WO2020111009A1 - Fluorine-containing compound, composition containing fluorine-containing compound, coating solution, article, and production method thereof - Google Patents

Fluorine-containing compound, composition containing fluorine-containing compound, coating solution, article, and production method thereof Download PDF

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Publication number
WO2020111009A1
WO2020111009A1 PCT/JP2019/046024 JP2019046024W WO2020111009A1 WO 2020111009 A1 WO2020111009 A1 WO 2020111009A1 JP 2019046024 W JP2019046024 W JP 2019046024W WO 2020111009 A1 WO2020111009 A1 WO 2020111009A1
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group
fluorine
compound
carbon atoms
atom
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PCT/JP2019/046024
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French (fr)
Japanese (ja)
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啓吾 松浦
誠人 宇野
英一郎 安樂
豊和 遠田
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Agc株式会社
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Publication of WO2020111009A1 publication Critical patent/WO2020111009A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/18Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D201/00Coating compositions based on unspecified macromolecular compounds
    • C09D201/02Coating compositions based on unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
    • C09D201/04Coating compositions based on unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups containing halogen atoms
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D201/00Coating compositions based on unspecified macromolecular compounds
    • C09D201/02Coating compositions based on unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
    • C09D201/10Coating compositions based on unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups containing hydrolysable silane groups
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/18Materials not provided for elsewhere for application to surfaces to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces

Definitions

  • the present invention relates to a fluorine-containing compound, a composition containing a fluorine-containing compound, a coating liquid, an article and a method for producing the same.
  • a fluorine-containing compound having a fluorine-containing organic group such as a fluoroalkyl group or a fluoropolyether chain and a hydrolyzable silyl group can form a surface layer having high lubricity, water repellency and oil repellency on the surface of a substrate. Therefore, it is suitably used as a surface treatment agent.
  • the surface-treating agent containing a fluorine-containing compound has a property that the water and oil repellency does not easily deteriorate even if the surface layer is repeatedly rubbed with a finger (rubbing resistance), and a property that fingerprints attached to the surface layer can be easily removed by wiping ( It is used in applications where it is required to maintain fingerprint stain removability) for a long period of time, for example, as a member constituting a surface of a touch panel to be touched by a finger, an eyeglass lens, and a surface treatment agent for a display of a wearable terminal.
  • a fluorine-containing compound having a fluoropolyether chain and a hydrolyzable silyl group has been proposed as a fluorine-containing compound capable of forming a surface layer having excellent abrasion resistance and fingerprint stain removability on the surface of a substrate (Patent Document 1-4).
  • the present invention provides a fluorine-containing compound capable of forming a surface layer having excellent fingerprint stain removability and abrasion resistance, a composition containing a fluorine-containing compound and a coating liquid, an article having a surface layer excellent in fingerprint stain removability and abrasion resistance, and
  • the purpose is to provide a manufacturing method.
  • the present invention provides a fluorine-containing compound, a fluorine-containing compound-containing composition, a coating liquid, an article, and a method for producing an article, each of which has the constitutions [1] to [14] below.
  • the linking group has a site in which two or more polar groups are bonded in series via a divalent organic group having 1 to 20 carbon atoms,
  • the polar group is C(O)NH, NHC(O), NH, NHC(O)NH, NHC(S)NH, S(O) 2 NH, NHS(O) 2 , C(O), C( OH), C(OR 4 ), P(O), S(O), C[
  • a fluorine-containing compound which is a compound represented by the following formula (1A) or a compound represented by the following formula (1B).
  • [T ⁇ ] b2 [R f ⁇ ] a2 Q 2 ⁇ Q f ⁇ Q 2 [ ⁇ R f ] a2 [ ⁇ T] b2
  • R f is a fluoroalkyl group (provided that at least one fluorine atom is bonded to the terminal carbon atom on the Q 1 and Q 2 side) or a carbon-carbon atom of a fluoroalkyl group having 2 or more carbon atoms.
  • Q f represents a fluoroalkylene group (provided that at least one fluorine atom is bonded to the terminal carbon atom on the Q 2 side), or —O between carbon-carbon atoms of a fluoroalkylene group having 2 or more carbon atoms.
  • Q 1 is an a1+b1 valent linking group having a site in which two or more polar groups are bonded in series via a divalent organic group having 1 to 20 carbon atoms
  • Q 2 is an a2+b2+1 valent linking group having a site in which two or more polar groups are bonded in series via a divalent organic group having 1 to 20 carbon atoms
  • the two Q 2 are the same.
  • the polar group is C(O)NH, NHC(O), NH, NHC(O)NH, NHC(S)NH, S(O) 2 NH, NHS(O) 2 , C(O), C( OH), C(OR 4 ), P(O), S(O), C[OP(O)(OR 4 ) 2 ], C[OS(O) 2 R 4 ] and C[OC(O)R.
  • R 4 is an alkyl group
  • R is an alkyl group
  • L is a hydrolyzable group or a hydroxyl group
  • two or more Ls may be the same or different
  • a1 is an integer of 1 or more
  • a2 is an integer of 0 or more
  • R f of 2 or more may be the same or different
  • b1 and b2 are each an integer of 1 or more
  • Ts of 2 or more may be the same or different
  • c is 2 or 3.
  • R f1 is a fluoroalkyl group having 1 to 6 carbon atoms (however, when m is 0, at least one fluorine atom is bonded to the terminal carbon atom on the Q 1 or Q 2 side), R f2 is a fluoroalkylene group having 1 to 6 carbon atoms (provided that at least one fluorine atom is attached to the Q 1 or Q 2 side terminal carbon atom of R f2 which bind to Q 1 or Q 2. ), and m is an integer of 0 or more, and when m is 2 or more, (OR f2 ) m may be composed of two or more kinds of OR f2 .
  • a group having -O- between the carbon-carbon atoms of the above alkylene group and having -O- at the terminal on the side not connected to Si, and two or more Q 22 s may be the same or different.
  • Q 23 is an alkylene group or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms, and two Q 23 may be the same or different
  • Q 24 is Q 22 when the atom in Z to which Q 24 is bonded is a carbon atom
  • two or more Q 24 are the same.
  • Q 25 is an alkylene group or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms, and 2 or more Q 25 may be the same or different
  • Q 26 is an alkylene group or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms
  • Q 27 is an alkylene group or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms
  • Z is a group having an a1+b1 valent or a2+b2+1 valent ring structure having a carbon atom or a nitrogen atom to which Q 14 directly bonds and a carbon atom or a nitrogen atom to which Q 24 directly bonds
  • R 1 is a hydrogen atom or an alkyl group, if Q 1 or Q 2 has the R 1 2 or more, 2 or more of R 1 may be the same or different and R
  • [6] The fluorinated compound according to any one of [2] to [5], wherein the fluorinated compound is a compound represented by the above formula (1A).
  • a fluorine-containing compound-containing composition comprising at least one fluorine-containing compound according to any one of the above [1] to [6] and another fluorine-containing compound.
  • a coating liquid comprising the fluorine-containing compound according to any one of [1] to [6] or the fluorine-containing compound-containing composition according to [7] and a liquid medium.
  • the article according to [9] which has the surface layer on the surface of a member that constitutes the surface of the touch panel that is touched by the finger.
  • the fluorine-containing compound or the fluorine-containing compound of any one of [1] to [6] is treated by a dry coating method using the fluorine-containing compound-containing composition of [7].
  • a method for producing an article comprising forming a surface layer formed from the composition containing a fluorine-containing compound on the surface of the substrate.
  • the coating liquid of [8] is applied to the surface of the substrate by the wet coating method and dried to form a surface layer formed from the fluorine-containing compound or the fluorine-containing compound-containing composition on the surface of the substrate.
  • a method for manufacturing an article comprising:
  • a fluorine-containing compound which is a compound represented by the following formula (2A) or a compound represented by the following formula (2B).
  • [R f ⁇ ] a1 Q 10 [—CH ⁇ CH 2 ] b1 ...
  • [CH 2 CH-] b2
  • [-CH CH 2 ] b2
  • R f is a fluoroalkyl group (provided that at least one fluorine atom is bonded to the terminal carbon atom on the Q 10 and Q 20 side) or a carbon-carbon atom of a fluoroalkyl group having 2 or more carbon atoms.
  • Q f represents a fluoroalkylene group (provided that at least one fluorine atom is bonded to the terminal carbon atom on the Q 20 side), or —O between carbon-carbon atoms of a fluoroalkylene group having 2 or more carbon atoms.
  • Q 10 is an a1+b1 valent linking group having a site in which two or more polar groups are bonded in series via a divalent organic group having 1 to 20 carbon atoms
  • Q 20 is an a2+b2+1 valent linking group having a site in which two or more polar groups are connected in series via a divalent organic group having 1 to 20 carbon atoms
  • the two Q 20 are the same.
  • the polar group is C(O)NH, NHC(O), NH, NHC(O)NH, NHC(S)NH, S(O) 2 NH, NHS(O) 2 , C(O), C( OH), C(OR 4 ), P(O), S(O), C[OP(O)(OR 4 ) 2 ], C[OS(O) 2 R 4 ] and C[OC(O)R. 4 ] (wherein R 4 is an alkyl group) is a polar group selected from the group consisting of: a1 is an integer of 1 or more, a2 is an integer of 0 or more, and R f of 2 or more may be the same or different, b1 and b2 are each an integer of 1 or more. [14] The fluorine-containing compound according to [13], wherein the polar group is C(O)NH, NHC(O), S(O) 2 NH or NHS(O) 2 .
  • the fluorine-containing compound of the present invention it is possible to form a surface layer having excellent fingerprint stain removability and abrasion resistance.
  • a surface layer having excellent fingerprint stain removability and abrasion resistance can be formed.
  • a coating liquid of the present invention a surface layer having excellent fingerprint stain removability and abrasion resistance can be formed.
  • the article of the present invention has a surface layer having excellent fingerprint stain removability and abrasion resistance. According to the method for producing an article of the present invention, an article having a surface layer having excellent fingerprint stain removability and abrasion resistance can be produced.
  • the compound represented by the formula (1A) is referred to as the compound (1A).
  • the group represented by the formula (g1a) is referred to as a group (g1a).
  • the groups represented by other formulas will be described in the same manner.
  • the chemical formula of the oxyfluoroalkylene unit shall be represented by describing its oxygen atom on the left side of the fluoroalkylene group.
  • Reactive silyl group is a general term for hydrolyzable silyl groups and silanol groups (Si—OH).
  • the reactive silyl group is, for example, T(-Si(R) 3-c (L) c ) in formula (1A) or formula (1B).
  • the “hydrolyzable silyl group” means a group capable of undergoing a hydrolysis reaction to form a silanol group.
  • Surface layer means a layer formed on the surface of a substrate.
  • the terminal group include R f1 in formula (g1a) and T in formula (1A) and formula (1B).
  • the fluorine-containing compound is a fluorine-containing compound having a single chain length of a fluorine-containing organic group (R f or Q f )
  • the “molecular weight” of the fluorine-containing organic group is 1 H-NMR and 19 F-NMR. It is a molecular weight calculated by determining the structure of R f .
  • the fluorine-containing compound of the present invention connects a monovalent or divalent fluorine-containing organic group, a reactive silyl group, and a fluorine-containing organic group with a reactive silyl group. It has a specific linking group. That is, the compound may be a compound having a structure of "monovalent fluorine-containing organic group-linking group-reactive silyl group", and "reactive silyl group-linking group-divalent fluorine-containing organic group” It may be a compound having a structure of "linking group-reactive silyl group”.
  • This compound has a fluorine-containing organic group.
  • the present compound having a fluorine-containing organic group is excellent in removing fingerprint stains on the surface layer.
  • the compound has a reactive silyl group at least at one end. Since the present compound having a reactive silyl group at the terminal chemically bonds strongly to the base material, the surface layer has excellent abrasion resistance. Further, as the present compound, a compound having a reactive silyl group only at one end is preferable. A compound having a reactive silyl group only at one end is less likely to aggregate, so that the appearance of the surface layer is excellent. Also, the surface layer has excellent abrasion resistance and fingerprint stain removability.
  • Examples of the monovalent fluorine-containing organic group include a fluoroalkyl group and a monovalent fluoropolyether chain.
  • Examples of the divalent fluorine-containing organic group include a fluoroalkylene group and a divalent fluoropolyether chain.
  • the fluoropolyether chain is a group having a plurality of —O— between carbon-carbon atoms of the fluoroalkyl group. Fluoropolyether chains usually have oxyfluoroalkylene units.
  • a fluoropolyether chain is preferable because the surface layer is more excellent in removing fingerprint stains.
  • As the fluorine-containing organic group a perfluoropolyether chain is more preferable because the abrasion resistance of the surface layer and the fingerprint stain removability are further excellent.
  • the molecular weight of the fluorine-containing organic group is preferably 50 to 1000, more preferably 100 to 900, and particularly preferably 200 to 800, from the viewpoint of achieving both fingerprint stain removability and slip resistance of the surface layer.
  • the molecular weight of the fluorine-containing organic group is at least the lower limit value of the above range, the fingerprint stain removability of the surface layer will be further excellent.
  • the molecular weight of the fluorinated organic group is at most the upper limit value of the above range, the slip resistance of the surface layer will be further excellent.
  • the molecular weight of the fluorine-containing organic group is preferably 1500 to 10000, more preferably 2000 to 8000, and particularly preferably 2500 to 6000, from the viewpoint that the abrasion resistance of the surface layer and the fingerprint stain removability are further excellent.
  • the molecular weight of the fluorine-containing organic group is at least the lower limit value of the above range, the abrasion resistance and fingerprint stain removability of the surface layer are further excellent.
  • the molecular weight of the fluorine-containing organic group is at most the upper limit value of the above range, the abrasion resistance of the surface layer will be further excellent.
  • the reactive silyl group is a group in which one or both of a hydrolyzable group and a hydroxyl group are bonded to a silicon atom.
  • the hydrolyzable group is a group that becomes a hydroxyl group by a hydrolysis reaction. That is, the hydrolyzable silyl group becomes a silanol group (Si—OH) by the hydrolysis reaction.
  • the silanol group further undergoes a dehydration condensation reaction between molecules to form a Si—O—Si bond. Further, the silanol group undergoes a dehydration condensation reaction with a hydroxyl group (base material-OH) on the surface of the base material to form a chemical bond (base material-O-Si).
  • Examples of the hydrolyzable group include an alkoxy group, an aryloxy group, a halogen atom, an acyl group, an acyloxy group and an isocyanate group.
  • an alkoxy group an alkoxy group having 1 to 6 carbon atoms is preferable.
  • the aryloxy group is preferably an aryloxy group having 3 to 10 carbon atoms.
  • the aryl group of the aryloxy group includes a heteroaryl group.
  • the halogen atom is preferably a chlorine atom.
  • As the acyl group an acyl group having 1 to 6 carbon atoms is preferable.
  • the acyloxy group is preferably an acyloxy group having 1 to 6 carbon atoms.
  • an alkoxy group and a halogen atom are preferable from the viewpoint of easy production of the present compound.
  • an alkoxy group having 1 to 4 carbon atoms is preferable from the viewpoint of less outgas at the time of application and excellent storage stability of the present compound, and when long-term storage stability of the present compound is required
  • An ethoxy group is particularly preferable, and a methoxy group is particularly preferable when the reaction time after coating is short.
  • the linking group is a group having a site in which two or more polar groups are bonded in series via a divalent organic group having 1 to 20 carbon atoms (hereinafter, also referred to as “polar site E”).
  • polar group and polar group are bonded in series means that the polar group and the polar group do not have a specific branched chain.
  • the specific branched chain means a chain having a fluorine-containing organic group or a reactive silyl group in the chain.
  • the linking group has a branch point P or P′ described later, it means that a polar moiety E is provided between the fluorine-containing organic group and the branch point P.
  • the polar group itself may be the branch point P or P′.
  • Polar groups include C(O)NH, NHC(O), NH, NHC(O)NH, NHC(S)NH, S(O) 2 NH, NHS(O) 2 , C(O), C(OH ), C(OR 4 ), P(O), S(O), C[OP(O)(OR 4 ) 2 ], C[OS(O) 2 R 4 ], and C[OC(O)R 4 ]
  • R 4 is an alkyl group.
  • the alkyl group preferably has 1 to 3 carbon atoms, and 1 is particularly preferable.
  • the linking group may have two or more types of the polar groups.
  • the polar group is classified into a group I having —NH— and a group II other than this.
  • a group II other than this.
  • C(O)NH, NHC(O), S(O), S(O)NH, NHC(O), S(O) ) 2 NH and NHS(O) 2 are preferred, and C(O)NH and NHC(O) are particularly preferred.
  • NHC(O)NH and NHC(S)NH are preferable, and NHC(O)NH is particularly preferable, from the viewpoint that the slip resistance of the surface layer is further excellent.
  • Examples of the divalent organic group to be combined with the polar group I include divalent aliphatic hydrocarbon groups (alkylene group, cycloalkylene group, etc.), divalent aromatic hydrocarbon groups (phenylene group, etc.), A combination thereof and the like can be mentioned, and a divalent aliphatic hydrocarbon group is preferable, and an alkylene group is particularly preferable.
  • the alkylene group may be linear or branched, and is preferably linear.
  • the divalent aliphatic hydrocarbon group may have a substituent (thiol group, thioether group, phenyl group, pyrrolidine group, indolyl group, halogen atom, etc.).
  • the divalent aromatic hydrocarbon group may have a substituent (alkyl group, hydroxyl group, halogen atom, etc.).
  • the carbon number of the divalent organic group is preferably 1 to 10, more preferably 1 to 5, and particularly preferably 1 or 2.
  • a group obtained by removing an amino group and a carboxy group from an amino acid is preferable from the viewpoint of easy production of the present compound.
  • the amino acid glycine and ⁇ -alanine are preferable from the viewpoint of easy production of the present compound and the further excellent abrasion resistance and slip resistance of the surface layer.
  • the number of polar groups in the polar moiety E having a polar group of Group I is preferably as large as possible from the viewpoint that the abrasion resistance of the surface layer is further excellent, and is 2 to 5 from the viewpoint of easy production of the present compound. Preferred is 2 or 3, and particularly preferred.
  • Examples of the polar moiety E having a polar group of group I include the following.
  • Q 4 is a divalent organic group.
  • the carbon number of Q 4 is preferably 1 to 10, more preferably 1 to 5, and particularly preferably 1 or 2.
  • the carbon number of Q 4 is 1, the polar site E is derived from glycine, for example.
  • the carbon number of Q 4 is 2, the polar site E is derived from ⁇ -alanine, for example.
  • C[OP(O)(OR 4 ) 2 ] and C[OS(O) 2 R 4 ] are preferable, since the surface layer is more excellent in abrasion resistance and slip resistance.
  • C[OP(O)(OR 4 ) 2 ] is particularly preferred.
  • the divalent organic group to be combined with the polar group of Group II include a divalent aliphatic hydrocarbon group (alkylene group, cycloalkylene group, etc.), a divalent aromatic hydrocarbon group (phenylene group, etc.), A combination thereof and the like can be mentioned, and a divalent aliphatic hydrocarbon group is preferable, and an alkylene group is particularly preferable.
  • the alkylene group may be linear or branched, and is preferably linear.
  • the carbon number of the divalent organic group is preferably 1 to 10, more preferably 1 to 5, and particularly preferably 1 or 2.
  • the number of polar groups in the polar moiety E having a polar group of Group II is particularly preferably 2 from the viewpoint of easy production of the present compound.
  • Examples of the polar moiety E having a polar group II are as follows.
  • Q 4 is a divalent organic group.
  • the compound (1A) and the compound (1B) are preferable because the abrasion resistance of the surface layer and the fingerprint stain removability are further excellent.
  • the compound (1A) and the compound (1B) are also collectively referred to as the compound (1).
  • R f is a fluoroalkyl group (provided that at least one fluorine atom is bonded to the terminal carbon atom on the Q 1 and Q 2 side) or a carbon-carbon of a fluoroalkyl group having 2 or more carbon atoms.
  • a group having —O— between atoms (provided that at least one fluorine atom is bonded to the terminal carbon atom on the Q 1 and Q 2 side).
  • Q f represents a fluoroalkylene group (provided that at least one fluorine atom is bonded to the terminal carbon atom on the Q 2 side), or —O between carbon-carbon atoms of a fluoroalkylene group having 2 or more carbon atoms.
  • Q 1 is an a1+b1 valent linking group having a site in which two or more polar groups are bonded in series via a divalent organic group having 1 to 20 carbon atoms.
  • Q 2 is an a2+b2+1 valent linking group having a site in which two or more polar groups are bonded in series via a divalent organic group having 1 to 20 carbon atoms, and the two Q 2 are the same. May also be different.
  • the polar group includes C(O)NH, NHC(O), NH, NHC(O)NH, NHC(S)NH, S(O) 2 NH, NHS(O) 2 , C(O), C( OH), C(OR 4 ), P(O), S(O), C[OP(O)(OR 4 ) 2 ], C[OS(O) 2 R 4 ] and C[OC(O)R.
  • R 4 is an alkyl group
  • R 4 is a polar group selected from the group consisting of: T is —Si(R) 3-c (L) c
  • R is an alkyl group
  • L is a hydrolyzable group or a hydroxyl group
  • c is 2 or 3
  • a1 is an integer of 1 or more
  • a2 is an integer of 0 or more
  • R f of 2 or more may be the same or different.
  • b1 and b2 are each an integer of 1 or more, and Ts of 2 or more may be the same or different.
  • the compound (1A) has R f at the terminal.
  • the compound (1A) having R f at the terminal is excellent in removing fingerprint stains on the surface layer.
  • the compound (1B) has Q f .
  • the compound (1B) having Q f is excellent in removing fingerprint stains on the surface layer.
  • the compound (1) has a reactive silyl group at the terminal.
  • the compound (1) having a reactive silyl group at the terminal has a strong chemical bond with the base material, and thus has excellent abrasion resistance of the surface layer.
  • the compound (1A) which is a compound having a reactive silyl group only at one terminal, is excellent in the appearance of the surface layer because it is less likely to aggregate, as compared with the compound (1B). It is more preferable because it is excellent in abrasion resistance and fingerprint stain removability.
  • a1 is preferably 1 to 6, more preferably 1 to 4, and particularly preferably 1 or 2 from the viewpoint of easy production of the compound (1A) and further excellent abrasion resistance and fingerprint stain removability of the surface layer. .
  • R f of 2 or more are the same.
  • a2 is preferably 0 to 6, more preferably 0 to 4, and particularly preferably 0 to 2 from the viewpoint of easy production of the compound (1B) and the further excellent abrasion resistance and fingerprint stain removability of the surface layer.
  • a2 is 1 or more, it is preferable that two or more R f contained in the compound (1B) are the same.
  • b1 is preferably 1 to 6, more preferably 1 to 5, and still more preferably 1 to 4 from the viewpoint of easy production of the compound (1A) and further excellent abrasion resistance and fingerprint stain removability of the surface layer. 2 to 4 are particularly preferable. Further, when b1 is 2 or more, it is preferable that Ts of 2 or more are the same. b2 is preferably 1 to 6, more preferably 1 to 5, and further preferably 1 to 4 from the viewpoint that the compound (1B) can be easily produced and that the surface layer is more excellent in abrasion resistance and fingerprint stain removability. 2 to 4 are particularly preferable. Further, two or more T's contained in the compound (1B) are preferably the same. Further, in the compound (1B), it is preferable that two [T-] b2 [R f -] a2 Q 2- bonded to Q f are the same group from the viewpoint of easy production thereof.
  • R f is a monovalent fluorine-containing organic group.
  • a fluoropolyether chain is preferable because the fingerprint stain removability of the surface layer is further excellent.
  • R f a perfluoropolyether chain is more preferable because the abrasion resistance of the surface layer and the fingerprint stain removability are further excellent.
  • Q f is a divalent fluorine-containing organic group.
  • a fluoropolyether chain is preferable because the surface layer is more excellent in removing fingerprint stains.
  • a perfluoropolyether chain is more preferable because the abrasion resistance of the surface layer and the fingerprint stain removability are further excellent.
  • the preferable range of the molecular weight of R f and Q f is the same as the preferable range of the molecular weight of the above-mentioned fluorine-containing organic group.
  • R f examples include a group (g1a).
  • R f1 is a fluoroalkyl group having 1 to 6 carbon atoms (however, when m is 0, at least one fluorine atom is bonded to the terminal carbon atom on the Q 1 or Q 2 side).
  • R f2 is a fluoroalkylene group having 1 to 6 carbon atoms (provided that at least one fluorine atom is attached to the Q 1 or Q 2 side terminal carbon atom of R f2 which bind to Q 1 or Q 2 .), m is an integer of 0 or more, and when m is 2 or more, (OR f2 ) m may be composed of two or more kinds of OR f2 .
  • Q f examples include a group having a group (g1b). -R f2 (OR f2 ) m' -... (g1b)
  • R f2 is a fluoroalkylene group having 1 to 6 carbon atoms (provided that at least one fluorine atom is bonded to the terminal carbon atom on the Q 1 or Q 2 side), and m′ is 1 It is the above integer, and when m′ is 2 or more, (OR f2 ) m′ may be composed of two or more kinds of OR f2 .
  • R f1 When R f1 has 1 to 6 carbon atoms, the surface layer is more excellent in abrasion resistance and fingerprint stain removability.
  • the carbon number of the fluoroalkyl group of R f1 is preferably 1 to 4 and particularly preferably 1 to 3 from the viewpoint that the abrasion resistance and fingerprint stain removability of the surface layer are further excellent.
  • R f1 is preferably a perfluoroalkyl group from the viewpoint that the surface layer is more excellent in abrasion resistance and fingerprint stain removability.
  • the terminal In the compound (1A) in which R f1 is a perfluoroalkyl group, the terminal is CF 3 ⁇ .
  • R f1 includes CF 3 ⁇ , CF 3 CF 2 ⁇ , CF 3 CF 2 CF 2 ⁇ , CF 3 CF 2 CF 2 ⁇ , CF 3 CF 2 CF 2 CF 2 ⁇ , CF 3 CF 2 CF 2 CF 2 ⁇ , CF 3 CF 2 CF 2 CF 2 —, CF 3 CF(CF 3 )— and the like.
  • R f2 When the carbon number of R f2 is 1 to 6, the abrasion resistance and fingerprint stain removability of the surface layer are further excellent.
  • R f2 a linear fluoroalkylene group is preferable because the abrasion resistance of the surface layer and the fingerprint stain removability are further excellent.
  • R f2 a perfluoroalkylene group is preferable because the abrasion resistance of the surface layer and the fingerprint stain removability are further excellent.
  • the proportion of perfluoroalkylene groups in the total R f2 is preferably 60 mol% or more, more preferably 80 mol% or more, and particularly preferably 100 mol% from the viewpoint that the abrasion resistance of the surface layer and the fingerprint stain removability are further excellent. preferable.
  • m is preferably an integer of 0 to 30, more preferably an integer of 0 to 20, and particularly preferably an integer of 0 to 10.
  • m′ is preferably an integer of 1 to 30, more preferably an integer of 1 to 20, and particularly preferably an integer of 1 to 10.
  • m' is not more than the upper limit of the above range, the slip resistance of the surface layer is further excellent.
  • m and m′ are preferably an integer of 2 to 200, more preferably an integer of 5 to 150, particularly preferably an integer of 10 to 100.
  • m and m′ are not less than the lower limit of the above range, the surface layer is more excellent in abrasion resistance and fingerprint stain removability.
  • m and m′ are not more than the upper limit of the above range, the abrasion resistance of the surface layer is further excellent. That is, when the number average molecular weight of the compound (1) is too large, the number of hydrolyzable silyl groups present per unit molecular weight decreases, and the abrasion resistance of the surface layer decreases.
  • OR f2 that is, as the oxyfluoroalkylene unit, OCHF, OCF 2 CHF, OCHFCF 2 , OCF 2 CH 2 , OCH 2 CF 2 , OCF 2 CF 2 CHF, OCHFCF 2 CF 2 , OCF 2 CF 2 CH 2 , OCH 2 CF 2 CF 2, OCF 2 CF 2 CF 2 CH 2, OCH 2 CF 2 CF 2 CF 2, OCF 2 CF 2 CF 2 CH 2, OCH 2 CF 2 CF 2 CF 2 CF 2, OCF 2 CF 2 CF 2 CF 2 CF 2 CH 2, OCH 2 CF 2 CF 2 CF 2 CF 2 CF 2, OCF 2, OCF 2 CF 2, OCF 2 CF 2 CF 2 CF 2, OCF (CF 3) CF 2, OCF 2 CF 2 CF 2 CF 2 CF 2, OCF (CF 3) CF 2 CF 2, OCF 2 CF 2 CF 2 CF 2 CF 2, OCF 2 CF 2 CF 2
  • each OR f2 is not limited.
  • OCF 2 and OCF 2 CF 2 may be arranged in a random, alternating, block.
  • the two or more OR f2 is present, that there are two or more OR f2 having different number of carbon atoms, that the number of hydrogen atoms are present two or more different OR f2, two position of the hydrogen atoms are different the presence of oR f2 above, and, whether or side chain type of side chains may be the same carbon number (number of carbon atoms in the number of side chains or side chains, etc.) is two or more different oR f2 It exists.
  • the structure represented by ⁇ (OCF 2 ) m1 (OCF 2 CF 2 ) m2 ⁇ includes m1 (OCF 2 ) and m2 (OCF 2 CF 2 ).
  • m1, m2, m3, m4, m5, m6, m7, m8 and m9 are integers of 1 or more.
  • the upper limits of m1, m2, m3, m4, m5, m6, m7, m8 and m9 are adjusted according to the upper limit of m.
  • Q 1 is an a1+b1 valent linear or branched linking group.
  • Q 2 is an a2+b2+1 valent linear or branched linking group.
  • Q 1 and Q 2 have the polar moiety E described above.
  • Q 1 is at least one branch point (hereinafter referred to as “branch point P”) selected from the group consisting of C, N, Si, a ring structure and an a1+b1 valent organopolysiloxane residue when a1+b1 is 3 or more. .) is further included.
  • branch point P branch point selected from the group consisting of C, N, Si, a ring structure and an a1+b1 valent organopolysiloxane residue when a1+b1 is 3 or more. .
  • Q 2 is at least one branch point (hereinafter referred to as “branch point P′”) selected from the group consisting of C, N, Si, a ring structure and an a2+b2+1 valent organopolysiloxane residue when a2+b2+1 is 3 or more. It is preferable to have the following).
  • branch point P′ selected from the group consisting of C, N, Si, a ring structure and an a2+b2+1 valent organopolysiloxane residue when a2+b2+1 is 3 or more. It is preferable to have the following).
  • a specific branched chain is bonded to the branch point P'.
  • the ring structure is a 3- to 8-membered aliphatic ring, a 3- to 8-membered ring, from the viewpoint of easy production of the compound (1) and further excellent abrasion resistance, light resistance and chemical resistance of the surface layer.
  • Examples of the a1+b1 valent organopolysiloxane residue or the a2+b2+1 valent organopolysiloxane residue include the following groups.
  • R 5 in the following formula is a hydrogen atom, an alkyl group, an alkoxy group, or a phenyl group.
  • the alkyl group and the alkoxy group of R 5 preferably have 1 to 10 carbon atoms, and particularly preferably 1 carbon atom.
  • R 6 is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group.
  • bond B —O— is preferable from the viewpoint of easy production of the compound (1).
  • Examples of the divalent organopolysiloxane residue include groups represented by the following formulae.
  • R 7 in the following formula is a hydrogen atom, an alkyl group, an alkoxy group, or a phenyl group.
  • the alkyl group and the alkoxy group of R 7 preferably have 1 to 10 carbon atoms, and particularly preferably 1 carbon atom.
  • Q 1 is a combination of two or more divalent hydrocarbon groups, one or more polar moieties E and one or more branch points P, and two or more hydrocarbon groups and one or more polarities. Examples include combinations of the site E, one or more branch points P, and one or more bonds B.
  • Q 1 is a combination of two or more divalent hydrocarbon groups and one or more polar moieties E, and two or more hydrocarbon groups and 1 Combinations of one or more polar moieties E and one or more bonds B are included.
  • Q 2 a combination of two or more divalent hydrocarbon groups, one or more polar moieties E and one or more branch points P′, and two or more hydrocarbon groups and one or more A combination of a polar moiety E, one or more branch points P′ and one or more bonds B can be mentioned.
  • Q 2 is a combination of two or more divalent hydrocarbon groups and one or more polar moieties E, and two or more hydrocarbon groups. Combinations of one or more polar moieties E and one or more bonds B are included.
  • divalent hydrocarbon group examples include a divalent aliphatic hydrocarbon group (alkylene group, cycloalkylene group, etc.) and a divalent aromatic hydrocarbon group (phenylene group, etc.).
  • the carbon number of the divalent hydrocarbon group is preferably 1-10, more preferably 1-6, and particularly preferably 1-4.
  • the A side is connected to R f or Q f , and the Q 22 , Q 23 , Q 24 , Q 25 , Q 26, and Q 27 sides are connected to T.
  • A is a single bond or an alkylene group.
  • E is a site in which two or more polar groups are bonded in series via a divalent organic group having 1 to 20 carbon atoms, and in the formula (g2-7), the polar group at the terminal on the Q 27 side is C(OH), C(OR 4 ), P(O), S(O), C[OP(O)(OR 3 ) 2 ], C[OS(O) 2 R 3 ], or C[OC(O ) R 3 ].
  • Q 11 is a single bond, —O—, an alkylene group, or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms.
  • Q 12 is a single bond or an alkylene group, if Q 1 or Q 2 has a Q 12 2 or more, two or more Q 12 may be different even in the same.
  • Q 13 is an alkylene group.
  • Q 14 is Q 12 when the atom in Z to which Q 14 is bonded is a carbon atom, Q 13 when the atom in Z to which Q 14 is bonded is a nitrogen atom, and Q 1 or Q 2 is Q 14 When 2 or more are included, two or more Q 14's may be the same or different.
  • Q 15 is an alkylene group, if Q 1 or Q 2 has a Q 15 2 or more, two or more Q 15 may be different even in the same.
  • Q 22 is an alkylene group, a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms, a group having —O— at an end of the alkylene group which is not connected to Si, or a group having 2 carbon atoms.
  • a group having -O- between the carbon-carbon atoms of the above alkylene group and having -O- at the terminal on the side not connected to Si, and two or more Q 22 s may be the same or different. Good.
  • Q 23 is an alkylene group or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms, and two Q 23 may be the same or different.
  • Q 24 is Q 22 when the atom in Z to which Q 24 is bonded is a carbon atom, and is Q 23 when the atom in Z to which Q 24 is bonded is a nitrogen atom, and two or more Q 24 are the same. It may or may not be.
  • Q 25 is an alkylene group or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms, and 2 or more Q 25 may be the same or different.
  • Q 26 is an alkylene group or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms.
  • Q 27 is an alkylene group or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms, and two Q 27 may be the same or different.
  • Z is a group having a ring structure of a1+b1 valence or a2+b2+1 having a carbon atom or a nitrogen atom to which Q 14 is directly bonded and a carbon atom or a nitrogen atom to which Q 24 is directly bonded.
  • R 1 is a hydrogen atom or an alkyl group, if Q 1 or Q 2 has the R 1 2 or more, 2 or more of R 1 may be different even in the same.
  • R 2 is a hydrogen atom or an alkyl group, and R 3 is an alkyl group.
  • d1 is an integer of 0 to 3, preferably 1 or 2
  • d2 is an integer of 0 to 3, preferably 1 or 2
  • d1+d2 is an integer of 1 to 3.
  • d3 is an integer of 0 to 3, preferably 1 or 2
  • d4 is an integer of 0 to 3, preferably 1 or 2
  • d3+d4 is an integer of 1 to 3.
  • d1+d3 is an integer of 1 to 5, preferably 2 or 3, and d2+d4 is an integer of 1 to 5, preferably an integer of 2 to 4.
  • e1 is an integer of 1 to 3, preferably 1 or 2
  • e2 is an integer of 1 to 3, preferably 2 or 3, and e1+e2 is 3 or 4.
  • h1 is an integer of 1 or more, preferably 1 or 2, and h2 is an integer of 1 or more, preferably 2 or 3.
  • i1 is an integer of 1 to 3, preferably 1 or 2
  • i2 is an integer of 1 to 3, preferably 2 or 3, and i1+i2 is 3 or 4.
  • the number of carbon atoms of the alkylene group of A is preferably 1 to 5, more preferably 1 to 2, and particularly preferably 1 from the viewpoint of easy production of the compound (1).
  • Examples of E include the polar site E described above, and the preferred forms are also the same.
  • the number of carbon atoms of the alkylene group of Q 11 , Q 12 , Q 13 , Q 14 , Q 15 , Q 22 , Q 23 , Q 24 , Q 25 , Q 26 and Q 27 is such that the compound (1) can be easily produced. Further, from the viewpoint that the abrasion resistance, light resistance and chemical resistance of the surface layer are further excellent, 1 to 10 is preferable, 1 to 6 is more preferable, and 1 to 4 is particularly preferable. However, the lower limit of the number of carbon atoms of the alkylene group when it has a specific bond between carbon and carbon atoms is 2.
  • Examples of the ring structure in Z include the ring structures described above, and the preferred forms are also the same. Since Q 14 and Q 24 are directly bonded to the ring structure in Z, for example, an alkylene group is not connected to the ring structure and Q 14 or Q 24 is not connected to the alkylene group.
  • the number of carbon atoms of the alkyl group of R 1 , R 2 and R 3 is preferably 1 to 6, more preferably 1 to 3, and particularly preferably 1 to 2 from the viewpoint of easy production of the compound (1).
  • h1 is preferably 1 to 6, more preferably 1 to 4, and further preferably 1 or 2 from the viewpoint that the compound (1) can be easily produced and that the abrasion resistance of the surface layer and the fingerprint stain removability are further excellent. 1 is particularly preferred.
  • h2 is preferably 2 to 6, more preferably 2 to 4, and particularly preferably 2 or 3 from the viewpoint of easy production of the compound (1) and the further excellent abrasion resistance and fingerprint stain removability of the surface layer. .
  • the Si side is connected to Q 22 , Q 23 , Q 24 , Q 25 , Q 26 and Q 27 , the Q 3 side is connected to T
  • R 8 is an alkyl group
  • Q is 3 is an alkylene group, a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms, or —(OSi(R 9 ) 2 ) p —O—, and Q 3 of 2 or more is They may be the same or different
  • k is 2 or 3
  • R 9 is an alkyl group, a phenyl group or an alkoxy group, and two R 9 are the same or different.
  • p is an integer of 0 to 5, and when p is 2 or more, (OSi(R 9 ) 2 ) of 2 or more may be the same or different.
  • the number of carbon atoms of the alkylene group of Q 3 is preferably 1 to 10 and more preferably 1 to 6 from the viewpoint of easy production of the compound (1) and the further excellent abrasion resistance, light resistance and chemical resistance of the surface layer. More preferably, 1 to 4 is particularly preferable. However, the lower limit of the number of carbon atoms of the alkylene group when it has a specific bond between carbon and carbon atoms is 2.
  • the number of carbon atoms of the alkyl group of R 8 is preferably 1 to 6, more preferably 1 to 3, and particularly preferably 1 to 2 from the viewpoint of easy production of the compound (1).
  • the number of carbon atoms of the alkyl group of R 9 is preferably 1 to 6, more preferably 1 to 3, and particularly preferably 1 to 2 from the viewpoint of easy production of the compound (1).
  • the number of carbon atoms of the alkoxy group of R 9 is preferably 1 to 6, more preferably 1 to 3, and particularly preferably 1 to 2 from the viewpoint of excellent storage stability of the compound (1).
  • p is preferably 0 or 1.
  • T is —Si(R) 3-c (L) c, which is a reactive silyl group.
