WO2019142423A1 - Mounting body - Google Patents

Mounting body Download PDF

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Publication number
WO2019142423A1
WO2019142423A1 PCT/JP2018/039273 JP2018039273W WO2019142423A1 WO 2019142423 A1 WO2019142423 A1 WO 2019142423A1 JP 2018039273 W JP2018039273 W JP 2018039273W WO 2019142423 A1 WO2019142423 A1 WO 2019142423A1
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WO
WIPO (PCT)
Prior art keywords
mounting body
conductive
conductive member
curable composition
powder
Prior art date
Application number
PCT/JP2018/039273
Other languages
French (fr)
Japanese (ja)
Inventor
祐輔 岡部
Original Assignee
セメダイン株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by セメダイン株式会社 filed Critical セメダイン株式会社
Priority to KR1020207021743A priority Critical patent/KR20200107994A/en
Priority to CN201880086131.2A priority patent/CN111566787A/en
Priority to JP2019565717A priority patent/JPWO2019142423A1/en
Publication of WO2019142423A1 publication Critical patent/WO2019142423A1/en

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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/18Printed circuits structurally associated with non-printed electric components
    • H05K1/189Printed circuits structurally associated with non-printed electric components characterised by the use of a flexible or folded printed circuit
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0393Flexible materials
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/284Applying non-metallic protective coatings for encapsulating mounted components
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/285Permanent coating compositions
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3457Solder materials or compositions; Methods of application thereof

Definitions

  • the present invention relates to an implementation.
  • the present invention relates to a mounting body provided with a covering portion that relieves an external force.
  • a semiconductor device having an electrode pad, a substrate having a terminal electrode, a bump electrode provided on the electrode pad of the semiconductor device, and a conductive adhesive having flexibility are provided on the bump electrode and the substrate
  • a sealing layer for mechanically bonding the semiconductor device wherein the sealing material mainly comprises a resin binder and a filler, and the resin binder comprises polyepoxide, an acid anhydride and a rheology modifier
  • a mounting body which is an essential component see, for example, Patent Document 1). According to the mounting body which concerns on patent document 1, the fluidity
  • a sealing material is formed using a resin binder and a filler, and polyepoxide, an acid anhydride and a rheology modifier as essential components are used as a resin binder. Because the sealing material is hard. As a result, when an external force is applied to the mounting body described in Patent Document 1, for example, when an external force that bends the substrate is applied, damage to the sealing material or electrical connection between the semiconductor device and the conductive adhesive Problems such as disconnection may occur.
  • an object of the present invention is to provide a mounting body capable of ensuring the reliability of the electrical connection between the element and the conductive member electrically connected to the element even when an external force is applied to bend the substrate.
  • the purpose is to
  • the present invention provides an insulating substrate, an element mounted on the insulating substrate through the conductive member, at least a part of the side surface of the conductive member and the side surface of the element, There is provided a mounting body including at least a part of the boundary with the element and provided in contact with the surface of the insulating substrate and having a modulus of elasticity of 0.1 MPa or more and 500 MPa or less.
  • the insulating base material has flexibility, and the covering portion is deformed in response to an external force.
  • the insulating base is a flexible substrate and the conductive member is a low temperature curing conductive paste.
  • the covering portion be configured using a curable composition, and the curable composition has a viscosity of 10 Pa ⁇ s or more and 100 Pa ⁇ s or less before curing.
  • the present invention provides an electronic device including the mounting body according to any one of the above.
  • the present invention provides an insulating base, an element mounted on the insulating base via a conductive member, at least a part of a side surface of the conductive member and a side surface of the element
  • a curable composition for a covering portion of a mounting body comprising: a covering portion covering at least a part of a region including a boundary between a member and an element and being provided in contact with a surface of an insulating substrate, the curable composition
  • coated part of the mounting body whose elastic modulus after hardening of a thing is 0.1 Mpa or more and 500 Mpa or less is provided.
  • the mounting body can ensure the reliability of the electrical connection between the element and the conductive member electrically connected to the element even when an external force that bends the substrate is applied.
  • a low temperature curing conductive paste is used as the conductive member.
  • electrically-conductive members such as a low-temperature-hardening-type electrically conductive paste
  • a fillet is not formed. Therefore, only the portion where the element and the solder are in contact adheres, and the side surface of the element does not substantially adhere to the low temperature curing conductive paste.
  • low temperature refers to a temperature of about 100 ° C. or less.
  • the element is a device that uses a base material made of a material that is easily stretched or bent, that is, when using a base material having flexibility or using a low temperature curing type conductive adhesive. From the viewpoint of maintaining the reliability of the electrical connection between the conductive member and the conductive member, at least a portion of the side surface of the conductive member and the side surface of the element, and at least a portion of the boundary between the conductive member and the element Even if the base material is stretched and / or bent by covering it with a curable composition (adhesive resin) having an elastic modulus of, and bringing the adhesive resin into contact also with the surface of the insulating base material It has been found that the electrical connectivity between the element and the conductive member can be kept good.
  • a curable composition adheresive resin
  • the mounting body according to the embodiment of the present invention is at least a part of the insulating base, the element mounted on the insulating base via the conductive member, the side surface of the conductive member, and the side of the element At least a part of the boundary between the member and the element (that is, the "region including the boundary” or “the boundary end") is covered, provided in contact with the surface of the insulating substrate, and the expansion and / or contraction of the insulating substrate And a covering portion having an elastic modulus that can deform its shape in response to bending.
  • the covering portion is formed using an adhesive resin.
  • the elastic modulus is, for example, a storage elastic modulus in dynamic viscoelasticity measurement at a frequency of 1 Hz.
  • FIG. 1 shows an outline of a cross section of a mounting body according to an embodiment of the present invention.
  • FIG. 1A shows an outline of a cross section of the mounting body 1 according to the present embodiment
  • FIGS. 1B and 1C show an outline of a cross section of a modified example of the mounting body, respectively.
  • FIG. 1 is a schematic view, and the dimensions of the components and the ratio of the dimensions are not necessarily as illustrated.
  • the mounting body 1 includes an insulating base 10, an element 20 mounted on the surface 10 a of the insulating base 10 via a conductive member 30, an element 20 and a conductive member 30. Covering at least a part of the end of the boundary 50 generated in the contact part, at least a part of the side 22a of the element 20 (and / or the side of the electrode 22 described later) and at least a part of the side 30a of the conductive member 30 And a covering portion 40 for covering the area including the portion and adhering to a portion of the surface 10 a of the insulating substrate 10.
  • the mounting body 1a substantially the same configuration as the mounting body 1 except that the covering portion 42 covers substantially the entire side surface of the element 20 and the side surface of the conductive member 30. And features. Further, in a mounting body 1b according to another modification of FIG. 1 (c), the mounting body 1 except that the covering portion 44 covers substantially the entire side surface and upper surface of the element 20 and the side surface of the conductive member 30. Substantially the same configuration and function as Therefore, about the mounting body 1a and the mounting body 1b, detailed description is abbreviate
  • the insulating substrate 10 is a substrate (insulating substrate) having an insulating property.
  • insulating substrate a substrate having an insulating property.
  • various materials such as polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polymethyl methacrylate (PMMA), polyimide, polypropylene (PP), polyurethane, various rubbers, etc., as the material constituting the insulating substrate 10 Can.
  • the insulating base 10 may have flexibility or may be a flexible substrate. From the viewpoint of expansion and contraction, bending, and the like, the insulating base 10 is preferably formed of a flexible material, and is preferably a flexible substrate.
  • the insulation base material 10 formed using polyimide has heat resistance, solder can be used as the conductive member 30.
  • solder can be used as the conductive member 30.
  • the insulating base material 10 formed using PET etc. if the solder is used as the conductive member 30, the insulating base material 10 is damaged in the mounting step (reflow process etc.). It is not possible to use a low temperature curing type conductive paste.
  • the element 20 examples include electronic elements such as semiconductor elements (including light emitting elements such as light emitting diodes and laser diodes, light receiving elements, solar cells, other sensors, and the like), chip parts, discrete parts and the like. Also, one or more elements 20 can be mounted on the insulating base 10.
  • the element 20 has, for example, an electrode 22 at its end (for example, one electrode 22 is an electrode for the positive electrode, and the other electrode 22 is an electrode for the negative electrode).
  • the electrode 22 and the conductive member 30 both are electrically connected, and the element 20 is bonded and fixed to the insulating base 10.
  • the boundary 50 is also generated at the contact portion between the electrode 22 of the element 20 and the conductive member 30.
  • prescribed electroconductive pattern is previously provided in the surface 10a of the insulation base material 10 (illustration is abbreviate
  • the conductive member 30 is electrically connected to a part of the conductive pattern.
  • the conductive member 30 is a curable composition having conductivity, and is preferably a low temperature curable conductive paste.
  • the material of the low temperature curing type conductive paste is preferably a compound which cures at a low temperature (about 100 ° C. or less), various compounds can be used, and a compound having flexibility is more preferable.
  • the conductive member 30 has a dynamic viscoelasticity at 1 Hz from the viewpoint of maintaining the reliability of the electrical connectivity with the element 20 even when deformation such as expansion or contraction or bending is applied to the mounting body 1.
  • the storage elastic modulus at 23 ° C. in measurement preferably has an elastic modulus of 0.1 MPa to 100 MPa.
  • conductive member 30 epoxy compounds, rubber compounds such as SBR, NBR, IR, BR, CR, etc., acrylic compounds, polyester compounds, polyamide compounds, polyether compounds, polyurethane compounds Polyimide compounds, silicone compounds and the like can be used.
  • conductive material contained in the conductive member 30 various conductive materials can be used. Examples of conductive materials include noble metal powders such as silver, gold and palladium, base metal powders such as nickel and copper, alloy powders such as silver palladium, composite powders such as silver-plated copper powder, and carbon, etc. Non-metal powder etc. which it has can be used. These conductive materials may be used alone or in combination of two or more. In addition, the particle size and shape of these conductive materials are not particularly limited.
  • the curable composition having conductivity has (A) an elastomer component having a storage elastic modulus at 23 ° C. in the range of 0.1 MPa to 100 MPa in dynamic viscoelasticity measurement at 1 Hz, and (B) a conductive filler.
  • the (B) conductive filler may be 50% by mass or more and 85% by mass or less of the total content. Further, from the viewpoint of securing the flexibility of the cured product, (B) the conductive filler is 50% by mass or more and 85% by mass or less of the total content, and (B) the conductive filler is (b1) first And silver-plated powder, and (b2) a second silver powder and silver-plated powder.
  • the tap density of (b1) the first silver powder and the silver-plated powder is 2.5 g / cm 3 or more and 6.0 g / cm 3 or less
  • the tap density of the second silver powder and silver-plated powder is 1.0 g / cm 3 or more and 3.0 g / cm 3 or less
  • the mixing ratio of (b1) to (b2) [(b1) / (b2)] is It may be 1/10 or more and 10/1 or less in mass ratio.
  • the conductive curable composition can also include (C) silica that has been subjected to a hydrophobization treatment with a predetermined surface treatment agent.
  • the (A) elastomer component is an elastomer component having a storage elastic modulus at 23 ° C. in the range of 0.1 MPa to 100 MPa in dynamic viscoelasticity measurement at 1 Hz.
  • the storage elastic modulus at 23 ° C. is in the range of 0.1 MPa to 100 MPa in the dynamic viscoelasticity measurement at 1 Hz, a cured product which is flexible and excellent in stretchability can be obtained.
  • the storage elastic modulus at 23 ° C. in the dynamic viscoelasticity measurement at 1 Hz is in the range of 0.1 MPa to 50 MPa, it is particularly preferable because breakage hardly occurs during expansion and contraction of the cured product.
  • the dynamic viscoelasticity measurement of the (A) elastomer component can be measured, for example, by the following means.
  • the conductive curable composition When the conductive curable composition is a water dispersion, remove solid components such as (B) conductive filler and (C) silica by filtration, and then evaporate the dispersion medium by heating at 100 ° C. or less. Dynamic viscoelasticity can be measured for the cured product obtained in When the conductive curable composition is dispersed in an organic solvent (diluent), the solid component such as (B) conductive filler or (C) silica is removed by filtration, and then 150 ° C. Dynamic viscoelasticity can be measured for the cured product obtained by evaporating the dispersion medium by the following heating.
  • a resin that is liquid at normal temperature such as a modified silicone resin or urethane resin
  • solid components such as (B) conductive filler and (C) silica are removed by filtration. It is also possible to extract the elastomer component (A), add a curing catalyst as needed, and cure it, and measure the dynamic viscoelasticity of the resulting cured product.
  • the cured product of the conductive curable composition With respect to the cured product of the conductive curable composition, the cured product is immersed in a solvent in which the cured product dissolves and shaken to remove solid components such as (B) conductive filler and (C) silica, and (A) Dynamic viscoelasticity can be measured on a cured product obtained by extracting the elastomer component and then removing the solvent by heating at 150 ° C. or less.
  • thermoplastic resins and thermosetting resins Materials formed from water soluble resins, crosslinked rubbers, and vulcanized rubbers. Examples of such resin include vinyl resin, acrylic resin, butadiene resin, silicone resin, polyurethane resin, modified silicone resin, and the like. Further, the above resin may be used as a water dispersion.
  • vinyl resins include vinyl acetate polymer resins, vinyl chloride / vinyl acetate copolymer resins, vinyl chloride / vinyl acetate / maleic acid terpolymer resins, or combinations thereof.
  • acrylic elastomer as an acrylic resin, for example, glass transition temperatures (T g ) of polybutyl (meth) acrylate, poly 2-ethylhexylethyl (meth) acrylate, poly 2-hydroxyethyl (meth) acrylate, etc. are compared. Resins, or combinations thereof. In addition to these skeletons, block copolymers containing polymethyl (meth) acrylate are preferable from the viewpoint of securing elongation physical properties and adhesiveness while maintaining flexibility.
