WO2019150863A1 - Wiring substrate - Google Patents

Wiring substrate Download PDF

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Publication number
WO2019150863A1
WO2019150863A1 PCT/JP2018/047875 JP2018047875W WO2019150863A1 WO 2019150863 A1 WO2019150863 A1 WO 2019150863A1 JP 2018047875 W JP2018047875 W JP 2018047875W WO 2019150863 A1 WO2019150863 A1 WO 2019150863A1
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WO
WIPO (PCT)
Prior art keywords
conductive path
woven fabric
wiring board
conductor
support
Prior art date
Application number
PCT/JP2018/047875
Other languages
French (fr)
Japanese (ja)
Inventor
海津 雅洋
Original Assignee
株式会社フジクラ
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Filing date
Publication date
Application filed by 株式会社フジクラ filed Critical 株式会社フジクラ
Publication of WO2019150863A1 publication Critical patent/WO2019150863A1/en

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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details

Definitions

  • the present invention relates to a wiring board.
  • a wiring board For the designated countries where incorporation by reference is permitted, the contents described in Japanese Patent Application No. 2018-016927 filed in Japan on February 2, 2018 are incorporated herein by reference. As part of
  • Flexible printed circuit board formed by etching or plating on a film to form a circuit layer as a flexible wiring board, or membrane wiring formed by printing a silver paste on a film to form a circuit layer A plate is known (see, for example, Patent Document 1 (paragraph [0002])).
  • Patent Document 1 paragraph [0002]
  • Patent Document 2 paragraph [0002]
  • JP 2011-014742 A Japanese Patent Laying-Open No. 2015-046226
  • the above-mentioned FPC and membrane wiring board are excellent in followability to a bent shape centered on one axis such as a U shape.
  • the followability is remarkably lowered due to the tension of the film with respect to the deformation of the three-dimensional shape such as the sphere surface.
  • an uncomfortable feeling may be given to an occupant due to unnatural rigidity or abnormal noise.
  • the problem to be solved by the present invention is to provide a wiring board excellent in followability to three-dimensional deformation.
  • a wiring board according to the present invention includes a support and a conductor supported by the support, and the support is woven using woven yarns each formed by bundling insulating fibers. At least one woven fabric formed on the first main surface of the woven fabric, and the conductor includes a first insulating layer provided on the first main surface of the woven fabric. A first conductive path provided on a main surface; and a second conductive path provided on the first insulating layer and connected to the first conductive path.
  • One conductive path is a wiring board having a first conductor portion present in the basket hole of the woven fabric.
  • the conductor includes a third conductive path provided on a second main surface of the woven fabric, and the third conductive path exists in a basket hole of the woven fabric. At least a portion of the first conductor portion and at least a portion of the second conductor portion are joined to each other, and the first conductive path The third conductive path may be electrically connected via the first conductor portion and the second conductor portion.
  • the woven yarn is composed of a warp extending in a first direction and a woven yarn of the same type or different from the warp in a second direction intersecting the first direction. And extending weft yarns.
  • the composition of the material constituting the first conductive path is the same as the composition of the material constituting the second conductive path, and the first conductive path and the second conductive path are the same.
  • the conductive path may be integrally formed.
  • the composition of the material constituting the first conductive path is different from the composition of the material constituting the second conductive path, and a part of the first conductive path is It may overlap with a part of the second conductive path.
  • the wiring board may include an adhesive layer or an adhesive layer that adheres or adheres the first insulating layer to the first main surface of the woven fabric.
  • the wiring board may further include a second insulating layer that covers the conductor and the support and is also present in the woven fabric.
  • the second insulating layer may have a window portion exposing a part of the conductor to the outside.
  • the first insulating layer has at least one through hole, and the first conductive path corresponds to the through hole.
  • a portion provided on the main surface of the main body may be included.
  • the third conductive path may also include a portion provided on the second main surface of the woven fabric so as to correspond to the through hole.
  • the first conductive path includes a first intervening portion existing in a gap between the insulating fibers of the woven fabric, and the third conductive path includes the woven fabric.
  • a second intervening portion existing in a gap between the insulating fibers may be included.
  • the insulating fiber may include at least one of glass fiber and resin fiber.
  • the woven yarn may be configured by bundling single or plural kinds of insulating fibers.
  • the support includes a plurality of woven fabrics stacked on each other, and the plurality of woven fabrics are composed of the same type of woven fabric or a plurality of types of woven fabric. May be.
  • the conductor may contain a single kind or a plurality of kinds of metals.
  • At least one of the first to third conductive paths may include a plurality of conductive layers stacked on each other.
  • the plurality of conductive layers may include at least one plating layer.
  • the support includes at least one woven fabric, and the first conductive portion provided on the first main surface of the woven fabric has the first conductor portion in the basket hole. have. For this reason, while maintaining the adhesion between the support and the conductor by the first conductor portion, the portion of the support where the first conductive path and the first insulating layer are not present is used. Therefore, excellent followability to three-dimensional deformation can be ensured.
  • the first insulating layer is provided in a partial region of the first main surface of the woven fabric, and the second conductive path is provided on the first insulating layer. Yes. Since the unevenness of the woven fabric is smoothed by the first insulating layer, the pattern shape and thickness of the second conductive path can be made uniform, and the second conductive path can be formed with high accuracy. Can do.
  • FIG. 1 is a perspective view showing a wiring board according to the first embodiment of the present invention.
  • FIG. 2 is a cross-sectional view taken along the line II-II in FIG.
  • FIG. 3 is an enlarged view of a portion III in FIG.
  • FIG. 4 is a plan view of a woven fabric used for the wiring board shown in FIG.
  • FIG. 5 is a cross-sectional view taken along line VV in FIG. 6 is a cross-sectional view taken along line VI-VI in FIG.
  • FIG. 7 is a cross-sectional view showing a modification of the woven fabric according to the first embodiment of the present invention.
  • FIG. 8 is a cross-sectional view showing a modification of the conductor in the first embodiment of the present invention.
  • FIG. 9 is a perspective view showing a wiring board according to the second embodiment of the present invention.
  • FIG. 10 is a cross-sectional view taken along line XX in FIG.
  • FIG. 11 is a perspective view showing a wiring board according to the third embodiment of the present invention.
  • 12 is a cross-sectional view taken along line XII-XII in FIG.
  • FIG. 1 is a perspective view showing a wiring board according to a first embodiment of the present invention
  • FIG. 2 is a cross-sectional view taken along line II-II in FIG. 1
  • FIG. 3 is an enlarged view of section III in FIG.
  • FIG. 5 is a cross-sectional view taken along line VV in FIG. 4
  • FIG. 6 is a cross-sectional view taken along line VI-VI in FIG.
  • FIG. 3 is not a strict enlarged view of part III in FIG. 2, but an understanding of the structure of the first and second conductor portions 411, 431 (described later) of the first and third conductive paths 41, 43.
  • the wiring board 1 covers the support 10, the conductor 40 supported by the support 10, and the support 10 and the conductor 40. And a covering insulating layer 50.
  • the support 10 in the present embodiment corresponds to an example of the support in the present invention
  • the conductor 40 in the present embodiment corresponds to an example of the conductor in the present invention
  • the covering insulating layer 50 in the present embodiment corresponds to the present invention. This corresponds to an example of a second insulating layer.
  • Examples of the usage of the wiring board 1 include applications that require a specific texture, complicated or precise three-dimensional shape, and specific examples include circuits installed on the steering wheel of a vehicle or leather of a seat, A circuit provided in a mirror or a bumper of a vehicle can be exemplified.
  • the usage application of the wiring board according to the present invention is not particularly limited to the above.
  • the wiring board 1 may be used for a so-called wearable application such as a biological information sensor provided on a wearing item such as clothes or a hat, or various detection sensors provided on a medical care bedding.
  • the wiring board 1 may not include the coating insulating layer 50.
  • the support 10 includes a single woven fabric 20 and a support insulating layer 30 provided on a partial region of the upper surface 201 of the woven fabric 20.
  • the woven fabric 20 in the present embodiment corresponds to an example of the woven fabric in the present invention
  • the support insulating layer 30 in the present embodiment corresponds to an example of the first insulating layer in the present invention.
  • the woven fabric 20 is woven by weaving the woven yarns 21 and 22 in a plain weave, and has flexibility.
  • the woven yarn constituting the woven fabric 20 includes a warp yarn 21 extending in the longitudinal direction and a weft yarn 22 extending in a direction substantially orthogonal to the warp yarn 21 (that is, the lateral direction).
  • the woven fabric 20 is formed by weaving the woven yarns 21 and 22 in a lattice shape, and thus has a plurality of basket holes 23.
  • the basket hole 23 is a gap (mesh) surrounded by the warp yarn 21 and the weft yarn 22, and penetrates the woven fabric 20 in the thickness direction of the woven fabric 20.
  • the plurality of basket holes 23 have substantially the same shape and substantially the same opening area, and are regularly and uniformly arranged on the woven fabric 20 in plan view.
  • the shape, opening area, arrangement interval, etc. of the basket hole 23 are the diameters of the insulating fibers 211 and 221, the number of insulating fibers 211 and 221 constituting the woven yarns 21 and 22, and the woven yarns 21 and 22. Although it depends on the density of the insulating fibers 211 and 221 and the weave of the woven fabric 20, it can be determined based on the mechanical characteristics and electrical characteristics required for the wiring board 1.
  • the warp yarns 21 are each formed by bundling about 10 to 200 insulating fibers 211 having substantially the same diameter, and a gap is formed between the insulating fibers 211 adjacent to each other.
  • the wefts 22 are each formed by bundling about 10 to 200 insulating fibers 221 having substantially the same diameter, and a gap is formed between the adjacent insulating fibers 221.
  • Insulating fibers 211 and 221 in the present embodiment are both made of glass fibers and have substantially the same diameter of about 1 to 20 ⁇ m.
  • the following configuration can be exemplified as a specific example of the woven fabric 20. That is, the insulating fibers 211 of the warps 21 are made of glass fibers having a diameter of about 7 ⁇ m, and each warp 21 is made of a bundle of about 200 insulating fibers 211.
  • the insulating fibers 221 of the wefts 22 are also composed of glass fibers having a diameter of about 7 ⁇ m, and each weft 22 is configured by bundling about 200 insulating fibers 221.
  • a woven fabric (glass cloth) 20 having a thickness of about 0.1 mm is woven.
  • the woven yarns 21, 22 are woven in a plain weave so that the density of the warp yarns 21 is about 60 per 25 mm in the horizontal direction and the density of the weft yarns 22 is about 60 per 25 mm in the horizontal direction.
  • a large number of basket holes 23 having a rectangular opening shape of about 20 ⁇ m ⁇ 20 ⁇ m are present at a pitch of about 0.3 mm.
  • the insulating fibers 211 and 221 are not particularly limited to the above glass fibers as long as they have electrical insulating properties, heat resistance, and flexibility.
  • the insulating fibers 211 and 221 may be made of resin fibers such as nylon fibers, rayon fibers, polyester fibers, polyamide fibers, vinyl fibers, and aramid fibers.
  • the surface of the insulating fibers 211 and 221 is improved. Chemical treatment or physical treatment may be performed.
  • each warp 21 may be composed of the same type of insulating fiber, or may be composed of a plurality of types of insulating fiber.
  • each weft 22 may be made of the same type of insulating fiber, or may be made of a plurality of types of insulating fiber.
  • one woven yarn may be formed using both glass fibers and resin fibers.
  • the material which comprises an insulating fiber, the diameter of an insulating fiber, etc. can be illustrated, for example.
  • the warp 21 and the weft 22 may be composed of the same type of woven yarn, or may be composed of mutually different types of woven yarn.
  • the elements that make the type of the weaving yarn different for example, the material of the insulating fiber, the diameter of the insulating fiber, the number of the insulating fibers constituting the weaving yarn, the density of the insulating fiber constituting the weaving yarn, etc. Can be illustrated.
  • the weaving method of the woven fabric is not particularly limited to the above-described plain weaving as long as it is woven by regularly weaving the woven yarn.
  • a woven fabric woven by twill weaving or satin weaving may be used as the support 10.
  • crossing angle between the warp 21 and the weft 22 is not particularly limited to the right angle.
  • the warp yarn 21 and the weft yarn 22 need only intersect with each other, and the intersection angle of the warp yarn 21 and the weft yarn 22 can be set arbitrarily.
  • FIG. 7 is a cross-sectional view showing a modification of the woven fabric according to the first embodiment of the present invention.
  • the support 10b may be configured by stacking two woven fabrics 20 stacked on each other.
  • the supporting insulating layer 30 is not shown.
  • a pressure-sensitive adhesive material (or adhesive) having electrical insulation properties is uniformly and partially applied to the surface of one woven fabric 20, the other woven fabric 20 is stacked on the woven fabric 20 to form the support 10b. can do.
  • the some woven fabric 20 may be comprised with the same kind of woven fabric, or may be comprised with the multiple types of woven fabric.
  • the elements that make the type of the woven fabric different include, for example, the material constituting the insulating fiber, the diameter of the insulating fiber, the number of insulating fibers constituting the woven yarn, and the insulating fiber constituting the woven yarn.
  • the density, the weaving method of the woven fabric, the thickness of the woven fabric, etc. can be exemplified.
  • the support insulating layer 30 is directly provided on the upper surface 201 of the woven fabric 20, and in this embodiment, a second conductive path 42 (described later) of the conductor 40 is formed. Is provided in the planned area.
  • the upper surface 301 of the support insulating layer 30 is flatter than the upper surface 201 of the woven fabric 20, and the unevenness of the upper surface 201 of the woven fabric 20 is smoothed by the support insulating layer 30. For this reason, in this embodiment, the pattern shape and thickness of the 2nd conductive path 42 can be equalize
  • the support insulating layer 30 is made of, for example, a resin material such as an epoxy acrylate resin or a novolac type phenol resin, and has an electrical insulating property.
  • the insulating support layer 30 is formed in advance on the upper surface 201 of the woven fabric 20 before the conductor 40 is formed.