  • the number of carbon atoms of the alkyl group of R is preferably 1 to 6, more preferably 1 to 3, and particularly preferably 1 to 2 from the viewpoint of easy production of the compound (1).
  • Examples of the hydrolyzable group for L include the same as the above-mentioned hydrolyzable groups, and the preferred forms are also the same.
  • c is particularly preferably 3 because the adhesion between the surface layer and the substrate becomes stronger.
  • Plural Ts in the compound (1) may be the same or different. From the viewpoint of easy production of the compound (1), the same group is preferable.
  • Examples of the compound (1) include compounds of the following formula.
  • the compound of the following formula is industrially easy to produce and easy to handle, and the surface layer has water and oil repellency, abrasion resistance, fingerprint stain removability, lubricity, chemical resistance, light resistance and chemical resistance. Of these, light resistance is particularly excellent, which is preferable.
  • the R f and Q f in the formula of the compound is the same as R f and Q f in the above-described formula (1A) and the formula (1B), a preferred form same.
  • Examples of the compound (1A) in which Q 1 is the group (g2-1) include compounds of the following formulas.
  • Examples of the compound (1A) in which Q 1 is the group (g2-2) include the compounds of the following formulas.
  • Examples of the compound (1A) in which Q 1 is the group (g2-3) include compounds of the following formulas.
  • Examples of the compound (1A) in which Q 1 is the group (g2-4) include the compounds of the following formulas.
  • Examples of the compound (1A) in which Q 1 is the group (g2-6) include the compounds of the following formulas.
  • Examples of the compound (1A) in which Q 1 is the group (g2-7) include compounds of the following formulae.
  • Examples of the compound (1A) in which Q 1 is the group (g2-9) include compounds of the following formulas.
  • Examples of the compound (1B) in which Q 2 is the group (g2-1) include compounds of the following formulas.
  • Examples of the compound (1B) in which Q 2 is the group (g2-2) include compounds of the following formulas.
  • Examples of the compound (1B) in which Q 2 is the group (g2-3) include the compounds of the following formulas.
  • Examples of the compound (1B) in which Q 2 is the group (g2-4) include the compounds of the following formulas.
  • Examples of the compound (1B) in which Q 2 is the group (g2-6) include the compounds of the following formulae.
  • Examples of the compound (1B) in which Q 2 is the group (g2-7) include compounds of the following formulas.
  • Examples of the compound (1B) in which Q 2 is the group (g2-9) include compounds of the following formulas.
  • Compound (1A) can be produced, for example, by a method in which compound (2A) and compound (3a) or compound (3b) are hydrosilylated.
  • Compound (1B) can be produced, for example, by a method in which compound (2B) and compound (3a) or compound (3b) are hydrosilylated. [R f ⁇ ] a1 Q 10 [—CH ⁇ CH 2 ] b1 ...
  • Q 20 is an a2+b2+1-valent linking group having a site in which two or more polar groups are bonded in series via a divalent organic group having 1 to 20 carbon atoms, and two Q 2 20 may be the same or different and symbols other than Q 20 are the same as the sign in the formula (1B).
  • Q 10 [—CH ⁇ CH 2 ] b1 becomes Q 1 in the compound (1A) after hydrosilylation.
  • Examples of Q 10 include the same groups as Q 1, and preferred forms are also the same.
  • Q 20 [—CH ⁇ CH 2 ] b2 becomes Q 2 in the compound (1B) after hydrosilylation.
  • Examples of Q 20 include the same groups as Q 2, and preferred forms are also the same.
  • Q 220 is an alkylene group, a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms, a group having —O— at the terminal of the alkylene group which is not connected to Si, or carbon.
  • a group having -O- between carbon-carbon atoms of an alkylene group of 2 or more and having -O- at the terminal not connected to Si, and 2 or more of Q 220 may be the same or different.
  • Q 230 is an alkylene group or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms, and two or more Q 230 may be the same or different.
  • Q 240 is Q 220 when the atom in Z to which Q 240 is bonded is a carbon atom, and Q 230 when the atom in Z to which Q 240 is bonded is a nitrogen atom, and two or more Q 240 are the same. It may or may not be.
  • Q 250 is an alkylene group or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms, and 2 or more Q 250 may be the same or different.
  • Q 260 is an alkylene group or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms.
  • Q 270 is an alkylene group or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms, and two Q 270 may be the same or different.
  • Codes other than Q 220 , Q 230 , Q 240 , Q 250 , Q 260, and Q 270 are the same as those in formulas (g2-1) to (g2-7).
  • Q 220 -CH CH 2 becomes Q 22 in the compound (1) after hydrosilylation.
  • Q 220 include the same groups as Q 22, and preferred forms are also the same.
  • Q 230 CH ⁇ CH 2 becomes Q 23 in the compound (1) after hydrosilylation.
  • Q 230 include the same groups as Q 23, and preferred forms are also the same.
  • Q 240 CH ⁇ CH 2 becomes Q 24 in the compound (1) after hydrosilylation.
  • Q 240 include the same groups as Q 24, and the preferred forms are also the same.
  • Q 250 include the same groups as Q 25, and preferred forms are also the same.
  • Q 260 CH ⁇ CH 2 becomes Q 26 in the compound (1) after hydrosilylation.
  • Q 260 examples include the same groups as Q 26, and preferred forms are also the same.
  • Q 270 -CH CH 2 is a Q 27 in after the hydrosilylation compound (1).
  • Examples of Q 270 include the same groups as Q 27, and preferred forms are also the same.
  • G 1 is a group (g5), and two or more G 1 s that Q 10 [—CH ⁇ CH 2 ] b1 or Q 20 [—CH ⁇ CH 2 ] b2 have are the same or different.
  • the symbols other than G 1 are the same as the symbols in the formulas (g2-1) to (g2-7).
  • Q 30 is an alkylene group or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms, and 2 or more Q 30 may be the same or different
  • Codes other than Q 30 are the same as the codes in the formula (g3).
  • Q 30 —CH ⁇ CH 2 becomes Q 3 in the group (g3) after hydrosilylation.
  • Examples of Q 30 include the same groups as Q 3 (provided that —(OSi(R 9 ) 2 ) p —O— is excluded.), and preferred forms are also the same.
  • Compound (2A) can be produced, for example, by the following procedure when polar site E is —C(O)NH—Q 4 —C(O)NH—.
  • amino-protecting group examples include a tert-butoxycarbonyl group (Boc), a benzyloxycarbonyl group, a 9-fluorenyloxycarboxy group, a 2,2,2-trichloroethoxycarbonyl group, an allyloxycarbonyl group, an acetyl group, Examples thereof include benzoyl group and benzyl group.
  • Compound (4A) is available as a commercially available compound.
  • compound (4A) can be produced, for example, by the method described in Patent Document 1 or the method described in International Publication No. 2019/039186.
  • the compound (5) is available, for example, as a commercially available N-protected amino acid (N-Boc-glycine, N-Boc- ⁇ -alanine, etc.).
  • R f -C(O)-X (8a) [R f -C(O)NH-Q 4 -C(O)NH-] a1 Q 100 [-CH CH 2 ] b1 ...(2Aa)
  • X is a halogen atom, an alkoxy group, or a hydroxyl group, and symbols other than X are the same as the symbols in Formula (2A).
  • the compound (8a) can be produced, for example, by the method described in WO 2009/008380, the method described in WO 2013/121984, the method described in WO 2013/121986, or WO 2015/087902. In WO2017/038830, in WO2017/038832, in WO2018/143433, in WO2018/216630. It can be produced by the described method.
  • the compound (2A) in which the polar moiety E is other than —C(O)NH—Q 4 —C(O)NH— can be produced, for example, by the method described in Examples.
  • the compound (2B) can be produced, for example, by the following procedure.
  • the compound (4B) and the compound (5) are subjected to an amidation reaction to obtain the compound (6B).
  • H 2 NQ 200 [-CH CH 2 ] b2 ...
  • Pro-NH-Q 4 -C(O)NH-Q 200 [-CH CH 2 ] b2 ...
  • Q 200 is a group obtained by removing the polar moiety E from Q 20 , Pro is a protecting group for an amino group, Q 4 is a divalent organic group, and symbols other than Pro and Q 4 are , which is the same as the sign in Expression (2B).
  • the compound (7B) and the compound (8b) are subjected to an amidation reaction to obtain the compound (2Ba).
  • X is a halogen atom, an alkoxy group, or a hydroxyl group, and the symbols other than X are the same as the symbols in Formula (2B) and Formula (6B).
  • Compound (8b) can be produced by the same method as for compound (8a).
  • a surface layer having excellent abrasion resistance and fingerprint stain removability can be formed for the following reasons. Since the compound (1) has the polar moiety E, it is easily crosslinked between molecules by intermolecular interaction (hydrogen bond or dipole interaction). Therefore, also in the surface layer, the compounds (1) bonded to the substrate are crosslinked. Therefore, the compound (1) is likely to remain in the surface layer even if the bonding portion derived from the reactive silyl group with the substrate is cleaved. Therefore, the surface layer has excellent abrasion resistance and fingerprint stain removability.
  • the fluorine-containing compound-containing composition of the present invention contains at least one compound (1) and another fluorine-containing compound.
  • fluorine-containing compound a fluorine-containing compound that is by-produced in the production process of compound (1) (hereinafter, also referred to as “by-product fluorine-containing compound”) and a known compound used for the same purpose as compound (1) Examples thereof include fluorine-containing compounds.
  • by-product fluorine-containing compound a fluorine-containing compound that is by-produced in the production process of compound (1)
  • the other fluorine-containing compound a compound that is less likely to deteriorate the characteristics of the compound (1) is preferable.
  • Examples of the by-product fluorine-containing compound include unreacted compound (2A) or compound (2B), and a fluorine-containing compound in which a part of the allyl group is isomerized to an inner olefin during hydrosilylation in the production of compound (1).
  • Examples of known fluorine-containing compounds include fluorine-containing compounds that are commercially available as surface treatment agents. When the composition contains a known fluorine-containing compound, a new action effect such as supplementing the characteristic (1) may be exhibited.
  • the content of the compound (1) is preferably 60% by mass or more and less than 100% by mass, more preferably 70% by mass or more and less than 100% by mass, and particularly preferably 80% by mass or more and less than 100% by mass.
  • the content of the other fluorine-containing compound is preferably more than 0 mass% and 40 mass% or less, more preferably more than 0 mass% and 30 mass% or less, particularly preferably more than 0 mass% and 20 mass% or less. ..
  • the total content of the compound (1) and the content of other fluorine-containing compounds is preferably 80 to 100% by mass, and particularly preferably 85 to 100% by mass in the present composition.
  • the present composition may contain components other than the compound (1) and other fluorine-containing compounds as long as the effects of the present invention are not impaired.
  • Other components include (1) and by-products (however, by-product fluorine-containing compounds are excluded) generated in the known production process of fluorine-containing compounds, unreacted raw materials, and other inevitable compounds in production. ..
  • Other components include additives such as acid catalysts and basic catalysts that accelerate the hydrolysis and condensation reaction of the hydrolyzable silyl group.
  • the acid catalyst include hydrochloric acid, nitric acid, acetic acid, sulfuric acid, phosphoric acid, sulfonic acid, methanesulfonic acid, p-toluenesulfonic acid and the like.
  • the basic catalyst include sodium hydroxide, potassium hydroxide, ammonia and the like.
  • the content of the other components is preferably 0 to 9.999% by mass, and particularly preferably 0 to 0.99% by mass in the composition.
  • the coating liquid of the present invention contains the compound (1) or the present composition and a liquid medium.
  • the coating liquid may be a solution or a dispersion liquid.
  • the liquid medium is preferably an organic solvent.
  • the organic solvent may be a fluorine-containing organic solvent or a non-fluorine organic solvent, or may include both solvents.
  • the fluorine-containing organic solvent include fluorinated alkanes, fluorinated aromatic compounds, fluoroalkyl ethers, fluorinated alkylamines and fluoroalcohols.
  • As the fluorinated alkane a compound having 4 to 8 carbon atoms is preferable.
  • Examples of commercially available products include C 6 F 13 H (manufactured by AGC, Asahiclin (registered trademark) AC-2000), C 6 F 13 C 2 H 5 (manufactured by AGC, Asahiclin (registered trademark) AC-6000), C 2 F 5 CHFCHFCF 3 (Kemazu Co., Vertrel (R) XF) and the like.
  • Examples of the fluorinated aromatic compound include hexafluorobenzene, trifluoromethylbenzene, perfluorotoluene, bis(trifluoromethyl)benzene and the like.
  • As the fluoroalkyl ether a compound having 4 to 12 carbon atoms is preferable.
  • CF 3 CH 2 OCF 2 CF 2 H manufactured by AGC, ASAHIKLIN (registered trademark) AE-3000
  • C 4 F 9 OCH 3 manufactured by 3M, Novec (registered trademark) 7100
  • C. 4 F 9 OC 2 H 5 3M Co., Novec (TM) 7200
  • C 2 F 5 CF OH 3 C 3 F 7 (3M Co., Novec (TM) 7300)
  • fluorinated alkylamine include perfluorotripropylamine and perfluorotributylamine.
  • the fluoroalcohol examples include 2,2,3,3-tetrafluoropropanol, 2,2,2-trifluoroethanol and hexafluoroisopropanol.
  • the non-fluorine organic solvent is preferably a compound containing only hydrogen atoms and carbon atoms and a compound containing only hydrogen atoms, carbon atoms and oxygen atoms, and examples thereof include hydrocarbons, alcohols, ketones, ethers and esters.
  • the liquid medium may be a mixed medium in which two or more kinds are mixed.
  • the content of the compound (1) or the present composition is preferably 0.001 to 10% by mass, and particularly preferably 0.01 to 1% by mass in the present coating liquid.
  • the content of the liquid medium in the coating liquid is preferably 90 to 99.999% by mass, and particularly preferably 99 to 99.99% by mass.
  • the article of the present invention (hereinafter, also referred to as “the article”) has a surface layer formed from the compound (1) or the composition on the surface of a substrate.
  • the surface layer may be formed on a part of the surface of the base material or may be formed on the entire surface of the base material.
  • the surface layer may be spread like a film on the surface of the substrate, or may be scattered in dots.
  • the surface layer contains the compound (1) in a state where a part or all of the hydrolyzable silyl groups of the compound (1) are hydrolyzed and the silanol groups are dehydrated and condensed.
  • the thickness of the surface layer is preferably 1 to 100 nm, particularly preferably 1 to 50 nm. When the thickness of the surface layer is 1 nm or more, the effect of the surface treatment is likely to be sufficiently obtained. When the thickness of the surface layer is 100 nm or less, the utilization efficiency is high.
  • the thickness of the surface layer is calculated from the vibration period of the interference pattern by obtaining the interference pattern of the reflected X-ray by the X-ray reflectance method using an X-ray diffractometer for thin film analysis (RIGAKU, ATX-G). it can.
  • the base material examples include base materials that are required to have water and oil repellency. For example, place it on another article (such as a stylus) or a substrate that may be used by touching the human fingers, a substrate that may be held by the human fingers during operation, or another article (such as a mounting table). There are occasional base materials. Examples of the material of the base material include metal, resin, glass, sapphire, ceramic, stone, and composite materials thereof. The glass may be chemically strengthened. A base film such as a SiO 2 film may be formed on the surface of the base material. As the base material, a base material for a touch panel, a base material for a display and a spectacle lens are suitable, and a base material for a touch panel is particularly suitable.
  • glass or transparent resin is preferable.
  • a glass or a resin film used for an exterior portion (excluding the display portion) of a device such as a mobile phone (for example, a smartphone), a mobile information terminal (for example, a tablet terminal), a game machine, a remote controller is also preferable.
  • the present article can be produced, for example, by the following method.
  • dry coating methods include vacuum deposition, CVD, and sputtering.
  • the vacuum deposition method is preferable from the viewpoint of suppressing the decomposition of the compound (1) and the simplicity of the apparatus.
  • a pellet-like substance obtained by impregnating a porous metal body such as iron or steel with the compound (1) or the present composition may be used.
  • a pellet-like substance impregnated with the compound (1) or the present composition may be used by impregnating the coating liquid with a porous metal such as iron or steel and drying the liquid medium.
  • Wet coating methods include spin coating method, wipe coating method, spray coating method, squeegee coating method, dip coating method, die coating method, inkjet method, flow coating method, roll coating method, casting method, Langmuir-Blodgett method, gravure method.
  • a coating method and the like can be mentioned.
  • Example 1 (Example 1-1) 2.1 g of acetonitrile and 500 mL of tetrahydrofuran (hereinafter, also referred to as “THF”) were added to a 1000 mL four-necked flask, and the mixture was stirred under a nitrogen atmosphere while cooling with a dry ice-acetone bath. Thereafter, 50 mL of a hexane solution of lithium diisopropylamide (1.1 mol/L, manufactured by Aldrich) was added, and then 7.5 g of allyl bromide (manufactured by Tokyo Chemical Industry Co., Ltd.) was added. The contents in the flask were stirred while returning to 25°C.
  • THF tetrahydrofuran
  • Example 1-2 To a 100 mL eggplant-shaped flask, 3.0 g (9.3 mmol) of the compound (6-1) obtained in Example 1-1 and 50 mL of dichloromethane were added and stirred under ice cooling. 10.6 g (93 mmol) of trifluoroacetic acid was added, and the mixture was stirred at 25°C for 1.5 hours. A 10% aqueous sodium hydroxide solution was added to the obtained solution to make the solution basic, and then extraction operation was performed using dichloromethane. 1.8 g of the compound (7-1) was obtained.
  • Example 1-4 A compound (1-1) was obtained in the same manner as in Example 11-3 of Patent Document 2, except that the compound (2-1) obtained in Example 1-3 was used.
  • Example 2 A compound (1-2) was obtained in the same manner as in Example 1 except that the compound (7-1) obtained in Example 1-2 was used instead of the compound (4-1) in Example 1-1.
  • Example 3 Compound (7- was prepared in the same manner as in Example 1-1 and Example 1-2, except that compound (5-2) (manufactured by Tokyo Chemical Industry Co., Ltd.) was used instead of compound (5-1) in Example 1-1. 3) was obtained.
  • Example 3-2 Compound (1-) was obtained in the same manner as in Example 1-3 and Example 1-4, except that compound (7-3) obtained in Example 3-1 was used instead of compound (7-1) in Example 1-3. 3) was obtained.
  • Example 4 A compound (1-4) was obtained in the same manner as in Example 1 except that the compound (7-3) obtained in Example 3-1 was used instead of the compound (4-1) in Example 1-1.
  • Example 5 (Example 5-1) Compound (7-5) was obtained in the same manner as in Example 1-1 and Example 1-2, except that compound (4-2) was used instead of compound (4-1) in Example 1-1.
  • Example 5-2 Compound (1-) was obtained in the same manner as in Example 1-3 and Example 1-4, except that compound (7-5) obtained in Example 5-1 was used instead of compound (7-1) in Example 1-3. 5) was obtained.
  • Example 6 A compound (1-6) was obtained in the same manner as in Example 1 except that the compound (7-5) obtained in Example 5-1 was used instead of the compound (4-1) in Example 1-1.
  • Example 7 Example 7-1 and Example except that the compound (4-2) was used instead of the compound (4-1) and the compound (5-2) was used instead of the compound (5-1) in Example 1-1.
  • Compound (7-7) was obtained in the same manner as 1-2.
  • Example 7-2 The compound (1-) was prepared in the same manner as in Example 1-3 and Example 1-4, except that the compound (7-7) obtained in Example 7-1 was used instead of the compound (7-1) in Example 1-3. 7) was obtained.
  • Example 8 A compound (1-8) was obtained in the same manner as in Example 1 except that the compound (7-7) obtained in Example 7-1 was used instead of the compound (4-1) in Example 1-1.
  • Example 9 Compound (4-3) (manufactured by FUJIFILM Wako Pure Chemical Industries, Ltd.) was used instead of compound (4-1) in Example 1-1, in the same manner as in Example 1-1 and Example 1-2. 7-9) was obtained.
  • Example 9-2 Compound (1-) was obtained in the same manner as in Example 1-3 and Example 1-4, except that compound (7-9) obtained in Example 9-1 was used instead of compound (7-1) in Example 1-3. 9) was obtained.
  • Example 10 A compound (1-10) was obtained in the same manner as in Example 1 except that the compound (7-9) obtained in Example 9-1 was used instead of the compound (4-1) in Example 1-1.
  • Example 11 Example 1-1 and Example except that the compound (4-3) was used instead of the compound (4-1) in Example 1-1 and the compound (5-2) was used instead of the compound (5-1) Compound (7-11) was obtained in the same manner as 1-2.
  • Example 11-2 Compound (1-) was prepared in the same manner as in Example 1-3 and Example 1-4, except that compound (7-11) obtained in Example 11-1 was used instead of compound (7-1) in Example 1-3. 11) was obtained.
  • Example 12 A compound (1-12) was obtained in the same manner as in Example 1 except that the compound (7-11) obtained in Example 11-1 was used instead of the compound (4-1) in Example 1-1.
  • Example 13 (Example 13-1) In a 50 mL round-bottomed flask, 10.0 g of the compound (2-1) obtained in Example 1-3 and 20 mL of AC-2000 were placed, and after cooling with ice, a solution of lithium aluminum hydride in THF (2.5 mol/L , Manufactured by Tokyo Kasei Kogyo Co., Ltd.) was added dropwise. After the temperature was raised to 60 degrees, it was stirred for 12 hours. From NMR, it was confirmed that all the compound (2-1) was converted to the compound (2-13). The resulting solution was ice-cooled, 2 g of sodium sulfate decahydrate was added, the mixture was stirred for 1 hour, and filtered to obtain 6.7 g of compound (2-13).
  • THF lithium aluminum hydride in THF
  • Example 13-2 Compound (1-13) was obtained in the same manner as in Example 1-4, except that compound (2-13) obtained in Example 13-1 was used instead of compound (2-1).
  • Example 14 (Example 14-1) A 50 mL eggplant-shaped flask was charged with 10.0 g of the compound (2-2) obtained in the middle of Example 2 and 20 mL of AC-2000, and the mixture was ice-cooled, and then a lithium aluminum hydride solution in THF (2.5 mol/L was added). ) Was added dropwise. After the temperature was raised to 60 degrees, it was stirred for 12 hours. From NMR, it was confirmed that all the compound (2-2) was converted to the compound (2-14). The resulting solution was ice-cooled, 4 g of sodium sulfate decahydrate was added, the mixture was stirred for 1 hour, and filtered to obtain 4.5 g of compound (2-14).
  • Example 14-2 Compound (1-14) was obtained in the same manner as in Example 1-4, except that compound (2-14) obtained in Example 14-1 was used instead of compound (2-1).
  • Example 15 (Example 15-1) In a 50 mL round-bottomed flask, 0.6 g of phenyl chloroformate and 20 mL of N,N-dimethylformamide were placed, 1.0 g of the compound (7-1) obtained in Example 1-2 was added dropwise, and at 25° C. Stir for 12 hours. From NMR, it was confirmed that all the compound (7-1) was converted to the compound (7-15). After adding 10 mL of ion-exchanged water to the obtained solution, extraction operation was performed with 50 mL of dichloromethane. It was dehydrated with 5 g of magnesium sulfate and filtered to obtain 1.3 g of the compound (7-15).
  • Example 15-2 In a 100 mL pressure-resistant reactor, 15 g of compound (8-1) obtained according to the method described in Example 1-5 of Example of WO 2013/121984, dichloropentafluoropropane (AK, AK). -225) and 7.5 g of a 2.0 mol/L ammonia-methanol solution were added, and the mixture was stirred at 25° C. for 6 hours. The solvent was distilled off to obtain 14.8 g of compound (8-2).
  • Example 15-3 Compound (1-15) was obtained in the same manner as in Example 1-4, except that compound (2-15) obtained in Example 15-2 was used instead of compound (2-1).
  • Example 16 7.9 g of compound (1-16) was obtained in the same manner as in Example 15 except that 0.6 g of phenylchloroformate in Example 15-1 was changed to 0.7 g of phenylchlorothionoformate.
  • Example 17 Compound (8-4) was obtained according to the method described in Example 3-2 of WO2019/039341. The average value of x is 13. The molecular weight of R f is 4500. To a 50 mL eggplant-shaped flask, 10.0 g of the compound (8-4), 20 mL of 1,3-di(trifluoromethyl)benzene, and 1.0 g of the compound (7-1) obtained in Example 1-2 were added dropwise. , 0.50 g of triethylamine were added, and the mixture was stirred with heating under reflux overnight (12 hours). After adding methanol and stirring sufficiently, AC-6000 was added and stirred sufficiently. The AC-6000 layer was collected, the solvent was evaporated, and the residue was purified by silica gel column chromatography. 9.8 g of the compound (2-17) was obtained.
  • Example 17-2 Compound (1-17) was obtained in the same manner as in Example 1-4, except that compound (2-17) obtained in Example 17-1 was used instead of compound (2-1).
  • Example 18 In a 50 mL eggplant-shaped flask, 10.0 g of the compound (8-1) obtained in Example 1-3 and 2.1 g of ethyl acetate were placed, and after ice-cooling, 1.1 g of sodium methoxide was added. The temperature was gradually raised to 25° C. and the mixture was stirred for 12 hours. After adding 10 mL of water, 50 mL of AC-2000 was added for extraction operation. It was dehydrated with magnesium sulfate and then filtered to obtain 6.6 g of the compound (8-5).
  • Example 18-2 6.6 g of the compound (8-5) obtained in Example 18-1 was diluted with 30 mL of C 4 F 9 OC 2 H 5 (3M, Novec (registered trademark) 7200) and 1 mL of THF, and cooled with ice. After that, 5 mL of a THF solution of allyl magnesium chloride (1 mol/L) was added dropwise. The temperature was gradually raised to 25° C. and the mixture was stirred for 12 hours. Methanol was added to the obtained solution, and the mixture was sufficiently stirred, and then AC-6000 was added and sufficiently stirred. The AC-6000 layer was collected, the solvent was evaporated, and the residue was purified by silica gel chromatography. 2.7 g of the compound (2-18) was obtained.
  • Example 18-3 Compound (1-18) was obtained in the same manner as in Example 1-4, except that compound (2-18) obtained in Example 18-2 was used instead of compound (2-1).
  • Example 19 (Example 19-1) In a 50 mL round-bottomed flask, 5.0 g of the compound (2-18) obtained in Example 18-2 and 20 mL of AC-2000 were placed, and after cooling with ice, a lithium aluminum hydride solution in THF (2.5 mol/L ) was added dropwise. After gradually raising the temperature to 25° C., the mixture was stirred for 12 hours. The resulting solution was ice-cooled, 1 g of sodium sulfate decahydrate was added, and the mixture was stirred for 1 hour, then filtered to obtain 1.2 g of compound (2-19).
  • Example 19-2 Compound (1-19) was obtained in the same manner as in Example 1-4, except that compound (2-19) obtained in Example 19-1 was used instead of compound (2-1).
  • Example 20 (Example 20-1) A compound (2-20) was obtained in the same manner except that the compound (A) of Example 3 of Patent Document 3 was changed to the compound (2-19) obtained in Example 19-1 and methanesulfonyl chloride was changed to dimethylchlorophosphate. ) Got.
  • Example 20-2 Compound (1-20) was obtained in the same manner as in Example 1-4, except that compound (2-20) obtained in Example 20-1 was used instead of compound (2-1).
  • Example 21 (Example 21-1) A compound (2-21) was obtained in the same manner except that the compound (A) of Example 3 of Patent Document 3 was changed to the compound (2-19) obtained in Example 19-1.
  • Example 21-2 Compound (1-21) was obtained in the same manner as in Example 1-4, except that compound (2-21) obtained in Example 21-1 was used instead of compound (2-1).
  • Example 22 (Example 22-1) A compound (2-22) was obtained in the same manner except that the compound (A) of Example 1 of Patent Document 3 was changed to the compound (2-19) obtained in Example 19-1.
  • Example 22-2 Compound (1-22) was obtained in the same manner as in Example 1-4, except that compound (2-22) obtained in Example 22-1 was used instead of compound (2-1).
  • Example 23 A compound (10-1) was obtained in the same manner as in Example 11 of Patent Document 2.
  • Example 24 Compound (10-2) was obtained in the same manner as in Example 15 except that compound (4-1) was used instead of compound (7-1) in Example 15-1.
  • Example 25 Compound (10-3) was obtained in the same manner as in Example 24 except that phenylchloroformate in Example 15-1 was changed to phenylchlorothionoformate.
  • Example 26 Compound (10-4) was obtained in the same manner as in Example 17, except that compound (4-1) was used instead of compound (7-1) in Example 17-1.
  • Example 27 A compound (12-1) was obtained in the same manner as in Example 18-2 except that the compound (8-1) obtained in Example 1-3 was used instead of the compound (8-5) in Example 18-2. ..
  • Example 27-2 Compound (10-5) was obtained in the same manner as in Example 1-4, except that compound (12-1) obtained in Example 27-1 was used instead of compound (2-1).
  • Example 28 Compound (10-6) was obtained in the same manner as in Example 20, except that the compound (2-19) in Example 20-1 was changed to the compound (12-1) obtained in Example 27-1.
  • Example 29 A compound (10-7) was obtained in the same manner as in Example 21 except that the compound (2-19) in Example 21-1 was changed to the compound (12-1) obtained in Example 27-1.
  • Example 30 Compound (10-8) was obtained in the same manner as in Example 22 except that the compound (2-19) in Example 22-1 was changed to the compound (12-1) obtained in Example 27-1.
  • Example 31-2 In a 500 mL three-necked flask, 25.0 g (0.006 mm) of the compound (8-6) obtained in Example 31-1, 25.0 g of AE-3000, 7.2 g (0.06 mmol) of sodium fluoride and 20.0 g (0.06 mmol) of CF 3 CF 2 CF 2 OCF(CF 3 )COF was added, and the mixture was stirred at 50° C. for 12 hours. The obtained solution was filtered with a membrane filter and then concentrated to obtain 28.3 g of compound (8-7). The average value of x+y is 10. The molecular weight is 4600.
  • Example 31-3 250 mL of ClCF 2 CFClCF 2 OCF 2 CF 2 Cl (CFE-419) was put into a 500 mL nickel reactor, and nitrogen was bubbled. After the oxygen concentration was sufficiently lowered, 20% fluorine gas (diluted with nitrogen gas) was bubbled for 1 hour. The exhaust gas was neutralized with alkali. A CFE-419 solution of compound (8-7) (16% by mass, mass of compound (8-7): 25 g) was added over 2 hours. The ratio of the fluorine introduction rate (mol/hour) and the hydrogen atom introduction rate (mol/hour) in the compound (8-7) was controlled to be 2:1.
  • Example 31-4 Compound (2-31) was obtained in the same manner as in Example 1-3, except that compound (8-8) obtained in Example 31-3 was used instead of compound (8-1).
  • the molecular weight of Q f is 4000.
  • Example 31-5) Compound (1-31) was obtained in the same manner as in Example 1-4, except that compound (2-31) obtained in Example 31-4 was used instead of compound (2-1).
  • Examples 32-62 Manufacture and Evaluation of Articles A substrate was surface-treated with each of the compounds obtained in Examples 1 to 31 to obtain articles of Examples 32 to 62.
  • the surface treatment method the following dry coating method and wet coating method were used for each example.
  • a chemically strengthened glass was used as the base material.
  • the obtained articles were evaluated by the following methods. The results are shown in Tables 1 to 6.
  • the dry coating was performed using a vacuum vapor deposition device (VTR350M manufactured by ULVAC) (vacuum vapor deposition method).
  • VTR350M vacuum vapor deposition device manufactured by ULVAC
  • 0.5 g of each compound obtained in Examples 1 to 31 was filled in a molybdenum boat inside the vacuum vapor deposition apparatus, and the inside of the vacuum vapor deposition apparatus was evacuated to 1 ⁇ 10 ⁇ 3 Pa or less.
  • the boat on which the compound is placed is heated at a temperature rising rate of 10° C./min or less, and when the deposition rate by the crystal oscillation type film thickness meter exceeds 1 nm/sec, the shutter is opened to form a film on the surface of the base material. Started.
  • the shutter was closed to complete the film formation on the surface of the base material.
  • the substrate on which the compound was deposited was heat treated at 200° C. for 30 minutes and washed with AK-225 to obtain an article having a surface layer on the surface of the substrate.
  • ⁇ Initial contact angle> For the surface layer, the initial contact angle of water or n-hexadecane was measured by the above measuring method. The evaluation criteria are as follows. Initial contact angle of water: A (excellent): 115 degrees or more. Good (Good): 110 degrees or more and less than 115 degrees. ⁇ (Fair): 100 degrees or more and less than 110 degrees. X (Not possible): less than 100 degrees. Initial contact angle of n-hexadecane: A (excellent): 66 degrees or more. Good (Good): 65 degrees or more and less than 66 degrees. ⁇ (OK): 63 degrees or more and less than 65 degrees. X (Not possible): less than 63 degrees.
  • ⁇ Light resistance> Light rays (650 W/m 2 , 300 to 700 nm) were applied to the surface layer at a black panel temperature of 63° C. using a desktop xenon arc lamp type accelerated light resistance tester (SUNTEST XLS+ manufactured by Toyo Seiki Co., Ltd.). After irradiation for 2,000 hours, the water contact angle was measured. The smaller the decrease in the water contact angle after the accelerated light resistance test, the smaller the decrease in performance due to light, and the better the light resistance.
  • the evaluation criteria are as follows. ⁇ (Excellent): Change in water contact angle after accelerated light resistance test is 2 degrees or less. Good (Good): Change in water contact angle after accelerated light resistance test is more than 2 degrees and 5 degrees or less. ⁇ (OK): Change in water contact angle after accelerated light resistance test was more than 5 degrees and 10 degrees or less. X (Not possible): Change in water contact angle after accelerated light resistance test exceeds 10 degrees.
  • ⁇ Abrasion resistance> Regarding the surface layer a reciprocating traverse tester (manufactured by KNT) was used in accordance with JIS L0849:2013 (ISO 105-X12:2001), and a steel wool bonster (#0000) was used at a pressure of 98.07 kPa and a speed of 320 cm. After reciprocating 20,000 times/minute, the contact angle of water was measured. The smaller the decrease in the contact angle of water after rubbing, the smaller the decrease in performance due to rubbing, and the better the abrasion resistance. The evaluation criteria are as follows. ⁇ (Excellent): Change in water contact angle after reciprocating 20,000 times is 5 degrees or less.
  • Alkali resistance test The article was immersed in a 1N aqueous solution of sodium hydroxide (pH: 14) for 5 hours, washed with water and air-dried, and the water contact angle was measured by the above method. The smaller the decrease in the water contact angle after the test, the smaller the decrease in performance due to alkali, and the better the alkali resistance.
  • the evaluation criteria are as follows. ⁇ (excellent): Change in water contact angle after alkali resistance test is 2 degrees or less. ⁇ (Good): The change in water contact angle after the alkali resistance test is more than 2 degrees and 5 degrees or less. ⁇ (OK): The change in water contact angle after the alkali resistance test was more than 5 degrees and 10 degrees or less. X (Not possible): The change in water contact angle after the alkali resistance test exceeds 10 degrees.
  • Salt spray test A salt spray test was conducted according to JIS H8502. That is, the article was exposed to a salt water atmosphere in a salt spray tester (manufactured by Suga Test Instruments Co., Ltd.) for 300 hours, and then the water contact angle was measured by the above method. The smaller the decrease in the water contact angle after the test, the smaller the decrease in performance due to salt water, and the better the salt water resistance.
  • the evaluation criteria are as follows. ⁇ (excellent): The change in water contact angle after the salt spray test is 2 degrees or less. Good (Good): The change in water contact angle after the salt spray test was more than 2 degrees and 5 degrees or less. ⁇ (OK): Change in water contact angle after salt spray test was more than 5 degrees and 10 degrees or less. X (Not possible): The change in water contact angle after the salt spray test exceeds 10 degrees.
  • a fully-automatic contact angle meter manufactured by Kyowa Interface Science Co., Ltd., DMo-701 whose main surface was held horizontally was prepared. After placing the article on the surface (horizontal surface) of a polyethylene sheet (a hard polyethylene sheet (high-density polyethylene) manufactured by Hagitec Co., Ltd.) so that the surface layer is in contact, gradually tilt it using a fully automatic contact angle meter, The angle (sliding angle) formed by the surface layer of the article and the horizontal plane when the article started to slide was measured. The judgment criteria are shown below. The contact area between the article and the polyethylene sheet was 6 cm ⁇ 6 cm, and the load on the article was 0.98 N.
  • the value of haze was measured for each reciprocation of wiping, and the number of times of wiping at which haze was 10% or less from the initial value was measured. The less the number of times of wiping off, the easier it is to remove fingerprint stains, and the better the wiping performance of fingerprint stains.
  • the evaluation criteria are as follows. ⁇ (excellent): The number of times of wiping is 3 times or less. ⁇ (Good): The number of times of wiping is 4 to 5 times. ⁇ (OK): The number of times of wiping is 6 to 8 times. ⁇ (Not possible): The number of times of wiping is 9 or more.
  • Examples 32 to 53 and 62 using the compound (1) were excellent in initial water/oil repellency, light resistance, abrasion resistance, chemical resistance, slip resistance, and fingerprint stain removability.
  • the fluorine-containing compound of the present invention can be used in various applications in which lubricity and water/oil repellency are required.
  • display input device such as touch panel, surface protection coat of transparent glass or transparent plastic member, antifouling coat for kitchen, water repellent and antifouling coat for electronic devices, heat exchangers, batteries, etc., for toiletries
  • It can be used as an antifouling coat, a coat for a member requiring liquid repellency while conducting, a water repellent/waterproof/sliding coat for a heat exchanger, a low surface friction coat for a vibrating sieve or the inside of a cylinder, and the like.
  • More specific examples of use include a front protective plate for a display, an antireflection plate, a polarizing plate, an antiglare plate, or those whose surface is subjected to an antireflection film treatment, and a touch panel for devices such as mobile phones and personal digital assistants.
  • Various equipment such as seats and touch panel displays that have a display input device that operates on the screen with a person's finger or palm, decorative building materials around water such as toilets, baths, washrooms, kitchens, etc.
  • Surface protective coatings for machine parts, vacuum equipment parts, bearing parts, automobile parts, tools and the like can be mentioned.
  • the entire contents of the specification, claims and abstract of Japanese Patent Application No. 2018-222872 filed on Nov. 28, 2018 are cited herein and incorporated as the disclosure of the specification of the present invention. Is.

Abstract

Provided are: a fluorine-containing compound, a composition containing the fluorine-containing compound, and a coating solution, which are capable of forming a surface layer having excellent fingerprint stain removability and abrasion resistance; an article having a surface layer having excellent fingerprint stain removability and abrasion resistance; and a production method thereof. The fluorine-containing compound has: a monovalent or divalent fluorine-containing organic group; a reactive silyl group in which at least one among a hydrolysable group and a hydroxyl group is bonded to a silicon atom; and a linking group for linking the fluorine-containing organic group and the reactive silyl group, and is characterized in that the linking group has a site in which two or more polar groups are connected in series via a C1-20 divalent organic group, and the polar groups are C(O)NH, NHC(O), NH, NHC(O)NH, NHC(S)NH, S(O)2NH, NHS(O)2, C(O), C(OH), etc.

Description

含フッ素化合物、含フッ素化合物含有組成物、コーティング液、物品及びその製造方法Fluorine-containing compound, fluorine-containing compound-containing composition, coating liquid, article and method for producing the same
 本発明は、含フッ素化合物、含フッ素化合物含有組成物、コーティング液、物品及びその製造方法に関する。 The present invention relates to a fluorine-containing compound, a composition containing a fluorine-containing compound, a coating liquid, an article and a method for producing the same.
