WO2019049753A1 - Fluorine-containing ether compound, composition and article - Google Patents

Fluorine-containing ether compound, composition and article Download PDF

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Publication number
WO2019049753A1
WO2019049753A1 PCT/JP2018/031999 JP2018031999W WO2019049753A1 WO 2019049753 A1 WO2019049753 A1 WO 2019049753A1 JP 2018031999 W JP2018031999 W JP 2018031999W WO 2019049753 A1 WO2019049753 A1 WO 2019049753A1
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group
fluorine
formula
integer
compound
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PCT/JP2018/031999
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French (fr)
Japanese (ja)
Inventor
星野 泰輝
誠人 宇野
健二 石関
弘賢 山本
勇佑 冨依
啓吾 松浦
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Agc株式会社
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Priority to JP2019540915A priority Critical patent/JP7067562B2/en
Priority to CN201880057655.9A priority patent/CN111051383B/en
Publication of WO2019049753A1 publication Critical patent/WO2019049753A1/en

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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/18Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/32Polymers modified by chemical after-treatment
    • C08G65/329Polymers modified by chemical after-treatment with organic compounds
    • C08G65/336Polymers modified by chemical after-treatment with organic compounds containing silicon
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/18Materials not provided for elsewhere for application to surfaces to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces

Definitions

  • the present invention relates to fluorine-containing ether compounds, compositions and articles.
  • a fluorine-containing compound exhibits high lubricity, water and oil repellency, etc.
  • it is suitably used as a surface treatment agent.
  • the surface treatment agent imparts water and oil repellency to the surface of the substrate, the dirt on the surface of the substrate can be easily wiped off, and the dirt removability is improved.
  • a fluorine-containing ether compound having a poly (oxyperfluoroalkylene) chain in which an ether bond (-O-) is present in the middle of the perfluoroalkylene chain is a compound having excellent flexibility. Excellent dirt removability.
  • the surface treatment agent containing the above-mentioned fluorine-containing ether compound has a performance (friction resistance) in which water and oil repellency hardly decreases even if it is repeatedly rubbed with a finger (friction resistance) and a performance capable of easily removing fingerprints attached to the surface by wiping (fingerprint stain It is used as a surface treatment agent of the member which comprises the surface touched by the finger of a touch panel, for example for which the removal property is required to be maintained for a long time.
  • said fluorine-containing ether compound the compound which has a poly (oxyperfluoro alkylene) chain
  • the fluorine-containing ether compounds described in Patent Document 1 have high solubility in fluorine-based organic solvents, but non-fluorinated organic solvents widely used in industrial processes (especially ketone-based organic solvents, ether-based organic solvents) And so forth (general-purpose solvents), etc.). From the industrial point of view, a fluorine-containing ether that can be dissolved in a non-fluorinated organic solvent and can form a surface layer excellent in abrasion resistance even when using a composition dissolved in a non-fluorinated organic solvent There is a need for compounds.
  • the present invention forms a surface layer excellent in solubility in a non-fluorinated organic solvent, and also excellent in abrasion resistance when a composition dissolved in a non-fluorinated organic solvent is used. It is an object of the present invention to provide a possible fluorine-containing ether compound, composition and article.
  • the present invention provides fluorine-containing ether compounds, compositions and articles having the following constitutions [1] to [13].
  • (OX 1 ) Formula A1 -Si (R) n L 3-n formula B
  • X 1 is a fluoroalkylene group having one or more hydrogen atoms.
  • R is a monovalent hydrocarbon group.
  • L is a hydrolyzable group or a hydroxyl group.
  • n is an integer of 0 to 2.
  • the poly (oxyfluoroalkylene) chain includes a number of oxyfluoroalkylene units represented by the formula A1 and b number of oxyperfluoroalkylene units represented by the formula A2, and a is 2 or more.
  • R 1 The fluorine-containing ether compound of any one of [1] to [6], which is a compound represented by the following formula 1.
  • R 1 is an alkyl group which may have a fluorine atom, or —YZ (R 2 ) q (R 3 ) rq .
  • X 1 is a fluoroalkylene group having one or more hydrogen atoms.
  • X 2 is a perfluoroalkylene group.
  • Y is a single bond or a divalent linking group.
  • Z is a carbon atom, a silicon atom or a nitrogen atom.
  • R 2 is a hydrogen atom, a hydroxyl group or an alkyl group.
  • R 3 is -L 1 -Si (R) n L 3-n .
  • L 1 is an alkylene group which may have —O—.
  • a is an integer of 2 or more
  • b is an integer of 0 or more
  • a + b is an integer of 8 or more.
  • a composition comprising the fluorine-containing ether compound of any one of the above [1] to [8] and a liquid medium.
  • X 1 is a fluoroalkylene group having one or more hydrogen atoms.
  • X 2 is a perfluoroalkylene group.
  • Y is a single bond or a divalent linking group.
  • Z is a carbon atom, a silicon atom or a nitrogen atom.
  • R 2 is a hydrogen atom, a hydroxyl group or an alkyl group.
  • a is an integer of 2 or more
  • b is an integer of 0 or more
  • a + b is an integer of 8 or more.
  • L 2 is an alkylene group which may have —O—, a single bond or —O—.
  • Z is a carbon atom or a silicon atom
  • r is 3 and q is an integer of 0 to 2.
  • Z is a nitrogen atom
  • r is 2 and q is an integer of 0 to 1.
  • R 11 - [(OX 1) a (OX 2) b] -Y-Z (R 2) q (L 2 -CH CH 2) r-q
  • R 1 is an alkyl group which may have a fluorine atom, or —YZ (R 2 ) q (R 3 ) rq .
  • X 1 is a fluoroalkylene group having one or more hydrogen atoms.
  • X 2 is a perfluoroalkylene group.
  • Y is a single bond or a divalent linking group.
  • Z is a carbon atom, a silicon atom or a nitrogen atom.
  • R 2 is a hydrogen atom, a hydroxyl group or an alkyl group.
  • R 3 is -L 1 -Si (R) n L 3-n .
  • L 1 is an alkylene group which may have —O—.
  • a is an integer of 2 or more
  • b is an integer of 0 or more
  • a + b is an integer of 8 or more.
  • L 2 is an alkylene group which may have —O—, a single bond or —O—.
  • Z is a carbon atom or a silicon atom
  • r is 3 and q is an integer of 0 to 2.
  • Z is a nitrogen atom
  • r is 2 and q is an integer of 0 to 1.
  • a fluorine-containing ether compound having excellent solubility in a non-fluorinated organic solvent, and excellent friction resistance even when using a composition dissolved in a non-fluorinated organic solvent, a composition, and Can provide an article.
  • the compound represented by Formula 1 is referred to as Compound 1.
  • the compounds represented by other formulas are similarly described.
  • the oxyfluoroalkylene unit represented by formula A1 is described as unit A1.
  • the units represented by other formulas are similarly described.
  • the group represented by Formula B is referred to as a group B.
  • the alkylene group may have an A group”
  • the alkylene group may have an A group between carbon-carbon atoms in the alkylene group, and an alkylene group— It may have an A group at the end, such as an A group.
  • the meanings of the terms in the present invention are as follows.
  • the "surface layer” means a layer formed on a substrate.
  • the surface layer may be formed directly on the substrate, or may be formed on the substrate via another layer formed on the surface of the substrate.
  • the “number average molecular weight” of the fluorine-containing ether compound is calculated by determining the number (average value) of oxyfluoroalkylene units based on the end group by 1 H-NMR and 19 F-NMR.
  • the fluorine-containing ether compound of the present invention (hereinafter, also referred to as “specific compound”) has a poly (oxyfluoroalkylene) chain containing the unit A1 and two or more groups B.
  • the specific compound is excellent in solubility in non-fluorinated organic solvents (in particular, ketone organic solvents, ether organic solvents). The reason for this is presumed to be that the affinity to a non-fluorinated organic solvent is improved by using a poly (oxyfluoroalkylene) chain containing a unit A1 having a hydrogen atom.
  • a specific compound since a specific compound has a fluorine atom, it is excellent also in the solubility with respect to a fluorine-type organic solvent. Moreover, the surface layer formed using a specific compound is excellent in abrasion resistance. The reason for this is presumed to be that by having two or more groups B, the reaction point between the specific compound and the base material is increased, and the adhesion between the surface layer and the base material is improved.
  • the specific compound has a poly (oxyfluoroalkylene) chain containing unit A1.
  • Formula A1 X 1 is a fluoroalkylene group having one or more hydrogen atoms.
  • the carbon number of X 1 is preferably 1 to 6, more preferably 2 to 6, and particularly preferably 2 to 4.
  • the hydrogen atom which X 1 has is 1 or more, 1 or 3 is preferable at the point which is excellent in the balance with the solubility with respect to the non-fluorine type organic solvent of a specific compound, and the abrasion resistance of surface layer, 1 or 3 Particularly preferred is two.
  • X 1 has one or more fluorine atoms.
  • the number of fluorine atoms of X 1 is one or more, and is preferably 1 to 11, in that the balance between the solubility of the specific compound in a non-fluorinated organic solvent and the friction resistance of the surface layer is excellent.
  • One is particularly preferred.
  • X 1 is preferably linear from the viewpoint that the abrasion resistance of the surface layer is more excellent.
  • the unit A1 include (OCF 2 CHF), (OCHFCF 2 ), (OCF 2 CH 2 ), (OCH 2 CF 2 ), (OCF 2 CF 2 CHF), (OCHFCF 2 CF 2 ), (OCF) 2 CF 2 CH 2 ), (OCH 2 CF 2 CF 2 ), (OCF 2 CF 2 CH 2 ), (OCH 2 CF 2 CF 2 ), (OCF 2 CF 2 CF 2 CH 2 ) , (OCH 2 CF 2 CF 2 CF 2 ), (OCF 2 CF 2 CF 2 CH 2 ), and (OCH 2 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 ).
  • a is preferably an integer of 2 or more, more preferably an integer of 2 to 200, more preferably an integer of 5 to 150, and 8 to The integer of 100 is more preferable, and the integer of 10 to 50 is particularly preferable.
  • the poly (oxyfluoroalkylene) chain may contain only one type of unit A1 or may contain two or more types of unit A1.
  • the poly (oxyfluoroalkylene) chain may contain only one type of unit A1 or may contain two or more types of unit A1.
  • two or more types of units A1 for example, two or more types of units A1 having different carbon numbers, two or more types of units A1 having different numbers of hydrogen atoms, presence or absence of side chains even if the number of carbon atoms is the same And two or more units of different types of A.
  • the bonding order of the two or more units A1 is not limited, and may be arranged randomly, alternately, or in blocks.
  • the a (OX 1 ) s of the poly (oxyfluoroalkylene) chain are represented by (OX 1 ) a .
  • (OX 1) a the number of (OX 1) is intended to represent that it is a number, it does not represent an arrangement of a number of (OX 1).
  • (OX 2) b also (OX 2) is intended to represent that the number b and is not intended to represent the arrangement of the b-number of (OX 2).
  • the poly (oxyfluoroalkylene) chain represented by [(OX 1 ) a (OX 2 ) b ] described later, the poly (oxyfluoro alkylene) chain is a (OX 1 ) and b (OX 1 ) chains. 2) is intended to represent that it has a, it does not represent that it has a block of a number (OX 1) of the block and b pieces of (OX 2).
  • [(OX 1 ) a (OX 2 ) b ] may be any arrangement of (OX 1 ) and (OX 2 ) in random, alternating or block, and in any arrangement, a (( It represents that it is a poly (oxy fluoro alkylene) chain which has OX 1 ) and b pieces (OX 2 ).
  • the poly (oxy-fluoroalkylene) chain has (OX 1) a, [( OC 2 H m1 F (4-m1)) a1 (OC 3 H m2 F (6-m2)) a2 (OC 4 H m3 F (8-m3)) a3 ( OC 5 H m4 F (10-m4)) a4 (OC 6 H m5 F (12-m5)) a5] is preferred.
  • m1 is an integer of 1 to 3
  • m2 is an integer of 1 to 5
  • m3 is an integer of 1 to 7
  • m4 is an integer of 1 to 9
  • m5 is an integer of 1 to 11.
  • Each of a 1, a 2, a 3, a 4 and a 5 is independently an integer of 0 or more, preferably 100 or less.
  • a1 + a2 + a3 + a4 + a5 is an integer of 2 or more, preferably an integer of 2 to 200, more preferably an integer of 5 to 150, still more preferably an integer of 8 to 100, and particularly preferably an integer of 10 to 50.
  • an integer of 1 or more is preferable, and an integer of 2 to 200 is particularly preferable because a1 is more excellent in the solubility of the specific compound in the non-fluorinated organic solvent.
  • C 3 H m2 F (6 -m2), C 4 H m3 F (8-m3), C 5 H m4 F (10-m4) and C 6 H m5 F (12- m5) has a surface layer Linear is preferable from the viewpoint of more excellent friction resistance.
  • a1 one (OC 2 H m1 F (4 -m1)), a2 amino (OC 3 H m2 F (6 -m2)), a3 amino (OC 4 H m3 F (8 -m3)), a4 amino (OC 5 H m4 F (10 -m4)), binding order of a5 pieces (OC 6 H m5 F (12 -m5)) is not limited.
  • a1 is 2 or more, a plurality of (OC 2 H m1 F (4-m1) 2 ) may be the same or different.
  • a plurality of (OC 3 H m2 F (6-m2) ) may be the same or different.
  • a3 is 2 or more, a plurality of (OC 4 H m3 F (8-m3) ) may be the same or different.
  • a4 is 2 or more, a plurality of (OC 5 H m4 F (10-m4) ) may be the same or different.
  • a5 is 2 or more, a plurality of (OC 6 H m5 F (10-m5) ) may be the same or different.
  • (OX 1 ) a is an OX 1 having 2 carbon atoms, that is, (OC 2 H m1 F (4-m1) ) in that the solubility of the specific compound in the non-fluorinated organic solvent is more excellent.
  • the following (1) to (5) are preferable as (OX 1 ) a possessed by the poly (oxyfluoroalkylene) chain.
  • the above (2) corresponds to an aspect in which a2, a4 and a5 are 0, and a1 + a3 is an integer of 2 or more.
  • the above (3) corresponds to an aspect in which a2, a3 and a5 are 0, and a1 + a4 is an integer of 2 or more.
  • the above (4) corresponds to an embodiment in which a2, a3 and a4 are 0, and a1 + a5 is an integer of 2 or more.
  • the above (5) represents a poly (oxyfluoroalkylene) chain having a total of a1 two or more different (OC 2 H m1 F (4-m1) 2 ) and a1 being an integer of 2 or more. Also in the above (1) to (4), when a1 is an integer of 2 or more, it may have two or more different (OC 2 H m1 F (4-m1) ).
  • the poly (oxyfluoroalkylene) chain may further contain an oxyperfluoroalkylene unit in addition to the unit A1. Specifically, the poly (oxyfluoroalkylene) chain may contain the unit A2.
  • X 2 is a perfluoroalkylene group. The carbon number of X 2 is preferably 1 to 6. The group X 2 is preferably linear from the viewpoint that the abrasion resistance of the surface layer is more excellent.
  • the poly (oxyfluoroalkylene) chain may contain only one type of unit A2, or may contain two or more types of unit A2.
  • Examples of two or more types of units A2 include two or more types of units A2 having different carbon numbers, and two or more types of units A2 having different side chains and having different types of side chains even if the number of carbons is the same. .
  • the unit A2 include (OCF 2 ), (OCF 2 CF 2 ), (OCF 2 CF 2 CF 2 ), (OCF (CF 3 ) CF 2 ), (OCF 2 CF 2 CF 2 CF 2 ), (OCF (CF 3) CF 2 CF 2), (OCF 2 CF 2 CF 2 CF 2), include (OCF 2 CF 2 CF 2 CF 2 CF 2 CF 2).
  • b is an integer of 0 or more, preferably an integer of 0 to 200, more preferably an integer of 0 to 50, and 0 to 10
  • the integer of is more preferable, and the integer of 0 to 2 is particularly preferable.
  • the bonding order of the unit A1 and the unit A2 is not limited.
  • the units A1 and A2 may be arranged randomly, alternately, and in blocks.
  • a + b is an integer of 8 or more, preferably an integer of 8 to 400, and more preferably an integer of 8 to 200.
  • an integer of 8 to 120 is more preferable, and an integer of 10 to 52 is particularly preferable.
  • the specific compound has two or more groups B. -Si (R) n L 3-n formula B
  • the number of groups B possessed by the specific compound is 2 or more, and 2 to 10 are preferable, 2 to 5 are more preferable, and 2 or 3 in that the friction resistance of the surface layer is more excellent. Is particularly preferred. Two or more groups B may be the same or different. It is preferable that they are the same as each other from the viewpoint of the availability of raw materials and the ease of production of a specific compound.
  • R is a monovalent hydrocarbon group, preferably a monovalent saturated hydrocarbon group.
  • the carbon number of R is preferably 1 to 6, more preferably 1 to 3, and particularly preferably 1 or 2.
  • L is a hydrolyzable group or a hydroxyl group.
  • a hydrolyzable group is preferable.
  • the hydrolyzable group of L is a group which becomes a hydroxyl group by a hydrolysis reaction. That is, when L is a hydrolyzable group, the hydrolyzable silyl group represented by Si-L becomes a silanol group represented by Si-OH by a hydrolysis reaction.
  • the silanol groups further react between silanol groups to form Si-O-Si bonds.
  • the silanol group can be subjected to a dehydration condensation reaction with a hydroxyl group (substrate -OH) on the surface of the substrate to form a chemical bond (substrate -O-Si).
  • the hydrolyzable group examples include an alkoxy group, a halogen atom, an acyl group, an acyloxy group and an isocyanate group (-NCO).
  • the alkoxy group is preferably an alkoxy group having 1 to 4 carbon atoms.
  • a halogen atom a chlorine atom is preferable.
  • an alkoxy group having 1 to 4 carbon atoms or a halogen atom is preferable from the viewpoint of easier production of the specific compound.
  • an alkoxy group having 1 to 4 carbon atoms is preferable from the viewpoint of little outgassing at the time of application and the storage stability of the specific compound being more excellent, and an ethoxy group when long-term storage stability of the specific compound is required.
  • a methoxy group is particularly preferable.
  • n is an integer of 0 to 2. n is preferably 0 or 1, and 0 is particularly preferred.
  • the presence of a plurality of L makes the adhesion of the surface layer to the substrate stronger.
  • n is 1 or less, a plurality of L present in one molecule may be the same or different. It is preferable that they are the same as each other from the viewpoint of the availability of raw materials and the ease of production of a specific compound.
  • n is 2
  • plural R present in one molecule may be the same or different. From the viewpoint of the availability of raw materials and the ease of production of compound 1, they are preferably the same.
  • the compound 1 is preferable at the point which is excellent by the solubility with respect to the non-fluorinated organic solvent of a specific compound, and the abrasion resistance of a surface layer.
  • R 1 is an alkyl group which may have a fluorine atom, or —YZ (R 2 ) q (R 3 ) rq .
  • the definitions of Y, Z, R 1 , R 2 , r and q are as described later.
  • the number of carbon atoms in the alkyl group which may have a fluorine atom is preferably 1 to 20, and more preferably 1 to 10 in that it is excellent in the solubility of the specific compound in the non-fluorinated organic solvent and the abrasion resistance of the surface layer. More preferably, 1 to 6 is particularly preferred.
  • the alkyl group which may have a fluorine atom may be linear or branched, and is preferably linear from the viewpoint that the abrasion resistance of the surface layer is more excellent.
  • the alkyl group which may have a fluorine atom may be a group in which all hydrogen atoms in the alkyl group are substituted with a fluorine atom (perfluoroalkyl group).
  • alkyl group which may have a fluorine atom examples include CH 3- , CF 3- , CF 3 CH 2- , CF 3 CF 2- , CF 3 CF 2 CF 2- , and (CF 3 ) 2 CH—, CF 3 CF 2 CF 2 CF 2 CH 2 CH 2 —, CF 3 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 —.
  • the group represented by [(OX 1 ) a (OX 2 ) b ] is a poly (oxyfluoroalkylene) chain.
  • the definitions of X 1 , X 2 , a and b are as described above.
  • a + b in Formula 1 is an integer of 8 or more, preferably an integer of 8 to 400, more preferably an integer of 8 to 200, still more preferably an integer of 8 to 120, and particularly preferably an integer of 10 to 52.
  • the binding order of (OX 1 ) and (OX 2 ) is not limited.
  • (OX 1 ) and (OX 2 ) may be arranged randomly, alternately, and in blocks.
  • a plurality of (OX 1) may be be the same or different. That is, (OX 1 ) a may be composed of two or more (OX 1 ) different in X 1 .
  • the bonding order of two or more (OX 1 ) is not limited, and may be arranged randomly, alternately, or in blocks.
  • b is 2 or more
  • a plurality of (OX 2 ) may be the same or different. That is, (OX 2 ) b may be composed of two or more (OX 2 ) different in X 2 .
  • the bonding order of two or more (OX 2 ) is not limited, and may be arranged randomly, alternately, and in blocks.
  • the bivalent linking group may be, for example, a bivalent hydrocarbon group (a bivalent saturated hydrocarbon group, a bivalent aromatic hydrocarbon group, an alkenylene group, an alkynylene group).
  • the hydrogen group may be linear, branched or cyclic and includes, for example, an alkylene group
  • the carbon number is preferably 1 to 20, more preferably 1 to 10, and particularly preferably 1 to 6.
  • the divalent aromatic hydrocarbon group preferably has 5 to 20 carbon atoms, for example, a phenylene group, etc.
  • an alkenylene group having 2 to 20 carbon atoms and an alkynylene group having 2 to 20 carbon atoms A divalent heterocyclic group, -O-, -S-, -SO 2- , -N (R 4 )-, -C (O)-, -Si (R 5 ) 2 And groups in which two or more of these are combined.
  • R 4 is a hydrogen atom or an alkyl group (preferably having a carbon number of 1 to 10).
  • R 5 is an alkyl group (preferably having a carbon number of 1 to 10) or a phenyl group.
  • Y is a single bond, —O—, —C (O) —, —C (O) N (R 4 ) —, —C (O) N, in that it is easier to synthesize a specific compound.
  • R 4 ) -alkylene group- and -O-alkylene group- are preferable.
  • Z is a carbon atom, a nitrogen atom or a silicon atom.
  • R 2 is a hydrogen atom, a hydroxyl group or an alkyl group.
  • the carbon number of the alkyl group is preferably 1 to 5, more preferably 1 to 3, and particularly preferably 1.
  • q is 2, two R 2 s may be the same or different. From the viewpoint of the availability of raw materials and the ease of production of compound 1, they are preferably the same.
  • R 3 is -L 1 -Si (R) n L 3-n .
  • L 1 is an alkylene group which may have —O—. When the alkylene group has -O-, it is preferable to have -O- at the end between carbon and carbon atoms or on the Z side.
  • the carbon number of L 1 is preferably 1 to 10, more preferably 1 to 6, and particularly preferably 1 to 4.
