CH 2 CH 2 CH 2 - is preferred.
 2個の[-Qb3-Si(Rn3 3-n3]は、同一であっても異なっていてもよい。 Two [—Q b3 —Si (R 3 ) n3 L 3 3-n3 ] may be the same or different.
 基3-1A-3の具体例としては、以下の基が挙げられる。下記式中、*は、(OXm3との結合位置を表す。 Specific examples of the group 3-1A-3 include the following groups. In the following formula, * represents a bonding position with (OX 3 ) m3 .
Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000011
 式3-1A-4中のRの定義は、上述した通りである。
 s4は、0または1である。
 Qa4は、単結合、アルキレン基、または、炭素数2以上のアルキレン基の炭素原子-炭素原子間にエーテル性酸素原子を有する基である。
 Qa4で表されるアルキレン基の炭素数は、1~10が好ましく、2~6が特に好ましい。
 Qa4で表される炭素数2以上のアルキレン基の炭素原子-炭素原子間にエーテル性酸素原子を有する基の炭素数は、2~10が好ましく、2~6が特に好ましい。
 t4は、0または1(ただし、Qa4が単結合の場合は0である。)である。
 -Qa4-(O)t4-としては、化合物を製造しやすい点から、s4が0の場合は、単結合、-CHO-、-CHOCH-、-CHOCHCHO-、-CHOCHCHOCH-、-CHOCHCHCHCHOCH-が好ましく(ただし、左側が(RO)に結合する。)、s4が1の場合は、単結合、-CH-、-CHCH-が好ましい。
The definition of R d in Formula 3-1A-4 is as described above.
s4 is 0 or 1.
Q a4 is a single bond, an alkylene group, or a group having an etheric oxygen atom between carbon atoms of the alkylene group having 2 or more carbon atoms.
The alkylene group represented by Q a4 preferably has 1 to 10 carbon atoms, and particularly preferably 2 to 6 carbon atoms.
The number of carbon atoms of the group having an etheric oxygen atom between carbon atoms of the alkylene group having 2 or more carbon atoms represented by Qa4 is preferably 2 to 6, and particularly preferably 2 to 6.
t4 is 0 or 1 (provided that 0 when Q a4 is a single bond).
-Q a4- (O) t4- is a single bond, -CH 2 O-, -CH 2 OCH 2- , -CH 2 OCH 2 CH 2 when s4 is 0 because it is easy to produce a compound. O—, —CH 2 OCH 2 CH 2 OCH 2 —, —CH 2 OCH 2 CH 2 CH 2 CH 2 OCH 2 — are preferred (where the left side is bonded to (R f O) m ), and s4 is 1. In this case, a single bond, —CH 2 —, —CH 2 CH 2 — is preferable.
 Qb4は、アルキレン基であり、上記アルキレン基は-O-、-C(O)N(R)-(Rの定義は、上述した通りである。)、シルフェニレン骨格基、2価のオルガノポリシロキサン残基またはジアルキルシリレン基を有していてもよい。
 なお、アルキレン基が-O-またはシルフェニレン骨格基を有する場合、炭素原子-炭素原子間に-O-またはシルフェニレン骨格基を有することが好ましい。また、アルキレン基が-C(O)N(R)-、ジアルキルシリレン基または2価のオルガノポリシロキサン残基を有する場合、炭素原子-炭素原子間または(O)u4と結合する側の末端にこれらの基を有することが好ましい。
 Qb4で表されるアルキレン基の炭素数は、1~10が好ましく、2~6が特に好ましい。
Q b4 is an alkylene group, and the alkylene group is —O—, —C (O) N (R d ) — (wherein R d is as defined above), a silphenylene skeleton group, a divalent group It may have an organopolysiloxane residue or a dialkylsilylene group.
In the case where the alkylene group has —O— or a silphenylene skeleton group, it is preferable to have an —O— or silphenylene skeleton group between carbon atoms. Further, when the alkylene group has —C (O) N (R d ) —, a dialkylsilylene group or a divalent organopolysiloxane residue, the terminal on the side bonded to the carbon atom-carbon atom or (O) u4 side It is preferable to have these groups.
The alkylene group represented by Q b4 preferably has 1 to 10 carbon atoms, and particularly preferably 2 to 6 carbon atoms.
 u4は、0または1である。
 -(O)u4-Qb4-としては、化合物を製造しやすい点から、-CHCH-、-CHCHCH-、-CHOCHCHCH-、-CHOCHCHCHCHCH-、-OCHCHCH-、-OSi(CHCHCHCH-、-OSi(CHOSi(CHCHCHCH-、-CHCHCHSi(CHPhSi(CHCHCH-が好ましい(ただし、右側がSiに結合する。)。
u4 is 0 or 1.
As — (O) u4 —Q b4 —, since it is easy to produce a compound, —CH 2 CH 2 —, —CH 2 CH 2 CH 2 —, —CH 2 OCH 2 CH 2 CH 2 —, —CH 2 OCH 2 CH 2 CH 2 CH 2 CH 2 —, —OCH 2 CH 2 CH 2 —, —OSi (CH 3 ) 2 CH 2 CH 2 CH 2 —, —OSi (CH 3 ) 2 OSi (CH 3 ) 2 CH 2 CH 2 CH 2 —, —CH 2 CH 2 CH 2 Si (CH 3 ) 2 PhSi (CH 3 ) 2 CH 2 CH 2 — are preferred (however, the right side is bonded to Si).
 3個の[-(O)u4-Qb4-Si(Rn3 3-n3]は、同一であっても異なっていてもよい。 Three [— (O) u4 -Q b4 —Si (R 3 ) n3 L 3 3-n3 ] may be the same or different.
 基3-1A-4の具体例としては、以下の基が挙げられる。下記式中、*は、(OXm3との結合位置を表す。 Specific examples of the group 3-1A-4 include the following groups. In the following formula, * represents a bonding position with (OX 3 ) m3 .
Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000012
 Qa5は、アルキレン基、または、炭素数2以上のアルキレン基の炭素原子-炭素原子間にエーテル性酸素原子を有する基である。
 Qa5で表されるアルキレン基の炭素数は、1~10が好ましく、2~6が特に好ましい。
 Qa5で表される炭素数2以上のアルキレン基の炭素原子-炭素原子間にエーテル性酸素原子を有する基の炭素数は、2~10が好ましく、2~6が特に好ましい。
 Qa5としては、化合物を製造しやすい点から、-CHOCHCHCH-、-CHOCHCHOCHCHCH-、-CHCH-、-CHCHCH-が好ましい(ただし、右側がSiに結合する。)。
Q a5 is an alkylene group or a group having an etheric oxygen atom between carbon atoms of the alkylene group having 2 or more carbon atoms.
The alkylene group represented by Q a5 preferably has 1 to 10 carbon atoms, and particularly preferably 2 to 6 carbon atoms.
The number of carbon atoms of the group having an etheric oxygen atom between carbon atoms of the alkylene group having 2 or more carbon atoms represented by Q a5 is preferably 2 to 10, and particularly preferably 2 to 6.
The Q a5, from the viewpoint of easily producing the compound, -CH 2 OCH 2 CH 2 CH 2 -, - CH 2 OCH 2 CH 2 OCH 2 CH 2 CH 2 -, - CH 2 CH 2 -, - CH 2 CH 2 CH 2 — is preferred (where the right side is bonded to Si).
 Qb5は、アルキレン基、または、炭素数2以上のアルキレン基の炭素原子-炭素原子間にエーテル性酸素原子もしくは2価のオルガノポリシロキサン残基を有する基である。
 Qb5で表されるアルキレン基の炭素数は、1~10が好ましく、2~6が特に好ましい。
 Qb5で表される炭素数2以上のアルキレン基の炭素原子-炭素原子間にエーテル性酸素原子または2価のオルガノポリシロキサン残基を有する基の炭素数は、2~10が好ましく、2~6が特に好ましい。
 Qb5としては、化合物を製造しやすい点から、-CHCHCH-、-CHCHOCHCHCH-が好ましい(ただし、右側がSi(Rn3 3-n3に結合する。)。
Q b5 is an alkylene group or a group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms of an alkylene group having 2 or more carbon atoms.
The alkylene group represented by Qb5 preferably has 1 to 10 carbon atoms, and particularly preferably 2 to 6 carbon atoms.
The number of carbon atoms of the group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms of the alkylene group having 2 or more carbon atoms represented by Qb5 is preferably 2 to 10. 6 is particularly preferred.