 フルオロアルキル基、フルオロポリエーテル鎖等の含フッ素有機基と、加水分解性シリル基とを有する含フッ素化合物は、高い潤滑性、撥水撥油性等を示す表面層を基材の表面に形成できるため、表面処理剤に好適に用いられる。含フッ素化合物を含む表面処理剤は、表面層が指で繰り返し摩擦されても撥水撥油性が低下しにくい性能(耐摩擦性)及び拭き取りによって表面層に付着した指紋を容易に除去できる性能(指紋汚れ除去性)が長期間維持されることが求められる用途、例えば、タッチパネルの指で触れる面を構成する部材、メガネレンズ、ウェアラブル端末のディスプレイの表面処理剤として用いられる。 A fluorine-containing compound having a fluorine-containing organic group such as a fluoroalkyl group or a fluoropolyether chain and a hydrolyzable silyl group can form a surface layer having high lubricity, water repellency and oil repellency on the surface of a substrate. Therefore, it is suitably used as a surface treatment agent. The surface-treating agent containing a fluorine-containing compound has a property that the water and oil repellency does not easily deteriorate even if the surface layer is repeatedly rubbed with a finger (rubbing resistance), and a property that fingerprints attached to the surface layer can be easily removed by wiping ( It is used in applications where it is required to maintain fingerprint stain removability) for a long period of time, for example, as a member constituting a surface of a touch panel to be touched by a finger, an eyeglass lens, and a surface treatment agent for a display of a wearable terminal.
 耐摩擦性及び指紋汚れ除去性に優れる表面層を基材の表面に形成できる含フッ素化合物としては、フルオロポリエーテル鎖と加水分解性シリル基とを有する含フッ素化合物が提案されている(特許文献1~4)。 A fluorine-containing compound having a fluoropolyether chain and a hydrolyzable silyl group has been proposed as a fluorine-containing compound capable of forming a surface layer having excellent abrasion resistance and fingerprint stain removability on the surface of a substrate (Patent Document 1-4).
国際公開第2017/187775号International Publication No. 2017/187775 国際公開第2017/038830号International Publication No. 2017/038830 特開2016-222859号公報JP, 2016-222859, A 特開2015-221888号公報JP, 2005-221888, A
 最近では、タッチパネルの指で触れる面を構成する部材等における表面層には、耐摩擦性のさらなる向上が求められることがある。 Recently, further improvement of abrasion resistance may be required for the surface layer of the member that constitutes the surface of the touch panel that is touched by the finger.
 本発明は、指紋汚れ除去性及び耐摩擦性に優れる表面層を形成できる含フッ素化合物、含フッ素化合物含有組成物及びコーティング液、指紋汚れ除去性及び耐摩擦性に優れる表面層を有する物品及びその製造方法の提供を目的とする。 The present invention provides a fluorine-containing compound capable of forming a surface layer having excellent fingerprint stain removability and abrasion resistance, a composition containing a fluorine-containing compound and a coating liquid, an article having a surface layer excellent in fingerprint stain removability and abrasion resistance, and The purpose is to provide a manufacturing method.
 本発明は、下記[1]~[14]の構成を有する含フッ素化合物、含フッ素化合物含有組成物、コーティング液、物品、及び物品の製造方法を提供する。
 [1]1価又は2価の含フッ素有機基と、加水分解性基及び水酸基の少なくとも一方の基がケイ素原子に結合した反応性シリル基と、前記含フッ素有機基と前記反応性シリル基とを連結する連結基とを有する含フッ素化合物であり、
 前記連結基が、2個以上の極性基が炭素数1~20の2価の有機基を介して直列に結合した部位を有し、
 前記極性基が、C(O)NH、NHC(O)、NH、NHC(O)NH、NHC(S)NH、S(O)NH、NHS(O)、C(O)、C(OH)、C(OR)、P(O)、S(O)、C[OP(O)(OR]、C[OS(O)]及びC[OC(O)R](ただし、Rは、アルキル基である。)からなる群から選ばれる極性基であることを特徴とする含フッ素化合物。
The present invention provides a fluorine-containing compound, a fluorine-containing compound-containing composition, a coating liquid, an article, and a method for producing an article, each of which has the constitutions [1] to [14] below.
[1] Monovalent or divalent fluorine-containing organic group, a reactive silyl group in which at least one of a hydrolyzable group and a hydroxyl group is bonded to a silicon atom, the fluorine-containing organic group, and the reactive silyl group A fluorine-containing compound having a linking group for linking,
The linking group has a site in which two or more polar groups are bonded in series via a divalent organic group having 1 to 20 carbon atoms,
The polar group is C(O)NH, NHC(O), NH, NHC(O)NH, NHC(S)NH, S(O) 2 NH, NHS(O) 2 , C(O), C( OH), C(OR 4 ), P(O), S(O), C[OP(O)(OR 4 ) 2 ], C[OS(O) 2 R 4 ] and C[OC(O)R. 4 ] (wherein R 4 is an alkyl group) is a polar group selected from the group consisting of:
 [2]下式(1A)で表される化合物又は下式(1B)で表される化合物である、含フッ素化合物。
 [R-]a1[-T]b1 ・・・(1A)
 [T-]b2[R-]a2-Q-Q[-Ra2[-T]b2 ・・・(1B)
 ただし、
  Rは、フルオロアルキル基(ただし、Q及びQ側の末端の炭素原子には少なくとも1個のフッ素原子が結合する。)、又は炭素数2以上のフルオロアルキル基の炭素-炭素原子間に-O-を有する基(ただし、Q及びQ側の末端の炭素原子には少なくとも1個のフッ素原子が結合する。)であり、
  Qは、フルオロアルキレン基(ただし、Q側の末端の炭素原子には少なくとも1個のフッ素原子が結合する。)、又は炭素数2以上のフルオロアルキレン基の炭素-炭素原子間に-O-を有する基(ただし、Q側の末端の炭素原子には少なくとも1個のフッ素原子が結合する。)であり、
  Qは、2個以上の極性基が炭素数1~20の2価の有機基を介して直列に結合した部位を有するa1+b1価の連結基であり、
  Qは、2個以上の極性基が炭素数1~20の2価の有機基を介して直列に結合した部位を有するa2+b2+1価の連結基であり、2個のQは同一であっても異なっていてもよく、
  前記極性基が、C(O)NH、NHC(O)、NH、NHC(O)NH、NHC(S)NH、S(O)NH、NHS(O)、C(O)、C(OH)、C(OR)、P(O)、S(O)、C[OP(O)(OR]、C[OS(O)]及びC[OC(O)R](ただし、Rは、アルキル基である。)からなる群から選ばれる極性基であり、
  Tは、-Si(R)3-c(L)であり、
  Rは、アルキル基であり、
  Lは、加水分解性基又は水酸基であり、2以上のLは同一であっても異なっていてもよく、
  a1は、1以上の整数であり、a2は、0以上の整数であり、2以上のRは同一であっても異なっていてもよく、
  b1及びb2は、それぞれ1以上の整数であり、2以上のTは同一であっても異なっていてもよく、
  cは、2又は3である。
[2] A fluorine-containing compound which is a compound represented by the following formula (1A) or a compound represented by the following formula (1B).
[R f −] a1 Q 1 [−T] b1 ... (1A)
[T−] b2 [R f −] a2 Q 2 −Q f −Q 2 [−R f ] a2 [−T] b2 (1B)
However,
R f is a fluoroalkyl group (provided that at least one fluorine atom is bonded to the terminal carbon atom on the Q 1 and Q 2 side) or a carbon-carbon atom of a fluoroalkyl group having 2 or more carbon atoms. Is a group having —O— (provided that at least one fluorine atom is bonded to the terminal carbon atom on the Q 1 and Q 2 side).
Q f represents a fluoroalkylene group (provided that at least one fluorine atom is bonded to the terminal carbon atom on the Q 2 side), or —O between carbon-carbon atoms of a fluoroalkylene group having 2 or more carbon atoms. A group having-(provided that at least one fluorine atom is bonded to the terminal carbon atom on the Q 2 side),
Q 1 is an a1+b1 valent linking group having a site in which two or more polar groups are bonded in series via a divalent organic group having 1 to 20 carbon atoms,
Q 2 is an a2+b2+1 valent linking group having a site in which two or more polar groups are bonded in series via a divalent organic group having 1 to 20 carbon atoms, and the two Q 2 are the same. May be different,
The polar group is C(O)NH, NHC(O), NH, NHC(O)NH, NHC(S)NH, S(O) 2 NH, NHS(O) 2 , C(O), C( OH), C(OR 4 ), P(O), S(O), C[OP(O)(OR 4 ) 2 ], C[OS(O) 2 R 4 ] and C[OC(O)R. 4 ] (wherein R 4 is an alkyl group) is a polar group selected from the group consisting of:
T is —Si(R) 3-c (L) c ,
R is an alkyl group,
L is a hydrolyzable group or a hydroxyl group, and two or more Ls may be the same or different,
a1 is an integer of 1 or more, a2 is an integer of 0 or more, and R f of 2 or more may be the same or different,
b1 and b2 are each an integer of 1 or more, and Ts of 2 or more may be the same or different,
c is 2 or 3.
 [3]前記極性基が、C(O)NH、NHC(O)、S(O)NH又はNHS(O)である、[2]の含フッ素化合物。
 [4]前記Rが、下式(g1a)で表される基である、[2]又は[3]の含フッ素化合物。
 Rf1-(ORf2- ・・・(g1a)
 ただし、
  Rf1は、炭素数1~6のフルオロアルキル基(ただし、mが0の場合、Q又はQ側の末端の炭素原子には少なくとも1個のフッ素原子が結合する。)であり、
  Rf2は、炭素数1~6のフルオロアルキレン基(ただし、Q又はQに結合するRf2のQ又はQ側の末端の炭素原子には少なくとも1個のフッ素原子が結合する。)であり、
  mは、0以上の整数であり、mが2以上の場合、(ORf2は2種以上のORf2からなるものであってもよい。
[3] The fluorine-containing compound according to [2], wherein the polar group is C(O)NH, NHC(O), S(O) 2 NH or NHS(O) 2 .
[4] The fluorine-containing compound according to [2] or [3], wherein R f is a group represented by the following formula (g1a).
R f1 −(OR f2 ) m − (g1a)
However,
R f1 is a fluoroalkyl group having 1 to 6 carbon atoms (however, when m is 0, at least one fluorine atom is bonded to the terminal carbon atom on the Q 1 or Q 2 side),
R f2 is a fluoroalkylene group having 1 to 6 carbon atoms (provided that at least one fluorine atom is attached to the Q 1 or Q 2 side terminal carbon atom of R f2 which bind to Q 1 or Q 2. ), and
m is an integer of 0 or more, and when m is 2 or more, (OR f2 ) m may be composed of two or more kinds of OR f2 .
 [5]前記Qが、式(g2-1)で表される基(ただし、a1=d1+d3及びb1=d2+d4である。)、式(g2-2)で表される基(ただし、a1=e1及びb1=e2である。)、式(g2-3)で表される基(ただし、a1=1及びb1=2である。)、式(g2-4)で表される基(ただし、a1=h1及びb1=h2である。)、式(g2-5)で表される基(ただし、a1=i1及びb1=i2である。)、式(g2-6)で表される基(ただし、a1=1及びb1=1である。)、又は式(g2-7)で表される基(ただし、a1=1及びb1=2である。)であり、
 前記Qが、式(g2-1)で表される基(ただし、a2+1=d1+d3及びb2=d2+d4である。)、式(g2-2)で表される基(ただし、a2+1=e1及びb2=e2である。)、式(g2-3)で表される基(ただし、a2+1=1及びb2=2である。)、式(g2-4)で表される基(ただし、a2+1=h1及びb2=h2である。)、式(g2-5)で表される基(ただし、a2+1=i1及びb2=i2である。)、式(g2-6)で表される基(ただし、a2+1=1及びb2=1である。)、又は式(g2-7)で表される基(ただし、a2+1=1及びb2=2である。)である、[2]~[4]のいずれかの含フッ素化合物。
Figure JPOXMLDOC01-appb-C000002
 (-A-E-Q12-)e1C(R4-e1-e2(-Q22-)e2 ・・・(g2-2)
 -A-E-Q13-N(-Q23-) ・・・(g2-3)
 (-A-E-Q14-)h1Z(-Q24-)h2 ・・・(g2-4)
 (-A-E-Q15-)i1Si(R4-i1-i2(-Q25-)i2 ・・・(g2-5)
 -A-E-Q26- ・・・(g2-6)
 -A-E(-Q27-) ・・・(g2-7)
 ただし、
  式(g2-1)~式(g2-7)においては、A側がR又はQに接続し、Q22、Q23、Q24、Q25、Q26及びQ27側がTに接続し、
  Aは、単結合又はアルキレン基であり、
  Eは、2個以上の前記極性基が炭素数1~20の2価の有機基を介して直列に結合した部位であり、式(g2-7)においては、Q27側の末端の極性基がC(OH)、C(OR)、P(O)、S(O)、C[OP(O)(OR]、C[OS(O)]又はC[OC(O)R]であり、
  Q11は、単結合、-O-、アルキレン基、又は炭素数2以上のアルキレン基の炭素-炭素原子間に-O-を有する基であり、
  Q12は、単結合又はアルキレン基であり、Q又はQがQ12を2以上有する場合、2以上のQ12は同一であっても異なっていてもよく、
  Q13は、アルキレン基であり、
  Q14は、Q14が結合するZにおける原子が炭素原子の場合、Q12であり、Q14が結合するZにおける原子が窒素原子の場合、Q13であり、Q又はQがQ14を2以上有する場合、2以上のQ14は同一であっても異なっていてもよく、
  Q15は、アルキレン基であり、Q又はQがQ15を2以上有する場合、2以上のQ15は同一であっても異なっていてもよく、
  Q22は、アルキレン基、炭素数2以上のアルキレン基の炭素-炭素原子間に-O-を有する基、アルキレン基のSiに接続しない側の末端に-O-を有する基、又は炭素数2以上のアルキレン基の炭素-炭素原子間に-O-を有しかつSiに接続しない側の末端に-O-を有する基であり、2以上のQ22は同一であっても異なっていてもよく、
  Q23は、アルキレン基、又は炭素数2以上のアルキレン基の炭素-炭素原子間に-O-を有する基であり、2個のQ23は同一であっても異なっていてもよく、
  Q24は、Q24が結合するZにおける原子が炭素原子の場合、Q22であり、Q24が結合するZにおける原子が窒素原子の場合、Q23であり、2以上のQ24は同一であっても異なっていてもよく、
  Q25は、アルキレン基、又は炭素数2以上のアルキレン基の炭素-炭素原子間に-O-を有する基であり、2以上のQ25は同一であっても異なっていてもよく、
  Q26は、アルキレン基、又は炭素数2以上のアルキレン基の炭素-炭素原子間に-O-を有する基であり、
  Q27は、アルキレン基、又は炭素数2以上のアルキレン基の炭素-炭素原子間に-O-を有する基であり、2個のQ27は同一であっても異なっていてもよく、
  Zは、Q14が直接結合する炭素原子又は窒素原子を有しかつQ24が直接結合する炭素原子又は窒素原子を有するa1+b1価又はa2+b2+1価の環構造を有する基であり、
  Rは、水素原子又はアルキル基であり、Q又はQがRを2以上有する場合、2以上のRは同一であっても異なっていてもよく、
  Rは、水素原子又はアルキル基であり、
  Rは、アルキル基であり、
  d1は、0~3の整数であり、d2は、0~3の整数であり、d1+d2は、1~3の整数であり、
  d3は、0~3の整数であり、d4は、0~3の整数であり、d3+d4は、1~3の整数であり、
  d1+d3は、1~5の整数であり、d2+d4は、1~5の整数であり、
  e1は、1~3の整数であり、e2は、1~3の整数であり、e1+e2は、3又は4であり、
  h1は、1以上の整数であり、h2は、1以上の整数であり、
  i1は、1~3の整数であり、i2は、1~3の整数であり、i1+i2は、3又は4である。
[5] The above Q 1 is a group represented by the formula (g2-1) (provided that a1=d1+d3 and b1=d2+d4) and a group represented by the formula (g2-2) (provided that a1= e1 and b1=e2), a group represented by the formula (g2-3) (provided that a1=1 and b1=2), a group represented by the formula (g2-4) (provided that: a1=h1 and b1=h2), a group represented by the formula (g2-5) (provided that a1=i1 and b1=i2), and a group represented by the formula (g2-6) ( Provided that a1=1 and b1=1) or a group represented by the formula (g2-7) (provided that a1=1 and b1=2),
Q 2 is a group represented by formula (g2-1) (provided that a2+1=d1+d3 and b2=d2+d4) and a group represented by formula (g2-2) (provided that a2+1=e1 and b2). =e2), a group represented by formula (g2-3) (provided that a2+1=1 and b2=2), a group represented by formula (g2-4) (provided that a2+1=h1) And b2=h2), a group represented by formula (g2-5) (provided that a2+1=i1 and b2=i2), a group represented by formula (g2-6) (provided that a2+1) =1 and b2=1) or a group represented by the formula (g2-7) (provided that a2+1=1 and b2=2), any of [2] to [4]. Fluorine-containing compound.
Figure JPOXMLDOC01-appb-C000002
(-AEQ 12 -) e1 C(R 2 ) 4-e1-e2 (-Q 22 -) e2 ...(g2-2)
-AEQ 13 -N(-Q 23 -) 2 ... (g2-3)
(-A-E-Q 14 - ) h1 Z (-Q 24 -) h2 ··· (g2-4)
(-AEQ 15 -) i1 Si(R 3 ) 4-i1-i2 (-Q 25 -) i2 ...(g2-5)
-AEQ 26 -... (g2-6)
-AE (-Q 27 -) 2 ...(g2-7)
However,
In formulas (g2-1) to (g2-7), the A side is connected to R f or Q f , and the Q 22 , Q 23 , Q 24 , Q 25 , Q 26, and Q 27 sides are connected to T,
A is a single bond or an alkylene group,
E is a site in which two or more of the polar groups are bonded in series via a divalent organic group having 1 to 20 carbon atoms, and in the formula (g2-7), the polar group at the terminal on the Q 27 side is represented by Is C(OH), C(OR 4 ), P(O), S(O), C[OP(O)(OR 3 ) 2 ], C[OS(O) 2 R 3 ] or C[OC( O) R 3 ],
Q 11 is a single bond, —O—, an alkylene group, or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms,
Q 12 is a single bond or an alkylene group, if Q 1 or Q 2 has a Q 12 2 or more, two or more Q 12 may be the same or different and
Q 13 is an alkylene group,
Q 14 is Q 12 when the atom in Z to which Q 14 is bonded is a carbon atom, Q 13 when the atom in Z to which Q 14 is bonded is a nitrogen atom, and Q 1 or Q 2 is Q 14 When two or more are present, two or more Q 14's may be the same or different,
Q 15 is an alkylene group, if Q 1 or Q 2 has a Q 15 2 or more, two or more Q 15 may be the same or different and
Q 22 is an alkylene group, a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms, a group having —O— at an end of the alkylene group which is not connected to Si, or a group having 2 carbon atoms. A group having -O- between the carbon-carbon atoms of the above alkylene group and having -O- at the terminal on the side not connected to Si, and two or more Q 22 s may be the same or different. Often,
Q 23 is an alkylene group or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms, and two Q 23 may be the same or different,
Q 24 is Q 22 when the atom in Z to which Q 24 is bonded is a carbon atom, is Q 23 when the atom in Z to which Q 24 is bonded is a nitrogen atom, and two or more Q 24 are the same. May or may not be
Q 25 is an alkylene group or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms, and 2 or more Q 25 may be the same or different,
Q 26 is an alkylene group or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms,
Q 27 is an alkylene group or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms, and two Q 27 may be the same or different,
Z is a group having an a1+b1 valent or a2+b2+1 valent ring structure having a carbon atom or a nitrogen atom to which Q 14 directly bonds and a carbon atom or a nitrogen atom to which Q 24 directly bonds,
R 1 is a hydrogen atom or an alkyl group, if Q 1 or Q 2 has the R 1 2 or more, 2 or more of R 1 may be the same or different and
R 2 is a hydrogen atom or an alkyl group,
R 3 is an alkyl group,
d1 is an integer of 0 to 3, d2 is an integer of 0 to 3, d1+d2 is an integer of 1 to 3,
d3 is an integer of 0 to 3, d4 is an integer of 0 to 3, d3+d4 is an integer of 1 to 3,
d1+d3 is an integer of 1 to 5, d2+d4 is an integer of 1 to 5,
e1 is an integer of 1 to 3, e2 is an integer of 1 to 3, and e1+e2 is 3 or 4,
h1 is an integer of 1 or more, h2 is an integer of 1 or more,
i1 is an integer of 1 to 3, i2 is an integer of 1 to 3, and i1+i2 is 3 or 4.
 [6]含フッ素化合物が前記式(1A)で表される化合物である、[2]~[5]のいずれかの含フッ素化合物。
 [7]前記[1]~[6]のいずれかの含フッ素化合物の1種以上と、他の含フッ素化合物とを含むことを特徴とする含フッ素化合物含有組成物。
 [8]前記[1]~[6]のいずれかの含フッ素化合物又は[7]の含フッ素化合物含有組成物と、液状媒体とを含むことを特徴とするコーティング液。
 [9]前記[1]~[6]のいずれかの含フッ素化合物又は[7]の含フッ素化合物含有組成物から形成された表面層を基材の表面に有することを特徴とする物品。
 [10]タッチパネルの指で触れる面を構成する部材の表面に前記表面層を有する、[9]の物品。
 [11]前記[1]~[6]のいずれかの含フッ素化合物又は[7]の含フッ素化合物含有組成物を用いたドライコーティング法によって基材の表面を処理して、前記含フッ素化合物又は前記含フッ素化合物含有組成物から形成された表面層を前記基材の表面に形成することを特徴とする物品の製造方法。
 [12]ウェットコーティング法によって[8]のコーティング液を基材の表面に塗布し、乾燥させて、前記含フッ素化合物又は前記含フッ素化合物含有組成物から形成された表面層を前記基材の表面に形成することを特徴とする物品の製造方法。
[6] The fluorinated compound according to any one of [2] to [5], wherein the fluorinated compound is a compound represented by the above formula (1A).
[7] A fluorine-containing compound-containing composition comprising at least one fluorine-containing compound according to any one of the above [1] to [6] and another fluorine-containing compound.
[8] A coating liquid comprising the fluorine-containing compound according to any one of [1] to [6] or the fluorine-containing compound-containing composition according to [7] and a liquid medium.
[9] An article having a surface layer formed from the fluorine-containing compound according to any one of [1] to [6] or the fluorine-containing compound-containing composition according to [7] on the surface of a substrate.
[10] The article according to [9], which has the surface layer on the surface of a member that constitutes the surface of the touch panel that is touched by the finger.
[11] The fluorine-containing compound or the fluorine-containing compound of any one of [1] to [6] is treated by a dry coating method using the fluorine-containing compound-containing composition of [7]. A method for producing an article, comprising forming a surface layer formed from the composition containing a fluorine-containing compound on the surface of the substrate.
[12] The coating liquid of [8] is applied to the surface of the substrate by the wet coating method and dried to form a surface layer formed from the fluorine-containing compound or the fluorine-containing compound-containing composition on the surface of the substrate. A method for manufacturing an article, comprising:
 [13]下式(2A)で表される化合物又は下式(2B)で表される化合物である、含フッ素化合物。
 [R-]a110[-CH=CHb1 ・・・(2A)
 [CH=CH-]b2[R-]a220-Q-Q20[-Ra2[-CH=CHb2 ・・・(2B)
 ただし、
  Rは、フルオロアルキル基(ただし、Q10及びQ20側の末端の炭素原子には少なくとも1個のフッ素原子が結合する。)、又は炭素数2以上のフルオロアルキル基の炭素-炭素原子間に-O-を有する基(ただし、Q10及びQ20側の末端の炭素原子には少なくとも1個のフッ素原子が結合する。)であり、
  Qは、フルオロアルキレン基(ただし、Q20側の末端の炭素原子には少なくとも1個のフッ素原子が結合する。)、又は炭素数2以上のフルオロアルキレン基の炭素-炭素原子間に-O-を有する基(ただし、Q20側の末端の炭素原子には少なくとも1個のフッ素原子が結合する。)であり、
  Q10は、2個以上の極性基が炭素数1~20の2価の有機基を介して直列に結合した部位を有するa1+b1価の連結基であり、
  Q20は、2個以上の極性基が炭素数1~20の2価の有機基を介して直列に結合した部位を有するa2+b2+1価の連結基であり、2個のQ20は同一であっても異なっていてもよく、
  前記極性基が、C(O)NH、NHC(O)、NH、NHC(O)NH、NHC(S)NH、S(O)NH、NHS(O)、C(O)、C(OH)、C(OR)、P(O)、S(O)、C[OP(O)(OR]、C[OS(O)]及びC[OC(O)R](ただし、Rは、アルキル基である。)からなる群から選ばれる極性基であり、
  a1は、1以上の整数であり、a2は、0以上の整数であり、2以上のRは同一であっても異なっていてもよく、
  b1及びb2は、それぞれ1以上の整数である。
 [14]前記極性基が、C(O)NH、NHC(O)、S(O)NH又はNHS(O)である、[13]の含フッ素化合物。
[13] A fluorine-containing compound which is a compound represented by the following formula (2A) or a compound represented by the following formula (2B).
[R f −] a1 Q 10 [—CH═CH 2 ] b1 ... (2A)
[CH 2 =CH-] b2 [R f -] a2 Q 20 -Q f -Q 20 [-R f ] a2 [-CH=CH 2 ] b2 (2B)
However,
R f is a fluoroalkyl group (provided that at least one fluorine atom is bonded to the terminal carbon atom on the Q 10 and Q 20 side) or a carbon-carbon atom of a fluoroalkyl group having 2 or more carbon atoms. Is a group having —O— (provided that at least one fluorine atom is bonded to the terminal carbon atom on the Q 10 and Q 20 side).
Q f represents a fluoroalkylene group (provided that at least one fluorine atom is bonded to the terminal carbon atom on the Q 20 side), or —O between carbon-carbon atoms of a fluoroalkylene group having 2 or more carbon atoms. A group having -(provided that at least one fluorine atom is bonded to the terminal carbon atom on the Q 20 side),
Q 10 is an a1+b1 valent linking group having a site in which two or more polar groups are bonded in series via a divalent organic group having 1 to 20 carbon atoms,
Q 20 is an a2+b2+1 valent linking group having a site in which two or more polar groups are connected in series via a divalent organic group having 1 to 20 carbon atoms, and the two Q 20 are the same. May be different,
The polar group is C(O)NH, NHC(O), NH, NHC(O)NH, NHC(S)NH, S(O) 2 NH, NHS(O) 2 , C(O), C( OH), C(OR 4 ), P(O), S(O), C[OP(O)(OR 4 ) 2 ], C[OS(O) 2 R 4 ] and C[OC(O)R. 4 ] (wherein R 4 is an alkyl group) is a polar group selected from the group consisting of:
a1 is an integer of 1 or more, a2 is an integer of 0 or more, and R f of 2 or more may be the same or different,
b1 and b2 are each an integer of 1 or more.
[14] The fluorine-containing compound according to [13], wherein the polar group is C(O)NH, NHC(O), S(O) 2 NH or NHS(O) 2 .
 本発明の含フッ素化合物によれば、指紋汚れ除去性及び耐摩擦性に優れる表面層を形成できる。
 本発明の含フッ素化合物含有組成物によれば、指紋汚れ除去性及び耐摩擦性に優れる表面層を形成できる。
 本発明のコーティング液によれば、指紋汚れ除去性及び耐摩擦性に優れる表面層を形成できる。
 本発明の物品は、指紋汚れ除去性及び耐摩擦性に優れる表面層を有する。
 本発明の物品の製造方法によれば、指紋汚れ除去性及び耐摩擦性に優れる表面層を有する物品を製造できる。
According to the fluorine-containing compound of the present invention, it is possible to form a surface layer having excellent fingerprint stain removability and abrasion resistance.
According to the composition containing a fluorine-containing compound of the present invention, a surface layer having excellent fingerprint stain removability and abrasion resistance can be formed.
According to the coating liquid of the present invention, a surface layer having excellent fingerprint stain removability and abrasion resistance can be formed.
The article of the present invention has a surface layer having excellent fingerprint stain removability and abrasion resistance.
According to the method for producing an article of the present invention, an article having a surface layer having excellent fingerprint stain removability and abrasion resistance can be produced.
 本明細書において、式(1A)で表される化合物を化合物(1A)と記す。他の式で表される化合物も同様に記す。
 また、式(g1a)で表される基を基(g1a)と記す。他の式で表される基も同様に記す。
 オキシフルオロアルキレン単位の化学式は、その酸素原子をフルオロアルキレン基の左側に記載して表すものとする。
 本明細書における以下の用語の意味は、以下の通りである。
 「反応性シリル基」とは、加水分解性シリル基及びシラノール基(Si-OH)の総称である。反応性シリル基は、例えば式(1A)又は式(1B)中のT(-Si(R)3-c(L))である。
 「加水分解性シリル基」とは、加水分解反応してシラノール基を形成し得る基を意味する。
 「表面層」とは、基材の表面に形成される層を意味する。
 含フッ素化合物が、フルオロポリエーテル鎖の鎖長が異なる複数の含フッ素化合物の混合物である場合、含フッ素有機基の「分子量」は、H-NMR及び19F-NMRによって、末端基を基準にしてオキシフルオロアルキレン単位の数(平均値)を求めて算出される数平均分子量である。末端基としては、例えば、式(g1a)中のRf1、式(1A)及び式(1B)中のTが挙げられる。
 含フッ素化合物が、含フッ素有機基(RやQ)の鎖長が単一の含フッ素化合物である場合、含フッ素有機基の「分子量」は、H-NMR及び19F-NMRによってRの構造を決定して算出される分子量である。
In the present specification, the compound represented by the formula (1A) is referred to as the compound (1A). The same applies to compounds represented by other formulas.
The group represented by the formula (g1a) is referred to as a group (g1a). The groups represented by other formulas will be described in the same manner.
The chemical formula of the oxyfluoroalkylene unit shall be represented by describing its oxygen atom on the left side of the fluoroalkylene group.
The meanings of the following terms in the present specification are as follows.
“Reactive silyl group” is a general term for hydrolyzable silyl groups and silanol groups (Si—OH). The reactive silyl group is, for example, T(-Si(R) 3-c (L) c ) in formula (1A) or formula (1B).
The “hydrolyzable silyl group” means a group capable of undergoing a hydrolysis reaction to form a silanol group.
"Surface layer" means a layer formed on the surface of a substrate.
When the fluorine-containing compound is a mixture of a plurality of fluorine-containing compounds having different fluoropolyether chain lengths, the “molecular weight” of the fluorine-containing organic group is based on 1 H-NMR and 19 F-NMR, based on the end group. Is the number average molecular weight calculated by obtaining the number (average value) of oxyfluoroalkylene units. Examples of the terminal group include R f1 in formula (g1a) and T in formula (1A) and formula (1B).
When the fluorine-containing compound is a fluorine-containing compound having a single chain length of a fluorine-containing organic group (R f or Q f ), the “molecular weight” of the fluorine-containing organic group is 1 H-NMR and 19 F-NMR. It is a molecular weight calculated by determining the structure of R f .
[含フッ素化合物]
 本発明の含フッ素化合物(以下、「本化合物」とも記す。)は、1価又は2価の含フッ素有機基と、反応性シリル基と、含フッ素有機基と反応性シリル基とを連結する特定の連結基とを有する。すなわち、本化合物は、「1価の含フッ素有機基-連結基-反応性シリル基」の構造を有する化合物であってもよく、「反応性シリル基-連結基-2価の含フッ素有機基-連結基-反応性シリル基」の構造を有する化合物であってもよい。
[Fluorine-containing compound]
The fluorine-containing compound of the present invention (hereinafter, also referred to as “the present compound”) connects a monovalent or divalent fluorine-containing organic group, a reactive silyl group, and a fluorine-containing organic group with a reactive silyl group. It has a specific linking group. That is, the compound may be a compound having a structure of "monovalent fluorine-containing organic group-linking group-reactive silyl group", and "reactive silyl group-linking group-divalent fluorine-containing organic group" It may be a compound having a structure of "linking group-reactive silyl group".
 本化合物は、含フッ素有機基を有する。含フッ素有機基を有する本化合物は、表面層の指紋汚れ除去性に優れる。
 本化合物は、少なくとも片側の末端に反応性シリル基を有する。末端に反応性シリル基を有する本化合物は、基材と強固に化学結合するため、表面層の耐摩擦性に優れる。
 また、本化合物としては、一方の末端のみに反応性シリル基を有する化合物が好ましい。一方の末端のみに反応性シリル基を有する化合物は凝集しにくいため、表面層の外観に優れる。また、表面層の耐摩擦性及び指紋汚れ除去性にも優れる。
This compound has a fluorine-containing organic group. The present compound having a fluorine-containing organic group is excellent in removing fingerprint stains on the surface layer.
The compound has a reactive silyl group at least at one end. Since the present compound having a reactive silyl group at the terminal chemically bonds strongly to the base material, the surface layer has excellent abrasion resistance.
Further, as the present compound, a compound having a reactive silyl group only at one end is preferable. A compound having a reactive silyl group only at one end is less likely to aggregate, so that the appearance of the surface layer is excellent. Also, the surface layer has excellent abrasion resistance and fingerprint stain removability.
 1価の含フッ素有機基としては、フルオロアルキル基、1価のフルオロポリエーテル鎖等が挙げられる。2価の含フッ素有機基としては、フルオロアルキレン基、2価のフルオロポリエーテル鎖等が挙げられる。フルオロポリエーテル鎖は、フルオロアルキル基の炭素-炭素原子間に-O-を複数個有する基である。フルオロポリエーテル鎖は、通常、オキシフルオロアルキレン単位を有する。
 含フッ素有機基としては、表面層の指紋汚れ除去性がさらに優れる点から、フルオロポリエーテル鎖が好ましい。含フッ素有機基としては、表面層の耐摩擦性及び指紋汚れ除去性がさらに優れる点から、ペルフルオロポリエーテル鎖がより好ましい。
Examples of the monovalent fluorine-containing organic group include a fluoroalkyl group and a monovalent fluoropolyether chain. Examples of the divalent fluorine-containing organic group include a fluoroalkylene group and a divalent fluoropolyether chain. The fluoropolyether chain is a group having a plurality of —O— between carbon-carbon atoms of the fluoroalkyl group. Fluoropolyether chains usually have oxyfluoroalkylene units.
As the fluorine-containing organic group, a fluoropolyether chain is preferable because the surface layer is more excellent in removing fingerprint stains. As the fluorine-containing organic group, a perfluoropolyether chain is more preferable because the abrasion resistance of the surface layer and the fingerprint stain removability are further excellent.
 含フッ素有機基の分子量は、表面層の指紋汚れ除去性及び耐滑り性を両立する点から、50~1000が好ましく、100~900がより好ましく、200~800が特に好ましい。含フッ素有機基の分子量が前記範囲の下限値以上であれば、表面層の指紋汚れ除去性がさらに優れる。含フッ素有機基の分子量が前記範囲の上限値以下であれば、表面層の耐滑り性がさらに優れる。
 含フッ素有機基の分子量は、表面層の耐摩擦性及び指紋汚れ除去性がさらに優れる点からは、1500~10000が好ましく、2000~8000がより好ましく、2500~6000が特に好ましい。含フッ素有機基の分子量が前記範囲の下限値以上であれば、表面層の耐摩擦性及び指紋汚れ除去性がさらに優れる。含フッ素有機基の分子量が前記範囲の上限値以下であれば、表面層の耐摩擦性がさらに優れる。
The molecular weight of the fluorine-containing organic group is preferably 50 to 1000, more preferably 100 to 900, and particularly preferably 200 to 800, from the viewpoint of achieving both fingerprint stain removability and slip resistance of the surface layer. When the molecular weight of the fluorine-containing organic group is at least the lower limit value of the above range, the fingerprint stain removability of the surface layer will be further excellent. When the molecular weight of the fluorinated organic group is at most the upper limit value of the above range, the slip resistance of the surface layer will be further excellent.
The molecular weight of the fluorine-containing organic group is preferably 1500 to 10000, more preferably 2000 to 8000, and particularly preferably 2500 to 6000, from the viewpoint that the abrasion resistance of the surface layer and the fingerprint stain removability are further excellent. When the molecular weight of the fluorine-containing organic group is at least the lower limit value of the above range, the abrasion resistance and fingerprint stain removability of the surface layer are further excellent. When the molecular weight of the fluorine-containing organic group is at most the upper limit value of the above range, the abrasion resistance of the surface layer will be further excellent.
 反応性シリル基は、加水分解性基及び水酸基のいずれか一方又は両方がケイ素原子に結合した基である。
 加水分解性基は、加水分解反応によって水酸基となる基である。すなわち、加水分解性シリル基は、加水分解反応によってシラノール基(Si-OH)となる。シラノール基は、さらに分子間で脱水縮合反応してSi-O-Si結合を形成する。また、シラノール基は、基材の表面の水酸基(基材-OH)と脱水縮合反応して、化学結合(基材-O-Si)を形成する。
 加水分解性基としては、アルコキシ基、アリールオキシ基、ハロゲン原子、アシル基、アシルオキシ基、イソシアナート基等が挙げられる。アルコキシ基としては、炭素数1~6のアルコキシ基が好ましい。アリールオキシ基としては、炭素数3~10のアリールオキシ基が好ましい。ただしアリールオキシ基のアリール基としては、ヘテロアリール基を含む。ハロゲン原子としては、塩素原子が好ましい。アシル基としては、炭素数1~6のアシル基が好ましい。アシルオキシ基としては、炭素数1~6のアシルオキシ基が好ましい。
 加水分解性基としては、本化合物を製造しやすい点から、アルコキシ基およびハロゲン原子が好ましい。加水分解性基としては、塗布時のアウトガスが少なく、本化合物の保存安定性に優れる点から、炭素数1~4のアルコキシ基が好ましく、本化合物の長期の保存安定性が必要な場合にはエトキシ基が特に好ましく、コーティング後の反応時間を短時間とする場合にはメトキシ基が特に好ましい。
The reactive silyl group is a group in which one or both of a hydrolyzable group and a hydroxyl group are bonded to a silicon atom.
The hydrolyzable group is a group that becomes a hydroxyl group by a hydrolysis reaction. That is, the hydrolyzable silyl group becomes a silanol group (Si—OH) by the hydrolysis reaction. The silanol group further undergoes a dehydration condensation reaction between molecules to form a Si—O—Si bond. Further, the silanol group undergoes a dehydration condensation reaction with a hydroxyl group (base material-OH) on the surface of the base material to form a chemical bond (base material-O-Si).
Examples of the hydrolyzable group include an alkoxy group, an aryloxy group, a halogen atom, an acyl group, an acyloxy group and an isocyanate group. As the alkoxy group, an alkoxy group having 1 to 6 carbon atoms is preferable. The aryloxy group is preferably an aryloxy group having 3 to 10 carbon atoms. However, the aryl group of the aryloxy group includes a heteroaryl group. The halogen atom is preferably a chlorine atom. As the acyl group, an acyl group having 1 to 6 carbon atoms is preferable. The acyloxy group is preferably an acyloxy group having 1 to 6 carbon atoms.
As the hydrolyzable group, an alkoxy group and a halogen atom are preferable from the viewpoint of easy production of the present compound. As the hydrolyzable group, an alkoxy group having 1 to 4 carbon atoms is preferable from the viewpoint of less outgas at the time of application and excellent storage stability of the present compound, and when long-term storage stability of the present compound is required An ethoxy group is particularly preferable, and a methoxy group is particularly preferable when the reaction time after coating is short.
