WO2019091804A1 - Procédé et dispositif pour produire une vapeur par l'utilisation de données de commande obtenues dans un mode de régulation - Google Patents

Procédé et dispositif pour produire une vapeur par l'utilisation de données de commande obtenues dans un mode de régulation Download PDF

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Publication number
WO2019091804A1
WO2019091804A1 PCT/EP2018/079429 EP2018079429W WO2019091804A1 WO 2019091804 A1 WO2019091804 A1 WO 2019091804A1 EP 2018079429 W EP2018079429 W EP 2018079429W WO 2019091804 A1 WO2019091804 A1 WO 2019091804A1
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WO
WIPO (PCT)
Prior art keywords
control
radiator
evaporation body
data
control mode
Prior art date
Application number
PCT/EP2018/079429
Other languages
German (de)
English (en)
Inventor
Nael Al Ahmad
Original Assignee
Aixtron Se
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aixtron Se filed Critical Aixtron Se
Publication of WO2019091804A1 publication Critical patent/WO2019091804A1/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process

Definitions

  • the invention relates to a method for generating a vapor by vaporizing the solid or liquid particles of an aerosol with one or more radiators, wherein one of the radiator is an evaporation body to which the particles are brought in at least one steam generating step by means of a carrier gas stream where they are vaporized by supplying heat of vaporization, wherein in a control mode, a first characteristic parameter of the one or more radiator is determined, which is controlled by a control / regulating device by varying heating energy fed into the radiator, in particular the first evaporator body to a desired value and the time course of at least one associated with the generation of heating power
  • Control parameter is stored in a log file.
  • the invention also relates to a device for carrying out the method.
  • Devices for generating a vapor from an aerosol are known for example from DE 10 2014 101 792 AI, WO 2012/175126 AI or DE 10 2014 109 196 AI. Devices of this type or methods for producing a vapor are used in the deposition of organic layers on a substrate, in particular in the production of OLEDs.
  • the carrier gas is an inert gas, for example nitrogen, which transports the particles in the form of an aerosol to a steam generator.
  • the steam generator has at least one evaporation body, with which the evaporative heat is supplied to the aerosol particles in order to evaporate the aerosol particles.
  • the vapor is transported through a vapor line to a reactor housing where it is fed to a gas inlet member which distributes the vapor into a process chamber in which the substrate to be coated is placed on top of a cooled substrate holder.
  • the invention has for its object to increase the reliability of a steam generator or specify an alternative operating mode for operating the evaporator.
  • the problem is solved by the invention specified in the claims.
  • the subclaims represent not only advantageous developments of the invention specified in the independent claims. They also form each with individual features of independent developments of the prior art, wherein individual features of various sub-claims can be combined with each other.
  • the aforementioned method is developed by a control mode in which the protocol data or control data obtained from the protocol data are used to feed without the determination of the characteristic parameter, the heating power in a radiator, in particular in the first evaporation body. Is it the radiator to an evaporation body, the particles of the aerosol are evaporated with the heating power.
  • a first characteristic parameter for example, a temperature of the radiator, in particular evaporation body
  • the control / regulating device by varying heating power fed into the radiator, in particular evaporation body to a desired value
  • the feed takes place Heating power in the radiator, in particular evaporator body in the control mode without control, but using the data obtained in the control mode data.
  • a device according to the invention can thus continue to be operated, for example in the event of failure of a sensor with which the characteristic parameter is determined, without immediate replacement of the sensor being undertaken.
  • the device operates in a "blmd mode" without determination of the characteristic parameter, for example without a temperature measurement, so that production interruptions can be avoided.
  • the device according to the invention can also include, in addition to a first evaporation body, further evaporation bodies, for example a second, third and / or second evaporation body It can be provided that each additional evaporation body is regulated in a control mode to a nominal temperature assigned to it individually For this purpose it can be provided that for each of the further evaporation bodies an individually assigned sensor, in particular a temperature sensor, is provided The actual temperature of the further evaporating body is determined, for example, by means of the control / regulating device, this value, in particular the temperature actual value, being regulated against a desired value this further evaporation body both in a control mode in which a characteristic parameter, for example the actual temperature, is controlled by varying the heat output fed into the further evaporation body against a desired value, for example a desired temperature.
  • a characteristic parameter for example the actual temperature
  • the data obtained in the control mode log data are used to feed heating power in the evaporator body.
  • all evaporation bodies are operated in control mode or at least one evaporation body is operated in a control mode.
  • all evaporation bodies are operated in the control mode, wherein the heat output is controlled using the protocol data or control data obtained from the protocol data.
  • the desired values of the one or more characteristic parameters are preferably contained in a recipe.
  • the recipe can be a data record which contains the essential characteristic parameters for one or more successive process steps.
  • the process steps can be heating steps, cooling steps, temperature steps and one or more steam generation steps.
