WO2019078290A1 - Single-layer film and heat-resistant adhesive tape using same - Google Patents

Single-layer film and heat-resistant adhesive tape using same Download PDF

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Publication number
WO2019078290A1
WO2019078290A1 PCT/JP2018/038802 JP2018038802W WO2019078290A1 WO 2019078290 A1 WO2019078290 A1 WO 2019078290A1 JP 2018038802 W JP2018038802 W JP 2018038802W WO 2019078290 A1 WO2019078290 A1 WO 2019078290A1
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WO
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Prior art keywords
heat
film
adhesive tape
layer film
resistant
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PCT/JP2018/038802
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French (fr)
Japanese (ja)
Inventor
純平 藤原
貴之 岩崎
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デンカ株式会社
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Application filed by デンカ株式会社 filed Critical デンカ株式会社
Priority to JP2019549335A priority Critical patent/JP7204658B2/en
Publication of WO2019078290A1 publication Critical patent/WO2019078290A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C48/00Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
    • B29C48/25Component parts, details or accessories; Auxiliary operations
    • B29C48/30Extrusion nozzles or dies
    • B29C48/305Extrusion nozzles or dies having a wide opening, e.g. for forming sheets
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C48/00Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
    • B29C48/16Articles comprising two or more components, e.g. co-extruded layers
    • B29C48/18Articles comprising two or more components, e.g. co-extruded layers the components being layers
    • B29C48/21Articles comprising two or more components, e.g. co-extruded layers the components being layers the layers being joined at their surfaces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C48/00Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
    • B29C48/25Component parts, details or accessories; Auxiliary operations
    • B29C48/92Measuring, controlling or regulating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C2948/00Indexing scheme relating to extrusion moulding
    • B29C2948/92Measuring, controlling or regulating
    • B29C2948/92504Controlled parameter
    • B29C2948/92704Temperature

