WO2019189723A1 - Sealing composition - Google Patents

Sealing composition Download PDF

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Publication number
WO2019189723A1
WO2019189723A1 PCT/JP2019/013924 JP2019013924W WO2019189723A1 WO 2019189723 A1 WO2019189723 A1 WO 2019189723A1 JP 2019013924 W JP2019013924 W JP 2019013924W WO 2019189723 A1 WO2019189723 A1 WO 2019189723A1
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WO
WIPO (PCT)
Prior art keywords
group
polyolefin
sealing
rubber
resin
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Application number
PCT/JP2019/013924
Other languages
French (fr)
Japanese (ja)
Inventor
直輝 名取
文弥 戸村
有希 山本
学 増山
賢 大橋
Original Assignee
味の素株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 味の素株式会社 filed Critical 味の素株式会社
Priority to JP2020511067A priority Critical patent/JP7334731B2/en
Priority to KR1020207031243A priority patent/KR20200138344A/en
Priority to CN201980022235.1A priority patent/CN111868162A/en
Publication of WO2019189723A1 publication Critical patent/WO2019189723A1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/56Organo-metallic compounds, i.e. organic compounds containing a metal-to-carbon bond
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80Constructional details
    • H10K59/87Passivation; Containers; Encapsulations
    • H10K59/871Self-supporting sealing arrangements
    • H10K59/8722Peripheral sealing arrangements, e.g. adhesives, sealants
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/18Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/18Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • B32B27/20Layered products comprising a layer of synthetic resin characterised by the use of special additives using fillers, pigments, thixotroping agents
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/32Layered products comprising a layer of synthetic resin comprising polyolefins
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/01Use of inorganic substances as compounding ingredients characterized by their specific function
    • C08K3/013Fillers, pigments or reinforcing additives
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/04Oxygen-containing compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K9/00Use of pretreated ingredients
    • C08K9/04Ingredients treated with organic substances
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L23/00Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L23/00Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers
    • C08L23/02Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C08L23/18Homopolymers or copolymers of hydrocarbons having four or more carbon atoms
    • C08L23/20Homopolymers or copolymers of hydrocarbons having four or more carbon atoms having four to nine carbon atoms
    • C08L23/22Copolymers of isobutene; Butyl rubber ; Homo- or copolymers of other iso-olefins
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L23/00Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers
    • C08L23/26Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers modified by chemical after-treatment
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/10Materials in mouldable or extrudable form for sealing or packing joints or covers
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/02Details
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/02Details
    • H05B33/04Sealing arrangements, e.g. against humidity

