WO2019071682A1 - 一种液晶显示面板中的间隙子的制备方法及液晶显示面板 - Google Patents

一种液晶显示面板中的间隙子的制备方法及液晶显示面板 Download PDF

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Publication number
WO2019071682A1
WO2019071682A1 PCT/CN2017/109706 CN2017109706W WO2019071682A1 WO 2019071682 A1 WO2019071682 A1 WO 2019071682A1 CN 2017109706 W CN2017109706 W CN 2017109706W WO 2019071682 A1 WO2019071682 A1 WO 2019071682A1
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Prior art keywords
spacer
liner
color resist
layer
liquid crystal
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Ceased
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PCT/CN2017/109706
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English (en)
French (fr)
Inventor
曹武
柳铭岗
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Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd
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Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd
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Priority to US15/742,101 priority Critical patent/US20190113787A1/en
Publication of WO2019071682A1 publication Critical patent/WO2019071682A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13396—Spacers having different sizes

Definitions

  • the present invention relates to the field of display technologies, and in particular, to a method for preparing a spacer in a liquid crystal display panel and a liquid crystal display panel.
  • BPS Black Photo Spacer
  • BCS Black Colum Spacer
  • BM Black Matrix, BM
  • BPS material the black black shading material
  • the black spacer layer includes a black matrix and a spacer substructure, wherein
  • the supporting spacers generally have two different height values; the higher height is the main spacer (Main PS), which is mainly used to define the box thickness; the shorter one is the auxiliary spacer (Sub PS) for improving The support of the liquid crystal display panel when pressed by an external force; the black matrix at the lowest position mainly plays a role of shading.
  • the BPS material can be roughly divided into 3Tone, 2Tone, and 1Tone according to the number of transmittance regions of the exposure mask used.
  • Tone technology there are several other transmittance areas, which are called Tone technology; the conventional Full Tone Mask (FTM) means The transmittance is only 100% of the ordinary mask.
  • FTM Full Tone Mask
  • 3Tone is a mask containing three different transmittance regions. For example, the transmittances of three different transmittance regions are: 100%, 30%, and 20%; 2Tone includes two different transmissions.
  • the transmittance of the mask in the rate region for example, two different transmittance regions are: 100% and 20%, respectively.
  • 3Tone technology refers to the use of a special mask containing three different transmittances (100% transmittance) to expose and develop the BPS material layer on the underlying substrate to form on the BPS material layer.
  • the three height sections are different; 2Tone technology means that a layer of liner (generally a filter layer) is placed under the main gap, and the main gap is supported by the spacer, and a mask containing two different transmittance regions is used.
  • the plate exposes and develops the BPS material layer on the underlying substrate to form three height step differences.
  • the height of the main spacer is the thickness of the single layer liner plus the thickness of the BPS material layer, and the height of the auxiliary spacer and the black matrix are both BPS. The thickness of the material layer.
  • 1Tone technology means that two layers of liners are placed under the main gap (usually a stack of filter layers composed of two layers of color resists), and a layer of liner is placed under the auxiliary gaps, which is below the main gap.
  • the two layers of liners form the original step difference, and finally the BPS material layer on the lower substrate is exposed and developed using a completely transparent mask having a transmittance of only 100%, thereby obtaining three height step differences; among them, the main spacers
  • the height is the thickness of the two-layer liner plus the thickness of the BPS material layer;
  • the height of the auxiliary spacer is the thickness of the single-layer liner plus the thickness of the BPS material layer; and the height of the black matrix is the thickness of the BPS material layer.
  • the spacer is prepared by the above technical solution, the following disadvantages are obtained: in the 1Tone technology, the color resistance of the double layer is stacked under the main gap, and only one color resist is stacked under the auxiliary gap, and the double color resistance is stacked and increased. The difficulty of alignment between the two layers of color resistance. In the 2Tone technology and the 3Tone technology, different amounts of light corresponding to different regions of the BPS material layer are different, and a BPS material with high sensitivity is required, and a BPS material with high sensitivity increases the preparation cost of the spacer and the liquid crystal display panel.
  • the present invention provides a method for preparing a spacer in a liquid crystal display panel and a liquid crystal display panel, which can reduce the sensitivity requirement of a material for preparing a black spacer layer, and can also reduce the difficulty of color resistance alignment. Thereby reducing the cost of the spacers and the liquid crystal display panel.
  • the invention provides a method for preparing a spacer in a liquid crystal display panel, comprising the following steps:
  • first liner and a second liner Forming a first liner and a second liner on the array substrate, the first liner being higher than the second liner, and the first liner and the second liner are both single-layer liners ;
  • forming the first liner and the second liner on the array substrate comprises the steps of:
  • the color resist layer contains different color resistive regions, and the height difference between the color resist regions of different heights satisfies the set height difference, the color resist layer is exposed and developed by using a common mask. Obtaining the first liner and the second liner;
  • the height difference between the color resist regions of different heights does not satisfy the set height.
  • the color resist layer is exposed and developed by using one of a gray mask, a semi-transmissive mask, and a slit mask, and the first mask is obtained. And the second liner.
  • the height difference between the main gap and the auxiliary gap is in the range of 0.2 to 0.8 microns.
  • the height difference between the main gap and the auxiliary gap is ⁇ H2
  • the height difference between the first pad and the second pad is ⁇ H1
  • the ratio of ⁇ H2 to ⁇ H1 is 40% to 70%.
  • the black spacer layer is patterned, specifically:
  • the black spacer layer is subjected to exposure development processing using a common mask.