Definitions

  • the present invention relates to a monolayer film and a heat-resistant adhesive tape using the same.
  • plastic is often used.
  • plastic films are often used for portions requiring flexibility.
  • compounding techniques such as a technique of laminating a plastic film and a metal foil, a technique of depositing a film on a plastic film, and a technique of sputtering have been actively performed.
  • solder may be used to fix electronic components on a plastic film substrate.
  • High heat is generally applied to the plastic film during compounding or during the solder reflow process.
  • the heat resistance required for plastic films is becoming increasingly severe.
  • the specific heat resistance required for the plastic film is that the plastic film does not easily change in size due to heat, for example, in the case of laminating metal foils, when the heat causes dimensional change in the plastic film, the lamination is performed. Since the body is warped, a film having a small heat shrinkage rate is required.
  • a polyimide resin is often used as a plastic film satisfying the heat resistance described above (for example, Patent Document 1).
  • the polyimide resin is not thermoplastic, and the film is obtained by a solvent casting method, so that the molding process is difficult, the product cost is high, and the solvent remaining in the polyimide film is exposed to a high temperature environment. It could be generated as outgassing and contaminate electronic parts. Therefore, a thermoplastic plastic film that is less expensive, less outgassing, and heat resistant than a polyimide film has been required.
  • such plastic films are increasingly important because they are useful, for example, as films for heat-resistant adhesive tapes, films for electronic components, films for household electric appliance parts, or parts for automobile parts described below. It was getting high.
  • stacked the adhesive is demonstrated.
  • Paper, fabric, non-woven fabric, plastic film, etc. are widely used as substrates for adhesive tapes, but heat-resistant adhesive tapes used for fixing masking tapes and other electronic parts especially when producing printed circuit boards are 200 ° C. It is required to have a heat-resistant adhesive performance that does not peel off in a solder bath or firing process at a temperature higher than that.
  • a substrate for such a heat-resistant adhesive tape single-layer films made of melt-extrudable thermoplastics such as polyethylene naphthalate film, polyphenylene sulfide film, polyether ether ketone film and the like have been proposed (for example, Patent Documents 2 and 3) ).
  • Patent Document 4 proposes a polyether sulfone sheet having a maximum value (Rmax) of surface roughness of 0.1 ⁇ m or less.
  • Rmax maximum value
  • the coefficient of friction of the surface becomes too large, and wrinkles may easily occur when the sheet is wound, and a desired sheet may not be obtained.
  • the present invention comprises the following.
  • Layer film (2) The monolayer according to (1), wherein the thermoplastic resin comprises one or more selected from the group consisting of polyetherimide, polyethersulfone, polyphenylsulfone, thermoplastic polyimide, and heat resistant polyarylate. the film.
  • thermoplastic resin contains one or more additives selected from the group consisting of a heat stabilizer, an ultraviolet light absorber, an antistatic agent, a lubricant, a dye, a pigment, and an inorganic filler.
  • the single layer film as described in any one of the).
  • the monolayer film according to (3) or (4) which has a thermal shrinkage of 5% or less after exposure to an environment at 250 ° C. for 1 hour.
  • the heat-resistant adhesive tape as described in (10) or (11) which is less than 10 micrometers.
  • a monolayer film comprising a thermoplastic resin having a glass transition temperature of 210 ° C. or higher, and an adhesive layer formed on one surface of the monolayer film, wherein the adhesive layer of the monolayer film is formed The heat-resistant adhesive tape which has an uneven structure in the surface on the opposite side of the made surface.
  • thermoplastic resin having a glass transition temperature of 210 ° C. or more is extruded from a T die into a temperature of 300 ° C. to 400 ° C. C. Melting extrusion is carried out at a temperature of not higher than .degree. C., and a molding method is characterized in that molding is carried out by sandwiching between a concavo-convex roll having a surface temperature of 110.degree. C. or more and 230.degree.
  • a single layer film which is excellent in moldability, heat resistance and UV transmittance, and which has a small heating weight reduction rate even in a high temperature atmosphere, and a heat resistant adhesive tape using the same.
  • a film for an electronic member, a film for a home appliance member, or a film for an automobile part member can be provided.
  • the invention is illustrated in more detail by the following examples.
  • the present invention is not limited to the following embodiments, and can be implemented with appropriate modifications as long as the effects of the present invention are not impaired.
  • the first aspect of the present invention is a single-layer heat-resistant film which is excellent in moldability and UV transmittance, and which has a small heating weight reduction rate even in a high temperature atmosphere.
  • a second aspect of the present invention is a heat-resistant adhesive tape, wherein the single-layer film is laminated with one or two adhesive layers, and at least one surface of the single-layer film is an adhesive layer.
  • is there. 1 and 2 show an example of the heat-resistant adhesive tape of the present invention. In the case of FIG.
  • the heat-resistant adhesive tape is obtained by laminating an adhesive layer on one side of a single layer film.
  • it is a heat-resistant adhesive tape in which an adhesive layer is laminated on both sides of a single layer film.
  • a third of the present invention is a heat-resistant adhesive tape, comprising: a single layer film made of a thermoplastic resin having a glass transition temperature of 210 ° C.
  • the single layer film is a film formed using a thermoplastic resin having a glass transition temperature of 210 ° C. or higher.
  • the thermoplastic resin in the present specification may be a single resin or a composition containing a plurality of resins. Furthermore, the thermoplastic resin can contain other additives as required. When the glass transition temperature of the thermoplastic resin is less than 210 ° C., the heat shrinkage may be increased.
  • the single layer film contains a thermoplastic resin having a glass transition temperature of 210 ° C. or more, and contains at least 15% by mass or more of a thermoplastic resin having a glass transition temperature of 245 ° C. or more in the resin component.
  • the monolayer film mainly comprises a thermoplastic resin having a glass transition temperature of 245 ° C. or higher.
  • “mainly contained” means that the resin component contains 50% by mass or more, 70% by mass or more, 90% by mass or more, or 100% by mass.
  • thermoplastic resin examples include polyphenylsulfone (PPSU, glass transition temperature 220 ° C.), polyether sulfone (PES, glass transition temperature 225 ° C.), polyetherimide (PEI, glass transition) Temperature of 217 ° C.), thermoplastic polyimide (TPI, glass transition temperature of 260 ° C.), heat resistant polyarylate (PAR, glass transition temperature of 263 ° C.) and the like can be mentioned.
  • PPSU polyphenylsulfone
  • PES polyether sulfone
  • PEI polyetherimide
  • TPI thermoplastic polyimide
  • PAR heat resistant polyarylate
  • the single layer film is a single layer film mainly comprising at least one resin selected from thermoplastic polyimide (TPI) or heat resistant polyarylate (PAR) as a thermoplastic resin having a glass transition temperature of 245 ° C. or higher It is.
  • the glass transition temperature refers to the midpoint glass transition temperature described in JIS K 7121.
  • DSC curve obtained from DSC measurement, a straight line equidistant from the extended straight line of each baseline in the vertical axis direction, and glass Let it be the temperature of the point where the curve of the step change part of the transition intersects.
  • Measurement conditions are a nitrogen atmosphere, a temperature rising rate of 10 ° C./min, and a measurement temperature range is from room temperature to 390 ° C.
  • the polysulfone-based resin that can be used as a thermoplastic resin is not particularly limited, but polyphenylsulfone having a repeating unit represented by Formula (1) is preferable, and represented by Formula (2) Even more preferred are polyether sulfones having repeating units.
  • polyphenyl sulfone and / or polyether sulfone can be selected and used.
  • the polyphenyl sulfone (PPSU) may be a homopolymer consisting only of the chemical structure of the formula (1) or may contain one or more chemical structures selected from the formulas (2) to (10) It is also good. However, since the higher the ratio of the chemical structure of the formula (1) in the polyphenyl sulfone, the better the film strength, the heat resistance and the molding processability, the total of 100 mol% of the polysulfone units of the formulas (1) to (10) On the other hand, the unit of the formula (1) is preferably 50 mol% or more, more preferably 80% mol% or more.
  • the copolymerization form may be any of a block copolymer, a random copolymer and an alternating copolymer .
  • the terminal modified body which has another chemical structure only in the polymer terminal may be sufficient.
  • polyphenyl sulfone brand name made from Solvay Specialty Polymers: Radel R series, brand name made by BASF: Ultra Zone P series can be mentioned.
  • the polyether sulfone (PES) may be a homopolymer consisting only of the chemical structure of the formula (2), or one or more chemical structures selected from (1) and (3) to (10) You may have. However, since the ratio of the chemical structure of the formula (2) in the polyether sulfone is excellent in film strength, heat resistance and molding processability, 100 mol% in total of the polysulfone unit of the formulas (1) to (10)
  • the unit of the formula (2) is preferably 50 mol% or more, and more preferably 80% mol% or more.
  • the copolymer form is a block copolymer, It may be either a random copolymer or an alternating copolymer.
  • the terminal modified body which has another chemical structure only in the polymer terminal may be sufficient.
  • Specific examples of polyether sulfone include Sumitomo Chemical's trade name: Sumika Excel PES series, BASF trade name: Ultrazone E series, Solvay Specialty Polymers trade name: Belladel series, etc. Be
  • thermoplastic polyimide (TPI) resin thermoplastic polyimide
  • thermoplastic polyimide polyether imide, etc.
  • thermoplastic polyimides include crystallinity and non-crystallinity.
  • thermoplastic polyimide which has a repeating unit represented by following formula (11) is mentioned.
  • a commercial item it can be purchased, and specifically, trade name: Aurum manufactured by Mitsui Chemicals, Inc. can be mentioned.
  • polyetherimide examples include Ultem manufactured by Subic.
  • the heat-resistant polyarylate is a polycondensate of a dihydric phenol component and an aromatic dicarboxylic acid or an aromatic dicarboxylic acid dihalide, and is a repeating unit represented by the general formula (12).
  • the Tg (glass transition temperature) thereof is 245 ° C. or more, preferably 255 ° C. or more.
  • Typical heat-resistant polyarylates which are commercially available include those composed of bisphenol A as dihydric phenol and a mixed phthalic acid of terephthalic acid and isophthalic acid as aromatic dicarboxylic acid, and changing their monomer composition ratio Thus, the heat resistance can be improved (Tg can be increased).
  • Unitika Co., Ltd . U polymer and UNIFINER (Unifiner), a resin having a Tg of 245 ° C. or higher, preferably 255 ° C. or higher.
  • the monolayer film of the present embodiment preferably contains a thermoplastic resin containing one or more selected from polyetherimide, polyethersulfone, polyphenylsulfone, thermoplastic polyimide, and heat resistant polyarylate. . It may be a resin composition containing each of the above-described thermoplastic resins in an arbitrary ratio, as long as the effects of the present invention are not impaired. For example, the heat shrinkage can be reduced by alloying two or more resins having a high glass transition temperature.
  • the single-layer film contains a thermoplastic resin having a glass transition temperature of 210 ° C. or higher, preferably a thermoplastic resin having a glass transition temperature of 245 ° C.
  • thermoplastic resin containing 95% by mass or less This makes it possible to exhibit more preferable high heat resistance and low heat shrinkage.
  • it is a single layer film containing a thermoplastic resin containing at least 15% by mass or more, more preferably 25% by mass or more and 95% by mass or less of thermoplastic polyimide (TPI) and / or heat resistant polyarylate (PAR) .
  • thermoplastic polyimide (TPI) and / or heat resistant polyarylate (PAR) is most preferable as the single layer film of the present invention. It is a single layer film containing.
  • the resin component of the thermoplastic resin having a glass transition temperature of 210 ° C. or more contains at least 15% by mass or more of a thermoplastic resin having a glass transition temperature of 245 ° C. or more, more preferably 25% by mass or more By containing 95 mass% or less, it is possible to make heat contraction rate in 250 degreeC and 60 minutes small remarkably compared with the case of less than these.
  • the thermoplastic resin constituting the single layer film may, if necessary, be a heat stabilizer, an ultraviolet absorber, an antistatic agent, a lubricant, a dye, a pigment, a glass fiber, a carbon fiber, etc. within the range not inhibiting the effects of the present invention.
  • scrap resins generated in the film manufacturing process can be mixed and used.
  • the total amount of additives is preferably 25 parts by mass or less, more preferably 10 parts by mass or less, and still more preferably 5 parts by mass or less, with respect to 100 parts by mass of the thermoplastic resin constituting the single layer film. If the compounding quantity of an additive is in the said range, it can be used, without the handling property as a tape falling.
  • Arithmetic mean surface roughness Ra of at least one surface of the single layer film of the present embodiment is more than 0.10 ⁇ m and less than 10 ⁇ m, more preferably more than 0.30 ⁇ m and less than 8.0 ⁇ m, further preferably Is greater than 0.30 ⁇ m and less than 5.0 ⁇ m.
  • the arithmetic average surface roughness Ra is 0.10 ⁇ m or less, wrinkles easily occur when winding the film, and it is difficult to obtain a good film roll, and in some cases, the winding itself becomes difficult. .
  • the arithmetic average surface roughness Ra is larger than 0.10 ⁇ m, preferably larger than 0.30 ⁇ m, a single layer film or a heat-resistant adhesive tape using the same is used in the vacuum evaporation process and particularly severe vacuum sputtering process And deformation of the film or the tape or floating can be suppressed, and the effect of suppressing peeling at the attachment portion of the heat-resistant adhesive tape peeling is easily improved.
  • the pressure-sensitive adhesive is laminated on a surface having an arithmetic average surface roughness Ra of 10 ⁇ m or more, air bubbles are mixed and the appearance is likely to be deteriorated.
  • the arithmetic mean surface roughness Ra can be calculated according to JIS B0601: 2001.
  • the other surface of the single layer film may or may not have a concavo-convex structure.
  • the arithmetic average roughness Ra may be less than 0.10 ⁇ m, may be more than 0.10 ⁇ m and less than 10 ⁇ m, or may be 10 ⁇ m or more.
  • the method of forming fine irregularities on the surface of the single layer film is (a) Melt-kneaded resin Is extruded from a T-die, and the extruded resin is sandwiched between an uneven roll and another pressure-bonding roll, for example, a mirror-shaped pressure-bonded roll to form a film, wherein the film is formed using an uneven roll having fine unevenness.
  • corrugation is preferable.
  • the method (A) is preferable.
  • the method of mixing and kneading the thermoplastic resin and the additive constituting the single layer film is not particularly limited, and various mixing and kneading means may be used. For example, they may be separately fed to the extruder and mixed.
  • the resin and additives constituting the single layer film can be preliminarily dry-kneaded using a mixer such as a Henschel mixer, a ball mixer, a blender, a tumbler, etc., and can be melt-kneaded using a melt kneader.
  • a mixing roll As a melt-kneader, a mixing roll, a pressure kneader, a single-screw extruder, and a multi-screw extruder can be used.
  • a single-screw extruder or a multi-screw extruder since it is in the form of a strand, a sheet or a rod, it is preferable to process it into powder, granules or pellets with a grinder or a cutter.
  • the thickness of the single layer film is preferably 5 ⁇ m to 100 ⁇ m, more preferably 20 ⁇ m to 70 ⁇ m, and still more preferably 20 ⁇ m to 40 ⁇ m.
  • the thickness is increased, the handling property as the tape is improved, but when it exceeds 100 ⁇ m, the adhesive residue at the affixing portion tends to be generated when the tape is peeled off.
  • the total thickness 5 ⁇ m or more it is possible to prevent the heat shrinkage rate from increasing, and to prevent the wrinkles from being easily formed when winding the film.
  • the thickness of the single layer film is preferably more than 30 ⁇ m, and when the glass transition point is 245 ° C. or more, the thickness is more than 20 ⁇ m Is preferred.
  • the preferable heat contraction rate of the single layer film is as follows.
  • the absolute value of the thermal contraction rate after exposure for 60 minutes in a 250 ° C. environment is 15% or less, more preferably 10% or less, and still more preferably 5% or less. If the thermal contraction rate is in the above-mentioned range, the heat resistant dimensional stability is practically sufficient.
  • the tape peels off or is anchored (the phenomenon that the adhesive layer separates from the base layer and migrates to the adherend side Can be used without causing any adhesive residue on the adherend after peeling off the tape.
  • the thermal shrinkage was measured in accordance with JIS C2151. Specifically, a test piece (long axis 150 mm ⁇ short axis 20 mm) was cut out in each of the MD direction and the TD direction, and marked lines with a distance of 100 mm were attached centering on the central part in the long axis direction of the test piece. The test piece was exposed to no load for 60 minutes in an environment at an ambient temperature of 200 ° C. and 250 ° C., cooled to room temperature, and then the length between the marked lines was measured, and it was calculated from the following formula. . As for the value of thermal contraction rate, a positive value means contraction, and a negative value means expansion.
  • MD indicates the length (extrusion) direction of the film
  • TD indicates the width direction of the film.
  • Thermal shrinkage (%) (length before test-length after test) / (length before test) x 100
  • the preferable single layer film of this embodiment can satisfy the above-mentioned heat shrinkage ratio condition in both MD and TD directions.
  • the thermal weight loss rate of the single layer film when exposed to an environment of 250 ° C. for 1 hour is 5.0% or less, more preferably 3.0% or less, still more preferably 1.5% or less is there.
  • the heating weight reduction rate is a temperature reduction rate from the TG curve obtained when the temperature is raised to 250 ° C at a heating rate of 10 ° C / min according to JIS K7102 and the temperature is further maintained at 250 ° C for 30 minutes. You can ask for If the heating weight reduction rate exceeds 5%, outgassing may occur in the high temperature process during the manufacture of electronic components, which may contaminate the electronic components and surrounding equipment. Also, the vacuum process takes time to reach a predetermined degree of vacuum, which is not economical.
  • the UV transmittance of the single layer film is 80% or more, and most preferably 85% or more. If it is in the said range, after laminating
  • UV transmittance can be measured in accordance with JIS K0115.
  • an extrusion molding method using a T-die is preferable.
  • the temperature of the resin extruded from the tip of the T die slip is preferably 300 ° C. or more and 400 ° C. or less, more preferably 310 ° C. or more and 390 ° C. or less. If it is said range, the film excellent in the uniformity of thickness will be easy to be obtained. On the other hand, if the temperature is less than 300 ° C., it becomes difficult to obtain a film of uniform thickness. Moreover, if it is 300 degreeC or more, it can prevent that a thermal contraction rate becomes large. When the temperature exceeds 400 ° C., the resin is apt to be thermally deteriorated and the appearance of the film is apt to be deteriorated.
  • the surface temperature of the uneven roll is preferably 110 ° C. or more and 230 ° C. or less, more preferably 130 ° C. or more and 200 ° C. or less, and still more preferably 140 ° C. or more and 190 ° C. or less. If it is in the above-mentioned range, a film with a small heat contraction rate and a film surface with a good appearance can be obtained.
  • the manufacturing method and processing method of the concavo-convex roll are arbitrary, the surface is matted (blast processing etc.) and concavo-convex processing (laser engraving method, mill engraving method, diamond bite processing method, electroforming method, etc.) It is also possible to obtain a film surface having a predetermined surface roughness.
  • Surfaces to be subjected to matting and concavo-convex processing can be made of metal, ceramic, and rubber materials.
  • the uneven roll temperature is 230 ° C. or more, the film and the uneven roll adhere to each other, it becomes difficult to peel the film smoothly from the uneven roll, and the appearance of the film is likely to be deteriorated.
  • the single layer film may be subjected to corona treatment, plasma treatment, ozone treatment, flame treatment, alkali treatment, vapor deposition treatment, primer treatment, etc.
  • corona treatment plasma treatment, ozone treatment, flame treatment, alkali treatment, vapor deposition treatment, primer treatment, etc.
  • the well-known easy adhesion process can be applied. By these treatments, adhesion to a single layer film can be improved in lamination with a metal foil or lamination of an adhesive layer described later.
  • a single-layer film is excellent in heat resistance and UV transmittance, and has a small heat shrinkage and a decrease in heating weight reduction rate under a high temperature atmosphere. Therefore, a flexible printed circuit (FPC) as a substitute for a polyimide film, a film-like substrate for semiconductor mounting Substrate film used for laminates such as (TAB and COF) and heat-resistant adhesive tape, substrate film used for laminates of flexible solar cells and touch panels, or conductor circuit protection for protecting the surface of a substrate It can be suitably used as a coverlay film of the above, a film for a film capacitor, and the like.
  • FPC flexible printed circuit
  • a film for a speaker diaphragm a protective film for vacuum pressure forming, a protective film for insert molding, a protective film for in-mold molding, and the like.
  • a film in the case of this application a sulfone type film is preferable.
  • it can be suitably used also as a film for circuit boards, a film for heater insulating material, a film for glass protection, a film for household appliance parts, or a film for automobile parts.
  • the heat-resistant adhesive tape of the present embodiment has the above-described single-layer film and an adhesive layer formed on at least one surface of the single-layer film.
  • the pressure-sensitive adhesive layer is a single-layer film having only a concavo-convex roll surface (a surface formed on the concavo-convex roll side and being a concavo-convex processed surface) or a pressure-bonding roll surface (a surface formed on the crimp roll) It is an uneven
  • the adhesive layer is formed only on the pressure roll surface (uneven surface).
  • the thickness of the single layer film of the heat-resistant adhesive tape is preferably 5 ⁇ m or more and 100 ⁇ m or less, more preferably 20 ⁇ m or more and 70 ⁇ m or less.
  • the thickness of the adhesive layer is preferably 5 to 70 ⁇ m, and more preferably 15 to 50 ⁇ m.
  • the most preferable form is the surface opposite to the adherend pressure-sensitive adhesive surface to which the adherend is adhered when the heat-resistant adhesive tape is adhered to the adherend etc.
  • the heat-resistant adhesive tape has a single-layer film and an adhesive layer formed on one surface of the single-layer film, and has an uneven structure on the surface opposite to the surface on which the adhesive layer is formed.
  • the concavo-convex structure has an arithmetic average surface roughness Ra of more than 0.10 ⁇ m and less than 10 ⁇ m, preferably more than 0.30 ⁇ m and less than 10 ⁇ m.
  • Ra arithmetic average surface roughness
  • the uneven surface structure is provided on the surface opposite to the adherend adhesive surface of the single-layer film, so that the tape is prevented from floating even when vacuum sputtering is performed in the temperature range of 200 ° C to 250 ° C. it can.
  • vacuum sputtering processing is performed in a temperature range of 200 ° C. to 250 ° C., generation of adhesive residue can be suppressed.
  • the present invention is the above-mentioned heat-resistant adhesive tape to which an adherend is further attached. That is, in one embodiment, it can be set as the heat-resistant adhesive tape stuck to a to-be-adhered body through the adhesive layer which comprises a base-material adhesive surface.
  • the adherend is preferably a semiconductor component, an electric material component, or an optical component, and the base may be a substrate.
  • the adherend pressure-sensitive adhesive side of the single-layer film has an uneven structure. You do not have to.
  • the single-layer film surface at the interface between the pressure-sensitive adhesive layer and the single-layer film has an arithmetic average roughness Ra of less than 0.10 ⁇ m, It may be more than 0.10 ⁇ m and less than 10 ⁇ m, or 10 ⁇ m or more.
  • a single layer film made of a thermoplastic resin having a glass transition temperature of 210 ° C. or higher and an adhesive layer are laminated, and the surface opposite to the adherend adhesive surface of the single layer film ( It is a heat-resistant adhesive tape which has an uneven
  • the single-layer film according to the third aspect of the present invention is preferably made of a thermoplastic resin having a glass transition temperature of 210 ° C. or higher, and a thermoplastic resin having a glass transition temperature of 245 ° C. or higher in at least 15% by mass in the resin component. Preferably, 25 mass% or more is included.
  • the monolayer film in the third aspect of the present invention most preferably comprises mainly a thermoplastic resin having a glass transition temperature of 245 ° C. or higher.
  • the concavo-convex structure preferably has an arithmetic average surface roughness Ra of more than 0.10 ⁇ m and less than 10 ⁇ m, and more preferably more than 0.30 ⁇ m and less than 10 ⁇ m.
  • the present invention is the above-mentioned heat-resistant adhesive tape attached to an adherend. That is, in one embodiment, the heat-resistant pressure-sensitive adhesive tape may be attached to one surface of the heat-resistant pressure-sensitive adhesive tape via the pressure-sensitive adhesive layer constituting the adherend pressure-sensitive adhesive surface.
  • the adherend is preferably a semiconductor component, an electrical material part, or an optical component, and the adherend may be a substrate.
  • the adherend pressure-sensitive adhesive side of the single-layer film has an uneven structure. You do not have to. That is, in the heat-resistant pressure-sensitive adhesive tape in which the adherend is laminated via the pressure-sensitive adhesive layer, the single-layer film surface at the interface between the pressure-sensitive adhesive layer and the single-layer film has an arithmetic average roughness Ra of less than 0.10 ⁇ m, It may be more than 0.10 ⁇ m and less than 10 ⁇ m, or 10 ⁇ m or more.
  • the thickness of the single-layer film of the heat-resistant pressure-sensitive adhesive tape is preferably 5 ⁇ m to 100 ⁇ m, and more preferably 20 ⁇ m to 70 ⁇ m.
  • the thickness of the adhesive layer is preferably 5 ⁇ m to 70 ⁇ m, and more preferably 10 ⁇ m to 50 ⁇ m.
  • the adhesive component of the adhesive constituting the adhesive layer is not particularly limited, and a resinous film substrate or casing to which the heat-resistant adhesive tape using the single layer film is attached
  • it may be appropriately selected from known adhesives.
  • (meth) acrylic resins, urethane resins, silicones, synthetic rubbers, natural rubbers, etc. are used.
  • (Meta) is preferable in that it has good adhesion and excellent heat resistance.
  • Acrylic resin type and silicone type are preferable.
  • the thickness of the adhesive layer is preferably as described above, and in particular, 10 to 50 ⁇ m is more preferable. When the thickness of the adhesive layer is 10 ⁇ m or more, sufficient adhesiveness can be easily ensured, and when the thickness is 50 ⁇ m or less, the adhesive layer can be easily formed.
  • a known additive generally added to a film can be added to the thermoplastic resin used for the single layer film.
  • the configuration of the (meth) acrylic composition constituting the adhesive may be changed, or the tackifier may be used. It can be further added. Specifically, cohesion of glycidyl methacrylate to an adhesive and / or addition of a terpene phenol resin having a softening point of 70 ° C. or more and 180 ° C. or less as a tackifier, for example, suppresses a decrease in adhesive strength. can do.
  • a terpene phenol resin of “YS polystar” series manufactured by Yashara Chemical Co., Ltd. is preferably mentioned.
  • the content of the tackifier can be 0 parts by mass to 20 parts by mass with respect to 100 parts by mass of the adhesive component (for example, (meth) acrylic acid ester polymer).
  • the pressure-sensitive adhesive composition may contain, for example, various additives such as a softener, an antiaging agent, a filler, a conductive agent, an ultraviolet absorber, and a light stabilizer.
  • the content of the other additives is not particularly limited, and can be 0 parts by mass to 20 parts by mass with respect to 100 parts by mass of the adhesive component (for example, (meth) acrylic acid ester polymer).
  • the heat-resistant adhesive tape was produced, for example, by a method of directly applying an adhesive on the surface of a single layer film (direct coating method), or applying an adhesive on the surface of release paper or release film to form an adhesive layer. Later, a method (transfer method) in which the pressure-sensitive adhesive layer and the single-layer film are laminated may be mentioned.
  • the method for applying the pressure-sensitive adhesive is not particularly limited, and a conventionally known method can be used.
  • the formation method by printing includes, for example, a gravure printing method, a flexographic printing method, an offset printing method, and the like. Examples of the method by coating include roll coating, reverse coating, comma coating, knife coating, die coating, gravure coating and the like.
  • the adhesive layer In order to crosslink the adhesive layer by heating after forming the adhesive layer, for example, it is preferable to age at a temperature of 40 to 100 ° C. for several hours to 3 days.
  • the crosslinking reaction can be advanced by aging to ensure sufficient adhesiveness during use and releasability after use.
  • the heat-resistant adhesive tape of this embodiment uses the above-mentioned single-layer film, it is excellent in heat resistance and UV transmittance, and has a small shrinkage even under high temperature atmosphere and a small heating weight reduction ratio. It can be suitably used as a manufacturing tape, a masking tape, a tape for fixing a substrate in a chip size package mounting process, a space tape for a film-like substrate manufacturing process, and the like.
  • the heating weight reduction rate is small, when used as various heat-resistant adhesive tapes and films used in vacuum processes, the amount of outgas generation is small, so contamination of process equipment is small, or the time to reach a predetermined degree of vacuum is short. Therefore, it is suitable.
  • a preferred application is, specifically, a masking heat-resistant adhesive tape used to protect the treated surface in the apparatus when it is used in a vacuum deposition process step or a sputtering process step.
  • the thermoplastic resin of the single layer film is a resin selected from PES resin, thermoplastic polyimide, and heat resistant polyarylate. preferable.
  • the heat-resistant adhesive tape of the present invention it is possible to suppress the floating of the heat-resistant tape after vacuum sputtering and to suppress the adhesive residue after heat treatment, so it can be suitably used for this application.
  • Resins used in the monolayer film in Examples and Comparative Examples are as follows.
  • the glass transition temperature of the thermoplastic resin used for the single layer film was measured from room temperature to 380 ° C. at a temperature rising rate of 10 ° C./min under a nitrogen atmosphere using a differential scanning calorimeter “DSC 3100 SA” manufactured by Bruker. Then, in the DSC curve, a straight line equidistant from the extended straight line of each baseline in the vertical axis direction and the curve of the step change portion of the glass transition intersect.
  • Example 1 ⁇ Production of single layer film> Organic resin: Paliotol Yellow K 0961 (trade name), 1 part by mass made by BASF Corp. is added to 100 parts by mass of polyether sulfone as a resin constituting a single layer film, and it is charged into a container and used with a tumbler. Preblended to give a stirred mixture. The stirred mixture was fed to a twin screw extruder having a diameter of 30 mm, melt-kneaded, and discharged from a die at the tip into a bar shape to form a strand. Melt-kneading conditions were cylinder temperature: 350-370 ° C., adapter temperature: 370 ° C., and die temperature: 370 ° C.
  • the formed strand was water-cooled and then cut by a pelletizer to obtain a molding material of pellet form 2-3 mm in length and 1-2 mm in diameter.
  • This molding material is extruded from a single screw extruder having a diameter of 40 mm and discharged from a 600 mm wide T die at a resin temperature of 360 ° C., and a silicone rubber pressure roll of a take-off machine and arithmetic mean surface roughness Ra of roll surface
  • the film was sandwiched between a metal concavo-convex roll (surface temperature: 140 ° C.) having a fine concavo-convex shape of 0.7 ⁇ m, and was continuously transferred toward the winding machine to obtain a single layer film having a fine concavo-convex shape.
  • the heat-resistant adhesive tape was produced in the following procedure using the produced single layer film.
  • a (meth) acrylic acid ester copolymer was synthesized as follows as an acrylic pressure-sensitive adhesive for forming a pressure-sensitive adhesive layer.
  • the solid was washed with water while suction filtering, and after drying at room temperature, vacuum drying was performed at 60 ° C. to obtain a copolymer resin having a water content of 0.5% or less.
  • the obtained (meth) acrylic acid ester copolymer was melted and stirred in toluene.
  • An isocyanate-based curing agent and a tackifier resin (terpene phenol resin: "YS polystar G150" manufactured by Yashara Chemical Co., Ltd., softening temperature: 150 ° C.) were added thereto and stirred and mixed to obtain a pressure-sensitive adhesive composition.
  • the pressure-sensitive adhesive composition is coated on a single-layer film with a width of 300 mm, a length of 400 mm and a thickness of 50 ⁇ m using an applicator such that the thickness after curing is 20 ⁇ m, and then 100 ° C. for 2 minutes Heated to conditions and dried.
  • a protective film a polyester film having a width of 300 mm, a length of 400 mm, and a release treatment thickness of 38 ⁇ m was attached to the adhesive surface to obtain an adhesive tape.
  • the resultant was subjected to aging treatment at 40 ° C. for 3 days in an oven to obtain a crosslinked adhesive layer, to obtain an adhesive tape having a width of 300 mm, a length of 400 mm and a thickness of 0.070 mm.
  • the pressure sensitive adhesive was formed on the uneven roll surface of the single layer film.
  • Example 2 to 17 Except that the resin used for the single layer film, the thickness, the surface roughness, the coated surface of the pressure-sensitive adhesive, and the thickness are as shown in Table 1 using rolls different in surface roughness of the concavo-convex roll and the pressure bonding roll In the same manner as in Example 1, a single-layer film and a heat-resistant adhesive tape were produced.
  • the pressure-sensitive adhesive was formed on the uneven roll surface of the single layer film, the pressure roll surface, or on both sides thereof.
  • Example 4 9, 10, 16, 17, the pressure bonding roll which carried out the blast process on the surface was used.
  • Comparative Examples 1 to 3 Except that the resin used for the single layer film, the thickness, the surface roughness, the coated surface of the pressure-sensitive adhesive, and the thickness are as shown in Table 2 using rolls different in surface roughness of the unevenness roll and the pressure bonding roll, Based on Example 1, a monolayer film and a heat-resistant adhesive tape were produced. However, only the comparative example 1 produced the film using the roll of a mirror surface, without using an uneven
  • Comparative example 4 A commercially available polyimide film (manufactured by Ube Industries, Upirex 25S, thickness 25 ⁇ m) was used. Moreover, the heat-resistant adhesive tape was produced using this film. The adhesive was applied on any one side.
  • Comparative example 5 A commercially available biaxially stretched polyethylene naphthalate film (PEN, manufactured by Teijin Ltd., Theonex Q51, thickness 25 ⁇ m) was used. Moreover, the heat-resistant adhesive tape was produced using this film. The adhesive was applied on any one side. The glass transition temperature of the PEN film used was 140 ° C., and the crystalline melting point was 260 ° C.
  • PEN biaxially stretched polyethylene naphthalate film
  • Theonex Q51 thickness 25 ⁇ m
  • Arithmetic mean surface roughness was calculated according to JIS B0601. Specifically, the arithmetic mean surface roughness Ra of each surface of a single layer film made of silicone rubber pressure contact roll or metal uneven roll is measured by using a contact surface roughness tester (Surftest SJ-210 manufactured by Mitutoyo) Using the above, 5 points in the width direction of the single layer film were measured with a scan width of 2 mm, and the average value was calculated.
  • the thickness was measured using a commercially available Mitutoyo standard dial gauge (type 547-401). Specifically, 300 mm was measured at intervals of 100 mm in the film longitudinal direction, measured at intervals of 10 mm in the film width direction, their average value was determined, and the average value was taken as the thickness of the film.
  • UV transmittance The UV transmittance was measured in accordance with JIS K0115. Specifically, the UV transmittance at a wavelength of 400 nm was measured using a commercially available spectrophotometer (UV-2600 manufactured by Shimadzu Corporation). If the UV transmittance is 80% or more, for example, after laminating the adhesive layer on the single layer film, it is suitable in the process of irradiating the ultraviolet ray from the single layer film side to cure the adhesive.
  • Heating weight reduction rate The heating weight reduction rate is raised to 250 ° C. at a heating rate of 10 ° C./min under a nitrogen atmosphere by thermogravimetric measurement using (BRUKER TG-DTA 2000SA) according to JIS K7102. Furthermore, the weight loss rate was determined from the TG curve obtained when maintaining the environment at 250 ° C. for 30 minutes.
  • the heat-resistant adhesive tape obtained above is slit to a width of 10 mm, and then the protective film, the polyester film, is peeled off, and the exposed surface of the adhesive layer is an adherend aluminum plate (100 mm square, 0.5 mm thick, arithmetic)
  • the pressure-bonded sample was left at 23 ° C. for 30 minutes, and then the initial tack was measured under the conditions of peeling angle 180 °, peeling speed 300 mm / min, and peeling distance 50 mm according to JIS Z0237: 2000.
  • the universal material testing machine made by Instron Japan was used for the measurement.
  • the evaluation criteria of initial stage adhesive force are as follows. Excellent: 1.0N to 6.0N / 20mm Good: 0.4 N to less than 1.0 N / 20 mm, greater than 6.0 N to 10.0 N / 20 mm Defect: less than 0.4 N / 20 mm, greater than 10.0 N / 20 mm
  • the crimped sample is allowed to stand at 23 ° C. for 30 minutes, and then vacuum sputtering is performed for 60 minutes in a vacuum degree of 10 -3 to 10 -4 Pa using a vacuum sputtering apparatus (manufactured by Syncron Co., Ltd.)
  • An SiO 2 / SiN alternate film was laminated at a total thickness of 0.5 ⁇ m.
  • the heat-resistant adhesive tape does not have a floating part:
  • the heat-resistant adhesive tape has 1 to 9 floating parts:
  • the heat-resistant adhesive tape has a floating part of 10 or more It was judged as "passing" above the evaluation.
  • the single layer films obtained in Examples 1 to 17 have no generation of wrinkles at the time of winding, are excellent in formability (film film formability), have a small thermal contraction rate and a small decrease in heating weight, and are heat resistant single layer It can be suitably used as a film. Furthermore, since the UV transmittance is good, it can be suitably used as a heat-resistant monolayer film or as a heat-resistant adhesive tape substrate having an adhesive layer. In addition, as shown in Examples 2, 3, 4, 6, and 7, the surface roughness of the surface (surface on the surface side of the single layer film) opposite to the adherend adhesive surface of the single layer film is increased. Thus, it is possible to use the heat-resistant adhesive tape more suitably with little peeling after the sputtering treatment and no adhesive residue.
  • a single-layer film of a resin composition containing a sulfone resin (PES, PPSU) and a heat-resistant polyarylate or thermoplastic polyimide having a glass transition temperature of 245 ° C. or more and Examples 15 to In the case of a single layer film using only a resin having a glass transition temperature of 245 ° C. or higher, the heat shrinkage rate at 250 ° C. is excellent.
  • the heat-resistant pressure-sensitive adhesive tapes using these single-layer films are less likely to float or peel after sputtering, and are more preferable as heat-resistant pressure-sensitive tapes. It can be used.

