WO2019057071A1 - Pixel structure and active switch array substrate - Google Patents

Pixel structure and active switch array substrate Download PDF

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Publication number
WO2019057071A1
WO2019057071A1 PCT/CN2018/106457 CN2018106457W WO2019057071A1 WO 2019057071 A1 WO2019057071 A1 WO 2019057071A1 CN 2018106457 W CN2018106457 W CN 2018106457W WO 2019057071 A1 WO2019057071 A1 WO 2019057071A1
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Prior art keywords
scan line
thin film
pixel electrode
film transistor
pixel
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PCT/CN2018/106457
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French (fr)
Chinese (zh)
Inventor
何怀亮
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惠科股份有限公司
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Publication of WO2019057071A1 publication Critical patent/WO2019057071A1/en

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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136286Wiring, e.g. gate line, drain line
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1343Electrodes
    • G02F1/134309Electrodes characterised by their geometrical arrangement
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136227Through-hole connection of the pixel electrode to the active element through an insulation layer
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/1368Active matrix addressed cells in which the switching element is a three-electrode device
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/40Arrangements for improving the aperture ratio

Definitions

  • the present application relates to the field of display technologies, and in particular, to a pixel structure and an active switch array substrate.
  • the liquid crystal display has the advantages of high image quality, small size, light weight, low voltage driving, low power consumption and wide application range. Therefore, it has been widely used in medium and small portable TVs, mobile phones, and video recording. Consumer electronics or computer products such as computers, notebook computers, desktop displays and projection TVs, and gradually replaced the cathode ray tube (CRT) to become the mainstream of the display.
  • CRT cathode ray tube
  • liquid crystal displays still have problems such as narrow viewing angle range and high price. Therefore, how to increase the range of viewing angles is one of the urgent problems to be improved.
  • Embodiments of the present application provide a pixel structure and an active switch array substrate to achieve a technical effect of increasing a viewing angle.
  • a pixel structure provided by an embodiment of the present application includes:
  • a pixel electrode the pixel electrode being located in the pixel unit region and electrically connecting the first scan line and the first data line, wherein the pixel electrode is provided from the first scan line to the second At least one slit extending from the scan line, and a length direction of the slit is inclined with respect to a length direction of the first scan line, and a length direction of the slit is inclined with respect to a length direction of the first scan line
  • the angle range is from 75° to 85°.
  • the pixel structure further includes a first thin film transistor and a second thin film transistor, a source of the first thin film transistor is connected to the first data line, and a gate of the first thin film transistor
  • the first scan line is connected to the first scan line
  • the drain of the first thin film transistor is connected to the source of the second thin film transistor
  • the gate of the second thin film transistor is connected to the first scan line
  • the second A drain of the thin film transistor is connected to the pixel electrode.
  • the first thin film transistor and the second thin film transistor are NMOS transistors or PMOS transistors.
  • the pixel electrode is made of a transparent conductive material including one or more of ITO, IZO, and ITZO.
  • a pixel structure provided by an embodiment of the present application includes:
  • a pixel electrode the pixel electrode being located in the pixel unit region and electrically connecting the first scan line and the first data line, wherein the pixel electrode is provided from the first scan line to the second At least one slit extending from the scan line, and a length direction of the slit is inclined with respect to a length direction of the first scan line.
  • the pixel structure further includes a first thin film transistor and a second thin film transistor, a source of the first thin film transistor is connected to the first data line, and a gate of the first thin film transistor
  • the first scan line is connected to the first scan line
  • the drain of the first thin film transistor is connected to the source of the second thin film transistor
  • the gate of the second thin film transistor is connected to the first scan line
  • the second A drain of the thin film transistor is connected to the pixel electrode.
  • the first thin film transistor and the second thin film transistor are NMOS transistors or PMOS transistors.
  • the pixel electrode is made of a transparent conductive material including one or more of ITO, IZO, and ITZO.
  • a source of the first thin film transistor is connected to the first data line, a gate of the first thin film transistor is connected to the first scan line, and the first thin film transistor is a drain is connected to a source of the second thin film transistor, a gate of the second thin film transistor is connected to the first scan line, a drain of the second thin film transistor is connected to the pixel electrode; and the pixel electrode is used
  • the transparent conductive material is made of one or more of ITO, IZO, and ITZO.
  • the first thin film transistor and the second thin film transistor are NMOS transistors or PMOS transistors.
  • an active switch array substrate provided by the embodiment of the present application includes:
  • a second scan line disposed on the transparent substrate and the second scan line being located between the first scan line and the third scan line;
  • first scan line and the second scan line are disposed to intersect with the first data line and the second data line to form a first pixel unit a region
  • second scan line and the third scan line are disposed to intersect with the first data line and the second data line to form a second pixel unit adjacent to the first pixel unit area region
  • first pixel electrode disposed on the transparent substrate and the first pixel electrode being located in the first pixel unit region and electrically connecting the first scan line and the first data line, the first pixel
  • the electrode is provided with at least one first slit extending from the first scan line to the second scan line;
  • a second pixel electrode disposed on the transparent substrate and the second pixel electrode being located in the second pixel unit region and electrically connecting the second scan line and the first data line, the second pixel
  • the electrode is provided with at least one second slit extending from the second scan line to the third scan line;
  • One end of the first slit adjacent to the second scan line is closer to the first data line than an end of the first slit adjacent to the first scan line;
  • One end of the second slit adjacent to the second scan line is closer to the first data line than an end of the second slit adjacent to the third scan line.
  • the angle of the longitudinal direction of the first slit relative to the longitudinal direction of the second scanning line ranges from 75° to 85°.
  • the active switch array substrate further includes: a common electrode disposed on the transparent substrate in the same layer as the first pixel electrode and the second pixel electrode.
  • the active switch array substrate further includes: a common electrode disposed between the first pixel electrode and the second pixel electrode and the transparent substrate.
  • the first pixel electrode and the second pixel electrode are each made of a transparent conductive material, and the transparent conductive material includes one or more of ITO, IZO, and ITZO.
  • the active switch array substrate further includes: a common electrode disposed on the transparent substrate in the same layer as the first pixel electrode and the second pixel electrode.
  • the active switch array substrate further includes: a common electrode disposed between the first pixel electrode and the second pixel electrode and the transparent substrate.
  • the first pixel electrode and the second pixel electrode are each made of a transparent conductive material, and the transparent conductive material includes one or more of ITO, IZO, and ITZO.
  • a pixel electrode is disposed in a pixel unit region that is mutually enclosed by two adjacent scan lines and two adjacent data lines, and at least one slit is obliquely opened on the pixel electrode. It can preset a certain tilt angle for the arrangement of the liquid crystal molecules, so that the viewing angle of the display device having the pixel structure can be improved.
  • FIG. 1 is a schematic layout diagram of a pixel structure in an embodiment of the present application.
  • FIG. 2 is a schematic structural diagram of an active switch array substrate according to another embodiment of the present application.
  • FIG. 3 is another schematic diagram of an active switch array substrate according to another embodiment of the present application.
  • FIG. 4 is a schematic structural diagram of an active switch array substrate according to still another embodiment of the present application.
  • FIG. 5 is another schematic diagram of an active switch array substrate according to still another embodiment of the present application.
  • FIG. 6 is a schematic structural diagram of a display panel in still another embodiment of the present application.
  • FIG. 7 is a schematic structural view of a color filter substrate in still another embodiment of the present application.
  • FIG. 8 is a partial schematic view of a color filter substrate in another embodiment of the present application.
  • FIG. 9 is a schematic structural diagram of a liquid crystal display according to an embodiment of the present application.
  • a pixel structure 100 provided in an embodiment of the present invention includes: adjacently disposed scan lines 111 and scan lines 112 , adjacently disposed data lines 121 and data lines 122 , and pixel electrodes 130 . .
  • the scan lines 111 and 112 are arranged to intersect with the data line 121 and the data line 122 to form a pixel unit area, and the pixel electrode 130 is located in the pixel unit area.
  • the pixel electrode 130 is provided with at least one slit 131 extending from the scanning line 111 to the scanning line 112, and the longitudinal direction of the slit 131 is inclined with respect to the longitudinal direction of the scanning line 111 (for example, the horizontal direction of FIG. 1).
  • the scan line 111 and the scan line 112 are disposed substantially in parallel, and the data line 121 and the data line 122 are also disposed substantially in parallel, so that the scan line 111, the scan line 112, the data line 121, and the data line 122 together form a
  • the pixel unit region is substantially quadrangular, and the pixel electrode 130 is located in the pixel unit region and electrically connects the scan line 111 and the data line 121.
  • at least one slit for example, two slits 131 are provided on the pixel electrode 130, and if there are a plurality of slits 131, the slits 131 are, for example, substantially parallel to each other.
  • Each slit 131 extends from the scanning line 111 to the scanning line 112 and penetrates through the pixel electrode 130, or in other words, the slit 131 has a hollow structure and is closed at both ends. Of course, it may be a hollow structure with one end closed and the other end open.
  • the pixel electrode 130 is typically a transparent electrode such as an ITO (Indium Tin Oxide) electrode, and the length direction of the slit 131 is inclined with respect to the length direction of the scanning line 111, specifically, the slit 131 and the scanning line. The angle ⁇ of 111 ranges from 75° to 85°.
  • the pixel electrode 130 is made of a transparent conductive material such as one or more of ITO, IZO (Indium Zinc Oxide, Indium Tin Zinc Oxide, ITZO (Indium Tin Zinc Oxide).
  • the pixel structure 100 further includes a thin film transistor 140 and a thin film transistor 150.
  • the source 141 of the thin film transistor 140 is connected to the data line 121
  • the gate 142 of the thin film transistor 140 is connected to the scan line 111
  • the drain 143 of the thin film transistor 140 is connected to the source 151 of the thin film transistor 150
  • the gate 152 of the thin film transistor 150 is connected to the scan line.
  • 111 and the drain 153 of the thin film transistor 150 are connected to the pixel electrode 130.
  • the thin film transistor 140 and the thin film transistor 150 are connected in series between the data line 121 and the pixel electrode 130 and the gates 142, 153 of both are connected to the same scan line 111; by passing the thin film transistor 140 and the thin film transistor
  • the series connection of 150 can reduce the leakage current of the pixel structure 100 and maintain the voltage of the pixel electrode 130.