  • T g glass transition temperatures
  • block copolymers containing polymethyl (meth) acrylate are preferable from the viewpoint of securing elongation physical properties and adhesiveness while maintaining flexibility.
  • block copolymer various block copolymers can be used.
  • an acrylic triblock copolymer produced by a living polymerization method can be used.
  • polymethyl methacrylate-polybutadiene-polystyrene copolymer, polymethyl methacrylate-polybutyl acrylate-polymethyl methacrylate copolymer, these copolymers were subjected to carboxylic acid modification treatment or hydrophilic group modification treatment
  • Block copolymers such as copolymers, polymethyl methacrylate-polybutyl acrylate copolymers, and polymethyl methacrylate-polybutyl acrylate-polymethyl methacrylate copolymers can be used.
  • butadiene-based resin examples include SB (styrene-butadiene) resin, SBS (styrene-butadiene-styrene) resin, SEBS resin (styrene-ethylene / butylene-styrene), SIS (styrene-isoprene-styrene) resin, SIBS (SIBS) Styrene-isoprene / butadiene-styrene) resins, SEPS (styrene-ethylene / propylene-styrene) resins, etc., or combinations thereof.
  • SB styrene-butadiene
  • SBS styrene-butadiene-styrene
  • SEBS resin styrene-ethylene / butylene-styrene
  • SIBS SIBS
  • SEPS styrene-ethylene / propylene-styrene
  • the modified silicone resin conventionally known crosslinkable silicon group-containing organic polymers can be used.
  • the crosslinkable silicon group of the crosslinkable silicon group-containing organic polymer is a group which has a hydroxyl group or a hydrolyzable group bonded to a silicon atom and can be crosslinked by forming a siloxane bond.
  • the conductive filler is formed using a material having electrical conductivity.
  • the conductive filler for example, silver powder, copper powder, nickel powder, aluminum powder, and silver plated powder thereof, metal powder such as silver coated glass, silver coated silica, silver coated plastic, etc .; zinc oxide, titanium oxide, ITO , ATO, carbon black and the like.
  • the conductive filler is preferably silver powder or silver plating powder, and it is more preferable to use silver powder and silver plating powder in combination from the viewpoint of conductivity reliability and cost.
  • the shape of the conductive filler various shapes (for example, granular, spherical, elliptical, cylindrical, flake, flat, or agglomerates) can be adopted.
  • the conductive filler can also have a somewhat rough or jagged surface.
  • the particle shape, size, and / or hardness of the conductive filler can be used in combination in the curable composition having conductivity.
  • a plurality of conductive fillers having different particle shapes, sizes, and / or hardness of (B) conductive filler are combined. It can also be done.
  • the conductive filler to be combined is not limited to two types, and may be three or more types. Among them, it is preferable to use a flaky conductive filler and a particulate conductive filler in combination.
  • the flake shape includes a flat shape, a flaky shape, or a scaly shape, and includes a shape obtained by crushing silver powder having a three-dimensional shape such as a spherical shape or a massive shape in one direction.
  • a granular form means the shape of all the electroconductive fillers which do not have flake shape.
  • the granular form there may be mentioned a shape in which powder is aggregated into a bunch of grapes, a spherical shape, a substantially spherical shape, a massive shape, a dendritic shape, or a mixture of silver powder having these shapes.
  • this electroconductive filler can be manufactured by various methods.
  • flake-like silver powder is used as a conductive filler, it is manufactured by mechanically pulverizing silver powder such as spherical silver powder, massive silver powder, and / or granular silver powder using an apparatus such as a jet mill, roll mill or ball mill. it can.
  • granular silver powder is used as a conductive filler, it can be produced by an electrolytic method, a pulverizing method, a heat treatment method, an atomizing method, a reduction method or the like.
  • the reduction method is preferable because a powder with a low tap density can be easily obtained by controlling the reduction method.
  • the silver powder and the silver-plated powder preferably include (b1) the first silver powder and the silver-plated powder and (b2) the second silver powder and the silver-plated powder each having a predetermined tap density.
  • the mixing ratio [(b1) / (b2)] of (b1) and (b2) is 1/10 or more and 10/1 or less in mass ratio, preferably 1/4 or more and 4/1 or less, and 3/2 or more 4/1 or less is more preferable.
  • the mixing ratio of the first silver powder and the silver plating powder is 1/10 or more and 10/1 or less
  • the mixing ratio of the second silver powder and the silver plating powder Is 1/10 or more and 10/1 or less.
  • the tap density of the first silver powder and silver-plated powder is less than 2.5 g / cm 3 or more 6.0g / cm 3, 3.0g / cm 3 or more 5.0 g / cm 3 or less.
  • the 50-% average particle diameter of (b1) 1st silver powder 0.5 micrometer or more and 15 micrometers or less are preferable.
  • the shape of the (b1) first silver powder and the silver-plated powder may be various shapes, and various shapes such as flakes and particles can be used. Among them, flake-like silver powder and silver-plated powder are preferable.
  • the tap density of silver powder and silver-plated powder can be measured by the method according to the 20.2 tap method of JIS K 5101-1991.
  • 50% average particle diameter is a particle diameter in 50% of the volume accumulation measured by laser diffraction scattering type particle size distribution measuring method.
  • the tap density of the second silver powder and the silver-plated powder is 1.0 g / cm 3 or more and 3.0 g / cm 3 or less.
  • the 50% average particle diameter of (b2) 2nd silver powder and silver plating powder 0.5 micrometer or more and 20 micrometers or less are preferable.
  • the shapes of (b2) 2nd silver powder and silver plating powder may be various shapes, and various shapes, such as flake shape and a granular form, can be used. Among them, granular silver powder and silver plated powder are preferable.
  • the content of the conductive filler (B) is 50% by mass to 85% by mass, preferably 65% by mass to 85% by mass, and preferably 70% by mass to 80% by mass of the total content of the conductive curable composition. % Or less is more preferable. From the viewpoint of obtaining sufficient conductivity, the content is preferably 50% by mass or more, and from the viewpoint of securing adhesiveness and workability together with excellent conductivity, it is preferably 85% by mass or less. In particular, from the viewpoint of securing adhesiveness and workability, it is preferable that the content of the (b2) second silver powder and the silver-plated powder is not excessively increased.
  • one of the components (b1) and (b2) is a flake-like silver powder and / or a silver-plated powder, and the other is a combination of granular silver powder and / or a silver-plated powder. It is preferable to use it.
  • ((C) silica) By using one or more types of silica selected from the group consisting of hydrophobic silica hydrophilized with a specific surface treatment agent (C) and hydrophilic silica together with component (A) and component (B), it becomes possible to conduct electricity in particular It is possible to obtain a conductive curable composition excellent in the stability of the properties.
  • the particle size of (C) silica is not particularly limited, but fine silica powder is preferable, fine silica powder having an average particle size of 7 nm to 16 nm is more preferable, and fine silica powder having an average particle size of 7 nm to 14 nm is most preferable.
  • hydrophilic silica can be widely used as hydrophilic silica, and fumed silica having a silanol group (Si-OH group) on the surface is preferable among them.
  • hydrophilic silica it is possible to prevent bleeding while securing flowability without increasing viscosity.
  • the conductive curable composition having flowability is suitable for applications requiring flowability, for example, application to a substrate by screen printing and formation of a pattern with a thin film of about 50 ⁇ m.
  • hydrophobic silica one or more surface treatment agents selected from the group consisting of dimethyldichlorosilane, hexamethyldisilazane, (meth) acrylsilane, octylsilane (eg, trimethoxyoctylsilane etc.), and aminosilane Hydrophobicized hydrophobic silica is used.
  • hydrophobic silica hydrophobized with such a specific surface treatment agent it is possible to prevent bleeding while ensuring dischargeability and shape retention.
  • the conductive curable composition having a shape retention property is required to have a film thickness of 100 ⁇ m or more when the shape retention property is required, for example, in the case of forming a pattern by applying to a substrate by a screen printing method,
  • the present invention is suitable for applications such as replacing the solder connection portion with a conductive curable composition.
  • the hydrophobization treatment method of the silica using a surface treatment agent can select a well-known method, for example, the surface treatment agent mentioned above is sprayed on untreated silica, or the surface treatment agent which vaporized is mixed, and heat treatment is carried out. Methods are included. In addition, it is preferable to process this hydrophobization by the dry condition under nitrogen atmosphere.
  • (C) Silica can be used alone or in combination of two or more.
  • conductive curable composition from the viewpoint of adjusting the viscosity, physical properties, and the like within the range that does not impair the functions such as the conductivity and the curing property of the conductive curable composition, a curing catalyst, a filler, and a plastic as needed.
  • a substance such as a polymerization initiator or various solvents such as toluene and alcohol may be blended. Also, other polymers compatible may be blended.
  • the curable composition having conductivity can be made into a one-component type as needed, and can also be made a two-component type.
  • the curable composition having conductivity is particularly suitable for use as a one-component type.
  • the curable composition which has electroconductivity is hardened
  • curing may be promoted by heating (for example, heating at about 80 ° C. to 100 ° C.) as appropriate.
  • a conductive curable composition has high conductivity by being applied or printed on a substrate and cured, and can be used instead of solder.
  • the curable composition having conductivity is used for bonding and mounting of electronic parts such as semiconductor element chip parts and discrete parts, circuit connection, bonding / fixing of crystal oscillators and piezoelectric elements, sealing of packages, etc. It is suitable for. It is also possible to form on the surface of the substrate a circuit in which one or more kinds of electronic components such as semiconductor elements, chip parts, discrete parts and the like are joined using a curable composition having conductivity.
  • the cured product of the conductive curable composition that constitutes the conductive member 30 according to the present embodiment has flexibility, it is provided on the surface of the insulating base 10 with a predetermined pattern. In this case, even if deformation such as expansion and contraction or bending is applied to the insulating base material 10, the insulating base material 10 is freely deformed according to the deformation.
  • the covering portion 40 adheres to at least a part of the side surface of the element 20 and to at least a part of the side surface of the conductive member 30 and is adhered to the surface 10 a of the insulating substrate 10.
  • the covering portion 40 functions as a pseudo fillet, but has no conductivity. Accordingly, a) the adhesion to the conductive member 30 is good, and b) the material constituting the cover 40 does not penetrate into the conductive member 30 (if it penetrates, the conductive member 30 The resistance value may increase) c) Characteristics such as being able to reduce distortion between the element 20 and the conductive member 30 even when an external force such as expansion or contraction or bending is applied to the mounting body 1 are required. Be done.
  • the covering portion 40 has an elastic modulus of 0.1 MPa or more from the viewpoint of securing appropriate flexibility and electric reliability, and the elastic modulus is preferably 1 MPa or more, more preferably 5 MPa or more. In addition, the covering portion 40 has an elasticity of 500 MPa or less from the viewpoint of reducing the strain generated in the mounting body 1 when an external force is applied to the mounting body 1 and maintaining the durability (the conductivity decreases with time).
  • the modulus of elasticity is preferably 200 MPa or less, more preferably 100 MPa or less.
  • the covering portion 40 has the above elastic modulus and can be deformed in response to an external force.
  • the elastic modulus is a storage elastic modulus in dynamic viscoelasticity measurement at a frequency of 1 Hz.
  • the covering unit 40 may be a curable adhesive such as various thermosetting adhesives, photocurable adhesives, or two-component mixed curable adhesives. It can be configured using.
  • the curable composition From the viewpoint of preventing the curable composition from spreading more than necessary when dropped onto the insulating substrate 10 before forming the covering portion 40 (that is, before curing the curable composition), It is preferable to have a viscosity of 10 Pa ⁇ s or more and 100 Pa ⁇ s or less. Moreover, when forming the coating
  • the sheet-like covering portion 40 can be appropriately formed by a known method.
  • the mounting body 1 can be manufactured, for example, through the following steps. First, the insulation base material 10 in which the predetermined
  • a normal temperature for example, 23 ° C.
  • a low temperature for example, a temperature of 100 ° C. or less
  • coated part 40 is apply
  • the application amount of the curable composition is adjusted to an amount in which the boundary 50 between the element 20 and the conductive member 30 is covered and the side surface of the conductive member 30 is covered.
  • the covering part 40 is formed (covering part formation process).
  • the coating amount of the curable composition is adjusted to an amount such that substantially all of the side surface of the element 20 and the side surface of the conductive member 30 are covered in the covering portion forming step.
  • the amount of the curable composition applied is adjusted to an amount such that the entire element 20 is covered in the covering portion forming step.
  • the mounting body 1 can be applied to various electronic devices such as, for example, printed electronics, wearable devices, robots, electronic devices including machines having a movable range, and the like.
  • a region including the boundary 50 between the element 20 and the conductive member 30 is covered by the covering portion 40 having a predetermined elastic modulus, and the covering portion 40 is formed of the insulating substrate 10. It also adheres to the surface 10a. Therefore, not only when the insulating base material 10 is bent but also when it is expanded and contracted, since the covering portion 40 relieves the stress generated by the bending and expansion and contraction, the electrical connectivity between the element 20 and the conductive member 30 can be improved. Can be maintained. As a result, according to the mounting body 1, the reliability of the electrical connectivity between the element 20 and the conductive member 30 can be maintained.
  • the reliability of the electrical connectivity is equal between the case where solder is used as the conductive member 30 and the case where a low temperature curing type conductive paste is used when the mounting body 1 is bent.
  • the reliability in the case of using the low temperature curing type conductive paste is superior to the case of using the solder. This is because although the low temperature curing type conductive paste expands and contracts according to the expansion and contraction force, the solder does not expand and contract.
  • a circuit can be formed on the flexible substrate by printing, so adjustment of the resistance value in the circuit is easy, and the number of components can be reduced.
  • important parts such as IC are "hard”
  • the covering portion 40 is provided on the part where such "hard” electronic parts are to be provided, so that the reliability as a whole of the mounting body 1 (reliability of electrical connectivity, operation Reliability etc. can be improved.