  • the color resist layer is broken at a gate line region of the array substrate.
  • the invention also provides a method for preparing a spacer in a liquid crystal display panel, comprising the following steps:
  • first liner and a second liner Forming a first liner and a second liner on the array substrate, the first liner being higher than the second liner, and the first liner and the second liner are both single-layer liners ;
  • Forming the first liner and the second liner on the array substrate comprising the steps of:
  • the color resist layer contains different color resistive regions, and the height difference between the color resist regions of different heights satisfies the set height difference, the color resist layer is exposed and developed by using a common mask. Obtaining the first liner and the second liner;
  • the height difference between the color resist regions of different heights does not satisfy the set height.
  • the color resist layer is exposed and developed by using one of a gray mask, a semi-transmissive mask, and a slit mask, and the first mask is obtained.
  • the second liner
  • the height difference between the main gap and the auxiliary gap is in the range of 0.2 to 0.8 microns.
  • the height difference between the main gap and the auxiliary gap is ⁇ H2
  • the height difference between the first pad and the second pad is ⁇ H1
  • the ratio of ⁇ H2 to ⁇ H1 is 40% to 70%.
  • the black spacer layer is patterned, specifically:
  • the black spacer layer is subjected to exposure development processing using a common mask.
  • the color resist layer is broken at a gate line region of the array substrate.
  • the present invention also provides a liquid crystal display panel, comprising: an array substrate, an upper substrate above the array substrate, and a liquid crystal layer sandwiched between the upper substrate and the array substrate, the array substrate including a substrate, and an array circuit disposed on the lower substrate;
  • the first pad is higher than the second pad, and the first pad and the second pad are each a single layer pad;
  • a black spacer layer is disposed on the array substrate, the black spacer layer includes a main spacer having a height difference, an auxiliary spacer, and a black matrix, wherein the main spacer is located above the first pad The auxiliary gap is located above the second pad, and the main gap is higher than the auxiliary gap.
  • the first pad and the second pad are made of a color resist material
  • the height difference between the main gap and the auxiliary gap is in the range of 0.2 to 0.8 microns. .
  • the height difference between the main gap and the auxiliary gap is ⁇ H2
  • the height difference between the first pad and the second pad is ⁇ H1
  • the ratio of ⁇ H2 to ⁇ H1 is 40% to 70%.
  • the method further includes an upper polarizer and a lower polarizer, the upper polarizer is located above the upper substrate, and the lower polarizer is located below the lower substrate.
  • the height difference between the main gap and the auxiliary gap of the present invention is mainly formed based on the height difference between the first pad and the second pad, and does not need to adopt 3Tone technology.
  • 2Tone technology forms a height difference on the black spacer layer itself, so the sensitivity requirement of the BSP material for preparing the black spacer layer can be reduced, and the spacer of the black spacer layer, the preparation cost of the liquid crystal display panel, and the preparation difficulty can be reduced, compared to 1Tone.
  • FIG. 1 is a flow chart showing a method of preparing a spacer in a liquid crystal display panel provided by the present invention.
  • FIG. 2 is a schematic structural view of a spacer provided by the present invention.
  • FIG 3 is a schematic view showing the structure of forming a color resist layer on the array substrate provided by the present invention.
  • FIG. 4 is a schematic structural view of a first liner and a second liner obtained by exposing and developing the color group layer of FIG. 3 according to the present invention.
  • Figure 5 is a top plan view of exposure of a color set layer in another implementation provided by the present invention.
  • FIG. 6 is a schematic diagram of the color group layer provided by the present invention being broken in the gate line region of the array substrate.
  • FIG. 7 is a schematic structural view of a liquid crystal display panel provided by the present invention.
  • the invention provides a method for preparing a gap in a liquid crystal display panel, as shown in FIG. 1 and FIG. 2 .
  • the preparation method comprises the following steps:
  • first pad 21 and a second pad 22 Forming a first pad 21 and a second pad 22 on the array substrate 1, the first pad 21 is higher than the second pad 22, and the first pad 21 and the second pad 22 are both single-layer pads;
  • the black spacer layer 3 is patterned to obtain a main spacer 31 having a height difference, an auxiliary spacer 32 and a black matrix 33, wherein the main spacer 31 is located above the first spacer 21, and the auxiliary spacer 32 is located at the second spacer 22. Above, and the main gap 31 is higher than the auxiliary gap 32.
  • the material of the black spacer layer 3 is selected as a BPS material, which can be used as a black shading material, and can also be used as a black gap control material.
  • the height difference between the main spacer 31 and the auxiliary spacer 32 is mainly formed based on the height difference between the first spacer 21 and the second spacer 22.
  • the 3Tone technology or the 2Tone technology does not need to form a height difference between the black spacer layer 3 itself, so the sensitivity of the BSP material for preparing the black spacer layer 3 is not very high, so the preparation of the spacer of the black spacer layer 3 can be reduced.
  • the cost and preparation difficulty increase the efficiency of preparing the spacer.
  • first pad 21 and the second pad 22 disposed on the array substrate 1 are each a single-layer pad.
  • first pad 21 and the second pad 22 are prepared, only one layer needs to be prepared. The difficulty of alignment of the color resistance is reduced, and the efficiency of preparing the spacer is improved.
