WO2019059161A1 - Pyridone compound and agricultural and horticultural germicide having same as active ingredient - Google Patents

Pyridone compound and agricultural and horticultural germicide having same as active ingredient Download PDF

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Publication number
WO2019059161A1
WO2019059161A1 PCT/JP2018/034395 JP2018034395W WO2019059161A1 WO 2019059161 A1 WO2019059161 A1 WO 2019059161A1 JP 2018034395 W JP2018034395 W JP 2018034395W WO 2019059161 A1 WO2019059161 A1 WO 2019059161A1
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group
optionally substituted
substituent
formula
independently
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PCT/JP2018/034395
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French (fr)
Japanese (ja)
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豪毅 梅谷
駿 岡谷
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三井化学アグロ株式会社
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Priority to JP2019543628A priority Critical patent/JP7111731B2/en
Publication of WO2019059161A1 publication Critical patent/WO2019059161A1/en

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    • AHUMAN NECESSITIES
    • A01AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01NPRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
    • A01N43/00Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds
    • A01N43/34Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom
    • A01N43/40Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom six-membered rings
    • AHUMAN NECESSITIES
    • A01AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01NPRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
    • A01N43/00Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds
    • A01N43/48Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with two nitrogen atoms as the only ring hetero atoms
    • A01N43/561,2-Diazoles; Hydrogenated 1,2-diazoles
    • AHUMAN NECESSITIES
    • A01AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01NPRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
    • A01N43/00Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds
    • A01N43/72Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with nitrogen atoms and oxygen or sulfur atoms as ring hetero atoms
    • A01N43/74Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with nitrogen atoms and oxygen or sulfur atoms as ring hetero atoms five-membered rings with one nitrogen atom and either one oxygen atom or one sulfur atom in positions 1,3
    • A01N43/761,3-Oxazoles; Hydrogenated 1,3-oxazoles
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D213/00Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
    • C07D213/02Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
    • C07D213/04Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D213/60Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D213/62Oxygen or sulfur atoms
    • C07D213/63One oxygen atom
    • C07D213/64One oxygen atom attached in position 2 or 6
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D401/00Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
    • C07D401/02Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
    • C07D401/06Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D413/00Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms
    • C07D413/02Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing two hetero rings
    • C07D413/06Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms

Definitions

  • the present invention relates to a pyridone compound and a pesticide containing the compound as an active ingredient.
  • 1,3,5,6-substituted 2-pyridone compounds are known.
  • 1,3,5,6-substituted 2-pyridone compounds having an aryl group or a heteroaryl group at the 3-position as a GABA alpha-2 / 3 ligand are disclosed (for example, WO 98/55480) reference).
  • 1,3,5,6-substituted 2-pyridone compounds having a carboxyl group at the 3-position are disclosed (see, for example, European Patent No. 0308020).
  • a 1,3,5,6-substituted -2-pyridone compound in which 4,4-dimethylpentanoic acid is introduced at 1 position is disclosed (for example, WO 2016/012913 reference).
  • An object of the present invention is to provide a novel pyridone compound which is effective as an agricultural and horticultural fungicide.
  • the present inventors diligently studied 1, 3, 5, 6-substituted 2-pyridone compounds and 1, 5, 6-substituted 2-pyridone compounds in order to solve the above-mentioned problems. As a result, it has been found that a novel compound group in which an alkyl group substituted with an aryl group or a heteroaryl group is introduced at the 5-position in the 2-pyridone skeleton exhibits excellent control activity against plant diseases. The present invention has been completed.
  • the present invention is as follows.
  • R 1 is Hydroxyl group, Cyano group, A C1 to C6 alkyl group optionally substituted with a substituent A, C1 to C6 haloalkyl group, A C3-C8 cycloalkyl group which may be optionally substituted by a substituent A, A C2-C6 alkenyl group which may be optionally substituted by a substituent A, A C 2 -C 6 haloalkenyl group, A C2 to C6 alkynyl group which may be optionally substituted by a substituent A, A C2 to C6 haloalkynyl group, A C1 to C6 alkoxy group which may be optionally substituted by a substituent A, A C1 to C6 haloalkoxy group, A C3 to C8 cycloalkoxy group which may be optionally substituted by a substituent A, A C2-C6 alkenyloxy group which may be optionally substituted by a substituent A,
  • R2 is Hydrogen atom, Nitro group, Halogen atom, A C1 to C6 alkyl group optionally substituted with a substituent A, C1 to C6 haloalkyl group, A C3-C8 cycloalkyl group which may be optionally substituted by a substituent A, A C2-C6 alkenyl group which may be optionally substituted by a substituent A, A C 2 -C 6 haloalkenyl group, A C2 to C6 alkynyl group which may be optionally substituted by a substituent A, A C2 to C6 haloalkynyl group, A C1 to C6 alkoxy group which may be optionally substituted by a substituent A, A C1 to C6 haloalkoxy group, A C3 to C8 cycloalkoxy group which may be optionally substituted by a substituent A, A C2-C6 alkenyloxy group which may be optionally substituted by a substituent A, C2-C6 al
  • X represents an oxygen atom or a sulfur atom
  • Y is An aryl group which may be optionally substituted 0 to 7 as R 3 (however, in the case of R 3 having 2 or more substituents, they are each independently), Or a heteroaryl group which may be optionally substituted 0 to 4 with R 3 (provided that R 3 s each having 2 or more substituents are each independently);
  • R3 is Hydroxyl group, Cyano group, Nitro group, Halogen atom, A C1 to C6 alkyl group which may be optionally substituted by a substituent C, C1 to C6 haloalkyl group, A C3-C8 cycloalkyl group which may be optionally substituted by a substituent C, A C2-C6 alkenyl group which may be optionally substituted by a substituent C, A C 2 -C 6 haloalkenyl group, A C2 to C6 alkynyl group which may be optionally substituted by a substituent C,
  • W is A C1 to C6 alkylene group which may be optionally substituted 0 to 2 with R 5 (wherein each of R 5 s is independently substituted);
  • R5 is Hydroxyl group, Cyano group, Halogen atom, A C1 to C6 alkyl group which may be optionally substituted by a substituent C, C1 to C6 haloalkyl group, A C3-C8 cycloalkyl group which may be optionally substituted by a substituent C, A C2-C6 alkenyl group which may be optionally substituted by a substituent C, A C 2 -C 6 haloalkenyl group, A C2 to C6 alkynyl group which may be optionally substituted by a substituent C, A C2 to C6 haloalkynyl group, A C1 to C6 alkoxy group which may be optionally substituted by a substituent C, A C1 to C6 haloalkoxy group, A C3 to C8 cycloal
  • Thienyl group which may be optionally substituted by 0 to 4 R 4, thiazolyl group, isothiazolyl group, thiadiazolyl group, or thiatriazolyl group (However, in the case of R 4 having two or more substituents, they are each independently.),
  • R1 is A C1 to C6 alkyl group optionally substituted with a substituent A, C1 to C6 haloalkyl group, A C2-C6 alkenyl group which may be optionally substituted by a substituent A, A C 2 -C 6 haloalkenyl group, A C2 to C6 alkynyl group which may be optionally substituted by a substituent A, Or C2 to C6 haloalkynyl group;
  • R2 is Hydrogen atom, Halogen atom, A C1 to C6 alkyl group optionally substituted with a substituent A, C1 to C6 haloalkyl group, A C1 to C6 alkoxy group which may be optionally substituted by a substituent A, A C1 to C6 haloalkoxy group, Rc-L- (wherein Rc represents a C1-C6 alkyl group or a C1-C6 haloalkyl group, and L represents S, SO or SO2),
  • Y is A phenyl group which may be optionally substituted 0 to 5 as R 3 (however, in the case of R 3 having 2 or more substituents, they are each independently), Or a pyridyl group which may be optionally substituted 0 to 4 with R 3 (provided that R 3 s each having 2 or more substituents are independently of each other);
  • R3 is Hydroxyl group, Cyano group, Halogen atom, A C1 to C6 alkyl group which may be optionally substituted by a substituent C, C1 to C6 haloalkyl group, A C1 to C6 alkoxy group which may be optionally substituted by a substituent C, A C1 to C6 haloalkoxy group, A C2-C6 alkenyloxy group which may be optionally substituted by a substituent C, C2-C6 haloalkenyloxy group, A C3-C6 alkynyloxy group which may be optionally substituted by a substituent C, A
  • Z is A phenyl group which may be optionally substituted 0 to 5 with R 4 (provided that R 4 has 2 or more substituents, each of which is independently of each other), A pyridyl group, a pyridazinyl group, a pyrimidinyl group, a pyrazinyl group, a triazinyl group, or a tetrazinyl group (however, in the case of R4 having two or more substituents, they are each independently.
  • Thienyl group which may be optionally substituted by 0 to 4 R 4, thiazolyl group, isothiazolyl group, thiadiazolyl group, or thiatriazolyl group (However, in the case of R 4 having two or more substituents, they are each independently.), A pyrrolyl group, a pyrazolyl group, an imidazolyl group, a triazolyl group, a tetrazolyl group, or a pentazolyl group which may be optionally substituted 0 to 4 by R 4 (however, in the case of R 4 having two or more substituents, they are each independently).
  • R4 represents a furyl group which may be optionally substituted by 0 to 3, an oxazolyl group, an isoxazolyl group, an oxadiazolyl group, or an oxatriazolyl group (provided that they are each independently in the case of R4 having 2 or more substituents).
  • R4 is Hydroxyl group, Halogen atom, A C1 to C6 alkyl group which may be optionally substituted by a substituent C, C1 to C6 haloalkyl group, A C2-C6 alkenyl group which may be optionally substituted by a substituent C, A C 2 -C 6 haloalkenyl group, A C2 to C6 alkynyl group which may be optionally substituted by a substituent C, A C2 to C6 haloalkynyl group, A C1 to C6 alkoxy group which may be optionally substituted by a substituent C, A C1 to C6 haloalkoxy group, A C2-C6 alkenyloxy group which may be optionally substituted by a substituent C, C2-C6 haloalkenyloxy group, A C3-C6 alkynyloxy group which may be optionally substituted by a substituent C, A C3-C6 haloalkynyloxy group,
  • R1 is A C1 to C6 alkyl group optionally substituted with a substituent A, Or a C1 to C6 haloalkyl group
  • R2 is Hydrogen atom, Halogen atom, A C1 to C6 alkyl group optionally substituted with a substituent A, Or a C1-C6 alkoxy group optionally substituted by a substituent A
  • Y is Represents a phenyl group which may be optionally substituted 0 to 5 with R 3 (provided that R 3 is 2 or more, each of which is independently of each other);
  • R3 is Hydroxyl group, Cyano group, Halogen atom, A C1 to C6 alkyl group which may be optionally substituted by a substituent C, A C1 to C6 alkoxy group which may be optionally substituted by a substituent C, A C2-C6 alkenyloxy group which may be optionally substituted by a substituent C, A C3-C6 alkynyloxy group which may
  • Z is A phenyl group which may be optionally substituted 0 to 5 with R 4 (provided that R 4 has 2 or more substituents, each of which is independently of each other), A pyrazolyl group, an imidazolyl group, or a triazolyl group which may be optionally substituted 0 to 4 with R 4 (however, in the case of R 4 having 2 or more substituents, they are each independently).
  • R4 is Halogen atom, A C1 to C6 alkyl group which may be optionally substituted by a substituent C, Or a C1 to C6 alkoxy group optionally substituted by a substituent C;
  • W is A methylene group which may be optionally substituted by 0 to 2 as R 5, or an ethylene group (provided that they are each independently in the case of R 5 as di-substituted);
  • R5 is Hydroxyl group, Halogen atom, Or a C1 to C6 alkoxy group optionally substituted by a substituent C, The compound as described in [3], or a salt thereof.
  • An agricultural and horticultural pest control agent comprising the compound according to [1] or a salt thereof as an active ingredient.
  • a method for controlling plant diseases which comprises applying the agricultural and horticultural pest control agent described in [5] to plants, plant seeds, or soil where plants are grown.
  • a method for controlling plant diseases which comprises applying the agricultural and horticultural fungicides described in [6] to plants, plant seeds, or soil where plants are grown.
  • a novel compound which is effective as an agricultural and horticultural fungicide can be provided.
  • the C1 to C6 alkyl group may be linear or branched and may be methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, t-butyl, pentyl, isopentyl Group, 1-methylbutyl group, 2-methylbutyl group, neopentyl group, 1-ethylpropyl group, 1,2-dimethylpropyl group, hexyl group, 4-methylpentyl group, 3-methylpentyl group, 2-methylpentyl group, 1-methylpentyl group, 3,3-dimethylbutyl group, 2,2-dimethylbutyl group, 1,1-dimethylbutyl group, 1,2-dimethylbutyl group, 1,3-dimethylbutyl group, 2,3- Dimethylbutyl, 2-ethylbutyl, 1-isopropylpropyl, 1,1,2-trimethylpropyl, 1,2,2-trimethylpropyl
  • the halogen atom includes a fluorine atom, a chlorine atom, a bromine atom, an iodine atom and the like.
  • the C1 to C6 haloalkyl group means one in which a hydrogen atom in the above C1 to C6 alkyl group is optionally substituted by one or two or more halogen atoms. When substituted by two or more halogen atoms, those halogen atoms may be the same or different, and the number of substitution thereof is not particularly limited as long as it can be present as a substituent.
  • C1 to C6 haloalkyl groups monofluoromethyl group, difluoromethyl group, trifluoromethyl group, monochloromethyl group, monobromomethyl group, monoiodomethyl group, chlorodifluoromethyl group, bromodifluoromethyl group, 1 -Fluoroethyl group, 2-fluoroethyl group, 1,1-difluoroethyl group, 2,2-difluoroethyl group, 2,2,2-trifluoroethyl group, 1,1,2,2-tetrafluoroethyl group , Pentafluoroethyl group, 2,2,2-trichloroethyl group, 3,3-difluoropropyl group, 3,3,3-trifluoropropyl group, heptafluoropropyl group, heptafluoroisopropyl group, 2,2,2 -Trifluoro-1- (trifluoromethyl)
  • Examples of the C3 to C8 cycloalkyl group include cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, cycloheptyl group and cyclooctyl group.
  • the C2-C6 alkenyl group represents an unsaturated hydrocarbon group which has one or more double bonds and is linear or branched.
  • a geometric isomer it is particularly limited as long as it is a range of the designated carbon number only in either one of E form or Z form or a mixture of any ratio of E form and Z form. There is nothing to do.
  • C2-C6 alkenyl groups include vinyl, 1-propenyl, allyl, 1-butenyl, 2-butenyl, 3-butenyl, 2-methyl-1-propenyl, 1-pentenyl , 2-pentenyl group, 3-pentenyl group, 4-pentenyl group, 2-methyl-1-butenyl group, 3-methyl-2-butenyl group, 1-hexenyl group, 2-hexenyl group, 3-hexenyl group, 4 And -hexenyl group, 5-hexenyl group, 4-methyl-3-pentenyl group, 3-methyl-2-pentenyl group and the like.
  • the C2 to C6 haloalkenyl group means one in which a hydrogen atom in the above C2 to C6 alkenyl group is optionally substituted by one or two or more halogen atoms.
  • a hydrogen atom in the above C2 to C6 alkenyl group is optionally substituted by one or two or more halogen atoms.
  • those halogen atoms may be the same or different, and the number of substitution thereof is not particularly limited as long as it can be present as a substituent.
  • C2 to C6 haloalkenyl groups include 2-fluorovinyl group, 2,2-difluorovinyl group, 2,2-dichlorovinyl group, 3-fluoroallyl group, 3,3-difluoroallyl group, 3, Examples thereof include 3-dichloroallyl group, 4,4-difluoro-3-butenyl group, 5,5-difluoro-4-pentenyl group, 6,6-difluoro-5-hexenyl group and the like.
  • the C2-C6 alkynyl group means an unsaturated hydrocarbon group which has one or more triple bonds and is linear or branched.
  • Specific examples of the C2-C6 alkynyl group include ethynyl group, 1-propynyl group, propargyl group, 1-butynyl group, 2-butynyl group, 3-butynyl group, 3-butynyl group, 1-pentynyl group, 2-pentynyl group, 3-pentynyl group , 4-pentynyl group, 1,1-dimethyl-2-propynyl group, 1-hexynyl group, 2-hexynyl group, 3-hexynyl group, 4-hexynyl group, 5-hexynyl group and the like.
  • the C2 to C6 haloalkynyl group means one in which a hydrogen atom in the above C2 to C6 alkynyl group is optionally substituted by one or two or more halogen atoms.
  • a hydrogen atom in the above C2 to C6 alkynyl group is optionally substituted by one or two or more halogen atoms.
  • those halogen atoms may be the same or different, and the number of substitution thereof is not particularly limited as long as it can be present as a substituent.
  • C2 to C6 haloalkynyl groups are 2-fluoroethynyl group, 2-chloroethynyl group, 2-bromoethynyl group, 2-iodoethynyl group, 3,3-difluoro-1-propynyl group, 3-chloro -3,3-Difluoro-1-propynyl group, 3-bromo-3,3-difluoro-1-propynyl group, 3,3,3-trifluoro-1-propynyl group, 4,4-difluoro-1-butynyl group Group, 4,4-difluoro-2-butynyl group, 4-chloro-4,4-difluoro-1-butynyl group, 4-chloro-4,4-difluoro-2-butynyl group, 4-bromo-4,4 -Difluoro-1-butynyl group, 4-bromo-4,4 -
  • the C1 to C6 alkoxy group represents one in which the above C1 to C6 alkyl group is bonded via an oxygen atom.
  • Specific examples of the C1 to C6 alkoxy group include a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group, a butoxy group, an isobutoxy group, a sec-butoxy group, a t-butoxy group, a pentyloxy group and an isopentyloxy group.
  • the C1 to C6 haloalkoxy group means one in which a hydrogen atom in the above C1 to C6 alkoxy group is optionally substituted by one or two or more halogen atoms.
  • halogen atoms When substituted by two or more halogen atoms, those halogen atoms may be the same or different, and the number of substitution thereof is not particularly limited as long as it can be present as a substituent.
  • C1 to C6 haloalkoxy groups include difluoromethoxy, trifluoromethoxy, chlorodifluoromethoxy, bromodifluoromethoxy, 2-fluoroethoxy, 2,2-difluoroethoxy, 2,2,2 -Trifluoroethoxy group, 1,1,2,2-tetrafluoroethoxy group, pentafluoroethoxy group, 2,2,2-trichloroethoxy group, 3,3-difluoropropyloxy group, 3,3,3-tributyl group Fluoropropyloxy group, heptafluoropropyloxy group, heptafluoroisopropyloxy group, 2,2,2-trifluoro-1- (trifluoromethyl) -ethoxy group, nonafluorobutoxy group, nonafluoro-sec-butoxy group, 3 3,4,4,5,5,5-heptafluoropentyloxy group Undecafluoro pentyloxy group,
  • the C3 to C8 cycloalkoxy group means that the above C3 to C8 cycloalkyl group is bonded via an oxygen atom.
  • Specific examples of the C3 to C8 cycloalkoxy group include cyclopropyloxy group, cyclobutoxy group, cyclopentyloxy group, cyclohexyloxy group, cycloheptyloxy group, cyclooctyloxy group and the like.
  • the C 2 -C 6 alkenyloxy group represents one in which the above C 2 -C 6 alkenyl group is bonded via an oxygen atom.
  • a geometric isomer it is particularly limited as long as it is a range of the designated carbon number, and it is a mixture of only one of either the E form or the Z form or an arbitrary ratio of the E form and the Z form. There is nothing to do.
  • C 2 -C 6 alkenyloxy group examples include vinyloxy group, 1-propenyloxy group, allyloxy group, 1-butenyloxy group, 2-butenyloxy group, 3-butenyloxy group, 2-methyl-1-propenyloxy group, 1 -Pentenyl oxy group, 2-pentenyl oxy group, 3-pentenyl oxy group, 4-pentenyl oxy group, 2-methyl-1-butenyloxy group, 3-methyl-2- butenyloxy group, 1-hexenyl oxy group, 2-hexenyl Examples thereof include an oxy group, a 3-hexenyl oxy group, a 4-hexenyl oxy group, a 5-hexenyl oxy group, a 4-methyl-3-pentenyl oxy group, and a 3-methyl-2-pentenyl oxy group.
  • the C2 to C6 haloalkenyloxy group means one in which a hydrogen atom in the above C2 to C6 alkenyloxy group is optionally substituted by one or two or more halogen atoms.
  • a hydrogen atom in the above C2 to C6 alkenyloxy group is optionally substituted by one or two or more halogen atoms.
  • those halogen atoms may be the same or different, and the number of substitution thereof is not particularly limited as long as it can be present as a substituent.
  • C2 to C6 haloalkenyloxy groups include 2-fluorovinyloxy group, 2,2-difluorovinyloxy group, 2,2-dichlorovinyloxy group, 3-fluoroallyloxy group, 3,3-difluoro Allyloxy, 3,3-dichloroallyloxy, 4,4-difluoro-3-butenyloxy, 5,5-difluoro-4-pentenyloxy, 6,6-difluoro-5-hexenyloxy and the like Be
  • the C 3 -C 6 alkynyloxy group represents one of the C 2 -C 6 alkynyl groups described above in which a C 3 -C 6 alkynyl group is bonded via an oxygen atom.
  • Specific examples of the C3-C6 alkynyloxy group include propargyloxy group, 2-butynyloxy group, 3-butynyloxy group, 2-pentynyloxy group, 3-pentynyloxy group, 4-pentynyloxy group, 1, 1 And -dimethyl-2-propynyloxy group, 2-hexynyloxy group, 3-hexynyloxy group, 4-hexynyloxy group, 5-hexynyloxy group and the like.
  • the C3 to C6 haloalkynyloxy group means one in which a hydrogen atom in the C3 to C6 alkynyloxy group is optionally substituted by one or two or more halogen atoms.
  • halogen atoms When substituted by two or more halogen atoms, those halogen atoms may be the same or different, and the number of substitution thereof is not particularly limited as long as it can be present as a substituent.
  • C3 to C6 haloalkynyloxy group examples include a 1,1-difluoro-2-propynyloxy group, a 4,4-difluoro-2-butynyloxy group, and a 4-chloro-4,4-difluoro-2-butynyloxy group.
  • the aryl group represents a cyclic aromatic substituent composed of a hydrogen atom and a carbon atom.
  • a phenyl group, a naphthyl group, etc. are mentioned as a specific example of an aryl group.
  • the heteroaryl group is a cyclic aromatic substituent selected from the group consisting of nitrogen atom, oxygen atom and sulfur atom and containing at least one hetero atom as a constituent atom of the ring.
  • Specific examples of the heteroaryl group are pyridyl group, pyridazinyl group, pyrimidinyl group, pyrazinyl group, triazinyl group, tetrazinyl group, thienyl group, thiazolyl group, isothiazolyl group, thiadiazolyl group, thiatriazolyl group, pyrrolyl group, pyrazolyl group, imidazolyl group, Triazolyl group, tetrazolyl group, pentazolyl group, furyl group, oxazolyl group, isoxazolyl group, oxadiazolyl group, oxatriazolyl group, indolyl group, isoindolyl group, indazoly
  • the heterocyclic group is a cyclic aromatic substituent or a cyclic aliphatic substituent selected from the group consisting of nitrogen atom, oxygen atom and sulfur atom and containing at least one hetero atom as a constituent atom of the ring.
  • Specific examples of the cyclic aromatic substituent are the same as those exemplified for the above-mentioned heteroaryl group.
  • cyclic aliphatic substituent examples include 1,2-epoxyethanyl group, oxetanyl group, oxoranyl group, oxanyl group, 1,3-dioxolanyl group, 1,3-dioxanyl group, 1,4-dioxanyl group , Thiiranyl group, thietanyl group, thioranyl group, thianyl group, aziridinyl group, azetidinyl group, pyrrolidinyl group, piperidinyl group, homopiperidinyl group, azocanyl group, piperazinyl group, morpholinyl group, thiomorpholinyl group, 1,3-oxathianyl group, 1,4 -Oxatianil group etc. are mentioned.
  • the aryloxy group means that the above-mentioned aryl group is bonded via an oxygen atom.
  • a phenoxy group, a naphthyloxy group, etc. are mentioned as a specific example of an aryloxy group.
  • the heteroaryloxy group means that the above-mentioned heteroaryl group is bonded via an oxygen atom.
  • Specific examples of the heteroaryloxy group include pyridyloxy group, pyridazinyloxy group, pyrimidinyloxy group, pyrazinyloxy group, triazinyloxy group, tetradinyloxy group, thienyloxy group, thiazolyloxy group, isothiazolyloxy Group, thiadiazolyloxy group, thiatriazolyloxy group, pyrrolyloxy group, pyrazolyloxy group, imidazolyloxy group, triazolyloxy group, tetrazolyloxy group, pentazolyloxy group, furyloxy group, oxazolyl Oxy group, isoxazolyloxy group, oxadiazolyloxy group, oxa triazolyloxy group, indolyloxy group, isoindolyloxy group, ind
  • the C1 to C6 aralkyl group represents one in which a hydrogen atom in a C1 to C6 alkyl group is substituted by the above-mentioned aryl group.
  • Specific examples of the C1 to C6 aralkyl group include benzyl, phenethyl, phenylpropyl, phenylbutyl, phenylpentyl, phenylhexyl, naphthalenylmethyl, naphthalenylethyl and naphthalenylpropyl groups. , Naphthalenylbutyl group, naphthalenylpentyl group, naphthalenylhexyl group and the like.
  • the C1-C6 heteroaralkyl group means one in which a hydrogen atom in the C1-C6 alkyl group is substituted with the above-mentioned heteroaryl group.
  • C1 to C6 heteroaralkyl groups pyridylmethyl group, pyridylethyl group, pyridylpropyl group, pyridylbutyl group, pyridylpentyl group, pyridylhexyl group, pyridazinylmethyl group, pyridazinylethyl group, Pyridazinylpropyl, pyridazinylbutyl, pyridazinylpentyl, pyridazinylhexyl, pyrimidinylmethyl, pyrimidinylethyl, pyrimidinylpropyl, pyrimidinylbutyl, pyrimidinylpentyl, pyrimidinyl
  • the aralkyloxy group means that the above-mentioned aralkyl group is bonded via an oxygen atom.
  • Specific examples of the aralkyloxy group include benzyloxy group, phenethyloxy group, phenylpropyloxy group, phenylbutoxy group, phenylpentyloxy group, phenylhexyloxy group, naphthalenyl methoxy group, naphthalenyl ethoxy group, naphthalenyl A propoxy group, naphthalenyl butoxy group, naphthalenyl pentyloxy group, naphthalenyl hexyl oxy group etc. are mentioned.
  • the C1 to C6 alkylene group is linear and includes methylene, ethylene, propylene, butylene, pentylene and hexylene groups.
  • 3- to 6-membered ring group containing 1 to 2 oxygen atoms include a 1,2-epoxyethanyl group, an oxetanyl group, an oxolanyl group, an oxanyl group, a 1,3-dioxolanyl group, and a 1,3-dioxolanyl group.
  • Dioxanyl group, 1,4-dioxanyl group and the like can be mentioned.
  • the C2 to C6 alkoxyalkoxy group is a group in which a hydrogen atom in a C1 to C5 alkoxy group among the above C1 to C6 alkoxy groups is optionally substituted by one or more C1 to C5 alkoxy groups Represents
  • the total number of carbons is not particularly limited as long as it is within the specified number of carbons.
  • C 2 -C 6 alkoxyalkoxy group examples include methoxymethoxy, ethoxymethoxy, propyloxymethoxy, isopropyloxymethoxy, methoxyethoxy, ethoxyethoxy, propyloxyethoxy, isopropyloxyethoxy, methoxypropyl Examples include oxy, ethoxypropyloxy, propyloxypropyloxy, isopropyloxypropyloxy and the like.
  • the pyridone compound of the present invention includes a compound represented by the following formula (1) and a salt thereof.
  • R 1 in the formula (1) is a hydroxyl group, a cyano group, a C1 to C6 alkyl group optionally substituted with substituent A, a C1 to C6 haloalkyl group, C3 optionally substituted with substituent A C8 cycloalkyl group, C2 to C6 alkenyl group optionally substituted with substituent A, C2 to C6 haloalkenyl group, C2 to C6 alkynyl group optionally substituted with substituent A, C2 to C6 C6 haloalkynyl group, C1 to C6 alkoxy group optionally substituted with substituent A, C1 to C6 haloalkoxy group, C3 to C8 cycloalkoxy group optionally substituted with substituent A, substitution A C2 to C6 alkenyloxy group which may be optionally substituted by a group A, a C2 to C6 haloalkenyloxy group, a C3 to C6 alkynyloxy
  • R 1 is a C1 to C6 alkyl group optionally substituted with a substituent A, a C1 to C6 haloalkyl group, a C2 to C6 alkenyl group optionally substituted with a substituent A, C2 to C6 halo Alkenyl group, C2-C6 alkynyl group which may be optionally substituted with substituent A, or C2-C6 haloalkynyl group is preferable,
  • R 1 is preferably a C 1 to C 6 alkyl group which may be optionally substituted by a substituent A, or a C 1 to C 6 haloalkyl group.
  • R 1 in the formula (1) includes a hydroxyl group and a cyano group.
  • the C1-C6 alkyl group of the "C1-C6 alkyl group optionally substituted with substituent A" in R1 of Formula (1) has the same definition as that described above, preferably a methyl group or an ethyl group A propyl group, an isopropyl group, a butyl group or an isobutyl group, and more preferably a methyl group or an ethyl group.
  • substituent A When having a substituent A, the hydrogen atom in the C1-C6 alkyl group is optionally substituted by the substituent A.
  • the “C1-C6 haloalkyl group” in R 1 of the formula (1) is as defined above, preferably a 2-fluoroethyl group, a 2,2-difluoroethyl group or a 2,2,2-trifluoro group.
  • the C3 to C8 cycloalkyl group of the "C3 to C8 cycloalkyl group optionally substituted with substituent A" in R1 of Formula (1) has the same definition as that described above, and preferably a cyclopropyl group A cyclobutyl group, a cyclopentyl group or a cyclohexyl group, more preferably a cyclopropyl group or a cyclobutyl group.
  • the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent A.
  • the C2-C6 alkenyl group of the "C2-C6 alkenyl group optionally substituted with substituent A" in R1 of Formula (1) has the same definition as that described above, preferably a vinyl group, 1- It is a propenyl group or an allyl group, more preferably a vinyl group or an allyl group.
  • a hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent A.
  • the “C2 to C6 haloalkenyl group” in R 1 of the formula (1) is as defined above, preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group, a 3-fluoroallyl group, or It is a 3,3-difluoroallyl group, more preferably a 2-fluorovinyl group or a 2,2-difluorovinyl group.
  • the C2 to C6 alkynyl group of the “C2 to C6 alkynyl group optionally substituted with substituent A” in R 1 of Formula (1) has the same definition as described above, preferably a propargyl group, 2- It is a butynyl group or a 3-butynyl group, and more preferably a propargyl group.
  • substituent A When having a substituent A, the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent A.
  • the “C2-C6 haloalkynyl group” in R 1 of the formula (1) is as defined above, preferably a 4, 4-difluoro-2-butynyl group, 4-chloro-4, 4-difluoro- 2-butynyl group, 4-bromo-4,4-difluoro-2-butynyl group, or 4,4,4-trifluoro-2-butynyl group, more preferably 4,4-difluoro-2-butynyl group Or 4,4,4-trifluoro-2-butynyl group.
  • the C1-C6 alkoxy group of the “C1-C6 alkoxy group optionally substituted with substituent A” in R 1 of Formula (1) has the same definition as that described above, preferably a methoxy group or an ethoxy group A propyloxy group, an isopropyloxy group, a butoxy group or an isobutoxy group, more preferably a methoxy group or an ethoxy group.
  • substituent A When having a substituent A, the hydrogen atom in the C1-C6 alkoxy group is optionally substituted by the substituent A.
  • the “C1 to C6 haloalkoxy group” in R 1 of the formula (1) is as defined above, preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2, 2-trifluoroethoxy group, 3,3-difluoropropyloxy group, or 3,3,3-trifluoropropyloxy group, more preferably difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group A group or a 2,2,2-trifluoroethoxy group.
  • the C3 to C8 cycloalkoxy group of the "C3 to C8 cycloalkoxy group which may be optionally substituted with substituent A" in R1 of the formula (1) has the same definition as that described above, preferably, cyclopropyloxy A cyclobutoxy group, a cyclopentyloxy group or a cyclohexyloxy group, more preferably a cyclopropyloxy group or a cyclobutoxy group.
  • substituent A When having a substituent A, the hydrogen atom in the C3-C8 cycloalkoxy group is optionally substituted by the substituent A.
  • the C2-C6 alkenyloxy group of the "C2-C6 alkenyloxy group optionally substituted with substituent A" in R1 of Formula (1) has the same definition as that described above, and preferably a vinyloxy group, It is a 1-propenyloxy group or an allyloxy group, and more preferably a vinyloxy group.
  • substituent A When having a substituent A, the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted by the substituent A.
  • the “C2 to C6 haloalkenyloxy group” in R 1 of the formula (1) has the same definition as that described above, and preferably a 2-fluorovinyloxy group, a 2, 2-difluorovinyloxy group, a 3-fluoro It is an allyloxy group or a 3,3-difluoroallyloxy group, and more preferably a 2-fluorovinyloxy group or a 2,2-difluorovinyloxy group.
  • the C3 to C6 alkynyloxy group of the “C3 to C6 alkynyloxy group optionally substituted with substituent A” in R 1 of Formula (1) has the same definition as described above, and preferably a propargyloxy group A 2-butynyloxy group or a 3-butynyloxy group, more preferably a propargyloxy group.
  • substituent A When having a substituent A, the hydrogen atom in the C3-C6 alkynyloxy group is optionally substituted by the substituent A.
  • the “C3-C6 haloalkynyloxy group” in R 1 of the formula (1) has the same meaning as the above-mentioned definition, preferably a 4,4-difluoro-2-butynyloxy group, 4-chloro-4, 4- It is a difluoro-2-butynyloxy group, a 4-bromo-4,4-difluoro-2-butynyloxy group, or a 4,4,4-trifluoro-2-butynyloxy group, more preferably 4,4-difluoro-2 Butynyloxy or a 4,4,4-trifluoro-2-butynyloxy group.
  • Ra and RbN— in R 1 of Formula (1) (where Ra and Rb are each independently a hydrogen atom, a C1-C6 alkyl group optionally substituted with a substituent B, C1-C6 Represents a haloalkyl group, or a C3 to C8 cycloalkyl group, or Ra and Rb together with the nitrogen atom to which it is attached is an aziridinyl group, azetidinyl group, pyrrolidinyl group, piperidinyl group, homopiperidinyl group, or azocanyl group
  • the definitions of each of the terms) to be formed are as defined above.
  • RaRbN- preferably, amino group, methylamino group, ethylamino group, (methoxymethyl) amino group, (2-methoxyethyl) amino group, (cyanomethyl) amino group, (2-cyanoethyl) amino group, Dimethylamino, ethylmethylamino, diethylamino, (methoxymethyl) methylamino, (2-methoxyethyl) methylamino, (cyanomethyl) methylamino, (2-cyanoethyl) methylamino, 2, 2- Difluoroethylamino group, 2,2,2-trifluoroethylamino group, cyclopropylamino group, (cyclopropylamino group, (cyclopropylamino group, (cyclopropylamino group, (cyclopropylamino group, (cyclopropylamino group, (cyclopropylamino group, (cyclopropylamino
  • R 2 in the formula (1) is suitably substituted by a hydrogen atom, a nitro group, a halogen atom, a C 1 to C 6 alkyl group optionally substituted by a substituent A, a C 1 to C 6 haloalkyl group, a substituent A C3 to C8 cycloalkyl group, C2 to C6 alkenyl group optionally substituted with substituent A, C2 to C6 haloalkenyl group, C2 to C6 alkynyl optionally substituted with substituent A Group, a C2-C6 haloalkynyl group, a C1-C6 alkoxy group optionally substituted with a substituent A, a C1-C6 haloalkoxy group, a C3-C8 cyclo optionally substituted with a substituent A Alkoxy group, C2-C6 alkenyloxy group optionally substituted with substituent A, C2-C6 haloalkenyloxy group, C3-
  • R2 is preferably a hydrogen atom, a halogen atom, a C1 to C6 alkyl group which may be optionally substituted with substituent A, or a C1 to C6 alkoxy group which may be optionally substituted with substituent A.
  • R2 in the formula (1) includes a hydrogen atom and a nitro group.
  • the halogen atom in R 2 of the formula (1) is as defined above, preferably a fluorine, chlorine atom, bromine atom or iodine atom.
  • the C1-C6 alkyl group of the "C1-C6 alkyl group optionally substituted with substituent A" in R2 of the formula (1) has the same meaning as defined above, preferably a methyl group or an ethyl group A propyl group, an isopropyl group, a butyl group or an isobutyl group, and more preferably a methyl group or an ethyl group.
  • substituent A When having a substituent A, the hydrogen atom in the C1-C6 alkyl group is optionally substituted by the substituent A.
  • the “C1 to C6 haloalkyl group” in R 2 of the formula (1) is as defined above, preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, or 2,2,2 -Trifluoroethyl group, 3,3-difluoropropyl group, or 3,3,3-trifluoropropyl group, more preferably difluoromethyl group, trifluoromethyl group, 2,2-difluoroethyl group, or 2,2,2-trifluoroethyl group.
  • the C3 to C8 cycloalkyl group of the "C3 to C8 cycloalkyl group optionally substituted with substituent A" in R2 of the formula (1) has the same definition as described above, and preferably a cyclopropyl group A cyclobutyl group, a cyclopentyl group or a cyclohexyl group, more preferably a cyclopropyl group or a cyclobutyl group.
  • the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent A.
  • the C2-C6 alkenyl group of the "C2-C6 alkenyl group optionally substituted with substituent A" in R2 of the formula (1) has the same meaning as defined above, preferably a vinyl group, 1- Propenyl group, allyl group, 1-butenyl group, 2-butenyl group, or 3-butenyl group, more preferably vinyl group, 1-propenyl group or allyl group.
  • a hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent A.
  • the “C2 to C6 haloalkenyl group” in R 2 of the formula (1) is as defined above, preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group or a 2,2-dichlorovinyl group And 3-fluoroallyl, 3,3-difluoroallyl or 3,3-dichloroallyl, more preferably 2-fluorovinyl or 2,2-difluorovinyl.
  • the C2 to C6 alkynyl group of the “C2 to C6 alkynyl group optionally substituted with substituent A” in R 2 of the formula (1) has the same definition as described above, preferably an ethynyl group, 1- Propynyl group, propargyl group, 1-butynyl group, 2-butynyl group or 3-butynyl group is preferable, and ethynyl group, 1-propynyl group or propargyl group is more preferable.
  • the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent A.
  • the “C2-C6 haloalkynyl group” in R 2 of the formula (1) is as defined above, preferably a 3,3-difluoro-1-propynyl group, 3,3,3-trifluoro-1 -Propynyl group, 4,4-difluoro-1-butynyl group, 4,4-difluoro-2-butynyl group, 4,4,4-trifluoro-1-butynyl group, or 4,4,4-trifluoro- 2-butynyl group, more preferably 3,3-difluoro-1-propynyl group or 3,3,3-trifluoro-1-propynyl group.
  • the C1-C6 alkoxy group of the "C1-C6 alkoxy group optionally substituted with substituent A" in R2 of Formula (1) has the same definition as that described above, preferably a methoxy group or an ethoxy group A propyloxy group, an isopropyloxy group, a butoxy group or an isobutoxy group, and more preferably a methoxy group, an ethoxy group, a propyloxy group or an isopropyloxy group.
  • the hydrogen atom in the C1-C6 alkoxy group is optionally substituted by the substituent A.
  • the “C1 to C6 haloalkoxy group” in R 2 of the formula (1) is as defined above, preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2, 2-trifluoroethoxy group, 3,3-difluoropropyloxy group, or 3,3,3-trifluoropropyloxy group, more preferably difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group A group or a 2,2,2-trifluoroethoxy group.
  • the C3-C8 cycloalkoxy group of the "C3-C8 cycloalkoxy group which may be optionally substituted with substituent A" in R2 of the formula (1) has the same definition as described above, preferably, cyclopropyloxy A cyclobutoxy group, a cyclopentyloxy group or a cyclohexyloxy group, more preferably a cyclopropyloxy group or a cyclobutoxy group.
  • substituent A When having a substituent A, the hydrogen atom in the C3-C8 cycloalkoxy group is optionally substituted by the substituent A.
  • the C2-C6 alkenyloxy group of the "C2-C6 alkenyloxy group optionally substituted with substituent A" in R2 of Formula (1) has the same definition as that described above, and preferably a vinyloxy group, 1-propenyloxy group, allyloxy group, 1-butenyloxy group, 2-butenyloxy group, or 3-butenyloxy group, more preferably vinyloxy group, 1-propenyloxy group, or allyloxy group.
  • the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted by the substituent A.
  • the “C2 to C6 haloalkenyloxy group” in R 2 of the formula (1) is as defined above, and is a 2-fluorovinyloxy group, a 2,2-difluorovinyloxy group, a 2,2-dichlorovinyloxy group Group, 3-fluoroallyloxy group, 3,3-difluoroallyloxy group, or 3,3-dichloroallyloxy group, more preferably 2-fluorovinyloxy group or 2,2-difluorovinyloxy group It is.
  • the C3 to C6 alkynyloxy group of the “C3 to C6 alkynyloxy group optionally substituted with substituent A” in R 2 of Formula (1) has the same definition as that described above, and preferably a propargyloxy group A 2-butynyloxy group or a 3-butynyloxy group, more preferably a propargyloxy group.
  • substituent A When having a substituent A, the hydrogen atom in the C3-C6 alkynyloxy group is optionally substituted by the substituent A.
  • the “C3-C6 haloalkynyloxy group” in R 2 of the formula (1) is as defined above, preferably a 4,4-difluoro-2-butynyloxy group, 4-chloro-4,4-difluoro -2-butynyloxy group, 4-bromo-4,4-difluoro-2-butynyloxy group, or 4,4,4-trifluoro-2-butynyloxy group, more preferably 4,4-difluoro-2- It is a butynyloxy group or a 4,4,4-trifluoro-2-butynyloxy group.
  • Rc-L- (wherein Rc represents a C1-C6 alkyl group or a C1-C6 haloalkyl group, and L represents S, SO, or SO 2) in R 2 of Formula (1)
  • Rc-L- is a methylthio group, a methanesulfinyl group, a methanesulfonyl group, a trifluoromethylthio group, a trifluoromethanesulfinyl group, or a trifluoromethanesulfonyl group, and more preferably a methylthio group, a methanesulfinyl group Or a methanesulfonyl group.
  • a C1-C6 alkyl group optionally substituted with a substituent B when having a substituent B, the hydrogen atom in the C1-C6 alkyl group is optionally substituted by a substituent B .
  • X of Formula (1) represents an oxygen atom or a sulfur atom.
  • Preferred X is an oxygen atom.
  • Y in the formula (1) is an aryl group which may be optionally substituted 0 to 7 with R 3 (provided that R 3 is 2 or more, each of which is independent of each other) or 0 to 4 as appropriate substituted with R 3 And each represents a heteroaryl group (in the case of R3 having 2 or more substituents, each of which is independent of one another).
  • Y is a phenyl group which may be optionally substituted 0 to 5 with R 3 (provided that they are each independently in the case of R 3 having 2 or more substituents) and a pyridyl group which may be optionally substituted 0 to 4 with R 3 ( However, in the case of R 3 of 2 or more substitution, they are each independently), pyridazinyl group optionally substituted by 0 to 3 with R 3, pyrimidinyl group, or pyrazinyl group (in the case of R 3 of 2 or more substitution, respectively) And triazinyl groups which may be optionally substituted 0 to 2 with R 3 (provided that they are each independently in the case of R 3 being disubstituted) or tetrazinyl group which may be optionally substituted with R 3
  • Y is a phenyl group which may be optionally substituted 0 to 5 with R 3 (provided that they are each independently in the case of R 3 having 2 or more
  • ma represents an integer of 0 to 5, and when ma is 2 or more, R 3 s of 2 or more substitutions represent independent substituents, which may be the same or different and may be selected arbitrarily it can.
  • the “pyridyl group which may be optionally substituted by 0 to 4 with R 3” in Y of the formula (1) (wherein each R 3 having two or more substituents is independent of each other) has a formula (b-1), a formula The partial structure shown below with (b-2) and Formula (b-3) is represented.
  • mb represents an integer of 0 to 4, and in the case where mb is 2 or more, two or more substituted R3's are independent substituents. And may be the same or different and can be arbitrarily selected.
  • the “pyridazinyl group which may be optionally substituted 0 to 3 with R 3” in Y of the formula (1) has a formula (c-1), a formula The partial structure shown below with (c-2) and Formula (c-3) is represented.
  • mc represents an integer of 0 to 3, and when mc is 2 or more, two or more substituted R3's are independent substituents. And may be the same or different and can be arbitrarily selected.
  • the “pyrimidinyl group which may be optionally substituted 0 to 3 with R 3” in Y of the formula (1) (but each of R 3 s having 2 or more substituents is independent of each other) has a formula (d-1), a formula The partial structure shown below with (d-2) and Formula (d-3) is represented.
  • md represents an integer of 0 to 3, and when md is 2 or more, two or more substituted R3's are independent substituents. And may be the same or different and can be arbitrarily selected.
  • me represents an integer of 0 to 3, and when me is 2 or more, two or more substituted R 3 s independently represent an independent substituent, which may be the same or different and may be selected arbitrarily it can.
  • the “triazinyl group optionally substituted with 0 to 2 R 3 as appropriate” in Y of the formula (1) has a formula (f-1) or a formula
  • the partial structure shown below represented by f-2), Formula (f-3), Formula (f-4), and Formula (f-5) is represented.
  • mf represents an integer of 0 to 2
  • mf is 2
  • each disubstituted R 3 represents an independent substituent, which may be the same or different, and can be optionally selected.
  • the “tetradinyl group which may be optionally substituted with R 3” in Y of the formula (1) is a moiety represented by the following formulas (g-1), (g-2) and (g-3) Represents a structure.
  • mg represents an integer of 0 to 1.
  • R3 in the formula (1) is optionally substituted with a hydroxyl group, a cyano group, a nitro group, a halogen atom, a C1 to C6 alkyl group optionally substituted with a substituent C, a C1 to C6 haloalkyl group, a substituent C C3-C8 cycloalkyl group which may be substituted, C2-C6 alkenyl group optionally substituted with substituent C, C2-C6 haloalkenyl group, C2-C6 optionally substituted with substituent C C 2 -C 6 haloalkynyl group, C 1 -C 6 alkoxy group optionally substituted with substituent C, C 1-C 6 haloalkoxy group, C 3 -C 8 optionally substituted with substituent C Of C2 to C6 alkenyloxy group optionally substituted with substituent C, C2 to C6 haloalkenyloxy group, C3 to C6 optionally substituted with substituent C A
  • Rx1C O)-(wherein, Rx1 is a C1-C6 alkyl group optionally substituted with a substituent B, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, C1-C6 Or an alkoxy group of C1 to C6, a haloalkoxy group of C1 to C6, a cycloalkoxy group of C3 to C8, or RaRbN- (wherein, Ra and Rb are as defined above), or Rx1C (OO) O. -(Here, Rx1 is the same as the above).
  • R 3 in the formula (1) includes a hydroxyl group, a cyano group and a nitro group.
  • the halogen atom in R 3 of the formula (1) is as defined above, and is preferably a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.
  • the C1-C6 alkyl group of the "C1-C6 alkyl group optionally substituted with substituent C" in R3 of the formula (1) has the same meaning as defined above, preferably a methyl group or an ethyl group A propyl group, an isopropyl group, a butyl group or an isobutyl group, and more preferably a methyl group, an ethyl group, a propyl group or an isopropyl group.
  • the hydrogen atom in the C1-C6 alkyl group is optionally substituted by the substituent C.
  • the “C1 to C6 haloalkyl group” in R 3 of the formula (1) is as defined above, preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, 2,2,2 -Trifluoroethyl group, 3,3-difluoropropyl group, or 3,3,3-trifluoropropyl group, more preferably difluoromethyl group, trifluoromethyl group, 2,2-difluoroethyl group, or 2,2,2-trifluoroethyl group.
  • the C3 to C8 cycloalkyl group of the "C3 to C8 cycloalkyl group optionally substituted with substituent C" in R3 of Formula (1) has the same definition as that described above, and preferably a cyclopropyl group A cyclobutyl group, a cyclopentyl group or a cyclohexyl group, more preferably a cyclopropyl group or a cyclobutyl group.
  • the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent C.
  • the C2-C6 alkenyl group of the "C2-C6 alkenyl group which may be optionally substituted with substituent C" in R3 of Formula (1) has the same meaning as defined above, preferably a vinyl group, 1- Propenyl group, allyl group, 1-butenyl group, 2-butenyl group, or 3-butenyl group, more preferably vinyl group, 1-propenyl group or allyl group.
  • substituent C When having a substituent C, the hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent C.
  • the “C2 to C6 haloalkenyl group” in R 3 of the formula (1) is as defined above, preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group or a 2,2-dichlorovinyl group And 3-fluoroallyl, 3,3-difluoroallyl or 3,3-dichloroallyl, more preferably 2-fluorovinyl or 2,2-difluorovinyl.
  • the C2 to C6 alkynyl group of the “C2 to C6 alkynyl group optionally substituted with substituent C” in R 3 of the formula (1) has the same definition as described above, preferably an ethynyl group, 1— Propynyl group, propargyl group, 1-butynyl group, 2-butynyl group or 3-butynyl group is preferable, and ethynyl group, 1-propynyl group or propargyl group is more preferable.
  • the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent C.
  • the “C2-C6 haloalkynyl group” in R 3 of the formula (1) is as defined above, preferably a 3,3-difluoro-1-propynyl group, 3,3,3-trifluoro-1 -Propynyl group, 4,4-difluoro-1-butynyl group, 4,4-difluoro-2-butynyl group, 4,4,4-trifluoro-1-butynyl group, or 4,4,4-trifluoro- 2-butynyl group, more preferably 3,3-difluoro-1-propynyl group or 3,3,3-trifluoro-1-propynyl group.
  • the C1-C6 alkoxy group of the "C1-C6 alkoxy group optionally substituted with substituent C" in R3 of Formula (1) has the same definition as that described above, preferably a methoxy group or an ethoxy group A propyloxy group, an isopropyloxy group, a butoxy group, an isobutoxy group or a pentyloxy group, and more preferably a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group or a butoxy group.
  • a hydrogen atom in the C1 to C6 alkoxy group is optionally substituted by the substituent C.
  • the “C1 to C6 haloalkoxy group” in R 3 of the formula (1) is as defined above, preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2, 2-trifluoroethoxy group, 3,3-difluoropropyloxy group, or 3,3,3-trifluoropropyloxy group, more preferably difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group A group or a 2,2,2-trifluoroethoxy group.
  • the C3 to C8 cycloalkoxy group of the "C3 to C8 cycloalkoxy group optionally substituted with substituent C" in R3 of the formula (1) has the same definition as that described above, preferably, cyclopropyloxy A cyclobutoxy group, a cyclopentyloxy group or a cyclohexyloxy group, more preferably a cyclopropyloxy group or a cyclobutoxy group.
  • the hydrogen atom in the C3-C8 cycloalkoxy group is optionally substituted by the substituent C.
  • the C2-C6 alkenyloxy group of the "C2-C6 alkenyloxy group which may be optionally substituted with substituent C" in R3 of Formula (1) has the same definition as described above, and preferably a vinyloxy group, 1-propenyloxy group, allyloxy group, 1-butenyloxy group, 2-butenyloxy group, or 3-butenyloxy group, more preferably vinyloxy group, 1-propenyloxy group, or allyloxy group.
  • the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted by the substituent C.
  • the “C2 to C6 haloalkenyloxy group” in R 3 of the formula (1) is as defined above, preferably a 2-fluorovinyloxy group, a 2,2-difluorovinyloxy group, or 2,2- Dichlorovinyloxy group, 3-fluoroallyloxy group, 3,3-difluoroallyloxy group, or 3,3-dichloroallyloxy group, more preferably 2-fluorovinyloxy group, or 2,2-difluoro It is a vinyloxy group.
  • the C3-C6 alkynyloxy group of the "C3-C6 alkynyloxy group optionally substituted with substituent C" in R3 of the formula (1) has the same definition as that described above, and preferably a propargyloxy group A 2-butynyloxy group or a 3-butynyloxy group, more preferably a propargyloxy group.
  • the hydrogen atom in the C3-C6 alkynyloxy group is optionally substituted by the substituent C.
  • the “C3-C6 haloalkynyloxy group” in R 3 of the formula (1) is as defined above, preferably a 4,4-difluoro-2-butynyloxy group, 4-chloro-4,4-difluoro -2-butynyloxy group, 4-bromo-4,4-difluoro-2-butynyloxy group, or 4,4,4-trifluoro-2-butynyloxy group, more preferably 4,4-difluoro-2- It is a butynyloxy group or a 4,4,4-trifluoro-2-butynyloxy group.
  • Ra and Rb of "RaRbN-" in R3 of Formula (1) are as defined above.
  • RaRbN- preferably, amino, methylamino, ethylamino, propylamino, isopropylamino, (methoxymethyl) amino, (2-methoxyethyl) amino, (cyanomethyl) amino, (2-cyanoethyl) amino group, dimethylamino group, ethyl (methyl) amino group, methyl (propyl) amino group, isopropyl (methyl) amino group, (methoxymethyl) methylamino group, (2-methoxyethyl) methylamino group (Cyanomethyl) methylamino group, (2-cyanoethyl) methylamino group, diethylamino group, ethyl (propyl) amino group, ethyl (isopropyl) amino group, ethyl (methoxymethyl) amino group, e
  • Rc and L of "Rc-L-" in R3 of Formula (1) are as defined above.
  • Rc-L- is a methylthio group, a methanesulfinyl group, a methanesulfonyl group, a trifluoromethylthio group, a trifluoromethanesulfinyl group, or a trifluoromethanesulfonyl group, and more preferably a methylthio group, a methanesulfinyl group Or a methanesulfonyl group.
  • the definition of each term is as defined above.
  • a C1-C6 alkyl group optionally substituted with a substituent B when having a substituent B, the hydrogen atom in the C1-C6 alkyl group is optionally substituted by a substituent B .
  • Z in the formula (1) is an aryl group which may be optionally substituted 0 to 7 with R 4 (wherein each R 4 having 2 or more substituents is independent of each other) or 0 to 6 as appropriate substituted with R 4 And optionally represents a heterocyclic group which may be independent of each other in the case of R 4 having 2 or more substituents.
  • Z is a phenyl group which may be optionally substituted 0 to 5 with R 4 (wherein each R 4 is independently substituted in the case of R 4), and a naphthyl group which may be optionally substituted 0 to 7 with R 4 ( However, in the case of R 4 having 2 or more substituents, they are each independently pyridyl), pyridyl, pyridazinyl, pyrimidinyl, pyrazinyl, triazinyl or tetrazinyl which may be optionally substituted 0 to 4 with R 4 (wherein, In the case of R 4 of two or more substituents, they are each independently), thienyl group which may be optionally substituted 0 to 3 with R 4, thiazolyl group, isothiazolyl group, thiadiazolyl group, or thiatriazolyl group (with the proviso that R4 is disubstituted or more) Pyrrolyl group, pyr
  • quinolinyl group optionally substituted with 0 to 6 by R 4 isoquinolyl group, cinolyl group, phthalazinyl group, quinoxalinyl group, quinazolinyl group, or naphthyridinyl group (in the case of R 4 having two or more substituents, each of which is independent of each other) Or a 3 to 6 membered ring group containing 1 or 2 oxygen atoms,
  • Z is a phenyl group which may be optionally substituted 0 to 5 with R 4 (provided that they are each independently in the case of R 4 having 2 or more substituents), and a pyridyl group which may be optionally substituted 0 to 4 with R 4, A pyridazinyl group, a pyrimidinyl group, a pyrazinyl group, a triazinyl group, or a tetrazinyl group (provided that they are each independently in the case of R4 having 2 or more substituent
  • Z is a phenyl group which may be optionally substituted 0 to 5 with R 4 (provided that each is independently in the case of R 4 having 2 or more substituents), a pyrazolyl group which may be optionally substituted 0 to 4 with R 4, An imidazolyl group, a triazolyl group (provided that they are each independently in the case of R4 having 2 or more substituents), an oxazolyl group optionally substituted by 0 to 3 with R4, or an isoxazolyl group (note that R4 having 2 or more substituents) In each case, they are preferably independent of each other).
  • Na in the formula (h) represents an integer of 0 to 5.
  • na in the formula (h) is 2 or more
  • two or more substituents R4 each independently represent a substituent, which may be the same or different and can be arbitrarily selected.
  • nb represents an integer of 0 to 7.
  • R4s each having 2 or more substituents represent independent substituents, which may be the same or different, and can be arbitrarily selected.
  • each of pyridyl, pyridazinyl, pyrimidinyl, pyrazinyl, triazinyl or tetrazinyl in Z of Formula (1) (wherein each of R 4 may be optionally substituted 0 to 4 optionally with 0 to 4 substitution) (Independent) represents the partial structure shown below with formula (j).
  • G1, G2, G3, G4 and G5 in Formula (j) are each independently a carbon atom or a nitrogen atom. However, at least one of G1, G2, G3, G4, and G5 is a nitrogen atom. In preferred G1, G2, G3, G4 and G5, any one of G1, G2, G3, G4 and G5 is a nitrogen atom. That is, it is a pyridyl group.
  • nc represents an integer of 0 to 4.
  • nc in the formula (j) is 2 or more
  • two or more substituents R4 each independently represent a substituent, which may be the same or different, and can be arbitrarily selected.
  • a thienyl group which may be optionally substituted by R 4 a thiazolyl group, an isothiazolyl group, a thiadiazolyl group, or a thiatriazolyl group” (in the case of two or more substituted R 4, each independently are the following partial structures represented by the formula (k-1) and the formula (k-2).
  • G6, G7 and G8 in Formula (k-1) and Formula (k-2) are each independently represent a carbon atom or a nitrogen atom.
  • nd represents an integer of 0 to 3.
  • substituted R4's each independently represent a substituent, which may be the same or different and may be optionally selected it can.
  • each of“ a pyrrolyl group optionally substituted with 0 to 4 R 4 optionally having 0 to 4 substitution with R 4, a pyrazolyl group, an imidazolyl group, a triazolyl group, a tetrazolyl group or a pentazolyl group ”in Z of Formula (1) Independently)) represents a partial structure shown below which is represented by formula (1-1), formula (1-2), and formula (1-3).
  • G9, G10, G11 and G12 in Formula (1-1), Formula (1-2) and Formula (1-3) are each independently a carbon atom or a nitrogen atom.
  • ne represents an integer of 0 to 4.
  • the formula (I-2) and the formula (I-3) is 2 or more, two or more substituted R 4 s independently represent an independent substituent and may be the same or different. , Can be selected arbitrarily.
  • G13, G14 and G15 in Formula (m-1) and Formula (m-2) are each independently represent a carbon atom or a nitrogen atom.
  • Nf in the formulas (m-1) and (m-2) represents an integer of 0 to 3.
  • nf in the formula (m-1) and the formula (m-2) is 2 or more
  • two or more substituted R4's each independently represent a substituent, which may be the same or different and may be optionally selected it can.
  • G16 and G17 in Formula (n-1) and Formula (n-2) are each independently represent a carbon atom or a nitrogen atom.
  • ng represents an integer of 0 to 6.
  • two or more substituted R4's each independently represent a substituent, which may be the same or different and may be optionally selected it can.
  • a benzofuryl group which may be optionally substituted by 0 to 4, an isobenzofuryl group, a benzoxazolyl group, a benzoisoxazolyl group or a benzooxadiazolyl group” in Z of the formula (1) (wherein, In the case of R 4 having 2 or more substituents, they are each independently.) Represents a partial structure shown below as represented by Formula (schreib-1) and Formula (schreib-2).
  • G18 and G19 in Formula (schreib-1) and Formula (schreib-2) are each independently represent a carbon atom or a nitrogen atom.
  • Nh in the formulas (ish-1) and ( réelle-2) represents an integer of 0 to 5.
  • nh in the formula (schreib-1) and the formula (schreib-2) is 2 or more, two or more substituted R 4 s independently represent an independent substituent, which may be the same or different and may be optionally selected it can.
  • R 4 having two or more substituents,“ a benzothienyl group which may be optionally substituted with 0 to 4 R 4, a benzothiazolyl group, a benzoisothiazolyl group, or a benzothiadiazolyl group ”in Z of Formula (1) And each independently represents a partial structure shown by the formula (p-1) and the formula (p-2) shown below.
  • G20 and G21 in Formula (p-1) and Formula (p-2) are each independently a carbon atom or a nitrogen atom.
  • ni represents an integer of 0 to 5.
  • ni in the formula (p-1) and the formula (p-2) is 2 or more
  • two or more substituted R4's each independently represent a substituent, which may be the same or different and may be optionally selected it can.
  • “Indolizinyl group optionally substituted with 0 to 6 R 4 optionally substituted with R 4, imidazo pyridyl group, pyrazolo pyridyl group, or triazolo pyridyl group” in Z of Formula (1) (however, in the case of R 4 having two or more substituents, each independently ) Represents a partial structure shown by the following formula (q).
  • G22, G23 and G24 in Formula (q) are each independently a carbon atom or a nitrogen atom.
  • N j in the formula (q) represents an integer of 0 to 6.
  • n j in the formula (q) is 2 or more, two or more substituents R 4 each represent an independent substituent, which may be the same or different, and can be selected arbitrarily.
  • the pyrrolopyrimidinyl group optionally substituted with 0 to 5 substituents for R 4 in formula (1), imidazo pyrimidinyl group, pyrazolo pyrimidinyl group, triazolo pyrimidinyl group, pyrrolo pyrazinyl group, imidazo pyrazinyl group, pyrazolo pyrazinyl Group or a triazolopyrazinyl group (in the case of R4 having 2 or more substituents, each of which is independent of each other) is a group represented by the formula (r-1), the formula (r-2), and the formula (r-3) It represents the partial structure shown below).
  • G25, G26 and G27 in formulas (r-1), (r-2) and formula (r-3) are each independently a carbon atom or a nitrogen atom.
  • nk represents an integer of 0 to 5.
  • nk in the formulas (r-1), (r-2) and the formula (r-3) is 2 or more, two or more substituted R4's each independently represent a substituent, which may be the same or different, It can be selected arbitrarily.
  • each of“ a quinolyl group optionally substituted with 0 to 4 R 4 may be optionally substituted with R 4, isoquinolyl group, cinolyl group, phthalazinyl group, quinoxalinyl group or quinazolinyl group ”in Z of Formula (1) (Independent) represents a partial structure shown by the formula (s-1) and the formula (s-2) shown below.
  • G28, G29, G30, and G31 in Formula (s-1) and Formula (s-2) are each independently a carbon atom or a nitrogen atom. However, at least one of G28, G29, G30, and G31 is a nitrogen atom. In formula (s-1), as preferred G26, G27, G28 and G29, one of G26, G27, G28 and G29 is a nitrogen atom. That is, it is a quinolyl group.
  • nl represents an integer of 0 to 6.
  • n1 in the formula (s-1) and the formula (s-2) is 2 or more, two or more R.sup.4 each represents an independent substituent, which may be the same or different and may be selected arbitrarily it can.
  • the “3 to 6-membered ring group containing one or two oxygen atoms” in the formula (1) is as defined above, preferably an oxolanyl group, an oxanyl group, a 1,3-dioxolanyl group, Or a 1,3-dioxanyl group, more preferably a 1,3-dioxolanyl group or a 1,3-dioxanyl group.
  • R 4 in the formula (1) is optionally substituted with a hydroxyl group, a cyano group, a nitro group, a halogen atom, a C1 to C6 alkyl group optionally substituted with a substituent C, a C1 to C6 haloalkyl group, a substituent C C3-C8 cycloalkyl group which may be substituted, C2-C6 alkenyl group optionally substituted with substituent C, C2-C6 haloalkenyl group, C2-C6 optionally substituted with substituent C C 2 -C 6 haloalkynyl group, C 1 -C 6 alkoxy group optionally substituted with substituent C, C 1-C 6 haloalkoxy group, C 3 -C 8 optionally substituted with substituent C Of C2 to C6 alkenyloxy group optionally substituted with substituent C, C2 to C6 haloalkenyloxy group, C3 to C6 optionally substituted with substituent C
  • Rx 3 represents a hydrogen atom, a C1-C6 alkyl group optionally substituted with a substituent B, a C1-C6 haloalkyl group, or a C3-C8 cycloalkyl group.
  • R 4 in the formula (1) includes a hydroxyl group, a cyano group and a nitro group.
  • the halogen atom in R 4 of the formula (1) is as defined above, and is preferably a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.
  • the C1-C6 alkyl group of the “C1-C6 alkyl group optionally substituted with substituent C” in R 4 of Formula (1) has the same definition as described above, and preferably a methyl group or an ethyl group A propyl group, an isopropyl group, a butyl group or an isobutyl group, and more preferably a methyl group, an ethyl group, a propyl group or an isopropyl group.
  • the hydrogen atom in the C1-C6 alkyl group is optionally substituted by the substituent C.
  • the “C1 to C6 haloalkyl group” in R 4 of the formula (1) is as defined above, preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, 2,2,2 -Trifluoroethyl group, 3,3-difluoropropyl group, or 3,3,3-trifluoropropyl group, more preferably difluoromethyl group, trifluoromethyl group, 2,2-difluoroethyl group, or 2,2,2-trifluoroethyl group.
  • the C3 to C8 cycloalkyl group of the "C3 to C8 cycloalkyl group optionally substituted with substituent C" in R4 of the formula (1) has the same meaning as described above, preferably a cyclopropyl group A cyclobutyl group, a cyclopentyl group or a cyclohexyl group, more preferably a cyclopropyl group or a cyclobutyl group.
  • the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent C.
  • the C2-C6 alkenyl group of the "C2-C6 alkenyl group optionally substituted with substituent C" in R4 of the formula (1) has the same definition as described above, and preferably a vinyl group, 1- Propenyl group, allyl group, 1-butenyl group, 2-butenyl group, or 3-butenyl group, more preferably vinyl group, 1-propenyl group or allyl group.
  • substituent C the hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent C.
  • the “C2 to C6 haloalkenyl group” in R 4 of the formula (1) is as defined above, preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group or a 2,2-dichlorovinyl group And 3-fluoroallyl, 3,3-difluoroallyl or 3,3-dichloroallyl, more preferably 2-fluorovinyl or 2,2-difluorovinyl.
  • the C2 to C6 alkynyl group of the “C2 to C6 alkynyl group optionally substituted with substituent C” in R 4 of the formula (1) has the same definition as described above, preferably an ethynyl group, 1- Propynyl group, propargyl group, 1-butynyl group, 2-butynyl group or 3-butynyl group is preferable, and ethynyl group, 1-propynyl group or propargyl group is more preferable.
  • the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent C.
  • the “C2-C6 haloalkynyl group” in R 4 of the formula (1) is as defined above, preferably a 3,3-difluoro-1-propynyl group, 3,3,3-trifluoro-1 -Propynyl group, 4,4-difluoro-1-butynyl group, 4,4-difluoro-2-butynyl group, 4,4,4-trifluoro-1-butynyl group, or 4,4,4-trifluoro- 2-butynyl group, more preferably 3,3-difluoro-1-propynyl group or 3,3,3-trifluoro-1-propynyl group.
  • the C1-C6 alkoxy group of the "C1-C6 alkoxy group optionally substituted with substituent C" in R4 of the formula (1) has the same definition as described above, preferably a methoxy group or an ethoxy group A propyloxy group, an isopropyloxy group, a butoxy group, an isobutoxy group or a pentyloxy group, and more preferably a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group or a butoxy group.
  • a hydrogen atom in the C1 to C6 alkoxy group is optionally substituted by the substituent C.
  • the “C1 to C6 haloalkoxy group” in R 4 of the formula (1) is as defined above, preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2, 2-trifluoroethoxy group, 3,3-difluoropropyloxy group, or 3,3,3-trifluoropropyloxy group, more preferably difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group A group or a 2,2,2-trifluoroethoxy group.
  • the C3 to C8 cycloalkoxy group of the "C3 to C8 cycloalkoxy group which may be optionally substituted with substituent C" in R4 of the formula (1) has the same definition as that described above, preferably, cyclopropyloxy A cyclobutoxy group, a cyclopentyloxy group or a cyclohexyloxy group, more preferably a cyclopropyloxy group or a cyclobutoxy group.
  • the hydrogen atom in the C3-C8 cycloalkoxy group is optionally substituted by the substituent C.
  • the C2-C6 alkenyloxy group of the "C2-C6 alkenyloxy group optionally substituted with substituent C" in R4 of the formula (1) has the same definition as described above, preferably a vinyloxy group, 1-propenyloxy group, allyloxy group, 1-butenyloxy group, 2-butenyloxy group, or 3-butenyloxy group, more preferably vinyloxy group, 1-propenyloxy group, or allyloxy group.
  • the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted by the substituent C.
  • the “C2 to C6 haloalkenyloxy group” in R 4 of the formula (1) is as defined above, preferably a 2-fluorovinyloxy group, a 2,2-difluorovinyloxy group, or 2,2- Dichlorovinyloxy group, 3-fluoroallyloxy group, 3,3-difluoroallyloxy group, or 3,3-dichloroallyloxy group, more preferably 2-fluorovinyloxy group, or 2,2-difluoro It is a vinyloxy group.
  • the C3 to C6 alkynyloxy group of the “C3 to C6 alkynyloxy group optionally substituted with substituent C” in R 4 of Formula (1) has the same definition as that described above, and preferably a propargyloxy group A 2-butynyloxy group or a 3-butynyloxy group, more preferably a propargyloxy group.
  • the hydrogen atom in the C3-C6 alkynyloxy group is optionally substituted by the substituent C.
  • the “C3-C6 haloalkynyloxy group” in R 4 of the formula (1) is as defined above, preferably a 4,4-difluoro-2-butynyloxy group, 4-chloro-4,4-difluoro -2-butynyloxy group, 4-bromo-4,4-difluoro-2-butynyloxy group, or 4,4,4-trifluoro-2-butynyloxy group, more preferably 4,4-difluoro-2- It is a butynyloxy group or a 4,4,4-trifluoro-2-butynyloxy group.
  • the aryl group of the “aryl group which may be optionally substituted with the substituent D” in R 4 of the formula (1) has the same definition as the above. Preferably, it is a phenyl group or a naphthyl group, more preferably a phenyl group.
  • the hydrogen atom in the aryl group is optionally substituted by the substituent D.
  • heteroaryl group of the “heteroaryl group which may be optionally substituted with the substituent D” in R 4 of the formula (1) has the same definition as the above.
  • Pentazolyl group, furyl group, oxazolyl group, isoxazolyl group, oxadiazolyl group or oxatriazolyl group more preferably pyridyl group, pyridazinyl group, pyrimidinyl group, pyrazinyl group, thienyl group, thiazolyl group, isothiazolyl group, Thiadiazolyl group, pyrrolyl group, pyrazolyl group, imidazolyl group, triazolyl group, furyl group, oxazolyl group, isoxazolyl group, or oxadiazolyl group.
  • the hydrogen atom in the heteroaryl group is optionally substituted by the substituent D.
  • the aryloxy group of "an aryloxy group which may be optionally substituted with a substituent D" in R 4 of the formula (1) has the same definition as the above.
  • it is a phenoxy group or a naphthyloxy group, more preferably a phenoxy group.
  • the hydrogen atom in the aryloxy group is optionally substituted by the substituent D.
  • heteroaryloxy group of “the heteroaryloxy group which may be optionally substituted with the substituent D” in R 4 of the formula (1) is as defined above.
  • Azolyloxy group Asian benzotriazolyl group, pyrrolyloxy group, a pyrazolyloxy group, imidazolyloxy group, triazolyl group, furyl group, benzoxazolyl group, benzisoxazolyl group or oxadiazolyl group.
  • the hydrogen atom in the heteroaryloxy group is optionally substituted by the substituent D.
  • the aralkyloxy group of the “aralkyloxy group which may be optionally substituted with the substituent D” in R 4 of the formula (1) has the same definition as the above.
  • it is a benzyloxy group, a phenethyloxy group, or a naphthylmethyloxy group, and more preferably a benzyloxy group or a phenethyloxy group.
  • the hydrogen atom in the aralkyloxy group is optionally substituted by the substituent D.
  • Ra and Rb of "RaRbN-" in R4 of Formula (1) are as defined above.
  • RaRbN- preferably, amino, methylamino, ethylamino, propylamino, isopropylamino, (methoxymethyl) amino, (2-methoxyethyl) amino, (cyanomethyl) amino, (2-cyanoethyl) amino group, dimethylamino group, ethyl (methyl) amino group, methyl (propyl) amino group, isopropyl (methyl) amino group, (methoxymethyl) methylamino group, (2-methoxyethyl) methylamino group (Cyanomethyl) methylamino group, (2-cyanoethyl) methylamino group, diethylamino group, ethyl (propyl) amino group, ethyl (isopropyl) amino group, ethyl (methoxymethyl) amino group, e
  • Rc and L of "Rc-L-" in R4 of Formula (1) are as defined above.
  • Rc-L- is a methylthio group, a methanesulfinyl group, a methanesulfonyl group, a trifluoromethylthio group, a trifluoromethanesulfinyl group, or a trifluoromethanesulfonyl group, and more preferably a methylthio group, a methanesulfinyl group Or a methanesulfonyl group.
  • Rx2 preferably, a hydrogen atom, methyl group, methoxymethyl group, cyanomethyl group, ethyl group, difluoromethyl group, trifluoromethyl group, cyclopropyl group, methoxy group, ethoxy group, 2, 2-difluoroethoxy, 2,2-trifluoroethoxy, cyclopropyloxy, amino, methylamino, ethylamino, (methoxymethyl) amino, (2-methoxyethyl) amino, (cyanomethyl) amino, (2- Cyanoethyl) amino group, dimethylamino group, ethylmethylamino group, diethylamino group, (methoxymethyl) methylamino group, (2-methoxyethyl) methylamino group, (cyanomethyl) methylamino group, (2-cyanoethyl) methylamino group , 2,2-difluoroethylamino group, 2,
  • Rx 3 preferably, a hydrogen atom, a methyl group, a methoxymethyl group, an ethoxymethyl group, a cyanomethyl group, an ethyl group, a 2-methoxyethyl group, a 2-ethoxyethyl group, a 2-cyanoethyl group, a propyl group, 2-difluoroethyl group, 2,2,2-trifluoroethyl group, or cyclopropyl group, more preferably hydrogen atom, methyl group, methoxymethyl group, cyanomethyl group, ethyl group, 2-methoxyethyl group, It is a 2,2-difluoroethyl group or a 2,2,2-trifluoroethyl group.
  • W in the formula (1) represents a C1 to C6 alkylene group which may be optionally substituted 0 to 2 with R 5.
  • W is preferably a methylene group which may be optionally substituted 0 to 2 with R 5, or an ethylene group, In particular, W is preferably a methylene group which may be optionally substituted 0 to 2 with R 5.
  • the alkylene group of “a C1 to C6 alkylene group optionally substituted by 0 to 2 R 5 optionally for W in the formula (1)” has the same meaning as defined above, preferably a methylene group or an ethylene group And more preferably a methylene group.
  • R5 When having a substituent R5, the hydrogen atom in the C1-C6 alkylene group is optionally substituted by the substituent R5.
  • R5 in the formula (1) may be optionally substituted with a hydroxyl group, a cyano group, a halogen atom, a C1-C6 alkyl group optionally substituted with a substituent C, a C1-C6 haloalkyl group, a substituent C
  • R5 is a hydroxyl group, a halogen atom, a C1 to C6 alkyl group optionally substituted with a substituent C, a C1 to C6 haloalkyl group, a C1 to C6 alkoxy group optionally substituted with a substituent C, C1-C6 haloalkoxy group, C2-C6 alkenyloxy group optionally substituted with substituent C, C2-C6 haloalkenyloxy group, C3-C6 alkynyl optionally substituted with substituent C
  • R5 is preferably a hydroxyl group, a halogen atom, or a C1 to C6 alkoxy group which may be optionally substituted by a substituent C.
  • R 5 in the formula (1) includes a hydroxyl group and a cyano group.
  • the halogen atom in R5 of the formula (1) is as defined above, preferably a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.
  • the C1-C6 alkyl group of the "C1-C6 alkyl group optionally substituted with substituent C" in R5 of Formula (1) has the same definition as described above, and preferably a methyl group or an ethyl group A propyl group, an isopropyl group, a butyl group or an isobutyl group, and more preferably a methyl group, an ethyl group, a propyl group or an isopropyl group.
  • the hydrogen atom in the C1-C6 alkyl group is optionally substituted by the substituent C.
  • the “C1 to C6 haloalkyl group” in R 5 of the formula (1) is as defined above, preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, 2,2,2 -Trifluoroethyl group, 3,3-difluoropropyl group, or 3,3,3-trifluoropropyl group, more preferably difluoromethyl group, trifluoromethyl group, 2,2-difluoroethyl group, or 2,2,2-trifluoroethyl group.
  • the C3 to C8 cycloalkyl group of the “C3 to C8 cycloalkyl group optionally substituted with substituent C” in R 5 of Formula (1) has the same definition as described above, and preferably a cyclopropyl group A cyclobutyl group, a cyclopentyl group or a cyclohexyl group, more preferably a cyclopropyl group or a cyclobutyl group.
  • the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent C.
  • the C2-C6 alkenyl group of the "C2-C6 alkenyl group which may be optionally substituted with substituent C" in R5 of the formula (1) has the same meaning as defined above, preferably a vinyl group, 1- Propenyl group, allyl group, 1-butenyl group, 2-butenyl group, or 3-butenyl group, more preferably vinyl group, 1-propenyl group or allyl group.
  • substituent C When having a substituent C, the hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent C.
  • the “C2 to C6 haloalkenyl group” in R 5 of the formula (1) is as defined above, preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group or a 2,2-dichlorovinyl group And 3-fluoroallyl, 3,3-difluoroallyl or 3,3-dichloroallyl, more preferably 2-fluorovinyl or 2,2-difluorovinyl.
  • the C2 to C6 alkynyl group of the “C2 to C6 alkynyl group optionally substituted with substituent C” in R 5 of the formula (1) has the same definition as described above, preferably an ethynyl group, 1- Propynyl group, propargyl group, 1-butynyl group, 2-butynyl group or 3-butynyl group is preferable, and ethynyl group, 1-propynyl group or propargyl group is more preferable.
  • the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent C.
  • the “C2-C6 haloalkynyl group” in R 5 of the formula (1) is as defined above, preferably a 3,3-difluoro-1-propynyl group, 3,3,3-trifluoro-1 -Propynyl group, 4,4-difluoro-1-butynyl group, 4,4-difluoro-2-butynyl group, 4,4,4-trifluoro-1-butynyl group, or 4,4,4-trifluoro- 2-butynyl group, more preferably 3,3-difluoro-1-propynyl group or 3,3,3-trifluoro-1-propynyl group.
  • the C1-C6 alkoxy group of the “C1-C6 alkoxy group optionally substituted with substituent C” in R 5 of Formula (1) has the same definition as that described above, preferably a methoxy group or an ethoxy group A propyloxy group, an isopropyloxy group, a butoxy group, an isobutoxy group or a pentyloxy group, and more preferably a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group or a butoxy group.
  • a hydrogen atom in the C1 to C6 alkoxy group is optionally substituted by the substituent C.
  • the “C1 to C6 haloalkoxy group” in R 5 of the formula (1) is as defined above, preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2, 2-trifluoroethoxy group, 3,3-difluoropropyloxy group, or 3,3,3-trifluoropropyloxy group, more preferably difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group A group or a 2,2,2-trifluoroethoxy group.
  • the C3 to C8 cycloalkoxy group of the "C3 to C8 cycloalkoxy group which may be optionally substituted with substituent C" in R 5 of the formula (1) has the same definition as that described above, preferably, cyclopropyloxy A cyclobutoxy group, a cyclopentyloxy group or a cyclohexyloxy group, more preferably a cyclopropyloxy group or a cyclobutoxy group.
  • the hydrogen atom in the C3-C8 cycloalkoxy group is optionally substituted by the substituent C.
  • the C2-C6 alkenyloxy group of the "C2-C6 alkenyloxy group optionally substituted with substituent C" in R5 of Formula (1) has the same definition as described above, and preferably a vinyloxy group, 1-propenyloxy group, allyloxy group, 1-butenyloxy group, 2-butenyloxy group, or 3-butenyloxy group, more preferably vinyloxy group, 1-propenyloxy group, or allyloxy group.
  • the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted by the substituent C.
  • the “C2 to C6 haloalkenyloxy group” in R 5 of the formula (1) is as defined above, preferably a 2-fluorovinyloxy group, a 2,2-difluorovinyloxy group, or 2,2- Dichlorovinyloxy group, 3-fluoroallyloxy group, 3,3-difluoroallyloxy group, or 3,3-dichloroallyloxy group, more preferably 2-fluorovinyloxy group, or 2,2-difluoro It is a vinyloxy group.
  • the C3 to C6 alkynyloxy group of the “C3 to C6 alkynyloxy group optionally substituted with substituent C” in R 5 of the formula (1) has the same definition as that described above, preferably a propargyloxy group A 2-butynyloxy group or a 3-butynyloxy group, more preferably a propargyloxy group.
  • substituent C When having a substituent C, the hydrogen atom in the C3-C6 alkynyloxy group is optionally substituted by the substituent C.
  • the “C3-C6 haloalkynyloxy group” in R 5 of the formula (1) is as defined above, preferably a 4,4-difluoro-2-butynyloxy group, 4-chloro-4,4-difluoro -2-butynyloxy group, 4-bromo-4,4-difluoro-2-butynyloxy group, or 4,4,4-trifluoro-2-butynyloxy group, more preferably 4,4-difluoro-2- It is a butynyloxy group or a 4,4,4-trifluoro-2-butynyloxy group.
  • Rc and L of “Rc-L-” in R 5 of Formula (1) are as defined above.
  • Rc-L- is a methylthio group, a methanesulfinyl group, a methanesulfonyl group, a trifluoromethylthio group, a trifluoromethanesulfinyl group, or a trifluoromethanesulfonyl group, and more preferably a methylthio group, a methanesulfinyl group Or a methanesulfonyl group.
  • Substituent group A is a hydroxyl group, a cyano group, a C3 to C8 cycloalkyl group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, a C3 to C8 cycloalkoxy group, RaRbN- (wherein Ra and Rb And Rc are as defined above), and Rc-L- (wherein Rc and L are as defined above), and at least one selected from the group consisting of
  • the substituent A is preferably a cyano group, a C1-C6 alkoxy group or Rc-L- (wherein Rc and L are as defined above).
  • Rc and L are as defined above.
  • a cyano group or a C1-C6 alkoxy group is preferable.
  • substituent A hydroxyl group; cyano group; A cyclopropyl group, a cyclobutyl group, a cyclopentyl group and a cyclohexyl group as a C3-C8 cycloalkyl group; As a C1 to C6 alkoxy group, a methoxy group, an ethoxy group, a propyloxy group, and an isopropyloxy group; As a C1-C6 haloalkoxy group, a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, a 2,2,2-trifluoroethoxy group, a 3,3-difluoropropyloxy group, and 3,3 as a C1-C6 haloalkoxy group.
  • RaRbN- wherein Ra and Rb are as defined above
  • substituent A a hydroxyl group; a cyano group; A cyclopropyl group and a cyclobutyl group as a C3-C8 cycloalkyl group; A methoxy group and an ethoxy group as a C1 to C6 alkoxy group; As a C1-C6 haloalkoxy group, a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group; A cyclopropyloxy group and a cyclobutoxy group as a C3 to C8 cycloalkoxy group; A dimethylamino group, an ethyl (methyl) amino group, and a diethylamino group as RaRbN- (wherein Ra and Rb are as defined above); And Rc-L- (wherein Rc and L are as defined above) include a
  • the substituent B represents at least one selected from the group consisting of a cyano group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, and a C3 to C8 cycloalkoxy group.
  • the substituent B is preferably a cyano group or a C1-C6 alkoxy group.
  • substituent B a cyano group
  • substituent B a cyano group
  • a C1 to C6 alkoxy group a methoxy group, an ethoxy group, a propyloxy group, and an isopropyloxy group
  • a C1-C6 haloalkoxy group a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, a 2,2,2-trifluoroethoxy group, a 3,3-difluoropropyloxy group, and 3,3 as a C1-C6 haloalkoxy group.
  • a C3-C8 cycloalkoxy group includes cyclopropyloxy group, cyclobutoxy group, cyclopentyloxy group, and cyclohexyloxy group.
  • a cyano group A methoxy group and an ethoxy group as a C1 to C6 alkoxy group;
  • a C1-C6 haloalkoxy group a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group;
  • C3-C8 cycloalkoxy groups include cyclopropyloxy and cyclobutoxy.
  • the substituent C is a hydroxyl group, a cyano group, a C3 to C8 cycloalkyl group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, a C3 to C8 cycloalkoxy group, Rc-L- (wherein Rc and L are as defined above, or Rx1C ((O) — (wherein, Rx1 is as defined above) is preferable, In particular, a hydroxyl group or a C1 to C6 alkoxy group is preferable.
  • substituent C a hydroxyl group; a cyano group; A cyclopropyl group, a cyclobutyl group, a cyclopentyl group and a cyclohexyl group as a C3-C8 cycloalkyl group; As a C1 to C6 alkoxy group, a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group, a butoxy group, an isobutoxy group, and a t-butoxy group; As a C1-C6 haloalkoxy group, a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, a 2,2,2-trifluoroethoxy group, a 3,3-difluoropropyloxy group, and 3,3 as a C1-C6 haloalkoxy group.
  • a C2 to C6 alkoxyalkoxy group a methoxymethoxy group, an ethoxymethoxy group, a methoxyethoxy group, an ethoxyethoxy group, and a methoxypropyloxy group;
  • RaRbN- wherein Ra and Rb are as defined above
  • substituent C a hydroxyl group; a cyano group; A cyclopropyl group and a cyclobutyl group as a C3-C8 cycloalkyl group; A methoxy group and an ethoxy group as a C1 to C6 alkoxy group; As a C1-C6 haloalkoxy group, a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group; A cyclopropyloxy group, a cyclobutoxy group as a C3-C8 cycloalkoxy group; As a C2 to C6 alkoxyalkoxy group, a methoxymethoxy group, an ethoxymethoxy group, a methoxyethoxy group, and an ethoxyethoxy group; A dimethylamino group, an ethyl group and a cyclobut
  • Substituent D includes a hydroxyl group, a cyano group, a nitro group, a halogen atom, a C1 to C6 alkyl group optionally substituted with substituent B, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group, C1 to C6. It represents at least one selected from the group consisting of a C6 alkoxy group, a C1 to C6 haloalkoxy group, and a C3 to C8 cycloalkoxy group.
  • the substituent D is a hydroxyl group, a cyano group, a halogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, a C1 to C6 alkoxy group, and a C1 to C6 halo.
  • An alkoxy group is preferred,
  • a halogen atom, a C1-C6 alkyl group which may be optionally substituted with a substituent B, and a C1-C6 alkoxy group are preferable.
  • substituent D is as defined above.
  • a C1-C6 alkyl group optionally substituted with a substituent B when having a substituent B, the hydrogen atom in the C1-C6 alkyl group is optionally substituted by a substituent B .
  • substituent D hydroxyl group; cyano group; nitro group;
  • substituent B a halogen atom, a fluorine atom, a chlorine atom, a bromine atom and an iodine atom;
  • substituent B a C1 to C6 alkyl group which may be optionally substituted by substituent B, a methyl group, a methoxymethyl group, an ethoxymethyl group, a cyanomethyl group, an ethyl group, a 2-methoxyethyl group, a 2-ethoxyethyl group, 2-cyanoethyl group , Propyl, isopropyl, butyl and isobutyl;
  • a C 1 to C 6 haloalkyl group difluoromethyl group, trifluoromethyl group, 2,2-difluoroethyl group, 2,2,2-trifluoroethyl group, 3,3-difluoropropyl group, and 3,3,3
  • a C3-C8 cycloalkoxy group includes cyclopropyloxy group, cyclobutoxy group, cyclopentyloxy group, and cyclohexyloxy group.
  • substituent D a hydroxyl group; a cyano group; a nitro group; As a halogen atom, a fluorine atom, a chlorine atom and a bromine atom;
  • substituent B a C1 to C6 alkyl group which may be optionally substituted by substituent B, a methyl group, a methoxymethyl group, an ethoxymethyl group, a cyanomethyl group, an ethyl group, a 2-methoxyethyl group, a 2-ethoxyethyl group, and 2- Cyanoethyl group;
  • a C1 to C6 haloalkyl group a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, and a 2,2,2-trifluoroethyl group;
  • a cyclopropyl group and a cyclobutyl group as a C3-C8 cycloal
  • the compound represented by Formula (1) may have axial asymmetry.
  • the isomer ratio in this case is a single or arbitrary mixing ratio, and is not particularly limited.
  • the compound represented by formula (1) may contain an asymmetric atom.
  • the isomer ratio in this case is a single or arbitrary mixing ratio, and is not particularly limited.
  • the compounds represented by formula (1) may contain geometric isomers.
  • the isomer ratio in this case is a single or arbitrary mixing ratio, and is not particularly limited.
  • the compound represented by Formula (1) may be able to form a salt.
  • Examples include acid salts such as hydrochloric acid, sulfuric acid, acetic acid, fumaric acid and maleic acid, metal salts such as sodium, potassium and calcium, etc., but they are particularly limited as long as they can be used as agricultural and horticultural fungicides There is no.
  • the method for producing the compound represented by the formula (1) of the present invention is shown.
  • the method for producing the compound of the present invention is not limited to production methods A to Q.
  • U 1 represents a C 1 to C 6 alkyl group, a C 1 to C 6 aralkyl group, or a C 1 to C 6 heteroaralkyl group
  • R 8 represents a hydrogen atom or a C 1 to C 6 alkyl group
  • R 2 X and Y represent , And the same as the above.
  • Production method A is a method for producing a compound represented by the formula (4) which is a production intermediate of the compound of the present invention, and when it is represented by the formula (2), a compound represented by the formula (3) And a reaction in the presence of a base in a solvent.
  • the compound represented by Formula (2) used for this reaction can be obtained as a commercial item, or can be manufactured using a reference example or a well-known method.
  • the compound represented by Formula (3) used for this reaction can be obtained as a commercial item, or can be manufactured by a well-known method.
  • the amount of the compound represented by the formula (3) used in the present reaction is particularly limited as long as the target reaction proceeds, provided that the amount is 1 equivalent or more with respect to the compound represented by the formula (2) Although it is not, it is usually 1 equivalent or more and 3 equivalents or less.
  • Bases used in this reaction include inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate and tripotassium phosphate, and metal alkoxides such as sodium methoxide, sodium ethoxide, sodium t-butoxide and potassium t-butoxide Etc.
  • inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate and tripotassium phosphate
  • metal alkoxides such as sodium methoxide, sodium ethoxide, sodium t-butoxide and potassium t-butoxide Etc.
  • the base used for this reaction is not particularly limited as long as the target reaction proceeds, but is usually 0.01 equivalent or more and 3 equivalents or less with respect to the compound represented by Formula (2) .
  • Solvents used for this reaction include ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc., benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, etc.
  • ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc.
  • benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, etc.
  • Ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, 1,3-dimethyl Urea solvents such as -2-imidazolidinone, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, sulfur solvents such as dimethylsulfoxide and sulfolane, acetone, methyl ethyl ketone, methyl Ketone solvents such as Sobuchiruketon like. These solvents may be used alone or in combination of two or more in any proportion.
  • the amount of solvent used for this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 to 200 times by weight the amount of the compound represented by Formula (2). is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually ⁇ 50 ° C. or more and 150 ° C. or less or the boiling point or less of the solvent.
  • aqueous solution for post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid
  • An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc.
  • solvents not compatible with water such as hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible to add.
  • reaction mixture containing the compound represented by the formula (4) obtained above is sodium sulfate and Although water can be removed by a desiccant such as magnesium sulfate, it is not essential.
  • reaction mixture containing the compound represented by the formula (4) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
  • the reaction mixture containing the compound represented by the formula (4) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like using an appropriate solvent. It may be appropriately set according to the target purity.
  • R 8 a represents a C 1 to C 6 alkyl group
  • R 2, X, Y and U 1 are as defined above.
  • Production method B is a method for obtaining a production intermediate represented by formula (4b) among the compounds represented by formula (4), wherein the compound represented by formula (4a) is subjected to acidic conditions or base conditions It is a manufacturing method including reacting in a solvent under sexual conditions.
  • Examples of the acid used in this reaction include inorganic acids such as hydrochloric acid, hydrobromic acid and phosphoric acid, and organic acids such as acetic acid, methanesulfonic acid, p-toluenesulfonic acid and trifluoroacetic acid. There is no particular limitation as long as the target reaction proceeds.
  • the amount of the acid used in this reaction may be a catalytic amount, and is not particularly limited as long as the target reaction proceeds, but generally 0.01 relative to the compound represented by formula (4a) It is more than equivalent. Moreover, it is also possible to use as a solvent regarding liquid acid.
  • the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is not limited to an aqueous solvent, an acidic solvent such as acetic acid or methanesulfonic acid, diethyl ether, diisopropyl ether, methyl-t- Ether solvents such as butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ethyl acetate, isopropyl acetate, acetic acid Ester solvents such as butyl, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, 1,3-
  • the amount of solvent used for this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 to 200 times by weight the amount of the compound represented by Formula (4a). is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually 0 ° C. or more and 180 ° C. or less or the boiling point or less of the solvent.
  • Examples of the base used in this reaction include inorganic bases such as lithium hydroxide, sodium hydroxide and potassium hydroxide, but there is no particular limitation as long as the target reaction proceeds.
  • the base used in this reaction is not particularly limited as long as the target reaction proceeds, provided that it has 1 equivalent or more relative to the compound represented by Formula (4a), but usually 1 equivalent or more. It is less than equivalent weight.
  • the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but water solvents, diethyl ether, diisopropyl ether, methyl-t-butyl ether, ethers such as dimethoxyethane, tetrahydrofuran, dioxane, etc.
  • Solvents alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitriles such as acetonitrile Amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloromethane Down, chloroform, and halogen solvents such as carbon tetrachloride. These solvents may be used alone or in combination of two or more in any proportion.
  • the amount of solvent used for this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 to 200 times by weight the amount of the compound represented by Formula (4a). is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually ⁇ 20 ° C. or more and 180 ° C. or less or the boiling point or less of the solvent.
  • Post-treatment of the reaction can be carried out in a common manner between the reaction under acidic conditions and the reaction under basic conditions.
  • a liquid separation operation can be performed by adding water or an appropriate aqueous solution to the reaction mixture.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid
  • An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc., solvents not compatible with water such as hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible to add. In addition, these solvents can be used alone or in combination of two or more in any proportion. The number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield.
  • reaction mixture containing the compound represented by Formula (4b) obtained above can remove water with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
  • reaction mixture containing the compound represented by the formula (4b) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
  • the reaction mixture containing the compound represented by the formula (4b) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like using an appropriate solvent. It may be appropriately set according to the target purity.
  • the compound represented by the formula (4b) is a compound represented by the formula (4b ′) (Wherein R 2, X, Y and U 1 are as defined above) It also includes the isomer represented by
  • the compound represented by the formula (4b ′) can be handled in the same manner as the compound represented by the formula (4b), and can be applied to, for example, the production method C.
  • the compound represented by the formula (4b ') contains an asymmetric carbon
  • the isomer mixing ratio may be a single one or a mixture of any ratio.
  • it may be a mixture of the compound represented by the formula (4b) and the compound represented by the formula (4b ′), and the isomer mixing ratio may be a single or a mixture of any ratio.
  • R 9 represents a hydrogen atom, a hydroxyl group, a cyano group, a C 1 to C 6 alkyl group optionally substituted with substituent A, a C 1 to C 6 haloalkyl group, C 3 optionally substituted with substituent A C8 cycloalkyl group, C2 to C6 alkenyl group optionally substituted with substituent A, C2 to C6 haloalkenyl group, C2 to C6 alkynyl group optionally substituted with substituent A, C2 to C6 C6 haloalkynyl group, C1 to C6 alkoxy group optionally substituted with substituent A, C1 to C6 haloalkoxy group, C3 to C8 cycloalkoxy group optionally substituted with substituent A, substitution A C2 to C6 alkenyloxy group which may be optionally substituted by a group A, a C2 to C6 haloalkenyloxy group, a C3 to C6 al
  • the present invention is a production intermediate of the compound A method of obtaining a compound represented by the formula (5), a compound R1NH 2 of the formula (4), the reaction in the presence of an acid Manufacturing method including the step of
  • R9NH 2 used in this reaction can be produced by obtaining or known manner as a commercially available product.
  • R9NH 2 are hydrochloric, may be those forming a salt with an acidic compound such as acetic acid, it is not particularly limited as long as the reaction proceeds to the desired.
  • R9NH 2 used in this reaction may be at least 1 equivalent with respect to the compound represented by Formula (4), and is not particularly limited as long as the target reaction proceeds, but usually 1 equivalent More than 200 equivalents.
  • Examples of the acid used in this reaction include inorganic acids such as hydrochloric acid and sulfuric acid, and organic acids such as acetic acid, methanesulfonic acid and p-toluenesulfonic acid, and there is no particular limitation as long as the target reaction proceeds. None but is preferably acetic acid. Further, when using salts of R9NH 2 and the acidic compound, the use of acid is not essential.
  • the amount of the acid used in this reaction may be 1 equivalent or more with respect to R 9 NH 2 , and is not particularly limited as long as the target reaction proceeds, but is usually 1 equivalent or more and 200 equivalents or less .
  • the acid used is a liquid, it can also be used as a solvent.
  • the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but acidic solvents such as acetic acid and methanesulfonic acid, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxymethane Ether solvents such as ethane, tetrahydrofuran and dioxane, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ethyl acetate, isopropyl acetate and butyl acetate Ester solvents, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, and urea solvents such as 1,3-dimethyl
  • the amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 to 200 times by weight the amount of the compound represented by Formula (4). is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually 50 ° C. or more and 180 ° C. or less or the boiling point or less of the solvent.
  • aqueous solution for post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid
  • An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc., solvents not compatible with water such as hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible to add. In addition, these solvents can be used alone or in combination of two or more in any proportion. The number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield.
  • reaction mixture containing the compound represented by Formula (5) obtained above can remove water with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
  • reaction mixture containing the compound represented by the formula (5) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
  • the reaction mixture containing the compound represented by the formula (5) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like using an appropriate solvent. It may be appropriately set according to the target purity.
  • Lv represents a leaving group such as methanesulfonyl group, trifluoromethanesulfonyl group, p-toluenesulfonyl group, halogen atom and the like, and R 1, R 2, X, Y and U 1 are as defined above.
  • Production method D is a method for obtaining a compound represented by the formula (5b), which is a production intermediate of the compound of the present invention, and the compound represented by the formula (5a) and R1-Lv in the presence of a base It is a manufacturing method including reacting in a solvent.
  • the compound represented by the formula (5a), which is a raw material of the present invention, can be produced by the production method C or Journal of Heterocyclic Chemistry (Journal of OH Chemistry), Vol. 20, pp. 65-67 (1983).
  • Non-patent documents such as J. et al.
  • R1-Lv used for this reaction can be obtained as a commercial item or can be produced by a known method.
  • Examples of the base used in this reaction include inorganic bases such as sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium hydride and the like, but are particularly limited as long as the target reaction proceeds. It will not be done.
  • the amount of the base used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (5a), and is not particularly limited as long as the target reaction proceeds, but usually 1 It is equal to or more than 10 equivalents.
  • the solvent used for this reaction is not particularly limited as long as the target reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc.
  • Alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, Amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloroethane, Chloroform, halogenated solvents such as carbon tetrachloride, dimethyl sulfoxide, sulfur-based solvents such as sulfolane, acetone, methyl ethyl ketone, ketone solvents such as methyl isobutyl ketone
  • the amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 to 200 times by weight the amount of the compound represented by Formula (5a). is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually 0 ° C. or more and 150 ° C. or less or the boiling point or less of the solvent.
  • aqueous solution for post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid
  • An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc., solvents not compatible with water such as hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible to add. In addition, these solvents can be used alone or in combination of two or more in any proportion. The number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield.
  • reaction mixture containing the compound represented by Formula (5b) obtained above can remove water with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
  • reaction mixture containing the compound represented by the formula (5b) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
  • the reaction mixture containing the compound represented by the formula (5b) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like using an appropriate solvent. It may be appropriately set according to the target purity.
  • SR represents a sulfurizing agent
  • R 1, R 2, Y and U 1 are as defined above.
  • Production method E is a method for obtaining the compound represented by the formula (5b-2) among the compounds represented by the formula (5b), wherein the compound represented by the formula (5b-1) and the sulfurizing agent It is a manufacturing method including making (SR) react in a solvent.
  • sulfurizing agent used in the present reaction examples include Lawesson's reagent (2,4-bis (4-methoxyphenyl) -1,3-dithia-2,4-diphosphetan-2,4-disulfide).
  • the amount of the sulfurizing agent used in this reaction may be 0.5 equivalents or more with respect to the compound represented by the formula (5b-1), and is particularly limited as long as the target reaction proceeds Although it is not, it is usually 1 equivalent or more and 10 equivalents or less.
  • the solvent used for this reaction is not particularly limited as long as the target reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc.
  • ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc.
  • Benzene-based solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene and the like can be mentioned. These solvents may be used alone or in combination of two or more in any proportion.
  • the amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 times by weight or more and 200 times by weight the compound represented by the formula (5b-1) It is below.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually 50 ° C. or more and 180 ° C. or less or the boiling point or less of the solvent.
  • aqueous solution for post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid
  • An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc., solvents not compatible with water such as hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible to add. In addition, these solvents can be used alone or in combination of two or more in any proportion.
  • the number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield. In addition, liquid separation operation is not essential in this reaction.
  • reaction mixture containing the compound represented by the formula (5b-2) obtained above can be freed of moisture with a desiccant such as sodium sulfate or magnesium sulfate, it is not essential.
  • reaction mixture containing the compound represented by the formula (5b-2) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
  • the reaction mixture containing the compound represented by the formula (5b-2) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like using an appropriate solvent. It may be appropriately set according to the target purity.
  • the production method F is suitably substituted with a C1 to C6 alkyl group optionally substituted with a substituent A, a C1 to C6 haloalkyl group, and a substituent A of R2a.
  • R2a-Lv used in this reaction can be obtained as a commercial product or can be produced by a known method.
  • the amount of R2a-Lv used in this reaction may be 1 equivalent or more with respect to the compound represented by Formula (5b-3), and is not particularly limited as long as the target reaction proceeds. Usually, it is 1 equivalent or more and 1.8 equivalents or less.
  • metal hydrides such as sodium hydride, organolithiums such as methyllithium, butyllithium, sec-butyllithium, t-butyllithium, hexyllithium, lithium diisopropylamide, hexamethyldisilazane
  • organolithiums such as methyllithium, butyllithium, sec-butyllithium, t-butyllithium, hexyllithium, lithium diisopropylamide, hexamethyldisilazane
  • Metal amides such as lithium, hexamethyldisilazane sodium and hexamethyldisilazane potassium are exemplified.
  • the amount of the base used in this reaction may be 1 equivalent or more to the compound represented by the formula (5b-3), and is not particularly limited as long as the target reaction proceeds, 1 equivalent or more and 10 equivalents or less.
  • the solvent used for this reaction is not particularly limited as long as the target reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc.
  • ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc.
  • benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene
  • hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane.
  • the amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 times by weight or more and 200 times by weight the compound represented by the formula (5b-3) It is below.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually ⁇ 80 ° C. or more and 100 ° C. or less or the boiling point or less of the solvent.
  • aqueous solution for post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid
  • An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl
  • a solvent which is not compatible with water such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane and chloroform, and hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane
  • these solvents can be used alone or in combination of two or more in any proportion.
  • the number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield.
  • reaction mixture containing the compound represented by the formula (5b-4) obtained above can be freed of water with a desiccant such as sodium sulfate or magnesium sulfate, it is not essential.
  • reaction mixture containing the compound represented by the formula (5b-4) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
  • the reaction mixture containing the compound represented by the formula (5b-4) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like using an appropriate solvent. It may be appropriately set according to the target purity.
  • Ox represents an oxidizing agent
  • R 1, R 2, X, Y and U 1 are as defined above.
  • Production method G is a method for obtaining a compound represented by the formula (6) which is a production intermediate of the compound of the present invention, which comprises the compound represented by the formula (5b) and an oxidizing agent (Ox) in a solvent Manufacturing method comprising reacting at.
  • metal oxides such as manganese dioxide, benzoquinones such as 2,3-dichloro-5,6-dicyano-p-benzoquinone, azobisisobutyronitrile, benzoyl peroxide and the like Radical initiators of N-chlorosuccinimide, N-bromosuccinimide, N-iodosuccinimide, 1,3-dichloro-5,5-dimethylhydantoin, 1,3-dibromo-5,5-dimethylhydantoin, 1,3- A combination of a halogenating agent such as diiodo-5,5-dimethylhydantoin can be used.
  • the oxidizing agent is a metal oxide
  • the amount of the oxidizing agent used in this reaction is not particularly limited as long as the target reaction proceeds, provided that the amount is 1 equivalent or more with respect to the compound represented by Formula (5b). It is equal to or more than 200 equivalents.
  • the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but benzene, toluene, xylene, mesitylene, benzene, such as chlorobenzene, dichlorobenzene, dichloromethane, dichloroethane, chloroform, Halogen solvents such as carbon tetrachloride and the like can be mentioned. These solvents may be used alone or in combination of two or more in any proportion.
  • the amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 times by weight or more and 200 times by weight or less with respect to the compound represented by Formula (5b) is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually 0 ° C. or more and 150 ° C. or less or the boiling point or less of the solvent.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid
  • An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc., solvents not compatible with water such as hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible to add. In addition, these solvents can be used alone or in combination of two or more in any proportion.
  • the number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield. In addition, separation operation is not essential in this reaction.
  • reaction mixture containing the compound represented by Formula (6) obtained above can remove water with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
  • reaction mixture containing the compound represented by the formula (6) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
  • the reaction mixture containing the compound represented by the formula (6) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like using an appropriate solvent. It may be appropriately set according to the target purity.
  • the amount of the oxidizing agent used in this reaction is not particularly limited as long as the target reaction proceeds, provided that the amount is 1 equivalent or more with respect to the compound represented by formula (5b). It is equal to or more than 20 equivalents.
  • the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but benzene, toluene, xylene, mesitylene, benzene, such as chlorobenzene, dichlorobenzene, dichloromethane, dichloroethane, chloroform, Halogen solvents such as carbon tetrachloride and the like can be mentioned. These solvents may be used alone or in combination of two or more in any proportion.
  • the amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 times by weight or more and 200 times by weight or less with respect to the compound represented by Formula (5b) is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually 0 ° C. or more and 150 ° C. or less or the boiling point or less of the solvent.
  • aqueous solution for post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid
  • An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc., solvents not compatible with water such as hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible to add. In addition, these solvents can be used alone or in combination of two or more in any proportion.
  • the number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield. In addition, separation operation is not essential in this reaction.
  • reaction mixture containing the compound represented by Formula (6) obtained above can remove water with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
  • reaction mixture containing the compound represented by the formula (6) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
  • the reaction mixture containing the compound represented by the formula (6) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like using an appropriate solvent. It may be appropriately set according to the target purity.
  • the oxidizing agent is a combination of a radical initiator and a halogenating agent.
  • the target reaction proceeds There is no particular limitation as far as it is.
  • the radical initiator is 0.01 equivalent or more and 1 equivalent or less
  • the halogenating agent is 1 equivalent or more and 3 equivalents or less.
  • the solvent used for this reaction is not particularly limited as long as the target reaction proceeds, but halogenated benzene solvents such as chlorobenzene and dichlorobenzene, and esters such as ethyl acetate, isopropyl acetate and butyl acetate Examples thereof include solvents, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. These solvents may be used alone or in combination of two or more in any proportion.
  • the amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 times by weight or more and 200 times by weight or less with respect to the compound represented by Formula (5b) is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually 20 ° C. or more and 150 ° C. or less or the boiling point or less of the solvent.
  • aqueous solution for post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid
  • An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl
  • a solvent which is not compatible with water such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane and chloroform, and hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane
  • these solvents can be used alone or in combination of two or more in any proportion.
  • the number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield.
  • reaction mixture containing the compound represented by Formula (6) obtained above can remove water with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
  • reaction mixture containing the compound represented by the formula (6) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
  • the reaction mixture containing the compound represented by the formula (6) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like using an appropriate solvent. It may be appropriately set according to the target purity.
  • R 2 b represents a halogen atom
  • Hal R represents a halogenating agent
  • R 1, X, Y and U 1 are as defined above.
  • Production method H is a method for obtaining a compound represented by the formula (6b) in which R 2 b represents a halogen atom, and the compound represented by the formula (6a) is reacted with a halogenating agent (HalR) in a solvent Manufacturing method including the step of
  • selectrofluor N-fluoro-N'-triethylenediamine bis (tetrafluoroborate)
  • N-chlorosuccinimide N-bromosuccinimide
  • N-iodosuccinimide 1 2,3-dichloro-5,5-dimethylhydantoin, 1,3-dibromo-5,5-dimethylhydantoin, 1,3-diiodo-5,5-dimethylhydantoin, bromine, iodine and the like.
  • the amount of the halogenating agent used in this reaction is not particularly limited as long as the target reaction proceeds, provided that the amount is at least 1 equivalent with respect to the compound represented by formula (6a). 1 to 10 equivalents.
  • the amount of the halogenating agent containing hydantoin is not particularly limited as long as the target reaction proceeds as long as the amount of the halogenating agent containing the hydantoin is 0.5 equivalents or more.
  • the halogenating agent used in this reaction is an iodizing agent
  • an acid such as an inorganic acid such as hydrochloric acid or sulfuric acid, or an organic acid such as acetic acid, trifluoroacetic acid, methanesulfonic acid, or trifluoromethanesulfonic acid Can.
  • the target reaction proceeds although there is no particular limitation in the limitation, it is usually 0.1 equivalent or more and 3 equivalents or less.
  • the solvent used for this reaction is not particularly limited as long as the target reaction proceeds, but acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid, trifluoromethanesulfonic acid, etc., diethyl ether Ether solvents such as diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc. Alcohol solvents such as methanol, ethanol, isopropanol etc.
  • acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid, trifluoromethanesulfonic acid, etc.
  • diethyl ether Ether solvents such as diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc.
  • Benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene etc
  • Ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, and N, N-dimethylacetamide 1,3-dimethyl-2-urea-based solvent-imidazolidinone, dichloromethane, dichloroethane, chloroform, and halogen solvents such as carbon tetrachloride. These solvents may be used alone or in combination of two or more in any proportion.
  • the amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 to 200 times by weight the amount of the compound represented by formula (6a) is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually 0 ° C. or more and 150 ° C. or less or the boiling point or less of the solvent.
  • aqueous solution for post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid
  • An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc., solvents not compatible with water such as hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible to add. In addition, these solvents can be used alone or in combination of two or more in any proportion. The number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield.
  • reaction mixture containing the compound represented by Formula (6b) obtained above can remove water with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
  • reaction mixture containing the compound represented by the formula (6b) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
  • the reaction mixture containing the compound represented by the formula (6b) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like using an appropriate solvent. It may be appropriately set according to the target purity.
  • J represents an oxygen atom or a sulfur atom
  • R2c is a C1 to C6 alkyl group optionally substituted with a substituent A, a C1 to C6 haloalkyl group, a substituent A C3-C8 cycloalkyl group which may be optionally substituted, C2-C6 alkenyl group which may be optionally substituted by substituent A, C2-C6 haloalkenyl group, C2 which may be optionally substituted by substituent A
  • R 2 c represents a C 1 to C 6 alkynyl group, a C 2 to C 6 haloalkynyl group, and when J is a sulfur atom, R 2 c represents a C 1 to C 6 alkyl group or a C 1 to C 6 haloalkyl group
  • Q represents a hydrogen atom or a metal
  • R1, R2b, X, Y and U1 are as defined above.
  • J represents an oxygen atom or a sulfur atom
  • J represents an oxygen atom or a sulfur atom
  • a C1-C6 alkyl group optionally substituted with a substituent A, a C1-C6 haloalkyl group, a substituent A C3-C8 cycloalkyl group optionally substituted by A
  • a C2-C6 alkenyl group optionally substituted by a substituent A
  • a C2-C6 haloalkenyl group optionally substituted by a substituent A
  • R2c is a group represented by the formula (6c) representing a C1 to C6 alkyl group or a C1 to C6 haloalkyl group
  • a method for obtaining a compound which comprises obtaining a compound represented by the formula (6b) and R2c-J-Q by
  • R2b is a chlorine atom, a bromine atom or an iodine atom.
  • R2c-J-Q used for this reaction can be obtained as a commercially available product or can be produced by a known method.
  • Preferred Q is a hydrogen atom or an alkali metal such as sodium or potassium.
  • R2c-J-Q used in this reaction is not particularly limited as long as the target reaction proceeds, provided that it is at least one equivalent with respect to the compound represented by formula (6b).
  • Q is a hydrogen atom, it can also be used as a solvent.
  • the transition metal used in this reaction may have a ligand, and palladium acetate, [1,1′-bis (diphenylphosphino) ferrocene] palladium dichloride, tris (dibenzylideneacetone) dipalladium, tetrakis ( And triphenyl phosphine) palladium, palladium such as bis (triphenyl phosphine) palladium dichloride, and the like.
  • the amount of transition metals used in this reaction is usually 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by formula (6b), but is particularly limited as long as the target reaction proceeds It will not be done.
  • triphenylphosphine 1,1′-bis (diphenylphosphino) ferrocene, 2-dicyclohexylphosphino-2′4′6′-triisopropylbiphenyl, 2-di-t Phosphine ligands such as -butylphosphino-2'4'6'-triisopropylbiphenyl can be added.
  • the amount of the phosphine ligand used in this reaction is generally 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (6b), but in particular as long as the target reaction proceeds There is no limitation.
  • Bases used in this reaction are inorganic bases such as sodium carbonate, potassium carbonate and cesium carbonate, and organic bases such as triethylamine, tributylamine and diisopropylethylamine.
  • the amount of the base used in this reaction is not particularly limited as long as the target reaction proceeds, provided that it is at least 1 equivalent with respect to the compound represented by formula (6b), but usually 1 equivalent It is more than 50 equivalents.
  • the solvent used for this reaction is not particularly limited as long as the target reaction proceeds, but R2c-JH (wherein, R2c is as defined above, and J is an oxygen atom).
  • Ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane etc.
  • benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene etc. Can be mentioned. These solvents may be used alone or in combination of two or more in any proportion.
  • the amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 to 200 times by weight the amount of the compound represented by formula (6b) is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually 30 ° C. or more and 200 ° C. or less or the boiling point or less of the solvent.
  • aqueous solution for post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid
  • An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc.
  • solvents not compatible with water such as hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible to add.
  • these solvents can be used alone or in combination of two or more in any proportion.
  • the number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield. It is also possible, but not essential, to remove insolubles by carrying out a filtration operation.
  • reaction mixture containing the compound represented by Formula (6c) obtained above can remove water with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
  • reaction mixture containing the compound represented by the formula (6c) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
  • the reaction mixture containing the compound represented by the formula (6c) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like using an appropriate solvent. It may be appropriately set according to the target purity.
  • R 2 d is a C 1 to C 6 alkyl group which may be optionally substituted with a substituent A, a C 1 to C 6 haloalkyl group, a C 3 to C 8 cycloalkyl group which may be optionally substituted with a substituent A, a substituent A
  • R 2 d-B represents an organoboronic acid
  • R 1, R 2 b, X, Y and U 1 are as defined above .
  • Production method J includes a C1 to C6 alkyl group optionally substituted with substituent A, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group optionally substituted with substituent A, and a substituent A method for obtaining a compound represented by the formula (6d) which is a C2 to C6 alkenyl group which may be optionally substituted by a group A, or a C2 to C6 haloalkenyl group, which is represented by the formula (6b) It is a production method including obtaining by Suzuki-Miyaura coupling in which a compound and an organic boronic acid (R2d-B) are reacted in the presence of a transition metal and a base.
  • R2d-B organic boronic acid
  • R2b is a chlorine atom, a bromine atom or an iodine atom.
  • R2d-B used in this reaction represents an organic boronic acid such as an organic boronic acid or an organic boronic acid ester, and can be obtained as a commercially available product or manufactured by a known method.
  • the amount of R2d-B used in this reaction is not particularly limited as long as the target reaction proceeds, provided that it is at least 1 equivalent with respect to the compound represented by formula (6b). 1 equivalent or more and 10 equivalents or less.
  • Transition metals used in this reaction are palladium, nickel, ruthenium and the like, and may have a ligand.
  • palladium acetate, [1,1′-bis (diphenylphosphino) ferrocene] palladium dichloride, tris (dibenzylideneacetone) dipalladium, tetrakis (triphenylphosphine) palladium, bis (triphenylphosphine) palladium dichloride and the like Palladiums are mentioned.
  • the amount of transition metals used in this reaction is usually 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by formula (6b), but is particularly limited as long as the target reaction proceeds It will not be done.
  • phosphine ligands such as triphenylphosphine and tricyclohexylphosphine can be added.
  • the amount of the phosphine ligand used in this reaction is generally 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (6b), but in particular as long as the target reaction proceeds There is no limitation.
  • Bases used in this reaction include inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate and tripotassium phosphate, and metal alkoxides such as sodium methoxide, sodium ethoxide, sodium t-butoxide and potassium t-butoxide Etc.
  • inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate and tripotassium phosphate
  • metal alkoxides such as sodium methoxide, sodium ethoxide, sodium t-butoxide and potassium t-butoxide Etc.
  • the amount of the base used in this reaction is not particularly limited as long as the target reaction proceeds, provided that it is at least 1 equivalent with respect to the compound represented by formula (6b), but usually 1 equivalent It is more than 50 equivalents.
  • the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but water solvents, diethyl ether, diisopropyl ether, methyl-t-butyl ether, ethers such as dimethoxyethane, tetrahydrofuran, dioxane, etc.
  • the solvent include benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene. These solvents may be used alone or in combination of two or more in any proportion.
  • the amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 to 200 times by weight the amount of the compound represented by formula (6b) is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually 30 ° C. or more and 200 ° C. or less or the boiling point or less of the solvent.
  • aqueous solution for post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid
  • An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc.
  • solvents not compatible with water such as hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible to add.
  • these solvents can be used alone or in combination of two or more in any proportion.
  • the number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield. It is also possible, but not essential, to remove insolubles by carrying out a filtration operation.
  • reaction mixture containing the compound represented by Formula (6d) obtained above can remove water with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
  • reaction mixture containing the compound represented by the formula (6d) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
  • the reaction mixture containing the compound represented by the formula (6d) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like using an appropriate solvent. It may be appropriately set according to the target purity.
  • R 2 e represents a C 2 to C 6 alkynyl group which may be optionally substituted with a substituent A, or a C 2 to C 6 haloalkynyl group
  • R 1, R 2 b, X, Y and U 1 are as defined above.
  • Production method K is a method for obtaining a compound represented by the formula (6e) in which R2e is a C2 to C6 alkynyl group optionally substituted with a substituent A, or a C2 to C6 haloalkynyl group, It is a manufacturing method including obtaining by the Sonogashira coupling in which the compound represented by (6b) and a terminal alkyne compound are reacted in the presence of a transition metal and a base.
  • R2b is a chlorine atom, a bromine atom or an iodine atom.
  • the terminal alkyne compound used for this reaction can be obtained as a commercially available product or can be produced by a known method.
  • trimethylsilylacetylene can be used as a terminal alkyne compound.
  • Etc. can be referred to.
  • the amount of the terminal alkyne compound to be used in this reaction is not particularly limited as long as the target reaction proceeds, provided that it is at least 1 equivalent with respect to the compound represented by formula (6b). 1 to 10 equivalents.
  • the transition metal used in this reaction may have a ligand, and palladium acetate, [1,1′-bis (diphenylphosphino) ferrocene] palladium dichloride, tris (dibenzylideneacetone) dipalladium, tetrakis ( And triphenyl phosphine) palladium, palladium such as bis (triphenyl phosphine) palladium dichloride, and the like.
  • coppers such as copper chloride, copper bromide and copper iodide are also used at the same time.
  • the amount of transition metals used in this reaction is usually 0.001 equivalents or more with respect to the compound represented by the formula (6b) with each of palladium and the like, and the target reaction is There is no particular limitation as far as it progresses.
  • the preferred amounts are both 0.001 to 1 equivalent.
  • Examples of the base used in this reaction include organic amines such as triethylamine, tributylamine, isopropylamine, diethylamine, diisopropylamine and diisopropylethylamine, and inorganic bases such as sodium carbonate, potassium carbonate and cesium carbonate.
  • organic amines such as triethylamine, tributylamine, isopropylamine, diethylamine, diisopropylamine and diisopropylethylamine
  • inorganic bases such as sodium carbonate, potassium carbonate and cesium carbonate.
  • the amount of the base used in this reaction is not particularly limited as long as the target reaction proceeds, provided that it is at least 1 equivalent with respect to the compound represented by formula (6b), but usually 1 equivalent It is more than 50 equivalents.
  • the organic base in liquid form it can be used as a solvent.
  • phosphine ligands such as tri-t-butylphosphine and 2-dicyclohexylphosphino-2'4'6'-triisopropylbiphenyl can be added, but it is not essential. .
  • the amount of the phosphine ligand used in this reaction is generally 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (6b), but in particular as long as the target reaction proceeds There is no limitation.
  • the solvent used for this reaction is not particularly limited as long as the target reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc.
  • Benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, N-methylpyrrolidone, N, N-dimethylformamide Amide solvents such as N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, triethylamine, Butylamine, isopropylamine, diethylamine, diisopropylamine, organic amine solvents such as diisopropylethylamine. These solvents may be used alone or in combination of two or more in any proportion.
  • the amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 to 200 times by weight the amount of the compound represented by formula (6b) is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually 0 ° C. or more and 150 ° C. or less or the boiling point or less of the solvent.
  • aqueous solution for post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid
  • An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc.
  • solvents not compatible with water such as hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible to add.
  • solvents may be used alone or in combination of two or more in any proportion.
  • the number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield. It is also possible, but not essential, to remove insolubles by carrying out a filtration operation.
  • reaction mixture containing the compound represented by Formula (6e) obtained above can remove moisture with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
  • reaction mixture containing the compound represented by the formula (6e) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
  • the reaction mixture containing the compound represented by the formula (6e) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like using an appropriate solvent. It may be appropriately set according to the target purity.
  • U2 represents a halogen atom
  • HalR, R1, R2, X and Y are as defined above.
  • Production method L is a method for obtaining a compound represented by the formula (6f) in which U 2 is a halogen atom, and represented by the formula (6-1) using a radical initiator and a halogenating agent (HalR) A method of production comprising reacting a compound.
  • preferred U2 is a chlorine atom, a bromine atom or an iodine atom.
  • radical initiator used in this reaction examples include azobisisobutyronitrile, benzoyl peroxide and the like.
  • the amount of the radical initiator used for this reaction is not particularly limited as long as the target reaction proceeds, but generally 0.01 equivalent to the compound represented by the formula (6-1) More than 1.0 equivalent.
  • the halogenating agent used in this reaction is N-chlorosuccinimide, N-bromosuccinimide, N-iodosuccinimide, 1,3-dichloro-5,5-dimethylhydantoin, 1,3-dibromo-5,5-dimethylhydantoin And 1,3-diiodo-5,5-dimethylhydantoin.
  • the amount of the halogenating agent used in this reaction is not particularly limited as long as the target reaction proceeds, provided that the amount is 2 equivalents or more with respect to the compound represented by formula (6-1). Usually, it is 2 equivalents or more and 2.8 equivalents or less.
  • the solvent used for this reaction is not particularly limited as long as the target reaction proceeds, but halogenated benzene solvents such as chlorobenzene and dichlorobenzene, and esters such as ethyl acetate, isopropyl acetate and butyl acetate Examples thereof include solvents, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. These solvents may be used alone or in combination of two or more in any proportion.
  • the amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 times by weight or more and 200 times by weight the compound represented by the formula (6-1) It is below.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually 20 ° C. or more and 150 ° C. or less or the boiling point or less of the solvent.
  • aqueous solution for post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid
  • An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl
  • a solvent which is not compatible with water such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane and chloroform, and hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane
  • these solvents can be used alone or in combination of two or more in any proportion.
  • the number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield.
  • reaction mixture containing the compound represented by Formula (6f) obtained above can remove water with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
  • reaction mixture containing the compound represented by the formula (6f) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
  • the reaction mixture containing the compound represented by the formula (6f) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like using an appropriate solvent. It may be appropriately set according to the target purity.
  • R 1, R 2, X, Y and U 2 are as defined above.
  • Production method M is a method for obtaining a compound represented by the formula (6 g) which is a production intermediate of the compound of the present invention, which comprises hydrolyzing a compound represented by the formula (6 f) in the presence of water It is a manufacturing method.
  • preferred U2 is a chlorine atom, a bromine atom or an iodine atom.
  • Water is essential for this reaction.
  • silver nitrate can be used to facilitate the present reaction.
  • the amount of water used in this reaction is not limited as long as the target reaction proceeds, as long as it is at least 1 equivalent to the compound represented by formula (6f). Water can also be used as a solvent.
  • the amount of silver nitrate used in this reaction is not limited as long as the target reaction proceeds, provided that the amount is 2 equivalents or more with respect to the compound represented by formula (6f), and usually 2 equivalents or more. It is less than equivalent weight.
  • the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but water solvents, diethyl ether, diisopropyl ether, methyl-t-butyl ether, ethers such as dimethoxyethane, tetrahydrofuran, dioxane, etc.
  • a system solvent, nitrile system solvents, such as acetonitrile, etc. are mentioned. These solvents may be used alone or in combination of two or more in any proportion.
  • the amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 to 200 times by weight the amount of the compound represented by formula (6f) is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually ⁇ 10 ° C. or more and 100 ° C. or less or the boiling point or less of the solvent.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid
  • An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc., solvents not compatible with water such as hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible to add. In addition, these solvents can be used alone or in combination of two or more in any proportion. The number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield.
  • reaction mixture containing the compound represented by Formula (6g) obtained above can remove water with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
  • reaction mixture containing the compound represented by the formula (6 g) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
  • the reaction mixture containing the compound represented by the formula (6 g) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like using an appropriate solvent. It may be appropriately set according to the target purity.
  • R 1, R 2, X, Y and Z are as defined above.
  • Production method N is a method of obtaining the compound represented by formula (1a) among the compounds represented by formula (1), which comprises a compound represented by formula (6 g) and an organometallic reagent in a solvent It is a manufacturing method including making it react in the inside.
  • an organomagnesium halide (Z-Mg-Hal: where Hal represents a halogen atom and Z is as defined above), an organolithium reagent (Z-Li: Here, Z is as defined above), organomagnesium halide-zinc (II) ate complex reagent ([(Z) 3 -Zn] - [Mg-Hal] + [Mg- (Hal) 2 ] 2 :
  • Z and Hal are as defined above, and the like.
  • the amount of the organic metal reagent to be used in this reaction may be 1 equivalent or more with respect to the formula (6 g), and is not particularly limited as long as the target reaction proceeds. Usually, it is 1 equivalent or more and 10 equivalents or less.
  • the solvent used for the reaction is not particularly limited as long as the target reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc., hexane And hydrocarbon solvents such as heptane, cyclohexane and methylcyclohexane. These solvents may be used alone or in combination of two or more in any proportion.
  • the amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 to 200 times by weight the amount of the compound represented by the formula (6 g) is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually ⁇ 80 ° C. or more and 100 ° C. or less or the boiling point or less of the solvent.
  • aqueous solution for post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid
  • An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl
  • a solvent which is not compatible with water such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane and chloroform, and hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane
  • these solvents can be used alone or in combination of two or more in any proportion.
  • the number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield.
  • reaction mixture containing the compound represented by Formula (1a) obtained above can remove water with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
  • reaction mixture containing the compound represented by the formula (1a) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
  • the reaction mixture containing the compound represented by the formula (1a) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like using an appropriate solvent. It may be appropriately set according to the target purity.
  • R 1, R 2, R 8 a, X, Y and Z are as defined above.
  • Production method O is a method for obtaining a compound represented by formula (1b) among compounds represented by formula (1), wherein the compound represented by formula (1a) and an ortho ester are A method of production comprising reacting in the presence of a solvent.
  • the orthoesters used in this reaction are preferably orthoformates, and can be obtained as commercially available products or can be produced by known methods.
  • the amount of ortho esters used in this reaction may be at least 1 equivalent with respect to the compound represented by formula (1a), and is not particularly limited as long as the target reaction proceeds, 1 equivalent or more and 10 equivalents or less.
  • R8aOH R8a is as defined above
  • R8a is as defined above
  • the amount of alcohol used represented by R8aOH (R8a is as defined above) used in this reaction is not particularly limited as long as the target reaction proceeds, but in general, it is represented by the formula (1a) It is 50 or less equivalent with respect to the compound represented, and is not essential.
  • Examples of the acid used in this reaction include inorganic acids such as hydrochloric acid and sulfuric acid, and organic acids such as trifluoroacetic acid, methanesulfonic acid, p-toluenesulfonic acid and trifluoromethanesulfonic acid.
  • the amount of the acid used in this reaction is not particularly limited as long as the target reaction proceeds, provided that it is 0.01 equivalent or more with respect to the compound represented by formula (1a). 0.01 equivalent or more and 20 equivalents or less.
  • the solvent used for this reaction is not particularly limited as long as the target reaction proceeds, but the alcohol solvents represented by R8aOH (R8a has the same meaning as described above), such as nitromethane and nitrobenzene Examples thereof include nitro solvents, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. These solvents may be used alone or in combination of two or more in any proportion.
  • the amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 to 200 times by weight the amount of the compound represented by Formula (1a). is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually ⁇ 30 ° C. or more and 100 ° C. or less or the boiling point or less of the solvent.
  • aqueous solution for post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid
  • An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc., solvents not compatible with water such as hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible to add. These solvents may be used alone or in combination of two or more in any proportion.
  • the number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield.
  • reaction mixture containing the compound represented by Formula (1b) obtained above can remove water with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
  • reaction mixture containing the compound represented by the formula (1b) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
  • the reaction mixture containing the compound represented by the formula (1b) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like using an appropriate solvent. It may be appropriately set according to the target purity.
  • R 1, R 2, X, Y and Z are as defined above.
  • Production method P is a method for obtaining the compound represented by formula (1c) among the compounds represented by formula (1), and the compound represented by formula (1a) and the fluorinating agent (FR) Is reacted in a solvent.
  • the amount of the fluorinating agent used in this reaction may be 1 equivalent or more with respect to the compound represented by formula (1a), and is not particularly limited as long as the target reaction proceeds, 1 equivalent or more and 10 equivalents or less.
  • the solvent used for this reaction is not particularly limited as long as the target reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc.
  • Benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, nitrile solvents such as acetonitrile, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, hexane, heptane, cyclohexane, methylcyclohexane etc Hydrocarbon solvents and the like can be mentioned. These solvents may be used alone or in combination of two or more in any proportion.
  • the amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 to 200 times by weight the amount of the compound represented by Formula (1a). is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually ⁇ 80 ° C. or more and 100 ° C. or less or the boiling point or less of the solvent.
  • aqueous solution for post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid
  • An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc., solvents not compatible with water such as hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible to add. These solvents may be used alone or in combination of two or more in any proportion.
  • the number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield.
  • reaction mixture containing the compound represented by Formula (1c) obtained above can remove water with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
  • reaction mixture containing the compound represented by the formula (1c) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
  • the reaction mixture containing the compound represented by the formula (1c) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like using an appropriate solvent. It may be appropriately set according to the target purity.
  • R 1, R 2, X, Y and Z are as defined above.
  • the production method Q is a method for obtaining the compound represented by the formula (1 d) among the compounds represented by the formula (1), wherein the compound represented by the formula (1 a) and the reducing agent Below, it is a manufacturing method including making it react in a solvent.
  • the amount of the reducing agent used in this reaction is not particularly limited as long as the target reaction proceeds, as long as the amount of the reducing agent used is 1 equivalent or more with respect to the compound represented by formula (1a). More than 20 equivalents or less.
  • Examples of the acid used in this reaction include trifluoroacetic acid, boron trifluoride diethyl ether complex, trifluoromethanesulfonic acid, trimethylsilyl trifluoromethanesulfonate, aluminum chloride and the like.
  • the amount of the acid used in this reaction may be at least 1 equivalent with respect to the compound represented by formula (1a), and is not particularly limited as long as the target reaction proceeds, but usually 1 It is equal to or more than 50 equivalents.
  • the acid is a solution, it can be used as a solvent.
  • the solvent used for this reaction is not particularly limited as long as the target reaction proceeds, but an acidic solvent such as trifluoroacetic acid, a halogen based solvent such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, etc.
  • Ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane and the like can be mentioned. These solvents may be used alone or in combination of two or more in any proportion.
  • the amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 to 200 times by weight the amount of the compound represented by Formula (1a). is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually ⁇ 10 ° C. or more and 150 ° C. or less or the boiling point or less of the solvent.
  • aqueous solution for post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid
  • An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl
  • a solvent which is not compatible with water such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane and chloroform, and hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane
  • these solvents can be used alone or in combination of two or more in any proportion.
  • the number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield.
  • reaction mixture containing the compound represented by Formula (1d) obtained above can remove water with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
  • reaction mixture containing the compound represented by the formula (1d) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
  • the reaction mixture containing the compound represented by the formula (1d) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like using an appropriate solvent. It may be appropriately set according to the target purity.
  • Hal R, R 1, R 2, X, Y and U 2 are as defined above.
  • Production method L is a method for obtaining a compound represented by the formula (6h) in which U2 is a halogen atom, and represented by the formula (6-1) using a radical initiator and a halogenating agent (HalR) A method of production comprising reacting a compound.
  • preferred U2 is a chlorine atom, a bromine atom or an iodine atom.
  • the amount of the halogenating agent used in this reaction is not particularly limited as long as the target reaction proceeds, provided that the amount is 1 equivalent or more with respect to the compound represented by formula (6-1). Usually, it is 1 equivalent or more and 1.5 equivalents or less.
  • Production method R can be carried out according to production method L by changing the amount of the halogenating agent in production method L as described above.
  • G32, G33, G34, and G35 are each independently a carbon atom or a nitrogen atom
  • nm is an integer of 0 to 4 (in the case where nm is 2 or more, R4 of 2 or more substitution is each R 1 represents an independent substituent, which may be the same or different and may be optionally selected)
  • R 1, R 2, R 4, X, Y and U 2 are as defined above.
  • Production method S is a method of obtaining a compound represented by the formula (1e), which comprises the compound represented by the formula (6h) and the compound represented by the formula (7) in a solvent in the presence of a base It is a manufacturing method including making it react.
  • preferred U2 is a chlorine atom, a bromine atom or an iodine atom.
  • the compound represented by Formula (7) used for this reaction can be obtained as a commercial item, or can be manufactured by a well-known method.
  • the amine When the compound represented by the formula (7) used in the present reaction forms a salt with an acidic substance such as hydrochloric acid or sulfuric acid, the amine may be used after desalting by a known method it can. In addition, the amine salt can be used as it is in the present reaction by adding one or more equivalents of a base to the acidic substance forming a salt.
  • the amount of the compound represented by the formula (7) used in this reaction may be at least 1 equivalent or more with respect to the compound represented by the formula (6h), and is particularly limited as long as the target reaction proceeds. Although it does not happen, it is usually 1 equivalent or more and 10 equivalents or less.
  • Inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate and sodium hydride
  • organic bases such as triethylamine, tributylamine, diisopropylethylamine, pyridine, 4-dimethylaminopyridine, collidine, lutidine etc. as the base used in this reaction
  • the class is illustrated, it is not particularly limited as long as the target reaction proceeds.
  • the amount of the base used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (6h), and is not particularly limited as long as the target reaction proceeds, but usually 1 It is equal to or more than 20 equivalents. Moreover, when using the compound represented by Formula (7) which formed the salt with an acidic substance, preferable amount is 2 to 20 equivalent normally.
  • the solvent used for this reaction is not particularly limited as long as the target reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc.
  • Alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, Amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloroethane, Chloroform, halogenated solvents such as carbon tetrachloride, dimethyl sulfoxide, sulfur-based solvents such as sulfolane, acetone, methyl ethyl ketone, ketone solvents such as methyl isobutyl ketone
  • the amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 to 200 times by weight the amount of the compound represented by formula (6h) is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually 0 ° C. or more and 150 ° C. or less or the boiling point or less of the solvent.
  • aqueous solution for post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid
  • An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc.
  • solvents not compatible with water such as hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible to add.
  • these solvents can be used alone or in combination of two or more in any proportion.
  • the number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield. It is also possible, but not essential, to remove insolubles by carrying out a filtration operation.
  • reaction mixture containing the compound represented by Formula (1e) obtained above can remove water with a desiccant such as sodium sulfate or magnesium sulfate, it is not essential.
  • reaction mixture containing the compound represented by the formula (1e) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
  • the reaction mixture containing the compound represented by the formula (1e) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like using an appropriate solvent. It may be appropriately set according to the target purity.
  • the compounds represented by the formula (1) can be produced by arbitrarily combining the production methods A to S shown above. Alternatively, the compound represented by the formula (1) can be produced by any combination of known methods and production methods A to S.
  • the compounds of the present invention can be used as pesticides because they can control organisms harmful to plants. Specifically, fungicides, insecticides, herbicides, plant growth regulators and the like can be mentioned. Preferably, it is a microbicide.
  • the compounds of the present invention can be used as agricultural and horticultural fungicides in upland fields, paddy fields, tea gardens, orchards, meadows, lawns, forests, gardens, street trees, etc. for controlling plant diseases.
  • the plant diseases referred to in the present invention refer to plants with crops such as flowers, flowers, trees and trees, withered, withered, yellowed, atrophied, and general abnormal pathological symptoms such as acupuncture, or spots, withered leaves, mosaics Partial pathological symptoms such as cigars, dead leaves, root rot, root bumps and bumps are caused. That is to say, plants become ill.
  • Pathogens that cause plant diseases mainly include fungi, bacteria, spiroplasmas, phytoplasmas, viruses, viroids, parasitic higher plants, nematodes and the like.
  • the compounds of the present invention are effective against fungi but are not limited thereto.
  • the diseases caused by fungi are mainly fungal diseases.
  • Fungi (fungi) which cause fungal diseases include Neisseria gonorrhoeae, oomycetes, zygomycetes, ascomycetes, basidiomycetes and imperfect fungi.
  • root-knot fungus root-knot disease powdery mildew fungus, sugar beet root-knot disease fungus, as egg fungus, downy mildew fungus, Pythium spp., Aphanomyces spp., Rhizopus spp.
  • Phytophthora infestans corn leaf blight fungus, rice blast fungus, powdery mildew, powdery mildew, anthracnose fungus, scab fungus, scab fungus, scab fungus, scab fungus, rust basidiomycetes as basidiomycetes, scab fungus, purple crest
  • Examples include downy mildew, blast fungus, sheath blight fungus, gray mold fungus as incomplete fungus, Alternaria sp., Alternaria sp., Fusarium sp., Penicillium sp., Rhizoctonia sp.
  • the compounds of the present invention are effective against various plant diseases. Below, the specific example of a disease name and its pathogen name is shown.
  • Rice blast disease (Magnaporthe grisea), sheath blight (Thanatophorus cucumeris), brown blight (Ceratobasidium setariae), brown blight blight (Wateea circinata), brown blight (Thanatephorus cucumeris), scab mildew Sclerotium hydrophilum, red blight (Wairea circinata), black rot (Entyloma dactylidis), micrococcal disease (Magnaporthe salvinii), gray blight (Ceratobasidium cornigerum), sesame leaf blight (Cochliobolus miyabeanus), leaf leaf Blight disease (Sphaerulina oryzina , Scabies (Gibberella fujikuroi), seedling blight (Pythium spp., Fusarium spp., Trichoderma spp., Rhizopus spp., Rhizoc
  • brown stripe disease (Acidovora) avenae subsp. avenae), internal blanching disease (Erwinia ananas), seedling blight (Burkholderia plantarii), leaf blight (Burkholderia glumae), leaf sheath browning disease (Pseudomonas fuscovaginae), blight blight (Pseudomonas syringae pv.
  • Tritici Tritici
  • rust Puccinia striiformis, Puccinia graminis, Puccinia recondita, Puccinia hordei
  • macular disease Pyrenophora graminea
  • web spot disease Pyrenophora teres
  • Fusarium head blight Gibberella zeae, Fusarium culmorum, Fusarium avenaceum, Monographella nivalis
  • snow blight Teyphula incarnata, Typhula ishikariensis, Monographella nivalis
  • naked scab Ustilag) nuda), scallop (Tilletia caries, Tilletia controversa), scab (Pseudocercosporella herpotrichoides), stock rot (Ceratobasidium gramineum), leaf blight (Rhynchosporium secalis), leaf blight (Septoria tritici),
  • Syringae Scab of mildew of corn (Gibberella zeae etc.), seedling blight (Fusarium avenaceum, Penicillium spp., Pythium spp., Rhizoctonia spp.), Rust (Puccinia sorghi), leaf blight of sesame (Cochliobolus heterostrophus), scab (Ustilago maydis), anthracnose (Colletotrichum graminicola), northern spot disease (Cochliobolus carbonum), brown streak disease (Acidovorax avenae subsp.
  • Syringae s ringae
  • blight of blight Erwinia sp.
  • peach scab Cedosporium carpophilum
  • homoposis rot Phomopsis sp.
  • plague Phytophthora sp.
  • anthracnose Coldletotrichum gloeosporioides
  • leaf rot Taphrina Deforans
  • Perforating Bacterial Disease Xhanthomonas campestris pv.
  • Root Head Onset Disease Agrobacterium tumefaciens
  • Sweet Potato Anthracnose Glomerella cingulata
  • Fungal Fungus Nervosa Monilinia kusanoi
  • Grizzly Disease Monilinia fructicola
  • Root-head cancer disease Agrobacter um tumefaciens
  • resinous bacterial disease Pseudomonas syringae pv.
  • Anthrax (Glomerella cingulata) of oyster (Geromerella cingulata), deciduous disease (Cercospora kaki; Mycosphaerella nawae), powdery mildew (Phyllactinia kakikora), Nematode cancer disease (Agrobacterium Tumefaciens); Citrus black spot (Diaporthe citri), green mold (Penicillium digitatum), blue mold (Penicillium italicum), scab (Elsinoe fawcettii), brown rot (Phytophthora citrophthora), scab (Xhanth) omonas campestris pv.
  • Carotovora leaf blight (Crynebacterium sp.), Yellow wilt (P ytoplasma asteris), yellow leaf atrophy (Tobacco leaf curl subgroup III geminivirus); powdery mildew of eggplant (Sphaerotheca fuliginea etc.), slime blight (Mycovellosiella nattrassii), plague (Phytophthora infestans), brown rot (Phytophthora capsici) Brown spot bacterial disease (Pseudomonas cichorii), stem blight bacterial disease (Pseudomonas corrugata), stem rot bacterial disease (Erwinia chrysanthemi), soft rot (Erwinia carotovora subsp.
  • Carotovora spotted bacterial disease (Pseudomonas sp.); Black spot (Alternaria brassicae), black rot (Xhanthomonas campestris pv. Campestris), black spot blight (Pseudomonas syringae pv.
  • Maculicola soft rot
  • Erwinia carotovora black spot of Brassicaceae (Alternaria brassicae) Etc.), white spot (Cercosporella brassicae), root blight (Phoma lingam), root scab (Plasmodiophora brassicae), downy mildew (Peronospora parasitica), black rot (Xhanthomonas campestris pv. Campestris), black spot bacterial disease Pseudomonas sy ringae pv. maculicola), soft rot (Erwinia carotovora subsp.
  • glycinea Anthracnose (Colletotrichum lindemuthianum), bacterial blight (Ralstonia solanacearum), scab (Pseudomonas syringae pv. Phaseolicola), brown leaf blight (Pseudomonas viridiflava), leaf blight (Xhanthomonas campestris p .
  • phaseoli Groundnut (Mycosphaerella berkeleyi), brown spot (Mycosphaerella arachidis), blight (Ralstonia solanacearum); powdery mildew (Erysiphe pisi) of pea, downy mildew (Peronospora pisi), vine blight (Pseudomonas) syringae pv. pisi), scab disease (Xhanthomonas campestris pv.
  • Carotovora viscous rot (Crostridium spp.), Ring rot (Clavobacter michiganensis sub) sp. sepedonicus); sweet potato blight (Streptomyces ipomoeae); sugar beet (Cercospora beticola), downy mildew (Peronospora schachtii), black root disease (Aphanomyces cochioides), snake eye disease (Phoma betae), rooted head Cancer disease (Agrobacterium tumefaciens), scab disease (Streptomyces scabies), spotted bacterial disease (Pseudomonas syringae pv.
  • Aphanis plague (Phytophthora nicotianae etc.), anthracnose (Glomerella cingulata etc.), fruit rot (Pythium ultimum), blight (Ralstonia solanacearum), horny mildew (Xhanthomonas) campestris), Bacterial mildew (Pseudomonas marginalis pv.
  • scabies Pseudomonas sp.
  • tobacco scab Alternaria alternata
  • powdery mildew Erysiphe cichoracearum
  • anthracnose Colletotritri
  • hum gloeosporioides plague
  • plague Phytophthora nicotianae
  • wild blight Pseudomonas syringae pv. tabaci
  • yellow blight Pseudomonas syringae pv. mellea
  • cavity disease Erwinia carotovora subsp.
  • Carotovora root head cancer disease (Agrobacterium tumefaciens), hair root disease (Agrobacterium rhizogenes), green disease (auPhythma histoplasma) ifolia); brown patch disease (Rhizoctonia solani), duller spot disease (Sclerotinia homoeocarpa), carbularia leaf blight (Curvularia sp.), rust (Puccinia zoysiae), hermintosporium leaf blight (Cochliobolus sp.) , Cloud disease (Rhynchosporium secalis), Damping disease (Gaeumannomyces graminis), Anthracnose (Colletotrichum sp.), Snow rot brown powdery mildew (Typhula incarnata), Snow rot black powdery mildew (Typhula ishikariensis), snow rot Large-scale fungal sclerotis disease (Myriosclerot
  • the compound of the present invention may be used alone, but preferably it is mixed with a solid carrier, liquid carrier, gas carrier, surfactant, fixing agent, dispersing agent, stabilizer, etc., dusting agent, wettable agent
  • the composition can be used as a composition such as water dispersible granules, water solvents, granules water solvents, granules, emulsions, solutions, microemulsions, aqueous suspensions, aqueous emulsions, suspoemulsions and the like. There is no limitation to those compositions as long as the effect is exhibited.
  • composition of the present invention (pest control agent for agriculture and horticulture, fungicide for agriculture and horticulture) will be described.
  • a method of applying the composition containing the compound of the present invention a method of contacting with a plant or a seed, or a method of including it in cultivation soil and contacting with a root or a rhizome of a plant can be mentioned.
  • foliage spraying treatment to individual plants injection treatment, seedling box treatment, cell tray treatment, spraying treatment to plant seeds, spraying treatment to plant seeds, immersion treatment to plant seeds, immersion treatment to plant seeds, plant seeds Dressing treatment, spraying treatment on soil surface, mixing with soil after spraying treatment on soil surface, pouring treatment into soil, pouring treatment in soil, soil blending after injection treatment, soil irrigation treatment, soil irrigation treatment Soil mixing etc.
  • any application method as used by those skilled in the art exerts sufficient efficacy.
  • plant refers to those that live without exercise by performing photosynthesis.
  • it also includes genetically modified crops that are produced by artificially manipulating genes etc.
  • plants are not naturally present in the natural world, and examples include herbicide resistant soybean, corn, cotton, etc. rice adapted to cold areas And tobacco, agricultural and horticultural crops such as corn and cotton to which an insecticidal substance producing ability has been imparted. Furthermore, trees such as pine, ash, ginkgo, maple, oak, poplar, zelkova, etc. may be mentioned.
  • plant as used in the present invention is a generic term for all parts constituting the individual plant, and includes, for example, stems, leaves, roots, seeds, flowers, fruits and the like.
  • seed refers to one which stores nutrients for sprouting young plants and is used for agricultural propagation.
  • Specific examples include corn, soybean, cotton, rice, sugar beet, wheat, barley, sunflower, tomato, cucumber, eggplant, spinach, spiny pea, squash, sugar cane, tobacco, green pepper, Brassica napus seeds, F1 varieties thereof, etc.
  • examples thereof include seeds, seeds such as taro, potato, sweet potato, konjac, edible lilies, bulbs such as tulip, seeds such as raccoon, and seeds and tubers of genetically modified crops.
  • the application rate and application concentration of the composition containing the compound of the present invention vary depending on the target crop, target disease, degree of disease occurrence, dosage form of the compound, application method and various environmental conditions, etc.
  • the amount of active ingredient is suitably from 0.1 to 10,000 g per hectare, preferably from 10 to 1,000 g per hectare. In the case of seed treatment, the amount used is from 0.0001 to 1000 g, preferably from 0.001 to 100 g, per kg of seed as the amount of the active ingredient.
  • the composition containing the compound of the present invention is used as foliage application to individual plants, application to soil surface, injection into soil, or soil irrigation, it is diluted to an appropriate concentration in an appropriate carrier. You may process afterward.
  • the plant seeds When the composition containing the compound of the present invention is brought into contact with plant seeds, the plant seeds may be used after being diluted to an appropriate concentration and then subjected to dipping, dressing, spraying or smearing.
  • the amount of the composition used for immersion, dusting, spraying or smearing treatment is usually about 0.05 to 50% of the weight of the dry plant seed, preferably 0.1 to 30%, as the amount of the active ingredient.
  • it may be suitably set according to the form of the composition and the kind of the plant seed to be treated, and it is not limited to these ranges.
  • the compound of the present invention may be, if necessary, other pesticides, for example, pesticides such as fungicides, insecticides (including acaricides and nematocides), herbicides, microbial materials, plant growth regulators and the like, nucleic acids It can be used by mixing it with a disease control agent (WO 2014/062775) as an active ingredient, a soil conditioner or a fertilizer.
  • pesticides such as fungicides, insecticides (including acaricides and nematocides), herbicides, microbial materials, plant growth regulators and the like, nucleic acids
  • a disease control agent WO 2014/062775
  • a method of mixing and using the compound of the present invention and other agricultural chemicals a method of using the compound of the present invention and other agricultural chemicals formulated into one dosage form, both formulated into separate dosage forms
  • microbicide which can be used in combination with the compound of the present invention are exemplified in the following group b and include salts, isomers and N-oxides thereof.
  • known microbicides are not limited to these.
  • Group b b-1: Phenylamide-based fungicide [b-1.1]: Benalaxyl (benalaxyl), [b-1.2] Benaraxyl M or quaraxyl (benalaxyl-M or kiralaxyl) as a phenylamide-based microbicide, [b -1.3] furanaxyl (furalaxyl), [b-1.4] metalaxyl (metalaxyl), [b-1.5] metalaxyl M or mefenoxam (metalaxyl-M or mefenoxam), [b-1.6] oxadixyl oxadixyl), [b-1.7] ofurace, and the like.
  • b-2 Mitotic and cell division inhibitors [b-2.1] Benomyl, [b-2.2] carbendazim, [b- as a mitotic and cell division inhibitors 2.3] Fuberidazole (fuberidazole), [b-2.4] thiabendazole (thiabendazole), [b-2.5] thiophanate (thiophanate), [b-2.6] thiophanate methyl (thiophanate-methyl), [b- 2.7] Dietophencarb (dithofencarb), [b-2, 8] Zoxamide (zoxamide), [b-2.9] Etaboxam (ethaboxam), [b-2. 10] Pencicuron (pencycuron), [b-2. 11] Fluopico Examples thereof include fluopicolide, [b-2.12] phenamacril and the like.
  • b-3 Succinic acid dehydrogenase inhibitor (SDHI agent) [B-3.1] Benodanil (benodanil), [b-3.2] benzobindiflupyr (benzavindiflupyr), [b-3.3] bixafen (bixafen) as a succinate dehydrogenase inhibitor (SDHI agent) ), [B-3.4] boscalid, [b-3.5] carboxin, [b-3.6] fenfuram, [b-3.7] fluopyram [B-3.8] flutolanil, [b-3.9] fluxapyroxad, [b-3. 10] frametpyr, [b-3.
  • SDHI agent Succinic acid dehydrogenase inhibitor
  • b-4 external quinone inhibitor (QoI agent) As a quinone external inhibitor (QoI agent), [b-4.1] azoxystrobin (azoxystrobin), [b-4.2] coxoxystrobin (coumoxystrobin), [b-4.3] dimoxyst Robin (dimoxystrobin), [b-4.4] enoxastrobin (enoxastrobin), [b-4.5] famoxadone (famoxadone), [b-4.6] fenamidone (fenamidone), [b-4.7] ] Phenaminst robin (fenaminstrobin), [b-4.8] fluphenoxystrobin (flufenoxystrobin), [b-4.9] fluoxastrobin (fluoxastrobin), [b-4.
  • QoI agent quinone external inhibitor
  • b-5 internal quinone inhibitor (QiI agent)
  • quinone internal inhibitor examples include [b-5.1] cyazofamide (cyazofamid), [b-5.2] amisulbrom and the like.
  • Oxidative phosphorylation uncoupling inhibitor As an oxidative phosphorylation uncoupling inhibitor, [b-6.1] binapacryl (binapacryl), [b-6.2] meptyldinocap, [b-6.2] b-6.3] dinocap (dinocap), [b-6.4] fluazinam, and the like.
  • quinone external stigmaterine binding subsite inhibitor examples include [b-7.1] ametoctradin and the like.
  • b-8 Amino acid biosynthesis inhibitor [b-8.1] Cyprodinil as an amino acid biosynthesis inhibitor, [b-8.2] mepanipyrim (mepanipyrim), [b- 8.3] pyrimethanil (pyrimethanil) Etc.).
  • b-9 Protein biosynthesis inhibitor [b-9.1] streptomycin as a protein biosynthesis inhibitor, [b-9.2] Blasticidin S (blasticidin-S), [b-9. 3] Kasugamycin (kasugamycin), [b-9.4] oxytetracycline (oxytetracycline) and the like.
  • b-10 Signal transduction inhibitor [b-10.1] fenpiclonil, [b-10.2] fludioxonil, [b-10.3] quinoxyfen, as a signal transduction inhibitor [B-10.4] proquinazid, [b-10.5] clozolinate (chlozolinate), [b-10.6] dimethaclone (dimethachlone), [b-10.7] iprodione (iprodione), [b-10.4] -10.8] procymidone, [b-10.9] vinclozolin, and the like.
  • b-11 Lipid and cell membrane biosynthesis inhibitors [b-11.1] Edifenphos (edifenphos), [b-11.2] iprobenphos (iprobenfos), [b-11. Pyrazophos, [b-11.4] isoprothiolane, [b-11.5] biphenyl, [b-11.6] chloroneb, [b-11.7] dichlorane (Dicloran), [b-11.8] quintozene, [b-11.9] tecnazene, [b-11.10] tolclofos-methyl (tolclofos-methyl), [b-11.11] Etridiazole (ec hlomezol or etridiazole), [b-11.12] iodocarb, [b-11. 13] propamocarb, [b-11. 14] prothiocarb, and the like.
  • b-12 Demethylation inhibitor (DMI agent) As a demethylation inhibitor (DMI agent), [b-12.1] azaconazole (azaconazole), [b-12.2] bitertanol, [b-12. 3] bromuconazole, [b-12. b-12.4] cyproconazole (cyproconazole), [b-12.5] difenoconazole (difenoconazole), [b-12.6] diniconazole, [b-12.7] diniconazole M (diniconazole-M ), [B-12. 8] epoxiconazole (epoxiconazole), [b-12. 9] etaconazole (etaconazole), [b-12.
  • metconazole metalazole
  • b-13 Aminic fungicide [b-13.1] Aldimorph, [b-13. 2] dodemorph, [b-13. 3] fenpropimorph (fenpropimorph) as an amine bactericidal agent ), [B-13.4] tridemorph (tridemorph), [b-13.5] fenpropidin, [b-13.6] piperaline (piperalin), [b-13.7] spiroxamine (spiroxamine) Etc.).
  • b-14 3-keto reductase inhibitor in C4 demethylation of sterol biosynthesis
  • b-15 squalene epoxidase inhibitor of sterol biosynthesis
  • a squalene epoxidase inhibitor of sterol biosynthesis [b-15.1] pyributicarb, [b-15. 2] naftifine, [bftifine] -15.3] Terbinafine (terbinafine) etc. are mentioned.
  • b-16 Cell wall biosynthesis inhibitor [b-16.1] Polyoxins (polyoxins), [b-16.2] dimethomorph, [b-16.3] flumorph as cell wall biosynthesis inhibitor flumorph), [b-16.4] pyrimorph, [b-16.5] benthiavalicarb, [b-16.6] bentivalaricarb isopropyl, [b-16.6] -16.7] Iprovalicarb (iprovalicarb), [b-16.8] mandipropamide (mandipropamid), [b-17.9] valifenalate (valifenalate), and the like.
  • b-17 Melanin biosynthesis inhibitor [b-17.1] Phthalide or phthalide, [b-17. 2] Pyroquilone, [b-17. 3] Tricyclazole as a melanin biosynthesis inhibitor (Tricyclazole), [b-17.4] carpropamide, [b-17.5] diclocymet, [b-17.6] phenoxanil, [b-17.7] tolprocarb (tolprocarb) Etc.).
  • b-18 Host plant resistance inducer [b-18.1] Acibenzolar-S-methyl (acibenzolar-S-methyl), [b-18.2] probenazole (probenazole), [b-18. 1] as a host plant resistance inducer -18.3] Thiazinyl, [b-18.4] Isotianil, [b-18.5] laminarin, and the like.
  • b-19 dithiocarbamate fungicide
  • Phthalimide fungicide [b-20.1] captan, [b-20.2] captafol, [b-20.3] holpet (folpet) as a phthalimide fungicide And [b-20.4] fluorophorpet and the like.
  • guanidine fungicide [b-21.1] guazatine as a guanidine fungicide, [b-21.2] iminoctadine (iminoctadine), [b-21.3] iminoctadine albesylate salt (Iminoctadine albesilate), [b-21.4] iminoctadine triacetate, and the like.
  • Multi-functional point contact active germicide [b-22.1] Basic copper chloride, [b-22.2] cupric hydroxide as a multi-functional contact germicidal agent (Copper (II) hydroxide), [b-22.3] basic copper sulfate (copper hydroxide sulfate), [b-22.4] organo copper compound (organocopper compound), [b-22.5] dodecyl benzene sulfone Bisethylenediamine copper complex salt [II] (dodecylbenzene acid sulfonic acid bisethylenediamine copper [II] salt, DBEDC), [b-22.6] sulfur (sulphur), [b-22.7] fluorimide (fluoroim) de), [b-22.8] chlorothalonil, [b-22.9] dichlofluanid (dichlofluanid), [b-22.
  • Basic copper chloride [b-22.2] cupric hydroxide as a multi-functional contact germicidal agent (Copper (II) hydro
  • b-23 Other bactericidal agents [b-23. 1] dichlobentiazox, [b-23.2] fenpicoxamide, [b-23.3] as other bactericidal agents ] Dipimethitron (dipymetitrone), [b-23.4] bupirimate, [b-23.5] dimethyrimol (dimethirimol), [b-23.6] ethylymol (ethirimol), [b-23.7] acetic acid Triphenyltin (fentin acetate), [b-23.8] triphenyltin chloride (fentin chloride), [b-23.9] triphenyltin hydroxide (fentin hydroxide), [b-23.10] oxolinic acid (Oxo linic acid), [b-23.11] hymexazol, [b-23.12] octilinone, [b-23.
  • A3 represents a hydrogen atom, a halogen atom, a C1 to C6 alkyl group, a C1 to C6 haloalkyl group, or a cyano group
  • A4 represents a hydrogen atom, a C1 to C6 alkyl group, or C1 to C6 It represents a haloalkyl group or a C3 to C8 cycloalkyl group.
  • a compound represented by the formula] (see WO 14/105675),
  • A9 and A10 are each independently a hydrogen atom or a halogen atom, A11 is a halogen atom, A12 is a halogen atom, or a C1-C6 alkyl group, and A13 is And a halogen atom, a cyano group, a C1-C6 alkyl group, or a C1-C6 alkoxy group.
  • A23 and A24 each independently represent a hydrogen atom, a halogen atom, a C1-C6 alkyl group, or a C3-C8 cycloalkyl group, and X represents an oxygen atom or a sulfur atom.
  • a compound represented by see WO07 / 087906, WO09 / 016220, WO10 / 130767),
  • A41 represents a hydrogen atom, a hydroxyl group (-SH), a thiocyanate group (-SCN), or a C1-C6 alkylthio group
  • A42, A43, A44 and A45 are each independently , A hydrogen atom, or a halogen atom.
  • a compound represented by the formula] (see WO09 / 077443),
  • insecticide which can be used in combination with the compound of the present invention are exemplified in the following group c and include salts, isomers and N-oxides thereof.
  • known insecticides are not limited to these.
  • Group c c-1: Carbamate-based acetylcholine esterase (AChE) inhibitor [c-1.1] Phosphocarb (phosphocarb), [c-1.2] alanicarb (alycarb), [c -1.3] butocarboxim, [c-1.4] butoxycarboxim, [c-1.5] thiodicarb, [c- 1.6] thiophanox (thiofanox) ), [C-1.7] aldicarb (aldicarb), [c-1.8] bendiocarb, [c-1.9] benfuracarb (benfuracarb), [c-1.10] carbaryl (carbacarb) ryl), [c-1.11] carbofuran, [c-1.12] carbosulfan, [c-1.13] ethiophenecarb, [c-1.14] fenobucarb (c) fenobucarb), [c-1.15] formetanate, [c-1.16] fur
  • c-2 Organophosphorus acetylcholine esterase (AChE) inhibitor [c-2.1] acephate, [c-2.2] azamethiphos (azamethiphos) as an organophosphorus acetylcholine esterase (AChE) inhibitor [C-2.3] Azinphos-methyl (azinphos-methyl), [c-2.4] Azinphos-ethyl (azinphos-ethyl), [c-2.5] Ethephon, [c-2.6] ] Cadusafos, [c-2.7] chlorethoxyphos (chlorethoxyfos), [c-2.8] chlorfenvinphos, [c-2.9] chlormephos, [c-] 2.10] Black Lupyrifos (chlorpyrifos), [c-2.11] chlorpyrifos-methyl (chlorpyrifos-methyl), [c-2.12] coumaphos (coumaphos), [c-2.13] cyanophos (cyanopho
  • c-3 GABAergic Chloride Channel Blocker As a GABAergic Chloride Channel Blocker [c-3.1] chlordane (chlordane), [c-3.2] endosulfan (endosulfan), [c-3.3] Lindane, [c-3.4] dienochlor, [c- 3.5] ethiprole, [c-3.6] fipronil, [c-3.7] aceto There are aproe (acetoprole) and the like.
  • c-4 Sodium channel modulator [c-4.1] acrinathrin (acrinathrin), [c-4.2] allethrin [(1R) -isomer] (allethrin [(1R) -isomer]), as a sodium channel modulator [C-4.3] bifenthrin, [c-4.4] bioallethrin, [c-4.5] bioallethrin, S-cyclopentenyl isomer, [c- 4.6] bioresmethrin (bioresmethrin), [c-4.7] cycloprothrin, [c-4.8] cyfluthrin, [c-4.
  • Beta-cyfluthrin (beta-cyfluthrin), [c-4. 10] cyhalothrin (cyhalothrin), [c-4. 11] gamma-cyhalothrin (gamma-cyhalothrin), [c-4. 12] lambda-cyhalothrin (lambda) -Cyhalothrin), [c-4.13] cypermethrin (cypermethrin), [c-4. 14] alpha-cypermethrin (alpha-cypermethrin), [c-4.
  • beta-cypermethrin (beta-cypermethrin)
  • C-4.16 theta-cypermethrin (theta-cypermethrin)
  • zeda-cypermethrin zeta-cypermethrin
  • flumethrin (flumethrin) [C-4.27] Tau-fluvalinate (tau-fluvalinate), [c-4. 28] halfenprox (halfenprox), [c-4. 29] imiprothrin (imiprothrin), [c-4. 30] ] Methothrin (methothrin), [c-4.31] methofluthrin (metofluthrin), [c-4. 32] epsilon-methofluthrin (epsilon-metofluthrin), [c-4.
  • ZXI8 901 (3- (4-bromophenoxy) phenyl] -cyanomethyl 4- (difluoromethoxy) - ⁇ - (1-methylethyl) benzeneacetate), [c-4.47] biopermethrin (biopermethrin), [c-4.48] framethrin (Furamethrin), [c-4.49] profluthrin (profluthrin), [c-4. 50] flubrocythrinate, [c- 4.51] dimefluthrin, [c- 4.52] DDT (dichloro-diphenyl-trichloroethane), [c-4.53] methoxychloro, [c-4. 4] phenothrin (phenothrin), and the like [c-4.55] fluvalinate (fluvalinate).
  • c-5 Nicotinic acetylcholine receptor (nAChR) competitive modulator As a nicotinic acetylcholine receptor (nAChR) competitive modulator, [c-5.1] acetamiprid (acetamiprid), [c-5.2] clothianidin (clothianidin) ), [C-5.3] dinotefuran, [c-5.4] imidacloprid (imidacloprid), [c-5.5] nitenpyram (nitenpyram), [c-5.6] thiacloprid, [C-5.7] Thiamethoxam, [c-5.8] Nicotine (nicotine), [c-5.9] Nicotine Sulfate, [c-5.
  • nAChR Nicotinic acetylcholine receptor
  • c-6 Nicotinic acetylcholine receptor (nAChR) allosteric modulator As a nicotinic acetylcholine receptor (nAChR) allosteric modulator, [c-6.1] spinosad (spinosad), [c-6.2] spinetram (spinetram), etc. Can be mentioned.
  • c-7 Glutamatergic Chloride Channel (GluCl) Allosteric Modulator As a glutamatergic Chloride Channel (GluCl) allosteric modulator, [c-7.1] Abamectin (abamectin), [c-7.2] emamectin benzoate Salts (emamectin benzoate), [c-7.3] lepimectin (lepimectin), [c-7.4] milbemectin, etc. may be mentioned.
  • c-8 Juvenile hormone analogues As juvenile hormone analogues, [c-8.1] hydroprene (hydroprene), [c-8.2] quinoprene (kinoprene), [c-8.3] methoprene (methoprene) , [C-8.4] phenoxycarb, [c-8.5] pyriproxyfen, and the like.
  • c-9 Nonspecific (multisite) inhibitor [c-9.1] methyl bromide, [c-9.2] chlorpicrin as nonspecific (multisite) inhibitor [C-9.3] cryolite, [c-9.4] sulfuryl fluoride, [c-9.5] borax (borax), [c-9.6] borax Acid (boric acid), [c-9.7] octaborate disodium salt (disodium octaborate), [c-9.8] metaborate sodium salt (sodium metabolite) [c-9.9] emetic), [c-9.10] dazomet, [c-9.11] metam (m et al., [c-9.12] carbam sodium salt (metham sodium) and the like.
  • c-10 Chord Organ TRPV Channel Modulator [c-10.1] pymetrozine, [c-10.2] pyrifluquinazon, etc. may be mentioned as a chord organ TRPV channel modulator.
  • c-11 Acaride growth inhibitor As acaricide growth inhibitor, [c-11. 1] clofenthezine, [c-1 11. 2] diflovidazine, [c-11. 3] hexethiazox (Hexythiazox), [c-11.4] etoxazole, and the like.
  • c-12 Mitochondrial ATP synthetase inhibitor [c-12.1] diafenthiuron as a mitochondrial ATP synthetase inhibitor, [c-12. 2] azocyclotin (azocyclotin), [c-12. 3] Cyhexatin (cyhexatin), [c-12. 4] fenbutatin oxide, "c-12.5" propargite, "c-12.6" tetradifon, etc. .
  • c-13 Oxidative phosphorylation uncoupling agent perturbing a proton gradient [c-13.1] chlorfenapyr (chlorfenapyl), [c-13.2] DNOC as an oxidative phosphorylation uncoupling agent disrupting a proton gradient (Dintro-ortho-cresol), [c-13.3] binapacryl, [c-13.4] sulfluramid, and the like.
  • c-14 Nicotinic acetylcholine receptor (nAChR) channel blocker [c-14.1] bensultap (bensultap), [c-14.2] cartap hydrochloride (cartap) as a nicotinic acetylcholine receptor (nAChR) channel blocker and [c-14.3] thiocyclam (thiocyclam), [c-14.4] monosultap, and the like.
  • c-15 Chitin biosynthesis inhibitor type 0 As chitin biosynthesis inhibitor type 0, [c-15. 1] bistrifluron (bistrifluron), [c-15. 2] chlorfluazuron (chlorfluazuron), [c-15. 3] diflubenzuron (diflubenzuron), [C-15.4] flucycloxuron, [c-15.5] flufenoxuron, [c-15.6] hexaflumuron, [c-15.7] Lufenuron, [c-15.8] novarron, [c-15.9] noviflumuron, [c-15. 10] teflubenzuron, [c-15. 11] Rifurumuron (triflumuron), and the like.
  • c-16 Chitin biosynthesis inhibitor type 1
  • Examples of chitin biosynthesis inhibitor type 1 include [c-16. 1] buprofezin and the like.
  • c-18 molting hormone (ecdysone) receptor agonist
  • molting hormone (ecdysone) receptor agonist [c-18.1] chromafenozide, [c-18. 2] halofenozide, [c-18 .3] methoxyfenozide, [c-18.4] tebufenozide, etc. may be mentioned.
  • Octopamine Receptor Agonist [c-19. 1] amitraz etc. may be mentioned as an octopamine receptor agonist.
  • c-20 mitochondrial electron transport complex III inhibitor [c-20.1] hydramethylnon (hydramethylnon), [c-20.2] acequinocyl as a mitochondrial electron transport complex III inhibitor [C-20.3] Fluacrypyrim, [c-20.4] bifenazate, etc. may be mentioned.
  • c-21 Mitochondrial electron transport complex I inhibitor (METI) [C-21.1] fenazaquin, [c-21.2] fenpyroximate, [c-21.3] pyridaben, as mitochondrial electron transfer complex I inhibitor (METI), [C-21.4] pirimidifene (pylimdifen), [c-21.5] tebufenpyrad (tebufenpyrad), [c-21.6] tolfenpyrad (tolfenpyrad), [c-21.7] rotenone etc.
  • Voltage-gated sodium channel blocker examples include [c-22.1] indoxacarb, [c-22.2] metaflumizone, and the like.
  • c-23 Acetyl-CoA carboxylase inhibitor As an acetyl-CoA carboxylase inhibitor, [c-23. 1] spirodiclofen (spirodiclofen), [c-23. 2] spiromesifen, [c-23.3] ] Spirotetramat (spirotetramat) etc. are mentioned.
  • c-24 Mitochondrial electron transport complex IV inhibitor As a mitochondrial electron transport complex IV inhibitor, [c-24. 1] aluminum phosphide, [c-24.2] calcium phosphide calcium phosphide, [c-24.3] hydrogen phosphide, [c-24.4] zinc phosphide, [c-24.5] calcium cyanide, [c-24.5] -24.6] sodium cyanide (potassium cyanide), [c-24.7] potassium cyanide (sodium cyanide) and the like.
  • c-25 Mitochondrial electron transport complex II inhibitor As a mitochondrial electron transport complex II inhibitor, [c-25.1] cyenopyraphen (cyenopyrafen), [c-25.2] cyflumethofen (cyflumetofen), [c -25.3] pyflubumide etc. are mentioned.
  • c-26 Ryanodine receptor modulator [c-26.1] Chlorantraniliprole (chlororantrilipole) as a ryanodine receptor modulator, [c-26.2] cyantraniliriprole (cyantraniliprole), [c-26. 3) Flubendiamide etc. are mentioned.
  • chord organelle modulator with non-specified target site As a chord organ organ modulator with non-specified target region, [c-27.1] flonicamide and the like can be mentioned.
  • c-28 Other insecticides As another insecticide, [c-28.1] azadirachtin (azadirachtin), [c-28.2] benzoximate, [c-28.3] phenisobromo (Phenisobromolate), [c-28.4] quinomethionate, [c-28.5] dicofol, [c-28.6] pyridalyl, [c-28.7] bromopropi Rate (bromopropylate), [c-28.8] triazamate, [c-28.9] dicyclanil, [c-28.
  • V 3 represents a nitrogen atom, a carbon atom or C—F
  • V 4 and V 5 are each independently a nitrogen atom or a carbon atom.
  • a compound represented by the formula see WO 11/134964 and WO 14/005982
  • A65 represents a hydrogen atom, a C1-C6 alkyl group, or a C1-C6 haloalkyl group
  • A66 represents a hydrogen atom, a halogen atom, or a C1-C6 alkyl group
  • A67 and A68 represent And each independently a hydrogen atom, a C1 to C6 alkyl group optionally substituted with cyano group, an alkyl group optionally substituted with methoxy group, an alkyl group optionally substituted with ethoxy group, Or a C3-C8 cycloalkyl group
  • A69 represents a hydrogen atom, a cyano group, a C1 to C6 haloalkyl group optionally substituted with a cyano group, a C1 to C6 alkyl group, or a C3 to C8 cycloalkyl group.
  • Formula (s53) or Formula (s54) [Wherein, A70 represents a methyl group, an ethyl group, an isopropyl group, a 2,2,2-trifluoroethyl group, or a phenyl group, and A71 represents Represents a partial structure selected from the group consisting of And V8 represents an oxygen atom, a sulfur atom, -CH 2- or -CH 2 CH 2- .
  • a compound represented by see WO 14/167084, WO 16/055431),
  • A90 represents a halogen atom, a C1 to C6 alkyl group, or a C1 to C6 haloalkyl group
  • A91 represents a C1 to C6 haloalkyl group
  • A92 and A93 are each independently a hydrogen atom
  • A94 and A95 each independently represent a hydrogen atom or a C1 to C6 alkyl group, Or a C1 to C6 haloalkyl group.
  • the like see WO 12/164698
  • the mixing ratio of the compound of the present invention to the pest control agent is not particularly limited as long as the effect is exhibited, but generally, the weight of the compound of the present invention is 0.001 to 1000 It is a ratio of 1000, preferably a ratio of 0.01 to 100.
  • Phenylmagnesium chloride in 3.3 ml of a THF solution containing 330 mg of 5-chloro-2- (2,4,6-trifluorophenyl) -1-ethyl-6-oxo-1,6-dihydropyridine-3-carbaldehyde 575 ⁇ l of a THF solution (2.0 mol / L) was added dropwise under ice-cooling and stirred for 10 minutes.
  • Saturated aqueous ammonium chloride solution and ethyl acetate were added to the reaction mixture and the phases were separated, and the obtained organic layer was washed with saturated brine and dried over sodium sulfate. After evaporating the solvent under reduced pressure, the obtained residue was purified by silica gel column chromatography. The title compound was obtained as 353 mg of white amorphous.
  • Structure A represents
  • Structure B represents the following.
  • the compounds of the present invention are specifically shown to be effective against plant diseases, but are not limited to these examples.
  • the compound of the present invention was dissolved in a dimethylsulfoxide-methanol mixed solution (volume ratio: 9/1) and diluted with well water to a concentration of 250 ppm to obtain a drug solution.
  • the obtained drug solution was sprayed on the test plants (2.5 ml / pot).
  • the plants were spray-inoculated with a conidia suspension of 1-2 ⁇ 10 5 plants / ml of Magnaporthe grisea.
  • the cells were left in a wet room at a temperature of 20-23 ° C. for about 24 hours to promote the onset of disease.
  • the degree of onset of the disease 6 to 10 days after inoculation was investigated to evaluate the effect of the drug solution.
  • Example B Tomato gray mold scab After sowing the seeds of the test plant (tomato variety: large-sized Fukuju), cultivation was continued until 3 to 5 true leaves developed.
  • the compound of the present invention was dissolved in a dimethylsulfoxide-methanol mixed solution (volume ratio: 9/1) and diluted with well water to a concentration of 250 ppm to obtain a drug solution.
  • the obtained drug solution was sprayed on the test plants (2.5 ml / pot). After the drug solution had been dried, the plants were spray-inoculated with a 4 to 8 ⁇ 10 5 / ml conidia suspension of Botrytis cinerea. After inoculation, it was left in a wet room at a temperature of 20-23 ° C. for about 48 hours to promote the onset of the disease. The incidence of disease 2-3 days after inoculation was investigated to evaluate the effect of the drug solution.
  • Example C Cabbage black soot disease
  • the seeds of the test plant (cabbage cultivar: four seasons harvest) were sowed, and cultivated until cotyledons were developed.
  • the compound of the present invention was dissolved in a dimethylsulfoxide-methanol mixed solution (volume ratio: 9/1) and diluted with well water to a concentration of 250 ppm to obtain a drug solution.
  • the obtained drug solution was sprayed on the test plants (2.5 ml / pot). After the drug solution had been dried, the plants were spray-inoculated with a 4 to 8 ⁇ 10 5 / ml conidia suspension of cabbage black scab (Alternaria brassicicola). After inoculation, it was left in a wet room at a temperature of 20-23 ° C. for about 48 hours to promote the onset of the disease. The incidence of disease 2-3 days after inoculation was investigated to evaluate the effect of the drug solution.
  • Test Example D Barley powdery mildew
  • the seeds of the test plant (barley cultivar: Akagami power) were sown and cultivated until the first leaves were developed.
  • the compound of the present invention was dissolved in a dimethylsulfoxide-methanol mixed solution (volume ratio: 9/1) and diluted with well water to a concentration of 250 ppm to obtain a drug solution.
  • the obtained drug solution was sprayed on the test plants (2.5 ml / pot). After the drug solution had dried, the conidia of the barley powdery mildew (Blumeria graminis f. Sp. Hordei) were knocked off and inoculated. The degree of onset 6 to 10 days after inoculation was investigated to evaluate its effect.
  • Example E Wheat leaf rust disease After sowing the seeds of the test plant (wheat cultivar: Norin 61), cultivation was carried out until the first leaf was developed.
  • the compound of the present invention was dissolved in a dimethylsulfoxide-methanol mixed solution (volume ratio: 9/1) and diluted with well water to a concentration of 250 ppm to obtain a drug solution.
  • the obtained drug solution was sprayed on the test plants (2.5 ml / pot). After the drug solution had been dried, the plants were spray inoculated with 1 to 2 ⁇ 10 5 / ml of a summer spore suspension of wheat rust fungus (Puccinia recondita).
  • the cells were left in a wet room at a temperature of 20-23 ° C. for about 24 hours to promote the onset of disease.
  • the incidence of disease 7 to 10 days after inoculation was investigated to evaluate the effect of the drug solution.
  • Tomato plague After seeding the seeds of the test plant (tomato variety: large-sized Fukuju), cultivation was carried out until 3 to 5 true leaves developed.
  • the compound of the present invention was dissolved in a dimethylsulfoxide-methanol mixed solution (volume ratio: 9/1) and diluted with well water to a concentration of 250 ppm to obtain a drug solution.
  • the obtained drug solution was sprayed on the test plants (2.5 ml / pot). After the drug solution had been dried, the plants were spray-inoculated with 4-8 ⁇ 10 3 / ml of a zoospore suspension of Phytophthora infestans. After inoculation, it was left in a wet room at a room temperature of 20 ° C. for about 24 hours to promote the onset. The degree of onset of disease 5-10 days after inoculation was investigated to evaluate the effect of the drug solution.
  • Test Example G Grape downy mildew Seeds of test plants (grape varieties: neomascat) were sown and cultivated until 3 or 4 true leaves developed.
  • the compound of the present invention was dissolved in a dimethylsulfoxide-methanol mixed solution (volume ratio: 9/1) and diluted with well water to a concentration of 250 ppm to obtain a drug solution.
  • the obtained drug solution was sprayed on the test plants (2.5 ml / pot). After the drug solution had been dried, the plants were spray-inoculated with a zoospore suspension of 1-2 ⁇ 10 4 plants / ml Plasmoparabiticola. After inoculation, it was left in a wet room at a room temperature of 20 ° C. for about 24 hours to promote the onset. The incidence of disease 7 to 10 days after inoculation was investigated to evaluate the effect of the drug solution.
  • Test Example H Cucumber anthracnose After sowing the seeds of the test plant (cucumber variety: Sagami-hanhaku), cultivation was carried out until one true leaf was developed.
  • the compound of the present invention was dissolved in a dimethylsulfoxide-methanol mixed solution (volume ratio: 9/1) and diluted with well water to a concentration of 250 ppm to obtain a drug solution.
  • the obtained drug solution was sprayed on the test plants (2.5 ml / pot). After the drug solution had been dried, the plants were spray-inoculated with a 2 to 4 ⁇ 10 5 / ml conidia suspension of a cucumber anthracnose fungus (Colletotrichum orbiculare).
  • the cells were left in a wet room at a temperature of 20-23 ° C. for about 24 hours to promote the onset of disease.
  • the degree of onset of the disease 6 to 10 days after inoculation was investigated to evaluate the effect of the drug solution.
  • the onset degree of a disease-free plant was 0, the onset degree of a plant in the non-drug treated area was 3, and the onset degree was evaluated every 0.05.
  • the pyridone compounds of the present invention are novel compounds and can control plant diseases, they are useful as agricultural chemicals, for example, pesticides for agricultural and horticultural plants, particularly as fungicides for agricultural and horticultural plants.