  • FIG. 2 shows an outline of a test piece according to an example. Specifically, FIG. 2 (a) shows a top view of the flexible substrate 11 constituting the test piece, and FIG. 2 (b) shows a state in which the conductive adhesive 32 is printed on the flexible substrate 11, FIG. (C) shows an outline of a cross section of a test piece according to Example 1.
  • Example 1 As shown to Fig.2 (a), the flexible substrate 11 in which the copper wiring 14 (5 mm) was formed on the polyimide film 12 (thickness 12.5 micrometers) was prepared. In addition, two copper wirings 14 are provided on the polyimide film 12, and a 0.6 mm gap is provided between one copper wiring 14 (length: 45 mm) and the other copper wiring 14 (length: 127 mm). Provided.
  • the conductive adhesive is attached to the chip mounting portion (the end on the gap side of each copper wiring 14).
  • the agent 32 was printed, and a resistive chip 24 (0 ⁇ ) equipped with a gold-plated electrode of 1608 size was mounted as shown in FIG. 2 (c).
  • the conductive adhesive 32 was cured at 80 ° C. for 60 minutes.
  • a curable composition (Super X Gold No. 777 clear. Cemedine Co., Ltd.) is provided in the portion connected by the conductive adhesive 32 (including the portion covering the boundary edge between the resistive chip 24 and the conductive adhesive 32). 1 mg) and aged for 24 hours under an environment of 23.degree. C. and 50% RH to form a coated portion 42.
  • a test piece according to Example 1 was obtained.
  • the conductive adhesive 32 was prepared using the acrylic acid ester-based polymer A1 synthesized in Synthesis Example 1 below, and adding each of the compounding materials at the mixing ratio shown in Table 1. Specifically, each of the component (A), the component (B), and the other additives was weighed and prepared so as to obtain the mixture ratio shown in Table 1. Next, they were mixed and stirred. Thus, a conductive adhesive 32 was obtained.
  • Synthesis Example 1 40 parts by mass of ethyl acetate as a solvent, 59 parts by mass of methyl methacrylate, 25 parts by mass of 2-ethylhexyl methacrylate, 22 parts by mass of ⁇ -methacryloxypropyltrimethoxysilane, and 0.1 parts by mass of ruthenocene dichloride as a metal catalyst Charge and heat to 80 ° C. while introducing nitrogen gas. Then, 8 parts by mass of 3-mercaptopropyltrimethoxysilane was added into the flask and reacted at 80 ° C. for 6 hours. After cooling to room temperature, 20 parts by mass of a benzoquinone solution (95% THF solution) was added to terminate the polymerization.
  • a benzoquinone solution 95% THF solution
  • the unit of the compounding amount of each compounding substance is "mass part”. Moreover, the details of the compounding substance are as follows.
  • * 1 Urethane polymer with hydrolyzable silicon group (trade name: "SPUR + 1050MM", manufactured by Momentive) * 2 Flaky silver powder, trade name: Silcoat AgC-B, manufactured by Fukuda Metal Foil & Powder Co., Ltd., specific surface area 1.35 m 2 / g, tap density 4.6 g / cm 3 , 50% average particle diameter 4 ⁇ m.
  • Granular silver powder (reduced powder), trade name: Silcoat AgC-G, manufactured by Fukuda Metal Foil & Powder Co., Ltd., specific surface area 2.5 m 2 / g, tap density 1.4 g / cm 3 .
  • Phenolic antioxidant trade name Irganox 245, manufactured by BASF.
  • Amine based anti-aging agent trade name Tinubin 765, manufactured by BASF.
  • Hydrophilic silica trade name: Leorosil QS-20, manufactured by Tokuyama Corporation.
  • Paraffin based diluent trade name: Cactus Normal Paraffin N-11, Japan Energy Co., Ltd.
  • Comparative Example 1 Reference Example 1
  • the conductive adhesive 32 is a solder paste (FLF01-BZ (L), manufactured by Matsuo Solder Co., Ltd.), and the coating 42 is not formed. It produced similarly.
  • the solder paste was reflowed by heating at 260 ° C. for 5 minutes.
  • Example 2 A test piece according to Example 2 was produced in the same manner as Example 1, except that the polyimide film 12 was changed to a PET film, unlike Example 1. In addition, since the PET film was damaged by heating at 260 ° C. for 5 minutes, a test piece using solder as a conductive member could not be produced.
  • FIG. 3 shows an outline of the U-shaped folding test.

Abstract

The purpose of the present invention is to provide a mounting body that can ensure a reliable electrical connection between an element and conductive members electrically connected to the element, even when an external force to bend a substrate is applied, The present invention is provided with: an insulation substrate 10; an element 20 mounted on the insulation substrate 10 via conductive members 30; and covering parts 40 which cover at least a portion of side surfaces of the conductive members 30 and a side surface of the element 20, that is, at least a portion of the boundaries between the conductive members 30 and the element 20, which is provided in contact with an outer surface 10a of the insulation substrate 10, and which has an elastic modulus of 0.1 MPa to 500 MPa inclusive.

Description

実装体Mounting body
 本発明は、実装体に関する。特に、本発明は、外力を緩和する被覆部を備える実装体に関する。 The present invention relates to an implementation. In particular, the present invention relates to a mounting body provided with a covering portion that relieves an external force.
 従来、電極パッドを有する半導体装置と、端子電極を有する基板と、半導体装置の電極パッドの上に設けられたバンプ電極と、可撓性を有する導電性接着剤で構成されバンプ電極と基板上の端子電極とを電気的に接続する導電性接着層と、粘度が100Pa・s以下でチクソトロピー指数が1.1以下である組成物を硬化して構成され半導体装置と基板との間隙を埋めて両者を機械的に接合する封止層とを備える半導体装置の実装体であって、封止材が、主に樹脂バインダーと充填材から構成され、樹脂バインダーとしてポリエポキシドと酸無水物とレオロジー改質剤とを必須成分にしている実装体が知られている(例えば、特許文献1参照。)。特許文献1に係る実装体によれば、導電性接着剤を用いたフリップチップ実装に用いられる封止材の流動性を改良し、信頼性及び生産性の高い半導体装置の実装体を実現できる。 Conventionally, a semiconductor device having an electrode pad, a substrate having a terminal electrode, a bump electrode provided on the electrode pad of the semiconductor device, and a conductive adhesive having flexibility are provided on the bump electrode and the substrate A conductive adhesive layer electrically connected to a terminal electrode, and a composition having a viscosity of 100 Pa · s or less and a thixotropy index of 1.1 or less are cured to fill the gap between the semiconductor device and the substrate, And a sealing layer for mechanically bonding the semiconductor device, wherein the sealing material mainly comprises a resin binder and a filler, and the resin binder comprises polyepoxide, an acid anhydride and a rheology modifier There is known a mounting body which is an essential component (see, for example, Patent Document 1). According to the mounting body which concerns on patent document 1, the fluidity | liquidity of the sealing material used for flip chip mounting using a conductive adhesive agent can be improved, and the mounting body of a semiconductor device with high reliability and productivity can be implement | achieved.
特開平9-64103号公報Japanese Patent Application Laid-Open No. 9-64103
 しかし、特許文献1に記載されている実装体においては、樹脂バインダーと充填剤とを用いて封止材を構成し、かつ、樹脂バインダーとしてポリエポキシドと酸無水物とレオロジー改質剤とを必須成分としているので封止材が硬い。その結果、特許文献1に記載されている実装体に外力が加わった場合、例えば、基板を屈曲させる外力が加わった場合、封止材の損傷や、半導体装置と導電性接着剤との電気的接続の切断等の不具合が生じる場合がある。 However, in the mounting body described in Patent Document 1, a sealing material is formed using a resin binder and a filler, and polyepoxide, an acid anhydride and a rheology modifier as essential components are used as a resin binder. Because the sealing material is hard. As a result, when an external force is applied to the mounting body described in Patent Document 1, for example, when an external force that bends the substrate is applied, damage to the sealing material or electrical connection between the semiconductor device and the conductive adhesive Problems such as disconnection may occur.
 したがって、本発明の目的は、基板を屈曲させるような外力が加わった場合でも、素子と当該素子に電気的に接続している導電部材との電気的接続の信頼性を確保できる実装体を提供することを目的とする。 Therefore, an object of the present invention is to provide a mounting body capable of ensuring the reliability of the electrical connection between the element and the conductive member electrically connected to the element even when an external force is applied to bend the substrate. The purpose is to
 本発明は、上記目的を達成するため、絶縁基材と、導電部材を介して絶縁基材に搭載される素子と、導電部材の側面及び素子の側面の少なくとも一部であって、導電部材と素子との境界の少なくとも一部を被覆し、絶縁基材の表面に接して設けられ、弾性率が0.1MPa以上500MPa以下である被覆部とを備える実装体が提供される。 In order to achieve the above object, the present invention provides an insulating substrate, an element mounted on the insulating substrate through the conductive member, at least a part of the side surface of the conductive member and the side surface of the element, There is provided a mounting body including at least a part of the boundary with the element and provided in contact with the surface of the insulating substrate and having a modulus of elasticity of 0.1 MPa or more and 500 MPa or less.
 上記実装体において、絶縁基材が、可撓性を有し、被覆部が、外力に応じて変形することが好ましい。 In the above-mentioned mounting body, it is preferable that the insulating base material has flexibility, and the covering portion is deformed in response to an external force.
 上記実装体において、絶縁基材が、フレキシブル基板であり、導電部材が、低温硬化型導電性ペーストであることが好ましい。 In the mounted body described above, it is preferable that the insulating base is a flexible substrate and the conductive member is a low temperature curing conductive paste.
 上記実装体において、被覆部が、硬化性組成物を用いて構成され、硬化性組成物が、硬化前において10Pa・s以上100Pa・s以下の粘度を有することが好ましい。 In the mounting body, it is preferable that the covering portion be configured using a curable composition, and the curable composition has a viscosity of 10 Pa · s or more and 100 Pa · s or less before curing.
 また、本発明は、上記目的を達成するため、上記いずれか1つに記載の実装体を備える電子機器が提供される。 Furthermore, in order to achieve the above object, the present invention provides an electronic device including the mounting body according to any one of the above.
 また、本発明は、上記目的を達成するため、絶縁基材と、導電部材を介して絶縁基材に搭載される素子と、導電部材の側面及び素子の側面の少なくとも一部であって、導電部材と素子との境界を含む領域の少なくとも一部を被覆し、絶縁基材の表面に接して設けられる被覆部とを備える実装体の被覆部用の硬化性組成物であって、硬化性組成物の硬化後の弾性率が、0.1MPa以上500MPa以下である実装体の被覆部用の硬化性組成物が提供される。 Furthermore, in order to achieve the above object, the present invention provides an insulating base, an element mounted on the insulating base via a conductive member, at least a part of a side surface of the conductive member and a side surface of the element A curable composition for a covering portion of a mounting body, comprising: a covering portion covering at least a part of a region including a boundary between a member and an element and being provided in contact with a surface of an insulating substrate, the curable composition The curable composition for the coating | coated part of the mounting body whose elastic modulus after hardening of a thing is 0.1 Mpa or more and 500 Mpa or less is provided.
 本発明に係る実装体によれば、基板を屈曲させるような外力が加わった場合でも、素子と当該素子に電気的に接続している導電部材との電気的接続の信頼性を確保できる実装体を提供できる。 According to the mounting body of the present invention, the mounting body can ensure the reliability of the electrical connection between the element and the conductive member electrically connected to the element even when an external force that bends the substrate is applied. Can provide
本発明の実施の形態に係る実装体の断面の概要図である。It is a schematic diagram of a section of a mounting object concerning an embodiment of the invention. 試験片の概要図である。It is a schematic diagram of a test piece. 試験方法の概要図である。It is a schematic diagram of a test method. 抵抗変化を示すグラフである。It is a graph which shows resistance change.
<実装体の概要>
 絶縁基材にハンダを用いて半導体素子等の素子を搭載する場合、絶縁基材の表面にハンダを設け、当該ハンダ上に素子を載置し、加熱硬化(リフロー工程)させる。すると、素子とハンダとの接触部分において溶融したハンダが広がり(フィレットが形成され)、素子とハンダとを接触させた部分が接着するだけでなく、素子の側面の一部がハンダに接着した状態になる。その結果、素子と絶縁基材とは強固に接着される。
<Summary of implementation>
When an element such as a semiconductor element is mounted on the insulating base using solder, the solder is provided on the surface of the insulating base, the element is mounted on the solder, and heat curing (reflow process) is performed. Then, the melted solder spreads (fillet is formed) at the contact portion between the element and the solder, and not only the portion where the element and the solder are in contact adheres, but also a part of the side of the element adheres to the solder become. As a result, the element and the insulating base are firmly bonded.
 一方、例えば、絶縁基材として可撓性を有する基材やフレキシブル基板を用いる場合、高温でのリフロー工程を要するハンダを用いることができないため、低温硬化型導電性ペーストを導電部材として用いる。そして、絶縁基材に低温硬化型導電性ペースト等の導電部材を用いて素子を搭載する場合、ハンダと異なりフィレットが形成されない。そのため、素子とハンダとを接触させた部分だけが接着し、素子の側面が低温硬化型導電性ペーストと接着することは実質的にない。その結果、絶縁基材に、絶縁基材が屈曲するような外力を加えると、素子と低温硬化型導電性ペーストとの接着領域の一部が剥がれることがあり、そのため、電気的接続性が悪化する場合がある。なお、本実施形態において「低温」とは、100℃程度以下の温度を指すものとする。 On the other hand, for example, in the case of using a flexible base or flexible substrate as the insulating base, since a solder requiring a reflow process at high temperature can not be used, a low temperature curing conductive paste is used as the conductive member. And when mounting an element using electrically-conductive members, such as a low-temperature-hardening-type electrically conductive paste, to an insulation base material, unlike solder, a fillet is not formed. Therefore, only the portion where the element and the solder are in contact adheres, and the side surface of the element does not substantially adhere to the low temperature curing conductive paste. As a result, when an external force that causes the insulating substrate to bend is applied to the insulating substrate, a part of the adhesion region between the element and the low-temperature curing conductive paste may be peeled off, which deteriorates the electrical connectivity. May. In the present embodiment, “low temperature” refers to a temperature of about 100 ° C. or less.