  • the drain electrode 143 of the thin film transistor 140 extends from one side of the data line 121 across the data line 121 and is connected to the source 151 of the thin film transistor 150.
  • the source 141 of the thin film transistor 140 and the drain 153 of the thin film transistor 150 are located on the same side of the scan line 111 (for example, the upper side of the scan line 111 in FIG. 1), and the drain 143 of the thin film transistor 140 and the thin film transistor 150
  • the source 151 is located on the other opposite side of the scan line 111 (for example, the lower side of the scan line 111 in FIG. 1), so that the overall layout structure of the thin film transistor 140 and the thin film transistor 150 is substantially U-shaped, and the layout manner can be greatly improved. Increase the pixel aperture ratio.
  • the thin film transistors 140, 150 may be NMOS transistors or PMOS transistors; of course, the thin film transistors 140, 150 may also be replaced with other three-terminal active devices.
  • the pixel structure 100 provided in this embodiment has one or more slits extending from one scan line 111 of the adjacent two scan lines 111, 112 to the other scan line 112 in the pixel electrode 130.
  • 131, and the length direction of the slit 131 is inclined with respect to the length direction of the scanning line 111/112, which can preset a certain inclination angle for the arrangement of the liquid crystal molecules, thereby being able to significantly improve the display device having the pixel structure 100. View angle.
  • the double thin film transistors 140 and 150 are disposed in series to reduce the leakage current of the pixel structure 100 and maintain the voltage of the pixel electrode 130.
  • the layout structure of the dual thin film transistors 140, 150 can effectively increase the pixel aperture ratio.
  • an active switch array substrate 200 includes: a transparent substrate 250 and scan lines 211 , scan lines 212 , and scan lines 213 disposed on the transparent substrate 250 .
  • the data line 221, the data line 222, the pixel electrode 230, and the pixel electrode 240, the scan line 212 is located between the scan line 211 and the scan line 213, the scan line 211 is disposed adjacent to the scan line 212, and the scan line 212 is opposite to the scan line 213.
  • the scan line 211 and the scan line 212 intersect with the data line 221 and the data line 222 to form a first pixel unit area.
  • the scan line 212 and the scan line 213 are intersected with the data line 221 and the data line 222 to form a second. a pixel unit region, the first pixel unit region being adjacent to the second pixel unit region.
  • the pixel electrode 230 is located in the first pixel unit region and electrically connects the scan line 211 and the data line 221, and the pixel electrode 230 is provided with at least one slit 231 extending from the scan line 211 to the scan line 212.
  • the pixel electrode 240 is located in the second pixel unit region and electrically connects the scan line 212 and the data line 221, and the pixel electrode 240 is provided with at least one slit 241 extending from the scan line 212 to the scan line 213.
  • Each slit 231 on the pixel electrode 230 is adjacent to one end of the scan line 212 closer to the data line 221 with respect to an end thereof adjacent to the scan line 211.
  • Each of the slits 241 on the pixel electrode 240 is adjacent to the data line 221 adjacent to one end of the scanning line 212 with respect to an end thereof adjacent to the scanning line 213.
  • the inclination angle ⁇ of the longitudinal direction of each slit 241 with respect to the longitudinal direction of the scanning line 212 ranges from 75° to 85°; similarly, the length direction of each slit 231 is relative to the scanning.
  • the angle of inclination of the line 212 in the longitudinal direction also ranges from 75° to 85°.
  • the electrical connection between the pixel electrode 230 located in the first pixel unit region and the scan line 211 and the data line 221 may be similar to the pixel electrode 130 in FIG. 1 by two series-connected three-terminal active
  • the device is implemented, for example, by two thin-film transistors connected in series; the electrical connection method in which the double thin film transistors are connected in series can reduce the leakage current of the pixel structure and maintain the voltage of the pixel electrode 230; further, the dual thin film transistor
  • the layout structure can also be U-shaped as shown in FIG. 1, or even other shapes such as a V-shape to increase the pixel aperture ratio.
  • the electrical connection between the pixel electrode 240 located in the second pixel unit region and the scan line 212 and the data line 221 may be similar to the pixel electrode 130 in FIG. 1 by two serially connected three-terminal active devices.
  • two thin film transistors connected in series are used; the electrical connection method in which the double thin film transistors are connected in series can reduce the leakage current of the pixel structure and maintain the voltage of the pixel electrode 240; further, the layout of the double thin film transistor
  • the structure may also be U-shaped as shown in FIG. 1, or even other shapes such as V-type to increase the pixel aperture ratio.
  • the pixel electrode 230 and the pixel electrode 240 are both made of a transparent conductive material, such as one or more of ITO, IZO (Indium Zinc Oxide, Indium Tin Zinc Oxide, ITZO (Indium Tin Zinc Oxide) .
  • the active switch array substrate 200 further includes a common electrode 260.
  • the common electrode 260 is disposed on the transparent substrate 250 in the same layer as the pixel electrode 230 and the pixel electrode 240. Therefore, the technical solution of the embodiment is applicable to a liquid crystal display device of an IPS (In Plane Switching) mode, and has a viewing angle. Large, fine colors and other advantages.
  • IPS In Plane Switching
  • the common electrode 260 and the pixel electrode 230/240 are alternately arranged in the horizontal direction shown in FIG. 3, so that a plane can be formed between the pixel electrode 230/240 and the common electrode 260 adjacent thereto. An electric field or transverse electric field.
  • an active switch array substrate 300 includes: a transparent substrate 350 and scan lines 311 , scan lines 312 , and scan lines 313 disposed on the transparent substrate 350 .
  • the scan line 312 is located between the scan line 311 and the scan line 313.
  • the scan line 311 is disposed adjacent to the scan line 312 and the scan line 312 is opposite to the scan line 313. Neighbor settings.
  • the scan line 311 and the scan line 312 are intersected with the data line 321 and the data line 322 to form a first pixel unit area.
  • the scan line 312 and the scan line 313 are intersected with the data line 321 and the data line 322 to form a second. a pixel unit region, the first pixel unit region being adjacent to the second pixel unit region.
  • the pixel electrode 330 is located in the first pixel unit region and electrically connects the scan line 311 and the data line 321 , and the pixel electrode 330 is provided with at least one slit 331 extending from the scan line 311 to the scan line 312 .
  • the pixel electrode 340 is located in the second pixel unit region and electrically connects the scan line 312 and the data line 321 , and the pixel electrode 340 is provided with at least one narrow slit 341 extending from the scan line 312 to the scan line 313 .
  • Each of the slits 331 on the pixel electrode 330 is adjacent to the data line 321 adjacent to one end of the scanning line 312 with respect to an end thereof adjacent to the scanning line 311.
  • Each of the slits 341 on the pixel electrode 340 is adjacent to the data line 321 adjacent to one end of the scanning line 312 with respect to an end thereof adjacent to the scanning line 313.
  • the inclination angle ⁇ of the longitudinal direction of each slit 331 with respect to the longitudinal direction of the scanning line 312 ranges from 75° to 85°, and similarly, the length direction of each slit 341 is relative to the scanning.
  • the angle of inclination of the line 312 in the longitudinal direction is also ⁇ .
  • the electrical connection between the pixel electrode 330 located in the first pixel unit region and the scan line 311 and the data line 321 may be similar to the pixel electrode 130 in FIG.
  • the device is implemented, for example, by two thin-film transistors connected in series; the electrical connection method in which the double thin film transistors are connected in series can reduce the leakage current of the pixel structure and maintain the voltage of the pixel electrode 330; further, the double thin film transistor
  • the layout structure can also be U-shaped as shown in FIG. 1, or even other shapes such as a V-shape to increase the pixel aperture ratio.
  • the electrical connection between the pixel electrode 340 located in the second pixel unit region and the scan line 312 and the data line 321 may be similar to the pixel electrode 130 in FIG.
  • the structure may also be U-shaped as shown in FIG. 1, or even other shapes such as V-type to increase the pixel aperture ratio.
  • the technical solution of the present embodiment is similar to the foregoing technical solution of the second embodiment, except that the common electrode 360 in the embodiment is disposed between the pixel electrode 330 and the pixel electrode 340 and the transparent substrate 350, and Typically, the common electrode 360 is disposed entirely under the pixel electrodes 330, 340 such that the pixel electrodes 330, 340 can form a fringing electric field with the underlying common electrode 360.
  • the scheme is suitable for a liquid crystal display device of FFS (Fringe Field Switching) mode.
  • FFS Flexible Field Switching
  • the FFS technology rotates the liquid crystal molecules which are almost homogeneously arranged in the surface on the surface of the electrode by the fringe electric field, and has a wide viewing angle and high penetration. , low power consumption and other advantages, can achieve high penetration and large viewing angle requirements.
  • a display panel 400 includes a thin film transistor substrate 410 , a color filter substrate 420 , and a liquid crystal interposed between the thin film transistor 410 and the color filter substrate 420 .
  • Layer 440 The thin film transistor substrate 410 , a color filter substrate 420 , and a liquid crystal interposed between the thin film transistor 410 and the color filter substrate 420 .
  • the active switch array substrate 410 includes a plurality of pixel structures (refer to the pixel structure 100 described in FIG. 1 ), and three pixel electrodes 411 (corresponding to three pixel structures) are illustrated in FIG. 6 as an example. Not shown. Specifically, each of the pixel structures includes, for example, a first scan line, a second scan line adjacent to the first scan line, a first data line, a second data line adjacent to the first data line, and a pixel electrode 411 The first scan line and the second scan line are disposed to intersect with the first data line and the second data line to form a pixel unit area, and the pixel electrode 411 is located in the pixel unit area and is electrically Connecting the first scan line and the first data line, the pixel electrode 411 is provided with at least one slit extending from the first scan line to the second scan line, and each slit is adjacent to the One end of the second scan line is closer to or farther from the first data line with respect to an end thereof adjacent to the first scan line. It is to be
  • the color filter substrate 420 is disposed opposite to the active switch array substrate 410.
  • the color filter substrate 420 is formed with a plurality of color filters 430 respectively corresponding to the plurality of pixel structures having the pixel electrodes 411, and the length of each of the color filters 430.
  • the direction is parallel to the longitudinal direction of the slit of the pixel electrode 411 of the pixel structure corresponding to the color filter 430.