Abstract

Provided is a novel compound for controlling plant disease damage. A pyridone compound according to the present invention is a novel compound, and can control plant disease damage.

Description

ピリドン化合物およびそれを有効成分とする農園芸用殺菌剤Pyridone compounds and agricultural and horticultural fungicides comprising the same as an active ingredient
 本発明は、ピリドン化合物および該化合物を有効成分とする農薬に関するものである。 The present invention relates to a pyridone compound and a pesticide containing the compound as an active ingredient.
 安定的な農業生産を確保する上で、農園芸作物の病害を防除することは重要な役割を果たす。そのため、様々な殺菌剤が使用されているが、長年にわたる殺菌剤の使用は薬剤耐性菌の出現を招くために、薬剤感受性菌のみならず薬剤耐性菌に対しても有効な新規殺菌剤が切望されている。 Controlling diseases of agricultural and horticultural crops plays an important role in securing stable agricultural production. Therefore, although various bactericidal agents are used, since the use of bactericidal agents for many years causes the emergence of drug-resistant bacteria, novel bactericidal agents effective against not only drug-sensitive bacteria but also drug-resistant bacteria are in great need It is done.
 ところで、1,3,5,6-置換-2-ピリドン化合物に関する先行例が知られている。例えば、GABAアルファー2/3リガンドとして、3位にアリール基またはヘテロアリール基を有する1,3,5,6-置換-2-ピリドン化合物が開示されている(例えば、国際公開第98/55480号参照)。細菌性感染症の治療薬としては、3位にカルボキシル基を有する1,3,5,6-置換-2-ピリドン化合物が開示されている(例えば、欧州特許第0308020明細書参照)。さらに、抗HIV剤として、1位に4,4-ジメチルペンタン酸が導入された1,3,5,6-置換-2-ピリドン化合物が開示されている(例えば、国際公開第2016/012913号参照)。 By the way, prior examples of 1,3,5,6-substituted 2-pyridone compounds are known. For example, 1,3,5,6-substituted 2-pyridone compounds having an aryl group or a heteroaryl group at the 3-position as a GABA alpha-2 / 3 ligand are disclosed (for example, WO 98/55480) reference). As therapeutic agents for bacterial infections, 1,3,5,6-substituted 2-pyridone compounds having a carboxyl group at the 3-position are disclosed (see, for example, European Patent No. 0308020). Furthermore, as an anti-HIV agent, a 1,3,5,6-substituted -2-pyridone compound in which 4,4-dimethylpentanoic acid is introduced at 1 position is disclosed (for example, WO 2016/012913 reference).
国際公開第98/55480号WO 98/55480 欧州特許第0308020明細書European Patent No. 0308020 国際公開第2016/12913号International Publication No. 2016/12913
 しかしながら、国際公開第98/55480号、欧州特許第0308020明細書および国際公開第2016/12913号に記載されている化合物の用途は、いずれも医薬に関するものであり、本発明に係る農園芸用殺菌剤が属する技術分野とは相違する。 However, all of the uses of the compounds described in WO 98/55480, European Patent No. 0308020 and WO 2016/12913 relate to medicine, and the sterilization according to the present invention for agricultural and horticultural purposes It differs from the technical field to which the agent belongs.
 本発明の課題は、農園芸用殺菌剤として有効である新規なピリドン化合物を提供することである。 An object of the present invention is to provide a novel pyridone compound which is effective as an agricultural and horticultural fungicide.
 本発明者らは、前記課題を解決すべく、1,3,5,6-置換-2-ピリドン化合物群および1,5,6-置換-2-ピリドン化合物群について鋭意検討を行った。その結果、該2-ピリドン骨格において、5位にアリール基またはヘテロアリール基で置換されたアルキル基類を導入した新規な化合物群が、植物病害に対して優れた防除活性を発揮することを見出し、本発明を完成するに至った。 The present inventors diligently studied 1, 3, 5, 6-substituted 2-pyridone compounds and 1, 5, 6-substituted 2-pyridone compounds in order to solve the above-mentioned problems. As a result, it has been found that a novel compound group in which an alkyl group substituted with an aryl group or a heteroaryl group is introduced at the 5-position in the 2-pyridone skeleton exhibits excellent control activity against plant diseases. The present invention has been completed.
 すなわち、本発明は、以下の通りである。 That is, the present invention is as follows.
[1]
 式(1)
Figure JPOXMLDOC01-appb-C000002

[式中、R1は、
  水酸基、
  シアノ基、
  置換基Aで適宜置換されてもよいC1~C6のアルキル基、
  C1~C6のハロアルキル基、
  置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、
  置換基Aで適宜置換されてもよいC2~C6のアルケニル基、
  C2~C6のハロアルケニル基、
  置換基Aで適宜置換されてもよいC2~C6のアルキニル基、
  C2~C6のハロアルキニル基、
  置換基Aで適宜置換されてもよいC1~C6のアルコキシ基、
  C1~C6のハロアルコキシ基、
  置換基Aで適宜置換されてもよいC3~C8のシクロアルコキシ基、
  置換基Aで適宜置換されてもよいC2~C6のアルケニルオキシ基、
  C2~C6のハロアルケニルオキシ基、
  置換基Aで適宜置換されてもよいC3~C6のアルキニルオキシ基、
  C3~C6のハロアルキニルオキシ基、
  またはRaRbN-(ここで、RaおよびRbは、それぞれ独立していて、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表すか、あるいはRaおよびRbは、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。)を表し;
 R2は、
  水素原子、
  ニトロ基、
  ハロゲン原子、
  置換基Aで適宜置換されてもよいC1~C6のアルキル基、
  C1~C6のハロアルキル基、
  置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、
  置換基Aで適宜置換されてもよいC2~C6のアルケニル基、
  C2~C6のハロアルケニル基、
  置換基Aで適宜置換されてもよいC2~C6のアルキニル基、
  C2~C6のハロアルキニル基、
  置換基Aで適宜置換されてもよいC1~C6のアルコキシ基、
  C1~C6のハロアルコキシ基、
  置換基Aで適宜置換されてもよいC3~C8のシクロアルコキシ基、
  置換基Aで適宜置換されてもよいC2~C6のアルケニルオキシ基、
  C2~C6のハロアルケニルオキシ基、
  置換基Aで適宜置換されてもよいC3~C6のアルキニルオキシ基、
  C3~C6のハロアルキニルオキシ基、
  Rc-L-(ここで、Rcは、C1~C6のアルキル基、またはC1~C6のハロアルキル基を表し、Lは、S、SO、またはSO2を表す。)、
  またはRdC(=O)-(ここで、Rdは、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表す。)を表し;
 Xは、酸素原子または硫黄原子を表し;
 Yは、
  R3で適宜0~7置換されてもよいアリール基(ただし、2置換以上のR3の場合、それぞれ独立している。)、
  またはR3で適宜0~4置換されてもよいヘテロアリール基(ただし、2置換以上のR3の場合、それぞれ独立している)を表し;
 R3は、
  水酸基、
  シアノ基、
  ニトロ基、
  ハロゲン原子、
  置換基Cで適宜置換されてもよいC1~C6のアルキル基、
  C1~C6のハロアルキル基、
  置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、
  置換基Cで適宜置換されてもよいC2~C6のアルケニル基、
  C2~C6のハロアルケニル基、
  置換基Cで適宜置換されてもよいC2~C6のアルキニル基、
  C2~C6のハロアルキニル基、
  置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、
  C1~C6のハロアルコキシ基、
  置換基Cで適宜置換されてもよいC3~C8のシクロアルコキシ基、
  置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、
  C2~C6のハロアルケニルオキシ基、
  置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、
  C3~C6のハロアルキニルオキシ基、
  RaRbN-(ここで、RaおよびRbは、前記と同義である。)、
  Rc-L-(ここで、RcおよびLは、前記と同義である。)、
  Rx1C(=O)-(ここで、Rx1は、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはRaRbN-(ここで、RaおよびRbは前記と同義である。)を表す。)、
  またはRx1C(=O)O-(ここで、Rx1は、前記と同義である。)を表し;
 Zは、
  R4で適宜0~7置換されてもよいアリール基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
  またはR4で適宜0~6置換されてもよい複素環基(ただし、2置換以上のR4の場合、それぞれ独立している。)を表し;
 R4は、
  水酸基、
  シアノ基、
  ニトロ基、
  ハロゲン原子、
  置換基Cで適宜置換されてもよいC1~C6のアルキル基、
  C1~C6のハロアルキル基、
  置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、
  置換基Cで適宜置換されてもよいC2~C6のアルケニル基、
  C2~C6のハロアルケニル基、
  置換基Cで適宜置換されてもよいC2~C6のアルキニル基、
  C2~C6のハロアルキニル基、
  置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、
  C1~C6のハロアルコキシ基、
  置換基Cで適宜置換されてもよいC3~C8のシクロアルコキシ基、
  置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、
  C2~C6のハロアルケニルオキシ基、
  置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、
  C3~C6のハロアルキニルオキシ基、
  置換基Dで適宜置換されてもよいアリール基、
  置換基Dで適宜置換されてもよいヘテロアリール基、
  置換基Dで適宜置換されてもよいアリールオキシ基、
  置換基Dで適宜置換されてもよいヘテロアリールオキシ基、
  置換基Dで適宜置換されてもよいアラルキルオキシ基、
  RaRbN-(ここで、RaおよびRbは、前記と同義である。)、
  Rc-L-(ここで、RcおよびLは、前記と同義である。)、
  Rx1C(=O)-(ここで、Rx1は、前記と同義である。)、
  Rx1C(=O)O-(ここで、Rx1は、前記と同義である。)、
  またはRx2C(=O)N(Rx3)-(ここで、Rx2は、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはRaRbN-(ここで、RaおよびRbは、前記と同義である。)を表し、Rx3は、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表す。)を表し;
 Wは、
  R5で適宜0~2置換されてもよいC1~C6のアルキレン基(ただし、2置換のR5の場合、それぞれ独立している。)を表し;
 R5は、
  水酸基、
  シアノ基、
  ハロゲン原子、
  置換基Cで適宜置換されてもよいC1~C6のアルキル基、
  C1~C6のハロアルキル基、
  置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、
  置換基Cで適宜置換されてもよいC2~C6のアルケニル基、
  C2~C6のハロアルケニル基、
  置換基Cで適宜置換されてもよいC2~C6のアルキニル基、
  C2~C6のハロアルキニル基、
  置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、
  C1~C6のハロアルコキシ基、
  置換基Cで適宜置換されてもよいC3~C8のシクロアルコキシ基、
  置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、
  C2~C6のハロアルケニルオキシ基、
  置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、
  C3~C6のハロアルキニルオキシ基、
  Rc-L-(ここで、RcおよびLは、前記と同義である。)、
  またはRx1C(=O)O-(ここで、Rx1は、前記と同義である。)を表し;
 そして、置換基Aは、水酸基、シアノ基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、RaRbN-(ここで、RaおよびRbは、前記と同義である。)およびRc-L-(ここで、RcおよびLは、前記と同義である。)からなる群から選択される少なくとも1種であり;
 置換基Bは、シアノ基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基およびC3~C8のシクロアルコキシ基からなる群から選択される少なくとも1種であり;
 置換基Cは、水酸基、シアノ基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、C2~C6のアルコキシアルコキシ基、RaRbN-(ここで、RaおよびRbは、前記と同義である。)、Rc-L-(ここで、RcおよびLは、前記と同義である。)、Rx1C(=O)-(ここで、Rx1は、前記と同義である。)および1~2個の酸素原子を含む3~6員環の基からなる群から選択される少なくとも1種であり;
 置換基Dは、水酸基、シアノ基、ニトロ基、ハロゲン原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基およびC3~C8のシクロアルコキシ基からなる群から選択される少なくとも1種である。]で表される化合物またはその塩。
[1]
Formula (1)
Figure JPOXMLDOC01-appb-C000002