  • first pad 21 and the second pad 22 on the array substrate 1 includes the following steps:
  • a color resist layer 2 is formed on the array substrate 1;
  • the color layer material is an organic material;
  • the color resist layer 2 contains color resisting regions of different heights, and the height difference between the color resisting regions of different heights satisfies the set height step difference, the color resist layer 2 is exposed and developed by using a common mask, such as As shown in FIG. 4, the first pad 21 and the second pad 22 are obtained; it should be noted that the color resist materials of the first pad 21 and the second pad 22 may be the same or different;
  • the height difference between the color resist regions of different heights does not satisfy the set height difference value.
  • a gray mask, a semi-transparent mask, and a slit mask The color resist layer 2 is exposed and developed through a mask to obtain a first liner 21 and a second liner 22. Grayscale masks, semi-transparent masks, and slit masks reduce the amount of light transmitted.
  • the mask generally comprises a light transmitting region and a light blocking region, wherein the light transmitting region of the common mask is a light transmitting region that is completely transparent (ie, the transmittance is 100%).
  • the light transmissive area of the slit mask ie, the Slit mask
  • the slit mask comprises a plurality of light transmissive areas, and the light transmissive area and the shading area are spaced apart from each other.
  • the width of the transparent region of the slit mask is smaller than the width of the transparent region of the conventional mask. Generally, the width of the transparent region of the slit mask is less than 5 micrometers, more preferably 3 micrometers.
  • the width of the light-transmissive region of the conventional mask is larger than 5 ⁇ m. Therefore, by using the slit mask to expose the color resist, the amount of light received by the color resist can be reduced.
  • the color resist layer 2 formed on the array substrate 1 includes a red color resist, a green color resist, and a blue color resist.
  • the height between the three is not necessarily the same.
  • the height of the red color resist may be the highest, and the blue color may be The height of the resistance is the lowest. If the height difference between the red color resistance and the blue color resistance satisfies the set height difference, the color resist layer 2 is directly exposed and developed (that is, patterned) by using a common mask. Specifically, the red color resist, the green color resist, and the blue color resist are subjected to exposure and development processing using a common mask.
  • a black spacer layer 3 is formed on the color resist layer 2 which is subjected to the patterning process, and the main spacer 31 having the height difference, the auxiliary spacer 32 and the black matrix 33, and the main spacer 31 having the height difference can be naturally formed.
  • Auxiliary spacer 32, and the height difference between the main spacer 31 and the auxiliary spacer 32 is also satisfactory; since the ordinary mask is opposite to other gray masks, semi-transparent masks, and slit masks
  • the board is easier to prepare, and here, the color resist layer 2 is exposed and developed using only a conventional mask, making it easier to prepare the first liner 21 and the second liner 22.
  • the gray mask, the semi-transparent mask, and One of the slit masks, and a common mask exposes the color resist layer 2 to exposure and development.
  • one or more blue color resists on the color layer 2 are exposed and developed by using a common mask, and the gray color resist, the green color resist, and other blue color resists are exposed and developed by using a gray mask. Processing, by exposing the color resistance by one of a gray mask, a semi-transparent mask, and a slit mask, the amount of light received by the color resist can be reduced.
  • the color resist layer 2 includes a first color resist strip 201, The second color resist strip 202, the third color resist strip 203, and the fourth color resist strip 204, wherein the first color resist strip 201 and the fourth color resist strip 204 are both blue color resist, the second color resist strip 202 and the first
  • the three color strips 203 are respectively a red color resist and a green color resist, and a mask 8 is disposed on the color layer 2 for masking.
  • the mask 8 includes a common mask 801 and three slit masks 802 and 803.
  • the common mask 801 is located above the first color strip 201, and the three slit masks 802, 803, 804 are respectively located in the second color strip 202, the third color strip 203, and the fourth color strip. Above 204.
  • the amount of light received by the second color strip 202, the third color strip 203, and the fourth color strip 204 is smaller than the amount of light received by the first color strip 201, and after the color layer 2 is developed,
  • the one color bar 201 is higher than the second color strip 202, the third color strip 203, and the fourth color strip 204, thereby forming a height difference on the color resist layer 2.
  • the surface of the color resist is rough, and after the surface of the array substrate 1 is leveled by the BPS material, the topography and roughness of the surface of the array substrate 1 can be optimized.
  • a three-step gap substructure can be obtained.
  • the height difference between the main gap 31 and the auxiliary gap 32 ranges from 0.2 to 0.8 micrometers.
  • the height difference between the main gap 31 and the auxiliary gap 32 is ⁇ H2
  • the height difference between the first pad 21 and the second pad 22 is ⁇ H1
  • the ratio of ⁇ H2 to ⁇ H1 ranges from 40% to 70. %, that is, the range of ⁇ H2 / ⁇ H1 is 40% to 70%.
  • patterned black spacer layer 3 is specifically:
  • the black spacer layer 3 is subjected to exposure development processing using a conventional mask.
  • the color resist layer 2 is broken at the gate line region 121 of the array substrate 1.
  • the present invention further provides a liquid crystal display panel.
  • the liquid crystal display panel includes: an array substrate 1, an upper substrate 4 above the array substrate 1, and a sandwich between the upper substrate 4 and the array substrate 1.
  • the liquid crystal layer 5, the array substrate 1 includes a lower substrate 11, and an array circuit 12 disposed on the lower substrate 11.
  • a first pad 21 and a second pad 22 are disposed on the array substrate 1, the first pad 21 is higher than the second pad 22, and the first pad 21 is higher than the second pad 22 as a single layer pad .
