WO2019065521A1 - Polyimide, polyimide varnish, and polyimide film - Google Patents
Polyimide, polyimide varnish, and polyimide film Download PDFInfo
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- WO2019065521A1 WO2019065521A1 PCT/JP2018/035124 JP2018035124W WO2019065521A1 WO 2019065521 A1 WO2019065521 A1 WO 2019065521A1 JP 2018035124 W JP2018035124 W JP 2018035124W WO 2019065521 A1 WO2019065521 A1 WO 2019065521A1
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1042—Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1039—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors comprising halogen-containing substituents
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1067—Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D179/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
- C09D179/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C09D179/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2379/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
- C08J2379/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08J2379/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
Definitions
- the present invention relates to a polyimide, and a polyimide varnish and a polyimide film containing the polyimide.
- Polyimides have excellent properties in mechanical properties, chemical resistance, electrical properties, etc. in addition to their excellent heat resistance, so films made of polyimides are molding materials, composite materials, electric and electronic parts And in the field of display devices and the like.
- studies are being actively made to realize reduction in the weight, thickness and flexibility of display devices by applying a plastic substrate instead of a glass substrate.
- the linear thermal expansion coefficients of the inorganic material and the film are significantly different, so the film on which the electronic device made of the inorganic material is formed is bent.
- an electronic element made of a material may be peeled off from the film. Therefore, in addition to transparency and heat resistance, a polyimide film is also required to have a low coefficient of linear thermal expansion.
- Patent Document 1 4,4 '-(hexafluoroisopropylidene) diphthalic acid is used as an acid component, and 4,4'-diamino-2,2'-bis (trifluoromethyl) biphenyl is used as a diamine component.
- Polyimides are disclosed.
- the problem to be solved by the present invention is to provide a polyimide capable of forming a film having a low linear thermal expansion coefficient while maintaining high transparency and high heat resistance, and a polyimide varnish and a polyimide film containing the polyimide. It is.
- the present invention relates to the following [1] to [3].
- Structural unit A is a structural unit (A-1) derived from a compound represented by the following formula (a-1), and a structural unit (A-2) derived from a compound represented by the following formula (a-2)
- Structural unit B is a structural unit (B-2) derived from a compound represented by the following formula (b-1), and a structural unit (B-2) derived from a compound represented by the following formula (b-2) ), Including polyimide.
- each R independently represents a hydrogen atom, a fluorine atom or a methyl group.
- a polyimide capable of forming a film having a low linear thermal expansion coefficient while maintaining high transparency and high heat resistance, and a polyimide varnish and a polyimide film containing the polyimide.
- the polyimide of the present invention is a polyimide having a structural unit A derived from tetracarboxylic acid or a derivative thereof, and a structural unit B derived from a diamine
- Structural unit A is a structural unit (A-1) derived from the compound represented by the above formula (a-1), and a structural unit (A-2) derived from the compound represented by the above formula (a-2)
- Structural unit B is a structural unit (B-2) derived from the compound represented by the above formula (b-1), and a structural unit (B-2) derived from the compound represented by the above formula (b-2)
- the polyimide of the present invention has a specific structural unit (A-1), a structural unit (A-2), a structural unit (B-1), and a structural unit (B-2), so that the linear thermal expansion coefficient is low. Can be formed.
- the constituent unit A contained in the polyimide of the present invention is a constituent unit derived from tetracarboxylic acid or a derivative thereof.
- the tetracarboxylic acids or their derivatives can be used alone or in combination of two or more.
- Derivatives of tetracarboxylic acids include anhydrides or alkyl esters of tetracarboxylic acids.
- the alkyl ester of tetracarboxylic acid the carbon number of alkyl is preferably 1 to 3, and examples thereof include dimethyl ester, diethyl ester and dipropyl ester of tetracarboxylic acid.
- the constituent unit A in the present invention includes a constituent unit (A-1) derived from a compound represented by the following formula (a-1).
- the compound represented by the formula (a-1) is biphenyltetracarboxylic acid dianhydride.
- the structural unit A contains the structural unit (A-1)
- the heat resistance, mechanical properties (elastic modulus) and organic solvent resistance of the polyimide are improved.
- Examples of the compound represented by the formula (a-1) include 3,3 ′, 4,4′-biphenyltetracarboxylic acid dianhydride (s-BPDA) represented by the following formula (a-1-1): 2,3,3 ′, 4′-biphenyltetracarboxylic acid dianhydride (a-BPDA) represented by the following formula (a-1-2), and represented by the following formula (a-1-3) 2,2 ', 3,3'-biphenyltetracarboxylic acid dianhydride (i-BPDA) is mentioned, and among them, 3,3', 4,4'- represented by the following formula (a-1-1) Biphenyl tetracarboxylic dianhydride is preferred.
- the compounds represented by the formula (a-1) can be used alone or in combination of two or more.
- s-BPDA is preferable in terms of resistance to organic solvents
- a-BPDA and i-BPDA are preferable in terms of heat resistance and solution processability.
- the ratio of the structural unit (A-1) to the structural unit A is preferably 50 mol% or more, more preferably 55 mol% or more, and further preferably from the viewpoint of heat resistance, mechanical properties (elastic modulus) and organic solvent resistance. Is 60 mol% or more, more preferably 65 mol% or more, still more preferably 70 mol% or more, preferably 99 mol% or less, more preferably 95 mol% or less, still more preferably 90 mol% or less More preferably, it is 85 mol% or less, still more preferably 80 mol% or less.
- the structural unit A includes a structural unit (A-2) derived from a compound represented by the following formula (a-2).
- the compound represented by the formula (a-2) is 4,4 '-(hexafluoroisopropylidene) diphthalic anhydride.
- the ratio of the structural unit (A-2) to the structural unit A is preferably 1 mol% or more, more preferably 5 mol% or more, still more preferably 10 mol% or more, from the viewpoint of solubility and high transparency. It is preferably 15 mol% or more, more preferably 20 mol% or more, and from the viewpoint of high heat resistance, preferably 50 mol% or less, more preferably 45 mol% or less, still more preferably 40 mol% or less More preferably, it is 35 mol% or less, still more preferably 30 mol% or less.
- the ratio of the structural unit (A-1) and the structural unit (A-2) to the structural unit A is preferably 50 to 99% by mole of the structural unit (A-1) and 1 to 50 as the structural unit (A-2). %, More preferably 55 to 95 mol% of the structural unit (A-1), 5 to 45 mol% of the structural unit (A-2), and still more preferably 60 to 60 mol% of the structural unit (A-1). -90 mol%, 10-40 mol% of the structural unit (A-2), and still more preferably 65-85 mol% of the structural unit (A-1), 15-35 structural unit (A-2) More preferably, the structural unit (A-1) is 70 to 80 mol%, and the structural unit (A-2) is 20 to 30 mol%.
- the molar ratio [(A-1) / (A-2)] of the structural unit (A-1) to the structural unit (A-2) is 50/50 from the viewpoint of low linear thermal expansion coefficient and high transparency. -99/1 is preferable, 55/45 to 95/5 is more preferable, 60/40 to 90/10 is further preferable, 65/35 to 85/15 is still more preferable, 70/30 to 80/20 is more More preferable.
- the polyimide according to the present invention can be produced by using the structural unit A as a structural unit other than the structural unit (A-1) and the structural unit (A-2) as long as the effects of the present invention are not impaired.
- the structural unit derived from tetracarboxylic acid or its derivative (s) other than the compound represented by () and the compound represented by Formula (a-2) may be included, it is preferable not to contain.
- the proportion of the total of the structural unit (A-1) and the structural unit (A-2) in the structural unit A is 70 mol% or more from the viewpoint of low linear thermal expansion coefficient, high transparency, and organic solvent resistance Is preferably 85 mol% or more, more preferably 99 mol% or more, and still more preferably 100 mol%.
- the structural unit B contained in the polyimide of the present invention is a structural unit derived from a diamine.
- the structural unit B contains a structural unit (B-1) derived from a compound represented by the following formula (b-1).
- each R is independently selected from the group consisting of a hydrogen atom, a fluorine atom, and a methyl group, and is preferably a hydrogen atom.
- 9,9-bis (4-aminophenyl) fluorene, 9,9-bis (3-fluoro-4-aminophenyl) fluorene, and 9,9- Bis (3-methyl-4-aminophenyl) fluorene and the like can be mentioned, and at least one selected from the group consisting of these three compounds is preferable, and 9,9-bis (4-aminophenyl) fluorene is more preferable.
- the polyimide of the present invention improves the transparency and heat resistance by including the structural unit (B-1).
- the ratio of the structural unit (B-1) to the structural unit B is preferably 50 mol% or less, more preferably 40 mol% or less, still more preferably 35 mol% or less from the viewpoint of low linear thermal expansion coefficient Still more preferably 30 mol% or less, still more preferably 25 mol% or less, and in view of high transparency and high heat resistance, preferably 5 mol% or more, more preferably 10 mol% or more. More preferably, it is 15 mol% or more, still more preferably 20 mol% or more.
- the constituent unit B in the present invention contains a constituent unit (B-2) derived from a compound represented by the following formula (b-2).
- the compound represented by the above formula (b-2) is 2,2'-bis (trifluoromethyl) benzidine (alias: 4,4'-diamino-2,2'-bis (trifluoromethyl) biphenyl) is there.
- the polyimide of the present invention can improve mechanical properties (elastic modulus) and form a film having a low linear thermal expansion coefficient.
- the ratio of the structural unit (B-2) to the structural unit B is preferably 50 moles from the viewpoint of forming a film having a low linear thermal expansion coefficient while maintaining high transparency and high heat resistance.
- % More preferably 60 mol% or more, still more preferably 65 mol% or more, still more preferably 70 mol% or more, still more preferably 75 mol% or more, and preferably 95 mol% or less, more preferably It is 90 mol% or less, more preferably 85 mol% or less, still more preferably 80 mol% or less.
- the ratio of the structural units (B-1) and (B-2) to the structural unit B is preferably 5 to 50 mol% of the structural unit (B-1) and 50 to 95 mol% of the structural unit (B-2) More preferably, the structural unit (B-1) is 10 to 40 mol%, the structural unit (B-2) is 60 to 90 mol%, and still more preferably the structural unit (B-1) is 15 to 35 Mol%, the structural unit (B-2) is 65 to 85 mol%, more preferably 15 to 30 mol% of the structural unit (B-1), 70 to 85 mol% of the structural unit (B-2) More preferably, the structural unit (B-1) is 20 to 25 mol%, and the structural unit (B-2) is 75 to 80 mol%.
- the molar ratio [(B-1) / (B-2)] of the structural unit (B-1) to the structural unit (B-2) has low linear thermal expansion while maintaining high transparency and high heat resistance. From the viewpoint of forming a film having a coefficient, 50/50 to 5/95 is preferable, 40/60 to 10/90 is more preferable, 35/65 to 15/85 is more preferable, and 30/70 to 15/85 is Still more preferred is 25/75 to 20/80.
- the polyimide of the present invention contains a structural unit derived from a diamine other than the compounds represented by the formulas (b-1) to (b-2) in the structural unit B, as long as the effects of the present invention are not impaired. Although it may be contained, it is preferable not to contain.
- the ratio of the total of the structural unit (B-1) and the structural unit (B-2) in the structural unit B forms a film having a low linear thermal expansion coefficient while maintaining high transparency and high heat resistance. In light of the above, 70 mol% or more is preferable, 85 mol% or more is more preferable, 99 mol% or more is more preferable, and 100 mol% is still more preferable.
- the polyimide of the present invention can be obtained by reacting the tetracarboxylic acid component giving the constitutional unit A and the diamine component giving the constitutional unit B.
- tetracarboxylic acid component examples include tetracarboxylic acids or their derivatives.
- the tetracarboxylic acid components can be used alone or in combination of two or more.
- Derivatives of tetracarboxylic acids include anhydrides or alkyl esters of the tetracarboxylic acids.
- the alkyl ester of tetracarboxylic acid the carbon number of alkyl is preferably 1 to 3, and examples thereof include dimethyl ester, diethyl ester and dipropyl ester of tetracarboxylic acid.
- the tetracarboxylic acid component used in the present invention includes biphenyl tetracarboxylic acid or its derivative, and 4,4 '-(hexafluoroisopropylidene) diphthalic acid or its derivative.