  • r When Z is a carbon atom or a silicon atom, r is 3 and q is an integer of 0 to 2, preferably 0 or 1. When Z is a nitrogen atom, r is 2 and q is an integer of 0 to 1, preferably 0. When there are a plurality of R 3 in one molecule, the plurality of R 3 may be the same or different. From the viewpoint of the availability of raw materials and the ease of production of compound 1, they are preferably the same.
  • the compound 2 is preferable in that it is excellent in the solubility of the specific compound in the non-fluorinated organic solvent and the friction resistance of the surface layer.
  • the definition of each group is as described above.
  • compound 1 examples include the following.
  • t represents an integer of 1 or more.
  • t is preferably an integer of 50 or less.
  • the specific compound can be produced by a known production method. For example, it can be produced by hydrosilylation reaction of compound 3 with HSi (R) n L 3-n .
  • R 11 - [(OX 1) a (OX 2) b] -Y-Z (R 2) q (L 2 -CH CH 2) r-q Formula 3
  • X 1 , X 2 , Y, Z, R 2 , a, b, q and r are as defined above
  • L 2 is an alkylene group which may have -O-, a single bond or -O-
  • L 2 -CH When CH 2 is hydrosilylated, it becomes L 1 of Compound 1.
  • composition of the present invention contains a specific compound and a liquid medium.
  • the specific compounds may be used alone or in combination of two or more.
  • the content of the specific compound is preferably 0.001 to 30% by mass, particularly preferably 0.01 to 20% by mass, with respect to the total mass of the composition.
  • liquid medium examples include water and organic solvents.
  • organic solvent examples include fluorine-based organic solvents and non-fluorine-based organic solvents.
  • the organic solvents may be used alone or in combination of two or more.
  • fluorinated organic solvent examples include fluorinated alkanes, fluorinated aromatic compounds, fluoroalkyl ethers, fluorinated alkylamines and fluoroalcohols.
  • the fluorinated alkane is preferably a compound having 4 to 8 carbon atoms.
  • C 6 F 13 H AC-2000: product name, manufactured by AGC
  • C 6 F 13 C 2 H 5 AC-6000: product name
  • AGC AGC
  • C 2 F 5 CHFCHFCF 3 Bartrel: product name, manufactured by Dupont.
  • fluorinated aromatic compound examples include hexafluorobenzene, trifluoromethylbenzene, perfluorotoluene, 1,3-bis (trifluoromethyl) benzene, and 1,4-bis (trifluoromethyl) benzene.
  • the fluoroalkyl ether is preferably a compound having 4 to 12 carbon atoms.
  • fluorinated alkylamines include perfluorotripropylamine and perfluorotributylamine.
  • fluoroalcohols include 2,2,3,3-tetrafluoropropanol, 2,2,2-trifluoroethanol and hexafluoroisopropanol.
  • non-fluorinated organic solvent a compound consisting of only a hydrogen atom and a carbon atom, and a compound consisting of only a hydrogen atom, a carbon atom and an oxygen atom are preferable.
  • a hydrocarbon-based organic solvent a ketone-based organic solvent And ether-based organic solvents and ester-based organic solvents.
  • the hydrocarbon-based organic solvent include hexane, heptane and cyclohexane.
  • Specific examples of the ketone-based organic solvent include acetone, methyl ethyl ketone and methyl isobutyl ketone.
  • ether-based organic solvent examples include diethyl ether, tetrahydrofuran and tetraethylene glycol dimethyl ether.
  • Ethyl acetate and butyl acetate are mentioned as a specific example of ester system organic solvent.
  • ketone-based organic solvents and ether-based organic solvents are preferable from the viewpoint that the solubility of the specific compound is more excellent.
  • the content of the liquid medium is preferably 70 to 99.999% by mass, particularly preferably 80 to 99.99% by mass, with respect to the total mass of the composition.
  • the composition of the present invention may contain components other than the specific compound and the liquid medium.
  • other components include by-products produced in the process of producing a specific compound, and compounds unavoidable for production of unreacted starting materials and the like.
  • additives such as an acid catalyst and a basic catalyst which promote the hydrolysis and condensation reaction of the hydrolyzable silyl group may be mentioned.
  • the acid catalyst include hydrochloric acid, nitric acid, acetic acid, sulfuric acid, phosphoric acid, sulfonic acid, methanesulfonic acid and p-toluenesulfonic acid.
  • Specific examples of the basic catalyst include sodium hydroxide, potassium hydroxide and ammonia.
  • the content of the other components is preferably 0 to 10% by mass, more preferably 0 to 5% by mass, and particularly preferably 0 to 1% by mass, with respect to the specific compound.
  • the article of the present invention has a substrate and a surface layer formed of the specific compound or the present composition on the substrate. That is, a surface treatment agent containing a specific compound is used for surface treatment of an article.
  • the surface layer contains a compound obtained through hydrolysis reaction and condensation reaction of a specific compound.
  • the thickness of the surface layer is preferably 1 to 100 nm, particularly preferably 1 to 50 nm.
  • the thickness of the surface layer is determined using an X-ray diffractometer for thin film analysis (ATX-G: product name, manufactured by RIGAKU Co., Ltd.) to obtain an interference pattern of the reflected X-ray by the X-ray reflectance method. It can be calculated from the vibration period.
  • the substrate is not particularly limited as long as the substrate is required to be imparted with water and oil repellency.
  • Specific examples of the material of the substrate include metals, resins, glasses, sapphires, ceramics, stones, and composite materials of these.
  • the glass may be chemically strengthened.
  • the substrate may be subjected to a surface treatment with a compound described in paragraphs 0089 to 0095 of WO 2011/016458, SiO 2 or the like.
  • a base material the base material for touchscreens and a display base material are preferable, and the base material for touchscreens is especially preferable.
  • the touch panel substrate preferably has a light transmitting property.
  • “Having light transmittance” means that the vertical incident visible light transmittance according to JIS R 3106: 1998 (ISO 9050: 1990) is 25% or more.
  • a material of the base material for touchscreens glass or transparent resin is preferable.
  • the above-mentioned article can be manufactured, for example, by the following method. -A method of treating the surface of a substrate by a dry coating method using a specific compound or the present composition to obtain the above-mentioned article. -A method of applying the present composition to the surface of a substrate by a wet coating method and drying it to obtain the above-mentioned article. In the wet coating method, it is also possible to use a composition containing a hydrolysed compound and a liquid medium by hydrolyzing a specific compound in advance using an acid catalyst, a basic catalyst or the like.
  • the dry coating method include a vacuum evaporation method, a CVD method, and a sputtering method.
  • the vacuum evaporation method is preferable in terms of suppressing the decomposition of the specific compound and the simplicity of the apparatus.
  • a pellet-like substance in which a specific compound or the present composition is impregnated into a porous metal body such as iron or steel may be used.
  • the wet coating method include spin coating method, wipe coating method, spray coating method, squeegee coating method, dip coating method, die coating method, ink jet method, flow coating method, roll coating method, casting method, Langmuir-Blodgett And gravure coating.
  • the article may have a surface layer formed of the other compound or the composition including the other compound on the other side than the surface having the specific compound or the surface layer formed of the present composition.
  • Other compounds include poly (oxyperfluoroalkylene) chains and other fluorine-containing ether compounds having a hydrolyzable group bonded to a silicon atom and / or a hydroxyl group bonded to a silicon atom.
  • Other fluorine-containing ether compounds include compound 4. [A-O-Z 1- (R f O) r- ] j Z 2 [-SiR n L 3-n ] g
  • Formula 4 A is a perfluoroalkyl group or -Q [-SiR n L 3-n ] k .
  • Q is a (k + 1) valent linking group.
  • k is an integer of 1 to 10.
  • the definitions of R, L and n are as defined for R, L and n of group B respectively.
  • Z 1 is a single bond, an oxyfluoroalkylene group having 1 to 20 carbon atoms in which one or more hydrogen atoms have been substituted by a fluorine atom, or 1 to 20 carbon atoms in which one or more hydrogen atoms have been substituted in a fluorine atom It is a poly (oxyfluoroalkylene) group.
  • R f is a perfluoroalkylene group.
  • r is an integer of 2 to 200
  • Z 2 is a (j + g) -valent linking group. j and g are each independently an integer of 1 or more.
  • fluorine-containing ether compounds may also be commercially available products.
  • KY-100 series KY-178, KY-185, KY-195, etc.
  • Optool (registered trademark) DSX manufactured by Daikin Industries, Ltd.
  • Optool (registered trademark) AES Optool (registered trademark) UF 503, Optool (registered trademark) UD 509, Afluid (registered trademark) S550 manufactured by AGC, Inc.
  • ⁇ Evaluation method (Solubility) The appearance of the diluted solution diluted with acetone so that the concentration of the fluorinated ether compound was 1% by mass was visually observed, and the solubility of the fluorinated ether compound was evaluated based on the following criteria.
  • the water contact angle was measured for the evaluation samples before and after the friction resistance test. The smaller the decrease in water contact angle after friction, the smaller the decrease in performance due to friction, and the better the friction resistance. 20 degrees or less is preferable and, as for the fall of a water contact angle, 15 degrees or less is more preferable.
  • ⁇ Measurement method of water contact angle> The contact angle (water contact angle) of about 2 ⁇ L of distilled water placed on the surface of the surface layer was measured using a contact angle measurement device (DM-500: product name, manufactured by Kyowa Interface Science Co., Ltd.). It measured in five different places in the surface of a surface layer, and computed the average value. The 2 ⁇ method was used to calculate the contact angle.
  • a cellulose non-woven fabric (Bencott M-3: product name, manufactured by Asahi Kasei Corp.) was used using a reciprocating traverse tester (manufactured by Keienute) in accordance with JIS L 0849: 2013 (ISO 105-X12: 2001). Load: 1 kg, friction length: 4 cm, speed: reciprocated 10,000 times at 30 rpm.
  • Example 1-1 In a 100 mL recovery flask connected to a reflux condenser, 10.0 g of Compound X1 and 2.61 g of potassium carbonate powder were placed. While stirring the mixture in the naphtha flask at 120 ° C. under a nitrogen atmosphere, 106.9 g of the compound X2 was added dropwise to the eggplant flask while controlling the internal temperature to 130 ° C. or less. After the entire amount had been dropped, the mixture in the naphtha flask was stirred for a further 1 hour while maintaining the temperature at 120 ° C., the heating was stopped and the stirring was continued until the temperature dropped to 25 ° C.
  • Example 1-2 J. Org. Chem. , 64, 1999, p.
  • the compound X3 obtained in Example 1-1 was oxidized according to the method described in 2564-2566 to obtain a compound X4.
  • Example 1-3 In a 100 mL recovery flask, 40.0 g of the compound X4 obtained in Example 1-2 and 10 mL of methanol were placed, and stirred at 25 ° C. for 12 hours. From NMR, it was confirmed that compound X4 was all converted to compound X5. The solvent was distilled off under reduced pressure to obtain 6.40.1 g (yield 100%) of compound X5.
  • Example 1-4 In a 50 mL eggplant flask, 10.0 g of the compound X5 obtained in Example 1-3 and 0.40 g of the compound X6 were charged, and stirred for 12 hours. From NMR, it was confirmed that compound X5 was all converted to compound 3-1. In addition, methanol, which is a by-product, was produced. The resulting solution was diluted with 9.0 g of AC-2000, and purified by silica gel column chromatography (developing solvent: AC-2000) to obtain 9.2 g (yield 89%) of compound 3-1.
  • Example 1-5 In a 10 mL glass sample bottle, 6.0 g of the compound 3-1 obtained in Example 1-4, platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex in xylene solution (platinum Content: 2% by mass of 0.06 g, HSi (OCH 3 ) 3 of 1.01 g, aniline of 0.02 g, 1,3-bis (trifluoromethyl) benzene (manufactured by Tokyo Chemical Industry Co., Ltd.) 1. 0 g was added and stirred at 40 ° C. for 8 hours. After completion of the reaction, the solvent and the like were distilled off under reduced pressure, and the mixture was filtered through a membrane filter with a 1.0 ⁇ m pore diameter to obtain 6.5 g (yield 100%) of compound 1-1.
  • platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex in xylene solution platinum / 1,3-divin
  • Example 2 Compound 1-2 was synthesized by the following procedure. The reaction formula is shown together with Example 3 described later.
  • Example 2-1 In a 100 mL eggplant flask, 50.0 g of tetrahydrofuran was placed and cooled to 0 ° C. 15 mL of 0.7 mol / L allylmagnesium bromide was dropped into the eggplant flask, 20.5 g of the compound X5 obtained in Example 1-3 was dropped, and the mixture in the eggplant flask was further stirred for 2 hours.
  • reaction is terminated by adding 30 mL of a 1 mol / L aqueous hydrochloric acid solution to the mixture, and the lower layer is subjected to silica gel column chromatography (developing solvent: C 6 F 13 C 2 H 5 (manufactured by AGC, ASAHIKLIN (registered trademark) AC-6000). ) To give 16.1 g (yield 78%) of compound 3-2.
  • Example 2-2 In the same manner as in Example 1-5 except that Compound 3-1 was changed to 6.0 g of Compound 3-2 obtained in Example 2-1, 6.3 g (yield 100%) of Compound 1-2 was obtained.
  • Example 3 Compound 1-3 was synthesized by the following procedure. The reaction formula is shown together with Example 2 above.
  • Example 3-1 In a 50 mL recovery flask, 10.0 g of the compound 3-2 obtained in Example 2-1, 1.5 g of allyl bromide, 0.03 g of tetrabutylammonium iodide and 0.7 g of potassium hydroxide are placed. The mixture is stirred at 80 ° C. for 5 hours. The mixture was cooled to 25 ° C., charged with 10 g of AE-3000 and washed twice with water. The obtained crude solution was purified by silica gel column chromatography (developing solvent: AC-6000) to obtain 9.3 g (yield 92%) of compound 3-3.
  • Example 3-2 In the same manner as in Example 1-5 except that Compound 3-1 was changed to 6.0 g of Compound 3-3 obtained in Example 3-1, 6.5 g (yield 100%) of Compound 1-3 was obtained.
  • Example 4-1 In a 50 mL recovery flask, 8.0 g of the compound X3 obtained in Example 1-1, 0.34 g of allyl bromide, 0.08 g of tetrabutylammonium bromide, and 0.60 g of a 48% by mass aqueous potassium hydroxide solution are placed. The mixture was stirred at 80 ° C. for 5 hours. The mixture was cooled to 25 ° C., charged with 10 g of AC-6000 and washed twice with water. The obtained crude solution was purified by silica gel column chromatography (developing solvent: AC-6000) to obtain 7.9 g (yield 98%) of compound X6.
  • Example 4-2 In a 20 mL closed PTFE container, 7.5 g of the compound X6 obtained in Example 4-1, a xylene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content 0.03 g of 2% by mass), 0.35 g of HSiCl 3 and 3.0 g of 1,3-bis (trifluoromethyl) benzene were added, and the mixture was stirred at 40 ° C. for 8 hours. After completion of the reaction, the solvent and the like were distilled off under reduced pressure to obtain 7.7 g (yield 99%) of compound X7.
  • Example 4-3 In a 50 mL recovery flask, 7.5 g of the compound X7 obtained in Example 4-2 and 20.0 g of tetrahydrofuran were charged, and cooled to 0 ° C. 12 mL of 0.7 mol / L allylmagnesium bromide was dropped into the eggplant flask, and the mixture in the eggplant flask was further stirred for 2 hours. The mixture was returned to 25 ° C. and stirred for additional 8 hours, and the reaction was quenched by adding 10 mL of 1 mol / L aqueous hydrochloric acid solution. 10 g of AC-6000 was added to the obtained mixture to extract the lower layer, which was purified by silica gel column chromatography (developing solvent: AC-6000) to obtain 6.9 g (yield 92%) of compound 3-4 Obtained.
  • Example 4-4 In the same manner as in Example 1-5 except that Compound 3-1 was changed to 6.0 g of Compound 3-4 obtained in Example 4-3, 6.5 g (yield 100%) of Compound 1-4 was obtained.
  • Example 5 Compounds 1-5 were synthesized by the following procedure. A compound 1-5 was obtained in the same manner as in Example 1 except that the compound X1 was changed to methanol. CH 3 (OCF 2 CHFOCF 2 CF 2 CF 2 CH 2 ) n-1 OCF 2 CHFOCF 2 CF 2 CF 2 C (O) NHCH 2 C ⁇ CH 2 CH 2 CH 2 Si (OCH 3 ) 3 ⁇ 3 Formula 1- 5
  • Example 6 As the compound X8, a commercially available product (manufactured by Wako Chemical Co., Ltd.) was used. CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 Si (OCH 3 ) 3 Formula X 8
  • Example 7 As the compound X9, the compound (D) described in Example 1 of JP-A-2014-218639 was used. CF 3 CF 2 CF 2 (OCF 2 CF 2 CF 2 ) 20 OCF 2 CF 2 CH 2 OCH 2 CH 2 CH 2 Si ⁇ CH 2 CH 2 CH 2 Si (OCH 3 ) 3 ⁇ 3 Formula X 9 [Example 8] Compounds 1-6 were synthesized by the following procedure.
  • Example 8-1 In a 200 mL three-necked flask, 18.17 g of tetraethylene glycol (TEG), 8 g of N, N-dimethylformamide (DMF), and 3.61 g of potassium carbonate were added, and stirred at 60 ° C. for 1.5 hours under a nitrogen atmosphere. . Thereafter, 8.49 g of compound X10 was slowly added dropwise over 15 minutes, and the mixture was stirred at 60 ° C. for 18 hours as it was. 1N hydrochloric acid was added until it became acidic and stirred, then AK-225 (manufactured by AGC) was added, and then two layers were separated.
  • TAG tetraethylene glycol
  • DMF N, N-dimethylformamide
  • potassium carbonate 3.61 g of potassium carbonate
  • Example 9 Compound 1-7 was synthesized by the following procedure.
  • Example 9-1 Compound X12 was synthesized with reference to Example 1-1 of WO2013 / 121984. In a 200 mL three-necked flask, 10 g of Compound X12, 112 g of ethylene glycol, and 5.0 g of potassium carbonate were added, and the mixture was stirred at 40 ° C. under a nitrogen atmosphere.
  • Example 9-2 100 g of Compound X12, 10 g of Compound X13, and 9.2 g of potassium carbonate were added to a 200 mL eggplant flask connected to a reflux condenser, and the mixture was stirred at 60 ° C. under a nitrogen atmosphere. Thereafter, 1 N hydrochloric acid was added until it became acidic and stirred, then AE-3000 (manufactured by AGC) was added, and then two layers were separated. After concentration of the organic layer, 70 g (yield 64%) of compound X14 was obtained.
  • 1 H-NMR 6.5 ( 10 H), 4.1 (20 H), 3.9 (4 H).
  • Example 9-4 In a 50 mL eggplant flask, 2.1 g of compound 3-7, 0.0047 g of aniline, 2.1 g of AC-6000 (manufactured by AGC), 0.0096 g of Pt / divinyltetramethyldisiloxane complex, trimethoxysilane 0.93 g was added and stirred overnight at room temperature. After concentration, 2.6 g of compound 1-7 was obtained.
  • 1 H-NMR 6.5 ( 10 H), 4.2 (4 H), 4.1 (20 H), 3.8 (4 H), 1.6 to 1.3 (4 H), 0.5 to 0. 8 (4H).
  • the number average molecular weight of compound 1-7 is 3800.
  • evaluation sample The surface treatment of the substrate was performed by the following wet coating method using the compound obtained in each example, to obtain an evaluation sample in which a surface layer was formed on the surface of the substrate (chemically strengthened glass). However, since the compound X9 had insufficient solubility, an evaluation sample was not prepared. The evaluation test described above was performed using the obtained evaluation sample, and the results are shown in Table 6.
  • the compound obtained according to each example and acetone were mixed to obtain a composition for wet coating having a concentration of the compound of 0.05% by mass.
  • the substrate was dipped in each composition and left for 30 minutes, and then the substrate was pulled up (dip coating method).
  • the coated film was dried at 200 ° C. for 30 minutes and washed with AK-225 to obtain an evaluation sample (article) having a surface layer on the surface of the substrate.
  • the fluorine-containing ether compound of the present invention can be used in various applications where it is required to impart water and oil repellency.
  • a coat of a display input device such as a touch panel, a surface protection coat of a transparent glass or transparent plastic member, an antifouling coat for a kitchen, a water repellent moistureproof coat or an antifouling coat such as an electronic device, a heat exchanger, or a battery
  • It can be used as an antifouling coat for toiletries, a coat on a member that needs to be liquid repellent while conducting, a water repellent / waterproof / sliding water coat of a heat exchanger, a surface low friction coat such as a vibrating screen or the inside of a cylinder.
  • a front face protection plate of a display As a more specific example of use, a front face protection plate of a display, an anti-reflection plate, a polarizing plate, an anti-glare plate, or those subjected to anti-reflection film treatment on their surface, a mobile phone (for example, a smartphone), a portable information terminal , Touch panels of devices such as game consoles, remote controls, etc.
  • a mobile phone for example, a smartphone
  • a portable information terminal Touch panels of devices such as game consoles, remote controls, etc.
  • Coats of various devices having display / input devices that perform operations on the screen with human fingers or palm such as touch panels for example, for glass or film used for display Coats and coats for glass or film used on exterior parts other than display parts
  • coats of decorative building materials around water such as toilets, baths, washrooms and kitchens
  • waterproof coatings for wiring boards water repellency of heat exchangers
  • Waterproof / slippery coat water repellent coat of solar cell
  • waterproof / water repellent coat of printed wiring board electricity Waterproof and water repellent coating for equipment casings and electronic parts
  • Coating for improving insulation of power transmission line Waterproof and water repellent coating for various filters, Waterproof coating for radio wave absorbing material and sound absorbing material, Bath, kitchen equipment, protection for toiletries
  • Examples thereof include dirt coats, low friction coats such as vibrating sieves and the inside of cylinders, machine parts, vacuum equipment parts, bearing parts, automobile parts, surface protection coats such as tools, and the like.

Abstract

Provided are: a fluorine-containing ether compound which exhibits excellent solubility in a non-fluorine organic solvent, and which is capable of forming a surface layer that has excellent wear resistance even in cases where a composition obtained by dissolving this fluorine-containing ether compound in a non-fluorine organic solvent is used; a composition; and an article. A fluorine-containing ether compound which is characterized by having: a poly(oxyfluoroalkylene) chain that contains an oxyfluoroalkylene unit represented by formula A1; and two or more groups represented by formula B. In formula A1, X1 represents a fluoroalkylene group which contains one or more hydrogen atoms. In formula B, R represents a monovalent hydrocarbon group; and L represents a hydrolyzable group or a hydroxyl group. (OX1) formula A1 -Si(R)nL3-n formula B

Description

含フッ素エーテル化合物、組成物および物品Fluorine-containing ether compounds, compositions and articles
 本発明は、含フッ素エーテル化合物、組成物および物品に関する。 The present invention relates to fluorine-containing ether compounds, compositions and articles.