 連結基は、2個以上の極性基が炭素数1~20の2価の有機基を介して直列に結合した部位(以下、「極性部位E」とも記す。)を有する基である。ここで「極性基と極性基が直列に結合する」とは、極性基と極性基との間に、特定分岐鎖を有さないことをいう。この特定分岐鎖とは、含フッ素有機基又は反応性シリル基をその鎖内に有する鎖をいう。特に連結基が後述する分岐点PまたはP’を有する場合、含フッ素有機基から、分岐点Pまでの間に、極性部位Eを有することを意味する。なお極性基自体が分岐点P又はP’であってもよい。
 極性基は、C(O)NH、NHC(O)、NH、NHC(O)NH、NHC(S)NH、S(O)NH、NHS(O)、C(O)、C(OH)、C(OR)、P(O)、S(O)、C[OP(O)(OR]、C[OS(O)]及びC[OC(O)R]からなる群から選ばれる極性基である。
 ただし、Rはアルキル基である。このアルキル基の炭素数は1~3が好ましく、1が特に好ましい。
 また、連結基は、上記極性基を2種以上有していてもよい。
The linking group is a group having a site in which two or more polar groups are bonded in series via a divalent organic group having 1 to 20 carbon atoms (hereinafter, also referred to as “polar site E”). Here, "polar group and polar group are bonded in series" means that the polar group and the polar group do not have a specific branched chain. The specific branched chain means a chain having a fluorine-containing organic group or a reactive silyl group in the chain. In particular, when the linking group has a branch point P or P′ described later, it means that a polar moiety E is provided between the fluorine-containing organic group and the branch point P. The polar group itself may be the branch point P or P′.
Polar groups include C(O)NH, NHC(O), NH, NHC(O)NH, NHC(S)NH, S(O) 2 NH, NHS(O) 2 , C(O), C(OH ), C(OR 4 ), P(O), S(O), C[OP(O)(OR 4 ) 2 ], C[OS(O) 2 R 4 ], and C[OC(O)R 4 ] A polar group selected from the group consisting of
However, R 4 is an alkyl group. The alkyl group preferably has 1 to 3 carbon atoms, and 1 is particularly preferable.
Moreover, the linking group may have two or more types of the polar groups.
 極性基は、-NH-を有するグループIと、これ以外のグループIIとに分類される。
 グループIの極性基としては、本化合物を製造しやすい点、及び水素結合性が強く、表面層の耐摩擦性がさらに優れる点からは、C(O)NH、NHC(O)、S(O)NH及びNHS(O)が好ましく、C(O)NH及びNHC(O)が特に好ましい。
 グループIの極性基としては、表面層の耐滑り性がさらに優れる点からは、NHC(O)NH及びNHC(S)NHが好ましく、NHC(O)NHが特に好ましい。
The polar group is classified into a group I having —NH— and a group II other than this.
As the polar group of Group I, C(O)NH, NHC(O), S(O), S(O)NH, NHC(O), S(O) ) 2 NH and NHS(O) 2 are preferred, and C(O)NH and NHC(O) are particularly preferred.
As the polar group of Group I, NHC(O)NH and NHC(S)NH are preferable, and NHC(O)NH is particularly preferable, from the viewpoint that the slip resistance of the surface layer is further excellent.
 グループIの極性基と組み合わされる2価の有機基としては、2価の脂肪族炭化水素基(アルキレン基、シクロアルキレン基等)、2価の芳香族炭化水素基(フェニレン基等)、これらの組み合わせ等が挙げられ、2価の脂肪族炭化水素基が好ましく、アルキレン基が特に好ましい。アルキレン基は、直鎖状であってもよく、分岐状であってもよく、直鎖状であることが好ましい。2価の脂肪族炭化水素基は置換基(チオール基、チオエーテル基、フェニル基、ピロリジン基、インドリル基、ハロゲン原子等)を有してもよい。2価の芳香族炭化水素基は、置換基(アルキル基、水酸基、ハロゲン原子等)を有してもよい。2価の有機基の炭素数は、1~10が好ましく、1~5がより好ましく、1又は2が特に好ましい。
 グループIの極性基と組み合わされる有機基としては、本化合物を製造しやすい点から、アミノ酸からアミノ基及びカルボキシ基を除いた基が好ましい。アミノ酸としては、本化合物を製造しやすい点、及び表面層の耐摩擦性及び耐滑り性がさらに優れる点から、グリシン及びβ-アラニンが好ましい。
Examples of the divalent organic group to be combined with the polar group I include divalent aliphatic hydrocarbon groups (alkylene group, cycloalkylene group, etc.), divalent aromatic hydrocarbon groups (phenylene group, etc.), A combination thereof and the like can be mentioned, and a divalent aliphatic hydrocarbon group is preferable, and an alkylene group is particularly preferable. The alkylene group may be linear or branched, and is preferably linear. The divalent aliphatic hydrocarbon group may have a substituent (thiol group, thioether group, phenyl group, pyrrolidine group, indolyl group, halogen atom, etc.). The divalent aromatic hydrocarbon group may have a substituent (alkyl group, hydroxyl group, halogen atom, etc.). The carbon number of the divalent organic group is preferably 1 to 10, more preferably 1 to 5, and particularly preferably 1 or 2.
As the organic group to be combined with the polar group of Group I, a group obtained by removing an amino group and a carboxy group from an amino acid is preferable from the viewpoint of easy production of the present compound. As the amino acid, glycine and β-alanine are preferable from the viewpoint of easy production of the present compound and the further excellent abrasion resistance and slip resistance of the surface layer.
 グループIの極性基を有する極性部位Eにおける極性基の数は、表面層の耐摩擦性がさらに優れる点からは、多ければ多いほどよく、本化合物を製造しやすい点からは、2~5が好ましく、2又は3が特に好ましい。
 グループIの極性基を有する極性部位Eとしては、例えば、下記のものが挙げられる。ただし、Qは、2価の有機基である。Qの炭素数としては、1~10が好ましく、1~5がより好ましく、1又は2が特に好ましい。Qの炭素数が1の場合、極性部位Eは例えばグリシンから誘導される。Qの炭素数が2の場合、極性部位Eは例えばβ-アラニンから誘導される。
 -C(O)NH-Q-C(O)NH-、
 -C(O)NH-Q-C(O)NH-Q-C(O)NH-、
 -NH-Q-NH-、
 -NH-Q-NH-Q-NH-、
 -NHC(O)NH-Q-C(O)NH-、
 -NHC(S)NH-Q-C(O)NH-、
 -S(O)NH-Q-C(O)NH-。
The number of polar groups in the polar moiety E having a polar group of Group I is preferably as large as possible from the viewpoint that the abrasion resistance of the surface layer is further excellent, and is 2 to 5 from the viewpoint of easy production of the present compound. Preferred is 2 or 3, and particularly preferred.
Examples of the polar moiety E having a polar group of group I include the following. However, Q 4 is a divalent organic group. The carbon number of Q 4 is preferably 1 to 10, more preferably 1 to 5, and particularly preferably 1 or 2. When the carbon number of Q 4 is 1, the polar site E is derived from glycine, for example. When the carbon number of Q 4 is 2, the polar site E is derived from β-alanine, for example.
-C(O)NH-Q 4 -C(O)NH-,
-C(O)NH-Q 4 -C(O)NH-Q 4 -C(O)NH-,
-NH-Q 4 -NH-,
-NH-Q 4 -NH-Q 4 -NH-,
-NHC(O)NH-Q 4 -C(O)NH-,
-NHC(S)NH-Q 4 -C(O)NH-,
-S (O) 2 NH-Q 4 -C (O) NH-.
 グループIIの極性基としては、表面層の耐摩擦性及び耐滑り性がさらに優れる点から、C[OP(O)(OR]及びC[OS(O)]が好ましく、C[OP(O)(OR]が特に好ましい。
 グループIIの極性基と組み合わされる2価の有機基としては、2価の脂肪族炭化水素基(アルキレン基、シクロアルキレン基等)、2価の芳香族炭化水素基(フェニレン基等)、これらの組み合わせ等が挙げられ、2価の脂肪族炭化水素基が好ましく、アルキレン基が特に好ましい。アルキレン基は、直鎖状であってもよく、分岐状であってもよく、直鎖状が好ましい。2価の有機基の炭素数は、1~10が好ましく、1~5がより好ましく、1又は2が特に好ましい。
As the polar group of Group II, C[OP(O)(OR 4 ) 2 ] and C[OS(O) 2 R 4 ] are preferable, since the surface layer is more excellent in abrasion resistance and slip resistance. C[OP(O)(OR 4 ) 2 ] is particularly preferred.
Examples of the divalent organic group to be combined with the polar group of Group II include a divalent aliphatic hydrocarbon group (alkylene group, cycloalkylene group, etc.), a divalent aromatic hydrocarbon group (phenylene group, etc.), A combination thereof and the like can be mentioned, and a divalent aliphatic hydrocarbon group is preferable, and an alkylene group is particularly preferable. The alkylene group may be linear or branched, and is preferably linear. The carbon number of the divalent organic group is preferably 1 to 10, more preferably 1 to 5, and particularly preferably 1 or 2.
 グループIIの極性基を有する極性部位Eにおける極性基の数は、本化合物を製造しやすい点からは、2が特に好ましい。
 グループIIの極性基を有する極性部位Eとしては、例えば、下記のものが挙げられる。ただし、Qは、2価の有機基である。
 -C(O)-Q-C(OH)<、
 -CH(OH)-Q-C(OH)<、
 -CH[OP(O)(OR]-Q-C[OP(O)(OR]<、
 -CH[OS(O)]-Q-C[OS(O)]<、
 -CH[OC(O)R]-Q-C[OC(O)R]<。
The number of polar groups in the polar moiety E having a polar group of Group II is particularly preferably 2 from the viewpoint of easy production of the present compound.
Examples of the polar moiety E having a polar group II are as follows. However, Q 4 is a divalent organic group.
-C(O)-Q 4 -C(OH)<,
-CH(OH)-Q 4 -C(OH)<,
-CH[OP(O)(OR 4 ) 2 ]-Q 4 -C[OP(O)(OR 4 ) 2 ]<,
-CH[OS(O) 2 R 4 ]-Q 4 -C[OS(O) 2 R 4 ]<,
-CH[OC(O)R 4 ]-Q 4 -C[OC(O)R 4 ]<.
 本化合物としては、表面層の耐摩擦性及び指紋汚れ除去性がさらに優れる点から、化合物(1A)及び化合物(1B)が好ましい。以下、化合物(1A)及び化合物(1B)を総称して化合物(1)とも記す。
 [R-]a1[-T]b1 ・・・(1A)
 [T-]b2[R-]a2-Q-Q[-Ra2[-T]b2 ・・・(1B)
 ただし、Rは、フルオロアルキル基(ただし、Q及びQ側の末端の炭素原子には少なくとも1個のフッ素原子が結合する。)、又は炭素数2以上のフルオロアルキル基の炭素-炭素原子間に-O-を有する基(ただし、Q及びQ側の末端の炭素原子には少なくとも1個のフッ素原子が結合する。)である。Qは、フルオロアルキレン基(ただし、Q側の末端の炭素原子には少なくとも1個のフッ素原子が結合する。)、又は炭素数2以上のフルオロアルキレン基の炭素-炭素原子間に-O-を有する基(ただし、Q側の末端の炭素原子には少なくとも1個のフッ素原子が結合する。)である。Qは、2個以上の極性基が炭素数1~20の2価の有機基を介して直列に結合した部位を有するa1+b1価の連結基である。Qは、2個以上の極性基が炭素数1~20の2価の有機基を介して直列に結合した部位を有するa2+b2+1価の連結基であり、2個のQは同一であっても異なっていてもよい。前記極性基は、C(O)NH、NHC(O)、NH、NHC(O)NH、NHC(S)NH、S(O)NH、NHS(O)、C(O)、C(OH)、C(OR)、P(O)、S(O)、C[OP(O)(OR]、C[OS(O)]及びC[OC(O)R](ただし、Rは、アルキル基である。)からなる群から選ばれる極性基である。Tは、-Si(R)3-c(L)であり、Rは、アルキル基であり、Lは、加水分解性基又は水酸基であり、cは、2又は3であり、2以上のLは同一であっても異なっていてもよい。a1は、1以上の整数であり、a2は、0以上の整数であり、2以上のRは同一であっても異なっていてもよい。b1及びb2は、それぞれ1以上の整数であり、2以上のTは同一であっても異なっていてもよい。
As the present compound, the compound (1A) and the compound (1B) are preferable because the abrasion resistance of the surface layer and the fingerprint stain removability are further excellent. Hereinafter, the compound (1A) and the compound (1B) are also collectively referred to as the compound (1).
[R f −] a1 Q 1 [−T] b1 ... (1A)
[T−] b2 [R f −] a2 Q 2 −Q f −Q 2 [−R f ] a2 [−T] b2 (1B)
However, R f is a fluoroalkyl group (provided that at least one fluorine atom is bonded to the terminal carbon atom on the Q 1 and Q 2 side) or a carbon-carbon of a fluoroalkyl group having 2 or more carbon atoms. A group having —O— between atoms (provided that at least one fluorine atom is bonded to the terminal carbon atom on the Q 1 and Q 2 side). Q f represents a fluoroalkylene group (provided that at least one fluorine atom is bonded to the terminal carbon atom on the Q 2 side), or —O between carbon-carbon atoms of a fluoroalkylene group having 2 or more carbon atoms. A group having-(provided that at least one fluorine atom is bonded to the terminal carbon atom on the Q 2 side). Q 1 is an a1+b1 valent linking group having a site in which two or more polar groups are bonded in series via a divalent organic group having 1 to 20 carbon atoms. Q 2 is an a2+b2+1 valent linking group having a site in which two or more polar groups are bonded in series via a divalent organic group having 1 to 20 carbon atoms, and the two Q 2 are the same. May also be different. The polar group includes C(O)NH, NHC(O), NH, NHC(O)NH, NHC(S)NH, S(O) 2 NH, NHS(O) 2 , C(O), C( OH), C(OR 4 ), P(O), S(O), C[OP(O)(OR 4 ) 2 ], C[OS(O) 2 R 4 ] and C[OC(O)R. 4 ] (wherein R 4 is an alkyl group) is a polar group selected from the group consisting of: T is —Si(R) 3-c (L) c , R is an alkyl group, L is a hydrolyzable group or a hydroxyl group, c is 2 or 3, and 2 or more L may be the same or different. a1 is an integer of 1 or more, a2 is an integer of 0 or more, and R f of 2 or more may be the same or different. b1 and b2 are each an integer of 1 or more, and Ts of 2 or more may be the same or different.
 化合物(1A)は、末端にRを有する。末端にRを有する化合物(1A)は、表面層の指紋汚れ除去性に優れる。化合物(1B)は、Qを有する。Qを有する化合物(1B)は、表面層の指紋汚れ除去性に優れる。
 化合物(1)は、末端に反応性シリル基を有する。末端に反応性シリル基を有する化合物(1)は、基材と強固に化学結合するため、表面層の耐摩擦性に優れる。
 また、前記のように、化合物(1B)と比較して、一方の末端のみに反応性シリル基を有する化合物である化合物(1A)は、凝集しにくいため表面層の外観に優れ、表面層の耐摩擦性及び指紋汚れ除去性にも優れることより、より好ましい。
The compound (1A) has R f at the terminal. The compound (1A) having R f at the terminal is excellent in removing fingerprint stains on the surface layer. The compound (1B) has Q f . The compound (1B) having Q f is excellent in removing fingerprint stains on the surface layer.
The compound (1) has a reactive silyl group at the terminal. The compound (1) having a reactive silyl group at the terminal has a strong chemical bond with the base material, and thus has excellent abrasion resistance of the surface layer.
In addition, as described above, the compound (1A), which is a compound having a reactive silyl group only at one terminal, is excellent in the appearance of the surface layer because it is less likely to aggregate, as compared with the compound (1B). It is more preferable because it is excellent in abrasion resistance and fingerprint stain removability.
 a1は、化合物(1A)を製造しやすい点、及び表面層の耐摩擦性及び指紋汚れ除去性がさらに優れる点から、1~6が好ましく、1~4がより好ましく、1又は2が特に好ましい。また、a1が2以上の場合、2以上のRは同一であることが好ましい。a2は、化合物(1B)を製造しやすい点、及び表面層の耐摩擦性及び指紋汚れ除去性がさらに優れる点から、0~6が好ましく、0~4がより好ましく、0~2が特に好ましい。また、a2が1以上の場合、化合物(1B)が含む2以上のRは同一であることが好ましい。
 b1は、化合物(1A)を製造しやすい点、及び表面層の耐摩擦性及び指紋汚れ除去性がさらに優れる点から、1~6が好ましく、1~5がより好ましく、1~4がさらに好ましく、2~4が特に好ましい。また、b1が2以上の場合、2以上のTは同一であることが好ましい。b2は、化合物(1B)を製造しやすい点、及び表面層の耐摩擦性及び指紋汚れ除去性がさらに優れる点から、1~6が好ましく、1~5がより好ましく、1~4がさらに好ましく、2~4が特に好ましい。また、化合物(1B)が含む2以上のTは同一であることが好ましい。
 また、化合物(1B)としては、それを製造しやすい点から、Qに結合する2つの[T-]b2[R-]a2-は同一の基であることが好ましい。
a1 is preferably 1 to 6, more preferably 1 to 4, and particularly preferably 1 or 2 from the viewpoint of easy production of the compound (1A) and further excellent abrasion resistance and fingerprint stain removability of the surface layer. . Further, when a1 is 2 or more, it is preferable that R f of 2 or more are the same. a2 is preferably 0 to 6, more preferably 0 to 4, and particularly preferably 0 to 2 from the viewpoint of easy production of the compound (1B) and the further excellent abrasion resistance and fingerprint stain removability of the surface layer. . Further, when a2 is 1 or more, it is preferable that two or more R f contained in the compound (1B) are the same.
b1 is preferably 1 to 6, more preferably 1 to 5, and still more preferably 1 to 4 from the viewpoint of easy production of the compound (1A) and further excellent abrasion resistance and fingerprint stain removability of the surface layer. 2 to 4 are particularly preferable. Further, when b1 is 2 or more, it is preferable that Ts of 2 or more are the same. b2 is preferably 1 to 6, more preferably 1 to 5, and further preferably 1 to 4 from the viewpoint that the compound (1B) can be easily produced and that the surface layer is more excellent in abrasion resistance and fingerprint stain removability. 2 to 4 are particularly preferable. Further, two or more T's contained in the compound (1B) are preferably the same.
Further, in the compound (1B), it is preferable that two [T-] b2 [R f -] a2 Q 2- bonded to Q f are the same group from the viewpoint of easy production thereof.
 Rは、1価の含フッ素有機基である。Rとしては、表面層の指紋汚れ除去性がさらに優れる点から、フルオロポリエーテル鎖が好ましい。Rとしては、表面層の耐摩擦性及び指紋汚れ除去性がさらに優れる点から、ペルフルオロポリエーテル鎖がより好ましい。
 Qは、2価の含フッ素有機基である。Qとしては、表面層の指紋汚れ除去性がさらに優れる点から、フルオロポリエーテル鎖が好ましい。Qとしては、表面層の耐摩擦性及び指紋汚れ除去性がさらに優れる点から、ペルフルオロポリエーテル鎖がより好ましい。
 R及びQの分子量の好ましい範囲は、上述した含フッ素有機基の分子量の好ましい範囲と同様である。
R f is a monovalent fluorine-containing organic group. As R f , a fluoropolyether chain is preferable because the fingerprint stain removability of the surface layer is further excellent. As R f , a perfluoropolyether chain is more preferable because the abrasion resistance of the surface layer and the fingerprint stain removability are further excellent.
Q f is a divalent fluorine-containing organic group. As Q f , a fluoropolyether chain is preferable because the surface layer is more excellent in removing fingerprint stains. As Q f , a perfluoropolyether chain is more preferable because the abrasion resistance of the surface layer and the fingerprint stain removability are further excellent.
The preferable range of the molecular weight of R f and Q f is the same as the preferable range of the molecular weight of the above-mentioned fluorine-containing organic group.
 Rとしては、例えば、基(g1a)が挙げられる。
 Rf1-(ORf2- ・・・(g1a)
 ただし、Rf1は、炭素数1~6のフルオロアルキル基(ただし、mが0の場合、Q又はQ側の末端の炭素原子には少なくとも1個のフッ素原子が結合する。)であり、Rf2は、炭素数1~6のフルオロアルキレン基(ただし、Q又はQに結合するRf2のQ又はQ側の末端の炭素原子には少なくとも1個のフッ素原子が結合する。)であり、mは、0以上の整数であり、mが2以上の場合、(ORf2は2種以上のORf2からなるものであってもよい。
Examples of R f include a group (g1a).
R f1 −(OR f2 ) m − (g1a)
However, R f1 is a fluoroalkyl group having 1 to 6 carbon atoms (however, when m is 0, at least one fluorine atom is bonded to the terminal carbon atom on the Q 1 or Q 2 side). , R f2 is a fluoroalkylene group having 1 to 6 carbon atoms (provided that at least one fluorine atom is attached to the Q 1 or Q 2 side terminal carbon atom of R f2 which bind to Q 1 or Q 2 .), m is an integer of 0 or more, and when m is 2 or more, (OR f2 ) m may be composed of two or more kinds of OR f2 .
 Qとしては、例えば、基(g1b)を有する基が挙げられる。
 -Rf2(ORf2m’- ・・・(g1b)
 ただし、Rf2は、炭素数1~6のフルオロアルキレン基(ただし、Q又はQ側の末端の炭素原子には少なくとも1個のフッ素原子が結合する。)であり、m’は、1以上の整数であり、m’が2以上の場合、(ORf2m’は2種以上のORf2からなるものであってもよい。
Examples of Q f include a group having a group (g1b).
-R f2 (OR f2 ) m' -... (g1b)
However, R f2 is a fluoroalkylene group having 1 to 6 carbon atoms (provided that at least one fluorine atom is bonded to the terminal carbon atom on the Q 1 or Q 2 side), and m′ is 1 It is the above integer, and when m′ is 2 or more, (OR f2 ) m′ may be composed of two or more kinds of OR f2 .
 Rf1の炭素数が1~6であれば、表面層の耐摩擦性及び指紋汚れ除去性がさらに優れる。Rf1のフルオロアルキル基の炭素数は、表面層の耐摩擦性及び指紋汚れ除去性がさらに優れる点から、1~4が好ましく、1~3が特に好ましい。
 Rf1としては、表面層の耐摩擦性及び指紋汚れ除去性がさらに優れる点から、ペルフルオロアルキル基が好ましい。Rf1がペルフルオロアルキル基である化合物(1A)は、末端がCF-となる。末端がCF-である化合物(1A)によれば、低表面エネルギーの表面層を形成できるため、表面層の耐摩擦性及び指紋汚れ除去性がさらに優れる。
 Rf1としては、CF-、CFCF-、CFCFCF-、CFCFCFCF-、CFCFCFCFCF-、CFCFCFCFCFCF-、CFCF(CF)-等が挙げられる。
When R f1 has 1 to 6 carbon atoms, the surface layer is more excellent in abrasion resistance and fingerprint stain removability. The carbon number of the fluoroalkyl group of R f1 is preferably 1 to 4 and particularly preferably 1 to 3 from the viewpoint that the abrasion resistance and fingerprint stain removability of the surface layer are further excellent.
R f1 is preferably a perfluoroalkyl group from the viewpoint that the surface layer is more excellent in abrasion resistance and fingerprint stain removability. In the compound (1A) in which R f1 is a perfluoroalkyl group, the terminal is CF 3 −. According to the compound (1A) having a CF 3 -terminal, a surface layer having a low surface energy can be formed, and therefore the abrasion resistance and fingerprint stain removability of the surface layer are further excellent.
R f1 includes CF 3 −, CF 3 CF 2 −, CF 3 CF 2 CF 2 −, CF 3 CF 2 CF 2 CF 2 −, CF 3 CF 2 CF 2 CF 2 CF 2 −, CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 —, CF 3 CF(CF 3 )— and the like.
 Rf2の炭素数が1~6であれば、表面層の耐摩擦性及び指紋汚れ除去性がさらに優れる。
 Rf2としては、表面層の耐摩擦性及び指紋汚れ除去性がさらに優れる点から、直鎖のフルオロアルキレン基が好ましい。
 Rf2としては、表面層の耐摩擦性及び指紋汚れ除去性がさらに優れる点から、ペルフルオロアルキレン基が好ましい。
 全Rf2のうちのペルフルオロアルキレン基の割合は、表面層の耐摩擦性及び指紋汚れ除去性がさらに優れる点から、60モル%以上が好ましく、80モル%以上がより好ましく、100モル%が特に好ましい。
When the carbon number of R f2 is 1 to 6, the abrasion resistance and fingerprint stain removability of the surface layer are further excellent.
As R f2 , a linear fluoroalkylene group is preferable because the abrasion resistance of the surface layer and the fingerprint stain removability are further excellent.
As R f2 , a perfluoroalkylene group is preferable because the abrasion resistance of the surface layer and the fingerprint stain removability are further excellent.
The proportion of perfluoroalkylene groups in the total R f2 is preferably 60 mol% or more, more preferably 80 mol% or more, and particularly preferably 100 mol% from the viewpoint that the abrasion resistance of the surface layer and the fingerprint stain removability are further excellent. preferable.
 表面層に充分な耐滑り性が求められる場合、mは、0~30の整数が好ましく、0~20の整数がより好ましく、0~10の整数が特に好ましい。mが前記範囲の上限値以下であれば、表面層の耐滑り性がさらに優れる。表面層に充分な耐滑り性が求められる場合、m’は、1~30の整数が好ましく、1~20の整数がより好ましく、1~10の整数が特に好ましい。m’が前記範囲の上限値以下であれば、表面層の耐滑り性がさらに優れる。
 表面層に充分な耐摩擦性及び指紋汚れ除去性が求められる場合、m及びm’は、2~200の整数が好ましく、5~150の整数がより好ましく、10~100の整数が特に好ましい。m及びm’が前記範囲の下限値以上であれば、表面層の耐摩擦性及び指紋汚れ除去性がさらに優れる。m及びm’が前記範囲の上限値以下であれば、表面層の耐摩擦性がさらに優れる。すなわち、化合物(1)の数平均分子量が大きすぎると、単位分子量あたりに存在する加水分解性シリル基の数が減少し、表面層の耐摩擦性が低下する。
When the surface layer is required to have sufficient slip resistance, m is preferably an integer of 0 to 30, more preferably an integer of 0 to 20, and particularly preferably an integer of 0 to 10. When m is at most the upper limit of the above range, the slip resistance of the surface layer will be further excellent. When the surface layer is required to have sufficient slip resistance, m′ is preferably an integer of 1 to 30, more preferably an integer of 1 to 20, and particularly preferably an integer of 1 to 10. When m'is not more than the upper limit of the above range, the slip resistance of the surface layer is further excellent.
When the surface layer is required to have sufficient abrasion resistance and fingerprint stain removability, m and m′ are preferably an integer of 2 to 200, more preferably an integer of 5 to 150, particularly preferably an integer of 10 to 100. When m and m′ are not less than the lower limit of the above range, the surface layer is more excellent in abrasion resistance and fingerprint stain removability. When m and m′ are not more than the upper limit of the above range, the abrasion resistance of the surface layer is further excellent. That is, when the number average molecular weight of the compound (1) is too large, the number of hydrolyzable silyl groups present per unit molecular weight decreases, and the abrasion resistance of the surface layer decreases.
 ORf2、すなわちオキシフルオロアルキレン単位としては、OCHF、OCFCHF、OCHFCF、OCFCH、OCHCF、OCFCFCHF、OCHFCFCF、OCFCFCH、OCHCFCF、OCFCFCFCH、OCHCFCFCF、OCFCFCFCFCH、OCHCFCFCFCF、OCFCFCFCFCFCH、OCHCFCFCFCFCF、OCF、OCFCF、OCFCFCF、OCF(CF)CF、OCFCFCFCF、OCF(CF)CFCF、OCFCFCFCFCF、OCFCFCFCFCFCF等が挙げられる。 As OR f2 , that is, as the oxyfluoroalkylene unit, OCHF, OCF 2 CHF, OCHFCF 2 , OCF 2 CH 2 , OCH 2 CF 2 , OCF 2 CF 2 CHF, OCHFCF 2 CF 2 , OCF 2 CF 2 CH 2 , OCH 2 CF 2 CF 2, OCF 2 CF 2 CF 2 CH 2, OCH 2 CF 2 CF 2 CF 2, OCF 2 CF 2 CF 2 CF 2 CH 2, OCH 2 CF 2 CF 2 CF 2 CF 2, OCF 2 CF 2 CF 2 CF 2 CF 2 CH 2, OCH 2 CF 2 CF 2 CF 2 CF 2 CF 2, OCF 2, OCF 2 CF 2, OCF 2 CF 2 CF 2, OCF (CF 3) CF 2, OCF 2 CF 2 CF 2 CF 2, OCF (CF 3) CF 2 CF 2, OCF 2 CF 2 CF 2 CF 2 CF 2, OCF 2 CF 2 CF 2 CF 2 CF 2 CF 2 , and the like.
 (ORf2及び(ORf2m’において、2種以上のORf2が存在する場合、各ORf2の結合順序は限定されない。例えば、OCFとOCFCFが存在する場合、OCFとOCFCFがランダム、交互、ブロックに配置されてもよい。
 2種以上のORf2が存在するとは、炭素数の異なる2種以上のORf2が存在すること、水素原子数が異なる2種以上のORf2が存在すること、水素原子の位置が異なる2種以上のORf2が存在すること、及び、炭素数が同一であっても側鎖の有無や側鎖の種類(側鎖の数や側鎖の炭素数等)が異なる2種以上のORf2が存在することをいう。
 2種以上のORf2の配置については、例えば、{(OCFm1(OCFCFm2}で表される構造は、m1個の(OCF)とm2個の(OCFCF)とがランダムに配置されていることを表す。また、(OCFCF-OCFCFCFCFm5で表される構造は、m5個の(OCFCF)とm5個の(OCFCFCFCF)とが交互に配置されていることを表す。
In (OR f2 ) m and (OR f2 ) m′ , when two or more kinds of OR f2 are present, the bonding order of each OR f2 is not limited. For example, when OCF 2 and OCF 2 CF 2 are present, OCF 2 and OCF 2 CF 2 may be arranged in a random, alternating, block.
The two or more OR f2 is present, that there are two or more OR f2 having different number of carbon atoms, that the number of hydrogen atoms are present two or more different OR f2, two position of the hydrogen atoms are different the presence of oR f2 above, and, whether or side chain type of side chains may be the same carbon number (number of carbon atoms in the number of side chains or side chains, etc.) is two or more different oR f2 It exists.
Regarding the arrangement of two or more kinds of OR f2 , for example, the structure represented by {(OCF 2 ) m1 (OCF 2 CF 2 ) m2 } includes m1 (OCF 2 ) and m2 (OCF 2 CF 2 ). ) And that are arranged at random. Further, the structure represented by (OCF 2 CF 2 —OCF 2 CF 2 CF 2 CF 2 ) m5 has m5 (OCF 2 CF 2 ) and m5 (OCF 2 CF 2 CF 2 CF 2 ) Indicates that they are arranged alternately.
 (ORf2及び(ORf2m’としては、少なくともその一部に下記の構造を有するものが好ましい。
 {(OCFm1(OCFCFm2}、
 (OCFCFm3
 (OCFCFCFm4
 (OCFCF-OCFCFCFCFm5
 (OCFCFCFCFCFm6(OCFm7
 (OCFCFCFCFCFm6(OCFCFm7
 (OCFCFCFCFCFCFm6(OCFm7
 (OCFCFCFCFCFCFm6(OCFCFm7
 (OCFCFCFCFCF-OCFm8
 (OCFCFCFCFCF-OCFCFm8
 (OCFCFCFCFCFCF-OCFm8
 (OCFCFCFCFCFCF-OCFCFm8
 (OCF-OCFCFCFCFCFm8
 (OCF-OCFCFCFCFCFCFm8
 (OCFCF-OCFCFCFCFCFm8
 (OCFCF-OCFCFCFCFCFCFm8
 (OCF(CF)CFm9
 ただし、m1、m2、m3、m4、m5、m6、m7、m8及びm9は、1以上の整数である。m1、m2、m3、m4、m5、m6、m7、m8及びm9の上限値は、mの上限値に合わせて調整される。
As (OR f2 ) m and (OR f2 ) m′ , those having the following structure at least in part thereof are preferable.
{(OCF 2 ) m1 (OCF 2 CF 2 ) m2 },
(OCF 2 CF 2 ) m3 ,
(OCF 2 CF 2 CF 2 ) m4 ,
(OCF 2 CF 2 —OCF 2 CF 2 CF 2 CF 2 ) m5 ,
(OCF 2 CF 2 CF 2 CF 2 CF 2) m6 (OCF 2) m7,
(OCF 2 CF 2 CF 2 CF 2 CF 2 ) m6 (OCF 2 CF 2 ) m7 ,
(OCF 2 CF 2 CF 2 CF 2 CF 2 CF 2) m6 (OCF 2) m7,
(OCF 2 CF 2 CF 2 CF 2 CF 2 CF 2) m6 (OCF 2 CF 2) m7,
(OCF 2 CF 2 CF 2 CF 2 CF 2 —OCF 2 ) m8 ,
(OCF 2 CF 2 CF 2 CF 2 CF 2 —OCF 2 CF 2 ) m8 ,
(OCF 2 CF 2 CF 2 CF 2 CF 2 CF 2 —OCF 2 ) m8 ,
(OCF 2 CF 2 CF 2 CF 2 CF 2 CF 2 —OCF 2 CF 2 ) m8 ,
(OCF 2 —OCF 2 CF 2 CF 2 CF 2 CF 2 ) m8 ,
(OCF 2 —OCF 2 CF 2 CF 2 CF 2 CF 2 CF 2 ) m8 ,
(OCF 2 CF 2 —OCF 2 CF 2 CF 2 CF 2 CF 2 ) m8 ,
(OCF 2 CF 2 —OCF 2 CF 2 CF 2 CF 2 CF 2 CF 2 ) m8 ,
(OCF (CF 3) CF 2 ) m9.
However, m1, m2, m3, m4, m5, m6, m7, m8 and m9 are integers of 1 or more. The upper limits of m1, m2, m3, m4, m5, m6, m7, m8 and m9 are adjusted according to the upper limit of m.
 (ORf2及び(ORf2m’としては、化合物(1)を製造しやすい点から、下記のものが好ましい。
 {(OCFm1(OCFCFm2}OCF
 (OCFCFm3OCF
 (OCFCFCFm4OCFCF
 (OCFCF{(OCFm1(OCFCFm2}OCF
 (OCFCF-OCFCFCFCFm5OCFCFOCFCFCF
 (OCF-OCFCFCFCFCFm8OCFOCFCFCFCF
 (OCF-OCFCFCFCFCFCFm8OCFOCFCFCFCFCF
 (OCFCF-OCFCFCFCFCFm8OCFCFOCFCFCFCF
 (OCFCF-OCFCFCFCFCFCFm8OCFCFOCFCFCFCFCF
 (OCF(CF)CFm9OCF(CF)。
As (OR f2 ) m and (OR f2 ) m′ , the following are preferable from the viewpoint of easy production of the compound (1).
{(OCF 2 ) m1 (OCF 2 CF 2 ) m2 }OCF 2 ,
(OCF 2 CF 2 ) m3 OCF 2 ,
(OCF 2 CF 2 CF 2 ) m4 OCF 2 CF 2 ,
(OCF 2 CF 2) 2 { (OCF 2) m1 (OCF 2 CF 2) m2} OCF 2,
(OCF 2 CF 2 —OCF 2 CF 2 CF 2 CF 2 ) m5 OCF 2 CF 2 OCF 2 CF 2 CF 2 ,
(OCF 2 —OCF 2 CF 2 CF 2 CF 2 CF 2 ) m8 OCF 2 OCF 2 CF 2 CF 2 CF 2 ,
(OCF 2 —OCF 2 CF 2 CF 2 CF 2 CF 2 CF 2 ) m8 OCF 2 OCF 2 CF 2 CF 2 CF 2 CF 2 ,
(OCF 2 CF 2 —OCF 2 CF 2 CF 2 CF 2 CF 2 ) m8 OCF 2 CF 2 OCF 2 CF 2 CF 2 CF 2 ,
(OCF 2 CF 2 —OCF 2 CF 2 CF 2 CF 2 CF 2 CF 2 ) m8 OCF 2 CF 2 OCF 2 CF 2 CF 2 CF 2 CF 2 ,
(OCF (CF 3) CF 2 ) m9 OCF (CF 3).
 Qは、a1+b1価の直鎖状又は分岐状の連結基である。Qは、a2+b2+1価の直鎖状又は分岐状の連結基である。
 Q及びQは、上述した極性部位Eを有する。
 Qは、a1+b1が3以上のとき、C、N、Si、環構造及びa1+b1価のオルガノポリシロキサン残基からなる群から選ばれる少なくとも1種の分岐点(以下、「分岐点P」と記す。)をさらに有することが好ましい。なお分岐点Pには特定分岐鎖が結合する。Qは、a2+b2+1が3以上のとき、C、N、Si、環構造及びa2+b2+1価のオルガノポリシロキサン残基からなる群から選ばれる少なくとも1種の分岐点(以下、「分岐点P’」と記す。)を有することが好ましい。なお分岐点P’には特定分岐鎖が結合する。
Q 1 is an a1+b1 valent linear or branched linking group. Q 2 is an a2+b2+1 valent linear or branched linking group.
Q 1 and Q 2 have the polar moiety E described above.
Q 1 is at least one branch point (hereinafter referred to as “branch point P”) selected from the group consisting of C, N, Si, a ring structure and an a1+b1 valent organopolysiloxane residue when a1+b1 is 3 or more. .) is further included. A specific branched chain is bonded to the branch point P. Q 2 is at least one branch point (hereinafter referred to as “branch point P′”) selected from the group consisting of C, N, Si, a ring structure and an a2+b2+1 valent organopolysiloxane residue when a2+b2+1 is 3 or more. It is preferable to have the following). A specific branched chain is bonded to the branch point P'.
 環構造としては、化合物(1)を製造しやすい点、及び表面層の耐摩擦性、耐光性及び耐薬品性がさらに優れる点から、3~8員環の脂肪族環、3~8員環の芳香族環、3~8員環のヘテロ環、及びこれらの環のうちの2つ以上からなる縮合環からなる群から選ばれる1種が好ましく、下式に挙げられる環構造が特に好ましい。環構造は、ハロゲン原子、アルキル基(炭素-炭素原子間にエーテル性酸素原子を含んでいてもよい。)、シクロアルキル基、アルケニル基、アリル基、アルコキシ基、オキソ基(=O)等の置換基を有してもよい。 The ring structure is a 3- to 8-membered aliphatic ring, a 3- to 8-membered ring, from the viewpoint of easy production of the compound (1) and further excellent abrasion resistance, light resistance and chemical resistance of the surface layer. Is preferably one selected from the group consisting of an aromatic ring, a 3- to 8-membered heterocyclic ring, and a condensed ring consisting of two or more of these rings, and the ring structure represented by the following formula is particularly preferable. The ring structure may be a halogen atom, an alkyl group (which may contain an etheric oxygen atom between carbon-carbon atoms), a cycloalkyl group, an alkenyl group, an allyl group, an alkoxy group, an oxo group (=O), or the like. It may have a substituent.
Figure JPOXMLDOC01-appb-C000003
Figure JPOXMLDOC01-appb-C000003
 a1+b1価のオルガノポリシロキサン残基又はa2+b2+1価のオルガノポリシロキサン残基としては、例えば、下記の基が挙げられる。ただし、下式におけるRは、水素原子、アルキル基、アルコキシ基、又はフェニル基である。Rのアルキル基及びアルコキシ基の炭素数は、1~10が好ましく、1が特に好ましい。 Examples of the a1+b1 valent organopolysiloxane residue or the a2+b2+1 valent organopolysiloxane residue include the following groups. However, R 5 in the following formula is a hydrogen atom, an alkyl group, an alkoxy group, or a phenyl group. The alkyl group and the alkoxy group of R 5 preferably have 1 to 10 carbon atoms, and particularly preferably 1 carbon atom.