Abstract

Provided is a single-layer film that exhibits superior heat resistance and UV permeability, and has a low thermogravimetric loss rate even in a high-temperature atmosphere. Also provided is a heat-resistant adhesive tape that uses said film. The single-layer film is formed by using a thermoplastic resin having a glass transition temperature of 210°C or higher. The arithmetic mean surface roughness Ra of at least one surface of the single-layer film is greater than 0.10μm and less than 10μm. The heat-resistant adhesive tape is obtained by laminating an acrylic-based or silicone-based adhesive layer onto at least one surface of the single-layer film.

Description

単層フィルム及びそれを用いた耐熱粘着テープSingle layer film and heat resistant adhesive tape using the same
 本発明は、単層フィルム及びそれを用いた耐熱粘着テープに関する。 The present invention relates to a monolayer film and a heat-resistant adhesive tape using the same.
 近年、電子部材は小型化、軽量化の傾向から、プラスチック製が多く使用されている。特に、フレキシブル性を要求される部位に関しては、プラスチックフィルムが多く用いられている。それに伴い、プラスチックフィルムと金属箔との積層技術、プラスチックフィルムへの蒸着技術やスパッタリング技術といった複合化技術も盛んに行われている。また、はんだを使用してプラスチックフィルム基板上に電子部品を固定する場合もある。 In recent years, due to the tendency to reduce the size and weight of electronic members, plastic is often used. In particular, plastic films are often used for portions requiring flexibility. Along with this, compounding techniques such as a technique of laminating a plastic film and a metal foil, a technique of depositing a film on a plastic film, and a technique of sputtering have been actively performed. Also, solder may be used to fix electronic components on a plastic film substrate.
 複合化の際や、はんだリフロー工程の際には、一般的にプラスチックフィルムに対して、高い熱が付与される。近年の高性能化のニーズに伴い、プラスチックフィルムに求められる耐熱性はますます厳しくなっている。プラスチックフィルムに対して求められる具体的な耐熱性能は、熱によってプラスチックフィルムに寸法変化が生じにくいことであり、例えば金属箔を積層するような場合、熱によりプラスチックフィルムに寸法変化が生じると、積層体に反りが生じてしまうため、熱収縮率の小さいフィルムが求められている。 High heat is generally applied to the plastic film during compounding or during the solder reflow process. With the recent demand for higher performance, the heat resistance required for plastic films is becoming increasingly severe. The specific heat resistance required for the plastic film is that the plastic film does not easily change in size due to heat, for example, in the case of laminating metal foils, when the heat causes dimensional change in the plastic film, the lamination is performed. Since the body is warped, a film having a small heat shrinkage rate is required.
 前記の耐熱性を充足するプラスチックフィルムとして、ポリイミド樹脂が多く用いられている(例えば特許文献1)。しかしポリイミド樹脂は熱可塑性ではなく、そのフィルムは溶媒キャスト法によって得られる為、成形加工に困難を伴い、製品単価も高額であるだけでなく、ポリイミドフィルムに残存した溶媒が、高温環境に暴露された時にアウトガスとして発生し、電子部品を汚染する場合があった。その為、ポリイミドフィルムよりも安価でアウトガスの少なく、耐熱性を有する熱可塑性のプラスチックフィルムが求められていた。また、このようなプラスチックフィルムは例えば以下に示す耐熱粘着テープ用基材、電子部材用フィルム、家電製品部材用、または自動車部品部材用のフィルムとしても有用であることから、その重要性はますます高くなっていた。 A polyimide resin is often used as a plastic film satisfying the heat resistance described above (for example, Patent Document 1). However, the polyimide resin is not thermoplastic, and the film is obtained by a solvent casting method, so that the molding process is difficult, the product cost is high, and the solvent remaining in the polyimide film is exposed to a high temperature environment. It could be generated as outgassing and contaminate electronic parts. Therefore, a thermoplastic plastic film that is less expensive, less outgassing, and heat resistant than a polyimide film has been required. In addition, such plastic films are increasingly important because they are useful, for example, as films for heat-resistant adhesive tapes, films for electronic components, films for household electric appliance parts, or parts for automobile parts described below. It was getting high.
 以下、粘着剤を積層した耐熱粘着テープ用基材について説明する。粘着テープ用基材として、紙、布帛、不織布、プラスチックフィルム等が広く用いられているが、特にプリント基板製造時のマスキングテープやその他の電子部品の固定用に用いられる耐熱粘着テープは200℃を超える温度の半田浴や焼成工程で剥離しない程度の耐熱接着性能が求められる。こうした耐熱粘着テープ用基材として、ポリエチレンナフタレートフィルム、ポリフェニレンサルファイドフィルム、ポリエーテルエーテルケトンフィルム等の溶融押出し成型可能な熱可塑性プラスチックからなる単層フィルムが提案されている(例えば特許文献2、3)。しかしながら近年の電子部品の製造工程、特に真空蒸着工程、真空スパッタ工程では、粘着テープを貼付した状態で高温にさらされることも少なくなく、上記のフィルムでは熱収縮率が大きく耐熱性が不充分である場合もあった。 Hereinafter, the base for heat-resistant adhesive tape which laminated | stacked the adhesive is demonstrated. Paper, fabric, non-woven fabric, plastic film, etc. are widely used as substrates for adhesive tapes, but heat-resistant adhesive tapes used for fixing masking tapes and other electronic parts especially when producing printed circuit boards are 200 ° C. It is required to have a heat-resistant adhesive performance that does not peel off in a solder bath or firing process at a temperature higher than that. As a substrate for such a heat-resistant adhesive tape, single-layer films made of melt-extrudable thermoplastics such as polyethylene naphthalate film, polyphenylene sulfide film, polyether ether ketone film and the like have been proposed (for example, Patent Documents 2 and 3) ). However, in recent electronic component manufacturing processes, particularly in vacuum deposition processes and vacuum sputtering processes, it is not uncommon to be exposed to high temperatures with adhesive tapes attached, and the above-mentioned films have large heat shrinkage and insufficient heat resistance. There was also a case.
 これらの課題に対してポリエーテルサルホンを用いた耐熱性フィルムが提案されているが、フィルム成形性に課題を有していた。特許文献4には表面粗さの最大値(Rmax)が0.1μm以下のポリエーテルサルホンシートが提案されている。しかしながら、例えばシートの厚みが薄い場合、表面粗さが小さいと、表面の摩擦係数が大きくなりすぎて、シートを巻取る際に皺が入りやすくなり、所望のシートが得られない場合があった。 Although the heat resistant film using a polyether sulfone is proposed with respect to these subjects, it had the subject in film formability. Patent Document 4 proposes a polyether sulfone sheet having a maximum value (Rmax) of surface roughness of 0.1 μm or less. However, for example, when the thickness of the sheet is small, if the surface roughness is small, the coefficient of friction of the surface becomes too large, and wrinkles may easily occur when the sheet is wound, and a desired sheet may not be obtained. .
 また、ポリエーテルサルホン樹脂に板状のフィラーを添加することが報告されている。(例えば特許文献5,6)しかしながら、板状フィラーの添加によって透明性が著しく低下するだけでなく、流動性が悪化する為、溶融押出し成型が困難になる場合があった。 In addition, addition of a plate-like filler to polyether sulfone resin has been reported. (For example, Patent Documents 5 and 6) However, the addition of the plate-like filler not only causes the transparency to be significantly reduced, but also the flowability is deteriorated, which may make melt extrusion molding difficult.
特開2013-193413号公報JP, 2013-193413, A 特開平01-266177号公報JP 01-266177 A 特開2003-249617号公報Unexamined-Japanese-Patent No. 2003-249617 特開2000-233436号公報JP 2000-233436 A 特開2004-168962号公報JP 2004-168962 特開2005-103951号公報JP 2005-103951 A
 本発明は、成形性、耐熱性、UV透過性に優れ、高温雰囲気下での加熱収縮率、及び加熱重量減少率が小さい単層フィルム及びそれを用いた耐熱粘着テープを提供することを課題とする。また、電子部材用フィルム、家電製品部材用、または自動車部品部材用のフィルムを提供することを課題とする。 It is an object of the present invention to provide a single layer film which is excellent in moldability, heat resistance and UV permeability, has a small heat shrinkage ratio under a high temperature atmosphere, and a small heating weight reduction ratio, and a heat resistant adhesive tape using the same. Do. Another object of the present invention is to provide a film for electronic members, a film for household electric appliance members, or a film for automobile parts.
すなわち本発明は、下記より構成される。
(1)ガラス転移温度が210℃以上の熱可塑性樹脂を用いて形成された単層フィルムであって、少なくとも一方の表面の算術平均表面粗さRaが0.10μmより大きく10μm未満である、単層フィルム。
(2)前記熱可塑性樹脂が、ポリエーテルイミド、ポリエーテルサルホン、ポリフェニルサルホン、熱可塑性ポリイミド、及び耐熱ポリアリレートからなる群から選ばれる1以上を含む、(1)に記載の単層フィルム。
(3)前記熱可塑性樹脂が、ガラス転移温度が245℃以上の熱可塑性樹脂を15質量%以上含む、(1)または(2)に記載の単層フィルム。
(4)前記熱可塑性樹脂が、熱安定剤、紫外線吸収剤、帯電防止剤、滑剤、染料、顔料、及び無機フィラーからなる群から選ばれる1以上の添加剤を含む、(1)~(3)のいずれかに記載の単層フィルム。
(5)250℃の環境下に1時間暴露した後の熱収縮率が15%以下である、(1)~(4)のいずれかに記載の単層フィルム。
(6)250℃の環境下に1時間暴露した後の熱収縮率が5%以下である、(3)または(4)に記載の単層フィルム。
(7)250℃の環境下に1時間暴露した後の加熱重量減少率が5%以下である、(1)~(6)のいずれかに記載の単層フィルム。
(8)UV透過率が80%以上である、(1)~(7)のいずれかに記載の単層フィルム。
(9)フィルムコンデンサ用、スピーカー振動板用、回路基板用、ヒーター絶縁材用、ガラス保護用、真空圧空成形用保護フィルム用、インサート成形用保護フィルム用、インモールド成形用保護フィルム用、家電製品部材用、または自動車部品部材用のフィルムである(1)~(8)のいずれかに記載の単層フィルム。
(10)(1)~(9)のいずれかに記載の単層フィルムの少なくとも一方の表面にアクリル系、またはシリコーン系の粘着層が積層された、耐熱粘着テープ。
(11)前記耐熱粘着テープを構成する単層フィルムの厚みが、5μm以上100μm以下であり、粘着層厚みが、5μm以上70μm以下である、(10)に記載の耐熱粘着テープ。
(12)単層フィルムの一方の表面に前記粘着層が積層され、単層フィルムの、該粘着層が積層されている面と反対側の面の算術平均表面粗さRaが0.10μmより大きく10μm未満である、(10)または(11)に記載の耐熱粘着テープ。
(13)マスキングテープ用である、(10)~(12)のいずれかに記載の耐熱粘着テープ。
(14)真空蒸着工程用、または真空スパッタ工程用テープである、(13)に記載の耐熱粘着テープ。
(15)ガラス転移温度が210℃以上の熱可塑性樹脂を含む単層フィルムと、該単層フィルムの一方の表面上に形成された粘着層とを有し、単層フィルムの、粘着層が形成された面の反対側の面に凹凸構造を有する、耐熱粘着テープ。
(16)粘着層を介して被着体に貼付された、(12)または(15)に記載の耐熱粘着テープ。
(17)(1)~(9)のいずれかに記載の単層フィルムの製造方法であって、ガラス転移温度が210℃以上の熱可塑性樹脂を、押出成形法によってTダイスから300℃以上400℃以下で溶融押出しし、表面温度が110℃以上230℃以下の凹凸ロールと圧着ロールとに挟持させて成型することを特徴とする、製造方法。
That is, the present invention comprises the following.
(1) A single layer film formed using a thermoplastic resin having a glass transition temperature of 210 ° C. or higher, and having an arithmetic average surface roughness Ra of at least one surface of more than 0.10 μm and less than 10 μm. Layer film.
(2) The monolayer according to (1), wherein the thermoplastic resin comprises one or more selected from the group consisting of polyetherimide, polyethersulfone, polyphenylsulfone, thermoplastic polyimide, and heat resistant polyarylate. the film.
(3) The monolayer film as described in (1) or (2) in which the said thermoplastic resin contains 15 mass% or more of thermoplastic resins whose glass transition temperature is 245 degreeC or more.
(4) (1) to (3), wherein the thermoplastic resin contains one or more additives selected from the group consisting of a heat stabilizer, an ultraviolet light absorber, an antistatic agent, a lubricant, a dye, a pigment, and an inorganic filler. The single layer film as described in any one of the).
(5) The monolayer film according to any one of (1) to (4), which has a thermal shrinkage of 15% or less after exposure to an environment at 250 ° C. for 1 hour.
(6) The monolayer film according to (3) or (4), which has a thermal shrinkage of 5% or less after exposure to an environment at 250 ° C. for 1 hour.
(7) The monolayer film according to any one of (1) to (6), wherein the heating weight reduction rate after exposure to an environment at 250 ° C. for 1 hour is 5% or less.
(8) The monolayer film according to any one of (1) to (7), which has a UV transmittance of 80% or more.
(9) For film capacitors, for speaker diaphragms, for circuit boards, for heater insulation, for glass protection, for protective films for vacuum pressure forming, for protective films for insert molding, for protective films for in-mold molding, household appliances The single-layer film according to any one of (1) to (8), which is a film for a member or an automobile part member.
(10) A heat-resistant adhesive tape having an acrylic or silicone adhesive layer laminated on at least one surface of the single-layer film according to any one of (1) to (9).
(11) The heat-resistant adhesive tape according to (10), wherein the thickness of the single layer film constituting the heat-resistant adhesive tape is 5 μm or more and 100 μm or less, and the adhesive layer thickness is 5 μm or more and 70 μm or less.
(12) The adhesive layer is laminated on one surface of a single layer film, and the arithmetic average surface roughness Ra of the surface of the single layer film opposite to the surface on which the adhesive layer is laminated is larger than 0.10 μm The heat-resistant adhesive tape as described in (10) or (11) which is less than 10 micrometers.
(13) The heat-resistant adhesive tape according to any one of (10) to (12), which is for masking tape.
(14) The heat-resistant adhesive tape according to (13), which is a tape for a vacuum deposition process or a vacuum sputtering process.
(15) A monolayer film comprising a thermoplastic resin having a glass transition temperature of 210 ° C. or higher, and an adhesive layer formed on one surface of the monolayer film, wherein the adhesive layer of the monolayer film is formed The heat-resistant adhesive tape which has an uneven structure in the surface on the opposite side of the made surface.
(16) The heat-resistant adhesive tape according to (12) or (15) attached to an adherend via an adhesive layer.
(17) The method for producing a single-layer film according to any one of (1) to (9), wherein a thermoplastic resin having a glass transition temperature of 210 ° C. or more is extruded from a T die into a temperature of 300 ° C. to 400 ° C. C. Melting extrusion is carried out at a temperature of not higher than .degree. C., and a molding method is characterized in that molding is carried out by sandwiching between a concavo-convex roll having a surface temperature of 110.degree. C. or more and 230.degree.
 本発明によれば、成形性、耐熱性、UV透過性に優れ、高温雰囲気下でも加熱重量減少率が小さい単層フィルム及びそれを用いた耐熱粘着テープを提供することができる。また、電子部材用フィルム、家電製品部材用、または自動車部品部材用のフィルムを提供することができる。 According to the present invention, it is possible to provide a single layer film which is excellent in moldability, heat resistance and UV transmittance, and which has a small heating weight reduction rate even in a high temperature atmosphere, and a heat resistant adhesive tape using the same. In addition, a film for an electronic member, a film for a home appliance member, or a film for an automobile part member can be provided.
一実施形態に係る耐熱粘着テープの層構成の一例を示す断面図である。It is sectional drawing which shows an example of the laminated constitution of the heat-resistant adhesive tape which concerns on one Embodiment.
一実施形態に係る耐熱粘着テープの層構成の一例を示す断面図である。It is sectional drawing which shows an example of the laminated constitution of the heat-resistant adhesive tape which concerns on one Embodiment.
 本発明を以下の好適例により詳細に説明する。本発明は、以下の実施形態に限定されるものではなく、本発明の効果を阻害しない範囲で適宜変更を加えて実施することができる。本発明の第一は、成形性、UV透過性に優れ、高温雰囲気下でも加熱重量減少率が小さい、単層の耐熱フィルムである。本発明の第二は耐熱粘着テープであり、本単層フィルムに対し、粘着層が1層または2層積層されてなり、単層フィルム表面の少なくとも一方が、粘着層からなる、耐熱粘着テープである。図1、図2は本発明の耐熱粘着テープの一例を示すものであり、図1の場合、単層フィルムの片面に粘着層が積層された耐熱粘着テープである。図2の場合、単層フィルムの両面に粘着層が積層された耐熱粘着テープである。本発明の第三は、耐熱粘着テープであり、ガラス転移温度が210℃以上の熱可塑性樹脂からなる単層フィルムと該単層フィルムの一方の表面上に形成された粘着層とを備え、粘着層が形成された面(単層フィルムに被着体が貼付される際に被着体が貼付される面(被着体粘着面))の反対側の面(単層フィルムの表面側の面)に凹凸構造を有する、耐熱粘着テープである。 The invention is illustrated in more detail by the following examples. The present invention is not limited to the following embodiments, and can be implemented with appropriate modifications as long as the effects of the present invention are not impaired. The first aspect of the present invention is a single-layer heat-resistant film which is excellent in moldability and UV transmittance, and which has a small heating weight reduction rate even in a high temperature atmosphere. A second aspect of the present invention is a heat-resistant adhesive tape, wherein the single-layer film is laminated with one or two adhesive layers, and at least one surface of the single-layer film is an adhesive layer. is there. 1 and 2 show an example of the heat-resistant adhesive tape of the present invention. In the case of FIG. 1, the heat-resistant adhesive tape is obtained by laminating an adhesive layer on one side of a single layer film. In the case of FIG. 2, it is a heat-resistant adhesive tape in which an adhesive layer is laminated on both sides of a single layer film. A third of the present invention is a heat-resistant adhesive tape, comprising: a single layer film made of a thermoplastic resin having a glass transition temperature of 210 ° C. or higher; and an adhesive layer formed on one surface of the single layer film, The surface (surface side of the single-layer film) opposite to the surface on which the layer is formed (the surface to which the adherend is attached when the adherend is attached to the single-layer film (adherend pressure-sensitive adhesive surface)) A heat-resistant adhesive tape having a concavo-convex structure).