Definitions

  • the present invention relates to a sealing composition, and specifically relates to a sealing composition suitable for sealing an electronic element or the like in a flexible electronic device.
  • An organic EL element is a light emitting element using an organic substance as a light emitting material, and has recently attracted attention because it can emit light with high luminance at a low voltage.
  • the organic EL element is extremely weak against moisture, and it is necessary to block the inside of the element from moisture in the outside air. For this reason, an organic EL element is sealed by forming a sealing layer with a composition so as to cover the entire surface of the light emitting layer formed on the substrate.
  • a tackifying resin may be used because it requires good adhesion to the substrate on which the element is formed.
  • Patent Document 1 discloses a composition containing a polyisobutylene resin, a polyisoprene resin having a functional group capable of reacting with an epoxy group and / or a polyisobutylene resin, a tackifier resin, and an epoxy resin.
  • Patent Document 2 discloses a composition containing a styrene-isobutylene-modified resin and a tackifying resin.
  • Patent Document 3 discloses a sealing composition containing a polyolefin-based resin, hydrotalcites and a tackifying resin.
  • flexible and bendable flexible electronic devices have been actively developed.
  • sealing materials used for flexible organic EL devices Has been demanded to have excellent flexibility.
  • a composition using a polyolefin-based rubber or the like is generally excellent in flexibility, and is considered advantageous as a sealing material for a flexible electronic device.
  • an object of the present invention is to provide a sealing composition having excellent adhesiveness and flexibility.
  • a bidentate ligand in which two coordinating atoms are oxygen atoms and a monodentate ligand in which the coordinating atoms are oxygen atoms are central metals.
  • a composition obtained by blending a metal complex having a coordinated structure with a polyolefin resin or polyolefin rubber together with an inorganic filler can be a composition having excellent adhesion and flexibility, and to complete the present invention. It came.
  • a sealing composition comprising the following components (A) to (C).
  • Metal complex bound to central metal [2]
  • (C) The metal complex has the general formula (1):
  • R 1 and R 3 are each independently a hydrogen atom, an alkyl group that may have a substituent, an alkoxy group that may have a substituent, an aryl group that may have a substituent, or Represents an aralkyl group which may have a substituent
  • R 2 has a hydrogen atom, an alkyl group which may have a substituent, an alkoxy group which may have a substituent, an alkoxycarbonyl group which may have a substituent, and a substituent.
  • X represents a monodentate ligand in which the coordination atom is an oxygen atom
  • the solid line between the oxygen atom (O) and M in [] represents a covalent bond
  • the broken line between the oxygen atom (O) and M in [] represents a coordination bond
  • m is an integer of 3 or 4
  • n is an integer of 1 to 3, and m> n .
  • Composition [9] The sealing composition according to any one of [1] to [6], which satisfies at least one of the following (a) to (d):
  • the polyolefin resin includes a polyolefin resin having an acid anhydride group and a polyolefin resin having an epoxy group.
  • the polyolefin rubber includes a polyolefin rubber having an acid anhydride group and a polyolefin rubber having an epoxy group.
  • the polyolefin resin includes a polyolefin resin having an acid anhydride group, and the polyolefin rubber includes a polyolefin rubber having an epoxy group.
  • the polyolefin-based rubber includes a polyolefin-based rubber having an acid anhydride group, and the polyolefin-based resin includes a polyolefin-based resin having an epoxy group.
  • a sealing sheet comprising a support and a layer of the composition according to any one of the above [1] to [8] and [10] formed on the support.
  • An electronic device formed on a plastic substrate is sealed with the sealing composition described in [9] above, and the sealing composition is reacted with an acid anhydride group and an epoxy group.
  • the sealing composition of the present invention has an excellent effect as a sealing material for flexible electronic devices in which the element substrate is a plastic substrate.
  • the sealing composition of the present invention includes, as essential components, (A) a polyolefin-based resin and / or polyolefin-based rubber, (B) an inorganic filler, and (C). It contains a metal complex in which a bidentate ligand in which two coordination atoms are oxygen atoms and a monodentate ligand in which the coordination atoms are oxygen atoms are bonded to a central metal.
  • the composition for sealing of this invention contains polyolefin resin and / or polyolefin rubber (henceforth "(A) component").
  • the polyolefin-based resin and the polyolefin-based rubber can be used without particular limitation as long as each has an olefin-derived skeleton.
  • "olefin” here means a monoolefin and / or a diolefin.
  • Preferred monoolefins include ⁇ -olefins such as ethylene, propylene, 1-butene, isobutylene (isobutene), 1-pentene, 1-hexene, 1-heptene, 1-octene, and the like.
  • ⁇ -olefins such as ethylene, propylene, 1-butene, isobutylene (isobutene), 1-pentene, 1-hexene, 1-heptene, 1-octene, and the like.
  • 1,3-butadiene, isoprene, 1,3-pentadiene, 2,3-dimethylbutadiene and the like are mentioned.
  • Each monoolefin and diolefin may be one kind or two or more kinds.
  • the component (A) may be one kind of polymer or a mixture of two or more kinds of polymers, for example, one kind of polyolefin resin, one kind of polyolefin rubber, two or more kinds of polyolefin resin. And a mixture of two or more polyolefin rubbers, a mixture of one or more polyolefin resins and one or more polyolefin rubbers, and the like.
  • the polyolefin resin may be a homopolymer, a random copolymer, or a block copolymer.
  • the copolymer may be (i) a copolymer of two or more monoolefins, (ii) a copolymer of monoolefins and diolefins, or (iii) a monoolefin and an unsaturated carboxylic acid ester (for example, And copolymers with ethylenically unsaturated compounds (excluding diene monomers) other than olefins such as methyl methacrylate and aromatic vinyl (for example, styrene).
  • the polyolefin resin is preferably a polyisobutylene resin or a polypropylene resin.
  • polyisobutylene resin refers to a resin whose main unit (maximum content unit) among all olefin monomer units constituting the polymer is isobutylene
  • polypropylene resin refers to a polymer. This refers to a resin in which the main unit (maximum content unit) of all the olefin monomer units is propylene.
  • examples of monomer units other than isobutylene include 1-butene and styrene.
  • examples of monomer units other than propylene include ethylene, 1-butene, and isoprene.
  • the polyolefin-based resin is an acid anhydride group (that is, a carbonyloxycarbonyl group (—CO—O—) from the viewpoint of further improving the adhesiveness of the sealing composition to an object to be sealed, the adhesive wet heat resistance of the composition, and the like. It may include a polyolefin resin having CO-)) and / or a polyolefin resin having an epoxy group.
  • the acid anhydride group include a group derived from succinic anhydride, a group derived from maleic anhydride, a group derived from glutaric anhydride, and the like.
  • the acid anhydride group can have one type or two or more types.
  • the polyolefin resin having an acid anhydride group can be obtained, for example, by an unsaturated compound having an acid anhydride group and graft-modifying the polyolefin resin under radical reaction conditions. Moreover, you may make it carry out radical copolymerization of the unsaturated compound which has an acid anhydride group with an olefin.
  • the polyolefin resin having an epoxy group is an unsaturated compound having an epoxy group such as glycidyl (meth) acrylate, 4-hydroxybutyl acrylate glycidyl ether, allyl glycidyl ether, etc. It can be obtained by graft modification with Moreover, you may make it carry out radical copolymerization of the unsaturated compound which has an epoxy group with an olefin.
  • the polyolefin resin having an acid anhydride group is preferably a polyisobutylene resin having an acid anhydride group or a polypropylene resin having an acid anhydride group.
  • the polyolefin resin having an epoxy group is preferably a polyisobutylene resin having an epoxy group or a polypropylene resin having an epoxy group.
  • the concentration of the acid anhydride group in the resin is preferably 0.05 to 10 mmol / g, more preferably 0.1 to 5 mmol / g.
  • the concentration of the acid anhydride group is obtained from the value of the acid value defined as the number of mg of potassium hydroxide necessary to neutralize the acid present in 1 g of resin according to the description of JIS K 2501.
  • the concentration of the epoxy group in the resin is preferably 0.05 to 10 mmol / g, more preferably 0.1 to 5 mmol / g.
  • the epoxy group concentration is determined from the epoxy equivalent obtained based on JIS K 7236-1995.
  • polyolefin rubber examples include butyl rubber (IIR) (rubber-like copolymer of isobutylene and isoprene), isoprene rubber (IR), butadiene rubber (BR), and rubbery copolymer of carboxylated styrene and butadiene. Examples thereof include a combination (XSBR), a chlorinated isobutylene and isoprene rubbery copolymer (CIIR), a brominated isobutylene and isoprene rubbery copolymer (BIIR), and the like. These can use 1 type (s) or 2 or more types. Of these, butyl rubber, isoprene rubber and butadiene rubber are preferable, and butyl rubber is more preferable.
  • IIR butyl rubber
  • IR isoprene rubber
  • BR butadiene rubber
  • BIIR brominated isobutylene and isoprene rubbery copolymer
  • Polyolefin rubber is an acid anhydride group (that is, a carbonyloxycarbonyl group (—CO—O—) from the viewpoint of further improving the adhesiveness of the sealing composition to a sealing target, the adhesive heat and heat resistance of the composition, and the like.
  • a polyolefin rubber having CO-)) and / or a polyolefin rubber having an epoxy group may be included.
  • the acid anhydride group include a group derived from succinic anhydride, a group derived from maleic anhydride, a group derived from glutaric anhydride, and the like.
  • the acid anhydride group can have one type or two or more types.
  • the polyolefin rubber having an acid anhydride group can be obtained, for example, by an unsaturated compound having an acid anhydride group and graft-modifying the polyolefin rubber under radical reaction conditions. Moreover, you may make it carry out radical copolymerization of the unsaturated compound which has an acid anhydride group with an olefin.
  • an epoxy group-containing polyolefin rubber is an unsaturated compound having an epoxy group such as glycidyl (meth) acrylate, 4-hydroxybutyl acrylate glycidyl ether, allyl glycidyl ether, etc. It can be obtained by graft modification with Moreover, you may make it carry out radical copolymerization of the unsaturated compound which has an epoxy group with an olefin.
  • the polyolefin rubber having an acid anhydride group is preferably a butyl rubber having an acid anhydride group, an isoprene rubber having an acid anhydride group, or a butadiene rubber having an acid anhydride group, particularly preferably having an acid anhydride group.
  • the polyolefin-based rubber having an epoxy group is preferably a butyl rubber having an epoxy group, an isoprene rubber having an epoxy group, or a butadiene rubber having an epoxy group, and particularly preferably a butyl rubber having an epoxy group.
  • the concentration of the acid anhydride group in the rubber is preferably 0.05 to 10 mmol / g, more preferably 0.1 to 5 mmol / g.
  • the concentration of the acid anhydride group is obtained from the value of the acid value defined as the number of mg of potassium hydroxide necessary to neutralize the acid present in 1 g of rubber according to the description of JIS K 2501.
  • the concentration of the epoxy group in the rubber is preferably 0.05 to 10 mmol / g, more preferably 0.1 to 5 mmol / g.
  • the epoxy group concentration is determined from the epoxy equivalent obtained based on JIS K 7236-1995.
  • a preferred embodiment of the present invention is that the component (A) is a polymer (resin and / or rubber) having a polyisobutylene skeleton.
  • the proportion of the polyisobutylene skeleton is preferably 50 to 100% by mass, more preferably 60 to 100% by mass, based on the total component (A).
  • the component (A) includes a polyolefin resin having an acid anhydride group and / or a polyolefin rubber having an acid anhydride group
  • the polyolefin type having an acid anhydride group per the entire component (A)
  • the amount of the polyolefin rubber having a resin and / or an acid anhydride group is preferably 1 to 70% by mass, more preferably 10 to 50% by mass.
  • the component (A) includes a polyolefin resin having an epoxy group and / or a polyolefin rubber having an epoxy group
  • the amount of the polyolefin-based rubber having is preferably 1 to 70% by mass, more preferably 10 to 50% by mass.
  • the component (A) is preferably an embodiment satisfying at least one of the following (a) to (d) from the viewpoint of further improving the moisture resistance and the like of the sealing composition.
  • the polyolefin resin includes a polyolefin resin having an acid anhydride group and a polyolefin resin having an epoxy group.
  • the polyolefin rubber includes a polyolefin rubber having an acid anhydride group and a polyolefin rubber having an epoxy group.
  • the polyolefin resin includes a polyolefin resin having an acid anhydride group, and the polyolefin rubber includes a polyolefin rubber having an epoxy group.
  • the polyolefin-based rubber includes a polyolefin-based rubber having an acid anhydride group, and the polyolefin-based resin includes a polyolefin-based resin having an epoxy group.
  • Such component (A) can form a crosslinked structure by reacting an acid anhydride group and an epoxy group by heating. For this reason, the composition of this invention can form the sealing layer which moisture-proof resistance etc. improved further.
  • formation of a crosslinked structure can also be performed after sealing with a composition (that is, after formation of a sealing layer), for example, a device to be sealed includes an element that is vulnerable to heat, such as an organic EL element. It is desirable to form a crosslinked structure in the composition layer formed on the substrate at the time of producing the sealing sheet.
  • the ratio of the polyolefin resin having an acid anhydride group and / or the polyolefin rubber having an acid anhydride group and the polyolefin resin having an epoxy group and / or the polyolefin rubber having an epoxy group has an appropriate crosslinked structure.
  • the molar ratio of epoxy group to acid anhydride group is preferably 100: 10 to 100: 200, more preferably 100: 50 to 100: 150, Particularly preferred is 100: 90 to 100: 110.
  • a particularly preferred embodiment of the component (A) is (i) butyl rubber, (ii) a mixture of butyl rubber having an acid anhydride group and butyl rubber having an epoxy group, or (iii) butyl rubber, acid anhydride. A mixture of butyl rubber having groups and butyl rubber having epoxy groups.
  • the number average molecular weight of the component (A) is not particularly limited, but from the viewpoint of providing good coatability of the varnish of the sealing composition and good compatibility with other components in the composition, It is preferably at most 000,000, more preferably at most 750,000, even more preferably at most 500,000, further preferably at most 400,000. On the other hand, from the viewpoint of preventing repelling at the time of coating the varnish of the sealing composition, expressing moisture resistance of the sealing composition layer to be formed, and improving mechanical strength, 2,000 or more Preferably, 10,000 or more is more preferable, 30,000 or more is even more preferable, and 50,000 or more is particularly preferable.
  • the number average molecular weight is measured by gel permeation chromatography (GPC) method (polystyrene conversion).
  • the number average molecular weight according to the GPC method is LC-9A / RID-6A manufactured by Shimadzu Corporation as a measuring device, Shodex K-800P / K-804L / K-804L manufactured by Showa Denko KK as a column, and toluene as a mobile phase. And measured at a column temperature of 40 ° C. and calculated using a standard polystyrene calibration curve.
  • the blending ratio of both (polyolefin resin / polyolefin rubber) is preferably 1/99 to 50/50 by mass ratio. 10/90 to 45/55 are more preferable.
  • polypropylene-based resin examples include, for example, “T-YP341” (glycidyl methacrylate-modified propylene-butene random copolymer manufactured by Seiko PMC Co., Ltd., butene unit amount per 100% by mass of propylene unit and butene unit: 29 mass.
  • T-YP279 maleic anhydride-modified propylene-butene random copolymer, total of propylene units and butene units manufactured by Seiko PMC Amount of butene unit per 100% by mass: 36% by mass, acid anhydride group concentration: 0.464 mmol / g, number average molecular weight: 35,000
  • T-YP276 glycidyl methacrylate modified propylene- Butene random copolymer, a total of 10 propylene units and butene units Amount of butene units per mass%: 36 mass%, epoxy group concentration: 0.638 mmol / g, number average molecular weight: 57,000
  • T-YP312 maleic anhydride modified propylene-butene random manufactured by Seiko PMC Copolymer, amount of butene units per 100% by mass of prop
  • polyisobutylene resin examples include, for example, “OPanol B100” manufactured by BASF (polyisobutylene, viscosity average molecular weight: 11,110,000), “N50SF” manufactured by BASF (polyisobutylene, viscosity average molecular weight: 400,000 ) And the like.
  • polyolefin rubber examples include, for example, “065” (butyl rubber) manufactured by JSR, “ER641” manufactured by Starlight PMC (maleic anhydride-modified butyl rubber, acid anhydride group concentration 0.46 mmol / g, number average molecular weight 57, “ER850” (glycidyl methacrylate-modified butyl rubber, epoxy group concentration 0.64 mmol / g, number average molecular weight 110,000) manufactured by Seiko PMC, "IR-307", “IR-310” (isoprene manufactured by Kraton Polymer Co., Ltd.) Rubber, number average molecular weight 2,000,000)), “BR150B” (butadiene rubber, number average molecular weight 500,000) manufactured by Ube Industries, Ltd., and the like.
  • the content of the component (A) in the sealing composition of the present invention is not particularly limited, but brings about good coating properties and compatibility, and from the viewpoint of ensuring good handleability (tack suppression),
  • the content is preferably 90% by mass or less, more preferably 85% by mass or less, still more preferably 82% by mass or less, and further preferably 80% by mass or less, based on the entire nonvolatile content in the composition.
  • the content is preferably 20% by mass or more, more preferably 25% by mass or more, and more preferably 30% by mass or more per non-volatile content in the composition. Further preferred.
  • the sealing composition of the present invention contains an inorganic filler (hereinafter also referred to as “component (B)”) from the viewpoint of moisture permeation resistance and the like.
  • the inorganic filler is not particularly limited, and silica such as nano silica; metal oxides such as magnesium oxide, strontium oxide, aluminum oxide and barium oxide; metal hydroxides such as aluminum hydroxide and magnesium hydroxide; calcium carbonate, Metal carbonates such as magnesium carbonate; metal nitrides such as aluminum nitride and titanium nitride; metal titanates such as barium titanate, strontium titanate, calcium titanate, magnesium titanate and bismuth titanate; barium zirconate and zircon Zirconic acid metal salts such as calcium acid; aluminum borate; mineral fillers such as natural or synthetic clay and organically modified clay. Among these, mineral fillers are preferable.
  • mineral filler as natural or synthetic clay, for example, mica, fluoromica, pyrophyllite, glauconite, vermiculite, sepiolite, Allophone, imogolite, talc, illite, sobokite, svinfordite, kaolinite, dickite, nacrite, nacrite Site (anauxite), sericite (sericite), ladykite (ledikite), montronite (montronite), metahalloy site ( etahalloysite, serpentine clay, chrysotile, antigolite, attapulgite, palgorskite, kibashiro clay, Kibashiro clay Hisingerite, chlorite, montmorillonite, sodium montmorillonite, magnesium montmorillonite, calcium montmoronite, calcium montmorillonite nitrite, bentonite, beidellite, hectorite, sodium hectorite, saponite, sac
  • Organically modified clay means smectite or smectite type clay produced by interacting non-functional clay with one or more organic agents.
  • the type of the organic agent used is generally a neutral or ionic organic compound.
  • neutral organic compounds include monomeric, oligomeric or polymeric compounds of polar compounds such as amides, esters, lactams, nitriles, ureas, carbonates, phosphates, phosphonates, sulfates, sulfonates or nitro compounds.
  • Such a neutral organic compound is inserted between the clay layers through hydrogen bonding without completely replacing the charge-balance ions of the clay.
  • ionic organic compounds include ammonium (primary, secondary, tertiary or quaternary), onium compounds such as phosphonium, sulfonium derivatives, aromatic or aliphatic amines, phosphines and sulfides; and quaternary nitrogen.
  • Cationic surfactants such as onium ions such as quaternary ammonium ions having at least one long chain aliphatic group attached to the atom (eg, octadecyl, myristyl or oleyl).
  • mineral fillers mica, hydrotalcite, and smectite are preferable from the viewpoint of moisture resistance and the like, and smectite and hydrotalcite are more preferable from the viewpoint of easily making the sealing layer formed by the composition of the present invention transparent. Hydrotalcite is particularly preferable.
  • Hydrotalcite that is particularly preferable as the inorganic filler will be described.
  • Hydrotalcite can be classified into unfired hydrotalcite, semi-fired hydrotalcite, and fired hydrotalcite, and semi-fired hydrotalcite is particularly preferable from the viewpoint of transparency and moisture resistance of the composition.
  • Uncalcined hydrotalcite is a metal hydroxide having a layered crystal structure typified by natural hydrotalcite (Mg 6 Al 2 (OH) 16 CO 3 .4H 2 O), for example, It consists of a layer [Mg 1-X Al X (OH) 2 ] X + and a middle layer [(CO 3 ) X / 2 ⁇ mH 2 O] X— which are the basic skeleton.
  • the uncalcined hydrotalcite in the present invention is a concept including a hydrotalcite-like compound such as synthetic hydrotalcite. Examples of the hydrotalcite-like compound include those represented by the following formula (I) and the following formula (II).
  • M 2+ is Mg 2+, a divalent metal ion such as Zn 2+, M 3+ represents a trivalent metal ion such as Al 3+, Fe 3+, A n- is CO 3 2-, Cl Represents an n-valent anion such as ⁇ and NO 3 — , 0 ⁇ x ⁇ 1, 0 ⁇ m ⁇ 1, and n is a positive number.
  • M 2+ is preferably Mg 2+
  • M 3+ is preferably Al 3+
  • a n- is preferably CO 3 2-.
  • M 2+ represents a divalent metal ion such as Mg 2+ or Zn 2+
  • a n ⁇ represents an n-valent anion such as CO 3 2 ⁇ , Cl ⁇ , NO 3 ⁇
  • x is 2 or more.
  • Z is a positive number of 2 or less
  • m is a positive number
  • n is a positive number.
  • M 2+ is preferably Mg 2+, A n-is preferably CO 3 2-.
  • Semi-fired hydrotalcite refers to a metal hydroxide having a layered crystal structure in which the amount of interlayer water is reduced or eliminated, obtained by firing unfired hydrotalcite.
  • the “interlayer water” refers to “H 2 O” described in the composition formula of the unfired natural hydrotalcite and hydrotalcite-like compound described above using a composition formula.
  • calcined hydrotalcite refers to a metal oxide having an amorphous structure obtained by calcining uncalcined hydrotalcite or semi-calcined hydrotalcite, and not only interlayer water but also hydroxyl groups disappeared by condensation dehydration.
  • Unfired hydrotalcite, semi-fired hydrotalcite and fired hydrotalcite can be distinguished by saturated water absorption.
  • the saturated water absorption of the semi-fired hydrotalcite is 1% by weight or more and less than 20% by weight.
  • the saturated water absorption of unfired hydrotalcite is less than 1% by weight, and the saturated water absorption of fired hydrotalcite is 20% by weight or more.
  • saturated water absorption is determined by measuring 1.5 g of uncalcined hydrotalcite, semi-calcined hydrotalcite or calcined hydrotalcite using a balance and measuring the initial mass, and then at 60 ° C. and 90 ° C. under atmospheric pressure.
  • the saturated water absorption rate of the semi-fired hydrotalcite is preferably 3% by mass or more and less than 20% by mass, more preferably 5% by mass or more and less than 20% by mass.
  • unfired hydrotalcite, semi-fired hydrotalcite and fired hydrotalcite can be distinguished by the thermogravimetric reduction rate measured by thermogravimetric analysis.
  • the thermal weight loss rate at 280 ° C. of the semi-calcined hydrotalcite is less than 15% by mass, and the thermal weight reduction rate at 380 ° C. is 12% by mass or more.
  • the thermal weight reduction rate at 280 ° C. of the unfired hydrotalcite is 15% by mass or more, and the thermal weight reduction rate at 380 ° C. of the sintered hydrotalcite is less than 12% by mass.
  • Thermogravimetric analysis was performed using Hitachi High-Tech Science TG / DTA EXSTAR6300, weighing 5 mg of hydrotalcite into an aluminum sample pan, and without opening the lid, in an atmosphere with a nitrogen flow rate of 200 mL / min.
  • the temperature can be increased from 30 ° C. to 550 ° C. at a temperature increase rate of 10 ° C./min.
  • unfired hydrotalcite, semi-fired hydrotalcite and fired hydrotalcite can be distinguished by the peak and relative intensity ratio measured by powder X-ray diffraction.
  • Semi-calcined hydrotalcite shows a peak that is split into two around 8 to 18 ° by powder X-ray diffraction, or a peak having a shoulder due to the synthesis of two peaks.
  • the uncalcined hydrotalcite has only one peak at around 8 to 18 °, or the relative intensity ratio of the diffraction intensity of the peak or shoulder appearing on the low angle side and the peak or shoulder appearing on the high angle side is in the above range. Get out.
  • the calcined hydrotalcite does not have a characteristic peak in the region of 8 ° to 18 °, but has a characteristic peak at 43 °.
  • Powder X-ray diffraction measurement was performed using a powder X-ray diffractometer (Empyrean, manufactured by PANalytical), counter-cathode CuK ⁇ (1.5405 mm), voltage: 45 V, current: 40 mA, sampling width: 0.0260 °, scanning speed: 0 0.0657 ° / s, diffraction angle range (2 ⁇ ): 5.0131 to 79.9711 °.
  • the peak search uses the peak search function of the software attached to the diffractometer. “Minimum significance: 0.50, minimum peak tip: 0.01 °, maximum peak tip: 1.00 °, peak base width: 2 0.000, method: minimum value of second derivative ”.
  • unfired hydrotalcite, semi-fired hydrotalcite, and fired hydrotalcite include the following.
  • DHT-4C manufactured by Kyowa Chemical Industry Co., Ltd.
  • Semi-calcined hydrotalcite (average particle size: 400 nm, BET specific surface area: 15 m 2 / g)
  • DHT-4A-2 manufactured by Kyowa Chemical Industry Co., Ltd.
  • Semi-calcined hydrotalcite (average particle size: 400 nm, BET specific surface area: 13 m 2 / g) KW-2200 (manufactured by Kyowa Chemical Industry Co., Ltd.): calcined hydrotalcite (average particle size: 400 nm, BET specific surface area: 146 m 2 / g)
  • DHT-4A manufactured by Kyowa Chemical Industry Co., Ltd.
  • uncalcined hydrotalcite average particle size: 400 nm, BET specific surface area: 10 m 2 / g
  • the average particle size of the inorganic filler is not particularly limited, but is preferably 25 ⁇ m or less, more preferably 15 ⁇ m or less, even more preferably 10 ⁇ m or less, and even more preferably 5 ⁇ m or less, from the viewpoints of influence on the sealing target and moisture resistance. Is particularly preferable and 1 ⁇ m or less is most preferable. On the other hand, from the viewpoint of the dispersibility of the inorganic filler and the viscosity of the composition, it is preferably 0.001 ⁇ m or more, more preferably 0.01 ⁇ m or more, and further preferably 0.1 ⁇ m or more.
  • the average particle size of the inorganic filler can be measured by a laser diffraction / scattering method based on the Mie scattering theory. Specifically, the particle size distribution of the inorganic filler can be created on a volume basis with a laser diffraction particle size distribution measuring device, and the median diameter can be measured as the average particle diameter.
  • an inorganic filler dispersed in water by ultrasonic waves can be preferably used.
  • LA-500 manufactured by Horiba, Ltd. can be used as a laser diffraction particle size distribution measuring apparatus.
  • the average particle size of hydrotalcite is preferably 1 to 1,000 nm, and more preferably 10 to 800 nm.
  • the average particle size of hydrotalcite is the median diameter of the particle size distribution when the particle size distribution is created on a volume basis by laser diffraction scattering type particle size distribution measurement (JIS Z 8825).
  • BET specific surface area of the hydrotalcite is preferably 1 ⁇ 250m 2 / g, more preferably 5 ⁇ 200m 2 / g.
  • the BET specific surface area of hydrotalcite can be calculated according to the BET method using a BET multipoint method by adsorbing nitrogen gas to the sample surface using a specific surface area measuring device (Macsorb HM Model 1210 Mountec). .
  • the component surface-treated with the surface treatment agent can be used.
  • the surface treatment agent used for the surface treatment for example, higher fatty acids, alkylsilanes, silane coupling agents and the like can be used, and among these, higher fatty acids and alkylsilanes are preferable.
  • One or more surface treatment agents can be used.
  • higher fatty acid examples include higher fatty acids having 18 or more carbon atoms such as stearic acid, montanic acid, myristic acid, and palmitic acid, among which stearic acid is preferable. These may be used alone or in combination of two or more.
  • Alkylsilanes include methyltrimethoxysilane, ethyltrimethoxysilane, hexyltrimethoxysilane, octyltrimethoxysilane, decyltrimethoxysilane, octadecyltrimethoxysilane, dimethyldimethoxysilane, octyltriethoxysilane, n-octadecyldimethyl ( And 3- (trimethoxysilyl) propyl) ammonium chloride. These may be used alone or in combination of two or more.
  • silane coupling agent examples include 3-glycidyloxypropyltrimethoxysilane, 3-glycidyloxypropyltriethoxysilane, 3-glycidyloxypropyl (dimethoxy) methylsilane, and 2- (3,4-epoxycyclohexyl) ethyltrimethoxy.
  • Epoxy silane coupling agents such as silane; mercapto silane coupling agents such as 3-mercaptopropyltrimethoxysilane, 3-mercaptopropyltriethoxysilane, 3-mercaptopropylmethyldimethoxysilane and 11-mercaptoundecyltrimethoxysilane ; 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-aminopropyldimethoxymethylsilane, N-phenyl-3-aminopropyltri Amino-based silane cups such as toxisilane, N-methylaminopropyltrimethoxysilane, N- (2-aminoethyl) -3-aminopropyltrimethoxysilane and N- (2-aminoethyl) -3-aminopropyldimethoxymethylsilane Ringing agents; Ureido silane coupling agents such
  • the surface treatment of the component (B) can be performed, for example, by adding and spraying the surface treatment agent while stirring the untreated component (B) at room temperature with a mixer and stirring for 5 to 60 minutes.
  • a mixer a well-known mixer can be used, for example, blenders, such as V blender, a ribbon blender, and a bubble cone blender, mixers, such as a Henschel mixer and a concrete mixer, a ball mill, a cutter mill, etc. are mentioned.
  • a method of surface treatment by mixing the above-mentioned higher fatty acid, alkylsilanes or silane coupling agent is also possible.
  • the treatment amount of the surface treatment agent varies depending on the type of component (B) or the type of surface treatment agent, but is preferably 1 to 10 parts by mass with respect to 100 parts by mass of component (B).
  • the component (B) can be used alone or in combination of two or more.
  • content of (B) component in a composition is not specifically limited, From the viewpoint of the adhesiveness of the sealing layer formed with a composition, the electronic element of a flexible electronic device, and a plastic substrate, and transparency of a sealing layer Therefore, the content is preferably 60% by mass or less, preferably 55% by mass or less, more preferably 50% by mass or less, and further preferably 45% by mass or less, per 100% by mass of the total nonvolatile content in the composition.
  • the content is preferably 3% by mass or more, more preferably 5% by mass or more, more preferably 10% by mass per 100% by mass of the total nonvolatile content in the composition. The above is more preferable.
  • composition of the present invention comprises (A) component and (B) component, a bidentate ligand in which two coordinating atoms are both oxygen atoms, and a monodentate ligand in which the coordinating atoms are oxygen atoms are central metals. And a metal complex (hereinafter also referred to as “component (C)”).
  • a metal complex is a chemical species in which another atom, molecule, or ion is bonded to a metal atom or ion.
  • a ligand refers to a molecule or ion bonded to a metal atom or ion.
  • An atom directly involved in the bond is called a coordination atom
  • a ligand having two coordination atoms is called a bidentate ligand
  • a ligand having one coordination atom is called a monodentate ligand.
  • Component (C) is a bidentate ligand in which two coordinating atoms are both oxygen atoms (hereinafter also abbreviated as “oxygen / bidentate ligand”) and a monodentate coordination in which the coordinating atoms are oxygen atoms.
  • oxygen / bidentate ligand any metal complex having a structure in which a child (hereinafter also abbreviated as “oxygen / monodentate ligand”) is bonded to the central metal is not particularly limited, and a known metal complex satisfying the structure can be used. .
  • a metal complex in which the central metal is a metal in the second period to the sixth period of the periodic table is preferable, more preferably a metal complex in which the central metal is a metal in the third period to the fifth period, and more preferably, the center
  • the metal is Al, Ti, Mn, Fe, Co, Ni, Cu, Zn, Ge, Zr, In, or Sn, and particularly preferably the central metal is Al (aluminum), Ti (titanium), or It is a metal complex which is Zr (zirconium).
  • oxygen / bidentate ligand examples include compounds represented by the following formula (a).
  • R 1 , R 2 and R 3 have the same meanings as those in formula (1) described later.
  • the compound represented by the formula (a) represents an oxygen / bidentate ligand before coordination with the central metal.
  • the oxygen / bidentate ligand coordinated to the central metal and the oxygen / bidentate ligand before coordinated to the central metal are not particularly distinguished from each other by “oxygen / bidentate”.
  • Specific examples of the compound represented by the formula (a) are synonymous with specific examples of the oxygen / bidentate ligand in the metal complex represented by the following formula (1).
  • oxygen / monodentate ligand examples include alkoxide anion (RO ⁇ ) and carboxylate anion (RCOO ⁇ ).
  • Specific examples of the oxygen / monodentate ligand are also synonymous with specific examples of the oxygen / monodentate ligand in the metal complex represented by the following formula (1).
  • oxygen / monodentate ligands coordinated to the central metal and oxygen / monodentate ligands (alcohol (ROH), carboxylic acid (RCOOH)) before coordination to the central metal are particularly selected. Without distinction, it may be referred to as “oxygen / monodentate ligand”.
  • the number of oxygen / bidentate ligands is 1 or more, preferably 1 or more and 3 or less, more preferably 2.
  • they may be the same ligand or different ligands, but the same ligand is preferred.
  • the number of oxygen / monodentate ligands is 1 or more, preferably 1 or more and 3 or less, more preferably 2 or 3.
  • they may be the same ligand or different ligands, but the same ligand is preferred.
  • the component (C) is more preferably a metal complex represented by the following general formula (1) (hereinafter also referred to as a metal complex of the formula (1)).
  • M is a central metal of the metal complex and represents a metal in the second to sixth periods of the periodic table. Preferably, it is a metal of the third period to the fifth period, more preferably Al, Ti, Mn, Fe, Co, Ni, Cu, Zn, Ge, Zr, In, or Sn, and more preferably Al (aluminum). ), Ti (titanium), or Zr (zirconium).
  • R 1 and R 3 each independently represents a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, or an aralkyl group.
  • R 2 represents a hydrogen atom, an alkyl group, an alkoxy group, an alkoxycarbonyl group, an aryl group, or an aralkyl group.
  • X represents an oxygen / monodentate ligand.
  • the solid line between the oxygen atom (O) and M in [] represents a covalent bond
  • the broken line between the oxygen atom (O) and M in [] represents a coordination bond
  • M is an integer of 3 or 4
  • n is an integer of 1 to 3
  • the alkyl group in R 1 , R 2 , and R 3 may be either linear or branched.
  • the number of carbon atoms of the alkyl group is preferably 1-20, more preferably 1-10, particularly preferably 1-6.
  • Examples of the alkyl group include a methyl group, ethyl group, propyl group, isopropyl group, butyl group, isobutyl group, sec-butyl group, tert-butyl group, pentyl group, isopentyl group, neopentyl group, 1-ethylpropyl group, Examples include hexyl group, isohexyl group, 1,1-dimethylbutyl group, 2,2-dimethylbutyl group, 3,3-dimethylbutyl group, 2-ethylbutyl group and the like.
  • the alkyl group may have a substituent. Examples of the substituent include a halogen atom, a hydroxy group, and an amino group
  • halogen atom examples include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
  • amino group which may have the above substituent include an amino group, a mono- or di-alkylamino group (eg, methylamino group, dimethylamino group, ethylamino group, diethylamino group, propylamino group).
  • Dibutylamino group mono- or di-cycloalkylamino group (eg, cyclopropylamino group, cyclohexylamino group), mono- or di-arylamino group (eg, phenylamino group), mono- or di-aralkyl
  • mono- or di-cycloalkylamino group eg, cyclopropylamino group, cyclohexylamino group
  • mono- or di-arylamino group eg, phenylamino group
  • mono- or di-aralkyl examples include amino groups (eg, benzylamino group, dibenzylamino group), heterocyclic amino groups (eg, pyridylamino group) and the like.
  • the alkoxy group in R 1 , R 2 and R 3 is preferably an alkoxy group having 1 to 6 carbon atoms, such as methoxy, ethoxy, propoxy, isopropoxy, butoxy, isobutoxy, sec-butoxy, tert-butoxy , Pentyloxy, hexyloxy and the like.
  • the alkoxy group may have a substituent.
  • the substituent include a halogen atom, a hydroxy group, and an amino group which may have a substituent. Specific examples of the halogen atom and specific examples of the amino group which may have a substituent are the same as described above.
  • the number of carbon atoms of the aryl group in R 1 , R 2 , and R 3 is preferably 6-18, more preferably 6-14.
  • the aryl group include a phenyl group, a 1-naphthyl group, a 2-naphthyl group, a 1-anthryl group, a 2-anthryl group, and a 9-anthryl group.
  • the aryl group may have a substituent.
  • the substituent include a halogen atom, a hydroxy group, an alkyl group which may have a substituent, an alkenyl group which may have a substituent, an alkynyl group which may have a substituent, The amino group etc. which may have a substituent are mentioned.
  • the above alkenyl group may be either linear or branched.
  • the carbon number of the alkenyl group is preferably 2 to 10, more preferably 2 to 6.
  • ethenyl group ie vinyl group
  • Examples of the substituent that the alkenyl group may have include a halogen atom, a hydroxy group, and an amino group that may have a substituent.
  • Specific examples of the halogen atom and specific examples of the amino group which may have a substituent are the same as described above.
  • the above alkynyl group may be either linear or branched.
  • the carbon number of the alkynyl group is preferably 2 to 10, more preferably 2 to 6.
  • ethynyl group, 1-propynyl group, 2-propynyl group, 1-butynyl group, 2-butynyl group, 3-butynyl group, 1-pentynyl group, 2-pentynyl group, 3-pentynyl group, 4-pentynyl group Examples include 1-hexynyl group, 2-hexynyl group, 3-hexynyl group, 4-hexynyl group, 5-hexynyl group, 4-methyl-2-pentynyl group and the like.
  • Examples of the substituent that the alkynyl group may have include a halogen atom, a hydroxy group, and an amino group that may have a substituent.
  • Specific examples of the halogen atom and specific examples of the amino group which may have a substituent are the same as described above.
  • the number of carbon atoms of the aralkyl group in R 1 , R 2 , and R 3 is preferably 7-16.
  • benzyl group, phenethyl group, naphthylmethyl group, phenylpropyl group and the like can be mentioned.
  • the aralkyl group may have a substituent.
  • the substituent include a halogen atom, a hydroxy group, and an amino group which may have a substituent. Specific examples of the halogen atom and specific examples of the amino group which may have a substituent are the same as described above.
  • the alkoxycarbonyl group in R 2 is preferably an alkoxycarbonyl group having 1 to 6 carbon atoms of alkoxy, for example, methoxycarbonyl, ethoxycarbonyl, propoxycarbonyl, isopropoxycarbonyl, butoxycarbonyl, isobutoxycarbonyl, sec-butoxy Examples include carbonyl, tert-butoxycarbonyl, pentyloxycarbonyl, hexyloxycarbonyl and the like.
  • the alkoxycarbonyl group may have a substituent. Examples of the substituent include a halogen atom, a hydroxy group, and an amino group which may have a substituent.
  • halogen atom are the same as those of the halogen atom that is a substituent of the alkyl group described above, and specific examples of the amino group that may have a substituent include a substituent that is a substituent of the alkyl group described above. It is the same as that of the amino group which may have a group.
  • the oxygen / monodentate ligand represented by X is usually a conjugate base of Bronsted acid, and examples thereof include an alkoxide anion (RO ⁇ ) and a carboxylate anion (RCOO ⁇ ).
  • the organic group R may be either an aliphatic group or an aromatic group.
  • the aliphatic group may be either a saturated aliphatic group or an unsaturated aliphatic group.
  • the carbon number of the organic group R is preferably 1-20, more preferably 1-10, and particularly preferably 1-6.
  • Examples of the alkoxide anion (RO ⁇ ) include methoxide, ethoxide, propoxide, isopropoxide, butoxide, isobutoxide, sec-butoxide, tert-butoxide, pentyl oxide, hexyl oxide and the like.
  • the organic group R may be either an aliphatic group or an aromatic group.
  • the aliphatic group may be either a saturated aliphatic group or an unsaturated aliphatic group.
  • the carbon number of the organic group R is preferably 1-20, more preferably 1-10, and particularly preferably 1-6.
  • Examples of the carboxylate anion (RCOO ⁇ ) include carboxylate anions corresponding to carboxylic acids such as acetic acid, propionic acid and benzoic acid.
  • [] in the formula represents an oxygen / bidentate ligand.
  • the oxygen / bidentate ligand include acetylacetone, 3-methyl-2,4-pentanedione, acetylacetaldehyde, 2,4-hexanedione, 2,4-heptanedione, and 5-methyl-2,4.
  • the oxygen / bidentate ligand has a structure in which one or more protons are removed therefrom.
  • metal complex of the formula (1) examples include the following.
  • metal complexes in which the central metal M is Al (aluminum) include, for example, aluminum alkyl acetoacetate diisopropylate (aluminum 9-octadecynyl aceto-acetate diisopropoxide), aluminum ethyl acetoacetate diisopropylate, aluminum ethyl acetoacetate Examples thereof include di n-butyrate, aluminum propyl acetoacetate diisopropylate, aluminum n-butyl acetoacetate diisopropylate and the like.
  • Examples of metal complexes in which the central metal M is Ti (titanium) include titanium allyl acetoacetate triisopropoxide, titanium di-n-butoxide (bis-2,4-pentanedionate), titanium diisopropoxide bis ( Tetramethylheptanedionate), titanium diisopropoxide bis (ethyl acetoacetate), titanium methylphenoxide, titanium oxide bis (pentanedionate) and the like.
  • Examples of metal complexes in which the central metal M is Zr (zirconium) include, for example, zirconium allyl acetoacetate triisopropoxide, zirconium di-n-butoxide (bis-2,4-pentanedionate), zirconium diisopropoxide ( Bis-2,4-pentanedionate), zirconium diisopropoxide bis (tetramethylheptanedionate), zirconium diisopropoxide bis (ethylacetoacetate), zirconium butoxide (acetylacetate) (bisethylacetoacetate), Examples include zirconium tributoxy monoacetylacetonate.
  • a component can use 1 type (s) or 2 or more types.
  • the content of the component (C) in the composition is not particularly limited, but from the viewpoint of achieving the object of the present invention at a higher level, 0.1 to 5 per 100% by mass of the total nonvolatile content in the composition. % By mass is preferable, and 0.3 to 3% by mass is more preferable. By setting it as 0.1 mass% or more, sufficient surface modification of the inorganic filler is easily achieved, and the intended effect tends to be easily obtained. By setting it as 5 mass% or less, it is derived from the component (C). It tends to be easy to suppress the influence of the outgas on the object to be sealed.
  • the oxygen / monodentate ligand is not bonded to the central metal. Even if it is a metal complex or a metal complex in which an oxygen / monodentate ligand is bonded to the central metal, the metal complex in which the oxygen / bidentate ligand is not bonded to the central metal, the component (A) and (B ) Even if it is blended with the component, a composition having both excellent adhesive properties and excellent flexibility cannot be realized.
  • the metal complex having a structure in which the oxygen / bidentate ligand and the oxygen / monodentate ligand, which are the component (C) of the present invention, are bonded to the central metal is easily hydrolyzed. ⁇ Because it has a monodentate ligand, it is easy to modify the surface of the inorganic filler that is the component (B), and the component (B) is sufficiently dispersed in the polyolefin resin and / or polyolefin rubber of the component (A). Furthermore, when the composition is bonded to the object to be sealed, the oxygen / bidentate ligand chelate exchanges with functional groups on the surface of the object to be sealed, such as glass, plastic, and inorganic film. It is presumed that a strong bond is generated, and as a result, the followability of the composition with respect to deformation such as bending of the object to be sealed is improved, thereby resulting in a composition having excellent adhesiveness and flexibility.
  • a tackifier resin (hereinafter also abbreviated as “component (D)”) ”can be blended in order to enhance the adhesiveness to the sealing target if necessary.
  • component (D) a tackifier resin
  • the resin composition of the present invention can achieve sufficient adhesion without containing a tackifying resin, while the addition of the tackifying resin tends to lower the stability of the resin composition in the high temperature region. is there.
  • the blending amount when blending the tackifier resin is preferably 20% by mass or less, preferably 10% by mass or less, more preferably 9% by mass or less, per 100% by mass of the total nonvolatile content in the composition.
  • % By mass or less is more preferable, 7% by mass or less is further preferable, 6% by mass or less is more preferable, 5% by mass or less is further preferable, 4% by mass or less is further preferable, and 3% by mass or less is further preferable.
  • the following is more preferable, 1% by mass or less is further preferable, and 0% by mass is most preferable.
  • the tackifying resin is not particularly limited, and is a terpene tackifying resin, terpene phenol tackifying resin, rosin tackifying resin, hydrogenated terpene resin, aromatic modified terpene resin, etc., coumarone resin, indene resin, petroleum Resin (aliphatic petroleum resin, hydrogenated alicyclic petroleum resin, aromatic petroleum resin, aliphatic aromatic copolymer petroleum resin, alicyclic petroleum resin, dicyclopentadiene (hereinafter also abbreviated as “DCPD”) Etc.) from the viewpoint of adhesiveness and transparency, dicyclopentadiene petroleum resin, hydrogenated dicyclopentadiene petroleum resin are more preferable, Hydrogenated dicyclopentadiene petroleum resin is particularly preferred.
  • DCPD dicyclopentadiene petroleum resin, hydrogenated dicyclopentadiene petroleum resin
  • Hydrogenated dicyclopentadiene petroleum resin is particularly preferred.
  • the composition of the present invention includes a mineral oil softener, a vegetable oil softener, a sub factice, a fatty acid, a fatty acid salt, a synthetic organic compound, a synthetic oil and the like; Organic fillers such as rubber particles, silicone powder, nylon powder and fluororesin powder; defoamers or leveling agents such as silicon, fluorine and polymer; triazole compounds, thiazole compounds, triazine compounds, porphyrin compounds, etc. Adhesion imparting agents; thickeners such as olben and benton; antioxidants; heat stabilizers; additives such as light stabilizers can be blended.
  • the composition of the present invention may contain a curing agent.
  • the curing agent is not particularly limited, and examples thereof include amine curing agents, guanidine curing agents, imidazole curing agents, phosphonium curing agents, and phenol curing agents.
  • the amine curing agent is not particularly limited, but includes quaternary ammonium salts such as tetramethylammonium bromide and tetrabutylammonium bromide; DBU (1,8-diazabicyclo [5.4.0] undecene-7), DBN ( 1,5-diazabicyclo [4.3.0] nonene-5), DBU-phenol salt, DBU-octylate, DBU-p-toluenesulfonate, DBU-formate, DBU-phenol novolac resin salt, etc.
  • quaternary ammonium salts such as tetramethylammonium bromide and tetrabutylammonium bromide
  • DBU 1,8-diazabicyclo [5.4.0] undecene-7
  • DBN 1,5-diazabicyclo [4.3.0] nonene-5
  • DBU-phenol salt DBU-octylate
  • Diazabicyclo compounds such as benzyldimethylamine, 2- (dimethylaminomethyl) phenol, 2,4,6-tris (diaminomethyl) phenol (TAP) and their salts, aromatic dimethylurea, aliphatic dimethylurea And the like. These may be used alone or in combination of two or more.
  • the guanidine curing agent is not particularly limited, but dicyandiamide, 1-methylguanidine, 1-ethylguanidine, 1-cyclohexylguanidine, 1-phenylguanidine, 1- (o-tolyl) guanidine, dimethylguanidine, diphenylguanidine, Trimethyl guanidine, tetramethyl guanidine, pentamethyl guanidine, 1,5,7-triazabicyclo [4.4.0] dec-5-ene, 7-methyl-1,5,7-triazabicyclo [4.4 .0] dec-5-ene, 1-methyl biguanide, 1-ethyl biguanide, 1-n-butyl biguanide, 1-n-octadecyl biguanide, 1,1-dimethyl biguanide, 1,1-diethyl biguanide, 1-cyclohexyl Biguanide, 1-allyl biguanide, 1-phenyl biguanide 1-(o-to
  • the imidazole curing agent is not particularly limited, but 1H-imidazole, 2-methyl-imidazole, 2-phenyl-4-methylimidazole, 1-cyanoethyl-2-ethyl-4-methyl-imidazole, 2-phenyl-4 , 5-bis (hydroxymethyl) -imidazole, 1-benzyl-2-methylimidazole, 1-benzyl-2-phenylimidazole, 2-ethyl-4-methylimidazole, 2-phenyl-imidazole, 2-dodecyl-imidazole, Examples include 2-heptadecylimidazole and 1,2-dimethyl-imidazole. These may be used alone or in combination of two or more.
  • the phosphonium curing agent is not particularly limited, but is triphenylphosphine, phosphonium borate compound, tetraphenylphosphonium tetraphenylborate, n-butylphosphonium tetraphenylborate, tetrabutylphosphonium decanoate, (4-methylphenyl) triate.
  • Examples thereof include phenylphosphonium thiocyanate, tetraphenylphosphonium thiocyanate, and butyltriphenylphosphonium thiocyanate. These may be used alone or in combination of two or more.
  • the phenolic curing agent is not particularly limited, but is MEH-7700, MEH-7810, MEH-7785 (Maywa Kasei), NHN, CBN, GPH (Nippon Kayaku), SN170, SN180, SN190, SN475, SN485, SN495, SN375, SN395 (manufactured by Tohto Kasei Co., Ltd.), TD2090 (manufactured by DIC), and the like can be mentioned.
  • Specific examples of the triazine skeleton-containing phenolic curing agent include LA3018 (manufactured by DIC).
  • Specific examples of the triazine skeleton-containing phenol novolak curing agent include LA7052, LA7054, LA1356 (manufactured by DIC) and the like. These may be used alone or in combination of two or more.
  • composition layer per 100 mass% of total non volatile matter in a composition, 5 mass% or less is preferable and 1 mass% or less is more preferable. On the other hand, from the viewpoint of suppressing tackiness of the composition, 0.01 mass% or more is preferable and 0.05 mass% or more is more preferable per 100 mass% of the total nonvolatile content in the composition.
  • an organic solvent is blended from the viewpoint of the coating property of the composition when producing a sealing sheet in which a layer of the composition is formed on a support described later.
  • the organic solvent include ketones such as acetone, methyl ethyl ketone (hereinafter abbreviated as “MEK”), cyclohexanone, and acetates such as ethyl acetate, butyl acetate, cellosolve acetate, propylene glycol monomethyl ether acetate, and carbitol acetate.
  • Carbitols such as cellosolve and butyl carbitol, aromatic hydrocarbons such as toluene and xylene, dimethylformamide, dimethylacetamide, N-methylpyrrolidone and the like. Only 1 type may be used for this organic solvent and it may use 2 or more types together.
  • the amount of the organic solvent is not particularly limited, but it is preferable to use an amount that gives a viscosity (25 ° C.) of the composition of 300 to 2000 mPa ⁇ s from the viewpoint of coating properties.
  • the composition of the present invention can be produced by mixing the above-described components (including at least the components (A) to (C)) using a kneading roller, a rotary mixer, or the like. After mixing (B) component and (C) component first, you may mix the other component (Other component containing at least (A) component) with the mixture. Moreover, after mixing (C) component and any other than (B) component, (B) component may be mixed and the remaining component may be mixed after that.
  • the sealing composition of the present invention is formed on a thin plastic substrate (plastic film) such as thin film transistors, LCD elements, LED elements, EL elements (organic EL elements, inorganic EL elements), and solar cells. It is suitable for sealing a flexible electronic device.
  • Thin plastic substrates (plastic films) for flexible electronic devices include, for example, poly (ethylene terephthalate) (PET), poly (butylene terephthalate) (PBT), poly (ethylene naphthalate) (PEN), polycarbonate (PC), Plastic films such as films of polyimide (PI), liquid crystal polymer (LCP), cycloolefin polymer (COP), polysulfone (PSO) and poly (p-phenylene ether sulfone) (PES) are used. The composition exhibits excellent adhesion to these various plastic films.
  • PET poly (ethylene terephthalate)
  • PBT poly (butylene terephthalate)
  • PEN poly (ethylene naphthalate)
  • PC polycarbonate
  • Plastic films such as films of polyimide (PI), liquid crystal polymer (LCP), cycloolefin polymer (COP), polysulfone (PSO) and poly (p-phenylene ether sulfone) (PES) are used.
  • the composition of the present invention is disposed so as to be in contact with the object to be sealed.
  • sealing is performed by laminating a sealing sheet having a composition layer formed on a support so that the composition layer is in contact with an element to be sealed (for example, an element substrate of a flexible electronic device). .
  • ⁇ Sealing sheet> For example, the composition of the present invention, which is formed into a varnish by blending an organic solvent, is applied onto a support, and the resulting coating film is dried by heating or hot air blowing, etc. A sealing sheet which is a sheet on which a layer of the composition is formed is obtained.
  • a polyolefin resin having an acid anhydride group or a polyolefin rubber having an acid anhydride group and a polyolefin resin having an epoxy group or a polyolefin rubber having an acid anhydride group
  • a cross-linked structure is formed to prevent permeation resistance of the composition layer.
  • a sheet for sealing with higher wettability and higher sealing performance (such as the ability to block moisture and oxygen in the air) can be obtained.
  • the support used for the sealing sheet examples include polyolefins such as polyethylene, polypropylene, and polyvinyl chloride, polyethylene terephthalate (hereinafter sometimes referred to as “PET”), polyesters such as polyethylene naphthalate, polycarbonate, polyimide, and the like.
  • PET polyethylene terephthalate
  • the plastic film is mentioned.
  • PET is particularly preferable.
  • the support may be a metal foil such as an aluminum foil, a stainless steel foil, or a copper foil.
  • the support may be subjected to a release treatment in addition to the mat treatment and the corona treatment (hereinafter, the “support subjected to the release treatment” is also referred to as “releasable support”).
  • the release treatment examples include a release treatment with a release agent such as a silicone resin release agent, an alkyd resin release agent, and a fluororesin release agent.
  • a release treatment with a release agent such as a silicone resin release agent, an alkyd resin release agent, and a fluororesin release agent.
  • the release layer is also regarded as a part of the support.
  • the thickness of the support is not particularly limited, but is preferably 20 to 200 ⁇ m, more preferably 20 to 125 ⁇ m, from the viewpoint of handleability and the like.
  • the peelable support is a support that has been subjected to a release treatment on one side on which the layer of the composition of the present invention is formed, and before the sealing sheet is actually used to form a sealing structure.
  • the peelable support is not necessarily moisture-proof, but from the viewpoint of preventing moisture from entering the composition layer during the storage period until the sealing sheet is subjected to sealing, It is preferable to have moisture resistance.
  • a plastic film having a barrier layer may be used as a support (hereinafter, the plastic film having a barrier layer is also referred to as a “moisture-proof support”).
  • the barrier layer examples include nitrides such as silicon nitride, oxides such as aluminum oxide, stainless steel foil, and metal foil of aluminum foil.
  • the plastic film examples include the above-described plastic film.
  • a commercial product may be used as the plastic film having the barrier layer.
  • the moisture-proof support may be a film obtained by laminating a metal foil and a plastic film.
  • commercially available products of polyethylene terephthalate film with aluminum foil include “PET Tsuki AL1N30” manufactured by Tokai Toyo Aluminum Sales Co., “PET Tsuki AL3025” manufactured by Fukuda Metals.
  • what has the multilayer structure of 2 or more layers, for example, what bonded together said plastic film and said metal foil through the adhesive agent can also be used. This is inexpensive and advantageous from the viewpoint of handling properties.
  • the composition layer may be protected by a protective film.
  • a protective film By protecting with a protective film, it is possible to prevent dust from adhering to the surface of the composition layer and scratches.
  • the protective film is preferably a plastic film similar to the support. Further, the protective film may be subjected to a release treatment in addition to the mat treatment and the corona treatment.
  • the thickness of the protective film is not particularly limited, but is usually 1 to 150 ⁇ m, preferably 10 to 100 ⁇ m.
  • the sealing sheet has high moisture resistance by laminating the sealing sheet on the object to be sealed if the supporting body has moisture resistance and a support having high transmittance.
  • a sealing structure can be formed.
  • a support having moisture resistance and high transmittance include a plastic film in which an inorganic substance such as silicon oxide (silica), silicon nitride, SiCN, and amorphous silicon is deposited on the surface.
  • the plastic film include polyolefins such as polyethylene, polypropylene, and polyvinyl chloride, polyesters such as polyethylene terephthalate and polyethylene naphthalate, polycarbonate, and polyimide.
  • PET is particularly preferable.
  • Examples of commercially available moisture-proof plastic films include Tech Barrier HX, AX, LX, L series (Mitsubishi Plastics) and X-BARRIER (Mitsubishi Plastics) with improved moisture resistance. It is done.
  • a support having a multilayer structure of two or more layers may be used.
  • sealing sheet having a peelable support After the sealing sheet is laminated to a sealing target, the support is peeled off, and a separately prepared sealing substrate (a moisture-proof plastic film, Metal foil such as copper foil and aluminum foil) can be laminated.
  • a separately prepared sealing substrate a moisture-proof plastic film, Metal foil such as copper foil and aluminum foil
  • a circularly polarizing plate can be used as the support for the sealing sheet of the present invention.
  • a circularly polarizing plate is composed of a polarizing plate and a quarter wavelength plate.
  • a quarter wavelength plate is generally arrange
  • a moisture-proof support body is arrange
  • the moisture-proof support and the circularly polarizing plate can be bonded with an adhesive or the like, and the adhesive is not particularly limited as long as it is a highly transparent adhesive.
  • an acrylic adhesive, a polyvinyl alcohol adhesive Etc. are used.
  • the circularly polarizing plate can be provided with a protective film for protecting the polarizer (polarizing plate), and a known protective film can also be used.
  • a protective film for protecting the polarizer (polarizing plate) for example, JP-A-2016-105166 and International Mention may be made of the protective film described in the published 2014/003189 pamphlet and the like.
  • the support is preferably composed of at least one selected from a peelable support, a moisture-proof support and a circularly polarizing plate.
  • the flexible electronic device in which an electronic element is sealed with the composition of the present invention is manufactured, it is preferable to perform sealing using the sealing sheet. That is, the flexible electronic device in which the electronic element is sealed is obtained by laminating the sealing sheet of the present invention on a plastic substrate (element substrate) including the electronic element of the flexible electronic device.
  • the sealing composition of the present invention has excellent adhesion to a sealing object and excellent flexibility, it is possible to improve the performance and life of flexible electronic devices.
  • Inorganic filler DHT-4C manufactured by Kyowa Chemical Industry Co., Ltd.: Semi-calcined hydrotalcite (average particle diameter 400 nm, BET specific surface area 15 m 2 / g) MK300 (manufactured by Coop Chemical Co.): mica (average particle size 15 ⁇ m) STN (manufactured by Corp Chemical): Smectite (average particle size 50 nm)
  • ORGATICS TC710 (manufactured by Matsumoto Fine Chemical Co.): titanium diisopropoxybis (ethyl acetoacetate) Ti content 7.1% by mass
  • ORGATICS TC750 (manufactured by Matsumoto Fine Chemical Co.): titanium diisopropoxybis (ethyl acetoacetate) Ti content 11.0% by mass
  • Aluminum complex Aluminum complex
  • Aluminum chelate M Aluminum alkyl acetoacetate diisopropylate
  • E Additive (E-1) Antioxidant Irganox 1010 (manufactured by BASF) (E-2) Curing agent / Amine curing agent (2,4,6-tris (diaminomethyl) phenol, hereinafter abbreviated as “TAP”)
  • Example 1 Add 20 parts of ipsol 100 to 3 parts of butyl rubber (065) and stir for 3 hours. Roll 3 parts of 1 part of aluminum alkyl acetoacetate diisopropylate (aluminum chelate M) and 20 parts of semi-calcined hydrotalcite (DHT-4C). To obtain a mixture. To the obtained mixture, 493 parts of toluene was added to 87 parts of butyl rubber (065), and the total amount of the dissolved product obtained by stirring for 3 hours was added. Further, 1 part of an antioxidant (Irganox 1010) and 9 parts of toluene were blended. The obtained mixture was uniformly dispersed with a high-speed rotary mixer to obtain a varnish (varnish 1) of the composition.
  • an antioxidant Irganox 1010
  • Example 2 Add 20 parts of ipsol 100 to 3 parts of butyl rubber (065) and stir for 3 hours. Roll 3 parts of 1 part of aluminum alkyl acetoacetate diisopropylate (aluminum chelate M) and 20 parts of semi-calcined hydrotalcite (DHT-4C). To obtain a mixture. To the obtained mixture, 226.6 parts of toluene was added to 37 parts of butyl rubber (065) and stirred for 3 hours.
  • aluminum chelate M aluminum alkyl acetoacetate diisopropylate
  • DHT-4C semi-calcined hydrotalcite
  • Example 3 Instead of butyl rubber (065), polyisobutylene (Oppanol N50SF) is used, 20 parts of semi-calcined hydrotalcite (DHT-4C) is made 15 parts, and 1 part of aluminum alkyl acetoacetate diisopropylate (aluminum chelate M) is added. Instead, a varnish (varnish 3) of the composition was obtained in the same manner as varnish 2 (Example 2) except that 1 part of titanium diisopropoxybis (ethylacetoacetate) (TC710) was added.
  • DHT-4C semi-calcined hydrotalcite
  • aluminum chelate M aluminum alkyl acetoacetate diisopropylate
  • Example 4 Instead of 1 part of titanium diisopropoxybis (ethylacetoacetate) (TC710), 1 part of titanium diisopropoxybis (ethylacetoacetate) (TC750) was added and the same procedure as in Varnish 3 (Example 3) A varnish (varnish 4) of the composition was obtained.
  • Example 5 Instead of 1 part of titanium diisopropoxybis (ethyl acetoacetate) (TC710), the same procedure as in varnish 3 (Example 3) except that 2.2 parts of zirconium tributoxy monoacetylacetonate (ZC540) was added, A varnish (varnish 5) of the composition was obtained.
  • Example 6 Add 20 parts of ipsol 100 to 3 parts of butyl rubber (065) and stir for 3 hours. Disperse 1 part of aluminum alkyl acetoacetate diisopropylate (aluminum chelate M) and 20 parts of mica (MK300) with 3 rolls. Got. To the obtained mixture, 493 parts of toluene was added to 87 parts of butyl rubber (065) and all the dissolved product obtained by stirring for 3 hours was added, and the resulting mixture was uniformly dispersed with a high-speed rotary mixer. A varnish (varnish 6) was obtained.
  • Example 7 A varnish (varnish 7) of the composition was obtained in the same manner as varnish 6 (Example 6) except that 20 parts of smectite (STN) was added instead of 20 parts of mica (MK300).
  • STN smectite
  • the sealing sheet was cut to a length of 50 mm and a width of 20 mm, and the cut sealing sheet was made of aluminum having a length of 100 mm and a width of 25 mm using a batch-type vacuum laminator (Nichigo Morton, V-160).
  • the film was laminated on the PET surface of a foil / PET composite film “PET Tsuki AL1N30” (aluminum foil: 30 ⁇ m, PET: 25 ⁇ m, trade name: Toyo Aluminum Sales Co., Ltd.). Lamination was performed under conditions of a temperature of 80 ° C., a time of 300 seconds, and a pressure of 0.3 MPa.
  • the PET film release-treated with the silicone-type release treatment agent of the sealing sheet is peeled off, and a glass plate (length 76 mm, width 26 mm, thickness 1.2 mm, micrometer) is further formed on the exposed composition layer.
  • a glass slide was laminated under the same conditions as above. With respect to the obtained laminate, the adhesive strength (peel strength) to the glass plate surface when peeled at a tensile rate of 300 mm / min in the direction of 180 degrees with respect to the length direction of the aluminum foil / PET composite film is measured. Then, the adhesiveness was evaluated according to the following criteria.
  • Sample A A batch type vacuum laminator (manufactured by Nichigo Morton Co., Ltd.) is used on the inorganic film surface of the barrier film in which the inorganic film (SiO 2 film having a thickness of 500 nm) is formed on the cycloolefin polymer film (thickness: 50 ⁇ m). , V-160) to obtain a film for evaluating flexibility (sample A).
  • Sample B A batch type vacuum laminator (manufactured by Nichigo Morton Co., Ltd.) is used on the inorganic film surface of the barrier film in which the inorganic film (SiO 2 film having a thickness of 500 nm) is formed on the cycloolefin polymer film (thickness: 50 ⁇ m). , V-160) to obtain a laminated film, and a batch-type vacuum laminator (V-160, manufactured by Nichigo Morton Co., Ltd.) is used for the sealing film side of the laminated film and the polyimide film (thickness 25 ⁇ m). Was used as a film for evaluation of flexibility (sample B).
  • Tables 1 and 2 below show the composition of Examples and Comparative Examples and the results of evaluation tests.
  • the sealing composition of the present invention is suitable for sealing electronic elements and the like in flexible electronic devices.