[Wherein, R 1 is
Hydroxyl group,
Cyano group,
A C1 to C6 alkyl group optionally substituted with a substituent A,
C1 to C6 haloalkyl group,
A C3-C8 cycloalkyl group which may be optionally substituted by a substituent A,
A C2-C6 alkenyl group which may be optionally substituted by a substituent A,
A C 2 -C 6 haloalkenyl group,
A C2 to C6 alkynyl group which may be optionally substituted by a substituent A,
A C2 to C6 haloalkynyl group,
A C1 to C6 alkoxy group which may be optionally substituted by a substituent A,
A C1 to C6 haloalkoxy group,
A C3 to C8 cycloalkoxy group which may be optionally substituted by a substituent A,
A C2-C6 alkenyloxy group which may be optionally substituted by a substituent A,
C2-C6 haloalkenyloxy group,
A C3-C6 alkynyloxy group which may be optionally substituted by a substituent A,
A C3-C6 haloalkynyloxy group,
Or RaRbN- (wherein Ra and Rb are each independently a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or a C3 to C8 And R.sup.A and R.sup.b, together with the nitrogen atom to which they are attached, represent an aziridinyl, azetidinyl, pyrrolidinyl, piperidinyl, homopiperidinyl or azocanyl group. Represent;
R2 is
Hydrogen atom,
Nitro group,
Halogen atom,
A C1 to C6 alkyl group optionally substituted with a substituent A,
C1 to C6 haloalkyl group,
A C3-C8 cycloalkyl group which may be optionally substituted by a substituent A,
A C2-C6 alkenyl group which may be optionally substituted by a substituent A,
A C 2 -C 6 haloalkenyl group,
A C2 to C6 alkynyl group which may be optionally substituted by a substituent A,
A C2 to C6 haloalkynyl group,
A C1 to C6 alkoxy group which may be optionally substituted by a substituent A,
A C1 to C6 haloalkoxy group,
A C3 to C8 cycloalkoxy group which may be optionally substituted by a substituent A,
A C2-C6 alkenyloxy group which may be optionally substituted by a substituent A,
C2-C6 haloalkenyloxy group,
A C3-C6 alkynyloxy group which may be optionally substituted by a substituent A,
A C3-C6 haloalkynyloxy group,
Rc-L- (wherein Rc represents a C1-C6 alkyl group or a C1-C6 haloalkyl group, and L represents S, SO or SO2),
Or RdC (= O) — (wherein, Rd represents a C1 to C6 alkyl group, a C1 to C6 haloalkyl group, or a C3 to C8 cycloalkyl group which may be optionally substituted with a substituent B). Represents
X represents an oxygen atom or a sulfur atom;
Y is
An aryl group which may be optionally substituted 0 to 7 as R 3 (however, in the case of R 3 having 2 or more substituents, they are each independently),
Or a heteroaryl group which may be optionally substituted 0 to 4 with R 3 (provided that R 3 s each having 2 or more substituents are each independently);
R3 is
Hydroxyl group,
Cyano group,
Nitro group,
Halogen atom,
A C1 to C6 alkyl group which may be optionally substituted by a substituent C,
C1 to C6 haloalkyl group,
A C3-C8 cycloalkyl group which may be optionally substituted by a substituent C,
A C2-C6 alkenyl group which may be optionally substituted by a substituent C,
A C 2 -C 6 haloalkenyl group,
A C2 to C6 alkynyl group which may be optionally substituted by a substituent C,
A C2 to C6 haloalkynyl group,
A C1 to C6 alkoxy group which may be optionally substituted by a substituent C,
A C1 to C6 haloalkoxy group,
A C3 to C8 cycloalkoxy group which may be optionally substituted by a substituent C,
A C2-C6 alkenyloxy group which may be optionally substituted by a substituent C,
C2-C6 haloalkenyloxy group,
A C3-C6 alkynyloxy group which may be optionally substituted by a substituent C,
A C3-C6 haloalkynyloxy group,
RaR b N-(wherein, R a and R b are as defined above),
Rc-L- (wherein Rc and L are as defined above),
Rx1C (= O)-(wherein, Rx1 is a C1-C6 alkyl group optionally substituted with a substituent B, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy A group, a C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group, or RaRbN- (wherein Ra and Rb are as defined above),
Or Rx1C (= O) O— (wherein, Rx1 is as defined above);
Z is
An aryl group which may be optionally substituted 0 to 7 as R 4 (provided that R 4 has 2 or more substituents, each of which is independently of each other),
Or a heterocyclic group which may be optionally substituted 0 to 6 with R 4 (provided that each is independently R 2 in the case of 2 or more substituents R 4);
R4 is
Hydroxyl group,
Cyano group,
Nitro group,
Halogen atom,
A C1 to C6 alkyl group which may be optionally substituted by a substituent C,
C1 to C6 haloalkyl group,
A C3-C8 cycloalkyl group which may be optionally substituted by a substituent C,
A C2-C6 alkenyl group which may be optionally substituted by a substituent C,
A C 2 -C 6 haloalkenyl group,
A C2 to C6 alkynyl group which may be optionally substituted by a substituent C,
A C2 to C6 haloalkynyl group,
A C1 to C6 alkoxy group which may be optionally substituted by a substituent C,
A C1 to C6 haloalkoxy group,
A C3 to C8 cycloalkoxy group which may be optionally substituted by a substituent C,
A C2-C6 alkenyloxy group which may be optionally substituted by a substituent C,
C2-C6 haloalkenyloxy group,
A C3-C6 alkynyloxy group which may be optionally substituted by a substituent C,
A C3-C6 haloalkynyloxy group,
An aryl group which may be optionally substituted by a substituent D,
A heteroaryl group which may be optionally substituted by a substituent D,
An aryloxy group which may be optionally substituted by a substituent D,
A heteroaryloxy group which may be optionally substituted by a substituent D,
An aralkyloxy group which may be optionally substituted by a substituent D,
RaR b N-(wherein, R a and R b are as defined above),
Rc-L- (wherein Rc and L are as defined above),
Rx1C (= O)-(where Rx1 is the same as the above),
Rx1C (= O) O- (wherein, Rx1 is as defined above),
Or Rx2C (= O) N (Rx3)-(wherein, Rx2 is a hydrogen atom, a C1-C6 alkyl group optionally substituted with a substituent B, a C1-C6 haloalkyl group, a C3-C8 cyclo An alkyl group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, a C3 to C8 cycloalkoxy group, or RaRbN- (wherein Ra and Rb are as defined above), and Rx3 is A hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or a C3 to C8 cycloalkyl group.
W is
A C1 to C6 alkylene group which may be optionally substituted 0 to 2 with R 5 (wherein each of R 5 s is independently substituted);
R5 is
Hydroxyl group,
Cyano group,
Halogen atom,
A C1 to C6 alkyl group which may be optionally substituted by a substituent C,
C1 to C6 haloalkyl group,
A C3-C8 cycloalkyl group which may be optionally substituted by a substituent C,
A C2-C6 alkenyl group which may be optionally substituted by a substituent C,
A C 2 -C 6 haloalkenyl group,
A C2 to C6 alkynyl group which may be optionally substituted by a substituent C,
A C2 to C6 haloalkynyl group,
A C1 to C6 alkoxy group which may be optionally substituted by a substituent C,
A C1 to C6 haloalkoxy group,
A C3 to C8 cycloalkoxy group which may be optionally substituted by a substituent C,
A C2-C6 alkenyloxy group which may be optionally substituted by a substituent C,
C2-C6 haloalkenyloxy group,
A C3-C6 alkynyloxy group which may be optionally substituted by a substituent C,
A C3-C6 haloalkynyloxy group,
Rc-L- (wherein Rc and L are as defined above),
Or Rx1C (= O) O— (wherein, Rx1 is as defined above);
And, the substituent A is a hydroxyl group, a cyano group, a C3 to C8 cycloalkyl group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, a C3 to C8 cycloalkoxy group, RaRbN- (where, Ra And Rb is as defined above) and Rc-L- (wherein Rc and L are as defined above) and at least one selected from the group consisting of
The substituent B is at least one selected from the group consisting of a cyano group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group and a C3 to C8 cycloalkoxy group;
The substituent C is a hydroxyl group, a cyano group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group, a C2-C6 alkoxyalkoxy group, RaRbN -(Wherein, Ra and Rb are as defined above), Rc-L- (wherein, Rc and L are as defined above), Rx1C (= O)-(wherein, Rx1 At least one selected from the group consisting of the groups having the same meanings as described above) and a 3- to 6-membered ring group containing 1 to 2 oxygen atoms;
Substituent D includes a hydroxyl group, a cyano group, a nitro group, a halogen atom, a C1 to C6 alkyl group optionally substituted with substituent B, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group, C1 to C6. It is at least one selected from the group consisting of a C6 alkoxy group, a C1 to C6 haloalkoxy group, and a C3 to C8 cycloalkoxy group. Or a salt thereof.
[2]
 Yは、
  R3で適宜0~5置換されてもよいフェニル基(ただし、2置換以上のR3の場合、それぞれ独立している。)、
  R3で適宜0~4置換されてもよいピリジル基(ただし、2置換以上のR3の場合、それぞれ独立している。)、
  R3で適宜0~3置換されてもよいピリダジニル基、ピリミジニル基、もしくはピラジニル基(ただし、2置換以上のR3の場合、それぞれ独立している。)、
  R3で適宜0~2置換されてもよいトリアジニル基(ただし、2置換のR3の場合、それぞれ独立している。)、
  またはR3で適宜置換されてもよいテトラジニル基を表し;
 Zは、
  R4で適宜0~5置換されてもよいフェニル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
  R4で適宜0~7置換されてもよいナフチル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
  R4で適宜0~4置換されてもよいピリジル基、ピリダジニル基、ピリミジニル基、ピラジニル基、トリアジニル基、もしくはテトラジニル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
  R4で適宜0~3置換されてもよいチエニル基、チアゾリル基、イソチアゾリル基、チアジアゾリル基、もしくはチアトリアゾリル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
  R4で適宜0~4置換されてもよいピロリル基、ピラゾリル基、イミダゾリル基、トリアゾリル基、テトラゾリル基、もしくはペンタゾリル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
  R4で適宜0~3置換されてもよいフリル基、オキサゾリル基、イソキサゾリル基、オキサジアゾリル基、もしくはオキサトリアゾリル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
  R4で適宜0~6置換されてもよいインドリル基、イソインドリル基、インダゾリル基、ベンゾイミダゾリル基、もしくはベンゾトリアゾリル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
  R4で適宜0~5置換されてもよいベンゾフリル基、イソベンゾフリル基、ベンゾオキサゾリル基、ベンゾイソキサゾリル基、もしくはベンゾオキサジアゾリル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
  R4で適宜0~5置換されてもよいベンゾチエニル基、ベンゾチアゾリル基、ベンゾイソチアゾリル基、もしくはベンゾチアジアゾリル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
  R4で適宜0~6置換されてもよいインドリジニル基、イミダゾピリジル基、ピラゾロピリジル基、もしくはトリアゾロピリジル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
  R4で適宜0~5置換されてもよいピロロピリミジニル基、イミダゾピリミジニル基、ピラゾロピリミジニル基、トリアゾロピリミジニル基、ピロロピラジニル基、イミダゾピラジニル基、ピラゾロピラジニル基、もしくはトリアゾロピラジニル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
  R4で適宜0~6置換されてもよいキノリル基、イソキノリル基、シノリル基、フタラジニル基、キノキサリニル基、キナゾリニル基、もしくはナフチリジニル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
  または1~2個の酸素原子を含む3~6員環の基を表す、
[1]に記載の化合物またはその塩。
[2]
Y is
A phenyl group which may be optionally substituted 0 to 5 as R 3 (however, in the case of R 3 having 2 or more substituents, they are each independently),
A pyridyl group which may be optionally substituted 0 to 4 with R 3 (provided that R 3 s each having 2 or more substituents are independent of each other),
A pyridazinyl group, a pyrimidinyl group or a pyrazinyl group which may be optionally substituted 0 to 3 by R 3 (however, in the case of R 3 having 2 or more substituents, they are each independently),
A triazinyl group which may be optionally substituted 0 to 2 as R 3 (however, in the case of disubstituted R 3, each is independent of each other),
Or a tetrazinyl group which may be optionally substituted by R 3;
Z is
A phenyl group which may be optionally substituted 0 to 5 with R 4 (provided that R 4 has 2 or more substituents, each of which is independently of each other),
A naphthyl group which may be optionally substituted 0 to 7 with R 4 (provided that R 4 has 2 or more substituents, each of which is independently of each other),
A pyridyl group, a pyridazinyl group, a pyrimidinyl group, a pyrazinyl group, a triazinyl group, or a tetrazinyl group (however, in the case of R4 having two or more substituents, they are each independently.
Thienyl group which may be optionally substituted by 0 to 4 R 4, thiazolyl group, isothiazolyl group, thiadiazolyl group, or thiatriazolyl group (However, in the case of R 4 having two or more substituents, they are each independently.),
A pyrrolyl group, a pyrazolyl group, an imidazolyl group, a triazolyl group, a tetrazolyl group, or a pentazolyl group (however, in the case of R4 having two or more substituents, they are each independently independent of each other)
Furyl, oxazolyl, isoxazolyl, oxadiazolyl or oxatriazolyl (which may be independently substituted in the case of R4 having 2 or more substituents) which may be optionally substituted by 0 to 3 R 4;
Indolyl, isoindolyl, indazolyl, benzimidazolyl, or benzotriazolyl groups which may be optionally substituted 0 to 6 by R 4 (however, in the case of R 4 having 2 or more substituents, they are each independently),
Benzofuryl group, isobenzofuryl group, benzoxazolyl group, benzoisoxazolyl group, or benzooxadiazolyl group (however, in the case of R4 having two or more substituents, each of which may be optionally substituted 0 to 5 with R 4 be independent.),
A benzothienyl group, a benzothiazolyl group, a benzoisothiazolyl group, or a benzothiadiazolyl group (however, in the case of R4 having 2 or more substituents, they are each independently independent) which may be optionally substituted 0 to 5 with R 4;
Indolizinyl group which may be optionally substituted 0 to 6 by R 4, imidazopyridyl group, pyrazolo pyridyl group, or triazolo pyridyl group (However, in the case of R 4 having 2 or more substituents, they are each independently.),
A pyrrolopyrimidinyl group which may be optionally substituted by 0 to 4 R 4, imidazopyrimidinyl group, pyrazolopyrimidinyl group, triazolopyrimidinyl group, pyrrolopyrazinyl group, imidazopyrazinyl group, pyrazolopyrazinyl group, or triazolopyrazinyl group Group (but in the case of R 4 with 2 or more substituents, each is independent),
A quinolyl group, an isoquinolyl group, a cinolyl group, a phthalazinyl group, a quinoxalinyl group, a quinazolinyl group, or a naphthyridinyl group which may be optionally substituted 0 to 6 with R 4 (however, in the case of R4 having 2 or more substituents, they are each independently). ,
Or a 3- to 6-membered ring group containing 1 to 2 oxygen atoms,
The compound or its salt as described in [1].
[3]
 R1は、
  置換基Aで適宜置換されてもよいC1~C6のアルキル基、
  C1~C6のハロアルキル基、
  置換基Aで適宜置換されてもよいC2~C6のアルケニル基、
  C2~C6のハロアルケニル基、
  置換基Aで適宜置換されてもよいC2~C6のアルキニル基、
  またはC2~C6のハロアルキニル基を表し;
 R2は、
  水素原子、
  ハロゲン原子、
  置換基Aで適宜置換されてもよいC1~C6のアルキル基、
  C1~C6のハロアルキル基、
  置換基Aで適宜置換されてもよいC1~C6のアルコキシ基、
  C1~C6のハロアルコキシ基、
  Rc-L-(ここで、Rcは、C1~C6のアルキル基またはC1~C6のハロアルキル基を表し、Lは、S、SO、またはSO2を表す。)、
  またはRdC(=O)-(ここで、Rdは、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表す。)を表し;
 Yは、
  R3で適宜0~5置換されてもよいフェニル基(ただし、2置換以上のR3の場合、それぞれ独立している。)、
  またはR3で適宜0~4置換されてもよいピリジル基(ただし、2置換以上のR3の場合、それぞれ独立している)を表し;
 R3は、
  水酸基、
  シアノ基、
  ハロゲン原子、
  置換基Cで適宜置換されてもよいC1~C6のアルキル基、
  C1~C6のハロアルキル基、
  置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、
  C1~C6のハロアルコキシ基、
  置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、
  C2~C6のハロアルケニルオキシ基、
  置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、
  C3~C6のハロアルキニルオキシ基、
  またはRx1C(=O)O-(ここで、Rx1は、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはRaRbN-(ここで、RaおよびRbは、それぞれ独立していて、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表すか、あるいはRaおよびRbは、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。)を表す。)を表し;
 Zは、
  R4で適宜0~5置換されてもよいフェニル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
  R4で適宜0~4置換されてもよいピリジル基、ピリダジニル基、ピリミジニル基、ピラジニル基、トリアジニル基、もしくはテトラジニル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
  R4で適宜0~3置換されてもよいチエニル基、チアゾリル基、イソチアゾリル基、チアジアゾリル基、もしくはチアトリアゾリル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
  R4で適宜0~4置換されてもよいピロリル基、ピラゾリル基、イミダゾリル基、トリアゾリル基、テトラゾリル基、もしくはペンタゾリル基、(ただし、2置換以上のR4の場合、それぞれ独立している。)、
  またはR4で適宜0~3置換されてもよいフリル基、オキサゾリル基、イソキサゾリル基、オキサジアゾリル基、もしくはオキサトリアゾリル基(ただし、2置換以上のR4の場合、それぞれ独立している。)を表し;
 R4は、
  水酸基、
  ハロゲン原子、
  置換基Cで適宜置換されてもよいC1~C6のアルキル基、
  C1~C6のハロアルキル基、
  置換基Cで適宜置換されてもよいC2~C6のアルケニル基、
  C2~C6のハロアルケニル基、
  置換基Cで適宜置換されてもよいC2~C6のアルキニル基、
  C2~C6のハロアルキニル基、
  置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、
  C1~C6のハロアルコキシ基、
  置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、
  C2~C6のハロアルケニルオキシ基、
  置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、
  C3~C6のハロアルキニルオキシ基、
  Rc-L-(ここで、RcおよびLは、前記と同義である。)、
  Rx1C(=O)-(ここで、Rx1は、前記と同義である。)、
  またはRx1C(=O)O-(ここで、Rx1は、前記と同義である。)を表し;
 R5は、
  水酸基、
  ハロゲン原子、
  置換基Cで適宜置換されてもよいC1~C6のアルキル基、
  C1~C6のハロアルキル基、
  置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、
  C1~C6のハロアルコキシ基、
  置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、
  C2~C6のハロアルケニルオキシ基、
  置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、
  C3~C6のハロアルキニルオキシ基、
  またはRx1C(=O)O-(ここで、Rx1は、前記と同義である。)を表す、
[2]に記載の化合物またはその塩。
[3]
R1 is
A C1 to C6 alkyl group optionally substituted with a substituent A,
C1 to C6 haloalkyl group,
A C2-C6 alkenyl group which may be optionally substituted by a substituent A,
A C 2 -C 6 haloalkenyl group,
A C2 to C6 alkynyl group which may be optionally substituted by a substituent A,
Or C2 to C6 haloalkynyl group;
R2 is
Hydrogen atom,
Halogen atom,
A C1 to C6 alkyl group optionally substituted with a substituent A,
C1 to C6 haloalkyl group,
A C1 to C6 alkoxy group which may be optionally substituted by a substituent A,
A C1 to C6 haloalkoxy group,
Rc-L- (wherein Rc represents a C1-C6 alkyl group or a C1-C6 haloalkyl group, and L represents S, SO or SO2),
Or RdC (= O) — (wherein, Rd represents a C1 to C6 alkyl group, a C1 to C6 haloalkyl group, or a C3 to C8 cycloalkyl group which may be optionally substituted with a substituent B). Represents
Y is
A phenyl group which may be optionally substituted 0 to 5 as R 3 (however, in the case of R 3 having 2 or more substituents, they are each independently),
Or a pyridyl group which may be optionally substituted 0 to 4 with R 3 (provided that R 3 s each having 2 or more substituents are independently of each other);
R3 is
Hydroxyl group,
Cyano group,
Halogen atom,
A C1 to C6 alkyl group which may be optionally substituted by a substituent C,
C1 to C6 haloalkyl group,
A C1 to C6 alkoxy group which may be optionally substituted by a substituent C,
A C1 to C6 haloalkoxy group,
A C2-C6 alkenyloxy group which may be optionally substituted by a substituent C,
C2-C6 haloalkenyloxy group,
A C3-C6 alkynyloxy group which may be optionally substituted by a substituent C,
A C3-C6 haloalkynyloxy group,
Or Rx1C (= O) O— (wherein, Rx1 is a C1-C6 alkyl group optionally substituted with a substituent B, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, C1-C6 Or an alkoxy group of C1 to C6, a haloalkoxy group of C1 to C6, a cycloalkoxy group of C3 to C8, or RaRbN- (wherein Ra and Rb are each independently, and optionally substituted by a hydrogen atom or a substituent B Represents a good C1 to C6 alkyl group, a C1 to C6 haloalkyl group, or a C3 to C8 cycloalkyl group, or Ra and Rb together with the nitrogen atom to which it is attached is an aziridinyl group, azetidinyl group, pyrrolidinyl group A group, piperidinyl group, homopiperidinyl group, or those forming an azocanyl group).
Z is
A phenyl group which may be optionally substituted 0 to 5 with R 4 (provided that R 4 has 2 or more substituents, each of which is independently of each other),
A pyridyl group, a pyridazinyl group, a pyrimidinyl group, a pyrazinyl group, a triazinyl group, or a tetrazinyl group (however, in the case of R4 having two or more substituents, they are each independently.
Thienyl group which may be optionally substituted by 0 to 4 R 4, thiazolyl group, isothiazolyl group, thiadiazolyl group, or thiatriazolyl group (However, in the case of R 4 having two or more substituents, they are each independently.),
A pyrrolyl group, a pyrazolyl group, an imidazolyl group, a triazolyl group, a tetrazolyl group, or a pentazolyl group which may be optionally substituted 0 to 4 by R 4 (however, in the case of R 4 having two or more substituents, they are each independently).
Or R4 represents a furyl group which may be optionally substituted by 0 to 3, an oxazolyl group, an isoxazolyl group, an oxadiazolyl group, or an oxatriazolyl group (provided that they are each independently in the case of R4 having 2 or more substituents). ;
R4 is
Hydroxyl group,
Halogen atom,
A C1 to C6 alkyl group which may be optionally substituted by a substituent C,
C1 to C6 haloalkyl group,
A C2-C6 alkenyl group which may be optionally substituted by a substituent C,
A C 2 -C 6 haloalkenyl group,
A C2 to C6 alkynyl group which may be optionally substituted by a substituent C,
A C2 to C6 haloalkynyl group,
A C1 to C6 alkoxy group which may be optionally substituted by a substituent C,
A C1 to C6 haloalkoxy group,
A C2-C6 alkenyloxy group which may be optionally substituted by a substituent C,
C2-C6 haloalkenyloxy group,
A C3-C6 alkynyloxy group which may be optionally substituted by a substituent C,
A C3-C6 haloalkynyloxy group,
Rc-L- (wherein Rc and L are as defined above),
Rx1C (= O)-(where Rx1 is the same as the above),
Or Rx1C (= O) O— (wherein, Rx1 is as defined above);
R5 is
Hydroxyl group,
Halogen atom,
A C1 to C6 alkyl group which may be optionally substituted by a substituent C,
C1 to C6 haloalkyl group,
A C1 to C6 alkoxy group which may be optionally substituted by a substituent C,
A C1 to C6 haloalkoxy group,
A C2-C6 alkenyloxy group which may be optionally substituted by a substituent C,
C2-C6 haloalkenyloxy group,
A C3-C6 alkynyloxy group which may be optionally substituted by a substituent C,
A C3-C6 haloalkynyloxy group,
Or Rx1C (= O) O— (wherein, Rx1 is as defined above),
The compound or its salt as described in [2].
[4]
 R1は、
  置換基Aで適宜置換されてもよいC1~C6のアルキル基、
  またはC1~C6のハロアルキル基を表し;
 R2は、
  水素原子、
  ハロゲン原子、
  置換基Aで適宜置換されてもよいC1~C6のアルキル基、
  または置換基Aで適宜置換されてもよいC1~C6のアルコキシ基を表し;
 Yは、
  R3で適宜0~5置換されてもよいフェニル基(ただし、2置換以上のR3の場合、それぞれ独立している。)を表し;
 R3は、
  水酸基、
  シアノ基、
  ハロゲン原子、
  置換基Cで適宜置換されてもよいC1~C6のアルキル基、
  置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、
  置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、
  置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、
  またはRx1C(=O)O-(ここで、Rx1は、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはRaRbN-(ここで、RaおよびRbは、それぞれ独立していて、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表すか、あるいはRaおよびRbは、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。)を表す。)を表し;
 Zは、
  R4で適宜0~5置換されてもよいフェニル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
  R4で適宜0~4置換されてもよいピラゾリル基、イミダゾリル基、もしくはトリアゾリル基(ただし、2置換以上のR4の場合、それぞれ独立している。)
  またはR4で適宜0~3置換されてもよいオキサゾリル基、もしくはイソキサゾリル基(ただし、2置換以上のR4の場合、それぞれ独立している。)を表し;
 R4は、
  ハロゲン原子、
  置換基Cで適宜置換されてもよいC1~C6のアルキル基、
  または置換基Cで適宜置換されてもよいC1~C6のアルコキシ基を表し;
 Wは、
  R5で適宜0~2置換されてもよいメチレン基、またはエチレン基(ただし、2置換のR5の場合、それぞれ独立している。)を表し;
 R5は、
  水酸基、
  ハロゲン原子、
  または置換基Cで適宜置換されてもよいC1~C6のアルコキシ基を表す、
[3]に記載の化合物、またはその塩。
[4]
R1 is
A C1 to C6 alkyl group optionally substituted with a substituent A,
Or a C1 to C6 haloalkyl group;
R2 is
Hydrogen atom,
Halogen atom,
A C1 to C6 alkyl group optionally substituted with a substituent A,
Or a C1-C6 alkoxy group optionally substituted by a substituent A;
Y is
Represents a phenyl group which may be optionally substituted 0 to 5 with R 3 (provided that R 3 is 2 or more, each of which is independently of each other);
R3 is
Hydroxyl group,
Cyano group,
Halogen atom,
A C1 to C6 alkyl group which may be optionally substituted by a substituent C,
A C1 to C6 alkoxy group which may be optionally substituted by a substituent C,
A C2-C6 alkenyloxy group which may be optionally substituted by a substituent C,
A C3-C6 alkynyloxy group which may be optionally substituted by a substituent C,
Or Rx1C (= O) O— (wherein, Rx1 is a C1-C6 alkyl group optionally substituted with a substituent B, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, C1-C6 Or an alkoxy group of C1 to C6, a haloalkoxy group of C1 to C6, a cycloalkoxy group of C3 to C8, or RaRbN- (wherein Ra and Rb are each independently, and optionally substituted by a hydrogen atom or a substituent B Represents a good C1 to C6 alkyl group, a C1 to C6 haloalkyl group, or a C3 to C8 cycloalkyl group, or Ra and Rb together with the nitrogen atom to which it is attached is an aziridinyl group, azetidinyl group, pyrrolidinyl group A group, piperidinyl group, homopiperidinyl group, or those forming an azocanyl group).
Z is
A phenyl group which may be optionally substituted 0 to 5 with R 4 (provided that R 4 has 2 or more substituents, each of which is independently of each other),
A pyrazolyl group, an imidazolyl group, or a triazolyl group which may be optionally substituted 0 to 4 with R 4 (however, in the case of R 4 having 2 or more substituents, they are each independently).
Or an oxazolyl group which may be optionally substituted 0 to 3 with R 4, or an isoxazolyl group (provided that R 4 s each having 2 or more substituents each are independently of each other);
R4 is
Halogen atom,
A C1 to C6 alkyl group which may be optionally substituted by a substituent C,
Or a C1 to C6 alkoxy group optionally substituted by a substituent C;
W is
A methylene group which may be optionally substituted by 0 to 2 as R 5, or an ethylene group (provided that they are each independently in the case of R 5 as di-substituted);
R5 is
Hydroxyl group,
Halogen atom,
Or a C1 to C6 alkoxy group optionally substituted by a substituent C,
The compound as described in [3], or a salt thereof.
[5]
 [1]に記載の化合物、またはその塩を有効成分として含有する農園芸用有害生物防除剤。
[5]
An agricultural and horticultural pest control agent comprising the compound according to [1] or a salt thereof as an active ingredient.
[6]
 [1]に記載の化合物、またはその塩を有効成分として含有する農園芸用殺菌剤。
[6]
An agricultural and horticultural fungicide containing the compound according to [1] or a salt thereof as an active ingredient.
[7]
 [5]に記載の農園芸用有害生物防除剤を、植物、植物の種子、または植物を栽培する土壌に施用することを含む、植物病害を防除する方法。
[7]
A method for controlling plant diseases, which comprises applying the agricultural and horticultural pest control agent described in [5] to plants, plant seeds, or soil where plants are grown.
[8]
 [6]に記載の農園芸用殺菌剤を、植物、植物の種子、または植物を栽培する土壌に施用することを含む、植物病害を防除する方法。
[8]
A method for controlling plant diseases, which comprises applying the agricultural and horticultural fungicides described in [6] to plants, plant seeds, or soil where plants are grown.
 本発明によれば、農園芸用殺菌剤として有効である新規な化合物を提供することができる。 According to the present invention, a novel compound which is effective as an agricultural and horticultural fungicide can be provided.
 以下、本発明を実施するための最良の形態について詳細に説明する。 Hereinafter, the best mode for carrying out the present invention will be described in detail.
 なお、請求の範囲および明細書中において用いられる各用語は、特に断らない限り、当該技術分野において一般的に用いられる定義によるものとする。 Unless otherwise stated, each term used in the claims and the specification is according to the definition generally used in the relevant technical field.
 本明細書において、使用する略号を以下に説明する。
DMF:N,N-ジメチルホルムアミド、THF:テトラヒドロフラン、Me:メチル基、Et:エチル基、Pr:プロピル基、Ph:フェニル基、c:シクロ、i:イソ、sec:セカンダリ、t:ターシャリ、=:二重結合、≡:三重結合を表す。表のカラム中、Prに関しては、接頭辞がない場合は、ノルマルを意味する。
Abbreviations used herein are described below.
DMF: N, N- dimethylformamide, THF: tetrahydrofuran, Me: methyl group, Et: ethyl group, Pr: propyl group, Ph: phenyl group, c: cyclo, i: iso, sec: secondary, t: tertiary, = : A double bond, ≡: represents a triple bond. In the columns of the table, for Pr, when there is no prefix, it means normal.
 以下に、本明細書中に使用される用語の定義を説明する。
 Cx~Cyとの記載は、x個からy個の炭素原子を有することを表す。
The definitions of the terms used in the present specification are described below.
The description Cx to Cy represents having x to y carbon atoms.
 用語「適宜置換されてもよい」とは、置換または無置換であることを意味する。この用語を用いる際、置換基の数が明示されていないときは、置換基の数は1であることを表す。 The term "optionally substituted" means substituted or unsubstituted. When this term is used, when the number of substituents is not specified, the number of substituents is 1.
 C1~C6のアルキル基とは、直鎖状または分岐状でよく、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、sec-ブチル基、t-ブチル基、ペンチル基、イソペンチル基、1-メチルブチル基、2-メチルブチル基、ネオペンチル基、1-エチルプロピル基、1,2-ジメチルプロピル基、ヘキシル基、4-メチルペンチル基、3-メチルペンチル基、2-メチルペンチル基、1-メチルペンチル基、3,3-ジメチルブチル基、2,2-ジメチルブチル基、1,1-ジメチルブチル基、1,2-ジメチルブチル基、1,3-ジメチルブチル基、2,3-ジメチルブチル基、2-エチルブチル基、1-イソプロピルプロピル基、1,1,2-トリメチルプロピル基、1,2,2-トリメチルプロピル基等が挙げられる。 The C1 to C6 alkyl group may be linear or branched and may be methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, t-butyl, pentyl, isopentyl Group, 1-methylbutyl group, 2-methylbutyl group, neopentyl group, 1-ethylpropyl group, 1,2-dimethylpropyl group, hexyl group, 4-methylpentyl group, 3-methylpentyl group, 2-methylpentyl group, 1-methylpentyl group, 3,3-dimethylbutyl group, 2,2-dimethylbutyl group, 1,1-dimethylbutyl group, 1,2-dimethylbutyl group, 1,3-dimethylbutyl group, 2,3- Dimethylbutyl, 2-ethylbutyl, 1-isopropylpropyl, 1,1,2-trimethylpropyl, 1,2,2-trimethylpropyl, etc. And the like.
 ハロゲン原子とは、フッ素原子、塩素原子、臭素原子、ヨウ素原子等が挙げられる。
 C1~C6のハロアルキル基とは、前記のC1~C6のアルキル基における水素原子が1個または2個以上のハロゲン原子によって任意に置換されたものを表す。2個以上のハロゲン原子で置換される場合、それらのハロゲン原子は同一または異なっていてよく、その置換数は置換基として存在することができる限り特に制限はない。C1~C6のハロアルキル基の具体例として、モノフルオロメチル基、ジフルオロメチル基、トリフルオロメチル基、モノクロロメチル基、モノブロモメチル基、モノヨードメチル基、クロロジフルオロメチル基、ブロモジフルオロメチル基、1-フルオロエチル基、2-フルオロエチル基、1,1-ジフルオロエチル基、2,2-ジフルオロエチル基、2,2,2-トリフルオロエチル基、1,1,2,2-テトラフルオロエチル基、ペンタフルオロエチル基、2,2,2-トリクロロエチル基、3,3-ジフルオロプロピル基、3,3,3-トリフルオロプロピル基、ヘプタフルオロプロピル基、ヘプタフルオロイソプロピル基、2,2,2-トリフルオロ-1-(トリフルオロメチル)エチル基、ノナフルオロブチル基、ノナフルオロ-sec-ブチル基、3,3,4,4,5,5,5-ヘプタフルオロペンチル基、ウンデカフルオロペンチル基、トリデカフルオロヘキシル基等が挙げられる。
The halogen atom includes a fluorine atom, a chlorine atom, a bromine atom, an iodine atom and the like.
The C1 to C6 haloalkyl group means one in which a hydrogen atom in the above C1 to C6 alkyl group is optionally substituted by one or two or more halogen atoms. When substituted by two or more halogen atoms, those halogen atoms may be the same or different, and the number of substitution thereof is not particularly limited as long as it can be present as a substituent. As specific examples of C1 to C6 haloalkyl groups, monofluoromethyl group, difluoromethyl group, trifluoromethyl group, monochloromethyl group, monobromomethyl group, monoiodomethyl group, chlorodifluoromethyl group, bromodifluoromethyl group, 1 -Fluoroethyl group, 2-fluoroethyl group, 1,1-difluoroethyl group, 2,2-difluoroethyl group, 2,2,2-trifluoroethyl group, 1,1,2,2-tetrafluoroethyl group , Pentafluoroethyl group, 2,2,2-trichloroethyl group, 3,3-difluoropropyl group, 3,3,3-trifluoropropyl group, heptafluoropropyl group, heptafluoroisopropyl group, 2,2,2 -Trifluoro-1- (trifluoromethyl) ethyl group, nonafluorobutyl group, nonafluoro sec- butyl group, 3,3,4,4,5,5,5-heptafluoro-pentyl group, undecyl decafluoropentyl, tridecafluorohexyl group, and the like.
 C3~C8のシクロアルキル基とは、シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基、シクロヘプチル基、シクロオクチル基等が挙げられる。 Examples of the C3 to C8 cycloalkyl group include cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, cycloheptyl group and cyclooctyl group.
 C2~C6のアルケニル基とは、1個または2個以上の二重結合を有し、直鎖状または分岐状である不飽和炭化水素基のものを表す。また、幾何異性体がある場合、E体またはZ体のどちらか一方のみ、あるいはE体とZ体との任意の割合の混合物であり、指定される炭素数の範囲であれば、特に限定されることはない。C2~C6のアルケニル基の具体例として、ビニル基、1-プロペニル基、アリル基、1-ブテニル基、2-ブテニル基、3-ブテニル基、2-メチル-1-プロペニル基、1-ペンテニル基、2-ペンテニル基、3-ペンテニル基、4-ペンテニル基、2-メチル-1-ブテニル基、3-メチル-2-ブテニル基、1-ヘキセニル基、2-ヘキセニル基、3-ヘキセニル基、4-ヘキセニル基、5-ヘキセニル基、4-メチル-3-ペンテニル基、3-メチル-2-ペンテニル基等が挙げられる。 The C2-C6 alkenyl group represents an unsaturated hydrocarbon group which has one or more double bonds and is linear or branched. In addition, when there is a geometric isomer, it is particularly limited as long as it is a range of the designated carbon number only in either one of E form or Z form or a mixture of any ratio of E form and Z form. There is nothing to do. Specific examples of C2-C6 alkenyl groups include vinyl, 1-propenyl, allyl, 1-butenyl, 2-butenyl, 3-butenyl, 2-methyl-1-propenyl, 1-pentenyl , 2-pentenyl group, 3-pentenyl group, 4-pentenyl group, 2-methyl-1-butenyl group, 3-methyl-2-butenyl group, 1-hexenyl group, 2-hexenyl group, 3-hexenyl group, 4 And -hexenyl group, 5-hexenyl group, 4-methyl-3-pentenyl group, 3-methyl-2-pentenyl group and the like.
 C2~C6のハロアルケニル基とは、前記のC2~C6のアルケニル基における水素原子が1個または2個以上のハロゲン原子によって任意に置換されたものを表す。2個以上のハロゲン原子で置換される場合、それらのハロゲン原子は同一または異なっていてよく、その置換数は置換基として存在することができる限り特に制限はない。C2~C6のハロアルケニル基の具体例として、2-フルオロビニル基、2,2-ジフルオロビニル基、2,2-ジクロロビニル基、3-フルオロアリル基、3,3-ジフルオロアリル基、3,3-ジクロロアリル基、4,4-ジフルオロ-3-ブテニル基、5,5-ジフルオロ-4-ペンテニル基、6,6-ジフルオロ-5-ヘキセニル基等が挙げられる。 The C2 to C6 haloalkenyl group means one in which a hydrogen atom in the above C2 to C6 alkenyl group is optionally substituted by one or two or more halogen atoms. When substituted by two or more halogen atoms, those halogen atoms may be the same or different, and the number of substitution thereof is not particularly limited as long as it can be present as a substituent. Specific examples of C2 to C6 haloalkenyl groups include 2-fluorovinyl group, 2,2-difluorovinyl group, 2,2-dichlorovinyl group, 3-fluoroallyl group, 3,3-difluoroallyl group, 3, Examples thereof include 3-dichloroallyl group, 4,4-difluoro-3-butenyl group, 5,5-difluoro-4-pentenyl group, 6,6-difluoro-5-hexenyl group and the like.
 C2~C6のアルキニル基とは、1個または2個以上の三重結合を有し、直鎖状または分岐状である不飽和炭化水素基のものを表す。C2~C6のアルキニル基の具体例として、エチニル基、1-プロピニル基、プロパルギル基、1-ブチニル基、2-ブチニル基、3-ブチニル基、1-ペンチニル基、2-ペンチニル基、3-ペンチニル基、4-ペンチニル基、1,1-ジメチル-2-プロピニル基、1-ヘキシニル基、2-ヘキシニル基、3-ヘキシニル基、4-ヘキシニル基、5-ヘキシニル基等が挙げられる。 The C2-C6 alkynyl group means an unsaturated hydrocarbon group which has one or more triple bonds and is linear or branched. Specific examples of the C2-C6 alkynyl group include ethynyl group, 1-propynyl group, propargyl group, 1-butynyl group, 2-butynyl group, 3-butynyl group, 3-butynyl group, 1-pentynyl group, 2-pentynyl group, 3-pentynyl group , 4-pentynyl group, 1,1-dimethyl-2-propynyl group, 1-hexynyl group, 2-hexynyl group, 3-hexynyl group, 4-hexynyl group, 5-hexynyl group and the like.
 C2~C6のハロアルキニル基とは、前記のC2~C6のアルキニル基における水素原子が1個または2個以上のハロゲン原子によって任意に置換されたものを表す。2個以上のハロゲン原子で置換される場合、それらのハロゲン原子は同一または異なっていてよく、その置換数は置換基として存在することができる限り特に制限はない。C2~C6のハロアルキニル基の具体例として、2-フルオロエチニル基、2-クロロエチニル基、2-ブロモエチニル基、2-ヨードエチニル基、3,3-ジフルオロ-1-プロピニル基、3-クロロ-3,3-ジフルオロ-1-プロピニル基、3-ブロモ-3,3-ジフルオロ-1-プロピニル基、3,3,3-トリフルオロ-1-プロピニル基、4,4-ジフルオロ-1-ブチニル基、4,4-ジフルオロ-2-ブチニル基、4-クロロ-4,4-ジフルオロ-1-ブチニル基、4-クロロ-4,4-ジフルオロ-2-ブチニル基、4-ブロモ-4,4-ジフルオロ-1-ブチニル基、4-ブロモ-4,4-ジフルオロ-2-ブチニル基、4,4,4-トリフルオロ-1-ブチニル基、4,4,4-トリフルオロ-2-ブチニル基、5,5-ジフルオロ-3-ペンチニル基、5-クロロ-5,5-ジフルオロ-3-ペンチニル基、5-ブロモ-5,5-ジフルオロ-3-ペンチニル基、5,5,5-トリフルオロ-3-ペンチニル基、6,6-ジフルオロ-4-ヘキシニル基、6-クロロ-6,6-ジフルオロ-4-ヘキシニル基、6-ブロモ-6,6-ジフルオロ-4-ヘキシニル基、6,6,6-トリフルオロ-4-ヘキシニル基等が挙げられる。 The C2 to C6 haloalkynyl group means one in which a hydrogen atom in the above C2 to C6 alkynyl group is optionally substituted by one or two or more halogen atoms. When substituted by two or more halogen atoms, those halogen atoms may be the same or different, and the number of substitution thereof is not particularly limited as long as it can be present as a substituent. Specific examples of C2 to C6 haloalkynyl groups are 2-fluoroethynyl group, 2-chloroethynyl group, 2-bromoethynyl group, 2-iodoethynyl group, 3,3-difluoro-1-propynyl group, 3-chloro -3,3-Difluoro-1-propynyl group, 3-bromo-3,3-difluoro-1-propynyl group, 3,3,3-trifluoro-1-propynyl group, 4,4-difluoro-1-butynyl group Group, 4,4-difluoro-2-butynyl group, 4-chloro-4,4-difluoro-1-butynyl group, 4-chloro-4,4-difluoro-2-butynyl group, 4-bromo-4,4 -Difluoro-1-butynyl group, 4-bromo-4,4-difluoro-2-butynyl group, 4,4,4-trifluoro-1-butynyl group, 4,4,4-trifluoro-2-butynyl group , 5 5-difluoro-3-pentynyl group, 5-chloro-5,5-difluoro-3-pentynyl group, 5-bromo-5,5-difluoro-3-pentynyl group, 5,5,5-trifluoro-3- Pentynyl group, 6,6-difluoro-4-hexynyl group, 6-chloro-6,6-difluoro-4-hexynyl group, 6-bromo-6,6-difluoro-4-hexynyl group, 6,6,6- The trifluoro-4-hexynyl group etc. are mentioned.
 C1~C6のアルコキシ基とは、前記のC1~C6のアルキル基が酸素原子を介して結合したものを表す。C1~C6のアルコキシ基として、具体的には、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、イソブトキシ基、sec-ブトキシ基、t-ブトキシ基、ペンチルオキシ基、イソペンチルオキシ基、2-メチルブトキシ基、ネオペンチルオキシ基、1-エチルプロピルオキシ基、ヘキシルオキシ基、4-メチルペンチルオキシ基、3-メチルペンチルオキシ基、2-メチルペンチルオキシ基、1-メチルペンチルオキシ基、3,3-ジメチルブトキシ基、2,2-ジメチルブトキシ基、1,1-ジメチルブトキシ基、1,2-ジメチルブトキシ基、1,3-ジメチルブトキシ基、2,3-ジメチルブトキシ基、2-エチルブトキシ基等が挙げられる。 The C1 to C6 alkoxy group represents one in which the above C1 to C6 alkyl group is bonded via an oxygen atom. Specific examples of the C1 to C6 alkoxy group include a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group, a butoxy group, an isobutoxy group, a sec-butoxy group, a t-butoxy group, a pentyloxy group and an isopentyloxy group. Group, 2-methylbutoxy group, neopentyloxy group, 1-ethylpropyloxy group, hexyloxy group, 4-methylpentyloxy group, 3-methylpentyloxy group, 2-methylpentyloxy group, 1-methylpentyloxy group , 3,3-dimethylbutoxy, 2,2-dimethylbutoxy, 1,1-dimethylbutoxy, 1,2-dimethylbutoxy, 1,3-dimethylbutoxy, 2,3-dimethylbutoxy, 2-ethyl butoxy and the like.
 C1~C6のハロアルコキシ基とは、前記のC1~C6のアルコキシ基における水素原子が1個または2個以上のハロゲン原子によって任意に置換されたものを表す。2個以上のハロゲン原子で置換される場合、それらのハロゲン原子は同一または異なっていてよく、その置換数は置換基として存在することができる限り特に制限はない。C1~C6のハロアルコキシ基の具体例として、ジフルオロメトキシ基、トリフルオロメトキシ基、クロロジフルオロメトキシ基、ブロモジフルオロメトキシ基、2-フルオロエトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、1,1,2,2-テトラフルオロエトキシ基、ペンタフルオロエトキシ基、2,2,2-トリクロロエトキシ基、3,3-ジフルオロプロピルオキシ基、3,3,3-トリフルオロプロピルオキシ基、ヘプタフルオロプロピルオキシ基、ヘプタフルオロイソプロピルオキシ基、2,2,2-トリフルオロ-1-(トリフルオロメチル)-エトキシ基、ノナフルオロブトキシ基、ノナフルオロ-sec-ブトキシ基、3,3,4,4,5,5,5-ヘプタフルオロペンチルオキシ基、ウンデカフルオロペンチルオキシ基、トリデカフルオロヘキシルオキシ基等が挙げられる。 The C1 to C6 haloalkoxy group means one in which a hydrogen atom in the above C1 to C6 alkoxy group is optionally substituted by one or two or more halogen atoms. When substituted by two or more halogen atoms, those halogen atoms may be the same or different, and the number of substitution thereof is not particularly limited as long as it can be present as a substituent. Specific examples of C1 to C6 haloalkoxy groups include difluoromethoxy, trifluoromethoxy, chlorodifluoromethoxy, bromodifluoromethoxy, 2-fluoroethoxy, 2,2-difluoroethoxy, 2,2,2 -Trifluoroethoxy group, 1,1,2,2-tetrafluoroethoxy group, pentafluoroethoxy group, 2,2,2-trichloroethoxy group, 3,3-difluoropropyloxy group, 3,3,3-tributyl group Fluoropropyloxy group, heptafluoropropyloxy group, heptafluoroisopropyloxy group, 2,2,2-trifluoro-1- (trifluoromethyl) -ethoxy group, nonafluorobutoxy group, nonafluoro-sec-butoxy group, 3 3,4,4,5,5,5-heptafluoropentyloxy group Undecafluoro pentyloxy group, tridecafluorohexyl group, and the like.
 C3~C8のシクロアルコキシ基とは、前記のC3~C8のシクロアルキル基が酸素原子を介して結合したものを表す。C3~C8のシクロアルコキシ基として、具体的には、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、シクロヘキシルオキシ基、シクロヘプチルオキシ基、シクロオクチルオキシ基等が挙げられる。 The C3 to C8 cycloalkoxy group means that the above C3 to C8 cycloalkyl group is bonded via an oxygen atom. Specific examples of the C3 to C8 cycloalkoxy group include cyclopropyloxy group, cyclobutoxy group, cyclopentyloxy group, cyclohexyloxy group, cycloheptyloxy group, cyclooctyloxy group and the like.
 C2~C6のアルケニルオキシ基とは、前記のC2~C6のアルケニル基が酸素原子を介して結合したものを表す。また、幾何異性体がある場合、E体またはZ体のどちらか一方のみ、あるいはE体とZ体との任意の割合の混合物であり、指定される炭素数の範囲であれば、特に制限されることはない。C2~C6のアルケニルオキシ基の具体例として、ビニルオキシ基、1-プロペニルオキシ基、アリルオキシ基、1-ブテニルオキシ基、2-ブテニルオキシ基、3-ブテニルオキシ基、2-メチル-1-プロペニルオキシ基、1-ペンテニルオキシ基、2-ペンテニルオキシ基、3-ペンテニルオキシ基、4-ペンテニルオキシ基、2-メチル-1-ブテニルオキシ基、3-メチル-2-ブテニルオキシ基、1-ヘキセニルオキシ基、2-ヘキセニルオキシ基、3-ヘキセニルオキシ基、4-ヘキセニルオキシ基、5-ヘキセニルオキシ基、4-メチル-3-ペンテニルオキシ基、3-メチル-2-ペンテニルオキシ基等が挙げられる。 The C 2 -C 6 alkenyloxy group represents one in which the above C 2 -C 6 alkenyl group is bonded via an oxygen atom. In addition, when there is a geometric isomer, it is particularly limited as long as it is a range of the designated carbon number, and it is a mixture of only one of either the E form or the Z form or an arbitrary ratio of the E form and the Z form. There is nothing to do. Specific examples of the C 2 -C 6 alkenyloxy group include vinyloxy group, 1-propenyloxy group, allyloxy group, 1-butenyloxy group, 2-butenyloxy group, 3-butenyloxy group, 2-methyl-1-propenyloxy group, 1 -Pentenyl oxy group, 2-pentenyl oxy group, 3-pentenyl oxy group, 4-pentenyl oxy group, 2-methyl-1-butenyloxy group, 3-methyl-2- butenyloxy group, 1-hexenyl oxy group, 2-hexenyl Examples thereof include an oxy group, a 3-hexenyl oxy group, a 4-hexenyl oxy group, a 5-hexenyl oxy group, a 4-methyl-3-pentenyl oxy group, and a 3-methyl-2-pentenyl oxy group.
 C2~C6のハロアルケニルオキシ基とは、前記のC2~C6のアルケニルオキシ基における水素原子が1個または2個以上のハロゲン原子によって任意に置換されたものを表す。2個以上のハロゲン原子で置換される場合、それらのハロゲン原子は同一または異なっていてよく、その置換数は置換基として存在することができる限り特に制限はない。C2~C6のハロアルケニルオキシ基の具体例として、2-フルオロビニルオキシ基、2,2-ジフルオロビニルオキシ基、2,2-ジクロロビニルオキシ基、3-フルオロアリルオキシ基、3,3-ジフルオロアリルオキシ基、3,3-ジクロロアリルオキシ基、4,4-ジフルオロ-3-ブテニルオキシ基、5,5-ジフルオロ-4-ペンテニルオキシ基、6,6-ジフルオロ-5-ヘキセニルオキシ基等が挙げられる。 The C2 to C6 haloalkenyloxy group means one in which a hydrogen atom in the above C2 to C6 alkenyloxy group is optionally substituted by one or two or more halogen atoms. When substituted by two or more halogen atoms, those halogen atoms may be the same or different, and the number of substitution thereof is not particularly limited as long as it can be present as a substituent. Specific examples of C2 to C6 haloalkenyloxy groups include 2-fluorovinyloxy group, 2,2-difluorovinyloxy group, 2,2-dichlorovinyloxy group, 3-fluoroallyloxy group, 3,3-difluoro Allyloxy, 3,3-dichloroallyloxy, 4,4-difluoro-3-butenyloxy, 5,5-difluoro-4-pentenyloxy, 6,6-difluoro-5-hexenyloxy and the like Be
 C3~C6のアルキニルオキシ基とは、前記のC2~C6のアルキニル基のうち、C3~C6のアルキニル基が酸素原子を介して結合したものを表す。C3~C6のアルキニルオキシ基の具体例として、プロパルギルオキシ基、2-ブチニルオキシ基、3-ブチニルオキシ基、2-ペンチニルオキシ基、3-ペンチニルオキシ基、4-ペンチニルオキシ基、1,1-ジメチル-2-プロピニルオキシ基、2-ヘキシニルオキシ基、3-ヘキシニルオキシ基、4-ヘキシニルオキシ基、5-ヘキシニルオキシ基等が挙げられる。 The C 3 -C 6 alkynyloxy group represents one of the C 2 -C 6 alkynyl groups described above in which a C 3 -C 6 alkynyl group is bonded via an oxygen atom. Specific examples of the C3-C6 alkynyloxy group include propargyloxy group, 2-butynyloxy group, 3-butynyloxy group, 2-pentynyloxy group, 3-pentynyloxy group, 4-pentynyloxy group, 1, 1 And -dimethyl-2-propynyloxy group, 2-hexynyloxy group, 3-hexynyloxy group, 4-hexynyloxy group, 5-hexynyloxy group and the like.
 C3~C6のハロアルキニルオキシ基とは、前記のC3~C6のアルキニルオキシ基における水素原子が1個または2個以上のハロゲン原子によって任意に置換されたものを表す。2個以上のハロゲン原子で置換される場合、それらのハロゲン原子は同一または異なっていてよく、その置換数は置換基として存在することができる限り特に制限はない。C3~C6のハロアルキニルオキシ基の具体例として、1,1-ジフルオロ-2-プロピニルオキシ基、4,4-ジフルオロ-2-ブチニルオキシ基、4-クロロ-4,4-ジフルオロ-2-ブチニルオキシ基、4-ブロモ-4,4-ジフルオロ-2-ブチニルオキシ基、4,4,4-トリフルオロ-2-ブチニルオキシ基、5,5-ジフルオロ-3-ペンチニルオキシ基、5-クロロ-5,5-ジフルオロ-3-ペンチニルオキシ基、5-ブロモ-5,5-ジフルオロ-3-ペンチニルオキシ基、5,5,5-トリフルオロ-3-ペンチニルオキシ基、6,6-ジフルオロ-4-ヘキシニルオキシ基、6-クロロ-6,6-ジフルオロ-4-ヘキシニルオキシ基、6-ブロモ-6,6-ジフルオロ-4-ヘキシニルオキシ基、6,6,6-トリフルオロ-4-ヘキシニルオキシ基等が挙げられる。 The C3 to C6 haloalkynyloxy group means one in which a hydrogen atom in the C3 to C6 alkynyloxy group is optionally substituted by one or two or more halogen atoms. When substituted by two or more halogen atoms, those halogen atoms may be the same or different, and the number of substitution thereof is not particularly limited as long as it can be present as a substituent. Specific examples of the C3 to C6 haloalkynyloxy group include a 1,1-difluoro-2-propynyloxy group, a 4,4-difluoro-2-butynyloxy group, and a 4-chloro-4,4-difluoro-2-butynyloxy group. , 4-bromo-4,4-difluoro-2-butynyloxy group, 4,4,4-trifluoro-2-butynyloxy group, 5,5-difluoro-3-pentynyloxy group, 5-chloro-5,5 -Difluoro-3-pentynyloxy group, 5-bromo-5,5-difluoro-3-pentynyloxy group, 5,5,5-trifluoro-3-pentynyloxy group, 6,6-difluoro-4 -Hexynyloxy group, 6-chloro-6,6-difluoro-4-hexynyloxy group, 6-bromo-6,6-difluoro-4-hexynyloxy group, 6,6,6- Trifluoroacetic 4- hexynyloxy group.
 アリール基とは、水素原子および炭素原子より構成される環状芳香族置換基を表す。アリール基の具体例として、フェニル基、ナフチル基等が挙げられる。 The aryl group represents a cyclic aromatic substituent composed of a hydrogen atom and a carbon atom. A phenyl group, a naphthyl group, etc. are mentioned as a specific example of an aryl group.
 ヘテロアリール基とは、窒素原子、酸素原子および硫黄原子からなる群より選ばれ、少なくとも1つのヘテロ原子を環の構成原子として含む環状芳香族置換基を表す。ヘテロアリール基の具体例として、ピリジル基、ピリダジニル基、ピリミジニル基、ピラジニル基、トリアジニル基、テトラジニル基、チエニル基、チアゾリル基、イソチアゾリル基、チアジアゾリル基、チアトリアゾリル基、ピロリル基、ピラゾリル基、イミダゾリル基、トリアゾリル基、テトラゾリル基、ペンタゾリル基、フリル基、オキサゾリル基、イソキサゾリル基、オキサジアゾリル基、オキサトリアゾリル基、インドリル基、イソインドリル基、インダゾリル基、ベンゾイミダゾリル基、ベンゾトリアゾリル基、ベンゾフリル基、イソベンゾフリル基、ベンゾオキサゾリル基、ベンゾイソキサゾリル基、ベンゾオキサジアゾリル基、ベンゾチエニル基、ベンゾチアゾリル基、ベンゾイソチアゾリル基、ベンゾチアジアゾリル基、インドリジニル基、イミダゾピリジル基、ピラゾロピリジル基、トリアゾロピリジル基、ピロロピリミジニル基、イミダゾピリミジニル基、ピラゾロピリミジニル基、トリアゾロピリミジニル基、ピロロピラジニル基、イミダゾピラジニル基、ピラゾロピラジニル基、トリアゾロピラジニル基、キノリル基、イソキノリル基、シノリル基、フタラジニル基、キノキサリニル基、キナゾリニル基、ナフチリジニル基等が挙げられる。 The heteroaryl group is a cyclic aromatic substituent selected from the group consisting of nitrogen atom, oxygen atom and sulfur atom and containing at least one hetero atom as a constituent atom of the ring. Specific examples of the heteroaryl group are pyridyl group, pyridazinyl group, pyrimidinyl group, pyrazinyl group, triazinyl group, tetrazinyl group, thienyl group, thiazolyl group, isothiazolyl group, thiadiazolyl group, thiatriazolyl group, pyrrolyl group, pyrazolyl group, imidazolyl group, Triazolyl group, tetrazolyl group, pentazolyl group, furyl group, oxazolyl group, isoxazolyl group, oxadiazolyl group, oxatriazolyl group, indolyl group, isoindolyl group, indazolyl group, benzoimidazolyl group, benzotriazolyl group, benzofuryl group, isobenzo Furyl group, benzoxazolyl group, benzoisoxazolyl group, benzooxadiazolyl group, benzothienyl group, benzothiazolyl group, benzoisothiazolyl group, benzothiadiazolyl group, Anddriazolyl group, imidazo pyridyl group, pyrazolo pyridyl group, triazolo pyridyl group, pyrrolo pyrimidinyl group, imidazo pyrimidinyl group, pyrazolo pyrimidinyl group, triazolo pyrimidinyl group, pyrrolo pyrazinyl group, imidazo pyrazinyl group, pyrazolo pyrazinyl group And triazolopyrazinyl group, quinolyl group, isoquinolyl group, cinolyl group, phthalazinyl group, quinoxalinyl group, quinazolinyl group, naphthyridinyl group and the like.
 複素環基とは、窒素原子、酸素原子および硫黄原子からなる群より選ばれ、少なくとも1つのヘテロ原子を環の構成原子として含む環状芳香族置換基および環状脂肪族置換基を表す。該環状芳香族置換基の具体例は、前記のヘテロアリール基に例示したものと同義である。該環状脂肪族置換基の具体例としては、1,2-エポキシエタニル基、オキセタニル基、オキソラニル基、オキサニル基、1,3-ジオキソラニル基、1,3-ジオキサニル基、1,4-ジオキサニル基、チイラニル基、チエタニル基、チオラニル基、チアニル基、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、アゾカニル基、ピペラジニル基、モルホニル基、チオモルホニル基、1,3-オキサチアニル基、1,4-オキサチアニル基等が挙げられる。 The heterocyclic group is a cyclic aromatic substituent or a cyclic aliphatic substituent selected from the group consisting of nitrogen atom, oxygen atom and sulfur atom and containing at least one hetero atom as a constituent atom of the ring. Specific examples of the cyclic aromatic substituent are the same as those exemplified for the above-mentioned heteroaryl group. Specific examples of the cyclic aliphatic substituent include 1,2-epoxyethanyl group, oxetanyl group, oxoranyl group, oxanyl group, 1,3-dioxolanyl group, 1,3-dioxanyl group, 1,4-dioxanyl group , Thiiranyl group, thietanyl group, thioranyl group, thianyl group, aziridinyl group, azetidinyl group, pyrrolidinyl group, piperidinyl group, homopiperidinyl group, azocanyl group, piperazinyl group, morpholinyl group, thiomorpholinyl group, 1,3-oxathianyl group, 1,4 -Oxatianil group etc. are mentioned.
 アリールオキシ基とは、前記のアリール基が酸素原子を介して結合したものを表す。アリールオキシ基の具体例として、フェノキシ基、ナフチルオキシ基等が挙げられる。 The aryloxy group means that the above-mentioned aryl group is bonded via an oxygen atom. A phenoxy group, a naphthyloxy group, etc. are mentioned as a specific example of an aryloxy group.
 ヘテロアリールオキシ基とは、前記のヘテロアリール基が酸素原子を介して結合したものを表す。ヘテロアリールオキシ基の具体例として、ピリジルオキシ基、ピリダジニルオキシ基、ピリミジニルオキシ基、ピラジニルオキシ基、トリアジニルオキシ基、テトラジニルオキシ基、チエニルオキシ基、チアゾリルオキシ基、イソチアゾリルオキシ基、チアジアゾリルオキシ基、チアトリアゾリルオキシ基、ピロリルオキシ基、ピラゾリルオキシ基、イミダゾリルオキシ基、トリアゾリルオキシ基、テトラゾリルオキシ基、ペンタゾリルオキシ基、フリルオキシ基、オキサゾリルオキシ基、イソキサゾリルオキシ基、オキサジアゾリルオキシ基、オキサトリアゾリルオキシ基、インドリルオキシ基、イソインドリルオキシ基、インダゾリルオキシ基、ベンゾイミダゾリルオキシ基、ベンゾトリアゾリルオキシ基、ベンゾフリルオキシ基、イソベンゾフリルオキシ基、ベンゾオキサゾリルオキシ基、ベンゾイソキサゾリルオキシ基、ベンゾオキサジアゾリルオキシ基、ベンゾチエニルオキシ基、ベンゾチアゾリルオキシ基、ベンゾイソチアゾリルオキシ基、ベンゾチアジアゾリルオキシ基、インドリジニルオキシ基、イミダゾピリジルオキシ基、ピラゾロピリジルオキシ基、トリアゾロピリジルオキシ基、ピロロピリミジニルオキシ基、イミダゾピリミジニルオキシ基、ピラゾロピリミジニルオキシ基、トリアゾロピリミジニルオキシ基、ピロロピラジニルオキシ基、イミダゾピラジニルオキシ基、ピラゾロピラジニルオキシ基、トリアゾロピラジニルオキシ基、キノリルオキシ基、イソキノリルオキシ基、シノリルオキシ基、フタラジニルオキシ基、キノキサリニルオキシ基、キナゾリニルオキシ基、ナフチリジニルオキシ基等が挙げられる。 The heteroaryloxy group means that the above-mentioned heteroaryl group is bonded via an oxygen atom. Specific examples of the heteroaryloxy group include pyridyloxy group, pyridazinyloxy group, pyrimidinyloxy group, pyrazinyloxy group, triazinyloxy group, tetradinyloxy group, thienyloxy group, thiazolyloxy group, isothiazolyloxy Group, thiadiazolyloxy group, thiatriazolyloxy group, pyrrolyloxy group, pyrazolyloxy group, imidazolyloxy group, triazolyloxy group, tetrazolyloxy group, pentazolyloxy group, furyloxy group, oxazolyl Oxy group, isoxazolyloxy group, oxadiazolyloxy group, oxa triazolyloxy group, indolyloxy group, isoindolyloxy group, indazolyloxy group, benzoimidazolyloxy group, benzotriazolyloxy group , Benzofuryloxy group, iso Nzofulyloxy group, benzoxazolyloxy group, benzoisoxazolyloxy group, benzooxadiazolyloxy group, benzothienyloxy group, benzothiazolyloxy group, benzoisothiazolyloxy group, benzothiadiazolyloxy group , Indolizinyloxy group, imidazopyridyloxy group, pyrazolo pyridyloxy group, triazolo pyridyloxy group, pyrrolopyrimidinyloxy group, imidazopyrimidinyloxy group, pyrazolopyrimidinyloxy group, triazolopyrimidinyloxy group, pyrrolopyrazinyl group Oxy group, imidazopyrazinyloxy group, pyrazolopyrazinyloxy group, triazolopyrazinyloxy group, quinolyloxy group, isoquinolyloxy group, sinoryloxy group, phthalazinyloxy group, quinoxalinyloxy group , Kina Riniruokishi group, naphthyridone isoxazolidinyl group, and the like.
 C1~C6のアラルキル基とは、C1~C6のアルキル基における水素原子が前記のアリール基で置換されたものを表す。C1~C6のアラルキル基の具体例として、ベンジル基、フェネチル基、フェニルプロピル基、フェニルブチル基、フェニルペンチル基、フェニルヘキシル基、ナフタレニルメチル基、ナフタレニルエチル基、ナフタレニルプロピル基、ナフタレニルブチル基、ナフタレニルペンチル基、ナフタレニルヘキシル基等が挙げられる。 The C1 to C6 aralkyl group represents one in which a hydrogen atom in a C1 to C6 alkyl group is substituted by the above-mentioned aryl group. Specific examples of the C1 to C6 aralkyl group include benzyl, phenethyl, phenylpropyl, phenylbutyl, phenylpentyl, phenylhexyl, naphthalenylmethyl, naphthalenylethyl and naphthalenylpropyl groups. , Naphthalenylbutyl group, naphthalenylpentyl group, naphthalenylhexyl group and the like.
 C1~C6のヘテロアラルキル基とは、C1~C6のアルキル基における水素原子が前記のヘテロアリール基で置換されたものを表す。C1~C6のヘテロアラルキル基の具体例として、ピリジルメチル基、ピリジルエチル基、ピリジルプロピル基、ピリジルブチル基、ピリジルペンチル基、ピリジルヘキシル基、ピリダジニルメチル基、ピリダジニルエチル基、ピリダジニルプロピル基、ピリダジニルブチル基、ピリダジニルペンチル基、ピリダジニルヘキシル基、ピリミジニルメチル基、ピリミジニルエチル基、ピリミジニルプロピル基、ピリミジニルブチル基、ピリミジニルペンチル基、ピリミジニルヘキシル基、ピラジニルメチル基、ピラジニルエチル基、ピラジニルプロピル基、ピラジニルブチル基、ピラジニルペンチル基、ピラジニルヘキシル基、トリアジニルメチル基、トリアジニルエチル基、トリアジニルプロピル基、トリアジニルブチル基、トリアジニルペンチル基、トリアジニルヘキシル基、テトラジニルメチル基、テトラジニルエチル基、テトラジニルプロピル基、テトラジニルブチル基、テトラジニルペンチル基、テトラジニルヘキシル基、チエニルメチル基、チエニルエチル基、チエニルプロピル基、チエニルブチル基、チエニルペンチル基、チエニルヘキシル基、チアゾリルメチル基、チアゾリルエチル基、チアゾリルプロピル基、チアゾリルブチル基、チアゾリルペンチル基、チアゾリルヘキシル基、イソチアゾリルメチル基、イソチアゾリルエチル基、イソチアゾリルプロピル基、イソチアゾリルブチル基、イソチアゾリルペンチル基、イソチアゾリルヘキシル基、チアジアゾリルメチル基、チアジアゾリルエチル基、チアジアゾリルプロピル基、チアジアゾリルブチル基、チアジアゾリルペンチル基、チアジアゾリルヘキシル基、チアトリアゾリルメチル基、チアトリアゾリルエチル基、チアトリアゾリルプロピル基、チアトリアゾリルブチル基、チアトリアゾリルペンチル基、チアトリアゾリルヘキシル基、ピロリルメチル基、ピロリルエチル基、ピロリルプロピル基、ピロリルブチル基、ピロリルペンチル基、ピロリルヘキシル基、ピラゾリルメチル基、ピラゾリルエチル基、ピラゾリルプロピル基、ピラゾリルブチル基、ピラゾリルペンチル基、ピラゾリルヘキシル基、イミダゾリルメチル基、イミダゾリルエチル基、イミダゾリルプロピル基、イミダゾリルブチル基、イミダゾリルペンチル基、イミダゾリルヘキシル基、トリアゾリルメチル基、トリアゾリルエチル基、トリアゾリルプロピル基、トリアゾリルブチル基、トリアゾリルペンチル基、トリアゾリルヘキシル基、テトラゾリルメチル基、テトラゾリルエチル基、テトラゾリルプロピル基、テトラゾリルブチル基、テトラゾリルペンチル基、テトラゾリルヘキシル基、ペンタゾリルメチル基、ペンタゾリルエチル基、ペンタゾリルプロピル基、ペンタゾリルブチル基、ペンタゾリルペンチル基、ペンタゾリルヘキシル基、フリルメチル基、フリルエチル基、フリルプロピル基、フリルブチル基、フリルペンチル基、フリルヘキシル基、オキサゾリルメチル基、オキサゾリルエチル基、オキサゾリルプロピル基、オキサゾリルブチル基、オキサゾリルペンチル基、オキサゾリルヘキシル基、イソキサゾリルメチル基、イソキサゾリルエチル基、イソキサゾリルプロピル基、イソキサゾリルブチル基、イソキサゾリルペンチル基、イソキサゾリルヘキシル基、オキサジアゾリルメチル基、オキサジアゾリルエチル基、オキサジアゾリルプロピル基、オキサジアゾリルブチル基、オキサジアゾリルペンチル基、オキサジアゾリルヘキシル基、オキサトリアゾリルメチル基、オキサトリアゾリルエチル基、オキサトリアゾリルプロピル基、オキサトリアゾリルブチル基、オキサトリアゾリルペンチル基、オキサトリアゾリルヘキシル基、インドリルメチル基、インドリルエチル基、インドリルプロピル基、インドリルブチル基、インドリルペンチル基、インドリルヘキシル基、イソインドリルメチル基、イソインドリルエチル基、イソインドリルプロピル基、イソインドリルブチル基、イソインドリルペンチル基、イソインドリルヘキシル基、インダゾリルメチル基、インダゾリルエチル基、インダゾリルプロピル基、インダゾリルブチル基、インダゾリルペンチル基、インダゾリルヘキシル基、ベンゾイミダゾリルメチル基、ベンゾイミダゾリルエチル基、ベンゾイミダゾリルプロピル基、ベンゾイミダゾリルブチル基、ベンゾイミダゾリルペンチル基、ベンゾイミダゾリルヘキシル基、ベンゾトリアゾリルメチル基、ベンゾトリアゾリルエチル基、ベンゾトリアゾリルプロピル基、ベンゾトリアゾリルブチル基、ベンゾトリアゾリルペンチル基、ベンゾトリアゾリルヘキシル基、ベンゾフリルメチル基、ベンゾフリルエチル基、ベンゾフリルプロピル基、ベンゾフリルブチル基、ベンゾフリルペンチル基、ベンゾフリルヘキシル基、イソベンゾフリルメチル基、イソベンゾフリルエチル基、イソベンゾフリルプロピル基、イソベンゾフリルブチル基、イソベンゾフリルペンチル基、イソベンゾフリルヘキシル基、ベンゾオキサゾリルメチル基、ベンゾオキサゾリルエチル基、ベンゾオキサゾリルプロピル基、ベンゾオキサゾリルブチル基、ベンゾオキサゾリルペンチル基、ベンゾオキサゾリルヘキシル基、ベンゾイソオキサゾリルメチル基、ベンゾイソオキサゾリルエチル基、ベンゾイソオキサゾリルプロピル基、ベンゾイソオキサゾリルブチル基、ベンゾイソオキサゾリルペンチル基、ベンゾイソオキサゾリルヘキシル基、ベンゾオキサジアゾリルメチル基、ベンゾオキサジアゾリルエチル基、ベンゾオキサジアゾリルプロピル基、ベンゾオキサジアゾリルブチル基、ベンゾオキサジアゾリルペンチル基、ベンゾオキサジアゾリルヘキシル基、ベンゾチエニルメチル基、ベンゾチエニルエチル基、ベンゾチエニルプロピル基、ベンゾチエニルブチル基、ベンゾチエニルペンチル基、ベンゾチエニルヘキシル基、ベンゾチアゾリルメチル基、ベンゾチアゾリルエチル基、ベンゾチアゾリルプロピル基、ベンゾチアゾリルブチル基、ベンゾチアゾリルペンチル基、ベンゾチアゾリルヘキシル基、ベンゾイソチアゾリルメチル基、ベンゾイソチアゾリルエチル基、ベンゾイソチアゾリルプロピル基、ベンゾイソチアゾリルブチル基、ベンゾイソチアゾリルペンチル基、ベンゾイソチアゾリルヘキシル基、ベンゾチアジアゾリルメチル基、ベンゾチアジアゾリルエチル基、ベンゾチアジアゾリルプロピル基、ベンゾチアジアゾリルブチル基、ベンゾチアジアゾリルペンチル基、ベンゾチアジアゾリルヘキシル基、インドリジニルメチル基、インドリジニルエチル基、インドリジニルプロピル基、インドリジニルブチル基、インドリジニルペンチル基、インドリジニルヘキシル基、イミダゾピリジルメチル基、イミダゾピリジルエチル基、イミダゾピリジルプロピル基、イミダゾピリジルブチル基、イミダゾピリジルペンチル基、イミダゾピリジルヘキシル基、ピラゾロピリジルメチル基、ピラゾロピリジルエチル基、ピラゾロピリジルプロピル基、ピラゾロピリジルブチル基、ピラゾロピリジルペンチル基、ピラゾロピリジルヘキシル基、トリアゾロピリジルメチル基、トリアゾロピリジルエチル基、トリアゾロピリジルプロピル基、トリアゾロピリジルブチル基、トリアゾロピリジルペンチル基、トリアゾロピリジルヘキシル基、ピロロピリミジニルメチル基、ピロロピリミジニルエチル基、ピロロピリミジニルプロピル基、ピロロピリミジニルブチル基、ピロロピリミジニルペンチル基、ピロロピリミジニルヘキシル基、イミダゾピリミジニルメチル基、イミダゾピリミジニルエチル基、イミダゾピリミジニルプロピル基、イミダゾピリミジニルブチル基、イミダゾピリミジニルペンチル基、イミダゾピリミジニルヘキシル基、ピラゾロピリミジニルメチル基、ピラゾロピリミジニルエチル基、ピラゾロピリミジニルプロピル基、ピラゾロピリミジニルブチル基、ピラゾロピリミジニルペンチル基、ピラゾロピリミジニルヘキシル基、トリアゾロピリミジニルメチル基、トリアゾロピリミジニルエチル基、トリアゾロピリミジニルプロピル基、トリアゾロピリミジニルブチル基、トリアゾロピリミジニルペンチル基、トリアゾロピリミジニルヘキシル基、ピロロピラジニルメチル基、ピロロピラジニルエチル基、ピロロピラジニルプロピル基、ピロロピラジニルブチル基、ピロロピラジニルペンチル基、ピロロピラジニルヘキシル基、イミダゾピラジニルメチル基、イミダゾピラジニルエチル基、イミダゾピラジニルプロピル基、イミダゾピラジニルブチル基、イミダゾピラジニルペンチル基、イミダゾピラジニルヘキシル基、ピラゾロピラジニルメチル基、ピラゾロピラジニルエチル基、ピラゾロピラジニルプロピル基、ピラゾロピラジニルブチル基、ピラゾロピラジニルペンチル基、ピラゾロピラジニルヘキシル基、トリアゾロピラジニルメチル基、トリアゾロピラジニルエチル基、トリアゾロピラジニルプロピル基、トリアゾロピラジニルブチル基、トリアゾロピラジニルペンチル基、トリアゾロピラジニルヘキシル基、キノリルメチル基、キノリルエチル基、キノリルプロピル基、キノリルブチル基、キノリルペンチル基、キノリルヘキシル基、イソキノリルメチル基、イソキノリルエチル基、イソキノリルプロピル基、イソキノリルブチル基、イソキノリルペンチル基、イソキノリルヘキシル基、シノリルメチル基、シノリルエチル基、シノリルプロピル基、シノリルブチル基、シノリルペンチル基、シノリルヘキシル基、フタラジニルメチル基、フタラジニルエチル基、フタラジニルプロピル基、フタラジニルブチル基、フタラジニルペンチル基、フタラジニルヘキシル基、キノキサリルメチル基、キノキサリルエチル基、キノキサリルプロピル基、キノキサリルブチル基、キノキサリルペンチル基、キノキサリルヘキシル基、キナゾリニルメチル基、キナゾリニルエチル基、キナゾリニルプロピル基、キナゾリニルブチル基、キナゾリニルペンチル基、キナゾリニルヘキシル基、ナフチリジニルメチル基、ナフチリジニルエチル基、ナフチリジニルプロピル基、ナフチリジニルブチル基、ナフチリジニルペンチル基、ナフチリジニルヘキシル基等が挙げられる。 The C1-C6 heteroaralkyl group means one in which a hydrogen atom in the C1-C6 alkyl group is substituted with the above-mentioned heteroaryl group. As specific examples of C1 to C6 heteroaralkyl groups, pyridylmethyl group, pyridylethyl group, pyridylpropyl group, pyridylbutyl group, pyridylpentyl group, pyridylhexyl group, pyridazinylmethyl group, pyridazinylethyl group, Pyridazinylpropyl, pyridazinylbutyl, pyridazinylpentyl, pyridazinylhexyl, pyrimidinylmethyl, pyrimidinylethyl, pyrimidinylpropyl, pyrimidinylbutyl, pyrimidinylpentyl, pyrimidinylhexyl Pyrazinylmethyl group, pyrazinylethyl group, pyrazinylpropyl group, pyrazinylbutyl group, pyrazinylpentyl group, pyrazinylhexyl group, triazinylmethyl group, triazinylethyl group, triazinylpropyl group, triazinylbutyl group , Triazinilpe Tyl, triazinylhexyl, tetrazinylmethyl, tetrazinylethyl, tetrazinylpropyl, tetrazinylbutyl, tetrazinylpentyl, tetrazinylhexyl, thienylmethyl, thienylethyl , Thienylpropyl, thienylbutyl, thienylpentyl, thienylhexyl, thiazolylmethyl, thiazolylethyl, thiazolylpropyl, thiazolylbutyl, thiazolylpentyl, thiazolylhexyl, isothiazolylmethyl, isothiol Azolylethyl group, isothiazolylpropyl group, isothiazolylbutyl group, isothiazolylpentyl group, isothiazolylhexyl group, thiadiazolylmethyl group, thiadiazolylethyl group, thiadiazolylpropyl group, thiadiazolyl group Butyl group, thiadi Zoryl pentyl group, thiadiazolyl hexyl group, thia triazolyl methyl group, thia triazolyl ethyl group, thia triazolyl propyl group, thia triazolyl butyl group, thia triazolyl pentyl group, thia triazolyl hexyl group, Pyrrolyl methyl group, pyrrolyl ethyl group, pyrrolyl propyl group, pyrrolyl butyl group, pyrrolyl pentyl group, pyrrolyl hexyl group, pyrazolyl methyl group, pyrazolyl ethyl group, pyrazolyl propyl group, pyrazolyl butyl group, pyrazolyl pentyl group, pyrazolyl hexyl group, imidazolyl methyl group , Imidazolyl ethyl group, imidazolyl propyl group, imidazolyl butyl group, imidazolyl pentyl group, imidazolyl hexyl group, triazolyl methyl group, triazolyl ethyl group, triazolyl propyl group, triazolyl aryl group Group, triazolylpentyl group, triazolylhexyl group, tetrazolylmethyl group, tetrazolylethyl group, tetrazolylpropyl group, tetrazolylbutyl group, tetrazolylpentyl group, tetrazolylhexyl group, penta Zorylmethyl, pentazolylethyl, pentazolylpropyl, pentazolylbutyl, pentazolylpentyl, pentazolylhexyl, furylmethyl, furylethyl, furylpropyl, furylbutyl, furyl Pentyl, furylhexyl, oxazolylmethyl, oxazolylethyl, oxazolylpropyl, oxazolylbutyl, oxazolylpentyl, oxazolylhexyl, isoxazolylmethyl, iso Xazolylethyl group, isoxazolylpropyl group, isoxazolylbutyl , Isoxazolyl pentyl group, isoxazolyl hexyl group, oxadiazolyl methyl group, oxadiazolyl ethyl group, oxadiazolyl propyl group, oxadiazolyl butyl group, oxadiazolyl pentyl group, oxadiazolyl hexyl group, Oxatriazolyl methyl group, Oxa triazolyl ethyl group, Oxa triazolyl propyl group, Oxa triazolyl butyl group, Oxa triazolyl pentyl group, Oxa triazolyl hexyl group, Indolyl methyl group, Indolyl ethyl group , Indolylpropyl, indolylbutyl, indolylpentyl, indolylhexyl, isoindolylmethyl, isoindolylethyl, isoindolylpropyl, isoindolylbutyl, isoindolylpentyl, Isoindolylhexyl group Indazolyl methyl group, indazolyl ethyl group, indazolyl propyl group, indazolyl butyl group, indazolyl pentyl group, indazolyl pentyl group, benzoimidazolyl methyl group, benzimidazolyl ethyl group, benzimidazolyl propyl group, benzimidazolyl butyl group , Benzoimidazolyl pentyl group, benzoimidazolyl hexyl group, benzotriazolyl methyl group, benzotriazolyl ethyl group, benzotriazolyl propyl group, benzotriazolyl butyl group, benzotriazolyl pentyl group, benzotriazolyl hexyl group, Benzofurylmethyl group, benzofurylethyl group, benzofurylpropyl group, benzofurylbutyl group, benzofurylpentyl group, benzofurylhexyl group, isobenzofurylmethyl group, isobenzofuryl Ethyl group, isobenzofurylpropyl group, isobenzofurylbutyl group, isobenzofurylpentyl group, isobenzofurylhexyl group, benzoxazolylmethyl group, benzoxazolylethyl group, benzoxazolylpropyl group, benzooxa Zorylbutyl, benzoxazolylpentyl, benzoxazolylhexyl, benzoisoxazolylmethyl, benzoisoxazolylethyl, benzoisoxazolylpropyl, benzoisoxazolyl butyl, Benzoisoxazolyl pentyl group, Benzoisoxazolyl hexyl group, Benzo oxadiazolyl methyl group, Benzo oxadiazolyl ethyl group, Benzo oxadiazolyl propyl group, Benzo oxadiazolyl butyl group, Benzo oxadiazolyl pentyl group, Benzo Oki Diazolylhexyl group, benzothienylmethyl group, benzothienylethyl group, benzothienylpropyl group, benzothienylbutyl group, benzothienylpentyl group, benzothienylhexyl group, benzothiazolylmethyl group, benzothiazolylethyl group, benzo Thiazolylpropyl group, benzothiazolylbutyl group, benzothiazolylpentyl group, benzothiazolylhexyl group, benzoisothiazolyl methyl group, benzoisothiazolyl ethyl group, benzoisothiazolyl propyl group, benzoisothiazole group Rylbutyl, benzoisothiazolylpentyl, benzoisothiazolylhexyl, benzothiadiazolylmethyl, benzothiadiazolylethyl, benzothiadiazolylpropyl, benzothiadiazolylbutyl, benzothiadiazolyl Rupe Ethyl, benzothiadiazolylhexyl, indolizinylmethyl, indolizinylethyl, indolizinylpropyl, indolizinylbutyl, indolizinylpentyl, indolizinylhexyl, imidazopyridylmethyl, Imidazo pyridylethyl group, imidazo pyridylpropyl group, imidazo pyridyl butyl group, imidazo pyridyl pentyl group, imidazo pyridyl hexyl group, pyrazolo pyridyl methyl group, pyrazolo pyridyl ethyl group, pyrazolo pyridyl propyl group, pyrazolo pyridyl butyl group, pyrazolo pyridyl butyl group Zoro pyridyl pentyl group, pyrazolo pyridyl hexyl group, triazolo pyridyl methyl group, triazolo pyridyl ethyl group, triazolo pyridyl propyl group, triazolo pyridyl butyl group, triazolo pyridyl pentyl group, triazo Ropyridylhexyl, pyrrolopyrimidinylmethyl, pyrrolopyrimidinylethyl, pyrrolopyrimidinylpropyl, pyrrolopyrimidinylbutyl, pyrrolopyrimidinylpentyl, pyrrolopyrimidinylhexyl, imidazopyrimidinylmethyl, imidazopyrimidinylethyl, imidazopyrimidinyl, Imidazopyrimidinyl butyl group, imidazo pyrimidinyl pentyl group, imidazo pyrimidinyl hexyl group, pyrazolo pyrimidinyl methyl group, pyrazolo pyrimidinyl ethyl group, pyrazolo pyrimidinyl propyl group, pyrazolo pyrimidinyl butyl group, pyrazolo pyrimidinyl pentyl group, pyrazolo pyrimidinyl hexyl group , Triazolopyrimidinylmethyl group, triazolopyrimidinylethyl group, triazolopyrimidinylpropyl group, Triazolopyrimidinylbutyl group, triazolopyrimidinylpentyl group, triazolopyrimidinylhexyl group, pyrrolopyrazinylmethyl group, pyrrolopyrazinylethyl group, pyrrolopyrazinylpropyl group, pyrrolopyrazinylbutyl group, pyrrolopyrazinyl group Pentyl, pyrrolopyrazinylhexyl, imidazopyrazinylmethyl, imidazopyrazinylethyl, imidazopyrazinylpropyl, imidazopyrazinylbutyl, imidazopyrazinylpentyl, imidazopyrazinyl, Pyrazolo pyrazinyl methyl group, pyrazolo pyrazinyl ethyl group, pyrazolo pyrazinyl propyl group, pyrazolo pyrazinyl butyl group, pyrazolo pyrazinyl pentyl group, pyrazolo pyrazinyl hexyl group, triazolopy Ladinylmethyl group, triazolopyrazinylethyl , Triazolopyrazinylpropyl group, triazolopyrazinylbutyl group, triazolopyrazinylpentyl group, triazolopyrazinylhexyl group, quinolylmethyl group, quinolylethyl group, quinolylpropyl group, quinolylbutyl group, quinolylpentyl group , Quinolylhexyl group, isoquinolylmethyl group, isoquinolylethyl group, isoquinolylpropyl group, isoquinolylbutyl group, isoquinolylpentyl group, isoquinolylhexyl group, sinolylmethyl group, sinolylethyl group, sinolyl A propyl group, a cinolyl butyl group, a cinolyl pentyl group, a cinolyl hexyl group, a phthalazinyl methyl group, a phthalazinyl ethyl group, a phthalazinyl propyl group, a phthalazinyl butyl group, a phthalazinyl pentyl group, a phthalazinyl hexyl group, quinoxa Rylmethyl group, quinoxalyl Ethyl group, quinoxalyl propyl group, quinoxalyl butyl group, quinoxalyl pentyl group, quinoxalyl hexyl group, quinazolinyl methyl group, quinazolinyl ethyl group, quinazolinyl propyl group, quinazolinyl butyl group , Quinazolinylpentyl, quinazolinylhexyl, naphthyridinylmethyl, naphthyridinylethyl, naphthyridinylpropyl, naphthyridinylbutyl, naphthyridinylpentyl, naphthyridinylhexyl and the like Be
 アラルキルオキシ基とは、前記のアラルキル基が、酸素原子を介して結合したものを表す。アラルキルオキシ基の具体例として、ベンジルオキシ基、フェネチルオキシ基、フェニルプロピルオキシ基、フェニルブトキシ基、フェニルペンチルオキシ基、フェニルヘキシルオキシ基、ナフタレニルメトキシ基、ナフタレニルエトキシ基、ナフタレニルプロポキシ基、ナフタレニルブトキシ基、ナフタレニルペンチルオキシ基、ナフタレニルヘキシルオキシ基等が挙げられる。 The aralkyloxy group means that the above-mentioned aralkyl group is bonded via an oxygen atom. Specific examples of the aralkyloxy group include benzyloxy group, phenethyloxy group, phenylpropyloxy group, phenylbutoxy group, phenylpentyloxy group, phenylhexyloxy group, naphthalenyl methoxy group, naphthalenyl ethoxy group, naphthalenyl A propoxy group, naphthalenyl butoxy group, naphthalenyl pentyloxy group, naphthalenyl hexyl oxy group etc. are mentioned.
 C1~C6のアルキレン基とは、直鎖状であり、メチレン基、エチレン基、プロピレン基、ブチレン基、ペンチレン基、へキシレン基等が挙げられる。 The C1 to C6 alkylene group is linear and includes methylene, ethylene, propylene, butylene, pentylene and hexylene groups.
 1~2個の酸素原子を含む3~6員環の基の具体例として、1,2-エポキシエタニル基、オキセタニル基、オキソラニル基、オキサニル基、1,3-ジオキソラニル基、1,3-ジオキサニル基、1,4-ジオキサニル基等が挙げられる。 Specific examples of the 3- to 6-membered ring group containing 1 to 2 oxygen atoms include a 1,2-epoxyethanyl group, an oxetanyl group, an oxolanyl group, an oxanyl group, a 1,3-dioxolanyl group, and a 1,3-dioxolanyl group. Dioxanyl group, 1,4-dioxanyl group and the like can be mentioned.
 C2~C6のアルコキシアルコキシ基とは、前記のC1~C6のアルコキシ基のうちC1~C5のアルコキシ基における水素原子が、1個または2個以上のC1~C5アルコキシ基で任意に置換されたものを表す。炭素数の総和が指定される炭素数の範囲であれば、特に限定されることはない。C2~C6のアルコキシアルコキシ基の具体例として、メトキシメトキシ基、エトキシメトキシ基、プロピルオキシメトキシ基、イソプロピルオキシメトキシ基、メトキシエトキシ基、エトキシエトキシ基、プロピルオキシエトキシ基、イソプロピルオキシエトキシ基、メトキシプロピルオキシ基、エトキシプロピルオキシ基、プロピルオキシプロピルオキシ基、イソプロピルオキシプロピルオキシ基等が挙げられる。 The C2 to C6 alkoxyalkoxy group is a group in which a hydrogen atom in a C1 to C5 alkoxy group among the above C1 to C6 alkoxy groups is optionally substituted by one or more C1 to C5 alkoxy groups Represents The total number of carbons is not particularly limited as long as it is within the specified number of carbons. Specific examples of the C 2 -C 6 alkoxyalkoxy group include methoxymethoxy, ethoxymethoxy, propyloxymethoxy, isopropyloxymethoxy, methoxyethoxy, ethoxyethoxy, propyloxyethoxy, isopropyloxyethoxy, methoxypropyl Examples include oxy, ethoxypropyloxy, propyloxypropyloxy, isopropyloxypropyloxy and the like.
 本発明のピリドン化合物は、下記式(1)で表される化合物とその塩を包含する。
Figure JPOXMLDOC01-appb-C000003
The pyridone compound of the present invention includes a compound represented by the following formula (1) and a salt thereof.
Figure JPOXMLDOC01-appb-C000003
 以下、式(1)について説明する。 Hereinafter, Formula (1) is demonstrated.
 式(1)中のR1は、水酸基、シアノ基、置換基Aで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Aで適宜置換されてもよいC2~C6のアルケニル基、C2~C6のハロアルケニル基、置換基Aで適宜置換されてもよいC2~C6のアルキニル基、C2~C6のハロアルキニル基、置換基Aで適宜置換されてもよいC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、置換基Aで適宜置換されてもよいC3~C8のシクロアルコキシ基、置換基Aで適宜置換されてもよいC2~C6のアルケニルオキシ基、C2~C6のハロアルケニルオキシ基、置換基Aで適宜置換されてもよいC3~C6のアルキニルオキシ基、C3~C6のハロアルキニルオキシ基、またはRaRbN-(ここで、RaおよびRbは、それぞれ独立していて、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表すか、あるいはRaおよびRbは、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。)を表す。 R 1 in the formula (1) is a hydroxyl group, a cyano group, a C1 to C6 alkyl group optionally substituted with substituent A, a C1 to C6 haloalkyl group, C3 optionally substituted with substituent A C8 cycloalkyl group, C2 to C6 alkenyl group optionally substituted with substituent A, C2 to C6 haloalkenyl group, C2 to C6 alkynyl group optionally substituted with substituent A, C2 to C6 C6 haloalkynyl group, C1 to C6 alkoxy group optionally substituted with substituent A, C1 to C6 haloalkoxy group, C3 to C8 cycloalkoxy group optionally substituted with substituent A, substitution A C2 to C6 alkenyloxy group which may be optionally substituted by a group A, a C2 to C6 haloalkenyloxy group, a C3 to C6 alkynyloxy group which may be optionally substituted by a substituent A, C3 C6 haloalkynyloxy group, or RaRbN- (wherein Ra and Rb are each independently a hydrogen atom, a C1-C6 alkyl group optionally substituted with a substituent B, a C1-C6 haloalkyl Or a C3-C8 cycloalkyl group, or Ra and Rb together with the nitrogen atom to which they are attached form aziridinyl, azetidinyl, pyrrolidinyl, piperidinyl, homopiperidinyl or azocanyl Represents the
 中でもR1は、置換基Aで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Aで適宜置換されてもよいC2~C6のアルケニル基、C2~C6のハロアルケニル基、置換基Aで適宜置換されてもよいC2~C6のアルキニル基、またはC2~C6のハロアルキニル基が好ましく、
 特にR1は、置換基Aで適宜置換されてもよいC1~C6のアルキル基、またはC1~C6のハロアルキル基が好ましい。
Among them, R 1 is a C1 to C6 alkyl group optionally substituted with a substituent A, a C1 to C6 haloalkyl group, a C2 to C6 alkenyl group optionally substituted with a substituent A, C2 to C6 halo Alkenyl group, C2-C6 alkynyl group which may be optionally substituted with substituent A, or C2-C6 haloalkynyl group is preferable,
In particular, R 1 is preferably a C 1 to C 6 alkyl group which may be optionally substituted by a substituent A, or a C 1 to C 6 haloalkyl group.
 式(1)のR1には、水酸基およびシアノ基が含まれる。 R 1 in the formula (1) includes a hydroxyl group and a cyano group.
 式(1)のR1における「置換基Aで適宜置換されてもよいC1~C6のアルキル基」のC1~C6のアルキル基は、前記の定義と同義であり、好ましくは、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、またはイソブチル基であり、さらに好ましくは、メチル基、またはエチル基である。置換基Aを有する場合、C1~C6のアルキル基における水素原子が、置換基Aによって任意に置換される。 The C1-C6 alkyl group of the "C1-C6 alkyl group optionally substituted with substituent A" in R1 of Formula (1) has the same definition as that described above, preferably a methyl group or an ethyl group A propyl group, an isopropyl group, a butyl group or an isobutyl group, and more preferably a methyl group or an ethyl group. When having a substituent A, the hydrogen atom in the C1-C6 alkyl group is optionally substituted by the substituent A.
 式(1)のR1における「C1~C6のハロアルキル基」は、前記の定義と同義であり、好ましくは、2-フルオロエチル基、2,2-ジフルオロエチル基、2,2,2-トリフルオロエチル基、3,3-ジフルオロプロピル基、または3,3,3-トリフルオロプロピル基であり、さらに好ましくは、2-フルオロエチル基、2,2-ジフルオロエチル基、または2,2,2-トリフルオロエチル基である。 The “C1-C6 haloalkyl group” in R 1 of the formula (1) is as defined above, preferably a 2-fluoroethyl group, a 2,2-difluoroethyl group or a 2,2,2-trifluoro group. Ethyl group, 3,3-difluoropropyl group, or 3,3,3-trifluoropropyl group, more preferably 2-fluoroethyl group, 2,2-difluoroethyl group, or 2,2,2- It is a trifluoroethyl group.
 式(1)のR1における「置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基」のC3~C8のシクロアルキル基は、前記の定義と同義であり、好ましくは、シクロプロピル基、シクロブチル基、シクロペンチル基、またはシクロヘキシル基であり、さらに好ましくは、シクロプロピル基、またはシクロブチル基である。置換基Aを有する場合、C3~C8のシクロアルキル基における水素原子が、置換基Aによって任意に置換される。 The C3 to C8 cycloalkyl group of the "C3 to C8 cycloalkyl group optionally substituted with substituent A" in R1 of Formula (1) has the same definition as that described above, and preferably a cyclopropyl group A cyclobutyl group, a cyclopentyl group or a cyclohexyl group, more preferably a cyclopropyl group or a cyclobutyl group. When having a substituent A, the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent A.
 式(1)のR1における「置換基Aで適宜置換されてもよいC2~C6のアルケニル基」のC2~C6のアルケニル基は、前記の定義と同義であり、好ましくは、ビニル基、1-プロペニル基、またはアリル基であり、さらに好ましくは、ビニル基、またはアリル基である。置換基Aを有する場合、C2~C6のアルケニル基における水素原子が、置換基Aによって任意に置換される。 The C2-C6 alkenyl group of the "C2-C6 alkenyl group optionally substituted with substituent A" in R1 of Formula (1) has the same definition as that described above, preferably a vinyl group, 1- It is a propenyl group or an allyl group, more preferably a vinyl group or an allyl group. When having a substituent A, a hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent A.
 式(1)のR1における「C2~C6のハロアルケニル基」は、前記の定義と同義であり、好ましくは、2-フルオロビニル基、2,2-ジフルオロビニル基、3-フルオロアリル基、または3,3-ジフルオロアリル基であり、さらに好ましくは、2-フルオロビニル基、または2,2-ジフルオロビニル基である。 The “C2 to C6 haloalkenyl group” in R 1 of the formula (1) is as defined above, preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group, a 3-fluoroallyl group, or It is a 3,3-difluoroallyl group, more preferably a 2-fluorovinyl group or a 2,2-difluorovinyl group.
 式(1)のR1における「置換基Aで適宜置換されてもよいC2~C6のアルキニル基」のC2~C6のアルキニル基は、前記の定義と同義であり、好ましくは、プロパルギル基、2-ブチニル基、または3-ブチニル基であり、さらに好ましくは、プロパルギル基である。置換基Aを有する場合、C2~C6のアルキニル基における水素原子が、置換基Aによって任意に置換される。 The C2 to C6 alkynyl group of the “C2 to C6 alkynyl group optionally substituted with substituent A” in R 1 of Formula (1) has the same definition as described above, preferably a propargyl group, 2- It is a butynyl group or a 3-butynyl group, and more preferably a propargyl group. When having a substituent A, the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent A.
 式(1)のR1における「C2~C6のハロアルキニル基」は、前記の定義と同義であり、好ましくは、4,4-ジフルオロ-2-ブチニル基、4-クロロ-4,4-ジフルオロ-2-ブチニル基、4-ブロモ-4,4-ジフルオロ-2-ブチニル基、または4,4,4-トリフルオロ-2-ブチニル基であり、さらに好ましくは、4,4-ジフルオロ-2-ブチニル基、または4,4,4-トリフルオロ-2-ブチニル基である。 The “C2-C6 haloalkynyl group” in R 1 of the formula (1) is as defined above, preferably a 4, 4-difluoro-2-butynyl group, 4-chloro-4, 4-difluoro- 2-butynyl group, 4-bromo-4,4-difluoro-2-butynyl group, or 4,4,4-trifluoro-2-butynyl group, more preferably 4,4-difluoro-2-butynyl group Or 4,4,4-trifluoro-2-butynyl group.
 式(1)のR1における「置換基Aで適宜置換されてもよいC1~C6のアルコキシ基」のC1~C6のアルコキシ基は、前記の定義と同義であり、好ましくは、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、またはイソブトキシ基であり、さらに好ましくは、メトキシ基、またはエトキシ基である。置換基Aを有する場合、C1~C6のアルコキシ基における水素原子が、置換基Aによって任意に置換される。 The C1-C6 alkoxy group of the “C1-C6 alkoxy group optionally substituted with substituent A” in R 1 of Formula (1) has the same definition as that described above, preferably a methoxy group or an ethoxy group A propyloxy group, an isopropyloxy group, a butoxy group or an isobutoxy group, more preferably a methoxy group or an ethoxy group. When having a substituent A, the hydrogen atom in the C1-C6 alkoxy group is optionally substituted by the substituent A.
 式(1)のR1における「C1~C6のハロアルコキシ基」は、前記の定義と同義であり、好ましくは、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、3,3-ジフルオロプロピルオキシ基、または3,3,3-トリフルオロプロピルオキシ基であり、さらに好ましくは、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、または2,2,2-トリフルオロエトキシ基である。 The “C1 to C6 haloalkoxy group” in R 1 of the formula (1) is as defined above, preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2, 2-trifluoroethoxy group, 3,3-difluoropropyloxy group, or 3,3,3-trifluoropropyloxy group, more preferably difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group A group or a 2,2,2-trifluoroethoxy group.
 式(1)のR1における「置換基Aで適宜置換されてもよいC3~C8のシクロアルコキシ基」のC3~C8のシクロアルコキシ基は、前記の定義と同義であり、好ましくは、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、またはシクロヘキシルオキシ基であり、さらに好ましくは、シクロプロピルオキシ基、またはシクロブトキシ基である。置換基Aを有する場合、C3~C8のシクロアルコキシ基における水素原子が、置換基Aによって任意に置換される。 The C3 to C8 cycloalkoxy group of the "C3 to C8 cycloalkoxy group which may be optionally substituted with substituent A" in R1 of the formula (1) has the same definition as that described above, preferably, cyclopropyloxy A cyclobutoxy group, a cyclopentyloxy group or a cyclohexyloxy group, more preferably a cyclopropyloxy group or a cyclobutoxy group. When having a substituent A, the hydrogen atom in the C3-C8 cycloalkoxy group is optionally substituted by the substituent A.
 式(1)のR1における「置換基Aで適宜置換されてもよいC2~C6のアルケニルオキシ基」のC2~C6のアルケニルオキシ基は、前記の定義と同義であり、好ましくは、ビニルオキシ基、1-プロペニルオキシ基、またはアリルオキシ基であり、さらに好ましくは、ビニルオキシ基である。置換基Aを有する場合、C2~C6のアルケニルオキシ基における水素原子が、置換基Aによって任意に置換される。 The C2-C6 alkenyloxy group of the "C2-C6 alkenyloxy group optionally substituted with substituent A" in R1 of Formula (1) has the same definition as that described above, and preferably a vinyloxy group, It is a 1-propenyloxy group or an allyloxy group, and more preferably a vinyloxy group. When having a substituent A, the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted by the substituent A.