Figure JPOXMLDOC01-appb-C000004
Figure JPOXMLDOC01-appb-C000004
 Q及びQは、-O-、-S-、-Si(R-、-OSi(R-及び2価のオルガノポリシロキサン残基からなる群から選ばれる少なくとも1種の結合(以下、「結合B」と記す。)をさらに有していてもよい。ただし、Rは、水素原子、炭素数1~6のアルキル基又はフェニル基である。結合Bとしては、化合物(1)を製造しやすい点から、-O-が好ましい。 Q 1 and Q 2, -O -, - S -, - Si (R 6) 2 -, - OSi (R 6) 2 - and at least one selected from the divalent group consisting of an organopolysiloxane residue May be further included (hereinafter, referred to as “bond B”). However, R 6 is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group. As the bond B, —O— is preferable from the viewpoint of easy production of the compound (1).
 2価のオルガノポリシロキサン残基としては、例えば、下式の基が挙げられる。ただし、下式におけるRは、水素原子、アルキル基、アルコキシ基、又はフェニル基である。Rのアルキル基及びアルコキシ基の炭素数は、1~10が好ましく、1が特に好ましい。 Examples of the divalent organopolysiloxane residue include groups represented by the following formulae. However, R 7 in the following formula is a hydrogen atom, an alkyl group, an alkoxy group, or a phenyl group. The alkyl group and the alkoxy group of R 7 preferably have 1 to 10 carbon atoms, and particularly preferably 1 carbon atom.
Figure JPOXMLDOC01-appb-C000005
Figure JPOXMLDOC01-appb-C000005
 Qとしては、2個以上の2価の炭化水素基と1個以上の極性部位Eと1個以上の分岐点Pとの組み合わせ、及び、2個以上の炭化水素基と1個以上の極性部位Eと1個以上の分岐点Pと1個以上の結合Bとの組み合わせが挙げられる。また、極性基が分岐点Pである場合、Qとしては、2個以上の2価の炭化水素基と1個以上の極性部位Eとの組み合わせ、及び、2個以上の炭化水素基と1個以上の極性部位Eと1個以上の結合Bとの組み合わせが挙げられる。
 Qとしては、2個以上の2価の炭化水素基と1個以上の極性部位Eと1個以上の分岐点P’との組み合わせ、及び、2個以上の炭化水素基と1個以上の極性部位Eと1個以上の分岐点P’と1個以上の結合Bとの組み合わせが挙げられる。また、極性基が分岐点P’である場合、Qとしては、2個以上の2価の炭化水素基と1個以上の極性部位Eとの組み合わせ、及び、2個以上の炭化水素基と1個以上の極性部位Eと1個以上の結合Bとの組み合わせが挙げられる。
 2価の炭化水素基としては、2価の脂肪族炭化水素基(アルキレン基、シクロアルキレン基等)、2価の芳香族炭化水素基(フェニレン基等)等が挙げられる。2価の炭化水素基の炭素数は、1~10が好ましく、1~6がより好ましく、1~4が特に好ましい。
Q 1 is a combination of two or more divalent hydrocarbon groups, one or more polar moieties E and one or more branch points P, and two or more hydrocarbon groups and one or more polarities. Examples include combinations of the site E, one or more branch points P, and one or more bonds B. When the polar group is the branch point P, Q 1 is a combination of two or more divalent hydrocarbon groups and one or more polar moieties E, and two or more hydrocarbon groups and 1 Combinations of one or more polar moieties E and one or more bonds B are included.
As Q 2 , a combination of two or more divalent hydrocarbon groups, one or more polar moieties E and one or more branch points P′, and two or more hydrocarbon groups and one or more A combination of a polar moiety E, one or more branch points P′ and one or more bonds B can be mentioned. When the polar group is the branch point P′, Q 2 is a combination of two or more divalent hydrocarbon groups and one or more polar moieties E, and two or more hydrocarbon groups. Combinations of one or more polar moieties E and one or more bonds B are included.
Examples of the divalent hydrocarbon group include a divalent aliphatic hydrocarbon group (alkylene group, cycloalkylene group, etc.) and a divalent aromatic hydrocarbon group (phenylene group, etc.). The carbon number of the divalent hydrocarbon group is preferably 1-10, more preferably 1-6, and particularly preferably 1-4.
 前記組み合わせのQとしては、化合物(1A)を製造しやすい点から、基(g2-1)(ただし、a1=d1+d3及びb1=d2+d4である。)、基(g2-2)(ただし、a1=e1及びb1=e2である。)、基(g2-3)(ただし、a1=1及びb1=2である。)、基(g2-4)(ただし、a1=h1及びb1=h2である。)、基(g2-5)(ただし、a1=i1及びb1=i2である。)、基(g2-6)(ただし、a1=1及びb1=1である。)、又は基(g2-7)(ただし、a1=1及びb1=2である。)が好ましい。
 前記組み合わせのQとしては、化合物(1B)を製造しやすい点から、基(g2-1)(ただし、a2+1=d1+d3及びb2=d2+d4である。)、基(g2-2)(ただし、a2+1=e1及びb2=e2である。)、基(g2-3)(ただし、a2+1=1及びb2=2である。)、基(g2-4)(ただし、a2+1=h1及びb2=h2である。)、基(g2-5)(ただし、a2+1=i1及びb2=i2である。)、基(g2-6)(ただし、a2+1=1及びb2=1である。)、又は基(g2-7)(ただし、a2+1=1及びb2=2である。)が好ましい。
As Q 1 of the above combination, the group (g2-1) (provided that a1=d1+d3 and b1=d2+d4) and the group (g2-2) (provided that a1 are present) from the viewpoint of easy production of the compound (1A). =e1 and b1=e2), a group (g2-3) (where a1=1 and b1=2), a group (g2-4) (where a1=h1 and b1=h2). .), a group (g2-5) (where a1=i1 and b1=i2), a group (g2-6) (where a1=1 and b1=1), or a group (g2- 7) (provided that a1=1 and b1=2) are preferable.
As Q 2 of the above combination, a group (g2-1) (provided that a2+1=d1+d3 and b2=d2+d4) and a group (g2-2) (provided that a2+1) are used because the compound (1B) can be easily produced. =e1 and b2=e2), a group (g2-3) (where a2+1=1 and b2=2), a group (g2-4) (where a2+1=h1 and b2=h2). .), a group (g2-5) (where a2+1=i1 and b2=i2), a group (g2-6) (where a2+1=1 and b2=1), or a group (g2- 7) (however, a2+1=1 and b2=2) are preferable.
Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000006
 (-A-E-Q12-)e1C(R4-e1-e2(-Q22-)e2 ・・・(g2-2)
 -A-E-Q13-N(-Q23-) ・・・(g2-3)
 (-A-E-Q14-)h1Z(-Q24-)h2 ・・・(g2-4)
 (-A-E-Q15-)i1Si(R4-i1-i2(-Q25-)i2 ・・・(g2-5)
 -A-E-Q26- ・・・(g2-6)
 -A-E(-Q27-) ・・・(g2-7)
(-AEQ 12 -) e1 C(R 2 ) 4-e1-e2 (-Q 22 -) e2 ...(g2-2)
-AEQ 13 -N(-Q 23 -) 2 ... (g2-3)
(-A-E-Q 14 - ) h1 Z (-Q 24 -) h2 ··· (g2-4)
(-AEQ 15 -) i1 Si(R 3 ) 4-i1-i2 (-Q 25 -) i2 ...(g2-5)
-AEQ 26 -... (g2-6)
-AE (-Q 27 -) 2 ...(g2-7)
 ただし、式(g2-1)~式(g2-7)においては、A側がR又はQに接続し、Q22、Q23、Q24、Q25、Q26及びQ27側がTに接続する。Aは、単結合又はアルキレン基である。Eは、2個以上の極性基が炭素数1~20の2価の有機基を介して直列に結合した部位であり、式(g2-7)においては、Q27側の末端の極性基がC(OH)、C(OR)、P(O)、S(O)、C[OP(O)(OR]、C[OS(O)]又はC[OC(O)R]である。Q11は、単結合、-O-、アルキレン基、又は炭素数2以上のアルキレン基の炭素-炭素原子間に-O-を有する基である。Q12は、単結合又はアルキレン基であり、Q又はQがQ12を2以上有する場合、2以上のQ12は同一であっても異なっていてもよい。Q13は、アルキレン基である。Q14は、Q14が結合するZにおける原子が炭素原子の場合、Q12であり、Q14が結合するZにおける原子が窒素原子の場合、Q13であり、Q又はQがQ14を2以上有する場合、2以上のQ14は同一であっても異なっていてもよい。Q15は、アルキレン基であり、Q又はQがQ15を2以上有する場合、2以上のQ15は同一であっても異なっていてもよい。Q22は、アルキレン基、炭素数2以上のアルキレン基の炭素-炭素原子間に-O-を有する基、アルキレン基のSiに接続しない側の末端に-O-を有する基、又は炭素数2以上のアルキレン基の炭素-炭素原子間に-O-を有しかつSiに接続しない側の末端に-O-を有する基であり、2以上のQ22は同一であっても異なっていてもよい。Q23は、アルキレン基、又は炭素数2以上のアルキレン基の炭素-炭素原子間に-O-を有する基であり、2個のQ23は同一であっても異なっていてもよい。Q24は、Q24が結合するZにおける原子が炭素原子の場合、Q22であり、Q24が結合するZにおける原子が窒素原子の場合、Q23であり、2以上のQ24は同一であっても異なっていてもよい。Q25は、アルキレン基、又は炭素数2以上のアルキレン基の炭素-炭素原子間に-O-を有する基であり、2以上のQ25は同一であっても異なっていてもよい。Q26は、アルキレン基、又は炭素数2以上のアルキレン基の炭素-炭素原子間に-O-を有する基である。Q27は、アルキレン基、又は炭素数2以上のアルキレン基の炭素-炭素原子間に-O-を有する基であり、2個のQ27は同一であっても異なっていてもよい。Zは、Q14が直接結合する炭素原子又は窒素原子を有しかつQ24が直接結合する炭素原子又は窒素原子を有するa1+b1価又はa2+b2+1価の環構造を有する基である。Rは、水素原子又はアルキル基であり、Q又はQがRを2以上有する場合、2以上のRは同一であっても異なっていてもよい。Rは、水素原子又はアルキル基であり、Rは、アルキル基である。d1は、0~3の整数であり、1又は2が好ましく、d2は、0~3の整数であり、1又は2が好ましく、d1+d2は、1~3の整数である。d3は、0~3の整数であり、1又は2が好ましく、d4は、0~3の整数であり、1又は2が好ましく、d3+d4は、1~3の整数である。d1+d3は、1~5の整数であり、2又は3が好ましく、d2+d4は、1~5の整数であり、2~4の整数が好ましい。e1は、1~3の整数であり、1又は2が好ましく、e2は、1~3の整数であり、2又は3が好ましく、e1+e2は、3又は4である。h1は、1以上の整数であり、1又は2が好ましく、h2は、1以上の整数であり、2又は3が好ましい。i1は、1~3の整数であり、1又は2が好ましく、i2は、1~3の整数であり、2又は3が好ましく、i1+i2は、3又は4である。 However, in the formulas (g2-1) to (g2-7), the A side is connected to R f or Q f , and the Q 22 , Q 23 , Q 24 , Q 25 , Q 26, and Q 27 sides are connected to T. To do. A is a single bond or an alkylene group. E is a site in which two or more polar groups are bonded in series via a divalent organic group having 1 to 20 carbon atoms, and in the formula (g2-7), the polar group at the terminal on the Q 27 side is C(OH), C(OR 4 ), P(O), S(O), C[OP(O)(OR 3 ) 2 ], C[OS(O) 2 R 3 ], or C[OC(O ) R 3 ]. Q 11 is a single bond, —O—, an alkylene group, or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms. Q 12 is a single bond or an alkylene group, if Q 1 or Q 2 has a Q 12 2 or more, two or more Q 12 may be different even in the same. Q 13 is an alkylene group. Q 14 is Q 12 when the atom in Z to which Q 14 is bonded is a carbon atom, Q 13 when the atom in Z to which Q 14 is bonded is a nitrogen atom, and Q 1 or Q 2 is Q 14 When 2 or more are included, two or more Q 14's may be the same or different. Q 15 is an alkylene group, if Q 1 or Q 2 has a Q 15 2 or more, two or more Q 15 may be different even in the same. Q 22 is an alkylene group, a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms, a group having —O— at an end of the alkylene group which is not connected to Si, or a group having 2 carbon atoms. A group having -O- between the carbon-carbon atoms of the above alkylene group and having -O- at the terminal on the side not connected to Si, and two or more Q 22 s may be the same or different. Good. Q 23 is an alkylene group or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms, and two Q 23 may be the same or different. Q 24 is Q 22 when the atom in Z to which Q 24 is bonded is a carbon atom, and is Q 23 when the atom in Z to which Q 24 is bonded is a nitrogen atom, and two or more Q 24 are the same. It may or may not be. Q 25 is an alkylene group or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms, and 2 or more Q 25 may be the same or different. Q 26 is an alkylene group or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms. Q 27 is an alkylene group or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms, and two Q 27 may be the same or different. Z is a group having a ring structure of a1+b1 valence or a2+b2+1 having a carbon atom or a nitrogen atom to which Q 14 is directly bonded and a carbon atom or a nitrogen atom to which Q 24 is directly bonded. R 1 is a hydrogen atom or an alkyl group, if Q 1 or Q 2 has the R 1 2 or more, 2 or more of R 1 may be different even in the same. R 2 is a hydrogen atom or an alkyl group, and R 3 is an alkyl group. d1 is an integer of 0 to 3, preferably 1 or 2, d2 is an integer of 0 to 3, preferably 1 or 2, and d1+d2 is an integer of 1 to 3. d3 is an integer of 0 to 3, preferably 1 or 2, d4 is an integer of 0 to 3, preferably 1 or 2, and d3+d4 is an integer of 1 to 3. d1+d3 is an integer of 1 to 5, preferably 2 or 3, and d2+d4 is an integer of 1 to 5, preferably an integer of 2 to 4. e1 is an integer of 1 to 3, preferably 1 or 2, e2 is an integer of 1 to 3, preferably 2 or 3, and e1+e2 is 3 or 4. h1 is an integer of 1 or more, preferably 1 or 2, and h2 is an integer of 1 or more, preferably 2 or 3. i1 is an integer of 1 to 3, preferably 1 or 2, i2 is an integer of 1 to 3, preferably 2 or 3, and i1+i2 is 3 or 4.
 Aのアルキレン基の炭素数は、化合物(1)を製造しやすい点から、1~5が好ましく、1~2がより好ましく、1が特に好ましい。
 Eとしては、上述した極性部位Eが挙げられ、好ましい形態も同様である。
The number of carbon atoms of the alkylene group of A is preferably 1 to 5, more preferably 1 to 2, and particularly preferably 1 from the viewpoint of easy production of the compound (1).
Examples of E include the polar site E described above, and the preferred forms are also the same.
 Q11、Q12、Q13、Q14、Q15、Q22、Q23、Q24、Q25、Q26及びQ27のアルキレン基の炭素数は、化合物(1)を製造しやすい点、及び表面層の耐摩擦性、耐光性及び耐薬品性がさらに優れる点から、1~10が好ましく、1~6がより好ましく、1~4が特に好ましい。ただし、炭素-炭素原子間に特定の結合を有する場合のアルキレン基の炭素数の下限値は2である。 The number of carbon atoms of the alkylene group of Q 11 , Q 12 , Q 13 , Q 14 , Q 15 , Q 22 , Q 23 , Q 24 , Q 25 , Q 26 and Q 27 is such that the compound (1) can be easily produced, Further, from the viewpoint that the abrasion resistance, light resistance and chemical resistance of the surface layer are further excellent, 1 to 10 is preferable, 1 to 6 is more preferable, and 1 to 4 is particularly preferable. However, the lower limit of the number of carbon atoms of the alkylene group when it has a specific bond between carbon and carbon atoms is 2.
 Zにおける環構造としては、上述した環構造が挙げられ、好ましい形態も同様である。なお、Zにおける環構造にはQ14やQ24が直接結合するため、環構造に例えばアルキレン基が連結して、そのアルキレン基にQ14やQ24が連結することはない。 Examples of the ring structure in Z include the ring structures described above, and the preferred forms are also the same. Since Q 14 and Q 24 are directly bonded to the ring structure in Z, for example, an alkylene group is not connected to the ring structure and Q 14 or Q 24 is not connected to the alkylene group.
 R、R及びRのアルキル基の炭素数は、化合物(1)を製造しやすい点から、1~6が好ましく、1~3がより好ましく、1~2が特に好ましい。
 h1は、化合物(1)を製造しやすい点、及び表面層の耐摩擦性及び指紋汚れ除去性がさらに優れる点から、1~6が好ましく、1~4がより好ましく、1又は2がさらに好ましく、1が特に好ましい。
 h2は、化合物(1)を製造しやすい点、及び表面層の耐摩擦性及び指紋汚れ除去性がさらに優れる点から、2~6が好ましく、2~4がより好ましく、2又は3が特に好ましい。
The number of carbon atoms of the alkyl group of R 1 , R 2 and R 3 is preferably 1 to 6, more preferably 1 to 3, and particularly preferably 1 to 2 from the viewpoint of easy production of the compound (1).
h1 is preferably 1 to 6, more preferably 1 to 4, and further preferably 1 or 2 from the viewpoint that the compound (1) can be easily produced and that the abrasion resistance of the surface layer and the fingerprint stain removability are further excellent. 1 is particularly preferred.
h2 is preferably 2 to 6, more preferably 2 to 4, and particularly preferably 2 or 3 from the viewpoint of easy production of the compound (1) and the further excellent abrasion resistance and fingerprint stain removability of the surface layer. .
 Qの他の形態としては、基(g2-8)(ただし、a1=d1+d3及びb1=kの合計である。)、基(g2-9)(ただし、a1=e1及びb1=e2である。)、基(g2-10)(ただし、a1=1及びb1=kの合計である。)、基(g2-11)(ただし、a1=h1及びb1=kの合計である。)、基(g2-12)(ただし、a1=i1及びb1=kの合計である。)、基(g2-13)(ただし、a1=1及びb1=kである。)、又は基(g2-14)(ただし、a1=1及びb1=kの合計である。)が挙げられる。
 Qの他の形態としては、基(g2-8)(ただし、a2+1=d1+d3及びb2=kの合計である。)、基(g2-9)(ただし、a2+1=e1及びb2=e2である。)、基(g2-10)(ただし、a2+1=1及びb2=kの合計である。)、基(g2-11)(ただし、a2+1=h1及びb2=kの合計である。)、基(g2-12)(ただし、a2+1=i1及びb2=kの合計である。)、基(g2-13)(ただし、a2+1=1及びb2=kである。)、又は基(g2-14)(ただし、a2+1=1及びb2=kの合計である。)が挙げられる。
Other forms of Q 1 include a group (g2-8) (provided that it is the sum of a1=d1+d3 and b1=k) and a group (g2-9) (provided that a1=e1 and b1=e2). .), a group (g2-10) (however, it is the sum of a1=1 and b1=k), a group (g2-11) (however, it is the sum of a1=h1 and b1=k), a group (G2-12) (however, it is the sum of a1=i1 and b1=k), a group (g2-13) (however, a1=1 and b1=k), or a group (g2-14) (However, it is the sum of a1=1 and b1=k.).
Other forms of Q 2 include a group (g2-8) (however, the sum of a2+1=d1+d3 and b2=k) and a group (g2-9) (however, a2+1=e1 and b2=e2). .), a group (g2-10) (however, it is the sum of a2+1=1 and b2=k), a group (g2-11) (however, it is the sum of a2+1=h1 and b2=k), a group (G2-12) (however, the sum of a2+1=i1 and b2=k), the group (g2-13) (however, a2+1=1 and b2=k), or the group (g2-14) (However, it is the sum of a2+1=1 and b2=k.).
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000007
 (-A-E-Q12-)e1C(R4-e1-e2(-Q22-G)e2 ・・・(g2-9)
 -A-E-Q13-N(-Q23-G) ・・・(g2-10)
 (-A-E-Q14-)h1Z(-Q24-G)h2 ・・・(g2-11)
 (-A-E-Q15-)i1Si(R4-i1-i2(-Q25-G)i2 ・・・(g2-12)
 -A-E-Q26-G ・・・(g2-13)
 -A-E(-Q27-G) ・・・(g2-14)
(-AEQ 12 -) e1 C(R 2 ) 4-e1-e2 (-Q 22 -G) e2 ...(g2-9)
-AEQ 13 -N(-Q 23 -G) 2 ... (g2-10)
(-AEQ 14 -) h1 Z(-Q 24 -G) h2 ...(g2-11)
(-AEQ 15 -) i1 Si(R 3 ) 4-i1-i2 (-Q 25 -G) i2 ...(g2-12)
-AEQ 26 -G... (g2-13)
-AE (-Q 27 -G) 2 ... (g2-14)
 ただし、式(g2-8)~式(g2-14)においては、A側がR又はQに接続し、G側がTに接続し、Gは、基(g3)であり、Q又はQが有する2以上のGは同一であっても異なっていてもよく、G以外の符号は、式(g2-1)~式(g2-7)における符号と同じである。
 -Si(R3-k(-Q-) ・・・(g3)
 ただし、式(g3)においては、Si側がQ22、Q23、Q24、Q25、Q26及びQ27に接続し、Q側がTに接続し、Rは、アルキル基であり、Qは、アルキレン基、炭素数2以上のアルキレン基の炭素-炭素原子間に-O-を有する基、又は-(OSi(R-O-であり、2以上のQは同一であっても異なっていてもよく、kは、2又は3であり、Rは、アルキル基、フェニル基又はアルコキシ基であり、2個のRは同一であっても異なっていてもよく、pは、0~5の整数であり、pが2以上の場合、2以上の(OSi(R)は同一であっても異なっていてもよい。
However, in formulas (g2-8) to (g2-14), the A side is connected to R f or Q f , the G side is connected to T, G is a group (g3), and Q 1 or Q Two or more Gs included in 2 may be the same or different, and symbols other than G are the same as the symbols in the formulas (g2-1) to (g2-7).
-Si(R 8 ) 3-k (-Q 3 -) k ... (g3)
However, in the formula (g3), the Si side is connected to Q 22 , Q 23 , Q 24 , Q 25 , Q 26 and Q 27 , the Q 3 side is connected to T, R 8 is an alkyl group, and Q is 3 is an alkylene group, a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms, or —(OSi(R 9 ) 2 ) p —O—, and Q 3 of 2 or more is They may be the same or different, k is 2 or 3, R 9 is an alkyl group, a phenyl group or an alkoxy group, and two R 9 are the same or different. Well, p is an integer of 0 to 5, and when p is 2 or more, (OSi(R 9 ) 2 ) of 2 or more may be the same or different.
 Qのアルキレン基の炭素数は、化合物(1)を製造しやすい点、及び表面層の耐摩擦性、耐光性及び耐薬品性がさらに優れる点から、1~10が好ましく、1~6がより好ましく、1~4が特に好ましい。ただし、炭素-炭素原子間に特定の結合を有する場合のアルキレン基の炭素数の下限値は2である。
 Rのアルキル基の炭素数は、化合物(1)を製造しやすい点から、1~6が好ましく、1~3がより好ましく、1~2が特に好ましい。
 Rのアルキル基の炭素数は、化合物(1)を製造しやすい点から、1~6が好ましく、1~3がより好ましく、1~2が特に好ましい。
 Rのアルコキシ基の炭素数は、化合物(1)の保存安定性に優れる点から、1~6が好ましく、1~3がより好ましく、1~2が特に好ましい。
 pは、0又は1が好ましい。
The number of carbon atoms of the alkylene group of Q 3 is preferably 1 to 10 and more preferably 1 to 6 from the viewpoint of easy production of the compound (1) and the further excellent abrasion resistance, light resistance and chemical resistance of the surface layer. More preferably, 1 to 4 is particularly preferable. However, the lower limit of the number of carbon atoms of the alkylene group when it has a specific bond between carbon and carbon atoms is 2.
The number of carbon atoms of the alkyl group of R 8 is preferably 1 to 6, more preferably 1 to 3, and particularly preferably 1 to 2 from the viewpoint of easy production of the compound (1).
The number of carbon atoms of the alkyl group of R 9 is preferably 1 to 6, more preferably 1 to 3, and particularly preferably 1 to 2 from the viewpoint of easy production of the compound (1).
The number of carbon atoms of the alkoxy group of R 9 is preferably 1 to 6, more preferably 1 to 3, and particularly preferably 1 to 2 from the viewpoint of excellent storage stability of the compound (1).
p is preferably 0 or 1.
 Tは、-Si(R)3-c(L)であり、反応性シリル基である。
 Rのアルキル基の炭素数は、化合物(1)を製造しやすい点から、1~6が好ましく、1~3がより好ましく、1~2が特に好ましい。
 Lの加水分解性基としては、上述した加水分解性基と同様のものが挙げられ、好ましい形態も同様である。
 cは、表面層と基材との密着性がより強固になる点から、3が特に好ましい。
 化合物(1)中の複数のTは、同一であっても異なっていてもよい。化合物(1)を製造しやすい点から、同一の基であることが好ましい。
T is —Si(R) 3-c (L) c, which is a reactive silyl group.
The number of carbon atoms of the alkyl group of R is preferably 1 to 6, more preferably 1 to 3, and particularly preferably 1 to 2 from the viewpoint of easy production of the compound (1).
Examples of the hydrolyzable group for L include the same as the above-mentioned hydrolyzable groups, and the preferred forms are also the same.
c is particularly preferably 3 because the adhesion between the surface layer and the substrate becomes stronger.
Plural Ts in the compound (1) may be the same or different. From the viewpoint of easy production of the compound (1), the same group is preferable.
 化合物(1)としては、例えば、下式の化合物が挙げられる。下式の化合物は、工業的に製造しやすく、取扱いやすく、表面層の撥水撥油性、耐摩擦性、指紋汚れ除去性、潤滑性、耐薬品性、耐光性及び耐薬品性がさらに優れ、なかでも耐光性が特に優れる点から好ましい。下式の化合物におけるR及びQは、上述した式(1A)及び式(1B)におけるR及びQと同様であり、好ましい形態も同様である。 Examples of the compound (1) include compounds of the following formula. The compound of the following formula is industrially easy to produce and easy to handle, and the surface layer has water and oil repellency, abrasion resistance, fingerprint stain removability, lubricity, chemical resistance, light resistance and chemical resistance. Of these, light resistance is particularly excellent, which is preferable. The R f and Q f in the formula of the compound is the same as R f and Q f in the above-described formula (1A) and the formula (1B), a preferred form same.
 Qが基(g2-1)である化合物(1A)としては、例えば、下式の化合物が挙げられる。 Examples of the compound (1A) in which Q 1 is the group (g2-1) include compounds of the following formulas.
Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000008
 Qが基(g2-2)である化合物(1A)としては、例えば、下式の化合物が挙げられる。 Examples of the compound (1A) in which Q 1 is the group (g2-2) include the compounds of the following formulas.
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000011
 Qが基(g2-3)である化合物(1A)としては、例えば、下式の化合物が挙げられる。 Examples of the compound (1A) in which Q 1 is the group (g2-3) include compounds of the following formulas.
Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000012
 Qが基(g2-4)である化合物(1A)としては、例えば、下式の化合物が挙げられる。 Examples of the compound (1A) in which Q 1 is the group (g2-4) include the compounds of the following formulas.
Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000013
 Qが基(g2-6)である化合物(1A)としては、例えば、下式の化合物が挙げられる。 Examples of the compound (1A) in which Q 1 is the group (g2-6) include the compounds of the following formulas.
Figure JPOXMLDOC01-appb-C000014
Figure JPOXMLDOC01-appb-C000014
 Qが基(g2-7)である化合物(1A)としては、例えば、下式の化合物が挙げられる。 Examples of the compound (1A) in which Q 1 is the group (g2-7) include compounds of the following formulae.
Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-C000015
 Qが基(g2-9)である化合物(1A)としては、例えば、下式の化合物が挙げられる。 Examples of the compound (1A) in which Q 1 is the group (g2-9) include compounds of the following formulas.
Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000017
 Qが基(g2-1)である化合物(1B)としては、例えば、下式の化合物が挙げられる。 Examples of the compound (1B) in which Q 2 is the group (g2-1) include compounds of the following formulas.
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000018
 Qが基(g2-2)である化合物(1B)としては、例えば、下式の化合物が挙げられる。 Examples of the compound (1B) in which Q 2 is the group (g2-2) include compounds of the following formulas.
Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000019
 Qが基(g2-3)である化合物(1B)としては、例えば、下式の化合物が挙げられる。 Examples of the compound (1B) in which Q 2 is the group (g2-3) include the compounds of the following formulas.
Figure JPOXMLDOC01-appb-C000020
Figure JPOXMLDOC01-appb-C000020
 Qが基(g2-4)である化合物(1B)としては、例えば、下式の化合物が挙げられる。 Examples of the compound (1B) in which Q 2 is the group (g2-4) include the compounds of the following formulas.
Figure JPOXMLDOC01-appb-C000021
Figure JPOXMLDOC01-appb-C000021
 Qが基(g2-6)である化合物(1B)としては、例えば、下式の化合物が挙げられる。 Examples of the compound (1B) in which Q 2 is the group (g2-6) include the compounds of the following formulae.
Figure JPOXMLDOC01-appb-C000022
Figure JPOXMLDOC01-appb-C000022
 Qが基(g2-7)である化合物(1B)としては、例えば、下式の化合物が挙げられる。 Examples of the compound (1B) in which Q 2 is the group (g2-7) include compounds of the following formulas.
Figure JPOXMLDOC01-appb-C000023
Figure JPOXMLDOC01-appb-C000023
 Qが基(g2-9)である化合物(1B)としては、例えば、下式の化合物が挙げられる。 Examples of the compound (1B) in which Q 2 is the group (g2-9) include compounds of the following formulas.
Figure JPOXMLDOC01-appb-C000024
Figure JPOXMLDOC01-appb-C000024
(化合物(1A)及び化合物(1B)の製造方法)
 化合物(1A)は、例えば、化合物(2A)と、化合物(3a)又は化合物(3b)をヒドロシリル化反応させる方法によって製造できる。化合物(1B)は、例えば、化合物(2B)と、化合物(3a)又は化合物(3b)をヒドロシリル化反応させる方法によって製造できる。
 [R-]a110[-CH=CHb1 ・・・(2A)
 [CH=CH-]b2[R-]a220-Q-Q20[-Ra2[-CH=CHb2 ・・・(2B)
 ただし、式(2A)において、Q10は、2個以上の極性基が炭素数1~20の2価の有機基を介して直列に結合した部位を有するa1+b1価の連結基であり、Q10以外の符号は、式(1A)における符号と同じである。式(2B)において、Q20は、2個以上の極性基が炭素数1~20の2価の有機基を介して直列に結合した部位を有するa2+b2+1価の連結基であり、2個のQ20は同一であっても異なっていてもよく、Q20以外の符号は、式(1B)における符号と同じである。
 Q10[-CH=CHb1は、ヒドロシリル化後に化合物(1A)におけるQとなる。Q10としては、Qと同様な基が挙げられ、好ましい形態も同様である。Q20[-CH=CHb2は、ヒドロシリル化後に化合物(1B)におけるQとなる。Q20としては、Qと同様な基が挙げられ、好ましい形態も同様である。
(Method for producing compound (1A) and compound (1B))
Compound (1A) can be produced, for example, by a method in which compound (2A) and compound (3a) or compound (3b) are hydrosilylated. Compound (1B) can be produced, for example, by a method in which compound (2B) and compound (3a) or compound (3b) are hydrosilylated.
[R f −] a1 Q 10 [—CH═CH 2 ] b1 ... (2A)
[CH 2 =CH-] b2 [R f -] a2 Q 20 -Q f -Q 20 [-R f ] a2 [-CH=CH 2 ] b2 (2B)
However, in the formula (2A), Q 10 is an a1+b1 valent linking group having a site in which two or more polar groups are bonded in series via a divalent organic group having 1 to 20 carbon atoms, and Q 10 The other symbols are the same as the symbols in the formula (1A). In the formula (2B), Q 20 is an a2+b2+1-valent linking group having a site in which two or more polar groups are bonded in series via a divalent organic group having 1 to 20 carbon atoms, and two Q 2 20 may be the same or different and symbols other than Q 20 are the same as the sign in the formula (1B).
Q 10 [—CH═CH 2 ] b1 becomes Q 1 in the compound (1A) after hydrosilylation. Examples of Q 10 include the same groups as Q 1, and preferred forms are also the same. Q 20 [—CH═CH 2 ] b2 becomes Q 2 in the compound (1B) after hydrosilylation. Examples of Q 20 include the same groups as Q 2, and preferred forms are also the same.
 HSi(R)3-c(L) ・・・(3a)
 HSi(R3-k[-(OSi(R-O-Si(R)3-c(L) ・・・(3b)
 ただし、式(3a)及び式(3b)における符号は、式(1A)、式(1B)及び式(g3)における符号と同じである。化合物(3b)は、例えば、特願2018-085493号の明細書に記載の方法によって製造できる。
HSi(R) 3-c (L) c ...(3a)
HSi(R 8 ) 3-k [-(OSi(R 9 ) 2 ) p- O-Si(R) 3-c (L) c ] k ...(3b)
However, the symbols in formulas (3a) and (3b) are the same as the symbols in formulas (1A), (1B), and (g3). Compound (3b) can be produced, for example, by the method described in the specification of Japanese Patent Application No. 2018-085493.
 Q10[-CH=CHb1としては、化合物(1A)を製造しやすい点から、基(g4-1)(ただし、a1=d1+d3及びb1=d2+d4である。)、基(g4-2)(ただし、a1=e1及びb1=e2である。)、基(g4-3)(ただし、a1=1及びb1=2である。)、基(g4-4)(ただし、a1=h1及びb1=h2である。)、基(g4-5)(ただし、a1=i1及びb1=i2である。)、基(g4-6)(ただし、a1=1及びb1=1である。)、又は基(g4-7)(ただし、a1=1及びb1=2である。)が好ましい。
 Q20[-CH=CHb2としては、化合物(1B)を製造しやすい点から、基(g4-1)(ただし、a2+1=d1+d3及びb2=d2+d4である。)、基(g4-2)(ただし、a2+1=e1及びb2=e2である。)、基(g4-3)(ただし、a2+1=1及びb2=2である。)、基(g4-4)(ただし、a2+1=h1及びb2=h2である。)、基(g4-5)(ただし、a2+1=i1及びb2=i2である。)、基(g4-6)(ただし、a2+1=1及びb2=1である。)、又は基(g4-7)(ただし、a2+1=1及びb2=2である。)が好ましい。
Q 10 [-CH=CH 2 ] b1 is a group (g4-1) (provided that a1=d1+d3 and b1=d2+d4) and a group (g4-2) from the viewpoint of easy production of the compound (1A). ) (Provided that a1=e1 and b1=e2), group (g4-3) (provided that a1=1 and b1=2), group (g4-4) (provided that a1=h1 and b1=h2), a group (g4-5) (provided that a1=i1 and b1=i2), a group (g4-6) (provided that a1=1 and b1=1), Alternatively, the group (g4-7) (provided that a1=1 and b1=2) is preferable.
As Q 20 [-CH=CH 2 ] b2 , the group (g4-1) (provided that a2+1=d1+d3 and b2=d2+d4) and the group (g4-2) are used in view of easy production of the compound (1B). ) (Provided that a2+1=e1 and b2=e2), group (g4-3) (provided that a2+1=1 and b2=2), group (g4-4) (provided that a2+1=h1 and b2=h2), a group (g4-5) (provided that a2+1=i1 and b2=i2), a group (g4-6) (provided that a2+1=1 and b2=1), Alternatively, the group (g4-7) (provided that a2+1=1 and b2=2) is preferable.
Figure JPOXMLDOC01-appb-C000025
Figure JPOXMLDOC01-appb-C000025
 (-A-E-Q12-)e1C(R4-e1-e2(-Q220-CH=CHe2 ・・・(g4-2)
 -A-E-Q13-N(-Q230-CH=CH ・・・(g4-3)
 (-A-E-Q14-)h1Z(-Q240-CH=CHh2 ・・・(g4-4)
 (-A-E-Q15-)i1Si(R4-i1-i2(-Q250-CH=CHi2 ・・・(g4-5)
 -A-E-Q260-CH=CH ・・・(g4-6)
 -A-E(-Q270-CH=CH ・・・(g4-7)
(-AEQ 12 -) e1 C(R 2 ) 4-e1-e2 (-Q 220 -CH=CH 2 ) e2 ...(g4-2)
-AEQ 13 -N(-Q 230 -CH=CH 2 ) 2 ... (g4-3)
(-AEQ 14 -) h1 Z(-Q 240 -CH=CH 2 ) h2 ...(g4-4)
(-AEQ 15 -) i1 Si(R 3 ) 4-i1-i2 (-Q 250 -CH=CH 2 ) i2 ...(g4-5)
-AEQ 260 -CH=CH 2 ... (g4-6)
-AE(-Q 270 -CH=CH 2 ) 2 ... (g4-7)
 ただし、Q220は、アルキレン基、炭素数2以上のアルキレン基の炭素-炭素原子間に-O-を有する基、アルキレン基のSiに接続しない側の末端に-O-を有する基、又は炭素数2以上のアルキレン基の炭素-炭素原子間に-O-を有しかつSiに接続しない側の末端に-O-を有する基であり、2以上のQ220は同一であっても異なっていてもよい。Q230は、アルキレン基、又は炭素数2以上のアルキレン基の炭素-炭素原子間に-O-を有する基であり、2以上のQ230は同一であっても異なっていてもよい。Q240は、Q240が結合するZにおける原子が炭素原子の場合、Q220であり、Q240が結合するZにおける原子が窒素原子の場合、Q230であり、2以上のQ240は同一であっても異なっていてもよい。Q250は、アルキレン基、又は炭素数2以上のアルキレン基の炭素-炭素原子間に-O-を有する基であり、2以上のQ250は同一であっても異なっていてもよい。Q260は、アルキレン基、又は炭素数2以上のアルキレン基の炭素-炭素原子間に-O-を有する基である。Q270は、アルキレン基、又は炭素数2以上のアルキレン基の炭素-炭素原子間に-O-を有する基であり、2個のQ270は同一であっても異なっていてもよい。Q220、Q230、Q240、Q250、Q260及びQ270以外の符号は、式(g2-1)~式(g2-7)における符号と同じである。 However, Q 220 is an alkylene group, a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms, a group having —O— at the terminal of the alkylene group which is not connected to Si, or carbon. A group having -O- between carbon-carbon atoms of an alkylene group of 2 or more and having -O- at the terminal not connected to Si, and 2 or more of Q 220 may be the same or different. May be. Q 230 is an alkylene group or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms, and two or more Q 230 may be the same or different. Q 240 is Q 220 when the atom in Z to which Q 240 is bonded is a carbon atom, and Q 230 when the atom in Z to which Q 240 is bonded is a nitrogen atom, and two or more Q 240 are the same. It may or may not be. Q 250 is an alkylene group or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms, and 2 or more Q 250 may be the same or different. Q 260 is an alkylene group or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms. Q 270 is an alkylene group or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms, and two Q 270 may be the same or different. Codes other than Q 220 , Q 230 , Q 240 , Q 250 , Q 260, and Q 270 are the same as those in formulas (g2-1) to (g2-7).
