WO2019083008A1 - Pyridine compound and pest control composition containing same - Google Patents

Pyridine compound and pest control composition containing same

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Publication number
WO2019083008A1
WO2019083008A1 PCT/JP2018/039844 JP2018039844W WO2019083008A1 WO 2019083008 A1 WO2019083008 A1 WO 2019083008A1 JP 2018039844 W JP2018039844 W JP 2018039844W WO 2019083008 A1 WO2019083008 A1 WO 2019083008A1
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WO
WIPO (PCT)
Prior art keywords
group
compound
diyl
alkanediyl
nmr
Prior art date
Application number
PCT/JP2018/039844
Other languages
French (fr)
Japanese (ja)
Inventor
康 片桐
拓和 高田
Original Assignee
住友化学株式会社
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Filing date
Publication date
Application filed by 住友化学株式会社 filed Critical 住友化学株式会社
Priority to JP2019550315A priority Critical patent/JPWO2019083008A1/en
Publication of WO2019083008A1 publication Critical patent/WO2019083008A1/en

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Classifications

    • A—HUMAN NECESSITIES
    • A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01N—PRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
    • A01N43/00—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds
    • A01N43/34—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom
    • A01N43/40—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom six-membered rings
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K31/00—Medicinal preparations containing organic active ingredients
    • A61K31/33—Heterocyclic compounds
    • A61K31/395—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
    • A61K31/435—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having six-membered rings with one nitrogen as the only ring hetero atom
    • A61K31/44—Non condensed pyridines; Hydrogenated derivatives thereof
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61P—SPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
    • A61P33/00—Antiparasitic agents
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61P—SPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
    • A61P33/00—Antiparasitic agents
    • A61P33/14—Ectoparasiticides, e.g. scabicides
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
    • C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
    • C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D213/60—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D213/62—Oxygen or sulfur atoms
    • C07D213/63—One oxygen atom
    • C07D213/68—One oxygen atom attached in position 4

Definitions

  • the present application claims priority to and the benefit of, Japanese Patent Application No. 2017-207929, filed Oct. 27, 2017, the entire contents of which are incorporated herein by reference.
  • the present invention relates to a pyridine compound and a pest control composition containing the same.
  • Patent Document 1 describes that certain compounds have a pest control effect.
  • An object of the present invention is to provide a compound having excellent control activity against pests.
  • Ar is a C6-C10 aryl group or a 3- to 10-membered heterocyclic group ⁇ wherein the C6-C10 aryl group and the 3- to 10-membered heterocyclic group have one or more substituents selected from Group A; Represents good ⁇ ,
  • R A and R B is R A is a C1-C10 alkanediyl group, a C2-C10 alkene diyl group, an ethynediyl group, a C3-C10 alkyndiyl group, a C3-C8 cycloalkanediyl group, a C3-C8 cycloalkene diyl group ⁇ the C1-C10 alkanediyl group, The C2-C10 alkene diyl group, the C3-C10 alkyldiyl group, the C3-C8 cycloalkanediyl group and
  • R B is C 1 -C 3 alkanediyl group, C 2 -C 3 alkene diyl group, ethynediyl group or propyne diyl group ⁇ C 1 -C 3 alkanediyl group, the C 2 -C3 alkenediyl group and the propynediyl group each independently represent one or more substituents selected from the group consisting of a cyano group and a halogen atom;
  • R 2 , R 4 and R 5 are the same or different, and have a 3-6 membered alicyclic hydrocarbon group which may have one or more substituents selected from group B or one or more halogen atoms
  • R 3 is a C 1 -C 3 chain hydrocarbon group ⁇ the C 1 -C 3 chain hydrocarbon group may have one or
  • Group A C1-C6 chain hydrocarbon group, C1-C6 alkoxy group, C3-C6 alkenyloxy group, C3-C6 alkynyloxy group, (C1-C4 alkoxy) C1-C4 alkyl group, C1-C6 alkylsulfanyl group , C1-C6 alkylsulfinyl group, C1-C6 alkylsulfonyl group, C2-C6 alkylcarbonyl group, C2-C6 alkylcarbonyloxy group ⁇ C1-C6 chain hydrocarbon group, said C1-C6 alkoxy group, said C3-C6 alkyl hydrocarbon group C6 alkenyloxy group, said C3-C6 alkynyloxy group, said (C1-C4 alkoxy) C1-C4 alkyl group, said C1-C6 alkylsulfanyl group, said C1-C6 alkylsulfinyl group, said C1
  • R 9 , R 10 and R 11 are the same or different and each represents a C1-C3 alkyl group or a hydrogen atom.
  • Group B A group consisting of a C1-C3 alkyl group optionally having one or more halogen atoms, a halogen atom and a cyano group.
  • Group C a group consisting of a cyclopropyl group, a halogen atom and a cyano group.
  • R 12 , R 13 and R 14 are the same or different and each represents a C1-C3 alkyl group optionally having one or more halogen atoms or a hydrogen atom.
  • a compound represented by hereinafter, referred to as a compound X of the present invention.
  • R A represents a C1-C10 alkanediyl group, a C2-C10 alkene diyl group, an ethyne diyl group, a C3-C10 alkyndiyl group, a C3-C8 cycloalkanediyl group or a C3-C8 cycloalkene diyl group ⁇ C1-C10 alkanediyl group;
  • the C2-C10 alkene diyl group, the C3-C10 alkyldiyl group, the C3-C8 cycloalkanediyl group and the C3-C8 cycloalkene diyl group have at least one substituent selected from the group consisting of a cyano group and a halogen atom
  • R B may be a single bond;
  • a group in which R A is a C1-C3 alkanediyl group, a C2-C3 alkene diyl group, an ethyne
  • the propynediyl group is a combination which may have one or more substituents selected from the group consisting of a cyano group and a halogen atom,
  • L 2 is a single bond, an oxygen atom or S (O) p (hereinafter referred to as the present compound).
  • R 3 is C (O) CH 3 , C (O) OCH 3 or a hydrogen atom
  • L 1 is a single bond
  • a pest control composition comprising the compound according to any one of [1] to [6] and an inert carrier.
  • a method for controlling pests which comprises applying an effective amount of the compound according to any one of [1] to [6] to a pest or a habitat of the pest.
  • a method for controlling a pest which comprises applying an effective amount of the composition according to [7] or [8] to a pest or a habitat of the pest.
  • a seed or vegetative organ which retains an effective amount of the compound according to any one of [1] to [6] or an effective amount of the composition according to [7] or [8].
  • pests can be controlled.
  • halogen atom is a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.
  • substituent has 2 or more halogen atoms, it means that those halogen atoms may be the same or different.
  • substituent has two or more groups or atoms selected from a specific group (for example, a group consisting of a cyano group and a halogen atom), those groups or atoms may be the same or different. .
  • the expression “optionally having one or more substituents selected from group X” is a substituent selected from group X When two or more are present, those substituents may be the same or different.
  • CX-CY in the present specification means that the number of carbon atoms is X to Y.
  • C1-C6 means that the number of carbon atoms is 1 to 6.
  • the "chain hydrocarbon group” represents an alkyl group, an alkenyl group or an alkynyl group.
  • alkyl group for example, methyl group, ethyl group, propyl group, isopropyl group, 1,1-dimethylpropyl group, 1,2-dimethylpropyl group, butyl group, tert-butyl group, pentyl group, and hexyl group
  • alkenyl group for example, vinyl group, 1-propenyl group, 2-propenyl group, 1-methyl-1-propenyl group, 1-methyl-2-propenyl group, 1,2-dimethyl-1-propenyl group
  • Examples include 3-butenyl group, 4-pentenyl group, and 5-hexenyl group.
  • alkynyl group for example, ethynyl group, 1-propynyl group, 2-propynyl group, 1-methyl-2-propynyl group, 1,1-dimethyl-2-propynyl group, 2-butynyl group, 4-pentynyl group And 5-hexynyl groups.
  • alkanediyl group for example, methanediyl group, 1,1-ethanediyl group, 1,2-ethanediyl group, 1,1-propanediyl group, 2,2-propanediyl group, 1,2-propanediyl group, 1,3-propanediyl group, 1,2-butanediyl group, 1,3-butanediyl group, 1,4-butanediyl group, 1,3-pentanediyl group, 1,4-pentanediyl group, 1,5-pentanediyl group, 1,4-hexanediyl, 1,5-hexanediyl, 1,6-hexanediyl, 1,5-heptanediyl, 1,6-heptanediyl, 1,7-heptanediyl, 1,6-octane Diyl, 1,7-octane Diy
  • alkenediyl group examples include ethene-1,1-diyl group, ethene-1,2-diyl group, 1-propene-1,2-diyl group, 1-propene-1,3-diyl group, 2- Propene-1,3-diyl group, 1-butene-1,3-diyl group, 1-butene-1,4-diyl group, 2-butene-1,4-diyl group, 1-pentene-1,4- Diyl group, 1-pentene-1,5-diyl group, 2-pentene-1,5-diyl group, 1-hexene-1,5-diyl group, 1-hexene-1,6-diyl group, 2-hexene -1,6-diyl group, 1-heptene-1,6-diyl group, 1-heptene-1,7-diyl group, 2-heptene-1,7-diyl group, 2-
  • alkyndiyl group for example, 1-propyne-1,3-diyl group, 2-propyne-1,3-diyl group, 1-butyne-1,3-diyl group, 1-butyne-1,4-diyl group Group, 2-butyne-1,4-diyl group, 1-pentine-1,4-diyl group, 1-pentine-1,5-diyl group, 2-pentine-1,5-diyl group, 1-hexyne- 1,5-diyl group, 1-hexyne-1,6-diyl group, 2-hexyne-1,6-diyl group, 1-heptin-1,6-diyl group, 1-heptin-1,7-diyl group , 2-heptin-1,7-diyl group, 1-octin-1,7-diyl group, 1-octin-1,8-diyl group, 2-octin-1
  • the "alicyclic hydrocarbon group” represents a cycloalkyl group, a cycloalkenyl group or a cycloalkynyl group.
  • Examples of the “cycloalkyl group” include cyclopropyl group, cyclobutyl group, cyclopentyl group and cyclohexyl group.
  • As the "cycloalkenyl group”, for example, cyclopropenyl group, cyclobutenyl group, cyclopentenyl group and cyclohexenyl group can be mentioned.
  • Examples of the "cycloalkynyl group” include a cyclohexynyl group.
  • cycloalkanediyl group for example, cyclopropanediyl group, 1,2-cyclobutanediyl group, 1,3-cyclobutanediyl group, 1,2-cyclopentandiyl group, 1,3-cyclopentandiyl group, 1 , 2-cyclohexanediyl group, 1,3-cyclohexanediyl group, 1,4-cyclohexanediyl group, 1,2-cycloheptanediyl group, 1,3-cycloheptanediyl group, 1,4-cycloheptanediyl group, There may be mentioned 1,2-cyclooctanediyl, 1,3-cyclooctanediyl and 1,4-cyclooctanediyl.
  • cycloalkenediyl group for example, cyclopropene-1,2-diyl group, cyclopropene-1,3-diyl group, cyclobutene-2,3-diyl group, cyclobutene-3,4-diyl group, cyclopentene- 2,3-diyl group, cyclopentene-3,4-diyl group, cyclohexene-2,3-diyl group, cyclohexene-3,4-diyl group, cycloheptene-2,3-diyl group, cycloheptene-3,4-diyl group And cyclooctene-2,3-diyl and cyclooctene-3,4-diyl groups.
  • C6-C10 aryl group examples include phenyl group, naphthyl group, indanyl group, and 1,2,3,4-tetrahydronaphthyl group.
  • the “3-10 membered heterocyclic group” is a partially unsaturated or aromatic monocyclic or fused heterocyclic group containing 1 to 4 heteroatoms selected from the group consisting of nitrogen atom, oxygen atom and sulfur atom
  • each optical isomer and a mixture containing them in any ratio are also included in the compound of the present invention X.
  • a compound of the present invention X includes two or more geometric isomers derived from a carbon-carbon double bond or a carbon-nitrogen double bond, and a mixture containing them in any ratio.
  • the compound of the present invention X is added with an acid such as hydrochloride, sulfate, nitrate, phosphate, acetate or benzoate by mixing with an acid such as hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, acetic acid or benzoic acid May form salts.
  • an acid such as hydrochloride, sulfate, nitrate, phosphate, acetate or benzoate by mixing with an acid such as hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, acetic acid or benzoic acid May form salts.
  • Embodiment 2 A compound according to Embodiment 1, wherein R 3 is a C1-C3 chain hydrocarbon group, a benzyl group, C (O) R 8 , C (O) OR 8 or a hydrogen atom.
  • Embodiment 3 A compound according to Embodiment 1, wherein R 3 is an allyl group, a benzyl group, C (O) CH 3 , C (O) OCH 3 or a hydrogen atom.
  • Embodiment 4 A compound according to Embodiment 1, wherein R 3 is an allyl group, C (O) CH 3 , C (O) OCH 3 or a hydrogen atom.
  • R 3 is an allyl group, C (O) CH 3 , C (O) OCH 3 or a hydrogen atom
  • Embodiment 6 A compound according to Embodiment 5, wherein R 2 , R 4 and R 5 are the same or different and are a C1-C4 chain hydrocarbon group optionally having one or more halogen atoms.
  • R 2 is a C1-C4 chain hydrocarbon group optionally having one or more halogen atoms
  • the compound whose R 4 and R 5 are methyl groups.
  • R A is a C1-C10 alkanediyl group, a C2-C10 alkene diyl group, an ethynediyl group, a C3-C10 alkyndiyl group, a C3-C8 cycloalkanediyl group or a C3-C8 cycloalkene diyl group ⁇
  • the C1-C10 alkanediyl group, the C2-C10 alkene diyl group, the C3-C10 alkyndiyl group, the C3-C8 cycloalkanediyl group and the C3-C8 cycloalkene diyl group are selected from the group consisting of a cyano group and a halogen atom Compounds wherein one or more substituents may be included, and R B is a single bond.
  • R A is a C1-C10 alkanediyl group, a C2-C10 alkene diyl group, an ethyne diyl group, a C3-C10 alkyndiyl group, a C3-C8 cycloalkanediyl group or a C3-C8 cycloalkene diyl group ⁇
  • the C1-C10 alkanediyl group, the C2-C10 alkene diyl group, the C3-C10 alkyndiyl group, the C3-C8 cycloalkanediyl group and the C3-C8 cycloalkene diyl group are selected from the group consisting of a cyano group and a halogen atom Compounds wherein one or more substituents may be included, and R B is a single bond.
  • R A is a C1-C10 alkanediyl group, a C2-C10 alkene diyl group, an ethynediyl group, a C3-C10 alkyndiyl group, a C3-C8 cycloalkanediyl group or a C3-C8 cycloalkene diyl group ⁇
  • the C1-C10 alkanediyl group, the C2-C10 alkene diyl group, the C3-C10 alkyndiyl group, the C3-C8 cycloalkanediyl group and the C3-C8 cycloalkene diyl group are selected from the group consisting of a cyano group and a halogen atom Compounds wherein one or more substituents may be included, and R B is a single bond.
  • R A is C 1 -C 10 alkanediyl group, C 2 -C 10 alkene diyl group, ethyne diyl group, C 3 -C 10 alkyndiyl group, C 3 -C 8 cycloalkanediyl group or C 3 -C 8 cycloalkene diyl group ⁇
  • the C1-C10 alkanediyl group, the C2-C10 alkene diyl group, the C3-C10 alkyndiyl group, the C3-C8 cycloalkanediyl group and the C3-C8 cycloalkene diyl group are selected from the group consisting of a cyano group and a halogen atom Compounds wherein one or more substituents may be included, and R B is a single bond.
  • R A is a C1-C10 alkanediyl group, a C2-C10 alkene diyl group, an ethynediyl group, a C3-C10 alkyndiyl group, a C3-C8 cycloalkanediyl group or a C3-C8 cycloalkene diyl group ⁇
  • the C1-C10 alkanediyl group, the C2-C10 alkene diyl group, the C3-C10 alkyndiyl group, the C3-C8 cycloalkanediyl group and the C3-C8 cycloalkene diyl group are selected from the group consisting of a cyano group and a halogen atom Compounds wherein one or more substituents may be included, and R B is a single bond.
  • R A is a C1-C10 alkanediyl group, a C2-C10 alkene diyl group, an ethyne diyl group, a C3-C10 alkyndiyl group, a C3-C8 cycloalkanediyl group or a C3-C8 cycloalkene diyl group ⁇
  • the C1-C10 alkanediyl group, the C2-C10 alkene diyl group, the C3-C10 alkyndiyl group, the C3-C8 cycloalkanediyl group and the C3-C8 cycloalkene diyl group are selected from the group consisting of a cyano group and a halogen atom Compounds wherein one or more substituents may be included, and R B is a single bond.
  • R A is C 1 -C 10 alkanediyl group, C 2 -C 10 alkene diyl group, ethyne diyl group, C 3 -C 10 alkyndiyl group, C 3 -C 8 cycloalkanediyl group or C 3 -C 8 cycloalkene diyl group ⁇
  • the C1-C10 alkanediyl group, the C2-C10 alkene diyl group, the C3-C10 alkyndiyl group, the C3-C8 cycloalkanediyl group and the C3-C8 cycloalkene diyl group are selected from the group consisting of a cyano group and a halogen atom Compounds wherein one or more substituents may be included, and R B is a single bond.
  • R A is C 1 -C 10 alkanediyl group, C 2 -C 10 alkene diyl group, ethyne diyl group, C 3 -C 10 alkyndiyl group, C 3 -C 8 cycloalkanediyl group or C 3 -C 8 cycloalkene diyl group ⁇
  • the C1-C10 alkanediyl group, the C2-C10 alkene diyl group, the C3-C10 alkyndiyl group, the C3-C8 cycloalkanediyl group and the C3-C8 cycloalkene diyl group are selected from the group consisting of a cyano group and a halogen atom Compounds wherein one or more substituents may be included, and R B is a single bond.
  • Aspect 17 The compound according to aspect 1, wherein R A is a C 1 -C 6 alkanediyl group or a cyclohexane diyl group, and R B is a single bond.
  • Aspect 18 A compound according to aspect 2, wherein R A is a C 1 -C 6 alkanediyl group or a cyclohexane diyl group, and R B is a single bond.
  • Embodiment 19 A compound according to Embodiment 3, wherein R A is a C 1 -C 6 alkanediyl group or a cyclohexane diyl group, and R B is a single bond.
  • Aspect 20 Aspect 20.
  • Embodiment 21 A compound according to Embodiment 5, wherein R A is a C 1 -C 6 alkanediyl group or a cyclohexane diyl group, and R B is a single bond.
  • Embodiment 22 A compound according to embodiment 6, wherein R A is a C 1 -C 6 alkanediyl group or a cyclohexane diyl group, and R B is a single bond.
  • Embodiment 23 A compound according to Embodiment 7, wherein R A is a C 1 -C 6 alkanediyl group or a cyclohexane diyl group, and R B is a single bond.
  • Aspect 24 A compound according to aspect 8, wherein R A is a C 1 -C 6 alkanediyl group or a cyclohexane diyl group, and R B is a single bond.
  • Aspect 25. A compound according to aspect 1, wherein R A is a C 1 -C 3 alkanediyl group, and R B is a single bond.
  • Aspect 26 A compound according to Embodiment 7, wherein R A is a C 1 -C 6 alkanediyl group or a cyclohexane diyl group, and R B is a single bond.
  • a compound according to aspect 2 wherein R A is a C 1 -C 3 alkanediyl group, and R B is a single bond.
  • Aspect 27 A compound according to aspect 3, wherein R A is a C1-C3 alkanediyl group, and R B is a single bond.
  • Embodiment 28 A compound according to Embodiment 4, wherein R A is a C 1 -C 3 alkanediyl group, and R B is a single bond.
  • Aspect 29 A compound according to aspect 5, wherein R A is a C 1 -C 3 alkanediyl group, and R B is a single bond.
  • Aspect 30 A compound according to aspect 2, wherein R A is a C 1 -C 3 alkanediyl group, and R B is a single bond.
  • Embodiment 31 A compound according to Embodiment 7, wherein R A is a C 1 -C 3 alkanediyl group, and R B is a single bond.
  • Embodiment 32 A compound according to Embodiment 8, wherein R A is a C 1 -C 3 alkanediyl group, and R B is a single bond.
  • Ar is a C6-C10 aryl group optionally having one or more substituents selected from Group A.
  • Aspect 38 is a C1-C3 chain hydrocarbon group ⁇ wherein the C1-C3 chain hydrocarbon group is at least one substituent selected from the group consisting of a cyano group and a halogen atom Or (C1-C3 alkoxy) C1-C3 alkyl group, benzyl group, C (O) R 8 , C (O)
  • a compound according to aspect 37 wherein R 3 is a C 1 -C 3 chain hydrocarbon group, a benzyl group, C (O) R 8 , C (O) OR 8 or a hydrogen atom.
  • Embodiment 39 A compound according to Embodiment 37, wherein R 3 is an allyl group, a benzyl group, C (O) CH 3 , C (O) OCH 3 or a hydrogen atom.
  • Aspect 40. A compound according to aspect 37 wherein R 3 is an allyl group, C (O) CH 3 , C (O) OCH 3 or a hydrogen atom.
  • Embodiment 42 A compound according to Embodiment 41, wherein R 2 , R 4 and R 5 are the same or different and are a C1-C4 chain hydrocarbon group optionally having one or more halogen atoms.
  • R 2 is a C1-C4 chain hydrocarbon group optionally having one or more halogen atoms, The compound whose R 4 and R 5 are methyl groups.
  • Aspect 44 A compound according to aspect 41 wherein R 2 , R 4 and R 5 are methyl groups.
  • compounds X the combination of R A and R B is, R A is C1-C10 alkanediyl group or a C3-C8 cycloalkanediyl group ⁇ said C1-C10 alkanediyl group and said C3-C8 cycloalkyl And alkanediyl group may have one or more substituents selected from the group consisting of a cyano group and a halogen atom ⁇ , and a combination in which R B is a single bond; or R A is one or more substituents have C1-C3 may alkanediyl group selected from the group consisting of cyano group and a halogen atom, 1 is selected from the group R B is a cyano group and a halogen atom C3-C8 cycloalkanediyl group which may have the above substituents,
  • R 3 is a C1-C3 chain hydrocarbon group ⁇ wherein the C1-C3 chain hydrocarbon group has one or more substituents selected from the group consisting of a cyano group and a halogen atom Compounds which may be ⁇ , (C 1 -C 3 alkoxy) C 1 -C 3 alkyl group, benzyl group, C (O) R 8 , C (O) OR 8 or hydrogen atom.
  • R 3 is a C1-C3 chain hydrocarbon group ⁇ The C1-C3 chain hydrocarbon group has one or more substituents selected from the group consisting of a cyano group and a halogen atom Compounds which may be ⁇ , (C 1 -C 3 alkoxy) C 1 -C 3 alkyl group, benzyl group, C (O) R 8 , C (O) OR 8 or hydrogen atom.
  • Aspect 50 A compound according to aspect 46 wherein R 3 is a C 1 -C 3 chain hydrocarbon group, a benzyl group, C (O) R 8 , C (O) OR 8 or a hydrogen atom.
  • a compound according to aspect 47 wherein R 3 is a C 1 -C 3 chain hydrocarbon group, a benzyl group, C (O) R 8 , C (O) OR 8 or a hydrogen atom.
  • Aspect 52. A compound according to aspect 46 wherein R 3 is an allyl group, a benzyl group, C (O) CH 3 , C (O) OCH 3 or a hydrogen atom.
  • Aspect 53. A compound according to aspect 47 wherein R 3 is an allyl group, a benzyl group, C (O) CH 3 , C (O) OCH 3 or a hydrogen atom.
  • Embodiment 56 A compound according to Embodiment 55 wherein R 2 , R 4 and R 5 are the same or different and are a C1-C4 chain hydrocarbon group optionally having one or more halogen atoms. [Aspect 57] In aspect 55, R 2 is a C1-C4 chain hydrocarbon group optionally having one or more halogen atoms, The compound whose R 4 and R 5 are methyl groups.
  • R A is C 1 -C 6 alkanediyl group or cyclohexanediyl group, and R B is a single bond;
  • R A is a C1-C3 alkanediyl group which may have one or more halogen atoms,
  • R B is a phenylene group, a naphthylene group, a thienylene group, a flanylene group, a pyrrolylene group, a thiazolylene group, an isothiazolylene group, an oxazolylene group , Isoxazolylene group, pyrazolylene group, imidazolylene group, triazolylene group, pyridylene group, pyridazinylene group, pyrimidinylene group, pyrazinylene group, or triazinylene
  • R 3 is a C1-C3 chain hydrocarbon group ⁇ wherein the C1-C3 chain hydrocarbon group has one or more substituents selected from the group consisting of a cyano group and a halogen atom Compounds which may be ⁇ , (C 1 -C 3 alkoxy) C 1 -C 3 alkyl group, benzyl group, C (O) R 8 , C (O) OR 8 or hydrogen atom.
  • R 3 is a C1-C3 chain hydrocarbon group ⁇
  • the C1-C3 chain hydrocarbon group has one or more substituents selected from the group consisting of a cyano group and a halogen atom Compounds which may be ⁇ , (C 1 -C 3 alkoxy) C 1 -C 3 alkyl group, benzyl group, C (O) R 8 , C (O) OR 8 or hydrogen atom.
  • 64 The compound according to Aspect 60, wherein R 3 is a C1-C3 chain hydrocarbon group, a benzyl group, C (O) R 8 , C (O) OR 8 or a hydrogen atom.
  • a compound according to aspect 61 wherein R 3 is a C 1 -C 3 chain hydrocarbon group, a benzyl group, C (O) R 8 , C (O) OR 8 or a hydrogen atom.
  • Aspect 66. A compound according to aspect 60 wherein R 3 is an allyl group, a benzyl group, C (O) CH 3 , C (O) OCH 3 or a hydrogen atom.
  • R 3 is an allyl group, a benzyl group, C (O) CH 3 , C (O) OCH 3 or a hydrogen atom.
  • a compound according to aspect 69 wherein R 2 , R 4 and R 5 are methyl groups.
  • [Mode 73] a combination of the present compound X, wherein R A is a C 1 -C 3 alkanediyl group, and R B is a single bond; or R A is a C1-C3 alkanediyl group which may have one or more halogen atoms, R B is a phenylene group or a thiazolylene group ⁇ the phenylene group and the thiazolylene group are one or more selected from group D
  • R 3 is a C1-C3 chain hydrocarbon group ⁇
  • the C1-C3 chain hydrocarbon group has one or more substituents selected from the group consisting of a cyano group and a halogen atom Compounds which may be ⁇ , (C 1 -C 3 alkoxy) C 1 -C 3 alkyl group, benzyl group, C (O) R 8 , C (O) OR 8 or hydrogen atom.
  • R 3 is a C1-C3 chain hydrocarbon group ⁇ wherein the C1-C3 chain hydrocarbon group has one or more substituents selected from the group consisting of a cyano group and a halogen atom Compounds which may be ⁇ , (C 1 -C 3 alkoxy) C 1 -C 3 alkyl group, benzyl group, C (O) R 8 , C (O) OR 8 or hydrogen atom.
  • Aspect 78. A compound according to aspect 74 wherein R 3 is a C 1 -C 3 chain hydrocarbon group, a benzyl group, C (O) R 8 , C (O) OR 8 or a hydrogen atom.
  • Aspect 80. A compound according to aspect 74 wherein R 3 is an allyl group, a benzyl group, C (O) CH 3 , C (O) OCH 3 or a hydrogen atom.
  • Embodiment 81. A compound according to Embodiment 75 wherein R 3 is an allyl group, a benzyl group, C (O) CH 3 , C (O) OCH 3 or a hydrogen atom.
  • Embodiment 84. A compound according to embodiment 83, wherein R 2 , R 4 and R 5 are the same or different and are a C1-C4 chain hydrocarbon group optionally having one or more halogen atoms.
  • R 2 is a C1-C4 chain hydrocarbon group optionally having one or more halogen atoms, The compound whose R 4 and R 5 are methyl groups.
  • Aspect 86 A compound according to aspect 83 wherein R 2 , R 4 and R 5 are methyl groups.
  • R 2 , R 4 and R 5 are methyl groups.
  • Ar is a C6-C10 aryl group optionally having one or more substituents selected from Group A.
  • Ar is a phenyl group optionally having one or more substituents selected from Group A.
  • the compound represented by the formula (Ib) (hereinafter referred to as compound (Ib)) is a compound represented by the formula (Ia) (hereinafter referred to as compound (Ia)) and the compound represented by the formula (R-1)
  • the compound (R-1) can be produced by reacting in the presence of a base.
  • R 3a is a C1-C3 chain hydrocarbon group ⁇ the C1-C3 chain hydrocarbon group may have one or more substituents selected from the group consisting of a cyano group and a halogen atom And (C 1 -C 3 alkoxy) C 1 -C 3 alkyl group or benzyl group optionally having one or more substituents selected from group A,
  • X 1 represents a chlorine atom, a bromine atom, an iodine atom, C 1- C10 perfluoroalkanesulfonyloxy group or tosyloxy group is represented, and the other symbols are as defined above.
  • the reaction is usually carried out in a solvent.
  • Examples of the solvent used for the reaction include hydrocarbons such as hexane, toluene and xylene (hereinafter referred to as hydrocarbons); diethyl ether, ethylene glycol dimethyl ether, methyl tert-butyl ether (hereinafter referred to as MTBE), and tetrahydrofuran
  • hydrocarbons such as hexane, toluene and xylene
  • MTBE methyl tert-butyl ether
  • halogenated hydrocarbons such as chloroform and chlorobenzene (hereinafter referred to as halogenated hydrocarbons)
  • dimethylformamide hereinafter referred to as DMF
  • N Aprotic polar solvents such as methyl pyrrolidone and dimethyl sulfoxide
  • esters such as ethyl acetate (hereinafter referred to as esters) and mixtures thereof.
  • Examples of the base used for the reaction include alkali metal carbonates such as sodium carbonate and potassium carbonate (hereinafter referred to as alkali metal carbonates); organic bases such as triethylamine and pyridine (hereinafter referred to as organic bases) .
  • alkali metal carbonates such as sodium carbonate and potassium carbonate
  • organic bases such as triethylamine and pyridine
  • the compound (R-1) is used in a proportion of usually 1 mol to 10 mol and the base is usually used in a proportion of 1 mol to 10 mol based on 1 mol of the compound (Ia).
  • the reaction time is usually in the range of 5 minutes to 72 hours.
  • the reaction temperature is usually in the range of -20 ° C to 120 ° C.
  • compound (Ib) can be isolated by post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
  • the compound (R-1) is a commercially available compound or can be produced according to a known method.
  • the compound represented by the formula (Ic) is a compound (Ia) and the compound represented by the formula (R-2) (hereinafter referred to as compound (R-2)) It can be produced by reacting in the presence of a base.
  • R 3b represents C (O) R 8 or C (O) OR 8 , and the other symbols have the same meanings as described above.
  • the reaction is usually carried out in a solvent.
  • the solvent used for the reaction include hydrocarbons, ethers, halogenated hydrocarbons, aprotic polar solvents, esters and mixtures thereof.
  • a base used for reaction an alkali metal carbonate and organic bases are mentioned, for example.
  • the compound (R-2) is usually used in a proportion of 1 mol to 10 mol and the base is usually used in a proportion of 1 mol to 10 mol with respect to 1 mol of the compound (Ia).
  • the reaction time is usually in the range of 5 minutes to 24 hours.
  • the reaction temperature is usually in the range of ⁇ 20 ° C. to 100 ° C.
  • compound (Ic) can be isolated by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
  • the compound (R-2) is a commercially available compound or can be produced according to a known method.
  • the compound represented by the formula (Id) (hereinafter referred to as a compound (Id)) is a compound of the compound (Ia) and the compound represented by the formula (R-3) (hereinafter referred to as a compound (R-3)) It can be manufactured by [Wherein, the symbols have the same meanings as described above. ]
  • the reaction is carried out without solvent or in a solvent.
  • the solvent used for the reaction include hydrocarbons, ethers, halogenated hydrocarbons, aprotic polar solvents, esters and mixtures thereof. You may use a base for reaction as needed. As a base used for reaction, organic bases are mentioned, for example.
  • the compound (R-3) is usually used in a proportion of 1 mol to 100 mol, relative to 1 mol of the compound (Ia).
  • the base is usually used in a proportion of 1 mole to 10 moles relative to 1 mole of the compound (Ia).
  • the reaction time is usually in the range of 5 minutes to 72 hours.
  • the reaction temperature is usually in the range of ⁇ 20 ° C. to 180 ° C.
  • water is added to the reaction mixture, extraction is performed with an organic solvent, and the organic layer is subjected to post-treatment operations such as drying and concentration to isolate the compound (Id).
  • the compound (R-3) is a commercially available compound or can be produced according to a known method.
  • the compound represented by the formula (Ie) (hereinafter referred to as compound (Ie)) is a compound of the compound (Ia) and the compound represented by the formula (R-4) (hereinafter referred to as compound (R-4)) It can be manufactured by [Wherein, the symbols have the same meanings as described above. ]
  • the reaction is usually carried out in a solvent.
  • the solvent used for the reaction include hydrocarbons, ethers, halogenated hydrocarbons, aprotic polar solvents, esters and mixtures thereof. You may use a base for reaction as needed.
  • the base used in the reaction examples include alkali metal hydrogen carbonates such as sodium hydrogen carbonate and potassium hydrogen carbonate (hereinafter referred to as alkali metal hydrogen carbonates); and organic bases.
  • the compound (R-4) is usually used in a proportion of 1 mole to 10 moles relative to 1 mole of the compound (Ia).
  • the base is usually used in a proportion of 1 mole to 10 moles relative to 1 mole of the compound (Ia).
  • the reaction time is usually in the range of 5 minutes to 72 hours.
  • the reaction temperature is usually in the range of ⁇ 20 ° C. to 80 ° C.
  • compound (Ie) can be isolated by post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
  • the compound (R-4) is a commercially available compound.
  • a compound represented by the formula (Ig) (hereinafter referred to as a compound (Ig)) is produced by reacting a compound represented by the formula (If) (hereinafter referred to as a compound (If)) with an oxidizing agent.
  • a compound represented by the formula (If) hereinafter referred to as a compound (If)
  • an oxidizing agent e.g., a compound (Ig)
  • the reaction is usually carried out in a solvent.
  • solvents used for the reaction include halogenated hydrocarbons; nitriles such as acetonitrile (hereinafter referred to as nitriles); esters; alcohols such as methanol and ethanol (hereinafter referred to as alcohols); acetic acid; These mixtures are mentioned.
  • the oxidizing agent used for the reaction examples include sodium periodate, m-chloroperbenzoic acid (hereinafter referred to as mCPBA) and hydrogen peroxide.
  • mCPBA m-chloroperbenzoic acid
  • hydrogen peroxide sodium carbonate or a catalyst may be used as needed.
  • tungstic acid and sodium tungstate are mentioned, for example.
  • the oxidizing agent is usually used in a proportion of 1 mole to 10 moles relative to 1 mole of the compound (If).
  • sodium carbonate sodium carbonate is usually used in a ratio of 0.01 mol to 1 mol with respect to 1 mol of compound (If).
  • the catalyst When a catalyst is used, the catalyst is usually used in a proportion of 0.01 to 0.5 mol per 1 mol of compound (If).
  • the reaction time is usually in the range of 5 minutes to 24 hours.
  • the reaction temperature is usually in the range of ⁇ 20 ° C. to 80 ° C.
  • water is added to the reaction mixture, extraction is performed with an organic solvent, and the organic layer is washed with an aqueous solution of a reducing agent (eg, sodium sulfite, sodium thiosulfate) and an aqueous solution of a base (eg, sodium hydrogencarbonate) as necessary.
  • a reducing agent eg, sodium sulfite, sodium thiosulfate
  • a base eg, sodium hydrogencarbonate
  • Compound (Ia) can be produced by reacting a compound represented by the formula (Ih) (hereinafter referred to as compound (Ih)), a palladium catalyst and a base.
  • a compound represented by the formula (Ih) hereinafter referred to as compound (Ih)
  • a palladium catalyst and a base.
  • R 30 represents a 2-propenyl group or 2-butenyl group, and the other symbols have the same meanings as described above.
  • the reaction is usually carried out in a solvent.
  • the solvent used for the reaction include aliphatic halogenated hydrocarbons, alcohols, aprotic polar solvents, esters, ethers, acetic acid, water and mixtures thereof.
  • a base used for reaction an alkali metal carbonate and organic bases are mentioned, for example.
  • a palladium catalyst used for reaction tetrakis (triphenyl phosphine) palladium (0) and dibenzylidene acetone palladium (0) are mentioned, for example.
  • the palladium catalyst is usually used in a proportion of 0.01 to 0.5 mol and the base is usually used in a proportion of 1 to 10 mol per 1 mol of the compound (Ih).
  • the reaction time is usually in the range of 5 minutes to 24 hours.
  • the reaction temperature is usually in the range of ⁇ 20 ° C. to 80 ° C.
  • water is added to the reaction mixture, and when compound (Ia) precipitates, the solid is filtered off; compound (Ia) is isolated by post-treatment operation such as extraction with an organic solvent can do.
  • the compound represented by the formula (Ii) (hereinafter referred to as a compound (Ii)) is a compound represented by the formula (M-1) (hereinafter referred to as a compound (M-1)) and the compound represented by the formula (R-5) It can be produced by reacting the compound shown below (hereinafter referred to as compound (R-5)).
  • R 31 represents a 2-propenyl group, 2-butenyl group or benzyl group
  • R C represents a C 1 -C 8 alkanediyl group, a C 2 -C 8 alkene diyl group, an ethynediyl group, a C 3 -C 8 alkyl diyl group, a C 3 -C 8 Cycloalkanediyl group or C3-C8 cycloalkene diyl group ⁇ The C1-C8 alkanediyl group, the C2-C8 alkene diyl group, the C3-C8 alkyndiyl group, the C3-C8 cycloalkanediyl group, and the C3-C8 cycloalkene
  • the diyl group may have one or more substituents selected from the group consisting of a cyano group and a halogen atom ⁇ , and the other symbols have the same meanings as described above.
  • the reaction is usually carried out in a solvent.
  • the solvent used for the reaction include ethers, hydrocarbons, halogenated hydrocarbons and mixtures thereof.
  • the compound (R-5) is usually used in a proportion of 1 mole to 10 moles relative to 1 mole of the compound (M-1).
  • the reaction time is usually in the range of 5 minutes to 24 hours.
  • the reaction temperature is usually in the range of ⁇ 20 ° C. to 80 ° C.
  • compound (Ii) can be isolated by post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, drying and concentration of the organic layer, and the like.
  • the compound (R-5) is a commercially available compound or can be produced, for example, according to the method described in Organic Letters, 2014, 16, 6424.
  • the compound represented by the formula (Ik) (hereinafter referred to as the compound (Ik)) is a compound (M-1) and the compound represented by the formula (R-6) (hereinafter referred to as the compound (R-6)) Can be produced by reacting [Wherein, the symbols have the same meanings as described above. ]
  • the reaction is usually carried out in a solvent.
  • the solvent used for the reaction include ethers, halogenated hydrocarbons, alcohols, aprotic polar solvents, esters and mixtures thereof.
  • the compound (R-6) may form a salt such as hydrochloride.
  • the reaction may use a base as necessary. As a base used for reaction, organic bases are mentioned, for example.
  • the compound (R-6) is usually used in a proportion of 1 mole to 10 moles relative to 1 mole of the compound (M-1).
  • a base When a base is used, it is generally used in a proportion of 1 mole to 10 moles relative to 1 mole of the compound (M-1).
  • the reaction time is usually in the range of 5 minutes to 24 hours.
  • the reaction temperature is usually in the range of 20 ° C to 100 ° C.
  • compound (Ik) can be isolated by post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, drying and concentrating the organic layer, and the like.
  • Compound (R-6) is a commercially available compound or can be produced, for example, according to the method described in Journal of Medicinal Chemistry, 2007, 50, 6367.
  • the compound represented by the formula (Ip) (hereinafter referred to as a compound (Ip)) is a compound (M-1) and the compound represented by the formula (R-13) (hereinafter referred to as a compound (R-13)) Can be produced by reacting [Wherein, the symbols have the same meanings as described above. ]
  • the reaction is usually carried out in a solvent.
  • the solvent used for the reaction include ethers, halogenated hydrocarbons, alcohols, aprotic polar solvents, esters and mixtures thereof.
  • the compound (R-13) may form a salt such as hydrochloride.
  • the reaction may use a base as necessary. As a base used for reaction, organic bases are mentioned, for example.
  • the compound (R-13) is usually used in a proportion of 1 mole to 10 moles relative to 1 mole of the compound (M-1).
  • a base When a base is used, it is generally used in a proportion of 1 mole to 10 moles relative to 1 mole of the compound (M-1).
  • the reaction time is usually in the range of 5 minutes to 24 hours.
  • the reaction temperature is usually in the range of 20 ° C to 100 ° C.
  • compound (Ip) can be isolated by post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, drying and concentration of the organic layer, and the like.
  • the compound (R-13) is a commercially available compound or can be produced, for example, according to the method described in Journal of Medicinal Chemistry, 2010, 53, 6301.
  • the compound represented by the formula (Im) (hereinafter referred to as a compound (Im)) is a compound represented by the formula (M-2) (hereinafter referred to as a compound (M-2)), a compound represented by the formula (R-7) It can be produced by reacting the compound shown below (hereinafter referred to as compound (R-7)) and a base.
  • X 2 represents a chlorine atom or a bromine atom
  • L 3 represents an oxygen atom
  • -NR 6 -, - S ( O) m - or -O-N CR 7 - represents #, other
  • the symbols have the same meaning as described above. ]
  • the reaction is usually carried out in a solvent.
  • Examples of the solvent used for the reaction include hydrocarbons, ethers, halogenated hydrocarbons, aprotic polar solvents, esters and mixtures thereof.
  • Examples of the base used for the reaction include sodium hydride, alkali metal carbonates and organic bases.
  • the compound (R-7) is usually used in a proportion of 1 mol to 10 mol and the base is usually used in a proportion of 1 mol to 10 mol with respect to 1 mol of the compound (M-2).
  • the reaction time is usually in the range of 5 minutes to 24 hours.
  • the reaction temperature is usually in the range of ⁇ 20 ° C. to 100 ° C.
  • Compound (R-7) is a commercially available compound or can be produced according to a known method.
  • the compound represented by the formula (In) (hereinafter referred to as a compound (In)) is a compound represented by the formula (M-3) (hereinafter referred to as a compound (M-3)), a compound represented by the formula (R-8) It can be produced by reacting a compound shown below (hereinafter referred to as compound (R-8)) and a base. [Wherein, the symbols have the same meanings as described above. ] The reaction can be carried out according to production method 10, using compound (R-3) instead of compound (M-2) and using compound (M-3) instead of compound (R-7). .
  • Compound (R-8) is a commercially available compound or can be produced according to a known method.
  • the compound represented by the formula (Iq) is a compound (M-2), a compound represented by the formula (R-14) (hereinafter referred to as the compound (R-14)), It can be produced by reacting a metal catalyst and a base.
  • M 1 represents B (OR 33 ) 2 or 4,4,5,5-tetramethyl-1,3,2-dioxaborolan-2-yl group
  • R 33 represents a hydrogen atom or a C1-C6 alkyl
  • the reaction is usually carried out in a solvent.
  • the solvent used for the reaction includes, for example, ethers, hydrocarbons, aprotic polar solvents, water and mixtures thereof.
  • the metal catalyst used for the reaction include tetrakis (triphenylphosphine) palladium (0), 1,1′-bis (diphenylphosphino) ferrocenepalladium (II) dichloride, tris (dibenzylideneacetone) dipalladium (0) And palladium catalysts such as palladium (II) acetate, and bis (cyclooctadiene) nickel (0).
  • a base used for reaction an alkali metal carbonate and organic bases are mentioned, for example.
  • a ligand may be used for the reaction, if necessary.
  • Examples of the ligand used for the reaction include triphenylphosphine, xanthophos, 2,2′-bis (diphenylphosphino) -1,1′-binaphthyl, 1,1′-bis (diphenylphosphino) ferrocene, 2 Dicyclohexylphosphino-2 ′, 4 ′, 6′-triisopropylbiphenyl, 2-dicyclohexylphosphino-2 ′, 6′-dimethoxybiphenyl and 1,2-bis (diphenylphosphino) ethane.
  • the ligand When a ligand is used in the reaction, the ligand is generally used in a ratio of 0.01 to 1 mole relative to 1 mole of the compound (M-2).
  • the compound (R-14) In the reaction, the compound (R-14) is usually at a ratio of 1 mol to 10 mol, the metal catalyst is usually at a ratio of 0.01 to 0.5 mol, and the base is usually at 1 mol to 1 mol of the compound (M-2). It is used in a proportion of 0.1 to 5 moles.
  • the reaction time is usually in the range of 5 minutes to 48 hours.
  • the reaction temperature is usually in the range of 20 ° C to 200 ° C.
  • compound (Iq) can be isolated by post-treatment operation such as adding water to the reaction mixture, extracting with an organic solvent, drying and concentration of the organic layer, and the like.
  • Compound (R-14) is a commercially available compound or can be produced according to a known method.
  • the compound represented by the formula (Ir) includes a compound (M-3), a compound represented by the formula (R-15) (hereinafter referred to as a compound (R-15)) and It can be produced by reacting a base.
  • the reaction can be carried out according to production method 10, using compound (R-15) instead of compound (M-2) and compound (R-3) instead of compound (M-3).
  • Compound (R-15) is a commercially available compound or can be produced according to a known method.
  • the compound represented by the formula (Is) (hereinafter referred to as a compound (Is)) is a compound (M-1) and the compound represented by the formula (R-16) (hereinafter referred to as a compound (R-16)) Can be produced by reacting [Wherein, R C represents phenylene group, naphthylene group, thienylene group, furanylene group, pyrrolylene group, thiazolylene group, isothiazolylene group, oxazolylene group, isoxazolylene group, pyrazolylene group, imidazolylene group, triazolylene group, pyridylene group, pyridazinylene Group, pyrimidinylene group, pyrazinylene group, triazinylene group ⁇ the phenylene group, the naphthyrylene group, the thienylene group, the furanylene group, the pyrrolylene group, the thiazolylene group, the isothiazolylene
  • ⁇ M 2 represents a lithium atom, MgX 2 or ZnX 2 , and the other symbols have the same meanings as described above, a thiadiazolylene group, an oxadiazolylene group or a tetradinylene group.
  • the reaction is usually carried out in a solvent.
  • a solvent used for reaction hydrocarbons, ethers, and these mixtures are mentioned, for example.
  • the compound (R-16) is usually used in a proportion of 1 mole to 10 moles relative to 1 mole of the compound (M-1).
  • the reaction time is usually in the range of 5 minutes to 24 hours.
  • the reaction temperature is usually in the range of -100 ° C to 60 ° C.
  • the compound (Is) can be isolated by post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, drying and concentration of the organic layer, and the like.
  • Compound (R-16) is a commercially available compound or can be produced according to a known method.
  • Reference manufacturing method 1 Compound (M-1) can be produced by reacting compound (M-3) with an oxidizing agent.
  • the oxidizing agent used for the reaction include manganese (IV) oxide, Dess-Martin reagent and 2-iodoxybenzoic acid.
  • the reaction is usually carried out in a solvent.
  • the solvent used for the reaction include halogenated hydrocarbons, nitriles, esters and mixtures thereof.
  • the oxidizing agent is usually used in a proportion of 1 mole to 50 moles relative to 1 mole of the compound (M-3).
  • the reaction time is usually in the range of 5 minutes to 24 hours.
  • the reaction temperature is usually in the range of ⁇ 20 ° C. to 80 ° C.
  • water is added to the reaction mixture, extraction is performed with an organic solvent, and the organic layer is subjected to post-treatment operations such as drying and concentration to isolate compound (M-1).
  • Compound (M-2) can be produced by reacting compound (M-3) with a chlorinating agent or a brominating agent.
  • the chlorinating agent or brominating agent used in the reaction includes, for example, thionyl chloride, phosphorus oxychloride, oxalyl chloride, phosphorus tribromide, a mixture of carbon tetrabromide and triphenylphosphine and phosphorus oxybromide.
  • the reaction is usually carried out in a solvent. Examples of the solvent used for the reaction include hydrocarbons, halogenated hydrocarbons, ethers, nitriles, esters and mixtures thereof.
  • a chlorinating agent or a brominating agent is usually used in a proportion of 1 mole to 10 moles relative to 1 mole of the compound (M-3).
  • the reaction time is usually in the range of 5 minutes to 24 hours.
  • the reaction temperature is usually in the range of ⁇ 20 ° C. to 100 ° C.
  • water is added to the reaction mixture, extraction is performed with an organic solvent, and the organic layer is subjected to post-treatment operations such as drying and concentration to isolate the compound (M-2).
  • the compound (M-3) can be produced by reacting a compound represented by the formula (M-4) (hereinafter referred to as a compound (M-4)) with a base.
  • a compound represented by the formula (M-4) hereinafter referred to as a compound (M-4)
  • R 32 represents a methyl group or a trifluoromethyl group, and the other symbols have the same meanings as described above.
  • the reaction is usually carried out in a solvent.
  • a solvent used for reaction alcohol, water, and these mixtures are mentioned, for example.
  • As a base used for reaction an alkali metal carbonate is mentioned, for example.
  • the base is usually used in a proportion of 0.1 mol to 10 mol per 1 mol of the compound (M-4).
  • the reaction time is usually in the range of 5 minutes to 24 hours.
  • reaction temperature is usually in the range of ⁇ 20 ° C. to 80 ° C.
  • compound (M-3) can be isolated by post-treatment operation such as adding water to the reaction mixture, extracting with an organic solvent, drying and concentrating the organic layer, and the like.
  • the compound (M-4) is a compound represented by the formula (M-5) (hereinafter referred to as a compound (M-5)) and a compound represented by the formula (R-9) (hereinafter referred to as a compound (R-9) Can be produced by reacting with [Wherein, the symbols have the same meanings as described above. ]
  • the reaction is carried out without solvent or in a solvent.
  • the solvent used for the reaction include hydrocarbons, ethers, halogenated hydrocarbons and mixtures thereof.
  • the compound (R-9) is usually used in a proportion of 1 mole to 100 moles relative to 1 mole of the compound (M-5).
  • the reaction time is usually in the range of 5 minutes to 24 hours.
  • reaction temperature is usually in the range of ⁇ 20 ° C. to 180 ° C.
  • water is added to the reaction mixture, extraction is performed with an organic solvent, and the organic layer is subjected to post-treatment operations such as drying and concentration to isolate the compound (M-4).
  • Compound (R-9) is a commercially available compound.
  • the compound (M-5) can be produced by reacting a compound represented by the formula (M-6) (hereinafter referred to as a compound (M-6)) with an oxidizing agent. [Wherein, the symbols have the same meanings as described above. ] The reaction can be carried out according to production method 5.
  • the compound (M-6) is a compound represented by the formula (M-7) (hereinafter referred to as a compound (M-7)) and a compound represented by the formula (R-10) (hereinafter referred to as a compound (R-10) Can be produced by reacting a metal catalyst and a base).
  • X 3 represents a bromine atom or an iodine atom, and the other symbols have the same meanings as described above.
  • the reaction can be carried out according to production method 12.
  • Compound (R-10) is a commercially available compound or can be produced according to a known method.
  • the compound (M-7) is a compound represented by the formula (M-8) (hereinafter referred to as compound (M-8)) and a compound represented by the formula (R-11) (hereinafter referred to as the compound (R-11) Can be produced by reacting with [Wherein, X 4 represents a chlorine atom, a bromine atom, an iodine atom, a mesyloxy group or a tosyloxy group, and the other symbols have the same meanings as described above. ] The reaction can be carried out according to production method 1.
  • Compound (R-11) is a commercially available compound or can be produced according to a known method.
  • the compound (M-8) is a compound represented by the formula (M-9) (hereinafter referred to as the compound (M-9)) and a compound represented by the formula (R-12) (hereinafter the compound (R-12) Can be produced by reacting with [Wherein, the symbols have the same meanings as described above. ]
  • the reaction is usually carried out in a solvent.
  • a solvent used for reaction alcohol, ether, and these mixtures are mentioned, for example.
  • the compound (R-12) is usually used in a proportion of 1 mole to 10 moles relative to 1 mole of the compound (M-9).
  • the reaction time is usually in the range of 5 minutes to 48 hours.
  • the reaction temperature is usually in the range of -20 ° C to 140 ° C.
  • compound (M-8) precipitates, the solid is collected by filtration; and post treatment operation such as addition of water and extraction with an organic solvent is carried out to obtain compound (M-8) alone. It can be released.
  • the compound (R-12) is a commercially available compound.
  • Reference manufacturing method 9 Compound (M-9) can be produced by heating a compound represented by formula (M-10) (hereinafter referred to as compound (M-10)).
  • compound (M-10) a compound represented by formula (M-10)
  • R 34 represents a methyl group or an ethyl group, and the other symbols have the same meanings as described above.
  • the reaction is carried out without solvent or in a solvent.
  • a solvent used for reaction alcohol, an aprotic polar solvent, and these mixtures are mentioned, for example.
  • salts may be used if necessary. Examples of salts used in the reaction include sodium chloride, lithium chloride and sodium cyanide. When a salt is used, the salt is usually used in a proportion of 1 mole to 10 moles relative to 1 mole of the compound (M-10).
  • the reaction time is usually in the range of 5 minutes to 48 hours.
  • the reaction temperature is usually in the range of 140 ° C to 200 ° C.
  • the compound (M-10) is a compound represented by the formula (M-11) (hereinafter referred to as a compound (M-11)) and a compound represented by the formula (M-12) (hereinafter referred to as the compound (M-12) Can be produced by reacting with [Wherein, R 35 represents a methyl group or an ethyl group, and the other symbols have the same meanings as described above. ]
  • the reaction is carried out without solvent or in a solvent.
  • the solvent used for the reaction includes, for example, ethers, hydrocarbons, aprotic polar solvents and mixtures thereof.
  • the compound (M-12) is usually used in a ratio of 0.1 to 10 moles relative to 1 mole of the compound (M-11).
  • the reaction temperature is usually in the range of 0 ° C to 200 ° C.
  • the reaction time is usually in the range of 5 minutes to 72 hours.
  • compound (M-10) precipitates, the solid is collected by filtration; post treatment operation such as addition of water and extraction with an organic solvent is carried out to obtain compound (M-10) alone. It can be released.
  • Compound (M-11) and compound (M-12) are commercially available compounds, or can be produced according to known methods.
  • the compound of the present invention or the compound of the present invention X is a group (a), a group (b), a group (c), a group (d), a group (e), a group (f), a group (g), and a group (h) And one or more components (hereinafter referred to as "the components") selected from the group consisting of
  • the use in combination or in combination means that the compound of the present invention or the compound of the present invention and the component are used simultaneously, separately or at time intervals.
  • the present component and the compound of the present invention or the compound of the present invention X may be contained in separate formulations.
  • composition A containing one or more components selected from the group consisting of groups (a) and (b), and the compound X of the present invention.
  • Group (a) includes acetylcholinesterase inhibitors (eg carbamate insecticides, organophosphorus insecticides), GABAergic chloride ion channel antagonists (eg phenylpyrazole insecticides), sodium channel modulators (eg pyrethroid insecticides) Nicotinic acetylcholine receptor antagonistic modulators (eg, neonicotinoid insecticides), nicotinic acetylcholine receptor allosteric modulators, glutamatergic chloride ion channel allosteric modulators (eg, macrolide insecticides), juvenile hormone mimic , Multi-site inhibitor, chordal organ TRPV channel modulator, mite growth inhibitor, mitochondrial ATP biosynthesis enzyme inhibitor, oxidative phosphorylation uncoupling agent, nicotinic acetylcholine receptor Channel blockers (eg, nereistoxin insecticides), chitin synthesis inhibitors, molting inhibitors, ecdysone receptor
  • Group (b) includes nucleic acid synthesis inhibitors (eg, phenylamide fungicides, acyl amino acid fungicides), cell division and cytoskeleton inhibitors (eg, MBC fungicides), respiratory inhibitors (eg, QoI fungicides) , QiI fungicides), amino acid synthesis and protein synthesis inhibitors (eg, anilinopyridine fungicides), signal transduction inhibitors, lipid synthesis and membrane synthesis inhibitors, sterol biosynthesis inhibitors (eg, triazole etc.
  • nucleic acid synthesis inhibitors eg, phenylamide fungicides, acyl amino acid fungicides
  • cell division and cytoskeleton inhibitors eg, MBC fungicides
  • respiratory inhibitors eg, QoI fungicides
  • QiI fungicides QiI fungicides
  • amino acid synthesis and protein synthesis inhibitors eg, anilinopyridine fungicides
  • DMI DMI
  • bactericidal agents cell wall synthesis inhibitors, melanin synthesis inhibitors, plant defense inducers, multi-acting point contact active disinfectants, microbial disinfectants, and other bactericidal active ingredients. These are described in the classification based on the mechanism of action of FRAC.
  • Group (c) is a group of plant growth regulators (including mycorrhizal fungi and rhizobia).
  • Group (d) is a group of safeners.
  • Group (e) is a group of synergists.
  • Group (f) is a group of repellent components consisting of a bird repellent component, an insect repellent component, and an animal repellent component.
  • Group (g) is a group of mollusc components.
  • Group (h) is a group of insect pheromone.
  • alanicarb (Salyx + SX) means a combination of alanicarb (Salyx).
  • SX means any one compound of the present invention X selected from the compound groups SX1 to SX264 described in the Examples.
  • all of the components described below are known components and can be obtained from commercially available preparations or can be produced by known methods. When the component is a microorganism, it can also be obtained from a bacteria depository.
  • the numbers in parentheses indicate CAS RN (registered trademark).
  • Combinations of the present component of the above group (a) with the compound of the present invention Abamectin + SX, acephate + SX, acequinocyl + SX, acetamiprid + SX, acririnathrin + SX, acynonapyr + SX, afidopyropene + SX, afoxolaneal (Afoxolaner) + SX, alaniccarb (alanycarb) + SX, aldicarb (aldicarb) + SX, allethrin + SX, alpha-cypermethrin (alpha-cypermethrin) + SX, alpha-endosulfan (alpha-endosulfan) + SX, phosphorylated Aluminum (phosphide) + SX, amitraz (Amitraz) + SX, azadirachtin + SX, azamethiphos (Azamethiphos) + SX, azin
  • pomonella granule disease virus V22 (Cydia pomonella GV V22) + SX, Cryptofrebbia leukotleta granule disease virus (Cryptophlebia leucotreta GV) + SX, Dendrolimus punctatus cytosolic virus (Dendrolimus punctatus cypovirus) + SX, Helicoverpa armigera nuclear polyhedrosis virus BV-0003 strain (Helicoverpa armigera NPV BV-0003) + SX, Helicoverpa zea nuclear polyhedra Disease virus (Helicoverpa zea NPV) + SX, Lymantria dispar nucleopolyhedrovirus (Lymantria dispar NPV) + SX, ⁇ ⁇ ⁇ ⁇ ⁇ (Mamestra brassicae NPV) + SX, ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ Virus (Mamestra configura
  • Strain AQ175 (Bacillus sp. AQ 175) + SX, Bacillus sp. Strain AQ 177 (Bacillus sp. AQ 177) + SX, Bacillus sp. Strain AQ 178 (Bacillus sp.
  • Thuringiensis AQ 52 strain Bacillus thuringiensis AQ 52 + SX, Bacillus thuringiensis BD # 32 strain (Bacillus thuringiensis BD # 32) + SX, Bacillus thuringiensis CR-371 strain (Bacillus thuringiensis CR- 371) + SX, Bacillus. Thuringiasis ⁇ Aiwai subspecies ABTS-1857 (Bacillus thuringiensis subsp. Aizawai ABTS-1857) + SX, Bacillus thuringiensis ⁇ Aiwai subspecies AM 65-52 strain (Bacillus thuringiensis subsp.
  • Aizawai AM 65-52) + SX Bacillus thuringia Cis ai wai subspecies GC-91 (Bacillus thuringiensis subsp. Aizawai GC-91) + SX, Bacillus thuringiensis a Awawai subspecies Serotype H-7 (Bacillus thuringiensis subsp. Aizawai Serotype H-7) + SX, Bacillus thuringiensis subsp. ABTS 351 strain (Bacillus thuringiensis subsp. Kurstaki ABTS 351) + SX, Bacillus thuringiensis cristae subspecies BMP123 strain (Bacillus thuringiensis subsp.
  • Bacillus thuringiensis cristae subsp. HD-1 strain Bacillus thuringie nsis subsp. Kurstaki HD-1) + SX, Bacillus thuringiensis cristae subsp. PB54 (Bacillus thuringiensis subsp. Kurstaki PB 54) + SX, Bacillus thuringiensis cristae subsp. SA-11 (Bacillus thuringiensis subsp. Kurstaki SA-11) + SX, Bacillus thuringiensis subsp. SA-12 strain (Bacillus thuringiensis subsp.
  • SX Bacillus thuringiensis derm Tadiensis variant 24-91 (Bacillus thuringiensis var. Darmstadiensis 24-91) + SX, Bacillus thuringiensis dendolimus variant (Bacillus thuringiensis var. Dendrolimus) + SX, Bacillus thuringiensis galleria variant (Bacillus thuringiensis var. (Galleria e) + SX, Bacillus thuringiensis israelensis variant BMP144 strain (Bacillus thuringiensis var.
  • PRAA4-1T Chromobacterium subtsugae PRAA4-1T + SX, Dactylella ellipsospora + SX, Dectylaria thaumasia + SX, Hilstera minesose sis Hirsutella rhossiliensis + SX Hilstera thompsonii (Hirsutella thompsonii) + SX, Lagenidium giganteum (Lagenidium giganteum) + SX, Lecanicillium lecani strain KV01 (Lecanicillium lecanii KV01) + SX, Leconicillitraceitraceilium SX, conidia (Lecanicillium lecanii conidia of strain DAOM216596) + SX, Metamysium anisopliae F 52 strain (Metarhizium anisopliae F 52) + SX, metharrhizium anisopliae acridum variant (Meterhidiumi v
  • Carotobola CGE 234 M 403 stock Erwinia carotovora subsp. Carotovora CGE 234 M 403 stock (Erwinia carotovora subsp. Carotovora CGE 234 M 403) + SX, Fusarium oxysporum Fo 47 strain (Fusarium o xysporum Fo47) + SX, gliocladium catenulatam J1446 (Gliocladium catenulatum J 1446) + SX, Paenibacillus polymyxa AC-1 strain (Paenibacillus polymyxa AC-1) + SX, Paenibacillus polymyxa BS-0105 strain (Paenibacillus polymyxa BS1 -0105) + SX, Pantoea agglomerans E 325 (Pantoea agglomerans E 325) + SX, Flebiopsis gigantea VRA 1992 (Phlebiopsis gigante
  • Trichoderma atroviride strain CNCM 1-1237 Trichoderma atroviride CNCM 1-1237) + SX, Trichoderma atroviride LC 52 strain (Trichoderma atroviride LC 52) + SX, Trichoderma atroviride SC 1 strain (Trichoderma atroviride SC 1) SKT-1 strain (Trichoderma atroviride SKT-1) + SX, Trichoderma gumcyc ICC 080 strain (Trichoderma gamsii ICC 080) + SX, Trichoderma harzianum 21 strain (Trichoderma harzianum 21) + SX, Trichoderma harzianum DB 104 strain (Trichoderma harzianum DB104) + SX, Trichoderma harzianum DSM 14944 strain (Trichoderma harzianum DSM 14944) + SX, Toriko Derma Harzianum ESALQ-1303 (Trichoderma harzianum ESALQ-1303) +
  • Trichoderma stromaticum + SX, Trichoderma virence G-41 strain (Trichoderma virens) G-41) + SX, Trichoderma virens GL-21 strain (Trichoderma virens GL-21) + SX, Trichoderma viride + SX, Varioborac paradox CGF 4526 strain (Variovorax paradoxus CGF 4526) + SX, Her Pin protein (Harpin protein) + SX, Bordeaux solution (Bordeaux mixture) + SX, bromothalonil (bromothalonil) + SX, chitin (chitin) + SX, copper (II) acetate (copper (II) acetate) + SX, copper (II) sulfate ) (Copper (II) sulfate) + SX, dipotassium hydrogenphosphate + SX, tea tree extract (extract from Melaleuca alternifolia) + SX, extract from Reynoutria sachalinens
  • the ratio of the compound of the present invention X to the component is not particularly limited, but the weight ratio (the compound of the present invention X: this component) is from 1000: 1 to 1: 1000, 500: 1 to 1: 500, 100 : 1 to 1: 100, 50: 1 to 1: 50, 20: 1 to 1: 20, 10: 1 to 1: 10, 3: 1 to 1: 3, 1: 1 to 1: 500, 1: 1 To 1: 100, 1: 1 to 1:50, 1: 1 to 1:20, 1: 1 to 1:10 and the like.
  • the pests to which the compound X of the present invention is effective are harmful arthropods such as harmful insects and harmful mites; harmful nematodes and harmful molluscs; and phytopathogenic microorganisms.
  • harmful arthropods such as harmful insects and harmful mites, harmful nematodes and harmful molluscs include, for example, the following.
  • Hemiptera Hemetobiunka (Laodelphax striatellus), Tobiirounka (Nilaparvata lugens), Sejirounka (Sogatella furcifera), Corn locust (Peregrinus maidis), Red-winged deer (Javesella pellucida), Black-footed Michalica Planthopper family (Delphacidae); Green leafhopper (Nephotettix cincticeps), Yellow-tailed leafhopper (Nephotettix virescens), Black-tailed green leafhopper (Nephotettix nigropictus), Yellow-tailed leafhopper (Recilia dorsalis), Black-tailed leafminus moth , Corn leaf hopper (Dalbulus maidis), white leafhopper (Cofana spectra), etc., leafhopper family (Cicadelidae); Mahanarva posticata, Mahanarva fimbriolat
  • Pecan leaf phylloxera (Phylloxera notabilis), Southern pecan leaf phylloxera (Phylloxera russellae), and the like (Phylloxeridae); (Adelgidae); rice black bug (Scot inophara lurida), Malayan rice black bug (Scot inophara coarctata), green grass bug (Nezara antennata), rhizophorid bug (Eysarcoris aeneus), dryback beetle (Eysarcoris lewisi), Red-headed Bug (Eysarcoris ventralis), Gray-backed Bug (Eysarcoris annamita), Brown-backed Bug (Halyomorpha halys), Red-headed Bug (Nezara viridula), Brown stink bug (Euschistus heros), Red banded stink bug (Piez Sturgeon (Pentatomidae) such as melacanthus; Sturgeon (Cydnidae) such as Burrower
  • Helicidae (Coreidae); , Ameri Red-tailed bug family (Lygaeidae) such as Blissus leucopterus; Red-backed squirrel (Trigonotylus caelestialium); Stink bug family (Miridae); Trichoderma faecalis (Trialeurodes vaporariorum), B. tabaci (Bemisia tabaci), Scutellaria barbata (Dialeurodes citri), Scutellaria barbata L.
  • Ameri Red-tailed bug family (Lygaeidae) such as Blissus leucopterus; Red-backed squirrel (Trigonotylus caelestialium); Stink bug family (Miridae); Trichoderma faecalis (Trialeurodes vaporariorum), B. tabaci (Bemisia tabaci), Scutellaria barbata (Dialeurodes citri), Scutellaria barbata L.
  • Lepidoptera Chilo suppressalis, Darkheaded stem borer (Chilo polychrysus), White stem borer (Scirpophaga innotata), Itten's tree magnolia (Scirpophaga incertulas), Rupela albina, Kobnomiga (Cnaphatailicalis) Casino meiga (Marasmia exigua), cotton moth (Notarcha derogata), foxtail moth (Ostrinia furnacalis), European corn borer (Ostrinia nubilalis), black-tailed moth (Hellula undulis), monquil chronome moth (Herpetogramma lucitose, Pe) Caseworms (Nymphula depunctalis), Sugarcane borer (Diatraea saccharalis), and other parts of the family (Crambidae); Ringworm (Pyralidae); Spodoptera litura, Spodoptera exigua, Mythimna separata
  • Arctiidae Giant Sugarcane b Orster (Telchin licus) Kastoniagae (Castniidae); Himebokuto (Cossus insularis) et al. (Cossidae); Family (Limacodidae); Staphymopoda (Stathmopoda niessa) etc .; Stathmopodidae; Acherontia lachesis et al. Sphingidae (Sphingidae); And the like. Seschidae (Sesiidae), etc .; Hemperididae (Hesperiidae) such as the rice tortoise (Parnara guttata);
  • Thysanoptera Thysanoptera: Thripsidae (Frankliniella occidentalis), Thripsidae (Thrips palmi), Chalyssus thripsus (Scirtothrips dorsalis), Thrips tabaci (Thrips tabaci), Hydrangea thripsus (Frankliniella intronacea) , Thripidae such as Echinothrips americanus etc .; Thripsidae (Phlaeothripidae) such as Haekohrips aculeatus.
  • Diptera Anemoneid family (Anthomyiidae) such as fly (Delia platura), onion fly (Delia antiqua), sugar beet fly (Pegomya cunicularia) etc .; Rice leafminer fly (Agromyza oryzae), tomato leafminer fly (Liriomyza sativae), bean leafminer fly (Liriomyza trifolii), leafminer fly (Chromatomyia horticola), etc.
  • Anemoneid family such as fly (Delia platura), onion fly (Delia antiqua), sugar beet fly (Pegomya cunicularia) etc .
  • Rice leafminer fly Agromyza oryzae
  • tomato leafminer fly Liriomyza sativae
  • bean leafminer fly Liriomyza trifolii
  • leafminer fly Chromatomyia horticola
  • Leafworm family (Agromyzidae); Bactrocera cucurbitae), mandarin orange fruit fly (Bactrocera dorsalis), egg fruit fly (Bactrocera latiphrons), olive fruit fly (Bactrocera oleae), quince land fruit fly (Bactrocera tryoni), citechine fruit fly (Ceratitis capitaphy) Tephritidae (Tephritidae), such as pomonella), sweet potato weeds (Rhacochlaena japonica); ; Drosophilidae such as Drosophila melanogaster (Drosophila suzukii); Psyllididae (Phoridae) such as the giant flea fly (Megaselia spiracularis); dimorphism fly family (Sciaridae) such as Hessian fly (Mayetiola destructor), Bacteriidae (Cecidomyiidae) such as incocarid fly (Ors
  • Culex quinquefasciatus Culex pipiens molestus Forskal, Culexidae such as Culex quinquefasciatus; Culicidae; Prosimulium yezoensis; House fly (Musca domestica), house fly (Muscina stabulans), sea fly (Stomoxys calcitrans), house fly (Haematobia irritans) such as house fly (Muscidae); ); (Chironomus plumosus), Chironomus yoshimatsui (Chironomus yoshimatsui), Chironomidae such as Gray midges (Glyptotendipes tokunagai) (Chironomidae); fanniidae (Fannidae).
  • Coleoptera Coleoptera (Coleoptera): Western corn rootworm (Diabrotica virgifera virgifera), Southern corn rootworm (Diabrotica undecimpunctata howardi), Northen corn rootworm (Diabrotica barberi), Mexican corn rootworm (Diabrotica virgifera zeae), Banded Cuicabiotic (Diabrotica virgifera zeae) balteata), Cucurbit Beetle (Diabrotica speciosa), Bean Leaf Beetle (Cerotoma trifurcata), Cubial Leaf Beetle (Oulema melanopus), Ground Leaf Beetle (Aulacophora femoralis), Sweet potato leaf beetle (Phyllotreta striolata), Cabbagel flea beetle (Phyllotreta pusilla), Cabbage stem flea beetle (Psylliodes chrysocephala), Colorado potato beetle (Leptinotarsa
  • Carabidae Carabidae
  • Red-tailed bream (Anomala albopilosa), red-tailed beech (Popillia japonica), red-crested bream (Heptophylla picea), European Chafer (Rhizotrogus majalis), Black marsh (Tomarus gibbosus), Holotrichia sp.
  • Phyllophaga Phyllophaga spp.
  • ga crinita Diloboderus (Diloboderus spp.) such as Diloboderus abderus, etc.
  • Scarabaeidae (Scarabaeidae); Euscepes postfasciatus), alfalfate weevil (Hypera postica), tree weevil (Sitophilus zeamais), rice weevil (Echinocnemus squameus), rice water weevil (Lissorhoptrus oryzophilus), Shirosiobe sage beetle (Rhabdoscelus lineate history) Sphenophorus venatus), Southern Corn Billbug (Sphenophorus callosus), Soybean stalk weevil (Sternechus subsignatus), Sugarcane weevil (Sphenophorus levis), Crustacean weevil (Scepticus griseus), Tobiiro gourd (Scepticus uniformi) s), Brazilian bean weevil (Zabrotes subfasciatus), Pinus spinach (Tomicus piniperda), Coffee Berry (Hypothenemus ham
  • Tricholium castaneum Tricholium confusum
  • Teenebrionidae Tricholium castaneum
  • Tribolium connectum Tricholium castaneum
  • Etirachnida Etirachnida
  • Epilachna vigintopoc unctata etc .
  • Family Bostodian
  • Streptomyces Ptinidae
  • Anemone longhorn Anoplophora malasiaca
  • Orthoptera (Orthoptera): Toocta grasshopper (Locusta migratoria), Toroca grasshopper (Dociostaurus maroccanus), Australia Tobibatata (Chortoicetes terminifera), Red-footed grasshopper (Nomadacris septemfasciata), Brown Locust (Locustana pardalis Aritraceilogues) Locust (Calliptamus italicus), Differential grasshopper (Melanoplus differentialis), Two striped grasshopper (Melanoplus bivittatus), Migratory grasshopper (Melanoplus cerichelimel at least 2 times), Red-Legged grasshopper (Mel ), Yellow-winged locust (Gastrimargus musicus), Spur-throated locust (Austracris guttulosa), Kobayinago (Oxya yezoensis), Hanekinainago (Oxya japonica), Trichophyton (
  • Hymenoptera (Hymenoptera): Japanese gossip (Athalia rosae), Japanese black-billed wasp (Athalia japonica), etc. (Tenthredinidae); Fireflies (Solenopsis invicta), Red-winged Ants (Solenopsis geminata), etc. Tolushinella (Solenopsis spp.) leaf-cutting ant (Atta capiguara) et al. (Atta spp.), Anemone spp.
  • Cockroach (Blattodea): German cockroach (Blattella germanica) and other German cockroaches (Blattellidae); (Blattidae); Yamato termites (Reticulitermes speratus), house termites (Coptotermes formosanus), American termites (Incisitermes minor), Dicta termites (Cryptotermes domesticus), Taiwan termites (Odontotermes formosanus), red-handed termites (Neotermes) Glyptotermes satsumensis), Chinese termite (Glyptotermes nakajimai), catan termite (Glyptotermes fuscus), giant termite (Hodotermopsis sjostedti), black-and-white termite (Coptotermes guangzhouensis) , Aphid termites (Reticulitermes amamianus), Mitatake termites (Reticulitermes miyatakei), Cameron termites (Reticulitermes
  • Flea order (Siphonaptera): cat flea (Ctenocephalidae felis), dog flea (Ctenocephalides canis), castor flea (Pulex irritans), pheasant flyfish (Xenopsylla cheopis), sunanose (Tunga penetrans), chick flea (Echidnophaga gallinacea) Fleas (Nosopsyllus fasciatus).
  • Lice (Anoplura): pig lice (Haematopinus suis), lice (Haematopinus eurysternus), sheep lice (Dalmalinia ovis), lice (Linognathus seypsus), lice (Pediculus humanis), lice (Pediculucus humanus corporis) Barbed lice (Phthirus pubis).
  • Psyllids (Mallophagida): Bovine lava (Dalmalinia bovis), sheep baldness (Dalmalinia ovis) etc. Bovicola sp. (Bovicola spp.); P. Of the genus Fericola (Felocpla spp), Peanut (Lipeurus caponis) and the like Peurus (Lipeurus spp.), Trimenopon sp. (Trimenopon spp), Menopon sp. (Menopon spp.) And the like.
  • Eriophyidae such as Schizoctella (Shevtchenkella sp.); Red-handed spider mite (Tenuipalpidae) such as (Brevipalpus phoenicis); Tannertidae (Tuckerellidae); Andersoni (Dermacentor and ersoni), Ixodes ovatus, Ixodes persulcatus, Ixodes ricinus, Black legged tick (Ixodes scapularis), American kill mite (Amblyomma americanum), amblyomumium platinum ), Ixodidae such as Boophilus microplus, Boophilus annulatus, Rhipicephalus sanguineus, etc .; Tyrophagus pu Acaridae (Acaridae), such as Trichophagus similis, etc .; Dermatophagoides such as Dermatophagoides farinae, Dermatophagoides pteronyssinus, etc.
  • Arachnida (Araneae): Anemone family (Eutichuridae) such as Chehiracanthium japonicum etc .; A hymenodontid family (Theridiidae) such as Latrodectus hasseltii.
  • Obiayasuda (Polydesmida): Nephetidae (Oxidus gracilis), Red-crested cod (Nedyopus tambanus), etc.
  • Isopoda Armadillidiidae, such as Armadillium vulgare.
  • Lipopoda Chopoda: The Scutigera such as Thereuonema hilgendorfi; Scoopendra subspinipes such as Scoopendradidae; Gastropoda (Gastropoda): Black-tailed slug (Limax marginatus), black-tailed slug (Limax flavus), etc. (Limacidae); Monopidae (Ampullariidae) of the family; Monopidae (Lymnaeidae), such as the black-and-white alley (Aastropeplea ollula).
  • Nematoda Aphelenchoides sp. (Aphelenchoides besseyi etc.) Aphelenchoididae (Aphelenchoididae); And the like (Pratylenchidae), etc .; Java spp.
  • Heteroderidae such as Glossodera (Globodera pallida); Hoprolases (Hoplolaimidae), such as Rotylenchulus reniformis; Strawberry nematode (Nothotylenchus acris), jichi Anguinidae (Anguinidae) such as Lexus gypsy (Ditylenchus dipsaci); Tylenculidae (Tylenchulidae) such as Tylenchulus seminetrans; Trichodoridae); Parasitaphelenchidae such as Bursaphelenchus xylophilus.
  • Hoprolases Hoplolaimidae
  • Rotylenchulus reniformis such as Rotylenchulus reniformis
  • Strawberry nematode Nothotylenchus acris
  • jichi Anguinidae Anguinidae
  • the target harmful insects, harmful mites and other harmful arthropods, harmful molluscs and harmful nematodes have reduced drug sensitivity to insecticides, acaricides, molluscicides and nematocides, or drug resistance They may be sexually developed harmful insects, harmful arthropods such as harmful mites, harmful molluscs and harmful nematodes.
  • the targeted insecticides, acaricides, insecticides other than nematocides and nematocides, acaricides The use of a composition comprising a molluscicide and a nematocide component is desirable.
  • the compounds X of the present invention can also be used to protect plants from plant diseases caused by insect-borne viruses or insect-borne bacteria.
  • insect-borne viruses examples include the following.
  • Rice hatching virus (Rice tungro spherical virus), rice tungro bacillus virus (Rice tungro bacilliform virus), rice grassy stunt virus (Rice grassy stunt virus), rice ragged stunt virus (Rice ragged stunt virus), rice streak dead virus ( Rice stripe virus), Rice black streaked dwarf virus, Rice southern black streaked dwarf virus, Rice gall dwarf virus, Rice hoja disease (Rice hoja) blanca virus), rice yellow leaf virus (Rice yellow stunt virus), rice yellow mottle virus, rice dwarf virus, wheat cereals northern virus (Northern cereal mosaic virus), barley yellow dwarf virus (Barley yellow dwarf virus) , Barley mild mosaic virus, Barley yellow dwarf PAV Iris (Barley yellow dwarf virus-PAV), wheat yellow dwarf RPS virus (Cereal yellow dwarf virus-RPS), wheat yellow leaf virus (Wheat yellow leaf virus), Oat sterile dwarf virus, Wheat streak mosaic virus, corn dwarf mosaic virus Maize dwarf mosaic virus, Maize stripe virus, Maize chlorotic mottle virus, Maize chlorotic dwarf virus,
  • insect-borne bacteria examples include the following.
  • Rice yellow dwarf phytoplasma (Candidatus Phytoplasma oryzae), Candidatus Phytoplasma asteris, Maize bushy stunt phytoplasma, citrus greening fungus Asian type (Candidatus Liberbacter asiaticus), citrus greening fungus African type (Candidatus Liberbacter aflicanus), Type (Candidatus Liberbacter americanus).
  • plant pathogenic microorganisms include, for example, filamentous fungi, bacteria and the like, and specific examples include the following diseases.
  • the parentheses show the scientific name of the pathogenic microorganism that causes the disease.
  • Rice blast fungus (Pyricularia oryzae), sesame leaf blight (Cochliobolus miyabeanus), sheath blight (Rhizoctonia solani), fool disease (Gibberella fujikuroi), yellow dwarf (Sclerophthora macrospora); wheat powdery mildew (Erysiphe) graminis), Fusarium head blight (Fusarium graminearum, F. avenaceum, F. culmorum, Microdochium nivale), rust (Puccinia striiformis, P. graminis, P. recondita), scarlet snow rot (Micronectriella nivale, M.
  • Seedling blight Rhizoctonia solani
  • blight Gaeumannomyces graminis
  • barley powdery mildew Erysiphe graminis
  • mildew Fusarium grami nearum, F. avenaceum, F. culmorum, Microdochium nivale
  • rust Puccinia striiformis, P. graminis, P.
  • Rust disease Phakopsora pachyrhizi), brown ring disease (Corynespora cassiicola), anthracnose (Colletotrichum glycines, C. truncatum), leaf rot (Rhizoctonia solani), brown disease (Septoria glycines), spot disease (Cercospora sojina) ), Sclerotinia sclerotiorum, powdery mildew (Microsphaera diffusa), stem blight (Phytophthora sojae), downy mildew (Peronospora manshurica), sudden death (Fusarium virguliforme); sclerotium sclerotium of green beans , Rust (Uromyces appendiculatus), horny mildew (Phaeoisariopsis griseola), anthracnose (Colletotrichum lindemuthianum); blackcurrant (Cercospora personata
  • Botrytis cinerea of various crops sclerotis disease (Sclerotinia sclerotiorum); Japanese black radish (Alternaria brassicicola); Dollar spot disease of shiva (Sclerotinia homoeocarpa), brown patch disease of shiva And large patch disease (Rhizoctonia solani); and Sigatoka disease of banana (Mycosphaerella fijiensis, Mycosphaerella musicola).
  • the pest control composition of the present invention comprises an inert carrier and the compound of the present invention, the compound X of the present invention or the composition A (hereinafter referred to as the composition of the present invention).
  • the composition of the present invention is generally prepared by mixing the compound of the present invention, the compound X of the present invention or the composition A with an inert carrier such as a solid carrier, a liquid carrier, a gaseous carrier, etc.
  • auxiliaries for formulation add emulsion, oil, powder, granules, wettable, water dispersible granule, flowable, dry flowable, microcapsule, aerosol, poison bait, resin formulation, shampoo, It is formulated into a paste-like preparation, a foam, a carbon dioxide preparation, a tablet and the like. These preparations may be used as processed into mosquito coil, electric mosquito mat, liquid mosquito formula, fuming agent, fumigant, sheet preparation, spot-on agent, oral treatment agent.
  • the composition of the present invention contains usually 0.0001 to 95% by weight of the compound of the present invention, the compound of the present invention X or the composition A.
  • clays kaolin clay, diatomaceous earth, bentonite, hubash clay, acid clay etc
  • dry silica wet silica
  • talc ceramic
  • other inorganic minerals seleninite, quartz, sulfur, activated carbon, calcium carbonate etc.
  • Fine powders and granules of chemical fertilizers eg ammonium sulfate, phosphorus ammonium, ammonium nitrate, urea, salt ammonium etc.
  • synthetic resins polymers such as polypropylene, polyacrylonitrile, polymethyl methacrylate, polyethylene terephthalate etc.
  • nylon 6 nylon resins such as nylon-11, nylon 66, polyamide resins, polyvinyl chloride, polyvinylidene chloride, vinyl chloride-propylene copolymers, etc.
  • liquid carriers examples include water, alcohols (methanol, ethanol, isopropyl alcohol, butanol, hexanol, benzyl alcohol, ethylene glycol, propylene glycol, phenoxyethanol etc.), ketones (acetone, methyl ethyl ketone, cyclohexanone etc.), aromatic hydrocarbons (Toluene, xylene, ethylbenzene, dodecylbenzene, phenylxylylethane, methylnaphthalene etc.), aliphatic hydrocarbons (hexane, cyclohexane, kerosene, light oil etc.), esters (ethyl acetate, butyl acetate, isopropyl myristate, Ethyl oleate, diisopropyl adipate, diisobutyl adipate, propylene glycol monomethyl ether acetate, etc., nitriles (ace
  • Gaseous carriers include, for example, fluorocarbons, butane gas, LPG (liquefied petroleum gas), dimethyl ether and carbon dioxide gas.
  • surfactants examples include nonionic surfactants such as polyoxyethylene alkyl ether, polyoxyethylene alkyl aryl ether, polyethylene glycol fatty acid ester, and anions such as alkyl sulfonate, alkyl benzene sulfonate, and alkyl sulfate. Surfactants may be mentioned.
  • fixing agents As other pharmaceutical adjuvants, fixing agents, dispersing agents, coloring agents, stabilizers and the like, specifically, for example, casein, gelatin, saccharides (starch, gum arabic, cellulose derivatives, alginic acid etc.), lignin derivatives, bentonite, Synthetic water-soluble polymers (polyvinyl alcohol, polyvinyl pyrrolidone, polyacrylic acids, etc.), isopropyl acid phosphate, 2,6-di-tert-butyl-4-methylphenol, BHA (2-tert-butyl-4-methoxyphenol) And a mixture of 3-tert-butyl-4-methoxyphenol).
  • saccharides starch, gum arabic, cellulose derivatives, alginic acid etc.
  • lignin derivatives bentonite
  • Synthetic water-soluble polymers polyvinyl alcohol, polyvinyl pyrrolidone, polyacrylic acids, etc.
  • isopropyl acid phosphate 2,6
  • Examples of the base material of the resin preparation include vinyl chloride polymers, polyurethane and the like, and phthalate esters (dimethyl phthalate, dioctyl phthalate, etc.), adipates, etc. may be used as necessary for these bases. And a plasticizer such as stearic acid may be added.
  • the resin formulation is obtained by kneading the compound in the base using a common kneading apparatus, and then molding by injection molding, extrusion molding, press molding and the like, and if necessary, through further steps such as molding and cutting, It can be processed into resin preparations such as plate-like, film-like, tape-like, net-like and string-like.
  • resin preparations are processed, for example, as animal collars, animal ear tags, sheet preparations, drawstrings, horticultural posts.
  • substrates for poison bait include cereal flour, vegetable oil, sugar, crystalline cellulose and the like, and further, if necessary, antioxidants such as dibutyl hydroxytoluene and nordihydroguaiaretic acid, preservatives such as dehydroacetic acid and the like.
  • an anti-mistake agent for children and pets such as capsicum powder, a cheese flavor, an onion flavor, a pest-inducing flavor such as peanut oil, etc. are added.
  • the pest control method of the present invention may be carried out by directly applying an effective amount of the compound of the present invention, the compound X of the present invention or the composition of the present invention to the pests and / or the habitat of pests Etc.). It can also be applied to seeds.
  • Examples of the application method of the compound of the present invention, the compound X of the present invention or the composition of the present invention include stem and leaf treatment, soil treatment, root treatment, shower treatment, smoke treatment, water surface treatment and seed treatment.
  • plants include whole plants, stems and leaves, flowers, ears, fruits, trunks, branches, crowns, seeds, vegetative organs and seedlings.
  • the vegetative organ means the plant roots, stems, leaves, etc. that have the ability to grow when the site is separated from the main body and installed in the soil.
  • the vegetative reproductive organs for example, tuberous root, creeping root, bulb, corm or solid bulb, tuber, tuber, rhizome, stolon Rhizophores, cane cuttings, propagule and vine cutting.
  • a toothpick is also called a runner (runner), and a basket is also called a sprout and is divided into a broad bud and a bulbil (bulbil).
  • “Vine” means shoots such as sweet potato and yam (collectively referred to as leaves and stems, shoot).
  • bulbs corms, tubers, rhizomes, stem fragments, rhizomes or tuberous roots are collectively referred to as bulbs. Cultivation of potato starts by planting tubers in the soil, but the tubers used are generally called seed potatoes.
  • the application amount thereof is usually 1 to 10000 g in the amount of the compound of the present invention or compound X of the present invention per 10000 m 2 .
  • the application rate of the compound of the present invention or compound X of the present invention is usually 0.001 to 100 g per 1 kg of seeds or vegetative organs.
  • the application rate of composition A is usually 0.001 to 100 g per kg of seed or vegetative organ.
  • compound X of the present invention or composition A is formulated into an emulsion, a wettable powder, a flowable, etc., it is usually diluted with water so that the concentration of the active ingredient is 0.01 to 10000 ppm. And granules, dusts, etc. are usually applied as such.
  • the preparation or preparation may be sprayed directly on plants such as pests or crops to be protected from pests, or to control pests that inhabit the soil of cultivated land. It may be treated to the soil.
  • the resin preparation processed into a sheet or string can be treated by a method such as wrapping around a crop, spreading it in the vicinity of a crop, spreading it on stock soil, or the like.
  • the application rate thereof is the compound of the present invention per 1 m 2 of treated area in an amount of invention compound X, usually from 0.01 ⁇ 1000 mg, in an amount of compound of the invention or the invention compound X per processing space 1 m 3 if the process in the space usually is 0.01 ⁇ 500 mg .
  • compound X of the present invention or composition A is formulated into an emulsion, a wettable powder, a flowable, etc., it is usually diluted with water so that the concentration of the active ingredient is 0.1 to 10000 ppm. Apply oil, aerosol, smoke, poison bait etc. as it is.
  • the compound of the present invention X or the composition of the present invention is used for ectoparasite control of small animals such as cattle, horses, pigs, sheep, goats and chickens, domestic animals such as dogs, cats, rats and mice It can be used on animals in a manner known in the art.
  • small animals such as cattle, horses, pigs, sheep, goats and chickens
  • domestic animals such as dogs, cats, rats and mice
  • systemic suppression for example, it is administered by tablet, feed mixing, suppository, injection (intramuscular, subcutaneous, intravenous, intraperitoneal etc.) and is intended for non-systemic suppression.
  • the amount of the compound of the present invention or the compound of the present invention X when administered to an animal is usually in the range of 0.1 to 1000 mg per 1 kg of animal weight.
  • the compound of the present invention, the compound X of the present invention or the composition of the present invention can be used as a control agent for harmful organisms in agricultural land such as fields, paddy fields, lawns, orchards. Examples of plants include the following.
  • Agricultural products corn, rice, wheat, barley, rye, oats, sorghum, cotton, soybeans, peanuts, buckwheat, sugar beet, rapeseed, sunflower, sugar cane, tobacco etc.
  • Vegetables Solanaceous vegetables (eggplant, tomatoes, peppers, peppers, potatoes, etc.), Cucurbitaceae vegetables (eg, cucumbers, pumpkins, zucchini, watermelons, melons, etc.), Brassicaceae vegetables (radish, turnip, horseradish, kohlrabi, Chinese cabbage, cabbage) , Mustard, broccoli, cauliflower etc.), Asteraceae vegetables (eg burdock, shung chrysanthemum, artichoke, lettuce etc.), a liliaceous vegetables (scallion, onion, garlic, asparagus etc.), vegidaceae vegetables (carrots, parsley, celery, American buffalo) Etc.), vecoraceae vegetables (spinach, swiss char
  • Fruits Fruits; Fruits (apples, pears, Japanese pears, cullins, quince etc.), Core fruits (momo, plums, nectarines, jujubes, apricots, prunes etc.), citrus fruits (palms, oranges, lemons, limes, grapefruits) Etc), nuts (nuts, walnuts, hazelnuts, almonds, pistachios, cashews, macadamias etc), berries (blueberries, cranberries, blackberries, raspberries etc), grapes, oysters, olives, loquats, bananas, coffee, etc. Date palm, coconut palm, etc.
  • Trees other than fruit trees tea, mulberry, flowering trees, street trees (astera, birch, dogwood, eucalyptus, eucalyptus, ginkgo, lilac, maple, oak, poplar, persimmon, perennial, fusarium, plananas, persimmon, perianthus, birch, fir tree, tsuga, nezu, pine Spruce, yew etc. etc.
  • the above-mentioned plants also include plants which can be produced by natural mating, plants which can be generated by mutation, F1 hybrid plants and genetically modified crops.
  • genetically modified crops include HPPD (4-hydroxyphenylpyruvate dioxygenase enzyme) inhibitors such as isoxaflutole, ALS (acetolactate synthetase) inhibitors such as imazethapyr and thifensulfuron methyl, EPSP (5 -Plants with resistance to herbicides such as -enolpyruvyl shikimate-3-phosphate synthetase inhibitor, glutamine synthetase inhibitor, PPO (protoporphyrinogen oxidase) inhibitor, bromoxynil, or dicamba
  • HPPD 4-hydroxyphenylpyruvate dioxygenase enzyme
  • ALS acetolactate synthetase
  • EPSP -Plants with resistance to herbicides such as -enolpyruvyl
  • the above-mentioned plant is not particularly limited as long as it is a commonly grown variety.
  • Me represents a methyl group
  • Et represents an ethyl group
  • Pr represents a propyl group
  • iPr represents an isopropyl group
  • cPr represents a cyclopropyl group
  • Ph represents a phenyl group
  • Py represents It represents a pyridin-2-yl group
  • Pyr represents a 1-pyrazolyl group.
  • CH 2 OPh represents a phenoxymethyl group
  • CH 2 N (CH 2 CF 3 ) CH 2 Ph represents [benzyl (2) Represents a 2,2,2-trifluoroethyl) amino] methyl group.
  • the present compound 1 1 H-NMR (CDCl 3 ) ⁇ : 7.88 (1 H, s), 7. 47 (1 H, d), 7.44-7. 31 (5 H, m), 7.24 (1 H, d), 7.03 (1 H, d ), 6.94 (1H, d), 4.66 (2H, s), 2.33 (3H, s), 2.16 (3H, s), 1.90 (3H, s).
  • the present compound 2 1 H-NMR (CDCl 3 ) ⁇ : 8.08 ( 1 H, d), 7. 91 (2 H, d), 7. 79 (1 H, d), 7. 48-7. 37 (5 H, m), 7.34 (1 H, d ), 4.81 (2H, s), 2.54 (3H, s), 2.33 (3H, s), 2.23 (3H, s).
  • the present compound 3 1 H-NMR (CDCl 3 ) ⁇ : 7.49-7.12 ( 10 H, m), 6.81 (1 H, dt), 6.59 (1 H, d), 4. 76 (2 H, s), 2.69-2 .60 (2 H) , m), 2.47 (3H, s), 2.35-2. 25 (2H, m), 2.22 (3H, s), 2.16 (3H, s), 1. 76-1.41 (4H, m).
  • the present compound 5 1 H-NMR (CDCl 3 ) ⁇ : 8.34 (1H, s), 7.47-7.35 (5H, m), 7.30-7.24 (2H, m), 7.17-7.12 (2H, m), 4.81 (2H, s), 4.14 (2H, t), 3.06 (2H, t), 2.51 (3H, s), 2.37 (3H, s), 2.21 (3H, s).
  • Production Example 4 The compounds produced according to the method described in Production Example 3 and the physical properties thereof are shown below.
  • Formula (A-2) In the compound shown by these, compounds in which R 1x and R 2x are any combination described in [Table 2].
  • the present compound 6 1 H-NMR (CDCl 3 ) ⁇ : 8.34 (1H, s), 7.59-7.52 (2H, m), 7.48-7. 32 (7H, m), 4.81 (2H, s), 4.47 (2H) , t), 3.11 (2H, t), 2.51 (3H, s), 2.36 (3H, s), 2.21 (3H, s).
  • the present compound 25 1 H-NMR (CDCl 3 ) ⁇ : 8.35 (0.5 H, s), 8.32 (0.5 H, s), 6.91 (0.5 H, s), 6.90 (0.5 H, s), 6.13-6.04 (1H, m), 5.43 (1 H, m), 5.
  • the present compound 26 1 H-NMR (CDCl 3 ) ⁇ : 8.33 (1 H, s), 8.30 (1 H, m), 7.82 (1 H, m), 6.08 (1 H, m), 5.43 (1 H, m), 5.29 (1H, m), 4.66-4.64 (2H, m), 4.58 (1H, m), 4.29 (2H, m), 2.48 (3H, s), 2.37 (3H, s), 2.21 (3H, s) , 1.86 (2H, m), 1.07 (3H, t).
  • the present compound 27 1 H-NMR (CDCl 3 ) ⁇ : 8.40 (1 H, s), 7.44 (2 H, d), 7.22 (2 H, d), 6.13 to 6.02 (1 H, m), 5.42 (1 H, d ), 5.31 (2H, s), 5.30 (1H, d), 4.28 (2H, d), 2.49 (3H, s), 2.31 (3H, s), 2.21 (3H, s).
  • the present compound 28 1 H-NMR (CDCl 3 ) ⁇ : 8.36 (1 H, s), 7.44-7. 34 (7 H, m), 7. 18 (2 H, d), 5. 16 (1 H, dd), 4.
  • the present compound 31 1 H-NMR (CDCl 3 ) ⁇ : 8.42 (1H, s), 7.64 (2H, d), 7.46 (2H, d), 6.12-6.02 (1H, m), 5.42 (1H, d) ), 5.29 (2H, s), 5.29 (1H, d), 4.28 (2H, d), 2.49 (3H, s), 2.30 (3H, s), 2.21 (3H, s).
  • the present compound 160 1 H-NMR (CDCl 3 ) ⁇ : 7.61 (2H, d), 7.50 (2H, d), 7.49-7.35 (5H, m), 5.26 (2H, s), 4.78 (2H, s) ), 2.47 (3H, s), 2.31 (3H, s), 2.19 (3H, s), 2.18 (3H, s).
  • Invention compound 161 1 H-NMR (CDCl 3 ) ⁇ : 7.55 (2H, d), 7.48-7.37 (5H, m), 7.37 (2H, d), 4.82 (2H, s), 4.39 (2H, dd) ), 3.09 (2H, dd), 2.48 (3H, s), 2.30 (3H, s), 2.22 (3H, s), 2.20 (3H, s).
  • Invention compound 162 1 H-NMR (CDCl 3 ) ⁇ : 7.46-7.35 (7H, m), 7.20 (2H, d), 5.20 (2H, s), 4.78 (2H, s), 2.47 (3H, s) ), 2.29 (3H, s), 2.19 (3H, s), 2.17 (3H, s).
  • Invention compound 7 1 H-NMR (CDCl 3 ) ⁇ : 8.00-7.80 (3H, m), 7.48-7.35 (5H, m), 6.93-6.89 (2H, m), 4.84 (2H, s), 4.79 (2H, s), 4.35 (2H, m), 2.49 (3H, s), 2.25 (3H, s), 2.19 (3H, s).
  • the present compound 32 1 H-NMR (CDCl 3 ) ⁇ : 7.55 to 7.52 (2H, m), 7.43-7.32 (5H, m), 7.26 (2H, m), 4.78 (2H, s), 4.18 (2H) , s), 2.49 (3H, s), 2.21 (3H, s), 2.06 (3H, s).
  • Production Example 8 The compounds produced according to the method described in Production Example 6 and the physical properties thereof are shown below.
  • Formula (A-3) In the compounds represented by the above, R 1x is any compound described in [Table 3].
  • the present compound 34 1 H-NMR (CDCl 3 ) ⁇ : 7.54 (2H, d), 7.45-7.33 (5H, m), 7.17 (2H, d), 7.00 (2H, d), 6.93 (2H, d) ), 4.79 (2H, s), 4.15 (2H, s), 2.50 (3H, s), 2.21 (3H, s), 2.11 (3H, s).
  • the present compound 35 1 H-NMR (CDCl 3 ) ⁇ : 7.44-7.33 (5H, m), 7.15-7.13 (4H, m), 6.97-6.94 (2H, m), 6.91-6.88 (2H, m) , 4.78 (2H, s), 4.13 (2H, s), 2.50 (3H, s), 2.20 (3H, s), 2.11 (3H, s).
  • the present compound 36 1 H-NMR (CDCl 3 ) ⁇ : 8.44 (1H, s), 7.87 (1H, dd), 7.45-7.33 (5H, m), 7.23 (2H, d), 7.03 (2H, d) ), 6.96 (1H, d), 4.78 (2H, s), 4.16 (2H, s), 2.50 (3H, s), 2.20 (3H, s), 2.14 (3H, s).
  • the present compound 37 1 H-NMR (CDCl 3 ) ⁇ : 7.42-7.34 (5H, m), 7.30 (2H, t), 7.11 (2H, d), 7.06 (1H, t), 6.96 (2H, d) ), 6.88 (2H, d), 4.77 (2H, s), 4.11 (2H, s), 2.49 (3H, s), 2.19 (3H, s), 2.10 (3H, s).
  • the present compound 38 1 H-NMR (CDCl 3 ) ⁇ : 7.75-7.65 (4H, m), 7.54-7.33 (9H, m), 4.78 (2H, s), 4.20 (2H, s), 2.51 (3H) , s), 2.21 (3H, s), 2.13 (3H, s).
  • Invention compound 39 1 H-NMR (CDCl 3 ) ⁇ : 7.44-7.36 (6H, m), 7.31-7.29 (1H, m), 7.21-7.
  • the present compound 40 1 H-NMR (CDCl 3 ) ⁇ : 7.52 (2H, d), 7.45-7.31 (5H, m), 7.27 (2H, d), 7.10 (2H, d), 7.04 (2H, d) ), 4.76 (2H, s), 4.15 (2H, s), 3.97 (2H, s), 2.48 (3H, s), 2.19 (3H, s), 2.09 (3H, s).
  • the present compound 150 1 H-NMR (CDCl 3 ) ⁇ : 7.64 (1H, d), 7.43-7.35 (6H, m), 7.16-7.10 (3H, m), 6.94-6.91 (2H, m), 6.87 (1H, d), 4.78 (2H, s), 4.13 (2H, s), 2.50 (3H, s), 2.20 (3H, s), 2.10 (3H, s).
  • the present compound 41 1 H-NMR (CDCl 3 ) ⁇ : 7.45-7.31 (5H, m), 7.24 (2H, d), 7.25 (2H, d), 6.96 (2H, d), 6.89 (2H, d) ), 4.74 (2H, q), 4.32 (1H, q), 2.51 (3H, s), 2.19 (3H, s), 2.10 (3H, s), 1.66 (3H, d).
  • the present compound 42 1 H-NMR (CDCl 3 ) ⁇ : 7.65 (2H, d), 7. 45-7. 32 (7 H, m), 7.00 (1 H, s), 6. 08 (1 H, s), 5. 84 (1 H, s) ), 4.80 (2H, s), 2.52 (3H, s), 2.22 (3H, s), 2.07 (3H, s).
  • the present compound 8 1 H-NMR (CDCl 3 ) ⁇ : 7.23-7.17 (2H, m), 7.15-7.09 (2H, m), 6.15-6.04 (1H, m), 5.44 (1H, m), 5.29 (1H, m), 4.65 (2H, s), 4.30 (2H, m), 3.44 (1H, m), 2.57-2.48 (1H, m), 2.46 (3H, s), 2.30 (3H, s), 2.27-2.20 (2H, m), 2.18 (3H, s), 1.98-1.85 (2H, m), 1.54-1.37 (4H, m).
  • Production Example 12 The compounds produced according to the method described in Production Example 11 and the physical properties thereof are shown below.
  • the present compound 33 1 H-NMR (CDCl 3 ) ⁇ : 7.41-7.40 (1H, m), 6.33-6.33 (2H, m), 6.13-6.03 (1H, m), 5.45-5. 39 (1H, m) , 5.29-5.26 (1H, m), 4.61 (2H, s), 4.52 (2H, s), 4.28 (2H, dt), 2.46 (3H, s), 2.21 (3H, s), 2.18 (3H, s) ).
  • Invention compound 43 1 H-NMR (CDCl 3 ) ⁇ : 6.14-6.04 (1H, m), 5.46-5.40 (1H, m), 5.30-5.27 (1H, m), 4.68-4.60 (2H, m) , 4.29 (2H, dt), 4.09-4.03 (1H, m), 3.89-3.84 (1H, m), 3.78-3.72 (1H, m), 3.53-3.45 (2H, m), 2.45 (3H, s) , 2.29 (3H, s), 2.18 (3H, s), 1.98-1.80 (3H, m), 1.65-1.56 (1 H, m).
  • Invention compound 44 1 H-NMR (CDCl 3 ) ⁇ : 7.75 (1H, d), 7.32 (1H, d), 6.13-6.03 (1H, m), 5.45-5.40 (1H, m), 5.30-5.27 (1H, m), 4.88 (2H, s), 4.75 (2H, s), 4.29 (2H, dt), 2.47 (3H, s), 2.28 (3H, s), 2.19 (3H, s).
  • Invention compound 45 1 H-NMR (CDCl 3 ) ⁇ : 7.29-7.28 (1H, m), 6.95-6.94 (1H, m), 6.13-6.04 (1H, m), 5.46-5.40 (1H, m) , 5.31-5.27 (1H, m), 4.73 (2H, s), 4.66 (2H, s), 4.29 (2H, dt), 2.46 (3H, s), 2.26 (3H, s), 2.19 (3H, s) ).
  • Invention compound 46 1 H-NMR (CDCl 3 ) ⁇ : 7.30 (2H, d), 6.87 (2H, d), 6.13-6.03 (1H, m), 5.46-5.40 (1H, m), 5.31-5.28 (1H, m), 5.08 (2H, s), 4.32 (2H, dt), 2.48 (3H, s), 2.28 (3H, s), 2.21 (3H, s).
  • Production Example 14 The compounds produced according to the method described in Production Example 13 and the physical properties thereof are shown below. In the compounds represented by Formula (A-4), compounds in which R 1x is any of those listed in [Table 5].
  • Invention compound 47 1 H-NMR (CDCl 3 ) ⁇ : 7.86 (1H, s), 7.68 (1H, s), 6.12-5.99 (1H, m), 5.41 (1H, d), 5.40 (2H, s) ), 5.28 (1H, s), 4.28 (2H, d), 2.47 (3H, s), 2.21 (3H, s), 2.20 (3H, s).
  • Invention compound 48 1 H-NMR (CDCl 3 ) ⁇ : 7.56 (2H, d), 7.03 (2H, d), 6.13-6.04 (1H, m), 5.46-5.41 (1H, m), 5.32-5.29 (1H, m), 5.17 (2H, s), 4.33 (2H, dt), 2.49 (3H, s), 2.29 (3H, s), 2.22 (3H, s).
  • Invention compound 49 1 H-NMR (CDCl 3 ) ⁇ : 7.92 (2H, d), 6.96 (2H, d), 6.10-6.01 (1H, m), 5.44-5.40 (1H, m), 5.28-5.25 (1H, m), 5.15 (2H, s), 4.30-4.28 (2H, m), 3.83 (3H, s), 2.47 (3H, s), 2.27 (3H, s), 2.18 (3H, s).
  • the present compound 50 1 H-NMR (CDCl 3 ) ⁇ : 8.16 (2H, d), 7.05 (2H, d), 6.14-6.04 (1H, m), 5.46-5.42 (1H, m), 5.32-5.30 (1H, m), 5.22 (2H, s), 4.35-4.34 (2H, m), 2.50 (3H, s), 2.31 (3H, s), 2.24 (3H, s).
  • Invention compound 51 1 H-NMR (CDCl 3 ) ⁇ : 8.13 (1H, s), 7.68 (2H, d), 7.60 (2H, d), 6.14-6.03 (1H, m), 5.43 (1H, d ), 5.34 (2H, s), 5.29 (1H, d), 4.31 (2H, d), 2.50 (3H, s), 2.34 (3H, s), 2.21 (3H, s).
  • the present compound 52 1 H-NMR (CDCl 3 ) ⁇ : 7.53 (2H, d), 7.28 (2H, d), 6.12-6.02 (1H, m), 5.42 (1H, d), 5.29 (1H, d) ), 4.26 (2H, d), 4.21 (2H, s), 2.42 (3H, s), 2.20 (3H, s), 2.16 (3H, s), 1.30 (9H, s).
  • Invention compound 53 1 H-NMR (CDCl 3 ) ⁇ : .6.83 (1H, t), 6.80-6.78 (1H, m), 6.14-6.12 (1H, m), 6.10-6.00 (1H, m), 5.43-5.38 (1H, m), 5.29-5.26 (1H, m), 5.25 (2H, s), 4.27 (2H, dt), 2.45 (3H, s), 2.19 (3H, s), 2.16 (3H, s) s).
  • Invention compound 54 1 H-NMR (CDCl 3 ) ⁇ : 7.32 (2H, d), 7.29 (2H, d), 6.13-6.02 (1H, m), 5.42 (1H, d), 5.28 (1H, d) ), 4.26 (2H, d), 3.73 (4H, s), 2.45 (3H, s), 2.19 (3H, s), 2.16 (3H, s), 1.31 (9H, s).
  • the present compound 55 1 H-NMR (CDCl 3 ) ⁇ : 7.26 (2H, dd), 6.96 (2H, t), 6.16-6.03 (1H, m), 5.43 (1H, d), 5.29 (1H, d) ), 4.28 (2H, d), 3.63 (2H, s), 3.48 (2H, s), 2.45 (3H, s), 2.27 (3H, s), 2.17 (3H, s), 2.15 (3H, s) .
  • the present compound 56 1 H-NMR (CDCl 3 ) ⁇ : 8.23-8.18 (1H, m), 7.81-7.77 (1H, m), 7.50-7.34 (3H, m), 7.28-7.
  • the present compound 57 1 H-NMR (CDCl 3 ) ⁇ : 7.26-7.21 (2H, m), 6.87 (2H, d), 6.72 (1H, t), 6.11-6.01 (1H, m), 5.43-5.37 (1H, m), 5.28-5.25 (1H, m), 4.50 (2H, s), 4.27 (2H, dt), 2.84 (3H, s), 2.45 (3H, s), 2.18 (3H, s), 2.17 (3H, s).
  • Invention compound 58 1 H-NMR (CDCl 3 ) ⁇ : 7.53 (2H, d), 7.09 (2H, d), 6.13-6.03 (1H, m), 5.45-5.40 (1H, m), 5.30-5.27 (1H, m), 5.17 (2H, s), 4.32-4.30 (2H, m), 2.49 (3H, s), 2.28 (3H, s), 2.21 (3H, s).
  • the present compound 59 1 H-NMR (CDCl 3 ) ⁇ : 7.17-6.98 (3H, m), 6.93-6.90 (1H, m), 6.12-6.04 (1H, m), 5.46-5.41 (1H, m) , 5.32-5.28 (1H, m), 5.09 (2H, s), 4.32 (2H, dt), 2.49 (3H, s), 2.28 (3H, s), 2.21 (3H, s).
  • Invention compound 130 1 H-NMR (CDCl 3 ) ⁇ : 7.52-7.50 (1H, m), 7.26-7.21 (1H, m), 7.15-7.13 (1H, m), 6.83-6.79 (1H, m) , 6.13-6.03 (1H, m), 5.45-5.39 (1H, m), 5.30-5.26 (1H, m), 5.21 (2H, s), 4.31 (2H, dt), 2.48 (3H, s), 2.35 (3H, s), 2.20 (3H, s).
  • Invention compound 157 1 H-NMR (CDCl 3 ) ⁇ : 7.01 to 6.89 (4H, m), 6.13 to 6.04 (1H, m), 5.45 to 5.40 (1H, m), 5.30 to 5.27 (1H, m) , 5.08 (2H, s), 4.30 (2H, dt), 2.48 (3H, s), 2.27 (3H, s), 2.20 (3H, s), 1.88-1.80 (1H, m), 0.91-0.86 (2H , m), 0.63-0.59 (2H, m).
  • Invention compound 172 1 H-NMR (CDCl 3 ) ⁇ : 7.30-7.26 (2H, m), 7.20-7.16 (3H, m), 7.10-7.08 (2H, m), 6.93 (2H, d), 6.13 -6.03 (1H, m), 5.45-5.40 (1H, m), 5.30-5.26 (1H, m), 5.08 (2H, s), 4.30 (2H, dt), 3.92 (2H, s), 2.47 (3H) , s), 2.27 (3H, s), 2.20 (3H, s).
  • the present compound 173 1 H-NMR (CDCl 3 ) ⁇ : 7.55 to 7.52 (2H, m), 7.04 to 6.92 (6H, m), 6.15-6.05 (1H, m), 5.46-5.42 (1H, m) , 5.32-5.29 (1 H, m), 5.12 (2 H, s), 4.33 (2 H, d), 2.50 (3 H, s), 2. 32 (3 H, s), 2.22 (3 H, s).
  • the present compound 60 1 H-NMR (CDCl 3 ) ⁇ : 7.42 (1H, s), 7.36-7.24 (5H, m), 6.17-6.04 (1H, m), 5.43 (1H, d), 5.28 (1H , d), 4.59 (2H, s), 4.29 (2H, d), 2.88 (3H, s), 2.48 (3H, s), 2.39 (3H, s), 2.19 (3H, s).
  • Invention compound 169 1 H-NMR (CDCl 3 ) ⁇ : 7.63 (2H d), 7.53 (2H, d), 6.10 (1 H, m), 5.72 (1 H, dd), 5.44 (1 H, d), 5.30 (1H, d), 4.31 (2H, d), 4.04 (1H, dd), 3.59 (1H, dd), 2.52 (3H, s), 2.43 (3H, s), 2.22 (3H, s).
  • the present compound 9 1 H-NMR (CDCl 3 ) ⁇ : 8.08-7.71 (3H, m), 3.78-3.61 (2H, m), 3.21 (3H, s), 2.60 (3H, s), 2.23-2.08 (5H, m).
  • Production Example 18 The compounds produced according to the method described in Production Example 17 and the physical properties thereof are shown below.
  • the present compound 10 1 H-NMR (CDCl 3 ) ⁇ : 8.44 (1H, s), 7.31-7. 13 (5H, m), 2.59 (2H, t), 2.51 (2H, t), 2.27 (3H, s) ), 2.01 (6H, s), 1.63-1.51 (4H, m), 1. 40-1.28 (4H, m).
  • Present compound 11 1 H-NMR (CDCl 3 ) ⁇ : 7.37 to 7.02 (5H, m), 2.96 to 2.80 (4H, m), 2.06 (6H, s), 2.00 (3H, s).
  • the present compound 12 1 H-NMR (CDCl 3 ) ⁇ : 8.34 (1H, s), 8.20 (1H, s), 7.29-7.24 (2H, m), 7.20-7.14 (2H, m), 4.43 (2H , t), 3.04 (2H, t), 2.30 (3H, s), 2.11 (3H, s), 2.04 (3H, s).
  • the present compound 13 1 H-NMR (CDCl 3 ) ⁇ : 8.35 (1H, s), 8.18 (1H, s), 7.58 (2H, d), 7.37 (2H, d), 4.46 (2H, t), 3.10 (2H, t), 2.30 (3H, s), 2.11 (3H, s), 2.04 (3H, s).
  • the present compound 14 1 H-NMR (CDCl 3 ) ⁇ : 11.31 (1H, s), 7.93-7.70 (3H, m), 4.69 (2H, s), 3.54 (2H, t), 2.78 (2H, t) ), 2.24 (3H, s), 2.04 (3H, s), 2.02-1.87 (5H, m).
  • the present compound 62 1 H-NMR (CDCl 3 ) ⁇ : 7.58 (2H, d), 7.17 (2H, d), 7.04 (2H, d), 7.00 (2H, d), 3.95 (2H, s), 2.20 (3H, s), 2.09 (3H, s), 2.02 (3H, s).
  • Invention compound 63 1 H-NMR (DMSO) ⁇ : 10.93 (1H, s), 7.36 (2H, d), 7.23 (2H, d), 7.06-7.01 (4H, m), 3.90 (2H, s) , 2.22 (3H, s), 1.83 (3H, s), 1.82 (3H, s).
  • Invention compound 64 1 H-NMR (CDCl 3 ) ⁇ : 8.41 (1 H, s), 8. 35 (1 H, br s), 7. 92 (1 H, dd), 7. 19 (2 H, d), 7.11 (2 H, d) , 7.04 (1H, d), 3.96 (2H, s), 2.23 (3H, s), 2.08 (3H, s), 2.02 (3H, s).
  • Invention compound 65 1 H-NMR (DMSO) ⁇ : 10.94 (1H, s), 7.36 (2H, t), 7.19 (2H, d), 7.11 (1H, t), 6.97-6.94 (4H, m) , 3.89 (2H, s), 2.22 (3H, s), 1.85 (3H, s), 1.83 (3H, s).
  • the present compound 66 1 H-NMR (CDCl 3 ) ⁇ : 7.73-7.64 (4H, m), 7.58 (2H, d), 7.27 (2H, d), 4.01 (2H, s), 2.17 (3H, s) ), 2.12 (3H, s), 2.03 (3H, s).
  • Invention compound 67 1 H-NMR (DMSO) ⁇ : 10.95 (1 H, s), 7.56 (1 H, t), 7.46 (1 H, d), 7.26-7.23 (4 H, m), 7.07-7.04 (2 H, m), 3.91 (2H, s), 2.22 (3H, s), 1.83 (3H, s), 1.81 (3H, s).
  • Invention compound 68 1 H-NMR (CDCl 3 ) ⁇ : 7.54 (2H, d), 7.43 (1H, br s), 7.29 (2H, d), 7.17 (2H, d), 7.10 (2H, d) , 4.03 (2H, s), 3.91 (2H, s), 2.47 (3H, s), 2.09 (3H, s), 2.01 (3H, s).
  • Invention compound 69 1 H-NMR (CDCl 3 ) ⁇ : 7.25-7.13 (5H, m), 7.05-6.97 (4H, m), 4.45 (1H, q), 2.15 (3H, s), 2.14 (3H) , s), 2.01 (3H, s), 1.60 (3H, d).
  • the present compound 70 1 H-NMR (CDCl 3 ) ⁇ : 7.65 (2H, d), 7.36 (2H, d), 6.82 (1H, s), 6.09 (1H, s), 2.49 (3H, s), 2.20-2.08 (4H, m), 2.01 (3H, s).
  • the present compound 73 1 H-NMR (CDCl 3 ) ⁇ : 8.29 (1 H, br s), 8. 28 (1 H, s), 7.33 (2 H, d), 7.22 (2 H, d), 5.12 (1 H, dd) , 2.25 (3H, s), 2.12 (3H, s), 2.01 (3H, s), 2.00 (1H, m), 1.85 (1H, m), 0.97 (3H, t).
  • the present compound 74 1 H-NMR (CDCl 3 ) ⁇ : 8.35 (1 H, br s), 8.19 (0.5 H, s), 8. 18 (0.5 H, s), 7. 45 (1 H, s), 7. 36 (1 H, s) s), 7.33 (1H, s), 4.73 (0.5 H, m), 4.67 (0.5 H, m), 4.59 (0.5 H, m), 4.50 (0.5 H, m), 2.32 (1.5 H, s), 2.32 (1.5H, s), 2.10 (1.5H, s), 2.10 (1.5H, s), 2.04 (1.5H, s), 2.04 (1.5H, s), 1.43 (1.5H, d), 1.41 ( 1.5H, d), 1.38 (1.5H, d), 1.38 (1.5H, d).
  • the present compound 153 1 H-NMR (DMSO) ⁇ : 10.97 (1 H, s), 7.77 (1 H, d), 7.63 (1 H, t), 7.30 (1 H, t), 7.24-7. 22 (2 H, m) , 7.01-6.96 (3H, m), 3.90 (2H, s), 2.21 (3H, s), 1.83 (3H, s), 1.82 (3H, s).
  • the present compound 163 1 H-NMR (CDCl 3 ) ⁇ : 7.64 (2H, d), 7.48 (2H, d), 5.27 (2H, s), 2.26 (3H, s), 2.26 (3H, s), 2.08 (3H, s), 2.02 (3H, s).
  • Invention compound 164 1 H-NMR (CDCl 3 ) ⁇ : 8.42 (1 H, br s), 7.57 (2 H, d), 7. 35 (2 H, d), 4.42 (2 H, dd), 3.08 (2 H, dd) , 2.28 (3H, s), 2.16 (3H, s), 2.08 (3H, s), 2.03 (3H, s).
  • Invention compound 165 1 H-NMR (CDCl 3 ) ⁇ : 8.29 (1H, br s), 7.40 (2H, d), 7.23 (2H, d), 5.21 (2H, s), 2.27 (3H, s) , 2.24 (3H, s), 2.08 (3H, s), 2.03 (3H, s).
  • the present compound 15 1 H-NMR (CDCl 3 ) ⁇ : 7.89 (1H, s), 7.24-7.19 (2H, m), 7.14-7.12 (2H, m), 4.54 (2H, s), 3.51 (1H , m), 2.57 (1H, m), 2.30 (3H, s), 2.29-2.19 (2H, m), 2.05 (3H, s), 2.03-1.96 (2H, m), 1.95 (3H, s), 1.58-1.44 (4H, m).
  • Production Example 20 The compounds produced according to the method described in Production Example 19 and the physical properties thereof are shown below. In the compounds represented by Formula (A-5), compounds in which R 1x is any of those described in [Table 7].
  • the present compound 71 1 H-NMR (CDCl 3 ) ⁇ : 8.42 (1 H, br s), 8. 25 (0.5 H, s), 8.23 (0.5 H, s), 6. 92 (0.5 H, s), 6. 92 (0.5) H, s), 4.50-4.28 (2H, m), 2.32 (1.5 H, s), 2.32 (1.5 H, s), 2.13 (1.5 H, s), 2.13 (1.5 H, s), 2.05 (1.5 H) , s), 2.04 (1.5 H, s), 1. 39 (1.5 H, d), 1. 35 (1.5 H, d), 1. 30 (1.5 H, d), 1. 27 (1.5 H, d).
  • the present compound 72 1 H-NMR (CDCl 3 ) ⁇ : 8.34 (1H, s), 8.30 (1H, s), 7.66 (2H, d), 7.49 (2H, d), 5.29 (2H, s), 2.29 (3H, s), 2.12 (3H, s), 2.03 (3H, s).
  • the present compound 75 1 H-NMR (CDCl 3 ) ⁇ : 8.30 (1H, br s), 7.45 (2H, d), 6.88 (2H, d), 4.99 (2H, s), 2.31 (3H, s) , 2.05 (3H, s), 2.04 (3H, s).
  • the present compound 76 1 H-NMR (CDCl 3 ) ⁇ : 7.84 (1 H, s), 7.81 (1 H, s), 5. 27 (2 H, s), 2. 25 (3 H, s), 2. 16 (3 H, s), 2.01 (3H, s).
  • the present compound 77 1 H-NMR (CDCl 3 ) ⁇ : 8.55 (1 H, br s), 7.65 (2 H, d), 7.07 (2 H, d), 5.07 (2 H, s), 2. 33 (3 H, s) , 2.06 (3H, s), 2.05 (3H, s).
  • Invention compound 78 1 H-NMR (CDCl 3 ) ⁇ : 8.60 (1H, br s), 8.04 (2H, d), 7.02 (2H, d), 5.06 (2H, s), 3.90 (3H, s) , 2.33 (3H, s), 2.06 (3H, s), 2.05 (3H, s).
  • Invention compound 79 1 H-NMR (CDCl 3 ) ⁇ : 8.28 (2H, d), 8.24 (1H, br s), 7.10 (2H, d), 5.13 (2H, s), 2.33 (3H, s) , 2.08 (3H, s), 2.06 (3H, s).
  • the present compound 80 1 H-NMR (CDCl 3 ) ⁇ : 8.80 (1 H, s), 7.42 (1 H, s), 7. 40-7. 20 (5 H, m), 4.6 1 (2 H, s), 2. 93 (3 H, s) ), 2.29 (3H, s), 2.10 (3H, s), 2.04 (3H, s).
  • Invention compound 81 1 H-NMR (CDCl 3 ) ⁇ : 8.26 (1H, s), 8.09 (1H, s), 7.71 (2H, d), 7.66 (2H, d), 5.18 (2H, s), 2.28 (3H, s), 2.07 (3H, s), 2.04 (3H, s).
  • Invention compound 82 1 H-NMR (CDCl 3 ) ⁇ : 8.37 (1H, s), 7.30 (2H, d), 7.19 (2H, d), 4.01 (2H, s), 2.22 (3H, s), 2.02 (3H, s), 2.00 (3H, s), 1.28 (9H, s).
  • the present compound 83 1 H-NMR (CDCl 3 ) ⁇ : 6.81 to 6.80 (2H, m), 6.19 (1H, t), 5.17 (2H, s), 2.32 (3H, s), 2.01 (3H, s) ), 1.98 (3H, s).
  • Invention compound 84 1 H-NMR (CDCl 3 ) ⁇ : 8.38 (1H, s), 7.30 (2H, d), 7.10 (2H, d), 3.60 (4H, s), 2.16 (3H, s), 2.00 (3H, s), 1.94 (3H, s), 1.29 (9H, s).
  • Invention compound 85 1 H-NMR (CDCl 3 ) ⁇ : 8.39 (1H, s), 8.28 (1H, s), 7.41 (2H, d), 7.25 (2H, d), 5.24 (2H, s), 2.31 (3H, s), 2.12 (3H, s), 2.04 (3H, s).
  • Invention compound 86 1 H-NMR (CDCl 3 ) ⁇ : 8.39 (1H, s), 8.30 (1H, s), 7.69 (2H, d), 7.43 (2H, d), 5.28 (2H, s), 2.30 (3H, s), 2.13 (3H, s), 2.03 (3H, s).
  • Invention compound 87 1 H-NMR (CDCl 3 ) ⁇ : 8.98 (1H, s), 7.24 (2H, dd), 7.05 (2H, t), 3.58 (2H, s), 3.49 (2H, s), 2.30 (3H, s), 2.28 (3H, s), 2.03 (3H, s), 1.98 (3H, s).
  • Invention compound 88 1 H-NMR (CDCl 3 ) ⁇ : 9.82 (1H, br s), 4.60-4.51 (2H, m), 4.17-4.11 (1H, m), 3.95-3.84 (2H, m), 3.74-3.70 (1H, m), 3.47-3.43 (1H, m), 2.30 (3H, s), 2.04 (3H, s), 2.01-1.95 (3H, m), 1.94 (3H, s), 1.66- 1.58 (1 H, m).
  • Invention compound 89 1 H-NMR (CDCl 3 ) ⁇ : 9.10 (1 H, br s), 7. 85 (1 H, d), 7.43 (1 H, d), 4.99 (2 H, s), 4.
  • the present compound 91 1 H-NMR (CDCl 3 ) ⁇ : .8.58 (1H, s), 7.30-7.26 (2H, m), 6.92-6.88 (1H, m), 6.77 (2H, d), 4.31 (4H) 2H, s), 3.02-3.02 (3H, m), 2.21 (3H, s), 2.04 (6H, s).
  • the present compound 92 1 H-NMR (CDCl 3 ) ⁇ : 8.42 (1 H, s), 8.32 (1 H, s), 8.23 (1 H, s), 7. 85 (1 H, d), 4.71-4.
  • Invention compound 94 1 H-NMR (CDCl 3 ) ⁇ : 8.51 (1 H, br s), 7.46-7.45 (1 H, m), 6.41-6.38 (2 H, m), 4.62 (2 H, s), 4.51 2H, s), 2.28 (3H, s), 2.03 (3H, s), 1. 92 (3H, s).
  • the present compound 95 1 H-NMR (CDCl 3 ) ⁇ : 8.47 (1 H, br s), 7.37-7.35 (1 H, m), 7.02-7.01 (1 H, m), 4.84 (2 H, s), 4.55 ( 2H, s), 2.29 (3H, s), 2.04 (3H, s), 1.93 (3H, s).
  • the present compound 96 1 H-NMR (CDCl 3 ) ⁇ : 8.52 (1H, br s), 7.21-7.20 (2H, m), 7.16-7.15 (1H, m), 6.93-6.90 (1H, m), 4.99 (2H, s), 2.33 (3H, s), 2.06 (3H, s), 2.05 (3H, s).
  • Invention compound 138 1 H-NMR (CDCl 3 ) ⁇ : 8.90 (1H, br s), 7.62-7.60 (1H, m), 7.37-7.33 (1H, m), 7.03-7.01 (1H, m), 6.99-6.96 (1H, m), 5.09 (2H, s), 2.36 (3H, s), 2.07 (3H, s), 2.03 (3H, s).
  • Invention compound 158 1 H-NMR (CDCl 3 ) ⁇ : 8.55 (1H, br s), 7.06-7.03 (2H, m), 6.89-6.84 (2H, m), 4.97 (2H, s), 2.31 3H, s), 2.05 (3H, s), 2.03 (3H, s), 1.90-1.
  • Invention compound 174 1 H-NMR (CDCl 3 ) ⁇ : 8.38 (1H, br s), 7.31-7.26 (2H, m), 7.23-7.15 (5H, m), 6.91 (2H, d), 4.99 (C) 2H, s), 3.95 (2H, s), 2.30 (3H, s), 2.05 (3H, s), 2.03 (3H, s).
  • Invention compound 175 1 H-NMR (CDCl 3 ) ⁇ : 8.37 (1 H, br s), 7.57 (2 H, d), 7.07-6.99 (6 H, m), 5.03 (2 H, s), 2. 33 (3 H, s), 2.06 (3H, s), 2.05 (3H, s).
  • the present compound 16 1 H-NMR (CDCl 3 ) ⁇ : 7.89 (1H, s), 7.69 (1H, d), 7.46 (1H, d), 3.28-3.21 (4H, m), 2.51 (3H, s) ), 2.36 (3H, s), 2.07 (3H, s), 1.95 (3H, s).
  • Production Example 22 The compounds produced according to the method described in Production Example 21 and the physical properties thereof are shown below.
  • the present compound 17 1 H-NMR (CDCl 3 ) ⁇ : 7.30-7.23 (2H, m), 7.19-7.13 (3H, m), 2.73 (2H, t), 2.59 (2H, t), 2.46 (3H , s), 2.36 (3H, s), 2.05 (3H, s), 2.03 (3H, s), 1.68-1.56 (4H, m), 1.46-1.33 (4H, m).
  • the present compound 18 1 H-NMR (CDCl 3 ) ⁇ : 7.31-7.16 (5H, m), 3.09-2.93 (4H, m), 2.51 (3H, s), 2.36 (3H, s), 2.06 (3H) , s), 1.98 (3H, s).
  • the present compound 19 1 H-NMR (CDCl 3 ) ⁇ : 8.32 (1H, s), 7.26 (2H, d), 7.14 (2H, d), 4.43 (2H, t), 3.04 (2H, t), 2.53 (3H, s), 2.39 (3H, s), 2.25 (3H, s), 2.10 (3H, s).
  • the present compound 20 1 H-NMR (CDCl 3 ) ⁇ : 8.32 (1 H, s), 7.55 (2 H, d), 7. 36 (2 H, d), 4. 45 (2 H, t), 3. 10 (2 H, t), 2.53 (3H, s), 2.39 (3H, s), 2.24 (3H, s), 2.10 (3H, s).
  • the present compound 21 1 H-NMR (CDCl 3 ) ⁇ : 7.91-7.86 (2H, m), 7.83-7.76 (1H, m), 4.74 (2H, s), 3.64 (2H, t), 2.88 (2H) , t), 2.45 (3 H, s), 2. 37 (3 H, s), 2. 11-2.00 (8 H, m).
  • Invention compound 22 1 H-NMR (CDCl 3 ) ⁇ : 7.23-7.17 (2H, m), 7.15-7.09 (2H, m), 4.67 (2H, s), 3.42 (1H, m), 2.58-2.46 (4H, m), 2.38 (3H, s), 2.25-2.16 (5H, m), 2.07 (3H, s), 1.98-1.88 (2H, m), 1.53-1.36 (4H, m).
  • the present compound 97 1 H-NMR (CDCl 3 ) ⁇ : 8.32 (1 H, s), 8. 29 (1 H, m), 7.82 (1 H, m), 4.66-4.
  • Invention compound 99 1 H-NMR (CDCl 3 ) ⁇ : 8.39 (1H, s), 7.61 (2H, d), 7.51 (2H, d), 5.30 (2H, s), 2.52 (3H, s), 2.37 (3H, s), 2.20 (3H, s), 2.09 (3H, s).
  • the present compound 100 1 H-NMR (CDCl 3 ) ⁇ : 8.33 (1H, s), 7.34 (2H, d), 7.17 (2H, d), 5.13 (1H, dd), 2.49 (3H, s), 2.35 (3H, s), 2.10 (3H, s), 2.07 (3H, s), 2.02 (1H, m), 1.86 (1H, m), 0.95 (3H, t).
  • the present compound 101 1 H-NMR (CDCl 3 ) ⁇ : 8.28 (0.5 H, s), 8. 27 (0.5 H, s), 7.41 (1 H, s), 7. 36 (1 H, s), 7.34 (1 H, s) ), 4.83-4.74 (1H, m), 4.61 (0.5 H, m), 4.51 (0.5 H, m), 2.52 (1.5 H, s), 2.52 (1.5 H, s), 2. 39 (1.5 H, s) , 2.38 (1.5 H, s), 2. 27 (1.5 H, s), 2.22 (1.5 H, s), 2. 10 (1.5 H, s), 2. 10 (1.5 H, s), 1.42 (1.5 H, d), 1.
  • Invention compound 103 1 H-NMR (CDCl 3 ) ⁇ : 7.16-7.14 (4H, m), 6.96-6.94 (2H, m), 6.90-6.88 (2H, m), 4.15 (2H, s), 2.52 (3H, s), 2.35 (3H, s), 2.07 (3H, s), 2.01 (3H, s).
  • Invention compound 104 1 H-NMR (CDCl 3 ) ⁇ : 8.44 (1 H, s), 7.87 (1 H, dd), 7.22 (2 H, d), 7.02 (2 H, d), 6.95 (1 H, d), 4.18 (2H, s), 2.52 (3H, s), 2.36 (3H, s), 2.07 (3H, s), 2.03 (3H, s).
  • the present compound 105 1 H-NMR (CDCl 3 ) ⁇ : 7.72-7.63 (4H, m), 7.48 (2H, d), 7.26 (2H, d), 4.22 (2H, s), 2.53 (3H, s) ), 2.35 (3H, s), 2.08 (3H, s), 2.02 (3H, s).
  • the present compound 106 1 H-NMR (CDCl 3 ) ⁇ : 7.73 (1H, s), 7.67 (1H, s), 5.41 (2H, s), 2.50 (3H, s), 2.37 (3H, s), 2.11 (3H, s), 2.08 (3H, s).
  • the present compound 107 1 H-NMR (CDCl 3 ) ⁇ : 7.36 (2H, d), 6.89 (2H, d), 5.11 (2H, s), 2.51 (3H, s), 2.38 (3H, s), 2.16 (3H, s), 2.09 (3H, s).
  • Invention compound 108 1 H-NMR (CDCl 3 ) ⁇ : 7.57 (2H, d), 7.08 (2H, d), 5.20 (2H, s), 2.52 (3H, s), 2.38 (3H, s) , 2.16 (3H, s), 2.10 (3H, s).
  • the present compound 110 1 H-NMR (CDCl 3 ) ⁇ : 7.98 (2H, d), 7.03 (2H, d), 5.19 (2H, s), 3.87 (3H, s), 2.52 (3H, s), 2.38 (3H, s), 2.17 (3H, s), 2.09 (3H, s).
  • Invention compound 111 1 H-NMR (CDCl 3 ) ⁇ : 8.19 (2H, d), 7.09 (2H, d), 5.25 (2H, s), 2.52 (3H, s), 2.39 (3H, s), 2.17 (3H, s), 2.10 (3H, s).
  • Invention compound 112 1 H-NMR (CDCl 3 ) ⁇ : 8.13 (1H, s), 7.67 (2H, d), 7.61 (2H, d), 5.34 (2H, s), 2.53 (3H, s), 2.38 (3H, s), 2.22 (3H, s), 2.09 (3H, s).
  • Invention compound 113 1 H-NMR (CDCl 3 ) ⁇ : 7.33 (2H, d), 7.27 (2H, d), 4.22 (2H, s), 2.44 (3H, s), 2.36 (3H, s), 2.08 (3H, s), 2.05 (3H, s), 1.30 (9H, s).
  • Invention compound 114 1 H-NMR (CDCl 3 ) ⁇ : 7.32 (2H, d), 7.29 (2H, d), 3.75 (2H, s), 3.72 (2H, s), 2.49 (3H, s), 2.36 (3H, s), 2.06 (3H, s), 2.05 (3H, s), 1.31 (9H, s).
  • Invention compound 115 1 H-NMR (CDCl 3 ) ⁇ : 6.86-6.85 (1H, m), 6.80-6.79 (1H, m), 6.15-6.13 (1H, m), 5.27 (2H, s), 2.49 (3H, s), 2.36 (3H, s), 2.08 (3H, s), 2.07 (3H, s).
  • Invention compound 116 1 H-NMR (CDCl 3 ) ⁇ : 8.37 (1 H, s), 7.43 (2 H, d), 7. 20 (2 H, d), 5. 24 (2 H, s), 2.52 (3 H, s), 2.38 (3H, s), 2.20 (3H, s), 2.09 (3H, s).
  • Invention compound 117 1 H-NMR (CDCl 3 ) ⁇ : 8.39 (1H, s), 7.64 (2H, d), 7.45 (2H, d), 5.28 (2H, s), 2.52 (3H, s), 2.38 (3H, s), 2.19 (3H, s), 2.09 (3H, s).
  • Invention compound 118 1 H-NMR (CDCl 3 ) ⁇ : 7.42-7.38 (1 H, m), 7.31-7. 29 (1 H, m), 7.21-7. 20 (1 H, m), 7. 17-7. 14 (2 H, m) , 7.12-7.09 (1H, m), 6.93-6.89 (2H, m), 4.17 (2H, s), 2.52 (3H, s), 2.36 (3H, s), 2.07 (3H, s), 2.01 (3H) , s).
  • the present compound 119 1 H-NMR (CDCl 3 ) ⁇ : 7.25 (2H, dd), 6.96 (2H, t), 3.69 (2H, s), 3.48 (2H, s), 2.48 (3H, s), 2.37 (3H, s), 2.15 (3H, s), 2.14 (3H, s), 2.06 (3H, s).
  • the present compound 120 1 H-NMR (CDCl 3 ) ⁇ : 7.74 (1H, d), 7.32-7.31 (1H, m), 4.88 (2H, s), 4.78 (2H, s), 2.50 (3H, s) ), 2.37-2.37 (3H, m), 2.17 (3H, s), 2.08 (3H, s).
  • Invention compound 121 1 H-NMR (CDCl 3 ) ⁇ : 4.71-4.63 (2H, m), 4.08-4.02 (1H, m), 3.88-3.83 (1H, m), 3.77-3.72 (1H, m) , 3.49-3.47 (2H, m), 2.49 (3H, s), 2.37-2.37 (3H, m), 2.17 (3H, s), 2.07 (3H, s), 1.96-1.80 (3H, m), 1.63 -1.54 (1 H, m).
  • Invention compound 122 1 H-NMR (CDCl 3 ) ⁇ : 8.21 (1H, d), 7.77 (1H, d), 7.47-7.35 (4H, m), 7.01 (1H, d), 5.33 (2H, s) ), 2.54 (3H, s), 2.36 (3H, s), 2.22 (3H, s), 2.11 (3H, s).
  • Invention compound 123 1 H-NMR (CDCl 3 ) ⁇ : 7.23 (2H, t), 6.87-6.85 (2H, m), 6.72 (1H, t), 4.52 (2H, s), 2.84 (3H, s) ), 2.48 (3H, s), 2.34-2.34 (3H, m), 2.06 (3H, s), 2.04 (3H, s).
  • the present compound 124 1 H-NMR (CDCl 3 ) ⁇ : 7.53 (2H, d), 7.08 (2H, d), 5.19 (2H, s), 2.52 (3H, s), 2.38 (3H, s), 2.17 (3H, s), 2.09 (3H, s).
  • Invention compound 125 1 H-NMR (CDCl 3 ) ⁇ : 7.40 (1 H, t), 6.33 to 6.33 (2 H, m), 4. 64 (2 H, s), 4.50 (2 H, s), 2. 49 (3 H, s) ), 2.36-2.36 (3H, m), 2.10 (3H, s), 2.06 (3H, s).
  • Invention compound 126 1 H-NMR (CDCl 3 ) ⁇ : 7.30-7.28 (1 H, m), 6.94-6. 93 (1 H, m), 4.71 (2 H, s), 4. 69 (2 H, s), 2.50 (3 H , s), 2.38 (3H, s), 2.15 (3H, s), 2.08 (3H, s).
  • Invention compound 127 1 H-NMR (CDCl 3 ) ⁇ : 7.23 (2H, d), 7.14 (2H, d), 6.96 (2H, d), 6.88 (2H, d), 4.32 (1H, q), 2.52 (3H, s), 2.34 (3H, s), 2.05 (3H, s), 1.98 (3H, s), 1.65 (3H, d).
  • Invention compound 128 1 H-NMR (CDCl 3 ) ⁇ : 7.66 (2H, d), 7.38 (2H, d), 7.27 (1H, s), 7.20 (1H, s), 2.54 (3H, s), 2.38 (3H, s), 2.21 (3H, s), 2.09 (3H, s), 2.08 (3H, s).
  • Invention compound 151 1 H-NMR (CDCl 3 ) ⁇ : 7.20-7.07 (3H, m), 6.95-6.93 (1H, m), 5.12 (2H, s), 2.52 (3H, s), 2.38 (3H) , s), 2.16 (3H, s), 2.09 (3H, s).
  • Invention compound 152 1 H-NMR (CDCl 3 ) ⁇ : 7.52-7.50 (1H, m), 7.24-7.22 (1H, m), 7.14-7.12 (1H, m), 6.84-6.80 (1H, m) , 5.23 (2H, s), 2.51 (3H, s), 2.38 (3H, s), 2.24 (3H, s), 2.09 (3H, s).
  • the present compound 154 1 H-NMR (CDCl 3 ) ⁇ : 7.64 (1H, d), 7.41 (1H, t), 7.17-7.10 (3H, m), 6.94-6.87 (3H, m), 4.15 (2H) , s), 2.52 (3H, s), 2.35 (3H, s), 2.07 (3H, s), 2.00 (3H, s).
  • Invention compound 159 1 H-NMR (CDCl 3 ) ⁇ : 7.01 to 6.98 (2H, m), 6.92-6.88 (2H, m), 5.10 (2H, s), 2.51 (3H, s), 2.37 (3H) , s), 2.16 (3H, s), 2.08 (3H, s), 1.87-1.81 (1H, m), 0.91-0.86 (2H, m), 0.63-0.59 (2H, m).
  • Invention compound 166 1 H-NMR (CDCl 3 ) ⁇ : 7.60 (2H, d), 7.49 (2H, d), 5.24 (2H, s), 2.50 (3H, s), 2.36 (3H, s), 2.30 (3H, s), 2.07 (3H, s), 2.02 (3H, s).
  • Invention compound 167 1 H-NMR (CDCl 3 ) ⁇ : 7.55 (2H, d), 7.36 (2H, d), 4.37 (2H, dd), 3.07 (2H, dd), 2.50 (3H, s), 2.38 (3H, s), 2.22 (3H, s), 2.16 (3H, s), 2.08 (3H, s).
  • Invention compound 168 1 H-NMR (CDCl 3 ) ⁇ : 7.41 (2H, d), 7.19 (2H, d), 5.18 (2H, s), 2.49 (3H, s), 2.36 (3H, s), 2.28 (3H, s), 2.07 (3H, s), 2.02 (3H, s).
  • Invention compound 171 1 H-NMR (CDCl 3 ) ⁇ : 7.54 (2H d), 7.52 (2H, d), 5.72 (1 H, dd), 4.05 (1 H, dd), 3.60 (1 H, dd), 2.46 (3H, s), 2.42 (3H, s), 2.40 (3H, s), 2.10 (3H, s).
  • Invention compound 176 1 H-NMR (CDCl 3 ) ⁇ : 7.30-7.26 (2H, m), 7.20-7.17 (3H, m), 7.09 (2H, d), 6.93 (2H, d), 5.10 (2H) , s), 3.92 (2H, s), 2.51 (3H, s), 2.37 (3H, s), 2.16 (3H, s), 2.08 (3H, s).
  • the present compound 177 1 H-NMR (CDCl 3 ) ⁇ : 7.54 (2H, d), 7.04-6.97 (6H, m), 5.14 (2H, s), 2.52 (3H, s), 2.39 (3H, s) ), 2.20 (3H, s), 2.10 (3H, s).
  • Invention compound 23 1 H-NMR (CDCl 3 ) ⁇ : 7.90-7.85 (2H, m), 7.82-7.78 (1H, m), 4.74 (2H, s), 3.93 (3H, s), 3.64 (2H) , t), 2.89 (2H, t), 2.46 (3H, s), 2.13 (3H, s), 2.12-2.01 (5H, m).
  • Production Example 25 The compounds produced according to the method described in Production Example 24 and the physical properties thereof are shown below.
  • the present compound 24 1 H-NMR (CDCl 3 ) ⁇ : 7.22-7.17 (2H, m), 7.15-7.09 (2H, m), 4.67 (2H, s), 3.94 (3H, s), 3.44 (1H , m), 2.57-2.45 (4H, m), 2.26-2.17 (5H, m), 2.13 (3H, s), 1.97-1.87 (2H, m), 1.54-1.36 (4H, m).
  • Invention compound 131 1 H-NMR (CDCl 3 ) ⁇ : 8.34 (0.5 H, s), 8.31 (0.5 H, s), 6.91 (0.5 H, s), 6.90 (0.5 H, s), 4.51-4.
  • the present compound 132 1 H-NMR (CDCl 3 ) ⁇ : 7.54 (2H, d), 7.17 (2H, d), 7.00 (2H, d), 6.93 (2H, d), 4.17 (2H, s), 3.92 (3H, s), 2.53 (3H, s), 2.13 (3H, s), 2.07 (3H, s).
  • Invention compound 133 1 H-NMR (CDCl 3 ) ⁇ : 7.16-7.14 (4H, m), 6.97-6.94 (2H, m), 6.91-6.89 (2H, m), 4.15 (2H, s), 3.92 (3H, s), 2.52 (3H, s), 2.12 (3H, s), 2.06 (3H, s).
  • Invention compound 134 1 H-NMR (CDCl 3 ) ⁇ : 8.44 (1H, s), 7.87 (1H, dd), 7.23 (2H, d), 7.03 (2H, d), 6.96 (1H, d), 4.19 (2H, s), 3.92 (3H, s), 2.52 (3H, s), 2.12 (3H, s), 2.09 (3H, s).
  • Invention compound 135 1 H-NMR (CDCl 3 ) ⁇ : 7.33-7.28 (2H, m), 7.12 (2H, d), 7.06 (1H, t), 6.98-6.95 (2H, m), 6.91-6.88 (2H, m), 4.14 (2H, s), 3.92 (3H, s), 2.52 (3H, s), 2.12 (3H, s), 2.06 (3H, s).
  • the present compound 136 1 H-NMR (CDCl 3 ) ⁇ : 7.7-7.63 (4H, m), 7.48 (2H, d), 7.27 (2H, d), 4.22 (2H, s), 3.92 (3H, s) ), 2.54 (3H, s), 2.13 (3H, s), 2.07 (3H, s).
  • Invention compound 137 1 H-NMR (CDCl 3 ) ⁇ : 7.51 (2H, d), 7.26 (2H, d), 7.10 (2H, d), 7.04 (2H, d), 4.13 (2H, s), 3.97 (2H, s), 3.91 (3H, s), 2.54 (3H, s), 2.11 (3H, s), 2.04 (3H, s).
  • Invention compound 139 1 H-NMR (CDCl 3 ) ⁇ : 8.14 (1H, s), 7.63 (2H, d), 7.60 (2H, d), 5.60 (2H, s), 2.54 (3H, s), 2.40 (3H, s), 2.33 (3H, s), 2.14 (3H, s).
  • the present compound 140 1 H-NMR (CDCl 3 ) ⁇ : 7.68 (2H, t), 7.06 (2H, t), 4.71 (1H, d), 4.58 (1H, d), 4.79 (1H, d), 4.40 (1H, d), 3.19 (3H, s), 2.55 (3H, s), 2.38 (3H, s), 2.17 (3H, s), 2.11 (3H, s).
  • Production Example 28 The compounds produced according to the method described in Production Example 27 and the physical properties thereof are shown below.
  • compounds wherein R 1x and R 2x are any combination of those described in [Table 11].
  • Invention compound 142 1 H-NMR (CDCl 3 ) ⁇ : 7.57 (2H, d), 7.07 (2H, d), 5.19 (2H, s), 2.51 (3H, s), 2.16 (3H, s), 2.09 (3H, s), 1.97-1.88 (1H, m), 1.24-1.17 (2H, m), 1.11-1.06 (2H, m).
  • Invention compound 143 1 H-NMR (CDCl 3 ) ⁇ : 8.12 (1H, s), 7.67 (2H, d), 7.61 (2H, d), 5.34 (2H, s), 2.91 (1H, m), 2.53 (3H, s), 2.20 (3H, s), 2.07 (3H, s), 1.38 (6H, d).
  • the present compound 144 1 H-NMR (CDCl 3 ) ⁇ : 8.32 (1H, s), 8.29 (1H, s), 7.82 (1H, d), 4.68-4.53 (3H, m), 2.68 (2H, q) ), 2.51 (3H, s), 2.25 (3H, s), 2.08 (3H, s), 1.94-1.77 (2H, m), 1.33 (3H, t), 1.06 (3H, t).
  • the present compound 145 1 H-NMR (CDCl 3 ) ⁇ : 8.32 (1H, s), 8.29 (1H, s), 7.82 (1H, d), 4.68-4.53 (3H, m), 2.63 (2H, t) ), 2.51 (3H, s), 2.25 (3H, s), 2.08 (3H, s), 1.94-1.77 (4H, m), 1.08 (3H, t), 1.06 (3H, t).
  • the present compound 146 1 H-NMR (CDCl 3 ) ⁇ : 8.34 (1H, br s), 7.36 (2H, d), 7.18 (2H, d), 5.16 (1H, t), 3.67 (2H, t) , 2.45 (3H, s), 2.21 (3H, s), 2.18 (3H, s), 2.10-1.98 (1H, m), 1. 90-1.77 (3H, m), 1.06 (3H, t), 0.96 (3H) , t).
  • Production Example 30 The compounds produced according to the method described in Production Example 29 and the physical properties thereof are shown below.
  • compounds wherein R 1x and R 2x are any combination of those described in [Table 12].
  • the present compound 147 1 H-NMR (CDCl 3 ) ⁇ : 8.14 (1 H, s), 7.69 (2 H, d), 7.61 (2 H, d), 5.33 (2 H, s), 3.73 (3 H, s), 2.49 (3H, s), 2.34 (3H, s), 2.21 (3H, s).
  • the present compound 155 1 H-NMR (CDCl 3 ) ⁇ : 7.31-7.28 (1H, m), 6.97-6.93 (1H, m), 4.74 (2H, s), 4.67 (2H, s), 4.15 (2H) , q), 2.48 (3H, s), 2.28 (3H, s), 2.21 (3H, s).
  • Invention compound 156 1 H-NMR (CDCl 3 ) ⁇ : 7.14 (4H, d), 6.95 (2H, d), 6.89 (2H, d), 4.99 (2H, s), 4.12 (2H, s), 3.83 (2H, q), 2.49 (3H, s), 2.20 (3H, s), 2.13 (3H, s), 1.25 (3H, t).
  • the present compound 149 1 H-NMR (CDCl 3 ) ⁇ : 7.34 (2H, d), 7.28 (2H, d), 4.21 (2H, s), 2.44 (3H, s), 2.13 (3H, s), 2.10 (3H, s), 1.55 (9H, s), 1.30 (9H, s).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is any of the substituents described in [Table A13] to [Table A27]
  • Compounds that are groups hereinafter referred to as compound group SX1).
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX2.
  • R 2 is a cyclopropyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27]
  • Compounds which are any of the substituents described in hereinafter referred to as compound group SX3.
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX4.
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX5).
  • R 2 is a cyclopropyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX7).
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27]
  • Compounds which are any of the substituents described in hereinafter referred to as compound group SX8.
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX9).
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX10).
  • R 2 is a cyclopropyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX11).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds which are any of the substituents described below hereinafter referred to as compound group SX12).
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX13).
  • R 2 is a cyclopropyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is [Table A 13] to [Table A 27]
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX15).
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is a methyl group
  • R A is [Table A 13] to [Table A 27]
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is a methyl group
  • R A is [Table A 13] to [Table A 27]
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is an ethyl group
  • R A is [Table A 13] to [Table A 27]
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is a cyclopropyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • the compound which is any one of the substituents as described in the following hereinafter referred to as compound group SX21).
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is a cyclopropyl group
  • R A is a group represented by [Table A13] to [Table A27] ]
  • the compound which is a substituent in any one of-(It is hereafter described as compound group SX22.).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is any of the substituents described in [Table A13] to [Table A27]
  • Compounds that are groups (hereinafter referred to as compound group SX23).
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX24).
  • R 2 is a cyclopropyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27]
  • Compounds which are any of the substituents described in hereinafter referred to as compound group SX25).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX26).
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX27.
  • R 2 is a cyclopropyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX28).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX30).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described hereinafter referred to as compound group SX31).
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX32).
  • R 2 is a cyclopropyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27]
  • Compounds which are any of the substituents described in hereinafter referred to as compound group SX33).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX34).
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX35).
  • R 2 is a cyclopropyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX36).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX38).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX40).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX42).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is a cyclopropyl group
  • R A is a group represented by [Table A13] to [Table A27] ]
  • the compound which is any one of the substituents as described in the following hereinafter referred to as compound group SX43).
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is a cyclopropyl group
  • R A is a group represented by [Table A13] to [Table A27] ]
  • the compound which is any one of the substituents as described in the following hereinafter referred to as compound group SX44).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is any of the substituents described in [Table A13] to [Table A27]
  • Compounds that are groups (hereinafter referred to as compound group SX45).
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX46).
  • R 2 is a cyclopropyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27]
  • Compounds which are any of the substituents described in hereinafter referred to as compound group SX47).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX48).
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds which are any of the substituents described below hereinafter referred to as compound group SX49).
  • R 2 is a cyclopropyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX50).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX52).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds which are any of the substituents described below hereinafter referred to as compound group SX53).
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds which are any of the substituents described below hereinafter referred to as compound group SX54).
  • R 2 is a cyclopropyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27]
  • Compounds which are any of the substituents described in hereinafter referred to as compound group SX55).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX56).
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX57).
  • R 2 is a cyclopropyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX58).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX60).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX62).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX64).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is a cyclopropyl group
  • R A is a group represented by [Table A13] to [Table A27] ]
  • the compound which is any one of the substituents as described in the following hereinafter referred to as compound group SX65).
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is a cyclopropyl group
  • R A is a group represented by [Table A13] to [Table A27] ]
  • the compound which is any one of the substituents as described in the following hereinafter referred to as compound group SX66).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is any of the substituents described in [Table A13] to [Table A27]
  • Compounds that are groups (hereinafter referred to as compound group SX67).
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX68).
  • R 2 is a cyclopropyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27]
  • Compounds which are any of the substituents described in hereinafter referred to as compound group SX69).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX70).
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX71).
  • R 2 is a cyclopropyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX72).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX74).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX75
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described hereinafter referred to as compound group SX76).
  • R 2 is a cyclopropyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27]
  • Compounds which are any of the substituents described in hereinafter referred to as compound group SX77).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX78).
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX79).
  • R 2 is a cyclopropyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27]
  • Compounds which are any of the substituents described in hereinafter referred to as compound group SX80).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A 13] to [Table A 27]
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX84).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX86).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is a cyclopropyl group
  • R A is a group represented by [Table A13] to [Table A27] ]
  • the compound which is any one of the substituents as described in the following hereinafter referred to as compound group SX87).
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is a cyclopropyl group
  • R A is a group represented by [Table A13] to [Table A27] ]
  • the compound which is any one of the substituents as described in the following hereinafter referred to as compound group SX88).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is any of the substituents described in [Table A13] to [Table A27]
  • Compounds that are groups (hereinafter referred to as compound group SX89).
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX90).
  • R 2 is a cyclopropyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27]
  • Compounds which are any of the substituents described in hereinafter referred to as compound group SX91).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX92).
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX93).
  • R 2 is a cyclopropyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX94).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX96).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX97).
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX98).
  • R 2 is a cyclopropyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27]
  • Compounds which are any of the substituents described in hereinafter referred to as compound group SX99).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX100).
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX101).
  • R 2 is a cyclopropyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX102).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX104).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is a methyl group
  • R A is [Table A 13] to [Table A 27]
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX106).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX108).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is a cyclopropyl group
  • R A is a group represented by [Table A13] to [Table A27] ]
  • the compound which is any one of the substituents as described in the following hereinafter referred to as compound group SX109).
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is a cyclopropyl group
  • R A is a group represented by [Table A13] to [Table A27] ]
  • the compound which is any one of the substituents as described in the following hereinafter referred to as compound group SX110).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is any of the substituents described in [Table A13] to [Table A27]
  • Compounds that are groups (hereinafter referred to as compound group SX111).
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX112).
  • R 2 is a cyclopropyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27]
  • Compounds which are any of the substituents described in hereinafter referred to as compound group SX113).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX114).
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds which are any of the substituents described below hereinafter referred to as compound group SX115).
  • R 2 is a cyclopropyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX116).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX118).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX119).
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX120).
  • R 2 is a cyclopropyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27]
  • Compounds which are any of the substituents described in hereinafter referred to as compound group SX121).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX122).
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX123).
  • R 2 is a cyclopropyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX124).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX126).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is a methyl group
  • R A is [Table A 13] to [Table A 27]
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX128).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX130).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is a cyclopropyl group
  • R A is a group represented by [Table A13] to [Table A27] ]
  • the compound which is any one of the substituents as described in the following hereinafter referred to as compound group SX131).
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is a cyclopropyl group
  • R A is a group represented by [Table A13] to [Table A27] ]
  • the compound which is any one of the substituents as described in the following hereinafter referred to as compound group SX132).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is any of the substituents described in [Table A13] to [Table A27]
  • Compounds that are groups hereinafter referred to as compound group SX133.
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds which are any of the substituents described below hereinafter referred to as compound group SX134).
  • R 2 is a cyclopropyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27]
  • Compounds which are any of the substituents described in hereinafter referred to as compound group SX135).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX136).
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX137).
  • R 2 is a cyclopropyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX138).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX140).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds which are any of the substituents described below hereinafter referred to as compound group SX141).
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX142).
  • R 2 is a cyclopropyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27]
  • Compounds which are any of the substituents described in hereinafter referred to as compound group SX143).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX144).
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX145).
  • R 2 is a cyclopropyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX146).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX148).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX150).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX152).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is a cyclopropyl group
  • R A is a group represented by [Table A13] to [Table A27] ]
  • the compound which is a substituent in any one of-(It is hereafter described as compound group SX153).
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is a cyclopropyl group
  • R A is a group represented by [Table A13] to [Table A27] ]
  • the compound which is any one of the substituents as described in the following hereinafter referred to as compound group SX154).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is any of the substituents described in [Table A13] to [Table A27]
  • Compounds that are groups (hereinafter referred to as compound group SX155).
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX156).
  • R 2 is a cyclopropyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27]
  • Compounds which are any of the substituents described in hereinafter referred to as compound group SX157).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX158).
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX159).
  • R 2 is a cyclopropyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX160).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX162).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds which are any of the substituents described below hereinafter referred to as compound group SX163
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX164).
  • R 2 is a cyclopropyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27]
  • Compounds which are any of the substituents described in hereinafter referred to as compound group SX165).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX166).
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX167).
  • R 2 is a cyclopropyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX168).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX170).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX172).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX174).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is a cyclopropyl group
  • R A is a group represented by [Table A13] to [Table A27] ]
  • the compound which is any one of the substituents as described in the following hereinafter referred to as compound group SX175).
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is a cyclopropyl group
  • R A is a group represented by [Table A13] to [Table A27] ]
  • the compound which is any one of the substituents as described in the following hereinafter referred to as compound group SX176).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is any of the substituents described in [Table A13] to [Table A27]
  • Compounds that are groups (hereinafter referred to as compound group SX177).
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX178).
  • R 2 is a cyclopropyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27]
  • Compounds which are any of the substituents described in hereinafter referred to as compound group SX179).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX180).
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX181).
  • R 2 is a cyclopropyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX182).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX184).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds which are any of the substituents described below hereinafter referred to as compound group SX185).
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX186).
  • R 2 is a cyclopropyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27]
  • Compounds which are any of the substituents described in hereinafter referred to as compound group SX187).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX188).
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX189).
  • R 2 is a cyclopropyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX190).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX192).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX194).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX196).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is a cyclopropyl group
  • R A is a group represented by [Table A13] to [Table A27] ]
  • the compound which is any one of the substituents as described in the following hereinafter referred to as compound group SX197).
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is a cyclopropyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • the compound which is any substituent as described in following it is hereafter described as compound group SX198).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is any of the substituents described in [Table A13] to [Table A27]
  • Compounds that are groups hereinafter referred to as compound group SX199).
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds which are any of the substituents described below hereinafter referred to as compound group SX200).
  • R 2 is a cyclopropyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27]
  • Compounds which are any of the substituents described in hereinafter referred to as compound group SX201).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX202).
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX203.
  • R 2 is a cyclopropyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX204).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX206).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX207).
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX208).
  • R 2 is a cyclopropyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27]
  • Compounds which are any of the substituents described in hereinafter referred to as compound group SX209).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX210).
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX211).
  • R 2 is a cyclopropyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX212).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27]
  • Compounds which are any of the substituents described in hereinafter referred to as compound group SX213).
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX214).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX216).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX218).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is a cyclopropyl group
  • R A is a group represented by [Table A13] to [Table A27] ]
  • the compound which is any one of the substituents as described in the following hereinafter referred to as compound group SX219).
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is a cyclopropyl group
  • R A is a group represented by [Table A13] to [Table A27] ]
  • the compound which is any one of the substituents as described in the following hereinafter referred to as compound group SX220).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is any of the substituents described in [Table A13] to [Table A27]
  • Compounds that are groups (hereinafter referred to as compound group SX221).
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds which are any of the substituents described below hereinafter referred to as compound group SX222).
  • R 2 is a cyclopropyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is [Table A 13] to [Table A 27]
  • Compounds which are any of the substituents described in hereinafter referred to as compound group SX223).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX224).
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX225).
  • R 2 is a cyclopropyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX226).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX228).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX229).
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds that are any of the substituents described below hereinafter referred to as compound group SX230).
  • R 2 is a cyclopropyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27]
  • Compounds which are any of the substituents described in hereinafter referred to as compound group SX231).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX232).
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX233).
  • R 2 is a cyclopropyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX234).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX236).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX238).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX240).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is a cyclopropyl group
  • R A is a group represented by [Table A13] to [Table A27] ]
  • the compound which is any one of the substituents as described in the following hereinafter referred to as compound group SX241).
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is a cyclopropyl group
  • R A is a group represented by [Table A13] to [Table A27] ]
  • the compound which is any one of the substituents as described in the following hereinafter referred to as compound group SX242).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is any of the substituents described in [Table A13] to [Table A27]
  • Compounds that are groups hereinafter referred to as compound group SX243.
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds which are any of the substituents described below hereinafter referred to as compound group SX244).
  • R 2 is a cyclopropyl group
  • R 4 is a methyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27]
  • Compounds which are any of the substituents described in hereinafter referred to as compound group SX245).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX246).
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX247).
  • R 2 is a cyclopropyl group
  • R 4 is a methyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX248).
  • R 2 is a methyl group
  • R 4 is a methyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is a methyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX250).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds which are any of the substituents described below hereinafter referred to as compound group SX251).
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • Compounds which are any of the substituents described below hereinafter referred to as compound group SX252).
  • R 2 is a cyclopropyl group
  • R 4 is an ethyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27]
  • Compounds which are any of the substituents described in hereinafter referred to as compound group SX253.
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX254).
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX255).
  • R 2 is a cyclopropyl group
  • R 4 is an ethyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX256).
  • R 2 is a methyl group
  • R 4 is an ethyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is an ethyl group
  • R 5 is a cyclopropyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX258).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is a methyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX260).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27]
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is an ethyl group
  • R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX262).
  • R 2 is a methyl group
  • R 4 is a cyclopropyl group
  • R 5 is a cyclopropyl group
  • R A is a group represented by [Table A13] to [Table A27] ]
  • the compound which is any substituent as described in following is hereafter described as compound group SX263).
  • R 2 is an ethyl group
  • R 4 is a cyclopropyl group
  • R 5 is a cyclopropyl group
  • R A is a group represented by [Table A13] to [Table A27]
  • the compound which is any one of the substituents as described in the following hereinafter referred to as compound group SX264).
  • a part represents a weight part.
  • Formulation example 1 10 parts of any one of the compounds 1 to 177 of the present invention is mixed into a mixture of 35 parts of xylene and 35 parts of DMF, and 14 parts of polyoxyethylene styryl phenyl ether and 6 parts of calcium dodecylbenzene sulfonate are added thereto and mixed To obtain a formulation.
  • Formulation example 2 4 parts of sodium lauryl sulfate, 2 parts of calcium lignin sulfonate, 20 parts of wet silica and 54 parts of diatomaceous earth are mixed, and further 20 parts of any one of the present compounds 1-177 is added and mixed to obtain a preparation.
  • Formulation example 3 1 part of wet silica, 2 parts of calcium lignin sulfonate, 30 parts of bentonite and 65 parts of kaolin clay are added to 2 parts of any one of the compounds of the present invention 1-177 and mixed. Then, an appropriate amount of water is added to the mixture, and the mixture is further stirred, granulated with a granulator and blow-dried to obtain a preparation.
  • Formulation example 4 One part of any one compound of the present invention 1-177 is mixed with an appropriate amount of acetone, to which 5 parts of wet silica, 0.3 parts of isopropyl acid phosphate and 93.7 parts of kaolin clay are added and mixed thoroughly. The acetone is removed by evaporation to obtain a preparation.
  • Formulation example 5 A formulation is prepared by thoroughly mixing 35 parts of a mixture of polyoxyethylene alkyl ether sulfate ammonium salt and wet silica (weight ratio 1: 1), 20 parts of any one of the compounds of the present invention 1-177, and 45 parts of water Get
  • Formulation Example 6 0.1 part of any one of the compounds 1-177 of the present invention is mixed with a mixture of 5 parts of xylene and 5 parts of trichloroethane, and this is mixed with 89.9 parts of kerosene to obtain a preparation.
  • Formulation example 7 10 mg of any one of the compounds 1 to 177 of the present invention is mixed with 0.5 mL of acetone, and this solution is added dropwise to 5 g of solid feed powder for animals (solid feed powder for rearing and breeding CE-2 manufactured by CLEA Japan, Inc.) And mix uniformly. The acetone is then evaporated to dryness to obtain a toxic bait.
  • Formulation Example 8 0.1 parts of any one of the compounds 1 to 177 of the present invention and 49.9 parts of neothiozole (manufactured by Chuo Kasei Co., Ltd.) are put into an aerosol can, fitted with an aerosol valve, and filled with 25 parts of dimethyl ether and 25 parts of LPG. Shake is applied and the actuator is mounted to obtain an oil aerosol.
  • Formulation Example 9 0.6 parts of any one of the compounds 1 to 177 of the present invention, 0.01 parts of 2,6-di-tert-butyl-4-methylphenol, 5 parts of xylene, 3.39 parts of kerosene and 1 part of a leopold ( A mixture of MO 60 and 50 parts of distilled water are charged into an aerosol container, and after mounting a valve, 40 parts of LPG are filled through the valve to obtain an aqueous aerosol.
  • Formulation Example 10 0.1 g of any one of the compounds 1-177 of the present invention is mixed with 2 mL of propylene glycol, and impregnated into a 4.0 cm ⁇ 4.0 cm, 1.2 cm thick ceramic plate, and heated fuming agent obtain.
  • Formulation example 11 Obtained by melt-kneading 5 parts of any one compound of the present invention 1 to 177 and 95 parts of ethylene-methyl methacrylate copolymer (ratio of methyl methacrylate to total weight of copolymer: 10% by weight) The kneaded product is extruded from an extruder to obtain a rod-shaped molding of 15 cm in length and 3 mm in diameter.
  • Formulation example 12 5 parts of any one of the compounds 1 to 177 of the present invention and 95 parts of a soft vinyl chloride resin are melt-kneaded, and the obtained kneaded product is extruded from an extruder to obtain a rod-shaped molding of 15 cm in length and 3 mm in diameter. .
  • Formulation example 13 100 mg of any one of the compounds 1-177 of the present invention, 68.75 mg of lactose, 237.5 mg of corn starch, 43.75 mg of microcrystalline cellulose, 18.75 mg of polyvinylpyrrolidone, 28.75 mg of sodium carboxymethyl starch, and magnesium stearate 2.5 mg are mixed and the resulting mixture is compressed to a suitable size to obtain tablets.
  • Formulation example 14 25 mg of any one of the compounds 1-177 of the present invention, 60 mg of lactose, 25 mg of corn starch, 6 mg of carmellose calcium, and an appropriate amount of 5% hydroxypropyl methylcellulose, and the resulting mixture is mixed with hard shell gelatin capsule or hydroxypropyl methylcellulose capsule To give capsules.
  • Formulation example 15 100 mg of any one compound of the present invention 1-157, fumaric acid 500 mg, sodium chloride 2000 mg, methyl paraben 150 mg, propyl paraben 50 mg, granular sugar 25000 mg, sorbitol (70% solution) 13000 mg, Veegum K 100 mg, perfume 35 mg, And, to 500 mg of coloring agent, distilled water is added to a final volume of 100 mL and mixed to obtain an oral administration suspension.
  • Formulation example 16 5% by weight of any one of the compounds of the present invention 1-177 is mixed with 5% by weight of an emulsifier, 3% by weight of benzyl alcohol and 30% by weight of propylene glycol, and the pH of this solution is 6.0 to 6.5. After adding the phosphate buffer solution as it becomes, water is added as the balance to obtain a solution for oral administration.
  • Formulation example 17 5% by weight of aluminum distearate is added to 57% by weight of fractionated palm oil and 3% by weight of polysorbate 85 and dispersed by heating. It is cooled to room temperature and 25% by weight of saccharin is dispersed in the oily vehicle. To this is distributed 10% by weight of any one of the compounds of the present invention 1-177 to obtain a paste-form preparation for oral administration.
  • Formulation example 18 5% by weight of any one of the compounds 1-177 of the present invention is mixed with 95% by weight of limestone powder to obtain granules for oral administration using a wet granulation method.
  • Formulation example 19 Five parts of any one of the compounds 1-177 of the present invention is mixed with 80 parts of diethylene glycol monoethyl ether, and 15 parts of propylene carbonate is mixed therewith to obtain a spot-on liquid agent.
  • Formulation example 20 Ten parts of any one of the compounds of the present invention 1-177 is mixed with 70 parts of diethylene glycol monoethyl ether, and 20 parts of 2-octyldodecanol is mixed therewith to obtain a pour-on liquid agent.
  • Formulation example 21 60 parts of a 42% aqueous solution of triethanolamine lauryl sulfate and 20 parts of propylene glycol are added to 0.5 part of any one of the compounds of the present invention 1-177, and 20 parts of propylene glycol is sufficiently stirred until a uniform solution is obtained. Add 5 parts and stir well to obtain a shampoo solution of uniform solution.
  • Formulation example 22 0.15 wt% of any one of the compounds 1-177 of the present invention, 95 wt% of animal feed, and 4.85 wt% of a mixture consisting of calcium phosphate dibasic, diatomaceous earth, Aerosil®, and carbonate (or chalk) Stir thoroughly to obtain an animal feed premix.
  • Formulation example 23 7.2 g of any one of the compounds 1-177 of the present invention and 92.8 g of FOSCO S-55 are mixed at 100 ° C., poured into a suppository form, and solidified by cooling to obtain a suppository obtain.
  • test examples the efficacy of the present compound X against pests is shown by test examples.
  • the test was performed at 25 ° C.
  • Test method 1 A test compound is prepared according to the method described in Preparation Example 5, and water containing 0.03% by volume of Syndyne (registered trademark) is added thereto to prepare a diluted solution containing a predetermined concentration of the test compound. About 30 cotton aphids (all stages) are inoculated to cucumber (Cucumis sativus) seedlings (the second true leaf development stage) planted in a container. One day later, the seedlings are sprayed with the diluted solution at a rate of 10 mL / seedling. After 5 days, the number of surviving insects is examined, and the control value is determined by the following equation.
  • Control value (%) ⁇ 1- (Cb ⁇ Tai) / (Cai ⁇ Tb) ⁇ ⁇ 100
  • Cb Number of tested insects in untreated area
  • Cai Number of surviving insects in survey in untreated area
  • Tb Number of tested insects in treated zone
  • Tai Number of surviving insects in survey in treated area
  • untreated group means It means a zone that performs the same operation as the treatment zone except that the test compound is not used.
  • Test Example 1-1 As a result of conducting a test according to the test method 1 by setting a predetermined concentration to 500 ppm and using the following compound of the present invention as a test compound, all of the compounds of the present invention described below showed a control value of 90% or more.
  • Test Example 1-2 As a result of conducting a test according to the test method 1 by setting a predetermined concentration to 200 ppm and using the following compound of the present invention as a test compound, each of the following compounds of the present invention showed a control value of 90% or more.
  • Compounds of the present invention 13, 17, 19, 20, 21, 23, 24, 72, 99, 102, 103, 104, 105, 112, 113, 114, 116, 117, 118, 119, 123, 126, 127, 128, 129, 132, 133, 134, 135, 136, 137, 143, 147 and 156
  • Test method 2 A test compound is prepared according to the method described in Preparation Example 5, and water containing 0.03% by volume of Syndyne (registered trademark) is added thereto to prepare a diluted solution containing a predetermined concentration of the test compound.
  • the diluted solution is sprayed at a rate of 20 mL / seedling to cabbage (Brassicae oleracea) seedlings (second to third leaf development stage) planted in a container. After that, the stems and leaves of this seedling are cut and placed in a container covered with filter paper. Release 5 2nd instar larvae to this. After 5 days, the number of living worms is counted, and the mortality rate is calculated from the following equation.
  • Mortality rate% (1-number of surviving insects / 5) x 100
  • Test example 2 The test was conducted according to Test Method 2 using a compound of the present invention described below as a test compound at a predetermined concentration of 500 ppm. As a result, all of the compounds of the present invention described below showed a mortality of 80% or more.
  • the compounds of the present invention 9, 12, 13, 15, 16, 17, 19, 20, 22, 23, 62, 63, 64, 72, 99, 102, 103, 104, 132, 133 and 134
  • Test Example 3 The compound of the present invention described below was used as a test compound and tested according to Test Method 3 with a predetermined concentration of 500 ppm. As a result, all of the compounds of the present invention showed a mortality of 80% or more.
  • the present invention compounds 9, 12, 13, 15, 16, 17, 19, 20, 21, 22, 23, 24, 55, 60, 61, 62, 63, 64, 67, 69, 70, 72, 74, 78, 80, 81, 82, 85, 86, 87, 88, 89, 91, 93, 97, 98, 99, 101, 102, 103, 104, 105, 106, 107, 109, 112, 113, 114, 116, 117, 118, 119, 121, 127, 128, 129, 131, 132, 133, 134, 135, 136, 137, 139, 142, 143, 145, 156, 159, 166, 167 and 170
  • Test Example 4 The compound of the present invention described below was used as a test compound and tested according to Test Method 4 at a predetermined concentration of 500 ppm. As a result, all of the compounds of the present invention showed a mortality of 90% or more.
  • Compounds of the present invention 17, 18, 19, 20, 21, 23, 99, 102, 103, 112, 116, 117, 118, 129, 131, 132, 133, 135 and 156
  • Test method 5 A test compound is prepared according to the method described in Preparation Example 5, and water containing 0.03% by volume of Syndyne (registered trademark) is added thereto to prepare a diluted solution containing a predetermined concentration of the test compound.
  • Syndyne registered trademark
  • the B. tabaci adults are released and allowed to lay eggs for about 24 hours.
  • the seedlings are stored for 8 days, and larvae are hatched from the delivered eggs.
  • the diluted solution is sprayed onto the seedlings at a rate of 10 mL / seedling. After 7 days, the number of surviving insects is investigated, and the control value is determined by the following equation.
  • Control value (%) ⁇ 1- (Cb ⁇ Tai) / (Cai ⁇ Tb) ⁇ ⁇ 100
  • Cb The number of insects immediately before the treatment in the untreated zone
  • Cai The number of living insects in the survey of the untreated region
  • Tb The number of insects just before the treatment in the treated zone
  • Tai The number of living insects in the survey of the treated region Means a zone which performs the same operation as the treatment zone except that the test compound is not used.
  • Test Example 5 As a result of conducting a test according to the test method 5 by setting a predetermined concentration to 500 ppm and using the following compound of the present invention as a test compound, each of the following compounds of the present invention showed a control value of 90% or more.
  • the compounds of the present invention 17, 18, 23, 99, 102, 103, 112, 113, 114, 116, 126, 127, 129, 132, 133, 135, 137, 143, 147 and 156
  • Test method 7 A test compound is prepared according to the method described in Preparation Example 5, and water containing 0.03% by volume of Syndyne (registered trademark) is added thereto to prepare a diluted solution containing a predetermined concentration of the test compound. About 40 adult spider mite mites are released on kidney bean (Phaseolus vulgaris) seedlings (first true leaf development stage) planted in a container. One day later, the seedlings are sprayed with the diluted solution at a rate of 10 mL / seedling. After 7 days, the number of surviving insects is examined, and the control value is calculated by the following equation.
  • Control value (%) ⁇ 1- (Cb ⁇ Tai) / (Cai ⁇ Tb) ⁇ ⁇ 100
  • Cb Number of tested insects in untreated area
  • Cai Number of surviving insects in survey in untreated area
  • Tb Number of tested insects in treated zone
  • Tai Number of surviving insects in survey in treated area
  • untreated group means It means a zone that performs the same operation as the treatment zone except that the test compound is not used.
  • Test Example 7 As a result of conducting a test according to the test method 7 by setting a predetermined concentration to 500 ppm and using the following compound of the present invention as a test compound, each of the following compounds of the present invention showed a control value of 90% or more.
  • Compounds of the present invention 22, 99, 100, 102, 103, 107, 112, 113, 114, 116, 118, 126, 129, 132, 133, 137, 143, 147, 156, 166 and 168
  • Test Example 8 The compound of the present invention described below was tested as a test compound at a predetermined concentration of 3.5 ppm, and all of the compounds of the present invention exhibited a mortality of 91% or more.
  • the compound of the present invention 12, 13, 15, 16, 19, 20, 22, 24, 62, 66, 67, 72, 74, 76, 81, 82, 85, 86, 87, 98, 99, 101, 102, 104, 106, 108, 112, 113, 115, 116, 117, 119, 124, 126, 127, 129, 132, 133, 134, 135, 136, 137, 139, 141, 142, 154, 155, 156, 159 and 168
  • Test Example 9 The compound of the present invention described below was tested as a test compound at a predetermined concentration of 500 ppm, and all of the compounds of the present invention exhibited a mortality of 80% or more.
  • the compounds of the present invention 19, 23, 72, 98, 99, 103, 113, 116, 117, 118, 119, 129, 132, 133 and 156
  • Test Example 10 The compound of the present invention described below showed a mortality of 100% as a result of conducting tests according to Test Method 10 using a compound of the present invention described below as a test compound with a predetermined concentration of 500 ppm.
  • the compound of the present invention 119
  • Test Example 11-1 The test was conducted according to Test Method 11 using the following compound of the present invention as a test compound, with the predetermined time being 1 hour. As a result, all of the following compounds of the present invention exhibited a mortality of 80% or more.
  • the compounds of the present invention 119, 123 and 126
  • Test Example 11-2 As a result of conducting a test according to the test method 11 by setting the predetermined time to 1 day and using the following compound of the present invention as a test compound, all of the following compounds of the present invention showed a mortality of 80% or more.
  • Compounds of the present invention 20, 23, 24, 45, 55, 91, 100, 101, 102, 103, 116, 118, 119, 122, 126, 129, 132, 133, 134, 135, 146, 148, 155, 156 and 168
  • Test method 12 The soil is packed in a plastic pot, and rice (variety; Hinohikari) is sown and grown in a greenhouse for 20 days. Thereafter, a test compound formulated according to the method described in Formulation Example 5 is mixed with water so as to have a predetermined concentration, and the mixture is sprayed with stem and leaf so as to sufficiently adhere to the above-mentioned rice leaf surface. After spraying, the rice is air-dried, and the sprayed rice is contacted at 24 ° C in the daytime and at 20 ° C in the nighttime, while contacting the rice seedling (cultivar: Hinohikari) infected with rice blast fungus (Magnaporthe grisea) 6 After leaving for days, investigate the lesion area.
  • Test Example 12 As a result of conducting a test according to test method 12 by using a compound of the present invention described below as a test compound with a predetermined concentration of 500 ppm, the lesion area in rice treated with the compound of the present invention described below is all in untreated rice Less than 30% of the lesion area.
  • Test method 13 The soil is packed in a plastic pot, and barley (variety: Nishinohoshi) is sown and cultivated in a greenhouse for 7 days.
  • a test compound formulated according to the method described in Formulation Example 5 is mixed with water to a predetermined concentration, and the mixture is foliated to sufficiently adhere to the surface of the barley leaves. After spraying, the barley is air-dried, and two days later, it is spray-inoculated with an aqueous suspension of barley reticulum (Pyrenophora teres) spores. After inoculation, barley is placed in a greenhouse at 23 ° C. in the daytime at 20 ° C. in a humid atmosphere for 3 days, and then grown for 7 days in a greenhouse, and then the lesion area is examined.
  • Test Example 13 As a result of conducting a test according to the test method 13 by using a compound of the present invention described below as a test compound, the lesion area in barley treated with the compound of the present invention described below was all in untreated barley Less than 30% of the lesion area.
  • Compounds of the present invention 13, 14, 15, 16, 20, 21, 22, 24, 55, 60, 72, 74, 99, 100, 127, 131, 156 and 159
  • Test method 14 The soil is packed in a plastic pot and wheat (variety; apozy) is sown and grown in a greenhouse for 10 days.
  • a test compound formulated according to the method described in Formulation Example 5 is mixed with water to a predetermined concentration, and the mixture is foliated to sufficiently adhere to the leaf surface of the wheat. After spraying, the wheat is air-dried, and four days later, it is spray-inoculated with an aqueous suspension of wheat spore (Septoria tritici) spore. After inoculation wheat is placed under a humid atmosphere at 18 ° C. for 3 days and then under illumination for 14 to 18 days, and then the lesion area is examined.
  • Test Example 14 As a result of conducting a test according to the test method 14 by setting a predetermined concentration to 500 ppm and using the following compound of the present invention as a test compound, the lesion area in the wheat treated with the following compound of the present invention is all in untreated wheat Less than 30% of the lesion area.
  • the compounds of the present invention 9, 12, 13, 14, 15, 16, 17, 19, 20, 21, 22, 23, 65, 74, 77, 114, 115 and 127
  • Test method 15 The soil is packed in a plastic pot, sown with wheat (variety; Shirogane) and grown in a greenhouse for 9 days.
  • a test compound formulated according to the method described in Formulation Example 5 is mixed with water to a predetermined concentration, and the mixture is foliated to sufficiently adhere to the leaf surface of the wheat.
  • the wheat After spraying, the wheat is air-dried and cultivated at 20 ° C. under illumination for 5 days, and then the wheat spores of rust (Puccinia recondita) are sprinkled and inoculated. After inoculation, wheat is placed at 23 ° C. in dark and humid for 1 day, then grown at 20 ° C. in illumination for 8 days, and the lesion area is examined.
  • Test Example 15 As a result of conducting a test according to the test method 15 by setting a predetermined concentration to 500 ppm and using the following compound of the present invention as a test compound, as for the lesion area in the wheat treated with the following compound of the present invention Less than 30% of the lesion area.
  • Compounds of the present invention 12, 13, 20, 55, 62, 64, 86, 116, 118, 132, 135, 156 and 159
  • Test method 16 The soil is packed in a plastic pot, and a cucumber (variety; Sagami Hankaku) is sown and grown in a greenhouse for 12 days. Thereafter, a test compound formulated according to the method described in Formulation Example 5 is mixed with water so as to obtain a predetermined concentration, and the mixture is foliage-dispersed so as to sufficiently adhere to the above-mentioned cucumber leaf surface. . After spraying, the cucumbers are air-dried and kept in a greenhouse at daytime 24 ° C. and nighttime at 20 ° C.
  • cucumber seedlings variety: Sagami semi-white
  • cucumber powdery mildew Sphaerotheca fuliginea
  • the cucumber is grown in a greenhouse at 24 ° C. in the daytime and at 20 ° C. in the night for 8 days, and then the lesion area is examined.
  • Test Example 16 As a result of conducting a test according to the test method 16 by setting a predetermined concentration to 500 ppm and using the following compound of the present invention as a test compound, as for the lesion area in the cucumber treated with the following compound of the present invention Less than 30% of the lesion area.
  • Compounds of the present invention 18, 66, 97, 99, 100, 101, 112, 116, 132 and 133
  • Test method 17 The soil is packed in a plastic pot, green beans (variety; long-leaved vegetables) are sown and grown in a greenhouse for 8 days.
  • a test compound formulated according to the method described in Formulation Example 5 is mixed with water to a predetermined concentration, and the mixture is sprayed with stem and leaf so as to sufficiently adhere to the above-mentioned bean leaf surface. After spraying, the beans are air-dried, and a mycelium-containing PDA medium of Sclerotinia sclerotiorum is placed on the bean leaves. After inoculation, place all beans in humid conditions only at night, and investigate the lesion area 4 days after inoculation.
  • Test Example 17 As a result of conducting a test according to the test method 17 by setting a predetermined concentration to 500 ppm and using the following compound of the present invention as a test compound, lesion areas in beans treated with the following compound of the present invention are all untreated beans Less than 30% of the lesion area.
  • Test method 18 Fill soil in a plastic pot, sow tomatoes (variety; patio) and grow in a greenhouse for 13 days.
  • a test compound formulated according to the method described in Formulation Example 5 is mixed with water to a predetermined concentration, and the mixture is sprayed with leaves and leaves to sufficiently adhere to the tomato leaf surface. After spraying, the tomato is air-dried, and one day later, it is spray-inoculated with an aqueous suspension of Phytophthora infestans spores. After inoculation, it is placed at 23 ° C. under humid conditions for 1 day, and grown for 5 days in a 18 ° C. greenhouse, and then the lesion area is examined.
  • Test Example 18 The test was carried out according to test method 18 using a compound of the present invention described below as a test compound with a prescribed concentration of 500 ppm, and as a result, the area of lesions on the tomato treated with the compound of the present invention described below was all in untreated tomato Less than 30% of the lesion area.
  • Compounds of the present invention 10, 14, 17, 21, 23, 72, 85, 99, 112, 116, 129, 154, 156 and 158
  • the compound of the present invention X exhibits an excellent control effect on pests.