 式(1)のR1における「C2~C6のハロアルケニルオキシ基」とは、前記の定義と同義であり、好ましくは、2-フルオロビニルオキシ基、2,2-ジフルオロビニルオキシ基、3-フルオロアリルオキシ基、または3,3-ジフルオロアリルオキシ基であり、さらに好ましくは、2-フルオロビニルオキシ基、または2,2-ジフルオロビニルオキシ基である。 The “C2 to C6 haloalkenyloxy group” in R 1 of the formula (1) has the same definition as that described above, and preferably a 2-fluorovinyloxy group, a 2, 2-difluorovinyloxy group, a 3-fluoro It is an allyloxy group or a 3,3-difluoroallyloxy group, and more preferably a 2-fluorovinyloxy group or a 2,2-difluorovinyloxy group.
 式(1)のR1における「置換基Aで適宜置換されてもよいC3~C6のアルキニルオキシ基」のC3~C6のアルキニルオキシ基は、前記の定義と同義であり、好ましくは、プロパルギルオキシ基、2-ブチニルオキシ基、または3-ブチニルオキシ基であり、さらに好ましくは、プロパルギルオキシ基である。置換基Aを有する場合、C3~C6のアルキニルオキシ基における水素原子が、置換基Aによって任意に置換される。 The C3 to C6 alkynyloxy group of the “C3 to C6 alkynyloxy group optionally substituted with substituent A” in R 1 of Formula (1) has the same definition as described above, and preferably a propargyloxy group A 2-butynyloxy group or a 3-butynyloxy group, more preferably a propargyloxy group. When having a substituent A, the hydrogen atom in the C3-C6 alkynyloxy group is optionally substituted by the substituent A.
 式(1)のR1における「C3~C6のハロアルキニルオキシ基」とは、前記の定義と同義であり、好ましくは、4,4-ジフルオロ-2-ブチニルオキシ基、4-クロロ-4,4-ジフルオロ-2-ブチニルオキシ基、4-ブロモ-4,4-ジフルオロ-2-ブチニルオキシ基、または4,4,4-トリフルオロ-2-ブチニルオキシ基であり、さらに好ましくは、4,4-ジフルオロ-2-ブチニルオキシ基、または4,4,4-トリフルオロ-2-ブチニルオキシ基である。 The “C3-C6 haloalkynyloxy group” in R 1 of the formula (1) has the same meaning as the above-mentioned definition, preferably a 4,4-difluoro-2-butynyloxy group, 4-chloro-4, 4- It is a difluoro-2-butynyloxy group, a 4-bromo-4,4-difluoro-2-butynyloxy group, or a 4,4,4-trifluoro-2-butynyloxy group, more preferably 4,4-difluoro-2 Butynyloxy or a 4,4,4-trifluoro-2-butynyloxy group.
 式(1)のR1における「RaRbN-」(ここで、RaおよびRbは、それぞれ独立していて、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表すか、あるいはRaおよびRbは、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。)の各用語の定義は、前記の定義と同義である。なお、「置換基Bで適宜置換されてもよいC1~C6のアルキル基」に関しては、置換基Bを有する場合、C1~C6のアルキル基における水素原子が、置換基Bによって任意に置換される。「RaRbN-」として、好ましくは、アミノ基、メチルアミノ基、エチルアミノ基、(メトキシメチル)アミノ基、(2-メトキシエチル)アミノ基、(シアノメチル)アミノ基、(2-シアノエチル)アミノ基、ジメチルアミノ基、エチルメチルアミノ基、ジエチルアミノ基、(メトキシメチル)メチルアミノ基、(2-メトキシエチル)メチルアミノ基、(シアノメチル)メチルアミノ基、(2-シアノエチル)メチルアミノ基、2,2-ジフルオロエチルアミノ基、2,2,2-トリフルオロエチルアミノ基、シクロプロピルアミノ基、(シクロプロピル)メチルアミノ基、ピロリジニル基、およびピペリジニル基が挙げられ、さらに好ましくは、アミノ基、ジメチルアミノ基、エチルメチルアミノ基、およびジエチルアミノ基が挙げられる。 “RaRbN—” in R 1 of Formula (1) (where Ra and Rb are each independently a hydrogen atom, a C1-C6 alkyl group optionally substituted with a substituent B, C1-C6 Represents a haloalkyl group, or a C3 to C8 cycloalkyl group, or Ra and Rb together with the nitrogen atom to which it is attached is an aziridinyl group, azetidinyl group, pyrrolidinyl group, piperidinyl group, homopiperidinyl group, or azocanyl group The definitions of each of the terms) to be formed are as defined above. In the case of “a C1-C6 alkyl group optionally substituted with a substituent B”, when having a substituent B, the hydrogen atom in the C1-C6 alkyl group is optionally substituted by a substituent B . As "RaRbN-", preferably, amino group, methylamino group, ethylamino group, (methoxymethyl) amino group, (2-methoxyethyl) amino group, (cyanomethyl) amino group, (2-cyanoethyl) amino group, Dimethylamino, ethylmethylamino, diethylamino, (methoxymethyl) methylamino, (2-methoxyethyl) methylamino, (cyanomethyl) methylamino, (2-cyanoethyl) methylamino, 2, 2- Difluoroethylamino group, 2,2,2-trifluoroethylamino group, cyclopropylamino group, (cyclopropyl) methylamino group, pyrrolidinyl group, and piperidinyl group can be mentioned, and more preferably amino group, dimethylamino group , Ethylmethylamino and diethylamino groups It is.
 式(1)中のR2は、水素原子、ニトロ基、ハロゲン原子、置換基Aで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Aで適宜置換されてもよいC2~C6のアルケニル基、C2~C6のハロアルケニル基、置換基Aで適宜置換されてもよいC2~C6のアルキニル基、C2~C6のハロアルキニル基、置換基Aで適宜置換されてもよいC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、置換基Aで適宜置換されてもよいC3~C8のシクロアルコキシ基、置換基Aで適宜置換されてもよいC2~C6のアルケニルオキシ基、C2~C6のハロアルケニルオキシ基、置換基Aで適宜置換されてもよいC3~C6のアルキニルオキシ基、C3~C6のハロアルキニルオキシ基、Rc-L-(ここで、Rcは、C1~C6のアルキル基、またはC1~C6のハロアルキル基を表し、Lは、S、SO、またはSO2を表す。)、またはRdC(=O)-(ここで、Rdは、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表す。)を表す。 R 2 in the formula (1) is suitably substituted by a hydrogen atom, a nitro group, a halogen atom, a C 1 to C 6 alkyl group optionally substituted by a substituent A, a C 1 to C 6 haloalkyl group, a substituent A C3 to C8 cycloalkyl group, C2 to C6 alkenyl group optionally substituted with substituent A, C2 to C6 haloalkenyl group, C2 to C6 alkynyl optionally substituted with substituent A Group, a C2-C6 haloalkynyl group, a C1-C6 alkoxy group optionally substituted with a substituent A, a C1-C6 haloalkoxy group, a C3-C8 cyclo optionally substituted with a substituent A Alkoxy group, C2-C6 alkenyloxy group optionally substituted with substituent A, C2-C6 haloalkenyloxy group, C3-C6 alkynyl optionally substituted with substituent A An oxy group, a C3-C6 haloalkynyl oxy group, Rc-L- (wherein Rc represents a C1-C6 alkyl group, or a C1-C6 haloalkyl group, and L represents S, SO, or SO2; Or RdC (= O) — (wherein, R d is a C1-C6 alkyl group optionally substituted with a substituent B, a C1-C6 haloalkyl group, or a C3-C8 cycloalkyl group Represents the
 中でもR2は、水素原子、ハロゲン原子、置換基Aで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Aで適宜置換されてもよいC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、Rc-L-(ここで、RcおよびLは、前記と同義である。)、またはRdC(=O)-(ここで、Rdは、前記と同義である。)が好ましく、
 特にR2は、水素原子、ハロゲン原子、置換基Aで適宜置換されてもよいC1~C6のアルキル基、または置換基Aで適宜置換されてもよいC1~C6のアルコキシ基が好ましい。
Among them, R2 is a hydrogen atom, a halogen atom, a C1-C6 alkyl group optionally substituted with substituent A, a C1-C6 haloalkyl group, a C1-C6 alkoxy group optionally substituted with substituent A , C1-C6 haloalkoxy group, Rc-L- (wherein Rc and L are as defined above), or RdC (= O)-(wherein Rd is as defined above). Is preferred,
In particular, R2 is preferably a hydrogen atom, a halogen atom, a C1 to C6 alkyl group which may be optionally substituted with substituent A, or a C1 to C6 alkoxy group which may be optionally substituted with substituent A.
 式(1)のR2には、水素原子、およびニトロ基が含まれる。 R2 in the formula (1) includes a hydrogen atom and a nitro group.
 式(1)のR2におけるハロゲン原子は、前記の定義と同義であり、好ましくは、フッ素、塩素原子、臭素原子、またはヨウ素原子である。 The halogen atom in R 2 of the formula (1) is as defined above, preferably a fluorine, chlorine atom, bromine atom or iodine atom.
 式(1)のR2における「置換基Aで適宜置換されてもよいC1~C6のアルキル基」のC1~C6のアルキル基は、前記の定義と同義であり、好ましくは、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、またはイソブチル基であり、さらに好ましくは、メチル基、またはエチル基である。置換基Aを有する場合、C1~C6のアルキル基における水素原子が、置換基Aによって任意に置換される。 The C1-C6 alkyl group of the "C1-C6 alkyl group optionally substituted with substituent A" in R2 of the formula (1) has the same meaning as defined above, preferably a methyl group or an ethyl group A propyl group, an isopropyl group, a butyl group or an isobutyl group, and more preferably a methyl group or an ethyl group. When having a substituent A, the hydrogen atom in the C1-C6 alkyl group is optionally substituted by the substituent A.
 式(1)のR2における「C1~C6のハロアルキル基」は、前記の定義と同義であり、好ましくは、ジフルオロメチル基、トリフルオロメチル基、2,2-ジフルオロエチル基、2,2,2-トリフルオロエチル基、3,3-ジフルオロプロピル基、または3,3,3-トリフルオロプロピル基であり、さらに好ましくは、ジフルオロメチル基、トリフルオロメチル基、2,2-ジフルオロエチル基、または2,2,2-トリフルオロエチル基である。 The “C1 to C6 haloalkyl group” in R 2 of the formula (1) is as defined above, preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, or 2,2,2 -Trifluoroethyl group, 3,3-difluoropropyl group, or 3,3,3-trifluoropropyl group, more preferably difluoromethyl group, trifluoromethyl group, 2,2-difluoroethyl group, or 2,2,2-trifluoroethyl group.
 式(1)のR2における「置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基」のC3~C8のシクロアルキル基は、前記の定義と同義であり、好ましくは、シクロプロピル基、シクロブチル基、シクロペンチル基、またはシクロヘキシル基であり、さらに好ましくは、シクロプロピル基、またはシクロブチル基である。置換基Aを有する場合、C3~C8のシクロアルキル基における水素原子が、置換基Aによって任意に置換される。 The C3 to C8 cycloalkyl group of the "C3 to C8 cycloalkyl group optionally substituted with substituent A" in R2 of the formula (1) has the same definition as described above, and preferably a cyclopropyl group A cyclobutyl group, a cyclopentyl group or a cyclohexyl group, more preferably a cyclopropyl group or a cyclobutyl group. When having a substituent A, the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent A.
 式(1)のR2における「置換基Aで適宜置換されてもよいC2~C6のアルケニル基」のC2~C6のアルケニル基は、前記の定義と同義であり、好ましくは、ビニル基、1-プロペニル基、アリル基、1-ブテニル基、2-ブテニル基、または3-ブテニル基であり、さらに好ましくは、ビニル基、1-プロペニル基、またはアリル基である。置換基Aを有する場合、C2~C6のアルケニル基における水素原子が、置換基Aによって任意に置換される。 The C2-C6 alkenyl group of the "C2-C6 alkenyl group optionally substituted with substituent A" in R2 of the formula (1) has the same meaning as defined above, preferably a vinyl group, 1- Propenyl group, allyl group, 1-butenyl group, 2-butenyl group, or 3-butenyl group, more preferably vinyl group, 1-propenyl group or allyl group. When having a substituent A, a hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent A.
 式(1)のR2における「C2~C6のハロアルケニル基」は、前記の定義と同義であり、好ましくは、2-フルオロビニル基、2,2-ジフルオロビニル基、2,2-ジクロロビニル基、3-フルオロアリル基、3,3-ジフルオロアリル基、または3,3-ジクロロアリル基であり、さらに好ましくは、2-フルオロビニル基、または2,2-ジフルオロビニル基である。 The “C2 to C6 haloalkenyl group” in R 2 of the formula (1) is as defined above, preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group or a 2,2-dichlorovinyl group And 3-fluoroallyl, 3,3-difluoroallyl or 3,3-dichloroallyl, more preferably 2-fluorovinyl or 2,2-difluorovinyl.
 式(1)のR2における「置換基Aで適宜置換されてもよいC2~C6のアルキニル基」のC2~C6のアルキニル基は、前記の定義と同義であり、好ましくは、エチニル基、1-プロピニル基、プロパルギル基、1-ブチニル基、2-ブチニル基、または3-ブチニル基であり、さらに好ましくは、エチニル基、1-プロピニル基、またはプロパルギル基である。置換基Aを有する場合、C2~C6のアルキニル基における水素原子が、置換基Aによって任意に置換される。 The C2 to C6 alkynyl group of the “C2 to C6 alkynyl group optionally substituted with substituent A” in R 2 of the formula (1) has the same definition as described above, preferably an ethynyl group, 1- Propynyl group, propargyl group, 1-butynyl group, 2-butynyl group or 3-butynyl group is preferable, and ethynyl group, 1-propynyl group or propargyl group is more preferable. When having a substituent A, the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent A.
 式(1)のR2における「C2~C6のハロアルキニル基」は、前記の定義と同義であり、好ましくは、3,3-ジフルオロ-1-プロピニル基、3,3,3-トリフルオロ-1-プロピニル基、4,4-ジフルオロ-1-ブチニル基、4,4-ジフルオロ-2-ブチニル基、4,4,4-トリフルオロ-1-ブチニル基、または4,4,4-トリフルオロ-2-ブチニル基であり、さらに好ましくは、3,3-ジフルオロ-1-プロピニル基、または3,3,3-トリフルオロ-1-プロピニル基である。 The “C2-C6 haloalkynyl group” in R 2 of the formula (1) is as defined above, preferably a 3,3-difluoro-1-propynyl group, 3,3,3-trifluoro-1 -Propynyl group, 4,4-difluoro-1-butynyl group, 4,4-difluoro-2-butynyl group, 4,4,4-trifluoro-1-butynyl group, or 4,4,4-trifluoro- 2-butynyl group, more preferably 3,3-difluoro-1-propynyl group or 3,3,3-trifluoro-1-propynyl group.
 式(1)のR2における「置換基Aで適宜置換されてもよいC1~C6のアルコキシ基」のC1~C6のアルコキシ基は、前記の定義と同義であり、好ましくは、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、またはイソブトキシ基であり、さらに好ましくは、メトキシ基、エトキシ基、プロピルオキシ基、またはイソプロピルオキシ基である。置換基Aを有する場合、C1~C6のアルコキシ基における水素原子が、置換基Aによって任意に置換される。 The C1-C6 alkoxy group of the "C1-C6 alkoxy group optionally substituted with substituent A" in R2 of Formula (1) has the same definition as that described above, preferably a methoxy group or an ethoxy group A propyloxy group, an isopropyloxy group, a butoxy group or an isobutoxy group, and more preferably a methoxy group, an ethoxy group, a propyloxy group or an isopropyloxy group. When having a substituent A, the hydrogen atom in the C1-C6 alkoxy group is optionally substituted by the substituent A.
 式(1)のR2における「C1~C6のハロアルコキシ基」は、前記の定義と同義であり、好ましくは、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、3,3-ジフルオロプロピルオキシ基、または3,3,3-トリフルオロプロピルオキシ基であり、さらに好ましくは、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、または2,2,2-トリフルオロエトキシ基である。 The “C1 to C6 haloalkoxy group” in R 2 of the formula (1) is as defined above, preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2, 2-trifluoroethoxy group, 3,3-difluoropropyloxy group, or 3,3,3-trifluoropropyloxy group, more preferably difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group A group or a 2,2,2-trifluoroethoxy group.
 式(1)のR2における「置換基Aで適宜置換されてもよいC3~C8のシクロアルコキシ基」のC3~C8のシクロアルコキシ基は、前記の定義と同義であり、好ましくは、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、またはシクロヘキシルオキシ基であり、さらに好ましくは、シクロプロピルオキシ基、またはシクロブトキシ基である。置換基Aを有する場合、C3~C8のシクロアルコキシ基における水素原子が、置換基Aによって任意に置換される。 The C3-C8 cycloalkoxy group of the "C3-C8 cycloalkoxy group which may be optionally substituted with substituent A" in R2 of the formula (1) has the same definition as described above, preferably, cyclopropyloxy A cyclobutoxy group, a cyclopentyloxy group or a cyclohexyloxy group, more preferably a cyclopropyloxy group or a cyclobutoxy group. When having a substituent A, the hydrogen atom in the C3-C8 cycloalkoxy group is optionally substituted by the substituent A.
 式(1)のR2における「置換基Aで適宜置換されてもよいC2~C6のアルケニルオキシ基」のC2~C6のアルケニルオキシ基は、前記の定義と同義であり、好ましくは、ビニルオキシ基、1-プロペニルオキシ基、アリルオキシ基、1-ブテニルオキシ基、2-ブテニルオキシ基、または3-ブテニルオキシ基であり、さらに好ましくは、ビニルオキシ基、1-プロペニルオキシ基、またはアリルオキシ基である。置換基Aを有する場合、C2~C6のアルケニルオキシ基における水素原子が、置換基Aによって任意に置換される。 The C2-C6 alkenyloxy group of the "C2-C6 alkenyloxy group optionally substituted with substituent A" in R2 of Formula (1) has the same definition as that described above, and preferably a vinyloxy group, 1-propenyloxy group, allyloxy group, 1-butenyloxy group, 2-butenyloxy group, or 3-butenyloxy group, more preferably vinyloxy group, 1-propenyloxy group, or allyloxy group. When having a substituent A, the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted by the substituent A.
 式(1)のR2における「C2~C6のハロアルケニルオキシ基」は、前記の定義と同義であり、2-フルオロビニルオキシ基、2,2-ジフルオロビニルオキシ基、2,2-ジクロロビニルオキシ基、3-フルオロアリルオキシ基、3,3-ジフルオロアリルオキシ基、または3,3-ジクロロアリルオキシ基であり、さらに好ましくは、2-フルオロビニルオキシ基、または2,2-ジフルオロビニルオキシ基である。 The “C2 to C6 haloalkenyloxy group” in R 2 of the formula (1) is as defined above, and is a 2-fluorovinyloxy group, a 2,2-difluorovinyloxy group, a 2,2-dichlorovinyloxy group Group, 3-fluoroallyloxy group, 3,3-difluoroallyloxy group, or 3,3-dichloroallyloxy group, more preferably 2-fluorovinyloxy group or 2,2-difluorovinyloxy group It is.
 式(1)のR2における「置換基Aで適宜置換されてもよいC3~C6のアルキニルオキシ基」のC3~C6のアルキニルオキシ基は、前記の定義と同義であり、好ましくは、プロパルギルオキシ基、2-ブチニルオキシ基、または3-ブチニルオキシ基であり、さらに好ましくは、プロパルギルオキシ基である。置換基Aを有する場合、C3~C6のアルキニルオキシ基における水素原子が、置換基Aによって任意に置換される。 The C3 to C6 alkynyloxy group of the “C3 to C6 alkynyloxy group optionally substituted with substituent A” in R 2 of Formula (1) has the same definition as that described above, and preferably a propargyloxy group A 2-butynyloxy group or a 3-butynyloxy group, more preferably a propargyloxy group. When having a substituent A, the hydrogen atom in the C3-C6 alkynyloxy group is optionally substituted by the substituent A.
 式(1)のR2における「C3~C6のハロアルキニルオキシ基」は、前記の定義と同義であり、好ましくは、4,4-ジフルオロ-2-ブチニルオキシ基、4-クロロ-4,4-ジフルオロ-2-ブチニルオキシ基、4-ブロモ-4,4-ジフルオロ-2-ブチニルオキシ基、または4,4,4-トリフルオロ-2-ブチニルオキシ基であり、さらに好ましくは、4,4-ジフルオロ-2-ブチニルオキシ基、または4,4,4-トリフルオロ-2-ブチニルオキシ基である。 The “C3-C6 haloalkynyloxy group” in R 2 of the formula (1) is as defined above, preferably a 4,4-difluoro-2-butynyloxy group, 4-chloro-4,4-difluoro -2-butynyloxy group, 4-bromo-4,4-difluoro-2-butynyloxy group, or 4,4,4-trifluoro-2-butynyloxy group, more preferably 4,4-difluoro-2- It is a butynyloxy group or a 4,4,4-trifluoro-2-butynyloxy group.
 式(1)のR2における「Rc-L-」(ここで、Rcは、C1~C6のアルキル基またはC1~C6のハロアルキル基を表し、Lは、S、SO、またはSO2を表す。)の各用語は、前記の定義と同義である。「Rc-L-」として、好ましくは、メチルチオ基、メタンスルフィニル基、メタンスルホニル基、トリフルオロメチルチオ基、トリフルオロメタンスルフィニル基、またはトリフルオロメタンスルホニル基であり、さらに好ましくは、メチルチオ基、メタンスルフィニル基、またはメタンスルホニル基である。 “Rc-L-” (wherein Rc represents a C1-C6 alkyl group or a C1-C6 haloalkyl group, and L represents S, SO, or SO 2) in R 2 of Formula (1) Each term is as defined above. Preferred as "Rc-L-" is a methylthio group, a methanesulfinyl group, a methanesulfonyl group, a trifluoromethylthio group, a trifluoromethanesulfinyl group, or a trifluoromethanesulfonyl group, and more preferably a methylthio group, a methanesulfinyl group Or a methanesulfonyl group.
 式(1)のR2における「RdC(=O)-」(ここで、Rdは、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表す。)の各用語は、前記の定義と同義である。なお、「置換基Bで適宜置換されてもよいC1~C6のアルキル基」に関しては、置換基Bを有する場合、C1~C6のアルキル基における水素原子が、置換基Bによって任意に置換される。「RdC(=O)-」として、好ましくは、アセチル基、メトキシアセチル基、シアノアセチル基、プロピオニル基、ジフルオロアセチル基、トリフルオロアセチル基、またはシクロプロパンカルボニル基であり、さらに好ましくは、アセチル基、メトキシアセチル基、シアノアセチル基、プロピオニル基、ジフルオロアセチル基、トリフルオロアセチル基である。 “RdC (= O) —” in R 2 of Formula (1) (wherein R d is a C1-C6 alkyl group optionally substituted with a substituent B, a C1-C6 haloalkyl group, or C3-C8 And each term of the cycloalkyl group represented by is as defined above. In the case of “a C1-C6 alkyl group optionally substituted with a substituent B”, when having a substituent B, the hydrogen atom in the C1-C6 alkyl group is optionally substituted by a substituent B . As "RdC (= O)-", preferred is an acetyl group, a methoxyacetyl group, a cyanoacetyl group, a propionyl group, a difluoroacetyl group, a trifluoroacetyl group, or a cyclopropane carbonyl group, and more preferably an acetyl group. Methoxyacetyl group, cyanoacetyl group, propionyl group, difluoroacetyl group, trifluoroacetyl group.
 式(1)のXは、酸素原子、または硫黄原子を表す。好ましいXは、酸素原子である。
 式(1)のYは、R3で適宜0~7置換されてもよいアリール基(ただし、2置換以上のR3の場合、それぞれ独立している。)、またはR3で適宜0~4置換されてもよいヘテロアリール基(ただし、2置換以上のR3の場合、それぞれ独立している)を表す。  中でもYは、R3で適宜0~5置換されてもよいフェニル基(ただし、2置換以上のR3の場合、それぞれ独立している。)、R3で適宜0~4置換されてもよいピリジル基(ただし、2置換以上のR3の場合、それぞれ独立している。)、R3で適宜0~3置換されてもよいピリダジニル基、ピリミジニル基、もしくはピラジニル基(ただし、2置換以上のR3の場合、それぞれ独立している。)、R3で適宜0~2置換されてもよいトリアジニル基(ただし、2置換のR3の場合、それぞれ独立している。)、またはR3で適宜置換されてもよいテトラジニル基が好ましく、
 さらにYは、R3で適宜0~5置換されてもよいフェニル基(ただし、2置換以上のR3の場合、それぞれ独立している。)、またはR3で適宜0~4置換されてもよいピリジル基(ただし、2置換以上のR3の場合、それぞれ独立している。)が好ましく、
 特にYは、R3で適宜0~5置換されてもよいフェニル基(ただし、2置換以上のR3の場合、それぞれ独立している。)が好ましい。
X of Formula (1) represents an oxygen atom or a sulfur atom. Preferred X is an oxygen atom.
Y in the formula (1) is an aryl group which may be optionally substituted 0 to 7 with R 3 (provided that R 3 is 2 or more, each of which is independent of each other) or 0 to 4 as appropriate substituted with R 3 And each represents a heteroaryl group (in the case of R3 having 2 or more substituents, each of which is independent of one another). Among them, Y is a phenyl group which may be optionally substituted 0 to 5 with R 3 (provided that they are each independently in the case of R 3 having 2 or more substituents) and a pyridyl group which may be optionally substituted 0 to 4 with R 3 ( However, in the case of R 3 of 2 or more substitution, they are each independently), pyridazinyl group optionally substituted by 0 to 3 with R 3, pyrimidinyl group, or pyrazinyl group (in the case of R 3 of 2 or more substitution, respectively) And triazinyl groups which may be optionally substituted 0 to 2 with R 3 (provided that they are each independently in the case of R 3 being disubstituted) or tetrazinyl group which may be optionally substituted with R 3 Preferably
Furthermore, Y is a phenyl group which may be optionally substituted 0 to 5 with R 3 (provided that they are each independently in the case of R 3 having 2 or more substituents), or a pyridyl group which may be optionally substituted 0 to 4 with R 3 (However, in the case of R3 with 2 or more substituents, they are each independently.) Is preferable,
In particular, Y is preferably a phenyl group which may be optionally substituted 0 to 5 with R 3 (however, in the case of R 3 having 2 or more substituents, they are each independently).
 式(1)のYにおける「R3で適宜0~5置換されてもよいフェニル基」(ただし、2置換以上のR3の場合、それぞれ独立している。)は、式(a)で表される下記に示した部分構造を表す。
Figure JPOXMLDOC01-appb-C000004
The “phenyl group which may be optionally substituted by 0 to 5 with R 3” in Y of the formula (1) (wherein each R 3 having two or more substituents is independent of each other) is represented by the formula (a) It represents the partial structure shown below.
Figure JPOXMLDOC01-appb-C000004
 式(a)中、maは0~5の整数を表し、maが2以上の場合、2置換以上のR3はそれぞれ独立した置換基を表し、同一もしくは異なっていてよく、任意に選択することができる。 In formula (a), ma represents an integer of 0 to 5, and when ma is 2 or more, R 3 s of 2 or more substitutions represent independent substituents, which may be the same or different and may be selected arbitrarily it can.
 式(1)のYにおける「R3で適宜0~4置換されてもよいピリジル基」(ただし、2置換以上のR3の場合、それぞれ独立している。)は、式(b-1)、式(b-2)および式(b-3)で表される下記に示した部分構造を表す。
Figure JPOXMLDOC01-appb-C000005
The “pyridyl group which may be optionally substituted by 0 to 4 with R 3” in Y of the formula (1) (wherein each R 3 having two or more substituents is independent of each other) has a formula (b-1), a formula The partial structure shown below with (b-2) and Formula (b-3) is represented.
Figure JPOXMLDOC01-appb-C000005
 式(b-1)、式(b-2)および式(b-3)中、mbは0~4の整数を表し、mbが2以上の場合、2置換以上のR3はそれぞれ独立した置換基を表し、同一もしくは異なっていてよく、任意に選択することができる。 In formulas (b-1), (b-2) and (b-3), mb represents an integer of 0 to 4, and in the case where mb is 2 or more, two or more substituted R3's are independent substituents. And may be the same or different and can be arbitrarily selected.
 式(1)のYにおける「R3で適宜0~3置換されてもよいピリダジニル基」(ただし、2置換以上のR3の場合、それぞれ独立している。)は、式(c-1)、式(c-2)および式(c-3)で表される下記に示した部分構造を表す。
Figure JPOXMLDOC01-appb-C000006
The “pyridazinyl group which may be optionally substituted 0 to 3 with R 3” in Y of the formula (1) (provided that R 3 s each having 2 or more substituents are independent of each other) has a formula (c-1), a formula The partial structure shown below with (c-2) and Formula (c-3) is represented.
Figure JPOXMLDOC01-appb-C000006
 式(c-1)、式(c-2)および式(c-3)中、mcは0~3の整数を表し、mcが2以上の場合、2置換以上のR3はそれぞれ独立した置換基を表し、同一もしくは異なっていてよく、任意に選択することができる。 In formulas (c-1), (c-2) and (c-3), mc represents an integer of 0 to 3, and when mc is 2 or more, two or more substituted R3's are independent substituents. And may be the same or different and can be arbitrarily selected.
 式(1)のYにおける「R3で適宜0~3置換されてもよいピリミジニル基」(ただし、2置換以上のR3の場合、それぞれ独立している。)は、式(d-1)、式(d-2)および式(d-3)で表される下記に示した部分構造を表す。
Figure JPOXMLDOC01-appb-C000007
The “pyrimidinyl group which may be optionally substituted 0 to 3 with R 3” in Y of the formula (1) (but each of R 3 s having 2 or more substituents is independent of each other) has a formula (d-1), a formula The partial structure shown below with (d-2) and Formula (d-3) is represented.
Figure JPOXMLDOC01-appb-C000007
 式(d-1)、式(d-2)および式(d-3)中、mdは0~3の整数を表し、mdが2以上の場合、2置換以上のR3はそれぞれ独立した置換基を表し、同一もしくは異なっていてよく、任意に選択することができる。 In formulas (d-1), (d-2) and (d-3), md represents an integer of 0 to 3, and when md is 2 or more, two or more substituted R3's are independent substituents. And may be the same or different and can be arbitrarily selected.
 式(1)のYにおける「R3で適宜0~3置換されてもよいピラジニル基(ただし、2置換以上のR3の場合、それぞれ独立している。)」は、式(e)で表される下記に示した部分構造を表す。
Figure JPOXMLDOC01-appb-C000008
The “pyrazinyl group optionally substituted by 0 to 3 with R 3 (wherein each R 3 is 2 or more substituents, each independently)” in Y of Formula (1) is represented by Formula (e) It represents the partial structure shown below.
Figure JPOXMLDOC01-appb-C000008
 式(e)中、meは0~3の整数を表し、meが2以上の場合、2置換以上のR3はそれぞれ独立した置換基を表し、同一もしくは異なっていてよく、任意に選択することができる。 In formula (e), me represents an integer of 0 to 3, and when me is 2 or more, two or more substituted R 3 s independently represent an independent substituent, which may be the same or different and may be selected arbitrarily it can.
 式(1)のYにおける「R3で適宜0~2置換されてもよいトリアジニル基」(ただし、2置換のR3の場合、それぞれ独立している。)は、式(f-1)、式(f-2)、式(f-3)、式(f-4)および式(f-5)で表される下記に示した部分構造を表す。
Figure JPOXMLDOC01-appb-C000009
The “triazinyl group optionally substituted with 0 to 2 R 3 as appropriate” in Y of the formula (1) (but in the case of disubstituted R 3, each of which is independent of each other) has a formula (f-1) or a formula The partial structure shown below represented by f-2), Formula (f-3), Formula (f-4), and Formula (f-5) is represented.
Figure JPOXMLDOC01-appb-C000009
 式(f-1)、式(f-2)、式(f-3)、式(f-4)および式(f-5)中、mfは0~2の整数を表し、mfが2の場合、2置換のR3はそれぞれ独立した置換基を表し、同一もしくは異なっていてよく、任意に選択することができる。 In formulas (f-1), (f-2), (f-3), (f-4) and (f-5), mf represents an integer of 0 to 2, and mf is 2 In the case, each disubstituted R 3 represents an independent substituent, which may be the same or different, and can be optionally selected.
 式(1)のYにおける「R3で適宜置換されてもよいテトラジニル基」は、式(g-1)、式(g-2)および式(g-3)で表される下記に示した部分構造を表す。
Figure JPOXMLDOC01-appb-C000010
The “tetradinyl group which may be optionally substituted with R 3” in Y of the formula (1) is a moiety represented by the following formulas (g-1), (g-2) and (g-3) Represents a structure.
Figure JPOXMLDOC01-appb-C000010
 式(g-1)、式(g-2)および式(g-3)中、mgは0~1の整数を表す。 In formulas (g-1), (g-2) and (g-3), mg represents an integer of 0 to 1.
 式(1)中のR3は、水酸基、シアノ基、ニトロ基、ハロゲン原子、置換基Cで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Cで適宜置換されてもよいC2~C6のアルケニル基、C2~C6のハロアルケニル基、置換基Cで適宜置換されてもよいC2~C6のアルキニル基、C2~C6のハロアルキニル基、置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、置換基Cで適宜置換されてもよいC3~C8のシクロアルコキシ基、置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、C2~C6のハロアルケニルオキシ基、置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、C3~C6のハロアルキニルオキシ基、RaRbN-(ここで、RaおよびRbは、前記と同義である。)、Rc-L-(ここで、RcおよびLは、前記と同義である。)、Rx1C(=O)-(ここで、Rx1は、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはRaRbN-(ここで、RaおよびRbは前記と同義である。)を表す。)、またはRx1C(=O)O-(ここで、Rx1は、前記と同義である。)を表す。 R3 in the formula (1) is optionally substituted with a hydroxyl group, a cyano group, a nitro group, a halogen atom, a C1 to C6 alkyl group optionally substituted with a substituent C, a C1 to C6 haloalkyl group, a substituent C C3-C8 cycloalkyl group which may be substituted, C2-C6 alkenyl group optionally substituted with substituent C, C2-C6 haloalkenyl group, C2-C6 optionally substituted with substituent C C 2 -C 6 haloalkynyl group, C 1 -C 6 alkoxy group optionally substituted with substituent C, C 1-C 6 haloalkoxy group, C 3 -C 8 optionally substituted with substituent C Of C2 to C6 alkenyloxy group optionally substituted with substituent C, C2 to C6 haloalkenyloxy group, C3 to C6 optionally substituted with substituent C A luminyloxy group, a C3-C6 haloalkynyl oxy group, RaRbN- (wherein Ra and Rb are as defined above), Rc-L- (where Rc and L are as defined above). ) Rx1C (= O)-(wherein, Rx1 is a C1-C6 alkyl group optionally substituted with a substituent B, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, C1-C6 Or an alkoxy group of C1 to C6, a haloalkoxy group of C1 to C6, a cycloalkoxy group of C3 to C8, or RaRbN- (wherein, Ra and Rb are as defined above), or Rx1C (OO) O. -(Here, Rx1 is the same as the above).
 中でもR3は、水酸基、シアノ基、ハロゲン原子、置換基Cで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、C2~C6のハロアルケニルオキシ基、置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、C3~C6のハロアルキニルオキシ基、またはRx1C(=O)O-(ここで、Rx1は、前記と同義である。)が好ましく、
 特にR3は、水酸基、シアノ基、ハロゲン原子、置換基Cで適宜置換されてもよいC1~C6のアルキル基、置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、またはRx1C(=O)O-(ここで、Rx1は、前記と同義である。)が好ましい。
Among them, R 3 is a hydroxyl group, a cyano group, a halogen atom, a C 1 to C 6 alkyl group optionally substituted with substituent C, a C 1 to C 6 haloalkyl group, C 1 to C 6 optionally substituted with substituent C Alkoxy group, C1-C6 haloalkoxy group, C2-C6 alkenyloxy group optionally substituted with substituent C, C2-C6 haloalkenyloxy group, C3-C6 optionally substituted with substituent C A C6 alkynyloxy group, a C3 to C6 haloalkynyloxy group, or Rx1C (= O) O— (wherein Rx1 is as defined above) is preferable,
Particularly, R3 is a hydroxyl group, a cyano group, a halogen atom, a C1 to C6 alkyl group optionally substituted with substituent C, a C1 to C6 alkoxy group optionally substituted with substituent C, a substituent C C2-C6 alkenyloxy group which may be optionally substituted, C3-C6 alkynyloxy group which may be optionally substituted with substituent C, or Rx1C (= O) O- (wherein Rx1 is as defined above) Is preferred.
 式(1)のR3には、水酸基、シアノ基、およびニトロ基が含まれる。 R 3 in the formula (1) includes a hydroxyl group, a cyano group and a nitro group.
 式(1)のR3におけるハロゲン原子は、前記の定義と同義であり、好ましくはフッ素原子、塩素原子、臭素原子、またはヨウ素原子である。 The halogen atom in R 3 of the formula (1) is as defined above, and is preferably a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.
 式(1)のR3における「置換基Cで適宜置換されてもよいC1~C6のアルキル基」のC1~C6のアルキル基は、前記の定義と同義であり、好ましくは、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、またはイソブチル基であり、さらに好ましくは、メチル基、エチル基、プロピル基、またはイソプロピル基である。置換基Cを有する場合、C1~C6のアルキル基における水素原子が、置換基Cによって任意に置換される。 The C1-C6 alkyl group of the "C1-C6 alkyl group optionally substituted with substituent C" in R3 of the formula (1) has the same meaning as defined above, preferably a methyl group or an ethyl group A propyl group, an isopropyl group, a butyl group or an isobutyl group, and more preferably a methyl group, an ethyl group, a propyl group or an isopropyl group. When having a substituent C, the hydrogen atom in the C1-C6 alkyl group is optionally substituted by the substituent C.
 式(1)のR3における「C1~C6のハロアルキル基」は、前記の定義と同義であり、好ましくは、ジフルオロメチル基、トリフルオロメチル基、2,2-ジフルオロエチル基、2,2,2-トリフルオロエチル基、3,3-ジフルオロプロピル基、または3,3,3-トリフルオロプロピル基であり、さらに好ましくは、ジフルオロメチル基、トリフルオロメチル基、2,2-ジフルオロエチル基、または2,2,2-トリフルオロエチル基である。 The “C1 to C6 haloalkyl group” in R 3 of the formula (1) is as defined above, preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, 2,2,2 -Trifluoroethyl group, 3,3-difluoropropyl group, or 3,3,3-trifluoropropyl group, more preferably difluoromethyl group, trifluoromethyl group, 2,2-difluoroethyl group, or 2,2,2-trifluoroethyl group.
 式(1)のR3における「置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基」のC3~C8のシクロアルキル基は、前記の定義と同義であり、好ましくは、シクロプロピル基、シクロブチル基、シクロペンチル基、またはシクロヘキシル基であり、さらに好ましくは、シクロプロピル基、またはシクロブチル基である。置換基Cを有する場合、C3~C8のシクロアルキル基における水素原子が、置換基Cによって任意に置換される。 The C3 to C8 cycloalkyl group of the "C3 to C8 cycloalkyl group optionally substituted with substituent C" in R3 of Formula (1) has the same definition as that described above, and preferably a cyclopropyl group A cyclobutyl group, a cyclopentyl group or a cyclohexyl group, more preferably a cyclopropyl group or a cyclobutyl group. When having a substituent C, the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent C.
 式(1)のR3における「置換基Cで適宜置換されてもよいC2~C6のアルケニル基」のC2~C6のアルケニル基は、前記の定義と同義であり、好ましくは、ビニル基、1-プロペニル基、アリル基、1-ブテニル基、2-ブテニル基、または3-ブテニル基であり、さらに好ましくは、ビニル基、1-プロペニル基、またはアリル基である。置換基Cを有する場合、C2~C6のアルケニル基における水素原子が、置換基Cによって任意に置換される。 The C2-C6 alkenyl group of the "C2-C6 alkenyl group which may be optionally substituted with substituent C" in R3 of Formula (1) has the same meaning as defined above, preferably a vinyl group, 1- Propenyl group, allyl group, 1-butenyl group, 2-butenyl group, or 3-butenyl group, more preferably vinyl group, 1-propenyl group or allyl group. When having a substituent C, the hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent C.
 式(1)のR3における「C2~C6のハロアルケニル基」は、前記の定義と同義であり、好ましくは、2-フルオロビニル基、2,2-ジフルオロビニル基、2,2-ジクロロビニル基、3-フルオロアリル基、3,3-ジフルオロアリル基、または3,3-ジクロロアリル基であり、さらに好ましくは、2-フルオロビニル基、または2,2-ジフルオロビニル基である。 The “C2 to C6 haloalkenyl group” in R 3 of the formula (1) is as defined above, preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group or a 2,2-dichlorovinyl group And 3-fluoroallyl, 3,3-difluoroallyl or 3,3-dichloroallyl, more preferably 2-fluorovinyl or 2,2-difluorovinyl.
 式(1)のR3における「置換基Cで適宜置換されてもよいC2~C6のアルキニル基」のC2~C6のアルキニル基は、前記の定義と同義であり、好ましくは、エチニル基、1-プロピニル基、プロパルギル基、1-ブチニル基、2-ブチニル基、または3-ブチニル基であり、さらに好ましくは、エチニル基、1-プロピニル基、またはプロパルギル基である。置換基Cを有する場合、C2~C6のアルキニル基における水素原子が、置換基Cによって任意に置換される。 The C2 to C6 alkynyl group of the “C2 to C6 alkynyl group optionally substituted with substituent C” in R 3 of the formula (1) has the same definition as described above, preferably an ethynyl group, 1— Propynyl group, propargyl group, 1-butynyl group, 2-butynyl group or 3-butynyl group is preferable, and ethynyl group, 1-propynyl group or propargyl group is more preferable. When having a substituent C, the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent C.
 式(1)のR3における「C2~C6のハロアルキニル基」は、前記の定義と同義であり、好ましくは、3,3-ジフルオロ-1-プロピニル基、3,3,3-トリフルオロ-1-プロピニル基、4,4-ジフルオロ-1-ブチニル基、4,4-ジフルオロ-2-ブチニル基、4,4,4-トリフルオロ-1-ブチニル基、または4,4,4-トリフルオロ-2-ブチニル基であり、さらに好ましくは、3,3-ジフルオロ-1-プロピニル基、または3,3,3-トリフルオロ-1-プロピニル基である。 The “C2-C6 haloalkynyl group” in R 3 of the formula (1) is as defined above, preferably a 3,3-difluoro-1-propynyl group, 3,3,3-trifluoro-1 -Propynyl group, 4,4-difluoro-1-butynyl group, 4,4-difluoro-2-butynyl group, 4,4,4-trifluoro-1-butynyl group, or 4,4,4-trifluoro- 2-butynyl group, more preferably 3,3-difluoro-1-propynyl group or 3,3,3-trifluoro-1-propynyl group.
 式(1)のR3における「置換基Cで適宜置換されてもよいC1~C6のアルコキシ基」のC1~C6のアルコキシ基は、前記の定義と同義であり、好ましくは、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、イソブトキシ基、またはペンチルオキシ基であり、さらに好ましくは、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、またはブトキシ基である。置換基Cを有する場合、C1~C6のアルコキシ基における水素原子が、置換基Cによって任意に置換される。 The C1-C6 alkoxy group of the "C1-C6 alkoxy group optionally substituted with substituent C" in R3 of Formula (1) has the same definition as that described above, preferably a methoxy group or an ethoxy group A propyloxy group, an isopropyloxy group, a butoxy group, an isobutoxy group or a pentyloxy group, and more preferably a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group or a butoxy group. When having a substituent C, a hydrogen atom in the C1 to C6 alkoxy group is optionally substituted by the substituent C.
 式(1)のR3における「C1~C6のハロアルコキシ基」は、前記の定義と同義であり、好ましくは、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、3,3-ジフルオロプロピルオキシ基、または3,3,3-トリフルオロプロピルオキシ基であり、さらに好ましくは、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、または2,2,2-トリフルオロエトキシ基である。 The “C1 to C6 haloalkoxy group” in R 3 of the formula (1) is as defined above, preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2, 2-trifluoroethoxy group, 3,3-difluoropropyloxy group, or 3,3,3-trifluoropropyloxy group, more preferably difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group A group or a 2,2,2-trifluoroethoxy group.
 式(1)のR3における「置換基Cで適宜置換されてもよいC3~C8のシクロアルコキシ基」のC3~C8のシクロアルコキシ基は、前記の定義と同義であり、好ましくは、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、またはシクロヘキシルオキシ基であり、さらに好ましくは、シクロプロピルオキシ基、またはシクロブトキシ基である。置換基Cを有する場合、C3~C8のシクロアルコキシ基における水素原子が、置換基Cによって任意に置換される。 The C3 to C8 cycloalkoxy group of the "C3 to C8 cycloalkoxy group optionally substituted with substituent C" in R3 of the formula (1) has the same definition as that described above, preferably, cyclopropyloxy A cyclobutoxy group, a cyclopentyloxy group or a cyclohexyloxy group, more preferably a cyclopropyloxy group or a cyclobutoxy group. When having a substituent C, the hydrogen atom in the C3-C8 cycloalkoxy group is optionally substituted by the substituent C.
 式(1)のR3における「置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基」のC2~C6のアルケニルオキシ基は、前記の定義と同義であり、好ましくは、ビニルオキシ基、1-プロペニルオキシ基、アリルオキシ基、1-ブテニルオキシ基、2-ブテニルオキシ基、または3-ブテニルオキシ基であり、さらに好ましくは、ビニルオキシ基、1-プロペニルオキシ基、またはアリルオキシ基である。置換基Cを有する場合、C2~C6のアルケニルオキシ基における水素原子が、置換基Cによって任意に置換される。 The C2-C6 alkenyloxy group of the "C2-C6 alkenyloxy group which may be optionally substituted with substituent C" in R3 of Formula (1) has the same definition as described above, and preferably a vinyloxy group, 1-propenyloxy group, allyloxy group, 1-butenyloxy group, 2-butenyloxy group, or 3-butenyloxy group, more preferably vinyloxy group, 1-propenyloxy group, or allyloxy group. When having a substituent C, the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted by the substituent C.
 式(1)のR3における「C2~C6のハロアルケニルオキシ基」は、前記の定義と同義であり、好ましくは、2-フルオロビニルオキシ基、2,2-ジフルオロビニルオキシ基、2,2-ジクロロビニルオキシ基、3-フルオロアリルオキシ基、3,3-ジフルオロアリルオキシ基、または3,3-ジクロロアリルオキシ基であり、さらに好ましくは、2-フルオロビニルオキシ基、または2,2-ジフルオロビニルオキシ基である。 The “C2 to C6 haloalkenyloxy group” in R 3 of the formula (1) is as defined above, preferably a 2-fluorovinyloxy group, a 2,2-difluorovinyloxy group, or 2,2- Dichlorovinyloxy group, 3-fluoroallyloxy group, 3,3-difluoroallyloxy group, or 3,3-dichloroallyloxy group, more preferably 2-fluorovinyloxy group, or 2,2-difluoro It is a vinyloxy group.
 式(1)のR3における「置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基」のC3~C6のアルキニルオキシ基は、前記の定義と同義であり、好ましくは、プロパルギルオキシ基、2-ブチニルオキシ基、または3-ブチニルオキシ基であり、さらに好ましくは、プロパルギルオキシ基である。置換基Cを有する場合、C3~C6のアルキニルオキシ基における水素原子が、置換基Cによって任意に置換される。 The C3-C6 alkynyloxy group of the "C3-C6 alkynyloxy group optionally substituted with substituent C" in R3 of the formula (1) has the same definition as that described above, and preferably a propargyloxy group A 2-butynyloxy group or a 3-butynyloxy group, more preferably a propargyloxy group. When having a substituent C, the hydrogen atom in the C3-C6 alkynyloxy group is optionally substituted by the substituent C.
 式(1)のR3における「C3~C6のハロアルキニルオキシ基」は、前記の定義と同義であり、好ましくは、4,4-ジフルオロ-2-ブチニルオキシ基、4-クロロ-4,4-ジフルオロ-2-ブチニルオキシ基、4-ブロモ-4,4-ジフルオロ-2-ブチニルオキシ基、または4,4,4-トリフルオロ-2-ブチニルオキシ基であり、さらに好ましくは、4,4-ジフルオロ-2-ブチニルオキシ基、または4,4,4-トリフルオロ-2-ブチニルオキシ基である。 The “C3-C6 haloalkynyloxy group” in R 3 of the formula (1) is as defined above, preferably a 4,4-difluoro-2-butynyloxy group, 4-chloro-4,4-difluoro -2-butynyloxy group, 4-bromo-4,4-difluoro-2-butynyloxy group, or 4,4,4-trifluoro-2-butynyloxy group, more preferably 4,4-difluoro-2- It is a butynyloxy group or a 4,4,4-trifluoro-2-butynyloxy group.
 式(1)のR3における「RaRbN-」のRaおよびRbは、前記と同義である。「RaRbN-」として、好ましくは、アミノ基、メチルアミノ基、エチルアミノ基、プロピルアミノ基、イソプロピルアミノ基、(メトキシメチル)アミノ基、(2-メトキシエチル)アミノ基、(シアノメチル)アミノ基、(2-シアノエチル)アミノ基、ジメチルアミノ基、エチル(メチル)アミノ基、メチル(プロピル)アミノ基、イソプロピル(メチル)アミノ基、(メトキシメチル)メチルアミノ基、(2-メトキシエチル)メチルアミノ基、(シアノメチル)メチルアミノ基、(2-シアノエチル)メチルアミノ基、ジエチルアミノ基、エチル(プロピル)アミノ基、エチル(イソプロピル)アミノ基、エチル(メトキシメチル)アミノ基、エチル(2-メトキシエチル)アミノ基、(シアノメチル)エチルアミノ基、(2-シアノエチル)エチルアミノ基、2,2-ジフルオロエチルアミノ基、2,2,2-トリフルオロエチルアミノ基、シクロプロピルアミノ基、(シクロプロピル)メチルアミノ基、ピロリジニル基、またはピペリジニル基であり、さらに好ましくは、ジメチルアミノ基、エチル(メチル)アミノ基、イソプロピル(メチル)アミノ基、ジエチルアミノ基、またはエチル(イソプロピル)アミノ基である。 Ra and Rb of "RaRbN-" in R3 of Formula (1) are as defined above. As "RaRbN-", preferably, amino, methylamino, ethylamino, propylamino, isopropylamino, (methoxymethyl) amino, (2-methoxyethyl) amino, (cyanomethyl) amino, (2-cyanoethyl) amino group, dimethylamino group, ethyl (methyl) amino group, methyl (propyl) amino group, isopropyl (methyl) amino group, (methoxymethyl) methylamino group, (2-methoxyethyl) methylamino group (Cyanomethyl) methylamino group, (2-cyanoethyl) methylamino group, diethylamino group, ethyl (propyl) amino group, ethyl (isopropyl) amino group, ethyl (methoxymethyl) amino group, ethyl (2-methoxyethyl) amino Group, (cyanomethyl) ethylamino group, (2- Annoethyl) ethylamino group, 2,2-difluoroethylamino group, 2,2,2-trifluoroethylamino group, cyclopropylamino group, (cyclopropyl) methylamino group, pyrrolidinyl group, or piperidinyl group, and Preferably, it is a dimethylamino group, an ethyl (methyl) amino group, an isopropyl (methyl) amino group, a diethylamino group, or an ethyl (isopropyl) amino group.
 式(1)のR3における「Rc-L-」のRcおよびLは、前記と同義ある。「Rc-L-」として、好ましくは、メチルチオ基、メタンスルフィニル基、メタンスルホニル基、トリフルオロメチルチオ基、トリフルオロメタンスルフィニル基、またはトリフルオロメタンスルホニル基であり、さらに好ましくは、メチルチオ基、メタンスルフィニル基、またはメタンスルホニル基である。 Rc and L of "Rc-L-" in R3 of Formula (1) are as defined above. Preferred as "Rc-L-" is a methylthio group, a methanesulfinyl group, a methanesulfonyl group, a trifluoromethylthio group, a trifluoromethanesulfinyl group, or a trifluoromethanesulfonyl group, and more preferably a methylthio group, a methanesulfinyl group Or a methanesulfonyl group.
 式(1)のR3における「Rx1C(=O)-」(ここで、Rx1は、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはRaRbN-(ここで、RaおよびRbは前記と同義である。)を表す。)の各用語の定義は、前記の定義と同義である。なお、「置換基Bで適宜置換されてもよいC1~C6のアルキル基」に関しては、置換基Bを有する場合、C1~C6のアルキル基における水素原子が、置換基Bによって任意に置換される。「Rx1C(=O)-」として、好ましくは、アセチル基、メトキシアセチル基、シアノアセチル基、プロピオニル基、ジフルオロアセチル基、トリフルオロアセチル基、シクロプロパンカルボニル基、メトキシカルボニル基、エトキシカルボニル基、2,2-ジフルオロエトキシカルボニル基、2,2,2-トリフルオロエトキシカルボニル基、3,3,3-トリフルオロプロピルオキシカルボニル基、シクロプロピルオキシカルボニル基、アミノカルボニル基、メチルアミノカルボニル基、エチルアミノカルボニル基、(メトキシメチル)アミノカルボニル基、(2-メトキシエチル)アミノカルボニル基、(シアノメチル)アミノカルボニル基、(2-シアノエチル)アミノカルボニル基、ジメチルアミノカルボニル基、エチル(メチル)アミノカルボニル基、ジエチルアミノカルボニル基、(メトキシメチル)メチルアミノカルボニル基、(2-メトキシエチル)メチルアミノカルボニル基、(シアノメチル)メチルアミノカルボニル基、(2-シアノエチル)メチルアミノカルボニル基、2,2-ジフルオロエチルアミノカルボニル基、2,2,2-トリフルオロエチルアミノカルボニル基、シクロプロピルアミノカルボニル基、シクロプロピル(メチル)アミノカルボニル基、ピロリジニルカルボニル基、またはピペリジニルカルボニル基であり、さらに好ましくは、アセチル基、メトキシアセチル基、シアノアセチル基、ジフルオロアセチル基、トリフルオロアセチル基、メトキシカルボニル基、エトキシカルボニル基、アミノカルボニル基、ジメチルアミノカルボニル基、エチル(メチル)アミノカルボニル基、またはジエチルアミノカルボニル基である。 “Rx1C (= O) —” in R3 of Formula (1) (wherein Rx1 is a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or a C3 to C8 A cycloalkyl group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, a C3 to C8 cycloalkoxy group, or RaRbN- (wherein, Ra and Rb are as defined above). The definition of each term is as defined above. In the case of “a C1-C6 alkyl group optionally substituted with a substituent B”, when having a substituent B, the hydrogen atom in the C1-C6 alkyl group is optionally substituted by a substituent B . As “Rx 1 C (= O) —”, preferably, acetyl group, methoxyacetyl group, cyanoacetyl group, propionyl group, difluoroacetyl group, trifluoroacetyl group, cyclopropanecarbonyl group, methoxycarbonyl group, ethoxycarbonyl group, 2 , 2-Difluoroethoxycarbonyl group, 2,2,2-trifluoroethoxycarbonyl group, 3,3,3-trifluoropropyloxycarbonyl group, cyclopropyloxycarbonyl group, aminocarbonyl group, methylaminocarbonyl group, ethylamino Carbonyl group, (methoxymethyl) aminocarbonyl group, (2-methoxyethyl) aminocarbonyl group, (cyanomethyl) aminocarbonyl group, (2-cyanoethyl) aminocarbonyl group, dimethylaminocarbonyl group, ethyl (meth ) Aminocarbonyl group, diethylaminocarbonyl group, (methoxymethyl) methylaminocarbonyl group, (2-methoxyethyl) methylaminocarbonyl group, (cyanomethyl) methylaminocarbonyl group, (2-cyanoethyl) methylaminocarbonyl group, 2,2 -Difluoroethylaminocarbonyl group, 2,2,2-trifluoroethylaminocarbonyl group, cyclopropylaminocarbonyl group, cyclopropyl (methyl) aminocarbonyl group, pyrrolidinylcarbonyl group, or piperidinylcarbonyl group, More preferably, they are acetyl, methoxyacetyl, cyanoacetyl, difluoroacetyl, trifluoroacetyl, methoxycarbonyl, ethoxycarbonyl, aminocarbonyl, dimethylaminocarboyl. Group, ethyl (methyl) aminocarbonyl groups or diethylamino group.
 式(1)のR3における「Rx1C(=O)O-」のRx1は、前記と同義ある。「Rx1C(=O)O-」として、好ましくは、アセチルオキシ基、メトキシアセチルオキシ基、シアノアセチルオキシ基、プロピオニルオキシ基、ジフルオロアセチルオキシ基、トリフルオロアセチルオキシ基、シクロプロパンカルボニルオキシ基、メトキシカルボニルオキシ基、エトキシカルボニルオキシ基、2,2-ジフルオロエトキシカルボニルオキシ基、2,2,2-トリフルオロエトキシカルボニルオキシ基、3,3,3-トリフルオロプロピルオキシカルボニルオキシ基、シクロプロピルオキシカルボニルオキシ基、アミノカルボニルオキシ基、メチルアミノカルボニルオキシ基、エチルアミノカルボニルオキシ基、(メトキシメチル)アミノカルボニルオキシ基、(2-メトキシエチル)アミノカルボニルオキシ基、(シアノメチル)アミノカルボニルオキシ基、(2-シアノエチル)アミノカルボニルオキシ基、ジメチルアミノカルボニルオキシ基、エチル(メチル)アミノカルボニルオキシ基、ジエチルアミノカルボニルオキシ基、(メトキシメチル)メチルアミノカルボニルオキシ基、(2-メトキシエチル)メチルアミノカルボニルオキシ基、(シアノメチル)メチルアミノカルボニルオキシ基、(2-シアノエチル)メチルアミノカルボニルオキシ基、2,2-ジフルオロエチルアミノカルボニルオキシ基、2,2,2-トリフルオロエチルアミノカルボニルオキシ基、シクロプロピルアミノカルボニルオキシ基、シクロプロピル(メチル)アミノカルボニルオキシ基、ピロリジニルカルボニルオキシ基、またはピペリジニルカルボニルオキシ基であり、さらに好ましくは、アセチルオキシ基、メトキシアセチルオキシ基、シアノアセチルオキシ基、ジフルオロアセチルオキシ基、トリフルオロアセチルオキシ基、メトキシカルボニルオキシ基、エトキシカルボニルオキシ基、アミノカルボニルオキシ基、ジメチルアミノカルボニルオキシ基、エチル(メチル)アミノカルボニルオキシ基、またはジエチルアミノカルボニルオキシ基である。 Rx1 of “Rx1C (= O) O—” in R3 of Formula (1) has the same meaning as described above. As "Rx1C (= O) O-", preferably, acetyloxy, methoxyacetyloxy, cyanoacetyloxy, propionyloxy, difluoroacetyloxy, trifluoroacetyloxy, cyclopropanecarbonyloxy, methoxy Carbonyloxy, ethoxycarbonyloxy, 2,2-difluoroethoxycarbonyloxy, 2,2,2-trifluoroethoxycarbonyloxy, 3,3,3-trifluoropropyloxycarbonyloxy, cyclopropyloxycarbonyl Oxy group, amino carbonyloxy group, methylamino carbonyloxy group, ethyl amino carbonyloxy group, (methoxymethyl) amino carbonyloxy group, (2-methoxyethyl) amino carbonyloxy group, (sia (Methyl) aminocarbonyloxy group, (2-cyanoethyl) aminocarbonyloxy group, dimethylaminocarbonyloxy group, ethyl (methyl) aminocarbonyloxy group, diethylamino carbonyloxy group, (methoxymethyl) methylamino carbonyloxy group, (2- (Methoxyethyl) methylaminocarbonyloxy group, (cyanomethyl) methylaminocarbonyloxy group, (2-cyanoethyl) methylaminocarbonyloxy group, 2,2-difluoroethylaminocarbonyloxy group, 2,2,2-trifluoroethylamino A carbonyloxy group, a cyclopropylamino carbonyloxy group, a cyclopropyl (methyl) amino carbonyloxy group, a pyrrolidinyl carbonyloxy group, or a piperidinyl carbonyloxy group; More preferably, acetyloxy, methoxyacetyloxy, cyanoacetyloxy, difluoroacetyloxy, trifluoroacetyloxy, methoxycarbonyloxy, ethoxycarbonyloxy, aminocarbonyloxy, dimethylaminocarbonyloxy, It is an ethyl (methyl) amino carbonyloxy group or a diethyl amino carbonyloxy group.
 式(1)中のZは、R4で適宜0~7置換されてもよいアリール基(ただし、2置換以上のR4の場合、それぞれ独立している。)、またはR4で適宜0~6置換されてもよい複素環基(ただし、2置換以上のR4の場合、それぞれ独立している。)を表す。 Z in the formula (1) is an aryl group which may be optionally substituted 0 to 7 with R 4 (wherein each R 4 having 2 or more substituents is independent of each other) or 0 to 6 as appropriate substituted with R 4 And optionally represents a heterocyclic group which may be independent of each other in the case of R 4 having 2 or more substituents.
 中でもZは、R4で適宜0~5置換されてもよいフェニル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、R4で適宜0~7置換されてもよいナフチル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、R4で適宜0~4置換されてもよいピリジル基、ピリダジニル基、ピリミジニル基、ピラジニル基、トリアジニル基、もしくはテトラジニル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、R4で適宜0~3置換されてもよいチエニル基、チアゾリル基、イソチアゾリル基、チアジアゾリル基、もしくはチアトリアゾリル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、R4で適宜0~4置換されてもよいピロリル基、ピラゾリル基、イミダゾリル基、トリアゾリル基、テトラゾリル基、もしくはペンタゾリル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、R4で適宜0~3置換されてもよいフリル基、オキサゾリル基、イソキサゾリル基、オキサジアゾリル基、もしくはオキサトリアゾリル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、R4で適宜0~6置換されてもよいインドリル基、イソインドリル基、インダゾリル基、ベンゾイミダゾリル基、もしくはベンゾトリアゾリル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、R4で適宜0~5置換されてもよいベンゾフリル基、イソベンゾフリル基、ベンゾオキサゾリル基、ベンゾイソキサゾリル基、もしくはベンゾオキサジアゾリル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、R4で適宜0~5置換されてもよいベンゾチエニル基、ベンゾチアゾリル基、ベンゾイソチアゾリル基、もしくはベンゾチアジアゾリル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、R4で適宜0~6置換されてもよいインドリジニル基、イミダゾピリジル基、ピラゾロピリジル基、もしくはトリアゾロピリジル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、R4で適宜0~5置換されてもよいピロロピリミジニル基、イミダゾピリミジニル基、ピラゾロピリミジニル基、もしくはトリアゾロピリミジニル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、R4で適宜0~5置換されてもよいピロロピラジニル基、イミダゾピラジニル基、ピラゾロピラジニル基、もしくはトリアゾロピラジニル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、R4で適宜0~6置換されてもよいキノリル基、イソキノリル基、シノリル基、フタラジニル基、キノキサリニル基、キナゾリニル基、もしくはナフチリジニル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、または1~2個の酸素原子を含む3~6員環の基が好ましく、
 さらにZは、R4で適宜0~5置換されてもよいフェニル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、R4で適宜0~4置換されてもよいピリジル基、ピリダジニル基、ピリミジニル基、ピラジニル基、トリアジニル基、もしくはテトラジニル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、R4で適宜0~3置換されてもよいチエニル基、チアゾリル基、イソチアゾリル基、チアジアゾリル基、もしくはチアトリアゾリル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、R4で適宜0~4置換されてもよいピロリル基、ピラゾリル基、イミダゾリル基、トリアゾリル基、テトラゾリル基、もしくはペンタゾリル基、(ただし、2置換以上のR4の場合、それぞれ独立している。)、R4で適宜0~3置換されてもよいフリル基、オキサゾリル基、イソキサゾリル基、オキサジアゾリル基、もしくはオキサトリアゾリル基(ただし、2置換以上のR4の場合、それぞれ独立している。)が好ましく、
 特にZは、R4で適宜0~5置換されてもよいフェニル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、R4で適宜0~4置換されてもよいピラゾリル基、イミダゾリル基、トリアゾリル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、R4で適宜0~3置換されてもよいオキサゾリル基、またはイソキサゾリル基(ただし、2置換以上のR4の場合、それぞれ独立している。)が好ましい。
Among them, Z is a phenyl group which may be optionally substituted 0 to 5 with R 4 (wherein each R 4 is independently substituted in the case of R 4), and a naphthyl group which may be optionally substituted 0 to 7 with R 4 ( However, in the case of R 4 having 2 or more substituents, they are each independently pyridyl), pyridyl, pyridazinyl, pyrimidinyl, pyrazinyl, triazinyl or tetrazinyl which may be optionally substituted 0 to 4 with R 4 (wherein, In the case of R 4 of two or more substituents, they are each independently), thienyl group which may be optionally substituted 0 to 3 with R 4, thiazolyl group, isothiazolyl group, thiadiazolyl group, or thiatriazolyl group (with the proviso that R4 is disubstituted or more) Pyrrolyl group, pyrazolyl group, imidazolyl group, triazo group which may be optionally substituted by 0 to 4 as appropriate. Group, tetrazolyl group, or pentazolyl group (provided that they are each independently in the case of R4 having 2 or more substituents), furyl group optionally substituted by 0 to 3 with R4, oxazolyl group, isoxazolyl group, oxadiazolyl group Or an oxatriazolyl group (provided that each R4 is independently substituted in the case of 2 or more R4), an indolyl group optionally substituted by 0 to 6 with R4, an isoindolyl group, an indazolyl group, a benzoimidazolyl group, or A benzotriazolyl group (provided that they are each independently in the case of R4 having 2 or more substituents), and a benzofuryl group, an isobenzofuryl group, a benzoxazolyl group, a benzo group which may be optionally substituted by 0 to 5 with R4 Isoxazolyl group, or benzoxadiazolyl group (in the case of R 4 having 2 or more substituents, respectively) And R 4 each optionally be substituted by 0 to 5 benzothienyl group, benzothiazolyl group, benzoisothiazolyl group, or benzothiadiazolyl group (in the case of R 4 having two or more substituents, each of which is independent of each other) And R 4 optionally have 0 to 6 substitution with an indolizinyl group, an imidazo pyridyl group, a pyrazolo pyridyl group, or a triazolo pyridyl group (in the case of R 4 having two or more substituents, each of which is independent of each other) And pyrrolopyrimidinyl group optionally substituted by 0 to 5 with R 4, imidazopyrimidinyl group, pyrazolopyrimidinyl group, or triazolopyrimidinyl group (in the case of two or more substituted R 4, they are each independently.) , Pyrrolopyrazinyl group optionally substituted 0 to 5 with R 4, imidazopyrazinyl group, pyrazolopyrazinyl group A group or a triazolopyrazinyl group (provided that R4 is disubstituted or more, each of which is independent of each other). And quinolinyl group optionally substituted with 0 to 6 by R 4, isoquinolyl group, cinolyl group, phthalazinyl group, quinoxalinyl group, quinazolinyl group, or naphthyridinyl group (in the case of R 4 having two or more substituents, each of which is independent of each other) Or a 3 to 6 membered ring group containing 1 or 2 oxygen atoms,
Further, Z is a phenyl group which may be optionally substituted 0 to 5 with R 4 (provided that they are each independently in the case of R 4 having 2 or more substituents), and a pyridyl group which may be optionally substituted 0 to 4 with R 4, A pyridazinyl group, a pyrimidinyl group, a pyrazinyl group, a triazinyl group, or a tetrazinyl group (provided that they are each independently in the case of R4 having 2 or more substituents), a thienyl group optionally having 0 to 3 substitution with R4, a thiazolyl group , Isothiazolyl group, thiadiazolyl group, or thiatriazolyl group (provided that they are each independently in the case of R4 having 2 or more substituents), pyrrolyl group, pyrazolyl group, imidazolyl group, triazolyl group which may be optionally substituted by 0 to 4 as appropriate. Group, a tetrazolyl group, or a pentazolyl group (with the proviso that in the case of R4 having 2 or more substituents, each is independent And furyl group optionally substituted by 0 to 3 with R 4, oxazolyl group, isoxazolyl group, oxadiazolyl group, or oxatriazolyl group (provided that they are each independently in the case of R 4 having two or more substituents). Preferably
Particularly, Z is a phenyl group which may be optionally substituted 0 to 5 with R 4 (provided that each is independently in the case of R 4 having 2 or more substituents), a pyrazolyl group which may be optionally substituted 0 to 4 with R 4, An imidazolyl group, a triazolyl group (provided that they are each independently in the case of R4 having 2 or more substituents), an oxazolyl group optionally substituted by 0 to 3 with R4, or an isoxazolyl group (note that R4 having 2 or more substituents) In each case, they are preferably independent of each other).
 式(1)のZにおける「R4で適宜0~5置換されてもよいフェニル基」(ただし、2置換以上のR4の場合、それぞれ独立している。)は、式(h)で表される下記に示した部分構造を表す。
Figure JPOXMLDOC01-appb-C000011
The “phenyl group which may be optionally substituted by 0 to 5 with R 4” in Z of Formula (1) (wherein each R 4 having two or more substituents is independent of each other) is represented by Formula (h) It represents the partial structure shown below.
Figure JPOXMLDOC01-appb-C000011
 式(h)のnaは、0~5の整数を表す。 Na in the formula (h) represents an integer of 0 to 5.
 式(h)のnaが2以上の場合、2置換以上のR4は、それぞれ独立した置換基を表し、同一、または異なっていてよく、任意に選択することができる。 When na in the formula (h) is 2 or more, two or more substituents R4 each independently represent a substituent, which may be the same or different and can be arbitrarily selected.
 式(1)のZにおける「R4で適宜0~7置換されてもよいナフチル基」(ただし、2置換以上のR4の場合、それぞれ独立している。)は、式(i)で表される下記に示した部分構造を表す。
Figure JPOXMLDOC01-appb-C000012
The “a naphthyl group which may be optionally substituted with 0 to 7 R 4 in Z of Formula (1)” (wherein each R 4 having two or more substituents is independent of each other) is represented by Formula (i) It represents the partial structure shown below.
Figure JPOXMLDOC01-appb-C000012
 式(i)のnbは、0~7の整数を表す。 In the formula (i), nb represents an integer of 0 to 7.
 式(i)のnbが2以上の場合、2置換以上のR4は、それぞれ独立した置換基を表し、同一、または異なっていてよく、任意に選択することができる。 When nb in the formula (i) is 2 or more, R4s each having 2 or more substituents represent independent substituents, which may be the same or different, and can be arbitrarily selected.
 式(1)のZにおける「R4で適宜0~4置換されてもよいピリジル基、ピリダジニル基、ピリミジニル基、ピラジニル基、トリアジニル基、もしくはテトラジニル基」(ただし、2置換以上のR4の場合、それぞれ独立している。)は、式(j)で表される下記に示した部分構造を表す。
Figure JPOXMLDOC01-appb-C000013
“In the case of R 4 having two or more substituents, each of pyridyl, pyridazinyl, pyrimidinyl, pyrazinyl, triazinyl or tetrazinyl” in Z of Formula (1) (wherein each of R 4 may be optionally substituted 0 to 4 optionally with 0 to 4 substitution) (Independent) represents the partial structure shown below with formula (j).
Figure JPOXMLDOC01-appb-C000013
 式(j)のG1、G2、G3、G4、およびG5は、それぞれ独立していて、炭素原子または窒素原子を表す。ただし、G1、G2、G3、G4、およびG5のうち、少なくとも一つは窒素原子である。好ましいG1、G2、G3、G4、およびG5は、G1、G2、G3、G4、およびG5のうち、いずれか一つが窒素原子である。すなわち、ピリジル基である。 G1, G2, G3, G4 and G5 in Formula (j) are each independently a carbon atom or a nitrogen atom. However, at least one of G1, G2, G3, G4, and G5 is a nitrogen atom. In preferred G1, G2, G3, G4 and G5, any one of G1, G2, G3, G4 and G5 is a nitrogen atom. That is, it is a pyridyl group.
 式(j)のncは、0~4の整数を表す。 In the formula (j), nc represents an integer of 0 to 4.
 式(j)のncが2以上の場合、2置換以上のR4は、それぞれ独立した置換基を表し、同一、または異なっていてよく、任意に選択することができる。 When nc in the formula (j) is 2 or more, two or more substituents R4 each independently represent a substituent, which may be the same or different, and can be arbitrarily selected.
 式(j)の部分構造の具体例を以下に示す。
Figure JPOXMLDOC01-appb-C000014
The specific example of the partial structure of Formula (j) is shown below.
Figure JPOXMLDOC01-appb-C000014
 式(1)のZにおける「R4で適宜0~3置換されてもよいチエニル基、チアゾリル基、イソチアゾリル基、チアジアゾリル基、もしくはチアトリアゾリル基」(ただし、2置換以上のR4の場合、それぞれ独立している。)は、式(k-1)、および式(k-2)で表される下記に示した部分構造を表す。
Figure JPOXMLDOC01-appb-C000015
In Z of Formula (1), “a thienyl group which may be optionally substituted by R 4, a thiazolyl group, an isothiazolyl group, a thiadiazolyl group, or a thiatriazolyl group” (in the case of two or more substituted R 4, each independently Are the following partial structures represented by the formula (k-1) and the formula (k-2).
Figure JPOXMLDOC01-appb-C000015
 式(k-1)、および式(k-2)におけるG6、G7、およびG8は、それぞれ独立していて、炭素原子または窒素原子を表す。 G6, G7 and G8 in Formula (k-1) and Formula (k-2) are each independently represent a carbon atom or a nitrogen atom.
 式(k-1)、および式(k-2)のndは、0~3の整数を表す。 In the formulas (k-1) and (k-2), nd represents an integer of 0 to 3.
 式(k-1)、および式(k-2)のndが2以上の場合、2置換以上のR4は、それぞれ独立した置換基を表し、同一または異なっていてよく、任意に選択することができる。 When nd in the formula (k-1) and the formula (k-2) is 2 or more, two or more substituted R4's each independently represent a substituent, which may be the same or different and may be optionally selected it can.
 式(k-1)の部分構造の具体例を以下に示す。
Figure JPOXMLDOC01-appb-C000016
Specific examples of the partial structure of formula (k-1) are shown below.
Figure JPOXMLDOC01-appb-C000016
 式(k-2)の部分構造の具体例を以下に示す
Figure JPOXMLDOC01-appb-C000017
Specific examples of the partial structure of formula (k-2) are shown below
Figure JPOXMLDOC01-appb-C000017
 式(1)のZにおける「R4で適宜0~4置換されてもよいピロリル基、ピラゾリル基、イミダゾリル基、トリアゾリル基、テトラゾリル基、もしくはペンタゾリル基」(ただし、2置換以上のR4の場合、それぞれ独立している。)は、式(l-1)、式(l-2)、および式(l-3)で表される下記に示した部分構造を表す。
Figure JPOXMLDOC01-appb-C000018
“In the case of R 4 having two or more substituents, each of“ a pyrrolyl group optionally substituted with 0 to 4 R 4 optionally having 0 to 4 substitution with R 4, a pyrazolyl group, an imidazolyl group, a triazolyl group, a tetrazolyl group or a pentazolyl group ”in Z of Formula (1) Independently)) represents a partial structure shown below which is represented by formula (1-1), formula (1-2), and formula (1-3).
Figure JPOXMLDOC01-appb-C000018
 式(l-1)、式(l-2)、および式(l-3)におけるG9、G10、G11、およびG12は、それぞれ独立していて、炭素原子または窒素原子を表す。 G9, G10, G11 and G12 in Formula (1-1), Formula (1-2) and Formula (1-3) are each independently a carbon atom or a nitrogen atom.
 式(l-1)、式(l-2)、および式(l-3)のneは、0~4の整数を表す。 In the formulas (I-1), (I-2) and (I-3), ne represents an integer of 0 to 4.
 式(l-1)、式(l-2)、および式(l-3)のneが2以上の場合、2置換以上のR4は、それぞれ独立した置換基を表し、同一または異なっていてよく、任意に選択することができる。 When ne in the formula (I-1), the formula (I-2) and the formula (I-3) is 2 or more, two or more substituted R 4 s independently represent an independent substituent and may be the same or different. , Can be selected arbitrarily.
 式(l-1)の部分構造の具体例を以下に示す。
Figure JPOXMLDOC01-appb-C000019
Specific examples of the partial structure of formula (I-1) are shown below.
Figure JPOXMLDOC01-appb-C000019
 式(l-2)の部分構造の具体例を以下に示す。
Figure JPOXMLDOC01-appb-C000020
Specific examples of the partial structure of formula (I-2) are shown below.
Figure JPOXMLDOC01-appb-C000020
 式(l-3)の部分構造の具体例を以下に示す。
Figure JPOXMLDOC01-appb-C000021
Specific examples of the partial structure of Formula (l-3) are shown below.
Figure JPOXMLDOC01-appb-C000021
 式(1)のZにおける「R4で適宜0~3置換されてもよいフリル基、オキサゾリル基、イソキサゾリル基、オキサジアゾリル基、もしくはオキサトリアゾリル基」(ただし、2置換以上のR4の場合、それぞれ独立している。)は、式(m-1)、および式(m-2)で表される下記に示した部分構造を表す。
Figure JPOXMLDOC01-appb-C000022
“In the case of R 4 having two or more substituents, each of“ a furyl group optionally substituted with 0 to 4 R 4 optionally having 0 to 3 substitution with R 4, an oxazolyl group, an isoxazolyl group, an oxadiazolyl group or an oxatriazolyl group ”in Z of Formula (1) (Independent) represents a partial structure shown by the formula (m-1) and the formula (m-2) shown below.
Figure JPOXMLDOC01-appb-C000022
 式(m-1)、および式(m-2)におけるG13、G14、およびG15は、それぞれ独立していて、炭素原子または窒素原子を表す。 G13, G14 and G15 in Formula (m-1) and Formula (m-2) are each independently represent a carbon atom or a nitrogen atom.
 式(m-1)、および式(m-2)のnfは、0~3の整数を表す。 Nf in the formulas (m-1) and (m-2) represents an integer of 0 to 3.
 式(m-1)、および式(m-2)のnfが2以上の場合、2置換以上のR4は、それぞれ独立した置換基を表し、同一または異なっていてよく、任意に選択することができる。 When nf in the formula (m-1) and the formula (m-2) is 2 or more, two or more substituted R4's each independently represent a substituent, which may be the same or different and may be optionally selected it can.
 式(m-1)の部分構造の具体例を以下に示す。
Figure JPOXMLDOC01-appb-C000023
Specific examples of the partial structure of Formula (m-1) are shown below.
Figure JPOXMLDOC01-appb-C000023
 式(m-2)の部分構造の具体例を以下に示す。
Figure JPOXMLDOC01-appb-C000024
Specific examples of the partial structure of Formula (m-2) are shown below.
Figure JPOXMLDOC01-appb-C000024
 式(1)のZにおける「R4で適宜0~6置換されてもよいインドリル基、イソインドリル基、インダゾリル基、ベンゾイミダゾリル基、もしくはベンゾトリアゾリル基」(ただし、2置換以上のR4の場合、それぞれ独立している。)は、式(n-1)、および式(n-2)で表される下記に示した部分構造を表す。
Figure JPOXMLDOC01-appb-C000025
“Indolyl group optionally substituted with 0 to 6 optionally with R 4, isoindolyl group, indazolyl group, benzoimidazolyl group or benzotriazolyl group” in Z of Formula (1) (however, in the case of R 4 having two or more substituents, each of them Independently)) represents a partial structure shown by Formula (n-1) and Formula (n-2) below.
Figure JPOXMLDOC01-appb-C000025
 式(n-1)、および式(n-2)におけるG16、およびG17は、それぞれ独立していて、炭素原子または窒素原子を表す。 G16 and G17 in Formula (n-1) and Formula (n-2) are each independently represent a carbon atom or a nitrogen atom.
 式(n-1)、および式(n-2)のngは、0~6の整数を表す。 In the formulas (n-1) and (n-2), ng represents an integer of 0 to 6.
 式(n-1)、および式(n-2)のngが2以上の場合、2置換以上のR4は、それぞれ独立した置換基を表し、同一または異なっていてよく、任意に選択することができる。 When ng in the formula (n-1) and the formula (n-2) is 2 or more, two or more substituted R4's each independently represent a substituent, which may be the same or different and may be optionally selected it can.
 式(n-1)の部分構造の具体例を以下に示す。
Figure JPOXMLDOC01-appb-C000026
Specific examples of the partial structure of the formula (n-1) are shown below.
Figure JPOXMLDOC01-appb-C000026
 式(n-2)の部分構造の具体例を以下に示す。
Figure JPOXMLDOC01-appb-C000027
Specific examples of the partial structure of Formula (n-2) are shown below.
Figure JPOXMLDOC01-appb-C000027
 式(1)のZにおける「R4で適宜0~5置換されてもよいベンゾフリル基、イソベンゾフリル基、ベンゾオキサゾリル基、ベンゾイソキサゾリル基、もしくはベンゾオキサジアゾリル基」(ただし、2置換以上のR4の場合、それぞれ独立している。)は、式(о-1)、および式(о-2)で表される下記に示した部分構造を表す。
Figure JPOXMLDOC01-appb-C000028
“A benzofuryl group which may be optionally substituted by 0 to 4, an isobenzofuryl group, a benzoxazolyl group, a benzoisoxazolyl group or a benzooxadiazolyl group” in Z of the formula (1) (wherein, In the case of R 4 having 2 or more substituents, they are each independently.) Represents a partial structure shown below as represented by Formula (о-1) and Formula (о-2).
Figure JPOXMLDOC01-appb-C000028
 式(о-1)、および式(о-2)におけるG18、およびG19は、それぞれ独立していて、炭素原子または窒素原子を表す。 G18 and G19 in Formula (о-1) and Formula (о-2) are each independently represent a carbon atom or a nitrogen atom.
 式(о-1)、および式(о-2)のnhは、0~5の整数を表す。 Nh in the formulas (о-1) and (о-2) represents an integer of 0 to 5.
 式(о-1)、および式(о-2)のnhが2以上の場合、2置換以上のR4は、それぞれ独立した置換基を表し、同一または異なっていてよく、任意に選択することができる。 When nh in the formula (о-1) and the formula (о-2) is 2 or more, two or more substituted R 4 s independently represent an independent substituent, which may be the same or different and may be optionally selected it can.
 式(о-1)の部分構造の具体例を以下に示す。
Figure JPOXMLDOC01-appb-C000029
Specific examples of the partial structure of Formula (о-1) are shown below.
Figure JPOXMLDOC01-appb-C000029
 式(о-2)の部分構造の具体例を以下に示す。
Figure JPOXMLDOC01-appb-C000030
Specific examples of the partial structure of Formula (о-2) are shown below.
Figure JPOXMLDOC01-appb-C000030
 式(1)のZにおける「R4で適宜0~5置換されてもよいベンゾチエニル基、ベンゾチアゾリル基、ベンゾイソチアゾリル基、もしくはベンゾチアジアゾリル基」(ただし、2置換以上のR4の場合、それぞれ独立している。)は、式(p-1)、および式(p-2)で表される下記に示した部分構造を表す。
Figure JPOXMLDOC01-appb-C000031
“In the case of R 4 having two or more substituents,“ a benzothienyl group which may be optionally substituted with 0 to 4 R 4, a benzothiazolyl group, a benzoisothiazolyl group, or a benzothiadiazolyl group ”in Z of Formula (1) And each independently represents a partial structure shown by the formula (p-1) and the formula (p-2) shown below.
Figure JPOXMLDOC01-appb-C000031
 式(p-1)、および式(p-2)におけるG20、およびG21は、それぞれ独立していて、炭素原子または窒素原子を表す。 G20 and G21 in Formula (p-1) and Formula (p-2) are each independently a carbon atom or a nitrogen atom.
 式(p-1)、および式(p-2)のniは、0~5の整数を表す。 In the formulas (p-1) and (p-2), ni represents an integer of 0 to 5.
 式(p-1)、および式(p-2)のniが2以上の場合、2置換以上のR4は、それぞれ独立した置換基を表し、同一または異なっていてよく、任意に選択することができる。 When ni in the formula (p-1) and the formula (p-2) is 2 or more, two or more substituted R4's each independently represent a substituent, which may be the same or different and may be optionally selected it can.
 式(p-1)の部分構造の具体例を以下に示す。
Figure JPOXMLDOC01-appb-C000032
Specific examples of the partial structure of Formula (p-1) are shown below.
Figure JPOXMLDOC01-appb-C000032
 式(p-2)の部分構造の具体例を以下に示す。
Figure JPOXMLDOC01-appb-C000033
Specific examples of the partial structure of Formula (p-2) are shown below.
Figure JPOXMLDOC01-appb-C000033
 式(1)のZにおける「R4で適宜0~6置換されてもよいインドリジニル基、イミダゾピリジル基、ピラゾロピリジル基、もしくはトリアゾロピリジル基」(ただし、2置換以上のR4の場合、それぞれ独立している。)は、式(q)で表される下記に示した部分構造を表す。
Figure JPOXMLDOC01-appb-C000034
“Indolizinyl group optionally substituted with 0 to 6 R 4 optionally substituted with R 4, imidazo pyridyl group, pyrazolo pyridyl group, or triazolo pyridyl group” in Z of Formula (1) (however, in the case of R 4 having two or more substituents, each independently ) Represents a partial structure shown by the following formula (q).
Figure JPOXMLDOC01-appb-C000034
 式(q)におけるG22、G23、およびG24は、それぞれ独立していて、炭素原子または窒素原子を表す。 G22, G23 and G24 in Formula (q) are each independently a carbon atom or a nitrogen atom.
 式(q)のnjは、0~6の整数を表す。 N j in the formula (q) represents an integer of 0 to 6.
 式(q)のnjが2以上の場合、2置換以上のR4は、それぞれ独立した置換基を表し、同一または異なっていてよく、任意に選択することができる。 When n j in the formula (q) is 2 or more, two or more substituents R 4 each represent an independent substituent, which may be the same or different, and can be selected arbitrarily.
 式(q)の部分構造の具体例を以下に示す。
Figure JPOXMLDOC01-appb-C000035
The specific example of the partial structure of Formula (q) is shown below.
Figure JPOXMLDOC01-appb-C000035
 式(1)のZにおける「R4で適宜0~5置換されてもよいピロロピリミジニル基、イミダゾピリミジニル基、ピラゾロピリミジニル基、トリアゾロピリミジニル基、ピロロピラジニル基、イミダゾピラジニル基、ピラゾロピラジニル基、もしくはトリアゾロピラジニル基(ただし、2置換以上のR4の場合、それぞれ独立している。)は、式(r-1)、式(r-2)、および式(r-3)で表される下記に示した部分構造を表す。
Figure JPOXMLDOC01-appb-C000036
The pyrrolopyrimidinyl group optionally substituted with 0 to 5 substituents for R 4 in formula (1), imidazo pyrimidinyl group, pyrazolo pyrimidinyl group, triazolo pyrimidinyl group, pyrrolo pyrazinyl group, imidazo pyrazinyl group, pyrazolo pyrazinyl Group or a triazolopyrazinyl group (in the case of R4 having 2 or more substituents, each of which is independent of each other) is a group represented by the formula (r-1), the formula (r-2), and the formula (r-3) It represents the partial structure shown below).
Figure JPOXMLDOC01-appb-C000036
 式(r-1)、(r-2)、および式(r-3)におけるG25、G26,およびG27は、それぞれ独立していて、炭素原子または窒素原子を表す。 G25, G26 and G27 in formulas (r-1), (r-2) and formula (r-3) are each independently a carbon atom or a nitrogen atom.
 式(r-1)、(r-2)、および式(r-3)のnkは、0~5の整数を表す。 In the formulas (r-1), (r-2) and the formula (r-3), nk represents an integer of 0 to 5.
 式(r-1)、(r-2)、および式(r-3)のnkが2以上の場合、2置換以上のR4は、それぞれ独立した置換基を表し、同一または異なっていてよく、任意に選択することができる。 When nk in the formulas (r-1), (r-2) and the formula (r-3) is 2 or more, two or more substituted R4's each independently represent a substituent, which may be the same or different, It can be selected arbitrarily.
 式(r-1)の部分構造の具体例を以下に示す。
Figure JPOXMLDOC01-appb-C000037
Specific examples of the partial structure of Formula (r-1) are shown below.
Figure JPOXMLDOC01-appb-C000037
 式(r-2)の部分構造の具体例を以下に示す。
Figure JPOXMLDOC01-appb-C000038
Specific examples of the partial structure of Formula (r-2) are shown below.
Figure JPOXMLDOC01-appb-C000038
 式(r-3)の部分構造の具体例を以下に示す。
Figure JPOXMLDOC01-appb-C000039
Specific examples of the partial structure of Formula (r-3) are shown below.
Figure JPOXMLDOC01-appb-C000039
 式(1)のZにおける「R4で適宜0~6置換されてもよいキノリル基、イソキノリル基、シノリル基、フタラジニル基、キノキサリニル基、もしくはキナゾリニル基」(ただし、2置換以上のR4の場合、それぞれ独立している。)は、式(s-1)、および式(s-2)で表される下記に示した部分構造を表す。
Figure JPOXMLDOC01-appb-C000040
“In the case of R 4 having two or more substituents, each of“ a quinolyl group optionally substituted with 0 to 4 R 4 may be optionally substituted with R 4, isoquinolyl group, cinolyl group, phthalazinyl group, quinoxalinyl group or quinazolinyl group ”in Z of Formula (1) (Independent) represents a partial structure shown by the formula (s-1) and the formula (s-2) shown below.
Figure JPOXMLDOC01-appb-C000040
 式(s-1)、および式(s-2)におけるG28、G29,G30、およびG31は、それぞれ独立していて、炭素原子または窒素原子を表す。ただし、G28、G29,G30、およびG31のうち、少なくとも一つは窒素原子である。式(s-1)において、好ましいG26、G27、G28およびG29は、G26、G27、G28およびG29のうち、いずれか一つが窒素原子である。すなわち、キノリル基である。 G28, G29, G30, and G31 in Formula (s-1) and Formula (s-2) are each independently a carbon atom or a nitrogen atom. However, at least one of G28, G29, G30, and G31 is a nitrogen atom. In formula (s-1), as preferred G26, G27, G28 and G29, one of G26, G27, G28 and G29 is a nitrogen atom. That is, it is a quinolyl group.
 式(s-1)、および式(s-2)のnlは、0~6の整数を表す。 In the formulas (s-1) and (s-2), nl represents an integer of 0 to 6.
 式(s-1)、および式(s-2)のnlが2以上の場合、2置換以上のR4は、それぞれ独立した置換基を表し、同一または異なっていてよく、任意に選択することができる。 When n1 in the formula (s-1) and the formula (s-2) is 2 or more, two or more R.sup.4 each represents an independent substituent, which may be the same or different and may be selected arbitrarily it can.
 式(s-1)の部分構造の具体例を以下に示す。
Figure JPOXMLDOC01-appb-C000041
Specific examples of the partial structure of Formula (s-1) are shown below.
Figure JPOXMLDOC01-appb-C000041
 式(s-2)の部分構造の具体例を以下に示す。
Figure JPOXMLDOC01-appb-C000042
Specific examples of the partial structure of Formula (s-2) are shown below.
Figure JPOXMLDOC01-appb-C000042
 式(1)のおける「1~2個の酸素原子を含む3~6員環の基」は、前記の定義と同義であり、好ましくは、オキソラニル基、オキサニル基、1,3-ジオキソラニル基、または1,3-ジオキサニル基であり、さらに好ましくは、1,3-ジオキソラニル基、または1,3-ジオキサニル基である。 The “3 to 6-membered ring group containing one or two oxygen atoms” in the formula (1) is as defined above, preferably an oxolanyl group, an oxanyl group, a 1,3-dioxolanyl group, Or a 1,3-dioxanyl group, more preferably a 1,3-dioxolanyl group or a 1,3-dioxanyl group.
 式(1)中のR4は、水酸基、シアノ基、ニトロ基、ハロゲン原子、置換基Cで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Cで適宜置換されてもよいC2~C6のアルケニル基、C2~C6のハロアルケニル基、置換基Cで適宜置換されてもよいC2~C6のアルキニル基、C2~C6のハロアルキニル基、置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、置換基Cで適宜置換されてもよいC3~C8のシクロアルコキシ基、置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、C2~C6のハロアルケニルオキシ基、置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、C3~C6のハロアルキニルオキシ基、置換基Dで適宜置換されてもよいアリール基、置換基Dで適宜置換されてもよいヘテロアリール基、置換基Dで適宜置換されてもよいアリールオキシ基、置換基Dで適宜置換されてもよいヘテロアリールオキシ基、置換基Dで適宜置換されてもよいアラルキルオキシ基、RaRbN-(ここで、RaおよびRbは、前記と同義である。)、Rc-L-(ここで、RcおよびLは、前記と同義である。)、Rx1C(=O)-(ここで、Rx1は、前記と同義である。)、Rx1C(=O)O-(ここで、Rx1は、前記と同義である。)、またはRx2C(=O)N(Rx3)-(ここで、Rx2は、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはRaRbN-(ここで、RaおよびRbは、前記と同義である。)を表し、Rx3は、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表す。)を表す。 R 4 in the formula (1) is optionally substituted with a hydroxyl group, a cyano group, a nitro group, a halogen atom, a C1 to C6 alkyl group optionally substituted with a substituent C, a C1 to C6 haloalkyl group, a substituent C C3-C8 cycloalkyl group which may be substituted, C2-C6 alkenyl group optionally substituted with substituent C, C2-C6 haloalkenyl group, C2-C6 optionally substituted with substituent C C 2 -C 6 haloalkynyl group, C 1 -C 6 alkoxy group optionally substituted with substituent C, C 1-C 6 haloalkoxy group, C 3 -C 8 optionally substituted with substituent C Of C2 to C6 alkenyloxy group optionally substituted with substituent C, C2 to C6 haloalkenyloxy group, C3 to C6 optionally substituted with substituent C The lucinyloxy group, the C3-C6 haloalkynyl oxy group, the aryl group which may be suitably substituted with the substituent D, the heteroaryl group which may be suitably substituted with the substituent D, the aryl which may be suitably substituted with the substituent D Oxy group, heteroaryloxy group which may be optionally substituted with substituent D, aralkyloxy group which may be optionally substituted with substituent D, RaRbN- (wherein, Ra and Rb are as defined above) , Rc-L- (wherein Rc and L are as defined above), Rx1C (= O)-(wherein Rx1 is as defined above), Rx1C (= O) O- (Here, Rx1 is the same as the above.), Or Rx2C (NO) N (Rx3)-(where Rx2 is a hydrogen atom, C1 to C6 optionally substituted with a substituent B. Alkyl group, C1 to 6 haloalkyl group, C3-C8 cycloalkyl group, C1-C6 alkoxy group, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group, or RaRbN- (wherein Ra and Rb are as defined above) And Rx 3 represents a hydrogen atom, a C1-C6 alkyl group optionally substituted with a substituent B, a C1-C6 haloalkyl group, or a C3-C8 cycloalkyl group. Represents
 中でもR4は、水酸基、ハロゲン原子、置換基Cで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Cで適宜置換されてもよいC2~C6のアルケニル基、C2~C6のハロアルケニル基、置換基Cで適宜置換されてもよいC2~C6のアルキニル基、C2~C6のハロアルキニル基、置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、C2~C6のハロアルケニルオキシ基、置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、C3~C6のハロアルキニルオキシ基、Rc-L-(ここで、RcおよびLは、前記と同義である。)、Rx1C(=O)-(ここで、Rx1は、前記と同義である。)、またはRx1C(=O)O-(ここで、Rx1は、前記と同義である。)が好ましく、
 特にR4は、ハロゲン原子、置換基Cで適宜置換されてもよいC1~C6のアルキル基、または置換基Cで適宜置換されてもよいC1~C6のアルコキシ基が好ましい。
Among them, R 4 is a hydroxyl group, a halogen atom, a C 1 to C 6 alkyl group optionally substituted with a substituent C, a C 1 to C 6 haloalkyl group, a C 2 to C 6 alkenyl group optionally substituted with a substituent C, C2-C6 haloalkenyl group, C2-C6 alkynyl group optionally substituted with substituent C, C2-C6 haloalkynyl group, C1-C6 alkoxy group optionally substituted with substituent C, C1-C6 haloalkoxy group, C2-C6 alkenyloxy group optionally substituted with substituent C, C2-C6 haloalkenyloxy group, C3-C6 alkynyl optionally substituted with substituent C Oxy group, C3-C6 haloalkynyl oxy group, Rc-L- (wherein Rc and L are as defined above), Rx1C (= O)-(wherein Rx1 is The same meanings as defined above.), Or Rx1C (= O) O- (wherein, Rx1 has the same meaning as defined above.) Is preferred,
In particular, R 4 is preferably a halogen atom, a C 1 to C 6 alkyl group which may be optionally substituted with a substituent C, or a C 1 to C 6 alkoxy group which may be optionally substituted with a substituent C.
 式(1)のR4には、水酸基、シアノ基、およびニトロ基が含まれる。 R 4 in the formula (1) includes a hydroxyl group, a cyano group and a nitro group.
 式(1)のR4におけるハロゲン原子は、前記の定義と同義であり、好ましくはフッ素原子、塩素原子、臭素原子、またはヨウ素原子である。 The halogen atom in R 4 of the formula (1) is as defined above, and is preferably a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.
 式(1)のR4における「置換基Cで適宜置換されてもよいC1~C6のアルキル基」のC1~C6のアルキル基は、前記の定義と同義であり、好ましくは、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、またはイソブチル基であり、さらに好ましくは、メチル基、エチル基、プロピル基、またはイソプロピル基である。置換基Cを有する場合、C1~C6のアルキル基における水素原子が、置換基Cによって任意に置換される。 The C1-C6 alkyl group of the “C1-C6 alkyl group optionally substituted with substituent C” in R 4 of Formula (1) has the same definition as described above, and preferably a methyl group or an ethyl group A propyl group, an isopropyl group, a butyl group or an isobutyl group, and more preferably a methyl group, an ethyl group, a propyl group or an isopropyl group. When having a substituent C, the hydrogen atom in the C1-C6 alkyl group is optionally substituted by the substituent C.