 そこで、本発明者は、伸縮や屈曲しやすい材料からなる基材、すなわち、可撓性を有する基材を用いた場合や低温硬化型の導電性接着剤を用いた場合であっても、素子と導電部材との電気的接続性の信頼性を維持する観点から種々検討したところ、導電部材の側面及び素子の側面の少なくとも一部であり、導電部材と素子との境界の少なくとも一部を所定の弾性率を有する硬化性組成物(接着性樹脂)で被覆し、かつ、この接着性樹脂を絶縁基材の表面にも接触させることで、基材を伸縮、及び/又は屈曲させたとしても、素子と導電部材との電気的接続性を良好に保つことができることを見出した。 Therefore, the inventor has found that the element is a device that uses a base material made of a material that is easily stretched or bent, that is, when using a base material having flexibility or using a low temperature curing type conductive adhesive. From the viewpoint of maintaining the reliability of the electrical connection between the conductive member and the conductive member, at least a portion of the side surface of the conductive member and the side surface of the element, and at least a portion of the boundary between the conductive member and the element Even if the base material is stretched and / or bent by covering it with a curable composition (adhesive resin) having an elastic modulus of, and bringing the adhesive resin into contact also with the surface of the insulating base material It has been found that the electrical connectivity between the element and the conductive member can be kept good.
 すなわち、本発明の実施形態に係る実装体は、絶縁基材と、導電部材を介して絶縁基材に搭載される素子と、導電部材の側面及び素子の側面の少なくとも一部であって、導電部材と素子との境界(すなわち、「境界を含む領域」、若しくは「境界端部」)の少なくとも一部を被覆し、絶縁基材の表面に接して設けられ、絶縁基材の伸縮及び/又は屈曲に応じてその形状が変形し得る弾性率を有する被覆部とを備える。被覆部は、接着性樹脂を用いて形成される。ここで、弾性率は、例えば、周波数1Hzでの動的粘弾性測定における貯蔵弾性率である。 That is, the mounting body according to the embodiment of the present invention is at least a part of the insulating base, the element mounted on the insulating base via the conductive member, the side surface of the conductive member, and the side of the element At least a part of the boundary between the member and the element (that is, the "region including the boundary" or "the boundary end") is covered, provided in contact with the surface of the insulating substrate, and the expansion and / or contraction of the insulating substrate And a covering portion having an elastic modulus that can deform its shape in response to bending. The covering portion is formed using an adhesive resin. Here, the elastic modulus is, for example, a storage elastic modulus in dynamic viscoelasticity measurement at a frequency of 1 Hz.
<実装体の詳細>
 図1は、本発明の実施の形態に係る実装体の断面の概要を示す。具体的に、図1(a)は、本実施形態に係る実装体1の断面の概要を示し、図1(b)及び(c)はそれぞれ、実装体の変形例の断面の概要を示す。なお、図1は概要図であり、各構成の寸法及び寸法の比率は図示通りであるとは限らない。
<Detail of implementation>
FIG. 1 shows an outline of a cross section of a mounting body according to an embodiment of the present invention. Specifically, FIG. 1A shows an outline of a cross section of the mounting body 1 according to the present embodiment, and FIGS. 1B and 1C show an outline of a cross section of a modified example of the mounting body, respectively. Note that FIG. 1 is a schematic view, and the dimensions of the components and the ratio of the dimensions are not necessarily as illustrated.
 図1(a)に示すように、実装体1は、絶縁基材10と、絶縁基材10の表面10aに導電部材30を介して搭載される素子20と、素子20と導電部材30との接触部分に生じる境界50の端部の少なくとも一部を被覆すると共に、素子20の側面22a(及び/又は後述する電極22の側面)の少なくとも一部及び導電部材30の側面30aの少なくとも一部を含む領域を被覆し、絶縁基材10の表面10aの一部に接着する被覆部40とを備える。 As shown in FIG. 1A, the mounting body 1 includes an insulating base 10, an element 20 mounted on the surface 10 a of the insulating base 10 via a conductive member 30, an element 20 and a conductive member 30. Covering at least a part of the end of the boundary 50 generated in the contact part, at least a part of the side 22a of the element 20 (and / or the side of the electrode 22 described later) and at least a part of the side 30a of the conductive member 30 And a covering portion 40 for covering the area including the portion and adhering to a portion of the surface 10 a of the insulating substrate 10.
 なお、図1(b)の変形例に係る実装体1aにおいては、被覆部42が素子20の側面及び導電部材30の側面の略全面を被覆する点を除き、実装体1と略同一の構成及び機能を備える。また、図1(c)の他の変形例に係る実装体1bにおいては、被覆部44が素子20の側面及び上面、並びに導電部材30の側面の略全面を被覆する点を除き、実装体1と略同一の構成及び機能を備える。したがって、実装体1a及び実装体1bについては、実装体1との相違点を除き、詳細な説明は省略する。 In the mounting body 1a according to the modification of FIG. 1 (b), substantially the same configuration as the mounting body 1 except that the covering portion 42 covers substantially the entire side surface of the element 20 and the side surface of the conductive member 30. And features. Further, in a mounting body 1b according to another modification of FIG. 1 (c), the mounting body 1 except that the covering portion 44 covers substantially the entire side surface and upper surface of the element 20 and the side surface of the conductive member 30. Substantially the same configuration and function as Therefore, about the mounting body 1a and the mounting body 1b, detailed description is abbreviate | omitted except the difference with the mounting body 1. FIG.
[絶縁基材10、素子20]
 絶縁基材10は、絶縁性を有する基材(絶縁基材)である。絶縁基材10を構成する材料としてはポリエチレンテレフタレート(PET)、ポチエチレンナフタレート(PEN)、ポリメタクリル酸メチル(PMMA)、ポリイミド、ポリプロピレン(PP)、ポリウレタン、各種ゴム等様々な材料を用いることができる。また、絶縁基材10は、可撓性を有することもでき、フレキシブル基板であってもよい。伸縮や屈曲等させることができる観点からは、絶縁基材10は、可撓性を有する材料から形成されることが好ましく、フレキシブル基板であることも好ましい。なお、ポリイミドを用いて形成される絶縁基材10は耐熱性があるので、導電部材30としてハンダを用いることができる。一方、PET等を用いて形成される絶縁基材10においては、ハンダを導電部材30として用いると実装段階(リフロー工程等)において絶縁基材10が損傷するので、導電部材30としてハンダを用いることはできず、低温硬化型導電性ペーストを用いることになる。
[Insulating base 10, Element 20]
The insulating substrate 10 is a substrate (insulating substrate) having an insulating property. Use various materials such as polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polymethyl methacrylate (PMMA), polyimide, polypropylene (PP), polyurethane, various rubbers, etc., as the material constituting the insulating substrate 10 Can. In addition, the insulating base 10 may have flexibility or may be a flexible substrate. From the viewpoint of expansion and contraction, bending, and the like, the insulating base 10 is preferably formed of a flexible material, and is preferably a flexible substrate. In addition, since the insulation base material 10 formed using polyimide has heat resistance, solder can be used as the conductive member 30. On the other hand, in the insulating base material 10 formed using PET etc., if the solder is used as the conductive member 30, the insulating base material 10 is damaged in the mounting step (reflow process etc.). It is not possible to use a low temperature curing type conductive paste.
 素子20としては、半導体素子(発光ダイオードやレーザーダイオード等の発光素子、受光素子、太陽電池、その他センサー類等を含む)、チップ部品、ディスクリート部品等の電子部品が挙げられる。また、絶縁基材10上には、1つ以上の素子20を搭載することもできる。そして素子20は、例えば、端部に電極22を有して構成される(例えば、一方の電極22が正極用の電極であり、他方の電極22が負極用の電極である。)。電極22と導電部材30とが接着することで双方が電気的に接続し、絶縁基材10に素子20が接着され、固定される。よって、境界50は、素子20の電極22と導電部材30との接触部分にも生じる。なお、絶縁基材10の表面10aには、所定の導電パターンが予め設けられている(図1では図示を省略している。)。導電パターン上の一部に、導電部材30は電気的に接続している。 Examples of the element 20 include electronic elements such as semiconductor elements (including light emitting elements such as light emitting diodes and laser diodes, light receiving elements, solar cells, other sensors, and the like), chip parts, discrete parts and the like. Also, one or more elements 20 can be mounted on the insulating base 10. The element 20 has, for example, an electrode 22 at its end (for example, one electrode 22 is an electrode for the positive electrode, and the other electrode 22 is an electrode for the negative electrode). By bonding the electrode 22 and the conductive member 30, both are electrically connected, and the element 20 is bonded and fixed to the insulating base 10. Thus, the boundary 50 is also generated at the contact portion between the electrode 22 of the element 20 and the conductive member 30. In addition, the predetermined | prescribed electroconductive pattern is previously provided in the surface 10a of the insulation base material 10 (illustration is abbreviate | omitted in FIG. 1). The conductive member 30 is electrically connected to a part of the conductive pattern.
[導電部材30]
 導電部材30は、導電性を有する硬化性組成物であり、低温硬化型導電性ペーストであることが好ましい。低温硬化型導電性ペーストの材質としては、低温(100℃程度以下)で硬化する化合物であることが好ましく、様々な化合物を用いることができ、可撓性を有する化合物であることがより好ましい。そして、導電部材30は、実装体1に伸縮や屈曲等の変形が加えられた場合であっても素子20との電気的接続性の信頼性を保持する観点から、1Hzでの動的粘弾性測定において23℃における貯蔵弾性率が0.1MPaから100MPaの弾性率を有することが好ましい。
[Conductive member 30]
The conductive member 30 is a curable composition having conductivity, and is preferably a low temperature curable conductive paste. The material of the low temperature curing type conductive paste is preferably a compound which cures at a low temperature (about 100 ° C. or less), various compounds can be used, and a compound having flexibility is more preferable. The conductive member 30 has a dynamic viscoelasticity at 1 Hz from the viewpoint of maintaining the reliability of the electrical connectivity with the element 20 even when deformation such as expansion or contraction or bending is applied to the mounting body 1. The storage elastic modulus at 23 ° C. in measurement preferably has an elastic modulus of 0.1 MPa to 100 MPa.
 例えば、導電部材30の材質としては、エポキシ系の化合物、SBR、NBR、IR、BR、CR等のゴム系化合物、アクリル系化合物、ポリエステル系化合物、ポリアミド系化合物、ポリエーテル系化合物、ポリウレタン系化合物、ポリイミド系化合物、シリコーン系化合物等を用いることができる。導電部材30に含有される導電性物質としては、各種の導電材料を用いることができる。導電材料としては、例えば、銀、金、パラジウム等の貴金属粉、ニッケル、銅等の卑金属粉、銀パラジウム等の合金粉、銀めっき銅粉等のような複合粉、更にカーボン等の導電性を有する非金属粉等を用いることができる。これらの導電材料は単独でも2種以上を混合してもよい。また、これら導電材料の粒径、及び形状は特に限定されない。 For example, as a material of the conductive member 30, epoxy compounds, rubber compounds such as SBR, NBR, IR, BR, CR, etc., acrylic compounds, polyester compounds, polyamide compounds, polyether compounds, polyurethane compounds Polyimide compounds, silicone compounds and the like can be used. As the conductive material contained in the conductive member 30, various conductive materials can be used. Examples of conductive materials include noble metal powders such as silver, gold and palladium, base metal powders such as nickel and copper, alloy powders such as silver palladium, composite powders such as silver-plated copper powder, and carbon, etc. Non-metal powder etc. which it has can be used. These conductive materials may be used alone or in combination of two or more. In addition, the particle size and shape of these conductive materials are not particularly limited.
 なお、導電性を有する硬化性組成物は、(A)1Hzでの動的粘弾性測定において23℃における貯蔵弾性率が0.1MPaから100MPaの範囲にあるエラストマー成分と、(B)導電性フィラーとを含み、(B)導電性フィラーが、全含有量の50質量%以上85質量%以下である導電性硬化性組成物であってもよい。また、硬化物の柔軟性を確保する観点から、(B)導電性フィラーが、全含有量の50質量%以上85質量%以下であると共に、(B)導電性フィラーは、(b1)第一の銀粉及び銀メッキ粉と、(b2)第二の銀粉及び銀メッキ粉とを含んでいてもよい。更に、より良好な硬化物の柔軟性を確保する観点から、(b1)第一の銀粉及び銀メッキ粉のタップ密度が2.5g/cm以上6.0g/cm以下であり、(b2)第二の銀粉及び銀メッキ粉のタップ密度が1.0g/cm以上3.0g/cm以下であり、(b1)と(b2)の混合割合[(b1)/(b2)]が質量比で1/10以上10/1以下であってもよい。また、導電性硬化性組成物は、所定の表面処理剤により疎水化処理が施された(C)シリカを含むこともできる。 The curable composition having conductivity has (A) an elastomer component having a storage elastic modulus at 23 ° C. in the range of 0.1 MPa to 100 MPa in dynamic viscoelasticity measurement at 1 Hz, and (B) a conductive filler. And the (B) conductive filler may be 50% by mass or more and 85% by mass or less of the total content. Further, from the viewpoint of securing the flexibility of the cured product, (B) the conductive filler is 50% by mass or more and 85% by mass or less of the total content, and (B) the conductive filler is (b1) first And silver-plated powder, and (b2) a second silver powder and silver-plated powder. Furthermore, from the viewpoint of securing a better flexibility of the cured product, the tap density of (b1) the first silver powder and the silver-plated powder is 2.5 g / cm 3 or more and 6.0 g / cm 3 or less, (b2 ) The tap density of the second silver powder and silver-plated powder is 1.0 g / cm 3 or more and 3.0 g / cm 3 or less, and the mixing ratio of (b1) to (b2) [(b1) / (b2)] is It may be 1/10 or more and 10/1 or less in mass ratio. The conductive curable composition can also include (C) silica that has been subjected to a hydrophobization treatment with a predetermined surface treatment agent.
