WO2019054470A1 - Liquid material supply device, material gas supply system, and liquid material supply method - Google Patents

Liquid material supply device, material gas supply system, and liquid material supply method Download PDF

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Publication number
WO2019054470A1
WO2019054470A1 PCT/JP2018/034118 JP2018034118W WO2019054470A1 WO 2019054470 A1 WO2019054470 A1 WO 2019054470A1 JP 2018034118 W JP2018034118 W JP 2018034118W WO 2019054470 A1 WO2019054470 A1 WO 2019054470A1
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WO
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Prior art keywords
liquid
supply
liquid material
supply pipe
storage container
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PCT/JP2018/034118
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French (fr)
Japanese (ja)
Inventor
林　達也
信次 谷口
重治 青
Original Assignee
株式会社堀場エステック
ホリバ ユーケー リミテッド
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Publication of WO2019054470A1 publication Critical patent/WO2019054470A1/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B67—OPENING, CLOSING OR CLEANING BOTTLES, JARS OR SIMILAR CONTAINERS; LIQUID HANDLING
    • B67D—DISPENSING, DELIVERING OR TRANSFERRING LIQUIDS, NOT OTHERWISE PROVIDED FOR
    • B67D7/00—Apparatus or devices for transferring liquids from bulk storage containers or reservoirs into vehicles or into portable containers, e.g. for retail sale purposes
    • B67D7/02—Apparatus or devices for transferring liquids from bulk storage containers or reservoirs into vehicles or into portable containers, e.g. for retail sale purposes for transferring liquids other than fuel or lubricants
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B67—OPENING, CLOSING OR CLEANING BOTTLES, JARS OR SIMILAR CONTAINERS; LIQUID HANDLING
    • B67D—DISPENSING, DELIVERING OR TRANSFERRING LIQUIDS, NOT OTHERWISE PROVIDED FOR
    • B67D7/00—Apparatus or devices for transferring liquids from bulk storage containers or reservoirs into vehicles or into portable containers, e.g. for retail sale purposes
    • B67D7/06—Details or accessories
    • B67D7/72—Devices for applying air or other gas pressure for forcing liquid to delivery point
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B67—OPENING, CLOSING OR CLEANING BOTTLES, JARS OR SIMILAR CONTAINERS; LIQUID HANDLING
    • B67D—DISPENSING, DELIVERING OR TRANSFERRING LIQUIDS, NOT OTHERWISE PROVIDED FOR
    • B67D7/00—Apparatus or devices for transferring liquids from bulk storage containers or reservoirs into vehicles or into portable containers, e.g. for retail sale purposes
    • B67D7/06—Details or accessories
    • B67D7/78—Arrangements of storage tanks, reservoirs or pipe-lines