 式(1)のR4における「C1~C6のハロアルキル基」は、前記の定義と同義であり、好ましくは、ジフルオロメチル基、トリフルオロメチル基、2,2-ジフルオロエチル基、2,2,2-トリフルオロエチル基、3,3-ジフルオロプロピル基、または3,3,3-トリフルオロプロピル基であり、さらに好ましくは、ジフルオロメチル基、トリフルオロメチル基、2,2-ジフルオロエチル基、または2,2,2-トリフルオロエチル基である。 The “C1 to C6 haloalkyl group” in R 4 of the formula (1) is as defined above, preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, 2,2,2 -Trifluoroethyl group, 3,3-difluoropropyl group, or 3,3,3-trifluoropropyl group, more preferably difluoromethyl group, trifluoromethyl group, 2,2-difluoroethyl group, or 2,2,2-trifluoroethyl group.
 式(1)のR4における「置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基」のC3~C8のシクロアルキル基は、前記の定義と同義であり、好ましくは、シクロプロピル基、シクロブチル基、シクロペンチル基、またはシクロヘキシル基であり、さらに好ましくは、シクロプロピル基、またはシクロブチル基である。置換基Cを有する場合、C3~C8のシクロアルキル基における水素原子が、置換基Cによって任意に置換される。 The C3 to C8 cycloalkyl group of the "C3 to C8 cycloalkyl group optionally substituted with substituent C" in R4 of the formula (1) has the same meaning as described above, preferably a cyclopropyl group A cyclobutyl group, a cyclopentyl group or a cyclohexyl group, more preferably a cyclopropyl group or a cyclobutyl group. When having a substituent C, the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent C.
 式(1)のR4における「置換基Cで適宜置換されてもよいC2~C6のアルケニル基」のC2~C6のアルケニル基は、前記の定義と同義であり、好ましくは、ビニル基、1-プロペニル基、アリル基、1-ブテニル基、2-ブテニル基、または3-ブテニル基であり、さらに好ましくは、ビニル基、1-プロペニル基、またはアリル基である。置換基Cを有する場合、C2~C6のアルケニル基における水素原子が、置換基Cによって任意に置換される。 The C2-C6 alkenyl group of the "C2-C6 alkenyl group optionally substituted with substituent C" in R4 of the formula (1) has the same definition as described above, and preferably a vinyl group, 1- Propenyl group, allyl group, 1-butenyl group, 2-butenyl group, or 3-butenyl group, more preferably vinyl group, 1-propenyl group or allyl group. When having a substituent C, the hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent C.
 式(1)のR4における「C2~C6のハロアルケニル基」は、前記の定義と同義であり、好ましくは、2-フルオロビニル基、2,2-ジフルオロビニル基、2,2-ジクロロビニル基、3-フルオロアリル基、3,3-ジフルオロアリル基、または3,3-ジクロロアリル基であり、さらに好ましくは、2-フルオロビニル基、または2,2-ジフルオロビニル基である。 The “C2 to C6 haloalkenyl group” in R 4 of the formula (1) is as defined above, preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group or a 2,2-dichlorovinyl group And 3-fluoroallyl, 3,3-difluoroallyl or 3,3-dichloroallyl, more preferably 2-fluorovinyl or 2,2-difluorovinyl.
 式(1)のR4における「置換基Cで適宜置換されてもよいC2~C6のアルキニル基」のC2~C6のアルキニル基は、前記の定義と同義であり、好ましくは、エチニル基、1-プロピニル基、プロパルギル基、1-ブチニル基、2-ブチニル基、または3-ブチニル基であり、さらに好ましくは、エチニル基、1-プロピニル基、またはプロパルギル基である。置換基Cを有する場合、C2~C6のアルキニル基における水素原子が、置換基Cによって任意に置換される。 The C2 to C6 alkynyl group of the “C2 to C6 alkynyl group optionally substituted with substituent C” in R 4 of the formula (1) has the same definition as described above, preferably an ethynyl group, 1- Propynyl group, propargyl group, 1-butynyl group, 2-butynyl group or 3-butynyl group is preferable, and ethynyl group, 1-propynyl group or propargyl group is more preferable. When having a substituent C, the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent C.
 式(1)のR4における「C2~C6のハロアルキニル基」は、前記の定義と同義であり、好ましくは、3,3-ジフルオロ-1-プロピニル基、3,3,3-トリフルオロ-1-プロピニル基、4,4-ジフルオロ-1-ブチニル基、4,4-ジフルオロ-2-ブチニル基、4,4,4-トリフルオロ-1-ブチニル基、または4,4,4-トリフルオロ-2-ブチニル基であり、さらに好ましくは、3,3-ジフルオロ-1-プロピニル基、または3,3,3-トリフルオロ-1-プロピニル基である。 The “C2-C6 haloalkynyl group” in R 4 of the formula (1) is as defined above, preferably a 3,3-difluoro-1-propynyl group, 3,3,3-trifluoro-1 -Propynyl group, 4,4-difluoro-1-butynyl group, 4,4-difluoro-2-butynyl group, 4,4,4-trifluoro-1-butynyl group, or 4,4,4-trifluoro- 2-butynyl group, more preferably 3,3-difluoro-1-propynyl group or 3,3,3-trifluoro-1-propynyl group.
 式(1)のR4における「置換基Cで適宜置換されてもよいC1~C6のアルコキシ基」のC1~C6のアルコキシ基は、前記の定義と同義であり、好ましくは、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、イソブトキシ基、またはペンチルオキシ基であり、さらに好ましくは、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、またはブトキシ基である。置換基Cを有する場合、C1~C6のアルコキシ基における水素原子が、置換基Cによって任意に置換される。 The C1-C6 alkoxy group of the "C1-C6 alkoxy group optionally substituted with substituent C" in R4 of the formula (1) has the same definition as described above, preferably a methoxy group or an ethoxy group A propyloxy group, an isopropyloxy group, a butoxy group, an isobutoxy group or a pentyloxy group, and more preferably a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group or a butoxy group. When having a substituent C, a hydrogen atom in the C1 to C6 alkoxy group is optionally substituted by the substituent C.
 式(1)のR4における「C1~C6のハロアルコキシ基」は、前記の定義と同義であり、好ましくは、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、3,3-ジフルオロプロピルオキシ基、または3,3,3-トリフルオロプロピルオキシ基であり、さらに好ましくは、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、または2,2,2-トリフルオロエトキシ基である。 The “C1 to C6 haloalkoxy group” in R 4 of the formula (1) is as defined above, preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2, 2-trifluoroethoxy group, 3,3-difluoropropyloxy group, or 3,3,3-trifluoropropyloxy group, more preferably difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group A group or a 2,2,2-trifluoroethoxy group.
 式(1)のR4における「置換基Cで適宜置換されてもよいC3~C8のシクロアルコキシ基」のC3~C8のシクロアルコキシ基は、前記の定義と同義であり、好ましくは、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、またはシクロヘキシルオキシ基であり、さらに好ましくは、シクロプロピルオキシ基、またはシクロブトキシ基である。置換基Cを有する場合、C3~C8のシクロアルコキシ基における水素原子が、置換基Cによって任意に置換される。 The C3 to C8 cycloalkoxy group of the "C3 to C8 cycloalkoxy group which may be optionally substituted with substituent C" in R4 of the formula (1) has the same definition as that described above, preferably, cyclopropyloxy A cyclobutoxy group, a cyclopentyloxy group or a cyclohexyloxy group, more preferably a cyclopropyloxy group or a cyclobutoxy group. When having a substituent C, the hydrogen atom in the C3-C8 cycloalkoxy group is optionally substituted by the substituent C.
 式(1)のR4における「置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基」のC2~C6のアルケニルオキシ基は、前記の定義と同義であり、好ましくは、ビニルオキシ基、1-プロペニルオキシ基、アリルオキシ基、1-ブテニルオキシ基、2-ブテニルオキシ基、または3-ブテニルオキシ基であり、さらに好ましくは、ビニルオキシ基、1-プロペニルオキシ基、またはアリルオキシ基である。置換基Cを有する場合、C2~C6のアルケニルオキシ基における水素原子が、置換基Cによって任意に置換される。 The C2-C6 alkenyloxy group of the "C2-C6 alkenyloxy group optionally substituted with substituent C" in R4 of the formula (1) has the same definition as described above, preferably a vinyloxy group, 1-propenyloxy group, allyloxy group, 1-butenyloxy group, 2-butenyloxy group, or 3-butenyloxy group, more preferably vinyloxy group, 1-propenyloxy group, or allyloxy group. When having a substituent C, the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted by the substituent C.
 式(1)のR4における「C2~C6のハロアルケニルオキシ基」は、前記の定義と同義であり、好ましくは、2-フルオロビニルオキシ基、2,2-ジフルオロビニルオキシ基、2,2-ジクロロビニルオキシ基、3-フルオロアリルオキシ基、3,3-ジフルオロアリルオキシ基、または3,3-ジクロロアリルオキシ基であり、さらに好ましくは、2-フルオロビニルオキシ基、または2,2-ジフルオロビニルオキシ基である。 The “C2 to C6 haloalkenyloxy group” in R 4 of the formula (1) is as defined above, preferably a 2-fluorovinyloxy group, a 2,2-difluorovinyloxy group, or 2,2- Dichlorovinyloxy group, 3-fluoroallyloxy group, 3,3-difluoroallyloxy group, or 3,3-dichloroallyloxy group, more preferably 2-fluorovinyloxy group, or 2,2-difluoro It is a vinyloxy group.
 式(1)のR4における「置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基」のC3~C6のアルキニルオキシ基は、前記の定義と同義であり、好ましくは、プロパルギルオキシ基、2-ブチニルオキシ基、または3-ブチニルオキシ基であり、さらに好ましくは、プロパルギルオキシ基である。置換基Cを有する場合、C3~C6のアルキニルオキシ基における水素原子が、置換基Cによって任意に置換される。 The C3 to C6 alkynyloxy group of the “C3 to C6 alkynyloxy group optionally substituted with substituent C” in R 4 of Formula (1) has the same definition as that described above, and preferably a propargyloxy group A 2-butynyloxy group or a 3-butynyloxy group, more preferably a propargyloxy group. When having a substituent C, the hydrogen atom in the C3-C6 alkynyloxy group is optionally substituted by the substituent C.
 式(1)のR4における「C3~C6のハロアルキニルオキシ基」は、前記の定義と同義であり、好ましくは、4,4-ジフルオロ-2-ブチニルオキシ基、4-クロロ-4,4-ジフルオロ-2-ブチニルオキシ基、4-ブロモ-4,4-ジフルオロ-2-ブチニルオキシ基、または4,4,4-トリフルオロ-2-ブチニルオキシ基であり、さらに好ましくは、4,4-ジフルオロ-2-ブチニルオキシ基、または4,4,4-トリフルオロ-2-ブチニルオキシ基である。 The “C3-C6 haloalkynyloxy group” in R 4 of the formula (1) is as defined above, preferably a 4,4-difluoro-2-butynyloxy group, 4-chloro-4,4-difluoro -2-butynyloxy group, 4-bromo-4,4-difluoro-2-butynyloxy group, or 4,4,4-trifluoro-2-butynyloxy group, more preferably 4,4-difluoro-2- It is a butynyloxy group or a 4,4,4-trifluoro-2-butynyloxy group.
 式(1)のR4における「置換基Dで適宜置換されてもよいアリール基」のアリール基は、前記の定義と同義である。好ましくは、フェニル基、またはナフチル基であり、さらに好ましくは、フェニル基である。置換基Dを有する場合、アリール基における水素原子が、置換基Dによって任意に置換される。 The aryl group of the “aryl group which may be optionally substituted with the substituent D” in R 4 of the formula (1) has the same definition as the above. Preferably, it is a phenyl group or a naphthyl group, more preferably a phenyl group. When having a substituent D, the hydrogen atom in the aryl group is optionally substituted by the substituent D.
 式(1)のR4における「置換基Dで適宜置換されてもよいヘテロアリール基」のヘテロアリール基は前記の定義と同義である。好ましくは、ピリジル基、ピリダジニル基、ピリミジニル基、ピラジニル基、トリアジニル基、テトラジニル基、チエニル基、チアゾリル基、イソチアゾリル基、チアジアゾリル基、チアトリアゾリル基、ピロリル基、ピラゾリル基、イミダゾリル基、トリアゾリル基、テトラゾリル基、ペンタゾリル基、フリル基、オキサゾリル基、イソキサゾリル基、オキサジアゾリル基、またはオキサトリアゾリル基であり、さらに好ましくは、ピリジル基、ピリダジニル基、ピリミジニル基、ピラジニル基、チエニル基、チアゾリル基、イソチアゾリル基、チアジアゾリル基、ピロリル基、ピラゾリル基、イミダゾリル基、トリアゾリル基、フリル基、オキサゾリル基、イソキサゾリル基、またはオキサジアゾリル基である。置換基Dを有する場合、ヘテロアリール基における水素原子が、置換基Dによって任意に置換される。 The heteroaryl group of the “heteroaryl group which may be optionally substituted with the substituent D” in R 4 of the formula (1) has the same definition as the above. Preferably, pyridyl group, pyridazinyl group, pyrimidinyl group, pyrazinyl group, triazinyl group, tetrazinyl group, thienyl group, thiazolyl group, isothiazolyl group, thiadiazolyl group, thiatriazolyl group, pyrrolyl group, pyrazolyl group, imidazolyl group, triazolyl group, tetrazolyl group. , Pentazolyl group, furyl group, oxazolyl group, isoxazolyl group, oxadiazolyl group or oxatriazolyl group, more preferably pyridyl group, pyridazinyl group, pyrimidinyl group, pyrazinyl group, thienyl group, thiazolyl group, isothiazolyl group, Thiadiazolyl group, pyrrolyl group, pyrazolyl group, imidazolyl group, triazolyl group, furyl group, oxazolyl group, isoxazolyl group, or oxadiazolyl group. When having a substituent D, the hydrogen atom in the heteroaryl group is optionally substituted by the substituent D.
 式(1)のR4における「置換基Dで適宜置換されてもよいアリールオキシ基」のアリールオキシ基は、前記の定義と同義である。好ましくは、フェノキシ基、またはナフチルオキシ基であり、さらに好ましくは、フェノキシ基である。置換基Dを有する場合、アリールオキシ基における水素原子が、置換基Dによって任意に置換される。 The aryloxy group of "an aryloxy group which may be optionally substituted with a substituent D" in R 4 of the formula (1) has the same definition as the above. Preferably, it is a phenoxy group or a naphthyloxy group, more preferably a phenoxy group. When having a substituent D, the hydrogen atom in the aryloxy group is optionally substituted by the substituent D.
 式(1)のR4における「置換基Dで適宜置換されてもよいヘテロアリールオキシ基」のヘテロアリールオキシ基は、前記の定義と同義である。好ましくは、ピリジルオキシ基、ピリダジニルオキシ基、ピリミジニルオキシ基、ピラジニルオキシ基、トリアジニルオキシ基、テトラジニルオキシ基、チエニルオキシ基、チアゾリルオキシ基、イソチアゾリルオキシ基、チアジアゾリルオキシ基、チアトリアゾリルオキシ基、ピロリルオキシ基、ピラゾリルオキシ基、イミダゾリルオキシ基、トリアゾリルオキシ基、テトラゾリルオキシ基、ペンタゾリルオキシ基、フリルオキシ基、オキサゾリルオキシ基、イソキサゾリルオキシ基、オキサジアゾリルオキシ基、またはオキサトリアゾリルオキシ基であり、さらに好ましくは、ピリジルオキシ基、ピリダジニルオキシ基、ピリミジニルオキシ基、ピラジニルオキシ基、チエニルオキシ基、チアゾリルオキシ基、イソチアゾリルオキシ基、チアジアゾリルオキシ基、ピロリルオキシ基、ピラゾリルオキシ基、イミダゾリルオキシ基、トリアゾリルオキシ基、フリルオキシ基、オキサゾリルオキシ基、イソキサゾリルオキシ基、またはオキサジアゾリルオキシ基である。置換基Dを有する場合、ヘテロアリールオキシ基における水素原子が、置換基Dによって任意に置換される。 The heteroaryloxy group of “the heteroaryloxy group which may be optionally substituted with the substituent D” in R 4 of the formula (1) is as defined above. Preferably, pyridyloxy group, pyridazinyloxy group, pyrimidinyloxy group, pyrazinyloxy group, triazinyloxy group, tetradinyloxy group, thienyloxy group, thiazolyloxy group, isothiazolyloxy group, thiadiazolyloxy group Group, thiatriazolyloxy group, pyrrolyloxy group, pyrazolyloxy group, imidazolyloxy group, triazolyloxy group, tetrazolyloxy group, pentazolyloxy group, furyloxy group, oxazolyloxy group, isoxazolyl And more preferably a pyridyloxy group, a pyridazinyloxy group, a pyrimidinyloxy group, a pyrazinyloxy group, a thienyloxy group, a thiazolyloxy group, or an isothioxy group. Azolyloxy group, Asian benzotriazolyl group, pyrrolyloxy group, a pyrazolyloxy group, imidazolyloxy group, triazolyl group, furyl group, benzoxazolyl group, benzisoxazolyl group or oxadiazolyl group. When having a substituent D, the hydrogen atom in the heteroaryloxy group is optionally substituted by the substituent D.
 式(1)のR4における「置換基Dで適宜置換されてもよいアラルキルオキシ基」のアラルキルオキシ基は、前記の定義と同義である。好ましくは、ベンジルオキシ基、フェネチルオキシ基、またはナフチルメチルオキシ基であり、さらに好ましくは、ベンジルオキシ基、またはフェネチルオキシ基である。置換基Dを有する場合、アラルキルオキシ基における水素原子が、置換基Dによって任意に置換される。 The aralkyloxy group of the “aralkyloxy group which may be optionally substituted with the substituent D” in R 4 of the formula (1) has the same definition as the above. Preferably, it is a benzyloxy group, a phenethyloxy group, or a naphthylmethyloxy group, and more preferably a benzyloxy group or a phenethyloxy group. When having a substituent D, the hydrogen atom in the aralkyloxy group is optionally substituted by the substituent D.
 式(1)のR4における「RaRbN-」のRaおよびRbは、前記と同義である。「RaRbN-」として、好ましくは、アミノ基、メチルアミノ基、エチルアミノ基、プロピルアミノ基、イソプロピルアミノ基、(メトキシメチル)アミノ基、(2-メトキシエチル)アミノ基、(シアノメチル)アミノ基、(2-シアノエチル)アミノ基、ジメチルアミノ基、エチル(メチル)アミノ基、メチル(プロピル)アミノ基、イソプロピル(メチル)アミノ基、(メトキシメチル)メチルアミノ基、(2-メトキシエチル)メチルアミノ基、(シアノメチル)メチルアミノ基、(2-シアノエチル)メチルアミノ基、ジエチルアミノ基、エチル(プロピル)アミノ基、エチル(イソプロピル)アミノ基、エチル(メトキシメチル)アミノ基、エチル(2-メトキシエチル)アミノ基、(シアノメチル)エチルアミノ基、(2-シアノエチル)エチルアミノ基、2,2-ジフルオロエチルアミノ基、2,2,2-トリフルオロエチルアミノ基、シクロプロピルアミノ基、(シクロプロピル)メチルアミノ基、ピロリジニル基、またはピペリジニル基であり、さらに好ましくは、ジメチルアミノ基、エチル(メチル)アミノ基、イソプロピル(メチル)アミノ基、ジエチルアミノ基、またはエチル(イソプロピル)アミノ基である。 Ra and Rb of "RaRbN-" in R4 of Formula (1) are as defined above. As "RaRbN-", preferably, amino, methylamino, ethylamino, propylamino, isopropylamino, (methoxymethyl) amino, (2-methoxyethyl) amino, (cyanomethyl) amino, (2-cyanoethyl) amino group, dimethylamino group, ethyl (methyl) amino group, methyl (propyl) amino group, isopropyl (methyl) amino group, (methoxymethyl) methylamino group, (2-methoxyethyl) methylamino group (Cyanomethyl) methylamino group, (2-cyanoethyl) methylamino group, diethylamino group, ethyl (propyl) amino group, ethyl (isopropyl) amino group, ethyl (methoxymethyl) amino group, ethyl (2-methoxyethyl) amino Group, (cyanomethyl) ethylamino group, (2- Annoethyl) ethylamino group, 2,2-difluoroethylamino group, 2,2,2-trifluoroethylamino group, cyclopropylamino group, (cyclopropyl) methylamino group, pyrrolidinyl group, or piperidinyl group, and Preferably, it is a dimethylamino group, an ethyl (methyl) amino group, an isopropyl (methyl) amino group, a diethylamino group, or an ethyl (isopropyl) amino group.
 式(1)のR4における「Rc-L-」のRcおよびLは、前記と同義ある。「Rc-L-」として、好ましくは、メチルチオ基、メタンスルフィニル基、メタンスルホニル基、トリフルオロメチルチオ基、トリフルオロメタンスルフィニル基、またはトリフルオロメタンスルホニル基であり、さらに好ましくは、メチルチオ基、メタンスルフィニル基、またはメタンスルホニル基である。 Rc and L of "Rc-L-" in R4 of Formula (1) are as defined above. Preferred as "Rc-L-" is a methylthio group, a methanesulfinyl group, a methanesulfonyl group, a trifluoromethylthio group, a trifluoromethanesulfinyl group, or a trifluoromethanesulfonyl group, and more preferably a methylthio group, a methanesulfinyl group Or a methanesulfonyl group.
 式(1)のR4における「Rx1C(=O)-」のRx1は、前記と同義である。「Rx1C(=O)-」として、好ましくは、アセチル基、メトキシアセチル基、シアノアセチル基、プロピオニル基、ジフルオロアセチル基、トリフルオロアセチル基、シクロプロパンカルボニル基、メトキシカルボニル基、エトキシカルボニル基、2,2-ジフルオロエトキシカルボニル基、2,2,2-トリフルオロエトキシカルボニル基、3,3,3-トリフルオロプロピルオキシカルボニル基、シクロプロピルオキシカルボニル基、アミノカルボニル基、メチルアミノカルボニル基、エチルアミノカルボニル基、(メトキシメチル)アミノカルボニル基、(2-メトキシエチル)アミノカルボニル基、(シアノメチル)アミノカルボニル基、(2-シアノエチル)アミノカルボニル基、ジメチルアミノカルボニル基、エチル(メチル)アミノカルボニル基、ジエチルアミノカルボニル基、(メトキシメチル)メチルアミノカルボニル基、(2-メトキシエチル)メチルアミノカルボニル基、(シアノメチル)メチルアミノカルボニル基、(2-シアノエチル)メチルアミノカルボニル基、2,2-ジフルオロエチルアミノカルボニル基、2,2,2-トリフルオロエチルアミノカルボニル基、シクロプロピルアミノカルボニル基、シクロプロピル(メチル)アミノカルボニル基、ピロリジニルカルボニル基、またはピペリジニルカルボニル基であり、さらに好ましくは、アセチル基、メトキシアセチル基、シアノアセチル基、ジフルオロアセチル基、トリフルオロアセチル基、メトキシカルボニル基、エトキシカルボニル基、アミノカルボニル基、ジメチルアミノカルボニル基、エチル(メチル)アミノカルボニル基、またはジエチルアミノカルボニル基である。 Rx1 of "Rx1C (= O)-" in R4 of Formula (1) is as defined above. As “Rx 1 C (= O) —”, preferably, acetyl group, methoxyacetyl group, cyanoacetyl group, propionyl group, difluoroacetyl group, trifluoroacetyl group, cyclopropanecarbonyl group, methoxycarbonyl group, ethoxycarbonyl group, 2 , 2-Difluoroethoxycarbonyl group, 2,2,2-trifluoroethoxycarbonyl group, 3,3,3-trifluoropropyloxycarbonyl group, cyclopropyloxycarbonyl group, aminocarbonyl group, methylaminocarbonyl group, ethylamino Carbonyl group, (methoxymethyl) aminocarbonyl group, (2-methoxyethyl) aminocarbonyl group, (cyanomethyl) aminocarbonyl group, (2-cyanoethyl) aminocarbonyl group, dimethylaminocarbonyl group, ethyl (meth ) Aminocarbonyl group, diethylaminocarbonyl group, (methoxymethyl) methylaminocarbonyl group, (2-methoxyethyl) methylaminocarbonyl group, (cyanomethyl) methylaminocarbonyl group, (2-cyanoethyl) methylaminocarbonyl group, 2,2 -Difluoroethylaminocarbonyl group, 2,2,2-trifluoroethylaminocarbonyl group, cyclopropylaminocarbonyl group, cyclopropyl (methyl) aminocarbonyl group, pyrrolidinylcarbonyl group, or piperidinylcarbonyl group, More preferably, they are acetyl, methoxyacetyl, cyanoacetyl, difluoroacetyl, trifluoroacetyl, methoxycarbonyl, ethoxycarbonyl, aminocarbonyl, dimethylaminocarboyl. Group, ethyl (methyl) aminocarbonyl groups or diethylamino group.
 式(1)のR4における「Rx1C(=O)O-」のRx1は、前記と同義ある。「Rx1C(=O)O-」として、好ましくは、アセチルオキシ基、メトキシアセチルオキシ基、シアノアセチルオキシ基、プロピオニルオキシ基、ジフルオロアセチルオキシ基、トリフルオロアセチルオキシ基、シクロプロパンカルボニルオキシ基、メトキシカルボニルオキシ基、エトキシカルボニルオキシ基、2,2-ジフルオロエトキシカルボニルオキシ基、2,2,2-トリフルオロエトキシカルボニルオキシ基、3,3,3-トリフルオロプロピルオキシカルボニルオキシ基、シクロプロピルオキシカルボニルオキシ基、アミノカルボニルオキシ基、メチルアミノカルボニルオキシ基、エチルアミノカルボニルオキシ基、(メトキシメチル)アミノカルボニルオキシ基、(2-メトキシエチル)アミノカルボニルオキシ基、(シアノメチル)アミノカルボニルオキシ基、(2-シアノエチル)アミノカルボニルオキシ基、ジメチルアミノカルボニルオキシ基、エチル(メチル)アミノカルボニルオキシ基、ジエチルアミノカルボニルオキシ基、(メトキシメチル)メチルアミノカルボニルオキシ基、(2-メトキシエチル)メチルアミノカルボニルオキシ基、(シアノメチル)メチルアミノカルボニルオキシ基、(2-シアノエチル)メチルアミノカルボニルオキシ基、2,2-ジフルオロエチルアミノカルボニルオキシ基、2,2,2-トリフルオロエチルアミノカルボニルオキシ基、シクロプロピルアミノカルボニルオキシ基、シクロプロピル(メチル)アミノカルボニルオキシ基、ピロリジニルカルボニルオキシ基、またはピペリジニルカルボニルオキシ基であり、さらに好ましくは、アセチルオキシ基、メトキシアセチルオキシ基、シアノアセチルオキシ基、ジフルオロアセチルオキシ基、トリフルオロアセチルオキシ基、メトキシカルボニルオキシ基、エトキシカルボニルオキシ基、アミノカルボニルオキシ基、ジメチルアミノカルボニルオキシ基、エチル(メチル)アミノカルボニルオキシ基、またはジエチルアミノカルボニルオキシ基である。 Rx1 of “Rx1C (= O) O—” in R4 of Formula (1) has the same meaning as described above. As "Rx1C (= O) O-", preferably, acetyloxy, methoxyacetyloxy, cyanoacetyloxy, propionyloxy, difluoroacetyloxy, trifluoroacetyloxy, cyclopropanecarbonyloxy, methoxy Carbonyloxy, ethoxycarbonyloxy, 2,2-difluoroethoxycarbonyloxy, 2,2,2-trifluoroethoxycarbonyloxy, 3,3,3-trifluoropropyloxycarbonyloxy, cyclopropyloxycarbonyl Oxy group, amino carbonyloxy group, methylamino carbonyloxy group, ethyl amino carbonyloxy group, (methoxymethyl) amino carbonyloxy group, (2-methoxyethyl) amino carbonyloxy group, (sia (Methyl) aminocarbonyloxy group, (2-cyanoethyl) aminocarbonyloxy group, dimethylaminocarbonyloxy group, ethyl (methyl) aminocarbonyloxy group, diethylamino carbonyloxy group, (methoxymethyl) methylamino carbonyloxy group, (2- (Methoxyethyl) methylaminocarbonyloxy group, (cyanomethyl) methylaminocarbonyloxy group, (2-cyanoethyl) methylaminocarbonyloxy group, 2,2-difluoroethylaminocarbonyloxy group, 2,2,2-trifluoroethylamino A carbonyloxy group, a cyclopropylamino carbonyloxy group, a cyclopropyl (methyl) amino carbonyloxy group, a pyrrolidinyl carbonyloxy group, or a piperidinyl carbonyloxy group; More preferably, acetyloxy, methoxyacetyloxy, cyanoacetyloxy, difluoroacetyloxy, trifluoroacetyloxy, methoxycarbonyloxy, ethoxycarbonyloxy, aminocarbonyloxy, dimethylaminocarbonyloxy, It is an ethyl (methyl) amino carbonyloxy group or a diethyl amino carbonyloxy group.
 式(1)のR4における「Rx2C(=O)N(Rx3)-」(ここで、Rx2は、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはRaRbN-(ここで、RaおよびRbは、前記と同義である。)を表し、Rx3は、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表す。)の各用語の定義は、前記の定義と同義である。なお、「置換基Bで適宜置換されてもよいC1~C6のアルキル基」に関しては、置換基Bを有する場合、C1~C6のアルキル基における水素原子が、置換基Bによって任意に置換される。Rx2として、好ましくは、水素原子、メチル基、メトキシメチル基、シアノメチル基、エチル基、ジフルオロメチル基、トリフルオロメチル基、シクロプロピル基、メトキシ基、エトキシ基、2,2-ジフルオロエトキシ、2,2,2-トリフルオロエトキシ基、シクロプロピルオキシ基、アミノ基、メチルアミノ基、エチルアミノ基、(メトキシメチル)アミノ基、(2-メトキシエチル)アミノ基、(シアノメチル)アミノ基、(2-シアノエチル)アミノ基、ジメチルアミノ基、エチルメチルアミノ基、ジエチルアミノ基、(メトキシメチル)メチルアミノ基、(2-メトキシエチル)メチルアミノ基、(シアノメチル)メチルアミノ基、(2-シアノエチル)メチルアミノ基、2,2-ジフルオロエチルアミノ基、2,2,2-トリフルオロエチルアミノ基、シクロプロピルアミノ基、(シクロプロピル)メチルアミノ基、ピロリジニル基、またはピペリジニル基であり、さらに好ましくは、水素原子、メチル基、メトキシメチル基、シアノメチル基、ジフルオロメチル基、トリフルオロメチル基、メトキシ基、エトキシ基、アミノ基、ジメチルアミノ基、エチルメチルアミノ基、またはジエチルアミノ基である。また、Rx3として、好ましくは、水素原子、メチル基、メトキシメチル基、エトキシメチル基、シアノメチル基、エチル基、2-メトキシエチル基、2-エトキシエチル基、2-シアノエチル基、プロピル基、2,2-ジフルオロエチル基、2,2,2-トリフルオロエチル基、またはシクロプロピル基であり、さらに好ましくは、水素原子、メチル基、メトキシメチル基、シアノメチル基、エチル基、2-メトキシエチル基、2,2-ジフルオロエチル基、または2,2,2-トリフルオロエチル基である。 “Rx2C (= O) N (Rx3) —” in R4 of the formula (1) (wherein Rx2 is a hydrogen atom, a C1-C6 alkyl group optionally substituted with a substituent B, C1-C6 A haloalkyl group, a C3 to C8 cycloalkyl group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, a C3 to C8 cycloalkoxy group, or RaRbN- (wherein Ra and Rb are as defined above) Rx3 represents a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or a C3 to C8 cycloalkyl group. The definition of terms is as defined above. In the case of “a C1-C6 alkyl group optionally substituted with a substituent B”, when having a substituent B, the hydrogen atom in the C1-C6 alkyl group is optionally substituted by a substituent B . As Rx2, preferably, a hydrogen atom, methyl group, methoxymethyl group, cyanomethyl group, ethyl group, difluoromethyl group, trifluoromethyl group, cyclopropyl group, methoxy group, ethoxy group, 2, 2-difluoroethoxy, 2,2-trifluoroethoxy, cyclopropyloxy, amino, methylamino, ethylamino, (methoxymethyl) amino, (2-methoxyethyl) amino, (cyanomethyl) amino, (2- Cyanoethyl) amino group, dimethylamino group, ethylmethylamino group, diethylamino group, (methoxymethyl) methylamino group, (2-methoxyethyl) methylamino group, (cyanomethyl) methylamino group, (2-cyanoethyl) methylamino group , 2,2-difluoroethylamino group, 2,2,2-to Fluoroethylamino group, cyclopropylamino group, (cyclopropyl) methylamino group, pyrrolidinyl group or piperidinyl group, more preferably a hydrogen atom, methyl group, methoxymethyl group, cyanomethyl group, difluoromethyl group, trifluoro It is a methyl group, a methoxy group, an ethoxy group, an amino group, a dimethylamino group, an ethylmethylamino group or a diethylamino group. As Rx 3, preferably, a hydrogen atom, a methyl group, a methoxymethyl group, an ethoxymethyl group, a cyanomethyl group, an ethyl group, a 2-methoxyethyl group, a 2-ethoxyethyl group, a 2-cyanoethyl group, a propyl group, 2-difluoroethyl group, 2,2,2-trifluoroethyl group, or cyclopropyl group, more preferably hydrogen atom, methyl group, methoxymethyl group, cyanomethyl group, ethyl group, 2-methoxyethyl group, It is a 2,2-difluoroethyl group or a 2,2,2-trifluoroethyl group.
 式(1)中のWは、R5で適宜0~2置換されてもよいC1~C6のアルキレン基を表す。 W in the formula (1) represents a C1 to C6 alkylene group which may be optionally substituted 0 to 2 with R 5.
 中でもWは、R5で適宜0~2置換されてもよいメチレン基、またはエチレン基が好ましく、
 特にWは、R5で適宜0~2置換されてもよいメチレン基が好ましい。
Among them, W is preferably a methylene group which may be optionally substituted 0 to 2 with R 5, or an ethylene group,
In particular, W is preferably a methylene group which may be optionally substituted 0 to 2 with R 5.
 式(1)中のWにおける「R5で適宜0~2置換されてもよいC1~C6のアルキレン基」のアルキレン基は、前記の定義と同義であり、好ましくは、メチレン基、またはエチレン基であり、さらに好ましくはメチレン基である。置換基R5を有する場合、C1~C6のアルキレン基における水素原子が、置換基R5によって任意に置換される。 The alkylene group of “a C1 to C6 alkylene group optionally substituted by 0 to 2 R 5 optionally for W in the formula (1)” has the same meaning as defined above, preferably a methylene group or an ethylene group And more preferably a methylene group. When having a substituent R5, the hydrogen atom in the C1-C6 alkylene group is optionally substituted by the substituent R5.
 式(1)中のR5は、水酸基、シアノ基、ハロゲン原子、置換基Cで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Cで適宜置換されてもよいC2~C6のアルケニル基、C2~C6のハロアルケニル基、置換基Cで適宜置換されてもよいC2~C6のアルキニル基、C2~C6のハロアルキニル基、置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、置換基Cで適宜置換されてもよいC3~C8のシクロアルコキシ基、置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、C2~C6のハロアルケニルオキシ基、置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、C3~C6のハロアルキニルオキシ基、Rc-L-(ここで、RcおよびLは、前記と同義である。)、またはRx1C(=O)-(ここで、Rx1は、前記と同義である。)を表す。 R5 in the formula (1) may be optionally substituted with a hydroxyl group, a cyano group, a halogen atom, a C1-C6 alkyl group optionally substituted with a substituent C, a C1-C6 haloalkyl group, a substituent C A good C3 to C8 cycloalkyl group, a C2 to C6 alkenyl group optionally substituted with a substituent C, a C2 to C6 haloalkenyl group, a C2 to C6 alkynyl group optionally substituted with a substituent C , A C2 to C6 haloalkynyl group, a C1 to C6 alkoxy group optionally substituted with a substituent C, a C1 to C6 haloalkoxy group, a C3 to C8 cycloalkoxy optionally substituted with a substituent C Group, C2-C6 alkenyloxy group which may be optionally substituted with substituent C, C2-C6 haloalkenyloxy group, C3-C6 alkynyl which may be optionally substituted with substituent C Xy group, a C3-C6 haloalkynyl oxy group, Rc-L- (wherein Rc and L are as defined above), or Rx1C (= O)-(wherein Rx1 is as defined above) Represents the
 中でもR5は、水酸基、ハロゲン原子、置換基Cで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、C2~C6のハロアルケニルオキシ基、置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、C3~C6のハロアルキニルオキシ基、またはRx1C(=O)-(ここで、Rx1は、前記と同義である。)が好ましく、
 特にR5は、水酸基、ハロゲン原子、または置換基Cで適宜置換されてもよいC1~C6のアルコキシ基が好ましい。
Among them, R5 is a hydroxyl group, a halogen atom, a C1 to C6 alkyl group optionally substituted with a substituent C, a C1 to C6 haloalkyl group, a C1 to C6 alkoxy group optionally substituted with a substituent C, C1-C6 haloalkoxy group, C2-C6 alkenyloxy group optionally substituted with substituent C, C2-C6 haloalkenyloxy group, C3-C6 alkynyl optionally substituted with substituent C An oxy group, a C3-C6 haloalkynyloxy group, or Rx1C (= O)-(wherein Rx1 is as defined above) is preferable,
In particular, R5 is preferably a hydroxyl group, a halogen atom, or a C1 to C6 alkoxy group which may be optionally substituted by a substituent C.
 式(1)のR5には、水酸基、およびシアノ基が含まれる。 R 5 in the formula (1) includes a hydroxyl group and a cyano group.
 式(1)のR5におけるハロゲン原子は、前記の定義と同義であり、好ましくはフッ素原子、塩素原子、臭素原子、またはヨウ素原子である。 The halogen atom in R5 of the formula (1) is as defined above, preferably a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.
 式(1)のR5における「置換基Cで適宜置換されてもよいC1~C6のアルキル基」のC1~C6のアルキル基は、前記の定義と同義であり、好ましくは、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、またはイソブチル基であり、さらに好ましくは、メチル基、エチル基、プロピル基、またはイソプロピル基である。置換基Cを有する場合、C1~C6のアルキル基における水素原子が、置換基Cによって任意に置換される。 The C1-C6 alkyl group of the "C1-C6 alkyl group optionally substituted with substituent C" in R5 of Formula (1) has the same definition as described above, and preferably a methyl group or an ethyl group A propyl group, an isopropyl group, a butyl group or an isobutyl group, and more preferably a methyl group, an ethyl group, a propyl group or an isopropyl group. When having a substituent C, the hydrogen atom in the C1-C6 alkyl group is optionally substituted by the substituent C.
 式(1)のR5における「C1~C6のハロアルキル基」は、前記の定義と同義であり、好ましくは、ジフルオロメチル基、トリフルオロメチル基、2,2-ジフルオロエチル基、2,2,2-トリフルオロエチル基、3,3-ジフルオロプロピル基、または3,3,3-トリフルオロプロピル基であり、さらに好ましくは、ジフルオロメチル基、トリフルオロメチル基、2,2-ジフルオロエチル基、または2,2,2-トリフルオロエチル基である。 The “C1 to C6 haloalkyl group” in R 5 of the formula (1) is as defined above, preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, 2,2,2 -Trifluoroethyl group, 3,3-difluoropropyl group, or 3,3,3-trifluoropropyl group, more preferably difluoromethyl group, trifluoromethyl group, 2,2-difluoroethyl group, or 2,2,2-trifluoroethyl group.
 式(1)のR5における「置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基」のC3~C8のシクロアルキル基は、前記の定義と同義であり、好ましくは、シクロプロピル基、シクロブチル基、シクロペンチル基、またはシクロヘキシル基であり、さらに好ましくは、シクロプロピル基、またはシクロブチル基である。置換基Cを有する場合、C3~C8のシクロアルキル基における水素原子が、置換基Cによって任意に置換される。 The C3 to C8 cycloalkyl group of the “C3 to C8 cycloalkyl group optionally substituted with substituent C” in R 5 of Formula (1) has the same definition as described above, and preferably a cyclopropyl group A cyclobutyl group, a cyclopentyl group or a cyclohexyl group, more preferably a cyclopropyl group or a cyclobutyl group. When having a substituent C, the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent C.
 式(1)のR5における「置換基Cで適宜置換されてもよいC2~C6のアルケニル基」のC2~C6のアルケニル基は、前記の定義と同義であり、好ましくは、ビニル基、1-プロペニル基、アリル基、1-ブテニル基、2-ブテニル基、または3-ブテニル基であり、さらに好ましくは、ビニル基、1-プロペニル基、またはアリル基である。置換基Cを有する場合、C2~C6のアルケニル基における水素原子が、置換基Cによって任意に置換される。 The C2-C6 alkenyl group of the "C2-C6 alkenyl group which may be optionally substituted with substituent C" in R5 of the formula (1) has the same meaning as defined above, preferably a vinyl group, 1- Propenyl group, allyl group, 1-butenyl group, 2-butenyl group, or 3-butenyl group, more preferably vinyl group, 1-propenyl group or allyl group. When having a substituent C, the hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent C.
 式(1)のR5における「C2~C6のハロアルケニル基」は、前記の定義と同義であり、好ましくは、2-フルオロビニル基、2,2-ジフルオロビニル基、2,2-ジクロロビニル基、3-フルオロアリル基、3,3-ジフルオロアリル基、または3,3-ジクロロアリル基であり、さらに好ましくは、2-フルオロビニル基、または2,2-ジフルオロビニル基である。 The “C2 to C6 haloalkenyl group” in R 5 of the formula (1) is as defined above, preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group or a 2,2-dichlorovinyl group And 3-fluoroallyl, 3,3-difluoroallyl or 3,3-dichloroallyl, more preferably 2-fluorovinyl or 2,2-difluorovinyl.
 式(1)のR5における「置換基Cで適宜置換されてもよいC2~C6のアルキニル基」のC2~C6のアルキニル基は、前記の定義と同義であり、好ましくは、エチニル基、1-プロピニル基、プロパルギル基、1-ブチニル基、2-ブチニル基、または3-ブチニル基であり、さらに好ましくは、エチニル基、1-プロピニル基、またはプロパルギル基である。置換基Cを有する場合、C2~C6のアルキニル基における水素原子が、置換基Cによって任意に置換される。 The C2 to C6 alkynyl group of the “C2 to C6 alkynyl group optionally substituted with substituent C” in R 5 of the formula (1) has the same definition as described above, preferably an ethynyl group, 1- Propynyl group, propargyl group, 1-butynyl group, 2-butynyl group or 3-butynyl group is preferable, and ethynyl group, 1-propynyl group or propargyl group is more preferable. When having a substituent C, the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent C.
 式(1)のR5における「C2~C6のハロアルキニル基」は、前記の定義と同義であり、好ましくは、3,3-ジフルオロ-1-プロピニル基、3,3,3-トリフルオロ-1-プロピニル基、4,4-ジフルオロ-1-ブチニル基、4,4-ジフルオロ-2-ブチニル基、4,4,4-トリフルオロ-1-ブチニル基、または4,4,4-トリフルオロ-2-ブチニル基であり、さらに好ましくは、3,3-ジフルオロ-1-プロピニル基、または3,3,3-トリフルオロ-1-プロピニル基である。 The “C2-C6 haloalkynyl group” in R 5 of the formula (1) is as defined above, preferably a 3,3-difluoro-1-propynyl group, 3,3,3-trifluoro-1 -Propynyl group, 4,4-difluoro-1-butynyl group, 4,4-difluoro-2-butynyl group, 4,4,4-trifluoro-1-butynyl group, or 4,4,4-trifluoro- 2-butynyl group, more preferably 3,3-difluoro-1-propynyl group or 3,3,3-trifluoro-1-propynyl group.
 式(1)のR5における「置換基Cで適宜置換されてもよいC1~C6のアルコキシ基」のC1~C6のアルコキシ基は、前記の定義と同義であり、好ましくは、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、イソブトキシ基、またはペンチルオキシ基であり、さらに好ましくは、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、またはブトキシ基である。置換基Cを有する場合、C1~C6のアルコキシ基における水素原子が、置換基Cによって任意に置換される。 The C1-C6 alkoxy group of the “C1-C6 alkoxy group optionally substituted with substituent C” in R 5 of Formula (1) has the same definition as that described above, preferably a methoxy group or an ethoxy group A propyloxy group, an isopropyloxy group, a butoxy group, an isobutoxy group or a pentyloxy group, and more preferably a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group or a butoxy group. When having a substituent C, a hydrogen atom in the C1 to C6 alkoxy group is optionally substituted by the substituent C.
 式(1)のR5における「C1~C6のハロアルコキシ基」は、前記の定義と同義であり、好ましくは、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、3,3-ジフルオロプロピルオキシ基、または3,3,3-トリフルオロプロピルオキシ基であり、さらに好ましくは、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、または2,2,2-トリフルオロエトキシ基である。 The “C1 to C6 haloalkoxy group” in R 5 of the formula (1) is as defined above, preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2, 2-trifluoroethoxy group, 3,3-difluoropropyloxy group, or 3,3,3-trifluoropropyloxy group, more preferably difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group A group or a 2,2,2-trifluoroethoxy group.
 式(1)のR5における「置換基Cで適宜置換されてもよいC3~C8のシクロアルコキシ基」のC3~C8のシクロアルコキシ基は、前記の定義と同義であり、好ましくは、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、またはシクロヘキシルオキシ基であり、さらに好ましくは、シクロプロピルオキシ基、またはシクロブトキシ基である。置換基Cを有する場合、C3~C8のシクロアルコキシ基における水素原子が、置換基Cによって任意に置換される。 The C3 to C8 cycloalkoxy group of the "C3 to C8 cycloalkoxy group which may be optionally substituted with substituent C" in R 5 of the formula (1) has the same definition as that described above, preferably, cyclopropyloxy A cyclobutoxy group, a cyclopentyloxy group or a cyclohexyloxy group, more preferably a cyclopropyloxy group or a cyclobutoxy group. When having a substituent C, the hydrogen atom in the C3-C8 cycloalkoxy group is optionally substituted by the substituent C.
 式(1)のR5における「置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基」のC2~C6のアルケニルオキシ基は、前記の定義と同義であり、好ましくは、ビニルオキシ基、1-プロペニルオキシ基、アリルオキシ基、1-ブテニルオキシ基、2-ブテニルオキシ基、または3-ブテニルオキシ基であり、さらに好ましくは、ビニルオキシ基、1-プロペニルオキシ基、またはアリルオキシ基である。置換基Cを有する場合、C2~C6のアルケニルオキシ基における水素原子が、置換基Cによって任意に置換される。 The C2-C6 alkenyloxy group of the "C2-C6 alkenyloxy group optionally substituted with substituent C" in R5 of Formula (1) has the same definition as described above, and preferably a vinyloxy group, 1-propenyloxy group, allyloxy group, 1-butenyloxy group, 2-butenyloxy group, or 3-butenyloxy group, more preferably vinyloxy group, 1-propenyloxy group, or allyloxy group. When having a substituent C, the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted by the substituent C.
 式(1)のR5における「C2~C6のハロアルケニルオキシ基」は、前記の定義と同義であり、好ましくは、2-フルオロビニルオキシ基、2,2-ジフルオロビニルオキシ基、2,2-ジクロロビニルオキシ基、3-フルオロアリルオキシ基、3,3-ジフルオロアリルオキシ基、または3,3-ジクロロアリルオキシ基であり、さらに好ましくは、2-フルオロビニルオキシ基、または2,2-ジフルオロビニルオキシ基である。 The “C2 to C6 haloalkenyloxy group” in R 5 of the formula (1) is as defined above, preferably a 2-fluorovinyloxy group, a 2,2-difluorovinyloxy group, or 2,2- Dichlorovinyloxy group, 3-fluoroallyloxy group, 3,3-difluoroallyloxy group, or 3,3-dichloroallyloxy group, more preferably 2-fluorovinyloxy group, or 2,2-difluoro It is a vinyloxy group.
 式(1)のR5における「置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基」のC3~C6のアルキニルオキシ基は、前記の定義と同義であり、好ましくは、プロパルギルオキシ基、2-ブチニルオキシ基、または3-ブチニルオキシ基であり、さらに好ましくは、プロパルギルオキシ基である。置換基Cを有する場合、C3~C6のアルキニルオキシ基における水素原子が、置換基Cによって任意に置換される。 The C3 to C6 alkynyloxy group of the “C3 to C6 alkynyloxy group optionally substituted with substituent C” in R 5 of the formula (1) has the same definition as that described above, preferably a propargyloxy group A 2-butynyloxy group or a 3-butynyloxy group, more preferably a propargyloxy group. When having a substituent C, the hydrogen atom in the C3-C6 alkynyloxy group is optionally substituted by the substituent C.
 式(1)のR5における「C3~C6のハロアルキニルオキシ基」は、前記の定義と同義であり、好ましくは、4,4-ジフルオロ-2-ブチニルオキシ基、4-クロロ-4,4-ジフルオロ-2-ブチニルオキシ基、4-ブロモ-4,4-ジフルオロ-2-ブチニルオキシ基、または4,4,4-トリフルオロ-2-ブチニルオキシ基であり、さらに好ましくは、4,4-ジフルオロ-2-ブチニルオキシ基、または4,4,4-トリフルオロ-2-ブチニルオキシ基である。 The “C3-C6 haloalkynyloxy group” in R 5 of the formula (1) is as defined above, preferably a 4,4-difluoro-2-butynyloxy group, 4-chloro-4,4-difluoro -2-butynyloxy group, 4-bromo-4,4-difluoro-2-butynyloxy group, or 4,4,4-trifluoro-2-butynyloxy group, more preferably 4,4-difluoro-2- It is a butynyloxy group or a 4,4,4-trifluoro-2-butynyloxy group.
 式(1)のR5における「Rc-L-」のRcおよびLは、前記と同義ある。「Rc-L-」として、好ましくは、メチルチオ基、メタンスルフィニル基、メタンスルホニル基、トリフルオロメチルチオ基、トリフルオロメタンスルフィニル基、またはトリフルオロメタンスルホニル基であり、さらに好ましくは、メチルチオ基、メタンスルフィニル基、またはメタンスルホニル基である。 Rc and L of “Rc-L-” in R 5 of Formula (1) are as defined above. Preferred as "Rc-L-" is a methylthio group, a methanesulfinyl group, a methanesulfonyl group, a trifluoromethylthio group, a trifluoromethanesulfinyl group, or a trifluoromethanesulfonyl group, and more preferably a methylthio group, a methanesulfinyl group Or a methanesulfonyl group.
 式(1)のR5における「Rx1C(=O)O-」のRx1は、前記と同義ある。「Rx1C(=O)O-」として、好ましくは、アセチルオキシ基、メトキシアセチルオキシ基、シアノアセチルオキシ基、プロピオニルオキシ基、ジフルオロアセチルオキシ基、トリフルオロアセチルオキシ基、シクロプロパンカルボニルオキシ基、メトキシカルボニルオキシ基、エトキシカルボニルオキシ基、2,2-ジフルオロエトキシカルボニルオキシ基、2,2,2-トリフルオロエトキシカルボニルオキシ基、3,3,3-トリフルオロプロピルオキシカルボニルオキシ基、シクロプロピルオキシカルボニルオキシ基、アミノカルボニルオキシ基、メチルアミノカルボニルオキシ基、エチルアミノカルボニルオキシ基、(メトキシメチル)アミノカルボニルオキシ基、(2-メトキシエチル)アミノカルボニルオキシ基、(シアノメチル)アミノカルボニルオキシ基、(2-シアノエチル)アミノカルボニルオキシ基、ジメチルアミノカルボニルオキシ基、エチル(メチル)アミノカルボニルオキシ基、ジエチルアミノカルボニルオキシ基、(メトキシメチル)メチルアミノカルボニルオキシ基、(2-メトキシエチル)メチルアミノカルボニルオキシ基、(シアノメチル)メチルアミノカルボニルオキシ基、(2-シアノエチル)メチルアミノカルボニルオキシ基、2,2-ジフルオロエチルアミノカルボニルオキシ基、2,2,2-トリフルオロエチルアミノカルボニルオキシ基、シクロプロピルアミノカルボニルオキシ基、シクロプロピル(メチル)アミノカルボニルオキシ基、ピロリジニルカルボニルオキシ基、またはピペリジニルカルボニルオキシ基であり、さらに好ましくは、アセチルオキシ基、メトキシアセチルオキシ基、シアノアセチルオキシ基、ジフルオロアセチルオキシ基、トリフルオロアセチルオキシ基、メトキシカルボニルオキシ基、エトキシカルボニルオキシ基、アミノカルボニルオキシ基、ジメチルアミノカルボニルオキシ基、エチル(メチル)アミノカルボニルオキシ基、またはジエチルアミノカルボニルオキシ基である。 Rx1 of “Rx1C (= O) O—” in R5 of Formula (1) has the same meaning as described above. As "Rx1C (= O) O-", preferably, acetyloxy, methoxyacetyloxy, cyanoacetyloxy, propionyloxy, difluoroacetyloxy, trifluoroacetyloxy, cyclopropanecarbonyloxy, methoxy Carbonyloxy, ethoxycarbonyloxy, 2,2-difluoroethoxycarbonyloxy, 2,2,2-trifluoroethoxycarbonyloxy, 3,3,3-trifluoropropyloxycarbonyloxy, cyclopropyloxycarbonyl Oxy group, amino carbonyloxy group, methylamino carbonyloxy group, ethyl amino carbonyloxy group, (methoxymethyl) amino carbonyloxy group, (2-methoxyethyl) amino carbonyloxy group, (sia (Methyl) aminocarbonyloxy group, (2-cyanoethyl) aminocarbonyloxy group, dimethylaminocarbonyloxy group, ethyl (methyl) aminocarbonyloxy group, diethylamino carbonyloxy group, (methoxymethyl) methylamino carbonyloxy group, (2- (Methoxyethyl) methylaminocarbonyloxy group, (cyanomethyl) methylaminocarbonyloxy group, (2-cyanoethyl) methylaminocarbonyloxy group, 2,2-difluoroethylaminocarbonyloxy group, 2,2,2-trifluoroethylamino A carbonyloxy group, a cyclopropylamino carbonyloxy group, a cyclopropyl (methyl) amino carbonyloxy group, a pyrrolidinyl carbonyloxy group, or a piperidinyl carbonyloxy group; More preferably, acetyloxy, methoxyacetyloxy, cyanoacetyloxy, difluoroacetyloxy, trifluoroacetyloxy, methoxycarbonyloxy, ethoxycarbonyloxy, aminocarbonyloxy, dimethylaminocarbonyloxy, It is an ethyl (methyl) amino carbonyloxy group or a diethyl amino carbonyloxy group.
 置換基Aは、水酸基、シアノ基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、RaRbN-(ここで、RaおよびRbは、前記と同義である。)、およびRc-L-(ここで、RcおよびLは、前記と同義である。)からなる群から選択される少なくとも1種を表す。 Substituent group A is a hydroxyl group, a cyano group, a C3 to C8 cycloalkyl group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, a C3 to C8 cycloalkoxy group, RaRbN- (wherein Ra and Rb And Rc are as defined above), and Rc-L- (wherein Rc and L are as defined above), and at least one selected from the group consisting of
 中でも置換基Aは、シアノ基、C1~C6のアルコキシ基またはRc-L-(ここで、RcおよびLは、前記と同義である。)が好ましく、
 特に、シアノ基またはC1~C6のアルコキシ基が好ましい。
Among them, the substituent A is preferably a cyano group, a C1-C6 alkoxy group or Rc-L- (wherein Rc and L are as defined above).
In particular, a cyano group or a C1-C6 alkoxy group is preferable.
 置換基Aの各用語は前記の定義と同義である。 Each term of the substituent A is as defined above.
 置換基Aの好ましい具体例に関しては、水酸基;シアノ基;
C3~C8のシクロアルキル基として、シクロプロピル基、シクロブチル基、シクロペンチル基、およびシクロヘキシル基;
C1~C6のアルコキシ基として、メトキシ基、エトキシ基、プロピルオキシ基、およびイソプロピルオキシ基;
C1~C6のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、3,3-ジフルオロプロピルオキシ基、および3,3,3-トリフルオロプロピルオキシ基;
C3~C8のシクロアルコキシ基として、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、およびシクロヘキシルオキシ基;
RaRbN-(ここで、RaおよびRbは、前記と同義である。)として、アミノ基、メチルアミノ基、エチルアミノ基、プロピルアミノ基、イソプロピルアミノ基、(メトキシメチル)アミノ基、(2-メトキシエチル)アミノ基、(シアノメチル)アミノ基、(2-シアノエチル)アミノ基、ジメチルアミノ基、エチル(メチル)アミノ基、メチル(プロピル)アミノ基、イソプロピル(メチル)アミノ基、(メトキシメチル)メチルアミノ基、(2-メトキシエチル)メチルアミノ基、(シアノメチル)メチルアミノ基、(2-シアノエチル)メチルアミノ基、ジエチルアミノ基、エチル(プロピル)アミノ基、エチル(イソプロピル)アミノ基、エチル(メトキシメチル)アミノ基、エチル(2-メトキシエチル)アミノ基、(シアノメチル)エチルアミノ基、(2-シアノエチル)エチルアミノ基、2,2-ジフルオロエチルアミノ基、2,2,2-トリフルオロエチルアミノ基、シクロプロピルアミノ基、(シクロプロピル)メチルアミノ基、ピロリジニル基、およびピペリジニル基;
ならびにRc-L-(ここで、RcおよびLは、前記と同義である。)として、メチルチオ基、メタンスルフィニル基、メタンスルホニル基、トリフルオロメチルチオ基、トリフルオロメタンスルフィニル基、およびトリフルオロメタンスルホニル基が挙げられる。
With respect to the preferred specific examples of the substituent A, hydroxyl group; cyano group;
A cyclopropyl group, a cyclobutyl group, a cyclopentyl group and a cyclohexyl group as a C3-C8 cycloalkyl group;
As a C1 to C6 alkoxy group, a methoxy group, an ethoxy group, a propyloxy group, and an isopropyloxy group;
As a C1-C6 haloalkoxy group, a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, a 2,2,2-trifluoroethoxy group, a 3,3-difluoropropyloxy group, and 3,3 as a C1-C6 haloalkoxy group. , 3-trifluoropropyloxy group;
A cyclopropyloxy group, a cyclobutoxy group, a cyclopentyloxy group, and a cyclohexyloxy group as a C3-C8 cycloalkoxy group;
As RaRbN- (wherein Ra and Rb are as defined above), amino, methylamino, ethylamino, propylamino, isopropylamino, (methoxymethyl) amino, (2-methoxy) Ethyl) amino group, (cyanomethyl) amino group, (2-cyanoethyl) amino group, dimethylamino group, ethyl (methyl) amino group, methyl (propyl) amino group, isopropyl (methyl) amino group, (methoxymethyl) methyl amino Group, (2-methoxyethyl) methylamino group, (cyanomethyl) methylamino group, (2-cyanoethyl) methylamino group, diethylamino group, ethyl (propyl) amino group, ethyl (isopropyl) amino group, ethyl (methoxymethyl) group Amino group, ethyl (2-methoxyethyl) amino group, Methyl) ethylamino group, (2-cyanoethyl) ethylamino group, 2,2-difluoroethylamino group, 2,2,2-trifluoroethylamino group, cyclopropylamino group, (cyclopropyl) methylamino group, pyrrolidinyl And piperidinyl groups;
And Rc-L- (wherein Rc and L are as defined above) includes a methylthio group, a methanesulfinyl group, a methanesulfonyl group, a trifluoromethylthio group, a trifluoromethanesulfinyl group, and a trifluoromethanesulfonyl group It can be mentioned.
 置換基Aのさらに好ましい具体例に関しては、水酸基;シアノ基;
C3~C8のシクロアルキル基として、シクロプロピル基、およびシクロブチル基;
C1~C6のアルコキシ基として、メトキシ基、およびエトキシ基;
C1~C6のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、および2,2,2-トリフルオロエトキシ基;
C3~C8のシクロアルコキシ基として、シクロプロピルオキシ基、およびシクロブトキシ基;
RaRbN-(ここで、RaおよびRbは、前記と同義である。)として、ジメチルアミノ基、エチル(メチル)アミノ基、およびジエチルアミノ基;
ならびにRc-L-(ここで、RcおよびLは、前記と同義である。)として、メチルチオ基、メタンスルフィニル基、およびメタンスルホニル基が挙げられる。
With respect to further preferred specific examples of the substituent A, a hydroxyl group; a cyano group;
A cyclopropyl group and a cyclobutyl group as a C3-C8 cycloalkyl group;
A methoxy group and an ethoxy group as a C1 to C6 alkoxy group;
As a C1-C6 haloalkoxy group, a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group;
A cyclopropyloxy group and a cyclobutoxy group as a C3 to C8 cycloalkoxy group;
A dimethylamino group, an ethyl (methyl) amino group, and a diethylamino group as RaRbN- (wherein Ra and Rb are as defined above);
And Rc-L- (wherein Rc and L are as defined above) include a methylthio group, a methanesulfinyl group, and a methanesulfonyl group.
 置換基Bは、シアノ基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、およびC3~C8のシクロアルコキシ基からなる群から選択される少なくとも1種を表す。 The substituent B represents at least one selected from the group consisting of a cyano group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, and a C3 to C8 cycloalkoxy group.
 中でも置換基Bは、シアノ基、またはC1~C6のアルコキシ基が好ましい。 Among them, the substituent B is preferably a cyano group or a C1-C6 alkoxy group.
 置換基Bの各用語は前記の定義と同義である。 Each term of substituent B is as defined above.
 置換基Bの好ましい具体例に関しては、シアノ基;
C1~C6のアルコキシ基として、メトキシ基、エトキシ基、プロピルオキシ基、およびイソプロピルオキシ基;
C1~C6のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、3,3-ジフルオロプロピルオキシ基、および3,3,3-トリフルオロプロピルオキシ基;
ならびにC3~C8のシクロアルコキシ基として、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、およびシクロヘキシルオキシ基が挙げられる。
With respect to preferred examples of substituent B, a cyano group;
As a C1 to C6 alkoxy group, a methoxy group, an ethoxy group, a propyloxy group, and an isopropyloxy group;
As a C1-C6 haloalkoxy group, a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, a 2,2,2-trifluoroethoxy group, a 3,3-difluoropropyloxy group, and 3,3 as a C1-C6 haloalkoxy group. , 3-trifluoropropyloxy group;
And a C3-C8 cycloalkoxy group includes cyclopropyloxy group, cyclobutoxy group, cyclopentyloxy group, and cyclohexyloxy group.
 置換基Bのさらに好ましい具体例に関しては、シアノ基;
C1~C6のアルコキシ基として、メトキシ基、およびエトキシ基;
C1~C6のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、および2,2,2-トリフルオロエトキシ基;
ならびにC3~C8のシクロアルコキシ基として、シクロプロピルオキシ基、およびシクロブトキシ基が挙げられる。
With respect to further preferred embodiments of the substituent B, a cyano group;
A methoxy group and an ethoxy group as a C1 to C6 alkoxy group;
As a C1-C6 haloalkoxy group, a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group;
And C3-C8 cycloalkoxy groups include cyclopropyloxy and cyclobutoxy.
 置換基Cは、水酸基、シアノ基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、C2~C6のアルコキシアルコキシ基、RaRbN-(ここで、RaおよびRbは、前記と同義である。)、Rc-L-(ここで、RcおよびLは、前記と同義である。)、Rx1C(=O)-(ここで、Rx1は、前記と同義である。)、および1~2個の酸素原子を含む3~6員環の基からなる群から選択される少なくとも1種を表す。 The substituent C is a hydroxyl group, a cyano group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group, a C2-C6 alkoxyalkoxy group, RaRbN -(Wherein, Ra and Rb are as defined above), Rc-L- (wherein, Rc and L are as defined above), Rx1C (= O)-(wherein, Rx1 And at least one member selected from the group consisting of groups having 3 to 6 members each containing 1 to 2 oxygen atoms.
 中でも置換基Cは、水酸基、シアノ基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、Rc-L-(ここで、RcおよびLは、前記と同義である。)、またはRx1C(=O)-(ここで、Rx1は、前記と同義である。)が好ましく、
 特に、水酸基、またはC1~C6のアルコキシ基が好ましい。
Among them, the substituent C is a hydroxyl group, a cyano group, a C3 to C8 cycloalkyl group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, a C3 to C8 cycloalkoxy group, Rc-L- (wherein Rc and L are as defined above, or Rx1C ((O) — (wherein, Rx1 is as defined above) is preferable,
In particular, a hydroxyl group or a C1 to C6 alkoxy group is preferable.
 置換基Cの各用語は前記の定義と同義である。 Each term of substituent C is as defined above.
 置換基Cの好ましい具体例に関しては、水酸基;シアノ基;
C3~C8のシクロアルキル基として、シクロプロピル基、シクロブチル基、シクロペンチル基、およびシクロヘキシル基;
C1~C6のアルコキシ基として、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、イソブトキシ基、およびt-ブトキシ基;
C1~C6のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、3,3-ジフルオロプロピルオキシ基、および3,3,3-トリフルオロプロピルオキシ基;
C3~C8のシクロアルコキシ基として、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、およびシクロヘキシルオキシ基;
C2~C6のアルコキシアルコキシ基として、メトキシメトキシ基、エトキシメトキシ基、メトキシエトキシ基、エトキシエトキシ基、およびメトキシプロピルオキシ基;
C2~C6のアルコキシアルコキシ基として、メトキシメトキシ基、エトキシメトキシ基、メトキシエトキシ基、エトキシエトキシ基、およびメトキシプロピルオキシ基;
RaRbN-(ここで、RaおよびRbは、前記と同義である。)として、アミノ基、メチルアミノ基、エチルアミノ基、プロピルアミノ基、イソプロピルアミノ基、(メトキシメチル)アミノ基、(2-メトキシエチル)アミノ基、(シアノメチル)アミノ基、(2-シアノエチル)アミノ基、ジメチルアミノ基、エチル(メチル)アミノ基、メチル(プロピル)アミノ基、イソプロピル(メチル)アミノ基、(メトキシメチル)メチルアミノ基、(2-メトキシエチル)メチルアミノ基、(シアノメチル)メチルアミノ基、(2-シアノエチル)メチルアミノ基、ジエチルアミノ基、エチル(プロピル)アミノ基、エチル(イソプロピル)アミノ基、エチル(メトキシメチル)アミノ基、エチル(2-メトキシエチル)アミノ基、(シアノメチル)エチルアミノ基、(2-シアノエチル)エチルアミノ基、2,2-ジフルオロエチルアミノ基、2,2,2-トリフルオロエチルアミノ基、シクロプロピルアミノ基、(シクロプロピル)メチルアミノ基、ピロリジニル基、およびピペリジニル基;
Rc-L-(ここで、RcおよびLは、前記と同義である。)として、メチルチオ基、メタンスルフィニル基、メタンスルホニル基、トリフルオロメチルチオ基、トリフルオロメタンスルフィニル基、およびトリフルオロメタンスルホニル基;
Rx1C(=O)-(ここで、Rx1は、前記と同義である。)として、アセチル基、メトキシアセチル基、シアノアセチル基、プロピオニル基、ジフルオロアセチル基、トリフルオロアセチル基、シクロプロパンカルボニル基、メトキシカルボニル基、エトキシカルボニル基、2,2-ジフルオロエトキシカルボニル基、2,2,2-トリフルオロエトキシカルボニル基、3,3,3-トリフルオロプロピルオキシカルボニル基、シクロプロピルオキシカルボニル基、アミノカルボニル基、メチルアミノカルボニル基、エチルアミノカルボニル基、(メトキシメチル)アミノカルボニル基、(2-メトキシエチル)アミノカルボニル基、(シアノメチル)アミノカルボニル基、(2-シアノエチル)アミノカルボニル基、ジメチルアミノカルボニル基、エチル(メチル)アミノカルボニル基、ジエチルアミノカルボニル基、(メトキシメチル)メチルアミノカルボニル基、(2-メトキシエチル)メチルアミノカルボニル基、(シアノメチル)メチルアミノカルボニル基、(2-シアノエチル)メチルアミノカルボニル基、2,2-ジフルオロエチルアミノカルボニル基、2,2,2-トリフルオロエチルアミノカルボニル基、シクロプロピルアミノカルボニル基、(シクロプロピル)メチルアミノカルボニル基、ピロリジニルカルボニル基、およびピペリジニルカルボニル基;
ならびに1~2個の酸素原子を含む3~6員環の基として、オキソラニル基、オキサニル基、1,3-ジオキソラニル基、および1,3-ジオキサニル基が挙げられる。
With respect to the preferred specific examples of the substituent C, a hydroxyl group; a cyano group;
A cyclopropyl group, a cyclobutyl group, a cyclopentyl group and a cyclohexyl group as a C3-C8 cycloalkyl group;
As a C1 to C6 alkoxy group, a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group, a butoxy group, an isobutoxy group, and a t-butoxy group;
As a C1-C6 haloalkoxy group, a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, a 2,2,2-trifluoroethoxy group, a 3,3-difluoropropyloxy group, and 3,3 as a C1-C6 haloalkoxy group. , 3-trifluoropropyloxy group;
A cyclopropyloxy group, a cyclobutoxy group, a cyclopentyloxy group, and a cyclohexyloxy group as a C3-C8 cycloalkoxy group;
As a C2 to C6 alkoxyalkoxy group, a methoxymethoxy group, an ethoxymethoxy group, a methoxyethoxy group, an ethoxyethoxy group, and a methoxypropyloxy group;
As a C2 to C6 alkoxyalkoxy group, a methoxymethoxy group, an ethoxymethoxy group, a methoxyethoxy group, an ethoxyethoxy group, and a methoxypropyloxy group;
As RaRbN- (wherein Ra and Rb are as defined above), amino, methylamino, ethylamino, propylamino, isopropylamino, (methoxymethyl) amino, (2-methoxy) Ethyl) amino group, (cyanomethyl) amino group, (2-cyanoethyl) amino group, dimethylamino group, ethyl (methyl) amino group, methyl (propyl) amino group, isopropyl (methyl) amino group, (methoxymethyl) methyl amino Group, (2-methoxyethyl) methylamino group, (cyanomethyl) methylamino group, (2-cyanoethyl) methylamino group, diethylamino group, ethyl (propyl) amino group, ethyl (isopropyl) amino group, ethyl (methoxymethyl) group Amino group, ethyl (2-methoxyethyl) amino group, Methyl) ethylamino group, (2-cyanoethyl) ethylamino group, 2,2-difluoroethylamino group, 2,2,2-trifluoroethylamino group, cyclopropylamino group, (cyclopropyl) methylamino group, pyrrolidinyl And piperidinyl groups;
Rc-L- (wherein Rc and L are as defined above) includes methylthio, methanesulfinyl, methanesulfonyl, trifluoromethylthio, trifluoromethanesulfinyl, and trifluoromethanesulfonyl;
As Rx1C (= O) — (wherein Rx1 has the same meaning as the above), an acetyl group, a methoxyacetyl group, a cyanoacetyl group, a propionyl group, a difluoroacetyl group, a trifluoroacetyl group, a cyclopropane carbonyl group, Methoxycarbonyl group, ethoxycarbonyl group, 2,2-difluoroethoxycarbonyl group, 2,2,2-trifluoroethoxycarbonyl group, 3,3,3-trifluoropropyloxycarbonyl group, cyclopropyloxycarbonyl group, aminocarbonyl Group, methylaminocarbonyl group, ethylaminocarbonyl group, (methoxymethyl) aminocarbonyl group, (2-methoxyethyl) aminocarbonyl group, (cyanomethyl) aminocarbonyl group, (2-cyanoethyl) aminocarbonyl group, dimethylaminoca Bonyl, ethyl (methyl) aminocarbonyl, diethylaminocarbonyl, (methoxymethyl) methylaminocarbonyl, (2-methoxyethyl) methylaminocarbonyl, (cyanomethyl) methylaminocarbonyl, (2-cyanoethyl) methylamino A carbonyl group, 2,2-difluoroethylaminocarbonyl group, 2,2,2-trifluoroethylaminocarbonyl group, cyclopropylaminocarbonyl group, (cyclopropyl) methylaminocarbonyl group, pyrrolidinyl carbonyl group, and piperidine A nyl carbonyl group;
And 3- to 6-membered ring groups containing 1 to 2 oxygen atoms include oxolanyl group, oxanyl group, 1,3-dioxolanyl group, and 1,3-dioxanyl group.
 置換基Cのさらに好ましい具体例に関しては、水酸基;シアノ基;
C3~C8のシクロアルキル基として、シクロプロピル基、およびシクロブチル基;
C1~C6のアルコキシ基として、メトキシ基、およびエトキシ基;
C1~C6のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、および2,2,2-トリフルオロエトキシ基;
C3~C8のシクロアルコキシ基として、シクロプロピルオキシ基、シクロブトキシ基;
C2~C6のアルコキシアルコキシ基として、メトキシメトキシ基、エトキシメトキシ基、メトキシエトキシ基、およびエトキシエトキシ基;
RaRbN-(ここで、RaおよびRbは、前記と同義である。)として、ジメチルアミノ基、エチル(メチル)アミノ基、およびジエチルアミノ基;
Rc-L-(ここで、RcおよびLは、前記と同義である。)として、メチルチオ基、メタンスルフィニル基、およびメタンスルホニル基;
Rx1C(=O)-(ここで、Rx1は、前記と同義である。)として、アセチル基、メトキシアセチル基、シアノアセチル基、ジフルオロアセチル基、トリフルオロアセチル基、メトキシカルボニル基、エトキシカルボニル基、アミノカルボニル基、ジメチルアミノカルボニル基、エチル(メチル)アミノカルボニル基、およびジエチルアミノカルボニル基;
ならびに1~2個の酸素原子を含む3~6員環の基として、1,3-ジオキソラニル基、および1,3-ジオキサニル基が挙げられる。
With respect to further preferred specific examples of the substituent C, a hydroxyl group; a cyano group;
A cyclopropyl group and a cyclobutyl group as a C3-C8 cycloalkyl group;
A methoxy group and an ethoxy group as a C1 to C6 alkoxy group;
As a C1-C6 haloalkoxy group, a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group;
A cyclopropyloxy group, a cyclobutoxy group as a C3-C8 cycloalkoxy group;
As a C2 to C6 alkoxyalkoxy group, a methoxymethoxy group, an ethoxymethoxy group, a methoxyethoxy group, and an ethoxyethoxy group;
A dimethylamino group, an ethyl (methyl) amino group, and a diethylamino group as RaRbN- (wherein Ra and Rb are as defined above);
Methylthio group, methanesulfinyl group, and methanesulfonyl group as Rc-L- (wherein Rc and L are as defined above);
As Rx1C (= O) — (wherein, Rx1 has the same meaning as the above.), An acetyl group, a methoxyacetyl group, a cyanoacetyl group, a difluoroacetyl group, a trifluoroacetyl group, a methoxycarbonyl group, an ethoxycarbonyl group, Aminocarbonyl group, dimethylaminocarbonyl group, ethyl (methyl) aminocarbonyl group, and diethylaminocarbonyl group;
And, as a 3- to 6-membered ring group containing 1 to 2 oxygen atoms, 1,3-dioxolanyl and 1,3-dioxanyl may be mentioned.
 置換基Dは、水酸基、シアノ基、ニトロ基、ハロゲン原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、およびC3~C8のシクロアルコキシ基からなる群から選択される少なくとも1種を表す。 Substituent D includes a hydroxyl group, a cyano group, a nitro group, a halogen atom, a C1 to C6 alkyl group optionally substituted with substituent B, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group, C1 to C6. It represents at least one selected from the group consisting of a C6 alkoxy group, a C1 to C6 haloalkoxy group, and a C3 to C8 cycloalkoxy group.
 中でも置換基Dは、水酸基、シアノ基、ハロゲン原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C1~C6のアルコキシ基およびC1~C6のハロアルコキシ基が好ましく、
 特に、ハロゲン原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、およびC1~C6のアルコキシ基が好ましい。
Among them, the substituent D is a hydroxyl group, a cyano group, a halogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, a C1 to C6 alkoxy group, and a C1 to C6 halo. An alkoxy group is preferred,
In particular, a halogen atom, a C1-C6 alkyl group which may be optionally substituted with a substituent B, and a C1-C6 alkoxy group are preferable.
 置換基Dの各用語は前記の定義と同義である。なお、「置換基Bで適宜置換されてもよいC1~C6のアルキル基」に関しては、置換基Bを有する場合、C1~C6のアルキル基における水素原子が、置換基Bによって任意に置換される。 Each term of substituent D is as defined above. In the case of “a C1-C6 alkyl group optionally substituted with a substituent B”, when having a substituent B, the hydrogen atom in the C1-C6 alkyl group is optionally substituted by a substituent B .
 置換基Dの好ましい具体例に関しては、水酸基;シアノ基;ニトロ基;
ハロゲン原子として、フッ素原子、塩素原子、臭素原子およびヨウ素原子;
置換基Bで適宜置換されてもよいC1~C6のアルキル基として、メチル基、メトキシメチル基、エトキシメチル基、シアノメチル基、エチル基、2-メトキシエチル基、2-エトキシエチル基、2-シアノエチル基、プロピル基、イソプロピル基、ブチル基、およびイソブチル基;
C1~C6のハロアルキル基として、ジフルオロメチル基、トリフルオロメチル基、2,2-ジフルオロエチル基、2,2,2-トリフルオロエチル基、3,3-ジフルオロプロピル基、および3,3,3-トリフルオロプロピル基;
C3~C8のシクロアルキル基として、シクロプロピル基、シクロブチル基、シクロペンチル基、およびシクロヘキシル基;
C1~C6のアルコキシ基として、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、イソブトキシ基、およびt-ブトキシ基;
C1~C6のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、3,3-ジフルオロプロピルオキシ基、および3,3,3-トリフルオロプロピルオキシ基;
ならびにC3~C8のシクロアルコキシ基として、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、およびシクロヘキシルオキシ基が挙げられる。
With regard to the preferred specific examples of the substituent D, hydroxyl group; cyano group; nitro group;
As a halogen atom, a fluorine atom, a chlorine atom, a bromine atom and an iodine atom;
As a C1 to C6 alkyl group which may be optionally substituted by substituent B, a methyl group, a methoxymethyl group, an ethoxymethyl group, a cyanomethyl group, an ethyl group, a 2-methoxyethyl group, a 2-ethoxyethyl group, 2-cyanoethyl group , Propyl, isopropyl, butyl and isobutyl;
As a C 1 to C 6 haloalkyl group, difluoromethyl group, trifluoromethyl group, 2,2-difluoroethyl group, 2,2,2-trifluoroethyl group, 3,3-difluoropropyl group, and 3,3,3 -Trifluoropropyl group;
A cyclopropyl group, a cyclobutyl group, a cyclopentyl group and a cyclohexyl group as a C3-C8 cycloalkyl group;
As a C1 to C6 alkoxy group, a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group, a butoxy group, an isobutoxy group, and a t-butoxy group;
As a C1-C6 haloalkoxy group, a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, a 2,2,2-trifluoroethoxy group, a 3,3-difluoropropyloxy group, and 3,3 as a C1-C6 haloalkoxy group. , 3-trifluoropropyloxy group;
And a C3-C8 cycloalkoxy group includes cyclopropyloxy group, cyclobutoxy group, cyclopentyloxy group, and cyclohexyloxy group.
 置換基Dのさらに好ましい具体例に関しては、水酸基;シアノ基;ニトロ基;
ハロゲン原子として、フッ素原子、塩素原子、および臭素原子;
置換基Bで適宜置換されてもよいC1~C6のアルキル基として、メチル基、メトキシメチル基、エトキシメチル基、シアノメチル基、エチル基、2-メトキシエチル基、2-エトキシエチル基、および2-シアノエチル基;
C1~C6のハロアルキル基として、ジフルオロメチル基、トリフルオロメチル基、2,2-ジフルオロエチル基、および2,2,2-トリフルオロエチル基;
C3~C8のシクロアルキル基として、シクロプロピル基、およびシクロブチル基;
C1~C6のアルコキシ基として、メトキシ基、エトキシ基、プロピルオキシ基、およびイソプロピルオキシ基;
C1~C6のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、および2,2,2-トリフルオロエトキシ基;
ならびにC3~C8のシクロアルコキシ基として、シクロプロピルオキシ基およびシクロブトキシ基が挙げられる。
With respect to further preferred specific examples of the substituent D, a hydroxyl group; a cyano group; a nitro group;
As a halogen atom, a fluorine atom, a chlorine atom and a bromine atom;
As a C1 to C6 alkyl group which may be optionally substituted by substituent B, a methyl group, a methoxymethyl group, an ethoxymethyl group, a cyanomethyl group, an ethyl group, a 2-methoxyethyl group, a 2-ethoxyethyl group, and 2- Cyanoethyl group;
As a C1 to C6 haloalkyl group, a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, and a 2,2,2-trifluoroethyl group;
A cyclopropyl group and a cyclobutyl group as a C3-C8 cycloalkyl group;
As a C1 to C6 alkoxy group, a methoxy group, an ethoxy group, a propyloxy group, and an isopropyloxy group;
As a C1-C6 haloalkoxy group, a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group;
And C3 to C8 cycloalkoxy groups include cyclopropyloxy and cyclobutoxy.
 式(1)で表される化合物は、軸不斉を有することがある。この際の異性体比は、単独または任意の割合の混合比であり、特に限定されることはない。 The compound represented by Formula (1) may have axial asymmetry. The isomer ratio in this case is a single or arbitrary mixing ratio, and is not particularly limited.
 式(1)で表される化合物は、不斉原子を含むことがある。この際の異性体比は、単独または任意の割合の混合比であり、特に限定されることはない。 The compound represented by formula (1) may contain an asymmetric atom. The isomer ratio in this case is a single or arbitrary mixing ratio, and is not particularly limited.
 式(1)で表される化合物は、幾何異性体を含むことがある。この際の異性体比は、単独または任意の割合の混合比であり、特に限定されることはない。 The compounds represented by formula (1) may contain geometric isomers. The isomer ratio in this case is a single or arbitrary mixing ratio, and is not particularly limited.
 式(1)で表される化合物は、塩を形成できることがある。塩酸、硫酸、酢酸、フマル酸、マレイン酸のような酸塩や、ナトリウム、カリウム、カルシウムのような金属塩等が例示されるが、農園芸用殺菌剤として使用できる限り、特に限定されることはない。 The compound represented by Formula (1) may be able to form a salt. Examples include acid salts such as hydrochloric acid, sulfuric acid, acetic acid, fumaric acid and maleic acid, metal salts such as sodium, potassium and calcium, etc., but they are particularly limited as long as they can be used as agricultural and horticultural fungicides There is no.
 次に、本発明の具体的な化合物は、表1に示す構造式(P-1~P-28:ただし、構造式中のXは、酸素または硫黄である。)、表2に示すY(Y-1~Y-86)、表3に示すW(W-1~W-48)、および表4に示すZ(Z-001~Z-1710)との組み合わせによって表される。 Next, specific compounds of the present invention are structural formulas shown in Table 1 (P-1 to P-28: provided that X in the structural formula is oxygen or sulfur), Y shown in Table 2 It is represented by a combination of Y-1 to Y-86), W (W-1 to W-48) shown in Table 3 and Z (Z-001 to Z-1710) shown in Table 4.
 これらの化合物は例示のためのものであって、本発明はこれらに限定されるものではない。 These compounds are for illustration and the present invention is not limited thereto.
Figure JPOXMLDOC01-appb-T000043
Figure JPOXMLDOC01-appb-T000043
Figure JPOXMLDOC01-appb-T000044
Figure JPOXMLDOC01-appb-T000044
Figure JPOXMLDOC01-appb-T000045
Figure JPOXMLDOC01-appb-T000045
Figure JPOXMLDOC01-appb-T000046
Figure JPOXMLDOC01-appb-T000046
Figure JPOXMLDOC01-appb-T000047
Figure JPOXMLDOC01-appb-T000047
 表3中、Waで表記される部分構造は、以下に示す式(Wa)で表される。
Figure JPOXMLDOC01-appb-C000048
In Table 3, the partial structure represented by Wa is represented by the formula (Wa) shown below.
Figure JPOXMLDOC01-appb-C000048
 表3中、Wbで表記される部分構造は、以下に示す式(Wb)で表される。
Figure JPOXMLDOC01-appb-C000049
In Table 3, the partial structure represented by Wb is represented by the formula (Wb) shown below.
Figure JPOXMLDOC01-appb-C000049
 表3中、Wbで表記される部分構造は、以下に示す式(Wc)で表される
Figure JPOXMLDOC01-appb-C000050
The partial structure represented by Wb in Table 3 is represented by the formula (Wc) shown below
Figure JPOXMLDOC01-appb-C000050
Figure JPOXMLDOC01-appb-T000051
Figure JPOXMLDOC01-appb-T000051
Figure JPOXMLDOC01-appb-T000052
Figure JPOXMLDOC01-appb-T000052
Figure JPOXMLDOC01-appb-T000053
Figure JPOXMLDOC01-appb-T000053
Figure JPOXMLDOC01-appb-T000054
Figure JPOXMLDOC01-appb-T000054
Figure JPOXMLDOC01-appb-T000055
Figure JPOXMLDOC01-appb-T000055
Figure JPOXMLDOC01-appb-T000056
Figure JPOXMLDOC01-appb-T000056
Figure JPOXMLDOC01-appb-T000057
Figure JPOXMLDOC01-appb-T000057
Figure JPOXMLDOC01-appb-T000058
Figure JPOXMLDOC01-appb-T000058
Figure JPOXMLDOC01-appb-T000059
Figure JPOXMLDOC01-appb-T000059
Figure JPOXMLDOC01-appb-T000060
Figure JPOXMLDOC01-appb-T000060
Figure JPOXMLDOC01-appb-T000061
Figure JPOXMLDOC01-appb-T000061
Figure JPOXMLDOC01-appb-T000062
Figure JPOXMLDOC01-appb-T000062
Figure JPOXMLDOC01-appb-T000063
Figure JPOXMLDOC01-appb-T000063
Figure JPOXMLDOC01-appb-T000064
Figure JPOXMLDOC01-appb-T000064
Figure JPOXMLDOC01-appb-T000065
Figure JPOXMLDOC01-appb-T000065
Figure JPOXMLDOC01-appb-T000066
Figure JPOXMLDOC01-appb-T000066
Figure JPOXMLDOC01-appb-T000067
Figure JPOXMLDOC01-appb-T000067
Figure JPOXMLDOC01-appb-T000068
Figure JPOXMLDOC01-appb-T000068
Figure JPOXMLDOC01-appb-T000069
Figure JPOXMLDOC01-appb-T000069
Figure JPOXMLDOC01-appb-T000070
Figure JPOXMLDOC01-appb-T000070
Figure JPOXMLDOC01-appb-T000071
Figure JPOXMLDOC01-appb-T000071
Figure JPOXMLDOC01-appb-T000072
Figure JPOXMLDOC01-appb-T000072
Figure JPOXMLDOC01-appb-T000073
Figure JPOXMLDOC01-appb-T000073
Figure JPOXMLDOC01-appb-T000074
Figure JPOXMLDOC01-appb-T000074
Figure JPOXMLDOC01-appb-T000075
Figure JPOXMLDOC01-appb-T000075
Figure JPOXMLDOC01-appb-T000076
Figure JPOXMLDOC01-appb-T000076
Figure JPOXMLDOC01-appb-T000077
Figure JPOXMLDOC01-appb-T000077
Figure JPOXMLDOC01-appb-T000078
Figure JPOXMLDOC01-appb-T000078
Figure JPOXMLDOC01-appb-T000079
Figure JPOXMLDOC01-appb-T000079
Figure JPOXMLDOC01-appb-T000080
Figure JPOXMLDOC01-appb-T000080
Figure JPOXMLDOC01-appb-T000081
Figure JPOXMLDOC01-appb-T000081
Figure JPOXMLDOC01-appb-T000082
Figure JPOXMLDOC01-appb-T000082
Figure JPOXMLDOC01-appb-T000083
Figure JPOXMLDOC01-appb-T000083
Figure JPOXMLDOC01-appb-T000084
Figure JPOXMLDOC01-appb-T000084
Figure JPOXMLDOC01-appb-T000085
Figure JPOXMLDOC01-appb-T000085
Figure JPOXMLDOC01-appb-T000086
Figure JPOXMLDOC01-appb-T000086
Figure JPOXMLDOC01-appb-T000087
Figure JPOXMLDOC01-appb-T000087
Figure JPOXMLDOC01-appb-T000088
Figure JPOXMLDOC01-appb-T000088
 以下に本発明の式(1)で表される化合物の製造方法を示す。本発明化合物の製造方法は、製造方法A~製造方法Qに限定されるものではない。 Hereinafter, a method for producing the compound represented by the formula (1) of the present invention is shown. The method for producing the compound of the present invention is not limited to production methods A to Q.
[製造方法A]
Figure JPOXMLDOC01-appb-C000089
[Manufacturing method A]
Figure JPOXMLDOC01-appb-C000089
 式中、U1はC1~C6のアルキル基、C1~C6のアラルキル基、またはC1~C6のヘテロアラルキル基を表し、R8は水素原子またはC1~C6のアルキル基を表し、R2、XおよびYは、前記と同義である。 In the formula, U 1 represents a C 1 to C 6 alkyl group, a C 1 to C 6 aralkyl group, or a C 1 to C 6 heteroaralkyl group, R 8 represents a hydrogen atom or a C 1 to C 6 alkyl group, R 2, X and Y represent , And the same as the above.
 製造方法Aは、本発明化合物の製造中間体である式(4)で表される化合物の製造方法であって、式(2)で表されると式(3)で表される化合物とを、塩基存在下、溶媒中で反応させることを含む製造方法である。 Production method A is a method for producing a compound represented by the formula (4) which is a production intermediate of the compound of the present invention, and when it is represented by the formula (2), a compound represented by the formula (3) And a reaction in the presence of a base in a solvent.
 本反応に使用する式(2)で表される化合物は、市販品として入手したり、参考例や公知の方法を利用して製造することができる。 The compound represented by Formula (2) used for this reaction can be obtained as a commercial item, or can be manufactured using a reference example or a well-known method.
 本反応に使用する式(3)で表される化合物は、市販品として入手または公知の方法で製造できることができる。 The compound represented by Formula (3) used for this reaction can be obtained as a commercial item, or can be manufactured by a well-known method.
 本反応に使用する式(3)で表される化合物の量は、式(2)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、1当量以上3当量以下である。 The amount of the compound represented by the formula (3) used in the present reaction is particularly limited as long as the target reaction proceeds, provided that the amount is 1 equivalent or more with respect to the compound represented by the formula (2) Although it is not, it is usually 1 equivalent or more and 3 equivalents or less.
 本反応に使用する塩基は、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、リン酸三カリウムのような無機塩基類やナトリウムメトキシド、ナトリウムエトキシド、ナトリウム t-ブトキシド、カリウム t-ブトキシド等の金属アルコキシド類等である。 Bases used in this reaction include inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate and tripotassium phosphate, and metal alkoxides such as sodium methoxide, sodium ethoxide, sodium t-butoxide and potassium t-butoxide Etc.
 本反応に使用する塩基は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(2)で表される化合物に対して0.01当量以上3当量以下である。 The base used for this reaction is not particularly limited as long as the target reaction proceeds, but is usually 0.01 equivalent or more and 3 equivalents or less with respect to the compound represented by Formula (2) .
 本反応に使用する溶媒は、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ジメチルスルホキシド、スルホラン等の硫黄系溶媒、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 Solvents used for this reaction include ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc., benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, etc. Ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, 1,3-dimethyl Urea solvents such as -2-imidazolidinone, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, sulfur solvents such as dimethylsulfoxide and sulfolane, acetone, methyl ethyl ketone, methyl Ketone solvents such as Sobuchiruketon like. These solvents may be used alone or in combination of two or more in any proportion.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(2)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of solvent used for this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 to 200 times by weight the amount of the compound represented by Formula (2). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、-50℃以上150℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually −50 ° C. or more and 150 ° C. or less or the boiling point or less of the solvent.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる
 前記で得られた式(4)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。
For post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used. At the time of liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc., solvents not compatible with water such as hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible to add. In addition, these solvents can be used alone or in combination of two or more in any proportion. The number of times of liquid separation is not particularly limited, and may be carried out depending on the desired purity and yield. The reaction mixture containing the compound represented by the formula (4) obtained above is sodium sulfate and Although water can be removed by a desiccant such as magnesium sulfate, it is not essential.
 前記で得られた式(4)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (4) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
 溶媒留去後に得られた式(4)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (4) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like using an appropriate solvent. It may be appropriately set according to the target purity.
[製造方法B]
Figure JPOXMLDOC01-appb-C000090
[Manufacturing method B]
Figure JPOXMLDOC01-appb-C000090
 式中、R8aはC1~C6のアルキル基を表し、R2、X、YおよびU1は、前記と同義である。 In the formula, R 8 a represents a C 1 to C 6 alkyl group, and R 2, X, Y and U 1 are as defined above.
 製造方法Bは、式(4)で表される化合物のうち、式(4b)で表される製造中間体を得る方法であって、式(4a)で表される化合物を、酸性条件または塩基性条件下、溶媒中で反応させることを含む製造方法である。 Production method B is a method for obtaining a production intermediate represented by formula (4b) among the compounds represented by formula (4), wherein the compound represented by formula (4a) is subjected to acidic conditions or base conditions It is a manufacturing method including reacting in a solvent under sexual conditions.
 まず、酸性条件の反応について説明する。 First, the reaction under acidic conditions will be described.
 本反応に使用する酸は、塩酸、臭化水素酸、リン酸等の無機酸類や、酢酸、メタンスルホン酸、p-トルエンスルホン酸、トリフルオロ酢酸等の有機酸類が例示される。目的とする反応が進行する限り特に制限されることはない。 Examples of the acid used in this reaction include inorganic acids such as hydrochloric acid, hydrobromic acid and phosphoric acid, and organic acids such as acetic acid, methanesulfonic acid, p-toluenesulfonic acid and trifluoroacetic acid. There is no particular limitation as long as the target reaction proceeds.
 本反応に使用する酸の量は、触媒量でもよく、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、式(4a)で表される化合物に対して0.01当量以上である。また、液体状の酸に関しては溶媒として使用することも可能である。 The amount of the acid used in this reaction may be a catalytic amount, and is not particularly limited as long as the target reaction proceeds, but generally 0.01 relative to the compound represented by formula (4a) It is more than equivalent. Moreover, it is also possible to use as a solvent regarding liquid acid.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、水溶媒、酢酸、メタンスルホン酸等の酸性系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is not limited to an aqueous solvent, an acidic solvent such as acetic acid or methanesulfonic acid, diethyl ether, diisopropyl ether, methyl-t- Ether solvents such as butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ethyl acetate, isopropyl acetate, acetic acid Ester solvents such as butyl, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, 1,3-dimethyl-2-imidazolidinone and the like C A solvent, dichloromethane, dichloroethane, chloroform, and halogen solvents such as carbon tetrachloride. These solvents may be used alone or in combination of two or more in any proportion.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(4a)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of solvent used for this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 to 200 times by weight the amount of the compound represented by Formula (4a). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、0℃以上180℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually 0 ° C. or more and 180 ° C. or less or the boiling point or less of the solvent.
 次に、塩基性条件の反応について説明する。 Next, the reaction under basic conditions will be described.
 本反応に使用する塩基は、水酸化リチウム、水酸化ナトリウム、水酸化カリウム等の無機塩基類が例示されるが、目的とする反応が進行する限りにおいて特に限定されることはない。 Examples of the base used in this reaction include inorganic bases such as lithium hydroxide, sodium hydroxide and potassium hydroxide, but there is no particular limitation as long as the target reaction proceeds.
 本反応に使用する塩基は、式(4a)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、1当量以上30当量以下である。 The base used in this reaction is not particularly limited as long as the target reaction proceeds, provided that it has 1 equivalent or more relative to the compound represented by Formula (4a), but usually 1 equivalent or more. It is less than equivalent weight.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、水溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but water solvents, diethyl ether, diisopropyl ether, methyl-t-butyl ether, ethers such as dimethoxyethane, tetrahydrofuran, dioxane, etc. Solvents, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitriles such as acetonitrile Amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloromethane Down, chloroform, and halogen solvents such as carbon tetrachloride. These solvents may be used alone or in combination of two or more in any proportion.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(4a)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of solvent used for this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 to 200 times by weight the amount of the compound represented by Formula (4a). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、-20℃以上180℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually −20 ° C. or more and 180 ° C. or less or the boiling point or less of the solvent.
 反応の後処理は、酸性条件での反応と塩基性条件の反応は共通の方法で行える。反応混合物に対して、水、もしくは適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 Post-treatment of the reaction can be carried out in a common manner between the reaction under acidic conditions and the reaction under basic conditions. A liquid separation operation can be performed by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used. At the time of liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc., solvents not compatible with water such as hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible to add. In addition, these solvents can be used alone or in combination of two or more in any proportion. The number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield.
 前記で得られた式(4b)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 Although the reaction mixture containing the compound represented by Formula (4b) obtained above can remove water with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
 前記で得られた式(4b)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (4b) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
 溶媒留去後に得られた式(4b)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (4b) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like using an appropriate solvent. It may be appropriately set according to the target purity.
 式(4b)で表される化合物は、式(4b’)
Figure JPOXMLDOC01-appb-C000091