  • the support insulating layer 30 is formed by applying a liquid resin to the upper surface 201 of the woven fabric 20 and then performing a curing process. Has been.
  • the insulating support layer 30 closes the basket hole 23 of the woven fabric 20 from the upper surface 201 side. For this reason, when the conductor 40 is formed, the conductive ink is prevented from penetrating into the lower surface 202 of the woven fabric 20 in the second conductive path 42.
  • the method for applying the liquid resin is not particularly limited, and either a contact coating method or a non-contact coating method may be used.
  • Specific examples of the contact coating method include screen printing, gravure printing, offset printing, gravure offset printing, flexographic printing, and the like.
  • specific examples of the non-contact coating method include inkjet printing, spray coating method, dispense coating method, jet dispensing method and the like.
  • the effect method of the liquid resin is not particularly limited, and examples thereof include heat treatment and ultraviolet irradiation treatment.
  • the support insulating layer 30 may be formed of a plurality of layers. Although not particularly illustrated, the insulating support layer 30 may be formed by attaching an electrically insulating film to the upper surface 201 of the woven fabric 20 via an adhesive layer (or adhesive layer) (FIG. 10). reference). Furthermore, the support insulating layer 30 may be provided in a region where the formation of the conductive path is not planned. Thereby, the rigidity of a wiring board can be partially reinforced, for example, the deformation
  • the conductor 40 includes a first conductive path 41, a second conductive path 42, and a third conductive path 43 as shown in FIGS. 1 to 3.
  • the first conductive path 41 is provided on the upper surface 201 of the woven fabric 20 and forms a pair of land portions 401 and 402.
  • the second conductive path 42 is provided on the upper surface 301 of the support insulating layer 30 and forms a wiring portion 406.
  • the third conductive path 43 is provided on the lower surface 202 of the woven fabric 20 and forms a pair of land portions 403 and 404. In the present embodiment, no wiring part is provided on the lower surface of the support 10.
  • the pair of land portions 401 and 402 are provided at both ends of the wiring portion 406 and are connected to each other via the wiring portion 406.
  • the land portions 403 and 404 on the lower surface 202 of the woven fabric 20 are provided so as to correspond to the land portions 401 and 402 on the upper surface 201, and the conductor portions 411 and 431 of the first and third conductive paths 41 and 43.
  • the land portions 401 and 402 on the upper surface 201 and the land portions 403 and 404 on the lower surface 202 are electrically connected via (described later).
  • the shape of the conductor 40 is not particularly limited to the above.
  • other wiring portions may be formed by the first or third conductive paths 41 and 43 for portions that do not require high accuracy. .
  • the conductor 40 is made of, for example, conductive metal particles mainly composed of copper (Cu) or silver (Ag) and a binder resin, and has conductivity.
  • the first to third conductive paths 41 to 43 are made of a material having the same composition.
  • the conductor 40 may contain a plurality of types of conductive metal particles.
  • the conductor 40 is formed by heating and baking the conductive ink applied to the support 10.
  • the conductive ink for forming the conductor 40 is a solution containing conductive metal particles and a binder resin that uniformly disperses the conductive metal particles.
  • the conductive metal particles include conductive metal particles mainly composed of copper (Cu) or silver (Ag).
  • the binder resin include one or a mixture of two or more thermosetting resins such as polyhydric phenol compounds, phenol resins, alkyd resins, unsaturated polyester resins, and epoxy resins.
  • an appropriate amount of an aqueous solvent or an alcohol such as ethanol, methanol or 2-propanol, or an organic solvent such as isophorone, terpineol, triethylene glycol monobutyl ether or butyl cellosolve acetate is added to the binder resin as a dispersion medium.
  • the compounding quantity of this solvent is suitably adjusted according to the size, shape, film forming conditions, etc. of electroconductive metal particle.
  • the method for applying the conductive ink to the support 10 is not particularly limited, and either a contact application method or a non-contact application method may be used.
  • Specific examples of the contact coating method include screen printing, gravure printing, offset printing, gravure offset printing, flexographic printing, and the like.
  • specific examples of the non-contact coating method include inkjet printing, spray coating method, dispense coating method, jet dispensing method and the like.
  • the number of times of applying the conductive ink to the support 10 is not particularly limited to one, and the conductive ink may be applied to one main surface of the support 10 a plurality of times. Moreover, you may vary the component of a conductive ink for every application
  • the heat source for curing the conductive ink is not particularly limited, and examples thereof include an electric heating oven, an infrared oven, a far infrared furnace (IR), a near infrared furnace (NIR), and a laser irradiation device.
  • IR far infrared furnace
  • NIR near infrared furnace
  • a heat treatment combining these may also be used.
  • heat treatment is performed at about 150 ° C. for about 10 minutes.
  • the first conductive path 41 has a first conductor portion 411 and a first conductive portion 411 as shown in FIG. 1 intervening portion 412.
  • the first conductor portion 411 and the first interposed portion 412 are formed integrally with the first conductive path 41.
  • the first conductor portion 411 is present in the basket hole 23 of the woven fabric 20 (that is, the gap between the woven yarns 211 and 212).
  • the first intervening portion 412 enters the gap formed between the insulating fibers 211 and 221 and exists in the gap.
  • the second conductive path 42 does not have a conductor portion or an interposed portion.
  • the end of the second conductive path 42 is connected to the end of the first conductive path 41, and the second conductive path 42 is integrated with the first conductive path 41. Since it is formed, the first conductive path 41 and the second conductive path 42 are electrically connected.
  • the second conductive path 42 is formed on the upper surface 301 of the flat support insulating layer 30, it is formed with high accuracy.
  • the third conductive path 43 is similar to the first conductive path 41.
  • the second conductor portion 431 and the second interposed portion 432 are formed integrally with the third conductive path 43.
  • the second conductor portion 431 is present in the basket hole 23 of the woven fabric 20 (that is, the gap between the woven yarns 211 and 212).
  • the second interposition part 432 enters the gap formed between the insulating fibers 211 and 212 and exists in the gap.
  • the first conductor portion 411 and the second conductor portion 431 are joined to each other. Therefore, the first conductive path 41 and the third conductive path 43 are electrically connected to each other via the first and second conductor portions 411 and 431. That is, the first and second conductor portions 411 and 431 function as an interlayer connection between the first conductive path 41 and the third conductive path 43.
  • the first conductive path 41b may be composed of a plurality of conductive layers 413 and 414.
  • the third conductive path 43 b may be composed of a plurality of conductive layers 433 and 434.
  • FIG. 8 is a sectional view showing a modification of the wiring board according to the first embodiment of the present invention.
  • the additional conductive layers 414 and 434 are formed by applying conductive ink to the support 10 a plurality of times.
  • the additional conductive layers 414 and 434 may be formed by electrolytic plating or electroless plating. Note that the number of the additional conductive layers 414 and 434 is not particularly limited, and a plurality of conductive layers 414 and 434 may be formed.
  • the thickness of the first and third conductive paths 41b and 43b can be increased, and the first and third conductive paths 41b, It is also possible to improve the surface smoothness of 43b (such as surface irregularities and complementation of minute cracks).
  • the covering insulating layer 50 is made of, for example, a resin material, and has electrical characteristics such as electrical insulation, and mechanical characteristics such as flexibility and rigidity.
  • the covering insulating layer 50 is formed by covering the entire support 10 with a liquid resin and allowing the liquid resin to permeate (infiltrate) the woven fabric 20 and cure. Therefore, as shown in FIGS. 1 to 3, the covering insulating layer 50 covers the conductor 40 and the support 10 and is also present in the woven fabric 20.
  • the coating insulating layer 50 ensures the mechanical strength of the wiring board 1, protection of the conductor 40, electrical insulation of the conductor 40, and electrical characteristics (dielectric constant, etc.) of the conductor 40.
  • the wiring board 1 can be provided with the above-mentioned specific texture, arbitrary color, arbitrary flexibility, and the like.
  • First and second window portions 51 and 52 are formed on the upper surface of the covering insulating layer 50, and third and fourth window portions 53 and 54 are formed on the lower surface of the covering insulating layer 50. .
  • the first and second window portions 51 and 52 expose the land portions 401 and 402 of the first conductive path 41 upward, respectively.
  • the third and fourth window portions 53 and 54 expose the land portions 403 and 404 of the third conductive path 43 downward, respectively. For this reason, it can be electrically connected to the conductor 40 of the wiring board 1 from both the upper and lower sides.
  • liquid resin examples include polymer emulsions in which a copolymer is dispersed in water.
  • specific examples of the copolymer include acrylic acid esters and methacrylic compounds as main components. Examples include those obtained by copolymerizing an acid ester and an appropriate amount of styrene or acrylonitrile for imparting necessary characteristics.
  • coating liquid resin the above-mentioned contact application method or non-contact application method can be illustrated.
  • the coating insulating layer 50 is formed by performing a curing process on the liquid resin covering the surfaces of the conductor 40 and the support 10 and impregnated in the woven fabric 20 by a heating process, an ultraviolet irradiation process, or the like. In the curing process, additional processes such as pressurization and decompression may be performed simultaneously.
  • the insulating coating layer 50 may be formed by an injection molding method using a molding die by using a powder molding resin such as silicon rubber instead of the liquid resin.
  • the covering insulating layer 50 may be formed by applying pressure and heat treatment after a curable resin sheet having an opening corresponding to the window portion is stacked on the support 10.
  • the support 10 includes the woven fabric 20. Therefore, in the portion of the support 10 where the first and third conductive paths 41 and 43 and the support insulating layer 30 are not present, excellent followability to three-dimensional deformation is ensured by the flexibility of the woven fabric 20. be able to.
  • the first conductor portion 411 of the first conductive path 41 is present in the basket hole 23 of the woven fabric 20 and the first interposed portion of the first conductive path 41 is present.
  • 412 exists in the gap between the insulating fibers 211 and 221.
  • the first conductor portion 411 and the first interposition portion 412 bite into the woven fabric 20, and due to the anchor effect, the adhesion strength (bonding) between the support 10 and the first conductive path 41 is obtained. Strength and peel strength) are improved. For this reason, even if the electronic component is mounted on the wiring board 1, it is possible to suppress the occurrence of the phenomenon that the first conductive path 41 is peeled off from the support 10.
  • the second conductor portion 431 of the third conductive path 43 exists in the basket hole 23 of the woven fabric 20, and the second interposed portion 432 of the third conductive path 43. Exists in the gap between the insulating fibers 211 and 221. As described above, in the present embodiment, the second conductor portion 431 and the second interposed portion 432 bite into the woven fabric 20, and due to the anchor effect, the adhesion strength (bonding) between the support 10 and the third conductive path 43. Strength and peel strength) are improved. For this reason, even if an electronic component is mounted on the wiring board 1, the occurrence of the phenomenon that the third conductive path 43 is peeled off from the support 10 can be suppressed.
  • the support insulating layer 30 is provided in a partial region of the upper surface 201 of the woven fabric 20, and the second conductive path 42 is provided on the support insulating layer 30. Since the unevenness of the woven fabric 20 is smoothed by the support insulating layer 30, the pattern shape and thickness of the second conductive path 42 can be made uniform, and the second conductive path 42 can be formed with high accuracy. can do.
  • the resin material constituting the covering insulating layer 50 is arbitrarily selected according to the use application of the wiring board 1. Can be selected. For this reason, the above-mentioned peculiar texture can be given to wiring board 1, arbitrary colors can be given to wiring board 1, and flexibility superior to conventional FPC can be given to wiring board 1.
  • the support 10 on which the conductor 40 is formed is deformed into a desired shape, and the support 10 is impregnated with a resin material and cured to form the covering insulating layer 50. Can do.
  • the wiring board 1 can be used for an application that requires a complicated or precise three-dimensional shape.
  • FIG. 9 is a perspective view showing a wiring board according to the second embodiment of the present invention
  • FIG. 10 is a cross-sectional view taken along the line XX of FIG.
  • the structure of the support body 10B and the conductor 40B is different from 1st Embodiment, the structure of other than that is the same as that of 1st Embodiment.
  • the same reference numerals will be given to portions having the same configuration as in the first embodiment, and the description thereof will be omitted.
  • a child substrate 70 having a support insulating layer 30 ⁇ / b> B and a second conductive path 42 ⁇ / b> B is prepared in advance, and this is interposed via an adhesive layer (or adhesive layer) 60.
  • the sub board 70 is attached to the woven fabric 20, the first and third conductive paths 41 and 43 are formed, whereby the support 10B and the conductor 40B are formed.
  • substrate 70 is comprised from well-known printed wiring boards, such as FPC. That is, for example, the support insulating layer 30B is made of a film made of polyimide or the like, and the second conductive path 42B is formed by patterning a metal foil such as a copper foil provided on the film. Is formed.
  • the composition of the material which comprises the 2nd conductive path 42B is the 1st and 3rd electroconductivity.
  • the composition of the material constituting the paths 41 and 43 is different. For this reason, as shown in FIG. 10, a part of the first conductive path 41 overlaps a part of the second conductive path 42B, and the first conductive path 41 and the second conductive path 42 are electrically connected. It is connected to the.
  • the support 10 ⁇ / b> B includes the woven fabric 20, and the first conductive path 41 provided on the upper surface 201 of the woven fabric 20 exists in the basket hole 23.
  • the first conductor portion 411 is provided. For this reason, while maintaining the adhesion between the support 10B and the conductor 40B by the first conductor portion 411, the portion of the support 10B where the first conductive path 41 and the support insulating layer 30B are not present is woven. The followability to the three-dimensional deformation excellent by the flexibility of the cloth 20 can be ensured.
  • the first and third conductive paths 41 and 43 are formed after the child substrate 70 prepared in advance is attached to the woven fabric 20, whereby the support 10 ⁇ / b> B and the conductive body 10 ⁇ / b> B are electrically connected.
  • Form body 40B it is possible to form the second conductive path 42B by patterning the metal foil, so that it is possible to form a precise and fine wiring that is difficult to realize by the printing method.
  • the conductive path formed by the printing method contains a binder component, it is not possible to connect electronic components by soldering.