  • each of the color filters 430 on the color filter substrate 420 is, for example, one of a red (R) filter, a green (G) filter, and a blue (B) filter, and each In the one-line color filter 430, the color filters 430 of the three colors are sequentially spaced and each of the color filters 430 corresponds to one pixel electrode 411. Based on such a structure, the display panel 400 can achieve a large viewing angle.
  • the inclination angle of the longitudinal direction of the slit on the pixel electrode 411 with respect to the longitudinal direction of the second scanning line (refer to ⁇ in FIGS. 2 and 4) may be selected from the range of 75° to 85°. To achieve a better viewing angle.
  • adjacent two color filters 430 extend obliquely in opposite directions.
  • the two adjacent color filters 430 include a first color filter 431 and a second color filter 432.
  • the first color filter 431 includes a first end 4311 and a second end 4312.
  • One end 4311 extends obliquely toward the second end 4312
  • the second color filter 432 includes a third end 4321 and a fourth end 4322 and extends obliquely from the third end 4321 to the fourth end 4322, and the second end 4312 and the third end Ends 4321 are adjacent.
  • the first projection 4313 of the first color filter 431 and the second projection 4323 of the second color filter 432 partially overlap in the row direction, in other words, the color filter substrate.
  • the color filters 430 between adjacent rows on 420 are staggered in the row direction.
  • the color filter substrate 420 of the display panel 400 can be better adapted to the active switch array substrate 410 to achieve a larger viewing angle, increase the light transmittance, and also change the color difference to make the display Better results.
  • the "row direction" and the "column direction” described in the embodiments of the present application may be interchanged.
  • an embodiment of the present application provides a liquid crystal display 500.
  • the backlight module 510 and the display panel 520 are included.
  • the display panel 520 can adopt the display of the above embodiment.
  • the disclosed system, apparatus, and method may be implemented in other manners.
  • the device embodiments described above are merely illustrative.
  • the division of the unit is only a logical function division.
  • there may be another division manner for example, multiple units or components may be combined or Can be integrated into another system, or some features can be ignored or not executed.
  • the mutual coupling or direct coupling or communication connection shown or discussed may be an indirect coupling or communication connection through some interface, device or unit, and may be in an electrical, mechanical or other form.
  • the units described as separate components may or may not be physically separated, and the components displayed as units may or may not be physical units, that is, may be located in one place, or may be distributed to multiple network units. Some or all of the units may be selected according to actual needs to achieve the purpose of the solution of the embodiment.

Abstract

A pixel structure (100) and an active switch array substrate (200). The pixel structure (100) comprises: a first scan line (111); a second scan line (112), which is adjacent to the first scan line (111); a first data line (121);, a second data line (122), which is adjacent to the first data line (121); and a pixel electrode (130). The first scan line (111) and the second scan line (112) are arranged to intersect with the first data line (121) and the second data line (122) to jointly enclose a pixel unit region. The pixel electrode (130) is located in the pixel unit region and is electrically connected to the first scan line (111) and the first data line (121), at least one slit (131) extending from the first scan line (111) to the second scan line (112) is arranged on the pixel electrode (130), and the length direction of the slit (131) is inclined with respect to the length direction of the first scan line (111).

Description

像素结构及主动开关阵列基板Pixel structure and active switch array substrate 技术领域Technical field
本申请涉及显示技术领域,尤其涉及一种像素结构及主动开关阵列基板。The present application relates to the field of display technologies, and in particular, to a pixel structure and an active switch array substrate.
背景技术Background technique
液晶显示器具有高画质、体积小、重量轻、低电压驱动、低消耗功率及应用范围广等优点,因此,已被广泛的应用在中、小型可携式电视、行动电话、摄录放影机、笔记型电脑、桌上型显示器以及投影电视等消费性电子或电脑产品,并且更逐渐取代阴极射线管(Cathode Ray Tube,CRT)而成为显示器的主流。然而,液晶显示器仍有视角范围狭窄与价格偏高等问题,因此如何增加其视角范围,是目前急需改善的课题之一。The liquid crystal display has the advantages of high image quality, small size, light weight, low voltage driving, low power consumption and wide application range. Therefore, it has been widely used in medium and small portable TVs, mobile phones, and video recording. Consumer electronics or computer products such as computers, notebook computers, desktop displays and projection TVs, and gradually replaced the cathode ray tube (CRT) to become the mainstream of the display. However, liquid crystal displays still have problems such as narrow viewing angle range and high price. Therefore, how to increase the range of viewing angles is one of the urgent problems to be improved.
发明内容Summary of the invention
本申请的实施例提供一种像素结构以及一种主动开关阵列基板,以实现增大可视角度的技术效果。Embodiments of the present application provide a pixel structure and an active switch array substrate to achieve a technical effect of increasing a viewing angle.
一方面,本申请实施例提供的一种像素结构,包括:In one aspect, a pixel structure provided by an embodiment of the present application includes:
第一扫描线;First scan line;
第二扫描线,与所述第一扫描线相邻;a second scan line adjacent to the first scan line;
第一数据线;First data line;
第二数据线,与所述第一数据线相邻,所述第一扫描线及所述第二扫 描线与所述第一数据线及所述第二数据线交叉设置共同围成一个像素单元区域;以及a second data line adjacent to the first data line, wherein the first scan line and the second scan line are disposed to intersect with the first data line and the second data line to form a pixel unit Area;
像素电极,所述像素电极位于所述像素单元区域内且电连接所述第一扫描线和所述第一数据线,所述像素电极上设有从所述第一扫描线向所述第二扫描线延伸的至少一条狭隙,且所述狭隙的长度方向相对于所述第一扫描线的长度方向倾斜,所述狭隙的长度方向相对于所述第一扫描线的长度方向倾斜的夹角取值范围为75°~85°。a pixel electrode, the pixel electrode being located in the pixel unit region and electrically connecting the first scan line and the first data line, wherein the pixel electrode is provided from the first scan line to the second At least one slit extending from the scan line, and a length direction of the slit is inclined with respect to a length direction of the first scan line, and a length direction of the slit is inclined with respect to a length direction of the first scan line The angle range is from 75° to 85°.
在本申请的一个实施例中,所述像素结构还包括第一薄膜晶体管和第二薄膜晶体管,所述第一薄膜晶体管的源极连接所述第一数据线,所述第一薄膜晶体管的栅极连接所述第一扫描线,所述第一薄膜晶体管的漏极连接所述第二薄膜晶体管的源极,所述第二薄膜晶体管的栅极连接所述第一扫描线,所述第二薄膜晶体管的漏极连接所述像素电极。In an embodiment of the present application, the pixel structure further includes a first thin film transistor and a second thin film transistor, a source of the first thin film transistor is connected to the first data line, and a gate of the first thin film transistor The first scan line is connected to the first scan line, the drain of the first thin film transistor is connected to the source of the second thin film transistor, and the gate of the second thin film transistor is connected to the first scan line, the second A drain of the thin film transistor is connected to the pixel electrode.
在本申请的一个实施例中,第一薄膜晶体管和第二薄膜晶体管为NMOS晶体管或PMOS晶体管。In one embodiment of the present application, the first thin film transistor and the second thin film transistor are NMOS transistors or PMOS transistors.
在本申请的一个实施例中,所述像素电极采用透明导电材料制成,所述透明导电材料包括ITO、IZO和ITZO中的一种或多种。In one embodiment of the present application, the pixel electrode is made of a transparent conductive material including one or more of ITO, IZO, and ITZO.
另一方面,本申请实施例提供的一种像素结构,包括:On the other hand, a pixel structure provided by an embodiment of the present application includes:
第一扫描线;First scan line;
第二扫描线,与所述第一扫描线相邻;a second scan line adjacent to the first scan line;
第一数据线;First data line;
第二数据线,与所述第一数据线相邻,所述第一扫描线及所述第二扫 描线与所述第一数据线及所述第二数据线交叉设置共同围成一个像素单元区域;以及a second data line adjacent to the first data line, wherein the first scan line and the second scan line are disposed to intersect with the first data line and the second data line to form a pixel unit Area;
像素电极,所述像素电极位于所述像素单元区域内且电连接所述第一扫描线和所述第一数据线,所述像素电极上设有从所述第一扫描线向所述第二扫描线延伸的至少一条狭隙,且所述狭隙的长度方向相对于所述第一扫描线的长度方向倾斜。a pixel electrode, the pixel electrode being located in the pixel unit region and electrically connecting the first scan line and the first data line, wherein the pixel electrode is provided from the first scan line to the second At least one slit extending from the scan line, and a length direction of the slit is inclined with respect to a length direction of the first scan line.
在本申请的一个实施例中,所述像素结构还包括第一薄膜晶体管和第二薄膜晶体管,所述第一薄膜晶体管的源极连接所述第一数据线,所述第一薄膜晶体管的栅极连接所述第一扫描线,所述第一薄膜晶体管的漏极连接所述第二薄膜晶体管的源极,所述第二薄膜晶体管的栅极连接所述第一扫描线,所述第二薄膜晶体管的漏极连接所述像素电极。In an embodiment of the present application, the pixel structure further includes a first thin film transistor and a second thin film transistor, a source of the first thin film transistor is connected to the first data line, and a gate of the first thin film transistor The first scan line is connected to the first scan line, the drain of the first thin film transistor is connected to the source of the second thin film transistor, and the gate of the second thin film transistor is connected to the first scan line, the second A drain of the thin film transistor is connected to the pixel electrode.
在本申请的一个实施例中,第一薄膜晶体管和第二薄膜晶体管为NMOS晶体管或PMOS晶体管。In one embodiment of the present application, the first thin film transistor and the second thin film transistor are NMOS transistors or PMOS transistors.
在本申请的一个实施例中,所述像素电极采用透明导电材料制成,所述透明导电材料包括ITO、IZO和ITZO中的一种或多种。In one embodiment of the present application, the pixel electrode is made of a transparent conductive material including one or more of ITO, IZO, and ITZO.
在本申请的一个实施例中,所述第一薄膜晶体管的源极连接所述第一数据线,所述第一薄膜晶体管的栅极连接所述第一扫描线,所述第一薄膜晶体管的漏极连接所述第二薄膜晶体管的源极,所述第二薄膜晶体管的栅极连接所述第一扫描线,所述第二薄膜晶体管的漏极连接所述像素电极;所述像素电极采用透明导电材料制成,所述透明导电材料包括ITO、IZO和ITZO中的一种或多种。In an embodiment of the present application, a source of the first thin film transistor is connected to the first data line, a gate of the first thin film transistor is connected to the first scan line, and the first thin film transistor is a drain is connected to a source of the second thin film transistor, a gate of the second thin film transistor is connected to the first scan line, a drain of the second thin film transistor is connected to the pixel electrode; and the pixel electrode is used The transparent conductive material is made of one or more of ITO, IZO, and ITZO.