Abstract

Provided is a sealing composition that comprises components (A) to (C): (A) a polyolefin resin and/or a polyolefin rubber; (B) an inorganic filler; and (C) a metal complex wherein a bidentate ligand in which both of the two ligand atoms are oxygen atoms and a monodentate ligand in which the ligand atom is an oxygen atom are bonded to a center metal.

Description

封止用組成物Sealing composition
 本発明は封止用組成物に関し、具体的にはフレキシブル電子デバイスにおける電子素子等の封止等に好適な封止用組成物に関する。 The present invention relates to a sealing composition, and specifically relates to a sealing composition suitable for sealing an electronic element or the like in a flexible electronic device.
 有機EL素子は発光材料に有機物質を使用した発光素子であり、低電圧で高輝度の発光を得ることができるため近年脚光を浴びている。しかしながら、有機EL素子は水分に極めて弱く、素子内部を外気中の水分から遮断することが必要となる。このため、基板上に形成された発光層の全面を覆うように組成物によって封止層を形成して有機EL素子を封止することが行われる。このような封止用組成物には、素子が形成された基板との良好な接着性が必要となるために粘着付与樹脂が使用されることがある。例えば、特許文献1には、ポリイソブチレン樹脂と、エポキシ基と反応し得る官能基を持つポリイソプレン樹脂及び/又はポリイソブチレン樹脂と、粘着付与樹脂と、エポキシ樹脂とを含有する組成物が開示されている。また特許文献2には、スチレン-イソブチレン変性樹脂及び粘着付与樹脂を含有する組成物が開示されている。また、特許文献3には、ポリオレフィン系樹脂、ハイドロタルサイト類及び粘着付与樹脂を含む封止用組成物が開示されている。 An organic EL element is a light emitting element using an organic substance as a light emitting material, and has recently attracted attention because it can emit light with high luminance at a low voltage. However, the organic EL element is extremely weak against moisture, and it is necessary to block the inside of the element from moisture in the outside air. For this reason, an organic EL element is sealed by forming a sealing layer with a composition so as to cover the entire surface of the light emitting layer formed on the substrate. In such a sealing composition, a tackifying resin may be used because it requires good adhesion to the substrate on which the element is formed. For example, Patent Document 1 discloses a composition containing a polyisobutylene resin, a polyisoprene resin having a functional group capable of reacting with an epoxy group and / or a polyisobutylene resin, a tackifier resin, and an epoxy resin. ing. Patent Document 2 discloses a composition containing a styrene-isobutylene-modified resin and a tackifying resin. Patent Document 3 discloses a sealing composition containing a polyolefin-based resin, hydrotalcites and a tackifying resin.
 また、近年では、柔軟で折り曲げ可能なフレキシブル電子デバイス(以下、単に、「フレキシブルデバイス」とも略称する。)の開発が盛んに進められており、例えば、フレキシブル有機ELデバイスに使用する封止材料においては、屈曲性に優れることが求められるようになってきている。一方、ポリオレフィン系ゴム等を使用した組成物は一般に屈曲性にも優れるため、フレキシブル電子デバイス用の封止材料として有利であると考えられる。また、封止材料の耐湿性等の性能を向上させるために無機フィラーの添加が有用であると考えられる。 In recent years, flexible and bendable flexible electronic devices (hereinafter simply referred to as “flexible devices”) have been actively developed. For example, in sealing materials used for flexible organic EL devices. Has been demanded to have excellent flexibility. On the other hand, a composition using a polyolefin-based rubber or the like is generally excellent in flexibility, and is considered advantageous as a sealing material for a flexible electronic device. In addition, it is considered useful to add an inorganic filler in order to improve the performance of the sealing material such as moisture resistance.
国際公開2011/62167号パンフレットInternational publication 2011/62167 pamphlet 国際公開2013/108731号パンフレットInternational Publication No. 2013/108731 Pamphlet 国際公開2017/057708号パンフレットInternational Publication No. 2017/057708 Pamphlet
 しかしながら、本発明者等の検討では、ポリオレフィン系樹脂やポリオレフィン系ゴムを含む組成物に無機フィラーを添加するとフレキシブルデバイスの屈曲性や、電子素子を具備する基板(以下、「素子基板」とも略称する。)と組成物との接着性の低下をもたらす傾向にあることが分かった。従って、本発明の目的は、接着性および屈曲性に優れた封止用組成物を提供することを目的とする。 However, in the study by the present inventors, when an inorganic filler is added to a composition containing a polyolefin resin or polyolefin rubber, the flexibility of the flexible device and the substrate having an electronic element (hereinafter also referred to as “element substrate”). )) And the composition tend to cause a decrease in adhesion. Accordingly, an object of the present invention is to provide a sealing composition having excellent adhesiveness and flexibility.
 本発明者らは、上記課題を解決すべく鋭意検討した結果、2つの配位原子が酸素原子である二座配位子と配位原子が酸素原子である単座配位子とが中心金属に配位した構造の金属錯体を無機フィラーとともにポリオレフィン系樹脂又はポリオレフィン系ゴムに配合して得られる組成物は、接着性及び屈曲性に優れた組成物となり得ることを見出し、本発明を完成するに至った。 As a result of intensive studies to solve the above problems, the present inventors have found that a bidentate ligand in which two coordinating atoms are oxygen atoms and a monodentate ligand in which the coordinating atoms are oxygen atoms are central metals. To find out that a composition obtained by blending a metal complex having a coordinated structure with a polyolefin resin or polyolefin rubber together with an inorganic filler can be a composition having excellent adhesion and flexibility, and to complete the present invention. It came.
 すなわち、本発明は以下の特徴を有する。
[1] 下記(A)~(C)成分を含む、封止用組成物。
 (A)ポリオレフィン系樹脂及び/又はポリオレフィン系ゴム
 (B)無機フィラー
 (C)2つの配位原子がともに酸素原子である二座配位子及び配位原子が酸素原子である単座配位子が中心金属に結合した金属錯体
[2] (C)金属錯体の中心金属がアルミニウム、チタンまたはジルコニウムである、上記[1]記載の封止用組成物。
[3] (C)金属錯体が、一般式(1):
That is, the present invention has the following features.
[1] A sealing composition comprising the following components (A) to (C).
(A) Polyolefin resin and / or polyolefin rubber (B) Inorganic filler (C) A bidentate ligand in which two coordination atoms are both oxygen atoms and a monodentate ligand in which the coordination atoms are oxygen atoms Metal complex bound to central metal [2] (C) The sealing composition according to the above [1], wherein the central metal of the metal complex is aluminum, titanium, or zirconium.
[3] (C) The metal complex has the general formula (1):
Figure JPOXMLDOC01-appb-C000002
Figure JPOXMLDOC01-appb-C000002
(式中、
 Mは周期表の第2周期から第6周期の金属を表し、
 R及びRはそれぞれ独立に、水素原子、置換基を有していてもよいアルキル基、置換基を有していてもよいアルコキシ基、置換基を有していてもよいアリール基、又は置換基を有していてもよいアラルキル基を表し、
 Rは水素原子、置換基を有していてもよいアルキル基、置換基を有していてもよいアルコキシ基、置換基を有していてもよいアルコキシカルボニル基、置換基を有していてもよいアリール基、又は置換基を有していてもよいアラルキル基を表し、
 Xは配位原子が酸素原子である単座配位子を表し、
 [ ]内の酸素原子(O)とMとの間の実線は共有結合を表し、
 [ ]内の酸素原子(O)とMとの間の破線は配位結合を表し、並びに
 mは3または4の整数であり、nは1~3の整数であり、及びm>nである。)
で表される金属錯体である、上記[1]記載の封止用組成物。
[4] 式(1)中のMがアルミニウム、チタンまたはジルコニウムである、上記[3]記載の封止用組成物。
[5] (B)無機フィラーが(C)金属錯体で表面処理されている、上記[1]~[4]のいずれか一つに記載の封止用組成物。
[6] ポリオレフィン系樹脂及び/又はポリオレフィン系ゴムが、ポリイソブチレン骨格を有するポリマーである、請求項1~5のいずれか一つに記載の封止用組成物。
[7] ポリオレフィン系樹脂が、酸無水物基を有するポリオレフィン系樹脂、及び/又は、エポキシ基を有するポリオレフィン系樹脂を含む、上記[1]~[6]のいずれか一つに記載の封止用組成物。
[8] ポリオレフィン系ゴムが、酸無水物基を有するポリオレフィン系ゴム、及び/又は、エポキシ基を有するポリオレフィン系ゴムを含む、上記[1]~[6]のいずれか一つに記載の封止用組成物。
[9] 下記の(a)~(d)の少なくとも一つを満たす、上記[1]~[6]のいずれか一つに記載の封止用組成物。
 (a)ポリオレフィン系樹脂が酸無水物基を有するポリオレフィン系樹脂及びエポキシ基を有するポリオレフィン系樹脂を含む。
 (b)ポリオレフィン系ゴムが酸無水物基を有するポリオレフィン系ゴム及びエポキシ基を有するポリオレフィン系ゴムを含む。
 (c)ポリオレフィン系樹脂が酸無水物基を有するポリオレフィン系樹脂を含み、ポリオレフィン系ゴムがエポキシ基を有するポリオレフィン系ゴムを含む。
 (d)ポリオレフィン系ゴムが酸無水物基を有するポリオレフィン系ゴムを含み、ポリオレフィン系樹脂がエポキシ基を有するポリオレフィン系樹脂を含む。
[10] さらに、組成物の不揮発成分100質量%に対して10質量%以下の(D)粘着付与樹脂を含む、上記[1]~[9]のいずれか一つに記載の封止用組成物。
[11] フレキシブル電子デバイスの封止用である、上記[1]~[10]のいずれか一つに記載の封止用組成物。
[12] フレキシブル電子デバイスがフレキシブル有機ELデバイスである、上記[11]記載の封止用組成物。
[13] 支持体と、該支持体上に形成された、上記[1]~[8]及び[10]のいずれか一つに記載の組成物の層とを含む、封止用シート。
[14] 支持体と、該支持体上に形成された、上記[9]記載の組成物の層とを含み、組成物の層が、酸無水物基とエポキシ基との反応により形成された架橋構造を有する、封止用シート。
[15] 支持体が、剥離性支持体、防湿性支持体および円偏光板から選ばれる少なくとも一つで構成されている、上記[13]又は[14]記載の封止用シート。
[16] フレキシブル電子デバイスの封止用である、上記[13]~[15]のいずれか一つに記載の封止用シート。
[17] フレキシブル電子デバイスがフレキシブル有機ELデバイスである、上記[16]記載の封止用シート。
[18] プラスチック基板上に形成された電子素子が、上記[1]~[8]及び[10]のいずれか一つに記載の封止用組成物で封止されている、フレキシブル電子デバイス。
[19] プラスチック基板上に形成された電子素子が、上記[9]記載の封止用組成物で封止されており、封止用組成物が、酸無水物基とエポキシ基との反応により形成された架橋構造を有する、フレキシブル電子デバイス。
[20] 電子素子が有機EL素子であり、当該フレキシブル電子デバイスがフレキシブル有機ELデバイスである、上記[18]又は[19]記載のフレキシブル電子デバイス。
(Where
M represents the metal of the second period to the sixth period of the periodic table,
R 1 and R 3 are each independently a hydrogen atom, an alkyl group that may have a substituent, an alkoxy group that may have a substituent, an aryl group that may have a substituent, or Represents an aralkyl group which may have a substituent,
R 2 has a hydrogen atom, an alkyl group which may have a substituent, an alkoxy group which may have a substituent, an alkoxycarbonyl group which may have a substituent, and a substituent. An aryl group that may be substituted or an aralkyl group that may have a substituent,
X represents a monodentate ligand in which the coordination atom is an oxygen atom,
The solid line between the oxygen atom (O) and M in [] represents a covalent bond,
The broken line between the oxygen atom (O) and M in [] represents a coordination bond, and m is an integer of 3 or 4, n is an integer of 1 to 3, and m> n . )
The composition for sealing according to the above [1], which is a metal complex represented by the formula:
[4] The sealing composition according to [3], wherein M in the formula (1) is aluminum, titanium, or zirconium.
[5] The sealing composition according to any one of the above [1] to [4], wherein (B) the inorganic filler is surface-treated with (C) a metal complex.
[6] The sealing composition according to any one of claims 1 to 5, wherein the polyolefin resin and / or the polyolefin rubber is a polymer having a polyisobutylene skeleton.
[7] The sealing according to any one of the above [1] to [6], wherein the polyolefin resin includes a polyolefin resin having an acid anhydride group and / or a polyolefin resin having an epoxy group Composition.
[8] The sealing according to any one of [1] to [6], wherein the polyolefin rubber includes a polyolefin rubber having an acid anhydride group and / or a polyolefin rubber having an epoxy group. Composition.
[9] The sealing composition according to any one of [1] to [6], which satisfies at least one of the following (a) to (d):
(A) The polyolefin resin includes a polyolefin resin having an acid anhydride group and a polyolefin resin having an epoxy group.
(B) The polyolefin rubber includes a polyolefin rubber having an acid anhydride group and a polyolefin rubber having an epoxy group.
(C) The polyolefin resin includes a polyolefin resin having an acid anhydride group, and the polyolefin rubber includes a polyolefin rubber having an epoxy group.
(D) The polyolefin-based rubber includes a polyolefin-based rubber having an acid anhydride group, and the polyolefin-based resin includes a polyolefin-based resin having an epoxy group.
[10] The sealing composition according to any one of the above [1] to [9], further comprising 10% by mass or less (D) a tackifying resin with respect to 100% by mass of the nonvolatile component of the composition object.
[11] The sealing composition according to any one of [1] to [10], which is used for sealing a flexible electronic device.
[12] The composition for sealing according to the above [11], wherein the flexible electronic device is a flexible organic EL device.
[13] A sealing sheet comprising a support and a layer of the composition according to any one of the above [1] to [8] and [10] formed on the support.
[14] A support and a layer of the composition according to [9] formed on the support, wherein the composition layer is formed by a reaction between an acid anhydride group and an epoxy group. A sealing sheet having a crosslinked structure.
[15] The sealing sheet according to [13] or [14], wherein the support is composed of at least one selected from a peelable support, a moisture-proof support, and a circularly polarizing plate.
[16] The sealing sheet according to any one of [13] to [15], which is used for sealing a flexible electronic device.
[17] The sealing sheet according to [16], wherein the flexible electronic device is a flexible organic EL device.
[18] A flexible electronic device in which an electronic element formed on a plastic substrate is sealed with the sealing composition according to any one of [1] to [8] and [10].
[19] An electronic device formed on a plastic substrate is sealed with the sealing composition described in [9] above, and the sealing composition is reacted with an acid anhydride group and an epoxy group. A flexible electronic device having a formed cross-linked structure.
[20] The flexible electronic device according to [18] or [19], wherein the electronic element is an organic EL element, and the flexible electronic device is a flexible organic EL device.
 本発明によれば、接着性及び屈曲性に優れた封止用組成物を実現することができる。従って、本発明の封止用組成物は特に素子基板がプラスチック基板からなるフレキシブル電子デバイス用の封止材料として優れた効果を奏する。 According to the present invention, a sealing composition having excellent adhesion and flexibility can be realized. Therefore, the sealing composition of the present invention has an excellent effect as a sealing material for flexible electronic devices in which the element substrate is a plastic substrate.
[封止用組成物]
 本発明の封止用組成物(以下、単に「組成物」とも略称する。)は、必須成分として、(A)ポリオレフィン系樹脂及び/又はポリオレフィン系ゴム、(B)無機フィラー、並びに(C)2つの配位原子が酸素原子である二座配位子と配位原子が酸素原子である単座配位子とが中心金属に結合している金属錯体を含有する。
[Sealing composition]
The sealing composition of the present invention (hereinafter also simply referred to as “composition”) includes, as essential components, (A) a polyolefin-based resin and / or polyolefin-based rubber, (B) an inorganic filler, and (C). It contains a metal complex in which a bidentate ligand in which two coordination atoms are oxygen atoms and a monodentate ligand in which the coordination atoms are oxygen atoms are bonded to a central metal.
<(A)ポリオレフィン系樹脂及び/又はポリオレフィン系ゴム>
 本発明の封止用組成物は、ポリオレフィン系樹脂及び/又はポリオレフィン系ゴム(以下、「(A)成分」ともいう。)を含む。ポリオレフィン系樹脂及びポリオレフィン系ゴムはそれぞれオレフィン由来の骨格を有するものであれば特に制限なく使用することができる。なお、ここでいう「オレフィン」は、モノオレフィン及び/又はジオレフィンを意味する。モノオレフィンとしては、好ましくは、エチレン、プロピレン、1-ブテン、イソブチレン(イソブテン)、1-ペンテン、1-ヘキセン、1-ヘプテン、1-オクテン等のα-オレフィンが挙げられ、ジオレフィンとしては、好ましくは、1,3-ブタジエン、イソプレン、1,3-ペンタジエン、2,3-ジメチルブタジエン等が挙げられる。モノオレフィン及びジオレフィンはそれぞれ1種であっても2種以上であってよい。
<(A) Polyolefin resin and / or polyolefin rubber>
The composition for sealing of this invention contains polyolefin resin and / or polyolefin rubber (henceforth "(A) component"). The polyolefin-based resin and the polyolefin-based rubber can be used without particular limitation as long as each has an olefin-derived skeleton. In addition, "olefin" here means a monoolefin and / or a diolefin. Preferred monoolefins include α-olefins such as ethylene, propylene, 1-butene, isobutylene (isobutene), 1-pentene, 1-hexene, 1-heptene, 1-octene, and the like. Preferably, 1,3-butadiene, isoprene, 1,3-pentadiene, 2,3-dimethylbutadiene and the like are mentioned. Each monoolefin and diolefin may be one kind or two or more kinds.
 本発明において、(A)成分は、1種のポリマー又は2種以上のポリマーの混合物であってよく、例えば、1種のポリオレフィン系樹脂、1種のポリオレフィン系ゴム、2種以上のポリオレフィン系樹脂の混合物、2種以上のポリオレフィン系ゴムの混合物、1種以上のポリオレフィン系樹脂と1種以上のポリオレフィン系ゴムの混合物等の種々の態様を含むことができる。 In the present invention, the component (A) may be one kind of polymer or a mixture of two or more kinds of polymers, for example, one kind of polyolefin resin, one kind of polyolefin rubber, two or more kinds of polyolefin resin. And a mixture of two or more polyolefin rubbers, a mixture of one or more polyolefin resins and one or more polyolefin rubbers, and the like.
(ポリオレフィン系樹脂)
 ポリオレフィン系樹脂は、ホモポリマー、ランダム共重合体、またはブロック共重合体のいずれであってもよい。また、共重合体は、(i)2種以上のモノオレフィンの共重合体、(ii)モノオレフィンとジオレフィンとの共重合体、または(iii)モノオレフィンと不飽和カルボン酸エステル(例えば、メチルメタクリレート等)や芳香族ビニル(例えば、スチレン等)等のオレフィン以外のエチレン性不飽和化合物(ジエン系モノマーを除く)との共重合体等が挙げられる。
(Polyolefin resin)
The polyolefin resin may be a homopolymer, a random copolymer, or a block copolymer. The copolymer may be (i) a copolymer of two or more monoolefins, (ii) a copolymer of monoolefins and diolefins, or (iii) a monoolefin and an unsaturated carboxylic acid ester (for example, And copolymers with ethylenically unsaturated compounds (excluding diene monomers) other than olefins such as methyl methacrylate and aromatic vinyl (for example, styrene).
 ポリオレフィン系樹脂は、ポリイソブチレン系樹脂、ポリプロピレン系樹脂が好ましい。ここで、「ポリイソブチレン系樹脂」とは、ポリマーを構成する全オレフィンモノマー単位のうちの主単位(最大含有量単位)がイソブチレンである樹脂を指し、「ポリプロピレン系樹脂」とは、ポリマーを構成する全オレフィンモノマー単位のうちの主単位(最大含有量単位)がプロピレンである樹脂を指す。 The polyolefin resin is preferably a polyisobutylene resin or a polypropylene resin. Here, “polyisobutylene resin” refers to a resin whose main unit (maximum content unit) among all olefin monomer units constituting the polymer is isobutylene, and “polypropylene resin” refers to a polymer. This refers to a resin in which the main unit (maximum content unit) of all the olefin monomer units is propylene.
 なお、ポリイソブチレン系樹脂が共重合体の場合、イソブチレン以外のモノマー単位としては、例えば、1-ブテン、スチレン等が挙げられる。ポリプロピレン系樹脂が共重合体の場合、プロピレン以外のモノマー単位としては、例えば、エチレン、1-ブテン、イソプレン等が挙げられる。 When the polyisobutylene resin is a copolymer, examples of monomer units other than isobutylene include 1-butene and styrene. When the polypropylene resin is a copolymer, examples of monomer units other than propylene include ethylene, 1-butene, and isoprene.
 ポリオレフィン系樹脂は、封止用組成物の封止対象への接着性、組成物の接着湿熱耐性等をより向上させる観点から、酸無水物基(即ち、カルボニルオキシカルボニル基(-CO-O-CO-))を有するポリオレフィン系樹脂、及び/又は、エポキシ基を有するポリオレフィン系樹脂を含むことができる。酸無水物基としては、例えば、無水コハク酸に由来する基、無水マレイン酸に由来する基、無水グルタル酸に由来する基等が挙げられる。酸無水物基は1種または2種以上を有することができる。酸無水物基を有するポリオレフィン系樹脂は、例えば、酸無水物基を有する不飽和化合物で、ポリオレフィン系樹脂をラジカル反応条件下にてグラフト変性することで得られる。また、酸無水物基を有する不飽和化合物を、オレフィンとともにラジカル共重合するようにしてもよい。同様に、エポキシ基を有するポリオレフィン系樹脂は、例えば、グリシジル(メタ)アクリレート、4-ヒドロキシブチルアクリレートグリシジルエーテル、アリルグリシジルエーテル等のエポキシ基を有する不飽和化合物で、ポリオレフィン系樹脂をラジカル反応条件下にてグラフト変性することで得られる。また、エポキシ基を有する不飽和化合物を、オレフィンとともにラジカル共重合するようにしてもよい。 The polyolefin-based resin is an acid anhydride group (that is, a carbonyloxycarbonyl group (—CO—O—) from the viewpoint of further improving the adhesiveness of the sealing composition to an object to be sealed, the adhesive wet heat resistance of the composition, and the like. It may include a polyolefin resin having CO-)) and / or a polyolefin resin having an epoxy group. Examples of the acid anhydride group include a group derived from succinic anhydride, a group derived from maleic anhydride, a group derived from glutaric anhydride, and the like. The acid anhydride group can have one type or two or more types. The polyolefin resin having an acid anhydride group can be obtained, for example, by an unsaturated compound having an acid anhydride group and graft-modifying the polyolefin resin under radical reaction conditions. Moreover, you may make it carry out radical copolymerization of the unsaturated compound which has an acid anhydride group with an olefin. Similarly, the polyolefin resin having an epoxy group is an unsaturated compound having an epoxy group such as glycidyl (meth) acrylate, 4-hydroxybutyl acrylate glycidyl ether, allyl glycidyl ether, etc. It can be obtained by graft modification with Moreover, you may make it carry out radical copolymerization of the unsaturated compound which has an epoxy group with an olefin.
 酸無水物基を有するポリオレフィン系樹脂としては、酸無水物基を有するポリイソブチレン系樹脂、酸無水物基を有するポリプロピレン系樹脂が好ましい。また、エポキシ基を有するポリオレフィン系樹脂としては、エポキシ基を有するポリイソブチレン系樹脂、エポキシ基を有するポリプロピレン系樹脂が好ましい。 The polyolefin resin having an acid anhydride group is preferably a polyisobutylene resin having an acid anhydride group or a polypropylene resin having an acid anhydride group. The polyolefin resin having an epoxy group is preferably a polyisobutylene resin having an epoxy group or a polypropylene resin having an epoxy group.
 酸無水物基を有するポリオレフィン系樹脂において、樹脂中の酸無水物基の濃度は、0.05~10mmol/gが好ましく、0.1~5mmol/gがより好ましい。酸無水物基の濃度はJIS K 2501の記載に従い、樹脂1g中に存在する酸を中和するのに必要な水酸化カリウムのmg数として定義される酸価の値より得られる。 In the polyolefin resin having an acid anhydride group, the concentration of the acid anhydride group in the resin is preferably 0.05 to 10 mmol / g, more preferably 0.1 to 5 mmol / g. The concentration of the acid anhydride group is obtained from the value of the acid value defined as the number of mg of potassium hydroxide necessary to neutralize the acid present in 1 g of resin according to the description of JIS K 2501.
 エポキシ基を有するポリオレフィン系樹脂において、樹脂中のエポキシ基の濃度は、0.05~10mmol/gが好ましく、0.1~5mmol/gがより好ましい。エポキシ基濃度はJIS K 7236-1995に基づいて得られるエポキシ当量から求められる。 In the polyolefin resin having an epoxy group, the concentration of the epoxy group in the resin is preferably 0.05 to 10 mmol / g, more preferably 0.1 to 5 mmol / g. The epoxy group concentration is determined from the epoxy equivalent obtained based on JIS K 7236-1995.
(ポリオレフィン系ゴム)
 ポリオレフィン系ゴムとしては、例えば、ブチルゴム(IIR)(イソブチレンとイソプレンとのゴム状共重合体)、イソプレンゴム(IR)、ブタジエンゴム(BR)、カルボキシル化されたスチレンとブタジエンとのゴム状共重合体(XSBR)、塩素化されたイソブチレンとイソプレンとのゴム状共重合体(CIIR)、臭素化されたイソブチレンとイソプレンとのゴム状共重合体(BIIR)等が挙げられる。これらは1種または2種以上を使用することができる。なかでも、ブチルゴム、イソプレンゴム、ブタジエンゴムが好ましいく、ブチルゴムがより好ましい。
(Polyolefin rubber)
Examples of polyolefin rubbers include butyl rubber (IIR) (rubber-like copolymer of isobutylene and isoprene), isoprene rubber (IR), butadiene rubber (BR), and rubbery copolymer of carboxylated styrene and butadiene. Examples thereof include a combination (XSBR), a chlorinated isobutylene and isoprene rubbery copolymer (CIIR), a brominated isobutylene and isoprene rubbery copolymer (BIIR), and the like. These can use 1 type (s) or 2 or more types. Of these, butyl rubber, isoprene rubber and butadiene rubber are preferable, and butyl rubber is more preferable.
 ポリオレフィン系ゴムは、封止用組成物の封止対象への接着性、組成物の接着湿熱耐性等をより向上させる観点から、酸無水物基(即ち、カルボニルオキシカルボニル基(-CO-O-CO-))を有するポリオレフィン系ゴム、及び/又は、エポキシ基を有するポリオレフィン系ゴムを含むことができる。酸無水物基としては、例えば、無水コハク酸に由来する基、無水マレイン酸に由来する基、無水グルタル酸に由来する基等が挙げられる。酸無水物基は1種または2種以上を有することができる。酸無水物基を有するポリオレフィン系ゴムは、例えば、酸無水物基を有する不飽和化合物で、ポリオレフィン系ゴムをラジカル反応条件下にてグラフト変性することで得られる。また、酸無水物基を有する不飽和化合物を、オレフィン等とともにラジカル共重合するようにしてもよい。同様に、エポキシ基を有するポリオレフィン系ゴムは、例えば、グリシジル(メタ)アクリレート、4-ヒドロキシブチルアクリレートグリシジルエーテル、アリルグリシジルエーテル等のエポキシ基を有する不飽和化合物で、ポリオレフィン系ゴムをラジカル反応条件下にてグラフト変性することで得られる。また、エポキシ基を有する不飽和化合物を、オレフィン等とともにラジカル共重合するようにしてもよい。 Polyolefin rubber is an acid anhydride group (that is, a carbonyloxycarbonyl group (—CO—O—) from the viewpoint of further improving the adhesiveness of the sealing composition to a sealing target, the adhesive heat and heat resistance of the composition, and the like. A polyolefin rubber having CO-)) and / or a polyolefin rubber having an epoxy group may be included. Examples of the acid anhydride group include a group derived from succinic anhydride, a group derived from maleic anhydride, a group derived from glutaric anhydride, and the like. The acid anhydride group can have one type or two or more types. The polyolefin rubber having an acid anhydride group can be obtained, for example, by an unsaturated compound having an acid anhydride group and graft-modifying the polyolefin rubber under radical reaction conditions. Moreover, you may make it carry out radical copolymerization of the unsaturated compound which has an acid anhydride group with an olefin. Similarly, an epoxy group-containing polyolefin rubber is an unsaturated compound having an epoxy group such as glycidyl (meth) acrylate, 4-hydroxybutyl acrylate glycidyl ether, allyl glycidyl ether, etc. It can be obtained by graft modification with Moreover, you may make it carry out radical copolymerization of the unsaturated compound which has an epoxy group with an olefin.
 酸無水物基を有するポリオレフィン系ゴムとしては、酸無水物基を有するブチルゴム、酸無水物基を有するイソプレンゴム、酸無水物基を有するブタジエンゴムが好ましく、特に好ましくは、酸無水物基を有するブチルゴムである。また、エポキシ基を有するポリオレフィン系ゴムとしては、エポキシ基を有するブチルゴム、エポキシ基を有するイソプレンゴム、エポキシ基を有するブタジエンゴムが好ましく、特に好ましくは、エポキシ基を有するブチルゴムである。 The polyolefin rubber having an acid anhydride group is preferably a butyl rubber having an acid anhydride group, an isoprene rubber having an acid anhydride group, or a butadiene rubber having an acid anhydride group, particularly preferably having an acid anhydride group. Butyl rubber. The polyolefin-based rubber having an epoxy group is preferably a butyl rubber having an epoxy group, an isoprene rubber having an epoxy group, or a butadiene rubber having an epoxy group, and particularly preferably a butyl rubber having an epoxy group.
 酸無水物基を有するポリオレフィン系ゴムにおいて、ゴム中の酸無水物基の濃度は、0.05~10mmol/gが好ましく、0.1~5mmol/gがより好ましい。酸無水物基の濃度はJIS K 2501の記載に従い、ゴム1g中に存在する酸を中和するのに必要な水酸化カリウムのmg数として定義される酸価の値より得られる。 In the polyolefin rubber having an acid anhydride group, the concentration of the acid anhydride group in the rubber is preferably 0.05 to 10 mmol / g, more preferably 0.1 to 5 mmol / g. The concentration of the acid anhydride group is obtained from the value of the acid value defined as the number of mg of potassium hydroxide necessary to neutralize the acid present in 1 g of rubber according to the description of JIS K 2501.
 エポキシ基を有するポリオレフィン系ゴムにおいて、ゴム中のエポキシ基の濃度は、0.05~10mmol/gが好ましく、0.1~5mmol/gがより好ましい。エポキシ基濃度はJIS K 7236-1995に基づいて得られるエポキシ当量から求められる。 In the polyolefin rubber having an epoxy group, the concentration of the epoxy group in the rubber is preferably 0.05 to 10 mmol / g, more preferably 0.1 to 5 mmol / g. The epoxy group concentration is determined from the epoxy equivalent obtained based on JIS K 7236-1995.
 本発明の好ましい一態様として、(A)成分がポリイソブチレン骨格を有するポリマー(樹脂及び/又はゴム)であることが挙げられる。この場合、ポリイソブチレン骨格の占める割合は(A)成分全体の50~100質量%が好ましく、より好ましくは60~100質量%である。 A preferred embodiment of the present invention is that the component (A) is a polymer (resin and / or rubber) having a polyisobutylene skeleton. In this case, the proportion of the polyisobutylene skeleton is preferably 50 to 100% by mass, more preferably 60 to 100% by mass, based on the total component (A).
 また、(A)成分が、酸無水物基を有するポリオレフィン系樹脂及び/又は酸無水物基を有するポリオレフィン系ゴムを含む態様の場合、(A)成分全体当たりの酸無水物基を有するポリオレフィン系樹脂及び/又は酸無水物基を有するポリオレフィン系ゴムの量は、好ましくは1~70質量%、より好ましくは10~50質量%である。また、(A)成分が、エポキシ基を有するポリオレフィン系樹脂及び/又はエポキシ基を有するポリオレフィン系ゴムを含む態様の場合、(A)成分全体当たりのエポキシ基を有するポリオレフィン系樹脂及び/又はエポキシ基を有するポリオレフィン系ゴムの量は、好ましくは1~70質量%、より好ましくは10~50質量%である。 In the case where the component (A) includes a polyolefin resin having an acid anhydride group and / or a polyolefin rubber having an acid anhydride group, the polyolefin type having an acid anhydride group per the entire component (A) The amount of the polyolefin rubber having a resin and / or an acid anhydride group is preferably 1 to 70% by mass, more preferably 10 to 50% by mass. In the case where the component (A) includes a polyolefin resin having an epoxy group and / or a polyolefin rubber having an epoxy group, the polyolefin resin and / or epoxy group having an epoxy group per the entire component (A) The amount of the polyolefin-based rubber having is preferably 1 to 70% by mass, more preferably 10 to 50% by mass.
 (A)成分は、封止用組成物の耐湿性等をより一層向上させる観点から、以下の(a)~(d)の少なくとも一つを満たす態様であることが好ましい。
 (a)ポリオレフィン系樹脂が酸無水物基を有するポリオレフィン系樹脂及びエポキシ基を有するポリオレフィン系樹脂を含む。
 (b)ポリオレフィン系ゴムが酸無水物基を有するポリオレフィン系ゴム及びエポキシ基を有するポリオレフィン系ゴムを含む。
 (c)ポリオレフィン系樹脂が酸無水物基を有するポリオレフィン系樹脂を含み、ポリオレフィン系ゴムがエポキシ基を有するポリオレフィン系ゴムを含む。
 (d)ポリオレフィン系ゴムが酸無水物基を有するポリオレフィン系ゴムを含み、ポリオレフィン系樹脂がエポキシ基を有するポリオレフィン系樹脂を含む。
The component (A) is preferably an embodiment satisfying at least one of the following (a) to (d) from the viewpoint of further improving the moisture resistance and the like of the sealing composition.
(A) The polyolefin resin includes a polyolefin resin having an acid anhydride group and a polyolefin resin having an epoxy group.
(B) The polyolefin rubber includes a polyolefin rubber having an acid anhydride group and a polyolefin rubber having an epoxy group.
(C) The polyolefin resin includes a polyolefin resin having an acid anhydride group, and the polyolefin rubber includes a polyolefin rubber having an epoxy group.
(D) The polyolefin-based rubber includes a polyolefin-based rubber having an acid anhydride group, and the polyolefin-based resin includes a polyolefin-based resin having an epoxy group.
 このような(A)成分は、加熱により酸無水物基とエポキシ基が反応して架橋構造を形成し得る。このため、本発明の組成物は耐透湿性等がより一層向上した封止層を形成し得る。なお、架橋構造の形成は組成物による封止後(すなわち、封止層の形成後)に行うこともできるが、例えば有機EL素子等、封止対象のデバイスが熱に弱い素子を含むものである場合、封止用シートの製造時に基材上に形成した組成物層に架橋構造を形成しておくのが望ましい。 Such component (A) can form a crosslinked structure by reacting an acid anhydride group and an epoxy group by heating. For this reason, the composition of this invention can form the sealing layer which moisture-proof resistance etc. improved further. In addition, although formation of a crosslinked structure can also be performed after sealing with a composition (that is, after formation of a sealing layer), for example, a device to be sealed includes an element that is vulnerable to heat, such as an organic EL element. It is desirable to form a crosslinked structure in the composition layer formed on the substrate at the time of producing the sealing sheet.
 なお、酸無水物基を有するポリオレフィン系樹脂及び/又は酸無水物基を有するポリオレフィン系ゴムとエポキシ基を有するポリオレフィン系樹脂及び/又はエポキシ基を有するポリオレフィン系ゴムとの割合は適切な架橋構造が形成できれば特に限定されないが、エポキシ基と酸無水物基とのモル比(エポキシ基:酸無水物基)は、好ましくは100:10~100:200、より好ましくは100:50~100:150、特に好ましくは100:90~100:110である。 In addition, the ratio of the polyolefin resin having an acid anhydride group and / or the polyolefin rubber having an acid anhydride group and the polyolefin resin having an epoxy group and / or the polyolefin rubber having an epoxy group has an appropriate crosslinked structure. Although it is not particularly limited as long as it can be formed, the molar ratio of epoxy group to acid anhydride group (epoxy group: acid anhydride group) is preferably 100: 10 to 100: 200, more preferably 100: 50 to 100: 150, Particularly preferred is 100: 90 to 100: 110.
 本発明において、(A)成分の特に好ましい態様は、(i)ブチルゴムか、(ii)酸無水物基を有するブチルゴム及びエポキシ基を有するブチルゴムの混合物か、或いは、(iii)ブチルゴム、酸無水物基を有するブチルゴム及びエポキシ基を有するブチルゴムの混合物、である。 In the present invention, a particularly preferred embodiment of the component (A) is (i) butyl rubber, (ii) a mixture of butyl rubber having an acid anhydride group and butyl rubber having an epoxy group, or (iii) butyl rubber, acid anhydride. A mixture of butyl rubber having groups and butyl rubber having epoxy groups.
 (A)成分の数平均分子量は、特に限定はされないが、封止用組成物のワニスの良好な塗工性と組成物における他の成分との良好な相溶性をもたらすという観点から、1,000,000以下が好ましく、750,000以下がより好ましく、500,000以下がより一層好ましく、400,000以下がさらに好ましい。一方、封止用組成物のワニスの塗工時のハジキを防止し、形成される封止用組成物層の耐透湿性を発現させ、機械強度を向上させるという観点から、2,000以上が好ましく、10,000以上がより好ましく、30,000以上がさら一層好ましく、50,000以上が特に好ましい。なお、数平均分子量は、ゲルパーミエーションクロマトグラフィー(GPC)法(ポリスチレン換算)で測定される。GPC法による数平均分子量は、測定装置として社島津製作所製LC-9A/RID-6Aを、カラムとして昭和電工社製Shodex K-800P/K-804L/K-804Lを、移動相としてトルエン等を用いて、カラム温度40℃にて測定し、標準ポリスチレンの検量線を用いて算出することができる。 The number average molecular weight of the component (A) is not particularly limited, but from the viewpoint of providing good coatability of the varnish of the sealing composition and good compatibility with other components in the composition, It is preferably at most 000,000, more preferably at most 750,000, even more preferably at most 500,000, further preferably at most 400,000. On the other hand, from the viewpoint of preventing repelling at the time of coating the varnish of the sealing composition, expressing moisture resistance of the sealing composition layer to be formed, and improving mechanical strength, 2,000 or more Preferably, 10,000 or more is more preferable, 30,000 or more is even more preferable, and 50,000 or more is particularly preferable. The number average molecular weight is measured by gel permeation chromatography (GPC) method (polystyrene conversion). The number average molecular weight according to the GPC method is LC-9A / RID-6A manufactured by Shimadzu Corporation as a measuring device, Shodex K-800P / K-804L / K-804L manufactured by Showa Denko KK as a column, and toluene as a mobile phase. And measured at a column temperature of 40 ° C. and calculated using a standard polystyrene calibration curve.