Q b5 is preferably —CH 2 CH 2 CH 2 — or —CH 2 CH 2 OCH 2 CH 2 CH 2 — from the viewpoint of easy production of the compound (where the right side is Si (R 3 ) n3 L 3 3 Bind to n3 ).
 3個の[-Qb5-Si(Rn3 3-n3]は、同一であっても異なっていてもよい。 The three [—Q b5 —Si (R 3 ) n3 L 3 3-n3 ] may be the same or different.
 基2-1-5の具体例としては、以下の基が挙げられる。下記式中、*は、(OXm3との結合位置を表す。 Specific examples of the group 2-1-5 include the following groups. In the following formula, * represents a bonding position with (OX 3 ) m3 .
Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000013
 式3-1A-6中のRの定義は、上述の通りである。
 vは、0または1である。
The definition of R d in Formula 3-1A-6 is as described above.
v is 0 or 1.
 Qa6は、アルキレン基、または、炭素数2以上のアルキレン基の炭素原子-炭素原子間にエーテル性酸素原子を有する基である。
 Qa6で表されるアルキレン基の炭素数は、1~10が好ましく、2~6が特に好ましい。
 Qa6で表される炭素数2以上のアルキレン基の炭素原子-炭素原子間にエーテル性酸素原子を有する基の炭素数は、2~10が好ましく、2~6が特に好ましい。
 Qa6としては、化合物を製造しやすい点から、-CHOCHCHCH-、-CHOCHCHOCHCHCH-、-CHCH-、-CHCHCH-が好ましい(ただし、右側がZに結合する。)。
Q a6 is an alkylene group or a group having an etheric oxygen atom between carbon atoms of a C 2 or more alkylene group.
The alkylene group represented by Q a6 preferably has 1 to 10 carbon atoms, and particularly preferably 2 to 6 carbon atoms.
The carbon number of the group having an etheric oxygen atom between carbon atoms of the alkylene group having 2 or more carbon atoms represented by Qa6 is preferably 2 to 10, and particularly preferably 2 to 6.
The Q a6, from the viewpoint of easily producing the compound, -CH 2 OCH 2 CH 2 CH 2 -, - CH 2 OCH 2 CH 2 OCH 2 CH 2 CH 2 -, - CH 2 CH 2 -, - CH 2 CH 2 CH 2 - is preferred (but the right side is attached to Z a.).
 Zは、(w+1)価のオルガノポリシロキサン残基である。
 wは、2~7の整数である。
 (w+1)価のオルガノポリシロキサン残基としては、下記の基が挙げられる。ただし、下式におけるRは、上述の通りである。
Z a is an organopolysiloxane residue of (w + 1) valence.
w is an integer of 2 to 7.
Examples of the (w + 1) -valent organopolysiloxane residue include the following groups. However, R a in the following formula is as described above.
Figure JPOXMLDOC01-appb-C000014
Figure JPOXMLDOC01-appb-C000014
 Qb6は、アルキレン基、または、炭素数2以上のアルキレン基の炭素原子-炭素原子間にエーテル性酸素原子もしくは2価のオルガノポリシロキサン残基を有する基である。
 Qb6で表されるアルキレン基の炭素数は、1~10が好ましく、2~6が特に好ましい。
 Qb6で表される炭素数2以上のアルキレン基の炭素原子-炭素原子間にエーテル性酸素原子または2価のオルガノポリシロキサン残基を有する基の炭素数は、2~10が好ましく、2~6が特に好ましい。
 Qb6としては、化合物を製造しやすい点から、-CHCH-、-CHCHCH-が好ましい。
Q b6 is an alkylene group or a group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms of a C 2 or more alkylene group.
The alkylene group represented by Qb6 preferably has 1 to 10 carbon atoms, and particularly preferably 2 to 6 carbon atoms.
The number of carbon atoms of the group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms of the alkylene group having 2 or more carbon atoms represented by Qb6 is preferably 2 to 10. 6 is particularly preferred.
The Q b6, from the viewpoint of easily producing the compound, -CH 2 CH 2 -, - CH 2 CH 2 CH 2 - is preferred.
 w個の[-Qb6-Si(Rn3 3-n3]は、同一であっても異なっていてもよい。 The w [—Q b6 —Si (R 3 ) n3 L 3 3-n3 ] may be the same or different.
(化合物1~3の含有比)
 化合物1~3はそれぞれ、1種単独で用いても2種以上を併用してもよい。
 本組成物における、化合物1および化合物2の含有量の合計に対する、化合物3の含有量は、保護フィルムに対する表面層の密着性と表面層の耐摩擦性とのバランスに優れる点で、質量比で0.1~10が好ましく、0.1~4がより好ましく、0.1~1.5がさらに好ましく、0.25~0.67が特に好ましい。
 なお、化合物1および化合物2の両方に該当する化合物については、化合物1または化合物2の一方のみに該当するとして上記質量比を計算する。
(Content ratio of compounds 1 to 3)
Compounds 1 to 3 may be used alone or in combination of two or more.
In the present composition, the content of compound 3 relative to the total content of compound 1 and compound 2 is a mass ratio in that the balance between the adhesion of the surface layer to the protective film and the friction resistance of the surface layer is excellent. 0.1 to 10 is preferable, 0.1 to 4 is more preferable, 0.1 to 1.5 is more preferable, and 0.25 to 0.67 is particularly preferable.
In addition, about the compound applicable to both the compound 1 and the compound 2, the said mass ratio is calculated noting that it corresponds to only one of the compound 1 or the compound 2.
(他の成分)
 本組成物は、液状媒体を含んでいてもよい。
 液状媒体の具体例としては、水、有機溶媒が挙げられる。有機溶媒の具体例としては、フッ素系有機溶媒および非フッ素系有機溶媒が挙げられる。
 有機溶媒は、2種以上を併用してもよい。
(Other ingredients)
The composition may contain a liquid medium.
Specific examples of the liquid medium include water and organic solvents. Specific examples of the organic solvent include fluorinated organic solvents and non-fluorinated organic solvents.
Two or more organic solvents may be used in combination.
 フッ素系有機溶媒の具体例としては、フッ素化アルカン、フッ素化芳香族化合物、フルオロアルキルエーテル、フッ素化アルキルアミン、フルオロアルコールが挙げられる。
 フッ素化アルカンは、炭素数4~8の化合物が好ましく、たとえば、C13H(AC-2000:製品名、AGC社製)、C13(AC-6000:製品名、AGC社製)、CCHFCHFCF(バートレル:製品名、デュポン社製)が挙げられる。
 フッ素化芳香族化合物の具体例としては、ヘキサフルオロベンゼン、トリフルオロメチルベンゼン、ペルフルオロトルエン、1,3-ビス(トリフルオロメチル)ベンゼン、1,4-ビス(トリフルオロメチル)ベンゼンが挙げられる。
 フルオロアルキルエーテルは、炭素数4~12の化合物が好ましく、たとえば、CFCHOCFCFH(AE-3000:製品名、AGC社製)、COCH(ノベック-7100:製品名、3M社製)、COC(ノベック-7200:製品名、3M社製)、CCF(OCH)C(ノベック-7300:製品名、3M社製)が挙げられる。
 フッ素化アルキルアミンの具体例としては、ペルフルオロトリプロピルアミン、ペルフルオロトリブチルアミンが挙げられる。
 フルオロアルコールの具体例としては、2,2,3,3-テトラフルオロプロパノール、2,2,2-トリフルオロエタノール、ヘキサフルオロイソプロパノールが挙げられる。
Specific examples of the fluorinated organic solvent include fluorinated alkanes, fluorinated aromatic compounds, fluoroalkyl ethers, fluorinated alkylamines, and fluoroalcohols.
The fluorinated alkane is preferably a compound having 4 to 8 carbon atoms. For example, C 6 F 13 H (AC-2000: product name, manufactured by AGC), C 6 F 13 C 2 H 5 (AC-6000: product name) , Manufactured by AGC), C 2 F 5 CHFCHFCF 3 (Bertrel: product name, manufactured by DuPont).
Specific examples of the fluorinated aromatic compound include hexafluorobenzene, trifluoromethylbenzene, perfluorotoluene, 1,3-bis (trifluoromethyl) benzene, and 1,4-bis (trifluoromethyl) benzene.
The fluoroalkyl ether is preferably a compound having 4 to 12 carbon atoms. For example, CF 3 CH 2 OCF 2 CF 2 H (AE-3000: product name, manufactured by AGC), C 4 F 9 OCH 3 (Novec-7100: Product name, manufactured by 3M), C 4 F 9 OC 2 H 5 (Novec-7200: product name, manufactured by 3M), C 2 F 5 CF (OCH 3 ) C 3 F 7 (Novec-7300: product name, 3M).