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Abstract

The present invention provides a compound having an exceptional control effect against pests. A compound represented by the formula (in the formula, Ar represents a C6-C10 aryl group or a 3- to 10-membered heterocyclic group; the combination of RA and RB is, inter alia, a combination in which RA is a C1-C10 alkanediyl group, etc., and RB is a single bond; R2, R4, and R5 are the same or different and represent a C1-C4 chain hydrocarbon group, etc.; R3 represents a C1-C3 chain hydrocarbon group, etc.; L1 represents a single bond, etc.; L2 represents a single bond, a C1-C3 alkanediyl group, etc.; and n represents 0 or 1) has an exceptional control effect against pests.

Description

ピリジン化合物及びそれを含有する有害生物防除組成物Pyridine compound and pest control composition containing the same
　本出願は２０１７年１０月２７日に出願された日本国特許出願第２０１７－２０７９２９に対する優先権及びその利益を主張するものであり、その全内容は参照することにより本出願に組み込まれる。
　本発明はピリジン化合物及びそれを含有する有害生物防除組成物に関する。 The present application claims priority to and the benefit of, Japanese Patent Application No. 2017-207929, filed Oct. 27, 2017, the entire contents of which are incorporated herein by reference.
The present invention relates to a pyridine compound and a pest control composition containing the same.
　これまでに有害生物の防除を目的として、様々な化合物が検討されている。例えば、特許文献１にはある種の化合物が有害生物防除効果を有することが記載されている。 So far, various compounds have been studied for the purpose of controlling pests. For example, Patent Document 1 describes that certain compounds have a pest control effect.
国際公開第２０１６／０３９０４８号International Publication No. 2016/039048
　本発明は、有害生物に対して優れた防除効力を有する化合物を提供することを課題とする。 An object of the present invention is to provide a compound having excellent control activity against pests.
　本発明は以下のとおりである。
〔１〕　式（Ｉ）
Figure JPOXMLDOC01-appb-C000002
 〔式中、
　Ａｒは、Ｃ６－Ｃ１０アリール基又は３－１０員複素環基｛該Ｃ６－Ｃ１０アリール基及び該３－１０員複素環基は、群Ａより選ばれる１以上の置換基を有していてもよい｝を表し、
　ＲA及びＲBの組み合わせは、
　　ＲAがＣ１－Ｃ１０アルカンジイル基、Ｃ２－Ｃ１０アルケンジイル基、エチンジイル基、Ｃ３－Ｃ１０アルキンジイル基、Ｃ３－Ｃ８シクロアルカンジイル基、Ｃ３－Ｃ８シクロアルケンジイル基｛該Ｃ１－Ｃ１０アルカンジイル基、該Ｃ２－Ｃ１０アルケンジイル基、該Ｃ３－Ｃ１０アルキンジイル基、該Ｃ３－Ｃ８シクロアルカンジイル基及び該Ｃ３－Ｃ８シクロアルケンジイル基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝、フェニレン基、ナフチレン基、チエニレン基、フラニレン基、ピロリレン基、チアゾリレン基、イソチアゾリレン基、オキサゾリレン基、イソオキサゾリレン基、ピラゾリレン基、イミダゾリレン基、トリアゾリレン基、ピリジレン基、ピリダジニレン基、ピリミジニレン基、ピラジニレン基、トリアジニレン基｛該フェニレン基、該ナフチレン基、該チエニレン基、該フラニレン基、該ピロリレン基、該チアゾリレン基、該イソチアゾリレン基、該オキサゾリレン基、該イソオキサゾリレン基、該ピラゾリレン基、該イミダゾリレン基、該トリアゾリレン基、該ピリジレン基、該ピリダジニレン基、該ピリミジニレン基、該ピラジニレン基及び該トリアジニレン基は、群Ｄより選ばれる１以上の置換基を有していてもよい｝、チアジアゾリレン基、オキサジアゾリレン基又はテトラジニレン基であり、ＲBが単結合である組み合わせ；
　　ＲAがＣ１－Ｃ３アルカンジイル基、Ｃ２－Ｃ３アルケンジイル基、エチンジイル基又はプロピンジイル基｛該Ｃ１－Ｃ３アルカンジイル基、該Ｃ２－Ｃ３アルケンジイル基及び該プロピンジイル基は、シアノ基、ハロゲン原子、ヒドロキシ基及びＣ２－Ｃ６アルキルカルボニルオキシ基からなる群より選ばれる１以上の置換基を有していてもよい｝であり、ＲBがＣ３－Ｃ８シクロアルカンジイル基、Ｃ３－Ｃ８シクロアルケンジイル基｛該Ｃ３－Ｃ８シクロアルカンジイル基及び該Ｃ３－Ｃ８シクロアルケンジイル基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝、フェニレン基、ナフチレン基、チエニレン基、フラニレン基、ピロリレン基、チアゾリレン基、イソチアゾリレン基、オキサゾリレン基、イソオキサゾリレン基、ピラゾリレン基、イミダゾリレン基、トリアゾリレン基、ピリジレン基、ピリダジニレン基、ピリミジニレン基、ピラジニレン基、トリアジニレン基｛該フェニレン基、該ナフチレン基、該チエニレン基、該フラニレン基、該ピロリレン基、該チアゾリレン基、該イソチアゾリレン基、該オキサゾリレン基、該イソオキサゾリレン基、該ピラゾリレン基、該イミダゾリレン基、該トリアゾリレン基、該ピリジレン基、該ピリダジニレン基、該ピリミジニレン基、該ピラジニレン基及び該トリアジニレン基は、群Ｄより選ばれる１以上の置換基を有していてもよい｝、チアジアゾリレン基、オキサジアゾリレン基又はテトラジニレン基である組み合わせ；又は、
　　ＲAがＣ３－Ｃ８シクロアルカンジイル基、Ｃ３－Ｃ８シクロアルケンジイル基｛該Ｃ３－Ｃ８シクロアルカンジイル基及び該Ｃ３－Ｃ８シクロアルケンジイル基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝、フェニレン基、ナフチレン基、チエニレン基、フラニレン基、ピロリレン基、チアゾリレン基、イソチアゾリレン基、オキサゾリレン基、イソオキサゾリレン基、ピラゾリレン基、イミダゾリレン基、トリアゾリレン基、ピリジレン基、ピリダジニレン基、ピリミジニレン基、ピラジニレン基、トリアジニレン基｛該フェニレン基、該ナフチレン基、該チエニレン基、該フラニレン基、該ピロリレン基、該チアゾリレン基、該イソチアゾリレン基、該オキサゾリレン基、該イソオキサゾリレン基、該ピラゾリレン基、該イミダゾリレン基、該トリアゾリレン基、該ピリジレン基、該ピリダジニレン基、該ピリミジニレン基、該ピラジニレン基及び該トリアジニレン基は、群Ｄより選ばれる１以上の置換基を有していてもよい｝、チアジアゾリレン基、オキサジアゾリレン基又はテトラジニレン基であり、ＲBがＣ１－Ｃ３アルカンジイル基、Ｃ２－Ｃ３アルケンジイル基、エチンジイル基又はプロピンジイル基｛該Ｃ１－Ｃ３アルカンジイル基、該Ｃ２－Ｃ３アルケンジイル基及び該プロピンジイル基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝である組み合わせを表し、
　Ｒ2、Ｒ4及びＲ5は、同一又は相異なり、群Ｂより選ばれる１以上の置換基を有していてもよい３－６員脂環式炭化水素基又は１以上のハロゲン原子を有していてもよいＣ１－Ｃ４鎖式炭化水素基を表し、
　Ｒ3は、Ｃ１－Ｃ３鎖式炭化水素基｛該Ｃ１－Ｃ３鎖式炭化水素基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝、（Ｃ１－Ｃ３アルコキシ）Ｃ１－Ｃ３アルキル基、群Ａより選ばれる１以上の置換基を有していてもよいベンジル基、ホルミル基、Ｃ（Ｏ）Ｒ8、Ｃ（Ｏ）ＯＲ8又は水素原子を表し、
　Ｒ8は、Ｃ１－Ｃ４鎖式炭化水素基又はシクロプロピル基｛該Ｃ１－Ｃ４鎖式炭化水素基及び該シクロプロピル基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝を表し、
　Ｌ1は、単結合、－ＬA－Ｏ－＃、－ＬA－ＮＲ6－＃、－ＬA－Ｓ（Ｏ）m－＃、－ＬA－Ｏ－Ｎ＝ＣＲ7－＃、－ＬB－ＣＲ7＝Ｎ－Ｏ－＃、又は－ＬB－ＣＲ7＝Ｎ－ＮＲ6－＃を表し、
　＃は、ＲAとの結合位置を表し、
　Ｒ6及びＲ7は、同一又は相異なり、１以上のハロゲン原子を有していてもよいＣ１－Ｃ３アルキル基又は水素原子を表し、
　ＬAは、Ｃ１－Ｃ３アルカンジイル基、Ｃ２－Ｃ３アルケンジイル基、エチンジイル基又はプロピンジイル基｛該Ｃ１－Ｃ３アルカンジイル基、該Ｃ２－Ｃ３アルケンジイル基及び該プロピンジイル基は、群Ｃより選ばれる１以上の置換基を有していてもよい｝を表し、
　ＬBは、単結合、Ｃ１－Ｃ３アルカンジイル基、Ｃ２－Ｃ３アルケンジイル基、エチンジイル基又はプロピンジイル基｛該Ｃ１－Ｃ３アルカンジイル基、該Ｃ２－Ｃ３アルケンジイル基及び該プロピンジイル基は、群Ｃより選ばれる１以上の置換基を有していてもよい｝を表し、
　Ｌ2は、単結合、酸素原子、Ｓ（Ｏ）p、Ｃ１－Ｃ３アルカンジイル基、ＮＲ15又は－Ｏ－Ｎ＝ＣＲ16－＊を表し、
　＊は、Ａｒとの結合位置を表し、
　Ｒ15及びＲ16は、同一又は相異なり、１以上のハロゲン原子を有していてもよいＣ１－Ｃ３アルキル基又は水素原子を表し、
　ｎは、０又は１を表し、
　ｍ及びｐは、同一又は相異なり、０、１又は２を表す。
　群Ａ：Ｃ１－Ｃ６鎖式炭化水素基、Ｃ１－Ｃ６アルコキシ基、Ｃ３－Ｃ６アルケニルオキシ基、Ｃ３－Ｃ６アルキニルオキシ基、（Ｃ１－Ｃ４アルコキシ）Ｃ１－Ｃ４アルキル基、Ｃ１－Ｃ６アルキルスルファニル基、Ｃ１－Ｃ６アルキルスルフィニル基、Ｃ１－Ｃ６アルキルスルホニル基、Ｃ２－Ｃ６アルキルカルボニル基、Ｃ２－Ｃ６アルキルカルボニルオキシ基｛該Ｃ１－Ｃ６鎖式炭化水素基、該Ｃ１－Ｃ６アルコキシ基、該Ｃ３－Ｃ６アルケニルオキシ基、該Ｃ３－Ｃ６アルキニルオキシ基、該（Ｃ１－Ｃ４アルコキシ）Ｃ１－Ｃ４アルキル基、該Ｃ１－Ｃ６アルキルスルファニル基、該Ｃ１－Ｃ６アルキルスルフィニル基、該Ｃ１－Ｃ６アルキルスルホニル基、該Ｃ２－Ｃ６アルキルカルボニル基及び該Ｃ２－Ｃ６アルキルカルボニルオキシ基は、１以上のハロゲン原子を有していてもよい｝、Ｃ３－Ｃ８シクロアルキル基、Ｃ３－Ｃ８シクロアルケニル基、Ｃ３－Ｃ８シクロアルキルオキシ基、Ｃ３－Ｃ８シクロアルケニルオキシ基｛該Ｃ３－Ｃ８シクロアルキル基、該Ｃ３－Ｃ８シクロアルケニル基、該Ｃ３－Ｃ８シクロアルキルオキシ基及び該Ｃ３－Ｃ８シクロアルケニルオキシ基は、群Ｂより選ばれる１以上の置換基を有していてもよい｝、ハロゲン原子、シアノ基、ニトロ基、ヒドロキシ基、アミノ基、Ｃ（Ｏ）ＯＲ9及びＣ（Ｏ）ＮＲ10Ｒ11からなる群。
　Ｒ9、Ｒ10及びＲ11は、同一又は相異なり、Ｃ１－Ｃ３アルキル基又は水素原子を表す。
　群Ｂ：１以上のハロゲン原子を有していてもよいＣ１－Ｃ３アルキル基、ハロゲン原子及びシアノ基からなる群。
　群Ｃ：シクロプロピル基、ハロゲン原子及びシアノ基からなる群。
　群Ｄ：Ｃ１－Ｃ４鎖式炭化水素基、Ｃ１－Ｃ４アルコキシ基、Ｃ３－Ｃ６シクロアルキル基｛該Ｃ１－Ｃ４鎖式炭化水素基、該Ｃ１－Ｃ４アルコキシ基及び該Ｃ３－Ｃ６シクロアルキル基は、１以上のハロゲン原子を有していてもよい｝、ハロゲン原子、シアノ基、ニトロ基、ヒドロキシ基、ＯＣ（Ｏ）Ｒ12、Ｃ（Ｏ）Ｒ12、Ｃ（Ｏ）ＯＲ12、ＮＲ13Ｒ14、ＮＲ13Ｃ（Ｏ）Ｒ14、Ｓ（Ｏ）２ＮＲ13Ｒ14、Ｃ（Ｏ）ＮＲ13Ｒ14及びＣＲ13＝Ｎ－ＯＲ14からなる群。
　Ｒ12、Ｒ13及びＲ14は、同一又は相異なり、１以上のハロゲン原子を有していてもよいＣ１－Ｃ３アルキル基又は水素原子を表す。〕
で示される化合物（以下、本発明化合物Ｘと記す）。
〔２〕　ＲA及びＲBの組み合わせが、
　　ＲAがＣ１－Ｃ１０アルカンジイル基、Ｃ２－Ｃ１０アルケンジイル基、エチンジイル基、Ｃ３－Ｃ１０アルキンジイル基、Ｃ３－Ｃ８シクロアルカンジイル基又はＣ３－Ｃ８シクロアルケンジイル基｛該Ｃ１－Ｃ１０アルカンジイル基、該Ｃ２－Ｃ１０アルケンジイル基、該Ｃ３－Ｃ１０アルキンジイル基、該Ｃ３－Ｃ８シクロアルカンジイル基及び該Ｃ３－Ｃ８シクロアルケンジイル基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝であり、ＲBが単結合である組み合わせ；
　　ＲAがＣ１－Ｃ３アルカンジイル基、Ｃ２－Ｃ３アルケンジイル基、エチンジイル基又はプロピンジイル基｛該Ｃ１－Ｃ３アルカンジイル基、該Ｃ２－Ｃ３アルケンジイル基及び該プロピンジイル基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝であり、ＲBがＣ３－Ｃ８シクロアルカンジイル基又はＣ３－Ｃ８シクロアルケンジイル基｛該Ｃ３－Ｃ８シクロアルカンジイル基及び該Ｃ３－Ｃ８シクロアルケンジイル基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝である組み合わせ；又は、
　　ＲAがＣ３－Ｃ８シクロアルカンジイル基又はＣ３－Ｃ８シクロアルケンジイル基｛該Ｃ３－Ｃ８シクロアルカンジイル基及び該Ｃ３－Ｃ８シクロアルケンジイル基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝であり、ＲBがＣ１－Ｃ３アルカンジイル基、Ｃ２－Ｃ３アルケンジイル基、エチンジイル基又はプロピンジイル基｛該Ｃ１－Ｃ３アルカンジイル基、該Ｃ２－Ｃ３アルケンジイル基及び該プロピンジイル基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝である組み合わせであり、
　Ｌ2が、単結合、酸素原子又はＳ（Ｏ）pである、〔１〕に記載の化合物（以下、本発明化合物と記す）。
〔３〕　Ｒ3が、Ｃ（Ｏ）ＣＨ3、Ｃ（Ｏ）ＯＣＨ3又は水素原子であり、
　Ｌ1が、単結合、－ＣＨ2－Ｏ－＃、－ＣＨ2－Ｏ－Ｎ＝ＣＲ7－＃又は－ＣＲ7＝Ｎ－Ｏ－＃であり、
　Ｌ2が、単結合である、〔１〕又は〔２〕に記載の化合物。
〔４〕　ＲA及びＲBの組み合わせが、ＲAが、Ｃ１－Ｃ６アルカンジイル基又はＣ３－Ｃ６シクロアルカンジイル基であり、ＲBが、単結合である組み合わせである、〔１〕～〔３〕のいずれかに記載の化合物。
〔５〕　Ｒ2、Ｒ4及びＲ5が、同一又は相異なり、１以上のハロゲン原子を有していてもよいＣ１－Ｃ３アルキル基である、〔１〕～〔４〕のいずれかに記載の化合物。
〔６〕　Ａｒが、群Ａより選ばれる１以上の置換基を有していてもよいフェニル基である、〔１〕～〔５〕のいずれかに記載の化合物。
〔７〕　〔１〕～〔６〕のいずれかに記載の化合物と、不活性担体とを含有する有害生物防除組成物。
〔８〕　群（ａ）及び群（ｂ）からなる群より選ばれる１以上の成分を含有する〔７〕に記載の組成物：
　群（ａ）：殺虫活性成分、殺ダニ活性成分及び殺線虫活性成分からなる群；
　群（ｂ）：殺菌活性成分。
〔９〕　〔１〕～〔６〕のいずれかに記載の化合物の有効量を有害生物又は有害生物の生息場所に施用する有害生物の防除方法。
〔１０〕　〔７〕又は〔８〕に記載の組成物の有効量を有害生物又は有害生物の生息場所に施用する有害生物の防除方法。
〔１１〕　〔１〕～〔６〕のいずれかに記載の化合物の有効量又は〔７〕もしくは〔８〕に記載の組成物の有効量を保持している種子又は栄養生殖器官。 The present invention is as follows.
[1] Formula (I)
Figure JPOXMLDOC01-appb-C000002
 [In the formula,
Ar is a C6-C10 aryl group or a 3- to 10-membered heterocyclic group {wherein the C6-C10 aryl group and the 3- to 10-membered heterocyclic group have one or more substituents selected from Group A; Represents good},
The combination of R A and R B is
R A is a C1-C10 alkanediyl group, a C2-C10 alkene diyl group, an ethynediyl group, a C3-C10 alkyndiyl group, a C3-C8 cycloalkanediyl group, a C3-C8 cycloalkene diyl group {the C1-C10 alkanediyl group, The C2-C10 alkene diyl group, the C3-C10 alkyldiyl group, the C3-C8 cycloalkanediyl group and the C3-C8 cycloalkene diyl group have at least one substituent selected from the group consisting of a cyano group and a halogen atom Phenylene group, naphthylene group, thienylene group, furanylene group, pyrrolylene group, thiazolylene group, isothiazolylene group, oxazolylene group, isoxazolylene group, pyrazolylene group, imidazolylene group, triazolylene group, pyridinene group, pyridazinylene Group, Midinylene group, pyrazinylene group, triazinylene group {the phenylene group, the naphthyrene group, the thienylene group, the furanylene group, the pyrrolylene group, the thiazolylene group, the isothiazolylene group, the oxazolylene group, the isoxazolylene group, the pyrazolylene group Group, said imidazolylene group, said triazolylene group, said pyridinene group, said pyridazinylene group, said pyrimidinylene group, said pyrazinylene group and said triazinylene group may have one or more substituents selected from group D}, A combination in which a thiadiazolylene group, an oxadiazolylene group or a tetradinylene group and R B is a single bond;
R A is C1-C3 alkanediyl group, C2-C3 alkene diyl group, ethynediyl group or propyne diyl group {The C1-C3 alkanediyl group, the C2-C3 alkene diyl group and the propyne diyl group are a cyano group, a halogen atom, a hydroxy group And one or more substituents selected from the group consisting of C2-C6 alkylcarbonyloxy groups}, and R B is a C3-C8 cycloalkanediyl group, a C3-C8 cycloalkene diyl group { The C3-C8 cycloalkanediyl group and the C3-C8 cycloalkenediyl group may have one or more substituents selected from the group consisting of a cyano group and a halogen atom}, a phenylene group, a naphthylene group, a thienylene Group, furanylene group, pyrrolylene group, thiazolylene group, isothiazolylene group, oxazo Rylene group, isoxazolylene group, pyrazolylene group, imidazolylene group, triazolylene group, pyridinene group, pyridazinylene group, pyrimidinylene group, pyrazinylene group, triazinylene group {The phenylene group, the naphthylene group, the thienylene group, the furanylene group, A pyrrolylene group, the thiazolylene group, the isothiazolylene group, the oxazolylene group, the isoxazolylene group, the pyrazolylene group, the imidazolylene group, the triazolylene group, the pyridinene group, the pyridazinylene group, the pyrimidinylene group, the pyrazinylene group; The triazinylene group may have one or more substituents selected from group D}, a combination having a thiadiazolylene group, an oxadiazolylene group or a tetradinylene group; or
R A is a C3-C8 cycloalkanediyl group, a C3-C8 cycloalkene diyl group {the C3-C8 cycloalkanediyl group and the C3-C8 cycloalkene diyl group are selected from the group consisting of a cyano group and a halogen atom 1 Phenylene group, naphthylene group, thienylene group, furanylene group, pyrrolylene group, thiazolylene group, isothiazolylene group, oxazolylene group, isoxazolylene group, pyrazolylene group, imidazolylene group, triazolylene Group, pyridylene group, pyridazinylene group, pyrimidinylene group, pyrazinylene group, triazinylene group {the phenylene group, the naphthyrene group, the thienylene group, the furanylene group, the pyrrolylene group, the thiazolylene group, the isothiazolylene group, the oxazolylene group, Isooxa The rylene group, the pyrazolylene group, the imidazolylene group, the triazolylene group, the pyridylene group, the pyridazinylene group, the pyrimidinylene group, the pyrazinylene group and the triazinylene group have one or more substituents selected from group D. May be, thiadiazolylene group, oxadiazolylene group or tetrazinylene group, R B is C 1 -C 3 alkanediyl group, C 2 -C 3 alkene diyl group, ethynediyl group or propyne diyl group {C 1 -C 3 alkanediyl group, the C 2 -C3 alkenediyl group and the propynediyl group each independently represent one or more substituents selected from the group consisting of a cyano group and a halogen atom;
R 2 , R 4 and R 5 are the same or different, and have a 3-6 membered alicyclic hydrocarbon group which may have one or more substituents selected from group B or one or more halogen atoms Represents a C1-C4 chain hydrocarbon group which may be
R 3 is a C 1 -C 3 chain hydrocarbon group {the C 1 -C 3 chain hydrocarbon group may have one or more substituents selected from the group consisting of a cyano group and a halogen atom}, C 1 -C 3 alkoxy) C 1 -C 3 alkyl group, benzyl group optionally having one or more substituents selected from group A, formyl group, C (O) R 8 , C (O) OR 8 or hydrogen atom Represents
R 8 represents a C1-C4 chain hydrocarbon group or a cyclopropyl group {wherein the C1-C4 chain hydrocarbon group and the cyclopropyl group are one or more substituents selected from the group consisting of a cyano group and a halogen atom Represents that it may have,
L 1 represents a single bond, -L A -O - #, - L A -NR 6 - #, - L A -S (O) m - #, - L A -O-N = CR 7 - #, - L B -CR 7 = N-O- # or -L B -CR 7 = N-NR 6- #,
# Represents the bonding position with R A ,
R 6 and R 7 are the same or different and each represents a C1-C3 alkyl group optionally having one or more halogen atoms, or a hydrogen atom,
L A is C1-C3 alkanediyl group, C2-C3 alkenediyl group, Echinjiiru group or Puropinjiiru group {said C1-C3 alkanediyl group, the C2-C3 alkenediyl group and said Puropinjiiru group, at least one element selected from the group C And may have a substituent of
L B is a single bond, C 1 -C 3 alkanediyl group, C 2 -C 3 alkene diyl group, ethyne diyl group or propyne diyl group {C1-C 3 alkanediyl group, said C 2 -C 3 alkene diyl group and said propyne diyl group are selected from group C Optionally having one or more substituents,
L 2 represents a single bond, an oxygen atom, S (O) p , C 1 -C 3 alkanediyl group, NR 15 or —O—NNCR 16- *,
* Represents a bonding position with Ar,
R 15 and R 16 are the same or different and each represents a C1-C3 alkyl group optionally having one or more halogen atoms, or a hydrogen atom,
n represents 0 or 1 and
m and p are the same or different and each represents 0, 1 or 2.
Group A: C1-C6 chain hydrocarbon group, C1-C6 alkoxy group, C3-C6 alkenyloxy group, C3-C6 alkynyloxy group, (C1-C4 alkoxy) C1-C4 alkyl group, C1-C6 alkylsulfanyl group , C1-C6 alkylsulfinyl group, C1-C6 alkylsulfonyl group, C2-C6 alkylcarbonyl group, C2-C6 alkylcarbonyloxy group {C1-C6 chain hydrocarbon group, said C1-C6 alkoxy group, said C3-C6 alkyl hydrocarbon group C6 alkenyloxy group, said C3-C6 alkynyloxy group, said (C1-C4 alkoxy) C1-C4 alkyl group, said C1-C6 alkylsulfanyl group, said C1-C6 alkylsulfinyl group, said C1-C6 alkylsulfonyl group, The C2-C6 alkyl carbonyl group and the C2-C6 alkyl carboy Roxy group may have one or more halogen atoms}, C3-C8 cycloalkyl group, C3-C8 cycloalkenyl group, C3-C8 cycloalkyloxy group, C3-C8 cycloalkenyloxy group {C3 The -C8 cycloalkyl group, the C3-C8 cycloalkenyl group, the C3-C8 cycloalkyloxy group and the C3-C8 cycloalkenyloxy group may have one or more substituents selected from group B And a group consisting of a halogen atom, a cyano group, a nitro group, a hydroxy group, an amino group, C (O) OR 9 and C (O) NR 10 R 11 .
R 9 , R 10 and R 11 are the same or different and each represents a C1-C3 alkyl group or a hydrogen atom.
Group B: A group consisting of a C1-C3 alkyl group optionally having one or more halogen atoms, a halogen atom and a cyano group.
Group C: a group consisting of a cyclopropyl group, a halogen atom and a cyano group.
Group D: C1-C4 chain hydrocarbon group, C1-C4 alkoxy group, C3-C6 cycloalkyl group {C1-C4 chain hydrocarbon group, the C1-C4 alkoxy group and the C3-C6 cycloalkyl group , May have one or more halogen atoms}, a halogen atom, a cyano group, a nitro group, a hydroxyl group, OC (O) R 12 , C (O) R 12 , C (O) OR 12 , NR 13 A group consisting of R 14 , NR 13 C (O) R 14 , S (O) 2 NR 13 R 14 , C (O) NR 13 R 14 and CR 13 = N-OR 14 .
R 12 , R 13 and R 14 are the same or different and each represents a C1-C3 alkyl group optionally having one or more halogen atoms or a hydrogen atom. ]
And a compound represented by (hereinafter, referred to as a compound X of the present invention).
[2] The combination of R A and R B is
R A represents a C1-C10 alkanediyl group, a C2-C10 alkene diyl group, an ethyne diyl group, a C3-C10 alkyndiyl group, a C3-C8 cycloalkanediyl group or a C3-C8 cycloalkene diyl group {C1-C10 alkanediyl group; The C2-C10 alkene diyl group, the C3-C10 alkyldiyl group, the C3-C8 cycloalkanediyl group and the C3-C8 cycloalkene diyl group have at least one substituent selected from the group consisting of a cyano group and a halogen atom And R B may be a single bond;
A group in which R A is a C1-C3 alkanediyl group, a C2-C3 alkene diyl group, an ethynediyl group or a propyne diyl group {The C1-C3 alkanediyl group, the C2-C3 alkene diyl group and the propyne diyl group are a cyano group and a halogen atom And R B is a C3-C8 cycloalkanediyl group or a C3-C8 cycloalkenediyl group {wherein the C3-C8 cycloalkanediyl group and the C3-C8 cycloalkanediyl group are selected from the group consisting of A combination wherein C8 cycloalkene diyl group may have one or more substituents selected from the group consisting of a cyano group and a halogen atom; or
R A is a C3-C8 cycloalkanediyl group or a C3-C8 cycloalkene diyl group {the C3-C8 cycloalkanediyl group and the C3-C8 cycloalkene diyl group are each selected from the group consisting of a cyano group and a halogen atom 1 And R B is a C1-C3 alkanediyl group, a C2-C3 alkene diyl group, an ethyne diyl group or a propyne diyl group {C1-C3 alkanediyl group, the C2-C3 alkene diyl group. And the propynediyl group is a combination which may have one or more substituents selected from the group consisting of a cyano group and a halogen atom,
The compound according to [1], wherein L 2 is a single bond, an oxygen atom or S (O) p (hereinafter referred to as the present compound).
[3] R 3 is C (O) CH 3 , C (O) OCH 3 or a hydrogen atom,
L 1 is a single bond, -CH 2 -O - #, - CH 2 -O-N = CR 7 - a # or -CR 7 = N-O- #,
The compound according to [1] or [2], wherein L 2 is a single bond.
[4] [1] to [1], wherein the combination of R A and R B is such that R A is a C1-C6 alkanediyl group or a C3-C6 cycloalkanediyl group, and R B is a single bond The compound in any one of 3].
[5] described in any one of [1] to [4], wherein R 2 , R 4 and R 5 are the same or different and are a C1-C3 alkyl group optionally having one or more halogen atoms Compounds.
[6] The compound according to any one of [1] to [5], wherein Ar is a phenyl group which may have one or more substituents selected from group A.
[7] A pest control composition comprising the compound according to any one of [1] to [6] and an inert carrier.
[8] The composition according to [7], which comprises one or more components selected from the group consisting of Group (a) and Group (b):
Group (a): a group consisting of an insecticidal active ingredient, an acaricidal active ingredient and a nematode active ingredient;
Group (b): bactericidal active ingredient.
[9] A method for controlling pests which comprises applying an effective amount of the compound according to any one of [1] to [6] to a pest or a habitat of the pest.
[10] A method for controlling a pest, which comprises applying an effective amount of the composition according to [7] or [8] to a pest or a habitat of the pest.
[11] A seed or vegetative organ which retains an effective amount of the compound according to any one of [1] to [6] or an effective amount of the composition according to [7] or [8].
　本発明により、有害生物を防除することができる。 According to the present invention, pests can be controlled.
　本発明における置換基について説明する。
　「ハロゲン原子」とは、フッ素原子、塩素原子、臭素原子、又はヨウ素原子である。
　置換基が２以上のハロゲン原子を有している場合、それらのハロゲン原子は各々同一でも異なっていてもよいことを表す。
　置換基が特定の群（例えばシアノ基及びハロゲン原子からなる群）より選ばれる２以上の基又は原子を有している場合、それらの基又は原子は各々同一であっても異なっていてもよい。
　本明細書における「群Ｘより選ばれる１以上の置換基を有していてもよい」（ＸはＡ～Ｄのいずれか１つを意味する）との表記は、群Ｘより選ばれる置換基が２つ以上存在する場合、それらの置換基は各々同一でも異なっていてもよい。
　本明細書における「ＣＸ－ＣＹ」との表記は、炭素原子数がＸ乃至Ｙであることを意味する。例えば「Ｃ１－Ｃ６」との表記は、炭素原子数が１乃至６であることを意味する。
　「鎖式炭化水素基」とは、アルキル基、アルケニル基又はアルキニル基を表す。
　「アルキル基」としては、例えばメチル基、エチル基、プロピル基、イソプロピル基、１，１－ジメチルプロピル基、１，２－ジメチルプロピル基、ブチル基、ｔｅｒｔ－ブチル基、ペンチル基、及びヘキシル基が挙げられる。
　「アルケニル基」としては、例えばビニル基、１－プロペニル基、２－プロペニル基、１－メチル－１－プロペニル基、１－メチル－２－プロペニル基、１，２－ジメチル－１－プロペニル基、３－ブテニル基、４－ペンテニル基、及び５－ヘキセニル基が挙げられる。
　「アルキニル基」としては、例えばエチニル基、１－プロピニル基、２－プロピニル基、１－メチル－２－プロピニル基、１，１－ジメチル－２－プロピニル基、２－ブチニル基、４－ペンチニル基、及び５－ヘキシニル基が挙げられる。
　「アルカンジイル基」としては、例えばメタンジイル基、１，１－エタンジイル基、１，２－エタンジイル基、１，１－プロパンジイル基、２，２－プロパンジイル基、１，２－プロパンジイル基、１，３－プロパンジイル基、１，２－ブタンジイル基、１，３－ブタンジイル基、１，４－ブタンジイル基、１，３－ペンタンジイル基、１，４－ペンタンジイル基、１，５－ペンタンジイル基、１，４－ヘキサンジイル基、１，５－ヘキサンジイル基、１，６－ヘキサンジイル基、１，５－ヘプタンジイル基、１，６－ヘプタンジイル基、１，７－ヘプタンジイル基、１，６－オクタンジイル基、１，７－オクタンジイル基、１，８－オクタンジイル基、１，７－ノナンジイル基、１，８－ノナンジイル基、１，９－ノナンジイル基、１，８－デカンジイル基、１，９－デカンジイル基及び１，１０－デカンジイル基が挙げられる。
　「アルケンジイル基」としては、例えばエテン－１，１－ジイル基、エテン－１，２－ジイル基、１－プロペン－１，２－ジイル基、１－プロペン－１，３－ジイル基、２－プロペン－１，３－ジイル基、１－ブテン－１，３－ジイル基、１－ブテン－１，４－ジイル基、２－ブテン－１，４－ジイル基、１－ペンテン－１，４－ジイル基、１－ペンテン－１，５－ジイル基、２－ペンテン－１，５－ジイル基、１－ヘキセン－１，５－ジイル基、１－ヘキセン－１，６－ジイル基、２－ヘキセン－１，６－ジイル基、１－ヘプテン－１，６－ジイル基、１－ヘプテン－１，７－ジイル基、２－ヘプテン－１，７－ジイル基、１－オクテン－１，７－ジイル基、１－オクテン－１，８－ジイル基、２－オクテン－１，８－ジイル基、１－ノネン－１，８－ジイル基、１－ノネン－１，９－ジイル基、２－ノネン－１，９－ジイル基、１－デセン－１，９－ジイル基、１－デセン－１，１０－ジイル基及び２－デセン－１，１０－ジイル基が挙げられる。
　「アルキンジイル基」としては、例えば１－プロピン－１，３－ジイル基、２－プロピン－１，３－ジイル基、１－ブチン－１，３－ジイル基、１－ブチン－１，４－ジイル基、２－ブチン－１，４－ジイル基、１－ペンチン－１，４－ジイル基、１－ペンチン－１，５－ジイル基、２－ペンチン－１，５－ジイル基、１－ヘキシン－１，５－ジイル基、１－ヘキシン－１，６－ジイル基、２－ヘキシン－１，６－ジイル基、１－ヘプチン－１，６－ジイル基、１－ヘプチン－１，７－ジイル基、２－ヘプチン－１，７－ジイル基、１－オクチン－１，７－ジイル基、１－オクチン－１，８－ジイル基、２－オクチン－１，８－ジイル基、１－ノニン－１，８－ジイル基、１－ノニン－１，９－ジイル基、２－ノニン－１，９－ジイル基、１－デシン－１，９－ジイル基、１－デシン－１，１０－ジイル基及び２－デシン－１，１０－ジイル基が挙げられる。 The substituents in the present invention will be described.
The "halogen atom" is a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.
When a substituent has 2 or more halogen atoms, it means that those halogen atoms may be the same or different.
When the substituent has two or more groups or atoms selected from a specific group (for example, a group consisting of a cyano group and a halogen atom), those groups or atoms may be the same or different. .
In the present specification, the expression “optionally having one or more substituents selected from group X” (X means any one of A to D) is a substituent selected from group X When two or more are present, those substituents may be the same or different.
The notation "CX-CY" in the present specification means that the number of carbon atoms is X to Y. For example, the notation "C1-C6" means that the number of carbon atoms is 1 to 6.
The "chain hydrocarbon group" represents an alkyl group, an alkenyl group or an alkynyl group.
As the "alkyl group", for example, methyl group, ethyl group, propyl group, isopropyl group, 1,1-dimethylpropyl group, 1,2-dimethylpropyl group, butyl group, tert-butyl group, pentyl group, and hexyl group Can be mentioned.
As the “alkenyl group”, for example, vinyl group, 1-propenyl group, 2-propenyl group, 1-methyl-1-propenyl group, 1-methyl-2-propenyl group, 1,2-dimethyl-1-propenyl group, Examples include 3-butenyl group, 4-pentenyl group, and 5-hexenyl group.
As the "alkynyl group", for example, ethynyl group, 1-propynyl group, 2-propynyl group, 1-methyl-2-propynyl group, 1,1-dimethyl-2-propynyl group, 2-butynyl group, 4-pentynyl group And 5-hexynyl groups.
As the “alkanediyl group”, for example, methanediyl group, 1,1-ethanediyl group, 1,2-ethanediyl group, 1,1-propanediyl group, 2,2-propanediyl group, 1,2-propanediyl group, 1,3-propanediyl group, 1,2-butanediyl group, 1,3-butanediyl group, 1,4-butanediyl group, 1,3-pentanediyl group, 1,4-pentanediyl group, 1,5-pentanediyl group, 1,4-hexanediyl, 1,5-hexanediyl, 1,6-hexanediyl, 1,5-heptanediyl, 1,6-heptanediyl, 1,7-heptanediyl, 1,6-octane Diyl, 1,7-octanediyl, 1,8-octanediyl, 1,7-nonanediyl, 1,8-nonanediyl, 1,9-nonanediyl, 1,8 Decanediyl group, include 1,9-decanediyl group and 1,10 decanediyl group.
Examples of the “alkenediyl group” include ethene-1,1-diyl group, ethene-1,2-diyl group, 1-propene-1,2-diyl group, 1-propene-1,3-diyl group, 2- Propene-1,3-diyl group, 1-butene-1,3-diyl group, 1-butene-1,4-diyl group, 2-butene-1,4-diyl group, 1-pentene-1,4- Diyl group, 1-pentene-1,5-diyl group, 2-pentene-1,5-diyl group, 1-hexene-1,5-diyl group, 1-hexene-1,6-diyl group, 2-hexene -1,6-diyl group, 1-heptene-1,6-diyl group, 1-heptene-1,7-diyl group, 2-heptene-1,7-diyl group, 1-octene-1,7-diyl group Group, 1-octene-1,8-diyl group, 2-octene-1,8-diyl group, 1-none -1,8-diyl group, 1-nonene-1,9-diyl group, 2-nonene-1,9-diyl group, 1-decene-1,9-diyl group, 1-decene-1,10-diyl group Groups and 2-decene-1,10-diyl groups.
As the “alkyndiyl group”, for example, 1-propyne-1,3-diyl group, 2-propyne-1,3-diyl group, 1-butyne-1,3-diyl group, 1-butyne-1,4-diyl group Group, 2-butyne-1,4-diyl group, 1-pentine-1,4-diyl group, 1-pentine-1,5-diyl group, 2-pentine-1,5-diyl group, 1-hexyne- 1,5-diyl group, 1-hexyne-1,6-diyl group, 2-hexyne-1,6-diyl group, 1-heptin-1,6-diyl group, 1-heptin-1,7-diyl group , 2-heptin-1,7-diyl group, 1-octin-1,7-diyl group, 1-octin-1,8-diyl group, 2-octin-1,8-diyl group, 1-nonin-1 , 8-diyl group, 1-nonin-1,9-diyl group, 2-nonin-1,9-diyl group, 1 Decyne-1,9-diyl group, and a 1-decyne-1,10-diyl group and a 2-decyne-1,10-diyl group.
　「脂環式炭化水素基」とは、シクロアルキル基、シクロアルケニル基又はシクロアルキニル基を表す。
　「シクロアルキル基」としては、例えばシクロプロピル基、シクロブチル基、シクロペンチル基、及びシクロヘキシル基が挙げられる。
　「シクロアルケニル基」としては、例えばシクロプロペニル基、シクロブテニル基、シクロペンテニル基、及びシクロヘキセニル基が挙げられる。
　「シクロアルキニル基」としては、例えばシクロヘキシニル基が挙げられる。
　「シクロアルカンジイル基」としては、例えばシクロプロパンジイル基、１，２－シクロブタンジイル基、１，３－シクロブタンジイル基、１，２－シクロペンタンジイル基、１，３－シクロペンタンジイル基、１，２－シクロヘキサンジイル基、１，３－シクロヘキサンジイル基、１，４－シクロヘキサンジイル基、１，２－シクロヘプタンジイル基、１，３－シクロヘプタンジイル基、１，４－シクロヘプタンジイル基、１，２－シクロオクタンジイル基、１，３－シクロオクタンジイル基及び１，４－シクロオクタンジイル基が挙げられる。
　「シクロアルケンジイル基」としては、例えばシクロプロペン－１，２－ジイル基、シクロプロペン－１，３－ジイル基、シクロブテン－２，３－ジイル基、シクロブテン－３，４－ジイル基、シクロペンテン－２，３－ジイル基、シクロペンテン－３，４－ジイル基、シクロヘキセン－２，３－ジイル基、シクロヘキセン－３，４－ジイル基、シクロヘプテン－２，３－ジイル基、シクロヘプテン－３，４－ジイル基、シクロオクテン－２，３－ジイル基及びシクロオクテン－３，４－ジイル基が挙げられる。 The "alicyclic hydrocarbon group" represents a cycloalkyl group, a cycloalkenyl group or a cycloalkynyl group.
Examples of the "cycloalkyl group" include cyclopropyl group, cyclobutyl group, cyclopentyl group and cyclohexyl group.
As the "cycloalkenyl group", for example, cyclopropenyl group, cyclobutenyl group, cyclopentenyl group and cyclohexenyl group can be mentioned.
Examples of the "cycloalkynyl group" include a cyclohexynyl group.
As the “cycloalkanediyl group”, for example, cyclopropanediyl group, 1,2-cyclobutanediyl group, 1,3-cyclobutanediyl group, 1,2-cyclopentandiyl group, 1,3-cyclopentandiyl group, 1 , 2-cyclohexanediyl group, 1,3-cyclohexanediyl group, 1,4-cyclohexanediyl group, 1,2-cycloheptanediyl group, 1,3-cycloheptanediyl group, 1,4-cycloheptanediyl group, There may be mentioned 1,2-cyclooctanediyl, 1,3-cyclooctanediyl and 1,4-cyclooctanediyl.
As the “cycloalkenediyl group”, for example, cyclopropene-1,2-diyl group, cyclopropene-1,3-diyl group, cyclobutene-2,3-diyl group, cyclobutene-3,4-diyl group, cyclopentene- 2,3-diyl group, cyclopentene-3,4-diyl group, cyclohexene-2,3-diyl group, cyclohexene-3,4-diyl group, cycloheptene-2,3-diyl group, cycloheptene-3,4-diyl group And cyclooctene-2,3-diyl and cyclooctene-3,4-diyl groups.
　「Ｃ６－Ｃ１０アリール基」としては、例えばフェニル基、ナフチル基、インダニル基、及び１，２，３，４－テトラヒドロナフチル基が挙げられる。
　「３－１０員複素環基」とは、窒素原子、酸素原子及び硫黄原子からなる群から選ばれる１～４個のヘテロ原子を含む、部分不飽和又は芳香族の単環又は縮合複素環基を意味し、例えば、アジリジニル基、アゼチジニル基、ピロリジニル基、イミダゾリニル基、ピペリジル基、ピペラジニル基、アゼパニル基、オキシラニル基、オキセタニル基、オキソラニル基、ジオキソラニル基、オキサニル基、ジオキサニル基、オキセパニル基、ピラニル基、テトラヒドロピラニル基、テトラヒドロチエニル基、テトラヒドロチオピラニル基、オキサゾリニル基、チアゾリニル基、オキサゾリジニル基、チアゾリジニル基、モルホリニル基、チオモルホリニル基、オキサジニル基、チアジニル基、チアゼパニル基、ピロリル基、フリル基、チエニル基、ピラゾリル基、イミダゾリル基、トリアゾリル基、テトラゾリル基、オキサゾリル基、チアゾリル基、オキサジアゾリル基、チアジアゾリル基、ピリジル基、ピリダジニル基、ピリミジニル基、ピラジニル基、トリアジニル基、テトラジニル基、キノリル基、及びキナゾリニル基が挙げられる。
　「１以上のハロゲン原子を有していてもよい（Ｃ１－Ｃ４アルコキシ）Ｃ１－Ｃ４アルキル基」とは、（Ｃ１－Ｃ４アルコキシ）及び／又は（Ｃ１－Ｃ４アルキル）が１以上のハロゲン原子を有していてもよい基を表し、例えば、メトキシメチル基、２－（トリフルオロメトキシ）エチル基、２，２－ジフルオロ－３－メトキシプロピル基、２，２－ジフルオロ－３－（２，２，２－トリフルオロエトキシ）プロピル基、及び３－（２－クロロエトキシ）プロピル基が挙げられる。 Examples of the "C6-C10 aryl group" include phenyl group, naphthyl group, indanyl group, and 1,2,3,4-tetrahydronaphthyl group.
The “3-10 membered heterocyclic group” is a partially unsaturated or aromatic monocyclic or fused heterocyclic group containing 1 to 4 heteroatoms selected from the group consisting of nitrogen atom, oxygen atom and sulfur atom For example, aziridinyl group, azetidinyl group, pyrrolidinyl group, imidazolinyl group, piperidyl group, piperazinyl group, azepanyl group, azepanyl group, oxiranyl group, oxetanyl group, oxolanyl group, dioxolanyl group, oxanyl group, dioxanyl group, oxepanyl group, pyranyl group , Tetrahydropyranyl group, tetrahydrothienyl group, tetrahydrothiopyranyl group, oxazolinyl group, thiazolinyl group, oxazolidinyl group, thiazolidinyl group, morpholinyl group, thiomorpholinyl group, oxazinyl group, thiazinyl group, thiazepanyl group, pyrrolyl group, furyl group, thienyl group Group, Razolyl group, imidazolyl group, triazolyl group, tetrazolyl group, oxazolyl group, thiazolyl group, oxadiazolyl group, thiadiazolyl group, pyridyl group, pyridazinyl group, pyrimidinyl group, pyrazinyl group, triazinyl group, tetrazinyl group, quinolyl group, quinazolinyl group Be
The "(C1-C4 alkoxy) C1-C4 alkyl group which may have one or more halogen atoms" means that (C1-C4 alkoxy) and / or (C1-C4 alkyl) is one or more halogen atoms. Represents a group which may have, for example, methoxymethyl group, 2- (trifluoromethoxy) ethyl group, 2,2-difluoro-3-methoxypropyl group, 2,2-difluoro-3- (2,2 And 2- (3-trifluoroethoxy) propyl and 3- (2-chloroethoxy) propyl.
　本発明化合物Ｘが１個又は複数個の不斉中心を有する場合、各々の光学異性体及びそれらを任意の割合で含む混合物も本発明化合物Ｘに含まれる。また、炭素－炭素二重結合、又は炭素－窒素二重結合に由来する２種以上の幾何異性体、及びそれらを任意の割合で含む混合物も本発明化合物Ｘに含まれる。 When the compound of the present invention X has one or more asymmetric centers, each optical isomer and a mixture containing them in any ratio are also included in the compound of the present invention X. In addition, a compound of the present invention X includes two or more geometric isomers derived from a carbon-carbon double bond or a carbon-nitrogen double bond, and a mixture containing them in any ratio.
　本発明化合物Ｘは、塩酸、硫酸、硝酸、リン酸、酢酸又は安息香酸等の酸と混合することにより、塩酸塩、硫酸塩、硝酸塩、リン酸塩、酢酸塩又は安息香酸塩等の酸付加塩を形成することがある。 The compound of the present invention X is added with an acid such as hydrochloride, sulfate, nitrate, phosphate, acetate or benzoate by mixing with an acid such as hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, acetic acid or benzoic acid May form salts.
　本発明化合物の態様としては、以下の化合物が挙げられる。 The following compounds may be mentioned as embodiments of the compound of the present invention.
〔態様１〕本発明化合物において、Ｒ3が、Ｃ１－Ｃ３鎖式炭化水素基｛該Ｃ１－Ｃ３鎖式炭化水素基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝、（Ｃ１－Ｃ３アルコキシ）Ｃ１－Ｃ３アルキル基、ベンジル基、Ｃ（Ｏ）Ｒ8、Ｃ（Ｏ）ＯＲ8又は水素原子であり、
　Ｌ1が、単結合、－ＬA－Ｏ－＃、－ＬA－Ｏ－Ｎ＝ＣＲ7－＃、又は－ＬB－ＣＲ7＝Ｎ－Ｏ－＃であり、
　Ｌ2が、単結合又は酸素原子である化合物。
〔態様２〕態様１において、Ｒ3が、Ｃ１－Ｃ３鎖式炭化水素基、ベンジル基、Ｃ（Ｏ）Ｒ8、Ｃ（Ｏ）ＯＲ8又は水素原子である化合物。
〔態様３〕態様１において、Ｒ3が、アリル基、ベンジル基、Ｃ（Ｏ）ＣＨ3、Ｃ（Ｏ）ＯＣＨ3又は水素原子である化合物。
〔態様４〕態様１において、Ｒ3が、アリル基、Ｃ（Ｏ）ＣＨ3、Ｃ（Ｏ）ＯＣＨ3又は水素原子である化合物。
〔態様５〕本発明化合物において、Ｒ3が、アリル基、Ｃ（Ｏ）ＣＨ3、Ｃ（Ｏ）ＯＣＨ3、又は水素原子であり、
　Ｌ1が、単結合、－ＣＨ2－Ｏ－＃、又は－ＣＨ＝Ｎ－Ｏ－＃であり、
　Ｌ2が単結合である化合物。
〔態様６〕態様５において、Ｒ2、Ｒ4及びＲ5が同一又は相異なり、１以上のハロゲン原子を有していてもよいＣ１－Ｃ４鎖式炭化水素基である化合物。
〔態様７〕態様５において、Ｒ2が１以上のハロゲン原子を有していてもよいＣ１－Ｃ４鎖式炭化水素基であり、
　Ｒ4及びＲ5がメチル基である化合物。
〔態様８〕態様５において、Ｒ2、Ｒ4及びＲ5がメチル基である化合物。
〔態様９〕態様１において、ＲAがＣ１－Ｃ１０アルカンジイル基、Ｃ２－Ｃ１０アルケンジイル基、エチンジイル基、Ｃ３－Ｃ１０アルキンジイル基、Ｃ３－Ｃ８シクロアルカンジイル基又はＣ３－Ｃ８シクロアルケンジイル基｛該Ｃ１－Ｃ１０アルカンジイル基、該Ｃ２－Ｃ１０アルケンジイル基、該Ｃ３－Ｃ１０アルキンジイル基、該Ｃ３－Ｃ８シクロアルカンジイル基及び該Ｃ３－Ｃ８シクロアルケンジイル基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝であり、ＲBが単結合である化合物。
〔態様１０〕態様２において、ＲAがＣ１－Ｃ１０アルカンジイル基、Ｃ２－Ｃ１０アルケンジイル基、エチンジイル基、Ｃ３－Ｃ１０アルキンジイル基、Ｃ３－Ｃ８シクロアルカンジイル基又はＣ３－Ｃ８シクロアルケンジイル基｛該Ｃ１－Ｃ１０アルカンジイル基、該Ｃ２－Ｃ１０アルケンジイル基、該Ｃ３－Ｃ１０アルキンジイル基、該Ｃ３－Ｃ８シクロアルカンジイル基及び該Ｃ３－Ｃ８シクロアルケンジイル基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝であり、ＲBが単結合である化合物。
〔態様１１〕態様３において、ＲAがＣ１－Ｃ１０アルカンジイル基、Ｃ２－Ｃ１０アルケンジイル基、エチンジイル基、Ｃ３－Ｃ１０アルキンジイル基、Ｃ３－Ｃ８シクロアルカンジイル基又はＣ３－Ｃ８シクロアルケンジイル基｛該Ｃ１－Ｃ１０アルカンジイル基、該Ｃ２－Ｃ１０アルケンジイル基、該Ｃ３－Ｃ１０アルキンジイル基、該Ｃ３－Ｃ８シクロアルカンジイル基及び該Ｃ３－Ｃ８シクロアルケンジイル基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝であり、ＲBが単結合である化合物。
〔態様１２〕態様４において、ＲAがＣ１－Ｃ１０アルカンジイル基、Ｃ２－Ｃ１０アルケンジイル基、エチンジイル基、Ｃ３－Ｃ１０アルキンジイル基、Ｃ３－Ｃ８シクロアルカンジイル基又はＣ３－Ｃ８シクロアルケンジイル基｛該Ｃ１－Ｃ１０アルカンジイル基、該Ｃ２－Ｃ１０アルケンジイル基、該Ｃ３－Ｃ１０アルキンジイル基、該Ｃ３－Ｃ８シクロアルカンジイル基及び該Ｃ３－Ｃ８シクロアルケンジイル基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝であり、ＲBが単結合である化合物。
〔態様１３〕態様５において、ＲAがＣ１－Ｃ１０アルカンジイル基、Ｃ２－Ｃ１０アルケンジイル基、エチンジイル基、Ｃ３－Ｃ１０アルキンジイル基、Ｃ３－Ｃ８シクロアルカンジイル基又はＣ３－Ｃ８シクロアルケンジイル基｛該Ｃ１－Ｃ１０アルカンジイル基、該Ｃ２－Ｃ１０アルケンジイル基、該Ｃ３－Ｃ１０アルキンジイル基、該Ｃ３－Ｃ８シクロアルカンジイル基及び該Ｃ３－Ｃ８シクロアルケンジイル基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝であり、ＲBが単結合である化合物。
〔態様１４〕態様６において、ＲAがＣ１－Ｃ１０アルカンジイル基、Ｃ２－Ｃ１０アルケンジイル基、エチンジイル基、Ｃ３－Ｃ１０アルキンジイル基、Ｃ３－Ｃ８シクロアルカンジイル基又はＣ３－Ｃ８シクロアルケンジイル基｛該Ｃ１－Ｃ１０アルカンジイル基、該Ｃ２－Ｃ１０アルケンジイル基、該Ｃ３－Ｃ１０アルキンジイル基、該Ｃ３－Ｃ８シクロアルカンジイル基及び該Ｃ３－Ｃ８シクロアルケンジイル基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝であり、ＲBが単結合である化合物。
〔態様１５〕態様７において、ＲAがＣ１－Ｃ１０アルカンジイル基、Ｃ２－Ｃ１０アルケンジイル基、エチンジイル基、Ｃ３－Ｃ１０アルキンジイル基、Ｃ３－Ｃ８シクロアルカンジイル基又はＣ３－Ｃ８シクロアルケンジイル基｛該Ｃ１－Ｃ１０アルカンジイル基、該Ｃ２－Ｃ１０アルケンジイル基、該Ｃ３－Ｃ１０アルキンジイル基、該Ｃ３－Ｃ８シクロアルカンジイル基及び該Ｃ３－Ｃ８シクロアルケンジイル基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝であり、ＲBが単結合である化合物。
〔態様１６〕態様８において、ＲAがＣ１－Ｃ１０アルカンジイル基、Ｃ２－Ｃ１０アルケンジイル基、エチンジイル基、Ｃ３－Ｃ１０アルキンジイル基、Ｃ３－Ｃ８シクロアルカンジイル基又はＣ３－Ｃ８シクロアルケンジイル基｛該Ｃ１－Ｃ１０アルカンジイル基、該Ｃ２－Ｃ１０アルケンジイル基、該Ｃ３－Ｃ１０アルキンジイル基、該Ｃ３－Ｃ８シクロアルカンジイル基及び該Ｃ３－Ｃ８シクロアルケンジイル基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝であり、ＲBが単結合である化合物。
〔態様１７〕態様１において、ＲAがＣ１－Ｃ６アルカンジイル基又はシクロヘキサンジイル基であり、ＲBが単結合である化合物。
〔態様１８〕態様２において、ＲAがＣ１－Ｃ６アルカンジイル基又はシクロヘキサンジイル基であり、ＲBが単結合である化合物。
〔態様１９〕態様３において、ＲAがＣ１－Ｃ６アルカンジイル基又はシクロヘキサンジイル基であり、ＲBが単結合である化合物。
〔態様２０〕態様４において、ＲAがＣ１－Ｃ６アルカンジイル基又はシクロヘキサンジイル基であり、ＲBが単結合である化合物。
〔態様２１〕態様５において、ＲAがＣ１－Ｃ６アルカンジイル基又はシクロヘキサンジイル基であり、ＲBが単結合である化合物。
〔態様２２〕態様６において、ＲAがＣ１－Ｃ６アルカンジイル基又はシクロヘキサンジイル基であり、ＲBが単結合である化合物。
〔態様２３〕態様７において、ＲAがＣ１－Ｃ６アルカンジイル基又はシクロヘキサンジイル基であり、ＲBが単結合である化合物。
〔態様２４〕態様８において、ＲAがＣ１－Ｃ６アルカンジイル基又はシクロヘキサンジイル基であり、ＲBが単結合である化合物。
〔態様２５〕態様１において、ＲAがＣ１－Ｃ３アルカンジイル基であり、ＲBが単結合である化合物。
〔態様２６〕態様２において、ＲAがＣ１－Ｃ３アルカンジイル基であり、ＲBが単結合である化合物。
〔態様２７〕態様３において、ＲAがＣ１－Ｃ３アルカンジイル基であり、ＲBが単結合である化合物。
〔態様２８〕態様４において、ＲAがＣ１－Ｃ３アルカンジイル基であり、ＲBが単結合である化合物。
〔態様２９〕態様５において、ＲAがＣ１－Ｃ３アルカンジイル基であり、ＲBが単結合である化合物。
〔態様３０〕態様６において、ＲAがＣ１－Ｃ３アルカンジイル基であり、ＲBが単結合である化合物。
〔態様３１〕態様７において、ＲAがＣ１－Ｃ３アルカンジイル基であり、ＲBが単結合である化合物。
〔態様３２〕態様８において、ＲAがＣ１－Ｃ３アルカンジイル基であり、ＲBが単結合である化合物。
〔態様３３〕本発明化合物において、Ａｒが群Ａより選ばれる１以上の置換基を有していてもよいＣ６－Ｃ１０アリール基である化合物。
〔態様３４〕本発明化合物において、Ａｒが群Ａより選ばれる１以上の置換基を有していてもよいフェニル基である化合物。
〔態様３５〕態様１～態様３２のいずれかにおいて、Ａｒが群Ａより選ばれる１以上の置換基を有していてもよいＣ６－Ｃ１０アリール基である化合物。
〔態様３６〕態様１～態様３２のいずれかにおいて、Ａｒが群Ａより選ばれる１以上の置換基を有していてもよいフェニル基である化合物。
〔態様３７〕本発明化合物において、Ｒ3が、Ｃ１－Ｃ３鎖式炭化水素基｛該Ｃ１－Ｃ３鎖式炭化水素基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝、（Ｃ１－Ｃ３アルコキシ）Ｃ１－Ｃ３アルキル基、ベンジル基、Ｃ（Ｏ）Ｒ8、Ｃ（Ｏ）ＯＲ8又は水素原子であり、
　Ｌ1が、単結合、－ＬA－Ｏ－＃、－ＬA－Ｏ－Ｎ＝ＣＲ7－＃、又は－ＬB－ＣＲ7＝Ｎ－Ｏ－＃である化合物。
〔態様３８〕態様３７において、Ｒ3が、Ｃ１－Ｃ３鎖式炭化水素基、ベンジル基、Ｃ（Ｏ）Ｒ8、Ｃ（Ｏ）ＯＲ8又は水素原子である化合物。
〔態様３９〕態様３７において、Ｒ3が、アリル基、ベンジル基、Ｃ（Ｏ）ＣＨ3、Ｃ（Ｏ）ＯＣＨ3又は水素原子である化合物。
〔態様４０〕態様３７において、Ｒ3が、アリル基、Ｃ（Ｏ）ＣＨ3、Ｃ（Ｏ）ＯＣＨ3又は水素原子である化合物。
〔態様４１〕本発明化合物において、Ｒ3が、アリル基、Ｃ（Ｏ）ＣＨ3、Ｃ（Ｏ）ＯＣＨ3、又は水素原子であり、
　Ｌ1が、単結合、－ＣＨ2－Ｏ－＃、又は－ＣＨ＝Ｎ－Ｏ－＃である化合物。
〔態様４２〕態様４１において、Ｒ2、Ｒ4及びＲ5が同一又は相異なり、１以上のハロゲン原子を有していてもよいＣ１－Ｃ４鎖式炭化水素基である化合物。
〔態様４３〕態様４１において、Ｒ2が１以上のハロゲン原子を有していてもよいＣ１－Ｃ４鎖式炭化水素基であり、
　Ｒ4及びＲ5がメチル基である化合物。
〔態様４４〕態様４１において、Ｒ2、Ｒ4及びＲ5がメチル基である化合物。 [Aspect 1] In the compound of the present invention, R 3 is a C1-C3 chain hydrocarbon group {wherein the C1-C3 chain hydrocarbon group is one or more substituents selected from the group consisting of a cyano group and a halogen atom Or (C1-C3 alkoxy) C1-C3 alkyl group, benzyl group, C (O) R 8 , C (O) OR 8 or a hydrogen atom,
L 1 is a single bond, -L A -O - #, - L A -O-N = CR 7 - #, or -L B is -CR 7 = N-O- #,
Compounds wherein L 2 is a single bond or an oxygen atom.
Embodiment 2 A compound according to Embodiment 1, wherein R 3 is a C1-C3 chain hydrocarbon group, a benzyl group, C (O) R 8 , C (O) OR 8 or a hydrogen atom.
Embodiment 3 A compound according to Embodiment 1, wherein R 3 is an allyl group, a benzyl group, C (O) CH 3 , C (O) OCH 3 or a hydrogen atom.
Embodiment 4 A compound according to Embodiment 1, wherein R 3 is an allyl group, C (O) CH 3 , C (O) OCH 3 or a hydrogen atom.
[Aspect 5] In the compound of the present invention, R 3 is an allyl group, C (O) CH 3 , C (O) OCH 3 or a hydrogen atom,
L 1 is a single bond, -CH 2 -O- #, or -CH = N-O- #,
The compound whose L 2 is a single bond.
Embodiment 6 A compound according to Embodiment 5, wherein R 2 , R 4 and R 5 are the same or different and are a C1-C4 chain hydrocarbon group optionally having one or more halogen atoms.
[Aspect 7] In aspect 5, R 2 is a C1-C4 chain hydrocarbon group optionally having one or more halogen atoms,
The compound whose R 4 and R 5 are methyl groups.
[Aspect 8] The compound according to Aspect 5, wherein R 2 , R 4 and R 5 are a methyl group.
[Aspect 9] In aspect 1, R A is a C1-C10 alkanediyl group, a C2-C10 alkene diyl group, an ethynediyl group, a C3-C10 alkyndiyl group, a C3-C8 cycloalkanediyl group or a C3-C8 cycloalkene diyl group { The C1-C10 alkanediyl group, the C2-C10 alkene diyl group, the C3-C10 alkyndiyl group, the C3-C8 cycloalkanediyl group and the C3-C8 cycloalkene diyl group are selected from the group consisting of a cyano group and a halogen atom Compounds wherein one or more substituents may be included, and R B is a single bond.
[Aspect 10] In aspect 2, R A is a C1-C10 alkanediyl group, a C2-C10 alkene diyl group, an ethyne diyl group, a C3-C10 alkyndiyl group, a C3-C8 cycloalkanediyl group or a C3-C8 cycloalkene diyl group { The C1-C10 alkanediyl group, the C2-C10 alkene diyl group, the C3-C10 alkyndiyl group, the C3-C8 cycloalkanediyl group and the C3-C8 cycloalkene diyl group are selected from the group consisting of a cyano group and a halogen atom Compounds wherein one or more substituents may be included, and R B is a single bond.
[Aspect 11] In Aspect 3, R A is a C1-C10 alkanediyl group, a C2-C10 alkene diyl group, an ethynediyl group, a C3-C10 alkyndiyl group, a C3-C8 cycloalkanediyl group or a C3-C8 cycloalkene diyl group { The C1-C10 alkanediyl group, the C2-C10 alkene diyl group, the C3-C10 alkyndiyl group, the C3-C8 cycloalkanediyl group and the C3-C8 cycloalkene diyl group are selected from the group consisting of a cyano group and a halogen atom Compounds wherein one or more substituents may be included, and R B is a single bond.
[Aspect 12] In Aspect 4, R A is C 1 -C 10 alkanediyl group, C 2 -C 10 alkene diyl group, ethyne diyl group, C 3 -C 10 alkyndiyl group, C 3 -C 8 cycloalkanediyl group or C 3 -C 8 cycloalkene diyl group { The C1-C10 alkanediyl group, the C2-C10 alkene diyl group, the C3-C10 alkyndiyl group, the C3-C8 cycloalkanediyl group and the C3-C8 cycloalkene diyl group are selected from the group consisting of a cyano group and a halogen atom Compounds wherein one or more substituents may be included, and R B is a single bond.
[Aspect 13] In aspect 5, R A is a C1-C10 alkanediyl group, a C2-C10 alkene diyl group, an ethynediyl group, a C3-C10 alkyndiyl group, a C3-C8 cycloalkanediyl group or a C3-C8 cycloalkene diyl group { The C1-C10 alkanediyl group, the C2-C10 alkene diyl group, the C3-C10 alkyndiyl group, the C3-C8 cycloalkanediyl group and the C3-C8 cycloalkene diyl group are selected from the group consisting of a cyano group and a halogen atom Compounds wherein one or more substituents may be included, and R B is a single bond.
[Aspect 14] In aspect 6, R A is a C1-C10 alkanediyl group, a C2-C10 alkene diyl group, an ethyne diyl group, a C3-C10 alkyndiyl group, a C3-C8 cycloalkanediyl group or a C3-C8 cycloalkene diyl group { The C1-C10 alkanediyl group, the C2-C10 alkene diyl group, the C3-C10 alkyndiyl group, the C3-C8 cycloalkanediyl group and the C3-C8 cycloalkene diyl group are selected from the group consisting of a cyano group and a halogen atom Compounds wherein one or more substituents may be included, and R B is a single bond.
[Aspect 15] In aspect 7, R A is C 1 -C 10 alkanediyl group, C 2 -C 10 alkene diyl group, ethyne diyl group, C 3 -C 10 alkyndiyl group, C 3 -C 8 cycloalkanediyl group or C 3 -C 8 cycloalkene diyl group { The C1-C10 alkanediyl group, the C2-C10 alkene diyl group, the C3-C10 alkyndiyl group, the C3-C8 cycloalkanediyl group and the C3-C8 cycloalkene diyl group are selected from the group consisting of a cyano group and a halogen atom Compounds wherein one or more substituents may be included, and R B is a single bond.
[Aspect 16] In aspect 8, R A is C 1 -C 10 alkanediyl group, C 2 -C 10 alkene diyl group, ethyne diyl group, C 3 -C 10 alkyndiyl group, C 3 -C 8 cycloalkanediyl group or C 3 -C 8 cycloalkene diyl group { The C1-C10 alkanediyl group, the C2-C10 alkene diyl group, the C3-C10 alkyndiyl group, the C3-C8 cycloalkanediyl group and the C3-C8 cycloalkene diyl group are selected from the group consisting of a cyano group and a halogen atom Compounds wherein one or more substituents may be included, and R B is a single bond.
Aspect 17. The compound according to aspect 1, wherein R A is a C 1 -C 6 alkanediyl group or a cyclohexane diyl group, and R B is a single bond.
Aspect 18: A compound according to aspect 2, wherein R A is a C 1 -C 6 alkanediyl group or a cyclohexane diyl group, and R B is a single bond.
Embodiment 19: A compound according to Embodiment 3, wherein R A is a C 1 -C 6 alkanediyl group or a cyclohexane diyl group, and R B is a single bond.
Aspect 20. A compound according to aspect 4, wherein R A is a C 1 -C 6 alkanediyl group or a cyclohexane diyl group, and R B is a single bond.
Embodiment 21: A compound according to Embodiment 5, wherein R A is a C 1 -C 6 alkanediyl group or a cyclohexane diyl group, and R B is a single bond.
Embodiment 22: A compound according to embodiment 6, wherein R A is a C 1 -C 6 alkanediyl group or a cyclohexane diyl group, and R B is a single bond.
Embodiment 23: A compound according to Embodiment 7, wherein R A is a C 1 -C 6 alkanediyl group or a cyclohexane diyl group, and R B is a single bond.
Aspect 24. A compound according to aspect 8, wherein R A is a C 1 -C 6 alkanediyl group or a cyclohexane diyl group, and R B is a single bond.
Aspect 25. A compound according to aspect 1, wherein R A is a C 1 -C 3 alkanediyl group, and R B is a single bond.
Aspect 26. A compound according to aspect 2, wherein R A is a C 1 -C 3 alkanediyl group, and R B is a single bond.
Aspect 27. A compound according to aspect 3, wherein R A is a C1-C3 alkanediyl group, and R B is a single bond.
Embodiment 28: A compound according to Embodiment 4, wherein R A is a C 1 -C 3 alkanediyl group, and R B is a single bond.
Aspect 29. A compound according to aspect 5, wherein R A is a C 1 -C 3 alkanediyl group, and R B is a single bond.
Aspect 30. A compound according to aspect 6, wherein R A is a C 1 -C 3 alkanediyl group, and R B is a single bond.
Embodiment 31: A compound according to Embodiment 7, wherein R A is a C 1 -C 3 alkanediyl group, and R B is a single bond.
Embodiment 32. A compound according to Embodiment 8, wherein R A is a C 1 -C 3 alkanediyl group, and R B is a single bond.
[Aspect 33] The compound of the present invention wherein Ar is a C6-C10 aryl group optionally having one or more substituents selected from Group A.
[Aspect 34] The compound of the present invention, wherein Ar is a phenyl group optionally having one or more substituents selected from Group A.
[Aspect 35] The compound according to any one of Aspects 1 to 32, wherein Ar is a C6-C10 aryl group optionally having one or more substituents selected from Group A.
[Aspect 36] The compound according to any one of Aspects 1 to 32, wherein Ar is a phenyl group which may have one or more substituents selected from Group A.
[Aspect 37] In the compound of the present invention, R 3 is a C1-C3 chain hydrocarbon group {wherein the C1-C3 chain hydrocarbon group is at least one substituent selected from the group consisting of a cyano group and a halogen atom Or (C1-C3 alkoxy) C1-C3 alkyl group, benzyl group, C (O) R 8 , C (O) OR 8 or a hydrogen atom,
L 1 is a single bond, -L A -O - #, - L A -O-N = CR 7 - #, or -L B -CR 7 = N-O- # those compounds.
Aspect 38. A compound according to aspect 37 wherein R 3 is a C 1 -C 3 chain hydrocarbon group, a benzyl group, C (O) R 8 , C (O) OR 8 or a hydrogen atom.
Embodiment 39. A compound according to Embodiment 37, wherein R 3 is an allyl group, a benzyl group, C (O) CH 3 , C (O) OCH 3 or a hydrogen atom.
Aspect 40. A compound according to aspect 37 wherein R 3 is an allyl group, C (O) CH 3 , C (O) OCH 3 or a hydrogen atom.
Embodiment 41 In the compound of the present invention, R 3 is an allyl group, C (O) CH 3 , C (O) OCH 3 , or a hydrogen atom,
The compound whose L 1 is a single bond, -CH 2 -O- #, or -CH = N-O- #.
Embodiment 42 A compound according to Embodiment 41, wherein R 2 , R 4 and R 5 are the same or different and are a C1-C4 chain hydrocarbon group optionally having one or more halogen atoms.
[Mode 43] In mode 41, R 2 is a C1-C4 chain hydrocarbon group optionally having one or more halogen atoms,
The compound whose R 4 and R 5 are methyl groups.
Aspect 44. A compound according to aspect 41 wherein R 2 , R 4 and R 5 are methyl groups.
　本発明化合物Ｘの態様としては、以下の化合物が挙げられる。
〔態様４５〕本発明化合物Ｘにおいて、ＲA及びＲBの組み合わせが、ＲAがＣ１－Ｃ１０アルカンジイル基又はＣ３－Ｃ８シクロアルカンジイル基｛該Ｃ１－Ｃ１０アルカンジイル基及び該Ｃ３－Ｃ８シクロアルカンジイル基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝であり、ＲBが単結合である組み合わせ；又は、
　ＲAがシアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよいＣ１－Ｃ３アルカンジイル基であり、ＲBがシアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよいＣ３－Ｃ８シクロアルカンジイル基、フェニレン基、ナフチレン基、チエニレン基、フラニレン基、ピロリレン基、チアゾリレン基、イソチアゾリレン基、オキサゾリレン基、イソオキサゾリレン基、ピラゾリレン基、イミダゾリレン基、トリアゾリレン基、ピリジレン基、ピリダジニレン基、ピリミジニレン基、ピラジニレン基、トリアジニレン基｛該フェニレン基、該ナフチレン基、該チエニレン基、該フラニレン基、該ピロリレン基、該チアゾリレン基、該イソチアゾリレン基、該オキサゾリレン基、該イソオキサゾリレン基、該ピラゾリレン基、該イミダゾリレン基、該トリアゾリレン基、該ピリジレン基、該ピリダジニレン基、該ピリミジニレン基、該ピラジニレン基及び該トリアジニレン基は、群Ｄより選ばれる１以上の置換基を有していてもよい｝、チアジアゾリレン基、オキサジアゾリレン基又はテトラジニレン基である組み合わせである化合物。
〔態様４６〕態様４５において、Ｌ1が、単結合、－ＬA－Ｏ－＃、－ＬA－ＮＲ6－＃、－ＬA－Ｓ（Ｏ）m－＃、－ＣＲ7＝Ｎ－Ｏ－＃、又は－ＣＲ7＝Ｎ－ＮＲ6－＃である化合物。
〔態様４７〕態様４５において、Ｌ1が、単結合、－ＬA－Ｏ－＃、－ＣＨ2－ＮＲ6－＃、－ＣＨ2－Ｓ－＃、－ＣＲ7＝Ｎ－Ｏ－＃、又は－ＣＲ7＝Ｎ－ＮＲ6－＃であり、
　Ｌ2が、単結合、酸素原子、硫黄原子、Ｃ１－Ｃ３アルカンジイル基、ＮＲ15又は－Ｏ－Ｎ＝ＣＲ16－＊であり、
　ＬAが、Ｃ１－Ｃ３アルカンジイル基であり、Ｒ6、Ｒ7、Ｒ15及びＲ16が、同一又は相異なり、水素原子又はメチル基である化合物。
〔態様４８〕態様４６において、Ｒ3が、Ｃ１－Ｃ３鎖式炭化水素基｛該Ｃ１－Ｃ３鎖式炭化水素基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝、（Ｃ１－Ｃ３アルコキシ）Ｃ１－Ｃ３アルキル基、ベンジル基、Ｃ（Ｏ）Ｒ8、Ｃ（Ｏ）ＯＲ8又は水素原子である化合物。
〔態様４９〕態様４７において、Ｒ3が、Ｃ１－Ｃ３鎖式炭化水素基｛該Ｃ１－Ｃ３鎖式炭化水素基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝、（Ｃ１－Ｃ３アルコキシ）Ｃ１－Ｃ３アルキル基、ベンジル基、Ｃ（Ｏ）Ｒ8、Ｃ（Ｏ）ＯＲ8又は水素原子である化合物。
〔態様５０〕態様４６において、Ｒ3が、Ｃ１－Ｃ３鎖式炭化水素基、ベンジル基、Ｃ（Ｏ）Ｒ8、Ｃ（Ｏ）ＯＲ8又は水素原子である化合物。
〔態様５１〕態様４７において、Ｒ3が、Ｃ１－Ｃ３鎖式炭化水素基、ベンジル基、Ｃ（Ｏ）Ｒ8、Ｃ（Ｏ）ＯＲ8又は水素原子である化合物。
〔態様５２〕態様４６において、Ｒ3が、アリル基、ベンジル基、Ｃ（Ｏ）ＣＨ3、Ｃ（Ｏ）ＯＣＨ3又は水素原子である化合物。
〔態様５３〕態様４７において、Ｒ3が、アリル基、ベンジル基、Ｃ（Ｏ）ＣＨ3、Ｃ（Ｏ）ＯＣＨ3又は水素原子である化合物。
〔態様５４〕態様４６において、Ｒ3が、アリル基、Ｃ（Ｏ）ＣＨ3、Ｃ（Ｏ）ＯＣＨ3又は水素原子である化合物。
〔態様５５〕態様４７において、Ｒ3が、アリル基、Ｃ（Ｏ）ＣＨ3、Ｃ（Ｏ）ＯＣＨ3又は水素原子である化合物。
〔態様５６〕態様５５において、Ｒ2、Ｒ4及びＲ5が同一又は相異なり、１以上のハロゲン原子を有していてもよいＣ１－Ｃ４鎖式炭化水素基である化合物。
〔態様５７〕態様５５において、Ｒ2が１以上のハロゲン原子を有していてもよいＣ１－Ｃ４鎖式炭化水素基であり、
　Ｒ4及びＲ5がメチル基である化合物。
〔態様５８〕態様５５において、Ｒ2、Ｒ4及びＲ5がメチル基である化合物。
〔態様５９〕本発明化合物Ｘにおいて、ＲAがＣ１－Ｃ６アルカンジイル基又はシクロヘキサンジイル基であり、ＲBが単結合である組み合わせ；又は、
　ＲAが１以上のハロゲン原子を有していてもよいＣ１－Ｃ３アルカンジイル基であり、ＲBがフェニレン基、ナフチレン基、チエニレン基、フラニレン基、ピロリレン基、チアゾリレン基、イソチアゾリレン基、オキサゾリレン基、イソオキサゾリレン基、ピラゾリレン基、イミダゾリレン基、トリアゾリレン基、ピリジレン基、ピリダジニレン基、ピリミジニレン基、ピラジニレン基、又はトリアジニレン基｛該フェニレン基、該ナフチレン基、該チエニレン基、該フラニレン基、該ピロリレン基、該チアゾリレン基、該イソチアゾリレン基、該オキサゾリレン基、該イソオキサゾリレン基、該ピラゾリレン基、該イミダゾリレン基、該トリアゾリレン基、該ピリジレン基、該ピリダジニレン基、該ピリミジニレン基、該ピラジニレン基及び該トリアジニレン基は、群Ｄより選ばれる１以上の置換基を有していてもよい｝である組み合わせである化合物。
〔態様６０〕態様５９において、Ｌ1が、単結合、－ＬA－Ｏ－＃、－ＬA－ＮＲ6－＃、－ＬA－Ｓ（Ｏ）m－＃、－ＣＲ7＝Ｎ－Ｏ－＃又は－ＣＲ7＝Ｎ－ＮＲ6－＃である化合物。
〔態様６１〕態様５９において、Ｌ1が、単結合、－ＬA－Ｏ－＃、－ＣＨ2－ＮＲ6－＃、－ＣＨ2－Ｓ－＃、－ＣＲ7＝Ｎ－Ｏ－＃、又は－ＣＲ7＝Ｎ－ＮＲ6－＃であり、
　Ｌ2が、単結合、酸素原子、硫黄原子、Ｃ１－Ｃ３アルカンジイル基、ＮＲ15又は－Ｏ－Ｎ＝ＣＲ16－＊であり、
　ＬAが、Ｃ１－Ｃ３アルカンジイル基であり、Ｒ6、Ｒ7、Ｒ15及びＲ16が、同一又は相異なり、水素原子又はメチル基である化合物。
〔態様６２〕態様６０において、Ｒ3が、Ｃ１－Ｃ３鎖式炭化水素基｛該Ｃ１－Ｃ３鎖式炭化水素基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝、（Ｃ１－Ｃ３アルコキシ）Ｃ１－Ｃ３アルキル基、ベンジル基、Ｃ（Ｏ）Ｒ8、Ｃ（Ｏ）ＯＲ8又は水素原子である化合物。
〔態様６３〕態様６１において、Ｒ3が、Ｃ１－Ｃ３鎖式炭化水素基｛該Ｃ１－Ｃ３鎖式炭化水素基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝、（Ｃ１－Ｃ３アルコキシ）Ｃ１－Ｃ３アルキル基、ベンジル基、Ｃ（Ｏ）Ｒ8、Ｃ（Ｏ）ＯＲ8又は水素原子である化合物。
〔態様６４〕態様６０において、Ｒ3が、Ｃ１－Ｃ３鎖式炭化水素基、ベンジル基、Ｃ（Ｏ）Ｒ8、Ｃ（Ｏ）ＯＲ8又は水素原子である化合物。
〔態様６５〕態様６１において、Ｒ3が、Ｃ１－Ｃ３鎖式炭化水素基、ベンジル基、Ｃ（Ｏ）Ｒ8、Ｃ（Ｏ）ＯＲ8又は水素原子である化合物。
〔態様６６〕態様６０において、Ｒ3が、アリル基、ベンジル基、Ｃ（Ｏ）ＣＨ3、Ｃ（Ｏ）ＯＣＨ3又は水素原子である化合物。
〔態様６７〕態様６１において、Ｒ3が、アリル基、ベンジル基、Ｃ（Ｏ）ＣＨ3、Ｃ（Ｏ）ＯＣＨ3又は水素原子である化合物。
〔態様６８〕態様６０において、Ｒ3が、アリル基、Ｃ（Ｏ）ＣＨ3、Ｃ（Ｏ）ＯＣＨ3又は水素原子である化合物。
〔態様６９〕態様６１において、Ｒ3が、アリル基、Ｃ（Ｏ）ＣＨ3、Ｃ（Ｏ）ＯＣＨ3又は水素原子である化合物。
〔態様７０〕態様６９において、Ｒ2、Ｒ4及びＲ5が同一又は相異なり、１以上のハロゲン原子を有していてもよいＣ１－Ｃ４鎖式炭化水素基である化合物。
〔態様７１〕態様６９において、Ｒ2が１以上のハロゲン原子を有していてもよいＣ１－Ｃ４鎖式炭化水素基であり、
　Ｒ4及びＲ5がメチル基である化合物。
〔態様７２〕態様６９において、Ｒ2、Ｒ4及びＲ5がメチル基である化合物。
〔態様７３〕本発明化合物Ｘにおいて、ＲAがＣ１－Ｃ３アルカンジイル基であり、ＲBが単結合である組み合わせ；又は、
　ＲAが１以上のハロゲン原子を有していてもよいＣ１－Ｃ３アルカンジイル基であり、ＲBがフェニレン基又はチアゾリレン基｛該フェニレン基及び該チアゾリレン基は、群Ｄより選ばれる１以上の置換基を有していてもよい｝である組み合わせである化合物。
〔態様７４〕態様７３において、Ｌ1が、単結合、－ＬA－Ｏ－＃、－ＬA－ＮＲ6－＃、－ＬA－Ｓ（Ｏ）m－＃、－ＣＲ7＝Ｎ－Ｏ－＃、又は－ＣＲ7＝Ｎ－ＮＲ6－＃である化合物。
〔態様７５〕態様７３において、Ｌ1が、単結合、－ＬA－Ｏ－＃、－ＣＨ2－ＮＲ6－＃、－ＣＨ2－Ｓ－＃、－ＣＲ7＝Ｎ－Ｏ－＃、又は－ＣＲ7＝Ｎ－ＮＲ6－＃であり、
　Ｌ2が、単結合、酸素原子、硫黄原子、Ｃ１－Ｃ３アルカンジイル基、ＮＲ15又は－Ｏ－Ｎ＝ＣＲ16－＊であり、
　ＬAが、Ｃ１－Ｃ３アルカンジイル基であり、Ｒ6、Ｒ7、Ｒ15及びＲ16が、同一又は相異なり、水素原子又はメチル基である化合物。
〔態様７６〕態様７４において、Ｒ3が、Ｃ１－Ｃ３鎖式炭化水素基｛該Ｃ１－Ｃ３鎖式炭化水素基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝、（Ｃ１－Ｃ３アルコキシ）Ｃ１－Ｃ３アルキル基、ベンジル基、Ｃ（Ｏ）Ｒ8、Ｃ（Ｏ）ＯＲ8又は水素原子である化合物。
〔態様７７〕態様７５において、Ｒ3が、Ｃ１－Ｃ３鎖式炭化水素基｛該Ｃ１－Ｃ３鎖式炭化水素基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝、（Ｃ１－Ｃ３アルコキシ）Ｃ１－Ｃ３アルキル基、ベンジル基、Ｃ（Ｏ）Ｒ8、Ｃ（Ｏ）ＯＲ8又は水素原子である化合物。
〔態様７８〕態様７４において、Ｒ3が、Ｃ１－Ｃ３鎖式炭化水素基、ベンジル基、Ｃ（Ｏ）Ｒ8、Ｃ（Ｏ）ＯＲ8又は水素原子である化合物。
〔態様７９〕態様７５において、Ｒ3が、Ｃ１－Ｃ３鎖式炭化水素基、ベンジル基、Ｃ（Ｏ）Ｒ8、Ｃ（Ｏ）ＯＲ8又は水素原子である化合物。
〔態様８０〕態様７４において、Ｒ3が、アリル基、ベンジル基、Ｃ（Ｏ）ＣＨ3、Ｃ（Ｏ）ＯＣＨ3又は水素原子である化合物。
〔態様８１〕態様７５において、Ｒ3が、アリル基、ベンジル基、Ｃ（Ｏ）ＣＨ3、Ｃ（Ｏ）ＯＣＨ3又は水素原子である化合物。
〔態様８２〕態様７４において、Ｒ3が、アリル基、Ｃ（Ｏ）ＣＨ3、Ｃ（Ｏ）ＯＣＨ3又は水素原子である化合物。
〔態様８３〕態様７５において、Ｒ3が、アリル基、Ｃ（Ｏ）ＣＨ3、Ｃ（Ｏ）ＯＣＨ3又は水素原子である化合物。
〔態様８４〕態様８３において、Ｒ2、Ｒ4及びＲ5が同一又は相異なり、１以上のハロゲン原子を有していてもよいＣ１－Ｃ４鎖式炭化水素基である化合物。
〔態様８５〕態様８３において、Ｒ2が１以上のハロゲン原子を有していてもよいＣ１－Ｃ４鎖式炭化水素基であり、
　Ｒ4及びＲ5がメチル基である化合物。
〔態様８６〕態様８３において、Ｒ2、Ｒ4及びＲ5がメチル基である化合物。
〔態様８７〕態様４５～態様８６のいずれかにおいて、Ａｒが群Ａより選ばれる１以上の置換基を有していてもよいＣ６－Ｃ１０アリール基である化合物。
〔態様８８〕態様４５～態様８６のいずれかにおいて、Ａｒが群Ａより選ばれる１以上の置換基を有していてもよいフェニル基である化合物。 The following compounds may be mentioned as embodiments of the compound X of the present invention.
In [Mode 45] In the present invention compounds X, the combination of R A and R B is, R A is C1-C10 alkanediyl group or a C3-C8 cycloalkanediyl group {said C1-C10 alkanediyl group and said C3-C8 cycloalkyl And alkanediyl group may have one or more substituents selected from the group consisting of a cyano group and a halogen atom}, and a combination in which R B is a single bond; or
R A is one or more substituents have C1-C3 may alkanediyl group selected from the group consisting of cyano group and a halogen atom, 1 is selected from the group R B is a cyano group and a halogen atom C3-C8 cycloalkanediyl group which may have the above substituents, phenylene group, naphthylene group, thienylene group, furanylene group, pyrrolylene group, thiazolylene group, isothiazolylene group, oxazolylene group, isoxazolylene group, pyrazolylene Group, imidazolylene group, triazolylene group, pyridylene group, pyridazinylene group, pyrimidinylene group, pyrazinylene group, triazinylene group {the phenylene group, the naphthylene group, the thienylene group, the furanylene group, the pyrrolylene group, the thiazolylene group, the isothiazolylene group The oxazolylene group The sazolylene group, the pyrazolylene group, the imidazolylene group, the triazolylene group, the pyridylene group, the pyridazinylene group, the pyrimidinylene group, the pyrazinylene group and the triazinylene group have one or more substituents selected from group D. Compounds which are optionally combined, which is a thiadiazolylene group, an oxadiazolylene group or a tetradinylene group.
[Aspect 46] In Aspect 45, L 1 is a single bond, -L A -O- #, -L A -NR 6- #, -L A -S (O) m- #, -CR 7 = N- A compound wherein O- # or -CR 7 = N-NR 6- #.
[Aspect 47] In the aspect 45, L 1 is a single bond, -L A -O- #, -CH 2 -NR 6- #, -CH 2 -S- #, -CR 7 = N-O- #, Or -CR 7 = N-NR 6- #,
L 2 is a single bond, an oxygen atom, a sulfur atom, a C 1 -C 3 alkanediyl group, NR 15 or —O—N = CR 16- *,
Compounds in which L A is a C 1 -C 3 alkanediyl group, and R 6 , R 7 , R 15 and R 16 are the same or different and are a hydrogen atom or a methyl group.
[Aspect 48] In Aspect 46, R 3 is a C1-C3 chain hydrocarbon group {wherein the C1-C3 chain hydrocarbon group has one or more substituents selected from the group consisting of a cyano group and a halogen atom Compounds which may be}, (C 1 -C 3 alkoxy) C 1 -C 3 alkyl group, benzyl group, C (O) R 8 , C (O) OR 8 or hydrogen atom.
[Aspect 49] In Aspect 47, R 3 is a C1-C3 chain hydrocarbon group {The C1-C3 chain hydrocarbon group has one or more substituents selected from the group consisting of a cyano group and a halogen atom Compounds which may be}, (C 1 -C 3 alkoxy) C 1 -C 3 alkyl group, benzyl group, C (O) R 8 , C (O) OR 8 or hydrogen atom.
Aspect 50. A compound according to aspect 46 wherein R 3 is a C 1 -C 3 chain hydrocarbon group, a benzyl group, C (O) R 8 , C (O) OR 8 or a hydrogen atom.
Aspect 51. A compound according to aspect 47 wherein R 3 is a C 1 -C 3 chain hydrocarbon group, a benzyl group, C (O) R 8 , C (O) OR 8 or a hydrogen atom.
Aspect 52. A compound according to aspect 46 wherein R 3 is an allyl group, a benzyl group, C (O) CH 3 , C (O) OCH 3 or a hydrogen atom.
Aspect 53. A compound according to aspect 47 wherein R 3 is an allyl group, a benzyl group, C (O) CH 3 , C (O) OCH 3 or a hydrogen atom.
Aspect 54. A compound according to aspect 46 wherein R 3 is an allyl group, C (O) CH 3 , C (O) OCH 3 or a hydrogen atom.
55. The compound according to Aspect 47, wherein R 3 is an allyl group, C (O) CH 3 , C (O) OCH 3 or a hydrogen atom.
Embodiment 56: A compound according to Embodiment 55 wherein R 2 , R 4 and R 5 are the same or different and are a C1-C4 chain hydrocarbon group optionally having one or more halogen atoms.
[Aspect 57] In aspect 55, R 2 is a C1-C4 chain hydrocarbon group optionally having one or more halogen atoms,
The compound whose R 4 and R 5 are methyl groups.
Aspect 58. A compound according to aspect 55 wherein R 2 , R 4 and R 5 are methyl groups.
[59] A combination of the invention compound X, wherein R A is C 1 -C 6 alkanediyl group or cyclohexanediyl group, and R B is a single bond;
R A is a C1-C3 alkanediyl group which may have one or more halogen atoms, R B is a phenylene group, a naphthylene group, a thienylene group, a flanylene group, a pyrrolylene group, a thiazolylene group, an isothiazolylene group, an oxazolylene group , Isoxazolylene group, pyrazolylene group, imidazolylene group, triazolylene group, pyridylene group, pyridazinylene group, pyrimidinylene group, pyrazinylene group, or triazinylene group {the phenylene group, the naphthylene group, the thienylene group, the furanylene group, the pyrrolylene group Group, said thiazolylene group, said isothiazolylene group, said oxazolylene group, said isoxazolylene group, said pyrazolylene group, said imidazolylene group, said triazolylene group, said pyridinene group, said pyridazinylene group, said pyrimidinylene group, said pyrazinylene group and Compounds wherein the triazinylene group may have one or more substituents selected from Group D}.
Embodiment 60 In Embodiment 59, L 1 is a single bond, -L A -O- #, -L A -NR 6- #, -L A -S (O) m- #, -CR 7 = N- A compound wherein O- # or -CR 7 = N-NR 6- #.
Embodiment 61 In Embodiment 59, L 1 is a single bond, -L A -O- #, -CH 2 -NR 6- #, -CH 2 -S- #, -CR 7 = N-O- #, Or -CR 7 = N-NR 6- #,
L 2 is a single bond, an oxygen atom, a sulfur atom, a C 1 -C 3 alkanediyl group, NR 15 or —O—N = CR 16- *,
Compounds in which L A is a C 1 -C 3 alkanediyl group, and R 6 , R 7 , R 15 and R 16 are the same or different and are a hydrogen atom or a methyl group.
Embodiment 62 In embodiment 60, R 3 is a C1-C3 chain hydrocarbon group {wherein the C1-C3 chain hydrocarbon group has one or more substituents selected from the group consisting of a cyano group and a halogen atom Compounds which may be}, (C 1 -C 3 alkoxy) C 1 -C 3 alkyl group, benzyl group, C (O) R 8 , C (O) OR 8 or hydrogen atom.
[Mode 63] In mode 61, R 3 is a C1-C3 chain hydrocarbon group {The C1-C3 chain hydrocarbon group has one or more substituents selected from the group consisting of a cyano group and a halogen atom Compounds which may be}, (C 1 -C 3 alkoxy) C 1 -C 3 alkyl group, benzyl group, C (O) R 8 , C (O) OR 8 or hydrogen atom.
64. The compound according to Aspect 60, wherein R 3 is a C1-C3 chain hydrocarbon group, a benzyl group, C (O) R 8 , C (O) OR 8 or a hydrogen atom.
Aspect 65. A compound according to aspect 61 wherein R 3 is a C 1 -C 3 chain hydrocarbon group, a benzyl group, C (O) R 8 , C (O) OR 8 or a hydrogen atom.
Aspect 66. A compound according to aspect 60 wherein R 3 is an allyl group, a benzyl group, C (O) CH 3 , C (O) OCH 3 or a hydrogen atom.
67. A compound according to aspect 61 wherein R 3 is an allyl group, a benzyl group, C (O) CH 3 , C (O) OCH 3 or a hydrogen atom.
Aspect 68. A compound according to aspect 60 wherein R 3 is an allyl group, C (O) CH 3 , C (O) OCH 3 or a hydrogen atom.
Aspect 69. A compound according to aspect 61 wherein R 3 is an allyl group, C (O) CH 3 , C (O) OCH 3 or a hydrogen atom.
Aspect 70. A compound according to aspect 69 wherein R 2 , R 4 and R 5 are the same or different and are a C1-C4 chain hydrocarbon group optionally having one or more halogen atoms.
Embodiment 71 In Embodiment 69, R 2 is a C1-C4 chain hydrocarbon group optionally having one or more halogen atoms,
The compound whose R 4 and R 5 are methyl groups.
Aspect 72. A compound according to aspect 69 wherein R 2 , R 4 and R 5 are methyl groups.
[Mode 73] a combination of the present compound X, wherein R A is a C 1 -C 3 alkanediyl group, and R B is a single bond; or
R A is a C1-C3 alkanediyl group which may have one or more halogen atoms, R B is a phenylene group or a thiazolylene group {the phenylene group and the thiazolylene group are one or more selected from group D The compound which is a combination which is optionally substituted}.
Embodiment 74 In embodiment 73, L 1 is a single bond, -L A -O- #, -L A -NR 6- #, -L A -S (O) m- #, -CR 7 = N- A compound wherein O- # or -CR 7 = N-NR 6- #.
[Mode 75] In mode 73, L 1 is a single bond, -L A -O- #, -CH 2 -NR 6- #, -CH 2 -S- #, -CR 7 = N-O- #, Or -CR 7 = N-NR 6- #,
L 2 is a single bond, an oxygen atom, a sulfur atom, a C 1 -C 3 alkanediyl group, NR 15 or —O—N = CR 16- *,
Compounds in which L A is a C 1 -C 3 alkanediyl group, and R 6 , R 7 , R 15 and R 16 are the same or different and are a hydrogen atom or a methyl group.
[Aspect 76] In the aspect 74, R 3 is a C1-C3 chain hydrocarbon group {The C1-C3 chain hydrocarbon group has one or more substituents selected from the group consisting of a cyano group and a halogen atom Compounds which may be}, (C 1 -C 3 alkoxy) C 1 -C 3 alkyl group, benzyl group, C (O) R 8 , C (O) OR 8 or hydrogen atom.
[Aspect 77] In the aspect 75, R 3 is a C1-C3 chain hydrocarbon group {wherein the C1-C3 chain hydrocarbon group has one or more substituents selected from the group consisting of a cyano group and a halogen atom Compounds which may be}, (C 1 -C 3 alkoxy) C 1 -C 3 alkyl group, benzyl group, C (O) R 8 , C (O) OR 8 or hydrogen atom.
Aspect 78. A compound according to aspect 74 wherein R 3 is a C 1 -C 3 chain hydrocarbon group, a benzyl group, C (O) R 8 , C (O) OR 8 or a hydrogen atom.
Aspect 79. A compound according to aspect 75 wherein R 3 is a C 1 -C 3 chain hydrocarbon group, a benzyl group, C (O) R 8 , C (O) OR 8 or a hydrogen atom.
Aspect 80. A compound according to aspect 74 wherein R 3 is an allyl group, a benzyl group, C (O) CH 3 , C (O) OCH 3 or a hydrogen atom.
Embodiment 81. A compound according to Embodiment 75 wherein R 3 is an allyl group, a benzyl group, C (O) CH 3 , C (O) OCH 3 or a hydrogen atom.
Aspect 82. A compound according to aspect 74 wherein R 3 is an allyl group, C (O) CH 3 , C (O) OCH 3 or a hydrogen atom.
Aspect 83. A compound according to aspect 75 wherein R 3 is an allyl group, C (O) CH 3 , C (O) OCH 3 or a hydrogen atom.
Embodiment 84. A compound according to embodiment 83, wherein R 2 , R 4 and R 5 are the same or different and are a C1-C4 chain hydrocarbon group optionally having one or more halogen atoms.
[Aspect 85] In aspect 83, R 2 is a C1-C4 chain hydrocarbon group optionally having one or more halogen atoms,
The compound whose R 4 and R 5 are methyl groups.
Aspect 86. A compound according to aspect 83 wherein R 2 , R 4 and R 5 are methyl groups.
[Aspect 87] The compound according to any of Aspects 45 to 86, wherein Ar is a C6-C10 aryl group optionally having one or more substituents selected from Group A.
[88] The compound according to any one of Embodiments 45 to 86, wherein Ar is a phenyl group optionally having one or more substituents selected from Group A.
　次に、本発明化合物Ｘの製造法について説明する。 Next, the process for producing the compound X of the present invention is described.
製造法１
　式（Ｉｂ）で示される化合物（以下、化合物（Ｉｂ）と記す）は、式（Ｉａ）で示される化合物（以下、化合物（Ｉａ）と記す）と式（Ｒ－１）で示される化合物（以下、化合物（Ｒ－１）と記す）とを塩基の存在下で反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-C000003
 ［式中、Ｒ3aはＣ１－Ｃ３鎖式炭化水素基｛該Ｃ１－Ｃ３鎖式炭化水素基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝、（Ｃ１－Ｃ３アルコキシ）Ｃ１－Ｃ３アルキル基又は群Ａより選ばれる１以上の置換基を有していてもよいベンジル基を表し、Ｘ1は塩素原子、臭素原子、ヨウ素原子、Ｃ１－Ｃ１０ペルフルオロアルカンスルホニルオキシ基又はトシルオキシ基を表し、その他の記号は前記と同じ意味を表す。］
　反応は、通常溶媒中で行われる。反応に用いられる溶媒としては、例えば、ヘキサン、トルエン、キシレン等の炭化水素（以下、炭化水素類と記す）；ジエチルエーテル、エチレングリコールジメチルエーテル、メチルｔｅｒｔ－ブチルエーテル（以下、ＭＴＢＥと記す）、テトラヒドロフラン（以下、ＴＨＦと記す）等のエーテル（以下、エーテル類と記す）；クロロホルム、クロロベンゼン等のハロゲン化炭化水素（以下、ハロゲン化炭化水素類と記す）；ジメチルホルムアミド（以下、ＤＭＦと記す）、Ｎ－メチルピロリドン、ジメチルスルホキシド等の非プロトン性極性溶媒（以下、非プロトン性極性溶媒と記す）；酢酸エチル等のエステル（以下、エステル類と記す）及びこれらの混合物が挙げられる。
　反応に用いられる塩基としては、例えば炭酸ナトリウム、炭酸カリウム等のアルカリ金属炭酸塩（以下、アルカリ金属炭酸塩類と記す）；トリエチルアミン、ピリジン等の有機塩基（以下、有機塩基類と記す）が挙げられる。
　反応には、化合物（Ｉａ）１モルに対して、化合物（Ｒ－１）が通常１モル～１０モルの割合、塩基が通常１モル～１０モルの割合で用いられる。
　反応時間は、通常５分間～７２時間の範囲である。反応温度は、通常－２０℃～１２０℃の範囲である。
　反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより化合物（Ｉｂ）を単離することができる。
　化合物（Ｒ－１）は、市販の化合物であるか、公知の方法に準じて製造することができる。 Manufacturing method 1
The compound represented by the formula (Ib) (hereinafter referred to as compound (Ib)) is a compound represented by the formula (Ia) (hereinafter referred to as compound (Ia)) and the compound represented by the formula (R-1) Hereinafter, the compound (R-1) can be produced by reacting in the presence of a base.
Figure JPOXMLDOC01-appb-C000003
 [Wherein, R 3a is a C1-C3 chain hydrocarbon group {the C1-C3 chain hydrocarbon group may have one or more substituents selected from the group consisting of a cyano group and a halogen atom And (C 1 -C 3 alkoxy) C 1 -C 3 alkyl group or benzyl group optionally having one or more substituents selected from group A, X 1 represents a chlorine atom, a bromine atom, an iodine atom, C 1- C10 perfluoroalkanesulfonyloxy group or tosyloxy group is represented, and the other symbols are as defined above. ]
The reaction is usually carried out in a solvent. Examples of the solvent used for the reaction include hydrocarbons such as hexane, toluene and xylene (hereinafter referred to as hydrocarbons); diethyl ether, ethylene glycol dimethyl ether, methyl tert-butyl ether (hereinafter referred to as MTBE), and tetrahydrofuran Hereinafter, ethers such as THF) (hereinafter referred to as ethers); halogenated hydrocarbons such as chloroform and chlorobenzene (hereinafter referred to as halogenated hydrocarbons); dimethylformamide (hereinafter referred to as DMF), N Aprotic polar solvents such as methyl pyrrolidone and dimethyl sulfoxide (hereinafter referred to as aprotic polar solvents); esters such as ethyl acetate (hereinafter referred to as esters) and mixtures thereof.
Examples of the base used for the reaction include alkali metal carbonates such as sodium carbonate and potassium carbonate (hereinafter referred to as alkali metal carbonates); organic bases such as triethylamine and pyridine (hereinafter referred to as organic bases) .
In the reaction, the compound (R-1) is used in a proportion of usually 1 mol to 10 mol and the base is usually used in a proportion of 1 mol to 10 mol based on 1 mol of the compound (Ia).
The reaction time is usually in the range of 5 minutes to 72 hours. The reaction temperature is usually in the range of -20 ° C to 120 ° C.
After completion of the reaction, compound (Ib) can be isolated by post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
The compound (R-1) is a commercially available compound or can be produced according to a known method.
製造法２
　式（Ｉｃ）で示される化合物（以下、化合物（Ｉｃ）と記す）は、化合物（Ｉａ）と式（Ｒ－２）で示される化合物（以下、化合物（Ｒ－２）と記す）とを、塩基の存在下で反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-C000004
 ［式中、Ｒ3bはＣ（Ｏ）Ｒ8又はＣ（Ｏ）ＯＲ8を表し、その他の記号は前記と同じ意味を表す。］
　反応は、通常溶媒中で行われる。反応に用いられる溶媒としては、例えば炭化水素類、エーテル類、ハロゲン化炭化水素類、非プロトン性極性溶媒、エステル類及びこれらの混合物が挙げられる。
　反応に用いられる塩基としては、例えばアルカリ金属炭酸塩類及び有機塩基類が挙げられる。
　反応には、化合物（Ｉａ）１モルに対して、化合物（Ｒ－２）が通常１モル～１０モルの割合で、塩基が通常１モル～１０モルの割合で用いられる。
　反応時間は、通常５分間～２４時間の範囲である。反応温度は、通常－２０℃～１００℃の範囲である。
　反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより化合物（Ｉｃ）を単離することができる。
　化合物（Ｒ－２）は市販の化合物であるか、公知の方法に準じて製造することができる。 Manufacturing method 2
The compound represented by the formula (Ic) (hereinafter referred to as compound (Ic)) is a compound (Ia) and the compound represented by the formula (R-2) (hereinafter referred to as compound (R-2)) It can be produced by reacting in the presence of a base.
Figure JPOXMLDOC01-appb-C000004
 [Wherein, R 3b represents C (O) R 8 or C (O) OR 8 , and the other symbols have the same meanings as described above. ]
The reaction is usually carried out in a solvent. Examples of the solvent used for the reaction include hydrocarbons, ethers, halogenated hydrocarbons, aprotic polar solvents, esters and mixtures thereof.
As a base used for reaction, an alkali metal carbonate and organic bases are mentioned, for example.
In the reaction, the compound (R-2) is usually used in a proportion of 1 mol to 10 mol and the base is usually used in a proportion of 1 mol to 10 mol with respect to 1 mol of the compound (Ia).
The reaction time is usually in the range of 5 minutes to 24 hours. The reaction temperature is usually in the range of −20 ° C. to 100 ° C.
After completion of the reaction, compound (Ic) can be isolated by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
The compound (R-2) is a commercially available compound or can be produced according to a known method.
製造法３
　式（Ｉｄ）で示される化合物（以下、化合物（Ｉｄ）と記す）は、化合物（Ｉａ）と式（Ｒ－３）で示される化合物（以下、化合物（Ｒ－３）と記す）とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-C000005
 ［式中、記号は前記と同じ意味を表す。］
　反応は、無溶媒又は溶媒中で行われる。反応に用いられる溶媒としては、例えば炭化水素類、エーテル類、ハロゲン化炭化水素類、非プロトン性極性溶媒、エステル類及びこれらの混合物が挙げられる。
　反応には必要に応じて塩基を用いてもよい。反応に用いられる塩基としては、例えば有機塩基類が挙げられる。
　反応には、化合物（Ｉａ）１モルに対して、化合物（Ｒ－３）が通常１モル～１００モルの割合で用いられる。
　塩基が用いられる場合、化合物（Ｉａ）１モルに対して、塩基が通常１モル～１０モルの割合で用いられる。
　反応時間は、通常５分間～７２時間の範囲である。反応温度は、通常－２０℃～１８０℃の範囲である。
　反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより化合物（Ｉｄ）を単離することができる。
　化合物（Ｒ－３）は市販の化合物であるか、公知の方法に準じて製造することができる。 Manufacturing method 3
The compound represented by the formula (Id) (hereinafter referred to as a compound (Id)) is a compound of the compound (Ia) and the compound represented by the formula (R-3) (hereinafter referred to as a compound (R-3)) It can be manufactured by
Figure JPOXMLDOC01-appb-C000005
 [Wherein, the symbols have the same meanings as described above. ]
The reaction is carried out without solvent or in a solvent. Examples of the solvent used for the reaction include hydrocarbons, ethers, halogenated hydrocarbons, aprotic polar solvents, esters and mixtures thereof.
You may use a base for reaction as needed. As a base used for reaction, organic bases are mentioned, for example.
In the reaction, the compound (R-3) is usually used in a proportion of 1 mol to 100 mol, relative to 1 mol of the compound (Ia).
When a base is used, the base is usually used in a proportion of 1 mole to 10 moles relative to 1 mole of the compound (Ia).
The reaction time is usually in the range of 5 minutes to 72 hours. The reaction temperature is usually in the range of −20 ° C. to 180 ° C.
After completion of the reaction, water is added to the reaction mixture, extraction is performed with an organic solvent, and the organic layer is subjected to post-treatment operations such as drying and concentration to isolate the compound (Id).
The compound (R-3) is a commercially available compound or can be produced according to a known method.
製造法４
　式（Ｉｅ）で示される化合物（以下、化合物（Ｉｅ）と記す）は、化合物（Ｉａ）と式（Ｒ－４）で示される化合物（以下、化合物（Ｒ－４）と記す）とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-C000006
 ［式中、記号は前記と同じ意味を表す。］
　反応は、通常溶媒中で行われる。反応に用いられる溶媒としては、例えば炭化水素類、エーテル類、ハロゲン化炭化水素類、非プロトン性極性溶媒、エステル類及びこれらの混合物が挙げられる。
　反応には必要に応じて塩基を用いてもよい。反応に用いられる塩基としては、例えば炭酸水素ナトリウム、炭酸水素カリウム等のアルカリ金属炭酸水素塩（以下、アルカリ金属炭酸水素塩類と記す）；及び有機塩基類が挙げられる。
　反応には、化合物（Ｉａ）１モルに対して、化合物（Ｒ－４）が通常１モル～１０モルの割合で用いられる。
　塩基が用いられる場合、化合物（Ｉａ）１モルに対して、塩基が通常１モル～１０モルの割合で用いられる。
　反応時間は、通常５分間～７２時間の範囲である。反応温度は、通常－２０℃～８０℃の範囲である。
　反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより化合物（Ｉｅ）を単離することができる。
　化合物（Ｒ－４）は市販の化合物である。 Manufacturing method 4
The compound represented by the formula (Ie) (hereinafter referred to as compound (Ie)) is a compound of the compound (Ia) and the compound represented by the formula (R-4) (hereinafter referred to as compound (R-4)) It can be manufactured by
Figure JPOXMLDOC01-appb-C000006
 [Wherein, the symbols have the same meanings as described above. ]
The reaction is usually carried out in a solvent. Examples of the solvent used for the reaction include hydrocarbons, ethers, halogenated hydrocarbons, aprotic polar solvents, esters and mixtures thereof.
You may use a base for reaction as needed. Examples of the base used in the reaction include alkali metal hydrogen carbonates such as sodium hydrogen carbonate and potassium hydrogen carbonate (hereinafter referred to as alkali metal hydrogen carbonates); and organic bases.
In the reaction, the compound (R-4) is usually used in a proportion of 1 mole to 10 moles relative to 1 mole of the compound (Ia).
When a base is used, the base is usually used in a proportion of 1 mole to 10 moles relative to 1 mole of the compound (Ia).
The reaction time is usually in the range of 5 minutes to 72 hours. The reaction temperature is usually in the range of −20 ° C. to 80 ° C.
After completion of the reaction, compound (Ie) can be isolated by post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
The compound (R-4) is a commercially available compound.
製造法５
　式（Ｉｇ）で示される化合物（以下、化合物（Ｉｇ）と記す）は、式（Ｉｆ）で示される化合物（以下、化合物（Ｉｆ）と記す）と酸化剤とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-C000007
 ［式中、記号は前記と同じ意味を表す。］
　反応は、通常溶媒中で行われる。反応に用いられる溶媒としては、例えばハロゲン化炭化水素類；アセトニトリル等のニトリル（以下、ニトリル類と記す）；エステル類；メタノール、エタノール等のアルコール（以下、アルコール類と記す）；酢酸；水及びこれらの混合物が挙げられる。
　反応に用いられる酸化剤としては、例えば過ヨウ素酸ナトリウム、ｍ－クロロ過安息香酸（以下、ｍＣＰＢＡと記す）及び過酸化水素が挙げられる。
　酸化剤として過酸化水素を用いる場合は、必要に応じて炭酸ナトリウム又は触媒を用いてもよい。
　反応に用いられる触媒としては、例えばタングステン酸及びタングステン酸ナトリウムが挙げられる。
　反応には、化合物（Ｉｆ）１モルに対して、酸化剤が通常１モル～１０モルの割合で用いられる。
　炭酸ナトリウムが用いられる場合、化合物（Ｉｆ）１モルに対して、炭酸ナトリウムが通常０．０１モル～１モルの割合で用いられる。触媒が用いられる場合、化合物（Ｉｆ）１モルに対して、触媒が通常０．０１～０．５モルの割合で用いられる。
　反応時間は、通常５分間～２４時間の範囲である。反応温度は、通常－２０℃～８０℃の範囲である。
　反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を必要に応じて還元剤（例えば亜硫酸ナトリウム、チオ硫酸ナトリウム）の水溶液及び塩基（例えば炭酸水素ナトリウム）の水溶液で洗浄し、得られた有機層を乾燥、濃縮することにより、化合物（Ｉｇ）を単離することができる。 Manufacturing method 5
A compound represented by the formula (Ig) (hereinafter referred to as a compound (Ig)) is produced by reacting a compound represented by the formula (If) (hereinafter referred to as a compound (If)) with an oxidizing agent. Can.
Figure JPOXMLDOC01-appb-C000007
 [Wherein, the symbols have the same meanings as described above. ]
The reaction is usually carried out in a solvent. Examples of solvents used for the reaction include halogenated hydrocarbons; nitriles such as acetonitrile (hereinafter referred to as nitriles); esters; alcohols such as methanol and ethanol (hereinafter referred to as alcohols); acetic acid; These mixtures are mentioned.
Examples of the oxidizing agent used for the reaction include sodium periodate, m-chloroperbenzoic acid (hereinafter referred to as mCPBA) and hydrogen peroxide.
When hydrogen peroxide is used as the oxidizing agent, sodium carbonate or a catalyst may be used as needed.
As a catalyst used for reaction, tungstic acid and sodium tungstate are mentioned, for example.
In the reaction, the oxidizing agent is usually used in a proportion of 1 mole to 10 moles relative to 1 mole of the compound (If).
When sodium carbonate is used, sodium carbonate is usually used in a ratio of 0.01 mol to 1 mol with respect to 1 mol of compound (If). When a catalyst is used, the catalyst is usually used in a proportion of 0.01 to 0.5 mol per 1 mol of compound (If).
The reaction time is usually in the range of 5 minutes to 24 hours. The reaction temperature is usually in the range of −20 ° C. to 80 ° C.
After completion of the reaction, water is added to the reaction mixture, extraction is performed with an organic solvent, and the organic layer is washed with an aqueous solution of a reducing agent (eg, sodium sulfite, sodium thiosulfate) and an aqueous solution of a base (eg, sodium hydrogencarbonate) as necessary. Then, the compound (Ig) can be isolated by drying and concentrating the obtained organic layer.
製造法６
　化合物（Ｉａ）は、式（Ｉｈ）で示される化合物（以下、化合物（Ｉｈ）と記す）、パラジウム触媒及び塩基とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-C000008
 ［式中、Ｒ30は２－プロペニル基又は２－ブテニル基を表し、その他の記号は前記と同じ意味を表す。］
　反応は、通常溶媒中で行われる。反応に用いられる溶媒としては、例えば脂肪族ハロゲン化炭化水素類、アルコール類、非プロトン性極性溶媒、エステル類、エーテル類、酢酸、水及びこれらの混合物が挙げられる。
　反応に用いられる塩基としては、例えばアルカリ金属炭酸塩類及び有機塩基類が挙げられる。
　反応に用いられるパラジウム触媒としては、例えばテトラキス（トリフェニルホスフィン）パラジウム（０）及びジベンジリデンアセトンパラジウム（０）が挙げられる。
　反応には、化合物（Ｉｈ）１モルに対して、パラジウム触媒が通常０．０１～０．５モルの割合で、塩基が通常１モル～１０モルの割合で用いられる。
　反応時間は、通常５分間～２４時間の範囲である。反応温度は、通常－２０℃～８０℃の範囲である。
　反応終了後は、反応混合物に水を加え、化合物（Ｉａ）が析出する場合には固体をろ取する；有機溶媒で抽出する等の後処理操作を行うことにより、化合物（Ｉａ）を単離することができる。 Manufacturing method 6
Compound (Ia) can be produced by reacting a compound represented by the formula (Ih) (hereinafter referred to as compound (Ih)), a palladium catalyst and a base.
Figure JPOXMLDOC01-appb-C000008
 [Wherein, R 30 represents a 2-propenyl group or 2-butenyl group, and the other symbols have the same meanings as described above. ]
The reaction is usually carried out in a solvent. Examples of the solvent used for the reaction include aliphatic halogenated hydrocarbons, alcohols, aprotic polar solvents, esters, ethers, acetic acid, water and mixtures thereof.
As a base used for reaction, an alkali metal carbonate and organic bases are mentioned, for example.
As a palladium catalyst used for reaction, tetrakis (triphenyl phosphine) palladium (0) and dibenzylidene acetone palladium (0) are mentioned, for example.
In the reaction, the palladium catalyst is usually used in a proportion of 0.01 to 0.5 mol and the base is usually used in a proportion of 1 to 10 mol per 1 mol of the compound (Ih).
The reaction time is usually in the range of 5 minutes to 24 hours. The reaction temperature is usually in the range of −20 ° C. to 80 ° C.
After completion of the reaction, water is added to the reaction mixture, and when compound (Ia) precipitates, the solid is filtered off; compound (Ia) is isolated by post-treatment operation such as extraction with an organic solvent can do.
製造法７
　式（Ｉｉ）で示される化合物（以下、化合物（Ｉｉ）と記す）は、式（Ｍ－１）で示される化合物（以下、化合物（Ｍ－１）と記す）と式（Ｒ－５）で示される化合物（以下、化合物（Ｒ－５）と記す）とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-C000009
 ［式中、Ｒ31は２－プロペニル基、２－ブテニル基又はベンジル基を表し、ＲCはＣ１－Ｃ８アルカンジイル基、Ｃ２－Ｃ８アルケンジイル基、エチンジイル基、Ｃ３－Ｃ８アルキンジイル基、Ｃ３－Ｃ８シクロアルカンジイル基又はＣ３－Ｃ８シクロアルケンジイル基｛該Ｃ１－Ｃ８アルカンジイル基、該Ｃ２－Ｃ８アルケンジイル基、該Ｃ３－Ｃ８アルキンジイル基、該Ｃ３－Ｃ８シクロアルカンジイル基及び該Ｃ３－Ｃ８シクロアルケンジイル基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝を表し、その他の記号は前記と同じ意味を表す。］
　反応は通常溶媒中で行われる。反応に用いられる溶媒としては、例えばエーテル類、炭化水素類、ハロゲン化炭化水素類及びこれらの混合物が挙げられる。
　反応には、化合物（Ｍ－１）１モルに対して、化合物（Ｒ－５）が通常１モル～１０モルの割合で用いられる。
　反応時間は、通常５分間～２４時間の範囲である。反応温度は、通常－２０℃～８０℃の範囲である。
　反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物（Ｉｉ）を単離することができる。
　化合物（Ｒ－５）は、市販の化合物であるか、例えばOrganic Letters, 2014, 16, 6424.に記載の方法に準じて製造することができる。 Manufacturing method 7
The compound represented by the formula (Ii) (hereinafter referred to as a compound (Ii)) is a compound represented by the formula (M-1) (hereinafter referred to as a compound (M-1)) and the compound represented by the formula (R-5) It can be produced by reacting the compound shown below (hereinafter referred to as compound (R-5)).
Figure JPOXMLDOC01-appb-C000009
 [Wherein, R 31 represents a 2-propenyl group, 2-butenyl group or benzyl group, R C represents a C 1 -C 8 alkanediyl group, a C 2 -C 8 alkene diyl group, an ethynediyl group, a C 3 -C 8 alkyl diyl group, a C 3 -C 8 Cycloalkanediyl group or C3-C8 cycloalkene diyl group {The C1-C8 alkanediyl group, the C2-C8 alkene diyl group, the C3-C8 alkyndiyl group, the C3-C8 cycloalkanediyl group, and the C3-C8 cycloalkene The diyl group may have one or more substituents selected from the group consisting of a cyano group and a halogen atom}, and the other symbols have the same meanings as described above. ]
The reaction is usually carried out in a solvent. Examples of the solvent used for the reaction include ethers, hydrocarbons, halogenated hydrocarbons and mixtures thereof.
In the reaction, the compound (R-5) is usually used in a proportion of 1 mole to 10 moles relative to 1 mole of the compound (M-1).
The reaction time is usually in the range of 5 minutes to 24 hours. The reaction temperature is usually in the range of −20 ° C. to 80 ° C.
After completion of the reaction, compound (Ii) can be isolated by post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, drying and concentration of the organic layer, and the like.
The compound (R-5) is a commercially available compound or can be produced, for example, according to the method described in Organic Letters, 2014, 16, 6424.
製造法８
　式（Ｉｋ）で示される化合物（以下、化合物（Ｉｋ）と記す）は、化合物（Ｍ－１）と式（Ｒ－６）で示される化合物（以下、化合物（Ｒ－６）と記す）とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-C000010
 ［式中、記号は前記と同じ意味を表す。］
　反応は通常溶媒中で行われる。反応に用いられる溶媒としては、例えばエーテル類、ハロゲン化炭化水素類、アルコール類、非プロトン性極性溶媒、エステル類及びこれらの混合物が挙げられる。
　化合物（Ｒ－６）は、塩酸塩等の塩を形成していてもよい。
　反応は、必要に応じて塩基を用いてもよい。反応に用いられる塩基としては、例えば有機塩基類が挙げられる。
　反応には、化合物（Ｍ－１）１モルに対して、化合物（Ｒ－６）が通常１モル～１０モルの割合で用いられる。
　塩基が用いられる場合、化合物（Ｍ－１）１モルに対して、通常１モル～１０モルの割合で用いられる。
　反応時間は、通常５分間～２４時間の範囲である。反応温度は、通常２０℃～１００℃の範囲である。
　反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物（Ｉｋ）を単離することができる。
　化合物（Ｒ－６）は、市販の化合物であるか、例えばJournal of Medicinal Chemistry, 2007, 50, 6367.に記載の方法に準じて製造することができる。 Manufacturing method 8
The compound represented by the formula (Ik) (hereinafter referred to as the compound (Ik)) is a compound (M-1) and the compound represented by the formula (R-6) (hereinafter referred to as the compound (R-6)) Can be produced by reacting
Figure JPOXMLDOC01-appb-C000010
 [Wherein, the symbols have the same meanings as described above. ]
The reaction is usually carried out in a solvent. Examples of the solvent used for the reaction include ethers, halogenated hydrocarbons, alcohols, aprotic polar solvents, esters and mixtures thereof.
The compound (R-6) may form a salt such as hydrochloride.
The reaction may use a base as necessary. As a base used for reaction, organic bases are mentioned, for example.
In the reaction, the compound (R-6) is usually used in a proportion of 1 mole to 10 moles relative to 1 mole of the compound (M-1).
When a base is used, it is generally used in a proportion of 1 mole to 10 moles relative to 1 mole of the compound (M-1).
The reaction time is usually in the range of 5 minutes to 24 hours. The reaction temperature is usually in the range of 20 ° C to 100 ° C.
After completion of the reaction, compound (Ik) can be isolated by post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, drying and concentrating the organic layer, and the like.
Compound (R-6) is a commercially available compound or can be produced, for example, according to the method described in Journal of Medicinal Chemistry, 2007, 50, 6367.
製造法９
　式（Ｉｐ）で示される化合物（以下、化合物（Ｉｐ）と記す）は、化合物（Ｍ－１）と式（Ｒ－１３）で示される化合物（以下、化合物（Ｒ－１３）と記す）とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-C000011
 ［式中、記号は前記と同じ意味を表す。］
　反応は通常溶媒中で行われる。反応に用いられる溶媒としては、例えばエーテル類、ハロゲン化炭化水素類、アルコール類、非プロトン性極性溶媒、エステル類及びこれらの混合物が挙げられる。
　化合物（Ｒ－１３）は、塩酸塩等の塩を形成していてもよい。
　反応は、必要に応じて塩基を用いてもよい。反応に用いられる塩基としては、例えば有機塩基類が挙げられる。
　反応には、化合物（Ｍ－１）１モルに対して、化合物（Ｒ－１３）が通常１モル～１０モルの割合で用いられる。
　塩基が用いられる場合、化合物（Ｍ－１）１モルに対して、通常１モル～１０モルの割合で用いられる。
　反応時間は、通常５分間～２４時間の範囲である。反応温度は、通常２０℃～１００℃の範囲である。
　反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物（Ｉｐ）を単離することができる。
　化合物（Ｒ－１３）は、市販の化合物であるか、例えばJournal of Medicinal Chemistry, 2010, 53, 6301.に記載の方法に準じて製造することができる。 Manufacturing method 9
The compound represented by the formula (Ip) (hereinafter referred to as a compound (Ip)) is a compound (M-1) and the compound represented by the formula (R-13) (hereinafter referred to as a compound (R-13)) Can be produced by reacting
Figure JPOXMLDOC01-appb-C000011
 [Wherein, the symbols have the same meanings as described above. ]
The reaction is usually carried out in a solvent. Examples of the solvent used for the reaction include ethers, halogenated hydrocarbons, alcohols, aprotic polar solvents, esters and mixtures thereof.
The compound (R-13) may form a salt such as hydrochloride.
The reaction may use a base as necessary. As a base used for reaction, organic bases are mentioned, for example.
In the reaction, the compound (R-13) is usually used in a proportion of 1 mole to 10 moles relative to 1 mole of the compound (M-1).
When a base is used, it is generally used in a proportion of 1 mole to 10 moles relative to 1 mole of the compound (M-1).
The reaction time is usually in the range of 5 minutes to 24 hours. The reaction temperature is usually in the range of 20 ° C to 100 ° C.
After completion of the reaction, compound (Ip) can be isolated by post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, drying and concentration of the organic layer, and the like.
The compound (R-13) is a commercially available compound or can be produced, for example, according to the method described in Journal of Medicinal Chemistry, 2010, 53, 6301.
製造法１０
　式（Ｉｍ）で示される化合物（以下、化合物（Ｉｍ）と記す）は、式（Ｍ－２）で示される化合物（以下、化合物（Ｍ－２）と記す）、式（Ｒ－７）で示される化合物（以下、化合物（Ｒ－７）と記す）及び塩基を反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-C000012
 ［式中、Ｘ２は、塩素原子又は臭素原子を表し、Ｌ3は、酸素原子、－ＮＲ6－、－Ｓ（Ｏ）m－又は－Ｏ－Ｎ＝ＣＲ7－＃を表し、その他の記号は前記と同じ意味を表す。］
　反応は、通常溶媒中で行われる。反応に用いられる溶媒としては、例えば炭化水素類、エーテル類、ハロゲン化炭化水素類、非プロトン性極性溶媒、エステル類及びこれらの混合物が挙げられる。
　反応に用いられる塩基としては、例えば水素化ナトリウム、アルカリ金属炭酸塩類及び有機塩基類が挙げられる。
　反応には、化合物（Ｍ－２）１モルに対して、化合物（Ｒ－７）が通常１モル～１０モルの割合で、塩基が通常１モル～１０モルの割合で用いられる。
　反応時間は、通常５分間～２４時間の範囲である。反応温度は、通常－２０℃～１００℃の範囲である。
　反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより化合物（Ｉｍ）を単離することができる。
　化合物（Ｒ－７）は、市販の化合物であるか、公知の方法に準じて製造することができる。 Manufacturing method 10
The compound represented by the formula (Im) (hereinafter referred to as a compound (Im)) is a compound represented by the formula (M-2) (hereinafter referred to as a compound (M-2)), a compound represented by the formula (R-7) It can be produced by reacting the compound shown below (hereinafter referred to as compound (R-7)) and a base.
Figure JPOXMLDOC01-appb-C000012
 Wherein, X 2 represents a chlorine atom or a bromine atom, L 3 represents an oxygen atom, -NR 6 -, - S ( O) m - or -O-N = CR 7 - represents #, other The symbols have the same meaning as described above. ]
The reaction is usually carried out in a solvent. Examples of the solvent used for the reaction include hydrocarbons, ethers, halogenated hydrocarbons, aprotic polar solvents, esters and mixtures thereof.
Examples of the base used for the reaction include sodium hydride, alkali metal carbonates and organic bases.
In the reaction, the compound (R-7) is usually used in a proportion of 1 mol to 10 mol and the base is usually used in a proportion of 1 mol to 10 mol with respect to 1 mol of the compound (M-2).
The reaction time is usually in the range of 5 minutes to 24 hours. The reaction temperature is usually in the range of −20 ° C. to 100 ° C.
After completion of the reaction, water is added to the reaction mixture, extraction is performed with an organic solvent, and the organic layer is subjected to post-treatment operations such as drying and concentration to isolate the compound (Im).
Compound (R-7) is a commercially available compound or can be produced according to a known method.
製造法１１
　式（Ｉｎ）で示される化合物（以下、化合物（Ｉｎ）と記す）は、式（Ｍ－３）で示される化合物（以下、化合物（Ｍ－３）と記す）、式（Ｒ－８）で示される化合物（以下、化合物（Ｒ－８）と記す）及び塩基を反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-C000013
 ［式中、記号は前記と同じ意味を表す。］
　反応は、化合物（Ｍ－２）に代えて化合物（Ｒ－８）を、化合物（Ｒ－７）に代えて化合物（Ｍ－３）を用いて、製造法１０に準じて実施することができる。
　化合物（Ｒ－８）は、市販の化合物であるか、公知の方法に準じて製造することができる。 Manufacturing method 11
The compound represented by the formula (In) (hereinafter referred to as a compound (In)) is a compound represented by the formula (M-3) (hereinafter referred to as a compound (M-3)), a compound represented by the formula (R-8) It can be produced by reacting a compound shown below (hereinafter referred to as compound (R-8)) and a base.
Figure JPOXMLDOC01-appb-C000013
 [Wherein, the symbols have the same meanings as described above. ]
The reaction can be carried out according to production method 10, using compound (R-3) instead of compound (M-2) and using compound (M-3) instead of compound (R-7). .
Compound (R-8) is a commercially available compound or can be produced according to a known method.
製造法１２
　式（Ｉｑ）で示される化合物（以下、化合物（Ｉｑ）と記す）は、化合物（Ｍ－２）、式（Ｒ－１４）で示される化合物（以下、化合物（Ｒ－１４）と記す）、金属触媒及び塩基を反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-C000014
 ［式中、Ｍ１はＢ（ＯＲ33）2又は４，４，５，５－テトラメチル－１，３，２－ジオキサボロラン－２－イル基を表し、Ｒ33は水素原子又はＣ１－Ｃ６アルキル基を表し、その他の記号は前記と同じ意味を表す。］
　反応は、通常溶媒中で行われる。反応に用いられる溶媒としては、例えばエーテル類、炭化水素類、非プロトン性極性溶媒、水及びこれらの混合物が挙げられる。
　反応に用いられる金属触媒としては、例えばテトラキス（トリフェニルホスフィン）パラジウム（０）、１，１’－ビス（ジフェニルホスフィノ）フェロセンパラジウム（ＩＩ）ジクロリド、トリス（ジベンジリデンアセトン）ジパラジウム（０）、酢酸パラジウム（ＩＩ）等のパラジウム触媒、及びビス（シクロオクタジエン）ニッケル（０）が挙げられる。
　反応に用いられる塩基としては、例えばアルカリ金属炭酸塩類及び有機塩基類が挙げられる。
　反応には必要に応じて、配位子を用いてもよい。反応に用いられる配位子としては、例えばトリフェニルホスフィン、キサントホス、２，２’－ビス（ジフェニルホスフィノ）－１，１’－ビナフチル、１，１’－ビス（ジフェニルホスフィノ）フェロセン、２－ジシクロヘキシルホスフィノ－２’，４’，６’－トリイソプロピルビフェニル、２－ジシクロヘキシルホスフィノ－２’，６’－ジメトキシビフェニル及び１，２－ビス（ジフェニルホスフィノ）エタンが挙げられる。反応に配位子が用いられる場合、配位子は化合物（Ｍ－２）１モルに対して、通常０．０１～１モルの割合で用いられる。
　反応には、化合物（Ｍ－２）１モルに対して、化合物（Ｒ－１４）が通常１モル～１０モルの割合、金属触媒が通常０．０１～０．５モルの割合、塩基が通常０．１～５モルの割合で用いられる。
　反応時間は、通常５分間～４８時間の範囲である。反応温度は、通常２０℃～２００℃の範囲である。
　反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより化合物（Ｉｑ）を単離することができる。
　化合物（Ｒ－１４）は、市販の化合物であるか、公知の方法に準じて製造することができる。 Manufacturing method 12
The compound represented by the formula (Iq) (hereinafter referred to as the compound (Iq)) is a compound (M-2), a compound represented by the formula (R-14) (hereinafter referred to as the compound (R-14)), It can be produced by reacting a metal catalyst and a base.
Figure JPOXMLDOC01-appb-C000014
 [Wherein, M 1 represents B (OR 33 ) 2 or 4,4,5,5-tetramethyl-1,3,2-dioxaborolan-2-yl group, and R 33 represents a hydrogen atom or a C1-C6 alkyl And the other symbols have the same meanings as described above. ]
The reaction is usually carried out in a solvent. The solvent used for the reaction includes, for example, ethers, hydrocarbons, aprotic polar solvents, water and mixtures thereof.
Examples of the metal catalyst used for the reaction include tetrakis (triphenylphosphine) palladium (0), 1,1′-bis (diphenylphosphino) ferrocenepalladium (II) dichloride, tris (dibenzylideneacetone) dipalladium (0) And palladium catalysts such as palladium (II) acetate, and bis (cyclooctadiene) nickel (0).
As a base used for reaction, an alkali metal carbonate and organic bases are mentioned, for example.
A ligand may be used for the reaction, if necessary. Examples of the ligand used for the reaction include triphenylphosphine, xanthophos, 2,2′-bis (diphenylphosphino) -1,1′-binaphthyl, 1,1′-bis (diphenylphosphino) ferrocene, 2 Dicyclohexylphosphino-2 ′, 4 ′, 6′-triisopropylbiphenyl, 2-dicyclohexylphosphino-2 ′, 6′-dimethoxybiphenyl and 1,2-bis (diphenylphosphino) ethane. When a ligand is used in the reaction, the ligand is generally used in a ratio of 0.01 to 1 mole relative to 1 mole of the compound (M-2).
In the reaction, the compound (R-14) is usually at a ratio of 1 mol to 10 mol, the metal catalyst is usually at a ratio of 0.01 to 0.5 mol, and the base is usually at 1 mol to 1 mol of the compound (M-2). It is used in a proportion of 0.1 to 5 moles.
The reaction time is usually in the range of 5 minutes to 48 hours. The reaction temperature is usually in the range of 20 ° C to 200 ° C.
After completion of the reaction, compound (Iq) can be isolated by post-treatment operation such as adding water to the reaction mixture, extracting with an organic solvent, drying and concentration of the organic layer, and the like.
Compound (R-14) is a commercially available compound or can be produced according to a known method.
製造法１３
　式（Ｉｒ）で示される化合物（以下、化合物（Ｉｒ）と記す）は、化合物（Ｍ－３）、式（Ｒ－１５）で示される化合物（以下、化合物（Ｒ－１５）と記す）及び塩基を反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-C000015
 ［式中、Ｌ４は酸素原子、硫黄原子、ＮＲ15又は－Ｏ－Ｎ＝ＣＲ16－＊を表し、を表し、その他の記号は前記と同じ意味を表す。］
　反応は、化合物（Ｍ－２）に代えて化合物（M－３）を、化合物（Ｒ－７）に代えて化合物（Ｒ－１５）を用いて、製造法１０に準じて実施することができる。
　化合物（Ｒ－１５）は、市販の化合物であるか、公知の方法に準じて製造することができる。 Manufacturing method 13
The compound represented by the formula (Ir) (hereinafter referred to as a compound (Ir)) includes a compound (M-3), a compound represented by the formula (R-15) (hereinafter referred to as a compound (R-15)) and It can be produced by reacting a base.
Figure JPOXMLDOC01-appb-C000015
 [Wherein, L 4 represents an oxygen atom, a sulfur atom, NR 15 or -O-N = CR 16- *, and the other symbols have the same meanings as described above. ]
The reaction can be carried out according to production method 10, using compound (R-15) instead of compound (M-2) and compound (R-3) instead of compound (M-3). .
Compound (R-15) is a commercially available compound or can be produced according to a known method.
製造法１４
　式（Ｉｓ）で示される化合物（以下、化合物（Ｉｓ）と記す）は、化合物（Ｍ－１）と式（Ｒ－１６）で示される化合物（以下、化合物（Ｒ－１６）と記す）とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-C000016
 ［式中、ＲＣはフェニレン基、ナフチレン基、チエニレン基、フラニレン基、ピロリレン基、チアゾリレン基、イソチアゾリレン基、オキサゾリレン基、イソオキサゾリレン基、ピラゾリレン基、イミダゾリレン基、トリアゾリレン基、ピリジレン基、ピリダジニレン基、ピリミジニレン基、ピラジニレン基、トリアジニレン基｛該フェニレン基、該ナフチレン基、該チエニレン基、該フラニレン基、該ピロリレン基、該チアゾリレン基、該イソチアゾリレン基、該オキサゾリレン基、該イソオキサゾリレン基、該ピラゾリレン基、該イミダゾリレン基、該トリアゾリレン基、該ピリジレン基、該ピリダジニレン基、該ピリミジニレン基、該ピラジニレン基及び該トリアジニレン基は、群Ｄより選ばれる１以上の置換基を有していてもよい｝、チアジアゾリレン基、オキサジアゾリレン基又はテトラジニレン基を表し、Ｍ２はリチウム原子、ＭｇＸ２又はＺｎＸ２を表し、その他の記号は前記と同じ意味を表す。］
　反応は通常溶媒中で行われる。反応に用いられる溶媒としては、例えば炭化水素類、エーテル類及びこれらの混合物が挙げられる。
　反応には、化合物（Ｍ－１）１モルに対して、化合物（Ｒ－１６）が通常１モル～１０モルの割合で用いられる。
　反応時間は、通常５分間～２４時間の範囲である。反応温度は、通常－１００℃～６０℃の範囲である。
　反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物（Ｉｓ）を単離することができる。
　化合物（Ｒ－１６）は、市販の化合物であるか、公知の方法に準じて製造することができる。 Manufacturing method 14
The compound represented by the formula (Is) (hereinafter referred to as a compound (Is)) is a compound (M-1) and the compound represented by the formula (R-16) (hereinafter referred to as a compound (R-16)) Can be produced by reacting
Figure JPOXMLDOC01-appb-C000016
 [Wherein, R C represents phenylene group, naphthylene group, thienylene group, furanylene group, pyrrolylene group, thiazolylene group, isothiazolylene group, oxazolylene group, isoxazolylene group, pyrazolylene group, imidazolylene group, triazolylene group, pyridylene group, pyridazinylene Group, pyrimidinylene group, pyrazinylene group, triazinylene group {the phenylene group, the naphthyrylene group, the thienylene group, the furanylene group, the pyrrolylene group, the thiazolylene group, the isothiazolylene group, the oxazolylene group, the isoxazolylene group, The pyrazolylene group, the imidazolylene group, the triazolylene group, the pyridylene group, the pyridazinylene group, the pyrimidinylene group, the pyrazinylene group and the triazinylene group may have one or more substituents selected from group D. } M 2 represents a lithium atom, MgX 2 or ZnX 2 , and the other symbols have the same meanings as described above, a thiadiazolylene group, an oxadiazolylene group or a tetradinylene group. ]
The reaction is usually carried out in a solvent. As a solvent used for reaction, hydrocarbons, ethers, and these mixtures are mentioned, for example.
In the reaction, the compound (R-16) is usually used in a proportion of 1 mole to 10 moles relative to 1 mole of the compound (M-1).
The reaction time is usually in the range of 5 minutes to 24 hours. The reaction temperature is usually in the range of -100 ° C to 60 ° C.
After completion of the reaction, the compound (Is) can be isolated by post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, drying and concentration of the organic layer, and the like.
Compound (R-16) is a commercially available compound or can be produced according to a known method.
参考製造法１
　化合物（Ｍ－１）は、化合物（Ｍ－３）と酸化剤とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-C000017
 ［式中、記号は前記と同じ意味を表す。］
　反応に用いられる酸化剤としては、例えば酸化マンガン（ＩＶ）、デス・マーチン試薬及び２－ヨードキシ安息香酸が挙げられる。
　反応は、通常溶媒中で行われる。反応に用いられる溶媒としては、例えばハロゲン化炭化水素類、ニトリル類、エステル類及びこれらの混合物が挙げられる。
　反応には、化合物（Ｍ－３）１モルに対して、酸化剤が通常１モル～５０モルの割合で用いられる。
　反応時間は、通常５分間～２４時間の範囲である。反応温度は、通常－２０℃～８０℃の範囲である。
　反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより化合物（Ｍ－１）を単離することができる。 Reference manufacturing method 1
Compound (M-1) can be produced by reacting compound (M-3) with an oxidizing agent.
Figure JPOXMLDOC01-appb-C000017
 [Wherein, the symbols have the same meanings as described above. ]
Examples of the oxidizing agent used for the reaction include manganese (IV) oxide, Dess-Martin reagent and 2-iodoxybenzoic acid.
The reaction is usually carried out in a solvent. Examples of the solvent used for the reaction include halogenated hydrocarbons, nitriles, esters and mixtures thereof.
In the reaction, the oxidizing agent is usually used in a proportion of 1 mole to 50 moles relative to 1 mole of the compound (M-3).
The reaction time is usually in the range of 5 minutes to 24 hours. The reaction temperature is usually in the range of −20 ° C. to 80 ° C.
After completion of the reaction, water is added to the reaction mixture, extraction is performed with an organic solvent, and the organic layer is subjected to post-treatment operations such as drying and concentration to isolate compound (M-1).
参考製造法２
　化合物（Ｍ－２）は、化合物（Ｍ－３）と塩素化剤又は臭素化剤とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-C000018
 ［式中、記号は前記と同じ意味を表す。］
　反応に用いられる塩素化剤又は臭素化剤としては、例えば塩化チオニル、オキシ塩化リン、塩化オキサリル、三臭化リン、四臭化炭素とトリフェニルホスフィンとの混合物及びオキシ臭化リンが挙げられる。
　反応は、通常溶媒中で行われる。反応に用いられる溶媒としては、例えば炭化水素類、ハロゲン化炭化水素類、エーテル類、ニトリル類、エステル類及びこれらの混合物が挙げられる。
　反応には、化合物（Ｍ－３）１モルに対して、塩素化剤又は臭素化剤が通常１モル～１０モルの割合で用いられる。
　反応時間は、通常５分間～２４時間の範囲である。反応温度は、通常－２０℃～１００℃の範囲である。
　反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより化合物（Ｍ－２）を単離することができる。 Reference manufacturing method 2
Compound (M-2) can be produced by reacting compound (M-3) with a chlorinating agent or a brominating agent.
Figure JPOXMLDOC01-appb-C000018
 [Wherein, the symbols have the same meanings as described above. ]
The chlorinating agent or brominating agent used in the reaction includes, for example, thionyl chloride, phosphorus oxychloride, oxalyl chloride, phosphorus tribromide, a mixture of carbon tetrabromide and triphenylphosphine and phosphorus oxybromide.
The reaction is usually carried out in a solvent. Examples of the solvent used for the reaction include hydrocarbons, halogenated hydrocarbons, ethers, nitriles, esters and mixtures thereof.
In the reaction, a chlorinating agent or a brominating agent is usually used in a proportion of 1 mole to 10 moles relative to 1 mole of the compound (M-3).
The reaction time is usually in the range of 5 minutes to 24 hours. The reaction temperature is usually in the range of −20 ° C. to 100 ° C.
After completion of the reaction, water is added to the reaction mixture, extraction is performed with an organic solvent, and the organic layer is subjected to post-treatment operations such as drying and concentration to isolate the compound (M-2).
参考製造法３
　化合物（Ｍ－３）は、式（Ｍ－４）で示される化合物（以下、化合物（Ｍ－４）と記す）と塩基とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-C000019
 ［式中、Ｒ32はメチル基またはトリフルオロメチル基を表し、その他の記号は前記と同じ意味を表す。］
　反応は、通常溶媒中で行われる。反応に用いられる溶媒としては、例えばアルコール類、水及びこれらの混合物が挙げられる。
　反応に用いられる塩基としては、例えばアルカリ金属炭酸塩類が挙げられる。
　反応には、化合物（Ｍ－４）１モルに対して、塩基が通常０．１モル～１０モルの割合で用いられる。
　反応時間は、通常５分間～２４時間の範囲である。反応温度は、通常－２０℃～８０℃の範囲である。
　反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより化合物（Ｍ－３）を単離することができる。 Reference manufacturing method 3
The compound (M-3) can be produced by reacting a compound represented by the formula (M-4) (hereinafter referred to as a compound (M-4)) with a base.
Figure JPOXMLDOC01-appb-C000019
 [Wherein, R 32 represents a methyl group or a trifluoromethyl group, and the other symbols have the same meanings as described above. ]
The reaction is usually carried out in a solvent. As a solvent used for reaction, alcohol, water, and these mixtures are mentioned, for example.
As a base used for reaction, an alkali metal carbonate is mentioned, for example.
In the reaction, the base is usually used in a proportion of 0.1 mol to 10 mol per 1 mol of the compound (M-4).
The reaction time is usually in the range of 5 minutes to 24 hours. The reaction temperature is usually in the range of −20 ° C. to 80 ° C.
After completion of the reaction, compound (M-3) can be isolated by post-treatment operation such as adding water to the reaction mixture, extracting with an organic solvent, drying and concentrating the organic layer, and the like.
参考製造法４
　化合物（Ｍ－４）は、式（Ｍ－５）で示される化合物（以下、化合物（Ｍ－５）と記す）と式（Ｒ－９）で示される化合物（以下、化合物（Ｒ－９）と記す）とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-C000020
 ［式中、記号は前記と同じ意味を表す。］
　反応は、無溶媒又は溶媒中で行われる。反応に用いられる溶媒としては、例えば炭化水素類、エーテル類、ハロゲン化炭化水素類及びこれらの混合物が挙げられる。
　反応には、化合物（Ｍ－５）１モルに対して、化合物（Ｒ－９）が通常１モル～１００モルの割合で用いられる。
　反応時間は、通常５分間～２４時間の範囲である。反応温度は、通常－２０℃～１８０℃の範囲である。
　反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより化合物（Ｍ－４）を単離することができる。
　化合物（Ｒ－９）は、市販の化合物である。 Reference manufacturing method 4
The compound (M-4) is a compound represented by the formula (M-5) (hereinafter referred to as a compound (M-5)) and a compound represented by the formula (R-9) (hereinafter referred to as a compound (R-9) Can be produced by reacting with
Figure JPOXMLDOC01-appb-C000020
 [Wherein, the symbols have the same meanings as described above. ]
The reaction is carried out without solvent or in a solvent. Examples of the solvent used for the reaction include hydrocarbons, ethers, halogenated hydrocarbons and mixtures thereof.
In the reaction, the compound (R-9) is usually used in a proportion of 1 mole to 100 moles relative to 1 mole of the compound (M-5).
The reaction time is usually in the range of 5 minutes to 24 hours. The reaction temperature is usually in the range of −20 ° C. to 180 ° C.
After completion of the reaction, water is added to the reaction mixture, extraction is performed with an organic solvent, and the organic layer is subjected to post-treatment operations such as drying and concentration to isolate the compound (M-4).
Compound (R-9) is a commercially available compound.
参考製造法５
　化合物（Ｍ－５）は、式（Ｍ－６）で示される化合物（以下、化合物（Ｍ－６）と記す）と酸化剤とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-C000021
 ［式中、記号は前記と同じ意味を表す。］
　反応は、製造法５に準じて実施することができる。 Reference manufacturing method 5
The compound (M-5) can be produced by reacting a compound represented by the formula (M-6) (hereinafter referred to as a compound (M-6)) with an oxidizing agent.
Figure JPOXMLDOC01-appb-C000021
 [Wherein, the symbols have the same meanings as described above. ]
The reaction can be carried out according to production method 5.
参考製造法６
　化合物（Ｍ－６）は、式（Ｍ－７）で示される化合物（以下、化合物（Ｍ－７）と記す）と式（Ｒ－１０）で示される化合物（以下、化合物（Ｒ－１０）と記す）、金属触媒及び塩基を反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-C000022
 ［式中、Ｘ3は臭素原子又はヨウ素原子を表し、その他の記号は前記と同じ意味を表す。］
　反応は、製造法１２に準じて実施することができる。
　化合物（Ｒ－１０）は、市販の化合物であるか、公知の方法に準じて製造することができる。 Reference manufacturing method 6
The compound (M-6) is a compound represented by the formula (M-7) (hereinafter referred to as a compound (M-7)) and a compound represented by the formula (R-10) (hereinafter referred to as a compound (R-10) Can be produced by reacting a metal catalyst and a base).
Figure JPOXMLDOC01-appb-C000022
 [Wherein, X 3 represents a bromine atom or an iodine atom, and the other symbols have the same meanings as described above. ]
The reaction can be carried out according to production method 12.
Compound (R-10) is a commercially available compound or can be produced according to a known method.
参考製造法７
　化合物（Ｍ－７）は、式（Ｍ－８）で示される化合物（以下、化合物（Ｍ－８）と記す）と式（Ｒ－１１）で示される化合物（以下、化合物（Ｒ－１１）と記す）とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-C000023
 ［式中、Ｘ4は塩素原子、臭素原子、ヨウ素原子、メシルオキシ基又はトシルオキシ基を表し、その他の記号は前記と同じ意味を表す。］
　反応は、製造法１に準じて実施することができる。
　化合物（Ｒ－１１）は、市販の化合物であるか、公知の方法に準じて製造することができる。 Reference manufacturing method 7
The compound (M-7) is a compound represented by the formula (M-8) (hereinafter referred to as compound (M-8)) and a compound represented by the formula (R-11) (hereinafter referred to as the compound (R-11) Can be produced by reacting with
Figure JPOXMLDOC01-appb-C000023
 [Wherein, X 4 represents a chlorine atom, a bromine atom, an iodine atom, a mesyloxy group or a tosyloxy group, and the other symbols have the same meanings as described above. ]
The reaction can be carried out according to production method 1.
Compound (R-11) is a commercially available compound or can be produced according to a known method.
参考製造法８
　化合物（Ｍ－８）は、式（Ｍ－９）で示される化合物（以下、化合物（Ｍ－９）と記す）と式（Ｒ－１２）で示される化合物（以下、化合物（Ｒ－１２）と記す）とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-C000024
 ［式中、記号は前記と同じ意味を表す。］
　反応は、通常溶媒中で行われる。反応に用いられる溶媒としては、例えばアルコール類、エーテル類及びこれらの混合物が挙げられる。
　反応には、化合物（Ｍ－９）１モルに対して、化合物（Ｒ－１２）が通常１モル～１０モルの割合で用いられる。
　反応時間は、通常５分間～４８時間の範囲である。反応温度は、通常－２０℃～１４０℃の範囲である。
　反応終了後は、化合物（Ｍ－８）が析出する場合には固体をろ取する；水を加えて有機溶媒で抽出する等の後処理操作を行うことにより、化合物（Ｍ－８）を単離することができる。
　化合物（Ｒ－１２）は、市販の化合物である。 Reference manufacturing method 8
The compound (M-8) is a compound represented by the formula (M-9) (hereinafter referred to as the compound (M-9)) and a compound represented by the formula (R-12) (hereinafter the compound (R-12) Can be produced by reacting with
Figure JPOXMLDOC01-appb-C000024
 [Wherein, the symbols have the same meanings as described above. ]
The reaction is usually carried out in a solvent. As a solvent used for reaction, alcohol, ether, and these mixtures are mentioned, for example.
In the reaction, the compound (R-12) is usually used in a proportion of 1 mole to 10 moles relative to 1 mole of the compound (M-9).
The reaction time is usually in the range of 5 minutes to 48 hours. The reaction temperature is usually in the range of -20 ° C to 140 ° C.
After completion of the reaction, when compound (M-8) precipitates, the solid is collected by filtration; and post treatment operation such as addition of water and extraction with an organic solvent is carried out to obtain compound (M-8) alone. It can be released.
The compound (R-12) is a commercially available compound.
参考製造法９
　化合物（Ｍ－９）は、式（Ｍ－１０）で示される化合物（以下、化合物（Ｍ－１０）と記す）を加熱することにより製造することができる。
Figure JPOXMLDOC01-appb-C000025
 ［式中、Ｒ34はメチル基又はエチル基を表し、その他の記号は前記と同じ意味を表す。］
　反応は、無溶媒又は溶媒中で行われる。反応に用いられる溶媒としては、例えばアルコール類、非プロトン性極性溶媒及びこれらの混合物が挙げられる。
　反応には、必要に応じて塩を用いてもよい。
　反応に用いられる塩としては、例えば塩化ナトリウム、塩化リチウム及びシアン化ナトリウムが挙げられる。
　塩が用いられる場合、化合物（Ｍ－１０）１モルに対して、塩が通常１モル～１０モルの割合で用いられる。
　反応時間は、通常５分間～４８時間の範囲である。反応温度は、通常１４０℃～２００℃の範囲である。
　反応終了後は、化合物（Ｍ－９）が析出する場合には固体をろ取する；水を加えて有機溶媒で抽出する等の後処理操作を行うことにより、化合物（Ｍ－９）を単離することができる。 Reference manufacturing method 9
Compound (M-9) can be produced by heating a compound represented by formula (M-10) (hereinafter referred to as compound (M-10)).
Figure JPOXMLDOC01-appb-C000025
 [Wherein, R 34 represents a methyl group or an ethyl group, and the other symbols have the same meanings as described above. ]
The reaction is carried out without solvent or in a solvent. As a solvent used for reaction, alcohol, an aprotic polar solvent, and these mixtures are mentioned, for example.
For the reaction, salts may be used if necessary.
Examples of salts used in the reaction include sodium chloride, lithium chloride and sodium cyanide.
When a salt is used, the salt is usually used in a proportion of 1 mole to 10 moles relative to 1 mole of the compound (M-10).
The reaction time is usually in the range of 5 minutes to 48 hours. The reaction temperature is usually in the range of 140 ° C to 200 ° C.
After completion of the reaction, when compound (M-9) precipitates, the solid is collected by filtration; and post treatment operation such as addition of water and extraction with an organic solvent is carried out to obtain compound (M-9) alone. It can be released.
参考製造法１０
　化合物（Ｍ－１０）は、式（Ｍ－１１）で示される化合物（以下、化合物（Ｍ－１１）と記す）と式（Ｍ－１２）で示される化合物（以下、化合物（Ｍ－１２）と記す）とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-C000026
 ［式中、Ｒ35はメチル基又はエチル基を表し、その他の記号は前記と同じ意味を表す。］
　反応は無溶媒又は溶媒中で行われる。反応に用いられる溶媒としては、例えばエーテル類、炭化水素類、非プロトン性極性溶媒及びこれらの混合物が挙げられる。
　反応には、化合物（Ｍ－１１）１モルに対して、化合物（Ｍ－１２）が通常０．１～１０モルの割合で用いられる。
　反応温度は通常０℃から２００℃の範囲である。反応時間は通常５分～７２時間の範囲である。
　反応終了後は、化合物（Ｍ－１０）が析出する場合には固体をろ取する；水を加えて有機溶媒で抽出する等の後処理操作を行うことにより、化合物（Ｍ－１０）を単離することができる。
　化合物（Ｍ－１１）及び化合物（Ｍ－１２）は、市販の化合物であるか、公知の方法に準じて製造することができる。 Reference manufacturing method 10
The compound (M-10) is a compound represented by the formula (M-11) (hereinafter referred to as a compound (M-11)) and a compound represented by the formula (M-12) (hereinafter referred to as the compound (M-12) Can be produced by reacting with
Figure JPOXMLDOC01-appb-C000026
 [Wherein, R 35 represents a methyl group or an ethyl group, and the other symbols have the same meanings as described above. ]
The reaction is carried out without solvent or in a solvent. The solvent used for the reaction includes, for example, ethers, hydrocarbons, aprotic polar solvents and mixtures thereof.
In the reaction, the compound (M-12) is usually used in a ratio of 0.1 to 10 moles relative to 1 mole of the compound (M-11).
The reaction temperature is usually in the range of 0 ° C to 200 ° C. The reaction time is usually in the range of 5 minutes to 72 hours.
After completion of the reaction, when compound (M-10) precipitates, the solid is collected by filtration; post treatment operation such as addition of water and extraction with an organic solvent is carried out to obtain compound (M-10) alone. It can be released.
Compound (M-11) and compound (M-12) are commercially available compounds, or can be produced according to known methods.
　本発明化合物又は本発明化合物Ｘは、下記群（ａ）、群（ｂ）、群（ｃ）、群（ｄ）、群（ｅ）、群（ｆ）、群（ｇ）、及び群（ｈ）からなる群より選ばれる１以上の成分（以下、本成分と記す）と混用又は併用することができる。
　前記混用又は併用とは、本発明化合物又は本発明化合物Ｘと本成分とを、同時に、別々に又は時間間隔をおいて使用することを意味する。
　本発明化合物又は本発明化合物Ｘと本成分とを同時に使用する場合、本成分と本発明化合物又は本発明化合物Ｘとが、それぞれ別個の製剤に含まれていてもよく、１つの製剤に含まれていてもよい。
　本発明の１つの側面は、群（ａ）及び群（ｂ）からなる群より選ばれる１以上の成分、並びに本発明化合物を含有する組成物である。
　本発明の１つの側面は、群（ａ）及び群（ｂ）からなる群より選ばれる１以上の成分、並びに本発明化合物Ｘを含有する組成物（以下、組成物Ａと記す）である。 The compound of the present invention or the compound of the present invention X is a group (a), a group (b), a group (c), a group (d), a group (e), a group (f), a group (g), and a group (h) And one or more components (hereinafter referred to as "the components") selected from the group consisting of
The use in combination or in combination means that the compound of the present invention or the compound of the present invention and the component are used simultaneously, separately or at time intervals.
When the compound of the present invention or the compound X of the present invention and the component of the present invention are used simultaneously, the present component and the compound of the present invention or the compound of the present invention X may be contained in separate formulations. It may be
One aspect of the present invention is a composition comprising one or more components selected from the group consisting of Group (a) and Group (b), and a compound of the present invention.
One aspect of the present invention is a composition (hereinafter referred to as composition A) containing one or more components selected from the group consisting of groups (a) and (b), and the compound X of the present invention.
　群（ａ）は、アセチルコリンエステラーゼ阻害剤（例えばカーバメート系殺虫剤、有機リン系殺虫剤）、GABA作動性塩素イオンチャネルアンタゴニスト（例えばフェニルピラゾール系殺虫剤）、ナトリウムチャネルモジュレーター（例えば、ピレスロイド系殺虫剤）、ニコチン性アセチルコリン受容体拮抗モジュレーター（例えば、ネオニコチノイド系殺虫剤）、ニコチン性アセチルコリン受容体アロステリックモジュレーター、グルタミン酸作動性塩素イオンチャネルアロステリックモジュレーター（例えば、マクロライド系殺虫剤）、幼若ホルモンミミック、マルチサイト阻害剤、弦音器官TRPVチャネルモジュレーター、ダニ類生育阻害剤、ミトコンドリアATP生合成酵素阻害剤、酸化的リン酸化脱共役剤、ニコチン性アセチルコリン受容体チャネルブロッカー（例えば、ネライストキシン系殺虫剤）、キチン合成阻害剤、脱皮阻害剤、エクダイソン受容体アゴニスト、オクトパミン受容体アゴニスト、ミトコンドリア電子伝達系複合体I, II, III及びIVの阻害剤、電位依存性ナトリウムチャネルブロッカー、アセチルCoAカルボキシラーゼ阻害剤、リアノジン受容体モジュレーター（例えば、ジアミド系殺虫剤）、弦音器官モジュレーター、微生物殺虫剤の各々の活性成分、及びその他の殺虫活性成分、殺ダニ活性成分及び殺線虫活性成分からなる群である。これらは、IRACの作用機構に基づく分類に記載されている。 Group (a) includes acetylcholinesterase inhibitors (eg carbamate insecticides, organophosphorus insecticides), GABAergic chloride ion channel antagonists (eg phenylpyrazole insecticides), sodium channel modulators (eg pyrethroid insecticides) Nicotinic acetylcholine receptor antagonistic modulators (eg, neonicotinoid insecticides), nicotinic acetylcholine receptor allosteric modulators, glutamatergic chloride ion channel allosteric modulators (eg, macrolide insecticides), juvenile hormone mimic , Multi-site inhibitor, chordal organ TRPV channel modulator, mite growth inhibitor, mitochondrial ATP biosynthesis enzyme inhibitor, oxidative phosphorylation uncoupling agent, nicotinic acetylcholine receptor Channel blockers (eg, nereistoxin insecticides), chitin synthesis inhibitors, molting inhibitors, ecdysone receptor agonists, octopamine receptor agonists, inhibitors of mitochondrial electron transport complex I, II, III and IV, potentials Dependent sodium channel blocker, acetyl CoA carboxylase inhibitor, ryanodine receptor modulator (eg, diamide insecticide), chord tone organ modulator, each active ingredient of microbial insecticide, and other insecticidal active ingredients, acaricidal active ingredients and It is a group consisting of a nematode active ingredient. These are described in the classification based on IRAC's mechanism of action.
　群（ｂ）は、核酸合成阻害剤（例えば、フェニルアミド系殺菌剤、アシルアミノ酸系殺菌剤）、細胞分裂及び細胞骨格阻害剤（例えば、MBC殺菌剤）、呼吸阻害剤（例えば、QoI殺菌剤、QiI殺菌剤）、アミノ酸合成及びタンパク質合成阻害剤（例えば、アニリノピリジン系殺菌剤）、シグナル伝達阻害剤、脂質合成及び膜合成阻害剤、ステロール生合成阻害剤（例えば、トリアゾール系等のDMI殺菌剤）、細胞壁合成阻害剤、メラニン合成阻害剤、植物防御誘導剤、多作用点接触活性殺菌剤、微生物殺菌剤、及びその他の殺菌活性成分からなる群である。これらは、FRACの作用機構に基づく分類に記載されている。 Group (b) includes nucleic acid synthesis inhibitors (eg, phenylamide fungicides, acyl amino acid fungicides), cell division and cytoskeleton inhibitors (eg, MBC fungicides), respiratory inhibitors (eg, QoI fungicides) , QiI fungicides), amino acid synthesis and protein synthesis inhibitors (eg, anilinopyridine fungicides), signal transduction inhibitors, lipid synthesis and membrane synthesis inhibitors, sterol biosynthesis inhibitors (eg, triazole etc. DMI) And bactericidal agents), cell wall synthesis inhibitors, melanin synthesis inhibitors, plant defense inducers, multi-acting point contact active disinfectants, microbial disinfectants, and other bactericidal active ingredients. These are described in the classification based on the mechanism of action of FRAC.