- biphenyltetracarboxylic acid dianhydride [the above formula (a-1)] and 4,4 ′-(hexafluoroisopropylidene) diphthalic anhydride [the above formula (a-2)] are preferably included, 3 It is more preferable to contain 4,3 ′, 4,4′-biphenyltetracarboxylic acid dianhydride [formula (a-1-1)] and 4,4 ′-(hexafluoroisopropylidene) diphthalic anhydride .
- the amount of the biphenyltetracarboxylic acid or derivative thereof used is preferably 50 to 99 mol%, more preferably 55 to 95 mol%, still more preferably 60 to 90 mol%, still more preferably, relative to all tetracarboxylic acid components. Is more preferably 65 to 85 mol%, still more preferably 70 to 80 mol%.
- the amount of 4,4 '-(hexafluoroisopropylidene) diphthalic acid or a derivative thereof to be used is preferably 1 to 50 mol%, more preferably 5 to 45 mol%, still more preferably 1 to 50 mol%, relative to all tetracarboxylic acid components.
- the total amount of biphenyltetracarboxylic acid, 4,4 '-(hexafluoroisopropylidene) diphthalic acid, and derivatives thereof to be used is preferably 70 to 100 mol%, more preferably 70 to 100 mol%, based on all tetracarboxylic acid components. It is 85 to 100 mol%, more preferably 99 to 100 mol%, still more preferably 100 mol%.
- the tetracarboxylic acid component used in the present invention may contain a bicarboxylic acid and a tetracarboxylic acid component other than 4,4 '-(hexafluoroisopropylidene) diphthalic acid or derivatives thereof.
- the tetracarboxylic acid component include at least one selected from the group consisting of tetracarboxylic acids containing an aromatic ring or derivatives thereof, and tetracarboxylic acids containing an alicyclic hydrocarbon structure or derivatives thereof.
- the tetracarboxylic acid components can be used alone or in combination of two or more.
- tetracarboxylic acid containing an aromatic ring or a derivative thereof pyromellitic acid, 3,3 ′, 4,4′-diphenyl sulfone tetracarboxylic acid, 3,3 ′, 4,4′-benzophenone tetracarboxylic acid, 4, 4'-oxydiphthalic acid, 2,2 ', 3,3'-benzophenonetetracarboxylic acid, 2,2-bis (3,4-dicarboxyphenyl) propane, 2,2-bis (2,3-dicarboxyphenyl) ) Propane, 2,2-bis (3,4-dicarboxyphenoxyphenyl) propane, 1,1-bis (2,3-dicarboxyphenyl) ethane, 1,2-bis (2,3-dicarboxyphenyl) Ethane, 1,1-bis (3,4-dicarboxyphenyl) ethane, 1,2-bis (3,4-dicarboxyphenyl) ethane, bis
- tetracarboxylic acids containing an alicyclic hydrocarbon structure or derivatives thereof include 1,2,3,4-cyclobutane tetracarboxylic acid, 1,2,4,5-cyclopentane tetracarboxylic acid, 1,2,4, 5-cyclohexanetetracarboxylic acid, bicyclo [2.2.2] octa-7-ene-2,3,5,6-tetracarboxylic acid, dicyclohexyltetracarboxylic acid, cyclopentanone bis-spironorbornane tetracarboxylic acid or their compounds Regioisomers and their derivatives are included.
- the amount of the biphenyltetracarboxylic acid or derivative thereof and the tetracarboxylic acid component other than 4,4 '-(hexafluoroisopropylidene) diphthalic acid or derivative thereof is preferably 30% by mole based on all tetracarboxylic acid components.
- the following content is more preferably 15 mol% or less, still more preferably 1 mol% or less, and still more preferably 0 mol%.
- the diamine component used in the present invention includes the compound represented by the above formula (b-1) and 2,2′-bis (trifluoromethyl) benzidine [the above formula (b-2)].
- a diamine component which gives the structural unit B it is not restricted to a diamine, although the derivative (diisocyanate etc.) may be sufficient in the range in which the same structural unit is formed, a diamine is preferable.
- the amount of the compound represented by the above formula (b-1) is preferably 5 to 50 mol%, more preferably 10 to 40 mol%, still more preferably 10 to 35 mol based on all diamine components.
- the amount of 2,2'-bis (trifluoromethyl) benzidine used is preferably 50 to 95 mol%, more preferably 60 to 90 mol%, still more preferably 65 to 90 mol based on the total diamine components. %, Still more preferably 70 to 85 mol%, still more preferably 75 to 85 mol%, still more preferably 75 to 80 mol%.
- the total amount of the compound represented by the above formula (b-1) and 2,2′-bis (trifluoromethyl) benzidine is preferably 70 to 100 mol%, more preferably about all diamine components. It is 85 to 100 mol%, more preferably 99 to 100 mol%, still more preferably 100 mol%.
- the diamine component used in the present invention may contain a diamine component other than the compound represented by the above formula (b-1) and 2,2′-bis (trifluoromethyl) benzidine.
- the diamine component include at least one selected from the group consisting of aromatic diamines and aliphatic diamines.
- the diamine components can be used alone or in combination of two or more.
- aromatic diamine refers to a diamine in which an amino group is directly bonded to an aromatic ring, and an aliphatic hydrocarbon group, an alicyclic hydrocarbon group or an aromatic hydrocarbon group as part of the structure thereof And other substituents (for example, a halogen atom, a sulfonyl group, a carbonyl group, an oxygen atom, etc.) may be included.
- aliphatic diamine refers to a diamine in which an amino group is directly bonded to an aliphatic hydrocarbon group or an alicyclic hydrocarbon group, and an aromatic hydrocarbon group or aliphatic hydrocarbon group as part of its structure
- alicyclic hydrocarbon groups and other substituents for example, halogen atoms, sulfonyl groups, carbonyl groups, oxygen atoms, etc.
- aromatic diamines include p-phenylenediamine, m-phenylenediamine, 2,4-diaminotoluene, 2,6-diaminotoluene, benzidine, o-tolidine, m-tolidine, octafluorobenzidine, 3,3'- Dihydroxy-4,4'-diaminobiphenyl, 3,3'-dimethoxy-4,4'-diaminobiphenyl, 3,3'-dichloro-4,4'-diaminobiphenyl, 3,3'-difluoro-4,4 '-Diaminobiphenyl, 2,6-diaminonaphthalene, 1,5-diaminonaphthalene, 4,4'-diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, 4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenyl
- aliphatic diamines include ethylene diamine, hexamethylene diamine, polyethylene glycol bis (3-aminopropyl) ether, polypropylene glycol bis (3-aminopropyl) ether, 1,3-bis (aminomethyl) cyclohexane, 1,4- Bis (aminomethyl) cyclohexane, metaxylylenediamine, paraxylylenediamine, 1,4-bis (2-amino-isopropyl) benzene, 1,3-bis (2-amino-isopropyl) benzene, isophorone diamine, norbornane Diamine, siloxane diamine, 4,4'-diaminodicyclohexylmethane, 3,3'-dimethyl-4,4'-diaminodicyclohexylmethane, 3,3'-diethyl-4,4'-diaminodicyclohexylmethane, 3,3
- the amount of use of the compound represented by the above formula (b-1) and diamine components other than 2,2′-bis (trifluoromethyl) benzidine is preferably 30 mol% or less, more preferably to all diamine components. Is 15 mol% or less, more preferably 1 mol% or less, and still more preferably 0 mol%.
- the ratio by weight of the tetracarboxylic acid component to the diamine component is preferably 0.9 to 1.1 moles of the diamine component to 1 mole of the tetracarboxylic acid component.
- terminal blocker other than the said tetracarboxylic acid component and the said diamine component.
- the end capping agent monoamines or dicarboxylic acids are preferable.
- the preparation amount of the end capping agent to be introduced is preferably 0.0001 to 0.1 mol, and more preferably 0.001 to 0.06 mol, per 1 mol of the tetracarboxylic acid component.
- Examples of monoamines end capping agents include methylamine, ethylamine, propylamine, butylamine, benzylamine, 4-methylbenzylamine, 4-ethylbenzylamine, 4-dodecylbenzylamine, 3-methylbenzylamine, 3- Ethyl benzylamine, aniline, 3-methylaniline, 4-methylaniline and the like are recommended. Among these, benzylamine and aniline can be suitably used.
- dicarboxylic acid end capping agent dicarboxylic acids are preferable, and some of them may be ring-closed.
- phthalic acid, phthalic anhydride, 4-chlorophthalic acid, tetrafluorophthalic acid, 2,3-benzophenonedicarboxylic acid, 3,4-benzophenonedicarboxylic acid, cyclohexane-1,2-dicarboxylic acid, cyclopentane-1,2 -Dicarboxylic acid, 4-cyclohexene-1,2-dicarboxylic acid, etc. are recommended.
- phthalic acid and phthalic anhydride can be suitably used.
- tetracarboxylic acid component and a diamine component are made to react
- a well-known method can be used.
- a specific reaction method (1) a tetracarboxylic acid component, a diamine component, and a reaction solvent are charged in a reactor, and stirred at room temperature to 80 ° C. for 0.5 to 30 hours, and then heated to imidation Method for carrying out the reaction, (2) The diamine component and the reaction solvent are charged into the reactor and dissolved, and then the tetracarboxylic acid component is charged, and if necessary, stirred for 0.5 to 30 hours at room temperature to 80 ° C. (3) The tetracarboxylic acid component, the diamine component, and the reaction solvent are charged into a reactor, and the temperature is raised immediately to perform the imidization reaction.
- the reaction solvent used for producing the polyimide may be any solvent which can dissolve the polyimide to be produced without inhibiting the imidization reaction.
- aprotic solvents phenol solvents, ether solvents, carbonate solvents and the like can be mentioned.
- aprotic solvent examples include N, N-dimethylisobutyramide, N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidone, N-methylcaprolactam, 1,3-dimethyl Amide solvents such as imidazolidinone and tetramethylurea, lactone solvents such as ⁇ -butyrolactone and ⁇ -valerolactone, phosphorus-containing amide solvents such as hexamethylphosphoric amide and hexamethylphosphine triamide, dimethyl sulfone, Sulfur-containing solvents such as dimethylsulfoxide and sulfolane, ketone solvents such as acetone, cyclohexanone and methylcyclohexanone, amine solvents such as picoline and pyridine, ester solvents such as acetic acid (2-methoxy-1-methylethyl) It can be mentioned.
- phenolic solvents include phenol, o-cresol, m-cresol, p-cresol, 2,3-xylenol, 2,4-xylenol, 2,5-xylenol, 2,6-xylenol, 3,4 -Xylenol, 3,5-xylenol and the like.
- ether solvents include 1,2-dimethoxyethane, bis (2-methoxyethyl) ether, 1,2-bis (2-methoxyethoxy) ethane, bis [2- (2-methoxyethoxy) ethyl] Ether, tetrahydrofuran, 1,4-dioxane and the like can be mentioned.
- reaction solvents diethyl carbonate, methyl ethyl carbonate, ethylene carbonate, a propylene carbonate etc. are mentioned as a specific example of a carbonate type solvent.
- aprotic solvents are preferable, and amide solvents or lactone solvents are more preferable.
- the above reaction solvents may be used alone or in combination of two or more.
- the imidization reaction it is preferable to carry out the reaction while removing water generated at the time of production using a Dean-Stark apparatus or the like. By performing such an operation, the degree of polymerization and the imidation ratio can be further increased.
- the imidation catalyst includes a base catalyst or an acid catalyst.
- a base catalyst pyridine, quinoline, isoquinoline, ⁇ -picoline, ⁇ -picoline, 2,4-lutidine, 2,6-lutidine, trimethylamine, triethylamine, tripropylamine, tributylamine, imidazole, N, N-dimethylaniline
- organic base catalysts such as N, N-diethylaniline
- inorganic base catalysts such as potassium hydroxide, sodium hydroxide, potassium carbonate, sodium carbonate, potassium hydrogen carbonate and sodium hydrogen carbonate.
- an acid catalyst crotonic acid, acrylic acid, trans-3-hexenoic acid, cinnamic acid, benzoic acid, methylbenzoic acid, oxybenzoic acid, terephthalic acid, benzenesulfonic acid, paratoluenesulfonic acid, naphthalenesulfonic acid, etc.
- the above imidation catalysts may be used alone or in combination of two or more.
- a base catalyst is preferable, an organic base catalyst is more preferable, and triethylamine is more preferable.