Specific examples of the fluorinated alkylamine include perfluorotripropylamine and perfluorotributylamine.
Specific examples of the fluoroalcohol include 2,2,3,3-tetrafluoropropanol, 2,2,2-trifluoroethanol, and hexafluoroisopropanol.
 非フッ素系有機溶媒としては、水素原子および炭素原子のみからなる化合物、および、水素原子、炭素原子および酸素原子のみからなる化合物が好ましく、具体的には、炭化水素系有機溶媒、ケトン系有機溶媒、エーテル系有機溶媒、エステル系有機溶媒、アルコール系有機溶媒が挙げられる。
 炭化水素系有機溶媒の具体例としては、ヘキサン、へプタン、シクロヘキサンが挙げられる。
 ケトン系有機溶媒の具体例としては、アセトン、メチルエチルケトン、メチルイソブチルケトンが挙げられる。
 エーテル系有機溶媒の具体例としては、ジエチルエーテル、テトラヒドロフラン、テトラエチレングリコールジメチルエーテルが挙げられる。
 エステル系有機溶媒の具体例としては、酢酸エチル、酢酸ブチルが挙げられる。
 アルコール系有機溶媒の具体例としては、イソプロピルアルコールが挙げられる。
As the non-fluorine-based organic solvent, a compound consisting only of a hydrogen atom and a carbon atom and a compound consisting only of a hydrogen atom, a carbon atom and an oxygen atom are preferable. Specifically, a hydrocarbon-based organic solvent, a ketone-based organic solvent , Ether-based organic solvents, ester-based organic solvents, and alcohol-based organic solvents.
Specific examples of the hydrocarbon organic solvent include hexane, heptane, and cyclohexane.
Specific examples of the ketone organic solvent include acetone, methyl ethyl ketone, and methyl isobutyl ketone.
Specific examples of the ether organic solvent include diethyl ether, tetrahydrofuran, and tetraethylene glycol dimethyl ether.
Specific examples of the ester organic solvent include ethyl acetate and butyl acetate.
Specific examples of the alcohol organic solvent include isopropyl alcohol.
 本組成物が液状媒体を含む場合、液状媒体の含有量は、本組成物の全質量に対して、70~99.99質量%が好ましく、80~99.9質量%が特に好ましい。
 本組成物が液状媒体を含み、かつ化合物1を含む場合、化合物1の含有量は、本組成物の全質量に対して、0.002~27.3質量%が好ましく、0.06~16.0質量%が特に好ましい。
 本組成物が液状媒体を含み、かつ化合物2を含む場合、化合物2の含有量は、本組成物の全質量に対して、0.002~27.3質量%が好ましく、0.06~16.0質量%が特に好ましい。
 本組成物が液状媒体を含む場合の化合物3の含有量は、本組成物の全質量に対して、0.001~24.0質量%が好ましく、0.02~8.0質量%が特に好ましい。
When the present composition contains a liquid medium, the content of the liquid medium is preferably 70 to 99.99% by mass, particularly preferably 80 to 99.9% by mass, based on the total mass of the present composition.
When the composition contains a liquid medium and contains Compound 1, the content of Compound 1 is preferably 0.002 to 27.3% by mass, and preferably 0.06 to 16% with respect to the total mass of the composition. 0.0 mass% is particularly preferable.
When the composition contains a liquid medium and contains compound 2, the content of compound 2 is preferably 0.002 to 27.3% by mass, and preferably 0.06 to 16% with respect to the total mass of the composition. 0.0 mass% is particularly preferable.
When the composition contains a liquid medium, the content of the compound 3 is preferably 0.001 to 24.0% by mass, particularly 0.02 to 8.0% by mass, based on the total mass of the composition. preferable.
 本組成物は、上記以外の成分を含んでいてもよい。
 他の成分としては、化合物1~化合物3の製造工程で生成した副生物、未反応の原料等
の製造上の不可避の化合物が挙げられる。
 また、加水分解性シリル基の加水分解と縮合反応を促進する酸触媒や塩基性触媒等の添加剤が挙げられる。酸触媒の具体例としては、塩酸、硝酸、酢酸、硫酸、燐酸、スルホン酸、メタンスルホン酸、p-トルエンスルホン酸が挙げられる。塩基性触媒の具体例としては、水酸化ナトリウム、水酸化カリウム、アンモニアが挙げられる。
 他の成分の含有量は、化合物1~化合物3の合計量に対して、0~10質量%が好ましく、0~5質量%がより好ましく、0~1質量%が特に好ましい。
This composition may contain components other than the above.
Examples of other components include by-products produced in the production steps of Compound 1 to Compound 3, inevitable compounds in production such as unreacted raw materials.
Moreover, additives, such as an acid catalyst and a basic catalyst which accelerate | stimulate the hydrolysis and condensation reaction of a hydrolyzable silyl group, are mentioned. Specific examples of the acid catalyst include hydrochloric acid, nitric acid, acetic acid, sulfuric acid, phosphoric acid, sulfonic acid, methanesulfonic acid, and p-toluenesulfonic acid. Specific examples of the basic catalyst include sodium hydroxide, potassium hydroxide, and ammonia.
The content of the other components is preferably 0 to 10% by mass, more preferably 0 to 5% by mass, and particularly preferably 0 to 1% by mass with respect to the total amount of the compounds 1 to 3.
〔物品〕
 本発明の物品は、基材と、基材上に本組成物から形成されてなる表面層と、を有する。表面層の表面には保護フィルムが貼着されていることが好ましい。
 表面層には、化合物1および化合物2からなる群より選択される少なくとも1種の化合物、ならびに化合物3の、加水分解反応および縮合反応を介して得られる化合物が含まれる。
 表面層の膜厚は、1~100nmが好ましく、1~50nmが特に好ましい。表面層の膜厚は、薄膜解析用X線回折計(ATX-G:製品名、RIGAKU社製)を用いて、X線反射率法によって反射X線の干渉パターンを得て、この干渉パターンの振動周期から算出できる。
[Goods]
The article of the present invention has a base material and a surface layer formed from the composition on the base material. It is preferable that the protective film is stuck on the surface of the surface layer.
The surface layer includes at least one compound selected from the group consisting of Compound 1 and Compound 2, and a compound obtained by subjecting Compound 3 to hydrolysis and condensation reactions.
The film thickness of the surface layer is preferably 1 to 100 nm, and particularly preferably 1 to 50 nm. The thickness of the surface layer was determined by obtaining an interference pattern of reflected X-rays by an X-ray reflectivity method using an X-ray diffractometer for thin film analysis (ATX-G: product name, manufactured by Rigaku). It can be calculated from the vibration period.
 基材は、撥水撥油性の付与が求められている基材であれば特に限定されない。基材の材料の具体例としては、金属、樹脂、ガラス、サファイア、セラミック、石、および、これらの複合材料が挙げられる。ガラスは化学強化されていてもよい。基材は、国際公開第2011/016458号の段落0089~0095に記載の化合物やSiO等で下地処理されていてもよい。 The substrate is not particularly limited as long as it is required to impart water and oil repellency. Specific examples of the base material include metals, resins, glass, sapphire, ceramics, stones, and composite materials thereof. The glass may be chemically strengthened. The substrate may be ground-treated with the compound described in paragraphs 0089 to 0095 of International Publication No. 2011/016458, SiO 2 or the like.
 上記物品は、たとえば、下記の方法で製造できる。
・本組成物を用いたドライコーティング法によって基材の表面を処理して、上記物品を得る方法。
・ウェットコーティング法によって本組成物を基材の表面に塗布し、乾燥させて、上記物品を得る方法。
 なお、ウェットコーティング法においては、化合物1~化合物3を酸触媒や塩基性触媒等を用いて予め加水分解しておき、加水分解した化合物と液状媒体とを含む組成物を使用することもできる。
The article can be manufactured, for example, by the following method.
-The method of processing the surface of a base material by the dry-coating method using this composition, and obtaining the said article | item.
A method of obtaining the above article by applying the present composition to the surface of a substrate by a wet coating method and drying the composition.
In the wet coating method, compounds 1 to 3 may be hydrolyzed in advance using an acid catalyst, a basic catalyst or the like, and a composition containing the hydrolyzed compound and a liquid medium may be used.
