WO2019047370A1 - 液晶显示面板及其制作方法 - Google Patents

液晶显示面板及其制作方法 Download PDF

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Publication number
WO2019047370A1
WO2019047370A1 PCT/CN2017/111081 CN2017111081W WO2019047370A1 WO 2019047370 A1 WO2019047370 A1 WO 2019047370A1 CN 2017111081 W CN2017111081 W CN 2017111081W WO 2019047370 A1 WO2019047370 A1 WO 2019047370A1
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WIPO (PCT)
Prior art keywords
photoresist layer
photoresist
substrate
inclination angle
layer
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Ceased
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PCT/CN2017/111081
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English (en)
French (fr)
Inventor
曹武
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Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd
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Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd
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Priority to US15/578,714 priority Critical patent/US10444572B2/en
Publication of WO2019047370A1 publication Critical patent/WO2019047370A1/zh
Anticipated expiration legal-status Critical
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136209—Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element

Definitions

  • the present invention relates to the field of display technologies, and in particular, to a liquid crystal display panel and a method of fabricating the same.
  • Liquid crystal display has many advantages such as thin body, power saving, no radiation, etc., and is widely used in applications such as mobile phones, personal digital assistants (PDAs), digital cameras, computer screens and notebook computers. Screen, etc.
  • liquid crystal display devices including a backlight module, a liquid crystal panel coupled to the backlight module, and a front frame for fixing the liquid crystal panel and the backlight module.
  • the working principle of the liquid crystal panel is to place liquid crystal molecules in two parallel glass substrates. There are many vertical and horizontal small wires between the two glass substrates. The liquid crystal molecules are redirected by energization or not, and the light of the backlight module is refracted. Come out to produce the picture.
  • the spacer (PS) is a common supporting structure in liquid crystal display panels, and is generally formed of a photosensitive resin. According to the similarities and differences of the black matrix (BM) material, there are different technical and structural design applications. In the case of flat panel displays, in addition to the need to provide stable and uniform support characteristics, it is also necessary to have a high uniformity of the spacers and a large adjustable tilt angle process interval, which is convenient for meeting different pixel design requirements, saving arrangement space and reducing The small liquid crystal disordered orientation region reduces the barrier effect of the spacer on the liquid crystal material.
  • BM black matrix
  • the manufacturing process of the conventional spacer is limited by the material characteristics and structural design, the inclination angle of the spacer is difficult to control, and the inclination angle of the obtained spacer is often small, resulting in the lower bottom area of the spacer being larger than Direct contact with the upper base area of the substrate, the large deviation between the upper and lower bottoms of the spacer (PS Bias) increases the space cost for the pixel design.
  • a conventional method for increasing the tilt angle of a spacer is to form a small groove around the bottom of the spacer by using a halftone (multi-transmission) mask to increase the inclination angle of the spacer.
  • a halftone (multi-transmission) mask to increase the inclination angle of the spacer.
  • the production cost is high due to the need to use a halftone mask that is relatively expensive to manufacture.
  • Another existing method for adjusting the tilt angle of the spacer is to use a photoresist material containing photoinitiators of two different absorption wavelengths to form a single layer film, and adjust the gap by adjusting the composition ratio of the photoresist material and the number of exposures.
  • the tilt angle of the sub-rough however, the design and process of the method are complicated, the number of exposures is large, and the tilt angle adjustment needs to adjust the proportion of the component of the photoresist material, and the controllability is low.
  • An object of the present invention is to provide a method for fabricating a liquid crystal display panel, which can effectively increase the tilt angle ⁇ of the spacer, thereby saving the arrangement space of the spacer, reducing the blocking effect of the spacer on the liquid crystal material, and improving the support performance of the spacer. .
  • Another object of the present invention is to provide a liquid crystal display panel having a large inclination angle ⁇ , thereby saving the arrangement space of the spacers, reducing the barrier effect of the spacers on the liquid crystal material, and having strong support performance.
  • the present invention provides a method for fabricating a liquid crystal display panel, including:
  • the photosensitive film has different photosensitive characteristics, that is, the first photoresist film and the second photoresist film have different photoreaction absorption wavelengths, or the first photoresist film and the second photoresist film react to light of the same wavelength. Different sensitivity;
  • the gap includes the first substrate a first photoresist layer and a second photoresist layer disposed on the first photoresist layer, wherein an inclination angle ⁇ of the spacer is defined as a lower bottom edge of the first photoresist layer and the second light
  • An angle between a line connecting the upper bottom edges of the resist layer and the first substrate, and the structure of the spacer is one of the following three structures:
  • the first structure is: the upper bottom width w1 of the first photoresist layer is smaller than the lower bottom width w2 of the second photoresist layer, and the inclination angle ⁇ 1 of the first photoresist layer is equal to the second light
  • the inclination angle ⁇ 2 of the resist layer, at this time, the inclination angle ⁇ of the spacer is greater than the inclination angle ⁇ 1 of the first photoresist layer and the inclination angle ⁇ 2 of the second photoresist layer;
  • the second structure is: the upper bottom width w1 of the first photoresist layer is smaller than the lower bottom width w2 of the second photoresist layer, and the first photoresist layer has an inclination angle ⁇ 1 smaller than the second light.
  • the inclination angle ⁇ 2 of the resist layer, at this time, the inclination angle ⁇ of the spacer is greater than the inclination angle ⁇ 1 of the first photoresist layer and the inclination angle ⁇ 2 of the second photoresist layer;
  • the third structure is: the upper bottom width w1 of the first photoresist layer is greater than the lower bottom width w2 of the second photoresist layer, and the first photoresist layer has a thickness T1 smaller than the second photoresist layer. a thickness T2, and the inclination angle ⁇ 1 of the first photoresist layer is smaller than the inclination angle ⁇ 2 of the second photoresist layer, and at this time, the inclination angle ⁇ of the spacer is larger than the inclination of the first photoresist layer An angle ⁇ 1 and smaller than an inclination angle ⁇ 2 of the second photoresist layer;
  • the pitch angle ⁇ of the spacer is between 20° and 80°.
  • the method for fabricating a liquid crystal display panel of the present invention further comprises: forming one or more third photoresist films on the second photoresist film, the one or more third photoresist films being exposed to light to form a a layer or a plurality of third photoresist layers, the spacers being composed of the first photoresist layer, the second photoresist layer, and the one or more third photoresist layers, the first photoresist layer
  • the photosensitive properties and patterns of the second photoresist layer and the one or more third photoresist layers are different.
  • the first photoresist film and the second photoresist film have different photoreaction absorption wavelengths, which means that the first photoresist film and the second photoresist film contain photoinitiators having different absorption wavelengths;
  • the second substrate is a color film substrate and a thin film transistor array substrate, or a thin film transistor array substrate and a color film substrate, respectively.
  • the structure of the plurality of spacers on the first substrate includes one or more of the first structure, the second structure, and the third structure.
  • the present invention also provides a liquid crystal display panel comprising: a first substrate and a second substrate disposed opposite to each other, a liquid crystal layer disposed between the first substrate and the second substrate, and a front surface disposed on the first substrate a plurality of spacers disposed on one side of the liquid crystal layer and spaced apart, and a top end of the plurality of spacers is in contact with the second substrate;
  • the spacer includes a first photoresist layer disposed on the first substrate and a second photoresist layer disposed on the first photoresist layer, the first photoresist layer and the second photoresist layer
  • the photosensitive characteristics are different, that is, the first photoresist layer and the second photoresist layer have different photoreaction absorption wavelengths, or the first photoresist layer and the second photoresist layer have different photoreaction sensitivity to the same wavelength of light.
  • the first photoresist layer and the second photoresist layer have different patterns, and the different patterns mean that there is a difference in at least one of an upper bottom size, a lower bottom size, and a tilt angle, and the gap is defined.