  • the formulation preferably stores the desired time profiles of one or more characteristic parameters, wherein the characteristic parameters may be the desired partial vapor pressure of the vapor which is measured in the steam line with a vapor pressure sensor arrangement as known from the aforementioned prior art , However, the characteristic parameter can also be a desired temperature of the at least one evaporation body. It is further provided that in the recipe also values for the time course of a total pressure, the mass flow of the carrier gas and / or the delivery rate of the aerosol generator are stored. If the characteristic parameter is the temperature of an evaporation body, then the device has a temperature sensor with which the temperature of the evaporation body can be measured.
  • thermocouples or other temperature sensors may be provided, wherein it is provided in particular that the temperature of each one or more evaporation body is determined individually.
  • at least one or more evaporation body is operated in the control mode, but the last evaporation body in the flow direction is regulated to a desired temperature.
  • the one or more evaporation bodies of the evaporator are preferably arranged one behind the other in the flow direction of the carrier gas so that the aerosol enters and flows through a first evaporation body in the flow direction, at least parts of the aerosol particles in the first evaporation body being vaporized.
  • this evaporation body can be tempered at a temperature which is controlled below a vaporization temperature of the aerosol particles so that the aerosol particles are not vaporized in the first evaporation body in the direction of flow, but accumulate there.
  • a night temperature control can be carried out in the direction of flow downstream of the first evaporation body further evaporation body, wherein the temperature of the last evaporation body in the flow direction for process stability is relevant.
  • the control data used to control the at least one evaporation body in the control mode is preferably obtained by data optimization of the log data stored in the log file. It can be an averaging. Not only the respective characteristic parameters can be used to form the control data.
  • control data can be formed using in particular the use of initial temperatures, final temperatures, values for the steepness of a temperature ramp, the carrier gas pressure, the carrier gas flow and / or the particle feed rate , where the particles may be solid or liquid particles.
  • the radiator either controlled or controlled according to the invention can not be just an evaporator body.
  • the radiator may also be a preheater, with which a carrier gas is preheated.
  • the inventive device is characterized in that the control / control device has a protocol data memory and in particular also a control data memory and is programmed so that in a control mode log data are obtained, which are used in a control mode for control.
  • FIG. 1 shows schematically a device according to the invention for coating a substrate 14 with a layer of an organic material
  • Fig. 2a shows the time course of the temperature Tl, T2, T3, T4, with
  • Temperatursens oren 7.1, 7.2, 7.3, 7.4 are measured in various process steps PI, P2, P3, P4, P5,
  • P2, P3, P4, P5 are fed in the control mode in the evaporator body 6.1, 6.2, 6.3, 6.4 and
  • FIG. 3 shows schematically in a representation according to Figure 1 another
  • Figures 1 and 3 show roughly schematically a device for the production of OLEDs.
  • a reactor housing 12 which is closed to the outside gas-tight and which is evacuated, there is a
  • the substrate holder 15 carries the substrate 14 to be coated.
  • the side of the substrate 14 to be coated faces a gas outlet surface of a gas inlet member 13, into which a steam line 11 opens, which can be heated and by means of a carrier gas a vapor is promoted, which condenses on the surface of the substrate 14, wherein for structuring the deposited on the substrate 14 layer, a mask, not shown, for example, shadow mask, is provided.
  • a vapor pressure sensor arrangement 10 for example a QCM sensor, the partial pressure of the steam within the vapor line 11 can be determined.
  • evaporator 5 Upstream of the steam line 11 is an evaporator 5, which in the embodiment has four or three successively arranged in the flow direction evaporation body 6.1, 6.2, 6.3, 6.4.
  • the evaporation body 6.1, 6.2, 6.3, 6.4 are spaced from each other by a free space. But you can also touch touching each other.
  • the evaporation body 6.1, 6.2, 6.3, 6.4 have evaporation surfaces. Through the evaporation body 6.1, 6.2, 6.3, 6.4, a gas can flow through.
  • the evaporation body 6.1, 6.2, 6.3, 6.4 may for example be formed from an electrically conductive solid state foam, so that the solid state foam can be heated by passing an electric current.
  • the heating power feeders denoted by 8.1, 8.2, 8.3 and 8.4 in FIG. 1 can thus be electrical lines with which an electrical current for transmitting the heating power is fed into the evaporating body 6.1, 6.2, 6.3, 6.4
  • each of the evaporation body 6.1, 6.2, 6.3, 6.4 is a respective evaporation body 6.1, 6.2, 6.3, 6.4 each individually assigned Temperature sensor 7.1, 7.2, 7.3, 7.4 arranged.
  • the temperature sensors 7.1, 7.2, 7.3, 7.4 may be a thermocouple. However, it is also provided for measuring the temperature of the evaporation body 6.1, 6.2, 6.3, 6.4 optical temperature sensors to use oren.
  • Upstream of the evaporator 5 is an opening into the evaporator 5 Aerosol 4, through which an aerosol is fed into the evaporator 5.
  • the aerosol particles are evaporated.
  • the aerosol is generated with an aerosol generator 3, which is arranged upstream of the aerosol line 4.
  • the particle flow rate generated by the aerosol generator 3 can be adjusted.
  • the aerosol generator 3 may have a metering element.
  • a screw is shown for this purpose, which can be operated at varying speeds.
  • the metering element can also be a perforated disk operated at a varying speed.
  • the volume flow or the mass flow of the carrier gas G can be regulated.
  • a mass flow controller 1 is provided for this purpose.
  • a control / regulating device 9 has a protocol data memory 16 and, if appropriate, also a control data memory 17.
  • / Control device 9 a controller or microcomputer 18 for electronic data processing.
  • the fiction, contemporary device can be operated in one or more temporally successive process steps PI, P2, P3, P4, P5.