  • a black spacer layer 3 is disposed on the array substrate 1, and the black spacer layer 3 includes a height difference The main gap 31, the auxiliary gap 32 and the black matrix 33, wherein the main spacer 31 is located above the first pad 21, the auxiliary spacer 32 is located above the second pad 22, and the main gap 31 is higher than the auxiliary gap Sub 32.
  • first pad and the second pad are made of a color resist material; the height difference between the main spacer 31 and the auxiliary spacer 32 ranges from 0.2 to 0.8 ⁇ m.
  • the height difference between the main gap 31 and the auxiliary gap 32 is ⁇ H2
  • the height difference between the first pad 21 and the second pad 22 is ⁇ H1
  • the ratio of ⁇ H2 to ⁇ H1 ranges from 40% to 70%.
  • the liquid crystal display panel further includes an upper polarizer 6 and a lower polarizer, the upper polarizer 6 is located above the upper substrate 4, and the lower polarizer is located below the lower substrate 11.
  • the present invention can reduce the manufacturing cost and preparation difficulty of the spacers and the liquid crystal display panel in the liquid crystal display panel compared with the 3Tone technology and the 2Tone technology, and can reduce the color resistance compared to the 1Tone technology. Align the difficulty.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
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Abstract

一种液晶显示面板中的间隙子的制备方法及液晶显示面板，方法包括下述步骤：在阵列基板（1）上形成第一衬垫（21）和第二衬垫（22），第一衬垫（21）高于第二衬垫（22），且第一衬垫（21）和第二衬垫（22）均为单层衬垫；在阵列基板（1）上形成黑色间隔层（3），且黑色间隔层（3）覆盖第一衬垫（21）和第二衬垫（22）；图形化黑色间隔层（3），得到具有高度段差的主要间隙子（31）、辅助间隙子（32）和黑色矩阵（33），其中，主要间隙子（31）位于第一衬垫（21）上方，辅助间隙子（32）位于第二衬垫（22）上方，且主要间隙子（31）高于辅助间隙子（32）。既可以降低用于制备黑色间隔层（3）的材料的感光度要求，也可以降低多层色阻衬垫的对准难度，从而降低间隙子以及液晶显示面板的制备成本。

Description

一种液晶显示面板中的间隙子的制备方法及液晶显示面板
本申请要求于2017年10月13日提交中国专利局、申请号为201710952802.6、发明名称为“一种液晶显示面板中的间隙子的制备方法及液晶显示面板”的中国专利申请的优先权，上述专利的全部内容通过引用结合在本申请中。
技术领域
本发明涉及显示技术领域，尤其涉及一种液晶显示面板中的间隙子的制备方法及液晶显示面板。
背景技术
BPS(Black Photo Spacer，黑色间隙控制材料技术)/BCS(Black Colum Spacer，黑柱间隔)技术是指在常规LCD(Liquid Crystal Display，液晶显示面板)制造中，将黑色矩阵(Black Matrix，BM)和间隙子(Photo Spacer，PS)两道制程整合为一道制程，即用同一种黑色遮光材料(也即是BPS材料)形成黑色间隔层，黑色间隔层包括黑色矩阵和间隙子结构，其中起到支撑作用的间隙子一般会有两个不同高度值；高度较高的为主要间隙子(Main PS)，其主要用于定义盒厚；较矮的为辅助间隙子(Sub PS)，用于提高液晶显示面板受外力按压时的支撑性；处于最低位的黑色矩阵则主要起到遮光的作用。
根据BPS材料的感光特性和具体结构的不同，大体可以按所用曝光掩膜板透过率区域的数量可以分为：3Tone、2Tone、1Tone。
一般掩膜板除了遮光区(透过率为0)外，有几个其他的透过率区域，则称为几Tone技术；常规的完全透光掩膜板(Full Tone Mask，FTM)是指透过率仅有100％的普通光罩。3Tone为包含有3个不同透过率区域的掩膜板，例如3个不同的透过率区域的透过率分别是：100％、30％、20％；2Tone为包含有2个不同透过率区域的掩膜板，例如2个不同的透过率区域的透过率分别是：100％、20％。