 Q220-CH=CHは、ヒドロシリル化後に化合物(1)におけるQ22となる。Q220としては、Q22と同様な基が挙げられ、好ましい形態も同様である。
 Q230-CH=CHは、ヒドロシリル化後に化合物(1)におけるQ23となる。Q230としては、Q23と同様な基が挙げられ、好ましい形態も同様である。
 Q240-CH=CHは、ヒドロシリル化後に化合物(1)におけるQ24となる。Q240としては、Q24と同様な基が挙げられ、好ましい形態も同様である。
 Q250-CH=CHは、ヒドロシリル化後に化合物(1)におけるQ25となる。Q250としては、Q25と同様な基が挙げられ、好ましい形態も同様である。
 Q260-CH=CHは、ヒドロシリル化後に化合物(1)におけるQ26となる。Q260としては、Q26と同様な基が挙げられ、好ましい形態も同様である。
 Q270-CH=CHは、ヒドロシリル化後に化合物(1)におけるQ27となる。Q270としては、Q27と同様な基が挙げられ、好ましい形態も同様である。
Q 220 -CH=CH 2 becomes Q 22 in the compound (1) after hydrosilylation. Examples of Q 220 include the same groups as Q 22, and preferred forms are also the same.
Q 230 —CH═CH 2 becomes Q 23 in the compound (1) after hydrosilylation. Examples of Q 230 include the same groups as Q 23, and preferred forms are also the same.
Q 240 —CH═CH 2 becomes Q 24 in the compound (1) after hydrosilylation. Examples of Q 240 include the same groups as Q 24, and the preferred forms are also the same.
Q 250 —CH═CH 2 becomes Q 25 in the compound (1) after hydrosilylation. Examples of Q 250 include the same groups as Q 25, and preferred forms are also the same.
Q 260 —CH═CH 2 becomes Q 26 in the compound (1) after hydrosilylation. Examples of Q 260 include the same groups as Q 26, and preferred forms are also the same.
Q 270 -CH = CH 2 is a Q 27 in after the hydrosilylation compound (1). Examples of Q 270 include the same groups as Q 27, and preferred forms are also the same.
 Q10[-CH=CHb1の他の形態としては、基(g4-8)(ただし、a1=d1+d3及びb1=kの合計である。)、基(g4-9)(ただし、a1=e1及びb1=kの合計である。)、基(g4-10)(ただし、a1=1及びb1=kの合計である。)、基(g4-11)(ただし、a1=h1及びb1=kの合計である。)、基(g4-12)(ただし、a1=i1及びb1=kの合計である。)、基(g4-13)(ただし、a1=1及びb1=kである。)、又は基(g4-14)(ただし、a1=1及びb1=kの合計である。)が挙げられる。
 Q20[-CH=CHb2の他の形態としては、基(g4-8)(ただし、a2+1=d1+d3及びb2=kの合計である。)、基(g4-9)(ただし、a2+1=e1及びb2=kの合計である。)、基(g4-10)(ただし、a2+1=1及びb2=kの合計である。)、基(g4-11)(ただし、a2+1=h1及びb2=kの合計である。)、基(g4-12)(ただし、a2+1=i1及びb2=kの合計である。)、基(g4-13)(ただし、a2+1=1及びb2=kである。)、又は基(g4-14)(ただし、a2+1=1及びb2=kの合計である。)が挙げられる。
Other forms of Q 10 [—CH═CH 2 ] b1 include a group (g4-8) (provided that a1=d1+d3 and b1=k are the sum), and a group (g4-9) (provided that a1 =e1 and b1=k), a group (g4-10) (provided that a1=1 and b1=k are the same), and a group (g4-11) (where a1=h1 and b1). = The sum of k), the group (g4-12) (however, it is the sum of a1=i1 and b1=k), and the group (g4-13) (however, a1=1 and b1=k). .) or a group (g4-14) (provided that it is the sum of a1=1 and b1=k).
Other forms of Q 20 [-CH=CH 2 ] b2 include the group (g4-8) (provided that a2+1=d1+d3 and b2=k are the same) and the group (g4-9) (provided that a2+1). =e1 and b2=k), a group (g4-10) (provided that a2+1=1 and b2=k are provided), and a group (g4-11) (where a2+1=h1 and b2). =k is the total), group (g4-12) (where a2+1=i1 and b2=k is the total), group (g4-13) (where a2+1=1 and b2=k). .) or a group (g4-14) (provided that it is the sum of a2+1=1 and b2=k).
Figure JPOXMLDOC01-appb-C000026
Figure JPOXMLDOC01-appb-C000026
 (-A-E-Q12-)e1C(R4-e1-e2(-Q22-Ge2 ・・・(g4-9)
 -A-E-Q13-N(-Q23-G ・・・(g4-10)
 (-A-E-Q14-)h1Z(-Q24-Gh2 ・・・(g4-11)
 (-A-E-Q15-)i1Si(R4-i1-i2(-Q25-Gi2 ・・・(g4-12)
 -A-E-Q26-G ・・・(g4-13)
 -A-E(-Q27-G ・・・(g4-14)
(-AEQ 12 -) e1 C(R 2 ) 4-e1-e2 (-Q 22 -G 1 ) e2 ... (g4-9)
-AEQ 13 -N(-Q 23 -G 1 ) 2 ... (g4-10)
(-AEQ 14 -) h1 Z(-Q 24 -G 1 ) h2 ...(g4-11)
(-AEQ 15 -) i1 Si(R 3 ) 4-i1-i2 (-Q 25 -G 1 ) i2 ... (g4-12)
-AEQ 26 -G 1 ... (g4-13)
-AE (-Q 27 -G 1 ) 2 ... (g4-14)
 ただし、Gは、基(g5)であり、Q10[-CH=CHb1又はQ20[-CH=CHb2が有する2以上のGは同一であっても異なっていてもよく、G以外の符号は、式(g2-1)~式(g2-7)における符号と同じである。
 -Si(R3-k(-Q30-CH=CH ・・・(g5)
 ただし、Q30は、アルキレン基、又は炭素数2以上のアルキレン基の炭素-炭素原子間に-O-を有する基であり、2以上のQ30は同一であっても異なっていてもよく、Q30以外の符号は、式(g3)における符号と同じである。
 Q30-CH=CHは、ヒドロシリル化後に基(g3)におけるQとなる。Q30としては、Qと同様な基が挙げられ(ただし、-(OSi(R-O-を除く。)、好ましい形態も同様である。
However, G 1 is a group (g5), and two or more G 1 s that Q 10 [—CH═CH 2 ] b1 or Q 20 [—CH═CH 2 ] b2 have are the same or different. The symbols other than G 1 are the same as the symbols in the formulas (g2-1) to (g2-7).
-Si(R 8 ) 3-k (-Q 30 -CH=CH 2 ) k ... (g5)
However, Q 30 is an alkylene group or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms, and 2 or more Q 30 may be the same or different, Codes other than Q 30 are the same as the codes in the formula (g3).
Q 30 —CH═CH 2 becomes Q 3 in the group (g3) after hydrosilylation. Examples of Q 30 include the same groups as Q 3 (provided that —(OSi(R 9 ) 2 ) p —O— is excluded.), and preferred forms are also the same.
(化合物(2A)及び化合物(2B)の製造方法)
 化合物(2A)は、極性部位Eが-C(O)NH-Q-C(O)NH-である場合、例えば、下記の手順にて製造できる。
(Method for producing compound (2A) and compound (2B))
Compound (2A) can be produced, for example, by the following procedure when polar site E is —C(O)NH—Q 4 —C(O)NH—.
 化合物(4A)と化合物(5)とをアミド化反応させて化合物(6A)を得る。
 [HN-]a1100[-CH=CHb1 ・・・(4A)
 Pro-NH-Q-C(O)OH ・・・(5)
 [Pro-NH-Q-C(O)NH-]a1100[-CH=CHb1 ・・・(6A)
 ただし、Q100は、Q10から極性部位Eを除いた基であり、Proは、アミノ基の保護基であり、Qは、2価の有機基であり、Pro及びQ以外の符号は、式(2A)における符号と同じである。
 アミノ基の保護基としては、tert-ブトキシカルボニル基(Boc)、ベンジルオキシカルボニル基、9-フルオレニルオキシカルボキシ基、2,2,2-トリクロロエトキシカルボニル基、アリルオキシカルボニル基、アセチル基、ベンゾイル基、ベンジル基等が挙げられる。
The compound (4A) and the compound (5) are subjected to an amidation reaction to obtain the compound (6A).
[H 2 N-] a1 Q 100 [-CH=CH 2 ] b1 (4A)
Pro-NH-Q 4 -C(O)OH (5)
[Pro-NH-Q 4 -C(O)NH-] a1 Q 100 [-CH=CH 2 ] b1 ... (6A)
However, Q 100 is a group obtained by removing the polar moiety E from Q 10 , Pro is a protecting group for an amino group, Q 4 is a divalent organic group, and symbols other than Pro and Q 4 are , The same as the sign in the formula (2A).
Examples of the amino-protecting group include a tert-butoxycarbonyl group (Boc), a benzyloxycarbonyl group, a 9-fluorenyloxycarboxy group, a 2,2,2-trichloroethoxycarbonyl group, an allyloxycarbonyl group, an acetyl group, Examples thereof include benzoyl group and benzyl group.
 化合物(4A)は、市販の化合物として入手できる。また、化合物(4A)は、例えば、特許文献1に記載の方法、国際公開第2019/039186号に記載の方法によって製造できる。
 化合物(5)は、例えば、市販のN-保護アミノ酸(N-Boc-グリシン、N-Boc-β-アラニン等)として入手できる。
Compound (4A) is available as a commercially available compound. In addition, compound (4A) can be produced, for example, by the method described in Patent Document 1 or the method described in International Publication No. 2019/039186.
The compound (5) is available, for example, as a commercially available N-protected amino acid (N-Boc-glycine, N-Boc-β-alanine, etc.).
 化合物(6A)の保護基を脱保護して、化合物(7A)を得る。
 [HN-Q-C(O)NH-]a1100[-CH=CHb1 ・・・(7A)
 ただし、式(7A)における符号は、式(6A)における符号と同じである。
The protecting group of compound (6A) is deprotected to give compound (7A).
[H 2 N-Q 4 -C(O)NH-] a1 Q 100 [-CH=CH 2 ] b1 (7A)
However, the sign in Expression (7A) is the same as the sign in Expression (6A).
 化合物(7A)と化合物(8a)とをアミド化反応させて化合物(2Aa)を得る。
 R-C(O)-X ・・・(8a)
 [R-C(O)NH-Q-C(O)NH-]a1100[-CH=CHb1
 ・・・(2Aa)
 ただし、Xは、ハロゲン原子、アルコキシ基又は水酸基であり、X以外の符号は、式(2A)における符号と同じである。
The compound (7A) and the compound (8a) are subjected to an amidation reaction to obtain the compound (2Aa).
R f -C(O)-X (8a)
[R f -C(O)NH-Q 4 -C(O)NH-] a1 Q 100 [-CH=CH 2 ] b1
...(2Aa)
However, X is a halogen atom, an alkoxy group, or a hydroxyl group, and symbols other than X are the same as the symbols in Formula (2A).
 化合物(8a)は、例えば、国際公開第2009/008380号に記載の方法、国際公開第2013/121984号に記載の方法、国際公開第2013/121986号に記載の方法、国際公開第2015/087902号に記載の方法、国際公開第2017/038830号に記載の方法、国際公開第2017/038832号に記載の方法、国際公開第2018/143433号に記載の方法、国際公開第2018/216630号に記載の方法によって製造できる。 The compound (8a) can be produced, for example, by the method described in WO 2009/008380, the method described in WO 2013/121984, the method described in WO 2013/121986, or WO 2015/087902. In WO2017/038830, in WO2017/038832, in WO2018/143433, in WO2018/216630. It can be produced by the described method.
 極性部位Eが-C(O)NH-Q-C(O)NH-以外の化合物(2A)は、例えば、実施例に記載の方法によって製造できる。 The compound (2A) in which the polar moiety E is other than —C(O)NH—Q 4 —C(O)NH— can be produced, for example, by the method described in Examples.
 化合物(2B)は、極性部位Eが-C(O)NH-Q-C(O)NH-であり、a2が0の場合、例えば、下記の手順にて製造できる。
 化合物(4B)と化合物(5)とをアミド化反応させて化合物(6B)を得る。
 HN-Q200[-CH=CHb2 ・・・(4B)
 Pro-NH-Q-C(O)OH ・・・(5)
 Pro-NH-Q-C(O)NH-Q200[-CH=CHb2 ・・・(6B)
 ただし、Q200は、Q20から極性部位Eを除いた基であり、Proは、アミノ基の保護基であり、Qは、2価の有機基であり、Pro及びQ以外の符号は、式(2B)における符号と同じである。
When the polar moiety E is —C(O)NH—Q 4 —C(O)NH— and a2 is 0, the compound (2B) can be produced, for example, by the following procedure.
The compound (4B) and the compound (5) are subjected to an amidation reaction to obtain the compound (6B).
H 2 NQ 200 [-CH=CH 2 ] b2 ... (4B)
Pro-NH-Q 4 -C(O)OH (5)
Pro-NH-Q 4 -C(O)NH-Q 200 [-CH=CH 2 ] b2 ... (6B)
However, Q 200 is a group obtained by removing the polar moiety E from Q 20 , Pro is a protecting group for an amino group, Q 4 is a divalent organic group, and symbols other than Pro and Q 4 are , Which is the same as the sign in Expression (2B).
 化合物(6B)の保護基を脱保護して、化合物(7B)を得る。
 HN-Q-C(O)NH-Q200[-CH=CHb2 ・・・(7B)
 ただし、式(7B)における符号は、式(2B)、式(6B)における符号と同じである。
The protecting group of compound (6B) is deprotected to give compound (7B).
H 2 N-Q 4 -C(O)NH-Q 200 [-CH=CH 2 ] b2 ... (7B)
However, the sign in Expression (7B) is the same as the sign in Expression (2B) and Expression (6B).
 化合物(7B)と化合物(8b)とをアミド化反応させて化合物(2Ba)を得る。
 X-C(O)-Q-C(O)-X ・・・(8b)
 [CH=CH-]b2200-NHC(O)-Q-NHC(O)-Q-C(O)NH-Q-C(O)NH-Q200[-CH=CHb2 ・・・(2Ba)
 ただし、Xは、ハロゲン原子、アルコキシ基又は水酸基であり、X以外の符号は、式(2B)、式(6B)における符号と同じである。
 化合物(8b)は、化合物(8a)と同様の方法で製造できる。
The compound (7B) and the compound (8b) are subjected to an amidation reaction to obtain the compound (2Ba).
X-C(O)-Q f -C(O)-X... (8b)
[CH 2 ═CH-] b2 Q 200 -NHC(O)-Q 4 -NHC(O)-Q f -C(O)NH-Q 4 -C(O)NH-Q 200 [-CH=CH 2 ] B2 ...(2Ba)
However, X is a halogen atom, an alkoxy group, or a hydroxyl group, and the symbols other than X are the same as the symbols in Formula (2B) and Formula (6B).
Compound (8b) can be produced by the same method as for compound (8a).
 以上説明した化合物(1)にあっては、下記の理由から、耐摩擦性及び指紋汚れ除去性に優れる表面層を形成できる。
 化合物(1)は、極性部位Eを有するため、分子間相互作用(水素結合又は双極子相互作用)によって分子間で架橋しやすい。そのため、表面層においても、基材に結合した化合物(1)同士で架橋している。そのため、反応性シリル基に由来する基材との結合部分が切断されても、化合物(1)が表面層にとどまりやすい。そのため、表面層の耐摩擦性及び指紋汚れ除去性に優れる。
With the compound (1) described above, a surface layer having excellent abrasion resistance and fingerprint stain removability can be formed for the following reasons.
Since the compound (1) has the polar moiety E, it is easily crosslinked between molecules by intermolecular interaction (hydrogen bond or dipole interaction). Therefore, also in the surface layer, the compounds (1) bonded to the substrate are crosslinked. Therefore, the compound (1) is likely to remain in the surface layer even if the bonding portion derived from the reactive silyl group with the substrate is cleaved. Therefore, the surface layer has excellent abrasion resistance and fingerprint stain removability.
[含フッ素化合物含有組成物]
 本発明の含フッ素化合物含有組成物(以下、「本組成物」とも記す。)は、化合物(1)の1種以上と、他の含フッ素化合物とを含む。
[Fluorine-containing compound-containing composition]
The fluorine-containing compound-containing composition of the present invention (hereinafter, also referred to as “present composition”) contains at least one compound (1) and another fluorine-containing compound.
 他の含フッ素化合物としては、化合物(1)の製造工程で副生する含フッ素化合物(以下、「副生含フッ素化合物」とも記す。)、化合物(1)と同様の用途に用いられる公知の含フッ素化合物等が挙げられる。
 他の含フッ素化合物としては、化合物(1)の特性を低下させるおそれが少ない化合物が好ましい。
As the other fluorine-containing compound, a fluorine-containing compound that is by-produced in the production process of compound (1) (hereinafter, also referred to as “by-product fluorine-containing compound”) and a known compound used for the same purpose as compound (1) Examples thereof include fluorine-containing compounds.
As the other fluorine-containing compound, a compound that is less likely to deteriorate the characteristics of the compound (1) is preferable.
 副生含フッ素化合物としては、未反応の化合物(2A)又は化合物(2B)、化合物(1)の製造におけるヒドロシリル化の際にアリル基の一部がインナーオレフィンに異性化した含フッ素化合物等が挙げられる。
 公知の含フッ素化合物としては、表面処理剤として市販されている含フッ素化合物等が挙げられる。本組成物が公知の含フッ素化合物を含む場合、(1)の特性を補う等の新たな作用効果が発揮される場合がある。
Examples of the by-product fluorine-containing compound include unreacted compound (2A) or compound (2B), and a fluorine-containing compound in which a part of the allyl group is isomerized to an inner olefin during hydrosilylation in the production of compound (1). Can be mentioned.
Examples of known fluorine-containing compounds include fluorine-containing compounds that are commercially available as surface treatment agents. When the composition contains a known fluorine-containing compound, a new action effect such as supplementing the characteristic (1) may be exhibited.
 化合物(1)の含有量は、本組成物のうち、60質量%以上100質量%未満が好ましく、70質量%以上100質量%未満がより好ましく、80質量%以上100質量%未満が特に好ましい。
 他の含フッ素化合物の含有量は、本組成物のうち、0質量%超40質量%以下が好ましく、0質量%超30質量%以下がより好ましく、0質量%超20質量%以下が特に好ましい。
 化合物(1)の含有量及び他の含フッ素化合物の含有量の合計は、本組成物のうち、80~100質量%が好ましく、85~100質量%が特に好ましい。
 化合物(1)の含有量及び他の含フッ素化合物の含有量が前記範囲内であれば、表面層の初期の撥水撥油性、耐摩擦性、指紋汚れ除去性、耐光性及び耐薬品性がさらに優れる。
In the present composition, the content of the compound (1) is preferably 60% by mass or more and less than 100% by mass, more preferably 70% by mass or more and less than 100% by mass, and particularly preferably 80% by mass or more and less than 100% by mass.
In the present composition, the content of the other fluorine-containing compound is preferably more than 0 mass% and 40 mass% or less, more preferably more than 0 mass% and 30 mass% or less, particularly preferably more than 0 mass% and 20 mass% or less. ..
The total content of the compound (1) and the content of other fluorine-containing compounds is preferably 80 to 100% by mass, and particularly preferably 85 to 100% by mass in the present composition.
When the content of the compound (1) and the content of other fluorine-containing compounds are within the above ranges, the initial water/oil repellency, abrasion resistance, fingerprint stain removability, light resistance and chemical resistance of the surface layer are Even better.
 本組成物は、本発明の効果を損なわない範囲において、化合物(1)及び他の含フッ素化合物以外の成分を含んでいてもよい。
 他の成分としては、(1)や公知の含フッ素化合物の製造工程で生成した副生物(ただし、副生含フッ素化合物を除く。)、未反応の原料等の製造上不可避の化合物が挙げられる。
 また、他の成分としては、加水分解性シリル基の加水分解と縮合反応を促進する酸触媒や塩基性触媒等の添加剤が挙げられる。酸触媒としては、塩酸、硝酸、酢酸、硫酸、燐酸、スルホン酸、メタンスルホン酸、p-トルエンスルホン酸等が挙げられる。塩基性触媒としては、水酸化ナトリウム、水酸化カリウム、アンモニア等が挙げられる。
 他の成分の含有量は、本組成物のうち、0~9.999質量%が好ましく、0~0.99質量%が特に好ましい。
The present composition may contain components other than the compound (1) and other fluorine-containing compounds as long as the effects of the present invention are not impaired.
Other components include (1) and by-products (however, by-product fluorine-containing compounds are excluded) generated in the known production process of fluorine-containing compounds, unreacted raw materials, and other inevitable compounds in production. ..
Other components include additives such as acid catalysts and basic catalysts that accelerate the hydrolysis and condensation reaction of the hydrolyzable silyl group. Examples of the acid catalyst include hydrochloric acid, nitric acid, acetic acid, sulfuric acid, phosphoric acid, sulfonic acid, methanesulfonic acid, p-toluenesulfonic acid and the like. Examples of the basic catalyst include sodium hydroxide, potassium hydroxide, ammonia and the like.
The content of the other components is preferably 0 to 9.999% by mass, and particularly preferably 0 to 0.99% by mass in the composition.
[コーティング液]
 本発明のコーティング液(以下、「本コーティング液」とも記す。)は、化合物(1)又は本組成物と液状媒体とを含む。本コーティング液は、溶液であっても分散液であってもよい。
[Coating liquid]
The coating liquid of the present invention (hereinafter, also referred to as “present coating liquid”) contains the compound (1) or the present composition and a liquid medium. The coating liquid may be a solution or a dispersion liquid.
 液状媒体としては、有機溶媒が好ましい。有機溶媒は、含フッ素有機溶媒でも非フッ素有機溶媒でもよく、両溶媒を含んでもよい。
 含フッ素有機溶媒としては、フッ素化アルカン、フッ素化芳香族化合物、フルオロアルキルエーテル、フッ素化アルキルアミン、フルオロアルコール等が挙げられる。
 フッ素化アルカンとしては、炭素数4~8の化合物が好ましい。市販品としては、C13H(AGC社製、アサヒクリン(登録商標)AC-2000)、C13(AGC社製、アサヒクリン(登録商標)AC-6000)、CCHFCHFCF(ケマーズ社製、バートレル(登録商標)XF)等が挙げられる。
 フッ素化芳香族化合物としては、ヘキサフルオロベンゼン、トリフルオロメチルベンゼン、ペルフルオロトルエン、ビス(トリフルオロメチル)ベンゼン等が挙げられる。
 フルオロアルキルエーテルとしては、炭素数4~12の化合物が好ましい。市販品としては、CFCHOCFCFH(AGC社製、アサヒクリン(登録商標)AE-3000)、COCH(3M社製、ノベック(登録商標)7100)、COC(3M社製、ノベック(登録商標)7200)、CCF(OCH)C(3M社製、ノベック(登録商標)7300)等が挙げられる。
 フッ素化アルキルアミンとしては、ペルフルオロトリプロピルアミン、ペルフルオロトリブチルアミン等が挙げられる。
 フルオロアルコールとしては、2,2,3,3-テトラフルオロプロパノール、2,2,2-トリフルオロエタノール、ヘキサフルオロイソプロパノール等が挙げられる。
 非フッ素有機溶媒としては、水素原子及び炭素原子のみからなる化合物と、水素原子、炭素原子及び酸素原子のみからなる化合物が好ましく、炭化水素、アルコール、ケトン、エーテル、エステルが挙げられる。
 液状媒体は、2種以上を混合した混合媒体であってもよい。
The liquid medium is preferably an organic solvent. The organic solvent may be a fluorine-containing organic solvent or a non-fluorine organic solvent, or may include both solvents.
Examples of the fluorine-containing organic solvent include fluorinated alkanes, fluorinated aromatic compounds, fluoroalkyl ethers, fluorinated alkylamines and fluoroalcohols.
As the fluorinated alkane, a compound having 4 to 8 carbon atoms is preferable. Examples of commercially available products include C 6 F 13 H (manufactured by AGC, Asahiclin (registered trademark) AC-2000), C 6 F 13 C 2 H 5 (manufactured by AGC, Asahiclin (registered trademark) AC-6000), C 2 F 5 CHFCHFCF 3 (Kemazu Co., Vertrel (R) XF) and the like.
Examples of the fluorinated aromatic compound include hexafluorobenzene, trifluoromethylbenzene, perfluorotoluene, bis(trifluoromethyl)benzene and the like.
As the fluoroalkyl ether, a compound having 4 to 12 carbon atoms is preferable. Commercially available products include CF 3 CH 2 OCF 2 CF 2 H (manufactured by AGC, ASAHIKLIN (registered trademark) AE-3000), C 4 F 9 OCH 3 (manufactured by 3M, Novec (registered trademark) 7100), and C. 4 F 9 OC 2 H 5 ( 3M Co., Novec (TM) 7200), C 2 F 5 CF (OCH 3) C 3 F 7 (3M Co., Novec (TM) 7300), and the like.
Examples of the fluorinated alkylamine include perfluorotripropylamine and perfluorotributylamine.
Examples of the fluoroalcohol include 2,2,3,3-tetrafluoropropanol, 2,2,2-trifluoroethanol and hexafluoroisopropanol.
The non-fluorine organic solvent is preferably a compound containing only hydrogen atoms and carbon atoms and a compound containing only hydrogen atoms, carbon atoms and oxygen atoms, and examples thereof include hydrocarbons, alcohols, ketones, ethers and esters.
The liquid medium may be a mixed medium in which two or more kinds are mixed.
 化合物(1)又は本組成物の含有量は、本コーティング液のうち、0.001~10質量%が好ましく、0.01~1質量%が特に好ましい。
 液状媒体の含有量は、本コーティング液のうち、90~99.999質量%が好ましく、99~99.99質量%が特に好ましい。
The content of the compound (1) or the present composition is preferably 0.001 to 10% by mass, and particularly preferably 0.01 to 1% by mass in the present coating liquid.
The content of the liquid medium in the coating liquid is preferably 90 to 99.999% by mass, and particularly preferably 99 to 99.99% by mass.
[物品]
 本発明の物品(以下、「本物品」とも記す。)は、化合物(1)又は本組成物から形成された表面層を基材の表面に有する。表面層は、基材の表面の一部に形成されてもよく、基材のすべての表面に形成されてもよい。表面層は、基材の表面に膜状に拡がってもよく、ドット状に点在してもよい。
 表面層は、化合物(1)を、化合物(1)の加水分解性シリル基の一部又は全部が加水分解反応し、かつシラノール基が脱水縮合反応した状態で含む。
[Item]
The article of the present invention (hereinafter, also referred to as “the article”) has a surface layer formed from the compound (1) or the composition on the surface of a substrate. The surface layer may be formed on a part of the surface of the base material or may be formed on the entire surface of the base material. The surface layer may be spread like a film on the surface of the substrate, or may be scattered in dots.
The surface layer contains the compound (1) in a state where a part or all of the hydrolyzable silyl groups of the compound (1) are hydrolyzed and the silanol groups are dehydrated and condensed.
 表面層の厚さは、1~100nmが好ましく、1~50nmが特に好ましい。表面層の厚さが1nm以上であれば、表面処理による効果が充分に得られやすい。表面層の厚さが100nm以下であれば、利用効率が高い。表面層の厚さは、薄膜解析用X線回折計(RIGAKU社製、ATX-G)を用いて、X線反射率法によって反射X線の干渉パターンを得て、干渉パターンの振動周期から算出できる。 The thickness of the surface layer is preferably 1 to 100 nm, particularly preferably 1 to 50 nm. When the thickness of the surface layer is 1 nm or more, the effect of the surface treatment is likely to be sufficiently obtained. When the thickness of the surface layer is 100 nm or less, the utilization efficiency is high. The thickness of the surface layer is calculated from the vibration period of the interference pattern by obtaining the interference pattern of the reflected X-ray by the X-ray reflectance method using an X-ray diffractometer for thin film analysis (RIGAKU, ATX-G). it can.
 基材としては、撥水撥油性の付与が求められている基材が挙げられる。例えば、他の物品(例えばスタイラス)や人の手指を接触させて使用することがある基材、操作時に人の手指で持つことがある基材、他の物品(例えば載置台)の上に置くことがある基材が挙げられる。
 基材の材料としては、金属、樹脂、ガラス、サファイア、セラミック、石、これらの複合材料が挙げられる。ガラスは化学強化されていてもよい。基材の表面にはSiO膜等の下地膜が形成されていてもよい。
 基材としては、タッチパネル用基材、ディスプレイ用基材、メガネレンズが好適であり、タッチパネル用基材が特に好適である。タッチパネル用基材の材料としては、ガラス又は透明樹脂が好ましい。
 また、基材としては、携帯電話(例えばスマートフォン)、携帯情報端末(例えばタブレット端末)、ゲーム機、リモコン等の機器における外装部分(表示部を除く)に使用する、ガラス又は樹脂フィルムも好ましい。
Examples of the base material include base materials that are required to have water and oil repellency. For example, place it on another article (such as a stylus) or a substrate that may be used by touching the human fingers, a substrate that may be held by the human fingers during operation, or another article (such as a mounting table). There are occasional base materials.
Examples of the material of the base material include metal, resin, glass, sapphire, ceramic, stone, and composite materials thereof. The glass may be chemically strengthened. A base film such as a SiO 2 film may be formed on the surface of the base material.
As the base material, a base material for a touch panel, a base material for a display and a spectacle lens are suitable, and a base material for a touch panel is particularly suitable. As a material for the touch panel substrate, glass or transparent resin is preferable.
In addition, as the base material, a glass or a resin film used for an exterior portion (excluding the display portion) of a device such as a mobile phone (for example, a smartphone), a mobile information terminal (for example, a tablet terminal), a game machine, a remote controller is also preferable.
[物品の製造方法]
 本物品は、例えば、下記の方法で製造できる。
 ・化合物(1)又は本組成物を用いたドライコーティング法によって基材の表面を処理して、化合物(1)又は本組成物から形成された表面層を基材の表面に形成する方法。
 ・ウェットコーティング法によって本コーティング液を基材の表面に塗布し、乾燥させて、化合物(1)又は本組成物から形成された表面層を基材の表面に形成する方法。
[Production method]
The present article can be produced, for example, by the following method.
A method of treating the surface of a substrate by a dry coating method using the compound (1) or the composition to form a surface layer formed from the compound (1) or the composition on the surface of the substrate.
A method in which the present coating liquid is applied to the surface of a substrate by a wet coating method and dried to form a surface layer formed of the compound (1) or the composition on the surface of the substrate.
 ドライコーティング法としては、真空蒸着、CVD、スパッタリング等の手法が挙げられる。ドライコーティング法としては、化合物(1)の分解を抑える点、及び装置の簡便さの点から、真空蒸着法が好ましい。真空蒸着時には、鉄、鋼等の金属多孔体に化合物(1)又は本組成物を含浸させたペレット状物質を用いてもよい。本コーティング液を鉄、鋼等の金属多孔体に含浸させ、液状媒体を乾燥させて、化合物(1)又は本組成物が含浸したペレット状物質を用いてもよい。 Examples of dry coating methods include vacuum deposition, CVD, and sputtering. As the dry coating method, the vacuum deposition method is preferable from the viewpoint of suppressing the decomposition of the compound (1) and the simplicity of the apparatus. At the time of vacuum deposition, a pellet-like substance obtained by impregnating a porous metal body such as iron or steel with the compound (1) or the present composition may be used. A pellet-like substance impregnated with the compound (1) or the present composition may be used by impregnating the coating liquid with a porous metal such as iron or steel and drying the liquid medium.
 ウェットコーティング法としては、スピンコート法、ワイプコート法、スプレーコート法、スキージーコート法、ディップコート法、ダイコート法、インクジェット法、フローコート法、ロールコート法、キャスト法、ラングミュア・ブロジェット法、グラビアコート法等が挙げられる。 Wet coating methods include spin coating method, wipe coating method, spray coating method, squeegee coating method, dip coating method, die coating method, inkjet method, flow coating method, roll coating method, casting method, Langmuir-Blodgett method, gravure method. A coating method and the like can be mentioned.
 以下に実施例を用いて本発明をさらに詳しく説明するが、本発明はこれら実施例に限定されるものではない。以下において「%」は特に断りのない限り「質量%」である。なお、例1~22、31、32~53、62は実施例であり、例23~30、54~61は比較例である。 The present invention will be described in more detail below with reference to examples, but the present invention is not limited to these examples. In the following, “%” is “mass %” unless otherwise specified. Note that Examples 1 to 22, 31, 32 to 53 and 62 are Examples, and Examples 23 to 30 and 54 to 61 are Comparative Examples.
[例1]
(例1-1)
 1000mLの四ツ口フラスコにアセトニトリルの2.1g、テトラヒドロフラン(以下、「THF」とも記す。)500mLを加え、窒素雰囲気下、ドライアイス-アセトンバスで冷却しながら撹拌した。その後、リチウムジイソプロピルアミドのヘキサン溶液(1.1モル/L、アルドリッチ社製)の50mLを添加した後、臭化アリル(東京化成工業社製)の7.5gを添加した。フラスコ内の内容物を25℃に戻しながら撹拌した。その後、1N塩酸水溶液の300mLを加え、塩化メチレンを用いて分液操作した。得られた有機層を硫酸マグネシウムで乾燥した後、固体をろ過によって取り除き、液体を濃縮した。得られた粗体をシリカゲルカラムクロマトグラフィで精製し、化合物(4-1)を得た。
[Example 1]
(Example 1-1)
2.1 g of acetonitrile and 500 mL of tetrahydrofuran (hereinafter, also referred to as “THF”) were added to a 1000 mL four-necked flask, and the mixture was stirred under a nitrogen atmosphere while cooling with a dry ice-acetone bath. Thereafter, 50 mL of a hexane solution of lithium diisopropylamide (1.1 mol/L, manufactured by Aldrich) was added, and then 7.5 g of allyl bromide (manufactured by Tokyo Chemical Industry Co., Ltd.) was added. The contents in the flask were stirred while returning to 25°C. Then, 300 mL of a 1N hydrochloric acid aqueous solution was added, and liquid separation operation was performed using methylene chloride. The obtained organic layer was dried over magnesium sulfate, solids were removed by filtration, and the liquid was concentrated. The obtained crude product was purified by silica gel column chromatography to obtain compound (4-1).
 300mLのナスフラスコに化合物(5-1)(東京化成工業社製)の6.4g(36mmоl)、ジクロロメタンの150mL、4-ジメチルアミノピリジンの4.6g及び1-(3-ジメチルアミノプロピル)-3-エチルカルボジイミド塩酸塩の7.0g(38mmol)を入れ、撹拌した。化合物(4-1)の5.0g(30mmol)を添加し、25℃にて12時間撹拌した。得られた溶液にイオン交換水の50mLを添加し、ジクロロメタンの100mLで二度抽出操作した。得られた溶液をカラム精製した後、化合物(6-1)の7.5gを得た。 In a 300 mL eggplant-shaped flask, 6.4 g (36 mm) of compound (5-1) (manufactured by Tokyo Chemical Industry Co., Ltd.), 150 mL of dichloromethane, 4.6 g of 4-dimethylaminopyridine and 1-(3-dimethylaminopropyl)- 7.0 g (38 mmol) of 3-ethylcarbodiimide hydrochloride was added and stirred. 5.0 g (30 mmol) of compound (4-1) was added, and the mixture was stirred at 25° C. for 12 hours. 50 mL of ion-exchanged water was added to the obtained solution, and extraction operation was performed twice with 100 mL of dichloromethane. After column purification of the obtained solution, 7.5 g of compound (6-1) was obtained.
Figure JPOXMLDOC01-appb-C000027
Figure JPOXMLDOC01-appb-C000027
(例1-2)
 100mLのナスフラスコに例1-1で得た化合物(6-1)の3.0g(9.3mmol)及びジクロロメタンの50mLを加え氷冷下撹拌した。トリフルオロ酢酸の10.6g(93mmol)を添加し、25℃にて1.5時間撹拌した。得られた溶液に10%水酸化ナトリウム水溶液を添加し、溶液を塩基性にした後、ジクロロメタンを用いて抽出操作した。化合物(7-1)の1.8gを得た。
(Example 1-2)
To a 100 mL eggplant-shaped flask, 3.0 g (9.3 mmol) of the compound (6-1) obtained in Example 1-1 and 50 mL of dichloromethane were added and stirred under ice cooling. 10.6 g (93 mmol) of trifluoroacetic acid was added, and the mixture was stirred at 25°C for 1.5 hours. A 10% aqueous sodium hydroxide solution was added to the obtained solution to make the solution basic, and then extraction operation was performed using dichloromethane. 1.8 g of the compound (7-1) was obtained.
Figure JPOXMLDOC01-appb-C000028
Figure JPOXMLDOC01-appb-C000028
(例1-3)
 国際公開第2013/121984号の実施例6に記載の方法にしたがって、化合物(8-1)を得た。xの平均値は13である。Rの分子量は4500である。
 HNCHC(CHCH=CHの代わりに例1-2で得た化合物(7-1)を用いた以外は、特許文献2の例11-2と同様にして化合物(2-1)を得た。
(Example 1-3)
Compound (8-1) was obtained according to the method described in Example 6 of WO 2013/121984. The average value of x is 13. The molecular weight of R f is 4500.
Except for using H 2 NCH 2 C (CH 2 CH = CH 2) The compound obtained in Example 1-2 in place of 3 (7-1) is, in the same manner as in Example 11-2 of Japanese Patent Document 2 Compound ( 2-1) was obtained.
Figure JPOXMLDOC01-appb-C000029
Figure JPOXMLDOC01-appb-C000029
(例1-4)
 例1-3で得た化合物(2-1)を用いた以外は、特許文献2の例11-3と同様にして化合物(1-1)を得た。
(Example 1-4)
A compound (1-1) was obtained in the same manner as in Example 11-3 of Patent Document 2, except that the compound (2-1) obtained in Example 1-3 was used.
Figure JPOXMLDOC01-appb-C000030
Figure JPOXMLDOC01-appb-C000030
[例2]
 例1-1における化合物(4-1)の代わりに例1-2で得た化合物(7-1)を用いた以外は、例1と同様にして化合物(1-2)を得た。
[Example 2]
A compound (1-2) was obtained in the same manner as in Example 1 except that the compound (7-1) obtained in Example 1-2 was used instead of the compound (4-1) in Example 1-1.
Figure JPOXMLDOC01-appb-C000031
Figure JPOXMLDOC01-appb-C000031
[例3]
(例3-1)
 例1-1における化合物(5-1)の代わりに化合物(5-2)(東京化成工業社製)を用いた以外は、例1-1及び例1-2と同様にして化合物(7-3)を得た。
[Example 3]
(Example 3-1)
Compound (7- was prepared in the same manner as in Example 1-1 and Example 1-2, except that compound (5-2) (manufactured by Tokyo Chemical Industry Co., Ltd.) was used instead of compound (5-1) in Example 1-1. 3) was obtained.
Figure JPOXMLDOC01-appb-C000032
Figure JPOXMLDOC01-appb-C000032
(例3-2)
 例1-3における化合物(7-1)の代わりに例3-1で得た化合物(7-3)を用いた以外は、例1-3及び例1-4と同様にして化合物(1-3)を得た。
(Example 3-2)
Compound (1-) was obtained in the same manner as in Example 1-3 and Example 1-4, except that compound (7-3) obtained in Example 3-1 was used instead of compound (7-1) in Example 1-3. 3) was obtained.
Figure JPOXMLDOC01-appb-C000033
Figure JPOXMLDOC01-appb-C000033
[例4]
 例1-1における化合物(4-1)の代わりに例3-1で得た化合物(7-3)を用いた以外は、例1と同様にして化合物(1-4)を得た。
[Example 4]
A compound (1-4) was obtained in the same manner as in Example 1 except that the compound (7-3) obtained in Example 3-1 was used instead of the compound (4-1) in Example 1-1.