  • a recipe is stored in a recipe data memory 19, which contains in particular the temperatures T 1, T 2, T 3, T 4 of the evaporation bodies 6.1, 6.2, 6.3, 6.4 in the various process steps PI, P 2, P 3, P 4, P 5.
  • the steam partial pressure or vapor mass flow to be generated can also be stored in the recipe data memory 19 for each process step PI to P5.
  • the reference numeral 6 denotes a preheater in Figures 1 and 3, which is also regulated to a desired temperature.
  • the temperature is determined by a temperature sensor 7. It can be a thermocouple.
  • An inert gas for example nitrogen or a noble gas, is fed into a space upstream of the preheating body 6 by means of an inert gas feed line (not shown).
  • the inert gas which also forms a carrier gas, is heated in the preheater 6 to an elevated temperature.
  • FIG. 2a shows, by way of example, the temperature setpoint values T1 to T4, as they are to be set in each of the process steps PI to P5 to be carried out one after the other. It can be seen that when changing from one process step PI to P4 to the respective subsequent process step P2 to P5, a temperature ramp is passed through when the temperature Tl to T4 changes.
  • the device according to the invention is initially operated in a regular mode.
  • a characteristic parameter whose setpoint is specified in the recipe is controlled to the setpoint.
  • at the characteristic parameter may be the vapor pressure determined by the vapor pressure sensor arrangement 10.
  • the respective temperature Tl to T4 of the individual evaporation bodies 6.1 to 6.4 are discussed.
  • the device In a control mode, the device is initially operated such that successively the individual process steps PI to P5 are performed in which the temperatures Tl to T4 respectively by feeding heat output II, 12, 13, 14 by the heating power feeds 8.1, 8.2 , 8.3, 8.4 are regulated in the evaporation body 6.1, 6.2, 6.3, 6.4 to a desired value.
  • the heating power II, 12, 13, 14 is varied according to an individual control characteristic (for example PID).
  • At least the time sequences of the heating powers II to 14 are stored in the log data memory.
  • the respective progressions of the actual temperatures of the evaporation bodies 6.1 to 6.4 and further measured values, such as the partial pressure of the steam, the total pressure, the aerosol delivery rate or the mass flow of the carrier gas G can additionally be stored.
  • At least one evaporation body 6.1, 6.2, 6.3, 6.4 can be used in a later run be operated in a control mode. No control is performed in this control mode. The actual temperature of the evaporation body 6.1, 6.2, 6.3, 6.4 is not determined.
  • the Schutschmannseinspeisung 8.1 to 8.4 takes place here exclusively borrowed by using the stored in the log data memory 16 log data.
  • the device according to plan in which the temperature of at least one of the evaporation bodies 6.1, 6.2, 6.3, 6.4 is not regulated, but controlled.
  • the control of the one or more evaporation body 6.1, 6.2, 6.3, 6.4 fed heating power II to 14 can be done with the help of obtained from the log data control data. These can be stored in the control data memory 17.
  • the control data are preferably calculated by averaging the log data obtained in the control mode.
  • FIG. 2b shows, for example, control data for controlling the heating powers II to 14.
  • the device In a process step PI, the device is in an idle state. There is no heat input. The current flowing through the electrically conductive evaporation bodies 6.1, 6.2, 6.3, 6.4 is 0 A. In a process step P2, only the last two evaporation bodies 6.3 and 6.4 in the flow direction are introduced by feeding a
  • the upstream evaporation bodies 6.1 and 6.2 also heat up.
  • the heating power 13, 14 is first lowered and then increased in the form of a ramp.
  • the upstream evaporation bodies 6.1, 6.2 are heated in two successive time periods with different heat outputs, which are kept constant over their feed time.
  • the device is operated in one or more passes in the control mode, wherein in each case all process steps PI to P5 are performed in succession.
  • the device is used in the control operated mode, wherein either all or some evaporation body 6.1, 6.2, 6.3, 6.4 are operated in the control mode or exclusively in the flow direction last evaporator body 6.4 is operated in control mode.
  • the preheater 6 can be operated both in the control mode and in the control mode.
  • a method which is characterized in that the setpoint values of the one or more characteristic parameters are included in a recipe, in particular also the setpoint values of one or more characteristic parameters of further process steps, such as one or more heating steps, one or more cooling steps or contains one or more tempering or one or more further steam generating steps.
  • a method characterized in that the one or more characteristic parameters are one of a temperature sensor 7.1, 7.2,
  • a method which is characterized in that in a process step in which at least the first heating body, in particular evaporation body 6.1 is operated in the control mode, at least one of the second, third and / or fourth radiator, in particular evaporation body 6.2, 6.3, 6.4 is operated in control mode.
  • a method which is characterized in that at least the temperature of a last in the flow direction of the carrier gas radiator, in particular evaporation body 6.4 is controlled to a desired value.
  • control data are obtained by a data optimization, in particular an averaging, from the protocol data.
  • a device which is characterized in that the control / regulating device 9 is programmed such that in a control mode, a first characteristic parameter of the radiator is determined, which with a control device 9 by varying in the first radiator , in particular evaporating body 6.1 fed-in heating power is controlled to a desired value and the time profile of at least one associated with the generation of heating power control parameter is stored in a protocol file, wherein in a control mode, the log data stored in the log data or control data obtained from the log data are used in order, without determining the characteristic parameter, to feed the heating power into the heating body, in particular the first evaporating body 6.1.
  • the control / regulating device 9 has a control data memory 17, are stored in the control data obtained from the protocol data.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