　群（ｃ）は、植物成長調整成分（菌根菌及び根粒菌を含む）の群である。 Group (c) is a group of plant growth regulators (including mycorrhizal fungi and rhizobia).
　群（ｄ）は、薬害軽減成分の群である。 Group (d) is a group of safeners.
　群（ｅ）は、共力剤の群である。 Group (e) is a group of synergists.
　群（ｆ）は、鳥忌避成分、昆虫忌避成分、及び動物忌避成分からなる忌避成分の群である。 Group (f) is a group of repellent components consisting of a bird repellent component, an insect repellent component, and an animal repellent component.
　群（ｇ）は、殺軟体動物成分の群である。 Group (g) is a group of mollusc components.
　群（ｈ）は、昆虫フェロモンの群である。 Group (h) is a group of insect pheromone.
　以下に、本成分と本発明化合物Ｘの組み合わせの例を記載する。例えば、アラニカルブ（alanycarb）+SXはアラニカルブ（alanycarb）とSXとの組み合わせを意味する。
　なお、SXの略号は、実施例に記載の化合物群SX1～SX264から選ばれるいずれか１つの本発明化合物Ｘを意味する。また、以下に記載する本成分はいずれも公知の成分であり、市販の製剤から得るか、公知の方法により製造することができる。本成分が微生物の場合は、菌寄託機関から入手することもできる。なお、括弧内の数字はCAS RN（登録商標）を表す。 Below, the example of the combination of this component and this invention compound X is described. For example, alanicarb (Salyx + SX) means a combination of alanicarb (Salyx).
The abbreviation SX means any one compound of the present invention X selected from the compound groups SX1 to SX264 described in the Examples. In addition, all of the components described below are known components and can be obtained from commercially available preparations or can be produced by known methods. When the component is a microorganism, it can also be obtained from a bacteria depository. The numbers in parentheses indicate CAS RN (registered trademark).
　上記群（ａ）の本成分と本発明化合物Ｘとの組み合わせ：
　アバメクチン（abamectin）+SX、アセフェート（acephate）+SX、アセキノシル（acequinocyl）+SX、アセタミプリド（acetamiprid）+SX、アクリナトリン（acrinathrin）+SX、アシノナピル（acynonapyr）+SX、アフィドピロペン（afidopyropen）+SX、アフォキソラネル（afoxolaner）+SX、アラニカルブ（alanycarb）+SX、アルジカルブ（aldicarb）+SX、アレスリン（allethrin）+SX、アルファシペルメトリン（alpha-cypermethrin）+SX、アルファエンドスルファン（alpha-endosulfan）+SX、リン化アルミニウム（aluminium phosphide）+SX、アミトラズ（amitraz）+SX、アザジラクチン（azadirachtin）+SX、アザメチホス（azamethiphos）+SX、アジンホスエチル（azinphos-ethyl）+SX、アジンホスメチル（azinphos-methyl）+SX、アゾシクロチン（azocyclotin）+SX、ベンダイオカルブ（bendiocarb）+SX、ベンフルトリン（benfluthrin）+SX、ベンフラカルブ（benfuracarb）+SX、ベンスルタップ（bensultap）+SX、ベンゾキシメート（benzoximate）+SX、ベンズピリモキサン（benzpyrimoxan）+SX、ベータシフルトリン（beta-cyfluthrin）+SX、べータシペルメトリン（beta-cypermethrin）+SX、ビフェナゼート（bifenazate）+SX、ビフェントリン（bifenthrin）+SX、ビオアレスリン（bioallethrin）+SX、ビオレスメトリン（bioresmethrin）+SX、ビストリフルロン（bistrifluron）+SX、ホウ砂（borax）+SX、ホウ酸（boric acid）+SX、ブロフラニリド（broflanilide）+SX、ブロモプロピレート（bromopropylate）+SX、ブプロフェジン（buprofezin）+SX、ブトカルボキシム（butocarboxim）+SX、ブトキシカルボキシム（butoxycarboxim）+SX、カズサホス（cadusafos）+SX、シアン化カルシウム（calcium cyanide）+SX、リン化カルシウム（calcium phosphide）+SX、カルバリル（carbaryl）+SX、カルボフラン（carbofuran）+SX、カルボスルファン（carbosulfan）+SX、カルタップ塩酸塩（cartap hydrochloride）+SX、カルタップ（cartap）+SX、キノメチオナート（chinomethionat）+SX、クロラントラニリプロール（chlorantraniliprole）+SX、クロルデン（chlordane）+SX、クロレトキシホス（chlorethoxyfos）+SX、クロルフェナピル（chlorfenapyr）+SX、クロルフェンビンホス（chlorfenvinphos）+SX、クロルフルアズロン（chlorfluazuron）+SX、クロルメホス（chlormephos）+SX、クロルピクリン（chloropicrin）+SX、クロルピリホス（chlorpyrifos）+SX、クロルピリホスメチル（chlorpyrifos-methyl）+SX、クロマフェノジド（chromafenozide）+SX、クロフェンテジン（clofentezine）+SX、クロチアニジン（clothianidin）+SX、クマホス（coumaphos）+SX、クリオライト（cryolite）+SX、シアノホス（cyanophos）+SX、シアントラニリプロール（cyantraniliprole）+SX、シクラニリプロール（cycloniliprole）+SX、シクロプロトリン（cycloprothrin）+SX、シクロキサプリド（cycloxaprid）+SX、シエノピラフェン（cyenopyrafen）+SX、シフルメトフェン（cyflumetofen）+SX、シフルトリン（cyfluthrin）+SX、シハロジアミド（cyhalodiamide）+SX、シハロトリン（cyhalothrin）+SX、シヘキサチン（cyhexatin）+SX、シペルメトリン（cypermethrin）+SX、シフェノトリン（cyphenothrin）+SX、シロマジン（cyromazine）+SX、ダゾメット（dazomet）+SX、デルタメトリン（deltamethrin）+SX、デメトン－S－メチル（demeton-S-methyl）+SX、ジアフェンチウロン（diafenthiuron）+SX、ダイアジノン（diazinon）+SX、ジクロルボス（dichlorvos）+SX、ジクロロメゾチアズ（dicloromezotiaz）+SX、ジコホル（dicofol）+SX、ジクロトホス（dicrotophos）+SX、ジフロビダジン（diflovidazin）+SX、ジフルベンズロン（diflubenzuron）+SX、ジメフルトリン（dimefluthrin）+SX、ジメトエート（dimethoate）+SX、ジメチルビンホス（dimethylvinphos）+SX、ジノテフラン（dinotefuran）+SX、八ホウ酸二ナトリウム（disodium octaborate）+SX、ジスルホトン（disulfoton）+SX、DNOC（2-methyl-4,6-dinitrophenol）+SX、ドラメクチン（doramectin）+SX、エマメクチン安息香酸塩（emamectin-benzoate）+SX、エンペントリン（empenthrin）+SX、エンドスルファン（endosulfan）+SX、EPN（O-ethyl O-(4-nitrophenyl) phenylphosphonothioate）+SX、イプシロンメトフルトリン（epsilon-metofluthrin）+SX、イプシロンモンフルオロトリン（epsilon-momfluorothrin）+SX、エスフェンバレレート（esfenvalerate）+SX、エチオフェンカルブ（ethiofencarb）+SX、エチオン（ethion）+SX、エチプロール（ethiprole）+SX、エトプロホス（ethoprophos）+SX、エトフェンプロックス（etofenprox）+SX、エトキサゾール（etoxazole）+SX、ファンフル（famphur）+SX、フェナミホス（fenamiphos）+SX、フェナザキン（fenazaquin）+SX、酸化フェンブタスズ（fenbutatin oxide）+SX、フェニトロチオン（fenitrothion）+SX、フェノブカルブ（fenobucarb）+SX、フェノキシカルブ（fenoxycarb）+SX、フェンプロパトリン（fenpropathrin）+SX、フェンピロキシメート（fenpyroximate）+SX、フェンチオン（fenthion）+SX、フェンバレレート（fenvalerate）+SX、フィプロニル（fipronil）+SX、フロメトキン（flometoquin）+SX、フロニカミド（flonicamid）+SX、フルアクリピリム（fluacrypyrim）+SX、フルアザインドリジン（fluazaindolizine）+SX、フルアズロン（fluazuron）+SX、フルベンジアミド（flubendiamide）+SX、フルシクロクスロン（flucycloxuron）+SX、フルシトリネート（flucythrinate）+SX、フルエンスルホン（fluensulfone）+SX、フルフェンプロックス（flufenoprox）+SX、フルフェノクスロン（flufenoxuron）+SX、フルフィプロール（flufiprole）+SX、フルメトリン（flumethrin）+SX、フルオピラム（fluopyram）+SX、フルピラジフロン（flupyradifurone）+SX、フルピリミン（flupyrimin）+SX、フルララネル（fluralaner）+SX、フルバリネート（fluvalinate）+SX、フルキサメタミド（fluxametamide）+SX、ホルメタネート（formetanate）+SX、ホスチアゼート（fosthiazate）+SX、フラメトリン（furamethrin）+SX、フラチオカルブ（furathiocarb）+SX、ガンマシハロトリン（gamma-cyhalothrin）+SX、ハルフェンプロックス（halfenprox）+SX、ハロフェノジド（halofenozide）+SX、ヘプタフルトリン（heptafluthrin）+SX、ヘプテノホス（heptenophos）+SX、ヘキサフルムロン（hexaflumuron）+SX、ヘキシチアゾクス（hexythiazox）+SX、ヒドラメチルノン（hydramethylnon）+SX、ヒドロプレン（hydroprene）+SX、イミシアホス（imicyafos）+SX、イミダクロプリド（imidacloprid）+SX、イミプロトリン（imiprothrin）+SX、インドキサカルブ（indoxacarb）+SX、イソフェンホス（isofenphos）+SX、イソプロカルブ（isoprocarb）+SX、イソプロピルＯ－（メトキシアミノチオホスホリル）サリチラート（isopropyl-O-(methoxyaminothiophosphoryl)salicylate）+SX、イソキサチオン（isoxathion）+SX、イベルメクチン（ivermectin）+SX、カデスリン（kadethrin）+SX、カッパテフルトリン（kappa-tefluthrin）+SX、カッパビフェントリン（kappa-bifenthrin）+SX、キノプレン（kinoprene）+SX、ラムダシハロトリン（lambda-cyhalothrin）+SX、レピメクチン（lepimectin）+SX、石灰硫黄合剤（lime sulfur）+SX、ルフェヌロン（lufenuron）+SX、マシン油（machine oil）+SX、マラチオン（malathion）+SX、メカルバム（mecarbam）+SX、メペルフルトリン（meperfluthrin）+SX、メタフルミゾン（metaflumizone）+SX、メタム（metam）+SX、メタミドホス（methamidophos）+SX、メチダチオン（methidathion）+SX、メチオカルブ（methiocarb）+SX、メソミル（methomyl）+SX、メトプレン（methoprene）+SX、メトキシクロル（methoxychlor）+SX、メトキシフェノジド（methoxyfenozide）+SX、臭化メチル（methyl bromide）+SX、メトフルトリン（metofluthrin）+SX、メトルカルブ（metolcarb）+SX、メトキサジアゾン（metoxadiazone）+SX、メビンホス（mevinphos）+SX、ミルベメクチン（milbemectin）+SX、ミルベマイシンオキシム（milbemycin oxime）+SX、モンフルオロトリン（momfluorothrin）+SX、モノクロトホス（monocrotophos）+SX、モキシデクチン（moxidectin）+SX、ナレッド（naled）+SX、ニコチン（nicotine）+SX、硫酸ニコチン（nicotine-sulfate）+SX、ニテンピラム（nitenpyram）+SX、ノバルロン（novaluron）+SX、ノビフルムロン（noviflumuron）+SX、オメトエート（omethoate）+SX、オキサミル（oxamyl）+SX、オキシジメトンメチル（oxydemeton-methyl）+SX、パラチオン（parathion）+SX、パラチオンメチル（parathion-methyl）+SX、ペルメトリン（permethrin）+SX、フェノトリン（phenothrin）+SX、フェントエート（phenthoate）+SX、ホレート（phorate）+SX、ホサロン（phosalone）+SX、ホスメット（phosmet）+SX、ホスファミドン（phosphamidon）+SX、ホスフィン（phosphine）+SX、ホキシム（phoxim）+SX、ピリミカーブ（pirimicarb）+SX、ピリミホスメチル（pirimiphos-methyl）+SX、シアン化カリウム（potassium cyanide）+SX、プラレトリン（prallethrin）+SX、プロフェノホス（profenofos）+SX、プロフルトリン（profluthrin）+SX、プロパルギット（propargite）+SX、プロペタムホス（propetamphos）+SX、プロポキスル（propoxur）+SX、プロチオホス（prothiofos）+SX、ピフルブミド（pyflubumide）+SX、ピメトロジン（pymetrozine）+SX、ピラクロホス（pyraclofos）+SX、ピレトリン（pyrethrins）+SX、ピリダベン（pyridaben）+SX、ピリダリル（pyridalyl）+SX、ピリダフェンチオン（pyridaphenthion）+SX、ピリフルキナゾン（pyrifluquinazone）+SX、ピリミジフェン（pyrimidifen）+SX、ピリミノストロビン（pyriminostrobin）+SX、ピリプロール（pyriprole）+SX、ピリプロキシフェン（pyriproxyfen）+SX、キナルホス（quinalphos）+SX、レスメトリン（resmethrin）+SX、ロテノン（rotenone）+SX、セラメクチン（selamectin）+SX、シグマシペルメトリン（sigma-cypermethrin）+SX、シラフルオフェン（silafluofen）+SX、ホウ酸ナトリウム（sodium borate）+SX、シアン化ナトリウム（sodium cyanide）+SX、メタホウ酸ナトリウム（sodium metaborate）+SX、スピネトラム（spinetoram）+SX、スピノサド（spinosad）+SX、スピロジクロフェン（spirodiclofen）+SX、スピロメシフェン（spiromesifen）+SX、スピロピジオン(spiropidion)+SX、スピロテトラマト（spirotetramat）+SX、スルフルラミド（sulfluramid）+SX、スルホテップ（sulfotep）+SX、スルホキサフロル（sulfoxaflor）+SX、硫黄（sulfur）+SX、フッ化スルフリル（sulfuryl fluoride）+SX、吐酒石（tartar emetic）+SX、タウフルバリネート（tau-fluvalinate）+SX、テブフェノジド（tebufenozide）+SX、テブフェンピラド（tebufenpyrad）+SX、テブピリムホス（tebupirimfos）+SX、テフルベンズロン（teflubenzuron）+SX、テフルトリン（tefluthrin）+SX、テメホス（temephos）+SX、テルブホス（terbufos）+SX、テトラクロルビンホス（tetrachlorvinphos）+SX、テトラジホン（tetradifon）+SX、テトラメトリン（tetramethrin）+SX、テトラメチルフルトリン（tetramethylfluthrin）+SX、テトラニリプロール（tetraniliprole）+SX、シータシペルメトリン（theta-cypermethrin）+SX、チアクロプリド（thiacloprid）+SX、チアメトキサム（thiamethoxam）+SX、チオシクラム（thiocyclam）+SX、チオジカルブ（thiodicarb）+SX、チオファノックス（thiofanox）+SX、チオメトン（thiometon）+SX、チオスルタップ二ナトリウム塩（thiosultap-disodium）+SX、チオスルタップ一ナトリウム塩（thiosultap-monosodium）+SX、チオキサザフェン（tioxazafen）+SX、トルフェンピラド（tolfenpyrad）+SX、トラロメトリン（tralomethrin）+SX、トランスフルトリン（transfluthrin）+SX、トリアザメート（triazamate）+SX、トリアゾホス（triazophos）+SX、トリクロルホン（trichlorfon）+SX、トリフルメゾピリム（triflumezopyrim）+SX、トリフルムロン（triflumuron）+SX、トリメタカルブ（trimethacarb）+SX、チクロピラゾフロル（tyclopyrazoflor）+
SX、バミドチオン（vamidothion）+SX、XMC（3,5-dimethylphenyl N-methylcarbamate）+SX、キシリルカルブ（xylylcarb）+SX、ゼータシペルメトリン（zeta-cypermethrin）+SX、リン化亜鉛（zinc phosphide）+SX、３－ブロモ－Ｎ－［２，４－ジクロロ－６－（メチルカルバモイル）フェニル］－１－（３，５－ジクロロピリジン－２－イル）－１Ｈ－ピラゾール－５－カルボキサミド（1104384-14-6）+SX、Ｎ－［３－クロロ－１－（ピリジン－３－イル）－１Ｈ－ピラゾール－４－イル］－Ｎ－エチル－３－（３，３，３－トリフルオロプロパンスルフィニル）プロパンアミド（1477923-37-7）+SX、２－［３－（エタンスルホニル）ピリジン－２－イル］－５－（トリフルオロメタンスルホニル）ベンゾオキサゾール（1616678-32-0）+SX、４－［５－（３，５－ジクロロフェニル）－５－（トリフルオロメチル）－４，５－ジヒドロ－１，２－オキサゾール－３－イル］－２－メチル－Ｎ－（１－オキソチエタン－３－イル）ベンズアミド（1241050-20-3）+SX、３－メトキシ－Ｎ－（５－｛５－（トリフルオロメチル）－５－［３－（トリフルオロメチル）フェニル］－４，５－ジヒドロ－１，２－オキサゾール－３－イル｝インダン－１－イル）プロパンアミド（1118626-57-5）+SX、Ｎ－［２－ブロモ－６－クロロ－４－（１，１，１，２，３，３，３－ヘプタフルオロプロパン－２－イル）フェニル］－３－｛エチル［（ピリジン－４－イル）カルボニル］アミノ｝－２－メトキシベンズアミド（1429513-53-0）+SX、Ｎ－［２－ブロモ－６－クロロ－４－（１，１，１，２，３，３，３－ヘプタフルオロプロパン－２－イル）フェニル］－３－［エチル（４－シアノベンゾイル）アミノ］－２－メトキシベンズアミド（1609007-65-9）+SX、Ｎ－［２－ブロモ－６－ジフルオロメトキシ－４－（１，１，１，２，３，３，３－ヘプタフルオロプロパン－２－イル）フェニル］－３－｛メチル［（ピリジン－４－イル）カルボニル］アミノ｝－２－メトキシベンズアミド（1630969-78-6）+SX、１－｛２－フルオロ－４－メチル－５－［（２，２，２－トリフルオロエチル）スルフィニル］フェニル｝－３－（トリフルオロメチル）－１Ｈ－１，２，４－トリアゾール－５－アミン（885026-50-6）+SX、BT作物のタンパク質Cry1Ab（BT crop protein Cry1Ab）+SX、BT作物のタンパク質Cry1Ac（BT crop protein Cry1Ac）+SX、BT作物のタンパク質Cry1Fa（BT crop protein Cry1Fa）+SX、BT作物のタンパク質Cry1A.105（BT crop protein Cry1A.105）+SX、BT作物のタンパク質Cry2Ab（BT crop protein Cry2Ab）+SX、BT作物のタンパク質Vip3A（BT crop protein Vip3A）+SX、BT作物のタンパク質Cry3A（BT crop protein Cry3A）+SX、BT作物のタンパク質Cry3Ab（BT crop protein Cry3Ab）+SX、BT作物のタンパク質Cry3Bb（BT crop protein Cry3Bb）+SX、BT作物のタンパク質Cry34Ab1/Cry35Ab1（BT crop protein Cry34Ab1/Cry35Ab1）+SX、アドクソフィエス・オラナ顆粒病ウイルスBV-0001株（Adoxophyes orana granulosis virus BV-0001）+SX、アンチカルシア・ゲマタリス核多角体病ウイルス（Anticarsia gemmatalis mNPV）+SX、オートグラファ・カリフォルニア核多角体病ウイルス（Autographa californica mNPV）+SX、シジア・ポモネラ顆粒病ウイルス V15（Cydia pomonella GV V15）+SX、シジア・ポモネラ顆粒病ウイルスV22（Cydia pomonella GV V22）+SX、クリプトフレビア・ロイコトレタ顆粒病ウイルス（Cryptophlebia leucotreta GV）+SX、デンドロリムス・プンクタタス細胞質多面体ウイルス（Dendrolimus punctatus cypovirus）+SX、ヘリコベルパ・アルミゲラ核多角体病ウイルスBV-0003株（Helicoverpa armigera NPV BV-0003）+SX、ヘリコベルパ・ゼア核多角体病ウイルス（Helicoverpa zea NPV）+SX、リュマントリア・ディスパル核多角体病ウイルス（Lymantria dispar NPV）+SX、マメストラ・ブラシカエ核多角体病ウイルス（Mamestra brassicae NPV）+SX、マメストラ・コンフィグラタ核多角体病ウイルス（Mamestra configurata NPV）+SX、ネオディプリオン・アビエンティス核多角体病ウイルス（Neodiprion abietis NPV）+SX、ネオディプリオン・レコンテイ核多角体病ウイルス（Neodiprion lecontei NPV）+SX、ネオディプリオン・セルティファー核多角体病ウイルス（Neodiprion sertifer NPV）+SX、ノゼマ・ロクスタエ（Nosema locustae）+SX、オルギイア・プソイドツガタ核多角体病ウイルス（Orgyia pseudotsugata NPV）+SX、ピエリス・ラパエ顆粒病ウイルス（Pieris rapae GV）+SX、プロジア・インテルプンクテラ顆粒病ウイルス（Plodia interpunctella GV）+SX、スポドプテラ・エクシグア核多角体病ウイルス（Spodoptera exigua mNPV）+SX、スポドプテラ・リットラリス核多角体病ウイルス（Spodoptera littoralis mNPV）+SX、スポドプテラ・リツラ核多角体病ウイルス（Spodoptera litura NPV）+SX、アルスロボトリス・ダクチロイデス（Arthrobotrys dactyloides）+SX、バチルス・フィルムスGB-126株（Bacillus firmus GB-126）+SX、バチルス・フィルムスI-1582株（Bacillus firmus I-1582）+SX、バチルス・メガテリウム（Bacillus megaterium）+SX、バチルス sp. AQ175株（Bacillus sp.AQ175）+SX、バチルス sp.AQ177株（Bacillus sp.AQ177）+SX、バチルス sp.AQ178株（Bacillus sp.AQ178）+SX、バチルス・スファエリクス2362（Bacillus sphaericus 2362）+SX、バチルス・スファエリクスABTS1743（Bacillus sphaericus ABTS1743）+SX、バチルス・スファエリクスSerotype H5a5b株（Bacillus sphaericus Serotype H5a5b）+SX、バチルス・チューリンゲンシスAQ52株（Bacillus thuringiensis AQ52）+SX、バチルス・チューリンゲンシスBD#32株（Bacillus thuringiensis BD#32）+SX、バチルス・チューリンゲンシスCR-371株（Bacillus thuringiensis CR-371）+SX、バチルス・チューリンゲンシス・アイザワイ亜種ABTS-1857（Bacillus thuringiensis subsp. Aizawai ABTS-1857）+SX、バチルス・チューリンゲンシス・アイザワイ亜種AM65-52株（Bacillus thuringiensis subsp. Aizawai AM65-52）+SX、バチルス・チューリンゲンシス・アイザワイ亜種GC-91（Bacillus thuringiensis subsp. Aizawai GC-91）+SX、バチルス・チューリンゲンシス・アイザワイ亜種Serotype H-7（Bacillus thuringiensis subsp. Aizawai Serotype H-7）+SX、バチルス・チューリンゲンシス・クリスターキ亜種ABTS351株（Bacillus thuringiensis subsp. Kurstaki ABTS351）+SX、バチルス・チューリンゲンシス・クリスターキ亜種BMP123株（Bacillus thuringiensis subsp. Kurstaki BMP123）+SX、バチルス・チューリンゲンシス・クリスターキ亜種EG234株（Bacillus thuringiensis subsp. Kurstaki EG234）+SX、バチルス・チューリンゲンシス・クリスターキ亜種EG7841株（Bacillus thuringiensis subsp. Kurstaki EG7841）+SX、バチルス・チューリンゲンシス・クリスターキ亜種EVB113-19株（Bacillus thuringiensis subsp. Kurstaki EVB113-19）+SX、バチルス・チューリンゲンシス・クリスターキ亜種F810株（Bacillus thuringiensis subsp. Kurstaki F810）+SX、バチルス・チューリンゲンシス・クリスターキ亜種HD-1株（Bacillus thuringiensis subsp. Kurstaki HD-1）+SX、バチルス・チューリンゲンシス・クリスターキ亜種PB54株（Bacillus thuringiensis subsp. Kurstaki PB54）+SX、バチルス・チューリンゲンシス・クリスターキ亜種SA-11株（Bacillus thuringiensis subsp. Kurstaki SA-11）+SX、バチルス・チューリンゲンシス・クリスターキ亜種SA-12株（Bacillus thuringiensis subsp. Kurstaki SA-12）+SX、バチルス・チューリンゲンシス・テネブリオシス亜種NB176株（Bacillus thuringiensis subsp. Tenebriosis NB176）+SX、バチルス・チューリンゲンシス・チューリンゲンシス亜種MPPL002株（Bacillus thuringiensis subsp. Thuringiensis MPPL002）+SX、バチルス・チューリンゲンシス・モリソニ亜種（Bacillus thuringiensis subsp.morrisoni）+SX、バチルス・チューリンゲンシス・コルメリ変種（Bacillus thuringiensis var. colmeri）+SX、バチルス・チューリンゲンシス・ダームスタディエンシス変種24-91株（Bacillus thuringiensis var. darmstadiensis 24-91）+SX、バチルス・チューリンゲンシス・デンドロリムス変種（Bacillus thuringiensis var. dendrolimus）+SX、バチルス・チューリンゲンシス・ガレリア変種（Bacillus thuringiensis var. galleriae）+SX、バチルス・チューリンゲンシス・イスラエレンシス変種BMP144株（Bacillus thuringiensis var. israelensis BMP144）+SX、バチルス・チューリンゲンシス・イスラエレンシス変種serotype H-14（Bacillus thuringiensis var. israelensis serotype H-14）+SX、バチルス・チューリンゲンシス・ジャポネンシス変種buibui株（Bacillus thuringiensis var. japonensis buibui）+SX、バチルス・チューリンゲンシス・サンディエゴ変種M-7株（Bacillus thuringiensis var. san diego M-7）+SX、バチルス・チューリンゲンシス・7216変種（Bacillus thuringiensis var.7216）+SX、バチルス・チューリンゲンシス・アエジプチ変種（Bacillus thuringiensis var.aegypti）+SX、バチルス・チューリンゲンシス・T36変種（Bacillus thuringiensis var.T36）+SX、ボーベリア・バシアーナANT-03株（Beauveria bassiana ANT-03）+SX、ボーベリア・バシアーナATCC74040株（Beauveria bassiana ATCC74040）+SX、ボーベリア・バシアーナGHA株（Beauveria bassiana GHA）+SX、ボーベリア・ブロンニアティ（Beauveria brongniartii）+SX、バークホルデリア・リノジェンシスA396株（Burkholderia rinojensis A396）+SX、クロモバクテリウム・サブツガエPRAA4-1T株（Chromobacterium subtsugae PRAA4-1T）+SX、ダクチレラ・エリプソスポラ（Dactyllela ellipsospora）+SX、デクチラリア・サウマシア（Dectylaria thaumasia）＋SX、ヒルステラ・ミネソテンシス（Hirsutella minnesotensis）+SX、ヒルステラ・ロッシリエンシス（Hirsutella rhossiliensis）+SX、ヒルステラ・トンプソニ（Hirsutella thompsonii）+SX、ラゲニジウム・ギガンテウム（Lagenidium giganteum）+SX、レカニシリウム・レカニ KV01株（Lecanicillium lecanii KV01）+SX、レカニシリウム・レカニDAOM198499株の分生子（Lecanicillium lecanii conidia of strain DAOM198499）+SX、レカニシリウム・レカニDAOM216596株の分生子（Lecanicillium lecanii conidia of strain DAOM216596）+SX、メタリジウム・アニソプリアエF52株（Metarhizium anisopliae F52）+SX、メタリジウム・アニソプリアエ・アクリダム変種（Metarhizium anisopliae var. acridum）+SX、メタリジウム・フラボビリデ（Metarhizium flavoviride）+SX、モナクロスポリウム・フィマトパガム（Monacrosporium phymatopagum）+SX、ペキロマイセス・フモソロセウスApopka97株（Paecilomyces fumosoroseus Apopka97）+SX、ペキロマイセス・リラシナス251株（Paecilomyces lilacinus 251）+SX、ペキロマイセス・テヌイペスT1株（Paecilomyces tenuipes T1）+SX、パエニバチルス・ポピリア（Paenibacillus popilliae）+SX、パスツーリア・ニシザワエPn1株（Pasteuria nishizawae Pn1）+SX、パスツーリア・ペネトランス（Pasteuria penetrans）+SX、パスツーリア・ウスガエ（Pasteuria usgae）+SX、パスツーリア・トイネイ（Pasteuria thoynei）+SX、セラチア・エントモフィラ（Serratia entomophila）+SX、バーティシリウム・クラミドスポリウム（Verticillium chlamydosporium）+SX、バーティシリウム・レカニNCIM1312株（Verticillium lecani NCIM1312）+SX、アセトプロール(acetoprole)+SX、Celastrus angulatus樹皮(bark of Celastrus angulatus)+SX、コンカナマイシンＡ(concanamycin A)+SX、セイヨウオシダ乾燥葉(dried leaves of Dryopteris filix-mas)+SX、ニガヨモギ抽出物(extract of Artemisia absinthium)+SX、Cassia nigricans抽出物(extract of Cassia nigricans)+SX、クリトリア・テルナテアの抽出物(extract of clitoria　ternatea)+SX、ヒレハリソウ抽出物(extract of Symphytum officinale)+SX、アリタソウ抽出物(extracts o
r simulated blend of Chenopodium ambrosioides)+SX、タンジー抽出物(extract of Tanacetum vulgare)+SX、セイヨウイラクサ抽出物(extract of Urtica dioica)+SX、ヤドリギ抽出物(extract of Viscum album)+SX、GS-オメガ/カッパHXTX-Hv1aペプチド(GS-omega/kappa HXTX-Hv1a peptide)+SX、ホップベータ酸のカリウム塩(potassium salt of hop beta acid)+SX、イソシクロセラム(isocycloseram)+SX、レノレマイシン(lenoremycin)+SX、ロチラネル(lotilaner)+SX、ニーム油(neem oil)+SX、アメリカアリタソウ種子油(oil of the seeds of Chenopodium anthelminticum)+SX、アルギニン酸プロピレングリコール(propylene glycol alginate)+SX、リアノジン(ryanodine)+SX、サロラネル(sarolaner)+SX、アリタソウから抽出したテルペン成分(terpene constituents of the extract of chenopodium ambrosioides near ambrosioides)+SX、スリナムニガキ木材抽出成分(wood extract of Quassia amara)+SX、Metarhizium anisopliae var. anisopliae BIPESCO 5/F52 + SX、Lecanicillium muscarium Ve6 + SX、N-ethyl-5-methyl-1-(3-methylbutan-2-yl)-N-(pyridazin-4-yl)-1H-pyrazole-4-carboxamide (1403615-77-9) + SX。 Combinations of the present component of the above group (a) with the compound of the present invention
Abamectin + SX, acephate + SX, acequinocyl + SX, acetamiprid + SX, acririnathrin + SX, acynonapyr + SX, afidopyropene + SX, afoxolaneal (Afoxolaner) + SX, alaniccarb (alanycarb) + SX, aldicarb (aldicarb) + SX, allethrin + SX, alpha-cypermethrin (alpha-cypermethrin) + SX, alpha-endosulfan (alpha-endosulfan) + SX, phosphorylated Aluminum (phosphide) + SX, amitraz (Amitraz) + SX, azadirachtin + SX, azamethiphos (Azamethiphos) + SX, azinphos-ethyl (azinphos-ethyl) + SX, azinphos-methyl (azinphos-methyl) + SX, azocyclotin (azocyclotintin) ) + SX, bendiocarb (bendiocarb) + SX, benfluthrin (benfluthrin) + SX, ben Flacarb (benfuracarb) + SX, bensultap (Sensultap) + SX, benzoximate (benzoximate) + SX, benzpyrimoxan (benzpyrimoxan) + SX, beta cyfluthrin (beta-cyfluthrin) + SX, betacypermethrin (beta) -cypermethrin) + SX, bifenazate + SX, bifenthrin + SX, bioallethrin + SX, bioresmethrin + SX, bistrifluron + SX, borax (borax) + SX, boric acid + SX, broflanilide + SX, bromopropylate + SX, buprofezin + SX, butocarboxim + SX, butoxycarboxim + SX, cadusafos + SX, calcium cyanide + SX, calcium phosphide + SX, carbaryl + SX, Carbofuran (carbofuran) + SX, carbosulfan (carbosulfan) + SX, cartap hydrochloride (cartap hydrochloride) + SX, cartap (cartap) + SX, kinomethionate (Xinomethionat) + SX, chlorantraniliprole (X chlorantraniliprole) + SX , Chorordan + SX, chlorethoxyfos + SX, chlorfenapyr + SX, chlorfenvinphos + SX, chlorfluazuron + SX, chlormephos (chlormephos) + SX, chlorpicrin (Chloropicrin) + SX, chlorpyrifos (chlorpyrifos) + SX, chlorpyrifos-methyl (chlorpyrifos-methyl) + SX, chromafenozide + SX, clofenthezine + SX, clothianidin (clothianidin) + SX, coumaphos (coumaphos) + SX, cryolite (Cryolite) + SX, cyanophos (cyanophos) + SX, cyan toranili Prorol (cyantraniliprole) + SX, cyclaniliprole (cyclonyliprole) + SX, cycloprothrin (cycloprothrin) + SX, cycloxaprid (cycloxaprid) + SX, sienopyraphen (cycloeprafen) + SX, ciflumethofen (cyflumetofen) + SX, cyfluthrin (cyfluthrin (cyfluthrin (cyfluthrin (cyfluthrin (cyfluthrin)) ) + SX, cyhalodiamide + SX, cyhalothrin + SX, cyhexatin + SX, cypermethrin + SX, cyphenothrin + SX, cyromazine + SX, dazomet (d) dazomet) + SX, deltamethrin (deltamethrin) + SX, demeton-S-methyl (demeton-S-methyl) + SX, diafenthiuron (diafenthiuron) + SX, diazinon (diazinon) + SX, dichlorvos (dichlorvos) + SX , Dichloromezotiaz + SX, Dicofol + SX, Dicrotophos + SX, Diflovidazine (diflovi) dazin) + SX, diflubenzuron + SX, dimefluthrin + SX, dimethoate + SX, dimethylvinphos (dimethylvinphos) + SX, dinotefuran + SX, disodium octaborate octaborate ) + SX, disulfoton (disulfoton) + SX, DNOC (2-methyl-4, 6-dinitrophenol) + SX, doramectin + SX, emamectin benzoate + SX, empenthrin + SX, endosulfan (endosulfan) + SX, EPN (O-ethyl O- (4-nitrophenyl) phenylphosphonothioate) + SX, epsilon methofluthrin (epsilon-metofluthrin) + SX, epsilon monfluorothrin (epsilon-momfluorothrin) + SX, Esfenvalerate + SX, ethiophencarb + SX, ethion + SX, ethiprole + SX, ethoprophos + SX, Tofenprox (etofenprox) + SX, etoxazole (Stoxazole) + SX, fenfur (famphur) + SX, fenamiphos (fenamiphos) + SX, fenazaquin + SX, fenbutatin oxide + SX, fenitrothion (fennitrothion) ) + SX, fenobucarb (fenobucarb) + SX, fenoxycarb (Fenoxycarb) + SX, fenpropathrin (fenpropathrin) + SX, fenpyroximate (fenpyroximate) + SX, fenthion (fenthion) + SX, fenvalerate (Sexvalerate) + SX, Fipronil (fipronil) + SX, flometoquin + SX, flonicamid (flonicamide) + SX, fluacrypirim (Sac) + SX, fluaza indolizine (Fluazaindolizine) + SX, fluazuron (fluazuron) + SX, flubendiamide (flubendiamide) + SX, flucycloxuron + SX, flucythrinate + S X, fluensulfone + SX, flufenoprox + SX, flufenoxuron + SX, flufiprole + SX, flumethrin + SX, fluopyram + SX , Flupyradifurone + SX, flupyrimin + SX, fluralaner + SX, fluvalinate + SX, fluxamethamide + SX, formetanate + SX, fosthiazet + SX Framethrin + SX, furathiocarb + SX, gamma-cyhalothrin + SX, halfenprox + SX, halofenozide + SX, heptafluthrin + SX, heptenophos + sx, hexaflumuron + SX, hexythiazox (hex ythiazox) + SX, hydramethylnon (hydramethylnon) + SX, hydroprene (hydroprene) + SX, imicyafos (imicyafos) + SX, imidacloprid + SX, imiprothrin + SX, indoxacarb (indooxacarb) + SX , Isophenphos (isofenphos) + SX, isoprocarb (isoprocarb) + SX, isopropyl O- (methoxyaminothiophosphoryl) salicylate (isopropyl-O-(methoxyaminothiophosphoryl) salicylate) + SX, isoxathion + SX, ivermectin + SX, kadethrin + SX, kappa-tefluthrin + SX, kappa-bifenthrin + SX, kinoprene + SX, lambda-cyhalothrin + SX, repimectin (Lepimectin) + SX, lime sulfur combination (lime sulfur) + SX, lufenuron (lufenuron) + SX, machine oil (machine oil) + SX, malathion + SX, mecarbam (mecarbam) + SX, meperfluthrin (meperfluthrin) + SX, metaflumizone (metaflumizone) + SX, metam (metam) + SX, methamidophos (methamidophos) + SX, methidathion + SX , Methiocarb + SX, methomyl + SX, methoprene (methoprene) + SX, methoxychlor + SX, methoxyfenozide + SX, methyl bromide + SX, methofutrin (metofluthrin) + SX, metolcarb + SX, methoxadiazone (SX), mevinphos (mevinphos) + SX, milbemectin + SX, milbemycin oxime + SX, monfluorothrin + SX, monochrome Topos (monocrotophos) + SX, moxidectin (moxidectin) + SX, nared (naled) + SX, nicotine (nicotine) + SX, Nicotine-Sulphate + SX, Nitenpyram (Nitenpyram) + SX, Novaluron (Novaluron) + SX, Noviflumuron + SX, Omethoate + SX, Oxamyl (OXamyl) + SX, Oxydimethone Methyl (oxydemeton-methyl) + SX, parathion + SX, parathion methyl (parathion-methyl) + SX, permethrin + SX, phenothrin + SX, phenthoate + SX, phorate ) + SX, phosalone (Psalone) + SX, phosmet (phosmet) + SX, phosphamidon (phosphamidon) + SX, phosphine (phosphine) + SX, phoxim (phoxim) + SX, pirimicarb (pirimicarb) + SX, pirimiphos-methyl (pirimiphos- methyl) + SX, potassium cyanide (potassium cyanide) + SX, prallethrin + SX, profenofos + 10 SX, profluthrin + SX, Propargite + SX, propetamphos + SX, propoxur + SX, prothiophos (prothiofos) + SX, pyflubumide + SX, pymetrozine + SX, pyraclofos (Pyraclofos + SX, pyrethrin (Pyrethrins) + SX, pyridaben + SX, pyridalyl + SX, pyridaphenthion + SX, pyrifluquinazone + SX, pyrimidifen + SX, pyriminostrobin + SX , Pyriprole + SX, pyriproxyfen + SX, quinalphos (X), resmethrin + SX, rotenone + SX, selamectin + SX, sigma cypermethrin (sigma -cypermethrin) + SX, silafluofen + SX, sodium borate + sodium SX, Sodium cyanide (Sydium cyanide) + SX, sodium metaborate (sodium metaborate) + SX, spinetoram (spinetoram) + SX, spinosad (spinosad) + SX, spirodiclofen (spirodiclofen) + SX, spiromesifen (spiromesifen) + SX, spiropidion + SX, spirotetramat + SX, sulfluramid (sulfluramid) + SX, sulfotep (sulfotep) + SX, sulfoxaflor (sulfofaflor) + SX, sulfur (sulfur) + SX, sulfuryl fluoride sulfuryl fluoride) + SX, tartar emetic + SX, tau-fluvalinate (tau-fluvalinate) + SX, tebufenozide + SX, tebufenpyrad + SX, tebupilimfos (tebupirimfos) + SX, teflubenzone ( teflubenzuron) + SX, tefluthrin + SX, temephos (temephos) + SX, terbufos (terbufos) + SX, tetrachlorvinphos (tetrach) lorvinphos) + SX, tetradiphone (Stradifon) + SX, tetramethrin (tetramethrin) + SX, tetramethylfluthrin (tetramethylfluthrin) + SX, tetraniliprol (tetraniliprole) + SX, theta-cypermethrin (theta-cypermethrin) + SX, thiacloprid (Thiacloprid) + SX, thiamethoxam + SX, thiocyclam (Siocyclam) + SX, thiodicarb (thiodicarb) + SX, thiophanox (Siofanox) + SX, thiometon (thiometon) + SX, thiosultap disodium salt (thiosultap- disodium + SX, thiosultap monosodium salt (thiosultap-monosodium) + SX, tiozazafen (tioxazafen) + SX, tolfenpyrad + SX, tralomethrin + SX, transfluthrin (transfluthrin) + SX, triazamate ) + SX, triazophos + SX, tricholfon + SX, Furumezopirimu (triflumezopyrim) + SX, triflumuron (triflumuron) + SX, trimethacarb (trimethacarb) + SX, cyclamate pyrazolium Furoru (tyclopyrazoflor) +
SX, vamidothione + SX, XMC (3,5-dimethylphenyl N-methylcarbamate) + SX, xylylcarb (xylylcarb) + SX, zetacypermethrin (zeta-cypermethrin) + SX, zinc phosphide (zinc phosphide) + SX , 3-bromo-N- [2,4-dichloro-6- (methylcarbamoyl) phenyl] -1- (3,5-dichloropyridin-2-yl) -1H-pyrazole-5-carboxamide (1104384-14- 6) + SX, N- [3-chloro-1- (pyridin-3-yl) -1H-pyrazol-4-yl] -N-ethyl-3- (3,3,3-trifluoropropanesulfinyl) propane Amide (1477923-37-7) + SX, 2- [3- (ethanesulfonyl) pyridin-2-yl] -5- (trifluoromethanesulfonyl) benzoxazole (1616678-32-0) + SX, 4- [5 -(3,5-dichlorophenyl) -5- Trifluoromethyl) -4,5-dihydro-1,2-oxazol-3-yl] -2-methyl-N- (1-oxothietan-3-yl) benzamide (1241050-20-3) + SX, 3- Methoxy-N- (5- {5- (trifluoromethyl) -5- [3- (trifluoromethyl) phenyl] -4,5-dihydro-1,2-oxazol-3-yl} indan-1-yl ) Propanamide (1118626-57-5) + SX, N- [2-bromo-6-chloro-4- (1,1,1,2,3,3,3-heptafluoropropan-2-yl) phenyl ] -3- {ethyl [(pyridin-4-yl) carbonyl] amino} -2-methoxybenzamide (1429513-53-0) + SX, N- [2-bromo-6-chloro-4- (1,1) 1,2,3,3,3-heptafluoropropan-2-yl) phenyl]- 3- [ethyl (4-cyanobenzoyl) amino] -2-methoxybenzamide (1609007-65-9) + SX, N- [2-bromo-6-difluoromethoxy-4- (1,1,1,2,3, 3,3,3-heptafluoropropan-2-yl) phenyl] -3- {methyl [(pyridin-4-yl) carbonyl] amino} -2-methoxybenzamide (1630969-78-6) + SX, 1- {2-Fluoro-4-methyl-5-[(2,2,2-trifluoroethyl) sulfinyl] phenyl} -3- (trifluoromethyl) -1H-1,2,4-triazol-5-amine ( 885026-50-6) + SX, BT crop protein Cry 1 Ab (BT crop protein Cry 1 Ab) + SX, BT crop protein Cry 1 Ac (BT crop protein Cry 1 Ac) + SX, BT crop protein Cry 1 Fa (BT crop protein Cry 1 Fa) + SX , BT crop protein Cry1A.105 (BT crop protein Cry1A.105) + S X, BT crop protein Cry2Ab (BT crop protein Cry2Ab) + SX, BT crop protein Vip3A (BT crop protein Vip3A) + SX, BT crop protein Cry3A (BT crop protein Cry3A) + SX, BT crop protein Cry3Ab (BT crop protein) BT crop protein Cry3Ab) + SX, BT crop protein Cry3Bb (BT crop protein Cry3Bb) + SX, BT crop protein Cry34Ab1 / Cry35Ab1 (BT crop protein Cry34Ab1 / Cry35Ab1) + SX, adococcus olana granulosa virus BV-0001 strain (Adoxophyes orana granulosis virus BV-0001) + SX, Anticarsia gematalis nuclear polyhedrosis virus (Anticarsia gemmatalis mNPV) + SX, Autographa california nuclear polyhedrosis virus (Autographa californica mNPV) + SX, Sidia pomonera granules Disease virus V15 (Cydia pomonella GV V15) + SX, C. pomonella granule disease virus V22 (Cydia pomonella GV V22) + SX, Cryptofrebbia leukotleta granule disease virus (Cryptophlebia leucotreta GV) + SX, Dendrolimus punctatus cytosolic virus (Dendrolimus punctatus cypovirus) + SX, Helicoverpa armigera nuclear polyhedrosis virus BV-0003 strain (Helicoverpa armigera NPV BV-0003) + SX, Helicoverpa zea nuclear polyhedra Disease virus (Helicoverpa zea NPV) + SX, Lymantria dispar nucleopolyhedrovirus (Lymantria dispar NPV) + SX, マ メ ・ カ カ 多角 (Mamestra brassicae NPV) + SX, ス ト ラ ・ コ ン フ ィ グ 多角 多角Virus (Mamestra configurata NPV) + SX, Neodiprion abientis nuclear polyhedrosis virus (Neodiprion abietis NPV) + SX, Neodiprion recontei nuclear polyhedrosis virus (Neodiprion lecontei NPV) + SX, Neodiprion Celty Far nuclear polyhedrosis virus (Neodiprion sertifer NPV) + SX, Nozema rokusutae (Nosema locust ae) SX, Orgiia pseudotsugata nuclear polyhedrosis virus (Orgyia pseudotsugata NPV) + SX, Pieris rapae granular disease virus (Pieris rapae GV) + SX, Plodia interpunctella GV (Plodia interpunctella GV) + SX Spodoptera exigua nuclear polyhedrosis virus (Spodoptera exigua mNPV) + SX, Spodoptera littoralis nuclear polyhedrosis virus (Spodoptera littoralis mNPV) + SX, Spodoptera litura nuclear polyhedrosis virus (Spodoptera litura NPV) + SX, Arsus Robotris dactyloides + SX, Bacillus films GB-126 strain (Bacillus firmus GB-126) + SX, Bacillus films I-1582 strain (Bacillus firmus I-1582) + SX, Bacillus megaterium (Bacillus megaterium) + SX, Bacillus sp. Strain AQ175 (Bacillus sp. AQ 175) + SX, Bacillus sp. Strain AQ 177 (Bacillus sp. AQ 177) + SX, Bacillus sp. Strain AQ 178 (Bacillus sp. AQ 178) + SX, Bacillus sphaericus 2362 (Bacillus sphaericus 2362) + SX, Bacillus sphaericus ABTS 1743 (Bacillus sphaericus ABTS 1743) + SX, Bacillus sphaericus Serotype H5a 5b (Bacillus sphaericus Serotype H 5 a 5 b) + SX, Bacillus c. Thuringiensis AQ 52 strain (Bacillus thuringiensis AQ 52) + SX, Bacillus thuringiensis BD # 32 strain (Bacillus thuringiensis BD # 32) + SX, Bacillus thuringiensis CR-371 strain (Bacillus thuringiensis CR- 371) + SX, Bacillus. Thuringiasis ・ Aiwai subspecies ABTS-1857 (Bacillus thuringiensis subsp. Aizawai ABTS-1857) + SX, Bacillus thuringiensis ・ Aiwai subspecies AM 65-52 strain (Bacillus thuringiensis subsp. Aizawai AM 65-52) + SX, Bacillus thuringia Cis ai wai subspecies GC-91 (Bacillus thuringiensis subsp. Aizawai GC-91) + SX, Bacillus thuringiensis a Awawai subspecies Serotype H-7 (Bacillus thuringiensis subsp. Aizawai Serotype H-7) + SX, Bacillus thuringiensis subsp. ABTS 351 strain (Bacillus thuringiensis subsp. Kurstaki ABTS 351) + SX, Bacillus thuringiensis cristae subspecies BMP123 strain (Bacillus thuringiensis subsp. Kurstaki BMP123) + SX, Bacillus thuringiensis ・ crista chia sp. Strain EG234 (Bacillus thuringiensis subsp. Kurstaki EG234) + SX, Bacillus thuringiensis cristarch strain EG 7841 (Bacillus thuringiensis subsp. Kurstaki) EG7841) + SX, Bacillus thuringiensis cristaea subsp. EVB 113-19 (Bacillus thuringiensis subsp. Kurstaki EVB 113-19) + SX, Bacillus thuringiensis cristae subsp. F 810 (Bacillus thuringiensis subsp. Kurstaki F 810) + SX , Bacillus thuringiensis cristae subsp. HD-1 strain (Bacillus thuringie nsis subsp. Kurstaki HD-1) + SX, Bacillus thuringiensis cristae subsp. PB54 (Bacillus thuringiensis subsp. Kurstaki PB 54) + SX, Bacillus thuringiensis cristae subsp. SA-11 (Bacillus thuringiensis subsp. Kurstaki SA-11) + SX, Bacillus thuringiensis subsp. SA-12 strain (Bacillus thuringiensis subsp. Kurstaki SA-12) + SX, Bacillus thuringiensis tenebriosis sub strain NB 176 (Bacillus thuringiensis subsp. Tenebriosis NB176) + SX, Bacillus thuringiensis thuringiensis subsp. Strain MPPL 002 (Bacillus thuringiensis subsp. Thuringiensis MPPL 002) + SX, Bacillus thuringiensis morisoni subsp. (Bacillus thuringiensis subsp. Morrisoni) + SX, Bacillus thuringiensis Kolmelli variant (Bacillus thuringiensis var. Colmeri) + SX, Bacillus thuringiensis derm Tadiensis variant 24-91 (Bacillus thuringiensis var. Darmstadiensis 24-91) + SX, Bacillus thuringiensis dendolimus variant (Bacillus thuringiensis var. Dendrolimus) + SX, Bacillus thuringiensis galleria variant (Bacillus thuringiensis var. (Galleria e) + SX, Bacillus thuringiensis israelensis variant BMP144 strain (Bacillus thuringiensis var. israelensis BMP144) + SX, Bacillus thuringiensis israelensis variant serotype H-14 (Bacillus thuringiensis var. israelensis serotype H-14) ) + SX, Bacillus thuringiensis-Japonensis variant buibui strain (Bacillus thuringiensis var. Japonensis buibui) + SX, Bacillus thuringiensis-San Diego variant M-7 strain (Bacillus thuringiensis var. San diego M-7) + SX, Bacillus · Thuringiasis · 7216 variant (Bacillus thuringiensis var. 7216) + SX, batil Thuringiensis aegypti variants (Bacillus thuringiensis var. Aegypti) + SX, Bacillus thuringiensis T36 variants (Bacillus thuringiensis var. T36) + SX, Bovelia basiana ANT-03 strain (Beauvelia bassiana ANT-03) + SX, Bovelia basiana strain ATCC 74040 (Beauvelia bassiana ATCC 74040) + SX, bovelia basiana strain GHA (Beauveria bassiana GHA) + SX, bovelia bronniartii + SX; , Chromobacterium subsp. PRAA4-1T (Chromobacterium subtsugae PRAA4-1T) + SX, Dactylella ellipsospora + SX, Dectylaria thaumasia + SX, Hilstera minesose sis Hirsutella rhossiliensis + SX Hilstera thompsonii (Hirsutella thompsonii) + SX, Lagenidium giganteum (Lagenidium giganteum) + SX, Lecanicillium lecani strain KV01 (Lecanicillium lecanii KV01) + SX, Leconicillitraceitraceilium SX, conidia (Lecanicillium lecanii conidia of strain DAOM216596) + SX, Metamysium anisopliae F 52 strain (Metarhizium anisopliae F 52) + SX, metharrhizium anisopliae acridum variant (Meterhidiumi v. Al. Metarhizium flavoviride (Metarhizium flavoviride) + SX, Monacrosporium phymatopagum (Monacrosporium phymatopagum) + SX, Pequimyces fumosoroseus Apopka 97 strain (Paecilomyces fumosoroseus Apopka 97) + SX, Pequimyces lilacinacium 251 + SX, Pectomyces tenuipes T1 strain (Paecilomyces tenuipes T1) + SX, Paenibacillus popilliae + SX, Pasteuria nishizawae Pn1 strain (Pasteuria nishizawae Pn1) + SX, Pasteuria penetra・ Usgae (Pasteuria usgae) + SX, Pasteuria · Toinei (Pasteuria thoynei) + SX, Serratia entomophila (Serratia entomophila) + SX, Verticillium · Chlamydosporium + SX, Verticillium · Recani NCIM 1312 strain (Verticillium lecani NCIM 1312) + SX, acetoprole (acetoprole) + SX, Celastrus angulatus bark (bark of Celastrus angulatus) + SX, concanamycin A (concanamycin A) + SX, sun leaf dried leaves (dried leaves of Dryopteris filix -mas) + SX, extract of Artemisia absinthium + SX, Cassia nigricans extract (extract of Ca ssia nigricans) + SX, extract of clitoria ternatea + SX, extract of Symphytum officinale + SX, extract of common lice (extracts o
r simulated blended of Chenopodium ambrosioides + SX, extract of Tanacetum vulgare + SX, Stinging nettle extract (extract of Urtica dioica) + SX, mistletoe extract (extract of Viscum album) + SX, GS-Omega / Kappa HXTX-Hv1a peptide (GS-omega / kappa HXTX-Hv1a peptide) + SX, potassium salt of hops beta acid (potassium salt of hop beta acid) + SX, isocycloceram (isocycloseram) + SX, lenolemycin (lenoremycin) + SX, lotilaner + SX, neem oil (neem oil) + SX, oil of the seeds of Chenopodium anthelminticum + SX, propylene glycol alginate, SX, ryanodine ( ryanodine + SX, sarolaner + SX, terpene component (terpene constituents of the extract of chenopodium ambrosioides near ambrosioides) + SX, wood extract of Quasisia amara + SX, Metarhizium anisoso pliae var. anisopliae BIPESCO 5 / F 52 + SX, Lecanicillium muscarium Ve6 + SX, N-ethyl-5-methyl-1- (3-methylbutan-2-yl) -N- (pyridazin-4-yl) -1H-pyrazole -4-carboxamide (1403615-77-9) + SX.
　上記群（ｂ）の本成分と本発明化合物Ｘとの組み合わせ：
　アシベンゾラルSメチル（acibenzolar-S-methyl）+SX、アルジモルフ（aldimorph）+SX、アメトクトラジン（ametoctradin）+SX、アミノピリフェン(aminopyrifen)+SX、アミスルブロム（amisulbrom）+SX、アニラジン（anilazine）+SX、アザコナゾール（azaconazole）+SX、アゾキシストロビン（azoxystrobin）+SX、塩基性塩化銅（copper oxychloride）+SX、塩基性硫酸銅（basic copper sulfate）+SX、ベナラキシル（benalaxyl）+SX、ベナラキシルM（benalaxyl-M）+SX、ベノダニル（benodanil）+SX、ベノミル（benomyl）+SX、ベンチアバリカルブ（benthiavalicarb）+SX、ベンチアバリカルブイソプロピル（benthivalicarb-isopropyl）+SX、ベンゾビンジフルピル（benzovindiflupyr）+SX、ビナパクリル（binapacryl）+SX、ビフェニル（biphenyl）+SX、ビテルタノール（bitertanol）+SX、ビキサフェン（bixafen）+SX、ブラストサイジンS（blasticidin-S）+SX、ボスカリド（boscalid）+SX、ブロムコナゾール（bromuconazole）+SX、ブピリメート（bupirimate）+SX、キャプタホール（captafol）+SX、キャプタン（captan）+SX、カルベンダジム（carbendazim）+SX、カルボキシン（carboxin）+SX、カルプロパミド（carpropamid）+SX、キノメチオナート（chinomethionat）+SX、クロロネブ（chloroneb）+SX、クロロタロニル（chlorothalonil）+SX、クロゾリネート（chlozolinate）+SX、コレトクロリンＢ（colletochlorin B）+SX、水酸化銅(II)（copper(II) hydroxide）+SX、クモキシストロビン（coumoxystrobin）+SX、シアゾファミド（cyazofamid）+SX、シフルフェナミド（cyflufenamid）+SX、シモキサニル（cymoxanil）+SX、シプロコナゾール（cyproconazole）+SX、シプロジニル（cyprodinil）+SX、ジクロベンチアゾクス（dichlobentiazox）+SX、ジクロフルアニド（dichlofluanid）+SX、ジクロシメット（diclocymet）+SX、ジクロメジン（diclomezine）+SX、ジクロラン（dicloran）+SX、ジエトフェンカルブ（diethofencarb）+SX、ジフェノコナゾール（difenoconazole）+SX、ジフルメトリム（diflumetorim）+SX、ジメタクロン（dimethachlone）+SX、ジメチリモール（dimethirimol）+SX、ジメトモルフ（dimethomorph）+SX、ジモキシストロビン（dimoxystrobin）+SX、ジニコナゾール（diniconazole）+SX、ジニコナゾールM（diniconazole－M）+SX、ジノカップ（dinocap）+SX、ジピメティトロン（dipymetitrone）+SX、ジチアノン（dithianon）+SX、ドデシルベンゼンスルホン酸ビスエチレンジアミン銅(II)錯塩（dodecylbenzenesulphonic acid bisethylenediamine　copper(II) salt）+SX、ドデモルフ（dodemorph）+SX、ドジン（dodine）+SX、エジフェンホス（edifenphos）+SX、エノキサストロビン（enoxastrobin）+SX、エポキシコナゾール（epoxiconazole）+SX、エタコナゾール（etaconazole）+SX、エタボキサム（ethaboxam）+SX、エチリモール（ethirimol）+SX、エトリジアゾール（etridiazole）+SX、ファモキサドン（famoxadone）+SX、フェンアミドン（fenamidone）+SX、フェナミンストロビン（fenaminstrobin）+SX、フェナリモル（fenarimol）+SX、フェンブコナゾール（fenbuconazole）+SX、フェンフラム（fenfuram）+SX、フェンヘキサミド（fenhexamid）+SX、フェノキサニル（fenoxanil）+SX、フェンピクロニル（fenpiclonil）+SX、フェンピコキサミド（fenpicoxamid）+SX、フェンプロピジン（fenpropidin）+SX、フェンプロピモルフ（fenpropimorph）+SX、フェンピラザミン（fenpyrazamine）+SX、酢酸トリフェニル錫（fentin acetate）+SX、塩化トリフェニル錫（fentin chloride）+SX、水酸化トリフェニル錫（fentin hydroxide）+SX、フェルバム（ferbam）+SX、フェリムゾン（ferimzone）+SX、フルアジナム（fluazinam）+SX、フルジオキソニル（fludioxonil）+SX、フルフェノキシストロビン（flufenoxystrobin）+SX、フルインダピル（fluindapyr）+SX、フルモルフ（flumorph）+SX、フルオピコリド（fluopicolide）+SX、フルオルイミド（fluoroimide）+SX、フルオキサストロビン（fluoxastrobin）+SX、フルキンコナゾール（fluquinconazole）+SX、フルシラゾール（flusilazole）+SX、フルスルファミド（flusulfamide）+SX、フルチアニル（flutianil）+SX、フルトラニル（flutolanil）+SX、フルトリアホール（flutriafol）+SX、フルキサピロキサド（fluxapyroxad）+SX、ホルペット（folpet）+SX、ホセチル（fosetyl）+SX、フベリダゾール（fuberidazole）+SX、フララキシル（furalaxyl）+SX、フラメトピル（furametpyr）+SX、グアザチン（guazatine）+SX、ヘキサコナゾール（hexaconazole）+SX、ヒメキサゾール（hymexazole）+SX、イマザリル（imazalil）+SX、イミベンコナゾール（imibenconazole）+SX、イミノクタジン（iminoctadine）+SX、ヨードカルブ（iodocarb）+SX、イプコナゾール（ipconazole）+SX、イプフェントリフルコナゾール（ipfentrifluconazole）+SX、イプロベンホス（iprobenfos）+SX、イプロジオン（iprodione）+SX、イプロバリカルブ（iprovalicarb）+SX、イソフェタミド（isofetamid）+SX、イソフルシプラム（isoflucypram）+SX、イソプロチオラン（isoprothiolane）+SX、イソピラザム（isopyrazam）+SX、イソチアニル（isotianil）+SX、カスガマイシン（kasugamycin）+SX、クレソキシムメチル（kresoxim-methyl）+SX、ラミナリン（laminarin）+SX、マンコゼブ（mancozeb）+SX、マンデストロビン（mandestrobin）+SX、マンジプロパミド（mandipropamid）+SX、マンネブ（maneb）+SX、メフェントリフルコナゾール（mefentrifluconazole）+SX、メパニピリム（mepanipyrim）+SX、メプロニル（mepronil）+SX、メプチルジノカップ（meptyldinocap）+SX、メタラキシル（metalaxyl）+SX、メタラキシルM（metalaxyl-M）+SX、メトコナゾール（metconazole）+SX、メタスルホカルブ（methasulfocarb）+SX、メチラム（metiram）+SX、メトミノストロビン（metominostrobin）+SX、メトラフェノン（metrafenone）+SX、ミクロブタニル（myclobutanil）+SX、ナフチフィン（naftifine）+SX、ヌアリモール（nuarimol）+SX、オクチリノン（octhilinone）+SX、オフラセ（ofurace）+SX、オリサストロビン（orysastrobin）+SX、オキサジキシル（oxadixyl）+SX、オキサチアピプロリン（oxathiapiprolin）+SX、オキソリニック酸（oxolinic acid）+SX、オキスポコナゾール（oxpoconazole）+SX、オキスポコナゾールフマル酸塩（oxpoconazole fumarate）+SX、オキシカルボキシン（oxycarboxin）+SX、オキシテトラサイクリン（oxytetracycline）+SX、ペフラゾエート（pefurazoate）+SX、ペンコナゾール（penconazole）+SX、ペンシクロン（pencycuron）+SX、ペンフルフェン（penflufen）+SX、ペンチオピラド（penthiopyrad）+SX、フェナマクリル（phenamacril）+SX、フサライド（phthalide）+SX、ピカルブトラゾクス（picarbutrazox）+SX、ピコキシストロビン（picoxystrobin）+SX、ピペラリン（piperalin）+SX、ポリオキシン（polyoxins）+SX、プロベナゾール（probenazole）+SX、プロクロラズ（prochloraz）+SX、プロシミドン（procymidone）+SX、プロパモカルブ（propamocarb）+SX、プロピコナゾール（propiconazole）+SX、プロピネブ（propineb）+SX、プロキナジド（proquinazid）+SX、プロチオカルブ（prothiocarb）+SX、プロチオコナゾール（prothioconazole）+SX、ピジフルメトフェン（pydiflumetofen）+SX、ピラクロストロビン（pyraclostrobin）+SX、ピラメトストロビン（pyrametostrobin）+SX、ピラオキシストロビン（pyraoxystrobin）+SX、ピラプロポイン（pyrapropoyne）+SX、ピラジフルミド（pyraziflumid）+SX、ピラゾホス（pyrazophos）+SX、ピリベンカルブ（pyribencarb）+SX、ピリブチカルブ（pyributicarb）+SX、ピリフェノックス（pyrifenox）+SX、ピリメタニル（pyrimethanil）+SX、ピリモルフ（pyrimorph）+SX、ピリオフェノン（pyriofenone）+SX、ピリソキサゾール（pyrisoxazole）+SX、ピロキロン（pyroquilon）+SX、キノフメリン（quinofumelin）+SX、キノキシフェン（quinoxyfen）+SX、キントゼン（quintozene）+SX、セダキサン（sedaxane）+SX、シルチオファム（silthiofam）+SX、シメコナゾール（simeconazole）+SX、スピロキサミン（spiroxamine）+SX、ストレプトマイシン（streptomycin）+SX、硫黄（sulfur）+SX、テブコナゾール（tebuconazole）+SX、テブフロキン（tebufloquin）+SX、テクロフタラム（teclofthalam）+SX、テクナゼン（tecnazene）+SX、テルビナフィン（terbinafine）+SX、テトラコナゾール（tetraconazole）+SX、チアベンダゾール（thiabendazole）+SX、チフルザミド（thifluzamide）+SX、チオファネート（thiophanate）+SX、チオファネートメチル（thiophanate-methyl）+SX、チウラム（thiram）+SX、チアジニル（tiadinil）+SX、トルクロホスメチル（tolclofos-methyl）+SX、トルフェンピラド（tolfenpyrad）+SX、トルプロカルブ（tolprocarb）+SX、トリルフルアニド（tolylfluanid）+SX、トリアジメホン（triadimefon）+SX、トリアジメノール（triadimenol）+SX、トリアゾキシド（triazoxide）+SX、トリクロピリカルブ（triclopyricarb）+SX、トリシクラゾール（tricyclazole）+SX、トリデモルフ（tridemorph）+SX、トリフロキシストロビン（trifloxystrobin）+SX、トリフルミゾール（triflumizole）+SX、トリホリン（triforine）+SX、トリチコナゾール（triticonazole）+SX、バリダマイシン（validamycin）+SX、バリフェナレート（valifenalate）+SX、ビンクロゾリン（vinclozolin）+SX、ジネブ（zineb）+SX、ジラム（ziram）+SX、ゾキサミド（zoxamide）+SX、３－（ジフルオロメチル）－Ｎ－メトキシ－１－メチル－Ｎ－［（１Ｒ）－１－メチル－２－（２，４，６－トリクロロフェニル）エチル］ピラゾール－４－カルボキサミド（1639015-48-7）+SX、３－（ジフルオロメチル）－Ｎ－メトキシ－１－メチル－Ｎ－［（１Ｓ）－１－メチル－２－（２，４，６－トリクロロフェニル）エチル］ピラゾール－４－カルボキサミド（1639015-49-8）+SX、３－（ジフルオロメチル）－１－メチル－Ｎ－（１，１，３－トリメチルインダン－４－イル）ピラゾール－４－カルボキサミド（141573-94-6）+SX、３－（ジフルオロメチル）－１－メチル－Ｎ－［（３Ｒ）－１，１，３－トリメチルインダン－４－イル］ピラゾール－４－カルボキサミド（1352994-67-2）+SX、３－（ジフルオロメチル）－Ｎ－［（３Ｒ）－７－フルオロ－１，１，３－トリメチルインダン－４－イル］－１－メチルピラゾール－４－カルボキサミド（1513466-73-3）+SX、３－クロロ－５－フェニル－６－メチル－４－（２，６－ジフルオロフェニル）ピリダジン（1358061-55-8）+SX、Ｎ’－［４－（｛３－［（４－クロロフェニル）メチル］－１，２，４－チアジアゾール－５－イル｝オキシ）－２，５－ジメチルフェニル］－Ｎ－エチル－Ｎ－メチルメタンイミドアミド（1202781-91-6）+SX、２－｛３－［２－（１－｛［３，５－ビス（ジフルオロメチル）－１H－ピラゾール－１－イル］アセチル｝ピペリジン－４－イル）－１，３－チアゾール－４－イル］－４，５－ジヒドロ－１，２－オキサゾール－５－イル｝－３－クロロフェニル＝メタンスルホナ－ト（1360819-11-9）+SX、４－（２－ブロモ－４－フルオロフェニル）－N－（２－クロロ－６－フルオロフェニル）－１，３－ジメチル－１Ｈ－ピラゾール－５－アミン（1362477-26-6）+SX、２,２－ジメチル－９－フルオロ－５－（キノリン－３－イル）－２,３－ジヒドロベンゾ［ｆ］［１，４］オキサゼピン（1207749-50-5）+SX、２－［６－（３－フルオロ－４－メトキシフェニル）－５－メチルピリジン－２－イル］キナゾリン（1257056-97-5）+SX、５－フルオロ－２－［（４－メチルフェニル）メトキシ］－４－ピリミジンアミン（1174376-25-0）+SX、５－フルオロ－４－イミノ－３－メチル－１－トシル－３，４－ジヒドロピリミジン－２（１Ｈ）－オン（1616664-98-2）+SX、Ｎ’－（２，５－ジメチル－４－フェノキシフェニル）－Ｎ－エチル－Ｎ－メチルメタンイミドアミド（1052688-31-9）+SX、Ｎ’－｛４－［（４，５－ジクロロチアゾール－２－イル）オキシ］－２，５－ジメチルフェニル｝－Ｎ－エチル
－Ｎ－メチルメタンイミドアミド（929908-57-6）+SX、（２Ｚ）－３－アミノ－２－シアノ－３－フェニルアクリル酸エチル（39491-78-6）+SX、Ｎ－［（２－クロロチアゾール－５－イル）メチル］－Ｎ－エチル－６－メトキシ－３－ニトロピリジン－２－アミン（1446247-98-8）+SX、１－［２－（｛［１－（４－クロロフェニル）－１Ｈ－ピラゾール－３－イル］オキシ｝メチル）－３－メチルフェニル］－４－メチル－５－オキソ－４，５－ジヒドロ－１Ｈ－テトラゾール（1472649-01-6）+SX、α－［３－（４－クロロ－２－フルオロフェニル）－５－（２，４－ジフルオロフェニル）－４－イソキサゾリル］－３－ピリジンメタノール（1229605-96-2）+SX、（αＳ）－［３－（４－クロロ－２－フルオロフェニル）－５－（２，４－ジフルオロフェニル）－４－イソキサゾリル］－３－ピリジンメタノール（1229606-46-5）+SX、（αＲ）－［３－（４－クロロ－２－フルオロフェニル）－５－（２，４－ジフルオロフェニル）－４－イソキサゾリル］－３－ピリジンメタノール（1229606-02-3）+SX、２－｛［３－（２－クロロフェニル）－２－（２，４－ジフルオロフェニル）オキシラン－２－イル］メチル｝－２，４－ジヒドロ－３Ｈ－１，２，４－トリアゾール－３－チオン（1342260-19-8）+SX、２－｛［（２Ｒ，３Ｓ）－３－（２－クロロフェニル）－２－（２，４－ジフルオロフェニル）オキシラン－２－イル］メチル｝－２，４－ジヒドロ－３Ｈ－１，２，４－トリアゾール－３－チオン（1638897-70-7）+SX、２－｛［（２Ｓ，３Ｒ）－３－（２－クロロフェニル）－２－（２，４－ジフルオロフェニル）オキシラン－２－イル］メチル｝－２，４－ジヒドロ－３Ｈ－１，２，４－トリアゾール－３－チオン（1638897-71-8）+SX、２－｛［（２Ｒ，３Ｒ）－３－（２－クロロフェニル）－２－（２，４－ジフルオロフェニル）オキシラン－２－イル］メチル｝－２，４－ジヒドロ－３Ｈ－１，２，４－トリアゾール－３－チオン（1638897-72-9）+SX、２－｛［（２Ｓ，３Ｓ）－３－（２－クロロフェニル）－２－（２，４－ジフルオロフェニル）オキシラン－２－イル］メチル｝－２，４－ジヒドロ－３Ｈ－１，２，４－トリアゾール－３－チオン（1638897-73-0）+SX、１－｛［３－（２－クロロフェニル）－２－（２，４－ジフルオロフェニル）オキシラン－２－イル］メチル｝－１Ｈ－１，２，４－トリアゾール－５－イル　チオシアナト（1342260-26-7）+SX、１－｛［（２Ｒ，３Ｓ）－３－（２－クロロフェニル）－２－（２，４－ジフルオロフェニル）オキシラン－２－イル］メチル｝－１Ｈ－１，２，４－トリアゾール－５－イル　チオシアナト（1638897-82-1）+SX、１－｛［（２Ｓ，３Ｒ）－３－（２－クロロフェニル）－２－（２，４－ジフルオロフェニル）オキシラン－２－イル］メチル｝－１Ｈ－１，２，４－トリアゾール－５－イル　チオシアナト（1638897-84-3）+SX、１－｛［（２Ｒ，３Ｒ）－３－（２－クロロフェニル）－２－（２，４－ジフルオロフェニル）オキシラン－２－イル］メチル｝－１Ｈ－１，２，４－トリアゾール－５－イル　チオシアナト（1638897-86-5）+SX、１－｛［（２Ｓ，３Ｓ）－３－（２－クロロフェニル）－２－（２，４－ジフルオロフェニル）オキシラン－２－イル］メチル｝－１Ｈ－１，２，４－トリアゾール－５－イル　チオシアナト（1638897-89-8）+SX、５－（４－クロロベンジル）－２－クロロメチル－２－メチル－１－（１Ｈ－１，２，４－トリアゾール－１－イルメチル）シクロペンタノール（1394057-11-4）+SX、（１Ｒ，２Ｓ，５Ｓ）－５－（４－クロロベンジル）－２－クロロメチル－２－メチル－１－（１Ｈ－１，２，４－トリアゾール－１－イルメチル）シクロペンタノール（1801930-06-2）+SX、（１Ｓ，２Ｒ，５Ｒ）－５－（４－クロロベンジル）－２－クロロメチル－２－メチル－１－（１Ｈ－１，２，４－トリアゾール－１－イルメチル）シクロペンタノール（1801930-07-3）+SX、（１Ｒ，２Ｒ，５Ｒ）－５－（４－クロロベンジル）－２－クロロメチル－２－メチル－１－（１Ｈ－１，２，４－トリアゾール－１－イルメチル）シクロペンタノール（1801919-53-8）+SX、（１Ｓ，２Ｓ，５Ｓ）－５－（４－クロロベンジル）－２－クロロメチル－２－メチル－１－（１Ｈ－１，２，４－トリアゾール－１－イルメチル）シクロペンタノール（1801919-54-9）+SX、（１Ｒ，２Ｒ，５Ｓ）－５－（４－クロロベンジル）－２－クロロメチル－２－メチル－１－（１Ｈ－１，２，４－トリアゾール－１－イルメチル）シクロペンタノール（1801919-55-0）+SX、（１Ｓ，２Ｓ，５Ｒ）－５－（４－クロロベンジル）－２－クロロメチル－２－メチル－１－（１Ｈ－１，２，４－トリアゾール－１－イルメチル）シクロペンタノール（1801919-56-1）+SX、（１Ｒ，２Ｓ，５Ｒ）－５－（４－クロロベンジル）－２－クロロメチル－２－メチル－１－（１Ｈ－１，２，４－トリアゾール－１－イルメチル）シクロペンタノール（1801919-57-2）+SX、（１Ｓ，２Ｒ，５Ｓ）－５－（４－クロロベンジル）－２－クロロメチル－２－メチル－１－（１Ｈ－１，２，４－トリアゾール－１－イルメチル）シクロペンタノール（1801919-58-3）+SX、メチル＝３－［（４－クロロフェニル）メチル］－２－ヒドロキシ－１－メチル－２－（１Ｈ－１，２，４－トリアゾール－１－イルメチル）シクロペンタンカルボキシラート（1791398-02-1）+SX、メチル＝（１Ｒ，２Ｓ，３Ｓ）－３－［（４－クロロフェニル）メチル］－２－ヒドロキシ－１－メチル－２－（１Ｈ－１，２，４－トリアゾール－１－イルメチル）シクロペンタンカルボキシラート（2080743-90-2）+SX、メチル＝（１Ｓ，２Ｒ，３Ｒ）－３－［（４－クロロフェニル）メチル］－２－ヒドロキシ－１－メチル－２－（１Ｈ－１，２，４－トリアゾール－１－イルメチル）シクロペンタンカルボキシラート（2080743-91-3）+SX、メチル＝（１Ｒ，２Ｒ，３Ｒ）－３－［（４－クロロフェニル）メチル］－２－ヒドロキシ－１－メチル－２－（１Ｈ－１，２，４－トリアゾール－１－イルメチル）シクロペンタンカルボキシラート（2080743-92-4）+SX、メチル＝（１Ｓ，２Ｓ，３Ｓ）－３－［（４－クロロフェニル）メチル］－２－ヒドロキシ－１－メチル－２－（１Ｈ－１，２，４－トリアゾール－１－イルメチル）シクロペンタンカルボキシラート（2080743-93-5）+SX、メチル＝（１Ｒ，２Ｒ，３Ｓ）－３－［（４－クロロフェニル）メチル］－２－ヒドロキシ－１－メチル－２－（１Ｈ－１，２，４－トリアゾール－１－イルメチル）シクロペンタンカルボキシラート（2080743-94-6）+SX、メチル＝（１Ｓ，２Ｓ，３Ｒ）－３－［（４－クロロフェニル）メチル］－２－ヒドロキシ－１－メチル－２－（１Ｈ－１，２，４－トリアゾール－１－イルメチル）シクロペンタンカルボキシラート（2080743-95-7）+SX、メチル＝（１Ｒ，２Ｓ，３Ｒ）－３－［（４－クロロフェニル）メチル］－２－ヒドロキシ－１－メチル－２－（１Ｈ－１，２，４－トリアゾール－１－イルメチル）シクロペンタンカルボキシラート（2081061-22-3）+SX、メチル＝（１Ｓ，２Ｒ，３Ｓ）－３－［（４－クロロフェニル）メチル］－２－ヒドロキシ－１－メチル－２－（１Ｈ－１，２，４－トリアゾール－１－イルメチル）シクロペンタンカルボキシラート（2081061-23-4）+SX、２－クロロメチル－５－（４－フルオロベンジル）－２－メチル－１－（１Ｈ－１，２，４－トリアゾール－１－イルメチル）シクロペンタノール（1394057-13-6）+SX、（１Ｒ，２Ｓ，５Ｓ）－２－クロロメチル－５－（４－フルオロベンジル）－２－メチル－１－（１Ｈ－１，２，４－トリアゾール－１－イルメチル）シクロペンタノール（1801930-08-4）+SX、（１Ｓ，２Ｒ，５Ｒ）－２－クロロメチル－５－（４－フルオロベンジル）－２－メチル－１－（１Ｈ－１，２，４－トリアゾール－１－イルメチル）シクロペンタノール（1801930-09-5）+SX、（１Ｒ，２Ｒ，５Ｒ）－２－クロロメチル－５－（４－フルオロベンジル）－２－メチル－１－（１Ｈ－１，２，４－トリアゾール－１－イルメチル）シクロペンタノール（1638898-08-4）+SX、（１Ｓ，２Ｓ，５Ｓ）－２－クロロメチル－５－（４－フルオロベンジル）－２－メチル－１－（１Ｈ－１，２，４－トリアゾール－１－イルメチル）シクロペンタノール（1638898-10-8）+SX、（１Ｒ，２Ｒ，５Ｓ）－２－クロロメチル－５－（４－フルオロベンジル）－２－メチル－１－（１Ｈ－１，２，４－トリアゾール－１－イルメチル）シクロペンタノール（1638898-13-1）+SX、（１Ｓ，２Ｓ，５Ｒ）－２－クロロメチル－５－（４－フルオロベンジル）－２－メチル－１－（１Ｈ－１，２，４－トリアゾール－１－イルメチル）シクロペンタノール（1638898-16-4）+SX、（１Ｒ，２Ｓ，５Ｒ）－２－クロロメチル－５－（４－フルオロベンジル）－２－メチル－１－（１Ｈ－１，２，４－トリアゾール－１－イルメチル）シクロペンタノール（1638898-20-0）+SX、（１Ｓ，２Ｒ，５Ｓ）－２－クロロメチル－５－（４－フルオロベンジル）－２－メチル－１－（１Ｈ－１，２，４－トリアゾール－１－イルメチル）シクロペンタノール（1638898-24-4）+SX、（Ｒ）－２－［２－クロロ－４－（４－クロロフェノキシ）フェニル］－１－（１，２，４－トリアゾール－１－イル）ペント－３－イン－２－オール（1801919-59-4）+SX、（Ｒ）－２－［４－（４－クロロフェノキシ）－２－（トリフルオロメチル）フェニル］－１－（１，２，４－トリアゾール－１－イル）プロパン－２－オール（1616236-94-2）+SX、（Ｒ）－１－［４－（４－クロロフェノキシ）－２－（トリフルオロメチル）フェニル］－１－シクロプロピル－２－（１，２，４－トリアゾール－１－イル）エタノール（1801919-60-7）+SX、（Ｒ）－２－［４－（４－クロロフェノキシ）－２－（トリフルオロメチル）フェニル］－３－メチル－１－（１，２，４－トリアゾール－１－イル）ブタン－２－オール（1801919-61-8）+SX、３－［５－（４－クロロフェニル）－２，３－ジメチル－１，２－オキサゾリジン－３－イル］ピリジン（847749-37-5）+SX、アグロバクテリウム・ラジオバクターK1026株（Agrobacterium radiobactor K1026）+SX、アグロバクテリウム・ラジオバクターK84株（Agrobacterium radiobactor K84）+SX、バチルス・アミロリケファシエンスAT332株（Bacillus amyloliquefaciens AT332）+SX、バチルス・アミロリケファシエンスB3株（Bacillus amyloliquefaciens B3）+SX、バチルス・アミロリケファシエンスD747株（Bacillus amyloliquefaciens D747）+SX、バチルス・アミロリケファシエンスDB101株（Bacillus amyloliquefaciens DB101）+SX、バチルス・アミロリケファシエンスDB102株（Bacillus amyloliquefaciens DB102）+SX、バチルス・アミロリケファシエンスGB03株（Bacillus amyloliquefaciens GB03）+SX、バチルス・アミロリケファシエンスFZB24株（Bacillus amyloliquefaciens FZB24）+SX、バチルス・アミロリケファシエンスFZB42株（Bacillus amyloliquefaciens FZB42）+SX、バチルス・アミロリケファシエンスIN937a株（Bacillus amyloliquefaciens IN937a）+SX、バチルス・アミロリケファシエンスMBI600株（Bacillus amyloliquefaciens MBI600）+SX、バチルス・アミロリケファシエンスQST713株（Bacillus amyloliquefaciens QST713）+SX、バチルス・アミロリケファシエンス分離株B246株（Bacillus amyloliquefaciens isolate B246）+SX、バチルス・リケニホルミスHB-2株（Bacillus licheniformis HB-2）+SX、バチルス・リケニホルミスSB3086株（Bacillus licheniformis SB3086）+SX、バチルス・プミルスAQ717株（Bacillus pumilus AQ717）+SX、バチルス・プミルスBUF-33株（Bacillus pumilus BUF-33）+SX、バチルス・プミルスGB34株（Bacillus pumilus GB34）+SX、バチルス・プミルスQST2808株（Bacillus pumilus QST2808）+SX、バチルス・シンプレクスCGF2856株（Bacillus simplex CGF2856）+SX、バチルス・スブチリスAQ153株（Bacillus subtilis AQ153）+SX、バチルス・スブチリスAQ743株（Bacillus subtilis AQ743）+SX、バチルス・スブチリスD747株（Bacillus subtilis D747）+SX、バチルス・スブ
チリスDB101株（Bacillus subtilis DB101）+SX、バチルス・スブチリスFZB24株（Bacillus subtilis FZB24）+SX、バチルス・スブチリスGB03株（Bacillus subtilis GB03）+SX、バチルス・スブチリスHAI0404株（Bacillus subtilis HAI0404）+SX、バチルス・スブチリスIAB/BS03株（Bacillus subtilis IAB/BS03）+SX、バチルス・スブチリスMBI600株（Bacillus subtilis MBI600）+SX、バチルス・スブチリスQST30002/AQ30002株（Bacillus subtilis QST30002/AQ30002）+SX、バチルス・スブチリスQST30004/AQ30004株（Bacillus subtilis QST30004/AQ30004）+SX、バチルス・スブチリスQST713株（Bacillus subtilis QST713）+SX、バチルス・スブチリスQST714株（Bacillus subtilis QST714）+SX、バチルス・スブチリス var.アミロリクエファシエンスFZB24株（Bacillus subtilis var. Amyloliquefaciens FZB24）+SX、バチルス・スブチリスY1336株（Bacillus subtilis Y1336）+SX、バークホルデリア・セパシア（Burkholderia cepacia）+SX、バークホルデリア・セパシア・ウィスコンシン型J82株（Burkholderia cepacia type Wisconsin J82）+SX、バークホルデリア・セパシア・ウィスコンシン型M54株（Burkholderia cepacia type Wisconsin M54）+SX、カンジダ・オレオフィラO株（Candida oleophila O）+SX、カンジダ・サイトアナ（Candida saitoana）+SX、ケトミウム・クプレウム（Chaetomium cupreum）+SX、クロノスタキス・ロゼア（Clonostachys rosea）+SX、コニオシリウム・ミニタンスCGMCC8325株（Coniothyrium minitans CGMCC8325）+SX、コニオシリウム・ミニタンスCON/M/91-8株（Coniothyrium minitans CON/M/91-8）+SX、クリプトコッカス・アルビダス（cryptococcus albidus）+SX、エルビニア・カロトボーラsubsp.カロトボーラCGE234M403株（Erwinia carotovora subsp.carotovora CGE234M403）+SX、フザリウム・オキシスポラムFo47株（Fusarium oxysporum Fo47）+SX、グリオクラディウム・カテヌラタムJ1446株（Gliocladium catenulatum J1446）+SX、パエニバチルス・ポリミキサAC-1株（Paenibacillus polymyxa AC-1）+SX、パエニバチルス・ポリミキサBS-0105株（Paenibacillus polymyxa BS-0105）+SX、パントエア・アグロメランスE325株（Pantoea agglomerans E325）+SX、フレビオプシス・ギガンテアVRA1992株（Phlebiopsis gigantea VRA1992）+SX、シュードモナス・オーレオファシエンスTX-1株（Pseudomonas aureofaciens TX-1）+SX、シュードモナス・クロロラフィス63-28株（Pseudomonas chlororaphis 63-28）+SX、シュードモナス・クロロラフィスMA342株（Pseudomonas chlororaphis MA342）+SX、シュードモナス・フルオレッセンス1629RS株（Pseudomonas fluorescens 1629RS）+SX、シュードモナス・フルオレッセンスA506株（Pseudomonas fluorescens A506）+SX、シュードモナス・フルオレッセンスCL145A株（Pseudomonas fluorescens CL145A）+SX、シュードモナス・フルオレッセンスG7090株（Pseudomonas fluorescens G7090）+SX、シュードモナス・シリンガエ742RS株（Pseudomonas syringae 742RS）+SX、シュードモナス・シリンガエMA-4株（Pseudomonas syringae MA-4）+SX、シュードザイマ・フロキュローサPF-A22UL株（Pseudozyma flocculosa PF-A22UL）+SX、シュードモナス・ロデシアHAI-0804株（Pseudomonas rhodesiae HAI-0804）+SX、ピシウム・オリガンドラムDV74株（Pythium oligandrum DV74）+SX、ストレプトマイセス・グリセオビリジスK61株（Streptomyces griseoviridis K61）+SX、ストレプトマイセス・リジカスWYCD108US株（Streptomyces lydicus WYCD108US）+SX、ストレプトマイセス・リジカスWYEC108株（Streptomyces lydicus WYEC108）+SX、タラロマイセス・フラバスSAY-Y-94-01株（Talaromyces flavus SAY-Y-94-01）+SX、タラロマイセス・フラバスV117b株（Talaromyces flavus V117b）+SX、トリコデルマ・アスペレルムICC012株（Trichoderma asperellum ICC012）+SX、トリコデルマ・アスペレルムSKT-1株（Trichoderma asperellum SKT-1)+SX、トリコデルマ・アスペレルムT34株（Trichoderma asperellum T34）+SX、トリコデルマ・アトロビリデCNCM1-1237株（Trichoderma atroviride CNCM 1-1237）+SX、トリコデルマ・アトロビリデLC52株（Trichoderma atroviride LC52）+SX、トリコデルマ・アトロビリデSC1株（Trichoderma atroviride SC1）+SX、トリコデルマ・アトロビリデSKT-1株（Trichoderma atroviride SKT-1）+SX、トリコデルマ・ガムシーICC080株（Trichoderma gamsii ICC080）+SX、トリコデルマ・ハルジアナム21株（Trichoderma harzianum 21）+SX、トリコデルマ・ハルジアナムDB104株（Trichoderma harzianum DB104）+SX、トリコデルマ・ハルジアナムDSM14944株（Trichoderma harzianum DSM 14944）+SX、トリコデルマ・ハルジアナムESALQ-1303株（Trichoderma harzianum ESALQ-1303）+SX、トリコデルマ・ハルジアナムESALQ-1306株（Trichoderma harzianum ESALQ-1306）+SX、トリコデルマ・ハルジアナムIIHR-Th-2株（Trichoderma harzianum IIHR-Th-2）+SX、トリコデルマ・ハルジアナムkd株（Trichoderma harzianum kd）+SX、トリコデルマ・ハルジアナムMO1株（Trichoderma harzianum MO1）+SX、トリコデルマ・ハルジアナムSF株（Trichoderma harzianum SF）+SX、トリコデルマ・ハルジアナムT22株（Trichoderma harzianum T22）+SX、トリコデルマ・ハルジアナムT39株（Trichoderma harzianum T39）+SX、トリコデルマ・ハルジアナムTH35株（Trichoderma harzianum TH35）+SX、トリコデルマ・ポリスポラムIMI206039株（Trichoderma polysporum IMI206039）+SX、トリコデルマ・ストロマチカム（trichoderma stromaticum）+SX、トリコデルマ・ビレンスG-41株（Trichoderma virens G-41)+SX、トリコデルマ・ビレンスGL-21株（Trichoderma virens GL-21）+SX、トリコデルマ・ビリデ（Trichoderma viride）+SX、バリオボラックス・パラドクスCGF4526株（Variovorax paradoxus CGF4526）+SX、ハーピンタンパク（Harpin protein）+SX、ボルドー液(Bordeaux mixture)+SX、ブロモタロニル(bromothalonil)+SX、キチン(chitin)+SX、酢酸銅(II)(copper(II) acetate)+SX、硫酸銅(II)(copper(II) sulfate)+SX、亜リン酸水素二カリウム(dipotassium hydrogenphosphite)+SX、ティーツリー抽出物(extract from Melaleuca alternifolia)+SX、オオイタドリ抽出物(extract from Reynoutria sachalinensis)+SX、ハウチワマメ苗木の子葉からの抽出物(extract from the cotyledons of lupine plantlets("BLAD"))+SX、ニンニク抽出成分(extract of Allium sativum)+SX、スギナ抽出成分(extract of Equisetum arvense)+SX、キンレンカ抽出成分(extract of Tropaeolum majus)+SX、フロリルピコキサミド(florylpicoxamid)+SX、フルオピモミド(fluopimomide)+SX、ホセチルアルミニウム(fosetyl-aluminium)+SX、イミノクタジン酢酸塩(iminoctadine triacetate)+SX、イプフルフェノキン(ipflufenoquin)+SX、オークの葉及び樹皮(leaves and bark of Quercus)+SX、マシン油(mineral oils)+SX、oxine-copper + SX、亜リン酸(phosphorous acid)+SX、炭酸水素カリウム(potassium hydrogencarbonate)+SX、亜リン酸二水素カリウム(potassium dihydrogenphosphite)+SX、プロパミジン(propamidine)+SX、キラヤ科植物抽出成分(Quillaja extract)+SX、キンコナゾール(quinconazole)+SX、キヌアのサポニン(Saponins of Chenopodium quinoa)+SX、炭酸水素ナトリウム(sodium hydrogencarbonate)+SX、チモール(thymol)+SX、マスタードパウダー(yellow mustard powder)+SX、zinc thiazole + SX、Bacillus amyloliquefaciens F727 + SX、Bacillus subtilis BU1814 + SX、Pseudomonas sp. CAB-02 + SX、methyl ({2-methyl-5-[1-(4-methoxy-2-methylphenyl)-1H-pyrazol-3-yl]phenyl}methyl)carbamate (1605879-98-8) + SX、2-(difluoromethyl)-N-[1,1,3-trimethyl-2,3-dihydro-1H-inden-4-yl]pyridine-3-carboxamide (1616239-21-4) + SX、2-(difluoromethyl)-N-[3-ethyl-1,1-dimethyl-2,3-dihydro-1H-inden-4-yl]pyridine-3-carboxamide (1847460-02-9) + SX、2-(difluoromethyl)-N-[3-propyl-1,1-dimethyl-2,3-dihydro-1H-inden-4-yl]pyridine-3-carboxamide (1847460-05-2) + SX、(2E,3Z)-5-{[1-(4-chlorophenyl)-1H-pyrazol-3-yl]oxy}-2-(methoxyimino)-N,3-dimethylpent-3-enamide (1445331-27-0) + SX、Bacillus amyloliquefaciens subsp. plantarum D747 + SX、Pythium oligandrum M1 + SX、Trichoderma asperellum T25 + SX、Trichoderma asperellum TV1 + SX、Trichoderma atroviride IMI 206040 + SX、Trichoderma atroviride T11 + SX、Trichoderma harzianum ITEM908 + SX、Trichoderma harzianum T78 + SX、Pseudomonas chlororaphis strain AFS009 + SX。 Combination of the present component of the above group (b) with the compound of the present invention X:
Acibenzolar S methyl (acibenzolar-S-methyl) + SX, aldimorph + SX, ametoctradin + SX, aminopyrifen + SX, amisulblom + SX, anilazine + SX, Azaconazole (azaconazole) + SX, azoxystrobin (Saxoxystrobin) + SX, basic copper chloride (copper oxychloride) + SX, basic copper sulfate (basic copper sulfate) + SX, benalaxyl (benalaxyl) + SX, benalaxyl M ( benalaxyl-M) + SX, benodanil (senodanil) + SX, benomyl (benomyl) + SX, benthiavalicarb + SX, benibavaliab isopropyl (benthivalicarb-isopropyl) + SX, benzobin diflupyr (benzovidiflupyrr) ) + SX, binapacryl (SB) + SX, biphenyl (SB) + SX, Bitteranol + SX, Bixafen + SX, Blasticidin S (blasticidi) nS) + SX, boscalid + SX, bromuconazole + SX, bupirimate + SX, captafol + SX, captan + SX, carbendazim + SX, carboxin + SX, carpropamide (carpropamid) + SX, chinomethionate (chinomethionat) + SX, chloroneb (chloroneb) + SX, chlorothalonil + SX, clozolinate (Slo) + SX, choretochlorin B (colletochlorin B ) + SX, copper (II) hydroxide (copper (II) hydroxide) + SX, coumoxystrobin + SX, cyazofamid (cyazofamid) + SX, cyflufenamide (cyflufenamid) + SX, shimoxanil (cymoxanil) + SX Cyproconazole (cyproconazole) + SX, cyprodinil + SX, dichlobentiazox + SX, dichlofluanid + SX, dich Diclocymet + SX, diclomezine + SX, dichloran (Dicloran) + SX, dietofencarb (dithofencarb) + SX, difenoconazole + SX, diflumetorim + SX, dimethaclone (Sic) (Dimethirimol) + SX, dimethomorph + SX, dimoxystrobin + SX, diniconazole + SX, diniconazole M (diniconazole-M) + SX, dinopup (dinocap) + SX, dipymetitrone (dipymetitrone) ) + SX, dithianone (dithianon) + SX, dodecylbenzenesulfonic acid bis (ethylenediamine) copper (II) complex salt (dodecylbenzenesulfonic acid bisethylenediamine copper (II) salt) + SX, dodemorph (dodemorph) + SX, dodine (dodine) + SX, edifenphos (Edifenphos) + SX, enoxastrobin (enoxastrobin) + SX, epoxyconazole epoxiconazole) + SX, Etaconazole (Setaconazole) + SX, Ethaboxam (Ethaboxam) + SX, Ethyrimol (Ethirimol) + SX, Etridiazole + SX, Famoxadone (Famoxadone) + SX, Fenamidone (Senamide) + SX, Fenaminst Robin (fenaminstrobin) + SX, fenarimol (fenarimol) + SX, fenbuconazole (fenbuconazole) + SX, fenfuram (fenfuram) + SX, fenhexamid (fenhexamid) + SX, phenoxanyl (fenoxalin) + SX, fenpiclonil (fenpiclonil) + SX, fenpicoxamide + SX, fenpropidin + SX, fenpropimorph + SX, fenpyrazamine + SX, triphenyltin acetate + SX, chloride Triphenyltin (fentin chloride) + SX, triphenyltin hydroxide (fentin hydroxide) + SX, felbam (ferbam) + SX, Rimzone (ferimzone) + SX, fluazinam (SX), fludioxonil + SX, flufenoxystrobin + SX, fluindapyr + SX, flumorph + SX, fluopicolide + SX, fluoroimide + SX, fluoxastrobin + SX, fluquinconazole + SX, flusilazole + SX, flusulfamide + SX, flutianil + SX, flutolanil (Flutolanil) + SX, flutriafol + SX, fluxapyroxad (fluxapyroxad) + SX, folpet + SX, fosetyl + SX, fuberidazole + SX, furalaxyl + SX, furametpyr (Furametpyr) + SX, Guazatine (guazatine) + SX, hexaconazole (hexaconazole) + SX, Hymexazole + SX, Imazalil + SX, Imibenconazole + IX, Iminoctadine + SX, Iodocarb + SX, Ipconazole + SX, Ipfentrifluconazole (ipfentrifluconazole) ) + SX, Iprobenfos + SX, Iprodione (Iprodione) + SX, Iprovalicarb + SX, isofetamide + SX, isoflucypram + SX, isoprothiolane + SX, isopiroza ( isopyrazam) + SX, isotianil (isotianil) + SX, kasugamycin (Kasugamycin) + SX, kresoxim-methyl (kresoxim-methyl) + SX, laminarin + SX, mancozeb (mancozeb) + SX, mandestrobin + SX Mandipropamide + SX, Maneb + SX, Mefentrifl Nazole (mefentrifluconazole) + SX, mepanipyrim (Span), mepronil (mepronil) + SX, mepeptyldinocap + SX, metalaxyl (metalaxyl) + SX, metalaxyl M (metalaxyl-M) + SX, metconazole metconazole) + SX, metasulfocarb (methasulfocarb) + SX, methylam (metiram) + SX, metominostrobin + SX, metrafenone + SX, microbutanil (myclobutanil) + SX, naftifine + SX , Nuarimol (nuarimol) + SX, occhilinone (octhillinone) + SX, ofurace (ofurace) + SX, orysastrobin (orysastrobin) + SX, oxadixyl (Oxadixyl) + SX, oxathiapiprolin (oxathiapiprolin) + SX, oxolinic acid (oxolicic acid) + SX, oxpoconazole (oxpoconazole) + SX, oxpoconazole fumarate (oxpoconazole fumarate) + SX, oki Carboxin (oxycarboxin) + SX, oxytetracycline (SX), pefurazoate (Pefurozoate) + SX, penconazole (Penconazole) + SX, pencicuron (pencycuron) + SX, penflufen (Penflufen) + SX, penthiopyrad (penthiopyrad) + SX , Phenamacril + SX, phthalide + sX, picarbutrazox + sX, picoxystrobin + SX, piperaline (piperalin) + SX, polyoxins + polyoxins + SX, probenazole (Probenazole) + SX, Prochloraz (Prochloraz) + SX, Procymidone (Procymidone) + SX, Propamocarb (propamocarb) + SX, Propiconazole (Proconazole) + SX, Propineb (Propineb) + SX, Proquinazid + SX, Prothiocarb (prothiocarb) + SX, prothioconazole (prothioconazole) + SX, pidiflumethofen (py diflumetofen) + SX, pyraclostrobin + SX, pyrametostrobin + SX, pyraoxystrobin + SX, pyrapropoyne + SX, pyradiflumide + SX, pyrazophos (pyrazophos (pyrazophos (pyrazophos)) ) + SX, pyribencarb + SX, pyributicarb + SX, pyrifennox + SX, pyrimethanil + SX, pyrimorph + pyrene + SX, pyriophenone + SX, pyrisoxazole ( Pyrisoxazole) + SX, Pyroquilon + SX, Quinofumelin + SX, Quinoxyfen (quinoxyfen) + SX, Quintozene + SX, Sedaxane + SX, Silthiofam (Silthiofam) + SX, Simeconazole (Simeconazole) ) + SX, spiroxamine + SX, streptomycin + SX, sulfur sulfur) + SX, tebuconazole (tebuconazole) + SX, tebufloquin (tebufloquin) + SX, teclofthalam + SX, tecnazene + SX, terbinafine + SX, tetraconazole (tetraconazole) + SX, thiabendazole (Thiabendazole) + SX, thifluzamide + SX, thiophanate + SX, thiophanate methyl (thiophanate-methyl) + SX, thiuram (thiram) + SX, tiazinyl (tiadinil) + SX, tolclofos methyl (tolclofos-methyl) + SX, tolfenpyrad (stolfirad) + SX, tolprocarb (tolprocarb) + SX, tolyl fluanid (tolylfluanid) + SX, triadimefon (sX) + SX, triadimenol (triadimenol) + SX, triazoxide (triazole) + SX, triclomeリ カ ル リ カ ル ((triclopyricarb) + SX, tricyclazole (tricyclazole) + SX, tridemorph (tridemorph) + S X, trifloxystrobin + SX, triflumizole + SX, triforine + SX, triticonazole + SX, validamycin + SX, varifenalate + SX, vinclozolin + SX, zineb (Zineb) + SX, ziram (Ziram) + SX, zoxamide + SX, 3- (difluoromethyl) -N-methoxy-1-methyl-N- [( 1R) -1-Methyl-2- (2,4,6-trichlorophenyl) ethyl] pyrazole-4-carboxamide (1639015-48-7) + SX, 3- (difluoromethyl) -N-methoxy-1-methyl -N-[(1S) -1-Methyl-2- (2,4,6-trichlorophenyl) ethyl] pyrazole-4-carboxamide (1639015-49-8) + SX, 3- (difluoromethyl) -1- Methyl-N- 1,1,3-trimethylindan-4-yl) pyrazole-4-carboxamide (141573-94-6) + SX, 3- (difluoromethyl) -1-methyl-N-[(3R) -1,1,4, 3-trimethylindan-4-yl] pyrazole-4-carboxamide (1352994-67-2) + SX, 3- (difluoromethyl) -N-[(3R) -7-fluoro-1,1,3-trimethylindan -4-yl] -1-methylpyrazole-4-carboxamide (1513466-73-3) + SX, 3-chloro-5-phenyl-6-methyl-4- (2,6-difluorophenyl) pyridazine (1358061-) 55-8) + SX, N '-[4-({3-[(4-chlorophenyl) methyl] -1,2,4-thiadiazol-5-yl} oxy) -2,5-dimethylphenyl] -N -Ethyl-N-methylmethaneimidamide (1202781-91-6) + S X, 2- {3- [2- (1-{[3,5-bis (difluoromethyl) -1H-pyrazol-1-yl] acetyl} piperidin-4-yl) -1,3-thiazole-4- [Yl] -4,5-dihydro-1,2-oxazol-5-yl} -3-chlorophenyl = methanesulfonate (1360819-11-9) + SX, 4- (2-bromo-4-fluorophenyl)- N- (2-chloro-6-fluorophenyl) -1,3-dimethyl-1H-pyrazol-5-amine (1362477-7-26) + SX, 2,2-dimethyl-9-fluoro-5- (quinoline) -3-yl) -2,3-dihydrobenzo [f] [1,4] oxazepine (1207749-50-5) + SX, 2- [6- (3-fluoro-4-methoxyphenyl) -5-methyl Pyridin-2-yl] quinazoline (1257056-97-5) + SX, 5-fluoro-2-[(4-methi) Phenyl) methoxy] -4-pyrimidinamine (1174376-25-0) + SX, 5-fluoro-4-imino-3-methyl-1-tosyl-3,4-dihydropyrimidin-2 (1H) -one (1616664) -98-2) + SX, N '-(2,5-dimethyl-4-phenoxyphenyl) -N-ethyl-N-methylmethaneimidamide (1052688-31-9) + SX, N'-{4- [(4,5-Dichlorothiazol-2-yl) oxy] -2,5-dimethylphenyl} -N-ethyl
-N-Methylmethanimidamide (929908-57-6) + SX, ethyl (2Z) -3-amino-2-cyano-3-phenylacrylate (39491-78-6) + SX, N-[(2 -Chlorothiazol-5-yl) methyl] -N-ethyl-6-methoxy-3-nitropyridin-2-amine (1446247-98-8) + SX, 1- [2-({[1- (4- Chlorophenyl) -1H-pyrazol-3-yl] oxy} methyl) -3-methylphenyl] -4-methyl-5-oxo-4,5-dihydro-1H-tetrazole (1472649-01-6) + SX, α -[3- (4-Chloro-2-fluorophenyl) -5- (2,4-difluorophenyl) -4-isoxazolyl] -3-pyridinemethanol (1229605-96-2) + SX, (αS)-[ 3- (4-Chloro-2-fluorophenyl) -5- (2,4-difluorophenyl) -4 -Isoxazolyl] -3-pyridinemethanol (1229606-46-5) + SX, (αR)-[3- (4-chloro-2-fluorophenyl) -5- (2,4-difluorophenyl) -4-isoxazolyl ] -3-pyridinemethanol (1229606-02-3) + SX, 2-{[3- (2-chlorophenyl) -2- (2,4-difluorophenyl) oxiran-2-yl] methyl} -2,4 -Dihydro-3H-1,2,4-triazole-3-thione (1342260-19-8) + SX, 2-{[(2R, 3S) -3- (2-chlorophenyl) -2- (2,4] -Difluorophenyl) oxirane-2-yl] methyl} -2,4-dihydro-3H-1,2,4-triazole-3-thione (1638897-70-7) + SX, 2-{[(2S, 3R) ) -3- (2-Chlorophenyl) -2- (2,4-difluorophenyl) Xylan-2-yl] methyl} -2,4-dihydro-3H-1,2,4-triazole-3-thione (1638897-71-8) + SX, 2-{[(2R, 3R) -3- (2-Chlorophenyl) -2- (2,4-difluorophenyl) oxirane-2-yl] methyl} -2,4-dihydro-3H-1,2,4-triazole-3-thione (1638897-72-9) ) + SX, 2-{[(2S, 3S) -3- (2-chlorophenyl) -2- (2,4-difluorophenyl) oxiran-2-yl] methyl} -2,4-dihydro-3H-1 , 2,4-triazole-3-thione (1638897-73-0) + SX, 1-{[3- (2-chlorophenyl) -2- (2,4-difluorophenyl) oxiran-2-yl] methyl} -1H-1,2,4-triazol-5-yl thiocyanato (1342260-26-7) + SX, -{[(2R, 3S) -3- (2-chlorophenyl) -2- (2,4-difluorophenyl) oxiran-2-yl] methyl} -1H-1,2,4-triazol-5-yl thiocyanate (1638897-82-1) + SX, 1-{[(2S, 3R) -3- (2-chlorophenyl) -2- (2,4-difluorophenyl) oxiran-2-yl] methyl} -1H-1 , 2,4-triazol-5-yl thiocyanato (1638897-84-3) + SX, 1-{[(2R, 3R) -3- (2-chlorophenyl) -2- (2,4-difluorophenyl) oxirane -2-yl] methyl} -1H-1,2,4-triazol-5-yl thiocyanato (1638897-86-5) + SX, 1-{[(2S, 3S) -3- (2-chlorophenyl)- 2- (2,4-Difluorophenyl) oxiran-2-yl] Methyl} -1H-1,2,4-triazol-5-yl thiocyanate (1638897-89-8) + SX, 5- (4-chlorobenzyl) -2-chloromethyl-2-methyl-1- (1H- 1,2,4-Triazol-1-ylmethyl) cyclopentanol (1394057-11-4) + SX, (1R, 2S, 5S) -5- (4-chlorobenzyl) -2-chloromethyl-2-methyl -1- (1H-1,2,4-triazol-1-ylmethyl) cyclopentanol (1801930-06-2) + SX, (1S, 2R, 5R) -5- (4-chlorobenzyl) -2- Chloromethyl-2-methyl-1- (1H-1,2,4-triazol-1-ylmethyl) cyclopentanol (1801930-07-3) + SX, (1R, 2R, 5R) -5- (4-) Chlorobenzyl) -2-chloromethyl-2-methyl-1- (1H-1,2,4-to) Triazol-1-ylmethyl) cyclopentanol (1801919-53-8) + SX, (1S, 2S, 5S) -5- (4-chlorobenzyl) -2-chloromethyl-2-methyl-1- (1H- 1,2,4-Triazol-1-ylmethyl) cyclopentanol (1801919-54-9) + SX, (1R, 2R, 5S) -5- (4-chlorobenzyl) -2-chloromethyl-2-methyl -1- (1H-1,2,4-triazol-1-ylmethyl) cyclopentanol (1801919-55-0) + SX, (1S, 2S, 5R) -5- (4-chlorobenzyl) -2- Chloromethyl-2-methyl-1- (1H-1,2,4-triazol-1-ylmethyl) cyclopentanol (1801919-56-1) + SX, (1R, 2S, 5R) -5- (4-) Chlorobenzyl) -2-chloromethyl-2-methyl-1- (1H-1,2,3, -Triazol-1-ylmethyl) cyclopentanol (1801919-57-2) + SX, (1S, 2R, 5S) -5- (4-chlorobenzyl) -2-chloromethyl-2-methyl-1- (1H) -1,2,4-triazol-1-ylmethyl) cyclopentanol (1801919-58-3) + SX, methyl 3-[(4-chlorophenyl) methyl] -2-hydroxy-1-methyl-2- ( 1H-1,2,4-triazol-1-ylmethyl) cyclopentanecarboxylate (1791398-02-1) + SX, methyl = (1R, 2S, 3S) -3-[(4-chlorophenyl) methyl] -2 -Hydroxy-1-methyl-2- (1H-1,2,4-triazol-1-ylmethyl) cyclopentanecarboxylate (208074-90-2) + SX, methyl = (1S, 2R, 3R) -3- [(4-chlorophenyl) [Le] -2-hydroxy-1-methyl-2- (1H-1,2,4-triazol-1-ylmethyl) cyclopentanecarboxylate (2080743-11-3) + SX, methyl = (1R, 2R, 3R) ) -3-[(4-Chlorophenyl) methyl] -2-hydroxy-1-methyl-2- (1H-1,2,4-triazol-1-ylmethyl) cyclopentanecarboxylate (208074-92-4) + SX, methyl = (1S, 2S, 3S) -3-[(4-chlorophenyl) methyl] -2-hydroxy-1-methyl-2- (1H-1,2,4-triazol-1-ylmethyl) cyclopentane Carboxylate (2080743-93-5) + SX, methyl = (1R, 2R, 3S) -3-[(4-chlorophenyl) methyl] -2-hydroxy-1-methyl-2- (1H-1,2, 4-Triazole-1-i Rumethyl) cyclopentane carboxylate (2080743-94-6) + SX, methyl = (1S, 2S, 3R) -3-[(4-chlorophenyl) methyl] -2-hydroxy-1-methyl-2- (1H- 1,2,4-Triazol-1-ylmethyl) cyclopentanecarboxylate (2080743-95-7) + SX, methyl = (1R, 2S, 3R) -3-[(4-chlorophenyl) methyl] -2-hydroxy -1-Methyl-2- (1H-1,2,4-triazol-1-ylmethyl) cyclopentanecarboxylate (2081061-22-3) + SX, methyl = (1S, 2R, 3S) -3-[( 4-chlorophenyl) methyl] -2-hydroxy-1-methyl-2- (1H-1,2,4-triazol-1-ylmethyl) cyclopentane carboxylate (2081061-23-4) + SX, 2-chloromethyl -5- 4-fluorobenzyl) -2-methyl-1- (1H-1,2,4-triazol-1-ylmethyl) cyclopentanol (1394057-13-6) + SX, (1R, 2S, 5S) -2- Chloromethyl-5- (4-fluorobenzyl) -2-methyl-1- (1H-1,2,4-triazol-1-ylmethyl) cyclopentanol (1801930-08-4) + SX, (1S, 2R) , 5R) -2-Chloromethyl-5- (4-fluorobenzyl) -2-methyl-1- (1H-1,2,4-triazol-1-ylmethyl) cyclopentanol (1801930-09-5) + SX, (1R, 2R, 5R) -2-chloromethyl-5- (4-fluorobenzyl) -2-methyl-1- (1H-1,2,4-triazol-1-ylmethyl) cyclopentanol (1638898 -0-4) + SX, (1S, 2S, 5S)-2 black Methyl-5- (4-fluorobenzyl) -2-methyl-1- (1H-1,2,4-triazol-1-ylmethyl) cyclopentanol (1638898-10-8) + SX, (1R, 2R, 5S) -2-Chloromethyl-5- (4-fluorobenzyl) -2-methyl-1- (1H-1,2,4-triazol-1-ylmethyl) cyclopentanol (1638898-13-1) + SX , (1S, 2S, 5R) -2-chloromethyl-5- (4-fluorobenzyl) -2-methyl-1- (1H-1,2,4-triazol-1-ylmethyl) cyclopentanol (1638898- 16-4) + SX, (1R, 2S, 5R) -2-chloromethyl-5- (4-fluorobenzyl) -2-methyl-1- (1H-1,2,4-triazol-1-ylmethyl) Cyclopentanol (1638898-20-0) + SX, (1S, 2R, 5S ) -2-Chloromethyl-5- (4-fluorobenzyl) -2-methyl-1- (1H-1,2,4-triazol-1-ylmethyl) cyclopentanol (1638898-24-4) + SX, (R) -2- [2-chloro-4- (4-chlorophenoxy) phenyl] -1- (1,2,4-triazol-1-yl) pent-3-yn-2-ol (1801919-59) -4) + SX, (R) -2- [4- (4-chlorophenoxy) -2- (trifluoromethyl) phenyl] -1- (1,2,4-triazol-1-yl) propane-2 -Ol (1616236-94-2) + SX, (R) -1- [4- (4-chlorophenoxy) -2- (trifluoromethyl) phenyl] -1-cyclopropyl-2- (1,2,3, 4-Triazol-1-yl) ethanol (1801919-60-7) + SX, (R) -2- [4- (4-chlorophenyl) Noxy) -2- (trifluoromethyl) phenyl] -3-methyl-1- (1,2,4-triazol-1-yl) butan-2-ol (1801919-61-8) + SX, 3- [ 5- (4-Chlorophenyl) -2,3-dimethyl-1,2-oxazolidin-3-yl] pyridine (847749-37-5) + SX, Agrobacterium radiobacter K1026 strain (Agrobacterium radiobactor K1026) + SX Agrobacterium radiobacter K84 strain (Agrobacterium radiobactor K84) + SX, Bacillus amyloliquefaciens AT332 strain (Bacillus amyloliquefaciens AT332) + SX, Bacillus amyloliquefaciens B3 strain (Bacillus amyloliquefaciens B3) + SX, Bacillus subtilis Amyloliquefaciens D747 strain (Bacillus amyloliquefaciens D747) + SX, Bacillus amyloliquefaciens DB 101 strain (Bacillus amyloliquefaciens DB 101) + SX, Bacillus amyloliquefa Ens DB 102 strain (Bacillus amyloliquefaciens DB 102) + SX, Bacillus amyloliquefaciens GB 03 strain (Bacillus amyloliquefaciens GB 03) + SX, Bacillus amyloliquefaciens FZB 24 strain (Bacillus amyloliquefaciens FZB24) + SX, Bacillus amyloliquefaciens FZB 42 Strain (Bacillus amyloliquefaciens FZB42) + SX, Bacillus amyloliquefaciens IN937a strain (Bacillus amyloliquefaciens IN937a) + SX, Bacillus amyloliquefaciens MBI 600 strain (Bacillus amyloliquefaciens MBI 600) + SX, Bacillus amyloliquefaciens QST713 ( Bacillus amyloliquefaciens QST 713) + SX, Bacillus amyloliquefaciens isolate B 246 strain (Bacillus amyloliquefaciens isolate B 246) + SX, Bacillus licheniformis HB-2 strain (Bacillus licheniformis HB-2) + SX, Bacillus licheniformis strain SB 3086 (Bacillus licheniformis SB 3086) + SX, Bacillus pumilus AQ 717 strain (Bacillus pumi lus AQ 717) + SX, Bacillus pumilus BUF-33 (Bacillus pumilus BUF-33) + SX, Bacillus pumilus GB 34 (Bacillus pumilus GB 34) + SX, Bacillus pumilus QST 2808 (Bacillus pumilus QST2808) + SX, Bacillus Simplex CGF 2856 strain (Bacillus simplex CGF 2856) + SX, Bacillus subtilis AQ 153 strain (Bacillus subtilis AQ 153) + SX, Bacillus subtilis AQ 743 strain (Bacillus subtilis AQ 743) + SX, Bacillus subtilis D 747 strain (Bacillus subtilis D747) + SX , Bacillus sub
Thyris DB101 strain (Bacillus subtilis DB101) + SX, Bacillus subtilis FZB24 strain (Bacillus subtilis FZB24) + SX, Bacillus subtilis GB03 strain (Bacillus subtilis GB03) + SX, Bacillus subtilis HAI 0404 strain (Bacillus subtilis HAI 0404) + SX, Bacillus subtilis IAB / BS03 strain (Bacillus subtilis IAB / BS03) + SX, Bacillus subtilis MBI 600 strain (Bacillus subtilis MBI 600) + SX, Bacillus subtilis QST 30002 / AQ 30002 (Bacillus subtilis QST 30002 / AQ 30002) + SX, Bacillus subtilis QST 30004 / AQ 30004 (Bacillus subtilis QST 30004 / AQ 30004) + SX, Bacillus subtilis QST 713 (Bacillus subtilis QST 713) + SX, Bacillus subtilis QST 714 (Bacillus subtilis QST 714) + SX, Bacillus subtilis var. Strains (Bacillus subtilis var. Amyloliquefaciens FZB24) + SX, Bacillus subtilis strain Y1336 (Bacillus subtilis Y1336) + SX, Burkholderi -Cepacia (Burkholderia cepacia) + SX, Burkholderia cepacia-Wisconsin type J 82 strain (Burkholderia cepacia type Wisconsin J 82) + SX, Burkholderia cepacia-Wisconsin type M 54 strain (Burkholderia cepacia type Wisconsin M 54) + SX, · Oleophila O strain (Candida oleophila O) + SX, Candida saitoana (Candida saitoana) + SX, Ketomium cupreum + SX, Clonostachys rosea + SX, Coniocillus minitans CGMCC 8325 ( Coniothyrium minitans CGMCC 8325) + SX, Coniocylium minitans CON / M / 91-8 (Coniothyrium minitans CON / M / 91-8) + SX, Cryptococcus albidas (cryptococcus albidus) + SX, Erwinia carotobola subsp. Carotobola CGE 234 M 403 stock (Erwinia carotovora subsp. Carotovora CGE 234 M 403) + SX, Fusarium oxysporum Fo 47 strain (Fusarium o xysporum Fo47) + SX, gliocladium catenulatam J1446 (Gliocladium catenulatum J 1446) + SX, Paenibacillus polymyxa AC-1 strain (Paenibacillus polymyxa AC-1) + SX, Paenibacillus polymyxa BS-0105 strain (Paenibacillus polymyxa BS1 -0105) + SX, Pantoea agglomerans E 325 (Pantoea agglomerans E 325) + SX, Flebiopsis gigantea VRA 1992 (Phlebiopsis gigantea VRA 1992) + SX, Pseudomonas aureofaciens TX-1 strain (Pseudomonas aureofaciens TX-1) + SX, Pseudomonas chlororaphis 63-28 (Pseudomonas chlororaphis 63-28) + SX, Pseudomonas chlorolaphys MA 342 (Pseudomonas chlororaphis MA 342) + SX, Pseudomonas fluorescens 1629 RS (Pseudomonas fluorescens 1629 RS) + SX, Pseudomonas fluorescens A506 (Pseudomonas fluorescens A506) + SX, Pseudomonas fluorescens CL145A strain (Pseudomonas fluoresces CL145A) + SX, Pseudomonas fluorescens G7090 strain (Pseudomonas fluorescens G7090) + SX, Pseudomonas syringae strain 742 RS (Pseudomonas syringae 742 RS) + SX, Pseudomonas syringae strain MA-4 ) + SX, Pseudozyma flocculosa PF-A22UL strain (Pseudozyma flocculosa PF-A22UL) + SX, Pseudomonas rhodesia HAI-0804 strain (Pseudomonas rhodesiae HAI-0804) + SX, Pycium oligand DV strain 74 (Pythium oliverum DV74) SX, Streptomyces griseoviridis K61 strain (Streptomyces griseoviridis K61) + SX, Streptomyces lydicus WYCD108US strain (Streptomyces lydicus WYCD108US) + SX, Streptomyces lydicus WYEC 108 strain (Streptomyces lydicus WYEC108) + SAY-Y-94-01 strain (Talaromyces flavus SAY-Y-94-01) + SX, Talaromyces flava V 117b strain (Talaromyces flavus V117b) + SX, Trichoderma asperumum ICC012 strain (Trichoderma asperellum ICC012) + SX, Trichoderma asperomem SKT-1 strain (Trichoderma asperellum SKT-1) + SX, Trichoderma asperumum strain T 34 asp. + SX, Trichoderma atroviride strain CNCM 1-1237 (Trichoderma atroviride CNCM 1-1237) + SX, Trichoderma atroviride LC 52 strain (Trichoderma atroviride LC 52) + SX, Trichoderma atroviride SC 1 strain (Trichoderma atroviride SC 1) SKT-1 strain (Trichoderma atroviride SKT-1) + SX, Trichoderma gumcyc ICC 080 strain (Trichoderma gamsii ICC 080) + SX, Trichoderma harzianum 21 strain (Trichoderma harzianum 21) + SX, Trichoderma harzianum DB 104 strain (Trichoderma harzianum DB104) + SX, Trichoderma harzianum DSM 14944 strain (Trichoderma harzianum DSM 14944) + SX, Toriko Derma Harzianum ESALQ-1303 (Trichoderma harzianum ESALQ-1303) + SX, Trichoderma harzianum ESALQ-1306 (Trichoderma harzianum ESALQ-1306) + SX, Trichoderma harzianum II HR-Th-2 Strain (Trichoderma harzianum II HR-Th- 2) + SX, Trichoderma harzianum kd (Trichoderma harzianum kd) + SX, Trichoderma harzianum MO 1 (Trichoderma harzianum MO 1) + SX, Trichoderma harzianum SF (Trichoderma harzianum SF) + SX, Trichoderma harzianum T22 ( Trichoderma harzianum T22) + SX, Trichoderma harzianum T39 strain (Trichoderma harzianum T39) + SX, Trichoderma harzianum TH35 strain (Trichoderma harzianum TH35) + SX, Trichoderma polysporum IMI 206039. trichoderma stromaticum) + SX, Trichoderma virence G-41 strain (Trichoderma virens) G-41) + SX, Trichoderma virens GL-21 strain (Trichoderma virens GL-21) + SX, Trichoderma viride + SX, Varioborac paradox CGF 4526 strain (Variovorax paradoxus CGF 4526) + SX, Her Pin protein (Harpin protein) + SX, Bordeaux solution (Bordeaux mixture) + SX, bromothalonil (bromothalonil) + SX, chitin (chitin) + SX, copper (II) acetate (copper (II) acetate) + SX, copper (II) sulfate ) (Copper (II) sulfate) + SX, dipotassium hydrogenphosphate + SX, tea tree extract (extract from Melaleuca alternifolia) + SX, extract from Reynoutria sachalinensis + SX, Haute pomegranate Extract from cotyledon of sapling (extract from the cotyledons of lupine plantlets ("BLAD")) + SX, garlic extract (extract of Allium sativum) + SX, extract of Equisetum arvense + SX, extract of persimmon Ingredients (extract of Tropaeolum majus) + SX, Floryl Picoxa De (florylpicoxamide) + SX, fluopimomide + SX, fosetyl-aluminium + SX, iminoctadine triacetate + SX, ipflufenoquin + SX, oak leaf and bark ( leaves and bark of Quercus) + SX, machine oils (mineral oils) + SX, oxine-copper + SX, phosphorous acid (phosphorous acid) + SX, potassium hydrogencarbonate (potassium hydrogencarbonate) + SX, potassium dihydrogen phosphate (potassium dihydrogenphosphate + SX, propamidine + SX, Quillaja extract + SX, quinconazole + SX, quinoa saponins (Saponins of Chenopodium quinoa) + SX, sodium bicarbonate sodium hydrogencarbonate) + SX, thymol (thymol) + SX, mustard powder (yellow mustard powder) + SX, zinc thiazole + SX, Bacillus amyloliquefaciens F727 + SX, Bacillus subtilis BU 1814 + SX, Pseudomonas sp. CAB-02 + SX, methyl ({2-methyl-5- [1- (4-methox y-2-methylphenyl) -1H-pyrazol-3-yl] phenyl) methyl) carbamate (1605879-98-8) + SX, 2- (difluoromethyl) -N- [1,1,3-trimethyl-2,3 -dihydro-1H-inden-4-yl] pyridine-3-carboxamide (1616239-21-4) + SX, 2- (difluoromethyl) -N- [3-ethyl-1,1-dimethyl-2,3-dihydro -1H-inden-4-yl] pyridine-3-carboxamide (1847460-02-9) + SX, 2- (difluoromethyl) -N- [3-propyl-1,1-dimethyl-2,3-dihydro-1H -inden-4-yl] pyridine-3-carboxamide (1847460-05-2) + SX, (2E, 3Z) -5-{[1- (4-chlorophenyl) -1H-pyrazol-3-yl] oxy} -2- (methoxyimino) -N, 3-dimethylpent-3-enamide (1445331-27-0) + SX, Bacillus amyloliquefaciens subsp. Plantarum D747 + SX, Pythium oligodrum M1 + SX, Trichoderma asperellum T25 + SX, Trichoderma asperum TV1 + SX, Trichoderma atroviride IMI 206040 + SX, Trichoderma atroviride T11 + SX, Trichoderma harzianum ITEM 908 + SX, Trichoderma harzianum T78 + SX, Pseudomonas chlororaphis strain AFS 009 + SX.
　上記群（ｃ）の本成分と本発明化合物Ｘとの組み合わせ：
　１－メチルシクロプロペン（1-methylcyclopropene）+SX、2,3,5－トリヨード安息香酸（2,3,5-triiodobenzoic acid）+SX、IAA（(1H-indol-3-yl)acetic acid）+SX、IBA（4-(1H-indol-3-yl)butyric acid）+SX、MCPA（2-(4-chloro-2-methylphenoxy)acetic acid）+SX、MCPB（4-(4-chloro-2-methylphenoxy)butyric acid）+SX、4-CPA（4-chlorophenoxyacetic acid）+SX、５－アミノレブリン酸塩酸塩（5-aminolevulinic acid hydrochloride）+SX、６－ベンジルアミノプリン（6-benzylaminopurine）+SX、アブシシン酸（abscisic acid）+SX、AVG（aminoethoxyvinylglycine）+SX、アンシミドール（ancymidol）+SX、ブトルアリン（butralin）+SX、炭酸カルシウム（calcium carbonate）+SX、塩化カルシウム（calcium chloride）+SX、ギ酸カルシウム（calcium formate）+SX、過酸化カルシウム（calcium peroxide）+SX、石灰硫黄（calcium polysulfide）+SX、硫酸カルシウム（calcium sulfate）+SX、クロルメコートクロリド（chlormequat-chloride）+SX、クロロプロファム（chlorpropham）+SX、塩化コリン（choline chloride）+SX、クロプロップ（cloprop）+SX、シアナミド（cyanamide）+SX、シクラニリド（cyclanilide）+SX、ダミノジッド（daminozide）+SX、デカン－１－オール（decan-1-ol）+SX、ジクロプロップ（dichlorprop）+SX、ジケグラック（dikegulac）+SX、ジメチピン（dimethipin）+SX、ジクワット（diquat）+SX、エテホン（ethephon）+SX、エチクロゼート（ethychlozate）+SX、フルメトラリン（flumetralin）+SX、フルルプリミドール（flurprimidol）+SX、ホルクロルフェヌロン（forchlorfenuron）+SX、ジベレリンＡ（Gibberellin A）+SX、ジベレリンＡ３（Gibberellin A3）+SX、イナベンフィド（inabenfide）+SX、カイネチン（Kinetin）+SX、マレイン酸ヒドラジド（maleic hydrazide）+SX、メフルイジド（mefluidide）+SX、メピコートクロリド（mepiquat-chloride）+SX、酸化型グルタチオン（oxidized glutathione）+SX、パクロブトラゾール（pacrobutrazol）+SX、ペンディメタリン（pendimethalin）+SX、プロヘキサジオンカルシウム（prohexandione-calcium）+SX、プロヒドロジャスモン（prohydrojasmon）+SX、ピラフルフェンエチル（pyraflufen-ethyl）+SX、シントフェン（sintofen）+SX、１－ナフタレン酢酸ナトリウム（sodium 1-naphthaleneacetate）+SX、シアン酸ナトリウム（sodium cyanate）+SX、ストレプトマイシン（streptmycin）+SX、チジアズロン（thidiazuron）+SX、トリアペンテノール（triapenthenol）+SX、トリブホス（Tribufos）+SX、トリネキサパックエチル（trinexapac-ethyl）+SX、ウニコナゾールP（uniconazole-P）+SX、２－（ナフタレン－１－イル）アセトアミド（2-(naphthalen-1-yl)acetamide）+SX、［４－オキソ－４－（２－フェニルエチル）アミノ］酪酸+SX、５－（トリフルオロメチル）ベンゾ［b］チオフェン－２－カルボン酸メチル+SX、３－［（６－クロロ－４－フェニルキナゾリン－２－イル）アミノ］－１－プロパノール+SX、グロマス・イントララディセス（Glomus intraradices）+SX、グロマス・モッセ（Glomus mosseae）+SX、グロマス・アグリゲイツム（Glomus aggregatum）+SX、グロマス・エツニカツム（Glomus etunicatum）+SX、ブラディリゾビウム・エルカニ（Bradyrhizobium elkani）+SX、ブラディリゾビウム・ジャポニカム（Bradyrhizobium japonicum）+SX、ブラディリゾビウム・ルピニ（Bradyrhizobium lupini）+SX、リゾビウム・レグミノサルム bv. トリホリ（Rhizobium leguminosarum bv. trifolii）+SX、リゾビウム・レグミノサルム bv. ファゼオリ（Rhizobium leguminosarum bv. phaseoli）+SX、リゾビウム・レグミノサルム bv.ビシアエ（Rhizobium leguminosarum bv. viciae）+SX、シノリゾビウム・メリロチ（Sinorhizobium meliloti）+SX、リゾビウム・フレディ（Rhizobium fredii）+SX、リゾビウム・ロチ（Rhizobium loti）+SX、リゾビウム・トリホリ（Rhizobium trifolii）+SX、リゾビウム・トロピシ（Rhizobium tropici）+SX、ホルモノネチン(formononetin) + SX、1,3-diphenylurea + SX、lipochitooligosaccharide SP104 + SX、Azorhizobium caulinodans + SX、Azospirillum amazonense + SX、Azospirillum brasilense XOH + SX、Azospirillum brasilense Ab-V5 + SX、Azospirillum brasilense Ab-V6 + SX、Azospirillum caulinodans + SX、Azospirillum halopraeferens + SX、Azospirillum irakense + SX、Azospirillum lipoferum + SX、Bradyrhizobium elkanii SEMIA 587 + SX、Bradyrhizobium elkanii SEMIA 5019 + SX、Bradyrhizobium japonicum TA-11 + SX、Bradyrhizobium japonicum USDA 110 + SX、Bradyrhizobium liaoningense + SX、Claroideoglomus claroideum + SX、Delftia acidovorans RAY209 + SX、Gigaspora margarita + SX、Gigaspora rosea + SX、Glomus deserticola + SX、Glomus monosporum + SX、Mesorhizobium ciceri + SX、Mesorhizobium huakii + SX、Rhizophagus clarus + SX、Rhizobium etli + SX、Rhizobium galegae + SX、Rhizophagus irregularis DAOM 197198 + SX、Paraglomus brasillianum + SX、Zucchini Yellow Mosaik Virus weak strain + SX。 Combination of the present component of the above group (c) with the compound of the present invention X:
1-methylcyclopropene (1-methylcyclopropene) + SX, 2,3,5-triiodobenzoic acid (2,3,5-triiodobenzoic acid) + SX, IAA ((1H-indol-3-yl) acetic acid) + SX, IBA (4- (1H-indol-3-yl) butyric acid) + SX, MCPA (2- (4-chloro-2-methylphenoxy) acetic acid) + SX, MCPB (4- (4-chloro-2) -Methylphenoxy) butyric acid) + SX, 4-CPA (4-chlorophenoxyacetic acid) + SX, 5-aminolevulinic acid hydrochloride (S-amino acid) + SX, 6-benzylaminopurine (6-benzylaminopurine) + SX, Abscisic acid (abscisic acid) + SX, AVG (aminoethoxyvinylglycine) + SX, ancimidol (ancymidol) + SX, butoralin (butralin) + SX, calcium carbonate (calcium carbonate) + SX, calcium chloride (calcium chloride) + SX, Calcium formate + SX, calcium peroxide + SX, calcium polysulfide + SX, calcium sulfate + SX, chlormeco Tochloride (chlormequat-chloride) + SX, chlorpropham (SX), choline chloride + SX, cloprop + SX, cyanamide (cyanamide) + SX, cyclanilide (SX), daminozide (Daminozide) + SX, decan-1-ol (decan-1-ol) + SX, dicloprop (dichlorprop) + SX, dikegulac (dikegulac) + SX, dimethypin (dimethipin) + SX, diquat + SX, Ethephon + SX, ethychlozate + SX, flumetralin + SX, flurprimidol + SX, forchlorfenuron + SX, gibberellin A (Gibberellin A) + SX, gibberellin A3 (Gibberellin A3) + SX, inabenfide (inabenfide) + SX, kinetin (Kinetin) + SX, maleic acid hydrazide (maleic hydrazide) + SX, mefluidide + SX, mepico Tochloride (mepiquat-chloride) + SX, oxidized glutathione (oxidized glutathione) + SX, paclobutrazol (pacrobutrazol) + SX, pendimethalin (pendimethalin) + SX, prohexadione calcium (prohexandione-calcium) + SX, Prohydrojasmon + SX, pyraflufen-ethyl + SX, sintofen + SX, sodium 1-naphthaleneacetate + SX, sodium cyanate + SX, streptomycin + SX, thidiazuron + SX, triapenthenol + SX, tribufos (Tribufos) + SX, trinexapac-ethyl + SX, uniconazole P (uniconazole-P) ) + SX, 2- (naphthalen-1-yl) acetamide (2- (naphthalen-1-yl) acetamide) + SX, [4-oxo-4- (2-phenyl ether) (Tyl) amino] butyric acid + SX, methyl 5- (trifluoromethyl) benzo [b] thiophene-2-carboxylate + SX, 3-[(6-chloro-4-phenylquinazolin-2-yl) amino] -1 -Propanol + SX, Glomus intraradices + SX, Glomas mossee + SX, Glomas aggregatum (Glomus aggregatum) + SX, Glomas etunicatum + SX, Brady Rhizobi Umm · el crab (Bradyrhizobium elkani) + SX, Brady rhizobium japonicum (Bradyrhizobium japonicum) + SX, Brady rhizobium lupini (Bradyrhizobium lupini) + SX, Rhizobium legminosarum bv. + SX, Rhizobium leguminosalum bv. Phazeo (Rhizobium leguminosarum bv. Phaseoli) + SX, Rhizobium leguminosalum bv. Bischie (Rhizobium leguminosarum bv. viciae) + SX, Sinorhizobium meliloti (Sinorhizobium meliloti) + SX, Rhizobium fredii (Rhizobium fredii) + SX, Rhizobium loti (Rhizobium loti) + SX, Rhizobium trifolium + SX, Rhizobium tropici + SX, hormononetin (formononetin) + SX, 1,3-diphenylurea + SX, lipochitooligosaccharide SP104 + SX, Azorhizobium caulinodans + SX, Azospirillum amazonense + SX, Azospirillum Xilose brasilense Ab-V5 + SX, Azospirillum brasilense Ab-V6 + SX, Azospirillum caulinodans + SX, Azospirillum halopraeferens + SX, Azospirillum irakense + SX, Azospirillum lipoferumium + + ii ii japonicum TA-11 + SX, Bradyrhizobium japonicum USDA 110 + SX, Bradyrhizobium lionaingense + SX, Claroideoglomus claroideum + SX, Delftia ac idovorans RAY209 + SX, Gigaspora margarita + SX, Gigaspora rosea + SX, Glomus deserticola + SX, Glomus monosporum + SX, Mesorhizobium ciceri + SX, Mesorhizobium huakii + SX, Rhizophagus clarus + Palladium Rhizophagus irregularis DAOM 197198 + SX, Paraglomus brasillianum + SX, Zucchini Yellow Mosaik Virus weak strain + SX.
　上記群（ｄ）の本成分と本発明化合物Ｘとの組み合わせ：
　アリドクロール（allidochlor）+SX、ベノキサコール（benoxacor）+SX、クロキントセット（cloquintocet）+SX、クロキントセットメキシル（cloquintocet-mexyl）+SX、シオメトリニル（cyometrinil）+SX、シプロスルファミド（cyprosulfamide）+SX、ジクロルミド（dichlormid）+SX、ジシクロノン（dicyclonone）+SX、ジメピペラート（dimepiperate）+SX、ジスルホトン（disulfoton）+SX、ダイムロン（dymron）+SX、フェンクロラゾール（fenchlorazole）+SX、フェンクロラゾールエチル（fenchlorazole-ethyl）+SX、フェンクロリム（fenclorim）+SX、フルラゾール（flurazole）+SX、フリラゾール（furilazole）+SX、フルキソフェニム（fluxofenim）+SX、ヘキシム（Hexim）+SX、イソキサジフェン（isoxadifen）+SX、イソキサジフェンエチル（isoxadifen-ethyl）+SX、メコプロップ（mecoprop）+SX、メフェンピル（mefenpyr）+SX、メフェンピルエチル（mefenpyr-ethyl）+SX、メフェンピルジエチル（mefenpyr-diethyl）+SX、メフェナート（mephenate）+SX、メトカミフェン（metcamifen）+SX、オキサベトリニル（oxabetrinil）+SX、１，８－ナフタル酸無水物（1,8-naphthalic anhydride）+SX、１，８－オクタメチレンジアミン（1,8-octamethylene diamine）+SX、AD-67（4-(dichloroacetyl)-1-oxa-4-azaspiro[4.5]decane）+SX、CL-304415 (4-carboxy-3,4-dihydro-2H-1-benzopyran-4-acetic acid)+SX、CSB（1-bromo-4-[(chloromethyl)sulfonyl]benzene）+SX、DKA-24（2,2-dichloro-N-[2-oxo-2-(2-propenylamino)ethyl]-N-(2-propenyl)acetamide）+SX、MG191（2-(dichloromethyl)-2-methyl-1,3-dioxolane）+SX、MG-838（2-propenyl 1-oxa-4-azaspiro[4.5]decane-4-carbodithioate）+SX、PPG-1292（2,2-dichloro-N-(1,3-dioxan-2-ylmethyl)-N-(2-propenyl)acetamide）+SX、R-28725（3-(dichloroacetyl)-2,2-dimethyl-1,3-oxazolidine）+SX、R-29148（3-(dichloroacetyl)-2,2,5-trimethyl-1,3-oxazolidine）+SX、TI-35（1-(dichloroacetyl)azepane）+SX。 Combination of the present component of the above group (d) with the compound of the present invention X:
Aridochlor (allidochlor) + SX, benoxacor (benoxacor) + SX, cloquintoset (cloquintocet) + SX, cloquintocet mexyl (cloquintocet-mexyl) + SX, ciometrinil (cyometrinil) + SX, cyprosulfamide (cyprosulfamide) + SX, dichlormid (Diclormid) + SX, dicyclonone (Dicyclonone) + SX, dimepiperate (dimepiperate) + SX, disulfoton (disulfoton) + SX, dimron (dymron) + SX, fenchlorazole (Sintra) + SX, fenchlorazole Ethyl (fenchlorazole-ethyl) + SX, fenclorim (fenclorim) + SX, flurazole (flurazole) + SX, furilazole (furilazole) + SX, fluxophenim (fluxofenim) + SX, hexim (Hexim) + SX, isoxadifen (isoxadifen) + SX , Isoxadiphen-ethyl (isoxadifen-ethyl) + SX, mecoprop (mecoprop) + SX, mefenpyr (mefenpyr) + SX, mef Empirethyl (mefenpyr-ethyl) + SX, Mefenpyr-diethyl (Sef), Mephenate (mephenate) + SX, Metocamifen + SX, Oxabetrinil + SX, 1, 8 Naphthalic anhydride (1,8-naphthalic anhydride) + SX, 1,8-octamethylenediamine + SX, AD-67 (4- (dichloroacetyl) -1-oxa-4-azaspiro [4.5] decane ) + SX, CL-304415 (4-carboxy-3,4-dihydro-2H-1-benzopyran-4-acetic acid) + SX, CSB (1-bromo-4-[(chloromethyl) sulfonyl] benzene) + SX DKA-24 (2,2-dichloro-N- [2-oxo-2- (2-propenylamino) ethyl] -N- (2-propenyl) acetamide) + SX, MG 191 (2- (dichloromethyl) -2-) methyl-1,3-dioxolane) + SX, MG-838 (2-propenyl 1-oxa-4-azaspiro [4.5] decane-4-carbodithioate) + SX, PPG-1292 (2,2-dichloro-N- ( 1,3-dioxan-2-ylmethyl) -N- (2-propenyl) acetamide) + SX, R-28725 (3- (dichloroacetyl) -2,2-dimethyl-1,3-oxazolidine) + SX, R- 29148 (3- (dichloroacetyl) -2,2,5-trimethyl-1,3-oxazoli dine) + SX, TI-35 (1- (dichloroacetyl) azepane) + SX.
　上記群（ｅ）の本成分と本発明化合物Ｘとの組み合わせ：
　１－ドデシル-１Ｈ－イミダゾール（1-dodecyl-1H-imidazole）+SX、Ｎ－（２－エチルへキシル）－８，９，１０－トリノルボルン－５－エン－２，３－ジカルボキシイミド（N-(2-ethylhexyl)-8,9,10-trinorborn-5-ene-2,3-dicarboximide）+SX、ブカルポレート（bucarpolate）+SX、Ｎ,Ｎ－ジブチル－４－クロロベンゼンスルホンアミド（N,N-dibutyl-4-chlorobenzenesulfonamide）+SX、ジエトレート（dietholate）+SX、ジエチルマレエート（diethylmaleate）+SX、ピペロニルブトキシド（piperonyl butoxide）+SX、ピペロニルシクロネン（piperonyl cyclonene）+SX、ピプロタル（piprotal）+SX、プロピルイソム（propyl isome）+SX、サフロキサン（safroxan）+SX、セサメックス（sesamex）+SX、セサモリン（sesamolin）+SX、スルホキシド（sulfoxide）+SX、ベルブチン（Verbutin）+SX、DMC（1,1-bis(4-chlorophenyl)ethanol）+SX、FDMC（1,1-bis(4-chlorophenyl)-2,2,2-trifluoroethanol）+SX、ETN（1,2-epoxy-1,2,3,4-tetrahydronaphthalene）+SX、ETP（1,1,1-trichloro-2,3-expoxypropane）+SX、PSCP（phenylsaligenin cyclic phosphate）+SX、TBPT（S,S,S-tributyl phosphorotrithioate）+SX、TPP（triphenyl phosphate）+SX。 Combinations of the present component of the above group (e) with the compound of the present invention X:
1-dodecyl-1H-imidazole (1-dodecyl-1H-imidazole) + SX, N- (2-ethylhexyl) -8,9,10-trinolborn-5-ene-2,3-dicarboximide (N -(2-ethylhexyl) -8,9,10-trinorborn-5-ene-2,3-dicarboximide + SX, bucarpolate + SX, N, N-dibutyl-4-chlorobenzenesulfonamide (N, N -dibutyl-4-chlorobenzenesulfonate) + SX, dietholate + SX, diethylmaleate (diethylmaleate) + SX, piperonyl butoxide + SX, piperonyl cycloclone + SX, piprotal + SX, propyl isome + SX, safroxan + SX, sesamex + SX, sesamolin + SX, sulfoxide (sulfoxide) + SX, verbutin + SX, DMC (1,1 1-bis (4-chlorophenyl) ethanol) + SX, FDMC (1,1-bis (4-c) chlorophenyl) -2,2,2-trifluoroethanol) + SX, ETN (1,2-epoxy-1,2,3,4-tetrahydronaphthalene) + SX, ETP (1,1,1-trichloro-2,3-expoxypropane) ) + SX, PSCP (phenylsaligenin cyclic phosphate) + SX, TBPT (S, S, S, S-tributy phosphorothioate) + SX, TPP (triphenyl phosphate) + SX.
　上記群（ｆ）の本成分と本発明化合物Ｘとの組み合わせ：
　アントラキノン（anthraquinone）+SX、クロラロース（chloralose）+SX、アクレップ（acrep）+SX、ブトピロノキシル（butopyronoxyl）+SX、カンファー（camphor）+SX、ｄ－カンファー（d-camphor）+SX、カルボキシド（carboxide）+SX、フタル酸ジブチル（dibutyl phthalate）+SX、ディート（deet）+SX、ジメチルカーバート（dimethyl carbate）+SX、フタル酸ジメチル（dimethyl phthalate）+SX、こはく酸ジブチル（dibutyl succinate）+SX、アジピン酸ジブチル（dibutyl adipate）+SX、エトヘキサジオール（ethohexadiol）+SX、ヘキサミド（hexamide）+SX、イカリジン（icaridin）+SX、メトキン－ブチル（methoquin-butyl）+SX、メチルネオデカナミド（methylneodecanamide）+SX、２－（オクチルチオ）エタノール（2-(octylthio)ethanol）+SX、ブトキシポリプロピレングリコール（butoxypolypropylene glycol)+SX、オキサメート（oxamate）+SX、quwenzhi+SX、quyingding+SX、zengxiaon+SX、レベミド（rebemide）+SX、ナフテン酸銅（copper naphthenate）+SX、ナフテン酸亜鉛（zinc naphthenate）+SX。 Combination of the present component of the above group (f) with the compound of the present invention X:
Anthraquinone (anthraquinone) + SX, chloralose + SX, acrep (acrep) + SX, butopyronoxyl (butopyronoxyl) + SX, camphor (camphor) + SX, d-camphor (d-camphor) + SX, carboxide (carboxide) ) + SX, dibutyl phthalate + SX, deet + SX, dimethyl carbamate + SX, dimethyl phthalate + SX, dibutyl succinate + SX , Dibutyl adipate + SX, ethohexadiol + SX, hexamidide + SX, icaridin (icaridin) + SX, methoquin-butyl (methoquin-butyl) + SX, methyl neodecanamide (Methylneodecanamide) + SX, 2- (Octylthio) ethanol + SX, butoxypolypropylene glycol + SX, oxamate (oxamat) e) + SX, quwenzhi + SX, quyingding + SX, zengxiaon + SX, rebemide + SX, copper naphthenate + SX, zinc naphthenate + zinc SX.
　上記群（ｇ）の本成分と本発明化合物Ｘとの組み合わせ：
　ビス（トリブチルチン）オキシド（bis(tributyltin) oxide）+SX、アリシン（allicin）+SX、ブロモアセトアミド（bromoacetamide）+SX、クロエトカルブ（cloethocarb）+SX、硫酸銅（copper sulfate）+SX、フェンチン（fentin）+SX、リン酸鉄（III）（ferric phosphate）+SX、メタアルデヒド（metaldehyde）+SX、ニクロスアミド（niclosamide）+SX、ペンタクロロフェノール（pentachlorophenol）+SX、ナトリウムペンタクロロフェノキシド（sodium pentachlorophenoxide）+SX、タジムカルブ（tazimcarb）+SX、トラロピリル（tralopyril）+SX、トリフェンモルフ（trifenmorph）+SX。 Combinations of this component of the above group (g) with the compound of the present invention X:
Bis (tributyltin) oxide (bis (tributyltin) oxide) + SX, allicin (allicin) + SX, bromoacetamide (bromoacetamide) + SX, cloetocarb (s) + SX, copper sulfate (copper sulfate) + SX, phentin (fentin) ) + SX, ferric phosphate (ferric phosphate) + SX, metadehyde (metaldehyde) + SX, niclosamide (Niclosamide) + SX, pentachlorophenol + SX, sodium pentachlorophenoxide (sodium) SX, tazimcarb + SX, tralopyril + SX, trifenmorph + SX.
　上記群（ｈ）の本成分と本発明化合物Ｘとの組み合わせ：
　(E)-2-hexenal+SX、(E)-2-octadecenal+SX、(E)-4-tridecen-1-yl acetate+SX、(E)-5-decen-1-yl acetate+SX、(E)-5-decen-1-ol+SX、(E)-3,3-dimethylcyclohexylideneacetaldehyde+SX、(E)-7-dodecen-1-yl acetate+SX、(E)-8-dodecen-1-yl acetate+SX、(E)-9-dodecen-1-yl acetate+SX、(E)-10-hexadecenal+SX、(E)-11-hexadecen-1-yl acetate+SX、(E)-11-tetradecen-1-yl acetate+SX、(E)-11-tetradecen-1-ol+SX、(E)-4-tridecen-1-yl acetate+SX、(E)-6-methylhept-2-en-4-ol+SX、(Z)-2-(3,3-dimethylcyclohexylidene)ethanol+SX、(Z)-4-decen-1-yl acetate+SX、(Z)-4-tridecen-1-yl acetate+SX、(Z)-5-decen-1-yl acetate+SX、(Z)-5-decen-1-ol+SX、(Z)-7-tetradecenal+SX、(Z)-7-dodecen-1-yl acetate+SX、(Z)-8-dodecen-1-yl acetate+SX、(Z)-9-dodecen-1-yl acetate+SX、(Z)-8-dodecen-1-ol+SX、(Z)-9-hexadecenal+SX、(Z)-10-hexadecen-1-yl acetate+SX、(Z)-11-hexadecen-1-ol+SX、(Z)-11-hexadecenal+SX、(Z)-11-hexadecen-1-yl acetate+SX、(Z)-11-octadecenal+SX、(Z)-13-octadecenal+SX、(Z)-hexadec-13-en-11-yn-1-yl acetate+SX、(Z)-13-octadecenal+SX、(Z)-icos-13-en-10-one+SX、(Z)-7-tetradecenal+SX、(Z)-tetradec-9-en-1-ol+SX、(Z)-9-tetradecen-1-yl acetate+SX、(Z)-11-tetradecen-1-yl acetate+SX、(Z)-13-icosen-10-one+SX、(Z,E)-7,11-hexadecadien-1-yl acetate+SX、(Z,E)-9,12-tetradecadien-1-yl acetate+SX、(E,Z)-4,10-tetradecadien-1-yl acetate+SX、(E,E)-8,10-dodecadien-1-ol+SX、(E,E)-10,12-hexadecadienal+SX、(E,E)-9,11-tetradecadien-1-yl acetate+SX、(E,Z)-2,13-octadecadien-1-ol+SX、(E,Z)-3,13-octadecadien-1-ol+SX、(E,Z)-2,13-octadecadien-1-yl acetate+SX、(E,Z)-3,13-octadecadien-1-yl acetate+SX、(E,Z)-7,9-dodecadien-1-yl acetate+SX、(E,E)-7,9-dodecadien-1-yl acetate+SX、(Z,E)-9,12-tetradecadien-1-yl acetate+SX、(Z,E)-9,11-tetradecadien-1-yl acetate+SX、(Z,E)-7,11-hexadecadien-1-yl acetate+SX、(Z,Z)-3,13-octadecadien-1-ol+SX、(Z,Z)-4,7-decadien-1-yl acetate+SX、(Z,Z)-3,13-octadecadien-1-yl acetate+SX、(Z,Z)-7,11-hexadecadien-1-yl acetate+SX、(Z,Z,E)-7,11,13-hexadecatrienal+SX、(5R)-5-[(1Z)-1-decen-1-yl]dihydro-2(3H)-furanone+SX、(2R,5R)-ethyl-1,6-dioxaspiro[4,4]nonane+SX、(2R,5S)-ethyl-1,6-dioxaspiro[4,4]nonane+SX、(4R,8R)-4,8-dimethyldecanal+SX、(4R,8S)-4,8-dimethyldecanal+SX、2,4-dimethyl-5-ethyl-6,8-dioxabicyclo[3,2,1]octane+SX、(-)-4-methyl-3-heptanol+SX、1,7-dioxaspiro[5,5]undecane+SX、3-carene+SX、3-methylcyclohex-2-en-1-one+SX、14-methyloctadec-1-ene+SX、4-methylnonan-5-ol+SX、4-methylnonan-5-one+SX、4-(3-oxobutyl)phenyl acetate+SX、dodecyl acetate+SX、dodeca-8,10-dien-1-yl acetate+SX、ethyl (2E,4Z)-decadienoate+SX、ethyl 4-methyloctanoate+SX、methyl 2,6,10-trimethyldodecanoate+SX、tetradecan-1-ol+SX、tetradec-11-en-1-ol+SX、tetradec-11-en-1-yl acetate+SX、tridec-4-en-1-yl acetate+SX、(3S,6R)-3-methyl-6-isopropenyl-9-decen-1-yl acetate+SX、(3S,6S)-3-methyl-6-isopropenyl-9-decen-1-yl acetate+SX、アルファ－マルチストリアチン（alpha-multistriatin）+SX、アルファ－ピネン（alpha-pinene）+SX、エンド－ブレビコミン（endo-brevicomin）+SX、エキソ－ブレビコミン（exo-brevicomin）+SX、カンフェン（camphene）+SX、コドレルア（codlelure）+SX、コドレモン（codlemone）+SX、キュウルア（cuelure）+SX、ディスパールア（disparlure）+SX、ドミニカルア（dominicalure）+SX、オイゲノール（eugenol）+SX、ファルネソール（farnesol）+SX、フェロルア（ferrolure）+SX、フロンタリン（frontalin）+SX、ゴシップルア（gossyplure）+SX、グランドルア（grandlure）+SX、グランドルアI（grandlure I）+SX、グランドルアII（grandlure II）+SX、グランドルアIII（grandlure III）+SX、グランドルアIV（grandlure IV）+SX、ヘキサルア（hexalure）+SX、イプスジエノール（ipsdienol）+SX、イプセノール（ipsenol）+SX、ジャポニルア（japonilure）+SX、リネアチン（lineatin）+SX、リトルア（litlue）+SX、ループルア（looplure）+SX、メドルア（medlure）+SX、メガトモ酸（megatomoic acid）+SX、メチルオイゲノール（methyl eugenol）+SX、ムスカルア（muscalure）+SX、ネロリドール（nerolidol）+SX、オルフラルア（orfralure）+SX、オリクタルア（oryctalure）+SX、オストラモン（ostramone）+SX、リンコルア（rhyncolure)+SX、シグルア(siglure)+SX、ソルジジン（sordidin）+SX、スルカトール（sulcatol）+SX、トリメドルア（trimedlure）+SX、トリメドルアＡ（trimedlure A）+SX、トリメドルアＢ1（trimedlure B1）+SX、トリメドルアＢ2（trimedlure B2）+SX、トリメドルアＣ（trimedlure C）+SX、トランク－コール（trunc-call）+SX、（E）－バーベノール（(E)-verbenol）+SX、（Z）－バーベノール（(Z)-verbenol）+SX、トランス－バーベノール（trans-verbenol）+SX、S－バーベノン（(S)-verbenone）+SX。 Combinations of the present component of the above group (h) with the compound of the present invention X:
(E) -2-hexenal + SX, (E) -2-octadecenal + SX, (E) -4-tridecen-1-yl acetate + SX, (E) -5-decen-1-yl acetate + SX, (E) -5-decen-1-ol + SX, (E) -3,3-dimethylcyclohexylideneacetaldehyde + SX, (E) -7-dodecen-1-yl acetate + SX, (E) -8-dodecen-1 -yl acetate + SX, (E) -9-dodecen-1-yl acetate + SX, (E) -10-hexadecenal + SX, (E) -11-hexadecen-1-yl acetate + SX, (E)- 11-tetradecen-1-yl acetate + SX, (E) -11-tetradecen-1-ol + SX, (E) -4-tridecen-1-yl acetate + SX, (E) -6-methylhept-2-ene en-4-ol + SX, (Z) -2- (3,3-dimethylcyclohexylidene) ethanol + SX, (Z) -4-decen-1-yl acetate + SX, (Z) -4-tridecen-1- yl acetate + SX, (Z) -5-decen-1-yl acetate + SX, (Z) -5-decen-1-ol + SX, (Z) -7-tetradecenal + SX, (Z) -7- dodecen-1-yl acetate + SX, (Z) -8-dodecen-1-yl acetate + SX, (Z) -9-dodecen-1-yl acetate + SX, (Z) -8-dodecen-1-ol + SX, (Z) -9-hexadecenal + SX, (Z) -10-hexadecen-1-yl acetate + SX, (Z) -11-hexadecen-1-ol + SX, (Z) -11-hexadecenal + SX, (Z) -11-hexadecen-1-yl acetate + SX, (Z) -11-octadecenal + SX, (Z) -13-octadecenal + SX, (Z) -hexadec-13-en-11-yn -1-yl acetate + SX (Z) -13-octadecenal + SX, (Z) -icos-13-en-10-one + SX, (Z) -7-tetradecenal + SX, (Z) -tetradec-9-en-1-ol + SX, (Z) -9-tetradecen-1-yl acetate + SX, (Z) -11-tetradecen-1-yl acetate + SX, (Z) -13-icosen-10-one + SX, (Z, E ) -7,11-hexadecadien-1-yl acetate + SX, (Z, E) -9,12-tetradecadien-1-yl acetate + SX, (E, Z) -4,10-tetradecadien-1-yl acetate + SX, (E, E) -8,10-dodecadien-1-ol + SX, (E, E) -10,12-hexadecadienal + SX, (E, E) -9,11-tetradecadien-1-yl acetate + SX, (E, Z) -2, 13-octadecadien-1-ol + SX, (E, Z) -3, 13-octadecadien-1-ol + SX, (E, Z) -2, 13- octadecadien-1-yl acetate + SX, (E, Z) -3,13-octadecadien-1-yl acetate + SX, (E, Z) -7,9-dodecadien-1-yl acetate + SX, (E, (E, Z) E) -7,9-dodecadien-1-yl acetate + SX, (Z, E) -9,12-tetradecadadien-1-yl acetate + SX, (Z, E) -9,11-tetracadadien-1-yl acetate + SX, (Z, E) -7, 11-hexadecadien-1-yl acetate + SX, (Z, Z) -3, 13-octadecadien-1-ol + SX, (Z, Z) -4, 7 -decadien-1-yl acetate + SX, (Z, Z) -3,13-octadecadien-1-yl acetate + SX, (Z, Z) -7,11-hexadecadien-1-yl acetate + SX, (Z , Z, E) -7, 11, 13-hexadecatrienal + SX, (5R) -5-[(1Z) -1 -decen-1-yl] dihydro-2 (3H) -furanone + SX, (2R, 5R) -ethyl-1,6-dioxaspiro [4,4] nonane + SX, (2R, 5S) -ethyl-1, 6-dioxaspiro [4,4] nonane + SX, (4R, 8R) -4,8-dimethyldecanal + SX, (4R, 8S) -4,8-dimethyldecanal + SX, 2,4-dimethyl-5-ethyl- 6,8-dioxabicyclo [3,2,1] octane + SX, (−)-4-methyl-3-heptanol + SX, 1,7-dioxaspiro [5,5] undecane + SX, 3-carene + SX, 3-methylcyclohex-2-en-1-one + SX, 14-methyloctadec-1-ene + SX, 4-methylnonan-5-ol + SX, 4-methylnonan-5-one + SX, 4- (3-oxobutyl ) phenyl acetate + SX, dodecyl acetate + SX, dodeca-8,10-dien-1-yl acetate + SX, ethyl (2E, 4Z) -decadienoate + SX, ethyl 4-methyloctanoate + SX, methyl 2,6,10 -trimethyldodecanoate + SX, tetradecan-1-ol + SX, tetradec-11-en-1-ol + SX, tetradec-11-en-1-yl acetate + SX, tridec-4-en-1-yl acetate + SX , (3S, 6R) -3-methyl-6-isopropenyl-9-decen-1-yl acetate + SX, (3S, 6S) -3-methyl-6-isopropenyl-9-decen-1-yl acetate + SX , Alpha-multistriatin (alpha-multistriatin) + SX, alpha-pinene (alpha-pinene) + SX, end-brevikomi N (endo-brevicomin) + SX, exo-brevicomin (exo-brevicomin) + SX, camphene (camphene) + SX, codrelure (coddleure) + SX, codlemon (codlemone) + SX, cueure (cuelure) + SX, disparage (Disparlure) + SX, dominicalure + SX, eugenol (eugenol) + SX, farnesol (farnesol) + SX, ferrolure (ferrolure) + SX, frontalin (frontalin) + SX, gossy plure (gossyplure) + SX, grand lure (Grandlure) + SX, grandlure I (grandlure I) + SX, grandlure II (grandlure II) + SX, grandlure III (grandlure III) + SX, grandlure IV (grandlure IV) + SX, hexalure + SX, Ips Dienol (ipsdienol) + SX, Ipsenol (ipsenol) + SX, japonilure (japonilure) + SX, lineatein + SX, Little A (litlue) + SX, Loop Lure (loop Lure) + SX, Medlure (medlure) + SX, megatomoic acid + SX, methyl eugenol + SX, muscalure + SX, nerolidol + SX, orfralure + SX, oryctalure + SX, Ostramon (Ostramone) + SX, Linkorua (Rhyncolure) + SX, Siglure (Siglure) + SX, Sordizine (Sordidin) + SX, Sulcatol (Sulcatol) + SX, Trimedlure (Trimedlure) + SX, Trimedlure A (trimedlure A) + SX , Trimedlure B1 (trimedlure B1) + SX, Trimedlure B 2 (trimedlure B 2) + SX, Trimedlure C (trimedlure C) + SX, Trunk-call (trunc-call) + SX, (E) -verbeno ((E) -verbanol ) + SX, (Z)-Verbenol ((Z) -verbanol) + SX, trans-verbeno (trans-verbanol) + SX, S-verbenone ((S) -verbenone) + SX.
　本発明化合物Ｘと本成分との比は、特に限定されるものではないが、重量比（本発明化合物Ｘ：本成分）で１０００：１～１：１０００、５００：１～１：５００、１００：１～１：１００、５０：１～１：５０、２０：１～１：２０、１０：１～１：１０、３：１～１：３、１：１～１：５００、１：１～１：１００、１：１～１：５０、１：１～１：２０、１：１～１：１０等が挙げられる。 The ratio of the compound of the present invention X to the component is not particularly limited, but the weight ratio (the compound of the present invention X: this component) is from 1000: 1 to 1: 1000, 500: 1 to 1: 500, 100 : 1 to 1: 100, 50: 1 to 1: 50, 20: 1 to 1: 20, 10: 1 to 1: 10, 3: 1 to 1: 3, 1: 1 to 1: 500, 1: 1 To 1: 100, 1: 1 to 1:50, 1: 1 to 1:20, 1: 1 to 1:10 and the like.
　本発明化合物Ｘが効力を有する有害生物は、有害昆虫や有害ダニ類等の有害節足動物；有害線虫及び有害軟体動物；並びに植物病原性微生物である。 The pests to which the compound X of the present invention is effective are harmful arthropods such as harmful insects and harmful mites; harmful nematodes and harmful molluscs; and phytopathogenic microorganisms.
　有害昆虫、有害ダニ類等の有害節足動物、有害線虫、及び有害軟体動物としては、例えば以下のものが挙げられる。 Examples of harmful arthropods such as harmful insects and harmful mites, harmful nematodes and harmful molluscs include, for example, the following.
　半翅目（Hemiptera）：ヒメトビウンカ（Laodelphax striatellus）、トビイロウンカ（Nilaparvata lugens）、セジロウンカ（Sogatella furcifera）、トウモロコシウンカ（Peregrinus maidis）、キタウンカ（Javesella pellucida）、クロフツノウンカ（Perkinsiella saccharicida）、Tagosodes orizicolus等のウンカ科（Delphacidae）；ツマグロヨコバイ（Nephotettix cincticeps）、タイワンツマグロヨコバイ（Nephotettix virescens）、クロスジツマグロヨコバイ（Nephotettix nigropictus）、イナズマヨコバイ（Recilia dorsalis）、チャノミドリヒメヨコバイ（Empoasca onukii）、ジャガイモヒメヨコバイ（Empoasca fabae）、コーンリーフホッパー（Dalbulus maidis）、シロオオヨコバイ（Cofana spectra）等のヨコバイ科（Cicadellidae）；Mahanarva posticata、Mahanarva fimbriolata等のコガシラアワフキムシ科（Cercopidae）；マメクロアブラムシ（Aphis fabae）、ダイズアブラムシ（Aphis glycines）、ワタアブラムシ（Aphis gossypii）、ヨーロッパリンゴアブラムシ（Aphis pomi）、ユキヤナギアブラムシ（Aphis spiraecola）、モモアカアブラムシ（Myzus persicae）、ムギワラギクオマルアブラムシ（Brachycaudus helichrysi）、ダイコンアブラムシ（Brevicoryne brassicae）、Rosy apple aphid（Dysaphis plantaginea）、ニセダイコンアブラムシ（Lipaphis erysimi）、チューリップヒゲナガアブラムシ（Macrosiphum euphorbiae）、ジャガイモヒゲナガアブラムシ（Aulacorthum solani）、レタスヒゲナガアブラムシ（Nasonovia ribisnigri）、ムギクビレアブラムシ（Rhopalosiphum padi）、トウモロコシアブラムシ（Rhopalosiphum maidis）、ミカンクロアブラムシ（Toxoptera citricida）、モモコフキアブラムシ（Hyalopterus pruni）、ヒエノアブラムシ（Melanaphis sacchari）、オカボノクロアブラムシ（Tetraneura nigriabdominalis）、カンシャワタアブラムシ（Ceratovacuna lanigera）、リンゴワタムシ（Eriosoma lanigerum）等のアブラムシ科（Aphididae）；ブドウネアブラムシ（Daktulosphaira vitifoliae）、Pecan phylloxera（Phylloxera devastatrix）、Pecan leaf phylloxera（Phylloxera notabilis）、Southern pecan leaf phylloxera（Phylloxera russellae）等のネアブラムシ科（Phylloxeridae）；ツガカサアブラムシ（Adelges tsugae）、Adelges piceae、ヒメカサアブラムシ（Aphrastasia pectinatae）等のカサアブラムシ科（Adelgidae）；イネクロカメムシ（Scotinophara lurida）、Malayan rice black bug（Scotinophara coarctata）、アオクサカメムシ（Nezara antennata）、トゲシラホシカメムシ（Eysarcoris aeneus）、オオトゲシラホシカメムシ（Eysarcoris lewisi）、シラホシカメムシ（Eysarcoris ventralis）、ムラサキシラホシカメムシ（Eysarcoris annamita）、クサギカメムシ（Halyomorpha halys）、ミナミアオカメムシ（Nezara viridula）、Brown stink bug（Euschistus heros）、Red banded stink bug（Piezodorus guildinii）、Oebalus pugnax、Dichelops melacanthus等のカメムシ科（Pentatomidae）；Burrower brown bug（Scaptocoris castanea）等のツチカメムシ科（Cydnidae）；ホソヘリカメムシ（Riptortus pedestris）、クモヘリカメムシ（Leptocorisa chinensis）、ホソクモヘリカメムシ（Leptocorisa acuta）等のホソヘリカメムシ科（Alydidae）；ホソハリカメムシ（Cletus punctiger）、アシビロヘリカメムシ（Leptoglossus australis）等のヘリカメムシ科（Coreidae）；カンシャコバネナガカメムシ（Caverelius saccharivorus）、コバネヒョウタンナガカメムシ（Togo hemipterus）、アメリカコバネナガカメムシ（Blissus leucopterus）等のナガカメムシ科（Lygaeidae）；アカヒゲホソミドリカスミカメ（Trigonotylus caelestialium）、アカスジカスミカメ（Stenotus rubrovittatus）、フタトゲムギカスミカメ（Stenodema calcarata）、サビイロカスミカメ（Lygus lineolaris）等のカスミカメムシ科（Miridae）；オンシツコナジラミ（Trialeurodes vaporariorum）、タバココナジラミ（Bemisia tabaci）、ミカンコナジラミ（Dialeurodes citri）、ミカントゲコナジラミ（Aleurocanthus spiniferus）、チャトゲコナジラミ（Aleurocanthus camelliae）、ヒサカキワタフキコナジラミ（Pealius euryae）等のコナジラミ科（Aleyrodidae）；シュロマルカイガラムシ（Abgrallaspis cyanophylli）、アカマルカイガラムシ（Aonidiella aurantii）、ナシマルカイガラムシ（Diaspidiotus perniciosus）、クワシロカイガラムシ（Pseudaulacaspis pentagona）、ヤノネカイガラムシ（Unaspis yanonensis）、ニセヤノネカイガラムシ（Unaspis citri）等のマルカイガラムシ科（Diaspididae）；ルビーロウムシ（Ceroplastes rubens）等のカタカイガラムシ科（Coccidae）；イセリアカイガラムシ（Icerya purchasi）、キイロワタフキカイガラムシ（Icerya seychellarum）等のワタフキカイガラムシ科（Margarodidae）；ナスコナガイガラムシ（Phenacoccus solani）、クロテンコナカイガラムシ（Phenacoccus solenopsis）、フジコナカイガラムシ（Planococcus kraunhiae）、クワコナカイガラムシ（Pseudococcus comstocki）、ミカンコナカイガラムシ（Planococcus citri）、ガハニコナカイガラムシ（Pseudococcus calceolariae）、ナガオコナカイガラムシ（Pseudococcus longispinus）、タトルミーリーバグ（Brevennia rehi）等のコナカイガラムシ科（Pseudococcidae）；ミカンキジラミ（Diaphorina citri）、ミカントガリキジラミ（Trioza erytreae）、ナシキジラミ（Cacopsylla pyrisuga）、チュウゴクナシキジラミ（Cacopsylla chinensis）、ジャガイモトガリキジラミ（Bactericera cockerelli）、Pear psylla（Cacopsylla pyricola）等のキジラミ科（Psyllidae）；プラタナスグンバイ（Corythucha ciliata）、アワダチソウグンバイ（Corythucha marmorata）、ナシグンバイ（Stephanitis nashi）、ツツジグンバイ（Stephanitis pyrioides）等のグンバイムシ科（Tingidae）；トコジラミ（Cimex lectularius）等のトコジラミ科（Cimicidae）；Giant Cicada（Quesada gigas）等のセミ科（Cicadidae）；ブラジルサシガメ（Triatoma infestans）等のトリアトマ属（Triatoma spp.）。 Hemiptera (Hemiptera): Hemetobiunka (Laodelphax striatellus), Tobiirounka (Nilaparvata lugens), Sejirounka (Sogatella furcifera), Corn locust (Peregrinus maidis), Red-winged deer (Javesella pellucida), Black-footed Michalica Planthopper family (Delphacidae); Green leafhopper (Nephotettix cincticeps), Yellow-tailed leafhopper (Nephotettix virescens), Black-tailed green leafhopper (Nephotettix nigropictus), Yellow-tailed leafhopper (Recilia dorsalis), Black-tailed leafminus moth , Corn leaf hopper (Dalbulus maidis), white leafhopper (Cofana spectra), etc., leafhopper family (Cicadelidae); Mahanarva posticata, Mahanarva fimbriolata, etc., moss family (Cercopidae); Bean aphids (Aphis fabae), soybean aphids (Aphis glycines), cotton aphids (Aphis gossypii), European apple aphids (Aphis pomi), pokeweed aphids (Aphis spiraecola), green leaf aphids (Myzus persicae), moths Helichrysi), radish aphid (Brevicoryne brassicae), Rosy apple aphid (Dysaphis plantaginea), pseudonymous aphid (Lipaphis erysimi), tulip buffalo aphid (Macrosiphum euphorbiae), potato blight aphid Aphid beetle (Rhopalosiphum padi), corn aphid (Rhopalosiphum maidis), red-handed aphid (Toxoptera citricida), Pectinella aphid (Hyalopterus pruni), baboon The aphid family (Aphididae) such as the green buff beetle (Melanaphis sacchari), the black-winged aphid (Tetraneura nigriabdominalis), the black-winged aphid (Ceratovacuna lanigera), and the like. ), Pecan leaf phylloxera (Phylloxera notabilis), Southern pecan leaf phylloxera (Phylloxera russellae), and the like (Phylloxeridae); (Adelgidae); rice black bug (Scot inophara lurida), Malayan rice black bug (Scot inophara coarctata), green grass bug (Nezara antennata), rhizophorid bug (Eysarcoris aeneus), dryback beetle (Eysarcoris lewisi), Red-headed Bug (Eysarcoris ventralis), Gray-backed Bug (Eysarcoris annamita), Brown-backed Bug (Halyomorpha halys), Red-headed Bug (Nezara viridula), Brown stink bug (Euschistus heros), Red banded stink bug (Piez Sturgeon (Pentatomidae) such as melacanthus; Sturgeon (Cydnidae) such as Burrower brown bug (Scaptocoris castanea); Helicidae (Alydidae); Helicidae (Cletus punctiger), Helicidae (Leptoglossus australis), etc. Helicidae (Coreidae); , Ameri Red-tailed bug family (Lygaeidae) such as Blissus leucopterus; Red-backed squirrel (Trigonotylus caelestialium); Stink bug family (Miridae); Trichoderma faecalis (Trialeurodes vaporariorum), B. tabaci (Bemisia tabaci), Scutellaria barbata (Dialeurodes citri), Scutellaria barbata L. (Aleurocanthus spiniferus), Scutellaria plagiasus (Aleurocanthus camelliae) shields Whitefly family (Aleyrodidae); White-backed scale insect (Abgrallaspis cyanophylli), Red-backed scale insect (Aonidiella aurantii), Yellow-backed scale insect (Diaspidiotus perniciosus), Musk Red-tailed beetles (Diaspididae) such as P. (Pseudaulacaspis pentagona), Red-winged scale insects (Unaspis yanonensis), False-spotted scale insects (Unaspis citri) etc .; ), Irodridae (Icerya seychellarum), and the like (Margarodidae); mealybug such as comstocki), mealybug (Planococcus citri), mealybug (Pseudococcus calceolariae), mealybug (Pseudococcus longispinus), tuttle myri bug (Brevennia rehi) etc. (Pseudococcidae); Orange leaf lumber (Diaphorina citri), red leaf lice (Trioza erytreae), nashi lary tree (Cacopsylla pyrisuga), Chinese lice leafworm (Cacopsylla chinensis), potato leaf lice (Bacterica cocklellihichium icich (Psyllidae); Platypus guniensis (Corythucha ciliata), Amaryllidus gunbi (Corythucha marmorata), Nasygumbai (Stephanitis nashi), such as Gunzimbi (Stephanitis pyrioides), and the like (Tingidae); A semi-family (Cicadidae) such as Giant Cicada (Quesada gigas); Triatoma sp. (Triatoma spp.) Such as Brazilian Sasame Turtle (Triatoma infestans).