  • the second conductive path 42B can be formed by patterning the metal foil, so that the electronic components can be connected by soldering.
  • FIG. 11 is a perspective view showing a wiring board according to the third embodiment of the present invention
  • FIG. 12 is a sectional view taken along line XII-XII in FIG.
  • the covering insulating layer 50 is not shown in order to make the conductor 40C easy to see.
  • the configurations of the support 10C and the conductor 40C are different from those of the second embodiment, but the other configurations are the same as those of the first embodiment. Only the differences from the first embodiment will be described below with respect to the wiring board 1 ⁇ / b> C in the third embodiment, and portions having the same configurations as those in the first embodiment are denoted by the same reference numerals and description thereof is omitted.
  • the support insulating layer 30C of this embodiment is different in that it has a pair of through holes 302 and 303.
  • the woven fabric 20 is exposed from the through holes 302 and 303.
  • the first conductive path 41 is formed on the upper surface 201 of the woven fabric 20 through these through holes 302 and 303.
  • the conductor 40C of the present embodiment includes a first conductive path 41, a second conductive path 42C, and a third conductive path 43, as shown in FIGS.
  • the first conductive path 41 is provided on the upper surface 201 of the woven fabric 20 and forms a pair of land portions 401 and 402.
  • the second conductive path 42C is provided on the upper surface 301 of the support insulating layer 30C, and forms a land portion 405 and a wiring portion 406.
  • the third conductive path 43 is provided on the lower surface 202 of the woven fabric 20 and forms a pair of land portions 403 and 404 and a wiring portion 407.
  • the land portion 401 is provided on the upper surface 201 of the woven fabric 20 through the through hole 302 of the support insulating layer 30C.
  • the land portion 403 is provided on the lower surface 202 of the woven fabric 20 so as to correspond to the through hole 302, and the land portions 401 and 403 are electrically connected to each other via the first and second conductor portions 411 and 431. Connected.
  • the land portions 403 and 404 are electrically connected via a wiring portion 407 provided on the lower surface 202 of the woven fabric 20.
  • the land portion 402 is provided on the upper surface 201 of the woven fabric 20 through the through hole 303 of the support insulating layer 30C.
  • the land portion 404 is provided on the lower surface 202 of the woven fabric 20 so as to correspond to the through hole 303, and the land portions 402 and 404 are electrically connected to each other via the first and second conductor portions 411 and 431.
  • the wiring part 406 has a planar coil shape with the center closed, and includes a land part 405 provided outside the wiring part 406 and a land part 402 provided inside the wiring part 406. Electrically connected.
  • the land portion 405 is provided on the upper surface 301 of the support insulating layer 30C.
  • the shape of the conductor 40C is not particularly limited to the above.
  • other wiring portions may be formed by the first or third conductive paths 41 and 43 for portions where high accuracy is not required. .
  • a child substrate 70C having a support insulating layer 30C and a second conductive path 42C is prepared in advance, and an adhesive layer is prepared.
  • the first and third conductive paths 41 and 43 are formed, whereby the support 10C and the conductor 40C are formed.
  • the sub board 70 ⁇ / b> C is composed of a known printed wiring board such as an FPC. That is, for example, the support insulating layer 30C is made of a film made of polyimide or the like, and the second conductive path 42C is formed by patterning a metal foil such as a copper foil provided on the film. Is formed.
  • the composition of the material constituting the second conductive path 42C is the first and third conductives.
  • the composition of the material constituting the paths 41 and 43 is different. Therefore, as shown in FIG. 12, a part of the first conductive path 41 overlaps a part of the second conductive path 42C, and the first conductive path 41 and the second conductive path 42 are electrically connected. It is connected to the.
  • the support 10C includes the woven fabric 20, and the first conductive path 41 provided on the upper surface 201 of the woven fabric 20 includes the basket hole. 23 has a first conductor portion 411. For this reason, while maintaining the adhesion between the support 10C and the conductor 40C by the first conductor portion 411, the portion of the support 10C where the first conductive path 41 and the support insulating layer 30C are not present is woven. The followability to the three-dimensional deformation excellent by the flexibility of the cloth 20 can be ensured.
  • the first and third conductive paths 41 and 43 are formed after the previously prepared child substrate 70C is attached to the woven fabric 20, A support 10C and a conductor 40C are formed. For this reason, it is possible to form the second conductive path 42C by patterning the metal foil, so that it is possible to form a precise and fine wiring that is difficult to realize by the printing method.
  • the conductive path formed by the printing method contains a binder component, it is not possible to connect electronic components by soldering.
  • the second conductive path 42C can be formed by patterning the metal foil, so that the electronic components can be connected by soldering.
  • the support insulating layer 30 and the second conductive path 42 are provided only on the upper surface 201 of the woven fabric 20, but the present invention is not particularly limited thereto. Specifically, the support insulating layer 30 and the second conductive path 42 may be provided on the lower surface 202 of the woven fabric 20. Alternatively, the support insulating layer 30 and the second conductive path 42 may be provided on both surfaces 201 and 202 of the woven fabric 20.

Abstract

A wiring substrate 1 is provided with a support 10 and an electrical conductor 40 supported on the support 10. The support 10 comprises: a woven fabric 20 woven using weaving yarns 21, 22 each configured by bundling insulating fibers 211, 221 together; and a support insulating layer 30 disposed over a region in a part of an upper surface 201 of the woven fabric 20. The electrical conductor 40 includes a first electrically conductive path 41 disposed on an upper surface 201 of the woven fabric 20, and a second electrically conductive path 42 which is disposed on the support insulating layer 30 and connected to the first electrically conductive path 41. The first electrically conductive path 41 includes a first conductor part 411 disposed in a basket hole 23 of the woven fabric 20.

Description

配線基板Wiring board
 本発明は、配線基板に関するものである。
 文献の参照による組み込みが認められる指定国については、2018年2月2日に日本国に出願された特願2018-016927に記載された内容を参照により本明細書に組み込み、本明細書の記載の一部とする。
The present invention relates to a wiring board.
For the designated countries where incorporation by reference is permitted, the contents described in Japanese Patent Application No. 2018-016927 filed in Japan on February 2, 2018 are incorporated herein by reference. As part of
 柔軟性を有する配線基板として、フィルム上にエッチング又はめっきして回路層を形成してなるフレキシブルプリント配線板(FPC)や、フィルム上に銀ペーストを印刷して回路層を形成してなるメンブレン配線板が知られている(例えば、特許文献1(段落[0002])参照)。また、こうした配線板の使用用途として、例えば自動車の座席に設けられる着座センサ等の広義のウェアラブル用途が知られている(例えば、特許文献2(段落[0002])参照)。 Flexible printed circuit board (FPC) formed by etching or plating on a film to form a circuit layer as a flexible wiring board, or membrane wiring formed by printing a silver paste on a film to form a circuit layer A plate is known (see, for example, Patent Document 1 (paragraph [0002])). As a usage application of such a wiring board, for example, a wearable application in a broad sense such as a seating sensor provided in a seat of an automobile is known (for example, see Patent Document 2 (paragraph [0002])).
特開2011-014742号公報JP 2011-014742 A 特開2015-046226号公報Japanese Patent Laying-Open No. 2015-046226
 上述のFPCやメンブレン配線板は、U型形状のような一つの軸を中心とした屈曲形状に対する追従性に優れている。しかしながら、球体表面のような三次元形状に対する変形に関しては、フィルムの張力に起因して追従性が著しく低下してしまう、という問題がある。例えば、自動車のシートの表皮とクッションフォームとの間隙に配置される着座センサでは、不自然な剛性や異音により乗員に違和感を与えてしまう場合がある。 The above-mentioned FPC and membrane wiring board are excellent in followability to a bent shape centered on one axis such as a U shape. However, there is a problem that the followability is remarkably lowered due to the tension of the film with respect to the deformation of the three-dimensional shape such as the sphere surface. For example, in a seating sensor arranged in a gap between a car skin and a cushion foam, an uncomfortable feeling may be given to an occupant due to unnatural rigidity or abnormal noise.
 本発明が解決しようとする課題は、三次元変形への追従性に優れた配線基板を提供することである。 The problem to be solved by the present invention is to provide a wiring board excellent in followability to three-dimensional deformation.
 [1]本発明に係る配線基板は、支持体と、前記支持体に支持された導電体と、を備え、前記支持体は、絶縁性繊維を束ねてそれぞれ構成された織糸を用いて製織された少なくとも一つの織布と、前記織布の第1の主面の一部の領域上に設けられた第1の絶縁層と、を含み、前記導電体は、前記織布の第1の主面上に設けられた第1の導電路と、前記第1の絶縁層上に設けられていると共に、前記第1の導電路と接続された第2の導電路と、を含み、前記第1の導電路は、前記織布のバスケットホールに存在する第1の導体部分を有する配線基板である。 [1] A wiring board according to the present invention includes a support and a conductor supported by the support, and the support is woven using woven yarns each formed by bundling insulating fibers. At least one woven fabric formed on the first main surface of the woven fabric, and the conductor includes a first insulating layer provided on the first main surface of the woven fabric. A first conductive path provided on a main surface; and a second conductive path provided on the first insulating layer and connected to the first conductive path. One conductive path is a wiring board having a first conductor portion present in the basket hole of the woven fabric.
 [2]上記発明において、前記導電体は、前記織布の第2の主面上に設けられた第3の導電路を含み、前記第3の導電路は、前記織布のバスケットホールに存在する第2の導体部分を有しており、少なくとも一部の前記第1の導体部分と、少なくとも一部の前記第2の導体部分とは相互に接合されており、前記第1の導電路と前記第3の導電路は、前記第1の導体部分及び前記第2の導体部分を介して電気的に接続されていてもよい。 [2] In the above invention, the conductor includes a third conductive path provided on a second main surface of the woven fabric, and the third conductive path exists in a basket hole of the woven fabric. At least a portion of the first conductor portion and at least a portion of the second conductor portion are joined to each other, and the first conductive path The third conductive path may be electrically connected via the first conductor portion and the second conductor portion.
 [3]上記発明において、前記織糸は、第1の方向に延在する経糸と、前記経糸と同一種又は異種の織糸から構成され、前記第1の方向に交差する第2の方向に延在する緯糸と、を含んでいてもよい。 [3] In the above invention, the woven yarn is composed of a warp extending in a first direction and a woven yarn of the same type or different from the warp in a second direction intersecting the first direction. And extending weft yarns.
 [4]上記発明において、前記第1の導電路を構成する材料の組成と、前記第2の導電路を構成する材料の組成とが同一であり、前記第1の導電路と前記第2の導電路とは一体的に形成されていてもよい。 [4] In the above invention, the composition of the material constituting the first conductive path is the same as the composition of the material constituting the second conductive path, and the first conductive path and the second conductive path are the same. The conductive path may be integrally formed.
 [5]上記発明において、前記第1の導電路を構成する材料の組成と、前記第2の導電路を構成する材料の組成とが異なっており、前記第1の導電路の一部は、前記第2の導電路の一部と重なっていてもよい。 [5] In the above invention, the composition of the material constituting the first conductive path is different from the composition of the material constituting the second conductive path, and a part of the first conductive path is It may overlap with a part of the second conductive path.
 [6]上記発明において、前記配線基板は、前記第1の絶縁層を前記織布の前記第1の主面に粘着又は接着させる粘着層又は接着層を備えてもよい。 [6] In the above invention, the wiring board may include an adhesive layer or an adhesive layer that adheres or adheres the first insulating layer to the first main surface of the woven fabric.
 [7]上記発明において、前記配線基板は、前記導電体及び前記支持体を被覆していると共に前記織布内にも存在している第2の絶縁層をさらに備えてもよい。 [7] In the above invention, the wiring board may further include a second insulating layer that covers the conductor and the support and is also present in the woven fabric.
 [8]上記発明において、前記第2の絶縁層は、前記導電体の一部を外部に露出させる窓部を有してもよい。 [8] In the above invention, the second insulating layer may have a window portion exposing a part of the conductor to the outside.
 [9]上記発明において、前記第1の絶縁層は、少なくとも一つの貫通孔を有しており、前記第1の導電路は、前記貫通孔に対応するように、前記織布の前記第1の主面上に設けられた部分を含んでもよい。 [9] In the above invention, the first insulating layer has at least one through hole, and the first conductive path corresponds to the through hole. A portion provided on the main surface of the main body may be included.
 [10]上記発明において、前記第3の導電路も、前記貫通孔に対応するように、前記織布の前記第2の主面上に設けられた部分を含んでいてもよい。 [10] In the above invention, the third conductive path may also include a portion provided on the second main surface of the woven fabric so as to correspond to the through hole.
 [11]上記発明において、前記第1の導電路は、前記織布の前記絶縁性繊維同士の間の間隙に存在する第1の介在部分を含み、前記第3の導電路は、前記織布の前記絶縁性繊維同士の間の間隙に存在する第2の介在部分を含んでもよい。 [11] In the above invention, the first conductive path includes a first intervening portion existing in a gap between the insulating fibers of the woven fabric, and the third conductive path includes the woven fabric. A second intervening portion existing in a gap between the insulating fibers may be included.
 [12]上記発明において、前記絶縁性繊維は、ガラス繊維及び樹脂繊維の少なくとも一方を含んでもよい。 [12] In the above invention, the insulating fiber may include at least one of glass fiber and resin fiber.
 [13]上記発明において、前記織糸は、単一種又は複数種の絶縁性繊維を束ねて構成されていてもよい。 [13] In the above invention, the woven yarn may be configured by bundling single or plural kinds of insulating fibers.
 [14]上記発明において、前記支持体は、相互に積層された複数の織布を含んでおり、複数の前記織布は、同一種の織布、又は、複数種の織布から構成されていてもよい。 [14] In the above invention, the support includes a plurality of woven fabrics stacked on each other, and the plurality of woven fabrics are composed of the same type of woven fabric or a plurality of types of woven fabric. May be.