 本発明において、(A)成分として、ポリオレフィン系樹脂とポリオレフィン系ゴムを併用する場合、両者の配合割合(ポリオレフィン系樹脂/ポリオレフィン系ゴム)は、質量比で、1/99~50/50が好ましく、10/90~45/55がより好ましい。 In the present invention, when the polyolefin resin and the polyolefin rubber are used in combination as the component (A), the blending ratio of both (polyolefin resin / polyolefin rubber) is preferably 1/99 to 50/50 by mass ratio. 10/90 to 45/55 are more preferable.
 以下、(A)成分の具体例を説明する。
 ポリプロピレン系樹脂の具体例として、例えば、星光PMC社製「T-YP341」(グリシジルメタクリレート変性プロピレン-ブテンランダム共重合体、プロピレン単位とブテン単位の合計100質量%あたりのブテン単位の量:29質量%、エポキシ基濃度:0.638mmol/g、数平均分子量:155,000)、星光PMC社製「T-YP279」(無水マレイン酸変性プロピレン-ブテンランダム共重合体、プロピレン単位とブテン単位の合計100質量%あたりのブテン単位の量:36質量%、酸無水物基濃度:0.464mmol/g、数平均分子量:35,000)、星光PMC社製「T-YP276」(グリシジルメタクリレート変性プロピレン-ブテンランダム共重合体、プロピレン単位とブテン単位の合計100質量%あたりのブテン単位の量:36質量%、エポキシ基濃度:0.638mmol/g、数平均分子量:57,000)、星光PMC社製「T-YP312」(無水マレイン酸変性プロピレン-ブテンランダム共共重合体、プロピレン単位とブテン単位の合計100質量%あたりのブテン単位の量:29質量%、酸無水物基濃度:0.464mmol/g、数平均分子量:60,900)、星光PMC社製「T-YP313」(グリシジルメタクリレート変性プロピレン-ブテンランダム共重合体、プロピレン単位とブテン単位の合計100質量%あたりのブテン単位の量:29質量%、エポキシ基濃度:0.638mmol/g、数平均分子量:155,000)等が挙げられる。
Hereinafter, specific examples of the component (A) will be described.
Specific examples of the polypropylene-based resin include, for example, “T-YP341” (glycidyl methacrylate-modified propylene-butene random copolymer manufactured by Seiko PMC Co., Ltd., butene unit amount per 100% by mass of propylene unit and butene unit: 29 mass. %, Epoxy group concentration: 0.638 mmol / g, number average molecular weight: 155,000), “T-YP279” (maleic anhydride-modified propylene-butene random copolymer, total of propylene units and butene units) manufactured by Seiko PMC Amount of butene unit per 100% by mass: 36% by mass, acid anhydride group concentration: 0.464 mmol / g, number average molecular weight: 35,000), “T-YP276” (glycidyl methacrylate modified propylene- Butene random copolymer, a total of 10 propylene units and butene units Amount of butene units per mass%: 36 mass%, epoxy group concentration: 0.638 mmol / g, number average molecular weight: 57,000, “T-YP312” (maleic anhydride modified propylene-butene random) manufactured by Seiko PMC Copolymer, amount of butene units per 100% by mass of propylene units and butene units: 29% by mass, acid anhydride group concentration: 0.464 mmol / g, number average molecular weight: 60,900), Seiko PMC “T-YP313” (glycidyl methacrylate-modified propylene-butene random copolymer, amount of butene units per 100% by mass of propylene units and butene units: 29% by mass, epoxy group concentration: 0.638 mmol / g, number Average molecular weight: 155,000).
 ポリイソブチレン系樹脂の具体例として、例えば、BASF社製「オパノールB100」(ポリイソブチレン、粘度平均分子量:1,110,000)、BASF社製「N50SF」(ポリイソブチレン、粘度平均分子量:400,000)等が挙げられる。 Specific examples of the polyisobutylene resin include, for example, “OPanol B100” manufactured by BASF (polyisobutylene, viscosity average molecular weight: 11,110,000), “N50SF” manufactured by BASF (polyisobutylene, viscosity average molecular weight: 400,000 ) And the like.
 ポリオレフィン系ゴムの具体例として、例えば、JSR社製「065」(ブチルゴム)、星光PMC社製「ER641」(無水マレイン酸変性ブチルゴム、酸無水物基濃度0.46mmol/g、数平均分子量57,000)、星光PMC社製「ER850」(グリシジルメタクリレート変性ブチルゴム、エポキシ基濃度0.64mmol/g、数平均分子量110,000)、クレイトンポリマー社製「IR-307」、「IR-310」(イソプレンゴム、数平均分子量2,000,000))、宇部興産社製「BR150B」(ブタジエンゴム、数平均分子量500,000)等が挙げられる。 Specific examples of the polyolefin rubber include, for example, “065” (butyl rubber) manufactured by JSR, “ER641” manufactured by Starlight PMC (maleic anhydride-modified butyl rubber, acid anhydride group concentration 0.46 mmol / g, number average molecular weight 57, "ER850" (glycidyl methacrylate-modified butyl rubber, epoxy group concentration 0.64 mmol / g, number average molecular weight 110,000) manufactured by Seiko PMC, "IR-307", "IR-310" (isoprene manufactured by Kraton Polymer Co., Ltd.) Rubber, number average molecular weight 2,000,000)), “BR150B” (butadiene rubber, number average molecular weight 500,000) manufactured by Ube Industries, Ltd., and the like.
 本発明の封止用組成物中の(A)成分の含有量は特に制限はないが、良好な塗工性と相溶性をもたらし、良好な取り扱い性(タック抑制)を確保できるという観点から、該含有量は、組成物中の不揮発分全体あたり、90質量%以下が好ましく、85質量%以下がより好ましく、82質量%以下がより一層好ましく、80質量%以下がさらに好ましい。また、組成物の耐透湿性等を向上させるという観点から、該含有量は、組成物中の不揮発分全体あたり、20質量%以上が好ましく、25質量%以上がより好ましく、30質量%以上がさらに好ましい。 The content of the component (A) in the sealing composition of the present invention is not particularly limited, but brings about good coating properties and compatibility, and from the viewpoint of ensuring good handleability (tack suppression), The content is preferably 90% by mass or less, more preferably 85% by mass or less, still more preferably 82% by mass or less, and further preferably 80% by mass or less, based on the entire nonvolatile content in the composition. Further, from the viewpoint of improving the moisture permeation resistance and the like of the composition, the content is preferably 20% by mass or more, more preferably 25% by mass or more, and more preferably 30% by mass or more per non-volatile content in the composition. Further preferred.
<(B)無機フィラー>
 本発明の封止用組成物は、耐透湿性等の観点から、無機フィラー(以下、「(B)成分」ともいう)を含有する。
<(B) Inorganic filler>
The sealing composition of the present invention contains an inorganic filler (hereinafter also referred to as “component (B)”) from the viewpoint of moisture permeation resistance and the like.
 無機フィラーとしては、特に、限定されず、ナノシリカ等のシリカ;酸化マグネシウム、酸化ストロンチウム、酸化アルミニウム、酸化バリウム等の金属酸化物;水酸化アルミニウム、水酸化マグネシウム等の金属水酸化物;炭酸カルシウム、炭酸マグネシウム等の金属炭酸塩;窒化アルミニウム、窒化チタン等の金属窒化物;チタン酸バリウム、チタン酸ストロンチウム、チタン酸カルシウム、チタン酸マグネシウム、チタン酸ビスマス等のチタン酸金属塩;ジルコン酸バリウム、ジルコン酸カルシウム等のジルコン酸金属塩;ホウ酸アルミニウム;天然又は合成クレイ、有機修飾したクレイ等の鉱物系フィラー等が挙げられる。中でも、鉱物系フィラーが好ましい。 The inorganic filler is not particularly limited, and silica such as nano silica; metal oxides such as magnesium oxide, strontium oxide, aluminum oxide and barium oxide; metal hydroxides such as aluminum hydroxide and magnesium hydroxide; calcium carbonate, Metal carbonates such as magnesium carbonate; metal nitrides such as aluminum nitride and titanium nitride; metal titanates such as barium titanate, strontium titanate, calcium titanate, magnesium titanate and bismuth titanate; barium zirconate and zircon Zirconic acid metal salts such as calcium acid; aluminum borate; mineral fillers such as natural or synthetic clay and organically modified clay. Among these, mineral fillers are preferable.
 鉱物系フィラーにおいて、天然または合成クレイとしては、例えば、マイカ(mica)、フルオロマイカ(fluoromica)、パイロフィライト(pyrophyllite)、海緑石(glauconite)、蛭石(vermiculite)、セピオライト(sepiolite)、アロホン(allophone)、イモゴライト(imogolite)、タルク(talc)、イライト(illite)、ソボカイト(sobockite)、スビンフォーダイト(svinfordite)、カオリナイト(kaolinite)、ディッカイト(dickite)、ナクライト(nacrite)、アナウキサイト(anauxite)、絹雲母(sericite)、レディカイト(ledikite)、モントロナイト(montronite)、メタハロイサイト(metahalloysite)、蛇紋石粘土(serpentine clay)、クリンタイル(chrysotile)、アンチゴライト(antigorite)、アタパルジャイト(attapulgite)、パリゴルスカイト(palygorskite)、木節粘土(Kibushi clay)、蛙目粘土(gairome clay)、ヒシンゲライト(hisingerite)、緑泥石(chlorite)、モンモリロナイト(montmorillonite)、ナトリウムモンモリロナイト(sodium montmorillonite)、マグネシウムモンモリロナイト(magnesium montmorillonite)、カルシウムモンモリロナイト(calcium montmorillonite)、ノントロナイト(nontronite)、ベントナイト(bentonite)、バイデライト(beidellite)、ヘクトライト(hectorite)、ナトリウムヘクトライト(sodium hectorite)、サポナイト(saponite)、ソーコナイ(sauconite)、フルオロヘクトライト(fluorohectorite)、ステベンサイト(stevensite)、ボルコンスコアイト(volkonskoite)、マガディアイト(magadiite)、ケニヤアイト(kenyaite)、ハロイサイト(halloysite)、ハドロタルサイト(hydrotalcite)、スメクタイト(smectite)、スメクタイト型(smectite-type)クレイなどを例示することができる。 In the mineral filler, as natural or synthetic clay, for example, mica, fluoromica, pyrophyllite, glauconite, vermiculite, sepiolite, Allophone, imogolite, talc, illite, sobokite, svinfordite, kaolinite, dickite, nacrite, nacrite Site (anauxite), sericite (sericite), ladykite (ledikite), montronite (montronite), metahalloy site ( etahalloysite, serpentine clay, chrysotile, antigolite, attapulgite, palgorskite, kibashiro clay, Kibashiro clay Hisingerite, chlorite, montmorillonite, sodium montmorillonite, magnesium montmorillonite, calcium montmoronite, calcium montmorillonite nitrite, bentonite, beidellite, hectorite, sodium hectorite, saponite, saconite, fluorhectite site, fluorhectite site , Volkonskoite, magadiite, kenyaite, halloysite, hydrotalcite, smectite, smectite type, etc. Can do.
 有機修飾したクレイとは、非官能性クレイを一つ以上の有機化剤(intercalant)と相互作用させて製造したスメクタイトまたはスメクタイト型クレイを意味する。この時、使われる有機化剤の種類は、一般的に中性またはイオン性有機化合物である。中性有機化合物の例としては、アミド、エステル、ラクタム、ニトリル、ウレア、カーボネート、ホスフェート、ホスホネート、スルフェート、スルホネート又はニトロ化合物等の極性化合物のモノマー性、オリゴマー性またはポリマー性化合物が挙げられる。このような中性有機化合物は、クレイの電荷平衡イオンを完全に置換することなく、水素結合を通じてクレイの層間に挿入される。また、イオン性有機化合物の例としては、アンモニウム(1級、2級、3級又は4級)、ホスホニウム、スルホニウム誘導体、芳香族または脂肪族アミン、ホスフィン及びスルフィドなどのオニウム化合物;及び4級窒素原子と結合した少なくとも1つの長鎖脂肪族基(例えば、オクタデシル、ミリスチルまたはオレイル)を有する4級アンモニウムイオンなどのオニウムイオンのような陽イオン性界面活性剤が挙げられる。 Organically modified clay means smectite or smectite type clay produced by interacting non-functional clay with one or more organic agents. At this time, the type of the organic agent used is generally a neutral or ionic organic compound. Examples of neutral organic compounds include monomeric, oligomeric or polymeric compounds of polar compounds such as amides, esters, lactams, nitriles, ureas, carbonates, phosphates, phosphonates, sulfates, sulfonates or nitro compounds. Such a neutral organic compound is inserted between the clay layers through hydrogen bonding without completely replacing the charge-balance ions of the clay. Examples of ionic organic compounds include ammonium (primary, secondary, tertiary or quaternary), onium compounds such as phosphonium, sulfonium derivatives, aromatic or aliphatic amines, phosphines and sulfides; and quaternary nitrogen. Cationic surfactants such as onium ions such as quaternary ammonium ions having at least one long chain aliphatic group attached to the atom (eg, octadecyl, myristyl or oleyl).
 鉱物系フィラーの中でも、耐湿性等の観点からマイカ、ハイドロタルサイト、スメクタイトが好ましく、また本発明の組成物により形成される封止層を透明にし易くする観点から、スメクタイト、ハイドロタルサイトがより好ましく、特にハイドロタルサイトが好ましい。 Among mineral fillers, mica, hydrotalcite, and smectite are preferable from the viewpoint of moisture resistance and the like, and smectite and hydrotalcite are more preferable from the viewpoint of easily making the sealing layer formed by the composition of the present invention transparent. Hydrotalcite is particularly preferable.
 以下、無機フィラーとして特に好ましいハイドロタルサイトについて説明する。ハイドロタルサイトは、未焼成ハイドロタルサイト、半焼成ハイドロタルサイト、および焼成ハイドロタルサイトに分類することができ、特に組成物の透明性や耐湿性の観点から半焼成ハイドロタルサイトが好ましい。未焼成ハイドロタルサイトは、例えば、天然ハイドロタルサイト(MgAl(OH)16CO・4HO)に代表されるような層状の結晶構造を有する金属水酸化物であり、例えば、基本骨格となる層[Mg1-XAl(OH)X+と中間層[(COX/2・mHO]X-からなる。本発明における未焼成ハイドロタルサイトは、合成ハイドロタルサイト等のハイドロタルサイト様化合物を含む概念である。ハイドロタルサイト様化合物としては、例えば、下記式(I)および下記式(II)で表されるものが挙げられる。 Hereinafter, hydrotalcite that is particularly preferable as the inorganic filler will be described. Hydrotalcite can be classified into unfired hydrotalcite, semi-fired hydrotalcite, and fired hydrotalcite, and semi-fired hydrotalcite is particularly preferable from the viewpoint of transparency and moisture resistance of the composition. Uncalcined hydrotalcite is a metal hydroxide having a layered crystal structure typified by natural hydrotalcite (Mg 6 Al 2 (OH) 16 CO 3 .4H 2 O), for example, It consists of a layer [Mg 1-X Al X (OH) 2 ] X + and a middle layer [(CO 3 ) X / 2 · mH 2 O] X— which are the basic skeleton. The uncalcined hydrotalcite in the present invention is a concept including a hydrotalcite-like compound such as synthetic hydrotalcite. Examples of the hydrotalcite-like compound include those represented by the following formula (I) and the following formula (II).
 [M2+ 1-x3+x(OH)x+・[(An-x/n・mHO]x-  
 (I)
(式中、M2+はMg2+、Zn2+などの2価の金属イオンを表し、M3+はAl3+、Fe3+などの3価の金属イオンを表し、An-はCO 2-、Cl、NO などのn価のアニオンを表し、0<x<1であり、0≦m<1であり、nは正の数である。)
 式(I)中、M2+は、好ましくはMg2+であり、M3+は、好ましくはAl3+であり、An-は、好ましくはCO 2-である。
[M 2+ 1-x M 3+ x (OH) 2 ] x + · [(A n− ) x / n · mH 2 O] x−
(I)
(Wherein, M 2+ is Mg 2+, a divalent metal ion such as Zn 2+, M 3+ represents a trivalent metal ion such as Al 3+, Fe 3+, A n- is CO 3 2-, Cl Represents an n-valent anion such as and NO 3 , 0 <x <1, 0 ≦ m <1, and n is a positive number.)
Wherein (I), M 2+ is preferably Mg 2+, M 3+ is preferably Al 3+, A n-is preferably CO 3 2-.
 M2+ Al(OH)2x+6-nz(An-・mHO   (II)
(式中、M2+はMg2+、Zn2+などの2価の金属イオンを表し、An-はCO 2-、Cl、NO3-などのn価のアニオンを表し、xは2以上の正の数であり、zは2以下の正の数であり、mは正の数であり、nは正の数である。)
 式(II)中、M2+は、好ましくはMg2+であり、An-は、好ましくはCO 2-である。
M 2+ x Al 2 (OH) 2x + 6-nz (A n− ) z · mH 2 O (II)
(In the formula, M 2+ represents a divalent metal ion such as Mg 2+ or Zn 2+ , A n− represents an n-valent anion such as CO 3 2− , Cl , NO 3− , and x is 2 or more. Z is a positive number of 2 or less, m is a positive number, and n is a positive number.)
Wherein (II), M 2+ is preferably Mg 2+, A n-is preferably CO 3 2-.
 半焼成ハイドロタルサイトは、未焼成ハイドロタルサイトを焼成して得られる、層間水の量が減少または消失した層状の結晶構造を有する金属水酸化物をいう。「層間水」とは、組成式を用いて説明すれば、上述した未焼成の天然ハイドロタルサイトおよびハイドロタルサイト様化合物の組成式に記載の「HO」を指す。 Semi-fired hydrotalcite refers to a metal hydroxide having a layered crystal structure in which the amount of interlayer water is reduced or eliminated, obtained by firing unfired hydrotalcite. The “interlayer water” refers to “H 2 O” described in the composition formula of the unfired natural hydrotalcite and hydrotalcite-like compound described above using a composition formula.
 一方、焼成ハイドロタルサイトは、未焼成ハイドロタルサイトまたは半焼成ハイドロタルサイトを焼成して得られ、層間水だけでなく、水酸基も縮合脱水によって消失した、アモルファス構造を有する金属酸化物をいう。 On the other hand, calcined hydrotalcite refers to a metal oxide having an amorphous structure obtained by calcining uncalcined hydrotalcite or semi-calcined hydrotalcite, and not only interlayer water but also hydroxyl groups disappeared by condensation dehydration.
 未焼成ハイドロタルサイト、半焼成ハイドロタルサイトおよび焼成ハイドロタルサイトは、飽和吸水率により区別することができる。半焼成ハイドロタルサイトの飽和吸水率は、1重量%以上20重量%未満である。一方、未焼成ハイドロタルサイトの飽和吸水率は、1重量%未満であり、焼成ハイドロタルサイトの飽和吸水率は、20重量%以上である。 Unfired hydrotalcite, semi-fired hydrotalcite and fired hydrotalcite can be distinguished by saturated water absorption. The saturated water absorption of the semi-fired hydrotalcite is 1% by weight or more and less than 20% by weight. On the other hand, the saturated water absorption of unfired hydrotalcite is less than 1% by weight, and the saturated water absorption of fired hydrotalcite is 20% by weight or more.
 上記の「飽和吸水率」は、未焼成ハイドロタルサイト、半焼成ハイドロタルサイトまたは焼成ハイドロタルサイトを天秤にて1.5g量り取り、初期質量を測定した後、大気圧下、60℃、90%RH(相対湿度)に設定した小型環境試験器(エスペック社製SH-222)に200時間静置した場合の、初期質量に対する質量増加率を言い、下記式(i):
 飽和吸水率(質量%)=100×(吸湿後の質量-初期質量)/初期質量   (i)
で求めることができる。
The above “saturated water absorption” is determined by measuring 1.5 g of uncalcined hydrotalcite, semi-calcined hydrotalcite or calcined hydrotalcite using a balance and measuring the initial mass, and then at 60 ° C. and 90 ° C. under atmospheric pressure. The mass increase rate with respect to the initial mass when left in a small environmental tester (Espec SH-222) set to% RH (relative humidity) for 200 hours is expressed by the following formula (i):
Saturated water absorption (mass%) = 100 × (mass after moisture absorption−initial mass) / initial mass (i)
Can be obtained.
 半焼成ハイドロタルサイトの飽和吸水率は、好ましくは3質量%以上20質量%未満、より好ましくは5質量%以上20質量%未満である。 The saturated water absorption rate of the semi-fired hydrotalcite is preferably 3% by mass or more and less than 20% by mass, more preferably 5% by mass or more and less than 20% by mass.
 また、未焼成ハイドロタルサイト、半焼成ハイドロタルサイトおよび焼成ハイドロタルサイトは、熱重量分析で測定される熱重量減少率により区別することができる。半焼成ハイドロタルサイトの280℃における熱重量減少率は15質量%未満であり、かつその380℃における熱重量減少率は12質量%以上である。一方、未焼成ハイドロタルサイトの280℃における熱重量減少率は、15質量%以上であり、焼成ハイドロタルサイトの380℃における熱重量減少率は、12質量%未満である。 Further, unfired hydrotalcite, semi-fired hydrotalcite and fired hydrotalcite can be distinguished by the thermogravimetric reduction rate measured by thermogravimetric analysis. The thermal weight loss rate at 280 ° C. of the semi-calcined hydrotalcite is less than 15% by mass, and the thermal weight reduction rate at 380 ° C. is 12% by mass or more. On the other hand, the thermal weight reduction rate at 280 ° C. of the unfired hydrotalcite is 15% by mass or more, and the thermal weight reduction rate at 380 ° C. of the sintered hydrotalcite is less than 12% by mass.
 熱重量分析は、日立ハイテクサイエンス社製TG/DTA EXSTAR6300を用いて、アルミニウム製のサンプルパンにハイドロタルサイトを5mg秤量し、蓋をせずオープンの状態で、窒素流量200mL/分の雰囲気下、30℃から550℃まで昇温速度10℃/分の条件で行うことができる。熱重量減少率は、下記式(ii):
 熱重量減少率(質量%)
=100×(加熱前の質量-所定温度に達した時の質量)/加熱前の質量   (ii)
で求めることができる。
Thermogravimetric analysis was performed using Hitachi High-Tech Science TG / DTA EXSTAR6300, weighing 5 mg of hydrotalcite into an aluminum sample pan, and without opening the lid, in an atmosphere with a nitrogen flow rate of 200 mL / min. The temperature can be increased from 30 ° C. to 550 ° C. at a temperature increase rate of 10 ° C./min. The thermal weight loss rate is expressed by the following formula (ii):
Thermal weight loss rate (mass%)
= 100 × (mass before heating−mass when reaching a predetermined temperature) / mass before heating (ii)
Can be obtained.
 また、未焼成ハイドロタルサイト、半焼成ハイドロタルサイトおよび焼成ハイドロタルサイトは、粉末X線回折で測定されるピークおよび相対強度比により区別することができる。半焼成ハイドロタルサイトは、粉末X線回折により2θが8~18°付近に二つにスプリットしたピーク、または二つのピークの合成によりショルダーを有するピークを示し、低角側に現れるピークまたはショルダーの回折強度(=低角側回折強度)と、高角側に現れるピークまたはショルダーの回折強度(=高角側回折強度)の相対強度比(低角側回折強度/高角側回折強度)は、0.001~1,000である。一方、未焼成ハイドロタルサイトは8~18°付近で一つのピークしか有しないか、または低角側に現れるピークまたはショルダーと高角側に現れるピークまたはショルダーの回折強度の相対強度比が前述の範囲外となる。焼成ハイドロタルサイトは8°~18°の領域に特徴的ピークを有さず、43°に特徴的なピークを有する。粉末X線回折測定は、粉末X線回折装置(PANalytical社製、Empyrean)により、対陰極CuKα(1.5405Å)、電圧:45V、電流:40mA、サンプリング幅:0.0260°、走査速度:0.0657°/s、測定回折角範囲(2θ):5.0131~79.9711°の条件で行った。ピークサーチは、回折装置付属のソフトウエアのピークサーチ機能を利用し、「最小有意度:0.50、最小ピークチップ:0.01°、最大ピークチップ:1.00°、ピークベース幅:2.00°、方法:2次微分の最小値」の条件で行うことができる。 Further, unfired hydrotalcite, semi-fired hydrotalcite and fired hydrotalcite can be distinguished by the peak and relative intensity ratio measured by powder X-ray diffraction. Semi-calcined hydrotalcite shows a peak that is split into two around 8 to 18 ° by powder X-ray diffraction, or a peak having a shoulder due to the synthesis of two peaks. The relative intensity ratio (low angle side diffraction intensity / high angle side diffraction intensity) of the diffraction intensity (= low angle side diffraction intensity) and the peak or shoulder diffraction intensity appearing on the high angle side (= high angle side diffraction intensity) is 0.001. ~ 1,000. On the other hand, the uncalcined hydrotalcite has only one peak at around 8 to 18 °, or the relative intensity ratio of the diffraction intensity of the peak or shoulder appearing on the low angle side and the peak or shoulder appearing on the high angle side is in the above range. Get out. The calcined hydrotalcite does not have a characteristic peak in the region of 8 ° to 18 °, but has a characteristic peak at 43 °. Powder X-ray diffraction measurement was performed using a powder X-ray diffractometer (Empyrean, manufactured by PANalytical), counter-cathode CuKα (1.5405 mm), voltage: 45 V, current: 40 mA, sampling width: 0.0260 °, scanning speed: 0 0.0657 ° / s, diffraction angle range (2θ): 5.0131 to 79.9711 °. The peak search uses the peak search function of the software attached to the diffractometer. “Minimum significance: 0.50, minimum peak tip: 0.01 °, maximum peak tip: 1.00 °, peak base width: 2 0.000, method: minimum value of second derivative ”.
 未焼成ハイドロタルサイト、半焼成ハイドロタルサイトおよび焼成ハイドロタルサイトの具体例としては、以下のものが挙げられる。
・DHT-4C(協和化学工業社製):半焼成ハイドロタルサイト(平均粒子径:400nm、BET比表面積:15m/g)
・DHT-4A-2(協和化学工業社製):半焼成ハイドロタルサイト(平均粒子径:400nm、BET比表面積:13m/g)
・KW-2200(協和化学工業社製):焼成ハイドロタルサイト(平均粒子径:400nm、BET比表面積:146m/g)
・DHT-4A(協和化学工業社製):未焼成ハイドロタルサイト(平均粒子径:400nm、BET比表面積:10m/g)
Specific examples of unfired hydrotalcite, semi-fired hydrotalcite, and fired hydrotalcite include the following.
DHT-4C (manufactured by Kyowa Chemical Industry Co., Ltd.): Semi-calcined hydrotalcite (average particle size: 400 nm, BET specific surface area: 15 m 2 / g)
DHT-4A-2 (manufactured by Kyowa Chemical Industry Co., Ltd.): Semi-calcined hydrotalcite (average particle size: 400 nm, BET specific surface area: 13 m 2 / g)
KW-2200 (manufactured by Kyowa Chemical Industry Co., Ltd.): calcined hydrotalcite (average particle size: 400 nm, BET specific surface area: 146 m 2 / g)
DHT-4A (manufactured by Kyowa Chemical Industry Co., Ltd.): uncalcined hydrotalcite (average particle size: 400 nm, BET specific surface area: 10 m 2 / g)
 無機フィラーの平均粒径は、特に限定されるものではないが、封止対象物への影響や耐湿性の観点から、25μm以下が好ましく、15μm以下がより好ましく、10μm以下がさらに好ましく、5μm以下が特に好ましく、1μm以下が最も好ましい。一方、無機フィラーの分散性や組成物の粘度の観点から、0.001μm以上が好ましく、0.01μm以上がより好ましく、0.1μm以上がさらに好ましい。 The average particle size of the inorganic filler is not particularly limited, but is preferably 25 μm or less, more preferably 15 μm or less, even more preferably 10 μm or less, and even more preferably 5 μm or less, from the viewpoints of influence on the sealing target and moisture resistance. Is particularly preferable and 1 μm or less is most preferable. On the other hand, from the viewpoint of the dispersibility of the inorganic filler and the viscosity of the composition, it is preferably 0.001 μm or more, more preferably 0.01 μm or more, and further preferably 0.1 μm or more.
 無機フィラーの平均粒径はミー(Mie)散乱理論に基づくレーザー回折・散乱法により測定することができる。具体的にはレーザー回折式粒度分布測定装置により、無機フィラーの粒度分布を体積基準で作成し、そのメディアン径を平均粒径とすることで測定することができる。測定サンプルは、無機フィラーを超音波により水中に分散させたものを好ましく使用することができる。レーザー回折式粒度分布測定装置としては、堀場製作所社製LA-500等を使用することができる。 The average particle size of the inorganic filler can be measured by a laser diffraction / scattering method based on the Mie scattering theory. Specifically, the particle size distribution of the inorganic filler can be created on a volume basis with a laser diffraction particle size distribution measuring device, and the median diameter can be measured as the average particle diameter. As the measurement sample, an inorganic filler dispersed in water by ultrasonic waves can be preferably used. As a laser diffraction particle size distribution measuring apparatus, LA-500 manufactured by Horiba, Ltd. can be used.
 なお無機フィラーのうち、ハイドロタルサイトの平均粒径は、1~1,000nmが好ましく、10~800nmがより好ましい。ハイドロタルサイトの平均粒子径は、レーザー回折散乱式粒度分布測定(JIS Z 8825)により粒度分布を体積基準で作成したときの該粒度分布のメディアン径である。 Of the inorganic fillers, the average particle size of hydrotalcite is preferably 1 to 1,000 nm, and more preferably 10 to 800 nm. The average particle size of hydrotalcite is the median diameter of the particle size distribution when the particle size distribution is created on a volume basis by laser diffraction scattering type particle size distribution measurement (JIS Z 8825).
 また無機フィラーのうち、ハイドロタルサイトのBET比表面積は、1~250m/gが好ましく、5~200m/gがより好ましい。ハイドロタルサイトのBET比表面積は、BET法に従って、比表面積測定装置(Macsorb HM Model 1210 マウンテック社製)を用いて試料表面に窒素ガスを吸着させ、BET多点法を用いて算出することができる。 Also among the inorganic filler, BET specific surface area of the hydrotalcite is preferably 1 ~ 250m 2 / g, more preferably 5 ~ 200m 2 / g. The BET specific surface area of hydrotalcite can be calculated according to the BET method using a BET multipoint method by adsorbing nitrogen gas to the sample surface using a specific surface area measuring device (Macsorb HM Model 1210 Mountec). .
 (B)成分は、表面処理剤で表面処理したものを用いることができる。表面処理に使用する表面処理剤としては、例えば、高級脂肪酸、アルキルシラン類、シランカップリング剤等を使用することができ、なかでも、高級脂肪酸、アルキルシラン類が好適である。表面処理剤は、1種または2種以上を使用できる。 (B) The component surface-treated with the surface treatment agent can be used. As the surface treatment agent used for the surface treatment, for example, higher fatty acids, alkylsilanes, silane coupling agents and the like can be used, and among these, higher fatty acids and alkylsilanes are preferable. One or more surface treatment agents can be used.
 高級脂肪酸としては、例えば、ステアリン酸、モンタン酸、ミリスチン酸、パルミチン酸などの炭素数18以上の高級脂肪酸が挙げられ、中でも、ステアリン酸が好ましい。これらは1種または2種以上を組み合わせて使用してもよい。アルキルシラン類としては、メチルトリメトキシシラン、エチルトリメトキシシラン、ヘキシルトリメトキシシラン、オクチルトリメトキシシラン、デシルトリメトキシシラン、オクタデシルトリメトキシシラン、ジメチルジメトキシシラン、オクチルトリエトキシシラン、n-オクタデシルジメチル(3-(トリメトキシシリル)プロピル)アンモニウムクロライド等が挙げられる。これらは1種または2種以上を組み合わせて使用してもよい。シランカップリング剤としては、例えば、3-グリシジルオキシプロピルトリメトキシシラン、3-グリシジルオキシプロピルトリエトキシシラン、3-グリシジルオキシプロピル(ジメトキシ)メチルシランおよび2-(3,4-エポキシシクロヘキシル)エチルトリメトキシシランなどのエポキシ系シランカップリング剤;3-メルカプトプロピルトリメトキシシラン、3-メルカプトプロピルトリエトキシシラン、3-メルカプトプロピルメチルジメトキシシランおよび11-メルカプトウンデシルトリメトキシシランなどのメルカプト系シランカップリング剤;3-アミノプロピルトリメトキシシラン、3-アミノプロピルトリエトキシシラン、3-アミノプロピルジメトキシメチルシラン、N-フェニル-3-アミノプロピルトリメトキシシラン、N-メチルアミノプロピルトリメトキシシラン、N-(2-アミノエチル)-3-アミノプロピルトリメトキシシランおよびN-(2-アミノエチル)-3-アミノプロピルジメトキシメチルシランなどのアミノ系シランカップリング剤;3-ウレイドプロピルトリエトキシシランなどのウレイド系シランカップリング剤、ビニルトリメトキシシラン、ビニルトリエトキシシランおよびビニルメチルジエトキシシランなどのビニル系シランカップリング剤;p-スチリルトリメトキシシランなどのスチリル系シランカップリング剤;3-アクリルオキシプロピルトリメトキシシランおよび3-メタクリルオキシプロピルトリメトキシシランなどのアクリレート系シランカップリング剤;3-イソシアネートプロピルトリメトキシシランなどのイソシアネート系シランカップリング剤、ビス(トリエトキシシリルプロピル)ジスルフィド、ビス(トリエトキシシリルプロピル)テトラスルフィドなどのスルフィド系シランカップリング剤;フェニルトリメトキシシラン、メタクリロキシプロピルトリメトキシシラン、イミダゾールシラン、トリアジンシラン等を挙げることができる。これらは1種または2種以上を組み合わせて使用してもよい。 Examples of the higher fatty acid include higher fatty acids having 18 or more carbon atoms such as stearic acid, montanic acid, myristic acid, and palmitic acid, among which stearic acid is preferable. These may be used alone or in combination of two or more. Alkylsilanes include methyltrimethoxysilane, ethyltrimethoxysilane, hexyltrimethoxysilane, octyltrimethoxysilane, decyltrimethoxysilane, octadecyltrimethoxysilane, dimethyldimethoxysilane, octyltriethoxysilane, n-octadecyldimethyl ( And 3- (trimethoxysilyl) propyl) ammonium chloride. These may be used alone or in combination of two or more. Examples of the silane coupling agent include 3-glycidyloxypropyltrimethoxysilane, 3-glycidyloxypropyltriethoxysilane, 3-glycidyloxypropyl (dimethoxy) methylsilane, and 2- (3,4-epoxycyclohexyl) ethyltrimethoxy. Epoxy silane coupling agents such as silane; mercapto silane coupling agents such as 3-mercaptopropyltrimethoxysilane, 3-mercaptopropyltriethoxysilane, 3-mercaptopropylmethyldimethoxysilane and 11-mercaptoundecyltrimethoxysilane ; 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-aminopropyldimethoxymethylsilane, N-phenyl-3-aminopropyltri Amino-based silane cups such as toxisilane, N-methylaminopropyltrimethoxysilane, N- (2-aminoethyl) -3-aminopropyltrimethoxysilane and N- (2-aminoethyl) -3-aminopropyldimethoxymethylsilane Ringing agents; Ureido silane coupling agents such as 3-ureidopropyltriethoxysilane, vinyl silane coupling agents such as vinyltrimethoxysilane, vinyltriethoxysilane and vinylmethyldiethoxysilane; p-styryltrimethoxysilane Styryl-based silane coupling agents; acrylate-based silane coupling agents such as 3-acryloxypropyltrimethoxysilane and 3-methacryloxypropyltrimethoxysilane; 3-isocyanatopropyltrimeth Isocyanate silane coupling agents such as silane, sulfide silane coupling agents such as bis (triethoxysilylpropyl) disulfide and bis (triethoxysilylpropyl) tetrasulfide; phenyltrimethoxysilane, methacryloxypropyltrimethoxysilane, imidazole Examples thereof include silane and triazine silane. These may be used alone or in combination of two or more.
 (B)成分の表面処理は、例えば、未処理の(B)成分を混合機で常温にて攪拌させながら、表面処理剤を添加噴霧して5~60分間攪拌することによって行なうことができる。混合機としては、公知の混合機を使用することができ、例えば、Vブレンダー、リボンブレンダー、バブルコーンブレンダー等のブレンダー、ヘンシェルミキサーおよびコンクリートミキサー等のミキサー、ボールミル、カッターミル等が挙げられる。又、ボールミルなどで吸湿材を粉砕する際に、前記の高級脂肪酸、アルキルシラン類またはシランカップリング剤を混合し、表面処理する方法も可能である。表面処理剤の処理量は(B)成分の種類または表面処理剤の種類等によっても異なるが、(B)成分100質量部に対して1~10質量部が好ましい。 The surface treatment of the component (B) can be performed, for example, by adding and spraying the surface treatment agent while stirring the untreated component (B) at room temperature with a mixer and stirring for 5 to 60 minutes. As a mixer, a well-known mixer can be used, For example, blenders, such as V blender, a ribbon blender, and a bubble cone blender, mixers, such as a Henschel mixer and a concrete mixer, a ball mill, a cutter mill, etc. are mentioned. Further, when the hygroscopic material is pulverized with a ball mill or the like, a method of surface treatment by mixing the above-mentioned higher fatty acid, alkylsilanes or silane coupling agent is also possible. The treatment amount of the surface treatment agent varies depending on the type of component (B) or the type of surface treatment agent, but is preferably 1 to 10 parts by mass with respect to 100 parts by mass of component (B).
 本発明において、(B)成分は1種または2種以上を使用することができる。組成物中の(B)成分の含有量は特に限定はされないが、組成物により形成される封止層とフレキシブル電子デバイスの電子素子及びプラスチック基板との密着性および封止層の透明性の観点から、該含有量は、組成物中の不揮発分の合計100質量%あたり、60質量%以下が好ましく、55質量%以下が好ましく、50質量%以下がより好ましく、45質量%以下がさらに好ましい。また、耐湿性等の効果を十分得るという観点から、該含有量は、組成物中の不揮発分の合計100質量%あたり、3質量%以上が好ましく、5質量%以上がより好ましく、10質量%以上がさらに好ましい。 In the present invention, the component (B) can be used alone or in combination of two or more. Although content of (B) component in a composition is not specifically limited, From the viewpoint of the adhesiveness of the sealing layer formed with a composition, the electronic element of a flexible electronic device, and a plastic substrate, and transparency of a sealing layer Therefore, the content is preferably 60% by mass or less, preferably 55% by mass or less, more preferably 50% by mass or less, and further preferably 45% by mass or less, per 100% by mass of the total nonvolatile content in the composition. In addition, from the viewpoint of obtaining sufficient effects such as moisture resistance, the content is preferably 3% by mass or more, more preferably 5% by mass or more, more preferably 10% by mass per 100% by mass of the total nonvolatile content in the composition. The above is more preferable.
<(C)金属錯体>
 本発明の組成物は、(A)成分及び(B)成分とともに、2つの配位原子がともに酸素原子である二座配位子及び配位原子が酸素原子である単座配位子が中心金属に結合した金属錯体(以下、「(C)成分」ともいう)を含有する。
<(C) Metal Complex>
The composition of the present invention comprises (A) component and (B) component, a bidentate ligand in which two coordinating atoms are both oxygen atoms, and a monodentate ligand in which the coordinating atoms are oxygen atoms are central metals. And a metal complex (hereinafter also referred to as “component (C)”).
 本発明において、金属錯体とは、金属原子またはイオンに他の原子、分子、イオンが結合した化学種のことである。また、配位子とは、金属原子またはイオンに結合している分子またはイオンを指す。また、当該結合に直接かかわっている原子を配位原子といい、配位原子が2つの配位子を二座配位子、配位原子が1つの配位子を単座配位子という。 In the present invention, a metal complex is a chemical species in which another atom, molecule, or ion is bonded to a metal atom or ion. A ligand refers to a molecule or ion bonded to a metal atom or ion. An atom directly involved in the bond is called a coordination atom, a ligand having two coordination atoms is called a bidentate ligand, and a ligand having one coordination atom is called a monodentate ligand.