Definitions

  • the present invention relates to a liquid material supply apparatus, a material gas supply system, and a liquid material supply method.
  • a liquid material supply device is used to supply a liquid material to a vaporizer such as a bubbler.
  • the liquid material supply device shown in Patent Document 1 includes a gas supply pipe A control unit that supplies gas from the inside of the storage container into the storage container in which the liquid material is stored to pressurize the surface of the liquid material, thereby supplying the liquid material stored in the storage container to the supply destination through the liquid supply pipe Is adopted.
  • the piping connecting the storage container and the carburetor extends in the vertical direction from the storage container at the connection source and then reaches near the ceiling to avoid interference with other equipment in the factory and the piping that connects it. It is extended horizontally and vertically lowered when it reaches near the vaporizer to which it is connected.
  • the liquid material stored in the storage container is in the vicinity of the floor surface A very high pressure is applied to the liquid material in order to be supplied to the vaporizer via a liquid supply pipe which extends from the to the ceiling.
  • Patent 5155895 gazette
  • an object of the present invention is to provide a liquid material supply device capable of lifting the liquid material to a desired height while maintaining the liquid supply pipe and the supply destination at a lower pressure than the conventional liquid material supply device.
  • the liquid material supply apparatus is a liquid material supply apparatus for supplying a liquid material to a supply destination, and a storage container in which the liquid material is stored, and a liquid of the liquid material stored in the storage container.
  • a liquid supply pipe which is connected to the supply destination at a position higher than the surface and supplies the liquid material from the storage container to the supply destination, and the liquid material stored in the storage container is more than the liquid in the storage container
  • a supply mechanism configured to supply pressure to the liquid supply pipe by reducing the pressure so that the supply pipe has a low pressure and supplying a gas into the storage container. It is.
  • the pressure in the liquid supply pipe is reduced and the liquid material is pressurized. Therefore, even if the pressure of the liquid material is relatively small, the liquid material stored in the storage container is used as the liquid supply pipe.
  • the differential pressure required to supply the fluid can be ensured and as a result there is no need to apply high pressure to the liquid material.
  • the possibility of breakage is significantly reduced.
  • the liquid material stored in the storage container can be supplied to a higher position.
  • the liquid material supply apparatus further includes a retention container for temporarily retaining the liquid material supplied from the liquid supply pipe to the supply destination, and the liquid supply pipe supplies the supply through the retention container. It may be connected with the previous one.
  • the liquid material supplied from the storage container through the liquid material supply pipe can be temporarily stored in the retention container, it can be appropriately supplied from the retention container to the supply destination. It is not necessary to maintain the state in which the pressure load is generated for a long time. Further, by grasping the volume of the stagnant container in advance, the amount of liquid material supplied to the supply destination can be set by the volume of the stagnant container, and the amount of liquid material supplied to the reservoir is monitored There is no need to provide a sensor or the like to
  • the liquid material supply apparatus further includes a first gas supply pipe that supplies a gas into the storage container, and the supply mechanism is configured to connect the storage container and the connection portion in the liquid supply pipe.
  • the first on-off valve is opened after the on-off valve is opened and the on-off valve is opened after closing the on-off valve and reducing the supply destination side to a lower pressure than the on-off valve of the liquid supply pipe.
  • the liquid level of the liquid material may be controlled to be pressurized by the gas supplied from the gas supply pipe into the storage container.
  • the flow rate of the gas supplied from the first gas supply pipe to the storage container is measured, and the measured flow rate approaches a predetermined set flow rate.
  • the fluid level of the liquid material stored in the storage container is the liquid supply when the difference between the measured flow rate and the set flow rate falls below a predetermined set value.
  • the liquid level detection unit may further include a liquid level detection unit that detects that the pipe is lower than the tip end of the pipe.
  • a second gas supply pipe for supplying a gas from the transfer direction side of the liquid material by the supply mechanism in the liquid supply pipe, and a gas stored in the storage container by the supply mechanism. After the liquid material is supplied into the supply destination or into the retention container, the supply of gas from the second gas supply pipe into the liquid supply pipe is started to supply the liquid material in the liquid supply pipe to the storage container And a liquid return mechanism configured as described above.
  • the liquid material does not remain in the liquid supply pipe for a long time, the corrosion time of the liquid supply pipe is reduced, and the life is extended.
  • the liquid material remaining in the liquid supply pipe is supplied to the storage container, the liquid material can be used without waste. And, even if the liquid material is a dangerous drug, the drug is returned to the storage container without being released to the outside of the apparatus, thereby improving the safety.
  • the pressure supply mechanism configured to pressurize the liquid surface of the liquid material in the retention container and supply the liquid material to the supply destination.
  • the third gas supply that supplies gas from the upstream side with respect to the connection portion with respect to the transfer direction of the liquid material by the first supply control unit in the liquid supply pipe.
  • the system further includes a pipe, and the pressurized supply mechanism supplies the gas from the third gas supply pipe into the liquid supply pipe after the liquid material stored in the storage container is supplied into the retention container by the supply mechanism.
  • a pressurized supply control unit may be provided to control to start the supply of
  • At least one of the second gas supply pipe or the third gas supply pipe is branched from the first gas supply pipe. It may be connected to the liquid supply pipe.
  • the second gas supply pipe and the third gas supply pipe are both branched from the first gas supply pipe and connected to the liquid supply pipe, the liquid supply pipe and the first gas are separated.
  • the supply pipe to the third gas supply pipe can be connected in a loop, and even if the liquid material is a dangerous medicine, the medicine does not loop in each pipe and is not discharged out of each pipe. Safety is improved.
  • a material gas supply system is a supply destination of a liquid material by any one of the liquid material supply devices and the liquid material supply device, wherein the material gas is generated by vaporizing the liquid material. And at least one vaporizer.
  • a liquid material supply method is a liquid material supply method for supplying a liquid material stored in a storage container to a supply destination through a liquid supply pipe, wherein the liquid supply pipe is more than the inside of the storage container. And the pressure of the liquid surface of the liquid material stored in the storage container.
  • liquid material supply apparatus configured as described above, it is possible to provide a liquid material supply apparatus capable of lifting the liquid material to a desired height while maintaining the liquid supply pipe and the supply destination at low pressure. .
  • Liquid material supply apparatus 100 Liquid material supply apparatus 200 Material gas supply system 10 Storage container LP Liquid supply pipe GP1 First gas supply pipe GP2 Second gas supply pipe GP3 Third gas supply pipe V1 to V10 First on-off valve to tenth on-off valve TV Retention container VA Vaporizer PP Exhaust pump MFC Flow control device M1 Supply mechanism M2 Liquid return mechanism M3 Pressurized supply mechanism C Control part C1 Supply control part C2 Liquid return control part C3 Pressurized supply control part D Liquid level detection part
  • the material gas supply system 200 is used to supply a material gas to a film forming chamber or the like in a solar cell manufacturing process. Specifically, a material gas such as corrosive POCI 3 , HF, or TEOS is supplied to the film forming chamber.
  • the material gas supply system 200 according to the present invention can be used other than the solar cell manufacturing process.
  • the material gas is generated by vaporizing the liquid material, the liquid material is not limited to one composed only of a liquid, but includes a mixture of slurry and the like.
  • the material gas supply system 200 includes a plurality of vaporizers VA that generate a material gas by vaporizing the liquid material, and the liquid material to each vaporizer VA. And a liquid material supply device 100 for appropriately supplying the liquid material.
  • Each vaporizer VA is installed, for example, at a height of about 1 to 2 m from the floor surface of the plant so that the operator can easily perform adjustment work and the like.
  • Each vaporizer VA is connected to a film forming chamber (not shown) or the like and is open to the atmosphere.
  • the liquid material supply apparatus 100 supplies a storage container 10 for storing liquid material, a liquid supply pipe LP for supplying the liquid material stored in the storage container 10 to each vaporizer VA, and a gas into the storage container 10
  • the first gas supply pipe GP1 (pipe along the dotted arrow in FIG. 1) and the first gas supply pipe GP1 are branched and connected to the liquid supply pipe LP to supply the gas into the liquid supply pipe LP
  • a two-gas supply pipe GP2 and a third gas supply pipe GP3 and an exhaust pump PP connected to an exhaust pipe EP branched from the first gas supply pipe GP1 are provided.
  • the storage container 10 is installed, for example, at a height of about 1 to 2 m from the floor surface of the factory so that the operator can easily carry out the adjustment operation and the like, as with each vaporizer VA.
  • the liquid supply pipe LP extends vertically from the storage container 10 toward a ceiling located higher than the liquid surface of the liquid material stored in the storage container 10, and then extends horizontally along the ceiling It has a part. Therefore, the horizontal portion of the liquid supply pipe LP is disposed at a position higher than the liquid level of the liquid material stored in the storage container 10.
  • a plurality of connection pipes P1 are branched in the horizontal portion of the liquid supply pipe LP, and are connected to the respective vaporizers VA installed at positions lower than the liquid supply pipe LP via the respective connection pipes P1.
  • a first on-off valve V1 and a second on-off valve V2 are installed in order from the storage container 10 side between the storage container 10 and the connection pipe P1.
  • the first on-off valve V1 corresponds to the on-off valve in the claims.
  • liquid supply pipe LP in the horizontal part of liquid supply pipe LP, a plurality of connecting pipes P1 will be intermittently provided. Then, the liquid supply pipe LP is connected to each connection pipe P1, and is installed at a lower position than the stagnant container TV via the stagnant container TV installed at a lower position than the horizontal portion of the liquid supply pipe LP. Are connected in parallel with a plurality of vaporizers VA.
  • the connection pipe P1 is provided with a third on-off valve V3 in the middle thereof.
  • the stagnant container TV is connected to each vaporizer VA by a multi-branch pipe P2 which is branched in various ways from the stagnant container TV according to the number of vaporizers VA.
  • the 4th on-off valve V4 corresponding to each vaporizer VA is installed in the branch pipe P2.
  • the first gas supply pipe GP1 is connected to a gas supply device for supplying an inert gas such as nitrogen, and a fluid control device MFC (mass flow controller) is installed in the middle thereof.
  • a fifth on-off valve V5 and a sixth on-off valve V6 are installed sequentially from the fluid control device MFC side between the fluid control device MFC and the storage container 10.
  • the fluid control device MFC is configured to measure the flow rate of the gas flowing through the first gas supply pipe GP1 and to control the measured flow rate to approach a predetermined set flow rate.
  • the second gas supply pipe GP2 is branched from the first gas supply pipe GP1 and connected to the liquid supply pipe LP, and a seventh on-off valve V7 is installed in the middle thereof.
  • the second gas supply pipe GP2 branches from between the fifth on-off valve V5 and the sixth on-off valve V6 of the first gas supply pipe GP1, and extends to the ceiling of the liquid supply pipe LP extending from the storage container 10. It is connected to the end of the horizontal part which extends horizontally along.
  • a bypass pipe BP is separately bridged between the first gas supply pipe GP1 and the second gas supply pipe GP2, and an eighth on-off valve V8 is installed in the bypass pipe BP.
  • the bypass pipe BP branches from between the flow control device MFC of the first gas supply pipe GP1 and the fifth on-off valve V5, and is closer to the liquid supply pipe LP than the seventh on-off valve V7 of the second gas supply pipe GP2. Connected to.
  • a line is formed to prevent the gas supplied from the gas supply device from passing through any of the first gas supply pipe GP1 and the second gas supply pipe GP2. it can.
  • a looped line connected to the storage container 10 is formed by the liquid supply pipe LP, a part of the first gas supply pipe GP1 and the second gas supply pipe GP2. Be done.
  • the third gas supply pipe GP3 is branched from the first gas supply pipe GP1 and connected to the liquid supply pipe LP, and a ninth on-off valve V9 is installed in the middle thereof. Specifically, the third gas supply pipe GP3 branches from between the fifth on-off valve V5 and the sixth on-off valve V6 of the first gas supply pipe GP1, and the first of the liquid supply pipe LP extending from the storage container 10 It is connected between the on-off valve V1 and the second on-off valve V2.
  • the exhaust pump PP is connected to an exhaust pipe EP which branches from the first gas supply pipe GP1.
  • a tenth on-off valve V10 is installed in the middle of the exhaust pipe EP.
  • the liquid material supply device 100 includes a control unit C to which the on-off valves V1 to V10 and the fluid control device MFC are connected.
  • the control unit C is, for example, a computer provided with a CPU, a memory, an input / output unit, an A / D, D / A converter, etc., and each on-off valve V1 to V10 is Are controlled to exert functions as the supply mechanism M1, the liquid return mechanism M2, and the pressure supply mechanism M3.
  • Each mechanism includes a plurality of on-off valves installed on each pipe, and a separate control unit that controls the on-off operation of each on-off valve. Implement the operation corresponding to the mechanism.
  • the ninth on-off valve V9 installed in the pipe GP3 and the tenth on-off valve V10 disposed on the exhaust pipe EP are controlled by the supply control unit C1, the liquid return control unit C2, or the pressurized supply control unit C2. , Opening and closing according to a predetermined sequence.
  • the supply mechanism M1 causes the supply control unit C1 to open and close the on-off valves V1 to V10, and the exhaust pump PP decompresses (evacuates) the liquid supply pipe LP to a lower pressure than the storage container 10
  • the gas is supplied from the first gas supply pipe GP1 into the storage container 10 via the flow rate control device MFC to pressurize the liquid surface of the liquid material stored in the storage container 10, and from the storage container 10 to the liquid supply pipe LP. Control to supply the liquid material to the
  • the liquid return mechanism M2 causes the liquid return control unit C2 to open and close the on-off valves V1 to V10, and after the liquid material stored in the storage container 10 is supplied to the retention container TV by the supply mechanism M1, the second gas The gas is supplied from the supply pipe GP2 into the liquid supply pipe LP via the flow control device MFC so that the liquid material remaining in the liquid supply pipe LP is returned to the storage container 10.
  • the pressurized supply mechanism M3 controls the on-off valves V1 to V10 by the pressurized supply control unit C3 and returns the liquid material remaining in the liquid supply pipe LP to the storage container 10 by the liquid return mechanism. 3)
  • the gas is supplied from the gas supply pipe GP3 into the liquid supply pipe LP via the flow rate control device MFC so as to pressurize the liquid surface of the liquid material retained in the retention container TV.
  • liquid material supply start signal is sent to the control unit C of the liquid material supply device 100, whereby the liquid material supply device 100 receives the supply mechanism M1.
  • the operations by the liquid return mechanism M2 and the pressure supply mechanism M3 are sequentially performed. The details will be described below.
  • the supply control unit C1 When the control unit C receives the liquid material supply start signal, first, as shown in FIG. 2A, the supply control unit C1 includes the first on-off valve V1, the fourth on-off valve V4, the fifth on-off valve V5, The sixth on-off valve V6, the eighth on-off valve V8 and the ninth on-off valve V9 are closed, and the second on-off valve V2, the third on-off valve V3, and the seventh on-off valve V7 are controlled to be opened.
  • the supply destination VA side of the liquid supply pipe LP relative to the first on-off valve V1 is connected to the exhaust pump PP via the second gas supply pipe GP2, a part of the first gas supply pipe GP1, and the exhaust pipe EP. Be done.
  • the pressure on the supply destination VA side of the first on-off valve V1 of the liquid supply pipe LP is reduced by the exhaust pump PP so that the pressure is lower than in the storage container 10.
  • the supply control unit C1 next, as shown in FIG. 2B, the fourth on-off valve V4, the seventh on-off valve V7, the eighth on-off valve V8, Control is performed to close the ninth on-off valve V9 and the tenth on-off valve V10, and open the first on-off valve V1, the second on-off valve V2, the third on-off valve V3, the fifth on-off valve V5, and the sixth on-off valve V6.
  • the supply destination VA side of the liquid supply pipe LP with respect to the first on-off valve V1 communicates with the storage container 10, and the storage container 10 is connected to the gas supply device via the first gas supply pipe GP1.
  • the liquid material stored in the storage container 10 is sucked into the liquid supply pipe LP. Then, gas is supplied from the first gas supply pipe GP1 into the storage container 10, and the liquid surface of the liquid material stored in the storage container 10 is pressurized. Thereby, the liquid material stored in the storage container 10 is pressure-fed into the stagnant container TV via the liquid supply pipe LP.
  • the inside of the liquid supply pipe LP is depressurized to a lower pressure than the storage container 10 in advance, storage in the storage container 10 is possible even if the pressurization of the liquid surface of the liquid material stored in the storage container 10 is reduced to some extent. It is possible to obtain the differential pressure necessary to supply the stored liquid material to the holding vessel TV.
  • the reduced pressure value in the liquid supply pipe LP by the supply control unit C1 and the pressurized value in the storage container 10 transfer the liquid material stored in the storage container 10 to each connection pipe P1 of the liquid supply pipe LP. It is set so as to obtain a differential pressure of a certain degree.
  • the liquid material supplied into the liquid supply pipe LP by the supply mechanism M1 does not reach the second gas supply pipe GP2.
  • the liquid supply pipe LP with respect to the storage container 10
  • the liquid material reaching the gas supply pipe GP can be returned to the storage container 10 again.
  • the liquid return control unit C2 controls the third on-off valve V3, the fourth The on-off valve V4, the fifth on-off valve V5, the seventh on-off valve V7 and the ninth on-off valve V9 are closed, and the first on-off valve V1, the second on-off valve V2, the sixth on-off valve V6, the eighth on-off valve V8, the eighth 10 Control to open the on-off valve V10.
  • the liquid supply pipe LP is connected to the gas supply device via the bypass pipe BP and the second gas supply pipe GP2, and the storage container 10 is connected via a part of the first gas supply GP1 and the exhaust pipe EP.
  • the gas is supplied from the second gas supply pipe GP2 into the liquid supply pipe LP, and the liquid material remaining in the liquid supply pipe LP is returned into the storage container 10.
  • the liquid material remaining in the liquid supply pipe LP can be returned to the storage container 10 even if the air is exhausted by the exhaust pump PP.
  • the remaining amount of the liquid material in the storage container 10 can be detected using the measured flow rate in the flow control device MFC. That is, in the state where the liquid surface of the liquid material stored in the storage container 10 reaches the lower end (tip) of the liquid supply pipe LP, in other words, in the state where the remaining amount is large, it is supplied via the flow control device MFC Since the liquid level of the liquid material is pressurized by the liquid gas, the measured flow rate measured by the flow control device MFC becomes much smaller than the set flow rate.
  • the gas supplied via the flow control device MFC is The measured flow rate measured by the flow control device MFC approaches the set flow rate because the flow directly to the liquid supply pipe LP.
  • the liquid level of the liquid material stored in the storage container 10 has reached the lower end of the liquid supply pipe LP.
  • the difference between the measured flow rate and the set flow rate becomes equal to or less than a predetermined set value in the control unit C
  • the liquid level of the liquid material stored in the storage container 10 corresponds to that of the liquid supply pipe LP.
  • a liquid level detection unit D is provided to detect that the lower end has not been reached.
  • the liquid return control unit C2 When the liquid return control unit C2 returns the liquid material remaining in the liquid supply pipe LP into the storage container 10, next, as shown in FIG.
  • the valve V1, part of the fourth on-off valve V4, the sixth on-off valve V6, the seventh on-off valve V7, the eighth on-off valve V8 and the tenth on-off valve V10 are closed, and the second on-off valve, the third on-off valve, the It controls so that a part of 4 on-off valve, the 5th on-off valve V5, and the 9th on-off valve V9 may be opened.
  • the liquid supply pipe LP is connected to the gas supply device via a part of the first gas supply pipe GP1 and the third gas supply pipe GP3.
  • the gas is supplied from the third gas supply pipe GP3 into the retention container TV, and the liquid surface of the liquid material stored in the retention container TV is pressurized.
  • the liquid material is supplied to the vaporizer VA corresponding to the part of the opened fourth on-off valve V4.
  • the pressurized supply control unit C3 controls the open / close timing of each fourth on-off valve V4 so as to supply an appropriate amount of liquid material to each vaporizer VA.
  • the stagnant container TV functions to adjust the supply amount of the vaporizer VA, and thereby, to the vaporizer VA. There is no need to provide a sensor or the like for monitoring the supply amount.
  • control unit C receives the liquid material supply start signal transmitted at the timing when the remaining amount of liquid material in the vaporizer VA becomes equal to or less than the predetermined amount (for example, the detection timing of the liquid level detection unit D). The operation by each control is repeated.
  • the gas is supplied from the gas supply device through the flow control device MFC, it is possible to prevent a sudden pressure change from occurring in the liquid material transferred into each pipe, Thus, it is possible to prevent the situation in which the gas supplied from the gas supply device presses the liquid material in each of the pipes and is released.
  • the second gas supply pipe GP2 and the third gas supply pipe GP3 are branched from the first gas supply pipe GP1, and the gas is supplied from the same gas supply device.
  • the second gas supply pipe GP2 and the third gas supply pipe GP3 are branched from the liquid supply pipe LP, and a structure is adopted in which gas is supplied from another gas supply device. May be
  • a weight scale for measuring the weight of the storage container 10 is installed, and the liquid material in the storage container 10 is used when the weight of the storage container 10 becomes equal to or less than a predetermined set weight.
  • a remaining amount detection unit may be provided to detect that the remaining amount is insufficient. As a result, the remaining amount of the liquid material in the storage container 10 can be checked by the method using the fluid control device MFC and the method using a weight scale.
  • connection of liquid supply pipe LP is carried out A mode may be adopted in which the liquid material transferred to the pipe P1 is directly supplied to each vaporizer VA.
  • the pressure in the liquid supply pipe LP is reduced by the supply mechanism M1
  • the liquid level of the liquid material stored in the storage container 10 is pressurized
  • the liquid supply pipe The liquid surface of the liquid material stored in the storage container 10 may be pressurized while reducing the pressure in the LP.
  • liquid material supply apparatus of the present invention it is possible to provide a liquid material supply apparatus capable of lifting the liquid material to a desired height while maintaining the liquid supply pipe and the supply destination at a low pressure.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Loading And Unloading Of Fuel Tanks Or Ships (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)