<単層フィルム>
 単層フィルムは、ガラス転移温度が210℃以上の熱可塑性樹脂を用いて形成されたフィルムである。本明細書における熱可塑性樹脂は、単独の樹脂でもよく複数の樹脂を含む組成物であってもよい。さらに、熱可塑性樹脂は、必要に応じて他の添加剤を含むことができる。熱可塑性樹脂のガラス転移温度が210℃未満の場合、熱収縮率が大きくなる場合がある。好ましくは、単層フィルムは、ガラス転移温度が210℃以上の熱可塑性樹脂を含み、かつガラス転移温度が245℃以上の熱可塑性樹脂を、樹脂成分中少なくとも15質量%以上含む。最も好ましくは、単層フィルムは、ガラス転移温度が245℃以上である熱可塑性樹脂を主として含む。本明細書において、「主として含む」とは、樹脂成分中に50質量%以上、70質量%以上、90質量%以上、又は100質量%含むことを意味する。
<Single-layer film>
The single layer film is a film formed using a thermoplastic resin having a glass transition temperature of 210 ° C. or higher. The thermoplastic resin in the present specification may be a single resin or a composition containing a plurality of resins. Furthermore, the thermoplastic resin can contain other additives as required. When the glass transition temperature of the thermoplastic resin is less than 210 ° C., the heat shrinkage may be increased. Preferably, the single layer film contains a thermoplastic resin having a glass transition temperature of 210 ° C. or more, and contains at least 15% by mass or more of a thermoplastic resin having a glass transition temperature of 245 ° C. or more in the resin component. Most preferably, the monolayer film mainly comprises a thermoplastic resin having a glass transition temperature of 245 ° C. or higher. In the present specification, “mainly contained” means that the resin component contains 50% by mass or more, 70% by mass or more, 90% by mass or more, or 100% by mass.
 熱可塑性樹脂の主要な構成樹脂の具体例としては、ポリフェニルサルホン(PPSU、ガラス転移温度220℃)、ポリエーテルサルホン(PES、ガラス転移温度225℃)、ポリエーテルイミド(PEI、ガラス転移温度217℃)、熱可塑性ポリイミド(TPI、ガラス転移温度260℃)、耐熱ポリアリレート(PAR、ガラス転移温度263℃)等が挙げられる。 Specific examples of main constituent resins of thermoplastic resin include polyphenylsulfone (PPSU, glass transition temperature 220 ° C.), polyether sulfone (PES, glass transition temperature 225 ° C.), polyetherimide (PEI, glass transition) Temperature of 217 ° C.), thermoplastic polyimide (TPI, glass transition temperature of 260 ° C.), heat resistant polyarylate (PAR, glass transition temperature of 263 ° C.) and the like can be mentioned.
 耐熱性を考慮すると、ガラス転移温度が245℃以上の熱可塑性樹脂として、熱可塑性ポリイミド(TPI)、または耐熱ポリアリレート(PAR)から選ばれる1種以上の樹脂を樹脂成分中少なくとも15質量%以上含むことがさらに好ましく、25質量%以上95質量%以下含むことが特に好ましい。最も好ましくは、単層フィルムは、ガラス転移温度が245℃以上の熱可塑性樹脂として、熱可塑性ポリイミド(TPI)、または耐熱ポリアリレート(PAR)から選ばれる1種以上の樹脂を主として含む単層フィルムである。 In view of heat resistance, at least 15% by mass or more of resin components selected from thermoplastic polyimide (TPI) or heat-resistant polyarylate (PAR) as a thermoplastic resin having a glass transition temperature of 245 ° C. or higher It is more preferable to contain, and it is especially preferable to contain 25 mass% or more and 95 mass% or less. Most preferably, the single layer film is a single layer film mainly comprising at least one resin selected from thermoplastic polyimide (TPI) or heat resistant polyarylate (PAR) as a thermoplastic resin having a glass transition temperature of 245 ° C. or higher It is.
 ガラス転移温度は、JIS K7121で表記されている中間点ガラス転移温度をいい、DSC測定から得られたDSC曲線において、各ベースラインの延長した直線から縦軸方向に等距離にある直線と、ガラス転移の段階状変化部分の曲線とが交わる点の温度とする。測定条件は窒素雰囲気下、昇温速度10℃/分で、測定温度範囲は室温から390℃である。 The glass transition temperature refers to the midpoint glass transition temperature described in JIS K 7121. In the DSC curve obtained from DSC measurement, a straight line equidistant from the extended straight line of each baseline in the vertical axis direction, and glass Let it be the temperature of the point where the curve of the step change part of the transition intersects. Measurement conditions are a nitrogen atmosphere, a temperature rising rate of 10 ° C./min, and a measurement temperature range is from room temperature to 390 ° C.
 熱可塑性樹脂として用いることができるポリサルホン系樹脂としては、特に限定されるものではないが、式(1)で表される繰り返し単位を有するポリフェニルサルホンが好ましく、式(2)で表される繰り返し単位を有するポリエーテルサルホンが更に好ましい。ポリフェニルサルホンおよび/またはポリエーテルサルホンを1種類以上選択して用いることができる。 The polysulfone-based resin that can be used as a thermoplastic resin is not particularly limited, but polyphenylsulfone having a repeating unit represented by Formula (1) is preferable, and represented by Formula (2) Even more preferred are polyether sulfones having repeating units. One or more types of polyphenyl sulfone and / or polyether sulfone can be selected and used.
 ポリフェニルサルホン(PPSU)は、式(1)の化学構造のみからななるホモポリマーであってもよいし、式(2)~(10)から選ばれる単数または複数の化学構造を含んでいてもよい。ただし、ポリフェニルサルホン中、式(1)の化学構造の割合が高い方がフィルム強度や耐熱性、成型加工性に優れることから、式(1)~(10)のポリサルホンユニット合計100モル%に対し、式(1)のユニットが50モル%以上であることが好ましく、80%モル%以上であることが更に好ましい。 The polyphenyl sulfone (PPSU) may be a homopolymer consisting only of the chemical structure of the formula (1) or may contain one or more chemical structures selected from the formulas (2) to (10) It is also good. However, since the higher the ratio of the chemical structure of the formula (1) in the polyphenyl sulfone, the better the film strength, the heat resistance and the molding processability, the total of 100 mol% of the polysulfone units of the formulas (1) to (10) On the other hand, the unit of the formula (1) is preferably 50 mol% or more, more preferably 80% mol% or more.
 ポリフェニルサルホンが、式(2)~(10)の化学構造を含む共重合体の場合、共重合形態はブロック共重合体、ランダム共重合体、交互共重合体のいずれであってもよい。また、重合体末端のみに他の化学構造を有する末端変性体であってもよい。ポリフェニルサルホンの具体例としては、ソルベイスペシャリティポリマーズ社製の商品名:レーデルRシリーズ、BASF社製の商品名:ウルトラゾーンPシリーズが挙げられる。 When the polyphenyl sulfone is a copolymer having a chemical structure of formulas (2) to (10), the copolymerization form may be any of a block copolymer, a random copolymer and an alternating copolymer . Moreover, the terminal modified body which has another chemical structure only in the polymer terminal may be sufficient. As a specific example of polyphenyl sulfone, brand name made from Solvay Specialty Polymers: Radel R series, brand name made by BASF: Ultra Zone P series can be mentioned.
 ポリエーテルサルホン(PES)は、式(2)の化学構造のみからななるホモポリマーであってもよいし、(1)および(3)~(10)から選ばれる単数または複数の化学構造を有していてもよい。ただし、ポリエーテルサルホン中、式(2)の化学構造の割合は、フィルム強度や耐熱性、成型加工性に優れることから、式(1)~(10)のポリサルホンユニット合計100モル%に対し、式(2)のユニットが50モル%以上であることが好ましく、80%モル%以上であることが更に好ましい。ポリエーテルサルホンが、(1)および(3)~(10)から選ばれる単数または複数の化学構造を有して共重合体となっている場合には、共重合形態はブロック共重合体、ランダム共重合体、交互共重合体のいずれであってもよい。また重合体末端のみに他の化学構造を有する末端変性体であってもよい。ポリエーテルサルホンの具体例としては、住友化学社製の商品名:スミカエクセルPESシリーズ、BASF社製の商品名:ウルトラゾーンEシリーズ、ソルベイスペシャリティポリマーズ社製の商品名:ベラデルシリーズなどが挙げられる。 The polyether sulfone (PES) may be a homopolymer consisting only of the chemical structure of the formula (2), or one or more chemical structures selected from (1) and (3) to (10) You may have. However, since the ratio of the chemical structure of the formula (2) in the polyether sulfone is excellent in film strength, heat resistance and molding processability, 100 mol% in total of the polysulfone unit of the formulas (1) to (10) The unit of the formula (2) is preferably 50 mol% or more, and more preferably 80% mol% or more. When the polyether sulfone is a copolymer having one or more chemical structures selected from (1) and (3) to (10), the copolymer form is a block copolymer, It may be either a random copolymer or an alternating copolymer. Moreover, the terminal modified body which has another chemical structure only in the polymer terminal may be sufficient. Specific examples of polyether sulfone include Sumitomo Chemical's trade name: Sumika Excel PES series, BASF trade name: Ultrazone E series, Solvay Specialty Polymers trade name: Belladel series, etc. Be
Figure JPOXMLDOC01-appb-C000001
Figure JPOXMLDOC01-appb-C000001
 熱可塑性ポリイミド(TPI)系樹脂としては、熱可塑性ポリイミド、ポリエーテルイミドなどが考えられる。また、熱可塑性ポリイミドでは、結晶性、非晶性を含む。例えば、熱可塑性ポリイミドとして、下記式(11)で表される繰り返し単位を有する熱可塑性ポリイミドが挙げられる。市販品として、購入でき、具体的には、三井化学株式会社製の商品名:オーラムが挙げられる。 As thermoplastic polyimide (TPI) resin, thermoplastic polyimide, polyether imide, etc. can be considered. In addition, thermoplastic polyimides include crystallinity and non-crystallinity. For example, as a thermoplastic polyimide, the thermoplastic polyimide which has a repeating unit represented by following formula (11) is mentioned. As a commercial item, it can be purchased, and specifically, trade name: Aurum manufactured by Mitsui Chemicals, Inc. can be mentioned.
Figure JPOXMLDOC01-appb-C000002
Figure JPOXMLDOC01-appb-C000002
 一方、ポリエーテルイミド(PEI)では、具体的には、サビック社製のウルテムが挙げられる。 Specific examples of polyetherimide (PEI) include Ultem manufactured by Subic.
 本実施形態において、耐熱ポリアリレート(PAR)とは、二価フェノール成分と、芳香族ジカルボン酸または芳香族ジカルボン酸ジハライドとの重縮合物であり、一般式(12)で表される繰り返し単位を有するポリマーを包含し、そのTg(ガラス転移温度)は245℃以上、好ましくは255℃以上である。市販されている代表的な耐熱ポリアリレートとしては、二価フェノールとしてビスフェノールA、芳香族ジカルボン酸としてテレフタル酸およびイソフタル酸の混合フタル酸からなるものが挙げられ、これらのモノマー構成比を変更することで、耐熱性を向上させる(Tgを高くする)ことが出来る。具体例として、たとえばユニチカ社の商品名:UポリマーやUNIFINER(ユニファイナー)のなかで、Tgが245℃以上、好ましくは255℃以上の樹脂である。 In the embodiment, the heat-resistant polyarylate (PAR) is a polycondensate of a dihydric phenol component and an aromatic dicarboxylic acid or an aromatic dicarboxylic acid dihalide, and is a repeating unit represented by the general formula (12). And the Tg (glass transition temperature) thereof is 245 ° C. or more, preferably 255 ° C. or more. Typical heat-resistant polyarylates which are commercially available include those composed of bisphenol A as dihydric phenol and a mixed phthalic acid of terephthalic acid and isophthalic acid as aromatic dicarboxylic acid, and changing their monomer composition ratio Thus, the heat resistance can be improved (Tg can be increased). As a specific example, for example, among the trade names of Unitika Co., Ltd .: U polymer and UNIFINER (Unifiner), a resin having a Tg of 245 ° C. or higher, preferably 255 ° C. or higher.
Figure JPOXMLDOC01-appb-C000003
Figure JPOXMLDOC01-appb-C000003
 本実施形態の単層フィルムは、好ましくは、ポリエーテルイミド、ポリエーテルサルホン、ポリフェニルサルホン、熱可塑性ポリイミド、耐熱ポリアリレートから選ばれる1種、または2種以上を含む熱可塑性樹脂を含む。本発明の効果を阻害しない範囲で、上記の各熱可塑性樹脂を任意の割合で含む樹脂組成物であってもよい。例えば、ガラス転移点が高い2種類以上の樹脂をアロイ化することで加熱収縮率を小さくすることが出来る。単層フィルムは、ガラス転移温度が210℃以上の熱可塑性樹脂を含み、好ましくはガラス転移温度が245℃以上の熱可塑性樹脂を、樹脂成分中少なくとも15質量%以上含み、さらに好ましくは25質量%以上95質量%以下含む熱可塑性樹脂を含む。これにより、より好ましい高い耐熱性、及び低い加熱収縮率を示すことができる。具体的には、熱可塑性ポリイミド(TPI)および/または耐熱ポリアリレート(PAR)を少なくとも15質量%以上含み、より好ましくは25質量%以上95質量%以下含む熱可塑性樹脂を含む単層フィルムである。樹脂のコストを考慮すると、本発明の単層フィルムとして最も好ましいのは、耐熱ポリアリレート(PAR)を、少なくとも15質量%以上含み、さらに好ましくは25質量%以上95質量%以下含む熱可塑性樹脂を含む単層フィルムである。驚くべきことに、ガラス転移温度が210℃以上の熱可塑性樹脂の樹脂成分中に、ガラス転移温度が245℃以上の熱可塑性樹脂を少なくとも15質量%以上含むことで、より好ましくは25質量%以上95質量%以下含むことで、250℃、60分における加熱収縮率を、これら未満の場合と比較し著しく小さくすることが可能である。 The monolayer film of the present embodiment preferably contains a thermoplastic resin containing one or more selected from polyetherimide, polyethersulfone, polyphenylsulfone, thermoplastic polyimide, and heat resistant polyarylate. . It may be a resin composition containing each of the above-described thermoplastic resins in an arbitrary ratio, as long as the effects of the present invention are not impaired. For example, the heat shrinkage can be reduced by alloying two or more resins having a high glass transition temperature. The single-layer film contains a thermoplastic resin having a glass transition temperature of 210 ° C. or higher, preferably a thermoplastic resin having a glass transition temperature of 245 ° C. or higher in the resin component, at least 15% by mass or more, more preferably 25% by mass It contains a thermoplastic resin containing 95% by mass or less. This makes it possible to exhibit more preferable high heat resistance and low heat shrinkage. Specifically, it is a single layer film containing a thermoplastic resin containing at least 15% by mass or more, more preferably 25% by mass or more and 95% by mass or less of thermoplastic polyimide (TPI) and / or heat resistant polyarylate (PAR) . In consideration of the cost of the resin, the thermoplastic resin containing at least 15% by mass, more preferably 25% by mass to 95% by mass, of the heat resistant polyarylate (PAR) is most preferable as the single layer film of the present invention. It is a single layer film containing. It is surprising that the resin component of the thermoplastic resin having a glass transition temperature of 210 ° C. or more contains at least 15% by mass or more of a thermoplastic resin having a glass transition temperature of 245 ° C. or more, more preferably 25% by mass or more By containing 95 mass% or less, it is possible to make heat contraction rate in 250 degreeC and 60 minutes small remarkably compared with the case of less than these.
 単層フィルムを構成する熱可塑性樹脂には、必要に応じ、本発明の効果を阻害しない範囲で、熱安定剤、紫外線吸収剤、帯電防止剤、滑剤、染料、顔料、ガラス繊維、炭素繊維等の繊維状強化剤、タルク、クレイ、シリカなどの粒状フィラー、マイカなどの鱗片状フィラー等の無機フィラー、一般的にフィルムに添加される公知の添加剤の単数または複数を含むことが出来る。また、フィルム製造工程で発生したスクラップ樹脂を混合して用いることができる。 The thermoplastic resin constituting the single layer film may, if necessary, be a heat stabilizer, an ultraviolet absorber, an antistatic agent, a lubricant, a dye, a pigment, a glass fiber, a carbon fiber, etc. within the range not inhibiting the effects of the present invention. Fibrous fillers, inorganic fillers such as particulate fillers such as talc, clay and silica, flaky fillers such as mica, and one or more of known additives generally added to films. In addition, scrap resins generated in the film manufacturing process can be mixed and used.
 添加剤の配合量の合計は、単層フィルムを構成する熱可塑性樹脂100質量部に対して、25質量部以下が好ましく、より好ましくは10質量部以下、更に好ましくは5質量部以下である。添加剤の配合量が上記範囲内であれば、テープとしてのハンドリング性を低下することなく使用することができる。 The total amount of additives is preferably 25 parts by mass or less, more preferably 10 parts by mass or less, and still more preferably 5 parts by mass or less, with respect to 100 parts by mass of the thermoplastic resin constituting the single layer film. If the compounding quantity of an additive is in the said range, it can be used, without the handling property as a tape falling.
 本実施形態の単層フィルムの少なくとも一方の面の算術平均表面粗さRaは、0.10μmより大きく、10μm未満であり、より好ましくは0.30μmより大きく、8.0μm未満であり、更に好ましくは0.30μmより大きく、5.0μm未満である。算術平均表面粗さRaが0.10μm以下であると、フィルムを巻取る際にシワが入りやすくなり、良好なフィルムの巻物が得られ難くなり、場合によっては巻き取り自体が困難になってしまう。算術平均表面粗さRaが0.10μmより大きく、好ましくは0.30μmより大きい場合は、単層フィルムやそれを用いた耐熱粘着テープを真空蒸着工程及び、特に過酷な真空スパッタ工程に用いた場合、フィルムやテープの変形や浮きを抑制でき、耐熱粘着テープ剥の貼り付け部での剥がれの抑制効果が向上しやすい。算術平均表面粗さRaが10μm以上の面に粘着剤を積層した場合、気泡が混入し、外観が悪化しやすくなる。本発明において算術平均表面粗さRaはJIS B0601:2001に準じて算出することができる。
 単層フィルムの他の面は凹凸構造を有していても、有していなくてもよい。具体的には、算術平均粗さRaが0.10μm未満であっても、0.10μmより大きく10μm未満であっても、10μm以上であってもよい。
Arithmetic mean surface roughness Ra of at least one surface of the single layer film of the present embodiment is more than 0.10 μm and less than 10 μm, more preferably more than 0.30 μm and less than 8.0 μm, further preferably Is greater than 0.30 μm and less than 5.0 μm. When the arithmetic average surface roughness Ra is 0.10 μm or less, wrinkles easily occur when winding the film, and it is difficult to obtain a good film roll, and in some cases, the winding itself becomes difficult. . When the arithmetic average surface roughness Ra is larger than 0.10 μm, preferably larger than 0.30 μm, a single layer film or a heat-resistant adhesive tape using the same is used in the vacuum evaporation process and particularly severe vacuum sputtering process And deformation of the film or the tape or floating can be suppressed, and the effect of suppressing peeling at the attachment portion of the heat-resistant adhesive tape peeling is easily improved. When the pressure-sensitive adhesive is laminated on a surface having an arithmetic average surface roughness Ra of 10 μm or more, air bubbles are mixed and the appearance is likely to be deteriorated. In the present invention, the arithmetic mean surface roughness Ra can be calculated according to JIS B0601: 2001.
The other surface of the single layer film may or may not have a concavo-convex structure. Specifically, the arithmetic average roughness Ra may be less than 0.10 μm, may be more than 0.10 μm and less than 10 μm, or may be 10 μm or more.