 [15]上記発明において、前記導電体は、単一種又は複数種の金属を含有していてもよい。 [15] In the above invention, the conductor may contain a single kind or a plurality of kinds of metals.
 [16]上記発明において、前記第1~前記第3の導電路のうちの少なくとも一つは、相互に積層された複数の導電層を含んでいてもよい。 [16] In the above invention, at least one of the first to third conductive paths may include a plurality of conductive layers stacked on each other.
 [17]上記発明において、複数の前記導電層は、少なくとも一つのめっき層を含んでいてもよい。 [17] In the above invention, the plurality of conductive layers may include at least one plating layer.
 本発明によれば、支持体が少なくとも一つの織布を含んでおり、当該織布の第1の主面上に設けられた第1の導電路が、バスケットホールに存在する第1の導体部分を有している。このため、この第1の導体部分によって支持体と導電体の密着性を維持しつつ、支持体において第1の導電路や第1の絶縁層が存在していない部分では、織布の柔軟性によって優れた三次元変形への追従性を確保することができる。 According to the present invention, the support includes at least one woven fabric, and the first conductive portion provided on the first main surface of the woven fabric has the first conductor portion in the basket hole. have. For this reason, while maintaining the adhesion between the support and the conductor by the first conductor portion, the portion of the support where the first conductive path and the first insulating layer are not present is used. Therefore, excellent followability to three-dimensional deformation can be ensured.
 また、本発明によれば、第1の絶縁層が織布の第1の主面の一部の領域に設けられており、当該第1の絶縁層上に第2の導電路が設けられている。この第1の絶縁層によって織布の凹凸が平滑化されているので、第2の導電路のパターン形状や厚さを均一化することができ、第2の導電路を高い精度で形成することができる。 According to the present invention, the first insulating layer is provided in a partial region of the first main surface of the woven fabric, and the second conductive path is provided on the first insulating layer. Yes. Since the unevenness of the woven fabric is smoothed by the first insulating layer, the pattern shape and thickness of the second conductive path can be made uniform, and the second conductive path can be formed with high accuracy. Can do.
図1は、本発明の第1実施形態における配線基板を示す斜視図である。FIG. 1 is a perspective view showing a wiring board according to the first embodiment of the present invention. 図2は、図1のII-II線に沿った断面図である。FIG. 2 is a cross-sectional view taken along the line II-II in FIG. 図3は、図2のIII部の拡大図である。FIG. 3 is an enlarged view of a portion III in FIG. 図4は、図1に示す配線基板に用いられる織布の平面図である。FIG. 4 is a plan view of a woven fabric used for the wiring board shown in FIG. 図5は、図4のV-V線に沿った断面図である。FIG. 5 is a cross-sectional view taken along line VV in FIG. 図6は、図4のVI-VI線に沿った断面図である。6 is a cross-sectional view taken along line VI-VI in FIG. 図7は、本発明の第1実施形態における織布の変形例を示す断面図である。FIG. 7 is a cross-sectional view showing a modification of the woven fabric according to the first embodiment of the present invention. 図8は、本発明の第1実施形態における導電体の変形例を示す断面図である。FIG. 8 is a cross-sectional view showing a modification of the conductor in the first embodiment of the present invention. 図9は、本発明の第2実施形態における配線基板を示す斜視図である。FIG. 9 is a perspective view showing a wiring board according to the second embodiment of the present invention. 図10は、図9のX-X線に沿った断面図である。FIG. 10 is a cross-sectional view taken along line XX in FIG. 図11は、本発明の第3実施形態における配線基板を示す斜視図である。FIG. 11 is a perspective view showing a wiring board according to the third embodiment of the present invention. 図12は、図11のXII-XII線に沿った断面図である。12 is a cross-sectional view taken along line XII-XII in FIG.
 以下、本発明の実施形態を図面に基づいて説明する。 Hereinafter, embodiments of the present invention will be described with reference to the drawings.
 ≪第1実施形態≫
 図1は本発明の第1実施形態における配線基板を示す斜視図、図2は図1のII-II線に沿った断面図、図3は図2のIII部の拡大図、図4は織布の平面図、図5は図4のV-V線に沿った断面図、図6は図4のVI-VI線に沿った断面図である。
<< First Embodiment >>
1 is a perspective view showing a wiring board according to a first embodiment of the present invention, FIG. 2 is a cross-sectional view taken along line II-II in FIG. 1, FIG. 3 is an enlarged view of section III in FIG. FIG. 5 is a cross-sectional view taken along line VV in FIG. 4, and FIG. 6 is a cross-sectional view taken along line VI-VI in FIG.
 なお、図3は、図2のIII部の厳密な拡大図ではなく、第1及び第3の導電路41,43の第1及び第2の導体部分411,431(後述)の構造の理解を容易にするために、図2の切断面をバスケットホール23まで平行移動させた場合の断面図を示している。 Note that FIG. 3 is not a strict enlarged view of part III in FIG. 2, but an understanding of the structure of the first and second conductor portions 411, 431 (described later) of the first and third conductive paths 41, 43. For ease of illustration, a cross-sectional view of the cut surface of FIG.
 本発明の第1実施形態における配線基板1は、図1~図3に示すように、支持体10と、支持体10に支持された導電体40と、支持体10及び導電体40を覆っている被覆絶縁層50と、を備えている。本実施形態における支持体10が本発明における支持体の一例に相当し、本実施形態における導電体40が本発明における導電体の一例に相当し、本実施形態における被覆絶縁層50が本発明における第2の絶縁層の一例に相当する。 As shown in FIGS. 1 to 3, the wiring board 1 according to the first embodiment of the present invention covers the support 10, the conductor 40 supported by the support 10, and the support 10 and the conductor 40. And a covering insulating layer 50. The support 10 in the present embodiment corresponds to an example of the support in the present invention, the conductor 40 in the present embodiment corresponds to an example of the conductor in the present invention, and the covering insulating layer 50 in the present embodiment corresponds to the present invention. This corresponds to an example of a second insulating layer.
 この配線基板1の使用用途としては、特有の質感、複雑或いは精確な立体形状を必要とする用途を挙げることができ、具体例としては、車両のステアリングホイールやシートの皮革に設置される回路、車両のミラーやバンパーに設けられる回路等を例示することができる。なお、本発明に係る配線基板の使用用途は、特に上記に限定されない。例えば、衣服や帽子等の装着品に設ける生体情報センサ、医療介護用寝具等に設ける各種の検知センサ等の所謂ウェアラブルの用途に配線基板1を用いてもよい。或いは、配線基板1を多層プリント配線基板の内層として用いてもよい。なお、配線基板1の使用用途によっては、配線基板1が被覆絶縁層50を備えていなくてもよい。 Examples of the usage of the wiring board 1 include applications that require a specific texture, complicated or precise three-dimensional shape, and specific examples include circuits installed on the steering wheel of a vehicle or leather of a seat, A circuit provided in a mirror or a bumper of a vehicle can be exemplified. The usage application of the wiring board according to the present invention is not particularly limited to the above. For example, the wiring board 1 may be used for a so-called wearable application such as a biological information sensor provided on a wearing item such as clothes or a hat, or various detection sensors provided on a medical care bedding. Or you may use the wiring board 1 as an inner layer of a multilayer printed wiring board. Depending on the intended use of the wiring board 1, the wiring board 1 may not include the coating insulating layer 50.
 図1及び図2に示すように、支持体10は、一枚の織布20と、当該織布20の上面201の一部の領域上に設けられた支持絶縁層30と、を備えている。本実施形態における織布20が本発明における織布の一例に相当し、本実施形態における支持絶縁層30が本発明における第1の絶縁層の一例に相当する。 As shown in FIGS. 1 and 2, the support 10 includes a single woven fabric 20 and a support insulating layer 30 provided on a partial region of the upper surface 201 of the woven fabric 20. . The woven fabric 20 in the present embodiment corresponds to an example of the woven fabric in the present invention, and the support insulating layer 30 in the present embodiment corresponds to an example of the first insulating layer in the present invention.
 図4~図6に示すように、織布20は、織糸21,22を平織りで織り込むことで製織されており、柔軟性を有している。織布20を構成する織糸は、縦方向に延在する経糸21と、当該経糸21に実質的に直交する方向(すなわち横方向)に延在する緯糸22と、を含んでいる。 As shown in FIGS. 4 to 6, the woven fabric 20 is woven by weaving the woven yarns 21 and 22 in a plain weave, and has flexibility. The woven yarn constituting the woven fabric 20 includes a warp yarn 21 extending in the longitudinal direction and a weft yarn 22 extending in a direction substantially orthogonal to the warp yarn 21 (that is, the lateral direction).
 上記のように、織布20は、織糸21,22を格子状に織ることで形成されているため、複数のバスケットホール23を有している。このバスケットホール23は、経糸21と緯糸22によって囲まれた隙間(網の目)であり、織布20を当該織布20の厚さ方向に貫通している。複数のバスケットホール23は、実質的に同一の形状を有すると共に実質的に同一の開口面積を有しており、平面視において織布20に規則的且つ均一に配置されている。 As described above, the woven fabric 20 is formed by weaving the woven yarns 21 and 22 in a lattice shape, and thus has a plurality of basket holes 23. The basket hole 23 is a gap (mesh) surrounded by the warp yarn 21 and the weft yarn 22, and penetrates the woven fabric 20 in the thickness direction of the woven fabric 20. The plurality of basket holes 23 have substantially the same shape and substantially the same opening area, and are regularly and uniformly arranged on the woven fabric 20 in plan view.
 なお、このバスケットホール23の形状、開口面積、配置間隔等は、絶縁性繊維211,221の直径、織糸21,22を構成する絶縁性繊維211,221の本数、織糸21,22を構成する絶縁性繊維211,221の密度、織布20の織り方等に依存するが、配線基板1に要求される機械的特性や電気的特性に基づいて決定することができる。 Note that the shape, opening area, arrangement interval, etc. of the basket hole 23 are the diameters of the insulating fibers 211 and 221, the number of insulating fibers 211 and 221 constituting the woven yarns 21 and 22, and the woven yarns 21 and 22. Although it depends on the density of the insulating fibers 211 and 221 and the weave of the woven fabric 20, it can be determined based on the mechanical characteristics and electrical characteristics required for the wiring board 1.
 経糸21は、実質的に同一の直径を有する10~200本程度の絶縁性繊維211を束ねてそれぞれ構成されており、相互に隣接する絶縁性繊維211同士の間には間隙が形成されている。同様に、緯糸22も、実質的に同一の直径を有する10~200本程度の絶縁性繊維221を束ねてそれぞれ構成されており、相互に隣接する絶縁性繊維221同士の間には間隙が形成されている。本実施形態における絶縁性繊維211,221はいずれもガラス繊維から構成されており、1~20μm程度の実質的に同一の直径を有している。 The warp yarns 21 are each formed by bundling about 10 to 200 insulating fibers 211 having substantially the same diameter, and a gap is formed between the insulating fibers 211 adjacent to each other. . Similarly, the wefts 22 are each formed by bundling about 10 to 200 insulating fibers 221 having substantially the same diameter, and a gap is formed between the adjacent insulating fibers 221. Has been. Insulating fibers 211 and 221 in the present embodiment are both made of glass fibers and have substantially the same diameter of about 1 to 20 μm.
 特に限定されないが、こうした織布20の具体例として、以下の構成を例示することができる。すなわち、経糸21の絶縁性繊維211が7μm程度の直径を有するガラス繊維で構成されており、それぞれの経糸21は、200本程度の絶縁性繊維211を束ねて構成されている。緯糸22の絶縁性繊維221も7μm程度の直径を有するガラス繊維で構成されており、それぞれの緯糸22は、200本程度の絶縁性繊維221を束ねて構成されている。これらの織糸21,22を織り込むことで、0.1mm程度の厚さを有する織布(ガラスクロス)20が製織されている。この織布20では、経糸21の密度が横方向25mmあたり60本程度となり、緯糸22の密度も横方向25mm当たり60本程度となるように、織糸21,22が平織りで織り込まれている。こうした仕様の織布20には、20μm×20μm程度の矩形の開口形状を有する多数のバスケットホール23が0.3mm程度のピッチで存在する。 Although not particularly limited, the following configuration can be exemplified as a specific example of the woven fabric 20. That is, the insulating fibers 211 of the warps 21 are made of glass fibers having a diameter of about 7 μm, and each warp 21 is made of a bundle of about 200 insulating fibers 211. The insulating fibers 221 of the wefts 22 are also composed of glass fibers having a diameter of about 7 μm, and each weft 22 is configured by bundling about 200 insulating fibers 221. By weaving these woven yarns 21 and 22, a woven fabric (glass cloth) 20 having a thickness of about 0.1 mm is woven. In this woven fabric 20, the woven yarns 21, 22 are woven in a plain weave so that the density of the warp yarns 21 is about 60 per 25 mm in the horizontal direction and the density of the weft yarns 22 is about 60 per 25 mm in the horizontal direction. In the woven fabric 20 having such specifications, a large number of basket holes 23 having a rectangular opening shape of about 20 μm × 20 μm are present at a pitch of about 0.3 mm.
 なお、絶縁性繊維211,221は、電気絶縁性、耐熱性、及び、柔軟性を有していれば、上記のガラス繊維に特に限定されない。例えば、ナイロン繊維、レーヨン繊維、ポリエステル繊維、ポリアミド繊維、ビニル繊維、アラミド繊維等の樹脂繊維で、絶縁性繊維211,221を構成してもよい。また、導電体40との密着強度、支持体10の強度、導電体40を形成する導電性インク(後述)との親和性等の性能を改善するために、絶縁性繊維211,221の表面に化学的処理や物理的処理を施してもよい。 The insulating fibers 211 and 221 are not particularly limited to the above glass fibers as long as they have electrical insulating properties, heat resistance, and flexibility. For example, the insulating fibers 211 and 221 may be made of resin fibers such as nylon fibers, rayon fibers, polyester fibers, polyamide fibers, vinyl fibers, and aramid fibers. Further, in order to improve performance such as adhesion strength with the conductor 40, strength of the support 10 and affinity with conductive ink (described later) forming the conductor 40, the surface of the insulating fibers 211 and 221 is improved. Chemical treatment or physical treatment may be performed.