Abstract

The present invention raises a liquid material to a desired height while maintaining a liquid supply tube and a supply destination at low pressure. A liquid material supply device for supplying a liquid material to a supply point, the liquid material supply device being provided with: a storage container in which the liquid material is stored; a liquid supply tube connected to the supply point at a position higher than the liquid level of the liquid material stored in the storage container, the liquid supply tube supplying the liquid material from the storage container to the supply point; and a supply mechanism constituted so as to supply the liquid material stored in the storage container to the inside of the liquid supply tube by reducing the pressure in the liquid supply tube to become lower than the pressure in the storage container and supplying a gas to the inside of the storage container.

Description

液体材料供給装置、材料ガス供給システム及び液体材料供給方法Liquid material supply apparatus, material gas supply system and liquid material supply method
　本発明は、液体材料供給装置、材料ガス供給システム及び液体材料供給方法に関するものである。 The present invention relates to a liquid material supply apparatus, a material gas supply system, and a liquid material supply method.
　太陽電池製造プロセスや半導体製造プロセス等では、バブラー等の気化器に液体材料を供給するために液体材料供給装置が用いられており、例えば、特許文献１に示す液体材料供給装置は、気体供給管から液体材料が貯留された貯留容器内へ気体を供給して液体材料の液面を加圧し、これにより、貯留容器に貯留された液体材料を液体供給管を介して供給先へ供給する制御部が採用されている。 In a solar cell manufacturing process, a semiconductor manufacturing process, etc., a liquid material supply device is used to supply a liquid material to a vaporizer such as a bubbler. For example, the liquid material supply device shown in Patent Document 1 includes a gas supply pipe A control unit that supplies gas from the inside of the storage container into the storage container in which the liquid material is stored to pressurize the surface of the liquid material, thereby supplying the liquid material stored in the storage container to the supply destination through the liquid supply pipe Is adopted.
　ところで、通常、工場においては、貯留容器や気化器のように液体材料を貯留し重量が重くなるものは床面の近くに設置される。このため、貯留容器及び気化器を接続する配管は、工場内の他の機器やそれをつなぐ配管との干渉を避けるため、接続元の貯留容器から垂直方向に延ばした後に天井付近に達してから水平方向に延ばし、接続先である気化器の近くまで達すると垂直方向に下ろして接続される。 By the way, in a factory, one which stores liquid material and becomes heavy, such as a storage container or a vaporizer, is usually installed near a floor surface. For this reason, the piping connecting the storage container and the carburetor extends in the vertical direction from the storage container at the connection source and then reaches near the ceiling to avoid interference with other equipment in the factory and the piping that connects it. It is extended horizontally and vertically lowered when it reaches near the vaporizer to which it is connected.
　そして、工場は、床面から天井まである程度の高さ（例えば、１０ｍ程度の高さ）があることから、前記従来の液体材料供給装置においては、貯留容器に貯留された液体材料を床面付近から天井付近まで延びる液体供給管を介して気化器へ供給させるために、液体材料に対して非常に高い圧力を加えている。 And since the factory has a certain height (for example, about 10 m in height) from the floor surface to the ceiling, in the conventional liquid material supply apparatus, the liquid material stored in the storage container is in the vicinity of the floor surface A very high pressure is applied to the liquid material in order to be supplied to the vaporizer via a liquid supply pipe which extends from the to the ceiling.
　しかしながら、近年、腐食性を有する液体材料の用途が増え、これに伴って、気化器として、耐食性が低い金属を使用することができなくなり、耐食性が高い石英やパイレックス（登録商標）が使用されることが多くなっている。そして、これらの気化器は、金属製の気化器に比べて耐圧性が劣るため、このような気化器に対し、前記従来の液体材料供給装置を使用して液体材料を供給しようとすると、液体材料に加えられた高い圧力に耐えることができずに破損する可能性があった。 However, in recent years, the use of liquid materials having corrosive properties has increased, and accordingly, it has become impossible to use metals with low corrosion resistance as vaporizers, and quartz and Pyrex (registered trademark) having high corrosion resistance are used. Things are getting more and more. And since these vaporizers have inferior pressure resistance compared with metal vaporizers, when it is going to supply a liquid material to such a vaporizer using the said conventional liquid material supply apparatus, There was the possibility of breakage without being able to withstand the high pressure applied to the material.
特許５１５５８９５号公報Patent 5155895 gazette
　そこで、本発明は、従来の液体材料供給装置よりも液体供給管や供給先を低圧に保ちながら、液体材料を所望の高さまで持ち上げることができる液体材料供給装置を提供する事を目的とする。 Therefore, an object of the present invention is to provide a liquid material supply device capable of lifting the liquid material to a desired height while maintaining the liquid supply pipe and the supply destination at a lower pressure than the conventional liquid material supply device.
　すなわち、本発明に係る液体材料供給装置は、液体材料を供給先へ供給する液体材料供給装置であって、前記液体材料が貯留される貯留容器と、前記貯留容器に貯留された液体材料の液面よりも高い位置において前記供給先と接続され、前記貯留容器から前記供給先へ液体材料を供給する液体供給管と、前記貯留容器に貯留された液体材料を、前記貯留容器内よりも前記液体供給管内が低圧になるように減圧し、前記貯留容器内へ気体を供給することによって前記液体供給管内へ供給するように構成されている供給機構と、を具備していることを特徴とするものである。 That is, the liquid material supply apparatus according to the present invention is a liquid material supply apparatus for supplying a liquid material to a supply destination, and a storage container in which the liquid material is stored, and a liquid of the liquid material stored in the storage container. A liquid supply pipe which is connected to the supply destination at a position higher than the surface and supplies the liquid material from the storage container to the supply destination, and the liquid material stored in the storage container is more than the liquid in the storage container And a supply mechanism configured to supply pressure to the liquid supply pipe by reducing the pressure so that the supply pipe has a low pressure and supplying a gas into the storage container. It is.
　このようなものであれば、液体供給管内を減圧すると共に、液体材料を加圧することになるため、液体材料の加圧が比較的小さくても、貯留容器に貯留された液体材料を液体供給管内へ供給するために必要となる差圧を確保することができ、結果として、液体材料に対して高い圧力を加える必要が無くなる。これにより、例えば、供給先となる気化器として耐圧性の低い石英等の材料を用いたとしても破損する可能性が格段に低くなる。また、貯留容器に貯留された液体材料をより高い位置へ供給することができるようになる。 In such a case, the pressure in the liquid supply pipe is reduced and the liquid material is pressurized. Therefore, even if the pressure of the liquid material is relatively small, the liquid material stored in the storage container is used as the liquid supply pipe. The differential pressure required to supply the fluid can be ensured and as a result there is no need to apply high pressure to the liquid material. As a result, for example, even if a material such as quartz with low pressure resistance is used as a vaporizer to be a supply destination, the possibility of breakage is significantly reduced. Also, the liquid material stored in the storage container can be supplied to a higher position.
　また、前記液体材料供給装置において、前記液体供給管から前記供給先へ供給される液体材料を一時的に滞留させる滞留容器をさらに具備し、前記液体供給管が、前記滞留容器を介して前記供給先と接続されているものであってもよい。 Further, the liquid material supply apparatus further includes a retention container for temporarily retaining the liquid material supplied from the liquid supply pipe to the supply destination, and the liquid supply pipe supplies the supply through the retention container. It may be connected with the previous one.
　このようなものであれば、貯留容器から液体材料供給管を介して供給される液体材料を一旦滞留容器に溜めた後、その滞留容器から適宜供給先へ供給することができるため、液体供給管に対して圧力による負荷が生じている状態を長時間維持する必要がなくなる。また、滞留容器の容量を予め把握しておくことにより、供給先へ供給される液体材料の供給量を滞留容器の容量によって設定することができ、供給先に対して液体材料の供給量を監視するためのセンサ等を設ける必要がなくなる。 With such a thing, after the liquid material supplied from the storage container through the liquid material supply pipe can be temporarily stored in the retention container, it can be appropriately supplied from the retention container to the supply destination. It is not necessary to maintain the state in which the pressure load is generated for a long time. Further, by grasping the volume of the stagnant container in advance, the amount of liquid material supplied to the supply destination can be set by the volume of the stagnant container, and the amount of liquid material supplied to the reservoir is monitored There is no need to provide a sensor or the like to
　また、前記いずれかの液体材料供給装置において、前記貯留容器内へ気体を供給する第１気体供給管をさらに具備し、前記供給機構が、前記液体供給管における前記貯留容器と前記接続部との間に設置される開閉弁と、前記開閉弁を閉止して前記液体供給管の前記開閉弁よりも前記供給先側が低圧になるように減圧してから前記開閉弁を開放した後に、前記第１気体供給管から前記貯留容器内へ供給した気体によって前記液体材料の液面を加圧するように制御するものであってもよい。 The liquid material supply apparatus according to any one of the above, further includes a first gas supply pipe that supplies a gas into the storage container, and the supply mechanism is configured to connect the storage container and the connection portion in the liquid supply pipe. And the first on-off valve is opened after the on-off valve is opened and the on-off valve is opened after closing the on-off valve and reducing the supply destination side to a lower pressure than the on-off valve of the liquid supply pipe. The liquid level of the liquid material may be controlled to be pressurized by the gas supplied from the gas supply pipe into the storage container.