 含フッ素化合物は、高い潤滑性、撥水撥油性等を示すため、表面処理剤に好適に用いられる。表面処理剤によって基材の表面に撥水撥油性を付与すると、基材の表面の汚れを拭き取りやすくなり、汚れの除去性が向上する。上記含フッ素化合物の中でも、ペルフルオロアルキレン鎖の途中にエーテル結合(-O-)が存在するポリ(オキシペルフルオロアルキレン)鎖を有する含フッ素エーテル化合物は、柔軟性に優れる化合物であり、特に油脂等の汚れの除去性に優れる。 Since a fluorine-containing compound exhibits high lubricity, water and oil repellency, etc., it is suitably used as a surface treatment agent. When the surface treatment agent imparts water and oil repellency to the surface of the substrate, the dirt on the surface of the substrate can be easily wiped off, and the dirt removability is improved. Among the above-mentioned fluorine-containing compounds, a fluorine-containing ether compound having a poly (oxyperfluoroalkylene) chain in which an ether bond (-O-) is present in the middle of the perfluoroalkylene chain is a compound having excellent flexibility. Excellent dirt removability.
 上記含フッ素エーテル化合物を含む表面処理剤は、指で繰り返し摩擦されても撥水撥油性が低下しにくい性能(耐摩擦性)および拭き取りによって表面に付着した指紋を容易に除去できる性能(指紋汚れ除去性)が長時間維持されるのが求められる用途、たとえば、タッチパネルの指で触れる面を構成する部材の表面処理剤として用いられる。
 上記含フッ素エーテル化合物としては、ポリ(オキシペルフルオロアルキレン)鎖を有し、末端に加水分解性シリル基を有する化合物が広く用いられている(特許文献1)。
The surface treatment agent containing the above-mentioned fluorine-containing ether compound has a performance (friction resistance) in which water and oil repellency hardly decreases even if it is repeatedly rubbed with a finger (friction resistance) and a performance capable of easily removing fingerprints attached to the surface by wiping (fingerprint stain It is used as a surface treatment agent of the member which comprises the surface touched by the finger of a touch panel, for example for which the removal property is required to be maintained for a long time.
As said fluorine-containing ether compound, the compound which has a poly (oxyperfluoro alkylene) chain | strand and has a hydrolysable silyl group at the terminal is used widely (patent document 1).
特開2014-218639号公報JP 2014-218639 A
 一方で、特許文献1に記載の含フッ素エーテル化合物は、フッ素系有機溶媒に対する溶解性は高いが、工業プロセスにおいて広く使用される非フッ素系有機溶媒(特に、ケトン系有機溶媒、エーテル系有機溶媒等の汎用溶媒)に対する溶解性が低いという問題がある。
 工業的な点からは、非フッ素系有機溶媒に溶解でき、かつ、非フッ素系有機溶媒に溶解させた組成物を用いた際にも耐摩擦性に優れる表面層を形成し得る、含フッ素エーテル化合物が求められている。
On the other hand, the fluorine-containing ether compounds described in Patent Document 1 have high solubility in fluorine-based organic solvents, but non-fluorinated organic solvents widely used in industrial processes (especially ketone-based organic solvents, ether-based organic solvents) And so forth (general-purpose solvents), etc.).
From the industrial point of view, a fluorine-containing ether that can be dissolved in a non-fluorinated organic solvent and can form a surface layer excellent in abrasion resistance even when using a composition dissolved in a non-fluorinated organic solvent There is a need for compounds.
 本発明は、上記課題に鑑みて、非フッ素系有機溶媒に対する溶解性に優れ、かつ、非フッ素系有機溶媒に溶解させた組成物を用いた際にも耐摩擦性に優れた表面層を形成できる含フッ素エーテル化合物、組成物および物品の提供を目的とする。 In view of the above problems, the present invention forms a surface layer excellent in solubility in a non-fluorinated organic solvent, and also excellent in abrasion resistance when a composition dissolved in a non-fluorinated organic solvent is used. It is an object of the present invention to provide a possible fluorine-containing ether compound, composition and article.
 本発明は、下記[1]~[13]の構成を有する含フッ素エーテル化合物、組成物および物品を提供する。
 [1]式A1で表されるオキシフルオロアルキレン単位を含むポリ(オキシフルオロアルキレン)鎖と、式Bで表される基を2個以上有することを特徴とする含フッ素エーテル化合物。
 (OX)  式A1
 -Si(R)3-n  式B
 ただし、式中、
 Xは、1個以上の水素原子を有するフルオロアルキレン基である。
 Rは、1価の炭化水素基である。
 Lは、加水分解性基または水酸基である。
 nは、0~2の整数である。
The present invention provides fluorine-containing ether compounds, compositions and articles having the following constitutions [1] to [13].
[1] A fluorine-containing ether compound having a poly (oxyfluoroalkylene) chain containing an oxyfluoroalkylene unit represented by Formula A1 and two or more groups represented by Formula B.
(OX 1 ) Formula A1
-Si (R) n L 3-n formula B
However, in the formula
X 1 is a fluoroalkylene group having one or more hydrogen atoms.
R is a monovalent hydrocarbon group.
L is a hydrolyzable group or a hydroxyl group.
n is an integer of 0 to 2.
 [2]前記オキシフルオロアルキレン単位の炭素数が2~6である、[1]の含フッ素エーテル化合物。
 [3]ポリ(オキシフルオロアルキレン)鎖中に含まれる前記オキシフルオロアルキレン単位の少なくとも一部が炭素数の2のオキシフルオロアルキレン単位である、[1]または[2]の含フッ素エーテル化合物。
 [4]前記ポリ(オキシフルオロアルキレン)鎖がさらに式A2で表されるオキシペルフルオロアルキレン単位を含む、[1]~[3]のいずれかの含フッ素エーテル化合物。
 (OX)  式A2
 ただし、式中、
 Xは、ペルフルオロアルキレン基である。
 [5]前記オキシペルフルオロアルキレン単位の炭素数が1~6である、[4]の含フッ素エーテル化合物。
 [6]前記ポリ(オキシフルオロアルキレン)鎖が、前記式A1で表されるオキシフルオロアルキレン単位のa個と前記式A2で表されるオキシペルフルオロアルキレン単位のb個とを含み、aは2以上の整数であり、bは0以上の整数であり、a+bが8以上である、[1]~[5]のいずれかの含フッ素エーテル化合物。
[2] The fluorinated ether compound of [1], wherein the carbon number of the oxyfluoroalkylene unit is 2 to 6.
[3] The fluorine-containing ether compound of [1] or [2], wherein at least a part of the oxyfluoroalkylene units contained in the poly (oxyfluoroalkylene) chain is a carbon number of 2 oxyfluoroalkylene units.
[4] The fluorine-containing ether compound according to any one of [1] to [3], wherein the poly (oxyfluoroalkylene) chain further contains an oxyperfluoroalkylene unit represented by Formula A2.
(OX 2 ) Formula A2
However, in the formula
X 2 is a perfluoroalkylene group.
[5] The fluorinated ether compound of [4], wherein the carbon number of the oxyperfluoroalkylene unit is 1 to 6.
[6] The poly (oxyfluoroalkylene) chain includes a number of oxyfluoroalkylene units represented by the formula A1 and b number of oxyperfluoroalkylene units represented by the formula A2, and a is 2 or more. The fluorine-containing ether compound according to any one of [1] to [5], wherein b is an integer of 0 or more and a + b is 8 or more.
 [7]下記式1で表される化合物である、[1]~[6]のいずれかの含フッ素エーテル化合物。
 R-[(OX(OX]-Y-Z(R(Rr-q  式1
 ただし、式中、
 Rは、フッ素原子を有していてもよいアルキル基、または、-Y-Z(R(Rr-qである。
 Xは、1個以上の水素原子を有するフルオロアルキレン基である。
 Xは、ペルフルオロアルキレン基である。
 Yは、単結合または2価の連結基である。
 Zは、炭素原子、ケイ素原子または窒素原子である。
 Rは、水素原子、水酸基またはアルキル基である。
 Rは、-L-Si(R)3-nである。Lは、-O-を有していてもよいアルキレン基である。
 aは2以上の整数であり、bは0以上の整数であり、a+bは8以上の整数である。
 Zが炭素原子またはケイ素原子の場合、rは3であり、qは0~2の整数である。Zが窒素原子の場合、rは2であり、qは0~1の整数である。
[7] The fluorine-containing ether compound of any one of [1] to [6], which is a compound represented by the following formula 1.
R 1 -[(OX 1 ) a (OX 2 ) b ]-Y-Z (R 2 ) q (R 3 ) r-q formula 1
However, in the formula
R 1 is an alkyl group which may have a fluorine atom, or —YZ (R 2 ) q (R 3 ) rq .
X 1 is a fluoroalkylene group having one or more hydrogen atoms.
X 2 is a perfluoroalkylene group.
Y is a single bond or a divalent linking group.
Z is a carbon atom, a silicon atom or a nitrogen atom.
R 2 is a hydrogen atom, a hydroxyl group or an alkyl group.
R 3 is -L 1 -Si (R) n L 3-n . L 1 is an alkylene group which may have —O—.
a is an integer of 2 or more, b is an integer of 0 or more, and a + b is an integer of 8 or more.
When Z is a carbon atom or a silicon atom, r is 3 and q is an integer of 0 to 2. When Z is a nitrogen atom, r is 2 and q is an integer of 0 to 1.
 [8]前記Zが炭素原子またはケイ素原子であり、前記qが0または1である、[7]の含フッ素エーテル化合物。
 [9]前記[1]~[8]のいずれかの含フッ素エーテル化合物と、液状媒体とを含むことを特徴とする組成物。
 [10]基材と、前記基材上に、[1]~[8]のいずれかの含フッ素エーテル化合物または請求項9に記載の組成物から形成されてなる表面層と、を有することを特徴とする物品。
 [11]前記[1]~[8]のいずれかの含フッ素エーテル化合物を含む表面処理剤。
[8] The fluorine-containing ether compound of [7], wherein Z is a carbon atom or a silicon atom, and q is 0 or 1.
[9] A composition comprising the fluorine-containing ether compound of any one of the above [1] to [8] and a liquid medium.
[10] A substrate, and a surface layer formed of the composition according to claim 9 or the fluorine-containing ether compound of any one of [1] to [8] on the substrate. Article to be characterized.
[11] A surface treatment agent containing the fluorine-containing ether compound of any one of the above [1] to [8].
 [12]下記式3で表される含フッ素エーテル化合物。
 R11-[(OX(OX]-Y-Z(R(L-CH=CHr-q  式3
 ただし、式中、
 R11は、フッ素原子を有していてもよいアルキル基、または、-Y-Z(R(L-CH=CHr-qである。
 Xは、1個以上の水素原子を有するフルオロアルキレン基である。
 Xは、ペルフルオロアルキレン基である。
 Yは、単結合または2価の連結基である。
 Zは、炭素原子、ケイ素原子または窒素原子である。
 Rは、水素原子、水酸基またはアルキル基である。
 aは2以上の整数であり、bは0以上の整数であり、a+bは8以上の整数である。
 Lは-O-を有していてもよいアルキレン基、単結合または-O-である。
 Zが炭素原子またはケイ素原子の場合、rは3であり、qは0~2の整数である。Zが窒素原子の場合、rは2であり、qは0~1の整数である。
[12] A fluorine-containing ether compound represented by the following formula 3.
R 11 - [(OX 1) a (OX 2) b] -Y-Z (R 2) q (L 2 -CH = CH 2) r-q Formula 3
However, in the formula
R 11 is an alkyl group which may have a fluorine atom, or —Y—Z (R 2 ) q (L 2 —CH = CH 2 ) r—q .
X 1 is a fluoroalkylene group having one or more hydrogen atoms.
X 2 is a perfluoroalkylene group.
Y is a single bond or a divalent linking group.
Z is a carbon atom, a silicon atom or a nitrogen atom.
R 2 is a hydrogen atom, a hydroxyl group or an alkyl group.
a is an integer of 2 or more, b is an integer of 0 or more, and a + b is an integer of 8 or more.
L 2 is an alkylene group which may have —O—, a single bond or —O—.
When Z is a carbon atom or a silicon atom, r is 3 and q is an integer of 0 to 2. When Z is a nitrogen atom, r is 2 and q is an integer of 0 to 1.
 [13]式3で表される含フッ素エーテル化合物をHSi(R)3-nとヒドロシリル化反応させることを特徴とする式1で表される含フッ素エーテル化合物の製造方法。
 R-[(OX(OX]-Y-Z(R(Rr-q  式1
 R11-[(OX(OX]-Y-Z(R(L-CH=CHr-q  式3
 ただし、式中、
 Rは、フッ素原子を有していてもよいアルキル基、または、-Y-Z(R(Rr-qである。
 R11は、フッ素原子を有していてもよいアルキル基、または、-Y-Z(R(L-CH=CHr-qである。
 Xは、1個以上の水素原子を有するフルオロアルキレン基である。
 Xは、ペルフルオロアルキレン基である。
 Yは、単結合または2価の連結基である。
 Zは、炭素原子、ケイ素原子または窒素原子である。
 Rは、水素原子、水酸基またはアルキル基である。
 Rは、-L-Si(R)3-nである。
 Lは、-O-を有していてもよいアルキレン基である。
 aは2以上の整数であり、bは0以上の整数であり、a+bは8以上の整数である。
 Lは-O-を有していてもよいアルキレン基、単結合または-O-である。
 Zが炭素原子またはケイ素原子の場合、rは3であり、qは0~2の整数である。Zが窒素原子の場合、rは2であり、qは0~1の整数である。
[13] A process for producing a fluorine-containing ether compound represented by the formula 1, which comprises subjecting the fluorine-containing ether compound represented by the formula 3 to a hydrosilylation reaction with HSi (R) n L 3-n .
R 1 -[(OX 1 ) a (OX 2 ) b ]-Y-Z (R 2 ) q (R 3 ) r-q formula 1
R 11 - [(OX 1) a (OX 2) b] -Y-Z (R 2) q (L 2 -CH = CH 2) r-q Formula 3
However, in the formula
R 1 is an alkyl group which may have a fluorine atom, or —YZ (R 2 ) q (R 3 ) rq .
R 11 is an alkyl group which may have a fluorine atom, or —Y—Z (R 2 ) q (L 2 —CH = CH 2 ) r—q .
X 1 is a fluoroalkylene group having one or more hydrogen atoms.
X 2 is a perfluoroalkylene group.
Y is a single bond or a divalent linking group.
Z is a carbon atom, a silicon atom or a nitrogen atom.
R 2 is a hydrogen atom, a hydroxyl group or an alkyl group.
R 3 is -L 1 -Si (R) n L 3-n .
L 1 is an alkylene group which may have —O—.
a is an integer of 2 or more, b is an integer of 0 or more, and a + b is an integer of 8 or more.
L 2 is an alkylene group which may have —O—, a single bond or —O—.
When Z is a carbon atom or a silicon atom, r is 3 and q is an integer of 0 to 2. When Z is a nitrogen atom, r is 2 and q is an integer of 0 to 1.
 本発明によれば、非フッ素系有機溶媒に対する溶解性に優れ、かつ、非フッ素系有機溶媒に溶解させた組成物を用いた際にも耐摩擦性に優れた含フッ素エーテル化合物、組成物および物品を提供できる。 According to the present invention, a fluorine-containing ether compound having excellent solubility in a non-fluorinated organic solvent, and excellent friction resistance even when using a composition dissolved in a non-fluorinated organic solvent, a composition, and Can provide an article.
 本明細書において、式1で表される化合物を化合物1と記す。他の式で表される化合物も同様に記す。式A1で表されるオキシフルオロアルキレン単位を単位A1と記す。他の式で表される単位も同様に記す。式Bで表される基を基Bと記す。他の式で表される基も同様に記す。
 本明細書において、「アルキレン基がA基を有していてもよい」という場合、アルキレン基は、アルキレン基中の炭素-炭素原子間にA基を有していてもよいし、アルキレン基-A基-のように末端にA基を有していてもよい。
 本発明における用語の意味は以下の通りである。
 「表面層」とは、基材上に形成される層を意味する。なお、表面層は、基材の直上に形成されてもよいし、基材の表面に形成された他の層を介して基材上に形成されてもよい。
 含フッ素エーテル化合物の「数平均分子量」は、H-NMRおよび19F-NMRによって、末端基を基準にしてオキシフルオロアルキレン単位の数(平均値)を求めることによって算出される。
In the present specification, the compound represented by Formula 1 is referred to as Compound 1. The compounds represented by other formulas are similarly described. The oxyfluoroalkylene unit represented by formula A1 is described as unit A1. The units represented by other formulas are similarly described. The group represented by Formula B is referred to as a group B. The same applies to groups represented by other formulas.
In the present specification, when “the alkylene group may have an A group”, the alkylene group may have an A group between carbon-carbon atoms in the alkylene group, and an alkylene group— It may have an A group at the end, such as an A group.
The meanings of the terms in the present invention are as follows.
The "surface layer" means a layer formed on a substrate. The surface layer may be formed directly on the substrate, or may be formed on the substrate via another layer formed on the surface of the substrate.
The “number average molecular weight” of the fluorine-containing ether compound is calculated by determining the number (average value) of oxyfluoroalkylene units based on the end group by 1 H-NMR and 19 F-NMR.
〔含フッ素エーテル化合物〕
 本発明の含フッ素エーテル化合物(以下、「特定化合物」ともいう。)は、単位A1を含むポリ(オキシフルオロアルキレン)鎖と、基Bを2個以上有する。
 特定化合物は、非フッ素系有機溶媒(特に、ケトン系有機溶媒、エーテル系有機溶媒)に対する溶解性に優れる。この理由としては、水素原子を有する単位A1を含むポリ(オキシフルオロアルキレン)鎖を用いることで、非フッ素系有機溶媒に対する親和性が良好になったためと推測される。なお、特定化合物は、フッ素原子を有するので、フッ素系有機溶媒に対する溶解性にも優れる。
 また、特定化合物を用いて形成される表面層は、耐摩擦性に優れる。この理由としては、基Bを2個以上有することで、特定化合物と基材との反応点が増加して、表面層と基材との密着性が良好になったためと推測される。
[Fluorine-containing ether compounds]
The fluorine-containing ether compound of the present invention (hereinafter, also referred to as “specific compound”) has a poly (oxyfluoroalkylene) chain containing the unit A1 and two or more groups B.
The specific compound is excellent in solubility in non-fluorinated organic solvents (in particular, ketone organic solvents, ether organic solvents). The reason for this is presumed to be that the affinity to a non-fluorinated organic solvent is improved by using a poly (oxyfluoroalkylene) chain containing a unit A1 having a hydrogen atom. In addition, since a specific compound has a fluorine atom, it is excellent also in the solubility with respect to a fluorine-type organic solvent.
Moreover, the surface layer formed using a specific compound is excellent in abrasion resistance. The reason for this is presumed to be that by having two or more groups B, the reaction point between the specific compound and the base material is increased, and the adhesion between the surface layer and the base material is improved.
 特定化合物は、単位A1を含むポリ(オキシフルオロアルキレン)鎖を有する。
 (OX)  式A1
 Xは、1個以上の水素原子を有するフルオロアルキレン基である。
 Xの炭素数は、1~6が好ましく、2~6がより好ましく、2~4が特に好ましい。
 Xが有する水素原子は、1個以上であり、特定化合物の非フッ素系有機溶媒に対する溶解性と表面層の耐摩擦性とのバランスに優れる点で、1~3個が好ましく、1個または2個であることが特に好ましい。
The specific compound has a poly (oxyfluoroalkylene) chain containing unit A1.
(OX 1 ) Formula A1
X 1 is a fluoroalkylene group having one or more hydrogen atoms.
The carbon number of X 1 is preferably 1 to 6, more preferably 2 to 6, and particularly preferably 2 to 4.
The hydrogen atom which X 1 has is 1 or more, 1 or 3 is preferable at the point which is excellent in the balance with the solubility with respect to the non-fluorine type organic solvent of a specific compound, and the abrasion resistance of surface layer, 1 or 3 Particularly preferred is two.
 Xは、1個以上のフッ素原子を有する。Xが有するフッ素原子は、1個以上であり、特定化合物の非フッ素系有機溶媒に対する溶解性と表面層の耐摩擦性とのバランスに優れる点で、1~11個が好ましく、2~7個が特に好ましい。
 Xは、表面層の耐摩擦性がより優れる点から直鎖状が好ましい。
X 1 has one or more fluorine atoms. The number of fluorine atoms of X 1 is one or more, and is preferably 1 to 11, in that the balance between the solubility of the specific compound in a non-fluorinated organic solvent and the friction resistance of the surface layer is excellent. One is particularly preferred.
X 1 is preferably linear from the viewpoint that the abrasion resistance of the surface layer is more excellent.
 単位A1の具体例としては、(OCFCHF)、(OCHFCF)、(OCFCH)、(OCHCF)、(OCFCFCHF)、(OCHFCFCF)、(OCFCFCH)、(OCHCFCF)、(OCFCFCFCH)、(OCHCFCFCF)、(OCFCFCFCFCH)、(OCHCFCFCFCF)、(OCFCFCFCFCFCH)、(OCHCFCFCFCFCF)が挙げられる。 Specific examples of the unit A1 include (OCF 2 CHF), (OCHFCF 2 ), (OCF 2 CH 2 ), (OCH 2 CF 2 ), (OCF 2 CF 2 CHF), (OCHFCF 2 CF 2 ), (OCF) 2 CF 2 CH 2 ), (OCH 2 CF 2 CF 2 ), (OCF 2 CF 2 CF 2 CH 2 ), (OCH 2 CF 2 CF 2 CF 2 ), (OCF 2 CF 2 CF 2 CF 2 CH 2 ) , (OCH 2 CF 2 CF 2 CF 2 CF 2 ), (OCF 2 CF 2 CF 2 CF 2 CF 2 CH 2 ), and (OCH 2 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 ).
 ポリ(オキシフルオロアルキレン)鎖中に含まれる単位A1の数をaとすると、aは、2以上の整数が好ましく、2~200の整数がより好ましく、5~150の整数がより好ましく、8~100の整数がさらに好ましく、10~50の整数が特に好ましい。 Assuming that the number of units A1 contained in the poly (oxyfluoroalkylene) chain is a, a is preferably an integer of 2 or more, more preferably an integer of 2 to 200, more preferably an integer of 5 to 150, and 8 to The integer of 100 is more preferable, and the integer of 10 to 50 is particularly preferable.
 ポリ(オキシフルオロアルキレン)鎖は、1種のみの単位A1を含んでいてもよく、2種以上の単位A1を含んでいてもよい。
 2種以上の単位A1としては、たとえば、炭素数の異なる2種以上の単位A1、水素原子の数が異なる2種以上の単位A1、炭素数が同じであっても側鎖の有無や側鎖の種類が異なる2種以上の単位A1が挙げられる。
 2種以上の単位A1の結合順序は限定されず、ランダム、交互、ブロックに配置されてもよい。
The poly (oxyfluoroalkylene) chain may contain only one type of unit A1 or may contain two or more types of unit A1.
As two or more types of units A1, for example, two or more types of units A1 having different carbon numbers, two or more types of units A1 having different numbers of hydrogen atoms, presence or absence of side chains even if the number of carbon atoms is the same And two or more units of different types of A.
The bonding order of the two or more units A1 is not limited, and may be arranged randomly, alternately, or in blocks.