 単層フィルムの少なくとも一方の面の算術平均表面粗さRaを0.10μmより大きく、10μm未満にする為に、単層フィルム表面に微細な凹凸を形成する方法は、(イ)溶融混練した樹脂をTダイスから押出し、凹凸ロールと、別の圧着ロール、例えば鏡面の圧着ロール、とで押し出された樹脂を狭持させてフィルムを形成する方法において、微細な凹凸を有する凹凸ロールを用いてフィルムの冷却と凹凸の形成を同時に行う方法、(ロ)単層フィルムを作製した後に、微細な凹凸を有する凹凸ロールに密着させて、凹凸を形成する方法が挙げられる。これらのうち、装置の簡略化の観点からすると、(イ)の方法が好ましい。また、単層フィルムの両面へ表面粗さを付与したい場合は、圧着ロール表面に、例えばブラスト加工により、凹凸加工した圧着ロールを用いることが出来る。 In order to make the arithmetic average surface roughness Ra of at least one surface of the single layer film larger than 0.10 μm and less than 10 μm, the method of forming fine irregularities on the surface of the single layer film is (a) Melt-kneaded resin Is extruded from a T-die, and the extruded resin is sandwiched between an uneven roll and another pressure-bonding roll, for example, a mirror-shaped pressure-bonded roll to form a film, wherein the film is formed using an uneven roll having fine unevenness. The method of performing simultaneously cooling of formation of an unevenness | corrugation, and the method of making it contact | adhere to the unevenness | corrugation roll which has fine unevenness | corrugation after producing (ii) single layer film, and forming an unevenness | corrugation. Among these, from the viewpoint of simplification of the apparatus, the method (A) is preferable. In addition, when it is desired to impart surface roughness to both surfaces of a single layer film, it is possible to use a pressure bonding roll which is processed to be uneven by blasting, for example, on the pressure bonding roll surface.
 単層フィルムを構成する熱可塑性樹脂と添加剤の混合・混練方法は特に限定されることはなく各種混合・混練手段が用いられる。例えば、各々別々に押出機に供給して混合してもよい。またあらかじめ単層フィルムを構成する樹脂と添加剤をヘンシェルミキサー、ボールミキサー、ブレンダー、タンブラー等の混合機を利用して乾式予備混練し、溶融混練機にて溶融混練することができる。 The method of mixing and kneading the thermoplastic resin and the additive constituting the single layer film is not particularly limited, and various mixing and kneading means may be used. For example, they may be separately fed to the extruder and mixed. The resin and additives constituting the single layer film can be preliminarily dry-kneaded using a mixer such as a Henschel mixer, a ball mixer, a blender, a tumbler, etc., and can be melt-kneaded using a melt kneader.
 溶融混練機としては、ミキシングロール、加圧ニーダー、単軸押出機、多軸押出機を使用することができる。単軸押出機、多軸押出機を用いた場合には、ストランド状、シート状、棒状にされるため、粉砕機あるいは裁断機で粉状、顆粒状、ペレット状に加工することが好ましい。 As a melt-kneader, a mixing roll, a pressure kneader, a single-screw extruder, and a multi-screw extruder can be used. When a single-screw extruder or a multi-screw extruder is used, since it is in the form of a strand, a sheet or a rod, it is preferable to process it into powder, granules or pellets with a grinder or a cutter.
 単層フィルムの厚みは、好ましくは5μm以上100μm以下であり、より好ましくは20μm以上70μm以下であり、更に好ましくは20μm以上40μm以下である。厚みを厚くするとテープとしてのハンドリング性が良くなるが、100μmを超えるとテープを剥がした時に貼り付け部での粘着剤残りが発生しやすくなる。総厚みを5μm以上にすることにより、熱収縮率が大きくなるのを防ぐことができ、また、フィルムを巻き取る時に皺が入りやすくなるのを防ぐことができる。また、熱可塑樹脂のガラス転移点が210℃以上245℃未満の場合、単層フィルム厚みが30μmよりも厚いことが好ましく、ガラス転移点が245℃以上の場合は厚さが20μmよりも厚いことが好ましい。 The thickness of the single layer film is preferably 5 μm to 100 μm, more preferably 20 μm to 70 μm, and still more preferably 20 μm to 40 μm. When the thickness is increased, the handling property as the tape is improved, but when it exceeds 100 μm, the adhesive residue at the affixing portion tends to be generated when the tape is peeled off. By making the total thickness 5 μm or more, it is possible to prevent the heat shrinkage rate from increasing, and to prevent the wrinkles from being easily formed when winding the film. When the glass transition point of the thermoplastic resin is 210 ° C. or more and less than 245 ° C., the thickness of the single layer film is preferably more than 30 μm, and when the glass transition point is 245 ° C. or more, the thickness is more than 20 μm Is preferred.
 単層フィルムの好ましい熱収縮率は以下の通りである。250℃の環境下に60分間曝露した後の熱収縮率の絶対値が15%以下であり、より好ましくは10%以下であり、更に好ましくは5%以下である。熱収縮率が前記の範囲であれば、耐熱寸法安定性は実用上十分である。また、この単層フィルムを用いた耐熱粘着テープは、200℃以上の高温に晒された場合でも、テープの剥がれや投錨破壊(基材層から粘着層が分離して被着体側に移行する現象)を生じることがない為、テープを剥がした後、被着体への糊残りを発生することも少なく、好適に用いることができる。 The preferable heat contraction rate of the single layer film is as follows. The absolute value of the thermal contraction rate after exposure for 60 minutes in a 250 ° C. environment is 15% or less, more preferably 10% or less, and still more preferably 5% or less. If the thermal contraction rate is in the above-mentioned range, the heat resistant dimensional stability is practically sufficient. In addition, even when the heat-resistant adhesive tape using this single-layer film is exposed to a high temperature of 200 ° C. or more, the tape peels off or is anchored (the phenomenon that the adhesive layer separates from the base layer and migrates to the adherend side Can be used without causing any adhesive residue on the adherend after peeling off the tape.
 本明細書において、熱収縮率はJIS C2151に準拠して測定した。具体的には試験片(長軸150mm×短軸20mm)をMD方向およびTD方向それぞれに対して切り出し、試験片の長軸方向の中央部を中心にして間隔100mmの標線を付けた。この試験片を無荷重の状態で雰囲気温度200℃および250℃の環境下に60分間暴露し、室温まで冷却した後で、標線間の長さを測定し、下記の計算式より、算出した。熱収縮率の値は正の値が収縮を意味し、負の値が膨張を意味する。なお、MDとはフィルムの長さ(押出し)方向を示し、TDとはフィルムの幅方向を示す。
 熱収縮率(%)=(試験前の長さ-試験後の長さ)/(試験前の長さ)×100
 本実施形態の好ましい単層フィルムは、MD、TD方向共に前記熱収縮率条件を満たすことができる。
In the present specification, the thermal shrinkage was measured in accordance with JIS C2151. Specifically, a test piece (long axis 150 mm × short axis 20 mm) was cut out in each of the MD direction and the TD direction, and marked lines with a distance of 100 mm were attached centering on the central part in the long axis direction of the test piece. The test piece was exposed to no load for 60 minutes in an environment at an ambient temperature of 200 ° C. and 250 ° C., cooled to room temperature, and then the length between the marked lines was measured, and it was calculated from the following formula. . As for the value of thermal contraction rate, a positive value means contraction, and a negative value means expansion. MD indicates the length (extrusion) direction of the film, and TD indicates the width direction of the film.
Thermal shrinkage (%) = (length before test-length after test) / (length before test) x 100
The preferable single layer film of this embodiment can satisfy the above-mentioned heat shrinkage ratio condition in both MD and TD directions.
 単層フィルムの250℃の環境下に1時間曝露した時の熱重量減少率は、5.0%以下であり、より好ましくは3.0%以下であり、更に好ましくは1.5%以下である。加熱重量減少率はJIS K7102に準拠して、熱質量測定により、昇温速度10℃/minで250℃まで昇温し、更に250℃環境を30分間維持した時に得られるTG曲線から重量減少率を求めることができる。加熱重量減少率が5%を超えると、電子部品製造時の高温プロセスにおいて、アウトガスが生じ、電子部品や周囲の設備を汚染する可能性がある。また、真空プロセスにおいては所定の真空度に達するまでに時間がかかり、経済的ではない。 The thermal weight loss rate of the single layer film when exposed to an environment of 250 ° C. for 1 hour is 5.0% or less, more preferably 3.0% or less, still more preferably 1.5% or less is there. The heating weight reduction rate is a temperature reduction rate from the TG curve obtained when the temperature is raised to 250 ° C at a heating rate of 10 ° C / min according to JIS K7102 and the temperature is further maintained at 250 ° C for 30 minutes. You can ask for If the heating weight reduction rate exceeds 5%, outgassing may occur in the high temperature process during the manufacture of electronic components, which may contaminate the electronic components and surrounding equipment. Also, the vacuum process takes time to reach a predetermined degree of vacuum, which is not economical.
 単層フィルムのUV透過率は、80%以上であり、最も好ましくは85%以上である。上記範囲内であれば、単層フィルムに粘着層を積層後、単層フィルム面側から紫外線を照射して粘着剤を硬化させるプロセスにおいて、好適に用いることができる。本明細書において、UV透過率はJIS K0115に準拠して測定することができる。 The UV transmittance of the single layer film is 80% or more, and most preferably 85% or more. If it is in the said range, after laminating | stacking an adhesive layer on a single layer film, it can be used suitably in the process of irradiating an ultraviolet-ray from the single layer film surface side, and hardening an adhesive. In the present specification, UV transmittance can be measured in accordance with JIS K0115.
 単層フィルムを成型する方法としては、Tダイを用いた押出成形法が好ましい。Tダイスリップ先端部から押出した樹脂の温度は300℃以上400℃以下であることが好ましく、より好ましくは310℃以上390℃以下である。上記の範囲であれば、厚みの均一性に優れたフィルムが得られやすくなる。一方、300℃未満の場合、均一な厚みのフィルムを得ることが難しくなる。また、300℃以上であれば熱収縮率が大きくなることを防ぐことができる。400℃を超えると、樹脂が熱劣化しやすくなり、フィルムの外観が悪化しやすくなる。 As a method of molding a monolayer film, an extrusion molding method using a T-die is preferable. The temperature of the resin extruded from the tip of the T die slip is preferably 300 ° C. or more and 400 ° C. or less, more preferably 310 ° C. or more and 390 ° C. or less. If it is said range, the film excellent in the uniformity of thickness will be easy to be obtained. On the other hand, if the temperature is less than 300 ° C., it becomes difficult to obtain a film of uniform thickness. Moreover, if it is 300 degreeC or more, it can prevent that a thermal contraction rate becomes large. When the temperature exceeds 400 ° C., the resin is apt to be thermally deteriorated and the appearance of the film is apt to be deteriorated.
 凹凸ロールの表面温度は、110℃以上230℃以下であることが好ましく、より好ましくは130℃以上200℃以下であり、更に好ましくは140℃以上190℃以下である。上記の範囲内であれば、熱収縮率の小さいフィルム及び、外観性の良いフィルム表面を得ることができる。また、凹凸ロールの製法、加工法は任意であるが、表面をマット加工(ブラスト加工など)、凹凸加工(レーザー彫刻法、ミル彫刻法、ダイヤモンドバイト加工法、電鋳法など)することで、所定の表面粗さを有するフィルム表面を得ることも可能である。これら、マット加工、凹凸加工する面は金属系、セラミック軽、ゴム系の材質を使用することができる。凹凸ロール温度が230℃以上の場合、フィルムと凹凸ロールが粘着し、凹凸ロールからフィルムをスムースに剥離することが難しくなり、フィルムの外観が悪化しやすくなる。 The surface temperature of the uneven roll is preferably 110 ° C. or more and 230 ° C. or less, more preferably 130 ° C. or more and 200 ° C. or less, and still more preferably 140 ° C. or more and 190 ° C. or less. If it is in the above-mentioned range, a film with a small heat contraction rate and a film surface with a good appearance can be obtained. Moreover, although the manufacturing method and processing method of the concavo-convex roll are arbitrary, the surface is matted (blast processing etc.) and concavo-convex processing (laser engraving method, mill engraving method, diamond bite processing method, electroforming method, etc.) It is also possible to obtain a film surface having a predetermined surface roughness. Surfaces to be subjected to matting and concavo-convex processing can be made of metal, ceramic, and rubber materials. When the uneven roll temperature is 230 ° C. or more, the film and the uneven roll adhere to each other, it becomes difficult to peel the film smoothly from the uneven roll, and the appearance of the film is likely to be deteriorated.
 単層フィルムには、必要によって、単層フィルム表面の濡れ性を向上させる為に、その片面または両面に、コロナ処理、プラズマ処理、オゾン処理、フレーム処理、アルカリ処理、蒸着処理、及びプライマ処理等の公知の易接着処理を施すことができる。これら処理によって、金属箔との積層や、後述する粘着層の積層において、単層フィルムとの密着力を向上することができる。 In order to improve the wettability of the single layer film surface, the single layer film may be subjected to corona treatment, plasma treatment, ozone treatment, flame treatment, alkali treatment, vapor deposition treatment, primer treatment, etc. The well-known easy adhesion process can be applied. By these treatments, adhesion to a single layer film can be improved in lamination with a metal foil or lamination of an adhesive layer described later.
 単層フィルムは、耐熱性やUV透過性に優れ、高温雰囲気下で加熱収縮率及び加熱重量減少率が小さいため、ポリイミドフィルムの代替として、フレキシブルプリント基板(FPC)、半導体実装用のフィルム状基板(TABやCOF)、および耐熱粘着テープなどの積層体に使用される基材フィルムや、フレキシブル太陽電池、タッチパネルの積層体に使用される基材フィルム、または基板の表面を保護する導体回路保護用のカバーレイフィルム、フィルムコンデンサ用フィルム等に好適に用いることができる。 A single-layer film is excellent in heat resistance and UV transmittance, and has a small heat shrinkage and a decrease in heating weight reduction rate under a high temperature atmosphere. Therefore, a flexible printed circuit (FPC) as a substitute for a polyimide film, a film-like substrate for semiconductor mounting Substrate film used for laminates such as (TAB and COF) and heat-resistant adhesive tape, substrate film used for laminates of flexible solar cells and touch panels, or conductor circuit protection for protecting the surface of a substrate It can be suitably used as a coverlay film of the above, a film for a film capacitor, and the like.
 また、耐熱性や成形加工性に優れることから、スピーカー振動板用フィルム、真空圧空成形用保護フィルム、インサート成形用保護フィルム、及びインモールド成形用保護フィルム等に好適に用いることが出来る。この用途の場合のフィルムとしては、サルホン系フィルムが好ましい。また、回路基板用フィルム、ヒーター絶縁材用フィルム、ガラス保護用フィルム、家電製品部材用フィルム、または自動車部品部材用フィルムとしても好適に用いることができる。 Further, since they are excellent in heat resistance and molding processability, they can be suitably used as a film for a speaker diaphragm, a protective film for vacuum pressure forming, a protective film for insert molding, a protective film for in-mold molding, and the like. As a film in the case of this application, a sulfone type film is preferable. Moreover, it can be suitably used also as a film for circuit boards, a film for heater insulating material, a film for glass protection, a film for household appliance parts, or a film for automobile parts.
(耐熱粘着テープ)
 以下は本発明の第二である、単層フィルムを用いた耐熱粘着テープに関する説明である。本実施形態の耐熱粘着テープは、上記した単層フィルムと、該単層フィルムの少なくとも一方の面に形成された粘着層とを有するものである。粘着層は、単層フィルムの、凹凸ロール面(凹凸ロール側に形成される面であり、凹凸加工面である。)のみ、または、圧着ロール面(圧着ロール側に形成される面であり、凹凸未加工面である。)のみに形成されていてもよく、両面に形成されていてもよい。好ましくは、粘着層は、圧着ロール面(凹凸未加工面)のみに形成される。
(Heat resistant adhesive tape)
The following is a description of the heat-resistant pressure-sensitive adhesive tape using a single-layer film, which is the second aspect of the present invention. The heat-resistant adhesive tape of the present embodiment has the above-described single-layer film and an adhesive layer formed on at least one surface of the single-layer film. The pressure-sensitive adhesive layer is a single-layer film having only a concavo-convex roll surface (a surface formed on the concavo-convex roll side and being a concavo-convex processed surface) or a pressure-bonding roll surface (a surface formed on the crimp roll) It is an uneven | corrugated unmachined surface.) It may be formed only on both surfaces. Preferably, the adhesive layer is formed only on the pressure roll surface (uneven surface).
 耐熱粘着テープの単層フィルムの厚みは、好ましくは5μm以上100μm以下であり、より好ましくは20μm以上70μm以下である。粘着層の厚みは、好ましくは5μm以上70μm以下であり、より好ましくは15μm以上50μm以下である。 The thickness of the single layer film of the heat-resistant adhesive tape is preferably 5 μm or more and 100 μm or less, more preferably 20 μm or more and 70 μm or less. The thickness of the adhesive layer is preferably 5 to 70 μm, and more preferably 15 to 50 μm.
 単層フィルムを用いた耐熱粘着テープにおいて、最も好ましい形態は、耐熱粘着テープを被着体等に接着した場合、被着体が接着される被着体粘着面の反対側の面(テープを被着体等に接着した場合、単層フィルムの表面となる面)に凹凸構造を有する。言い換えると、耐熱粘着テープは、単層フィルムと、該単層フィルムの一方の表面上に形成された粘着層とを有し、粘着層が形成された面の反対側の面に、凹凸構造を有する。この凹凸構造は、具体的には、算術平均表面粗さRaが0.10μmより大きく10μm未満、好ましくは0.30μmより大きく10μm未満である。このような構造は、単層フィルムの被着体粘着面の反対側の面が凹凸ロール面である場合である。 In the heat-resistant adhesive tape using a single layer film, the most preferable form is the surface opposite to the adherend pressure-sensitive adhesive surface to which the adherend is adhered when the heat-resistant adhesive tape is adhered to the adherend etc. When it adheres to an adherend etc., it has an uneven | corrugated structure in the surface used as the surface of a single layer film. In other words, the heat-resistant adhesive tape has a single-layer film and an adhesive layer formed on one surface of the single-layer film, and has an uneven structure on the surface opposite to the surface on which the adhesive layer is formed. Have. Specifically, the concavo-convex structure has an arithmetic average surface roughness Ra of more than 0.10 μm and less than 10 μm, preferably more than 0.30 μm and less than 10 μm. Such a structure is a case where the surface on the opposite side of the adherend adhesive surface of the single-layer film is a concavo-convex roll surface.