 (C)成分は、2つの配位原子がともに酸素原子である二座配位子(以下、「酸素・二座配位子」とも略称する)及び配位原子が酸素原子である単座配位子(以下、「酸素・単座配位子」とも略称する)が中心金属に結合した構造の金属錯体であれば、特に制限されず、該構造を満たす、公知の金属錯体を使用することができる。中でも、中心金属が周期表の第2周期から第6周期の金属である金属錯体が好ましく、より好ましくは中心金属が第3周期から第5周期の金属である金属錯体であり、さらに好ましくは中心金属がAl、Ti、Mn、Fe、Co、Ni、Cu、Zn、Ge、Zr、In、又はSnである金属錯体であり、特に好ましくは中心金属がAl(アルミニウム)、Ti(チタン)、又はZr(ジルコニウム)である金属錯体である。 Component (C) is a bidentate ligand in which two coordinating atoms are both oxygen atoms (hereinafter also abbreviated as “oxygen / bidentate ligand”) and a monodentate coordination in which the coordinating atoms are oxygen atoms. Any metal complex having a structure in which a child (hereinafter also abbreviated as “oxygen / monodentate ligand”) is bonded to the central metal is not particularly limited, and a known metal complex satisfying the structure can be used. . Among them, a metal complex in which the central metal is a metal in the second period to the sixth period of the periodic table is preferable, more preferably a metal complex in which the central metal is a metal in the third period to the fifth period, and more preferably, the center A metal complex in which the metal is Al, Ti, Mn, Fe, Co, Ni, Cu, Zn, Ge, Zr, In, or Sn, and particularly preferably the central metal is Al (aluminum), Ti (titanium), or It is a metal complex which is Zr (zirconium).
 酸素・二座配位子としては、例えば、下記式(a)で表される化合物が挙げられる。 Examples of the oxygen / bidentate ligand include compounds represented by the following formula (a).
Figure JPOXMLDOC01-appb-C000003
Figure JPOXMLDOC01-appb-C000003
 式(a)中、R、R、Rは後掲の式(1)中のそれらと同義である。 In formula (a), R 1 , R 2 and R 3 have the same meanings as those in formula (1) described later.
 式(a)で表される化合物は中心金属に配位する前の酸素・二座配位子を表す。なお、本発明においては、中心金属に配位した状態の酸素・二座配位子と中心金属に配位する前の酸素・二座配位子とを、特に区別せずに「酸素・二座配位子」と称することがある。当該式(a)で表される化合物の具体例は、後掲の式(1)で表される金属錯体における酸素・二座配位子の具体例と同義である。 The compound represented by the formula (a) represents an oxygen / bidentate ligand before coordination with the central metal. In the present invention, the oxygen / bidentate ligand coordinated to the central metal and the oxygen / bidentate ligand before coordinated to the central metal are not particularly distinguished from each other by “oxygen / bidentate”. Sometimes referred to as “bidentate ligand”. Specific examples of the compound represented by the formula (a) are synonymous with specific examples of the oxygen / bidentate ligand in the metal complex represented by the following formula (1).
 酸素・単座配位子としては、例えば、アルコキシドアニオン(RO)、カルボキシレートアニオン(RCOO)等が挙げられる。酸素・単座配位子の具体例も、後掲の式(1)で表される金属錯体における酸素・単座配位子の具体例と同義である。なお、本発明においては、中心金属に配位した状態の酸素・単座配位子、中心金属に配位する前の酸素・単座配位子(アルコール(ROH)、カルボン酸(RCOOH))を特に区別せずに、「酸素・単座配位子」と称することがある。 Examples of the oxygen / monodentate ligand include alkoxide anion (RO ) and carboxylate anion (RCOO ). Specific examples of the oxygen / monodentate ligand are also synonymous with specific examples of the oxygen / monodentate ligand in the metal complex represented by the following formula (1). In the present invention, oxygen / monodentate ligands coordinated to the central metal and oxygen / monodentate ligands (alcohol (ROH), carboxylic acid (RCOOH)) before coordination to the central metal are particularly selected. Without distinction, it may be referred to as “oxygen / monodentate ligand”.
 また、(C)成分の金属錯体において、酸素・二座配位子の数は1以上であり、好ましくは1以上3以下であり、より好ましくは2である。酸素・二座配位子の数が複数の場合、それらは同一の配位子であっても、異なる配位子であってもよいが、同一の配位子が好ましい。また、酸素・単座配位子の数は1以上であり、好ましくは1以上3以下であり、より好ましくは2又は3である。酸素・単座配位子が複数の場合、それらは同一の配位子であっても、異なる配位子であってもよいが、同一の配位子が好ましい。 In the metal complex of component (C), the number of oxygen / bidentate ligands is 1 or more, preferably 1 or more and 3 or less, more preferably 2. When there are a plurality of oxygen / bidentate ligands, they may be the same ligand or different ligands, but the same ligand is preferred. The number of oxygen / monodentate ligands is 1 or more, preferably 1 or more and 3 or less, more preferably 2 or 3. When there are a plurality of oxygen / monodentate ligands, they may be the same ligand or different ligands, but the same ligand is preferred.
 (C)成分は、下記一般式(1)で表される金属錯体(以下、式(1)の金属錯体ともいう)がより好ましい。 The component (C) is more preferably a metal complex represented by the following general formula (1) (hereinafter also referred to as a metal complex of the formula (1)).
Figure JPOXMLDOC01-appb-C000004
Figure JPOXMLDOC01-appb-C000004
 式(1)において、
 Mは金属錯体の中心金属であり、周期表の第2周期から第6周期の金属を表す。好ましくは第3周期から第5周期の金属であり、より好ましくはAl、Ti、Mn、Fe、Co、Ni、Cu、Zn、Ge、Zr、In、又はSnであり、さらに好ましくはAl(アルミニウム)、Ti(チタン)、又はZr(ジルコニウム)である。
 R及びRはそれぞれ独立に、水素原子、アルキル基、アルコキシ基、アリール基、又はアラルキル基を表す。
 Rは水素原子、アルキル基、アルコキシ基、アルコキシカルボニル基、アリール基、又はアラルキル基を表す。
 Xは酸素・単座配位子を表す。
In equation (1),
M is a central metal of the metal complex and represents a metal in the second to sixth periods of the periodic table. Preferably, it is a metal of the third period to the fifth period, more preferably Al, Ti, Mn, Fe, Co, Ni, Cu, Zn, Ge, Zr, In, or Sn, and more preferably Al (aluminum). ), Ti (titanium), or Zr (zirconium).
R 1 and R 3 each independently represents a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, or an aralkyl group.
R 2 represents a hydrogen atom, an alkyl group, an alkoxy group, an alkoxycarbonyl group, an aryl group, or an aralkyl group.
X represents an oxygen / monodentate ligand.
 [ ]内の酸素原子(O)とMとの間の実線は共有結合を表し、[ ]内の酸素原子(O)とMとの間の破線は配位結合を表す。 The solid line between the oxygen atom (O) and M in [] represents a covalent bond, and the broken line between the oxygen atom (O) and M in [] represents a coordination bond.
 mは3または4の整数であり、nは1~3の整数であり、m>nである。 M is an integer of 3 or 4, n is an integer of 1 to 3, and m> n.
 R、R、及びRにおけるアルキル基は、直鎖状または分枝鎖状のいずれでもよい。アルキル基の炭素数は、好ましくは1~20、さらに好ましくは1~10、特に好ましくは1~6である。アルキル基としては、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、sec-ブチル基、tert-ブチル基、ペンチル基、イソペンチル基、ネオペンチル基、1-エチルプロピル基、ヘキシル基、イソヘキシル基、1,1-ジメチルブチル基、2,2-ジメチルブチル基、3,3-ジメチルブチル基、2-エチルブチル基等が挙げられる。アルキル基は置換基を有していてもよい。その置換基としては、例えば、ハロゲン原子、ヒドロキシ基、置換基を有していてもよいアミノ基等が挙げられる。 The alkyl group in R 1 , R 2 , and R 3 may be either linear or branched. The number of carbon atoms of the alkyl group is preferably 1-20, more preferably 1-10, particularly preferably 1-6. Examples of the alkyl group include a methyl group, ethyl group, propyl group, isopropyl group, butyl group, isobutyl group, sec-butyl group, tert-butyl group, pentyl group, isopentyl group, neopentyl group, 1-ethylpropyl group, Examples include hexyl group, isohexyl group, 1,1-dimethylbutyl group, 2,2-dimethylbutyl group, 3,3-dimethylbutyl group, 2-ethylbutyl group and the like. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, a hydroxy group, and an amino group which may have a substituent.
 上記のハロゲン原子としては、例えば、フッ素原子、塩素原子、臭素原子、ヨウ素原子が挙げられる。上記の置換基を有していてもよいアミノ基としては、例えば、アミノ基、モノ-またはジ-アルキルアミノ基(例、メチルアミノ基、ジメチルアミノ基、エチルアミノ基、ジエチルアミノ基、プロピルアミノ基、ジブチルアミノ基)、モノ-またはジ-シクロアルキルアミノ基(例、シクロプロピルアミノ基、シクロヘキシルアミノ基)、モノ-またはジ-アリールアミノ基(例、フェニルアミノ基)、モノ-またはジ-アラルキルアミノ基(例、ベンジルアミノ基、ジベンジルアミノ基)、複素環アミノ基(例、ピリジルアミノ基)等が挙げられる。 Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Examples of the amino group which may have the above substituent include an amino group, a mono- or di-alkylamino group (eg, methylamino group, dimethylamino group, ethylamino group, diethylamino group, propylamino group). , Dibutylamino group), mono- or di-cycloalkylamino group (eg, cyclopropylamino group, cyclohexylamino group), mono- or di-arylamino group (eg, phenylamino group), mono- or di-aralkyl Examples include amino groups (eg, benzylamino group, dibenzylamino group), heterocyclic amino groups (eg, pyridylamino group) and the like.
 R、R、及びRにおけるアルコキシ基は、好ましくは炭素数が1~6のアルコキシ基であり、例えば、メトキシ、エトキシ、プロポキシ、イソプロポキシ、ブトキシ、イソブトキシ、sec-ブトキシ、tert-ブトキシ、ペンチルオキシ、ヘキシルオキシ等が挙げられる。アルコキシ基は置換基を有していてもよい。その置換基としては、例えば、ハロゲン原子、ヒドロキシ基、置換基を有していてもよいアミノ基等が挙げられる。ハロゲン原子の具体例、置換基を有していてもよいアミノ基の具体例は、前述と同様である。 The alkoxy group in R 1 , R 2 and R 3 is preferably an alkoxy group having 1 to 6 carbon atoms, such as methoxy, ethoxy, propoxy, isopropoxy, butoxy, isobutoxy, sec-butoxy, tert-butoxy , Pentyloxy, hexyloxy and the like. The alkoxy group may have a substituent. Examples of the substituent include a halogen atom, a hydroxy group, and an amino group which may have a substituent. Specific examples of the halogen atom and specific examples of the amino group which may have a substituent are the same as described above.
 R、R、及びRにおけるアリール基の炭素数は、好ましくは6~18、より好ましくは6~14である。アリール基としては、例えば、フェニル基、1-ナフチル基、2-ナフチル基、1-アントリル基、2-アントリル基、9-アントリル基等が挙げられる。アリール基は置換基を有していてもよい。その置換基としては、例えば、ハロゲン原子、ヒドロキシ基、置換基を有していてもよいアルキル基、置換基を有していてもよいアルケニル基、置換基を有していてもよいアルキニル基、置換基を有していてもよいアミノ基等が挙げられる。 The number of carbon atoms of the aryl group in R 1 , R 2 , and R 3 is preferably 6-18, more preferably 6-14. Examples of the aryl group include a phenyl group, a 1-naphthyl group, a 2-naphthyl group, a 1-anthryl group, a 2-anthryl group, and a 9-anthryl group. The aryl group may have a substituent. Examples of the substituent include a halogen atom, a hydroxy group, an alkyl group which may have a substituent, an alkenyl group which may have a substituent, an alkynyl group which may have a substituent, The amino group etc. which may have a substituent are mentioned.
 上記のアルケニル基は直鎖状または分枝鎖状のいずれでもよい。アルケニル基の炭素数は、好ましくは2~10、より好ましくは2~6である。例えば、エテニル基(即ち、ビニル基)、1-プロペニル基、2-プロペニル基、2-メチル-1-プロペニル基、1-ブテニル基、2-ブテニル基、3-ブテニル基、3-メチル-2-ブテニル基、1-ペンテニル基、2-ペンテニル基、3-ペンテニル基、4-ペンテニル基、4-メチル-3-ペンテニル基、1-ヘキセニル基、3-ヘキセニル基、5-ヘキセニル基等が挙げられる。アルケニル基が有していてもよい置換基としては、例えば、ハロゲン原子、ヒドロキシ基、置換基を有していてもよいアミノ基等が挙げられる。ハロゲン原子の具体例、置換基を有していてもよいアミノ基の具体例は、前述と同様である。 The above alkenyl group may be either linear or branched. The carbon number of the alkenyl group is preferably 2 to 10, more preferably 2 to 6. For example, ethenyl group (ie vinyl group), 1-propenyl group, 2-propenyl group, 2-methyl-1-propenyl group, 1-butenyl group, 2-butenyl group, 3-butenyl group, 3-methyl-2 -Butenyl group, 1-pentenyl group, 2-pentenyl group, 3-pentenyl group, 4-pentenyl group, 4-methyl-3-pentenyl group, 1-hexenyl group, 3-hexenyl group, 5-hexenyl group, etc. It is done. Examples of the substituent that the alkenyl group may have include a halogen atom, a hydroxy group, and an amino group that may have a substituent. Specific examples of the halogen atom and specific examples of the amino group which may have a substituent are the same as described above.
 上記のアルキニル基は、直鎖状または分枝鎖状のいずれでもよい。アルキニル基の炭素数は、好ましくは2~10、より好ましくは2~6である。例えば、エチニル基、1-プロピニル基、2-プロピニル基、1-ブチニル基、2-ブチニル基、3-ブチニル基、1-ペンチニル基、2-ペンチニル基、3-ペンチニル基、4-ペンチニル基、1-ヘキシニル基、2-ヘキシニル基、3-ヘキシニル基、4-ヘキシニル基、5-ヘキシニル基、4-メチル-2-ペンチニル基等が挙げられる。アルキニル基が有していてもよい置換基としては、例えば、ハロゲン原子、ヒドロキシ基、置換基を有していてもよいアミノ基等が挙げられる。ハロゲン原子の具体例、置換基を有していてもよいアミノ基の具体例は、前述と同様である。 The above alkynyl group may be either linear or branched. The carbon number of the alkynyl group is preferably 2 to 10, more preferably 2 to 6. For example, ethynyl group, 1-propynyl group, 2-propynyl group, 1-butynyl group, 2-butynyl group, 3-butynyl group, 1-pentynyl group, 2-pentynyl group, 3-pentynyl group, 4-pentynyl group, Examples include 1-hexynyl group, 2-hexynyl group, 3-hexynyl group, 4-hexynyl group, 5-hexynyl group, 4-methyl-2-pentynyl group and the like. Examples of the substituent that the alkynyl group may have include a halogen atom, a hydroxy group, and an amino group that may have a substituent. Specific examples of the halogen atom and specific examples of the amino group which may have a substituent are the same as described above.
 R、R、及びRにおけるアラルキル基の炭素数は、好ましくは7~16である。例えば、ベンジル基、フェネチル基、ナフチルメチル基、フェニルプロピル基等が挙げられる。アラルキル基は置換基を有していてもよい。その置換基としては、例えば、ハロゲン原子、ヒドロキシ基、置換基を有していてもよいアミノ基等が挙げられる。ハロゲン原子の具体例、置換基を有していてもよいアミノ基の具体例は、前述と同様である。 The number of carbon atoms of the aralkyl group in R 1 , R 2 , and R 3 is preferably 7-16. For example, benzyl group, phenethyl group, naphthylmethyl group, phenylpropyl group and the like can be mentioned. The aralkyl group may have a substituent. Examples of the substituent include a halogen atom, a hydroxy group, and an amino group which may have a substituent. Specific examples of the halogen atom and specific examples of the amino group which may have a substituent are the same as described above.
 Rにおけるアルコキシカルボニル基は、好ましくはアルコキシの炭素数が1~6のアルコキシカルボニル基であり、例えば、メトキシカルボニル、エトキシカルボニル、プロポキシカルボニル、イソプロポキシカルボニル、ブトキシカルボニル、イソブトキシカルボニル、sec-ブトキシカルボニル、tert-ブトキシカルボニル、ペンチルオキシカルボニル、ヘキシルオキシカルボニル等が挙げられる。アルコキシカルボニル基は置換基を有していてもよい。その置換基としては、例えば、ハロゲン原子、ヒドロキシ基、置換基を有していてもよいアミノ基等が挙げられる。ハロゲン原子の具体例は、前述のアルキル基の置換基であるハロゲン原子のそれと同様であり、置換基を有していてもよいアミノ基の具体例は、前述のアルキル基の置換基である置換基を有していてもよいアミノ基のそれと同様である。 The alkoxycarbonyl group in R 2 is preferably an alkoxycarbonyl group having 1 to 6 carbon atoms of alkoxy, for example, methoxycarbonyl, ethoxycarbonyl, propoxycarbonyl, isopropoxycarbonyl, butoxycarbonyl, isobutoxycarbonyl, sec-butoxy Examples include carbonyl, tert-butoxycarbonyl, pentyloxycarbonyl, hexyloxycarbonyl and the like. The alkoxycarbonyl group may have a substituent. Examples of the substituent include a halogen atom, a hydroxy group, and an amino group which may have a substituent. Specific examples of the halogen atom are the same as those of the halogen atom that is a substituent of the alkyl group described above, and specific examples of the amino group that may have a substituent include a substituent that is a substituent of the alkyl group described above. It is the same as that of the amino group which may have a group.
 式中、Xで表される酸素・単座配位子は、通常、ブレンステッド酸の共役塩基であり、例えば、アルコキシドアニオン(RO)、カルボキシレートアニオン(RCOO)等が挙げられる。 In the formula, the oxygen / monodentate ligand represented by X is usually a conjugate base of Bronsted acid, and examples thereof include an alkoxide anion (RO ) and a carboxylate anion (RCOO ).
 アルコキシドアニオン(RO)において、有機基Rは脂肪族基または芳香族基のいずれでもよい。また、脂肪族基は飽和脂肪族基または不飽和脂肪族基のいずれでもよい。有機基Rの炭素数は、好ましくは1~20、さらに好ましくは1~10、特に好ましくは1~6である。アルコキシドアニオン(RO)としては、例えば、メトキシド、エトキシド、プロポキシド、イソプロポキシド、ブトキシド、イソブトキシド、sec-ブトキシド、tert-ブトキシド、ペンチルオキシド、ヘキシルオキシド等が挙げられる。 In the alkoxide anion (RO ), the organic group R may be either an aliphatic group or an aromatic group. The aliphatic group may be either a saturated aliphatic group or an unsaturated aliphatic group. The carbon number of the organic group R is preferably 1-20, more preferably 1-10, and particularly preferably 1-6. Examples of the alkoxide anion (RO ) include methoxide, ethoxide, propoxide, isopropoxide, butoxide, isobutoxide, sec-butoxide, tert-butoxide, pentyl oxide, hexyl oxide and the like.
 カルボキシレートアニオン(RCOO)において、有機基Rは脂肪族基または芳香族基のいずれでもよい。また、脂肪族基は飽和脂肪族基または不飽和脂肪族基のいずれでもよい。有機基Rの炭素数は、好ましくは1~20、さらに好ましくは1~10、特に好ましくは1~6である。カルボキシレートアニオン(RCOO)としては、例えば、酢酸、プロピオン酸、安息香酸等のカルボン酸に対応するカルボキシレートアニオン等が挙げられる。 In the carboxylate anion (RCOO ), the organic group R may be either an aliphatic group or an aromatic group. The aliphatic group may be either a saturated aliphatic group or an unsaturated aliphatic group. The carbon number of the organic group R is preferably 1-20, more preferably 1-10, and particularly preferably 1-6. Examples of the carboxylate anion (RCOO ) include carboxylate anions corresponding to carboxylic acids such as acetic acid, propionic acid and benzoic acid.
 式中の[ ]内が酸素・二座配位子を表す。酸素・二座配位子の具体例としては、アセチルアセトン、3-メチル-2,4-ペンタンジオン、アセチルアセトアルデヒド、2,4-ヘキサンジオン、2,4-ヘプタンジオン、5-メチル-2,4-ヘキサンジオン、5,5-ジメチル-2,4-ヘキサンジオン、ベンゾイルアセトン、ベンゾイルアセトフェノン、サリチルアルデヒド、1,1,1-トリフルオロアセチルアセトン、1,1,1,5,5,5-ヘキサフルオロアセチルアセトン、3-メトキシ-2,4-ペンタンジオン、3-シアノ-2,4-ペンタンジオン、3-ニトロ-2,4-ペンタンジオン、3-クロロ-2,4-ペンタンジオン、アセト酢酸、アセト酢酸メチル、アセト酢酸エチル、アセト酢酸プロピル、サリチル酸、サリチル酸メチル、マロン酸、マロン酸ジメチル、マロン酸ジエチル等が挙げられる。中心金属に配位した状態では、酸素・二座配位子は、それからプロトンを一つまたはそれ以上取り去った構造となる。 [] In the formula represents an oxygen / bidentate ligand. Specific examples of the oxygen / bidentate ligand include acetylacetone, 3-methyl-2,4-pentanedione, acetylacetaldehyde, 2,4-hexanedione, 2,4-heptanedione, and 5-methyl-2,4. -Hexanedione, 5,5-dimethyl-2,4-hexanedione, benzoylacetone, benzoylacetophenone, salicylaldehyde, 1,1,1-trifluoroacetylacetone, 1,1,1,5,5,5-hexafluoro Acetylacetone, 3-methoxy-2,4-pentanedione, 3-cyano-2,4-pentanedione, 3-nitro-2,4-pentanedione, 3-chloro-2,4-pentanedione, acetoacetic acid, aceto Methyl acetate, ethyl acetoacetate, propyl acetoacetate, salicylic acid, methyl salicylate, malonic acid, malonic acid Methyl, diethyl, etc. malonate. In the state coordinated to the central metal, the oxygen / bidentate ligand has a structure in which one or more protons are removed therefrom.
 式(1)の金属錯体の具体例としては以下のものが挙げられる。中心金属MがAl(アルミニウム)の金属錯体として、例えば、アルミニウムアルキルアセトアセテートジイソプロピレート(アルミニウム9-オクタデシニルアセト-アセテートジイソプロポキシド)、アルミニウムエチルアセトアセテートジイソプロピレート、アルミニウムエチルアセトアセテートジn-ブチレート、アルミニウムプロピルアセトアセテートジイソプロピレート、アルミニウムn-ブチルアセトアセテートジイソプロピレート等が挙げられる。 Specific examples of the metal complex of the formula (1) include the following. Examples of metal complexes in which the central metal M is Al (aluminum) include, for example, aluminum alkyl acetoacetate diisopropylate (aluminum 9-octadecynyl aceto-acetate diisopropoxide), aluminum ethyl acetoacetate diisopropylate, aluminum ethyl acetoacetate Examples thereof include di n-butyrate, aluminum propyl acetoacetate diisopropylate, aluminum n-butyl acetoacetate diisopropylate and the like.
 また、中心金属MがTi(チタン)の金属錯体として、例えば、チタンアリルアセトアセテートトリイソプロポキサイド、チタンジ-n-ブトキサイド(ビス-2,4-ペンタンジオネート)、チタンジイソプロポキサイドビス(テトラメチルヘプタンジオネート)、チタンジイソプロポキサイドビス(エチルアセトアセテート)、チタンメチルフェノキサイド、チタンオキシドビス(ペンタンジオネート)等が挙げられる。 Examples of metal complexes in which the central metal M is Ti (titanium) include titanium allyl acetoacetate triisopropoxide, titanium di-n-butoxide (bis-2,4-pentanedionate), titanium diisopropoxide bis ( Tetramethylheptanedionate), titanium diisopropoxide bis (ethyl acetoacetate), titanium methylphenoxide, titanium oxide bis (pentanedionate) and the like.
 また、中心金属MがZr(ジルコニウム)の金属錯体として、例えば、ジルコニウムアリルアセトアセテートトリイソプロポキサイド、ジルコニウムジ-n-ブトキシド(ビス-2,4-ペンタンジオネート)、ジルコニウムジイソプロポキシド(ビス-2,4-ペンタンジオネート)、ジルコニウムジイソプロポキシドビス(テトラメチルヘプタンジオネート)、ジルコニウムジイソプロポキシドビス(エチルアセトアセテート)、ジルコニウムブトキシド(アセチルアセテート)(ビスエチルアセトアセテート)、ジルコニウムトリブトキシモノアセチルアセトネート等が挙げられる。 Examples of metal complexes in which the central metal M is Zr (zirconium) include, for example, zirconium allyl acetoacetate triisopropoxide, zirconium di-n-butoxide (bis-2,4-pentanedionate), zirconium diisopropoxide ( Bis-2,4-pentanedionate), zirconium diisopropoxide bis (tetramethylheptanedionate), zirconium diisopropoxide bis (ethylacetoacetate), zirconium butoxide (acetylacetate) (bisethylacetoacetate), Examples include zirconium tributoxy monoacetylacetonate.
 (C)成分は1種または2種以上を使用することができる。組成物中の(C)成分の含有量は特に限定はされないが、本発明の目的をより高いレベルで達成する観点から、組成物中の不揮発分の合計100質量%あたり、0.1~5質量%が好ましく、0.3~3質量%がより好ましい。0.1質量%以上とすることで、無機フィラーの十分な表面修飾を容易に達成し、目的の効果が得られ易くなる傾向となり、5質量%以下とすることで、(C)成分由来のアウトガスによる封止対象への影響を抑制し易くなる傾向となる。 (C) A component can use 1 type (s) or 2 or more types. The content of the component (C) in the composition is not particularly limited, but from the viewpoint of achieving the object of the present invention at a higher level, 0.1 to 5 per 100% by mass of the total nonvolatile content in the composition. % By mass is preferable, and 0.3 to 3% by mass is more preferable. By setting it as 0.1 mass% or more, sufficient surface modification of the inorganic filler is easily achieved, and the intended effect tends to be easily obtained. By setting it as 5 mass% or less, it is derived from the component (C). It tends to be easy to suppress the influence of the outgas on the object to be sealed.
 本発明の(C)成分とは異なる金属錯体、例えば、酸素・二座配位子が中心金属に結合した金属錯体であっても、その中心金属に酸素・単座配位子が結合していない金属錯体や、酸素・単座配位子が中心金属に結合した金属錯体であっても、その中心金属に酸素・二座配位子が結合していない金属錯体を、(A)成分及び(B)成分とともに配合しても、目的の優れた接着性と優れた屈曲性を兼ね備えた組成物を実現することができない。その理由は必ずしも明らかではないが、本発明の(C)成分である酸素・二座配位子及び酸素・単座配位子が中心金属に結合した構造を有する金属錯体は、加水分解されやすい酸素・単座配位子を有するため、(B)成分である無機フィラーの表面を修飾しやすく、(B)成分を(A)成分のポリオレフィン系樹脂及び/又はポリオレフィン系ゴム中に十分に分散させることができ、さらに、組成物が封止対象に貼合すると、酸素・二座配位子が、封止対象の表面に存在するガラス、プラスチック、無機膜等の表面の官能基とキレート交換して強固な結合を生じ、その結果、封止対象の屈曲等の変形に対する組成物の追従性が向上し、それによって、接着性及び屈曲性に優れた組成物になると推測される。 Even if it is a metal complex different from the component (C) of the present invention, for example, a metal complex in which an oxygen / bidentate ligand is bonded to the central metal, the oxygen / monodentate ligand is not bonded to the central metal. Even if it is a metal complex or a metal complex in which an oxygen / monodentate ligand is bonded to the central metal, the metal complex in which the oxygen / bidentate ligand is not bonded to the central metal, the component (A) and (B ) Even if it is blended with the component, a composition having both excellent adhesive properties and excellent flexibility cannot be realized. The reason is not necessarily clear, but the metal complex having a structure in which the oxygen / bidentate ligand and the oxygen / monodentate ligand, which are the component (C) of the present invention, are bonded to the central metal is easily hydrolyzed.・ Because it has a monodentate ligand, it is easy to modify the surface of the inorganic filler that is the component (B), and the component (B) is sufficiently dispersed in the polyolefin resin and / or polyolefin rubber of the component (A). Furthermore, when the composition is bonded to the object to be sealed, the oxygen / bidentate ligand chelate exchanges with functional groups on the surface of the object to be sealed, such as glass, plastic, and inorganic film. It is presumed that a strong bond is generated, and as a result, the followability of the composition with respect to deformation such as bending of the object to be sealed is improved, thereby resulting in a composition having excellent adhesiveness and flexibility.
<(D)粘着付与樹脂>
 本発明の封止用組成物には、必要により封止対象への接着性を高めるために、粘着付与樹脂(以下、「(D)成分」とも略称する)」を配合することができる。但し、本発明の樹脂組成物は、粘着付与樹脂を含まなくとも十分な接着性を達成可能であり、一方、粘着付与樹脂の配合は樹脂組成物の高温領域での安定性を低下させる傾向にある。従って、粘着付与樹脂を配合する場合の配合量は、組成物中の不揮発分の合計100質量%あたり、20質量%以下が好ましく、10質量%以下が好ましく、9質量%以下がより好ましく、8質量%以下がさらに好ましく、7質量%以下がさらに好ましく、6質量%以下がさらに好ましく、5質量%以下がさらに好ましく、4質量%以下がさらに好ましく、3質量%以下がさらに好ましく、2質量%以下がさらに好ましく、1質量%以下がさらに好ましく、0質量%が最も好ましい。
<(D) Tackifying resin>
To the sealing composition of the present invention, a tackifier resin (hereinafter also abbreviated as “component (D)”) ”can be blended in order to enhance the adhesiveness to the sealing target if necessary. However, the resin composition of the present invention can achieve sufficient adhesion without containing a tackifying resin, while the addition of the tackifying resin tends to lower the stability of the resin composition in the high temperature region. is there. Accordingly, the blending amount when blending the tackifier resin is preferably 20% by mass or less, preferably 10% by mass or less, more preferably 9% by mass or less, per 100% by mass of the total nonvolatile content in the composition. % By mass or less is more preferable, 7% by mass or less is further preferable, 6% by mass or less is more preferable, 5% by mass or less is further preferable, 4% by mass or less is further preferable, and 3% by mass or less is further preferable. The following is more preferable, 1% by mass or less is further preferable, and 0% by mass is most preferable.
 粘着付与樹脂は、特に限定されず、テルペン系粘着付与樹脂、テルペンフェノール系粘着付与樹脂、ロジン系粘着付与樹脂、水素添加テルペン系樹脂、芳香族変性テルペン系樹脂等、クマロン樹脂、インデン樹脂、石油樹脂(脂肪族系石油樹脂、水添脂環式石油樹脂、芳香族系石油樹脂、脂肪族芳香族共重合系石油樹脂、脂環族系石油樹脂、ジシクロペンタジエン(以下、「DCPD」とも略称する)系石油樹脂、水添ジシクロペンタジエン系石油樹脂等)等が挙げられるが、接着性及び透明性の観点から、ジシクロペンタジエン系石油樹脂、水添ジシクロペンタジエン系石油樹脂がより好ましく、水添ジシクロペンタジエン系石油樹脂が特に好ましい。 The tackifying resin is not particularly limited, and is a terpene tackifying resin, terpene phenol tackifying resin, rosin tackifying resin, hydrogenated terpene resin, aromatic modified terpene resin, etc., coumarone resin, indene resin, petroleum Resin (aliphatic petroleum resin, hydrogenated alicyclic petroleum resin, aromatic petroleum resin, aliphatic aromatic copolymer petroleum resin, alicyclic petroleum resin, dicyclopentadiene (hereinafter also abbreviated as “DCPD”) Etc.) from the viewpoint of adhesiveness and transparency, dicyclopentadiene petroleum resin, hydrogenated dicyclopentadiene petroleum resin are more preferable, Hydrogenated dicyclopentadiene petroleum resin is particularly preferred.
<(E)添加剤>
 本発明の効果を損なわない範囲内で、本発明の組成物には、鉱物油系軟化剤、植物油系軟化剤、サブファクチス、脂肪酸、脂肪酸塩、合成有機化合物、合成オイル等の軟化剤;硬化剤;ゴム粒子、シリコーンパウダー、ナイロンパウダー、フッ素樹脂パウダー等の有機充填剤;シリコン系、フッ素系、高分子系等の消泡剤またはレベリング剤;トリアゾール化合物、チアゾール化合物、トリアジン化合物、ポルフィリン化合物等の密着性付与剤;オルベン、ベントン等の増粘剤;酸化防止剤;熱安定剤;光安定剤等の添加剤を配合することができる。
<(E) Additive>
Within the scope of not impairing the effects of the present invention, the composition of the present invention includes a mineral oil softener, a vegetable oil softener, a sub factice, a fatty acid, a fatty acid salt, a synthetic organic compound, a synthetic oil and the like; Organic fillers such as rubber particles, silicone powder, nylon powder and fluororesin powder; defoamers or leveling agents such as silicon, fluorine and polymer; triazole compounds, thiazole compounds, triazine compounds, porphyrin compounds, etc. Adhesion imparting agents; thickeners such as olben and benton; antioxidants; heat stabilizers; additives such as light stabilizers can be blended.
(硬化剤)
 本発明の組成物がエポキシ基を有するポリイソブチレン系樹脂、エポキシ基を有するイソブチレン系ゴム等を含む場合は、本発明の組成物は硬化剤を含んでいてもよい。硬化剤は特に限定されず、アミン系硬化剤、グアニジン系硬化剤、イミダゾール系硬化剤、ホスホニウム系硬化剤、フェノール系硬化剤などが挙げられる。
(Curing agent)
When the composition of the present invention contains a polyisobutylene resin having an epoxy group, an isobutylene rubber having an epoxy group, or the like, the composition of the present invention may contain a curing agent. The curing agent is not particularly limited, and examples thereof include amine curing agents, guanidine curing agents, imidazole curing agents, phosphonium curing agents, and phenol curing agents.
 アミン系硬化剤としては、特に制限はないが、テトラメチルアンモニウムブロマイド、テトラブチルアンモニウムブロマイド等の4級アンモニウム塩;DBU(1,8-ジアザビシクロ[5.4.0]ウンデセン-7)、DBN(1,5-ジアザビシクロ[4.3.0]ノネン-5)、DBU-フェノール塩、DBU-オクチル酸塩、DBU-p-トルエンスルホン酸塩、DBU-ギ酸塩、DBU-フェノールノボラック樹脂塩等のジアザビシクロ化合物;ベンジルジメチルアミン、2-(ジメチルアミノメチル)フェノール、2,4,6-トリス(ジアミノメチル)フェノール(TAP)等の3級アミンおよびそれらの塩、芳香族ジメチルウレア、脂肪族ジメチルウレア等のジメチルウレア化合物;等が挙げられる。これらは1種または2種以上を組み合わせて使用してもよい。 The amine curing agent is not particularly limited, but includes quaternary ammonium salts such as tetramethylammonium bromide and tetrabutylammonium bromide; DBU (1,8-diazabicyclo [5.4.0] undecene-7), DBN ( 1,5-diazabicyclo [4.3.0] nonene-5), DBU-phenol salt, DBU-octylate, DBU-p-toluenesulfonate, DBU-formate, DBU-phenol novolac resin salt, etc. Diazabicyclo compounds; tertiary amines such as benzyldimethylamine, 2- (dimethylaminomethyl) phenol, 2,4,6-tris (diaminomethyl) phenol (TAP) and their salts, aromatic dimethylurea, aliphatic dimethylurea And the like. These may be used alone or in combination of two or more.
 グアニジン系硬化剤としては、特に制限はないが、ジシアンジアミド、1-メチルグアニジン、1-エチルグアニジン、1-シクロヘキシルグアニジン、1-フェニルグアニジン、1-(o-トリル)グアニジン、ジメチルグアニジン、ジフェニルグアニジン、トリメチルグアニジン、テトラメチルグアニジン、ペンタメチルグアニジン、1,5,7-トリアザビシクロ[4.4.0]デカ-5-エン、7-メチル-1,5,7-トリアザビシクロ[4.4.0]デカ-5-エン、1-メチルビグアニド、1-エチルビグアニド、1-n-ブチルビグアニド、1-n-オクタデシルビグアニド、1,1-ジメチルビグアニド、1,1-ジエチルビグアニド、1-シクロヘキシルビグアニド、1-アリルビグアニド、1-フェニルビグアニド、1-(o-トリル)ビグアニド等が挙げられる。これらは1種または2種以上を組み合わせて使用してもよい。 The guanidine curing agent is not particularly limited, but dicyandiamide, 1-methylguanidine, 1-ethylguanidine, 1-cyclohexylguanidine, 1-phenylguanidine, 1- (o-tolyl) guanidine, dimethylguanidine, diphenylguanidine, Trimethyl guanidine, tetramethyl guanidine, pentamethyl guanidine, 1,5,7-triazabicyclo [4.4.0] dec-5-ene, 7-methyl-1,5,7-triazabicyclo [4.4 .0] dec-5-ene, 1-methyl biguanide, 1-ethyl biguanide, 1-n-butyl biguanide, 1-n-octadecyl biguanide, 1,1-dimethyl biguanide, 1,1-diethyl biguanide, 1-cyclohexyl Biguanide, 1-allyl biguanide, 1-phenyl biguanide 1-(o-tolyl) biguanide, and the like. These may be used alone or in combination of two or more.
 イミダゾール系硬化剤としては、特に制限はないが、1H-イミダゾール、2-メチル-イミダゾール、2-フェニル-4-メチルイミダゾール、1-シアノエチルー2-エチル-4-メチル-イミダゾール、2-フェニル-4,5-ビス(ヒドロキシメチル)-イミダゾール、1-ベンジル-2-メチルイミダゾール、1-ベンジル-2-フェニルイミダゾール、2-エチル-4-メチルイミダゾール、2-フェニル-イミダゾール、2-ドデシル-イミダゾール、2-ヘプタデシルイミダゾール、1,2-ジメチル-イミダゾール等が挙げられる。これらは1種または2種以上を組み合わせて使用してもよい。 The imidazole curing agent is not particularly limited, but 1H-imidazole, 2-methyl-imidazole, 2-phenyl-4-methylimidazole, 1-cyanoethyl-2-ethyl-4-methyl-imidazole, 2-phenyl-4 , 5-bis (hydroxymethyl) -imidazole, 1-benzyl-2-methylimidazole, 1-benzyl-2-phenylimidazole, 2-ethyl-4-methylimidazole, 2-phenyl-imidazole, 2-dodecyl-imidazole, Examples include 2-heptadecylimidazole and 1,2-dimethyl-imidazole. These may be used alone or in combination of two or more.
 ホスホニウム系硬化剤としては、特に制限はないが、トリフェニルホスフィン、ホスホニウムボレート化合物、テトラフェニルホスホニウムテトラフェニルボレート、n-ブチルホスホニウムテトラフェニルボレート、テトラブチルホスホニウムデカン酸塩、(4-メチルフェニル)トリフェニルホスホニウムチオシアネート、テトラフェニルホスホニウムチオシアネート、ブチルトリフェニルホスホニウムチオシアネート等が挙げられる。これらは1種または2種以上を組み合わせて使用してもよい。 The phosphonium curing agent is not particularly limited, but is triphenylphosphine, phosphonium borate compound, tetraphenylphosphonium tetraphenylborate, n-butylphosphonium tetraphenylborate, tetrabutylphosphonium decanoate, (4-methylphenyl) triate. Examples thereof include phenylphosphonium thiocyanate, tetraphenylphosphonium thiocyanate, and butyltriphenylphosphonium thiocyanate. These may be used alone or in combination of two or more.
 フェノール系硬化剤としては、特に制限はないが、MEH-7700、MEH-7810、MEH-7851(明和化成社製)、NHN、CBN、GPH(日本化薬社製)、SN170、SN180、SN190、SN475、SN485、SN495、SN375、SN395(東都化成社製)、TD2090(DIC社製)等が挙げられる。トリアジン骨格含有フェノール系硬化剤の具体例としては、LA3018(DIC社製)等が挙げられる。トリアジン骨格含有フェノールノボラック硬化剤の具体例としては、LA7052、LA7054、LA1356(DIC社製)等が挙げられる。これらは1種または2種以上を組み合わせて使用してもよい。 The phenolic curing agent is not particularly limited, but is MEH-7700, MEH-7810, MEH-7785 (Maywa Kasei), NHN, CBN, GPH (Nippon Kayaku), SN170, SN180, SN190, SN475, SN485, SN495, SN375, SN395 (manufactured by Tohto Kasei Co., Ltd.), TD2090 (manufactured by DIC), and the like can be mentioned. Specific examples of the triazine skeleton-containing phenolic curing agent include LA3018 (manufactured by DIC). Specific examples of the triazine skeleton-containing phenol novolak curing agent include LA7052, LA7054, LA1356 (manufactured by DIC) and the like. These may be used alone or in combination of two or more.
 組成物中の硬化剤の含有量は特に制限はないが、封止層(組成物層)の耐湿性等の低下を防止するという観点から、組成物中の不揮発分の合計100質量%あたり、5質量%以下が好ましく、1質量%以下がより好ましい。一方、組成物のタックを抑制させるという観点から、組成物中の不揮発分の合計100質量%あたり、0.01質量%以上が好ましく、0.05質量%以上がより好ましい。 Although there is no restriction | limiting in particular in content of the hardening | curing agent in a composition, From a viewpoint of preventing the fall of the moisture resistance etc. of a sealing layer (composition layer), per 100 mass% of total non volatile matter in a composition, 5 mass% or less is preferable and 1 mass% or less is more preferable. On the other hand, from the viewpoint of suppressing tackiness of the composition, 0.01 mass% or more is preferable and 0.05 mass% or more is more preferable per 100 mass% of the total nonvolatile content in the composition.
<(F)有機溶剤>
 本発明の組成物には、例えば、後述の支持体上に組成物の層が形成された封止用シートを作製する際の組成物の塗工性等の観点から、有機溶剤を配合することができる。有機溶剤としては、例えば、アセトン、メチルエチルケトン(以下、「MEK」とも略称する)、シクロヘキサノン等のケトン類、酢酸エチル、酢酸ブチル、セロソルブアセテート、プロピレングリコールモノメチルエーテルアセテート、カルビトールアセテート等の酢酸エステル類、セロソルブ、ブチルカルビトール等のカルビトール類、トルエン、キシレン等の芳香族炭化水素類、ジメチルホルムアミド、ジメチルアセトアミド、N-メチルピロリドン等を挙げることができる。かかる有機溶剤は、1種のみを使用してもよく、2種以上を併用してもよい。有機溶剤の量は、特に限定されないが、塗工性の観点から組成物の粘度(25℃)が300~2000mPa・sとなる量を使用するのが好ましい。
<(F) Organic solvent>