L'invention concerne un procédé pour produire une vapeur par évaporation des particules solides ou liquides d'un aérosol, qui sont amenées dans au moins une étape de production de vapeur au moyen d'un flux de gaz support vers un corps d'évaporation (6.1) chauffé, où elles sont évaporées par introduction de chaleur d'évaporation. Dans un mode de régulation, on détermine une valeur de mesure de la température, qui est réglée à une valeur de consigne au moyen d'un dispositif de commande/régulation (9) par variation de la puissance de chauffage injectée dans le corps d'évaporation (6.1). L'allure temporelle de la puissance de chauffage est enregistrée dans un fichier de protocole. Des données de commande sont obtenues à l'aide des données de protocole enregistrées dans le fichier de protocole afin de commander sans régulation, dans une étape de procédé ultérieure, la température du corps d'évaporation en vue d'évaporer les particules de l'aérosol.
PCT/EP2018/079429 2017-11-08 2018-10-26 Procédé et dispositif pour produire une vapeur par l'utilisation de données de commande obtenues dans un mode de régulation WO2019091804A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102017126126.5 2017-11-08
DE102017126126.5A DE102017126126A1 (de) 2017-11-08 2017-11-08 Verfahren und Vorrichtung zum Erzeugen eines Dampfes durch die Verwendung von in einem Regelmodus gewonnenen Steuerdaten