 別な実施形態では、単層フィルムの被着体粘着面の反対側の面が圧着ロール面(凹凸未加工面)であっても、この本面に対して公知の凹凸加工を行って、凹凸構造を形成することも可能である。耐熱粘着テープにおいて、単層フィルムの被着体粘着面の反対側の面に凹凸構造を有することで、真空スパッタ処理を200℃~250℃の温度範囲で行った場合でも、テープの浮きを抑制できる。また、真空スパッタ処理を200℃~250℃の温度範囲で行った後にテープを剥がした後、糊残りの発生を抑制できる。これは、真空スパッタ処理等の高温かつ過酷な条件下であっても、表面にあらかじめ設けられた凹凸面が過酷な処理により表面に発生する伸び応力や収縮応力を吸収することでテープの変形を抑制するためであると考えられる。 In another embodiment, even if the surface on the opposite side of the adherend adhesive surface of the single-layer film is a pressure-bonding roll surface (uneven surface), a known unevenness processing is performed on this surface to make the unevenness It is also possible to form a structure. In the heat-resistant adhesive tape, the uneven surface structure is provided on the surface opposite to the adherend adhesive surface of the single-layer film, so that the tape is prevented from floating even when vacuum sputtering is performed in the temperature range of 200 ° C to 250 ° C. it can. In addition, after the tape is peeled off after vacuum sputtering processing is performed in a temperature range of 200 ° C. to 250 ° C., generation of adhesive residue can be suppressed. This is because even under high temperature and severe conditions such as vacuum sputtering treatment, the uneven surface provided in advance on the surface absorbs the elongation stress and contraction stress generated on the surface due to the severe treatment, so that the tape is deformed. It is considered to be to suppress.
 本発明は、さらに被着体を貼り付けた上記耐熱粘着テープである。つまり、一実施形態において、基材粘着面を構成する粘着層を介して、被着体に貼付する耐熱粘着テープとすることができる。被着体として好ましくは、半導体部品、電材部品、あるいは光学部品であり、本基材は、基板でもあり得る。
 一方、本実施形態の単層フィルムを用いた耐熱粘着テープにおいて、テープを被着体等に粘着した場合、単層フィルムの被着体粘着面側は、凹凸構造を有していても、有していなくてもよい。つまり、粘着層を介して被着体が積層されている耐熱粘着テープにおいて、粘着層と単層フィルムの界面における単層フィルム表面は、算術平均粗さRaが0.10μm未満であっても、0.10μmより大きく10μm未満であっても、10μm以上であってもよい。
The present invention is the above-mentioned heat-resistant adhesive tape to which an adherend is further attached. That is, in one embodiment, it can be set as the heat-resistant adhesive tape stuck to a to-be-adhered body through the adhesive layer which comprises a base-material adhesive surface. The adherend is preferably a semiconductor component, an electric material component, or an optical component, and the base may be a substrate.
On the other hand, in the heat-resistant pressure-sensitive adhesive tape using the single-layer film of the present embodiment, when the tape is adhered to an adherend or the like, the adherend pressure-sensitive adhesive side of the single-layer film has an uneven structure. You do not have to. That is, in the heat-resistant pressure-sensitive adhesive tape in which the adherend is laminated via the pressure-sensitive adhesive layer, the single-layer film surface at the interface between the pressure-sensitive adhesive layer and the single-layer film has an arithmetic average roughness Ra of less than 0.10 μm, It may be more than 0.10 μm and less than 10 μm, or 10 μm or more.
 本発明の第三は、ガラス転移温度が210℃以上の熱可塑性樹脂を用いてなる単層フィルムと粘着層とを積層してなり、単層フィルムの被着体粘着面の反対側の面(単層フィルムの表面側の面)に凹凸構造を有する、耐熱粘着テープである。本発明の第三における単層フィルムは、好ましくは、ガラス転移温度が210℃以上の熱可塑性樹脂からなり、かつガラス転移温度が245℃以上の熱可塑性樹脂を、樹脂成分中少なくとも15質量%以上、好ましくは25質量%以上含む。本発明の第三における単層フィルムは、最も好ましくは、ガラス転移温度が245℃以上である熱可塑性樹脂を主として含む。
 凹凸構造は、好ましくは、その算術平均表面粗さRaが0.10μmより大きく10μm未満であり、さらに好ましくは0.30μmより大きく10μm未満である。さらに本発明は被着体に張り付けた前記耐熱粘着テープである。つまり、一実施形態において、耐熱粘着テープの一方の面に、被着体粘着面を構成する粘着層を介して被着体に貼付された、耐熱粘着テープとすることができる。被着体として好ましくは、半導体部品、電材部品、あるいは光学部品であり、本被着体は、基板でもあり得る。
 一方、本発明の単層フィルムを用いた耐熱粘着テープにおいて、テープを被着体等に粘着した場合、単層フィルムの被着体粘着面側は、凹凸構造を有していても、有していなくてもよい。つまり、粘着層を介して被着体が積層されている耐熱粘着テープにおいて、粘着層と単層フィルムの界面における単層フィルム表面は、算術平均粗さRaが0.10μm未満であっても、0.10μmより大きく10μm未満であっても、10μm以上であってもよい。本耐熱粘着テープの単層フィルムの厚みは、好ましくは5μm以上100μm以下であり、より好ましくは20μm以上70μm以下である。粘着層厚みは、好ましくは5μm以上70μm以下であり、より好ましくは10μm以上50μm以下である。
In the third aspect of the present invention, a single layer film made of a thermoplastic resin having a glass transition temperature of 210 ° C. or higher and an adhesive layer are laminated, and the surface opposite to the adherend adhesive surface of the single layer film ( It is a heat-resistant adhesive tape which has an uneven | corrugated structure in the surface of the surface side of a single layer film. The single-layer film according to the third aspect of the present invention is preferably made of a thermoplastic resin having a glass transition temperature of 210 ° C. or higher, and a thermoplastic resin having a glass transition temperature of 245 ° C. or higher in at least 15% by mass in the resin component. Preferably, 25 mass% or more is included. The monolayer film in the third aspect of the present invention most preferably comprises mainly a thermoplastic resin having a glass transition temperature of 245 ° C. or higher.
The concavo-convex structure preferably has an arithmetic average surface roughness Ra of more than 0.10 μm and less than 10 μm, and more preferably more than 0.30 μm and less than 10 μm. Further, the present invention is the above-mentioned heat-resistant adhesive tape attached to an adherend. That is, in one embodiment, the heat-resistant pressure-sensitive adhesive tape may be attached to one surface of the heat-resistant pressure-sensitive adhesive tape via the pressure-sensitive adhesive layer constituting the adherend pressure-sensitive adhesive surface. The adherend is preferably a semiconductor component, an electrical material part, or an optical component, and the adherend may be a substrate.
On the other hand, in the heat-resistant adhesive tape using the single-layer film of the present invention, when the tape is adhered to an adherend or the like, the adherend pressure-sensitive adhesive side of the single-layer film has an uneven structure. You do not have to. That is, in the heat-resistant pressure-sensitive adhesive tape in which the adherend is laminated via the pressure-sensitive adhesive layer, the single-layer film surface at the interface between the pressure-sensitive adhesive layer and the single-layer film has an arithmetic average roughness Ra of less than 0.10 μm, It may be more than 0.10 μm and less than 10 μm, or 10 μm or more. The thickness of the single-layer film of the heat-resistant pressure-sensitive adhesive tape is preferably 5 μm to 100 μm, and more preferably 20 μm to 70 μm. The thickness of the adhesive layer is preferably 5 μm to 70 μm, and more preferably 10 μm to 50 μm.
 上記した耐熱粘着テープにおいて、粘着層を構成する粘着剤の粘着成分としては、特に限定されず、当該単層フィルムを用いた耐熱粘着テープが貼り付けされる樹脂性のフィルム基材や筐体への接着性を考慮して、公知の粘着剤のなかから適宜選択すればよい。具体的には、例えば(メタ)アクリル樹脂系、ウレタン樹脂系、シリコーン系、合成ゴム、天然ゴムなどが使用され、これらの中でも、接着性が良好であり、耐熱性に優れる点で、(メタ)アクリル樹脂系、シリコーン系が好ましい。粘着層の厚さは、上記のとおりとすることが好ましく、中でも、10~50μmであることがより好ましい。粘着層の厚さが10μm以上であれば、充分な粘着性を確保しやすく、50μm以下であれば、容易に粘着層を形成できる。 In the heat-resistant adhesive tape described above, the adhesive component of the adhesive constituting the adhesive layer is not particularly limited, and a resinous film substrate or casing to which the heat-resistant adhesive tape using the single layer film is attached In consideration of the adhesiveness of the above, it may be appropriately selected from known adhesives. Specifically, for example, (meth) acrylic resins, urethane resins, silicones, synthetic rubbers, natural rubbers, etc. are used. Among them, (Meta) is preferable in that it has good adhesion and excellent heat resistance. ) Acrylic resin type and silicone type are preferable. The thickness of the adhesive layer is preferably as described above, and in particular, 10 to 50 μm is more preferable. When the thickness of the adhesive layer is 10 μm or more, sufficient adhesiveness can be easily ensured, and when the thickness is 50 μm or less, the adhesive layer can be easily formed.
 本実施形態の耐熱粘着テープにおいて、単層フィルムに用いられる熱可塑性樹脂に、前記の通り、一般的にフィルムに添加される公知の添加剤を添加することができる。添加した添加剤の粘着側への移行等の影響により粘着剤の粘着力が低下することを防ぐため、粘着剤を構成する(メタ)アクリル系組成物の構成を変更したり、粘着付与剤をさらに添加したりすることができる。具体的には粘着剤へグリシジルメタクリレートを共重合する、及び/または、粘着付与剤として例えば、軟化点が70℃以上180℃以下のテルペンフェノール樹脂を添加する、等により、粘着力の低下を抑制することができる。ここで、軟化点が70℃以上180℃以下のテルペンフェノール樹脂としては、好ましくはヤスハラケミカル社製「YSポリスター」シリーズのテルペンフェノール樹脂が挙げられる。粘着付与剤の含有量は、粘着成分(例えば(メタ)アクリル酸エステル重合体)100質量部に対して、0質量部~20質量部とすることができる。粘着剤組成物には、例えば、軟化剤、老化防止剤、充填剤、導電剤、紫外線吸収剤、及び光安定剤等の各種添加剤を添加してもよい。その他の添加剤の含有量は、特に限定されず、粘着成分(例えば(メタ)アクリル酸エステル重合体)100質量部に対して、0質量部~20質量部とすることができる。 In the heat-resistant adhesive tape of the present embodiment, as described above, a known additive generally added to a film can be added to the thermoplastic resin used for the single layer film. In order to prevent the adhesive force of the adhesive from decreasing due to the effect of the added additive on the adhesive side, etc., the configuration of the (meth) acrylic composition constituting the adhesive may be changed, or the tackifier may be used. It can be further added. Specifically, cohesion of glycidyl methacrylate to an adhesive and / or addition of a terpene phenol resin having a softening point of 70 ° C. or more and 180 ° C. or less as a tackifier, for example, suppresses a decrease in adhesive strength. can do. Here, as the terpene phenol resin having a softening point of 70 ° C. or more and 180 ° C. or less, a terpene phenol resin of “YS polystar” series manufactured by Yashara Chemical Co., Ltd. is preferably mentioned. The content of the tackifier can be 0 parts by mass to 20 parts by mass with respect to 100 parts by mass of the adhesive component (for example, (meth) acrylic acid ester polymer). The pressure-sensitive adhesive composition may contain, for example, various additives such as a softener, an antiaging agent, a filler, a conductive agent, an ultraviolet absorber, and a light stabilizer. The content of the other additives is not particularly limited, and can be 0 parts by mass to 20 parts by mass with respect to 100 parts by mass of the adhesive component (for example, (meth) acrylic acid ester polymer).
 耐熱粘着テープの製造方法は、例えば、単層フィルムの表面に直接粘着剤を塗工する方法(直接塗工法)、剥離紙または剥離フィルムの表面に粘着剤を塗工して粘着層を形成した後に、その粘着層と単層フィルムとを貼り合せる方法(転写法)が挙げられる。粘着剤を塗工する方法は、特に限定されるものではなく、従来公知の方法を用いることができる。印刷による形成方法は、例えば、グラビア印刷法、フレキソ印刷法、オフセット印刷法等が挙げられる。コーティングによる方法は、例えば、ロールコート、リバースコート、コンマコート、ナイフコート、ダイコート、グラビアコート等が挙げられる。粘着層を形成した後で、粘着層を加熱により架橋する為、例えば40~100℃の温度で数時間から3日間程度エージングすることが好ましい。エージングによって架橋反応を進行させ、使用中の十分な粘着力と、使用後の剥離性を確保することができる。 The heat-resistant adhesive tape was produced, for example, by a method of directly applying an adhesive on the surface of a single layer film (direct coating method), or applying an adhesive on the surface of release paper or release film to form an adhesive layer. Later, a method (transfer method) in which the pressure-sensitive adhesive layer and the single-layer film are laminated may be mentioned. The method for applying the pressure-sensitive adhesive is not particularly limited, and a conventionally known method can be used. The formation method by printing includes, for example, a gravure printing method, a flexographic printing method, an offset printing method, and the like. Examples of the method by coating include roll coating, reverse coating, comma coating, knife coating, die coating, gravure coating and the like. In order to crosslink the adhesive layer by heating after forming the adhesive layer, for example, it is preferable to age at a temperature of 40 to 100 ° C. for several hours to 3 days. The crosslinking reaction can be advanced by aging to ensure sufficient adhesiveness during use and releasability after use.
 本実施形態の耐熱粘着テープは上述した単層フィルムを用いている為、耐熱性、UV透過性に優れ、高温雰囲気下でも収縮率が小さく加熱重量減少率が小さいことから、粘着ラベル、電子部品製造用テープ、マスキングテープ、チップサイズパッケージ実装工程の基板固定用テープ、フィルム状基板生産工程用スペーステープ等に好適に用いることができる。特に加熱重量減少率が小さいことは、真空工程に用いる各種耐熱粘着テープ、フィルムとして用いる場合、アウトガス発生量が少ないため、工程設備の汚染が少なく、あるいは所定の真空度の達するまでの時間が短いため、好適である。
 好ましい用途は具体的には、真空蒸着処理工程または、スパッタ処理工程で用いられる場合の、装置内の処理面を保護するために使用するマスキング用耐熱粘着用テープである。本用途で使用する場合は、耐熱性、低い加熱重量減少率、低い加熱収縮率が求められるため、単層フィルムの熱可塑性樹脂はPES樹脂や、熱可塑性ポリイミド、耐熱ポリアリレートから選ばれる樹脂が好ましい。本発明の耐熱粘着テープを用いた場合、真空スパッタ後の耐熱テープの浮きを抑制でき、加熱処理後の糊残りも抑制できるため、本用途に好適に使用できる。
Since the heat-resistant adhesive tape of this embodiment uses the above-mentioned single-layer film, it is excellent in heat resistance and UV transmittance, and has a small shrinkage even under high temperature atmosphere and a small heating weight reduction ratio. It can be suitably used as a manufacturing tape, a masking tape, a tape for fixing a substrate in a chip size package mounting process, a space tape for a film-like substrate manufacturing process, and the like. In particular, when the heating weight reduction rate is small, when used as various heat-resistant adhesive tapes and films used in vacuum processes, the amount of outgas generation is small, so contamination of process equipment is small, or the time to reach a predetermined degree of vacuum is short. Therefore, it is suitable.
A preferred application is, specifically, a masking heat-resistant adhesive tape used to protect the treated surface in the apparatus when it is used in a vacuum deposition process step or a sputtering process step. When used in this application, heat resistance, low heating weight reduction rate, and low heat shrinkage are required, so the thermoplastic resin of the single layer film is a resin selected from PES resin, thermoplastic polyimide, and heat resistant polyarylate. preferable. When the heat-resistant adhesive tape of the present invention is used, it is possible to suppress the floating of the heat-resistant tape after vacuum sputtering and to suppress the adhesive residue after heat treatment, so it can be suitably used for this application.
 以下、本発明を詳細に説明するが、本発明はこれらによって限定されるものではない。
 実施例及び比較例において、単層フィルムで使用した樹脂は、以下の通りである。
Hereinafter, the present invention will be described in detail, but the present invention is not limited thereto.
Resins used in the monolayer film in Examples and Comparative Examples are as follows.
 ポリエーテルサルホン(PES):スミカエクセル(商品名)、住友化学社製、ガラス転移温度 225℃
 ポリフェニルサルホン(PPSU):ウルトラゾーン(商品名)、BASF社製、ガラス転移温度 220℃
 ポリエーテルイミド(PEI):ULTEM(商品名)SABIC社製、ガラス転移温度 217℃
 耐熱ポリアリレート(PAR):Uポリマー(商品名)、ユニチカ社製、ガラス転移温度 263℃
 熱可塑性ポリイミド(TPI):オーラム(商品名)、三井化学社製、ガラス転移温度 260℃
 ポリエーテルエーテルケトン(PEEK):VESTAKEEP(商品名)、ダイセルエボニック社製、ガラス転移温度 146℃
 ポリカーボネート(PC):パンライト(商品名)、帝人社製、ガラス転移温度150℃
 有機系顔料 Paliotol Yellow K 0961(商品名)、BASF社製
Polyether sulfone (PES): SUMIKA EXCEL (trade name), Sumitomo Chemical Co., Ltd., glass transition temperature 225 ° C.
Polyphenyl sulfone (PPSU): Ultrazone (trade name), manufactured by BASF, glass transition temperature 220 ° C.
Polyether imide (PEI): ULTEM (trade name) manufactured by SABIC, glass transition temperature 217 ° C.
Heat resistant polyarylate (PAR): U polymer (trade name), manufactured by Unitika, glass transition temperature 263 ° C.
Thermoplastic polyimide (TPI): Aurum (trade name), Mitsui Chemicals, Inc., glass transition temperature 260 ° C.
Polyether ether ketone (PEEK): VESTAKEEP (trade name), manufactured by Daicel Evonik, glass transition temperature 146 ° C.
Polycarbonate (PC): Panlite (trade name), manufactured by Teijin Limited, glass transition temperature 150 ° C.
Organic pigment Paliotol Yellow K 0961 (trade name), manufactured by BASF
<ガラス転移温度の測定>
 単層フィルムに用いた熱可塑性樹脂のガラス転移温度は、ブルカー社製の示差走査熱量測定装置「DSC3100SA」を用い、窒素雰囲気下で昇温速度10℃/minで室温から380℃までDSC測定を行い、DSC曲線において、各ベースラインの延長した直線から縦軸方向に等距離にある直線と、ガラス転移の段階状変化部分の曲線とが交わる点とした。
<Measurement of glass transition temperature>
The glass transition temperature of the thermoplastic resin used for the single layer film was measured from room temperature to 380 ° C. at a temperature rising rate of 10 ° C./min under a nitrogen atmosphere using a differential scanning calorimeter “DSC 3100 SA” manufactured by Bruker. Then, in the DSC curve, a straight line equidistant from the extended straight line of each baseline in the vertical axis direction and the curve of the step change portion of the glass transition intersect.
(実施例1)
<単層フィルムの作製>
 単層フィルムを構成する樹脂として、ポリエーテルサルホン100質量部に対し有機系顔料:Paliotol Yellow K 0961(商品名)、BASF社製、1質量部を添加し、容器に投入してタンブラーを用いてプリブレンドし、攪拌混合物を得た。この攪拌混合物を径30mmの二軸溶融押出機に供給し、溶融混練して先端部のダイスから棒形に吐出させてストランドを形成させた。溶融混練条件は、シリンダー温度:350~370℃、アダプター温度:370℃、ダイス温度:370℃とした。次いで、形成したストランドを水冷した後、ペレタイザによりカットして、長さ2~3mm、直径1~2mmのペレット形の成形用材料を得た。
