WO2019142423A1 - Mounting body - Google Patents
Mounting body Download PDFInfo
- Publication number
- WO2019142423A1 WO2019142423A1 PCT/JP2018/039273 JP2018039273W WO2019142423A1 WO 2019142423 A1 WO2019142423 A1 WO 2019142423A1 JP 2018039273 W JP2018039273 W JP 2018039273W WO 2019142423 A1 WO2019142423 A1 WO 2019142423A1
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- WIPO (PCT)
- Prior art keywords
- mounting body
- conductive
- conductive member
- curable composition
- powder
- Prior art date
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Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/18—Printed circuits structurally associated with non-printed electric components
- H05K1/189—Printed circuits structurally associated with non-printed electric components characterised by the use of a flexible or folded printed circuit
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0393—Flexible materials
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/284—Applying non-metallic protective coatings for encapsulating mounted components
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/3457—Solder materials or compositions; Methods of application thereof
Definitions
- the present invention relates to an implementation.
- the present invention relates to a mounting body provided with a covering portion that relieves an external force.
- a semiconductor device having an electrode pad, a substrate having a terminal electrode, a bump electrode provided on the electrode pad of the semiconductor device, and a conductive adhesive having flexibility are provided on the bump electrode and the substrate
- a sealing layer for mechanically bonding the semiconductor device wherein the sealing material mainly comprises a resin binder and a filler, and the resin binder comprises polyepoxide, an acid anhydride and a rheology modifier
- a mounting body which is an essential component see, for example, Patent Document 1). According to the mounting body which concerns on patent document 1, the fluidity
- a sealing material is formed using a resin binder and a filler, and polyepoxide, an acid anhydride and a rheology modifier as essential components are used as a resin binder. Because the sealing material is hard. As a result, when an external force is applied to the mounting body described in Patent Document 1, for example, when an external force that bends the substrate is applied, damage to the sealing material or electrical connection between the semiconductor device and the conductive adhesive Problems such as disconnection may occur.
- an object of the present invention is to provide a mounting body capable of ensuring the reliability of the electrical connection between the element and the conductive member electrically connected to the element even when an external force is applied to bend the substrate.
- the purpose is to
- the present invention provides an insulating substrate, an element mounted on the insulating substrate through the conductive member, at least a part of the side surface of the conductive member and the side surface of the element, There is provided a mounting body including at least a part of the boundary with the element and provided in contact with the surface of the insulating substrate and having a modulus of elasticity of 0.1 MPa or more and 500 MPa or less.
- the insulating base material has flexibility, and the covering portion is deformed in response to an external force.
- the insulating base is a flexible substrate and the conductive member is a low temperature curing conductive paste.
- the covering portion be configured using a curable composition, and the curable composition has a viscosity of 10 Pa ⁇ s or more and 100 Pa ⁇ s or less before curing.
- the present invention provides an electronic device including the mounting body according to any one of the above.
- the present invention provides an insulating base, an element mounted on the insulating base via a conductive member, at least a part of a side surface of the conductive member and a side surface of the element
- a curable composition for a covering portion of a mounting body comprising: a covering portion covering at least a part of a region including a boundary between a member and an element and being provided in contact with a surface of an insulating substrate, the curable composition
- coated part of the mounting body whose elastic modulus after hardening of a thing is 0.1 Mpa or more and 500 Mpa or less is provided.
- the mounting body can ensure the reliability of the electrical connection between the element and the conductive member electrically connected to the element even when an external force that bends the substrate is applied.
- a low temperature curing conductive paste is used as the conductive member.
- electrically-conductive members such as a low-temperature-hardening-type electrically conductive paste
- a fillet is not formed. Therefore, only the portion where the element and the solder are in contact adheres, and the side surface of the element does not substantially adhere to the low temperature curing conductive paste.
- low temperature refers to a temperature of about 100 ° C. or less.
- the element is a device that uses a base material made of a material that is easily stretched or bent, that is, when using a base material having flexibility or using a low temperature curing type conductive adhesive. From the viewpoint of maintaining the reliability of the electrical connection between the conductive member and the conductive member, at least a portion of the side surface of the conductive member and the side surface of the element, and at least a portion of the boundary between the conductive member and the element Even if the base material is stretched and / or bent by covering it with a curable composition (adhesive resin) having an elastic modulus of, and bringing the adhesive resin into contact also with the surface of the insulating base material It has been found that the electrical connectivity between the element and the conductive member can be kept good.
- a curable composition adheresive resin
- the mounting body according to the embodiment of the present invention is at least a part of the insulating base, the element mounted on the insulating base via the conductive member, the side surface of the conductive member, and the side of the element At least a part of the boundary between the member and the element (that is, the "region including the boundary” or “the boundary end") is covered, provided in contact with the surface of the insulating substrate, and the expansion and / or contraction of the insulating substrate And a covering portion having an elastic modulus that can deform its shape in response to bending.
- the covering portion is formed using an adhesive resin.
- the elastic modulus is, for example, a storage elastic modulus in dynamic viscoelasticity measurement at a frequency of 1 Hz.
- FIG. 1 shows an outline of a cross section of a mounting body according to an embodiment of the present invention.
- FIG. 1A shows an outline of a cross section of the mounting body 1 according to the present embodiment
- FIGS. 1B and 1C show an outline of a cross section of a modified example of the mounting body, respectively.
- FIG. 1 is a schematic view, and the dimensions of the components and the ratio of the dimensions are not necessarily as illustrated.
- the mounting body 1 includes an insulating base 10, an element 20 mounted on the surface 10 a of the insulating base 10 via a conductive member 30, an element 20 and a conductive member 30. Covering at least a part of the end of the boundary 50 generated in the contact part, at least a part of the side 22a of the element 20 (and / or the side of the electrode 22 described later) and at least a part of the side 30a of the conductive member 30 And a covering portion 40 for covering the area including the portion and adhering to a portion of the surface 10 a of the insulating substrate 10.
- the mounting body 1a substantially the same configuration as the mounting body 1 except that the covering portion 42 covers substantially the entire side surface of the element 20 and the side surface of the conductive member 30. And features. Further, in a mounting body 1b according to another modification of FIG. 1 (c), the mounting body 1 except that the covering portion 44 covers substantially the entire side surface and upper surface of the element 20 and the side surface of the conductive member 30. Substantially the same configuration and function as Therefore, about the mounting body 1a and the mounting body 1b, detailed description is abbreviate
- the insulating substrate 10 is a substrate (insulating substrate) having an insulating property.
- insulating substrate a substrate having an insulating property.
- various materials such as polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polymethyl methacrylate (PMMA), polyimide, polypropylene (PP), polyurethane, various rubbers, etc., as the material constituting the insulating substrate 10 Can.
- the insulating base 10 may have flexibility or may be a flexible substrate. From the viewpoint of expansion and contraction, bending, and the like, the insulating base 10 is preferably formed of a flexible material, and is preferably a flexible substrate.