 また、それぞれの経糸21が、同一種の絶縁性繊維から構成されてもよいし、或いは、複数種の絶縁性繊維から構成されてもよい。同様に、それぞれの緯糸22が、同一種の絶縁性繊維から構成されてもよいし、或いは、複数種の絶縁性繊維から構成されてもよい。例えば、特に図示しないが、ガラス繊維と樹脂繊維の双方を用いて一本の織糸を構成してもよい。ここで、絶縁性繊維の種類を異ならせる要素としては、例えば、絶縁性繊維を構成する材料、絶縁性繊維の直径等を例示することができる。 Further, each warp 21 may be composed of the same type of insulating fiber, or may be composed of a plurality of types of insulating fiber. Similarly, each weft 22 may be made of the same type of insulating fiber, or may be made of a plurality of types of insulating fiber. For example, although not particularly illustrated, one woven yarn may be formed using both glass fibers and resin fibers. Here, as an element which makes the kind of insulating fiber different, the material which comprises an insulating fiber, the diameter of an insulating fiber, etc. can be illustrated, for example.
 また、経糸21と緯糸22が、同一の種類の織糸で構成されてもよいし、或いは、相互に異なる種類の織糸で構成されてもよい。ここで、織糸の種類を異ならせる要素としては、例えば、絶縁性繊維の材料、絶縁性繊維の直径、織糸を構成する絶縁性繊維の本数、織糸を構成する絶縁性繊維の密度等を例示することができる。 Further, the warp 21 and the weft 22 may be composed of the same type of woven yarn, or may be composed of mutually different types of woven yarn. Here, as the elements that make the type of the weaving yarn different, for example, the material of the insulating fiber, the diameter of the insulating fiber, the number of the insulating fibers constituting the weaving yarn, the density of the insulating fiber constituting the weaving yarn, etc. Can be illustrated.
 また、織布の織り方は、織糸を規則的に織り込むことで製織されたものであれば、上記の平織りに特に限定されない。例えば、綾織りや朱子織り等で織り込まれることで製織された織布を、支持体10として用いてもよい。 Further, the weaving method of the woven fabric is not particularly limited to the above-described plain weaving as long as it is woven by regularly weaving the woven yarn. For example, a woven fabric woven by twill weaving or satin weaving may be used as the support 10.
 また、経糸21と緯糸22の交差角度は、上記の直角に特に限定されない。経糸21と緯糸22が相互に交差していればよく、経糸21と緯糸22の交差角度は任意に設定することができる。 Further, the crossing angle between the warp 21 and the weft 22 is not particularly limited to the right angle. The warp yarn 21 and the weft yarn 22 need only intersect with each other, and the intersection angle of the warp yarn 21 and the weft yarn 22 can be set arbitrarily.
 さらに、支持体10が有する織布の枚数も、特に限定されず、支持体が複数の織布を有してもよい。図7は本発明の第1実施形態における織布の変形例を示す断面図である。 Further, the number of woven fabrics that the support 10 has is not particularly limited, and the support may have a plurality of woven fabrics. FIG. 7 is a cross-sectional view showing a modification of the woven fabric according to the first embodiment of the present invention.
 例えば、図7に示すように、相互に積層された2枚の織布20を相互に積層することで、支持体10bを構成してもよい。なお、図7には支持絶縁層30は図示されていない。電気絶縁性を有する粘着材(又は接着材)を一方の織布20の表面に均一且つ部分的に塗布した後に、当該織布20に他方の織布20を積み重ねることで、支持体10bを形成することができる。なお、複数の織布20が、同一種の織布で構成されていてもよいし、或いは、複数種の織布で構成されていてもよい。ここで、織布の種類を異ならせる要素としては、例えば、絶縁性繊維を構成する材料、絶縁性繊維の直径、織糸を構成する絶縁性繊維の本数、織糸を構成する絶縁性繊維の密度、織布の織り方、織布の厚さ等を例示することができる。 For example, as shown in FIG. 7, the support 10b may be configured by stacking two woven fabrics 20 stacked on each other. In FIG. 7, the supporting insulating layer 30 is not shown. After a pressure-sensitive adhesive material (or adhesive) having electrical insulation properties is uniformly and partially applied to the surface of one woven fabric 20, the other woven fabric 20 is stacked on the woven fabric 20 to form the support 10b. can do. In addition, the some woven fabric 20 may be comprised with the same kind of woven fabric, or may be comprised with the multiple types of woven fabric. Here, the elements that make the type of the woven fabric different include, for example, the material constituting the insulating fiber, the diameter of the insulating fiber, the number of insulating fibers constituting the woven yarn, and the insulating fiber constituting the woven yarn. The density, the weaving method of the woven fabric, the thickness of the woven fabric, etc. can be exemplified.
 支持絶縁層30は、図1及び図2に示すように、織布20の上面201上に直接設けられており、本実施形態では、導電体40の第2の導電路42(後述)の形成が予定されている領域に設けられている。この支持絶縁層30の上面301は、織布20の上面201と比較して平坦となっており、この支持絶縁層30によって織布20の上面201の凹凸が平滑化されている。このため、本実施形態では、第2の導電路42のパターン形状や厚さを均一化することができ、第2の導電路42を高い精度で形成することができる。 As shown in FIGS. 1 and 2, the support insulating layer 30 is directly provided on the upper surface 201 of the woven fabric 20, and in this embodiment, a second conductive path 42 (described later) of the conductor 40 is formed. Is provided in the planned area. The upper surface 301 of the support insulating layer 30 is flatter than the upper surface 201 of the woven fabric 20, and the unevenness of the upper surface 201 of the woven fabric 20 is smoothed by the support insulating layer 30. For this reason, in this embodiment, the pattern shape and thickness of the 2nd conductive path 42 can be equalize | homogenized, and the 2nd conductive path 42 can be formed with high precision.
 この支持絶縁層30は、例えば、エポキシアクリレート樹脂やノボラック型フェノール樹脂等の樹脂材料から構成されており、電気絶縁性を有している。この支持絶縁層30は、導電体40を形成する前に織布20の上面201に予め形成されており、例えば、液状樹脂を織布20の上面201に塗布した後に硬化処理を行うことで形成されている。この支持絶縁層30は、織布20のバスケットホール23を上面201側から閉塞している。このため、導電体40を形成する際に、第2の導電路42において導電性インクが織布20の下面202に浸透してしまうことが防止されている。 The support insulating layer 30 is made of, for example, a resin material such as an epoxy acrylate resin or a novolac type phenol resin, and has an electrical insulating property. The insulating support layer 30 is formed in advance on the upper surface 201 of the woven fabric 20 before the conductor 40 is formed. For example, the support insulating layer 30 is formed by applying a liquid resin to the upper surface 201 of the woven fabric 20 and then performing a curing process. Has been. The insulating support layer 30 closes the basket hole 23 of the woven fabric 20 from the upper surface 201 side. For this reason, when the conductor 40 is formed, the conductive ink is prevented from penetrating into the lower surface 202 of the woven fabric 20 in the second conductive path 42.
 液状樹脂の塗布方法としては、特に限定されないが、接触塗布法又は非接触塗布法のいずれを用いてもよい。接触塗布法の具体例としては、スクリーン印刷、グラビア印刷、オフセット印刷、グラビアオフセット印刷、フレキソ印刷等を例示することができる。一方、非接触塗布法の具体例としては、インクジェット印刷、スプレー塗布法、ディスペンス塗布法、ジェットディスペンス法等を例示することができる。また、液状樹脂の効果方法としては、特に限定されないが、加熱処理や紫外線照射処理等を例示することができる。 The method for applying the liquid resin is not particularly limited, and either a contact coating method or a non-contact coating method may be used. Specific examples of the contact coating method include screen printing, gravure printing, offset printing, gravure offset printing, flexographic printing, and the like. On the other hand, specific examples of the non-contact coating method include inkjet printing, spray coating method, dispense coating method, jet dispensing method and the like. Moreover, the effect method of the liquid resin is not particularly limited, and examples thereof include heat treatment and ultraviolet irradiation treatment.
 なお、支持絶縁層30を複数の層で形成してもよい。また、特に図示しないが、電気絶縁性を有するフィルムを、粘着層(又は接着層)を介して織布20の上面201に貼り付けることで、支持絶縁層30を形成してもよい(図10参照)。さらに、導電路の形成を予定していない領域に、支持絶縁層30を設けてもよい。これにより、配線基板の剛性を部分的に補強することができ、例えば、電子部品を配線基板1に実装した際の当該配線基板1の変形を抑制することができる。 Note that the support insulating layer 30 may be formed of a plurality of layers. Although not particularly illustrated, the insulating support layer 30 may be formed by attaching an electrically insulating film to the upper surface 201 of the woven fabric 20 via an adhesive layer (or adhesive layer) (FIG. 10). reference). Furthermore, the support insulating layer 30 may be provided in a region where the formation of the conductive path is not planned. Thereby, the rigidity of a wiring board can be partially reinforced, for example, the deformation | transformation of the said wiring board 1 at the time of mounting an electronic component in the wiring board 1 can be suppressed.
 導電体40は、図1~図3に示すように、第1の導電路41と、第2の導電路42と、第3の導電路43と、を含んでいる。第1の導電路41は、織布20の上面201に設けられており、一対のランド部401,402を形成している。第2の導電路42は、支持絶縁層30の上面301に設けられており、配線部406を形成している。第3の導電路43は、織布20の下面202に設けられており、一対のランド部403,404を形成している。なお、本実施形態では、支持体10の下面に配線部は設けられていない。 The conductor 40 includes a first conductive path 41, a second conductive path 42, and a third conductive path 43 as shown in FIGS. 1 to 3. The first conductive path 41 is provided on the upper surface 201 of the woven fabric 20 and forms a pair of land portions 401 and 402. The second conductive path 42 is provided on the upper surface 301 of the support insulating layer 30 and forms a wiring portion 406. The third conductive path 43 is provided on the lower surface 202 of the woven fabric 20 and forms a pair of land portions 403 and 404. In the present embodiment, no wiring part is provided on the lower surface of the support 10.
 織布20の上面201において、一対のランド部401,402は、配線部406の両端に設けられており、当該配線部406を介して相互に接続されている。当該織布20の下面202のランド部403,404は、上面201のランド部401,402に対応するように設けられており、第1及び第3の導電路41,43の導体部分411,431(後述)を介して、上面201のランド部401,402と、下面202のランド部403,404とが電気的に接続されている。 On the upper surface 201 of the woven fabric 20, the pair of land portions 401 and 402 are provided at both ends of the wiring portion 406 and are connected to each other via the wiring portion 406. The land portions 403 and 404 on the lower surface 202 of the woven fabric 20 are provided so as to correspond to the land portions 401 and 402 on the upper surface 201, and the conductor portions 411 and 431 of the first and third conductive paths 41 and 43. The land portions 401 and 402 on the upper surface 201 and the land portions 403 and 404 on the lower surface 202 are electrically connected via (described later).
 なお、導電体40の形状は、上記に特に限定されない。例えば、第2の導電路42で形成された配線部406に加えて、高い精度が要求されない部分については、第1又は第3の導電路41,43によって他の配線部を形成してもよい。 Note that the shape of the conductor 40 is not particularly limited to the above. For example, in addition to the wiring portion 406 formed by the second conductive path 42, other wiring portions may be formed by the first or third conductive paths 41 and 43 for portions that do not require high accuracy. .
 導電体40は、例えば、銅(Cu)或いは銀(Ag)等を主成分とする導電性金属粒子と、バインダ樹脂とから構成されており、導電性を有している。本実施形態では、第1~第3の導電路41~43が同一の組成の材料から構成されている。なお、導電体40が、複数種の導電性金属粒子を含有していてもよい。この導電体40は、支持体10に塗布した導電性インクを加熱して焼成することで形成されている。 The conductor 40 is made of, for example, conductive metal particles mainly composed of copper (Cu) or silver (Ag) and a binder resin, and has conductivity. In the present embodiment, the first to third conductive paths 41 to 43 are made of a material having the same composition. The conductor 40 may contain a plurality of types of conductive metal particles. The conductor 40 is formed by heating and baking the conductive ink applied to the support 10.
 導電体40を形成するための導電性インクは、導電性金属粒子と、該導電性金属粒子を均一に分散するバインダ樹脂と、を含有した溶液である。導電性金属粒子の具体例としては、例えば、銅(Cu)或いは銀(Ag)等を主成分とする導電性金属粒子を例示することができる。バインダ樹脂としては、多価フェノール化合物、フェノール樹脂、アルキッド樹脂、不飽和ポリエステル樹脂、エポキシ樹脂などの熱硬化性樹脂の1種または2種以上の樹脂混合を例示することができる。このとき、バインダ樹脂には水系溶媒、あるいはエタノール、メタノール、2-プロパノールなどのアルコール類、イソホロン、テルピネオール、トリエチレングリコールモノブチルエーテル、ブチルセロソルブアセテートなどの有機系溶媒を分散媒として適量配合される。なお、この溶媒の配合量は、導電性金属粒子のサイズ、形状や製膜条件等に応じて適宜調整される。 The conductive ink for forming the conductor 40 is a solution containing conductive metal particles and a binder resin that uniformly disperses the conductive metal particles. Specific examples of the conductive metal particles include conductive metal particles mainly composed of copper (Cu) or silver (Ag). Examples of the binder resin include one or a mixture of two or more thermosetting resins such as polyhydric phenol compounds, phenol resins, alkyd resins, unsaturated polyester resins, and epoxy resins. At this time, an appropriate amount of an aqueous solvent or an alcohol such as ethanol, methanol or 2-propanol, or an organic solvent such as isophorone, terpineol, triethylene glycol monobutyl ether or butyl cellosolve acetate is added to the binder resin as a dispersion medium. In addition, the compounding quantity of this solvent is suitably adjusted according to the size, shape, film forming conditions, etc. of electroconductive metal particle.