In the composition of the present invention, for example, an organic solvent is blended from the viewpoint of the coating property of the composition when producing a sealing sheet in which a layer of the composition is formed on a support described later. Can do. Examples of the organic solvent include ketones such as acetone, methyl ethyl ketone (hereinafter abbreviated as “MEK”), cyclohexanone, and acetates such as ethyl acetate, butyl acetate, cellosolve acetate, propylene glycol monomethyl ether acetate, and carbitol acetate. Carbitols such as cellosolve and butyl carbitol, aromatic hydrocarbons such as toluene and xylene, dimethylformamide, dimethylacetamide, N-methylpyrrolidone and the like. Only 1 type may be used for this organic solvent and it may use 2 or more types together. The amount of the organic solvent is not particularly limited, but it is preferable to use an amount that gives a viscosity (25 ° C.) of the composition of 300 to 2000 mPa · s from the viewpoint of coating properties.
<組成物の製造方法>
 本発明の組成物は、上述の成分(少なくとも(A)成分~(C)成分を含む)を、混練ローラーや回転ミキサーなどを用いて混合することによって製造することができる。(B)成分と(C)成分を先に混合した後、その混合物に、他の成分(少なくとも(A)成分を含む他の成分)を混合してもよい。また、(C)成分と(B)成分以外のいずれかを混合した後、(B)成分を混合し、その後残りの成分を混合してもよい。
<Method for producing composition>
The composition of the present invention can be produced by mixing the above-described components (including at least the components (A) to (C)) using a kneading roller, a rotary mixer, or the like. After mixing (B) component and (C) component first, you may mix the other component (Other component containing at least (A) component) with the mixture. Moreover, after mixing (C) component and any other than (B) component, (B) component may be mixed and the remaining component may be mixed after that.
<用途>
 本発明の封止用組成物は、特に、薄膜トランジスタ、LCD素子、LED素子、EL素子(有機EL素子、無機EL素子)、太陽電池等の電子素子が薄厚のプラスチック基板(プラスチックフィルム)上に形成されたフレキシブル電子デバイスの封止用として好適である。フレキシブル電子デバイスの薄厚のプラスチック基板(プラスチックフィルム)には、例えば、ポリ(エチレンテレフタレート)(PET)、ポリ(ブチレンテレフタレート)(PBT)、ポリ(エチレンナフタレート)(PEN)、ポリカーボネート(PC)、ポリイミド(PI)、液晶ポリマー(LCP)、シクロオレフィンポリマー(COP)、ポリスルホン(PSO)及びポリ(p-フェニレンエーテルスルホン)(PES)などのフィルム等のプラスチックフィルムが使用されるが、本発明の組成物は、これら各種のプラスチックフィルムに対して、優れた接着性を示す。
<Application>
In particular, the sealing composition of the present invention is formed on a thin plastic substrate (plastic film) such as thin film transistors, LCD elements, LED elements, EL elements (organic EL elements, inorganic EL elements), and solar cells. It is suitable for sealing a flexible electronic device. Thin plastic substrates (plastic films) for flexible electronic devices include, for example, poly (ethylene terephthalate) (PET), poly (butylene terephthalate) (PBT), poly (ethylene naphthalate) (PEN), polycarbonate (PC), Plastic films such as films of polyimide (PI), liquid crystal polymer (LCP), cycloolefin polymer (COP), polysulfone (PSO) and poly (p-phenylene ether sulfone) (PES) are used. The composition exhibits excellent adhesion to these various plastic films.
 本発明の組成物は、封止対象に接するように配設される。好適には、支持体上に組成物の層が形成された封止用シートを組成物の層が封止対象(例えば、フレキシブル電子デバイスの素子基板に接するようにラミネートして、封止を行う。 The composition of the present invention is disposed so as to be in contact with the object to be sealed. Preferably, sealing is performed by laminating a sealing sheet having a composition layer formed on a support so that the composition layer is in contact with an element to be sealed (for example, an element substrate of a flexible electronic device). .
<封止用シート>
 例えば、有機溶剤を配合してワニス状にした本発明の組成物を支持体上に塗布し、得られた塗膜を加熱あるいは熱風吹きつけ等で乾燥することにより、支持体上に本発明の組成物の層が形成されたシートである封止用シートが得られる。組成物に、(A)成分として、酸無水物基を有するポリオレフィン系樹脂又は酸無水物基を有するポリオレフィン系ゴム、及び、エポキシ基を有するポリオレフィン系樹脂又は酸無水物基を有するポリオレフィン系ゴムを含む組成物を使用して調製した封止用シートの場合、その調製時に、酸無水物基とエポキシ基とを反応させて、架橋構造を形成しておくことで、組成物の層の耐透湿性が高まり、封止性能(空気中の水分や酸素の遮断性能等)がより高い封止用シートが得られる。
<Sealing sheet>
For example, the composition of the present invention, which is formed into a varnish by blending an organic solvent, is applied onto a support, and the resulting coating film is dried by heating or hot air blowing, etc. A sealing sheet which is a sheet on which a layer of the composition is formed is obtained. In the composition, as the component (A), a polyolefin resin having an acid anhydride group or a polyolefin rubber having an acid anhydride group, and a polyolefin resin having an epoxy group or a polyolefin rubber having an acid anhydride group In the case of a sealing sheet prepared by using a composition containing an acid anhydride group and an epoxy group at the time of preparation, a cross-linked structure is formed to prevent permeation resistance of the composition layer. A sheet for sealing with higher wettability and higher sealing performance (such as the ability to block moisture and oxygen in the air) can be obtained.
 封止用シートに使用する支持体としては、ポリエチレン、ポリプロピレン、ポリ塩化ビニル等のポリオレフィン、ポリエチレンテレフタレート(以下「PET」と略称することがある。)、ポリエチレンナフタレート等のポリエステル、ポリカーボネート、ポリイミドなどのプラスチックフィルムが挙げられる。プラスチックフィルムとしては、特にPETが好ましい。また支持体はアルミ箔、ステンレス箔、銅箔等の金属箔であってもよい。支持体はマット処理、コロナ処理の他、離型処理を施してあってもよい(以下、「離型処理が施された支持体」を「剥離性支持体」とも称す)。離型処理としては、例えば、シリコーン樹脂系離型剤、アルキッド樹脂系離型剤、フッ素樹脂系離型剤等の離型剤による離型処理が挙げられる。本発明において支持体が離型層を有する場合、該離型層も支持体の一部とみなす。支持体の厚さは、特に限定されないが、取扱い性等の観点から、好ましくは20~200μm、より好ましくは20~125μmである。 Examples of the support used for the sealing sheet include polyolefins such as polyethylene, polypropylene, and polyvinyl chloride, polyethylene terephthalate (hereinafter sometimes referred to as “PET”), polyesters such as polyethylene naphthalate, polycarbonate, polyimide, and the like. The plastic film is mentioned. As the plastic film, PET is particularly preferable. The support may be a metal foil such as an aluminum foil, a stainless steel foil, or a copper foil. The support may be subjected to a release treatment in addition to the mat treatment and the corona treatment (hereinafter, the “support subjected to the release treatment” is also referred to as “releasable support”). Examples of the release treatment include a release treatment with a release agent such as a silicone resin release agent, an alkyd resin release agent, and a fluororesin release agent. In the present invention, when the support has a release layer, the release layer is also regarded as a part of the support. The thickness of the support is not particularly limited, but is preferably 20 to 200 μm, more preferably 20 to 125 μm, from the viewpoint of handleability and the like.
 剥離性支持体は、本発明の組成物の層が形成される側の片面に離型処理が施された支持体であり、封止用シートを実際に封止構造の形成に使用する前に剥離される支持体である。このため、剥離性支持体には必ずしも防湿性は必要ではないが、封止用シートが封止に供されるまでの保管期間の組成物の層への水分の侵入を防止する観点からは、防湿性を有することが好ましい。封止用シートの防湿性を向上させるために、バリア層を有するプラスチックフィルムを支持体として用いてもよい(以下、かかるバリア層を有するプラスチックフィルムを「防湿性支持体」とも称す)。このバリア層としては、例えば、窒化ケイ素等の窒化物、酸化アルミニウム等の酸化物、ステンレス箔、アルミ箔の金属箔等が挙げられる。プラスチックフィルムとしては、上述のプラスチックフィルムが挙げられる。バリア層を有するプラスチックフィルムは市販品を使用してもよい。また、防湿性支持体は金属箔とプラスチックフィルムを複合ラミネートしたフィルムであってもよい。例えば、アルミ箔付きポリエチレンテレフタレートフィルムの市販品としては、東海東洋アルミ販売社製「PETツキAL1N30」、福田金属社製「PETツキAL3025」等が挙げられる。また、2層以上の複層構造を有するもの、例えば、上記のプラスチックフィルムと上記の金属箔とを接着剤を介して張り合わせたものも使用できる。このものは安価であり、ハンドリング性の観点からも有利である。 The peelable support is a support that has been subjected to a release treatment on one side on which the layer of the composition of the present invention is formed, and before the sealing sheet is actually used to form a sealing structure. A support to be peeled off. For this reason, the peelable support is not necessarily moisture-proof, but from the viewpoint of preventing moisture from entering the composition layer during the storage period until the sealing sheet is subjected to sealing, It is preferable to have moisture resistance. In order to improve the moisture resistance of the sealing sheet, a plastic film having a barrier layer may be used as a support (hereinafter, the plastic film having a barrier layer is also referred to as a “moisture-proof support”). Examples of the barrier layer include nitrides such as silicon nitride, oxides such as aluminum oxide, stainless steel foil, and metal foil of aluminum foil. Examples of the plastic film include the above-described plastic film. A commercial product may be used as the plastic film having the barrier layer. The moisture-proof support may be a film obtained by laminating a metal foil and a plastic film. For example, commercially available products of polyethylene terephthalate film with aluminum foil include “PET Tsuki AL1N30” manufactured by Tokai Toyo Aluminum Sales Co., “PET Tsuki AL3025” manufactured by Fukuda Metals. Moreover, what has the multilayer structure of 2 or more layers, for example, what bonded together said plastic film and said metal foil through the adhesive agent can also be used. This is inexpensive and advantageous from the viewpoint of handling properties.
 封止用シートにおいて、組成物の層は、保護フィルムで保護されていてもよい。保護フィルムで保護することにより、組成物層表面へのゴミ等の付着やキズを防止することができる。保護フィルムは、支持体と同様のプラスチックフィルムを用いるのが好ましい。また、保護フィルムもマット処理、コロナ処理の他、離型処理を施してあってもよい。保護フィルムの厚さは特に制限されないが、通常1~150μm、好ましくは10~100μmである。 In the sealing sheet, the composition layer may be protected by a protective film. By protecting with a protective film, it is possible to prevent dust from adhering to the surface of the composition layer and scratches. The protective film is preferably a plastic film similar to the support. Further, the protective film may be subjected to a release treatment in addition to the mat treatment and the corona treatment. The thickness of the protective film is not particularly limited, but is usually 1 to 150 μm, preferably 10 to 100 μm.
 封止用シートは、支持体に、防湿性を有し、かつ、透過率の高い支持体を使用すれば、封止用シートを、封止対象にラミネートすることで、高い耐湿性を備えた封止構造を形成することができる。このような、防湿性を有し、かつ、透過率の高い支持体としては、表面に酸化ケイ素(シリカ)、窒化ケイ素、SiCN、アモルファスシリコン等の無機物を蒸着させたプラスチックフィルム等が挙げられる。プラスチックフィルムとしては、例えば、ポリエチレン、ポリプロピレン、ポリ塩化ビニル等のポリオレフィン、ポリエチレンテレフタレート、ポリエチレンナフタレート等のポリエステル、ポリカーボネート、ポリイミド等が挙げられる。プラスチックフィルムとしては、特にPETが好ましい。市販されている防湿性を有するプラスチックフィルムの例としては、テックバリアHX、AX、LX、Lシリーズ(三菱樹脂社製)やさらに防湿効果を高めたX-BARRIER(三菱樹脂社製)等が挙げられる。支持体として、2層以上の複層構造を有するものを使用しても良い。 The sealing sheet has high moisture resistance by laminating the sealing sheet on the object to be sealed if the supporting body has moisture resistance and a support having high transmittance. A sealing structure can be formed. Examples of such a support having moisture resistance and high transmittance include a plastic film in which an inorganic substance such as silicon oxide (silica), silicon nitride, SiCN, and amorphous silicon is deposited on the surface. Examples of the plastic film include polyolefins such as polyethylene, polypropylene, and polyvinyl chloride, polyesters such as polyethylene terephthalate and polyethylene naphthalate, polycarbonate, and polyimide. As the plastic film, PET is particularly preferable. Examples of commercially available moisture-proof plastic films include Tech Barrier HX, AX, LX, L series (Mitsubishi Plastics) and X-BARRIER (Mitsubishi Plastics) with improved moisture resistance. It is done. A support having a multilayer structure of two or more layers may be used.
 なお、剥離性支持体を有した封止用シートの場合、封止用シートを封止対象にラミネート後、支持体を剥離して、別途用意した封止基材(防湿性を有するプラスチックフィルム、銅箔、アルミニウム箔などの金属箔)をラミネートすることができる。 In the case of a sealing sheet having a peelable support, after the sealing sheet is laminated to a sealing target, the support is peeled off, and a separately prepared sealing substrate (a moisture-proof plastic film, Metal foil such as copper foil and aluminum foil) can be laminated.
 本発明の封止用シートの支持体には円偏光板を使用することができる。一般に円偏光板は偏光板と1/4波長板により構成される。円偏光板を支持体として使用する場合は、一般に1/4波長板が組成物層側に配置される。また、円偏光板と防湿性支持体の双方を含む支持体を用いる場合、好ましくは防湿性支持体が組成物層側に配置され、円偏光板の1/4波長板が防湿性支持体側に配置される。防湿性支持体と円偏光板は接着剤等により接着することができ、接着剤としては、透明性の高い接着剤であれば特に限定されず、例えば、アクリル系接着剤、ポリビニルアルコール系接着剤等が使用される。 A circularly polarizing plate can be used as the support for the sealing sheet of the present invention. Generally, a circularly polarizing plate is composed of a polarizing plate and a quarter wavelength plate. When using a circularly-polarizing plate as a support body, a quarter wavelength plate is generally arrange | positioned at the composition layer side. Moreover, when using the support body which contains both a circularly-polarizing plate and a moisture-proof support body, Preferably a moisture-proof support body is arrange | positioned at the composition layer side, and the quarter wavelength plate of a circularly-polarizing plate is on the moisture-proof support side. Be placed. The moisture-proof support and the circularly polarizing plate can be bonded with an adhesive or the like, and the adhesive is not particularly limited as long as it is a highly transparent adhesive. For example, an acrylic adhesive, a polyvinyl alcohol adhesive Etc. are used.
 なお、円偏光板には、偏光子(偏光板)を保護する保護フィルムを設けることができ、この保護フィルムも公知のものを使用することができ、例えば、特開2016-105166号公報や国際公開2014/003189号パンフレット等に記載の保護フィルムを挙げることができる。 The circularly polarizing plate can be provided with a protective film for protecting the polarizer (polarizing plate), and a known protective film can also be used. For example, JP-A-2016-105166 and International Mention may be made of the protective film described in the published 2014/003189 pamphlet and the like.
 本発明の封止用シートにおいて、支持体は、剥離性支持体、防湿性支持体および円偏光板から選ばれる少なくとも一つで構成されていることが好ましい。 In the sealing sheet of the present invention, the support is preferably composed of at least one selected from a peelable support, a moisture-proof support and a circularly polarizing plate.
<フレキシブル電子デバイス>
 本発明の組成物によって、電子素子が封止された、フレキシブル電子デバイスを製造する場合、上記封止用シートを用いて封止を行うのが好適である。すなわち、フレキシブル電子デバイスの、電子素子を具備するプラスチック基板(素子基板)に本発明の封止用シートをラミネートすることで、電子素子が封止されたフレキシブル電子デバイスが得られる。
<Flexible electronic devices>
When a flexible electronic device in which an electronic element is sealed with the composition of the present invention is manufactured, it is preferable to perform sealing using the sealing sheet. That is, the flexible electronic device in which the electronic element is sealed is obtained by laminating the sealing sheet of the present invention on a plastic substrate (element substrate) including the electronic element of the flexible electronic device.
 本発明の封止用組成物は、封止対象への接着性に優れ、かつ、屈曲性に優れるので、フレキシブル電子デバイスの高性能化及び長寿命化を図ることができる。 Since the sealing composition of the present invention has excellent adhesion to a sealing object and excellent flexibility, it is possible to improve the performance and life of flexible electronic devices.
 以下に実施例を示して本発明をより詳しく説明するが、本発明はこれらの実施例に限定されるものではない。なお、以下の記載において、成分および共重合単位の量における「部」および「%」は、特に断りがない限り、それぞれ、「質量部」および「質量%」を意味する。 Hereinafter, the present invention will be described in more detail with reference to examples. However, the present invention is not limited to these examples. In the following description, “parts” and “%” in the amounts of components and copolymerized units mean “parts by mass” and “% by mass”, respectively, unless otherwise specified.
 実施例および比較例に用いた原料は以下の通りである。
(A)ポリオレフィン系樹脂又はポリオレフィン系ゴム
・065(JSR社製):ブチルゴム(イソブチレン・イソプレン共重合体)
・N50SF(BASF社製):ポリイソブチレン(数平均分子量:400,000
・ER850(星光PMC社製):グリシジルメタクリレート(GMA)変性ブチルゴム(エポキシ基濃度0.64mmol/g、数平均分子量110,000)の20%トルエン溶液
・ER641(星光PMC社製):無水マレイン酸(MA)変性ブチルゴム(酸無水物基濃度0.46mmol/g、数平均分子量57,000)の35%トルエン溶液
The raw materials used in Examples and Comparative Examples are as follows.
(A) Polyolefin resin or polyolefin rubber 065 (manufactured by JSR): Butyl rubber (isobutylene / isoprene copolymer)
N50SF (manufactured by BASF): polyisobutylene (number average molecular weight: 400,000)
ER850 (manufactured by Seiko PMC): 20% toluene solution of glycidyl methacrylate (GMA) modified butyl rubber (epoxy group concentration 0.64 mmol / g, number average molecular weight 110,000) ER641 (manufactured by Seiko PMC): maleic anhydride (MA) 35% toluene solution of modified butyl rubber (acid anhydride group concentration 0.46 mmol / g, number average molecular weight 57,000)
(B)無機フィラー
・DHT-4C(協和化学工業社製):半焼成ハイドロタルサイト(平均粒子径400nm、BET比表面積15m/g)
・MK300(コープケミカル社製):マイカ(平均粒子径15μm)
・STN(コープケミカル社製):スメクタイト(平均粒子径50nm)
(B) Inorganic filler DHT-4C (manufactured by Kyowa Chemical Industry Co., Ltd.): Semi-calcined hydrotalcite (average particle diameter 400 nm, BET specific surface area 15 m 2 / g)
MK300 (manufactured by Coop Chemical Co.): mica (average particle size 15 μm)
STN (manufactured by Corp Chemical): Smectite (average particle size 50 nm)
(C)金属錯体
(チタン錯体)
・オルガチックスTC710(マツモトファインケミカル社製):チタンジイソプロポキシビス(エチルアセトアセテート) Ti含有量7.1質量%
・オルガチックスTC750(マツモトファインケミカル社製):チタンジイソプロポキシビス(エチルアセトアセテート) Ti含有量11.0質量%
(C) Metal complex (titanium complex)
ORGATICS TC710 (manufactured by Matsumoto Fine Chemical Co.): titanium diisopropoxybis (ethyl acetoacetate) Ti content 7.1% by mass
ORGATICS TC750 (manufactured by Matsumoto Fine Chemical Co.): titanium diisopropoxybis (ethyl acetoacetate) Ti content 11.0% by mass
(アルミニウム錯体)
・アルミキレートM(川研ファインケミカル社製):アルミニウムアルキルアセトアセテートジイソプロピレート
(Aluminum complex)
・ Aluminum chelate M (manufactured by Kawaken Fine Chemical Co.): Aluminum alkyl acetoacetate diisopropylate
(ジルコニウム錯体)
・オルガチックスZC540(マツモトファインケミカル社製):ジルコニウムトリブトキシモノアセチルアセトネート
(Zirconium complex)
・ Orgachix ZC540 (Matsumoto Fine Chemical Co., Ltd.): zirconium tributoxy monoacetylacetonate
(C’)金属錯体
(チタン錯体)
・プレンアクト38S(味の素ファインテクノ社製):チタンイソプロポキシトリス(ジオクチルピロホスフェート)
(C ') Metal complex (titanium complex)
・ Plenact 38S (manufactured by Ajinomoto Fine Techno Co.): Titanium isopropoxy tris (dioctyl pyrophosphate)
(アルミニウム錯体)
・AL-3200(松本ファインケミカル社製):アルミニウムビスエチルアセトアセテートモノアセチルアセトネート
(Aluminum complex)
AL-3200 (Matsumoto Fine Chemical Co., Ltd.): Aluminum bisethyl acetoacetate monoacetylacetonate
(ジルコニウム錯体)
・オルガチックスZC320(マツモトファインケミカル社製):ステアリン酸ジルコニウム
(Zirconium complex)
・ Orgachix ZC320 (Matsumoto Fine Chemical Co., Ltd.): Zirconium stearate
(E)添加剤
(E-1)酸化防止剤
・Irganox 1010(BASF社製)
(E-2)硬化剤
・アミン系硬化剤(2,4,6-トリス(ジアミノメチル)フェノール、以下「TAP」と略記する。)
(E) Additive (E-1) Antioxidant Irganox 1010 (manufactured by BASF)
(E-2) Curing agent / Amine curing agent (2,4,6-tris (diaminomethyl) phenol, hereinafter abbreviated as “TAP”)
(F)有機溶剤
・トルエン
・イプゾール#1000(出光社製):芳香族系混合溶剤
(F) Organic solvent / toluene / Ipsol # 1000 (made by Idemitsu): Aromatic mixed solvent
<実施例1>
 ブチルゴム(065)3部にイプゾール100を20部加えて3時間撹拌し、アルミニウムアルキルアセトアセテートジイソプロピレート(アルミキレートM)1部および半焼成ハイドロタルサイト(DHT-4C)20部を3本ロールで分散させて、混合物を得た。得られた混合物に、ブチルゴム(065)87部にトルエンを493部加えて3時間撹拌して得た溶解品を全量加え、さらに酸化防止剤(Irganox 1010)1部とトルエン9部を配合し、得られた混合物を高速回転ミキサーで均一に分散して、組成物のワニス(ワニス1)を得た。
<Example 1>
Add 20 parts of ipsol 100 to 3 parts of butyl rubber (065) and stir for 3 hours. Roll 3 parts of 1 part of aluminum alkyl acetoacetate diisopropylate (aluminum chelate M) and 20 parts of semi-calcined hydrotalcite (DHT-4C). To obtain a mixture. To the obtained mixture, 493 parts of toluene was added to 87 parts of butyl rubber (065), and the total amount of the dissolved product obtained by stirring for 3 hours was added. Further, 1 part of an antioxidant (Irganox 1010) and 9 parts of toluene were blended. The obtained mixture was uniformly dispersed with a high-speed rotary mixer to obtain a varnish (varnish 1) of the composition.
<実施例2>
 ブチルゴム(065)3部にイプゾール100を20部加えて3時間撹拌し、アルミニウムアルキルアセトアセテートジイソプロピレート(アルミキレートM)1部および半焼成ハイドロタルサイト(DHT-4C)20部を3本ロールで分散させて、混合物を得た。得られた混合物に、ブチルゴム(065)37部にトルエンを226.6部加えて3時間撹拌し、グリシジルメタクリレート変性ブチルゴム(ER850、20%トルエン溶液)100部、及び無水マレイン酸変性ブチルゴム(ER641,35%トルエン溶液)86部、酸化防止剤(Irganox 1010)1部とトルエン9部、アミン系硬化剤(TAP)0.2部を配合し、得られた混合物を高速回転ミキサーで均一に分散して、組成物のワニス(ワニス2)を得た。
<Example 2>
Add 20 parts of ipsol 100 to 3 parts of butyl rubber (065) and stir for 3 hours. Roll 3 parts of 1 part of aluminum alkyl acetoacetate diisopropylate (aluminum chelate M) and 20 parts of semi-calcined hydrotalcite (DHT-4C). To obtain a mixture. To the obtained mixture, 226.6 parts of toluene was added to 37 parts of butyl rubber (065) and stirred for 3 hours. 100 parts of glycidyl methacrylate-modified butyl rubber (ER850, 20% toluene solution) and maleic anhydride-modified butyl rubber (ER641, 35 parts toluene solution) 86 parts, antioxidant (Irganox 1010) 1 part, toluene 9 parts, amine curing agent (TAP) 0.2 part, and the resulting mixture is uniformly dispersed with a high-speed rotary mixer Thus, a varnish (varnish 2) of the composition was obtained.
<実施例3>
 ブチルゴム(065)の代わりに、ポリイソブチレン(Oppanol N50SF)を使用し、半焼成ハイドロタルサイト(DHT-4C)20部を15部にし、アルミニウムアルキルアセトアセテートジイソプロピレート(アルミキレートM)1部の代わりに、チタンジイソプロポキシビス(エチルアセトアセテート)(TC710)1部を加えた以外はワニス2(実施例2)と同様にして、組成物のワニス(ワニス3)を得た。
<Example 3>
Instead of butyl rubber (065), polyisobutylene (Oppanol N50SF) is used, 20 parts of semi-calcined hydrotalcite (DHT-4C) is made 15 parts, and 1 part of aluminum alkyl acetoacetate diisopropylate (aluminum chelate M) is added. Instead, a varnish (varnish 3) of the composition was obtained in the same manner as varnish 2 (Example 2) except that 1 part of titanium diisopropoxybis (ethylacetoacetate) (TC710) was added.
<実施例4>
 チタンジイソプロポキシビス(エチルアセトアセテート)(TC710)1部の代わりに、チタンジイソプロポキシビス(エチルアセトアセテート)(TC750)1部を加えた以外はワニス3(実施例3)と同様にして、組成物のワニス(ワニス4)を得た。
<Example 4>
Instead of 1 part of titanium diisopropoxybis (ethylacetoacetate) (TC710), 1 part of titanium diisopropoxybis (ethylacetoacetate) (TC750) was added and the same procedure as in Varnish 3 (Example 3) A varnish (varnish 4) of the composition was obtained.
<実施例5>
 チタンジイソプロポキシビス(エチルアセトアセテート)(TC710)1部の代わりに、ジルコニウムトリブトキシモノアセチルアセトネート(ZC540)2.2部を加えた以外はワニス3(実施例3)と同様にして、組成物のワニス(ワニス5)を得た。
<Example 5>
Instead of 1 part of titanium diisopropoxybis (ethyl acetoacetate) (TC710), the same procedure as in varnish 3 (Example 3) except that 2.2 parts of zirconium tributoxy monoacetylacetonate (ZC540) was added, A varnish (varnish 5) of the composition was obtained.
<実施例6>
 ブチルゴム(065)3部にイプゾール100を20部加えて3時間撹拌し、アルミニウムアルキルアセトアセテートジイソプロピレート(アルミキレートM)1部およびマイカ(MK300)20部を3本ロールで分散させて、混合物を得た。得られた混合物に、ブチルゴム(065)87部にトルエンを493部加えて3時間撹拌して得た溶解品を全量加え、得られた混合物を高速回転ミキサーで均一に分散して、組成物のワニス(ワニス6)を得た。
<Example 6>
Add 20 parts of ipsol 100 to 3 parts of butyl rubber (065) and stir for 3 hours. Disperse 1 part of aluminum alkyl acetoacetate diisopropylate (aluminum chelate M) and 20 parts of mica (MK300) with 3 rolls. Got. To the obtained mixture, 493 parts of toluene was added to 87 parts of butyl rubber (065) and all the dissolved product obtained by stirring for 3 hours was added, and the resulting mixture was uniformly dispersed with a high-speed rotary mixer. A varnish (varnish 6) was obtained.
<実施例7>
 マイカ(MK300)20部の代わりに、スメクタイト(STN)20部を加えた以外はワニス6(実施例6)と同様にして、組成物のワニス(ワニス7)を得た。
<Example 7>
A varnish (varnish 7) of the composition was obtained in the same manner as varnish 6 (Example 6) except that 20 parts of smectite (STN) was added instead of 20 parts of mica (MK300).
<比較例1>
 アルミニウムアルキルアセトアセテートジイソプロピレート(アルミキレートM)1部を含まない以外はワニス1(実施例1)と同様にして、組成物のワニス(ワニス8)を得た。
<Comparative Example 1>
A varnish (varnish 8) of the composition was obtained in the same manner as varnish 1 (Example 1) except that 1 part of aluminum alkyl acetoacetate diisopropylate (aluminum chelate M) was not included.
<比較例2>
 ジルコニウムトリブトキシモノアセチルアセトネート(ZC540)2.2部の代わりに、ステアリン酸ジルコニウム(ZC320)1.2部を使用した以外はワニス5(実施例5)と同様にして、組成物のワニス(ワニス9)を得た。
<Comparative example 2>
In the same manner as Varnish 5 (Example 5) except that 1.2 parts of zirconium stearate (ZC320) was used instead of 2.2 parts of zirconium tributoxy monoacetylacetonate (ZC540), the varnish ( Varnish 9) was obtained.
<比較例3>
 アルミニウムアルキルアセトアセテートジイソプロピレート(アルミキレートM)1部を含まない以外はワニス6(実施例6)と同様にして、組成物のワニス(ワニス10)を得た。
<Comparative Example 3>
A varnish (varnish 10) of the composition was obtained in the same manner as varnish 6 (Example 6) except that 1 part of aluminum alkyl acetoacetate diisopropylate (aluminum chelate M) was not included.
<比較例4>
 チタンジイソプロポキシビス(エチルアセトアセテート)(TC710)1部の代わりに、アルミニウムビスエチルアセトアセテートモノアセチルアセトネート(AL-3200)1部を加えた以外はワニス3(実施例3)と同様にして、組成物のワニス(ワニス11)を得た。
<Comparative example 4>
Similar to Varnish 3 (Example 3), except that 1 part of aluminum bisethylacetoacetate monoacetylacetonate (AL-3200) was added instead of 1 part of titanium diisopropoxybis (ethylacetoacetate) (TC710). Thus, a composition varnish (varnish 11) was obtained.
<比較例5>
 チタンジイソプロポキシビス(エチルアセトアセテート)(TC710)1部の代わりに、チタンイソプロポキシトリス(ジオクチルピロホスフェート)(プレンアクト38S)1部を加えた以外はワニス3(実施例3)と同様にして、組成物のワニス(ワニス12)を得た。
<Comparative Example 5>
Instead of 1 part of titanium diisopropoxybis (ethylacetoacetate) (TC710), 1 part of titanium isopropoxytris (dioctylpyrophosphate) (preneact 38S) was added and the same as in varnish 3 (Example 3). A varnish (varnish 12) of the composition was obtained.
<封止用シートの作製>
 各実施例及び各比較例で調製した各ワニスを使用し、シリコーン系離型処理剤で離型処理されたPETフィルムの離型処理面上にワニスを塗工し、120℃、15分乾燥して、封止用シート(各実施例及び各比較例の封止用シート)を作製した。
<Preparation of sealing sheet>
Using each varnish prepared in each example and each comparative example, the varnish was coated on the release-treated surface of the PET film which was release-treated with the silicone-based release treatment agent, and dried at 120 ° C. for 15 minutes. Thus, a sealing sheet (sealing sheet of each example and each comparative example) was produced.
<評価>
 各実施例及び各比較例の封止用シートについて以下の評価を行った。
<Evaluation>
The following evaluation was performed about the sheet | seat for sealing of each Example and each comparative example.
<接着性評価>
 封止用シートを長さ50mmおよび幅20mmにカットし、カットした封止用シートを、バッチ式真空ラミネーター(ニチゴー・モートン社製、V-160)を用いて、長さ100mmおよび幅25mmのアルミ箔/PET複合フィルム「PETツキAL1N30」(アルミ箔:30μm、PET:25μm、:東洋アルミ販売社製商品名)のPET面にラミネートした。ラミネートは、温度80℃、時間300秒、圧力0.3MPaの条件で行った。そして封止用シートのシリコーン系離型処理剤で離型処理されたPETフィルムを剥離し、露出した組成物層上に、さらにガラス板(長さ76mm、幅26mm、厚さ1.2mm、マイクロスライドガラス)を上記と同じ条件でラミネートした。得られた積層体について、アルミ箔/PET複合フィルムの長さ方向に対して、180度方向に、引張り速度を300mm/分として剥離したときの、ガラス板面に対する接着強度(剥離強度)を測定し、下記の基準で接着性を評価した。
<Adhesion evaluation>
The sealing sheet was cut to a length of 50 mm and a width of 20 mm, and the cut sealing sheet was made of aluminum having a length of 100 mm and a width of 25 mm using a batch-type vacuum laminator (Nichigo Morton, V-160). The film was laminated on the PET surface of a foil / PET composite film “PET Tsuki AL1N30” (aluminum foil: 30 μm, PET: 25 μm, trade name: Toyo Aluminum Sales Co., Ltd.). Lamination was performed under conditions of a temperature of 80 ° C., a time of 300 seconds, and a pressure of 0.3 MPa. Then, the PET film release-treated with the silicone-type release treatment agent of the sealing sheet is peeled off, and a glass plate (length 76 mm, width 26 mm, thickness 1.2 mm, micrometer) is further formed on the exposed composition layer. A glass slide was laminated under the same conditions as above. With respect to the obtained laminate, the adhesive strength (peel strength) to the glass plate surface when peeled at a tensile rate of 300 mm / min in the direction of 180 degrees with respect to the length direction of the aluminum foil / PET composite film is measured. Then, the adhesiveness was evaluated according to the following criteria.
 良好(○):接着強度が0.3kgf/cm以上
 可(△):接着強度が0.2以上~0.3kgf/cm未満
 不良(×):接着強度が0.2kgf/cm未満
Good (◯): Adhesive strength of 0.3 kgf / cm or higher Possible (Δ): Adhesive strength of 0.2 or higher to less than 0.3 kgf / cm Poor (x): Adhesive strength of less than 0.2 kgf / cm
<屈曲性評価>
<サンプル>
(1)サンプルA
 シクロオレフィンポリマーフィルム(厚さ:50μm)上に無機膜(厚さ500nmのSiO膜)を形成したバリアフィルムの無機膜面上に、封止用シートをバッチ式真空ラミネーター(ニチゴー・モートン社製、V-160)を用いて貼り合わせ、屈曲性評価用フィルム(サンプルA)とした。
<Flexibility evaluation>
<Sample>
(1) Sample A
A batch type vacuum laminator (manufactured by Nichigo Morton Co., Ltd.) is used on the inorganic film surface of the barrier film in which the inorganic film (SiO 2 film having a thickness of 500 nm) is formed on the cycloolefin polymer film (thickness: 50 μm). , V-160) to obtain a film for evaluating flexibility (sample A).
(2)サンプルB
 シクロオレフィンポリマーフィルム(厚さ:50μm)上に無機膜(厚さ500nmのSiO膜)を形成したバリアフィルムの無機膜面上に、封止用シートをバッチ式真空ラミネーター(ニチゴー・モートン社製、V-160)を用いて貼り合わせて貼合フィルムを得、貼合フィルムの封止用シート側とポリイミドフィルム(厚さ25μm)をバッチ式真空ラミネーター(ニチゴー・モートン社製、V-160)を用いて貼り合わせて、屈曲性評価用フィルム(サンプルB)とした。
(2) Sample B
A batch type vacuum laminator (manufactured by Nichigo Morton Co., Ltd.) is used on the inorganic film surface of the barrier film in which the inorganic film (SiO 2 film having a thickness of 500 nm) is formed on the cycloolefin polymer film (thickness: 50 μm). , V-160) to obtain a laminated film, and a batch-type vacuum laminator (V-160, manufactured by Nichigo Morton Co., Ltd.) is used for the sealing film side of the laminated film and the polyimide film (thickness 25 μm). Was used as a film for evaluation of flexibility (sample B).
<屈曲性試験>
(1)サンプルA
 屈曲性評価用フィルムをU字折り返し試験機(ユアサ社製)にて、封止用シートが内側になるように設置し、曲率半径5mm、屈曲速度60rpm/minにて、1万回ずつ屈曲し、屈曲後の無機膜のクラックを顕微鏡にて確認した。屈曲性評価は10万回まで実施した。
(2)サンプルB
 屈曲性評価用フィルムをU字折り返し試験機(ユアサ社製)にて、シクロオレフィンポリマーフィルムが内側になるように設置し、曲率半径5mm、屈曲速度60rpm/minにて、千回ずつ屈曲し、屈曲後の無機膜のクラックを顕微鏡にて確認した。屈曲性評価は1万回まで実施した。
<Flexibility test>
(1) Sample A
The film for flexibility evaluation was installed with a U-shaped folding tester (manufactured by Yuasa Co., Ltd.) so that the sealing sheet was inside, and it was bent 10,000 times at a radius of curvature of 5 mm and a bending speed of 60 rpm / min. Then, cracks in the inorganic film after bending were confirmed with a microscope. Flexibility evaluation was performed up to 100,000 times.
(2) Sample B
A flexible evaluation film was installed with a U-shaped folding tester (manufactured by Yuasa Co., Ltd.) so that the cycloolefin polymer film was inside, and bent at a curvature radius of 5 mm and a bending speed of 60 rpm / min. The crack of the inorganic film after bending was confirmed with a microscope. Flexibility evaluation was performed up to 10,000 times.
(評価の基準)
 サンプルA
 良好(○):10万回の屈曲後、クラックなし(100K<)
 可(△):8万~10万回の屈曲でクラック発生(80K~100K)
 不良(×):8万回未満の屈曲でクラック発生(80K>)
(Evaluation criteria)
Sample A
Good (O): No crack after 100000 bendings (100K <)
Possible (△): Crack generated by 80,000 to 100,000 bends (80K to 100K)
Defect (x): Crack generated by bending less than 80,000 times (80K>)
 サンプルB
 良好(○):1万回の屈曲後、クラックなし(10K<)
 可(△):8千~1万回の屈曲でクラック発生(8K~10K)
 不良(×):8千回未満の屈曲でクラック発生(8K>)
Sample B
Good (○): No crack after 10,000 bending (10K <)
Possible (△): Crack generated by bending 8,000 to 10,000 times (8K to 10K)
Defect (x): Crack generated by bending less than 8,000 times (8K>)
 下記表1および2に実施例の組成物及び比較例の組成物の構成と評価試験の結果を示す。 Tables 1 and 2 below show the composition of Examples and Comparative Examples and the results of evaluation tests.
Figure JPOXMLDOC01-appb-T000005
Figure JPOXMLDOC01-appb-T000005
Figure JPOXMLDOC01-appb-T000006
Figure JPOXMLDOC01-appb-T000006
 上記表中、溶剤以外の数値は全て不揮発分の値を示す。上記表の結果から、実施例1~7の封止フィルムは、ガラスとの密着力に優れ、屈曲性評価においても、屈曲後の界面のクラックが抑えられる傾向が認められた。 In the above table, all values other than the solvent are non-volatile values. From the results in the above table, the sealing films of Examples 1 to 7 were excellent in adhesion to glass, and in the evaluation of flexibility, it was recognized that cracks at the interface after bending were suppressed.
 本発明の封止用組成物は、フレキシブル電子デバイスにおける電子素子等を封止するために好適である。 The sealing composition of the present invention is suitable for sealing electronic elements and the like in flexible electronic devices.
 本願は、日本で出願された特願2018-066922号を基礎としており、その内容は本願明細書に全て包含される。 This application is based on Japanese Patent Application No. 2018-066992 filed in Japan, the contents of which are incorporated in full herein.