- the insulation base material 10 formed using polyimide has heat resistance, solder can be used as the conductive member 30.
- solder can be used as the conductive member 30.
- the insulating base material 10 formed using PET etc. if the solder is used as the conductive member 30, the insulating base material 10 is damaged in the mounting step (reflow process etc.). It is not possible to use a low temperature curing type conductive paste.
- the element 20 examples include electronic elements such as semiconductor elements (including light emitting elements such as light emitting diodes and laser diodes, light receiving elements, solar cells, other sensors, and the like), chip parts, discrete parts and the like. Also, one or more elements 20 can be mounted on the insulating base 10.
- the element 20 has, for example, an electrode 22 at its end (for example, one electrode 22 is an electrode for the positive electrode, and the other electrode 22 is an electrode for the negative electrode).
- the electrode 22 and the conductive member 30 both are electrically connected, and the element 20 is bonded and fixed to the insulating base 10.
- the boundary 50 is also generated at the contact portion between the electrode 22 of the element 20 and the conductive member 30.
- prescribed electroconductive pattern is previously provided in the surface 10a of the insulation base material 10 (illustration is abbreviate
- the conductive member 30 is electrically connected to a part of the conductive pattern.
- the conductive member 30 is a curable composition having conductivity, and is preferably a low temperature curable conductive paste.
- the material of the low temperature curing type conductive paste is preferably a compound which cures at a low temperature (about 100 ° C. or less), various compounds can be used, and a compound having flexibility is more preferable.
- the conductive member 30 has a dynamic viscoelasticity at 1 Hz from the viewpoint of maintaining the reliability of the electrical connectivity with the element 20 even when deformation such as expansion or contraction or bending is applied to the mounting body 1.
- the storage elastic modulus at 23 ° C. in measurement preferably has an elastic modulus of 0.1 MPa to 100 MPa.
- conductive member 30 epoxy compounds, rubber compounds such as SBR, NBR, IR, BR, CR, etc., acrylic compounds, polyester compounds, polyamide compounds, polyether compounds, polyurethane compounds Polyimide compounds, silicone compounds and the like can be used.
- conductive material contained in the conductive member 30 various conductive materials can be used. Examples of conductive materials include noble metal powders such as silver, gold and palladium, base metal powders such as nickel and copper, alloy powders such as silver palladium, composite powders such as silver-plated copper powder, and carbon, etc. Non-metal powder etc. which it has can be used. These conductive materials may be used alone or in combination of two or more. In addition, the particle size and shape of these conductive materials are not particularly limited.
- the curable composition having conductivity has (A) an elastomer component having a storage elastic modulus at 23 ° C. in the range of 0.1 MPa to 100 MPa in dynamic viscoelasticity measurement at 1 Hz, and (B) a conductive filler.
- the (B) conductive filler may be 50% by mass or more and 85% by mass or less of the total content. Further, from the viewpoint of securing the flexibility of the cured product, (B) the conductive filler is 50% by mass or more and 85% by mass or less of the total content, and (B) the conductive filler is (b1) first And silver-plated powder, and (b2) a second silver powder and silver-plated powder.
- the tap density of (b1) the first silver powder and the silver-plated powder is 2.5 g / cm 3 or more and 6.0 g / cm 3 or less
- the tap density of the second silver powder and silver-plated powder is 1.0 g / cm 3 or more and 3.0 g / cm 3 or less
- the mixing ratio of (b1) to (b2) [(b1) / (b2)] is It may be 1/10 or more and 10/1 or less in mass ratio.
- the conductive curable composition can also include (C) silica that has been subjected to a hydrophobization treatment with a predetermined surface treatment agent.
- the (A) elastomer component is an elastomer component having a storage elastic modulus at 23 ° C. in the range of 0.1 MPa to 100 MPa in dynamic viscoelasticity measurement at 1 Hz.
- the storage elastic modulus at 23 ° C. is in the range of 0.1 MPa to 100 MPa in the dynamic viscoelasticity measurement at 1 Hz, a cured product which is flexible and excellent in stretchability can be obtained.
- the storage elastic modulus at 23 ° C. in the dynamic viscoelasticity measurement at 1 Hz is in the range of 0.1 MPa to 50 MPa, it is particularly preferable because breakage hardly occurs during expansion and contraction of the cured product.
- the dynamic viscoelasticity measurement of the (A) elastomer component can be measured, for example, by the following means.
- the conductive curable composition When the conductive curable composition is a water dispersion, remove solid components such as (B) conductive filler and (C) silica by filtration, and then evaporate the dispersion medium by heating at 100 ° C. or less. Dynamic viscoelasticity can be measured for the cured product obtained in When the conductive curable composition is dispersed in an organic solvent (diluent), the solid component such as (B) conductive filler or (C) silica is removed by filtration, and then 150 ° C. Dynamic viscoelasticity can be measured for the cured product obtained by evaporating the dispersion medium by the following heating.
- a resin that is liquid at normal temperature such as a modified silicone resin or urethane resin
- solid components such as (B) conductive filler and (C) silica are removed by filtration. It is also possible to extract the elastomer component (A), add a curing catalyst as needed, and cure it, and measure the dynamic viscoelasticity of the resulting cured product.
- the cured product of the conductive curable composition With respect to the cured product of the conductive curable composition, the cured product is immersed in a solvent in which the cured product dissolves and shaken to remove solid components such as (B) conductive filler and (C) silica, and (A) Dynamic viscoelasticity can be measured on a cured product obtained by extracting the elastomer component and then removing the solvent by heating at 150 ° C. or less.
- thermoplastic resins and thermosetting resins Materials formed from water soluble resins, crosslinked rubbers, and vulcanized rubbers. Examples of such resin include vinyl resin, acrylic resin, butadiene resin, silicone resin, polyurethane resin, modified silicone resin, and the like. Further, the above resin may be used as a water dispersion.
- vinyl resins include vinyl acetate polymer resins, vinyl chloride / vinyl acetate copolymer resins, vinyl chloride / vinyl acetate / maleic acid terpolymer resins, or combinations thereof.
- acrylic elastomer as an acrylic resin, for example, glass transition temperatures (T g ) of polybutyl (meth) acrylate, poly 2-ethylhexylethyl (meth) acrylate, poly 2-hydroxyethyl (meth) acrylate, etc. are compared. Resins, or combinations thereof. In addition to these skeletons, block copolymers containing polymethyl (meth) acrylate are preferable from the viewpoint of securing elongation physical properties and adhesiveness while maintaining flexibility.
- T g glass transition temperatures
- block copolymers containing polymethyl (meth) acrylate are preferable from the viewpoint of securing elongation physical properties and adhesiveness while maintaining flexibility.
- block copolymer various block copolymers can be used.
- an acrylic triblock copolymer produced by a living polymerization method can be used.