  • the inclination angle ⁇ is an angle between a line connecting the lower bottom edge of the first photoresist layer and the upper bottom edge of the second photoresist layer and the first substrate, and the structure of the spacer is One of the following three structures:
  • the first structure is: the upper bottom width w1 of the first photoresist layer is smaller than the lower bottom width w2 of the second photoresist layer, and the inclination angle ⁇ 1 of the first photoresist layer is equal to the second light
  • the inclination angle ⁇ 2 of the resist layer, at this time, the inclination angle ⁇ of the spacer is greater than the inclination angle ⁇ 1 of the first photoresist layer and the inclination angle ⁇ 2 of the second photoresist layer;
  • the second structure is: the upper bottom width w1 of the first photoresist layer is smaller than the lower bottom width w2 of the second photoresist layer, and the first photoresist layer has an inclination angle ⁇ 1 smaller than the second light.
  • the inclination angle ⁇ 2 of the resist layer, at this time, the inclination angle ⁇ of the spacer is respectively larger than the inclination angle ⁇ of the first photoresist layer 1 and the second photoresist layer tilt angle ⁇ 2;
  • the third structure is: the upper bottom width w1 of the first photoresist layer is greater than the lower bottom width w2 of the second photoresist layer, and the first photoresist layer has a thickness T1 smaller than the second photoresist layer. a thickness T2, and the inclination angle ⁇ 1 of the first photoresist layer is smaller than the inclination angle ⁇ 2 of the second photoresist layer, and at this time, the inclination angle ⁇ of the spacer is larger than the inclination of the first photoresist layer The angle ⁇ 1 is smaller than the inclination angle ⁇ 2 of the second photoresist layer.
  • the pitch angle ⁇ of the spacer is between 20° and 80°.
  • the spacer further includes: one or more third photoresist layers disposed on the second photoresist layer, the first photoresist layer, the second photoresist layer, and the one or more layers
  • the photosensitive properties of the three photoresist layers are different from those of the patterns.
  • the photoreceptor absorption wavelength of the first photoresist layer and the second photoresist layer means that the first photoresist layer and the second photoresist layer contain photoinitiators having different absorption wavelengths; the first substrate and the first substrate
  • the second substrate is a color film substrate and a thin film transistor array substrate, or a thin film transistor array substrate and a color film substrate, respectively.
  • the structure of the plurality of spacers on the first substrate includes one or more of the first structure, the second structure, and the third structure.
  • the invention also provides a method for fabricating a liquid crystal display panel, comprising:
  • the photosensitive film has different photosensitive characteristics, that is, the first photoresist film and the second photoresist film have different photoreaction absorption wavelengths, or the first photoresist film and the second photoresist film react to light of the same wavelength. Different sensitivity;
  • the gap includes the first substrate a first photoresist layer and a second photoresist layer disposed on the first photoresist layer, wherein an inclination angle ⁇ of the spacer is defined as a lower bottom edge of the first photoresist layer and the second light
  • An angle between a line connecting the upper bottom edges of the resist layer and the first substrate, and the structure of the spacer is one of the following three structures:
  • the first structure is: the upper bottom width w1 of the first photoresist layer is smaller than the lower bottom width w2 of the second photoresist layer, and the inclination angle ⁇ 1 of the first photoresist layer is equal to the second light
  • the inclination angle ⁇ 2 of the resist layer, at this time, the inclination angle ⁇ of the spacer is greater than the inclination angle ⁇ 1 of the first photoresist layer and the inclination angle ⁇ 2 of the second photoresist layer;
  • the second structure is: the upper bottom width w1 of the first photoresist layer is smaller than the lower bottom width w2 of the second photoresist layer, and the first photoresist layer has an inclination angle ⁇ 1 smaller than the second light.
  • the inclination angle ⁇ 2 of the resist layer, at this time, the inclination angle ⁇ of the spacer is greater than the inclination angle ⁇ 1 of the first photoresist layer and the inclination angle ⁇ 2 of the second photoresist layer;
  • the third structure is: the upper bottom width w1 of the first photoresist layer is greater than the lower bottom width w2 of the second photoresist layer, and the first photoresist layer has a thickness T1 smaller than the second photoresist layer. a thickness T2, and the inclination angle ⁇ 1 of the first photoresist layer is smaller than the inclination angle ⁇ 2 of the second photoresist layer, and at this time, the inclination angle ⁇ of the spacer is larger than the inclination of the first photoresist layer An angle ⁇ 1 and smaller than an inclination angle ⁇ 2 of the second photoresist layer;
  • inclination angle ⁇ of the spacer is between 20° and 80°;
  • the method further includes forming one or more third photoresist films on the second photoresist film, and the one or more third photoresist films are exposed and developed to form one or more third photoresist layers.
  • the spacer is composed of the first photoresist layer, the second photoresist layer, and the one or more third photoresist layers, the first photoresist layer, the second photoresist layer, and the first layer The photosensitive characteristics and patterns of the layer or layers of the third photoresist layer are different;
  • first photoresist film and the second photoresist film have different photoreaction absorption wavelengths, wherein the first photoresist film and the second photoresist film contain photoinitiators having different absorption wavelengths;
  • the substrate and the second substrate are respectively a color film substrate and a thin film transistor array substrate, or are respectively a thin film transistor array substrate and a color film substrate;
  • the structure of the plurality of spacers on the first substrate includes one or more of the first structure, the second structure, and the third structure.
  • the invention has the beneficial effects that the method for fabricating the liquid crystal display panel of the present invention uses a common mask to pattern the stacked multilayer photoresist film by a single exposure and development process to obtain a multilayer photoresist layer which is laminated.
  • the stacked multilayer photoresist layer constitutes a spacer. Since the photosensitive characteristics of the multilayer photoresist film are different, a multilayer photoresist layer having different patterns is obtained after exposure and development, and the different patterns are in the upper bottom size, There is a difference in at least one of the bottom size and the tilt angle.
  • the present invention utilizes a multilayer photoresist layer having different patterns to adjust the tilt angle ⁇ of the spacer, thereby effectively increasing the tilt angle ⁇ of the spacer, thereby saving the gap.
  • the arrangement space of the sub-space reduces the blocking effect of the spacer on the liquid crystal material and improves the support performance of the spacer.
  • the invention adopts a common mask to make a gap by a single exposure and development process, the process is simple, the process is mature and controllable, and the cost is low.
  • the spacer in the liquid crystal display panel of the present invention includes a plurality of stacked layers
  • the layer photoresist layer has different patterns, so that the spacer has a large inclination angle ⁇ , which can effectively increase the inclination angle ⁇ of the spacer, thereby saving the arrangement space of the spacer and reducing the gap pair to the liquid crystal.
  • the blocking effect of the material and the support performance of the spacer is not limited.
  • FIG. 1 is a flow chart of a method of fabricating a liquid crystal display panel of the present invention
  • FIG. 2 and FIG. 3 are schematic diagrams showing the first step of the method for fabricating the liquid crystal display panel of the present invention.
  • step 2 is a schematic diagram of step 2 of a method for fabricating a liquid crystal display panel of the present invention
  • FIG. 5 is a first schematic structural view of a spacer prepared in step 2 of the method for fabricating a liquid crystal display panel of the present invention
  • FIG. 6 is a second schematic structural view of a spacer prepared in step 2 of the method for fabricating a liquid crystal display panel of the present invention
  • FIG. 7 is a schematic view showing a third structure of a spacer prepared in step 2 of the method for fabricating a liquid crystal display panel of the present invention.
  • FIG 8 is a schematic view showing a step 3 of a method of fabricating a liquid crystal display panel of the present invention and a schematic structural view of the liquid crystal display panel of the present invention.
  • the present invention provides a method for fabricating a liquid crystal display panel, including the following steps:
  • Step 1 as shown in FIG. 2 and FIG. 3, a first substrate 10 and a second substrate 20 are provided, and a first photoresist film 31 is formed on the first substrate 10, and is formed on the first photoresist film 31.
  • the second photoresist film 32 has different photosensitive characteristics of the first photoresist film 31 and the second photoresist film 32, that is, the first photoresist film 31 and the second photoresist film 32 have different photoreaction absorption wavelengths. Or, the first photoresist film 31 and the second photoresist film 32 have different light reaction sensitivities to light of the same wavelength.
  • the materials of the first photoresist film 31 and the second photoresist film 32 are all photosensitive trees. fat.
  • the first photoresist film 31 and the second photoresist film 32 have different photoreaction absorption wavelengths, which means that the first photoresist film 31 and the second photoresist film 32 contain photoinitiators having different absorption wavelengths. .