(式中、R2、X、YおよびU1は、前記と同義である。)
で表される異性体も含む。
The compound represented by the formula (4b) is a compound represented by the formula (4b ′)
Figure JPOXMLDOC01-appb-C000091

(Wherein R 2, X, Y and U 1 are as defined above)
It also includes the isomer represented by
 式(4b’)で表される化合物は、式(4b)で表される化合物と同様に取り扱うことが可能であり、例えば、製造方法Cに適応することができる。また、式(4b’)で表される化合物は不斉炭素を含むが、その異性体混合比は、単独でも任意の割合の混合物でもよい。さらに、式(4b)で表される化合物と式(4b’)で表される化合物との混合物でもよく、その異性体混合比は、単独でも任意の割合の混合物でもよい。 The compound represented by the formula (4b ′) can be handled in the same manner as the compound represented by the formula (4b), and can be applied to, for example, the production method C. In addition, although the compound represented by the formula (4b ') contains an asymmetric carbon, the isomer mixing ratio may be a single one or a mixture of any ratio. Furthermore, it may be a mixture of the compound represented by the formula (4b) and the compound represented by the formula (4b ′), and the isomer mixing ratio may be a single or a mixture of any ratio.
[製造方法C]
Figure JPOXMLDOC01-appb-C000092
[Manufacturing method C]
Figure JPOXMLDOC01-appb-C000092
 式中、R9は、水素原子、水酸基、シアノ基、置換基Aで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Aで適宜置換されてもよいC2~C6のアルケニル基、C2~C6のハロアルケニル基、置換基Aで適宜置換されてもよいC2~C6のアルキニル基、C2~C6のハロアルキニル基、置換基Aで適宜置換されてもよいC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、置換基Aで適宜置換されてもよいC3~C8のシクロアルコキシ基、置換基Aで適宜置換されてもよいC2~C6のアルケニルオキシ基、C2~C6のハロアルケニルオキシ基、置換基Aで適宜置換されてもよいC3~C6のアルキニルオキシ基、C3~C6のハロアルキニルオキシ基、またはRaRbN-(ここで、RaおよびRbは、前記と同義である。)を表し、R2、R8、X、YおよびU1は、前記と同義である。 In the formula, R 9 represents a hydrogen atom, a hydroxyl group, a cyano group, a C 1 to C 6 alkyl group optionally substituted with substituent A, a C 1 to C 6 haloalkyl group, C 3 optionally substituted with substituent A C8 cycloalkyl group, C2 to C6 alkenyl group optionally substituted with substituent A, C2 to C6 haloalkenyl group, C2 to C6 alkynyl group optionally substituted with substituent A, C2 to C6 C6 haloalkynyl group, C1 to C6 alkoxy group optionally substituted with substituent A, C1 to C6 haloalkoxy group, C3 to C8 cycloalkoxy group optionally substituted with substituent A, substitution A C2 to C6 alkenyloxy group which may be optionally substituted by a group A, a C2 to C6 haloalkenyloxy group, a C3 to C6 alkynyloxy group which may be optionally substituted by a substituent A, 3 ~ haloalkynyloxy group C6, or RaRbN- (wherein, Ra and Rb have the same meanings as defined above.) Represent, R2, R8, X, Y and U1 are as defined above.
 製造方法Cは、本発明化合物の製造中間体である式(5)で表される化合物を得る方法であって、式(4)で表される化合物とR1NHとを、酸存在下で反応させることを含む製造方法である。 Manufacturing method C, the present invention is a production intermediate of the compound A method of obtaining a compound represented by the formula (5), a compound R1NH 2 of the formula (4), the reaction in the presence of an acid Manufacturing method including the step of
 本反応に使用するR9NHは、市販品として入手または公知の方法で製造することができる。R9NHは、塩酸、酢酸のような酸性化合物との塩を形成したものでもよく、目的とする反応が進行する限りにおいて特に限定されることはない。 R9NH 2 used in this reaction can be produced by obtaining or known manner as a commercially available product. R9NH 2 are hydrochloric, may be those forming a salt with an acidic compound such as acetic acid, it is not particularly limited as long as the reaction proceeds to the desired.
 本反応に使用するR9NHは、式(4)で表される化合物に対して1当量以上あればよく、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、1当量以上200当量以下である。 R9NH 2 used in this reaction may be at least 1 equivalent with respect to the compound represented by Formula (4), and is not particularly limited as long as the target reaction proceeds, but usually 1 equivalent More than 200 equivalents.
 本反応に使用する酸として、塩酸、硫酸等の無機酸類や、酢酸、メタンスルホン酸、p-トルエンスルホン酸等の有機酸類が例示され、目的とする反応が進行する限りにおいて特に限定することはないが、好ましくは、酢酸である。また、R9NHと酸性化合物との塩を使用する際には、酸の使用は必須ではない。 Examples of the acid used in this reaction include inorganic acids such as hydrochloric acid and sulfuric acid, and organic acids such as acetic acid, methanesulfonic acid and p-toluenesulfonic acid, and there is no particular limitation as long as the target reaction proceeds. None but is preferably acetic acid. Further, when using salts of R9NH 2 and the acidic compound, the use of acid is not essential.
 本反応に使用する酸の量は、R9NHに対して1当量以上あればよく、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、1当量以上200当量以下である。また、使用する酸が液体である場合には、溶媒として使用することも可能である。 The amount of the acid used in this reaction may be 1 equivalent or more with respect to R 9 NH 2 , and is not particularly limited as long as the target reaction proceeds, but is usually 1 equivalent or more and 200 equivalents or less . When the acid used is a liquid, it can also be used as a solvent.
 本反応には溶媒を使用することができるが、必ずしも必須ではない。 Although a solvent can be used for this reaction, it is not necessarily essential.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、酢酸、メタンスルホン酸等の酸性系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。溶媒として、好ましくは、酸性系溶媒が挙げられ、さらに好ましくは、酢酸が挙げられる。 The solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but acidic solvents such as acetic acid and methanesulfonic acid, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxymethane Ether solvents such as ethane, tetrahydrofuran and dioxane, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ethyl acetate, isopropyl acetate and butyl acetate Ester solvents, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, and urea solvents such as 1,3-dimethyl-2-imidazolidinone Melting , Dichloromethane, dichloroethane, chloroform, and halogen solvents such as carbon tetrachloride. These solvents may be used alone or in combination of two or more in any proportion. As a solvent, Preferably, an acidic solvent is mentioned, More preferably, an acetic acid is mentioned.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(4)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 to 200 times by weight the amount of the compound represented by Formula (4). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、50℃以上180℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually 50 ° C. or more and 180 ° C. or less or the boiling point or less of the solvent.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 For post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used. At the time of liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc., solvents not compatible with water such as hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible to add. In addition, these solvents can be used alone or in combination of two or more in any proportion. The number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield.
 前記で得られた式(5)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 Although the reaction mixture containing the compound represented by Formula (5) obtained above can remove water with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
 前記で得られた式(5)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (5) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
 溶媒留去後に得られた式(5)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (5) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like using an appropriate solvent. It may be appropriately set according to the target purity.
[製造方法D]
Figure JPOXMLDOC01-appb-C000093
[Manufacturing method D]
Figure JPOXMLDOC01-appb-C000093
 式中、Lvはメタンスルホニル基、トリフルオロメタンスルホニル基、p‐トルエンスルホニル基、ハロゲン原子等の脱離基を表し、R1、R2、X、YおよびU1は、前記と同義である。 In the formula, Lv represents a leaving group such as methanesulfonyl group, trifluoromethanesulfonyl group, p-toluenesulfonyl group, halogen atom and the like, and R 1, R 2, X, Y and U 1 are as defined above.
 製造方法Dは、本発明化合物の製造中間体である式(5b)で表される化合物を得る方法であって、式(5a)で表される化合物とR1-Lvとを、塩基存在下、溶媒中で反応させることを含む製造方法である。 Production method D is a method for obtaining a compound represented by the formula (5b), which is a production intermediate of the compound of the present invention, and the compound represented by the formula (5a) and R1-Lv in the presence of a base It is a manufacturing method including reacting in a solvent.
 本発明の原料である式(5a)で表される化合物は、製造方法Cやジャーナル オブ ヘテロサイクリック ケミストリー(Journal of OHeterocyclic Chemistry)、20巻、65-67項(1983).等の非特許文献を参照に合成することができる。 The compound represented by the formula (5a), which is a raw material of the present invention, can be produced by the production method C or Journal of Heterocyclic Chemistry (Journal of OH Chemistry), Vol. 20, pp. 65-67 (1983). Non-patent documents such as J. et al.
 本反応に使用するR1‐Lvは、市販品として入手または公知の方法で製造することができる。 R1-Lv used for this reaction can be obtained as a commercial item or can be produced by a known method.
 本反応に使用する塩基として、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、水素化ナトリウム等の無機塩基類が例示されるが、目的とする反応が進行する限りにおいて特に限定されることはない。 Examples of the base used in this reaction include inorganic bases such as sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium hydride and the like, but are particularly limited as long as the target reaction proceeds. It will not be done.
 本反応に使用する塩基の量は、式(5a)で表される化合物に対して1当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、1当量以上10当量以下である。 The amount of the base used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (5a), and is not particularly limited as long as the target reaction proceeds, but usually 1 It is equal to or more than 10 equivalents.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ジメチルスルホキシド、スルホラン等の硫黄系溶媒、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used for this reaction is not particularly limited as long as the target reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc. Alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, Amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloroethane, Chloroform, halogenated solvents such as carbon tetrachloride, dimethyl sulfoxide, sulfur-based solvents such as sulfolane, acetone, methyl ethyl ketone, ketone solvents such as methyl isobutyl ketone. These solvents may be used alone or in combination of two or more in any proportion.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(5a)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 to 200 times by weight the amount of the compound represented by Formula (5a). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、0℃以上150℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually 0 ° C. or more and 150 ° C. or less or the boiling point or less of the solvent.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 For post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used. At the time of liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc., solvents not compatible with water such as hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible to add. In addition, these solvents can be used alone or in combination of two or more in any proportion. The number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield.
 前記で得られた式(5b)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 Although the reaction mixture containing the compound represented by Formula (5b) obtained above can remove water with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
 前記で得られた式(5b)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (5b) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
 溶媒留去後に得られた式(5b)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (5b) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like using an appropriate solvent. It may be appropriately set according to the target purity.
[製造方法E]
Figure JPOXMLDOC01-appb-C000094
[Manufacturing method E]
Figure JPOXMLDOC01-appb-C000094
 式中、SRは硫黄化剤を表し、R1、R2、YおよびU1は、前記と同義である。 In the formula, SR represents a sulfurizing agent, and R 1, R 2, Y and U 1 are as defined above.
 製造方法Eは、式(5b)で表される化合物のうち、式(5b-2)で表される化合物を得る方法であって、式(5b-1)で表される化合物と硫黄化剤(SR)とを、溶媒中で反応させることを含む製造方法である。 Production method E is a method for obtaining the compound represented by the formula (5b-2) among the compounds represented by the formula (5b), wherein the compound represented by the formula (5b-1) and the sulfurizing agent It is a manufacturing method including making (SR) react in a solvent.
 本反応に使用する硫黄化剤としては、ローソン試薬(2,4-ビス(4-メトキシフェニル)-1,3-ジチア-2,4-ジホスフェタン-2,4-ジスルフィド)等が挙げられる。 Examples of the sulfurizing agent used in the present reaction include Lawesson's reagent (2,4-bis (4-methoxyphenyl) -1,3-dithia-2,4-diphosphetan-2,4-disulfide).
 本反応に使用する硫黄化剤の量は、式(5b-1)で表される化合物に対して0.5当量以上あればよく、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、1当量以上10当量以下である。 The amount of the sulfurizing agent used in this reaction may be 0.5 equivalents or more with respect to the compound represented by the formula (5b-1), and is particularly limited as long as the target reaction proceeds Although it is not, it is usually 1 equivalent or more and 10 equivalents or less.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used for this reaction is not particularly limited as long as the target reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc. Benzene-based solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene and the like can be mentioned. These solvents may be used alone or in combination of two or more in any proportion.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(5b-1)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 times by weight or more and 200 times by weight the compound represented by the formula (5b-1) It is below.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、50℃以上180℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually 50 ° C. or more and 180 ° C. or less or the boiling point or less of the solvent.
 反応の後処理としては、反応混合物に対して、水、もしくは適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。また、本反応においては、分液操作は必須ではない。 For post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used. At the time of liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc., solvents not compatible with water such as hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible to add. In addition, these solvents can be used alone or in combination of two or more in any proportion. The number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield. In addition, liquid separation operation is not essential in this reaction.
 前記で得られた式(5b-2)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 Although the reaction mixture containing the compound represented by the formula (5b-2) obtained above can be freed of moisture with a desiccant such as sodium sulfate or magnesium sulfate, it is not essential.
 前記で得られた式(5b-2)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (5b-2) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
 溶媒留去後に得られた式(5b-2)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (5b-2) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like using an appropriate solvent. It may be appropriately set according to the target purity.
[製造方法F]
Figure JPOXMLDOC01-appb-C000095
[Manufacturing method F]
Figure JPOXMLDOC01-appb-C000095
 式中、R2aは、置換基Aで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Aで適宜置換されてもよいC2~C6のアルケニル基、C2~C6のハロアルケニル基、置換基Aで適宜置換されてもよいC2~C6のアルキニル基、C2~C6のハロアルキニル基、またはRdC(=O)-(ここで、Rdは、前記と同義である。)を表し、R1、X、Y、U1およびLvは、前記と同義である。 In the formula, R 2a is a C 1 to C 6 alkyl group which may be optionally substituted with a substituent A, a C 1 to C 6 haloalkyl group, a C 3 to C 8 cycloalkyl group which may be optionally substituted with a substituent A, a substituent C2-C6 alkenyl group optionally substituted with A, C2-C6 haloalkenyl group, C2-C6 alkynyl group optionally substituted with substituent A, C2-C6 haloalkynyl group, or RdC (= O)-(wherein, Rd is as defined above), and R 1, X, Y, U 1 and Lv are as defined above.
 製造方法Fは、式(5b)で表される化合物のうち、R2aが置換基Aで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Aで適宜置換されてもよいC2~C6のアルケニル基、C2~C6のハロアルケニル基、置換基Aで適宜置換されてもよいC2~C6のアルキニル基、C2~C6のハロアルキニル基、またはRdC(=O)-(ここで、Rdは、前記と同義である。)である式(5b-4)で表される化合物を得る方法であって、式(5b-3)で表される化合物とR2a-Lvとを、塩基存在下、溶媒中で反応させることを含む製造方法である。 In the compound represented by the formula (5b), the production method F is suitably substituted with a C1 to C6 alkyl group optionally substituted with a substituent A, a C1 to C6 haloalkyl group, and a substituent A of R2a. C3-C8 cycloalkyl group which may be substituted, C2-C6 alkenyl group which may be optionally substituted by substituent A, C2-C6 haloalkenyl group, C2-C6 which may be optionally substituted by substituent A A method of obtaining a compound represented by the formula (5b-4) which is an alkynyl group, a C2 to C6 haloalkynyl group, or RdC (CO) — (wherein Rd is as defined above). And the reaction of reacting the compound represented by the formula (5b-3) with R2a-Lv in a solvent in the presence of a base.
 本反応に使用するR2a-Lvは、市販品として入手または公知の方法で製造することができる。 R2a-Lv used in this reaction can be obtained as a commercial product or can be produced by a known method.
 本反応に使用するR2a-Lvの量は、式(5b-3)で表される化合物に対して1当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、1当量以上1.8当量以下である。 The amount of R2a-Lv used in this reaction may be 1 equivalent or more with respect to the compound represented by Formula (5b-3), and is not particularly limited as long as the target reaction proceeds. Usually, it is 1 equivalent or more and 1.8 equivalents or less.
 本反応に使用する塩基として、水素化ナトリウム等の金属ヒドリド類、メチルリチウム、ブチルリチウム、sec-ブチルリチウム、t-ブチルリチウム、ヘキシルリチウム等の有機リチウム類や、リチウムジイソプロピルアミド、ヘキサメチルジシラザンリチウム、ヘキサメチルジシラザンナトリウム、ヘキサメチルジシラザンカリウム等の金属アミド類が例示される。 As a base used for this reaction, metal hydrides such as sodium hydride, organolithiums such as methyllithium, butyllithium, sec-butyllithium, t-butyllithium, hexyllithium, lithium diisopropylamide, hexamethyldisilazane Metal amides such as lithium, hexamethyldisilazane sodium and hexamethyldisilazane potassium are exemplified.
 本反応に使用する塩基の量は、式(5b-3)で表される化合物に対して1当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、1当量以上10当量以下である。 The amount of the base used in this reaction may be 1 equivalent or more to the compound represented by the formula (5b-3), and is not particularly limited as long as the target reaction proceeds, 1 equivalent or more and 10 equivalents or less.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used for this reaction is not particularly limited as long as the target reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc. Examples thereof include benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, and hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. These solvents may be used alone or in combination of two or more in any proportion.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(5b-3)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 times by weight or more and 200 times by weight the compound represented by the formula (5b-3) It is below.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、-80℃以上100℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually −80 ° C. or more and 100 ° C. or less or the boiling point or less of the solvent.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 For post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used. At the time of liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Adding a solvent which is not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane and chloroform, and hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible. In addition, these solvents can be used alone or in combination of two or more in any proportion. The number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield.
 前記で得られた式(5b-4)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 Although the reaction mixture containing the compound represented by the formula (5b-4) obtained above can be freed of water with a desiccant such as sodium sulfate or magnesium sulfate, it is not essential.
 前記で得られた式(5b-4)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (5b-4) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
 溶媒留去後に得られた式(5b-4)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (5b-4) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like using an appropriate solvent. It may be appropriately set according to the target purity.
[製造方法G]
Figure JPOXMLDOC01-appb-C000096
[Manufacturing method G]
Figure JPOXMLDOC01-appb-C000096
 式中、Oxは酸化剤を表し、R1、R2、X、YおよびU1は、前記と同義である。 In the formula, Ox represents an oxidizing agent, and R 1, R 2, X, Y and U 1 are as defined above.
 製造方法Gは、本発明化合物の製造中間体である式(6)で表される化合物を得る方法であって、式(5b)で表される化合物と酸化剤(Ox)とを、溶媒中で反応させることを含む製造方法である。 Production method G is a method for obtaining a compound represented by the formula (6) which is a production intermediate of the compound of the present invention, which comprises the compound represented by the formula (5b) and an oxidizing agent (Ox) in a solvent Manufacturing method comprising reacting at.
 本反応に使用する酸化剤としては、二酸化マンガン等の金属酸化物類、2,3-ジクロロ-5,6-ジシアノ-p-ベンゾキノン等のベンゾキノン類、アゾビスイソブチロニトリル、過酸化ベンゾイル等のラジカル開始剤とN-クロロスクシンイミド、N-ブロモスクシンイミド、N-ヨードスクシンイミド、1,3-ジクロロ-5,5-ジメチルヒダントイン、1,3-ジブロモ-5,5-ジメチルヒダントイン、1,3-ジヨード-5,5-ジメチルヒダントイン等のハロゲン化剤とを組み合わせたもの等を使用することができる。 As an oxidizing agent used in this reaction, metal oxides such as manganese dioxide, benzoquinones such as 2,3-dichloro-5,6-dicyano-p-benzoquinone, azobisisobutyronitrile, benzoyl peroxide and the like Radical initiators of N-chlorosuccinimide, N-bromosuccinimide, N-iodosuccinimide, 1,3-dichloro-5,5-dimethylhydantoin, 1,3-dibromo-5,5-dimethylhydantoin, 1,3- A combination of a halogenating agent such as diiodo-5,5-dimethylhydantoin can be used.
 以下、酸化剤が金属酸化物類である方法について説明する。 Hereinafter, a method in which the oxidizing agent is a metal oxide will be described.
 本反応に使用する酸化剤の量は、式(5b)に表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、1当量以上200当量以下である。 The amount of the oxidizing agent used in this reaction is not particularly limited as long as the target reaction proceeds, provided that the amount is 1 equivalent or more with respect to the compound represented by Formula (5b). It is equal to or more than 200 equivalents.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but benzene, toluene, xylene, mesitylene, benzene, such as chlorobenzene, dichlorobenzene, dichloromethane, dichloroethane, chloroform, Halogen solvents such as carbon tetrachloride and the like can be mentioned. These solvents may be used alone or in combination of two or more in any proportion.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(5b)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 times by weight or more and 200 times by weight or less with respect to the compound represented by Formula (5b) is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、0℃以上150℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually 0 ° C. or more and 150 ° C. or less or the boiling point or less of the solvent.
 反応の後処理としては、溶解していない金属類を濾過することにより除去することが可能である。さらに、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。また、本反応において、分液操作は必須ではない。 As post-treatment of the reaction, it is possible to remove undissolved metals by filtration. Furthermore, it is possible to carry out a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used. At the time of liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc., solvents not compatible with water such as hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible to add. In addition, these solvents can be used alone or in combination of two or more in any proportion. The number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield. In addition, separation operation is not essential in this reaction.
 前記で得られた式(6)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 Although the reaction mixture containing the compound represented by Formula (6) obtained above can remove water with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
 前記で得られた式(6)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (6) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
 溶媒留去後に得られた式(6)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (6) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like using an appropriate solvent. It may be appropriately set according to the target purity.
 以下、酸化剤がベンゾキノン類である方法について説明する。
 本反応に使用する酸化剤の量は、式(5b)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、1当量以上20当量以下である。
Hereinafter, the method in which the oxidizing agent is benzoquinones will be described.
The amount of the oxidizing agent used in this reaction is not particularly limited as long as the target reaction proceeds, provided that the amount is 1 equivalent or more with respect to the compound represented by formula (5b). It is equal to or more than 20 equivalents.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but benzene, toluene, xylene, mesitylene, benzene, such as chlorobenzene, dichlorobenzene, dichloromethane, dichloroethane, chloroform, Halogen solvents such as carbon tetrachloride and the like can be mentioned. These solvents may be used alone or in combination of two or more in any proportion.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(5b)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 times by weight or more and 200 times by weight or less with respect to the compound represented by Formula (5b) is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、0℃以上150℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually 0 ° C. or more and 150 ° C. or less or the boiling point or less of the solvent.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。また、本反応において、分液操作は必須ではない。 For post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used. At the time of liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc., solvents not compatible with water such as hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible to add. In addition, these solvents can be used alone or in combination of two or more in any proportion. The number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield. In addition, separation operation is not essential in this reaction.
 前記で得られた式(6)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 Although the reaction mixture containing the compound represented by Formula (6) obtained above can remove water with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
 前記で得られた式(6)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (6) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
 溶媒留去後に得られた式(6)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (6) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like using an appropriate solvent. It may be appropriately set according to the target purity.
 以下、酸化剤がラジカル開始剤とハロゲン化剤との組み合わせである方法について説明する。 Hereinafter, a method in which the oxidizing agent is a combination of a radical initiator and a halogenating agent will be described.
 本反応に使用するラジカル開始剤とハロゲン化剤の量は、それぞれ、式(5b)で表される化合物に対して0.01当量以上と1.0当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはない。通常、ラジカル開始剤が0.01当量以上1当量以下であり、ハロゲン化剤が1当量以上3当量以下である。 If the amount of the radical initiator and the halogenating agent used in this reaction is 0.01 equivalent or more and 1.0 equivalent or more, respectively, to the compound represented by the formula (5b), the target reaction proceeds There is no particular limitation as far as it is. Usually, the radical initiator is 0.01 equivalent or more and 1 equivalent or less, and the halogenating agent is 1 equivalent or more and 3 equivalents or less.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、クロロベンゼン、ジクロロベンゼン等のハロゲン化ベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used for this reaction is not particularly limited as long as the target reaction proceeds, but halogenated benzene solvents such as chlorobenzene and dichlorobenzene, and esters such as ethyl acetate, isopropyl acetate and butyl acetate Examples thereof include solvents, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. These solvents may be used alone or in combination of two or more in any proportion.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(5b)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 times by weight or more and 200 times by weight or less with respect to the compound represented by Formula (5b) is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、20℃以上150℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually 20 ° C. or more and 150 ° C. or less or the boiling point or less of the solvent.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 For post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used. At the time of liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Adding a solvent which is not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane and chloroform, and hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible. In addition, these solvents can be used alone or in combination of two or more in any proportion. The number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield.
 前記で得られた式(6)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 Although the reaction mixture containing the compound represented by Formula (6) obtained above can remove water with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
 前記で得られた式(6)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (6) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
 溶媒留去後に得られた式(6)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (6) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like using an appropriate solvent. It may be appropriately set according to the target purity.
[製造方法H]
Figure JPOXMLDOC01-appb-C000097
[Manufacturing method H]
Figure JPOXMLDOC01-appb-C000097
 式中、R2bはハロゲン原子を表し、HalRはハロゲン化剤を表し、R1、X、Y、およびU1は前記と同義である。 In the formula, R 2 b represents a halogen atom, Hal R represents a halogenating agent, and R 1, X, Y and U 1 are as defined above.
 製造方法Hは、R2bがハロゲン原子を表す式(6b)で表される化合物を得る方法であって、式(6a)で表される化合物とハロゲン化剤(HalR)とを、溶媒中で反応させることを含む製造方法である。 Production method H is a method for obtaining a compound represented by the formula (6b) in which R 2 b represents a halogen atom, and the compound represented by the formula (6a) is reacted with a halogenating agent (HalR) in a solvent Manufacturing method including the step of
 本反応に使用するハロゲン化剤としては、セレクトロフルオル(N-フルオロ-N’-トリエチレンジアミン ビス(テトラフルオロボラート))、N-クロロスクシンイミド、N-ブロモスクシンイミド、N-ヨードスクシンイミド、1,3-ジクロロ-5,5-ジメチルヒダントイン、1,3-ジブロモ-5,5-ジメチルヒダントイン、1,3-ジヨード-5,5-ジメチルヒダントイン、臭素、ヨウ素等が挙げられる。 As a halogenating agent used for this reaction, selectrofluor (N-fluoro-N'-triethylenediamine bis (tetrafluoroborate)), N-chlorosuccinimide, N-bromosuccinimide, N-iodosuccinimide, 1 2,3-dichloro-5,5-dimethylhydantoin, 1,3-dibromo-5,5-dimethylhydantoin, 1,3-diiodo-5,5-dimethylhydantoin, bromine, iodine and the like.
 本反応に使用するハロゲン化剤の量は、式(6a)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、1当量以上10当量以下である。ただし、ヒダントインを含むハロゲン化剤の量は、0.5当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはなく、通常、1当量以上5当量以下である。 The amount of the halogenating agent used in this reaction is not particularly limited as long as the target reaction proceeds, provided that the amount is at least 1 equivalent with respect to the compound represented by formula (6a). 1 to 10 equivalents. However, the amount of the halogenating agent containing hydantoin is not particularly limited as long as the target reaction proceeds as long as the amount of the halogenating agent containing the hydantoin is 0.5 equivalents or more.
 本反応に使用するハロゲン化剤がヨウ素化剤である場合、塩酸、硫酸等の無機酸類や、酢酸、トリフルオロ酢酸、メタンスルホン酸、トリフルオロメタンスルホン酸等の有機酸のような酸を加えることができる。 When the halogenating agent used in this reaction is an iodizing agent, add an acid such as an inorganic acid such as hydrochloric acid or sulfuric acid, or an organic acid such as acetic acid, trifluoroacetic acid, methanesulfonic acid, or trifluoromethanesulfonic acid Can.
 本反応に使用するハロゲン化剤がヨウ素化剤である場合に使用する酸の量は、式(6a)で表される化合物に対して0.01当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、0.1当量以上3当量以下である。 When the amount of the acid used when the halogenating agent used in this reaction is an iodination agent is 0.01 equivalent or more to the compound represented by the formula (6a), the target reaction proceeds Although there is no particular limitation in the limitation, it is usually 0.1 equivalent or more and 3 equivalents or less.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、硫酸、酢酸、トリフルオロ酢酸、メタンスルホン酸、トリフルオロメタンスルホン酸等の酸性系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used for this reaction is not particularly limited as long as the target reaction proceeds, but acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid, trifluoromethanesulfonic acid, etc., diethyl ether Ether solvents such as diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc. Alcohol solvents such as methanol, ethanol, isopropanol etc. Benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene etc Ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, and N, N-dimethylacetamide 1,3-dimethyl-2-urea-based solvent-imidazolidinone, dichloromethane, dichloroethane, chloroform, and halogen solvents such as carbon tetrachloride. These solvents may be used alone or in combination of two or more in any proportion.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(6a)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 to 200 times by weight the amount of the compound represented by formula (6a) is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、0℃以上150℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually 0 ° C. or more and 150 ° C. or less or the boiling point or less of the solvent.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 For post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used. At the time of liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc., solvents not compatible with water such as hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible to add. In addition, these solvents can be used alone or in combination of two or more in any proportion. The number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield.
 前記で得られた式(6b)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 Although the reaction mixture containing the compound represented by Formula (6b) obtained above can remove water with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
 前記で得られた式(6b)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (6b) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
 溶媒留去後に得られた式(6b)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (6b) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like using an appropriate solvent. It may be appropriately set according to the target purity.
[製造方法I]
Figure JPOXMLDOC01-appb-C000098
[Production method I]
Figure JPOXMLDOC01-appb-C000098
 式中、Jは酸素原子または硫黄原子を表し、Jが酸素原子の場合、R2cは置換基Aで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Aで適宜置換されてもよいC2~C6のアルケニル基、C2~C6のハロアルケニル基、置換基Aで適宜置換されてもよいC2~C6のアルキニル基、C2~C6のハロアルキニル基を表し、Jが硫黄原子の場合、R2cはC1~C6のアルキル基またはC1~C6のハロアルキル基を表し、Qは水素原子または金属を表し、R1、R2b、X、YおよびU1は前記と同義である。 In the formula, J represents an oxygen atom or a sulfur atom, and when J is an oxygen atom, R2c is a C1 to C6 alkyl group optionally substituted with a substituent A, a C1 to C6 haloalkyl group, a substituent A C3-C8 cycloalkyl group which may be optionally substituted, C2-C6 alkenyl group which may be optionally substituted by substituent A, C2-C6 haloalkenyl group, C2 which may be optionally substituted by substituent A R 2 c represents a C 1 to C 6 alkynyl group, a C 2 to C 6 haloalkynyl group, and when J is a sulfur atom, R 2 c represents a C 1 to C 6 alkyl group or a C 1 to C 6 haloalkyl group, and Q represents a hydrogen atom or a metal R1, R2b, X, Y and U1 are as defined above.
 製造方法Iは、Jは酸素原子または硫黄原子を表し、Jが酸素原子の場合、R2cが置換基Aで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Aで適宜置換されてもよいC2~C6のアルケニル基、C2~C6のハロアルケニル基、置換基Aで適宜置換されてもよいC2~C6のアルキニル基、C2~C6のハロアルキニル基を表し、Jが硫黄原子の場合、R2cはC1~C6のアルキル基またはC1~C6のハロアルキル基を表す式(6c)で表される化合物を得る方法であって、式(6b)で表される化合物とR2c-J-Qとを、遷移金属類の存在下に反応させるカップリング反応によって得ることを含む製造方法である。 In the production method I, J represents an oxygen atom or a sulfur atom, and when J is an oxygen atom, a C1-C6 alkyl group optionally substituted with a substituent A, a C1-C6 haloalkyl group, a substituent A C3-C8 cycloalkyl group optionally substituted by A, a C2-C6 alkenyl group optionally substituted by a substituent A, a C2-C6 haloalkenyl group, optionally substituted by a substituent A Represents a good C2 to C6 alkynyl group or a C2 to C6 haloalkynyl group, and when J is a sulfur atom, R2c is a group represented by the formula (6c) representing a C1 to C6 alkyl group or a C1 to C6 haloalkyl group A method for obtaining a compound, which comprises obtaining a compound represented by the formula (6b) and R2c-J-Q by a coupling reaction in which they are reacted in the presence of transition metals.
 式(6b)で表される化合物中、好ましいR2bは、塩素原子、臭素原子、またはヨウ素原子である。 In the compound represented by the formula (6b), preferable R2b is a chlorine atom, a bromine atom or an iodine atom.
 本反応に使用するR2c-J-Qは、市販品として入手または公知の方法で製造できる。好ましいQは、水素原子、または、ナトリウム、カリウム等のアルカリ金属類である。 R2c-J-Q used for this reaction can be obtained as a commercially available product or can be produced by a known method. Preferred Q is a hydrogen atom or an alkali metal such as sodium or potassium.
 本反応に使用するR2c-J-Qの量は、式(6b)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはない。Qが水素原子のときは、溶媒としても使用可能である。 The amount of R2c-J-Q used in this reaction is not particularly limited as long as the target reaction proceeds, provided that it is at least one equivalent with respect to the compound represented by formula (6b). When Q is a hydrogen atom, it can also be used as a solvent.
 本反応に使用する遷移金属類は、配位子を有してよく、酢酸パラジウム、[1,1’-ビス(ジフェニルホスフィノ)フェロセン]パラジウムジクロリド、トリス(ジベンジリデンアセトン)ジパラジウム、テトラキス(トリフェニルホスフィン)パラジウム、ビス(トリフェニルホスフィン)パラジウムジクロリド等のパラジウム類等である。 The transition metal used in this reaction may have a ligand, and palladium acetate, [1,1′-bis (diphenylphosphino) ferrocene] palladium dichloride, tris (dibenzylideneacetone) dipalladium, tetrakis ( And triphenyl phosphine) palladium, palladium such as bis (triphenyl phosphine) palladium dichloride, and the like.
 本反応に使用する遷移金属類の量は、式(6b)で表される化合物に対して、通常、0.001当量以上1当量以下であるが、目的とする反応が進行する限りにおいて特に限定されることはない。 The amount of transition metals used in this reaction is usually 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by formula (6b), but is particularly limited as long as the target reaction proceeds It will not be done.
 本反応を効率的に進行させるために、トリフェニルホスフィン、1,1’-ビス(ジフェニルホスフィノ)フェロセン、2-ジシクロヘキシルホスフィノ-2’4’6’-トリイソプロピルビフェニル、2-ジ-t-ブチルホスフィノ-2’4’6’-トリイソプロピルビフェニル等のホスフィン配位子を添加することができる。 In order to allow the reaction to proceed efficiently, triphenylphosphine, 1,1′-bis (diphenylphosphino) ferrocene, 2-dicyclohexylphosphino-2′4′6′-triisopropylbiphenyl, 2-di-t Phosphine ligands such as -butylphosphino-2'4'6'-triisopropylbiphenyl can be added.
 本反応に使用するホスフィン配位子の量は、式(6b)で表される化合物に対して、通常、0.001当量以上1当量以下であるが、目的とする反応が進行する限りにおいて特に限定されることはない。 The amount of the phosphine ligand used in this reaction is generally 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (6b), but in particular as long as the target reaction proceeds There is no limitation.
 本反応に使用する塩基は、炭酸ナトリウム、炭酸カリウム、炭酸セシウムのような無機塩基類やトリエチルアミン、トリブチルアミン、ジイソプロピルエチルアミン等の有機塩基類等である。 Bases used in this reaction are inorganic bases such as sodium carbonate, potassium carbonate and cesium carbonate, and organic bases such as triethylamine, tributylamine and diisopropylethylamine.
 本反応に使用する塩基の量は、式(6b)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、1当量以上50当量以下である。 The amount of the base used in this reaction is not particularly limited as long as the target reaction proceeds, provided that it is at least 1 equivalent with respect to the compound represented by formula (6b), but usually 1 equivalent It is more than 50 equivalents.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、R2c-J-H(式中、R2cは前記と同義であり、Jは酸素原子である。)で表されるアルコール溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used for this reaction is not particularly limited as long as the target reaction proceeds, but R2c-JH (wherein, R2c is as defined above, and J is an oxygen atom). Ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane etc., benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene etc. Can be mentioned. These solvents may be used alone or in combination of two or more in any proportion.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(6b)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 to 200 times by weight the amount of the compound represented by formula (6b) is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、30℃以上200℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually 30 ° C. or more and 200 ° C. or less or the boiling point or less of the solvent.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。また、濾過操作を行うことにより、不溶物を除去することも可能であるが必須ではない。 For post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used. At the time of liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc., solvents not compatible with water such as hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible to add. In addition, these solvents can be used alone or in combination of two or more in any proportion. The number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield. It is also possible, but not essential, to remove insolubles by carrying out a filtration operation.
 前記で得られた式(6c)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 Although the reaction mixture containing the compound represented by Formula (6c) obtained above can remove water with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
 前記で得られた式(6c)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (6c) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
 溶媒留去後に得られた式(6c)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (6c) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like using an appropriate solvent. It may be appropriately set according to the target purity.
[製造方法J]
Figure JPOXMLDOC01-appb-C000099
[Manufacturing method J]
Figure JPOXMLDOC01-appb-C000099
 式中、R2dは置換基Aで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Aで適宜置換されてもよいC2~C6のアルケニル基、またはC2~C6のハロアルケニル基を表し、R2d-Bは有機ボロン酸類を表し、R1、R2b、X、YおよびU1は前記と同義である。 In the formula, R 2 d is a C 1 to C 6 alkyl group which may be optionally substituted with a substituent A, a C 1 to C 6 haloalkyl group, a C 3 to C 8 cycloalkyl group which may be optionally substituted with a substituent A, a substituent A And a C2 to C6 alkenyl group which may be optionally substituted or a C2 to C6 haloalkenyl group, R 2 d-B represents an organoboronic acid, and R 1, R 2 b, X, Y and U 1 are as defined above .
 製造方法Jは、R2dが置換基Aで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Aで適宜置換されてもよいC2~C6のアルケニル基、またはC2~C6のハロアルケニル基である式(6d)で表される化合物を得る方法であって、式(6b)で表される化合物と有機ボロン酸類(R2d-B)とを遷移金属類および塩基存の在下で反応させる鈴木-宮浦カップリングによって得ることを含む製造方法である。 Production method J includes a C1 to C6 alkyl group optionally substituted with substituent A, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group optionally substituted with substituent A, and a substituent A method for obtaining a compound represented by the formula (6d) which is a C2 to C6 alkenyl group which may be optionally substituted by a group A, or a C2 to C6 haloalkenyl group, which is represented by the formula (6b) It is a production method including obtaining by Suzuki-Miyaura coupling in which a compound and an organic boronic acid (R2d-B) are reacted in the presence of a transition metal and a base.
 式(6b)中、好ましいR2bは、塩素原子、臭素原子、またはヨウ素原子である。 In formula (6b), preferable R2b is a chlorine atom, a bromine atom or an iodine atom.
 本反応に使用するR2d-Bは、有機ボロン酸や有機ボロン酸エステル等の有機ボロン酸類を表し、市販品として入手または公知の方法で製造できる。 R2d-B used in this reaction represents an organic boronic acid such as an organic boronic acid or an organic boronic acid ester, and can be obtained as a commercially available product or manufactured by a known method.
 本反応に使用するR2d-Bの量は、式(6b)で表される化合物に対して、1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、1当量以上10当量以下である。 The amount of R2d-B used in this reaction is not particularly limited as long as the target reaction proceeds, provided that it is at least 1 equivalent with respect to the compound represented by formula (6b). 1 equivalent or more and 10 equivalents or less.
 本反応に使用する遷移金属類は、パラジウム、ニッケル、ルテニウム等であり、配位子を有してよい。好ましくは、酢酸パラジウム、[1,1’-ビス(ジフェニルホスフィノ)フェロセン]パラジウムジクロリド、トリス(ジベンジリデンアセトン)ジパラジウム、テトラキス(トリフェニルホスフィン)パラジウム、ビス(トリフェニルホスフィン)パラジウムジクロリド等のパラジウム類が挙げられる。 Transition metals used in this reaction are palladium, nickel, ruthenium and the like, and may have a ligand. Preferably, palladium acetate, [1,1′-bis (diphenylphosphino) ferrocene] palladium dichloride, tris (dibenzylideneacetone) dipalladium, tetrakis (triphenylphosphine) palladium, bis (triphenylphosphine) palladium dichloride and the like Palladiums are mentioned.
 本反応に使用する遷移金属類の量は、式(6b)で表される化合物に対して、通常、0.001当量以上1当量以下であるが、目的とする反応が進行する限りにおいて特に限定されることはない。 The amount of transition metals used in this reaction is usually 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by formula (6b), but is particularly limited as long as the target reaction proceeds It will not be done.
 本反応を効率的に進行させるために、トリフェニルホスフィン、トリシクロヘキシルホスフィン等のホスフィン配位子を添加することができる。 In order to allow the present reaction to proceed efficiently, phosphine ligands such as triphenylphosphine and tricyclohexylphosphine can be added.
 本反応に使用するホスフィン配位子の量は、式(6b)で表される化合物に対して、通常、0.001当量以上1当量以下であるが、目的とする反応が進行する限りにおいて特に限定されることはない。 The amount of the phosphine ligand used in this reaction is generally 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (6b), but in particular as long as the target reaction proceeds There is no limitation.
 本反応に使用する塩基は、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、リン酸三カリウムのような無機塩基類やナトリウムメトキシド、ナトリウムエトキシド、ナトリウム t-ブトキシド、カリウム t-ブトキシド等の金属アルコキシド類等である。 Bases used in this reaction include inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate and tripotassium phosphate, and metal alkoxides such as sodium methoxide, sodium ethoxide, sodium t-butoxide and potassium t-butoxide Etc.
 本反応に使用する塩基の量は、式(6b)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、1当量以上50当量以下である。 The amount of the base used in this reaction is not particularly limited as long as the target reaction proceeds, provided that it is at least 1 equivalent with respect to the compound represented by formula (6b), but usually 1 equivalent It is more than 50 equivalents.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、水溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but water solvents, diethyl ether, diisopropyl ether, methyl-t-butyl ether, ethers such as dimethoxyethane, tetrahydrofuran, dioxane, etc. Examples of the solvent include benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene. These solvents may be used alone or in combination of two or more in any proportion.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(6b)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 to 200 times by weight the amount of the compound represented by formula (6b) is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、30℃以上200℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually 30 ° C. or more and 200 ° C. or less or the boiling point or less of the solvent.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。また、濾過操作を行うことにより、不溶物を除去することも可能であるが必須ではない。 For post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used. At the time of liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc., solvents not compatible with water such as hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible to add. In addition, these solvents can be used alone or in combination of two or more in any proportion. The number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield. It is also possible, but not essential, to remove insolubles by carrying out a filtration operation.
 前記で得られた式(6d)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 Although the reaction mixture containing the compound represented by Formula (6d) obtained above can remove water with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
 前記で得られた式(6d)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (6d) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
 溶媒留去後に得られた式(6d)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (6d) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like using an appropriate solvent. It may be appropriately set according to the target purity.
[製造方法K]
Figure JPOXMLDOC01-appb-C000100
[Manufacturing method K]
Figure JPOXMLDOC01-appb-C000100
 式中、R2eは置換基Aで適宜置換されてもよいC2~C6のアルキニル基、またはC2~C6のハロアルキニル基を表し、R1、R2b、X、YおよびU1は前記と同義である。 In the formula, R 2 e represents a C 2 to C 6 alkynyl group which may be optionally substituted with a substituent A, or a C 2 to C 6 haloalkynyl group, and R 1, R 2 b, X, Y and U 1 are as defined above.
 製造方法Kは、R2eが置換基Aで適宜置換されてもよいC2~C6のアルキニル基、またはC2~C6のハロアルキニル基である式(6e)で表される化合物を得る方法であって、(6b)で表される化合物と末端アルキン化合物とを遷移金属類および塩基の存在下で反応させる薗頭カップリングによって得ることを含む製造方法である。 Production method K is a method for obtaining a compound represented by the formula (6e) in which R2e is a C2 to C6 alkynyl group optionally substituted with a substituent A, or a C2 to C6 haloalkynyl group, It is a manufacturing method including obtaining by the Sonogashira coupling in which the compound represented by (6b) and a terminal alkyne compound are reacted in the presence of a transition metal and a base.
 式(6b)中、好ましいR2bは、塩素原子、臭素原子、またはヨウ素原子である。 In formula (6b), preferable R2b is a chlorine atom, a bromine atom or an iodine atom.
 本反応に使用する末端アルキン化合物は、市販品として入手または公知の方法で製造することができる。また、末端アルキン化合物として、トリメチルシリルアセチレンも使用することができる。この場合は、式(6b)で表される化合物にトリメチルシリルエチニル基を導入後、脱シリル化を行う必要がある。脱シリル化については、ジャーナル オブ ザ アメリカン ケミカル ソサエティー(Journal of the American Chemical Society)、第131巻、2号、634-643頁(2009).およびジャーナル オブ オルガノメタリック ケミストリー(Journal of Organometallic Chemistry)、第696巻、25号、4039-4045頁(2011).等の非特許文献を参考にして行うことができる。 The terminal alkyne compound used for this reaction can be obtained as a commercially available product or can be produced by a known method. Also, trimethylsilylacetylene can be used as a terminal alkyne compound. In this case, it is necessary to carry out desilylation after introducing a trimethylsilylethynyl group into the compound represented by the formula (6b). For desilylation, Journal of the American Chemical Society, Volume 131, No. 2, pages 634-643 (2009). And Journal of Organometallic Chemistry, Vol. 696, No. 25, pp. 4039-4045 (2011). Etc. can be referred to.
 本反応に使用する末端アルキン化合物の量は、式(6b)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、1当量以上10当量以下である。 The amount of the terminal alkyne compound to be used in this reaction is not particularly limited as long as the target reaction proceeds, provided that it is at least 1 equivalent with respect to the compound represented by formula (6b). 1 to 10 equivalents.
 本反応に使用する遷移金属類は、配位子を有してよく、酢酸パラジウム、[1,1’-ビス(ジフェニルホスフィノ)フェロセン]パラジウムジクロリド、トリス(ジベンジリデンアセトン)ジパラジウム、テトラキス(トリフェニルホスフィン)パラジウム、ビス(トリフェニルホスフィン)パラジウムジクロリド等のパラジウム類等である。また、塩化銅、臭化銅、ヨウ化銅等の銅類も同時に使用する。 The transition metal used in this reaction may have a ligand, and palladium acetate, [1,1′-bis (diphenylphosphino) ferrocene] palladium dichloride, tris (dibenzylideneacetone) dipalladium, tetrakis ( And triphenyl phosphine) palladium, palladium such as bis (triphenyl phosphine) palladium dichloride, and the like. In addition, coppers such as copper chloride, copper bromide and copper iodide are also used at the same time.
 本反応に使用する遷移金属類の量は、パラジウム類等および銅類が、それぞれ式(6b)で表される化合物に対して、通常、0.001当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはない。好ましい量は、双方ともに0.001当量以上1当量以下である。 The amount of transition metals used in this reaction is usually 0.001 equivalents or more with respect to the compound represented by the formula (6b) with each of palladium and the like, and the target reaction is There is no particular limitation as far as it progresses. The preferred amounts are both 0.001 to 1 equivalent.
 本反応に使用する塩基は、トリエチルアミン、トリブチルアミン、イソプロピルアミン、ジエチルアミン、ジイソプロピルアミン、ジイソプロピルエチルアミン等の有機アミン類や、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩基類等が挙げられる。 Examples of the base used in this reaction include organic amines such as triethylamine, tributylamine, isopropylamine, diethylamine, diisopropylamine and diisopropylethylamine, and inorganic bases such as sodium carbonate, potassium carbonate and cesium carbonate.
 本反応に使用する塩基の量は、式(6b)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、1当量以上50当量以下である。また、有機塩基で液体状のものに関しては、溶媒として使用することができる。 The amount of the base used in this reaction is not particularly limited as long as the target reaction proceeds, provided that it is at least 1 equivalent with respect to the compound represented by formula (6b), but usually 1 equivalent It is more than 50 equivalents. In addition, as to the organic base in liquid form, it can be used as a solvent.
 本反応を効率的に進行させるために、トリt-ブチルホスフィン、2-ジシクロヘキシルホスフィノ-2’4’6’-トリイソプロピルビフェニル等のホスフィン配位子を添加することができるが、必須ではない。 In order to allow the reaction to proceed efficiently, phosphine ligands such as tri-t-butylphosphine and 2-dicyclohexylphosphino-2'4'6'-triisopropylbiphenyl can be added, but it is not essential. .
 本反応に使用するホスフィン配位子の量は、式(6b)で表される化合物に対して、通常、0.001当量以上1当量以下であるが、目的とする反応が進行する限りにおいて特に限定されることはない。 The amount of the phosphine ligand used in this reaction is generally 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (6b), but in particular as long as the target reaction proceeds There is no limitation.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、トリエチルアミン、トリブチルアミン、イソプロピルアミン、ジエチルアミン、ジイソプロピルアミン、ジイソプロピルエチルアミン等の有機アミン溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used for this reaction is not particularly limited as long as the target reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc. Benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, N-methylpyrrolidone, N, N-dimethylformamide Amide solvents such as N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, triethylamine, Butylamine, isopropylamine, diethylamine, diisopropylamine, organic amine solvents such as diisopropylethylamine. These solvents may be used alone or in combination of two or more in any proportion.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(6b)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 to 200 times by weight the amount of the compound represented by formula (6b) is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、0℃以上150℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually 0 ° C. or more and 150 ° C. or less or the boiling point or less of the solvent.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。また、濾過操作を行うことにより、不溶物を除去することも可能であるが必須ではない。 For post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used. At the time of liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc., solvents not compatible with water such as hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible to add. These solvents may be used alone or in combination of two or more in any proportion. The number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield. It is also possible, but not essential, to remove insolubles by carrying out a filtration operation.
 前記で得られた式(6e)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 Although the reaction mixture containing the compound represented by Formula (6e) obtained above can remove moisture with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
 前記で得られた式(6e)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (6e) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
 溶媒留去後に得られた式(6e)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (6e) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like using an appropriate solvent. It may be appropriately set according to the target purity.
[製造方法L]
Figure JPOXMLDOC01-appb-C000101
[Manufacturing method L]
Figure JPOXMLDOC01-appb-C000101
 式中、U2はハロゲン原子を表し、HalR、R1、R2、XおよびYは前記と同義である。 In the formula, U2 represents a halogen atom, and HalR, R1, R2, X and Y are as defined above.
 製造方法Lは、U2がハロゲン原子である式(6f)で表される化合物を得る方法であって、ラジカル開始剤とハロゲン化剤(HalR)を用いて式(6-1)で表される化合物を反応させることを含む製造方法である。 Production method L is a method for obtaining a compound represented by the formula (6f) in which U 2 is a halogen atom, and represented by the formula (6-1) using a radical initiator and a halogenating agent (HalR) A method of production comprising reacting a compound.
 式(6f)中、好ましいU2は、塩素原子、臭素原子、またはヨウ素原子である。 In formula (6f), preferred U2 is a chlorine atom, a bromine atom or an iodine atom.
 本反応に使用するラジカル開始剤は、アゾビスイソブチロニトリル、過酸化ベンゾイル等が挙げられる。 Examples of the radical initiator used in this reaction include azobisisobutyronitrile, benzoyl peroxide and the like.
 本反応に使用するラジカル開始剤の量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(6-1)で表される化合物に対して0.01当量以上1.0当量以下である。 The amount of the radical initiator used for this reaction is not particularly limited as long as the target reaction proceeds, but generally 0.01 equivalent to the compound represented by the formula (6-1) More than 1.0 equivalent.
 本反応に使用するハロゲン化剤は、N-クロロスクシンイミド、N-ブロモスクシンイミド、N-ヨードスクシンイミド、1,3-ジクロロ-5,5-ジメチルヒダントイン、1,3-ジブロモ-5,5-ジメチルヒダントイン、1,3-ジヨード-5,5-ジメチルヒダントイン等が挙げられる。 The halogenating agent used in this reaction is N-chlorosuccinimide, N-bromosuccinimide, N-iodosuccinimide, 1,3-dichloro-5,5-dimethylhydantoin, 1,3-dibromo-5,5-dimethylhydantoin And 1,3-diiodo-5,5-dimethylhydantoin.
 本反応に使用するハロゲン化剤の量は、式(6-1)で表される化合物に対して2当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、2当量以上2.8当量以下である。 The amount of the halogenating agent used in this reaction is not particularly limited as long as the target reaction proceeds, provided that the amount is 2 equivalents or more with respect to the compound represented by formula (6-1). Usually, it is 2 equivalents or more and 2.8 equivalents or less.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、クロロベンゼン、ジクロロベンゼン等のハロゲン化ベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used for this reaction is not particularly limited as long as the target reaction proceeds, but halogenated benzene solvents such as chlorobenzene and dichlorobenzene, and esters such as ethyl acetate, isopropyl acetate and butyl acetate Examples thereof include solvents, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. These solvents may be used alone or in combination of two or more in any proportion.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(6-1)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 times by weight or more and 200 times by weight the compound represented by the formula (6-1) It is below.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、20℃以上150℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually 20 ° C. or more and 150 ° C. or less or the boiling point or less of the solvent.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 For post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used. At the time of liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Adding a solvent which is not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane and chloroform, and hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible. In addition, these solvents can be used alone or in combination of two or more in any proportion. The number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield.
 前記で得られた式(6f)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 Although the reaction mixture containing the compound represented by Formula (6f) obtained above can remove water with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
 前記で得られた式(6f)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (6f) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
 溶媒留去後に得られた式(6f)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (6f) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like using an appropriate solvent. It may be appropriately set according to the target purity.
[製造方法M]
Figure JPOXMLDOC01-appb-C000102
[Manufacturing method M]
Figure JPOXMLDOC01-appb-C000102
 式中、R1、R2、X、YおよびU2は前記と同義である。 In the formula, R 1, R 2, X, Y and U 2 are as defined above.
 製造方法Mは、本発明化合物の製造中間体である式(6g)で表される化合物を得る方法であって、水存在下、式(6f)で表される化合物を加水分解することを含む製造方法である。 Production method M is a method for obtaining a compound represented by the formula (6 g) which is a production intermediate of the compound of the present invention, which comprises hydrolyzing a compound represented by the formula (6 f) in the presence of water It is a manufacturing method.
 式(6f)中、好ましいU2は、塩素原子、臭素原子、またはヨウ素原子である。 In formula (6f), preferred U2 is a chlorine atom, a bromine atom or an iodine atom.
 本反応には、水が必須である。また、本反応を円滑に進行させるために、硝酸銀を使用することができる。 Water is essential for this reaction. In addition, silver nitrate can be used to facilitate the present reaction.
 本反応に使用する水の量は、式(6f)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて限定されることはない。また、水は溶媒として使用することができる。 The amount of water used in this reaction is not limited as long as the target reaction proceeds, as long as it is at least 1 equivalent to the compound represented by formula (6f). Water can also be used as a solvent.
 本反応に使用する硝酸銀の量は、式(6f)で表される化合物に対して2当量以上あれば、目的とする反応が進行する限りにおいて限定されることはなく、通常、2当量以上10当量以下である。 The amount of silver nitrate used in this reaction is not limited as long as the target reaction proceeds, provided that the amount is 2 equivalents or more with respect to the compound represented by formula (6f), and usually 2 equivalents or more. It is less than equivalent weight.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、水溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、アセトニトリル等のニトリル系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but water solvents, diethyl ether, diisopropyl ether, methyl-t-butyl ether, ethers such as dimethoxyethane, tetrahydrofuran, dioxane, etc. A system solvent, nitrile system solvents, such as acetonitrile, etc. are mentioned. These solvents may be used alone or in combination of two or more in any proportion.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(6f)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 to 200 times by weight the amount of the compound represented by formula (6f) is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、-10℃以上100℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually −10 ° C. or more and 100 ° C. or less or the boiling point or less of the solvent.
 反応の後処理としては、溶解していない金属類を濾過することにより除去することが可能である。さらに、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As post-treatment of the reaction, it is possible to remove undissolved metals by filtration. Furthermore, it is possible to carry out a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used. At the time of liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc., solvents not compatible with water such as hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible to add. In addition, these solvents can be used alone or in combination of two or more in any proportion. The number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield.
 前記で得られた式(6g)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 Although the reaction mixture containing the compound represented by Formula (6g) obtained above can remove water with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
 前記で得られた式(6g)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (6 g) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
 溶媒留去後に得られた式(6g)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (6 g) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like using an appropriate solvent. It may be appropriately set according to the target purity.
[製造方法N]
Figure JPOXMLDOC01-appb-C000103
[Manufacturing method N]
Figure JPOXMLDOC01-appb-C000103
 式中、R1、R2、X、Y、およびZは前記と同義である。 In the formulae, R 1, R 2, X, Y and Z are as defined above.
 製造方法Nは、式(1)で表される化合物のうち、式(1a)で表される化合物を得る方法であって、式(6g)で表される化合物と有機金属試薬とを、溶媒中で反応させることを含む製造方法である。 Production method N is a method of obtaining the compound represented by formula (1a) among the compounds represented by formula (1), which comprises a compound represented by formula (6 g) and an organometallic reagent in a solvent It is a manufacturing method including making it react in the inside.
 本反応に使用する有機金属試薬としては、有機マグネシウムハロゲン化物(Z-Mg-Hal:ここで、Halはハロゲン原子を表し、Zは前記と同義である。)、有機リチウム試薬(Z-Li:ここで、Zは前記と同義である。)、有機マグネシウムハロゲン化物-亜鉛(II)アート錯体試薬([(Z)-Zn][Mg-Hal][Mg‐(Hal):ここで、ZおよびHalは前記と同義である。)等が挙げられる。これらの有機金属試薬は、市販品として入手または公知の方法で製造することができる。 As an organic metal reagent used for this reaction, an organomagnesium halide (Z-Mg-Hal: where Hal represents a halogen atom and Z is as defined above), an organolithium reagent (Z-Li: Here, Z is as defined above), organomagnesium halide-zinc (II) ate complex reagent ([(Z) 3 -Zn] - [Mg-Hal] + [Mg- (Hal) 2 ] 2 : Here, Z and Hal are as defined above, and the like. These organometallic reagents can be obtained as commercially available products or can be produced by known methods.
 本反応に使用する有機金属試薬の量は、式(6g)で表される式に対して、1当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、1当量以上10当量以下である。 The amount of the organic metal reagent to be used in this reaction may be 1 equivalent or more with respect to the formula (6 g), and is not particularly limited as long as the target reaction proceeds. Usually, it is 1 equivalent or more and 10 equivalents or less.
 反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used for the reaction is not particularly limited as long as the target reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc., hexane And hydrocarbon solvents such as heptane, cyclohexane and methylcyclohexane. These solvents may be used alone or in combination of two or more in any proportion.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(6g)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 to 200 times by weight the amount of the compound represented by the formula (6 g) is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、-80℃以上100℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually −80 ° C. or more and 100 ° C. or less or the boiling point or less of the solvent.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 For post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used. At the time of liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Adding a solvent which is not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane and chloroform, and hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible. In addition, these solvents can be used alone or in combination of two or more in any proportion. The number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield.
 前記で得られた式(1a)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 Although the reaction mixture containing the compound represented by Formula (1a) obtained above can remove water with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
 前記で得られた式(1a)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (1a) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
 溶媒留去後に得られた式(1a)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (1a) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like using an appropriate solvent. It may be appropriately set according to the target purity.
[製造方法O]
Figure JPOXMLDOC01-appb-C000104
[Manufacturing method O]
Figure JPOXMLDOC01-appb-C000104
 式中、R1、R2、R8a、X、YおよびZは前記と同義である。 In the formula, R 1, R 2, R 8 a, X, Y and Z are as defined above.
 製造方法Oは、式(1)で表される化合物のうち、式(1b)で表される化合物を得る方法であって、式(1a)で表される化合物とオルトエステル類とを、酸存在下、溶媒中で反応させることを含む製造方法である。 Production method O is a method for obtaining a compound represented by formula (1b) among compounds represented by formula (1), wherein the compound represented by formula (1a) and an ortho ester are A method of production comprising reacting in the presence of a solvent.
 本反応に使用するオルトエステル類は、オルト蟻酸エステル類が好ましく、市販品として入手または公知の方法で製造することができる。 The orthoesters used in this reaction are preferably orthoformates, and can be obtained as commercially available products or can be produced by known methods.
 本反応に使用するオルトエステル類の量は、式(1a)で表される化合物に対して1当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、1当量以上10当量以下である。 The amount of ortho esters used in this reaction may be at least 1 equivalent with respect to the compound represented by formula (1a), and is not particularly limited as long as the target reaction proceeds, 1 equivalent or more and 10 equivalents or less.
 本反応を円滑に進行させるために、R8aOH(R8aは前記と同義である。)で表されるアルコールを添加することが可能であり、また、溶媒としても使用することが可能である。 In order to allow the reaction to proceed smoothly, the alcohol represented by R8aOH (R8a is as defined above) can be added, and can also be used as a solvent.
 本反応に使用するR8aOH(R8aは前記と同義である。)で表されるアルコール使用量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(1a)で表される化合物に対して50当量以下であり必須ではない。 The amount of alcohol used represented by R8aOH (R8a is as defined above) used in this reaction is not particularly limited as long as the target reaction proceeds, but in general, it is represented by the formula (1a) It is 50 or less equivalent with respect to the compound represented, and is not essential.
 本反応に使用する酸として、塩酸、硫酸等の無機酸類や、トリフルオロ酢酸、メタンスルホン酸、p-トルエンスルホン酸、トリフルオロメタンスルホン酸等の有機酸類が挙げられる。 Examples of the acid used in this reaction include inorganic acids such as hydrochloric acid and sulfuric acid, and organic acids such as trifluoroacetic acid, methanesulfonic acid, p-toluenesulfonic acid and trifluoromethanesulfonic acid.
 本反応に使用する酸の量は、式(1a)で表される化合物に対して0.01当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、0.01当量以上20当量以下である。 The amount of the acid used in this reaction is not particularly limited as long as the target reaction proceeds, provided that it is 0.01 equivalent or more with respect to the compound represented by formula (1a). 0.01 equivalent or more and 20 equivalents or less.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、R8aOH(R8aは前記と同義である。)で表されるアルコール系溶媒、ニトロメタン、ニトロベンゼン等のニトロ系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used for this reaction is not particularly limited as long as the target reaction proceeds, but the alcohol solvents represented by R8aOH (R8a has the same meaning as described above), such as nitromethane and nitrobenzene Examples thereof include nitro solvents, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. These solvents may be used alone or in combination of two or more in any proportion.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(1a)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 to 200 times by weight the amount of the compound represented by Formula (1a). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、-30℃以上100℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually −30 ° C. or more and 100 ° C. or less or the boiling point or less of the solvent.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 For post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used. At the time of liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc., solvents not compatible with water such as hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible to add. These solvents may be used alone or in combination of two or more in any proportion. The number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield.
 前記で得られた式(1b)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 Although the reaction mixture containing the compound represented by Formula (1b) obtained above can remove water with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
 前記で得られた式(1b)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (1b) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
 溶媒留去後に得られた式(1b)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (1b) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like using an appropriate solvent. It may be appropriately set according to the target purity.
[製造方法P]
Figure JPOXMLDOC01-appb-C000105
[Manufacturing method P]
Figure JPOXMLDOC01-appb-C000105
 式中、R1、R2、X、YおよびZは前記と同義である。 In the formulae, R 1, R 2, X, Y and Z are as defined above.
 製造方法Pは、式(1)で表される化合物のうち、式(1c)で表される化合物を得る方法であって、式(1a)で表される化合物とフッ素化剤(FR)とを、溶媒中で反応させることを含む製造方法である。 Production method P is a method for obtaining the compound represented by formula (1c) among the compounds represented by formula (1), and the compound represented by formula (1a) and the fluorinating agent (FR) Is reacted in a solvent.
 本反応に使用するフッ素化剤として、(ジエチルアミノ)サルファートリフルオリド、ビス(2-メトキシエチル)アミノサルファートリフルオリド、N,N-ジエチル-1,1,2,3,3,3-ヘキサフルオロプロピルアミン、2,2-ジフルオロ-1,3-ジメチルイミダゾリジン等が挙げられる。 (Diethylamino) sulfur trifluoride, bis (2-methoxyethyl) aminosulfur trifluoride, N, N-diethyl-1,1,2,3,3,3-hexafluoropropyl as a fluorinating agent used in this reaction Amines, 2,2-difluoro-1,3-dimethylimidazolidine and the like can be mentioned.
 本反応に使用するフッ素化剤の量は、式(1a)で表される化合物に対して1当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、1当量以上10当量以下である。 The amount of the fluorinating agent used in this reaction may be 1 equivalent or more with respect to the compound represented by formula (1a), and is not particularly limited as long as the target reaction proceeds, 1 equivalent or more and 10 equivalents or less.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、アセトニトリル等のニトリル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used for this reaction is not particularly limited as long as the target reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc. Benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, nitrile solvents such as acetonitrile, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, hexane, heptane, cyclohexane, methylcyclohexane etc Hydrocarbon solvents and the like can be mentioned. These solvents may be used alone or in combination of two or more in any proportion.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(1a)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 to 200 times by weight the amount of the compound represented by Formula (1a). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、-80℃以上100℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually −80 ° C. or more and 100 ° C. or less or the boiling point or less of the solvent.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 For post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used. At the time of liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc., solvents not compatible with water such as hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible to add. These solvents may be used alone or in combination of two or more in any proportion. The number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield.
 前記で得られた式(1c)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 Although the reaction mixture containing the compound represented by Formula (1c) obtained above can remove water with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
 前記で得られた式(1c)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (1c) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
 溶媒留去後に得られた式(1c)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (1c) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like using an appropriate solvent. It may be appropriately set according to the target purity.
[製造方法Q]
Figure JPOXMLDOC01-appb-C000106
[Manufacturing method Q]
Figure JPOXMLDOC01-appb-C000106
 式中、R1、R2、X、YおよびZは前記と同義である。 In the formulae, R 1, R 2, X, Y and Z are as defined above.
 製造方法Qは、式(1)で表される化合物のうち、式(1d)で表される化合物を得る方法であって、式(1a)で表される化合物と還元剤とを、酸存在下、溶媒中で反応させることを含む製造方法である。 The production method Q is a method for obtaining the compound represented by the formula (1 d) among the compounds represented by the formula (1), wherein the compound represented by the formula (1 a) and the reducing agent Below, it is a manufacturing method including making it react in a solvent.
 本反応に使用する還元剤として、トリエチルシラン、水素化ホウ素ナトリウム等が挙げられる。 As a reducing agent used for this reaction, triethylsilane, sodium borohydride and the like can be mentioned.
 本反応に使用する還元剤の量は、式(1a)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはなく、通常、1当量以上20当量以下である。 The amount of the reducing agent used in this reaction is not particularly limited as long as the target reaction proceeds, as long as the amount of the reducing agent used is 1 equivalent or more with respect to the compound represented by formula (1a). More than 20 equivalents or less.
 本反応に使用する酸は、トリフルオロ酢酸、三フッ化ホウ素ジエチルエーテル錯体、トリフルオロメタンスルホン酸、トリフルオロメタンスルホン酸トリメチルシリル、塩化アルミニウム等が挙げられる。 Examples of the acid used in this reaction include trifluoroacetic acid, boron trifluoride diethyl ether complex, trifluoromethanesulfonic acid, trimethylsilyl trifluoromethanesulfonate, aluminum chloride and the like.
 本反応に使用する酸の量は、式(1a)で表される化合物に対して1当量以上あればよく、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、1当量以上50当量以下である。また、酸が溶液の場合、溶媒として使用することが可能である。 The amount of the acid used in this reaction may be at least 1 equivalent with respect to the compound represented by formula (1a), and is not particularly limited as long as the target reaction proceeds, but usually 1 It is equal to or more than 50 equivalents. When the acid is a solution, it can be used as a solvent.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、トリフルオロ酢酸等の酸性系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used for this reaction is not particularly limited as long as the target reaction proceeds, but an acidic solvent such as trifluoroacetic acid, a halogen based solvent such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, etc. Ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane and the like can be mentioned. These solvents may be used alone or in combination of two or more in any proportion.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(1a)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 to 200 times by weight the amount of the compound represented by Formula (1a). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、-10℃以上150℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually −10 ° C. or more and 150 ° C. or less or the boiling point or less of the solvent.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 For post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used. At the time of liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Adding a solvent which is not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane and chloroform, and hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible. In addition, these solvents can be used alone or in combination of two or more in any proportion. The number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield.
 前記で得られた式(1d)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 Although the reaction mixture containing the compound represented by Formula (1d) obtained above can remove water with desiccants, such as sodium sulfate and magnesium sulfate, it is not essential.
 前記で得られた式(1d)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (1d) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
 溶媒留去後に得られた式(1d)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (1d) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like using an appropriate solvent. It may be appropriately set according to the target purity.
[製造方法R]
Figure JPOXMLDOC01-appb-C000107
[Manufacturing method R]
Figure JPOXMLDOC01-appb-C000107
 式中、HalR、R1、R2、X、YおよびU2は前記と同義である。 In the formula, Hal R, R 1, R 2, X, Y and U 2 are as defined above.
 製造方法Lは、U2がハロゲン原子である式(6h)で表される化合物を得る方法であって、ラジカル開始剤とハロゲン化剤(HalR)を用いて式(6-1)で表される化合物を反応させることを含む製造方法である。 Production method L is a method for obtaining a compound represented by the formula (6h) in which U2 is a halogen atom, and represented by the formula (6-1) using a radical initiator and a halogenating agent (HalR) A method of production comprising reacting a compound.
 式(6h)中、好ましいU2は、塩素原子、臭素原子、またはヨウ素原子である。 In formula (6h), preferred U2 is a chlorine atom, a bromine atom or an iodine atom.
 本反応に使用するハロゲン化剤の量は、式(6-1)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、1当量以上1.5当量以下である。 The amount of the halogenating agent used in this reaction is not particularly limited as long as the target reaction proceeds, provided that the amount is 1 equivalent or more with respect to the compound represented by formula (6-1). Usually, it is 1 equivalent or more and 1.5 equivalents or less.
 製造方法Lにおけるハロゲン化剤の量を前記の通りに変更することにより、製法方法Lに準じて製造方法Rを実施することができる。 Production method R can be carried out according to production method L by changing the amount of the halogenating agent in production method L as described above.
[製造方法S]
Figure JPOXMLDOC01-appb-C000108
[Manufacturing method S]
Figure JPOXMLDOC01-appb-C000108
 式中、G32、G33、G34、およびG35は、それぞれ独立していて、炭素原子または窒素原子を表し、nmは0~4の整数(nmが2以上の場合、2置換以上のR4は、それぞれ独立した置換基を表し、同一またはことなってよく、任意に選択することができる。)を表し、R1、R2、R4、X、YおよびU2は前記と同義である。 In the formula, G32, G33, G34, and G35 are each independently a carbon atom or a nitrogen atom, nm is an integer of 0 to 4 (in the case where nm is 2 or more, R4 of 2 or more substitution is each R 1 represents an independent substituent, which may be the same or different and may be optionally selected), and R 1, R 2, R 4, X, Y and U 2 are as defined above.
 製造方法Sは、式(1e)で表される化合物を得る方法であって、式(6h)で表される化合物と式(7)で表される化合物とを、塩基存在下、溶媒中で反応させることを含む製造方法である。 Production method S is a method of obtaining a compound represented by the formula (1e), which comprises the compound represented by the formula (6h) and the compound represented by the formula (7) in a solvent in the presence of a base It is a manufacturing method including making it react.
 式(6h)中、好ましいU2は、塩素原子、臭素原子、またはヨウ素原子である。 In formula (6h), preferred U2 is a chlorine atom, a bromine atom or an iodine atom.
 本反応に使用する式(7)で表される化合物は、市販品として入手または公知の方法で製造できる。 The compound represented by Formula (7) used for this reaction can be obtained as a commercial item, or can be manufactured by a well-known method.
 本反応に使用する式(7)で表される化合物が、塩酸や硫酸等の酸性物質との塩を形成している場合、公知の方法により脱塩してから該アミン類を使用することができる。また、塩を形成している酸性物質に対して1当量以上の塩基を添加することにより、該アミン塩をそのまま本反応に使用することも可能である。 When the compound represented by the formula (7) used in the present reaction forms a salt with an acidic substance such as hydrochloric acid or sulfuric acid, the amine may be used after desalting by a known method it can. In addition, the amine salt can be used as it is in the present reaction by adding one or more equivalents of a base to the acidic substance forming a salt.
 本反応に使用する式(7)で表される化合物の量は、式(6h)で表される化合物に対して1当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、1当量以上10当量以下である。 The amount of the compound represented by the formula (7) used in this reaction may be at least 1 equivalent or more with respect to the compound represented by the formula (6h), and is particularly limited as long as the target reaction proceeds. Although it does not happen, it is usually 1 equivalent or more and 10 equivalents or less.
 本反応に使用する塩基として、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、水素化ナトリウム等の無機塩基類や、トリエチルアミン、トリブチルアミン、ジイソプロピルエチルアミン、ピリジン、4-ジメチルアミノピリジン、コリジン、ルチジン等の有機塩基類が例示されるが、目的とする反応が進行する限りにおいて特に限定されることはない。 Inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate and sodium hydride, and organic bases such as triethylamine, tributylamine, diisopropylethylamine, pyridine, 4-dimethylaminopyridine, collidine, lutidine etc. as the base used in this reaction Although the class is illustrated, it is not particularly limited as long as the target reaction proceeds.
 本反応に使用する塩基の量は、式(6h)で表される化合物に対して1当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、1当量以上20当量以下である。また、酸性物質と塩を形成した式(7)で表される化合物を使用する場合には、好ましい量は、通常、2当量以上20当量以下である。 The amount of the base used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (6h), and is not particularly limited as long as the target reaction proceeds, but usually 1 It is equal to or more than 20 equivalents. Moreover, when using the compound represented by Formula (7) which formed the salt with an acidic substance, preferable amount is 2 to 20 equivalent normally.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ジメチルスルホキシド、スルホラン等の硫黄系溶媒、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used for this reaction is not particularly limited as long as the target reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc. Alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, Amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloroethane, Chloroform, halogenated solvents such as carbon tetrachloride, dimethyl sulfoxide, sulfur-based solvents such as sulfolane, acetone, methyl ethyl ketone, ketone solvents such as methyl isobutyl ketone. These solvents may be used alone or in combination of two or more in any proportion.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(6h)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but generally, it is 3 to 200 times by weight the amount of the compound represented by formula (6h) is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、0℃以上150℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but it is usually 0 ° C. or more and 150 ° C. or less or the boiling point or less of the solvent.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。また、濾過操作を行うことにより、不溶物を除去することも可能であるが必須ではない。 For post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium hydrogencarbonate or the like is dissolved, thiosulfuric acid An aqueous solution or a saline solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be optionally used. At the time of liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc., solvents not compatible with water such as hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane It is possible to add. In addition, these solvents can be used alone or in combination of two or more in any proportion. The number of times of liquid separation is not particularly limited, and the separation can be carried out according to the desired purity and yield. It is also possible, but not essential, to remove insolubles by carrying out a filtration operation.
 前記で得られた式(1e)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 Although the reaction mixture containing the compound represented by Formula (1e) obtained above can remove water with a desiccant such as sodium sulfate or magnesium sulfate, it is not essential.
 前記で得られた式(1e)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (1e) obtained above can be distilled off under reduced pressure as long as the compound does not decompose.
 溶媒留去後に得られた式(1e)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (1e) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like using an appropriate solvent. It may be appropriately set according to the target purity.
 以上に示した、製造方法A~製造方法Sを任意に組み合わせて、式(1)で表される化合物を製造することができる。もしくは、公知の方法と製造方法A~製造方法Sを任意に組み合わせても、式(1)で表される化合物を製造することができる。 The compounds represented by the formula (1) can be produced by arbitrarily combining the production methods A to S shown above. Alternatively, the compound represented by the formula (1) can be produced by any combination of known methods and production methods A to S.
 本発明化合物は、植物に対して有害な生物を防除できるために、農薬として使用することができる。具体的には、殺菌剤、殺虫剤、除草剤、植物成長調整剤等が挙げられる。好ましくは、殺菌剤である。 The compounds of the present invention can be used as pesticides because they can control organisms harmful to plants. Specifically, fungicides, insecticides, herbicides, plant growth regulators and the like can be mentioned. Preferably, it is a microbicide.
 本発明化合物は、植物病害の防除のために、畑地、水田、茶園、果樹園、牧草地、芝生、森林、庭園、街路樹等で農園芸用殺菌剤として使用することができる。 The compounds of the present invention can be used as agricultural and horticultural fungicides in upland fields, paddy fields, tea gardens, orchards, meadows, lawns, forests, gardens, street trees, etc. for controlling plant diseases.
 本発明でいう植物病害とは、農作物、花き、花木、樹木等の植物に萎ちょう、立枯れ、黄化、萎縮、徒長等の全身的な異常な病的症状、または斑点、葉枯れ、モザイク、葉巻、枝枯れ、根腐れ、根こぶ、こぶ等の部分的な病的症状が惹起されることである。即ち、植物が病気になることである。植物病害を引き起こす病原体として、主に、菌類、細菌、スピロプラズマ、ファイトプラズマ、ウイルス、ウイロイド、寄生性高等植物、線虫等が挙げられる。本発明化合物は菌類に有効であるが、これに限定されるものではない。 The plant diseases referred to in the present invention refer to plants with crops such as flowers, flowers, trees and trees, withered, withered, yellowed, atrophied, and general abnormal pathological symptoms such as acupuncture, or spots, withered leaves, mosaics Partial pathological symptoms such as cigars, dead leaves, root rot, root bumps and bumps are caused. That is to say, plants become ill. Pathogens that cause plant diseases mainly include fungi, bacteria, spiroplasmas, phytoplasmas, viruses, viroids, parasitic higher plants, nematodes and the like. The compounds of the present invention are effective against fungi but are not limited thereto.
 菌類によって引き起こされる病害は、主に菌類病である。菌類病を引き起こす菌類(病原体)として、ネコブカビ菌類、卵菌類、接合菌類、子のう菌類、担子菌類および不完全菌類等が挙げられる。例えば、ネコブカビ菌類として、根こぶ病菌、ジャカイモ粉状そうか病菌、テンサイそう根病菌、卵菌類として疫病菌、べと病菌、Pythium属菌、Aphanomyces属菌、接合菌類としてRhizopus属菌、子のう菌類としてモモ縮葉病菌、トウモロコシごま葉枯病菌、イネいもち病菌、うどんこ病菌、炭そ病菌、赤かび病菌、ばか苗病菌、菌核病菌、担子菌類としてさび病菌類、黒穂病菌類、紫紋羽病菌、もち病菌、紋枯病菌、不完全菌類として灰色かび病菌、Alternaria属菌、Fusarium属菌、Penicillium属菌、Rhizoctonia属菌、白絹病菌等が挙げられる。 The diseases caused by fungi are mainly fungal diseases. Fungi (fungi) which cause fungal diseases include Neisseria gonorrhoeae, oomycetes, zygomycetes, ascomycetes, basidiomycetes and imperfect fungi. For example, root-knot fungus, root-knot disease powdery mildew fungus, sugar beet root-knot disease fungus, as egg fungus, downy mildew fungus, Pythium spp., Aphanomyces spp., Rhizopus spp. Phytophthora infestans, corn leaf blight fungus, rice blast fungus, powdery mildew, powdery mildew, anthracnose fungus, scab fungus, scab fungus, scab fungus, scab fungus, rust basidiomycetes as basidiomycetes, scab fungus, purple crest Examples include downy mildew, blast fungus, sheath blight fungus, gray mold fungus as incomplete fungus, Alternaria sp., Alternaria sp., Fusarium sp., Penicillium sp., Rhizoctonia sp.
 本発明化合物は、各種の植物病害に対して有効である。以下に、病害名およびその病原菌名の具体例を示す。 The compounds of the present invention are effective against various plant diseases. Below, the specific example of a disease name and its pathogen name is shown.
 イネのいもち病(Magnaporthe grisea)、紋枯病(Thanatephorus cucumeris)、褐色菌核病(Ceratobasidium setariae)、褐色小粒菌核病(Waitea circinata)、褐色紋枯病(Thanatephorus cucumeris)、球状菌核病(Sclerotium hydrophilum)、赤色菌核病(Wairea circinata)、黒しゅ病(Entyloma dactylidis)、小球菌核病(Magnaporthe salvinii)、灰色菌核病(Ceratobasidium cornigerum)、ごま葉枯病(Cochliobolus miyabeanus)、条葉枯病(Sphaerulina oryzina)、ばか苗病(Gibberella fujikuroi)、苗立枯病(Pythium spp.、Fusarium spp.、Trichoderma spp.、Rhizopus spp.、Rhizoctonia solani、Mucor sp.、Phoma sp.)、苗腐病(Pythium spp.、Achlya spp.、Dictyuchus spp.)、稲こうじ病(Claviceps virens)、墨黒穂病(Tilletia barclayana)、褐色米(Curvularia spp.、Alternaria spp.)、黄化萎縮病(Sclerophthora macrospora)、白葉枯病(Xanthomonas oryzae pv. oryzae)、褐条病(Acidovorax avenae subsp. avenae)、内頴褐変病(Erwinia ananas)、苗立枯細菌病(Burkholderia plantarii)、もみ枯細菌病(Burkholderia glumae)、葉鞘褐変病(Pseudomonas fuscovaginae)、かさ枯病(Pseudomonas syringae pv.oryzae)、株腐病(Erwinia chrysanthemi)、黄萎病(Phytoplasma oryzae)、縞葉枯病(Rice stripe tenuivirus)、萎縮病(Rice dwarf reovirus);
ムギ類のうどんこ病(Blumeria graminis f.sp.hordei; f.sp.tritici)、さび病(Puccinia striiformis、 Puccinia graminis、Puccinia recondita、Puccinia hordei)、斑葉病(Pyrenophora graminea)、網斑病(Pyrenophora teres)、赤かび病(Gibberella zeae、Fusarium culmorum、Fusarium avenaceum、Monographella nivalis)、雪腐病(Typhula incarnata、Typhula ishikariensis、Monographella nivalis)、裸黒穂病(Ustilago nuda)、なまぐさ黒穂病(Tilletia caries、Tilletia controversa)、眼紋病(Pseudocercosporella herpotrichoides)、株腐病(Ceratobasidium gramineum)、雲形病(Rhynchosporium secalis)、葉枯病(Septoria tritici)、ふ枯病(Phaeosphaeria nodorum)、苗立枯病(Fusarium spp.、Pythium spp.、Rhizoctonia spp.、Septoria spp.、Pyrenophora spp.)、立枯病(Gaeumannomyces graminis)、炭疽病(Colletotrichum graminicola)、麦角病(Claviceps purpurea)、斑点病(Cochliobolus sativus)、黒節病(Pseudomonas syringae pv. syringae);
トウモロコシの赤かび病(Gibberella zeae等)、苗立枯病(Fusarium avenaceum、Penicillium spp.、Pythium spp.、Rhizoctonia spp.)、さび病(Puccinia sorghi)、ごま葉枯病(Cochliobolus heterostrophus)、黒穂病(Ustilago maydis)、炭疽病(Colletotrichum graminicola)、北方斑点病(Cochliobolus carbonum)、褐条病(Acidovorax avenae subsp. avenae)、条斑細菌病(Burkholderia andropogonis)、倒伏細菌病(Erwinia chrysanthemi pv. zeae)、萎ちょう細菌病(Erwinia stewartii);ブドウのべと病(Plasmopara viticola)、さび病(Physopella ampelopsidis)、うどんこ病(Uncinula necator)、黒とう病(Elsinoe ampelina)、晩腐病(Glomerella cingulata、Colletotrichum acutatum)、黒腐病(Guignardia bidwellii)、つる割病(Phomopsis viticola)、すす点病(Zygophiala jamaicensis)、灰色かび病(Botrytis cinerea)、芽枯病(Diaporthe medusaea)、紫紋羽病(Helicobasidium mompa)、白紋羽病(Rosellinia necatrix)、根頭がんしゅ病(Agrobacterium vitis);リンゴのうどんこ病(Podosphaera leucotricha)、黒星病(Venturia inaequalis)、斑点落葉病(Alternaria mali)、赤星病(Gymnosporangium yamadae)、モニリア病(Monilinia mali)、腐らん病(Valsa ceratosperma)、輪紋病(Botryosphaeria berengeriana)、炭疽病(Colletotrichum acutatum、Glomerella cingulata)、すす点病(Zygophiala jamaicensis)、すす斑病(Gloeodes pomigena)、黒点病(Mycosphaerella pomi)、紫紋羽病(Helicobasidium mompa)、白紋羽病(Rosellinia necatrix)、胴枯病(Phomopsis mali、Diaporthe tanakae)、褐斑病(Diplocarpon mali)、リンゴの火傷病(Erwinia amylovora)、根頭がんしゅ病(Agrobacterium tumefaciens)、毛根病(Agrobacterium rhizogenes);
ナシの黒斑病(Alternaria kikuchiana)、黒星病(Venturia nashicola)、赤星病(Gymnosporangium asiaticum)、輪紋病(Botryosphaeria berengeriana f.sp. piricola)、胴枯病(Phomopsis fukushii)、枝枯細菌病(Erwinia sp.)、根頭がんしゅ病(Agrobacterium tumefaciens)、さび色胴枯病(Erwinia chrysanthemi pv. chrysanthemi)、花腐細菌病(Pseudomonas syringae pv. syringae);セイヨウナシの疫病(Phytophthora cactorum、Phytophthora syringae)、枝枯細菌病(Erwinia sp.);モモの黒星病(Cladosporium carpophilum)、ホモプシス腐敗病(Phomopsis sp.)、疫病(Phytophthora sp.)、炭疽病(Colletotrichum gloeosporioides)、縮葉病(Taphrina deformans)、穿孔細菌病(Xhanthomonas campestris pv. pruni)、根頭がんしゅ病(Agrobacterium tumefaciens);オウトウの炭疽病(Glomerella cingulata)、幼果菌核病(Monilinia kusanoi)、灰星病(Monilinia fructicola)、根頭がんしゅ病(Agrobacterium tumefaciens)、樹脂細菌病(Pseudomonas syringae pv. syringae);カキの炭疽病(Glomerella cingulata)、落葉病(Cercospora kaki; Mycosphaerella nawae)、うどんこ病(Phyllactinia kakikora)、根頭がんしゅ病(Agrobacterium tumefaciens);カンキツの黒点病(Diaporthe citri)、緑かび病(Penicillium digitatum)、青かび病(Penicillium italicum)、そうか病(Elsinoe fawcettii)、褐色腐敗病(Phytophthora citrophthora)、かいよう病(Xhanthomonas campestris pv. citri)、褐斑細菌病(Pseudomonas syringae pv. syringae)、グリーニング病(Liberibactor asiaticus)、根頭がんしゅ病(Agrobacterium tumefaciens);
トマト、キュウリ、豆類、イチゴ、ジャガイモ、キャベツ、ナス、レタス等の灰色かび病(Botrytis cinerea);トマト、キュウリ、豆類、イチゴ、ジャガイモ、ナタネ、キャベツ、ナス、レタス等の菌核病(Sclerotinia sclerotiorum);トマト、キュウリ、豆類、ダイコン、スイカ、ナス、ナタネ、ピーマン、ホウレンソウ、テンサイ等各種野菜の苗立枯病(Rhizoctonia spp.、Pythium spp.、Fusarium spp.、Phythophthora spp.、Sclerotinia sclerotiorum等);ナス科植物の青枯病(Ralstonia solanacearum);ウリ類のべと病(Pseudoperonospora cubensis)、うどんこ病(Sphaerotheca fuliginea)、炭疽病(Colletotrichum orbiculare)、つる枯病(Didymella bryoniae)、つる割病(Fusarium oxysporum)、疫病(Phytophthora parasitica、Phytophthora melonis、Phytophthora nicotianae、Phytophthora drechsleri、Phytophthora capsici等)、褐斑細菌病(Xhanthomonas campestris pv.cucurbitae)、軟腐病(Erwinia carotovora subsp. carotovora)、斑点細菌病(Pseudomonas syringae pv. lachrymans)、縁枯細菌病(Pseudomonas marginalis pv. marginalis)、がんしゅ病(Streptomyces sp.)、毛根病(Agrobacterium rhizogenes)、キュウリモザイクウィルス(Cucumber mosaic virus);
トマトの輪紋病(Alternaria solani)、葉かび病(Fulvia fulva)、疫病(Phytophthora infestans)、萎凋病(Fusarium oxysporum)、根腐病(Pythium myriotylum、Pythium dissotocum)、炭疽病(Colletotrichum gloeosporioides)、かいよう病(Clavibacter michiganensis)、茎えそ細菌病(Pseudomonas corrugata)、黒斑細菌病(Pseudomonas viridiflava)、軟腐病(Erwinia carotovora subsp. carotovora)、葉こぶ病(Crynebacterium sp.)、萎黄病(Phytoplasma asteris)、黄化萎縮病(Tobacco leaf curl subgroup III geminivirus);ナスのうどんこ病(Sphaerotheca fuliginea等)、すすかび病(Mycovellosiella nattrassii)、疫病(Phytophthora infestans)、褐色腐敗病(Phytophthora capsici)、褐斑細菌病(Pseudomonas cichorii)、茎えそ細菌病(Pseudomonas corrugata)、茎腐細菌病(Erwinia chrysanthemi)、軟腐病(Erwinia carotovora subsp. carotovora)、斑点細菌病(Pseudomonas sp.);ナタネの黒斑病(Alternaria brassicae)、黒腐病(Xhanthomonas campestris pv. campestris)、黒斑細菌病(Pseudomonas syringae pv. maculicola)、軟腐病(Erwinia carotovora);アブラナ科野菜の黒斑病(Alternaria brassicae等)、白斑病(Cercosporella brassicae)、根朽病(Phoma lingam)、根こぶ病(Plasmodiophora brassicae)、べと病(Peronospora parasitica)、黒腐病(Xhanthomonas campestris pv. campestris)、黒斑細菌病(Pseudomonas syringae pv. maculicola)、軟腐病(Erwinia carotovora subsp. carotovora);
キャベツの株腐病(Thanatephorus cucumeris)、萎黄病(Fusarium oxysporum)、黒すす病(Alternaria brassisicola);ハクサイの尻腐病(Rhizoctonia solani)、黄化病(Verticillium dahliae);ネギのさび病(Puccinia allii)、黒斑病(Alternaria porri)、白絹病(Sclerotium rolfsii)、白色疫病(Phytophthora porri)、黒腐菌核病(Sclerotium cepivorum);タマネギのかいよう病(Curtobacterium flaccumfaciens)、軟腐病(Erwinia carotovora subsp. carotovora)、斑点細菌病(Pseudomonas syringae pv. syringae)、腐敗病(Erwinia rhapontici)、鱗片腐敗病(Burkholderia gladioli)、萎黄病(Phytoplasma asteris);ニンニクの軟腐病(Erwinia carotovora subsp. carotovora)、春腐病(Pseudomonas marginalis pv.marginalis);ダイズの紫斑病(Cercospora kikuchii)、黒とう病(Elsinoe glycines)、黒点病(Diaporthe phaseolorum)、リゾクトニア根腐病(Rhizoctonia solani)、茎疫病(Phytophthora sojae)、べと病(Peronospora manshurica)、さび病(Phakopsora pachyrhizi)、炭疽病(Colletotrichum truncatum等)、葉焼病(Xhanthomonas campestris pv. glycines)、斑点細菌病(Pseudomonas syringae pv. glycinea);インゲンの炭疽病(Colletotrichum lindemuthianum)、青枯病(Ralstonia solanacearum)、かさ枯病(Pseudomonas syringae pv. phaseolicola)、褐斑細菌病(Pseudomonas viridiflava)、葉焼病(Xhanthomonas campestris pv. phaseoli);
ラッカセイの黒渋病(Mycosphaerella berkeleyi)、褐斑病(Mycosphaerella arachidis)、青枯病(Ralstonia solanacearum);エンドウのうどんこ病(Erysiphe pisi)、べと病(Peronospora pisi)、つる枯細菌病(Pseudomonas syringae pv. pisi)、つる腐細菌病(Xhanthomonas campestris pv. pisi;ソラマメのべと病(Peronospora viciae)、疫病(Phytophthora nicotianae);ジャガイモの夏疫病(Alternaria solani)、黒あざ病(Thanatephorus cucumeris)、疫病(Phytophthora infestans)、銀か病(Helminthosporium solani)、乾腐病(Fusarium oxysporum、Fusarium solani)、粉状そうか病(Spongospora subterranea)、青枯病(Ralstonia solanacearum)、黒あし病(Erwinia carotovora subsp. atroseptica)、そうか病(Streptomyces scabies、Streptomyces acidiscabies)、軟腐病(Erwinia carotovora subsp. carotovora)、粘性腐敗病(Crostridium spp.)、輪腐病(Clavibacter michiganensis subsp.sepedonicus);サツマイモの立枯病(Streptomyces ipomoeae);テンサイの褐斑病(Cercospora beticola)、べと病(Peronospora schachtii)、黒根病(Aphanomyces cochioides)、蛇の目病(Phoma betae)、根頭がんしゅ病(Agrobacterium tumefaciens)、そうか病(Streptomyces scabies)、斑点細菌病(Pseudomonas syringae pv. aptata);
ニンジンの黒葉枯病(Alternaria dauci)、こぶ病(Rhizobacter dauci)、根頭がんしゅ病(Agrobacterium tumefaciens)、ストレプトミセスそうか病(Streptomyces spp.)、軟腐病(Erwinia carotovora subsp. carotovora);イチゴのうどんこ病(Sphaerotheca aphanis var. aphanis)、疫病(Phytophthora nicotianae等)、炭疽病(Glomerella cingulata等)、果実腐敗病(Pythium ultimum)、青枯病(Ralstonia solanacearum)、角斑細菌病(Xhanthomonas campestris)、芽枯細菌病(Pseudomonas marginalis pv. marginalis);チャの網もち病(Exobasidium reticulatum)、白星病(Elsinoe leucospila)、炭疽病(Colletotrichum theae-sinensis)、輪斑病(Pestalotiopsis longiseta)、赤焼病(Pseudomonas syringae pv.theae)、かいよう病(Xhanthomonas campestris pv. theicola)、てんぐ巣病(Pseudomonas sp.);タバコの赤星病(Alternaria alternata)、うどんこ病(Erysiphe cichoracearum)、炭疽病(Colletotrichum gloeosporioides)、疫病(Phytophthora nicotianae)、野火病(Pseudomonas syringae pv.tabaci)、黄がさ細菌病(Pseudomonas syringae pv.mellea)、空洞病(Erwinia carotovora subsp. carotovora)、立枯病(Ralstonia solanacearum)、タバコモザイクウィルス(Tobacco mosaic virus);
コーヒーのさび病(Hemileia vastatrix);バナナの黒シガトガ病(Mycosphaerella fijiensis)、パナマ病(Fusarium oxysporum f.sp cubense);ワタの立枯病(Fusarium oxysporum)、白かび病(Ramularia areola);ヒマワリの菌核病(Sclerotinia sclerotiorum)、角点病(Xhanthomonas campestris pv.malvacearum)、空洞病(Erwinia carotovora subsp. carotovora)、斑点細菌病(Pseudomonas syringae pv.helianthi);バラの黒星病(Diplocarpon rosae)、うどんこ病(Sphaerotheca pannosa等)、疫病(Phytophthora megasperma)、べと病(Peronospora sparsa)、根頭がんしゅ病(Agrobacterium tumefaciens);キクの褐斑病(Septoria obesa)、白さび病(Puccinia horiana)、疫病(Phytophthora cactorum)、斑点細菌病(Pseudomonas cichorii)、軟腐病(Erwinia carotovora subsp. carotovora)、根頭がんしゅ病(Agrobacterium tumefaciens)、毛根病(Agrobacterium rhizogenes)、緑化病(Phytoplasma aurantifolia);芝のブラウンパッチ病(Rhizoctonia solani)、ダラースポット病(Sclerotinia homoeocarpa)、カーブラリア葉枯病(Curvularia sp.)、さび病(Puccinia zoysiae)、ヘルミントスポリウム葉枯病(Cochliobolus sp.)、雲形病(Rhynchosporium secalis)、立枯病(Gaeumannomyces graminis)、炭疽病(Colletotrichum sp.)、雪腐褐色小粒菌核病(Typhula incarnata)、雪腐黒色小粒菌核病(Typhula ishikariensis)、雪腐大粒菌核病(Myriosclerotinia borealis)、フェアリーリング病(Marasmius oreades等)、ピシウム病(Pythium aphanidermatum等)、いもち病(Pyricularia grisea)等が挙げられる。
Rice blast disease (Magnaporthe grisea), sheath blight (Thanatophorus cucumeris), brown blight (Ceratobasidium setariae), brown blight blight (Wateea circinata), brown blight (Thanatephorus cucumeris), scab mildew Sclerotium hydrophilum, red blight (Wairea circinata), black rot (Entyloma dactylidis), micrococcal disease (Magnaporthe salvinii), gray blight (Ceratobasidium cornigerum), sesame leaf blight (Cochliobolus miyabeanus), leaf leaf Blight disease (Sphaerulina oryzina , Scabies (Gibberella fujikuroi), seedling blight (Pythium spp., Fusarium spp., Trichoderma spp., Rhizopus spp., Rhizoctonia solani, Mucor sp., Phoma sp.), Seedling rot (Pythium spp., (Achlya spp., Dictyuchus spp.), Rice scab (Claviceps virens), black scion (Tilletia barclayana), brown rice (Curvularia spp., Alternaria spp.), Yellow dwarf disease (Sclerophthora macrospora), white leaf blight ( Xanthomonas oryzae pv. Oryzae), brown stripe disease (Acidovora) avenae subsp. avenae), internal blanching disease (Erwinia ananas), seedling blight (Burkholderia plantarii), leaf blight (Burkholderia glumae), leaf sheath browning disease (Pseudomonas fuscovaginae), blight blight (Pseudomonas syringae pv. oryzae), stock rot (Erwinia chrysanthemi), yellow dwarf (Phytoplasma oryzae), rice leaf blight (Rice stripe tenuivirus), dwarf (Rice dwarf reovirus);
Powdery mildew of wheat (Blumeria graminis f. Sp. Hordei; f. Sp. Tritici), rust (Puccinia striiformis, Puccinia graminis, Puccinia recondita, Puccinia hordei), macular disease (Pyrenophora graminea), web spot disease Pyrenophora teres), Fusarium head blight (Gibberella zeae, Fusarium culmorum, Fusarium avenaceum, Monographella nivalis), snow blight (Typhula incarnata, Typhula ishikariensis, Monographella nivalis), naked scab (Ustilag) nuda), scallop (Tilletia caries, Tilletia controversa), scab (Pseudocercosporella herpotrichoides), stock rot (Ceratobasidium gramineum), leaf blight (Rhynchosporium secalis), leaf blight (Septoria tritici), Phaeosphaeria nodorum), seedling blight (Fusarium spp., Pythium spp., Rhizoctonia spp., Septoria spp., Pyrenophora spp.), blight (Gaeumannomyces graminis), anthracnose (Colletotrichum graminicola), Ergot disease (Claviceps purpurea), spotted disease (Cochliobolus sativus), black node disease (Pseudomonas syringae pv. Syringae);
Scab of mildew of corn (Gibberella zeae etc.), seedling blight (Fusarium avenaceum, Penicillium spp., Pythium spp., Rhizoctonia spp.), Rust (Puccinia sorghi), leaf blight of sesame (Cochliobolus heterostrophus), scab (Ustilago maydis), anthracnose (Colletotrichum graminicola), northern spot disease (Cochliobolus carbonum), brown streak disease (Acidovorax avenae subsp. Avenae), streak fungus disease (Burkholderia andropogonis), lodging bacterial disease (Erwinia chrysanthemi pv. Zea Bacteriostatic blight (Erwinia stewartii); grape downy mildew (Plasmoparaviticola), rust (Physopella ampelopsidis), powdery mildew (Uncinula necator), black rot (Elsinoe ampelina), late rot (Glomerella cingulata) , Colletotrichum acutatum), black rot (Guignardia bidwellii), spiny mildew (Phomopsis viticola), soot blight (Zygophiala jamaicensis), gray mold (Botrytis cinerea), blast blight (Diaporthe medusaea), purple root rot ( Helicobasidium mompa), white crest Disease (Rosellinia necatrix), root-head cancer disease (Agrobacterium vitis); apple powdery mildew (Podosphaera leucotricha), scab disease (Venturia inaequalis), spotted leaf disease (Alternaria mali), scab disease (Gymnosporangium yamadae), Monilia Disease (Monilinia mali), rot disease (Valsa ceratosperma), ring disease (Botryosphaeria berengeriana), anthracnose (Colletotrichum acutatum, Glomerella cingulata), soot blight disease (Zygophiala jamaicensis), scab disease (Gloeodes pomi) ena), Mycosphaerella pomi, Helicobasidium mompa, White scab (Rosellinia necatrix), Blight blight (Phomopsis mali, Diaporthe tanakae), brown blight (Diplocarpon mali), apple fire Disease (Erwinia amylovora), root head cancer disease (Agrobacterium tumefaciens), hair root disease (Agrobacterium rhizogenes);
Black spot of pear (Alternaria kikuchiana), star blight (Venturia nashicola), red star (Gymnosporangium asiaticum), ring blight (Botryosphaeria berengeriana f. Sp. Piricola), blight blight (Phomopsis fukushii), blight of blight Erwinia sp.), Root-head cancer disease (Agrobacterium tumefaciens), rust blight (Erwinia chrysanthemi pv. Chrysanthemi), flower rot bacteriobacteria (Pseudomonas syringae pv. Syringae); s ringae), blight of blight (Erwinia sp.); peach scab (Cladosporium carpophilum), homoposis rot (Phomopsis sp.), plague (Phytophthora sp.), anthracnose (Colletotrichum gloeosporioides), leaf rot (Taphrina) Deforans), Perforating Bacterial Disease (Xhanthomonas campestris pv. pruni), Root Head Onset Disease (Agrobacterium tumefaciens); Sweet Potato Anthracnose (Glomerella cingulata), Fungal Fungus Nervosa (Monilinia kusanoi), Grizzly Disease (Monilinia fructicola ), Root-head cancer disease (Agrobacter um tumefaciens), resinous bacterial disease (Pseudomonas syringae pv. syringae); Anthrax (Glomerella cingulata) of oyster (Geromerella cingulata), deciduous disease (Cercospora kaki; Mycosphaerella nawae), powdery mildew (Phyllactinia kakikora), Nematode cancer disease (Agrobacterium Tumefaciens); Citrus black spot (Diaporthe citri), green mold (Penicillium digitatum), blue mold (Penicillium italicum), scab (Elsinoe fawcettii), brown rot (Phytophthora citrophthora), scab (Xhanth) omonas campestris pv. citri), Pseudomonas syringae pv. syringae, greening disease (Liberibactor asiaticus), rhizo oncosis (Agrobacterium tumefaciens);
Tomato, cucumber, beans, strawberry, potato, cabbage, eggplant, lettuce etc. Botrytis cinerea; tomato, cucumber, beans, strawberry, potato, rapeseed, cabbage, eggplant, lettuce, etc. sclerotinia sclerotiorum ); Seedling blight of various vegetables such as tomato, cucumber, beans, radish, watermelon, eggplant, rapeseed, pepper, spinach, sugar beet etc. (Rhizoctonia spp., Pythium spp., Fusarium spp., Phythophthora spp., Sclerotinia sclerotirum etc.) Blight of solanaceous plant (Ralstonia solanacearum); downy mildew (Pseudoperonospora cubens) s), powdery mildew (Sphaerotheca fuliginea), anthracnose (Colletotrichum orbiculare), vine blight (Didymella bryoniae), scab (Fusarium oxysporum), blight (Phytophthora parasitica, Phytophthora melonitis, Phitichitithithelium Etc.), brown spot bacterial disease (Xhanthomonas campestris pv. Cucurbitae), soft rot (Erwinia carotovora subsp. Carotovora), spotted bacterial disease (Pseudomonas syri) ... Gae pv lachrymans), edges bacterial grain rot (Pseudomonas marginalis pv marginalis), temple petitioner disease (Streptomyces sp), root disease (Agrobacterium rhizogenes), cucumber mosaic virus (Cucumber mosaic virus);
Ring blight (Alternaria solani), leaf blight (Fulvia fulva), plague (Phytophthora infestans), wilt (Fusarium oxysporum), root rot (Pythium myriotylum, Pythium dissotocum), anthracnose (Colletotrichum gloeoporiodes) Disease (Clavibacter michiganensis), stem blight disease (Pseudomonas corrugata), black spot bacterial disease (Pseudomonas viridiflava), soft rot (Erwinia carotovora subsp. Carotovora), leaf blight (Crynebacterium sp.), Yellow wilt (P ytoplasma asteris), yellow leaf atrophy (Tobacco leaf curl subgroup III geminivirus); powdery mildew of eggplant (Sphaerotheca fuliginea etc.), slime blight (Mycovellosiella nattrassii), plague (Phytophthora infestans), brown rot (Phytophthora capsici) Brown spot bacterial disease (Pseudomonas cichorii), stem blight bacterial disease (Pseudomonas corrugata), stem rot bacterial disease (Erwinia chrysanthemi), soft rot (Erwinia carotovora subsp. Carotovora), spotted bacterial disease (Pseudomonas sp.); Black spot (Alternaria brassicae), black rot (Xhanthomonas campestris pv. Campestris), black spot blight (Pseudomonas syringae pv. Maculicola), soft rot (Erwinia carotovora); black spot of Brassicaceae (Alternaria brassicae) Etc.), white spot (Cercosporella brassicae), root blight (Phoma lingam), root scab (Plasmodiophora brassicae), downy mildew (Peronospora parasitica), black rot (Xhanthomonas campestris pv. Campestris), black spot bacterial disease Pseudomonas sy ringae pv. maculicola), soft rot (Erwinia carotovora subsp. carotovora);
Strains of rot of cabbage (Thanatephorus cucumeris), yellow rot (Fusarium oxysporum), black scab (Alternaria brassisicola); Chinese cabbage end rot (Rhizoctonia solani), yellow rot (Verticillium dahliae); Allium rust (Puccinia allii) ), Black rot (Alternaria porri), white scab (Sclerotium rolfsii), white rot (Phytophthora porri), black rot fungus (Sclerotium cepivorum); onion scab (Curtobacterium flaccumfaciens), soft rot (Erwinia carotovora subsp) . Carot vora), spotted bacterial disease (Pseudomonas syringae pv. syringae), rot (Erwinia rhapontici), scaly rot (Burkholderia gladioli), yellow rot (Phytoplasma asteris); soft rot (Erwinia carotovora subsp. carotovora) of garlic Disease (Pseudomonas marginalis pv. Marginalis); purpura of soybean (Cercospora kikuchii), mildew (Elsinoe glycines), black spot (Diaporthe phaseolorum), rhizoctonia root rot (Rhizoctonia solani), stem blight (Phytophthora soj) e) downy mildew (Peronospora manshurica), rust (Phakopsora pachyrhizi), anthracnose (Colletotrichum truncatum etc.), leaf blight (Xhanthomonas campestris pv. glycines), spotted blight (Pseudomonas syringae pv. glycinea); Anthracnose (Colletotrichum lindemuthianum), bacterial blight (Ralstonia solanacearum), scab (Pseudomonas syringae pv. Phaseolicola), brown leaf blight (Pseudomonas viridiflava), leaf blight (Xhanthomonas campestris p . phaseoli);
Groundnut (Mycosphaerella berkeleyi), brown spot (Mycosphaerella arachidis), blight (Ralstonia solanacearum); powdery mildew (Erysiphe pisi) of pea, downy mildew (Peronospora pisi), vine blight (Pseudomonas) syringae pv. pisi), scab disease (Xhanthomonas campestris pv. pisi; downy mildew (Peronospora viciae), plague (Phytophthora nicotianae); Plague (Phyt phthora infestans), silver blight (Helminthosporium solani), dry rot (Fusarium oxysporum, Fusarium solani), powdery mildew (Spongospora subterranea), blight (Ralstonia solanacearum), scab (Erwinia carotovora subsp. atticeptica) ), Scab disease (Streptomyces scabies, Streptomyces acidiscabies), soft rot (Erwinia carotovora subsp. Carotovora), viscous rot (Crostridium spp.), Ring rot (Clavobacter michiganensis sub) sp. sepedonicus); sweet potato blight (Streptomyces ipomoeae); sugar beet (Cercospora beticola), downy mildew (Peronospora schachtii), black root disease (Aphanomyces cochioides), snake eye disease (Phoma betae), rooted head Cancer disease (Agrobacterium tumefaciens), scab disease (Streptomyces scabies), spotted bacterial disease (Pseudomonas syringae pv. Aptata);
Black leaf blight of carrot (Alternaria dauci), gall disease (Rhizobacter dauci), rhizocarp disease (Agrobacterium tumefaciens), Streptomyces scabies (Streptomyces spp.), Soft rot (Erwinia carotovora subsp. Carotovora); Powdery mildew of strawberries (Sphaerotheca aphanis var. Aphanis), plague (Phytophthora nicotianae etc.), anthracnose (Glomerella cingulata etc.), fruit rot (Pythium ultimum), blight (Ralstonia solanacearum), horny mildew (Xhanthomonas) campestris), Bacterial mildew (Pseudomonas marginalis pv. Marginalis); Tea scab (Exobasidium reticulatum), white scab (Elsinoe leucospila), anthracnose (Colletotrichum theae-sinensis), rot blotch (Pestalotiopsis longiseta), fire blight (Pseudomonas) Theae), scab (Xhanthomonas campestris pv. theicola), scabies (Pseudomonas sp.); tobacco scab (Alternaria alternata), powdery mildew (Erysiphe cichoracearum), anthracnose (Colletotritri) hum gloeosporioides), plague (Phytophthora nicotianae), wild blight (Pseudomonas syringae pv. tabaci), yellow blight (Pseudomonas syringae pv. mellea), cavity disease (Erwinia carotovora subsp. carotovora), dead blight (Ral , Tobacco mosaic virus (Tobacco mosaic virus);
Coffee rust (Hemileia vastatrix); Banana black shigatogas (Mycosphaerella fijiensis), Panama disease (Fusarium oxysporum f. Sp cubense); Cotton blight (Fusarium oxysporum), mildew (Ramularia areola); Sclerotinia sclerotiorum, scab disease (Xhanthomonas campestris pv. Malvacearum), cavity disease (Erwinia carotovora subsp. Carotovora), spotted blight disease (Pseudomonas syringae pv. Helianthi); Mildew (Sphaerotheca pannosa etc.), plague (Phytophthora megasperma), downy mildew (Peronospora sparsa), rhizo oncosis (Agrobacterium tumefaciens); brown spot of chrysanthemum (Septoria obesa), white rust (Puccinia horiana) ), Plague (Phytophthora cactorum), spotted bacterial disease (Pseudomonas cichorii), soft rot (Erwinia carotovora subsp. Carotovora), root head cancer disease (Agrobacterium tumefaciens), hair root disease (Agrobacterium rhizogenes), green disease (auPhythma histoplasma) ifolia); brown patch disease (Rhizoctonia solani), duller spot disease (Sclerotinia homoeocarpa), carbularia leaf blight (Curvularia sp.), rust (Puccinia zoysiae), hermintosporium leaf blight (Cochliobolus sp.) , Cloud disease (Rhynchosporium secalis), Damping disease (Gaeumannomyces graminis), Anthracnose (Colletotrichum sp.), Snow rot brown powdery mildew (Typhula incarnata), Snow rot black powdery mildew (Typhula ishikariensis), snow rot Large-scale fungal sclerotis disease (Myriosclerotinia borealis), fairy ring disease Marasmius Oreades etc.), Pythium disease (Pythium aphanidermatum, etc.), blast (Pyricularia grisea), and the like.
 本発明化合物は、本化合物単体で使用してもよいが、好ましくは、固体担体、液体担体、気体担体、界面活性剤、固着剤、分散剤、安定剤等と混合し、粉剤、水和剤、顆粒水和剤、水溶剤、顆粒水溶剤、粒剤、乳剤、液剤、マイクロエマルション剤、水性懸濁製剤、水性乳濁製剤、サスポエマルション製剤等の組成物として使用することができる。効果が発揮される限りにおいて、それらの組成物に限定されることはない。 The compound of the present invention may be used alone, but preferably it is mixed with a solid carrier, liquid carrier, gas carrier, surfactant, fixing agent, dispersing agent, stabilizer, etc., dusting agent, wettable agent The composition can be used as a composition such as water dispersible granules, water solvents, granules water solvents, granules, emulsions, solutions, microemulsions, aqueous suspensions, aqueous emulsions, suspoemulsions and the like. There is no limitation to those compositions as long as the effect is exhibited.
 以下に具体的な製剤化例を示すが、これらに限定されるものではない。 Specific formulation examples are shown below, but are not limited thereto.
[製剤例1 フロアブル剤]
 本発明化合物(10質量部)、ナフタレンスルホン酸のホルムアルデヒド縮合物ナトリウム塩(5質量部)、ポリオキシエチレンアリールフェニルエーテル(1質量部)、プロピレングリコール(5質量部)、シリコン系消泡剤(0.1質量部)、キサンタンガム(0.2質量部)、イオン交換水(78.7質量部)を混合してスラリーとなし、さらにダイノミルKDLで直径1.0mmのガラスビーズを用いて湿式粉砕しフロアブル剤を得る。
[Formulation example 1 flowable]
The compound of the present invention (10 parts by mass), sodium salt of formaldehyde condensate of naphthalenesulfonic acid (5 parts by mass), polyoxyethylene arylphenyl ether (1 parts by mass), propylene glycol (5 parts by mass), silicone antifoam ( 0.1 parts by mass), xanthan gum (0.2 parts by mass), and ion-exchanged water (78.7 parts by mass) to form a slurry, and further wet grinding using glass beads having a diameter of 1.0 mm with Dinomill KDL Obtain a flowable agent.
[製剤例2 乳剤]
 本発明化合物(5質量部)をキシレン(40質量部)とシクロヘキサン(35質量部)の混合溶液に溶解し、この溶液にTween20(20質量部)を添加混合し、乳剤を得る。
Formulation Example 2 Emulsion
The compound of the present invention (5 parts by mass) is dissolved in a mixed solution of xylene (40 parts by mass) and cyclohexane (35 parts by mass), and Tween 20 (20 parts by mass) is added to and mixed with this solution to obtain an emulsion.
[製剤例3 水和剤]
 本発明化合物(10質量部)、ホワイトカーボン(10質量部)、ポリビニルアルコール(2質量部)、ジオクチルスルホコハク酸ナトリウム塩(0.5質量部)、アルキルベンゼンスルホン酸ナトリウム塩(5質量部)、焼成珪藻土(10質量部)およびカオリナイトクレー(62.5質量部)を充分に混合し、エアーミルで粉砕し、水和剤を得る。
[Formulation Example 3 Wettable powder]
The compound of the present invention (10 parts by mass), white carbon (10 parts by mass), polyvinyl alcohol (2 parts by mass), dioctyl sulfosuccinate sodium salt (0.5 parts by mass), alkylbenzenesulfonic acid sodium salt (5 parts by mass), calcined Diatomaceous earth (10 parts by mass) and kaolinite clay (62.5 parts by mass) are thoroughly mixed and ground in an air mill to obtain a wettable powder.
 以下、本発明の組成物(農園芸用有害生物防除剤、農園芸用殺菌剤)の施用について説明する。 Hereinafter, application of the composition of the present invention (pest control agent for agriculture and horticulture, fungicide for agriculture and horticulture) will be described.
 本発明化合物を含有する組成物の施用方法としては、植物体もしくは種子と接触させる方法、または、栽培土壌に含有させて、植物の根もしくは地下茎に接触させる方法が挙げられる。具体例として、組成物の植物個体への茎葉散布処理、注入処理、苗箱処理、セルトレー処理、植物種子への吹き付け処理、植物種子への塗沫処理、植物種子への浸漬処理、植物種子への粉衣処理、土壌表面への散布処理、土壌表面への散布処理後の土壌混和、土壌中への注入処理、土壌中での注入処理後の土壌混和、土壌潅注処理、土壌潅注処理後の土壌混和等が挙げられる。通常、当業者が利用するようないかなる施用方法を用いても十分な効力を発揮する。 As a method of applying the composition containing the compound of the present invention, a method of contacting with a plant or a seed, or a method of including it in cultivation soil and contacting with a root or a rhizome of a plant can be mentioned. As a specific example, foliage spraying treatment to individual plants, injection treatment, seedling box treatment, cell tray treatment, spraying treatment to plant seeds, spraying treatment to plant seeds, immersion treatment to plant seeds, immersion treatment to plant seeds, plant seeds Dressing treatment, spraying treatment on soil surface, mixing with soil after spraying treatment on soil surface, pouring treatment into soil, pouring treatment in soil, soil blending after injection treatment, soil irrigation treatment, soil irrigation treatment Soil mixing etc. are mentioned. In general, any application method as used by those skilled in the art exerts sufficient efficacy.
 本発明でいう「植物」とは、光合成をして運動せずに生活するものをいう。具体例として、稲、小麦、大麦、トウモロコシ、コーヒー、バナナ、ブドウ、リンゴ、ナシ、モモ、オウトウ、カキ、カンキツ、大豆、インゲン、ワタ、イチゴ、ジャガイモ、キャベツ、レタス、トマト、キュウリ、ナス、スイカ、テンサイ、ホウレンソウ、サヤエンドウ、カボチャ、サトウキビ、タバコ、ピーマン、サツマイモ、サトイモ、コンニャク、綿、ヒマワリ、バラ、チューリップ、キク、芝等およびそれらのF1品種等が挙げられる。また、遺伝子等を人工的に操作することにより生み出され、元来自然界に存在するものではない遺伝子組み換え作物も含み、例えば、除草剤耐性を付与した大豆、トウモロコシ、綿等、寒冷地適応したイネ、タバコ等、殺虫物質生産能を付与したトウモロコシ、綿等の農園芸作物等が挙げられる。さらに、マツ、トネリコ、イチョウ、カエデ、カシ、ポプラ、ケヤキ等の樹木等が挙げられる。また、本発明でいう「植物体」とは、前記の植物個体を構成する全ての部位を総称するものであり、例えば、茎、葉、根、種子、花、果実等が挙げられる。 The term "plant" as used in the present invention refers to those that live without exercise by performing photosynthesis. As a specific example, rice, wheat, barley, corn, coffee, banana, grape, apple, pear, peach, sweet potato, oyster, citrus, soybean, green bean, cotton, strawberry, potato, cabbage, lettuce, tomato, cucumber, eggplant, Watermelon, sugar beet, spinach, green peas, pumpkin, sugar cane, tobacco, pepper, sweet potato, sweet potato, taro, konjac, cotton, sunflower, rose, tulip, chrysanthemum and the like, and F1 varieties thereof, and the like. In addition, it also includes genetically modified crops that are produced by artificially manipulating genes etc. and are not naturally present in the natural world, and examples include herbicide resistant soybean, corn, cotton, etc. rice adapted to cold areas And tobacco, agricultural and horticultural crops such as corn and cotton to which an insecticidal substance producing ability has been imparted. Furthermore, trees such as pine, ash, ginkgo, maple, oak, poplar, zelkova, etc. may be mentioned. The term "plant" as used in the present invention is a generic term for all parts constituting the individual plant, and includes, for example, stems, leaves, roots, seeds, flowers, fruits and the like.
 本発明でいう「種子」とは、幼植物が発芽するための栄養分を蓄え、農業上繁殖に用いられるものをいう。具体例として、トウモロコシ、大豆、綿、稲、テンサイ、小麦、大麦、ヒマワリ、トマト、キュウリ、ナス、ホウレンソウ、サヤエンドウ、カボチャ、サトウキビ、タバコ、ピーマン、セイヨウアブラナ等の種子、それらのF1品種等の種子、サトイモ、ジャガイモ、サツマイモ、コンニャク等の種芋、食用ゆり、チューリップ等の球根、ラッキョウ等の種球、および遺伝子組み換え作物の種子ならびに塊茎等が挙げられる。 The term "seed" as used in the present invention refers to one which stores nutrients for sprouting young plants and is used for agricultural propagation. Specific examples include corn, soybean, cotton, rice, sugar beet, wheat, barley, sunflower, tomato, cucumber, eggplant, spinach, spiny pea, squash, sugar cane, tobacco, green pepper, Brassica napus seeds, F1 varieties thereof, etc. Examples thereof include seeds, seeds such as taro, potato, sweet potato, konjac, edible lilies, bulbs such as tulip, seeds such as raccoon, and seeds and tubers of genetically modified crops.
 本発明化合物を含有する組成物の施用量および施用濃度は、対象作物、対象病害、病害の発生程度、化合物の剤型、施用方法および各種環境条件等によって変動するが、散布または潅注する場合には、有効成分量としてヘクタール当たり0.1~10,000gが適当であり、好ましくは、ヘクタール当り10~1,000gである。また、種子処理の場合の使用量は、有効成分量として種子1kg当たり0.0001~1000gであり、好ましくは、0.001~100gである。本発明化合物を含有する組成物を植物個体への茎葉散布処理、土壌表面への散布処理、土壌中への注入処理または土壌潅注処理として使用する場合は、適当な担体に適当な濃度で希釈した後、処理を行ってもよい。本発明化合物を含有する組成物を植物種子に接触させる場合は、適当な濃度に希釈した後、植物種子に浸漬、粉衣、吹き付けまたは塗沫処理して用いてもよい。浸漬、粉衣、吹き付けまたは塗沫処理する場合の組成物使用量は、通常、有効成分量として、乾燥植物種子重量の0.05~50%程度であり、好ましくは、0.1~30%が適当であるが、組成物の形態や処理対象となる植物種子の種類により適宜設定すればよく、これら範囲に限定されるものではない。 The application rate and application concentration of the composition containing the compound of the present invention vary depending on the target crop, target disease, degree of disease occurrence, dosage form of the compound, application method and various environmental conditions, etc. The amount of active ingredient is suitably from 0.1 to 10,000 g per hectare, preferably from 10 to 1,000 g per hectare. In the case of seed treatment, the amount used is from 0.0001 to 1000 g, preferably from 0.001 to 100 g, per kg of seed as the amount of the active ingredient. When the composition containing the compound of the present invention is used as foliage application to individual plants, application to soil surface, injection into soil, or soil irrigation, it is diluted to an appropriate concentration in an appropriate carrier. You may process afterward. When the composition containing the compound of the present invention is brought into contact with plant seeds, the plant seeds may be used after being diluted to an appropriate concentration and then subjected to dipping, dressing, spraying or smearing. The amount of the composition used for immersion, dusting, spraying or smearing treatment is usually about 0.05 to 50% of the weight of the dry plant seed, preferably 0.1 to 30%, as the amount of the active ingredient. Although it is suitable, it may be suitably set according to the form of the composition and the kind of the plant seed to be treated, and it is not limited to these ranges.
 本発明化合物は、必要に応じて他の農薬、例えば、殺菌剤、殺虫剤(殺ダニ剤および殺線虫剤を含む)、除草剤、微生物資材等および植物成長調節剤等の農薬、核酸を有効成分とする病害防除剤(国際公開第2014/062775号)、土壌改良剤または肥効物質等と混合して使用することができる。本発明化合物と他の農薬を混合して使用する方法としては、本発明化合物と他の農薬とを一つの剤型に製剤化して使用する方法、それぞれが別々の剤型に製剤化された両者を使用前に混合して使用する方法、それぞれが別々の剤型に製剤化された両者を同時に使用する方法、または、それぞれが別々の剤型に製剤化された両者について、いずれか一方を使用した後に他方を使用する方法が挙げられる。 The compound of the present invention may be, if necessary, other pesticides, for example, pesticides such as fungicides, insecticides (including acaricides and nematocides), herbicides, microbial materials, plant growth regulators and the like, nucleic acids It can be used by mixing it with a disease control agent (WO 2014/062775) as an active ingredient, a soil conditioner or a fertilizer. As a method of mixing and using the compound of the present invention and other agricultural chemicals, a method of using the compound of the present invention and other agricultural chemicals formulated into one dosage form, both formulated into separate dosage forms A method of mixing and using before use, a method of simultaneously using both formulated in separate dosage forms, or using either one of both formulated in separate dosage forms And then use the other method.
 本発明化合物と混合して使用することができる殺菌剤に含まれる具体的な成分は、以下の群bで例示され、これらの塩、異性体およびN-オキシド体を含む。ただし、公知の殺菌剤はこれらに限定されるものではない。 Specific components contained in the microbicide which can be used in combination with the compound of the present invention are exemplified in the following group b and include salts, isomers and N-oxides thereof. However, known microbicides are not limited to these.
群b:
b-1:フェニルアミド系殺菌剤
 フェニルアミド系殺菌剤として、[b-1.1]:ベナラキシル(benalaxyl)、[b-1.2]ベナラキシルMまたはキララキシル(benalaxyl-Mまたはkiralaxyl)、[b-1.3]フララキシル(furalaxyl)、[b-1.4]メタラキシル(metalaxyl)、[b-1.5]メタラキシルMまたはメフェノキサム(metalaxyl-Mまたはmefenoxam)、[b-1.6]オキサジキシル(oxadixyl)、[b-1.7]オフラセ(ofurace)等が挙げられる。
Group b:
b-1: Phenylamide-based fungicide [b-1.1]: Benalaxyl (benalaxyl), [b-1.2] Benaraxyl M or quaraxyl (benalaxyl-M or kiralaxyl) as a phenylamide-based microbicide, [b -1.3] furanaxyl (furalaxyl), [b-1.4] metalaxyl (metalaxyl), [b-1.5] metalaxyl M or mefenoxam (metalaxyl-M or mefenoxam), [b-1.6] oxadixyl oxadixyl), [b-1.7] ofurace, and the like.
b-2:有糸核分裂および細胞分裂阻害剤
 有糸核分裂および細胞分裂阻害剤として、[b-2.1]ベノミル(benomyl)、[b-2.2]カルベンダジム(carbendazim)、[b-2.3]フベリダゾール(fuberidazole)、[b-2.4]チアベンダゾール(thiabendazole)、[b-2.5]チオファネート(thiophanate)、[b-2.6]チオファネートメチル(thiophanate-methyl)、[b-2.7]ジエトフェンカルブ(diethofencarb)、[b-2,8]ゾキサミド(zoxamide)、[b-2.9]エタボキサム(ethaboxam)、[b-2.10]ペンシクロン(pencycuron)、[b-2.11]フルオピコリド(fluopicolide)、[b-2.12]フェナマクリル(phenamacril)等が挙げられる。
b-2: Mitotic and cell division inhibitors [b-2.1] Benomyl, [b-2.2] carbendazim, [b- as a mitotic and cell division inhibitors 2.3] Fuberidazole (fuberidazole), [b-2.4] thiabendazole (thiabendazole), [b-2.5] thiophanate (thiophanate), [b-2.6] thiophanate methyl (thiophanate-methyl), [b- 2.7] Dietophencarb (dithofencarb), [b-2, 8] Zoxamide (zoxamide), [b-2.9] Etaboxam (ethaboxam), [b-2. 10] Pencicuron (pencycuron), [b-2. 11] Fluopico Examples thereof include fluopicolide, [b-2.12] phenamacril and the like.
b-3:コハク酸脱水素酵素阻害剤(SDHI剤)
 コハク酸脱水素酵素阻害剤(SDHI剤)として、[b-3.1]ベノダニル(benodanil)、[b-3.2]ベンゾビンジフルピル(benzovindiflupyr)、[b-3.3]ビキサフェン(bixafen)、[b-3.4]ボスカリド(boscalid)、[b-3.5]カルボキシン(carboxin)、[b-3.6]フェンフラム(fenfuram)、[b-3.7]フルオピラム(fluopyram)、[b-3.8]フルトラニル(flutolanil)、[b-3.9]フルキサピロキサド(fluxapyroxad)、[b-3.10]フラメトピル(furametpyr)、[b-3.11]イソフェタミド(isofetamid)、[b-3.12]イソピラザム(isopyrazam)、[b-3.13]メプロニル(mepronil)、[b-3.14]オキシカルボキシン(oxycarboxin)、[b-3.15]ペンチオピラド(penthiopyrad)、[b-3.16]ペンフルフェン(penflufen)、[b-3.17]ピジフルメトフェン(pydiflumetofen)、[b-3.18]セダキサン(sedaxane)、[b-3.19]チフルザミド(thifluzamide)、[b-3.20]ピラジフルミド(pyraziflumid)等が挙げられる。
b-3: Succinic acid dehydrogenase inhibitor (SDHI agent)
[B-3.1] Benodanil (benodanil), [b-3.2] benzobindiflupyr (benzavindiflupyr), [b-3.3] bixafen (bixafen) as a succinate dehydrogenase inhibitor (SDHI agent) ), [B-3.4] boscalid, [b-3.5] carboxin, [b-3.6] fenfuram, [b-3.7] fluopyram [B-3.8] flutolanil, [b-3.9] fluxapyroxad, [b-3. 10] frametpyr, [b-3. 11] isofetamide ), [B-3.12] isopyrazam (isop) razam), [b-3.13] mepronil (mepronil), [b-3. 14] oxycarboxin, [b-3. 15] penthiopyrad, [b-3. 16] penflufen ( penflufen), [b-3.17] pydiflumetofen, [b-3. 18] sedaxane, [b-3. 19] thifluzamide, [b-3. 20] pyradiflumid (Pyraziflumid) and the like.
b-4:キノン外部阻害剤(QoI剤)
 キノン外部阻害剤(QoI剤)として、[b-4.1]アゾキシストロビン(azoxystrobin)、[b-4.2]クモキシストロビン(coumoxystrobin)、[b-4.3]ジモキシストロビン(dimoxystrobin)、[b-4.4]エノキサストロビン(enoxastrobin)、[b-4.5]ファモキサドン(famoxadone)、[b-4.6]フェンアミドン(fenamidone)、[b-4.7]フェナミンストロビン(fenaminstrobin)、[b-4.8]フルフェノキシストロビン(flufenoxystrobin)、[b-4.9]フルオキサストロビン(fluoxastrobin)、[b-4.10]クレソキシムメチル(kresoxim-methyl)、[b-4.11]マンデストロビン(mandestrobin)、[b-4.12]メトミノストロビン(metominostrobin)、[b-4.13]オリサストロビン(orysastrobin)、[b-4.14]ピコキシストロビン(picoxystrobin)、[b-4.15]ピラクロストロビン(pyraclostrobin)、[b-4.16]ピラメトストロビン(pyrametostrobin)、[b-4.17]ピラオキシストロビン(pyraoxystrobin)、[b-4.18]ピリベンカルブ(pyribencarb)、[b-4.19]トリクロピリカルブ(triclopyricarb)、[b-4.20]トリフロキシストロビン(trifloxystrobin)等が挙げられる。
b-4: external quinone inhibitor (QoI agent)
As a quinone external inhibitor (QoI agent), [b-4.1] azoxystrobin (azoxystrobin), [b-4.2] coxoxystrobin (coumoxystrobin), [b-4.3] dimoxyst Robin (dimoxystrobin), [b-4.4] enoxastrobin (enoxastrobin), [b-4.5] famoxadone (famoxadone), [b-4.6] fenamidone (fenamidone), [b-4.7] ] Phenaminst robin (fenaminstrobin), [b-4.8] fluphenoxystrobin (flufenoxystrobin), [b-4.9] fluoxastrobin (fluoxastrobin), [b-4. 10] kresoxim-methyl (kresoxim-me hyl), [b-4.11] mandestrobin, [b-4. 12] metominostrobin, [b-4. 13] orysastrobin, [b-4. 14] Picoxystrobin, [b-4.15] pyraclostrobin, [b-4. 16] pyrametostrobin, [b-4. 17] pyraoxystrobin [B-4.18] pyribencarb, [b-4. 19] triclopyricarb, [b-4. 20] trifloxystrobin (trifloxyst) obin), and the like.
b-5:キノン内部阻害剤(QiI剤)
 キノン内部阻害剤(QiI剤)として、[b-5.1]シアゾファミド(cyazofamid)、[b-5.2]アミスルブロム(amisulbrom)等が挙げられる。
b-5: internal quinone inhibitor (QiI agent)
Examples of the quinone internal inhibitor (QiI agent) include [b-5.1] cyazofamide (cyazofamid), [b-5.2] amisulbrom and the like.
b-6:酸化的リン酸化脱共役阻害剤
 酸化的リン酸化脱共役阻害剤として、[b-6.1]ビナパクリル(binapacryl)、[b-6.2]メプチルジノカップ(meptyldinocap)、[b-6.3]ジノカップ(dinocap)、[b-6.4]フルアジナム(fluazinam)等が挙げられる。
b-6: Oxidative phosphorylation uncoupling inhibitor As an oxidative phosphorylation uncoupling inhibitor, [b-6.1] binapacryl (binapacryl), [b-6.2] meptyldinocap, [b-6.2] b-6.3] dinocap (dinocap), [b-6.4] fluazinam, and the like.
b-7:キノン外部スチグマテリン結合サブサイト阻害剤(QoSI剤)
 キノン外部スチグマテリン結合サブサイト阻害剤(QoSI剤)として、[b-7.1]アメトクトラジン(ametoctradin)等が挙げられる。
b-7: quinone external stigmaterine binding subsite inhibitor (QoSI agent)
Examples of quinone external stigmaterine binding subsite inhibitors (QoSI agents) include [b-7.1] ametoctradin and the like.
b-8:アミノ酸生合成阻害剤
 アミノ酸生合成阻害剤として、[b-8.1]シプロジニル(cyprodinil)、[b-8.2]メパニピリム(mepanipyrim)、[b-8.3]ピリメタニル(pyrimethanil)等が挙げられる。
b-8: Amino acid biosynthesis inhibitor [b-8.1] Cyprodinil as an amino acid biosynthesis inhibitor, [b-8.2] mepanipyrim (mepanipyrim), [b- 8.3] pyrimethanil (pyrimethanil) Etc.).
b-9:タンパク質生合成阻害剤
 タンパク質生合成阻害剤として、[b-9.1]ストレプトマイシン(streptomycin)、[b-9.2]ブラストサイジンS(blasticidin-S)、[b-9.3]カスガマイシン(kasugamycin)、[b-9.4]オキシテトラサイクリン(oxytetracycline)等が挙げられる。
b-9: Protein biosynthesis inhibitor [b-9.1] streptomycin as a protein biosynthesis inhibitor, [b-9.2] Blasticidin S (blasticidin-S), [b-9. 3] Kasugamycin (kasugamycin), [b-9.4] oxytetracycline (oxytetracycline) and the like.
b-10:シグナル伝達阻害剤
 シグナル伝達阻害剤として、[b-10.1]フェンピクロニル(fenpiclonil)、[b-10.2]フルジオキソニル(fludioxonil)、[b-10.3]キノキシフェン(quinoxyfen)、[b-10.4]プロキナジド(proquinazid)、[b-10.5]クロゾリネート(chlozolinate)、[b-10.6]ジメタクロン(dimethachlone)、[b-10.7]イプロジオン(iprodione)、[b-10.8]プロシミドン(procymidone)、[b-10.9]ビンクロゾリン(vinclozolin)等が挙げられる。
b-10: Signal transduction inhibitor [b-10.1] fenpiclonil, [b-10.2] fludioxonil, [b-10.3] quinoxyfen, as a signal transduction inhibitor [B-10.4] proquinazid, [b-10.5] clozolinate (chlozolinate), [b-10.6] dimethaclone (dimethachlone), [b-10.7] iprodione (iprodione), [b-10.4] -10.8] procymidone, [b-10.9] vinclozolin, and the like.
b-11:脂質および細胞膜生合成阻害剤
 脂質および細胞膜生合成阻害剤として、[b-11.1]エジフェンホス(edifenphos)、[b-11.2]イプロベンホス(iprobenfos)、[b-11.3]ピラゾホス(pyrazophos)、[b-11.4]イソプロチオラン(isoprothiolane)、[b-11.5]ビフェニル(biphenyl)、[b-11.6]クロロネブ(chloroneb)、[b-11.7]ジクロラン(dicloran)、[b-11.8]キントゼン(quintozene)、[b-11.9]テクナゼン(tecnazene)、[b-11.10]トルクロホスメチル(tolclofos-methyl)、[b-11.11]エトリジアゾール(echlomezol or etridiazole)、[b-11.12]ヨードカルブ(iodocarb)、[b-11.13]プロパモカルブ(propamocarb)、[b-11.14]プロチオカルブ(prothiocarb)等が挙げられる。
b-11: Lipid and cell membrane biosynthesis inhibitors [b-11.1] Edifenphos (edifenphos), [b-11.2] iprobenphos (iprobenfos), [b-11. Pyrazophos, [b-11.4] isoprothiolane, [b-11.5] biphenyl, [b-11.6] chloroneb, [b-11.7] dichlorane (Dicloran), [b-11.8] quintozene, [b-11.9] tecnazene, [b-11.10] tolclofos-methyl (tolclofos-methyl), [b-11.11] Etridiazole (ec hlomezol or etridiazole), [b-11.12] iodocarb, [b-11. 13] propamocarb, [b-11. 14] prothiocarb, and the like.
b-12:脱メチル化阻害剤(DMI剤)
 脱メチル化阻害剤(DMI剤)として、[b-12.1]アザコナゾール(azaconazole)、[b-12.2]ビテルタノール(bitertanol)、[b-12.3]ブロムコナゾール(bromuconazole)、[b-12.4]シプロコナゾール(cyproconazole)、[b-12.5]ジフェノコナゾール(difenoconazole)、[b-12.6]ジニコナゾール(diniconazole)、[b-12.7]ジニコナゾールM(diniconazole-M)、[b-12.8]エポキシコナゾール(epoxiconazole)、[b-12.9]エタコナゾール(etaconazole)、[b-12.10]フェナリモル(fenarimol)、[b-12.11]フェンブコナゾール(fenbuconazole)、[b-12.12]フルキンコナゾール(fluquinconazole)、[b-12.13]キンコナゾール(quinconazole)、[b-12.14]フルシラゾール(flusilazole)、[b-12.15]フルトリアホール(flutriafol)、[b-12.16]ヘキサコナゾール(hexaconazole)、[b-12.17]イマザリル(imazalil)、[b-12.18]イミベンコナゾール(imibenconazole)、[b-12.19]イプコナゾール(ipconazole)、[b-12.20]メトコナゾール(metconazole)、[b-12.21]ミクロブタニル(myclobutanil)、[b-12.22]ヌアリモール(nuarimol)、[b-12.23]オキスポコナゾール(oxpoconazole)、[b-12.24]オキスポコナゾールフマル酸塩(oxpoconazole fumarate)、[b-12.25]ペフラゾエート(pefurazoate)、[b-12.26]ペンコナゾール(penconazole)、[b-12.27]プロクロラズ(prochloraz)、[b-12.28]プロピコナゾール(propiconazole)、[b-12.29]プロチオコナゾール(prothioconazole)、[b-12.30]ピリフェノックス(pyrifenox)、[b-12.31]ピリソキサゾール(pyrisoxazole)、[b-12.32]シメコナゾール(simeconazole)、[b-12.33]テブコナゾール(tebuconazole)、[b-12.34]テトラコナゾール(tetraconazole)、[b-12.35]トリアジメホン(triadimefon)、[b-12.36]トリアジメノール(triadimenol)、[b-12.37]トリフルミゾール(triflumizole)、[b-12.38]トリホリン(triforine)、[b-12.39]トリチコナゾール(triticonazole)[b-12.40]メフェントリフルコナゾール(mefentrifluconazole)、[b-12.41]イプフェントリフルコナゾール(ipfentrifluconazole)等が挙げられる。
b-12: Demethylation inhibitor (DMI agent)
As a demethylation inhibitor (DMI agent), [b-12.1] azaconazole (azaconazole), [b-12.2] bitertanol, [b-12. 3] bromuconazole, [b-12. b-12.4] cyproconazole (cyproconazole), [b-12.5] difenoconazole (difenoconazole), [b-12.6] diniconazole, [b-12.7] diniconazole M (diniconazole-M ), [B-12. 8] epoxiconazole (epoxiconazole), [b-12. 9] etaconazole (etaconazole), [b-12. 10] phenarimol (fenarimol), [b-12. Fenbuconazole (fenbuconazole), [b-12.12] fluquinconazole (fluquinconazole), [b-12. 13] quinconazole (quinconazole), [b-12. 14] flusilazole (flusilazole), [b-12 .15] Flutriaphor (flutriafol), [b-12.16] hexaconazole (hexaconazole), [b-12.17] imazalil (imazalil), [b-12.18] imibenconazole (imibenconazole), [B-12.19] ipconazole (ipconazole), [b-12. 20] metconazole (metconazole), [b-12. 21] microbutanil (myclobutanil [B-12.22] nuarimol (nuarimol), [b-12. 23] oxpoconazole (oxpoconazole), [b-12. 24] oxpoconazole fumarate (oxpoconazole fumarate), [b- 12.25] Pefurazoate, [b-12.26] penconazole, [b-12. 27] prochloraz, [b-12. 28] propiconazole, [b- 12.29] prothioconazole (prothioconazole), [b-12.30] pyriphenox, [b-12. 31] pyrisoxazole, [b-12. 32] Simeconazole (simeconazole), [b-12. 33] tebuconazole (tebuconazole), [b-12. 34] tetraconazole (tetraconazole), [b-12. 35] triadimefon (triadimefon), [b-12. 36] Triadimenol (triadimenol), [b-12. 37] triflumizole (triflumizole), [b-12. 38] triphorine (triforine), [b-12. 39] triticonazole (triticonazole) [b-12 .40] Mefentrifluconazole (mefentrifluconazole), [b-12.41] Ipfentrifluconazole, and the like.
b-13:アミン系殺菌剤
 アミン系殺菌剤として、[b-13.1]アルジモルフ(aldimorph)、[b-13.2]ドデモルフ(dodemorph)、[b-13.3]フェンプロピモルフ(fenpropimorph)、[b-13.4]トリデモルフ(tridemorph)、[b-13.5]フェンプロピジン(fenpropidin)、[b-13.6]ピペラリン(piperalin)、[b-13.7]スピロキサミン(spiroxamine)等が挙げられる。
b-13: Aminic fungicide [b-13.1] Aldimorph, [b-13. 2] dodemorph, [b-13. 3] fenpropimorph (fenpropimorph) as an amine bactericidal agent ), [B-13.4] tridemorph (tridemorph), [b-13.5] fenpropidin, [b-13.6] piperaline (piperalin), [b-13.7] spiroxamine (spiroxamine) Etc.).
b-14:ステロール生合成のC4位脱メチル化における3-ケト還元酵素阻害剤
 ステロール生合成のC4位脱メチル化における3-ケト還元酵素阻害剤として、[b-14.1]フェンヘキサミド(fenhexamid)、[b-14.2]フェンピラザミン(fenpyrazamine)等が挙げられる。
b-14: 3-keto reductase inhibitor in C4 demethylation of sterol biosynthesis [b-14.1] fenhexamid as 3-keto reductase inhibitor in C4 demethylation of sterol biosynthesis (Fenhexamid), [b-14.2] fenpyrazamine, and the like.
b-15:ステロール生合成のスクアレンエポキシダーゼ阻害剤
 ステロール生合成のスクアレンエポキシダーゼ阻害剤として、[b-15.1]ピリブチカルブ(pyributicarb)、[b-15.2]ナフチフィン(naftifine)、[b-15.3]テルビナフィン(terbinafine)等が挙げられる。
b-15: squalene epoxidase inhibitor of sterol biosynthesis As a squalene epoxidase inhibitor of sterol biosynthesis, [b-15.1] pyributicarb, [b-15. 2] naftifine, [bftifine] -15.3] Terbinafine (terbinafine) etc. are mentioned.
b-16:細胞壁生合成阻害剤
 細胞壁生合成阻害剤として、[b-16.1]ポリオキシン類(polyoxins)、[b-16.2]ジメトモルフ(dimethomorph)、[b-16.3]フルモルフ(flumorph)、[b-16.4]ピリモルフ(pyrimorph)、[b-16.5]ベンチアバリカルブ(benthiavalicarb)、[b-16.6]ベンチアバリカルブイソプロピル(benthivalicarb-isopropyl)、[b-16.7]イプロバリカルブ(iprovalicarb)、[b-16.8]マンジプロパミド(mandipropamid)、[b-17.9]バリフェナレート(valifenalate)等が挙げられる。
b-16: Cell wall biosynthesis inhibitor [b-16.1] Polyoxins (polyoxins), [b-16.2] dimethomorph, [b-16.3] flumorph as cell wall biosynthesis inhibitor flumorph), [b-16.4] pyrimorph, [b-16.5] benthiavalicarb, [b-16.6] bentivalaricarb isopropyl, [b-16.6] -16.7] Iprovalicarb (iprovalicarb), [b-16.8] mandipropamide (mandipropamid), [b-17.9] valifenalate (valifenalate), and the like.
b-17:メラニン生合成阻害剤
 メラニン生合成阻害剤として、[b-17.1]フサライド(phthalide or fthalide)、[b-17.2]ピロキロン(pyroquilone)、[b-17.3]トリシクラゾール(tricyclazole)、[b-17.4]カルプロパミド(carpropamid)、[b-17.5]ジクロシメット(diclocymet)、[b-17.6]フェノキサニル(fenoxanil)、[b-17.7]トルプロカルブ(tolprocarb)等が挙げられる。
b-17: Melanin biosynthesis inhibitor [b-17.1] Phthalide or phthalide, [b-17. 2] Pyroquilone, [b-17. 3] Tricyclazole as a melanin biosynthesis inhibitor (Tricyclazole), [b-17.4] carpropamide, [b-17.5] diclocymet, [b-17.6] phenoxanil, [b-17.7] tolprocarb (tolprocarb) Etc.).
b-18:宿主植物抵抗性誘導剤
 宿主植物抵抗性誘導剤として、[b-18.1]アシベンゾラルSメチル(acibenzolar-S-methyl)、[b-18.2]プロベナゾール(probenazole)、[b-18.3]チアジニル(tiadinil)、[b-18.4]イソチアニル(isotianil)、[b-18.5]ラミナリン(laminarin)等が挙げられる。
b-18: Host plant resistance inducer [b-18.1] Acibenzolar-S-methyl (acibenzolar-S-methyl), [b-18.2] probenazole (probenazole), [b-18. 1] as a host plant resistance inducer -18.3] Thiazinyl, [b-18.4] Isotianil, [b-18.5] laminarin, and the like.
b-19:ジチオカーバメート系殺菌剤
 ジチオカーバメート系殺菌剤として、[b-19.1]マンコゼブまたはマンゼブ(mancozeb or manzeb)、[b-19.2]マンネブ(maneb)、[b-19.3]メチラム(metiram)、[b-19.4]プロピネブ(propineb)、[b-19.5]チウラム(thiram)、[b-19.6]ジネブ(zineb)、[b-19.7]ジラム(ziram)、[b-19.8]フェルバム(ferbam)等が挙げられる。
b-19: dithiocarbamate fungicide [b-19.1] Mancozeb or manzeb as a dithiocarbamate fungicide, [b-19. 2] maneb, [b-19. 3] ] Metilam (metiram), [b-19.4] propineb (propineb), [b-19.5] thiuram (thiram), [b-19.6] zineb (zineb), [b-19.7] ziram (Ziram), [b-19.8] ferbam, and the like.
b-20:フタルイミド系殺菌剤
 フタルイミド系殺菌剤として、[b-20.1]キャプタン(captan)、[b-20.2]キャプタホール(captafol)、[b-20.3]ホルペット(folpet)、[b-20.4]フルオロホルペット(fluorofolpet)等が挙げられる。
b-20: Phthalimide fungicide [b-20.1] captan, [b-20.2] captafol, [b-20.3] holpet (folpet) as a phthalimide fungicide And [b-20.4] fluorophorpet and the like.
b-21:グアニジン系殺菌剤
 グアニジン系殺菌剤として、[b-21.1]グアザチン(guazatine)、[b-21.2]イミノクタジン(iminoctadine)、[b-21.3]イミノクタジンアルベシル酸塩(iminoctadine albesilate)、[b-21.4]イミノクタジン三酢酸塩(iminoctadine triacetate)等が挙げられる。
b-21: guanidine fungicide [b-21.1] guazatine as a guanidine fungicide, [b-21.2] iminoctadine (iminoctadine), [b-21.3] iminoctadine albesylate salt (Iminoctadine albesilate), [b-21.4] iminoctadine triacetate, and the like.
b-22:多作用点接触活性型殺菌剤
 多作用点接触活性型殺菌剤として、[b-22.1]塩基性塩化銅(copper oxychloride)、[b-22.2]水酸化第二銅(copper(II) hydroxide)、[b-22.3]塩基性硫酸銅(copper hydroxide sulfate)、[b-22.4]有機銅化合物(organocopper compound)、[b-22.5]ドデシルベンゼンスルホン酸ビスエチレンジアミン銅錯塩[II](Dodecylbenzenesulphonic acid bisethylenediamine copper [II] salt、DBEDC)、[b-22.6]硫黄(sulphur)、[b-22.7]フルオルイミド(fluoroimide)、[b-22.8]クロロタロニル(chlorothalonil)、[b-22.9]ジクロフルアニド(dichlofluanid)、[b-22.10]トリルフルアニド(tolylfluanid)、[b-22.11]アニラジン(anilazine)、[b-22.12]ジチアノン(dithianon)、[b-22.13]キノメチオナート(chinomethionat or quinomethionate)、[b-22.14]ハウチワマメ苗木の子葉からの抽出物(BLAD)等が挙げられる。
b-22: Multi-functional point contact active germicide [b-22.1] Basic copper chloride, [b-22.2] cupric hydroxide as a multi-functional contact germicidal agent (Copper (II) hydroxide), [b-22.3] basic copper sulfate (copper hydroxide sulfate), [b-22.4] organo copper compound (organocopper compound), [b-22.5] dodecyl benzene sulfone Bisethylenediamine copper complex salt [II] (dodecylbenzene acid sulfonic acid bisethylenediamine copper [II] salt, DBEDC), [b-22.6] sulfur (sulphur), [b-22.7] fluorimide (fluoroim) de), [b-22.8] chlorothalonil, [b-22.9] dichlofluanid (dichlofluanid), [b-22. 10] tolylfluanid (tolylfluanid), [b-22.11] Anilazine (anilazine), [b-22.12] dithianon (dithianon), [b-22. 13] quinomethionate or quinomethionate, [b-22. Can be mentioned.
b-23:その他の殺菌剤
 その他の殺菌剤として、[b-23.1]ジクロベンチアゾクス(dichlobentiazox)、[b-23.2]フェンピコキサミド(fenpicoxamid)、[b-23.3]ジピメチトロン(dipymetitrone)、[b-23.4]ブピリメート(bupirimate)、[b-23.5]ジメチリモール(dimethirimol)、[b-23.6]エチリモール(ethirimol)、[b-23.7]酢酸トリフェニルスズ(fentin acetate)、[b-23.8]塩化トリフェニルスズ(fentin chloride)、[b-23.9]水酸化トリフェニルスズ(fentin hydroxide)、[b-23.10]オキソリニック酸(oxolinic acid)、[b-23.11]ヒメキサゾール(hymexazol)、[b-23.12]オクチリノン(octhilinone)、[b-23.13]ホセチル(fosetyl)、[b-23.14]亜リン酸(phosphorous acid)、[b-23.15]亜リン酸のナトリウム塩(sodium phosphite)、[b-23.16]亜リン酸のアンモニウム塩(ammonium phosphite)、[b-23.17]亜リン酸のカリウム塩(potassium phosphite)、[b-23.18]テクロフタラム(tecloftalam)、[b-23.19]トリアゾキシド(triazoxide)、[b-23.20]フルスルファミド(flusulfamide)、[b-23.21]ジクロメジン(diclomezine)、[b-23.22]シルチオファム(silthiofam)、[b-23.23]ジフルメトリム(diflumetorim)、[b-23.24]メタスルホカルブ(methasulfocarb)、[b-23.25]シフルフェナミド(cyflufenamid)、[b-23.26]メトラフェノン(metrafenone)、[b-23.27]ピリオフェノン(pyriofenone)、[b-23.28]ドジン(dodine)、[b-23.29]フルチアニル(flutianil)、[b-23.30]フェリムゾン(ferimzone)、[b-23.31]オキサチアピプロリン(oxathiapiprolin)、[b-23.32]テブフロキン(tebufloquin)、[b-23.33]ピカルブトラゾクス(picarbutrazox)、[b-23.34]バリダマイシン類(validamycins)、[b-23.35]シモキサニル(cymoxanil)、[b-23.36]キノフメリン(quinofumelin)、
b-23: Other bactericidal agents [b-23. 1] dichlobentiazox, [b-23.2] fenpicoxamide, [b-23.3] as other bactericidal agents ] Dipimethitron (dipymetitrone), [b-23.4] bupirimate, [b-23.5] dimethyrimol (dimethirimol), [b-23.6] ethylymol (ethirimol), [b-23.7] acetic acid Triphenyltin (fentin acetate), [b-23.8] triphenyltin chloride (fentin chloride), [b-23.9] triphenyltin hydroxide (fentin hydroxide), [b-23.10] oxolinic acid (Oxo linic acid), [b-23.11] hymexazol, [b-23.12] octilinone, [b-23. 13] fosetyl, [b-23. 14] phosphite (Phosphorous acid), [b-23.15] sodium salt of phosphorous acid, [b-23. 16] ammonium salt of phosphorous acid, ammonium phosphate, [b-23. 17] phosphorous Acid potassium salt (potassium phosphate), [b-23.18] tecloftalam, [b-23. 19] triazoloxide, [b-23. 20] flusulfamide (flusulfamide) [B-23.21] diclomezine, [b-23. 22] silthiofam (silthiofam), [b-23. 23] diflumetrim, [b-23. 24] methasulfocarb, [B-23.25] cyflufenamide (cyflufenamid), [b-23.26] metrafenone (metrafenone), [b-23. 27] pyriofenone, [b-23.28] dodine, [b -23.29] flutianil (flutianil), [b-23.30] ferrimzone (ferimzone), [b-23.31] oxathiapiprolin (oxathiapiprolin), [b-23. 32] tebufloquin (tebufloquin), [b-23.33] picalbutrazox (picarbutrazox), [b-23.34] validamycins (validamycins), [b-23.35] shimoxanyl (cymoxanil), [b- 23.36] quinofumelin,
[b-23.37]式(s1)
Figure JPOXMLDOC01-appb-C000109