- polymethyl methacrylate-polybutadiene-polystyrene copolymer, polymethyl methacrylate-polybutyl acrylate-polymethyl methacrylate copolymer, these copolymers were subjected to carboxylic acid modification treatment or hydrophilic group modification treatment
- Block copolymers such as copolymers, polymethyl methacrylate-polybutyl acrylate copolymers, and polymethyl methacrylate-polybutyl acrylate-polymethyl methacrylate copolymers can be used.
- butadiene-based resin examples include SB (styrene-butadiene) resin, SBS (styrene-butadiene-styrene) resin, SEBS resin (styrene-ethylene / butylene-styrene), SIS (styrene-isoprene-styrene) resin, SIBS (SIBS) Styrene-isoprene / butadiene-styrene) resins, SEPS (styrene-ethylene / propylene-styrene) resins, etc., or combinations thereof.
- SB styrene-butadiene
- SBS styrene-butadiene-styrene
- SEBS resin styrene-ethylene / butylene-styrene
- SIBS SIBS
- SEPS styrene-ethylene / propylene-styrene
- the modified silicone resin conventionally known crosslinkable silicon group-containing organic polymers can be used.
- the crosslinkable silicon group of the crosslinkable silicon group-containing organic polymer is a group which has a hydroxyl group or a hydrolyzable group bonded to a silicon atom and can be crosslinked by forming a siloxane bond.
- the conductive filler is formed using a material having electrical conductivity.
- the conductive filler for example, silver powder, copper powder, nickel powder, aluminum powder, and silver plated powder thereof, metal powder such as silver coated glass, silver coated silica, silver coated plastic, etc .; zinc oxide, titanium oxide, ITO , ATO, carbon black and the like.
- the conductive filler is preferably silver powder or silver plating powder, and it is more preferable to use silver powder and silver plating powder in combination from the viewpoint of conductivity reliability and cost.
- the shape of the conductive filler various shapes (for example, granular, spherical, elliptical, cylindrical, flake, flat, or agglomerates) can be adopted.
- the conductive filler can also have a somewhat rough or jagged surface.
- the particle shape, size, and / or hardness of the conductive filler can be used in combination in the curable composition having conductivity.
- a plurality of conductive fillers having different particle shapes, sizes, and / or hardness of (B) conductive filler are combined. It can also be done.
- the conductive filler to be combined is not limited to two types, and may be three or more types. Among them, it is preferable to use a flaky conductive filler and a particulate conductive filler in combination.
- the flake shape includes a flat shape, a flaky shape, or a scaly shape, and includes a shape obtained by crushing silver powder having a three-dimensional shape such as a spherical shape or a massive shape in one direction.
- a granular form means the shape of all the electroconductive fillers which do not have flake shape.
- the granular form there may be mentioned a shape in which powder is aggregated into a bunch of grapes, a spherical shape, a substantially spherical shape, a massive shape, a dendritic shape, or a mixture of silver powder having these shapes.
- this electroconductive filler can be manufactured by various methods.
- flake-like silver powder is used as a conductive filler, it is manufactured by mechanically pulverizing silver powder such as spherical silver powder, massive silver powder, and / or granular silver powder using an apparatus such as a jet mill, roll mill or ball mill. it can.
- granular silver powder is used as a conductive filler, it can be produced by an electrolytic method, a pulverizing method, a heat treatment method, an atomizing method, a reduction method or the like.
- the reduction method is preferable because a powder with a low tap density can be easily obtained by controlling the reduction method.
- the silver powder and the silver-plated powder preferably include (b1) the first silver powder and the silver-plated powder and (b2) the second silver powder and the silver-plated powder each having a predetermined tap density.
- the mixing ratio [(b1) / (b2)] of (b1) and (b2) is 1/10 or more and 10/1 or less in mass ratio, preferably 1/4 or more and 4/1 or less, and 3/2 or more 4/1 or less is more preferable.
- the mixing ratio of the first silver powder and the silver plating powder is 1/10 or more and 10/1 or less
- the mixing ratio of the second silver powder and the silver plating powder Is 1/10 or more and 10/1 or less.
- the tap density of the first silver powder and silver-plated powder is less than 2.5 g / cm 3 or more 6.0g / cm 3, 3.0g / cm 3 or more 5.0 g / cm 3 or less.
- the 50-% average particle diameter of (b1) 1st silver powder 0.5 micrometer or more and 15 micrometers or less are preferable.
- the shape of the (b1) first silver powder and the silver-plated powder may be various shapes, and various shapes such as flakes and particles can be used. Among them, flake-like silver powder and silver-plated powder are preferable.
- the tap density of silver powder and silver-plated powder can be measured by the method according to the 20.2 tap method of JIS K 5101-1991.
- 50% average particle diameter is a particle diameter in 50% of the volume accumulation measured by laser diffraction scattering type particle size distribution measuring method.
- the tap density of the second silver powder and the silver-plated powder is 1.0 g / cm 3 or more and 3.0 g / cm 3 or less.
- the 50% average particle diameter of (b2) 2nd silver powder and silver plating powder 0.5 micrometer or more and 20 micrometers or less are preferable.
- the shapes of (b2) 2nd silver powder and silver plating powder may be various shapes, and various shapes, such as flake shape and a granular form, can be used. Among them, granular silver powder and silver plated powder are preferable.
- the content of the conductive filler (B) is 50% by mass to 85% by mass, preferably 65% by mass to 85% by mass, and preferably 70% by mass to 80% by mass of the total content of the conductive curable composition. % Or less is more preferable. From the viewpoint of obtaining sufficient conductivity, the content is preferably 50% by mass or more, and from the viewpoint of securing adhesiveness and workability together with excellent conductivity, it is preferably 85% by mass or less. In particular, from the viewpoint of securing adhesiveness and workability, it is preferable that the content of the (b2) second silver powder and the silver-plated powder is not excessively increased.
- one of the components (b1) and (b2) is a flake-like silver powder and / or a silver-plated powder, and the other is a combination of granular silver powder and / or a silver-plated powder. It is preferable to use it.
- ((C) silica) By using one or more types of silica selected from the group consisting of hydrophobic silica hydrophilized with a specific surface treatment agent (C) and hydrophilic silica together with component (A) and component (B), it becomes possible to conduct electricity in particular It is possible to obtain a conductive curable composition excellent in the stability of the properties.
- the particle size of (C) silica is not particularly limited, but fine silica powder is preferable, fine silica powder having an average particle size of 7 nm to 16 nm is more preferable, and fine silica powder having an average particle size of 7 nm to 14 nm is most preferable.
- hydrophilic silica can be widely used as hydrophilic silica, and fumed silica having a silanol group (Si-OH group) on the surface is preferable among them.
- hydrophilic silica it is possible to prevent bleeding while securing flowability without increasing viscosity.