- the temperature of the imidization reaction is preferably 120 to 250 ° C., more preferably 160 to 190 ° C., and still more preferably 180 to 190 ° C. from the viewpoint of reaction rate and suppression of gelation etc. is there.
- the reaction time is preferably 0.5 to 10 hours after the start of distillation of the produced water.
- the temperature of the imidation reaction when no catalyst is used is preferably 200 to 350.degree.
- a polyimide solution containing at least a polyimide and a reaction solvent can be obtained after completion of the imidization reaction.
- the weight average molecular weight of the polyimide of the present invention is preferably 500 to 1,000,000, more preferably 5,000 to 100,000, from the viewpoint of the mechanical strength of the resulting polyimide film.
- the weight average molecular weight of the polyimide can be measured by gel filtration chromatography or the like.
- a method of measuring an absolute molecular weight with a light scattering detector using N, N-dimethylformamide as a developing solvent can be mentioned.
- the polyimide of the present invention may further be mixed with various additives as long as the effects of the present invention are not impaired.
- the additive include an antioxidant, a light stabilizer, a surfactant, a flame retardant, a plasticizer, an inorganic filler, and a polymer compound other than the polyimide.
- polymer compound polyimide other than the polyimide of the present invention, polycarbonate, polystyrene, polyamide, polyamide imide, polyester such as polyethylene terephthalate, polyether sulfone, polycarboxylic acid, polyacetal, polyphenylene ether, polysulfone, polybutylene, polypropylene, polyacrylamide And polyvinyl chloride.
- the polyimide varnish of the present invention is obtained by dissolving the polyimide of the present invention in an organic solvent. That is, the polyimide varnish of the present invention contains the polyimide of the present invention and an organic solvent, and the polyimide is dissolved in the organic solvent.
- the organic solvent is not particularly limited as long as it dissolves the polyimide, but it is preferable to use one or more of the compounds described above as the reaction solvent used for producing the polyimide. Since the polyimide of the present invention has solvent solubility, it can be a highly concentrated varnish stable at room temperature.
- the polyimide varnish may be a polyimide solution itself in which a polyimide obtained by a polymerization method is dissolved in a reaction solvent. Moreover, what mixed at least 1 sort (s) chosen from the solvent illustrated above as a solvent which a polyimide melt
- the solid content concentration of the polyimide varnish of the present invention can be appropriately selected according to the workability at the time of forming a polyimide film to be described later, etc., and the reaction solvent used for producing the polyimide of the present invention is volatilized and condensed. Alternatively, the solid content concentration and viscosity of the polyimide varnish of the present invention may be adjusted by adding an organic solvent as a dilution solvent.
- the organic solvent is not particularly limited as long as it can dissolve polyimide.
- the solid content concentration of the polyimide varnish of the present invention is preferably 5 to 45% by mass, more preferably 5 to 35% by mass, and still more preferably 5 to 25% by mass.
- the viscosity of the polyimide varnish of the present invention is preferably 0.1 to 200 Pa ⁇ s, more preferably 0.5 to 180 Pa ⁇ s, and still more preferably 1 to 150 Pa ⁇ s.
- the viscosity of the polyimide varnish is a value measured at 25 ° C. using an E-type viscometer.
- the polyimide film of the present invention is characterized by containing the polyimide of the present invention, and has a low linear thermal expansion coefficient while maintaining high transparency and high heat resistance.
- the polyimide film of the present invention preferably comprises the polyimide of the present invention.
- a polyimide varnish containing the polyimide of the present invention is coated on a smooth support such as a glass plate, metal plate or plastic, or a film And the like, and a method of removing solvent components such as a reaction solvent and a dilution solvent contained in the varnish.
- a smooth support such as a glass plate, metal plate or plastic, or a film And the like
- solvent components such as a reaction solvent and a dilution solvent contained in the varnish.
- a release agent may be applied to the surface of the support, if necessary.
- a method of heating and evaporating a solvent component after applying the said polyimide varnish to the said support body the following method is preferable. That is, after the solvent is evaporated at a temperature of 120 ° C. or less to form a self-supporting film, the self-supporting film is peeled from the support to fix the end portion of the self-supporting film, and It is preferable to produce a polyimide film by drying at a temperature not lower than the boiling point and not higher than 350 ° C. Moreover, it is preferable to dry under nitrogen atmosphere.
- the pressure of the drying atmosphere may be any of reduced pressure, normal pressure and increased pressure.
- the thickness of the polyimide film of the present invention can be appropriately selected according to the application etc., but is preferably in the range of 1 to 250 ⁇ m, more preferably 5 to 100 ⁇ m, still more preferably 7 to 90 ⁇ m, still more preferably 10 to 80 ⁇ m. It is.
- the thickness of 1 to 250 ⁇ m enables practical use as a free standing film.
- a polyimide film having a total light transmittance of preferably 80% or more, more preferably 85% or more, still more preferably 88% or more, still more preferably 89% or more at a thickness of 10 ⁇ m can be formed.
- a polyimide film having a yellow index (YI value) of preferably 6.0 or less, more preferably 5.0 or less, and still more preferably 4.5 or less can be formed.
- a polyimide film having a haze of preferably 1.0 or less, more preferably 0.8 or less, and even more preferably 0.5 or less can be formed.
- a polyimide film having a glass transition temperature of preferably 250 ° C. or more, more preferably 300 ° C. or more, still more preferably 350 ° C. or more can be formed.
- a polyimide film having a linear thermal expansion coefficient of preferably 40 ppm / ° C. or less, more preferably 35 ppm / ° C. or less, further preferably 30 ppm / ° C. or less can be formed.
- a polyimide film having a tensile elastic modulus (measurement temperature: 23 ° C., humidity: 50% RH) of preferably 3.0 GPa or more, more preferably 3.5 GPa or more can be formed.
- the total light transmittance, the YI value, the haze, the glass transition temperature, the linear thermal expansion coefficient, and the tensile modulus of elasticity of the polyimide film can be specifically measured by the method described in the examples.
- the polyimide film containing the polyimide of the present invention is excellent in transparency and heat resistance, and has a low coefficient of linear thermal expansion so that the dimensional change due to heat is small, and films for various members such as color filters, flexible displays, semiconductor parts, optical members, etc. Are preferably used. Since the polyimide film of the present invention has high dimensional stability, it can correspond to the high temperature process of the manufacturing process of the image display device. Therefore, for example, the polyimide film of the present invention can be used for at least a part of an image display device such as a liquid crystal display or an organic EL display.
- Solid content concentration The solid content concentration of the polyimide varnish or the polyimide precursor varnish was measured by heating the sample at 320 ° C. for 120 minutes in a small electric furnace MMF-1 manufactured by As One Co., Ltd., and calculating from the mass difference of the sample before and after heating.
- Film thickness The polyimide film thickness was measured using a micrometer manufactured by Mitutoyo Corporation.
- Total light transmittance, yellow index (YI), haze It carried out using Nippon Denshoku Kogyo Co., Ltd. color and turbidity simultaneous measurement apparatus "COH400". The measurement of total light transmittance and YI conformed to JIS K7361-1: 1997, and the measurement of haze conformed to JIS K7136: 2000.
- Example 1 Stainless steel half-moon-type stirring blade, nitrogen introduction pipe, Dean Stark device equipped with a cooling pipe, thermometer, 5-neck round bottom flask equipped with a glass end cap, 2, 2 '-bis (trifluoromethyl) benzidine 29.462 g (0.092 mol) (manufactured by Wakayama Seika Kogyo Co., Ltd.), 8.014 g (0.023 mol) of 9,9-bis (4-aminophenyl) fluorene (manufactured by Taoka Chemical Industry Co., Ltd.), N 111.263 g of methyl-2-pyrrolidone (manufactured by Mitsubishi Chemical Corporation) was charged, and the solution was obtained by stirring at a rotation speed of 200 rpm under a nitrogen atmosphere at a system temperature of 70 ° C.
- Example 2 Stainless steel half-moon-type stirring blade, nitrogen introduction pipe, Dean Stark device equipped with a cooling pipe, thermometer, 5-neck round bottom flask equipped with a glass end cap, 2, 2 '-bis (trifluoromethyl) benzidine 19.685 g (0.061 mol) (manufactured by Wakayama Seika Kogyo Co., Ltd.), 5.343 g (0.015 mol) of 9,9-bis (4-aminophenyl) fluorene (manufactured by Taoka Chemical Industry Co., Ltd.), N 75.897 g of methyl-2-pyrrolidone (manufactured by Mitsubishi Chemical Corporation) was charged, and the solution was obtained by stirring at a rotation speed of 200 rpm under a nitrogen atmosphere at a system temperature of 70 ° C.
- the obtained polyimide varnish is applied onto a glass plate, held at 80 ° C. for 30 minutes with a hot plate, and then heated at 300 ° C. for 30 minutes in a hot air dryer under nitrogen purge to evaporate the solvent A film of 10 ⁇ m was obtained.
- Table 1 The results are shown in Table 1.
- the polyimide films of Examples 1 and 2 have a low coefficient of linear thermal expansion in addition to high transparency and high heat resistance, so all of these properties are good and balanced.
- the polyimide films of Comparative Examples 1 and 2 are excellent in heat resistance, they have a high coefficient of linear thermal expansion, and the polyimide films of Comparative Example 2 are also inferior in transparency, so these polyimide films are highly transparent. In addition to the properties and high heat resistance, it has not been possible to obtain films with a low linear thermal expansion coefficient.
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Abstract
Description
表示装置分野では、ガラス基板の代わりにプラスチック基板を適用することで、表示装置の軽量化、薄型化、及びフレキシブル化を実現しようとする検討が活発になされている。しかし、例えば無機材料からなる電子素子をフィルム上に形成した場合、無機材料とフィルムの線熱膨張係数が大きく異なるために、無機材料からなる電子素子を形成したフィルムが曲がったり、更には、無機材料からなる電子素子がフィルムから剥がれたりする場合があった。そこで、ポリイミドフィルムに対しても透明性と耐熱性に加え、線熱膨張係数が低いことが要求されている。 Polyimides have excellent properties in mechanical properties, chemical resistance, electrical properties, etc. in addition to their excellent heat resistance, so films made of polyimides are molding materials, composite materials, electric and electronic parts And in the field of display devices and the like.
In the field of display devices, studies are being actively made to realize reduction in the weight, thickness and flexibility of display devices by applying a plastic substrate instead of a glass substrate. However, for example, when an electronic device made of an inorganic material is formed on a film, the linear thermal expansion coefficients of the inorganic material and the film are significantly different, so the film on which the electronic device made of the inorganic material is formed is bent. In some cases, an electronic element made of a material may be peeled off from the film. Therefore, in addition to transparency and heat resistance, a polyimide film is also required to have a low coefficient of linear thermal expansion.
すなわち、本発明が解決しようとする課題は、高透明性及び高耐熱性を維持しつつ、低線熱膨張係数を有するフィルムを形成できるポリイミド、並びに該ポリイミドを含むポリイミドワニス及びポリイミドフィルムを提供することにある。 However, although the polyimide disclosed in Patent Document 1 is excellent in transparency and heat resistance, the linear thermal expansion coefficient does not reach a satisfactory level, and there is a need to further improve it.
That is, the problem to be solved by the present invention is to provide a polyimide capable of forming a film having a low linear thermal expansion coefficient while maintaining high transparency and high heat resistance, and a polyimide varnish and a polyimide film containing the polyimide. It is.
[1]テトラカルボン酸又はその誘導体に由来する構成単位A、及びジアミンに由来する構成単位Bを有するポリイミドであって、
構成単位Aが、下記式(a-1)で表される化合物に由来する構成単位(A-1)、及び下記式(a-2)で表される化合物に由来する構成単位(A-2)を含み、
構成単位Bが、下記式(b-1)で表される化合物に由来する構成単位(B-1)、及び下記式(b-2)で表される化合物に由来する構成単位(B-2)を含む、ポリイミド。 As a result of intensive investigations, the inventors have found that a polyimide having a specific structural unit can form a film having a low linear thermal expansion coefficient while maintaining high transparency and high heat resistance. The present invention has been made based on these findings. That is, the present invention relates to the following [1] to [3].