 導電性インクを支持体10に塗布する方法としては、特に限定されないが、接触塗布法又は非接触塗布法のいずれを用いてもよい。接触塗布法の具体例としては、スクリーン印刷、グラビア印刷、オフセット印刷、グラビアオフセット印刷、フレキソ印刷等を例示することができる。一方、非接触塗布法の具体例としては、インクジェット印刷、スプレー塗布法、ディスペンス塗布法、ジェットディスペンス法等を例示することができる。 The method for applying the conductive ink to the support 10 is not particularly limited, and either a contact application method or a non-contact application method may be used. Specific examples of the contact coating method include screen printing, gravure printing, offset printing, gravure offset printing, flexographic printing, and the like. On the other hand, specific examples of the non-contact coating method include inkjet printing, spray coating method, dispense coating method, jet dispensing method and the like.
 なお、支持体10への導電性インクの塗布回数は、特に1回に限定されず、導電性インクを支持体10の一方の主面に複数回塗布してもよい。また、各回の塗布毎に、導電性インクの成分を異ならせてもよい。さらに、支持体10の同一面(例えば上面201)に設けられた全ての導電路(例えば第1及び第2の導電路41,42)を同一の工程で形成してもよいし、別々の工程で形成してもよい。 Note that the number of times of applying the conductive ink to the support 10 is not particularly limited to one, and the conductive ink may be applied to one main surface of the support 10 a plurality of times. Moreover, you may vary the component of a conductive ink for every application | coating of each time. Further, all the conductive paths (for example, the first and second conductive paths 41 and 42) provided on the same surface (for example, the upper surface 201) of the support 10 may be formed in the same process, or separate processes. May be formed.
 導電性インクを硬化させるための熱源としては、特に限定されないが、電熱オーブン、赤外線オーブン、遠赤外炉(IR)、近赤外炉(NIR)、レーザ照射装置等を例示することができ、これらを組み合わせた熱処理であってもよい。具体例を挙げれば、遠赤外炉を用いた場合には、150℃程度で10min程度の熱処理を行う。 The heat source for curing the conductive ink is not particularly limited, and examples thereof include an electric heating oven, an infrared oven, a far infrared furnace (IR), a near infrared furnace (NIR), and a laser irradiation device. A heat treatment combining these may also be used. As a specific example, when a far-infrared furnace is used, heat treatment is performed at about 150 ° C. for about 10 minutes.
 織布20の上面201に塗布された導電性インクは当該織布20内に浸透(浸潤)するため、第1の導電路41は、図3に示すように、第1の導体部分411と第1の介在部分412を有している。この第1の導体部分411と第1の介在部分412は、第1の導電路41と一体的に形成されている。第1の導体部分411は、織布20のバスケットホール23(すなわち織糸211,212同士の間の間隙)に存在している。一方、第1の介在部分412は、絶縁性繊維211,221同士の間に形成された間隙に入り込んで、当該間隙内に存在している。 Since the conductive ink applied to the upper surface 201 of the woven fabric 20 penetrates (infiltrates) into the woven fabric 20, the first conductive path 41 has a first conductor portion 411 and a first conductive portion 411 as shown in FIG. 1 intervening portion 412. The first conductor portion 411 and the first interposed portion 412 are formed integrally with the first conductive path 41. The first conductor portion 411 is present in the basket hole 23 of the woven fabric 20 (that is, the gap between the woven yarns 211 and 212). On the other hand, the first intervening portion 412 enters the gap formed between the insulating fibers 211 and 221 and exists in the gap.
 一方、支持絶縁層30の上面301に塗布された導電性インクは当該支持絶縁層30内に浸透しない。そのため、第2の導電路42は導体部分や介在部分を有していない。図2に示すように、この第2の導電路42の端部は、第1の導電路41の端部と繋がっており、第2の導電路42は第1の導電路41と一体的に形成されているため、第1の導電路41と第2の導電路42は電気的に接続されている。上述のように、この第2の導電路42は、平坦な支持絶縁層30の上面301に形成されているため、高い精度で形成されている。 On the other hand, the conductive ink applied to the upper surface 301 of the support insulating layer 30 does not penetrate into the support insulating layer 30. Therefore, the second conductive path 42 does not have a conductor portion or an interposed portion. As shown in FIG. 2, the end of the second conductive path 42 is connected to the end of the first conductive path 41, and the second conductive path 42 is integrated with the first conductive path 41. Since it is formed, the first conductive path 41 and the second conductive path 42 are electrically connected. As described above, since the second conductive path 42 is formed on the upper surface 301 of the flat support insulating layer 30, it is formed with high accuracy.
 織布20の下面202に塗布された導電性インクは当該織布20内に浸透するため、図3に示すように、第1の導電路41と同様に、第3の導電路43は、第2の導体部分431と第2の介在部分432を有している。この第2の導体部分431と第2の介在部分432は、第3の導電路43と一体的に形成されている。第2の導体部分431は、織布20のバスケットホール23(すなわち織糸211,212同士の間の間隙)に存在している。一方、第2の介在部分432は、絶縁性繊維211,212同士の間に形成された間隙に入り込んで、当該間隙内に存在している。 Since the conductive ink applied to the lower surface 202 of the woven fabric 20 penetrates into the woven fabric 20, as shown in FIG. 3, the third conductive path 43 is similar to the first conductive path 41. Two conductor portions 431 and a second intervening portion 432. The second conductor portion 431 and the second interposed portion 432 are formed integrally with the third conductive path 43. The second conductor portion 431 is present in the basket hole 23 of the woven fabric 20 (that is, the gap between the woven yarns 211 and 212). On the other hand, the second interposition part 432 enters the gap formed between the insulating fibers 211 and 212 and exists in the gap.
 さらに、本実施形態では、第1の導体部分411と第2の導体部分431が相互に接合されている。このため、第1の導電路41と第3の導電路43は、第1及び第2の導体部分411,431を介して相互に電気的に接続されている。すなわち、当該第1及び第2の導体部分411,431は、第1の導電路41と第3の導電路43の間の層間接続部として機能する。 Further, in the present embodiment, the first conductor portion 411 and the second conductor portion 431 are joined to each other. Therefore, the first conductive path 41 and the third conductive path 43 are electrically connected to each other via the first and second conductor portions 411 and 431. That is, the first and second conductor portions 411 and 431 function as an interlayer connection between the first conductive path 41 and the third conductive path 43.
 なお、図8に示すように、第1の導電路41bを複数の導電層413,414で構成してもよい。同様に、図8に示すように、第3の導電路43bを複数の導電層433,434で構成してもよい。図8は本発明の第1実施形態態における配線基板の変形例を示す断面図である。 As shown in FIG. 8, the first conductive path 41b may be composed of a plurality of conductive layers 413 and 414. Similarly, as shown in FIG. 8, the third conductive path 43 b may be composed of a plurality of conductive layers 433 and 434. FIG. 8 is a sectional view showing a modification of the wiring board according to the first embodiment of the present invention.
 この追加の導電層414,434は、支持体10に導電性インクを複数回塗布することで形成されている。或いは、電解めっき処理や無電解めっき処理によって、追加の導電層414,434を形成してもよい。なお、この追加の導電層414,434の数は特に限定されず、複数の導電層414,434を形成してもよい。 The additional conductive layers 414 and 434 are formed by applying conductive ink to the support 10 a plurality of times. Alternatively, the additional conductive layers 414 and 434 may be formed by electrolytic plating or electroless plating. Note that the number of the additional conductive layers 414 and 434 is not particularly limited, and a plurality of conductive layers 414 and 434 may be formed.
 めっき処理により追加の導電層414,434を形成することで、第1及び第3の導電路41b,43bの膜厚を厚くすることができ、また、当該第1及び第3の導電路41b,43bの表面平滑性(表面の凹凸や微小なクラックの補完等)を改善することもできる。 By forming the additional conductive layers 414 and 434 by plating, the thickness of the first and third conductive paths 41b and 43b can be increased, and the first and third conductive paths 41b, It is also possible to improve the surface smoothness of 43b (such as surface irregularities and complementation of minute cracks).
 被覆絶縁層50は、例えば樹脂材料から構成されており、電気絶縁性をはじめとする電気的特性と、柔軟性や剛直性などの機械的特性を有している。この被覆絶縁層50は、液状樹脂で支持体10全体を覆うと共に当該液状樹脂を織布20に浸透(浸潤)させて硬化させることで形成されている。そのため、図1~図3に示すように、被覆絶縁層50は、導電体40及び支持体10を被覆していると共に織布20内にも存在している。本実施形態では、この被覆絶縁層50によって、配線基板1の機械的強度、導電体40の保護、導電体40の電気絶縁性、導電体40の電気的特性(誘電率等)を確保することに加えて、上述の特有の質感、任意の色、任意の柔軟性等を配線基板1に付与することもできる。 The covering insulating layer 50 is made of, for example, a resin material, and has electrical characteristics such as electrical insulation, and mechanical characteristics such as flexibility and rigidity. The covering insulating layer 50 is formed by covering the entire support 10 with a liquid resin and allowing the liquid resin to permeate (infiltrate) the woven fabric 20 and cure. Therefore, as shown in FIGS. 1 to 3, the covering insulating layer 50 covers the conductor 40 and the support 10 and is also present in the woven fabric 20. In this embodiment, the coating insulating layer 50 ensures the mechanical strength of the wiring board 1, protection of the conductor 40, electrical insulation of the conductor 40, and electrical characteristics (dielectric constant, etc.) of the conductor 40. In addition to the above, the wiring board 1 can be provided with the above-mentioned specific texture, arbitrary color, arbitrary flexibility, and the like.
 この被覆絶縁層50の上面に第1及び第2の窓部51,52が形成されていると共に、当該被覆絶縁層50の下面に第3及び第4の窓部53,54が形成されている。第1及び第2の窓部51,52は、第1の導電路41のランド部401,402を上方に向かってそれぞれ露出させている。一方、第3及び第4の窓部53,54は、第3の導電路43のランド部403,404を下方に向かってそれぞれ露出させている。このため、配線基板1の導電体40に対して上下両側から電気的に接続することが可能となっている。 First and second window portions 51 and 52 are formed on the upper surface of the covering insulating layer 50, and third and fourth window portions 53 and 54 are formed on the lower surface of the covering insulating layer 50. . The first and second window portions 51 and 52 expose the land portions 401 and 402 of the first conductive path 41 upward, respectively. On the other hand, the third and fourth window portions 53 and 54 expose the land portions 403 and 404 of the third conductive path 43 downward, respectively. For this reason, it can be electrically connected to the conductor 40 of the wiring board 1 from both the upper and lower sides.
 特に限定されないが、液状樹脂の具体例としては、共重合体を水に分散させてなるポリマーエマルジョンを例示することができ、共重合体の具体例としては、主成分としてのアクリル酸エステルやメタクリル酸エステルと、必要な特性を付与するための適量のスチレンやアクリルニトリルと、を共重合させたものを例示することができる。また、液状樹脂を塗布する方法としては、上述の接触塗布法又は非接触塗布法を例示することができる。導電体40及び支持体10の表面を覆うと共に織布20に含浸された液状樹脂に対して、加熱処理や紫外線照射処理等により硬化処理を行うことで、被覆絶縁層50が形成される。なお、硬化処理において、加圧、減圧等の付加的処理を同時に行ってもよい。 Although not particularly limited, specific examples of the liquid resin include polymer emulsions in which a copolymer is dispersed in water. Specific examples of the copolymer include acrylic acid esters and methacrylic compounds as main components. Examples include those obtained by copolymerizing an acid ester and an appropriate amount of styrene or acrylonitrile for imparting necessary characteristics. Moreover, as a method of apply | coating liquid resin, the above-mentioned contact application method or non-contact application method can be illustrated. The coating insulating layer 50 is formed by performing a curing process on the liquid resin covering the surfaces of the conductor 40 and the support 10 and impregnated in the woven fabric 20 by a heating process, an ultraviolet irradiation process, or the like. In the curing process, additional processes such as pressurization and decompression may be performed simultaneously.
 なお、液状樹脂に代えて、シリコンゴム等の粉体の成型用樹脂を用い、成形金型を用いた射出成型法により被覆絶縁層50を形成してもよい。或いは、窓部に対応する開口を有する硬化性樹脂シートを支持体10に重ねた後に加圧及び加熱処理することで、被覆絶縁層50を形成してもよい。 It should be noted that the insulating coating layer 50 may be formed by an injection molding method using a molding die by using a powder molding resin such as silicon rubber instead of the liquid resin. Alternatively, the covering insulating layer 50 may be formed by applying pressure and heat treatment after a curable resin sheet having an opening corresponding to the window portion is stacked on the support 10.
 以上のように、本実施形態では、支持体10が織布20を含んでいる。このため、支持体10において第1及び第3の導電路41,43や支持絶縁層30が存在していない部分では、織布20の柔軟性によって優れた三次元変形への追従性を確保することができる。 As described above, in the present embodiment, the support 10 includes the woven fabric 20. Therefore, in the portion of the support 10 where the first and third conductive paths 41 and 43 and the support insulating layer 30 are not present, excellent followability to three-dimensional deformation is ensured by the flexibility of the woven fabric 20. be able to.
 その一方で、本実施形態では、第1の導電路41の第1の導体部分411が織布20のバスケットホール23に存在していると共に、当該第1の導電路41の第1の介在部分412が絶縁性繊維211,221同士の間の間隙に存在している。このように、本実施形態では、第1の導体部分411及び第1の介在部分412が織布20に食い込んでおり、そのアンカー効果によって支持体10と第1の導電路41の密着強度(接合強度、剥離強度)の向上が図られている。このため、電子部品を配線基板1に実装しても、第1の導電路41が支持体10から剥離してしまう現象の発生を抑制することができる。 On the other hand, in the present embodiment, the first conductor portion 411 of the first conductive path 41 is present in the basket hole 23 of the woven fabric 20 and the first interposed portion of the first conductive path 41 is present. 412 exists in the gap between the insulating fibers 211 and 221. As described above, in the present embodiment, the first conductor portion 411 and the first interposition portion 412 bite into the woven fabric 20, and due to the anchor effect, the adhesion strength (bonding) between the support 10 and the first conductive path 41 is obtained. Strength and peel strength) are improved. For this reason, even if the electronic component is mounted on the wiring board 1, it is possible to suppress the occurrence of the phenomenon that the first conductive path 41 is peeled off from the support 10.