  • Step 2 As shown in FIG. 4 to FIG. 7, the first photoresist film 31 and the second photoresist film 32 are subjected to a single exposure and development process using a mask 60 to form a first photoresist layer having different patterns. 41 and the second photoresist layer 42 such that a plurality of spacers 40 are formed on the first substrate 10 at intervals, and the different patterns refer to at least one of an upper bottom size, a lower bottom size, and a tilt angle. There is a difference in the parameters.
  • the spacer 40 includes a first photoresist layer 41 disposed on the first substrate 10 and a second photoresist layer 42 disposed on the first photoresist layer 41.
  • the inclination angle ⁇ of the spacer 40 is an angle between the line between the lower bottom edge of the first photoresist layer 41 and the upper bottom edge of the second photoresist layer 42 and the first substrate 10,
  • the structure of the spacer 40 is one of the following three structures:
  • the first structure is: the upper bottom width w1 of the first photoresist layer 41 is smaller than the lower bottom width w2 of the second photoresist layer 42, and the first photoresist layer 41 is The inclination angle ⁇ 1 is equal to the inclination angle ⁇ 2 of the second photoresist layer 42.
  • the inclination angle ⁇ of the spacer 40 is greater than the inclination angle ⁇ 1 of the first photoresist layer 41 and the second photoresist, respectively.
  • the inclination angle ⁇ 2 of the layer 42 thereby increasing the inclination angle ⁇ of the spacer 40;
  • the second structure is: the upper bottom width w1 of the first photoresist layer 41 is smaller than the lower bottom width w2 of the second photoresist layer 42 , and the first photoresist layer 41 is The inclination angle ⁇ 1 is smaller than the inclination angle ⁇ 2 of the second photoresist layer 42.
  • the inclination angle ⁇ of the spacer 40 is greater than the inclination angle ⁇ 1 of the first photoresist layer 41 and the second photoresist, respectively.
  • the inclination angle ⁇ 2 of the layer 42 thereby increasing the inclination angle ⁇ of the spacer 40;
  • the third structure is such that the upper bottom width w1 of the first photoresist layer 41 is greater than the lower bottom width w2 of the second photoresist layer 42 and the thickness of the first photoresist layer 41.
  • T1 is smaller than the thickness T2 of the second photoresist layer 42, and the inclination angle ⁇ 1 of the first photoresist layer 41 is smaller than the inclination angle ⁇ 2 of the second photoresist layer 42.
  • the spacer 40 The inclination angle ⁇ is larger than the inclination angle ⁇ 1 of the first photoresist layer 41 and smaller than the inclination angle ⁇ 2 of the second photoresist layer 42, and the thickness T1 of the first photoresist layer 41 is much smaller than the second light.
  • the tilt angle ⁇ of the spacer 40 is infinitely close to the tilt angle ⁇ 2 of the second photoresist layer 42; if the first photoresist layer 41 is removed, the second photoresist layer is removed
  • the height of 42 is set to T1+T2, so that the spacer 40 is composed only of the second photoresist layer 42, and the inclination angle of the second photoresist layer 42 is caused by the deformation of the leveling collapse in the process such as high-temperature baking or development.
  • ⁇ 2 does not guarantee a large tilt angle, so the tilt angle ⁇ of the spacer 40 cannot be effectively increased.
  • the third structure can be set by a double layer structure. The inclination angle ⁇ of the spacer 40 is effectively increased.
  • Step 3 as shown in FIG. 8, a liquid crystal material is dropped on the first substrate 10 or the second substrate 20, and the first substrate 10 and the second substrate 20 are aligned in alignment, and the first substrate 10 is assembled.
  • the liquid crystal material is formed with the liquid crystal material between the second substrate 20, and the top ends of the plurality of spacers 40 are in contact with the second substrate 20 to produce a liquid crystal display panel.
  • the inclination angle ⁇ of the spacer 40 is between 20° and 80°. Most preferably, the angle of inclination ⁇ of the spacer 40 is 60°.
  • the method for fabricating the liquid crystal display panel of the present invention may further include: forming one or more third photoresist films (not shown) on the second photoresist film 32, the one or more layers After the three photoresist film is exposed and developed, one or more third photoresist layers (not shown) are formed, and the spacers are composed of the first photoresist layer 41, the second photoresist layer 42 and the first layer.
  • the first substrate 10 and the second substrate 20 are respectively a color film substrate and a thin film transistor array substrate, or are respectively a thin film transistor array substrate and a color film substrate, that is, the substrate where the spacer 40 is located may be a thin film transistor.
  • the array substrate may also be a color film substrate.
  • the structure of the plurality of spacers 40 on the first substrate 10 includes one or more of the first structure, the second structure, and the third structure.
  • the spacer 40 can achieve better support performance, so that when the liquid crystal display panel is pressed by an external force, the thickness of the liquid crystal cell does not change, and the image quality is ensured. .
  • the method for fabricating a liquid crystal display panel of the present invention uses a common mask to pattern a stacked multilayer photoresist film by a single exposure and development process to obtain a plurality of stacked photoresist layers.
  • the photoresist layer constitutes the spacer 40. Since the photosensitive characteristics of the multilayer photoresist film are different, a multilayer photoresist layer having different patterns is obtained after exposure and development, and the different patterns refer to the upper bottom size, the lower bottom size, and the tilt. There is a difference in at least one of the parameters of the corner.
  • the present invention utilizes a multilayer photoresist layer having different patterns to adjust the tilt angle ⁇ of the spacer 40, which can effectively increase the tilt angle ⁇ of the spacer 40, thereby saving the spacer 40.
  • Arranging the space reduces the blocking effect of the spacer 40 on the liquid crystal material and improves the supporting performance of the spacer 40.
  • the invention adopts a common mask to make a gap by a single exposure and development process, the process is simple, the process is mature and controllable, and the cost is low.
  • the present invention further provides a liquid crystal display panel comprising: a first substrate 10 and a second base disposed opposite to each other, based on the manufacturing method of the liquid crystal display panel. a plate 20, a liquid crystal layer 50 disposed between the first substrate 10 and the second substrate 20, and a plurality of spacers 40 disposed on the first substrate 10 and spaced apart from the liquid crystal layer 50 side The top ends of the plurality of spacers 40 are in contact with the second substrate 20;
  • the spacer 40 includes a first photoresist layer 41 disposed on the first substrate 10 and a second photoresist layer 42 disposed on the first photoresist layer 41.
  • the first photoresist layer 41 Different from the photosensitive property of the second photoresist layer 42 , that is, the first photoresist layer 41 and the second photoresist layer 42 have different photoreaction absorption wavelengths, or the first photoresist layer 41 and the second photoresist layer
  • the layer 42 has different light sensitivity to light of the same wavelength; the first photoresist layer 41 and the second photoresist layer 42 have different patterns, and the different patterns refer to the upper bottom size, the lower bottom size, and the tilt angle.
  • the inclination angle ⁇ of the spacer 40 is defined as a line between the lower bottom edge of the first photoresist layer 41 and the upper bottom edge of the second photoresist layer 42.
  • the angle between the first substrates 10, the structure of the spacers 40 is one of the following three structures:
  • the first structure is: the upper bottom width w1 of the first photoresist layer 41 is smaller than the lower bottom width w2 of the second photoresist layer 42, and the first photoresist layer 41 is The inclination angle ⁇ 1 is equal to the inclination angle ⁇ 2 of the second photoresist layer 42. At this time, the inclination angle ⁇ of the spacer 40 is greater than the inclination angle ⁇ 1 of the first photoresist layer 41 and the second photoresist, respectively.
  • the inclination angle ⁇ 2 of the layer 42 is: the upper bottom width w1 of the first photoresist layer 41 is smaller than the lower bottom width w2 of the second photoresist layer 42, and the first photoresist layer 41 is The inclination angle ⁇ 1 is equal to the inclination angle ⁇ 2 of the second photoresist layer 42. At this time, the inclination angle ⁇ of the spacer 40 is greater than the inclination angle ⁇ 1 of the first photoresist layer 41 and
  • the second structure is: the upper bottom width w1 of the first photoresist layer 41 is smaller than the lower bottom width w2 of the second photoresist layer 42 , and the first photoresist layer 41 is The inclination angle ⁇ 1 is smaller than the inclination angle ⁇ 2 of the second photoresist layer 42.