在本申请的一个实施例中,第一薄膜晶体管和第二薄膜晶体管为NMOS晶体管或PMOS晶体管。In one embodiment of the present application, the first thin film transistor and the second thin film transistor are NMOS transistors or PMOS transistors.
另外,本申请实施例提供的一种主动开关阵列基板,包括:In addition, an active switch array substrate provided by the embodiment of the present application includes:
透明基板;Transparent substrate;
以及第一扫描线,设置在所述透明基板上;And a first scan line disposed on the transparent substrate;
第三扫描线,设置在所述透明基板上;a third scan line disposed on the transparent substrate;
第二扫描线,设置在所述透明基板上且所述第二扫描线位于所述第一扫描线和所述第三扫描线之间;a second scan line disposed on the transparent substrate and the second scan line being located between the first scan line and the third scan line;
第一数据线,设置在所述透明基板上;a first data line disposed on the transparent substrate;
第二数据线,设置在所述透明基板上,所述第一扫描线及所述第二扫描线与所述第一数据线及所述第二数据线交叉设置共同围成一个第一像素单元区域,所述第二扫描线及所述第三扫描线与所述第一数据线及所述第二数据线交叉设置共同围成与所述第一像素单元区域相邻的一个第二像素单元区域;a second data line disposed on the transparent substrate, wherein the first scan line and the second scan line are disposed to intersect with the first data line and the second data line to form a first pixel unit a region, the second scan line and the third scan line are disposed to intersect with the first data line and the second data line to form a second pixel unit adjacent to the first pixel unit area region;
第一像素电极,设置在所述透明基板上且所述第一像素电极位于所述第一像素单元区域内且电连接所述第一扫描线和所述第一数据线,所述第一像素电极上设有从所述第一扫描线向所述第二扫描线延伸的至少一条第一狭隙;a first pixel electrode disposed on the transparent substrate and the first pixel electrode being located in the first pixel unit region and electrically connecting the first scan line and the first data line, the first pixel The electrode is provided with at least one first slit extending from the first scan line to the second scan line;
第二像素电极,设置在所述透明基板上且所述第二像素电极位于所述第二像素单元区域内且电连接所述第二扫描线和所述第一数据线,所述第二像素电极上设有从所述第二扫描线向所述第三扫描线延伸的至少一条第 二狭隙;a second pixel electrode disposed on the transparent substrate and the second pixel electrode being located in the second pixel unit region and electrically connecting the second scan line and the first data line, the second pixel The electrode is provided with at least one second slit extending from the second scan line to the third scan line;
所述第一狭隙邻近所述第二扫描线的一端相对于所述第一狭隙邻近所述第一扫描线的一端更靠近所述第一数据线;One end of the first slit adjacent to the second scan line is closer to the first data line than an end of the first slit adjacent to the first scan line;
所述第二狭隙邻近所述第二扫描线的一端相对于所述第二狭隙邻近所述第三扫描线的一端更靠近所述第一数据线。One end of the second slit adjacent to the second scan line is closer to the first data line than an end of the second slit adjacent to the third scan line.
在本申请的一个实施例中,所述第一狭隙的长度方向相对于所述第二扫描线的长度方向倾斜的夹角取值范围为75°~85°。In an embodiment of the present application, the angle of the longitudinal direction of the first slit relative to the longitudinal direction of the second scanning line ranges from 75° to 85°.
在本申请的一个实施例中,所述主动开关阵列基板还包括:公共电极,与所述第一像素电极及所述第二像素电极同层设置在所述透明基板上。In an embodiment of the present application, the active switch array substrate further includes: a common electrode disposed on the transparent substrate in the same layer as the first pixel electrode and the second pixel electrode.
在本申请的一个实施例中,所述主动开关阵列基板还包括:公共电极,设置在所述第一像素电极及所述第二像素电极和所述透明基板之间。In an embodiment of the present application, the active switch array substrate further includes: a common electrode disposed between the first pixel electrode and the second pixel electrode and the transparent substrate.
在本申请的一个实施例中,所述第一像素电极和第二像素电极均采用透明导电材料制成,所述透明导电材料包括ITO、IZO和ITZO中的一种或多种。In an embodiment of the present application, the first pixel electrode and the second pixel electrode are each made of a transparent conductive material, and the transparent conductive material includes one or more of ITO, IZO, and ITZO.
在本申请的一个实施例中,所述主动开关阵列基板还包括:公共电极,与所述第一像素电极及所述第二像素电极同层设置在所述透明基板上。In an embodiment of the present application, the active switch array substrate further includes: a common electrode disposed on the transparent substrate in the same layer as the first pixel electrode and the second pixel electrode.
在本申请的一个实施例中,所述主动开关阵列基板还包括:公共电极,设置在所述第一像素电极及所述第二像素电极和所述透明基板之间。In an embodiment of the present application, the active switch array substrate further includes: a common electrode disposed between the first pixel electrode and the second pixel electrode and the transparent substrate.
在本申请的一个实施例中,所述第一像素电极和第二像素电极均采用透明导电材料制成,所述透明导电材料包括ITO、IZO和ITZO中的一种或多种。In an embodiment of the present application, the first pixel electrode and the second pixel electrode are each made of a transparent conductive material, and the transparent conductive material includes one or more of ITO, IZO, and ITZO.
上述技术方案具有如下优点:在由相邻的两条扫描线和相邻的两条数据线交叉设置共同围成的像素单元区域中设置像素电极,且在像素电极上倾斜开设有至少一条狭隙,其能够为液晶分子的排布预置一定的倾斜角度,从而可以提高具有该像素结构的显示设备的可视角度。The above technical solution has the advantages that a pixel electrode is disposed in a pixel unit region that is mutually enclosed by two adjacent scan lines and two adjacent data lines, and at least one slit is obliquely opened on the pixel electrode. It can preset a certain tilt angle for the arrangement of the liquid crystal molecules, so that the viewing angle of the display device having the pixel structure can be improved.
附图说明DRAWINGS
为了更清楚地说明本申请实施例的技术方案,下面将对实施例描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本申请的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings used in the description of the embodiments will be briefly described below. It is obvious that the drawings in the following description are only some embodiments of the present application, Those skilled in the art can also obtain other drawings based on these drawings without paying any creative work.
图1为本申请一实施例中的像素结构的布局示意图;1 is a schematic layout diagram of a pixel structure in an embodiment of the present application;
图2为本申请另一实施例中的主动开关阵列基板的结构示意图;2 is a schematic structural diagram of an active switch array substrate according to another embodiment of the present application;
图3为本申请另一实施例中的主动开关阵列基板的另一示意图;3 is another schematic diagram of an active switch array substrate according to another embodiment of the present application;
图4为本申请再一实施例中的主动开关阵列基板的结构示意图;4 is a schematic structural diagram of an active switch array substrate according to still another embodiment of the present application;
图5为本申请再一实施例中的主动开关阵列基板的另一示意图;FIG. 5 is another schematic diagram of an active switch array substrate according to still another embodiment of the present application; FIG.
图6为本申请又一实施例中的显示面板的结构示意图;6 is a schematic structural diagram of a display panel in still another embodiment of the present application;
图7为本申请又一实施例中的彩膜基板的结构示意图;7 is a schematic structural view of a color filter substrate in still another embodiment of the present application;
图8为本申请其它实施例中的彩膜基板的局部示意图;8 is a partial schematic view of a color filter substrate in another embodiment of the present application;
图9为本申请一实施例中的液晶显示器的结构示意图。FIG. 9 is a schematic structural diagram of a liquid crystal display according to an embodiment of the present application.
具体实施方式Detailed ways
下面将结合本申请实施例中的附图,对本申请实施例中的技术方案 进行清楚、完整地描述,显然,所描述的实施例仅仅是本申请一部分实施例,而不是全部的实施例。基于本申请中的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本申请保护的范围。The technical solutions in the embodiments of the present application are clearly and completely described in the following with reference to the drawings in the embodiments of the present application. It is obvious that the described embodiments are only a part of the embodiments of the present application, and not all of the embodiments. All other embodiments obtained by a person of ordinary skill in the art based on the embodiments of the present application without departing from the inventive scope are the scope of the present application.
如图1所示,本申请一实施例中提供的一种像素结构100,包括:相邻设置的扫描线111和扫描线112、相邻设置的数据线121和数据线122、以及像素电极130。扫描线111及112与数据线121及数据线122交叉设置共同围成一个像素单元区域,像素电极130位于所述像素单元区域内。此外,像素电极130上设有从扫描线111向扫描线112延伸的至少一条狭隙131,狭隙131的长度方向相对于扫描线111的长度方向(例如图1的水平方向)倾斜。As shown in FIG. 1 , a pixel structure 100 provided in an embodiment of the present invention includes: adjacently disposed scan lines 111 and scan lines 112 , adjacently disposed data lines 121 and data lines 122 , and pixel electrodes 130 . . The scan lines 111 and 112 are arranged to intersect with the data line 121 and the data line 122 to form a pixel unit area, and the pixel electrode 130 is located in the pixel unit area. Further, the pixel electrode 130 is provided with at least one slit 131 extending from the scanning line 111 to the scanning line 112, and the longitudinal direction of the slit 131 is inclined with respect to the longitudinal direction of the scanning line 111 (for example, the horizontal direction of FIG. 1).