で表される化合物(国際公開第98/046607号参照)、
[B-23.37] Formula (s1)
Figure JPOXMLDOC01-appb-C000109

A compound represented by (see WO 98/046607),
[b-23.38]式(s2)
Figure JPOXMLDOC01-appb-C000110

で表される化合物(国際公開第08/148570号参照)、
[B-23.38] Formula (s2)
Figure JPOXMLDOC01-appb-C000110

A compound represented by (see WO 08/148570),
[b-23.39]式(s3)
Figure JPOXMLDOC01-appb-C000111

で表される化合物(国際公開第92/012970号参照)、
[B-23.39] Formula (s3)
Figure JPOXMLDOC01-appb-C000111

A compound represented by (see WO 92/012970),
[b-23.40]式(s4)
Figure JPOXMLDOC01-appb-C000112

で表される化合物(国際公開第12/084812号参照)、
[B-23.40] Formula (s4)
Figure JPOXMLDOC01-appb-C000112

A compound represented by (see WO 12/084812),
[b-23.41]式(s5)
Figure JPOXMLDOC01-appb-C000113

で表される化合物(gougerotin)、
[B-23.41] Formula (s5)
Figure JPOXMLDOC01-appb-C000113

A compound represented by (gougerotin),
[b-23.42]式(s6)
Figure JPOXMLDOC01-appb-C000114

で表される化合物(ningnanmycin)、
[B-23.42] Formula (s6)
Figure JPOXMLDOC01-appb-C000114

A compound represented by (ningnanmycin),
[b-23.43]式(s7)
Figure JPOXMLDOC01-appb-C000115

で表される化合物(国際公開第10/136475号参照)、
[B-23.43] Formula (s7)
Figure JPOXMLDOC01-appb-C000115

A compound represented by (see WO 10/136475),
[b-23.44]式(s8)
Figure JPOXMLDOC01-appb-C000116

で表される化合物(国際公開第14/010737号参照)、
[B-23.44] Formula (s8)
Figure JPOXMLDOC01-appb-C000116

A compound represented by (see WO 14/010737),
[b-23.45]式(s9)
Figure JPOXMLDOC01-appb-C000117

で表される化合物(国際公開第11/085084号参照)、
[B-23.45] Formula (s9)
Figure JPOXMLDOC01-appb-C000117

A compound represented by (see WO 11/0805084),
[b-23.46]式(s10)
Figure JPOXMLDOC01-appb-C000118

で表される化合物(国際公開第11/137002号参照)、
[B-23.46] Formula (s10)
Figure JPOXMLDOC01-appb-C000118

A compound represented by (see WO 11/137002),
[b-23.47]式(s11)
Figure JPOXMLDOC01-appb-C000119

で表される化合物(国際公開第13/162072号参照)、
[B-23.47] Formula (s11)
Figure JPOXMLDOC01-appb-C000119

A compound represented by (see WO13 / 162072),
[b-23.48]式(s12)
Figure JPOXMLDOC01-appb-C000120

で表される化合物(国際公開第08/110313号参照)、
[B-23.48] Formula (s12)
Figure JPOXMLDOC01-appb-C000120

A compound represented by (see WO 08/110313),
[b-23.49]式(s13)
Figure JPOXMLDOC01-appb-C000121

で表される化合物(国際公開第09/156098号参照)、
[B-23.49] Formula (s13)
Figure JPOXMLDOC01-appb-C000121

A compound represented by (see WO09 / 156098),
[b-23.50]式(s14)
Figure JPOXMLDOC01-appb-C000122

で表される化合物(国際公開第12/025557号参照)、
[B-23.50] Formula (s14)
Figure JPOXMLDOC01-appb-C000122

A compound represented by (see WO 12/025557),
[b-23.51]式(s15)
Figure JPOXMLDOC01-appb-C000123

で表される化合物(国際公開第14/006945号参照)、
[B-23.51] Formula (s15)
Figure JPOXMLDOC01-appb-C000123

A compound represented by (see WO 14/006945),
[b-23.52]式(s16)
Figure JPOXMLDOC01-appb-C000124

[式中、A3は、水素原子、ハロゲン原子、C1~C6のアルキル基、C1~C6のハロアルキル基、またはシアノ基を表し、A4は、水素原子、C1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表す。]で表される化合物(国際公開第14/095675号参照)、
[B-23.52] Formula (s16)
Figure JPOXMLDOC01-appb-C000124

[Wherein, A3 represents a hydrogen atom, a halogen atom, a C1 to C6 alkyl group, a C1 to C6 haloalkyl group, or a cyano group, and A4 represents a hydrogen atom, a C1 to C6 alkyl group, or C1 to C6 It represents a haloalkyl group or a C3 to C8 cycloalkyl group. A compound represented by the formula] (see WO 14/105675),
[b-23.53]式(s17)
Figure JPOXMLDOC01-appb-C000125

[式中、m1は、0~3の整数を表し、A5およびA6は、それぞれ独立していて、ハロゲン原子、またはC1~C6のアルキル基を表し、A7およびA8は、それぞれ独立していて、ハロゲン原子、またはC1~C6のアルコキシ基を表し、m1が2以上の場合、2以上のA7は、それぞれ独立した置換基を表し、同一または異なっていてよい。]で表される化合物(国際公開第09/137538号、国際特許第09/137651号参照)、
[B-23.53] Formula (s17)
Figure JPOXMLDOC01-appb-C000125

[Wherein, m1 represents an integer of 0 to 3, A5 and A6 are each independently a halogen atom, or a C1-C6 alkyl group, and A7 and A8 are each independently, A halogen atom or a C1 to C6 alkoxy group is represented, and when m1 is 2 or more, two or more of A7 represent independent substituents and may be the same or different. A compound represented by (see WO09 / 137538, WO09 / 137651),
[b-23.54]式(s18)
Figure JPOXMLDOC01-appb-C000126

[式中、A9およびA10は、それぞれ独立していて、水素原子、またはハロゲン原子を表し、A11は、ハロゲン原子を表し、A12は、ハロゲン原子、またはC1~C6のアルキル基を表し、A13は、ハロゲン原子、シアノ基、C1~C6のアルキル基、またはC1~C6のアルコキシ基を表す。]で表される化合物(国際公開第12/031061号参照)、
[B-23.54] Formula (s18)
Figure JPOXMLDOC01-appb-C000126

[Wherein, A9 and A10 are each independently a hydrogen atom or a halogen atom, A11 is a halogen atom, A12 is a halogen atom, or a C1-C6 alkyl group, and A13 is And a halogen atom, a cyano group, a C1-C6 alkyl group, or a C1-C6 alkoxy group. A compound represented by (see WO 12/031061),
[b-23.55]式(s19)
Figure JPOXMLDOC01-appb-C000127

[式中、m2は、0~6の整数を表し、A14およびA15は、それぞれ独立していて、ハロゲン原子、シアノ基、またはC1~C6のアルキル基を表し、A16は、水素原子、ハロゲン原子、またはC1~C6のアルコキシ基を表し、A17は、ハロゲン原子、またはC1~C6のアルコキシ基を表し、m2が2以上の場合、2以上のA17は、それぞれ独立した置換基を表し、同一または異なっていてよい。]で表される化合物(国際公開第05/121104号参照)、
[B-23.55] Formula (s19)
Figure JPOXMLDOC01-appb-C000127

[Wherein, m2 represents an integer of 0 to 6, and A14 and A15 are each independently a halogen atom, a cyano group, or a C1-C6 alkyl group, and A16 is a hydrogen atom or a halogen atom Or a C1 to C6 alkoxy group, A17 represents a halogen atom or a C1 to C6 alkoxy group, and when m2 is 2 or more, two or more of A17 each represent an independent substituent, which are the same or It may be different. A compound represented by (see WO05 / 121104),
[b-23.56]式(s20)
Figure JPOXMLDOC01-appb-C000128

[式中、A18およびA19は、それぞれ独立していて、ハロゲン原子、シアノ基、またはC1~C6のアルキル基を表し、A20、A21およびA22は、それぞれ独立していて、水素原子、ハロゲン原子、またはC1~C6のアルコキシ基を表す。]で表される化合物(国際公開第07/066601号参照)、
[B-23.56] Formula (s20)
Figure JPOXMLDOC01-appb-C000128

[Wherein, A18 and A19 are each independently a halogen atom, a cyano group, or a C1-C6 alkyl group, and A20, A21 and A22 are each independently a hydrogen atom, a halogen atom, Or a C1 to C6 alkoxy group. A compound represented by (see WO07 / 066601),
[b-23.57]式(s21)
Figure JPOXMLDOC01-appb-C000129

[式中、A23およびA24は、それぞれ独立していて、水素原子、ハロゲン原子、C1~C6のアルキル基、またはC3~C8のシクロアルキル基を表し、Xは、酸素原子または硫黄原子を表す。]で表される化合物(国際公開第07/087906号、国際特許第09/016220号、国際特許第10/130767号参照)、
[B-23.57] Formula (s21)
Figure JPOXMLDOC01-appb-C000129

[Wherein, A23 and A24 each independently represent a hydrogen atom, a halogen atom, a C1-C6 alkyl group, or a C3-C8 cycloalkyl group, and X represents an oxygen atom or a sulfur atom. A compound represented by (see WO07 / 087906, WO09 / 016220, WO10 / 130767),
[b-23.58]式(s22)
Figure JPOXMLDOC01-appb-C000130

[式中、m3は、0~5の整数を表し、A25は、ハロゲン原子、C1~C6のアルキル基、C1~C6のハロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、またはC3~C8のシクロアルキル基を表し、m3が2以上の場合、2以上のA25は、それぞれ独立した置換基を表し、同一または異なっていてよい。]で表される化合物(国際公開第13/092224号参照)、
[B-23.58] Formula (s22)
Figure JPOXMLDOC01-appb-C000130

[Wherein, m3 represents an integer of 0 to 5, and A25 represents a halogen atom, a C1 to C6 alkyl group, a C1 to C6 haloalkyl group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, Or a C3 to C8 cycloalkyl group, and when m3 is 2 or more, two or more A25's each independently represent a substituent and may be the same or different. A compound represented by the formula (see WO 13/092224),
[b-23.59]式(s23)
Figure JPOXMLDOC01-appb-C000131

[式中、A26は、水素原子、またはハロゲン原子を表し、V1およびV2は、それぞれ独立していて、酸素原子、または硫黄原子を表す。]で表される化合物(国際公開第12/025450号参照)、
[B-23.59] Formula (s23)
Figure JPOXMLDOC01-appb-C000131

[Wherein, A26 represents a hydrogen atom or a halogen atom, and V1 and V2 are each independently an oxygen atom or a sulfur atom. A compound represented by the formula] (see WO 12/025450),
[b-23.60]式(s24)または式(s25)
Figure JPOXMLDOC01-appb-C000132

[式中、m4は、0~5の整数を表し、A27は、C1~C6のアルキル基を表し、A28は、ハロゲン原子、シアノ基、C1~C6のアルキル基、またはC1~C6のハロアルキル基を表し、m4が2以上の場合、2以上のA28は、それぞれ独立した置換基を表し、同一または異なっていてよく、A29は、C1~C6のアルキル基、C2~C6のアルケニル基、またはC3~C6のアルキニル基を表す。]で表される化合物(国際公開第13/037717号参照)、
[B-23.60] Formula (s24) or Formula (s25)
Figure JPOXMLDOC01-appb-C000132

[Wherein, m4 represents an integer of 0 to 5; A27 represents a C1 to C6 alkyl group; A28 represents a halogen atom, a cyano group, a C1 to C6 alkyl group, or a C1 to C6 haloalkyl group] And when m4 is 2 or more, two or more of A28 each independently represent a substituent, which may be the same or different, and A29 is a C1-C6 alkyl group, a C2-C6 alkenyl group, or C3 Represents an alkynyl group of -C6. A compound represented by the formula (see WO 13/037717),
[b-23.61]式(s26)または式(s27)
Figure JPOXMLDOC01-appb-C000133

[式中、m5は、0~5の整数を表し、A30は、C1~C6のアルキル基を表し、A31は、ハロゲン原子、シアノ基、C1~C6のアルキル基、またはC1~C6のハロアルキル基を表し、m5が2以上の場合、2以上のA31は、それぞれ独立した置換基を表し、同一または異なっていてよく、A32は、C1~C6のアルキル基、C2~C6のアルケニル基、またはC3~C6のアルキニル基を表す。]で表される化合物(国際公開第13/037717号参照)、
[B-23.61] Formula (s26) or Formula (s27)
Figure JPOXMLDOC01-appb-C000133

[Wherein, m5 represents an integer of 0 to 5, A30 represents a C1 to C6 alkyl group, and A31 represents a halogen atom, a cyano group, a C1 to C6 alkyl group, or a C1 to C6 haloalkyl group] And when m5 is 2 or more, two or more of A31 each independently represent a substituent, which may be the same or different, and A32 is a C1 to C6 alkyl group, a C2 to C6 alkenyl group, or C3 Represents an alkynyl group of -C6. A compound represented by the formula (see WO 13/037717),
[b-23.62]式(s28)
Figure JPOXMLDOC01-appb-C000134

[式中、A33、A34、A35およびA36は、それぞれ独立していて、水素原子、またはハロゲン原子を表し、A37は、水素原子、アセチル基、またはベンゾイル基を表す。]で表される化合物(国際公開第06/031631号、国際特許第10/069882号参照)、
[B-23.62] Formula (s28)
Figure JPOXMLDOC01-appb-C000134

[Wherein, A33, A34, A35, and A36 are each independently a hydrogen atom or a halogen atom, and A37 represents a hydrogen atom, an acetyl group, or a benzoyl group. A compound represented by (see WO06 / 031631 and WO10 / 069882),
[b-23.63]式(s29)
Figure JPOXMLDOC01-appb-C000135

[式中、A38は、C1~C6のアルキル基、またはC1~C6のハロアルキル基を表し、A39およびA40は、それぞれ独立していて、水素原子、またはハロゲン原子を表す。]で表される化合物(国際公開第14/043376号参照)、
[B-23.63] Formula (s29)
Figure JPOXMLDOC01-appb-C000135

[Wherein, A38 represents a C1 to C6 alkyl group, or a C1 to C6 haloalkyl group, and A39 and A40 each independently represent a hydrogen atom or a halogen atom. A compound represented by the formula (see WO 14/043376),
[b-23.64]式(s30)
Figure JPOXMLDOC01-appb-C000136

[式中、A41は、水素原子、水硫基(-SH)、チオシアン酸基(-SCN)、またはC1~C6のアルキルチオ基を表し、A42、A43、A44およびA45は、それぞれ独立していて、水素原子、またはハロゲン原子を表す。]で表される化合物(国際公開第09/077443号参照)、
[B-23.64] Formula (s30)
Figure JPOXMLDOC01-appb-C000136

[Wherein, A41 represents a hydrogen atom, a hydroxyl group (-SH), a thiocyanate group (-SCN), or a C1-C6 alkylthio group, and A42, A43, A44 and A45 are each independently , A hydrogen atom, or a halogen atom. A compound represented by the formula] (see WO09 / 077443),
[b-23.65]式(s31)または式(s32)
Figure JPOXMLDOC01-appb-C000137

[式中、A46は、水素原子、またはハロゲン原子を表し、A47は、C1~C6のアルキル基を表し、A48は、ハロゲン原子を表す。]で表される化合物(国際公開第11/070771号参照)、
[B-23.65] Formula (s31) or Formula (s32)
Figure JPOXMLDOC01-appb-C000137

[Wherein, A46 represents a hydrogen atom or a halogen atom, A47 represents a C1-C6 alkyl group, and A48 represents a halogen atom. A compound represented by (see WO 11/070771),
[b-23.66]式(s33)
Figure JPOXMLDOC01-appb-C000138

[式中、A49、A50およびA51は、それぞれ独立していて、水素原子、またはハロゲン原子を表す。]で表される化合物(国際公開第11/081174号参照)等が挙げられる。
[B-23.66] Formula (s33)
Figure JPOXMLDOC01-appb-C000138

[Wherein, A49, A50 and A51 are each independently a hydrogen atom or a halogen atom. And the like (see WO 11/081174) and the like.
 本発明化合物と混合して使用することができる殺虫剤に含まれる具体的な成分は、以下の群cで例示され、これらの塩、異性体およびN-オキシド体を含む。ただし、公知の殺虫剤はこれらに限定されるものではない。 Specific components included in the insecticide which can be used in combination with the compound of the present invention are exemplified in the following group c and include salts, isomers and N-oxides thereof. However, known insecticides are not limited to these.
群c:
c-1:カーバメート系アセチルコリンエステラーゼ(AChE)阻害剤
 カーバメート系アセチルコリンエステラーゼ(AChE)阻害剤として、[c-1.1]ホスホカルブ(phosphocarb)、[c-1.2]アラニカルブ(alanycarb)、[c-1.3]ブトカルボキシム(butocarboxim)、[c-1.4]ブトキシカルボキシム(butoxycarboxim)、[c-1.5]チオジカルブ(thiodicarb)、[c-1.6]チオファノックス(thiofanox)、[c-1.7]アルジカルブ(aldicarb)、[c-1.8]ベンジオカルブ(bendiocarb)、[c-1.9]ベンフラカルブ(benfuracarb)、[c-1.10]カルバリル(carbaryl)、[c-1.11]カルボフラン(carbofuran)、[c-1.12]カルボスルファン(carbosulfan)、[c-1.13]エチオフェンカルブ(ethiofencarb)、[c-1.14]フェノブカルブ(fenobucarb)、[c-1.15]ホルメタネート(formetanate)、[c-1.16]フラチオカルブ(furathiocarb)、[c-1.17]イソプロカルブ(isoprocarb)、[c-1.18]メチオカルブ(methiocarb)、[c-1.19]メソミル(methomyl)、[c-1.20]オキサミル(oxamyl)、[c-1.21]ピリミカルブ(pirimicarb)、[c-1.22]プロポキスル(propoxur)、[c-1.23]トリメタカルブ(trimethacarb)、[c-1.24]XMC(3,5-xylyl methylcarbamate)、[c-1.25]アリキシカルブ(allyxycarb)、[c-1.26]アルドキシカルブ(aldoxycarb)、[c-1.27]ブフェンカルブ(bufencarb)、[c-1.28]ブタカルブ(butacarb)、[c-1.29]カーバノレート(carbanolate)、[c-1.30]メトルカルブ(metolcarb)、[c-1.31]キシルイルカルブ(xylylcarb)、[c-1.32]フェノチオカルブ(fenothiocarb)、[c-1.33]キシリルカルブ(xylylcarb)、[c-1.34]ベンダイオカルブ(bendiocarb)等が挙げられる。
Group c:
c-1: Carbamate-based acetylcholine esterase (AChE) inhibitor [c-1.1] Phosphocarb (phosphocarb), [c-1.2] alanicarb (alycarb), [c -1.3] butocarboxim, [c-1.4] butoxycarboxim, [c-1.5] thiodicarb, [c- 1.6] thiophanox (thiofanox) ), [C-1.7] aldicarb (aldicarb), [c-1.8] bendiocarb, [c-1.9] benfuracarb (benfuracarb), [c-1.10] carbaryl (carbacarb) ryl), [c-1.11] carbofuran, [c-1.12] carbosulfan, [c-1.13] ethiophenecarb, [c-1.14] fenobucarb (c) fenobucarb), [c-1.15] formetanate, [c-1.16] furathiocarb, [c-1.17] isoprocarb, [c-1.18] methiocarb [C-1.19] mesomyl (methhomyl), [c-1. 20] oxamyl, [c-1. 21] pirimicarb (pirimicarb), [c-1. 22] propoxur, c-1.23] trimethacarb, [c-1. 24] XMC (3,5-xylyl methylcarbamate), [c-1. 25] allyxycarb, [c-1. 26] aldoxycarb (Aldoxycarb), [c-1.27] bufencarb, [c-1. 28] butacarb, [c-1. 29] carbanolate, [c-1. 30] metholcarb (metolcarb) ), [C-1.31] xylylcarb, [c-1. 32] phenothiocarb, [c-1. 33] xylylcarb, [c-1. 34] bendaceocarb bendiocarb), and the like.
c-2:有機リン系アセチルコリンエステラーゼ(AChE)阻害剤
 有機リン系アセチルコリンエステラーゼ(AChE)阻害剤として、[c-2.1]アセフェート(acephate)、[c-2.2]アザメチホス(azamethiphos)、[c-2.3]アジンホス-メチル(azinphos-methyl)、[c-2.4]アジンホス-エチル(azinphos-ethyl)、[c-2.5]エセフォン(ethephon)、[c-2.6]カズサホス(cadusafos)、[c-2.7]クロルエトキシホス(chlorethoxyfos)、[c-2.8]クロルフェンビンホス(chlorfenvinphos)、[c-2.9]クロルメホス(chlormephos)、[c-2.10]クロルピリホス(chlorpyrifos)、[c-2.11]クロルピリホス-メチル(chlorpyrifos-methyl)、[c-2.12]クマホス(coumaphos)、[c-2.13]シアノホス(cyanophos)、[c-2.14]デメトン-S-メチル(demeton-S-methyl)、[c-2.15]ダイアジノン(diazinon)、[c-2.16]ジクロフェンチオン(dichlofenthion)、[c-2.17]ジクロルボス(dichlorvos)、[c-2.18]ジクロトホス(dicrotophos)、[c-2.19]ジメトエート(dimethoate)、[c-2.20]ジメチルビンホス(dimethylvinphos)、[c-2.21]ジスルホトン(disulfoton)、[c-2.22]O-エチル O-4-ニトロフェニル フェニルホスホノチオアート(O-ethyl O-4-nitrophenyl phenylphosphonothioate)、[c-2.23]エチオン(ethion)、[c-2.24]エトプロホス(ethoprophos)、[c-2.25]ファムフール(famphur)、[c-2.26]フェナミホス(fenamiphos)、[c-2.27]フェニトロチオン(fenitrothion)、[c-2.28]フェンチオン(fenthion)、[c-2.29]ホスチアゼート(fosthiazate)、[c-2.30]ヘプテノホス(heptenophos)、[c-2.31]イソフェンホス-メチル(isofenphos-methyl)、[c-2.32]イソカルボホス(Isocarbophos)、[c-2.33]イソキサチオン(isoxathion)、[c-2.34]マラチオン(malathion)、[c-2.35]メカルバム(mecarbam)、[c-2.36]メタミドホス(methamidophos)、[c-2.37]メチダチオン(methidathion)、[c-2.38]メビンホス(mevinphos)、[c-2.39]モノクロトホス(monocrotophos)、[c-2.40]ナレッド(naled)、[c-2.41]オメトエート(omethoate)、[c-2.42]オキシデメトン-メチル(oxydemeton-methyl)、[c-2.43]パラチオン(parathions)、[c-2.44]パラチオン-メチル(parathion-methyl)、[c-2.45]フェントエート(phenthoate)、[c-2.46]ホレート(phorate)、[c-2.47]ホサロン(phosalone)、[c-2.48]ホスメット(phosmet)、[c-2.49]ホスファミドン(phosphamidon)、[c-2.50]ホキシム(phoxim)、[c-2.51]ピリミホス-メチル(pirimiphos-methyl)、[c-2.52]プロフェノホス(profenofos)、[c-2.53]プロペタンホス(propetamphos)、[c-2.54]プロチオホス(prothiofos)、[c-2.55]ピラクロホス(pyraclofos)、[c-2.56]ピリダフェンチオン(pyridaphenthion)、[c-2.57]キナルホス(quinalphos)、[c-2.58]スルホテップ(sulfotep)、[c-2.59]テブピリムホス(tebupirimfos)、[c-2.60]テメホス(temephos)、[c-2.61]テルブホス(terbufos)、[c-2.62]チオメトン(thiometon)、[c-2.63]トリアゾホス(triazophos)、[c-2.64]トリクロルホン(trichlorfon)、[c-2.65]バミドチオン(vamidothion)、[c-2.66]クロルチオン(chlorothion)、[c-2.67]ブロムフェンビンホス(bromfenvinfos)、[c-2.68]ブロモホス(bromophos)、[c-2.69]ブロモホス-エチル(bromophos-ethyl)、[c-2.70]ブタチオホス(butathiofos)、[c-2.71]カルボフェノチオン(carbophenothion)、[c-2.72]クロルホキシム(chlorphoxim)、[c-2.73]スルプロホス(sulprofos)、[c-2.74]ジアミダホス(diamidafos)、[c-2.75]テトラクロルビンホス(tetrachlorvinphos)、[c-2.76]プロパホス(propaphos)、[c-2.77]メスルフェンホス(mesulfenfos)、[c-2.78]ジオキサベンゾホス(dioxabenzofos)、[c-2.79]エトリムホス(etrimfos)、[c-2.80]オキシデプロホス(oxydeprofos)、[c-2.81]ホルモチオン(formothion)、[c-2.82]フェンスルホチオン(fensulfothion)、[c-2.83]イサゾホス(isazofos)、[c-2.84]イミシアホス(imicyafos)、[c-2.85]イサミドホス(isamidofos)、[c-2.86]チオナジン(thionazin)、[c-2.87]ホスチエタン(fosthietan)等が挙げられる。
c-2: Organophosphorus acetylcholine esterase (AChE) inhibitor [c-2.1] acephate, [c-2.2] azamethiphos (azamethiphos) as an organophosphorus acetylcholine esterase (AChE) inhibitor [C-2.3] Azinphos-methyl (azinphos-methyl), [c-2.4] Azinphos-ethyl (azinphos-ethyl), [c-2.5] Ethephon, [c-2.6] ] Cadusafos, [c-2.7] chlorethoxyphos (chlorethoxyfos), [c-2.8] chlorfenvinphos, [c-2.9] chlormephos, [c-] 2.10] Black Lupyrifos (chlorpyrifos), [c-2.11] chlorpyrifos-methyl (chlorpyrifos-methyl), [c-2.12] coumaphos (coumaphos), [c-2.13] cyanophos (cyanophos), [c-2. 14] Demeton-S-methyl (demeton-S-methyl), [c-2.15] diazinon, [c-2.16] diclofenthion, [c-2.17] dichlorvos (dichlorvos) [C-2.18] dicrotophos, [c-2.19] dimethoate, [c-2. 20] dimethylvinphos, [c-2.21] disulfo Ton (disulfoton), [c-2.22] O-ethyl O-4-nitrophenyl phenyl phosphonothioate, [c-2.23] ethion, [c-2 .22] c-2.24] ethoprophos (ethoprophos), [c-2.25] famhur (famphur), [c-2.26] fenamiphos (fenamiphos), [c-2.27] fenitrothion, [c- 2.28] fenthion, [c-2.29] phosthiazate, [c-2.30] heptenophos, heptenophos, [c-2.31] isofenphos-methyl isofenphos-methyl), [c-2.32] isocarbophos (Isocarbophos), [c-2.33] isoxathion, [c-2.34] malathion, [c-2.35] mecarbam (c) mecarbam), [c-2.36] methamidophos (methhamidophos), [c-2.37] methidathion, [c-2.38] mevinphos (mevinphos), [c-2.39] monocrotophos (monocrotophos) ), [C-2.40] naled (naled), [c-2.41] omethoate, [c-2.42] oxydemeton-methyl (oxydemeton-methyl), [c-2.4] Parathions, [c-2.44] parathion-methyl, [c-2.45] phenthoate, [c-2.46] phorate, [c-2] .47] Phosalone (phosalone), [c-2.48] phosmet (phosmet), [c-2.49] phosphamidon, [c-2.50] phoxim, [c-2.51] Pirimiphos-methyl, [c-2.52] profenofos, [c-2.53] propetanphos, [c-2.54] prothiophos, [c-2] .55] Pyraclofos, [c-2.56] pyridaphenthion, [c-2.57] quinalphos, [c-2.58] sulfotep, sulfotep, [c-2.59] tebupilimphos ( tebupirimfos), [c-2.60] temephos (temephos), [c-2.61] terbuphos (terbufos), [c-2.62] thiometon (thiometon), [c-2.63] triazophos (triazophos) [C-2.64] trichlorfon (tricholfon), [c-2.65] vamidothion, [c-2.66] chlorothion, [c-2.67] bromphene Nphoss (bromfenvinfos), [c-2.68] bromophos (bromophos), [c-2.69] bromophos-ethyl (bromophos-ethyl), [c-2.70] butathiophos (butathiofos), [c-2. 71] carbophenothion, [c-2.72] chlorphoxim, [c-2.73] sulprofos, [c-2.74] diamidafos, [c-2. 75] Tetrachlorvinphos (tetrachlorovinphos), [c-2.76] propaphos, [c-2.77] mesulfenphos, [c-2.78] dioxabenzo Dioxabenzofos, [c-2.79] etrimfos, [c-2.80] oxydeprofos, [c-2.81] formothione, [c-2.82] Fensulfothion (fensulfothion), [c-2.83] Isazophos (isazofos), [c-2.84] imicyafos (imicyafos), [c-2.85] Isamidophos (isamidofos), [c-2.86] Thionazine ( Thionazin), [c-2.87] fosthietan, etc. may be mentioned.
c-3:GABA作動性塩素イオンチャネルブロッカー
 GABA作動性塩素イオンチャネルブロッカーとして、[c-3.1]クロルデン(chlordane)、[c-3.2]エンドスルファン(endosulfan)、[c-3.3]リンデン(lindane)、[c-3.4]ジエノクロル(dienochlor)、[c-3.5]エチプロール(ethiprole)、[c-3.6]フィプロニル(fipronil)、[c-3.7]アセトプロール(acetoprole)等が挙げられる。
c-3: GABAergic Chloride Channel Blocker As a GABAergic Chloride Channel Blocker [c-3.1] chlordane (chlordane), [c-3.2] endosulfan (endosulfan), [c-3.3] Lindane, [c-3.4] dienochlor, [c- 3.5] ethiprole, [c-3.6] fipronil, [c-3.7] aceto There are aproe (acetoprole) and the like.
c-4:ナトリウムチャネルモジュレーター
 ナトリウムチャネルモジュレーターとして、[c-4.1]アクリナトリン(acrinathrin)、[c-4.2]アレスリン[(1R)-アイソマー](allethrin[(1R)-isomer])、[c-4.3]ビフェントリン(bifenthrin)、[c-4.4]ビオアレスリン(bioallethrin)、[c-4.5]ビオアレスリン S-シクロペンテニル アイソマー(bioallethrin S-cyclopentenyl isomer)、[c-4.6]ビオレスメトリン(bioresmethrin)、[c-4.7]シクロプロトリン(cycloprothrin)、[c-4.8]シフルトリン(cyfluthrin)、[c-4.9]ベータ-シフルトリン(beta-cyfluthrin)、[c-4.10]シハロトリン(cyhalothrin)、[c-4.11]ガンマ-シハロトリン(gamma-cyhalothrin)、[c-4.12]ラムダ-シハロトリン(lambda-cyhalothrin)、[c-4.13]シペルメトリン(cypermethrin)、[c-4.14]アルファ-シペルメトリン(alpha-cypermethrin)、[c-4.15]ベータ-シペルメトリン(beta-cypermethrin)、[c-4.16]セタ-シペルメトリン(theta-cypermethrin)、[c-4.17]ゼダ-シペルメトリン(zeta-cypermethrin)、[c-4.18]シフェノトリン[(1R)-トランス-アイソマー](cyphenothrin[(1R)-trans-isomer])、[c-4.19]デルタメトリン(deltamethrin)、[c-4.20]エンペントリン[(EZ)-(1R)-アイソマー](empenthrin[(EZ)-(1R)-isomer])、[c-4.21]エスフェンバレレート(esfenvalerate)、[c-4.22]エトフェンプロックス(ethofenprox)、[c-4.23]フェンプロパトリン(fenpropathrin)、[c-4.24]フェンバレレート(fenvalerate)、[c-4.25]フルシトリネート(flucythrinate)、[c-4.26]フルメトリン(flumethrin)、[c-4.27]タウ-フルバリネート(tau-fluvalinate)、[c-4.28]ハルフェンプロックス(halfenprox)、[c-4.29]イミプロトリン(imiprothrin)、[c-4.30]メトトリン(methothrin)、[c-4.31]メトフルトリン(metofluthrin)、[c-4.32]イプシロン-メトフルトリン(epsilon-metofluthrin)、[c-4.33]モンフルオロトリン(momfluorothrin)、[c-4.34]イプシロン-モンフルオロトリン(epsilon-momfluorothrin)、[c-4.35]ペルメトリン(permethrin)、[c-4.36]フェノトリン[(1R)-トランス-アイソマー](phenothrin[(1R)-trans-isomer])、[c-4.37]プラレトリン(prallethrin)、[c-4.38]レスメトリン(resmethrin)、[c-4.39]カデトリン(kadethrin)、[c-4.40]シラフルオフェン(silafluofen)、[c-4.41]テフルトリン(tefluthrin)、[c-4.42]テトラメトリン(tetramethrin)、[c-4.43]テトラメトリン[(1R)-アイソマー](tetramethrin[(1R)-isomer])、[c-4.44]トラロメトリン(tralomethrin)、[c-4.45]トランスフルトリン(transfluthrin)、[c-4.46]ZXI8901(3-(4-bromophenoxy)phenyl]-cyanomethyl 4-(difluoromethoxy)-α-(1-methylethyl)benzeneacetate)、[c-4.47]バイオペルメトリン(biopermethrin)、[c-4.48]フラメトリン(furamethrin)、[c-4.49]プロフルトリン(profluthrin)、[c-4.50]フルブロシトリネート(flubrocythrinate)、[c-4.51]ジメフルトリン(dimefluthrin)、[c-4.52]DDT(dichloro-diphenyl-trichloroethane)、[c-4.53]メトキシクロル(methoxychlor)、[c-4.54]フェノトリン(phenothrin)、[c-4.55]フルバリネート(fluvalinate)等が挙げられる。
c-4: Sodium channel modulator [c-4.1] acrinathrin (acrinathrin), [c-4.2] allethrin [(1R) -isomer] (allethrin [(1R) -isomer]), as a sodium channel modulator [C-4.3] bifenthrin, [c-4.4] bioallethrin, [c-4.5] bioallethrin, S-cyclopentenyl isomer, [c- 4.6] bioresmethrin (bioresmethrin), [c-4.7] cycloprothrin, [c-4.8] cyfluthrin, [c-4. Beta-cyfluthrin (beta-cyfluthrin), [c-4. 10] cyhalothrin (cyhalothrin), [c-4. 11] gamma-cyhalothrin (gamma-cyhalothrin), [c-4. 12] lambda-cyhalothrin (lambda) -Cyhalothrin), [c-4.13] cypermethrin (cypermethrin), [c-4. 14] alpha-cypermethrin (alpha-cypermethrin), [c-4. 15] beta-cypermethrin (beta-cypermethrin) [C-4.16] theta-cypermethrin (theta-cypermethrin), [c-4. 17] zeda-cypermethrin (zeta-cypermethrin), [c-4. 18] cifeno Trin [(1R) -trans-isomer] (cyphenothrin [(1R) -trans-isomer]), [c-4.19] deltamethrin (deltamethrin), [c-4.20] enpentrin [(EZ)-(1R )-Isomer] (empenthrin [(EZ)-(1R)-isomer]), [c-4.21] esfenvalerate, [c-4.22] ethofenprox, [c- 4.23] fenpropathrin, [c-4.24] fenvalerate, [c-4. 25] flucythrinate, [c-4. 26] flumethrin (flumethrin) [C-4.27] Tau-fluvalinate (tau-fluvalinate), [c-4. 28] halfenprox (halfenprox), [c-4. 29] imiprothrin (imiprothrin), [c-4. 30] ] Methothrin (methothrin), [c-4.31] methofluthrin (metofluthrin), [c-4. 32] epsilon-methofluthrin (epsilon-metofluthrin), [c-4. 33] monfluorothrin (momfluorothrin), [c] -4.34] epsilon-monfluorothrin (epsilon-momfluorothrin), [c-4.35] permethrin, [c-4.36] phenothrin [(1R) -trans-a] [Somer] (phenothrin [(1R) -trans-isomer]), [c-4.37] prarethrin, [c-4. 38] resmethrin, [c-4. 39] kadethrin [C-4.40] silafluofen (silafluofen), [c-4. 41] tefluthrin (tefluthrin), [c-4. 42] tetramethrin (tetramethrin), [c-4. 43] tetramethrin [(1 R)- Isomers] (tetramethrin [(1R) -isomer]), [c-4.44] tralomethrin, [c-4. 45] transfluthrin, [c-4. 46] ZXI8 901 (3- (4-bromophenoxy) phenyl] -cyanomethyl 4- (difluoromethoxy) -α- (1-methylethyl) benzeneacetate), [c-4.47] biopermethrin (biopermethrin), [c-4.48] framethrin (Furamethrin), [c-4.49] profluthrin (profluthrin), [c-4. 50] flubrocythrinate, [c- 4.51] dimefluthrin, [c- 4.52] DDT (dichloro-diphenyl-trichloroethane), [c-4.53] methoxychloro, [c-4. 4] phenothrin (phenothrin), and the like [c-4.55] fluvalinate (fluvalinate).
c-5:ニコチン性アセチルコリン受容体(nAChR)競合的モジュレーター
 ニコチン性アセチルコリン受容体(nAChR)競合的モジュレーターとして、[c-5.1]アセタミプリド(acetamiprid)、[c-5.2]クロチアニジン(clothianidin)、[c-5.3]ジノテフラン(dinotefuran)、[c-5.4]イミダクロプリド(imidacloprid)、[c-5.5]ニテンピラム(nitenpyram)、[c-5.6]チアクロプリド(thiacloprid)、[c-5.7]チアメトキサム(thiamethoxam)、[c-5.8]ニコチン(nicotine)、[c-5.9]硫酸ニコチン(nicotine sulfate)、[c-5.10]スルホキサフロル(sulfoxaflor)、[c-5.11]フルピラジフロン(flupyradifurone)、[c-5.12]トリフルメゾピリム(triflumezopyrim)等が挙げられる。
c-5: Nicotinic acetylcholine receptor (nAChR) competitive modulator As a nicotinic acetylcholine receptor (nAChR) competitive modulator, [c-5.1] acetamiprid (acetamiprid), [c-5.2] clothianidin (clothianidin) ), [C-5.3] dinotefuran, [c-5.4] imidacloprid (imidacloprid), [c-5.5] nitenpyram (nitenpyram), [c-5.6] thiacloprid, [C-5.7] Thiamethoxam, [c-5.8] Nicotine (nicotine), [c-5.9] Nicotine Sulfate, [c-5. 10] Sul Kisafuroru (sulfoxaflor), [c-5.11] Furupirajifuron (flupyradifurone), and the like [c-5.12] triflupromazine meso pyridinium beam (triflumezopyrim).
c-6:ニコチン性アセチルコリン受容体(nAChR)アロステリックモジュレーター
 ニコチン性アセチルコリン受容体(nAChR)アロステリックモジュレーターとして、[c-6.1]スピノサド(spinosad)、[c-6.2]スピネトラム(spinetoram)等が挙げられる。
c-6: Nicotinic acetylcholine receptor (nAChR) allosteric modulator As a nicotinic acetylcholine receptor (nAChR) allosteric modulator, [c-6.1] spinosad (spinosad), [c-6.2] spinetram (spinetram), etc. Can be mentioned.
c-7:グルタミン酸作動性塩素イオンチャネル(GluCl)アロステリックモジュレーター
 グルタミン酸作動性塩素イオンチャネル(GluCl)アロステリックモジュレーターとして、[c-7.1]アバメクチン(abamectin)、[c-7.2]エマメクチン安息香酸塩(emamectin benzoate)、[c-7.3]レピメクチン(lepimectin)、[c-7.4]ミルベメクチン(milbemectin)等が挙げられる。
c-7: Glutamatergic Chloride Channel (GluCl) Allosteric Modulator As a glutamatergic Chloride Channel (GluCl) allosteric modulator, [c-7.1] Abamectin (abamectin), [c-7.2] emamectin benzoate Salts (emamectin benzoate), [c-7.3] lepimectin (lepimectin), [c-7.4] milbemectin, etc. may be mentioned.
c-8:幼若ホルモン類似剤
 幼若ホルモン類似剤として、[c-8.1]ヒドロプレン(hydroprene)、[c-8.2]キノプレン(kinoprene)、[c-8.3]メトプレン(methoprene)、[c-8.4]フェノキシカルブ(fenoxycarb)、[c-8.5]ピリプロキシフェン(pyriproxyfen)等が挙げられる。
c-8: Juvenile hormone analogues As juvenile hormone analogues, [c-8.1] hydroprene (hydroprene), [c-8.2] quinoprene (kinoprene), [c-8.3] methoprene (methoprene) , [C-8.4] phenoxycarb, [c-8.5] pyriproxyfen, and the like.
c-9:非特異的(マルチサイト)阻害剤
 非特異的(マルチサイト)阻害剤として、[c-9.1]臭化メチル(methyl bromide)、[c-9.2]クロルピクリン(chloropicrin)、[c-9.3]クリオライト(cryolite)、[c-9.4]フッ化スルフリル(sulfuryl fluoride)、[c-9.5]ホウ砂(borax)、[c-9.6]ホウ酸(boric acid)、[c-9.7]オクタホウ酸ニナトリウム塩(disodium octaborate)、[c-9.8]メタホウ酸ナトリウム塩(sodium metaborate)[c-9.9]吐酒石(tartar emetic)、[c-9.10]ダゾメット(dazomet)、[c-9.11]メタム(metam)、[c-9.12]カーバムナトリウム塩(metham sodium)等が挙げられる。
c-9: Nonspecific (multisite) inhibitor [c-9.1] methyl bromide, [c-9.2] chlorpicrin as nonspecific (multisite) inhibitor [C-9.3] cryolite, [c-9.4] sulfuryl fluoride, [c-9.5] borax (borax), [c-9.6] borax Acid (boric acid), [c-9.7] octaborate disodium salt (disodium octaborate), [c-9.8] metaborate sodium salt (sodium metabolite) [c-9.9] emetic), [c-9.10] dazomet, [c-9.11] metam (m et al., [c-9.12] carbam sodium salt (metham sodium) and the like.
c-10:弦音器官TRPVチャネルモジュレーター
 弦音器官TRPVチャネルモジュレーターとして、[c-10.1]ピメトロジン(pymetrozine)、[c-10.2]ピリフルキナゾン(pyrifluquinazon)等が挙げられる。
c-10: Chord Organ TRPV Channel Modulator [c-10.1] pymetrozine, [c-10.2] pyrifluquinazon, etc. may be mentioned as a chord organ TRPV channel modulator.
c-11:ダニ類成長阻害剤
 ダニ類成長阻害剤として、[c-11.1]クロフェンテジン(clofentezine)、[c-11.2]ジフロビダジン(diflovidazin)、[c-11.3]ヘキシチアゾクス(hexythiazox)、[c-11.4]エトキサゾール(etoxazole)等が挙げられる。
c-11: Acaride growth inhibitor As acaricide growth inhibitor, [c-11. 1] clofenthezine, [c-1 11. 2] diflovidazine, [c-11. 3] hexethiazox (Hexythiazox), [c-11.4] etoxazole, and the like.
c-12:ミトコンドリアATP合成酵素阻害剤
 ミトコンドリアATP合成酵素阻害剤として、[c-12.1]ジアフェンチウロン(diafenthiuron)、[c-12.2]アゾシクロチン(azocyclotin)、[c-12.3]シヘキサチン(cyhexatin)、[c-12.4]フェンブタチンオキシド(fenbutatin oxide)、「c-12.5」プロパルギット(propargite)、「c-12.6」テトラジホン(tetradifon)等が挙げられる。
c-12: Mitochondrial ATP synthetase inhibitor [c-12.1] diafenthiuron as a mitochondrial ATP synthetase inhibitor, [c-12. 2] azocyclotin (azocyclotin), [c-12. 3] Cyhexatin (cyhexatin), [c-12. 4] fenbutatin oxide, "c-12.5" propargite, "c-12.6" tetradifon, etc. .
c-13:プロトン勾配を撹乱する酸化的リン酸化脱共役剤
 プロトン勾配を撹乱する酸化的リン酸化脱共役剤として、[c-13.1]クロルフェナピル(chlorfenapyl)、[c-13.2]DNOC(dinitro-ortho-cresol)、[c-13.3]ビナパクリル(binapacryl)、[c-13.4]スルフルラミド(sulfluramid)等が挙げられる。
c-13: Oxidative phosphorylation uncoupling agent perturbing a proton gradient [c-13.1] chlorfenapyr (chlorfenapyl), [c-13.2] DNOC as an oxidative phosphorylation uncoupling agent disrupting a proton gradient (Dintro-ortho-cresol), [c-13.3] binapacryl, [c-13.4] sulfluramid, and the like.
c-14:ニコチン性アセチルコリン受容体(nAChR)チャネルブロッカー
 ニコチン性アセチルコリン受容体(nAChR)チャネルブロッカーとして、[c-14.1]ベンスルタップ(bensultap)、[c-14.2]カルタップ塩酸塩(cartap hydrochloride)、[c-14.3]チオシクラム(thiocyclam)、[c-14.4]モノスルタップ(monosultap)等が挙げられる。
c-14: Nicotinic acetylcholine receptor (nAChR) channel blocker [c-14.1] bensultap (bensultap), [c-14.2] cartap hydrochloride (cartap) as a nicotinic acetylcholine receptor (nAChR) channel blocker and [c-14.3] thiocyclam (thiocyclam), [c-14.4] monosultap, and the like.
c-15:キチン生合成阻害剤タイプ0
 キチン生合成阻害剤タイプ0として、[c-15.1]ビストリフルロン(bistrifluron)、[c-15.2]クロルフルアズロン(chlorfluazuron)、[c-15.3]ジフルベンズロン(diflubenzuron)、[c-15.4]フルシクロクスロン(flucycloxuron)、[c-15.5]フルフェノクスロン(flufenoxuron)、[c-15.6]ヘキサフルムロン(hexaflumuron)、[c-15.7]ルフェヌロン(lufenuron)、[c-15.8]ノバルロン(novaluron)、[c-15.9]ノビフルムロン(noviflumuron)、[c-15.10]テフルベンズロン(teflubenzuron)、[c-15.11]トリフルムロン(triflumuron)等が挙げられる。
c-15: Chitin biosynthesis inhibitor type 0
As chitin biosynthesis inhibitor type 0, [c-15. 1] bistrifluron (bistrifluron), [c-15. 2] chlorfluazuron (chlorfluazuron), [c-15. 3] diflubenzuron (diflubenzuron), [C-15.4] flucycloxuron, [c-15.5] flufenoxuron, [c-15.6] hexaflumuron, [c-15.7] Lufenuron, [c-15.8] novarron, [c-15.9] noviflumuron, [c-15. 10] teflubenzuron, [c-15. 11] Rifurumuron (triflumuron), and the like.
c-16:キチン生合成阻害剤タイプ1
 キチン生合成阻害剤タイプ1として、[c-16.1]ブプロフェジン(buprofezin)等が挙げられる。
c-16: Chitin biosynthesis inhibitor type 1
Examples of chitin biosynthesis inhibitor type 1 include [c-16. 1] buprofezin and the like.
c-17:ハエ目昆虫脱皮阻害剤
 ハエ目昆虫脱皮阻害剤として、[c-17.1]シロマジン(cyromazine)等が挙げられる。
c-17: Fly order insect molting inhibitor [c-17. 1] cyromazine etc. is mentioned as a fly order insect molting inhibitor.
c-18:脱皮ホルモン(エクダイソン)受容体アゴニスト
 脱皮ホルモン(エクダイソン)受容体アゴニストとして、[c-18.1]クロマフェノジド(chromafenozide)、[c-18.2]ハロフェノジド(halofenozide)、[c-18.3]メトキシフェノジド(methoxyfenozide)、[c-18.4]テブフェノジド(tebufenozide)等が挙げられる。
c-18: molting hormone (ecdysone) receptor agonist As molting hormone (ecdysone) receptor agonist, [c-18.1] chromafenozide, [c-18. 2] halofenozide, [c-18 .3] methoxyfenozide, [c-18.4] tebufenozide, etc. may be mentioned.
c-19:オクトパミン受容体アゴニスト
 オクトパミン受容体アゴニストとして、[c-19.1]アミトラズ(amitraz)等が挙げられる。
c-19: Octopamine Receptor Agonist [c-19. 1] amitraz etc. may be mentioned as an octopamine receptor agonist.
c-20:ミトコンドリア電子伝達系複合体III阻害剤
 ミトコンドリア電子伝達系複合体III阻害剤として、[c-20.1]ヒドラメチルノン(hydramethylnon)、[c-20.2]アセキノシル(acequinocyl)、[c-20.3]フルアクリピリム(fluacrypyrim)、[c-20.4]ビフェナゼート(bifenazate)等が挙げられる。
c-20: mitochondrial electron transport complex III inhibitor [c-20.1] hydramethylnon (hydramethylnon), [c-20.2] acequinocyl as a mitochondrial electron transport complex III inhibitor [C-20.3] Fluacrypyrim, [c-20.4] bifenazate, etc. may be mentioned.
c-21:ミトコンドリア電子伝達系複合体I阻害剤(METI)
 ミトコンドリア電子伝達系複合体I阻害剤(METI)として、[c-21.1]フェナザキン(fenazaquin)、[c-21.2]フェンピロキシメート(fenpyroximate)、[c-21.3]ピリダベン(pyridaben)、[c-21.4]ピリミジフェン(pylimidifen)、[c-21.5]テブフェンピラド(tebufenpyrad)、[c-21.6]トルフェンピラド(tolfenpyrad)、[c-21.7]ロテノン(rotenone)等が挙げられる。
c-21: Mitochondrial electron transport complex I inhibitor (METI)
[C-21.1] fenazaquin, [c-21.2] fenpyroximate, [c-21.3] pyridaben, as mitochondrial electron transfer complex I inhibitor (METI), [C-21.4] pirimidifene (pylimdifen), [c-21.5] tebufenpyrad (tebufenpyrad), [c-21.6] tolfenpyrad (tolfenpyrad), [c-21.7] rotenone etc. Be
c-22:電位依存性ナトリウムチャネルブロッカー
 電位依存性ナトリウムチャネルブロッカーとして、[c-22.1]インドキサカルブ(indoxacarb)、[c-22.2]メタフルミゾン(metaflumizone)等が挙げられる。
c-22: Voltage-gated sodium channel blocker Examples of voltage-gated sodium channel blockers include [c-22.1] indoxacarb, [c-22.2] metaflumizone, and the like.
c-23:アセチルCoAカルボキシラーゼ阻害剤
 アセチルCoAカルボキシラーゼ阻害剤として、[c-23.1]スピロジクロフェン(spirodiclofen)、[c-23.2]スピロメシフェン(spiromesifen)、[c-23.3]スピロテトラマト(spirotetramat)等が挙げられる。
c-23: Acetyl-CoA carboxylase inhibitor As an acetyl-CoA carboxylase inhibitor, [c-23. 1] spirodiclofen (spirodiclofen), [c-23. 2] spiromesifen, [c-23.3] ] Spirotetramat (spirotetramat) etc. are mentioned.
c-24:ミトコンドリア電子伝達系複合体IV阻害剤
 ミトコンドリア電子伝達系複合体IV阻害剤として、[c-24.1]リン化アルミニウム(aluminum phosphide)、[c-24.2]リン化カルシウム(calcium phosphide)、[c-24.3]リン化水素(phosphine)、[c-24.4]リン化亜鉛(zinc phosphide)、[c-24.5]シアン化カルシウム(calcium cyanide)、[c-24.6]シアン化ナトリウム(potassium cyanide)、[c-24.7]シアン化カリウム(sodium cyanide)等が挙げられる。
c-24: Mitochondrial electron transport complex IV inhibitor As a mitochondrial electron transport complex IV inhibitor, [c-24. 1] aluminum phosphide, [c-24.2] calcium phosphide calcium phosphide, [c-24.3] hydrogen phosphide, [c-24.4] zinc phosphide, [c-24.5] calcium cyanide, [c-24.5] -24.6] sodium cyanide (potassium cyanide), [c-24.7] potassium cyanide (sodium cyanide) and the like.
c-25:ミトコンドリア電子伝達系複合体II阻害剤
 ミトコンドリア電子伝達系複合体II阻害剤として、[c-25.1]シエノピラフェン(cyenopyrafen)、[c-25.2]シフルメトフェン(cyflumetofen)、[c-25.3]ピフルブミド(pyflubumide)等が挙げられる。
 
c-25: Mitochondrial electron transport complex II inhibitor As a mitochondrial electron transport complex II inhibitor, [c-25.1] cyenopyraphen (cyenopyrafen), [c-25.2] cyflumethofen (cyflumetofen), [c -25.3] pyflubumide etc. are mentioned.
c-26:リアノジン受容体モジュレーター
 リアノジン受容体モジュレーターとして、[c-26.1]クロラントラニリプロール(chlorantraniliprole)、[c-26.2]シアントラニリプロール(cyantraniliprole)、[c-26.3]フルベンジアミド(flubendiamide)等が挙げられる。
c-26: Ryanodine receptor modulator [c-26.1] Chlorantraniliprole (chlororantrilipole) as a ryanodine receptor modulator, [c-26.2] cyantraniliriprole (cyantraniliprole), [c-26. 3) Flubendiamide etc. are mentioned.
c-27:標的部位未特定の弦音器官モジュレーター
 標的部位未特定の弦音器官モジュレーターとして、[c-27.1]フロニカミド(flonicamid)等が挙げられる。
c-27: Chord organelle modulator with non-specified target site As a chord organ organ modulator with non-specified target region, [c-27.1] flonicamide and the like can be mentioned.
c-28:その他の殺虫剤
 その他の殺虫剤として、[c-28.1]アザジラクチン(azadirachtin)、[c-28.2]ベンゾキシメート(benzoximate)、[c-28.3]フェニソブロモレート(phenisobromolate)、[c-28.4]キノメチオナート(chinomethionat)、[c-28.5]ジコホル(dicofol)、[c-28.6]ピリダリル(pyridalyl)、[c-28.7]ブロモプロピレート(bromopropylate)、[c-28.8]トリアザメート(triazamate)、[c-28.9]ジシクラニル(dicyclanil)、[c-28.10]ジノブトン(dinobuton)、[c-28.11]ジノカップ(dinocap)、[c-28.12]シアン化水素(hydrogen cyanide)、[c-28.13]ヨウ化メチル(methyl iodide)、[c-28.14]カランジン(karanjin)、[c-28.15]塩化水銀(mercury chloride)、[c-28.16]メチルイソチオシアネート(methyl isothiocyanate)、[c-28.17]ペンタクロロフェノール(pentachlorophenol)、[c-28.18]ホスフィン(phosphine)、[c-28.19]ピペロニル ブトキシド(piperonyl butoxide)、[c-28.20]ポリナクチン複合体(polynactins)、[c-28.21]サバディラ(sabadilla)、[c-28.22]スルコフロン塩(スルコフロン-ナトリウム(sulcofuron-sodium))、[c-28.23]トリブホス(tribufos)、[c-28.24]アルドリン(aldrin)、[c-28.25]アミジチオオン(amidithion)、[c-28.26]アミドチオエート(amidothioate)、[c-28.27]アミノカルブ(aminocarb)、[c-28.28]アミトン(amiton)、[c-28.29]アラマイト(aramite)、[c-28.30]アチダチオン(athidathion)、[c-28.31]アゾトエート(azothoate)、[c-28.32]ポリスルフィドバリウム(barium polysulphide)、[c-28.33]ベンクロチアズ(benclothiaz)、[c-28.34]5-(1,3-ベンゾジオキソール-5-イル)-3-ヘキシルシクロヘキサ-2-エノン(5-(1,3-benzodioxole-5-yl)-3-hexylcyclohexa-2-enone)、[c-28.35]1,1-ビス(4-クロロフェニル)-2-エトキシエタノール(1,1-bis(4-chlorophenyl)-2-ethoxyethanol)、[c-28.36]ブトネート(butonate)、[c-28.37]ブトピロノキシル(butopyronoxyl)、[c-28.38]2-(2-ブトキシエトキシ)エチル チオシアナート(2-(2-butoxyethoxy)ethyl thiocyanate)、[c-28.39]カンフェクロル(camphechlor)、[c-28.40]クロルベンシド(chlorbenside)、[c-28.41]クロルデコン(chlordecone)、[c-28.42]クロルジメホルム(chlordimeform)、[c-28.43]クロルフェネトール(chlorfenethol)、[c-28.44]クロルフェンソン(chlorfenson)、[c-28.45]フルアズロン(fluazuron)、[c-28.46]メタアルデヒド(metaldehyde)、[c-28.47]ビアラホス(bialaphos)、[c-28.48]塩酸レバミゾール(levamisol)、[c-28.49]アミドフルメト(amidoflumet)、[c-28.50]ピラフルプロール(pyrafluprole)、[c-28.51]ピリプロール(pyriprole)、[c-28.52]トラロピリル(tralopyril)、[c-28.53]フルピラゾフォス(flupyrazofos)、[c-28.54]ジオフェノラン(diofenolan)、[c-28.55]クロルベンジレート(chlorobenzilate)、[c-28.56]フルフェンジン(flufenzine)、[c-28.57]ベンゾメート(benzomate)、[c-28.58]フルフェネリム(flufenerim)、[c-28.59]アルベンダゾール(albendazole)、[c-28.60]オキシベンダゾール(oxibendazole)、[c-28.61]フェンベンダゾール(fenbendazole)、[c-28.62]メタム・ナトリウム(metam-sodium)、[c-28.63]1,3-ジクロロプロペン(1,3-dichloropropene)、[c-28.64]フロメトキン(flometoquin)、[c-28.65]シクラニリプロール(cyclaniliprole)、[c-28.66]テトラニリプロール(tetraniliprole)、[c-28.67]ブロフラニリド(broflanilide)、[c-28.68]ジクロロメゾチアズ(dicloromezotiaz)、[c-28.69]エチレンジブロマイド(ethylene dibromide)、[c-28.70]アクリロニトリル(acrylonitrile)、[c-28.71]ビス(2-クロロエチル)エーテル(bis(2-chloroethyl)ether)、[c-28.72]1-ブロモ-2-クロロエタン(1-bromo-2-chloroethane)、[c-28.73]3-ブロモ-1-クロロプロパ-1-エン(3-bromo-1-chloroprop-1-ene)、[c-28.74]ブロモシクレン(bromocyclen)、[c-28.75]二硫化炭素(carbon disulfide)、[c-28.76]四塩化炭素(tetrachloromethane)、[c-28.77]ネマデクチン(nemadectin)、[c-28.78]シミアゾール(cymiazole)[c-28.79]カルシウム ポリスルフィド(calcium polysulfide)、[c-28.80]サイトカイニン(cytokinin)、[c-28.81]2-(オクチルチオ)エタノール、[c-28.82]オレイン酸カリウム(potassium oleate)、[c-28.83]オレイン酸ナトリウム(sodium oleate)、[c-28.84]マシン油(machine oil)、[c-28.85]タール油(tar oil)、[c-28.86]アナバシン(anabasine)、[c-28.87]酒石酸モランテル(morantel tartrate)、[c-28.88]除虫菊(ピレトリン(pyrethrum))、[c-28.89]ナタネ油(rape seed oil)、[c-28.90]ダイズレチシン(soybean lecithin)、[c-28.91]デンプン(starch)、[c-28.92]ヒドロキシプロピルデンプン(hydroxypropylstarch)、[c-28.93]脂肪酸グリセリド(decanoyloctanoylglycerol)、[c-28.94]プロピレングリコールモノ脂肪酸エステル(propylene glycol fatty acid ester)、[c-28.95]ケイソウ土(diatomite)、[c-28.96]アフォキソラネル(afoxolaner)、[c-28.97]フルアザインドリジン(fluazaindolizine)、[c-28.98]アフィドピロペン(afidopyropen)、[c-28.99]シハロジアミド(cyhalodiamide)、[c-28.100]チオキサザフェン(tioxazafen)、[c-28.101]フルヘキサフォン(fluhexafon)、[c-28.102]フルララネル(fluralaner)、[c-28.103]フルキサメタミド(fluxametamide)、[c-28.104]テトラクロラントラニリプロール(tetrachlorantraniliprole)、[c-28.105]サロラネル(sarolaner)、[c-28.106]ロチラネル(lotilaner)、[c-28.107]シクロキサプリド(cycloxaprid)、[c-28.108]フルエンスルホン(fluensulfone)、[c-28.109]TPIC(tripropyl isocyanurate)、[c-28.110]D-D(1,3-Dichloropropene)、[c-28.111]ペルオキソカルボナート(peroxocarbonate)、[c-28.112]MB-599(verbutin)、[c-28.113]ビス(2,3,3,3-テトラクロロプロピル)エーテル(bis(2,3,3,3-tetrachloropropyl)ether)、[c-28.114]DCIP(bis(2-chloro-1-methylethyl)ether)、[c-28.115]ENT-8184(N-(2-Ethylhexyl)bicyclo[2.2.1]hept-5-ene-2,3-dicarboximide)、[c-28.116]Bayer 22408(O,O-diethyl O-naphthalimido phosphorothioate)、[c-28.117]Bayer 32394(tris(1-dodecyl-3-methyl-2-phenylbenzimidazolium)hexacyanoferrate)、
c-28: Other insecticides As another insecticide, [c-28.1] azadirachtin (azadirachtin), [c-28.2] benzoximate, [c-28.3] phenisobromo (Phenisobromolate), [c-28.4] quinomethionate, [c-28.5] dicofol, [c-28.6] pyridalyl, [c-28.7] bromopropi Rate (bromopropylate), [c-28.8] triazamate, [c-28.9] dicyclanil, [c-28. 10] dinobuton, di [c-28.11] dinocup din ocap), [c-28.12] hydrogen cyanide, [c-28. 13] methyl iodide, [c-28. 14] karanjin, [c-28. 15] Mercury chloride (mercury chloride), [c-28.16] methyl isothiocyanate, [c-28.17] pentachlorophenol, [c-28.18] phosphine (phophine), [c] -28.19] Piperonyl butoxide, [c-28.20] polynactin complex (polynactins), [c-28.21] Sabadilla (sabadilla) [C-28.22] sulcofron salt (sulcofuron-sodium), [c-28.23] tribufos (tribufos), [c-28.24] aldrin, [c-28.25] Amidithione, [c-28.26] amidothioate, [c-28.27] aminocarb, [c-28.28] amitone, [c-28. 29] Aramite, [c-28.30] athidathion, [c-28.31] azotoate, [c-28.32] polysulfide barium, [c- 28.30] 8.33] benclothiaz, [c-28.34] 5- (1,3-benzodioxol-5-yl) -3-hexylcyclohex-2-enone (5- (1,3- (1,3-benzodioxol-5-yl)) benzodioxole-5-yl) -3-hexylcyclohexa-2-enone), [c-28.35] 1,1-bis (4-chlorophenyl) -2-ethoxyethanol (1,1-bis (4-chlorophenyl)-) 2-ethoxyethanol), [c-28.36] butonate, [c-28.37] butopyronoxyl, [c-28. 38] 2- (2-butoxyethoxy) ethyl thiocyanate (2- (c) 2-Butoxyethoxy) ethyl thiocyan ate, [c-28.39] camphechlor, [c-28.40] chlorbenside (chlorbenside), [c-28.41] chlordecone (chlordecone), [c-28.42] chlordimeform (chlordimeform) , [C-28.43] chlorphenethol (chlorfenethol), [c-28.44] chlorfenson (chlorfenson), [c-28.45] fluazuron, [c-28.46] methaldehyde (Metaldehyde), [c-28.47] bialaphos (bialaphos), [c-28.48] levamisole hydrochloride (levasol), [c-28.49] amidoflumet (amidofluto) [C-28.50] pyrafluprole, [c-28.51] pyriprole, [c-28.52] tralopyril, [c-28.53] flupyrazophos [C-28.54] diofenolan, [c-28.55] chlorobenzilate, [c-28.56] flufenzine, [c-28.57] benzomate [C-28.58] flufenerim, [c-28.59] albendazole, alcendazole, [c-28. 60] oxybendazole (oxibendazole) [C-28.61] fenbendazole (fenbendazole), [c-28.62] metam sodium (metam-sodium), [c-28. 63] 1,3-dichloropropene (1,3-dichloropropene ), [C-28.64] flomethoquin (flometoquin), [c-28.65] cyclaniliprol (cycliciliprole), [c-28.66] tetraniriprole (tetraniliprole), [c-28.67] Brofuranilide, [c-28.68] Dichloromezotiaz, [c-28.69] Ethylene dibromide, [c-28. 70] Acrylonitrile acrylonitrile, [c-28.71] bis (2-chloroethyl) ether, [c-28.72] 1-bromo-2-chloroethane [C-28.73] 3-bromo-1-chloroprop-1-ene, [c-28.74] bromocyclen, [c-28. 75] Carbon disulfide, [c-28.76] carbon tetrachloride (tetrachloromethane), [c-28.77] nemadectin, [c-28.78] simiazole (cymiazole) [c- 28.79] Calcium polysulfide (calcium polysulfide), [c-28.80] cytokinin (cytokinin), [c-28.81] 2- (octylthio) ethanol, [c-28.82] potassium oleate (potassium oleate), [c -28.83] sodium oleate, [c-28.84] machine oil, [c-28.85] tar oil, [c-28.86] anabacin (c anabasine), [c-28.87] morantel tartrate, [c-28.88] pyrethrum (pyrethrum), [c-28.89] rapeseed oil, [c- 28.90 ] Soy reticin (soybean lecithin), [c-28.91] starch (starch), [c-28.92] hydroxypropyl starch (hydroxypropyl starch), [c-28.93] fatty acid glyceride (decanoyloctanoylglycerol), [c-28] .94] Propylene glycol fatty acid ester, [c-28.95] diatomite, [c-28.96] afoxolaner, [c-28.97] fluaza Indolysine (fluazaindolizine), [c-28.98] afidopyropene, [c-28.99] Halodiamide (cyhalodiamide), [c-28.100] tioxazafen (tioxazafen), [c-28.101] fluhexafon, [c-28. 102] fluralaner, [c-28. 103] Fluxamethamide (fluxametamide), [c-28.104] tetrachlorantraniliprole, [c-28.105] saloraner, [c-28.106] rotiraner, [c-28] .107] cycloxaprid, [c-28.108] fluensulfone, [c-28.109] TPIC ( tripropyl isocyanurate), [c-28.110] D- (1,3-dichloropropene), [c-28.111] peroxocarbonate, [c-28.112] MB-599 (verbutin), [C-28.113] bis (2,3,3,3-tetrachloropropyl) ether (bis (2,3,3,3-tetrachloropropyl) ether), [c-28.114] DCIP (bis (2 -Chloro-1-methylethyl) ether, [c-28.115] ENT-8184 (N- (2-Ethylhexyl) bicyclo [2.2.1] hept-5-ene-2,3-dicarboximide), c-28.1 16] Bayer 22408 (O, O-diethyl O-naphthalimido phosphorothioate), [c-28.117] Bayer 32394 (tris (1-dodecyl-3-methyl-2-phenylbenzimidazolium) hexanoferrate,
[c-28.118]式(s34)
Figure JPOXMLDOC01-appb-C000139