Figure JPOXMLDOC01-appb-C000034
Figure JPOXMLDOC01-appb-C000034
[例5]
(例5-1)
 例1-1における化合物(4-1)の代わりに化合物(4-2)を用いた以外は、例1-1及び例1-2と同様にして化合物(7-5)を得た。
[Example 5]
(Example 5-1)
Compound (7-5) was obtained in the same manner as in Example 1-1 and Example 1-2, except that compound (4-2) was used instead of compound (4-1) in Example 1-1.
Figure JPOXMLDOC01-appb-C000035
Figure JPOXMLDOC01-appb-C000035
(例5-2)
 例1-3における化合物(7-1)の代わりに例5-1で得た化合物(7-5)を用いた以外は、例1-3及び例1-4と同様にして化合物(1-5)を得た。
(Example 5-2)
Compound (1-) was obtained in the same manner as in Example 1-3 and Example 1-4, except that compound (7-5) obtained in Example 5-1 was used instead of compound (7-1) in Example 1-3. 5) was obtained.
Figure JPOXMLDOC01-appb-C000036
Figure JPOXMLDOC01-appb-C000036
[例6]
 例1-1における化合物(4-1)の代わりに例5-1で得た化合物(7-5)を用いた以外は、例1と同様にして化合物(1-6)を得た。
[Example 6]
A compound (1-6) was obtained in the same manner as in Example 1 except that the compound (7-5) obtained in Example 5-1 was used instead of the compound (4-1) in Example 1-1.
Figure JPOXMLDOC01-appb-C000037
Figure JPOXMLDOC01-appb-C000037
[例7]
(例7-1)
 例1-1における化合物(4-1)の代わりに化合物(4-2)を用い、化合物(5-1)の代わりに化合物(5-2)を用いた以外は、例1-1及び例1-2と同様にして化合物(7-7)を得た。
[Example 7]
(Example 7-1)
Example 1-1 and Example except that the compound (4-2) was used instead of the compound (4-1) and the compound (5-2) was used instead of the compound (5-1) in Example 1-1. Compound (7-7) was obtained in the same manner as 1-2.
Figure JPOXMLDOC01-appb-C000038
Figure JPOXMLDOC01-appb-C000038
(例7-2)
 例1-3における化合物(7-1)の代わりに例7-1で得た化合物(7-7)を用いた以外は、例1-3及び例1-4と同様にして化合物(1-7)を得た。
(Example 7-2)
The compound (1-) was prepared in the same manner as in Example 1-3 and Example 1-4, except that the compound (7-7) obtained in Example 7-1 was used instead of the compound (7-1) in Example 1-3. 7) was obtained.
Figure JPOXMLDOC01-appb-C000039
Figure JPOXMLDOC01-appb-C000039
[例8]
 例1-1における化合物(4-1)の代わりに例7-1で得た化合物(7-7)を用いた以外は、例1と同様にして化合物(1-8)を得た。
[Example 8]
A compound (1-8) was obtained in the same manner as in Example 1 except that the compound (7-7) obtained in Example 7-1 was used instead of the compound (4-1) in Example 1-1.
Figure JPOXMLDOC01-appb-C000040
Figure JPOXMLDOC01-appb-C000040
[例9]
(例9-1)
 例1-1における化合物(4-1)の代わりに化合物(4-3)(富士フイルム和光純薬社製)を用いた以外は、例1-1及び例1-2と同様にして化合物(7-9)を得た。
[Example 9]
(Example 9-1)
Compound (4-3) (manufactured by FUJIFILM Wako Pure Chemical Industries, Ltd.) was used instead of compound (4-1) in Example 1-1, in the same manner as in Example 1-1 and Example 1-2. 7-9) was obtained.
Figure JPOXMLDOC01-appb-C000041
Figure JPOXMLDOC01-appb-C000041
(例9-2)
 例1-3における化合物(7-1)の代わりに例9-1で得た化合物(7-9)を用いた以外は、例1-3及び例1-4と同様にして化合物(1-9)を得た。
(Example 9-2)
Compound (1-) was obtained in the same manner as in Example 1-3 and Example 1-4, except that compound (7-9) obtained in Example 9-1 was used instead of compound (7-1) in Example 1-3. 9) was obtained.
Figure JPOXMLDOC01-appb-C000042
Figure JPOXMLDOC01-appb-C000042
[例10]
 例1-1における化合物(4-1)の代わりに例9-1で得た化合物(7-9)を用いた以外は、例1と同様にして化合物(1-10)を得た。
[Example 10]
A compound (1-10) was obtained in the same manner as in Example 1 except that the compound (7-9) obtained in Example 9-1 was used instead of the compound (4-1) in Example 1-1.
Figure JPOXMLDOC01-appb-C000043
Figure JPOXMLDOC01-appb-C000043
[例11]
(例11-1)
 例1-1における化合物(4-1)の代わりに化合物(4-3)を用い、化合物(5-1)の代わりに化合物(5-2)を用いた以外は、例1-1及び例1-2と同様にして化合物(7-11)を得た。
[Example 11]
(Example 11-1)
Example 1-1 and Example except that the compound (4-3) was used instead of the compound (4-1) in Example 1-1 and the compound (5-2) was used instead of the compound (5-1) Compound (7-11) was obtained in the same manner as 1-2.
Figure JPOXMLDOC01-appb-C000044
Figure JPOXMLDOC01-appb-C000044
(例11-2)
 例1-3における化合物(7-1)の代わりに例11-1で得た化合物(7-11)を用いた以外は、例1-3及び例1-4と同様にして化合物(1-11)を得た。
(Example 11-2)
Compound (1-) was prepared in the same manner as in Example 1-3 and Example 1-4, except that compound (7-11) obtained in Example 11-1 was used instead of compound (7-1) in Example 1-3. 11) was obtained.
Figure JPOXMLDOC01-appb-C000045
Figure JPOXMLDOC01-appb-C000045
[例12]
 例1-1における化合物(4-1)の代わりに例11-1で得た化合物(7-11)を用いた以外は、例1と同様にして化合物(1-12)を得た。
[Example 12]
A compound (1-12) was obtained in the same manner as in Example 1 except that the compound (7-11) obtained in Example 11-1 was used instead of the compound (4-1) in Example 1-1.
Figure JPOXMLDOC01-appb-C000046
Figure JPOXMLDOC01-appb-C000046
[例13]
(例13-1)
 50mLのナスフラスコに例1-3で得た化合物(2-1)の10.0g及びAC-2000の20mLを入れ、氷冷した後、水素化リチウムアルミニウムのTHF溶液(2.5モル/L、東京化成工業社製)の2.0mLを滴下した。60度に昇温した後、12時間撹拌した。NMRから化合物(2-1)がすべて化合物(2-13)に変換していることを確認した。得られた溶液を氷冷し、硫酸ナトリウム・10水和物の2gを加えて1時間撹拌し、ろ過して化合物(2-13)の6.7gを得た。
[Example 13]
(Example 13-1)
In a 50 mL round-bottomed flask, 10.0 g of the compound (2-1) obtained in Example 1-3 and 20 mL of AC-2000 were placed, and after cooling with ice, a solution of lithium aluminum hydride in THF (2.5 mol/L , Manufactured by Tokyo Kasei Kogyo Co., Ltd.) was added dropwise. After the temperature was raised to 60 degrees, it was stirred for 12 hours. From NMR, it was confirmed that all the compound (2-1) was converted to the compound (2-13). The resulting solution was ice-cooled, 2 g of sodium sulfate decahydrate was added, the mixture was stirred for 1 hour, and filtered to obtain 6.7 g of compound (2-13).
Figure JPOXMLDOC01-appb-C000047
Figure JPOXMLDOC01-appb-C000047
(例13-2)
 化合物(2-1)の代わりに例13-1で得た化合物(2-13)を用いた以外は、例1-4と同様にして化合物(1-13)を得た。
(Example 13-2)
Compound (1-13) was obtained in the same manner as in Example 1-4, except that compound (2-13) obtained in Example 13-1 was used instead of compound (2-1).
Figure JPOXMLDOC01-appb-C000048
Figure JPOXMLDOC01-appb-C000048
[例14]
(例14-1)
 50mLのナスフラスコに例2の途中で得た化合物(2-2)の10.0g及びAC-2000の20mLを入れ、氷冷した後、水素化リチウムアルミニウムのTHF溶液(2.5モル/L)の4.0mLを滴下した。60度に昇温した後、12時間撹拌した。NMRから化合物(2-2)がすべて化合物(2-14)に変換していることを確認した。得られた溶液を氷冷し、硫酸ナトリウム・10水和物の4gを加えて1時間撹拌し、ろ過して化合物(2-14)の4.5gを得た。
[Example 14]
(Example 14-1)
A 50 mL eggplant-shaped flask was charged with 10.0 g of the compound (2-2) obtained in the middle of Example 2 and 20 mL of AC-2000, and the mixture was ice-cooled, and then a lithium aluminum hydride solution in THF (2.5 mol/L was added). ) Was added dropwise. After the temperature was raised to 60 degrees, it was stirred for 12 hours. From NMR, it was confirmed that all the compound (2-2) was converted to the compound (2-14). The resulting solution was ice-cooled, 4 g of sodium sulfate decahydrate was added, the mixture was stirred for 1 hour, and filtered to obtain 4.5 g of compound (2-14).
Figure JPOXMLDOC01-appb-C000049
Figure JPOXMLDOC01-appb-C000049
(例14-2)
 化合物(2-1)の代わりに例14-1で得た化合物(2-14)を用いた以外は、例1-4と同様にして化合物(1-14)を得た。
(Example 14-2)
Compound (1-14) was obtained in the same manner as in Example 1-4, except that compound (2-14) obtained in Example 14-1 was used instead of compound (2-1).
Figure JPOXMLDOC01-appb-C000050
Figure JPOXMLDOC01-appb-C000050
[例15]
(例15-1)
 50mLのナスフラスコにフェニルクロロホルメートの0.6g及びN,N-ジメチルホルムアミドの20mLを入れ、例1-2で得た化合物(7-1)の1.0gを滴下し、25℃にて12時間撹拌した。NMRから化合物(7-1)がすべて化合物(7-15)に変換していることを確認した。得られた溶液にイオン交換水の10mL加えた後、ジクロロメタンの50mLにて抽出操作した。硫酸マグネシウムの5gにて脱水し、ろ過して化合物(7-15)の1.3gを得た。
[Example 15]
(Example 15-1)
In a 50 mL round-bottomed flask, 0.6 g of phenyl chloroformate and 20 mL of N,N-dimethylformamide were placed, 1.0 g of the compound (7-1) obtained in Example 1-2 was added dropwise, and at 25° C. Stir for 12 hours. From NMR, it was confirmed that all the compound (7-1) was converted to the compound (7-15). After adding 10 mL of ion-exchanged water to the obtained solution, extraction operation was performed with 50 mL of dichloromethane. It was dehydrated with 5 g of magnesium sulfate and filtered to obtain 1.3 g of the compound (7-15).
Figure JPOXMLDOC01-appb-C000051
Figure JPOXMLDOC01-appb-C000051
(例15-2)
 100mLの耐圧反応器に、国際公開第2013/121984号の実施例の例1-5に記載の方法にしたがって得られた化合物(8-1)の15g、ジクロロペンタフルオロプロパン(AGC社製、AK-225)の50g、2.0mol/Lのアンモニア-メタノール溶液の7.5gを入れ、25℃で6時間撹拌した。溶媒を留去し、化合物(8-2)の14.8gを得た。
 CF-(OCFCF-OCFCFCFCFOCFCF-OCFCFCF-C(O)OCH ・・・(8-1)
 CF-(OCFCF-OCFCFCFCFOCFCF-OCFCFCF-C(O)NH ・・・(8-2)
(Example 15-2)
In a 100 mL pressure-resistant reactor, 15 g of compound (8-1) obtained according to the method described in Example 1-5 of Example of WO 2013/121984, dichloropentafluoropropane (AK, AK). -225) and 7.5 g of a 2.0 mol/L ammonia-methanol solution were added, and the mixture was stirred at 25° C. for 6 hours. The solvent was distilled off to obtain 14.8 g of compound (8-2).
CF 3 - (OCF 2 CF 2 -OCF 2 CF 2 CF 2 CF 2) x OCF 2 CF 2 -OCF 2 CF 2 CF 2 -C (O) OCH 3 ··· (8-1)
CF 3 -(OCF 2 CF 2 -OCF 2 CF 2 CF 2 CF 2 ) x OCF 2 CF 2 -OCF 2 CF 2 CF 2 -C(O)NH 2 ... (8-2)
 200mLのナスフラスコに化合物(8-2)の10g、AK-225の50g、ジエチルエーテルの20gを入れ、氷浴下で撹拌した。次いで、水素化リチウムアルミニウムの0.194gをゆっくり入れ、25℃で20時間撹拌した。硫酸ナトリウム飽和水溶液の0.2mLを入れ、析出した固体をセライトろ過で取り除いた。ろ液を濃縮した後、シリカゲルカラムクロマトグラフィで精製し、化合物(8-3)の4.48gを得た。xの平均値は13である。Rの分子量は4500である。
 50mLのナスフラスコに例15-1で得た化合物(7-15)の1.0g及びAC-2000の20mLを入れ、化合物(8-3)の10.0gを加え、25℃にて12時間撹拌した。得られた溶液をシリカゲルクロマトグラフィにて精製し、化合物(2-15)の8.2gを得た。
10 g of the compound (8-2), 50 g of AK-225 and 20 g of diethyl ether were placed in a 200 mL eggplant-shaped flask, and the mixture was stirred in an ice bath. Next, 0.194 g of lithium aluminum hydride was slowly added, and the mixture was stirred at 25° C. for 20 hours. 0.2 mL of a saturated aqueous solution of sodium sulfate was added, and the precipitated solid was removed by filtration through Celite. The filtrate was concentrated and then purified by silica gel column chromatography to obtain 4.48 g of compound (8-3). The average value of x is 13. The molecular weight of R f is 4500.
In a 50 mL eggplant-shaped flask, 1.0 g of the compound (7-15) obtained in Example 15-1 and 20 mL of AC-2000 were placed, 10.0 g of the compound (8-3) was added, and the mixture was added at 25° C. for 12 hours. It was stirred. The resulting solution was purified by silica gel chromatography to obtain 8.2 g of compound (2-15).
Figure JPOXMLDOC01-appb-C000052
Figure JPOXMLDOC01-appb-C000052
(例15-3)
 化合物(2-1)の代わりに例15-2で得た化合物(2-15)を用いた以外は、例1-4と同様にして化合物(1-15)を得た。
(Example 15-3)
Compound (1-15) was obtained in the same manner as in Example 1-4, except that compound (2-15) obtained in Example 15-2 was used instead of compound (2-1).
Figure JPOXMLDOC01-appb-C000053
Figure JPOXMLDOC01-appb-C000053
[例16]
 例15-1におけるフェニルクロロホルメートの0.6gをフェニルクロロチオノホルメートの0.7gに変更した以外は、例15と同様にして化合物(1-16)の7.9gを得た。
[Example 16]
7.9 g of compound (1-16) was obtained in the same manner as in Example 15 except that 0.6 g of phenylchloroformate in Example 15-1 was changed to 0.7 g of phenylchlorothionoformate.
Figure JPOXMLDOC01-appb-C000054
Figure JPOXMLDOC01-appb-C000054
[例17]
(例17-1)
 国際公開第2019/039341号の例3-2に記載の方法にしたがって、化合物(8-4)を得た。xの平均値は13である。Rの分子量は4500である。
 50mLのナスフラスコに化合物(8-4)の10.0g、1,3-ジ(トリフルオロメチル)ベンゼンの20mL、例1-2で得た化合物(7-1)の1.0gを滴下し、トリエチルアミンの0.50gを入れ、加熱還流で一晩(12時間)撹拌した。メタノールを入れ、充分に撹拌した後、AC-6000を入れ、充分に撹拌した。AC-6000層を回収し、溶媒を留去した後、シリカゲルカラムクロマトグラフィで精製した。化合物(2-17)の9.8gを得た。
[Example 17]
(Example 17-1)
Compound (8-4) was obtained according to the method described in Example 3-2 of WO2019/039341. The average value of x is 13. The molecular weight of R f is 4500.
To a 50 mL eggplant-shaped flask, 10.0 g of the compound (8-4), 20 mL of 1,3-di(trifluoromethyl)benzene, and 1.0 g of the compound (7-1) obtained in Example 1-2 were added dropwise. , 0.50 g of triethylamine were added, and the mixture was stirred with heating under reflux overnight (12 hours). After adding methanol and stirring sufficiently, AC-6000 was added and stirred sufficiently. The AC-6000 layer was collected, the solvent was evaporated, and the residue was purified by silica gel column chromatography. 9.8 g of the compound (2-17) was obtained.
Figure JPOXMLDOC01-appb-C000055
Figure JPOXMLDOC01-appb-C000055
(例17-2)
 化合物(2-1)の代わりに例17-1で得た化合物(2-17)を用いた以外は、例1-4と同様にして化合物(1-17)を得た。
(Example 17-2)
Compound (1-17) was obtained in the same manner as in Example 1-4, except that compound (2-17) obtained in Example 17-1 was used instead of compound (2-1).
Figure JPOXMLDOC01-appb-C000056
Figure JPOXMLDOC01-appb-C000056
[例18]
(例18-1)
 50mLのナスフラスコに例1-3で得た化合物(8-1)の10.0g及び酢酸エチルの2.1gを入れ、氷冷した後、ナトリウムメトキシドの1.1gを加えた。徐々に25℃まで昇温し、12時間撹拌した。水の10mLを加えた後、AC-2000の50mLを加え、抽出操作した。硫酸マグネシウムで脱水した後、ろ過して化合物(8-5)の6.6gを得た。
[Example 18]
(Example 18-1)
In a 50 mL eggplant-shaped flask, 10.0 g of the compound (8-1) obtained in Example 1-3 and 2.1 g of ethyl acetate were placed, and after ice-cooling, 1.1 g of sodium methoxide was added. The temperature was gradually raised to 25° C. and the mixture was stirred for 12 hours. After adding 10 mL of water, 50 mL of AC-2000 was added for extraction operation. It was dehydrated with magnesium sulfate and then filtered to obtain 6.6 g of the compound (8-5).
Figure JPOXMLDOC01-appb-C000057
Figure JPOXMLDOC01-appb-C000057
(例18-2)
 例18-1で得た化合物(8-5)の6.6gをCOC(3M社製、ノベック(登録商標)7200)の30mL及びTHFの1mLで希釈し、氷冷した後、アリルマグネシウムクロライドのTHF溶液(1モル/L)の5mLを滴下した。徐々に25℃まで昇温し、12時間撹拌した。得られた溶液にメタノールを入れ、充分に撹拌した後、AC-6000を入れ、充分に撹拌した。AC-6000層を回収し、溶媒を留去した後、シリカゲルクロマトグラフィで精製した。化合物(2-18)の2.7gを得た。
(Example 18-2)
6.6 g of the compound (8-5) obtained in Example 18-1 was diluted with 30 mL of C 4 F 9 OC 2 H 5 (3M, Novec (registered trademark) 7200) and 1 mL of THF, and cooled with ice. After that, 5 mL of a THF solution of allyl magnesium chloride (1 mol/L) was added dropwise. The temperature was gradually raised to 25° C. and the mixture was stirred for 12 hours. Methanol was added to the obtained solution, and the mixture was sufficiently stirred, and then AC-6000 was added and sufficiently stirred. The AC-6000 layer was collected, the solvent was evaporated, and the residue was purified by silica gel chromatography. 2.7 g of the compound (2-18) was obtained.
Figure JPOXMLDOC01-appb-C000058
Figure JPOXMLDOC01-appb-C000058
(例18-3)
 化合物(2-1)の代わりに例18-2で得た化合物(2-18)を用いた以外は、例1-4と同様にして化合物(1-18)を得た。
(Example 18-3)
Compound (1-18) was obtained in the same manner as in Example 1-4, except that compound (2-18) obtained in Example 18-2 was used instead of compound (2-1).
Figure JPOXMLDOC01-appb-C000059
Figure JPOXMLDOC01-appb-C000059
[例19]
(例19-1)
 50mLのナスフラスコに例18-2で得た化合物(2-18)の5.0g及びAC-2000の20mLを入れ、氷冷した後、水素化リチウムアルミニウムのTHF溶液(2.5モル/L)の0.8mLを滴下した。徐々に25℃まで昇温した後、12時間撹拌した。得られた溶液を氷冷し、硫酸ナトリウム・10水和物の1gを加えて1時間撹拌した後、ろ過して化合物(2-19)の1.2gを得た。
[Example 19]
(Example 19-1)
In a 50 mL round-bottomed flask, 5.0 g of the compound (2-18) obtained in Example 18-2 and 20 mL of AC-2000 were placed, and after cooling with ice, a lithium aluminum hydride solution in THF (2.5 mol/L ) Was added dropwise. After gradually raising the temperature to 25° C., the mixture was stirred for 12 hours. The resulting solution was ice-cooled, 1 g of sodium sulfate decahydrate was added, and the mixture was stirred for 1 hour, then filtered to obtain 1.2 g of compound (2-19).
Figure JPOXMLDOC01-appb-C000060
Figure JPOXMLDOC01-appb-C000060
(例19-2)
 化合物(2-1)の代わりに例19-1で得た化合物(2-19)を用いた以外は、例1-4と同様にして化合物(1-19)を得た。
(Example 19-2)
Compound (1-19) was obtained in the same manner as in Example 1-4, except that compound (2-19) obtained in Example 19-1 was used instead of compound (2-1).
Figure JPOXMLDOC01-appb-C000061
Figure JPOXMLDOC01-appb-C000061
[例20]
(例20-1)
 特許文献3の実施例3の化合物(A)を例19-1で得た化合物(2-19)に変更し、メタンスルホニルクロリドをジメチルクロロホスフェートに変更した以外は同様にして化合物(2-20)を得た。
[Example 20]
(Example 20-1)
A compound (2-20) was obtained in the same manner except that the compound (A) of Example 3 of Patent Document 3 was changed to the compound (2-19) obtained in Example 19-1 and methanesulfonyl chloride was changed to dimethylchlorophosphate. ) Got.
Figure JPOXMLDOC01-appb-C000062
Figure JPOXMLDOC01-appb-C000062
(例20-2)
 化合物(2-1)の代わりに例20-1で得た化合物(2-20)を用いた以外は、例1-4と同様にして化合物(1-20)を得た。
(Example 20-2)
Compound (1-20) was obtained in the same manner as in Example 1-4, except that compound (2-20) obtained in Example 20-1 was used instead of compound (2-1).
Figure JPOXMLDOC01-appb-C000063
Figure JPOXMLDOC01-appb-C000063
[例21]
(例21-1)
 特許文献3の実施例3の化合物(A)を例19-1で得た化合物(2-19)に変更した以外は同様にして化合物(2-21)を得た。
[Example 21]
(Example 21-1)
A compound (2-21) was obtained in the same manner except that the compound (A) of Example 3 of Patent Document 3 was changed to the compound (2-19) obtained in Example 19-1.
Figure JPOXMLDOC01-appb-C000064
Figure JPOXMLDOC01-appb-C000064
(例21-2)
 化合物(2-1)の代わりに例21-1で得た化合物(2-21)を用いた以外は、例1-4と同様にして化合物(1-21)を得た。
(Example 21-2)
Compound (1-21) was obtained in the same manner as in Example 1-4, except that compound (2-21) obtained in Example 21-1 was used instead of compound (2-1).
Figure JPOXMLDOC01-appb-C000065
Figure JPOXMLDOC01-appb-C000065
[例22]
(例22-1)
 特許文献3の実施例1の化合物(A)を例19-1で得た化合物(2-19)に変更した以外は同様にして化合物(2-22)を得た。
[Example 22]
(Example 22-1)
A compound (2-22) was obtained in the same manner except that the compound (A) of Example 1 of Patent Document 3 was changed to the compound (2-19) obtained in Example 19-1.
Figure JPOXMLDOC01-appb-C000066
Figure JPOXMLDOC01-appb-C000066
(例22-2)
 化合物(2-1)の代わりに例22-1で得た化合物(2-22)を用いた以外は、例1-4と同様にして化合物(1-22)を得た。
(Example 22-2)
Compound (1-22) was obtained in the same manner as in Example 1-4, except that compound (2-22) obtained in Example 22-1 was used instead of compound (2-1).
Figure JPOXMLDOC01-appb-C000067
Figure JPOXMLDOC01-appb-C000067
[例23]
 特許文献2の例11と同様にして化合物(10-1)を得た。
[Example 23]
A compound (10-1) was obtained in the same manner as in Example 11 of Patent Document 2.
Figure JPOXMLDOC01-appb-C000068
Figure JPOXMLDOC01-appb-C000068
[例24]
 例15-1における化合物(7-1)の代わりに化合物(4-1)を用いた以外は、例15と同様にして化合物(10-2)を得た。
[Example 24]
Compound (10-2) was obtained in the same manner as in Example 15 except that compound (4-1) was used instead of compound (7-1) in Example 15-1.
Figure JPOXMLDOC01-appb-C000069
Figure JPOXMLDOC01-appb-C000069
[例25]
 例15-1におけるフェニルクロロホルメートをフェニルクロロチオノホルメートに変更した以外は、例24と同様にして化合物(10-3)を得た。
[Example 25]
Compound (10-3) was obtained in the same manner as in Example 24 except that phenylchloroformate in Example 15-1 was changed to phenylchlorothionoformate.
Figure JPOXMLDOC01-appb-C000070
Figure JPOXMLDOC01-appb-C000070
[例26]
 例17-1における化合物(7-1)の代わりに化合物(4-1)を用いた以外は、例17と同様にして化合物(10-4)を得た。
[Example 26]
Compound (10-4) was obtained in the same manner as in Example 17, except that compound (4-1) was used instead of compound (7-1) in Example 17-1.
Figure JPOXMLDOC01-appb-C000071
Figure JPOXMLDOC01-appb-C000071
[例27]
(例27-1)
 例18-2における化合物(8-5)の代わりに例1-3で得た化合物(8-1)を用いた以外は、例18-2と同様にして化合物(12-1)を得た。
[Example 27]
(Example 27-1)
A compound (12-1) was obtained in the same manner as in Example 18-2 except that the compound (8-1) obtained in Example 1-3 was used instead of the compound (8-5) in Example 18-2. ..
Figure JPOXMLDOC01-appb-C000072
Figure JPOXMLDOC01-appb-C000072
(例27-2)
 化合物(2-1)の代わりに例27-1で得た化合物(12-1)を用いた以外は、例1-4と同様にして化合物(10-5)を得た。
(Example 27-2)
Compound (10-5) was obtained in the same manner as in Example 1-4, except that compound (12-1) obtained in Example 27-1 was used instead of compound (2-1).
Figure JPOXMLDOC01-appb-C000073
Figure JPOXMLDOC01-appb-C000073
[例28]
 例20-1における化合物(2-19)を例27-1で得た化合物(12-1)に変更した以外は、例20と同様にして化合物(10-6)を得た。
[Example 28]
Compound (10-6) was obtained in the same manner as in Example 20, except that the compound (2-19) in Example 20-1 was changed to the compound (12-1) obtained in Example 27-1.
Figure JPOXMLDOC01-appb-C000074
Figure JPOXMLDOC01-appb-C000074
[例29]
 例21-1における化合物(2-19)を例27-1で得た化合物(12-1)に変更した以外は、例21と同様にして化合物(10-7)を得た。
[Example 29]
A compound (10-7) was obtained in the same manner as in Example 21 except that the compound (2-19) in Example 21-1 was changed to the compound (12-1) obtained in Example 27-1.
Figure JPOXMLDOC01-appb-C000075
Figure JPOXMLDOC01-appb-C000075
[例30]
 例22-1における化合物(2-19)を例27-1で得た化合物(12-1)に変更した以外は、例22と同様にして化合物(10-8)を得た。
[Example 30]
Compound (10-8) was obtained in the same manner as in Example 22 except that the compound (2-19) in Example 22-1 was changed to the compound (12-1) obtained in Example 27-1.
Figure JPOXMLDOC01-appb-C000076
Figure JPOXMLDOC01-appb-C000076
[例31]
(例31-1)
 500mLの3口フラスコにエチレングリコール(東京化成工業社製)の4.00g(64mmоl)および炭酸カリウム(富士フイルム和光純薬社製)の8.91g(64.4mmol)を入れ、110℃にて2時間撹拌した。その後、110℃に保ったまま国際公開第2013/121984に記載のCF=CFOCFCFCFCHOHの286.7gを5時間かけて連続添加した。110℃にてさらに2時間撹拌した後、25℃に戻し1N塩酸水溶液(富士フイルム和光純薬社製)の100gおよびAC-2000の4gを加え、抽出操作を行い、化合物(8-6)の284.4gを得た。x+yの平均値は10である。分子量は4000である。
 HOCHCFCFCFO-CFHCFO(CHCFCFCFO-CFHCFO)-CHCH-(OCFCFH-OCFCFCFCHOCFCFH-OCFCFCFCHOH ・・・(8-6)
[Example 31]
(Example 31-1)
Into a 500 mL three-necked flask, 4.00 g (64 mmol) of ethylene glycol (manufactured by Tokyo Kasei Kogyo Co., Ltd.) and 8.91 g (64.4 mmol) of potassium carbonate (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) were placed, and at 110°C Stir for 2 hours. Then, 286.7 g of CF 2 =CFOCF 2 CF 2 CF 2 CH 2 OH described in International Publication No. 2013/121984 was continuously added over 5 hours while maintaining the temperature at 110°C. After further stirring at 110° C. for 2 hours, the temperature was returned to 25° C., 100 g of a 1N aqueous hydrochloric acid solution (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) and 4 g of AC-2000 were added, and an extraction operation was carried out to obtain a compound (8-6). 284.4 g was obtained. The average value of x+y is 10. The molecular weight is 4000.
HOCH 2 CF 2 CF 2 CF 2 O-CFHCF 2 O(CH 2 CF 2 CF 2 CF 2 O-CFHCF 2 O) x -CH 2 CH 2 -(OCF 2 CFH-OCF 2 CF 2 CF 2 CH 2 ) y OCF 2 CFH-OCF 2 CF 2 CF 2 CH 2 OH (8-6)
(例31-2)
 500mLの3口フラスコに例31-1で得た化合物(8-6)の25.0g(0.006mmоl)、AE-3000の25.0g、フッ化ナトリウムの7.2g(0.06mmol)及びCFCFCFOCF(CF)COFの20.0g(0.06mmol)を入れ、50℃にて12時間撹拌した。得られた溶液をメンブレンフィルターにてろ過した後、濃縮し、化合物(8-7)の28.3gを得た。x+yの平均値は10である。分子量は4600である。
 CFCFCFOCF(CF)C(O)OCHCFCFCFO-CFHCFO(CHCFCFCFO-CFHCFO)-CHCH-(OCFCFH-OCFCFCFCHOCFCFH-OCFCFCFCHO(O)C(CF)CFCFCFCF ・・・(8-7)
(Example 31-2)
In a 500 mL three-necked flask, 25.0 g (0.006 mm) of the compound (8-6) obtained in Example 31-1, 25.0 g of AE-3000, 7.2 g (0.06 mmol) of sodium fluoride and 20.0 g (0.06 mmol) of CF 3 CF 2 CF 2 OCF(CF 3 )COF was added, and the mixture was stirred at 50° C. for 12 hours. The obtained solution was filtered with a membrane filter and then concentrated to obtain 28.3 g of compound (8-7). The average value of x+y is 10. The molecular weight is 4600.
CF 3 CF 2 CF 2 OCF(CF 3 )C(O)OCH 2 CF 2 CF 2 CF 2 O-CFHCF 2 O(CH 2 CF 2 CF 2 CF 2 O-CFHCF 2 O) x -CH 2 CH 2- (OCF 2 CFH-OCF 2 CF 2 CF 2 CH 2 ) y OCF 2 CFH-OCF 2 CF 2 CF 2 CH 2 O(O)C(CF 3 )CFCF 2 CF 2 CF 3 ... (8-7)
(例31-3)
 500mLのニッケル製反応器にClCFCFClCFOCFCFCl(CFE-419)の250mLを入れ、窒素をバブリングした。酸素濃度が充分に下がった後、20%フッ素ガス(窒素ガスで希釈)を1時間バブリングした。排ガスはアルカリで中和した。化合物(8-7)のCFE-419溶液(16質量%、化合物(8-7)の質量25g)を2時間かけて添加した。フッ素導入速度(mol/時間)と化合物(8-7)中の水素原子導入速度(mol/時間)との比は2:1になるように制御した。化合物(8-7)の添加が終わった後、ベンゼン0.6gのCFE-419溶液(1.0質量%)を断続的に投入した。ベンゼンの投入が終わった後、フッ素ガスを1時間バブリングし、最後に窒素ガスで反応器内を充分に置換した。溶媒を留去し、得られた粗体をAC-2000で希釈した。そこにフッ化ナトリウムの2.1g及びメタノールの1.6gを加え1時間撹拌し、固体をろ別し、ろ液を濃縮し、化合物(8-8)の25.3gを得た。x+yの平均値は10である。分子量は4800である。
 CHOC(O)-CFCFCFO-CFCFO(CFCFCFCFO-CFCFO)-CFCF-(OCFCF-OCFCFCFCFOCFCF-OCFCFCF-C(O)OCH ・・・(8-8)
(Example 31-3)
250 mL of ClCF 2 CFClCF 2 OCF 2 CF 2 Cl (CFE-419) was put into a 500 mL nickel reactor, and nitrogen was bubbled. After the oxygen concentration was sufficiently lowered, 20% fluorine gas (diluted with nitrogen gas) was bubbled for 1 hour. The exhaust gas was neutralized with alkali. A CFE-419 solution of compound (8-7) (16% by mass, mass of compound (8-7): 25 g) was added over 2 hours. The ratio of the fluorine introduction rate (mol/hour) and the hydrogen atom introduction rate (mol/hour) in the compound (8-7) was controlled to be 2:1. After the addition of the compound (8-7) was completed, a CFE-419 solution (1.0% by mass) of 0.6 g of benzene was intermittently added. After the addition of benzene was completed, fluorine gas was bubbled for 1 hour, and finally the inside of the reactor was sufficiently replaced with nitrogen gas. The solvent was distilled off, and the obtained crude product was diluted with AC-2000. 2.1 g of sodium fluoride and 1.6 g of methanol were added thereto, and the mixture was stirred for 1 hour, the solid was filtered off, and the filtrate was concentrated to obtain 25.3 g of compound (8-8). The average value of x+y is 10. The molecular weight is 4800.
CH 3 OC (O) -CF 2 CF 2 CF 2 OCF 2 CF 2 O (CF 2 CF 2 CF 2 CF 2 OCF 2 CF 2 O) x -CF 2 CF 2 - (OCF 2 CF 2 - OCF 2 CF 2 CF 2 CF 2 ) y OCF 2 CF 2 —OCF 2 CF 2 CF 2 —C(O)OCH 3 ... (8-8)
(例31-4)
 化合物(8-1)の代わりに例31-3で得た化合物(8-8)を用いた以外は、例1-3と同様にして化合物(2-31)を得た。Qの分子量は4000である。
(Example 31-4)
Compound (2-31) was obtained in the same manner as in Example 1-3, except that compound (8-8) obtained in Example 31-3 was used instead of compound (8-1). The molecular weight of Q f is 4000.
Figure JPOXMLDOC01-appb-C000077
Figure JPOXMLDOC01-appb-C000077
(例31-5)
 化合物(2-1)の代わりに例31-4で得た化合物(2-31)を用いた以外は、例1-4と同様にして化合物(1-31)を得た。
(Example 31-5)
Compound (1-31) was obtained in the same manner as in Example 1-4, except that compound (2-31) obtained in Example 31-4 was used instead of compound (2-1).
Figure JPOXMLDOC01-appb-C000078
Figure JPOXMLDOC01-appb-C000078
[例32~62:物品の製造及び評価]
 例1~31で得た各化合物を用いて基材を表面処理し、例32~62の物品を得た。表面処理方法として、各例について下記のドライコーティング法及びウェットコーティング法を用いた。基材としては化学強化ガラスを用いた。得られた物品について、下記の方法で評価した。結果を表1~表6に示す。
Examples 32-62: Manufacture and Evaluation of Articles
A substrate was surface-treated with each of the compounds obtained in Examples 1 to 31 to obtain articles of Examples 32 to 62. As the surface treatment method, the following dry coating method and wet coating method were used for each example. A chemically strengthened glass was used as the base material. The obtained articles were evaluated by the following methods. The results are shown in Tables 1 to 6.
(ドライコーティング法)
 ドライコーティングは、真空蒸着装置(ULVAC社製、VTR350M)を用いて行った(真空蒸着法)。例1~31で得た各化合物の0.5gを真空蒸着装置内のモリブデン製ボートに充填し、真空蒸着装置内を1×10-3Pa以下に排気した。化合物を配置したボートを昇温速度10℃/分以下の速度で加熱し、水晶発振式膜厚計による蒸着速度が1nm/秒を超えた時点でシャッターを開けて基材の表面への製膜を開始させた。膜厚が約50nmとなった時点でシャッターを閉じて基材の表面への製膜を終了させた。化合物が堆積された基材を、200℃で30分間加熱処理し、AK-225にて洗浄して基材の表面に表面層を有する物品を得た。
(Dry coating method)
The dry coating was performed using a vacuum vapor deposition device (VTR350M manufactured by ULVAC) (vacuum vapor deposition method). 0.5 g of each compound obtained in Examples 1 to 31 was filled in a molybdenum boat inside the vacuum vapor deposition apparatus, and the inside of the vacuum vapor deposition apparatus was evacuated to 1×10 −3 Pa or less. The boat on which the compound is placed is heated at a temperature rising rate of 10° C./min or less, and when the deposition rate by the crystal oscillation type film thickness meter exceeds 1 nm/sec, the shutter is opened to form a film on the surface of the base material. Started. When the film thickness reached about 50 nm, the shutter was closed to complete the film formation on the surface of the base material. The substrate on which the compound was deposited was heat treated at 200° C. for 30 minutes and washed with AK-225 to obtain an article having a surface layer on the surface of the substrate.
(ウェットコーティング法)
 例1~31で得た各化合物と、媒体としてのCOC(3M社製、ノベック(登録商標)7200)とを混合して、固形分濃度0.05%のコーティング液を調製した。コーティング液に基材をディッピングし、30分間放置後、基材を引き上げた(ディップコート法)。塗膜を200℃で30分間乾燥させ、AK-225にて洗浄して、基材の表面に表面層を有する物品を得た。
(Wet coating method)
Each compound obtained in Examples 1 to 31 was mixed with C 4 F 9 OC 2 H 5 (3M, Novec (registered trademark) 7200) as a medium to prepare a coating liquid having a solid content concentration of 0.05%. Was prepared. The substrate was dipped in the coating liquid, left for 30 minutes, and then pulled up (dip coating method). The coating film was dried at 200° C. for 30 minutes and washed with AK-225 to obtain an article having a surface layer on the surface of the base material.
(評価方法)
 <接触角の測定方法>
 表面層の表面に置いた約2μLの蒸留水又はn-ヘキサデカンの接触角を、接触角測定装置(協和界面科学社製、DM-500)を用いて測定した。表面層の表面における異なる5箇所で測定し、その平均値を算出した。接触角の算出には2θ法を用いた。
(Evaluation methods)
<Method of measuring contact angle>
The contact angle of about 2 μL of distilled water or n-hexadecane placed on the surface of the surface layer was measured using a contact angle measuring device (DM-500 manufactured by Kyowa Interface Science Co., Ltd.). The measurement was performed at five different points on the surface of the surface layer, and the average value was calculated. The 2θ method was used to calculate the contact angle.