((A)1Hzでの動的粘弾性測定において23℃における貯蔵弾性率が0.1MPaから100MPaの範囲にあるエラストマー成分)
 (A)エラストマー成分は、1Hzでの動的粘弾性測定において、23℃における貯蔵弾性率が0.1MPaから100MPaの範囲にあるエラストマー成分である。1Hzでの動的粘弾性測定において23℃における貯蔵弾性率が0.1MPaから100MPaの範囲にあることで、柔軟で伸縮性に優れる硬化物が得られる。更に、1Hzでの動的粘弾性測定において23℃における貯蔵弾性率が0.1MPaから50MPaの範囲にあることで、硬化物の伸縮時に破断が生じ難くなるため特に好ましい。
((A) Elastomer component whose storage elastic modulus at 23 ° C. is in the range of 0.1 MPa to 100 MPa in dynamic viscoelasticity measurement at 1 Hz)
The (A) elastomer component is an elastomer component having a storage elastic modulus at 23 ° C. in the range of 0.1 MPa to 100 MPa in dynamic viscoelasticity measurement at 1 Hz. When the storage elastic modulus at 23 ° C. is in the range of 0.1 MPa to 100 MPa in the dynamic viscoelasticity measurement at 1 Hz, a cured product which is flexible and excellent in stretchability can be obtained. Furthermore, when the storage elastic modulus at 23 ° C. in the dynamic viscoelasticity measurement at 1 Hz is in the range of 0.1 MPa to 50 MPa, it is particularly preferable because breakage hardly occurs during expansion and contraction of the cured product.
 (A)エラストマー成分の動的粘弾性測定は、例えば、以下の手段で測定できる。 The dynamic viscoelasticity measurement of the (A) elastomer component can be measured, for example, by the following means.
 導電性硬化性組成物が水分散体である場合は、ろ過により(B)導電性フィラーや(C)シリカ等の固形成分を除去し、次いで、100℃以下の加熱によって分散媒を蒸発させることで得られる硬化物について動的粘弾性を測定できる。また、導電性硬化性組成物が有機系の溶媒(希釈剤)に分散している場合は、ろ過により(B)導電性フィラーや(C)シリカ等の固形成分を除去し、次いで、150℃以下の加熱によって分散媒を蒸発させることで得られる硬化物について動的粘弾性を測定できる。 When the conductive curable composition is a water dispersion, remove solid components such as (B) conductive filler and (C) silica by filtration, and then evaporate the dispersion medium by heating at 100 ° C. or less. Dynamic viscoelasticity can be measured for the cured product obtained in When the conductive curable composition is dispersed in an organic solvent (diluent), the solid component such as (B) conductive filler or (C) silica is removed by filtration, and then 150 ° C. Dynamic viscoelasticity can be measured for the cured product obtained by evaporating the dispersion medium by the following heating.
 導電性硬化性組成物に変成シリコーン系樹脂やウレタン系樹脂等の常温で液状の樹脂を用いている場合には、ろ過により(B)導電性フィラーや(C)シリカ等の固形成分を除去することで(A)エラストマー成分を抽出し、必要に応じて硬化触媒を添加して硬化させ、得られる硬化物について動的粘弾性を測定することもできる。 When a resin that is liquid at normal temperature, such as a modified silicone resin or urethane resin, is used as the conductive curable composition, solid components such as (B) conductive filler and (C) silica are removed by filtration. It is also possible to extract the elastomer component (A), add a curing catalyst as needed, and cure it, and measure the dynamic viscoelasticity of the resulting cured product.
 導電性硬化性組成物の硬化物については、硬化物が溶解する溶媒に硬化物を浸漬し振盪して、(B)導電性フィラーや(C)シリカ等の固形成分を除去して(A)エラストマー成分を抽出し、次いで、150℃以下の加熱によって溶媒を除去して得られる硬化物について動的粘弾性を測定できる。 With respect to the cured product of the conductive curable composition, the cured product is immersed in a solvent in which the cured product dissolves and shaken to remove solid components such as (B) conductive filler and (C) silica, and (A) Dynamic viscoelasticity can be measured on a cured product obtained by extracting the elastomer component and then removing the solvent by heating at 150 ° C. or less.
 1Hzでの動的粘弾性測定において23℃における貯蔵弾性率が0.1MPaから100MPaの範囲にあるエラストマー成分としては、従来公知の樹脂やゴムを用いることができ、例えば、熱可塑性樹脂や熱硬化性樹脂、架橋ゴム、加硫ゴムから形成される素材が挙げられる。そのような樹脂としては、例えば、ビニル樹脂やアクリル系樹脂、ブタジエン系樹脂、シリコーン系樹脂、ポリウレタン系樹脂、変成シリコーン系樹脂等が挙げられる。また、上記樹脂を水分散体として用いても良い。 As an elastomer component having a storage elastic modulus at 23 ° C. in the range of 0.1 MPa to 100 MPa in dynamic viscoelasticity measurement at 1 Hz, conventionally known resins and rubbers can be used. For example, thermoplastic resins and thermosetting resins Materials formed from water soluble resins, crosslinked rubbers, and vulcanized rubbers. Examples of such resin include vinyl resin, acrylic resin, butadiene resin, silicone resin, polyurethane resin, modified silicone resin, and the like. Further, the above resin may be used as a water dispersion.
 例えば、ビニル樹脂としては、酢酸ビニルポリマー樹脂、塩化ビニル・酢酸ビニルコポリマー樹脂、塩化ビニル・酢酸ビニル・マレイン酸ターポリマー樹脂、又はこれらの組合せが挙げられる。 For example, vinyl resins include vinyl acetate polymer resins, vinyl chloride / vinyl acetate copolymer resins, vinyl chloride / vinyl acetate / maleic acid terpolymer resins, or combinations thereof.
 また、アクリル系樹脂としてのアクリルエラストマーとしては、例えば、ポリブチル(メタ)アクリレート、ポリ2-エチルヘキシルエチル(メタ)アクリレート、ポリ2-ヒドロキシエチル(メタ)アクリレート等のガラス転移温度(T)が比較的低い樹脂、又はこれらの組合せが挙げられる。また、これらの骨格に加え、ポリメチル(メタ)アクリレートを含むブロック共重合体は、柔軟性を維持しながらも伸び物性や接着性を確保できる観点から好ましい。 Moreover, as an acrylic elastomer as an acrylic resin, for example, glass transition temperatures (T g ) of polybutyl (meth) acrylate, poly 2-ethylhexylethyl (meth) acrylate, poly 2-hydroxyethyl (meth) acrylate, etc. are compared. Resins, or combinations thereof. In addition to these skeletons, block copolymers containing polymethyl (meth) acrylate are preferable from the viewpoint of securing elongation physical properties and adhesiveness while maintaining flexibility.
 ブロック共重合体は、様々なブロック共重合体を用いることができる。例えば、リビング重合法により製造されるアクリル系のトリブロック共重合体を用いることができる。具体的に、ポリメチルメタクリレート-ポリブタジエン-ポリスチレン共重合体、ポリメチルメタアクリレート-ポリブチルアクリレート-ポリメチルメタアクリレート共重合体、これらの共重合体にカルボン酸変性処理若しくは親水基変性処理を施した共重合体、ポリメチルメタクリレート-ポリブチルアクリレート共重合体、及びポリメチルメタクリレート-ポリブチルアクリレート-ポリメチルメタクリレート共重合体等のブロック共重合体を用いることができる。 As the block copolymer, various block copolymers can be used. For example, an acrylic triblock copolymer produced by a living polymerization method can be used. Specifically, polymethyl methacrylate-polybutadiene-polystyrene copolymer, polymethyl methacrylate-polybutyl acrylate-polymethyl methacrylate copolymer, these copolymers were subjected to carboxylic acid modification treatment or hydrophilic group modification treatment Block copolymers such as copolymers, polymethyl methacrylate-polybutyl acrylate copolymers, and polymethyl methacrylate-polybutyl acrylate-polymethyl methacrylate copolymers can be used.
 ブタジエン系樹脂としては、例えば、SB(スチレン-ブタジエン)樹脂、SBS(スチレン-ブタジエン-スチレン)樹脂、SEBS樹脂(スチレン-エチレン/ブチレン-スチレン)、SIS(スチレン-イソプレン-スチレン)樹脂、SIBS(スチレン-イソプレン/ブタジエン-スチレン)樹脂、SEPS(スチレン-エチレン/プロピレン-スチレン)樹脂等、又はこれらの組合せが挙げられる。 Examples of the butadiene-based resin include SB (styrene-butadiene) resin, SBS (styrene-butadiene-styrene) resin, SEBS resin (styrene-ethylene / butylene-styrene), SIS (styrene-isoprene-styrene) resin, SIBS (SIBS) Styrene-isoprene / butadiene-styrene) resins, SEPS (styrene-ethylene / propylene-styrene) resins, etc., or combinations thereof.
 変成シリコーン系樹脂としては、架橋性ケイ素基含有有機重合体であれば従来公知のものを用いることができる。架橋性ケイ素基含有有機重合体の架橋性ケイ素基は、ケイ素原子に結合した水酸基又は加水分解性基を有し、シロキサン結合を形成することにより架橋し得る基である。 As the modified silicone resin, conventionally known crosslinkable silicon group-containing organic polymers can be used. The crosslinkable silicon group of the crosslinkable silicon group-containing organic polymer is a group which has a hydroxyl group or a hydrolyzable group bonded to a silicon atom and can be crosslinked by forming a siloxane bond.
((B)導電性フィラー)
 導電性フィラーは、電気導電性を有する材料を用いて形成される。導電性フィラーとしては、例えば、銀粉、銅粉、ニッケル粉、アルミ粉、及びこれらの銀メッキ粉や、銀コートガラス、銀コートシリカ、銀コートプラスチック等の金属粉;酸化亜鉛、酸化チタン、ITO、ATO、カーボンブラック等が挙げられる。体積抵抗率を低下させる観点から、導電性フィラーは、銀粉又は銀メッキ粉が好ましく、導電性の信頼性及びコストの観点から、銀粉及び銀メッキ粉を併用することがより好ましい。
((B) conductive filler)
The conductive filler is formed using a material having electrical conductivity. As the conductive filler, for example, silver powder, copper powder, nickel powder, aluminum powder, and silver plated powder thereof, metal powder such as silver coated glass, silver coated silica, silver coated plastic, etc .; zinc oxide, titanium oxide, ITO , ATO, carbon black and the like. From the viewpoint of reducing the volume resistivity, the conductive filler is preferably silver powder or silver plating powder, and it is more preferable to use silver powder and silver plating powder in combination from the viewpoint of conductivity reliability and cost.
 (B)導電性フィラーの形状としては、種々の形状(例えば、粒状、球形状、楕円、円筒形、フレーク状、平板状、又は粒塊等)を採用できる。導電性フィラーは、やや粗いか、又はぎざぎざの表面を有することもできる。導電性フィラーの粒子形状、大きさ、及び/又は硬度を組み合わせて導電性を有する硬化性組成物に用いることができる。また、導電性硬化性組成物の硬化物の導電性をより向上させることを目的として、(B)導電性フィラーの粒子形状、大きさ、及び/又は硬度が互いに異なる複数の導電性フィラーを組み合わせることもできる。なお、組み合わせる導電性フィラーは2種類に限られず、3種類以上であってもよい。これらのうち、フレーク状の導電性フィラーと、粒状等の導電性フィラーとを併用することが好ましい。 (B) As the shape of the conductive filler, various shapes (for example, granular, spherical, elliptical, cylindrical, flake, flat, or agglomerates) can be adopted. The conductive filler can also have a somewhat rough or jagged surface. The particle shape, size, and / or hardness of the conductive filler can be used in combination in the curable composition having conductivity. In addition, for the purpose of further improving the conductivity of the cured product of the conductive curable composition, a plurality of conductive fillers having different particle shapes, sizes, and / or hardness of (B) conductive filler are combined. It can also be done. In addition, the conductive filler to be combined is not limited to two types, and may be three or more types. Among them, it is preferable to use a flaky conductive filler and a particulate conductive filler in combination.
 ここで、フレーク状とは、扁平状、薄片状、若しくは鱗片状等の形状を含み、球状や塊状等の立体形状の銀粉を一方向に押し潰した形状を含む。また、粒状とは、フレーク状を有さない全ての導電性フィラーの形状を意味する。例えば、粒状としては、ブドウの房状に粉体が凝集した形状、球状、略球状、塊状、樹枝状、またこれらの形状を有する銀粉の混合物等が挙げられる。 Here, the flake shape includes a flat shape, a flaky shape, or a scaly shape, and includes a shape obtained by crushing silver powder having a three-dimensional shape such as a spherical shape or a massive shape in one direction. Moreover, a granular form means the shape of all the electroconductive fillers which do not have flake shape. For example, as the granular form, there may be mentioned a shape in which powder is aggregated into a bunch of grapes, a spherical shape, a substantially spherical shape, a massive shape, a dendritic shape, or a mixture of silver powder having these shapes.
 また、(B)導電性フィラーとして銀粉及び銀メッキ粉を用いる場合、この導電性フィラーは様々な方法により製造できる。例えば、フレーク状の銀粉を導電性フィラーとして用いる場合、球状銀粉、塊状銀粉、及び/又は粒状銀粉等の銀粉をジェットミル、ロールミル若しくはボールミル等の装置を用いて機械的に粉砕等することで製造できる。また、粒状の銀粉を導電性フィラーとして用いる場合、電解法、粉砕法、熱処理法、アトマイズ法、又は還元法等により製造できる。これらの中では、還元方法をコントロールすることによりタップ密度の小さい粉末が得やすいため、還元法が好ましい。 Moreover, when using silver powder and silver plating powder as (B) electroconductive filler, this electroconductive filler can be manufactured by various methods. For example, when flake-like silver powder is used as a conductive filler, it is manufactured by mechanically pulverizing silver powder such as spherical silver powder, massive silver powder, and / or granular silver powder using an apparatus such as a jet mill, roll mill or ball mill. it can. When granular silver powder is used as a conductive filler, it can be produced by an electrolytic method, a pulverizing method, a heat treatment method, an atomizing method, a reduction method or the like. Among these, the reduction method is preferable because a powder with a low tap density can be easily obtained by controlling the reduction method.