本实施例中,扫描线111和扫描线112大致平行设置,而数据线121和数据线122也是大致平行设置,因此扫描线111、扫描线112、数据线121和数据线122共同围成了一个大致呈四边形的像素单元区域,而像素电极130位于所述像素单元区域内并电连接扫描线111和数据线121。再者,在像素电极130上设有至少一条例如两条狭隙131,如果为多条狭隙131则各条狭隙131例如大致互相平行。每一条狭隙131为从扫描线111向扫描线112延伸并贯穿像素电极130,或换而言之狭缝131为镂空结构且两端封闭,当然也可以是一端封闭而另一端开口的镂空结构;像素电极130典型地为透明电极例如ITO(Indium Tin Oxide,铟锡氧化物)电极,狭隙131的长度方向相对于扫描线111的长度方向是倾斜,具体来说,狭隙 131和扫描线111的夹角α取值范围为75°~85°。像素电极130采用透明导电材料制成,例如ITO、IZO(Indium Zinc Oxide,铟锌氧化物)、ITZO(Indium Tin Zinc Oxide,铟锡锌氧化物)中的一种或者多种。In this embodiment, the scan line 111 and the scan line 112 are disposed substantially in parallel, and the data line 121 and the data line 122 are also disposed substantially in parallel, so that the scan line 111, the scan line 112, the data line 121, and the data line 122 together form a The pixel unit region is substantially quadrangular, and the pixel electrode 130 is located in the pixel unit region and electrically connects the scan line 111 and the data line 121. Furthermore, at least one slit, for example, two slits 131 are provided on the pixel electrode 130, and if there are a plurality of slits 131, the slits 131 are, for example, substantially parallel to each other. Each slit 131 extends from the scanning line 111 to the scanning line 112 and penetrates through the pixel electrode 130, or in other words, the slit 131 has a hollow structure and is closed at both ends. Of course, it may be a hollow structure with one end closed and the other end open. The pixel electrode 130 is typically a transparent electrode such as an ITO (Indium Tin Oxide) electrode, and the length direction of the slit 131 is inclined with respect to the length direction of the scanning line 111, specifically, the slit 131 and the scanning line. The angle α of 111 ranges from 75° to 85°. The pixel electrode 130 is made of a transparent conductive material such as one or more of ITO, IZO (Indium Zinc Oxide, Indium Tin Zinc Oxide, ITZO (Indium Tin Zinc Oxide).
承上述,像素结构100还包括薄膜晶体管140和薄膜晶体管150。薄膜晶体管140的源极141连接数据线121,薄膜晶体管140的栅极142连接扫描线111,薄膜晶体管140的漏极143连接薄膜晶体管150的源极151,薄膜晶体管150的栅极152连接扫描线111以及薄膜晶体管150的漏极153连接像素电极130。换而言之,薄膜晶体管140和薄膜晶体管150串联连接在数据线121和像素电极130之间并且两者的栅极142、153均连接至同一条扫描线111;通过将薄膜晶体管140和薄膜晶体管150串联,既能够减小像素结构100的漏电流,又能够保持像素电极130的电压。再者,从图1的像素结构100的布局(Layout)结构还可以得知:薄膜晶体管140的漏极143自数据线121的一侧延伸跨越数据线121后与薄膜晶体管150的源极151相连,薄膜晶体管140的源极141和薄膜晶体管150的漏极153位于扫描线111的同一侧(例如图1中的扫描线111的上侧),而薄膜晶体管140的漏极143和薄膜晶体管150的源极151均位于扫描线111的另一相对侧(例如图1中的扫描线111的下侧),从而使得薄膜晶体管140和薄膜晶体管150整体布局结构大致呈U型,该种布局方式可以大大提升像素开口率。此外,值得一提的是,薄膜晶体管140、150可以是NMOS晶体管,也可以是PMOS晶体管;当然,薄膜晶体管140、150也可以替换成其他三端有源器件。In the above, the pixel structure 100 further includes a thin film transistor 140 and a thin film transistor 150. The source 141 of the thin film transistor 140 is connected to the data line 121, the gate 142 of the thin film transistor 140 is connected to the scan line 111, the drain 143 of the thin film transistor 140 is connected to the source 151 of the thin film transistor 150, and the gate 152 of the thin film transistor 150 is connected to the scan line. 111 and the drain 153 of the thin film transistor 150 are connected to the pixel electrode 130. In other words, the thin film transistor 140 and the thin film transistor 150 are connected in series between the data line 121 and the pixel electrode 130 and the gates 142, 153 of both are connected to the same scan line 111; by passing the thin film transistor 140 and the thin film transistor The series connection of 150 can reduce the leakage current of the pixel structure 100 and maintain the voltage of the pixel electrode 130. Furthermore, it can be seen from the layout structure of the pixel structure 100 of FIG. 1 that the drain electrode 143 of the thin film transistor 140 extends from one side of the data line 121 across the data line 121 and is connected to the source 151 of the thin film transistor 150. The source 141 of the thin film transistor 140 and the drain 153 of the thin film transistor 150 are located on the same side of the scan line 111 (for example, the upper side of the scan line 111 in FIG. 1), and the drain 143 of the thin film transistor 140 and the thin film transistor 150 The source 151 is located on the other opposite side of the scan line 111 (for example, the lower side of the scan line 111 in FIG. 1), so that the overall layout structure of the thin film transistor 140 and the thin film transistor 150 is substantially U-shaped, and the layout manner can be greatly improved. Increase the pixel aperture ratio. In addition, it is worth mentioning that the thin film transistors 140, 150 may be NMOS transistors or PMOS transistors; of course, the thin film transistors 140, 150 may also be replaced with other three-terminal active devices.
综上所述,本实施例提供的像素结构100通过在像素电极130中开设一条或多条从相邻两条扫描线111、112中的一条扫描线111向另一条扫描线112延伸的狭隙131,且使狭隙131的长度方向相对于扫描线111/112的长度方向倾斜,其可以为液晶分子的排布预置一定的倾斜角度,从而能够显著提高具有像素结构100的显示设备的可视角度。此外,双薄膜晶体管140、150串联设置,既能够减小像素结构100的漏电流,又能够保持像素电极130的电压。另外,双薄膜晶体管140、150的布局结构可以有效提升像素开口率。In summary, the pixel structure 100 provided in this embodiment has one or more slits extending from one scan line 111 of the adjacent two scan lines 111, 112 to the other scan line 112 in the pixel electrode 130. 131, and the length direction of the slit 131 is inclined with respect to the length direction of the scanning line 111/112, which can preset a certain inclination angle for the arrangement of the liquid crystal molecules, thereby being able to significantly improve the display device having the pixel structure 100. View angle. Further, the double thin film transistors 140 and 150 are disposed in series to reduce the leakage current of the pixel structure 100 and maintain the voltage of the pixel electrode 130. In addition, the layout structure of the dual thin film transistors 140, 150 can effectively increase the pixel aperture ratio.
如图2及图3所示,本申请另一实施例中提供的一种主动开关阵列基板200,包括:透明基板250以及设置在透明基板250上的扫描线211、扫描线212、扫描线213、数据线221、数据线222、像素电极230和像素电极240,扫描线212位于扫描线211和扫描线213之间,扫描线211与扫描线212相邻设置且扫描线212与扫描线213相邻设置。扫描线211及扫描线212与数据线221及数据线222交叉设置共同围成一个第一像素单元区域,扫描线212及扫描线213与数据线221及数据线222交叉设置共同围成一个第二像素单元区域,所述第一像素单元区域与所述第二像素单元区域相邻。As shown in FIG. 2 and FIG. 3 , an active switch array substrate 200 according to another embodiment of the present invention includes: a transparent substrate 250 and scan lines 211 , scan lines 212 , and scan lines 213 disposed on the transparent substrate 250 . The data line 221, the data line 222, the pixel electrode 230, and the pixel electrode 240, the scan line 212 is located between the scan line 211 and the scan line 213, the scan line 211 is disposed adjacent to the scan line 212, and the scan line 212 is opposite to the scan line 213. Neighbor settings. The scan line 211 and the scan line 212 intersect with the data line 221 and the data line 222 to form a first pixel unit area. The scan line 212 and the scan line 213 are intersected with the data line 221 and the data line 222 to form a second. a pixel unit region, the first pixel unit region being adjacent to the second pixel unit region.
像素电极230位于所述第一像素单元区域内并电连接扫描线211和数据线221,像素电极230上设有从扫描线211向扫描线212延伸的至少一条狭隙231。像素电极240位于所述第二像素单元区域内并电连接扫描线212和数据线221,像素电极240上设有从扫描线212向扫描线213延伸的 至少一条狭隙241。The pixel electrode 230 is located in the first pixel unit region and electrically connects the scan line 211 and the data line 221, and the pixel electrode 230 is provided with at least one slit 231 extending from the scan line 211 to the scan line 212. The pixel electrode 240 is located in the second pixel unit region and electrically connects the scan line 212 and the data line 221, and the pixel electrode 240 is provided with at least one slit 241 extending from the scan line 212 to the scan line 213.
像素电极230上的每一条狭隙231邻近扫描线212的一端相对于其邻近扫描线211的一端更靠近数据线221。像素电极240上的每一条狭隙241邻近扫描线212的一端相对于其邻近扫描线213的一端更靠近数据线221。可选地,各条狭隙241的长度方向相对于扫描线212的长度方向的倾斜夹角α的取值范围为75°~85°;类似地,各条狭缝231的长度方向相对于扫描线212的长度方向的倾斜夹角的取值范围也为75°~85°。Each slit 231 on the pixel electrode 230 is adjacent to one end of the scan line 212 closer to the data line 221 with respect to an end thereof adjacent to the scan line 211. Each of the slits 241 on the pixel electrode 240 is adjacent to the data line 221 adjacent to one end of the scanning line 212 with respect to an end thereof adjacent to the scanning line 213. Optionally, the inclination angle α of the longitudinal direction of each slit 241 with respect to the longitudinal direction of the scanning line 212 ranges from 75° to 85°; similarly, the length direction of each slit 231 is relative to the scanning. The angle of inclination of the line 212 in the longitudinal direction also ranges from 75° to 85°.