Claims (20)

  1.  下記(A)~(C)成分を含む、封止用組成物。
     (A)ポリオレフィン系樹脂及び/又はポリオレフィン系ゴム
     (B)無機フィラー
     (C)2つの配位原子がともに酸素原子である二座配位子及び配位原子が酸素原子である単座配位子が中心金属に結合した金属錯体
    A sealing composition comprising the following components (A) to (C):
    (A) Polyolefin resin and / or polyolefin rubber (B) Inorganic filler (C) A bidentate ligand in which two coordination atoms are both oxygen atoms and a monodentate ligand in which the coordination atoms are oxygen atoms Metal complex bound to the central metal
  2.  (C)金属錯体の中心金属がアルミニウム、チタンまたはジルコニウムである、請求項1記載の封止用組成物。 (C) The sealing composition according to claim 1, wherein the central metal of the metal complex is aluminum, titanium, or zirconium.
  3.  (C)金属錯体が、一般式(1):
    Figure JPOXMLDOC01-appb-C000001
    (式中、
     Mは周期表の第2周期から第6周期の金属を表し、
     R及びRはそれぞれ独立に、水素原子、置換基を有していてもよいアルキル基、置換基を有していてもよいアルコキシ基、置換基を有していてもよいアリール基、又は置換基を有していてもよいアラルキル基を表し、
     Rは水素原子、置換基を有していてもよいアルキル基、置換基を有していてもよいアルコキシ基、置換基を有していてもよいアルコキシカルボニル基、置換基を有していてもよいアリール基、又は置換基を有していてもよいアラルキル基を表し、
     Xは配位原子が酸素原子である単座配位子を表し、
     [ ]内の酸素原子(O)とMとの間の実線は共有結合を表し、
     [ ]内の酸素原子(O)とMとの間の破線は配位結合を表し、並びに
     mは3または4の整数であり、nは1~3の整数であり、及びm>nである。)
    で表される金属錯体である、請求項1記載の封止用組成物。
    (C) The metal complex has the general formula (1):
    Figure JPOXMLDOC01-appb-C000001
    (Where
    M represents the metal of the second period to the sixth period of the periodic table,
    R 1 and R 3 are each independently a hydrogen atom, an alkyl group that may have a substituent, an alkoxy group that may have a substituent, an aryl group that may have a substituent, or Represents an aralkyl group which may have a substituent,
    R 2 has a hydrogen atom, an alkyl group which may have a substituent, an alkoxy group which may have a substituent, an alkoxycarbonyl group which may have a substituent, and a substituent. An aryl group that may be substituted or an aralkyl group that may have a substituent,
    X represents a monodentate ligand in which the coordination atom is an oxygen atom,
    The solid line between the oxygen atom (O) and M in [] represents a covalent bond,
    The broken line between the oxygen atom (O) and M in [] represents a coordination bond, and m is an integer of 3 or 4, n is an integer of 1 to 3, and m> n . )
    The composition for sealing of Claim 1 which is a metal complex represented by these.
  4.  式(1)中のMがアルミニウム、チタンまたはジルコニウムである、請求項3記載の封止用組成物。 The composition for sealing according to claim 3, wherein M in the formula (1) is aluminum, titanium, or zirconium.
  5.  (B)無機フィラーが(C)金属錯体で表面処理されている、請求項1~4のいずれか一項記載の封止用組成物。 The sealing composition according to any one of claims 1 to 4, wherein (B) the inorganic filler is surface-treated with (C) a metal complex.
  6.  ポリオレフィン系樹脂及び/又はポリオレフィン系ゴムが、ポリイソブチレン骨格を有するポリマーである、請求項1~5のいずれか一項記載の封止用組成物。 The sealing composition according to any one of claims 1 to 5, wherein the polyolefin resin and / or the polyolefin rubber is a polymer having a polyisobutylene skeleton.
  7.  ポリオレフィン系樹脂が、酸無水物基を有するポリオレフィン系樹脂、及び/又は、エポキシ基を有するポリオレフィン系樹脂を含む、請求項1~6のいずれか一項記載の封止用組成物。 The sealing composition according to any one of claims 1 to 6, wherein the polyolefin resin comprises a polyolefin resin having an acid anhydride group and / or a polyolefin resin having an epoxy group.
  8.  ポリオレフィン系ゴムが、酸無水物基を有するポリオレフィン系ゴム、及び/又は、エポキシ基を有するポリオレフィン系ゴムを含む、請求項1~6のいずれか一項記載の封止用組成物。 The sealing composition according to any one of claims 1 to 6, wherein the polyolefin rubber comprises a polyolefin rubber having an acid anhydride group and / or a polyolefin rubber having an epoxy group.
  9.  下記の(a)~(d)の少なくとも一つを満たす、請求項1~6のいずれか一項記載の封止用組成物。
     (a)ポリオレフィン系樹脂が酸無水物基を有するポリオレフィン系樹脂及びエポキシ基を有するポリオレフィン系樹脂を含む。
     (b)ポリオレフィン系ゴムが酸無水物基を有するポリオレフィン系ゴム及びエポキシ基を有するポリオレフィン系ゴムを含む。
     (c)ポリオレフィン系樹脂が酸無水物基を有するポリオレフィン系樹脂を含み、ポリオレフィン系ゴムがエポキシ基を有するポリオレフィン系ゴムを含む。
     (d)ポリオレフィン系ゴムが酸無水物基を有するポリオレフィン系ゴムを含み、ポリオレフィン系樹脂がエポキシ基を有するポリオレフィン系樹脂を含む。
    The sealing composition according to any one of claims 1 to 6, which satisfies at least one of the following (a) to (d):
    (A) The polyolefin resin includes a polyolefin resin having an acid anhydride group and a polyolefin resin having an epoxy group.
    (B) The polyolefin rubber includes a polyolefin rubber having an acid anhydride group and a polyolefin rubber having an epoxy group.
    (C) The polyolefin resin includes a polyolefin resin having an acid anhydride group, and the polyolefin rubber includes a polyolefin rubber having an epoxy group.
    (D) The polyolefin-based rubber includes a polyolefin-based rubber having an acid anhydride group, and the polyolefin-based resin includes a polyolefin-based resin having an epoxy group.
  10.  さらに、組成物の不揮発成分100質量%に対して10質量%以下の(D)粘着付与樹脂を含む、請求項1~9のいずれか一項記載の封止用組成物。 The sealing composition according to any one of claims 1 to 9, further comprising 10% by mass or less of (D) a tackifying resin with respect to 100% by mass of the nonvolatile component of the composition.
  11.  フレキシブル電子デバイスの封止用である、請求項1~10のいずれか一項記載の封止用組成物。 The sealing composition according to any one of claims 1 to 10, which is used for sealing a flexible electronic device.
  12.  フレキシブル電子デバイスがフレキシブル有機ELデバイスである、請求項11記載の封止用組成物。 The sealing composition according to claim 11, wherein the flexible electronic device is a flexible organic EL device.
  13.  支持体と、該支持体上に形成された、請求項1~8及び10のいずれか1項記載の組成物の層とを含む、封止用シート。 A sealing sheet comprising a support and a layer of the composition according to any one of claims 1 to 8 and 10 formed on the support.
  14.  支持体と、該支持体上に形成された、請求項9記載の組成物の層とを含み、組成物の層が、酸無水物基とエポキシ基との反応により形成された架橋構造を有する、封止用シート。 A support and a layer of the composition according to claim 9 formed on the support, wherein the composition layer has a cross-linked structure formed by reaction of an acid anhydride group and an epoxy group. , Sheet for sealing.
  15.  支持体が、剥離性支持体、防湿性支持体および円偏光板から選ばれる少なくとも一つで構成されている、請求項13又は14記載の封止用シート。 The sealing sheet according to claim 13 or 14, wherein the support is composed of at least one selected from a peelable support, a moisture-proof support and a circularly polarizing plate.
  16.  フレキシブル電子デバイスの封止用である、請求項13~15のいずれか1項記載の封止用シート。 The sealing sheet according to any one of claims 13 to 15, which is used for sealing a flexible electronic device.
  17.  フレキシブル電子デバイスがフレキシブル有機ELデバイスである、請求項16記載の封止用シート。 The sealing sheet according to claim 16, wherein the flexible electronic device is a flexible organic EL device.
  18.  プラスチック基板上に形成された電子素子が、請求項1~8及び10のいずれか1項に記載の封止用組成物で封止されている、フレキシブル電子デバイス。 A flexible electronic device, wherein an electronic element formed on a plastic substrate is sealed with the sealing composition according to any one of claims 1 to 8 and 10.
  19.  プラスチック基板上に形成された電子素子が、請求項9又は10記載の封止用組成物で封止されており、封止用組成物が、酸無水物基とエポキシ基との反応により形成された架橋構造を有する、フレキシブル電子デバイス。 An electronic device formed on a plastic substrate is sealed with the sealing composition according to claim 9 or 10, and the sealing composition is formed by a reaction between an acid anhydride group and an epoxy group. A flexible electronic device having a crosslinked structure.
  20.  電子素子が有機EL素子であり、当該フレキシブル電子デバイスがフレキシブル有機ELデバイスである、請求項18又は19記載のフレキシブル電子デバイス。 The flexible electronic device according to claim 18 or 19, wherein the electronic element is an organic EL element, and the flexible electronic device is a flexible organic EL device.
PCT/JP2019/013924 2018-03-30 2019-03-29 Sealing composition WO2019189723A1 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20220012200A (en) 2020-07-22 2022-02-03 아지노모토 가부시키가이샤 Encapsulation sheet and adhesive composition layer
WO2022102423A1 (en) * 2020-11-16 2022-05-19 株式会社オートネットワーク技術研究所 Crosslinkable polymer composition, crosslinked polymer material, metal member and wiring harness
WO2022124357A1 (en) * 2020-12-09 2022-06-16 味の素株式会社 Pressure-sensitive adhesive composition and pressure-sensitive adhesive sheet
WO2022187847A1 (en) * 2021-03-05 2022-09-09 Ppg Industries Ohio, Inc. Systems and methods for treating a substrate
CN115298267A (en) * 2020-03-27 2022-11-04 株式会社自动网络技术研究所 Metal crosslinkable polymer composition, metal crosslinked polymer material, metal member, and wire harness
DE112021005948T5 (en) 2020-11-13 2023-09-21 Ajinomoto Co., Inc. SEALING MESH