　鱗翅目（Lepidoptera）：ニカメイガ（Chilo suppressalis）、Darkheaded stem borer（Chilo polychrysus）、White stem borer（Scirpophaga innotata）、イッテンオオメイガ（Scirpophaga incertulas）、Rupela albina、コブノメイガ（Cnaphalocrocis medinalis）、Marasmia patnalis、イネハカジノメイガ（Marasmia exigua）、ワタノメイガ（Notarcha derogata）、アワノメイガ（Ostrinia furnacalis）、European corn borer（Ostrinia nubilalis）、ハイマダラノメイガ（Hellula undalis）、モンキクロノメイガ（Herpetogramma luctuosale）、シバツトガ（Pediasia teterrellus）、ライスケースワーム（Nymphula depunctalis）、Sugarcane borer（Diatraea saccharalis）等のツトガ科（Crambidae）；モロコシマダラメイガ（Elasmopalpus lignosellus）、ノシメマダラメイガ（Plodia interpunctella）、フタモンマダラノメイガ（Euzophera batangensis）等のメイガ科（Pyralidae）；ハスモンヨトウ（Spodoptera litura）、シロイチモジヨトウ（Spodoptera exigua）、アワヨトウ（Mythimna separata）、ヨトウガ（Mamestra brassicae）、イネヨトウ（Sesamia inferens）、シロナヨトウ（Spodoptera mauritia）、フタオビコヤガ（Naranga aenescens）、ツマジロクサヨトウ（Spodoptera frugiperda）、アフリカシロナヨトウ（Spodoptera exempta）、タマナヤガ（Agrotis ipsilon）、タマナギンウワバ（Autographa nigrisigna）、イネキンウワバ（Plusia festucae）、Soybean looper（Chrysodeixis includens）、トリコプルシア属（Trichoplusia spp.）、ニセアメリカタバコガ（Heliothis virescens）等のヘリオティス属（Heliothis spp.）、オオタバコガ（Helicoverpa armigera）、アメリカタバコガ（Helicoverpa zea）等のヘリコベルパ属（Helicoverpa spp.）、Velvetbean caterpillar（Anticarsia gemmatalis）、Cotton leafworm（Alabama argillacea）、Hop vine borer（Hydraecia immanis）等のヤガ科（Noctuidae）；モンシロチョウ（Pieris rapae）等のシロチョウ科（Pieridae）；ナシヒメシンクイ（Grapholita molesta）、スモモヒメシンクイ（Grapholita dimorpha）、マメシンクイガ（Leguminivora glycinivorella）、アズキサヤムシガ（Matsumuraeses azukivora）、リンゴコカクモンハマキ（Adoxophyes orana fasciata）、チャノコカクモンハマキ（Adoxophyes honmai）、チャハマキ（Homona magnanima）、ミダレカクモンハマキ（Archips fuscocupreanus）、コドリンガ（Cydia pomonella）、カンシャシンクイハマキ（Tetramoera schistaceana）、Bean Shoot Borer（Epinotia aporema）、Citrus fruit borer（Ecdytolopha aurantiana）等のハマキガ科（Tortricidae）；チャノホソガ（Caloptilia theivora）、キンモンホソガ（Phyllonorycter ringoniella）等のホソガ科（Gracillariidae）；モモシンクイガ（Carposina sasakii）等のシンクイガ科（Carposinidae）；Coffee Leaf miner（Leucoptera coffeella）、モモハモグリガ（Lyonetia clerkella）、ギンモンハモグリガ（Lyonetia prunifoliella）等のハモグリガ科（Lyonetiidae）；マイマイガ（Lymantria dispar）等のリマントリア属（Lymantria spp.）、チャドクガ（Euproctis pseudoconspersa）等のユープロクティス属（Euproctis spp.）等のドクガ科（Lymantriidae）；コナガ（Plutella xylostella）等のコナガ科（Plutellidae）；モモキバガ（Anarsia lineatella）、イモキバガ（Helcystogramma triannulella）、ワタアカミムシガ（Pectinophora gossypiella）、ジャガイモガ（Phthorimaea operculella）、Tuta absoluta等のキバガ科（Gelechiidae）；アメリカシロヒトリ（Hyphantria cunea）等のヒトリガ科（Arctiidae）；Giant Sugarcane borer（Telchin licus）等のカストニアガ科（Castniidae）；ヒメボクトウ（Cossus insularis）等のボクトウガ科（Cossidae）；ヨモギエダシャク（Ascotis selenaria）等のシャクガ科（Geometridae）；ヒロヘリアオイラガ（Parasa lepida）等のイラガ科（Limacodidae）；カキノヘタムシガ（Stathmopoda masinissa）等のニセマイコガ科（Stathmopodidae）；クロメンガタスズメ（Acherontia lachesis）等のスズメガ科（Sphingidae）；キクビスカシバ（Nokona feralis）、コスカシバ（Synanthedon hector）、ヒメコスカシバ（Synanthedon tenuis）等のスカシバガ科（Sesiidae）；イネツトムシ（Parnara guttata）等のセセリチョウ科（Hesperiidae）；イガ（Tinea translucens）、コイガ（Tineola bisselliella）等のヒロズコガ科（Tinedae）。 Lepidoptera: Chilo suppressalis, Darkheaded stem borer (Chilo polychrysus), White stem borer (Scirpophaga innotata), Itten's tree magnolia (Scirpophaga incertulas), Rupela albina, Kobnomiga (Cnaphatailicalis) Casino meiga (Marasmia exigua), cotton moth (Notarcha derogata), foxtail moth (Ostrinia furnacalis), European corn borer (Ostrinia nubilalis), black-tailed moth (Hellula undulis), monquil chronome moth (Herpetogramma lucitose, Pe) Caseworms (Nymphula depunctalis), Sugarcane borer (Diatraea saccharalis), and other parts of the family (Crambidae); Ringworm (Pyralidae); Spodoptera litura, Spodoptera exigua, Mythimna separata, Myodopa (Mamestra brassicae), Spurge (Sesamitimates) Roxayo spiny (Spodoptera frugiperda), African white spiny (Spodoptera exempta), spiny moth (Agrotis ipsilon), spiny edgy (Autographa nigrisigna), inykin iwaba (Plusia festucae), Soybean looper (Chrysodeixis includes, trichoc Heliothis sp. (Heliothis virescens), Heliothis spp., Helicoverpa armigera, Helicoverpa zea, etc. Helicoverpa spp., Velvetbean caterpillar (Anticarsia gemma) talis), Cotton leafworm (Alabama argillacea), Hop vine borer (Hydraecia immanis), etc .; Noctuidae; Pteris (Pieris rapae) dimorpha), legume mincing moth (Leguminivora glycinivorella), azuxamushi moth (Matsumuraeses azukivora), apple red pokemon mackerel (Adoxophyes orana fasciata), kanokokan monmai (Adoxophys honmai), chahamaki (Homona magnima trich.) (Cydia pomonella), Chinese chaff (Tetramoera schistaceana), Bean Shoot Borer (Epinotia aporema), Citrus fruit borer (Ecdytolopha aurantiana) such as Trichoideidae (Tortricidae); La) et al. (Gracillariidae); Carposina sasakii et al. (Carposinidae); Coffee Leaf miner (Leucoptera coffeella), Peach leafworm (Lyonetia clerkella), Gimone leafworm (Lyonetia prunifoliella) A member of the genus Lymantriidae (Lymantriidae) such as Lymantria sppar, such as Lymantria dispar, Euproctis pseudoconspersa, etc; (Plullidae); Psyllididae (Gelechiidae) such as peach moth (Anarsia lineatella), immature moth (Helcystogramma triannulella), cotton moth (Pectinophora gossy piella), potato moth (Phthorimaea operculella), Tuta absoluta etc. Arctiidae); Giant Sugarcane b Orster (Telchin licus) Kastoniagae (Castniidae); Himebokuto (Cossus insularis) et al. (Cossidae); Family (Limacodidae); Staphymopoda (Stathmopoda masinissa) etc .; Stathmopodidae; Acherontia lachesis et al. Sphingidae (Sphingidae); And the like. Seschidae (Sesiidae), etc .; Hemperididae (Hesperiidae) such as the rice tortoise (Parnara guttata);
　総翅目（Thysanoptera）：ミカンキイロアザミウマ（Frankliniella occidentalis）、ミナミキイロアザミウマ（Thrips palmi）、チャノキイロアザミウマ（Scirtothrips dorsalis）、ネギアザミウマ（Thrips tabaci）、ヒラズハナアザミウマ（Frankliniella intonsa）、イネアザミウマ（Stenchaetothrips biformis）、モトジロアザミウマ（Echinothrips americanus）等のアザミウマ科（Thripidae）；イネクダアザミウマ（Haplothrips aculeatus）等のクダアザミウマ科（Phlaeothripidae）。 Thysanoptera (Thysanoptera): Thripsidae (Frankliniella occidentalis), Thripsidae (Thrips palmi), Chalyssus thripsus (Scirtothrips dorsalis), Thrips tabaci (Thrips tabaci), Hydrangea thripsus (Frankliniella intronacea) , Thripidae such as Echinothrips americanus etc .; Thripsidae (Phlaeothripidae) such as Haekohrips aculeatus.
　双翅目（Diptera）：タネバエ（Delia platura）、タマネギバエ（Delia antiqua）、テンサイモグリハナバエ（Pegomya cunicularia）等のハナバエ科（Anthomyiidae）；シュガービートルートマゴット（Tetanops myopaeformis）等のハネフリバエ科（Ulidiidae）；イネハモグリバエ（Agromyza oryzae）、トマトハモグリバエ（Liriomyza sativae）、マメハモグリバエ（Liriomyza trifolii）、ナモグリバエ（Chromatomyia horticola）等のハモグリバエ科（Agromyzidae）；イネキモグリバエ（Chlorops oryzae）等のキモグリバエ科（Chloropidae）；ウリミバエ（Bactrocera cucurbitae）、ミカンコミバエ（Bactrocera dorsalis）、ナスミバエ（Bactrocera latifrons）、オリーブミバエ（Bactrocera oleae）、クインスランドミバエ（Bactrocera tryoni）、チチュウカイミバエ（Ceratitis capitata）、アップルマゴット（Rhagoletis pomonella）、オウトウハマダラミバエ（Rhacochlaena japonica）等のミバエ科（Tephritidae）；イネヒメハモグリバエ（Hydrellia griseola）、トウヨウイネクキミギワバエ（Hydrellia philippina）、イネクキミギワバエ（Hydrellia sasakii）等のミギワバエ科（Ephydridae）；オウトウショウジョウバエ（Drosophila suzukii）等のショウジョウバエ科（Drosophilidae）；オオキモンノミバエ（Megaselia spiracularis）等のノミバエ科（Phoridae）；オオチョウバエ（Clogmia albipunctata）等のチョウバエ科（Psychodidae）；チビクロバネキノコバエ(Bradysia difformis)等のクロバネキノコバエ科（Sciaridae）；ヘシアンバエ（Mayetiola destructor）、イネノシントメタマバエ（Orseolia oryzae）等のタマバエ科（Cecidomyiidae）；Diopsis macrophthalma等のシュモクバエ科（Diopsidae）；キリウジガガンボ（Tipula aino）、Common cranefly（Tipula oleracea）、European cranefly（Tipula paludosa）等のガガンボ科（Tipulidae）；アカイエカ（Culex pipiens pallens）、ネッタイシマカ（Aedes aegypti）、ヒトスジシマカ（Aedes albopicutus）、シナハマダラカ（Anopheles hyracanus sinesis）、コガタアカイエカ（Culex quinquefasciatus）、チカイエカ（Culex pipiens molestus Forskal）、ネッタイイエカ（Culex quinquefasciatus）等のカ科（Culicidae）；キアシオオブユ（Prosimulium yezoensis）、ツメ卜ゲブユ（Simulium ornatum）等のブユ科（Simulidae）；ウシアブ（Tabanus trigonus)等のアブ科（Tabanidae）；イエバエ（Musca domestica）、オオイエバエ（Muscina stabulans）、サシバエ（Stomoxys calcitrans）、ノサシバエ（Haematobia irritans）等のイエバエ科（Muscidae）；クロバエ科（Calliphoridae）；ニクバエ科（Sarcophagidae）；オオユスリカ（Chironomus plumosus）、セスジユスリカ（Chironomus yoshimatsui）、ハイイロユスリカ（Glyptotendipes tokunagai）等のユスリカ科（Chironomidae）；ヒメイエバエ科（Fannidae）。 Diptera (Diptera): Anemoneid family (Anthomyiidae) such as fly (Delia platura), onion fly (Delia antiqua), sugar beet fly (Pegomya cunicularia) etc .; Rice leafminer fly (Agromyza oryzae), tomato leafminer fly (Liriomyza sativae), bean leafminer fly (Liriomyza trifolii), leafminer fly (Chromatomyia horticola), etc. leafworm family (Agromyzidae); Bactrocera cucurbitae), mandarin orange fruit fly (Bactrocera dorsalis), egg fruit fly (Bactrocera latiphrons), olive fruit fly (Bactrocera oleae), quince land fruit fly (Bactrocera tryoni), citechine fruit fly (Ceratitis capitaphy) Tephritidae (Tephritidae), such as pomonella), sweet potato weeds (Rhacochlaena japonica); ; Drosophilidae such as Drosophila melanogaster (Drosophila suzukii); Psyllididae (Phoridae) such as the giant flea fly (Megaselia spiracularis); dimorphism fly family (Sciaridae) such as Hessian fly (Mayetiola destructor), Bacteriidae (Cecidomyiidae) such as incocarid fly (Orseolia oryzae); , Common cranefly (Tipula oleracea), European cranefly (Tipula paludosa), etc. (Tipulidae); Culex quinquefasciatus), Culex pipiens molestus Forskal, Culexidae such as Culex quinquefasciatus; Culicidae; Prosimulium yezoensis; House fly (Musca domestica), house fly (Muscina stabulans), sea fly (Stomoxys calcitrans), house fly (Haematobia irritans) such as house fly (Muscidae); ); (Chironomus plumosus), Chironomus yoshimatsui (Chironomus yoshimatsui), Chironomidae such as Gray midges (Glyptotendipes tokunagai) (Chironomidae); fanniidae (Fannidae).
　鞘翅目（Coleoptera）：ウエスタンコーンルートワーム（Diabrotica virgifera virgifera）、サザンコーンルートワーム（Diabrotica undecimpunctata howardi）、ノザンコーンルートワーム（Diabrotica barberi）、メキシカンコーンルートワーム（Diabrotica virgifera zeae）、バンデッドキューカンバービートル（Diabrotica balteata）、Cucurbit Beetle（Diabrotica speciosa）、ビーンリーフビートル（Cerotoma trifurcata）、クビアカクビホソハムシ（Oulema melanopus）、ウリハムシ（Aulacophora femoralis）、キスジノミハムシ（Phyllotreta striolata）、Cabbage flea beetle（Phyllotreta cruciferae)、Western black flea beetle（Phyllotreta pusilla）、Cabbage stem flea beetle（Psylliodes chrysocephala)、コロラドハムシ（Leptinotarsa decemlineata）、イネドロオイムシ（Oulema oryzae）、グレープ・コラスピス（Colaspis brunnea）、コーン・フレアビートル（Chaetocnema pulicaria）、サツマイモヒサゴトビハムシ（Chaetocnema confinis）、ポテト・フレアビートル（Epitrix cucumeris）、イネトゲハムシ（Dicladispa armigera）、southern corn leaf beetle（Myochrous denticollis）、ヨツモンカメノコハムシ（Laccoptera quadrimaculata）、タバコノミハムシ（Epitrix hirtipennis）等のハムシ科（Chrysomelidae）；Seedcorn beetle（Stenolophus lecontei）、Slender seedcorn beetle（Clivina impressifrons）等のオサムシ科（Carabidae）；ドウガネブイブイ（Anomala cuprea）、ヒメコガネ（Anomala rufocuprea）、アオドウガネ（Anomala albopilosa）、マメコガネ（Popillia japonica）、ナガチャコガネ（Heptophylla picea）、European Chafer（Rhizotrogus majalis）、クロマルコガネ（Tomarus gibbosus）、Holotrichia属（Holotrichia spp.）、ジューン・ビートル（Phyllophaga crinita）等のPhyllophaga属（Phyllophaga spp.）、Diloboderus abderus等のDiloboderus属（Diloboderus spp.）等のコガネムシ科（Scarabaeidae）；ワタミヒゲナガゾウムシ（Araecerus coffeae）、アリモドキゾウムシ（Cylas formicarius）、イモゾウムシ（Euscepes postfasciatus）、アルファルファタコゾウムシ（Ｈypera postica）、コクゾウムシ（Sitophilus zeamais）、イネゾウムシ（Echinocnemus squameus）、イネミズゾウムシ（Lissorhoptrus oryzophilus）、シロスジオサゾウムシ（Rhabdoscelus lineatocollis）、ワタミハナゾウムシ（Anthonomus grandis）、シバオサゾウムシ（Sphenophorus venatus）、Southern Corn Billbug（Sphenophorus callosus）、Soybean stalk weevil（Sternechus subsignatus）、Sugarcane weevil（Sphenophorus levis）、サビヒョウタンゾウムシ（Scepticus griseus）、トビイロヒョウタンゾウムシ（Scepticus uniformis）、ブラジルマメゾウムシ（Zabrotes subfasciatus）、マツノキクイムシ（Tomicus piniperda）、Coffee Berry Borer（Hypothenemus hampei）、Aracanthus mourei等のAracanthus属（Aracanthus spp.）、cotton root borer（Eutinobothrus brasiliensis）等のゾウムシ科（Curculionidae）；コクヌストモドキ（Tribolium castaneum）、ヒラタコクヌストモドキ（Tribolium confusum）等のゴミムシダマシ科（Tenebrionidae）；ニジュウヤホシテントウ（Epilachna vigintioctopunctata）等のテントウムシ科（Coccinellidae）；ヒラタキクイムシ（Lyctus brunneus）等のナガシンクイムシ科（Bostrychidae）；ヒョウホンムシ科（Ptinidae）；ゴマダラカミキリ（Anoplophora malasiaca）、Migdolus fryanus等のカミキリムシ科（Cerambycidae）；オキナワカンシャクシコメツキ（Melanotus okinawensis）、トビイロムナボソコメツキ（Agriotes fuscicollis）、クシコメツキ（Melanotus legatus）、アシブトコメツキ属（Anchastus spp.）、コノデルス属（Conoderus spp.）、クテニセラ属（Ctenicera spp.）、リモニウス属（Limonius spp.）、Aeolus属（Aeolus spp.）等のコメツキムシ科（Elateridae）；アオバアリガタハネカクシ（Paederus fuscipes）等のハネカクシ科（Staphylinidae）；ヒメマルカツオブシムシ（Anthrenus verbasci）、ハラジロカツオブシムシ（Dermestes maculates）等のカツオブシムシ科（Dermestidae）；タバコシバンムシ（Lasioderma serricorne）、ジンサンシバンムシ（Stegobium paniceum）等のシバンムシ科（Anobidae）。 Coleoptera (Coleoptera): Western corn rootworm (Diabrotica virgifera virgifera), Southern corn rootworm (Diabrotica undecimpunctata howardi), Northen corn rootworm (Diabrotica barberi), Mexican corn rootworm (Diabrotica virgifera zeae), Banded Cuicabiotic (Diabrotica virgifera zeae) balteata), Cucurbit Beetle (Diabrotica speciosa), Bean Leaf Beetle (Cerotoma trifurcata), Cubial Leaf Beetle (Oulema melanopus), Ground Leaf Beetle (Aulacophora femoralis), Sweet potato leaf beetle (Phyllotreta striolata), Cabbagel flea beetle (Phyllotreta pusilla), Cabbage stem flea beetle (Psylliodes chrysocephala), Colorado potato beetle (Leptinotarsa decemlineata), Indreum oivensis (Oulema oryzae), grape colaspis (Colaspis brunnea) , Corn flare beetle (Chaetocnema pulicaria), sweet potato beetle (Chaetocnema confinis), potato flare beetle (Epitrix cucumeris), red clover beetle (Dicladispa armigera), southern corn leaf beetle (Myochrous dentiformis), , Chrysomelidae (Chrysomelidae) such as tobacco flea beetles (Epitrix hirtipennis); Seedcorn beetle (Stenolophus lecontei), Slender seedcorn beetle (Clivina impressifrons) etc. Carabidae (Carabidae); Red-tailed bream (Anomala albopilosa), red-tailed beech (Popillia japonica), red-crested bream (Heptophylla picea), European Chafer (Rhizotrogus majalis), Black marsh (Tomarus gibbosus), Holotrichia sp. Phyllophaga (Phyllophaga spp.) such as ga crinita, Diloboderus (Diloboderus spp.) such as Diloboderus abderus, etc. Scarabaeidae (Scarabaeidae); Euscepes postfasciatus), alfalfate weevil (Hypera postica), tree weevil (Sitophilus zeamais), rice weevil (Echinocnemus squameus), rice water weevil (Lissorhoptrus oryzophilus), Shirosiobe sage beetle (Rhabdoscelus lineate history) Sphenophorus venatus), Southern Corn Billbug (Sphenophorus callosus), Soybean stalk weevil (Sternechus subsignatus), Sugarcane weevil (Sphenophorus levis), Crustacean weevil (Scepticus griseus), Tobiiro gourd (Scepticus uniformi) s), Brazilian bean weevil (Zabrotes subfasciatus), Pinus spinach (Tomicus piniperda), Coffee Berry (Hypothenemus hampei), Aracanthus sp. and such as Aracanthus mourei et al. ; Tricholium castaneum, Tricholium confusum (Tenebrionidae) such as Tricholium castaneum, Tribolium condusum (Tenebrionidae); Etirachnida (Coccinellidae) such as Epilachna vigintopoc unctata, etc .; Family (Bostrychidae); Streptomyces (Ptinidae); Anemone longhorn (Anoplophora malasiaca), Migdolus fryanus etc. Long-horned family (Cerambycidae); ), Insect bite (Melanotus legatus), insect bite (Anchastus spp.), Conoderus spp., Ctenicera spp., Limonius spp., Aeolus sp. (Elateridae); Staphylinidae (Staphylinidae) such as Paederus leaf beetle (Paederus fuscipes); Scutellariae (Anthrenus verbasci), Dermaste maculates (Dermestes maculates), etc. , Anemoneaceae (Anobidae) such as Ginsane beetle (Stegobium paniceum).
　直翅目（Orthoptera）：トノサマバッタ（Locusta migratoria）、モロッコトビバッタ（Dociostaurus maroccanus）、オーストラリアトビバッタ（Chortoicetes terminifera）、アカトビバッタ（Nomadacris septemfasciata）、Brown Locust（Locustana pardalina）、Tree Locust（Anacridium melanorhodon）、Italian Locust（Calliptamus italicus）、Differential grasshopper（Melanoplus differentialis）、Two striped grasshopper（Melanoplus bivittatus）、Migratory grasshopper（Melanoplus sanguinipes）、Red-Legged grasshopper（Melanoplus femurrubrum）、Clearwinged grasshopper（Camnula pellucida）、サバクワタリバッタ（Schistocerca gregaria）、Yellow-winged locust（Gastrimargus musicus）、Spur-throated locust（Austracris guttulosa）、コバネイナゴ（Oxya yezoensis）、ハネナガイナゴ（Oxya japonica）、タイワンツチイナゴ（Patanga succincta）等のバッタ科（Acrididae）；ケラ（Gryllotalpa orientalis）等のケラ科（Gryllotalpidae）；ヨーロッパイエコオロギ（Acheta domestica）、エンマコオロギ（Teleogryllus emma）等のコオロギ科（Gryllidae）；Mormon cricket（Anabrus simplex）等のキリギリス科（Tettigoniidae）。 Orthoptera (Orthoptera): Toocta grasshopper (Locusta migratoria), Toroca grasshopper (Dociostaurus maroccanus), Australia Tobibatata (Chortoicetes terminifera), Red-footed grasshopper (Nomadacris septemfasciata), Brown Locust (Locustana pardalis Aritraceilogues) Locust (Calliptamus italicus), Differential grasshopper (Melanoplus differentialis), Two striped grasshopper (Melanoplus bivittatus), Migratory grasshopper (Melanoplus cerichelimel at least 2 times), Red-Legged grasshopper (Mel ), Yellow-winged locust (Gastrimargus musicus), Spur-throated locust (Austracris guttulosa), Kobayinago (Oxya yezoensis), Hanekinainago (Oxya japonica), Trichophyton (Patanga succincta), etc. e); Griglotalpidae such as Gryllotalpa orientalis; Acritaidae (Gryllidae) such as the European green cricket (Acheta domestica);
　膜翅目（Hymenoptera）：カブラハバチ（Athalia rosae）、ニホンカブラバチ（Athalia japonica）等のハバチ科（Tenthredinidae）；ヒアリ（Solenopsis invicta）、アカカミアリ（Solenopsis geminata）等のトフシアリ属（Solenopsis spp.）、Brown leaf-cutting ant（Atta capiguara）等のハキリアリ属（Atta spp.)、ヒメハキリアリ属（Acromyrmex spp.）、サシハリアリ（Paraponera clavata）、ルリアリ（Ochetellus glaber）、イエヒメアリ（Monomorium pharaonis）、アルゼンチンアリ（Linepithema humile）、クロヤマアリ（Formica fusca japonica）、アミメアリ（Pristomyrmex punctutus）、オオズアリ（Pheidole noda）、ツヤオオズアリ（Pheidole megacephala）、クロオオアリ（Camponotus japonicus）、ムネアカオオアリ（Camponotus obscuripes）等のオオアリ属、オキシデンタリスシュウカクアリ（Pogonomyrmex occidentalis）等のシュウカクアリ属（Pogonomyrmex）、コカミアリ（Wasmania auropunctata）等のコカミアリ属（Wasmania）、アシナガキアリ（Anoplolepis gracilipes）等のアリ科（Formicidae）；オオスズメバチ（Vespa mandarinia japonica）、ケブカスズメバチ（Vespa simillima）、コガタスズメバチ（Vespa analis Fabriciusi）、ツマアカスズメバチ（Vespa velutina）、セグロアシナガバチ（Polistes jokahamae）等のスズメバチ科（Vespidae）；モミノオオキバチ（Urocerus gigas）等のキバチ科（Siricidae）；アリガタバチ科（Bethylidae）。 Hymenoptera (Hymenoptera): Japanese gossip (Athalia rosae), Japanese black-billed wasp (Athalia japonica), etc. (Tenthredinidae); Fireflies (Solenopsis invicta), Red-winged Ants (Solenopsis geminata), etc. Tolushinella (Solenopsis spp.) leaf-cutting ant (Atta capiguara) et al. (Atta spp.), Anemone spp. (Acromyrmex spp.), Scorpionfish (Paraponera clavata), Ruriari (Ochetellus glaber), Scutellariae (Monomorium pharaonis), Argentine ants (Linepithemahumile) ), Black-headed ants (Formica fusca japonica), Ammet's ants (Pristomyrmex punctutus), Ascidian (Pheidole noda), Ascidian (Pheidole megacephala), Ascidian (Camponotus japonicus), Red-billed ants (Camponotus obscuripes), etc. (Pogonomyrmex occidentalis) (Pogonomyrmex), Anopheles (Wasmania auropunctata), etc., Anthelidum (Wasmania), Anodidae (Anoplolepis gracilipes), such as an ant family (Formicidae); (Vespa analis Fabriciusi), Cassava (Vespa velutina), Segroia wasp (Polistes jokahamae), etc. (Vespidae);
　ゴキブリ目（Blattodea）：チャバネゴキブリ（Blattella germanica）等のチャバネゴキブリ科（Blattellidae）；クロゴキブリ（Periplaneta fuliginosa）、ワモンゴキブリ（Periplaneta americana）、トビイロゴキブリ（Periplaneta brunnea）、トウヨウゴキブリ（Blatta orientalis）等のゴキブリ科（Blattidae）；ヤマトシロアリ（Reticulitermes speratus）、イエシロアリ（Coptotermes formosanus）、アメリカカンザイシロアリ（Incisitermes minor）、ダイコクシロアリ（Cryptotermes domesticus）、タイワンシロアリ（Odontotermes formosanus）、コウシュンシロアリ（Neotermes koshunensis）、サツマシロアリ（Glyptotermes satsumensis）、ナカジマシロアリ（Glyptotermes nakajimai）、カタンシロアリ（Glyptotermes fuscus）、オオシロアリ（Hodotermopsis sjostedti）、コウシュウイエシロアリ（Coptotermes guangzhouensis）、アマミシロアリ（Reticulitermes amamianus）、ミヤタケシロアリ（Reticulitermes miyatakei）、カンモンシロアリ（Reticulitermes kanmonensis）、タカサゴシロアリ（Nasutitermes takasagoensis）、ニトベシロアリ（Pericapritermes nitobei）、ムシャシロアリ（Sinocapritermes mushae）、Cornitermes cumulans等のシロアリ科（Termitidae）。 Cockroach (Blattodea): German cockroach (Blattella germanica) and other German cockroaches (Blattellidae); (Blattidae); Yamato termites (Reticulitermes speratus), house termites (Coptotermes formosanus), American termites (Incisitermes minor), Dicta termites (Cryptotermes domesticus), Taiwan termites (Odontotermes formosanus), red-handed termites (Neotermes) Glyptotermes satsumensis), Chinese termite (Glyptotermes nakajimai), catan termite (Glyptotermes fuscus), giant termite (Hodotermopsis sjostedti), black-and-white termite (Coptotermes guangzhouensis) , Aphid termites (Reticulitermes amamianus), Mitatake termites (Reticulitermes miyatakei), Cameron termites (Reticulitermes kanmonensis), Takasago termites (Nasutitermes takasagoensis), Nitobe termites (Pericapritermes nitobei), Musashi termitimates (Termitidae).
　ノミ目（Siphonaptera）：ネコノミ（Ctenocephalidae felis）、イヌノミ（Ctenocephalides canis）、ヒ卜ノミ（Pulex irritans）、ケオプスネズミノミ（Xenopsylla cheopis）、スナノミ（Tunga penetrans）、ニワトリノミ（Echidnophaga gallinacea）、ヨーロッパネズミノミ（Nosopsyllus fasciatus）。 Flea order (Siphonaptera): cat flea (Ctenocephalidae felis), dog flea (Ctenocephalides canis), castor flea (Pulex irritans), pheasant flyfish (Xenopsylla cheopis), sunanose (Tunga penetrans), chick flea (Echidnophaga gallinacea) Fleas (Nosopsyllus fasciatus).
　シラミ目（Anoplura）：ブタジラミ（Haematopinus suis）、ウシジラミ（Haematopinus eurysternus）、ヒツジシラミ（Dalmalinia ovis）、イヌジラミ（Linognathus seypsus）、ヒトジラミ（Pediculus humanis）、コロモジラミ（Pediculuc humanus corporis）、アタマジラミ（Pediculus humanus humanus）、ケジラミ（Phthirus pubis）。 Lice (Anoplura): pig lice (Haematopinus suis), lice (Haematopinus eurysternus), sheep lice (Dalmalinia ovis), lice (Linognathus seypsus), lice (Pediculus humanis), lice (Pediculucus humanus corporis) Barbed lice (Phthirus pubis).
　ハジラミ目（Mallophagida）：ウシハジラミ（Dalmalinia bovis）、ヒツジハジラミ（Dalmalinia ovis）等のボビコーラ属（Bovicola spp.）；イヌハジラミ（Trichodectes canis）等のケモノハジラミ属（Trichodectes spp.）、ネコハジラミ（Felicola subrostrata）等のフェリコラ属（Felocpla spp）、ニワトリナガハジラミ（Lipeurus caponis）等のペウルス属（Lipeurus spp.）、トリメノポン属（Trimenopon spp）、メノポン属（Menopon spp.）等のトリハジラミ科（Menoponidae）。 Psyllids (Mallophagida): Bovine lava (Dalmalinia bovis), sheep baldness (Dalmalinia ovis) etc. Bovicola sp. (Bovicola spp.); P. Of the genus Fericola (Felocpla spp), Peanut (Lipeurus caponis) and the like Peurus (Lipeurus spp.), Trimenopon sp. (Trimenopon spp), Menopon sp. (Menopon spp.) And the like.
　ダニ目（Acari）：ナミハダニ（Tetranychus urticae）、カンザワハダニ（Tetranychus kanzawai）、ミツユビナミハダニ（Tetranychus evansi）、ミカンハダニ（Panonychus citri）、リンゴハダニ（Panonychus ulmi）、オリゴニカス属（Oligonychus spp.）等のハダニ科（Tetranychidae）；ミカンサビダニ（Aculops pelekassi）、リュウキュウミカンサビダニ（Phyllocoptruta citri）、トマトサビダニ（Aculops lycopersici）、チャノサビダニ（Calacarus carinatus）、チャノナガサビダニ（Acaphylla theavagrans）、ニセナシサビダニ（Eriophyes chibaensis）、リンゴサビダニ（Aculus schlechtendali）、カキサビダニ（Aceria diospyri）、Aceria tosichella、シソサビダニ（Shevtchenkella sp.）等のフシダニ科（Eriophyidae）；チャノホコリダニ（Polyphagotarsonemus latus）等のホコリダニ科（Tarsonemidae）；ミナミヒメハダニ（Brevipalpus phoenicis）等のヒメハダニ科（Tenuipalpidae）；ケナガハダニ科（Tuckerellidae）；フタトゲチマダニ（Haemaphysalis longicornis）、キチマダニ（Haemaphysalis flava）、タイワンカクマダニ（Dermacentor taiwanensis）、アメリカイヌカクマダニ（Dermacentor variabilis）、デルマセントル・アンデルソニ（Dermacentor andersoni）、ヤマトマダニ（Ixodes ovatus）、シュルツマダニ（Ixodes persulcatus）、イクソデス・リシナス（Ixodes ricinus）、ブラックレッグドチック（Ixodes scapularis）、アメリカキララマダニ（Amblyomma americanum）、アンブリオンマ・マクラタム（Ambryomma maculatum）、オウシマダニ（Boophilus microplus）、ブーフィラス・アンヌラタス（Boophilus annulatus）、クリイロコイタマダニ（Rhipicephalus sanguineus）等のマダニ科（Ixodidae）；ケナガコナダニ（Tyrophagus putrescentiae）、ホウレンソウケナガコナダニ（Tyrophagus similis）等のコナダニ科（Acaridae）；コナヒョウヒダニ（Dermatophagoides farinae）、ヤケヒョウヒダニ（Dermatophagoides pteronyssinus）等のチリダニ科（Pyroglyphidae）；ホソツメダニ（Cheyletus eruditus）、クワガタツメダニ（Cheyletus malaccensis）、ミナミツメダニ（Cheyletus moorei）、イヌツメダニ（Cheyletiella yasguri）等のツメダニ科（Cheyletidae）；ミミヒゼンダニ（Otodectes cynotis）、ヒゼンダニ（Sarcoptes scabiei）等のヒゼンダニ科（Sarcoptidae）；イヌニキビダニ（Demodex canis）等のニキビダニ科（Demodicidae）；ズツキダニ科（Listrophoridae）；イエササラダニ科（Haplochthoniidae）；イエダニ（Ornithonyssus bacoti）、トリサシダニ（Ornithonyssus sylviarum）等のオオサシダニ科（Macronyssidae）；ワクモ（Dermanyssus gallinae）等のワクモ科（Dermanyssidae）；アカツツガムシ（Leptotrombidium akamushi）等のツツガムシ科（Trombiculidae）。 Acarids (Acari): Two-spotted spider mite (Tetranychus urticae), Kanzawa spider mite (Tetranychus kanzawai), Eurasian spider mite (Tetranychus evansi), red-eared spider mite (Panonychus citri), apple red spider mite (Panonychus ulmi), genus Oligonikius ; Scutellaris mite (Aculops pelekassi), Scutellaris mite (Phyllocoptruta citri), Tomato snail (Aculops lycopersici), Scutellaris mite (Calacarus carinatus), Scutellariae ica (Acaphylla theavagrans), Discolored snail Aculus schlechtendali), Aceria diospyri, Aceria tosichella, Shevtchenkella sp. Eriophyidae, such as Schizoctella (Shevtchenkella sp.); Red-handed spider mite (Tenuipalpidae) such as (Brevipalpus phoenicis); Tannertidae (Tuckerellidae); Andersoni (Dermacentor and ersoni), Ixodes ovatus, Ixodes persulcatus, Ixodes ricinus, Black legged tick (Ixodes scapularis), American kill mite (Amblyomma americanum), amblyomumium platinum ), Ixodidae such as Boophilus microplus, Boophilus annulatus, Rhipicephalus sanguineus, etc .; Tyrophagus pu Acaridae (Acaridae), such as Trichophagus similis, etc .; Dermatophagoides such as Dermatophagoides farinae, Dermatophagoides pteronyssinus, etc. (Pyroglyphidae); Blue-spotted mite (Chyletidae), such as the brown mite (Cheyletus moorei), and the dog's red-haired mite (Chyletiella yasguri); Demodicidae); Listrophoridae; House Lepidoptera (Haplochthoniidae); Ornithonyssus bacoti, Ornithonyssus sylviarum, etc .; Macronyssidae; Macrophyses (Dermanyssus gallinae) Red mite family (Dermanyssidae); red mites (Leptotrombidium akamushi) chiggers family, etc. (Trombiculidae).
　クモ目（Araneae）：カバキコマチグモ（Cheiracanthium japonicum）等のコマチグモ科（Eutichuridae）；セアカゴケグモ（Latrodectus hasseltii）等のヒメグモ科（Theridiidae）。
　オビヤスデ目（Polydesmida）：ヤケヤスデ（Oxidus gracilis）、アカヤスデ（Nedyopus tambanus）等のヤケヤスデ科（Paradoxosomatidae）。
　等脚目（Isopoda）：オカダンゴムシ（Armadillidium vulgare）等のオカダンゴムシ科（Armadillidiidae）。 Arachnida (Araneae): Anemone family (Eutichuridae) such as Chehiracanthium japonicum etc .; A hymenodontid family (Theridiidae) such as Latrodectus hasseltii.
Obiayasuda (Polydesmida): Nephetidae (Oxidus gracilis), Red-crested cod (Nedyopus tambanus), etc.
Isopoda: Armadillidiidae, such as Armadillium vulgare.
　唇脚綱（Chilopoda）：ゲジ（Thereuonema hilgendorfi）等のゲジ科（Scutigeridae）；トビズムカデ（Scolopendra subspinipes）等のオオムカデ科（Scolopendridae）；イッスンムカデ（Bothropolys rugosus）等のイッスンムカデ科（Ethopolidae）。
　腹足綱（Gastropoda）：チャコウラナメクジ（Limax marginatus）、キイロコウラナメクジ（Limax flavus）等のコウラナメクジ科（Limacidae）；ナメクジ（Meghimatium bilineatum）等のナメクジ科（Philomycidae）；スクミリンゴガイ（Pomacea canaliculata）等のリンゴガイ科（Ampullariidae）；ヒメモノアラガイ（Austropeplea ollula）等のモノアラガイ科（Lymnaeidae）。 Lipopoda (Chilopoda): The Scutigera such as Thereuonema hilgendorfi; Scoopendra subspinipes such as Scoopendradidae;
Gastropoda (Gastropoda): Black-tailed slug (Limax marginatus), black-tailed slug (Limax flavus), etc. (Limacidae); Monopidae (Ampullariidae) of the family; Monopidae (Lymnaeidae), such as the black-and-white alley (Aastropeplea ollula).
　線虫（Nematoda）：イネシンガレセンチュウ（Aphelenchoides besseyi）等のアフェレンコイデス科（Aphelenchoididae）；ミナミネグサレセンチュウ（Pratylenchus coffeae）、Pratylenchus brachyurus、ムギネグサレセンチュウ（Pratylenchus neglectus）、ラドフォルス・シミリス（Radopholus similis）等のプラティレンクス科（Pratylenchidae）；ジャワネコブセンチュウ（Meloidogyne javanica）、サツマイモネコブセンチュウ（Meloidogyne incognita）、キタネコブセンチュウ（Meloidogyne hapla）、ダイズシストセンチュウ（Heterodera glycines）、ジャガイモシストセンチュウ（Globodera rostochiensis）、ジャガイモシロシストセンチュウ（Globodera pallida）等のヘテロデラ科（Heteroderidae）；Rotylenchulus reniformis等のホプロライムス科（Hoplolaimidae）；イチゴメセンチュウ（Nothotylenchus acris）、ジチレンクス・ジプサシ（Ditylenchus dipsaci）等のアングイナ科（Anguinidae）；チレンクルス・セミペネトランス（Tylenchulus semipenetrans）等のティレンクルス科（Tylenchulidae）；ブドウオオハリセン（Xiphinema index）等のロンギドルス科（Longidoridae）；トリコドルス科（Trichodoridae）；マツノザイセンチュウ（Bursaphelenchus xylophilus）等のパラシタアフェレンクス科（Parasitaphelenchidae）。 Nematoda (Nematoda): Aphelenchoides sp. (Aphelenchoides besseyi etc.) Aphelenchoididae (Aphelenchoididae); And the like (Pratylenchidae), etc .; Java spp. Heteroderidae (Heteroderidae), such as Glossodera (Globodera pallida); Hoprolases (Hoplolaimidae), such as Rotylenchulus reniformis; Strawberry nematode (Nothotylenchus acris), jichi Anguinidae (Anguinidae) such as Lexus gypsy (Ditylenchus dipsaci); Tylenculidae (Tylenchulidae) such as Tylenchulus seminetrans; Trichodoridae); Parasitaphelenchidae such as Bursaphelenchus xylophilus.
　対象の有害昆虫、有害ダニ類等の有害節足動物、有害軟体動物及び有害線虫は、殺虫剤、殺ダニ剤、殺軟体動物剤及び殺線虫剤に薬剤感受性の低下した、又は薬剤抵抗性の発達した有害昆虫、有害ダニ類等の有害節足動物、有害軟体動物及び有害線虫であってもよい。ただし、薬剤感受性が大幅に低下した、又は薬剤抵抗性が大幅に発達した場合は、その対象となる殺虫剤、殺ダニ剤、殺軟体動物剤及び殺線虫剤以外の殺虫剤、殺ダニ剤、殺軟体動物剤及び殺線虫剤成分を含む組成物の使用が望ましい。 The target harmful insects, harmful mites and other harmful arthropods, harmful molluscs and harmful nematodes have reduced drug sensitivity to insecticides, acaricides, molluscicides and nematocides, or drug resistance They may be sexually developed harmful insects, harmful arthropods such as harmful mites, harmful molluscs and harmful nematodes. However, when the drug sensitivity is significantly reduced or drug resistance is significantly developed, the targeted insecticides, acaricides, insecticides other than nematocides and nematocides, acaricides The use of a composition comprising a molluscicide and a nematocide component is desirable.
　本発明化合物Ｘは、昆虫媒介性ウイルス又は昆虫媒介性細菌による植物病害から植物を保護するためにも用いることができる。 The compounds X of the present invention can also be used to protect plants from plant diseases caused by insect-borne viruses or insect-borne bacteria.
　かかる昆虫媒介性ウイルスとしては、例えば以下のものが挙げられる。 Examples of such insect-borne viruses include the following.
　イネ矮化ウイルス（Rice tungro spherical virus）、イネツングロ桿菌状ウイルス（Rice tungro bacilliform virus）、イネグラッシースタントウイルス（Rice grassy stunt virus）、イネラギッドスタントウイルス（Rice ragged stunt virus）、イネ縞葉枯ウイルス（Rice stripe virus）、黒条萎縮ウイルス（Rice black streaked dwarf virus）、イネ南方黒すじ萎縮ウイルス（Southern rice black-streaked dwarf virus）、稲こぶ萎縮ウイルス（Rice gall dwarf virus）、イネ白葉病（Rice hoja blanca virus）、イネ黄葉ウイルス（Rice yellow stunt virus）、Rice yellow mottle virus、イネ萎縮ウイルス（Rice dwarf virus）、ムギ北地モザイクウイルス（Northern cereal mosaic virus）、オオムギ黄萎ウイルス（Barley yellow dwarf virus）、オオムギ微斑ウイルス（Barley mild mosaic virus）、オオムギ黄萎PAVウイルス（Barley yellow dwarf virus-PAV）、ムギ類黄萎RPSウイルス（Cereal yellow dwarf virus-RPS）、コムギ黄葉ウイルス（Wheat yellow leaf virus）、Oat sterile dwarf virus、Wheat streak mosaic virus、トウモロコシ萎縮モザイクウイルス（Maize dwarf mosaic virus）、Maize stripe virus、Maize chlorotic mottle virus、Maize chlorotic dwarf virus、Maize rayado fino virus、サトウキビモザイクウイルス（Sugarcane mosaic virus）、Fiji disease virus、Sugarcane yellow leaf virus、ダイズ微斑モザイクウイルス（Soybean mild mosaic virus）、ソテツえそ萎縮ウイルス（Cycas necrotic stunt）、ダイズ矮化ウイルス（Soybean dwarf virus）、レンゲ萎縮ウイルス（Milk vetch dwarf virus）、ダイズモザイクウイルス（Soybean mosaic virus）、アルファルファモザイクウイルス（Alfalfa mosaic virus）、インゲンマメ黄斑モザイクウイルス（Bean yellow mosaic virus）、インゲンマメモザイクウイルス（Bean common mosaic virus）、インゲンマメ南部モザイクウイルス（Southern bean mosaic virus）、ラッカセイ矮化ウイルス（Peanut stunt virus）、ソラマメウイルトウイルス１（Broad bean wilt virus 1）、ソラマメウイルトウイルス２（Broad bean wilt virus 2）、ソラマメえそモザイクウイルス（Broad bean necrosis virus）、ソラマメ葉脈黄化ウイルス（Broad bean yellow vein virus）、クローバ葉脈黄化ウイルス（Clover yellow vein virus）、ラッカセイ斑紋ウイルス（Peanut mottle virus）、タバコ条斑ウイルス（Tobacco streak virus）、Bean pod mottle virus、Cowpea chlorotic mottle virus、Mung bean yellow mosaic virus、Soybean crinkle leaf virus、トマト退緑ウイルス（Tomato chlorosis virus）、トマト黄化えそウイルス（Tomato spotted wilt virus）、トマト黄化葉巻ウイルス（Tomato yellow leaf curl virus）、トマトアスパーミィウイルス（Tomato aspermy virus）、トマトインフェクシャスクロロシスウイルス（Tomato infectious chlorosis virus）、ジャガイモ葉巻ウイルス（Potato leafroll virus）、ジャガイモＹウイルス（Potato virus Y）、メロン黄化えそウイルス（Melon yellow spot virus）、メロンえそ斑点ウイルス（Melon necrotic spot virus）、スイカモザイクウイルス（Watermelon mosaic virus）、キュウリモザイクウイルス（Cucumber mosaic virus）、ズッキーニ黄斑モザイクウイルス（Zucchini yellow mosaic virus）、カブモザイクウイルス（Turnip mosaic virus）、カブ黄化モザイクウイルス（Turnip yellow mosaic virus）、カリフラワーモザイクウイルス（Cauliflower mosaic virus）、レタスモザイクウイルス（Lettuce mosaic virus）、セルリーモザイクウイルス（Celery mosaic virus）、ビートモザイクウイルス（Beet mosaic virus）、ウリ類退緑黄化ウイルス（Cucurbit chlorotic yellows virus）、トウガラシ退緑ウイルス（Capsicum chlorosis virus）、ビートシュードイエロースウイルス（Beet pseudo yellows virus）、リーキ黄色条斑ウイルス（Leak yellow stripe virus）、タマネギ萎縮ウイルス（Onion yellow dwarf virus）、サツマイモ斑紋モザイク病（Sweet potato feathery mottle virus）、サツマイモ縮葉モザイク病（Sweet potato shukuyo mosaic virus）、イチゴ斑紋ウイルス（Strawberry mottle virus）、イチゴマイルドイエローエッジウイルス（Strawberry mild yellow edge virus）、イチゴシュードマイルドイエローエッジウイルス（Strawberry pseudo mild yellow edge virus）、イチゴクリンクルウイルス（Strawberry crinkle virus）、イチゴべインバンディングウイルス（Strawberry vein banding virus）、ウメ輪紋ウイルス（plum pox virus）、キク茎えそウイルス（Chrysanthemum stem necrosis virus）、インパチェンスえそ斑点ウイルス（Impatiens necrotic spot virus）、アイリス黄斑ウイルス（Iris yellow spot virus）、ユリ微斑ウイルス（Lily mottle virus）、ユリ潜在ウイルス（Lilly symptomless virus）、チューリップモザイクウイルス等（Tulip mosaic virus）。 Rice hatching virus (Rice tungro spherical virus), rice tungro bacillus virus (Rice tungro bacilliform virus), rice grassy stunt virus (Rice grassy stunt virus), rice ragged stunt virus (Rice ragged stunt virus), rice streak dead virus ( Rice stripe virus), Rice black streaked dwarf virus, Rice southern black streaked dwarf virus, Rice gall dwarf virus, Rice hoja disease (Rice hoja) blanca virus), rice yellow leaf virus (Rice yellow stunt virus), rice yellow mottle virus, rice dwarf virus, wheat cereals northern virus (Northern cereal mosaic virus), barley yellow dwarf virus (Barley yellow dwarf virus) , Barley mild mosaic virus, Barley yellow dwarf PAV Iris (Barley yellow dwarf virus-PAV), wheat yellow dwarf RPS virus (Cereal yellow dwarf virus-RPS), wheat yellow leaf virus (Wheat yellow leaf virus), Oat sterile dwarf virus, Wheat streak mosaic virus, corn dwarf mosaic virus Maize dwarf mosaic virus, Maize stripe virus, Maize chlorotic mottle virus, Maize chlorotic dwarf virus, Maize rayado fino virus, Sugar cane mosaic virus (Sugarcane mosaic virus), Fiji disease virus, Sugarcane yellow leaf virus, soybean leaf mosaic virus mild mosaic virus, Cycas necrotic stunt, Soybean dwarf virus, Milk vetch dwarf virus, Soybean mosaic virus, Alfalfa mosaic virus (Alfalfa virus) mosaic virus), kidney bean yellow spot Iku virus (Bean yellow mosaic virus), bean common bean mosaic virus (Bean common mosaic virus), southern bean mosaic virus (Southern bean mosaic virus), peanut rooted virus (Peanut stunt virus), broad bean wilt virus 1 (Broad bean wilt virus) 1), Broad bean wilt virus 2 (Broad bean wilt virus 2), Broad bean necrosis virus (Broad bean necrosis virus), Broad bean yellow vein virus (Broad bean yellow vein virus), Clover yellow vein virus (Clover yellow vein) , Peanut mottle virus, Tobacco streak virus, Tobacco pod mottle virus, Cowpea chlorotic mottle virus, Mung bean yellow mosaic virus, Soybean crinkle leaf virus, Tomato dark green virus (Tomato chlorosis) virus), tomato yellowish eel Virus (Tomato spotted wilt virus), Tomato yellow leaf curl virus (Tomato yellow leaf curl virus), Tomato aspermy virus (Tomato aspermy virus), Tomato infectious chlorosis virus (Tomato infectious chlorosis virus), Potato leaf curl virus (Potato leafroll) virus, Potato virus Y (Potato virus Y), Melon yellow spot virus (Melon yellow spot virus), Melon necrotic spot virus (Melon necrotic spot virus), Watermelon mosaic virus (Watermelon mosaic virus), Cucumber mosaic virus Cucumber mosaic virus, Zucchini yellow mosaic virus, Turnip mosaic virus, Turnip yellow mosaic virus, Cauliflower mosaic virus, Lettuce mosaic virus Virus (Lettuce mosaic virus), celery mosaic virus (Celery mosaic virus), beet mosaic virus (Beet mosaic virus), Cucurbita chlorosis yellow virus (Cucurbit chlorotic yellows virus), red pepper mosaic virus (Capsicum chlorine virus), beet Pseudo yellows virus (Beet pseudo yellows virus), Leek yellow stripe virus, Leon yellow stripe virus, Onion yellow dwarf virus, Sweet potato feathery mottle virus, Sweet potato leaf disease (Sweet potato shukuyo mosaic virus), strawberry mottle virus (Strawberry mottle virus), strawberry mild yellow edge virus (Strawberry mild yellow edge virus), strawberry pseudomild yellow edge virus (Strawberry pseudo mild yellow edge virus), strawberry clin Virus (Strawberry crinkle virus), strawberry vein banding virus (Strawberry vein banding virus), plum ring virus (plum pox virus), chrysanthemum stem necrosis virus (Chrysanthemum stem necrosis virus), impatiens necrotic spot virus (Impatiens necrotic) spot virus), Iris yellow spot virus, Lily mottle virus, Lily symptomless virus, tulip mosaic virus etc. (Tulip mosaic virus).
　昆虫媒介性細菌としては、例えば以下のものが挙げられる。 Examples of insect-borne bacteria include the following.
　イネ黄萎病ファイトプラズマ（Candidatus Phytoplasma oryzae）、Candidatus Phytoplasma asteris、Maize bushy stunt phytoplasma、カンキツグリーニング病菌アジア型（Candidatus Liberbacter asiaticus）、カンキツグリーニング病菌アフリカ型（Candidatus Liberbacter africanus）、カンキツグリーニング病菌アメリカ型（Candidatus Liberbacter americanus）。 Rice yellow dwarf phytoplasma (Candidatus Phytoplasma oryzae), Candidatus Phytoplasma asteris, Maize bushy stunt phytoplasma, citrus greening fungus Asian type (Candidatus Liberbacter asiaticus), citrus greening fungus African type (Candidatus Liberbacter aflicanus), Type (Candidatus Liberbacter americanus).
　植物病原性微生物としては、例えば糸状菌、細菌等が挙げられ、具体的には以下の病害が挙げられる。括弧内は、その病害を引き起こす病原性微生物の学名を示す。 Examples of plant pathogenic microorganisms include, for example, filamentous fungi, bacteria and the like, and specific examples include the following diseases. The parentheses show the scientific name of the pathogenic microorganism that causes the disease.
　イネのいもち病（Pyricularia oryzae）、ごま葉枯病（Cochliobolus miyabeanus）、紋枯病（Rhizoctonia solani）、馬鹿苗病（Gibberella fujikuroi）、黄化萎縮病（Sclerophthora macrospora）；コムギのうどんこ病（Erysiphe graminis）、赤かび病（Fusarium graminearum、F. avenaceum、F. culmorum、Microdochium nivale）、さび病（Puccinia striiformis、P. graminis、P. recondita）、紅色雪腐病（Micronectriella nivale, M. majus）、雪腐小粒菌核病（Typhula sp.）、裸黒穂病（Ustilago tritici）、なまぐさ黒穂病（Tilletia caries、T. controversa）、眼紋病（Pseudocercosporella herpotrichoides）、葉枯病（Septoria tritici）、ふ枯病（Stagonospora nodorum）、黄斑病（Pyrenophora tritici-repentis）、リゾクトニア属菌による苗立枯れ病（Rhizoctonia solani）、立枯病（Gaeumannomyces graminis）；オオムギのうどんこ病（Erysiphe graminis）、赤かび病（Fusarium graminearum、F. avenaceum、F. culmorum、Microdochium nivale）、さび病（Puccinia striiformis、P. graminis、P. hordei）、裸黒穂病（Ustilago nuda）、雲形病（Rhynchosporium secalis）、網斑病（Pyrenophora teres）、斑点病（Cochliobolus sativus）、斑葉病（Pyrenophora graminea）、ラムラリア病（Ramularia collo-cygni）、リゾクトニア属菌による苗立枯れ病（Rhizoctonia solani）；トウモロコシのさび病（Puccinia sorghi）、南方さび病（Puccinia polysora）、すす紋病（Setosphaeria turcica）、熱帯性さび病（Physopella zeae）、ごま葉枯病（Cochliobolus heterostrophus）、炭そ病（Colletotrichum graminicola）、グレーリーフスポット病（Cercospora zeae-maydis）、褐斑病（Kabatiella zeae）、ファエオスファエリアリーフスポット病（Phaeosphaeria maydis）、ディプローディア病（Stenocarpella maydis、Stenocarpella macrospora）、ストークロット病（Fusarium graminearum、Fusarium verticilioides、Colletotrichum graminicola）、黒穂病（Ustilago maydis）；ワタの炭そ病（Colletotrichum gossypii）、白かび病（Ramuraria areola）、黒斑病（Alternaria macrospora、A. gossypii）、Thielaviopsis属菌によるBlack root rot病（Thielaviopsis basicola）；コーヒーのさび病（Hemileia vastatrix）、リーフスポット病（Cercospora coffeicola)；ナタネの菌核病（Sclerotinia sclerotiorum）、黒斑病（Alternaria brassicae）、根朽病（Phoma lingam）；サトウキビのさび病（Puccinia melanocephela、Puccinia kuehnii）、黒穂病（Ustilago scitaminea）；ヒマワリのさび病（Puccinia helianthi）、べと病（Plasmopara halstedii）；カンキツ類の黒点病（Diaporthe citri）、そうか病（Elsinoe fawcetti）、果実腐敗病（Penicillium digitatum、P. italicum）、疫病（Phytophthora parasitica、Phytophthora citrophthora）；リンゴのモニリア病（Monilinia mali）、腐らん病（Valsa ceratosperma）、うどんこ病（Podosphaera leucotricha）、斑点落葉病（Alternaria alternata apple pathotype）、黒星病（Venturia inaequalis）、炭そ病（Glomerella cingulata）、褐斑病（Diplocarpon mali）、輪紋病（Botryosphaeria berengeriana）、疫病（Phytophtora cactorum）；ナシの黒星病（Venturia nashicola、V. pirina）、黒斑病（Alternaria alternata Japanese pear pathotype）、赤星病（Gymnosporangium haraeanum）；モモの灰星病（Monilinia fructicola）、黒星病（Cladosporium carpophilum）、フォモプシス腐敗病（Phomopsis sp.）；ブドウの黒とう病（Elsinoe ampelina）、晩腐病（Glomerella cingulata）、うどんこ病（Uncinula necator）、さび病（Phakopsora ampelopsidis）、ブラックロット病（Guignardia bidwellii）、べと病（Plasmopara viticola）；カキの炭そ病（Gloeosporium kaki）、落葉病（Cercospora kaki、Mycosphaerella nawae）；ウリ類の炭そ病（Colletotrichum lagenarium）、うどんこ病（Sphaerotheca fuliginea）、つる枯病（Didymella bryoniae）、褐斑病（Corynespora cassiicola）、つる割病（Fusarium oxysporum）、べと病（Pseudoperonospora cubensis）、疫病（Phytophthora sp.）、苗立枯病（Pythium sp.）；トマトの輪紋病（Alternaria solani）、葉かび病（Cladosporium fulvum）、すすかび病（Pseudocercospora fuligena）、疫病（Phytophthora infestans）、うどんこ病（Leveillula taurica）；ナスの褐紋病（Phomopsis vexans）、うどんこ病（Erysiphe cichoracearum）；アブラナ科野菜の黒斑病（Alternaria japonica）、白斑病（Cercosporella brassicae）、根こぶ病（Plasmodiophora brassicae）、べと病（Peronospora parasitica）；ネギのさび病（Puccinia allii）；ダイズの紫斑病（Cercospora kikuchii）、黒とう病（Elsinoe glycines）、黒点病（Diaporthe phaseolorum var. sojae）、さび病（Phakopsora pachyrhizi)、褐色輪紋病（Corynespora cassiicola）、炭疽病（Colletotrithum glycines、C. truncatum）、葉腐病（Rhizoctonia solani）、褐紋病（Septoria glycines）、斑点病（Cercospora sojina）、菌核病（Sclerotinia sclerotiorum）、うどんこ病（Microsphaera diffusa）、茎疫病（Phytophthora sojae）、べと病（Peronospora manshurica）、突然死病（Fusarium virguliforme）；インゲンの菌核病（Sclerotinia sclerotiorum）、さび病（Uromyces appendiculatus）、角斑病（Phaeoisariopsis griseola）、炭そ病（Colletotrichum lindemuthianum）；ラッカセイの黒渋病（Cercospora personata）、褐斑病（Cercospora arachidicola）、白絹病（Sclerotium rolfsii）；エンドウのうどんこ病（Erysiphe pisi）；ジャガイモの夏疫病（Alternaria solani）、疫病（Phytophthora infestans）、緋色腐敗病（Phytophthora erythroseptica）、粉状そうか病（Spongospora subterranea f. sp. subterranea）、半身萎凋病（Verticillium albo－atrum、V. dahliae、V. nigrescens）；イチゴのうどんこ病（Sphaerotheca humuli）；チャの網もち病（Exobasidium reticulatum）、白星病（Elsinoe leucospila）、輪斑病（Pestalotiopsis sp.）、炭そ病（Colletotrichum theae-sinensis）；タバコの赤星病（Alternaria longipes）、炭そ病（Colletotrichum tabacum）、べと病（Peronospora tabacina）、疫病（Phytophthora nicotianae）；テンサイの褐斑病（Cercospora beticola）、葉腐病（Thanatephorus cucumeris）、根腐病（Thanatephorus cucumeris）、黒根病（Aphanomyces cochlioides）；バラの黒星病（Diplocarpon rosae）、うどんこ病（Sphaerotheca pannosa）；キクの褐斑病（Septoria chrysanthemi-indici）、白さび病（Puccinia horiana）；タマネギの白斑葉枯病（Botrytis cinerea、B. byssoidea、B. squamosa）、灰色腐敗病（Botrytis alli）、小菌核性腐敗病（Botrytis squamosa）；種々の作物の灰色かび病（Botrytis cinerea）、菌核病（Sclerotinia sclerotiorum）；ダイコン黒斑病（Alternaria brassicicola）；シバのダラースポット病（Sclerotinia homoeocarpa）、シバのブラウンパッチ病及びラージパッチ病（Rhizoctonia solani）；並びにバナナのシガトカ病（Mycosphaerella fijiensis、Mycosphaerella musicola）。
　Aspergillus属、Penicillium属、Fusarium属、Gibberella属、Tricoderma属、Thielaviopsis属、Rhizopus属、Mucor属、Corticium属、Phoma属、Rhizoctonia属、及びDiplodia属菌等によって引き起こされる、各種作物の種子病害又は生育初期の病害。
　Polymyxa属又はOlpidium属等によって媒介される各種作物のウイルス病。
　イネの苗立枯細菌病（Burkholderia plantarii）；キュウリの斑点細菌病（Pseudomonas ｓyringae pv． Lachrymans）；ナスの青枯病（Ralstonia solanacearum）、カンキツのかいよう病（Xanthomonas citri）；ハクサイの軟腐病（Erwinia carotovora）。 Rice blast fungus (Pyricularia oryzae), sesame leaf blight (Cochliobolus miyabeanus), sheath blight (Rhizoctonia solani), fool disease (Gibberella fujikuroi), yellow dwarf (Sclerophthora macrospora); wheat powdery mildew (Erysiphe) graminis), Fusarium head blight (Fusarium graminearum, F. avenaceum, F. culmorum, Microdochium nivale), rust (Puccinia striiformis, P. graminis, P. recondita), scarlet snow rot (Micronectriella nivale, M. majus) Small rot of snowflake (Typhula sp.), Bare broom scrotum (Ustilago tritici), lumber scab (Tilletia caries, T. controversa), eye blight (Pseudocercosporella herpotrichoides), leaf blight (Septoria tritici), blight Disease (Stagonospora nodorum), yellow spot (Pyrenophora tritici-repentis), rhizoctonia spp. Seedling blight (Rhizoctonia solani), blight (Gaeumannomyces graminis); barley powdery mildew (Erysiphe graminis), mildew Fusarium grami nearum, F. avenaceum, F. culmorum, Microdochium nivale), rust (Puccinia striiformis, P. graminis, P. hordei), naked panicle (Ustilago nuda), scab (Rhynchosporium secalis), web blight (Pyrenophora teres) Blight disease (Cochliobolus sativus), leaf blight (Pyrenophora graminea), ramularia disease (Ramularia collo-cygni), seedling blight of rhizoctonia (Rhizoctonia solani); rust of corn (Puccinia sorghi), southern rust Disease (Puccinia polysora), soot disease (Setosphaeria turcica), tropical rust (Physopella zeae), sesame leaf blight (Cochliobolus heterostrophus), anthracnose (Colletotrichum graminicola), gray leaf spot disease (Cercospora zeae-maydis) , Brown spot (Kabatiella zeae), Phaeospha area leaf spot (Phaeosphaeria maydis), diplodia (Stenocarpella maydis, Stenocarpella macrospora), Stokelot's disease (Fu) sarium graminearum, Fusarium verticilioides, Colletotrichum graminicola), black scab (Ustilago maydis); cotton anthracnose (Colletotrichum gossypii), scab (Ramuraria areola), black scab (Alternaria macrospora, A. gossypii), Black root rot disease (Thielaviopsis basicola); coffee rust (Hemileia vastatrix), leaf spot disease (Cercospora coffeicola); rapeseed sclerotia sclerotia (Sclerotinia sclerotiorum), black spot (Alternaria brassicae), root rot (Phoma) lingam); sugarcane rust (Puccinia melanocephala, Puccinia kuehnii), panicle sickness (Ustilago scitaminea); sunflower rust (Puccinia helianthi), downy mildew (Plasmopara halstedii); citrus sweet spot (Diaporthe citri) Disease (Elsinoe fawcetti), fruit rot (Penicillium digitatum, P. italicum), plague (Phytophthora parasitica, Phytophthora citrophthora); Monilia disease of apples (M onilinia mali), Botrytis (Valsa ceratosperma), powdery mildew (Podosphaera leucotricha), spotted leaf rot (Alternaria alternata apple pathotype), scab (Venturia inaequalis), anthracnose (Glomerella cingulata), brown spot (Diplocarpon) , Botryosphaeria berengeriana, Phytophtora cactorum; Scab of the pear (Venturia nashicola, V. pirina), black spot (Alternaria alternata Japanese pear pathotype), scab (Gymnosporangium haraeanum); peach ash Star disease (Monilinia fructicola), scab (Cladosporium carpophilum), Phomopsis rot (Phomopsis sp.); Grape rot (Elsinoe ampelina), late rot (Glomerella cingulata), powdery mildew (Uncinula necator), rust Disease (Phakopsora ampelopsidis), blacklot disease (Guignardia bidwellii), downy mildew (Plasmoparaviticola); anthracnose of the oyster (Gloeosporium kaki), deciduous disease (Cercospora kaki, Mycosphaerella) nawae; Anthracnose (Colletotrichum lagenarium), powdery mildew (Sphaerotheca fuliginea), spine blight (Didymella bryoniae), brown spot (Corynespora cassiicola), scab (Fusarium oxysporum), downy mildew Pseudoperonospora cubensis), plague (Phytophthora sp.), Seedling blight (Pythium sp.); Tomato blight (Alternaria solani), leaf blight (Cladosporium fulvum), mildew (Pseudocercospora fuligena), blight (Phytophthora) infestans), powdery mildew (Leveillula taurica); eggplants (Phomopsis vexans), powdery mildew (Erysiphe cichoracearum); cruciferous vegetables scab (Alternaria japonica), white spot (Cercosporella brassicae), root rot Disease (Plasmodiophora brassicae), downy mildew (Peronospora parasitica); rust disease of green onion (Puccinia allii); soybean purpura (Cercospora kikuchii), black scab (Elsinoe glycines), black point disease (Diaporthe phaseolorum var. Sojae) ), Rust disease (Phakopsora pachyrhizi), brown ring disease (Corynespora cassiicola), anthracnose (Colletotrichum glycines, C. truncatum), leaf rot (Rhizoctonia solani), brown disease (Septoria glycines), spot disease (Cercospora sojina) ), Sclerotinia sclerotiorum, powdery mildew (Microsphaera diffusa), stem blight (Phytophthora sojae), downy mildew (Peronospora manshurica), sudden death (Fusarium virguliforme); sclerotium sclerotium of green beans , Rust (Uromyces appendiculatus), horny mildew (Phaeoisariopsis griseola), anthracnose (Colletotrichum lindemuthianum); blackcurrant (Cercospora personata) of peanut, Cercospora arachidicola, sclerotia silkosis (Sclerotilium rolfsii) Powdery mildew of pea (Erysiphe pisi); Potato blight (Alternaria solani), plague (Phytophthora infestans), vermilion rot (Phytophthora erythroseptica), powdery mildew (Spongospora) subterranea f. sp. subterranea), half body wilt (Verticillium albo-atrum, V. dahliae, V. nigrescens); strawberry powdery mildew (Sphaerotheca humuli); tea leaf blight (Exobasidium reticulatum), white scab (Elsinoe) leucospila, Botrytis (Pestalotiopsis sp.), Anthracnose (Colletotrichum theae-sinensis); Tobacco scab (Alternaria longipes), Anthracnose (Colletotrichum tabacum), Downy mildew (Peronospora tabacina), Phytophthora nicotianae); sugar beet (Cercospora beticola), leaf rot (Thanatephorus cucumeris), root rot (Thanatephorus cucumeris), black root rot (Aphanomyces cochlioides); Pannosa); chrysanthemum blight (Septoria chrysanthemi-indici), white rust (Puccinia horiana); onion scab (Botrytis cinerea, B. byssoidea, B. squamosa), gray rot (Botrytis alli), Microfungal rot Disease (Botrytis squamosa); Botrytis cinerea of various crops, sclerotis disease (Sclerotinia sclerotiorum); Japanese black radish (Alternaria brassicicola); Dollar spot disease of shiva (Sclerotinia homoeocarpa), brown patch disease of shiva And large patch disease (Rhizoctonia solani); and Sigatoka disease of banana (Mycosphaerella fijiensis, Mycosphaerella musicola).
Seed disease or early growth of various crops caused by Aspergillus spp., Penicillium sp., Fusarium sp., Gibberella sp., Tricoderma sp., Thieloviopsis sp., Rhizopus sp., Rhizopus sp., Mucor sp., Corcorium sp., Corticium sp. Diseases of
Virus diseases of various crops that are mediated by Polymyxa or Olpidium etc.
Seedling bacterial blight of rice (Burkholderia plantarii); spotted blight of cucumber (Pseudomonas syringae pv. Lachrymans); blight of eggplant (Ralstonia solanacearum), citrus blight of citrus (Xanthomonas citri); soft rot of Chinese cabbage (Erwinia) carotovora).
　本発明の有害生物防除組成物は、不活性担体と本発明化合物、本発明化合物Ｘ又は組成物Ａとを含有する（以下、本発明組成物と記す）。本発明組成物は、通常、本発明化合物、本発明化合物Ｘ又は組成物Ａと固体担体、液体担体、ガス状担体等の不活性担体とを混合し、必要に応じて界面活性剤、その他の製剤用補助剤を添加して、乳剤、油剤、粉剤、粒剤、水和剤、顆粒水和剤、フロアブル剤、ドライフロアブル剤、マイクロカプセル剤、エアゾール剤、毒餌剤、樹脂製剤、シャンプー剤、ペースト状製剤、泡沫剤、炭酸ガス製剤、錠剤等に製剤化されている。これらの製剤は蚊取り線香、電気蚊取りマット、液体蚊取り製剤、燻煙剤、燻蒸剤、シート製剤、スポットオン剤、経口処理剤に加工されて、使用されることもある。本発明組成物は、本発明化合物、本発明化合物Ｘ又は組成物Ａを通常０．０００１～９５重量％含有する。 The pest control composition of the present invention comprises an inert carrier and the compound of the present invention, the compound X of the present invention or the composition A (hereinafter referred to as the composition of the present invention). The composition of the present invention is generally prepared by mixing the compound of the present invention, the compound X of the present invention or the composition A with an inert carrier such as a solid carrier, a liquid carrier, a gaseous carrier, etc. Add auxiliaries for formulation, add emulsion, oil, powder, granules, wettable, water dispersible granule, flowable, dry flowable, microcapsule, aerosol, poison bait, resin formulation, shampoo, It is formulated into a paste-like preparation, a foam, a carbon dioxide preparation, a tablet and the like. These preparations may be used as processed into mosquito coil, electric mosquito mat, liquid mosquito formula, fuming agent, fumigant, sheet preparation, spot-on agent, oral treatment agent. The composition of the present invention contains usually 0.0001 to 95% by weight of the compound of the present invention, the compound of the present invention X or the composition A.
　固体担体としては、例えば粘土類（カオリンクレー、珪藻土、ベントナイト、フバサミクレー、酸性白土等）、乾式シリカ、湿式シリカ、タルク、セラミック、その他の無機鉱物（セリサイト、石英、硫黄、活性炭、炭酸カルシウム等）、化学肥料（硫安、燐安、硝安、尿素、塩安等）等の微粉末及び粒状物等、並びに合成樹脂（ポリプロピレン、ポリアクリロニトリル、ポリメタクリル酸メチル、ポリエチレンテレフタレート等のポリエステル樹脂、ナイロン－６、ナイロン－１１、ナイロン－６６等のナイロン樹脂、ポリアミド樹脂、ポリ塩化ビニル、ポリ塩化ビニリデン、塩化ビニル－プロピレン共重合体等）が挙げられる。 As a solid carrier, for example, clays (kaolin clay, diatomaceous earth, bentonite, hubash clay, acid clay etc), dry silica, wet silica, talc, ceramic, other inorganic minerals (sericite, quartz, sulfur, activated carbon, calcium carbonate etc. ), Fine powders and granules of chemical fertilizers (eg ammonium sulfate, phosphorus ammonium, ammonium nitrate, urea, salt ammonium etc.), and synthetic resins (polyesters such as polypropylene, polyacrylonitrile, polymethyl methacrylate, polyethylene terephthalate etc.), nylon 6, nylon resins such as nylon-11, nylon 66, polyamide resins, polyvinyl chloride, polyvinylidene chloride, vinyl chloride-propylene copolymers, etc.).
　液体担体としては、例えば水、アルコール類（メタノール、エタノール、イソプロピルアルコール、ブタノール、ヘキサノール、ベンジルアルコール、エチレングリコール、プロピレングリコール、フェノキシエタノール等）、ケトン類（アセトン、メチルエチルケトン、シクロヘキサノン等）、芳香族炭化水素類（トルエン、キシレン、エチルベンゼン、ドデシルベンゼン、フェニルキシリルエタン、メチルナフタレン等）、脂肪族炭化水素類（ヘキサン、シクロヘキサン、灯油、軽油等）、エステル類（酢酸エチル、酢酸ブチル、ミリスチン酸イソプロピル、オレイン酸エチル、アジピン酸ジイソプロピル、アジピン酸ジイソブチル、プロピレングリコールモノメチルエーテルアセテート等）、ニトリル類（アセトニトリル、イソブチロニトリル等）、エーテル類（ジイソプロピルエーテル、１，４－ジオキサン、１，２－ジメトキシエタン、ジエチレングリコールジメチルエーテル、ジエチレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテル、ジプロピレングリコールモノメチルエーテル、３－メトキシ－３－メチル－１－ブタノール等）、アミド類（ＤＭＦ、Ｎ，Ｎ－ジメチルアセトアミド等）、スルホキシド類（ジメチルスルホキシド等）、炭酸プロピレン及び植物油（大豆油、綿実油等）が挙げられる。 Examples of liquid carriers include water, alcohols (methanol, ethanol, isopropyl alcohol, butanol, hexanol, benzyl alcohol, ethylene glycol, propylene glycol, phenoxyethanol etc.), ketones (acetone, methyl ethyl ketone, cyclohexanone etc.), aromatic hydrocarbons (Toluene, xylene, ethylbenzene, dodecylbenzene, phenylxylylethane, methylnaphthalene etc.), aliphatic hydrocarbons (hexane, cyclohexane, kerosene, light oil etc.), esters (ethyl acetate, butyl acetate, isopropyl myristate, Ethyl oleate, diisopropyl adipate, diisobutyl adipate, propylene glycol monomethyl ether acetate, etc., nitriles (acetonitrile, isobutyric acid) Nitriles etc., Ethers (diisopropyl ether, 1,4-dioxane, 1,2-dimethoxyethane, diethylene glycol dimethyl ether, diethylene glycol monomethyl ether, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, 3-methoxy-3-methyl-1 -Butanol etc., amides (DMF, N, N-dimethyl acetamide etc.), sulfoxides (dimethyl sulfoxide etc.), propylene carbonate and vegetable oil (soybean oil, cottonseed oil etc.).
　ガス状担体としては、例えばフルオロカーボン、ブタンガス、ＬＰＧ（液化石油ガス）、ジメチルエーテル及び炭酸ガスが挙げられる。 Gaseous carriers include, for example, fluorocarbons, butane gas, LPG (liquefied petroleum gas), dimethyl ether and carbon dioxide gas.
　界面活性剤としては、例えばポリオキシエチレンアルキルエーテル、ポリオキシエチレンアルキルアリールエーテル、ポリエチレングリコール脂肪酸エステル等の非イオン界面活性剤、及びアルキルスルホン酸塩、アルキルベンゼンスルホン酸塩、アルキル硫酸塩等の陰イオン界面活性剤が挙げられる。 Examples of surfactants include nonionic surfactants such as polyoxyethylene alkyl ether, polyoxyethylene alkyl aryl ether, polyethylene glycol fatty acid ester, and anions such as alkyl sulfonate, alkyl benzene sulfonate, and alkyl sulfate. Surfactants may be mentioned.
　その他の製剤用補助剤としては、固着剤、分散剤、着色剤及び安定剤等、具体的には例えばカゼイン、ゼラチン、糖類（でんぷん、アラビアガム、セルロース誘導体、アルギン酸等）、リグニン誘導体、ベントナイト、合成水溶性高分子（ポリビニルアルコール、ポリビニルピロリドン、ポリアクリル酸類等）、酸性リン酸イソプロピル、２，６－ジ－ｔｅｒｔ－ブチル－４－メチルフェノール、ＢＨＡ（２－ｔｅｒｔ－ブチル－４－メトキシフェノールと３－ｔｅｒｔ－ブチル－４－メトキシフェノールとの混合物）が挙げられる。 As other pharmaceutical adjuvants, fixing agents, dispersing agents, coloring agents, stabilizers and the like, specifically, for example, casein, gelatin, saccharides (starch, gum arabic, cellulose derivatives, alginic acid etc.), lignin derivatives, bentonite, Synthetic water-soluble polymers (polyvinyl alcohol, polyvinyl pyrrolidone, polyacrylic acids, etc.), isopropyl acid phosphate, 2,6-di-tert-butyl-4-methylphenol, BHA (2-tert-butyl-4-methoxyphenol) And a mixture of 3-tert-butyl-4-methoxyphenol).
　樹脂製剤の基材としては、例えば塩化ビニル系重合体、ポリウレタン等を挙げることができ、これらの基材には必要によりフタル酸エステル類（フタル酸ジメチル、フタル酸ジオクチル等）、アジピン酸エステル類、ステアリン酸等の可塑剤が添加されていてもよい。樹脂製剤は該基材中に化合物を通常の混練装置を用いて混練した後、射出成型、押出成型、プレス成型等により成型することにより得られ、必要により更に成型、裁断等の工程を経て、板状、フィルム状、テープ状、網状、ひも状等の樹脂製剤に加工できる。これらの樹脂製剤は、例えば動物用首輪、動物用イヤータッグ、シート製剤、誘引ひも、園芸用支柱として加工される。
　毒餌の基材としては、例えば穀物粉、植物油、糖、結晶セルロース等が挙げられ、更に必要に応じて、ジブチルヒドロキシトルエン、ノルジヒドログアイアレチン酸等の酸化防止剤、デヒドロ酢酸等の保存料、トウガラシ末等の子供やペットによる誤食防止剤、チーズ香料、タマネギ香料、ピーナッツオイル等の害虫誘引性香料等が添加される。 Examples of the base material of the resin preparation include vinyl chloride polymers, polyurethane and the like, and phthalate esters (dimethyl phthalate, dioctyl phthalate, etc.), adipates, etc. may be used as necessary for these bases. And a plasticizer such as stearic acid may be added. The resin formulation is obtained by kneading the compound in the base using a common kneading apparatus, and then molding by injection molding, extrusion molding, press molding and the like, and if necessary, through further steps such as molding and cutting, It can be processed into resin preparations such as plate-like, film-like, tape-like, net-like and string-like. These resin preparations are processed, for example, as animal collars, animal ear tags, sheet preparations, drawstrings, horticultural posts.
Examples of substrates for poison bait include cereal flour, vegetable oil, sugar, crystalline cellulose and the like, and further, if necessary, antioxidants such as dibutyl hydroxytoluene and nordihydroguaiaretic acid, preservatives such as dehydroacetic acid and the like Also, an anti-mistake agent for children and pets such as capsicum powder, a cheese flavor, an onion flavor, a pest-inducing flavor such as peanut oil, etc. are added.
　本発明の有害生物の防除方法は、本発明化合物、本発明化合物Ｘ又は本発明組成物の有効量を有害生物に直接、及び／又は、有害生物の生息場所（植物、土壌、家屋内、動物等）に施用することにより行われる。また、種子に施用することもできる。
　本発明化合物、本発明化合物Ｘ又は本発明組成物の施用方法としては、例えば、茎葉処理、土壌処理、根部処理、シャワー処理、燻煙処理、水面処理及び種子処理が挙げられる。 The pest control method of the present invention may be carried out by directly applying an effective amount of the compound of the present invention, the compound X of the present invention or the composition of the present invention to the pests and / or the habitat of pests Etc.). It can also be applied to seeds.
Examples of the application method of the compound of the present invention, the compound X of the present invention or the composition of the present invention include stem and leaf treatment, soil treatment, root treatment, shower treatment, smoke treatment, water surface treatment and seed treatment.
　本発明において、植物としては、植物全体、茎葉、花、穂、果実、樹幹、枝、樹冠、種子、栄養生殖器官及び苗が挙げられる。 In the present invention, plants include whole plants, stems and leaves, flowers, ears, fruits, trunks, branches, crowns, seeds, vegetative organs and seedlings.
　栄養生殖器官とは、植物の根、茎、葉等のうち、その部位を本体から切り離して土壌に設置した場合に、成長する能力を持つものを意味する。栄養生殖器官としては、例えば、塊根（tuberous root）、横走根（creeping root）、鱗茎（bulb）、球茎（corm又はsolid bulb）、塊茎（tuber）、根茎（rhizome）、匍匐枝（stolon）、担根体（rhizophore）、茎断片（cane cuttings）、むかご（propagule）及びつる（vine cutting）が挙げられる。なお、匍匐枝は、ランナー（runner）と呼ばれることもあり、むかごは、珠芽とも呼ばれ、肉芽（broad bud）、鱗芽（bulbil）に分けられる。つるとは、サツマイモやヤマノイモ等の苗条（葉及び茎の総称、shoot）を意味する。鱗茎、球茎、塊茎、根茎、茎断片、担根体又は塊根を総称して、球根とも呼ばれている。イモの栽培は塊茎を土壌に植え付けることで始めるが、用いられる塊茎は一般に種芋と呼ばれる。 The vegetative organ means the plant roots, stems, leaves, etc. that have the ability to grow when the site is separated from the main body and installed in the soil. As the vegetative reproductive organs, for example, tuberous root, creeping root, bulb, corm or solid bulb, tuber, tuber, rhizome, stolon Rhizophores, cane cuttings, propagule and vine cutting. In addition, a toothpick is also called a runner (runner), and a basket is also called a sprout and is divided into a broad bud and a bulbil (bulbil). "Vine" means shoots such as sweet potato and yam (collectively referred to as leaves and stems, shoot). The bulbs, corms, tubers, rhizomes, stem fragments, rhizomes or tuberous roots are collectively referred to as bulbs. Cultivation of potato starts by planting tubers in the soil, but the tubers used are generally called seed potatoes.
　本発明化合物、本発明化合物Ｘ又は本発明組成物を農業分野の有害生物防除に用いる場合、その施用量は、１００００ｍ2あたりの本発明化合物又は本発明化合物Ｘの量で通常１～１００００ｇである。種子又は栄養生殖器官に施用する場合は、本発明化合物又は本発明化合物Ｘの施用量は、種子又は栄養生殖器官１Ｋｇに対して、通常０．００１～１００ｇである。組成物Ａの施用量は、種子又は栄養生殖器官１ｋｇあたり、通常０．００１～１００ｇである。本発明化合物、本発明化合物Ｘ又は組成物Ａが乳剤、水和剤、フロアブル剤等に製剤化されている場合は、通常、有効成分濃度が０．０１～１００００ｐｐｍとなるように水で希釈して施用し、粒剤、粉剤等は、通常、そのまま施用する。 When the compound of the present invention, the compound X of the present invention or the composition of the present invention is used for pest control in the agricultural field, the application amount thereof is usually 1 to 10000 g in the amount of the compound of the present invention or compound X of the present invention per 10000 m 2 . When applied to seeds or vegetative organs, the application rate of the compound of the present invention or compound X of the present invention is usually 0.001 to 100 g per 1 kg of seeds or vegetative organs. The application rate of composition A is usually 0.001 to 100 g per kg of seed or vegetative organ. When the compound of the present invention, compound X of the present invention or composition A is formulated into an emulsion, a wettable powder, a flowable, etc., it is usually diluted with water so that the concentration of the active ingredient is 0.01 to 10000 ppm. And granules, dusts, etc. are usually applied as such.
　これらの製剤や製剤の水希釈液は、有害生物又は有害生物から保護すべき作物等の植物に直接散布処理してもよく、また耕作地の土壌に生息する有害生物を防除するために、該土壌に処理してもよい。 The preparation or preparation may be sprayed directly on plants such as pests or crops to be protected from pests, or to control pests that inhabit the soil of cultivated land. It may be treated to the soil.
　また、シート状やひも状に加工した樹脂製剤を作物に巻き付ける、作物近傍に張り渡す、株元土壌に敷く等の方法により処理することもできる。 In addition, the resin preparation processed into a sheet or string can be treated by a method such as wrapping around a crop, spreading it in the vicinity of a crop, spreading it on stock soil, or the like.
　本発明化合物、本発明化合物Ｘ又は本発明組成物を家屋内に生息する有害生物の防除に用いる場合、その施用量は、面上に施用する場合は処理面積１ｍ2あたりの本発明化合物又は本発明化合物Ｘの量で、通常、０．０１～１０００ｍｇであり、空間に処理する場合は処理空間１ｍ3あたりの本発明化合物又は本発明化合物Ｘの量で、通常、０．０１～５００ｍｇである。本発明化合物、本発明化合物Ｘ又は組成物Ａが乳剤、水和剤、フロアブル剤等に製剤化されている場合は、通常有効成分濃度が０．１～１００００ｐｐｍとなるように水で希釈して施用し、油剤、エアゾール剤、燻煙剤、毒餌剤等はそのまま施用する。 When the compound of the present invention, the compound X of the present invention or the composition of the present invention is used for controlling pests which live in a house, the application rate thereof is the compound of the present invention per 1 m 2 of treated area in an amount of invention compound X, usually from 0.01 ~ 1000 mg, in an amount of compound of the invention or the invention compound X per processing space 1 m 3 if the process in the space usually is 0.01 ~ 500 mg . When the compound of the present invention, compound X of the present invention or composition A is formulated into an emulsion, a wettable powder, a flowable, etc., it is usually diluted with water so that the concentration of the active ingredient is 0.1 to 10000 ppm. Apply oil, aerosol, smoke, poison bait etc. as it is.
　本発明化合物、本発明化合物Ｘ又は本発明組成物をウシ、ウマ、ブタ、ヒツジ、ヤギ、ニワトリ等の家畜、イヌ、ネコ、ラット、マウス等の小動物の外部寄生虫防除に用いる場合は、獣医学的に公知の方法で動物に使用することができる。具体的な使用方法としては、全身抑制を目的にする場合には、例えば錠剤、飼料混入、坐薬、注射（筋肉内、皮下、静脈内、腹腔内等）により投与され、非全身的抑制を目的とする場合には、例えば油剤若しくは水性液剤を噴霧する、ポアオン処理若しくはスポットオン処理を行う、シャンプー製剤で動物を洗う又は樹脂製剤を首輪や耳札にして動物に付ける等の方法により用いられる。動物体に投与する場合の本発明化合物又は本発明化合物Ｘの量は、通常動物の体重１ｋｇに対して、０．１～１０００ｍｇの範囲である。 When the compound of the present invention, the compound of the present invention X or the composition of the present invention is used for ectoparasite control of small animals such as cattle, horses, pigs, sheep, goats and chickens, domestic animals such as dogs, cats, rats and mice It can be used on animals in a manner known in the art. As a specific method of use, for the purpose of systemic suppression, for example, it is administered by tablet, feed mixing, suppository, injection (intramuscular, subcutaneous, intravenous, intraperitoneal etc.) and is intended for non-systemic suppression. In this case, for example, oil or aqueous solution is sprayed, pour-on treatment or spot-on treatment is performed, the animal is washed with a shampoo preparation, or the resin preparation is used as a collar or ear tag and attached to the animal. The amount of the compound of the present invention or the compound of the present invention X when administered to an animal is usually in the range of 0.1 to 1000 mg per 1 kg of animal weight.
　また、本発明化合物、本発明化合物Ｘ又は本発明組成物は、畑、水田、芝生、果樹園等の農耕地における有害生物の防除剤として使用することができる。植物としては、例えば以下のものが挙げられる。 In addition, the compound of the present invention, the compound X of the present invention or the composition of the present invention can be used as a control agent for harmful organisms in agricultural land such as fields, paddy fields, lawns, orchards. Examples of plants include the following.
　農作物；トウモロコシ、イネ、コムギ、オオムギ、ライムギ、エンバク、ソルガム、ワタ、ダイズ、ピーナッツ、ソバ、テンサイ、ナタネ、ヒマワリ、サトウキビ、タバコ等、
　野菜；ナス科野菜（ナス、トマト、ピーマン、トウガラシ、ジャガイモ等）、ウリ科野菜（キュウリ、カボチャ、ズッキーニ、スイカ、メロン等）、アブラナ科野菜（ダイコン、カブ、セイヨウワサビ、コールラビ、ハクサイ、キャベツ、カラシナ、ブロッコリー、カリフラワー等）、キク科野菜（ゴボウ、シュンギク、アーティチョーク、レタス等）、ユリ科野菜（ネギ、タマネギ、ニンニク、アスパラガス等）、セリ科野菜（ニンジン、パセリ、セロリ、アメリカボウフウ等）、アカザ科野菜（ホウレンソウ、フダンソウ等）、シソ科野菜（シソ、ミント、バジル等）、イチゴ、サツマイモ、ヤマノイモ、サトイモ、インゲンマメ等、花卉、観葉植物等、
　果樹；仁果類（リンゴ、セイヨウナシ、ニホンナシ、カリン、マルメロ等）、核果類（モモ、スモモ、ネクタリン、ウメ、オウトウ、アンズ、プルーン等）、カンキツ類（ウンシュウミカン、オレンジ、レモン、ライム、グレープフルーツ等）、堅果類（クリ、クルミ、ハシバミ、アーモンド、ピスタチオ、カシューナッツ、マカダミアナッツ等）、液果類（ブルーベリー、クランベリー、ブラックベリー、ラズベリー等）、ブドウ、カキ、オリーブ、ビワ、バナナ、コーヒー、ナツメヤシ、ココヤシ等、
　果樹以外の樹；チャ、クワ、花木、街路樹（トネリコ、カバノキ、ハナミズキ、ユーカリ、イチョウ、ライラック、カエデ、カシ、ポプラ、ハナズオウ、フウ、プラタナス、ケヤキ、クロベ、モミノキ、ツガ、ネズ、マツ、トウヒ、イチイ等）等。 Agricultural products: corn, rice, wheat, barley, rye, oats, sorghum, cotton, soybeans, peanuts, buckwheat, sugar beet, rapeseed, sunflower, sugar cane, tobacco etc.
Vegetables; Solanaceous vegetables (eggplant, tomatoes, peppers, peppers, potatoes, etc.), Cucurbitaceae vegetables (eg, cucumbers, pumpkins, zucchini, watermelons, melons, etc.), Brassicaceae vegetables (radish, turnip, horseradish, kohlrabi, Chinese cabbage, cabbage) , Mustard, broccoli, cauliflower etc.), Asteraceae vegetables (eg burdock, shung chrysanthemum, artichoke, lettuce etc.), a liliaceous vegetables (scallion, onion, garlic, asparagus etc.), vegidaceae vegetables (carrots, parsley, celery, American buffalo) Etc.), vecoraceae vegetables (spinach, swiss chard etc.), sorghums vegetables (sesame, mint, basil etc.), strawberries, sweet potatoes, yams, taros, beans, etc., florets, houseplants etc.
Fruits; Fruits (apples, pears, Japanese pears, cullins, quince etc.), Core fruits (momo, plums, nectarines, jujubes, apricots, prunes etc.), citrus fruits (palms, oranges, lemons, limes, grapefruits) Etc), nuts (nuts, walnuts, hazelnuts, almonds, pistachios, cashews, macadamias etc), berries (blueberries, cranberries, blackberries, raspberries etc), grapes, oysters, olives, loquats, bananas, coffee, etc. Date palm, coconut palm, etc.
Trees other than fruit trees; tea, mulberry, flowering trees, street trees (astera, birch, dogwood, eucalyptus, eucalyptus, ginkgo, lilac, maple, oak, poplar, persimmon, perennial, fusarium, plananas, persimmon, perianthus, birch, fir tree, tsuga, nezu, pine Spruce, yew etc. etc.
　上記植物は、自然交配で作出しうる植物、突然変異により発生しうる植物、F1ハイブリッド植物、及び遺伝子組換え作物も含まれる。遺伝子組換え作物としては、例えばイソキサフルトール等のHPPD（４－ヒドロキシフェニルピルビン酸ジオキシゲナーゼ酵素）阻害剤、イマゼタピル、チフェンスルフロンメチル等のALS（アセト乳酸合成酵素）阻害剤、EPSP（５－エノールピルビルシキミ酸－３－リン酸合成酵素）阻害剤、グルタミン合成酵素阻害剤、PPO（プロトポルフィリノーゲン酸化酵素）阻害剤、ブロモキシニル、又はジカンバ等の除草剤に対する耐性が付与された植物；バチルス・チューリンゲンシス（Bacillus thuringiensis）などのバチルス属で知られている選択的毒素等を合成することが可能となった植物；有害昆虫由来の内在性遺伝子に部分的に一致する遺伝子断片等を合成し、標的有害昆虫体内でジーンサイレンシング（RNAi；RNA interference）を誘導することにより特異的な殺虫活性を付与することができる植物が挙げられる。 The above-mentioned plants also include plants which can be produced by natural mating, plants which can be generated by mutation, F1 hybrid plants and genetically modified crops. Examples of genetically modified crops include HPPD (4-hydroxyphenylpyruvate dioxygenase enzyme) inhibitors such as isoxaflutole, ALS (acetolactate synthetase) inhibitors such as imazethapyr and thifensulfuron methyl, EPSP (5 -Plants with resistance to herbicides such as -enolpyruvyl shikimate-3-phosphate synthetase inhibitor, glutamine synthetase inhibitor, PPO (protoporphyrinogen oxidase) inhibitor, bromoxynil, or dicamba A plant capable of synthesizing selective toxins and the like known in Bacillus genera such as Bacillus thuringiensis; gene fragments and the like partially corresponding to endogenous genes derived from harmful insects; Synthesized and specifically induced by inducing gene silencing (RNAi; RNA interference) in the target harmful insect body. Included are plants capable of conferring different insecticidal activities.
　上記植物は、一般的に栽培される品種であれば特に限定はない。 The above-mentioned plant is not particularly limited as long as it is a commonly grown variety.
　以下、本発明を製造例、製剤例及び試験例等によりさらに詳しく説明するが、本発明はこれらの例のみに限定されるものではない。 Hereinafter, the present invention will be described in more detail by production examples, formulation examples, test examples and the like, but the present invention is not limited to these examples.
　本明細書中、Meはメチル基を表し、Etはエチル基を表し、Prはプロピル基を表し、iPrはイソプロピル基を表し、cPrはシクロプロピル基を表し、Phはフェニル基を表し、Pyはピリジン－２－イル基を表し、Pyrは１－ピラゾリル基を表す。例えば、CH2OPhはフェノキシメチル基を表し、CH=CH(CH2)2Phは４－フェニル－１－ブテニル基を表し、CH2N(CH2CF3)CH2Phは［ベンジル（２，２，２－トリフルオロエチル）アミノ］メチル基を表す。また、Ph、Py及びPyrが置換基を有する場合は、置換基を記号の前に置換位置とともに記す。例えば、(CH2)2{2,4-(CF3)2-Ph}は２－［２，４－ビス（トリフルオロメチル）フェニル］エチル基を表し、3-Cl-5-CF3-Pyは３－クロロ－５－（トリフルオロメチル）ピリジン－２－イル基を表す。 In the present specification, Me represents a methyl group, Et represents an ethyl group, Pr represents a propyl group, iPr represents an isopropyl group, cPr represents a cyclopropyl group, Ph represents a phenyl group, and Py represents It represents a pyridin-2-yl group, and Pyr represents a 1-pyrazolyl group. For example, CH 2 OPh represents a phenoxymethyl group, CH = CH (CH 2 ) 2 Ph represents a 4-phenyl-1-butenyl group, and CH 2 N (CH 2 CF 3 ) CH 2 Ph represents [benzyl (2) Represents a 2,2,2-trifluoroethyl) amino] methyl group. In addition, when Ph, Py and Pyr each have a substituent, the substituent is indicated before the symbol together with the substitution position. For example, (CH 2 ) 2 {2,4- (CF 3 ) 2 -Ph} represents a 2- [2,4-bis (trifluoromethyl) phenyl] ethyl group, 3-Cl-5-CF 3 — Py represents a 3-chloro-5- (trifluoromethyl) pyridin-2-yl group.
参考製造例１
　４－ヒドロキシ－２，５，６－トリメチルニコチン酸エチル３１．４ｇ、炭酸カリウム３１．１ｇ及びアセトニトリル３００ｍＬの混合物に、ベンジルブロミド２６．７ｍＬを加え、還流下４時間撹拌した。得られた混合物に水を加え、ＭＴＢＥで抽出した。得られた有機層を硫酸マグネシウムで乾燥し、減圧下で濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、下式で示される中間体１を３５．３ｇ得た。
Figure JPOXMLDOC01-appb-C000027
 　中間体１：1H-NMR (CDCl3) δ: 7.45-7.29 (5H, m), 4.95 (2H, s), 4.34 (2H, q), 2.50 (3h, s), 2.49 (3H, s), 2.16 (3H, s), 1.31 (3H, t). Reference Production Example 1
26.7 mL of benzyl bromide was added to a mixture of 31.4 g of ethyl 4-hydroxy-2,5,6-trimethylnicotinate, 31.1 g of potassium carbonate and 300 mL of acetonitrile, and the mixture was stirred under reflux for 4 hours. To the resulting mixture was added water and extracted with MTBE. The resulting organic layer was dried over magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 35.3 g of Intermediate 1 represented by the following formula.
Figure JPOXMLDOC01-appb-C000027
 Intermediate 1: 1 H-NMR (CDCl 3 ) δ: 7.45-7.29 (5H, m), 4.95 (2H, s), 4.34 (2H, q), 2.50 (3h, s), 2.49 (3H, s) , 2.16 (3H, s), 1.31 (3H, t).
参考製造例２
　水素化アルミニウムリチウム８．９５ｇ及びＴＨＦ２００ｍＬの混合物に、窒素雰囲気下、氷冷下で３５．３ｇの中間体１及びＴＨＦ１００ｍＬの混合物を３０分間かけて加えた。得られた混合物を室温にし、１時間撹拌した。得られた混合物に、氷冷下で水９．０ｍＬ、１５％水酸化ナトリウム水溶液９．０ｍＬ及び水２６．９ｍＬを順次加え、室温で２時間撹拌した。得られた混合物をセライト（登録商標）でろ過し、ろ液を減圧下で濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、下式で示される中間体２を３０．３ｇ得た。
Figure JPOXMLDOC01-appb-C000028
 　中間体２：1H-NMR (CDCl3) δ: 7.47-7.35 (5H, m), 4.92 (2H, s), 4.65 (2H, s), 2.56 (3h, s), 2.48 (3H, s), 2.22 (3H, s). Reference Production Example 2
To a mixture of 8.95 g of lithium aluminum hydride and 200 mL of THF was added a mixture of 35.3 g of Intermediate 1 and 100 mL of THF under ice-cooling under nitrogen atmosphere over 30 minutes. The resulting mixture was allowed to reach room temperature and stirred for 1 hour. To the resulting mixture, 9.0 mL of water, 9.0 mL of a 15% aqueous solution of sodium hydroxide and 26.9 mL of water were sequentially added under ice cooling, and the mixture was stirred at room temperature for 2 hours. The resulting mixture was filtered through Celite®, and the filtrate was concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 30.3 g of Intermediate 2 represented by the following formula.
Figure JPOXMLDOC01-appb-C000028
 Intermediate 2: 1 H-NMR (CDCl 3 ) δ: 7.47-7.35 (5H, m), 4.92 (2H, s), 4.65 (2H, s), 2.56 (3h, s), 2.48 (3H, s) , 2.22 (3H, s).
参考製造例３
　３０．３ｇの中間体２及びクロロホルム３００ｍＬの混合物に、氷冷下で塩化チオニル１２．８ｍＬを加え、室温で１時間撹拌した。得られた混合物に、飽和炭酸水素ナトリウム水溶液を加え、クロロホルムで抽出した。得られた有機層を硫酸マグネシウムで乾燥し、減圧下で濃縮し、下式で示される中間体３を３２．５ｇ得た。
Figure JPOXMLDOC01-appb-C000029
 　中間体３：1H-NMR (CDCl3) δ: 7.53-7.36 (5H, m), 4.97 (2H, s), 4.68 (2H, s), 2.60 (3H, s), 2.49 (3H, s), 2.21 (3H, s). Reference Production Example 3
To a mixture of 30.3 g of Intermediate 2 and 300 mL of chloroform was added 12.8 mL of thionyl chloride under ice-cooling and stirred at room temperature for 1 hour. To the resulting mixture was added saturated aqueous sodium hydrogen carbonate solution, and the mixture was extracted with chloroform. The obtained organic layer was dried over magnesium sulfate and concentrated under reduced pressure to obtain 32.5 g of Intermediate 3 represented by the following formula.
Figure JPOXMLDOC01-appb-C000029
 Intermediate 3: 1 H-NMR (CDCl 3 ) δ: 7.53-7.36 (5H, m), 4.97 (2H, s), 4.68 (2H, s), 2.60 (3H, s), 2.49 (3H, s) , 2.21 (3H, s).
参考製造例４
　水素化アルミニウムリチウム４．９２ｇ及びＴＨＦ１５０ｍＬの混合物に、窒素雰囲気下、氷冷下で３２．５ｇの中間体３及びＴＨＦ５０ｍＬの混合物を３０分間かけて加えた。得られた混合物を室温にし、１時間撹拌した。得られた混合物に、氷冷下で水４．９ｍＬ、１５％水酸化ナトリウム水溶液４．９ｍＬ及び水１４．８ｍＬを順次加え、室温で２時間撹拌した。得られた混合物をセライト（登録商標）でろ過し、ろ液を減圧下で濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、下式で示される中間体４を２５．０ｇ得た。
Figure JPOXMLDOC01-appb-C000030
 　中間体４：1H-NMR (CDCl3) δ: 7.49-7.34 (5H, m), 4.78 (2H, s), 2.45 (6H, s), 2.17 (6H, s). Reference Production Example 4
To a mixture of lithium aluminum hydride 4.92 g and THF 150 mL was added a mixture of 32.5 g of Intermediate 3 and 50 mL of THF under ice-cooling under nitrogen atmosphere over 30 minutes. The resulting mixture was allowed to reach room temperature and stirred for 1 hour. To the resulting mixture, 4.9 mL of water, 4.9 mL of a 15% aqueous solution of sodium hydroxide and 14.8 mL of water were sequentially added under ice-cooling, and the mixture was stirred at room temperature for 2 hours. The resulting mixture was filtered through Celite®, and the filtrate was concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 25.0 g of Intermediate 4 represented by the following formula.
Figure JPOXMLDOC01-appb-C000030
 Intermediate 4: 1 H-NMR (CDCl 3 ) δ: 7.49-7.34 (5H, m), 4.78 (2H, s), 2.45 (6H, s), 2.17 (6H, s).
参考製造例５
　中間体３に代えて４－（アリルオキシ）－３－（クロロメチル）－２，５，６－トリメチルピリジンを用い、参考製造例４に記載の方法に準じて、下式で示される中間体５を得た。
Figure JPOXMLDOC01-appb-C000031
 　中間体５：1H-NMR (CDCl3) δ: 6.15-6.03 (1H, m), 5.42 (1H, d), 5.28 (1H, d), 4.27 (2H, d), 2.44 (6H, s), 2.16 (6H, s). Reference Production Example 5
Intermediate 5 represented by the following formula is used according to the method described in Reference Production Example 4 using 4- (allyloxy) -3- (chloromethyl) -2,5,6-trimethylpyridine in place of intermediate 3: I got
Figure JPOXMLDOC01-appb-C000031
 Intermediate 5: 1 H-NMR (CDCl 3 ) δ: 6.15-6.03 (1 H, m), 5.42 (1 H, d), 5. 28 ( 1 H, d), 4. 27 (2 H, d), 2. 44 (6 H, s) , 2.16 (6H, s).
参考製造例６
　１．３５ｇの中間体４及びクロロホルム３０ｍＬの混合物に、氷冷下で７０％ｍＣＰＢＡ（３０％水含有）１．６８ｇを加え、２時間撹拌した。得られた混合物に、飽和炭酸水素ナトリウム水溶液及び飽和チオ硫酸ナトリウム水溶液を順次加え、クロロホルムで抽出した。得られた有機層を硫酸マグネシウムで乾燥し、減圧下で濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、下式で示される中間体６を１．２９ｇ得た。
Figure JPOXMLDOC01-appb-C000032
 　中間体６：1H-NMR (CDCl3) δ: 7.44-7.35 (5H, m), 4.78 (2H, s), 2.53 (6H, s), 2.21 (6H, s). Reference Production Example 6
To a mixture of 1.35 g of Intermediate 4 and 30 mL of chloroform was added 1.68 g of 70% mCPBA (containing 30% water) under ice-cooling and stirred for 2 hours. To the obtained mixture, saturated aqueous sodium hydrogen carbonate solution and saturated aqueous sodium thiosulfate solution were sequentially added, and the mixture was extracted with chloroform. The resulting organic layer was dried over magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 1.29 g of Intermediate 6 represented by the following formula.
Figure JPOXMLDOC01-appb-C000032
 Intermediate 6: 1 H-NMR (CDCl 3 ) δ: 7.44-7.35 (5H, m), 4.78 (2H, s), 2.53 (6H, s), 2.21 (6H, s).
参考製造例７
　中間体４に代えて中間体５を用い、参考製造例６に記載の方法に準じて、下式で示される中間体７を得た。
Figure JPOXMLDOC01-appb-C000033
 　中間体７：1H-NMR (CDCl3) δ: 6.12-6.01 (1H, m), 5.42 (1H, d), 5.30 (1H, d), 4.27 (2H, d), 2.52 (6H, s), 2.23 (6H, s). Reference Production Example 7
In the same manner as in Reference Production Example 6 except for using Intermediate 5 in place of Intermediate 4, Intermediate 7 of the following formula was obtained.
Figure JPOXMLDOC01-appb-C000033
 Intermediate 7: 1 H-NMR (CDCl 3 ) δ: 6.12-6.01 (1H, m), 5.42 (1H, d), 5.30 (1H, d), 4.27 (2H, d), 2.52 (6H, s) , 2.23 (6H, s).
参考製造例８
　１．２９ｇの中間体６及びクロロホルム２０ｍＬの混合物に、氷冷下でトリフルオロ酢酸無水物２．７７ｍＬを加え、室温で１２時間撹拌した。得られた混合物を減圧下で濃縮した。得られた残渣にメタノール２０ｍＬ及び炭酸カリウム１．３９ｇを順次加え、室温で１０分間撹拌した。得られた混合物を減圧下で濃縮した。得られた残渣に水を加え、酢酸エチルで抽出した。得られた有機層を硫酸マグネシウムで乾燥し、減圧下で濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、下式で示される中間体８を１．１３ｇ得た。
Figure JPOXMLDOC01-appb-C000034
 　中間体８：1H-NMR (CDCl3) δ: 7.46-7.35 (5H, m), 5.05 (1H, s), 4.81 (2H, s), 4.59 (2H, s), 2.49 (3H, s), 2.20 (3H, s), 2.06 (3H, s). Reference Production Example 8
To a mixture of 1.29 g of Intermediate 6 and 20 mL of chloroform was added 2.77 mL of trifluoroacetic anhydride under ice-cooling and stirred at room temperature for 12 hours. The resulting mixture was concentrated under reduced pressure. To the obtained residue were sequentially added 20 mL of methanol and 1.39 g of potassium carbonate, and the mixture was stirred at room temperature for 10 minutes. The resulting mixture was concentrated under reduced pressure. Water was added to the obtained residue, and extracted with ethyl acetate. The resulting organic layer was dried over magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 1.13 g of Intermediate 8 represented by the following formula.
Figure JPOXMLDOC01-appb-C000034
 Intermediate 8: 1 H-NMR (CDCl 3 ) δ: 7.46-7.35 (5H, m), 5.05 (1H, s), 4.81 (2H, s), 4.59 (2H, s), 2.49 (3H, s) , 2.20 (3H, s), 2.06 (3H, s).
参考製造例９
　中間体６に代えて中間体７を用い、参考製造例８に記載の方法に準じて、下式に示される中間体９を得た。
Figure JPOXMLDOC01-appb-C000035
 　中間体９：1H-NMR (CDCl3) δ: 6.08 (1H, m), 5.42 (1H, d), 5.29 (1H, d), 5.04 (1H, m), 4.58 (2H, s), 4.30 (2H, td), 2.48 (3H, s), 2.19 (3H, s), 2.07 (3H, s). Reference Production Example 9
In the same manner as in Reference Production Example 8 except for using Intermediate 7 in place of Intermediate 6, Intermediate 9 represented by the following formula was obtained.
Figure JPOXMLDOC01-appb-C000035
 Intermediate 9: 1 H-NMR (CDCl 3 ) δ: 6.08 (1 H, m), 5.42 (1 H, d), 5. 29 (1 H, d), 5.04 (1 H, m), 4.58 (2 H, s), 4.30 (2H, td), 2.48 (3H, s), 2.19 (3H, s), 2.07 (3H, s).
参考製造例１０
　１０．８ｇの中間体８及びクロロホルム２００ｍＬの混合物に、酸化マンガン（ＩＶ）４５．５ｇを加え、還流下２時間撹拌した。得られた混合物をセライト（登録商標）でろ過し、ろ液を減圧下で濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、下式で示される中間体１０を７．３０ｇ得た。
Figure JPOXMLDOC01-appb-C000036
 　中間体１０：1H-NMR (CDCl3) δ: 10.13 (1H, s), 7.47-7.35 (5H, m), 4.82 (2H, s), 2.57 (3H, s), 2.55 (3H, s), 2.26 (3H, s). Reference Production Example 10
45.5 g of manganese (IV) oxide was added to a mixture of 10.8 g of Intermediate 8 and 200 mL of chloroform, and the mixture was stirred under reflux for 2 hours. The resulting mixture was filtered through Celite®, and the filtrate was concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 7.30 g of Intermediate 10 represented by the following formula.
Figure JPOXMLDOC01-appb-C000036
 Intermediate 10: 1 H-NMR (CDCl 3 ) δ: 10.13 (1H, s), 7.47-7.35 (5H, m), 4.82 (2H, s), 2.57 (3H, s), 2.55 (3H, s) , 2.26 (3H, s).
参考製造例１１
　中間体８に代えて中間体９を用い、参考製造例１０に記載の方法に準じて、下式に示される中間体１１を得た。
Figure JPOXMLDOC01-appb-C000037
 　中間体１１：1H-NMR (CDCl3) δ: 10.12 (1H, s), 6.08 (1H, m), 5.43 (1H, d), 5.31 (1H, d), 4.32 (2H, d), 2.56 (3H, s), 2.54 (3H, s), 2.28 (3H, s). Reference Production Example 11
In the same manner as in Reference Production Example 10 except for using Intermediate 9 in place of Intermediate 8, Intermediate 11 represented by the following formula was obtained.
Figure JPOXMLDOC01-appb-C000037
 Intermediate 11: 1 H-NMR (CDCl 3 ) δ: 10.12 (1 H, s), 6.08 (1 H, m), 5.43 (1 H, d), 5.31 (1 H, d), 4.32 (2 H, d), 2.56 (3H, s), 2.54 (3H, s), 2.28 (3H, s).
参考製造例１２
　１０．８ｇの中間体１０及びトルエン３０ｍＬの混合物に、（トリフェニルホスホラニリデン）酢酸エチル３．４５ｇを加え、室温で７１時間撹拌した。得られた混合物を減圧下で濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、下式で示される中間体１２を２．４６ｇ得た。
Figure JPOXMLDOC01-appb-C000038
 　中間体１２：1H-NMR (CDCl3) δ: 7.91 (1H, d), 7.46-7.34 (5H, m), 7.03 (1H, d), 4.79 (2H, s), 4.27 (2H, q), 2.49 (3H, s), 2.32 (3H, s), 2.21 (3H, s), 1.33 (3H, t). Reference Production Example 12
To a mixture of 10.8 g of Intermediate 10 and 30 mL of toluene, 3.45 g of ethyl (triphenylphosphoranylidene) acetate was added and stirred at room temperature for 71 hours. The resulting mixture was concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 2.46 g of Intermediate 12 represented by the following formula.
Figure JPOXMLDOC01-appb-C000038
 Intermediate 12: 1 H-NMR (CDCl 3 ) δ: 7.91 (1H, d), 7.46-7.34 (5H, m), 7.03 (1H, d), 4.79 (2H, s), 4.27 (2H, q) , 2.49 (3H, s), 2.32 (3H, s), 2.21 (3H, s), 1.33 (3H, t).
参考製造例１３
　２．４６ｇの中間体１２及びトルエン３０ｍＬの混合物に、－７８℃で水素化ジイソブチルアルミニウム（１Ｍトルエン溶液）１６．６ｍＬを滴下し、２０分間撹拌した。得られた混合物に、飽和酒石酸ナトリウムカリウム水溶液を加え、室温で１時間撹拌した。得られた混合物を酢酸エチルで抽出した。得られた有機層を硫酸マグネシウムで乾燥し、減圧下で濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、下式で示される中間体１３を１．９５ｇ得た。
Figure JPOXMLDOC01-appb-C000039
 　中間体１３：1H-NMR (CDCl3) δ: 7.49-7.32 (5H, m), 6.98-6.80 (2H, m), 4.78 (2H, s), 4.40 (2H, d), 2.48 (3H, s), 2.24 (3H, s), 2.18 (3H, s). Reference Production Example 13
To a mixture of 2.46 g of Intermediate 12 and 30 mL of toluene, 16.6 mL of diisobutylaluminum hydride (1 M solution in toluene) was dropped at -78 ° C, and stirred for 20 minutes. To the resulting mixture was added saturated aqueous sodium potassium tartrate solution and stirred at room temperature for 1 hour. The resulting mixture was extracted with ethyl acetate. The resulting organic layer was dried over magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 1.95 g of Intermediate 13 represented by the following formula.
Figure JPOXMLDOC01-appb-C000039
 Intermediate 13: 1 H-NMR (CDCl 3 ) δ: 7.49-7.32 (5H, m), 6.98-6.80 (2H, m), 4.78 (2H, s), 4.40 (2H, d), 2.48 (3H, 3) s), 2.24 (3H, s), 2.18 (3H, s).
参考製造例１４
　１．２９ｇの中間体１３、四臭化炭素２．２６ｇ及びクロロホルム２０ｍＬの混合物に、トリフェニルホスフィン１．７９ｇを加え、室温で２０分間撹拌した。得られた混合物を減圧下で濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、下式で示される中間体１４を０．９９ｇ得た。
Figure JPOXMLDOC01-appb-C000040
 　中間体１４：1H-NMR (CDCl3) δ: 7.47-7.33 (5H, m), 7.02 (1H, dt), 6.81 (1H, d), 4.77 (2H, s), 4.20 (2H, d), 2.47 (3H, s), 2.25 (3H, s), 2.18 (3H, s). Reference Production Example 14
1.79 g of triphenylphosphine was added to a mixture of 1.29 g of Intermediate 13, 2.26 g of carbon tetrabromide and 20 mL of chloroform, and the mixture was stirred at room temperature for 20 minutes. The resulting mixture was concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 0.99 g of Intermediate 14 represented by the following formula.
Figure JPOXMLDOC01-appb-C000040
 Intermediate 14: 1 H-NMR (CDCl 3 ) δ: 7.47-7.33 (5H, m), 7.02 (1H, dt), 6.81 (1H, d), 4.77 (2H, s), 4.20 (2H, d) , 2.47 (3H, s), 2.25 (3H, s), 2.18 (3H, s).
参考製造例１５
　中間体２に代えて中間体９を用い、参考製造例３に記載の方法に準じて、下式で示される中間体１５を得た。
Figure JPOXMLDOC01-appb-C000041
 　中間体１５：1H-NMR (CDCl3) δ: 6.08 (1H, m), 5.43 (1H, d), 5.31 (1H, d), 4.66 (2H, s), 4.30 (2H, d), 2.46 (3H, s), 2.32 (3H, s), 2.19 (3H, s). Reference Production Example 15
In the same manner as in Reference Production Example 3 except for using Intermediate 9 in place of Intermediate 2, Intermediate 15 of the following formula was obtained.
Figure JPOXMLDOC01-appb-C000041
 Intermediate 15: 1 H-NMR (CDCl 3 ) δ: 6.08 (1H, m), 5.43 (1H, d), 5.31 (1H, d), 4.66 (2H, s), 4.30 (2H, d), 2.46 (3H, s), 2.32 (3H, s), 2.19 (3H, s).
参考製造例１６
　中間体１３に代えて中間体８を用い、参考製造例１４に記載の方法に準じて、下式で示される中間体１６を得た。
Figure JPOXMLDOC01-appb-C000042
 　中間体１６：1H-NMR (CDCl3) δ: 7.46-7.35 (5H, m), 4.81 (2H, s), 4.56 (2H, s), 2.47 (3H, s), 2.29 (3H, s), 2.19 (3H, s). Reference Production Example 16
Using intermediate 8 instead of intermediate 13, and according to the method described in Reference Production Example 14, Intermediate 16 represented by the following formula was obtained.
Figure JPOXMLDOC01-appb-C000042
 Intermediate 16: 1 H-NMR (CDCl 3 ) δ: 7.46-7.35 (5H, m), 4.81 (2H, s), 4.56 (2H, s), 2.47 (3H, s), 2.29 (3H, s) , 2.19 (3H, s).
参考製造例１７
　３．５１ｇの中間体１０及びＴＨＦ７０ｍＬの混合物に、－７８℃でメチルリチウム（１．１２Ｍジエチルエーテル溶液）１８．３ｍＬを加え、２時間撹拌した。得られた混合物に水を加え、酢酸エチルで抽出した。得られた有機層を硫酸ナトリウムで乾燥し、減圧下で濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、下式で示される中間体１７を３．４５ｇ得た。
Figure JPOXMLDOC01-appb-C000043
 　中間体１７：1H-NMR (CDCl3) δ: 7.45-7.35 (5H, m), 5.27 (1H, br s), 4.88 (1H, dd), 4.80 (2H, dd), 2.48 (3H, s), 2.20 (3H, s), 2.13 (3H, s), 1.36 (3H, d). Reference Production Example 17
To a mixture of 3.51 g of Intermediate 10 and 70 mL of THF was added 18.3 mL of methyllithium (1.12 M solution in diethyl ether) at -78.degree. C. and stirred for 2 hours. To the resulting mixture was added water and extracted with ethyl acetate. The resulting organic layer was dried over sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 3.45 g of Intermediate 17 represented by the following formula.
Figure JPOXMLDOC01-appb-C000043
 Intermediate 17: 1 H-NMR (CDCl 3 ) δ: 7.45-7.35 (5H, m), 5.27 (1H, br s), 4.88 (1H, dd), 4.80 (2H, dd), 2.48 (3H, s) ), 2.20 (3H, s), 2.13 (3H, s), 1.36 (3H, d).
参考製造例１８
　３．４４ｇの中間体１７及びクロロホルム６０ｍＬの混合物に、酸化マンガン（ＩＶ）１６．６ｇを加え、還流下で１時間撹拌した。得られた混合物をセライト（登録商標）でろ過し、ろ液を減圧下で濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、下式で示される中間体１８を３．１５ｇ得た。
Figure JPOXMLDOC01-appb-C000044
 　中間体１８：1H-NMR (CDCl3) δ: 7.47-7.35 (5H, m), 4.79 (2H, s), 2.69 (3H, s), 2.51 (3H, s), 2.46 (3H, s), 1.23 (3H, s). Reference Production Example 18
To a mixture of 3.44 g of Intermediate 17 and 60 mL of chloroform, 16.6 g of manganese (IV) oxide was added, and stirred under reflux for 1 hour. The resulting mixture was filtered through Celite®, and the filtrate was concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 3.15 g of Intermediate 18 represented by the following formula.
Figure JPOXMLDOC01-appb-C000044
 Intermediate 18: 1 H-NMR (CDCl 3 ) δ: 7.47-7.35 (5H, m), 4.79 (2H, s), 2.69 (3H, s), 2.51 (3H, s), 2.46 (3H, s) , 1.23 (3H, s).
参考製造例１９
　０．５０ｇの中間体１１及びエタノール１０ｍＬの混合物に、炭酸水素ナトリウム０．３１ｇ及びヒドロキシルアミン塩酸塩０．２５ｇを加え、還流下で１時間撹拌した。得られた混合物に水を加え、酢酸エチルで抽出した。得られた有機層を硫酸マグネシウムで乾燥し、減圧下で濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、下式で示される中間体１９を０．３３ｇ得た。
Figure JPOXMLDOC01-appb-C000045
 　中間体１９：1H-NMR (CDCl3) δ: 8.41 (1H s), 8.08 (1H, br s), 6.08 (1H, m), 5.43 (1H, d), 5.30 (1H, d), 4.30 (2H, d), 2.51 (3H, s), 2.34 (3H, s), 2.22 (3H, s). Reference Production Example 19
To a mixture of 0.50 g of Intermediate 11 and 10 mL of ethanol, 0.31 g of sodium hydrogen carbonate and 0.25 g of hydroxylamine hydrochloride were added, and stirred under reflux for 1 hour. To the resulting mixture was added water and extracted with ethyl acetate. The resulting organic layer was dried over magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 0.33 g of Intermediate 19 represented by the following formula.
Figure JPOXMLDOC01-appb-C000045
 Intermediate 19: 1 H-NMR (CDCl 3 ) δ: 8.41 (1 H s), 8.08 (1 H, br s), 6.08 (1 H, m), 5.43 (1 H, d), 5.30 (1 H, d), 4.30 (2H, d), 2.51 (3H, s), 2.34 (3H, s), 2.22 (3H, s).
製造例１
　２，４－ビス（トリフルオロメチル）ベンジルトリフェニルホスホニウムブロミド１．０６ｇ及びＴＨＦ２０ｍＬの混合物に、カリウムｔ－ブトキシド０．２１ｇを加え、室温で１０分間撹拌した。この混合物に０．３２ｇの中間体１０を加え、さらに１時間撹拌した。得られた混合物に水を加え、ＭＴＢＥで抽出した。得られた有機層を硫酸マグネシウムで乾燥し、減圧下で濃縮した。得られた残渣をシリカゲルクロマトグラフィー（ヘキサン：酢酸エチル＝９０：１０）に付し、下式で示される本発明化合物１を０．０８ｇ及び下式で示される本発明化合物２を０．５０ｇ得た。 Production Example 1
0.21 g of potassium t-butoxide was added to a mixture of 1.06 g of 2,4-bis (trifluoromethyl) benzyltriphenylphosphonium bromide and 20 mL of THF, and the mixture was stirred at room temperature for 10 minutes. To this mixture was added 0.32 g of intermediate 10 and stirred for another hour. To the resulting mixture was added water and extracted with MTBE. The resulting organic layer was dried over magnesium sulfate and concentrated under reduced pressure. The obtained residue is subjected to silica gel chromatography (hexane: ethyl acetate = 90: 10) to obtain 0.08 g of the present compound 1 represented by the following formula and 0.50 g of the present compound 2 represented by the following formula The
Figure JPOXMLDOC01-appb-C000046
 　本発明化合物１：1H-NMR (CDCl3) δ: 7.88 (1H, s), 7.47 (1H, d), 7.44-7.31 (5H, m), 7.24 (1H, d), 7.03 (1H, d), 6.94 (1H, d), 4.66 (2H, s), 2.33 (3H, s), 2.16 (3H, s), 1.90 (3H, s).
Figure JPOXMLDOC01-appb-C000046
 The present compound 1: 1 H-NMR (CDCl 3 ) δ: 7.88 (1 H, s), 7. 47 (1 H, d), 7.44-7. 31 (5 H, m), 7.24 (1 H, d), 7.03 (1 H, d ), 6.94 (1H, d), 4.66 (2H, s), 2.33 (3H, s), 2.16 (3H, s), 1.90 (3H, s).
Figure JPOXMLDOC01-appb-C000047
 　本発明化合物２：1H-NMR (CDCl3) δ: 8.08 (1H, d), 7.91 (2H, d), 7.79 (1H, d), 7.48-7.37 (5H, m), 7.34 (1H, d), 4.81 (2H, s), 2.54 (3H, s), 2.33 (3H, s), 2.23 (3H, s).
Figure JPOXMLDOC01-appb-C000047
 The present compound 2: 1 H-NMR (CDCl 3 ) δ: 8.08 ( 1 H, d), 7. 91 (2 H, d), 7. 79 (1 H, d), 7. 48-7. 37 (5 H, m), 7.34 (1 H, d ), 4.81 (2H, s), 2.54 (3H, s), 2.33 (3H, s), 2.23 (3H, s).
製造例２
　製造例１に記載の方法に準じて製造した化合物及びその物性値を以下に示す。
式（Ａ－１）
Figure JPOXMLDOC01-appb-C000048
 で示される化合物において、Ｒ1xが［表１］に記載のいずれかの化合物。 Production Example 2
The compounds produced according to the method described in Production Example 1 and the physical properties thereof are shown below.
Formula (A-1)
Figure JPOXMLDOC01-appb-C000048
 In the compounds represented by the above, R 1x is any compound described in [Table 1].
Figure JPOXMLDOC01-appb-T000049
　本発明化合物３：1H-NMR (CDCl3) δ: 7.49-7.12 (10H, m), 6.81 (1H, dt), 6.59 (1H, d), 4.76 (2H, s), 2.69-2.60 (2H, m), 2.47 (3H, s), 2.35-2.25 (2H, m), 2.22 (3H, s), 2.16 (3H, s), 1.76-1.41 (4H, m).
　本発明化合物４：1H-NMR (CDCl3) δ: 7.48-7.26 (6H, m), 7.19-7.04 (4H, m), 6.75 (1H, d), 6.66 (1H, d), 4.70 (2H, s), 2.47 (3H, s), 2.19 (3H, s), 1.94 (3H, s).
Figure JPOXMLDOC01-appb-T000049
The present compound 3: 1 H-NMR (CDCl 3 ) δ: 7.49-7.12 ( 10 H, m), 6.81 (1 H, dt), 6.59 (1 H, d), 4. 76 (2 H, s), 2.69-2 .60 (2 H) , m), 2.47 (3H, s), 2.35-2. 25 (2H, m), 2.22 (3H, s), 2.16 (3H, s), 1. 76-1.41 (4H, m).
The present compound 4: 1 H-NMR (CDCl 3 ) δ: 7.48-7.26 (6H, m), 7.19-7.04 (4H, m), 6.75 (1H, d), 6.66 (1H, d), 4.70 (2H) , s), 2.47 (3H, s), 2.19 (3H, s), 1.94 (3H, s).
製造例３
　Ｎ－｛２－［４－（トリフルオロメトキシ）フェニル］エトキシ｝フタルイミド１．２８ｇ及びエタノール２０ｍＬの混合物に、メチルヒドラジン０．１７ｇを加え、還流下２０分間撹拌した。得られた混合物を室温にし、０．４７ｇの中間体１０を加え、さらに還流下１時間撹拌した。得られた混合物にＭＴＢＥを加え、固体をろ過した。ろ液を水及び飽和食塩水で順次洗浄し、硫酸マグネシウムで乾燥し、減圧下で濃縮した。得られた残渣をシリカゲルクロマトグラフィー（ヘキサン：酢酸エチル＝８０：２０）に付し、下式で示される本発明化合物５を０．７３ｇ得た。
Figure JPOXMLDOC01-appb-C000050
 　本発明化合物５：1H-NMR (CDCl3) δ: 8.34 (1H, s), 7.47-7.35 (5H, m), 7.30-7.24 (2H, m), 7.17-7.12 (2H, m), 4.81 (2H, s), 4.14 (2H, t), 3.06 (2H, t), 2.51 (3H, s), 2.37 (3H, s), 2.21 (3H, s). Production Example 3
To a mixture of 1.28 g of N- {2- [4- (trifluoromethoxy) phenyl] ethoxy} phthalimide and 20 mL of ethanol, 0.17 g of methylhydrazine was added, and the mixture was stirred for 20 minutes under reflux. The resulting mixture was allowed to come to room temperature, 0.47 g of intermediate 10 was added and stirred further under reflux for 1 hour. To the resulting mixture was added MTBE and the solid filtered. The filtrate was washed successively with water and saturated brine, dried over magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography (hexane: ethyl acetate = 80: 20) to obtain 0.73 g of the present compound 5 represented by the following formula.
Figure JPOXMLDOC01-appb-C000050
 The present compound 5: 1 H-NMR (CDCl 3 ) δ: 8.34 (1H, s), 7.47-7.35 (5H, m), 7.30-7.24 (2H, m), 7.17-7.12 (2H, m), 4.81 (2H, s), 4.14 (2H, t), 3.06 (2H, t), 2.51 (3H, s), 2.37 (3H, s), 2.21 (3H, s).
製造例４
　製造例３に記載の方法に準じて製造した化合物及びその物性値を以下に示す。
式（Ａ－２）
Figure JPOXMLDOC01-appb-C000051
 で示される化合物において、Ｒ1x及びＲ２xが［表２］に記載のいずれかの組み合わせである化合物。 Production Example 4
The compounds produced according to the method described in Production Example 3 and the physical properties thereof are shown below.
Formula (A-2)
Figure JPOXMLDOC01-appb-C000051
 In the compound shown by these, compounds in which R 1x and R 2x are any combination described in [Table 2].
Figure JPOXMLDOC01-appb-T000052
　本発明化合物６：1H-NMR (CDCl3) δ: 8.34 (1H, s), 7.59-7.52 (2H, m), 7.48-7.32 (7H, m), 4.81 (2H, s), 4.47 (2H, t), 3.11 (2H, t), 2.51 (3H, s), 2.36 (3H, s), 2.21 (3H, s).
　本発明化合物２５：1H-NMR (CDCl3) δ: 8.35 (0.5H, s), 8.32 (0.5H, s), 6.91 (0.5H, s), 6.90 (0.5H, s), 6.13-6.04 (1H, m), 5.43 (1H, m), 5.29 (1H, m), 4.54-1.38 (2H, m), 4.30 (2H, m), 2.48 (3H, m), 2.38 (1.5H, s), 2.36 (1.5H, s), 2.09 (1.5H, s), 2.09 (1.5H, s), 1.39 (1.5H, d), 1.34 (1.5H, d), 1.27 (1.5H, d), 1.25 (1.5H, d).
　本発明化合物２６：1H-NMR (CDCl3) δ: 8.33 (1H, s), 8.30 (1H, m), 7.82 (1H, m), 6.08 (1H, m), 5.43 (1H, m), 5.29 (1H, m), 4.66-4.64 (2H, m), 4.58 (1H, m), 4.29 (2H, m), 2.48 (3H, s), 2.37 (3H, s), 2.21 (3H, s), 1.86 (2H, m), 1.07 (3H, t).
　本発明化合物２７：1H-NMR (CDCl3) δ: 8.40 (1H, s), 7.44 (2H, d), 7.22 (2H, d), 6.13-6.02 (1H, m), 5.42 (1H, d), 5.31 (2H, s), 5.30 (1H, d), 4.28 (2H, d), 2.49 (3H, s), 2.31 (3H, s), 2.21 (3H, s).
　本発明化合物２８：1H-NMR (CDCl3) δ: 8.36 (1H, s), 7.44-7.34 (7H, m), 7.18 (2H, d), 5.16 (1H, dd), 4.76 (2H, s), 2.47 (3H, s), 2.25 (3H, s), 2.18 (3H, s), 2.05 (1H, m), 1.85 (1H, m), 0.96 (3H, t).
　本発明化合物２９：1H-NMR (CDCl3) δ: 8.29 (0.5H, s), 8.28 (0.5H, s), 7.46-7.35 (8H, m), 4.85 (0.5H, m), 4.81 (1H, s), 4.80 (1H, s), 4.78 (0.5H, m), 4.63 (0.5H, m), 4.53 (0.5H, m), 2.50 (1.5H, s), 2.49 (1.5H, s), 2.40 (1.5H, s), 2.33 (1.5H, s), 2.21 (1.5H, s), 2.21 (1.5H, s), 1.42 (1.5H, d), 1.38 (1.5H, d), 1.37 (1.5H, d), 1.36 (1.5H, d).
　本発明化合物３０：1H-NMR (CDCl3) δ: 8.38 (1H, s), 7.62 (2H, d), 7.52 (2H, d), 6.14-6.02 (1H, m), 5.43 (1H, d), 5.29 (2H, s), 5.26 (1H, d), 4.29 (2H, d), 2.49 (3H, s), 2.31 (3H, s), 2.20 (3H, s).
　本発明化合物３１：1H-NMR (CDCl3) δ: 8.42 (1H, s), 7.64 (2H, d), 7.46 (2H, d), 6.12-6.02 (1H, m), 5.42 (1H, d), 5.29 (2H, s), 5.29 (1H, d), 4.28 (2H, d), 2.49 (3H, s), 2.30 (3H, s), 2.21 (3H, s).
　本発明化合物１６０：1H-NMR (CDCl3) δ: 7.61 (2H, d), 7.50 (2H, d), 7.49-7.35 (5H, m), 5.26 (2H, s), 4.78 (2H, s), 2.47 (3H, s), 2.31 (3H, s), 2.19 (3H, s), 2.18 (3H, s).
　本発明化合物１６１：1H-NMR (CDCl3) δ: 7.55 (2H, d), 7.48-7.37 (5H, m), 7.37 (2H, d), 4.82 (2H, s), 4.39 (2H, dd), 3.09 (2H, dd), 2.48 (3H, s), 2.30 (3H, s), 2.22 (3H, s), 2.20 (3H, s).
　本発明化合物１６２：1H-NMR (CDCl3) δ: 7.46-7.35 (7H, m), 7.20 (2H, d), 5.20 (2H, s), 4.78 (2H, s), 2.47 (3H, s), 2.29 (3H, s), 2.19 (3H, s), 2.17 (3H, s).
Figure JPOXMLDOC01-appb-T000052
The present compound 6: 1 H-NMR (CDCl 3 ) δ: 8.34 (1H, s), 7.59-7.52 (2H, m), 7.48-7. 32 (7H, m), 4.81 (2H, s), 4.47 (2H) , t), 3.11 (2H, t), 2.51 (3H, s), 2.36 (3H, s), 2.21 (3H, s).
The present compound 25: 1 H-NMR (CDCl 3 ) δ: 8.35 (0.5 H, s), 8.32 (0.5 H, s), 6.91 (0.5 H, s), 6.90 (0.5 H, s), 6.13-6.04 (1H, m), 5.43 (1 H, m), 5. 29 (1 H, m), 4.54-1.38 (2 H, m), 4. 30 (2 H, m), 2. 48 (3 H, m), 2. 38 (1.5 H, s) , 2.36 (1.5 H, s), 2.09 (1.5 H, s), 2.09 (1.5 H, s), 1. 39 (1.5 H, d), 1. 34 (1.5 H, d), 1. 27 (1.5 H, d), 1.25 (1.5 H, d).
The present compound 26: 1 H-NMR (CDCl 3 ) δ: 8.33 (1 H, s), 8.30 (1 H, m), 7.82 (1 H, m), 6.08 (1 H, m), 5.43 (1 H, m), 5.29 (1H, m), 4.66-4.64 (2H, m), 4.58 (1H, m), 4.29 (2H, m), 2.48 (3H, s), 2.37 (3H, s), 2.21 (3H, s) , 1.86 (2H, m), 1.07 (3H, t).
The present compound 27: 1 H-NMR (CDCl 3 ) δ: 8.40 (1 H, s), 7.44 (2 H, d), 7.22 (2 H, d), 6.13 to 6.02 (1 H, m), 5.42 (1 H, d ), 5.31 (2H, s), 5.30 (1H, d), 4.28 (2H, d), 2.49 (3H, s), 2.31 (3H, s), 2.21 (3H, s).
The present compound 28: 1 H-NMR (CDCl 3 ) δ: 8.36 (1 H, s), 7.44-7. 34 (7 H, m), 7. 18 (2 H, d), 5. 16 (1 H, dd), 4. 76 (2 H, s) ), 2.47 (3H, s), 2.25 (3H, s), 2.18 (3H, s), 2.05 (1H, m), 1.85 (1H, m), 0.96 (3H, t).
The present compound 29: 1 H-NMR (CDCl 3 ) δ: 8.29 (0.5 H, s), 8.28 (0.5 H, s), 7.46-7.35 (8 H, m), 4. 85 (0.5 H, m), 4.81 1H, s), 4.80 (1H, s), 4.78 (0.5 H, m), 4.63 (0.5 H, m), 4.53 (0.5 H, m), 2.50 (1.5 H, s), 2.49 (1.5 H, s) ), 2.40 (1.5 H, s), 2. 33 (1.5 H, s), 2.21 (1.5 H, s), 2.21 (1.5 H, s), 1.42 (1.5 H, d), 1. 38 (1.5 H, d), 1.37 (1.5 H, d), 1. 36 (1.5 H, d).
The present compound 30: 1 H-NMR (CDCl 3 ) δ: 8.38 (1 H, s), 7.62 (2 H, d), 7.52 (2 H, d), 6.14-6.02 (1 H, m), 5.43 (1 H, d ), 5.29 (2H, s), 5.26 (1H, d), 4.29 (2H, d), 2.49 (3H, s), 2.31 (3H, s), 2.20 (3H, s).
The present compound 31: 1 H-NMR (CDCl 3 ) δ: 8.42 (1H, s), 7.64 (2H, d), 7.46 (2H, d), 6.12-6.02 (1H, m), 5.42 (1H, d) ), 5.29 (2H, s), 5.29 (1H, d), 4.28 (2H, d), 2.49 (3H, s), 2.30 (3H, s), 2.21 (3H, s).
The present compound 160: 1 H-NMR (CDCl 3 ) δ: 7.61 (2H, d), 7.50 (2H, d), 7.49-7.35 (5H, m), 5.26 (2H, s), 4.78 (2H, s) ), 2.47 (3H, s), 2.31 (3H, s), 2.19 (3H, s), 2.18 (3H, s).
Invention compound 161: 1 H-NMR (CDCl 3 ) δ: 7.55 (2H, d), 7.48-7.37 (5H, m), 7.37 (2H, d), 4.82 (2H, s), 4.39 (2H, dd) ), 3.09 (2H, dd), 2.48 (3H, s), 2.30 (3H, s), 2.22 (3H, s), 2.20 (3H, s).
Invention compound 162: 1 H-NMR (CDCl 3 ) δ: 7.46-7.35 (7H, m), 7.20 (2H, d), 5.20 (2H, s), 4.78 (2H, s), 2.47 (3H, s) ), 2.29 (3H, s), 2.19 (3H, s), 2.17 (3H, s).
製造例５
　２，４－ビス（トリフルオロメチル）ベンジルアルコール２．０ｇ及びＤＭＦ２０ｍＬの混合物に、窒素雰囲気下、６０％水素化ナトリウム（油性）０．３３ｇを加え、室温で１０分間撹拌した。得られた混合物に、０．９９ｇの中間体１４を加え、室温で１時間撹拌した。得られた混合物に水を加え、ＭＴＢＥで抽出した。得られた有機層を硫酸マグネシウムで乾燥し、減圧下で濃縮した。得られた残渣をシリカゲルクロマトグラフィー（ヘキサン：酢酸エチル＝９０：１０）に付し、下式で示される本発明化合物７を１．３２ｇ得た。
Figure JPOXMLDOC01-appb-C000053
 　本発明化合物７：1H-NMR (CDCl3) δ: 8.00-7.80 (3H, m), 7.48-7.35 (5H, m), 6.93-6.89 (2H, m), 4.84 (2H, s), 4.79 (2H, s), 4.35 (2H, m), 2.49 (3H, s), 2.25 (3H, s), 2.19 (3H, s). Production Example 5
Under a nitrogen atmosphere, 0.33 g of 60% sodium hydride (oil) was added to a mixture of 2.0 g of 2,4-bis (trifluoromethyl) benzyl alcohol and 20 mL of DMF, and the mixture was stirred at room temperature for 10 minutes. To the resulting mixture, 0.99 g of Intermediate 14 was added and stirred at room temperature for 1 hour. To the resulting mixture was added water and extracted with MTBE. The resulting organic layer was dried over magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography (hexane: ethyl acetate = 90: 10) to obtain 1.32 g of the present compound 7 represented by the following formula.
Figure JPOXMLDOC01-appb-C000053
 Invention compound 7: 1 H-NMR (CDCl 3 ) δ: 8.00-7.80 (3H, m), 7.48-7.35 (5H, m), 6.93-6.89 (2H, m), 4.84 (2H, s), 4.79 (2H, s), 4.35 (2H, m), 2.49 (3H, s), 2.25 (3H, s), 2.19 (3H, s).
製造例６
　１．３４ｇの中間体１６、ジメトキシエタン２０ｍＬ、水４ｍＬ、４－シアノフェニルボロン酸０．９２ｇ及び炭酸カリウム０．８７ｇの混合物に、窒素雰囲気下でテトラキス（トリフェニルホスフィン）パラジウム（０）０．１２ｇを加え、還流下で３時間撹拌した。得られた混合物に水を加え、酢酸エチルで抽出した。得られた有機層を硫酸ナトリウムで乾燥し、減圧下で濃縮した。得られた残渣をシリカゲルクロマトグラフィー（ヘキサン：酢酸エチル＝７０：３０）に付し、下式で示される本発明化合物３２を０．４８ｇ得た。
Figure JPOXMLDOC01-appb-C000054
 　本発明化合物３２：1H-NMR (CDCl3) δ: 7.55-7.52 (2H, m), 7.43-7.32 (5H, m), 7.26 (2H, m), 4.78 (2H, s), 4.18 (2H, s), 2.49 (3H, s), 2.21 (3H, s), 2.06 (3H, s). Production Example 6
A mixture of 1.34 g of Intermediate 16, 20 mL of dimethoxyethane, 4 mL of water, 0.92 g of 4-cyanophenylboronic acid and 0.87 g of potassium carbonate under a nitrogen atmosphere was added to tetrakis (triphenylphosphine) palladium (0) O. 12 g was added and stirred for 3 hours under reflux. To the resulting mixture was added water and extracted with ethyl acetate. The resulting organic layer was dried over sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography (hexane: ethyl acetate = 70: 30) to obtain 0.48 g of the present compound 32 represented by the following formula.
Figure JPOXMLDOC01-appb-C000054
 The present compound 32: 1 H-NMR (CDCl 3 ) δ: 7.55 to 7.52 (2H, m), 7.43-7.32 (5H, m), 7.26 (2H, m), 4.78 (2H, s), 4.18 (2H) , s), 2.49 (3H, s), 2.21 (3H, s), 2.06 (3H, s).
製造例７
　０．４８ｇの本発明化合物３２、エタノール１０ｍＬ及び水１ｍＬの混合物に、炭酸ナトリウム０．４５ｇ及びヒドロキシルアミン塩酸塩０．２０ｇを加え、還流下で１時間撹拌した。得られた混合物に水を加え、酢酸エチルで抽出した。得られた有機層を硫酸マグネシウムで乾燥し、減圧下で濃縮した。得られた残差にＤＭＦ１４ｍＬ、ピリジン０．６７ｍＬ及びペンタフルオロプロピオン酸無水物０．８２ｍＬを加え、１００℃で２時間撹拌した。得られた混合物に飽和食塩水を加え、酢酸エチル及びＴＨＦで抽出した。得られた有機層を硫酸ナトリウムで乾燥し、減圧下で濃縮した。得られた残渣をシリカゲルクロマトグラフィー（クロロホルム：メタノール＝９０：１０）に付し、下式で示される本発明化合物６１を０．３９ｇ得た。
Figure JPOXMLDOC01-appb-C000055
 　本発明化合物６１：1H-NMR (CDCl3) δ: 8.05 (2H, d), 7.31 (2H, d), 4.16 (2H, s), 2.36 (3H, s), 2.10 (3H, s), 2.08 (3H, s). Production Example 7
To a mixture of 0.48 g of the compound of the present invention 32, 10 mL of ethanol and 1 mL of water, 0.45 g of sodium carbonate and 0.20 g of hydroxylamine hydrochloride were added, and stirred under reflux for 1 hour. To the resulting mixture was added water and extracted with ethyl acetate. The resulting organic layer was dried over magnesium sulfate and concentrated under reduced pressure. To the obtained residue, 14 mL of DMF, 0.67 mL of pyridine and 0.82 mL of pentafluoropropionic anhydride were added, and the mixture was stirred at 100 ° C. for 2 hours. To the resulting mixture was added brine, and extracted with ethyl acetate and THF. The resulting organic layer was dried over sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography (chloroform: methanol = 90: 10) to obtain 0.39 g of the present compound 61 represented by the following formula.
Figure JPOXMLDOC01-appb-C000055
 The present compound 61: 1 H-NMR (CDCl 3 ) δ: 8.05 (2H, d), 7.31 (2H, d), 4.16 (2H, s), 2.36 (3H, s), 2.10 (3H, s), 2.08 (3H, s).
製造例８
　製造例６に記載の方法に準じて製造した化合物及びその物性値を以下に示す。
式（Ａ－３）
Figure JPOXMLDOC01-appb-C000056
 で示される化合物において、Ｒ1xが［表３］に記載のいずれかの化合物。 Production Example 8
The compounds produced according to the method described in Production Example 6 and the physical properties thereof are shown below.
Formula (A-3)
Figure JPOXMLDOC01-appb-C000056
 In the compounds represented by the above, R 1x is any compound described in [Table 3].
Figure JPOXMLDOC01-appb-T000057
　本発明化合物３４：1H-NMR (CDCl3) δ: 7.54 (2H, d), 7.45-7.33 (5H, m), 7.17 (2H, d), 7.00 (2H, d), 6.93 (2H, d), 4.79 (2H, s), 4.15 (2H, s), 2.50 (3H, s), 2.21 (3H, s), 2.11 (3H, s).
　本発明化合物３５：1H-NMR (CDCl3) δ: 7.44-7.33 (5H, m), 7.15-7.13 (4H, m), 6.97-6.94 (2H, m), 6.91-6.88 (2H, m), 4.78 (2H, s), 4.13 (2H, s), 2.50 (3H, s), 2.20 (3H, s), 2.11 (3H, s).
　本発明化合物３６：1H-NMR (CDCl3) δ: 8.44 (1H, s), 7.87 (1H, dd), 7.45-7.33 (5H, m), 7.23 (2H, d), 7.03 (2H, d), 6.96 (1H, d), 4.78 (2H, s), 4.16 (2H, s), 2.50 (3H, s), 2.20 (3H, s), 2.14 (3H, s).
　本発明化合物３７：1H-NMR (CDCl3) δ: 7.42-7.34 (5H, m), 7.30 (2H, t), 7.11 (2H, d), 7.06 (1H, t), 6.96 (2H, d), 6.88 (2H, d), 4.77 (2H, s), 4.11 (2H, s), 2.49 (3H, s), 2.19 (3H, s), 2.10 (3H, s).
　本発明化合物３８：1H-NMR (CDCl3) δ: 7.75-7.65 (4H, m), 7.54-7.33 (9H, m), 4.78 (2H, s), 4.20 (2H, s), 2.51 (3H, s), 2.21 (3H, s), 2.13 (3H, s).
　本発明化合物３９：1H-NMR (CDCl3) δ: 7.44-7.36 (6H, m), 7.31-7.29 (1H, m), 7.21-7.20 (1H, m), 7.17-7.14 (2H, m), 7.12-7.10 (1H, m), 6.93-6.90 (2H, m), 4.78 (2H, s), 4.14 (2H, s), 2.50 (3H, s), 2.21 (3H, s), 2.11 (3H, s).
　本発明化合物４０：1H-NMR (CDCl3) δ: 7.52 (2H, d), 7.45-7.31 (5H, m), 7.27 (2H, d), 7.10 (2H, d), 7.04 (2H, d), 4.76 (2H, s), 4.15 (2H, s), 3.97 (2H, s), 2.48 (3H, s), 2.19 (3H, s), 2.09 (3H, s).
　本発明化合物１５０：1H-NMR (CDCl3) δ: 7.64 (1H, d), 7.43-7.35 (6H, m), 7.16-7.10 (3H, m), 6.94-6.91 (2H, m), 6.87 (1H, d), 4.78 (2H, s), 4.13 (2H, s), 2.50 (3H, s), 2.20 (3H, s), 2.10 (3H, s).
Figure JPOXMLDOC01-appb-T000057
The present compound 34: 1 H-NMR (CDCl 3 ) δ: 7.54 (2H, d), 7.45-7.33 (5H, m), 7.17 (2H, d), 7.00 (2H, d), 6.93 (2H, d) ), 4.79 (2H, s), 4.15 (2H, s), 2.50 (3H, s), 2.21 (3H, s), 2.11 (3H, s).
The present compound 35: 1 H-NMR (CDCl 3 ) δ: 7.44-7.33 (5H, m), 7.15-7.13 (4H, m), 6.97-6.94 (2H, m), 6.91-6.88 (2H, m) , 4.78 (2H, s), 4.13 (2H, s), 2.50 (3H, s), 2.20 (3H, s), 2.11 (3H, s).
The present compound 36: 1 H-NMR (CDCl 3 ) δ: 8.44 (1H, s), 7.87 (1H, dd), 7.45-7.33 (5H, m), 7.23 (2H, d), 7.03 (2H, d) ), 6.96 (1H, d), 4.78 (2H, s), 4.16 (2H, s), 2.50 (3H, s), 2.20 (3H, s), 2.14 (3H, s).
The present compound 37: 1 H-NMR (CDCl 3 ) δ: 7.42-7.34 (5H, m), 7.30 (2H, t), 7.11 (2H, d), 7.06 (1H, t), 6.96 (2H, d) ), 6.88 (2H, d), 4.77 (2H, s), 4.11 (2H, s), 2.49 (3H, s), 2.19 (3H, s), 2.10 (3H, s).
The present compound 38: 1 H-NMR (CDCl 3 ) δ: 7.75-7.65 (4H, m), 7.54-7.33 (9H, m), 4.78 (2H, s), 4.20 (2H, s), 2.51 (3H) , s), 2.21 (3H, s), 2.13 (3H, s).
Invention compound 39: 1 H-NMR (CDCl 3 ) δ: 7.44-7.36 (6H, m), 7.31-7.29 (1H, m), 7.21-7. 20 (1H, m), 7.17-7.14 (2H, m) , 7.12-7.10 (1H, m), 6.93-6.90 (2H, m), 4.78 (2H, s), 4.14 (2H, s), 2.50 (3H, s), 2.21 (3H, s), 2.11 (3H) , s).
The present compound 40: 1 H-NMR (CDCl 3 ) δ: 7.52 (2H, d), 7.45-7.31 (5H, m), 7.27 (2H, d), 7.10 (2H, d), 7.04 (2H, d) ), 4.76 (2H, s), 4.15 (2H, s), 3.97 (2H, s), 2.48 (3H, s), 2.19 (3H, s), 2.09 (3H, s).
The present compound 150: 1 H-NMR (CDCl 3 ) δ: 7.64 (1H, d), 7.43-7.35 (6H, m), 7.16-7.10 (3H, m), 6.94-6.91 (2H, m), 6.87 (1H, d), 4.78 (2H, s), 4.13 (2H, s), 2.50 (3H, s), 2.20 (3H, s), 2.10 (3H, s).
製造例９
　０．５０ｇの本発明化合物３５及びＴＨＦ６ｍＬの混合物に、窒素雰囲気下、－７８℃でリチウムジイソプロピルアミド（１．０８Ｍヘキサン－ＴＨＦ溶液）２．８１ｍＬを加え、１０分間撹拌した。得られた混合物にヨウ化メチル０．１９ｍＬを加え、室温で１時間撹拌した。得られた混合物に水を加え、ＭＴＢＥで抽出した。得られた有機層を硫酸マグネシウムで乾燥し、減圧下で濃縮した。得られた残渣をシリカゲルクロマトグラフィー（ヘキサン：酢酸エチル＝９０：１０）に付し、次式で示される本発明化合物４１を０．３６ｇ得た。
Figure JPOXMLDOC01-appb-C000058
 　本発明化合物４１：1H-NMR (CDCl3) δ: 7.45-7.31 (5H, m), 7.24 (2H, d), 7.25 (2H, d), 6.96 (2H, d), 6.89 (2H, d), 4.74 (2H, q), 4.32 (1H, q), 2.51 (3H, s), 2.19 (3H, s), 2.10 (3H, s), 1.66 (3H, d). Production Example 9
To a mixture of 0.50 g of the compound of the present invention 35 and 6 mL of THF was added 2.81 mL of lithium diisopropylamide (1.08 M hexane-THF solution) at −78 ° C. under a nitrogen atmosphere, and stirred for 10 minutes. 0.19 mL of methyl iodide was added to the obtained mixture, and it stirred at room temperature for 1 hour. To the resulting mixture was added water and extracted with MTBE. The resulting organic layer was dried over magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography (hexane: ethyl acetate = 90: 10) to obtain 0.36 g of the present compound 41 represented by the following formula.
Figure JPOXMLDOC01-appb-C000058
 The present compound 41: 1 H-NMR (CDCl 3 ) δ: 7.45-7.31 (5H, m), 7.24 (2H, d), 7.25 (2H, d), 6.96 (2H, d), 6.89 (2H, d) ), 4.74 (2H, q), 4.32 (1H, q), 2.51 (3H, s), 2.19 (3H, s), 2.10 (3H, s), 1.66 (3H, d).
製造例１０
　２－［（４－トリフルオロメチル）フェノキシ］－５－ブロモチアゾール１．０６ｇ及びＴＨＦ１０ｍＬの混合物に、窒素雰囲気下、－２０℃でイソプロピルマグネシウムクロリドリチウムクロリド錯体（１．３Ｍ　ＴＨＦ溶液）２．５２ｍＬを加え、１０分間撹拌した。得られた混合物に、０．４２ｇの中間体１０を加え、室温で１時間撹拌した。得られた混合物に水を加え、ＭＴＢＥで抽出した。得られた有機層を硫酸マグネシウムで乾燥し、減圧下で濃縮した。得られた残渣をシリカゲルクロマトグラフィー（ヘキサン：酢酸エチル＝８０：２０）に付し、下式で示される本発明化合物４２を０．７９ｇ得た。
Figure JPOXMLDOC01-appb-C000059
 　本発明化合物４２：1H-NMR (CDCl3) δ: 7.65 (2H, d), 7.45-7.32 (7H, m), 7.00 (1H, s), 6.08 (1H, s), 5.84 (1H, s), 4.80 (2H, s), 2.52 (3H, s), 2.22 (3H, s), 2.07 (3H, s). Production Example 10
To a mixture of 1.06 g of 2-[(4-trifluoromethyl) phenoxy] -5-bromothiazole and 10 mL of THF at -20 ° C. under nitrogen atmosphere 2.52 mL of isopropylmagnesium chloride lithium chloride complex (1.3 M solution in THF) Was added and stirred for 10 minutes. To the resulting mixture was added 0.42 g of Intermediate 10 and stirred at room temperature for 1 hour. To the resulting mixture was added water and extracted with MTBE. The resulting organic layer was dried over magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography (hexane: ethyl acetate = 80: 20) to obtain 0.79 g of the present compound 42 represented by the following formula.
Figure JPOXMLDOC01-appb-C000059
 The present compound 42: 1 H-NMR (CDCl 3 ) δ: 7.65 (2H, d), 7. 45-7. 32 (7 H, m), 7.00 (1 H, s), 6. 08 (1 H, s), 5. 84 (1 H, s) ), 4.80 (2H, s), 2.52 (3H, s), 2.22 (3H, s), 2.07 (3H, s).
製造例１１
　トランス－４－［４－（トリフルオロメトキシ）フェニル］シクロヘキシルアルコール０．７６ｇ及びＤＭＦ１０ｍＬの混合物に、窒素雰囲気下、６０％水素化ナトリウム（油性）０．１４ｇを加え、室温で１０分間撹拌した。得られた混合物に、０．６６ｇの中間体１５を加え、室温で２０時間撹拌した。得られた混合物に水を加え、ＭＴＢＥで抽出した。得られた有機層を硫酸マグネシウムで乾燥し、減圧下で濃縮した。得られた残渣をシリカゲルクロマトグラフィー（ヘキサン：酢酸エチル＝８０：２０）に付し、下式で示される本発明化合物８を０．６８ｇ得た。
Figure JPOXMLDOC01-appb-C000060
 　本発明化合物８：1H-NMR (CDCl3) δ: 7.23-7.17 (2H, m), 7.15-7.09 (2H, m), 6.15-6.04 (1H, m), 5.44 (1H, m), 5.29 (1H, m), 4.65 (2H, s), 4.30 (2H, m), 3.44 (1H, m), 2.57-2.48 (1H, m), 2.46 (3H, s), 2.30 (3H, s), 2.27-2.20 (2H, m), 2.18 (3H, s), 1.98-1.85 (2H, m), 1.54-1.37 (4H, m). Production Example 11
Under a nitrogen atmosphere, 0.14 g of 60% sodium hydride (oil) was added to a mixture of 0.76 g of trans-4- [4- (trifluoromethoxy) phenyl] cyclohexyl alcohol and 10 mL of DMF, and the mixture was stirred at room temperature for 10 minutes. To the resulting mixture, 0.66 g of Intermediate 15 was added and stirred at room temperature for 20 hours. To the resulting mixture was added water and extracted with MTBE. The resulting organic layer was dried over magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography (hexane: ethyl acetate = 80: 20) to obtain 0.68 g of the present compound 8 represented by the following formula.
Figure JPOXMLDOC01-appb-C000060
 The present compound 8: 1 H-NMR (CDCl 3 ) δ: 7.23-7.17 (2H, m), 7.15-7.09 (2H, m), 6.15-6.04 (1H, m), 5.44 (1H, m), 5.29 (1H, m), 4.65 (2H, s), 4.30 (2H, m), 3.44 (1H, m), 2.57-2.48 (1H, m), 2.46 (3H, s), 2.30 (3H, s), 2.27-2.20 (2H, m), 2.18 (3H, s), 1.98-1.85 (2H, m), 1.54-1.37 (4H, m).
製造例１２
　製造例１１に記載の方法に準じて製造した化合物及びその物性値を以下に示す。
式（Ａ－４）
Figure JPOXMLDOC01-appb-C000061
 で示される化合物において、Ｒ1xが［表４］に記載のいずれかの化合物。 Production Example 12
The compounds produced according to the method described in Production Example 11 and the physical properties thereof are shown below.
Formula (A-4)
Figure JPOXMLDOC01-appb-C000061
 In the compounds represented by the above, R 1x is any of compounds described in [Table 4].
Figure JPOXMLDOC01-appb-T000062
　本発明化合物３３：1H-NMR (CDCl3) δ: 7.41-7.40 (1H, m), 6.33-6.33 (2H, m), 6.13-6.03 (1H, m), 5.45-5.39 (1H, m), 5.29-5.26 (1H, m), 4.61 (2H, s), 4.52 (2H, s), 4.28 (2H, dt), 2.46 (3H, s), 2.21 (3H, s), 2.18 (3H, s).
　本発明化合物４３：1H-NMR (CDCl3) δ: 6.14-6.04 (1H, m), 5.46-5.40 (1H, m), 5.30-5.27 (1H, m), 4.68-4.60 (2H, m), 4.29 (2H, dt), 4.09-4.03 (1H, m), 3.89-3.84 (1H, m), 3.78-3.72 (1H, m), 3.53-3.45 (2H, m), 2.45 (3H, s), 2.29 (3H, s), 2.18 (3H, s), 1.98-1.80 (3H, m), 1.65-1.56 (1H, m).
　本発明化合物４４：1H-NMR (CDCl3) δ: 7.75 (1H, d), 7.32 (1H, d), 6.13-6.03 (1H, m), 5.45-5.40 (1H, m), 5.30-5.27 (1H, m), 4.88 (2H, s), 4.75 (2H, s), 4.29 (2H, dt), 2.47 (3H, s), 2.28 (3H, s), 2.19 (3H, s).
　本発明化合物４５：1H-NMR (CDCl3) δ: 7.29-7.28 (1H, m), 6.95-6.94 (1H, m), 6.13-6.04 (1H, m), 5.46-5.40 (1H, m), 5.31-5.27 (1H, m), 4.73 (2H, s), 4.66 (2H, s), 4.29 (2H, dt), 2.46 (3H, s), 2.26 (3H, s), 2.19 (3H, s).
Figure JPOXMLDOC01-appb-T000062
The present compound 33: 1 H-NMR (CDCl 3 ) δ: 7.41-7.40 (1H, m), 6.33-6.33 (2H, m), 6.13-6.03 (1H, m), 5.45-5. 39 (1H, m) , 5.29-5.26 (1H, m), 4.61 (2H, s), 4.52 (2H, s), 4.28 (2H, dt), 2.46 (3H, s), 2.21 (3H, s), 2.18 (3H, s) ).
Invention compound 43: 1 H-NMR (CDCl 3 ) δ: 6.14-6.04 (1H, m), 5.46-5.40 (1H, m), 5.30-5.27 (1H, m), 4.68-4.60 (2H, m) , 4.29 (2H, dt), 4.09-4.03 (1H, m), 3.89-3.84 (1H, m), 3.78-3.72 (1H, m), 3.53-3.45 (2H, m), 2.45 (3H, s) , 2.29 (3H, s), 2.18 (3H, s), 1.98-1.80 (3H, m), 1.65-1.56 (1 H, m).
Invention compound 44: 1 H-NMR (CDCl 3 ) δ: 7.75 (1H, d), 7.32 (1H, d), 6.13-6.03 (1H, m), 5.45-5.40 (1H, m), 5.30-5.27 (1H, m), 4.88 (2H, s), 4.75 (2H, s), 4.29 (2H, dt), 2.47 (3H, s), 2.28 (3H, s), 2.19 (3H, s).
Invention compound 45: 1 H-NMR (CDCl 3 ) δ: 7.29-7.28 (1H, m), 6.95-6.94 (1H, m), 6.13-6.04 (1H, m), 5.46-5.40 (1H, m) , 5.31-5.27 (1H, m), 4.73 (2H, s), 4.66 (2H, s), 4.29 (2H, dt), 2.46 (3H, s), 2.26 (3H, s), 2.19 (3H, s) ).
製造例１３
　０．６０ｇの中間体１５、アセトニトリル１１ｍＬ及び炭酸カリウム０．７４ｇの混合物に、４－ブロモフェノール０．９２ｇを加え、還流下で５時間撹拌した。得られた混合物に水を加え、酢酸エチルで抽出した。得られた有機層を硫酸ナトリウムで乾燥し、減圧下で濃縮した。得られた残渣をシリカゲルクロマトグラフィー（ヘキサン：酢酸エチル＝８０：２０）に付し、次式で示される本発明化合物４６を１．２ｇ得た。
Figure JPOXMLDOC01-appb-C000063
 　本発明化合物４６：1H-NMR (CDCl3) δ: 7.30 (2H, d), 6.87 (2H, d), 6.13-6.03 (1H, m), 5.46-5.40 (1H, m), 5.31-5.28 (1H, m), 5.08 (2H, s), 4.32 (2H, dt), 2.48 (3H, s), 2.28 (3H, s), 2.21 (3H, s). Production Example 13
0.92 g of 4-bromophenol was added to a mixture of 0.60 g of Intermediate 15, 11 mL of acetonitrile and 0.74 g of potassium carbonate, and the mixture was stirred under reflux for 5 hours. To the resulting mixture was added water and extracted with ethyl acetate. The resulting organic layer was dried over sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography (hexane: ethyl acetate = 80: 20) to obtain 1.2 g of the present compound 46 represented by the following formula.
Figure JPOXMLDOC01-appb-C000063
 Invention compound 46: 1 H-NMR (CDCl 3 ) δ: 7.30 (2H, d), 6.87 (2H, d), 6.13-6.03 (1H, m), 5.46-5.40 (1H, m), 5.31-5.28 (1H, m), 5.08 (2H, s), 4.32 (2H, dt), 2.48 (3H, s), 2.28 (3H, s), 2.21 (3H, s).
製造例１４
　製造例１３に記載の方法に準じて製造した化合物及びその物性値を以下に示す。
式（Ａ－４）で示される化合物において、Ｒ1xが［表５］に記載のいずれかの化合物。 Production Example 14
The compounds produced according to the method described in Production Example 13 and the physical properties thereof are shown below.
In the compounds represented by Formula (A-4), compounds in which R 1x is any of those listed in [Table 5].
Figure JPOXMLDOC01-appb-T000064
Figure JPOXMLDOC01-appb-I000065