[1] A polyimide having a structural unit A derived from a tetracarboxylic acid or a derivative thereof and a structural unit B derived from a diamine,
Structural unit A is a structural unit (A-1) derived from a compound represented by the following formula (a-1), and a structural unit (A-2) derived from a compound represented by the following formula (a-2) Including)
Structural unit B is a structural unit (B-2) derived from a compound represented by the following formula (b-1), and a structural unit (B-2) derived from a compound represented by the following formula (b-2) ), Including polyimide.
[2]前記[1]に記載のポリイミドが有機溶媒に溶解してなる、ポリイミドワニス。
[3]前記[1]に記載のポリイミドを含む、ポリイミドフィルム。 (In formula (b-1), each R independently represents a hydrogen atom, a fluorine atom or a methyl group.)
[2] A polyimide varnish obtained by dissolving the polyimide according to [1] in an organic solvent.
[3] A polyimide film comprising the polyimide according to the above [1].
本発明のポリイミドは、テトラカルボン酸又はその誘導体に由来する構成単位A、及びジアミンに由来する構成単位Bを有するポリイミドであって、
構成単位Aが、上記式(a-1)で表される化合物に由来する構成単位(A-1)、及び上記式(a-2)で表される化合物に由来する構成単位(A-2)を含み、
構成単位Bが、上記式(b-1)で表される化合物に由来する構成単位(B-1)、及び上記式(b-2)で表される化合物に由来する構成単位(B-2)を含む、ポリイミドである。本発明のポリイミドは、特定の構成単位(A-1)、構成単位(A-2)、構成単位(B-1)、及び構成単位(B-2)を有することによって、低線熱膨張係数を有するフィルムを形成することができる。 [Polyimide]
The polyimide of the present invention is a polyimide having a structural unit A derived from tetracarboxylic acid or a derivative thereof, and a structural unit B derived from a diamine,
Structural unit A is a structural unit (A-1) derived from the compound represented by the above formula (a-1), and a structural unit (A-2) derived from the compound represented by the above formula (a-2) Including)
Structural unit B is a structural unit (B-2) derived from the compound represented by the above formula (b-1), and a structural unit (B-2) derived from the compound represented by the above formula (b-2) And polyimide. The polyimide of the present invention has a specific structural unit (A-1), a structural unit (A-2), a structural unit (B-1), and a structural unit (B-2), so that the linear thermal expansion coefficient is low. Can be formed.
本発明のポリイミドに含まれる構成単位Aは、テトラカルボン酸又はその誘導体に由来する構成単位である。テトラカルボン酸又はその誘導体は、単独で又は2種以上を組み合わせて用いることができる。
テトラカルボン酸の誘導体としては、テトラカルボン酸の無水物又はアルキルエステルが挙げられる。テトラカルボン酸のアルキルエステルとしては、アルキルの炭素数が1~3であることが好ましく、例えば、テトラカルボン酸のジメチルエステル、ジエチルエステル、及びジプロピルエステルが挙げられる。テトラカルボン酸又はその誘導体としては、テトラカルボン酸二無水物が好ましい。
本発明における構成単位Aは、下記式(a-1)で表される化合物に由来する構成単位(A-1)を含む。式(a-1)で表される化合物は、ビフェニルテトラカルボン酸二無水物である。構成単位Aが構成単位(A-1)を含むことで、ポリイミドの耐熱性、機械物性(弾性率)、耐有機溶剤性が向上する。 [Constituent unit A]
The constituent unit A contained in the polyimide of the present invention is a constituent unit derived from tetracarboxylic acid or a derivative thereof. The tetracarboxylic acids or their derivatives can be used alone or in combination of two or more.
Derivatives of tetracarboxylic acids include anhydrides or alkyl esters of tetracarboxylic acids. As the alkyl ester of tetracarboxylic acid, the carbon number of alkyl is preferably 1 to 3, and examples thereof include dimethyl ester, diethyl ester and dipropyl ester of tetracarboxylic acid. As a tetracarboxylic acid or its derivative, tetracarboxylic dianhydride is preferable.
The constituent unit A in the present invention includes a constituent unit (A-1) derived from a compound represented by the following formula (a-1). The compound represented by the formula (a-1) is biphenyltetracarboxylic acid dianhydride. When the structural unit A contains the structural unit (A-1), the heat resistance, mechanical properties (elastic modulus) and organic solvent resistance of the polyimide are improved.
s-BPDAは耐有機溶剤性の点で好ましく、a-BPDA及びi-BPDAは耐熱性、溶液加工性の点で好ましい。 Examples of the compound represented by the formula (a-1) include 3,3 ′, 4,4′-biphenyltetracarboxylic acid dianhydride (s-BPDA) represented by the following formula (a-1-1): 2,3,3 ′, 4′-biphenyltetracarboxylic acid dianhydride (a-BPDA) represented by the following formula (a-1-2), and represented by the following formula (a-1-3) 2,2 ', 3,3'-biphenyltetracarboxylic acid dianhydride (i-BPDA) is mentioned, and among them, 3,3', 4,4'- represented by the following formula (a-1-1) Biphenyl tetracarboxylic dianhydride is preferred. The compounds represented by the formula (a-1) can be used alone or in combination of two or more.
s-BPDA is preferable in terms of resistance to organic solvents, and a-BPDA and i-BPDA are preferable in terms of heat resistance and solution processability.
構成単位(A-1)と構成単位(A-2)とのモル比〔(A-1)/(A-2)〕は、低線熱膨張係数、高透明性の観点から、50/50~99/1が好ましく、55/45~95/5がより好ましく、60/40~90/10が更に好ましく、65/35~85/15がより更に好ましく、70/30~80/20がより更に好ましい。 The ratio of the structural unit (A-1) and the structural unit (A-2) to the structural unit A is preferably 50 to 99% by mole of the structural unit (A-1) and 1 to 50 as the structural unit (A-2). %, More preferably 55 to 95 mol% of the structural unit (A-1), 5 to 45 mol% of the structural unit (A-2), and still more preferably 60 to 60 mol% of the structural unit (A-1). -90 mol%, 10-40 mol% of the structural unit (A-2), and still more preferably 65-85 mol% of the structural unit (A-1), 15-35 structural unit (A-2) More preferably, the structural unit (A-1) is 70 to 80 mol%, and the structural unit (A-2) is 20 to 30 mol%.
The molar ratio [(A-1) / (A-2)] of the structural unit (A-1) to the structural unit (A-2) is 50/50 from the viewpoint of low linear thermal expansion coefficient and high transparency. -99/1 is preferable, 55/45 to 95/5 is more preferable, 60/40 to 90/10 is further preferable, 65/35 to 85/15 is still more preferable, 70/30 to 80/20 is more More preferable.
構成単位A中の、構成単位(A-1)及び構成単位(A-2)の合計が占める割合は、低線熱膨張係数、高透明性、耐有機溶剤性の観点から、70モル%以上が好ましく、85モル%以上がより好ましく、99モル%以上が更に好ましく、100モル%がより更に好ましい。 The polyimide according to the present invention can be produced by using the structural unit A as a structural unit other than the structural unit (A-1) and the structural unit (A-2) as long as the effects of the present invention are not impaired. Although the structural unit derived from tetracarboxylic acid or its derivative (s) other than the compound represented by () and the compound represented by Formula (a-2) may be included, it is preferable not to contain.
The proportion of the total of the structural unit (A-1) and the structural unit (A-2) in the structural unit A is 70 mol% or more from the viewpoint of low linear thermal expansion coefficient, high transparency, and organic solvent resistance Is preferably 85 mol% or more, more preferably 99 mol% or more, and still more preferably 100 mol%.
本発明のポリイミドに含まれる構成単位Bは、ジアミンに由来する構成単位である。
前記構成単位Bは、下記式(b-1)で表される化合物に由来する構成単位(B-1)を含有する。 [Constituent unit B]
The structural unit B contained in the polyimide of the present invention is a structural unit derived from a diamine.
The structural unit B contains a structural unit (B-1) derived from a compound represented by the following formula (b-1).
上記式(b-1)で表される化合物としては、9,9-ビス(4-アミノフェニル)フルオレン、9,9-ビス(3-フルオロ-4-アミノフェニル)フルオレン、及び9,9-ビス(3-メチル-4-アミノフェニル)フルオレン等が挙げられ、これら3種の化合物からなる群から選ばれる少なくとも1種が好ましく、9,9-ビス(4-アミノフェニル)フルオレンがより好ましい。
本発明のポリイミドは、前記構成単位(B-1)を含むことによって、透明性及び耐熱性が向上する。
本発明において、構成単位Bに対する構成単位(B-1)の割合は、低線熱膨張係数の観点から、好ましくは50モル%以下、より好ましくは40モル%以下、更に好ましくは35モル%以下、より更に好ましくは30モル%以下であり、より更に好ましくは25モル%以下であり、そして高透明性及び高耐熱性の観点から、好ましくは5モル%以上、より好ましくは10モル%以上、更に好ましくは15モル%以上、より更に好ましくは20モル%以上である。 In Formula (b-1), each R is independently selected from the group consisting of a hydrogen atom, a fluorine atom, and a methyl group, and is preferably a hydrogen atom.
As compounds represented by the above formula (b-1), 9,9-bis (4-aminophenyl) fluorene, 9,9-bis (3-fluoro-4-aminophenyl) fluorene, and 9,9- Bis (3-methyl-4-aminophenyl) fluorene and the like can be mentioned, and at least one selected from the group consisting of these three compounds is preferable, and 9,9-bis (4-aminophenyl) fluorene is more preferable.
The polyimide of the present invention improves the transparency and heat resistance by including the structural unit (B-1).
In the present invention, the ratio of the structural unit (B-1) to the structural unit B is preferably 50 mol% or less, more preferably 40 mol% or less, still more preferably 35 mol% or less from the viewpoint of low linear thermal expansion coefficient Still more preferably 30 mol% or less, still more preferably 25 mol% or less, and in view of high transparency and high heat resistance, preferably 5 mol% or more, more preferably 10 mol% or more. More preferably, it is 15 mol% or more, still more preferably 20 mol% or more.
本発明のポリイミドは、前記構成単位(B-2)を含むことによって、機械物性(弾性率)が向上し、低線熱膨張係数を有するフィルムを形成することができる。
本発明において、構成単位Bに対する前記構成単位(B-2)の割合は、高透明性及び高耐熱性を維持しつつ、低線熱膨張係数を有するフィルムを形成する観点から、好ましくは50モル%以上、より好ましくは60モル%以上、更に好ましくは65モル%以上、より更に好ましくは70モル%以上、より更に好ましくは75モル%以上であり、そして好ましくは95モル%以下、より好ましくは90モル%以下、更に好ましくは85モル%以下、より更に好ましくは80モル%以下である。 The compound represented by the above formula (b-2) is 2,2'-bis (trifluoromethyl) benzidine (alias: 4,4'-diamino-2,2'-bis (trifluoromethyl) biphenyl) is there.
By including the structural unit (B-2), the polyimide of the present invention can improve mechanical properties (elastic modulus) and form a film having a low linear thermal expansion coefficient.
In the present invention, the ratio of the structural unit (B-2) to the structural unit B is preferably 50 moles from the viewpoint of forming a film having a low linear thermal expansion coefficient while maintaining high transparency and high heat resistance. %, More preferably 60 mol% or more, still more preferably 65 mol% or more, still more preferably 70 mol% or more, still more preferably 75 mol% or more, and preferably 95 mol% or less, more preferably It is 90 mol% or less, more preferably 85 mol% or less, still more preferably 80 mol% or less.
構成単位(B-1)と構成単位(B-2)とのモル比〔(B-1)/(B-2)〕は、高透明性及び高耐熱性を維持しつつ、低線熱膨張係数を有するフィルムを形成する観点から、50/50~5/95が好ましく、40/60~10/90がより好ましく、35/65~15/85が更に好ましく、30/70~15/85がより更に好ましく、25/75~20/80がより更に好ましい。 The ratio of the structural units (B-1) and (B-2) to the structural unit B is preferably 5 to 50 mol% of the structural unit (B-1) and 50 to 95 mol% of the structural unit (B-2) More preferably, the structural unit (B-1) is 10 to 40 mol%, the structural unit (B-2) is 60 to 90 mol%, and still more preferably the structural unit (B-1) is 15 to 35 Mol%, the structural unit (B-2) is 65 to 85 mol%, more preferably 15 to 30 mol% of the structural unit (B-1), 70 to 85 mol% of the structural unit (B-2) More preferably, the structural unit (B-1) is 20 to 25 mol%, and the structural unit (B-2) is 75 to 80 mol%.