 本組成物に含まれる、化合物1および化合物2からなる群より選択される少なくとも1種の化合物と、化合物3と、のMnの差が小さい場合(好ましくはMnの差が0~3,000、特に好ましくはMnの差が0~2,000)、化合物1および化合物2からなる群より選択される少なくとも1種の化合物と、化合物3とが均一に分布した表面層が得られる点で、ドライコーティング法を用いて表面層を形成することが好ましい。
 一方で、本組成物に含まれる、化合物1および化合物2からなる群より選択される少なくとも1種の化合物と、化合物3と、のMの差が大きい場合(好ましくはMnの差が2,000以上、特に好ましくMnの差が3,000以上)、化合物1および化合物2からなる群より選択される少なくとも1種の化合物と、化合物3とが均一に分布した表面層が得られる点で、ウェットコーティング法を用いて表面層を形成することが好ましい。
When the difference in Mn between the compound 3 and at least one compound selected from the group consisting of the compound 1 and the compound 2 contained in the composition is small (preferably the difference in Mn is 0 to 3,000, Particularly preferably, a dry layer is obtained in that a surface layer in which at least one compound selected from the group consisting of Compound 1 and Compound 2 and Compound 3 are uniformly distributed with a difference in Mn of 0 to 2,000) is obtained. It is preferable to form the surface layer using a coating method.
On the other hand, when the M difference between the compound 3 and at least one compound selected from the group consisting of the compound 1 and the compound 2 contained in the composition is large (preferably the difference in Mn is 2,000 As described above, wet is particularly preferable in that a surface layer in which at least one compound selected from the group consisting of Compound 1 and Compound 2 and Compound 3 are uniformly distributed can be obtained. It is preferable to form the surface layer using a coating method.
 ドライコーティング法の具体例としては、真空蒸着法、CVD法、スパッタリング法が挙げられる。これらの中でも、化合物1~3の分解を抑える点、および、装置の簡便さの点から、真空蒸着法が好適である。真空蒸着時には、鉄や鋼等の金属多孔体に本組成物を含浸させたペレット状物質を使用してもよい。
 ウェットコーティング法の具体例としては、スピンコート法、ワイプコート法、スプレーコート法、スキージーコート法、ディップコート法、ダイコート法、インクジェット法、フローコート法、ロールコート法、キャスト法、ラングミュア・ブロジェット法、グラビアコート法が挙げられる。
Specific examples of the dry coating method include a vacuum deposition method, a CVD method, and a sputtering method. Among these, vacuum deposition is preferable from the viewpoint of suppressing the decomposition of the compounds 1 to 3 and the simplicity of the apparatus. At the time of vacuum deposition, a pellet-like substance obtained by impregnating the present composition with a porous metal such as iron or steel may be used.
Specific examples of the wet coating method include spin coating method, wipe coating method, spray coating method, squeegee coating method, dip coating method, die coating method, ink jet method, flow coating method, roll coating method, casting method, Langmuir-Blodget Method and gravure coating method.
 以下、実施例を挙げて本発明を詳細に説明する。ただし、本発明はこれらの実施例に限定されない。なお、例6~9、11~16および18~19が実施例であり、例5、10、17および20が比較例である。各成分の配合量は、質量基準を示す。 Hereinafter, the present invention will be described in detail with reference to examples. However, the present invention is not limited to these examples. Examples 6 to 9, 11 to 16, and 18 to 19 are examples, and examples 5, 10, 17, and 20 are comparative examples. The compounding quantity of each component shows a mass reference | standard.
〔評価方法〕
(水接触角の測定方法)
 表面層の表面に置いた約2μLの蒸留水の接触角(水接触角)を、接触角測定装置(DM-500:製品名、協和界面科学社製)を用いて測定した。表面層の表面における異なる5箇所で測定し、その平均値を算出した。接触角の算出には2θ法を用いた。接触角は100度以上が良好である。
〔Evaluation methods〕
(Measurement method of water contact angle)
The contact angle (water contact angle) of about 2 μL of distilled water placed on the surface of the surface layer was measured using a contact angle measuring device (DM-500: product name, manufactured by Kyowa Interface Science Co., Ltd.). Measurements were made at five different locations on the surface of the surface layer, and the average value was calculated. The 2θ method was used to calculate the contact angle. The contact angle is preferably 100 degrees or more.
(耐摩擦性の試験方法)
 表面層について、JIS L0849:2013(ISO 105-X12:2001)に準拠して往復式トラバース試験機(ケイエヌテー社製)を用い、スチールウールボンスター(♯0000)を圧力:98.07kPa、速度:320cm/分で往復させた。1000回往復させる毎に水接触角を測定し、水接触角が試験前の水接触角に対して初めて85%以下となった時点の往復回数を測定した。なお、往復回数の上限は20,000回とした。往復回数が多いほど、耐摩擦性に優れる。往復回数は5000回以上が好ましく、10,000回以上がより好ましい。
(Friction resistance test method)
For the surface layer, using a reciprocating traverse tester (manufactured by KK NTE) in accordance with JIS L0849: 2013 (ISO 105-X12: 2001), a steel wool bonster (# 0000) was pressure: 98.07 kPa, speed: 320 cm It was reciprocated at / min. The water contact angle was measured every 1000 reciprocations, and the number of reciprocations when the water contact angle became 85% or less for the first time with respect to the water contact angle before the test was measured. The upper limit of the number of reciprocations was 20,000. The greater the number of reciprocations, the better the friction resistance. The number of reciprocations is preferably 5000 times or more, and more preferably 10,000 times or more.
(密着性の試験方法)
 アクリル系粘着層を有するポリ塩化ビニルフィルム(エレップマスキングN-380:製品名、日東電工株式会社製、テープ幅50mm)のアクリル系粘着層を表面層に貼付し、JIS K6854-1:1999(ISO 8510-1:1990)に準拠して、90度剥離試験機(日新科学社製)を用い、室温(23℃)下で100mm/分の剥離速度で、上記ポリ塩化ビニルフィルムを剥離した際の90度剥離力を測定した。剥離力が大きいほど、密着性に優れる。剥離力は250mN/50mm以上が好ましく、370mN/50mm以上がより好ましい。
(Adhesion test method)
An acrylic adhesive layer of a polyvinyl chloride film having an acrylic adhesive layer (Elep Masking N-380: product name, manufactured by Nitto Denko Corporation, tape width 50 mm) is attached to the surface layer, and JIS K 6854-1: 1999 ( In accordance with ISO 8510-1: 1990), the polyvinyl chloride film was peeled off at a peeling rate of 100 mm / min at room temperature (23 ° C.) using a 90-degree peel tester (manufactured by Nisshin Kagaku). The 90 degree peeling force was measured. The greater the peel force, the better the adhesion. The peeling force is preferably 250 mN / 50 mm or more, and more preferably 370 mN / 50 mm or more.
〔例1〕
 化合物2-Aは、以下の手順で合成した。
(例1-1)
 国際公開第2013/121984号の例6-1に記載の方法にしたがい、化合物X1を得た。
 化合物X1:CH-(OCFCFHOCFCFCFCH-OH、繰り返し単位数nの平均値:14
[Example 1]
Compound 2-A was synthesized by the following procedure.
(Example 1-1)
According to the method described in Example 6-1 of International Publication No. 2013/121984, Compound X1 was obtained.
Compound X1: CH 3 — (OCF 2 CFHOCF 2 CF 2 CF 2 CH 2 ) n —OH, average value of the number of repeating units n: 14
(例1-2)
 50mLのナスフラスコに、例1-1で得た化合物X1の8.0g、臭化アリルの0.34g、テトラブチルアンモニウムブロミドの0.08gおよび48質量%水酸化カリウム水溶液の0.60gを入れ、混合物を80℃で5時間撹拌した。混合物を室温(23℃)まで冷却し、AC-6000(製品名、AGC社製)の10gを入れ、2回水洗した。得られた粗液をシリカゲルカラムクロマトグラフィ(展開溶媒:AC-6000)で精製し、化合物X2の7.9g(収率98%)を得た。
 化合物X2のNMRスペクトル;
 H-NMR(300.4MHz、溶媒:CDCl、基準:TMS(テトラメチルシラン)) δ(ppm):2.4(2H)、4.0(2H)、4.2(2H)、4.5(2H)、4.8(26H)、5.2~5.4(2H)、5.8~6.0(1H)、6.7~6.9(14H)。
 19F-NMR(282.7MHz、溶媒:CDCl、基準:CFCl) δ(ppm):-81(3F)、-84~-85(28F)、-89~-91(28F)、-114(2F)、-120(26F)、-122(4F)、-123(2F)、-124(2F)、-127(30F)、-145(14F)。
 化合物X2:CH-(OCFCFHOCFCFCFCH-OCHCH=CH、繰り返し単位数nの平均値:14、化合物X2のMn:4,300。
(Example 1-2)
In a 50 mL eggplant flask, 8.0 g of compound X1 obtained in Example 1-1, 0.34 g of allyl bromide, 0.08 g of tetrabutylammonium bromide, and 0.60 g of 48 mass% aqueous potassium hydroxide solution were placed. The mixture was stirred at 80 ° C. for 5 hours. The mixture was cooled to room temperature (23 ° C.), charged with 10 g of AC-6000 (product name, manufactured by AGC), and washed twice with water. The resulting crude liquid was purified by silica gel column chromatography (developing solvent: AC-6000) to obtain 7.9 g (yield 98%) of compound X2.