 (B)導電性フィラーに用いられる銀粉及び銀メッキ粉は、公知の銀粉及び銀メッキ粉を広く用いることができる。また、銀粉及び銀メッキ粉は、それぞれ所定のタップ密度を有する(b1)第一の銀粉及び銀メッキ粉と(b2)第二の銀粉及び銀メッキ粉とを含むことが好ましい。(b1)と(b2)の混合割合[(b1)/(b2)]は、質量比で1/10以上10/1以下であり、1/4以上4/1以下が好ましく、3/2以上4/1以下がより好ましい。また、(b1)成分において、第一の銀粉と銀メッキ粉との混合割合は1/10以上10/1以下であり、(b2)成分において、第二の銀粉と銀メッキ粉との混合割合は1/10以上10/1以下である。 (B) As silver powder and silver plating powder used for a conductive filler, well-known silver powder and silver plating powder can be used widely. The silver powder and the silver-plated powder preferably include (b1) the first silver powder and the silver-plated powder and (b2) the second silver powder and the silver-plated powder each having a predetermined tap density. The mixing ratio [(b1) / (b2)] of (b1) and (b2) is 1/10 or more and 10/1 or less in mass ratio, preferably 1/4 or more and 4/1 or less, and 3/2 or more 4/1 or less is more preferable. Moreover, in the component (b1), the mixing ratio of the first silver powder and the silver plating powder is 1/10 or more and 10/1 or less, and in the component (b2), the mixing ratio of the second silver powder and the silver plating powder Is 1/10 or more and 10/1 or less.
 (b1)第一の銀粉及び銀メッキ粉のタップ密度は2.5g/cm以上6.0g/cm以下であり、3.0g/cm以上5.0g/cm以下が好ましい。また、(b1)第一の銀粉の50%平均粒径は、0.5μm以上15μm以下が好ましい。なお、(b1)第一の銀粉及び銀メッキ粉の形状は様々な形状であってよく、フレーク状、粒状等の種々の形状を用いることができる。中でも、フレーク状の銀粉及び銀メッキ粉が好ましい。 (B1) The tap density of the first silver powder and silver-plated powder is less than 2.5 g / cm 3 or more 6.0g / cm 3, 3.0g / cm 3 or more 5.0 g / cm 3 or less. Moreover, as for the 50-% average particle diameter of (b1) 1st silver powder, 0.5 micrometer or more and 15 micrometers or less are preferable. The shape of the (b1) first silver powder and the silver-plated powder may be various shapes, and various shapes such as flakes and particles can be used. Among them, flake-like silver powder and silver-plated powder are preferable.
 なお、銀粉及び銀メッキ粉のタップ密度は、JIS K5101-1991の20.2タップ法に準じた方法により測定できる。また、50%平均粒径は、レーザー回析散乱式粒度分布測定法により測定される体積累積50%における粒径である。 The tap density of silver powder and silver-plated powder can be measured by the method according to the 20.2 tap method of JIS K 5101-1991. Moreover, 50% average particle diameter is a particle diameter in 50% of the volume accumulation measured by laser diffraction scattering type particle size distribution measuring method.
 (b2)第二の銀粉及び銀メッキ粉のタップ密度は1.0g/cm以上3.0g/cm以下である。また、(b2)第二の銀粉及び銀メッキ粉の50%平均粒径は、0.5μm以上20μm以下が好ましい。なお、(b2)第二の銀粉及び銀メッキ粉の形状は様々な形状であってよく、フレーク状、粒状等の種々の形状を用いることができる。中でも、粒状の銀粉及び銀メッキ粉が好ましい。 (B2) The tap density of the second silver powder and the silver-plated powder is 1.0 g / cm 3 or more and 3.0 g / cm 3 or less. Moreover, as for the 50% average particle diameter of (b2) 2nd silver powder and silver plating powder, 0.5 micrometer or more and 20 micrometers or less are preferable. In addition, the shapes of (b2) 2nd silver powder and silver plating powder may be various shapes, and various shapes, such as flake shape and a granular form, can be used. Among them, granular silver powder and silver plated powder are preferable.
 (B)導電性フィラーの含有率は、導電性硬化性組成物の全含有量の50質量%以上85質量%以下であり、65質量%以上85質量%以下が好ましく、70質量%以上80質量%以下がより好ましい。十分な導電性を得る観点から、含有率は50質量%以上が好ましく、優れた導電性と共に接着性及び作業性を確保する観点から85質量%以下が好ましい。特に、接着性や作業性を確保する観点から、(b2)第二の銀粉及び銀メッキ粉の含有率が増加しすぎないようにすることが好ましい。 The content of the conductive filler (B) is 50% by mass to 85% by mass, preferably 65% by mass to 85% by mass, and preferably 70% by mass to 80% by mass of the total content of the conductive curable composition. % Or less is more preferable. From the viewpoint of obtaining sufficient conductivity, the content is preferably 50% by mass or more, and from the viewpoint of securing adhesiveness and workability together with excellent conductivity, it is preferably 85% by mass or less. In particular, from the viewpoint of securing adhesiveness and workability, it is preferable that the content of the (b2) second silver powder and the silver-plated powder is not excessively increased.
 (b1)成分、及び(b2)成分のタップ密度が上記の範囲内であることで、銀粉及び銀メッキ粉を多量に添加することなく、十分な導電性を発揮することができる。コスト抑制の観点からは、特に、(b1)成分と(b2)成分のうち、一方がフレーク状の銀粉及び/又は銀メッキ粉であり、もう一方が粒状の銀粉及び/又は銀メッキ粉を組み合わせて用いることが好ましい。 When the tap density of the components (b1) and (b2) is within the above range, sufficient conductivity can be exhibited without adding a large amount of silver powder and silver plating powder. From the viewpoint of cost control, in particular, one of the components (b1) and (b2) is a flake-like silver powder and / or a silver-plated powder, and the other is a combination of granular silver powder and / or a silver-plated powder. It is preferable to use it.
((C)シリカ)
 (A)成分及び(B)成分と共に(C)特定の表面処理剤により疎水化処理された疎水性シリカ及び親水性シリカからなる群から選択される1種以上のシリカを用いることにより、特に導電性の安定性に優れた導電性硬化性組成物を得ることができる。(C)シリカの粒径は特に制限はないが、シリカ微粉末が好ましく、平均粒径7nm以上16nm以下のシリカ微粉末がより好ましく、平均粒径7nm以上14nm以下のシリカ微粉末が最も好ましい。
((C) silica)
By using one or more types of silica selected from the group consisting of hydrophobic silica hydrophilized with a specific surface treatment agent (C) and hydrophilic silica together with component (A) and component (B), it becomes possible to conduct electricity in particular It is possible to obtain a conductive curable composition excellent in the stability of the properties. The particle size of (C) silica is not particularly limited, but fine silica powder is preferable, fine silica powder having an average particle size of 7 nm to 16 nm is more preferable, and fine silica powder having an average particle size of 7 nm to 14 nm is most preferable.
 親水性シリカとしては、公知の親水性シリカを広く用いることができ、中でも表面にシラノール基(Si-OH基)が存在するヒュームドシリカが好ましい。親水性シリカを用いることにより、粘度を上げずフロー性を確保しながらブリードを防止することができる。フロー性を有する導電性硬化性組成物は、フロー性を要求される用途、例えば、スクリーン印刷方式で基板へ塗布し、50μm程度の薄膜でパターンを作成する用途等への応用に適している。 Well-known hydrophilic silica can be widely used as hydrophilic silica, and fumed silica having a silanol group (Si-OH group) on the surface is preferable among them. By using hydrophilic silica, it is possible to prevent bleeding while securing flowability without increasing viscosity. The conductive curable composition having flowability is suitable for applications requiring flowability, for example, application to a substrate by screen printing and formation of a pattern with a thin film of about 50 μm.
 疎水性シリカとしては、ジメチルジクロロシラン、ヘキサメチルジシラザン、(メタ)アクリルシラン、オクチルシラン(例えば、トリメトキシオクチルシラン等)、及びアミノシランからなる群から選択される1種以上の表面処理剤により疎水化処理された疎水性シリカが用いられる。このような特定の表面処理剤により疎水化処理された疎水性シリカを用いることにより、吐出性や形状保持を確保しながらブリードを防止することができる。形状保持性を有する導電性硬化性組成物は、形状保持性を要求される用途、例えば、スクリーン印刷方式で基板へ塗布しパターンを作製する場合において、100μm以上の膜厚が要求される場合やハンダによる接続部分を導電性硬化性組成物で代替する用途等への応用に適している。 As hydrophobic silica, one or more surface treatment agents selected from the group consisting of dimethyldichlorosilane, hexamethyldisilazane, (meth) acrylsilane, octylsilane (eg, trimethoxyoctylsilane etc.), and aminosilane Hydrophobicized hydrophobic silica is used. By using hydrophobic silica hydrophobized with such a specific surface treatment agent, it is possible to prevent bleeding while ensuring dischargeability and shape retention. The conductive curable composition having a shape retention property is required to have a film thickness of 100 μm or more when the shape retention property is required, for example, in the case of forming a pattern by applying to a substrate by a screen printing method, The present invention is suitable for applications such as replacing the solder connection portion with a conductive curable composition.
 表面処理剤を用いたシリカの疎水化処理方法は公知の方法を選択可能であり、例えば、未処理のシリカに前述した表面処理剤を噴霧し、又は気化した表面処理剤を混合し、加熱処理する方法が挙げられる。なお、この疎水化は窒素雰囲気下の乾式で処理することが好ましい。 The hydrophobization treatment method of the silica using a surface treatment agent can select a well-known method, for example, the surface treatment agent mentioned above is sprayed on untreated silica, or the surface treatment agent which vaporized is mixed, and heat treatment is carried out. Methods are included. In addition, it is preferable to process this hydrophobization by the dry condition under nitrogen atmosphere.
 (C)成分の配合割合は特に制限はないが、(A)成分100質量部に対して3質量部以上20質量部以下用いることが好ましく、5質量部以上10質量部以下用いることがより好ましい。(C)シリカは、単独で用いることも、2種以上を併用することもできる。 Although the compounding ratio of (C) component does not have a restriction | limiting in particular, It is preferable to use 3 mass parts or more and 20 mass parts or less with respect to 100 mass parts of (A) component, and it is more preferable to use 5 mass parts or more and 10 mass parts or less . (C) Silica can be used alone or in combination of two or more.
(その他の添加剤)
 導電性硬化性組成物には、導電性硬化性組成物の導電性や硬化性等の機能を損なわない範囲で粘度や物性等を調整する観点から、必要に応じ、硬化触媒、充填剤、可塑剤、接着付与剤、安定剤、着色剤、物性調整剤、揺変剤、脱水剤(保存安定性改良剤)、粘着付与剤、垂れ防止剤、紫外線吸収剤、酸化防止剤、難燃剤、ラジカル重合開始剤等の物質やトルエンやアルコール等の各種溶剤を配合してもよい。また、相溶する他の重合体をブレンドしてもよい。
(Other additives)
In the conductive curable composition, from the viewpoint of adjusting the viscosity, physical properties, and the like within the range that does not impair the functions such as the conductivity and the curing property of the conductive curable composition, a curing catalyst, a filler, and a plastic as needed. Agent, adhesion promoter, stabilizer, coloring agent, physical property modifier, thixotropic agent, dehydrating agent (storage stability improving agent), tackifier, anti-sagging agent, ultraviolet absorber, antioxidant, flame retardant, radical A substance such as a polymerization initiator or various solvents such as toluene and alcohol may be blended. Also, other polymers compatible may be blended.
 導電性を有する硬化性組成物は、必要に応じて1液型とすることができ、また、2液型にすることもできる。導電性を有する硬化性組成物は、特に1液型として用いることに適している。また、導電性を有する硬化性組成物は、大気中の湿気により常温で硬化するので常温湿気硬化型導電性接着剤として用いることに適している。なお、導電性を有する硬化性組成物の効果において、必要に応じて、適宜、加熱(例えば、80℃~100℃程度の加熱)により硬化を促進させてもよい。 The curable composition having conductivity can be made into a one-component type as needed, and can also be made a two-component type. The curable composition having conductivity is particularly suitable for use as a one-component type. Moreover, since the curable composition which has electroconductivity is hardened | cured at normal temperature by the humidity in air | atmosphere, it is suitable to use as a normal temperature moisture hardening type conductive adhesive. In the effect of the curable composition having conductivity, curing may be promoted by heating (for example, heating at about 80 ° C. to 100 ° C.) as appropriate.
 導電性を有する硬化性組成物は、基材に塗布又は印刷して硬化させることにより、高い導電性を有し、ハンダの代わりに用いることができる。また、導電性を有する硬化性組成物は、半導体素子チップ部品、ディスクリート部品等の電子部品の接合や実装、回路接続、水晶振動子や圧電素子の接着・固定、パッケージのシーリング等の用途に用いることに適している。導電性を有する硬化性組成物を用いて、半導体素子、チップ部品、ディスクリート部品等の電子部品の1種又は2種以上を接合させた回路を、基板表面に形成させることもできる。 A conductive curable composition has high conductivity by being applied or printed on a substrate and cured, and can be used instead of solder. In addition, the curable composition having conductivity is used for bonding and mounting of electronic parts such as semiconductor element chip parts and discrete parts, circuit connection, bonding / fixing of crystal oscillators and piezoelectric elements, sealing of packages, etc. It is suitable for. It is also possible to form on the surface of the substrate a circuit in which one or more kinds of electronic components such as semiconductor elements, chip parts, discrete parts and the like are joined using a curable composition having conductivity.