 同様に、本実施形態では、第3の導電路43の第2の導体部分431が織布20のバスケットホール23に存在していると共に、当該第3の導電路43の第2の介在部分432が絶縁性繊維211,221同士の間の間隙に存在している。このように、本実施形態では、第2の導体部分431及び第2の介在部分432が織布20に食い込んでおり、そのアンカー効果によって支持体10と第3の導電路43の密着強度(接合強度、剥離強度)の向上が図られている。このため、電子部品を配線基板1に実装しても、第3の導電路43が支持体10から剥離してしまう現象の発生を抑制することができる。 Similarly, in the present embodiment, the second conductor portion 431 of the third conductive path 43 exists in the basket hole 23 of the woven fabric 20, and the second interposed portion 432 of the third conductive path 43. Exists in the gap between the insulating fibers 211 and 221. As described above, in the present embodiment, the second conductor portion 431 and the second interposed portion 432 bite into the woven fabric 20, and due to the anchor effect, the adhesion strength (bonding) between the support 10 and the third conductive path 43. Strength and peel strength) are improved. For this reason, even if an electronic component is mounted on the wiring board 1, the occurrence of the phenomenon that the third conductive path 43 is peeled off from the support 10 can be suppressed.
 さらに、本実施形態では、支持絶縁層30が織布20の上面201の一部の領域に設けられており、当該支持絶縁層30上に第2の導電路42が設けられている。この支持絶縁層30によって織布20の凹凸が平滑化されているので、第2の導電路42のパターン形状や厚さを均一化することができ、第2の導電路42を高い精度で形成することができる。 Furthermore, in this embodiment, the support insulating layer 30 is provided in a partial region of the upper surface 201 of the woven fabric 20, and the second conductive path 42 is provided on the support insulating layer 30. Since the unevenness of the woven fabric 20 is smoothed by the support insulating layer 30, the pattern shape and thickness of the second conductive path 42 can be made uniform, and the second conductive path 42 can be formed with high accuracy. can do.
 ここで、例えば、従来のフレキシブルプリント配線板(FPC)では、導電体を基板上に形成するため、当該基板を構成する材料(ポリイミド等)を任意に変更することはできない。 Here, for example, in a conventional flexible printed wiring board (FPC), since a conductor is formed on a substrate, a material (polyimide or the like) constituting the substrate cannot be arbitrarily changed.
 これに対し、本実施形態では、導電体40を支持体10に形成した後に被覆絶縁層50を形成するので、配線基板1の使用用途に応じて、被覆絶縁層50を構成する樹脂材料を任意に選択することができる。このため、上述の特有の質感を配線基板1に付与したり、任意の色を配線基板1に付与したり、従来のFPCよりも優れた柔軟性を配線基板1に付与することができる。 On the other hand, in this embodiment, since the covering insulating layer 50 is formed after the conductor 40 is formed on the support 10, the resin material constituting the covering insulating layer 50 is arbitrarily selected according to the use application of the wiring board 1. Can be selected. For this reason, the above-mentioned peculiar texture can be given to wiring board 1, arbitrary colors can be given to wiring board 1, and flexibility superior to conventional FPC can be given to wiring board 1.
 さらに、本実施形態では、導電体40が形成された支持体10を所望の形状に変形させた状態で、当該支持体10に樹脂材料を含浸して硬化させ、被覆絶縁層50を形成することができる。このため、本実施形態では、複雑或いは精確な立体形状を必要とする用途に、配線基板1を使用することができる。 Furthermore, in this embodiment, the support 10 on which the conductor 40 is formed is deformed into a desired shape, and the support 10 is impregnated with a resin material and cured to form the covering insulating layer 50. Can do. For this reason, in this embodiment, the wiring board 1 can be used for an application that requires a complicated or precise three-dimensional shape.
 <<第2実施形態>>
 図9は本発明の第2実施形態における配線基板を示す斜視図、図10は図9のX-X線に沿った断面図である。本実施形態では、支持体10Bと導電体40Bの構成が第1実施形態と相違するが、それ以外の構成は第1実施形態と同様である。以下に、第2実施形態における配線基板1Bについて第1実施形態との相違点についてのみ説明し、第1実施形態と同様の構成である部分については同一符号を付して説明を省略する。
<< Second Embodiment >>
FIG. 9 is a perspective view showing a wiring board according to the second embodiment of the present invention, and FIG. 10 is a cross-sectional view taken along the line XX of FIG. In this embodiment, although the structure of the support body 10B and the conductor 40B is different from 1st Embodiment, the structure of other than that is the same as that of 1st Embodiment. In the following, only the differences from the first embodiment of the wiring board 1B in the second embodiment will be described, and the same reference numerals will be given to portions having the same configuration as in the first embodiment, and the description thereof will be omitted.
 本実施形態では、図9及び図10に示すように、支持絶縁層30B及び第2の導電路42Bを有する子基板70を予め準備しておき、粘着層(又は接着層)60を介してこの子基板70を織布20に貼り付けた後に、第1及び第3の導電路41,43を形成することで、支持体10Bと導電体40Bが形成されている。このため、子基板70は、FPC等の公知のプリント配線板から構成されている。すなわち、一例を挙げれば、支持絶縁層30Bは、ポリイミド等からなるフィルムから構成されており、第2の導電路42Bは、当該フィルム上に設けられた銅箔等の金属箔をパターニングすることで形成されている。 In this embodiment, as shown in FIGS. 9 and 10, a child substrate 70 having a support insulating layer 30 </ b> B and a second conductive path 42 </ b> B is prepared in advance, and this is interposed via an adhesive layer (or adhesive layer) 60. After the sub board 70 is attached to the woven fabric 20, the first and third conductive paths 41 and 43 are formed, whereby the support 10B and the conductor 40B are formed. For this reason, the sub board | substrate 70 is comprised from well-known printed wiring boards, such as FPC. That is, for example, the support insulating layer 30B is made of a film made of polyimide or the like, and the second conductive path 42B is formed by patterning a metal foil such as a copper foil provided on the film. Is formed.
 また、本実施形態では、上述のように子基板70を用いて支持体10Bと導電体40Bを形成するため、第2の導電路42Bを構成する材料の組成が、第1及び第3の導電路41,43を構成する材料の組成と異なっている。このため、図10に示すように、第1の導電路41の一部が第2の導電路42Bの一部と重なっており、第1の導電路41と第2の導電路42が電気的に接続されている。 Moreover, in this embodiment, since the support body 10B and the conductor 40B are formed using the sub board | substrate 70 as mentioned above, the composition of the material which comprises the 2nd conductive path 42B is the 1st and 3rd electroconductivity. The composition of the material constituting the paths 41 and 43 is different. For this reason, as shown in FIG. 10, a part of the first conductive path 41 overlaps a part of the second conductive path 42B, and the first conductive path 41 and the second conductive path 42 are electrically connected. It is connected to the.
 本実施形態では、第1実施形態と同様に、支持体10Bが織布20を含んでおり、当該織布20の上面201上に設けられた第1の導電路41が、バスケットホール23に存在する第1の導体部分411を有している。このため、この第1の導体部分411によって支持体10Bと導電体40Bの密着性を維持しつつ、支持体10Bにおいて第1の導電路41や支持絶縁層30Bが存在していない部分では、織布20の柔軟性によって優れた三次元変形への追従性を確保することができる。 In the present embodiment, as in the first embodiment, the support 10 </ b> B includes the woven fabric 20, and the first conductive path 41 provided on the upper surface 201 of the woven fabric 20 exists in the basket hole 23. The first conductor portion 411 is provided. For this reason, while maintaining the adhesion between the support 10B and the conductor 40B by the first conductor portion 411, the portion of the support 10B where the first conductive path 41 and the support insulating layer 30B are not present is woven. The followability to the three-dimensional deformation excellent by the flexibility of the cloth 20 can be ensured.
 これに加えて、本実施形態では、予め準備しておいた子基板70を織布20に貼り付けた後に第1及び第3の導電路41,43を形成することで、支持体10Bと導電体40Bを形成する。このため、金属箔をパターニングすることで第2の導電路42Bを形成することが可能となるので、印刷法では実現の困難な精密且つ精細な配線を形成することができる。 In addition to this, in the present embodiment, the first and third conductive paths 41 and 43 are formed after the child substrate 70 prepared in advance is attached to the woven fabric 20, whereby the support 10 </ b> B and the conductive body 10 </ b> B are electrically connected. Form body 40B. For this reason, it is possible to form the second conductive path 42B by patterning the metal foil, so that it is possible to form a precise and fine wiring that is difficult to realize by the printing method.
 また、印刷法で形成された導電路はバインダ成分を含有しているため、半田付けにより電子部品を接続することができない。これに対し、本実施形態では、上述のように、金属箔をパターニングすることで第2の導電路42Bを形成することができるので、電子部品を半田付けにより接続することも可能となる。 Also, since the conductive path formed by the printing method contains a binder component, it is not possible to connect electronic components by soldering. On the other hand, in the present embodiment, as described above, the second conductive path 42B can be formed by patterning the metal foil, so that the electronic components can be connected by soldering.
 ≪第3実施形態≫
 図11は本発明の第3実施形態における配線基板を示す斜視図、図12は図11のXII-XII線に沿った断面図である。なお、図11及び図12では、導電体40Cを見やすくするために、被覆絶縁層50を図示していない。
«Third embodiment»
FIG. 11 is a perspective view showing a wiring board according to the third embodiment of the present invention, and FIG. 12 is a sectional view taken along line XII-XII in FIG. In FIGS. 11 and 12, the covering insulating layer 50 is not shown in order to make the conductor 40C easy to see.
 本実施形態では、支持体10Cと導電体40Cの構成が第2実施形態と相違するが、それ以外の構成は第1実施形態と同様である。以下に、第3実施形態における配線基板1Cについて第1実施形態との相違点についてのみ説明し、第1実施形態と同様の構成である部分については同一符号を付して説明を省略する。 In this embodiment, the configurations of the support 10C and the conductor 40C are different from those of the second embodiment, but the other configurations are the same as those of the first embodiment. Only the differences from the first embodiment will be described below with respect to the wiring board 1 </ b> C in the third embodiment, and portions having the same configurations as those in the first embodiment are denoted by the same reference numerals and description thereof is omitted.
 本実施形態の支持絶縁層30Cは、一対の貫通孔302,303を有している点で相違している。この貫通孔302,303からは、織布20が露出している。本実施形態では、これらの貫通孔302,303を介して、第1の導電路41が織布20の上面201に形成されている。 The support insulating layer 30C of this embodiment is different in that it has a pair of through holes 302 and 303. The woven fabric 20 is exposed from the through holes 302 and 303. In the present embodiment, the first conductive path 41 is formed on the upper surface 201 of the woven fabric 20 through these through holes 302 and 303.
 本実施形態の導電体40Cは、図11及び図12に示すように、第1の導電路41と、第2の導電路42Cと、第3の導電路43と、を含んでいる。第1の導電路41は、織布20の上面201に設けられており、一対のランド部401,402を形成している。第2の導電路42Cは、支持絶縁層30Cの上面301に設けられており、ランド部405と配線部406を形成している。第3の導電路43は、織布20の下面202に設けられており、一対のランド部403,404と配線部407とを形成している。 The conductor 40C of the present embodiment includes a first conductive path 41, a second conductive path 42C, and a third conductive path 43, as shown in FIGS. The first conductive path 41 is provided on the upper surface 201 of the woven fabric 20 and forms a pair of land portions 401 and 402. The second conductive path 42C is provided on the upper surface 301 of the support insulating layer 30C, and forms a land portion 405 and a wiring portion 406. The third conductive path 43 is provided on the lower surface 202 of the woven fabric 20 and forms a pair of land portions 403 and 404 and a wiring portion 407.
 本実施形態では、ランド部401は、支持絶縁層30Cの貫通孔302を介して、織布20の上面201に設けられている。ランド部403は、当該貫通孔302に対応するように織布20の下面202に設けられており、第1及び第2の導体部分411,431を介して、ランド部401,403が相互に電気的に接続されている。ランド部403,404は、織布20の下面202に設けられた配線部407を介して電気的に接続されている。ランド部402は、支持絶縁層30Cの貫通孔303を介して、織布20の上面201に設けられている。ランド部404は、当該貫通孔303に対応するように織布20の下面202に設けられており、ランド部402,404は、第1及び第2の導体部分411,431を介して相互に電気的に接続されている。配線部406は、中央が閉塞された平面コイル状の形状を有しており、配線部406の外側に設けられたランド部405と、当該配線部406の内側に設けられたランド部402とを電気的に接続している。ランド部405は、支持絶縁層30Cの上面301に設けられている。 In the present embodiment, the land portion 401 is provided on the upper surface 201 of the woven fabric 20 through the through hole 302 of the support insulating layer 30C. The land portion 403 is provided on the lower surface 202 of the woven fabric 20 so as to correspond to the through hole 302, and the land portions 401 and 403 are electrically connected to each other via the first and second conductor portions 411 and 431. Connected. The land portions 403 and 404 are electrically connected via a wiring portion 407 provided on the lower surface 202 of the woven fabric 20. The land portion 402 is provided on the upper surface 201 of the woven fabric 20 through the through hole 303 of the support insulating layer 30C. The land portion 404 is provided on the lower surface 202 of the woven fabric 20 so as to correspond to the through hole 303, and the land portions 402 and 404 are electrically connected to each other via the first and second conductor portions 411 and 431. Connected. The wiring part 406 has a planar coil shape with the center closed, and includes a land part 405 provided outside the wiring part 406 and a land part 402 provided inside the wiring part 406. Electrically connected. The land portion 405 is provided on the upper surface 301 of the support insulating layer 30C.