 この成型用材料を径40mmの単軸押出し機から押出し、幅600mmのTダイスから樹脂温度360℃で吐出させて、引取機のシリコーンゴム製の圧着ロールと、ロール表面の算術平均表面粗さRaが0.7μmの微細凹凸形状を有する金属製凹凸ロール(表面温度140℃)とで挟持させ、巻取機に向けて連続的に移送させ、微細凹凸形状を有する単層フィルムを得た。
Example 1
<Production of single layer film>
Organic resin: Paliotol Yellow K 0961 (trade name), 1 part by mass made by BASF Corp. is added to 100 parts by mass of polyether sulfone as a resin constituting a single layer film, and it is charged into a container and used with a tumbler. Preblended to give a stirred mixture. The stirred mixture was fed to a twin screw extruder having a diameter of 30 mm, melt-kneaded, and discharged from a die at the tip into a bar shape to form a strand. Melt-kneading conditions were cylinder temperature: 350-370 ° C., adapter temperature: 370 ° C., and die temperature: 370 ° C. Next, the formed strand was water-cooled and then cut by a pelletizer to obtain a molding material of pellet form 2-3 mm in length and 1-2 mm in diameter.
This molding material is extruded from a single screw extruder having a diameter of 40 mm and discharged from a 600 mm wide T die at a resin temperature of 360 ° C., and a silicone rubber pressure roll of a take-off machine and arithmetic mean surface roughness Ra of roll surface The film was sandwiched between a metal concavo-convex roll (surface temperature: 140 ° C.) having a fine concavo-convex shape of 0.7 μm, and was continuously transferred toward the winding machine to obtain a single layer film having a fine concavo-convex shape.
<耐熱粘着テープの作製>
 次に、作製した単層フィルムを用い、下記の手順で耐熱粘着テープを作製した。
粘着層を形成するアクリル系粘着剤として、(メタ)アクリル酸エステル共重合体を次のようにして合成した。容量1リットルのセパラブルフラスコに、0.2質量%のポリビニルアルコールを含有する水200質量部と、n-ブチルアクリレート72質量部と、メチルメタクリレート20質量部と、グリシジルメタクリレート3質量部と、2-ヒドロキシエチルメタクリレート5質量部と、重合開始剤として過酸化ベンゾイル0.1質量部と、分子量調整用に連鎖移動剤とを含む均一混合液を投入した。該混合液を窒素雰囲気下で攪拌しながら70℃に昇温し、4時間懸濁重合させた。次いで、デカンテーションによって懸濁液から水分を除いた。固形物を吸引ろ過しながら水で洗浄し、室温で乾燥後に、60℃で真空乾燥を行い、含水率0.5%以下の共重合樹脂を得た。得られた(メタ)アクリル酸エステル共重合体を、トルエン中で溶融攪拌した。これにイソシアネート系硬化剤と、粘着付与樹脂(テルペンフェノール樹脂:ヤスハラケミカル社製「YSポリスターG150」、軟化温度:150℃)を加えて攪拌混合して、粘着剤組成物を得た。
 この粘着剤組成物を、幅300mm、長さ400mm、厚さ50μmの単層フィルム上に、硬化後の厚みが20μmとなるようにアプリケータを用いて塗工した後、100℃、2分の条件で加熱して乾燥させた。粘着面に保護フィルムとして、幅300mm、長さ400mm、離型処理された厚み38μmのポリエステルフィルムを貼り合わせ、粘着テープを得た。これをオーブンにより40℃、3日間の加熱条件でエージング処理し、架橋させた粘着層として、幅300mm、長さ400mm、厚さ0.070mmの粘着テープを得た。粘着剤の形成面は単層フィルムの凹凸ロール面に行った。
<Production of heat-resistant adhesive tape>
Next, the heat-resistant adhesive tape was produced in the following procedure using the produced single layer film.
A (meth) acrylic acid ester copolymer was synthesized as follows as an acrylic pressure-sensitive adhesive for forming a pressure-sensitive adhesive layer. In a 1-liter separable flask, 200 parts by mass of water containing 0.2% by mass of polyvinyl alcohol, 72 parts by mass of n-butyl acrylate, 20 parts by mass of methyl methacrylate, 3 parts by mass of glycidyl methacrylate, 2 A homogeneous liquid mixture containing 5 parts by mass of hydroxyethyl methacrylate, 0.1 parts by mass of benzoyl peroxide as a polymerization initiator, and a chain transfer agent for molecular weight adjustment was charged. The mixture was heated to 70 ° C. with stirring under a nitrogen atmosphere, and was subjected to suspension polymerization for 4 hours. The suspension was then dewatered by decantation. The solid was washed with water while suction filtering, and after drying at room temperature, vacuum drying was performed at 60 ° C. to obtain a copolymer resin having a water content of 0.5% or less. The obtained (meth) acrylic acid ester copolymer was melted and stirred in toluene. An isocyanate-based curing agent and a tackifier resin (terpene phenol resin: "YS polystar G150" manufactured by Yashara Chemical Co., Ltd., softening temperature: 150 ° C.) were added thereto and stirred and mixed to obtain a pressure-sensitive adhesive composition.
The pressure-sensitive adhesive composition is coated on a single-layer film with a width of 300 mm, a length of 400 mm and a thickness of 50 μm using an applicator such that the thickness after curing is 20 μm, and then 100 ° C. for 2 minutes Heated to conditions and dried. As a protective film, a polyester film having a width of 300 mm, a length of 400 mm, and a release treatment thickness of 38 μm was attached to the adhesive surface to obtain an adhesive tape. The resultant was subjected to aging treatment at 40 ° C. for 3 days in an oven to obtain a crosslinked adhesive layer, to obtain an adhesive tape having a width of 300 mm, a length of 400 mm and a thickness of 0.070 mm. The pressure sensitive adhesive was formed on the uneven roll surface of the single layer film.
(実施例2~17)
 凹凸ロール及び圧着ロールの表面粗さの異なるロールを用い、単層フィルムに用いる樹脂、顔料、厚み、表面粗さ、粘着剤の塗工面、厚みを、表1に示すように構成した以外は、実施例1と同様にして、単層フィルム及び、耐熱粘着テープを作製した。粘着剤の形成面は単層フィルムの凹凸ロール面、圧着ロール面、又はその両面で行った。また、実施例4、9、10、16、17では、表面にブラスト加工した圧着ロールを使用した。
(Examples 2 to 17)
Except that the resin used for the single layer film, the thickness, the surface roughness, the coated surface of the pressure-sensitive adhesive, and the thickness are as shown in Table 1 using rolls different in surface roughness of the concavo-convex roll and the pressure bonding roll In the same manner as in Example 1, a single-layer film and a heat-resistant adhesive tape were produced. The pressure-sensitive adhesive was formed on the uneven roll surface of the single layer film, the pressure roll surface, or on both sides thereof. Moreover, in Example 4, 9, 10, 16, 17, the pressure bonding roll which carried out the blast process on the surface was used.
(比較例1~3)
 凹凸ロール及び圧着ロールの表面粗さの異なるロールを用い、単層フィルムに用いる樹脂、顔料、厚み、表面粗さ、粘着剤の塗工面、厚みを、表2に示すように構成した以外は、実施例1に基づいて、単層フィルム及び、耐熱粘着テープを作製した。ただし、比較例1のみは凹凸ロールを用いず、鏡面のロールを用いてフィルムを作製した。
(Comparative Examples 1 to 3)
Except that the resin used for the single layer film, the thickness, the surface roughness, the coated surface of the pressure-sensitive adhesive, and the thickness are as shown in Table 2 using rolls different in surface roughness of the unevenness roll and the pressure bonding roll, Based on Example 1, a monolayer film and a heat-resistant adhesive tape were produced. However, only the comparative example 1 produced the film using the roll of a mirror surface, without using an uneven | corrugated roll.
(比較例4)
 市販のポリイミドフィルム(宇部興産製、ユーピレックス25S 厚み25μm)を用いた。また、このフィルムを用いて耐熱粘着テープを作製した。粘着剤は任意の片面に塗工した。
(Comparative example 4)
A commercially available polyimide film (manufactured by Ube Industries, Upirex 25S, thickness 25 μm) was used. Moreover, the heat-resistant adhesive tape was produced using this film. The adhesive was applied on any one side.
(比較例5)
 市販の二軸延伸ポリエチレンナフタレートフィルム(PEN、帝人社製、テオネックスQ51厚み25μm)を用いた。また、このフィルムを用いて耐熱粘着テープを作製した。粘着剤は任意の片面に塗工した。用いたPENフィルムのガラス転移温度は140℃、結晶融点は260℃であった。
(Comparative example 5)
A commercially available biaxially stretched polyethylene naphthalate film (PEN, manufactured by Teijin Ltd., Theonex Q51, thickness 25 μm) was used. Moreover, the heat-resistant adhesive tape was produced using this film. The adhesive was applied on any one side. The glass transition temperature of the PEN film used was 140 ° C., and the crystalline melting point was 260 ° C.
<単層フィルムの評価>
 各実施例及び各比較例で作製したフィルムについて下記に示す評価を行った。これらの結果をそれぞれ表1および表2にまとめて示す。
<Evaluation of single layer film>
The following evaluation was performed about the film produced by each Example and each comparative example. These results are summarized in Table 1 and Table 2 respectively.
(表面粗さ)
 算術平均表面粗さは、JIS B0601に準じて算出した。具体的には単層フィルムのシリコーンゴム製圧着ロール、又は金属製凹凸ロールに触れたそれぞれの面の算術平均表面粗さRaを、接触式表面粗さ計(ミツトヨ製のサーフテストSJ-210)を用い、2mmのスキャン幅で単層フィルムの幅方向5点を測定し、その平均値を算出した。
(Surface roughness)
Arithmetic mean surface roughness was calculated according to JIS B0601. Specifically, the arithmetic mean surface roughness Ra of each surface of a single layer film made of silicone rubber pressure contact roll or metal uneven roll is measured by using a contact surface roughness tester (Surftest SJ-210 manufactured by Mitutoyo) Using the above, 5 points in the width direction of the single layer film were measured with a scan width of 2 mm, and the average value was calculated.
(厚み)
 厚みは、市販のミツトヨ製の標準形ダイアルゲージ(547-401型)を使用し測定した。具体的には、フィルム長手方向において100mm間隔で300mm測定し、フィルム幅方向において10mm間隔で測定し、それらの平均値を求め、その平均値をフィルムの厚さとした。
(Thickness)
The thickness was measured using a commercially available Mitutoyo standard dial gauge (type 547-401). Specifically, 300 mm was measured at intervals of 100 mm in the film longitudinal direction, measured at intervals of 10 mm in the film width direction, their average value was determined, and the average value was taken as the thickness of the film.
(熱収縮率)
 熱収縮率は、JIS C2151に準拠して測定した。具体的には試験片(長軸150mm×短軸20mm)をMD方向およびTD方向それぞれに対して切り出し、試験片の長軸方向の中央部を中心にして間隔100mmの標線を付けた。この試験片を無荷重の状態で雰囲気温度200℃、または250℃で60分間暴露し、室温まで冷却した後で、標線間の長さを測定し、下記の計算式より算出した。熱収縮率の値は正の値が収縮を意味し、負の値が膨張を意味する。なお、MDとはフィルムの長さ(押出し)方向を示し、TDとはフィルムの幅方向を示す。
 熱収縮率(%)=(試験前の長さー試験後の長さ)/(試験前の長さ)×100
(Thermal shrinkage rate)
The thermal contraction rate was measured in accordance with JIS C2151. Specifically, a test piece (long axis 150 mm × short axis 20 mm) was cut out in each of the MD direction and the TD direction, and marked lines with a distance of 100 mm were attached centering on the central part in the long axis direction of the test piece. The test piece was exposed to no load in an atmosphere temperature of 200 ° C. or 250 ° C. for 60 minutes, cooled to room temperature, and then the length between the marked lines was measured and calculated from the following formula. As for the value of thermal contraction rate, a positive value means contraction, and a negative value means expansion. MD indicates the length (extrusion) direction of the film, and TD indicates the width direction of the film.
Thermal shrinkage (%) = (length before test-length after test) / (length before test) x 100
(UV透過率)
 UV透過率は、JIS K0115に準拠して測定した。具体的には市販の分光光度計(島津製作所製UV-2600)を使用し、400nm波長でのUV透過率を測定した。UV透過率が80%以上であれば、例えば、単層フィルムに粘着層を積層後、単層フィルム面側から紫外線を照射して粘着剤を硬化させるプロセスにおいて、好適である。
(UV transmittance)
The UV transmittance was measured in accordance with JIS K0115. Specifically, the UV transmittance at a wavelength of 400 nm was measured using a commercially available spectrophotometer (UV-2600 manufactured by Shimadzu Corporation). If the UV transmittance is 80% or more, for example, after laminating the adhesive layer on the single layer film, it is suitable in the process of irradiating the ultraviolet ray from the single layer film side to cure the adhesive.
(巻取シワ)
 実施例1~17、比較例1~3のフィルムを巻取機で100m巻取った後に全幅を確認し、外観上、巻取シワが確認されたものを「有」、確認されないものを「なし」とした。
(Winding wrinkles)
After the films of Examples 1 to 17 and Comparative Examples 1 to 3 are wound by 100 m with a winder, the full width is confirmed, and those with appearance wrinkles confirmed as "OK", those not confirmed are "None"".
(加熱重量減少率)
 加熱重量減少率は、JIS K7102に準拠して、(BRUKER社製TG-DTA 2000SA)を用いた熱重量測定により、窒素雰囲気下で、昇温速度10℃/minで250℃まで昇温し、更に250℃環境を30分間維持した時に得られるTG曲線から重量減少率を求めた。
(Heating weight reduction rate)
The heating weight reduction rate is raised to 250 ° C. at a heating rate of 10 ° C./min under a nitrogen atmosphere by thermogravimetric measurement using (BRUKER TG-DTA 2000SA) according to JIS K7102. Furthermore, the weight loss rate was determined from the TG curve obtained when maintaining the environment at 250 ° C. for 30 minutes.
<耐熱粘着テープの評価>
 各実施例及び各比較例で作製した耐熱粘着テープについて下記に示す評価を行った。これらの結果をそれぞれ表1および表2にまとめて示す。
<Evaluation of heat-resistant adhesive tape>
The following evaluation was performed about the heat-resistant adhesive tape produced by each Example and each comparative example. These results are summarized in Table 1 and Table 2 respectively.
(初期粘着力)
 上記で得られた耐熱粘着テープを幅10mmにスリットした後、保護フィルムであるポリエステルフィルムを剥がし、露出した粘着層側の面を被着体であるアルミ板(100mm角、厚み0.5mm、算術平均表面粗さRa=1.0μm)に2kgのローラーで1往復し圧着した。圧着したサンプルを23℃で30分間放置した後、JIS Z0237:2000に準拠して、剥離角度180°、剥離速度300mm/min、剥離距離50mmの条件で初期粘着力を測定した。尚、測定には万能材料試験機(インストロン・ジャパン製)を用いた。
(Initial adhesion)
The heat-resistant adhesive tape obtained above is slit to a width of 10 mm, and then the protective film, the polyester film, is peeled off, and the exposed surface of the adhesive layer is an adherend aluminum plate (100 mm square, 0.5 mm thick, arithmetic) The roller was crimped once with a 2 kg roller to an average surface roughness Ra = 1.0 μm). The pressure-bonded sample was left at 23 ° C. for 30 minutes, and then the initial tack was measured under the conditions of peeling angle 180 °, peeling speed 300 mm / min, and peeling distance 50 mm according to JIS Z0237: 2000. In addition, the universal material testing machine (made by Instron Japan) was used for the measurement.
 尚、初期粘着力の評価基準は次の通りである。
優 : 1.0N~6.0N/20mm
良 : 0.4N~1.0N/20mm未満、6.0Nより大きく~10.0N/20mm
不良: 0.4N/20mm未満、10.0N/20mmよりも大きい
In addition, the evaluation criteria of initial stage adhesive force are as follows.
Excellent: 1.0N to 6.0N / 20mm
Good: 0.4 N to less than 1.0 N / 20 mm, greater than 6.0 N to 10.0 N / 20 mm
Defect: less than 0.4 N / 20 mm, greater than 10.0 N / 20 mm
(真空スパッタ後のテープの浮きの有無確認)
 上記で得られた耐熱粘着テープを幅10mmにスリットし、アルミ板(100mm角、厚み0.5mm、算術平均表面粗さRa=1.0μm)に2kgのローラーで1往復圧着した。圧着したサンプルを23℃で30分間放置した後、真空スパッタ装置(シンクロン社製)で、真空度10-3~10-4Paの条件下、60分間真空スパッタ処理を行い、
SiO/SiN交互膜を総厚0.5μmで積層した。その間、サンプルの温度は最高200~250℃に達していたと推定される。その直後での耐熱粘着テープの浮き(耐熱粘着テープの一部剥がれ)を目視で観察し、以下の基準で評価した。
優 : 耐熱粘着テープの浮きの箇所がないもの
良 : 耐熱粘着テープの浮きの箇所が、1~9個のもの
不良: 耐熱粘着テープの浮きの箇所が10個以上のもの
評価基準として、「良」の評価以上で合格とした。
(Confirmation of tape floating after vacuum sputtering)
The heat-resistant adhesive tape obtained above was slit into a width of 10 mm and crimped once to a aluminum plate (100 mm square, thickness 0.5 mm, arithmetic average surface roughness Ra = 1.0 μm) with a 2 kg roller. The crimped sample is allowed to stand at 23 ° C. for 30 minutes, and then vacuum sputtering is performed for 60 minutes in a vacuum degree of 10 -3 to 10 -4 Pa using a vacuum sputtering apparatus (manufactured by Syncron Co., Ltd.)
An SiO 2 / SiN alternate film was laminated at a total thickness of 0.5 μm. Meanwhile, it is estimated that the temperature of the sample reached up to 200-250.degree. Immediately after that, the floating of the heat-resistant adhesive tape (partial peeling of the heat-resistant adhesive tape) was visually observed, and evaluated according to the following criteria.
Excellent: The heat-resistant adhesive tape does not have a floating part: The heat-resistant adhesive tape has 1 to 9 floating parts: The heat-resistant adhesive tape has a floating part of 10 or more It was judged as "passing" above the evaluation.
(真空スパッタ後の糊残りの有無確認)
 上記により耐熱粘着テープの浮き有無を確認後、室温で1時間放置した後に万能材料試験機(インストロン・ジャパン社製)で、剥離角度180°、剥離速度300mm/min、剥離距離50mmの条件で耐熱粘着テープを剥がし、アルミ板の10mm×40mmの範囲をマイクロスコープで倍率100倍で観察し、以下の基準で評価した。尚、加熱後にアルミ板からテープが剥がれていたものは、測定不可と表記した。
優 : 糊残りの箇所がないもの
良 : 糊残りの箇所が、1~9個のもの
不良: 糊残りの箇所が10個以上
評価基準として、「良」の評価以上で合格とした。
(Confirmation of adhesive residue after vacuum sputtering)
After checking the heat-resistant adhesive tape for floating or not, leave it at room temperature for 1 hour and then use a universal testing machine (Instron Japan) to peel at a peel angle of 180 °, peel speed of 300 mm / min, peel distance of 50 mm. The heat-resistant adhesive tape was peeled off, and the range of 10 mm × 40 mm of the aluminum plate was observed with a microscope at a magnification of 100 times and evaluated according to the following criteria. In addition, what the tape had peeled from the aluminum plate after heating was described as measurement impossible.
Excellent: No adhesive residue is good: 1 to 9 adhesive residue defects: 10 or more adhesive residue spots The evaluation criteria were “good” or better.