  • the inclination angle ⁇ of the spacer 40 is greater than the inclination angle ⁇ 1 of the first photoresist layer 41 and the second photoresist, respectively.
  • the inclination angle ⁇ 2 of the layer 42 is: the upper bottom width w1 of the first photoresist layer 41 is smaller than the lower bottom width w2 of the second photoresist layer 42 , and the first photoresist layer 41 is The inclination angle ⁇ 1 is smaller than the inclination angle ⁇ 2 of the second photoresist layer 42.
  • the third structure is such that the upper bottom width w1 of the first photoresist layer 41 is greater than the lower bottom width w2 of the second photoresist layer 42 and the thickness of the first photoresist layer 41.
  • T1 is smaller than the thickness T2 of the second photoresist layer 42
  • the inclination angle ⁇ 1 of the first photoresist layer 41 is smaller than the inclination angle ⁇ 2 of the second photoresist layer 42.
  • the spacer 40 The inclination angle ⁇ is larger than the inclination angle ⁇ 1 of the first photoresist layer 41 and smaller than the inclination angle ⁇ 2 of the second photoresist layer 42.
  • the first photoresist layer 41 and the second photoresist layer 42 have different photoreaction absorption wavelengths, which means that the first photoresist layer 41 and the second photoresist layer 42 contain photoinitiators having different absorption wavelengths. .
  • the inclination angle ⁇ of the spacer 40 is between 20° and 80°. Most preferably, the angle of inclination ⁇ of the spacer 40 is 60°.
  • the spacer 40 may further include: one or more third photoresist layers (not shown) disposed on the second photoresist layer 42, the first photoresist layer 41, The photosensitive characteristics and the pattern of the two photoresist layers 42 and the one or more third photoresist layers are different.
  • the first substrate 10 and the second substrate 20 are respectively a color film substrate and a thin film transistor array substrate, or are respectively a thin film transistor array substrate and a color film substrate, that is, the substrate where the spacer 40 is located may be a thin film transistor.
  • the array substrate may also be a color film substrate.
  • the structure of the plurality of spacers 40 on the first substrate 10 includes one or more of the first structure, the second structure, and the third structure.
  • the spacer 40 in the liquid crystal display panel of the present invention comprises a plurality of stacked photoresist layers having different patterns.
  • the present invention utilizes a multilayer photoresist layer having different patterns to adjust the tilt of the spacer 40.
  • the angle ⁇ can effectively increase the inclination angle ⁇ of the spacer 40, thereby saving the arrangement space of the spacer 40, reducing the blocking effect of the spacer 40 on the liquid crystal material, and having strong supporting performance.
  • the present invention provides a liquid crystal display panel and a method of fabricating the same.
  • the method for fabricating a liquid crystal display panel of the present invention uses a common mask to pattern a stacked multilayer photoresist film by a single exposure and development process to obtain a plurality of stacked photoresist layers.
  • the photoresist layer constitutes a spacer. Since the photosensitive characteristics of the multilayer photoresist film are different, a multilayer photoresist layer having different patterns is obtained after exposure and development, and the different patterns refer to the upper bottom size, the lower bottom size, and the tilt angle. There is a difference in at least one of the parameters.