更仔细的，3Tone技术是指使用包含3种不同透过率(含透过率为100％)区域的特殊掩膜板，对下层基板上的BPS材料层进行曝光显影，在BPS材料层上形成的三个高度段差；2Tone技术是指将主要间隙子下方设置一层衬垫(一般为滤光膜层)，通过衬垫撑高主要间隙子，使用包含两种不同透过率区域的掩膜板对下层基板上的BPS材料层进行曝光显影，形成三个高度段差，最终主要间隙子的高度为单层衬垫的厚度加上BPS材料层厚度，辅助间隙子和黑色矩阵的高度均为BPS材料层的厚度。1Tone技术则是指在主要间隙子下方设置两层衬垫(一般使用两层色阻构成的滤光膜层堆叠)，而辅助间隙子下方则设置一层衬垫，其与主要间隙子下方的两层衬垫形成原始段差，最终对下层基板上的BPS材料层使用透过率仅为100％的完全透光掩膜板进行曝光显影，即可得到三种高度段差；其中，主要间隙子的高度为两层衬垫的厚度加上BPS材料层的厚度；辅助间隙子的高度为单层衬垫的厚度加上BPS材料层的厚度；而黑色矩阵的高度即为BPS材料层的厚度。
采用上述技术方案制备间隙子时，具有以下缺点：1Tone技术中，在主要间隙子下方堆叠双层的色阻，而在辅助间隙子的下方只堆叠一层色阻，堆叠双层色阻，增加了双层色阻之间的对准难度。2Tone技术和3Tone技术中，BPS材料层的不同区域所对应的受光量不一样，需要采用感光度高的BPS材料，而采用感光度高的BPS材料会增加间隙子和液晶显示面板的制备成本。
发明内容
为解决上述技术问题，本发明提供一种液晶显示面板中的间隙子的制备方法及液晶显示面板，既可以降低用于制备黑色间隔层的材料的感光度要求，也可以降低色阻对准难度，从而降低间隙子以及液晶显示面板的制备成本。
本发明提供的一种液晶显示面板中的间隙子的制备方法，包括下述步骤：
在阵列基板上形成第一衬垫和第二衬垫，所述第一衬垫高于所述第二衬垫，且所述第一衬垫和所述第二衬垫均为单层衬垫；
在所述阵列基板上形成黑色间隔层，且所述黑色间隔层覆盖所述第一衬 垫和所述第二衬垫；
图形化所述黑色间隔层，得到具有高度段差的主要间隙子、辅助间隙子和黑色矩阵，其中，所述主要间隙子位于所述第一衬垫上方，所述辅助间隙子位于所述第二衬垫上方，且所述主要间隙子高于所述辅助间隙子。
优选地，在阵列基板上形成第一衬垫和第二衬垫，包括下述步骤：
在所述阵列基板上形成色阻层；
当所述色阻层上包含有不同高度的色阻区域，且不同高度的色阻区域之间的高度段差满足设定高度段差值时，采用普通掩膜板对所述色阻层进行曝光显影，得到所述第一衬垫和所述第二衬垫；
当所述色阻层上不同色阻区域的高度均相同，或者所述色阻层上包含有不同高度的色阻区域时，且不同高度的色阻区域之间的高度段差不满足设定高度段差值时，采用灰度掩膜板、半透掩膜板以及狭缝掩膜板中的一种，以及普通掩膜板，对所述色阻层进行曝光显影，得到所述第一衬垫和所述第二衬垫。
优选地，所述主要间隙子与所述辅助间隙子之间的高度段差范围为0.2～0.8微米。
优选地，所述主要间隙子与所述辅助间隙子之间的高度段差为ΔH2，所述第一衬垫与所述第二衬垫之间的高度段差为ΔH1，ΔH2与ΔH1的比值范围为40％～70％。
优选地，图形化所述黑色间隔层，具体为：
采用普通掩膜板对所述黑色间隔层进行曝光显影处理。
优选地，所述色阻层在所述阵列基板的栅线区域断开。
本发明还提供一种液晶显示面板中的间隙子的制备方法，包括下述步骤：
在阵列基板上形成第一衬垫和第二衬垫，所述第一衬垫高于所述第二衬垫，且所述第一衬垫和所述第二衬垫均为单层衬垫；
在所述阵列基板上形成黑色间隔层，且所述黑色间隔层覆盖所述第一衬垫和所述第二衬垫；
图形化所述黑色间隔层，得到具有高度段差的主要间隙子、辅助间隙子 和黑色矩阵，其中，所述主要间隙子位于所述第一衬垫上方，所述辅助间隙子位于所述第二衬垫上方，且所述主要间隙子高于所述辅助间隙子；
在阵列基板上形成第一衬垫和第二衬垫，包括下述步骤：
在所述阵列基板上形成色阻层；
当所述色阻层上包含有不同高度的色阻区域，且不同高度的色阻区域之间的高度段差满足设定高度段差值时，采用普通掩膜板对所述色阻层进行曝光显影，得到所述第一衬垫和所述第二衬垫；
当所述色阻层上不同色阻区域的高度均相同，或者所述色阻层上包含有不同高度的色阻区域时，且不同高度的色阻区域之间的高度段差不满足设定高度段差值时，采用灰度掩膜板、半透掩膜板以及狭缝掩膜板中的一种，以及普通掩膜板，对所述色阻层进行曝光显影，得到所述第一衬垫和所述第二衬垫；
所述主要间隙子与所述辅助间隙子之间的高度段差范围为0.2～0.8微米。
优选地，所述主要间隙子与所述辅助间隙子之间的高度段差为ΔH2，所述第一衬垫与所述第二衬垫之间的高度段差为ΔH1，ΔH2与ΔH1的比值范围为40％～70％。
优选地，图形化所述黑色间隔层，具体为：
采用普通掩膜板对所述黑色间隔层进行曝光显影处理。
优选地，所述色阻层在所述阵列基板的栅线区域断开。
本发明还提供一种液晶显示面板，包括：阵列基板、位于所述阵列基板上方的上基板，以及夹持在所述上基板和所述阵列基板之间的液晶层，所述阵列基板包括下基板，以及设置在所述下基板上的阵列电路；
在所述阵列基板上设置第一衬垫和第二衬垫，所述第一衬垫高于所述第二衬垫，且所述第一衬垫和所述第二衬垫均为单层衬垫；
在所述阵列基板上设置有黑色间隔层，所述黑色间隔层包括具有高度段差的主要间隙子、辅助间隙子和黑色矩阵，其中，所述主要间隙子位于所述第一衬垫上方，所述辅助间隙子位于所述第二衬垫上方，且所述主要间隙子高于所述辅助间隙子。
优选地，所述第一衬垫和所述第二衬垫均为色阻材料制成；
所述主要间隙子与所述辅助间隙子之间的高度段差范围为0.2～0.8微米。.