　また、前記第１気体供給管を備えた液体材料供給装置において、前記第１気体供給管から前記貯留容器に供給される気体の流量を測定し、その測定流量が予め定められた設定流量に近づくように制御する流体制御装置と、前記測定流量と前記設定流量との差が予め定められた設定値以下になった場合に、前記貯留容器内に貯留された液体材料の液面が前記液体供給管の先端よりも低くなった状態にあることを検知する液面検知部と、をさらに具備しているものであってもよい。 In the liquid material supply apparatus having the first gas supply pipe, the flow rate of the gas supplied from the first gas supply pipe to the storage container is measured, and the measured flow rate approaches a predetermined set flow rate. And the fluid level of the liquid material stored in the storage container is the liquid supply when the difference between the measured flow rate and the set flow rate falls below a predetermined set value. The liquid level detection unit may further include a liquid level detection unit that detects that the pipe is lower than the tip end of the pipe.
　このようなものであれば、貯留容器に対して液体材料の残量を検知するためのセンサを設ける必要がなくなり、コストを抑えることができる。また、貯留容器に対してセンサを設置する必要がないことから、貯留容器内におけるパーティクルの発生を低減できる。 With such a thing, it becomes unnecessary to provide the sensor for detecting the residual amount of a liquid material with respect to a storage container, and can hold down cost. Moreover, since it is not necessary to install a sensor with respect to a storage container, generation | occurrence | production of the particle in a storage container can be reduced.
　また、前記いずれかの液体材料供給装置において、前記液体供給管における前記供給機構による液体材料の移送方向側から気体を供給する第２気体供給管と、前記供給機構によって前記貯留容器に貯留された液体材料が前記供給先又は前記滞留容器内へ供給された後に、前記第２気体供給管から前記液体供給管内へ気体の供給を開始して前記液体供給管内の液体材料を前記貯留容器へ供給するように構成されている液戻し機構と、を備えているものであってもよい。 Further, in any one of the liquid material supply devices, a second gas supply pipe for supplying a gas from the transfer direction side of the liquid material by the supply mechanism in the liquid supply pipe, and a gas stored in the storage container by the supply mechanism. After the liquid material is supplied into the supply destination or into the retention container, the supply of gas from the second gas supply pipe into the liquid supply pipe is started to supply the liquid material in the liquid supply pipe to the storage container And a liquid return mechanism configured as described above.
　このようなものであれば、液体供給管内に液体材料が長時間残留することがなくなり、液体供給管の腐食時間が低減して寿命が延びる。また、液体供給管内に残留する液体材料を貯留容器へ供給するため、液体材料を無駄なく使用することができる。そして、液体材料が危険な薬剤であったとしても、その薬剤が装置外へ放出されることなく貯留容器へ戻されるため、安全性が向上する。 With such a structure, the liquid material does not remain in the liquid supply pipe for a long time, the corrosion time of the liquid supply pipe is reduced, and the life is extended. In addition, since the liquid material remaining in the liquid supply pipe is supplied to the storage container, the liquid material can be used without waste. And, even if the liquid material is a dangerous drug, the drug is returned to the storage container without being released to the outside of the apparatus, thereby improving the safety.
　また、前記滞留容器を備えた液体材料供給装置において、前記滞留容器内の液体材料の液面を加圧して当該液体材料を前記供給先へ供給するように構成されている加圧供給機構をさらに具備しているものであってもよく、この場合、前記液体供給管における前記第１供給制御部による液体材料の移送方向に対して前記接続部よりも上流側から気体を供給する第３気体供給管をさらに具備し、前記加圧供給機構が、前記供給機構によって前記貯留容器に貯留された液体材料が前記滞留容器内へ供給された後に、前記第３気体供給管から前記液体供給管内へ気体の供給を開始するように制御する加圧供給制御部を備えているものであってもよい。 Further, in the liquid material supply apparatus including the retention container, the pressure supply mechanism configured to pressurize the liquid surface of the liquid material in the retention container and supply the liquid material to the supply destination is further provided. In this case, the third gas supply that supplies gas from the upstream side with respect to the connection portion with respect to the transfer direction of the liquid material by the first supply control unit in the liquid supply pipe. The system further includes a pipe, and the pressurized supply mechanism supplies the gas from the third gas supply pipe into the liquid supply pipe after the liquid material stored in the storage container is supplied into the retention container by the supply mechanism. A pressurized supply control unit may be provided to control to start the supply of
　このようなものであれば、滞留容器から供給先へ液体材料を加圧しながら供給するため、滞留容器から供給先へ液体材料を供給するための時間を短縮することができる。 In such a case, since the liquid material is supplied from the retention container to the supply destination while being pressurized, the time for supplying the liquid material from the residence container to the supply destination can be shortened.
　また、前記第２気体供給管又は前記第３気体供給管を備えた液体材料供給装置において、前記第２気体供給管又は前記第３気体供給管の少なくとも一方が、前記第１気体供給管から分岐して前記液体供給管に接続されているものであってもよい。 In the liquid material supply apparatus including the second gas supply pipe or the third gas supply pipe, at least one of the second gas supply pipe or the third gas supply pipe is branched from the first gas supply pipe. It may be connected to the liquid supply pipe.
　このようなものであれば、例えば、第２気体供給管及び第３気体供給管がいずれも第１気体供給管から分岐して液体供給管に接続されていると、液体供給管及び第１気体供給管～第３気体供給管がループ状に繋げることができ、液体材料が危険な薬剤であったとしても、その薬剤が各配管内をループして各配管外へ放出されることがなく、安全性が向上する。 In such a case, for example, when the second gas supply pipe and the third gas supply pipe are both branched from the first gas supply pipe and connected to the liquid supply pipe, the liquid supply pipe and the first gas are separated. The supply pipe to the third gas supply pipe can be connected in a loop, and even if the liquid material is a dangerous medicine, the medicine does not loop in each pipe and is not discharged out of each pipe. Safety is improved.
　また、本発明に係る材料ガス供給システムは、前記いずれかの液体材料供給装置と、前記液体材料供給装置によって液体材料を供給する供給先であって、その液体材料を気化して材料ガスを生成する少なくとも一つの気化器と、を具備していることを特徴とするものである。 A material gas supply system according to the present invention is a supply destination of a liquid material by any one of the liquid material supply devices and the liquid material supply device, wherein the material gas is generated by vaporizing the liquid material. And at least one vaporizer.
　また、本発明に係る液体材料供給方法は、貯留容器に貯留された液体材料を液体供給管を介して供給先へ供給する液体材料供給方法であって、前記貯留容器内よりも前記液体供給管内が低圧になるように減圧することと、前記貯留容器に貯留された液体材料の液面を加圧することと、を備えることを特徴とするものである。 Further, a liquid material supply method according to the present invention is a liquid material supply method for supplying a liquid material stored in a storage container to a supply destination through a liquid supply pipe, wherein the liquid supply pipe is more than the inside of the storage container. And the pressure of the liquid surface of the liquid material stored in the storage container.
　このように構成した本発明に係る液体材料供給装置によれば、液体供給管や供給先を低圧に保ちながら、液体材料を所望の高さまで持ち上げることができる液体材料供給装置を提供することができる。 According to the liquid material supply apparatus according to the present invention configured as described above, it is possible to provide a liquid material supply apparatus capable of lifting the liquid material to a desired height while maintaining the liquid supply pipe and the supply destination at low pressure. .
実施形態に係る材料ガス供給システムを示す模式図である。It is a schematic diagram which shows the material gas supply system which concerns on embodiment. 実施形態に係る液体材料供給装置の動作を示す模式図である。It is a schematic diagram which shows operation | movement of the liquid material supply apparatus which concerns on embodiment. 実施形態に係る液体材料供給装置の動作を示す模式図である。It is a schematic diagram which shows operation | movement of the liquid material supply apparatus which concerns on embodiment.
１００　液体材料供給装置
２００　材料ガス供給システム
１０　貯留容器
ＬＰ　液体供給管
ＧＰ１　第１気体供給管
ＧＰ２　第２気体供給管
ＧＰ３　第３気体供給管
Ｖ１～Ｖ１０　第１開閉弁～第１０開閉弁
ＴＶ　滞留容器
ＶＡ　気化器
ＰＰ　排気ポンプ
ＭＦＣ　流量制御装置
Ｍ１　供給機構
Ｍ２　液戻し機構
Ｍ３　加圧供給機構
Ｃ　制御部
Ｃ１　供給制御部
Ｃ２　液戻し制御部
Ｃ３　加圧供給制御部
Ｄ　液面検知部 100 Liquid material supply apparatus 200 Material gas supply system 10 Storage container LP Liquid supply pipe GP1 First gas supply pipe GP2 Second gas supply pipe GP3 Third gas supply pipe V1 to V10 First on-off valve to tenth on-off valve TV Retention container VA Vaporizer PP Exhaust pump MFC Flow control device M1 Supply mechanism M2 Liquid return mechanism M3 Pressurized supply mechanism C Control part C1 Supply control part C2 Liquid return control part C3 Pressurized supply control part D Liquid level detection part
　以下に、本発明に係る液体材料供給装置１００、及び、材料ガス供給システム２００を図面に基づいて説明する。 Hereinafter, a liquid material supply apparatus 100 and a material gas supply system 200 according to the present invention will be described based on the drawings.
　本発明に係る材料ガス供給システム２００は、太陽電池製造プロセスにおいて、成膜室等へ材料ガスを供給するために使用されるものである。なお、具体的には、腐食性を有するＰＯＣＩ３、ＨＦ、ＴＥＯＳ等の材料ガスを成膜室へ供給するように構成されている。なお、本発明に係る材料ガス供給システム２００は、太陽電池製造プロセス以外にも使用することができる。なお、前記材料ガスは、液体材料を気化して生成されるが、この液体材料には、液体のみからなるものに限定されず、スラリー等が混合されたものも含まれる。 The material gas supply system 200 according to the present invention is used to supply a material gas to a film forming chamber or the like in a solar cell manufacturing process. Specifically, a material gas such as corrosive POCI 3 , HF, or TEOS is supplied to the film forming chamber. The material gas supply system 200 according to the present invention can be used other than the solar cell manufacturing process. Although the material gas is generated by vaporizing the liquid material, the liquid material is not limited to one composed only of a liquid, but includes a mixture of slurry and the like.
　＜実施形態１＞　本実施形態に係る材料ガス供給システム２００は、図１に示すように、液体材料を気化して材料ガスを生成する複数の気化器ＶＡと、各気化器ＶＡへ液体材料を適宜供給する液体材料供給装置１００と、を具備している。なお、各気化器ＶＡは、オペレータが調整作業等を実施し易いように、例えば、工場の床面から１～２ｍ程度の高さまでに設置されている。また、各気化器ＶＡは、図示しない成膜室等に接続されており、大気開放されている。 First Embodiment As shown in FIG. 1, the material gas supply system 200 according to the present embodiment includes a plurality of vaporizers VA that generate a material gas by vaporizing the liquid material, and the liquid material to each vaporizer VA. And a liquid material supply device 100 for appropriately supplying the liquid material. Each vaporizer VA is installed, for example, at a height of about 1 to 2 m from the floor surface of the plant so that the operator can easily perform adjustment work and the like. Each vaporizer VA is connected to a film forming chamber (not shown) or the like and is open to the atmosphere.