The molar ratio [(B-1) / (B-2)] of the structural unit (B-1) to the structural unit (B-2) has low linear thermal expansion while maintaining high transparency and high heat resistance. From the viewpoint of forming a film having a coefficient, 50/50 to 5/95 is preferable, 40/60 to 10/90 is more preferable, 35/65 to 15/85 is more preferable, and 30/70 to 15/85 is Still more preferred is 25/75 to 20/80.
構成単位B中の、構成単位(B-1)及び構成単位(B-2)の合計が占める割合は、高透明性及び高耐熱性を維持しつつ、低線熱膨張係数を有するフィルムを形成する観点から、70モル%以上が好ましく、85モル%以上がより好ましく、99モル%以上が更に好ましく、100モル%がより更に好ましい。 The polyimide of the present invention contains a structural unit derived from a diamine other than the compounds represented by the formulas (b-1) to (b-2) in the structural unit B, as long as the effects of the present invention are not impaired. Although it may be contained, it is preferable not to contain.
The ratio of the total of the structural unit (B-1) and the structural unit (B-2) in the structural unit B forms a film having a low linear thermal expansion coefficient while maintaining high transparency and high heat resistance. In light of the above, 70 mol% or more is preferable, 85 mol% or more is more preferable, 99 mol% or more is more preferable, and 100 mol% is still more preferable.
本発明のポリイミドは、構成単位Aを与えるテトラカルボン酸成分と構成単位Bを与えるジアミン成分を反応させることにより得られる。 [Method of producing polyimide]
The polyimide of the present invention can be obtained by reacting the tetracarboxylic acid component giving the constitutional unit A and the diamine component giving the constitutional unit B.
テトラカルボン酸の誘導体としては、該テトラカルボン酸の無水物又はアルキルエステルが挙げられる。
テトラカルボン酸のアルキルエステルとしては、アルキルの炭素数が1~3であることが好ましく、例えば、テトラカルボン酸のジメチルエステル、ジエチルエステル、及びジプロピルエステルが挙げられる。
本発明で使用されるテトラカルボン酸成分は、ビフェニルテトラカルボン酸又はその誘導体、及び4,4’-(ヘキサフルオロイソプロピリデン)ジフタル酸又はその誘導体を含む。中でも、ビフェニルテトラカルボン酸二無水物〔上記式(a-1)〕及び4,4’-(ヘキサフルオロイソプロピリデン)ジフタル酸無水物〔上記式(a-2)〕を含むことが好ましく、3,3’,4,4’-ビフェニルテトラカルボン酸二無水物〔上記式(a-1-1)〕、及び4,4’-(ヘキサフルオロイソプロピリデン)ジフタル酸無水物を含むことがより好ましい。 Examples of the tetracarboxylic acid component include tetracarboxylic acids or their derivatives. The tetracarboxylic acid components can be used alone or in combination of two or more.
Derivatives of tetracarboxylic acids include anhydrides or alkyl esters of the tetracarboxylic acids.
As the alkyl ester of tetracarboxylic acid, the carbon number of alkyl is preferably 1 to 3, and examples thereof include dimethyl ester, diethyl ester and dipropyl ester of tetracarboxylic acid.
The tetracarboxylic acid component used in the present invention includes biphenyl tetracarboxylic acid or its derivative, and 4,4 '-(hexafluoroisopropylidene) diphthalic acid or its derivative. Among them, biphenyltetracarboxylic acid dianhydride [the above formula (a-1)] and 4,4 ′-(hexafluoroisopropylidene) diphthalic anhydride [the above formula (a-2)] are preferably included, 3 It is more preferable to contain 4,3 ′, 4,4′-biphenyltetracarboxylic acid dianhydride [formula (a-1-1)] and 4,4 ′-(hexafluoroisopropylidene) diphthalic anhydride .
4,4’-(ヘキサフルオロイソプロピリデン)ジフタル酸又はその誘導体の使用量は、全テトラカルボン酸成分に対して、好ましくは1~50モル%、より好ましくは5~45モル%、更に好ましくは10~40モル%、より更に好ましくは15~35モル%、より更に好ましくは20~30モル%である。
ビフェニルテトラカルボン酸、及び4,4’-(ヘキサフルオロイソプロピリデン)ジフタル酸、及びそれらの誘導体の合計使用量は、全テトラカルボン酸成分に対して、好ましくは70~100モル%、より好ましくは85~100モル%、更に好ましくは99~100モル%、より更に好ましくは100モル%である。 The amount of the biphenyltetracarboxylic acid or derivative thereof used is preferably 50 to 99 mol%, more preferably 55 to 95 mol%, still more preferably 60 to 90 mol%, still more preferably, relative to all tetracarboxylic acid components. Is more preferably 65 to 85 mol%, still more preferably 70 to 80 mol%.
The amount of 4,4 '-(hexafluoroisopropylidene) diphthalic acid or a derivative thereof to be used is preferably 1 to 50 mol%, more preferably 5 to 45 mol%, still more preferably 1 to 50 mol%, relative to all tetracarboxylic acid components. It is 10 to 40% by mole, more preferably 15 to 35% by mole, still more preferably 20 to 30% by mole.
The total amount of biphenyltetracarboxylic acid, 4,4 '-(hexafluoroisopropylidene) diphthalic acid, and derivatives thereof to be used is preferably 70 to 100 mol%, more preferably 70 to 100 mol%, based on all tetracarboxylic acid components. It is 85 to 100 mol%, more preferably 99 to 100 mol%, still more preferably 100 mol%.
脂環式炭化水素構造及び芳香環をいずれも含まないテトラカルボン酸又はその誘導体としては、1,2,3,4-ブタンテトラカルボン酸、1,2,3,4-ペンタンテトラカルボン酸等又はそれらの誘導体が挙げられる。 Examples of tetracarboxylic acids containing an alicyclic hydrocarbon structure or derivatives thereof include 1,2,3,4-cyclobutane tetracarboxylic acid, 1,2,4,5-cyclopentane tetracarboxylic acid, 1,2,4, 5-cyclohexanetetracarboxylic acid, bicyclo [2.2.2] octa-7-ene-2,3,5,6-tetracarboxylic acid, dicyclohexyltetracarboxylic acid, cyclopentanone bis-spironorbornane tetracarboxylic acid or their compounds Regioisomers and their derivatives are included.
As a tetracarboxylic acid or derivative thereof which does not contain any of the alicyclic hydrocarbon structure and the aromatic ring, 1,2,3,4-butanetetracarboxylic acid, 1,2,3,4-pentanetetracarboxylic acid, etc. or These derivatives are mentioned.
上記式(b-1)で表される化合物の使用量は、全ジアミン成分に対して、好ましくは5~50モル%であり、より好ましくは10~40モル%、更に好ましくは10~35モル%、より更に好ましくは15~30モル%、より更に好ましくは15~25モル%、より更に好ましくは20~25モル%である。
2,2’-ビス(トリフルオロメチル)ベンジジンの使用量は、全ジアミン成分に対して、好ましくは50~95モル%であり、より好ましくは60~90モル%、更に好ましくは65~90モル%、より更に好ましくは70~85モル%、より更に好ましくは75~85モル%、より更に好ましくは75~80モル%である。
上記式(b-1)で表される化合物、及び2,2’-ビス(トリフルオロメチル)ベンジジンの合計使用量は、全ジアミン成分に対して、好ましくは70~100モル%、より好ましくは85~100モル%、更に好ましくは99~100モル%、より更に好ましくは100モル%である。 The diamine component used in the present invention includes the compound represented by the above formula (b-1) and 2,2′-bis (trifluoromethyl) benzidine [the above formula (b-2)]. In addition, as a diamine component which gives the structural unit B, it is not restricted to a diamine, Although the derivative (diisocyanate etc.) may be sufficient in the range in which the same structural unit is formed, a diamine is preferable.
The amount of the compound represented by the above formula (b-1) is preferably 5 to 50 mol%, more preferably 10 to 40 mol%, still more preferably 10 to 35 mol based on all diamine components. %, Still more preferably 15 to 30 mol%, still more preferably 15 to 25 mol%, still more preferably 20 to 25 mol%.
The amount of 2,2'-bis (trifluoromethyl) benzidine used is preferably 50 to 95 mol%, more preferably 60 to 90 mol%, still more preferably 65 to 90 mol based on the total diamine components. %, Still more preferably 70 to 85 mol%, still more preferably 75 to 85 mol%, still more preferably 75 to 80 mol%.
The total amount of the compound represented by the above formula (b-1) and 2,2′-bis (trifluoromethyl) benzidine is preferably 70 to 100 mol%, more preferably about all diamine components. It is 85 to 100 mol%, more preferably 99 to 100 mol%, still more preferably 100 mol%.
なお、“芳香族ジアミン”とは、アミノ基が芳香族環に直接結合しているジアミンを表し、その構造の一部に脂肪族炭化水素基、脂環式炭化水素基、芳香族炭化水素基、その他の置換基(例えば、ハロゲン原子、スルホニル基、カルボニル基、酸素原子等。)を含んでいてもよい。“脂肪族ジアミン”とは、アミノ基が脂肪族炭化水素基又は脂環式炭化水素基に直接結合しているジアミンを表し、その構造の一部に芳香族炭化水素基、脂肪族炭化水素基、脂環式炭化水素基、その他の置換基(例えば、ハロゲン原子、スルホニル基、カルボニル基、酸素原子等。)を含んでいてもよい。 Furthermore, the diamine component used in the present invention may contain a diamine component other than the compound represented by the above formula (b-1) and 2,2′-bis (trifluoromethyl) benzidine. Examples of the diamine component include at least one selected from the group consisting of aromatic diamines and aliphatic diamines. The diamine components can be used alone or in combination of two or more.
The term "aromatic diamine" refers to a diamine in which an amino group is directly bonded to an aromatic ring, and an aliphatic hydrocarbon group, an alicyclic hydrocarbon group or an aromatic hydrocarbon group as part of the structure thereof And other substituents (for example, a halogen atom, a sulfonyl group, a carbonyl group, an oxygen atom, etc.) may be included. The term "aliphatic diamine" refers to a diamine in which an amino group is directly bonded to an aliphatic hydrocarbon group or an alicyclic hydrocarbon group, and an aromatic hydrocarbon group or aliphatic hydrocarbon group as part of its structure And alicyclic hydrocarbon groups and other substituents (for example, halogen atoms, sulfonyl groups, carbonyl groups, oxygen atoms, etc.) may be contained.
具体的な反応方法としては、(1)テトラカルボン酸成分、ジアミン成分、及び反応溶剤を反応器に仕込み、室温~80℃で0.5~30時間撹拌し、その後に昇温してイミド化反応を行う方法、(2)ジアミン成分及び反応溶剤を反応器に仕込んで溶解させた後、テトラカルボン酸成分を仕込み、必要に応じて室温~80℃で0.5~30時間撹拌し、その後に昇温してイミド化反応を行う方法、(3)テトラカルボン酸成分、ジアミン成分、及び反応溶剤を反応器に仕込み、直ちに昇温してイミド化反応を行う方法等が挙げられる。 There is no restriction | limiting in particular in the method to which the above-mentioned tetracarboxylic acid component and a diamine component are made to react, A well-known method can be used.
As a specific reaction method, (1) a tetracarboxylic acid component, a diamine component, and a reaction solvent are charged in a reactor, and stirred at room temperature to 80 ° C. for 0.5 to 30 hours, and then heated to imidation Method for carrying out the reaction, (2) The diamine component and the reaction solvent are charged into the reactor and dissolved, and then the tetracarboxylic acid component is charged, and if necessary, stirred for 0.5 to 30 hours at room temperature to 80 ° C. (3) The tetracarboxylic acid component, the diamine component, and the reaction solvent are charged into a reactor, and the temperature is raised immediately to perform the imidization reaction.