　本発明化合物４７：1H-NMR (CDCl3) δ: 7.86 (1H, s), 7.68 (1H, s), 6.12-5.99 (1H, m), 5.41 (1H, d), 5.40 (2H, s), 5.28 (1H, s), 4.28 (2H, d), 2.47 (3H, s), 2.21 (3H, s), 2.20 (3H, s).
　本発明化合物４８：1H-NMR (CDCl3) δ: 7.56 (2H, d), 7.03 (2H, d), 6.13-6.04 (1H, m), 5.46-5.41 (1H, m), 5.32-5.29 (1H, m), 5.17 (2H, s), 4.33 (2H, dt), 2.49 (3H, s), 2.29 (3H, s), 2.22 (3H, s).
　本発明化合物４９：1H-NMR (CDCl3) δ: 7.92 (2H, d), 6.96 (2H, d), 6.10-6.01 (1H, m), 5.44-5.40 (1H, m), 5.28-5.25 (1H, m), 5.15 (2H, s), 4.30-4.28 (2H, m), 3.83 (3H, s), 2.47 (3H, s), 2.27 (3H, s), 2.18 (3H, s).
　本発明化合物５０：1H-NMR (CDCl3) δ: 8.16 (2H, d), 7.05 (2H, d), 6.14-6.04 (1H, m), 5.46-5.42 (1H, m), 5.32-5.30 (1H, m), 5.22 (2H, s), 4.35-4.34 (2H, m), 2.50 (3H, s), 2.31 (3H, s), 2.24 (3H, s).
　本発明化合物５１：1H-NMR (CDCl3) δ: 8.13 (1H, s), 7.68 (2H, d), 7.60 (2H, d), 6.14-6.03 (1H, m), 5.43 (1H, d), 5.34 (2H, s), 5.29 (1H, d), 4.31 (2H, d), 2.50 (3H, s), 2.34 (3H, s), 2.21 (3H, s).
　本発明化合物５２：1H-NMR (CDCl3) δ: 7.35 (2H, d), 7.28 (2H, d), 6.12-6.02 (1H, m), 5.42 (1H, d), 5.29 (1H, d), 4.26 (2H, d), 4.21 (2H, s), 2.42 (3H, s), 2.20 (3H, s), 2.16 (3H, s), 1.30 (9H, s).
　本発明化合物５３：1H-NMR (CDCl3) δ:. 6.83 (1H, t), 6.80-6.78 (1H, m), 6.14-6.12 (1H, m), 6.10-6.00 (1H, m), 5.43-5.38 (1H, m), 5.29-5.26 (1H, m), 5.25 (2H, s), 4.27 (2H, dt), 2.45 (3H, s), 2.19 (3H, s), 2.16 (3H, s).
　本発明化合物５４：1H-NMR (CDCl3) δ: 7.32 (2H, d), 7.29 (2H, d), 6.13-6.02 (1H, m), 5.42 (1H, d), 5.28 (1H, d), 4.26 (2H, d), 3.73 (4H, s), 2.45 (3H, s), 2.19 (3H, s), 2.16 (3H, s), 1.31 (9H, s).
　本発明化合物５５：1H-NMR (CDCl3) δ: 7.26 (2H, dd), 6.96 (2H, t), 6.16-6.03 (1H, m), 5.43 (1H, d), 5.29 (1H, d), 4.28 (2H, d), 3.63 (2H, s), 3.48 (2H, s), 2.45 (3H, s), 2.27 (3H, s), 2.17 (3H, s), 2.15 (3H, s).
　本発明化合物５６：1H-NMR (CDCl3) δ: 8.23-8.18 (1H, m), 7.81-7.77 (1H, m), 7.50-7.34 (3H, m), 7.28-7.24 (1H, m), 7.01-6.99 (1H, m), 6.14-6.04 (1H, m), 5.46-5.41 (1H, m), 5.32 (2H, s), 5.31-5.27 (1H, m), 4.34 (2H, dt), 2.52 (3H, s), 2.34 (3H, s), 2.24 (3H, s).
　本発明化合物５７：1H-NMR (CDCl3) δ: 7.26-7.21 (2H, m), 6.87 (2H, d), 6.72 (1H, t), 6.11-6.01 (1H, m), 5.43-5.37 (1H, m), 5.28-5.25 (1H, m), 4.50 (2H, s), 4.27 (2H, dt), 2.84 (3H, s), 2.45 (3H, s), 2.18 (3H, s), 2.17 (3H, s).
　本発明化合物５８：1H-NMR (CDCl3) δ: 7.53 (2H, d), 7.09 (2H, d), 6.13-6.03 (1H, m), 5.45-5.40 (1H, m), 5.30-5.27 (1H, m), 5.17 (2H, s), 4.32-4.30 (2H, m), 2.49 (3H, s), 2.28 (3H, s), 2.21 (3H, s).
　本発明化合物５９：1H-NMR (CDCl3) δ: 7.17-6.98 (3H, m), 6.93-6.90 (1H, m), 6.12-6.04 (1H, m), 5.46-5.41 (1H, m), 5.32-5.28 (1H, m), 5.09 (2H, s), 4.32 (2H, dt), 2.49 (3H, s), 2.28 (3H, s), 2.21 (3H, s).
　本発明化合物１３０：1H-NMR (CDCl3) δ: 7.52-7.50 (1H, m), 7.26-7.21 (1H, m), 7.15-7.13 (1H, m), 6.83-6.79 (1H, m), 6.13-6.03 (1H, m), 5.45-5.39 (1H, m), 5.30-5.26 (1H, m), 5.21 (2H, s), 4.31 (2H, dt), 2.48 (3H, s), 2.35 (3H, s), 2.20 (3H, s).
　本発明化合物１５７：1H-NMR (CDCl3) δ: 7.01-6.89 (4H, m), 6.13-6.04 (1H, m), 5.45-5.40 (1H, m), 5.30-5.27 (1H, m), 5.08 (2H, s), 4.30 (2H, dt), 2.48 (3H, s), 2.27 (3H, s), 2.20 (3H, s), 1.88-1.80 (1H, m), 0.91-0.86 (2H, m), 0.63-0.59 (2H, m).
　本発明化合物１７２：1H-NMR (CDCl3) δ: 7.30-7.26 (2H, m), 7.20-7.16 (3H, m), 7.10-7.08 (2H, m), 6.93 (2H, d), 6.13-6.03 (1H, m), 5.45-5.40 (1H, m), 5.30-5.26 (1H, m), 5.08 (2H, s), 4.30 (2H, dt), 3.92 (2H, s), 2.47 (3H, s), 2.27 (3H, s), 2.20 (3H, s).
　本発明化合物１７３：1H-NMR (CDCl3) δ: 7.55-7.52 (2H, m), 7.04-6.92 (6H, m), 6.15-6.05 (1H, m), 5.46-5.42 (1H, m), 5.32-5.29 (1H, m), 5.12 (2H, s), 4.33 (2H, d), 2.50 (3H, s), 2.32 (3H, s), 2.22 (3H, s).
Figure JPOXMLDOC01-appb-T000064
Figure JPOXMLDOC01-appb-I000065