 また、本実施形態に係る導電部材30を構成する導電性を有する硬化性組成物の硬化物は柔軟性を有しているので、絶縁基材10の表面に所定のパターンを有して設けられた場合において絶縁基材10に伸縮や屈曲等の変形が加えられても、当該変形に応じて自在に変形する。 Further, since the cured product of the conductive curable composition that constitutes the conductive member 30 according to the present embodiment has flexibility, it is provided on the surface of the insulating base 10 with a predetermined pattern. In this case, even if deformation such as expansion and contraction or bending is applied to the insulating base material 10, the insulating base material 10 is freely deformed according to the deformation.
[被覆部40]
 被覆部40は、素子20の側面の少なくとも一部、及び導電部材30の側面の少なくとも一部に接着すると共に、絶縁基材10の表面10aに接着して設けられる。被覆部40は、疑似的なフィレットとして機能する一方で導電性を有さない。したがって、被覆部40には、a)導電部材30との接着性が良好であること、b)導電部材30内に被覆部40を構成する材料が浸透しないこと(仮に浸透すると、導電部材30の抵抗値が増加する場合がある)、c)実装体1に伸縮や屈曲等の外力が加えられた場合であっても素子20と導電部材30との間の歪を軽減できること等の特性が要求される。
[Cover 40]
The covering portion 40 adheres to at least a part of the side surface of the element 20 and to at least a part of the side surface of the conductive member 30 and is adhered to the surface 10 a of the insulating substrate 10. The covering portion 40 functions as a pseudo fillet, but has no conductivity. Accordingly, a) the adhesion to the conductive member 30 is good, and b) the material constituting the cover 40 does not penetrate into the conductive member 30 (if it penetrates, the conductive member 30 The resistance value may increase) c) Characteristics such as being able to reduce distortion between the element 20 and the conductive member 30 even when an external force such as expansion or contraction or bending is applied to the mounting body 1 are required. Be done.
 被覆部40は、適切な柔軟性を確保して電気的接続性の信頼性を確保する観点から0.1MPa以上の弾性率を有し、弾性率は1MPa以上が好ましく、5MPa以上がより好ましい。また、被覆部40は、実装体1に外力が加わった場合に実装体1内に発生する歪を軽減し、耐久性(経時変化により導電性が低下する)を維持する観点から500MPa以下の弾性率を有し、弾性率は200MPa以下が好ましく、100MPa以下がより好ましい。被覆部40は、上記弾性率を有し、外力に応じて変形し得る。なお、弾性率は、周波数1Hzでの動的粘弾性測定における貯蔵弾性率である。 The covering portion 40 has an elastic modulus of 0.1 MPa or more from the viewpoint of securing appropriate flexibility and electric reliability, and the elastic modulus is preferably 1 MPa or more, more preferably 5 MPa or more. In addition, the covering portion 40 has an elasticity of 500 MPa or less from the viewpoint of reducing the strain generated in the mounting body 1 when an external force is applied to the mounting body 1 and maintaining the durability (the conductivity decreases with time). The modulus of elasticity is preferably 200 MPa or less, more preferably 100 MPa or less. The covering portion 40 has the above elastic modulus and can be deformed in response to an external force. The elastic modulus is a storage elastic modulus in dynamic viscoelasticity measurement at a frequency of 1 Hz.
 そして、被覆部40を構成する硬化性組成物(本実施形態において「接着性樹脂」という場合もある)としては、接着性、耐熱性、水分、酸素等に対するバリア性を考慮して、各種の化合物を用いることができる。例えば、被覆部40は、シリコーン樹脂、アクリル樹脂、メタアクリル樹脂等の他、各種の熱硬化性接着剤、光硬化性接着剤、又は2液混合硬化性接着剤等の硬化性接着剤等を用いて構成できる。なお、被覆部40を形成する前(つまり、硬化性組成物の硬化前)において、硬化性組成物は、絶縁基材10上に滴下した場合に必要以上に拡がらないようにする観点から、10Pa・s以上100Pa・s以下の粘度を有することが好ましい。また、被覆部40を形成する場合に、硬化性組成物を予めシート状に硬化させて利用してもよい。係るシート状の被覆部40は、公知の方法で適宜成形できる。 And as a curable composition (it may be called "adhesive resin" in this embodiment) which comprises the coating | coated part 40, the barrier property with respect to adhesiveness, heat resistance, a water | moisture content, oxygen, etc. is considered, and various Compounds can be used. For example, in addition to silicone resin, acrylic resin, and methacrylic resin, the covering unit 40 may be a curable adhesive such as various thermosetting adhesives, photocurable adhesives, or two-component mixed curable adhesives. It can be configured using. From the viewpoint of preventing the curable composition from spreading more than necessary when dropped onto the insulating substrate 10 before forming the covering portion 40 (that is, before curing the curable composition), It is preferable to have a viscosity of 10 Pa · s or more and 100 Pa · s or less. Moreover, when forming the coating | coated part 40, you may harden | cure a curable composition to a sheet form previously, and may utilize. The sheet-like covering portion 40 can be appropriately formed by a known method.
[実装体1の製造方法]
 実装体1は、一例として、以下の工程を経て製造できる。まず、表面10aに予め所定の導電パターンが設けられた絶縁基材10を準備する(絶縁基材準備工程)。次に、導電パターン上の素子20を搭載する領域であって素子20の電極22が配置されるべき位置に導電部材30を構成することになる導電性の硬化性組成物を塗布若しくは印刷する(印刷工程)。続いて、この導電性の硬化性組成物上に素子20を載置する(載置工程)。そして、常温(例えば、23℃)若しくは低温(例えば、100℃以下の温度)でこの硬化性組成物を硬化させる(硬化工程)。これにより、絶縁基材10上に素子20が固定される。
[Method of manufacturing mounting body 1]
The mounting body 1 can be manufactured, for example, through the following steps. First, the insulation base material 10 in which the predetermined | prescribed conductive pattern was previously provided in the surface 10a is prepared (insulation base material preparatory process). Next, a conductive curable composition that will constitute the conductive member 30 is applied or printed in a region on the conductive pattern where the device 20 is to be mounted and where the electrode 22 of the device 20 is to be disposed ( Printing process). Subsequently, the element 20 is placed on the conductive curable composition (placement step). Then, the curable composition is cured at a normal temperature (for example, 23 ° C.) or a low temperature (for example, a temperature of 100 ° C. or less) (curing step). Thereby, the element 20 is fixed on the insulating base 10.
 続いて、素子20の周囲の少なくとも一部の領域に被覆部40を構成することになる硬化性組成物を塗布し、常温若しくは低温でこの硬化性組成物を硬化させる。この場合において、この硬化性組成物の塗布量は、素子20と導電部材30との境界50が被覆されると共に、導電部材30の側面が被覆される量に調整される。これにより、被覆部40が形成される(被覆部形成工程)。以上の工程を経て、実装体1が製造される。 Then, the curable composition which will comprise the coating | coated part 40 is apply | coated to at least one part area | region of the circumference | surroundings of the element 20, and this curable composition is hardened at normal temperature or low temperature. In this case, the application amount of the curable composition is adjusted to an amount in which the boundary 50 between the element 20 and the conductive member 30 is covered and the side surface of the conductive member 30 is covered. Thereby, the covering part 40 is formed (covering part formation process). Through the above steps, the mounting body 1 is manufactured.
 なお、実装体1aにおいては、被覆部形成工程において、素子20の側面及び導電部材30の側面の略全部が被覆される量に硬化性組成物の塗布量が調整される。同様に、実装体1bにおいては、被覆部形成工程において、素子20の全体が被覆される量に硬化性組成物の塗布量が調整される。 In the mounting body 1a, the coating amount of the curable composition is adjusted to an amount such that substantially all of the side surface of the element 20 and the side surface of the conductive member 30 are covered in the covering portion forming step. Similarly, in the mounting body 1b, the amount of the curable composition applied is adjusted to an amount such that the entire element 20 is covered in the covering portion forming step.
 実装体1は、例えば、プリンテッドエレクトロニクスやウェアラブルデバイス、ロボット、可動域を有する機械を含む電子機器等、様々な電子機器に応用することができる。 The mounting body 1 can be applied to various electronic devices such as, for example, printed electronics, wearable devices, robots, electronic devices including machines having a movable range, and the like.
<実施の形態の効果>
 本実施形態に係る実装体1においては、所定の弾性率を有する被覆部40により素子20と導電部材30との境界50を含む領域が被覆されると共に、その被覆部40が絶縁基材10の表面10aにも接着している。そのため、絶縁基材10が屈曲した場合だけでなく伸縮した場合であっても、被覆部40が屈曲や伸縮により発生する応力を緩和するので、素子20と導電部材30との電気的接続性を維持することができる。その結果、実装体1によれば、素子20と導電部材30との電気的接続性の信頼性を維持することができる。
<Effect of the embodiment>
In the mounting body 1 according to the present embodiment, a region including the boundary 50 between the element 20 and the conductive member 30 is covered by the covering portion 40 having a predetermined elastic modulus, and the covering portion 40 is formed of the insulating substrate 10. It also adheres to the surface 10a. Therefore, not only when the insulating base material 10 is bent but also when it is expanded and contracted, since the covering portion 40 relieves the stress generated by the bending and expansion and contraction, the electrical connectivity between the element 20 and the conductive member 30 can be improved. Can be maintained. As a result, according to the mounting body 1, the reliability of the electrical connectivity between the element 20 and the conductive member 30 can be maintained.
 この電気的接続性の信頼性は、実装体1を屈曲させた場合、導電部材30にハンダを用いた場合と低温硬化型導電性ペーストを用いた場合とでは同等である。一方、実装体1を伸縮させた場合、低温硬化型導電性ペーストを用いた場合の方がハンダを用いた場合に比べて信頼性は勝る。伸縮する力に応じて低温硬化型導電性ペーストは伸縮するものの、ハンダは伸縮しないからである。 The reliability of the electrical connectivity is equal between the case where solder is used as the conductive member 30 and the case where a low temperature curing type conductive paste is used when the mounting body 1 is bent. On the other hand, when the mounting body 1 is expanded and contracted, the reliability in the case of using the low temperature curing type conductive paste is superior to the case of using the solder. This is because although the low temperature curing type conductive paste expands and contracts according to the expansion and contraction force, the solder does not expand and contract.
 また、特に、絶縁基材10としてフレキシブル基板を用いた場合、フレキシブル基板に印刷により回路形成できるので、回路内の抵抗値の調整が容易であり、構成部品を低減することもできる。そして、IC等の重要部品は「硬い」ところ、このような「硬い」電子部品を設ける部分に被覆部40を設けるので、実装体1全体としての信頼性(電気的接続性の信頼性、動作信頼性等)を向上させることができる。 In particular, when a flexible substrate is used as the insulating substrate 10, a circuit can be formed on the flexible substrate by printing, so adjustment of the resistance value in the circuit is easy, and the number of components can be reduced. And since important parts such as IC are "hard", the covering portion 40 is provided on the part where such "hard" electronic parts are to be provided, so that the reliability as a whole of the mounting body 1 (reliability of electrical connectivity, operation Reliability etc. can be improved.
 以下に実施例を挙げて更に具体的に説明する。なお、これらの実施例は例示であり、限定的に解釈されるべきでないことはいうまでもない。 Hereinafter, the present invention will be described in more detail by way of examples. Needless to say, these examples are illustrative and should not be construed as limiting.
 図2は、実施例に係る試験片の概要を示す。具体的に、図2(a)は、試験片を構成するフレキシブル基板11の上面図を示し、図2(b)は、フレキシブル基板11に導電性接着剤32を印刷した状態を示し、図2(c)は、実施例1に係る試験片の断面の概要を示す。 FIG. 2 shows an outline of a test piece according to an example. Specifically, FIG. 2 (a) shows a top view of the flexible substrate 11 constituting the test piece, and FIG. 2 (b) shows a state in which the conductive adhesive 32 is printed on the flexible substrate 11, FIG. (C) shows an outline of a cross section of a test piece according to Example 1.
(実施例1)
 図2(a)に示すように、ポリイミドフィルム12(厚さ12.5μm)上に銅配線14(5mm)が形成されたフレキシブル基板11を準備した。なお、銅配線14は、ポリイミドフィルム12上に2本設け、一方の銅配線14(長さ:45mm)と他方の銅配線14(長さ:127mm)との間には0.6mmの隙間を設けた。
Example 1
As shown to Fig.2 (a), the flexible substrate 11 in which the copper wiring 14 (5 mm) was formed on the polyimide film 12 (thickness 12.5 micrometers) was prepared. In addition, two copper wirings 14 are provided on the polyimide film 12, and a 0.6 mm gap is provided between one copper wiring 14 (length: 45 mm) and the other copper wiring 14 (length: 127 mm). Provided.
 そして、図2(b)に示すように、メタルマスク(開孔1mm×0.8mm、厚さ100μm)を用いて、チップ実装部分(各銅配線14の隙間側の端部)に導電性接着剤32を印刷し、図2(c)に示すように1608サイズの金めっき電極を備えた抵抗チップ24(0Ω)をマウントした。続いて、80℃60分で導電性接着剤32を硬化させた。更に、導電性接着剤32で接続した部分(抵抗チップ24と導電性接着剤32との境界端部を覆う部分を含む)に硬化性組成物(スーパーXゴールドNo.777クリア。セメダイン(株)製)を1mg塗布し、23℃50%RH環境下で24時間養生し、被覆部42を形成した。これにより、実施例1に係る試験片を得た。 Then, as shown in FIG. 2 (b), using a metal mask (aperture 1 mm × 0.8 mm, thickness 100 μm), the conductive adhesive is attached to the chip mounting portion (the end on the gap side of each copper wiring 14). The agent 32 was printed, and a resistive chip 24 (0 Ω) equipped with a gold-plated electrode of 1608 size was mounted as shown in FIG. 2 (c). Subsequently, the conductive adhesive 32 was cured at 80 ° C. for 60 minutes. Furthermore, a curable composition (Super X Gold No. 777 clear. Cemedine Co., Ltd.) is provided in the portion connected by the conductive adhesive 32 (including the portion covering the boundary edge between the resistive chip 24 and the conductive adhesive 32). 1 mg) and aged for 24 hours under an environment of 23.degree. C. and 50% RH to form a coated portion 42. Thus, a test piece according to Example 1 was obtained.