NMR spectrum of compound X2;
1 H-NMR (300.4 MHz, solvent: CDCl 3 , standard: TMS (tetramethylsilane)) δ (ppm): 2.4 (2H), 4.0 (2H), 4.2 (2H), 4 .5 (2H), 4.8 (26H), 5.2 to 5.4 (2H), 5.8 to 6.0 (1H), 6.7 to 6.9 (14H).
19 F-NMR (282.7 MHz, solvent: CDCl 3 , standard: CFCl 3 ) δ (ppm): -81 (3F), -84 to -85 (28F), -89 to -91 (28F), -114 (2F), -120 (26F), -122 (4F), -123 (2F), -124 (2F), -127 (30F), -145 (14F).
Compound X2: CH 3 — (OCF 2 CFHOCF 2 CF 2 CF 2 CH 2 ) n —OCH 2 CH═CH 2 , average number of repeating units n: 14, Mn of compound X2: 4,300.
(例1-3)
 10mLのガラス製サンプル瓶に、例1-2で得た化合物X2の6.0g、白金/1,3-ジビニル-1,1,3,3-テトラメチルジシロキサン錯体のキシレン溶液(白金含有量:2質量%)の0.06g、HSi(OCHの1.01g、アニリンの0.02g、1,3-ビス(トリフルオロメチル)ベンゼン(東京化成工業社製)の1.0gを入れ、混合物を40℃で8時間撹拌した。反応終了後、溶媒等を減圧留去し、1.0μm孔径のメンブランフィルタでろ過し、化合物2-Aの6.5g(収率100%)を得た。
 化合物2-AのNMRスペクトル;
 H-NMR(300.4MHz、溶媒:CDCl、基準:TMS) δ(ppm):0.4(2H)、1.7(2H)、3.2(9H)、3.3(3H)、3.7(2H)、4. 0 (2H)、4.2 (26H)、5.5~5.8(13H)。
 19F-NMR(282.7MHz、溶媒:CDCl、基準:CFCl) δ(ppm):-84.5~-87.0 (26F)、-90.3~-92.2 (26F)、-120.6(24F)、-124.1(2F)、-128.0(26F)、-143.8~-145.0(13F)。
 化合物2-A:CH-(OCFCFHOCFCFCFCH-OCHCHCHSi(OCH
 繰り返し単位数nの平均値:14、化合物2-AのMn:4,420。
(Example 1-3)
In a 10 mL glass sample bottle, 6.0 g of the compound X2 obtained in Example 1-2, xylene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content) : 0.02 g of 2 mass%), 1.01 g of HSi (OCH 3 ) 3 , 0.02 g of aniline, 1.0 g of 1,3-bis (trifluoromethyl) benzene (manufactured by Tokyo Chemical Industry Co., Ltd.) And the mixture was stirred at 40 ° C. for 8 hours. After completion of the reaction, the solvent and the like were distilled off under reduced pressure and filtered through a membrane filter having a pore size of 1.0 μm to obtain 6.5 g of Compound 2-A (yield 100%).
NMR spectrum of compound 2-A;
1 H-NMR (300.4 MHz, solvent: CDCl 3 , standard: TMS) δ (ppm): 0.4 (2H), 1.7 (2H), 3.2 (9H), 3.3 (3H) 3.7 (2H), 4.0 (2H), 4.2 (26H), 5.5 to 5.8 (13H).
19 F-NMR (282.7 MHz, solvent: CDCl 3 , standard: CFCl 3 ) δ (ppm): −84.5 to −87.0 (26F), −90.3 to −92.2 (26F), -120.6 (24F), -124.1 (2F), -128.0 (26F), -143.8 to -145.0 (13F).
Compound 2-A: CH 3 — (OCF 2 CFHOCF 2 CF 2 CF 2 CH 2 ) n —OCH 2 CH 2 CH 2 Si (OCH 3 ) 3 ,
Average number of repeating units n: 14, Mn of compound 2-A: 4,420.
〔例2〕
 化合物3-Aは、以下の手順で合成した。
(例2-1)
 国際公開第2013/121984号の例11-1~11-3に記載の方法にしたがい、化合物Y1を得た。
 化合物Y1:CF-(OCFCFOCFCFCFCF-OCFCF-OCFCFCFCF-OC(O)CF(CF)OCFCFCF、nの平均値:13、Mn:5,050。
[Example 2]
Compound 3-A was synthesized by the following procedure.
(Example 2-1)
According to the method described in Examples 11-1 to 11-3 of International Publication No. 2013/121984, Compound Y1 was obtained.
Compound Y1: CF 3 — (OCF 2 CF 2 OCF 2 CF 2 CF 2 CF 2 ) n —OCF 2 CF 2 —OCF 2 CF 2 CF 2 CF 2 —OC (O) CF (CF 3 ) OCF 2 CF 2 CF 3 , Average value of n: 13, Mn: 5,050.
(例2-2)
 50mLの3つ口フラスコ内に、化合物Y1の9.0gおよびNHCHC(CHCH=CHの0.45gを入れ、混合物を室温(23℃)で12時間撹拌した。反応粗液をシリカゲルカラムクロマトグラフィに展開して、化合物Y2の9.4g(収率99%)を分取した。
 化合物Y2:CF-(OCFCFOCFCFCFCF-OCFCF-OCFCFCF-C(O)NHCHC(CHCH=CH
nの平均値:13、Mn:4,800。
(Example 2-2)
In a 50 mL three-necked flask, 9.0 g of compound Y1 and 0.45 g of NH 2 CH 2 C (CH 2 CH═CH 2 ) 3 were placed, and the mixture was stirred at room temperature (23 ° C.) for 12 hours. The reaction crude liquid was developed on silica gel column chromatography to fractionate 9.4 g (yield 99%) of compound Y2.
Compound Y2: CF 3 — (OCF 2 CF 2 OCF 2 CF 2 CF 2 CF 2 ) n —OCF 2 CF 2 —OCF 2 CF 2 CF 2 —C (O) NHCH 2 C (CH 2 CH═CH 2 ) 3 ,
Average value of n: 13, Mn: 4,800.
(例2-3)
 100mLのテトラフルオロエチレン-ペルフルオロ(アルコキシビニルエーテル)共重合体製ナスフラスコに、化合物Y2の5.0g、白金/1,3-ジビニル-1,1,3,3-テトラメチルジシロキサン錯体のキシレン溶液(白金含有量:2質量%)の0.03g、トリメトキシシランの0.36g、アニリンの0.01gおよび1,3-ビス(トリフルオロメチル)ベンゼンの2.0gを入れ、混合物を室温(23℃)で8時間撹拌した。溶媒等を減圧留去し、孔径0.5μmのメンブランフィルタでろ過し、化合物3-Aの5.2g(純度99%以上、収率99%)を得た。
 化合物3-AのNMRスペクトル;
 H-NMR(300.4MHz、溶媒:CDCl、基準:TMS) δ(ppm):0.75(6H)、1.3~1.6(12H)、3.4(2H)、3.7(27H)。
 19F-NMR(282.7MHz、溶媒:CDCl、基準:CFCl) δ(ppm):-55.2(3F)、-82.1(54F)、-88.1(54F)、-90.2(2F)、-119.6(2F)、-125.4(52F)、-126.2(2F)。
 化合物3-A:CF-(OCFCFOCFCFCFCF-OCFCF-OCFCFCF-C(O)NH-CH-C[CHCHCH-Si(OCH、 nの平均値:13、Mn:5,400。
(Example 2-3)
In a 100 mL tetrafluoroethylene-perfluoro (alkoxy vinyl ether) copolymer eggplant flask, 5.0 g of compound Y2 and a xylene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (Platinum content: 2% by mass) 0.03 g, trimethoxysilane 0.36 g, aniline 0.01 g and 1,3-bis (trifluoromethyl) benzene 2.0 g were added, and the mixture was allowed to cool to room temperature ( At 23 ° C.) for 8 hours. The solvent and the like were distilled off under reduced pressure and filtered through a membrane filter having a pore size of 0.5 μm to obtain 5.2 g of compound 3-A (purity 99% or more, yield 99%).