Invention compound 47: 1 H-NMR (CDCl 3 ) δ: 7.86 (1H, s), 7.68 (1H, s), 6.12-5.99 (1H, m), 5.41 (1H, d), 5.40 (2H, s) ), 5.28 (1H, s), 4.28 (2H, d), 2.47 (3H, s), 2.21 (3H, s), 2.20 (3H, s).
Invention compound 48: 1 H-NMR (CDCl 3 ) δ: 7.56 (2H, d), 7.03 (2H, d), 6.13-6.04 (1H, m), 5.46-5.41 (1H, m), 5.32-5.29 (1H, m), 5.17 (2H, s), 4.33 (2H, dt), 2.49 (3H, s), 2.29 (3H, s), 2.22 (3H, s).
Invention compound 49: 1 H-NMR (CDCl 3 ) δ: 7.92 (2H, d), 6.96 (2H, d), 6.10-6.01 (1H, m), 5.44-5.40 (1H, m), 5.28-5.25 (1H, m), 5.15 (2H, s), 4.30-4.28 (2H, m), 3.83 (3H, s), 2.47 (3H, s), 2.27 (3H, s), 2.18 (3H, s).
The present compound 50: 1 H-NMR (CDCl 3 ) δ: 8.16 (2H, d), 7.05 (2H, d), 6.14-6.04 (1H, m), 5.46-5.42 (1H, m), 5.32-5.30 (1H, m), 5.22 (2H, s), 4.35-4.34 (2H, m), 2.50 (3H, s), 2.31 (3H, s), 2.24 (3H, s).
Invention compound 51: 1 H-NMR (CDCl 3 ) δ: 8.13 (1H, s), 7.68 (2H, d), 7.60 (2H, d), 6.14-6.03 (1H, m), 5.43 (1H, d ), 5.34 (2H, s), 5.29 (1H, d), 4.31 (2H, d), 2.50 (3H, s), 2.34 (3H, s), 2.21 (3H, s).
The present compound 52: 1 H-NMR (CDCl 3 ) δ: 7.53 (2H, d), 7.28 (2H, d), 6.12-6.02 (1H, m), 5.42 (1H, d), 5.29 (1H, d) ), 4.26 (2H, d), 4.21 (2H, s), 2.42 (3H, s), 2.20 (3H, s), 2.16 (3H, s), 1.30 (9H, s).
Invention compound 53: 1 H-NMR (CDCl 3 ) δ: .6.83 (1H, t), 6.80-6.78 (1H, m), 6.14-6.12 (1H, m), 6.10-6.00 (1H, m), 5.43-5.38 (1H, m), 5.29-5.26 (1H, m), 5.25 (2H, s), 4.27 (2H, dt), 2.45 (3H, s), 2.19 (3H, s), 2.16 (3H, s) s).
Invention compound 54: 1 H-NMR (CDCl 3 ) δ: 7.32 (2H, d), 7.29 (2H, d), 6.13-6.02 (1H, m), 5.42 (1H, d), 5.28 (1H, d) ), 4.26 (2H, d), 3.73 (4H, s), 2.45 (3H, s), 2.19 (3H, s), 2.16 (3H, s), 1.31 (9H, s).
The present compound 55: 1 H-NMR (CDCl 3 ) δ: 7.26 (2H, dd), 6.96 (2H, t), 6.16-6.03 (1H, m), 5.43 (1H, d), 5.29 (1H, d) ), 4.28 (2H, d), 3.63 (2H, s), 3.48 (2H, s), 2.45 (3H, s), 2.27 (3H, s), 2.17 (3H, s), 2.15 (3H, s) .
The present compound 56: 1 H-NMR (CDCl 3 ) δ: 8.23-8.18 (1H, m), 7.81-7.77 (1H, m), 7.50-7.34 (3H, m), 7.28-7. 24 (1H, m) , 7.01-6.99 (1H, m), 6.14-6.04 (1H, m), 5.46-5.41 (1H, m), 5.32 (2H, s), 5.31-5.27 (1H, m), 4.34 (2H, dt) , 2.52 (3H, s), 2.34 (3H, s), 2.24 (3H, s).
The present compound 57: 1 H-NMR (CDCl 3 ) δ: 7.26-7.21 (2H, m), 6.87 (2H, d), 6.72 (1H, t), 6.11-6.01 (1H, m), 5.43-5.37 (1H, m), 5.28-5.25 (1H, m), 4.50 (2H, s), 4.27 (2H, dt), 2.84 (3H, s), 2.45 (3H, s), 2.18 (3H, s), 2.17 (3H, s).
Invention compound 58: 1 H-NMR (CDCl 3 ) δ: 7.53 (2H, d), 7.09 (2H, d), 6.13-6.03 (1H, m), 5.45-5.40 (1H, m), 5.30-5.27 (1H, m), 5.17 (2H, s), 4.32-4.30 (2H, m), 2.49 (3H, s), 2.28 (3H, s), 2.21 (3H, s).
The present compound 59: 1 H-NMR (CDCl 3 ) δ: 7.17-6.98 (3H, m), 6.93-6.90 (1H, m), 6.12-6.04 (1H, m), 5.46-5.41 (1H, m) , 5.32-5.28 (1H, m), 5.09 (2H, s), 4.32 (2H, dt), 2.49 (3H, s), 2.28 (3H, s), 2.21 (3H, s).
Invention compound 130: 1 H-NMR (CDCl 3 ) δ: 7.52-7.50 (1H, m), 7.26-7.21 (1H, m), 7.15-7.13 (1H, m), 6.83-6.79 (1H, m) , 6.13-6.03 (1H, m), 5.45-5.39 (1H, m), 5.30-5.26 (1H, m), 5.21 (2H, s), 4.31 (2H, dt), 2.48 (3H, s), 2.35 (3H, s), 2.20 (3H, s).
Invention compound 157: 1 H-NMR (CDCl 3 ) δ: 7.01 to 6.89 (4H, m), 6.13 to 6.04 (1H, m), 5.45 to 5.40 (1H, m), 5.30 to 5.27 (1H, m) , 5.08 (2H, s), 4.30 (2H, dt), 2.48 (3H, s), 2.27 (3H, s), 2.20 (3H, s), 1.88-1.80 (1H, m), 0.91-0.86 (2H , m), 0.63-0.59 (2H, m).
Invention compound 172: 1 H-NMR (CDCl 3 ) δ: 7.30-7.26 (2H, m), 7.20-7.16 (3H, m), 7.10-7.08 (2H, m), 6.93 (2H, d), 6.13 -6.03 (1H, m), 5.45-5.40 (1H, m), 5.30-5.26 (1H, m), 5.08 (2H, s), 4.30 (2H, dt), 3.92 (2H, s), 2.47 (3H) , s), 2.27 (3H, s), 2.20 (3H, s).
The present compound 173: 1 H-NMR (CDCl 3 ) δ: 7.55 to 7.52 (2H, m), 7.04 to 6.92 (6H, m), 6.15-6.05 (1H, m), 5.46-5.42 (1H, m) , 5.32-5.29 (1 H, m), 5.12 (2 H, s), 4.33 (2 H, d), 2.50 (3 H, s), 2. 32 (3 H, s), 2.22 (3 H, s).
製造例１５
　１－ベンジル－１－メチルヒドラジン０．６９ｇ及びメタノール２０ｍＬの混合物に、０．５２ｇの中間体１１を加え、室温で１時間撹拌した。得られた混合物を減圧下で濃縮し、酢酸エチルを加え、水で洗浄した。得られた有機層を、硫酸マグネシウムで乾燥し、減圧下で濃縮した。得られた残渣をシリカゲルクロマトグラフィー（ヘキサン：酢酸エチル＝８０：２０）に付し、下式で示される本発明化合物６０を０．８１ｇ得た。
Figure JPOXMLDOC01-appb-C000066
 　本発明化合物６０：1H-NMR (CDCl3) δ: 7.42 (1H, s), 7.36-7.24 (5H, m), 6.17-6.04 (1H, m), 5.43 (1H, d), 5.28 (1H, d), 4.59 (2H, s), 4.29 (2H, d), 2.88 (3H, s), 2.48 (3H, s), 2.39 (3H, s), 2.19 (3H, s). Production Example 15
To a mixture of 0.69 g of 1-benzyl-1-methylhydrazine and 20 mL of methanol was added 0.52 g of Intermediate 11 and stirred at room temperature for 1 hour. The resulting mixture was concentrated under reduced pressure, ethyl acetate was added and washed with water. The resulting organic layer was dried over magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography (hexane: ethyl acetate = 80: 20) to obtain 0.81 g of the present compound 60 represented by the following formula.
Figure JPOXMLDOC01-appb-C000066
 The present compound 60: 1 H-NMR (CDCl 3 ) δ: 7.42 (1H, s), 7.36-7.24 (5H, m), 6.17-6.04 (1H, m), 5.43 (1H, d), 5.28 (1H , d), 4.59 (2H, s), 4.29 (2H, d), 2.88 (3H, s), 2.48 (3H, s), 2.39 (3H, s), 2.19 (3H, s).
製造例１６
　０．３３ｇの中間体１９及びクロロホルム１０ｍＬの混合物に、Ｎ－クロロスクシンイミド０．２４ｇを加え、室温で１時間撹拌した。得られた混合物にトリエチルアミン０．３１ｇ及び４－（トリフルオロメチル）スチレン０．３１ｇを加え、５０℃で１時間撹拌した。得られた混合物を減圧下で濃縮した。得られた残渣をシリカゲルクロマトグラフィー（ヘキサン：酢酸エチル＝８０：２０）に付し、下式で示される本発明化合物１６９を０．２５ｇ得た。
Figure JPOXMLDOC01-appb-C000067
 　本発明化合物１６９：1H-NMR (CDCl3) δ: 7.63 (2H d), 7.53 (2H, d), 6.10 (1H, m), 5.72 (1H, dd), 5.44 (1H, d), 5.30 (1H, d), 4.31 (2H, d), 4.04 (1H, dd), 3.59 (1H, dd), 2.52 (3H, s), 2.43 (3H, s), 2.22 (3H, s). Production Example 16
0.24 g of N-chlorosuccinimide was added to a mixture of 0.33 g of Intermediate 19 and 10 mL of chloroform, and stirred at room temperature for 1 hour. 0.31 g of triethylamine and 0.31 g of 4- (trifluoromethyl) styrene were added to the obtained mixture, and the mixture was stirred at 50 ° C. for 1 hour. The resulting mixture was concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography (hexane: ethyl acetate = 80: 20) to obtain 0.25 g of the present compound 169 represented by the following formula.
Figure JPOXMLDOC01-appb-C000067
 Invention compound 169: 1 H-NMR (CDCl 3 ) δ: 7.63 (2H d), 7.53 (2H, d), 6.10 (1 H, m), 5.72 (1 H, dd), 5.44 (1 H, d), 5.30 (1H, d), 4.31 (2H, d), 4.04 (1H, dd), 3.59 (1H, dd), 2.52 (3H, s), 2.43 (3H, s), 2.22 (3H, s).
製造例１７
　０．５８ｇの本発明化合物２、１０％パラジウム／炭素０．０６ｇ及び酢酸エチル３０ｍＬの混合物を水素雰囲気で４時間撹拌した。反応容器内を窒素で置換した後、得られた混合物をろ過し、ろ液を減圧下で濃縮した。得られた残渣をシリカゲルクロマトグラフィー（クロロホルム：メタノール＝９５：５）に付し、下式で示される本発明化合物９を０．４６ｇ得た。
Figure JPOXMLDOC01-appb-C000068
 　本発明化合物９：1H-NMR (CDCl3) δ: 8.08-7.71 (3H, m), 3.78-3.61 (2H, m), 3.21 (3H, s), 2.60 (3H, s), 2.23-2.08 (5H, m). Production Example 17
A mixture of 0.58 g of the compound of the present invention 2, 10% palladium / 0.06 g of carbon and 30 mL of ethyl acetate was stirred under hydrogen atmosphere for 4 hours. After purging the inside of the reaction vessel with nitrogen, the resulting mixture was filtered, and the filtrate was concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography (chloroform: methanol = 95: 5) to obtain 0.46 g of the present compound 9 represented by the following formula.
Figure JPOXMLDOC01-appb-C000068
 The present compound 9: 1 H-NMR (CDCl 3 ) δ: 8.08-7.71 (3H, m), 3.78-3.61 (2H, m), 3.21 (3H, s), 2.60 (3H, s), 2.23-2.08 (5H, m).
製造例１８
　製造例１７に記載の方法に準じて製造した化合物及びその物性値を以下に示す。
式（Ａ－５）
Figure JPOXMLDOC01-appb-C000069
 で示される化合物において、Ｒ1xが［表６］に記載のいずれかの化合物。 Production Example 18
The compounds produced according to the method described in Production Example 17 and the physical properties thereof are shown below.
Formula (A-5)
Figure JPOXMLDOC01-appb-C000069
 In the compounds represented by the above, R 1x is any compound described in [Table 6].
Figure JPOXMLDOC01-appb-T000070
Figure JPOXMLDOC01-appb-I000071