更具体地,位于所述第一像素单元区域内的像素电极230与扫描线211及数据线221之间形成电连接可以类似于图1中的像素电极130,由两个串联的三端有源器件例如两个串联的薄膜晶体管来完成;该种采用双薄膜晶体管串联的电连接方式既能够减小像素结构的漏电流,又能够保持像素电极230的电压;再者,这种双薄膜晶体管的布局结构也可以如图1所示的U型,甚至是其他形状例如V型,以提升像素开口率。同理,位于所述第二像素单元区域内的像素电极240与扫描线212及数据线221之间形成电连接可以类似于图1中的像素电极130,由两个串联的三端有源器件例如两个串联的薄膜晶体管来完成;该种采用双薄膜晶体管串联的电连接方式既能够减小像素结构的漏电流,又能够保持像素电极240的电压;再者,这种双薄膜晶体管的布局结构也可以如图1所示的U型,甚至是其他形状例如V型,以提升像素开口率。像素电极230和像素电极240均采用透明导电材料制成,例如ITO、IZO(Indium Zinc Oxide,铟锌氧化物)、ITZO(Indium Tin Zinc Oxide,铟锡锌氧化物)中的一种或者多种。More specifically, the electrical connection between the pixel electrode 230 located in the first pixel unit region and the scan line 211 and the data line 221 may be similar to the pixel electrode 130 in FIG. 1 by two series-connected three-terminal active The device is implemented, for example, by two thin-film transistors connected in series; the electrical connection method in which the double thin film transistors are connected in series can reduce the leakage current of the pixel structure and maintain the voltage of the pixel electrode 230; further, the dual thin film transistor The layout structure can also be U-shaped as shown in FIG. 1, or even other shapes such as a V-shape to increase the pixel aperture ratio. Similarly, the electrical connection between the pixel electrode 240 located in the second pixel unit region and the scan line 212 and the data line 221 may be similar to the pixel electrode 130 in FIG. 1 by two serially connected three-terminal active devices. For example, two thin film transistors connected in series are used; the electrical connection method in which the double thin film transistors are connected in series can reduce the leakage current of the pixel structure and maintain the voltage of the pixel electrode 240; further, the layout of the double thin film transistor The structure may also be U-shaped as shown in FIG. 1, or even other shapes such as V-type to increase the pixel aperture ratio. The pixel electrode 230 and the pixel electrode 240 are both made of a transparent conductive material, such as one or more of ITO, IZO (Indium Zinc Oxide, Indium Tin Zinc Oxide, ITZO (Indium Tin Zinc Oxide) .
承上述,如图3所示,主动开关阵列基板200还包括公共电极260。其中,公共电极260与像素电极230及像素电极240同层设置在透明基板250上,因而本实施例的技术方案适用于IPS(In Plane Switching内平面切换)模式的液晶显示设备,具有可视角度大、颜色细腻等优点。再者,从图3中可以得知:公共电极260与像素电极230/240在图3所示水平方向上交替排列,从而像素电极230/240和与其相邻的公共电极260之间可以形成平面电场或称横向电场。As described above, as shown in FIG. 3, the active switch array substrate 200 further includes a common electrode 260. The common electrode 260 is disposed on the transparent substrate 250 in the same layer as the pixel electrode 230 and the pixel electrode 240. Therefore, the technical solution of the embodiment is applicable to a liquid crystal display device of an IPS (In Plane Switching) mode, and has a viewing angle. Large, fine colors and other advantages. Furthermore, it can be seen from FIG. 3 that the common electrode 260 and the pixel electrode 230/240 are alternately arranged in the horizontal direction shown in FIG. 3, so that a plane can be formed between the pixel electrode 230/240 and the common electrode 260 adjacent thereto. An electric field or transverse electric field.
如图4及图5所示,本申请再一实施例中提供的一种主动开关阵列基板300,包括:透明基板350以及设置在透明基板350上的扫描线311、扫描线312、扫描线313、数据线321、数据线322、像素电极330和像素电极340,扫描线312位于扫描线311和扫描线313之间,扫描线311与扫描线312相邻设置且扫描线312与扫描线313相邻设置。扫描线311及扫描线312与数据线321及数据线322交叉设置共同围成一个第一像素单元区域,扫描线312及扫描线313与数据线321及数据线322交叉设置共同围成一个第二像素单元区域,所述第一像素单元区域与所述第二像素单元区域相邻。As shown in FIG. 4 and FIG. 5 , an active switch array substrate 300 according to another embodiment of the present application includes: a transparent substrate 350 and scan lines 311 , scan lines 312 , and scan lines 313 disposed on the transparent substrate 350 . The data line 321, the data line 322, the pixel electrode 330, and the pixel electrode 340. The scan line 312 is located between the scan line 311 and the scan line 313. The scan line 311 is disposed adjacent to the scan line 312 and the scan line 312 is opposite to the scan line 313. Neighbor settings. The scan line 311 and the scan line 312 are intersected with the data line 321 and the data line 322 to form a first pixel unit area. The scan line 312 and the scan line 313 are intersected with the data line 321 and the data line 322 to form a second. a pixel unit region, the first pixel unit region being adjacent to the second pixel unit region.
像素电极330位于第一像素单元区域内并电连接扫描线311和数据线321,像素电极330上设有从扫描线311向扫描线312延伸的至少一条狭隙331。像素电极340位于所述第二像素单元区域内并电连接扫描线312和数据线321,像素电极340上设有从扫描线312向扫描线313延伸的至少一条狭隙341。The pixel electrode 330 is located in the first pixel unit region and electrically connects the scan line 311 and the data line 321 , and the pixel electrode 330 is provided with at least one slit 331 extending from the scan line 311 to the scan line 312 . The pixel electrode 340 is located in the second pixel unit region and electrically connects the scan line 312 and the data line 321 , and the pixel electrode 340 is provided with at least one narrow slit 341 extending from the scan line 312 to the scan line 313 .
像素电极330上的每一条狭隙331邻近扫描线312的一端相对于其邻近扫描线311的一端更靠近数据线321。像素电极340上的每一条狭隙341邻近扫描线312的一端相对于其邻近扫描线313的一端更靠近数据线321。可选地,各条狭隙331的长度方向相对于扫描线312的长度方向的倾斜夹角α的取值范围为75°~85°,类似地,各条狭隙341的长度方向相对于扫描线312的长度方向的倾斜夹角也为α。Each of the slits 331 on the pixel electrode 330 is adjacent to the data line 321 adjacent to one end of the scanning line 312 with respect to an end thereof adjacent to the scanning line 311. Each of the slits 341 on the pixel electrode 340 is adjacent to the data line 321 adjacent to one end of the scanning line 312 with respect to an end thereof adjacent to the scanning line 313. Optionally, the inclination angle α of the longitudinal direction of each slit 331 with respect to the longitudinal direction of the scanning line 312 ranges from 75° to 85°, and similarly, the length direction of each slit 341 is relative to the scanning. The angle of inclination of the line 312 in the longitudinal direction is also α.
更具体地,位于所述第一像素单元区域内的像素电极330与扫描线311及数据线321之间形成电连接可以类似于图1中的像素电极130,由两个串联的三端有源器件例如两个串联的薄膜晶体管来完成;该种采用双薄膜晶体管串联的电连接方式既能够减小像素结构的漏电流,又能够保持像素电极330的电压;再者,这种双薄膜晶体管的布局结构也可以如图1所示的U型,甚至是其他形状例如V型,以提升像素开口率。同理,位于所述第二像素单元区域内的像素电极340与扫描线312及数据线321之间形成电连接可以类似于图1中的像素电极130,由两个串联的三端有源器件例如两个串联的薄膜晶体管来完成;该种采用双薄膜晶体管串联的电连接方式既能够减小像素结构的漏电流,又能够保持像素电极340的电压;再者,这种双薄膜晶体管的布局结构也可以如图1所示的U型,甚至是其他形状例如V型,以提升像素开口率。More specifically, the electrical connection between the pixel electrode 330 located in the first pixel unit region and the scan line 311 and the data line 321 may be similar to the pixel electrode 130 in FIG. The device is implemented, for example, by two thin-film transistors connected in series; the electrical connection method in which the double thin film transistors are connected in series can reduce the leakage current of the pixel structure and maintain the voltage of the pixel electrode 330; further, the double thin film transistor The layout structure can also be U-shaped as shown in FIG. 1, or even other shapes such as a V-shape to increase the pixel aperture ratio. Similarly, the electrical connection between the pixel electrode 340 located in the second pixel unit region and the scan line 312 and the data line 321 may be similar to the pixel electrode 130 in FIG. 1 by two serially connected three-terminal active devices. For example, two thin film transistors connected in series are used; the electrical connection method in which the double thin film transistors are connected in series can reduce the leakage current of the pixel structure and maintain the voltage of the pixel electrode 340; further, the layout of the double thin film transistor The structure may also be U-shaped as shown in FIG. 1, or even other shapes such as V-type to increase the pixel aperture ratio.
承上述,本实施例技术方案与前述的第二实施例技术方案类似,所不同之处在于,本实施例中的公共电极360设置在像素电极330及像素电极340和透明基板350之间,且典型的是公共电极360整片设置在像素电极 330、340下方,从而像素电极330、340可以与下方的公共电极360形成边缘电场。该方案适合于FFS(Fringe Field Switching,边缘场切换)模式的液晶显示设备,FFS技术是藉由边缘电场使面内几乎均质排列的液晶分子在电极表层旋转,具有视角宽广、高穿透性、低功耗等优点,能同时实现高穿透性与大视角等要求。The technical solution of the present embodiment is similar to the foregoing technical solution of the second embodiment, except that the common electrode 360 in the embodiment is disposed between the pixel electrode 330 and the pixel electrode 340 and the transparent substrate 350, and Typically, the common electrode 360 is disposed entirely under the pixel electrodes 330, 340 such that the pixel electrodes 330, 340 can form a fringing electric field with the underlying common electrode 360. The scheme is suitable for a liquid crystal display device of FFS (Fringe Field Switching) mode. The FFS technology rotates the liquid crystal molecules which are almost homogeneously arranged in the surface on the surface of the electrode by the fringe electric field, and has a wide viewing angle and high penetration. , low power consumption and other advantages, can achieve high penetration and large viewing angle requirements.
如图6及图7所示,本申请又一实施例中提供的一种显示面板400包括:薄膜晶体管基板410、彩膜基板420和夹设在薄膜晶体管410和彩膜基板420之间的液晶层440。As shown in FIG. 6 and FIG. 7 , a display panel 400 according to another embodiment of the present disclosure includes a thin film transistor substrate 410 , a color filter substrate 420 , and a liquid crystal interposed between the thin film transistor 410 and the color filter substrate 420 . Layer 440.