 なお、導電体40Cの形状は、上記に特に限定されない。例えば、第2の導電路42Cで形成された配線部406に加えて、高い精度が要求されない部分については、第1又は第3の導電路41,43によって他の配線部を形成してもよい。 Note that the shape of the conductor 40C is not particularly limited to the above. For example, in addition to the wiring portion 406 formed by the second conductive path 42C, other wiring portions may be formed by the first or third conductive paths 41 and 43 for portions where high accuracy is not required. .
 本実施形態では、上述の第2実施形態と同様に、図11及び図12に示すように、支持絶縁層30C及び第2の導電路42Cを有する子基板70Cを予め準備しておき、粘着層(又は接着層)60を介してこの子基板70Cを織布20に貼り付けた後に、第1及び第3の導電路41,43を形成することで、支持体10Cと導電体40Cが形成されている。このため、子基板70Cは、FPC等の公知のプリント配線板から構成されている。すなわち、一例を挙げれば、支持絶縁層30Cは、ポリイミド等からなるフィルムから構成されており、第2の導電路42Cは、当該フィルム上に設けられた銅箔等の金属箔をパターニングすることで形成されている。 In the present embodiment, as in the second embodiment described above, as shown in FIGS. 11 and 12, a child substrate 70C having a support insulating layer 30C and a second conductive path 42C is prepared in advance, and an adhesive layer is prepared. After the child substrate 70C is affixed to the woven fabric 20 via the (or adhesive layer) 60, the first and third conductive paths 41 and 43 are formed, whereby the support 10C and the conductor 40C are formed. ing. For this reason, the sub board 70 </ b> C is composed of a known printed wiring board such as an FPC. That is, for example, the support insulating layer 30C is made of a film made of polyimide or the like, and the second conductive path 42C is formed by patterning a metal foil such as a copper foil provided on the film. Is formed.
 また、本実施形態では、上述のように子基板70Cを用いて支持体10Cと導電体40Cを形成するため、第2の導電路42Cを構成する材料の組成が、第1及び第3の導電路41,43を構成する材料の組成と異なっている。このため、図12に示すように、第1の導電路41の一部が第2の導電路42Cの一部と重なっており、第1の導電路41と第2の導電路42は電気的に接続されている。 In the present embodiment, since the support 10C and the conductor 40C are formed using the child substrate 70C as described above, the composition of the material constituting the second conductive path 42C is the first and third conductives. The composition of the material constituting the paths 41 and 43 is different. Therefore, as shown in FIG. 12, a part of the first conductive path 41 overlaps a part of the second conductive path 42C, and the first conductive path 41 and the second conductive path 42 are electrically connected. It is connected to the.
 本実施形態では、第1及び第2実施形態と同様に、支持体10Cが織布20を含んでおり、当該織布20の上面201上に設けられた第1の導電路41が、バスケットホール23に存在する第1の導体部分411を有している。このため、この第1の導体部分411によって支持体10Cと導電体40Cの密着性を維持しつつ、支持体10Cにおいて第1の導電路41や支持絶縁層30Cが存在していない部分では、織布20の柔軟性によって優れた三次元変形への追従性を確保することができる。 In the present embodiment, as in the first and second embodiments, the support 10C includes the woven fabric 20, and the first conductive path 41 provided on the upper surface 201 of the woven fabric 20 includes the basket hole. 23 has a first conductor portion 411. For this reason, while maintaining the adhesion between the support 10C and the conductor 40C by the first conductor portion 411, the portion of the support 10C where the first conductive path 41 and the support insulating layer 30C are not present is woven. The followability to the three-dimensional deformation excellent by the flexibility of the cloth 20 can be ensured.
 また、本実施形態では、第2実施形態と同様に、予め準備しておいた子基板70Cを織布20に貼り付けた後に第1及び第3の導電路41,43を形成することで、支持体10Cと導電体40Cを形成する。このため、金属箔をパターニングすることで第2の導電路42Cを形成することが可能となるので、印刷法では実現の困難な精密且つ精細な配線を形成することができる。 In the present embodiment, similarly to the second embodiment, the first and third conductive paths 41 and 43 are formed after the previously prepared child substrate 70C is attached to the woven fabric 20, A support 10C and a conductor 40C are formed. For this reason, it is possible to form the second conductive path 42C by patterning the metal foil, so that it is possible to form a precise and fine wiring that is difficult to realize by the printing method.
 さらに、本実施形態では、第2実施形態と同様に、印刷法で形成された導電路はバインダ成分を含有しているため、半田付けにより電子部品を接続することができない。これに対し、本実施形態では、上述のように、金属箔をパターニングすることで第2の導電路42Cを形成することができるので、電子部品を半田付けにより接続することも可能となる。 Furthermore, in the present embodiment, as in the second embodiment, since the conductive path formed by the printing method contains a binder component, it is not possible to connect electronic components by soldering. On the other hand, in the present embodiment, as described above, the second conductive path 42C can be formed by patterning the metal foil, so that the electronic components can be connected by soldering.
 なお、以上に説明した実施形態は、本発明の理解を容易にするために記載されたものであって、本発明を限定するために記載されたものではない。したがって、上記の実施形態に開示された各要素は、本発明の技術的範囲に属する全ての設計変更や均等物をも含む趣旨である。 The embodiment described above is described for easy understanding of the present invention, and is not described for limiting the present invention. Therefore, each element disclosed in the above embodiment is intended to include all design changes and equivalents belonging to the technical scope of the present invention.
 例えば、上述の実施形態では、支持絶縁層30及び第2の導電路42が織布20の上面201にしか設けられていないが、特にこれに限定されない。具体的には、織布20の下面202に支持絶縁層30及び第2の導電路42を設けてもよい。或いは、織布20の両面201,202に支持絶縁層30及び第2の導電路42を設けてもよい。 For example, in the above-described embodiment, the support insulating layer 30 and the second conductive path 42 are provided only on the upper surface 201 of the woven fabric 20, but the present invention is not particularly limited thereto. Specifically, the support insulating layer 30 and the second conductive path 42 may be provided on the lower surface 202 of the woven fabric 20. Alternatively, the support insulating layer 30 and the second conductive path 42 may be provided on both surfaces 201 and 202 of the woven fabric 20.
1,1B,1C…配線基板
 10,10B,10C…支持体
  20…織布
   201…上面
   202…下面
   21…経糸
    211…絶縁性繊維
   22…緯糸
    221…絶縁性繊維
   23…バスケットホール
  30,30B,30C…支持絶縁層
   301…上面
   302,303…貫通孔
 40,40B,40C…導電体
   401~405…ランド部
   406,407…配線部
  41,41b…第1の導電路
   411…第1の導体部分
   412…第1の介在部分
   413,414…導電層
  42,42B,42C…第2の導電路
  43,43B…第3の導電路
   431…第2の導体部分
   432…第2の介在部分
   433,434…導電層
 50…被覆絶縁層
  51~54…窓部
 60…粘着層
 70,70C…子基板
DESCRIPTION OF SYMBOLS 1,1B, 1C ... Wiring board 10, 10B, 10C ... Support body 20 ... Woven cloth 201 ... Upper surface 202 ... Lower surface 21 ... Warp 211 ... Insulating fiber 22 ... Weft 221 ... Insulating fiber 23 ... Basket hole 30, 30B, 30C: Support insulating layer 301 ... Upper surface 302, 303 ... Through hole 40, 40B, 40C ... Conductor 401 to 405 ... Land part 406, 407 ... Wiring part 41, 41b ... First conductive path 411 ... First conductor part 412 ... 1st interposed part 413, 414 ... Conductive layer 42, 42B, 42C ... 2nd conductive path 43, 43B ... 3rd conductive path 431 ... 2nd conductor part 432 ... 2nd interposed part 433,434 ... Conductive layer 50 ... Coating insulating layers 51 to 54 ... Window part 60 ... Adhesive layer 70, 70C ... Sub-board

Claims (10)

  1.  支持体と、
     前記支持体に支持された導電体と、を備え、
     前記支持体は、
     絶縁性繊維を束ねてそれぞれ構成された織糸を用いて製織された少なくとも一つの織布と、
     前記織布の第1の主面の一部の領域上に設けられた第1の絶縁層と、を含み、
     前記導電体は、
     前記織布の第1の主面上に設けられた第1の導電路と、
     前記第1の絶縁層上に設けられていると共に、前記第1の導電路と接続された第2の導電路と、を含み、
     前記第1の導電路は、前記織布のバスケットホールに存在する第1の導体部分を有する配線基板。
    A support;
    A conductor supported by the support, and
    The support is
    At least one woven fabric woven using woven yarns each formed by bundling insulating fibers;
    A first insulating layer provided on a partial region of the first main surface of the woven fabric,
    The conductor is
    A first conductive path provided on the first main surface of the woven fabric;
    A second conductive path provided on the first insulating layer and connected to the first conductive path;
    The first conductive path is a wiring board having a first conductor portion existing in a basket hole of the woven fabric.
  2.  請求項1に記載の配線基板であって、
     前記導電体は、前記織布の第2の主面上に設けられた第3の導電路を含み、
     前記第3の導電路は、前記織布のバスケットホールに存在する第2の導体部分を有しており、
     少なくとも一部の前記第1の導体部分と、少なくとも一部の前記第2の導体部分とは相互に接合されており、
     前記第1の導電路と前記第3の導電路は、前記第1の導体部分及び前記第2の導体部分を介して電気的に接続されている配線基板。
    The wiring board according to claim 1,
    The conductor includes a third conductive path provided on the second main surface of the woven fabric,
    The third conductive path has a second conductor portion present in the basket hole of the woven fabric,
    At least a portion of the first conductor portion and at least a portion of the second conductor portion are joined together;
    The wiring board in which the first conductive path and the third conductive path are electrically connected via the first conductor portion and the second conductor portion.
  3.  請求項1又は2のいずれか一項に記載の配線基板であって、
     前記織糸は、
     第1の方向に延在する経糸と、
     前記経糸と同一種又は異種の織糸から構成され、前記第1の方向に交差する第2の方向に延在する緯糸と、を含む配線基板。
    The wiring board according to claim 1, wherein:
    The woven yarn is
    A warp extending in a first direction;
    A wiring board comprising weft yarns made of the same kind or different types of warp yarns and extending in a second direction intersecting the first direction.
  4.  請求項1~3のいずれか一項に記載の配線基板であって、
     前記第1の導電路を構成する材料の組成と、前記第2の導電路を構成する材料の組成とが同一であり、
     前記第1の導電路と前記第2の導電路とは一体的に形成されている配線基板。
    A wiring board according to any one of claims 1 to 3,
    The composition of the material constituting the first conductive path and the composition of the material constituting the second conductive path are the same,
    The wiring board in which the first conductive path and the second conductive path are integrally formed.
  5.  請求項1~3のいずれか一項に記載の配線基板であって、
     前記第1の導電路を構成する材料の組成と、前記第2の導電路を構成する材料の組成とが異なっており、
     前記第1の導電路の一部は、前記第2の導電路の一部と重なっている配線基板。
    A wiring board according to any one of claims 1 to 3,
    The composition of the material constituting the first conductive path is different from the composition of the material constituting the second conductive path;
    A wiring board in which a part of the first conductive path overlaps a part of the second conductive path.
  6.  請求項1~5のいずれか一項に記載の配線基板であって、
     前記配線基板は、前記第1の絶縁層を前記織布の前記第1の主面に粘着又は接着させる粘着層又は接着層を備えた配線基板。
    A wiring board according to any one of claims 1 to 5,
    The wiring board is provided with an adhesive layer or an adhesive layer that adheres or adheres the first insulating layer to the first main surface of the woven fabric.
  7.  請求項1~6のいずれか一項に記載された配線基板であって、
     前記配線基板は、前記導電体及び前記支持体を被覆していると共に前記織布内にも存在している第2の絶縁層をさらに備えた配線基板。
    A wiring board according to any one of claims 1 to 6,
    The wiring board further includes a second insulating layer that covers the conductor and the support and is also present in the woven fabric.
  8.  請求項7に記載の配線基板であって、
     前記第2の絶縁層は、前記導電体の一部を外部に露出させる窓部を有する配線基板。
    The wiring board according to claim 7,
    The second insulating layer is a wiring board having a window portion exposing a part of the conductor to the outside.
  9.  請求項1~8のいずれか一項に記載の配線基板であって、
     前記第1の絶縁層は、少なくとも一つの貫通孔を有しており、
     前記第1の導電路は、前記貫通孔に対応するように、前記織布の前記第1の主面上に設けられた部分を含む配線基板。
    A wiring board according to any one of claims 1 to 8,
    The first insulating layer has at least one through hole;
    The first conductive path includes a portion provided on the first main surface of the woven fabric so as to correspond to the through hole.
  10.  請求項2に記載の配線基板であって、
     前記第1の導電路は、前記織布の前記絶縁性繊維同士の間の間隙に存在する第1の介在部分を含み、
     前記第3の導電路は、前記織布の前記絶縁性繊維同士の間の間隙に存在する第2の介在部分を含む配線基板。
    The wiring board according to claim 2,
    The first conductive path includes a first intervening portion existing in a gap between the insulating fibers of the woven fabric,
    The third conductive path is a wiring board including a second intervening portion existing in a gap between the insulating fibers of the woven fabric.
PCT/JP2018/047875 2018-02-02 2018-12-26 Wiring substrate WO2019150863A1 (en)

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JP2013214578A (en) * 2012-03-30 2013-10-17 Ibiden Co Ltd Wiring board and method for manufacturing the same

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JPS60200590A (en) * 1984-03-24 1985-10-11 ダイソー株式会社 Printed circuit board and method of producing same
JPS6151893A (en) * 1984-08-21 1986-03-14 ソニー株式会社 Flexible printed circuit board
JP2001024081A (en) * 1999-07-08 2001-01-26 Toshiba Corp Conductive base and its manufacture
JP2013214578A (en) * 2012-03-30 2013-10-17 Ibiden Co Ltd Wiring board and method for manufacturing the same

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