　前記液体材料供給装置１００は、液体材料を貯留する貯留容器１０と、貯留容器１０に貯留された液体材料を各気化器ＶＡへ供給する液体供給管ＬＰと、貯留容器１０内へ気体を供給する第１気体供給管ＧＰ１（図１中、点線矢印に沿った配管）と、第１気体供給管ＧＰ１から分岐して液体供給管ＬＰに接続され、その液体供給管ＬＰ内へ気体を供給する第２気体供給管ＧＰ２及び第３気体供給管ＧＰ３と、第１気体供給管ＧＰ１から分岐する排気管ＥＰに接続される排気ポンプＰＰと、を具備している。 The liquid material supply apparatus 100 supplies a storage container 10 for storing liquid material, a liquid supply pipe LP for supplying the liquid material stored in the storage container 10 to each vaporizer VA, and a gas into the storage container 10 The first gas supply pipe GP1 (pipe along the dotted arrow in FIG. 1) and the first gas supply pipe GP1 are branched and connected to the liquid supply pipe LP to supply the gas into the liquid supply pipe LP A two-gas supply pipe GP2 and a third gas supply pipe GP3 and an exhaust pump PP connected to an exhaust pipe EP branched from the first gas supply pipe GP1 are provided.
　前記貯留容器１０は、各気化器ＶＡと同様にオペレータが調整作業等を実施し易いように、例えば、工場の床面から１～２ｍ程度の高さまでに設置されている。 The storage container 10 is installed, for example, at a height of about 1 to 2 m from the floor surface of the factory so that the operator can easily carry out the adjustment operation and the like, as with each vaporizer VA.
　前記液体供給管ＬＰは、貯留容器１０からその貯留容器１０に貯留される液体材料の液面よりも高い位置にある天井に向かって垂直方向へ延びた後、天井に沿って水平方向へ延びる水平部分を有している。従って、液体供給管ＬＰの水平部分は、貯留容器１０に貯留される液体材料の液面よりも高い位置に配置されている。そして、液体供給管ＬＰの水平部分には、複数の接続管Ｐ１が分岐しており、各接続管Ｐ１を介して液体供給管ＬＰよりも低い位置に設置される各気化器ＶＡに接続されている。また、液体供給管ＬＰには、貯留容器１０から接続管Ｐ１に至るまでの間に貯留容器１０側から順番に第１開閉弁Ｖ１及び第２開閉弁Ｖ２が設置されている。なお、第１開閉弁Ｖ１が、請求項における開閉弁に該当する。 The liquid supply pipe LP extends vertically from the storage container 10 toward a ceiling located higher than the liquid surface of the liquid material stored in the storage container 10, and then extends horizontally along the ceiling It has a part. Therefore, the horizontal portion of the liquid supply pipe LP is disposed at a position higher than the liquid level of the liquid material stored in the storage container 10. A plurality of connection pipes P1 are branched in the horizontal portion of the liquid supply pipe LP, and are connected to the respective vaporizers VA installed at positions lower than the liquid supply pipe LP via the respective connection pipes P1. There is. Further, in the liquid supply pipe LP, a first on-off valve V1 and a second on-off valve V2 are installed in order from the storage container 10 side between the storage container 10 and the connection pipe P1. The first on-off valve V1 corresponds to the on-off valve in the claims.
　さらに、詳述すると、液体供給管ＬＰの水平部分には、接続管Ｐ１が間欠的に複数設けられている。そして、液体供給管ＬＰは、各接続管Ｐ１に接続され、液体供給管ＬＰの水平部分よりも低い位置に設置される滞留容器ＴＶを介して、その滞留容器ＴＶよりも更に低い位置に設置される複数の気化器ＶＡと並列的に接続されている。なお、接続管Ｐ１は、その途中に第３開閉弁Ｖ３を備えている。また、滞留容器ＴＶは、その滞留容器ＴＶから気化器ＶＡの数に合わせて多岐状に分岐した多枝管Ｐ２によって各気化器ＶＡに接続されている。なお、分岐管Ｐ２には、それぞれの気化器ＶＡに対応する第４開閉弁Ｖ４が設置されている。 Furthermore, if it explains in full detail, in the horizontal part of liquid supply pipe LP, a plurality of connecting pipes P1 will be intermittently provided. Then, the liquid supply pipe LP is connected to each connection pipe P1, and is installed at a lower position than the stagnant container TV via the stagnant container TV installed at a lower position than the horizontal portion of the liquid supply pipe LP. Are connected in parallel with a plurality of vaporizers VA. The connection pipe P1 is provided with a third on-off valve V3 in the middle thereof. In addition, the stagnant container TV is connected to each vaporizer VA by a multi-branch pipe P2 which is branched in various ways from the stagnant container TV according to the number of vaporizers VA. In addition, the 4th on-off valve V4 corresponding to each vaporizer VA is installed in the branch pipe P2.
　前記第１気体供給管ＧＰ１は、窒素等の不活性ガスを供給する気体供給装置に接続されており、その途中に流体制御装置ＭＦＣ（マスフローコントローラ）が設置されている。また、第１気体供給管ＧＰ１には、流体制御装置ＭＦＣから貯留容器１０に至るまでの間に流体制御装置ＭＦＣ側から順番に第５開閉弁Ｖ５及び第６開閉弁Ｖ６が設置されている。なお、流体制御装置ＭＦＣは、第１気体供給管ＧＰ１を流れる気体の流量を測定し、その測定流量が予め定められた設定流量に近づくように制御するように構成されている。 The first gas supply pipe GP1 is connected to a gas supply device for supplying an inert gas such as nitrogen, and a fluid control device MFC (mass flow controller) is installed in the middle thereof. In the first gas supply pipe GP1, a fifth on-off valve V5 and a sixth on-off valve V6 are installed sequentially from the fluid control device MFC side between the fluid control device MFC and the storage container 10. The fluid control device MFC is configured to measure the flow rate of the gas flowing through the first gas supply pipe GP1 and to control the measured flow rate to approach a predetermined set flow rate.
　前記第２気体供給管ＧＰ２は、第１気体供給管ＧＰ１から分岐して液体供給管ＬＰに接続されており、その途中に第７開閉弁Ｖ７が設置されている。具体的には、第２気体供給管ＧＰ２は、第１気体供給管ＧＰ１の第５開閉弁Ｖ５と第６開閉弁Ｖ６との間から分岐し、貯留容器１０から延びる液体供給管ＬＰの天井に沿って水平方向に伸びる水平部分の終端に接続されている。また、第１気体供給管ＧＰ１と第２気体供給管ＧＰ２の間には、バイパス管ＢＰが別途架け渡されており、このバイパス管ＢＰに第８開閉弁Ｖ８が設置されている。なお、バイパス管ＢＰは、第１気体供給管ＧＰ１の流量制御装置ＭＦＣと第５開閉弁Ｖ５との間から分岐し、第２気体供給管ＧＰ２の第７開閉弁Ｖ７よりも液体供給管ＬＰ側へ接続されている。 The second gas supply pipe GP2 is branched from the first gas supply pipe GP1 and connected to the liquid supply pipe LP, and a seventh on-off valve V7 is installed in the middle thereof. Specifically, the second gas supply pipe GP2 branches from between the fifth on-off valve V5 and the sixth on-off valve V6 of the first gas supply pipe GP1, and extends to the ceiling of the liquid supply pipe LP extending from the storage container 10. It is connected to the end of the horizontal part which extends horizontally along. Further, a bypass pipe BP is separately bridged between the first gas supply pipe GP1 and the second gas supply pipe GP2, and an eighth on-off valve V8 is installed in the bypass pipe BP. The bypass pipe BP branches from between the flow control device MFC of the first gas supply pipe GP1 and the fifth on-off valve V5, and is closer to the liquid supply pipe LP than the seventh on-off valve V7 of the second gas supply pipe GP2. Connected to.
　そして、第１気体供給管ＧＰ１、第２気体供給管ＧＰ２及びバイパス管ＢＰを、前記のように接続したことにより、第５開閉弁Ｖ５、第７開閉弁Ｖ７及び第８開閉弁Ｖ８の内でいずれか二つを閉鎖して次の三つのラインを選択的に形成できる。すなわち、第７開閉弁Ｖ７及び第８開閉弁Ｖ８を閉鎖することにより、気体供給装置から供給される気体を第１気体供給管ＧＰ１へ通過させるラインを形成できる。また、第５開閉弁Ｖ５及び第７開閉弁Ｖ７を閉鎖することにより、気体供給装置から供給される気体を第２気体供給管ＧＰ２へ通過させるラインを形成できる。また、第５開閉弁Ｖ５及び第８開閉弁Ｖ８を閉鎖することにより、気体供給装置から供給される気体を第１気体供給管ＧＰ１及び第２気体供給管ＧＰ２のいずれにも通過させないラインを形成できる。因みに、三つ目のラインを形成した場合には、液体供給管ＬＰ、第１気体供給管ＧＰ１の一部及び第２気体供給管ＧＰ２によって、貯留容器１０へ接続されるループ状のラインが形成される。 Then, by connecting the first gas supply pipe GP1, the second gas supply pipe GP2 and the bypass pipe BP as described above, in the fifth on-off valve V5, the seventh on-off valve V7 and the eighth on-off valve V8. Any two can be closed to selectively form the next three lines. That is, by closing the seventh on-off valve V7 and the eighth on-off valve V8, it is possible to form a line for passing the gas supplied from the gas supply device to the first gas supply pipe GP1. In addition, by closing the fifth on-off valve V5 and the seventh on-off valve V7, it is possible to form a line through which the gas supplied from the gas supply device passes through the second gas supply pipe GP2. Further, by closing the fifth on-off valve V5 and the eighth on-off valve V8, a line is formed to prevent the gas supplied from the gas supply device from passing through any of the first gas supply pipe GP1 and the second gas supply pipe GP2. it can. Incidentally, when the third line is formed, a looped line connected to the storage container 10 is formed by the liquid supply pipe LP, a part of the first gas supply pipe GP1 and the second gas supply pipe GP2. Be done.
　前記第３気体供給管ＧＰ３は、第１気体供給管ＧＰ１から分岐して液体供給管ＬＰに接続されており、その途中に第９開閉弁Ｖ９が設置されている。具体的には、第３気体供給管ＧＰ３は、第１気体供給管ＧＰ１の第５開閉弁Ｖ５と第６開閉弁Ｖ６との間から分岐し、貯留容器１０から延びる液体供給管ＬＰの第１開閉弁Ｖ１と第２開閉弁Ｖ２との間に接続されている。 The third gas supply pipe GP3 is branched from the first gas supply pipe GP1 and connected to the liquid supply pipe LP, and a ninth on-off valve V9 is installed in the middle thereof. Specifically, the third gas supply pipe GP3 branches from between the fifth on-off valve V5 and the sixth on-off valve V6 of the first gas supply pipe GP1, and the first of the liquid supply pipe LP extending from the storage container 10 It is connected between the on-off valve V1 and the second on-off valve V2.
　前記排気ポンプＰＰは、第１気体供給管ＧＰ１から分岐する排気管ＥＰに接続されている。なお、排気管ＥＰには、その途中に第１０開閉弁Ｖ１０が設置されている。 The exhaust pump PP is connected to an exhaust pipe EP which branches from the first gas supply pipe GP1. In addition, a tenth on-off valve V10 is installed in the middle of the exhaust pipe EP.
　また、液体材料供給装置１００は、各開閉弁Ｖ１～Ｖ１０及び流体制御装置ＭＦＣが接続される制御部Ｃを具備している。制御部Ｃは、例えば、ＣＰＵ、メモリ、入出力手段、Ａ／Ｄ・Ｄ・Ａコンバータ等を備えたコンピュータであって、前記メモリに格納されている制御プログラムに基づき、各開閉弁Ｖ１～Ｖ１０を制御して、供給機構Ｍ１、液戻し機構Ｍ２、及び、加圧供給機構Ｍ３としての機能を発揮する。 Further, the liquid material supply device 100 includes a control unit C to which the on-off valves V1 to V10 and the fluid control device MFC are connected. The control unit C is, for example, a computer provided with a CPU, a memory, an input / output unit, an A / D, D / A converter, etc., and each on-off valve V1 to V10 is Are controlled to exert functions as the supply mechanism M1, the liquid return mechanism M2, and the pressure supply mechanism M3.