其中,主动开关阵列基板410包括多个像素结构(可参考图1所述的像素结构100),图6中示出三个像素电极411(对应三个像素结构)作为举例,此图中公共电极并未示出。具体而言,每一个像素结构例如包括第一扫描线、与第一扫描线相邻的第二扫描线、第一数据线、与第一数据线相邻的第二数据线、以及像素电极411,所述第一扫描线及所述第二扫描线与所述第一数据线及所述第二数据线交叉设置共同围成一个像素单元区域,像素电极411位于所述像素单元区域内且电连接所述第一扫描线和所述第一数据线,像素电极411上设有从所述第一扫描线向所述第二扫描线延伸的至少一条狭隙,且每一条狭隙邻近所述第二扫描线的一端相对于其邻近所述第一扫描线的一端更靠近或更远离所述第一数据线。可以理解的是,本实施例的主动开关阵列基板410的具体结构与第二、第三实施例所述的主动开关阵列基板410类似,在此不作赘述;The active switch array substrate 410 includes a plurality of pixel structures (refer to the pixel structure 100 described in FIG. 1 ), and three pixel electrodes 411 (corresponding to three pixel structures) are illustrated in FIG. 6 as an example. Not shown. Specifically, each of the pixel structures includes, for example, a first scan line, a second scan line adjacent to the first scan line, a first data line, a second data line adjacent to the first data line, and a pixel electrode 411 The first scan line and the second scan line are disposed to intersect with the first data line and the second data line to form a pixel unit area, and the pixel electrode 411 is located in the pixel unit area and is electrically Connecting the first scan line and the first data line, the pixel electrode 411 is provided with at least one slit extending from the first scan line to the second scan line, and each slit is adjacent to the One end of the second scan line is closer to or farther from the first data line with respect to an end thereof adjacent to the first scan line. It is to be understood that the specific structure of the active switch array substrate 410 of the present embodiment is similar to that of the active switch array substrate 410 described in the second and third embodiments, and is not described herein;
彩膜基板420与主动开关阵列基板410相对设置,彩膜基板420上形 成有与具有像素电极411的多个像素结构分别对应的多个彩色滤光片430,每一个彩色滤光片430的长度方向和与该彩色滤光片430相对应的像素结构的像素电极411的狭隙的长度方向平行。The color filter substrate 420 is disposed opposite to the active switch array substrate 410. The color filter substrate 420 is formed with a plurality of color filters 430 respectively corresponding to the plurality of pixel structures having the pixel electrodes 411, and the length of each of the color filters 430. The direction is parallel to the longitudinal direction of the slit of the pixel electrode 411 of the pixel structure corresponding to the color filter 430.
具体地,彩膜基板420上的每一个彩色滤光片430例如为红色(R)滤光片、绿色(G)滤光片和蓝色(B)滤光片中的一种,且在每一行彩色滤光片430中,三种颜色的彩色滤光片430依次间隔排列且每一个彩色滤光片430分别对应一个像素电极411。基于此种结构,该显示面板400能够实现较大的可视角度。Specifically, each of the color filters 430 on the color filter substrate 420 is, for example, one of a red (R) filter, a green (G) filter, and a blue (B) filter, and each In the one-line color filter 430, the color filters 430 of the three colors are sequentially spaced and each of the color filters 430 corresponds to one pixel electrode 411. Based on such a structure, the display panel 400 can achieve a large viewing angle.
此外,像素电极411上的狭隙的长度方向相对于所述第二扫描线的长度方向的倾斜夹角(参考图2和图4中的α)的取值范围可选为75°~85°,以实现较好的可视角度。Further, the inclination angle of the longitudinal direction of the slit on the pixel electrode 411 with respect to the longitudinal direction of the second scanning line (refer to α in FIGS. 2 and 4) may be selected from the range of 75° to 85°. To achieve a better viewing angle.
承上述,如图7所示,在列方向上,相邻两个彩色滤光片430沿相反方向倾斜延伸。具体而言,相邻两个彩色滤光片430包括第一彩色滤光片431和第二彩色滤光片432,第一彩色滤光片431包括第一端4311和第二端4312且自第一端4311向第二端4312倾斜延伸,第二彩色滤光片432包括第三端4321和第四端4322且自第三端4321向第四端4322倾斜延伸,且第二端4312和第三端4321相邻。As described above, as shown in FIG. 7, in the column direction, adjacent two color filters 430 extend obliquely in opposite directions. Specifically, the two adjacent color filters 430 include a first color filter 431 and a second color filter 432. The first color filter 431 includes a first end 4311 and a second end 4312. One end 4311 extends obliquely toward the second end 4312, and the second color filter 432 includes a third end 4321 and a fourth end 4322 and extends obliquely from the third end 4321 to the fourth end 4322, and the second end 4312 and the third end Ends 4321 are adjacent.
在其他实施例中,例如图8所示,第一彩色滤光片431的第一投影4313与第二彩色滤光片432的第二投影4323在行方向上部分重合,换句话说,彩膜基板420上的相邻行之间的彩色滤光片430在行方向上交错排列。基于该排布方式,显示面板400的彩膜基板420可以更好地和主动开关阵列 基板410适配,以实现较大的可视角度、增大透光率,同时还能改变色差,使显示效果更好。此外,值得一提的是,本申请实施例所述的“行方向”和“列方向”可以互换。In other embodiments, for example, as shown in FIG. 8, the first projection 4313 of the first color filter 431 and the second projection 4323 of the second color filter 432 partially overlap in the row direction, in other words, the color filter substrate. The color filters 430 between adjacent rows on 420 are staggered in the row direction. Based on the arrangement, the color filter substrate 420 of the display panel 400 can be better adapted to the active switch array substrate 410 to achieve a larger viewing angle, increase the light transmittance, and also change the color difference to make the display Better results. In addition, it is worth mentioning that the "row direction" and the "column direction" described in the embodiments of the present application may be interchanged.
在上述实施例的基础上,本申请的一实施例提供了一种液晶显示器500,例如图9所示,该包括背光模组510及显示面板520;其中显示面板520可以采用上述实施例的显示面板400。具体地,由背光模组510发出的光线依次经过显示面板520的主动开关阵列基板521、彩膜基板522后转换成图像显示给用户。On the basis of the above embodiments, an embodiment of the present application provides a liquid crystal display 500. For example, as shown in FIG. 9, the backlight module 510 and the display panel 520 are included. The display panel 520 can adopt the display of the above embodiment. Panel 400. Specifically, the light emitted by the backlight module 510 is sequentially passed through the active switch array substrate 521 and the color filter substrate 522 of the display panel 520, and then converted into an image for display to the user.
在本申请所提供的几个实施例中,应该理解到,所揭露的系统,装置和方法,可以通过其它的方式实现。例如,以上所描述的装置实施例仅仅是示意性的,例如,所述单元的划分,仅仅为一种逻辑功能划分,实际实现时可以有另外的划分方式,例如多路单元或组件可以结合或者可以集成到另一个系统,或一些特征可以忽略,或不执行。另一点,所显示或讨论的相互之间的耦合或直接耦合或通信连接可以是通过一些接口,装置或单元的间接耦合或通信连接,可以是电性,机械或其它的形式。In the several embodiments provided by the present application, it should be understood that the disclosed system, apparatus, and method may be implemented in other manners. For example, the device embodiments described above are merely illustrative. For example, the division of the unit is only a logical function division. In actual implementation, there may be another division manner, for example, multiple units or components may be combined or Can be integrated into another system, or some features can be ignored or not executed. In addition, the mutual coupling or direct coupling or communication connection shown or discussed may be an indirect coupling or communication connection through some interface, device or unit, and may be in an electrical, mechanical or other form.
所述作为分离部件说明的单元可以是或者也可以不是物理上分开的,作为单元显示的部件可以是或者也可以不是物理单元,即可以位于一个地方,或者也可以分布到多路网络单元上。可以根据实际的需要选择其中的部分或者全部单元来实现本实施例方案的目的。The units described as separate components may or may not be physically separated, and the components displayed as units may or may not be physical units, that is, may be located in one place, or may be distributed to multiple network units. Some or all of the units may be selected according to actual needs to achieve the purpose of the solution of the embodiment.
最后应说明的是:以上实施例仅用以说明本申请的技术方案,而非 对其限制;尽管参照前述实施例对本申请进行了详细的说明,本领域的普通技术人员应当理解:其依然可以对前述各实施例所记载的技术方案进行修改,或者对其中部分技术特征进行等同替换;而这些修改或者替换,并不使相应技术方案的本质脱离本申请各实施例技术方案的精神和范围。Finally, it should be noted that the above embodiments are only used to explain the technical solutions of the present application, and are not limited thereto; although the present application is described in detail with reference to the foregoing embodiments, those skilled in the art should understand that they can still The technical solutions described in the foregoing embodiments are modified, or the equivalents of the technical features are replaced by the equivalents. The modifications and substitutions do not depart from the spirit and scope of the technical solutions of the embodiments of the present application.

Claims (18)

  1. 一种像素结构,其中,包括:A pixel structure in which:
    第一扫描线;First scan line;
    第二扫描线,与所述第一扫描线相邻;a second scan line adjacent to the first scan line;
    第一数据线;First data line;
    第二数据线,与所述第一数据线相邻,所述第一扫描线及所述第二扫描线与所述第一数据线及所述第二数据线交叉设置共同围成一个像素单元区域;以及a second data line adjacent to the first data line, wherein the first scan line and the second scan line are disposed to intersect with the first data line and the second data line to form a pixel unit Area;
    像素电极,所述像素电极位于所述像素单元区域内且电连接所述第一扫描线和所述第一数据线,所述像素电极上设有从所述第一扫描线向所述第二扫描线延伸的至少一条狭隙,且所述狭隙的长度方向相对于所述第一扫描线的长度方向倾斜,所述狭隙的长度方向相对于所述第一扫描线的长度方向倾斜的夹角取值范围为75°~85°。a pixel electrode, the pixel electrode being located in the pixel unit region and electrically connecting the first scan line and the first data line, wherein the pixel electrode is provided from the first scan line to the second At least one slit extending from the scan line, and a length direction of the slit is inclined with respect to a length direction of the first scan line, and a length direction of the slit is inclined with respect to a length direction of the first scan line The angle range is from 75° to 85°.
  2. 根据权利要求1所述的像素结构,其中,所述像素结构还包括第一薄膜晶体管和第二薄膜晶体管,所述第一薄膜晶体管的源极连接所述第一数据线,所述第一薄膜晶体管的栅极连接所述第一扫描线,所述第一薄膜晶体管的漏极连接所述第二薄膜晶体管的源极,所述第二薄膜晶体管的栅极连接所述第一扫描线,所述第二薄膜晶体管的漏极连接所述像素电极。The pixel structure of claim 1 , wherein the pixel structure further comprises a first thin film transistor and a second thin film transistor, a source of the first thin film transistor being connected to the first data line, the first thin film a gate of the transistor is connected to the first scan line, a drain of the first thin film transistor is connected to a source of the second thin film transistor, and a gate of the second thin film transistor is connected to the first scan line. The drain of the second thin film transistor is connected to the pixel electrode.