 ポリ(オキシフルオロアルキレン)鎖が有するa個の(OX)を(OXで表す。(OXは、(OX)の数がa個であることを表すものであり、a個の(OX)の配置を表すものではない。同様に、後述の(OXも(OX)の数がb個であることを表すものであり、b個の(OX)の配置を表すものではない。
 したがって、後述の[(OX(OX]で表されるポリ(オキシフルオロアルキレン)鎖は、ポリ(オキシフルオロアルキレン)鎖がa個の(OX)とb個の(OX)を有していることを表すものであり、a個の(OX)のブロックとb個の(OX)のブロックとを有していることを表すものではない。[(OX(OX]は、(OX)と(OX)のランダム、交互、ブロックのいずれの配置であってもよく、いずれの配置であってもa個の(OX)とb個の(OX)を有しているポリ(オキシフルオロアルキレン)鎖であることを表す。
 後述の[(OCm1(4-m1)a1(OCm2(6-m2)a2(OCm3(8-m3)a3(OCm4(10-m4)a4(OCm5(12-m5)a5]、[(OCm1(4-m1)a1(OCm2(6-m2)a2(OCm3(8-m3)a3(OCm4(10-m4)a4(OCm5(12-m5)a5(OX]等の表現もまた同様である。
The a (OX 1 ) s of the poly (oxyfluoroalkylene) chain are represented by (OX 1 ) a . (OX 1) a, the number of (OX 1) is intended to represent that it is a number, it does not represent an arrangement of a number of (OX 1). Similarly, the number of which will be described later (OX 2) b also (OX 2) is intended to represent that the number b and is not intended to represent the arrangement of the b-number of (OX 2).
Therefore, in the poly (oxyfluoroalkylene) chain represented by [(OX 1 ) a (OX 2 ) b ] described later, the poly (oxyfluoro alkylene) chain is a (OX 1 ) and b (OX 1 ) chains. 2) is intended to represent that it has a, it does not represent that it has a block of a number (OX 1) of the block and b pieces of (OX 2). [(OX 1 ) a (OX 2 ) b ] may be any arrangement of (OX 1 ) and (OX 2 ) in random, alternating or block, and in any arrangement, a (( It represents that it is a poly (oxy fluoro alkylene) chain which has OX 1 ) and b pieces (OX 2 ).
Below [(OC 2 H m1 F ( 4-m1)) a1 (OC 3 H m2 F (6-m2)) a2 (OC 4 H m3 F (8-m3)) a3 (OC 5 H m4 F (10 -m4)) a4 (OC 6 H m5 F (12-m5)) a5], [(OC 2 H m1 F (4-m1)) a1 (OC 3 H m2 F (6-m2)) a2 (OC 4 H m3 F (8-m3) ) a3 (OC 5 H m4 F (10-m4)) a4 (OC 6 H m5 F (12-m5)) a5 (OX 2) b] versa is expressed, such as .
 ポリ(オキシフルオロアルキレン)鎖が有する(OXとしては、[(OCm1(4-m1)a1(OCm2(6-m2)a2(OCm3(8-m3)a3(OCm4(10-m4)a4(OCm5(12-m5)a5]が好ましい。
 m1は1~3の整数であり、m2は1~5の整数であり、m3は1~7の整数であり、m4は1~9の整数であり、m5は1~11の整数である。
 a1、a2、a3、a4およびa5は、それぞれ独立に、0以上の整数であり、100以下が好ましい。
 a1+a2+a3+a4+a5は2以上の整数であり、2~200の整数がより好ましく、5~150の整数がより好ましく、8~100の整数がさらに好ましく、10~50の整数が特に好ましい。
 なかでも、特定化合物の非フッ素系有機溶媒に対する溶解性がより優れる点で、a1は1以上の整数が好ましく、2~200の整数が特に好ましい。
 また、Cm2(6-m2)、Cm3(8-m3)、Cm4(10-m4)およびCm5(12-m5)は、表面層の耐摩擦性がより優れる点から直鎖状が好ましい。
The poly (oxy-fluoroalkylene) chain has (OX 1) a, [( OC 2 H m1 F (4-m1)) a1 (OC 3 H m2 F (6-m2)) a2 (OC 4 H m3 F (8-m3)) a3 ( OC 5 H m4 F (10-m4)) a4 (OC 6 H m5 F (12-m5)) a5] is preferred.
m1 is an integer of 1 to 3, m2 is an integer of 1 to 5, m3 is an integer of 1 to 7, m4 is an integer of 1 to 9, and m5 is an integer of 1 to 11.
Each of a 1, a 2, a 3, a 4 and a 5 is independently an integer of 0 or more, preferably 100 or less.
a1 + a2 + a3 + a4 + a5 is an integer of 2 or more, preferably an integer of 2 to 200, more preferably an integer of 5 to 150, still more preferably an integer of 8 to 100, and particularly preferably an integer of 10 to 50.
Among them, an integer of 1 or more is preferable, and an integer of 2 to 200 is particularly preferable because a1 is more excellent in the solubility of the specific compound in the non-fluorinated organic solvent.
Also, C 3 H m2 F (6 -m2), C 4 H m3 F (8-m3), C 5 H m4 F (10-m4) and C 6 H m5 F (12- m5) has a surface layer Linear is preferable from the viewpoint of more excellent friction resistance.
 なお、a1個の(OCm1(4-m1))、a2個の(OCm2(6-m2))、a3個の(OCm3(8-m3))、a4個の(OCm4(10-m4))、a5個の(OCm5(12-m5))の結合順序は限定されない。
 a1が2以上の場合、複数の(OCm1(4-m1))は同一であっても異なっていてもよい。
 a2が2以上の場合、複数の(OCm2(6-m2))は同一であっても異なっていてもよい。
 a3が2以上の場合、複数の(OCm3(8-m3))は同一であっても異なっていてもよい。
 a4が2以上の場合、複数の(OCm4(10-m4))は同一であっても異なっていてもよい。
 a5が2以上の場合、複数の(OCm5(10-m5))は同一であっても異なっていてもよい。
Incidentally, a1 one (OC 2 H m1 F (4 -m1)), a2 amino (OC 3 H m2 F (6 -m2)), a3 amino (OC 4 H m3 F (8 -m3)), a4 amino (OC 5 H m4 F (10 -m4)), binding order of a5 pieces (OC 6 H m5 F (12 -m5)) is not limited.
When a1 is 2 or more, a plurality of (OC 2 H m1 F (4-m1) 2 ) may be the same or different.
When a2 is 2 or more, a plurality of (OC 3 H m2 F (6-m2) ) may be the same or different.
When a3 is 2 or more, a plurality of (OC 4 H m3 F (8-m3) ) may be the same or different.
When a4 is 2 or more, a plurality of (OC 5 H m4 F (10-m4) ) may be the same or different.
When a5 is 2 or more, a plurality of (OC 6 H m5 F (10-m5) ) may be the same or different.
 なかでも、特定化合物の非フッ素系有機溶媒に対する溶解性がより優れる点で、(OXの少なくとも一部は炭素数2のOX、すなわち(OCm1(4-m1))、であることが好ましい。
 ポリ(オキシフルオロアルキレン)鎖が有する(OXとしては、以下の(1)~(5)が好ましい。
(1)[(OCm1(4-m1)a1(OCm2(6-m2)a2
(2)[(OCm1(4-m1)a1(OCm3(8-m3)a3
(3)[(OCm1(4-m1)a1(OCm4(10-m4)a4
(4)[(OCm1(4-m1)a1(OCm5(12-m5)a5
(5)[(OCm1(4-m1)a1
 上記(1)は、a3、a4およびa5が0の態様に該当し、a1+a2は2以上の整数である。上記(2)は、a2、a4およびa5が0の態様に該当し、a1+a3は2以上の整数である。上記(3)は、a2、a3およびa5が0の態様に該当し、a1+a4は2以上の整数である。上記(4)は、a2、a3およびa4が0の態様に該当し、a1+a5は2以上の整数である。上記(5)は、異なる2種以上の(OCm1(4-m1))を合計a1個有し、a1が2以上の整数であるポリ(オキシフルオロアルキレン)鎖を表す。上記(1)~(4)においても、a1が2以上の整数である場合、異なる2種以上の(OCm1(4-m1))を有していてもよい。
Among them, at least a part of (OX 1 ) a is an OX 1 having 2 carbon atoms, that is, (OC 2 H m1 F (4-m1) ) in that the solubility of the specific compound in the non-fluorinated organic solvent is more excellent. Is preferred.
The following (1) to (5) are preferable as (OX 1 ) a possessed by the poly (oxyfluoroalkylene) chain.
(1) [(OC 2 H m1 F (4-m1)) a1 (OC 3 H m2 F (6-m2)) a2]
(2) [(OC 2 H m1 F (4-m1)) a1 (OC 4 H m3 F (8-m3)) a3]
(3) [(OC 2 H m1 F (4-m1)) a1 (OC 5 H m4 F (10-m4)) a4]
(4) [(OC 2 H m1 F (4-m1)) a1 (OC 6 H m5 F (12-m5)) a5]
(5) [(OC 2 H m1 F (4-m1) ) a 1 ]
The above (1) corresponds to an aspect in which a3, a4 and a5 are 0, and a1 + a2 is an integer of 2 or more. The above (2) corresponds to an aspect in which a2, a4 and a5 are 0, and a1 + a3 is an integer of 2 or more. The above (3) corresponds to an aspect in which a2, a3 and a5 are 0, and a1 + a4 is an integer of 2 or more. The above (4) corresponds to an embodiment in which a2, a3 and a4 are 0, and a1 + a5 is an integer of 2 or more. The above (5) represents a poly (oxyfluoroalkylene) chain having a total of a1 two or more different (OC 2 H m1 F (4-m1) 2 ) and a1 being an integer of 2 or more. Also in the above (1) to (4), when a1 is an integer of 2 or more, it may have two or more different (OC 2 H m1 F (4-m1) ).
 ポリ(オキシフルオロアルキレン)鎖は、単位A1以外に、さらにオキシペルフルオロアルキレン単位を含んでいてもよい。
 具体的には、ポリ(オキシフルオロアルキレン)鎖は、単位A2を含んでいてもよい。
 (OX)  式A2
 Xは、ペルフルオロアルキレン基である。
 Xの炭素数は、1~6が好ましい。
 基Xは、表面層の耐摩擦性がより優れる点から直鎖状が好ましい。
The poly (oxyfluoroalkylene) chain may further contain an oxyperfluoroalkylene unit in addition to the unit A1.
Specifically, the poly (oxyfluoroalkylene) chain may contain the unit A2.
(OX 2 ) Formula A2
X 2 is a perfluoroalkylene group.
The carbon number of X 2 is preferably 1 to 6.
The group X 2 is preferably linear from the viewpoint that the abrasion resistance of the surface layer is more excellent.
 ポリ(オキシフルオロアルキレン)鎖は、1種のみの単位A2を含んでいてもよく、2種以上の単位A2を含んでいてもよい。
 2種以上の単位A2としては、たとえば、炭素数の異なる2種以上の単位A2、炭素数が同じであっても側鎖の有無や側鎖の種類が異なる2種以上の単位A2が挙げられる。
The poly (oxyfluoroalkylene) chain may contain only one type of unit A2, or may contain two or more types of unit A2.
Examples of two or more types of units A2 include two or more types of units A2 having different carbon numbers, and two or more types of units A2 having different side chains and having different types of side chains even if the number of carbons is the same. .
 単位A2の具体例としては、(OCF)、(OCFCF)、(OCFCFCF)、(OCF(CF)CF)、(OCFCFCFCF)、(OCF(CF)CFCF)、(OCFCFCFCFCF)、(OCFCFCFCFCFCF)が挙げられる。 Specific examples of the unit A2 include (OCF 2 ), (OCF 2 CF 2 ), (OCF 2 CF 2 CF 2 ), (OCF (CF 3 ) CF 2 ), (OCF 2 CF 2 CF 2 CF 2 ), (OCF (CF 3) CF 2 CF 2), (OCF 2 CF 2 CF 2 CF 2 CF 2), include (OCF 2 CF 2 CF 2 CF 2 CF 2 CF 2).
 ポリ(オキシフルオロアルキレン)鎖中に含まれる単位A2の数をbとすると、bは、0以上の整数であり、0~200の整数が好ましく、0~50の整数がより好ましく、0~10の整数がさらに好ましく、0~2の整数が特に好ましい。 When the number of units A2 contained in the poly (oxyfluoroalkylene) chain is b, b is an integer of 0 or more, preferably an integer of 0 to 200, more preferably an integer of 0 to 50, and 0 to 10 The integer of is more preferable, and the integer of 0 to 2 is particularly preferable.
 ポリ(オキシフルオロアルキレン)鎖が、単位A1および単位A2を含む場合、単位A1と単位A2との結合順序は限定されない。たとえば、単位A1と単位A2とは、ランダム、交互、ブロックに配置されてもよい。
 ポリ(オキシフルオロアルキレン)鎖が、単位A1のa個と単位A2のb個を含む場合、a+bは、8以上の整数であり、8~400の整数が好ましく、8~200の整数がより好ましく、8~120の整数がさらに好ましく、10~52の整数が特に好ましい。
When the poly (oxyfluoroalkylene) chain contains the unit A1 and the unit A2, the bonding order of the unit A1 and the unit A2 is not limited. For example, the units A1 and A2 may be arranged randomly, alternately, and in blocks.
When the poly (oxyfluoroalkylene) chain contains a units of A1 and b units of A2, a + b is an integer of 8 or more, preferably an integer of 8 to 400, and more preferably an integer of 8 to 200. And an integer of 8 to 120 is more preferable, and an integer of 10 to 52 is particularly preferable.
 特定化合物は、基Bを2個以上有する。
 -Si(R)3-n  式B
The specific compound has two or more groups B.
-Si (R) n L 3-n formula B
 特定化合物が有する基Bの数は、2個以上であり、表面層の耐摩擦性がより優れる点で、2~10個が好ましく、2~5個がより好ましく、2個または3個であることが特に好ましい。
 2個以上ある基Bは、同じであっても異なっていてもよい。原料の入手容易性や特定化合物の製造容易性の点からは、互いに同じであることが好ましい。
The number of groups B possessed by the specific compound is 2 or more, and 2 to 10 are preferable, 2 to 5 are more preferable, and 2 or 3 in that the friction resistance of the surface layer is more excellent. Is particularly preferred.
Two or more groups B may be the same or different. It is preferable that they are the same as each other from the viewpoint of the availability of raw materials and the ease of production of a specific compound.
 Rは、1価の炭化水素基であり、1価の飽和炭化水素基が好ましい。Rの炭素数は、1~6が好ましく、1~3がより好ましく、1または2であることが特に好ましい。 R is a monovalent hydrocarbon group, preferably a monovalent saturated hydrocarbon group. The carbon number of R is preferably 1 to 6, more preferably 1 to 3, and particularly preferably 1 or 2.
 Lは、加水分解性基または水酸基である。Lとしては、加水分解性基が好ましい。
 Lの加水分解性基は、加水分解反応により水酸基となる基である。すなわち、Lが加水分解性基の場合、Si-Lで表される加水分解性シリル基は、加水分解反応によりSi-OHで表されるシラノール基となる。シラノール基は、さらにシラノール基間で反応してSi-O-Si結合を形成する。また、シラノール基は、基材の表面の水酸基(基材-OH)と脱水縮合反応して、化学結合(基材-O-Si)を形成できる。
L is a hydrolyzable group or a hydroxyl group. As L, a hydrolyzable group is preferable.
The hydrolyzable group of L is a group which becomes a hydroxyl group by a hydrolysis reaction. That is, when L is a hydrolyzable group, the hydrolyzable silyl group represented by Si-L becomes a silanol group represented by Si-OH by a hydrolysis reaction. The silanol groups further react between silanol groups to form Si-O-Si bonds. In addition, the silanol group can be subjected to a dehydration condensation reaction with a hydroxyl group (substrate -OH) on the surface of the substrate to form a chemical bond (substrate -O-Si).
 加水分解性基の具体例としては、アルコキシ基、ハロゲン原子、アシル基、アシルオキシ基、イソシアナート基(-NCO)が挙げられる。アルコキシ基としては、炭素数1~4のアルコキシ基が好ましい。ハロゲン原子としては、塩素原子が好ましい。
 加水分解性基としては、特定化合物の製造がより容易である点から、炭素数1~4のアルコキシ基またはハロゲン原子が好ましい。Lとしては、塗布時のアウトガスが少なく、特定化合物の保存安定性がより優れる点から、炭素数1~4のアルコキシ基が好ましく、特定化合物の長期の保存安定性が必要な場合にはエトキシ基が特に好ましく、塗布後の反応時間を短時間とする場合にはメトキシ基が特に好ましい。
Specific examples of the hydrolyzable group include an alkoxy group, a halogen atom, an acyl group, an acyloxy group and an isocyanate group (-NCO). The alkoxy group is preferably an alkoxy group having 1 to 4 carbon atoms. As a halogen atom, a chlorine atom is preferable.
As the hydrolyzable group, an alkoxy group having 1 to 4 carbon atoms or a halogen atom is preferable from the viewpoint of easier production of the specific compound. As L, an alkoxy group having 1 to 4 carbon atoms is preferable from the viewpoint of little outgassing at the time of application and the storage stability of the specific compound being more excellent, and an ethoxy group when long-term storage stability of the specific compound is required. In particular, when the reaction time after coating is to be short, a methoxy group is particularly preferable.
 nは、0~2の整数である。
 nは、0または1であることが好ましく、0が特に好ましい。Lが複数存在することによって、表面層の基材への密着性がより強固になる。
 nが1以下である場合、1分子中に存在する複数のLは同じであっても異なっていてもよい。原料の入手容易性や特定化合物の製造容易性の点からは、互いに同じであることが好ましい。nが2である場合、1分子中に存在する複数のRは同じであっても異なっていてもよい。原料の入手容易性や化合物1の製造容易性の点からは、互いに同じであることが好ましい。
n is an integer of 0 to 2.
n is preferably 0 or 1, and 0 is particularly preferred. The presence of a plurality of L makes the adhesion of the surface layer to the substrate stronger.
When n is 1 or less, a plurality of L present in one molecule may be the same or different. It is preferable that they are the same as each other from the viewpoint of the availability of raw materials and the ease of production of a specific compound. When n is 2, plural R present in one molecule may be the same or different. From the viewpoint of the availability of raw materials and the ease of production of compound 1, they are preferably the same.
 特定化合物としては、特定化合物の非フッ素系有機溶媒に対する溶解性および表面層の耐摩擦性により優れる点で、化合物1が好ましい。
 R-[(OX(OX]-Y-Z(R(Rr-q  式1
As a specific compound, the compound 1 is preferable at the point which is excellent by the solubility with respect to the non-fluorinated organic solvent of a specific compound, and the abrasion resistance of a surface layer.
R 1 -[(OX 1 ) a (OX 2 ) b ]-Y-Z (R 2 ) q (R 3 ) r-q formula 1
 Rは、フッ素原子を有していてもよいアルキル基、または、-Y-Z(R(Rr-qである。なお、Y、Z、R、R、rおよびqの定義は、後述する通りである。
 フッ素原子を有していてもよいアルキル基中の炭素数は、特定化合物の非フッ素系有機溶媒に対する溶解性および表面層の耐摩擦性により優れる点で、1~20が好ましく、1~10がより好ましく、1~6が特に好ましい。
 フッ素原子を有していてもよいアルキル基は、直鎖状であっても分岐鎖状であってもよく、表面層の耐摩擦性がより優れる点から直鎖状が好ましい。
 フッ素原子を有していてもよいアルキル基は、アルキル基中のすべての水素原子がフッ素原子に置換された基(ペルフルオロアルキル基)であってもよい。
R 1 is an alkyl group which may have a fluorine atom, or —YZ (R 2 ) q (R 3 ) rq . The definitions of Y, Z, R 1 , R 2 , r and q are as described later.
The number of carbon atoms in the alkyl group which may have a fluorine atom is preferably 1 to 20, and more preferably 1 to 10 in that it is excellent in the solubility of the specific compound in the non-fluorinated organic solvent and the abrasion resistance of the surface layer. More preferably, 1 to 6 is particularly preferred.
The alkyl group which may have a fluorine atom may be linear or branched, and is preferably linear from the viewpoint that the abrasion resistance of the surface layer is more excellent.
The alkyl group which may have a fluorine atom may be a group in which all hydrogen atoms in the alkyl group are substituted with a fluorine atom (perfluoroalkyl group).
 フッ素原子を有していてもよいアルキル基の具体例としては、CH-、CF-、CFCH-、CFCF-、CFCFCF-、(CFCH-、CFCFCFCFCHCH-、CFCFCFCFCFCFCHCH-が挙げられる。 Specific examples of the alkyl group which may have a fluorine atom include CH 3- , CF 3- , CF 3 CH 2- , CF 3 CF 2- , CF 3 CF 2 CF 2- , and (CF 3 ) 2 CH—, CF 3 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 —, CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 —.
 [(OX(OX]で表される基は、ポリ(オキシフルオロアルキレン)鎖である。
 X、X、aおよびbの定義は、上述した通りである。ただし、式1におけるa+bは、8以上の整数であり、8~400の整数が好ましく、8~200の整数がより好ましく、8~120の整数がさらに好ましく、10~52の整数が特に好ましい。
 [(OX(OX]において、(OX)と(OX)との結合順序は限定されない。たとえば、(OX)と(OX)とは、ランダム、交互、ブロックに配置されてもよい。
 また、複数の(OX)は、同一であっても異なっていてもよい。つまり、(OXは、Xが異なる2種以上の(OX)から構成されていてもよい。2種以上の(OX)の結合順序は限定されず、ランダム、交互、ブロックに配置されてもよい。
 さらに、bが2以上の場合、複数の(OX)は、同一であっても異なっていてもよい。つまり、(OXは、Xが異なる2種以上の(OX)から構成されていてもよい。2種以上の(OX)の結合順序は限定されず、ランダム、交互、ブロックに配置されてもよい。
The group represented by [(OX 1 ) a (OX 2 ) b ] is a poly (oxyfluoroalkylene) chain.
The definitions of X 1 , X 2 , a and b are as described above. However, a + b in Formula 1 is an integer of 8 or more, preferably an integer of 8 to 400, more preferably an integer of 8 to 200, still more preferably an integer of 8 to 120, and particularly preferably an integer of 10 to 52.
In [(OX 1 ) a (OX 2 ) b ], the binding order of (OX 1 ) and (OX 2 ) is not limited. For example, (OX 1 ) and (OX 2 ) may be arranged randomly, alternately, and in blocks.
Further, a plurality of (OX 1) may be be the same or different. That is, (OX 1 ) a may be composed of two or more (OX 1 ) different in X 1 . The bonding order of two or more (OX 1 ) is not limited, and may be arranged randomly, alternately, or in blocks.
Furthermore, when b is 2 or more, a plurality of (OX 2 ) may be the same or different. That is, (OX 2 ) b may be composed of two or more (OX 2 ) different in X 2 . The bonding order of two or more (OX 2 ) is not limited, and may be arranged randomly, alternately, and in blocks.