エーテル系溶剤の具体例としては、1,2-ジメトキシエタン、ビス(2-メトキシエチル)エーテル、1,2-ビス(2-メトキシエトキシ)エタン、ビス〔2-(2-メトキシエトキシ)エチル〕エーテル、テトラヒドロフラン、1,4-ジオキサン等が挙げられる。
また、カーボネート系溶剤の具体的な例としては、ジエチルカーボネート、メチルエチルカーボネート、エチレンカーボネート、プロピレンカーボネート等が挙げられる。
上記反応溶剤の中でも、非プロトン性溶剤が好ましく、アミド系溶剤又はラクトン系溶剤がより好ましい。また、上記の反応溶剤は単独で又は2種以上混合して用いてもよい。 Specific examples of phenolic solvents include phenol, o-cresol, m-cresol, p-cresol, 2,3-xylenol, 2,4-xylenol, 2,5-xylenol, 2,6-xylenol, 3,4 -Xylenol, 3,5-xylenol and the like.
Specific examples of ether solvents include 1,2-dimethoxyethane, bis (2-methoxyethyl) ether, 1,2-bis (2-methoxyethoxy) ethane, bis [2- (2-methoxyethoxy) ethyl] Ether, tetrahydrofuran, 1,4-dioxane and the like can be mentioned.
Moreover, diethyl carbonate, methyl ethyl carbonate, ethylene carbonate, a propylene carbonate etc. are mentioned as a specific example of a carbonate type solvent.
Among the above reaction solvents, aprotic solvents are preferable, and amide solvents or lactone solvents are more preferable. The above reaction solvents may be used alone or in combination of two or more.
塩基触媒としては、ピリジン、キノリン、イソキノリン、α-ピコリン、β-ピコリン、2,4-ルチジン、2,6-ルチジン、トリメチルアミン、トリエチルアミン、トリプロピルアミン、トリブチルアミン、イミダゾール、N,N-ジメチルアニリン、N,N-ジエチルアニリン等の有機塩基触媒、水酸化カリウム、水酸化ナトリウム、炭酸カリウム、炭酸ナトリウム、炭酸水素カリウム、炭酸水素ナトリウム等の無機塩基触媒が挙げられる。
また、酸触媒としては、クロトン酸、アクリル酸、トランス-3-ヘキセノイック酸、桂皮酸、安息香酸、メチル安息香酸、オキシ安息香酸、テレフタル酸、ベンゼンスルホン酸、パラトルエンスルホン酸、ナフタレンスルホン酸等が挙げられる。上記のイミド化触媒は単独で又は2種以上を組み合わせて用いてもよい。
上記のうち、取り扱い性の観点から、塩基触媒が好ましく、有機塩基触媒がより好ましく、トリエチルアミンが更に好ましい。 A known imidization catalyst can be used in the above imidization reaction. The imidation catalyst includes a base catalyst or an acid catalyst.
As a base catalyst, pyridine, quinoline, isoquinoline, α-picoline, β-picoline, 2,4-lutidine, 2,6-lutidine, trimethylamine, triethylamine, tripropylamine, tributylamine, imidazole, N, N-dimethylaniline And organic base catalysts such as N, N-diethylaniline, and inorganic base catalysts such as potassium hydroxide, sodium hydroxide, potassium carbonate, sodium carbonate, potassium hydrogen carbonate and sodium hydrogen carbonate.
Moreover, as an acid catalyst, crotonic acid, acrylic acid, trans-3-hexenoic acid, cinnamic acid, benzoic acid, methylbenzoic acid, oxybenzoic acid, terephthalic acid, benzenesulfonic acid, paratoluenesulfonic acid, naphthalenesulfonic acid, etc. Can be mentioned. The above imidation catalysts may be used alone or in combination of two or more.
Among the above, from the viewpoint of handleability, a base catalyst is preferable, an organic base catalyst is more preferable, and triethylamine is more preferable.
なお、触媒を用いない場合のイミド化反応の温度は、好ましくは200~350℃である。
ジアミン成分とテトラカルボン酸成分との反応において、イミド化反応終了後に、ポリイミド及び反応溶剤を少なくとも含むポリイミド溶液を得ることができる。 When the above catalyst is used, the temperature of the imidization reaction is preferably 120 to 250 ° C., more preferably 160 to 190 ° C., and still more preferably 180 to 190 ° C. from the viewpoint of reaction rate and suppression of gelation etc. is there. The reaction time is preferably 0.5 to 10 hours after the start of distillation of the produced water.
The temperature of the imidation reaction when no catalyst is used is preferably 200 to 350.degree.
In the reaction of the diamine component and the tetracarboxylic acid component, a polyimide solution containing at least a polyimide and a reaction solvent can be obtained after completion of the imidization reaction.
本発明のポリイミドの重量平均分子量は、得られるポリイミドフィルムの機械的強度の観点から、好ましくは500~1,000,000、より好ましくは5,000~100,000である。なお、ポリイミドの重量平均分子量は、ゲルろ過クロマトグラフィー等により測定することができる。
重量平均分子量の測定例として、展開溶媒にN,N-ジメチルホルムアミドを用いて光散乱検出器で絶対分子量を測定する方法が挙げられる。 [Polyimide]
The weight average molecular weight of the polyimide of the present invention is preferably 500 to 1,000,000, more preferably 5,000 to 100,000, from the viewpoint of the mechanical strength of the resulting polyimide film. The weight average molecular weight of the polyimide can be measured by gel filtration chromatography or the like.
As an example of measurement of weight average molecular weight, a method of measuring an absolute molecular weight with a light scattering detector using N, N-dimethylformamide as a developing solvent can be mentioned.
高分子化合物としては、本発明のポリイミド以外のポリイミド、ポリカーボネート、ポリスチレン、ポリアミド、ポリアミドイミド、ポリエチレンテレフタレート等のポリエステル、ポリエーテルスルホン、ポリカルボン酸、ポリアセタール、ポリフェニレンエーテル、ポリスルホン、ポリブチレン、ポリプロピレン、ポリアクリルアミド、ポリ塩化ビニル等が挙げられる。 The polyimide of the present invention may further be mixed with various additives as long as the effects of the present invention are not impaired. Examples of the additive include an antioxidant, a light stabilizer, a surfactant, a flame retardant, a plasticizer, an inorganic filler, and a polymer compound other than the polyimide.
As the polymer compound, polyimide other than the polyimide of the present invention, polycarbonate, polystyrene, polyamide, polyamide imide, polyester such as polyethylene terephthalate, polyether sulfone, polycarboxylic acid, polyacetal, polyphenylene ether, polysulfone, polybutylene, polypropylene, polyacrylamide And polyvinyl chloride.
本発明のポリイミドワニスは、本発明のポリイミドが有機溶媒に溶解してなるものである。即ち、本発明のポリイミドワニスは、本発明のポリイミド及び有機溶媒を含み、当該ポリイミドは当該有機溶媒に溶解している。
有機溶媒はポリイミドが溶解するものであればよく、特に限定されないが、ポリイミドの製造に用いられる反応溶剤として上述した化合物を、単独又は2種以上を混合して用いることが好ましい。
本発明のポリイミドは溶媒溶解性を有しているため、室温で安定な高濃度のワニスとすることができる。 [Polyimide varnish]
The polyimide varnish of the present invention is obtained by dissolving the polyimide of the present invention in an organic solvent. That is, the polyimide varnish of the present invention contains the polyimide of the present invention and an organic solvent, and the polyimide is dissolved in the organic solvent.
The organic solvent is not particularly limited as long as it dissolves the polyimide, but it is preferable to use one or more of the compounds described above as the reaction solvent used for producing the polyimide.
Since the polyimide of the present invention has solvent solubility, it can be a highly concentrated varnish stable at room temperature.
本発明のポリイミドワニスの固形分濃度は、後述するポリイミドフィルムを形成する際の作業性等に応じて適宜選択することができ、本発明のポリイミドの製造に用いられる反応溶剤を揮発させて凝縮する、または、希釈溶剤として有機溶媒を添加することにより本発明のポリイミドワニスの固形分濃度や粘度を調整してもよい。該有機溶剤は、ポリイミドを溶解させることができるものであれば特に限定されない。
本発明のポリイミドワニスの固形分濃度は5~45質量%が好ましく、5~35質量%がより好ましく、5~25質量%が更に好ましい。本発明のポリイミドワニスの粘度は0.1~200Pa・sが好ましく、0.5~180Pa・sがより好ましく、1~150Pa・sが更に好ましい。ポリイミドワニスの粘度は、E型粘度計を用いて25℃で測定された値である。 The polyimide varnish may be a polyimide solution itself in which a polyimide obtained by a polymerization method is dissolved in a reaction solvent. Moreover, what mixed at least 1 sort (s) chosen from the solvent illustrated above as a solvent which a polyimide melt | dissolves with respect to the said polyimide solution may be used.
The solid content concentration of the polyimide varnish of the present invention can be appropriately selected according to the workability at the time of forming a polyimide film to be described later, etc., and the reaction solvent used for producing the polyimide of the present invention is volatilized and condensed. Alternatively, the solid content concentration and viscosity of the polyimide varnish of the present invention may be adjusted by adding an organic solvent as a dilution solvent. The organic solvent is not particularly limited as long as it can dissolve polyimide.
The solid content concentration of the polyimide varnish of the present invention is preferably 5 to 45% by mass, more preferably 5 to 35% by mass, and still more preferably 5 to 25% by mass. The viscosity of the polyimide varnish of the present invention is preferably 0.1 to 200 Pa · s, more preferably 0.5 to 180 Pa · s, and still more preferably 1 to 150 Pa · s. The viscosity of the polyimide varnish is a value measured at 25 ° C. using an E-type viscometer.
本発明のポリイミドフィルムは、本発明のポリイミドを含むことを特徴とし、高透明性及び高耐熱性を維持しつつ、低線熱膨張係数を有する。本発明のポリイミドフィルムは、本発明のポリイミドからなることが好ましい。
本発明のポリイミドフィルムの作製方法には特に制限はなく、公知の方法を用いることができる。例えば、本発明のポリイミドを含むポリイミドワニス、又は本発明のポリイミドと既述の種々の添加剤とを含むポリイミドワニスを、ガラス板、金属板、プラスチックなどの平滑な支持体上に塗布、又はフィルム状に成形した後、該ワニス中に含まれる反応溶剤や希釈溶剤等の溶媒成分を除去する方法等が挙げられる。
上記のようにポリイミドワニスの固形分濃度や粘度を調整することにより、本発明のポリイミドフィルムの厚さを容易に制御することができる。 [Polyimide film]
The polyimide film of the present invention is characterized by containing the polyimide of the present invention, and has a low linear thermal expansion coefficient while maintaining high transparency and high heat resistance. The polyimide film of the present invention preferably comprises the polyimide of the present invention.
There is no restriction | limiting in particular in the preparation method of the polyimide film of this invention, A well-known method can be used. For example, a polyimide varnish containing the polyimide of the present invention, or a polyimide varnish containing the polyimide of the present invention and the various additives described above, is coated on a smooth support such as a glass plate, metal plate or plastic, or a film And the like, and a method of removing solvent components such as a reaction solvent and a dilution solvent contained in the varnish.
By adjusting the solid content concentration and viscosity of the polyimide varnish as described above, the thickness of the polyimide film of the present invention can be easily controlled.
本発明では、イエローインデックス(YI値)が好ましくは6.0以下、より好ましくは5.0以下、更に好ましくは4.5以下のポリイミドフィルムを形成することができる。
本発明では、ヘイズが好ましくは1.0以下、より好ましくは0.8以下、更に好ましくは0.5以下のポリイミドフィルムを形成することができる。
本発明では、ガラス転移温度が好ましくは250℃以上、より好ましくは300℃以上、更に好ましくは350℃以上のポリイミドフィルムを形成することができる。 In the present invention, a polyimide film having a total light transmittance of preferably 80% or more, more preferably 85% or more, still more preferably 88% or more, still more preferably 89% or more at a thickness of 10 μm can be formed.
In the present invention, a polyimide film having a yellow index (YI value) of preferably 6.0 or less, more preferably 5.0 or less, and still more preferably 4.5 or less can be formed.
In the present invention, a polyimide film having a haze of preferably 1.0 or less, more preferably 0.8 or less, and even more preferably 0.5 or less can be formed.
In the present invention, a polyimide film having a glass transition temperature of preferably 250 ° C. or more, more preferably 300 ° C. or more, still more preferably 350 ° C. or more can be formed.
本発明では、引張弾性率(測定温度23℃、湿度50%RH)が好ましくは3.0GPa以上、より好ましくは3.5GPa以上、のポリイミドフィルムを形成することができる。
ポリイミドフィルムの全光線透過率、YI値、ヘイズ、ガラス転移温度、線熱膨張係数、及び引張弾性率は、具体的には実施例に記載の方法で測定することができる。 In the present invention, a polyimide film having a linear thermal expansion coefficient of preferably 40 ppm / ° C. or less, more preferably 35 ppm / ° C. or less, further preferably 30 ppm / ° C. or less can be formed.