  3. 根据权利要求2所述的像素结构,其中,第一薄膜晶体管和第二薄膜晶体管为NMOS晶体管或PMOS晶体管。The pixel structure according to claim 2, wherein the first thin film transistor and the second thin film transistor are NMOS transistors or PMOS transistors.
  4. 根据权利要求1所述的像素结构,其中,所述像素电极采用透明导 电材料制成,所述透明导电材料包括ITO、IZO和ITZO中的一种或多种。The pixel structure according to claim 1, wherein the pixel electrode is made of a transparent conductive material including one or more of ITO, IZO, and ITZO.
  5. 一种像素结构,其中,包括:A pixel structure in which:
    第一扫描线;First scan line;
    第二扫描线,与所述第一扫描线相邻;a second scan line adjacent to the first scan line;
    第一数据线;First data line;
    第二数据线,与所述第一数据线相邻,所述第一扫描线及所述第二扫描线与所述第一数据线及所述第二数据线交叉设置共同围成一个像素单元区域;以及a second data line adjacent to the first data line, wherein the first scan line and the second scan line are disposed to intersect with the first data line and the second data line to form a pixel unit Area;
    像素电极,所述像素电极位于所述像素单元区域内且电连接所述第一扫描线和所述第一数据线,所述像素电极上设有从所述第一扫描线向所述第二扫描线延伸的至少一条狭隙,且所述狭隙的长度方向相对于所述第一扫描线的长度方向倾斜。a pixel electrode, the pixel electrode being located in the pixel unit region and electrically connecting the first scan line and the first data line, wherein the pixel electrode is provided from the first scan line to the second At least one slit extending from the scan line, and a length direction of the slit is inclined with respect to a length direction of the first scan line.
  6. 根据权利要求5所述的像素结构,其中,所述像素结构还包括第一薄膜晶体管和第二薄膜晶体管,所述第一薄膜晶体管的源极连接所述第一数据线,所述第一薄膜晶体管的栅极连接所述第一扫描线,所述第一薄膜晶体管的漏极连接所述第二薄膜晶体管的源极,所述第二薄膜晶体管的栅极连接所述第一扫描线,所述第二薄膜晶体管的漏极连接所述像素电极。The pixel structure according to claim 5, wherein the pixel structure further comprises a first thin film transistor and a second thin film transistor, a source of the first thin film transistor is connected to the first data line, the first thin film a gate of the transistor is connected to the first scan line, a drain of the first thin film transistor is connected to a source of the second thin film transistor, and a gate of the second thin film transistor is connected to the first scan line. The drain of the second thin film transistor is connected to the pixel electrode.
  7. 根据权利要求6所述的像素结构,其中,第一薄膜晶体管和第二薄膜晶体管为NMOS晶体管或PMOS晶体管。The pixel structure according to claim 6, wherein the first thin film transistor and the second thin film transistor are NMOS transistors or PMOS transistors.
  8. 根据权利要求5所述的像素结构,其中,所述像素电极采用透明导电材料制成,所述透明导电材料包括ITO、IZO和ITZO中的一种或多种。The pixel structure according to claim 5, wherein the pixel electrode is made of a transparent conductive material including one or more of ITO, IZO, and ITZO.
  9. 根据权利要求5所述的像素结构,其中,所述像素结构还包括第一薄膜晶体管和第二薄膜晶体管,所述第一薄膜晶体管的源极连接所述第一数据线,所述第一薄膜晶体管的栅极连接所述第一扫描线,所述第一薄膜晶体管的漏极连接所述第二薄膜晶体管的源极,所述第二薄膜晶体管的栅极连接所述第一扫描线,所述第二薄膜晶体管的漏极连接所述像素电极;所述像素电极采用透明导电材料制成,所述透明导电材料包括ITO、IZO和ITZO中的一种或多种。The pixel structure according to claim 5, wherein the pixel structure further comprises a first thin film transistor and a second thin film transistor, a source of the first thin film transistor is connected to the first data line, the first thin film a gate of the transistor is connected to the first scan line, a drain of the first thin film transistor is connected to a source of the second thin film transistor, and a gate of the second thin film transistor is connected to the first scan line. The drain of the second thin film transistor is connected to the pixel electrode; the pixel electrode is made of a transparent conductive material, and the transparent conductive material includes one or more of ITO, IZO, and ITZO.
  10. 根据权利要求9所述的像素结构,其中,第一薄膜晶体管和第二薄膜晶体管为NMOS晶体管或PMOS晶体管。The pixel structure according to claim 9, wherein the first thin film transistor and the second thin film transistor are NMOS transistors or PMOS transistors.
  11. 一种主动开关阵列基板,其中,包括:An active switch array substrate, comprising:
    透明基板;Transparent substrate;
    以及第一扫描线,设置在所述透明基板上;And a first scan line disposed on the transparent substrate;
    第三扫描线,设置在所述透明基板上;a third scan line disposed on the transparent substrate;
    第二扫描线,设置在所述透明基板上且所述第二扫描线位于所述第一扫描线和所述第三扫描线之间;a second scan line disposed on the transparent substrate and the second scan line being located between the first scan line and the third scan line;
    第一数据线,设置在所述透明基板上;a first data line disposed on the transparent substrate;
    第二数据线,设置在所述透明基板上,所述第一扫描线及所述第二扫描线与所述第一数据线及所述第二数据线交叉设置共同围成一个第一像素单元区域,所述第二扫描线及所述第三扫描线与所述第一数据线及所述第二数据线交叉设置共同围成与所述第一像素单元区域相邻的一个第二像素单元区域;a second data line disposed on the transparent substrate, wherein the first scan line and the second scan line are disposed to intersect with the first data line and the second data line to form a first pixel unit a region, the second scan line and the third scan line are disposed to intersect with the first data line and the second data line to form a second pixel unit adjacent to the first pixel unit area region;
    第一像素电极,设置在所述透明基板上且所述第一像素电极位于所述第一像素单元区域内且电连接所述第一扫描线和所述第一数据线,所述第一像素电极上设有从所述第一扫描线向所述第二扫描线延伸的至少一条第一狭隙;a first pixel electrode disposed on the transparent substrate and the first pixel electrode being located in the first pixel unit region and electrically connecting the first scan line and the first data line, the first pixel The electrode is provided with at least one first slit extending from the first scan line to the second scan line;
    第二像素电极,设置在所述透明基板上且所述第二像素电极位于所述第二像素单元区域内且电连接所述第二扫描线和所述第一数据线,所述第二像素电极上设有从所述第二扫描线向所述第三扫描线延伸的至少一条第二狭隙;a second pixel electrode disposed on the transparent substrate and the second pixel electrode being located in the second pixel unit region and electrically connecting the second scan line and the first data line, the second pixel The electrode is provided with at least one second slit extending from the second scan line to the third scan line;
    所述第一狭隙邻近所述第二扫描线的一端相对于所述第一狭隙邻近所述第一扫描线的一端更靠近所述第一数据线;One end of the first slit adjacent to the second scan line is closer to the first data line than an end of the first slit adjacent to the first scan line;
    所述第二狭隙邻近所述第二扫描线的一端相对于所述第二狭隙邻近所述第三扫描线的一端更靠近所述第一数据线。One end of the second slit adjacent to the second scan line is closer to the first data line than an end of the second slit adjacent to the third scan line.
  12. 根据权利要求11所述的主动开关阵列基板,其中,所述第一狭隙的长度方向相对于所述第二扫描线的长度方向倾斜的夹角取值范围为75°~85°。The active switch array substrate according to claim 11, wherein an angle at which the longitudinal direction of the first slit is inclined with respect to a longitudinal direction of the second scanning line ranges from 75° to 85°.
  13. 根据权利要求12所述的主动开关阵列基板,其中,所述主动开关阵列基板还包括:公共电极,与所述第一像素电极及所述第二像素电极同层设置在所述透明基板上。The active switch array substrate according to claim 12, wherein the active switch array substrate further comprises: a common electrode disposed on the transparent substrate in the same layer as the first pixel electrode and the second pixel electrode.
  14. 根据权利要求12所述的主动开关阵列基板,其中,所述主动开关阵列基板还包括:公共电极,设置在所述第一像素电极及所述第二像素电极和所述透明基板之间。The active switch array substrate according to claim 12, wherein the active switch array substrate further comprises: a common electrode disposed between the first pixel electrode and the second pixel electrode and the transparent substrate.
  15. 根据权利要求12所述的主动开关阵列基板,其中,所述第一像素电极和第二像素电极均采用透明导电材料制成,所述透明导电材料包括ITO、IZO和ITZO中的一种或多种。The active switch array substrate according to claim 12, wherein the first pixel electrode and the second pixel electrode are both made of a transparent conductive material, and the transparent conductive material comprises one or more of ITO, IZO, and ITZO. Kind.
  16. 根据权利要求11所述的主动开关阵列基板,其中,所述主动开关阵列基板还包括:公共电极,与所述第一像素电极及所述第二像素电极同层设置在所述透明基板上。The active switch array substrate according to claim 11, wherein the active switch array substrate further comprises: a common electrode disposed on the transparent substrate in the same layer as the first pixel electrode and the second pixel electrode.
  17. 根据权利要求11所述的主动开关阵列基板,其中,所述主动开关阵列基板还包括:公共电极,设置在所述第一像素电极及所述第二像素电极和所述透明基板之间。The active switch array substrate according to claim 11, wherein the active switch array substrate further comprises: a common electrode disposed between the first pixel electrode and the second pixel electrode and the transparent substrate.
  18. 根据权利要求11所述的主动开关阵列基板,其中,所述第一像素电极和第二像素电极均采用透明导电材料制成,所述透明导电材料包括ITO、IZO和ITZO中的一种或多种。The active switch array substrate according to claim 11, wherein the first pixel electrode and the second pixel electrode are both made of a transparent conductive material, and the transparent conductive material comprises one or more of ITO, IZO, and ITZO. Kind.
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