　前記各機構は、各配管上に設置された複数の開閉弁と、各開閉弁の開閉を制御する個別の制御部と、を備えており、各開閉弁の開閉の組み合わせを変更することで各機構に対応する動作を実現する。本実施形態においては、液体供給管ＬＰ上に設置される第１開閉弁Ｖ１～第３開閉弁Ｖ３、多枝管Ｐ２上に設置される第４開閉弁Ｖ４、第１気体供給管ＧＰ１上に設置される第５開閉弁Ｖ５及び第６開閉弁Ｖ６、第２気体供給管ＧＰ２上に設置される第７開閉弁Ｖ７、バイパス管ＢＰ上に設置される第８開閉弁Ｖ８、第３気体供給管ＧＰ３に設置される第９開閉弁Ｖ９、及び、排気管ＥＰ上に配置される第１０開閉弁Ｖ１０と、が供給制御部Ｃ１、液戻し制御部Ｃ２、又は、加圧供給制御部Ｃ２により、予め定められたシーケンスに従って開閉される。 Each mechanism includes a plurality of on-off valves installed on each pipe, and a separate control unit that controls the on-off operation of each on-off valve. Implement the operation corresponding to the mechanism. In the present embodiment, the first to third on-off valves V1 to V3 installed on the liquid supply pipe LP, the fourth on-off valve V4 installed on the multibranch pipe P2, and the first gas supply pipe GP1. The fifth on-off valve V5 and the sixth on-off valve V6 installed, the seventh on-off valve V7 installed on the second gas supply pipe GP2, the eighth on-off valve V8 installed on the bypass pipe BP, the third gas supply The ninth on-off valve V9 installed in the pipe GP3 and the tenth on-off valve V10 disposed on the exhaust pipe EP are controlled by the supply control unit C1, the liquid return control unit C2, or the pressurized supply control unit C2. , Opening and closing according to a predetermined sequence.
　前記供給機構Ｍ１は、供給制御部Ｃ１によって、各開閉弁Ｖ１～Ｖ１０を開閉し、排気ポンプＰＰによって貯留容器１０内よりも液体供給管ＬＰ内が低圧になるように減圧（真空引き）すると共に、第１気体供給管ＧＰ１から流量制御装置ＭＦＣを介して貯留容器１０内へ気体を供給して貯留容器１０に貯留された液体材料の液面を加圧し、貯留容器１０から液体供給管ＬＰ内へ液体材料を供給するように制御するものである。 The supply mechanism M1 causes the supply control unit C1 to open and close the on-off valves V1 to V10, and the exhaust pump PP decompresses (evacuates) the liquid supply pipe LP to a lower pressure than the storage container 10 The gas is supplied from the first gas supply pipe GP1 into the storage container 10 via the flow rate control device MFC to pressurize the liquid surface of the liquid material stored in the storage container 10, and from the storage container 10 to the liquid supply pipe LP. Control to supply the liquid material to the
　前記液戻し機構Ｍ２は、液戻し制御部Ｃ２によって、各開閉弁Ｖ１～Ｖ１０を開閉し、供給機構Ｍ１によって貯留容器１０に貯留された液体材料が滞留容器ＴＶへ供給された後に、第２気体供給管ＧＰ２から流量制御装置ＭＦＣを介して液体供給管ＬＰ内へ気体を供給して液体供給管ＬＰ内に残留する液体材料を貯留容器１０へ戻すように制御するものである。 The liquid return mechanism M2 causes the liquid return control unit C2 to open and close the on-off valves V1 to V10, and after the liquid material stored in the storage container 10 is supplied to the retention container TV by the supply mechanism M1, the second gas The gas is supplied from the supply pipe GP2 into the liquid supply pipe LP via the flow control device MFC so that the liquid material remaining in the liquid supply pipe LP is returned to the storage container 10.
　前記加圧供給機構Ｍ３は、加圧供給制御部Ｃ３によって、各開閉弁Ｖ１～Ｖ１０を制御し、液戻し機構によって液体供給管ＬＰ内に残留する液体材料を貯留容器１０へ戻した後に、第３気体供給管ＧＰ３から流量制御装置ＭＦＣを介して液体供給管ＬＰ内へ気体を供給して滞留容器ＴＶに滞留する液体材料の液面を加圧するように制御するものである。 The pressurized supply mechanism M3 controls the on-off valves V1 to V10 by the pressurized supply control unit C3 and returns the liquid material remaining in the liquid supply pipe LP to the storage container 10 by the liquid return mechanism. 3) The gas is supplied from the gas supply pipe GP3 into the liquid supply pipe LP via the flow rate control device MFC so as to pressurize the liquid surface of the liquid material retained in the retention container TV.
　次に、本実施形態に係る液体材料供給装置１００の動作を図２及び図３に基づき説明する。 Next, the operation of the liquid material supply device 100 according to the present embodiment will be described based on FIG. 2 and FIG.
　気化器ＶＡ内の液体材料が所定量以下に減少すると、液体材料供給装置１００の制御部Ｃに対して、液体材料供給開始信号が送信され、これにより、液体材料供給装置１００は、供給機構Ｍ１、液戻し機構Ｍ２、及び、加圧供給機構Ｍ３による各動作を順次実施する。以下、具体的に説明する。 When the liquid material in the vaporizer VA decreases to a predetermined amount or less, a liquid material supply start signal is sent to the control unit C of the liquid material supply device 100, whereby the liquid material supply device 100 receives the supply mechanism M1. The operations by the liquid return mechanism M2 and the pressure supply mechanism M3 are sequentially performed. The details will be described below.
　制御部Ｃが、液体材料供給開始信号を受信すると、先ず、図２（ａ）に示すように、供給制御部Ｃ１は、第１開閉弁Ｖ１、第４開閉弁Ｖ４、第５開閉弁Ｖ５、第６開閉弁Ｖ６、第８開閉弁Ｖ８及び第９開閉弁Ｖ９を閉鎖し、第２開閉弁Ｖ２、第３開閉弁Ｖ３、第７開閉弁Ｖ７を開放するように制御する。これにより、液体供給管ＬＰの第１開閉弁Ｖ１よりも供給先ＶＡ側が、第２気体供給管ＧＰ２、第１気体供給管ＧＰ１の一部、及び、排気管ＥＰを介して排気ポンプＰＰに接続される。そして、排気ポンプＰＰによって液体供給管ＬＰの第１開閉弁Ｖ１よりも供給先ＶＡ側が、貯留容器１０内よりも低圧になるように減圧される。 When the control unit C receives the liquid material supply start signal, first, as shown in FIG. 2A, the supply control unit C1 includes the first on-off valve V1, the fourth on-off valve V4, the fifth on-off valve V5, The sixth on-off valve V6, the eighth on-off valve V8 and the ninth on-off valve V9 are closed, and the second on-off valve V2, the third on-off valve V3, and the seventh on-off valve V7 are controlled to be opened. As a result, the supply destination VA side of the liquid supply pipe LP relative to the first on-off valve V1 is connected to the exhaust pump PP via the second gas supply pipe GP2, a part of the first gas supply pipe GP1, and the exhaust pipe EP. Be done. Then, the pressure on the supply destination VA side of the first on-off valve V1 of the liquid supply pipe LP is reduced by the exhaust pump PP so that the pressure is lower than in the storage container 10.
　さらに、供給制御部Ｃ１は、液体供給管ＬＰ内の減圧が完了すると、次に、図２（ｂ）に示すように、第４開閉弁Ｖ４、第７開閉弁Ｖ７、第８開閉弁Ｖ８、第９開閉弁Ｖ９及び第１０開閉弁Ｖ１０を閉鎖し、第１開閉弁Ｖ１、第２開閉弁Ｖ２、第３開閉弁Ｖ３、第５開閉弁Ｖ５及び第６開閉弁Ｖ６を開放するように制御する。これにより、液体供給管ＬＰの第１開閉弁Ｖ１よりも供給先ＶＡ側が、貯留容器１０と連通し、また、その貯留容器１０が、第１気体供給管ＧＰ１を介して気体供給装置に接続される。この時、液体供給管ＬＰ内が貯留容器１０内よりも低圧になっていることから、貯留容器１０に貯留された液体材料が、液体供給管ＬＰ内へ吸い上げられる。そして、第１気体供給管ＧＰ１から貯留容器１０内に気体が供給され、貯留容器１０に貯留された液体材料の液面が加圧される。これにより、貯留容器１０に貯留された液体材料が、液体供給管ＬＰを介して滞留容器ＴＶ内へ圧送される。 Further, when the pressure reduction in the liquid supply pipe LP is completed, the supply control unit C1 next, as shown in FIG. 2B, the fourth on-off valve V4, the seventh on-off valve V7, the eighth on-off valve V8, Control is performed to close the ninth on-off valve V9 and the tenth on-off valve V10, and open the first on-off valve V1, the second on-off valve V2, the third on-off valve V3, the fifth on-off valve V5, and the sixth on-off valve V6. Do. As a result, the supply destination VA side of the liquid supply pipe LP with respect to the first on-off valve V1 communicates with the storage container 10, and the storage container 10 is connected to the gas supply device via the first gas supply pipe GP1. Ru. At this time, since the inside of the liquid supply pipe LP is lower in pressure than the inside of the storage container 10, the liquid material stored in the storage container 10 is sucked into the liquid supply pipe LP. Then, gas is supplied from the first gas supply pipe GP1 into the storage container 10, and the liquid surface of the liquid material stored in the storage container 10 is pressurized. Thereby, the liquid material stored in the storage container 10 is pressure-fed into the stagnant container TV via the liquid supply pipe LP.
　この場合、予め液体供給管ＬＰ内を貯留容器１０よりも低圧に減圧しているため、貯留容器１０に貯留された液体材料の液面の加圧をある程度小さくしても、貯留容器１０に貯留された液体材料を滞留容器ＴＶへ供給するために必要な差圧を得ることができる。なお、供給制御部Ｃ１による液体供給管ＬＰ内の減圧値、及び、貯留容器１０内の加圧値は、貯留容器１０に貯留された液体材料が、液体供給管ＬＰの各接続管Ｐ１まで移送される程度の差圧が得られるように設定されている。これにより、供給機構Ｍ１によって液体供給管ＬＰ内へ供給された液体材料が、第２気体供給管ＧＰ２に達しないようになっている。なお、仮に、供給機構Ｍ１によって液体供給管ＬＰ内へ供給された液体材料が、第２気体供給管ＧＰ２に達するようなことがあっても、貯留容器１０に対して液体供給管ＬＰ、第１気体供給管ＧＰ１の一部、及び、第２気体供給管ＧＰ２がループ状に接続される配管を形成しているため、第６開閉弁Ｖ６及び第７開閉弁Ｖ７を開放することにより、第２気体供給管ＧＰに達した液体材料を再び貯留容器１０へ戻すことができる。 In this case, since the inside of the liquid supply pipe LP is depressurized to a lower pressure than the storage container 10 in advance, storage in the storage container 10 is possible even if the pressurization of the liquid surface of the liquid material stored in the storage container 10 is reduced to some extent. It is possible to obtain the differential pressure necessary to supply the stored liquid material to the holding vessel TV. The reduced pressure value in the liquid supply pipe LP by the supply control unit C1 and the pressurized value in the storage container 10 transfer the liquid material stored in the storage container 10 to each connection pipe P1 of the liquid supply pipe LP. It is set so as to obtain a differential pressure of a certain degree. Thus, the liquid material supplied into the liquid supply pipe LP by the supply mechanism M1 does not reach the second gas supply pipe GP2. Incidentally, even if the liquid material supplied into the liquid supply pipe LP by the supply mechanism M1 may reach the second gas supply pipe GP2, the liquid supply pipe LP with respect to the storage container 10, the first Since a part of the gas supply pipe GP1 and the second gas supply pipe GP2 form a pipe connected in a loop shape, the second on-off valve V6 and the seventh on-off valve V7 are opened to make the second The liquid material reaching the gas supply pipe GP can be returned to the storage container 10 again.