优选地，所述主要间隙子与所述辅助间隙子之间的高度段差为ΔH2，所述第一衬垫与所述第二衬垫之间的高度段差为ΔH1，ΔH2与ΔH1的比值范围为40％～70％。
优选地，还包括上偏光片和下偏光片，所述上偏光片位于所述上基板的上方，所述下偏光片位于所述下基板的下方。
实施本发明，具有如下有益效果：本发明的主要间隙子与辅助间隙子之间的高度段差主要是基于第一衬垫和第二衬垫之间的高度段差而形成的，不需要采用3Tone技术或者2Tone技术对黑色间隔层自身形成高度段差，因此可以降低制备黑色间隔层的BSP材料的感光度要求，也可以降低黑色间隔层的间隙子、液晶显示面板的制备成本和制备难度，相对于1Tone技术而言，不需要制备双层色阻，可以降低色阻的对准难度，提高了制备间隙子和液晶显示面板的效率。
附图说明
为了更清楚地说明本发明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1是本发明提供的液晶显示面板中的间隙子的制备方法的流程图。
图2是本发明提供的间隙子的结构示意图。
图3是本发明提供的阵列基板上形成色阻层的结构示意图。
图4是本发明提供的将图3中的色组层进行曝光显影后得到的第一衬垫和第二衬垫的结构示意图。
图5是本发明提供的另一实施中对色组层进行曝光的俯视图。
图6是本发明提供的色组层在阵列基板的栅线区域断开的示意图。
图7是本发明提供的液晶显示面板的结构示意图。
具体实施方式
本发明提供一种液晶显示面板中的间隙子的制备方法，如图1和图2所 示，该制备方法包括下述步骤：
在阵列基板1上形成第一衬垫21和第二衬垫22，第一衬垫21高于第二衬垫22，且第一衬垫21和第二衬垫22均为单层衬垫；
在阵列基板1上形成黑色间隔层3，且黑色间隔层3覆盖第一衬垫21和第二衬垫22；
图形化黑色间隔层3，得到具有高度段差的主要间隙子31、辅助间隙子32和黑色矩阵33，其中，主要间隙子31位于第一衬垫21上方，辅助间隙子32位于第二衬垫22上方，且主要间隙子31高于辅助间隙子32。其中，黑色间隔层3的材料选择的是BPS材料，该材料可以当作黑色遮光材料，还可以当作黑色间隙控制材料。
本发明提供的液晶显示面板中的间隙子的制备方法，主要间隙子31与辅助间隙子32之间的高度段差主要是基于第一衬垫21和第二衬垫22之间的高度段差而形成的，不需要采用3Tone技术或者2Tone技术对黑色间隔层3自身形成高度段差，因此对制备黑色间隔层3的BSP材料的感光度要求不是很高，因此可以降低黑色间隔层3的间隙子的制备成本和制备难度，提高了制备间隙子的效率。
并且，在阵列基板1上设置的第一衬垫21和第二衬垫22均是单层衬垫，在制备第一衬垫21和第二衬垫22时，只需要制备一层即可，降低了色阻的对准难度，提高了制备间隙子的效率。
进一步地，在阵列基板1上形成第一衬垫21和第二衬垫22，包括下述步骤：
如图3所示，在阵列基板1上形成色阻层2；色组层材料均为有机材料；
当色阻层2上包含有不同高度的色阻区域，且不同高度的色阻区域之间的高度段差满足设定高度段差值时，采用普通掩膜板对色阻层2进行曝光显影，如图4所示，得到第一衬垫21和第二衬垫22；需要说明的是，第一衬垫21和第二衬垫22的色阻材料可以相同，也可以不相同；
当色阻层2上不同色阻区域的高度均相同，或者色阻层2上包含有不同高度的色阻区域时，且不同高度的色阻区域之间的高度段差不满足设定高度段差值时，采用灰度掩膜板、半透掩膜板以及狭缝掩膜板中的一种，以及普 通掩膜板，对色阻层2进行曝光显影，得到第一衬垫21和第二衬垫22。灰度掩膜板、半透掩膜板以及狭缝掩膜板可以降低透光量。
掩膜板一般包含透光区和遮光区，其中，普通掩膜板的透光区为完全透光(即透过率为100％)的透光区。狭缝掩膜板(即Slit掩膜板)的透光区也为完全透光的透光区，狭缝掩膜板包含多个透光区，且其透光区与遮光区相互间隔分布，狭缝掩膜板的透光区的宽度小于普通掩膜板的透光区的宽度，一般而言，狭缝掩膜板的透光区的宽度小于5微米，更优的为3微米，而普通掩膜板的透光区的宽度大于5微米，因此，使用狭缝掩膜板对色阻进行曝光，可以降低色阻的受光量。
在阵列基板1上形成的色阻层2，包含有红色色阻、绿色色阻、蓝色色阻，这三者之间的高度不一定相同，例如，可以是红色色阻的高度最高、蓝色色阻的高度最低，如果红色色阻与蓝色色阻之间的高度段差满足设定的高度段差值时，直接采用普通掩膜板对色阻层2进行曝光显影(即是进行图形化处理)即可，具体地，采用普通掩膜板对红色色阻、绿色色阻以及蓝色色阻进行曝光显影处理。然后在完成图形化处理的色阻层2上形成黑色间隔层3，可以自然的形成具有高度段差的主要间隙子31、辅助间隙子32和黑色矩阵33，以及具有高度段差的主要间隙子31和辅助间隙子32，并且使得主要间隙子31与辅助间隙子32之间的高度段差也满足要求；由于普通掩膜板相对于其他的灰度掩膜板、半透掩膜板以及狭缝掩膜板更容易制备得到，这里，只采用普通掩膜板对色阻层2进行曝光显影，使得制备第一衬垫21和第二衬垫22更加容易。