 [(OX(OX]で表される基としては、[(OCm1(4-m1)a1(OCm2(6-m2)a2(OCm3(8-m3)a3(OCm4(10-m4)a4(OCm5(12-m5)a5(OX]が好ましい。
 m1、m2、m3、m4、m5、a1、a2、a3、a4およびa5の定義は、上述した通りである。
As the group represented by [(OX 1 ) a (OX 2 ) b ], [(OC 2 H m1 F (4-m1) ) a1 (OC 3 H m2 F (6-m2) ) a2 (OC 4 H m3 F (8-m3) ) a3 (OC 5 H m4 F (10-m4)) a4 (OC 6 H m5 F (12-m5)) a5 (OX 2) b] is preferred.
The definitions of m1, m2, m3, m4, m5, a1, a2, a3, a4 and a5 are as described above.
 Yは、単結合または2価の連結基である。
 2価の連結基としては、たとえば、2価の炭化水素基(2価の飽和炭化水素基、2価の芳香族炭化水素基、アルケニレン基、アルキニレン基であってもよい。2価の飽和炭化水素基は、直鎖状、分岐鎖状または環状であってもよく、たとえば、アルキレン基が挙げられる。炭素数は1~20が好ましく、1~10がより好ましく、1~6が特に好ましい。また、2価の芳香族炭化水素基は、炭素数5~20が好ましく、たとえば、フェニレン基が挙げられる。それ以外にも、炭素数2~20のアルケニレン基、炭素数2~20のアルキニレン基であってもよい。)、2価の複素環基、-O-、-S-、-SO-、-N(R)-、-C(O)-、-Si(R-およびこれらを2種以上組み合わせた基が挙げられる。Rは、水素原子またはアルキル基(好ましくは炭素数1~10)である。Rは、アルキル基(好ましくは炭素数1~10)またはフェニル基である。
 なお、上記これらを2種以上組み合わせた基としては、たとえば、-C(O)N(R)-、-C(O)N(R)-アルキレン基-、-O-アルキレン基-、-OC(O)-が挙げられる。
Y is a single bond or a divalent linking group.
The bivalent linking group may be, for example, a bivalent hydrocarbon group (a bivalent saturated hydrocarbon group, a bivalent aromatic hydrocarbon group, an alkenylene group, an alkynylene group). The hydrogen group may be linear, branched or cyclic and includes, for example, an alkylene group The carbon number is preferably 1 to 20, more preferably 1 to 10, and particularly preferably 1 to 6. The divalent aromatic hydrocarbon group preferably has 5 to 20 carbon atoms, for example, a phenylene group, etc. Other than that, an alkenylene group having 2 to 20 carbon atoms and an alkynylene group having 2 to 20 carbon atoms , A divalent heterocyclic group, -O-, -S-, -SO 2- , -N (R 4 )-, -C (O)-, -Si (R 5 ) 2 And groups in which two or more of these are combined. R 4 is a hydrogen atom or an alkyl group (preferably having a carbon number of 1 to 10). R 5 is an alkyl group (preferably having a carbon number of 1 to 10) or a phenyl group.
The above examples of a group formed by combining two or more kinds of these, for example, -C (O) N (R 4) -, - C (O) N (R 4) - alkylene radical -, - O-alkylene group -, And -OC (O)-.
 なかでも、特定化合物の合成がより容易である点から、Yは、単結合、-O-、-C(O)-、-C(O)N(R)-、-C(O)N(R)-アルキレン基-、-O-アルキレン基-が好ましい。 Among them, Y is a single bond, —O—, —C (O) —, —C (O) N (R 4 ) —, —C (O) N, in that it is easier to synthesize a specific compound. (R 4 ) -alkylene group- and -O-alkylene group- are preferable.
 Zは、炭素原子、窒素原子またはケイ素原子である。 Z is a carbon atom, a nitrogen atom or a silicon atom.
 Rは、水素原子、水酸基またはアルキル基である。
 アルキル基の炭素数は、1~5が好ましく、1~3がより好ましく、1が特に好ましい。
 qが2の場合、2個あるRは、同じであっても異なっていてもよい。原料の入手容易性や化合物1の製造容易性の点からは、互いに同じであることが好ましい。
R 2 is a hydrogen atom, a hydroxyl group or an alkyl group.
The carbon number of the alkyl group is preferably 1 to 5, more preferably 1 to 3, and particularly preferably 1.
When q is 2, two R 2 s may be the same or different. From the viewpoint of the availability of raw materials and the ease of production of compound 1, they are preferably the same.
 Rは、-L-Si(R)3-nである。
 R、Lおよびnの定義は、上述した通りである。
 Lは、-O-を有していてもよいアルキレン基である。
 アルキレン基が-O-を有する場合、炭素-炭素原子間またはZ側の末端に-O-を有することが好ましい。
 Lの炭素数は、1~10が好ましく、1~6がより好ましく、1~4が特に好ましい。
R 3 is -L 1 -Si (R) n L 3-n .
The definitions of R, L and n are as described above.
L 1 is an alkylene group which may have —O—.
When the alkylene group has -O-, it is preferable to have -O- at the end between carbon and carbon atoms or on the Z side.
The carbon number of L 1 is preferably 1 to 10, more preferably 1 to 6, and particularly preferably 1 to 4.
 Zが炭素原子またはケイ素原子の場合、rは3であり、qは0~2の整数であり、0または1であることが好ましい。Zが窒素原子の場合、rは2であり、qは0~1の整数であり、0が好ましい。
 Rが1分子中に複数ある場合、複数あるRは、同じであっても異なっていてもよい。原料の入手容易性や化合物1の製造容易性の点からは、互いに同じであることが好ましい。
When Z is a carbon atom or a silicon atom, r is 3 and q is an integer of 0 to 2, preferably 0 or 1. When Z is a nitrogen atom, r is 2 and q is an integer of 0 to 1, preferably 0.
When there are a plurality of R 3 in one molecule, the plurality of R 3 may be the same or different. From the viewpoint of the availability of raw materials and the ease of production of compound 1, they are preferably the same.
 化合物1としては、特定化合物の非フッ素系有機溶媒に対する溶解性および表面層の耐摩擦性により優れる点で、化合物2が好ましい。
 R-[(OCm1(4-m1)a1(OCm2(6-m2)a2(OCm3(8-m3)a3(OCm4(10-m4)a4(OCm5(12-m5)a5(OX]-Y-Z(R(Rr-q  式2
 各基の定義は、上述した通りである。
As the compound 1, the compound 2 is preferable in that it is excellent in the solubility of the specific compound in the non-fluorinated organic solvent and the friction resistance of the surface layer.
R 1 -[(OC 2 H m 1 F (4-m 1) ) a 1 (OC 3 H m 2 F (6-m 2 ) ) a 2 (OC 4 H m 3 F (8-m 3) ) a 3 (OC 5 H m 4 F ( 10-m4)) a4 (OC 6 H m5 F (12-m5)) a5 (OX 2) b] -Y-Z (R 2) q (R 3) r-q formula 2
The definition of each group is as described above.
 化合物1の具体例としては、以下が挙げられる。以下の表中、tは1以上の整数を表す。tは50以下の整数が好ましい。 Specific examples of compound 1 include the following. In the following table, t represents an integer of 1 or more. t is preferably an integer of 50 or less.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000004
Figure JPOXMLDOC01-appb-T000004
Figure JPOXMLDOC01-appb-T000005
Figure JPOXMLDOC01-appb-T000005
 特定化合物は、公知の製造方法によって製造できる。たとえば、化合物3をHSi(R)3-nとヒドロシリル化反応させることによって製造できる。
  R11-[(OX(OX]-Y-Z(R(L-CH=CHr-q 式3
 式中、X、X、Y、Z、R、a、b、q、rの定義は上述の通りであり、R11はフッ素原子を有してもよいアルキル基、またはY-Z(R(L-CH=CHr-qであり、Lは-O-を有していてもよいアルキレン基、単結合または-O-であり、L-CH=CHがヒドロシリル化されると化合物1のLになる。化合物3は、たとえばYが-C(O)NHCH-の場合、R-OHを原料として公知の方法でR-[(OX(OX]-C(O)OR(Rは炭素数1~6のアルキル基。)を得て、NH-CH-Z(R(L-CH=CHr-qと反応させて製造できる。
The specific compound can be produced by a known production method. For example, it can be produced by hydrosilylation reaction of compound 3 with HSi (R) n L 3-n .
R 11 - [(OX 1) a (OX 2) b] -Y-Z (R 2) q (L 2 -CH = CH 2) r-q Formula 3
In the formula, X 1 , X 2 , Y, Z, R 2 , a, b, q and r are as defined above, and R 11 is an alkyl group which may have a fluorine atom, or Y—Z (R 2 ) q (L 2 -CH = CH 2 ) r-q , L 2 is an alkylene group which may have -O-, a single bond or -O-, L 2 -CH = When CH 2 is hydrosilylated, it becomes L 1 of Compound 1. Compound 3 is, for example, when Y is -C (O) NHCH 2- , R 1 -[(OX 1 ) a (OX 2 ) b ] -C (O) OR is known by a known method using R 1 -OH as a raw material. 5 (wherein R 5 is an alkyl group having 1 to 6 carbon atoms) can be obtained by reaction with NH 2 -CH 2 -Z (R 2 ) q (L 2 -CH = CH 2 ) r-q .
〔組成物〕
 本発明の組成物(以下、「本組成物」ともいう。)は、特定化合物と、液状媒体とを含む。
〔Composition〕
The composition of the present invention (hereinafter also referred to as "the present composition") contains a specific compound and a liquid medium.
 特定化合物は、1種単独で用いても2種以上を併用してもよい。
 特定化合物の含有量は、本組成物の全質量に対して、0.001~30質量%が好ましく、0.01~20質量%が特に好ましい。
The specific compounds may be used alone or in combination of two or more.
The content of the specific compound is preferably 0.001 to 30% by mass, particularly preferably 0.01 to 20% by mass, with respect to the total mass of the composition.
 液状媒体の具体例としては、水、有機溶媒が挙げられる。有機溶媒の具体例としては、フッ素系有機溶媒および非フッ素系有機溶媒が挙げられる。
 有機溶媒は、1種単独で用いても2種以上を併用してもよい。
Examples of the liquid medium include water and organic solvents. Specific examples of the organic solvent include fluorine-based organic solvents and non-fluorine-based organic solvents.
The organic solvents may be used alone or in combination of two or more.
 フッ素系有機溶媒の具体例としては、フッ素化アルカン、フッ素化芳香族化合物、フルオロアルキルエーテル、フッ素化アルキルアミン、フルオロアルコールが挙げられる。
 フッ素化アルカンは、炭素数4~8の化合物が好ましく、たとえば、C13H(AC-2000:製品名、AGC社製)、C13(AC-6000:製品名、AGC社製)、CCHFCHFCF(バートレル:製品名、デュポン社製)が挙げられる。
 フッ素化芳香族化合物の具体例としては、ヘキサフルオロベンゼン、トリフルオロメチルベンゼン、ペルフルオロトルエン、1,3-ビス(トリフルオロメチル)ベンゼン、1,4-ビス(トリフルオロメチル)ベンゼンが挙げられる。
 フルオロアルキルエーテルは、炭素数4~12の化合物が好ましく、たとえば、CFCHOCFCFH(AE-3000:製品名、AGC社製)、COCH(ノベック-7100:製品名、3M社製)、COC(ノベック-7200:製品名、3M社製)、CCF(OCH)C(ノベック-7300:製品名、3M社製)が挙げられる。
 フッ素化アルキルアミンの具体例としては、ペルフルオロトリプロピルアミン、ペルフルオロトリブチルアミンが挙げられる。
 フルオロアルコールの具体例としては、2,2,3,3-テトラフルオロプロパノール、2,2,2-トリフルオロエタノール、ヘキサフルオロイソプロパノールが挙げられる。
Specific examples of the fluorinated organic solvent include fluorinated alkanes, fluorinated aromatic compounds, fluoroalkyl ethers, fluorinated alkylamines and fluoroalcohols.
The fluorinated alkane is preferably a compound having 4 to 8 carbon atoms. For example, C 6 F 13 H (AC-2000: product name, manufactured by AGC), C 6 F 13 C 2 H 5 (AC-6000: product name) , AGC), C 2 F 5 CHFCHFCF 3 (Bartrel: product name, manufactured by Dupont).
Specific examples of the fluorinated aromatic compound include hexafluorobenzene, trifluoromethylbenzene, perfluorotoluene, 1,3-bis (trifluoromethyl) benzene, and 1,4-bis (trifluoromethyl) benzene.
The fluoroalkyl ether is preferably a compound having 4 to 12 carbon atoms. For example, CF 3 CH 2 OCF 2 CF 2 H (AE-3000: product name, manufactured by AGC), C 4 F 9 OCH 3 (Novec-7100: Product name, manufactured by 3M), C 4 F 9 OC 2 H 5 (Novec-7200: product name, manufactured by 3M), C 2 F 5 CF (OCH 3 ) C 3 F 7 (Novec-7300: product name, 3M company).
Specific examples of fluorinated alkylamines include perfluorotripropylamine and perfluorotributylamine.
Specific examples of fluoroalcohols include 2,2,3,3-tetrafluoropropanol, 2,2,2-trifluoroethanol and hexafluoroisopropanol.
 非フッ素系有機溶媒としては、水素原子および炭素原子のみからなる化合物、および、水素原子、炭素原子および酸素原子のみからなる化合物が好ましく、具体的には、炭化水素系有機溶媒、ケトン系有機溶媒、エーテル系有機溶媒、エステル系有機溶媒が挙げられる。
 炭化水素系有機溶媒の具体例としては、ヘキサン、へプタン、シクロヘキサンが挙げられる。
 ケトン系有機溶媒の具体例としては、アセトン、メチルエチルケトン、メチルイソブチルケトンが挙げられる。
 エーテル系有機溶媒の具体例としては、ジエチルエーテル、テトラヒドロフラン、テトラエチレングリコールジメチルエーテルが挙げられる。
 エステル系有機溶媒の具体例としては、酢酸エチル、酢酸ブチルが挙げられる。
 これらの非フッ素系有機溶媒の中でも、特定化合物の溶解性がより優れる点から、ケトン系有機溶媒およびエーテル系有機溶媒が好ましい。
As the non-fluorinated organic solvent, a compound consisting of only a hydrogen atom and a carbon atom, and a compound consisting of only a hydrogen atom, a carbon atom and an oxygen atom are preferable. Specifically, a hydrocarbon-based organic solvent, a ketone-based organic solvent And ether-based organic solvents and ester-based organic solvents.
Specific examples of the hydrocarbon-based organic solvent include hexane, heptane and cyclohexane.
Specific examples of the ketone-based organic solvent include acetone, methyl ethyl ketone and methyl isobutyl ketone.
Specific examples of the ether-based organic solvent include diethyl ether, tetrahydrofuran and tetraethylene glycol dimethyl ether.
Ethyl acetate and butyl acetate are mentioned as a specific example of ester system organic solvent.
Among these non-fluorine-based organic solvents, ketone-based organic solvents and ether-based organic solvents are preferable from the viewpoint that the solubility of the specific compound is more excellent.
 液状媒体の含有量は、本組成物の全質量に対して、70~99.999質量%が好ましく、80~99.99質量%が特に好ましい。 The content of the liquid medium is preferably 70 to 99.999% by mass, particularly preferably 80 to 99.99% by mass, with respect to the total mass of the composition.
 本発明の組成物は、特定化合物と液状媒体以外の成分を含んでいてもよい。
 他の成分としては、特定化合物の製造工程で生成した副生物、未反応の原料等の製造上の不可避の化合物が挙げられる。
 また、加水分解性シリル基の加水分解と縮合反応を促進する酸触媒や塩基性触媒等の添加剤が挙げられる。酸触媒の具体例としては、塩酸、硝酸、酢酸、硫酸、燐酸、スルホン酸、メタンスルホン酸、p-トルエンスルホン酸が挙げられる。塩基性触媒の具体例としては、水酸化ナトリウム、水酸化カリウム、アンモニアが挙げられる。
 他の成分の含有量は、特定化合物に対して、0~10質量%が好ましく、0~5質量%がより好ましく、0~1質量%が特に好ましい。
The composition of the present invention may contain components other than the specific compound and the liquid medium.
Examples of other components include by-products produced in the process of producing a specific compound, and compounds unavoidable for production of unreacted starting materials and the like.
In addition, additives such as an acid catalyst and a basic catalyst which promote the hydrolysis and condensation reaction of the hydrolyzable silyl group may be mentioned. Specific examples of the acid catalyst include hydrochloric acid, nitric acid, acetic acid, sulfuric acid, phosphoric acid, sulfonic acid, methanesulfonic acid and p-toluenesulfonic acid. Specific examples of the basic catalyst include sodium hydroxide, potassium hydroxide and ammonia.
The content of the other components is preferably 0 to 10% by mass, more preferably 0 to 5% by mass, and particularly preferably 0 to 1% by mass, with respect to the specific compound.
〔物品〕
 本発明の物品は、基材と、基材上に特定化合物または本組成物から形成されてなる表面層と、を有する。
 すなわち特定化合物を含む表面処理剤は物品の表面処理のために用いられる。
[Articles]
The article of the present invention has a substrate and a surface layer formed of the specific compound or the present composition on the substrate.
That is, a surface treatment agent containing a specific compound is used for surface treatment of an article.
 表面層には、特定化合物の加水分解反応および縮合反応を介して得られる化合物が含まれる。
 表面層の膜厚は、1~100nmが好ましく、1~50nmが特に好ましい。表面層の膜厚は、薄膜解析用X線回折計(ATX-G:製品名、RIGAKU社製)を用いて、X線反射率法によって反射X線の干渉パターンを得て、この干渉パターンの振動周期から算出できる。
The surface layer contains a compound obtained through hydrolysis reaction and condensation reaction of a specific compound.
The thickness of the surface layer is preferably 1 to 100 nm, particularly preferably 1 to 50 nm. The thickness of the surface layer is determined using an X-ray diffractometer for thin film analysis (ATX-G: product name, manufactured by RIGAKU Co., Ltd.) to obtain an interference pattern of the reflected X-ray by the X-ray reflectance method. It can be calculated from the vibration period.
 基材は、撥水撥油性の付与が求められている基材であれば特に限定されない。基材の材料の具体例としては、金属、樹脂、ガラス、サファイア、セラミック、石、および、これらの複合材料が挙げられる。ガラスは化学強化されていてもよい。基材は、国際公開第2011/016458号の段落0089~0095に記載の化合物やSiO等で下地処理されていてもよい。
 基材としては、タッチパネル用基材およびディスプレイ基材が好ましく、タッチパネル用基材が特に好ましい。タッチパネル用基材は、透光性を有するのが好ましい。「透光性を有する」とは、JIS R3106:1998(ISO 9050:1990)に準じた垂直入射型可視光透過率が25%以上であるのを意味する。タッチパネル用基材の材料としては、ガラスまたは透明樹脂が好ましい。
 また、基材としては、携帯電話(たとえば、スマートフォン)、携帯情報端末、ゲーム機、リモコン等の機器における外装部分(表示部を除く)に使用する、ガラスまたは樹脂フィルムも好ましい。
The substrate is not particularly limited as long as the substrate is required to be imparted with water and oil repellency. Specific examples of the material of the substrate include metals, resins, glasses, sapphires, ceramics, stones, and composite materials of these. The glass may be chemically strengthened. The substrate may be subjected to a surface treatment with a compound described in paragraphs 0089 to 0095 of WO 2011/016458, SiO 2 or the like.
As a base material, the base material for touchscreens and a display base material are preferable, and the base material for touchscreens is especially preferable. The touch panel substrate preferably has a light transmitting property. “Having light transmittance” means that the vertical incident visible light transmittance according to JIS R 3106: 1998 (ISO 9050: 1990) is 25% or more. As a material of the base material for touchscreens, glass or transparent resin is preferable.
Moreover, as a base material, the glass or the resin film used for exterior parts (except a display part) in apparatuses, such as a mobile telephone (for example, smart phone), a portable information terminal, a game machine, and a remote control, is also preferable.
 上記物品は、たとえば、下記の方法で製造できる。
・特定化合物または本組成物を用いたドライコーティング法によって基材の表面を処理して、上記物品を得る方法。
・ウェットコーティング法によって本組成物を基材の表面に塗布し、乾燥させて、上記物品を得る方法。
 なお、ウェットコーティング法においては、特定化合物を酸触媒や塩基性触媒等を用いて予め加水分解しておき、加水分解した化合物と液状媒体とを含む組成物を使用することもできる。
The above-mentioned article can be manufactured, for example, by the following method.
-A method of treating the surface of a substrate by a dry coating method using a specific compound or the present composition to obtain the above-mentioned article.
-A method of applying the present composition to the surface of a substrate by a wet coating method and drying it to obtain the above-mentioned article.
In the wet coating method, it is also possible to use a composition containing a hydrolysed compound and a liquid medium by hydrolyzing a specific compound in advance using an acid catalyst, a basic catalyst or the like.
 ドライコーティング法の具体例としては、真空蒸着法、CVD法、スパッタリング法が挙げられる。これらの中でも、特定化合物の分解を抑える点、および、装置の簡便さの点から、真空蒸着法が好適である。真空蒸着時には、鉄や鋼等の金属多孔体に特定化合物または本組成物を含浸させたペレット状物質を使用してもよい。
 ウェットコーティング法の具体例としては、スピンコート法、ワイプコート法、スプレーコート法、スキージーコート法、ディップコート法、ダイコート法、インクジェット法、フローコート法、ロールコート法、キャスト法、ラングミュア・ブロジェット法、グラビアコート法が挙げられる。
Specific examples of the dry coating method include a vacuum evaporation method, a CVD method, and a sputtering method. Among these, the vacuum evaporation method is preferable in terms of suppressing the decomposition of the specific compound and the simplicity of the apparatus. At the time of vacuum deposition, a pellet-like substance in which a specific compound or the present composition is impregnated into a porous metal body such as iron or steel may be used.
Specific examples of the wet coating method include spin coating method, wipe coating method, spray coating method, squeegee coating method, dip coating method, die coating method, ink jet method, flow coating method, roll coating method, casting method, Langmuir-Blodgett And gravure coating.
 物品は、特定化合物または本組成物から形成されてなる表面層を有する面とは別の面に、他の化合物または他の化合物を含む組成物から形成されてなる表面層を有していてもよい。
 他の化合物としては、ポリ(オキシペルフルオロアルキレン)鎖、ならびに、ケイ素原子に結合した加水分解性基およびケイ素原子に結合した水酸基のいずれか一方または両方を有する他の含フッ素エーテル化合物が挙げられる。他の含フッ素エーテル化合物としては、化合物4が挙げられる。
 [A-O-Z-(RO)-][-SiR3-n  式4
 Aは、ペルフルオロアルキル基または-Q[-SiR3-nである。
 Qは、(k+1)価の連結基である。
 kは1~10の整数である。
 R、Lおよびnの定義はそれぞれ、基BのR、Lおよびnと同義である。
 Zは、単結合、1個以上の水素原子がフッ素原子に置換された炭素数1~20のオキシフルオロアルキレン基または1個以上の水素原子がフッ素原子に置換された炭素数1~20のポリ(オキシフルオロアルキレン)基である。
 Rは、ペルフルオロアルキレン基である。
 rは、2~200の整数であり
 Zは、(j+g)価の連結基である。
 jおよびgはそれぞれ独立に、1以上の整数である。
The article may have a surface layer formed of the other compound or the composition including the other compound on the other side than the surface having the specific compound or the surface layer formed of the present composition. Good.