　本発明化合物１０：1H-NMR (CDCl3) δ: 8.44 (1H, s), 7.31-7.13 (5H, m), 2.59 (2H, t), 2.51 (2H, t), 2.27 (3H, s), 2.01 (6H, s), 1.63-1.51 (4H, m), 1.40-1.28 (4H, m).
　本発明化合物１１：1H-NMR (CDCl3) δ: 7.37-7.02 (5H, m), 2.96-2.80 (4H, m), 2.06 (6H, s), 2.00 (3H, s).
　本発明化合物１２：1H-NMR (CDCl3) δ: 8.34 (1H, s), 8.20 (1H, s), 7.29-7.24 (2H, m), 7.20-7.14 (2H, m), 4.43 (2H, t), 3.04 (2H, t), 2.30 (3H, s), 2.11 (3H, s), 2.04 (3H, s).
　本発明化合物１３：1H-NMR (CDCl3) δ: 8.35 (1H, s), 8.18 (1H, s), 7.58 (2H, d), 7.37 (2H, d), 4.46 (2H, t), 3.10 (2H, t), 2.30 (3H, s), 2.11 (3H, s), 2.04 (3H, s).
　本発明化合物１４：1H-NMR (CDCl3) δ: 11.31 (1H, s), 7.93-7.70 (3H, m), 4.69 (2H, s), 3.54 (2H, t), 2.78 (2H, t), 2.24 (3H, s), 2.04 (3H, s), 2.02-1.87 (5H, m).
　本発明化合物６２：1H-NMR (CDCl3) δ: 7.58 (2H, d), 7.17 (2H, d), 7.04 (2H, d), 7.00 (2H, d), 3.95 (2H, s), 2.20 (3H, s), 2.09 (3H, s), 2.02 (3H, s).
　本発明化合物６３：1H-NMR (DMSO) δ: 10.93 (1H, s), 7.36 (2H, d), 7.23 (2H, d), 7.06-7.01 (4H, m), 3.90 (2H, s), 2.22 (3H, s), 1.83 (3H, s), 1.82 (3H, s).
　本発明化合物６４：1H-NMR (CDCl3) δ: 8.41 (1H, s), 8.35 (1H, br s), 7.92 (1H, dd), 7.19 (2H, d), 7.11 (2H, d), 7.04 (1H, d), 3.96 (2H, s), 2.23 (3H, s), 2.08 (3H, s), 2.02 (3H, s).
　本発明化合物６５：1H-NMR (DMSO) δ: 10.94 (1H, s), 7.36 (2H, t), 7.19 (2H, d), 7.11 (1H, t), 6.97-6.94 (4H, m), 3.89 (2H, s), 2.22 (3H, s), 1.85 (3H, s), 1.83 (3H, s).
　本発明化合物６６：1H-NMR (CDCl3) δ: 7.73-7.64 (4H, m), 7.58 (2H, d), 7.27 (2H, d), 4.01 (2H, s), 2.17 (3H, s), 2.12 (3H, s), 2.03 (3H, s).
　本発明化合物６７：1H-NMR (DMSO) δ: 10.95 (1H, s), 7.56 (1H, t), 7.46 (1H, d), 7.26-7.23 (4H, m), 7.07-7.04 (2H, m), 3.91 (2H, s), 2.22 (3H, s), 1.83 (3H, s), 1.81 (3H, s).
　本発明化合物６８：1H-NMR (CDCl3) δ: 7.54 (2H, d), 7.43 (1H, br s), 7.29 (2H, d), 7.17 (2H, d), 7.10 (2H, d), 4.03 (2H, s), 3.91 (2H, s), 2.47 (3H, s), 2.09 (3H, s), 2.01 (3H, s).
　本発明化合物６９：1H-NMR (CDCl3) δ: 7.25-7.13 (5H, m), 7.05-6.97 (4H, m), 4.45 (1H, q), 2.15 (3H, s), 2.14 (3H, s), 2.01 (3H, s), 1.60 (3H, d).
　本発明化合物７０：1H-NMR (CDCl3) δ: 7.65 (2H, d), 7.36 (2H, d), 6.82 (1H, s), 6.09 (1H, s), 2.49 (3H, s), 2.20-2.08 (4H, m), 2.01 (3H, s).
　本発明化合物７３：1H-NMR (CDCl3) δ: 8.29 (1H, br s), 8.28 (1H, s), 7.33 (2H, d), 7.22 (2H, d), 5.12 (1H, dd), 2.25 (3H, s), 2.12 (3H, s), 2.01 (3H, s), 2.00 (1H, m), 1.85 (1H, m), 0.97 (3H, t).
　本発明化合物７４：1H-NMR (CDCl3) δ: 8.35 (1H, br s), 8.19 (0.5H, s), 8.18 (0.5H, s), 7.45 (1H, s), 7.36 (1H, s), 7.33 (1H, s), 4.73 (0.5H, m), 4.67 (0.5H, m), 4.59 (0.5H, m), 4.50 (0.5H, m), 2.32 (1.5H, s), 2.32 (1.5H, s), 2.10 (1.5H, s), 2.10 (1.5H, s), 2.04 (1.5H, s), 2.04 (1.5H, s), 1.43 (1.5H, d), 1.41 (1.5H, d), 1.38 (1.5H, d), 1.38 (1.5H, d).
　本発明化合物１５３：1H-NMR (DMSO) δ: 10.97 (1H, s), 7.77 (1H, d), 7.63 (1H, t), 7.30 (1H, t), 7.24-7.22 (2H, m), 7.01-6.96 (3H, m), 3.90 (2H, s), 2.21 (3H, s), 1.83 (3H, s), 1.82 (3H, s).
　本発明化合物１６３：1H-NMR (CDCl3) δ: 7.64 (2H, d), 7.48 (2H, d), 5.27 (2H, s), 2.26 (3H, s), 2.26 (3H, s), 2.08 (3H, s), 2.02 (3H, s).
　本発明化合物１６４：1H-NMR (CDCl3) δ: 8.42 (1H, br s), 7.57 (2H, d), 7.35 (2H, d), 4.42 (2H, dd), 3.08 (2H, dd), 2.28 (3H, s), 2.16 (3H, s), 2.08 (3H, s), 2.03 (3H, s).
　本発明化合物１６５：1H-NMR (CDCl3) δ: 8.29 (1H, br s), 7.40 (2H, d), 7.23 (2H, d), 5.21 (2H, s), 2.27 (3H, s), 2.24 (3H, s), 2.08 (3H, s), 2.03 (3H, s).
Figure JPOXMLDOC01-appb-T000070
Figure JPOXMLDOC01-appb-I000071

The present compound 10: 1 H-NMR (CDCl 3 ) δ: 8.44 (1H, s), 7.31-7. 13 (5H, m), 2.59 (2H, t), 2.51 (2H, t), 2.27 (3H, s) ), 2.01 (6H, s), 1.63-1.51 (4H, m), 1. 40-1.28 (4H, m).
Present compound 11: 1 H-NMR (CDCl 3 ) δ: 7.37 to 7.02 (5H, m), 2.96 to 2.80 (4H, m), 2.06 (6H, s), 2.00 (3H, s).
The present compound 12: 1 H-NMR (CDCl 3 ) δ: 8.34 (1H, s), 8.20 (1H, s), 7.29-7.24 (2H, m), 7.20-7.14 (2H, m), 4.43 (2H , t), 3.04 (2H, t), 2.30 (3H, s), 2.11 (3H, s), 2.04 (3H, s).
The present compound 13: 1 H-NMR (CDCl 3 ) δ: 8.35 (1H, s), 8.18 (1H, s), 7.58 (2H, d), 7.37 (2H, d), 4.46 (2H, t), 3.10 (2H, t), 2.30 (3H, s), 2.11 (3H, s), 2.04 (3H, s).
The present compound 14: 1 H-NMR (CDCl 3 ) δ: 11.31 (1H, s), 7.93-7.70 (3H, m), 4.69 (2H, s), 3.54 (2H, t), 2.78 (2H, t) ), 2.24 (3H, s), 2.04 (3H, s), 2.02-1.87 (5H, m).
The present compound 62: 1 H-NMR (CDCl 3 ) δ: 7.58 (2H, d), 7.17 (2H, d), 7.04 (2H, d), 7.00 (2H, d), 3.95 (2H, s), 2.20 (3H, s), 2.09 (3H, s), 2.02 (3H, s).
Invention compound 63: 1 H-NMR (DMSO) δ: 10.93 (1H, s), 7.36 (2H, d), 7.23 (2H, d), 7.06-7.01 (4H, m), 3.90 (2H, s) , 2.22 (3H, s), 1.83 (3H, s), 1.82 (3H, s).
Invention compound 64: 1 H-NMR (CDCl 3 ) δ: 8.41 (1 H, s), 8. 35 (1 H, br s), 7. 92 (1 H, dd), 7. 19 (2 H, d), 7.11 (2 H, d) , 7.04 (1H, d), 3.96 (2H, s), 2.23 (3H, s), 2.08 (3H, s), 2.02 (3H, s).
Invention compound 65: 1 H-NMR (DMSO) δ: 10.94 (1H, s), 7.36 (2H, t), 7.19 (2H, d), 7.11 (1H, t), 6.97-6.94 (4H, m) , 3.89 (2H, s), 2.22 (3H, s), 1.85 (3H, s), 1.83 (3H, s).
The present compound 66: 1 H-NMR (CDCl 3 ) δ: 7.73-7.64 (4H, m), 7.58 (2H, d), 7.27 (2H, d), 4.01 (2H, s), 2.17 (3H, s) ), 2.12 (3H, s), 2.03 (3H, s).
Invention compound 67: 1 H-NMR (DMSO) δ: 10.95 (1 H, s), 7.56 (1 H, t), 7.46 (1 H, d), 7.26-7.23 (4 H, m), 7.07-7.04 (2 H, m), 3.91 (2H, s), 2.22 (3H, s), 1.83 (3H, s), 1.81 (3H, s).
Invention compound 68: 1 H-NMR (CDCl 3 ) δ: 7.54 (2H, d), 7.43 (1H, br s), 7.29 (2H, d), 7.17 (2H, d), 7.10 (2H, d) , 4.03 (2H, s), 3.91 (2H, s), 2.47 (3H, s), 2.09 (3H, s), 2.01 (3H, s).
Invention compound 69: 1 H-NMR (CDCl 3 ) δ: 7.25-7.13 (5H, m), 7.05-6.97 (4H, m), 4.45 (1H, q), 2.15 (3H, s), 2.14 (3H) , s), 2.01 (3H, s), 1.60 (3H, d).
The present compound 70: 1 H-NMR (CDCl 3 ) δ: 7.65 (2H, d), 7.36 (2H, d), 6.82 (1H, s), 6.09 (1H, s), 2.49 (3H, s), 2.20-2.08 (4H, m), 2.01 (3H, s).
The present compound 73: 1 H-NMR (CDCl 3 ) δ: 8.29 (1 H, br s), 8. 28 (1 H, s), 7.33 (2 H, d), 7.22 (2 H, d), 5.12 (1 H, dd) , 2.25 (3H, s), 2.12 (3H, s), 2.01 (3H, s), 2.00 (1H, m), 1.85 (1H, m), 0.97 (3H, t).
The present compound 74: 1 H-NMR (CDCl 3 ) δ: 8.35 (1 H, br s), 8.19 (0.5 H, s), 8. 18 (0.5 H, s), 7. 45 (1 H, s), 7. 36 (1 H, s) s), 7.33 (1H, s), 4.73 (0.5 H, m), 4.67 (0.5 H, m), 4.59 (0.5 H, m), 4.50 (0.5 H, m), 2.32 (1.5 H, s), 2.32 (1.5H, s), 2.10 (1.5H, s), 2.10 (1.5H, s), 2.04 (1.5H, s), 2.04 (1.5H, s), 1.43 (1.5H, d), 1.41 ( 1.5H, d), 1.38 (1.5H, d), 1.38 (1.5H, d).
The present compound 153: 1 H-NMR (DMSO) δ: 10.97 (1 H, s), 7.77 (1 H, d), 7.63 (1 H, t), 7.30 (1 H, t), 7.24-7. 22 (2 H, m) , 7.01-6.96 (3H, m), 3.90 (2H, s), 2.21 (3H, s), 1.83 (3H, s), 1.82 (3H, s).
The present compound 163: 1 H-NMR (CDCl 3 ) δ: 7.64 (2H, d), 7.48 (2H, d), 5.27 (2H, s), 2.26 (3H, s), 2.26 (3H, s), 2.08 (3H, s), 2.02 (3H, s).
Invention compound 164: 1 H-NMR (CDCl 3 ) δ: 8.42 (1 H, br s), 7.57 (2 H, d), 7. 35 (2 H, d), 4.42 (2 H, dd), 3.08 (2 H, dd) , 2.28 (3H, s), 2.16 (3H, s), 2.08 (3H, s), 2.03 (3H, s).
Invention compound 165: 1 H-NMR (CDCl 3 ) δ: 8.29 (1H, br s), 7.40 (2H, d), 7.23 (2H, d), 5.21 (2H, s), 2.27 (3H, s) , 2.24 (3H, s), 2.08 (3H, s), 2.03 (3H, s).
製造例１９
　０．６８ｇの本発明化合物８、炭酸カリウム０．２１ｇ及びメタノール１０ｍＬの混合物に、窒素雰囲気下テトラキス（トリフェニルホスフィン）パラジウム（０）０．０２ｇを加え、室温で１時間撹拌した。得られた混合物に水を加え、クロロホルムで抽出した。得られた有機層を硫酸マグネシウムで乾燥し、減圧下で濃縮した。得られた残渣をシリカゲルクロマトグラフィー（クロロホルム：メタノール＝９５：５）に付し、次式で示される本発明化合物１５を０．５５ｇ得た。
Figure JPOXMLDOC01-appb-C000072
 　本発明化合物１５：1H-NMR (CDCl3) δ: 7.89 (1H, s), 7.24-7.19 (2H, m), 7.14-7.12 (2H, m), 4.54 (2H, s), 3.51 (1H, m), 2.57 (1H, m), 2.30 (3H, s), 2.29-2.19 (2H, m), 2.05 (3H, s), 2.03-1.96 (2H, m), 1.95 (3H, s), 1.58-1.44 (4H, m). Production Example 19
Under a nitrogen atmosphere, 0.02 g of tetrakis (triphenylphosphine) palladium (0) was added to a mixture of 0.68 g of the compound of the present invention 8, 0.21 g of potassium carbonate and 10 mL of methanol, and stirred at room temperature for 1 hour. To the resulting mixture was added water, and extracted with chloroform. The resulting organic layer was dried over magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography (chloroform: methanol = 95: 5) to obtain 0.55 g of the present compound 15 represented by the following formula.
Figure JPOXMLDOC01-appb-C000072
 The present compound 15: 1 H-NMR (CDCl 3 ) δ: 7.89 (1H, s), 7.24-7.19 (2H, m), 7.14-7.12 (2H, m), 4.54 (2H, s), 3.51 (1H , m), 2.57 (1H, m), 2.30 (3H, s), 2.29-2.19 (2H, m), 2.05 (3H, s), 2.03-1.96 (2H, m), 1.95 (3H, s), 1.58-1.44 (4H, m).
製造例２０
　製造例１９に記載の方法に準じて製造した化合物及びその物性値を以下に示す。
式（Ａ－５）で示される化合物において、Ｒ1xが［表７］に記載のいずれかの化合物。 Production Example 20
The compounds produced according to the method described in Production Example 19 and the physical properties thereof are shown below.
In the compounds represented by Formula (A-5), compounds in which R 1x is any of those described in [Table 7].
Figure JPOXMLDOC01-appb-T000073
Figure JPOXMLDOC01-appb-I000074

　本発明化合物７１：1H-NMR (CDCl3) δ: 8.42 (1H, br s), 8.25 (0.5H, s), 8.23 (0.5H, s), 6.92 (0.5H, s), 6.92 (0.5H, s), 4.50-4.28 (2H, m), 2.32 (1.5H, s), 2.32 (1.5H, s), 2.13 (1.5H, s), 2.13 (1.5H, s), 2.05 (1.5H, s), 2.04 (1.5H, s), 1.39 (1.5H, d), 1.35 (1.5H, d), 1.30 (1.5H, d), 1.27 (1.5H, d).
　本発明化合物７２：1H-NMR (CDCl3) δ: 8.34 (1H, s), 8.30 (1H, s), 7.66 (2H, d), 7.49 (2H, d), 5.29 (2H, s), 2.29 (3H, s), 2.12 (3H, s), 2.03 (3H, s).
　本発明化合物７５：1H-NMR (CDCl3) δ: 8.30 (1H, br s), 7.45 (2H, d), 6.88 (2H, d), 4.99 (2H, s), 2.31 (3H, s), 2.05 (3H, s), 2.04 (3H, s).
　本発明化合物７６：1H-NMR (CDCl3) δ: 7.84 (1H, s), 7.81 (1H, s), 5.27 (2H, s), 2.25 (3H, s), 2.16 (3H, s), 2.01 (3H, s).
　本発明化合物７７：1H-NMR (CDCl3) δ: 8.55 (1H, br s), 7.65 (2H, d), 7.07 (2H, d), 5.07 (2H, s), 2.33 (3H, s), 2.06 (3H, s), 2.05 (3H, s).
　本発明化合物７８：1H-NMR (CDCl3) δ: 8.60 (1H, br s), 8.04 (2H, d), 7.02 (2H, d), 5.06 (2H, s), 3.90 (3H, s), 2.33 (3H, s), 2.06 (3H, s), 2.05 (3H, s).
　本発明化合物７９：1H-NMR (CDCl3) δ: 8.28 (2H, d), 8.24 (1H, br s), 7.10 (2H, d), 5.13 (2H, s), 2.33 (3H, s), 2.08 (3H, s), 2.06 (3H, s).
　本発明化合物８０：1H-NMR (CDCl3) δ: 8.80 (1H, s), 7.42 (1H, s), 7.40-7.20 (5H, m), 4.61 (2H, s), 2.93 (3H, s), 2.29 (3H, s), 2.10 (3H, s), 2.04 (3H, s).
　本発明化合物８１：1H-NMR (CDCl3) δ: 8.26 (1H, s), 8.09 (1H, s), 7.71 (2H, d), 7.66 (2H, d), 5.18 (2H, s), 2.28 (3H, s), 2.07 (3H, s), 2.04 (3H, s).
　本発明化合物８２：1H-NMR (CDCl3) δ: 8.37 (1H, s), 7.30 (2H, d), 7.19 (2H, d), 4.01 (2H, s), 2.22 (3H, s), 2.02 (3H, s), 2.00 (3H, s), 1.28 (9H, s).
　本発明化合物８３：1H-NMR (CDCl3) δ: 6.81-6.80 (2H, m), 6.19 (1H, t), 5.17 (2H, s), 2.32 (3H, s), 2.01 (3H, s), 1.98 (3H, s).
　本発明化合物８４：1H-NMR (CDCl3) δ: 8.38 (1H, s), 7.30 (2H, d), 7.10 (2H, d), 3.60 (4H, s), 2.16 (3H, s), 2.00 (3H, s), 1.94 (3H, s), 1.29 (9H, s).
　本発明化合物８５：1H-NMR (CDCl3) δ: 8.39 (1H, s), 8.28 (1H, s), 7.41 (2H, d), 7.25 (2H, d), 5.24 (2H, s), 2.31 (3H, s), 2.12 (3H, s), 2.04 (3H, s).
　本発明化合物８６：1H-NMR (CDCl3) δ: 8.39 (1H, s), 8.30 (1H, s), 7.69 (2H, d), 7.43 (2H, d), 5.28 (2H, s), 2.30 (3H, s), 2.13 (3H, s), 2.03 (3H, s).
　本発明化合物８７：1H-NMR (CDCl3) δ: 8.98 (1H, s), 7.24 (2H, dd), 7.05 (2H, t), 3.58 (2H, s), 3.49 (2H, s), 2.30 (3H, s), 2.28 (3H, s), 2.03 (3H, s), 1.98 (3H, s).
　本発明化合物８８：1H-NMR (CDCl3) δ: 9.82 (1H, br s), 4.60-4.51 (2H, m), 4.17-4.11 (1H, m), 3.95-3.84 (2H, m), 3.74-3.70 (1H, m), 3.47-3.43 (1H, m), 2.30 (3H, s), 2.04 (3H, s), 2.01-1.95 (3H, m), 1.94 (3H, s), 1.66-1.58 (1H, m).
　本発明化合物８９：1H-NMR (CDCl3) δ: 9.10 (1H, br s), 7.85 (1H, d), 7.43 (1H, d), 4.99 (2H, s), 4.65 (2H, s), 2.32 (3H, s), 2.04 (3H, s), 1.95 (3H, s).
　本発明化合物９０：1H-NMR (CDCl3) δ: 8.97 (1H, br s), 8.19-8.16 (1H, m), 7.85-7.81 (1H, m), 7.55-7.50 (3H, m), 7.37 (1H, t), 6.82 (1H, d), 5.10 (2H, s), 2.29 (3H, s), 2.08 (3H, s), 2.06 (3H, s).
　本発明化合物９１：1H-NMR (CDCl3) δ:. 8.58 (1H, s), 7.30-7.26 (2H, m), 6.92-6.88 (1H, m), 6.77 (2H, d), 4.31 (2H, s), 3.02-3.02 (3H, m), 2.21 (3H, s), 2.04 (6H, s).
　本発明化合物９２：1H-NMR (CDCl3) δ: 8.42 (1H, s), 8.32 (1H, s), 8.23 (1H, s), 7.85 (1H, d), 4.71-4.54 (3H, m), 2.30 (3H, s), 2.11 (3H, s), 2.04 (3H, s), 1.91-1.80 (2H, m), 1.09 (3H, t).
　本発明化合物９３：1H-NMR (CDCl3) δ: 8.41 (1H, br s), 7.62 (2H, d), 7.07 (2H, d), 5.06 (2H, s), 2.33 (3H, s), 2.07 (3H, s), 2.06 (3H, s).
　本発明化合物９４：1H-NMR (CDCl3) δ: 8.51 (1H, br s), 7.46-7.45 (1H, m), 6.41-6.38 (2H, m), 4.62 (2H, s), 4.51 (2H, s), 2.28 (3H, s), 2.03 (3H, s), 1.92 (3H, s).
　本発明化合物９５：1H-NMR (CDCl3) δ: 8.47 (1H, br s), 7.37-7.35 (1H, m), 7.02-7.01 (1H, m), 4.84 (2H, s), 4.55 (2H, s), 2.29 (3H, s), 2.04 (3H, s), 1.93 (3H, s).
　本発明化合物９６：1H-NMR (CDCl3) δ: 8.52 (1H, br s), 7.21-7.20 (2H, m), 7.16-7.15 (1H, m), 6.93-6.90 (1H, m), 4.99 (2H, s), 2.33 (3H, s), 2.06 (3H, s), 2.05 (3H, s).
　本発明化合物１３８：1H-NMR (CDCl3) δ: 8.90 (1H, br s), 7.62-7.60 (1H, m), 7.37-7.33 (1H, m), 7.03-7.01 (1H, m), 6.99-6.96 (1H, m), 5.09 (2H, s), 2.36 (3H, s), 2.07 (3H, s), 2.03 (3H, s).
　本発明化合物１５８：1H-NMR (CDCl3) δ: 8.55 (1H, br s), 7.06-7.03 (2H, m), 6.89-6.84 (2H, m), 4.97 (2H, s), 2.31 (3H, s), 2.05 (3H, s), 2.03 (3H, s), 1.90-1.83 (1H, m), 0.96-0.91 (2H, m), 0.64-0.62 (2H, m).
　本発明化合物１７０：1H-NMR (CDCl3) δ: 9.26 (1H, br s), 7.64 (2H d), 7.48 (2H, d), 5.87 (1H, t), 3.96 (1H, dd), 3.46 (1H, dd), 2.32 (3H, s), 2.17 (3H, s), 2.03 (3H, s).
　本発明化合物１７４：1H-NMR (CDCl3) δ: 8.38 (1H, br s), 7.31-7.26 (2H, m), 7.23-7.15 (5H, m), 6.91 (2H, d), 4.99 (2H, s), 3.95 (2H, s), 2.30 (3H, s), 2.05 (3H, s), 2.03 (3H, s).
　本発明化合物１７５：1H-NMR (CDCl3) δ: 8.37 (1H, br s), 7.57 (2H, d), 7.07-6.99 (6H, m), 5.03 (2H, s), 2.33 (3H, s), 2.06 (3H, s), 2.05 (3H, s).
Figure JPOXMLDOC01-appb-T000073
Figure JPOXMLDOC01-appb-I000074

The present compound 71: 1 H-NMR (CDCl 3 ) δ: 8.42 (1 H, br s), 8. 25 (0.5 H, s), 8.23 (0.5 H, s), 6. 92 (0.5 H, s), 6. 92 (0.5) H, s), 4.50-4.28 (2H, m), 2.32 (1.5 H, s), 2.32 (1.5 H, s), 2.13 (1.5 H, s), 2.13 (1.5 H, s), 2.05 (1.5 H) , s), 2.04 (1.5 H, s), 1. 39 (1.5 H, d), 1. 35 (1.5 H, d), 1. 30 (1.5 H, d), 1. 27 (1.5 H, d).
The present compound 72: 1 H-NMR (CDCl 3 ) δ: 8.34 (1H, s), 8.30 (1H, s), 7.66 (2H, d), 7.49 (2H, d), 5.29 (2H, s), 2.29 (3H, s), 2.12 (3H, s), 2.03 (3H, s).
The present compound 75: 1 H-NMR (CDCl 3 ) δ: 8.30 (1H, br s), 7.45 (2H, d), 6.88 (2H, d), 4.99 (2H, s), 2.31 (3H, s) , 2.05 (3H, s), 2.04 (3H, s).
The present compound 76: 1 H-NMR (CDCl 3 ) δ: 7.84 (1 H, s), 7.81 (1 H, s), 5. 27 (2 H, s), 2. 25 (3 H, s), 2. 16 (3 H, s), 2.01 (3H, s).
The present compound 77: 1 H-NMR (CDCl 3 ) δ: 8.55 (1 H, br s), 7.65 (2 H, d), 7.07 (2 H, d), 5.07 (2 H, s), 2. 33 (3 H, s) , 2.06 (3H, s), 2.05 (3H, s).
Invention compound 78: 1 H-NMR (CDCl 3 ) δ: 8.60 (1H, br s), 8.04 (2H, d), 7.02 (2H, d), 5.06 (2H, s), 3.90 (3H, s) , 2.33 (3H, s), 2.06 (3H, s), 2.05 (3H, s).
Invention compound 79: 1 H-NMR (CDCl 3 ) δ: 8.28 (2H, d), 8.24 (1H, br s), 7.10 (2H, d), 5.13 (2H, s), 2.33 (3H, s) , 2.08 (3H, s), 2.06 (3H, s).
The present compound 80: 1 H-NMR (CDCl 3 ) δ: 8.80 (1 H, s), 7.42 (1 H, s), 7. 40-7. 20 (5 H, m), 4.6 1 (2 H, s), 2. 93 (3 H, s) ), 2.29 (3H, s), 2.10 (3H, s), 2.04 (3H, s).
Invention compound 81: 1 H-NMR (CDCl 3 ) δ: 8.26 (1H, s), 8.09 (1H, s), 7.71 (2H, d), 7.66 (2H, d), 5.18 (2H, s), 2.28 (3H, s), 2.07 (3H, s), 2.04 (3H, s).
Invention compound 82: 1 H-NMR (CDCl 3 ) δ: 8.37 (1H, s), 7.30 (2H, d), 7.19 (2H, d), 4.01 (2H, s), 2.22 (3H, s), 2.02 (3H, s), 2.00 (3H, s), 1.28 (9H, s).
The present compound 83: 1 H-NMR (CDCl 3 ) δ: 6.81 to 6.80 (2H, m), 6.19 (1H, t), 5.17 (2H, s), 2.32 (3H, s), 2.01 (3H, s) ), 1.98 (3H, s).
Invention compound 84: 1 H-NMR (CDCl 3 ) δ: 8.38 (1H, s), 7.30 (2H, d), 7.10 (2H, d), 3.60 (4H, s), 2.16 (3H, s), 2.00 (3H, s), 1.94 (3H, s), 1.29 (9H, s).
Invention compound 85: 1 H-NMR (CDCl 3 ) δ: 8.39 (1H, s), 8.28 (1H, s), 7.41 (2H, d), 7.25 (2H, d), 5.24 (2H, s), 2.31 (3H, s), 2.12 (3H, s), 2.04 (3H, s).
Invention compound 86: 1 H-NMR (CDCl 3 ) δ: 8.39 (1H, s), 8.30 (1H, s), 7.69 (2H, d), 7.43 (2H, d), 5.28 (2H, s), 2.30 (3H, s), 2.13 (3H, s), 2.03 (3H, s).
Invention compound 87: 1 H-NMR (CDCl 3 ) δ: 8.98 (1H, s), 7.24 (2H, dd), 7.05 (2H, t), 3.58 (2H, s), 3.49 (2H, s), 2.30 (3H, s), 2.28 (3H, s), 2.03 (3H, s), 1.98 (3H, s).
Invention compound 88: 1 H-NMR (CDCl 3 ) δ: 9.82 (1H, br s), 4.60-4.51 (2H, m), 4.17-4.11 (1H, m), 3.95-3.84 (2H, m), 3.74-3.70 (1H, m), 3.47-3.43 (1H, m), 2.30 (3H, s), 2.04 (3H, s), 2.01-1.95 (3H, m), 1.94 (3H, s), 1.66- 1.58 (1 H, m).
Invention compound 89: 1 H-NMR (CDCl 3 ) δ: 9.10 (1 H, br s), 7. 85 (1 H, d), 7.43 (1 H, d), 4.99 (2 H, s), 4. 65 (2 H, s) , 2.32 (3H, s), 2.04 (3H, s), 1.95 (3H, s).
The present compound 90: 1 H-NMR (CDCl 3 ) δ: 8.97 (1H, br s), 8.19-8.16 (1H, m), 7.85-7.81 (1H, m), 7.55-7.50 (3H, m), 7.37 (1H, t), 6.82 (1H, d), 5.10 (2H, s), 2.29 (3H, s), 2.08 (3H, s), 2.06 (3H, s).
The present compound 91: 1 H-NMR (CDCl 3 ) δ: .8.58 (1H, s), 7.30-7.26 (2H, m), 6.92-6.88 (1H, m), 6.77 (2H, d), 4.31 (4H) 2H, s), 3.02-3.02 (3H, m), 2.21 (3H, s), 2.04 (6H, s).
The present compound 92: 1 H-NMR (CDCl 3 ) δ: 8.42 (1 H, s), 8.32 (1 H, s), 8.23 (1 H, s), 7. 85 (1 H, d), 4.71-4. 54 (3 H, m) ), 2.30 (3H, s), 2.11 (3H, s), 2.04 (3H, s), 1.91-1.80 (2H, m), 1.09 (3H, t).
The present compound 93: 1 H-NMR (CDCl 3 ) δ: 8.41 (1 H, br s), 7.62 (2 H, d), 7.07 (2 H, d), 5.06 (2 H, s), 2. 33 (3 H, s) , 2.07 (3H, s), 2.06 (3H, s).
Invention compound 94: 1 H-NMR (CDCl 3 ) δ: 8.51 (1 H, br s), 7.46-7.45 (1 H, m), 6.41-6.38 (2 H, m), 4.62 (2 H, s), 4.51 2H, s), 2.28 (3H, s), 2.03 (3H, s), 1. 92 (3H, s).
The present compound 95: 1 H-NMR (CDCl 3 ) δ: 8.47 (1 H, br s), 7.37-7.35 (1 H, m), 7.02-7.01 (1 H, m), 4.84 (2 H, s), 4.55 ( 2H, s), 2.29 (3H, s), 2.04 (3H, s), 1.93 (3H, s).
The present compound 96: 1 H-NMR (CDCl 3 ) δ: 8.52 (1H, br s), 7.21-7.20 (2H, m), 7.16-7.15 (1H, m), 6.93-6.90 (1H, m), 4.99 (2H, s), 2.33 (3H, s), 2.06 (3H, s), 2.05 (3H, s).
Invention compound 138: 1 H-NMR (CDCl 3 ) δ: 8.90 (1H, br s), 7.62-7.60 (1H, m), 7.37-7.33 (1H, m), 7.03-7.01 (1H, m), 6.99-6.96 (1H, m), 5.09 (2H, s), 2.36 (3H, s), 2.07 (3H, s), 2.03 (3H, s).
Invention compound 158: 1 H-NMR (CDCl 3 ) δ: 8.55 (1H, br s), 7.06-7.03 (2H, m), 6.89-6.84 (2H, m), 4.97 (2H, s), 2.31 3H, s), 2.05 (3H, s), 2.03 (3H, s), 1.90-1. 83 (1H, m), 0.96-0.91 (2H, m), 0.64-0.62 (2H, m).
The present compound 170: 1 H-NMR (CDCl 3 ) δ: 9.26 (1 H, br s), 7.64 (2 H d), 7. 48 (2 H, d), 5. 87 (1 H, t), 3. 96 (1 H, dd), 3.46 (1H, dd), 2.32 (3H, s), 2.17 (3H, s), 2.03 (3H, s).
Invention compound 174: 1 H-NMR (CDCl 3 ) δ: 8.38 (1H, br s), 7.31-7.26 (2H, m), 7.23-7.15 (5H, m), 6.91 (2H, d), 4.99 (C) 2H, s), 3.95 (2H, s), 2.30 (3H, s), 2.05 (3H, s), 2.03 (3H, s).
Invention compound 175: 1 H-NMR (CDCl 3 ) δ: 8.37 (1 H, br s), 7.57 (2 H, d), 7.07-6.99 (6 H, m), 5.03 (2 H, s), 2. 33 (3 H, s), 2.06 (3H, s), 2.05 (3H, s).
製造例２１
　０．３７ｇの本発明化合物９、クロロホルム２０ｍＬ及びトリエチルアミン０．２７ｍＬの混合物に、氷冷下でアセチルクロリド０．１４ｍＬを加え、室温で３０分間撹拌した。得られた混合物に飽和炭酸水素ナトリウム水溶液を加え、クロロホルムで抽出した。得られた有機層を硫酸マグネシウムで乾燥し、減圧下で濃縮した。得られた残渣をシリカゲルクロマトグラフィー（ヘキサン：酢酸エチル＝８０：２０）に付し、次式で示される本発明化合物１６を０．２７ｇ得た。
Figure JPOXMLDOC01-appb-C000075
 　本発明化合物１６：1H-NMR (CDCl3) δ: 7.89 (1H, s), 7.69 (1H, d), 7.46 (1H, d), 3.28-3.21 (4H, m), 2.51 (3H, s), 2.36 (3H, s), 2.07 (3H, s), 1.95 (3H, s). Production Example 21
0.14 mL of acetyl chloride was added to a mixture of 0.37 g of the compound of the present invention 9, 20 mL of chloroform and 0.27 mL of triethylamine under ice cooling, and the mixture was stirred at room temperature for 30 minutes. To the resulting mixture was added saturated aqueous sodium hydrogen carbonate solution, and the mixture was extracted with chloroform. The resulting organic layer was dried over magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography (hexane: ethyl acetate = 80: 20) to obtain 0.27 g of the present compound 16 represented by the following formula.
Figure JPOXMLDOC01-appb-C000075
 The present compound 16: 1 H-NMR (CDCl 3 ) δ: 7.89 (1H, s), 7.69 (1H, d), 7.46 (1H, d), 3.28-3.21 (4H, m), 2.51 (3H, s) ), 2.36 (3H, s), 2.07 (3H, s), 1.95 (3H, s).
製造例２２
　製造例２１に記載の方法に準じて製造した化合物及びその物性値を以下に示す。
式（Ａ－６）
Figure JPOXMLDOC01-appb-C000076
 で示される化合物において、Ｒ1xが［表８］に記載のいずれかの化合物。 Production Example 22
The compounds produced according to the method described in Production Example 21 and the physical properties thereof are shown below.
Formula (A-6)
Figure JPOXMLDOC01-appb-C000076
 In the compounds represented by the above, R 1x is any of compounds described in [Table 8].
Figure JPOXMLDOC01-appb-T000077
Figure JPOXMLDOC01-appb-I000078

Figure JPOXMLDOC01-appb-I000079

Figure JPOXMLDOC01-appb-I000080

　本発明化合物１７：1H-NMR (CDCl3) δ: 7.30-7.23 (2H, m), 7.19-7.13 (3H, m), 2.73 (2H, t), 2.59 (2H, t), 2.46 (3H, s), 2.36 (3H, s), 2.05 (3H, s), 2.03 (3H, s), 1.68-1.56 (4H, m), 1.46-1.33 (4H, m).
　本発明化合物１８：1H-NMR (CDCl3) δ: 7.31-7.16 (5H, m), 3.09-2.93 (4H, m), 2.51 (3H, s), 2.36 (3H, s), 2.06 (3H, s), 1.98 (3H, s).
　本発明化合物１９：1H-NMR (CDCl3) δ: 8.32 (1H, s), 7.26 (2H, d), 7.14 (2H, d), 4.43 (2H, t), 3.04 (2H, t), 2.53 (3H, s), 2.39 (3H, s), 2.25 (3H, s), 2.10 (3H, s).
　本発明化合物２０：1H-NMR (CDCl3) δ: 8.32 (1H, s), 7.55 (2H, d), 7.36 (2H, d), 4.45 (2H, t), 3.10 (2H, t), 2.53 (3H, s), 2.39 (3H, s), 2.24 (3H, s), 2.10 (3H, s).
　本発明化合物２１：1H-NMR (CDCl3) δ: 7.91-7.86 (2H, m), 7.83-7.76 (1H, m), 4.74 (2H, s), 3.64 (2H, t), 2.88 (2H, t), 2.45 (3H, s), 2.37 (3H, s), 2.11-2.00 (8H, m).
　本発明化合物２２：1H-NMR (CDCl3) δ: 7.23-7.17 (2H, m), 7.15-7.09 (2H, m), 4.67 (2H, s), 3.42 (1H, m), 2.58-2.46 (4H, m), 2.38 (3H, s), 2.25-2.16 (5H, m), 2.07 (3H, s), 1.98-1.88 (2H, m), 1.53-1.36 (4H, m).
　本発明化合物９７：1H-NMR (CDCl3) δ: 8.32 (1H, s), 8.29 (1H, m), 7.82 (1H, m), 4.66-4.61 (2H, m), 4.57 (1H, m), 2.51 (3H, s), 2.38 (3H, s), 2.26 (3H, s), 2.09 (3H, s), 1.86 (2H, m), 1.06 (3H, t).
　本発明化合物９８：1H-NMR (CDCl3) δ: 8.00 (2H, d), 7.31 (2H, d), 4.24 (2H, s), 2.53 (3H, s), 2.35 (3H, s), 2.08 (3H, s), 1.98 (3H, s).
　本発明化合物９９：1H-NMR (CDCl3) δ: 8.39 (1H, s), 7.61 (2H, d), 7.51 (2H, d), 5.30 (2H, s), 2.52 (3H, s), 2.37 (3H, s), 2.20 (3H, s), 2.09 (3H, s).
　本発明化合物１００：1H-NMR (CDCl3) δ: 8.33 (1H, s), 7.34 (2H, d), 7.17 (2H, d), 5.13 (1H, dd), 2.49 (3H, s), 2.35 (3H, s), 2.10 (3H, s), 2.07 (3H, s), 2.02 (1H, m), 1.86 (1H, m), 0.95 (3H, t).
　本発明化合物１０１：1H-NMR (CDCl3) δ: 8.28 (0.5H, s), 8.27 (0.5H, s), 7.41 (1H, s), 7.36 (1H, s), 7.34 (1H, s), 4.83-4.74 (1H, m), 4.61 (0.5H, m), 4.51 (0.5H, m), 2.52 (1.5H, s), 2.52 (1.5H, s), 2.39 (1.5H, s), 2.38 (1.5H, s), 2.27 (1.5H, s), 2.22 (1.5H, s), 2.10 (1.5H, s), 2.10 (1.5H, s), 1.42 (1.5H, d), 1.38 (1.5H, d), 1.36 (1.5H, d), 1.35 (1.5H, d).
　本発明化合物１０２：1H-NMR (CDCl3) δ: 7.53 (2H, d), 7.18 (2H, d), 7.00 (2H, d), 6.93 (2H, d), 4.16 (2H, s), 2.52 (3H, s), 2.36 (3H, s), 2.07 (3H, s), 2.02 (3H, s).
　本発明化合物１０３：1H-NMR (CDCl3) δ: 7.16-7.14 (4H, m), 6.96-6.94 (2H, m), 6.90-6.88 (2H, m), 4.15 (2H, s), 2.52 (3H, s), 2.35 (3H, s), 2.07 (3H, s), 2.01 (3H, s).
　本発明化合物１０４：1H-NMR (CDCl3) δ: 8.44 (1H, s), 7.87 (1H, dd), 7.22 (2H, d), 7.02 (2H, d), 6.95 (1H, d), 4.18 (2H, s), 2.52 (3H, s), 2.36 (3H, s), 2.07 (3H, s), 2.03 (3H, s).
　本発明化合物１０５：1H-NMR (CDCl3) δ: 7.72-7.63 (4H, m), 7.48 (2H, d), 7.26 (2H, d), 4.22 (2H, s), 2.53 (3H, s), 2.35 (3H, s), 2.08 (3H, s), 2.02 (3H, s).
　本発明化合物１０６：1H-NMR (CDCl3) δ: 7.73 (1H, s), 7.67 (1H, s), 5.41 (2H, s), 2.50 (3H, s), 2.37 (3H, s), 2.11 (3H, s), 2.08 (3H, s).
　本発明化合物１０７：1H-NMR (CDCl3) δ: 7.36 (2H, d), 6.89 (2H, d), 5.11 (2H, s), 2.51 (3H, s), 2.38 (3H, s), 2.16 (3H, s), 2.09 (3H, s).
　本発明化合物１０８：1H-NMR (CDCl3) δ: 7.57 (2H, d,), 7.08 (2H, d), 5.20 (2H, s), 2.52 (3H, s), 2.38 (3H, s), 2.16 (3H, s), 2.10 (3H, s).
　本発明化合物１０９：1H-NMR (CDCl3) δ: 7.41 (1H, s), 7.38-7.21 (5H, m), 4.58 (2H, s), 2.88 (3H, s), 2.50 (3H, s), 2.38 (3H, s), 2.29 (3H, s), 2.07 (3H, s).
　本発明化合物１１０：1H-NMR (CDCl3) δ: 7.98 (2H, d), 7.03 (2H, d), 5.19 (2H, s), 3.87 (3H, s), 2.52 (3H, s), 2.38 (3H, s), 2.17 (3H, s), 2.09 (3H, s).
　本発明化合物１１１：1H-NMR (CDCl3) δ: 8.19 (2H, d), 7.09 (2H, d), 5.25 (2H, s), 2.52 (3H, s), 2.39 (3H, s), 2.17 (3H, s), 2.10 (3H, s).
　本発明化合物１１２：1H-NMR (CDCl3) δ: 8.13 (1H, s), 7.67 (2H, d), 7.61 (2H, d), 5.34 (2H, s), 2.53 (3H, s), 2.38 (3H, s), 2.22 (3H, s), 2.09 (3H, s).
　本発明化合物１１３：1H-NMR (CDCl3) δ: 7.33 (2H, d), 7.27 (2H, d), 4.22 (2H, s), 2.44 (3H, s), 2.36 (3H, s), 2.08 (3H, s), 2.05 (3H, s), 1.30 (9H, s).
　本発明化合物１１４：1H-NMR (CDCl3) δ: 7.32 (2H, d), 7.29 (2H, d), 3.75 (2H, s), 3.72 (2H, s), 2.49 (3H, s), 2.36 (3H, s), 2.06 (3H, s), 2.05 (3H, s), 1.31 (9H, s).
　本発明化合物１１５：1H-NMR (CDCl3) δ: 6.86-6.85 (1H, m), 6.80-6.79 (1H, m), 6.15-6.13 (1H, m), 5.27 (2H, s), 2.49 (3H, s), 2.36 (3H, s), 2.08 (3H, s), 2.07 (3H, s).
　本発明化合物１１６：1H-NMR (CDCl3) δ: 8.37 (1H, s), 7.43 (2H, d), 7.20 (2H, d), 5.24 (2H, s), 2.52 (3H, s), 2.38 (3H, s), 2.20 (3H, s), 2.09 (3H, s).
　本発明化合物１１７：1H-NMR (CDCl3) δ: 8.39 (1H, s), 7.64 (2H, d), 7.45 (2H, d), 5.28 (2H, s), 2.52 (3H, s), 2.38 (3H, s), 2.19 (3H, s), 2.09 (3H, s).
　本発明化合物１１８：1H-NMR (CDCl3) δ: 7.42-7.38 (1H, m), 7.31-7.29 (1H, m), 7.21-7.20 (1H, m), 7.17-7.14 (2H, m), 7.12-7.09 (1H, m), 6.93-6.89 (2H, m), 4.17 (2H, s), 2.52 (3H, s), 2.36 (3H, s), 2.07 (3H, s), 2.01 (3H, s).
　本発明化合物１１９：1H-NMR (CDCl3) δ: 7.25 (2H, dd), 6.96 (2H, t), 3.69 (2H, s), 3.48 (2H, s), 2.48 (3H, s), 2.37 (3H, s), 2.15 (3H, s), 2.14 (3H, s), 2.06 (3H, s).
　本発明化合物１２０：1H-NMR (CDCl3) δ: 7.74 (1H, d), 7.32-7.31 (1H, m), 4.88 (2H, s), 4.78 (2H, s), 2.50 (3H, s), 2.37-2.37 (3H, m), 2.17 (3H, s), 2.08 (3H, s).
　本発明化合物１２１：1H-NMR (CDCl3) δ: 4.71-4.63 (2H, m), 4.08-4.02 (1H, m), 3.88-3.83 (1H, m), 3.77-3.72 (1H, m), 3.49-3.47 (2H, m), 2.49 (3H, s), 2.37-2.37 (3H, m), 2.17 (3H, s), 2.07 (3H, s), 1.96-1.80 (3H, m), 1.63-1.54 (1H, m).
　本発明化合物１２２：1H-NMR (CDCl3) δ: 8.21 (1H, d), 7.77 (1H, d), 7.47-7.35 (4H, m), 7.01 (1H, d), 5.33 (2H, s), 2.54 (3H, s), 2.36 (3H, s), 2.22 (3H, s), 2.11 (3H, s).
　本発明化合物１２３：1H-NMR (CDCl3) δ: 7.23 (2H, t), 6.87-6.85 (2H, m), 6.72 (1H, t), 4.52 (2H, s), 2.84 (3H, s), 2.48 (3H, s), 2.34-2.34 (3H, m), 2.06 (3H, s), 2.04 (3H, s).
　本発明化合物１２４：1H-NMR (CDCl3) δ: 7.53 (2H, d), 7.08 (2H, d), 5.19 (2H, s), 2.52 (3H, s), 2.38 (3H, s), 2.17 (3H, s), 2.09 (3H, s).
　本発明化合物１２５：1H-NMR (CDCl3) δ: 7.40 (1H, t), 6.33-6.33 (2H, m), 4.64 (2H, s), 4.50 (2H, s), 2.49 (3H, s), 2.36-2.36 (3H, m), 2.10 (3H, s), 2.06 (3H, s).
　本発明化合物１２６：1H-NMR (CDCl3) δ: 7.30-7.28 (1H, m), 6.94-6.93 (1H, m), 4.71 (2H, s), 4.69 (2H, s), 2.50 (3H, s), 2.38 (3H, s), 2.15 (3H, s), 2.08 (3H, s).
　本発明化合物１２７：1H-NMR (CDCl3) δ: 7.23 (2H, d), 7.14 (2H, d), 6.96 (2H, d), 6.88 (2H, d), 4.32 (1H, q), 2.52 (3H, s), 2.34 (3H, s), 2.05 (3H, s), 1.98 (3H, s), 1.65 (3H, d).
　本発明化合物１２８：1H-NMR (CDCl3) δ: 7.66 (2H, d), 7.38 (2H, d), 7.27 (1H, s), 7.20 (1H, s), 2.54 (3H, s), 2.38 (3H, s), 2.21 (3H, s), 2.09 (3H, s), 2.08 (3H, s).
　本発明化合物１５１：1H-NMR (CDCl3) δ: 7.20-7.07 (3H, m), 6.95-6.93 (1H, m), 5.12 (2H, s), 2.52 (3H, s), 2.38 (3H, s), 2.16 (3H, s), 2.09 (3H, s).
　本発明化合物１５２：1H-NMR (CDCl3) δ: 7.52-7.50 (1H, m), 7.24-7.22 (1H, m), 7.14-7.12 (1H, m), 6.84-6.80 (1H, m), 5.23 (2H, s), 2.51 (3H, s), 2.38 (3H, s), 2.24 (3H, s), 2.09 (3H, s).
　本発明化合物１５４：1H-NMR (CDCl3) δ: 7.64 (1H, d), 7.41 (1H, t), 7.17-7.10 (3H, m), 6.94-6.87 (3H, m), 4.15 (2H, s), 2.52 (3H, s), 2.35 (3H, s), 2.07 (3H, s), 2.00 (3H, s).
　本発明化合物１５９：1H-NMR (CDCl3) δ: 7.01-6.98 (2H, m), 6.92-6.88 (2H, m), 5.10 (2H, s), 2.51 (3H, s), 2.37 (3H, s), 2.16 (3H, s), 2.08 (3H, s), 1.87-1.81 (1H, m), 0.91-0.86 (2H, m), 0.63-0.59 (2H, m).
　本発明化合物１６６：1H-NMR (CDCl3) δ: 7.60 (2H, d), 7.49 (2H, d), 5.24 (2H, s), 2.50 (3H, s), 2.36 (3H, s), 2.30 (3H, s), 2.07 (3H, s), 2.02 (3H, s).
　本発明化合物１６７：1H-NMR (CDCl3) δ: 7.55 (2H, d), 7.36 (2H, d), 4.37 (2H, dd), 3.07 (2H, dd), 2.50 (3H, s), 2.38 (3H, s), 2.22 (3H, s), 2.16 (3H, s), 2.08 (3H, s).
　本発明化合物１６８：1H-NMR (CDCl3) δ: 7.41 (2H, d), 7.19 (2H, d), 5.18 (2H, s), 2.49 (3H, s), 2.36 (3H, s), 2.28 (3H, s), 2.07 (3H, s), 2.02 (3H, s).
　本発明化合物１７１：1H-NMR (CDCl3) δ: 7.64 (2H d), 7.52 (2H, d), 5.72 (1H, dd), 4.05 (1H, dd), 3.60 (1H, dd), 2.46 (3H, s), 2.42 (3H, s), 2.40 (3H, s), 2.10 (3H, s).
　本発明化合物１７６：1H-NMR (CDCl3) δ: 7.30-7.26 (2H, m), 7.20-7.17 (3H, m), 7.09 (2H, d), 6.93 (2H, d), 5.10 (2H, s), 3.92 (2H, s), 2.51 (3H, s), 2.37 (3H, s), 2.16 (3H, s), 2.08 (3H, s).
　本発明化合物１７７：1H-NMR (CDCl3) δ: 7.54 (2H, d), 7.04-6.97 (6H, m), 5.14 (2H, s), 2.52 (3H, s), 2.39 (3H, s), 2.20 (3H, s), 2.10 (3H, s).
Figure JPOXMLDOC01-appb-T000077
Figure JPOXMLDOC01-appb-I000078