　供給制御部Ｃ１によって滞留容器ＴＶに対して所定量の液体材料が供給されると、次に、図３（ａ）に示すように、液戻し制御部Ｃ２は、第３開閉弁Ｖ３、第４開閉弁Ｖ４、第５開閉弁Ｖ５、第７開閉弁Ｖ７及び第９開閉弁Ｖ９を閉鎖し、第１開閉弁Ｖ１、第２開閉弁Ｖ２、第６開閉弁Ｖ６、第８開閉弁Ｖ８及び第１０開閉弁Ｖ１０を開放するように制御する。これにより、液体供給管ＬＰが、バイパス管ＢＰ及び第２気体供給管ＧＰ２を介して気体供給装置に接続され、また、貯留容器１０が、第１気体供給ＧＰ１の一部及び排気管ＥＰを介して排気ポンプＰＰに接続される。そして、第２気体供給管ＧＰ２から液体供給管ＬＰ内へ気体が供給され、液体供給管ＬＰ内に残留した液体材料が貯留容器１０内へ戻される。因みに、排気ポンプＰＰによって排気しても、液体供給管ＬＰ内に残留した液体材料を貯留容器１０内へ戻すことができる。 When a predetermined amount of liquid material is supplied to the staying container TV by the supply control unit C1, next, as shown in FIG. 3A, the liquid return control unit C2 controls the third on-off valve V3, the fourth The on-off valve V4, the fifth on-off valve V5, the seventh on-off valve V7 and the ninth on-off valve V9 are closed, and the first on-off valve V1, the second on-off valve V2, the sixth on-off valve V6, the eighth on-off valve V8, the eighth 10 Control to open the on-off valve V10. Thereby, the liquid supply pipe LP is connected to the gas supply device via the bypass pipe BP and the second gas supply pipe GP2, and the storage container 10 is connected via a part of the first gas supply GP1 and the exhaust pipe EP. Is connected to the exhaust pump PP. Then, the gas is supplied from the second gas supply pipe GP2 into the liquid supply pipe LP, and the liquid material remaining in the liquid supply pipe LP is returned into the storage container 10. Incidentally, the liquid material remaining in the liquid supply pipe LP can be returned to the storage container 10 even if the air is exhausted by the exhaust pump PP.
　なお、この場合、流量制御装置ＭＦＣにおける測定流量を利用して貯留容器１０内の液体材料の残量を検知することができる。すなわち、貯留容器１０内に貯留された液体材料の液面が液体供給管ＬＰの下端（先端）に達している状態、言い換えれば、残量が多い状態では、流量制御装置ＭＦＣを介して供給される気体によって液体材料の液面が加圧されるため、流量制御装置ＭＦＣで測定される測定流量が設定流量に対して大幅に小さくなる。一方、貯留容器１０内に貯留された液体材料の液面が液体供給管ＬＰの下端に達していない状態、言い換えれば、残量が少ない状態では、流量制御装置ＭＦＣを介して供給される気体が直接液体供給管ＬＰへ抜けるため、流量制御装置ＭＦＣで測定される測定流量が設定流量に近づく。この測定流量の変化を検知することにより、貯留容器１０内に貯留された液体材料の液面が液体供給管ＬＰの下端に達しているか否かを検知できる。具体的には、制御部Ｃに、測定流量と設定流量と差が予め定められた設定値以下になった場合に、貯留容器１０内に貯留された液体材料の液面が液体供給管ＬＰの下端に達していない状態にあることを検知する液面検知部Ｄを設ける。 In this case, the remaining amount of the liquid material in the storage container 10 can be detected using the measured flow rate in the flow control device MFC. That is, in the state where the liquid surface of the liquid material stored in the storage container 10 reaches the lower end (tip) of the liquid supply pipe LP, in other words, in the state where the remaining amount is large, it is supplied via the flow control device MFC Since the liquid level of the liquid material is pressurized by the liquid gas, the measured flow rate measured by the flow control device MFC becomes much smaller than the set flow rate. On the other hand, when the liquid level of the liquid material stored in the storage container 10 does not reach the lower end of the liquid supply pipe LP, in other words, when the remaining amount is small, the gas supplied via the flow control device MFC is The measured flow rate measured by the flow control device MFC approaches the set flow rate because the flow directly to the liquid supply pipe LP. By detecting the change in the measured flow rate, it can be detected whether the liquid level of the liquid material stored in the storage container 10 has reached the lower end of the liquid supply pipe LP. Specifically, when the difference between the measured flow rate and the set flow rate becomes equal to or less than a predetermined set value in the control unit C, the liquid level of the liquid material stored in the storage container 10 corresponds to that of the liquid supply pipe LP. A liquid level detection unit D is provided to detect that the lower end has not been reached.
　液戻し制御部Ｃ２が、液体供給管ＬＰ内に残留した液体材料を貯留容器１０内へ戻すと、次に、図３（ｂ）に示すように、加圧供給制御部Ｃ３は、第１開閉弁Ｖ１、第４開閉弁Ｖ４の一部、第６開閉弁Ｖ６、第７開閉弁Ｖ７、第８開閉弁Ｖ８及び第１０開閉弁Ｖ１０を閉鎖し、第２開閉弁、第３開閉弁、第４開閉弁の一部、第５開閉弁Ｖ５及び第９開閉弁Ｖ９を開放するように制御する。これにより、液体供給管ＬＰが、第１気体供給管ＧＰ１の一部及び第３気体供給管ＧＰ３を介して気体供給装置に接続される。そして、第３気体供給管ＧＰ３から滞留容器ＴＶ内に気体が供給され、滞留容器ＴＶ内に貯留された液体材料の液面が加圧される。これにより、一部の開放された第４開閉弁Ｖ４に対応する気化器ＶＡへ液体材料が供給される。なお、加圧供給制御部Ｃ３は、各第４開閉弁Ｖ４の開閉タイミングを制御し、各気化器ＶＡに対して適量の液体材料が供給されるように制御する。なお、滞留容器ＴＶの容量を一つの気化器ＶＡへ供給する供給量に合わせておくことにより、滞留容器ＴＶが気化器ＶＡの供給量を調節する機能を果たし、これにより、気化器ＶＡへの供給量を監視するためのセンサ等を設ける必要がなくなる。 When the liquid return control unit C2 returns the liquid material remaining in the liquid supply pipe LP into the storage container 10, next, as shown in FIG. The valve V1, part of the fourth on-off valve V4, the sixth on-off valve V6, the seventh on-off valve V7, the eighth on-off valve V8 and the tenth on-off valve V10 are closed, and the second on-off valve, the third on-off valve, the It controls so that a part of 4 on-off valve, the 5th on-off valve V5, and the 9th on-off valve V9 may be opened. Thereby, the liquid supply pipe LP is connected to the gas supply device via a part of the first gas supply pipe GP1 and the third gas supply pipe GP3. Then, the gas is supplied from the third gas supply pipe GP3 into the retention container TV, and the liquid surface of the liquid material stored in the retention container TV is pressurized. As a result, the liquid material is supplied to the vaporizer VA corresponding to the part of the opened fourth on-off valve V4. The pressurized supply control unit C3 controls the open / close timing of each fourth on-off valve V4 so as to supply an appropriate amount of liquid material to each vaporizer VA. In addition, by matching the capacity of the stagnant container TV to the supply amount supplied to one vaporizer VA, the stagnant container TV functions to adjust the supply amount of the vaporizer VA, and thereby, to the vaporizer VA. There is no need to provide a sensor or the like for monitoring the supply amount.
　そして、制御部Ｃは、気化器ＶＡ内の液体材料の残量が所定量以下になったタイミング（例えば、液面検知部Ｄの検知タイミング）で送信される液体材料供給開始信号を受信する毎に、前記各制御による動作を繰り返す。 Then, every time the control unit C receives the liquid material supply start signal transmitted at the timing when the remaining amount of liquid material in the vaporizer VA becomes equal to or less than the predetermined amount (for example, the detection timing of the liquid level detection unit D). The operation by each control is repeated.
　なお、本実施形態においては、気体供給装置から流量制御装置ＭＦＣを介して気体を供給しているため、各配管内に移送された液体材料に対して急な圧力変化が生じることを防止でき、これにより、気体供給装置から供給される気体が各配管内の液体材料を押圧して抜けてしまう事態を防止することができる。 In the present embodiment, since the gas is supplied from the gas supply device through the flow control device MFC, it is possible to prevent a sudden pressure change from occurring in the liquid material transferred into each pipe, Thus, it is possible to prevent the situation in which the gas supplied from the gas supply device presses the liquid material in each of the pipes and is released.
　＜その他の実施形態＞　その他の実施形態としては、前記実施形態においては、第１気体供給管ＧＰ１から第２気体供給管ＧＰ２及び第３気体供給管ＧＰ３を分岐させ、同じ気体供給装置から気体が供給される構成を採用しているが、第２気体供給管ＧＰ２及び第３気体供給管ＧＰ３を液体供給管ＬＰから分岐させ、別の気体供給装置から気体が供給されるような構成を採用してもよい。 <Other Embodiments> In other embodiments, in the above embodiment, the second gas supply pipe GP2 and the third gas supply pipe GP3 are branched from the first gas supply pipe GP1, and the gas is supplied from the same gas supply device. Although the configuration to be supplied is adopted, the second gas supply pipe GP2 and the third gas supply pipe GP3 are branched from the liquid supply pipe LP, and a structure is adopted in which gas is supplied from another gas supply device. May be
　また、前記実施形態において、貯留容器１０に対してその重量を測定する重量計を設置し、貯留容器１０の重量が予め定められた設定重量以下になった場合に、貯留容器１０内の液体材料が残量不足にあることを検知する残量検知部を設けてもよい。これにより、貯留容器１０内の液体材料の残量を、流体制御装置ＭＦＣを用いた方式と、重量計を用いた方式と、によってチェックすることができるようになる。 Further, in the embodiment, a weight scale for measuring the weight of the storage container 10 is installed, and the liquid material in the storage container 10 is used when the weight of the storage container 10 becomes equal to or less than a predetermined set weight. A remaining amount detection unit may be provided to detect that the remaining amount is insufficient. As a result, the remaining amount of the liquid material in the storage container 10 can be checked by the method using the fluid control device MFC and the method using a weight scale.
　また、前記実施形態においては、液体供給管ＬＰの接続管Ｐ１まで移送された液体材料を滞留容器ＴＶを介して各気化器ＶＡへ供給する態様を採用しているが、液体供給管ＬＰの接続管Ｐ１まで移送された液体材料を直接各気化器ＶＡへ供給する態様を採用してもよい。 Moreover, in the said embodiment, although the aspect which supplies the liquid material transferred to the connection pipe P1 of liquid supply pipe LP to each vaporizer VA via residence container TV is employ | adopted, connection of liquid supply pipe LP is carried out A mode may be adopted in which the liquid material transferred to the pipe P1 is directly supplied to each vaporizer VA.
　また、前記実施形態においては、供給機構Ｍ１によって、液体供給管ＬＰ内を減圧した後に、貯留容器１０内に貯留された液体材料の液面を加圧するように構成されているが、液体供給管ＬＰ内を減圧しながら、貯留容器１０内に貯留された液体材料の液面を加圧するように構成してもよい。 Further, in the above embodiment, although the pressure in the liquid supply pipe LP is reduced by the supply mechanism M1, the liquid level of the liquid material stored in the storage container 10 is pressurized, but the liquid supply pipe The liquid surface of the liquid material stored in the storage container 10 may be pressurized while reducing the pressure in the LP.
　その他、本発明は前記各実施形態に限られず、その趣旨を逸脱しない範囲で種々の変形が可能であるのは言うまでもない。 Besides, it goes without saying that the present invention is not limited to the above embodiments, and various modifications can be made without departing from the scope of the invention.
　本発明に係る液体材料供給装置によれば、液体供給管や供給先を低圧に保ちながら、液体材料を所望の高さまで持ち上げることができる液体材料供給装置を提供することができる。