 <初期接触角>
 表面層について、水又はn-ヘキサデカンの初期接触角を前記測定方法で測定した。評価基準は下記のとおりである。
 水の初期接触角:
 ◎(優) :115度以上。
 ○(良) :110度以上115度未満。
 △(可) :100度以上110度未満。
 ×(不可):100度未満。
 n-ヘキサデカンの初期接触角:
 ◎(優) :66度以上。
 ○(良) :65度以上66度未満。
 △(可) :63度以上65度未満。
 ×(不可):63度未満。
<Initial contact angle>
For the surface layer, the initial contact angle of water or n-hexadecane was measured by the above measuring method. The evaluation criteria are as follows.
Initial contact angle of water:
A (excellent): 115 degrees or more.
Good (Good): 110 degrees or more and less than 115 degrees.
Δ (Fair): 100 degrees or more and less than 110 degrees.
X (Not possible): less than 100 degrees.
Initial contact angle of n-hexadecane:
A (excellent): 66 degrees or more.
Good (Good): 65 degrees or more and less than 66 degrees.
Δ (OK): 63 degrees or more and less than 65 degrees.
X (Not possible): less than 63 degrees.
 <耐光性>
 表面層に対し、卓上型キセノンアークランプ式促進耐光性試験機(東洋精機社製、SUNTEST XLS+)を用いて、ブラックパネル温度:63℃にて、光線(650W/m、300~700nm)を2,000時間照射した後、水接触角を測定した。促進耐光試験後の水接触角の低下が小さいほど光による性能の低下が小さく、耐光性に優れる。評価基準は下記のとおりである。
 ◎(優) :促進耐光試験後の水接触角の変化が2度以下。
 ○(良) :促進耐光試験後の水接触角の変化が2度超5度以下。
 △(可) :促進耐光試験後の水接触角の変化が5度超10度以下。
 ×(不可):促進耐光試験後の水接触角の変化が10度超。
<Light resistance>
Light rays (650 W/m 2 , 300 to 700 nm) were applied to the surface layer at a black panel temperature of 63° C. using a desktop xenon arc lamp type accelerated light resistance tester (SUNTEST XLS+ manufactured by Toyo Seiki Co., Ltd.). After irradiation for 2,000 hours, the water contact angle was measured. The smaller the decrease in the water contact angle after the accelerated light resistance test, the smaller the decrease in performance due to light, and the better the light resistance. The evaluation criteria are as follows.
⊚ (Excellent): Change in water contact angle after accelerated light resistance test is 2 degrees or less.
Good (Good): Change in water contact angle after accelerated light resistance test is more than 2 degrees and 5 degrees or less.
Δ (OK): Change in water contact angle after accelerated light resistance test was more than 5 degrees and 10 degrees or less.
X (Not possible): Change in water contact angle after accelerated light resistance test exceeds 10 degrees.
 <耐摩擦性>
 表面層について、JIS L0849:2013(ISO 105-X12:2001)に準拠して往復式トラバース試験機(ケイエヌテー社製)を用い、スチールウールボンスター(#0000)を圧力:98.07kPa、速度:320cm/分で2万回往復させた後、水の接触角を測定した。摩擦後における水の接触角の低下が小さいほど、摩擦による性能の低下が小さく、耐摩擦性に優れる。評価基準は下記のとおりである。
 ◎(優) :2万回往復後の水接触角度の変化が5度以下。
 ○(良) :2万回往復後の水接触角度の変化が5度超10度以下。
 △(可) :2万回往復後の水接触角度の変化が10度超20度以下。
 ×(不可):2万回往復後の水接触角度の変化が20度超。
<Abrasion resistance>
Regarding the surface layer, a reciprocating traverse tester (manufactured by KNT) was used in accordance with JIS L0849:2013 (ISO 105-X12:2001), and a steel wool bonster (#0000) was used at a pressure of 98.07 kPa and a speed of 320 cm. After reciprocating 20,000 times/minute, the contact angle of water was measured. The smaller the decrease in the contact angle of water after rubbing, the smaller the decrease in performance due to rubbing, and the better the abrasion resistance. The evaluation criteria are as follows.
⊚ (Excellent): Change in water contact angle after reciprocating 20,000 times is 5 degrees or less.
Good (Good): Change in water contact angle after reciprocating 20,000 times was more than 5 degrees and 10 degrees or less.
Δ (OK): Change in water contact angle after reciprocating 20,000 times was more than 10 degrees and 20 degrees or less.
× (Not possible): The change in the water contact angle after reciprocating 20,000 times exceeds 20 degrees.
 <耐アルカリ性>
 耐アルカリ性試験:
 物品を、1Nの水酸化ナトリウム水溶液(pH:14)に5時間浸漬した後、水洗、風乾し、前記方法により水接触角を測定した。試験後における水接触角の低下が小さいほどアルカリによる性能の低下が小さく、耐アルカリ性に優れる。評価基準は下記のとおりである。
 ◎(優) :耐アルカリ性試験後の水接触角の変化が2度以下。
 〇(良) :耐アルカリ性試験後の水接触角の変化が2度超5度以下。
 △(可) :耐アルカリ性試験後の水接触角の変化が5度超10度以下。
 ×(不可):耐アルカリ性試験後の水接触角の変化が10度超。
<Alkali resistance>
Alkali resistance test:
The article was immersed in a 1N aqueous solution of sodium hydroxide (pH: 14) for 5 hours, washed with water and air-dried, and the water contact angle was measured by the above method. The smaller the decrease in the water contact angle after the test, the smaller the decrease in performance due to alkali, and the better the alkali resistance. The evaluation criteria are as follows.
⊚ (excellent): Change in water contact angle after alkali resistance test is 2 degrees or less.
◯ (Good): The change in water contact angle after the alkali resistance test is more than 2 degrees and 5 degrees or less.
Δ (OK): The change in water contact angle after the alkali resistance test was more than 5 degrees and 10 degrees or less.
X (Not possible): The change in water contact angle after the alkali resistance test exceeds 10 degrees.
 <耐塩水性>
 塩水噴霧試験(SST):
 JIS H8502に準拠して塩水噴霧試験を行った。すなわち、物品を、塩水噴霧試験機(スガ試験機社製)内で300時間塩水雰囲気に暴露した後、前記方法により水接触角を測定した。試験後における水接触角の低下が小さいほど塩水による性能の低下が小さく、耐塩水性に優れる。評価基準は下記のとおりである。
 ◎(優) :塩水噴霧試験後の水接触角の変化が2度以下。
 ○(良) :塩水噴霧試験後の水接触角の変化が2度超5度以下。
 △(可) :塩水噴霧試験後の水接触角の変化が5度超10度以下。
 ×(不可):塩水噴霧試験後の水接触角の変化が10度超。
<Salt resistance>
Salt spray test (SST):
A salt spray test was conducted according to JIS H8502. That is, the article was exposed to a salt water atmosphere in a salt spray tester (manufactured by Suga Test Instruments Co., Ltd.) for 300 hours, and then the water contact angle was measured by the above method. The smaller the decrease in the water contact angle after the test, the smaller the decrease in performance due to salt water, and the better the salt water resistance. The evaluation criteria are as follows.
⊚ (excellent): The change in water contact angle after the salt spray test is 2 degrees or less.
Good (Good): The change in water contact angle after the salt spray test was more than 2 degrees and 5 degrees or less.
Δ (OK): Change in water contact angle after salt spray test was more than 5 degrees and 10 degrees or less.
X (Not possible): The change in water contact angle after the salt spray test exceeds 10 degrees.
 <耐滑り性>
 主表面が水平に保持された全自動接触角計(協和界面科学社製、DMo-701)を準備した。ポリエチレンシート(ハギテック社製、硬質ポリエチレンシート(高密度ポリエチレン))の表面(水平面)上に、表面層が接するように物品を載置した後、全自動接触角計を用いて徐々に傾けて、物品が滑落し始めたときの物品の表面層と水平面とのなす角度(滑落角)を測定した。判定基準を以下に示す。なお、物品とポリエチレンシートのとの接触面積:6cm×6cm、物品に対する荷重:0.98Nの条件で測定した。
 ◎(優) :滑落角が6度以上である。
 ○(良) :滑落角が4度以上6度未満である。
 △(可) :滑落角が2度以上4度未満である。
 ×(不可):滑落角が2度未満である。
<Slip resistance>
A fully-automatic contact angle meter (manufactured by Kyowa Interface Science Co., Ltd., DMo-701) whose main surface was held horizontally was prepared. After placing the article on the surface (horizontal surface) of a polyethylene sheet (a hard polyethylene sheet (high-density polyethylene) manufactured by Hagitec Co., Ltd.) so that the surface layer is in contact, gradually tilt it using a fully automatic contact angle meter, The angle (sliding angle) formed by the surface layer of the article and the horizontal plane when the article started to slide was measured. The judgment criteria are shown below. The contact area between the article and the polyethylene sheet was 6 cm×6 cm, and the load on the article was 0.98 N.
⊚ (excellent): The sliding angle is 6 degrees or more.
Good (Good): The sliding angle is 4 degrees or more and less than 6 degrees.
Δ (OK): The sliding angle is 2 degrees or more and less than 4 degrees.
X (Not possible): The sliding angle is less than 2 degrees.
 <指紋汚れ除去性>
 人工指紋液(オレイン酸とスクアレンとからなる液)を、シリコンゴム栓の平坦面に付着させた後、余分な油分を不織布(旭化成社製、ベンコット(登録商標)M-3)にて拭き取って、指紋のスタンプを準備した。指紋スタンプを表面層上に乗せ、荷重:9.8Nにて10秒間押しつけた。指紋が付着した箇所のヘーズをヘーズメータにて測定し、初期値とした。指紋が付着した箇所について、ティッシュペーパーを取り付けた往復式トラバース試験機(ケイエヌテー社製)を用い、荷重:4.9Nにて拭き取った。拭き取り一往復毎にヘーズの値を測定し、ヘーズが初期値から10%以下になる拭き取り回数を測定した。拭き取り回数が少ないほど指紋汚れを容易に除去でき、指紋汚れ拭き取り性に優れる。評価基準は下記のとおりである。
 ◎(優) :拭き取り回数が3回以下。
 ○(良) :拭き取り回数が4~5回。
 △(可) :拭き取り回数が6~8回。
 ×(不可):拭き取り回数が9回以上。
<Removal of fingerprint stains>
An artificial fingerprint solution (a solution consisting of oleic acid and squalene) was applied to the flat surface of the silicone rubber stopper, and then excess oil was wiped off with a non-woven fabric (Bencot (registered trademark) M-3 manufactured by Asahi Kasei Corporation). I prepared a fingerprint stamp. A fingerprint stamp was placed on the surface layer and pressed with a load of 9.8 N for 10 seconds. The haze of the part where the fingerprint was attached was measured with a haze meter and set as the initial value. The part to which the fingerprint was attached was wiped off with a load of 4.9 N using a reciprocating traverse tester (manufactured by KNT) with a tissue paper attached. The value of haze was measured for each reciprocation of wiping, and the number of times of wiping at which haze was 10% or less from the initial value was measured. The less the number of times of wiping off, the easier it is to remove fingerprint stains, and the better the wiping performance of fingerprint stains. The evaluation criteria are as follows.
◎ (excellent): The number of times of wiping is 3 times or less.
○ (Good): The number of times of wiping is 4 to 5 times.
Δ (OK): The number of times of wiping is 6 to 8 times.
× (Not possible): The number of times of wiping is 9 or more.
Figure JPOXMLDOC01-appb-T000079
Figure JPOXMLDOC01-appb-T000079
Figure JPOXMLDOC01-appb-T000080
Figure JPOXMLDOC01-appb-T000080
Figure JPOXMLDOC01-appb-T000081
Figure JPOXMLDOC01-appb-T000081
Figure JPOXMLDOC01-appb-T000082
Figure JPOXMLDOC01-appb-T000082
Figure JPOXMLDOC01-appb-T000083
Figure JPOXMLDOC01-appb-T000083
Figure JPOXMLDOC01-appb-T000084
Figure JPOXMLDOC01-appb-T000084
 化合物(1)を用いた例32~53、62は、初期の撥水撥油性、耐光性、耐摩擦性、耐薬品性、耐滑り性、指紋汚れ除去性に優れていることを確認した。 It was confirmed that Examples 32 to 53 and 62 using the compound (1) were excellent in initial water/oil repellency, light resistance, abrasion resistance, chemical resistance, slip resistance, and fingerprint stain removability.
 本発明の含フッ素化合物は、潤滑性や撥水撥油性の付与が求められている各種の用途に用いることができる。例えばタッチパネル等の表示入力装置、透明なガラス製又は透明なプラスチック製部材の表面保護コート、キッチン用防汚コート、電子機器、熱交換器、電池等の撥水防湿コートや防汚コート、トイレタリー用防汚コート、導通しながら撥液が必要な部材へのコート、熱交換機の撥水・防水・滑水コート、振動ふるいやシリンダ内部等の表面低摩擦コート等に用いることができる。より具体的な使用例としては、ディスプレイの前面保護板、反射防止板、偏光板、アンチグレア板、あるいはそれらの表面に反射防止膜処理を施したもの、携帯電話、携帯情報端末等の機器のタッチパネルシートやタッチパネルディスプレイ等人の指あるいは手のひらで画面上の操作を行う表示入力装置を有する各種機器、トイレ、風呂、洗面所、キッチン等の水周りの装飾建材、配線板用防水コーティング熱交換機の撥水・防水コート、太陽電池の撥水コート、プリント配線板の防水・撥水コート、電子機器筐体や電子部品用の防水・撥水コート、送電線の絶縁性向上コート、各種フィルタの防水・撥水コート、電波吸収材や吸音材の防水性コート、風呂、厨房機器、トイレタリー用防汚コート、熱交換機の撥水・防水・滑水コート、振動ふるいやシリンダ内部等の表面低摩擦コート、機械部品、真空機器部品、ベアリング部品、自動車部品、工具等の表面保護コートが挙げられる。
 なお、2018年11月28日に出願された日本特許出願2018-222872号の明細書、特許請求の範囲および要約書の全内容をここに引用し、本発明の明細書の開示として、取り入れるものである。
The fluorine-containing compound of the present invention can be used in various applications in which lubricity and water/oil repellency are required. For example, display input device such as touch panel, surface protection coat of transparent glass or transparent plastic member, antifouling coat for kitchen, water repellent and antifouling coat for electronic devices, heat exchangers, batteries, etc., for toiletries It can be used as an antifouling coat, a coat for a member requiring liquid repellency while conducting, a water repellent/waterproof/sliding coat for a heat exchanger, a low surface friction coat for a vibrating sieve or the inside of a cylinder, and the like. More specific examples of use include a front protective plate for a display, an antireflection plate, a polarizing plate, an antiglare plate, or those whose surface is subjected to an antireflection film treatment, and a touch panel for devices such as mobile phones and personal digital assistants. Various equipment such as seats and touch panel displays that have a display input device that operates on the screen with a person's finger or palm, decorative building materials around water such as toilets, baths, washrooms, kitchens, etc. Water/waterproof coat, solar cell water-repellent coat, printed wiring board waterproof/water-repellent coat, electronic device casing and electronic parts waterproof/water-repellent coat, power line insulation improving coat, various filter waterproof/ Water repellent coat, waterproof coat for radio wave absorbers and sound absorbers, antifouling coat for baths, kitchen equipment, toiletries, water repellent/waterproof/sliding coat for heat exchangers, low-friction coat for vibrating sieves and cylinder interiors, etc. Surface protective coatings for machine parts, vacuum equipment parts, bearing parts, automobile parts, tools and the like can be mentioned.
The entire contents of the specification, claims and abstract of Japanese Patent Application No. 2018-222872 filed on Nov. 28, 2018 are cited herein and incorporated as the disclosure of the specification of the present invention. Is.

Claims (14)

  1.  1価又は2価の含フッ素有機基と、
     加水分解性基及び水酸基の少なくとも一方の基がケイ素原子に結合した反応性シリル基と、
     前記含フッ素有機基と前記反応性シリル基とを連結する連結基とを有する含フッ素化合物であり、
     前記連結基が、2個以上の極性基が炭素数1~20の2価の有機基を介して直列に結合した部位を有し、
     前記極性基が、C(O)NH、NHC(O)、NH、NHC(O)NH、NHC(S)NH、S(O)NH、NHS(O)、C(O)、C(OH)、C(OR)、P(O)、S(O)、C[OP(O)(OR]、C[OS(O)]及びC[OC(O)R](ただし、Rは、アルキル基である。)からなる群から選ばれる極性基であることを特徴とする含フッ素化合物。
    A monovalent or divalent fluorine-containing organic group,
    A reactive silyl group in which at least one of a hydrolyzable group and a hydroxyl group is bonded to a silicon atom,
    A fluorine-containing compound having a linking group that links the fluorine-containing organic group and the reactive silyl group,
    The linking group has a site in which two or more polar groups are bonded in series via a divalent organic group having 1 to 20 carbon atoms,
    The polar group is C(O)NH, NHC(O), NH, NHC(O)NH, NHC(S)NH, S(O) 2 NH, NHS(O) 2 , C(O), C( OH), C(OR 4 ), P(O), S(O), C[OP(O)(OR 4 ) 2 ], C[OS(O) 2 R 4 ] and C[OC(O)R. 4 ] (wherein R 4 is an alkyl group) is a polar group selected from the group consisting of:
  2.  下式(1A)で表される化合物又は下式(1B)で表される化合物である、含フッ素化合物。
     [R-]a1[-T]b1 ・・・(1A)
     [T-]b2[R-]a2-Q-Q[-Ra2[-T]b2 ・・・(1B)
     ただし、
      Rは、フルオロアルキル基(ただし、Q及びQ側の末端の炭素原子には少なくとも1個のフッ素原子が結合する。)、又は炭素数2以上のフルオロアルキル基の炭素-炭素原子間に-O-を有する基(ただし、Q及びQ側の末端の炭素原子には少なくとも1個のフッ素原子が結合する。)であり、
      Qは、フルオロアルキレン基(ただし、Q側の末端の炭素原子には少なくとも1個のフッ素原子が結合する。)、又は炭素数2以上のフルオロアルキレン基の炭素-炭素原子間に-O-を有する基(ただし、Q側の末端の炭素原子には少なくとも1個のフッ素原子が結合する。)であり、
      Qは、2個以上の極性基が炭素数1~20の2価の有機基を介して直列に結合した部位を有するa1+b1価の連結基であり、
      Qは、2個以上の極性基が炭素数1~20の2価の有機基を介して直列に結合した部位を有するa2+b2+1価の連結基であり、2個のQは同一であっても異なっていてもよく、
      前記極性基が、C(O)NH、NHC(O)、NH、NHC(O)NH、NHC(S)NH、S(O)NH、NHS(O)、C(O)、C(OH)、C(OR)、P(O)、S(O)、C[OP(O)(OR]、C[OS(O)]及びC[OC(O)R](ただし、Rは、アルキル基である。)からなる群から選ばれる極性基であり、
      Tは、-Si(R)3-c(L)であり、
      Rは、アルキル基であり、
      Lは、加水分解性基又は水酸基であり、2以上のLは同一であっても異なっていてもよく、
      a1は、1以上の整数であり、a2は、0以上の整数であり、2以上のRは同一であっても異なっていてもよく、
      b1及びb2は、それぞれ1以上の整数であり、2以上のTは同一であっても異なっていてもよく、
      cは、2又は3である。
    A fluorine-containing compound which is a compound represented by the following formula (1A) or a compound represented by the following formula (1B).
    [R f −] a1 Q 1 [−T] b1 ... (1A)
    [T−] b2 [R f −] a2 Q 2 −Q f −Q 2 [−R f ] a2 [−T] b2 (1B)
    However,
    R f is a fluoroalkyl group (provided that at least one fluorine atom is bonded to the terminal carbon atom on the Q 1 and Q 2 side) or a carbon-carbon atom of a fluoroalkyl group having 2 or more carbon atoms. Is a group having —O— (provided that at least one fluorine atom is bonded to the terminal carbon atom on the Q 1 and Q 2 side).
    Q f represents a fluoroalkylene group (provided that at least one fluorine atom is bonded to the terminal carbon atom on the Q 2 side), or —O between carbon-carbon atoms of a fluoroalkylene group having 2 or more carbon atoms. A group having-(provided that at least one fluorine atom is bonded to the terminal carbon atom on the Q 2 side),
    Q 1 is an a1+b1 valent linking group having a site in which two or more polar groups are bonded in series via a divalent organic group having 1 to 20 carbon atoms,
    Q 2 is an a2+b2+1 valent linking group having a site in which two or more polar groups are bonded in series via a divalent organic group having 1 to 20 carbon atoms, and the two Q 2 are the same. May be different,
    The polar group is C(O)NH, NHC(O), NH, NHC(O)NH, NHC(S)NH, S(O) 2 NH, NHS(O) 2 , C(O), C( OH), C(OR 4 ), P(O), S(O), C[OP(O)(OR 4 ) 2 ], C[OS(O) 2 R 4 ] and C[OC(O)R. 4 ] (wherein R 4 is an alkyl group) is a polar group selected from the group consisting of:
    T is —Si(R) 3-c (L) c ,
    R is an alkyl group,
    L is a hydrolyzable group or a hydroxyl group, and two or more Ls may be the same or different,
    a1 is an integer of 1 or more, a2 is an integer of 0 or more, and R f of 2 or more may be the same or different,
    b1 and b2 are each an integer of 1 or more, and Ts of 2 or more may be the same or different,
    c is 2 or 3.
  3.  前記極性基が、C(O)NH、NHC(O)、S(O)NH又はNHS(O)である、請求項2に記載の含フッ素化合物。 The fluorine-containing compound according to claim 2 , wherein the polar group is C(O)NH, NHC(O), S(O) 2 NH or NHS(O) 2 .
  4.  前記Rが、下式(g1a)で表される基である、請求項2又は3に記載の含フッ素化合物。
     Rf1-(ORf2- ・・・(g1a)
     ただし、
      Rf1は、炭素数1~6のフルオロアルキル基(ただし、mが0の場合、Q又はQ側の末端の炭素原子には少なくとも1個のフッ素原子が結合する。)であり、
      Rf2は、炭素数1~6のフルオロアルキレン基(ただし、Q又はQに結合するRf2のQ又はQ側の末端の炭素原子には少なくとも1個のフッ素原子が結合する。)であり、
      mは、0以上の整数であり、mが2以上の場合、(ORf2は2種以上のORf2からなるものであってもよい。
    The fluorine-containing compound according to claim 2 or 3, wherein R f is a group represented by the following formula (g1a).
    R f1 −(OR f2 ) m − (g1a)
    However,
    R f1 is a fluoroalkyl group having 1 to 6 carbon atoms (however, when m is 0, at least one fluorine atom is bonded to the terminal carbon atom on the Q 1 or Q 2 side),
    R f2 is a fluoroalkylene group having 1 to 6 carbon atoms (provided that at least one fluorine atom is attached to the Q 1 or Q 2 side terminal carbon atom of R f2 which bind to Q 1 or Q 2. ), and
    m is an integer of 0 or more, and when m is 2 or more, (OR f2 ) m may be composed of two or more kinds of OR f2 .
  5.  前記Qが、式(g2-1)で表される基(ただし、a1=d1+d3及びb1=d2+d4である。)、式(g2-2)で表される基(ただし、a1=e1及びb1=e2である。)、式(g2-3)で表される基(ただし、a1=1及びb1=2である。)、式(g2-4)で表される基(ただし、a1=h1及びb1=h2である。)、式(g2-5)で表される基(ただし、a1=i1及びb1=i2である。)、式(g2-6)で表される基(ただし、a1=1及びb1=1である。)、又は式(g2-7)で表される基(ただし、a1=1及びb1=2である。)であり、
     前記Qが、式(g2-1)で表される基(ただし、a2+1=d1+d3及びb2=d2+d4である。)、式(g2-2)で表される基(ただし、a2+1=e1及びb2=e2である。)、式(g2-3)で表される基(ただし、a2+1=1及びb2=2である。)、式(g2-4)で表される基(ただし、a2+1=h1及びb2=h2である。)、式(g2-5)で表される基(ただし、a2+1=i1及びb2=i2である。)、式(g2-6)で表される基(ただし、a2+1=1及びb2=1である。)、又は式(g2-7)で表される基(ただし、a2+1=1及びb2=2である。)である、請求項2~4のいずれか一項に記載の含フッ素化合物。
    Figure JPOXMLDOC01-appb-C000001
     (-A-E-Q12-)e1C(R4-e1-e2(-Q22-)e2 ・・・(g2-2)
     -A-E-Q13-N(-Q23-) ・・・(g2-3)
     (-A-E-Q14-)h1Z(-Q24-)h2 ・・・(g2-4)
     (-A-E-Q15-)i1Si(R4-i1-i2(-Q25-)i2 ・・・(g2-5)
     -A-E-Q26- ・・・(g2-6)
     -A-E(-Q27-) ・・・(g2-7)
     ただし、
      式(g2-1)~式(g2-7)においては、A側がR又はQに接続し、Q22、Q23、Q24、Q25、Q26及びQ27側がTに接続し、
      Aは、単結合又はアルキレン基であり、
      Eは、2個以上の前記極性基が炭素数1~20の2価の有機基を介して直列に結合した部位であり、式(g2-7)においては、Q27側の末端の極性基がC(OH)、C(OR)、P(O)、S(O)、C[OP(O)(OR]、C[OS(O)]又はC[OC(O)R]であり、
      Q11は、単結合、-O-、アルキレン基、又は炭素数2以上のアルキレン基の炭素-炭素原子間に-O-を有する基であり、
      Q12は、単結合又はアルキレン基であり、Q又はQがQ12を2以上有する場合、2以上のQ12は同一であっても異なっていてもよく、
      Q13は、アルキレン基であり、
      Q14は、Q14が結合するZにおける原子が炭素原子の場合、Q12であり、Q14が結合するZにおける原子が窒素原子の場合、Q13であり、Q又はQがQ14を2以上有する場合、2以上のQ14は同一であっても異なっていてもよく、
      Q15は、アルキレン基であり、Q又はQがQ15を2以上有する場合、2以上のQ15は同一であっても異なっていてもよく、
      Q22は、アルキレン基、炭素数2以上のアルキレン基の炭素-炭素原子間に-O-を有する基、アルキレン基のSiに接続しない側の末端に-O-を有する基、又は炭素数2以上のアルキレン基の炭素-炭素原子間に-O-を有しかつSiに接続しない側の末端に-O-を有する基であり、2以上のQ22は同一であっても異なっていてもよく、
      Q23は、アルキレン基、又は炭素数2以上のアルキレン基の炭素-炭素原子間に-O-を有する基であり、2個のQ23は同一であっても異なっていてもよく、
      Q24は、Q24が結合するZにおける原子が炭素原子の場合、Q22であり、Q24が結合するZにおける原子が窒素原子の場合、Q23であり、2以上のQ24は同一であっても異なっていてもよく、
      Q25は、アルキレン基、又は炭素数2以上のアルキレン基の炭素-炭素原子間に-O-を有する基であり、2以上のQ25は同一であっても異なっていてもよく、
      Q26は、アルキレン基、又は炭素数2以上のアルキレン基の炭素-炭素原子間に-O-を有する基であり、
      Q27は、アルキレン基、又は炭素数2以上のアルキレン基の炭素-炭素原子間に-O-を有する基であり、2個のQ27は同一であっても異なっていてもよく、
      Zは、Q14が直接結合する炭素原子又は窒素原子を有しかつQ24が直接結合する炭素原子又は窒素原子を有するa1+b1価又はa2+b2+1価の環構造を有する基であり、
      Rは、水素原子又はアルキル基であり、Q又はQがRを2以上有する場合、2以上のRは同一であっても異なっていてもよく、
      Rは、水素原子又はアルキル基であり、
      Rは、アルキル基であり、
      d1は、0~3の整数であり、d2は、0~3の整数であり、d1+d2は、1~3の整数であり、
      d3は、0~3の整数であり、d4は、0~3の整数であり、d3+d4は、1~3の整数であり、
      d1+d3は、1~5の整数であり、d2+d4は、1~5の整数であり、
      e1は、1~3の整数であり、e2は、1~3の整数であり、e1+e2は、3又は4であり、
      h1は、1以上の整数であり、h2は、1以上の整数であり、
      i1は、1~3の整数であり、i2は、1~3の整数であり、i1+i2は、3又は4である。
    Q 1 is a group represented by the formula (g2-1) (where a1=d1+d3 and b1=d2+d4) and a group represented by the formula (g2-2) (where a1=e1 and b1). =e2), a group represented by the formula (g2-3) (provided that a1=1 and b1=2), a group represented by the formula (g2-4) (provided that a1=h1) And b1=h2), a group represented by formula (g2-5) (provided that a1=i1 and b1=i2), a group represented by formula (g2-6) (provided that a1 =1 and b1=1), or a group represented by the formula (g2-7) (provided that a1=1 and b1=2),
    Q 2 is a group represented by formula (g2-1) (provided that a2+1=d1+d3 and b2=d2+d4) and a group represented by formula (g2-2) (provided that a2+1=e1 and b2). =e2), a group represented by formula (g2-3) (provided that a2+1=1 and b2=2), a group represented by formula (g2-4) (provided that a2+1=h1) And b2=h2), a group represented by formula (g2-5) (provided that a2+1=i1 and b2=i2), a group represented by formula (g2-6) (provided that a2+1) =1 and b2=1) or a group represented by the formula (g2-7) (provided that a2+1=1 and b2=2), any one of claims 2 to 4. The fluorine-containing compound described in 1.
    Figure JPOXMLDOC01-appb-C000001
    (-AEQ 12 -) e1 C(R 2 ) 4-e1-e2 (-Q 22 -) e2 ...(g2-2)
    -AEQ 13 -N(-Q 23 -) 2 ... (g2-3)
    (-A-E-Q 14 - ) h1 Z (-Q 24 -) h2 ··· (g2-4)
    (-AEQ 15 -) i1 Si(R 3 ) 4-i1-i2 (-Q 25 -) i2 ...(g2-5)
    -AEQ 26 -... (g2-6)
    -AE (-Q 27 -) 2 ...(g2-7)
    However,
    In formulas (g2-1) to (g2-7), the A side is connected to R f or Q f , and the Q 22 , Q 23 , Q 24 , Q 25 , Q 26, and Q 27 sides are connected to T,
    A is a single bond or an alkylene group,
    E is a site in which two or more of the polar groups are bonded in series via a divalent organic group having 1 to 20 carbon atoms, and in the formula (g2-7), the polar group at the terminal on the Q 27 side is represented by Is C(OH), C(OR 4 ), P(O), S(O), C[OP(O)(OR 3 ) 2 ], C[OS(O) 2 R 3 ] or C[OC( O) R 3 ],
    Q 11 is a single bond, —O—, an alkylene group, or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms,
    Q 12 is a single bond or an alkylene group, if Q 1 or Q 2 has a Q 12 2 or more, two or more Q 12 may be the same or different and
    Q 13 is an alkylene group,
    Q 14 is Q 12 when the atom in Z to which Q 14 is bonded is a carbon atom, Q 13 when the atom in Z to which Q 14 is bonded is a nitrogen atom, and Q 1 or Q 2 is Q 14 When two or more are present, two or more Q 14's may be the same or different,
    Q 15 is an alkylene group, if Q 1 or Q 2 has a Q 15 2 or more, two or more Q 15 may be the same or different and
    Q 22 is an alkylene group, a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms, a group having —O— at an end of the alkylene group which is not connected to Si, or a group having 2 carbon atoms. A group having -O- between the carbon-carbon atoms of the above alkylene group and having -O- at the terminal on the side not connected to Si, and two or more Q 22 s may be the same or different. Often,
    Q 23 is an alkylene group or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms, and two Q 23 may be the same or different,
    Q 24 is Q 22 when the atom in Z to which Q 24 is bonded is a carbon atom, is Q 23 when the atom in Z to which Q 24 is bonded is a nitrogen atom, and two or more Q 24 are the same. May or may not be
    Q 25 is an alkylene group or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms, and 2 or more Q 25 may be the same or different,
    Q 26 is an alkylene group or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms,
    Q 27 is an alkylene group or a group having —O— between carbon-carbon atoms of an alkylene group having 2 or more carbon atoms, and two Q 27 may be the same or different,
    Z is a group having an a1+b1 valent or a2+b2+1 valent ring structure having a carbon atom or a nitrogen atom to which Q 14 directly bonds and a carbon atom or a nitrogen atom to which Q 24 directly bonds,
    R 1 is a hydrogen atom or an alkyl group, if Q 1 or Q 2 has the R 1 2 or more, 2 or more of R 1 may be the same or different and
    R 2 is a hydrogen atom or an alkyl group,
    R 3 is an alkyl group,
    d1 is an integer of 0 to 3, d2 is an integer of 0 to 3, d1+d2 is an integer of 1 to 3,
    d3 is an integer of 0 to 3, d4 is an integer of 0 to 3, d3+d4 is an integer of 1 to 3,
    d1+d3 is an integer of 1 to 5, d2+d4 is an integer of 1 to 5,
    e1 is an integer of 1 to 3, e2 is an integer of 1 to 3, and e1+e2 is 3 or 4,
    h1 is an integer of 1 or more, h2 is an integer of 1 or more,
    i1 is an integer of 1 to 3, i2 is an integer of 1 to 3, and i1+i2 is 3 or 4.
  6.  含フッ素化合物が前記式(1A)で表される化合物である、請求項2~5のいずれか一項に記載の含フッ素化合物。 The fluorine-containing compound according to any one of claims 2 to 5, wherein the fluorine-containing compound is a compound represented by the formula (1A).
  7.  請求項1~6のいずれか一項に記載の含フッ素化合物の1種以上と、他の含フッ素化合物とを含むことを特徴とする含フッ素化合物含有組成物。 A fluorine-containing compound-containing composition comprising one or more of the fluorine-containing compounds according to any one of claims 1 to 6 and another fluorine-containing compound.
  8.  請求項1~6のいずれか一項に記載の含フッ素化合物又は請求項7に記載の含フッ素化合物含有組成物と、
     液状媒体とを含むことを特徴とするコーティング液。
    A fluorine-containing compound according to any one of claims 1 to 6 or a fluorine-containing compound-containing composition according to claim 7,
    A coating liquid containing a liquid medium.
  9.  請求項1~6のいずれか一項に記載の含フッ素化合物又は請求項7に記載の含フッ素化合物含有組成物から形成された表面層を基材の表面に有することを特徴とする物品。 An article having a surface layer formed from the fluorine-containing compound according to any one of claims 1 to 6 or the fluorine-containing compound-containing composition according to claim 7 on the surface of a substrate.
  10.  タッチパネルの指で触れる面を構成する部材の表面に前記表面層を有する、請求項9に記載の物品。 The article according to claim 9, wherein the surface layer is provided on the surface of a member that constitutes the surface of the touch panel that is touched by the finger.
  11.  請求項1~6のいずれか一項に記載の含フッ素化合物又は請求項7に記載の含フッ素化合物含有組成物を用いたドライコーティング法によって基材の表面を処理して、前記含フッ素化合物又は前記含フッ素化合物含有組成物から形成された表面層を前記基材の表面に形成することを特徴とする物品の製造方法。 A surface of a substrate is treated by a dry coating method using the fluorine-containing compound according to any one of claims 1 to 6 or the fluorine-containing compound-containing composition according to claim 7, and the fluorine-containing compound or A method for producing an article, comprising forming a surface layer formed from the composition containing a fluorine-containing compound on the surface of the substrate.
  12.  ウェットコーティング法によって請求項8に記載のコーティング液を基材の表面に塗布し、乾燥させて、前記含フッ素化合物又は前記含フッ素化合物含有組成物から形成された表面層を前記基材の表面に形成することを特徴とする物品の製造方法。 The coating liquid according to claim 8 is applied to the surface of a substrate by a wet coating method and dried to form a surface layer formed from the fluorine-containing compound or the fluorine-containing compound-containing composition on the surface of the substrate. A method for manufacturing an article, which comprises forming the article.
  13.  下式(2A)で表される化合物又は下式(2B)で表される化合物である、含フッ素化合物。
     [R-]a110[-CH=CHb1 ・・・(2A)
     [CH=CH-]b2[R-]a220-Q-Q20[-Ra2[-CH=CHb2 ・・・(2B)
     ただし、
      Rは、フルオロアルキル基(ただし、Q10及びQ20側の末端の炭素原子には少なくとも1個のフッ素原子が結合する。)、又は炭素数2以上のフルオロアルキル基の炭素-炭素原子間に-O-を有する基(ただし、Q10及びQ20側の末端の炭素原子には少なくとも1個のフッ素原子が結合する。)であり、
      Qは、フルオロアルキレン基(ただし、Q20側の末端の炭素原子には少なくとも1個のフッ素原子が結合する。)、又は炭素数2以上のフルオロアルキレン基の炭素-炭素原子間に-O-を有する基(ただし、Q20側の末端の炭素原子には少なくとも1個のフッ素原子が結合する。)であり、
      Q10は、2個以上の極性基が炭素数1~20の2価の有機基を介して直列に結合した部位を有するa1+b1価の連結基であり、
      Q20は、2個以上の極性基が炭素数1~20の2価の有機基を介して直列に結合した部位を有するa2+b2+1価の連結基であり、2個のQ20は同一であっても異なっていてもよく、
      前記極性基が、C(O)NH、NHC(O)、NH、NHC(O)NH、NHC(S)NH、S(O)NH、NHS(O)、C(O)、C(OH)、C(OR)、P(O)、S(O)、C[OP(O)(OR]、C[OS(O)]及びC[OC(O)R](ただし、Rは、アルキル基である。)からなる群から選ばれる極性基であり、
      a1は、1以上の整数であり、a2は、0以上の整数であり、2以上のRは同一であっても異なっていてもよく、
      b1及びb2は、それぞれ1以上の整数である。
    A fluorine-containing compound which is a compound represented by the following formula (2A) or a compound represented by the following formula (2B).
    [R f −] a1 Q 10 [—CH═CH 2 ] b1 ... (2A)
    [CH 2 =CH-] b2 [R f -] a2 Q 20 -Q f -Q 20 [-R f ] a2 [-CH=CH 2 ] b2 (2B)
    However,
    R f is a fluoroalkyl group (provided that at least one fluorine atom is bonded to the terminal carbon atom on the Q 10 and Q 20 side) or a carbon-carbon atom of a fluoroalkyl group having 2 or more carbon atoms. Is a group having —O— (provided that at least one fluorine atom is bonded to the terminal carbon atom on the Q 10 and Q 20 side).
    Q f represents a fluoroalkylene group (provided that at least one fluorine atom is bonded to the terminal carbon atom on the Q 20 side), or —O between carbon-carbon atoms of a fluoroalkylene group having 2 or more carbon atoms. A group having -(provided that at least one fluorine atom is bonded to the terminal carbon atom on the Q 20 side),
    Q 10 is an a1+b1 valent linking group having a site in which two or more polar groups are bonded in series via a divalent organic group having 1 to 20 carbon atoms,
    Q 20 is an a2+b2+1 valent linking group having a site in which two or more polar groups are connected in series via a divalent organic group having 1 to 20 carbon atoms, and the two Q 20 are the same. May be different,
    The polar group is C(O)NH, NHC(O), NH, NHC(O)NH, NHC(S)NH, S(O) 2 NH, NHS(O) 2 , C(O), C( OH), C(OR 4 ), P(O), S(O), C[OP(O)(OR 4 ) 2 ], C[OS(O) 2 R 4 ] and C[OC(O)R. 4 ] (wherein R 4 is an alkyl group) is a polar group selected from the group consisting of:
    a1 is an integer of 1 or more, a2 is an integer of 0 or more, and R f of 2 or more may be the same or different,
    b1 and b2 are each an integer of 1 or more.
  14.  前記極性基が、C(O)NH、NHC(O)、S(O)NH又はNHS(O)である、請求項13に記載の含フッ素化合物。 The fluorine-containing compound according to claim 13, wherein the polar group is C(O)NH, NHC(O), S(O) 2 NH or NHS(O) 2 .
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