- the conductive curable composition having flowability is suitable for applications requiring flowability, for example, application to a substrate by screen printing and formation of a pattern with a thin film of about 50 ⁇ m.
- hydrophobic silica one or more surface treatment agents selected from the group consisting of dimethyldichlorosilane, hexamethyldisilazane, (meth) acrylsilane, octylsilane (eg, trimethoxyoctylsilane etc.), and aminosilane Hydrophobicized hydrophobic silica is used.
- hydrophobic silica hydrophobized with such a specific surface treatment agent it is possible to prevent bleeding while ensuring dischargeability and shape retention.
- the conductive curable composition having a shape retention property is required to have a film thickness of 100 ⁇ m or more when the shape retention property is required, for example, in the case of forming a pattern by applying to a substrate by a screen printing method,
- the present invention is suitable for applications such as replacing the solder connection portion with a conductive curable composition.
- the hydrophobization treatment method of the silica using a surface treatment agent can select a well-known method, for example, the surface treatment agent mentioned above is sprayed on untreated silica, or the surface treatment agent which vaporized is mixed, and heat treatment is carried out. Methods are included. In addition, it is preferable to process this hydrophobization by the dry condition under nitrogen atmosphere.
- (C) Silica can be used alone or in combination of two or more.
- conductive curable composition from the viewpoint of adjusting the viscosity, physical properties, and the like within the range that does not impair the functions such as the conductivity and the curing property of the conductive curable composition, a curing catalyst, a filler, and a plastic as needed.
- a substance such as a polymerization initiator or various solvents such as toluene and alcohol may be blended. Also, other polymers compatible may be blended.
- the curable composition having conductivity can be made into a one-component type as needed, and can also be made a two-component type.
- the curable composition having conductivity is particularly suitable for use as a one-component type.
- the curable composition which has electroconductivity is hardened
- curing may be promoted by heating (for example, heating at about 80 ° C. to 100 ° C.) as appropriate.
- a conductive curable composition has high conductivity by being applied or printed on a substrate and cured, and can be used instead of solder.
- the curable composition having conductivity is used for bonding and mounting of electronic parts such as semiconductor element chip parts and discrete parts, circuit connection, bonding / fixing of crystal oscillators and piezoelectric elements, sealing of packages, etc. It is suitable for. It is also possible to form on the surface of the substrate a circuit in which one or more kinds of electronic components such as semiconductor elements, chip parts, discrete parts and the like are joined using a curable composition having conductivity.
- the cured product of the conductive curable composition that constitutes the conductive member 30 according to the present embodiment has flexibility, it is provided on the surface of the insulating base 10 with a predetermined pattern. In this case, even if deformation such as expansion and contraction or bending is applied to the insulating base material 10, the insulating base material 10 is freely deformed according to the deformation.
- the covering portion 40 adheres to at least a part of the side surface of the element 20 and to at least a part of the side surface of the conductive member 30 and is adhered to the surface 10 a of the insulating substrate 10.
- the covering portion 40 functions as a pseudo fillet, but has no conductivity. Accordingly, a) the adhesion to the conductive member 30 is good, and b) the material constituting the cover 40 does not penetrate into the conductive member 30 (if it penetrates, the conductive member 30 The resistance value may increase) c) Characteristics such as being able to reduce distortion between the element 20 and the conductive member 30 even when an external force such as expansion or contraction or bending is applied to the mounting body 1 are required. Be done.
- the covering portion 40 has an elastic modulus of 0.1 MPa or more from the viewpoint of securing appropriate flexibility and electric reliability, and the elastic modulus is preferably 1 MPa or more, more preferably 5 MPa or more. In addition, the covering portion 40 has an elasticity of 500 MPa or less from the viewpoint of reducing the strain generated in the mounting body 1 when an external force is applied to the mounting body 1 and maintaining the durability (the conductivity decreases with time).
- the modulus of elasticity is preferably 200 MPa or less, more preferably 100 MPa or less.
- the covering portion 40 has the above elastic modulus and can be deformed in response to an external force.
- the elastic modulus is a storage elastic modulus in dynamic viscoelasticity measurement at a frequency of 1 Hz.
- the covering unit 40 may be a curable adhesive such as various thermosetting adhesives, photocurable adhesives, or two-component mixed curable adhesives. It can be configured using.
- the curable composition From the viewpoint of preventing the curable composition from spreading more than necessary when dropped onto the insulating substrate 10 before forming the covering portion 40 (that is, before curing the curable composition), It is preferable to have a viscosity of 10 Pa ⁇ s or more and 100 Pa ⁇ s or less. Moreover, when forming the coating
- the sheet-like covering portion 40 can be appropriately formed by a known method.
- the mounting body 1 can be manufactured, for example, through the following steps. First, the insulation base material 10 in which the predetermined
- a normal temperature for example, 23 ° C.
- a low temperature for example, a temperature of 100 ° C. or less
- coated part 40 is apply
- the application amount of the curable composition is adjusted to an amount in which the boundary 50 between the element 20 and the conductive member 30 is covered and the side surface of the conductive member 30 is covered.
- the covering part 40 is formed (covering part formation process).
- the coating amount of the curable composition is adjusted to an amount such that substantially all of the side surface of the element 20 and the side surface of the conductive member 30 are covered in the covering portion forming step.
- the amount of the curable composition applied is adjusted to an amount such that the entire element 20 is covered in the covering portion forming step.
- the mounting body 1 can be applied to various electronic devices such as, for example, printed electronics, wearable devices, robots, electronic devices including machines having a movable range, and the like.
- a region including the boundary 50 between the element 20 and the conductive member 30 is covered by the covering portion 40 having a predetermined elastic modulus, and the covering portion 40 is formed of the insulating substrate 10. It also adheres to the surface 10a. Therefore, not only when the insulating base material 10 is bent but also when it is expanded and contracted, since the covering portion 40 relieves the stress generated by the bending and expansion and contraction, the electrical connectivity between the element 20 and the conductive member 30 can be improved. Can be maintained. As a result, according to the mounting body 1, the reliability of the electrical connectivity between the element 20 and the conductive member 30 can be maintained.
- the reliability of the electrical connectivity is equal between the case where solder is used as the conductive member 30 and the case where a low temperature curing type conductive paste is used when the mounting body 1 is bent.
- the reliability in the case of using the low temperature curing type conductive paste is superior to the case of using the solder. This is because although the low temperature curing type conductive paste expands and contracts according to the expansion and contraction force, the solder does not expand and contract.
- a circuit can be formed on the flexible substrate by printing, so adjustment of the resistance value in the circuit is easy, and the number of components can be reduced.
- important parts such as IC are "hard”
- the covering portion 40 is provided on the part where such "hard” electronic parts are to be provided, so that the reliability as a whole of the mounting body 1 (reliability of electrical connectivity, operation Reliability etc. can be improved.