NMR spectrum of compound 3-A;
1 H-NMR (300.4 MHz, solvent: CDCl 3 , standard: TMS) δ (ppm): 0.75 (6H), 1.3 to 1.6 (12H), 3.4 (2H), 3. 7 (27H).
19 F-NMR (282.7 MHz, solvent: CDCl 3 , reference: CFCl 3 ) δ (ppm): −55.2 (3F), −82.1 (54F), −88.1 (54F), −90 .2 (2F), -119.6 (2F), -125.4 (52F), -126.2 (2F).
Compound 3-A: CF 3 — (OCF 2 CF 2 OCF 2 CF 2 CF 2 CF 2 ) n —OCF 2 CF 2 —OCF 2 CF 2 CF 2 —C (O) NH—CH 2 —C [CH 2 CH 2 CH 2 —Si (OCH 3 ) 3 ] 3 , n average value: 13, Mn: 5,400.
〔例3〕
 化合物3-Bは、以下の手順で合成した。
(例3-1)
 50mLの3つ口フラスコ内に、例2-1で得た化合物Y1の10.1g、ジアリルアミンの0.97g、1,3-ビス(トリフルオロメチル)ベンゼンの10gを入れ、混合物を室温(23℃)で8時間撹拌した。反応粗液をエバポレータで濃縮し、粗生成物の9.8gを得た。粗生成物をシリカゲルカラムクロマトグラフィに展開して、化合物Y3の9.5g(収率99%)を分取した。
 化合物Y3のNMRスペクトル;
 H-NMR(300.4MHz、溶媒:CDCl、基準:TMS) δ(ppm):4.0(4H)、5.3~5.4(4H)、5.7~6.0(2H)。
 19F-NMR(282.7MHz、溶媒:CDCl、基準:CFCl) δ(ppm):-55.1(3F)、-82.6(54F)、-87.9(54F)、-90.0(2F)、-110.3(2F)、-124.1(2F)、-125.0(52F)。
 化合物Y3:CF-(OCFCFOCFCFCFCF-OCFCF-OCFCFCF-C(O)N(CHCH=CH
 nの平均値:13、Mn:4,790。
[Example 3]
Compound 3-B was synthesized by the following procedure.
(Example 3-1)
In a 50 mL three-necked flask, 10.1 g of the compound Y1 obtained in Example 2-1, 0.97 g of diallylamine, and 10 g of 1,3-bis (trifluoromethyl) benzene were placed, and the mixture was cooled to room temperature (23 ) For 8 hours. The reaction crude liquid was concentrated with an evaporator to obtain 9.8 g of a crude product. The crude product was developed on silica gel column chromatography to fractionate 9.5 g (yield 99%) of compound Y3.
NMR spectrum of compound Y3;
1 H-NMR (300.4 MHz, solvent: CDCl 3 , standard: TMS) δ (ppm): 4.0 (4H), 5.3 to 5.4 (4H), 5.7 to 6.0 (2H ).
19 F-NMR (282.7 MHz, solvent: CDCl 3 , reference: CFCl 3 ) δ (ppm): −55.1 (3F), −82.6 (54F), −87.9 (54F), −90 0.0 (2F), -110.3 (2F), -124.1 (2F), -125.0 (52F).
Compound Y3: CF 3 — (OCF 2 CF 2 OCF 2 CF 2 CF 2 CF 2 ) n —OCF 2 CF 2 —OCF 2 CF 2 CF 2 —C (O) N (CH 2 CH═CH 2 ) 2 ,
Average value of n: 13, Mn: 4,790.
(例3-2)
 100mLのテトラフルオロエチレン-ペルフルオロ(アルコキシビニルエーテル)共重合体製ナスフラスコに、化合物Y3の5.0g、白金/1,3-ジビニル-1,1,3,3-テトラメチルジシロキサン錯体のキシレン溶液(白金含有量:2質量%)の0.03g、トリメトキシシランの0.36g、アニリンの0.01gおよび1,3-ビス(トリフルオロメチル)ベンゼンの2.0gを入れ、混合物を室温(23℃)で8時間撹拌した。溶媒等を減圧留去し、孔径0.5μmのメンブランフィルタでろ過し、化合物3-Bの5.2g(純度99%以上、収率99%)を得た。
 化合物3-BのNMRスペクトル;
 H-NMR(300.4MHz、溶媒:CDCl、基準:TMS) δ(ppm):0.6(4H)、1.8(4H)、3.4(4H)、3.6(18H)。
 19F-NMR(282.7MHz、溶媒:CDCl、基準:CFCl) δ(ppm):-55.2(3F)、-82.8(54F)、-88.1(54F)、-90.2(2F)、-111.4(2F)、-124.2(2F)、-125.2(52F)。
 化合物3-B:CF-(OCFCFOCFCFCFCF-OCFCF-OCFCFCF-C(O)N[CHCHCHSi(OCH
 nの平均値:13、Mn:5,050。
(Example 3-2)
In a 100 mL tetrafluoroethylene-perfluoro (alkoxy vinyl ether) copolymer eggplant flask, 5.0 g of compound Y3 and a xylene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (Platinum content: 2% by mass) 0.03 g, trimethoxysilane 0.36 g, aniline 0.01 g and 1,3-bis (trifluoromethyl) benzene 2.0 g were added, and the mixture was allowed to cool to room temperature ( At 23 ° C.) for 8 hours. The solvent and the like were distilled off under reduced pressure and filtered through a membrane filter having a pore size of 0.5 μm to obtain 5.2 g of compound 3-B (purity 99% or more, yield 99%).
NMR spectrum of compound 3-B;
1 H-NMR (300.4 MHz, solvent: CDCl 3 , standard: TMS) δ (ppm): 0.6 (4H), 1.8 (4H), 3.4 (4H), 3.6 (18H) .
19 F-NMR (282.7 MHz, solvent: CDCl 3 , reference: CFCl 3 ) δ (ppm): −55.2 (3F), −82.8 (54F), −88.1 (54F), −90 .2 (2F), -111.4 (2F), -124.2 (2F), -125.2 (52F).
Compound 3-B: CF 3 — (OCF 2 CF 2 OCF 2 CF 2 CF 2 CF 2 ) n —OCF 2 CF 2 —OCF 2 CF 2 CF 2 —C (O) N [CH 2 CH 2 CH 2 Si ( OCH 3 ) 3 ] 2 ,
Average value of n: 13, Mn: 5,050.
〔例4〕
 化合物1-Aは、東京化成工業社製、トリメトキシ(1H,1H,2H,2H-トリデカフルオロ-n-オクチル)シラン(CF-(CF(CH-Si(OCH)を用いた。
[例5~20]
 例1~4で得た各化合物1-A、2-A、3-A、3-Bを、表1、2に記載の割合で混合して、例6~9、11~16および18~19の組成物を得た。
 得られた組成物を用いて、以下のドライコーティング法にて基材の表面処理を行い、基材(化学強化ガラス)の表面に表面層が形成されてなる評価サンプル(物品)を得た。
 なお、例5、10、17および20については、化合物1-A、2-A、3-A、および3-Bのうち、1種の化合物のみを用いた他は、上記の例6~9、11~16および18~19の場合と同様に実施することにより、各評価サンプルを作製した。
 得られた各評価サンプルを用いて、上述の評価試験を実施し、結果を表1、2に示す。
[Example 4]
Compound 1-A is trimethoxy (1H, 1H, 2H, 2H-tridecafluoro-n-octyl) silane (CF 3- (CF 2 ) 5 (CH 2 ) 2 -Si (OCH 3 ) manufactured by Tokyo Chemical Industry Co., Ltd. ) 3 ) was used.
[Examples 5 to 20]
The compounds 1-A, 2-A, 3-A and 3-B obtained in Examples 1 to 4 were mixed in the proportions shown in Tables 1 and 2, and Examples 6 to 9, 11 to 16 and 18 to 19 compositions were obtained.
Using the obtained composition, surface treatment of the base material was performed by the following dry coating method to obtain an evaluation sample (article) in which a surface layer was formed on the surface of the base material (chemically tempered glass).
For Examples 5, 10, 17 and 20, Examples 6 to 9 were used except that only one compound was used among compounds 1-A, 2-A, 3-A and 3-B. , 11 to 16 and 18 to 19, each evaluation sample was produced.
Using the obtained evaluation samples, the above-described evaluation tests were performed, and the results are shown in Tables 1 and 2.