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000086991A (en) * 1998-09-04 2000-03-28 Dow Corning Corp Sticky polyolefin composition
JP2001214016A (en) * 2000-02-02 2001-08-07 Kanegafuchi Chem Ind Co Ltd Curable composition
JP2008280434A (en) * 2007-05-10 2008-11-20 Kaneka Corp Curable composition
WO2011062167A1 (en) * 2009-11-18 2011-05-26 味の素株式会社 Resin composition
WO2014156593A1 (en) * 2013-03-29 2014-10-02 古河電気工業株式会社 Resin composition for element encapsulation for organic electronic devices, resin sheet for element encapsulation for organic electronic devices, organic electroluminescent element and image display device
WO2014156555A1 (en) * 2013-03-29 2014-10-02 古河電気工業株式会社 Resin composition for encapsulation of elements for organic electronic devices, resin sheet for encapsulation of elements for organic electronic devices, organic electroluminescence element, and image display device
JP2017027941A (en) * 2015-07-21 2017-02-02 味の素株式会社 Sealing resin composition
JP2017031301A (en) * 2015-07-31 2017-02-09 東洋インキScホールディングス株式会社 Thermosetting adhesive sheet and application thereof

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101588343B1 (en) * 2008-08-28 2016-01-25 가부시키가이샤 아데카 Polyolefin resin composition
JP5628499B2 (en) 2009-09-18 2014-11-19 日本水産株式会社 Low salt soy sauce or low salt soy seasoning containing salty taste enhancer
JP5931415B2 (en) 2011-11-24 2016-06-08 三菱重工業株式会社 Pulverized coal burner
JP5503770B1 (en) 2013-03-29 2014-05-28 古河電気工業株式会社 Sealant composition and sealing sheet obtained from the composition
CN107406639B (en) * 2015-03-27 2022-03-15 味之素株式会社 Resin composition for encapsulation
JP6482405B2 (en) 2015-06-23 2019-03-13 株式会社Adeka Flame retardant synthetic resin composition
JP6713627B2 (en) 2015-09-17 2020-06-24 鹿島建設株式会社 Method and system for evaluating rock mass in front of tunnel face

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000086991A (en) * 1998-09-04 2000-03-28 Dow Corning Corp Sticky polyolefin composition
JP2001214016A (en) * 2000-02-02 2001-08-07 Kanegafuchi Chem Ind Co Ltd Curable composition
JP2008280434A (en) * 2007-05-10 2008-11-20 Kaneka Corp Curable composition
WO2011062167A1 (en) * 2009-11-18 2011-05-26 味の素株式会社 Resin composition
WO2014156593A1 (en) * 2013-03-29 2014-10-02 古河電気工業株式会社 Resin composition for element encapsulation for organic electronic devices, resin sheet for element encapsulation for organic electronic devices, organic electroluminescent element and image display device
WO2014156555A1 (en) * 2013-03-29 2014-10-02 古河電気工業株式会社 Resin composition for encapsulation of elements for organic electronic devices, resin sheet for encapsulation of elements for organic electronic devices, organic electroluminescence element, and image display device
JP2017027941A (en) * 2015-07-21 2017-02-02 味の素株式会社 Sealing resin composition
JP2017031301A (en) * 2015-07-31 2017-02-09 東洋インキScホールディングス株式会社 Thermosetting adhesive sheet and application thereof

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115298267A (en) * 2020-03-27 2022-11-04 株式会社自动网络技术研究所 Metal crosslinkable polymer composition, metal crosslinked polymer material, metal member, and wire harness
CN115298267B (en) * 2020-03-27 2023-06-30 株式会社自动网络技术研究所 Metal-crosslinkable polymer composition, metal-crosslinked polymer material, metal member, and wire harness
JP7461194B2 (en) 2020-03-27 2024-04-03 株式会社オートネットワーク技術研究所 Metal crosslinked polymer composition, metal crosslinked polymer material, metal member, wire harness, and method for producing metal crosslinked polymer material
KR20220012200A (en) 2020-07-22 2022-02-03 아지노모토 가부시키가이샤 Encapsulation sheet and adhesive composition layer
DE112021005948T5 (en) 2020-11-13 2023-09-21 Ajinomoto Co., Inc. SEALING MESH
WO2022102423A1 (en) * 2020-11-16 2022-05-19 株式会社オートネットワーク技術研究所 Crosslinkable polymer composition, crosslinked polymer material, metal member and wiring harness
CN116490552A (en) * 2020-11-16 2023-07-25 株式会社自动网络技术研究所 Crosslinkable polymer composition, crosslinked polymer material, metal member, and wire harness
JP7463548B2 (en) 2020-11-16 2024-04-08 株式会社オートネットワーク技術研究所 Crosslinkable polymer composition, crosslinked polymer material, metal member and wire harness
WO2022124357A1 (en) * 2020-12-09 2022-06-16 味の素株式会社 Pressure-sensitive adhesive composition and pressure-sensitive adhesive sheet
KR20230117429A (en) 2020-12-09 2023-08-08 아지노모토 가부시키가이샤 Adhesive composition and adhesive sheet
WO2022187847A1 (en) * 2021-03-05 2022-09-09 Ppg Industries Ohio, Inc. Systems and methods for treating a substrate

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