当红色色阻、绿色色阻、蓝色色阻之间的高度相同，或者这三者之间的高度段差不满足设定的高度段差值时，采用灰度掩膜板、半透掩膜板以及狭缝掩膜板中的一种，以及普通掩膜板对色阻层2进行曝光显影处理。例如，采用普通掩膜板对色组层2上的一条或者多条蓝色色阻进行曝光显影处理，采用灰度掩膜板对红色色阻、绿色色阻，以及其他的蓝色色阻进行曝光显影处理，通过灰度掩膜板、半透掩膜板以及狭缝掩膜板中的一种对色阻进行曝光，可以使色阻的受光量降低。
例如，在另一实施例中，如图5所示，色阻层2包括第一色阻条201、 第二色阻条202、第三色阻条203、第四色阻条204，其中，第一色阻条201和第四色阻条204均为蓝色色阻，第二色阻条202和第三色阻条203分别为红色色阻和绿色色阻，色组层2上方设置掩膜板8进行掩膜，掩膜板8包括普通掩膜板801和三个狭缝掩膜板802、803、804，普通掩膜板801位于第一色阻条201上方，三个狭缝掩膜板802、803、804分别位于第二色阻条202、第三色阻条203、第四色阻条204上方。在曝光制程中，第二色阻条202、第三色阻条203、第四色阻条204的受光量小于第一色阻条201的受光量，对色组层2进行显影处理后，第一色阻条201会高于第二色阻条202、第三色阻条203、第四色阻条204，从而在色阻层2上形成高度段差。
当采用狭缝掩膜板对色阻进行曝光显影处理时，色阻的表面会有一定的粗糙，在阵列基板1表面经过BPS材料流平后，能够优化阵列基板1表面的地形以及粗糙度。
因此，采用普通掩膜板，以及灰度掩膜板、半透掩膜板和狭缝掩膜板中的一种对色组层2进行曝光显影处理，可以得到三段差的间隙子结构。
进一步地，主要间隙子31与辅助间隙子32之间的高度段差范围为0.2～0.8微米。
进一步地，主要间隙子31与辅助间隙子32之间的高度段差为ΔH2，第一衬垫21与第二衬垫22之间的高度段差为ΔH1，ΔH2与ΔH1的比值范围为40％～70％，即ΔH2/ΔH1的范围为40％～70％。
进一步地，图形化黑色间隔层3，具体为：
采用普通掩膜板对黑色间隔层3进行曝光显影处理。
进一步地，如图6所示，色阻层2在阵列基板1的栅线区域121断开。
本发明还提供一种液晶显示面板，如图7所示，该液晶显示面板包括：阵列基板1、位于阵列基板1上方的上基板4，以及夹持在上基板4和阵列基板1之间的液晶层5，阵列基板1包括下基板11，以及设置在下基板11上的阵列电路12。
在阵列基板1上设置第一衬垫21和第二衬垫22，第一衬垫21高于第二衬垫22，且第一衬垫21高于第二衬垫22均为单层衬垫。
在阵列基板1上设置有黑色间隔层3，黑色间隔层3包括具有高度段差 的主要间隙子31、辅助间隙子32和黑色矩阵33，其中，主要间隙子31位于第一衬垫21上方，辅助间隙子32位于第二衬垫22上方，且主要间隙子31高于辅助间隙子32。
进一步地，第一衬垫和第二衬垫均为色阻材料制成；主要间隙子31与辅助间隙子32之间的高度段差范围为0.2～0.8微米。
主要间隙子31与辅助间隙子32之间的高度段差为ΔH2，第一衬垫21与第二衬垫22之间的高度段差为ΔH1，ΔH2与ΔH1的比值范围为40％～70％。
进一步地，液晶显示面板还包括上偏光片6和下偏光片，上偏光片6位于上基板4的上方，下偏光片位于下基板11的下方。
综上所述，本发明相对于3Tone技术和2Tone技术而言，可以降低制备液晶显示面板中的间隙子和液晶显示面板的制备成本和制备难度，相对于1Tone技术而言，可以降低色阻的对准难度。
以上内容是结合具体的优选实施方式对本发明所作的进一步详细说明，不能认定本发明的具体实施只局限于这些说明。对于本发明所属技术领域的普通技术人员来说，在不脱离本发明构思的前提下，还可以做出若干简单推演或替换，都应当视为属于本发明的保护范围。

Claims (14)

  1. 一种液晶显示面板中的间隙子的制备方法，其中，包括下述步骤：
    在阵列基板上形成第一衬垫和第二衬垫，所述第一衬垫高于所述第二衬垫，且所述第一衬垫和所述第二衬垫均为单层衬垫；
    在所述阵列基板上形成黑色间隔层，且所述黑色间隔层覆盖所述第一衬垫和所述第二衬垫；
    图形化所述黑色间隔层，得到具有高度段差的主要间隙子、辅助间隙子和黑色矩阵，其中，所述主要间隙子位于所述第一衬垫上方，所述辅助间隙子位于所述第二衬垫上方，且所述主要间隙子高于所述辅助间隙子。
  2. 根据权利要求1所述的液晶显示面板中的间隙子的制备方法，其中，在阵列基板上形成第一衬垫和第二衬垫，包括下述步骤：
    在所述阵列基板上形成色阻层；