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WO2019091804A1 true WO2019091804A1 (fr) 2019-05-16

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WO (1) WO2019091804A1 (fr)

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DE102018133068B4 (de) * 2018-12-20 2020-10-22 gemeinnützige KIMW Forschungs-GmbH Dosiervorrichtung zum Dosieren eines pulverförmigen Stoffes

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US20080191153A1 (en) * 2005-03-16 2008-08-14 Advanced Technology Materials, Inc. System For Delivery Of Reagents From Solid Sources Thereof
DE102011051261A1 (de) * 2011-06-22 2012-12-27 Aixtron Se Verfahren und Vorrichtung zum Abscheiden von OLEDs insbesondere Verdampfungsvorrichtung dazu
WO2012175126A1 (fr) 2011-06-22 2012-12-27 Aixtron Se Procédé et appareil pour un dépôt en phase vapeur
US20140290575A1 (en) * 2013-03-29 2014-10-02 Tokyo Electron Limited Source gas supply unit, film forming apparatus and source gas supply method
DE102014101792A1 (de) 2014-02-13 2015-08-13 Aixtron Se Vorrichtung zum Bestimmen des Massenflusses eines Gases beziehungsweise Gasgemisches mit ineinandergeschachtelten rohrförmigen Filamentanordnungen
DE102014109196A1 (de) 2014-07-01 2016-01-07 Aixtron Se Vorrichtung zum Erzeugen eines Dampfes aus einem festen oder flüssigen Ausgangsstoff für eine CVD- oder PVD-Einrichtung
DE102014109194A1 (de) * 2014-07-01 2016-01-07 Aixtron Se Vorrichtung und Verfahren zum Erzeugen eines Dampfes für eine CVD- oder PVD-Einrichtung

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DE102011051931A1 (de) * 2011-07-19 2013-01-24 Aixtron Se Vorrichtung und Verfahren zum Bestimmen des Dampfdrucks eines in einem Trägergasstrom verdampften Ausgangsstoffes
DE102011083287A1 (de) * 2011-09-23 2013-03-28 Robert Bosch Gmbh Verfahren zur Erfassung einer Strömungseigenschaft eines strömenden fluiden Mediums

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Publication number Priority date Publication date Assignee Title
US20080191153A1 (en) * 2005-03-16 2008-08-14 Advanced Technology Materials, Inc. System For Delivery Of Reagents From Solid Sources Thereof
DE102011051261A1 (de) * 2011-06-22 2012-12-27 Aixtron Se Verfahren und Vorrichtung zum Abscheiden von OLEDs insbesondere Verdampfungsvorrichtung dazu
WO2012175126A1 (fr) 2011-06-22 2012-12-27 Aixtron Se Procédé et appareil pour un dépôt en phase vapeur
US20140290575A1 (en) * 2013-03-29 2014-10-02 Tokyo Electron Limited Source gas supply unit, film forming apparatus and source gas supply method
DE102014101792A1 (de) 2014-02-13 2015-08-13 Aixtron Se Vorrichtung zum Bestimmen des Massenflusses eines Gases beziehungsweise Gasgemisches mit ineinandergeschachtelten rohrförmigen Filamentanordnungen
DE102014109196A1 (de) 2014-07-01 2016-01-07 Aixtron Se Vorrichtung zum Erzeugen eines Dampfes aus einem festen oder flüssigen Ausgangsstoff für eine CVD- oder PVD-Einrichtung
DE102014109194A1 (de) * 2014-07-01 2016-01-07 Aixtron Se Vorrichtung und Verfahren zum Erzeugen eines Dampfes für eine CVD- oder PVD-Einrichtung

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