- FIG. 2 shows an outline of a test piece according to an example. Specifically, FIG. 2 (a) shows a top view of the flexible substrate 11 constituting the test piece, and FIG. 2 (b) shows a state in which the conductive adhesive 32 is printed on the flexible substrate 11, FIG. (C) shows an outline of a cross section of a test piece according to Example 1.
- Example 1 As shown to Fig.2 (a), the flexible substrate 11 in which the copper wiring 14 (5 mm) was formed on the polyimide film 12 (thickness 12.5 micrometers) was prepared. In addition, two copper wirings 14 are provided on the polyimide film 12, and a 0.6 mm gap is provided between one copper wiring 14 (length: 45 mm) and the other copper wiring 14 (length: 127 mm). Provided.
- the conductive adhesive is attached to the chip mounting portion (the end on the gap side of each copper wiring 14).
- the agent 32 was printed, and a resistive chip 24 (0 ⁇ ) equipped with a gold-plated electrode of 1608 size was mounted as shown in FIG. 2 (c).
- the conductive adhesive 32 was cured at 80 ° C. for 60 minutes.
- a curable composition (Super X Gold No. 777 clear. Cemedine Co., Ltd.) is provided in the portion connected by the conductive adhesive 32 (including the portion covering the boundary edge between the resistive chip 24 and the conductive adhesive 32). 1 mg) and aged for 24 hours under an environment of 23.degree. C. and 50% RH to form a coated portion 42.
- a test piece according to Example 1 was obtained.
- the conductive adhesive 32 was prepared using the acrylic acid ester-based polymer A1 synthesized in Synthesis Example 1 below, and adding each of the compounding materials at the mixing ratio shown in Table 1. Specifically, each of the component (A), the component (B), and the other additives was weighed and prepared so as to obtain the mixture ratio shown in Table 1. Next, they were mixed and stirred. Thus, a conductive adhesive 32 was obtained.
- Synthesis Example 1 40 parts by mass of ethyl acetate as a solvent, 59 parts by mass of methyl methacrylate, 25 parts by mass of 2-ethylhexyl methacrylate, 22 parts by mass of ⁇ -methacryloxypropyltrimethoxysilane, and 0.1 parts by mass of ruthenocene dichloride as a metal catalyst Charge and heat to 80 ° C. while introducing nitrogen gas. Then, 8 parts by mass of 3-mercaptopropyltrimethoxysilane was added into the flask and reacted at 80 ° C. for 6 hours. After cooling to room temperature, 20 parts by mass of a benzoquinone solution (95% THF solution) was added to terminate the polymerization.
- a benzoquinone solution 95% THF solution
- the unit of the compounding amount of each compounding substance is "mass part”. Moreover, the details of the compounding substance are as follows.
- * 1 Urethane polymer with hydrolyzable silicon group (trade name: "SPUR + 1050MM", manufactured by Momentive) * 2 Flaky silver powder, trade name: Silcoat AgC-B, manufactured by Fukuda Metal Foil & Powder Co., Ltd., specific surface area 1.35 m 2 / g, tap density 4.6 g / cm 3 , 50% average particle diameter 4 ⁇ m.
- Granular silver powder (reduced powder), trade name: Silcoat AgC-G, manufactured by Fukuda Metal Foil & Powder Co., Ltd., specific surface area 2.5 m 2 / g, tap density 1.4 g / cm 3 .
- Phenolic antioxidant trade name Irganox 245, manufactured by BASF.
- Amine based anti-aging agent trade name Tinubin 765, manufactured by BASF.
- Hydrophilic silica trade name: Leorosil QS-20, manufactured by Tokuyama Corporation.
- Paraffin based diluent trade name: Cactus Normal Paraffin N-11, Japan Energy Co., Ltd.
- Comparative Example 1 Reference Example 1
- the conductive adhesive 32 is a solder paste (FLF01-BZ (L), manufactured by Matsuo Solder Co., Ltd.), and the coating 42 is not formed. It produced similarly.
- the solder paste was reflowed by heating at 260 ° C. for 5 minutes.
- Example 2 A test piece according to Example 2 was produced in the same manner as Example 1, except that the polyimide film 12 was changed to a PET film, unlike Example 1. In addition, since the PET film was damaged by heating at 260 ° C. for 5 minutes, a test piece using solder as a conductive member could not be produced.
- FIG. 3 shows an outline of the U-shaped folding test.
Abstract
Description
絶縁基材にハンダを用いて半導体素子等の素子を搭載する場合、絶縁基材の表面にハンダを設け、当該ハンダ上に素子を載置し、加熱硬化(リフロー工程)させる。すると、素子とハンダとの接触部分において溶融したハンダが広がり(フィレットが形成され)、素子とハンダとを接触させた部分が接着するだけでなく、素子の側面の一部がハンダに接着した状態になる。その結果、素子と絶縁基材とは強固に接着される。 <Summary of implementation>
When an element such as a semiconductor element is mounted on the insulating base using solder, the solder is provided on the surface of the insulating base, the element is mounted on the solder, and heat curing (reflow process) is performed. Then, the melted solder spreads (fillet is formed) at the contact portion between the element and the solder, and not only the portion where the element and the solder are in contact adheres, but also a part of the side of the element adheres to the solder become. As a result, the element and the insulating base are firmly bonded.