Figure JPOXMLDOC01-appb-I000079

Figure JPOXMLDOC01-appb-I000080

The present compound 17: 1 H-NMR (CDCl 3 ) δ: 7.30-7.23 (2H, m), 7.19-7.13 (3H, m), 2.73 (2H, t), 2.59 (2H, t), 2.46 (3H , s), 2.36 (3H, s), 2.05 (3H, s), 2.03 (3H, s), 1.68-1.56 (4H, m), 1.46-1.33 (4H, m).
The present compound 18: 1 H-NMR (CDCl 3 ) δ: 7.31-7.16 (5H, m), 3.09-2.93 (4H, m), 2.51 (3H, s), 2.36 (3H, s), 2.06 (3H) , s), 1.98 (3H, s).
The present compound 19: 1 H-NMR (CDCl 3 ) δ: 8.32 (1H, s), 7.26 (2H, d), 7.14 (2H, d), 4.43 (2H, t), 3.04 (2H, t), 2.53 (3H, s), 2.39 (3H, s), 2.25 (3H, s), 2.10 (3H, s).
The present compound 20: 1 H-NMR (CDCl 3 ) δ: 8.32 (1 H, s), 7.55 (2 H, d), 7. 36 (2 H, d), 4. 45 (2 H, t), 3. 10 (2 H, t), 2.53 (3H, s), 2.39 (3H, s), 2.24 (3H, s), 2.10 (3H, s).
The present compound 21: 1 H-NMR (CDCl 3 ) δ: 7.91-7.86 (2H, m), 7.83-7.76 (1H, m), 4.74 (2H, s), 3.64 (2H, t), 2.88 (2H) , t), 2.45 (3 H, s), 2. 37 (3 H, s), 2. 11-2.00 (8 H, m).
Invention compound 22: 1 H-NMR (CDCl 3 ) δ: 7.23-7.17 (2H, m), 7.15-7.09 (2H, m), 4.67 (2H, s), 3.42 (1H, m), 2.58-2.46 (4H, m), 2.38 (3H, s), 2.25-2.16 (5H, m), 2.07 (3H, s), 1.98-1.88 (2H, m), 1.53-1.36 (4H, m).
The present compound 97: 1 H-NMR (CDCl 3 ) δ: 8.32 (1 H, s), 8. 29 (1 H, m), 7.82 (1 H, m), 4.66-4. 61 (2 H, m), 4.57 (1 H, m) ), 2.51 (3H, s), 2.38 (3H, s), 2.26 (3H, s), 2.09 (3H, s), 1.86 (2H, m), 1.06 (3H, t).
Invention compound 98: 1 H-NMR (CDCl 3 ) δ: 8.00 (2H, d), 7.31 (2H, d), 4.24 (2H, s), 2.53 (3H, s), 2.35 (3H, s), 2.08 (3H, s), 1.98 (3H, s).
Invention compound 99: 1 H-NMR (CDCl 3 ) δ: 8.39 (1H, s), 7.61 (2H, d), 7.51 (2H, d), 5.30 (2H, s), 2.52 (3H, s), 2.37 (3H, s), 2.20 (3H, s), 2.09 (3H, s).
The present compound 100: 1 H-NMR (CDCl 3 ) δ: 8.33 (1H, s), 7.34 (2H, d), 7.17 (2H, d), 5.13 (1H, dd), 2.49 (3H, s), 2.35 (3H, s), 2.10 (3H, s), 2.07 (3H, s), 2.02 (1H, m), 1.86 (1H, m), 0.95 (3H, t).
The present compound 101: 1 H-NMR (CDCl 3 ) δ: 8.28 (0.5 H, s), 8. 27 (0.5 H, s), 7.41 (1 H, s), 7. 36 (1 H, s), 7.34 (1 H, s) ), 4.83-4.74 (1H, m), 4.61 (0.5 H, m), 4.51 (0.5 H, m), 2.52 (1.5 H, s), 2.52 (1.5 H, s), 2. 39 (1.5 H, s) , 2.38 (1.5 H, s), 2. 27 (1.5 H, s), 2.22 (1.5 H, s), 2. 10 (1.5 H, s), 2. 10 (1.5 H, s), 1.42 (1.5 H, d), 1. 38 (1.5 H, d), 1.36 (1.5 H, d), 1. 35 (1.5 H, d).
The present compound 102: 1 H-NMR (CDCl 3 ) δ: 7.53 (2H, d), 7.18 (2H, d), 7.00 (2H, d), 6.93 (2H, d), 4.16 (2H, s), 2.52 (3H, s), 2.36 (3H, s), 2.07 (3H, s), 2.02 (3H, s).
Invention compound 103: 1 H-NMR (CDCl 3 ) δ: 7.16-7.14 (4H, m), 6.96-6.94 (2H, m), 6.90-6.88 (2H, m), 4.15 (2H, s), 2.52 (3H, s), 2.35 (3H, s), 2.07 (3H, s), 2.01 (3H, s).
Invention compound 104: 1 H-NMR (CDCl 3 ) δ: 8.44 (1 H, s), 7.87 (1 H, dd), 7.22 (2 H, d), 7.02 (2 H, d), 6.95 (1 H, d), 4.18 (2H, s), 2.52 (3H, s), 2.36 (3H, s), 2.07 (3H, s), 2.03 (3H, s).
The present compound 105: 1 H-NMR (CDCl 3 ) δ: 7.72-7.63 (4H, m), 7.48 (2H, d), 7.26 (2H, d), 4.22 (2H, s), 2.53 (3H, s) ), 2.35 (3H, s), 2.08 (3H, s), 2.02 (3H, s).
The present compound 106: 1 H-NMR (CDCl 3 ) δ: 7.73 (1H, s), 7.67 (1H, s), 5.41 (2H, s), 2.50 (3H, s), 2.37 (3H, s), 2.11 (3H, s), 2.08 (3H, s).
The present compound 107: 1 H-NMR (CDCl 3 ) δ: 7.36 (2H, d), 6.89 (2H, d), 5.11 (2H, s), 2.51 (3H, s), 2.38 (3H, s), 2.16 (3H, s), 2.09 (3H, s).
Invention compound 108: 1 H-NMR (CDCl 3 ) δ: 7.57 (2H, d), 7.08 (2H, d), 5.20 (2H, s), 2.52 (3H, s), 2.38 (3H, s) , 2.16 (3H, s), 2.10 (3H, s).
Invention compound 109: 1 H-NMR (CDCl 3 ) δ: 7.41 (1 H, s), 7. 38-7. 21 (5 H, m), 4.58 (2 H, s), 2. 88 (3 H, s), 2.50 (3 H, s) ), 2.38 (3H, s), 2.29 (3H, s), 2.07 (3H, s).
The present compound 110: 1 H-NMR (CDCl 3 ) δ: 7.98 (2H, d), 7.03 (2H, d), 5.19 (2H, s), 3.87 (3H, s), 2.52 (3H, s), 2.38 (3H, s), 2.17 (3H, s), 2.09 (3H, s).
Invention compound 111: 1 H-NMR (CDCl 3 ) δ: 8.19 (2H, d), 7.09 (2H, d), 5.25 (2H, s), 2.52 (3H, s), 2.39 (3H, s), 2.17 (3H, s), 2.10 (3H, s).
Invention compound 112: 1 H-NMR (CDCl 3 ) δ: 8.13 (1H, s), 7.67 (2H, d), 7.61 (2H, d), 5.34 (2H, s), 2.53 (3H, s), 2.38 (3H, s), 2.22 (3H, s), 2.09 (3H, s).
Invention compound 113: 1 H-NMR (CDCl 3 ) δ: 7.33 (2H, d), 7.27 (2H, d), 4.22 (2H, s), 2.44 (3H, s), 2.36 (3H, s), 2.08 (3H, s), 2.05 (3H, s), 1.30 (9H, s).
Invention compound 114: 1 H-NMR (CDCl 3 ) δ: 7.32 (2H, d), 7.29 (2H, d), 3.75 (2H, s), 3.72 (2H, s), 2.49 (3H, s), 2.36 (3H, s), 2.06 (3H, s), 2.05 (3H, s), 1.31 (9H, s).
Invention compound 115: 1 H-NMR (CDCl 3 ) δ: 6.86-6.85 (1H, m), 6.80-6.79 (1H, m), 6.15-6.13 (1H, m), 5.27 (2H, s), 2.49 (3H, s), 2.36 (3H, s), 2.08 (3H, s), 2.07 (3H, s).
Invention compound 116: 1 H-NMR (CDCl 3 ) δ: 8.37 (1 H, s), 7.43 (2 H, d), 7. 20 (2 H, d), 5. 24 (2 H, s), 2.52 (3 H, s), 2.38 (3H, s), 2.20 (3H, s), 2.09 (3H, s).
Invention compound 117: 1 H-NMR (CDCl 3 ) δ: 8.39 (1H, s), 7.64 (2H, d), 7.45 (2H, d), 5.28 (2H, s), 2.52 (3H, s), 2.38 (3H, s), 2.19 (3H, s), 2.09 (3H, s).
Invention compound 118: 1 H-NMR (CDCl 3 ) δ: 7.42-7.38 (1 H, m), 7.31-7. 29 (1 H, m), 7.21-7. 20 (1 H, m), 7. 17-7. 14 (2 H, m) , 7.12-7.09 (1H, m), 6.93-6.89 (2H, m), 4.17 (2H, s), 2.52 (3H, s), 2.36 (3H, s), 2.07 (3H, s), 2.01 (3H) , s).
The present compound 119: 1 H-NMR (CDCl 3 ) δ: 7.25 (2H, dd), 6.96 (2H, t), 3.69 (2H, s), 3.48 (2H, s), 2.48 (3H, s), 2.37 (3H, s), 2.15 (3H, s), 2.14 (3H, s), 2.06 (3H, s).
The present compound 120: 1 H-NMR (CDCl 3 ) δ: 7.74 (1H, d), 7.32-7.31 (1H, m), 4.88 (2H, s), 4.78 (2H, s), 2.50 (3H, s) ), 2.37-2.37 (3H, m), 2.17 (3H, s), 2.08 (3H, s).
Invention compound 121: 1 H-NMR (CDCl 3 ) δ: 4.71-4.63 (2H, m), 4.08-4.02 (1H, m), 3.88-3.83 (1H, m), 3.77-3.72 (1H, m) , 3.49-3.47 (2H, m), 2.49 (3H, s), 2.37-2.37 (3H, m), 2.17 (3H, s), 2.07 (3H, s), 1.96-1.80 (3H, m), 1.63 -1.54 (1 H, m).
Invention compound 122: 1 H-NMR (CDCl 3 ) δ: 8.21 (1H, d), 7.77 (1H, d), 7.47-7.35 (4H, m), 7.01 (1H, d), 5.33 (2H, s) ), 2.54 (3H, s), 2.36 (3H, s), 2.22 (3H, s), 2.11 (3H, s).
Invention compound 123: 1 H-NMR (CDCl 3 ) δ: 7.23 (2H, t), 6.87-6.85 (2H, m), 6.72 (1H, t), 4.52 (2H, s), 2.84 (3H, s) ), 2.48 (3H, s), 2.34-2.34 (3H, m), 2.06 (3H, s), 2.04 (3H, s).
The present compound 124: 1 H-NMR (CDCl 3 ) δ: 7.53 (2H, d), 7.08 (2H, d), 5.19 (2H, s), 2.52 (3H, s), 2.38 (3H, s), 2.17 (3H, s), 2.09 (3H, s).
Invention compound 125: 1 H-NMR (CDCl 3 ) δ: 7.40 (1 H, t), 6.33 to 6.33 (2 H, m), 4. 64 (2 H, s), 4.50 (2 H, s), 2. 49 (3 H, s) ), 2.36-2.36 (3H, m), 2.10 (3H, s), 2.06 (3H, s).
Invention compound 126: 1 H-NMR (CDCl 3 ) δ: 7.30-7.28 (1 H, m), 6.94-6. 93 (1 H, m), 4.71 (2 H, s), 4. 69 (2 H, s), 2.50 (3 H , s), 2.38 (3H, s), 2.15 (3H, s), 2.08 (3H, s).
Invention compound 127: 1 H-NMR (CDCl 3 ) δ: 7.23 (2H, d), 7.14 (2H, d), 6.96 (2H, d), 6.88 (2H, d), 4.32 (1H, q), 2.52 (3H, s), 2.34 (3H, s), 2.05 (3H, s), 1.98 (3H, s), 1.65 (3H, d).
Invention compound 128: 1 H-NMR (CDCl 3 ) δ: 7.66 (2H, d), 7.38 (2H, d), 7.27 (1H, s), 7.20 (1H, s), 2.54 (3H, s), 2.38 (3H, s), 2.21 (3H, s), 2.09 (3H, s), 2.08 (3H, s).
Invention compound 151: 1 H-NMR (CDCl 3 ) δ: 7.20-7.07 (3H, m), 6.95-6.93 (1H, m), 5.12 (2H, s), 2.52 (3H, s), 2.38 (3H) , s), 2.16 (3H, s), 2.09 (3H, s).
Invention compound 152: 1 H-NMR (CDCl 3 ) δ: 7.52-7.50 (1H, m), 7.24-7.22 (1H, m), 7.14-7.12 (1H, m), 6.84-6.80 (1H, m) , 5.23 (2H, s), 2.51 (3H, s), 2.38 (3H, s), 2.24 (3H, s), 2.09 (3H, s).
The present compound 154: 1 H-NMR (CDCl 3 ) δ: 7.64 (1H, d), 7.41 (1H, t), 7.17-7.10 (3H, m), 6.94-6.87 (3H, m), 4.15 (2H) , s), 2.52 (3H, s), 2.35 (3H, s), 2.07 (3H, s), 2.00 (3H, s).
Invention compound 159: 1 H-NMR (CDCl 3 ) δ: 7.01 to 6.98 (2H, m), 6.92-6.88 (2H, m), 5.10 (2H, s), 2.51 (3H, s), 2.37 (3H) , s), 2.16 (3H, s), 2.08 (3H, s), 1.87-1.81 (1H, m), 0.91-0.86 (2H, m), 0.63-0.59 (2H, m).
Invention compound 166: 1 H-NMR (CDCl 3 ) δ: 7.60 (2H, d), 7.49 (2H, d), 5.24 (2H, s), 2.50 (3H, s), 2.36 (3H, s), 2.30 (3H, s), 2.07 (3H, s), 2.02 (3H, s).
Invention compound 167: 1 H-NMR (CDCl 3 ) δ: 7.55 (2H, d), 7.36 (2H, d), 4.37 (2H, dd), 3.07 (2H, dd), 2.50 (3H, s), 2.38 (3H, s), 2.22 (3H, s), 2.16 (3H, s), 2.08 (3H, s).
Invention compound 168: 1 H-NMR (CDCl 3 ) δ: 7.41 (2H, d), 7.19 (2H, d), 5.18 (2H, s), 2.49 (3H, s), 2.36 (3H, s), 2.28 (3H, s), 2.07 (3H, s), 2.02 (3H, s).
Invention compound 171: 1 H-NMR (CDCl 3 ) δ: 7.54 (2H d), 7.52 (2H, d), 5.72 (1 H, dd), 4.05 (1 H, dd), 3.60 (1 H, dd), 2.46 (3H, s), 2.42 (3H, s), 2.40 (3H, s), 2.10 (3H, s).
Invention compound 176: 1 H-NMR (CDCl 3 ) δ: 7.30-7.26 (2H, m), 7.20-7.17 (3H, m), 7.09 (2H, d), 6.93 (2H, d), 5.10 (2H) , s), 3.92 (2H, s), 2.51 (3H, s), 2.37 (3H, s), 2.16 (3H, s), 2.08 (3H, s).
The present compound 177: 1 H-NMR (CDCl 3 ) δ: 7.54 (2H, d), 7.04-6.97 (6H, m), 5.14 (2H, s), 2.52 (3H, s), 2.39 (3H, s) ), 2.20 (3H, s), 2.10 (3H, s).
製造例２３
　本発明化合物２に代えて本発明化合物１２８を用い、製造例１７に記載の方法に準じて、下式で示される本発明化合物１２９を得た。
Figure JPOXMLDOC01-appb-C000081
 　本発明化合物１２９：1H-NMR (CDCl3) δ: 7.64 (2H, d), 7.35 (2H, d), 6.96 (1H, s), 4.18 (2H, s), 2.50 (3H, s), 2.37 (3H, s), 2.11 (3H, s), 2.07 (3H, s). Production Example 23
The present compound 129 represented by the following formula was obtained according to the method described in Production Example 17 using the present compound 128 in place of the present compound 2.
Figure JPOXMLDOC01-appb-C000081
 Invention compound 129: 1 H-NMR (CDCl 3 ) δ: 7.64 (2H, d), 7.35 (2H, d), 6.96 (1H, s), 4.18 (2H, s), 2.50 (3H, s), 2.37 (3H, s), 2.11 (3H, s), 2.07 (3H, s).
製造例２４
　０．１８ｇの本発明化合物１４、クロロホルム２０ｍＬ及びトリエチルアミン０．１８ｍＬの混合物に、氷冷下でクロロ炭酸メチル０．１０ｍＬを加え、室温で２時間半撹拌した。得られた混合物に、飽和炭酸水素ナトリウム水溶液を加え、クロロホルムで抽出した。得られた有機層を硫酸マグネシウムで乾燥し、減圧下で濃縮した。得られた残渣をシリカゲルクロマトグラフィー（ヘキサン：酢酸エチル＝８０：２０）に付し、次式で示される本発明化合物２３を０．２１ｇ得た。
Figure JPOXMLDOC01-appb-C000082
 　本発明化合物２３：1H-NMR (CDCl3) δ: 7.90-7.85 (2H, m), 7.82-7.78 (1H, m), 4.74 (2H, s), 3.93 (3H, s), 3.64 (2H, t), 2.89 (2H, t), 2.46 (3H, s), 2.13 (3H, s), 2.12-2.01 (5H, m). Production Example 24
To a mixture of 0.18 g of the compound of the present invention 14, 20 mL of chloroform and 0.18 mL of triethylamine was added 0.10 mL of methyl chlorocarbonate under ice-cooling, and the mixture was stirred at room temperature for 2 and a half hours. To the resulting mixture was added saturated aqueous sodium hydrogen carbonate solution, and the mixture was extracted with chloroform. The resulting organic layer was dried over magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography (hexane: ethyl acetate = 80: 20) to obtain 0.21 g of the present compound 23 represented by the following formula.
Figure JPOXMLDOC01-appb-C000082
 Invention compound 23: 1 H-NMR (CDCl 3 ) δ: 7.90-7.85 (2H, m), 7.82-7.78 (1H, m), 4.74 (2H, s), 3.93 (3H, s), 3.64 (2H) , t), 2.89 (2H, t), 2.46 (3H, s), 2.13 (3H, s), 2.12-2.01 (5H, m).
　製造例２５
　製造例２４に記載の方法に準じて製造した化合物及びその物性値を以下に示す。
式（Ａ－７）
Figure JPOXMLDOC01-appb-C000083
 で示される化合物において、Ｒ1xが［表９］に記載のいずれかの化合物。 Production Example 25
The compounds produced according to the method described in Production Example 24 and the physical properties thereof are shown below.
Formula (A-7)
Figure JPOXMLDOC01-appb-C000083
 In the compounds represented by the above, R 1x is any compound described in [Table 9].
Figure JPOXMLDOC01-appb-T000084
　本発明化合物２４：1H-NMR (CDCl3) δ: 7.22-7.17 (2H, m), 7.15-7.09 (2H, m), 4.67 (2H, s), 3.94 (3H, s), 3.44 (1H, m), 2.57-2.45 (4H, m), 2.26-2.17 (5H, m), 2.13 (3H, s), 1.97-1.87 (2H, m), 1.54-1.36 (4H, m).
　本発明化合物１３１：1H-NMR (CDCl3) δ: 8.34 (0.5H, s), 8.31 (0.5H, s), 6.91 (0.5H, s), 6.90 (0.5H, s), 4.51-4.37 (2H, m), 3.94 (1.5H, s), 3.94 (1.5H, s), 2.52 (1.5H, s), 2.52 (1.5H, s), 2.32 (1.5H, s), 2.31 (1.5H, s), 2.15 (1.5H, s), 2.15 (1.5H, s), 1.39 (1.5H, d), 1.34 (1.5H, d), 1.27 (1.5H, d), 1.24 (1.5H, d).
　本発明化合物１３２：1H-NMR (CDCl3) δ: 7.54 (2H, d), 7.17 (2H, d), 7.00 (2H, d), 6.93 (2H, d), 4.17 (2H, s), 3.92 (3H, s), 2.53 (3H, s), 2.13 (3H, s), 2.07 (3H, s).
　本発明化合物１３３：1H-NMR (CDCl3) δ: 7.16-7.14 (4H, m), 6.97-6.94 (2H, m), 6.91-6.89 (2H, m), 4.15 (2H, s), 3.92 (3H, s), 2.52 (3H, s), 2.12 (3H, s), 2.06 (3H, s).
　本発明化合物１３４：1H-NMR (CDCl3) δ: 8.44 (1H, s), 7.87 (1H, dd), 7.23 (2H, d), 7.03 (2H, d), 6.96 (1H, d), 4.19 (2H, s), 3.92 (3H, s), 2.52 (3H, s), 2.12 (3H, s), 2.09 (3H, s).
　本発明化合物１３５：1H-NMR (CDCl3) δ: 7.33-7.28 (2H, m), 7.12 (2H, d), 7.06 (1H, t), 6.98-6.95 (2H, m), 6.91-6.88 (2H, m), 4.14 (2H, s), 3.92 (3H, s), 2.52 (3H, s), 2.12 (3H, s), 2.06 (3H, s).
　本発明化合物１３６：1H-NMR (CDCl3) δ: 7.72-7.63 (4H, m), 7.48 (2H, d), 7.27 (2H, d), 4.22 (2H, s), 3.92 (3H, s), 2.54 (3H, s), 2.13 (3H, s), 2.07 (3H, s).
　本発明化合物１３７：1H-NMR (CDCl3) δ: 7.51 (2H, d), 7.26 (2H, d), 7.10 (2H, d), 7.04 (2H, d), 4.13 (2H, s), 3.97 (2H, s), 3.91 (3H, s), 2.54 (3H, s), 2.11 (3H, s), 2.04 (3H, s).
Figure JPOXMLDOC01-appb-T000084
The present compound 24: 1 H-NMR (CDCl 3 ) δ: 7.22-7.17 (2H, m), 7.15-7.09 (2H, m), 4.67 (2H, s), 3.94 (3H, s), 3.44 (1H , m), 2.57-2.45 (4H, m), 2.26-2.17 (5H, m), 2.13 (3H, s), 1.97-1.87 (2H, m), 1.54-1.36 (4H, m).
Invention compound 131: 1 H-NMR (CDCl 3 ) δ: 8.34 (0.5 H, s), 8.31 (0.5 H, s), 6.91 (0.5 H, s), 6.90 (0.5 H, s), 4.51-4. 37 (2H, m), 3.94 (1.5 H, s), 3.94 (1.5 H, s), 2.52 (1.5 H, s), 2.52 (1.5 H, s), 2.32 (1.5 H, s), 2.31 (1.5 H) , s), 2.15 (1.5H, s), 2.15 (1.5H, s), 1.39 (1.5H, d), 1.34 (1.5H, d), 1.27 (1.5H, d), 1.24 (1.5H, d) ).
The present compound 132: 1 H-NMR (CDCl 3 ) δ: 7.54 (2H, d), 7.17 (2H, d), 7.00 (2H, d), 6.93 (2H, d), 4.17 (2H, s), 3.92 (3H, s), 2.53 (3H, s), 2.13 (3H, s), 2.07 (3H, s).
Invention compound 133: 1 H-NMR (CDCl 3 ) δ: 7.16-7.14 (4H, m), 6.97-6.94 (2H, m), 6.91-6.89 (2H, m), 4.15 (2H, s), 3.92 (3H, s), 2.52 (3H, s), 2.12 (3H, s), 2.06 (3H, s).
Invention compound 134: 1 H-NMR (CDCl 3 ) δ: 8.44 (1H, s), 7.87 (1H, dd), 7.23 (2H, d), 7.03 (2H, d), 6.96 (1H, d), 4.19 (2H, s), 3.92 (3H, s), 2.52 (3H, s), 2.12 (3H, s), 2.09 (3H, s).
Invention compound 135: 1 H-NMR (CDCl 3 ) δ: 7.33-7.28 (2H, m), 7.12 (2H, d), 7.06 (1H, t), 6.98-6.95 (2H, m), 6.91-6.88 (2H, m), 4.14 (2H, s), 3.92 (3H, s), 2.52 (3H, s), 2.12 (3H, s), 2.06 (3H, s).
The present compound 136: 1 H-NMR (CDCl 3 ) δ: 7.7-7.63 (4H, m), 7.48 (2H, d), 7.27 (2H, d), 4.22 (2H, s), 3.92 (3H, s) ), 2.54 (3H, s), 2.13 (3H, s), 2.07 (3H, s).
Invention compound 137: 1 H-NMR (CDCl 3 ) δ: 7.51 (2H, d), 7.26 (2H, d), 7.10 (2H, d), 7.04 (2H, d), 4.13 (2H, s), 3.97 (2H, s), 3.91 (3H, s), 2.54 (3H, s), 2.11 (3H, s), 2.04 (3H, s).
製造例２６
　参考製造例６に記載の方法に準じて製造した化合物及びその物性値を以下に示す。
式（Ａ－８）
Figure JPOXMLDOC01-appb-C000085
 で示される化合物において、Ｒ1xが［表１０］に記載のいずれかの化合物。 Production Example 26
The compounds produced according to the method described in Reference Production Example 6 and the physical properties thereof are shown below.
Formula (A-8)
Figure JPOXMLDOC01-appb-C000085
 In the compounds represented by the above, R 1x is any compound described in [Table 10].
Figure JPOXMLDOC01-appb-T000086
　本発明化合物１３９：1H-NMR (CDCl3) δ: 8.14 (1H, s), 7.63 (2H, d), 7.60 (2H, d), 5.60 (2H, s), 2.54 (3H, s), 2.40 (3H, s), 2.33 (3H, s), 2.14 (3H, s).
　本発明化合物１４０：1H-NMR (CDCl3) δ: 7.68 (2H, t), 7.06 (2H, t), 4.71 (1H, d), 4.58 (1H, d), 4.79 (1H, d), 4.40 (1H, d), 3.19 (3H, s), 2.55 (3H, s), 2.38 (3H, s), 2.17 (3H, s), 2.11 (3H, s).
Figure JPOXMLDOC01-appb-T000086
Invention compound 139: 1 H-NMR (CDCl 3 ) δ: 8.14 (1H, s), 7.63 (2H, d), 7.60 (2H, d), 5.60 (2H, s), 2.54 (3H, s), 2.40 (3H, s), 2.33 (3H, s), 2.14 (3H, s).
The present compound 140: 1 H-NMR (CDCl 3 ) δ: 7.68 (2H, t), 7.06 (2H, t), 4.71 (1H, d), 4.58 (1H, d), 4.79 (1H, d), 4.40 (1H, d), 3.19 (3H, s), 2.55 (3H, s), 2.38 (3H, s), 2.17 (3H, s), 2.11 (3H, s).
製造例２７
　０．１０ｇの本発明化合物７５、クロロホルム５ｍＬ及びトリエチルアミン０．２２ｍＬの混合物に、氷冷下でペンタン酸クロリド０．１９ｍＬを加え、室温で３０分間撹拌した。得られた混合物に飽和炭酸水素ナトリウム水溶液を加え、クロロホルムで抽出した。得られた有機層を硫酸マグネシウムで乾燥し、減圧下で濃縮した。得られた残渣をシリカゲルクロマトグラフィー（ヘキサン：酢酸エチル＝８０：２０）に付し、次式で示される本発明化合物１４１を０．１３ｇ得た。
Figure JPOXMLDOC01-appb-C000087
 　本発明化合物１４１：1H-NMR (CDCl3) δ: 7.35 (2H, d), 6.89 (2H, d), 5.11 (2H, s), 2.64 (2H, t), 2.51 (3H, s), 2.14 (3H, s), 2.08 (3H, s), 1.83-1.74 (2H, m), 1.52-1.42 (2H, m), 0.99 (3H, t). Production Example 27
Under ice-cooling, 0.19 mL of pentanoic acid chloride was added to a mixture of 0.10 g of the compound of the present invention 75, 5 mL of chloroform and 0.22 mL of triethylamine, and the mixture was stirred at room temperature for 30 minutes. To the resulting mixture was added saturated aqueous sodium hydrogen carbonate solution, and the mixture was extracted with chloroform. The resulting organic layer was dried over magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography (hexane: ethyl acetate = 80: 20) to obtain 0.13 g of the present compound 141 represented by the following formula.
Figure JPOXMLDOC01-appb-C000087
 Present invention compound 141: 1 H-NMR (CDCl 3 ) δ: 7.35 (2H, d), 6.89 (2H, d), 5.11 (2H, s), 2.64 (2H, t), 2.51 (3H, s), 2.14 (3H, s), 2.08 (3H, s), 1.83-1.74 (2H, m), 1.52-1. 42 (2H, m), 0.99 (3H, t).
製造例２８
　製造例２７に記載の方法に準じて製造した化合物及びその物性値を以下に示す。
式（Ａ－２）で示される化合物において、Ｒ1x及びＲ２xが［表１１］に記載のいずれかの組み合わせである化合物。 Production Example 28
The compounds produced according to the method described in Production Example 27 and the physical properties thereof are shown below.
In the compound represented by the formula (A-2), compounds wherein R 1x and R 2x are any combination of those described in [Table 11].
Figure JPOXMLDOC01-appb-T000088
　本発明化合物１４２：1H-NMR (CDCl3) δ: 7.57 (2H, d), 7.07 (2H, d), 5.19 (2H, s), 2.51 (3H, s), 2.16 (3H, s), 2.09 (3H, s), 1.97-1.88 (1H, m), 1.24-1.17 (2H, m), 1.11-1.06 (2H, m).
　本発明化合物１４３：1H-NMR (CDCl3) δ: 8.12 (1H, s), 7.67 (2H, d), 7.61 (2H, d), 5.34 (2H, s), 2.91 (1H, m), 2.53 (3H, s), 2.20 (3H, s), 2.07 (3H, s), 1.38 (6H, d).
　本発明化合物１４４：1H-NMR (CDCl3) δ: 8.32 (1H, s), 8.29 (1H, s), 7.82 (1H, d), 4.68-4.53 (3H, m), 2.68 (2H, q), 2.51 (3H, s), 2.25 (3H, s), 2.08 (3H, s), 1.94-1.77 (2H, m), 1.33 (3H, t), 1.06 (3H, t).
　本発明化合物１４５：1H-NMR (CDCl3) δ: 8.32 (1H, s), 8.29 (1H, s), 7.82 (1H, d), 4.68-4.53 (3H, m), 2.63 (2H, t), 2.51 (3H, s), 2.25 (3H, s), 2.08 (3H, s), 1.94-1.77 (4H, m), 1.08 (3H, t), 1.06 (3H, t).
Figure JPOXMLDOC01-appb-T000088
Invention compound 142: 1 H-NMR (CDCl 3 ) δ: 7.57 (2H, d), 7.07 (2H, d), 5.19 (2H, s), 2.51 (3H, s), 2.16 (3H, s), 2.09 (3H, s), 1.97-1.88 (1H, m), 1.24-1.17 (2H, m), 1.11-1.06 (2H, m).
Invention compound 143: 1 H-NMR (CDCl 3 ) δ: 8.12 (1H, s), 7.67 (2H, d), 7.61 (2H, d), 5.34 (2H, s), 2.91 (1H, m), 2.53 (3H, s), 2.20 (3H, s), 2.07 (3H, s), 1.38 (6H, d).
The present compound 144: 1 H-NMR (CDCl 3 ) δ: 8.32 (1H, s), 8.29 (1H, s), 7.82 (1H, d), 4.68-4.53 (3H, m), 2.68 (2H, q) ), 2.51 (3H, s), 2.25 (3H, s), 2.08 (3H, s), 1.94-1.77 (2H, m), 1.33 (3H, t), 1.06 (3H, t).
The present compound 145: 1 H-NMR (CDCl 3 ) δ: 8.32 (1H, s), 8.29 (1H, s), 7.82 (1H, d), 4.68-4.53 (3H, m), 2.63 (2H, t) ), 2.51 (3H, s), 2.25 (3H, s), 2.08 (3H, s), 1.94-1.77 (4H, m), 1.08 (3H, t), 1.06 (3H, t).
製造例２９
　０．１０ｇの本発明化合物７３、アセトニトリル１０ｍＬ及び炭酸カリウム０．１８ｇの混合物に、１－ヨウ化プロピル０．２４ｇを加え、還流下で３時間撹拌した。得られた混合物に水を加え、ＭＴＢＥで抽出した。得られた有機層を硫酸マグネシウムで乾燥し、減圧下で濃縮した。得られた残渣をシリカゲルクロマトグラフィー（ヘキサン：酢酸エチル＝９０：１０）に付し、次式で示される本発明化合物１４６を０．１３ｇ得た。
Figure JPOXMLDOC01-appb-C000089
 　本発明化合物１４６：1H-NMR (CDCl3) δ: 8.34 (1H, br s), 7.36 (2H, d), 7.18 (2H, d), 5.16 (1H, t), 3.67 (2H, t), 2.45 (3H, s), 2.21 (3H, s), 2.18 (3H, s), 2.10-1.98 (1H, m), 1.90-1.77 (3H, m), 1.06 (3H, t), 0.96 (3H, t). Production Example 29
0.24 g of 1-propyl iodide was added to a mixture of 0.10 g of the compound of the present invention 73, 10 mL of acetonitrile and 0.18 g of potassium carbonate, and the mixture was stirred under reflux for 3 hours. To the resulting mixture was added water and extracted with MTBE. The resulting organic layer was dried over magnesium sulfate and concentrated under reduced pressure. The resulting residue was subjected to silica gel chromatography (hexane: ethyl acetate = 90: 10) to give 0.13 g of the present compound 146 represented by the following formula.
Figure JPOXMLDOC01-appb-C000089
 The present compound 146: 1 H-NMR (CDCl 3 ) δ: 8.34 (1H, br s), 7.36 (2H, d), 7.18 (2H, d), 5.16 (1H, t), 3.67 (2H, t) , 2.45 (3H, s), 2.21 (3H, s), 2.18 (3H, s), 2.10-1.98 (1H, m), 1. 90-1.77 (3H, m), 1.06 (3H, t), 0.96 (3H) , t).
製造例３０
　製造例２９に記載の方法に準じて製造した化合物及びその物性値を以下に示す。
式（Ａ－２）で示される化合物において、Ｒ1x及びＲ２xが［表１２］に記載のいずれかの組み合わせである化合物。 Production Example 30
The compounds produced according to the method described in Production Example 29 and the physical properties thereof are shown below.
In the compound represented by the formula (A-2), compounds wherein R 1x and R 2x are any combination of those described in [Table 12].
Figure JPOXMLDOC01-appb-T000090
　本発明化合物１４７：1H-NMR (CDCl3) δ: 8.14 (1H, s), 7.69 (2H, d), 7.61 (2H, d), 5.33 (2H, s), 3.73 (3H, s), 2.49 (3H, s), 2.34 (3H, s), 2.21 (3H, s).
　本発明化合物１４８：1H-NMR (CDCl3) δ: 7.32-7.27 (1H, m), 6.97-6.92 (1H, m), 4.74 (2H, s), 4.67 (2H, s), 4.61 (2H, s), 2.49 (3H, s), 2.31 (3H, s), 2.25 (3H, s).
　本発明化合物１５５：1H-NMR (CDCl3) δ: 7.31-7.28 (1H, m), 6.97-6.93 (1H, m), 4.74 (2H, s), 4.67 (2H, s), 4.15 (2H, q), 2.48 (3H, s), 2.28 (3H, s), 2.21 (3H, s).
　本発明化合物１５６：1H-NMR (CDCl3) δ: 7.14 (4H, d), 6.95 (2H, d), 6.89 (2H, d), 4.99 (2H, s), 4.12 (2H, s), 3.83 (2H, q), 2.49 (3H, s), 2.20 (3H, s), 2.13 (3H, s),1.25 (3H, t).
Figure JPOXMLDOC01-appb-T000090
The present compound 147: 1 H-NMR (CDCl 3 ) δ: 8.14 (1 H, s), 7.69 (2 H, d), 7.61 (2 H, d), 5.33 (2 H, s), 3.73 (3 H, s), 2.49 (3H, s), 2.34 (3H, s), 2.21 (3H, s).
Invention compound 148: 1 H-NMR (CDCl 3 ) δ: 7.32-7.27 (1H, m), 6.97-6.92 (1H, m), 4.74 (2H, s), 4.67 (2H, s), 4.61 (2H , s), 2.49 (3H, s), 2.31 (3H, s), 2.25 (3H, s).
The present compound 155: 1 H-NMR (CDCl 3 ) δ: 7.31-7.28 (1H, m), 6.97-6.93 (1H, m), 4.74 (2H, s), 4.67 (2H, s), 4.15 (2H) , q), 2.48 (3H, s), 2.28 (3H, s), 2.21 (3H, s).
Invention compound 156: 1 H-NMR (CDCl 3 ) δ: 7.14 (4H, d), 6.95 (2H, d), 6.89 (2H, d), 4.99 (2H, s), 4.12 (2H, s), 3.83 (2H, q), 2.49 (3H, s), 2.20 (3H, s), 2.13 (3H, s), 1.25 (3H, t).
製造例３１
　０．１０ｇの本発明化合物８２、クロロホルム５ｍＬ及び４－（ジメチルアミノ）ピリジン０．０１ｇの混合物に、二炭酸ジｔｅｒｔ－ブチル０．１４ｇを加え、室温で１時間撹拌した。得られた混合物に水を加え、クロロホルムで抽出した。得られた有機層を硫酸マグネシウムで乾燥し、減圧下で濃縮した。得られた残渣をシリカゲルクロマトグラフィー（ヘキサン：酢酸エチル＝８０：２０）に付し、次式で示される本発明化合物１４９を０．１１ｇ得た。
Figure JPOXMLDOC01-appb-C000091
 　本発明化合物１４９：1H-NMR (CDCl3) δ: 7.34 (2H, d), 7.28 (2H, d), 4.21 (2H, s), 2.44 (3H, s), 2.13 (3H, s), 2.10 (3H, s), 1.55 (9H, s), 1.30 (9H, s). Production Example 31
0.14 g of di-tert-butyl dicarbonate was added to a mixture of 0.10 g of the present compound 82, 5 mL of chloroform and 0.01 g of 4- (dimethylamino) pyridine, and the mixture was stirred at room temperature for 1 hour. To the resulting mixture was added water, and extracted with chloroform. The resulting organic layer was dried over magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography (hexane: ethyl acetate = 80: 20) to obtain 0.11 g of the present compound 149 represented by the following formula.
Figure JPOXMLDOC01-appb-C000091
 The present compound 149: 1 H-NMR (CDCl 3 ) δ: 7.34 (2H, d), 7.28 (2H, d), 4.21 (2H, s), 2.44 (3H, s), 2.13 (3H, s), 2.10 (3H, s), 1.55 (9H, s), 1.30 (9H, s).
　次に、実施例に記載された製造例及び本明細書に記載された製造法のいずれかに準じて製造される本発明化合物Ｘの例を以下に示す。 Next, examples of the compound of the present invention X produced according to any of the production examples described in the examples and the production methods described herein are shown below.
式（Ｌ－１）
Figure JPOXMLDOC01-appb-C000092
 で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX1と記す）。 Formula (L-1)
Figure JPOXMLDOC01-appb-C000092
 In the compound represented by the formula, R 2 is a methyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is any of the substituents described in [Table A13] to [Table A27] Compounds that are groups (hereinafter referred to as compound group SX1).
Figure JPOXMLDOC01-appb-T000093
Figure JPOXMLDOC01-appb-T000093
Figure JPOXMLDOC01-appb-T000094
Figure JPOXMLDOC01-appb-T000094
Figure JPOXMLDOC01-appb-T000095
Figure JPOXMLDOC01-appb-T000095
Figure JPOXMLDOC01-appb-T000096
Figure JPOXMLDOC01-appb-T000096
Figure JPOXMLDOC01-appb-T000097
Figure JPOXMLDOC01-appb-T000097
Figure JPOXMLDOC01-appb-T000098
Figure JPOXMLDOC01-appb-T000098
Figure JPOXMLDOC01-appb-T000099
Figure JPOXMLDOC01-appb-T000099
Figure JPOXMLDOC01-appb-T000100
Figure JPOXMLDOC01-appb-T000100
Figure JPOXMLDOC01-appb-T000101
Figure JPOXMLDOC01-appb-T000101
　式（Ｌ－１）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX2と記す）。
　式（Ｌ－１）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX3と記す）。
　式（Ｌ－１）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX4と記す）。
　式（Ｌ－１）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX5と記す）。
　式（Ｌ－１）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX6と記す）。
　式（Ｌ－１）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX7と記す）。
　式（Ｌ－１）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX8と記す）。
　式（Ｌ－１）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX9と記す）。
　式（Ｌ－１）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX10と記す）。
　式（Ｌ－１）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX11と記す）。
　式（Ｌ－１）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX12と記す）。
　式（Ｌ－１）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX13と記す）。
　式（Ｌ－１）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX14と記す）。
　式（Ｌ－１）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX15と記す）。
　式（Ｌ－１）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX16と記す）。
　式（Ｌ－１）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX17と記す）。
　式（Ｌ－１）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX18と記す）。
　式（Ｌ－１）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX19と記す）。
　式（Ｌ－１）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX20と記す）。
　式（Ｌ－１）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX21と記す）。
　式（Ｌ－１）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX22と記す）。 In the compounds represented by formula (L-1), R 2 is an ethyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX2).
In the compound represented by the formula (L-1), R 2 is a cyclopropyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX3).
In the compounds represented by formula (L-1), R 2 is a methyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX4).
In the compounds represented by formula (L-1), R 2 is an ethyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX5).
In the compound represented by the formula (L-1), R 2 is a cyclopropyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX6).
In the compound represented by the formula (L-1), R 2 is a methyl group, R 4 is a methyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX7).
In the compound represented by the formula (L-1), R 2 is an ethyl group, R 4 is a methyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX8).
In the compounds represented by formula (L-1), R 2 is a methyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX9).
In the compounds represented by formula (L-1), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX10).
In the compound represented by the formula (L-1), R 2 is a cyclopropyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX11).
In the compounds represented by formula (L-1), R 2 is a methyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX12).
In the compounds represented by formula (L-1), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX13).
In the compound represented by the formula (L-1), R 2 is a cyclopropyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is [Table A 13] to [Table A 27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX14).
In the compound represented by the formula (L-1), R 2 is a methyl group, R 4 is an ethyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX15).
In the compound represented by the formula (L-1), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX16).
In the compound represented by the formula (L-1), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is a methyl group, and R A is [Table A 13] to [Table A 27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX17).
In the compound represented by the formula (L-1), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is a methyl group, and R A is [Table A 13] to [Table A 27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX18).
In the compound represented by the formula (L-1), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is an ethyl group, and R A is [Table A 13] to [Table A 27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX19).
In the compound represented by the formula (L-1), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX20).
In the compound represented by the formula (L-1), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is a cyclopropyl group, and R A is a group represented by [Table A13] to [Table A27] ] The compound which is any one of the substituents as described in the following (hereinafter referred to as compound group SX21).
In the compound represented by the formula (L-1), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is a cyclopropyl group, and R A is a group represented by [Table A13] to [Table A27] ] The compound which is a substituent in any one of-(It is hereafter described as compound group SX22.).
式（Ｌ－２）
Figure JPOXMLDOC01-appb-C000102
 で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX23と記す）。
　式（Ｌ－２）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX24と記す）。
　式（Ｌ－２）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX25と記す）。
　式（Ｌ－２）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX26と記す）。
　式（Ｌ－２）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX27と記す）。
　式（Ｌ－２）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX28と記す）。
　式（Ｌ－２）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX29と記す）。
　式（Ｌ－２）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX30と記す）。
　式（Ｌ－２）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX31と記す）。
　式（Ｌ－２）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX32と記す）。
　式（Ｌ－２）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX33と記す）。
　式（Ｌ－２）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX34と記す）。
　式（Ｌ－２）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX35と記す）。
　式（Ｌ－２）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX36と記す）。
　式（Ｌ－２）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX37と記す）。
　式（Ｌ－２）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX38と記す）。
　式（Ｌ－２）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX39と記す）。
　式（Ｌ－２）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX40と記す）。
　式（Ｌ－２）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX41と記す）。
　式（Ｌ－２）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX42と記す）。
　式（Ｌ－２）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX43と記す）。
　式（Ｌ－２）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX44と記す）。 Formula (L-2)
Figure JPOXMLDOC01-appb-C000102
 In the compound represented by the formula, R 2 is a methyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is any of the substituents described in [Table A13] to [Table A27] Compounds that are groups (hereinafter referred to as compound group SX23).
In the compounds represented by formula (L-2), R 2 is an ethyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX24).
In the compound represented by the formula (L-2), R 2 is a cyclopropyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX25).
In the compounds represented by formula (L-2), R 2 is a methyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX26).
In the compounds represented by formula (L-2), R 2 is an ethyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX27).
In the compound represented by the formula (L-2), R 2 is a cyclopropyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX28).
In the compound represented by the formula (L-2), R 2 is a methyl group, R 4 is a methyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX29).
In the compound represented by the formula (L-2), R 2 is an ethyl group, R 4 is a methyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX30).
In the compounds represented by formula (L-2), R 2 is a methyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described (hereinafter referred to as compound group SX31).
In the compounds represented by formula (L-2), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX32).
In the compound represented by the formula (L-2), R 2 is a cyclopropyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX33).
In the compounds represented by formula (L-2), R 2 is a methyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX34).
In the compounds represented by formula (L-2), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX35).
In the compound represented by the formula (L-2), R 2 is a cyclopropyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX36).
In the compound represented by the formula (L-2), R 2 is a methyl group, R 4 is an ethyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX37).
In the compound represented by the formula (L-2), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX38).
In the compound represented by the formula (L-2), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX39).
In the compound represented by the formula (L-2), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX40).
In the compound represented by the formula (L-2), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX41).
In the compound represented by the formula (L-2), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX42).
In the compounds represented by formula (L-2), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is a cyclopropyl group, and R A is a group represented by [Table A13] to [Table A27] ] The compound which is any one of the substituents as described in the following (hereinafter referred to as compound group SX43).
In the compound represented by formula (L-2), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is a cyclopropyl group, and R A is a group represented by [Table A13] to [Table A27] ] The compound which is any one of the substituents as described in the following (hereinafter referred to as compound group SX44).
式（Ｌ－３）
Figure JPOXMLDOC01-appb-C000103
 で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX45と記す）。
　式（Ｌ－３）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX46と記す）。
　式（Ｌ－３）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX47と記す）。
　式（Ｌ－３）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX48と記す）。
　式（Ｌ－３）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX49と記す）。
　式（Ｌ－３）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX50と記す）。
　式（Ｌ－３）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX51と記す）。
　式（Ｌ－３）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX52と記す）。
　式（Ｌ－３）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX53と記す）。
　式（Ｌ－３）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX54と記す）。
　式（Ｌ－３）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX55と記す）。
　式（Ｌ－３）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX56と記す）。
　式（Ｌ－３）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX57と記す）。
　式（Ｌ－３）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX58と記す）。
　式（Ｌ－３）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX59と記す）。
　式（Ｌ－３）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX60と記す）。
　式（Ｌ－３）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX61と記す）。
　式（Ｌ－３）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX62と記す）。
　式（Ｌ－３）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX63と記す）。
　式（Ｌ－３）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX64と記す）。
　式（Ｌ－３）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX65と記す）。
　式（Ｌ－３）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX66と記す）。 Formula (L-3)
Figure JPOXMLDOC01-appb-C000103
 In the compound represented by the formula, R 2 is a methyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is any of the substituents described in [Table A13] to [Table A27] Compounds that are groups (hereinafter referred to as compound group SX45).
In the compounds represented by formula (L-3), R 2 is an ethyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX46).
In the compound represented by the formula (L-3), R 2 is a cyclopropyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX47).
In the compounds represented by formula (L-3), R 2 is a methyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX48).
In the compounds represented by formula (L-3), R 2 is an ethyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX49).
In the compound represented by the formula (L-3), R 2 is a cyclopropyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX50).
In the compound represented by the formula (L-3), R 2 is a methyl group, R 4 is a methyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX51).
In the compound represented by the formula (L-3), R 2 is an ethyl group, R 4 is a methyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX52).
In the compounds represented by formula (L-3), R 2 is a methyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX53).
In the compounds represented by formula (L-3), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX54).
In the compound represented by the formula (L-3), R 2 is a cyclopropyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX55).
In the compounds represented by formula (L-3), R 2 is a methyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX56).
In the compounds represented by formula (L-3), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX57).
In the compound represented by the formula (L-3), R 2 is a cyclopropyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX58).
In the compound represented by the formula (L-3), R 2 is a methyl group, R 4 is an ethyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX59).
In the compound represented by the formula (L-3), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX60).
In the compound represented by the formula (L-3), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX61).
In the compound represented by the formula (L-3), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX62).
In the compound represented by the formula (L-3), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX63).
In the compound represented by the formula (L-3), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX64).
In the compound represented by the formula (L-3), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is a cyclopropyl group, and R A is a group represented by [Table A13] to [Table A27] ] The compound which is any one of the substituents as described in the following (hereinafter referred to as compound group SX65).
In the compound represented by the formula (L-3), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is a cyclopropyl group, and R A is a group represented by [Table A13] to [Table A27] ] The compound which is any one of the substituents as described in the following (hereinafter referred to as compound group SX66).
式（Ｌ－４）
Figure JPOXMLDOC01-appb-C000104
 で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX67と記す）。
　式（Ｌ－４）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX68と記す）。
　式（Ｌ－４）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX69と記す）。
　式（Ｌ－４）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX70と記す）。
　式（Ｌ－４）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX71と記す）。
　式（Ｌ－４）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX72と記す）。
　式（Ｌ－４）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX73と記す）。
　式（Ｌ－４）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX74と記す）。
　式（Ｌ－４）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX75と記す）。
　式（Ｌ－４）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX76と記す）。
　式（Ｌ－４）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX77と記す）。
　式（Ｌ－４）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX78と記す）。
　式（Ｌ－４）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX79と記す）。
　式（Ｌ－４）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX80と記す）。
　式（Ｌ－４）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX81と記す）。
　式（Ｌ－４）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX82と記す）。
　式（Ｌ－４）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX83と記す）。
　式（Ｌ－４）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX84と記す）。
　式（Ｌ－４）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX85と記す）。
　式（Ｌ－４）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX86と記す）。
　式（Ｌ－４）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX87と記す）。
　式（Ｌ－４）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX88と記す）。 Formula (L-4)
Figure JPOXMLDOC01-appb-C000104
 In the compound represented by the formula, R 2 is a methyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is any of the substituents described in [Table A13] to [Table A27] Compounds that are groups (hereinafter referred to as compound group SX67).
In the compounds represented by formula (L-4), R 2 is an ethyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX68).
In the compound represented by the formula (L-4), R 2 is a cyclopropyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX69).
In the compounds represented by formula (L-4), R 2 is a methyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX70).
In the compound represented by the formula (L-4), R 2 is an ethyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX71).
In the compound represented by the formula (L-4), R 2 is a cyclopropyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX72).
In the compound represented by the formula (L-4), R 2 is a methyl group, R 4 is a methyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX73).
In the compound represented by the formula (L-4), R 2 is an ethyl group, R 4 is a methyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX74).
In the compounds represented by formula (L-4), R 2 is a methyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX75).
In the compound represented by the formula (L-4), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described (hereinafter referred to as compound group SX76).
In the compound represented by the formula (L-4), R 2 is a cyclopropyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX77).
In the compounds represented by formula (L-4), R 2 is a methyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX78).
In the compound represented by the formula (L-4), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX79).
In the compound represented by the formula (L-4), R 2 is a cyclopropyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX80).
In the compound represented by the formula (L-4), R 2 is a methyl group, R 4 is an ethyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX81).
In the compound represented by the formula (L-4), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is a cyclopropyl group, and R A is [Table A 13] to [Table A 27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX82).
In the compound represented by the formula (L-4), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX83).
In the compound represented by the formula (L-4), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX84).
In the compound represented by the formula (L-4), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX85).
In the compound represented by the formula (L-4), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX86).
In the compound represented by the formula (L-4), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is a cyclopropyl group, and R A is a group represented by [Table A13] to [Table A27] ] The compound which is any one of the substituents as described in the following (hereinafter referred to as compound group SX87).
In the compound represented by the formula (L-4), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is a cyclopropyl group, and R A is a group represented by [Table A13] to [Table A27] ] The compound which is any one of the substituents as described in the following (hereinafter referred to as compound group SX88).
式（Ｌ－５）
Figure JPOXMLDOC01-appb-C000105
 で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX89と記す）。
　式（Ｌ－５）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX90と記す）。
　式（Ｌ－５）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX91と記す）。
　式（Ｌ－５）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX92と記す）。
　式（Ｌ－５）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX93と記す）。
　式（Ｌ－５）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX94と記す）。
　式（Ｌ－５）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX95と記す）。
　式（Ｌ－５）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX96と記す）。
　式（Ｌ－５）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX97と記す）。
　式（Ｌ－５）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX98と記す）。
　式（Ｌ－５）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX99と記す）。
　式（Ｌ－５）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX100と記す）。
　式（Ｌ－５）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX101と記す）。
　式（Ｌ－５）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX102と記す）。
　式（Ｌ－５）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX103と記す）。
　式（Ｌ－５）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX104と記す）。
　式（Ｌ－５）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX105と記す）。
　式（Ｌ－５）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX106と記す）。
　式（Ｌ－５）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX107と記す）。
　式（Ｌ－５）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX108と記す）。
　式（Ｌ－５）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX109と記す）。
　式（Ｌ－５）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX110と記す）。 Formula (L-5)
Figure JPOXMLDOC01-appb-C000105
 In the compound represented by the formula, R 2 is a methyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is any of the substituents described in [Table A13] to [Table A27] Compounds that are groups (hereinafter referred to as compound group SX89).
In the compounds represented by formula (L-5), R 2 is an ethyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX90).
In the compound represented by the formula (L-5), R 2 is a cyclopropyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX91).
In the compound represented by the formula (L-5), R 2 is a methyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX92).
In the compounds represented by formula (L-5), R 2 is an ethyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX93).
In the compound represented by the formula (L-5), R 2 is a cyclopropyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX94).
In the compound represented by the formula (L-5), R 2 is a methyl group, R 4 is a methyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX95).
In the compound represented by the formula (L-5), R 2 is an ethyl group, R 4 is a methyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX96).
In the compounds represented by formula (L-5), R 2 is a methyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX97).
In the compounds represented by formula (L-5), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX98).
In the compound represented by the formula (L-5), R 2 is a cyclopropyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX99).
In the compounds represented by formula (L-5), R 2 is a methyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX100).
In the compounds represented by formula (L-5), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX101).
In the compound represented by the formula (L-5), R 2 is a cyclopropyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX102).
In the compound represented by the formula (L-5), R 2 is a methyl group, R 4 is an ethyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX103).
In the compound represented by the formula (L-5), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX104).
In the compound represented by the formula (L-5), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is a methyl group, and R A is [Table A 13] to [Table A 27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX105).
In the compound represented by the formula (L-5), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX106).
In the compound represented by the formula (L-5), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX107).
In the compound represented by the formula (L-5), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX108).
In the compound represented by formula (L-5), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is a cyclopropyl group, and R A is a group represented by [Table A13] to [Table A27] ] The compound which is any one of the substituents as described in the following (hereinafter referred to as compound group SX109).
In the compound represented by the formula (L-5), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is a cyclopropyl group, and R A is a group represented by [Table A13] to [Table A27] ] The compound which is any one of the substituents as described in the following (hereinafter referred to as compound group SX110).
式（Ｌ－６）
Figure JPOXMLDOC01-appb-C000106
 で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX111と記す）。
　式（Ｌ－６）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX112と記す）。
　式（Ｌ－６）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX113と記す）。
　式（Ｌ－６）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX114と記す）。
　式（Ｌ－６）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX115と記す）。
　式（Ｌ－６）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX116と記す）。
　式（Ｌ－６）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX117と記す）。
　式（Ｌ－６）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX118と記す）。
　式（Ｌ－６）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX119と記す）。
　式（Ｌ－６）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX120と記す）。
　式（Ｌ－６）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX121と記す）。
　式（Ｌ－６）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX122と記す）。
　式（Ｌ－６）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX123と記す）。
　式（Ｌ－６）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX124と記す）。
　式（Ｌ－６）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX125と記す）。
　式（Ｌ－６）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX126と記す）。
　式（Ｌ－６）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX127と記す）。
　式（Ｌ－６）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX128と記す）。
　式（Ｌ－６）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX129と記す）。
　式（Ｌ－６）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX130と記す）。
　式（Ｌ－６）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX131と記す）。
　式（Ｌ－６）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX132と記す）。 Formula (L-6)
Figure JPOXMLDOC01-appb-C000106
 In the compound represented by the formula, R 2 is a methyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is any of the substituents described in [Table A13] to [Table A27] Compounds that are groups (hereinafter referred to as compound group SX111).
In the compound represented by the formula (L-6), R 2 is an ethyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX112).
In the compound represented by the formula (L-6), R 2 is a cyclopropyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX113).
In the compounds represented by formula (L-6), R 2 is a methyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX114).
In the compound represented by the formula (L-6), R 2 is an ethyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX115).
In the compound represented by the formula (L-6), R 2 is a cyclopropyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX116).
In the compound represented by the formula (L-6), R 2 is a methyl group, R 4 is a methyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX117).
In the compound represented by the formula (L-6), R 2 is an ethyl group, R 4 is a methyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX118).
In the compounds represented by formula (L-6), R 2 is a methyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX119).
In the compound represented by the formula (L-6), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX120).
In the compound represented by the formula (L-6), R 2 is a cyclopropyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX121).
In the compounds represented by formula (L-6), R 2 is a methyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX122).
In the compound represented by the formula (L-6), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX123).
In the compound represented by the formula (L-6), R 2 is a cyclopropyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX124).
In the compound represented by the formula (L-6), R 2 is a methyl group, R 4 is an ethyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX125).
In the compound represented by the formula (L-6), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX126).
In the compound represented by the formula (L-6), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is a methyl group, and R A is [Table A 13] to [Table A 27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX127).
In the compound represented by the formula (L-6), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX128).
In the compound represented by the formula (L-6), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX129).
In the compound represented by the formula (L-6), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX130).
In the compound represented by the formula (L-6), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is a cyclopropyl group, and R A is a group represented by [Table A13] to [Table A27] ] The compound which is any one of the substituents as described in the following (hereinafter referred to as compound group SX131).
In the compound represented by the formula (L-6), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is a cyclopropyl group, and R A is a group represented by [Table A13] to [Table A27] ] The compound which is any one of the substituents as described in the following (hereinafter referred to as compound group SX132).
式（Ｌ－７）
Figure JPOXMLDOC01-appb-C000107
 で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX133と記す）。
　式（Ｌ－７）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX134と記す）。
　式（Ｌ－７）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX135と記す）。
　式（Ｌ－７）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX136と記す）。
　式（Ｌ－７）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX137と記す）。
　式（Ｌ－７）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX138と記す）。
　式（Ｌ－７）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX139と記す）。
　式（Ｌ－７）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX140と記す）。
　式（Ｌ－７）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX141と記す）。
　式（Ｌ－７）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX142と記す）。
　式（Ｌ－７）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX143と記す）。
　式（Ｌ－７）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX144と記す）。
　式（Ｌ－７）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX145と記す）。
　式（Ｌ－７）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX146と記す）。
　式（Ｌ－７）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX147と記す）。
　式（Ｌ－７）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX148と記す）。
　式（Ｌ－７）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX149と記す）。
　式（Ｌ－７）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX150と記す）。
　式（Ｌ－７）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX151と記す）。
　式（Ｌ－７）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX152と記す）。
　式（Ｌ－７）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX153と記す）。
　式（Ｌ－７）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX154と記す）。 Formula (L-7)
Figure JPOXMLDOC01-appb-C000107
 In the compound represented by the formula, R 2 is a methyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is any of the substituents described in [Table A13] to [Table A27] Compounds that are groups (hereinafter referred to as compound group SX133).
In the compounds represented by formula (L-7), R 2 is an ethyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX134).
In the compound represented by the formula (L-7), R 2 is a cyclopropyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX135).
In the compound represented by the formula (L-7), R 2 is a methyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX136).
In the compounds represented by formula (L-7), R 2 is an ethyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX137).
In the compound represented by the formula (L-7), R 2 is a cyclopropyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX138).
In the compound represented by the formula (L-7), R 2 is a methyl group, R 4 is a methyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX139).
In the compound represented by the formula (L-7), R 2 is an ethyl group, R 4 is a methyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX140).
In the compound represented by the formula (L-7), R 2 is a methyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX141).
In the compounds represented by formula (L-7), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX142).
In the compound represented by the formula (L-7), R 2 is a cyclopropyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX143).
In the compounds represented by formula (L-7), R 2 is a methyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX144).
In the compounds represented by formula (L-7), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX145).
In the compound represented by the formula (L-7), R 2 is a cyclopropyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX146).
In the compound represented by the formula (L-7), R 2 is a methyl group, R 4 is an ethyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX147).
In the compound represented by the formula (L-7), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX148).
In the compound represented by the formula (L-7), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX149).
In the compound represented by the formula (L-7), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX150).
In the compound represented by the formula (L-7), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX151).
In the compound represented by the formula (L-7), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX152).
In the compound represented by the formula (L-7), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is a cyclopropyl group, and R A is a group represented by [Table A13] to [Table A27] ] The compound which is a substituent in any one of-(It is hereafter described as compound group SX153).
In the compound represented by the formula (L-7), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is a cyclopropyl group, and R A is a group represented by [Table A13] to [Table A27] ] The compound which is any one of the substituents as described in the following (hereinafter referred to as compound group SX154).
式（Ｌ－８）
Figure JPOXMLDOC01-appb-C000108
 で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX155と記す）。
　式（Ｌ－８）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX156と記す）。
　式（Ｌ－８）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX157と記す）。
　式（Ｌ－８）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX158と記す）。
　式（Ｌ－８）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX159と記す）。
　式（Ｌ－８）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX160と記す）。
　式（Ｌ－８）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX161と記す）。
　式（Ｌ－８）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX162と記す）。
　式（Ｌ－８）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX163と記す）。
　式（Ｌ－８）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX164と記す）。
　式（Ｌ－８）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX165と記す）。
　式（Ｌ－８）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX166と記す）。
　式（Ｌ－８）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX167と記す）。
　式（Ｌ－８）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX168と記す）。
　式（Ｌ－８）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX169と記す）。
　式（Ｌ－８）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX170と記す）。
　式（Ｌ－８）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX171と記す）。
　式（Ｌ－８）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX172と記す）。
　式（Ｌ－８）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX173と記す）。
　式（Ｌ－８）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX174と記す）。
　式（Ｌ－８）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX175と記す）。
　式（Ｌ－８）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX176と記す）。 Formula (L-8)
Figure JPOXMLDOC01-appb-C000108
 In the compound represented by the formula, R 2 is a methyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is any of the substituents described in [Table A13] to [Table A27] Compounds that are groups (hereinafter referred to as compound group SX155).
In the compounds represented by formula (L-8), R 2 is an ethyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX156).
In the compound represented by the formula (L-8), R 2 is a cyclopropyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX157).
In the compounds represented by formula (L-8), R 2 is a methyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX158).
In the compound represented by the formula (L-8), R 2 is an ethyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX159).
In the compound represented by the formula (L-8), R 2 is a cyclopropyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX160).
In the compound represented by the formula (L-8), R 2 is a methyl group, R 4 is a methyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX161).
In the compound represented by the formula (L-8), R 2 is an ethyl group, R 4 is a methyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX162).
In the compounds represented by formula (L-8), R 2 is a methyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX163).
In the compounds represented by formula (L-8), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX164).
In the compound represented by the formula (L-8), R 2 is a cyclopropyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX165).
In the compounds represented by formula (L-8), R 2 is a methyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX166).
In the compounds represented by formula (L-8), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX167).
In the compound represented by the formula (L-8), R 2 is a cyclopropyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX168).
In the compound represented by the formula (L-8), R 2 is a methyl group, R 4 is an ethyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX169).
In the compound represented by the formula (L-8), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX170).
In the compound represented by the formula (L-8), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX171).
In the compound represented by the formula (L-8), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX172).
In the compound represented by the formula (L-8), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX173).
In the compound represented by the formula (L-8), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX174).
In the compound represented by formula (L-8), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is a cyclopropyl group, and R A is a group represented by [Table A13] to [Table A27] ] The compound which is any one of the substituents as described in the following (hereinafter referred to as compound group SX175).
In the compound represented by the formula (L-8), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is a cyclopropyl group, and R A is a group represented by [Table A13] to [Table A27] ] The compound which is any one of the substituents as described in the following (hereinafter referred to as compound group SX176).
式（Ｌ－９）
Figure JPOXMLDOC01-appb-C000109
 で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX177と記す）。
　式（Ｌ－９）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX178と記す）。
　式（Ｌ－９）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX179と記す）。
　式（Ｌ－９）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX180と記す）。
　式（Ｌ－９）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX181と記す）。
　式（Ｌ－９）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX182と記す）。
　式（Ｌ－９）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX183と記す）。
　式（Ｌ－９）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX184と記す）。
　式（Ｌ－９）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX185と記す）。
　式（Ｌ－９）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX186と記す）。
　式（Ｌ－９）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX187と記す）。
　式（Ｌ－９）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX188と記す）。
　式（Ｌ－９）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX189と記す）。
　式（Ｌ－９）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX190と記す）。
　式（Ｌ－９）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX191と記す）。
　式（Ｌ－９）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX192と記す）。
　式（Ｌ－９）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX193と記す）。
　式（Ｌ－９）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX194と記す）。
　式（Ｌ－９）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX195と記す）。
　式（Ｌ－９）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX196と記す）。
　式（Ｌ－９）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX197と記す）。
　式（Ｌ－９）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX198と記す）。 Formula (L-9)
Figure JPOXMLDOC01-appb-C000109
 In the compound represented by the formula, R 2 is a methyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is any of the substituents described in [Table A13] to [Table A27] Compounds that are groups (hereinafter referred to as compound group SX177).
In the compound represented by the formula (L-9), R 2 is an ethyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX178).
In the compound represented by the formula (L-9), R 2 is a cyclopropyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX179).
In the compound represented by the formula (L-9), R 2 is a methyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX180).
In the compound represented by the formula (L-9), R 2 is an ethyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX181).
In the compound represented by the formula (L-9), R 2 is a cyclopropyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX182).
In the compound represented by the formula (L-9), R 2 is a methyl group, R 4 is a methyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX183).
In the compound represented by the formula (L-9), R 2 is an ethyl group, R 4 is a methyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX184).
In the compounds represented by formula (L-9), R 2 is a methyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX185).
In the compounds represented by formula (L-9), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX186).
In the compound represented by the formula (L-9), R 2 is a cyclopropyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX187).
In the compounds represented by formula (L-9), R 2 is a methyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX188).
In the compounds represented by formula (L-9), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX189).
In the compound represented by the formula (L-9), R 2 is a cyclopropyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX190).
In the compound represented by the formula (L-9), R 2 is a methyl group, R 4 is an ethyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX191).
In the compound represented by the formula (L-9), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX192).
In the compound represented by the formula (L-9), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX193).
In the compound represented by the formula (L-9), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX194).
In the compound represented by the formula (L-9), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX195).
In the compound represented by the formula (L-9), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX196).
In the compound represented by the formula (L-9), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is a cyclopropyl group, and R A is a group represented by [Table A13] to [Table A27] ] The compound which is any one of the substituents as described in the following (hereinafter referred to as compound group SX197).
In the compound represented by the formula (L-9), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is a cyclopropyl group, and R A is a group represented by [Table A13] to [Table A27] ] The compound which is any substituent as described in following (it is hereafter described as compound group SX198).
式（Ｌ－１０）
Figure JPOXMLDOC01-appb-C000110
 で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX199と記す）。
　式（Ｌ－１０）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX200と記す）。
　式（Ｌ－１０）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX201と記す）。
　式（Ｌ－１０）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX202と記す）。
　式（Ｌ－１０）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX203と記す）。
　式（Ｌ－１０）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX204と記す）。
　式（Ｌ－１０）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX205と記す）。
　式（Ｌ－１０）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX206と記す）。
　式（Ｌ－１０）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX207と記す）。
　式（Ｌ－１０）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX208と記す）。
　式（Ｌ－１０）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX209と記す）。
　式（Ｌ－１０）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX210と記す）。
　式（Ｌ－１０）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX211と記す）。
　式（Ｌ－１０）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX212と記す）。
　式（Ｌ－１０）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX213と記す）。
　式（Ｌ－１０）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX214と記す）。
　式（Ｌ－１０）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX215と記す）。
　式（Ｌ－１０）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX216と記す）。
　式（Ｌ－１０）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX217と記す）。
　式（Ｌ－１０）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX218と記す）。
　式（Ｌ－１０）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX219と記す）。
　式（Ｌ－１０）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX220と記す）。 Formula (L-10)
Figure JPOXMLDOC01-appb-C000110
 In the compound represented by the formula, R 2 is a methyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is any of the substituents described in [Table A13] to [Table A27] Compounds that are groups (hereinafter referred to as compound group SX199).
In the compound represented by the formula (L-10), R 2 is an ethyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX200).
In the compound represented by the formula (L-10), R 2 is a cyclopropyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX201).
In the compounds represented by formula (L-10), R 2 is a methyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX202).
In the compound represented by the formula (L-10), R 2 is an ethyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX203).
In the compound represented by the formula (L-10), R 2 is a cyclopropyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX204).
In the compound represented by the formula (L-10), R 2 is a methyl group, R 4 is a methyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX205).
In the compound represented by the formula (L-10), R 2 is an ethyl group, R 4 is a methyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX206).
In the compound represented by the formula (L-10), R 2 is a methyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX207).
In the compounds represented by formula (L-10), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX208).
In the compound represented by the formula (L-10), R 2 is a cyclopropyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX209).
In the compounds represented by formula (L-10), R 2 is a methyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX210).
In the compounds represented by formula (L-10), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX211).
In the compound represented by the formula (L-10), R 2 is a cyclopropyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX212).
In the compound represented by the formula (L-10), R 2 is a methyl group, R 4 is an ethyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX213).
In the compound represented by the formula (L-10), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX214).
In the compound represented by the formula (L-10), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX215).
In the compound represented by the formula (L-10), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX216).
In the compound represented by the formula (L-10), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX217).
In the compound represented by the formula (L-10), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX218).
In the compound represented by the formula (L-10), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is a cyclopropyl group, and R A is a group represented by [Table A13] to [Table A27] ] The compound which is any one of the substituents as described in the following (hereinafter referred to as compound group SX219).
In the compound represented by the formula (L-10), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is a cyclopropyl group, and R A is a group represented by [Table A13] to [Table A27] ] The compound which is any one of the substituents as described in the following (hereinafter referred to as compound group SX220).
式（Ｌ－１１）
Figure JPOXMLDOC01-appb-C000111
 で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX221と記す）。
　式（Ｌ－１１）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX222と記す）。
　式（Ｌ－１１）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX223と記す）。
　式（Ｌ－１１）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX224と記す）。
　式（Ｌ－１１）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX225と記す）。
　式（Ｌ－１１）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX226と記す）。
　式（Ｌ－１１）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX227と記す）。
　式（Ｌ－１１）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX228と記す）。
　式（Ｌ－１１）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX229と記す）。
　式（Ｌ－１１）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX230と記す）。
　式（Ｌ－１１）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX231と記す）。
　式（Ｌ－１１）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX232と記す）。
　式（Ｌ－１１）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX233と記す）。
　式（Ｌ－１１）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX234と記す）。
　式（Ｌ－１１）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX235と記す）。
　式（Ｌ－１１）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX236と記す）。
　式（Ｌ－１１）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX237と記す）。
　式（Ｌ－１１）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX238と記す）。
　式（Ｌ－１１）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX239と記す）。
　式（Ｌ－１１）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX240と記す）。
　式（Ｌ－１１）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX241と記す）。
　式（Ｌ－１１）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX242と記す）。 Formula (L-11)
Figure JPOXMLDOC01-appb-C000111
 In the compound represented by the formula, R 2 is a methyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is any of the substituents described in [Table A13] to [Table A27] Compounds that are groups (hereinafter referred to as compound group SX221).
In the compounds represented by formula (L-11), R 2 is an ethyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX222).
In the compound represented by formula (L-11), R 2 is a cyclopropyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is [Table A 13] to [Table A 27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX223).
In the compounds represented by formula (L-11), R 2 is a methyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX224).
In the compounds represented by formula (L-11), R 2 is an ethyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX225).
In the compound represented by formula (L-11), R 2 is a cyclopropyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX226).
In the compound represented by formula (L-11), R 2 is a methyl group, R 4 is a methyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX227).
In the compound represented by the formula (L-11), R 2 is an ethyl group, R 4 is a methyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX228).
In the compounds represented by formula (L-11), R 2 is a methyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX229).
In the compounds represented by formula (L-11), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX230).
In the compound represented by the formula (L-11), R 2 is a cyclopropyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX231).
In the compounds represented by formula (L-11), R 2 is a methyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX232).
In the compounds represented by formula (L-11), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX233).
In the compound represented by the formula (L-11), R 2 is a cyclopropyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX234).
In the compound represented by formula (L-11), R 2 is a methyl group, R 4 is an ethyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX235).
In the compound represented by the formula (L-11), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX236).
In the compound represented by the formula (L-11), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX237).
In the compound represented by the formula (L-11), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX238).
In the compound represented by the formula (L-11), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX239).
In the compound represented by the formula (L-11), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX240).
In the compounds represented by formula (L-11), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is a cyclopropyl group, and R A is a group represented by [Table A13] to [Table A27] ] The compound which is any one of the substituents as described in the following (hereinafter referred to as compound group SX241).
In the compound represented by the formula (L-11), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is a cyclopropyl group, and R A is a group represented by [Table A13] to [Table A27] ] The compound which is any one of the substituents as described in the following (hereinafter referred to as compound group SX242).
式（Ｌ－１２）
Figure JPOXMLDOC01-appb-C000112
 で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX243と記す）。
　式（Ｌ－１２）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX244と記す）。
　式（Ｌ－１２）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がメチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX245と記す）。
　式（Ｌ－１２）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX246と記す）。
　式（Ｌ－１２）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX247と記す）。
　式（Ｌ－１２）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がメチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX248と記す）。
　式（Ｌ－１２）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がメチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX249と記す）。
　式（Ｌ－１２）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がメチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX250と記す）。
　式（Ｌ－１２）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX251と記す）。
　式（Ｌ－１２）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX252と記す）。
　式（Ｌ－１２）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がエチル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX253と記す）。
　式（Ｌ－１２）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX254と記す）。
　式（Ｌ－１２）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX255と記す）。
　式（Ｌ－１２）で示される化合物において、Ｒ2がシクロプロピル基であり、Ｒ4がエチル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX256と記す）。
　式（Ｌ－１２）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がエチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX257と記す）。
　式（Ｌ－１２）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がエチル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX258と記す）。
　式（Ｌ－１２）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX259と記す）。
　式（Ｌ－１２）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がメチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX260と記す）。
　式（Ｌ－１２）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX261と記す）。
　式（Ｌ－１２）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がエチル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX262と記す）。
　式（Ｌ－１２）で示される化合物において、Ｒ2がメチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX263と記す）。
　式（Ｌ－１２）で示される化合物において、Ｒ2がエチル基であり、Ｒ4がシクロプロピル基であり、Ｒ5がシクロプロピル基であり、ＲAが、［表Ａ１３］～［表Ａ２７］に記載のいずれかの置換基である化合物（以下、化合物群SX264と記す）。 Formula (L-12)
Figure JPOXMLDOC01-appb-C000112
 In the compound represented by the formula, R 2 is a methyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is any of the substituents described in [Table A13] to [Table A27] Compounds that are groups (hereinafter referred to as compound group SX243).
In the compounds represented by formula (L-12), R 2 is an ethyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX244).
In the compound represented by the formula (L-12), R 2 is a cyclopropyl group, R 4 is a methyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX245).
In the compounds represented by formula (L-12), R 2 is a methyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX246).
In the compounds represented by formula (L-12), R 2 is an ethyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX247).
In the compound represented by the formula (L-12), R 2 is a cyclopropyl group, R 4 is a methyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX248).
In the compound represented by the formula (L-12), R 2 is a methyl group, R 4 is a methyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX249).
In the compound represented by the formula (L-12), R 2 is an ethyl group, R 4 is a methyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX250).
In the compound represented by the formula (L-12), R 2 is a methyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX251).
In the compounds represented by formula (L-12), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX252).
In the compound represented by the formula (L-12), R 2 is a cyclopropyl group, R 4 is an ethyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX253).
In the compounds represented by formula (L-12), R 2 is a methyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds which are any of the substituents described below (hereinafter referred to as compound group SX254).
In the compounds represented by formula (L-12), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is a group represented by [Table A13] to [Table A27] Compounds that are any of the substituents described below (hereinafter referred to as compound group SX255).
In the compound represented by the formula (L-12), R 2 is a cyclopropyl group, R 4 is an ethyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX256).
In the compound represented by the formula (L-12), R 2 is a methyl group, R 4 is an ethyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX257).
In the compound represented by the formula (L-12), R 2 is an ethyl group, R 4 is an ethyl group, R 5 is a cyclopropyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX258).
In the compound represented by the formula (L-12), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX259).
In the compound represented by the formula (L-12), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is a methyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX260).
In the compound represented by the formula (L-12), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX261).
In the compound represented by the formula (L-12), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is an ethyl group, and R A is [Table A13] to [Table A27] Compounds which are any of the substituents described in (hereinafter referred to as compound group SX262).
In the compound represented by formula (L-12), R 2 is a methyl group, R 4 is a cyclopropyl group, R 5 is a cyclopropyl group, and R A is a group represented by [Table A13] to [Table A27] ] The compound which is any substituent as described in following (it is hereafter described as compound group SX263).
In the compound represented by the formula (L-12), R 2 is an ethyl group, R 4 is a cyclopropyl group, R 5 is a cyclopropyl group, and R A is a group represented by [Table A13] to [Table A27] ] The compound which is any one of the substituents as described in the following (hereinafter referred to as compound group SX264).
　次に本発明化合物の製剤例を示す。なお、部は重量部を表す。 Next, formulation examples of the compound of the present invention are shown. In addition, a part represents a weight part.
製剤例１
　本発明化合物１～１７７のいずれか１種１０部を、キシレン３５部とＤＭＦ３５部との混合物に混合し、そこにポリオキシエチレンスチリルフェニルエーテル１４部及びドデシルベンゼンスルホン酸カルシウム６部を加え、混合して製剤を得る。 Formulation example 1
10 parts of any one of the compounds 1 to 177 of the present invention is mixed into a mixture of 35 parts of xylene and 35 parts of DMF, and 14 parts of polyoxyethylene styryl phenyl ether and 6 parts of calcium dodecylbenzene sulfonate are added thereto and mixed To obtain a formulation.
製剤例２
　ラウリル硫酸ナトリウム４部、リグニンスルホン酸カルシウム２部、湿式シリカ２０部及び珪藻土５４部を混合し、更に本発明化合物１～１７７のいずれか１種２０部を加え、混合して製剤を得る。 Formulation example 2
4 parts of sodium lauryl sulfate, 2 parts of calcium lignin sulfonate, 20 parts of wet silica and 54 parts of diatomaceous earth are mixed, and further 20 parts of any one of the present compounds 1-177 is added and mixed to obtain a preparation.
製剤例３
　本発明化合物１～１７７のいずれか１種２部に、湿式シリカ１部、リグニンスルホン酸カルシウム２部、ベントナイト３０部及びカオリンクレー６５部を加え混合する。ついで、この混合物に適当量の水を加え、さらに撹拌し、造粒機で造粒し、通風乾燥して製剤を得る。 Formulation example 3
1 part of wet silica, 2 parts of calcium lignin sulfonate, 30 parts of bentonite and 65 parts of kaolin clay are added to 2 parts of any one of the compounds of the present invention 1-177 and mixed. Then, an appropriate amount of water is added to the mixture, and the mixture is further stirred, granulated with a granulator and blow-dried to obtain a preparation.
製剤例４
　本発明化合物１～１７７のいずれか１種１部を適当量のアセトンに混合し、これに湿式シリカ５部、酸性リン酸イソプロピル０．３部及びカオリンクレー９３．７部を加え、十分混合し、アセトンを蒸発除去して製剤を得る。 Formulation example 4
One part of any one compound of the present invention 1-177 is mixed with an appropriate amount of acetone, to which 5 parts of wet silica, 0.3 parts of isopropyl acid phosphate and 93.7 parts of kaolin clay are added and mixed thoroughly. The acetone is removed by evaporation to obtain a preparation.
製剤例５
　ポリオキシエチレンアルキルエーテルサルフェートアンモニウム塩及び湿式シリカの混合物（重量比１：１）３５部と、本発明化合物１～１７７のいずれか１種２０部と、水４５部とを十分に混合し、製剤を得る。 Formulation example 5
A formulation is prepared by thoroughly mixing 35 parts of a mixture of polyoxyethylene alkyl ether sulfate ammonium salt and wet silica (weight ratio 1: 1), 20 parts of any one of the compounds of the present invention 1-177, and 45 parts of water Get
製剤例６
　本発明化合物１～１７７のいずれか１種０．１部をキシレン５部及びトリクロロエタン５部の混合物に混合し、これをケロシン８９．９部に混合して製剤を得る。 Formulation Example 6
0.1 part of any one of the compounds 1-177 of the present invention is mixed with a mixture of 5 parts of xylene and 5 parts of trichloroethane, and this is mixed with 89.9 parts of kerosene to obtain a preparation.
製剤例７
　本発明化合物１～１７７のいずれか１種１０ｍｇをアセトン０．５ｍＬに混合し、この溶液を、動物用固形飼料粉末（飼育繁殖用固形飼料粉末ＣＥ－２、日本クレア株式会社商品）５ｇに滴下し、均一に混合する。ついでアセトンを蒸発乾燥させて毒餌剤を得る。 Formulation example 7
10 mg of any one of the compounds 1 to 177 of the present invention is mixed with 0.5 mL of acetone, and this solution is added dropwise to 5 g of solid feed powder for animals (solid feed powder for rearing and breeding CE-2 manufactured by CLEA Japan, Inc.) And mix uniformly. The acetone is then evaporated to dryness to obtain a toxic bait.
製剤例８
　本発明化合物１～１７７のいずれか１種０．１部、ネオチオゾール（中央化成株式会社製）４９．９部をエアゾール缶に入れ、エアゾールバルブを装着した後、ジメチルエーテル２５部、ＬＰＧ２５部を充填し振とうを加え、アクチュエータを装着することにより油剤エアゾールを得る。 Formulation Example 8
0.1 parts of any one of the compounds 1 to 177 of the present invention and 49.9 parts of neothiozole (manufactured by Chuo Kasei Co., Ltd.) are put into an aerosol can, fitted with an aerosol valve, and filled with 25 parts of dimethyl ether and 25 parts of LPG. Shake is applied and the actuator is mounted to obtain an oil aerosol.
製剤例９
　本発明化合物１～１７７のいずれか１種０．６部、２，６－ジ－ｔｅｒｔ－ブチル－４－メチルフェノール０．０１部、キシレン５部、ケロシン３．３９部及び１部のレオドール（登録商標）ＭＯ－６０を混合したものと、蒸留水５０部とをエアゾール容器に充填し、バルブを装着した後、該バルブを通じてＬＰＧ４０部を充填して水性エアゾールを得る。 Formulation Example 9
0.6 parts of any one of the compounds 1 to 177 of the present invention, 0.01 parts of 2,6-di-tert-butyl-4-methylphenol, 5 parts of xylene, 3.39 parts of kerosene and 1 part of a leopold ( A mixture of MO 60 and 50 parts of distilled water are charged into an aerosol container, and after mounting a valve, 40 parts of LPG are filled through the valve to obtain an aqueous aerosol.
製剤例１０
　本発明化合物１～１７７のいずれか１種０．１ｇを、プロピレングリコール２ｍＬに混合し、４．０ｃｍ×４．０ｃｍ、厚さ１．２ｃｍのセラミック板に含浸させて、加熱式くん煙剤を得る。 Formulation Example 10
0.1 g of any one of the compounds 1-177 of the present invention is mixed with 2 mL of propylene glycol, and impregnated into a 4.0 cm × 4.0 cm, 1.2 cm thick ceramic plate, and heated fuming agent obtain.
製剤例１１
　本発明化合物１～１７７のいずれか１種５部とエチレン－メタクリル酸メチル共重合体（共重合体の総重量に対するメタクリル酸メチルの割合：１０重量％）９５部とを溶融混練し、得られた混練物を押出し成型機から押出し、長さ１５ｃｍ、直径３ｍｍの棒状成型体を得る。 Formulation example 11
Obtained by melt-kneading 5 parts of any one compound of the present invention 1 to 177 and 95 parts of ethylene-methyl methacrylate copolymer (ratio of methyl methacrylate to total weight of copolymer: 10% by weight) The kneaded product is extruded from an extruder to obtain a rod-shaped molding of 15 cm in length and 3 mm in diameter.
製剤例１２
　本発明化合物１～１７７のいずれか１種５部及び軟質塩化ビニル樹脂９５部とを溶融混練し、得られた混練物を押出し成型機から押出し、長さ１５ｃｍ、直径３ｍｍの棒状成型体を得る。 Formulation example 12
5 parts of any one of the compounds 1 to 177 of the present invention and 95 parts of a soft vinyl chloride resin are melt-kneaded, and the obtained kneaded product is extruded from an extruder to obtain a rod-shaped molding of 15 cm in length and 3 mm in diameter. .
製剤例１３
　本発明化合物１～１７７のいずれか１種１００ｍｇ、ラクトース６８．７５ｍｇ、トウモロコシデンプン２３７．５ｍｇ、微結晶性セルロース４３．７５ｍｇ、ポリビニルピロリドン１８．７５ｍｇ、ナトリウムカルボキシメチルデンプン２８．７５ｍｇ、及びステアリン酸マグネシウム２．５ｍｇを混合し、得られた混合物を適切な大きさに圧縮して、錠剤を得る。 Formulation example 13
100 mg of any one of the compounds 1-177 of the present invention, 68.75 mg of lactose, 237.5 mg of corn starch, 43.75 mg of microcrystalline cellulose, 18.75 mg of polyvinylpyrrolidone, 28.75 mg of sodium carboxymethyl starch, and magnesium stearate 2.5 mg are mixed and the resulting mixture is compressed to a suitable size to obtain tablets.
製剤例１４
　本発明化合物１～１７７のいずれか１種２５ｍｇ、ラクトース６０ｍｇ、トウモロコシデンプン２５ｍｇ、カルメロースカルシウム６ｍｇ、及び５％ヒドロキシプロピルメチルセルロース適量を混合し、得られた混合物をハードシェルゼラチンカプセル又はヒドロキシプロピルメチルセルロースカプセルに充填し、カプセル剤を得る。 Formulation example 14
25 mg of any one of the compounds 1-177 of the present invention, 60 mg of lactose, 25 mg of corn starch, 6 mg of carmellose calcium, and an appropriate amount of 5% hydroxypropyl methylcellulose, and the resulting mixture is mixed with hard shell gelatin capsule or hydroxypropyl methylcellulose capsule To give capsules.
製剤例１５
　本発明化合物１～１７７のいずれか１種１００ｍｇ、フマル酸５００ｍｇ、塩化ナトリウム２０００ｍｇ、メチルパラベン１５０ｍｇ、プロピルパラベン５０ｍｇ、顆粒糖２５０００ｍｇ、ソルビトール（７０％溶液）１３０００ｍｇ、Ｖｅｅｇｕｍ（登録商標）Ｋ１００ｍｇ、香料３５ｍｇ、及び着色料５００ｍｇに、最終容量が１００ｍＬとなるよう蒸留水を加え、混合して、経口投与用サスペンジョンを得る。 Formulation example 15
100 mg of any one compound of the present invention 1-157, fumaric acid 500 mg, sodium chloride 2000 mg, methyl paraben 150 mg, propyl paraben 50 mg, granular sugar 25000 mg, sorbitol (70% solution) 13000 mg, Veegum K 100 mg, perfume 35 mg, And, to 500 mg of coloring agent, distilled water is added to a final volume of 100 mL and mixed to obtain an oral administration suspension.
製剤例１６
　本発明化合物１～１７７のいずれか１種５重量％を、乳化剤５重量％、ベンジルアルコール３重量％、及びプロピレングリコール３０重量％に混合し、この溶液のｐＨが６．０～６．５となるようにリン酸塩緩衝液を加えた後、残部として水を加えて、経口投与用液剤を得る。 Formulation example 16
5% by weight of any one of the compounds of the present invention 1-177 is mixed with 5% by weight of an emulsifier, 3% by weight of benzyl alcohol and 30% by weight of propylene glycol, and the pH of this solution is 6.0 to 6.5. After adding the phosphate buffer solution as it becomes, water is added as the balance to obtain a solution for oral administration.
製剤例１７
　分留ヤシ油５７重量％及び３重量％のポリソルベート８５中にジステアリン酸アルミニウム５重量％を加え、加熱により分散させる。これを室温に冷却し、その油状ビヒクル中にサッカリン２５重量％を分散させる。これに本発明化合物１～１７７のいずれか１種１０重量％を配分し、経口投与用ペースト状製剤を得る。 Formulation example 17
5% by weight of aluminum distearate is added to 57% by weight of fractionated palm oil and 3% by weight of polysorbate 85 and dispersed by heating. It is cooled to room temperature and 25% by weight of saccharin is dispersed in the oily vehicle. To this is distributed 10% by weight of any one of the compounds of the present invention 1-177 to obtain a paste-form preparation for oral administration.
製剤例１８
　本発明化合物１～１７７のいずれか１種５重量％を石灰石粉９５重量％と混合し、湿潤顆粒形成法を使用して経口投与用粒剤を得る。 Formulation example 18
5% by weight of any one of the compounds 1-177 of the present invention is mixed with 95% by weight of limestone powder to obtain granules for oral administration using a wet granulation method.
製剤例１９
　本発明化合物１～１７７のいずれか１種５部をジエチレングリコールモノエチルエーテル８０部に混合し、これに炭酸プロピレン１５部を混合して、スポットオン液剤を得る。 Formulation example 19
Five parts of any one of the compounds 1-177 of the present invention is mixed with 80 parts of diethylene glycol monoethyl ether, and 15 parts of propylene carbonate is mixed therewith to obtain a spot-on liquid agent.
製剤例２０
　本発明化合物１～１７７のいずれか１種１０部をジエチレングリコールモノエチルエーテル７０部に混合し、これに２－オクチルドデカノール２０部を混合して、ポアオン液剤を得る。 Formulation example 20
Ten parts of any one of the compounds of the present invention 1-177 is mixed with 70 parts of diethylene glycol monoethyl ether, and 20 parts of 2-octyldodecanol is mixed therewith to obtain a pour-on liquid agent.
製剤例２１
　本発明化合物１～１７７のいずれか１種０．５部に、ラウリル硫酸トリエタノールアミンの４２％水溶液６０部、及びプロピレングリコール２０部を添加し、均一溶液になるまで十分撹拌した後、水１９．５部を加えてさらに十分撹拌し、均一溶液のシャンプー剤を得る。 Formulation example 21
60 parts of a 42% aqueous solution of triethanolamine lauryl sulfate and 20 parts of propylene glycol are added to 0.5 part of any one of the compounds of the present invention 1-177, and 20 parts of propylene glycol is sufficiently stirred until a uniform solution is obtained. Add 5 parts and stir well to obtain a shampoo solution of uniform solution.
製剤例２２
　本発明化合物１～１７７のいずれか１種０．１５重量％、動物飼料９５重量％、並びに、第２リン酸カルシウム、珪藻土、Aerosil（登録商標）、及びカーボネート（又はチョーク）からなる混合物４．８５重量％を十分撹拌し、動物用飼料プレミックスを得る。 Formulation example 22
0.15 wt% of any one of the compounds 1-177 of the present invention, 95 wt% of animal feed, and 4.85 wt% of a mixture consisting of calcium phosphate dibasic, diatomaceous earth, Aerosil®, and carbonate (or chalk) Stir thoroughly to obtain an animal feed premix.
製剤例２３
　本発明化合物１～１７７のいずれか１種７．２ｇ、及び９２．８ｇのホスコ（登録商標）Ｓ－５５を１００℃で混合し、坐剤形に注いで、冷却固化して、坐剤を得る。 Formulation example 23
7.2 g of any one of the compounds 1-177 of the present invention and 92.8 g of FOSCO S-55 are mixed at 100 ° C., poured into a suppository form, and solidified by cooling to obtain a suppository obtain.
　次に、本発明化合物Xの有害生物に対する効力を試験例により示す。下記試験例において、試験は２５℃で行った。 Next, the efficacy of the present compound X against pests is shown by test examples. In the following test examples, the test was performed at 25 ° C.
試験法１
　供試化合物を製剤例５に記載の方法に準じて製剤とし、これにシンダイン（登録商標）を０．０３容量％含有する水を加え、供試化合物を所定濃度含有する希釈液を調製する。
　容器に植えたキュウリ（Cucumis sativus）苗（第２本葉展開期）にワタアブラムシ（全ステージ）約３０頭を接種する。１日後、この苗に該希釈液を１０ｍＬ／苗の割合で散布する。更に５日後、生存虫数を調査し、以下の式により防除価を求める。
　防除価（％）＝｛１－（Ｃｂ×Ｔａｉ）／（Ｃａｉ×Ｔｂ）｝×１００
なお、式中の文字は以下の意味を表す。
　　　Ｃｂ：無処理区の供試虫数
　　　Ｃａｉ：無処理区の調査時の生存虫数
　　　Ｔｂ：処理区の供試虫数
　　　Ｔａｉ：処理区の調査時の生存虫数
　ここで無処理区とは、供試化合物を使用しないこと以外は処理区と同じ操作をする区を意味する。 Test method 1
A test compound is prepared according to the method described in Preparation Example 5, and water containing 0.03% by volume of Syndyne (registered trademark) is added thereto to prepare a diluted solution containing a predetermined concentration of the test compound.
About 30 cotton aphids (all stages) are inoculated to cucumber (Cucumis sativus) seedlings (the second true leaf development stage) planted in a container. One day later, the seedlings are sprayed with the diluted solution at a rate of 10 mL / seedling. After 5 days, the number of surviving insects is examined, and the control value is determined by the following equation.
Control value (%) = {1- (Cb × Tai) / (Cai × Tb)} × 100
The letters in the formula have the following meanings.
Cb: Number of tested insects in untreated area Cai: Number of surviving insects in survey in untreated area Tb: Number of tested insects in treated zone Tai: Number of surviving insects in survey in treated area Here, untreated group means It means a zone that performs the same operation as the treatment zone except that the test compound is not used.
試験例１－１
　所定濃度を５００ｐｐｍとし、下記の本発明化合物を供試化合物として用いて試験法１に従って試験を行った結果、下記に記載の本発明化合物はいずれも防除価９０％以上を示した。
本発明化合物：１５、１６、１７、１８、２１、２２、２４、６０、６３、６５、７０、７２、７８、８１、８５、８６、８７、８８、８９、９１、９２、９７、９８、９９、１０２、１０３、１０４、１０５、１０７、１１２、１１３、１１４、１１７、１１８、１１９、１２１、１２３、１２４、１２７、１２８、１２９、１３１、１３３、１３４、１３５、１３６、１３７、１３８、１４３、１４４、１４７、１５１、１５４、１５５、１５６、１５９、１６６、１６７及び１６８ Test Example 1-1
As a result of conducting a test according to the test method 1 by setting a predetermined concentration to 500 ppm and using the following compound of the present invention as a test compound, all of the compounds of the present invention described below showed a control value of 90% or more.
Compounds of the present invention: 15, 16, 17, 18, 21, 22, 24, 60, 63, 65, 70, 72, 78, 81, 85, 86, 87, 88, 89, 91, 92, 97, 98, 99, 102, 103, 104, 105, 107, 112, 113, 114, 117, 118, 121, 123, 124, 127, 128, 129, 131, 133, 134, 135, 136, 137, 138, 138, 143, 144, 147, 151, 154, 155, 156, 159, 166, 167 and 168
試験例１－２
　所定濃度を２００ｐｐｍとし、下記の本発明化合物を供試化合物として用いて試験法１に従って試験を行った結果、下記の本発明化合物はいずれも防除価９０％以上を示した。
本発明化合物：１３、１７、１９、２０、２１、２３、２４、７２、９９、１０２、１０３、１０４、１０５、１１２、１１３、１１４、１１６、１１７、１１８、１１９、１２３、１２６、１２７、１２８、１２９、１３２、１３３、１３４、１３５、１３６、１３７、１４３、１４７及び１５６ Test Example 1-2
As a result of conducting a test according to the test method 1 by setting a predetermined concentration to 200 ppm and using the following compound of the present invention as a test compound, each of the following compounds of the present invention showed a control value of 90% or more.
Compounds of the present invention: 13, 17, 19, 20, 21, 23, 24, 72, 99, 102, 103, 104, 105, 112, 113, 114, 116, 117, 118, 119, 123, 126, 127, 128, 129, 132, 133, 134, 135, 136, 137, 143, 147 and 156
試験法２
　供試化合物を製剤例５に記載の方法に準じて製剤とし、これにシンダイン（登録商標）を０．０３容量％含有する水を加え、供試化合物を所定濃度含有する希釈液を調製する。
　容器に植えたキャベツ（Brassicae oleracea）苗（第２～３本葉展開期）に該希釈液を２０ｍＬ／苗の割合で散布する。その後、この苗の茎葉部を切り取り、ろ紙を敷いた容器内に入れる。これにハスモンヨトウ２齢幼虫５頭を放す。５日後、生存虫数を数え、次式より死虫率を求める。
　　　死虫率％＝（１－生存虫数／５）×１００ Test method 2
A test compound is prepared according to the method described in Preparation Example 5, and water containing 0.03% by volume of Syndyne (registered trademark) is added thereto to prepare a diluted solution containing a predetermined concentration of the test compound.
The diluted solution is sprayed at a rate of 20 mL / seedling to cabbage (Brassicae oleracea) seedlings (second to third leaf development stage) planted in a container. After that, the stems and leaves of this seedling are cut and placed in a container covered with filter paper. Release 5 2nd instar larvae to this. After 5 days, the number of living worms is counted, and the mortality rate is calculated from the following equation.
Mortality rate% = (1-number of surviving insects / 5) x 100
試験例２
　所定濃度を５００ｐｐｍとし、下記の本発明化合物を供試化合物として用いて試験法２に従って試験を行った結果、下記の本発明化合物はいずれも死虫率８０％以上を示した。
本発明化合物：９、１２、１３、１５、１６、１７、１９、２０、２２、２３、６２、６３、６４、７２、９９、１０２、１０３、１０４、１３２、１３３及び１３４ Test example 2
The test was conducted according to Test Method 2 using a compound of the present invention described below as a test compound at a predetermined concentration of 500 ppm. As a result, all of the compounds of the present invention described below showed a mortality of 80% or more.
The compounds of the present invention: 9, 12, 13, 15, 16, 17, 19, 20, 22, 23, 62, 63, 64, 72, 99, 102, 103, 104, 132, 133 and 134
試験法３
　供試化合物を製剤例５に記載の方法に準じて製剤とし、これにシンダイン（登録商標）を０．０３容量％含有する水を加え、供試化合物を所定濃度含有する希釈液を調製する。
　容器に植えたキャベツ苗（第２～３本葉展開期）に該希釈液を２０ｍＬ／苗の割合で散布する。その後、この苗の茎葉部を切り取り、ろ紙を敷いた容器内に入れる。これにコナガ２齢幼虫５頭を放す。５日後、生存虫数を数え、次式より死虫率を求める。
　　　死虫率％＝（１－生存虫数／５）×１００ Test method 3
A test compound is prepared according to the method described in Preparation Example 5, and water containing 0.03% by volume of Syndyne (registered trademark) is added thereto to prepare a diluted solution containing a predetermined concentration of the test compound.
The diluted solution is sprayed at a rate of 20 mL / seedling to cabbage seedlings (second to third leaf development stage) planted in a container. After that, the stems and leaves of this seedling are cut and placed in a container covered with filter paper. Release five 2nd instar larvae to this. After 5 days, the number of living worms is counted, and the mortality rate is calculated from the following equation.
Mortality rate% = (1-number of surviving insects / 5) x 100
試験例３
　所定濃度を５００ｐｐｍとし、下記の本発明化合物を供試化合物として用いて試験法３に従って試験を行った結果、下記の本発明化合物はいずれも死虫率８０％以上を示した。
本発明化合物：９、１２、１３、１５、１６、１７、１９、２０、２１、２２、２３、２４、５５、６０、６１、６２、６３、６４、６７、６９、７０、７２、７４、７８、８０、８１、８２、８５、８６、８７、８８、８９、９１、９３、９７、９８、９９、１０１、１０２、１０３、１０４、１０５、１０６、１０７、１０９、１１２、１１３、１１４、１１６、１１７、１１８、１１９、１２１、１２７、１２８、１２９、１３１、１３２、１３３、１３４、１３５、１３６、１３７、１３９、１４２、１４３、１４５、１５６、１５９、１６６、１６７及び１７０ Test Example 3
The compound of the present invention described below was used as a test compound and tested according to Test Method 3 with a predetermined concentration of 500 ppm. As a result, all of the compounds of the present invention showed a mortality of 80% or more.
The present invention compounds: 9, 12, 13, 15, 16, 17, 19, 20, 21, 22, 23, 24, 55, 60, 61, 62, 63, 64, 67, 69, 70, 72, 74, 78, 80, 81, 82, 85, 86, 87, 88, 89, 91, 93, 97, 98, 99, 101, 102, 103, 104, 105, 106, 107, 109, 112, 113, 114, 116, 117, 118, 119, 121, 127, 128, 129, 131, 132, 133, 134, 135, 136, 137, 139, 142, 143, 145, 156, 159, 166, 167 and 170
試験法４
　供試化合物を製剤例５に記載の方法に準じて製剤とし、これにシンダイン（登録商標）を０．０３容量％含有する水を加え、供試化合物を所定濃度含有する希釈液を調製する。
　容器に植えたイネ（Oryza sativa）苗（第２葉展開期）に該希釈液を１０ｍＬ／苗の割合で散布する。その後、トビイロウンカ３齢幼虫を２０頭放す。６日後、生存虫数を調査し、以下の式により死虫率を求める。
　　　死虫率（％）＝｛１－生存虫数／２０｝×１００ Test method 4
A test compound is prepared according to the method described in Preparation Example 5, and water containing 0.03% by volume of Syndyne (registered trademark) is added thereto to prepare a diluted solution containing a predetermined concentration of the test compound.
The diluted solution is sprayed at a rate of 10 mL / seedling to rice (Oryza sativa) seedlings (second leaf development stage) planted in a container. After that, release the 20 third instar larvae of the dead planthopper. Six days later, the number of surviving insects is examined, and the mortality rate is determined by the following equation.
Mortality rate (%) = {1-number of surviving insects / 20} x 100
試験例４
　所定濃度を５００ｐｐｍとし、下記の本発明化合物を供試化合物として用いて試験法４に従って試験を行った結果、下記の本発明化合物はいずれも死虫率９０％以上を示した。
本発明化合物：１７、１８、１９、２０、２１、２３、９９、１０２、１０３、１１２、１１６、１１７、１１８、１２９、１３１、１３２、１３３、１３５及び１５６ Test Example 4
The compound of the present invention described below was used as a test compound and tested according to Test Method 4 at a predetermined concentration of 500 ppm. As a result, all of the compounds of the present invention showed a mortality of 90% or more.
Compounds of the present invention: 17, 18, 19, 20, 21, 23, 99, 102, 103, 112, 116, 117, 118, 129, 131, 132, 133, 135 and 156
試験法５
　供試化合物を製剤例５に記載の方法に準じて製剤とし、これにシンダイン（登録商標）を０．０３容量％含有する水を加え、供試化合物を所定濃度含有する希釈液を調製する。
　容器に植えたトマト（Lycopersicon esculentum）苗に、タバココナジラミ成虫を放して約２４時間産卵させる。この苗を８日間保管し、産下された卵から幼虫を孵化させる。この苗に、該希釈液を１０ｍＬ／苗の割合で散布する。７日後、生存虫数を調査し、次の式により防除価を求める。
　防除価（％）＝｛１－（Ｃｂ×Ｔａｉ）／（Ｃａｉ×Ｔｂ）｝×１００
なお、式中の文字は以下の意味を表す。
　　　Ｃｂ：無処理区の処理直前の虫数
　　　Ｃａｉ：無処理区の調査時の生存虫数
　　　Ｔｂ：処理区の処理直前の虫数
　　　Ｔａｉ：処理区の調査時の生存虫数
　ここで無処理区とは、供試化合物を使用しないこと以外は処理区と同じ操作をする区を意味する。 Test method 5
A test compound is prepared according to the method described in Preparation Example 5, and water containing 0.03% by volume of Syndyne (registered trademark) is added thereto to prepare a diluted solution containing a predetermined concentration of the test compound.
In the tomato (Lycopersicon esculentum) seedlings planted in a container, the B. tabaci adults are released and allowed to lay eggs for about 24 hours. The seedlings are stored for 8 days, and larvae are hatched from the delivered eggs. The diluted solution is sprayed onto the seedlings at a rate of 10 mL / seedling. After 7 days, the number of surviving insects is investigated, and the control value is determined by the following equation.
Control value (%) = {1- (Cb × Tai) / (Cai × Tb)} × 100
The letters in the formula have the following meanings.
Cb: The number of insects immediately before the treatment in the untreated zone Cai: The number of living insects in the survey of the untreated region Tb: The number of insects just before the treatment in the treated zone Tai: The number of living insects in the survey of the treated region Means a zone which performs the same operation as the treatment zone except that the test compound is not used.
試験例５
　所定濃度を５００ｐｐｍとし、下記の本発明化合物を供試化合物として用いて試験法５に従って試験を行った結果、下記の本発明化合物はいずれも防除価９０％以上を示した。
本発明化合物：１７、１８、２３、９９、１０２、１０３、１１２、１１３、１１４、１１６、１２６、１２７、１２９、１３２、１３３、１３５、１３７、１４３、１４７及び１５６ Test Example 5
As a result of conducting a test according to the test method 5 by setting a predetermined concentration to 500 ppm and using the following compound of the present invention as a test compound, each of the following compounds of the present invention showed a control value of 90% or more.
The compounds of the present invention: 17, 18, 23, 99, 102, 103, 112, 113, 114, 116, 126, 127, 129, 132, 133, 135, 137, 143, 147 and 156
試験法６
　供試化合物を製剤例５に記載の方法に準じて製剤とし、これにシンダイン（登録商標）を０．０３容量％含有する水を加え、供試化合物を所定濃度含有する希釈液を調製する。
　容器に植えたキュウリ苗（第２葉展開期）に該希釈液を１０ｍＬ／苗の割合で散布する。その後、第１本葉を切り取り容器内に収容し、これにミカンキイロアザミウマの幼虫を約２０頭放す。７日後、生存虫数を調査し、次の式により死虫率を求める。
　　　死虫率（％）＝｛１－生存虫数／２０｝×１００ Test method 6
A test compound is prepared according to the method described in Preparation Example 5, and water containing 0.03% by volume of Syndyne (registered trademark) is added thereto to prepare a diluted solution containing a predetermined concentration of the test compound.
The diluted solution is sprayed at a rate of 10 mL / seedling to cucumber seedlings (second leaf development stage) planted in a container. After that, the first true leaf is cut out and placed in a container, and about 20 larvae of C. thunans are released. After 7 days, the number of surviving insects is examined, and the mortality rate is determined by the following equation.
Mortality rate (%) = {1-number of surviving insects / 20} x 100
試験法７
　供試化合物を製剤例５に記載の方法に準じて製剤とし、これにシンダイン（登録商標）を０．０３容量％含有する水を加え、供試化合物を所定濃度含有する希釈液を調製する。
　容器に植えたインゲンマメ（Phaseolus vulgaris）苗（第１本葉展開期）に約４０頭のナミハダニ雌成虫を放つ。１日後、この苗に該希釈液を１０ｍＬ／苗の割合で散布する。更に７日後、生存虫数を調査し、次式により防除価を算出する。
　防除価（％）＝｛１－（Ｃｂ×Ｔａｉ）／（Ｃａｉ×Ｔｂ）｝×１００
なお、式中の文字は以下の意味を表す。
　　　Ｃｂ：無処理区の供試虫数
　　　Ｃａｉ：無処理区の調査時の生存虫数
　　　Ｔｂ：処理区の供試虫数
　　　Ｔａｉ：処理区の調査時の生存虫数
　ここで無処理区とは、供試化合物を使用しないこと以外は処理区と同じ操作をする区を意味する。 Test method 7
A test compound is prepared according to the method described in Preparation Example 5, and water containing 0.03% by volume of Syndyne (registered trademark) is added thereto to prepare a diluted solution containing a predetermined concentration of the test compound.
About 40 adult spider mite mites are released on kidney bean (Phaseolus vulgaris) seedlings (first true leaf development stage) planted in a container. One day later, the seedlings are sprayed with the diluted solution at a rate of 10 mL / seedling. After 7 days, the number of surviving insects is examined, and the control value is calculated by the following equation.
Control value (%) = {1- (Cb × Tai) / (Cai × Tb)} × 100
The letters in the formula have the following meanings.
Cb: Number of tested insects in untreated area Cai: Number of surviving insects in survey in untreated area Tb: Number of tested insects in treated zone Tai: Number of surviving insects in survey in treated area Here, untreated group means It means a zone that performs the same operation as the treatment zone except that the test compound is not used.
試験例７
　所定濃度を５００ｐｐｍとし、下記の本発明化合物を供試化合物として用いて試験法７に従って試験を行った結果、下記の本発明化合物はいずれも防除価９０％以上を示した。
本発明化合物：２２、９９、１００、１０２、１０３、１０７、１１２、１１３、１１４、１１６、１１８、１２６、１２９、１３２、１３３、１３７、１４３、１４７、１５６、１６６及び１６８ Test Example 7
As a result of conducting a test according to the test method 7 by setting a predetermined concentration to 500 ppm and using the following compound of the present invention as a test compound, each of the following compounds of the present invention showed a control value of 90% or more.
Compounds of the present invention: 22, 99, 100, 102, 103, 107, 112, 113, 114, 116, 118, 126, 129, 132, 133, 137, 143, 147, 156, 166 and 168
試験法８
　供試化合物を製剤例５に記載の方法に準じて製剤とし、これに水を加え、供試化合物を所定濃度含有する希釈液を調製する。
　該希釈液中にアカイエカ終齢幼虫３０頭を放ち、７日後にその生死を調査し死虫率を求める。死虫率は下式により計算する。
　　　死虫率（％）＝（死亡虫数／供試虫数）×１００ Test method 8
A test compound is formulated according to the method described in Formulation Example 5, water is added thereto, and a diluted solution containing the test compound at a predetermined concentration is prepared.
In the diluted solution, 30 final-instar larvae of Culex pipiens are released, and after 7 days, their life and death are examined to determine the mortality rate. The mortality rate is calculated by the following formula.
Mortality rate (%) = (number of dead insects / number of test insects) x 100
試験例８
　所定濃度を３．５ｐｐｍとし、下記の本発明化合物を供試化合物として用いて試験法８に従って試験を行った結果、下記の本発明化合物はいずれも死虫率９１％以上を示した。
本発明化合物：１２、１３、１５、１６、１９、２０、２２、２４、６２、６６、６７、７２、７４、７６、８１、８２、８５、８６、８７、９８、９９、１０１、１０２、１０４、１０６、１０８、１１２、１１３、１１５、１１６、１１７、１１８、１１９、１２４、１２６、１２７、１２９、１３２、１３３、１３４、１３５、１３６、１３７、１３９、１４１、１４２、１５４、１５５、１５６、１５９及び１６８ Test Example 8
The compound of the present invention described below was tested as a test compound at a predetermined concentration of 3.5 ppm, and all of the compounds of the present invention exhibited a mortality of 91% or more.
The compound of the present invention: 12, 13, 15, 16, 19, 20, 22, 24, 62, 66, 67, 72, 74, 76, 81, 82, 85, 86, 87, 98, 99, 101, 102, 104, 106, 108, 112, 113, 115, 116, 117, 119, 124, 126, 127, 129, 132, 133, 134, 135, 136, 137, 139, 141, 142, 154, 155, 156, 159 and 168
試験法９
　供試化合物を製剤例５に記載の方法に準じて製剤とし、これに水を加え、供試化合物を所定濃度含有する希釈液を調製する。
　直径５．５ｃｍのカップの内側底部に同大の濾紙を敷き、濾紙上に該希釈液０．７ｍＬを滴下し、餌として該カップにショ糖３０ｍｇを均一に入れる。該カップにイエバエ雌成虫１０頭を放ち、蓋をする。２４時間後にイエバエの生死を調査し死虫率を求める。死虫率は下式により計算する。
　　　死虫率（％）＝（死亡虫数／供試虫数）×１００ Test method 9
A test compound is formulated according to the method described in Formulation Example 5, water is added thereto, and a diluted solution containing the test compound at a predetermined concentration is prepared.
The same size filter paper is placed on the inner bottom of a 5.5 cm diameter cup, and 0.7 mL of the diluted solution is dropped on the filter paper, and 30 mg of sucrose is uniformly poured into the cup as a bait. Release 10 adult housefly female adults into the cup and cover. After 24 hours, investigate the life and death of the housefly and determine the mortality rate. The mortality rate is calculated by the following formula.
Mortality rate (%) = (number of dead insects / number of test insects) x 100
試験例９
　所定濃度を５００ｐｐｍとし、下記の本発明化合物を供試化合物として用いて試験法９に従って試験を行った結果、下記の本発明化合物はいずれも死虫率８０％以上を示した。
本発明化合物：１９、２３、７２、９８、９９、１０３、１１３、１１６、１１７、１１８、１１９、１２９、１３２、１３３及び１５６ Test Example 9
The compound of the present invention described below was tested as a test compound at a predetermined concentration of 500 ppm, and all of the compounds of the present invention exhibited a mortality of 80% or more.
The compounds of the present invention: 19, 23, 72, 98, 99, 103, 113, 116, 117, 118, 119, 129, 132, 133 and 156
試験法１０
　供試化合物を製剤例５に記載の方法に準じて製剤とし、これに水を加え、供試化合物を所定濃度含有する希釈液を調製する。
　直径５．５ｃｍのカップの内側底部に同大の濾紙を敷き、濾紙上に該希釈液０．７ｍＬを滴下し、餌として該カップにショ糖３０ｍｇを均一に入れる。該カップにチャバネゴキブリ雄成虫２頭を放ち、蓋をする。６日後にチャバネゴキブリの生死を調査し死亡虫数を数え、次式により死虫率を求める。
　　　死虫率（％）＝（死亡虫数／供試虫数）×１００ Test method 10
A test compound is formulated according to the method described in Formulation Example 5, water is added thereto, and a diluted solution containing the test compound at a predetermined concentration is prepared.
The same size filter paper is placed on the inner bottom of a 5.5 cm diameter cup, and 0.7 mL of the diluted solution is dropped on the filter paper, and 30 mg of sucrose is uniformly poured into the cup as a bait. Put two male adult German cockroaches into the cup and cover. After 6 days, the life and death of the German cockroach are investigated, the number of dead insects is counted, and the mortality rate is determined by the following equation.
Mortality rate (%) = (number of dead insects / number of test insects) x 100
試験例１０
　所定濃度を５００ｐｐｍとし、下記の本発明化合物を供試化合物として用いて試験法１０に従って試験を行った結果、下記の本発明化合物は死虫率１００％を示した。
本発明化合物：１１９ Test Example 10
The compound of the present invention described below showed a mortality of 100% as a result of conducting tests according to Test Method 10 using a compound of the present invention described below as a test compound with a predetermined concentration of 500 ppm.
The compound of the present invention: 119
試験法１１
　供試化合物を２００ｐｐｍ含有するように調製したアセトン溶液を内容量２０ｍＬの容器に入れ、供試化合物が１０ｍｇ／ｍ2となるように容器の内面に均一にコーティングし、その後乾燥させる。
　該容器にアカイエカ雌成虫５頭を入れ、蓋を閉める。所定時間経過後にノックダウン虫数と死亡虫数との合計（苦死虫数）を調査し、次式により苦死虫率を求める。
　　　苦死虫率（％）＝（苦死虫数／供試虫数）×１００ Test method 11
An acetone solution prepared so as to contain 200 ppm of the test compound is placed in a container having a capacity of 20 mL, uniformly coated on the inner surface of the container so that the test compound is 10 mg / m 2, and then dried.
Put 5 adult female house mosquitoes into the container and close the lid. After the lapse of a predetermined time, the total of the number of knocked-down insects and the number of dead insects (the number of dead insects) is examined, and the mortality rate is determined by the following equation.
Writhing rate (%) = (number of writhing insects / number of test insects) x 100
試験例１１－１
　所定時間を１時間とし、下記の本発明化合物を供試化合物として用いて試験法１１に従って試験を行った結果、下記の本発明化合物はいずれも苦死虫率８０％以上を示した。
本発明化合物：１１９、１２３及び１２６ Test Example 11-1
The test was conducted according to Test Method 11 using the following compound of the present invention as a test compound, with the predetermined time being 1 hour. As a result, all of the following compounds of the present invention exhibited a mortality of 80% or more.
The compounds of the present invention: 119, 123 and 126
試験例１１－２
　所定時間を１日とし、下記の本発明化合物を供試化合物として用いて試験法１１に従って試験を行った結果、下記の本発明化合物はいずれも苦死虫率８０％以上を示した。
本発明化合物：２０、２３、２４、４５、５５、９１、１００、１０１、１０２、１０３、１１６、１１８、１１９、１２２、１２３、１２６、１２９、１３２、１３３、１３４、１３５、１４６、１４８、１５５、１５６及び１６８ Test Example 11-2
As a result of conducting a test according to the test method 11 by setting the predetermined time to 1 day and using the following compound of the present invention as a test compound, all of the following compounds of the present invention showed a mortality of 80% or more.
Compounds of the present invention: 20, 23, 24, 45, 55, 91, 100, 101, 102, 103, 116, 118, 119, 122, 126, 129, 132, 133, 134, 135, 146, 148, 155, 156 and 168
試験法１２
　プラスチックポットに土壌を詰め、そこにイネ（品種；ヒノヒカリ）を播種し、温室内で２０日間栽培する。その後、製剤例５に記載の方法に準じて製剤化された供試化合物を所定濃度となるように水と混合し、該混合物を、上記イネの葉面に充分付着するように茎葉散布する。散布後、イネを風乾し、昼間２４℃、夜間２０℃多湿下で、前記散布処理をしたイネと、イネいもち病菌（Magnaporthe grisea）に罹病したイネ苗（品種；ヒノヒカリ）とを接触させながら６日間置いた後、病斑面積を調査する。 Test method 12
The soil is packed in a plastic pot, and rice (variety; Hinohikari) is sown and grown in a greenhouse for 20 days. Thereafter, a test compound formulated according to the method described in Formulation Example 5 is mixed with water so as to have a predetermined concentration, and the mixture is sprayed with stem and leaf so as to sufficiently adhere to the above-mentioned rice leaf surface. After spraying, the rice is air-dried, and the sprayed rice is contacted at 24 ° C in the daytime and at 20 ° C in the nighttime, while contacting the rice seedling (cultivar: Hinohikari) infected with rice blast fungus (Magnaporthe grisea) 6 After leaving for days, investigate the lesion area.
試験例１２
　所定濃度を５００ｐｐｍとし、下記の本発明化合物を供試化合物として用いて試験法１２に従って試験を行った結果、下記の本発明化合物を処理したイネにおける病斑面積は、いずれも無処理のイネにおける病斑面積の３０％以下であった。
本発明化合物：２３及び１３５ Test Example 12
As a result of conducting a test according to test method 12 by using a compound of the present invention described below as a test compound with a predetermined concentration of 500 ppm, the lesion area in rice treated with the compound of the present invention described below is all in untreated rice Less than 30% of the lesion area.
The compound of the present invention: 23 and 135
試験法１３
　プラスチックポットに土壌を詰め、そこにオオムギ（品種；ニシノホシ）を播種し、温室で７日間栽培する。製剤例５に記載の方法に準じて製剤化された供試化合物を、所定濃度となるように水と混合し、該混合物を、上記オオムギの葉面に充分付着するように茎葉散布する。散布後オオムギを風乾し、２日後にオオムギ網斑病菌（Pyrenophora teres）胞子の水懸濁液を噴霧接種する。接種後オオムギを昼間２３℃、夜間２０℃の温室内で多湿下に３日間置き、次に温室内で７日間栽培した後、病斑面積を調査する。 Test method 13
The soil is packed in a plastic pot, and barley (variety: Nishinohoshi) is sown and cultivated in a greenhouse for 7 days. A test compound formulated according to the method described in Formulation Example 5 is mixed with water to a predetermined concentration, and the mixture is foliated to sufficiently adhere to the surface of the barley leaves. After spraying, the barley is air-dried, and two days later, it is spray-inoculated with an aqueous suspension of barley reticulum (Pyrenophora teres) spores. After inoculation, barley is placed in a greenhouse at 23 ° C. in the daytime at 20 ° C. in a humid atmosphere for 3 days, and then grown for 7 days in a greenhouse, and then the lesion area is examined.
試験例１３
　所定濃度を５００ｐｐｍとし、下記の本発明化合物を供試化合物として用いて試験法１３に従って試験を行った結果、下記の本発明化合物を処理したオオムギにおける病斑面積は、いずれも無処理のオオムギにおける病斑面積の３０％以下であった。
本発明化合物：１３、１４、１５、１６、２０、２１、２２、２４、５５、６０、７２、７４、９９、１００、１２７、１３１、１５６及び１５９ Test Example 13
As a result of conducting a test according to the test method 13 by using a compound of the present invention described below as a test compound, the lesion area in barley treated with the compound of the present invention described below was all in untreated barley Less than 30% of the lesion area.
Compounds of the present invention: 13, 14, 15, 16, 20, 21, 22, 24, 55, 60, 72, 74, 99, 100, 127, 131, 156 and 159
試験法１４
　プラスチックポットに土壌を詰め、そこにコムギ（品種；アポジー）を播種し、温室内で１０日間生育させる。製剤例５に記載の方法に準じて製剤化された供試化合物を、所定濃度となるように水と混合し、該混合物を、上記コムギの葉面に充分付着するように茎葉散布する。散布後コムギを風乾し、４日後にコムギ葉枯病菌（Septoria tritici）胞子の水懸濁液を噴霧接種する。接種後コムギを１８℃多湿下に３日間置き、次に照明下に１４日から１８日間置いた後、病斑面積を調査する。 Test method 14
The soil is packed in a plastic pot and wheat (variety; apozy) is sown and grown in a greenhouse for 10 days. A test compound formulated according to the method described in Formulation Example 5 is mixed with water to a predetermined concentration, and the mixture is foliated to sufficiently adhere to the leaf surface of the wheat. After spraying, the wheat is air-dried, and four days later, it is spray-inoculated with an aqueous suspension of wheat spore (Septoria tritici) spore. After inoculation wheat is placed under a humid atmosphere at 18 ° C. for 3 days and then under illumination for 14 to 18 days, and then the lesion area is examined.
試験例１４
　所定濃度を５００ｐｐｍとし、下記の本発明化合物を供試化合物として用いて試験法１４に従って試験を行った結果、下記の本発明化合物を処理したコムギにおける病斑面積は、いずれも無処理のコムギにおける病斑面積の３０％以下であった。
本発明化合物：９、１２、１３、１４、１５、１６、１７、１９、２０、２１、２２、２３、６５、７４、７７、１１４、１１５及び１２７ Test Example 14
As a result of conducting a test according to the test method 14 by setting a predetermined concentration to 500 ppm and using the following compound of the present invention as a test compound, the lesion area in the wheat treated with the following compound of the present invention is all in untreated wheat Less than 30% of the lesion area.
The compounds of the present invention: 9, 12, 13, 14, 15, 16, 17, 19, 20, 21, 22, 23, 65, 74, 77, 114, 115 and 127
試験法１５
　プラスチックポットに土壌を詰め、そこにコムギ（品種；シロガネ）を播種し、温室内で９日間生育させる。製剤例５に記載の方法に準じて製剤化された供試化合物を、所定濃度となるように水と混合し、該混合物を、上記コムギの葉面に充分付着するように茎葉散布する。散布後コムギを風乾し、２０℃、照明下で５日間栽培した後、コムギのさび病菌（Puccinia recondita）胞子をふりかけ接種する。接種後コムギを２３℃、暗黒多湿下に１日間置いた後、２０℃、照明下で８日間栽培し、病斑面積を調査する。 Test method 15
The soil is packed in a plastic pot, sown with wheat (variety; Shirogane) and grown in a greenhouse for 9 days. A test compound formulated according to the method described in Formulation Example 5 is mixed with water to a predetermined concentration, and the mixture is foliated to sufficiently adhere to the leaf surface of the wheat. After spraying, the wheat is air-dried and cultivated at 20 ° C. under illumination for 5 days, and then the wheat spores of rust (Puccinia recondita) are sprinkled and inoculated. After inoculation, wheat is placed at 23 ° C. in dark and humid for 1 day, then grown at 20 ° C. in illumination for 8 days, and the lesion area is examined.
試験例１５
　所定濃度を５００ｐｐｍとし、下記の本発明化合物を供試化合物として用いて試験法１５に従って試験を行った結果、下記の本発明化合物を処理したコムギにおける病斑面積は、いずれも無処理のコムギにおける病斑面積の３０％以下であった。
本発明化合物：１２、１３、２０、５５、６２、６４、８６、１１６、１１８、１３２、１３５、１５６及び１５９ Test Example 15
As a result of conducting a test according to the test method 15 by setting a predetermined concentration to 500 ppm and using the following compound of the present invention as a test compound, as for the lesion area in the wheat treated with the following compound of the present invention Less than 30% of the lesion area.
Compounds of the present invention: 12, 13, 20, 55, 62, 64, 86, 116, 118, 132, 135, 156 and 159
試験法１６
　プラスチックポットに土壌を詰め、そこにキュウリ（品種；相模半白）を播種し、温室内で１２日間生育させる。その後、製剤例５に記載の方法に準じて製剤化された供試化合物を、所定濃度となるように水と混合し、該混合物を、上記キュウリの葉面に充分付着するように茎葉散布する。散布後キュウリを風乾し、昼間２４℃、夜間２０℃の温室に１日間置いた後、キュウリうどんこ病菌（Sphaerotheca fuliginea）に罹病したキュウリ苗（品種；相模半白）の胞子をふりかけ接種する。キュウリを昼間２４℃、夜間２０℃の温室に８日間栽培した後、病斑面積を調査する。 Test method 16
The soil is packed in a plastic pot, and a cucumber (variety; Sagami Hankaku) is sown and grown in a greenhouse for 12 days. Thereafter, a test compound formulated according to the method described in Formulation Example 5 is mixed with water so as to obtain a predetermined concentration, and the mixture is foliage-dispersed so as to sufficiently adhere to the above-mentioned cucumber leaf surface. . After spraying, the cucumbers are air-dried and kept in a greenhouse at daytime 24 ° C. and nighttime at 20 ° C. for 1 day, and then spores of cucumber seedlings (variety: Sagami semi-white) infected with cucumber powdery mildew (Sphaerotheca fuliginea) are sprinkled and inoculated. The cucumber is grown in a greenhouse at 24 ° C. in the daytime and at 20 ° C. in the night for 8 days, and then the lesion area is examined.
試験例１６
　所定濃度を５００ｐｐｍとし、下記の本発明化合物を供試化合物として用いて試験法１６に従って試験を行った結果、下記の本発明化合物を処理したキュウリにおける病斑面積は、いずれも無処理のキュウリにおける病斑面積の３０％以下であった。
本発明化合物：１８、６６、９７、９９、１００、１０１、１１２、１１６、１３２及び１３３ Test Example 16
As a result of conducting a test according to the test method 16 by setting a predetermined concentration to 500 ppm and using the following compound of the present invention as a test compound, as for the lesion area in the cucumber treated with the following compound of the present invention Less than 30% of the lesion area.
Compounds of the present invention: 18, 66, 97, 99, 100, 101, 112, 116, 132 and 133
試験法１７
　プラスチックポットに土壌を詰め、そこにインゲン（品種；長鶉菜豆）を播種し、温室内で８日間生育させる。製剤例５に記載の方法に準じて製剤化された供試化合物を、所定濃度となるように水と混合し、該混合物を、上記インゲン葉面に充分付着するように茎葉散布する。散布後インゲンを風乾し、インゲン菌核病菌（Sclerotinia sclerotiorum）の菌糸含有ＰＤＡ培地をインゲン葉面上に置く。接種後全てのインゲンは夜間のみ多湿下に置き、接種４日後に病斑面積を調査する。 Test method 17
The soil is packed in a plastic pot, green beans (variety; long-leaved vegetables) are sown and grown in a greenhouse for 8 days. A test compound formulated according to the method described in Formulation Example 5 is mixed with water to a predetermined concentration, and the mixture is sprayed with stem and leaf so as to sufficiently adhere to the above-mentioned bean leaf surface. After spraying, the beans are air-dried, and a mycelium-containing PDA medium of Sclerotinia sclerotiorum is placed on the bean leaves. After inoculation, place all beans in humid conditions only at night, and investigate the lesion area 4 days after inoculation.
試験例１７
　所定濃度を５００ｐｐｍとし、下記の本発明化合物を供試化合物として用いて試験法１７に従って試験を行った結果、下記の本発明化合物を処理したインゲンにおける病斑面積は、いずれも無処理のインゲンにおける病斑面積の３０％以下であった。
本発明化合物：１３及び２０ Test Example 17
As a result of conducting a test according to the test method 17 by setting a predetermined concentration to 500 ppm and using the following compound of the present invention as a test compound, lesion areas in beans treated with the following compound of the present invention are all untreated beans Less than 30% of the lesion area.
The compounds of the present invention: 13 and 20
試験法１８
　プラスチックポットに土壌を詰め、そこにトマト（品種；パティオ）を播種し、温室内で１３日間栽培する。製剤例５に記載の方法に準じて製剤化された供試化合物を、所定濃度となるように水と混合し、該混合物を、上記トマト葉面に充分付着するように茎葉散布する。散布後トマトを風乾し、１日後にトマト疫病菌（Phytophthora infestans）胞子の水懸濁液を噴霧接種する。接種後２３℃、多湿下に１日間置き、１８℃の温室で５日間栽培した後、病斑面積を調査する。 Test method 18
Fill soil in a plastic pot, sow tomatoes (variety; patio) and grow in a greenhouse for 13 days. A test compound formulated according to the method described in Formulation Example 5 is mixed with water to a predetermined concentration, and the mixture is sprayed with leaves and leaves to sufficiently adhere to the tomato leaf surface. After spraying, the tomato is air-dried, and one day later, it is spray-inoculated with an aqueous suspension of Phytophthora infestans spores. After inoculation, it is placed at 23 ° C. under humid conditions for 1 day, and grown for 5 days in a 18 ° C. greenhouse, and then the lesion area is examined.
試験例１８
　所定濃度を５００ｐｐｍとし、下記の本発明化合物を供試化合物として用いて試験法１８に従って試験を行った結果、下記の本発明化合物を処理したトマトにおける病斑面積は、いずれも無処理のトマトにおける病斑面積の３０％以下であった。
本発明化合物：１０、１４、１７、２１、２３、７２、８５、９９、１１２、１１６、１２９、１５４、１５６及び１５８ Test Example 18
The test was carried out according to test method 18 using a compound of the present invention described below as a test compound with a prescribed concentration of 500 ppm, and as a result, the area of lesions on the tomato treated with the compound of the present invention described below was all in untreated tomato Less than 30% of the lesion area.
Compounds of the present invention: 10, 14, 17, 21, 23, 72, 85, 99, 112, 116, 129, 154, 156 and 158
　本発明化合物Ｘは、有害生物に対して優れた防除効果を示す。 The compound of the present invention X exhibits an excellent control effect on pests.

Claims (11)

  1. 　式（Ｉ）
    Figure JPOXMLDOC01-appb-C000001
     〔式中、
    　Ａｒは、Ｃ６－Ｃ１０アリール基又は３－１０員複素環基｛該Ｃ６－Ｃ１０アリール基及び該３－１０員複素環基は、群Ａより選ばれる１以上の置換基を有していてもよい｝を表し、
    　ＲA及びＲBの組み合わせは、
    　　ＲAがＣ１－Ｃ１０アルカンジイル基、Ｃ２－Ｃ１０アルケンジイル基、エチンジイル基、Ｃ３－Ｃ１０アルキンジイル基、Ｃ３－Ｃ８シクロアルカンジイル基、Ｃ３－Ｃ８シクロアルケンジイル基｛該Ｃ１－Ｃ１０アルカンジイル基、該Ｃ２－Ｃ１０アルケンジイル基、該Ｃ３－Ｃ１０アルキンジイル基、該Ｃ３－Ｃ８シクロアルカンジイル基及び該Ｃ３－Ｃ８シクロアルケンジイル基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝、フェニレン基、ナフチレン基、チエニレン基、フラニレン基、ピロリレン基、チアゾリレン基、イソチアゾリレン基、オキサゾリレン基、イソオキサゾリレン基、ピラゾリレン基、イミダゾリレン基、トリアゾリレン基、ピリジレン基、ピリダジニレン基、ピリミジニレン基、ピラジニレン基、トリアジニレン基｛該フェニレン基、該ナフチレン基、該チエニレン基、該フラニレン基、該ピロリレン基、該チアゾリレン基、該イソチアゾリレン基、該オキサゾリレン基、該イソオキサゾリレン基、該ピラゾリレン基、該イミダゾリレン基、該トリアゾリレン基、該ピリジレン基、該ピリダジニレン基、該ピリミジニレン基、該ピラジニレン基及び該トリアジニレン基は、群Ｄより選ばれる１以上の置換基を有していてもよい｝、チアジアゾリレン基、オキサジアゾリレン基又はテトラジニレン基であり、ＲBが単結合である組み合わせ；
    　　ＲAがＣ１－Ｃ３アルカンジイル基、Ｃ２－Ｃ３アルケンジイル基、エチンジイル基又はプロピンジイル基｛該Ｃ１－Ｃ３アルカンジイル基、該Ｃ２－Ｃ３アルケンジイル基及び該プロピンジイル基は、シアノ基、ハロゲン原子、ヒドロキシ基及びＣ２－Ｃ６アルキルカルボニルオキシ基からなる群より選ばれる１以上の置換基を有していてもよい｝であり、ＲBがＣ３－Ｃ８シクロアルカンジイル基、Ｃ３－Ｃ８シクロアルケンジイル基｛該Ｃ３－Ｃ８シクロアルカンジイル基及び該Ｃ３－Ｃ８シクロアルケンジイル基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝、フェニレン基、ナフチレン基、チエニレン基、フラニレン基、ピロリレン基、チアゾリレン基、イソチアゾリレン基、オキサゾリレン基、イソオキサゾリレン基、ピラゾリレン基、イミダゾリレン基、トリアゾリレン基、ピリジレン基、ピリダジニレン基、ピリミジニレン基、ピラジニレン基、トリアジニレン基｛該フェニレン基、該ナフチレン基、該チエニレン基、該フラニレン基、該ピロリレン基、該チアゾリレン基、該イソチアゾリレン基、該オキサゾリレン基、該イソオキサゾリレン基、該ピラゾリレン基、該イミダゾリレン基、該トリアゾリレン基、該ピリジレン基、該ピリダジニレン基、該ピリミジニレン基、該ピラジニレン基及び該トリアジニレン基は、群Ｄより選ばれる１以上の置換基を有していてもよい｝、チアジアゾリレン基、オキサジアゾリレン基又はテトラジニレン基である組み合わせ；又は、
    　　ＲAがＣ３－Ｃ８シクロアルカンジイル基、Ｃ３－Ｃ８シクロアルケンジイル基｛該Ｃ３－Ｃ８シクロアルカンジイル基及び該Ｃ３－Ｃ８シクロアルケンジイル基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝、フェニレン基、ナフチレン基、チエニレン基、フラニレン基、ピロリレン基、チアゾリレン基、イソチアゾリレン基、オキサゾリレン基、イソオキサゾリレン基、ピラゾリレン基、イミダゾリレン基、トリアゾリレン基、ピリジレン基、ピリダジニレン基、ピリミジニレン基、ピラジニレン基、トリアジニレン基｛該フェニレン基、該ナフチレン基、該チエニレン基、該フラニレン基、該ピロリレン基、該チアゾリレン基、該イソチアゾリレン基、該オキサゾリレン基、該イソオキサゾリレン基、該ピラゾリレン基、該イミダゾリレン基、該トリアゾリレン基、該ピリジレン基、該ピリダジニレン基、該ピリミジニレン基、該ピラジニレン基及び該トリアジニレン基は、群Ｄより選ばれる１以上の置換基を有していてもよい｝、チアジアゾリレン基、オキサジアゾリレン基又はテトラジニレン基であり、ＲBがＣ１－Ｃ３アルカンジイル基、Ｃ２－Ｃ３アルケンジイル基、エチンジイル基又はプロピンジイル基｛該Ｃ１－Ｃ３アルカンジイル基、該Ｃ２－Ｃ３アルケンジイル基及び該プロピンジイル基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝である組み合わせを表し、
    　Ｒ2、Ｒ4及びＲ5は、同一又は相異なり、群Ｂより選ばれる１以上の置換基を有していてもよい３－６員脂環式炭化水素基又は１以上のハロゲン原子を有していてもよいＣ１－Ｃ４鎖式炭化水素基を表し、
    　Ｒ3は、Ｃ１－Ｃ３鎖式炭化水素基｛該Ｃ１－Ｃ３鎖式炭化水素基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝、（Ｃ１－Ｃ３アルコキシ）Ｃ１－Ｃ３アルキル基、群Ａより選ばれる１以上の置換基を有していてもよいベンジル基、ホルミル基、Ｃ（Ｏ）Ｒ8、Ｃ（Ｏ）ＯＲ8又は水素原子を表し、
    　Ｒ8は、Ｃ１－Ｃ４鎖式炭化水素基又はシクロプロピル基｛該Ｃ１－Ｃ４鎖式炭化水素基及び該シクロプロピル基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝を表し、
    　Ｌ1は、単結合、－ＬA－Ｏ－＃、－ＬA－ＮＲ6－＃、－ＬA－Ｓ（Ｏ）m－＃、－ＬA－Ｏ－Ｎ＝ＣＲ7－＃、－ＬB－ＣＲ7＝Ｎ－Ｏ－＃、又は－ＬB－ＣＲ7＝Ｎ－ＮＲ6－＃を表し、
    　＃は、ＲAとの結合位置を表し、
    　Ｒ6及びＲ7は、同一又は相異なり、１以上のハロゲン原子を有していてもよいＣ１－Ｃ３アルキル基又は水素原子を表し、
    　ＬAは、Ｃ１－Ｃ３アルカンジイル基、Ｃ２－Ｃ３アルケンジイル基、エチンジイル基又はプロピンジイル基｛該Ｃ１－Ｃ３アルカンジイル基、該Ｃ２－Ｃ３アルケンジイル基及び該プロピンジイル基は、群Ｃより選ばれる１以上の置換基を有していてもよい｝を表し、
    　ＬBは、単結合、Ｃ１－Ｃ３アルカンジイル基、Ｃ２－Ｃ３アルケンジイル基、エチンジイル基又はプロピンジイル基｛該Ｃ１－Ｃ３アルカンジイル基、該Ｃ２－Ｃ３アルケンジイル基及び該プロピンジイル基は、群Ｃより選ばれる１以上の置換基を有していてもよい｝を表し、
    　Ｌ2は、単結合、酸素原子、Ｓ（Ｏ）p、Ｃ１－Ｃ３アルカンジイル基、ＮＲ15又は－Ｏ－Ｎ＝ＣＲ16－＊を表し、
    　＊は、Ａｒとの結合位置を表し、
    　Ｒ15及びＲ16は、同一又は相異なり、１以上のハロゲン原子を有していてもよいＣ１－Ｃ３アルキル基又は水素原子を表し、
    　ｎは、０又は１を表し、
    　ｍ及びｐは、同一又は相異なり、０、１又は２を表す。
    　群Ａ：Ｃ１－Ｃ６鎖式炭化水素基、Ｃ１－Ｃ６アルコキシ基、Ｃ３－Ｃ６アルケニルオキシ基、Ｃ３－Ｃ６アルキニルオキシ基、（Ｃ１－Ｃ４アルコキシ）Ｃ１－Ｃ４アルキル基、Ｃ１－Ｃ６アルキルスルファニル基、Ｃ１－Ｃ６アルキルスルフィニル基、Ｃ１－Ｃ６アルキルスルホニル基、Ｃ２－Ｃ６アルキルカルボニル基、Ｃ２－Ｃ６アルキルカルボニルオキシ基｛該Ｃ１－Ｃ６鎖式炭化水素基、該Ｃ１－Ｃ６アルコキシ基、該Ｃ３－Ｃ６アルケニルオキシ基、該Ｃ３－Ｃ６アルキニルオキシ基、該（Ｃ１－Ｃ４アルコキシ）Ｃ１－Ｃ４アルキル基、該Ｃ１－Ｃ６アルキルスルファニル基、該Ｃ１－Ｃ６アルキルスルフィニル基、該Ｃ１－Ｃ６アルキルスルホニル基、該Ｃ２－Ｃ６アルキルカルボニル基及び該Ｃ２－Ｃ６アルキルカルボニルオキシ基は、１以上のハロゲン原子を有していてもよい｝、Ｃ３－Ｃ８シクロアルキル基、Ｃ３－Ｃ８シクロアルケニル基、Ｃ３－Ｃ８シクロアルキルオキシ基、Ｃ３－Ｃ８シクロアルケニルオキシ基｛該Ｃ３－Ｃ８シクロアルキル基、該Ｃ３－Ｃ８シクロアルケニル基、該Ｃ３－Ｃ８シクロアルキルオキシ基及び該Ｃ３－Ｃ８シクロアルケニルオキシ基は、群Ｂより選ばれる１以上の置換基を有していてもよい｝、ハロゲン原子、シアノ基、ニトロ基、ヒドロキシ基、アミノ基、Ｃ（Ｏ）ＯＲ9及びＣ（Ｏ）ＮＲ10Ｒ11からなる群。
    　Ｒ9、Ｒ10及びＲ11は、同一又は相異なり、Ｃ１－Ｃ３アルキル基又は水素原子を表す。
    　群Ｂ：１以上のハロゲン原子を有していてもよいＣ１－Ｃ３アルキル基、ハロゲン原子及びシアノ基からなる群。
    　群Ｃ：シクロプロピル基、ハロゲン原子及びシアノ基からなる群。
    　群Ｄ：Ｃ１－Ｃ４鎖式炭化水素基、Ｃ１－Ｃ４アルコキシ基、Ｃ３－Ｃ６シクロアルキル基｛該Ｃ１－Ｃ４鎖式炭化水素基、該Ｃ１－Ｃ４アルコキシ基及び該Ｃ３－Ｃ６シクロアルキル基は、１以上のハロゲン原子を有していてもよい｝、ハロゲン原子、シアノ基、ニトロ基、ヒドロキシ基、ＯＣ（Ｏ）Ｒ12、Ｃ（Ｏ）Ｒ12、Ｃ（Ｏ）ＯＲ12、ＮＲ13Ｒ14、ＮＲ13Ｃ（Ｏ）Ｒ14、Ｓ（Ｏ）２ＮＲ13Ｒ14、Ｃ（Ｏ）ＮＲ13Ｒ14及びＣＲ13＝Ｎ－ＯＲ14からなる群。
    　Ｒ12、Ｒ13及びＲ14は、同一又は相異なり、１以上のハロゲン原子を有していてもよいＣ１－Ｃ３アルキル基又は水素原子を表す。〕
    で示される化合物。     Formula (I)
    Figure JPOXMLDOC01-appb-C000001
     [In the formula,
    Ar is a C6-C10 aryl group or a 3- to 10-membered heterocyclic group {wherein the C6-C10 aryl group and the 3- to 10-membered heterocyclic group have one or more substituents selected from Group A; Represents good},
    The combination of R A and R B is
    R A is a C1-C10 alkanediyl group, a C2-C10 alkene diyl group, an ethynediyl group, a C3-C10 alkyndiyl group, a C3-C8 cycloalkanediyl group, a C3-C8 cycloalkene diyl group {the C1-C10 alkanediyl group, The C2-C10 alkene diyl group, the C3-C10 alkyldiyl group, the C3-C8 cycloalkanediyl group and the C3-C8 cycloalkene diyl group have at least one substituent selected from the group consisting of a cyano group and a halogen atom Phenylene group, naphthylene group, thienylene group, furanylene group, pyrrolylene group, thiazolylene group, isothiazolylene group, oxazolylene group, isoxazolylene group, pyrazolylene group, imidazolylene group, triazolylene group, pyridinene group, pyridazinylene Group, Midinylene group, pyrazinylene group, triazinylene group {the phenylene group, the naphthyrene group, the thienylene group, the furanylene group, the pyrrolylene group, the thiazolylene group, the isothiazolylene group, the oxazolylene group, the isoxazolylene group, the pyrazolylene group Group, said imidazolylene group, said triazolylene group, said pyridinene group, said pyridazinylene group, said pyrimidinylene group, said pyrazinylene group and said triazinylene group may have one or more substituents selected from group D}, A combination in which a thiadiazolylene group, an oxadiazolylene group or a tetradinylene group and R B is a single bond;
    R A is C1-C3 alkanediyl group, C2-C3 alkene diyl group, ethynediyl group or propyne diyl group {The C1-C3 alkanediyl group, the C2-C3 alkene diyl group and the propyne diyl group are a cyano group, a halogen atom, a hydroxy group And one or more substituents selected from the group consisting of C2-C6 alkylcarbonyloxy groups}, and R B is a C3-C8 cycloalkanediyl group, a C3-C8 cycloalkene diyl group { The C3-C8 cycloalkanediyl group and the C3-C8 cycloalkenediyl group may have one or more substituents selected from the group consisting of a cyano group and a halogen atom}, a phenylene group, a naphthylene group, a thienylene Group, furanylene group, pyrrolylene group, thiazolylene group, isothiazolylene group, oxazo Rylene group, isoxazolylene group, pyrazolylene group, imidazolylene group, triazolylene group, pyridinene group, pyridazinylene group, pyrimidinylene group, pyrazinylene group, triazinylene group {The phenylene group, the naphthylene group, the thienylene group, the furanylene group, A pyrrolylene group, the thiazolylene group, the isothiazolylene group, the oxazolylene group, the isoxazolylene group, the pyrazolylene group, the imidazolylene group, the triazolylene group, the pyridinene group, the pyridazinylene group, the pyrimidinylene group, the pyrazinylene group; The triazinylene group may have one or more substituents selected from group D}, a combination having a thiadiazolylene group, an oxadiazolylene group or a tetradinylene group; or
    R A is a C3-C8 cycloalkanediyl group, a C3-C8 cycloalkene diyl group {the C3-C8 cycloalkanediyl group and the C3-C8 cycloalkene diyl group are selected from the group consisting of a cyano group and a halogen atom 1 Phenylene group, naphthylene group, thienylene group, furanylene group, pyrrolylene group, thiazolylene group, isothiazolylene group, oxazolylene group, isoxazolylene group, pyrazolylene group, imidazolylene group, triazolylene Group, pyridylene group, pyridazinylene group, pyrimidinylene group, pyrazinylene group, triazinylene group {the phenylene group, the naphthyrene group, the thienylene group, the furanylene group, the pyrrolylene group, the thiazolylene group, the isothiazolylene group, the oxazolylene group, Isooxa The rylene group, the pyrazolylene group, the imidazolylene group, the triazolylene group, the pyridylene group, the pyridazinylene group, the pyrimidinylene group, the pyrazinylene group and the triazinylene group have one or more substituents selected from group D. May be, thiadiazolylene group, oxadiazolylene group or tetrazinylene group, R B is C 1 -C 3 alkanediyl group, C 2 -C 3 alkene diyl group, ethynediyl group or propyne diyl group {C 1 -C 3 alkanediyl group, the C 2 -C3 alkenediyl group and the propynediyl group each independently represent one or more substituents selected from the group consisting of a cyano group and a halogen atom;
    R 2 , R 4 and R 5 are the same or different, and have a 3-6 membered alicyclic hydrocarbon group which may have one or more substituents selected from group B or one or more halogen atoms Represents a C1-C4 chain hydrocarbon group which may be
    R 3 is a C 1 -C 3 chain hydrocarbon group {the C 1 -C 3 chain hydrocarbon group may have one or more substituents selected from the group consisting of a cyano group and a halogen atom}, C 1 -C 3 alkoxy) C 1 -C 3 alkyl group, benzyl group optionally having one or more substituents selected from group A, formyl group, C (O) R 8 , C (O) OR 8 or hydrogen atom Represents
    R 8 represents a C1-C4 chain hydrocarbon group or a cyclopropyl group {wherein the C1-C4 chain hydrocarbon group and the cyclopropyl group are one or more substituents selected from the group consisting of a cyano group and a halogen atom Represents that it may have,
    L 1 represents a single bond, -L A -O - #, - L A -NR 6 - #, - L A -S (O) m - #, - L A -O-N = CR 7 - #, - L B -CR 7 = N-O- # or -L B -CR 7 = N-NR 6- #,
    # Represents the bonding position with R A ,
    R 6 and R 7 are the same or different and each represents a C1-C3 alkyl group optionally having one or more halogen atoms, or a hydrogen atom,
    L A is C1-C3 alkanediyl group, C2-C3 alkenediyl group, Echinjiiru group or Puropinjiiru group {said C1-C3 alkanediyl group, the C2-C3 alkenediyl group and said Puropinjiiru group, at least one element selected from the group C And may have a substituent of
    L B is a single bond, C 1 -C 3 alkanediyl group, C 2 -C 3 alkene diyl group, ethyne diyl group or propyne diyl group {C1-C 3 alkanediyl group, said C 2 -C 3 alkene diyl group and said propyne diyl group are selected from group C Optionally having one or more substituents,
    L 2 represents a single bond, an oxygen atom, S (O) p , C 1 -C 3 alkanediyl group, NR 15 or —O—NNCR 16- *,
    * Represents a bonding position with Ar,
    R 15 and R 16 are the same or different and each represents a C1-C3 alkyl group optionally having one or more halogen atoms, or a hydrogen atom,
    n represents 0 or 1 and
    m and p are the same or different and each represents 0, 1 or 2.
    Group A: C1-C6 chain hydrocarbon group, C1-C6 alkoxy group, C3-C6 alkenyloxy group, C3-C6 alkynyloxy group, (C1-C4 alkoxy) C1-C4 alkyl group, C1-C6 alkylsulfanyl group , C1-C6 alkylsulfinyl group, C1-C6 alkylsulfonyl group, C2-C6 alkylcarbonyl group, C2-C6 alkylcarbonyloxy group {C1-C6 chain hydrocarbon group, said C1-C6 alkoxy group, said C3-C6 alkyl hydrocarbon group C6 alkenyloxy group, said C3-C6 alkynyloxy group, said (C1-C4 alkoxy) C1-C4 alkyl group, said C1-C6 alkylsulfanyl group, said C1-C6 alkylsulfinyl group, said C1-C6 alkylsulfonyl group, The C2-C6 alkyl carbonyl group and the C2-C6 alkyl carboy Roxy group may have one or more halogen atoms}, C3-C8 cycloalkyl group, C3-C8 cycloalkenyl group, C3-C8 cycloalkyloxy group, C3-C8 cycloalkenyloxy group {C3 The -C8 cycloalkyl group, the C3-C8 cycloalkenyl group, the C3-C8 cycloalkyloxy group and the C3-C8 cycloalkenyloxy group may have one or more substituents selected from group B And a group consisting of a halogen atom, a cyano group, a nitro group, a hydroxy group, an amino group, C (O) OR 9 and C (O) NR 10 R 11 .
    R 9 , R 10 and R 11 are the same or different and each represents a C1-C3 alkyl group or a hydrogen atom.
    Group B: A group consisting of a C1-C3 alkyl group optionally having one or more halogen atoms, a halogen atom and a cyano group.
    Group C: a group consisting of a cyclopropyl group, a halogen atom and a cyano group.
    Group D: C1-C4 chain hydrocarbon group, C1-C4 alkoxy group, C3-C6 cycloalkyl group {C1-C4 chain hydrocarbon group, the C1-C4 alkoxy group and the C3-C6 cycloalkyl group , May have one or more halogen atoms}, a halogen atom, a cyano group, a nitro group, a hydroxyl group, OC (O) R 12 , C (O) R 12 , C (O) OR 12 , NR 13 A group consisting of R 14 , NR 13 C (O) R 14 , S (O) 2 NR 13 R 14 , C (O) NR 13 R 14 and CR 13 = N-OR 14 .
    R 12 , R 13 and R 14 are the same or different and each represents a C1-C3 alkyl group optionally having one or more halogen atoms or a hydrogen atom. ]
    A compound represented by
  2. 　ＲA及びＲBの組み合わせが、
    　　ＲAがＣ１－Ｃ１０アルカンジイル基、Ｃ２－Ｃ１０アルケンジイル基、エチンジイル基、Ｃ３－Ｃ１０アルキンジイル基、Ｃ３－Ｃ８シクロアルカンジイル基又はＣ３－Ｃ８シクロアルケンジイル基｛該Ｃ１－Ｃ１０アルカンジイル基、該Ｃ２－Ｃ１０アルケンジイル基、該Ｃ３－Ｃ１０アルキンジイル基、該Ｃ３－Ｃ８シクロアルカンジイル基及び該Ｃ３－Ｃ８シクロアルケンジイル基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝であり、ＲBが単結合である組み合わせ；
    　　ＲAがＣ１－Ｃ３アルカンジイル基、Ｃ２－Ｃ３アルケンジイル基、エチンジイル基又はプロピンジイル基｛該Ｃ１－Ｃ３アルカンジイル基、該Ｃ２－Ｃ３アルケンジイル基及び該プロピンジイル基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝であり、ＲBがＣ３－Ｃ８シクロアルカンジイル基又はＣ３－Ｃ８シクロアルケンジイル基｛該Ｃ３－Ｃ８シクロアルカンジイル基及び該Ｃ３－Ｃ８シクロアルケンジイル基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝である組み合わせ；又は、
    　　ＲAがＣ３－Ｃ８シクロアルカンジイル基又はＣ３－Ｃ８シクロアルケンジイル基｛該Ｃ３－Ｃ８シクロアルカンジイル基及び該Ｃ３－Ｃ８シクロアルケンジイル基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝であり、ＲBがＣ１－Ｃ３アルカンジイル基、Ｃ２－Ｃ３アルケンジイル基、エチンジイル基又はプロピンジイル基｛該Ｃ１－Ｃ３アルカンジイル基、該Ｃ２－Ｃ３アルケンジイル基及び該プロピンジイル基は、シアノ基及びハロゲン原子からなる群より選ばれる１以上の置換基を有していてもよい｝である組み合わせであり、
    　Ｌ2が、単結合、酸素原子又はＳ（Ｏ）pである、請求項１に記載の化合物。     The combination of R A and R B is
    R A represents a C1-C10 alkanediyl group, a C2-C10 alkene diyl group, an ethyne diyl group, a C3-C10 alkyndiyl group, a C3-C8 cycloalkanediyl group or a C3-C8 cycloalkene diyl group {C1-C10 alkanediyl group; The C2-C10 alkene diyl group, the C3-C10 alkyldiyl group, the C3-C8 cycloalkanediyl group and the C3-C8 cycloalkene diyl group have at least one substituent selected from the group consisting of a cyano group and a halogen atom And R B may be a single bond;
    A group in which R A is a C1-C3 alkanediyl group, a C2-C3 alkene diyl group, an ethynediyl group or a propyne diyl group {The C1-C3 alkanediyl group, the C2-C3 alkene diyl group and the propyne diyl group are a cyano group and a halogen atom And R B is a C3-C8 cycloalkanediyl group or a C3-C8 cycloalkenediyl group {wherein the C3-C8 cycloalkanediyl group and the C3-C8 cycloalkanediyl group are selected from the group consisting of A combination wherein C8 cycloalkene diyl group may have one or more substituents selected from the group consisting of a cyano group and a halogen atom; or
    R A is a C3-C8 cycloalkanediyl group or a C3-C8 cycloalkene diyl group {the C3-C8 cycloalkanediyl group and the C3-C8 cycloalkene diyl group are each selected from the group consisting of a cyano group and a halogen atom 1 And R B is a C1-C3 alkanediyl group, a C2-C3 alkene diyl group, an ethyne diyl group or a propyne diyl group {C1-C3 alkanediyl group, the C2-C3 alkene diyl group. And the propynediyl group is a combination which may have one or more substituents selected from the group consisting of a cyano group and a halogen atom,
    The compound according to claim 1, wherein L 2 is a single bond, an oxygen atom or S (O) p .
  3. 　Ｒ3が、Ｃ（Ｏ）ＣＨ3、Ｃ（Ｏ）ＯＣＨ3又は水素原子であり、
    　Ｌ1が、単結合、－ＣＨ2－Ｏ－＃、－ＣＨ2－Ｏ－Ｎ＝ＣＲ7－＃又は－ＣＲ7＝Ｎ－Ｏ－＃であり、
    　Ｌ2が、単結合である、請求項１又は請求項２に記載の化合物。     R 3 is C (O) CH 3 , C (O) OCH 3 or a hydrogen atom,
    L 1 is a single bond, -CH 2 -O - #, - CH 2 -O-N = CR 7 - a # or -CR 7 = N-O- #,
    The compound according to claim 1 or claim 2, wherein L 2 is a single bond.
  4. 　ＲA及びＲBの組み合わせが、ＲAが、Ｃ１－Ｃ６アルカンジイル基又はＣ３－Ｃ６シクロアルカンジイル基であり、ＲBが、単結合である組み合わせである、請求項１～請求項３のいずれかに記載の化合物。 4. The combination according to claim 1, wherein the combination of R A and R B is a combination in which R A is a C1-C6 alkanediyl group or a C3-C6 cycloalkanediyl group, and R B is a single bond. The compound as described in any one.
  5. 　Ｒ2、Ｒ4及びＲ5が、同一又は相異なり、１以上のハロゲン原子を有していてもよいＣ１－Ｃ３アルキル基である、請求項１～請求項４のいずれかに記載の化合物。 The compound according to any one of claims 1 to 4, wherein R 2 , R 4 and R 5 are the same or different and are a C 1 -C 3 alkyl group which may have one or more halogen atoms.
  6. 　Ａｒが、群Ａより選ばれる１以上の置換基を有していてもよいフェニル基である、請求項１～請求項５のいずれかに記載の化合物。 The compound according to any one of claims 1 to 5, wherein Ar is a phenyl group which may have one or more substituents selected from group A.
  7. 　請求項１～請求項６のいずれかに記載の化合物と、不活性担体とを含有する有害生物防除組成物。 A pest control composition comprising the compound according to any one of claims 1 to 6 and an inert carrier.
  8. 　群（ａ）及び群（ｂ）からなる群より選ばれる１以上の成分を含有する請求項７に記載の組成物：
    　群（ａ）：殺虫活性成分、殺ダニ活性成分及び殺線虫活性成分からなる群；
    　群（ｂ）：殺菌活性成分。     The composition according to claim 7, comprising one or more components selected from the group consisting of group (a) and group (b):
    Group (a): a group consisting of an insecticidal active ingredient, an acaricidal active ingredient and a nematode active ingredient;
    Group (b): bactericidal active ingredient.
  9. 　請求項１～請求項６のいずれかに記載の化合物の有効量を有害生物又は有害生物の生息場所に施用する有害生物の防除方法。 A method for controlling pests, which comprises applying an effective amount of the compound according to any one of claims 1 to 6 to a pest or a habitat of the pest.
  10. 　請求項７又は請求項８に記載の組成物の有効量を有害生物又は有害生物の生息場所に施用する有害生物の防除方法。 A method for controlling pests, which comprises applying an effective amount of the composition according to claim 7 to a pest or a habitat of the pest.
  11. 　請求項１～請求項６のいずれかに記載の化合物の有効量又は請求項７もしくは請求項８に記載の組成物の有効量を保持している種子又は栄養生殖器官。 A seed or vegetative organ which holds an effective amount of the compound according to any one of claims 1 to 6 or an effective amount of the composition according to claim 7 or 8.
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