In the present invention, a polyimide film having a tensile elastic modulus (measurement temperature: 23 ° C., humidity: 50% RH) of preferably 3.0 GPa or more, more preferably 3.5 GPa or more can be formed.
The total light transmittance, the YI value, the haze, the glass transition temperature, the linear thermal expansion coefficient, and the tensile modulus of elasticity of the polyimide film can be specifically measured by the method described in the examples.
下記実施例及び比較例で得たポリイミドワニス、ポリイミド前駆体ワニス及びポリイミドフィルムの物性は以下に示す方法によって測定した。 The present invention will be specifically described by way of the following examples. However, the present invention is not limited at all by these examples.
Physical properties of the polyimide varnish, the polyimide precursor varnish and the polyimide film obtained in the following Examples and Comparative Examples were measured by the methods shown below.
ポリイミドワニス又はポリイミド前駆体ワニスの固形分濃度の測定は、アズワン株式会社製、小型電気炉MMF-1で試料を320℃×120minで加熱し、加熱前後の試料の質量差から算出した。
(2)フィルム厚さ:
ポリイミドフィルム厚さの測定は、株式会社ミツトヨ製、マイクロメーターを用いて測定した。 (1) Solid content concentration:
The solid content concentration of the polyimide varnish or the polyimide precursor varnish was measured by heating the sample at 320 ° C. for 120 minutes in a small electric furnace MMF-1 manufactured by As One Co., Ltd., and calculating from the mass difference of the sample before and after heating.
(2) Film thickness:
The polyimide film thickness was measured using a micrometer manufactured by Mitutoyo Corporation.
測定はJIS K7127に準拠し、東洋精機株式会社製 引張試験機「ストログラフVG-1E」を用いて、測定温度23℃、湿度50%RH、チャック間距離50mm、引張速度50mm/分の条件で引張試験を実施し、引張弾性率を求めた。
(4)ガラス転移温度(Tg)
株式会社日立ハイテクサイエンス製の示差走査熱量計装置「DSC6200」を用い、昇温速度10℃/minの条件でDSC測定を行い、ガラス転移温度を求めた。 (3) Tensile modulus According to JIS K7127, the measurement temperature is 23 ° C., the humidity is 50% RH, the distance between chucks is 50 mm, and the tensile speed is measured using a tensile tester “Strograph VG-1E” manufactured by Toyo Seiki Co., Ltd. A tensile test was performed under the condition of 50 mm / min to determine the tensile modulus.
(4) Glass transition temperature (Tg)
Using a differential scanning calorimeter “DSC 6200” manufactured by Hitachi High-Tech Science Co., Ltd., DSC measurement was performed at a temperature rising rate of 10 ° C./min to determine the glass transition temperature.
日本電色工業株式会社製 色彩・濁度同時測定器「COH400」を用いて行った。全光線透過率及びYIの測定はJIS K7361-1:1997に準拠し、ヘイズの測定は、JIS K7136:2000に準拠した。
(6)線熱膨張係数(CTE)
株式会社日立ハイテクサイエンス製の熱機械的分析装置(TMA/SS6100)を用いて、引張モードで試料サイズ2mm×20mm、荷重0.1N、昇温速度10℃/minの条件でTMA測定を行い、100~250℃のCTEを求めた。CTE値が0に近いほど寸法安定性に優れていることを表す。 (5) Total light transmittance, yellow index (YI), haze It carried out using Nippon Denshoku Kogyo Co., Ltd. color and turbidity simultaneous measurement apparatus "COH400". The measurement of total light transmittance and YI conformed to JIS K7361-1: 1997, and the measurement of haze conformed to JIS K7136: 2000.
(6) Linear thermal expansion coefficient (CTE)
Using a thermo-mechanical analyzer (TMA / SS6100) manufactured by Hitachi High-Tech Science Co., Ltd., perform TMA measurement under the conditions of sample size 2 mm × 20 mm, load 0.1 N, heating rate 10 ° C / min in tensile mode, The CTE at 100 to 250 ° C. was determined. The closer the CTE value to 0, the better the dimensional stability.
ステンレス製半月型撹拌翼、窒素導入管、冷却管を取り付けたディーンスターク装置、温度計、ガラス製エンドキャップを備えた5つ口丸底フラスコに、2,2’-ビス(トリフルオロメチル)ベンジジン(和歌山精化工業株式会社製)29.462g(0.092モル)、9,9-ビス(4-アミノフェニル)フルオレン(田岡化学工業株式会社製)8.014g(0.023モル)、N-メチル-2-ピロリドン(三菱ケミカル株式会社製)111.263gを投入し、系内温度70℃、窒素雰囲気下、回転数200rpmで撹拌して溶液を得た。
この溶液に、3,3’,4,4’-ビフェニルテトラカルボン酸二無水物(三菱ケミカル株式会社製)27.066g(0.092モル)、4,4’-(ヘキサフルオロイソプロピリデン)ジフタル酸無水物(ダイキン工業株式会社製)10.218g(0.023モル)とN-メチル-2-ピロリドン(三菱ケミカル株式会社製)27.816gを一括で添加した後、イミド化触媒としてトリエチルアミン(関東化学株式会社製)0.582gを投入し、マントルヒーターで加熱し、約20分かけて反応系内温度を190℃まで上げた。留去される成分を捕集し、回転数を粘度上昇に合わせて調整しつつ、反応系内温度を190℃に保持して1時間30分還流した。
その後、N-メチル-2-ピロリドン(三菱ケミカル株式会社製)512.54gを添加して、反応系内温度を120℃まで冷却した後、更に約3時間撹拌して均一化し、固形分濃度10質量%のポリイミドを含む溶液(ポリイミドワニス)を得た。続いてガラス板上へ、得られたポリイミドワニスを塗布し、ホットプレートで80℃、30分間保持し、その後、窒素パージ下、熱風乾燥機中300℃で30分加熱し溶媒を蒸発させ、厚み10μmのフィルムを得た。結果を表1に示す。 Example 1
Stainless steel half-moon-type stirring blade, nitrogen introduction pipe, Dean Stark device equipped with a cooling pipe, thermometer, 5-neck round bottom flask equipped with a glass end cap, 2, 2 '-bis (trifluoromethyl) benzidine 29.462 g (0.092 mol) (manufactured by Wakayama Seika Kogyo Co., Ltd.), 8.014 g (0.023 mol) of 9,9-bis (4-aminophenyl) fluorene (manufactured by Taoka Chemical Industry Co., Ltd.), N 111.263 g of methyl-2-pyrrolidone (manufactured by Mitsubishi Chemical Corporation) was charged, and the solution was obtained by stirring at a rotation speed of 200 rpm under a nitrogen atmosphere at a system temperature of 70 ° C.
In this solution, 27.066 g (0.092 mol) of 3,3 ', 4,4'-biphenyltetracarboxylic acid dianhydride (manufactured by Mitsubishi Chemical Corporation), 4,4'-(hexafluoroisopropylidene) diphthalic acid After collectively adding 10.218 g (0.023 mol) of acid anhydride (manufactured by Daikin Industries, Ltd.) and 27.816 g of N-methyl-2-pyrrolidone (manufactured by Mitsubishi Chemical Co., Ltd.), triethylamine (imidation catalyst) 0.582 g of Kanto Chemical Co., Ltd. (manufactured by Kanto Chemical Co., Ltd.) was charged, and heated with a mantle heater, and the temperature in the reaction system was raised to 190 ° C. over about 20 minutes. The components to be distilled off were collected, and the temperature inside the reaction system was maintained at 190 ° C. and refluxed for 1 hour and 30 minutes while adjusting the number of revolutions in accordance with the increase in viscosity.
Thereafter, 51.54 g of N-methyl-2-pyrrolidone (manufactured by Mitsubishi Chemical Corporation) is added, the reaction system internal temperature is cooled to 120 ° C., and the mixture is further stirred for about 3 hours for homogenization, solid content concentration 10 The solution (polyimide varnish) containing the mass% polyimide was obtained. Subsequently, the obtained polyimide varnish is applied onto a glass plate, held at 80 ° C. for 30 minutes with a hot plate, and then heated at 300 ° C. for 30 minutes in a hot air dryer under nitrogen purge to evaporate the solvent A film of 10 μm was obtained. The results are shown in Table 1.
ステンレス製半月型撹拌翼、窒素導入管、冷却管を取り付けたディーンスターク装置、温度計、ガラス製エンドキャップを備えた5つ口丸底フラスコに、2,2’-ビス(トリフルオロメチル)ベンジジン(和歌山精化工業株式会社製)19.685g(0.061モル)、9,9-ビス(4-アミノフェニル)フルオレン(田岡化学工業株式会社製)5.343g(0.015モル)、N-メチル-2-ピロリドン(三菱ケミカル株式会社製)75.897gを投入し、系内温度70℃、窒素雰囲気下、回転数200rpmで撹拌して溶液を得た。
この溶液に、3,3’,4,4’-ビフェニルテトラカルボン酸二無水物(三菱ケミカル株式会社製)15.789g(0.054モル)、4,4’-(ヘキサフルオロイソプロピリデン)ジフタル酸無水物(ダイキン工業株式会社製)10.218g(0.023モル)とN-メチル-2-ピロリドン(三菱ケミカル株式会社製)18.974gを一括で添加した後、イミド化触媒としてトリエチルアミン(関東化学株式会社製)0.388gを投入し、マントルヒーターで加熱し、約20分かけて反応系内温度を190℃まで上げた。留去される成分を捕集し、回転数を粘度上昇に合わせて調整しつつ、反応系内温度を190℃に保持して3時間10分還流した。
その後、N-メチル-2-ピロリドン(三菱ケミカル株式会社製)349.97gを添加して、反応系内温度を120℃まで冷却した後、更に約3時間撹拌して均一化し、固形分濃度10質量%のポリイミドワニスを得た。続いてガラス板上へ、得られたポリイミドワニスを塗布し、ホットプレートで80℃、30分間保持し、その後、窒素パージ下、熱風乾燥機中300℃で30分加熱し溶媒を蒸発させ、厚み10μmのフィルムを得た。結果を表1に示す。 Example 2
Stainless steel half-moon-type stirring blade, nitrogen introduction pipe, Dean Stark device equipped with a cooling pipe, thermometer, 5-neck round bottom flask equipped with a glass end cap, 2, 2 '-bis (trifluoromethyl) benzidine 19.685 g (0.061 mol) (manufactured by Wakayama Seika Kogyo Co., Ltd.), 5.343 g (0.015 mol) of 9,9-bis (4-aminophenyl) fluorene (manufactured by Taoka Chemical Industry Co., Ltd.), N 75.897 g of methyl-2-pyrrolidone (manufactured by Mitsubishi Chemical Corporation) was charged, and the solution was obtained by stirring at a rotation speed of 200 rpm under a nitrogen atmosphere at a system temperature of 70 ° C.
In this solution, 15.789 g (0.054 mol) of 3,3 ', 4,4'-biphenyltetracarboxylic acid dianhydride (manufactured by Mitsubishi Chemical Corporation), 4,4'-(hexafluoroisopropylidene) diphthalic acid. After adding 10.218 g (0.023 mol) of acid anhydride (manufactured by Daikin Industries, Ltd.) and 18.974 g of N-methyl-2-pyrrolidone (manufactured by Mitsubishi Chemical Co., Ltd.) at once, triethylamine (as an imidization catalyst) 0.388 g of Kanto Chemical Co., Ltd. (manufactured by Kanto Chemical Co., Ltd.) was charged, and heated with a mantle heater, and the temperature in the reaction system was raised to 190 ° C. over about 20 minutes. The components to be distilled off were collected, and the temperature inside the reaction system was maintained at 190 ° C. and refluxed for 3 hours and 10 minutes while adjusting the number of revolutions in accordance with the increase in viscosity.
Thereafter, 349.97 g of N-methyl-2-pyrrolidone (manufactured by Mitsubishi Chemical Corporation) is added, the reaction system internal temperature is cooled to 120 ° C., and the mixture is further stirred for about 3 hours for homogenization. A mass% polyimide varnish was obtained. Subsequently, the obtained polyimide varnish is applied onto a glass plate, held at 80 ° C. for 30 minutes with a hot plate, and then heated at 300 ° C. for 30 minutes in a hot air dryer under nitrogen purge to evaporate the solvent A film of 10 μm was obtained. The results are shown in Table 1.