図1は、本発明の実施の形態に係る実装体の断面の概要を示す。具体的に、図1(a)は、本実施形態に係る実装体1の断面の概要を示し、図1(b)及び(c)はそれぞれ、実装体の変形例の断面の概要を示す。なお、図1は概要図であり、各構成の寸法及び寸法の比率は図示通りであるとは限らない。 <Detail of implementation>
FIG. 1 shows an outline of a cross section of a mounting body according to an embodiment of the present invention. Specifically, FIG. 1A shows an outline of a cross section of the
絶縁基材10は、絶縁性を有する基材(絶縁基材)である。絶縁基材10を構成する材料としてはポリエチレンテレフタレート(PET)、ポチエチレンナフタレート(PEN)、ポリメタクリル酸メチル(PMMA)、ポリイミド、ポリプロピレン(PP)、ポリウレタン、各種ゴム等様々な材料を用いることができる。また、絶縁基材10は、可撓性を有することもでき、フレキシブル基板であってもよい。伸縮や屈曲等させることができる観点からは、絶縁基材10は、可撓性を有する材料から形成されることが好ましく、フレキシブル基板であることも好ましい。なお、ポリイミドを用いて形成される絶縁基材10は耐熱性があるので、導電部材30としてハンダを用いることができる。一方、PET等を用いて形成される絶縁基材10においては、ハンダを導電部材30として用いると実装段階(リフロー工程等)において絶縁基材10が損傷するので、導電部材30としてハンダを用いることはできず、低温硬化型導電性ペーストを用いることになる。 [
The
導電部材30は、導電性を有する硬化性組成物であり、低温硬化型導電性ペーストであることが好ましい。低温硬化型導電性ペーストの材質としては、低温(100℃程度以下)で硬化する化合物であることが好ましく、様々な化合物を用いることができ、可撓性を有する化合物であることがより好ましい。そして、導電部材30は、実装体1に伸縮や屈曲等の変形が加えられた場合であっても素子20との電気的接続性の信頼性を保持する観点から、1Hzでの動的粘弾性測定において23℃における貯蔵弾性率が0.1MPaから100MPaの弾性率を有することが好ましい。 [Conductive member 30]
The
(A)エラストマー成分は、1Hzでの動的粘弾性測定において、23℃における貯蔵弾性率が0.1MPaから100MPaの範囲にあるエラストマー成分である。1Hzでの動的粘弾性測定において23℃における貯蔵弾性率が0.1MPaから100MPaの範囲にあることで、柔軟で伸縮性に優れる硬化物が得られる。更に、1Hzでの動的粘弾性測定において23℃における貯蔵弾性率が0.1MPaから50MPaの範囲にあることで、硬化物の伸縮時に破断が生じ難くなるため特に好ましい。 ((A) Elastomer component whose storage elastic modulus at 23 ° C. is in the range of 0.1 MPa to 100 MPa in dynamic viscoelasticity measurement at 1 Hz)
The (A) elastomer component is an elastomer component having a storage elastic modulus at 23 ° C. in the range of 0.1 MPa to 100 MPa in dynamic viscoelasticity measurement at 1 Hz. When the storage elastic modulus at 23 ° C. is in the range of 0.1 MPa to 100 MPa in the dynamic viscoelasticity measurement at 1 Hz, a cured product which is flexible and excellent in stretchability can be obtained. Furthermore, when the storage elastic modulus at 23 ° C. in the dynamic viscoelasticity measurement at 1 Hz is in the range of 0.1 MPa to 50 MPa, it is particularly preferable because breakage hardly occurs during expansion and contraction of the cured product.
導電性フィラーは、電気導電性を有する材料を用いて形成される。導電性フィラーとしては、例えば、銀粉、銅粉、ニッケル粉、アルミ粉、及びこれらの銀メッキ粉や、銀コートガラス、銀コートシリカ、銀コートプラスチック等の金属粉;酸化亜鉛、酸化チタン、ITO、ATO、カーボンブラック等が挙げられる。体積抵抗率を低下させる観点から、導電性フィラーは、銀粉又は銀メッキ粉が好ましく、導電性の信頼性及びコストの観点から、銀粉及び銀メッキ粉を併用することがより好ましい。 ((B) conductive filler)
The conductive filler is formed using a material having electrical conductivity. As the conductive filler, for example, silver powder, copper powder, nickel powder, aluminum powder, and silver plated powder thereof, metal powder such as silver coated glass, silver coated silica, silver coated plastic, etc .; zinc oxide, titanium oxide, ITO , ATO, carbon black and the like. From the viewpoint of reducing the volume resistivity, the conductive filler is preferably silver powder or silver plating powder, and it is more preferable to use silver powder and silver plating powder in combination from the viewpoint of conductivity reliability and cost.
(A)成分及び(B)成分と共に(C)特定の表面処理剤により疎水化処理された疎水性シリカ及び親水性シリカからなる群から選択される1種以上のシリカを用いることにより、特に導電性の安定性に優れた導電性硬化性組成物を得ることができる。(C)シリカの粒径は特に制限はないが、シリカ微粉末が好ましく、平均粒径7nm以上16nm以下のシリカ微粉末がより好ましく、平均粒径7nm以上14nm以下のシリカ微粉末が最も好ましい。 ((C) silica)
By using one or more types of silica selected from the group consisting of hydrophobic silica hydrophilized with a specific surface treatment agent (C) and hydrophilic silica together with component (A) and component (B), it becomes possible to conduct electricity in particular It is possible to obtain a conductive curable composition excellent in the stability of the properties. The particle size of (C) silica is not particularly limited, but fine silica powder is preferable, fine silica powder having an average particle size of 7 nm to 16 nm is more preferable, and fine silica powder having an average particle size of 7 nm to 14 nm is most preferable.
導電性硬化性組成物には、導電性硬化性組成物の導電性や硬化性等の機能を損なわない範囲で粘度や物性等を調整する観点から、必要に応じ、硬化触媒、充填剤、可塑剤、接着付与剤、安定剤、着色剤、物性調整剤、揺変剤、脱水剤(保存安定性改良剤)、粘着付与剤、垂れ防止剤、紫外線吸収剤、酸化防止剤、難燃剤、ラジカル重合開始剤等の物質やトルエンやアルコール等の各種溶剤を配合してもよい。また、相溶する他の重合体をブレンドしてもよい。 (Other additives)
In the conductive curable composition, from the viewpoint of adjusting the viscosity, physical properties, and the like within the range that does not impair the functions such as the conductivity and the curing property of the conductive curable composition, a curing catalyst, a filler, and a plastic as needed. Agent, adhesion promoter, stabilizer, coloring agent, physical property modifier, thixotropic agent, dehydrating agent (storage stability improving agent), tackifier, anti-sagging agent, ultraviolet absorber, antioxidant, flame retardant, radical A substance such as a polymerization initiator or various solvents such as toluene and alcohol may be blended. Also, other polymers compatible may be blended.