で表される化合物(国際公開第10/051926号参照)、
[C-28.118] Formula (s34)
Figure JPOXMLDOC01-appb-C000139

A compound represented by (see WO 10/051926),
[c-28.119]式(s35)
Figure JPOXMLDOC01-appb-C000140

で表される化合物(国際公開第13/115391号参照)、
[C-28.119] Formula (s35)
Figure JPOXMLDOC01-appb-C000140

A compound represented by (see WO 13/115391),
[c-28.120]式(s36)
Figure JPOXMLDOC01-appb-C000141

で表される化合物(国際公開第12/029672号参照)、
[C-28.120] Formula (s36)
Figure JPOXMLDOC01-appb-C000141

A compound represented by (see WO 12/029672),
[c-28.121]式(s37)
Figure JPOXMLDOC01-appb-C000142

で表される化合物(国際公開第06/056108号参照)、
[C-28.121] Formula (s37)
Figure JPOXMLDOC01-appb-C000142

A compound represented by (see WO06 / 056108),
[c-28.122]式(s38)
Figure JPOXMLDOC01-appb-C000143

で表される化合物(国際公開第14/053450号、国際特許第15/144683号参照)、
[C-28.122] Formula (s38)
Figure JPOXMLDOC01-appb-C000143

A compound represented by (see WO 14/053450, WO 15/144683),
[c-28.123]式(s39)
Figure JPOXMLDOC01-appb-C000144

で表される化合物(国際公開第14/053450号、国際特許第15/144683号参照)、
[C-28.123] Formula (s39)
Figure JPOXMLDOC01-appb-C000144

A compound represented by (see WO 14/053450, WO 15/144683),
[c-28.124]式(s40)
Figure JPOXMLDOC01-appb-C000145

で表される化合物(国際公開第14/053450号、国際特許第15/144683号参照)、
[C-28.124] Formula (s40)
Figure JPOXMLDOC01-appb-C000145

A compound represented by (see WO 14/053450, WO 15/144683),
[c-28.125]式(s41)
Figure JPOXMLDOC01-appb-C000146

[式中、m6は、0~2の整数を表す。]で表される化合物(国際公開第10/129497号参照)、
[C-28.125] Formula (s41)
Figure JPOXMLDOC01-appb-C000146

[Wherein, m 6 represents an integer of 0 to 2]. A compound represented by the formula (see WO 10/129497),
[c-28.126]式(s42)
Figure JPOXMLDOC01-appb-C000147

[式中、m7は、0~2の整数を表す。]で表される化合物(国際公開第11/152320号参照)、
[C-28.126] Formula (s42)
Figure JPOXMLDOC01-appb-C000147

[Wherein, m7 represents an integer of 0 to 2]. A compound represented by the formula (see WO 11/152320),
[c-28.127]式(s43)
Figure JPOXMLDOC01-appb-C000148

[式中、m8は、0~2の整数を表す。]で表される化合物(特開平27―160813号公報参照)、
[C-28.127] Formula (s43)
Figure JPOXMLDOC01-appb-C000148

[Wherein, m8 represents an integer of 0 to 2]. A compound represented by the formula (refer to JP-A No. 27-160813),
[c-28.128]式(s44)
Figure JPOXMLDOC01-appb-C000149

[式中、A52は、水素原子、またはフッ素原子を表す。]で表される化合物(国際公開第11/134964号、国際特許第14/005982号参照)、
[C-28.128] Formula (s44)
Figure JPOXMLDOC01-appb-C000149

[Wherein, A 52 represents a hydrogen atom or a fluorine atom. A compound represented by (see WO 11/134964, WO 14/005982),
[c-28.129]式(s45)
Figure JPOXMLDOC01-appb-C000150

[式中、m9は、0~2の整数を表し、A53は、フッ素原子、または塩素原子を表す。]で表される化合物(国際公開第15/025826号参照)、
[C-28.129] Formula (s45)
Figure JPOXMLDOC01-appb-C000150

[Wherein, m9 represents an integer of 0 to 2, and A53 represents a fluorine atom or a chlorine atom. A compound represented by the formula (see WO 15/02526),
[c-28.130]式(s46)
Figure JPOXMLDOC01-appb-C000151

[式中、V3は、窒素原子、炭素原子、またはC-Fを表し、V4およびV5は、それぞれ独立していて、窒素原子、または炭素原子を表す。]で表される化合物(国際公開第11/134964号、国際公開第14/005982号参照)、
[C-28.130] Formula (s46)
Figure JPOXMLDOC01-appb-C000151

[Wherein, V 3 represents a nitrogen atom, a carbon atom or C—F, and V 4 and V 5 are each independently a nitrogen atom or a carbon atom. A compound represented by the formula (see WO 11/134964 and WO 14/005982),
[c-28.131]式(s47)
Figure JPOXMLDOC01-appb-C000152

[式中、A54は、水素原子、メチル基、メトキシ基、またはエトキシ基を表し、A55は、塩素原子、またはメチル基を表し、A56は、メチル基、またはエチル基を表す。]で表される化合物(国際公開第09/049851号参照)、
[C-28.131] formula (s47)
Figure JPOXMLDOC01-appb-C000152

[Wherein, A54 represents a hydrogen atom, a methyl group, a methoxy group, or an ethoxy group, A55 represents a chlorine atom or a methyl group, and A56 represents a methyl group or an ethyl group. A compound represented by (see WO09 / 049851),
[c-28.132]式(s48)
Figure JPOXMLDOC01-appb-C000153

[式中、A57は、水素原子、フッ素原子、または塩素原子を表し、A58は、
Figure JPOXMLDOC01-appb-C000154

からなる群から選択される1種の部分構造を表す。]で表される化合物(国際公開第11/067272号参照)、
[C-28.132] Formula (s48)
Figure JPOXMLDOC01-appb-C000153

[Wherein, A57 represents a hydrogen atom, a fluorine atom or a chlorine atom, and A58 represents
Figure JPOXMLDOC01-appb-C000154

Represents a partial structure selected from the group consisting of A compound represented by the formula (see WO 11/067272),
[c-28.133]式(s49)
Figure JPOXMLDOC01-appb-C000155

[式中、A59は、水素原子、フッ素原子、または塩素原子を表し、A60は、
Figure JPOXMLDOC01-appb-C000156

からなる群から選択される部分構造を表す。]で表される化合物(国際公開第10/090344号参照)、
[C-28.133] Formula (s49)
Figure JPOXMLDOC01-appb-C000155

[Wherein, A59 represents a hydrogen atom, a fluorine atom or a chlorine atom, and A60 represents
Figure JPOXMLDOC01-appb-C000156

Represents a partial structure selected from the group consisting of A compound represented by the formula (see WO 10/090344),
[c-28.134]式(s50)
Figure JPOXMLDOC01-appb-C000157

[式中、m10は、0~2の整数を表し、A61は、トリフルオロメチル基、トリフルオロメチルチオ基、トリフルオロメチルスルフィニル基、またはトリフルオロメチルスルホニル基を表し、A62は、水素原子、またはトリフルオロメチル基を表し、V6は、窒素原子、または炭素原子を表し、V7は、酸素原子、またはN-メチル基を表す。]で表される化合物(国際公開第14/104407号参照)、
[C-28.134] Formula (s50)
Figure JPOXMLDOC01-appb-C000157

[Wherein, m10 represents an integer of 0 to 2, and A61 represents a trifluoromethyl group, a trifluoromethylthio group, a trifluoromethylsulfinyl group, or a trifluoromethylsulfonyl group, and A62 represents a hydrogen atom or A trifluoromethyl group is represented, V6 is a nitrogen atom or a carbon atom, and V7 is an oxygen atom or an N-methyl group. A compound represented by the formula (see WO 14/104407),
[c-28.135]式(s51)
Figure JPOXMLDOC01-appb-C000158

[式中、A63は、水素原子、またはフッ素原子を表し、アミド基は4位、または5位に結合し、A64は、
Figure JPOXMLDOC01-appb-C000159

からなる群から選択される部分構造を表す。]で表される化合物(国際公開第15/038503号、国際特許第16/144351号、国際特許第16/144678号参照)、
[C-28.135] Formula (s51)
Figure JPOXMLDOC01-appb-C000158

[Wherein, A63 represents a hydrogen atom or a fluorine atom, and an amido group is bonded to the 4- or 5-position, and A64 is
Figure JPOXMLDOC01-appb-C000159

Represents a partial structure selected from the group consisting of A compound represented by the formula (see WO 15/038503, WO 16/144351, WO 16/144678),
[c-28.136]式(s52)
Figure JPOXMLDOC01-appb-C000160

[式中、A65は、水素原子、C1~C6のアルキル基、またはC1~C6のハロアルキル基を表し、A66は、水素原子、ハロゲン原子、またはC1~C6のアルキル基を表し、A67およびA68は、それぞれ独立していて、水素原子、シアノ基で適宜置換されてもよいC1~C6のアルキル基、メトキシ基で適宜置換されてもよいアルキル基、エトキシ基で適宜置換されてもよいアルキル基、またはC3~C8のシクロアルキル基を表し、
A69は、水素原子、シアノ基、シアノ基で適宜置換されてもよいC1~C6のハロアルキル基、C1~C6のアルキル基、またはC3~C8のシクロアルキル基を表す。]で表される化合物(国際公開第12/143317号、国際特許第16/016369号参照)、
[C-28.136] Formula (s52)
Figure JPOXMLDOC01-appb-C000160

[Wherein, A65 represents a hydrogen atom, a C1-C6 alkyl group, or a C1-C6 haloalkyl group, A66 represents a hydrogen atom, a halogen atom, or a C1-C6 alkyl group, and A67 and A68 represent And each independently a hydrogen atom, a C1 to C6 alkyl group optionally substituted with cyano group, an alkyl group optionally substituted with methoxy group, an alkyl group optionally substituted with ethoxy group, Or a C3-C8 cycloalkyl group,
A69 represents a hydrogen atom, a cyano group, a C1 to C6 haloalkyl group optionally substituted with a cyano group, a C1 to C6 alkyl group, or a C3 to C8 cycloalkyl group. A compound represented by (see WO 12/143317 and WO 16/016369),
[c-28.137]式(s53)または式(s54)
Figure JPOXMLDOC01-appb-C000161

[式中、A70は、メチル基、エチル基、イソプロピル基、2,2,2-トリフルオロエチル基、またはフェニル基を表し、A71は、
Figure JPOXMLDOC01-appb-C000162

からなる群から選択される部分構造を表し、A72は、
Figure JPOXMLDOC01-appb-C000163

からなる群から選択される部分構造を表し、V8は、酸素原子、硫黄原子、-CH-、または-CHCH-を表す。]で表される化合物(国際公開第14/167084号、国際特許第16/055431号参照)、
[C-28.137] Formula (s53) or Formula (s54)
Figure JPOXMLDOC01-appb-C000161

[Wherein, A70 represents a methyl group, an ethyl group, an isopropyl group, a 2,2,2-trifluoroethyl group, or a phenyl group, and A71 represents
Figure JPOXMLDOC01-appb-C000162

Represents a partial structure selected from the group consisting of
Figure JPOXMLDOC01-appb-C000163

And V8 represents an oxygen atom, a sulfur atom, -CH 2- or -CH 2 CH 2- . A compound represented by (see WO 14/167084, WO 16/055431),
[c-28.138]式(s55)
Figure JPOXMLDOC01-appb-C000164

[式中、m11は、0~1の整数を表し、A73は、塩素原子、臭素原子、メチル基、またはトリフルオロメチル基を表し、A74は、水素原子、塩素原子、臭素原子、シアノ基、またはトリフルオロメチル基表し、A75は、水素原子、塩素原子または臭素原子を表し、A76およびA77は、それぞれ独立していて、C1~C6のアルキル基、またはC3~C8のシクロアルキル基を表し、A78は、塩素原子、臭素原子、シアノ基、ニトロ基、ジフルオロメチル基、またはトリフルオロメチル基を表す。]で表される化合物(国際公開第13/024009号参照)、
[C-28.138] Formula (s55)
Figure JPOXMLDOC01-appb-C000164

[Wherein, m11 represents an integer of 0 to 1, A73 represents a chlorine atom, a bromine atom, a methyl group or a trifluoromethyl group, and A74 represents a hydrogen atom, a chlorine atom, a bromine atom, a cyano group, Or A represents a hydrogen atom, a chlorine atom or a bromine atom, A 76 and A 77 each independently represent a C 1 to C 6 alkyl group or a C 3 to C 8 cycloalkyl group, A 78 represents a chlorine atom, a bromine atom, a cyano group, a nitro group, a difluoromethyl group or a trifluoromethyl group. A compound represented by the formula (see WO13 / 024009),
[c-28.139]式(s56)
Figure JPOXMLDOC01-appb-C000165

[式中、A79、A80、A81およびA82は、それぞれ独立していて、水素原子、ハロゲン原子、C1~C6のアルキル基、C1~C6のハロアルキル基、C1~C6のアルコキシ基、またはC3~C8のシクロアルコキシ基を表す。]で表される化合物(国際公開第12/027521号参照)、
[C-28.139] Formula (s56)
Figure JPOXMLDOC01-appb-C000165

[Wherein, A79, A80, A81 and A82 are each independently a hydrogen atom, a halogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C1-C6 alkoxy group, or a C3-C8 And a cycloalkoxy group of A compound represented by the formula (see WO 12/027521),
[c-28.140]式(s57)
Figure JPOXMLDOC01-appb-C000166

[式中、m12は、0~2の整数を表し、A83は、水素原子、またはフッ素原子を表し、A84は、
Figure JPOXMLDOC01-appb-C000167

からなる群から選択される部分構造を表す。]で表される化合物(国際公開第13/162715号参照)、
[C-28.140] formula (s57)
Figure JPOXMLDOC01-appb-C000166

[Wherein, m12 represents an integer of 0 to 2, A83 represents a hydrogen atom or a fluorine atom, and A84 represents
Figure JPOXMLDOC01-appb-C000167

Represents a partial structure selected from the group consisting of A compound represented by (see WO 13/162715),
[c-28.141]アシノナピル(acynonapyr)、
[c-28.142]式(s59)
Figure JPOXMLDOC01-appb-C000168

[A90は、ハロゲン原子、C1~C6のアルキル基、またはC1~C6のハロアルキル基を表し、A91は、C1~C6のハロアルキル基を表し、A92およびA93は、それぞれ独立していて、水素原子、C1~C6のアルキル基、アセチル基、プロピオノイル基、メタンスルホニルエチル基、メトキシカルボニル基、またはエトキシカルボニル基を表し、A94およびA95は、それぞれ独立していて、水素原子、C1~C6のアルキル基、またはC1~C6のハロアルキル基を表す。]で表される化合物(国際公開第12/164698号参照)等が挙げられる。
[C-28.141] asinonapyr (acynonapyr),
[C-28.142] Formula (s59)
Figure JPOXMLDOC01-appb-C000168

[A90 represents a halogen atom, a C1 to C6 alkyl group, or a C1 to C6 haloalkyl group, A91 represents a C1 to C6 haloalkyl group, and A92 and A93 are each independently a hydrogen atom, Represents a C1 to C6 alkyl group, an acetyl group, a propionoyl group, a methanesulfonylethyl group, a methoxycarbonyl group or an ethoxycarbonyl group, and A94 and A95 each independently represent a hydrogen atom or a C1 to C6 alkyl group, Or a C1 to C6 haloalkyl group. And the like (see WO 12/164698) and the like.
 本発明化合物と有害生物防除剤の混合比は、効果が発揮される限りにおいて特に制限されるものではないが、通常、本発明化合物に対して有害生物防除剤が、重量比で0.001~1000の比率であり、好ましくは、0.01~100の比率である。 The mixing ratio of the compound of the present invention to the pest control agent is not particularly limited as long as the effect is exhibited, but generally, the weight of the compound of the present invention is 0.001 to 1000 It is a ratio of 1000, preferably a ratio of 0.01 to 100.
 以下に、合成例、参考例、および試験例を挙げて、本発明を更に詳細に示すが、本発明はこれらに限定されるものではない。 Hereinafter, the present invention will be described in more detail by way of synthetic examples, reference examples and test examples, but the present invention is not limited thereto.
[合成例1]
 3-クロロ-1-エチル-5-(ヒドロキシ(フェニル)メチル)-6-(2,4,6-トリフルオロフェニル)ピリジン-2(1H)-オンの合成(化合物番号:7)
Figure JPOXMLDOC01-appb-C000169
Synthesis Example 1
Synthesis of 3-chloro-1-ethyl-5- (hydroxy (phenyl) methyl) -6- (2,4,6-trifluorophenyl) pyridin-2 (1H) -one (Compound No. 7)
Figure JPOXMLDOC01-appb-C000169
 5-クロロ-2-(2,4,6-トリフルオロフェニル)-1-エチル-6-オキソ-1,6-ジヒドロピリジン-3-カルボアルデヒド 330mgを含むTHF溶液 3.3mlに、フェニルマグネシウムクロリドのTHF溶液(2.0mol/L) 575μlを氷冷下で滴下して10分間撹拌した。反応混合物に飽和塩化アンモニウム水溶液と酢酸エチルを加えて分液した後に、得られた有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が353mgの白色アモルファスとして得られた。 Phenylmagnesium chloride in 3.3 ml of a THF solution containing 330 mg of 5-chloro-2- (2,4,6-trifluorophenyl) -1-ethyl-6-oxo-1,6-dihydropyridine-3-carbaldehyde 575 μl of a THF solution (2.0 mol / L) was added dropwise under ice-cooling and stirred for 10 minutes. Saturated aqueous ammonium chloride solution and ethyl acetate were added to the reaction mixture and the phases were separated, and the obtained organic layer was washed with saturated brine and dried over sodium sulfate. After evaporating the solvent under reduced pressure, the obtained residue was purified by silica gel column chromatography. The title compound was obtained as 353 mg of white amorphous.
[合成例2]
 3-クロロ-1-エチル-5-(メトキシ(フェニル)メチル)-6-(2,4,6-トリフルオロフェニル)ピリジン-2(1H)-オンの合成(化合物番号:8)
Figure JPOXMLDOC01-appb-C000170
Synthesis Example 2
Synthesis of 3-chloro-1-ethyl-5- (methoxy (phenyl) methyl) -6- (2,4,6-trifluorophenyl) pyridin-2 (1H) -one (Compound No. 8)
Figure JPOXMLDOC01-appb-C000170
 3-クロロ-1-エチル-5-(ヒドロキシ(フェニル)メチル)-6-(2,4,6-トリフルオロフェニル)ピリジン-2(1H)-オン 52.3mg、メタノール 53.9μlとオルトギ酸トリメチル 146μlを含むニトロメタン溶液 2mlに、トリフルオロメタンスルホン酸 1.2μlを氷冷下で加えて15分間撹拌した。反応混合物に飽和炭酸水素ナトリウム水溶液と酢酸エチルを加えて分液した後に、得られた有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥した。濾液を減圧下にて溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が52.6mgの白色アモルファスとして得られた。 3-Chloro-1-ethyl-5- (hydroxy (phenyl) methyl) -6- (2,4,6-trifluorophenyl) pyridin-2 (1H) -one 52.3 mg, methanol 53.9 μl and orthoformate To 2 ml of a nitromethane solution containing 146 μl of trimethyl, 1.2 μl of trifluoromethanesulfonic acid was added under ice-cooling and stirred for 15 minutes. After adding saturated sodium hydrogencarbonate aqueous solution and ethyl acetate to the reaction mixture and liquid-separating, the obtained organic layer was wash | cleaned by the saturated salt solution, and it dried with sodium sulfate. The solvent was evaporated under reduced pressure, and the obtained residue was purified by silica gel column chromatography. The title compound was obtained as 52.6 mg of white amorphous.
[合成例3]
 3-クロロ-1-エチル-5-(フルオロ(フェニル)メチル)-6-(2,4,6-トリフルオロフェニル)ピリジン-2(1H)-オンの合成(化合物番号:9)
Figure JPOXMLDOC01-appb-C000171
Synthesis Example 3
Synthesis of 3-chloro-1-ethyl-5- (fluoro (phenyl) methyl) -6- (2,4,6-trifluorophenyl) pyridin-2 (1H) -one (Compound No. 9)
Figure JPOXMLDOC01-appb-C000171
 3-クロロ-1-エチル-5-(ヒドロキシ(フェニル)メチル)-6-(2,4,6-トリフルオロフェニル)ピリジン-2(1H)-オン 53mgを含むジクロロメタン溶液 2mlに、(ジエチルアミノ)サルファートリフルオリド 21.2μlを氷冷下で加えて10分間撹拌した。反応混合物に1規定塩酸と酢酸エチルを加えて分液した後に、得られた有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥した。濾液を減圧下にて溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が44.4mgの白色アモルファスとして得られた。 3-chloro-1-ethyl-5- (hydroxy (phenyl) methyl) -6- (2,4,6-trifluorophenyl) pyridin-2 (1H) -one in 2 ml of a dichloromethane solution containing 53 mg of (diethylamino) Sulfuric trifluoride 21.2 μl was added under ice-cooling and stirred for 10 minutes. After 1N hydrochloric acid and ethyl acetate were added to the reaction mixture and the phases were separated, the obtained organic layer was washed with saturated brine and dried over sodium sulfate. The solvent was evaporated under reduced pressure, and the obtained residue was purified by silica gel column chromatography. The title compound was obtained as 44.4 mg of white amorphous.
[合成例4]
 5-ベンジル-3-クロロ-1-エチル-6-(2,4,6-トリフルオロフェニル)ピリジン-2(1H)-オンの合成(化合物番号:10)
Figure JPOXMLDOC01-appb-C000172
Synthesis Example 4
Synthesis of 5-benzyl-3-chloro-1-ethyl-6- (2,4,6-trifluorophenyl) pyridin-2 (1H) -one (Compound No. 10)
Figure JPOXMLDOC01-appb-C000172
 3-クロロ-1-エチル-5-(ヒドロキシ(フェニル)メチル)-6-(2,4,6-トリフルオロフェニル)ピリジン-2(1H)-オン 58.6mgとトリエチルシラン 119μlを含むジクロロメタン溶液 2mlに、トリフルオロ酢酸 1mlを加えて、室温で35分間撹拌した。反応混合物に飽和炭酸水素ナトリウム水溶液と酢酸エチルを加えて分液した後に、得られた有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥した。濾液を減圧下にて溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が49.3mgの白色固体として得られた。 A dichloromethane solution containing 58.6 mg of 3-chloro-1-ethyl-5- (hydroxy (phenyl) methyl) -6- (2,4,6-trifluorophenyl) pyridin-2 (1H) -one and 119 μl of triethylsilane To 2 ml, 1 ml of trifluoroacetic acid was added and stirred at room temperature for 35 minutes. After adding saturated sodium hydrogencarbonate aqueous solution and ethyl acetate to the reaction mixture and liquid-separating, the obtained organic layer was wash | cleaned by the saturated salt solution, and it dried with sodium sulfate. The solvent was evaporated under reduced pressure, and the obtained residue was purified by silica gel column chromatography. The title compound was obtained as 49.3 mg of a white solid.
[参考例1]
 N-フェニル-1-(2,4,6-トリフルオロフェニル)プロパン-1-イミンの合成
Figure JPOXMLDOC01-appb-C000173
[Reference Example 1]
Synthesis of N-phenyl-1- (2,4,6-trifluorophenyl) propane-1-imine
Figure JPOXMLDOC01-appb-C000173
 アニリン 3.64ml、トリエチルアミン7.41mlを含むジクロロメタン溶液30mlに、四塩化チタン 4.37mlを含むジクロロメタン溶液15mlを0℃で滴下し、15分間撹拌した。次いで、1-(2,4,6-トリフルオロフェニル)プロパン-1-オン 5gを含むジクロロメタン溶液10mlを0℃で加えて、室温下で3.5時間撹拌した。得られた反応混合物に1N塩酸とジクロロメタンを加えて分液した。得られた有機層を水にて洗浄し、硫酸ナトリウムで乾燥した。減圧下にて溶媒留去した後に、表題の化合物を含む7.08gの黄色油状物を得た。 To 30 ml of a dichloromethane solution containing 3.64 ml of aniline and 7.41 ml of triethylamine, 15 ml of a dichloromethane solution containing 4.37 ml of titanium tetrachloride was dropped at 0 ° C. and stirred for 15 minutes. Then, 10 ml of a dichloromethane solution containing 5 g of 1- (2,4,6-trifluorophenyl) propan-1-one was added at 0 ° C., and the mixture was stirred at room temperature for 3.5 hours. To the resulting reaction mixture was added 1N hydrochloric acid and dichloromethane to separate it. The resulting organic layer was washed with water and dried over sodium sulfate. After evaporation under reduced pressure, 7.08 g of a yellow oil containing the title compound was obtained.
H-NMR (CDCl3) δ: 7.16-7.11 (2H, m), 6.96-6.92 (1H, m), 6.69-6.67 (2H, m), 6.52-6.49 (2H, m), 2.73 (2H, q, J = 7.4 Hz), 1.25 (3H, t, J = 7.4 Hz). 1 H-NMR (CDCl 3) δ: 7.16-7.11 (2H, m), 6.96-6.92 (1H, m), 6.69-6.67 (2H, m), 6. 52-6.49 (2H, m), 2.73 (2H, q, J = 7.4 Hz), 1.25 (3 H, t, J = 7.4 Hz).
[参考例2]
 5-メチル-6-(2,4,6-トリフルオロフェニル)-3,4-ジヒドロピリジン-2(1H)-オンの合成
Figure JPOXMLDOC01-appb-C000174
[Reference Example 2]
Synthesis of 5-methyl-6- (2,4,6-trifluorophenyl) -3,4-dihydropyridin-2 (1H) -one
Figure JPOXMLDOC01-appb-C000174
 参考例1で得られたN-フェニル-1-(2,4,6-トリフルオロフェニル)プロパン-1-イミン 7.08gを含む1,4-ジオキサン70mlに、塩化アルミニウム3.90gとアクリルアミド 2.08gを加えて、90℃で5時間撹拌した。室温まで冷却した後に、1N塩酸と酢酸エチルを加えて分液した。得られた有機層を飽和食塩水にて洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が3.86gの白色固体として得られた。 In 70 ml of 1,4-dioxane containing 7.08 g of N-phenyl-1- (2,4,6-trifluorophenyl) propane-1-imine obtained in Reference Example 1, 3.90 g of aluminum chloride and acrylamide 2 Add .08g and stir at 90 ° C for 5 hours. After cooling to room temperature, 1N hydrochloric acid and ethyl acetate were added to separate the layers. The obtained organic layer was washed with saturated brine and dried over sodium sulfate. After evaporating the solvent under reduced pressure, the obtained residue was purified by silica gel column chromatography. The title compound was obtained as 3.86 g of white solid.
H-NMR (CDCl3) δ: 6.76-6.72 (2H, m), 6.58 (1H, s), 2.60-2.57 (2H, m), 2.47-2.45 (2H, m), 1.61 (3H, s). 1 H-NMR (CDCl 3) δ: 6.76-6.72 (2H, m), 6.58 (1H, s), 2.60-2.57 (2H, m), 2.47-2. 45 (2H, m), 1.61 (3H, s).
[参考例3]
 1-エチル-5-メチル-6-(2,4,6-トリフルオロフェニル)-3,4-ジヒドロピリジン-2(1H)-オンの合成
Figure JPOXMLDOC01-appb-C000175
[Reference Example 3]
Synthesis of 1-ethyl-5-methyl-6- (2,4,6-trifluorophenyl) -3,4-dihydropyridin-2 (1H) -one
Figure JPOXMLDOC01-appb-C000175
 5-メチル-6-(2,4,6-トリフルオロフェニル)-3,4-ジヒドロピリジン-2(1H)-オン 3.86g、ヨウ化エチル 5.12mlと炭酸セシウム 20.85gを含むDMF 40mlを60℃で10時間撹拌した。室温まで冷却した後に、反応混合物に水と酢酸エチルを加えて分液した。得られた有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた固体をジイソプロピルエーテルにて洗浄した。表題の化合物が4.01gの白色固体として得られた。 3.86 g of 5-methyl-6- (2,4,6-trifluorophenyl) -3,4-dihydropyridin-2 (1H) -one, 5.12 ml of ethyl iodide and 20.85 g of cesium carbonate 40 ml of DMF The mixture was stirred at 60 ° C. for 10 hours. After cooling to room temperature, water and ethyl acetate were added to the reaction mixture to separate it. The obtained organic layer was washed with saturated brine and dried over sodium sulfate. After evaporating the solvent under reduced pressure, the obtained solid was washed with diisopropyl ether. The title compound was obtained as 4.01 g of white solid.
H-NMR (CDCl3) δ: 6.77-6.72 (2H, m), 3.32 (2H, q, J = 7.1 Hz), 2.59-2.56 (2H, m), 2.37-2.35 (2H, m), 0.92 (3H, t, J = 7.1 Hz). 1 H-NMR (CDCl 3) δ: 6.77-6.72 (2H, m), 3.32 (2H, q, J = 7.1 Hz), 2.59-2 .56 (2H, m) , 2.37-2.35 (2H, m), 0.92 (3H, t, J = 7.1 Hz).
[参考例4]
 1-エチル-5-メチル-6-(2,4,6-トリフルオロフェニル)ピリジン-2(1H)-オンの合成
Figure JPOXMLDOC01-appb-C000176
[Reference Example 4]
Synthesis of 1-ethyl-5-methyl-6- (2,4,6-trifluorophenyl) pyridin-2 (1H) -one
Figure JPOXMLDOC01-appb-C000176
 1-エチル-5-メチル-6-(2,4,6-トリフルオロフェニル)-3,4-ジヒドロピリジン-2(1H)-オン 4.00g、2,3-ジクロロ-5,6-ジシアノ-p-ベンゾキノン 6.75gを含むトルエン溶液 60mlを120℃で5時間撹拌した。さらに反応混合物に、2,3-ジクロロ-5,6-ジシアノ-p-ベンゾキノン 1.69gを加えて、120℃で2時間撹拌した。室温まで冷却した後に、得られた反応混合物をろ過した。有機層を減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製して、次いで固体をジイソプロピルエーテルにて洗浄した。表題の化合物が3.50gの白色固体として得られた。 1-ethyl-5-methyl-6- (2,4,6-trifluorophenyl) -3,4-dihydropyridin-2 (1H) -one 4.00 g, 2,3-dichloro-5,6-dicyano- 60 ml of a toluene solution containing 6.75 g of p-benzoquinone was stirred at 120 ° C. for 5 hours. Further, 1.69 g of 2,3-dichloro-5,6-dicyano-p-benzoquinone was added to the reaction mixture, and the mixture was stirred at 120 ° C. for 2 hours. After cooling to room temperature, the resulting reaction mixture was filtered. After evaporating the solvent of the organic layer under reduced pressure, the obtained residue was purified by silica gel column chromatography, and then the solid was washed with diisopropyl ether. The title compound was obtained as 3.50 g of a white solid.
H-NMR (CDCl3) δ: 7.26 (1H, d, J = 9.5 Hz), 6.88-6.84 (2H, m), 6.64 (1H, d, J = 9.5 Hz), 3.82 (2H, q, J = 7.1 Hz), 1.81 (3H, s), 1.10 (3H, t, J = 7.1 Hz). 1 H-NMR (CDCl 3) δ: 7.26 (1 H, d, J = 9.5 Hz), 6.88-6.84 (2 H, m), 6.64 (1 H, d, J = 9. 5 Hz), 3.82 (2 H, q, J = 7.1 Hz), 1.81 (3 H, s), 1. 10 (3 H, t, J = 7.1 Hz).
[参考例5]
 3-クロロ-1-エチル-5-メチル-6-(2,4,6-トリフルオロフェニル)ピリジン-2(1H)-オンの合成
Figure JPOXMLDOC01-appb-C000177
[Reference Example 5]
Synthesis of 3-chloro-1-ethyl-5-methyl-6- (2,4,6-trifluorophenyl) pyridin-2 (1H) -one
Figure JPOXMLDOC01-appb-C000177
 1-エチル-5-メチル-6-(2,4,6-トリフルオロフェニル)ピリジン-2(1H)-オン 97mg、N-クロロスクシンイミド 49mgを含むDMF溶液 3mlを70℃で4時間撹拌した。さらに反応混合物にN-クロロスクシンイミド 32mgを加えて、70℃で1時間撹拌した。室温まで冷却した後に、水と酢酸エチルを加えて分液した。得られた有機層を飽和食塩水で洗浄して、硫酸ナトリウムで乾燥した。減圧下で溶媒留去をした後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が86mgの白色固体として得られた。 3 ml of a DMF solution containing 97 mg of 1-ethyl-5-methyl-6- (2,4,6-trifluorophenyl) pyridin-2 (1H) -one and 49 mg of N-chlorosuccinimide was stirred at 70 ° C. for 4 hours. Further, 32 mg of N-chlorosuccinimide was added to the reaction mixture, and the mixture was stirred at 70 ° C. for 1 hour. After cooling to room temperature, water and ethyl acetate were added to separate the layers. The obtained organic layer was washed with saturated brine and dried over sodium sulfate. After evaporating the solvent under reduced pressure, the obtained residue was purified by silica gel column chromatography. The title compound was obtained as 86 mg of a white solid.
H-NMR (CDCl3) δ: 7.50 (1H, s), 6.89-6.85 (2H, m), 3.87 (2H, q, J = 7.1 Hz), 1.82 (3H, s), 1.13 (3H, t, J = 7.1 Hz). 1 H-NMR (CDCl 3) δ: 7.50 (1H, s), 6.89-6.85 (2H, m), 3.87 (2H, q, J = 7.1 Hz), 1.82 (3H, s), 1.13 (3H, t, J = 7.1 Hz).
[参考例6]
 3-クロロ-5-(ジブロモメチル)-1-エチル-6-(2,4,6-トリフルオロフェニル)ピリジン-2-オンの合成
Figure JPOXMLDOC01-appb-C000178
[Reference Example 6]
Synthesis of 3-chloro-5- (dibromomethyl) -1-ethyl-6- (2,4,6-trifluorophenyl) pyridin-2-one
Figure JPOXMLDOC01-appb-C000178
 3-クロロ-1-エチル-5-メチル-6-(2,4,6-トリフルオロフェニル)ピリジン-2(1H)-オン 3.86gを含むクロロベンゼン溶液 70mlに、N-ブロモスクシンイミド 4.78gとアゾビスイソブチロニトリル 113.9mgを加えて、110℃で1時間撹拌した。室温まで冷却した後に、水とジクロロメタンを加えて分液した。得られた有機層を1%チオ硫酸ナトリウム水溶液と飽和食塩水で順次洗浄し、硫酸ナトリウムで乾燥した。減圧下にて溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が5.40gの褐色油状物として得られた。 3-chloro-1-ethyl-5-methyl-6- (2,4,6-trifluorophenyl) pyridin-2 (1H) -one chlorobenzene solution containing 3.86 g of N-bromosuccinimide 4.78 g And 113.9 mg of azobisisobutyronitrile were added and stirred at 110 ° C. for 1 hour. After cooling to room temperature, water and dichloromethane were added to separate the layers. The obtained organic layer was washed successively with 1% aqueous sodium thiosulfate solution and saturated brine, and dried over sodium sulfate. After evaporating the solvent under reduced pressure, the obtained residue was purified by silica gel column chromatography. The title compound was obtained as 5.40 g of a brown oil.
H-NMR (CDCl3) δ: 8.13 (1H, s), 6.97-6.93 (2H, m), 5.96 (1H, s), 3.81 (2H, q, J = 7.1 Hz), 1.14 (3H, t, J = 7.1 Hz). 1 H-NMR (CDCl 3) δ: 8.13 (1H, s), 6.97-6.93 (2H, m), 5.96 (1H, s), 3.81 (2H, q, J = 7.1 Hz), 1.14 (3 H, t, J = 7.1 Hz).
[参考例7]
 5-クロロ-1-エチル-6-オキソ-2-(2,4,6-トリフルオロフェニル)-1,6-ジヒドロピリジン-3-カルボアルデヒドの合成
Figure JPOXMLDOC01-appb-C000179
[Reference Example 7]
Synthesis of 5-chloro-1-ethyl-6-oxo-2- (2,4,6-trifluorophenyl) -1,6-dihydropyridine-3-carbaldehyde
Figure JPOXMLDOC01-appb-C000179
 3-クロロ-5-(ジブロモメチル)-1-エチル-6-(2,4,6-トリフルオロフェニル)ピリジン-2-オン 5.40gを含むアセトニトリル溶液に、硝酸銀 5.99gを含む水溶液47mlを加えて、室温下で1時間撹拌した。反応混合物をセライトろ過し、酢酸エチルで洗浄した。得られた有機層を水、1N塩酸、および飽和食塩水で順次洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去をした後に、得られた固体をジイソプロピルエーテルにて洗浄した。表題の化合物が3.56gの白色固体として得られた。 3-chloro-5- (dibromomethyl) -1-ethyl-6- (2,4,6-trifluorophenyl) pyridin-2-one 47 ml of an aqueous solution containing 5.99 g of silver nitrate in an acetonitrile solution containing 5.40 g Was added and stirred at room temperature for 1 hour. The reaction mixture was filtered through celite and washed with ethyl acetate. The obtained organic layer was washed successively with water, 1N hydrochloric acid and saturated brine, and dried over sodium sulfate. After evaporating the solvent under reduced pressure, the obtained solid was washed with diisopropyl ether. The title compound was obtained as 3.56 g of white solid.
H-NMR (CDCl3) δ: 9.23 (1H, s), 8.12 (1H, s), 6.97-6.94 (2H, m), 3.94 (2H, q, J = 7.1 Hz), 1.20 (3H, t, J = 7.1 Hz). 1 H-NMR (CDCl 3) δ: 9.23 (1H, s), 8.12 (1H, s), 6.97-6.94 (2H, m), 3.94 (2H, q, J = 7.1 Hz), 1.20 (3 H, t, J = 7.1 Hz).
 表5に、前記した実施例に準じて合成した化合物を示すが、これらに限定されるものではない。 Although the compound synthesize | combined according to the above-mentioned Example in Table 5 is shown, it is not limited to these.
 構造Aは以下を表す。
Figure JPOXMLDOC01-appb-C000180
Structure A represents
Figure JPOXMLDOC01-appb-C000180
 構造Bは以下を表す。
Figure JPOXMLDOC01-appb-C000181
Structure B represents the following.
Figure JPOXMLDOC01-appb-C000181
Figure JPOXMLDOC01-appb-T000182
Figure JPOXMLDOC01-appb-T000182
 次に、表5に記載の化合物に関して、表6にそれらのH-NMRデータを示す。 Next, their 1 H-NMR data are shown in Table 6 for the compounds listed in Table 5.
Figure JPOXMLDOC01-appb-T000183
Figure JPOXMLDOC01-appb-T000183
 次に、本発明化合物が植物病害に有効であることを具体的に示すが、これらの例に限定されるものではない。 Next, the compounds of the present invention are specifically shown to be effective against plant diseases, but are not limited to these examples.
[試験例A] イネいもち病
 供試植物(イネ品種:幸風)の種子を播種後、第2葉が展開するまで栽培した。試験では、本発明化合物をジメチルスルホキシド-メタノール混合溶液(容積比:9/1)に溶解し、250ppmの濃度となるように井戸水で希釈して薬液を得た。得られた薬液を供試植物に散布した(2.5ml/ポット)。薬液が乾燥した後の植物に、1~2×10個/mlのイネいもち病菌(Magnaporthe grisea)の分生胞子懸濁液を噴霧接種した。接種後、室温が20~23℃の湿室に約24時間放置し、発病を促した。接種6~10日後の発病程度を調査し、薬液の効果を評価した。
Test Example A Rice Blast Disease After sowing the seeds of the test plant (rice variety: Kouki), cultivation was carried out until the second leaf was developed. In the test, the compound of the present invention was dissolved in a dimethylsulfoxide-methanol mixed solution (volume ratio: 9/1) and diluted with well water to a concentration of 250 ppm to obtain a drug solution. The obtained drug solution was sprayed on the test plants (2.5 ml / pot). After the drug solution had been dried, the plants were spray-inoculated with a conidia suspension of 1-2 × 10 5 plants / ml of Magnaporthe grisea. After inoculation, the cells were left in a wet room at a temperature of 20-23 ° C. for about 24 hours to promote the onset of disease. The degree of onset of the disease 6 to 10 days after inoculation was investigated to evaluate the effect of the drug solution.
[試験例B] トマト灰色かび病
 供試植物(トマト品種:大型福寿)の種子を播種後、本葉が3~5枚展開するまで栽培した。試験では、本発明化合物をジメチルスルホキシド-メタノール混合溶液(容積比:9/1)に溶解し、250ppmの濃度となるように井戸水で希釈して薬液を得た。得られた薬液を供試植物に散布した(2.5ml/ポット)。薬液が乾燥した後の植物に、4~8×10個/mlの灰色かび病菌(Botrytis cinerea)の分生胞子懸濁液を噴霧接種した。接種後、室温が20~23℃の湿室に約48時間放置し、発病を促した。接種2~3日後の発病程度を調査し、薬液の効果を評価した。
[Experimental Example B] Tomato gray mold scab After sowing the seeds of the test plant (tomato variety: large-sized Fukuju), cultivation was continued until 3 to 5 true leaves developed. In the test, the compound of the present invention was dissolved in a dimethylsulfoxide-methanol mixed solution (volume ratio: 9/1) and diluted with well water to a concentration of 250 ppm to obtain a drug solution. The obtained drug solution was sprayed on the test plants (2.5 ml / pot). After the drug solution had been dried, the plants were spray-inoculated with a 4 to 8 × 10 5 / ml conidia suspension of Botrytis cinerea. After inoculation, it was left in a wet room at a temperature of 20-23 ° C. for about 48 hours to promote the onset of the disease. The incidence of disease 2-3 days after inoculation was investigated to evaluate the effect of the drug solution.
[試験例C] キャベツ黒すす病
 供試植物(キャベツ品種:四季穫)の種子を播種後、子葉が展開するまで栽培した。試験では、本発明化合物をジメチルスルホキシド-メタノール混合溶液(容積比:9/1)に溶解し、250ppmの濃度となるように井戸水で希釈して薬液を得た。得られた薬液を供試植物に散布した(2.5ml/ポット)。薬液が乾燥した後の植物に、4~8×10個/mlのキャベツ黒すす病菌(Alternaia brassicicola)の分生胞子懸濁液を噴霧接種した。接種後、室温が20~23℃の湿室に約48時間放置し、発病を促した。接種2~3日後の発病程度を調査し、薬液の効果を評価した。
[Experiment Example C] Cabbage black soot disease The seeds of the test plant (cabbage cultivar: four seasons harvest) were sowed, and cultivated until cotyledons were developed. In the test, the compound of the present invention was dissolved in a dimethylsulfoxide-methanol mixed solution (volume ratio: 9/1) and diluted with well water to a concentration of 250 ppm to obtain a drug solution. The obtained drug solution was sprayed on the test plants (2.5 ml / pot). After the drug solution had been dried, the plants were spray-inoculated with a 4 to 8 × 10 5 / ml conidia suspension of cabbage black scab (Alternaria brassicicola). After inoculation, it was left in a wet room at a temperature of 20-23 ° C. for about 48 hours to promote the onset of the disease. The incidence of disease 2-3 days after inoculation was investigated to evaluate the effect of the drug solution.
[試験例D] オオムギうどんこ病
 供試植物(オオムギ品種:赤神力)の種子を播種後、第1葉が展開するまで栽培した。試験では、本発明化合物をジメチルスルホキシド-メタノール混合溶液(容積比:9/1)に溶解し、250ppmの濃度となるように井戸水で希釈して薬液を得た。得られた薬液を供試植物に散布した(2.5ml/ポット)。薬液が乾燥した後の植物に、オオムギうどんこ病菌(Blumeria graminis f.sp.hordei)の分生胞子を叩き落して接種した。接種後、6~10日後の発病程度を調査し、その効果を評価した。
[Test Example D] Barley powdery mildew The seeds of the test plant (barley cultivar: Akagami power) were sown and cultivated until the first leaves were developed. In the test, the compound of the present invention was dissolved in a dimethylsulfoxide-methanol mixed solution (volume ratio: 9/1) and diluted with well water to a concentration of 250 ppm to obtain a drug solution. The obtained drug solution was sprayed on the test plants (2.5 ml / pot). After the drug solution had dried, the conidia of the barley powdery mildew (Blumeria graminis f. Sp. Hordei) were knocked off and inoculated. The degree of onset 6 to 10 days after inoculation was investigated to evaluate its effect.
[試験例E] コムギ赤さび病
 供試植物(コムギ品種:農林61号)の種子を播種後、第1葉が展開するまで栽培した。試験では、本発明化合物をジメチルスルホキシド-メタノール混合溶液(容積比:9/1)に溶解し、250ppmの濃度となるように井戸水で希釈して薬液を得た。得られた薬液を供試植物に散布した(2.5ml/ポット)。薬液が乾燥した後の植物に、1~2×10個/mlのコムギ赤さび病菌(Puccinia recondita)の夏胞子懸濁液を噴霧接種した。接種後、室温が20~23℃の湿室に約24時間放置し、発病を促した。接種7~10日後の発病程度を調査し、薬液の効果を評価した。
[Experiment Example E] Wheat leaf rust disease After sowing the seeds of the test plant (wheat cultivar: Norin 61), cultivation was carried out until the first leaf was developed. In the test, the compound of the present invention was dissolved in a dimethylsulfoxide-methanol mixed solution (volume ratio: 9/1) and diluted with well water to a concentration of 250 ppm to obtain a drug solution. The obtained drug solution was sprayed on the test plants (2.5 ml / pot). After the drug solution had been dried, the plants were spray inoculated with 1 to 2 × 10 5 / ml of a summer spore suspension of wheat rust fungus (Puccinia recondita). After inoculation, the cells were left in a wet room at a temperature of 20-23 ° C. for about 24 hours to promote the onset of disease. The incidence of disease 7 to 10 days after inoculation was investigated to evaluate the effect of the drug solution.
[試験例F] トマト疫病
 供試植物(トマト品種:大型福寿)の種子を播種後、本葉が3~5枚展開するまで栽培した。試験では、本発明化合物をジメチルスルホキシド-メタノール混合溶液(容積比:9/1)に溶解し、250ppmの濃度となるように井戸水で希釈して薬液を得た。得られた薬液を供試植物に散布した(2.5ml/ポット)。薬液が乾燥した後の植物に、4~8×10個/mlのトマト疫病菌(Phytophthora infestans)の遊走子のう懸濁液を噴霧接種した。接種後、室温が20℃の湿室に約24時間放置し、発病を促した。接種5~10日後の発病程度を調査し、薬液の効果を評価した。
[Test Example F] Tomato plague After seeding the seeds of the test plant (tomato variety: large-sized Fukuju), cultivation was carried out until 3 to 5 true leaves developed. In the test, the compound of the present invention was dissolved in a dimethylsulfoxide-methanol mixed solution (volume ratio: 9/1) and diluted with well water to a concentration of 250 ppm to obtain a drug solution. The obtained drug solution was sprayed on the test plants (2.5 ml / pot). After the drug solution had been dried, the plants were spray-inoculated with 4-8 × 10 3 / ml of a zoospore suspension of Phytophthora infestans. After inoculation, it was left in a wet room at a room temperature of 20 ° C. for about 24 hours to promote the onset. The degree of onset of disease 5-10 days after inoculation was investigated to evaluate the effect of the drug solution.
[試験例G] ブドウべと病
 供試植物(ブドウ品種:ネオマスカット)の種子を播種後、本葉が3~4枚展開するまで栽培した。試験では、本発明化合物をジメチルスルホキシド-メタノール混合溶液(容積比:9/1)に溶解し、250ppmの濃度となるように井戸水で希釈して薬液を得た。得られた薬液を供試植物に散布した(2.5ml/ポット)。薬液が乾燥した後の植物に、1~2×10個/mlのブドウべと病菌(Plasmopara viticola)の遊走子のう懸濁液を噴霧接種した。接種後、室温が20℃の湿室に約24時間放置し、発病を促した。接種7~10日後の発病程度を調査し、薬液の効果を評価した。
[Test Example G] Grape downy mildew Seeds of test plants (grape varieties: neomascat) were sown and cultivated until 3 or 4 true leaves developed. In the test, the compound of the present invention was dissolved in a dimethylsulfoxide-methanol mixed solution (volume ratio: 9/1) and diluted with well water to a concentration of 250 ppm to obtain a drug solution. The obtained drug solution was sprayed on the test plants (2.5 ml / pot). After the drug solution had been dried, the plants were spray-inoculated with a zoospore suspension of 1-2 × 10 4 plants / ml Plasmoparabiticola. After inoculation, it was left in a wet room at a room temperature of 20 ° C. for about 24 hours to promote the onset. The incidence of disease 7 to 10 days after inoculation was investigated to evaluate the effect of the drug solution.
[試験例H] キュウリ炭疽病
 供試植物(キュウリ品種:相模半白)の種子を播種後、本葉が1枚展開するまで栽培した。試験では、本発明化合物をジメチルスルホキシド-メタノール混合溶液(容積比:9/1)に溶解し、250ppmの濃度となるように井戸水で希釈して薬液を得た。得られた薬液を供試植物に散布した(2.5ml/ポット)。薬液が乾燥した後の植物に、2~4×10個/mlのキュウリ炭疽病菌(Colletotrichum orbiculare)の分生胞子懸濁液を噴霧接種した。接種後、室温が20~23℃の湿室に約24時間放置し、発病を促した。接種6~10日後の発病程度を調査し、薬液の効果を評価した。
[Test Example H] Cucumber anthracnose After sowing the seeds of the test plant (cucumber variety: Sagami-hanhaku), cultivation was carried out until one true leaf was developed. In the test, the compound of the present invention was dissolved in a dimethylsulfoxide-methanol mixed solution (volume ratio: 9/1) and diluted with well water to a concentration of 250 ppm to obtain a drug solution. The obtained drug solution was sprayed on the test plants (2.5 ml / pot). After the drug solution had been dried, the plants were spray-inoculated with a 2 to 4 × 10 5 / ml conidia suspension of a cucumber anthracnose fungus (Colletotrichum orbiculare). After inoculation, the cells were left in a wet room at a temperature of 20-23 ° C. for about 24 hours to promote the onset of disease. The degree of onset of the disease 6 to 10 days after inoculation was investigated to evaluate the effect of the drug solution.
 以上の試験例の発病程度について、無発病の植物の発病程度を0、薬剤無処理区の植物の発病程度を3として、0.05ごとの発病程度の評価を行った。また、発病程度から以下の計算式に従って防除価を算出した。
<防除価>
 防除価=100{1-(n/3)}
 n=各薬剤処理区の発病程度
以上の試験結果をまとめたものを表7に示す。表中、Hは防除価が50%より大きいもの表し、Lは防除価が50%以下を表す。
Regarding the onset degree of the above-mentioned test example, the onset degree of a disease-free plant was 0, the onset degree of a plant in the non-drug treated area was 3, and the onset degree was evaluated every 0.05. In addition, the control value was calculated according to the following calculation formula from the degree of disease onset.
<Control value>
Control value = 100 {1-(n / 3)}
n = Table 7 summarizes the test results of the degree of onset of disease in each drug treatment area. In the table, H indicates that the control value is greater than 50%, and L indicates that the control value is 50% or less.
Figure JPOXMLDOC01-appb-T000184
Figure JPOXMLDOC01-appb-T000184
 本発明のピリドン化合物は新規な化合物であり、植物病害を防除することができるので、農薬、例えば、農園芸用有害生物防除剤、特に農園芸用殺菌剤としての利用価値がある。 Since the pyridone compounds of the present invention are novel compounds and can control plant diseases, they are useful as agricultural chemicals, for example, pesticides for agricultural and horticultural plants, particularly as fungicides for agricultural and horticultural plants.
 日本国特許出願2017-180568号(出願日:2017年9月20日)の開示はその全体が参照により本明細書に取り込まれる。 The disclosure of Japanese Patent Application 2017-180568 (filing date: September 20, 2017) is incorporated herein by reference in its entirety.
 本明細書に記載された全ての文献、特許出願、および技術規格は、個々の文献、特許出願、および技術規格が参照により取り込まれることが具体的かつ個々に記された場合と同程度に、本明細書に参照により取り込まれる。 All documents, patent applications, and technical standards described herein are as specific and individually as individual documents, patent applications, and technical standards are incorporated by reference. Hereby incorporated by reference.

Claims (8)

  1.  式(1)
    Figure JPOXMLDOC01-appb-C000001

    [式中、R1は、
      水酸基、
      シアノ基、
      置換基Aで適宜置換されてもよいC1~C6のアルキル基、
      C1~C6のハロアルキル基、
      置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、
      置換基Aで適宜置換されてもよいC2~C6のアルケニル基、
      C2~C6のハロアルケニル基、
      置換基Aで適宜置換されてもよいC2~C6のアルキニル基、
      C2~C6のハロアルキニル基、
      置換基Aで適宜置換されてもよいC1~C6のアルコキシ基、
      C1~C6のハロアルコキシ基、
      置換基Aで適宜置換されてもよいC3~C8のシクロアルコキシ基、
      置換基Aで適宜置換されてもよいC2~C6のアルケニルオキシ基、
      C2~C6のハロアルケニルオキシ基、
      置換基Aで適宜置換されてもよいC3~C6のアルキニルオキシ基、
      C3~C6のハロアルキニルオキシ基、
      またはRaRbN-(ここで、RaおよびRbは、それぞれ独立していて、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表すか、あるいはRaおよびRbは、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。)を表し;
     R2は、
      水素原子、
      ニトロ基、
      ハロゲン原子、
      置換基Aで適宜置換されてもよいC1~C6のアルキル基、
      C1~C6のハロアルキル基、
      置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、
      置換基Aで適宜置換されてもよいC2~C6のアルケニル基、
      C2~C6のハロアルケニル基、
      置換基Aで適宜置換されてもよいC2~C6のアルキニル基、
      C2~C6のハロアルキニル基、
      置換基Aで適宜置換されてもよいC1~C6のアルコキシ基、
      C1~C6のハロアルコキシ基、
      置換基Aで適宜置換されてもよいC3~C8のシクロアルコキシ基、
      置換基Aで適宜置換されてもよいC2~C6のアルケニルオキシ基、
      C2~C6のハロアルケニルオキシ基、
      置換基Aで適宜置換されてもよいC3~C6のアルキニルオキシ基、
      C3~C6のハロアルキニルオキシ基、
      Rc-L-(ここで、Rcは、C1~C6のアルキル基、またはC1~C6のハロアルキル基を表し、Lは、S、SO、またはSO2を表す。)、
      またはRdC(=O)-(ここで、Rdは、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表す。)を表し;
     Xは、酸素原子または硫黄原子を表し;
     Yは、
      R3で適宜0~7置換されてもよいアリール基(ただし、2置換以上のR3の場合、それぞれ独立している。)、
      またはR3で適宜0~4置換されてもよいヘテロアリール基(ただし、2置換以上のR3の場合、それぞれ独立している)を表し;
     R3は、
      水酸基、
      シアノ基、
      ニトロ基、
      ハロゲン原子、
      置換基Cで適宜置換されてもよいC1~C6のアルキル基、
      C1~C6のハロアルキル基、
      置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、
      置換基Cで適宜置換されてもよいC2~C6のアルケニル基、
      C2~C6のハロアルケニル基、
      置換基Cで適宜置換されてもよいC2~C6のアルキニル基、
      C2~C6のハロアルキニル基、
      置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、
      C1~C6のハロアルコキシ基、
      置換基Cで適宜置換されてもよいC3~C8のシクロアルコキシ基、
      置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、
      C2~C6のハロアルケニルオキシ基、
      置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、
      C3~C6のハロアルキニルオキシ基、
      RaRbN-(ここで、RaおよびRbは、前記と同義である。)、
      Rc-L-(ここで、RcおよびLは、前記と同義である。)、
      Rx1C(=O)-(ここで、Rx1は、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはRaRbN-(ここで、RaおよびRbは前記と同義である。)を表す。)、
      またはRx1C(=O)O-(ここで、Rx1は、前記と同義である。)を表し;
     Zは、
      R4で適宜0~7置換されてもよいアリール基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
      またはR4で適宜0~6置換されてもよい複素環基(ただし、2置換以上のR4の場合、それぞれ独立している。)を表し;
     R4は、
      水酸基、
      シアノ基、
      ニトロ基、
      ハロゲン原子、
      置換基Cで適宜置換されてもよいC1~C6のアルキル基、
      C1~C6のハロアルキル基、
      置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、
      置換基Cで適宜置換されてもよいC2~C6のアルケニル基、
      C2~C6のハロアルケニル基、
      置換基Cで適宜置換されてもよいC2~C6のアルキニル基、
      C2~C6のハロアルキニル基、
      置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、
      C1~C6のハロアルコキシ基、
      置換基Cで適宜置換されてもよいC3~C8のシクロアルコキシ基、
      置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、
      C2~C6のハロアルケニルオキシ基、
      置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、
      C3~C6のハロアルキニルオキシ基、
      置換基Dで適宜置換されてもよいアリール基、
      置換基Dで適宜置換されてもよいヘテロアリール基、
      置換基Dで適宜置換されてもよいアリールオキシ基、
      置換基Dで適宜置換されてもよいヘテロアリールオキシ基、
      置換基Dで適宜置換されてもよいアラルキルオキシ基、
      RaRbN-(ここで、RaおよびRbは、前記と同義である。)、
      Rc-L-(ここで、RcおよびLは、前記と同義である。)、
      Rx1C(=O)-(ここで、Rx1は、前記と同義である。)、
      Rx1C(=O)O-(ここで、Rx1は、前記と同義である。)、
      またはRx2C(=O)N(Rx3)-(ここで、Rx2は、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはRaRbN-(ここで、RaおよびRbは、前記と同義である。)を表し、Rx3は、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表す。)を表し;
     Wは、
      R5で適宜0~2置換されてもよいC1~C6のアルキレン基(ただし、2置換のR5の場合、それぞれ独立している。)を表し;
     R5は、
      水酸基、
      シアノ基、
      ハロゲン原子、
      置換基Cで適宜置換されてもよいC1~C6のアルキル基、
      C1~C6のハロアルキル基、
      置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、
      置換基Cで適宜置換されてもよいC2~C6のアルケニル基、
      C2~C6のハロアルケニル基、
      置換基Cで適宜置換されてもよいC2~C6のアルキニル基、
      C2~C6のハロアルキニル基、
      置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、
      C1~C6のハロアルコキシ基、
      置換基Cで適宜置換されてもよいC3~C8のシクロアルコキシ基、
      置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、
      C2~C6のハロアルケニルオキシ基、
      置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、
      C3~C6のハロアルキニルオキシ基、
      Rc-L-(ここで、RcおよびLは、前記と同義である。)、
      またはRx1C(=O)O-(ここで、Rx1は、前記と同義である。)を表し;
     そして、置換基Aは、水酸基、シアノ基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、RaRbN-(ここで、RaおよびRbは、前記と同義である。)およびRc-L-(ここで、RcおよびLは、前記と同義である。)からなる群から選択される少なくとも1種であり;
     置換基Bは、シアノ基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基およびC3~C8のシクロアルコキシ基からなる群から選択される少なくとも1種であり;
     置換基Cは、水酸基、シアノ基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、C2~C6のアルコキシアルコキシ基、RaRbN-(ここで、RaおよびRbは、前記と同義である。)、Rc-L-(ここで、RcおよびLは、前記と同義である。)、Rx1C(=O)-(ここで、Rx1は、前記と同義である。)および1~2個の酸素原子を含む3~6員環の基からなる群から選択される少なくとも1種であり;
     置換基Dは、水酸基、シアノ基、ニトロ基、ハロゲン原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基およびC3~C8のシクロアルコキシ基からなる群から選択される少なくとも1種である。]で表される化合物またはその塩。
    Formula (1)
    Figure JPOXMLDOC01-appb-C000001

    [Wherein, R 1 is
    Hydroxyl group,
    Cyano group,
    A C1 to C6 alkyl group optionally substituted with a substituent A,
    C1 to C6 haloalkyl group,
    A C3-C8 cycloalkyl group which may be optionally substituted by a substituent A,
    A C2-C6 alkenyl group which may be optionally substituted by a substituent A,
    A C 2 -C 6 haloalkenyl group,
    A C2 to C6 alkynyl group which may be optionally substituted by a substituent A,
    A C2 to C6 haloalkynyl group,
    A C1 to C6 alkoxy group which may be optionally substituted by a substituent A,
    A C1 to C6 haloalkoxy group,
    A C3 to C8 cycloalkoxy group which may be optionally substituted by a substituent A,
    A C2-C6 alkenyloxy group which may be optionally substituted by a substituent A,
    C2-C6 haloalkenyloxy group,
    A C3-C6 alkynyloxy group which may be optionally substituted by a substituent A,
    A C3-C6 haloalkynyloxy group,
    Or RaRbN- (wherein Ra and Rb are each independently a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or a C3 to C8 And R.sup.A and R.sup.b, together with the nitrogen atom to which they are attached, represent an aziridinyl, azetidinyl, pyrrolidinyl, piperidinyl, homopiperidinyl or azocanyl group. Represent;
    R2 is
    Hydrogen atom,
    Nitro group,
    Halogen atom,
    A C1 to C6 alkyl group optionally substituted with a substituent A,
    C1 to C6 haloalkyl group,
    A C3-C8 cycloalkyl group which may be optionally substituted by a substituent A,
    A C2-C6 alkenyl group which may be optionally substituted by a substituent A,
    A C 2 -C 6 haloalkenyl group,
    A C2 to C6 alkynyl group which may be optionally substituted by a substituent A,
    A C2 to C6 haloalkynyl group,
    A C1 to C6 alkoxy group which may be optionally substituted by a substituent A,
    A C1 to C6 haloalkoxy group,
    A C3 to C8 cycloalkoxy group which may be optionally substituted by a substituent A,
    A C2-C6 alkenyloxy group which may be optionally substituted by a substituent A,
    C2-C6 haloalkenyloxy group,
    A C3-C6 alkynyloxy group which may be optionally substituted by a substituent A,
    A C3-C6 haloalkynyloxy group,
    Rc-L- (wherein Rc represents a C1-C6 alkyl group or a C1-C6 haloalkyl group, and L represents S, SO or SO2),
    Or RdC (= O) — (wherein, Rd represents a C1 to C6 alkyl group, a C1 to C6 haloalkyl group, or a C3 to C8 cycloalkyl group which may be optionally substituted with a substituent B). Represents
    X represents an oxygen atom or a sulfur atom;
    Y is
    An aryl group which may be optionally substituted 0 to 7 as R 3 (however, in the case of R 3 having 2 or more substituents, they are each independently),
    Or a heteroaryl group which may be optionally substituted 0 to 4 with R 3 (provided that R 3 s each having 2 or more substituents are each independently);
    R3 is
    Hydroxyl group,
    Cyano group,
    Nitro group,
    Halogen atom,
    A C1 to C6 alkyl group which may be optionally substituted by a substituent C,
    C1 to C6 haloalkyl group,
    A C3-C8 cycloalkyl group which may be optionally substituted by a substituent C,
    A C2-C6 alkenyl group which may be optionally substituted by a substituent C,
    A C 2 -C 6 haloalkenyl group,
    A C2 to C6 alkynyl group which may be optionally substituted by a substituent C,
    A C2 to C6 haloalkynyl group,
    A C1 to C6 alkoxy group which may be optionally substituted by a substituent C,
    A C1 to C6 haloalkoxy group,
    A C3 to C8 cycloalkoxy group which may be optionally substituted by a substituent C,
    A C2-C6 alkenyloxy group which may be optionally substituted by a substituent C,
    C2-C6 haloalkenyloxy group,
    A C3-C6 alkynyloxy group which may be optionally substituted by a substituent C,
    A C3-C6 haloalkynyloxy group,
    RaR b N-(wherein, R a and R b are as defined above),
    Rc-L- (wherein Rc and L are as defined above),
    Rx1C (= O)-(wherein, Rx1 is a C1-C6 alkyl group optionally substituted with a substituent B, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy A group, a C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group, or RaRbN- (wherein Ra and Rb are as defined above),
    Or Rx1C (= O) O— (wherein, Rx1 is as defined above);
    Z is
    An aryl group which may be optionally substituted 0 to 7 as R 4 (provided that R 4 has 2 or more substituents, each of which is independently of each other),
    Or a heterocyclic group which may be optionally substituted 0 to 6 with R 4 (provided that each is independently R 2 in the case of 2 or more substituents R 4);
    R4 is
    Hydroxyl group,
    Cyano group,
    Nitro group,
    Halogen atom,
    A C1 to C6 alkyl group which may be optionally substituted by a substituent C,
    C1 to C6 haloalkyl group,
    A C3-C8 cycloalkyl group which may be optionally substituted by a substituent C,
    A C2-C6 alkenyl group which may be optionally substituted by a substituent C,
    A C 2 -C 6 haloalkenyl group,
    A C2 to C6 alkynyl group which may be optionally substituted by a substituent C,
    A C2 to C6 haloalkynyl group,
    A C1 to C6 alkoxy group which may be optionally substituted by a substituent C,
    A C1 to C6 haloalkoxy group,
    A C3 to C8 cycloalkoxy group which may be optionally substituted by a substituent C,
    A C2-C6 alkenyloxy group which may be optionally substituted by a substituent C,
    C2-C6 haloalkenyloxy group,
    A C3-C6 alkynyloxy group which may be optionally substituted by a substituent C,
    A C3-C6 haloalkynyloxy group,
    An aryl group which may be optionally substituted by a substituent D,
    A heteroaryl group which may be optionally substituted by a substituent D,
    An aryloxy group which may be optionally substituted by a substituent D,
    A heteroaryloxy group which may be optionally substituted by a substituent D,
    An aralkyloxy group which may be optionally substituted by a substituent D,
    RaR b N-(wherein, R a and R b are as defined above),
    Rc-L- (wherein Rc and L are as defined above),
    Rx1C (= O)-(where Rx1 is the same as the above),
    Rx1C (= O) O- (wherein, Rx1 is as defined above),
    Or Rx2C (= O) N (Rx3)-(wherein, Rx2 is a hydrogen atom, a C1-C6 alkyl group optionally substituted with a substituent B, a C1-C6 haloalkyl group, a C3-C8 cyclo An alkyl group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, a C3 to C8 cycloalkoxy group, or RaRbN- (wherein Ra and Rb are as defined above), and Rx3 is A hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or a C3 to C8 cycloalkyl group.
    W is
    A C1 to C6 alkylene group which may be optionally substituted 0 to 2 with R 5 (wherein each of R 5 s is independently substituted);
    R5 is
    Hydroxyl group,
    Cyano group,
    Halogen atom,
    A C1 to C6 alkyl group which may be optionally substituted by a substituent C,
    C1 to C6 haloalkyl group,
    A C3-C8 cycloalkyl group which may be optionally substituted by a substituent C,
    A C2-C6 alkenyl group which may be optionally substituted by a substituent C,
    A C 2 -C 6 haloalkenyl group,
    A C2 to C6 alkynyl group which may be optionally substituted by a substituent C,
    A C2 to C6 haloalkynyl group,
    A C1 to C6 alkoxy group which may be optionally substituted by a substituent C,
    A C1 to C6 haloalkoxy group,
    A C3 to C8 cycloalkoxy group which may be optionally substituted by a substituent C,
    A C2-C6 alkenyloxy group which may be optionally substituted by a substituent C,
    C2-C6 haloalkenyloxy group,
    A C3-C6 alkynyloxy group which may be optionally substituted by a substituent C,
    A C3-C6 haloalkynyloxy group,
    Rc-L- (wherein Rc and L are as defined above),
    Or Rx1C (= O) O— (wherein, Rx1 is as defined above);
    And, the substituent A is a hydroxyl group, a cyano group, a C3 to C8 cycloalkyl group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, a C3 to C8 cycloalkoxy group, RaRbN- (where, Ra And Rb is as defined above) and Rc-L- (wherein Rc and L are as defined above) and at least one selected from the group consisting of
    The substituent B is at least one selected from the group consisting of a cyano group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group and a C3 to C8 cycloalkoxy group;
    The substituent C is a hydroxyl group, a cyano group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group, a C2-C6 alkoxyalkoxy group, RaRbN -(Wherein, Ra and Rb are as defined above), Rc-L- (wherein, Rc and L are as defined above), Rx1C (= O)-(wherein, Rx1 At least one selected from the group consisting of the groups having the same meanings as described above) and a 3- to 6-membered ring group containing 1 to 2 oxygen atoms;
    Substituent D includes a hydroxyl group, a cyano group, a nitro group, a halogen atom, a C1 to C6 alkyl group optionally substituted with substituent B, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group, C1 to C6. It is at least one selected from the group consisting of a C6 alkoxy group, a C1 to C6 haloalkoxy group, and a C3 to C8 cycloalkoxy group. Or a salt thereof.
  2.  Yは、
      R3で適宜0~5置換されてもよいフェニル基(ただし、2置換以上のR3の場合、それぞれ独立している。)、
      R3で適宜0~4置換されてもよいピリジル基(ただし、2置換以上のR3の場合、それぞれ独立している。)、
      R3で適宜0~3置換されてもよいピリダジニル基、ピリミジニル基、もしくはピラジニル基(ただし、2置換以上のR3の場合、それぞれ独立している。)、
      R3で適宜0~2置換されてもよいトリアジニル基(ただし、2置換のR3の場合、それぞれ独立している。)、
      またはR3で適宜置換されてもよいテトラジニル基を表し;
     Zは、
      R4で適宜0~5置換されてもよいフェニル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
      R4で適宜0~7置換されてもよいナフチル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
      R4で適宜0~4置換されてもよいピリジル基、ピリダジニル基、ピリミジニル基、ピラジニル基、トリアジニル基、もしくはテトラジニル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
      R4で適宜0~3置換されてもよいチエニル基、チアゾリル基、イソチアゾリル基、チアジアゾリル基、もしくはチアトリアゾリル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
      R4で適宜0~4置換されてもよいピロリル基、ピラゾリル基、イミダゾリル基、トリアゾリル基、テトラゾリル基、もしくはペンタゾリル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
      R4で適宜0~3置換されてもよいフリル基、オキサゾリル基、イソキサゾリル基、オキサジアゾリル基、もしくはオキサトリアゾリル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
      R4で適宜0~6置換されてもよいインドリル基、イソインドリル基、インダゾリル基、ベンゾイミダゾリル基、もしくはベンゾトリアゾリル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
      R4で適宜0~5置換されてもよいベンゾフリル基、イソベンゾフリル基、ベンゾオキサゾリル基、ベンゾイソキサゾリル基、もしくはベンゾオキサジアゾリル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
      R4で適宜0~5置換されてもよいベンゾチエニル基、ベンゾチアゾリル基、ベンゾイソチアゾリル基、もしくはベンゾチアジアゾリル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
      R4で適宜0~6置換されてもよいインドリジニル基、イミダゾピリジル基、ピラゾロピリジル基、もしくはトリアゾロピリジル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
      R4で適宜0~5置換されてもよいピロロピリミジニル基、イミダゾピリミジニル基、ピラゾロピリミジニル基、トリアゾロピリミジニル基、ピロロピラジニル基、イミダゾピラジニル基、ピラゾロピラジニル基、もしくはトリアゾロピラジニル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
      R4で適宜0~6置換されてもよいキノリル基、イソキノリル基、シノリル基、フタラジニル基、キノキサリニル基、キナゾリニル基、もしくはナフチリジニル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
      または1~2個の酸素原子を含む3~6員環の基を表す、
    請求項1に記載の化合物またはその塩。
    Y is
    A phenyl group which may be optionally substituted 0 to 5 as R 3 (however, in the case of R 3 having 2 or more substituents, they are each independently),
    A pyridyl group which may be optionally substituted 0 to 4 with R 3 (provided that R 3 s each having 2 or more substituents are independent of each other),
    A pyridazinyl group, a pyrimidinyl group or a pyrazinyl group which may be optionally substituted 0 to 3 by R 3 (however, in the case of R 3 having 2 or more substituents, they are each independently),
    A triazinyl group which may be optionally substituted 0 to 2 as R 3 (however, in the case of disubstituted R 3, each is independent of each other),
    Or a tetrazinyl group which may be optionally substituted by R 3;
    Z is
    A phenyl group which may be optionally substituted 0 to 5 with R 4 (provided that R 4 has 2 or more substituents, each of which is independently of each other),
    A naphthyl group which may be optionally substituted 0 to 7 with R 4 (provided that R 4 has 2 or more substituents, each of which is independently of each other),
    A pyridyl group, a pyridazinyl group, a pyrimidinyl group, a pyrazinyl group, a triazinyl group, or a tetrazinyl group (however, in the case of R4 having two or more substituents, they are each independently.
    Thienyl group which may be optionally substituted by 0 to 4 R 4, thiazolyl group, isothiazolyl group, thiadiazolyl group, or thiatriazolyl group (However, in the case of R 4 having two or more substituents, they are each independently.),
    A pyrrolyl group, a pyrazolyl group, an imidazolyl group, a triazolyl group, a tetrazolyl group, or a pentazolyl group (however, in the case of R4 having two or more substituents, they are each independently independent of each other)
    Furyl, oxazolyl, isoxazolyl, oxadiazolyl or oxatriazolyl (which may be independently substituted in the case of R4 having 2 or more substituents) which may be optionally substituted by 0 to 3 R 4;
    Indolyl, isoindolyl, indazolyl, benzimidazolyl, or benzotriazolyl groups which may be optionally substituted 0 to 6 by R 4 (however, in the case of R 4 having 2 or more substituents, they are each independently),
    Benzofuryl group, isobenzofuryl group, benzoxazolyl group, benzoisoxazolyl group, or benzooxadiazolyl group (however, in the case of R4 having two or more substituents, each of which may be optionally substituted 0 to 5 with R 4 be independent.),
    A benzothienyl group, a benzothiazolyl group, a benzoisothiazolyl group, or a benzothiadiazolyl group (however, in the case of R4 having 2 or more substituents, they are each independently independent) which may be optionally substituted 0 to 5 with R 4;
    Indolizinyl group which may be optionally substituted 0 to 6 by R 4, imidazopyridyl group, pyrazolo pyridyl group, or triazolo pyridyl group (However, in the case of R 4 having 2 or more substituents, they are each independently.),
    A pyrrolopyrimidinyl group which may be optionally substituted by 0 to 4 R 4, imidazopyrimidinyl group, pyrazolopyrimidinyl group, triazolopyrimidinyl group, pyrrolopyrazinyl group, imidazopyrazinyl group, pyrazolopyrazinyl group, or triazolopyrazinyl group Group (but in the case of R 4 with 2 or more substituents, each is independent),
    A quinolyl group, an isoquinolyl group, a cinolyl group, a phthalazinyl group, a quinoxalinyl group, a quinazolinyl group, or a naphthyridinyl group which may be optionally substituted 0 to 6 with R 4 (however, in the case of R4 having 2 or more substituents, they are each independently). ,
    Or a 3- to 6-membered ring group containing 1 to 2 oxygen atoms,
    The compound according to claim 1 or a salt thereof.
  3.  R1は、
      置換基Aで適宜置換されてもよいC1~C6のアルキル基、
      C1~C6のハロアルキル基、
      置換基Aで適宜置換されてもよいC2~C6のアルケニル基、
      C2~C6のハロアルケニル基、
      置換基Aで適宜置換されてもよいC2~C6のアルキニル基、
      またはC2~C6のハロアルキニル基を表し;
     R2は、
      水素原子、
      ハロゲン原子、
      置換基Aで適宜置換されてもよいC1~C6のアルキル基、
      C1~C6のハロアルキル基、
      置換基Aで適宜置換されてもよいC1~C6のアルコキシ基、
      C1~C6のハロアルコキシ基、
      Rc-L-(ここで、Rcは、C1~C6のアルキル基またはC1~C6のハロアルキル基を表し、Lは、S、SO、またはSO2を表す。)、
      またはRdC(=O)-(ここで、Rdは、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表す。)を表し;
     Yは、
      R3で適宜0~5置換されてもよいフェニル基(ただし、2置換以上のR3の場合、それぞれ独立している。)、
      またはR3で適宜0~4置換されてもよいピリジル基(ただし、2置換以上のR3の場合、それぞれ独立している)を表し;
     R3は、
      水酸基、
      シアノ基、
      ハロゲン原子、
      置換基Cで適宜置換されてもよいC1~C6のアルキル基、
      C1~C6のハロアルキル基、
      置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、
      C1~C6のハロアルコキシ基、
      置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、
      C2~C6のハロアルケニルオキシ基、
      置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、
      C3~C6のハロアルキニルオキシ基、
      またはRx1C(=O)O-(ここで、Rx1は、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはRaRbN-(ここで、RaおよびRbは、それぞれ独立していて、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表すか、あるいはRaおよびRbは、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。)を表す。)を表し;
     Zは、
      R4で適宜0~5置換されてもよいフェニル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
      R4で適宜0~4置換されてもよいピリジル基、ピリダジニル基、ピリミジニル基、ピラジニル基、トリアジニル基、もしくはテトラジニル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
      R4で適宜0~3置換されてもよいチエニル基、チアゾリル基、イソチアゾリル基、チアジアゾリル基、もしくはチアトリアゾリル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
      R4で適宜0~4置換されてもよいピロリル基、ピラゾリル基、イミダゾリル基、トリアゾリル基、テトラゾリル基、もしくはペンタゾリル基、(ただし、2置換以上のR4の場合、それぞれ独立している。)、
      またはR4で適宜0~3置換されてもよいフリル基、オキサゾリル基、イソキサゾリル基、オキサジアゾリル基、もしくはオキサトリアゾリル基(ただし、2置換以上のR4の場合、それぞれ独立している。)を表し;
     R4は、
      水酸基、
      ハロゲン原子、
      置換基Cで適宜置換されてもよいC1~C6のアルキル基、
      C1~C6のハロアルキル基、
      置換基Cで適宜置換されてもよいC2~C6のアルケニル基、
      C2~C6のハロアルケニル基、
      置換基Cで適宜置換されてもよいC2~C6のアルキニル基、
      C2~C6のハロアルキニル基、
      置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、
      C1~C6のハロアルコキシ基、
      置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、
      C2~C6のハロアルケニルオキシ基、
      置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、
      C3~C6のハロアルキニルオキシ基、
      Rc-L-(ここで、RcおよびLは、前記と同義である。)、
      Rx1C(=O)-(ここで、Rx1は、前記と同義である。)、
      またはRx1C(=O)O-(ここで、Rx1は、前記と同義である。)を表し;
     R5は、
      水酸基、
      ハロゲン原子、
      置換基Cで適宜置換されてもよいC1~C6のアルキル基、
      C1~C6のハロアルキル基、
      置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、
      C1~C6のハロアルコキシ基、
      置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、
      C2~C6のハロアルケニルオキシ基、
      置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、
      C3~C6のハロアルキニルオキシ基、
      またはRx1C(=O)O-(ここで、Rx1は、前記と同義である。)を表す、
    請求項2に記載の化合物またはその塩。
    R1 is
    A C1 to C6 alkyl group optionally substituted with a substituent A,
    C1 to C6 haloalkyl group,
    A C2-C6 alkenyl group which may be optionally substituted by a substituent A,
    A C 2 -C 6 haloalkenyl group,
    A C2 to C6 alkynyl group which may be optionally substituted by a substituent A,
    Or C2 to C6 haloalkynyl group;
    R2 is
    Hydrogen atom,
    Halogen atom,
    A C1 to C6 alkyl group optionally substituted with a substituent A,
    C1 to C6 haloalkyl group,
    A C1 to C6 alkoxy group which may be optionally substituted by a substituent A,
    A C1 to C6 haloalkoxy group,
    Rc-L- (wherein Rc represents a C1-C6 alkyl group or a C1-C6 haloalkyl group, and L represents S, SO or SO2),
    Or RdC (= O) — (wherein, Rd represents a C1 to C6 alkyl group, a C1 to C6 haloalkyl group, or a C3 to C8 cycloalkyl group which may be optionally substituted with a substituent B). Represents
    Y is
    A phenyl group which may be optionally substituted 0 to 5 as R 3 (however, in the case of R 3 having 2 or more substituents, they are each independently),
    Or a pyridyl group which may be optionally substituted 0 to 4 with R 3 (provided that R 3 s each having 2 or more substituents are independently of each other);
    R3 is
    Hydroxyl group,
    Cyano group,
    Halogen atom,
    A C1 to C6 alkyl group which may be optionally substituted by a substituent C,
    C1 to C6 haloalkyl group,
    A C1 to C6 alkoxy group which may be optionally substituted by a substituent C,
    A C1 to C6 haloalkoxy group,
    A C2-C6 alkenyloxy group which may be optionally substituted by a substituent C,
    C2-C6 haloalkenyloxy group,
    A C3-C6 alkynyloxy group which may be optionally substituted by a substituent C,
    A C3-C6 haloalkynyloxy group,
    Or Rx1C (= O) O— (wherein, Rx1 is a C1-C6 alkyl group optionally substituted with a substituent B, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, C1-C6 Or an alkoxy group of C1 to C6, a haloalkoxy group of C1 to C6, a cycloalkoxy group of C3 to C8, or RaRbN- (wherein Ra and Rb are each independently, and optionally substituted by a hydrogen atom or a substituent B Represents a good C1 to C6 alkyl group, a C1 to C6 haloalkyl group, or a C3 to C8 cycloalkyl group, or Ra and Rb together with the nitrogen atom to which it is attached is an aziridinyl group, azetidinyl group, pyrrolidinyl group A group, piperidinyl group, homopiperidinyl group, or those forming an azocanyl group).
    Z is
    A phenyl group which may be optionally substituted 0 to 5 with R 4 (provided that R 4 has 2 or more substituents, each of which is independently of each other),
    A pyridyl group, a pyridazinyl group, a pyrimidinyl group, a pyrazinyl group, a triazinyl group, or a tetrazinyl group (however, in the case of R4 having two or more substituents, they are each independently.
    Thienyl group which may be optionally substituted by 0 to 4 R 4, thiazolyl group, isothiazolyl group, thiadiazolyl group, or thiatriazolyl group (However, in the case of R 4 having two or more substituents, they are each independently.),
    A pyrrolyl group, a pyrazolyl group, an imidazolyl group, a triazolyl group, a tetrazolyl group, or a pentazolyl group which may be optionally substituted 0 to 4 by R 4 (however, in the case of R 4 having two or more substituents, they are each independently).
    Or R4 represents a furyl group which may be optionally substituted by 0 to 3, an oxazolyl group, an isoxazolyl group, an oxadiazolyl group, or an oxatriazolyl group (provided that they are each independently in the case of R4 having 2 or more substituents). ;
    R4 is
    Hydroxyl group,
    Halogen atom,
    A C1 to C6 alkyl group which may be optionally substituted by a substituent C,
    C1 to C6 haloalkyl group,
    A C2-C6 alkenyl group which may be optionally substituted by a substituent C,
    A C 2 -C 6 haloalkenyl group,
    A C2 to C6 alkynyl group which may be optionally substituted by a substituent C,
    A C2 to C6 haloalkynyl group,
    A C1 to C6 alkoxy group which may be optionally substituted by a substituent C,
    A C1 to C6 haloalkoxy group,
    A C2-C6 alkenyloxy group which may be optionally substituted by a substituent C,
    C2-C6 haloalkenyloxy group,
    A C3-C6 alkynyloxy group which may be optionally substituted by a substituent C,
    A C3-C6 haloalkynyloxy group,
    Rc-L- (wherein Rc and L are as defined above),
    Rx1C (= O)-(where Rx1 is the same as the above),
    Or Rx1C (= O) O— (wherein, Rx1 is as defined above);
    R5 is
    Hydroxyl group,
    Halogen atom,
    A C1 to C6 alkyl group which may be optionally substituted by a substituent C,
    C1 to C6 haloalkyl group,
    A C1 to C6 alkoxy group which may be optionally substituted by a substituent C,
    A C1 to C6 haloalkoxy group,
    A C2-C6 alkenyloxy group which may be optionally substituted by a substituent C,
    C2-C6 haloalkenyloxy group,
    A C3-C6 alkynyloxy group which may be optionally substituted by a substituent C,
    A C3-C6 haloalkynyloxy group,
    Or Rx1C (= O) O— (wherein, Rx1 is as defined above),
    A compound according to claim 2 or a salt thereof.
  4.  R1は、
      置換基Aで適宜置換されてもよいC1~C6のアルキル基、
      またはC1~C6のハロアルキル基を表し;
     R2は、
      水素原子、
      ハロゲン原子、
      置換基Aで適宜置換されてもよいC1~C6のアルキル基、
      または置換基Aで適宜置換されてもよいC1~C6のアルコキシ基を表し;
     Yは、
      R3で適宜0~5置換されてもよいフェニル基(ただし、2置換以上のR3の場合、それぞれ独立している。)を表し;
     R3は、
      水酸基、
      シアノ基、
      ハロゲン原子、
      置換基Cで適宜置換されてもよいC1~C6のアルキル基、
      置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、
      置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、
      置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、
      またはRx1C(=O)O-(ここで、Rx1は、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはRaRbN-(ここで、RaおよびRbは、それぞれ独立していて、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表すか、あるいはRaおよびRbは、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。)を表す。)を表し;
     Zは、
      R4で適宜0~5置換されてもよいフェニル基(ただし、2置換以上のR4の場合、それぞれ独立している。)、
      R4で適宜0~4置換されてもよいピラゾリル基、イミダゾリル基、もしくはトリアゾリル基(ただし、2置換以上のR4の場合、それぞれ独立している。)
      またはR4で適宜0~3置換されてもよいオキサゾリル基、もしくはイソキサゾリル基(ただし、2置換以上のR4の場合、それぞれ独立している。)を表し;
     R4は、
      ハロゲン原子、
      置換基Cで適宜置換されてもよいC1~C6のアルキル基、
      または置換基Cで適宜置換されてもよいC1~C6のアルコキシ基を表し;
     Wは、
      R5で適宜0~2置換されてもよいメチレン基、またはエチレン基(ただし、2置換のR5の場合、それぞれ独立している。)を表し;
     R5は、
      水酸基、
      ハロゲン原子、
      または置換基Cで適宜置換されてもよいC1~C6のアルコキシ基を表す、
    請求項3に記載の化合物、またはその塩。
    R1 is
    A C1 to C6 alkyl group optionally substituted with a substituent A,
    Or a C1 to C6 haloalkyl group;
    R2 is
    Hydrogen atom,
    Halogen atom,
    A C1 to C6 alkyl group optionally substituted with a substituent A,
    Or a C1-C6 alkoxy group optionally substituted by a substituent A;
    Y is
    Represents a phenyl group which may be optionally substituted 0 to 5 with R 3 (provided that R 3 is 2 or more, each of which is independently of each other);
    R3 is
    Hydroxyl group,
    Cyano group,
    Halogen atom,
    A C1 to C6 alkyl group which may be optionally substituted by a substituent C,
    A C1 to C6 alkoxy group which may be optionally substituted by a substituent C,
    A C2-C6 alkenyloxy group which may be optionally substituted by a substituent C,
    A C3-C6 alkynyloxy group which may be optionally substituted by a substituent C,
    Or Rx1C (= O) O— (wherein, Rx1 is a C1-C6 alkyl group optionally substituted with a substituent B, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, C1-C6 Or an alkoxy group of C1 to C6, a haloalkoxy group of C1 to C6, a cycloalkoxy group of C3 to C8, or RaRbN- (wherein Ra and Rb are each independently, and optionally substituted by a hydrogen atom or a substituent B Represents a good C1 to C6 alkyl group, a C1 to C6 haloalkyl group, or a C3 to C8 cycloalkyl group, or Ra and Rb together with the nitrogen atom to which it is attached is an aziridinyl group, azetidinyl group, pyrrolidinyl group A group, piperidinyl group, homopiperidinyl group, or those forming an azocanyl group).
    Z is
    A phenyl group which may be optionally substituted 0 to 5 with R 4 (provided that R 4 has 2 or more substituents, each of which is independently of each other),
    A pyrazolyl group, an imidazolyl group, or a triazolyl group which may be optionally substituted 0 to 4 with R 4 (however, in the case of R 4 having 2 or more substituents, they are each independently).
    Or an oxazolyl group which may be optionally substituted 0 to 3 with R 4, or an isoxazolyl group (provided that R 4 s each having 2 or more substituents each are independently of each other);
    R4 is
    Halogen atom,
    A C1 to C6 alkyl group which may be optionally substituted by a substituent C,
    Or a C1 to C6 alkoxy group optionally substituted by a substituent C;
    W is
    A methylene group which may be optionally substituted by 0 to 2 as R 5, or an ethylene group (provided that they are each independently in the case of R 5 as di-substituted);
    R5 is
    Hydroxyl group,
    Halogen atom,
    Or a C1 to C6 alkoxy group optionally substituted by a substituent C,
    A compound according to claim 3 or a salt thereof.
  5.  請求項1に記載の化合物、またはその塩を有効成分として含有する農園芸用有害生物防除剤。 An agricultural and horticultural pest control agent containing the compound according to claim 1 or a salt thereof as an active ingredient.
  6.  請求項1に記載の化合物、またはその塩を有効成分として含有する農園芸用殺菌剤。 An agricultural and horticultural fungicide comprising the compound according to claim 1 or a salt thereof as an active ingredient.
  7.  請求項5に記載の農園芸用有害生物防除剤を、植物、植物の種子、または植物を栽培する土壌に施用することを含む、植物病害を防除する方法。 A method for controlling plant diseases, which comprises applying the agricultural and horticultural pest control agent according to claim 5 to plants, plant seeds or soil on which plants are grown.
  8.  請求項6に記載の農園芸用殺菌剤を、植物、植物の種子、または植物を栽培する土壌に施用することを含む、植物病害を防除する方法。 A method for controlling plant diseases, which comprises applying the agricultural and horticultural fungicides according to claim 6 to plants, plant seeds, or soil on which plants are grown.
PCT/JP2018/034395 2017-09-20 2018-09-18 Pyridone compound and agricultural and horticultural germicide having same as active ingredient WO2019059161A1 (en)

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