 
Figure JPOXMLDOC01-appb-T000004

 
Figure JPOXMLDOC01-appb-T000004
Figure JPOXMLDOC01-appb-T000005
Figure JPOXMLDOC01-appb-T000005
 実施例1~17で得られた単層フィルムは、巻取り時のシワの発生がなく成形性(フィルム成膜性)に優れており、熱収縮率、加熱重量減少率が小さく、耐熱単層フィルムとして好適に使用できる。さらに、UV透過率が良好であるので、耐熱単層フィルムとして、又は粘着層を有する耐熱粘着テープ基材として、好適に使用できる。また、実施例2、3、4、6、7に示されるように、単層フィルムの被着体粘着面の反対側の面(単層フィルムの表面側の面)の表面粗さを大きくすることで、スパッタ処理後の剥がれや、糊残りが少なく、耐熱粘着テープとしてより好適に使用できる。さらに実施例8~13の、サルホン系樹脂(PES、PPSU)と、ガラス転移点が245℃以上の、耐熱ポリアリレート又は熱可塑性ポリイミドとを含む樹脂組成物の単層フィルム、及び実施例15~17の、ガラス転移点が245℃以上の樹脂のみを用いた単層フィルムにおいては、250℃での熱収縮率に優れる。実施例8~13、15~17に示されるように、これらの単層フィルムを用いた耐熱粘着テープは、スパッタ処理後の浮き(剥がれ)や、糊残りが少なく、耐熱粘着テープとしてより好適に使用できる。 The single layer films obtained in Examples 1 to 17 have no generation of wrinkles at the time of winding, are excellent in formability (film film formability), have a small thermal contraction rate and a small decrease in heating weight, and are heat resistant single layer It can be suitably used as a film. Furthermore, since the UV transmittance is good, it can be suitably used as a heat-resistant monolayer film or as a heat-resistant adhesive tape substrate having an adhesive layer. In addition, as shown in Examples 2, 3, 4, 6, and 7, the surface roughness of the surface (surface on the surface side of the single layer film) opposite to the adherend adhesive surface of the single layer film is increased. Thus, it is possible to use the heat-resistant adhesive tape more suitably with little peeling after the sputtering treatment and no adhesive residue. Furthermore, a single-layer film of a resin composition containing a sulfone resin (PES, PPSU) and a heat-resistant polyarylate or thermoplastic polyimide having a glass transition temperature of 245 ° C. or more, and Examples 15 to In the case of a single layer film using only a resin having a glass transition temperature of 245 ° C. or higher, the heat shrinkage rate at 250 ° C. is excellent. As shown in Examples 8 to 13 and 15 to 17, the heat-resistant pressure-sensitive adhesive tapes using these single-layer films are less likely to float or peel after sputtering, and are more preferable as heat-resistant pressure-sensitive tapes. It can be used.
1 耐熱粘着テープの層構成を示す例
2 粘着層
3 単層フィルム層(単層フィルム)
 

 
1 Example showing the layer configuration of heat resistant adhesive tape 2 adhesive layer 3 single layer film layer (single layer film)


Claims (17)

  1.  ガラス転移温度が210℃以上の熱可塑性樹脂を用いて形成された単層フィルムであって、少なくとも一方の表面の算術平均表面粗さRaが0.10μmより大きく10μm未満である、単層フィルム。 A monolayer film formed using a thermoplastic resin having a glass transition temperature of 210 ° C. or higher, wherein the arithmetic average surface roughness Ra of at least one surface is larger than 0.10 μm and smaller than 10 μm.
  2.  前記熱可塑性樹脂が、ポリエーテルイミド、ポリエーテルサルホン、ポリフェニルサルホン、熱可塑性ポリイミド、及び耐熱ポリアリレートからなる群から選ばれる1以上を含む、請求項1に記載の単層フィルム。 The monolayer film according to claim 1, wherein the thermoplastic resin comprises one or more selected from the group consisting of polyetherimide, polyethersulfone, polyphenylsulfone, thermoplastic polyimide, and heat-resistant polyarylate.
  3.  前記熱可塑性樹脂が、ガラス転移温度が245℃以上の熱可塑性樹脂を15質量%以上含む、請求項1または2に記載の単層フィルム。 The monolayer film according to claim 1, wherein the thermoplastic resin contains 15% by mass or more of a thermoplastic resin having a glass transition temperature of 245 ° C. or higher.
  4.  前記熱可塑性樹脂が、熱安定剤、紫外線吸収剤、帯電防止剤、滑剤、染料、顔料、及び無機フィラーからなる群から選ばれる1以上の添加剤を含む、請求項1から3のいずれか一項に記載の単層フィルム。 The thermoplastic resin according to any one of claims 1 to 3, wherein the thermoplastic resin comprises one or more additives selected from the group consisting of a heat stabilizer, an ultraviolet light absorber, an antistatic agent, a lubricant, a dye, a pigment and an inorganic filler. The single layer film as described in a term.
  5.  250℃の環境下に1時間暴露した後の熱収縮率が15%以下である、請求項1から4のいずれか一項に記載の単層フィルム。 The monolayer film according to any one of claims 1 to 4, having a thermal shrinkage of 15% or less after exposure to an environment at 250 ° C for 1 hour.
  6.  250℃の環境下に1時間暴露した後の熱収縮率が5%以下である、請求項3または4に記載の単層フィルム。 The monolayer film according to claim 3 or 4, which has a thermal shrinkage of 5% or less after exposure to an environment at 250 ° C for 1 hour.
  7.  250℃の環境下に1時間暴露した後の加熱重量減少率が5%以下である、請求項1から6のいずれか一項に記載の単層フィルム。 The monolayer film according to any one of claims 1 to 6, wherein the heating weight loss after exposure to an environment at 250 ° C for 1 hour is 5% or less.
  8.  UV透過率が80%以上である、請求項1から7のいずれか一項に記載の単層フィルム。 The monolayer film according to any one of claims 1 to 7, wherein the UV transmittance is 80% or more.
  9.  フィルムコンデンサ用、スピーカー振動板用、回路基板用、ヒーター絶縁材用、ガラス保護用、真空圧空成形用保護フィルム用、インサート成形用保護フィルム用、インモールド成形用保護フィルム用、家電製品部材用、または自動車部品部材用のフィルムである、請求項1から8のいずれか一項に記載の単層フィルム。 For film capacitors, for speaker diaphragms, for circuit boards, for heater insulation, for glass protection, for protective films for vacuum pressure forming, for protective films for insert molding, for protective films for in-mold molding, for household electric appliance members The single-layer film according to any one of claims 1 to 8, which is a film for an automobile part member or.
  10.  請求項1から9のいずれか一項に記載の単層フィルムの少なくとも一方の表面にアクリル系またはシリコーン系の粘着層が積層された、耐熱粘着テープ。 The heat-resistant adhesive tape in which the acryl type or silicone type adhesive layer was laminated | stacked on the surface of the at least one side of the single layer film as described in any one of Claims 1-9.
  11.  前記耐熱粘着テープを構成する単層フィルムの厚みが、5μm以上100μm以下であり、粘着層の厚みが、5μm以上70μm以下である、請求項10に記載の耐熱粘着テープ。 The heat-resistant adhesive tape according to claim 10, wherein the thickness of the single layer film constituting the heat-resistant adhesive tape is 5 μm to 100 μm, and the thickness of the adhesive layer is 5 μm to 70 μm.
  12.  単層フィルムの一方の表面に前記粘着層が積層され、単層フィルムの、該粘着層が積層されている面と反対側の面の算術平均表面粗さRaが0.10μmより大きく10μm未満である、請求項10または11に記載の耐熱粘着テープ。 The pressure-sensitive adhesive layer is laminated on one surface of a single-layer film, and the arithmetic average surface roughness Ra of the surface of the single-layer film opposite to the surface on which the pressure-sensitive adhesive layer is laminated is greater than 0.10 μm and less than 10 μm. The heat-resistant adhesive tape according to claim 10 or 11.
  13.  マスキングテープ用である、請求項10から12のいずれか一項に記載の耐熱粘着テープ。 The heat-resistant adhesive tape according to any one of claims 10 to 12, which is for masking tape.
  14.  真空蒸着工程用、または真空スパッタ工程用テープである、請求項13に記載の耐熱粘着テープ。 The heat-resistant adhesive tape according to claim 13, which is a tape for a vacuum deposition process or a vacuum sputtering process.
  15.  ガラス転移温度が210℃以上の熱可塑性樹脂を含む単層フィルムと、該単層フィルムの一方の表面上に形成された粘着層とを有し、単層フィルムの、粘着層が形成された面の反対側の面に凹凸構造を有する、耐熱粘着テープ。 A surface of the monolayer film on which the adhesive layer is formed, having a monolayer film containing a thermoplastic resin having a glass transition temperature of 210 ° C. or higher, and an adhesive layer formed on one surface of the monolayer film. Heat-resistant adhesive tape with a concavo-convex structure on the opposite side of.
  16.  粘着層を介して被着体に貼付された、請求項12または15に記載の耐熱粘着テープ。 The heat-resistant adhesive tape according to claim 12 or 15, which is attached to an adherend via an adhesive layer.
  17.  請求項1から9のいずれか一項に記載の単層フィルムの製造方法であって、
     ガラス転移温度が210℃以上の熱可塑性樹脂を、押出成形法によってTダイスから300℃以上400℃以下で溶融押出しし、表面温度が110℃以上230℃以下の凹凸ロールと圧着ロールとに挟持させて成型することを特徴とする、製造方法。
     

     
    A method for producing a monolayer film according to any one of claims 1 to 9,
    A thermoplastic resin with a glass transition temperature of 210 ° C. or more is melt extruded from a T die at 300 ° C. or more and 400 ° C. or less by an extrusion molding method, and a surface temperature of 110 ° C. or more and 230 ° C. or less Manufacturing method characterized by molding.


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