  • the present invention utilizes a multilayer photoresist layer having different patterns to adjust the tilt angle ⁇ of the spacer, which can effectively increase the tilt angle ⁇ of the spacer, thereby saving the arrangement space of the spacer and reducing
  • the spacer acts on the liquid crystal material and enhances the support properties of the spacer.
  • the invention adopts a common mask to make a gap by a single exposure and development process, the process is simple, the process is mature and controllable, and the cost is low.
  • the spacer in the liquid crystal display panel of the present invention comprises a plurality of stacked photoresist layers which have different patterns, so that the spacer has a large inclination angle ⁇ , which can effectively improve the inclination angle of the spacer. ⁇ , thereby saving the arrangement space of the spacers, reducing the barrier effect of the spacers on the liquid crystal material, and having strong supporting performance.

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Abstract

一种液晶显示面板及其制作方法。液晶显示面板的制作方法采用普通掩膜板（60）通过一次曝光显影制程对层叠设置的多层光阻薄膜（31，32）进行图形化处理，制得层叠设置的多层光阻层（41，42），层叠设置的多层光阻层（41，42）构成间隙子（40），由于多层光阻薄膜（31，32）的光敏特性不同，因此曝光显影后得到具有不同图形的多层光阻层（41，42），不同图形是指在上底尺寸（w1）、下底尺寸（w2）及倾斜角（θ1，θ2）中的至少一种参数上存在差异，利用具有不同图形的多层光阻层（41，42）来调控间隙子（40）的倾斜角（θ），能够有效提高间隙子（40）的倾斜角（θ）。液晶显示面板中的间隙子（40）包括层叠设置的具有不同图形的多层光阻层（41，42），能够有效提高间隙子（40）的倾斜角（θ）。

Description

液晶显示面板及其制作方法 技术领域
本发明涉及显示技术领域，尤其涉及一种液晶显示面板及其制作方法。
背景技术
液晶显示装置(Liquid Crystal Display，LCD)具有机身薄、省电、无辐射等众多优点，得到了广泛的应用，如：移动电话、个人数字助理(PDA)、数字相机、计算机屏幕和笔记本电脑屏幕等。
现有市场上的液晶显示装置大部分为背光型液晶显示装置，其包括背光模组(Backlight Module)、结合于背光模组上的液晶面板与固定该液晶面板与背光模组的前框。液晶面板的工作原理是在两片平行的玻璃基板当中放置液晶分子，两片玻璃基板中间有许多垂直和水平的细小电线，通过通电与否来控制液晶分子改变方向，将背光模组的光线折射出来产生画面。
间隙子(PS)是液晶显示面板中常见的起支撑作用的结构，一般由光敏树脂形成，根据其与黑色矩阵(BM)材料的异同，存在不同技术和结构设计的应用。就平板显示器而言，除需要间隙子提供稳定均一的支撑特性外，还需要间隙子具有高均匀性及较大可调的倾斜角工艺区间，便于满足不同的像素设计需求，节约排列空间，减小液晶无序取向区域，降低间隙子对液晶材料的阻挡作用。
然而，传统的间隙子的制作工艺由于受材料特性和结构设计的限制，间隙子的倾斜角(Taper)不易控制，制得的间隙子的倾斜角往往较小，导致间隙子的下底面积大于直接接触对基板的上底面积，间隙子的上底与下底之间的偏差(PS Bias)值较大给像素设计增加了空间成本。
现有的一种提高间隙子的倾斜角的方法是利用半色调(多透光率)掩膜板在间隙子的底部周围形成一圈小沟壑，变相提高间隙子的倾斜角，然而，该方法由于需要使用制造成本较高的半色调掩膜板，因此生产成本较高。
现有的另一种调控间隙子的倾斜角的方法是采用含有两种不同吸收波长的光引发剂的光阻材料成单层薄膜，通过调整光阻材料的组分比例和曝光次数来调整间隙子的倾斜角，然而该方法的设计和制程复杂，曝光次数多，倾斜角调控需要调整光阻材料的组分比例，可控性低。
发明内容
本发明的目的在于提供一种液晶显示面板的制作方法，能够有效提高间隙子的倾斜角θ，从而节约间隙子的排列空间，降低间隙子对液晶材料的阻挡作用，并提升间隙子的支撑性能。
本发明的目的还在于提供一种液晶显示面板，其间隙子具有较大的倾斜角θ，从而节约间隙子的排列空间，降低间隙子对液晶材料的阻挡作用，并且具有较强的支撑性能。
为实现上述目的，本发明提供一种液晶显示面板的制作方法，包括：
提供第一基板与第二基板，在所述第一基板上形成第一光阻薄膜，在所述第一光阻薄膜上形成第二光阻薄膜；所述第一光阻薄膜与第二光阻薄膜的光敏特性不同，即所述第一光阻薄膜与第二光阻薄膜具有不同的光反应吸收波长，或者所述第一光阻薄膜与第二光阻薄膜对相同波长光的光反应灵敏度不同；
采用一道掩膜板对所述第一光阻薄膜与第二光阻薄膜进行一次曝光显影制程，形成具有不同图形的第一光阻层与第二光阻层，从而在所述第一基板上形成间隔设置的数个间隙子，所述不同图形是指在上底尺寸、下底尺寸及倾斜角中的至少一种参数上存在差异，所述间隙子包括设于所述第一基板上的第一光阻层与设于所述第一光阻层上的第二光阻层，定义所述间隙子的倾斜角θ为所述第一光阻层的下底边缘与所述第二光阻层的上底边缘之间的连线与第一基板之间的夹角，所述间隙子的结构为以下三种结构之一：
第一种结构为：所述第一光阻层的上底宽度w1小于所述第二光阻层的下底宽度w2，且所述第一光阻层的倾斜角θ1等于所述第二光阻层的倾斜角θ2，此时，所述间隙子的倾斜角θ分别大于所述第一光阻层的倾斜角θ1与所述第二光阻层的倾斜角θ2；
第二种结构为：所述第一光阻层的上底宽度w1小于所述第二光阻层的下底宽度w2，且所述第一光阻层的倾斜角θ1小于所述第二光阻层的倾斜角θ2，此时，所述间隙子的倾斜角θ分别大于所述第一光阻层的倾斜角θ1与所述第二光阻层的倾斜角θ2；
第三种结构为：所述第一光阻层的上底宽度w1大于所述第二光阻层的下底宽度w2，所述第一光阻层的厚度T1小于所述第二光阻层的厚度T2，且所述第一光阻层的倾斜角θ1小于所述第二光阻层的倾斜角θ2，此时，所述间隙子的倾斜角θ大于所述第一光阻层的倾斜角θ1且小于所述第二光阻层的倾斜角θ2；
在所述第一基板或第二基板上滴注液晶材料，并将所述第一基板与第二基板对位组合，所述第一基板与第二基板之间的液晶材料形成液晶层，所述数个间隙子的顶端与所述第二基板相接触，制得液晶显示面板。
所述间隙子的倾斜角θ在20°-80°之间。
本发明的液晶显示面板的制作方法还包括：在所述第二光阻薄膜上形成一层或多层第三光阻薄膜，该一层或多层第三光阻薄膜经过曝光显影后形成一层或多层第三光阻层，所述间隙子由所述第一光阻层、第二光阻层及所述一层或多层第三光阻层构成，所述第一光阻层、第二光阻层及该一层或多层第三光阻层的光敏特性与图形均不相同。
所述第一光阻薄膜与第二光阻薄膜具有不同的光反应吸收波长是指所述第一光阻薄膜与第二光阻薄膜含有吸收波长不同的光引发剂；所述第一基板与第二基板分别为彩膜基板与薄膜晶体管阵列基板，或者分别为薄膜晶体管阵列基板与彩膜基板。