(ドライコーティング法)
 真空蒸着装置(VTR-350M:製品名、アルバック機工社製)内のモリブデン製ボートに、蒸着源として表1に記載の組成物(0.5g)を配置した。真空蒸着装置内に基材を配置し、真空蒸着装置内を5×10-3Pa以下(絶対圧)の圧力になるまで排気した。上記各組成物を配置したボートを300℃になるまで加熱し、表1に記載の各組成物を基材に真空蒸着させ、厚さ10nmの蒸着膜を形成した。蒸着膜が形成された基材を、温度200℃で30分間加熱(後処理)して、厚さ10nmの表面層を形成し、評価サンプルを得た。
(Dry coating method)
A composition (0.5 g) shown in Table 1 was placed as a vapor deposition source on a molybdenum boat in a vacuum vapor deposition apparatus (VTR-350M: product name, ULVAC Kiko Co., Ltd.). The substrate was placed in a vacuum deposition apparatus, and the inside of the vacuum deposition apparatus was evacuated to a pressure of 5 × 10 −3 Pa or less (absolute pressure). The boat in which each of the above-described compositions was placed was heated to 300 ° C., and each of the compositions shown in Table 1 was vacuum-deposited on a substrate to form a deposited film having a thickness of 10 nm. The base material on which the deposited film was formed was heated (post treatment) at a temperature of 200 ° C. for 30 minutes to form a surface layer having a thickness of 10 nm, and an evaluation sample was obtained.
Figure JPOXMLDOC01-appb-T000015
Figure JPOXMLDOC01-appb-T000015

Figure JPOXMLDOC01-appb-T000016
Figure JPOXMLDOC01-appb-T000016
 表1、2の通り、化合物1または化合物2、および、化合物3を含む組成物を用いた場合(例6~9、11~16および18~19)、耐摩擦性および保護フィルムとの密着性に優れた表面層が得られることを確認した。 As shown in Tables 1 and 2, when a composition containing Compound 1 or Compound 2 and Compound 3 was used (Examples 6 to 9, 11 to 16, and 18 to 19), friction resistance and adhesion to a protective film It was confirmed that an excellent surface layer was obtained.
 本発明の組成物は、撥水撥油性の付与が求められている各種の用途に用いることができる。たとえば、タッチパネル等の表示入力装置のコート;透明なガラス製または透明なプラスチック製部材の表面保護コート、キッチン用防汚コート;電子機器、熱交換器、電池等の撥水防湿コートや防汚コート;トイレタリー用防汚コート;導通しながら撥液が必要な部材へのコート;熱交換機の撥水・防水・滑水コート;振動ふるいやシリンダ内部等の表面低摩擦コート等に用いることができる。 The composition of the present invention can be used for various applications that are required to impart water and oil repellency. For example, coats for display input devices such as touch panels; surface protective coats made of transparent glass or transparent plastic parts, antifouling coats for kitchens; water-repellent moisture-proof coats and antifouling coats for electronic devices, heat exchangers, batteries, etc. Antifouling coating for toiletries; coating on a member that requires liquid repellency while conducting; water-repellent / water-proof / sliding coat for heat exchanger; surface friction coating for vibrating screens and cylinders, etc.
 より具体的な使用例としては、ディスプレイの前面保護板、反射防止板、偏光板、アンチグレア板、あるいはそれらの表面に反射防止膜処理を施したもの、携帯電話、携帯情報端末等の機器のタッチパネルシートやタッチパネルディスプレイ等の人の指または手のひらで画面上の操作を行う表示入力装置を有する各種機器のコート、メガネレンズ等の表面保護コート、トイレ、風呂、洗面所、キッチン等の水周りの装飾建材のコート、配線板用防水コーティング、熱交換機の撥水・防水・滑水コート、太陽電池の撥水コート、プリント配線板の防水・撥水コート、電子機器筐体や電子部品用の防水・撥水コート、送電線の絶縁性向上コート、各種フィルタの防水・撥水コート、電波吸収材や吸音材の防水性コート、風呂、厨房機器、トイレタリー用防汚コート、振動ふるいやシリンダ内部等の表面低摩擦コート、機械部品、真空機器部品、ベアリング部品、自動車等の輸送機器用部品(たとえば、外装、ガラス、ミラー、バンパー)、
工具等の表面保護コート等が挙げられる。
More specific examples of use include a front protective plate of a display, an antireflection plate, a polarizing plate, an antiglare plate, or an antireflection coating on the surface thereof, a touch panel of a device such as a mobile phone or a portable information terminal. Coats for various devices with display input devices that operate on the screen with human fingers or palms such as sheets and touch panel displays, surface protection coats such as eyeglass lenses, decorations around water such as toilets, baths, washrooms, kitchens, etc. Coating for building materials, waterproof coating for wiring boards, water repellent / waterproof / sliding coat for heat exchangers, water repellent coat for solar cells, waterproof / water repellent coat for printed wiring boards, waterproof for electronic equipment casings and electronic components Water repellent coat, insulation improvement coating for power transmission lines, waterproof / water repellent coat for various filters, waterproof coat for radio wave absorber and sound absorbing material, bath, kitchen equipment, toilet Over antifouling coating, the surface a low friction coating of vibrating screen and the cylinder interior and the like, mechanical parts, vacuum equipment parts, bearing parts, parts for transportation equipment such as automobiles (e.g., exterior, glass, mirrors, bumpers),
Examples thereof include a surface protective coat such as a tool.
 なお、2018年4月20日に出願された日本特許出願2018-081607号の明細書、特許請求の範囲、図面、及び要約書の全内容をここに引用し、本発明の明細書の開示として、取り入れるものである。 It should be noted that the entire contents of the specification, claims, drawings, and abstract of Japanese Patent Application No. 2018-081607 filed on April 20, 2018 are cited herein as disclosure of the specification of the present invention. Incorporate.

Claims (12)

  1.  式1で表される化合物1、および、式21で表される繰り返し単位を含むポリ(オキシフルオロアルキレン)鎖と式22で表される基とを有する化合物2からなる群より選択される少なくとも1種の化合物と、
     式31で表される繰り返し単位を含むポリ(オキシペルフルオロアルキレン)鎖と、2個以上の式32で表される基とを有し、式21で表される繰り返し単位を含まない化合物3と、を含む、組成物。
      R11-(OX)-Y-Z(R12(R13r-q  式1
     ただし、式1中、
     R11は、フルオロアルキル基である。
     Xは、1個以上のフッ素原子を有する炭素数1以上のフルオロアルキレン基である。
     mは、0~4の整数である。
     Yは、-O-、-C(O)N(R14)-もしくは-C(O)-を有していてもよいアルキレン基、単結合、-O-、-C(O)N(R14)-または-C(O)-である。前記-O-、-C(O)N(R14)-または-C(O)-を有していてもよいアルキレン基は、フッ素原子を有していてもよい。ただし、前記Yが-OCF-を含むアルキレン基である場合、前記アルキレン基中の-OCF-の数は1個である。
     R14は、水素原子またはアルキル基である。
     Zは、炭素原子、ケイ素原子または窒素原子である。
     R12は、水素原子、水酸基またはアルキル基である。
     R13は、-L-Si(Rn13-n1である。Rは、1価の炭化水素基である。Lは、加水分解性基または水酸基である。n1は、0~2の整数である。Lは、-O-を有していてもよいアルキレン基である。
     Zが炭素原子またはケイ素原子の場合、rは3であり、qは0~1の整数である。Zが窒素原子の場合、rは2であり、qは0である。
      (OX)  式21
      -Si(Rn2 3-n2  式22
     ただし、式21および式22中、
     Xは、1個以上の水素原子を有するフルオロアルキレン基である。
     Rは、1価の炭化水素基である。
     Lは、加水分解性基または水酸基である。
     n2は、0~2の整数である。
      (OXm3  式31
      -Si(Rn3 3-n3  式32
     ただし、式31および式32中、
     Xは、ペルフルオロアルキレン基である。
     m3は、5以上の整数である。
     Rは、1価の炭化水素基である。
     Lは、加水分解性基または水酸基である。n3は、0~2の整数である。
    At least 1 selected from the group consisting of Compound 1 represented by Formula 1 and Compound 2 having a poly (oxyfluoroalkylene) chain containing a repeating unit represented by Formula 21 and a group represented by Formula 22 Species of compounds,
    Compound 3 having a poly (oxyperfluoroalkylene) chain containing a repeating unit represented by formula 31 and two or more groups represented by formula 32, and not containing a repeating unit represented by formula 21; A composition comprising:
    R 11 - (OX) m -Y -Z (R 12) q (R 13) r-q Formula 1
    However, in Formula 1,
    R 11 is a fluoroalkyl group.