Other compounds include poly (oxyperfluoroalkylene) chains and other fluorine-containing ether compounds having a hydrolyzable group bonded to a silicon atom and / or a hydroxyl group bonded to a silicon atom. Other fluorine-containing ether compounds include compound 4.
[A-O-Z 1- (R f O) r- ] j Z 2 [-SiR n L 3-n ] g Formula 4
A is a perfluoroalkyl group or -Q [-SiR n L 3-n ] k .
Q is a (k + 1) valent linking group.
k is an integer of 1 to 10.
The definitions of R, L and n are as defined for R, L and n of group B respectively.
Z 1 is a single bond, an oxyfluoroalkylene group having 1 to 20 carbon atoms in which one or more hydrogen atoms have been substituted by a fluorine atom, or 1 to 20 carbon atoms in which one or more hydrogen atoms have been substituted in a fluorine atom It is a poly (oxyfluoroalkylene) group.
R f is a perfluoroalkylene group.
r is an integer of 2 to 200, and Z 2 is a (j + g) -valent linking group.
j and g are each independently an integer of 1 or more.
 他の含フッ素エーテル化合物は、市販品を使用することもできる。たとえば信越化学工業社製のKY-100シリーズ(KY-178、KY-185、KY-195等)、ダイキン工業社製のオプツール(登録商標)DSX、オプツール(登録商標)AES、オプツール(登録商標)UF503、オプツール(登録商標)UD509、AGC社製のAfluid(登録商標)S550が挙げられる。 Other fluorine-containing ether compounds may also be commercially available products. For example, KY-100 series (KY-178, KY-185, KY-195, etc.) manufactured by Shin-Etsu Chemical Co., Ltd., Optool (registered trademark) DSX manufactured by Daikin Industries, Ltd., Optool (registered trademark) AES, Optool (registered trademark) UF 503, Optool (registered trademark) UD 509, Afluid (registered trademark) S550 manufactured by AGC, Inc. can be mentioned.
 以下、実施例を挙げて本発明を詳細に説明する。ただし本発明はこれらの実施例に限定されない。なお、各成分の配合量は、質量基準を示す。例1~9のうち、例1~5、8、および9が実施例、例6および7が比較例である。 Hereinafter, the present invention will be described in detail by way of examples. However, the present invention is not limited to these examples. In addition, the compounding quantity of each component shows a mass reference | standard. Of Examples 1 to 9, Examples 1 to 5, 8 and 9 are Examples, and Examples 6 and 7 are Comparative Examples.
〔評価方法〕
(溶解性)
 含フッ素エーテル化合物の濃度が1質量%になるようにアセトンで希釈した希釈液について、外観を目視で観察して、以下の基準で含フッ素エーテル化合物の溶解性を評価した。
 ○(良好):希釈液に含まれる成分が分離した状態が確認できず、かつ、希釈液の濁りもない。
 ×(不良):希釈液に含まれる成分が分離した状態にあるか、または、希釈液の濁りがある。
〔Evaluation method〕
(Solubility)
The appearance of the diluted solution diluted with acetone so that the concentration of the fluorinated ether compound was 1% by mass was visually observed, and the solubility of the fluorinated ether compound was evaluated based on the following criteria.
○ (good): The state in which the components contained in the diluted solution are separated can not be confirmed, and there is no turbidity of the diluted solution.
X (poor): The components contained in the diluted solution are in a separated state or the diluted solution has turbidity.
(耐摩擦性)
 耐摩擦性の試験前後の評価サンプルについて、水接触角を測定した。摩擦後の水接触角の低下が小さいほど、摩擦による性能の低下が小さく、耐摩擦性に優れる。水接触角の低下は、20度以下が好ましく、15度以下がより好ましい。
<水接触角の測定方法>
 表面層の表面に置いた約2μLの蒸留水の接触角(水接触角)を、接触角測定装置(DM-500:製品名、協和界面科学社製)を用いて測定した。表面層の表面における異なる5箇所で測定し、その平均値を算出した。接触角の算出には2θ法を用いた。
<耐摩擦性の試験方法>
 表面層について、JIS L0849:2013(ISO 105-X12:2001)に準拠して往復式トラバース試験機(ケイエヌテー社製)を用い、セルロース製不織布(ベンコットM-3:製品名、旭化成社製)を荷重:1kg、摩擦長:4cm、速度:30rpmで1万回往復させた。
(Anti-friction)
The water contact angle was measured for the evaluation samples before and after the friction resistance test. The smaller the decrease in water contact angle after friction, the smaller the decrease in performance due to friction, and the better the friction resistance. 20 degrees or less is preferable and, as for the fall of a water contact angle, 15 degrees or less is more preferable.
<Measurement method of water contact angle>
The contact angle (water contact angle) of about 2 μL of distilled water placed on the surface of the surface layer was measured using a contact angle measurement device (DM-500: product name, manufactured by Kyowa Interface Science Co., Ltd.). It measured in five different places in the surface of a surface layer, and computed the average value. The 2θ method was used to calculate the contact angle.
<Test method of abrasion resistance>
For the surface layer, a cellulose non-woven fabric (Bencott M-3: product name, manufactured by Asahi Kasei Corp.) was used using a reciprocating traverse tester (manufactured by Keienute) in accordance with JIS L 0849: 2013 (ISO 105-X12: 2001). Load: 1 kg, friction length: 4 cm, speed: reciprocated 10,000 times at 30 rpm.
〔例1〕
 化合物1-1は、以下の手順で合成した。
[Example 1]
Compound 1-1 was synthesized by the following procedure.
Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000006
(例1-1)
 環流冷却器を接続した100mLナスフラスコに、化合物X1の10.0gおよび炭酸カリウムの粉末2.61gを入れた。窒素雰囲気下、120℃でナフフラスコ内の混合物を攪拌しながら、化合物X2の106.9gを内温が130℃以下になるように制御しながら、ナスフラスコ内に滴下した。全量滴下した後、ナフフラスコ内の混合物を120℃に保ちながらさらに1時間攪拌し、加熱を止めて25℃に下がるまで攪拌を続けた。ナスフラスコ内に塩酸水溶液を入れて、過剰の炭酸カリウムを処理し、水とC13H(アサヒクリン(登録商標)AC-2000、AGC社製)とを加えて分液処理を行った。3回の水洗後、有機相を回収し、エバポレータで濃縮することで、高粘度のオリゴマーを得た。再び、得られたオリゴマーをCFCHOCFCFH(アサヒクリン(登録商標)AE-3000、AGC社製)の100gで希釈し、シリカゲルカラムクロマトグラフィ(展開溶媒:AK-225)に展開して分取した。各フラクションについて、単位数nの平均値を19F-NMRの積分値から求め、nの平均値が13~16のフラクションを合わせた化合物X3の48.0gを得た。
(Example 1-1)
In a 100 mL recovery flask connected to a reflux condenser, 10.0 g of Compound X1 and 2.61 g of potassium carbonate powder were placed. While stirring the mixture in the naphtha flask at 120 ° C. under a nitrogen atmosphere, 106.9 g of the compound X2 was added dropwise to the eggplant flask while controlling the internal temperature to 130 ° C. or less. After the entire amount had been dropped, the mixture in the naphtha flask was stirred for a further 1 hour while maintaining the temperature at 120 ° C., the heating was stopped and the stirring was continued until the temperature dropped to 25 ° C. An aqueous solution of hydrochloric acid was placed in an eggplant flask to treat excess potassium carbonate, and water and C 6 F 13 H (Asahiculin (registered trademark) AC-2000, manufactured by AGC) were added to separate the layers. . After washing with water three times, the organic phase was recovered and concentrated by an evaporator to obtain a highly viscous oligomer. Again, the obtained oligomer was diluted with 100 g of CF 3 CH 2 OCF 2 CF 2 H (Asahiclin® AE-3000, manufactured by AGC), and developed into silica gel column chromatography (developing solvent: AK-225) I took it out. For each fraction, an average value of the unit number n was determined from an integral value of 19 F-NMR, and 48.0 g of a compound X3 was obtained by combining fractions having an average value of n of 13 to 16.
 化合物X3のNMRスペクトル;
 H-NMR(300.4MHz、溶媒:CDCl、基準:TMS) δ(ppm):2.4(2H)、4.1(2H)、4.5(2H)、4.8(26H)、6.7~6.9(14H)。
 19F-NMR(282.7MHz、溶媒:CDCl、基準:CFCl) δ(ppm):-81(3F)、-84~-85(28F)、-89~-91(28F)、-114(2F)、-120(26F)、-122(4F)、-123(2F)、-124(2F)、-127(30F)、-145(14F)。
 単位数nの平均値:14、化合物X3の数平均分子量:4,260。
NMR spectrum of compound X3;
1 H-NMR (300.4 MHz, solvent: CDCl 3 , standard: TMS) δ (ppm): 2.4 (2 H), 4.1 (2 H), 4.5 (2 H), 4.8 (26 H) , 6.7 to 6.9 (14H).
19 F-NMR (282.7 MHz, solvent: CDCl 3 , standard: CFCl 3 ) δ (ppm): -81 (3F), -84 to -85 (28F), -89 to -91 (28F), -114 (2F), -120 (26F), -122 (4F), -123 (2F), -124 (2F), -127 (30F), -145 (14F).
The average value of the unit number n: 14, the number average molecular weight of the compound X3: 4,260.
(例1-2)
 J.Org.Chem.,第64巻,1999年,p.2564-2566に記載の方法にしたがい、例1-1で得た化合物X3を酸化して、化合物X4を得た。
(Example 1-2)
J. Org. Chem. , 64, 1999, p. The compound X3 obtained in Example 1-1 was oxidized according to the method described in 2564-2566 to obtain a compound X4.
 化合物X4のNMRスペクトル;
 H-NMR(300.4MHz、溶媒:CDCl、基準:TMS) δ(ppm):2.4(2H)、4.5(2H)、4.8(26H)、6.7~6.9(14H)。
 19F-NMR(282.7MHz、溶媒:CDCl、基準:CFCl) δ(ppm):-81(3F)、-84~-85(28F)、-89~-91(28F)、-114(2F)、-120(26F)、-122(2F)、-123(2F)、-124(4F)、-127(30F)、-145(14F)。
 単位数nの平均値:14、化合物X4の数平均分子量:4,270。
NMR spectrum of compound X4;
1 H-NMR (300.4 MHz, solvent: CDCl 3 , standard: TMS) δ (ppm): 2.4 (2 H), 4.5 (2 H), 4.8 (26 H), 6.7 to 6. 9 (14H).
19 F-NMR (282.7 MHz, solvent: CDCl 3 , standard: CFCl 3 ) δ (ppm): -81 (3F), -84 to -85 (28F), -89 to -91 (28F), -114 (2F), -120 (26F), -122 (2F), -123 (2F), -124 (4F), -127 (30F), -145 (14F).
The average value of the unit number n: 14, the number average molecular weight of the compound X4: 4,270.
(例1-3)
 100mLナスフラスコに、例1-2で得た化合物X4の40.0gとメタノールの10mLを入れ、25℃で12時間撹拌した。NMRから、化合物X4がすべて化合物X5に変換していることを確認した。溶媒を減圧留去することにより、化合物X5の6.40.1g(収率100%)を得た。
(Example 1-3)
In a 100 mL recovery flask, 40.0 g of the compound X4 obtained in Example 1-2 and 10 mL of methanol were placed, and stirred at 25 ° C. for 12 hours. From NMR, it was confirmed that compound X4 was all converted to compound X5. The solvent was distilled off under reduced pressure to obtain 6.40.1 g (yield 100%) of compound X5.
 化合物X5のNMRスペクトル;
 H-NMR(300.4MHz、溶媒:CDCl、基準:TMS) δ(ppm):2.4(2H)、3.9(3H)、4.5(2H)、4.8(26H)、6.7~6.9(14H)。
 19F-NMR(282.7MHz、溶媒:CDCl、基準:CFCl) δ(ppm):-81(3F)、-84~-85(28F)、-89~-91(28F)、-114(2F)、-118(2F)、-120(26F)、-122(2F)、-123(2F)、-124(2F)、-126(2F)、-127(28F)、-145(14F)。
 単位数nの平均値:14、化合物X5の数平均分子量:4,280。
NMR spectrum of compound X5;
1 H-NMR (300.4 MHz, solvent: CDCl 3 , standard: TMS) δ (ppm): 2.4 (2 H), 3.9 (3 H), 4.5 (2 H), 4.8 (26 H) , 6.7 to 6.9 (14H).
19 F-NMR (282.7 MHz, solvent: CDCl 3 , standard: CFCl 3 ) δ (ppm): -81 (3F), -84 to -85 (28F), -89 to -91 (28F), -114 (2F), -118 (2F), -120 (26F), -122 (2F), -123 (2F), -124 (2F), -126 (2F), -127 (28F), -145 (14F) ).
The average value of the unit number n: 14, the number average molecular weight of the compound X5: 4,280.
(例1-4)
 50mLのナスフラスコに、例1-3で得た化合物X5の10.0gおよび化合物X6の0.40gを入れ、12時間撹拌した。NMRから、化合物X5がすべて化合物3-1に変換していることを確認した。また、副生物であるメタノールが生成していた。得られた溶液をAC-2000の9.0gで希釈し、シリカゲルカラムクロマトグラフィ(展開溶媒:AC-2000)で精製し、化合物3-1の9.2g(収率89%)を得た。
(Example 1-4)
In a 50 mL eggplant flask, 10.0 g of the compound X5 obtained in Example 1-3 and 0.40 g of the compound X6 were charged, and stirred for 12 hours. From NMR, it was confirmed that compound X5 was all converted to compound 3-1. In addition, methanol, which is a by-product, was produced. The resulting solution was diluted with 9.0 g of AC-2000, and purified by silica gel column chromatography (developing solvent: AC-2000) to obtain 9.2 g (yield 89%) of compound 3-1.
 化合物3-1のNMRスペクトル;
 H-NMR(300.4MHz、溶媒:CDCl、基準:TMS) δ(ppm):2.4(8H)、3.4(2H)、4.5(2H)、4.8(26H)、5.2(6H)、5.9-6.2(3H)、6.7~6.9(14H)。
 19F-NMR(282.7MHz、溶媒:CDCl、基準:CFCl) δ(ppm):-81(3F)、-84~-85(28F)、-89~-91(28F)、-114(2F)、-120(28F)、-122(2F)、-123(2F)、-124(2F)、-126(2F)、-127(28F)、-145(14F)。
 単位数nの平均値:14、化合物3-1の数平均分子量:4,420。
NMR spectrum of compound 3-1;
1 H-NMR (300.4 MHz, solvent: CDCl 3 , standard: TMS) δ (ppm): 2.4 (8 H), 3.4 (2 H), 4.5 (2 H), 4.8 (26 H) 5.2 (6 H), 5.9-6.2 (3 H), 6.7-6.9 (14 H).
19 F-NMR (282.7 MHz, solvent: CDCl 3 , standard: CFCl 3 ) δ (ppm): -81 (3F), -84 to -85 (28F), -89 to -91 (28F), -114 (2F), -120 (28F), -122 (2F), -123 (2F), -124 (2F), -126 (2F), -127 (28F), -145 (14F).
The average number of units n: 14, the number average molecular weight of compound 3-1: 4,420.
(例1-5)
 10mLのガラス製サンプル瓶に、例1-4で得た化合物3-1の6.0g、白金/1,3-ジビニル-1,1,3,3-テトラメチルジシロキサン錯体のキシレン溶液(白金含有量:2質量%)の0.06g、HSi(OCHの1.01g、アニリンの0.02g、1,3-ビス(トリフルオロメチル)ベンゼン(東京化成工業社製)の1.0gを入れ、40℃で8時間撹拌した。反応終了後、溶媒等を減圧留去し、1.0μm孔径のメンブランフィルタでろ過し、化合物1-1の6.5g(収率100%)を得た。
(Example 1-5)
In a 10 mL glass sample bottle, 6.0 g of the compound 3-1 obtained in Example 1-4, platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex in xylene solution (platinum Content: 2% by mass of 0.06 g, HSi (OCH 3 ) 3 of 1.01 g, aniline of 0.02 g, 1,3-bis (trifluoromethyl) benzene (manufactured by Tokyo Chemical Industry Co., Ltd.) 1. 0 g was added and stirred at 40 ° C. for 8 hours. After completion of the reaction, the solvent and the like were distilled off under reduced pressure, and the mixture was filtered through a membrane filter with a 1.0 μm pore diameter to obtain 6.5 g (yield 100%) of compound 1-1.
 化合物1-1のNMRスペクトル;
 H-NMR(300.4MHz、溶媒:CDCl、基準:TMS) δ(ppm):0.7(6H)、1.3~1.7(12H)、2.4(2H)、3.4(2H)、3.6(27H)、4.5(2H)、4.8(26H)、6.7~6.9(14H)。
 19F-NMR(282.7MHz、溶媒:CDCl、基準:CFCl) δ(ppm):-81(3F)、-84~-85(28F)、-89~-91(28F)、-114(2F)、-120(28F)、-122(2F)、-123(2F)、-124(2F)、-126(2F)、-127(28F)、-145(14F)。
 単位数nの平均値:14、化合物1-1の数平均分子量:4,780。
NMR spectrum of compound 1-1;
1 H-NMR (300.4 MHz, solvent: CDCl 3 , standard: TMS) δ (ppm): 0.7 (6 H), 1.3 to 1.7 (12 H), 2.4 (2 H), 3. 4 (2 H), 3.6 (27 H), 4.5 (2 H), 4.8 (26 H), 6.7 to 6.9 (14 H).
19 F-NMR (282.7 MHz, solvent: CDCl 3 , standard: CFCl 3 ) δ (ppm): -81 (3F), -84 to -85 (28F), -89 to -91 (28F), -114 (2F), -120 (28F), -122 (2F), -123 (2F), -124 (2F), -126 (2F), -127 (28F), -145 (14F).
The average value of the unit number n: 14, the number average molecular weight of the compound 1-1: 4,780.
〔例2〕
 化合物1-2は、以下の手順で合成した。なお、反応式については、後述の例3とあわせて示した。
[Example 2]
Compound 1-2 was synthesized by the following procedure. The reaction formula is shown together with Example 3 described later.
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000007
(例2-1)
 100mLのナスフラスコに、テトラヒドロフランの50.0gを入れ、0℃に冷却した。ナスフラスコ内に0.7mol/Lのアリルマグネシウムブロミドの15mLを滴下し、例1-3で得た化合物X5の20.5gを滴下し、さらにナスフラスコ内の混合物を2時間撹拌した。1mol/Lの塩酸水溶液の30mLを混合物に入れて反応を停止させ、下層をシリカゲルカラムクロマトグラフィ(展開溶媒:C13(AGC社製、アサヒクリン(登録商標)AC-6000))で精製し、化合物3-2の16.1g(収率78%)を得た。
(Example 2-1)
In a 100 mL eggplant flask, 50.0 g of tetrahydrofuran was placed and cooled to 0 ° C. 15 mL of 0.7 mol / L allylmagnesium bromide was dropped into the eggplant flask, 20.5 g of the compound X5 obtained in Example 1-3 was dropped, and the mixture in the eggplant flask was further stirred for 2 hours. The reaction is terminated by adding 30 mL of a 1 mol / L aqueous hydrochloric acid solution to the mixture, and the lower layer is subjected to silica gel column chromatography (developing solvent: C 6 F 13 C 2 H 5 (manufactured by AGC, ASAHIKLIN (registered trademark) AC-6000). ) To give 16.1 g (yield 78%) of compound 3-2.
 化合物3-2のNMRスペクトル;
 H-NMR(300.4MHz、溶媒:CDCl、基準:TMS) δ(ppm):2.4~2.6(6H)、4.5(2H)、4.8(26H)、5.2-5.3(4H)、5.9-6.0(2H)、6.7~6.9(14H)。
 19F-NMR(282.7MHz、溶媒:CDCl、基準:CFCl) δ(ppm):-81(3F)、-84~-85(28F)、-89~-91(28F)、-114(2F)、-116(2F)、-120(26F)、-121(2F)、-122(2F)、-123(2F)、-124(2F)、-127(28F)、-145(14F)。
 単位数nの平均値:14、化合物3-2の数平均分子量:4,340。
NMR spectrum of compound 3-2;
1 H-NMR (300.4 MHz, solvent: CDCl 3 , standard: TMS) δ (ppm): 2.4 to 2.6 (6 H), 4.5 (2 H), 4.8 (26 H), 5. 2-5.3 (4H), 5.9-6.0 (2H), 6.7 to 6.9 (14H).
19 F-NMR (282.7 MHz, solvent: CDCl 3 , standard: CFCl 3 ) δ (ppm): -81 (3F), -84 to -85 (28F), -89 to -91 (28F), -114 (2F), -116 (2F), -120 (26F), -121 (2F), -122 (2F), -123 (2F), -124 (2F), -127 (28F), -145 (14F) ).
The average number of units n: 14, the number average molecular weight of compound 3-2: 4,340.
(例2-2)
 化合物3-1を例2-1で得た化合物3-2の6.0gに変更した以外は例1-5と同様にして、化合物1-2の6.3g(収率100%)を得た。
(Example 2-2)
In the same manner as in Example 1-5 except that Compound 3-1 was changed to 6.0 g of Compound 3-2 obtained in Example 2-1, 6.3 g (yield 100%) of Compound 1-2 was obtained. The
 化合物1-2のNMRスペクトル;
 H-NMR(300.4MHz、溶媒:CDCl、基準:TMS) δ(ppm):0.7(4H)、1.6~1.8(4H)、1.9~2.0(4H)、2.4(2H)、3.6(18H)、4.5(2H)、4.8(26H)、6.7~6.9(14H)。
 19F-NMR(282.7MHz、溶媒:CDCl、基準:CFCl) δ(ppm):-81(3F)、-84~-85(28F)、-89~-91(28F)、-114(2F)、-116(2F)、-120(26F)、-121(2F)、-122(2F)、-123(2F)、-124(2F)、-127(28F)、-145(14F)。
 単位数nの平均値:14、化合物1-2の数平均分子量:4,580。
NMR spectrum of compound 1-2;
1 H-NMR (300.4 MHz, solvent: CDCl 3 , standard: TMS) δ (ppm): 0.7 (4 H), 1.6 to 1.8 (4 H), 1.9 to 2.0 (4 H) ), 2.4 (2H), 3.6 (18H), 4.5 (2H), 4.8 (26H), 6.7 to 6.9 (14H).
19 F-NMR (282.7 MHz, solvent: CDCl 3 , standard: CFCl 3 ) δ (ppm): -81 (3F), -84 to -85 (28F), -89 to -91 (28F), -114 (2F), -116 (2F), -120 (26F), -121 (2F), -122 (2F), -123 (2F), -124 (2F), -127 (28F), -145 (14F) ).