所述第一基板上的数个间隙子的结构包括第一结构、第二结构与第三结构中的一种或多种。
本发明还提供一种液晶显示面板，包括：相对设置的第一基板与第二基板、设于所述第一基板与第二基板之间的液晶层、及设于所述第一基板上朝向所述液晶层一侧且间隔设置的数个间隙子，所述数个间隙子的顶端与所述第二基板相接触；
所述间隙子包括设于所述第一基板上的第一光阻层与设于所述第一光阻层上的第二光阻层，所述第一光阻层与第二光阻层的光敏特性不同，即所述第一光阻层与第二光阻层具有不同的光反应吸收波长，或者所述第一光阻层与第二光阻层对相同波长光的光反应灵敏度不同；所述第一光阻层与第二光阻层具有不同图形，所述不同图形是指在上底尺寸、下底尺寸及倾斜角中的至少一种参数上存在差异，定义所述间隙子的倾斜角θ为所述第一光阻层的下底边缘与所述第二光阻层的上底边缘之间的连线与第一基板之间的夹角，所述间隙子的结构为以下三种结构之一：
第一种结构为：所述第一光阻层的上底宽度w1小于所述第二光阻层的下底宽度w2，且所述第一光阻层的倾斜角θ1等于所述第二光阻层的倾斜角θ2，此时，所述间隙子的倾斜角θ分别大于所述第一光阻层的倾斜角θ1与所述第二光阻层的倾斜角θ2；
第二种结构为：所述第一光阻层的上底宽度w1小于所述第二光阻层的下底宽度w2，且所述第一光阻层的倾斜角θ1小于所述第二光阻层的倾斜角θ2，此时，所述间隙子的倾斜角θ分别大于所述第一光阻层的倾斜角θ 1与所述第二光阻层的倾斜角θ2；
第三种结构为：所述第一光阻层的上底宽度w1大于所述第二光阻层的下底宽度w2，所述第一光阻层的厚度T1小于所述第二光阻层的厚度T2，且所述第一光阻层的倾斜角θ1小于所述第二光阻层的倾斜角θ2，此时，所述间隙子的倾斜角θ大于所述第一光阻层的倾斜角θ1且小于所述第二光阻层的倾斜角θ2。
所述间隙子的倾斜角θ在20°-80°之间。
所述间隙子还包括：设于所述第二光阻层上的一层或多层第三光阻层，所述第一光阻层、第二光阻层及该一层或多层第三光阻层的光敏特性与图形均不相同。
所述第一光阻层与第二光阻层具有不同的光反应吸收波长是指所述第一光阻层与第二光阻层含有吸收波长不同的光引发剂；所述第一基板与第二基板分别为彩膜基板与薄膜晶体管阵列基板，或者分别为薄膜晶体管阵列基板与彩膜基板。
所述第一基板上的数个间隙子的结构包括第一结构、第二结构与第三结构中的一种或多种。
本发明还提供一种液晶显示面板的制作方法，包括：
提供第一基板与第二基板，在所述第一基板上形成第一光阻薄膜，在所述第一光阻薄膜上形成第二光阻薄膜；所述第一光阻薄膜与第二光阻薄膜的光敏特性不同，即所述第一光阻薄膜与第二光阻薄膜具有不同的光反应吸收波长，或者所述第一光阻薄膜与第二光阻薄膜对相同波长光的光反应灵敏度不同；
采用一道掩膜板对所述第一光阻薄膜与第二光阻薄膜进行一次曝光显影制程，形成具有不同图形的第一光阻层与第二光阻层，从而在所述第一基板上形成间隔设置的数个间隙子，所述不同图形是指在上底尺寸、下底尺寸及倾斜角中的至少一种参数上存在差异，所述间隙子包括设于所述第一基板上的第一光阻层与设于所述第一光阻层上的第二光阻层，定义所述间隙子的倾斜角θ为所述第一光阻层的下底边缘与所述第二光阻层的上底边缘之间的连线与第一基板之间的夹角，所述间隙子的结构为以下三种结构之一：
第一种结构为：所述第一光阻层的上底宽度w1小于所述第二光阻层的下底宽度w2，且所述第一光阻层的倾斜角θ1等于所述第二光阻层的倾斜角θ2，此时，所述间隙子的倾斜角θ分别大于所述第一光阻层的倾斜角θ1与所述第二光阻层的倾斜角θ2；
第二种结构为：所述第一光阻层的上底宽度w1小于所述第二光阻层的下底宽度w2，且所述第一光阻层的倾斜角θ1小于所述第二光阻层的倾斜角θ2，此时，所述间隙子的倾斜角θ分别大于所述第一光阻层的倾斜角θ1与所述第二光阻层的倾斜角θ2；
第三种结构为：所述第一光阻层的上底宽度w1大于所述第二光阻层的下底宽度w2，所述第一光阻层的厚度T1小于所述第二光阻层的厚度T2，且所述第一光阻层的倾斜角θ1小于所述第二光阻层的倾斜角θ2，此时，所述间隙子的倾斜角θ大于所述第一光阻层的倾斜角θ1且小于所述第二光阻层的倾斜角θ2；
在所述第一基板或第二基板上滴注液晶材料，并将所述第一基板与第二基板对位组合，所述第一基板与第二基板之间的液晶材料形成液晶层，所述数个间隙子的顶端与所述第二基板相接触，制得液晶显示面板；
其中，所述间隙子的倾斜角θ在20°-80°之间；
还包括：在所述第二光阻薄膜上形成一层或多层第三光阻薄膜，该一层或多层第三光阻薄膜经过曝光显影后形成一层或多层第三光阻层，所述间隙子由所述第一光阻层、第二光阻层及所述一层或多层第三光阻层构成，所述第一光阻层、第二光阻层及该一层或多层第三光阻层的光敏特性与图形均不相同；
其中，所述第一光阻薄膜与第二光阻薄膜具有不同的光反应吸收波长是指所述第一光阻薄膜与第二光阻薄膜含有吸收波长不同的光引发剂；所述第一基板与第二基板分别为彩膜基板与薄膜晶体管阵列基板，或者分别为薄膜晶体管阵列基板与彩膜基板；
其中，所述第一基板上的数个间隙子的结构包括第一结构、第二结构与第三结构中的一种或多种。
本发明的有益效果：本发明的液晶显示面板的制作方法采用普通掩膜板通过一次曝光显影制程对层叠设置的多层光阻薄膜进行图形化处理，制得层叠设置的多层光阻层，该层叠设置的多层光阻层构成间隙子，由于多层光阻薄膜的光敏特性不同，因此曝光显影后得到具有不同图形的多层光阻层，所述不同图形是指在上底尺寸、下底尺寸及倾斜角中的至少一种参数上存在差异，本发明利用具有不同图形的多层光阻层来调控间隙子的倾斜角θ，能够有效提高间隙子的倾斜角θ，从而节约间隙子的排列空间，降低间隙子对液晶材料的阻挡作用，并提升间隙子的支撑性能。同时，本发明采用普通掩膜板通过一次曝光显影制程制作间隙子，制程简单且工艺成熟可控，成本较低。本发明的液晶显示面板中的间隙子包括层叠设置的多 层光阻层，该多层光阻层具有不同图形，使得该间隙子具有较大的倾斜角θ，能够有效提高间隙子的倾斜角θ，从而节约间隙子的排列空间，降低间隙子对液晶材料的阻挡作用，并提升间隙子的支撑性能。
为了能更进一步了解本发明的特征以及技术内容，请参阅以下有关本发明的详细说明与附图，然而附图仅提供参考与说明用，并非用来对本发明加以限制。
附图说明
下面结合附图，通过对本发明的具体实施方式详细描述，将使本发明的技术方案及其它有益效果显而易见。
附图中，
图1为本发明的液晶显示面板的制作方法的流程图；
图2与图3为本发明的液晶显示面板的制作方法步骤1的示意图；
图4为本发明的液晶显示面板的制作方法步骤2的示意图；
图5为本发明的液晶显示面板的制作方法步骤2制得的间隙子的第一种结构示意图；
图6为本发明的液晶显示面板的制作方法步骤2制得的间隙子的第二种结构示意图；
图7为本发明的液晶显示面板的制作方法步骤2制得的间隙子的第三种结构示意图；
图8为本发明的液晶显示面板的制作方法的步骤3的示意图及本发明的液晶显示面板的结构示意图。
具体实施方式
为更进一步阐述本发明所采取的技术手段及其效果，以下结合本发明的优选实施例及其附图进行详细描述。
请参阅图1，本发明提供一种液晶显示面板的制作方法，包括如下步骤：
步骤1、如图2与图3所示，提供第一基板10与第二基板20，在所述第一基板10上形成第一光阻薄膜31，在所述第一光阻薄膜31上形成第二光阻薄膜32；所述第一光阻薄膜31与第二光阻薄膜32的光敏特性不同，即所述第一光阻薄膜31与第二光阻薄膜32具有不同的光反应吸收波长，或者所述第一光阻薄膜31与第二光阻薄膜32对相同波长光的光反应灵敏度不同。
具体的，所述第一光阻薄膜31和第二光阻薄膜32的材料均为光敏树 脂。
具体的，所述第一光阻薄膜31与第二光阻薄膜32具有不同的光反应吸收波长是指所述第一光阻薄膜31与第二光阻薄膜32含有吸收波长不同的光引发剂。
步骤2、如图4至图7所示，采用一道掩膜板60对所述第一光阻薄膜31与第二光阻薄膜32进行一次曝光显影制程，形成具有不同图形的第一光阻层41与第二光阻层42，从而在所述第一基板10上形成间隔设置的数个间隙子40，所述不同图形是指在上底尺寸、下底尺寸及倾斜角中的至少一种参数上存在差异，所述间隙子40包括设于所述第一基板10上的第一光阻层41与设于所述第一光阻层41上的第二光阻层42，定义所述间隙子40的倾斜角θ为所述第一光阻层41的下底边缘与所述第二光阻层42的上底边缘之间的连线与第一基板10之间的夹角，所述间隙子40的结构为以下三种结构之一：