 なお、導電性接着剤32は、以下の合成例1で合成したアクリル酸エステル系重合体A1を用い、表1に示す配合割合で各配合物質をそれぞれ添加して調製した。具体的に、表1に示す配合割合になるように、(A)成分、(B)成分、及びその他の添加剤のそれぞれを秤量して準備した。次に、これらを混合して撹拌した。これにより、導電性接着剤32を得た。 The conductive adhesive 32 was prepared using the acrylic acid ester-based polymer A1 synthesized in Synthesis Example 1 below, and adding each of the compounding materials at the mixing ratio shown in Table 1. Specifically, each of the component (A), the component (B), and the other additives was weighed and prepared so as to obtain the mixture ratio shown in Table 1. Next, they were mixed and stirred. Thus, a conductive adhesive 32 was obtained.
(合成例1)
 フラスコに溶剤である酢酸エチル40質量部、メチルメタクリレート59質量部、2-エチルヘキシルメタクリレート25質量部、γ-メタクリロキシプロピルトリメトキシシラン22質量部、及び金属触媒としてルテノセンジクロライド0.1質量部を仕込み、窒素ガスを導入しながら80℃に加熱した。次いで、3-メルカプトプロピルトリメトキシシラン8質量部をフラスコ内に添加し80℃で6時間反応させた。室温に冷却後、ベンゾキノン溶液(95%THF溶液)を20質量部添加して重合を停止させた。溶剤及び未反応物を留去し、ポリスチレン換算の質量平均分子量が約6,000であり、ガラス転移点(Tg)が61.2℃であるトリメトキシシリル基を有するアクリル酸エステル系重合体A1を得た。
Synthesis Example 1
40 parts by mass of ethyl acetate as a solvent, 59 parts by mass of methyl methacrylate, 25 parts by mass of 2-ethylhexyl methacrylate, 22 parts by mass of γ-methacryloxypropyltrimethoxysilane, and 0.1 parts by mass of ruthenocene dichloride as a metal catalyst Charge and heat to 80 ° C. while introducing nitrogen gas. Then, 8 parts by mass of 3-mercaptopropyltrimethoxysilane was added into the flask and reacted at 80 ° C. for 6 hours. After cooling to room temperature, 20 parts by mass of a benzoquinone solution (95% THF solution) was added to terminate the polymerization. A solvent and an unreacted material are distilled off, and an acrylic acid ester polymer A1 having a trimethoxysilyl group having a polystyrene equivalent mass average molecular weight of about 6,000 and a glass transition point (Tg) of 61.2 ° C. I got
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
 表1において、各配合物質の配合量の単位は「質量部」である。また、配合物質の詳細は下記のとおりである。
*1:加水分解性ケイ素基を有するウレタンポリマー(商品名:「SPUR+1050MM」、モメンティブ製)
*2フレーク状銀粉、商品名:シルコートAgC-B、福田金属箔粉工業(株)製、比表面積1.35m/g、タップ密度4.6g/cm、50%平均粒径4μm。
*3)粒状銀粉(還元粉)、商品名:シルコートAgC-G、福田金属箔粉工業(株)製、比表面積2.5m/g、タップ密度1.4g/cm
*4)フェノール系酸化防止剤、商品名イルガノックス245、BASF製。
*5)アミン系老化防止剤、商品名チヌビン765、BASF製。
*6)親水性シリカ、商品名:レオロシールQS-20、(株)トクヤマ製。
*7)パラフィン系希釈剤、商品名:カクタスノルマルパラフィンN-11、(株)ジャパンエナジー製。
*8)ビニルトリメトキシシラン、商品名:KBM-1003、信越化学工業(株)製。
*9)ジオクチル錫化合物、商品名:ネオスタンU-830、日東化成(株)製。
In Table 1, the unit of the compounding amount of each compounding substance is "mass part". Moreover, the details of the compounding substance are as follows.
* 1: Urethane polymer with hydrolyzable silicon group (trade name: "SPUR + 1050MM", manufactured by Momentive)
* 2 Flaky silver powder, trade name: Silcoat AgC-B, manufactured by Fukuda Metal Foil & Powder Co., Ltd., specific surface area 1.35 m 2 / g, tap density 4.6 g / cm 3 , 50% average particle diameter 4 μm.
* 3) Granular silver powder (reduced powder), trade name: Silcoat AgC-G, manufactured by Fukuda Metal Foil & Powder Co., Ltd., specific surface area 2.5 m 2 / g, tap density 1.4 g / cm 3 .
* 4) Phenolic antioxidant, trade name Irganox 245, manufactured by BASF.
* 5) Amine based anti-aging agent, trade name Tinubin 765, manufactured by BASF.
* 6) Hydrophilic silica, trade name: Leorosil QS-20, manufactured by Tokuyama Corporation.
* 7) Paraffin based diluent, trade name: Cactus Normal Paraffin N-11, Japan Energy Co., Ltd.
* 8) Vinyltrimethoxysilane, trade name: KBM-1003, manufactured by Shin-Etsu Chemical Co., Ltd.
* 9) Dioctyltin compound, trade name: Neostan U-830, manufactured by Nitto Kasei Co., Ltd.
(比較例1、参考例1)
 比較例1に係る試験片は、実施例1とは異なり、被覆部42を形成しない点を除き実施例1と同様にして作製した。また、参考例1に係る試験片は、導電性接着剤32をハンダペースト(FLF01-BZ(L)、松尾ハンダ株式会社製)にし、かつ、被覆部42を形成しない点を除き実施例1と同様にして作製した。なお、参考例1においてはハンダペーストを260℃5分間加熱してリフローした。
(Comparative Example 1, Reference Example 1)
The test piece according to Comparative Example 1 was produced in the same manner as in Example 1 except that the coating portion 42 was not formed, unlike in Example 1. In the test piece according to the first embodiment, the conductive adhesive 32 is a solder paste (FLF01-BZ (L), manufactured by Matsuo Solder Co., Ltd.), and the coating 42 is not formed. It produced similarly. In Reference Example 1, the solder paste was reflowed by heating at 260 ° C. for 5 minutes.
(実施例2)
 実施例2に係る試験片は、実施例1とは異なり、ポリイミドフィルム12をPETフィルムに変更した点を除き、実施例1と同様にして作製した。なお、PETフィルムは260℃5分間加熱で損傷することから、導電部材としてハンダを用いた試験片は作製できなかった。
(Example 2)
A test piece according to Example 2 was produced in the same manner as Example 1, except that the polyimide film 12 was changed to a PET film, unlike Example 1. In addition, since the PET film was damaged by heating at 260 ° C. for 5 minutes, a test piece using solder as a conductive member could not be produced.
(U字折り返し試験後の導電性)
 図3は、U字折り返し試験の概要を示す。
(Conductivity after U-shaped folding test)
FIG. 3 shows an outline of the U-shaped folding test.
 図3に示すように、実施例1に係る試験片2の両端にカプトンテープ60を用いてリード線を接続し、U字折り返し試験機(DLDMLH-4U、ユアサシステム機器株式会社製)にセットした。U字折り返し試験条件は、曲げ半径を10mm、試験ストロークを±40mm、試験速度を30rpmに設定した。そして、試験機の動作と同時に抵抗計(RM3544、日置電機(株))を用いて1万回のU字折り返し試験をすると同時に抵抗測定を実施した。比較例1及び参考例1についても同様に試験した。その結果を図4に示す。なお、U字折り返し試験は、予め設定された試験条件に従って、試料を連続的に水平移動屈曲させる試験である。 As shown in FIG. 3, lead wires were connected to both ends of the test piece 2 according to the example 1 using a kapton tape 60 and set in a U-shaped folding tester (DLDMLH-4U, manufactured by Yuasa System Instruments Co., Ltd.) . As for the U-shaped folding test conditions, the bending radius was set to 10 mm, the test stroke was ± 40 mm, and the test speed was set to 30 rpm. Then, at the same time as the operation of the testing machine, 10,000 U-shaped folding tests were performed using a resistance meter (RM 3544, Hioki Electric Co., Ltd.) and resistance measurement was simultaneously performed. The same test was conducted on Comparative Example 1 and Reference Example 1. The results are shown in FIG. The U-shaped return test is a test in which the sample is continuously moved horizontally and bent in accordance with test conditions set in advance.
 図4を参照すると分かるように、実施例1に係る試験片においては、抵抗値はハンダと同程度であり、かつ、試験片の屈曲によっても抵抗値の変化はほとんどないことが観測された。一方、比較例1においては、屈曲当初から抵抗値が大幅に上昇し、屈曲回数が増加するにしたがって、徐々に抵抗値が増加することが観測された。これにより、実施例1に係る試験片に示すように、低温硬化型導電性ペーストを用いた場合における被覆部42の有用性が示された。また、実施例2に係る試験片においては、実施例1と同様の結果が得られた(図4での図示は省略)。 As can be seen with reference to FIG. 4, in the test piece according to Example 1, it was observed that the resistance value was similar to that of the solder and that there was almost no change in the resistance value even when the test piece was bent. On the other hand, in Comparative Example 1, it was observed that the resistance value increased significantly from the beginning of bending and gradually increased as the number of bendings increased. Thereby, as shown in the test piece according to Example 1, the usefulness of the covering portion 42 in the case of using the low temperature curing type conductive paste was shown. Moreover, in the test piece which concerns on Example 2, the result similar to Example 1 was obtained (illustration in FIG. 4 is abbreviate | omitted).
 以上、本発明の実施の形態及び実施例を説明したが、上記に記載した実施の形態及び実施例は特許請求の範囲に係る発明を限定するものではない。また、実施の形態及び実施例の中で説明した特徴の組合せの全てが発明の課題を解決するための手段に必須であるとは限らない点、及び本発明の技術思想から逸脱しない限り種々の変形が可能である点に留意すべきである。 Although the embodiments and examples of the present invention have been described above, the embodiments and examples described above do not limit the invention according to the claims. In addition, not all combinations of features described in the embodiments and examples are essential to the means for solving the problems of the invention, and various combinations without departing from the technical concept of the invention. It should be noted that variations are possible.
 1、1a、1b 実装体
 2 試験片
 10 絶縁基材
 10a 表面
 11 フレキシブル基板
 12 ポリイミドフィルム
 14 銅配線
 20 素子
 22 電極
 22a 側面
 24 抵抗チップ
 30 導電部材
 30a 側面
 32 導電性接着剤
 40、42、44 被覆部
 50 境界
 60 カプトンテープ
DESCRIPTION OF SYMBOLS 1, 1a, 1b mounting body 2 test piece 10 insulation base material 10a surface 11 flexible substrate 12 polyimide film 14 copper wiring 20 element 22 electrode 22a side 24 resistance chip 30 conductive member 30a side 32 conductive adhesive 40, 42, 44 coating Part 50 Boundary 60 Kapton Tape

Claims (6)

  1.  絶縁基材と、
     導電部材を介して前記絶縁基材に搭載される素子と、
     前記導電部材の側面及び前記素子の側面の少なくとも一部であって、前記導電部材と前記素子との境界の少なくとも一部を被覆し、前記絶縁基材の表面に接して設けられ、弾性率が0.1MPa以上500MPa以下である被覆部と
    を備える実装体。
    An insulating substrate,
    An element mounted on the insulating base via a conductive member;
    At least a portion of the side surface of the conductive member and the side surface of the element, covering at least a portion of the boundary between the conductive member and the element, is provided in contact with the surface of the insulating substrate, and has an elastic modulus A mounting body provided with the covering part which is 0.1 or more MPa and 500 or less MPa.
  2.  前記絶縁基材が、可撓性を有し、
     前記被覆部が、外力に応じて変形する請求項1に記載の実装体。
    The insulating substrate is flexible,
    The mounting body according to claim 1, wherein the covering portion is deformed in response to an external force.
  3.  前記絶縁基材が、フレキシブル基板であり、
     前記導電部材が、低温硬化型導電性ペーストである請求項1又は2に記載の実装体。
    The insulating substrate is a flexible substrate,
    The mounting body according to claim 1, wherein the conductive member is a low temperature curing conductive paste.
  4.  前記被覆部が、硬化性組成物を用いて構成され、
     前記硬化性組成物が、硬化前において10Pa・s以上100Pa・s以下の粘度を有する請求項1~3のいずれか1項に記載の実装体。
    The covering portion is configured using a curable composition,
    The mounting body according to any one of claims 1 to 3, wherein the curable composition has a viscosity of 10 Pa · s or more and 100 Pa · s or less before curing.
  5.  請求項1~4のいずれか1項に記載の実装体を備える電子機器。 An electronic device comprising the mounting body according to any one of claims 1 to 4.
  6.  絶縁基材と、
     導電部材を介して前記絶縁基材に搭載される素子と、
     前記導電部材の側面及び前記素子の側面の少なくとも一部であって、前記導電部材と前記素子との境界を含む領域の少なくとも一部を被覆し、前記絶縁基材の表面に接して設けられる被覆部とを備える実装体の被覆部用の硬化性組成物であって、
     前記硬化性組成物の硬化後の弾性率が、0.1MPa以上500MPa以下である実装体の被覆部用の硬化性組成物。
    An insulating substrate,
    An element mounted on the insulating base via a conductive member;
    A coating that covers at least a portion of the side surface of the conductive member and the side surface of the element, at least a portion of the region including the boundary between the conductive member and the element, and is provided in contact with the surface of the insulating substrate A curable composition for a cover of a mounting body comprising:
    The curable composition for the coating | coated part of the mounting body whose elastic modulus after hardening of the said curable composition is 0.1 Mpa or more and 500 Mpa or less.
PCT/JP2018/039273 2018-01-17 2018-10-23 Mounting body WO2019142423A1 (en)

Priority Applications (3)

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