    X is a fluoroalkylene group having 1 or more carbon atoms and having 1 or more fluorine atoms.
    m is an integer of 0-4.
    Y represents an alkylene group which may have —O—, —C (O) N (R 14 ) — or —C (O) —, a single bond, —O—, —C (O) N (R 14 )-or -C (O)-. The alkylene group which may have —O—, —C (O) N (R 14 ) — or —C (O) — may have a fluorine atom. However, the Y is -OCF 2 - when is an alkylene group containing, -OCF 2 in the alkylene group - number of is one.
    R 14 is a hydrogen atom or an alkyl group.
    Z is a carbon atom, a silicon atom or a nitrogen atom.
    R 12 is a hydrogen atom, a hydroxyl group or an alkyl group.
    R 13 is —L 1 —Si (R 1 ) n1 L 3-n1 . R 1 is a monovalent hydrocarbon group. L is a hydrolyzable group or a hydroxyl group. n1 is an integer of 0-2. L 1 is an alkylene group which may have —O—.
    When Z is a carbon atom or a silicon atom, r is 3 and q is an integer of 0 to 1. When Z is a nitrogen atom, r is 2 and q is 0.
    (OX 2 ) Formula 21
    —Si (R 2 ) n2 L 2 3-n2 Formula 22
    However, in Formula 21 and Formula 22,
    X 2 is a fluoroalkylene group having one or more hydrogen atoms.
    R 2 is a monovalent hydrocarbon group.
    L 2 is a hydrolyzable group or a hydroxyl group.
    n2 is an integer of 0-2.
    (OX 3 ) m3 formula 31
    —Si (R 3 ) n3 L 3 3-n3 Formula 32
    However, in Formula 31 and Formula 32,
    X 3 is a perfluoroalkylene group.
    m3 is an integer of 5 or more.
    R 3 is a monovalent hydrocarbon group.
    L 3 is a hydrolyzable group or a hydroxyl group. n3 is an integer of 0-2.
  2.  前記式(1)におけるmが0または1である、請求項1に記載の組成物。 The composition according to claim 1, wherein m in the formula (1) is 0 or 1.
  3.  前記化合物2が式2で表される化合物である、請求項1または2に記載の組成物。
      R21-[(OXm2(OX21m20]-Y-Z(R22q2(R23r2-q2  式2
     ただし、式2中、
     R21は、フッ素原子を有していてもよいアルキル基、または、-Y-Z(R22q2(R23r2-q2である。
     Xは、1個以上の水素原子を有するフルオロアルキレン基である。
     X21は、ペルフルオロアルキレン基である。
     Yは、単結合または2価の連結基である。
     Zは、炭素原子、ケイ素原子または窒素原子である。
     R22は、水素原子、水酸基またはアルキル基である。
     R23は、-L21-Si(Rn2 3-n2である。L21は、-O-を有していてもよいアルキレン基である。Rは、1価の炭化水素基である。Lは、加水分解性基または水酸基である。n2は、0~2の整数である。
     m2は2以上の整数であり、m20は0以上の整数であり、m2+m20は5以上の整数である。
     Zが炭素原子またはケイ素原子の場合、r2は3であり、q2は0~2の整数である。Zが窒素原子の場合、r2は2であり、q2は0~1の整数である。
    The composition according to claim 1 or 2, wherein the compound 2 is a compound represented by the formula 2.
    R 21 - [(OX 2) m2 (OX 21) m20] -Y 2 -Z 2 (R 22) q2 (R 23) r2-q2 formula 2
    However, in Formula 2,
    R 21 is an alkyl group which may have a fluorine atom, or —Y 2 —Z 2 (R 22 ) q2 (R 23 ) r2-q2 .
    X 2 is a fluoroalkylene group having one or more hydrogen atoms.
    X 21 is a perfluoroalkylene group.
    Y 2 is a single bond or a divalent linking group.
    Z 2 is a carbon atom, a silicon atom or a nitrogen atom.
    R 22 is a hydrogen atom, a hydroxyl group or an alkyl group.
    R 23 is —L 21 —Si (R 2 ) n2 L 2 3-n2 . L 21 is an alkylene group which may have —O—. R 2 is a monovalent hydrocarbon group. L 2 is a hydrolyzable group or a hydroxyl group. n2 is an integer of 0-2.
    m2 is an integer of 2 or more, m20 is an integer of 0 or more, and m2 + m20 is an integer of 5 or more.
    If Z 2 is a carbon atom or a silicon atom, r2 is 3, q2 is an integer of 0-2. If Z 2 is a nitrogen atom, r2 is 2, q2 is an integer of 0-1.
  4.  前記化合物3が式3で表される化合物である、請求項1~3のいずれか1項に記載の組成物。
     [A-(OXm3-][-Si(Rn3 3-n3  式3
     ただし、式3中、
     Aは、ペルフルオロアルキル基または-Q[-Si(Rn3 3-n3である。
     Qは、(k+1)価の連結基である。
     kは1~10の整数である。
     Rは、1価の炭化水素基である。
     Lは、加水分解性基または水酸基である。n3は、0~2の整数である。
     Xは、ペルフルオロアルキレン基である。
     m3は、5以上の整数である。
     Zは、(j+g)価の連結基である。
     jは、1以上の整数である。
     gは、1以上の整数である。ただし、Aがペルフルオロアルキル基の場合、gは、2以上の整数であり、Aが-Q[-Si(Rn3 3-n3の場合、g+kは、2以上の整数である。
    The composition according to any one of claims 1 to 3, wherein the compound 3 is a compound represented by the formula 3.
    [A- (OX 3 ) m3 −] j Z 3 [—Si (R 3 ) n3 L 3 3-n3 ] g Formula 3
    However, in Formula 3,
    A is a perfluoroalkyl group or —Q [—Si (R 3 ) n3 L 3 3-n3 ] k .
    Q is a (k + 1) -valent linking group.
    k is an integer of 1 to 10.
    R 3 is a monovalent hydrocarbon group.
    L 3 is a hydrolyzable group or a hydroxyl group. n3 is an integer of 0-2.
    X 3 is a perfluoroalkylene group.
    m3 is an integer of 5 or more.
    Z 3 is a (j + g) -valent linking group.
    j is an integer of 1 or more.
    g is an integer of 1 or more. However, when A is a perfluoroalkyl group, g is an integer of 2 or more, and when A is —Q [—Si (R 3 ) n3 L 3 3-n3 ] k , g + k is an integer of 2 or more. is there.
  5.  前記化合物1および化合物2からなる群より選択される少なくとも1種の化合物と、化合物3と、の数平均分子量の差が0~3,000である、請求項1~4のいずれか1項に記載の組成物。 The number average molecular weight difference between at least one compound selected from the group consisting of the compound 1 and the compound 2 and the compound 3 is 0 to 3,000, according to any one of claims 1 to 4. The composition as described.
  6.  前記化合物1および前記化合物2の含有量の合計に対する、前記化合物3の含有量が、質量比で0.1~10である、請求項1~5のいずれか1項に記載の組成物。 The composition according to any one of claims 1 to 5, wherein the content of the compound 3 with respect to the total content of the compound 1 and the compound 2 is 0.1 to 10 by mass ratio.
  7.  フッ素系有機溶媒、非フッ素系有機溶媒、または水を含む液状媒体を含む請求項1~6のいずれか1項に記載の組成物。 The composition according to any one of claims 1 to 6, comprising a liquid medium containing a fluorine-based organic solvent, a non-fluorine-based organic solvent, or water.
  8.  基材と、前記基材上に、請求項1~7のいずれか1項に記載の組成物から形成されてなる表面層と、を有する物品。 An article having a base material and a surface layer formed on the base material from the composition according to any one of claims 1 to 7.
  9.  前記組成物からドライコーティング法により形成されてなる請求項8に記載の物品。 The article according to claim 8, wherein the article is formed from the composition by a dry coating method.
  10.  前記基材が、金属、樹脂、ガラス、サファイア、セラミック、石、または、これらの複合材料である、請求項8または9に記載の物品。 The article according to claim 8 or 9, wherein the substrate is metal, resin, glass, sapphire, ceramic, stone, or a composite material thereof.
  11.  前記表面層の膜厚が、1~100nmである、請求項8~10のいずれか1項に記載の物品。 The article according to any one of claims 8 to 10, wherein the film thickness of the surface layer is 1 to 100 nm.
  12.  前記表面層の表面に保護フィルムが貼着されている、請求項8~11のいずれか1項に記載の物品。 The article according to any one of claims 8 to 11, wherein a protective film is attached to the surface of the surface layer.
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