如图5所示，第一种结构为：所述第一光阻层41的上底宽度w1小于所述第二光阻层42的下底宽度w2，且所述第一光阻层41的倾斜角θ1等于所述第二光阻层42的倾斜角θ2，此时，所述间隙子40的倾斜角θ分别大于所述第一光阻层41的倾斜角θ1与所述第二光阻层42的倾斜角θ2，从而提高了间隙子40的倾斜角θ；
如图6所示，第二种结构为：所述第一光阻层41的上底宽度w1小于所述第二光阻层42的下底宽度w2，且所述第一光阻层41的倾斜角θ1小于所述第二光阻层42的倾斜角θ2，此时，所述间隙子40的倾斜角θ分别大于所述第一光阻层41的倾斜角θ1与所述第二光阻层42的倾斜角θ2，从而提高了间隙子40的倾斜角θ；
如图7所示，第三种结构为：所述第一光阻层41的上底宽度w1大于所述第二光阻层42的下底宽度w2，所述第一光阻层41的厚度T1小于所述第二光阻层42的厚度T2，且所述第一光阻层41的倾斜角θ1小于所述第二光阻层42的倾斜角θ2，此时，所述间隙子40的倾斜角θ大于所述第一光阻层41的倾斜角θ1且小于所述第二光阻层42的倾斜角θ2，在所述第一光阻层41的厚度T1远小于所述第二光阻层42的厚度T2的情况下，所述间隙子40的倾斜角θ无限接近于所述第二光阻层42的倾斜角θ2；如果去掉第一光阻层41，将第二光阻层42的高度设置为T1+T2，使间隙子40仅由第二光阻层42构成，则会因为高温烘烤或显影等制程中流平坍缩的形变影响，致使第二光阻层42的倾斜角θ2并不能保证大的倾斜角，因此不能有效提高间隙子40的倾斜角θ，该第三种结构通过设置双层结构可以 有效提高间隙子40的倾斜角θ。
步骤3、如图8所示，在所述第一基板10或第二基板20上滴注液晶材料，并将所述第一基板10与第二基板20对位组合，所述第一基板10与第二基板20之间的液晶材料形成液晶层50，所述数个间隙子40的顶端与所述第二基板20相接触，制得液晶显示面板。
具体的，所述间隙子40的倾斜角θ在20°-80°之间。最优选的，所述间隙子40的倾斜角θ为60°。
具体的，本发明的液晶显示面板的制作方法还可以包括：在所述第二光阻薄膜32上形成一层或多层第三光阻薄膜(未图示)，该一层或多层第三光阻薄膜经过曝光显影后形成一层或多层第三光阻层(未图示)，所述间隙子由所述第一光阻层41、第二光阻层42及所述一层或多层第三光阻层构成，所述第一光阻层41、第二光阻层42及该一层或多层第三光阻层的光敏特性与图形均不相同，所述第三光阻层的层数越多，所述间隙子40的倾斜角θ的可调控范围越大，但制程越复杂。
具体的，所述第一基板10与第二基板20分别为彩膜基板与薄膜晶体管阵列基板，或者分别为薄膜晶体管阵列基板与彩膜基板，即所述间隙子40所在的基板可以为薄膜晶体管阵列基板也可以为彩膜基板。
具体的，所述第一基板10上的数个间隙子40的结构包括第一结构、第二结构与第三结构中的一种或多种。
由于本发明制得的间隙子40的倾斜角θ较大，因此该间隙子40能够实现更好的支撑性能，使得液晶显示面板受到外力按压时，液晶盒厚不会发生改变，成像质量得到保证。
本发明的液晶显示面板的制作方法采用普通掩膜板通过一次曝光显影制程对层叠设置的多层光阻薄膜进行图形化处理，制得层叠设置的多层光阻层，该层叠设置的多层光阻层构成间隙子40，由于多层光阻薄膜的光敏特性不同，因此曝光显影后得到具有不同图形的多层光阻层，所述不同图形是指在上底尺寸、下底尺寸及倾斜角中的至少一种参数上存在差异，本发明利用具有不同图形的多层光阻层来调控间隙子40的倾斜角θ，能够有效提高间隙子40的倾斜角θ，从而节约间隙子40的排列空间，降低间隙子40对液晶材料的阻挡作用，并提升间隙子40的支撑性能。同时，本发明采用普通掩膜板通过一次曝光显影制程制作间隙子，制程简单且工艺成熟可控，成本较低。
请参阅图8，同时参阅图5至图7，基于上述液晶显示面板的制作方法，本发明还提供一种液晶显示面板，包括：相对设置的第一基板10与第二基 板20、设于所述第一基板10与第二基板20之间的液晶层50、及设于所述第一基板10上朝向所述液晶层50一侧且间隔设置的数个间隙子40，所述数个间隙子40的顶端与所述第二基板20相接触；
所述间隙子40包括设于所述第一基板10上的第一光阻层41与设于所述第一光阻层41上的第二光阻层42，所述第一光阻层41与第二光阻层42的光敏特性不同，即所述第一光阻层41与第二光阻层42具有不同的光反应吸收波长，或者所述第一光阻层41与第二光阻层42对相同波长光的光反应灵敏度不同；所述第一光阻层41与第二光阻层42具有不同图形，所述不同图形是指在上底尺寸、下底尺寸及倾斜角中的至少一种参数上存在差异，定义所述间隙子40的倾斜角θ为所述第一光阻层41的下底边缘与所述第二光阻层42的上底边缘之间的连线与第一基板10之间的夹角，所述间隙子40的结构为以下三种结构之一：
如图5所示，第一种结构为：所述第一光阻层41的上底宽度w1小于所述第二光阻层42的下底宽度w2，且所述第一光阻层41的倾斜角θ1等于所述第二光阻层42的倾斜角θ2，此时，所述间隙子40的倾斜角θ分别大于所述第一光阻层41的倾斜角θ1与所述第二光阻层42的倾斜角θ2；
如图6所示，第二种结构为：所述第一光阻层41的上底宽度w1小于所述第二光阻层42的下底宽度w2，且所述第一光阻层41的倾斜角θ1小于所述第二光阻层42的倾斜角θ2，此时，所述间隙子40的倾斜角θ分别大于所述第一光阻层41的倾斜角θ1与所述第二光阻层42的倾斜角θ2；
如图7所示，第三种结构为：所述第一光阻层41的上底宽度w1大于所述第二光阻层42的下底宽度w2，所述第一光阻层41的厚度T1小于所述第二光阻层42的厚度T2，且所述第一光阻层41的倾斜角θ1小于所述第二光阻层42的倾斜角θ2，此时，所述间隙子40的倾斜角θ大于所述第一光阻层41的倾斜角θ1且小于所述第二光阻层42的倾斜角θ2。
具体的，所述第一光阻层41与第二光阻层42具有不同的光反应吸收波长是指所述第一光阻层41与第二光阻层42含有吸收波长不同的光引发剂。
具体的，所述间隙子40的倾斜角θ在20°-80°之间。最优选的，所述间隙子40的倾斜角θ为60°。
具体的，所述间隙子40还可以包括：设于所述第二光阻层42上的一层或多层第三光阻层(未图示)，所述第一光阻层41、第二光阻层42及该一层或多层第三光阻层的光敏特性与图形均不相同，所述第三光阻层的层数越多，所述间隙子40的倾斜角θ的可调控范围越大，但制程越复杂。
具体的，所述第一基板10与第二基板20分别为彩膜基板与薄膜晶体管阵列基板，或者分别为薄膜晶体管阵列基板与彩膜基板，即所述间隙子40所在的基板可以为薄膜晶体管阵列基板也可以为彩膜基板。
具体的，所述第一基板10上的数个间隙子40的结构包括第一结构、第二结构与第三结构中的一种或多种。
本发明的液晶显示面板中的间隙子40包括层叠设置的多层光阻层，该多层光阻层具有不同图形，本发明利用具有不同图形的多层光阻层来调控间隙子40的倾斜角θ，能够有效提高间隙子40的倾斜角θ，从而节约间隙子40的排列空间，降低间隙子40对液晶材料的阻挡作用，并且具有较强的支撑性能。
综上所述，本发明提供一种液晶显示面板及其制作方法。本发明的液晶显示面板的制作方法采用普通掩膜板通过一次曝光显影制程对层叠设置的多层光阻薄膜进行图形化处理，制得层叠设置的多层光阻层，该层叠设置的多层光阻层构成间隙子，由于多层光阻薄膜的光敏特性不同，因此曝光显影后得到具有不同图形的多层光阻层，所述不同图形是指在上底尺寸、下底尺寸及倾斜角中的至少一种参数上存在差异，本发明利用具有不同图形的多层光阻层来调控间隙子的倾斜角θ，能够有效提高间隙子的倾斜角θ，从而节约间隙子的排列空间，降低间隙子对液晶材料的阻挡作用，并提升间隙子的支撑性能。同时，本发明采用普通掩膜板通过一次曝光显影制程制作间隙子，制程简单且工艺成熟可控，成本较低。本发明的液晶显示面板中的间隙子包括层叠设置的多层光阻层，该多层光阻层具有不同图形，使得该间隙子具有较大的倾斜角θ，能够有效提高间隙子的倾斜角θ，从而节约间隙子的排列空间，降低间隙子对液晶材料的阻挡作用，并且具有较强的支撑性能。
以上所述，对于本领域的普通技术人员来说，可以根据本发明的技术方案和技术构思作出其他各种相应的改变和变形，而所有这些改变和变形都应属于本发明权利要求的保护范围。

Claims (11)

  1. 一种液晶显示面板的制作方法，包括：