被覆部40は、素子20の側面の少なくとも一部、及び導電部材30の側面の少なくとも一部に接着すると共に、絶縁基材10の表面10aに接着して設けられる。被覆部40は、疑似的なフィレットとして機能する一方で導電性を有さない。したがって、被覆部40には、a)導電部材30との接着性が良好であること、b)導電部材30内に被覆部40を構成する材料が浸透しないこと(仮に浸透すると、導電部材30の抵抗値が増加する場合がある)、c)実装体1に伸縮や屈曲等の外力が加えられた場合であっても素子20と導電部材30との間の歪を軽減できること等の特性が要求される。 [Cover 40]
The covering
実装体1は、一例として、以下の工程を経て製造できる。まず、表面10aに予め所定の導電パターンが設けられた絶縁基材10を準備する(絶縁基材準備工程)。次に、導電パターン上の素子20を搭載する領域であって素子20の電極22が配置されるべき位置に導電部材30を構成することになる導電性の硬化性組成物を塗布若しくは印刷する(印刷工程)。続いて、この導電性の硬化性組成物上に素子20を載置する(載置工程)。そして、常温(例えば、23℃)若しくは低温(例えば、100℃以下の温度)でこの硬化性組成物を硬化させる(硬化工程)。これにより、絶縁基材10上に素子20が固定される。 [Method of manufacturing mounting body 1]
The mounting
本実施形態に係る実装体1においては、所定の弾性率を有する被覆部40により素子20と導電部材30との境界50を含む領域が被覆されると共に、その被覆部40が絶縁基材10の表面10aにも接着している。そのため、絶縁基材10が屈曲した場合だけでなく伸縮した場合であっても、被覆部40が屈曲や伸縮により発生する応力を緩和するので、素子20と導電部材30との電気的接続性を維持することができる。その結果、実装体1によれば、素子20と導電部材30との電気的接続性の信頼性を維持することができる。 <Effect of the embodiment>
In the mounting
図2(a)に示すように、ポリイミドフィルム12(厚さ12.5μm)上に銅配線14(5mm)が形成されたフレキシブル基板11を準備した。なお、銅配線14は、ポリイミドフィルム12上に2本設け、一方の銅配線14(長さ:45mm)と他方の銅配線14(長さ:127mm)との間には0.6mmの隙間を設けた。 Example 1
As shown to Fig.2 (a), the
フラスコに溶剤である酢酸エチル40質量部、メチルメタクリレート59質量部、2-エチルヘキシルメタクリレート25質量部、γ-メタクリロキシプロピルトリメトキシシラン22質量部、及び金属触媒としてルテノセンジクロライド0.1質量部を仕込み、窒素ガスを導入しながら80℃に加熱した。次いで、3-メルカプトプロピルトリメトキシシラン8質量部をフラスコ内に添加し80℃で6時間反応させた。室温に冷却後、ベンゾキノン溶液(95%THF溶液)を20質量部添加して重合を停止させた。溶剤及び未反応物を留去し、ポリスチレン換算の質量平均分子量が約6,000であり、ガラス転移点(Tg)が61.2℃であるトリメトキシシリル基を有するアクリル酸エステル系重合体A1を得た。 Synthesis Example 1
40 parts by mass of ethyl acetate as a solvent, 59 parts by mass of methyl methacrylate, 25 parts by mass of 2-ethylhexyl methacrylate, 22 parts by mass of γ-methacryloxypropyltrimethoxysilane, and 0.1 parts by mass of ruthenocene dichloride as a metal catalyst Charge and heat to 80 ° C. while introducing nitrogen gas. Then, 8 parts by mass of 3-mercaptopropyltrimethoxysilane was added into the flask and reacted at 80 ° C. for 6 hours. After cooling to room temperature, 20 parts by mass of a benzoquinone solution (95% THF solution) was added to terminate the polymerization. A solvent and an unreacted material are distilled off, and an acrylic acid ester polymer A1 having a trimethoxysilyl group having a polystyrene equivalent mass average molecular weight of about 6,000 and a glass transition point (Tg) of 61.2 ° C. I got
*1:加水分解性ケイ素基を有するウレタンポリマー(商品名:「SPUR+1050MM」、モメンティブ製)
*2フレーク状銀粉、商品名:シルコートAgC-B、福田金属箔粉工業(株)製、比表面積1.35m2/g、タップ密度4.6g/cm3、50%平均粒径4μm。
*3)粒状銀粉(還元粉)、商品名:シルコートAgC-G、福田金属箔粉工業(株)製、比表面積2.5m2/g、タップ密度1.4g/cm3。
*4)フェノール系酸化防止剤、商品名イルガノックス245、BASF製。
*5)アミン系老化防止剤、商品名チヌビン765、BASF製。
*6)親水性シリカ、商品名:レオロシールQS-20、(株)トクヤマ製。
*7)パラフィン系希釈剤、商品名:カクタスノルマルパラフィンN-11、(株)ジャパンエナジー製。
*8)ビニルトリメトキシシラン、商品名:KBM-1003、信越化学工業(株)製。
*9)ジオクチル錫化合物、商品名:ネオスタンU-830、日東化成(株)製。 In Table 1, the unit of the compounding amount of each compounding substance is "mass part". Moreover, the details of the compounding substance are as follows.
* 1: Urethane polymer with hydrolyzable silicon group (trade name: "SPUR + 1050MM", manufactured by Momentive)
* 2 Flaky silver powder, trade name: Silcoat AgC-B, manufactured by Fukuda Metal Foil & Powder Co., Ltd., specific surface area 1.35 m 2 / g, tap density 4.6 g / cm 3 , 50% average particle diameter 4 μm.
* 3) Granular silver powder (reduced powder), trade name: Silcoat AgC-G, manufactured by Fukuda Metal Foil & Powder Co., Ltd., specific surface area 2.5 m 2 / g, tap density 1.4 g / cm 3 .
* 4) Phenolic antioxidant, trade name Irganox 245, manufactured by BASF.
* 5) Amine based anti-aging agent, trade name Tinubin 765, manufactured by BASF.
* 6) Hydrophilic silica, trade name: Leorosil QS-20, manufactured by Tokuyama Corporation.
* 7) Paraffin based diluent, trade name: Cactus Normal Paraffin N-11, Japan Energy Co., Ltd.
* 8) Vinyltrimethoxysilane, trade name: KBM-1003, manufactured by Shin-Etsu Chemical Co., Ltd.
* 9) Dioctyltin compound, trade name: Neostan U-830, manufactured by Nitto Kasei Co., Ltd.
比較例1に係る試験片は、実施例1とは異なり、被覆部42を形成しない点を除き実施例1と同様にして作製した。また、参考例1に係る試験片は、導電性接着剤32をハンダペースト(FLF01-BZ(L)、松尾ハンダ株式会社製)にし、かつ、被覆部42を形成しない点を除き実施例1と同様にして作製した。なお、参考例1においてはハンダペーストを260℃5分間加熱してリフローした。 (Comparative Example 1, Reference Example 1)
The test piece according to Comparative Example 1 was produced in the same manner as in Example 1 except that the
実施例2に係る試験片は、実施例1とは異なり、ポリイミドフィルム12をPETフィルムに変更した点を除き、実施例1と同様にして作製した。なお、PETフィルムは260℃5分間加熱で損傷することから、導電部材としてハンダを用いた試験片は作製できなかった。 (Example 2)
A test piece according to Example 2 was produced in the same manner as Example 1, except that the
図3は、U字折り返し試験の概要を示す。 (Conductivity after U-shaped folding test)
FIG. 3 shows an outline of the U-shaped folding test.