    当所述色阻层上包含有不同高度的色阻区域，且不同高度的色阻区域之间的高度段差满足设定高度段差值时，采用普通掩膜板对所述色阻层进行曝光显影，得到所述第一衬垫和所述第二衬垫；
    当所述色阻层上不同色阻区域的高度均相同，或者所述色阻层上包含有不同高度的色阻区域时，且不同高度的色阻区域之间的高度段差不满足设定高度段差值时，采用灰度掩膜板、半透掩膜板以及狭缝掩膜板中的一种，以及普通掩膜板，对所述色阻层进行曝光显影，得到所述第一衬垫和所述第二衬垫。
  3. 根据权利要求1所述的液晶显示面板中的间隙子的制备方法，其中，所述主要间隙子与所述辅助间隙子之间的高度段差范围为0.2～0.8微米。
  4. 根据权利要求1所述的液晶显示面板中的间隙子的制备方法，其中，所述主要间隙子与所述辅助间隙子之间的高度段差为ΔH2，所述第一衬垫与所述第二衬垫之间的高度段差为ΔH1，ΔH2与ΔH1的比值范围为40％～70％。
  5. 根据权利要求1所述的液晶显示面板中的间隙子的制备方法，其中，图形化所述黑色间隔层，具体为：
    采用普通掩膜板对所述黑色间隔层进行曝光显影处理。
  6. 根据权利要求2所述的液晶显示面板中的间隙子的制备方法，其中，所述色阻层在所述阵列基板的栅线区域断开。
  7. 一种液晶显示面板中的间隙子的制备方法，其中，包括下述步骤：
    在阵列基板上形成第一衬垫和第二衬垫，所述第一衬垫高于所述第二衬垫，且所述第一衬垫和所述第二衬垫均为单层衬垫；
    在所述阵列基板上形成黑色间隔层，且所述黑色间隔层覆盖所述第一衬垫和所述第二衬垫；
    图形化所述黑色间隔层，得到具有高度段差的主要间隙子、辅助间隙子和黑色矩阵，其中，所述主要间隙子位于所述第一衬垫上方，所述辅助间隙子位于所述第二衬垫上方，且所述主要间隙子高于所述辅助间隙子；
    在阵列基板上形成第一衬垫和第二衬垫，包括下述步骤：
    在所述阵列基板上形成色阻层；
    当所述色阻层上包含有不同高度的色阻区域，且不同高度的色阻区域之间的高度段差满足设定高度段差值时，采用普通掩膜板对所述色阻层进行曝光显影，得到所述第一衬垫和所述第二衬垫；
    当所述色阻层上不同色阻区域的高度均相同，或者所述色阻层上包含有不同高度的色阻区域时，且不同高度的色阻区域之间的高度段差不满足设定高度段差值时，采用灰度掩膜板、半透掩膜板以及狭缝掩膜板中的一种，以及普通掩膜板，对所述色阻层进行曝光显影，得到所述第一衬垫和所述第二衬垫；
    所述主要间隙子与所述辅助间隙子之间的高度段差范围为0.2～0.8微米。
  8. 根据权利要求7所述的液晶显示面板中的间隙子的制备方法，其中，所述主要间隙子与所述辅助间隙子之间的高度段差为ΔH2，所述第一衬垫与所述第二衬垫之间的高度段差为ΔH1，ΔH2与ΔH1的比值范围为40％～70％。
  9. 根据权利要求7所述的液晶显示面板中的间隙子的制备方法，其中，图形化所述黑色间隔层，具体为：
    采用普通掩膜板对所述黑色间隔层进行曝光显影处理。
  10. 根据权利要求7所述的液晶显示面板中的间隙子的制备方法，其中， 所述色阻层在所述阵列基板的栅线区域断开。
  11. 一种液晶显示面板，其中，包括：阵列基板、位于所述阵列基板上方的上基板，以及夹持在所述上基板和所述阵列基板之间的液晶层，所述阵列基板包括下基板，以及设置在所述下基板上的阵列电路；
    在所述阵列基板上设置第一衬垫和第二衬垫，所述第一衬垫高于所述第二衬垫，且所述第一衬垫和所述第二衬垫均为单层衬垫；
    在所述阵列基板上设置有黑色间隔层，所述黑色间隔层包括具有高度段差的主要间隙子、辅助间隙子和黑色矩阵，其中，所述主要间隙子位于所述第一衬垫上方，所述辅助间隙子位于所述第二衬垫上方，且所述主要间隙子高于所述辅助间隙子。
  12. 根据权利要求11所述的液晶显示面板，其中，
    所述第一衬垫和所述第二衬垫均为色阻材料制成；
    所述主要间隙子与所述辅助间隙子之间的高度段差范围为0.2～0.8微米。.
  13. 根据权利要求11所述的液晶显示面板，其中，所述主要间隙子与所述辅助间隙子之间的高度段差为ΔH2，所述第一衬垫与所述第二衬垫之间的高度段差为ΔH1，ΔH2与ΔH1的比值范围为40％～70％。
  14. 根据权利要求11所述的液晶显示面板，其中，还包括上偏光片和下偏光片，所述上偏光片位于所述上基板的上方，所述下偏光片位于所述下基板的下方。
PCT/CN2017/109706 2017-10-13 2017-11-07 一种液晶显示面板中的间隙子的制备方法及液晶显示面板 Ceased WO2019071682A1 (zh)

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