The average number of units n: 14, the number average molecular weight of the compound 1-2: 4,580.
〔例3〕
 化合物1-3は、以下の手順で合成した。なお、反応式については、上記例2とあわせて示した。
[Example 3]
Compound 1-3 was synthesized by the following procedure. The reaction formula is shown together with Example 2 above.
(例3-1)
 50mLのナスフラスコに、例2-1で得た化合物3-2の10.0g、臭化アリルの1.5g、テトラブチルアンモニウムヨージドの0.03gおよび水酸化カリウムの0.7gを入れ、混合物を80℃で5時間撹拌した。混合物を25℃まで冷却し、AE-3000の10gを入れ、2回水洗した。得られた粗液をシリカゲルカラムクロマトグラフィ(展開溶媒:AC-6000)で精製し、化合物3-3の9.3g(収率92%)を得た。
(Example 3-1)
In a 50 mL recovery flask, 10.0 g of the compound 3-2 obtained in Example 2-1, 1.5 g of allyl bromide, 0.03 g of tetrabutylammonium iodide and 0.7 g of potassium hydroxide are placed. The mixture is stirred at 80 ° C. for 5 hours. The mixture was cooled to 25 ° C., charged with 10 g of AE-3000 and washed twice with water. The obtained crude solution was purified by silica gel column chromatography (developing solvent: AC-6000) to obtain 9.3 g (yield 92%) of compound 3-3.
 化合物3-3のNMRスペクトル;
 H-NMR(300.4MHz、溶媒:CDCl、基準:TMS) δ(ppm):2.4~2.7(8H)、4.5(2H)、4.8(26H)、5.0-5.3(6H)、5.8-6.0(3H)、6.7~6.9(14H)。
 19F-NMR(282.7MHz、溶媒:CDCl、基準:CFCl) δ(ppm):-81(3F)、-84~-85(28F)、-89~-91(28F)、-111(2F)、-114(2F)、-120(26F)、-122(2F)、-123(4F)、-124(2F)、-127(28F)、-145(14F)。
 単位数nの平均値:14、化合物3-3の数平均分子量:4,380。
NMR spectrum of compound 3-3;
1 H-NMR (300.4 MHz, solvent: CDCl 3 , standard: TMS) δ (ppm): 2.4 to 2.7 (8 H), 4.5 (2 H), 4.8 (26 H), 5. 0-5.3 (6 H), 5.8-6.0 (3 H), 6.7-6.9 (14 H).
19 F-NMR (282.7 MHz, solvent: CDCl 3 , standard: CFCl 3 ) δ (ppm): -81 (3F), -84 to -85 (28F), -89 to -91 (28F), -111 (2F), -114 (2F), -120 (26F), -122 (2F), -123 (4F), -124 (2F), -127 (28F), -145 (14F).
Average number of units n: 14, Number average molecular weight of compound 3-3: 4,380.
(例3-2)
 化合物3-1を例3-1で得た化合物3-3の6.0gに変更した以外は例1-5と同様にして、化合物1-3の6.5g(収率100%)を得た。
(Example 3-2)
In the same manner as in Example 1-5 except that Compound 3-1 was changed to 6.0 g of Compound 3-3 obtained in Example 3-1, 6.5 g (yield 100%) of Compound 1-3 was obtained. The
 化合物1-3のNMRスペクトル;
 H-NMR(300.4MHz、溶媒:CDCl、基準:TMS) δ(ppm):0.6~0.8(6H)、1.6~1.8(6H)、1.9~2.0(4H)、2.4(2H)、3.6(29H)、4.5(2H)、4.8(26H)、6.7~6.9(14H)。
 19F-NMR(282.7MHz、溶媒:CDCl、基準:CFCl) δ(ppm):-81(3F)、-84~-85(28F)、-89~-91(28F)、-111(2F)、-114(2F)、-120(26F)、-122(2F)、-123(4F)、-124(2F)、-127(28F)、-145(14F)。
 単位数nの平均値:14、化合物1-3の数平均分子量:4,740。
NMR spectrum of compound 1-3;
1 H-NMR (300.4 MHz, solvent: CDCl 3 , standard: TMS) δ (ppm): 0.6 to 0.8 (6 H), 1.6 to 1.8 (6 H), 1.9 to 2 .0 (4 H), 2.4 (2 H), 3.6 (29 H), 4.5 (2 H), 4.8 (26 H), 6.7 to 6.9 (14 H).
19 F-NMR (282.7 MHz, solvent: CDCl 3 , standard: CFCl 3 ) δ (ppm): -81 (3F), -84 to -85 (28F), -89 to -91 (28F), -111 (2F), -114 (2F), -120 (26F), -122 (2F), -123 (4F), -124 (2F), -127 (28F), -145 (14F).
Average number of units n: 14, Number average molecular weight of compounds 1-3: 4,740.
〔例4〕
 化合物1-4は、以下の手順で合成した。
[Example 4]
Compound 1-4 was synthesized by the following procedure.
Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000008
(例4-1)
 50mLのナスフラスコに、例1-1で得た化合物X3の8.0g、臭化アリルの0.34g、テトラブチルアンモニウムブロミドの0.08gおよび48質量%水酸化カリウム水溶液の0.60gを入れ、混合物を80℃で5時間撹拌した。混合物を25℃まで冷却し、AC-6000の10gを入れ、2回水洗した。得られた粗液をシリカゲルカラムクロマトグラフィ(展開溶媒:AC-6000)で精製し、化合物X6の7.9g(収率98%)を得た。
(Example 4-1)
In a 50 mL recovery flask, 8.0 g of the compound X3 obtained in Example 1-1, 0.34 g of allyl bromide, 0.08 g of tetrabutylammonium bromide, and 0.60 g of a 48% by mass aqueous potassium hydroxide solution are placed. The mixture was stirred at 80 ° C. for 5 hours. The mixture was cooled to 25 ° C., charged with 10 g of AC-6000 and washed twice with water. The obtained crude solution was purified by silica gel column chromatography (developing solvent: AC-6000) to obtain 7.9 g (yield 98%) of compound X6.
 化合物X6のNMRスペクトル;
 H-NMR(300.4MHz、溶媒:CDCl、基準:TMS) δ(ppm):2.4(2H)、4.0(2H)、4.2(2H)、4.5(2H)、4.8(26H)、5.2~5.4(2H)、5.8~6.0(1H)、6.7~6.9(14H)。
 19F-NMR(282.7MHz、溶媒:CDCl、基準:CFCl) δ(ppm):-81(3F)、-84~-85(28F)、-89~-91(28F)、-114(2F)、-120(26F)、-122(4F)、-123(2F)、-124(2F)、-127(30F)、-145(14F)。
 単位数nの平均値:14、化合物X6の数平均分子量:4,300。
NMR spectrum of compound X6;
1 H-NMR (300.4 MHz, solvent: CDCl 3 , standard: TMS) δ (ppm): 2.4 (2 H), 4.0 (2 H), 4.2 (2 H), 4.5 (2 H) 4.8 (26 H), 5.2-5.4 (2 H), 5.8-6.0 (1 H), 6.7- 6.9 (14 H).
19 F-NMR (282.7 MHz, solvent: CDCl 3 , standard: CFCl 3 ) δ (ppm): -81 (3F), -84 to -85 (28F), -89 to -91 (28F), -114 (2F), -120 (26F), -122 (4F), -123 (2F), -124 (2F), -127 (30F), -145 (14F).
The average value of the unit number n: 14, the number average molecular weight of the compound X6: 4,300.
(例4-2)
 20mLのPTFE製密閉容器に、例4-1で得た化合物X6の7.5g、白金/1,3-ジビニル-1,1,3,3-テトラメチルジシロキサン錯体のキシレン溶液(白金含有量:2質量%)の0.03g、HSiClの0.35g、1,3-ビス(トリフルオロメチル)ベンゼンの3.0gを入れ、混合物を40℃で8時間撹拌した。反応終了後、溶媒等を減圧留去し、化合物X7の7.7g(収率99%)を得た。
(Example 4-2)
In a 20 mL closed PTFE container, 7.5 g of the compound X6 obtained in Example 4-1, a xylene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content 0.03 g of 2% by mass), 0.35 g of HSiCl 3 and 3.0 g of 1,3-bis (trifluoromethyl) benzene were added, and the mixture was stirred at 40 ° C. for 8 hours. After completion of the reaction, the solvent and the like were distilled off under reduced pressure to obtain 7.7 g (yield 99%) of compound X7.
 化合物X7のNMRスペクトル;
 H-NMR(300.4MHz、溶媒:CDCl、基準:TMS) δ(ppm):1.4~1.5(2H)、1.9(2H)、2.4(2H)、3.6(2H)、4.0(2H)、4.5(2H)、4.8(26H)、6.7~6.9(14H)。
 19F-NMR(282.7MHz、溶媒:CDCl、基準:CFCl) δ(ppm):-81(3F)、-84~-85(28F)、-89~-91(28F)、-114(2F)、-120(26F)、-122(4F)、-123(2F)、-124(2F)、-127(30F)、-145(14F)。
 単位数nの平均値:14、化合物X7の数平均分子量:4,430。
NMR spectrum of compound X7;
1 H-NMR (30.4 MHz, solvent: CDCl 3 , standard: TMS) δ (ppm): 1.4 to 1.5 (2 H), 1.9 (2 H), 2.4 (2 H), 3. 6 (2 H), 4.0 (2 H), 4.5 (2 H), 4.8 (26 H), 6.7 to 6.9 (14 H).
19 F-NMR (282.7 MHz, solvent: CDCl 3 , standard: CFCl 3 ) δ (ppm): -81 (3F), -84 to -85 (28F), -89 to -91 (28F), -114 (2F), -120 (26F), -122 (4F), -123 (2F), -124 (2F), -127 (30F), -145 (14F).
The average value of the unit number n: 14, the number average molecular weight of the compound X7: 4,430.
(例4-3)
 50mLのナスフラスコに、例4-2で得た化合物X7の7.5gおよびテトラヒドロフランの20.0gを入れ、0℃に冷却した。ナスフラスコ内に0.7mol/Lのアリルマグネシウムブロミドの12mLを滴下し、さらにナスフラスコ内の混合物を2時間撹拌した。混合物を25℃に戻してさらに8時間撹拌し、1mol/Lの塩酸水溶液の10mLを入れて反応を停止させた。得られた混合物にAC-6000の10gを入れて下層を抽出し、これをシリカゲルカラムクロマトグラフィ(展開溶媒:AC-6000)で精製し、化合物3-4の6.9g(収率92%)を得た。
(Example 4-3)
In a 50 mL recovery flask, 7.5 g of the compound X7 obtained in Example 4-2 and 20.0 g of tetrahydrofuran were charged, and cooled to 0 ° C. 12 mL of 0.7 mol / L allylmagnesium bromide was dropped into the eggplant flask, and the mixture in the eggplant flask was further stirred for 2 hours. The mixture was returned to 25 ° C. and stirred for additional 8 hours, and the reaction was quenched by adding 10 mL of 1 mol / L aqueous hydrochloric acid solution. 10 g of AC-6000 was added to the obtained mixture to extract the lower layer, which was purified by silica gel column chromatography (developing solvent: AC-6000) to obtain 6.9 g (yield 92%) of compound 3-4 Obtained.
 化合物3-4のNMRスペクトル;
 H-NMR(300.4MHz、溶媒:CDCl、基準:TMS) δ(ppm):0.7(2H)、1.6(6H)、1.8(2H)、2.4(2H)、3.6(2H)、4.0(2H)、4.5(2H)、4.8(26H)、4.9(6H)、5.7~5.9(3H)、6.7~6.9(14H)。
 19F-NMR(282.7MHz、溶媒:CDCl、基準:CFCl) δ(ppm):-81(3F)、-84~-85(28F)、-89~-91(28F)、-114(2F)、-120(26F)、-122(4F)、-123(2F)、-124(2F)、-127(30F)、-145(14F)。
 単位数nの平均値:14、化合物3-4の数平均分子量:4,450。
NMR spectrum of compound 3-4;
1 H-NMR (300.4 MHz, solvent: CDCl 3 , standard: TMS) δ (ppm): 0.7 (2 H), 1.6 (6 H), 1.8 (2 H), 2.4 (2 H) , 3.6 (2H), 4.0 (2H), 4.5 (2H), 4.8 (26H), 4.9 (6H), 5.7 to 5.9 (3H), 6.7 ~ 6.9 (14H).
19 F-NMR (282.7 MHz, solvent: CDCl 3 , standard: CFCl 3 ) δ (ppm): -81 (3F), -84 to -85 (28F), -89 to -91 (28F), -114 (2F), -120 (26F), -122 (4F), -123 (2F), -124 (2F), -127 (30F), -145 (14F).
The average number of units n: 14, the number average molecular weight of the compound 3-4: 4,450.
(例4-4)
 化合物3-1を例4-3で得た化合物3-4の6.0gに変更した以外は例1-5と同様にして、化合物1-4の6.5g(収率100%)を得た。
(Example 4-4)
In the same manner as in Example 1-5 except that Compound 3-1 was changed to 6.0 g of Compound 3-4 obtained in Example 4-3, 6.5 g (yield 100%) of Compound 1-4 was obtained. The
 化合物1-4のNMRスペクトル;
 H-NMR(300.4MHz、溶媒:CDCl、基準:TMS) δ(ppm):0.6~0.8(14H)、1.5~1.7(8H)、2.4(2H)、3.6(29H)、4.0(2H)、4.5(2H)、4.8(26H)、6.7~6.9(14H)。
 19F-NMR(282.7MHz、溶媒:CDCl、基準:CFCl) δ(ppm):-81(3F)、-84~-85(28F)、-89~-91(28F)、-114(2F)、-120(26F)、-122(4F)、-123(2F)、-124(2F)、-127(30F)、-145(14F)。
 単位数nの平均値:14、化合物1-4の数平均分子量:4,810。
NMR spectrum of compound 1-4;
1 H-NMR (300.4 MHz, solvent: CDCl 3 , standard: TMS) δ (ppm): 0.6 to 0.8 (14 H), 1.5 to 1.7 (8 H), 2.4 (2 H) ), 3.6 (29 H), 4.0 (2 H), 4.5 (2 H), 4.8 (26 H), 6.7 to 6.9 (14 H).
19 F-NMR (282.7 MHz, solvent: CDCl 3 , standard: CFCl 3 ) δ (ppm): -81 (3F), -84 to -85 (28F), -89 to -91 (28F), -114 (2F), -120 (26F), -122 (4F), -123 (2F), -124 (2F), -127 (30F), -145 (14F).
The average value of the unit number n: 14, the number average molecular weight of the compound 1-4: 4,810.
〔例5〕
 化合物1-5は、以下の手順で合成した。
 化合物X1をメタノールに変更した以外は例1と同様にして、化合物1-5を得た。
 CH(OCFCHFOCFCFCFCHn-1OCFCHFOCFCFCFC(O)NHCHC{CHCHCHSi(OCH  式1-5
[Example 5]
Compounds 1-5 were synthesized by the following procedure.
A compound 1-5 was obtained in the same manner as in Example 1 except that the compound X1 was changed to methanol.
CH 3 (OCF 2 CHFOCF 2 CF 2 CF 2 CH 2 ) n-1 OCF 2 CHFOCF 2 CF 2 CF 2 C (O) NHCH 2 C {CH 2 CH 2 CH 2 Si (OCH 3 ) 3 } 3 Formula 1- 5
 化合物1-5のNMRスペクトル;
 H-NMR(300.4MHz、溶媒:CDCl、基準:TMS) δ(ppm):0.7(6H)、1.3~1.7(12H)、3.4(2H)、3.6(27H)、3.7(3H)、4.8(26H)、6.7~6.9(14H)。
 19F-NMR(282.7MHz、溶媒:CDCl、基準:CFCl) δ(ppm):-84~-85(28F)、-89~-91(28F)、-120(28F)、-126(2F)、-127(26F)、-145(14F)。
 単位数nの平均値:14、化合物1-5の数平均分子量:4,450。
NMR spectrum of compound 1-5;
1 H-NMR (300.4 MHz, solvent: CDCl 3 , standard: TMS) δ (ppm): 0.7 (6 H), 1.3 to 1.7 (12 H), 3.4 (2 H), 3. 6 (27 H), 3.7 (3 H), 4.8 (26 H), 6.7 to 6.9 (14 H).
19 F-NMR (282.7 MHz, solvent: CDCl 3 , standard: CFCl 3 ) δ (ppm): -84 to -85 (28F), -89 to -91 (28F), -120 (28F), -126 (2F), -127 (26F), -145 (14F).
Average value of the unit number n: 14, the number average molecular weight of the compound 1-5: 4,450.
〔例6〕
 化合物X8は、市販品(ワコーケミカル社製)を用いた。
 CFCFCFCFCFCFCHCHSi(OCH  式X8
[Example 6]
As the compound X8, a commercially available product (manufactured by Wako Chemical Co., Ltd.) was used.
CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 Si (OCH 3 ) 3 Formula X 8
〔例7〕
 化合物X9は、特開2014-218639号公報の実施例1に記載の化合物(D)を用いた。
 CFCFCF(OCFCFCF20OCFCFCHOCHCHCHSi{CHCHCHSi(OCH  式X9
〔例8〕
 化合物1-6は、以下の手順で合成した。
Figure JPOXMLDOC01-appb-C000009
(例8-1)
 200mLの3口フラスコにテトラエチレングリコール(TEG)の18.17g、N,N-ジメチルホルムアミド(DMF)の8g、炭酸カリウムの3.61gを加え、窒素雰囲気下60℃で1.5時間撹拌した。その後化合物X10の8.49gを15分かけゆっくり滴下し、そのまま60℃で18時間撹拌した。1N塩酸を酸性になるまで加え撹拌し、その後AK-225(AGC社製)を加えた後2層分離した。有機層を濃縮した後、シリカゲルカラムクロマトグラフィで精製することにより、化合物X11を11.1g(収率61%)で得た。
 H-NMR:6~5.8(2H)、4.2(4H)、3.6~3.8(28H)。
 19F-NMR:-84(2F)、-86(2F)、-90(4F)、-129(2F)、-144(2F)。
(例8-2)
 200mLのナスフラスコに化合物X11の10g、DMFの20mL、炭酸カリウムの7.5gを加え、窒素雰囲気下60℃で1時間撹拌した。その後、アリルブロミドの5gをゆっくり添加し、18時間撹拌した。1N塩酸を酸性になるまで加え撹拌し、その後酢酸エチル:ヘキサンの1:1溶液を加えた後2層分離した。有機層を濃縮した後、シリカゲルカラムクロマトグラフィで精製することにより、化合物3-6を10.1g(収率91%)で得た。
 H-NMR:6.2~5.8(4H)、5.2~5.0(4H)、4.2~4.0(4H)、3.6~3.8(32H)
 19F-NMR:-84(2F)、-86(2F)、-90(4F)、-129(2F)、-144(2F)
(例8-3)
 50mLのナスフラスコに化合物3-6を2.1g、アニリンを0.0047g、AC-6000(AGC社製)を2.1g、Pt/ジビニルテトラメチルジシロキサン錯体を0.0096g、トリメトキシシランの0.93gを加え、室温で一晩撹拌した。その後濃縮し、化合物1-6を2.6g得た。
 H-NMR:6~5.8(2H)、4.0~3.4(54H)、1.6~1.3(4H)、0.5~0.8(4H)
 19F-NMR:-84(2F)、-86(2F)、-90(4F)、-129(2F)、-144(2F)
〔例9〕
 化合物1-7は、以下の手順で合成した。
Figure JPOXMLDOC01-appb-C000010
(例9-1)
 化合物X12は、WO2013/121984の例1-1を参考に合成した。
 200mLの3口フラスコに、化合物X12の10g、エチレングリコールの112g、炭酸カリウムの5.0gを加え、窒素雰囲気下40℃で撹拌した。1N塩酸を酸性になるまで加え撹拌し、次にAE-3000(AGC社製)を加えた後、2層分離した。有機層を濃縮した後、シリカゲルカラムクロマトグラフィで精製することにより、化合物X13を3.3g(収率55%)で得た。
 H-NMR:6.5(1H)、4.1(2H)、3.9(2H)、3.8(2H)。
 19F-NMR:-84(2F)、-86(2F)、-120(2F)、-126(2F)、-144(1F)。
(例9-2)
 還流冷却器を接続した200mLのナスフラスコに、化合物X12の100g、化合物X13の10g、炭酸カリウムの9.2gを加え、窒素雰囲気下、60℃で撹拌した。その後、1N塩酸を酸性になるまで加え撹拌し、次にAE-3000(AGC社製)を加えた後、2層分離した。有機層を濃縮した後、化合物X14を70g(収率64%)で得た。
 H-NMR:6.5(10H)、4.1(20H)、3.9(4H)。
 19F-NMR:-84(20F)、-86(20F)、-120(20F)、-126(20F)、-144(10F)。
 化合物X14の数平均分子量は、3500。
(例9-3)
 200mLのナスフラスコに化合物X14の20g、DMFの50mL、炭酸カリウムの15gを加え、窒素雰囲気下60℃で1時間撹拌した。その後、アリルブロミドの10gをゆっくり添加し撹拌した。1N塩酸を酸性になるまで加え撹拌し、次にAE-3000(AGC社製)を加えた後、2層分離した。有機層を濃縮した後、化合物3-7を18g(収率90%)で得た。
 H-NMR:6.5(10H)、6.1~5.8(2H)、5.2~5.0(4H)、4.2(4H)、4.1(20H)、3.9(4H)。
 19F-NMR:-84(20F)、-86(20F)、-120(20F)、-126(20F)、-144(10F)。
 化合物3-7の数平均分子量は、3600。(例9-4)
 50mLのナスフラスコに化合物3-7を2.1g、アニリンを0.0047g、AC-6000(AGC社製)を2.1g、Pt/ジビニルテトラメチルジシロキサン錯体を0.0096g、トリメトキシシランの0.93gを加え、室温で一晩撹拌した。その後濃縮し、化合物1-7を2.6g得た。
 H-NMR:6.5(10H)、4.2(4H)、4.1(20H)、3.8(4H)、1.6~1.3(4H)、0.5~0.8(4H)。
 19F-NMR:-84(2F)、-86(2F)、-90(4F)、-129(2F)、-144(2F)。
 化合物1-7の数平均分子量は、3800。
[Example 7]
As the compound X9, the compound (D) described in Example 1 of JP-A-2014-218639 was used.
CF 3 CF 2 CF 2 (OCF 2 CF 2 CF 2 ) 20 OCF 2 CF 2 CH 2 OCH 2 CH 2 CH 2 Si {CH 2 CH 2 CH 2 Si (OCH 3 ) 3 } 3 Formula X 9
[Example 8]
Compounds 1-6 were synthesized by the following procedure.