2 試験片
10 絶縁基材
10a 表面
11 フレキシブル基板
12 ポリイミドフィルム
14 銅配線
20 素子
22 電極
22a 側面
24 抵抗チップ
30 導電部材
30a 側面
32 導電性接着剤
40、42、44 被覆部
50 境界
60 カプトンテープ DESCRIPTION OF
Claims (6)
- 絶縁基材と、
導電部材を介して前記絶縁基材に搭載される素子と、
前記導電部材の側面及び前記素子の側面の少なくとも一部であって、前記導電部材と前記素子との境界の少なくとも一部を被覆し、前記絶縁基材の表面に接して設けられ、弾性率が0.1MPa以上500MPa以下である被覆部と
を備える実装体。 An insulating substrate,
An element mounted on the insulating base via a conductive member;
At least a portion of the side surface of the conductive member and the side surface of the element, covering at least a portion of the boundary between the conductive member and the element, is provided in contact with the surface of the insulating substrate, and has an elastic modulus A mounting body provided with the covering part which is 0.1 or more MPa and 500 or less MPa. - 前記絶縁基材が、可撓性を有し、
前記被覆部が、外力に応じて変形する請求項1に記載の実装体。 The insulating substrate is flexible,
The mounting body according to claim 1, wherein the covering portion is deformed in response to an external force. - 前記絶縁基材が、フレキシブル基板であり、
前記導電部材が、低温硬化型導電性ペーストである請求項1又は2に記載の実装体。 The insulating substrate is a flexible substrate,
The mounting body according to claim 1, wherein the conductive member is a low temperature curing conductive paste. - 前記被覆部が、硬化性組成物を用いて構成され、
前記硬化性組成物が、硬化前において10Pa・s以上100Pa・s以下の粘度を有する請求項1~3のいずれか1項に記載の実装体。 The covering portion is configured using a curable composition,
The mounting body according to any one of claims 1 to 3, wherein the curable composition has a viscosity of 10 Pa · s or more and 100 Pa · s or less before curing. - 請求項1~4のいずれか1項に記載の実装体を備える電子機器。 An electronic device comprising the mounting body according to any one of claims 1 to 4.
- 絶縁基材と、
導電部材を介して前記絶縁基材に搭載される素子と、
前記導電部材の側面及び前記素子の側面の少なくとも一部であって、前記導電部材と前記素子との境界を含む領域の少なくとも一部を被覆し、前記絶縁基材の表面に接して設けられる被覆部とを備える実装体の被覆部用の硬化性組成物であって、
前記硬化性組成物の硬化後の弾性率が、0.1MPa以上500MPa以下である実装体の被覆部用の硬化性組成物。 An insulating substrate,
An element mounted on the insulating base via a conductive member;
A coating that covers at least a portion of the side surface of the conductive member and the side surface of the element, at least a portion of the region including the boundary between the conductive member and the element, and is provided in contact with the surface of the insulating substrate A curable composition for a cover of a mounting body comprising:
The curable composition for the coating | coated part of the mounting body whose elastic modulus after hardening of the said curable composition is 0.1 Mpa or more and 500 Mpa or less.
Priority Applications (3)
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KR1020207021743A KR20200107994A (en) | 2018-01-17 | 2018-10-23 | Mounting body |
CN201880086131.2A CN111566787A (en) | 2018-01-17 | 2018-10-23 | Mounting body |
JP2019565717A JPWO2019142423A1 (en) | 2018-01-17 | 2018-10-23 | Implementation |
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JP2018-005369 | 2018-01-17 | ||
JP2018005369 | 2018-01-17 |
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PCT/JP2018/039273 WO2019142423A1 (en) | 2018-01-17 | 2018-10-23 | Mounting body |
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JP (1) | JPWO2019142423A1 (en) |
KR (1) | KR20200107994A (en) |
CN (1) | CN111566787A (en) |
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WO (1) | WO2019142423A1 (en) |
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KR102648985B1 (en) * | 2022-03-02 | 2024-03-19 | 서울대학교산학협력단 | Electronic apparatus, Measuring apparatus, Measuring system and method of manufacturing electronic apparatus |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002302534A (en) * | 2001-01-29 | 2002-10-18 | Ube Ind Ltd | Under-filling material for implementing cof, and electronic part |
WO2010079831A1 (en) * | 2009-01-09 | 2010-07-15 | ナガセケムテックス株式会社 | Method for manufacturing semiconductor package, method for encapsulating semiconductor, and solvent-borne semiconductor encapsulating epoxy resin composition |
WO2012032840A1 (en) * | 2010-09-07 | 2012-03-15 | オムロン株式会社 | Method for surface mounting electronic component, and substrate having electronic component mounted thereon |
JP2013118276A (en) * | 2011-12-02 | 2013-06-13 | Namics Corp | Semiconductor device |
JP2015071792A (en) * | 2011-12-27 | 2015-04-16 | 日立化成株式会社 | Liquid resin composition for electronic part and method of producing the same, and electronic part device |
WO2016125737A1 (en) * | 2015-02-04 | 2016-08-11 | ナミックス株式会社 | Thermally conductive paste and manufacturing method therefor |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003021664A1 (en) * | 2001-08-31 | 2003-03-13 | Hitachi, Ltd. | Semiconductor device, structural body and electronic device |
JP3910527B2 (en) * | 2002-03-13 | 2007-04-25 | シャープ株式会社 | Liquid crystal display device and manufacturing method thereof |
JP5464463B2 (en) * | 2008-09-25 | 2014-04-09 | パナソニック株式会社 | Thermosetting resin composition and circuit board |
JP4922474B2 (en) * | 2010-04-13 | 2012-04-25 | 積水化学工業株式会社 | Semiconductor device |
JP6518451B2 (en) * | 2015-02-02 | 2019-05-22 | 株式会社フジクラ | Elastic circuit board |
-
2018
- 2018-10-23 WO PCT/JP2018/039273 patent/WO2019142423A1/en active Application Filing
- 2018-10-23 JP JP2019565717A patent/JPWO2019142423A1/en active Pending
- 2018-10-23 KR KR1020207021743A patent/KR20200107994A/en not_active Application Discontinuation
- 2018-10-23 CN CN201880086131.2A patent/CN111566787A/en active Pending
- 2018-10-24 TW TW107137476A patent/TW201933556A/en unknown
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002302534A (en) * | 2001-01-29 | 2002-10-18 | Ube Ind Ltd | Under-filling material for implementing cof, and electronic part |
WO2010079831A1 (en) * | 2009-01-09 | 2010-07-15 | ナガセケムテックス株式会社 | Method for manufacturing semiconductor package, method for encapsulating semiconductor, and solvent-borne semiconductor encapsulating epoxy resin composition |
WO2012032840A1 (en) * | 2010-09-07 | 2012-03-15 | オムロン株式会社 | Method for surface mounting electronic component, and substrate having electronic component mounted thereon |
JP2013118276A (en) * | 2011-12-02 | 2013-06-13 | Namics Corp | Semiconductor device |
JP2015071792A (en) * | 2011-12-27 | 2015-04-16 | 日立化成株式会社 | Liquid resin composition for electronic part and method of producing the same, and electronic part device |
WO2016125737A1 (en) * | 2015-02-04 | 2016-08-11 | ナミックス株式会社 | Thermally conductive paste and manufacturing method therefor |
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JPWO2019142423A1 (en) | 2021-01-14 |
CN111566787A (en) | 2020-08-21 |
TW201933556A (en) | 2019-08-16 |
KR20200107994A (en) | 2020-09-16 |
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