  According to the liquid material supply apparatus of the present invention, it is possible to provide a liquid material supply apparatus capable of lifting the liquid material to a desired height while maintaining the liquid supply pipe and the supply destination at a low pressure.

Claims (8)

  1. 液体材料を供給先へ供給する液体材料供給装置であって、
    前記液体材料が貯留される貯留容器と、
    前記貯留容器に貯留された液体材料の液面よりも高い位置において前記供給先と接続され、前記貯留容器から前記供給先へ液体材料を供給する液体供給管と、
    前記貯留容器に貯留された液体材料を、前記貯留容器内よりも前記液体供給管内が低圧になるように減圧し、前記貯留容器内へ気体を供給することによって前記液体供給管内へ供給するように構成されている供給機構と、を具備していることを特徴とする液体材料供給装置。     A liquid material supply apparatus for supplying liquid material to a supply destination, comprising:
    A storage container in which the liquid material is stored;
    A liquid supply pipe connected to the supply destination at a position higher than the liquid level of the liquid material stored in the storage container, and supplying the liquid material from the storage container to the supply destination;
    The liquid material stored in the storage container is depressurized so that the pressure in the liquid supply pipe is lower than in the storage container, and the gas is supplied into the storage container to supply the liquid material into the liquid supply pipe. What is claimed is: 1. A liquid material supply apparatus comprising: a configured supply mechanism.
  2. 前記液体供給管から前記供給先へ供給される液体材料を一時的に滞留させる滞留容器をさらに具備し、
    前記液体供給管が、前記滞留容器を介して前記供給先と接続されている請求項１記載の液体材料供給装置。     It further comprises a retention container for temporarily retaining the liquid material supplied from the liquid supply pipe to the supply destination,
    The liquid material supply device according to claim 1, wherein the liquid supply pipe is connected to the supply destination via the retention container.
  3. 前記貯留容器内へ気体を供給する第１気体供給管をさらに具備し、
    前記供給機構が、
    前記液体供給管に設置される開閉弁と、
    前記開閉弁を閉止して前記液体供給管の前記開閉弁よりも前記供給先側が低圧になるように減圧してから前記開閉弁を開放した後に、前記第１気体供給管から前記貯留容器内へ供給した気体によって前記液体材料の液面を加圧するように制御する供給制御部と、を備えている請求項１記載の液体材料供給装置。     The apparatus further comprises a first gas supply pipe for supplying a gas into the storage container,
    The feeding mechanism
    An on-off valve installed in the liquid supply pipe;
    After closing the on-off valve and decompressing the liquid supply pipe so that the supply destination side is lower in pressure than the on-off valve, and then opening the on-off valve, the first gas supply pipe enters the storage container The liquid material supply device according to claim 1, further comprising: a supply control unit configured to perform control to pressurize the liquid surface of the liquid material by the supplied gas.
  4. 前記第１気体供給管から前記貯留容器に供給される気体の流量を測定し、その測定流量が予め定められた設定流量に近づくように制御する流体制御装置と、
    前記測定流量と前記設定流量との差が予め定められた設定値以下になった場合に、前記貯留容器内に貯留された液体材料の液面が前記液体供給管の先端よりも低くなった状態にあることを検知する液面検知部と、をさらに具備している請求項３記載の液体材料供給装置。     A fluid control device that measures the flow rate of gas supplied from the first gas supply pipe to the storage container and controls the measured flow rate to approach a predetermined set flow rate;
    A state in which the liquid level of the liquid material stored in the storage container is lower than the tip of the liquid supply pipe when the difference between the measured flow rate and the set flow rate is less than or equal to a predetermined set value. 4. The liquid material supply device according to claim 3, further comprising: a liquid level detection unit that detects that there is a liquid.
  5. 前記液体供給管における前記供給機構による液体材料の移送方向側から気体を供給する第２気体供給管と、
    前記供給機構によって前記貯留容器に貯留された液体材料が前記供給先又は前記滞留容器内へ供給された後に、前記第２気体供給管から前記液体供給管内へ気体の供給を開始して前記液体供給管内の液体材料を前記貯留容器へ供給するように構成されている液戻し機構と、を備えている請求項１記載の液体材料供給装置。     A second gas supply pipe for supplying a gas from the transfer direction side of the liquid material by the supply mechanism in the liquid supply pipe;
    After the liquid material stored in the storage container is supplied into the supply destination or the staying container by the supply mechanism, the supply of gas from the second gas supply pipe to the liquid supply pipe is started to supply the liquid The liquid material supply device according to claim 1, further comprising: a liquid return mechanism configured to supply liquid material in a tube to the storage container.
  6. 前記滞留容器内の液体材料の液面を加圧して当該液体材料を前記供給先へ供給するように構成されている加圧供給機構をさらに具備している請求項２記載の液体材料供給装置。 The liquid material supply apparatus according to claim 2, further comprising a pressure supply mechanism configured to pressurize the liquid surface of the liquid material in the retention container and supply the liquid material to the supply destination.
  7. 前記請求項１記載の液体材料供給装置と、
    前記液体材料供給装置によって液体材料を供給する供給先であって、その液体材料を気化して材料ガスを生成する少なくとも一つの気化器と、を具備していることを特徴とする材料ガス供給システム。     The liquid material supply device according to claim 1;
    A material gas supply system comprising: a supply destination for supplying a liquid material by the liquid material supply device, wherein the at least one vaporizer vaporizes the liquid material to generate a material gas. .
  8. 貯留容器に貯留された液体材料を液体供給管を介して供給先へ供給する液体材料供給方法であって、
    前記貯留容器内よりも前記液体供給管内が低圧になるように減圧することと、
    前記貯留容器に貯留された液体材料の液面を加圧することと、を備えることを特徴とする液体材料供給方法。

          A liquid material supply method for supplying a liquid material stored in a storage container to a supply destination through a liquid supply pipe,
    Reducing the pressure in the liquid supply pipe to a lower pressure than in the storage container;
    Pressurizing the liquid surface of the liquid material stored in the storage container.

PCT/JP2018/034118 2017-09-15 2018-09-14 Liquid material supply device, material gas supply system, and liquid material supply method WO2019054470A1 (en)

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Citations (7)

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Publication number Priority date Publication date Assignee Title
JPH02145769A (en) * 1988-11-29 1990-06-05 Nippon Telegr & Teleph Corp <Ntt> Method and device for forming thin film
JPH0966228A (en) * 1995-08-31 1997-03-11 Sony Corp Liquid raw material supply apparatus
JPH09104481A (en) * 1995-10-11 1997-04-22 Lion Corp Method of discharging contents under pressure
JP2003090496A (en) * 2001-09-20 2003-03-28 Nihonkai Gas Co Ltd Lng pressurizing device
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