Figure JPOXMLDOC01-appb-C000009
(Example 8-1)
In a 200 mL three-necked flask, 18.17 g of tetraethylene glycol (TEG), 8 g of N, N-dimethylformamide (DMF), and 3.61 g of potassium carbonate were added, and stirred at 60 ° C. for 1.5 hours under a nitrogen atmosphere. . Thereafter, 8.49 g of compound X10 was slowly added dropwise over 15 minutes, and the mixture was stirred at 60 ° C. for 18 hours as it was. 1N hydrochloric acid was added until it became acidic and stirred, then AK-225 (manufactured by AGC) was added, and then two layers were separated. The organic layer was concentrated and then purified by silica gel column chromatography to obtain 11.1 g (yield 61%) of compound X11.
1 H-NMR: 6 to 5.8 (2 H), 4.2 (4 H), 3.6 to 3.8 (28 H).
19 F-NMR: -84 (2F), -86 (2F), -90 (4F), -129 (2F), -144 (2F).
(Example 8-2)
10 g of Compound X11, 20 mL of DMF, and 7.5 g of potassium carbonate were added to a 200 mL eggplant flask, and the mixture was stirred at 60 ° C. for 1 hour under a nitrogen atmosphere. Thereafter, 5 g of allyl bromide was slowly added and stirred for 18 hours. 1N hydrochloric acid was added until it became acidic and stirred, then a 1: 1 solution of ethyl acetate: hexane was added and then two layers were separated. The organic layer was concentrated and then purified by silica gel column chromatography to obtain 10.1 g (yield 91%) of compound 3-6.
1 H-NMR: 6.2 to 5.8 (4 H), 5.2 to 5.0 (4 H), 4.2 to 4.0 (4 H), 3.6 to 3.8 (32 H)
19 F-NMR: -84 (2F), -86 (2F), -90 (4F), -129 (2F), -144 (2F)
(Example 8-3)
In a 50 mL eggplant flask, 2.1 g of compound 3-6, 0.0047 g of aniline, 2.1 g of AC-6000 (manufactured by AGC), 0.0096 g of Pt / divinyltetramethyldisiloxane complex, trimethoxysilane 0.93 g was added and stirred overnight at room temperature. After concentration, 2.6 g of compound 1-6 was obtained.
1 H-NMR: 6 to 5.8 (2 H), 4.0 to 3.4 (54 H), 1.6 to 1.3 (4 H), 0.5 to 0.8 (4 H)
19 F-NMR: -84 (2F), -86 (2F), -90 (4F), -129 (2F), -144 (2F)
[Example 9]
Compound 1-7 was synthesized by the following procedure.
Figure JPOXMLDOC01-appb-C000010
(Example 9-1)
Compound X12 was synthesized with reference to Example 1-1 of WO2013 / 121984.
In a 200 mL three-necked flask, 10 g of Compound X12, 112 g of ethylene glycol, and 5.0 g of potassium carbonate were added, and the mixture was stirred at 40 ° C. under a nitrogen atmosphere. The reaction solution was added with 1 N hydrochloric acid until it became acidic and stirred, then AE-3000 (manufactured by AGC) was added, and then two layers were separated. The organic layer was concentrated and then purified by silica gel column chromatography to obtain 3.3 g (yield 55%) of compound X13.
1 H-NMR: 6.5 ( 1 H), 4.1 (2 H), 3.9 (2 H), 3.8 (2 H).
19 F-NMR: -84 (2F), -86 (2F), -120 (2F), -126 (2F), -144 (1F).
(Example 9-2)
100 g of Compound X12, 10 g of Compound X13, and 9.2 g of potassium carbonate were added to a 200 mL eggplant flask connected to a reflux condenser, and the mixture was stirred at 60 ° C. under a nitrogen atmosphere. Thereafter, 1 N hydrochloric acid was added until it became acidic and stirred, then AE-3000 (manufactured by AGC) was added, and then two layers were separated. After concentration of the organic layer, 70 g (yield 64%) of compound X14 was obtained.
1 H-NMR: 6.5 ( 10 H), 4.1 (20 H), 3.9 (4 H).
19 F-NMR: -84 (20F), -86 (20F), -120 (20F), -126 (20F), -144 (10F).
The number average molecular weight of the compound X14 is 3500.
(Example 9-3)
In a 200 mL recovery flask, 20 g of Compound X14, 50 mL of DMF, and 15 g of potassium carbonate were added, and the mixture was stirred at 60 ° C. for 1 hour under a nitrogen atmosphere. Thereafter, 10 g of allyl bromide was slowly added and stirred. The reaction solution was added with 1 N hydrochloric acid until it became acidic and stirred, then AE-3000 (manufactured by AGC) was added, and then two layers were separated. The organic layer was concentrated to give 18 g (yield 90%) of compound 3-7.
1 H-NMR: 6.5 ( 10 H), 6.1-5.8 (2 H), 5.2-5.0 (4 H), 4.2 (4 H), 4.1 (20 H), 3. 9 (4H).
19 F-NMR: -84 (20F), -86 (20F), -120 (20F), -126 (20F), -144 (10F).
The number average molecular weight of compound 3-7 is 3600. (Example 9-4)
In a 50 mL eggplant flask, 2.1 g of compound 3-7, 0.0047 g of aniline, 2.1 g of AC-6000 (manufactured by AGC), 0.0096 g of Pt / divinyltetramethyldisiloxane complex, trimethoxysilane 0.93 g was added and stirred overnight at room temperature. After concentration, 2.6 g of compound 1-7 was obtained.
1 H-NMR: 6.5 ( 10 H), 4.2 (4 H), 4.1 (20 H), 3.8 (4 H), 1.6 to 1.3 (4 H), 0.5 to 0. 8 (4H).
19 F-NMR: -84 (2F), -86 (2F), -90 (4F), -129 (2F), -144 (2F).
The number average molecular weight of compound 1-7 is 3800.
〔評価サンプルの作製〕
 各例によって得られた化合物を用いて、以下のウェットコーティング法にて基材の表面処理を行い、基材(化学強化ガラス)の表面に表面層が形成されてなる評価サンプルを得た。ただし、化合物X9は溶解性が不充分であったため、評価サンプルを作成しなかった。
 得られた評価サンプルを用いて、上述の評価試験を実施し、結果を表6に示す。
[Preparation of evaluation sample]
The surface treatment of the substrate was performed by the following wet coating method using the compound obtained in each example, to obtain an evaluation sample in which a surface layer was formed on the surface of the substrate (chemically strengthened glass). However, since the compound X9 had insufficient solubility, an evaluation sample was not prepared.
The evaluation test described above was performed using the obtained evaluation sample, and the results are shown in Table 6.
 各例によって得られた化合物と、アセトンとを混合して、化合物の濃度が0.05質量%であるウェットコーティング用の組成物を得た。
 各組成物に基材をディッピングし、30分間放置後、基材を引き上げた(ディップコート法)。塗膜を200℃で30分間乾燥させ、AK-225にて洗浄することによって、基材の表面に表面層を有する評価サンプル(物品)を得た。
The compound obtained according to each example and acetone were mixed to obtain a composition for wet coating having a concentration of the compound of 0.05% by mass.
The substrate was dipped in each composition and left for 30 minutes, and then the substrate was pulled up (dip coating method). The coated film was dried at 200 ° C. for 30 minutes and washed with AK-225 to obtain an evaluation sample (article) having a surface layer on the surface of the substrate.
Figure JPOXMLDOC01-appb-T000011
Figure JPOXMLDOC01-appb-T000011
 表6の通り、特定化合物は、非フッ素系有機溶媒に対する溶解性に優れ、これを用いて形成された表面層の耐摩擦性にも優れることを確認した(例1~5、8、9)。 As shown in Table 6, it was confirmed that the specific compound is excellent in the solubility in the non-fluorinated organic solvent, and is also excellent in the abrasion resistance of the surface layer formed using this (Examples 1 to 5, 8, 9) .
 本発明の含フッ素エーテル化合物は、撥水撥油性の付与が求められている各種の用途に用いることができる。たとえば、タッチパネル等の表示入力装置のコート、透明なガラス製または透明なプラスチック製部材の表面保護コート、キッチン用防汚コート、電子機器、熱交換器、電池等の撥水防湿コートや防汚コート、トイレタリー用防汚コート、導通しながら撥液が必要な部材へのコート、熱交換機の撥水・防水・滑水コート、振動ふるいやシリンダ内部等の表面低摩擦コート等に用いることができる。より具体的な使用例としては、ディスプレイの前面保護板、反射防止板、偏光板、アンチグレア板、あるいはそれらの表面に反射防止膜処理を施したもの、携帯電話(たとえば、スマートフォン)、携帯情報端末、ゲーム機、リモコン等の機器のタッチパネルシートやタッチパネルディスプレイ等の人の指または手のひらで画面上の操作を行う表示入力装置を有する各種機器のコート(たとえば、表示部等に使用するガラスまたはフィルムに対するコート、ならびに、表示部以外の外装部分に使用するガラスまたはフィルムに対するコート)、トイレ、風呂、洗面所、キッチン等の水周りの装飾建材のコート、配線板用防水コーティング、熱交換機の撥水・防水・滑水コート、太陽電池の撥水コート、プリント配線板の防水・撥水コート、電子機器筐体や電子部品用の防水・撥水コート、送電線の絶縁性向上コート、各種フィルタの防水・撥水コート、電波吸収材や吸音材の防水性コート、風呂、厨房機器、トイレタリー用防汚コート、振動ふるいやシリンダ内部等の表面低摩擦コート、機械部品、真空機器部品、ベアリング部品、自動車部品、工具等の表面保護コート等が挙げられる。
 なお、2017年09月05日に出願された日本特許出願2017-170085号の明細書、特許請求の範囲および要約書の全内容をここに引用し、本発明の明細書の開示として、取り入れるものである。
The fluorine-containing ether compound of the present invention can be used in various applications where it is required to impart water and oil repellency. For example, a coat of a display input device such as a touch panel, a surface protection coat of a transparent glass or transparent plastic member, an antifouling coat for a kitchen, a water repellent moistureproof coat or an antifouling coat such as an electronic device, a heat exchanger, or a battery It can be used as an antifouling coat for toiletries, a coat on a member that needs to be liquid repellent while conducting, a water repellent / waterproof / sliding water coat of a heat exchanger, a surface low friction coat such as a vibrating screen or the inside of a cylinder. As a more specific example of use, a front face protection plate of a display, an anti-reflection plate, a polarizing plate, an anti-glare plate, or those subjected to anti-reflection film treatment on their surface, a mobile phone (for example, a smartphone), a portable information terminal , Touch panels of devices such as game consoles, remote controls, etc. Coats of various devices having display / input devices that perform operations on the screen with human fingers or palm such as touch panels (for example, for glass or film used for display Coats and coats for glass or film used on exterior parts other than display parts), coats of decorative building materials around water such as toilets, baths, washrooms and kitchens, waterproof coatings for wiring boards, water repellency of heat exchangers Waterproof / slippery coat, water repellent coat of solar cell, waterproof / water repellent coat of printed wiring board, electricity Waterproof and water repellent coating for equipment casings and electronic parts, Coating for improving insulation of power transmission line, Waterproof and water repellent coating for various filters, Waterproof coating for radio wave absorbing material and sound absorbing material, Bath, kitchen equipment, protection for toiletries Examples thereof include dirt coats, low friction coats such as vibrating sieves and the inside of cylinders, machine parts, vacuum equipment parts, bearing parts, automobile parts, surface protection coats such as tools, and the like.
The entire contents of the specification, claims and abstract of Japanese Patent Application No. 2017-170085 filed on Sep. 05, 2017 are incorporated herein by reference and incorporated as disclosure of the specification of the present invention. It is.

Claims (13)

  1.  式A1で表されるオキシフルオロアルキレン単位を含むポリ(オキシフルオロアルキレン)鎖と、式Bで表される基を2個以上有することを特徴とする含フッ素エーテル化合物。
     (OX)  式A1
     -Si(R)3-n  式B
     ただし、式中、
     Xは、1個以上の水素原子を有するフルオロアルキレン基である。
     Rは、1価の炭化水素基である。
     Lは、加水分解性基または水酸基である。
     nは、0~2の整数である。
    A fluorine-containing ether compound having a poly (oxyfluoroalkylene) chain containing an oxyfluoroalkylene unit represented by the formula A1 and two or more groups represented by the formula B.
    (OX 1 ) Formula A1
    -Si (R) n L 3-n formula B
    However, in the formula
    X 1 is a fluoroalkylene group having one or more hydrogen atoms.
    R is a monovalent hydrocarbon group.
    L is a hydrolyzable group or a hydroxyl group.
    n is an integer of 0 to 2.
  2.  前記オキシフルオロアルキレン単位の炭素数が2~6である、請求項1に記載の含フッ素エーテル化合物。 The fluorine-containing ether compound according to claim 1, wherein the oxyfluoroalkylene unit has 2 to 6 carbon atoms.
  3.  ポリ(オキシフルオロアルキレン)鎖中に含まれる前記オキシフルオロアルキレン単位の少なくとも一部が炭素数の2のオキシフルオロアルキレン単位である、請求項1または2に記載の含フッ素エーテル化合物。 The fluorine-containing ether compound according to claim 1 or 2, wherein at least a part of the oxyfluoroalkylene units contained in a poly (oxyfluoroalkylene) chain is a carbon number of 2 oxyfluoroalkylene units.
  4.  前記ポリ(オキシフルオロアルキレン)鎖がさらに式A2で表されるオキシペルフルオロアルキレン単位を含む、請求項1~3のいずれか1項に記載の含フッ素エーテル化合物。
     (OX)  式A2
     ただし、式中、
     Xは、ペルフルオロアルキレン基である。
    The fluorine-containing ether compound according to any one of claims 1 to 3, wherein the poly (oxyfluoroalkylene) chain further contains an oxyperfluoroalkylene unit represented by Formula A2.
    (OX 2 ) Formula A2
    However, in the formula
    X 2 is a perfluoroalkylene group.
  5.  前記オキシペルフルオロアルキレン単位の炭素数が1~6である、請求項4に記載の含フッ素エーテル化合物。 5. The fluorine-containing ether compound according to claim 4, wherein the oxyperfluoroalkylene unit has 1 to 6 carbon atoms.
  6.  前記ポリ(オキシフルオロアルキレン)鎖が、前記式A1で表されるオキシフルオロアルキレン単位のa個と前記式A2で表されるオキシペルフルオロアルキレン単位のb個とを含み、aは2以上の整数であり、bは0以上の整数であり、a+bが8以上である、請求項1~5のいずれか1項に記載の含フッ素エーテル化合物。 The poly (oxyfluoroalkylene) chain includes a number of oxyfluoroalkylene units represented by the formula A1 and b number of oxyperfluoroalkylene units represented by the formula A2, and a is an integer of 2 or more The fluorine-containing ether compound according to any one of claims 1 to 5, wherein b is an integer of 0 or more and a + b is 8 or more.
  7.  下記式1で表される化合物である、請求項1~6のいずれか1項に記載の含フッ素エーテル化合物。
     R-[(OX(OX]-Y-Z(R(Rr-q  式1
     ただし、式中、
     Rは、フッ素原子を有していてもよいアルキル基、または、-Y-Z(R(Rr-qである。
     Xは、1個以上の水素原子を有するフルオロアルキレン基である。
     Xは、ペルフルオロアルキレン基である。
     Yは、単結合または2価の連結基である。
     Zは、炭素原子、ケイ素原子または窒素原子である。
     Rは、水素原子、水酸基またはアルキル基である。
     Rは、-L-Si(R)3-nである。Lは、-O-を有していてもよいアルキレン基である。
     aは2以上の整数であり、bは0以上の整数であり、a+bは8以上の整数である。
     Zが炭素原子またはケイ素原子の場合、rは3であり、qは0~2の整数である。Zが窒素原子の場合、rは2であり、qは0~1の整数である。
    The fluorine-containing ether compound according to any one of claims 1 to 6, which is a compound represented by the following formula 1.
    R 1 -[(OX 1 ) a (OX 2 ) b ]-Y-Z (R 2 ) q (R 3 ) r-q formula 1
    However, in the formula
    R 1 is an alkyl group which may have a fluorine atom, or —YZ (R 2 ) q (R 3 ) rq .
    X 1 is a fluoroalkylene group having one or more hydrogen atoms.
    X 2 is a perfluoroalkylene group.
    Y is a single bond or a divalent linking group.
    Z is a carbon atom, a silicon atom or a nitrogen atom.
    R 2 is a hydrogen atom, a hydroxyl group or an alkyl group.
    R 3 is -L 1 -Si (R) n L 3-n . L 1 is an alkylene group which may have —O—.
    a is an integer of 2 or more, b is an integer of 0 or more, and a + b is an integer of 8 or more.
    When Z is a carbon atom or a silicon atom, r is 3 and q is an integer of 0 to 2. When Z is a nitrogen atom, r is 2 and q is an integer of 0 to 1.
  8.  前記Zが炭素原子またはケイ素原子であり、前記qが0または1である、請求項7に記載の含フッ素エーテル化合物。 The fluorine-containing ether compound according to claim 7, wherein Z is a carbon atom or a silicon atom, and q is 0 or 1.
  9.  請求項1~8のいずれか1項に記載の含フッ素エーテル化合物と、液状媒体とを含むことを特徴とする組成物。 A composition comprising the fluorine-containing ether compound according to any one of claims 1 to 8 and a liquid medium.
  10.  基材と、前記基材上に、請求項1~8のいずれか1項に記載の含フッ素エーテル化合物または請求項9に記載の組成物から形成されてなる表面層と、を有することを特徴とする物品。 A substrate, and a surface layer formed of the fluorine-containing ether compound according to any one of claims 1 to 8 or the composition according to claim 9 on the substrate. Article to be.
  11.  請求項1~8のいずれか1項に記載の含フッ素エーテル化合物を含む表面処理剤。 A surface treatment agent comprising the fluorine-containing ether compound according to any one of claims 1 to 8.
  12.  下記式3で表される含フッ素エーテル化合物。
     R11-[(OX(OX]-Y-Z(R(L-CH=CHr-q  式3
     ただし、式中、
     R11は、フッ素原子を有していてもよいアルキル基、または、-Y-Z(R(L-CH=CHr-qである。
     Xは、1個以上の水素原子を有するフルオロアルキレン基である。
     Xは、ペルフルオロアルキレン基である。
     Yは、単結合または2価の連結基である。
     Zは、炭素原子、ケイ素原子または窒素原子である。
     Rは、水素原子、水酸基またはアルキル基である。
     aは2以上の整数であり、bは0以上の整数であり、a+bは8以上の整数である。
     Lは-O-を有していてもよいアルキレン基、単結合または-O-である。
     Zが炭素原子またはケイ素原子の場合、rは3であり、qは0~2の整数である。Zが窒素原子の場合、rは2であり、qは0~1の整数である。
    The fluorine-containing ether compound represented by following formula 3
    R 11 - [(OX 1) a (OX 2) b] -Y-Z (R 2) q (L 2 -CH = CH 2) r-q Formula 3
    However, in the formula
    R 11 is an alkyl group which may have a fluorine atom, or —Y—Z (R 2 ) q (L 2 —CH = CH 2 ) r—q .
    X 1 is a fluoroalkylene group having one or more hydrogen atoms.
    X 2 is a perfluoroalkylene group.
    Y is a single bond or a divalent linking group.
    Z is a carbon atom, a silicon atom or a nitrogen atom.
    R 2 is a hydrogen atom, a hydroxyl group or an alkyl group.
    a is an integer of 2 or more, b is an integer of 0 or more, and a + b is an integer of 8 or more.
    L 2 is an alkylene group which may have —O—, a single bond or —O—.
    When Z is a carbon atom or a silicon atom, r is 3 and q is an integer of 0 to 2. When Z is a nitrogen atom, r is 2 and q is an integer of 0 to 1.
  13.  式3で表される含フッ素エーテル化合物をHSi(R)3-nとヒドロシリル化反応させることを特徴とする式1で表される含フッ素エーテル化合物の製造方法。
     R-[(OX(OX]-Y-Z(R(Rr-q  式1
     R11-[(OX(OX]-Y-Z(R(L-CH=CHr-q  式3
     ただし、式中、
     Rは、フッ素原子を有していてもよいアルキル基、または、-Y-Z(R(Rr-qである。
     R11は、フッ素原子を有していてもよいアルキル基、または、-Y-Z(R(L-CH=CHr-qである。
     Xは、1個以上の水素原子を有するフルオロアルキレン基である。
     Xは、ペルフルオロアルキレン基である。
     Yは、単結合または2価の連結基である。
     Zは、炭素原子、ケイ素原子または窒素原子である。
     Rは、水素原子、水酸基またはアルキル基である。
     Rは、-L-Si(R)3-nである。
     Lは、-O-を有していてもよいアルキレン基である。
     aは2以上の整数であり、bは0以上の整数であり、a+bは8以上の整数である。
     Lは-O-を有していてもよいアルキレン基、単結合または-O-である。
     Zが炭素原子またはケイ素原子の場合、rは3であり、qは0~2の整数である。Zが窒素原子の場合、rは2であり、qは0~1の整数である。
    A process for producing a fluorine-containing ether compound represented by the formula 1, which comprises a hydrosilylation reaction of the fluorine-containing ether compound represented by the formula 3 with HSi (R) n L 3-n .
    R 1 -[(OX 1 ) a (OX 2 ) b ]-Y-Z (R 2 ) q (R 3 ) r-q formula 1
    R 11 - [(OX 1) a (OX 2) b] -Y-Z (R 2) q (L 2 -CH = CH 2) r-q Formula 3
    However, in the formula
    R 1 is an alkyl group which may have a fluorine atom, or —YZ (R 2 ) q (R 3 ) rq .
    R 11 is an alkyl group which may have a fluorine atom, or —Y—Z (R 2 ) q (L 2 —CH = CH 2 ) r—q .
    X 1 is a fluoroalkylene group having one or more hydrogen atoms.
    X 2 is a perfluoroalkylene group.
    Y is a single bond or a divalent linking group.
    Z is a carbon atom, a silicon atom or a nitrogen atom.
    R 2 is a hydrogen atom, a hydroxyl group or an alkyl group.
    R 3 is -L 1 -Si (R) n L 3-n .
    L 1 is an alkylene group which may have —O—.
    a is an integer of 2 or more, b is an integer of 0 or more, and a + b is an integer of 8 or more.
    L 2 is an alkylene group which may have —O—, a single bond or —O—.
    When Z is a carbon atom or a silicon atom, r is 3 and q is an integer of 0 to 2. When Z is a nitrogen atom, r is 2 and q is an integer of 0 to 1.
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CN114555707B (en) * 2019-09-27 2024-04-23 Agc株式会社 Fluoroether composition, coating liquid, article, method for producing same, and compound
WO2021065537A1 (en) * 2019-09-30 2021-04-08 信越化学工業株式会社 Coating agent composition, surface treatment method and article
JPWO2021065537A1 (en) * 2019-09-30 2021-04-08
JP7384209B2 (en) 2019-09-30 2023-11-21 信越化学工業株式会社 Coating agent composition, surface treatment method and article
WO2021251396A1 (en) * 2020-06-12 2021-12-16 Agc株式会社 Fluoroether compound, production method therefor, compound and production method therefor, fluoroether composition, coating fluid, and article and production method therefor
WO2022004435A1 (en) * 2020-06-30 2022-01-06 Agc株式会社 Fluorine-containing ether compound, curable composition, cured film, element, and display device

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