    提供第一基板与第二基板，在所述第一基板上形成第一光阻薄膜，在所述第一光阻薄膜上形成第二光阻薄膜；所述第一光阻薄膜与第二光阻薄膜的光敏特性不同，即所述第一光阻薄膜与第二光阻薄膜具有不同的光反应吸收波长，或者所述第一光阻薄膜与第二光阻薄膜对相同波长光的光反应灵敏度不同；
    采用一道掩膜板对所述第一光阻薄膜与第二光阻薄膜进行一次曝光显影制程，形成具有不同图形的第一光阻层与第二光阻层，从而在所述第一基板上形成间隔设置的数个间隙子，所述不同图形是指在上底尺寸、下底尺寸及倾斜角中的至少一种参数上存在差异，所述间隙子包括设于所述第一基板上的第一光阻层与设于所述第一光阻层上的第二光阻层，定义所述间隙子的倾斜角θ为所述第一光阻层的下底边缘与所述第二光阻层的上底边缘之间的连线与第一基板之间的夹角，所述间隙子的结构为以下三种结构之一：
    第一种结构为：所述第一光阻层的上底宽度w1小于所述第二光阻层的下底宽度w2，且所述第一光阻层的倾斜角θ1等于所述第二光阻层的倾斜角θ2，此时，所述间隙子的倾斜角θ分别大于所述第一光阻层的倾斜角θ1与所述第二光阻层的倾斜角θ2；
    第二种结构为：所述第一光阻层的上底宽度w1小于所述第二光阻层的下底宽度w2，且所述第一光阻层的倾斜角θ1小于所述第二光阻层的倾斜角θ2，此时，所述间隙子的倾斜角θ分别大于所述第一光阻层的倾斜角θ1与所述第二光阻层的倾斜角θ2；
    第三种结构为：所述第一光阻层的上底宽度w1大于所述第二光阻层的下底宽度w2，所述第一光阻层的厚度T1小于所述第二光阻层的厚度T2，且所述第一光阻层的倾斜角θ1小于所述第二光阻层的倾斜角θ2，此时，所述间隙子的倾斜角θ大于所述第一光阻层的倾斜角θ1且小于所述第二光阻层的倾斜角θ2；
    在所述第一基板或第二基板上滴注液晶材料，并将所述第一基板与第二基板对位组合，所述第一基板与第二基板之间的液晶材料形成液晶层，所述数个间隙子的顶端与所述第二基板相接触，制得液晶显示面板。
  2. 如权利要求1所述的液晶显示面板的制作方法，其中，所述间隙子 的倾斜角θ在20°-80°之间。
  3. 如权利要求1所述的液晶显示面板的制作方法，还包括：在所述第二光阻薄膜上形成一层或多层第三光阻薄膜，该一层或多层第三光阻薄膜经过曝光显影后形成一层或多层第三光阻层，所述间隙子由所述第一光阻层、第二光阻层及所述一层或多层第三光阻层构成，所述第一光阻层、第二光阻层及该一层或多层第三光阻层的光敏特性与图形均不相同。
  4. 如权利要求1所述的液晶显示面板的制作方法，其中，所述第一光阻薄膜与第二光阻薄膜具有不同的光反应吸收波长是指所述第一光阻薄膜与第二光阻薄膜含有吸收波长不同的光引发剂；所述第一基板与第二基板分别为彩膜基板与薄膜晶体管阵列基板，或者分别为薄膜晶体管阵列基板与彩膜基板。
  5. 如权利要求1所述的液晶显示面板的制作方法，其中，所述第一基板上的数个间隙子的结构包括第一结构、第二结构与第三结构中的一种或多种。
  6. 一种液晶显示面板，包括：相对设置的第一基板与第二基板、设于所述第一基板与第二基板之间的液晶层、及设于所述第一基板上朝向所述液晶层一侧且间隔设置的数个间隙子，所述数个间隙子的顶端与所述第二基板相接触；
    所述间隙子包括设于所述第一基板上的第一光阻层与设于所述第一光阻层上的第二光阻层，所述第一光阻层与第二光阻层的光敏特性不同，即所述第一光阻层与第二光阻层具有不同的光反应吸收波长，或者所述第一光阻层与第二光阻层对相同波长光的光反应灵敏度不同；所述第一光阻层与第二光阻层具有不同图形，所述不同图形是指在上底尺寸、下底尺寸及倾斜角中的至少一种参数上存在差异，定义所述间隙子的倾斜角θ为所述第一光阻层的下底边缘与所述第二光阻层的上底边缘之间的连线与第一基板之间的夹角，所述间隙子的结构为以下三种结构之一：
    第一种结构为：所述第一光阻层的上底宽度w1小于所述第二光阻层的下底宽度w2，且所述第一光阻层的倾斜角θ1等于所述第二光阻层的倾斜角θ2，此时，所述间隙子的倾斜角θ分别大于所述第一光阻层的倾斜角θ1与所述第二光阻层的倾斜角θ2；
    第二种结构为：所述第一光阻层的上底宽度w1小于所述第二光阻层的下底宽度w2，且所述第一光阻层的倾斜角θ1小于所述第二光阻层的倾斜角θ2，此时，所述间隙子的倾斜角θ分别大于所述第一光阻层的倾斜角θ1与所述第二光阻层的倾斜角θ2；
    第三种结构为：所述第一光阻层的上底宽度w1大于所述第二光阻层的下底宽度w2，所述第一光阻层的厚度T1小于所述第二光阻层的厚度T2，且所述第一光阻层的倾斜角θ1小于所述第二光阻层的倾斜角θ2，此时，所述间隙子的倾斜角θ大于所述第一光阻层的倾斜角θ1且小于所述第二光阻层的倾斜角θ2。
  7. 如权利要求6所述的液晶显示面板，其中，所述间隙子的倾斜角θ在20°-80°之间。
  8. 如权利要求6所述的液晶显示面板，其中，所述间隙子还包括：设于所述第二光阻层上的一层或多层第三光阻层，所述第一光阻层、第二光阻层及该一层或多层第三光阻层的光敏特性与图形均不相同。
  9. 如权利要求6所述的液晶显示面板，其中，所述第一光阻层与第二光阻层具有不同的光反应吸收波长是指所述第一光阻层与第二光阻层含有吸收波长不同的光引发剂；所述第一基板与第二基板分别为彩膜基板与薄膜晶体管阵列基板，或者分别为薄膜晶体管阵列基板与彩膜基板。
  10. 如权利要求6所述的液晶显示面板，其中，所述第一基板上的数个间隙子的结构包括第一结构、第二结构与第三结构中的一种或多种。
  11. 一种液晶显示面板的制作方法，包括：
    提供第一基板与第二基板，在所述第一基板上形成第一光阻薄膜，在所述第一光阻薄膜上形成第二光阻薄膜；所述第一光阻薄膜与第二光阻薄膜的光敏特性不同，即所述第一光阻薄膜与第二光阻薄膜具有不同的光反应吸收波长，或者所述第一光阻薄膜与第二光阻薄膜对相同波长光的光反应灵敏度不同；
    采用一道掩膜板对所述第一光阻薄膜与第二光阻薄膜进行一次曝光显影制程，形成具有不同图形的第一光阻层与第二光阻层，从而在所述第一基板上形成间隔设置的数个间隙子，所述不同图形是指在上底尺寸、下底尺寸及倾斜角中的至少一种参数上存在差异，所述间隙子包括设于所述第一基板上的第一光阻层与设于所述第一光阻层上的第二光阻层，定义所述间隙子的倾斜角θ为所述第一光阻层的下底边缘与所述第二光阻层的上底边缘之间的连线与第一基板之间的夹角，所述间隙子的结构为以下三种结构之一：
    第一种结构为：所述第一光阻层的上底宽度w1小于所述第二光阻层的下底宽度w2，且所述第一光阻层的倾斜角θ1等于所述第二光阻层的倾斜角θ2，此时，所述间隙子的倾斜角θ分别大于所述第一光阻层的倾斜角θ1与所述第二光阻层的倾斜角θ2；
    第二种结构为：所述第一光阻层的上底宽度w1小于所述第二光阻层的下底宽度w2，且所述第一光阻层的倾斜角θ1小于所述第二光阻层的倾斜角θ2，此时，所述间隙子的倾斜角θ分别大于所述第一光阻层的倾斜角θ1与所述第二光阻层的倾斜角θ2；
    第三种结构为：所述第一光阻层的上底宽度w1大于所述第二光阻层的下底宽度w2，所述第一光阻层的厚度T1小于所述第二光阻层的厚度T2，且所述第一光阻层的倾斜角θ1小于所述第二光阻层的倾斜角θ2，此时，所述间隙子的倾斜角θ大于所述第一光阻层的倾斜角θ1且小于所述第二光阻层的倾斜角θ2；
    在所述第一基板或第二基板上滴注液晶材料，并将所述第一基板与第二基板对位组合，所述第一基板与第二基板之间的液晶材料形成液晶层，所述数个间隙子的顶端与所述第二基板相接触，制得液晶显示面板；
    其中，所述间隙子的倾斜角θ在20°-80°之间；
    还包括：在所述第二光阻薄膜上形成一层或多层第三光阻薄膜，该一层或多层第三光阻薄膜经过曝光显影后形成一层或多层第三光阻层，所述间隙子由所述第一光阻层、第二光阻层及所述一层或多层第三光阻层构成，所述第一光阻层、第二光阻层及该一层或多层第三光阻层的光敏特性与图形均不相同；
    其中，所述第一光阻薄膜与第二光阻薄膜具有不同的光反应吸收波长是指所述第一光阻薄膜与第二光阻薄膜含有吸收波长不同的光引发剂；所述第一基板与第二基板分别为彩膜基板与薄膜晶体管阵列基板，或者分别为薄膜晶体管阵列基板与彩膜基板；
    其中，所述第一基板上的数个间隙子的结构包括第一结构、第二结构与第三结构中的一种或多种。
PCT/CN2017/111081 2017-09-07 2017-11-15 液晶显示面板及其制作方法 Ceased WO2019047370A1 (zh)

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