ステンレス製半月型撹拌翼、窒素導入管、冷却管を取り付けたディーンスターク装置、温度計、ガラス製エンドキャップを備えた5つ口丸底フラスコに、9,9-ビス(4-アミノフェニル)フルオレン(田岡化学工業株式会社製)24.392g(0.070モル)、γ―ブチロラクトン(三菱ケミカル株式会社製)66.786gを投入し、系内温度70℃、窒素雰囲気下、回転数200rpmで撹拌して溶液を得た。
この溶液に、4,4’-(ヘキサフルオロイソプロピリデン)ジフタル酸無水物(ダイキン工業株式会社製)31.097g(0.070モル)とγ-ブチロラクトン(三菱ケミカル株式会社製)16.697gを一括で添加した後、イミド化触媒としてトリエチルアミン(関東化学株式会社製)0.212gを投入し、マントルヒーターで加熱し、約20分かけて反応系内温度を190℃まで上げた。留去される成分を捕集し、回転数を粘度上昇に合わせて調整しつつ、反応系内温度を190℃に保持して1時間還流した。
その後、γ-ブチロラクトン(三菱ケミカル株式会社製)394.709gを添加して、反応系内温度を120℃まで冷却した後、更に約3時間撹拌して均一化し、固形分濃度10質量%のポリイミドワニスを得た。続いてガラス板上へ、得られたポリイミドワニスを塗布し、ホットプレートで80℃、20分間保持し、その後、窒素パージ下、熱風乾燥機中400℃で30分加熱し溶媒を蒸発させ、厚み10μmのフィルムを得た。結果を表1に示す。 Comparative Example 1
9, -bis (4-aminophenyl) fluorene in a 5-neck round bottom flask equipped with stainless steel half-moon stirring blades, a nitrogen inlet tube, a Dean-Stark device equipped with a cooling tube, a thermometer, and a glass end cap 24.392 g (0.070 mol) of Taoka Chemical Industry Co., Ltd. and 66.786 g of γ-butyrolactone (Mitsubishi Chemical Co., Ltd.) are added, and stirring is performed at a rotation speed of 200 rpm in a nitrogen atmosphere at a system temperature of 70 ° C. A solution was obtained.
In this solution, 31.097 g (0.070 mol) of 4,4 '-(hexafluoroisopropylidene) diphthalic anhydride (manufactured by Daikin Industries, Ltd.) and 16.697 g of γ-butyrolactone (manufactured by Mitsubishi Chemical Corporation) After batch addition, 0.212 g of triethylamine (manufactured by Kanto Chemical Co., Ltd.) was added as an imidization catalyst, and heating was performed with a mantle heater, and the temperature within the reaction system was raised to 190 ° C. over about 20 minutes. The components to be distilled off were collected, and the temperature inside the reaction system was maintained at 190 ° C. and refluxed for 1 hour while adjusting the rotational speed in accordance with the increase in viscosity.
Thereafter, 394.709 g of γ-butyrolactone (manufactured by Mitsubishi Chemical Corporation) is added, and after the reaction system internal temperature is cooled to 120 ° C., the mixture is further stirred for about 3 hours for homogenization, and a polyimide having a solid content concentration of 10% by mass I got a varnish. Subsequently, the obtained polyimide varnish is applied onto a glass plate, held at 80 ° C. for 20 minutes by a hot plate, and then heated at 400 ° C. for 30 minutes in a hot air dryer under nitrogen purge to evaporate the solvent A film of 10 μm was obtained. The results are shown in Table 1.
ステンレス製半月型撹拌翼、窒素導入管、冷却管を取り付けたディーンスターク装置、温度計、ガラス製エンドキャップを備えた5つ口丸底フラスコに、9,9-ビス(4-アミノフェニル)フルオレン(田岡化学工業株式会社製)34.845g(0.100モル)、N,N―ジメチルアセトアミド(三菱ガス化学株式会社製)120.202gを投入し、系内温度50℃、窒素雰囲気下、回転数200rpmで撹拌して溶液を得た。
この溶液に、3,3’,4,4’-ビフェニルテトラカルボン酸二無水物(三菱ケミカル株式会社製)29.420g(0.100モル)とN,N-ジメチルアセトアミド(三菱ガス化学株式会社製)30.050gを投入し、溶解を確認した後、室温に戻し回転数を粘度上昇に合わせて調整しつつ5時間攪拌を続けた。
その後、N,N―ジメチルアセトアミド(三菱ガス化学株式会社製)92.91gを添加して、約1時間撹拌して均一化し、固形分濃度20質量%のポリイミド前駆体(ポリアミック酸)溶液(ポリイミド前駆体ワニス)を得た。続いてガラス板上へ、得られたポリイミド前駆体ワニスを塗布し、ホットプレートで80℃、20分間保持し、その後、窒素パージ下、熱風乾燥機中400℃で30分加熱し溶媒を蒸発させ、厚み10μmのポリイミドフィルムを得た。結果を表1に示す。 Comparative Example 2
9, -bis (4-aminophenyl) fluorene in a 5-neck round bottom flask equipped with stainless steel half-moon stirring blades, a nitrogen inlet tube, a Dean-Stark device equipped with a cooling tube, a thermometer, and a glass end cap (Taoka Chemical Industry Co., Ltd.) 34. 845 g (0. 100 mol) and N, N-dimethylacetamide (Mitsubishi Gas Chemical Co., Ltd. 120. 202 g) were added, and the temperature in the system was 50 ° C., under nitrogen atmosphere, and rotation The solution was obtained by stirring at several 200 rpm.
In this solution, 29.420 g (0.100 mol) of 3,3 ', 4,4'-biphenyltetracarboxylic acid dianhydride (manufactured by Mitsubishi Chemical Corporation) and N, N-dimethylacetamide (Mitsubishi Gas Chemical Co., Ltd.) After the dissolution was confirmed, the temperature was returned to room temperature and the stirring was continued for 5 hours while adjusting the number of revolutions according to the increase in viscosity.
Thereafter, 92.91 g of N, N-dimethylacetamide (made by Mitsubishi Gas Chemical Co., Ltd.) is added, and the mixture is stirred for about 1 hour to homogenize, and a polyimide precursor (polyamic acid) solution (polyimide) having a solid concentration of 20% by mass Precursor varnish) was obtained. Subsequently, the obtained polyimide precursor varnish is applied onto a glass plate, kept at 80 ° C. for 20 minutes on a hot plate, and then heated at 400 ° C. for 30 minutes in a hot air dryer under nitrogen purge to evaporate the solvent. A polyimide film having a thickness of 10 μm was obtained. The results are shown in Table 1.
s-BPDA:3,3’,4,4’-ビフェニルテトラカルボン酸二無水物〔式(a-1-1)で表される化合物〕
6FDA:4,4’-(ヘキサフルオロイソプロピリデン)ジフタル酸無水物〔式(a-2)で表される化合物〕
BAFL:9,9-ビス(4-アミノフェニル)フルオレン〔式(b-1)で表される化合物(R:水素原子)〕
TFMB:2,2’-ビス(トリフルオロメチル)ベンジジン〔式(b-2)で表される化合物〕 The abbreviations in the table are as follows.
s-BPDA: 3,3 ′, 4,4′-biphenyltetracarboxylic acid dianhydride [compound represented by formula (a-1-1)]
6FDA: 4,4 '-(hexafluoroisopropylidene) diphthalic anhydride [compound represented by formula (a-2)]
BAFL: 9,9-bis (4-aminophenyl) fluorene [compound represented by formula (b-1) (R: hydrogen atom)]
TFMB: 2,2′-bis (trifluoromethyl) benzidine [compound represented by formula (b-2)]
From Table 1, the polyimide films of Examples 1 and 2 have a low coefficient of linear thermal expansion in addition to high transparency and high heat resistance, so all of these properties are good and balanced. On the other hand, although the polyimide films of Comparative Examples 1 and 2 are excellent in heat resistance, they have a high coefficient of linear thermal expansion, and the polyimide films of Comparative Example 2 are also inferior in transparency, so these polyimide films are highly transparent. In addition to the properties and high heat resistance, it has not been possible to obtain films with a low linear thermal expansion coefficient.
Claims (10)
- テトラカルボン酸又はその誘導体に由来する構成単位A、及びジアミンに由来する構成単位Bを有するポリイミドであって、
構成単位Aが、下記式(a-1)で表される化合物に由来する構成単位(A-1)、及び下記式(a-2)で表される化合物に由来する構成単位(A-2)を含み、
構成単位Bが、下記式(b-1)で表される化合物に由来する構成単位(B-1)、及び下記式(b-2)で表される化合物に由来する構成単位(B-2)を含む、ポリイミド。
(式(b-1)中、Rはそれぞれ独立して、水素原子、フッ素原子又はメチル基を表わす。) A polyimide having a structural unit A derived from a tetracarboxylic acid or a derivative thereof, and a structural unit B derived from a diamine,
Structural unit A is a structural unit (A-1) derived from a compound represented by the following formula (a-1), and a structural unit (A-2) derived from a compound represented by the following formula (a-2) Including)
Structural unit B is a structural unit (B-2) derived from a compound represented by the following formula (b-1), and a structural unit (B-2) derived from a compound represented by the following formula (b-2) ), Including polyimide.
(In formula (b-1), each R independently represents a hydrogen atom, a fluorine atom or a methyl group.) - 構成単位Aに対する構成単位(A-1)の割合が50モル%以上、構成単位(A-2)の割合が50モル%以下である、請求項1に記載のポリイミド。 The polyimide according to claim 1, wherein the ratio of the structural unit (A-1) to the structural unit A is 50 mol% or more and the ratio of the structural unit (A-2) is 50 mol% or less.
- 構成単位Bに対する構成単位(B-1)の割合が50モル%以下、構成単位(B-2)の割合が50モル%以上である、請求項1又は2に記載のポリイミド。 The polyimide according to claim 1 or 2, wherein the ratio of the structural unit (B-1) to the structural unit B is 50 mol% or less and the ratio of the structural unit (B-2) is 50 mol% or more.
- 構成単位Aに対する構成単位(A-1)及び構成単位(A-2)の合計が占める割合が70モル%以上である、請求項1~3のいずれかに記載のポリイミド。 The polyimide according to any one of claims 1 to 3, wherein the ratio of the total of the structural unit (A-1) and the structural unit (A-2) to the structural unit A is 70 mol% or more.
- 構成単位Bに対する構成単位(B-1)及び構成単位(B-2)の合計が占める割合が70モル%以上である、請求項1~4のいずれかに記載のポリイミド。 The polyimide according to any one of claims 1 to 4, wherein the proportion of the total of the structural unit (B-1) and the structural unit (B-2) to the structural unit B is 70 mol% or more.
- 構成単位Bに対する構成単位(B-1)の割合が5モル%以上である、請求項1~5のいずれかに記載のポリイミド。 The polyimide according to any one of claims 1 to 5, wherein the ratio of the structural unit (B-1) to the structural unit B is 5 mol% or more.
- 構成単位Aに対する構成単位(A-1)の割合が60~90モル%、構成単位(A-2)の割合が10~40モル%である、請求項1~6のいずれかに記載のポリイミド。 The polyimide according to any one of claims 1 to 6, wherein the ratio of the structural unit (A-1) to the structural unit A is 60 to 90 mol%, and the ratio of the structural unit (A-2) is 10 to 40 mol%. .
- 構成単位Bに対する構成単位(B-1)の割合が15~30モル%、構成単位(B-2)の割合が70~85モル%である、請求項1~7のいずれかに記載のポリイミド。 The polyimide according to any one of claims 1 to 7, wherein the ratio of the structural unit (B-1) to the structural unit B is 15 to 30 mol%, and the ratio of the structural unit (B-2) is 70 to 85 mol%. .
- 請求項1~8のいずれかに記載のポリイミドが有機溶媒に溶解してなる、ポリイミドワニス。 A polyimide varnish comprising the polyimide according to any one of claims 1 to 8 dissolved in an organic solvent.
- 請求項1~8のいずれかに記載のポリイミドを含む、ポリイミドフィルム。
A polyimide film comprising the polyimide according to any one of claims 1 to 8.
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